JP7209137B2 - SiOx層具備基材 - Google Patents
SiOx層具備基材 Download PDFInfo
- Publication number
- JP7209137B2 JP7209137B2 JP2019166055A JP2019166055A JP7209137B2 JP 7209137 B2 JP7209137 B2 JP 7209137B2 JP 2019166055 A JP2019166055 A JP 2019166055A JP 2019166055 A JP2019166055 A JP 2019166055A JP 7209137 B2 JP7209137 B2 JP 7209137B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- sio
- substrate
- base material
- rubber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000000758 substrate Substances 0.000 title claims description 42
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims 2
- 229910052814 silicon oxide Inorganic materials 0.000 title claims 2
- 239000010410 layer Substances 0.000 claims description 52
- 239000000463 material Substances 0.000 claims description 46
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 38
- 239000002344 surface layer Substances 0.000 claims description 16
- 238000004519 manufacturing process Methods 0.000 claims description 11
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 3
- 238000007747 plating Methods 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 claims description 2
- 238000000576 coating method Methods 0.000 claims description 2
- 229920002379 silicone rubber Polymers 0.000 claims description 2
- 239000004945 silicone rubber Substances 0.000 claims description 2
- 229920001296 polysiloxane Polymers 0.000 claims 1
- 229920001971 elastomer Polymers 0.000 description 33
- 239000005060 rubber Substances 0.000 description 33
- 239000007789 gas Substances 0.000 description 15
- 239000002184 metal Substances 0.000 description 12
- 229910052751 metal Inorganic materials 0.000 description 12
- 239000011347 resin Substances 0.000 description 9
- 229920005989 resin Polymers 0.000 description 9
- 229910021645 metal ion Inorganic materials 0.000 description 7
- 239000002994 raw material Substances 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 239000011162 core material Substances 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 3
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229920002943 EPDM rubber Polymers 0.000 description 2
- 229920000459 Nitrile rubber Polymers 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 229920005549 butyl rubber Polymers 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000010828 elution Methods 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 2
- 238000009616 inductively coupled plasma Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229920001084 poly(chloroprene) Polymers 0.000 description 2
- SBEQWOXEGHQIMW-UHFFFAOYSA-N silicon Chemical compound [Si].[Si] SBEQWOXEGHQIMW-UHFFFAOYSA-N 0.000 description 2
- 239000011343 solid material Substances 0.000 description 2
- 229920003048 styrene butadiene rubber Polymers 0.000 description 2
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- 229920006311 Urethane elastomer Polymers 0.000 description 1
- 239000011149 active material Substances 0.000 description 1
- 229910021486 amorphous silicon dioxide Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000010962 carbon steel Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 229920001973 fluoroelastomer Polymers 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000002386 leaching Methods 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
Images
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
- Y02W30/00—Technologies for solid waste management
- Y02W30/50—Reuse, recycling or recovery technologies
- Y02W30/62—Plastics recycling; Rubber recycling
Landscapes
- Rolls And Other Rotary Bodies (AREA)
- Laminated Bodies (AREA)
- Silicon Compounds (AREA)
- Chemical Vapour Deposition (AREA)
Description
本発明のSiOX層具備基材の実施形態の一例を、図面を参照して説明する。ここでは、SiOX層具備基材が、ゴムロールの場合を一例とする。一例として図1(a)(b)に示すSiOX層具備基材は、ゴム製基材1の表層にSiOX層2を備えている。
前記実施形態では、ゴム製基材1を、ベアリング4を介して軸材5の外側に装備する場合を一例としているが、図3(a)に示すように、ゴム製基材1は金属製や樹脂製といった各種材質製の芯材12の外側に装備することもできる。
2 SiOX層(アモルファスシリコン層)
3 硬質管
4 ベアリング
5 軸材
6 フランジ
7 真空チャンバー
8 RF高周波電源
9 RF電極
10 高電圧パルス電源
11 ガス注入口
12 芯材
Claims (8)
- 表出成分を含有する基材であって、
前記基材がシロキサンを含有するシリコーンゴム基材であり、
前記基材の表面よりも内側を含む表層にSiOX層を備えた、
ことを特徴とするSiOX層具備基材。 - 請求項1記載のSiOX層具備基材において、
SiOX層がシリコーンの成分を含む層である、
ことを特徴とするSiOX層具備基材。 - 請求項1又は請求項2記載のSiOX層具備基材において、
基材の外側にメッキ層を備え、
SiOX層が前記メッキ層の表層に設けられた、
ことを特徴とするSiOX層具備基材。 - 請求項1から請求項3のいずれか1項に記載のSiOX層具備基材において、
基材がロール状である、
ことを特徴とするSiOX層具備基材。 - 請求項1から請求項4のいずれか1項に記載のSiOX層具備基材において、
基材はロールである、
ことを特徴とするSiOX層具備基材。 - 請求項5記載のSiOX層具備基材において、
ロールは搬送ロール、塗布ロール又はドライラミネートロールである、
ことを特徴とするSiOX層具備基材。 - 請求項1から請求項6のいずれか1項に記載のSiOX層具備基材において、
基材は製造ラインで使用されるロールである、
ことを特徴とするSiOX層具備基材。 - 請求項7記載のSiOX層具備基材において、
製造ラインはフィルム製造ライン、半導体製造ライン又は電子部材製造ラインである、
