JP7210904B2 - Wire grid polarizer and display device - Google Patents

Description

Embodiments of the present disclosure relate to wire grid polarizers and displays.

A wire grid polarizer is a polarizing element in which linear thin wires made of a conductive material such as metal are arranged in a regular concave-convex pattern on a base material such as glass or plastic.
A wire grid polarizer can be manufactured by applying an imprint technique.
Imprint technology involves pressing an original mold, in which a pattern to be transferred is formed in advance, against a material to be transferred, such as a liquid resin on a base material, and curing it while applying heat or light, or by applying heat in a heated state. In this method, a pattern of a mold is transferred to a transfer material by pressing it against a plastic transfer material.

As an example, FIGS. 4A to 4H of Patent Document 1 (JP-A-2006-84776) describe a manufacturing method including the following steps:
(1) Depositing a metal thin film 310a on a glass substrate 300;
(2) coating polymer 320a on metal thin film 310a;
(3) pressing the mold 330 against the polymer 320a to transfer the pattern of the mold to the polymer 320a, and then separating the mold 330 from the polymer 320a;
(4) Partially expose the surface of the metal thin film 310a by dry-etching the polymer 320a onto which the concave-convex pattern has been transferred:
(5) A metal grid pattern 310b is formed by dry or wet etching the metal thin film 310a partially exposed on the surface.
However, the imprint mold has a fine uneven pattern on the inner surface of the mold ranging from a nanoscale of 10 nm level to a scale of about 100 μm, and it is very expensive because it takes time to form such a fine uneven pattern. In addition, in many cases, only a small-area original plate can be produced due to limitations of the manufacturing method and equipment.
For example, with the current photolithography technology, the size of the original plate having fine unevenness obtained from silicon-based materials such as quartz is a wafer size of 12 inches in diameter, even if it is large. Production of the original plate requires equipment equipped with a large optical system and a highly accurate drive system, so from the viewpoint of production cost, the industrial utility value is low. Therefore, when considering the procurement of substrate materials, processing accuracy, and manufacturing costs, there is a limit to the size of the original plate with fine unevenness, and it is difficult to manufacture a large-area wire grid polarizer by the imprint method. Met.

In FIG. 1 of Patent Document 2 (Japanese Patent Application Laid-Open No. 2011-221412), a base material 101 having a lattice-shaped uneven portion extending in a specific direction, and one direction side of the lattice-shaped uneven portion of the lattice-shaped uneven portion. A wire grid polarizer is described which has metal wires 102 provided so as to contact the sides and extend upward from the tops of the grid-like projections.
Patent Document 2 describes the following procedure as an example (paragraphs 0055 to 0060) of manufacturing a wire grid polarizing plate: (1) Manufacture two nickel stampers having a mold surface in the shape of a fine uneven lattice. Then, by joining them in a circle by welding, a roll stamper is prepared in which the longitudinal direction of the fine concavo-convex lattice and the circumferential direction of the roll stamper are perpendicular to each other; A curable resin is continuously applied, and the coated surface is brought into contact with the roll stamper to be cured by ultraviolet rays, so that the fine uneven lattice is continuously transferred, and then wound up to form a raw roll; By evaporating aluminum obliquely onto the transfer surface of the grid-shaped projections of the opposite roll, metal wires 102 were formed so as to contact the side surfaces of the grid-shaped projections in one direction and extend upward from the tops of the grid-shaped projections. .
The method described in Patent Document 2 can continuously form a metal wire on a roll-shaped base material, so that it is easy to increase the area. However, the wire grid polarizing plate manufactured by the method of Patent Document 2 is inferior in heat resistance because it includes grid-like protrusions formed by curing a resin.

Therefore, a method has been proposed to enable a large-area imprint mold by repeatedly performing imprinting using a small-area unit mold while shifting the position of the mold so that the processing regions do not overlap (step and repeat method).
However, according to the conventional method in which the positions of the unit molds are repeatedly shifted so that the processing regions do not overlap, a portion where the pattern is not formed is visible between the transferred patterns. rice field.
When such a resin mold having a joint portion where no pattern is formed is applied to imprint patterning on an etching resist film as described in detail later, the resist of the material to be transferred has the resin Since the convex surface of the joint part where the pattern is not formed in the mold is uniformly transferred, the resist film is thinned over almost the entire area without pattern formation in the area, and the etching is deep. There has been a problem that the wire grid polarizer does not satisfy the desired performance because the seam portion without the concave-convex pattern becomes visible in size.

Patent Document 3 (US 2016/0299423A1) discloses a method of manufacturing a large-area master template used in imprint lithography, using a small-area imprint mold as a unit mold. US Pat. No. 6,200,003 describes an imprint lithography method generally comprising the following steps:
(1) setting a first area A1 and a second area A2 on a substrate;
(2) imprinting a first imprint pattern 200 having a shape corresponding to the wire grid pattern using a small-area imprint mold on the first area A1 of the substrate, etching and planarizing;
(3) Next, a second imprint pattern 210 having a shape corresponding to the wire grid pattern is imprinted on the second area A2 on the substrate using a small-area imprint mold, etched, and planarized. ,;
(4) At this stage, by etching the first layer 110 existing on the lower layer side through the mask patterns 120a remaining on the first and second areas, a pattern having a larger area than the imprint mold is formed in the first area. and a master template covering the entire second area.
In Patent Document 3, an error (positional deviation) that exists at a joint (boundary) between a first area A1 and a second area A2 formed using a small-area imprint mold is determined by using a wire width of a wire grid pattern and a wire width. It is described that the joints of the line and space pattern on the wire grid become visually inconspicuous by setting the total interval interval to less than 1/2 pitch when the total interval is 1 pitch (Claim 20, paragraph 0072 ).

In Patent Document 4 (Japanese Patent Application Laid-Open No. 2013-161997), in order to eliminate a joint portion where no pattern is formed, a plurality of basic fine structure patterns can be joined with high precision to manufacture a fine structure pattern aggregate. As a method, a first step of supplying a photocurable resin by dropping onto a flat base material, a second step of pressing and expanding a microstructure mold, which is a unit mold, against the photocurable resin, and the photocurable resin A third step of forming a circular basic fine structure pattern by irradiating and exposing the resin to light to harden it, and a fourth step of releasing and moving the fine structure mold from the basic fine structure pattern and lifting the mold. A method for manufacturing a microstructure pattern assembly by repeating a basic microstructure pattern forming unit step a plurality of times, wherein the new basic structure adjacent to the already formed basic microstructure pattern A fine structure pattern, characterized in that, when forming a fine structure pattern, a new basic fine structure pattern is formed such that a peripheral portion of a new basic fine structure pattern partially overlaps a peripheral portion of an already formed basic fine structure pattern. A method of manufacturing an aggregate is described.

JP-A-2006-84776 JP 2011-221412 A US2016/0299423A1 publication JP 2013-161997 A

However, in order to fabricate a large-area master template by the technique described in Patent Document 3, as described above, it is necessary to repeat the cycle including imprinting, etching, and flattening multiple times. It is necessary to accurately align the light irradiation and etching each time, and for this purpose, a large-scale facility equipped with a highly accurate optical system and drive system is required. It is difficult to manufacture equipment that realizes this technology with the current technology, and even if it is possible to manufacture such equipment, the manufacturing cost will be high, so the industrial utility value will be low. , not suitable for commercial production.

Further, according to the technique of Patent Document 4, as described in FIG. 5 of Patent Document 4 (FIG. 32 of this specification), the concave-convex pattern 502 transferred next to the already-transferred concave-convex pattern portion 501 As a result, at the joint between 501 and 502, a step of about the height of the convex portion of the concave/convex pattern or more is formed.
When the resin mold 500 having a step of about the height of the convex portion or more at such a joint is applied to imprint patterning on an etching resist film as will be described in detail later, as shown in FIG. Also on the resist film 504 , a concavo-convex pattern having steps at joints corresponding to the concavo-convex pattern of the resin mold 500 is transferred. Then, when etching the residual film of the recessed portion of the resist, for example, if an attempt is made to etch the residual film of the recessed portion 505 where the imprinted surface of the resist is raised during mold connection, the resist runs over during mold connection. In the portion 506 where the imprint surface is lowered, there arises a problem that the uneven pattern itself of the resist film is etched and flattened. In FIG. 5 of Patent Document 4 (FIG. 23 of this specification), it is schematically described that one convex portion of the pattern is overlaid. It is difficult to adjust the width to be overlaid on the joint to 10 μm or less. Therefore, in the technique of Patent Document 4, due to the above-described steps existing at the joints of the concave-convex patterns of the resin mold, the joints on the resist film become flat recesses of a size that can be seen with the naked eye. There is Therefore, when the resist film is used as a mask pattern to etch the underlying wire layer, the joint portion where the wire layer does not exist is formed to a size that can be seen even in the uneven pattern of the wire grid. It will adversely affect the performance (various performances) as

Further, when the resin mold 500 shown in FIG. 32 is applied to imprint patterning on an etching resist film as will be described in detail later, the step portion may not adhere to the resist film 504 . In this case, since the concave-convex pattern of the resin mold in the portion where the contact is not adhered is not transferred to the resist film, when etching the remaining film in the concave portion of the resist, the resist film is not transferred in the portion where the concave-convex pattern is not transferred. is left without being etched. Therefore, in the technique of Patent Document 4, due to the above-described steps existing at the joints of the concave-convex patterns of the resin mold, the joints on the resist film become visible wide convex surfaces. There is
Therefore, when the resist film is used as a mask pattern to etch the lower wire layer, a joint portion where a wire layer having no uneven pattern is present in a wide width even in the uneven pattern of the wire grid can be visually observed. Since it is formed in such a size that it can be used, the performance (various performances) as a polarizer is adversely affected.

Therefore, there has been a demand for a large-area wire grid polarizer in which uneven patterns are connected such that the joints of unit pattern regions formed by transferring small-area unit molds are not visible.

The present disclosure has been made in view of the above circumstances, and provides a wire grid polarizer having uneven patterns connected so that the joints of unit pattern regions formed by transferring unit molds are not visible, and the wire grid polarizer. An object of the present invention is to provide a display device with a grid polarizer.

One embodiment of the present disclosure is a wire grid polarizer including a wire layer formed of a conductive material on a base material, wherein the wire layer has two or more linear uneven patterns that are the same or different from each other. and one or more imperfect regions that form a boundary connecting two adjacent perfect regions and can be recognized by an electron microscope, and the width of the imperfect region is 2 μm wherein the imperfect region provides a wire grid polarizer that satisfies at least one of the following conditions (i) or (ii).
Condition (i):
It has a planar view shape different from the planar view shape of the linear concave-convex pattern of either of the complete regions existing on both sides of the boundary.
Condition (ii):
The average height of the projections of the surface unevenness shape of the incomplete region is lower than the height of the surface formed by the projections of the linear uneven pattern of whichever perfect region exists on both sides of the boundary.

In one embodiment of the present disclosure, a wire grid polarizer is provided in which one complete region and the other complete region have the same height of the plane formed by the convex portions of the linear concave-convex pattern of the complete region. .

In one embodiment of the present disclosure, a wire grid polarizer is provided in which the imperfect regions have varying widths.

In one embodiment of the present disclosure, there is provided a wire grid polarizer in which the width variation of the imperfect regions in the one embodiment of the present disclosure is free of periodicity.

In one embodiment of the present disclosure, the extending direction of at least part of the incomplete region is a linear shape included in at least one of the complete regions existing on both sides of the boundary formed by the incomplete region. A wire grid polarizer is provided that is tilted with respect to the extending direction of the projections.

In one embodiment of the present disclosure, the extending direction of at least part of the incomplete region is included in one of the complete regions existing on both sides of the boundary formed by the incomplete region. Provided is a wire grid polarizer that is inclined with respect to both the extending direction of linear projections and the extending direction of second linear projections included in the other.

In one embodiment of the present disclosure, a polygonal complete area is included, and three boundary portions formed by the incomplete areas are gathered and connected to at least one vertex of the polygonal complete area. A wire grid polarizer is provided having a portion.

In one embodiment of the present disclosure, there is provided a display device comprising the wire grid polarizer of one embodiment of the present disclosure.

An embodiment of the present disclosure is a wire grid polarizer in which uneven patterns are connected so that the joints of unit pattern regions formed by transferring unit molds are not visible, and a display device including the wire grid polarizer. can be provided.

FIG. 1(A) is a schematic plan view schematically showing an example of a wire grid polarizer, and FIG. 1(B) is a partially enlarged plan view of FIG. 1(A). FIG. 2(A) is a schematic cross-sectional view taken along line A-A' in FIG. 1(B), and FIG. 2(B) is a partially enlarged cross-sectional view of FIG. 2(A). FIG. 3 is an enlarged plan view of the region whose cross section is shown in FIG. 2(B) and its neighboring region. FIG. 4A is a schematic cross-sectional view along line A-A' in FIG. 1B, and FIG. 4B is a partially enlarged cross-sectional view of FIG. 4A. FIG. 5 is an enlarged plan view of the region whose cross section is shown in FIG. 4B and its vicinity. FIG. 6A is a schematic cross-sectional view along line A-A' in FIG. 1B, and FIG. 6B is a partially enlarged cross-sectional view of FIG. 6A. FIG. 7A is a schematic cross-sectional view along line A-A' in FIG. 1B, and FIG. 7B is a partially enlarged cross-sectional view of FIG. 7A. FIG. 8A is a schematic cross-sectional view along line A-A' in FIG. 1B, and FIG. 8B is a partially enlarged cross-sectional view of FIG. 8A. FIG. 9A is a schematic plan view showing an enlarged part of the wire grid polarizer of the present disclosure, and FIGS. 9B and 9C show a part of FIG. It is a figure expanded and shown. FIG. 10(A) is a schematic plan view showing an enlarged part of the wire grid polarizer of the present disclosure, and FIG. 10(B) is an enlarged view showing a part of FIG. 10(A). be. FIG. 11(A) is a schematic plan view showing an enlarged part of the wire grid polarizer of the present disclosure, and FIG. 11(B) is an enlarged view showing a part of FIG. 11(A). be. FIG. 12(A) is a schematic plan view showing an enlarged part of the wire grid polarizer of the present disclosure, and FIG. 12(B) is an enlarged view showing a part of FIG. 12(A). be. FIG. 13(A) is a schematic plan view showing an enlarged part of the wire grid polarizer of the present disclosure, and FIG. 13(B) is an enlarged view showing a part of FIG. 13(A). be. FIG. 14 is a schematic plan view showing an enlarged portion of the wire grid polarizer of the present disclosure. FIG. 15 is a schematic plan view showing an enlarged portion of the wire grid polarizer of the present disclosure. FIG. 16 is a schematic plan view showing an enlarged portion of the wire grid polarizer of the present disclosure. FIG. 17 is a schematic plan view showing an enlarged portion of the wire grid polarizer of the present disclosure. FIG. 18 is a schematic plan view showing an enlarged portion of the wire grid polarizer of the present disclosure. FIG. 19 is a schematic plan view showing an enlarged portion of the wire grid polarizer of the present disclosure. FIG. 20 is a diagram schematically showing an example of steps for manufacturing a resin mold used for manufacturing the wire grid polarizer of the present disclosure. FIG. 21 is a diagram schematically showing an example of steps for manufacturing a resin mold used for manufacturing the wire grid polarizer of the present disclosure. FIG. 22 is a diagram schematically showing an example of steps for manufacturing a wire grid polarizer of the present disclosure. FIG. 23 is a diagram schematically showing an example of steps for manufacturing a resin mold used for manufacturing the wire grid polarizer of the present disclosure. FIG. 24 is a diagram schematically showing an example of steps for manufacturing a wire grid polarizer of the present disclosure. FIG. 25 is a diagram schematically showing an example of steps for manufacturing a resin mold used for manufacturing the wire grid polarizer of the present disclosure. FIG. 26 is a diagram schematically showing an example of steps for manufacturing a wire grid polarizer of the present disclosure. FIG. 27 is a diagram schematically showing an example of steps for manufacturing a resin mold used for manufacturing the wire grid polarizer of the present disclosure. FIG. 28 is a diagram schematically showing an example of steps for manufacturing a wire grid polarizer of the present disclosure. FIG. 29(A) is a schematic cross-sectional view taken along line A-A' in FIG. 1(B), and FIG. 29(B) is a partially enlarged cross-sectional view of FIG. 29(A). FIG. 30 is an enlarged plan view of the region whose cross section is shown in FIG. 29(B) and its neighboring region. FIG. 31 is a cross-sectional view showing an image display device of the present disclosure. FIG. 32 is a diagram showing a superimposed state of the basic fine structure patterns obtained by the embodiment of the prior art (Patent Document 4). 33 is a diagram showing a resist layer to which a negative pattern of the basic fine structure pattern shown in FIG. 32 has been transferred; FIG.

A wire grid polarizer and a display device according to the present disclosure will be described in detail below.
In addition, the terms such as "parallel", "perpendicular", "same" and the like, length and angle values, etc. that specify shapes and geometric conditions and their degrees used in this specification are strictly It shall be interpreted to include the extent to which similar functions can be expected without being bound by the meaning.
Moreover, in this specification, (meth)acryl represents each of acryl and methacryl.
In the present specification, "light" means actinic rays or radiation, and examples thereof include emission line spectra of mercury lamps, far ultraviolet rays represented by excimer lasers, extreme ultraviolet rays (EUV light), X-rays, electron beams, and the like. It is included.

I. Wire Grid Polarizer The wire grid polarizer of the first embodiment of the present disclosure is a wire grid polarizer including a wire layer formed of a conductive material on a base material, wherein the wire layers are the same as each other. or two or more complete regions each having different linear uneven patterns, and one or two or more incomplete regions that form a boundary connecting two adjacent complete regions and can be recognized by an electron microscope. In the wire grid polarizer, the imperfect region has a width of 2 μm or less, and the imperfect region satisfies at least one of the following conditions (i) or (ii).
Condition (i): It has a plan view shape that is different from the plan view shape of the linear concavo-convex pattern of either of the complete regions existing on both sides of the boundary.
Condition (ii): The average height of the projections of the uneven surface shape of the incomplete region is greater than the height of the surface formed by the projections of the linear uneven pattern of whichever perfect region exists on both sides of the boundary. is also low.

An embodiment of the present disclosure will be described below with reference to the drawings.
In addition, in the drawings attached to this specification, for convenience of illustration and ease of understanding, there are cases where the reduced scale, vertical and horizontal dimension ratios, etc. are changed and exaggerated from those of the real thing.
FIG. 1(A) is a schematic plan view schematically showing an example of a wire grid polarizer, and FIG. 1(B) is a partially enlarged plan view of FIG. 1(A).

[Wire grid polarizer]
A wire grid polarizer 100 of the present disclosure includes a wire layer 10 formed of a conductive material on a substrate 50, as shown in FIG. 1(A).
In the example shown in FIG. 1, the wire layer 10 is configured by repeatedly arranging two or more complete regions 10A, 10B, 10C, 10D, . . . having the same linear uneven pattern.
In the present disclosure, the complete region of the wire grid polarizer is a region in which a negative pattern of the concave-convex pattern corresponding to the unit mold is formed by transferring the concave-convex pattern of the unit mold.

In the example shown in FIG. 1B, each of the complete regions 10A, 10B, 10C, 10D, . These complete regions 10A, 10B, 10C, 10D, . Hereinafter, recesses formed between linear protrusions 13 in each of the complete regions 10A, 10B, 10C, 10D, . . . are referred to as linear recesses 14 .

FIG. 2(A) is a schematic cross-sectional view taken along line AA' of FIG. 1(B), and FIG. 2(B) is a partially enlarged cross-sectional view of FIG. 2(A). FIG. 3 is an enlarged plan view of the region whose cross section is shown in FIG. 2(B) and its neighboring region.
Note that FIG. 2(A), and FIGS. 4(A), 6(A) to 8(A), and 29(A) which will be described later show different wire grid polarizers of FIG. 1(B). 2A, 4A, and 6A to FIG. 8(A) and FIG. 29(A) are both schematic sectional views taken along the line AA' of FIG. 1(B).
That is, FIG. 1(A) shows FIG. 2(A), and each wire whose schematic cross-sectional views are shown in FIG. 4(A), FIGS. 4A and 4B are each shown as a schematic plan view of a grid polarizer.
In the wire grid polarizer 100 of the present disclosure, one complete region 10A and the other complete region 10B preferably have the same height of planes (11A and 11B) formed by convex portions of the respective complete regions. . Here, the surface or plane formed by the projections means a virtual surface or a virtual plane connecting the tops of the projections.
In the present disclosure, when a virtual plane connecting the apexes of the convex portions of the complete region is assumed to be a virtual plane, or in the range where the height of the plane formed by the convex portions of the complete region is the same, each complete An error range within 10% of the average height of the projections included in the region is included.

In the wire grid polarizer 100 of the present disclosure, when one of two arbitrary adjacent perfect regions is 10A and the other perfect region adjacent to the perfect region 10A is 10B, these perfect regions 10A , 10B, and has an imperfect region 20 forming the boundary connecting the . That is, the imperfect area is an area corresponding to the joint portion of the area corresponding to the unit pattern area formed by transferring the unit mold.

In the wire grid polarizer of the present disclosure, the “boundary portion connecting the complete regions (that is, the “joint”)” is a portion that interrupts the regularity of the linear uneven patterns. are connected, the same linear concavo-convex pattern is connected, but the continuity of the pattern cycle is interrupted and a new cycle is recognized, the same linear concavo-convex pattern is connected and the pattern cycle Although the continuity is also maintained, there can be exemplified a portion that is recognized as forming a blank area where the continuity of the pattern period is interrupted.

In FIG. 2, of the complete regions included in the wire grid polarizer 100, the two adjacent complete regions 10A and 10B are the linear protrusions 13 included in the linear uneven pattern of the complete region 10A. is parallel to the extending direction of the linear protrusions 13 included in the linear uneven pattern of the complete area 10B, and the linear protrusions 13 and the linear recesses included in the complete area 10A are parallel to each other. The complete regions 10A and 10B are arranged such that the direction in which the linear protrusions 13 and the linear recesses 14 included in the complete region 10B are alternately arranged is connected to the direction in which the linear protrusions 14 are alternately arranged, The imperfect region 20 forming a boundary connecting the complete regions 10A and 10B extends in the same direction as the linear projections included in the complete regions 10A and 10B.
On the other hand, in FIG. 1, the two adjacent complete regions 10B and 10D are defined by the extending direction of the linear protrusions 13 included in the linear uneven pattern of the complete region 10B and the linear uneven pattern of the complete region 10D. and the extending direction of the linear protrusions 13 included in the complete region 10B is the same as the extending direction of the linear protrusions 13 included in the complete region 10B. The complete regions 10B and 10D are arranged so that the complete regions 10B and 10D are connected, and the incomplete region 20 forming the boundary connecting the complete regions 10B and 10D is included in the complete regions 10B and 10D. It extends in a direction perpendicular to the extending direction of the linear projection 13 .
In the present disclosure, the extending direction of the linear concavo-convex pattern included in the complete area and the imperfect area forming the boundary of the complete area may form an arbitrary angle.

In the wire grid polarizer 100 of the present disclosure, the incomplete regions 20 are at least any two adjacent perfect regions when the linear uneven pattern surface of the wire grid polarizer 100 is observed using an electron microscope. The area that can be recognized as the boundary connecting
As an electron microscope, for example, a scanning electron microscope (SEM, for example, Hitachi High-Technologies Corporation: Scanning Electron Microscope SU-8000) can be used. Observation with a scanning electron microscope (SEM) can be performed, for example, at an acceleration voltage of 15 kV and an imaging magnification of 25000 times.

When the width of the imperfect region 20 is less than 75 nm, it becomes difficult to recognize the imperfect region 20 by observation with an electron microscope. It is practically difficult to connect the concavo-convex patterns so that the width of the complete region 20 is less than 75 nm, and is not suitable for mass production.

The wire grid polarizer of the present disclosure may have at least one imperfect region 20 as described above, but may have two or more imperfect regions 20 as shown in FIG.
For example, in FIG. 1B, between the complete area 10A and the complete area 10B, between the complete area 10B and the complete area 10D, between the complete area 10D and the complete area 10C, and between the complete area 10A and the complete area 10C and each have an imperfect region 20, and there are four imperfect regions 20 in total.
In FIG. 1B, the incomplete region 20 between the complete regions 10A and 10B and the incomplete region 20 between the complete regions 10C and 10D extend in the same direction. , which are connected at one end side and extend continuously, but in the present disclosure, a region forming a boundary connecting two adjacent complete regions is Since it is counted as one incomplete area 20, even in the form described above, the incomplete area 20 between the complete area 10A and the complete area 10B and the incomplete area 20 between the complete area 10C and the complete area 10D Regions 20 are considered separate imperfect regions and count as two imperfect regions.

In the wire grid polarizer 100 of the present disclosure, the imperfect regions 20 are regions that satisfy at least one of the following conditions (i) or (ii).

(Condition (i))
It has a planar view shape different from the planar view shape of the linear concave-convex pattern of either of the complete regions existing on both sides of the boundary.

(Condition (ii))
The average height of the projections of the surface unevenness shape of the incomplete region is lower than the height of the surface formed by the projections of the linear uneven pattern of either perfect region existing on both sides of the boundary.

As an example of the case where the incomplete region 20 has a planar view shape different from the planar view shape of the linear concavo-convex pattern of either of the perfect regions existing on both sides of the boundary, for example, the surface of the wire grid polarizer 100 is When viewed flat,
(a) As shown in FIGS. 2A, 2B, and 3, the width 131a of the linear protrusions 13a of the linear uneven pattern of the complete area 10A and the line of the linear uneven pattern of the complete area 10B When having a convex portion 22 having a width larger than any of the widths 131b of the convex portions 13b,
(b) As shown in FIGS. 4A, 4B, and 5, the width 141a of the linear concave portion 14a of the linear concave-convex pattern of the complete region 10A and the linear shape of the linear concave-convex pattern of the complete region 10B. A typical example is the case where the recess 23 has a width greater than any of the widths 141b of the recess 14b.

Examples of the case where the incomplete region 20 has a plan view shape that is different from the plan view shape of the linear concavo-convex pattern of any of the complete regions existing on both sides of the boundary are shown in FIGS. It is not limited to the examples (a) and (b) shown in FIGS. 4A and 4B.
For example, although not shown, when the surface of the wire grid polarizer is viewed in plan,
(c) has a width smaller than either of the width 131a of the linear protrusions 13a of the linear uneven pattern of the complete area 10A and the width 131b of the linear protrusions 13b of the linear uneven pattern of the complete area 10B. When having a convex part,
(d) A concave portion having a width smaller than either of the width 141a of the linear concave portion 14a of the linear concave-convex pattern of the complete region 10A and the width 141b of the linear concave portion 14b of the linear concave-convex pattern of the complete region 10B. if you have
(e) Even when the width of the linear uneven pattern varies in the extending direction,
An example of the case where the imperfect region 20 has a plan view shape different from the plan view shape of the linear concave-convex pattern of either of the complete regions existing on both sides of the boundary is given.

Examples in which the imperfect region 20 satisfies the above condition (i) are not limited to the examples shown in (a) to (e) above. For example, as shown in FIG. , the linear protrusions are missing, the uneven shape is substantially eliminated, and the height is approximately the same as the surface formed by the recesses of the linear uneven patterns of the complete areas 10A and 10B (virtual plane or virtual plane connecting the bottom points of the recesses). In the case where the imperfect region 20 is formed by the flat surface, or as shown in FIG. The case where the imperfect region 20 is formed by a surface having substantially the same height as the surface (virtual surface or virtual plane connecting the vertices of each convex portion) formed by the portion is also cited as an example that satisfies the above condition (i). be done.
In the case of the manufacturing method described later, the average height of the projections of the uneven surface shape of the imperfect region 20 is the perfect region 10A existing on both sides of the boundary formed by the imperfect region 20. The height of the surface formed by the protrusions of the linear uneven pattern is lower than the height of the surface formed by the protrusions of the linear uneven pattern of the complete area 10B, or the height of the surface formed by the protrusions of the linear uneven pattern of the complete area 10A. It is the same as the height of the surface formed or the height of the surface formed by the convex portions of the linear concave-convex pattern of the complete region 10B.

1 to 7, the linear protrusions 13 forming the linear uneven patterns of the complete regions 10A, 10B, 10C, 10D, . In this case, the width of each linear convex portion in each complete area 10A, 10B, 10C, 10D . . . Width of the linear convex portion of the linear concave-convex pattern”.
1 to 7, the linear concave portions 14 forming the linear concave-convex patterns of the complete regions 10A, 10B, 10C, 10D, . In this case, the width of each linear recess in each of the complete regions 10A, 10B, 10C, 10D . The width of the linear concave portion of the concave-convex pattern”.

1 to 7, an example in which each of the complete regions 10A, 10B, 10C, 10D, . . . has the same linear uneven pattern has been described. In the case where the incomplete region 20 has an uneven pattern, if the incomplete region 20 has a plan view shape different from any of the plane view shapes of the linear uneven patterns of the complete regions existing on both sides of the imperfect region 20, the imperfect region 20 can satisfy the above condition (i).

(Condition (ii))
Further, as shown in FIG. 8, the average height of the projections of the surface unevenness shape of the incomplete region 20 is the height of the surface 11A formed by the projections of the linear uneven pattern of the complete region 10A, and the height of the complete region 10A. When the height of the surface 11B formed by the convex portions of the linear concave-convex pattern of 10B is lower than any of the heights, the planar view shape of the incomplete region 20 is different from the planar view shape of the complete region 10A or the complete region 10B. Even if they are the same, the above condition (ii) can be satisfied.

In the present disclosure, the “average height of the convex portions of the uneven surface shape of the incomplete region 20” is the height of all the convex portions included in the incomplete region 20, and the average of the measured heights Calculate and obtain the value.
In addition, in the present disclosure, the height of the convex portion is measured from the surface of the base material 50 to the apex of the convex portion.

In the wire-grid polarizer of the present disclosure, the incomplete region 20 may satisfy at least one of the condition (i) or the condition (ii), as described above.
For example, even if the planar view shape of the incomplete region is the same as the planar view shape of the linear uneven pattern of the complete region 10A or the planar view shape of the linear uneven pattern of the complete region 10B, the incomplete region 20 is the height of the surface 11A formed by the protrusions of the linear uneven pattern of the complete region 10A, and the surface formed by the protrusions of the linear uneven pattern of the complete region 10B. If it is lower than any of the heights of 11B, it may satisfy the condition as an incomplete region in the wire grid polarizer of the present disclosure.
Further, for example, the average height of the projections of the surface unevenness shape of the incomplete region 20 is the height of the surface formed by the projections of the linear uneven pattern of the complete region 10A, or the linear unevenness of the complete region 10B. Even if the height is the same as the height of the surface formed by the projections of the pattern, the incomplete region 20 has the plan view shape of the linear concavo-convex pattern of the complete region 10A and the plane of the linear concavo-convex pattern of the complete region 10B. If it has a planar view shape different from any of the visible shapes, it may satisfy the conditions of an incomplete region in the wire grid polarizer of the present disclosure.

In the wire grid polarizer 100 of the present disclosure, the width 21 of the imperfect regions 20 is 2 μm or less.
Here, the width 21 of the incomplete region 20 is the distance between the point 24 at the end of the one complete region 10A and the shortest point 25 among the ends of the adjacent complete region 10B. means the distance between
The width 21 of the imperfect region 20 is preferably as small as possible, more preferably within 1.5 μm, even more preferably within 1 μm, as long as it can be recognized by an electron microscope.

In the prior art, the width of the imperfect region 20 forming a boundary connecting one complete region and the other complete region adjacent to the one complete region is large and visible, and the imperfect region is not visible. Compared to the linear uneven pattern of the complete areas existing on both sides, the areas where the linear convex portions are missing or where the linear convex portions remain wide are large enough to be visually recognized as defects in the linear uneven pattern. Compared to the linear uneven pattern of the complete area existing on both sides of the incomplete area, the convex part of the surface uneven shape is higher than the height of the surface formed by the convex part of the linear uneven pattern A region with a low average height of the linear concave-convex pattern has a size that can be visually observed as a defect in the linear concave-convex pattern, which adversely affects the performance as a polarizer exhibited by the linear concave-convex pattern. .
In the wire grid polarizer 100 of the present disclosure, the width 21 of the imperfect region 20 is 2 μm or less. Defects in the pattern are too large to be visually observed or are difficult to be visually observed, and the adverse effect of the linear uneven pattern on the performance of the polarizer can be suppressed.

In the examples shown in FIGS. 1 to 8, as a typical example, the linear projections 13 included in the linear projections and depressions patterns of the complete regions 10A, 10B, 10C, 10D, . Although an example in which the existing directions are parallel to each other has been shown, the wire grid polarizer of the present disclosure is not limited to such a form. , the extending direction of the linear protrusions included in the linear uneven pattern of one complete area and the extending direction of the linear protrusions included in the linear uneven pattern of the other complete area are at right angles, for example. Each linear uneven pattern may be formed as shown in FIG. Each of the linear uneven patterns may be formed such that the extending direction of the linear convex portions included in the line advances obliquely at a predetermined angle of less than 180°.
Further, in the examples shown in FIGS. 1 to 8, as a typical example, the periods of the linear uneven patterns of the complete regions 10A, 10B, 10C, 10D, . . . Although shown, the wire grid polarizer of the present disclosure is not limited to such a form. may be different from each other in terms of the period and line width of the linear concave-convex pattern of the other complete area.
In the present disclosure, the “period of the linear uneven pattern” represents the pitch size, specifically, the interval between the centers of adjacent linear protrusions 13, and the line width is the width of one line. It means the width of the convex portion 13 .

The width of the imperfect region 20 does not necessarily have to be constant as shown in FIG. 9B, and may vary along the direction in which the imperfect region 20 extends.
The imperfect region 20 includes one or more regions 201 in which the width of the imperfect region 20 gradually expands to become wider and then gradually shrinks to become narrower, as shown in FIG. 9C, for example. You can stay.
When the width of the imperfect region 20 fluctuates, if there is periodicity in the manner of fluctuation, a diffraction phenomenon or the like tends to occur, and the imperfect region 20 tends to be easily visible as a boundary. Therefore, when the width of the incomplete region 20 varies, it is preferable that the variation does not have periodicity, as shown in FIG.

In the present disclosure, the imperfect region 20 typically extends substantially linearly, but may extend curvedly as shown in FIG. 11, for example.

In addition, as shown in FIG. 12, at least a portion of the imperfect region 20 extends in at least one of the complete regions 10A and 10B existing on both sides of the boundary formed by the imperfect region 20. It is preferable that they are inclined with respect to the extending direction of the linear protrusions 13 included on one side.
In other words, linear projections included in at least one of the complete regions 10A and 10B existing on both sides of the extending direction of at least a part of the incomplete region 20 and the boundary formed by the incomplete region 20 It is preferable that the angle .theta.
In this case, since the proportion of the area where the side surfaces of the linear protrusions 13 are continuously exposed in the imperfect region 20 decreases, there is an advantage that the imperfect region 20 as the boundary becomes difficult to see.

In addition, as shown in FIG. 13, at least part of the imperfect region 20 has an extension direction of the complete region 10A and the complete region 10B existing on both sides of the boundary formed by the imperfect region 20. , are inclined with respect to both the extending direction of the linear protrusions 13 included in the complete area 10A and the extending direction of the linear protrusions 13 included in the complete area 10B.
In other words, the extending direction of at least a part of the incomplete region 20 is a linear shape included in the complete region 10A among the complete regions 10A and 10B existing on both sides of the boundary formed by the incomplete region 20. The angle θ _A formed with the extending direction of the convex portion 13 satisfies θ _A ≠0° and θ _A ≠180°, and the angle θ formed with the extending direction of the linear convex portion 13 included in the complete region 10B. Preferably, _B satisfies θ _B ≠0° and θ _B ≠180°.
In this case, as compared with the form shown in FIG. has the advantage of being more difficult to see.

Further, in the wire grid polarizer of the present disclosure, the planar shape of the complete area, that is, the two-dimensional shape when the wire layer is viewed from above is not limited to a rectangular shape such as a rectangle or square, and other polygons. It may be a shape or a shape composed of arbitrary curves. Examples of the shape of the complete area include rhombus, parallelogram, regular hexagon, equilateral triangle, and the like.
For example, the wire grid polarizer shown in FIG. 14 has a plurality of perfect regions 60 having a regular hexagonal shape. Complete areas 60 are connected and configured.
That is, as shown in FIG. 14, the wire grid polarizer includes a regular hexagonal complete region 60, and at least one vertex of the regular hexagonal complete region 60 is a boundary formed by the incomplete region 20. It has a connecting portion 61 in which three parts are gathered and connected. In other words, in the wire grid polarizer shown in FIG. 14, three regular hexagonal complete regions 60 are adjacent to each other while sharing one vertex.
Therefore, the wire grid polarizer shown in FIG. 14 has four boundaries formed by the incomplete regions 20 at the vertices of the quadrangular complete region 10, like the wire grid polarizer 100 shown in FIG. Compared to a structure in which the unit molds form a concavo-convex pattern of a complete area, misalignment is less likely to occur at the joint portion, so that a wire grid in which the incomplete area 20 is inconspicuous can be formed. .
In addition, the number of the boundaries formed by the imperfect regions 20 gathered at the vertices of the polygon can be determined, for example, by a scanning electron microscope (SEM, for example, manufactured by Hitachi High-Technologies Corporation: Scanning Electron Microscope SU-8000). , an acceleration voltage of 15 kV, and the number of lines confirmed when observed at an imaging magnification of 1000 times.

In addition, the wire grid polarizer of the present disclosure is not limited to those arranged so that all the complete regions included in the wire grid polarizer share all the vertices with adjacent complete regions, For example, as shown in FIG. 15, each complete area may be arranged so as not to share a portion of its vertices with adjacent complete areas.
That is, the wire grid polarizer shown in FIG. 15 includes square-shaped complete regions 70A, B, C, D, E, F, . The complete regions 70B, in which the convex portions 13 and the linear concave portions 14 are arranged adjacent to each other in the direction in which they are alternately arranged, share the vertex with each other, but the linear convex portions 13 included in the complete region 70A , do not share the vertex with the complete region 70C arranged adjacent to each other in the extending direction.
That is, the imperfect region 201 forming the boundary between the adjacent complete regions 70A and 70B and the imperfect region 202 forming the boundary between the adjacent complete regions 70C and 70D are shifted from each other. placed in position.
Therefore, the wire grid polarizer shown in FIG. 15 includes square perfect regions 70A, B, C, D, E, F, . It has a structure having a connecting portion 71 in which three boundary portions formed by the regions 20 are gathered and connected.
Therefore, the wire grid polarizer shown in FIG. 15 has four boundaries formed by the incomplete regions 20 at the vertices of the quadrangular complete regions 10, like the wire grid polarizer 100 shown in FIG. Compared to a structure in which the unit molds form a concavo-convex pattern of a complete area, misalignment is less likely to occur at the joint portion, so that a wire grid in which the incomplete area 20 is inconspicuous can be formed. .

In addition, the wire grid polarizer of the present disclosure is not limited to one in which all complete regions included in the wire grid polarizer have the same size. The complete regions 80A to 80H each having a square shape of 2.5 mm and the small-sized squares 80I to 80L may be arranged adjacent to each other.
That is, in the wire grid polarizer shown in FIG. 16, the complete area 80A and the complete area 80B having a large-sized square shape do not share their vertexes with each other, and form a linear convex portion included in the complete area 80A. The portions 13 and the linear recesses 14 are arranged adjacent to each other in the direction in which they are alternately arranged. Furthermore, in the wire grid polarizer, the small-sized complete region 80I is formed on the extension line of the boundary between the complete region 80A and the complete region 80B, along with the linear protrusions 13 and the linear recesses 14 included in the complete region 80A. are arranged so as to be adjacent to the complete area A so as to share a part of its vertices in the direction in which are arranged alternately.
In the wire grid polarizer shown in FIG. 16, the complete regions 80A to 80H having large squares and the complete regions 80I to 80L having small squares are arranged in a mosaic pattern as a whole. It is configured.
Therefore, the wire grid polarizer shown in FIG. 16 includes complete regions 80A to 80H having large square shapes and 80I to 80L having small square shapes, and the square complete regions 80A to 80H and At least one vertex of the complete regions 80I to 80L has a structure having a connecting portion 81 in which three boundary portions formed by the respective incomplete regions 20 are gathered and connected.
Therefore, in the wire grid polarizer shown in FIG. 16, for example, like the wire grid polarizer 100 shown in FIG. Compared to a structure in which the unit molds form a concavo-convex pattern of a complete area, misalignment is less likely to occur at the joint portion, so that a wire grid in which the incomplete area 20 is inconspicuous can be formed. .

Further, in the wire grid polarizer of the present disclosure, all the complete regions included in the wire grid polarizer are not limited to having the same shape, and the complete regions having different shapes are arranged next to each other. It may have an arranged structure.

14, the extending direction of the incomplete regions 204 to 212 is the extension of the linear projections 13 included in the complete regions 60 existing on both sides of the boundary formed by the incomplete regions 204 to 212. Although an example in which it is parallel to the existing direction is shown, in the form including the regular hexagonal complete regions 60A to 60M, the extending direction of at least a part of the incomplete region 20 is formed by the incomplete region 20. It is preferable to incline with respect to the extending direction of the linear projections 13 included in at least one of the complete regions 60 existing on both sides of the boundary, and as shown in FIG. is inclined with respect to the extending direction of the linear projections 13 included in the complete regions 60 existing on both sides of the boundary formed by the incomplete region 20. preferable.
In the example shown in FIG. 17, the extending direction of the linear protrusions 13 included in the complete area 60A is the extending direction of the line segment connecting the opposing vertexes _60A1 and _60A2 of the regular hexagon of the complete area 60A. , and the extending direction of the linear convex portion 13 included in the complete area 60D is the opposite vertex _60D1 and vertex _60D2 of the complete area 60D. is inclined at a predetermined angle θ with respect to the extending direction of the line segment connecting . As a result, the extending direction of the incomplete region 204 forming the boundary between the complete region 60A and the complete region 60D is aligned with the extending direction of the linear protrusions 13 included in the complete region 60A and the line extending included in the complete region 60D. are inclined at a predetermined angle .theta.
In the example shown in FIG. 17, the imperfect regions 205 to 212 other than the imperfect region 204 also exist on both sides of the boundary formed by the imperfect regions 205 to 212, respectively. The extending direction of the linear projections 13 included in the region 60 is inclined at a predetermined angle θ with respect to the extending direction of the line segment connecting the opposing vertexes of the regular hexagons of each complete region 60 . As a result, the extending direction of the incomplete regions 205 to 212 is aligned with the extending direction of the linear projections 13 included in the complete regions 60 existing on both sides of the boundary formed by the incomplete regions 205 to 212. is inclined at a predetermined angle .theta.
Further, in the example shown in FIG. 17, the incomplete region 213 forming the boundary between the complete region 60A and the complete region 60B, for example, also extends in the same direction as the linear projections 13 included in the complete region 60A. and the extending direction of the linear projections 13 included in the complete area 60B, respectively, at predetermined angles. Furthermore, an imperfect region (eg, imperfect region 214) extending in a direction parallel to the extending direction of the imperfect region 213 similarly extends in a direction parallel to the boundary formed by the imperfect region. It is inclined at a predetermined angle with respect to the extending direction of the linear projections 13 included in the complete regions 60 present on both sides.
Further, in the example shown in FIG. 17, the incomplete region 215 forming the boundary between the complete region 60A and the complete region 60E, for example, also extends in the same direction as the linear projections 13 included in the complete region 60A. and the extending direction of the linear projections 13 included in the complete area 60E, respectively, at predetermined angles. Furthermore, an imperfect region (for example, imperfect region 216) extending in a direction parallel to the extending direction of imperfect region 215 similarly extends in the direction of the boundary formed by the imperfect region. It is inclined at a predetermined angle with respect to the extending direction of the linear projections 13 included in the complete regions 60 present on both sides.
17, compared with the form shown in FIG. Since the ratio of the area where the side surface of the linear projection 13 is continuously exposed is further reduced, there is an advantage that the incomplete area 20 as the boundary becomes more difficult to see.

Further, in FIG. 15, the extending direction of the imperfect regions 201 to 203 is the extension of the linear protrusions 13 included in the complete region 70 existing on both sides of the boundary formed by the imperfect regions 201 to 203. Although an example in which it is parallel to the existing direction has been shown, in a mode including square-shaped complete regions 70A, B, C, D, E, F, . is inclined with respect to the extending direction of the linear protrusions 13 included in at least one of the complete regions 70 existing on both sides of the boundary formed by the incomplete regions 201 to 203. , as shown in FIG. 18, the extending direction of at least part of the incomplete regions 201 to 203 is a line included in the complete region 70 existing on both sides of the boundary formed by the incomplete regions 201 to 203. It is preferable to incline with respect to the extending direction of the convex portion 13 .
In the example shown in FIG. 18, the extending direction of the linear protrusions 13 included in the complete area 70A is a predetermined direction with respect to the extending direction of the perpendicular to the opposite square sides _70A1 and _70A2 of the complete area 70A. , and the extending direction of the linear projections 13 included in the complete area 70B is with respect to the extending direction of the perpendicular to the opposite sides _70B1 and _70B2 of the square of the complete area 70B. , and is inclined at a predetermined angle θ. As a result, the extending direction of the incomplete region 201 forming the boundary between the complete region 70A and the complete region 70B is the same as the extending direction of the linear protrusions 13 included in the complete region 70A and the line extending included in the complete region 70B. are inclined at a predetermined angle .theta.
In the example shown in FIG. 18, the imperfect regions 202 to 203 other than the imperfect region 201 are also the imperfect regions 202 to 203 existing on both sides of the boundary formed by the imperfect regions 202 to 203, respectively. The extending direction of the linear projections 13 included in the area 70 is inclined at a predetermined angle θ with respect to the extending direction of the perpendicular to the opposite sides of the square of each complete area 70 . , the extending directions of the incomplete regions 202 and 203 with respect to the extending direction of the linear protrusions 13 included in the complete regions 70 existing on both sides of the boundary formed by the incomplete regions 202 and 203, It is tilted at a predetermined angle θ.
Further, in the example shown in FIG. 18, for example, an incomplete region 217 forming a boundary portion between the complete region 70A and the complete region 70C also extends in the same direction as the linear projections 13 included in the complete region 70A. It is inclined at a predetermined angle with respect to both the existing direction and the extending direction of the linear convex portion 13 included in the complete region 70C. Furthermore, an imperfect region (for example, imperfect region 218) extending in a direction parallel to the extending direction of imperfect region 217 similarly extends in a direction parallel to the boundary formed by the imperfect region. It is inclined at a predetermined angle with respect to the extending direction of the linear projections 13 included in the complete regions 70 present on both sides.
Compared with the form shown in FIG. 15, the form shown in FIG. Since the proportion of continuously exposed regions is further reduced, there is an advantage that the incomplete region 20 as a boundary becomes more difficult to see.

16, the extending direction of the incomplete regions 219 to 231 is the extension of the linear protrusions 13 included in the complete regions 80 existing on both sides of the boundary formed by the incomplete regions 219 to 231. Although an example in which it is parallel to the existing direction has been shown, in the embodiment including the square-shaped complete regions 80A to 80L, the extending direction of at least part of the incomplete regions 219 to 231 is parallel to the direction in which the incomplete regions 219 to 231 extend. It is preferable to incline with respect to the extending direction of the linear projections 13 included in at least one of the complete regions 80 existing on both sides of the formed boundary, and as shown in FIG. The extending direction of at least part of the complete regions 219 to 231 is with respect to the extending direction of the linear protrusions 13 included in the complete regions 80 existing on both sides of the boundary formed by the incomplete regions 219 to 231. and preferably slanted.
In the example shown in FIG. 19, the extending direction of the linear protrusions 13 included in the complete area 80A is predetermined with respect to the extending direction of the perpendicular to the opposite _square sides _80A1 and 80A2 of the complete area 80A. , and the extending direction of the linear protrusions 13 included in the complete area 80B is with respect to the extending direction of the perpendicular to the opposite _square sides _80B1 and 80B2 of the complete area 80B. , and is inclined at a predetermined angle θ. As a result, the extending direction of the incomplete region 219 forming the boundary between the complete region 80A and the complete region 80B is the same as the extending direction of the linear protrusions 13 included in the complete region 80A and the line extending included in the complete region 80B. are inclined at a predetermined angle .theta.
In the example shown in FIG. 19, the imperfect regions 220 to 231 other than the imperfect region 219 are, like the imperfect region 219, the respective imperfect regions existing on both sides of the boundary formed by the imperfect regions 220 to 231, respectively. The extending direction of the linear protrusions 13 included in the area 80 is inclined at a predetermined angle θ with respect to the extending direction of the perpendicular to the opposite sides of the square of each complete area 80 . , the extending direction of the incomplete regions 220 to 231 is relative to the extending direction of the linear protrusions 13 included in the complete regions 80 existing on both sides of the boundary formed by the incomplete regions 220 to 231, It is tilted at a predetermined angle θ.
Further, in the example shown in FIG. 19, the incomplete region 232 forming the boundary between the complete region 80A and the complete region 80C, for example, also extends in the same direction as the linear projections 13 included in the complete region 80A. and the extending direction of the linear projections 13 included in the complete area 80C, respectively, at predetermined angles. Furthermore, an imperfect region extending in a direction parallel to the extending direction of the imperfect region 232 (for example, an imperfect region 233 or an imperfect region 234) is similarly formed by the imperfect region. It is tilted at a predetermined angle with respect to the extending direction of the linear projections 13 included in the complete regions 80 existing on both sides of the boundary.
Compared with the form shown in FIG. 16, the form shown in FIG. Since the proportion of continuously exposed regions is further reduced, there is an advantage that the incomplete region 20 as a boundary becomes more difficult to see.

The substrate 50 of the wire grid polarizer of the present disclosure is not particularly limited as long as it has the function of transmitting light and supporting the wire layer 10. Examples include quartz glass, synthetic quartz, A rigid material such as magnesium fluoride, or a transparent flexible material such as a transparent resin film or an optical resin plate can be used.
In the present disclosure, the term “transparent” means that the light transmittance at a wavelength of 200 to 400 nm is 50% or more, preferably 70% or more. The light transmittance can be measured using V-650 manufactured by JASCO Corporation.
The thickness of the base material 50 can be appropriately selected according to the application, and is not particularly limited, but is usually in the range of about 10 μm or more and 1000 μm or less.

The conductive material forming the wire layer 10 of the wire grid polarizer of the present disclosure includes, for example, metals such as aluminum, gold, silver, copper, molybdenum silicide, and titanium oxide, conductive materials such as metal compounds, and dielectric materials. and any of these may be used alone or in combination. The thickness of the wire layer 10 is not particularly limited, but usually can be appropriately set within the range of 10 to 1000 nm.

The size of the linear concave-convex pattern formed by the wire layer 10 of the wire grid polarizer of the present disclosure has a period of 10 nm to 400 μm and a height of the convex portion (depth of the concave portion) of 10 nm to 1000 μm. mentioned.
As the linear concavo-convex pattern formed by the wire layer 10 of the wire grid polarizer of the present disclosure, a so-called fine concavo-convex pattern can be adopted. A linear concavo-convex pattern having a depth of 80 nm to 1000 nm is preferably used.

The size of the unit mold used for transferring the resin mold used in the manufacturing method of the wire grid polarizer of the present disclosure, which will be described later, is not particularly limited, but is usually within the range of 20 mm×20 mm to 300 mm×300 mm can be used. That is, the size of the complete area of the wire grid polarizers of the present disclosure is typically in the range of 20mm x 20mm to 300mm x 300mm.
However, the size of the unit mold is not limited to the range described above, and for example, a size of less than 20 mm×20 mm can be used. That is, the size of the complete area of the wire grid polarizer of the present disclosure is not necessarily limited to within the range of 20 mm×20 mm to 300 mm×300 mm, and may be smaller than 20 mm×20 mm, for example.
As for the size of the wire layer 10 of the wire grid polarizer of the present disclosure, the length of one side can be, for example, 20 mm or longer, further 100 mm or longer, and furthermore 300 mm or longer. However, the size of the wire layer 10 is not limited to the above range, and the length of one side may be less than 20 mm, for example.

[Method for producing wire grid polarizer]
The wire grid polarizer of the present disclosure may be manufactured by any method, and is not particularly limited. The wire grid polarizer of the present disclosure can be manufactured using, for example, a resin mold manufactured as follows.
20 and 21 are diagrams schematically showing an example of steps for manufacturing a resin mold used for manufacturing the wire grid polarizer of the present disclosure.
First, as shown in FIG. 20A, a concave-convex pattern forming substrate having a resin layer 41 over the entire pattern forming region and a unit mold 52 are prepared on a support 51 . The resin layer 41 in FIG. 20A is a resin layer containing a thermoplastic resin, and is softened by heating 53 . The resin layer 41 is provided so as to have a uniform height over the entire pattern forming region. It is preferable that the height of the resin layer is provided so that the variation is within the range of ±0.1 μm.
Next, as shown in FIG. 20B, by pressing the unit mold 52 against the softened resin layer 41 , the uneven pattern of the unit mold 52 is transferred to a part of the resin layer 41 .
Next, by cooling 54 the resin layer 41 while the unit mold 52 is pressed, the resin layer 41 is hardened to form a region having an uneven pattern in a part of the resin layer 41. Then, as shown in FIG. As shown in (C), the unit mold 52 is peeled off.
Next, as shown in FIG. 20(D), among the area (Y) where the uneven pattern is to be formed next and the area (X) having the uneven pattern, the area where the uneven pattern is to be formed next. Partial heating 53 of the resin layer 41 is performed including a portion of the side adjacent to (Y). By the partial heating 53, as shown in FIG. 20(E), the uneven pattern is formed next in the area (Y) where the uneven pattern is to be formed next and the area (X) having the uneven pattern. A part (X') of the resin layer on the side adjacent to the planned area (Y) is softened and becomes a state in which the shape can be transferred.

Next, as shown in FIG. 21(F), by pressing the unit mold 52 against the softened resin layer 41 , the uneven pattern of the unit mold 52 is transferred to a part of the resin layer 41 . Since the resin layer is softened in a part (X') of the region (X) having the concave-convex pattern, the concave-convex pattern of the unit mold 52 can be overwritten. By superimposing the unit mold 52 on a part (X') of the region (X) and transferring the pattern of the unit mold, no pattern is formed between the transferred patterns. , it is possible to connect the patterns of the unit molds of small area to each other and suppress the step at the joint of the unit molds.
As shown in FIG. 21(F), when the unit mold 52 is superimposed on the part (X') of the region (X), the edge of the unit mold 52 on the part (X') of the region (X) is part may press a part of the convex part included in the concave-convex pattern formed in a part (X') of the region (X) without forming a new concave-convex pattern, in which case , in the above (X′), the pressed convex portion is crushed to form a flat surface, or the height of the convex portion becomes lower than the height of the surface formed by the convex portions of the transfer uneven pattern region; A concave portion 55 (see FIG. 21(G)) wider than the concave portion of the transfer concave-convex pattern region is formed in a part of (X').
Next, by cooling 54 the resin layer 41 with the unit mold 52 pressed against it, the resin layer 41 is hardened to form a region having an uneven pattern in a part of the resin layer 41, and then, as shown in FIG. As shown in (G), the unit mold 52 is peeled off.
In this manner, as shown in FIG. 21(H), the concave-convex pattern of the unit mold 52 is transferred a plurality of times on the surface to form a portion that connects two adjacent transferred concave-convex pattern regions and is a concave portion. A resin layer 40 having a transfer boundary portion (Z) having 55 is provided on a support 51, and the resin in which the transfer uneven pattern region is connected so that the transfer boundary portion (Z), which is a joint portion, is not visible. A manufacturing mold 200A can be obtained.

Next, as shown in FIG. 22(I), a laminate is prepared in which an aluminum layer 302 and a silica layer 303 are laminated on a glass substrate 301 .
A resist layer 304 is formed by coating a photosensitive composition (resist) on the silica layer 303 of the laminated body in which an aluminum layer 302 and a silica layer 303 are laminated on the glass substrate 301 .
Next, as shown in FIG. 22(J), the resin mold 200A is pressed against the resist layer 304, and while the resin mold 200A is being pressed, exposure is performed from the resin mold 200A side to cure the resist layer 304 and the resist. The uneven pattern of the resin mold 200A is transferred to the layer 304 .
Next, the resin mold 200A is peeled off to obtain a laminate having a resist uneven pattern formed on the surface thereof, as shown in FIG. 22(K).
Next, after removing the residual film in the recesses of the resist uneven pattern by etching, as shown in FIGS. Etch 303 .
Dry etching is used as the etching, and examples of dry etching include reactive ion etching (RIE) in which ions are mainly involved, plasma etching (PE) in which radicals are mainly involved, and the like. As the etchant gas used in the dry etching, an etchant gas appropriately selected according to the material of the film to be dry-etched is used.
Next, as shown in FIG. 22(N), by using the silica layer 303 of the convex portion as a mask, the aluminum layer 302 exposed in the concave portion is etched to form a convex portion of the aluminum layer 302 on the glass substrate 301. A concave-convex pattern is formed. The convex silica layer 303 used as a mask is removed by a peeling treatment or etching as appropriate. Thus, the wire grid polarizer shown in FIG. 2(B) can be obtained.
The method for manufacturing a wire grid polarizer may include other conventionally known steps.
Here, according to the method of manufacturing the resin mold 200A described above, since the concave and convex patterns of the unit molds are connected in the resin mold 200A so that the joint portion (Z) is not visible, it is possible to transfer the material to be transferred. Likewise, on the resist, a concave-convex pattern in which the portion corresponding to the joint (Z) is invisible is transferred to a plurality of unit molds in one step. Therefore, as shown in FIG. 22(K), the planar view shape of the joint portion (Z) transferred to the resist layer 304 is different from the planar view shapes of the linear concavo-convex patterns existing on both sides thereof. Nevertheless, when the silica layer 303 is etched using the resist layer 304 as a mask, and the underlying aluminum layer 302 is etched using the silica layer 303 as a mask, the aluminum layer corresponding to the joint portion (Z) is formed. The joint portion in 302 has a width that cannot be visually observed, and an optical element with suppressed defects can be manufactured.
Further, even if there is a problem that when the remaining film of the recesses of the resist uneven pattern is etched, the pattern of the protrusions in the low part disappears when the recesses in the high part are matched, the width is such that the pattern cannot be visually observed. , an optical element with reduced defects can be manufactured.
As described above, the wire grid polarizer shown in FIGS. 2B and 3 has two or more complete regions 10A and 10B each having the same linear concave-convex pattern, and two adjacent complete regions 10A and 10B. and includes an imperfect region 20 which is a portion corresponding to the joint portion (Z) of the resin mold 200A described above, and the imperfect region 20 is the boundary portion It has a planar view shape different from the planar view shape of the linear concave-convex pattern of whichever of the complete regions 10A and 10B existing on both sides of the .

22(I) to (N) described above, the case of using the resin mold 200A obtained through the steps shown in FIGS. When the unit mold 52 is superimposed on a part (X') of the unit mold 52, as shown in FIG. A part of the convex part included in the uneven pattern formed in a part (X') of (X) may be pressed from the side surface. The projected portion is connected to the adjacent projected portion to be integrated, and a projected portion 56 wider than the projected portion of the transferred uneven pattern region is formed in a portion of (X′). In this case, the steps shown in FIGS. 23(F) to 23(H) are performed according to the same procedures as those described with reference to FIGS. A resin mold 200B shown in (H) can be obtained.
As shown in FIG. 23(H), the resin mold 200B is formed by transferring the concavo-convex pattern of the unit mold 52 a plurality of times on the surface of the resin mold 200B. A resin layer 40 having a transfer boundary portion (Z) having convex portions 56 is provided on a support 51, and the transferred concave-convex pattern regions are connected so that the transfer boundary portion (Z), which is a joint portion, cannot be seen. ing.

When using the resin mold 200B obtained by the steps shown in FIGS. By performing the steps shown in I) to (N), the wire grid polarizer shown in FIG. 4B can be obtained.
Here, according to the method of manufacturing the resin mold 200B described above, in the resin mold 200B, the concave and convex patterns of the unit molds are connected so that the joint portion (Z) cannot be seen, so that the transferred material Similarly, on the resist of , a concave-convex pattern in which the portion corresponding to the joint portion (Z) is invisible is transferred to a plurality of unit molds in one step. Therefore, as shown in FIG. 24(K), the planar view shape of the joint portion (Z) transferred to the resist layer 304 is different from the planar view shapes of the linear concave-convex patterns existing on both sides thereof. Nevertheless, when the silica layer 303 is etched using the resist layer 304 as a mask, and the underlying aluminum layer 302 is etched using the silica layer 303 as a mask, the aluminum layer corresponding to the joint portion (Z) is formed. The joint portion in 302 has a width that cannot be visually observed, and an optical element with suppressed defects can be manufactured.
As described above, the wire grid polarizer shown in FIGS. 4B and 5 has two or more complete regions 10A and 10B each having the same linear concave-convex pattern, and two adjacent complete regions 10A and 10B. and includes an imperfect region 20 which is a portion corresponding to the joint portion (Z) of the resin mold 200B described above, and the imperfect region 20 is the boundary portion It has a planar view shape different from the planar view shape of the linear concave-convex pattern of whichever of the complete regions 10A and 10B existing on both sides of the .

22(I) to (N) described above, the case of using the resin mold 200A obtained through the steps shown in FIGS. When the unit mold 52 is superimposed on a part (X') of the region (X), as shown in FIG. Due to the influence of the portion of the region (X) that is not softened, only the end portion (X') of the region (X) of the unit mold 52 is the region (Y ) may not be sufficiently pressed against the resin layer compared to the above, and in that case, the pressing of the unit mold 52 in the region (X′) is the unit mold 52 in the region (Y) where the uneven pattern is to be formed next. It becomes shallower than the pressure of the mold 52, and the height of the surface formed by the concave portions is higher than the height of the plane formed by the concave portions of the transfer concave-convex pattern region.
In this case, the steps shown in FIGS. 25(F) to 25(H) are performed according to the same procedures as those described with reference to FIGS. A resin mold 200C shown in (H) can be obtained.
As shown in FIG. 25(H), the resin mold 200C is formed by transferring the concavo-convex pattern of the unit mold 52 a plurality of times on the surface of the resin mold 200C. A resin layer 40 is provided on a support 51 and has a transfer boundary portion (Z) in which the height of the surface formed by the recesses is higher than the height of the plane formed by the recesses in the transfer uneven pattern region, which is a joint portion. The transfer concave-convex pattern areas are connected so that the transfer boundary (Z) cannot be visually observed.

When using the resin mold 200C obtained by the steps shown in FIGS. 25(F) to (H), the procedure shown in FIG. By performing the steps shown in I) to (N), the wire grid polarizer shown in FIG. 8B can be obtained.
Here, according to the method of manufacturing the resin mold 200C described above, in the resin mold 200C, the concave and convex patterns of the unit molds are connected so that the joint portion (Z) cannot be seen, so that the material to be transferred is Similarly, on the resist of , a concave-convex pattern in which the portion corresponding to the joint portion (Z) is invisible is transferred to a plurality of unit molds in one step. Therefore, as shown in FIG. 26(K), the average height of the projections of the surface irregularities in the portion corresponding to the joint portion (Z) transferred to the resist layer 304 is The resist layer 304 is used as a mask to etch the silica layer 303, and the silica layer 303 is used as a mask to etch the lower aluminum layer. When etching 302, the seam portion in the aluminum layer 302 corresponding to the seam portion (Z) has a width that cannot be seen visually, and an optical element in which defects are suppressed can be manufactured.
As described above, the wire grid polarizer shown in FIG. 8B connects two or more complete regions 10A and 10B each having the same linear concave-convex pattern and two adjacent complete regions 10A and 10B. The imperfect region 20, which is a portion forming a boundary portion and corresponds to the joint portion (Z) of the resin mold 200C described above, is included. is lower than the height of the surface formed by the convex portions of the linear concave-convex pattern of whichever of the complete regions 10A and 10B present on both sides of the boundary.

22(I) to (N) described above, the case of using the resin mold 200A obtained through the steps shown in FIGS. When the unit mold 52 is superimposed on a part (X') of the region (X), as shown in FIG. Depending on the degree of pressing force applied to the unit mold 52, only the end portion (X') of the region (X) of the unit mold 52 is placed on the region (Y) where the uneven pattern is to be formed next. In that case, the pressing of the unit mold 52 in a part of the region (X') is the unit in the region (Y) where the concave-convex pattern is to be formed next. It becomes deeper than the pressure of the mold 52, and the height of the surface formed by the convex portions is lower than the height of the plane formed by the convex portions of the transferred concave-convex pattern region (FIGS. 27(G) to (H). )reference).
In this case, the steps shown in FIGS. 27(F) to 27(H) are performed according to the same procedures as those described with reference to FIGS. A resin mold 200D shown in (H) can be obtained.
As shown in FIG. 27(H), the resin mold 200D is formed by transferring the concavo-convex pattern of the unit mold 52 a plurality of times on the surface of the resin mold 200D. A resin layer 40 having a transfer boundary portion (Z) in which the height of the plane formed by the projections is lower than the height of the plane formed by the projections of the transfer uneven pattern region is provided on the support 51, and the joint portion is provided. The transfer concave-convex pattern area is connected so that the transfer boundary (Z) is invisible.

When using the resin mold 200D obtained by the steps shown in FIGS. By performing the steps shown in I) to (N), the wire grid polarizer shown in FIG. 29B can be obtained.
In the steps shown in FIGS. 28I to 28N, as shown in FIG. is higher than the height of the plane formed by the recesses of either of the linear uneven patterns existing on both sides thereof, and the silica layer 303 is etched using the resist layer 304 as a mask. When the lower aluminum layer 302 is etched, the joint portion of the aluminum layer 302 corresponding to the joint portion (Z) is not etched to the extent that the glass substrate 301 is exposed in the concave portion, and a residual film remains. There is In this case, the concave/convex pattern of the aluminum layer 303 obtained by etching has a portion 26 where the convex portions are connected to each other by the residual film at the joint portion, as shown in FIG. 29(B). In this case, the shape of the portion 26 in plan view is visually recognized as a series of convex portions and concave portions. Therefore, as shown in FIG. 10B has a plan view shape that is different from the plan view shape of the linear concavo-convex pattern.
Here, according to the method of manufacturing the resin mold 200D described above, in the resin mold 200D, the concave and convex patterns of the unit molds are connected so that the joint portion (Z) cannot be seen, so that the transferred material Similarly, on the resist of , a concave-convex pattern in which the portion corresponding to the joint portion (Z) is invisible is transferred to a plurality of unit molds in one step.
Therefore, using the resist layer 304 as a mask (see FIG. 28K), the silica layer 303 is etched, and using the silica layer 303 as a mask, the underlying aluminum layer 302 is etched. Although the planar view shape of the joint portion in the aluminum layer 302 corresponding to is different from the planar view shapes of the linear uneven patterns existing on both sides, the joint portion has a width that is invisible Therefore, it is possible to manufacture an optical element in which defects are suppressed.
As described above, the wire grid polarizers shown in FIGS. 29B and 30 have two or more complete regions 10A and 10B each having the same linear concave-convex pattern, and two adjacent complete regions 10A and 10B. and includes an imperfect region 20 which is a portion corresponding to the joint portion (Z) of the resin mold 200D described above, and the imperfect region 20 is the boundary portion It has a planar view shape different from the planar view shape of the linear concave-convex pattern of whichever of the complete regions 10A and 10B existing on both sides of the .

In the wire grid polarizer manufactured using the method for manufacturing a wire grid polarizer described above, the uneven pattern is connected so that the joint portion is invisible, so defects caused by the transfer boundary are suppressed. Wire grid polarizers can be manufactured.
Note that the wire grid polarizer of the present disclosure may be manufactured by forming an uneven pattern using a replica mold of a resin mold manufactured using the manufacturing method described above.

It should be noted that the present invention is not limited to the above embodiments. The above-described embodiment is an example, and any device having substantially the same configuration as the technical idea described in the claims of the present invention and exhibiting the same effect is the present invention. included in the technical scope of

II. Display Device FIG. 31 is a cross-sectional view showing an image display device 400 of the present disclosure. The image display device 400 of the present disclosure is a liquid crystal display device, a backlight 403 is arranged on the back surface of the liquid crystal display panel 402, and the wire grid polarizer of the present disclosure described above is provided on the backlight 403 side of the liquid crystal display panel 402. 100 are placed. Here, the backlight 403 can widely apply surface light source devices having various configurations such as an edge light type and a direct light type.
The liquid crystal display panel 402 is configured by sandwiching a liquid crystal cell 405 between a linear polarizing plate 406 and a wire grid polarizer 100 in a crossed Nicols arrangement or a parallel Nicols arrangement. The liquid crystal cell 405 is formed by sandwiching a liquid crystal material between glass substrates on which transparent electrodes are formed. As a result, the image display device 400 modulates the intensity of the transmitted light for each pixel by applying a voltage to the transparent electrodes provided in the liquid crystal cell 405, and outputs the modulated light to display a desired image.

The wire grid polarizer 100 is a so-called reflective polarizer that selectively and efficiently reflects incident light with a plane of polarization perpendicular to the transmission axis direction. The wire grid polarizer 100 is arranged on the incident surface side (backlight 403 side) of the liquid crystal cell 405, transmits necessary linearly polarized light, and at the same time reflects and reuses orthogonal components of light. Thereby, the image display device 400 improves the utilization efficiency of the illumination light from the backlight 403 compared to the case where the conventional absorptive polarizing plate is used.

Also, instead of the linear polarizing plate 406, a wire grid polarizer 100 may be arranged on the exit surface of the liquid crystal cell 405. FIG.

10... Wire layers 11A, 11B... Planes formed by convex portions of complete regions
13, 13a, 13b... Linear protrusions 14, 14a, 14b... Linear recesses 20, 201 to 234... Incomplete regions 50... Base materials 10A to 10D, 60, 60A to 60M, 70A to 70F, 80A to 80L, Complete region 41 Resin layer 51 Support body 52 Unit mold 53 Partial heating 54 Cooling 55 Wide concave portion 56 Wide convex portions 61, 71, 81 Connecting portion 100 Wire grid polarizers 200A to 200C Resin mold Z Joint portion 301 Glass substrate 302 Aluminum layer 303 Silica layer 304 Resist layer 400 Image display device 402 Liquid crystal display panel 403 Backlight 405 Liquid crystal cell 406 Linear polarizing plate

Claims (7)

A wire grid polarizer having a wire layer formed of a conductive material on a substrate,
The wire layer includes two or more complete regions each having the same or different linear concave-convex pattern, and one or more imperfect regions forming a boundary connecting two adjacent complete regions,
The width of the incomplete region is 2 μm or less (but not less than 75 nm),
The incomplete region satisfies at least one of the following conditions (i) or (ii),
A wire grid polarizer comprising a polygonal complete region, and having a connecting portion where three boundary portions formed by the incomplete regions are gathered and connected to at least one vertex of the polygonal complete region.
Condition (i):
It has a planar view shape different from the planar view shape of the linear concave-convex pattern of either of the complete regions existing on both sides of the boundary.
Condition (ii):
The average height of the projections of the surface unevenness shape of the incomplete region is lower than the height of the surface formed by the projections of the linear uneven pattern of whichever perfect region exists on both sides of the boundary. 2. The wire grid polarizer according to claim 1 , wherein one complete area and the other complete area have the same height of planes formed by projections of the linear concavo-convex patterns of the complete areas. 3. A wire grid polarizer according to claim 1 or 2 , wherein the imperfect regions have varying widths. 4. The wire grid polarizer according to claim 3 , wherein the variation in width of said imperfect regions has no periodicity. The extending direction of at least a part of the incomplete region is with respect to the extending direction of the linear convex portion included in at least one of the complete regions existing on both sides of the boundary formed by the incomplete region. A wire grid polarizer according to any one of claims 1 to 4 , which is tilted. The extending direction of at least a part of the incomplete region is the extending direction of the first linear projection included in one of the complete regions existing on both sides of the boundary formed by the incomplete region; 6. The wire grid polarizer according to claim 5 , which is inclined with respect to both extending directions of the second linear projections included in the other. A display device comprising the wire grid polarizer according to any one of claims 1 to 6 .

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