ことを特徴とするSiOX層具備基材。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019166055A JP7209137B2 (ja) | 2019-09-12 | 2019-09-12 | SiOx層具備基材 |
JP2022189207A JP2023016901A (ja) | 2019-09-12 | 2022-11-28 | SiOx層具備基材 |
JP2024040668A JP2024069491A (ja) | 2019-09-12 | 2024-03-15 | SiOx層具備基材 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019166055A JP7209137B2 (ja) | 2019-09-12 | 2019-09-12 | SiOx層具備基材 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022189207A Division JP2023016901A (ja) | 2019-09-12 | 2022-11-28 | SiOx層具備基材 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2021041636A JP2021041636A (ja) | 2021-03-18 |
JP7209137B2 true JP7209137B2 (ja) | 2023-01-20 |
Family
ID=74861920
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019166055A Active JP7209137B2 (ja) | 2019-09-12 | 2019-09-12 | SiOx層具備基材 |
JP2022189207A Pending JP2023016901A (ja) | 2019-09-12 | 2022-11-28 | SiOx層具備基材 |
JP2024040668A Pending JP2024069491A (ja) | 2019-09-12 | 2024-03-15 | SiOx層具備基材 |
Family Applications After (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022189207A Pending JP2023016901A (ja) | 2019-09-12 | 2022-11-28 | SiOx層具備基材 |
JP2024040668A Pending JP2024069491A (ja) | 2019-09-12 | 2024-03-15 | SiOx層具備基材 |
Country Status (1)
Country | Link |
---|---|
JP (3) | JP7209137B2 (ja) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006176865A (ja) | 2004-12-24 | 2006-07-06 | Utec:Kk | DLC膜又はSiO2膜、容器及びCVD成膜装置 |
JP2008291349A (ja) | 2007-04-27 | 2008-12-04 | Canon Inc | 電子写真用ローラ部材の製造方法 |
JP2013028861A (ja) | 2011-07-29 | 2013-02-07 | Miyako Roller Industry Co | 基材への親水性dlc膜の成膜方法と親水性dlc成膜基材 |
JP2014518940A (ja) | 2011-06-16 | 2014-08-07 | カーハーエス コーポプラスト ゲーエムベーハー | 工作物のプラズマ処理方法およびガスバリヤー層を備えた工作物 |
-
2019
- 2019-09-12 JP JP2019166055A patent/JP7209137B2/ja active Active
-
2022
- 2022-11-28 JP JP2022189207A patent/JP2023016901A/ja active Pending
-
2024
- 2024-03-15 JP JP2024040668A patent/JP2024069491A/ja active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006176865A (ja) | 2004-12-24 | 2006-07-06 | Utec:Kk | DLC膜又はSiO2膜、容器及びCVD成膜装置 |
JP2008291349A (ja) | 2007-04-27 | 2008-12-04 | Canon Inc | 電子写真用ローラ部材の製造方法 |
JP2014518940A (ja) | 2011-06-16 | 2014-08-07 | カーハーエス コーポプラスト ゲーエムベーハー | 工作物のプラズマ処理方法およびガスバリヤー層を備えた工作物 |
JP2013028861A (ja) | 2011-07-29 | 2013-02-07 | Miyako Roller Industry Co | 基材への親水性dlc膜の成膜方法と親水性dlc成膜基材 |
Also Published As
Publication number | Publication date |
---|---|
JP2023016901A (ja) | 2023-02-02 |
JP2024069491A (ja) | 2024-05-21 |
JP2021041636A (ja) | 2021-03-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4747658B2 (ja) | 成膜装置及び成膜方法 | |
EP0478010A2 (en) | Process for producing a continuous web of an electrically insulated metallic substrate | |
WO2013100073A1 (ja) | プラズマを使った前処理装置を有した蒸着装置 | |
JP4747665B2 (ja) | 成膜装置及び成膜方法 | |
JP2009280873A (ja) | ガスバリアフィルムの製造方法 | |
JP7209137B2 (ja) | SiOx層具備基材 | |
JP4597756B2 (ja) | 成膜装置及び成膜方法 | |
JP2014214365A (ja) | 樹脂フィルムの表面処理方法、樹脂フィルムの成膜方法ならびに金属化樹脂フィルム基板の製造方法 | |
JP2011162851A (ja) | ガスバリアフィルムの製造方法 | |
JP2017137543A (ja) | キャンロールと長尺体の処理装置および処理方法 | |
JP5310486B2 (ja) | 長尺耐熱性樹脂フィルムの成膜方法と金属膜付耐熱性樹脂フィルムの製造装置 | |
EP3872237A1 (en) | Apparatus and method for manufacturing resin film provided with metal membrane | |
JP5484846B2 (ja) | 機能膜の製造装置および製造方法 | |
JP5040067B2 (ja) | 成膜装置及び成膜方法 | |
JP2011228343A (ja) | ガス供給電極の製造方法 | |
JP4687721B2 (ja) | プラスチックフィルム用加熱搬送装置 | |
WO2017073411A1 (ja) | 長尺基板の巻取方法及び巻取装置、並びに該巻取装置を備えた長尺基板の表面処理装置 | |
JP5889746B2 (ja) | 基板処理装置、固体電解質膜の形成装置、及び、固体電解質膜の形成方法 | |
JP2016117938A (ja) | 長尺フィルムの搬送および冷却用ロール、ならびに該ロールを搭載した長尺フィルムの処理装置 | |
JP2009166252A (ja) | フレキシブル基材並びにその製造方法及び製造装置 | |
JP2008150636A (ja) | 成膜装置及び成膜方法 | |
WO2016132583A1 (ja) | 薄膜電子デバイスの製造方法、エッチング装置および薄膜電子デバイスの製造装置 | |
JP4176885B2 (ja) | 真空成膜装置 | |
JP2010235968A (ja) | 真空処理装置 | |
JP6167345B2 (ja) | 成膜装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20210511 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20220114 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20220118 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20220322 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20220512 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20221004 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20221012 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20221101 |
|
A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A711 Effective date: 20221128 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20221128 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20221128 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7209137 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |