JP7190504B2 - Structural body, solid-state imaging device, and image display device - Google Patents

Description

The present invention relates to a structure having a plurality of pixels, a solid-state imaging device, and an image display device.

2. Description of the Related Art Conventionally, in solid-state imaging devices such as charge-coupled device (CCD) image sensors and image display devices such as liquid crystal display devices, color filters have been used to color images.

In general, a color filter is formed by forming a film made of a photosensitive composition containing pigments or dyes for each pixel corresponding to each color, and performing exposure, development, heating, and the like to harden the film in a pattern. Formed by For example, Patent Document 1 describes forming a color filter using a colored photosensitive composition in which a specific triazine compound and a pigment are dispersed in an organic solvent.

JP-A-2003-081972

In recent years, the use of infrared filters (IR filters) such as near-infrared transmission filters and near-infrared cut filters, and the combined use of IR filters in addition to the above-described color filters, have been studied. For example, a near-infrared transmission filter is used to perform infrared sensing and generate an infrared image, and a near-infrared cut filter is used to block heat rays.

This time, in a structure including the above color filters and IR filters (hereinafter collectively referred to as "optical filters"), in the deep part of the pixel and in the part where two pixels are in contact with each other, A problem has been found that voids may be formed. The presence of such air gaps may also degrade the optical properties of the optical filter. Therefore, it is desirable to improve the stability of the deep layer of the pixel to the extent that voids are not formed over time.

SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and an object of the present invention is to provide a structure having excellent stability in a deep pixel portion.

Another object of the present invention is to provide a solid-state imaging device and an image display device having the structure.

式中、＊は結合手を表し、
Ｙａ^１およびＹａ^２は、それぞれ独立して－Ｎ（Ｒａ^１）－または－Ｏ－を表し、
Ｒａ^１は、水素原子、アルキル基、アルケニル基、アルキニル基またはアリール基を表し、
Ｂ^１およびＢ^２は、それぞれ独立して水素原子または置換基を表す。
＜８＞
上記２つの画素が、互いに異なる顔料を含む画素であり、
上記２つの画素がそれぞれ、赤色画素、緑色画素、青色画素、黄色画素、シアン色画素、マゼンタ色画素、黒色画素、白色画素、近赤外線カットフィルタ用画素、および、近赤外線透過フィルタ用画素から選択される１つの画素である、
＜１＞～＜７＞いずれか１つに記載の構造体。
＜９＞
さらに、上記２つの画素の間に、２つの画素の厚さよりも低い隔壁を有する、
＜１＞～＜８＞いずれか１つに記載の構造体。
＜１０＞
＜１＞～＜９＞いずれか１つに記載の構造体を半導体基板上に有する固体撮像素子。
＜１１＞
＜１＞～＜９＞いずれか１つに記載の構造体をガラス基板上に有する画像表示装置。The above problems could be solved by using a transparent pigment derivative. Specifically, the above problems have been solved by the following means <1>, preferably by <2> to <11>.
<1>
having two pixels that are two-dimensionally arranged in contact with each other;
A structure in which each of two pixels contains a pigment, a pigment derivative having a maximum molar absorption coefficient of 3000 L·mol ⁻¹ ·cm ⁻¹ or less in a wavelength region of 400 to 700 nm, and a resin.
<2>
At least one of the two pixels has a width of 0.3 to 5.0 μm.
The structure according to <1>.
<3>
At least one of the two pixels has a thickness of 0.1 to 2.0 μm.
The structure according to <1> or <2>.
<4>
The total content of the pigment and the pigment derivative contained in at least one of the two pixels is 25 to 65% by mass.
The structure according to any one of <1> to <3>.
<5>
The mass ratio of the content of the pigment derivative contained in at least one of the two pixels and the content of the pigment contained in the same pixel is 3:97 to 20:80.
The structure according to any one of <1> to <4>.
<6>
at least one of the pigment derivatives contains an aromatic ring;
The structure according to any one of <1> to <5>.
<7>
At least one of the pigment derivatives contains a group represented by the following formula (A1),
The structure according to <6>;

In the formula, * represents a bond,
Ya ¹ and Ya ² each independently represent -N(Ra ¹ )- or -O-;
Ra ¹ represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group;
B ¹ and B ² each independently represent a hydrogen atom or a substituent.
<8>
The two pixels are pixels containing different pigments,
Each of the above two pixels is selected from a red pixel, a green pixel, a blue pixel, a yellow pixel, a cyan pixel, a magenta pixel, a black pixel, a white pixel, a near-infrared cut filter pixel, and a near-infrared transmit filter pixel. is one pixel that is
The structure according to any one of <1> to <7>.
<9>
Furthermore, between the two pixels, having a partition lower than the thickness of the two pixels,
The structure according to any one of <1> to <8>.
<10>
A solid-state imaging device having the structure according to any one of <1> to <9> on a semiconductor substrate.
<11>
An image display device comprising the structure according to any one of <1> to <9> on a glass substrate.

According to the present invention, it is possible to obtain a structure having excellent stability in the deep layer of the pixel. The structure of the present invention makes it possible to provide the solid-state imaging device and the image display device of the present invention.

FIG. 4 is a schematic diagram showing a structure including a two-color type color filter; FIG. 2 is a schematic diagram showing a structure including three-color type color filters; FIG. 4 is a schematic diagram showing a structure including a trichromatic color filter and an IR filter;

Principal embodiments of the present invention are described below. However, the invention is not limited to the illustrated embodiments.

In this specification, a numerical range represented by the symbol "to" means a range including the numerical values before and after "to" as lower and upper limits, respectively.

As used herein, the term "process" is meant to include not only independent processes, but also processes that are indistinguishable from other processes as long as the desired effects of the process can be achieved.

Regarding the notation of a group (atomic group) in the present specification, the notation that does not describe substitution or unsubstituted means that not only those not having substituents but also those having substituents are included. For example, when simply describing an "alkyl group", this includes both an alkyl group having no substituent (unsubstituted alkyl group) and an alkyl group having a substituent (substituted alkyl group). Meaning.

In this specification, the term “exposure” includes not only drawing using light but also drawing using particle beams such as electron beams and ion beams, unless otherwise specified. Energy rays used for exposure generally include the emission line spectrum of mercury lamps, active rays such as far ultraviolet rays represented by excimer lasers, extreme ultraviolet rays (EUV light) and X-rays, electron beams and ion beams. and other particle beams.

As used herein, "(meth)acrylate" means both or either of "acrylate" and "methacrylate", and "(meth)acrylic" means both "acrylic" and "methacrylic", or , and “(meth)acryloyl” means either or both of “acryloyl” and “methacryloyl”.

As used herein, the concentration of solids in a composition is represented by the mass percentage of other components, excluding solvent, relative to the total mass of the composition.

In this specification, the atmospheric pressure at the time of boiling point measurement is 101325 Pa (1 atmospheric pressure) unless otherwise specified. Also, the temperature is 23° C. unless otherwise specified.

In this specification, the weight average molecular weight (Mw) and number average molecular weight (Mn) are shown as polystyrene equivalent values according to gel permeation chromatography (GPC measurement), unless otherwise specified. The weight-average molecular weight (Mw) and number-average molecular weight (Mn) are measured by using, for example, HLC-8220 (manufactured by Tosoh Corporation), guard column HZ-L, TSKgel Super HZM-M, TSKgel Super HZ4000, TSKgel. It can be obtained by using Super HZ3000 and TSKgel Super HZ2000 (manufactured by Tosoh Corporation). In addition, unless otherwise stated, measurements are taken using THF (tetrahydrofuran) as an eluent. Unless otherwise specified, a UV ray (ultraviolet) wavelength detector of 254 nm is used for detection in GPC measurement.

In this specification, when the positional relationship of each layer constituting the laminate is described as "above" or "below", it means that another layer is above or below the reference layer among the layers of interest. It would be nice if there was That is, a third layer or element may be interposed between the reference layer and the other layer, and the reference layer and the other layer need not be in contact with each other. In addition, unless otherwise specified, the direction in which the layers are stacked with respect to the base material is referred to as "upper", or when there is a photosensitive layer, the direction from the base material to the photosensitive layer is referred to as "upper". The opposite direction is called "down". It should be noted that such setting of the vertical direction is for the sake of convenience in this specification, and in an actual aspect, the "upward" direction in this specification may differ from the vertical upward direction.

As used herein, “near-infrared rays” refers to light (electromagnetic waves) belonging to around the wavelength region of 700 to 2500 nm.

<Structure>
The structure of the present invention has two pixels that are two-dimensionally arranged in contact with each other, and each of the two pixels has a pigment and a maximum molar absorption coefficient of 3000 L mol in the wavelength region of 400 to 700 nm. ⁻¹ ·cm ⁻¹ or less, and a resin.

According to the present invention, in a structure including two pixels that are two-dimensionally arranged in contact with each other, the stability of the pixel deep layer portion is improved. This can be considered as follows.

In general, a pigment derivative having a structure in which a polar group is added to a pigment is added together with the pigment in order to improve the dispersibility of the pigment in the photosensitive composition.

However, conventional pigment derivatives are colored compounds, and such pigment derivatives absorb light during exposure. It was found that the hardening of the portion deeper than the position of ⅔ in the depth direction (hereinafter collectively referred to as “pixel deep layer portion”) is hindered. It is considered that voids generated in deep layers between pixels are affected by deterioration over time in the direction of shrinkage of both pixels in such insufficiently hardened portions.

Therefore, in the present invention, by using a transparent pigment derivative to the extent that the maximum value of the molar absorption coefficient in the wavelength region of 400 to 700 nm is 3000 L mol ⁻¹ cm ⁻¹ or less, the pigment By suppressing the consumption of light by the dielectric, it is possible to accelerate the curing of the deep layer of the pixel more than before. It is thought that by accelerating the curing of the deep layers in this way, the film quality of the pixels becomes dense and the adhesion of the pixels to the support is improved, thereby improving the stability of the pixels. In addition, the pigment derivative becomes transparent, which means that it is less susceptible to the effects of irradiation light (ultraviolet rays, etc.) during exposure, which suppresses deterioration and destruction of the pigment derivative, and improves the stability of the pigment derivative itself during exposure. This is also considered to contribute to efficient hardening in deep layers.

Hereinafter, each configuration of the structure of the present invention will be described in detail.
<<Structure of pixels>>
The structure of the present invention functions, for example, as a color filter, a near-infrared cut filter, a near-infrared transmission filter, or a combination of these as an optical filter. Such a structure can be used by being incorporated in various kinds of optical sensors such as solid-state imaging devices and image display devices (for example, liquid crystal display devices and organic electroluminescence (organic EL) display devices). For example, the optical sensor in which the structure of the present invention is incorporated is preferably used for monitoring applications, security applications, mobile applications, automobile applications, agricultural applications, medical applications, distance measurement applications, gesture recognition applications, vital signs recognition applications, and the like. be able to.

Examples of color filters include filters having colored pixels that transmit light of a specific wavelength, and at least one colored pixel selected from red pixels, blue pixels, green pixels, yellow pixels, cyan pixels, and magenta pixels. Preferably, the filter has A color filter can be formed using a photosensitive composition containing a chromatic pigment.

A near-infrared cut filter includes a filter having a maximum absorption wavelength in the wavelength range of 700 to 1800 nm. The near-infrared cut filter preferably has a maximum absorption wavelength in the range of 700 to 1300 nm, more preferably in the range of 700 to 1000 nm. The transmittance of the near-infrared cut filter over the entire wavelength range of 400 to 650 nm is preferably 70% or more, more preferably 80% or more, and even more preferably 90% or more. Also, the transmittance at at least one point in the wavelength range of 700 to 1800 nm is preferably 20% or less. In addition, absorbance Amax/absorbance A550, which is the ratio of absorbance Amax at the maximum absorption wavelength of the near-infrared cut filter and absorbance A550 at a wavelength of 550 nm, is preferably 20 to 500, more preferably 50 to 500. , more preferably 70-450, and particularly preferably 100-400. A near-infrared cut filter can be formed using a photosensitive composition containing a near-infrared absorbing pigment.

A near-infrared transmission filter is a filter that transmits at least part of near-infrared rays. The near-infrared transmission filter may be a filter (transparent film) that transmits both visible light and near-infrared light, and is a filter that blocks at least part of visible light and transmits at least part of near-infrared light. good too. The near-infrared transmission filter has a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 640 nm, and has a transmittance in the wavelength range of 1100 to 1300 nm. Filters satisfying spectral characteristics with a minimum value of 70% or more (preferably 75% or more, more preferably 80% or more) are preferred. The near-infrared transmission filter is preferably a filter that satisfies any one of the following spectral characteristics (1) to (4).

(1): The maximum transmittance in the wavelength range of 400 to 640 nm is 20% or less (preferably 15% or less, more preferably 10% or less), and the minimum transmittance in the wavelength range of 800 to 1300 nm is A filter that is 70% or more (preferably 75% or more, more preferably 80% or more).
(2): The maximum transmittance in the wavelength range of 400 to 750 nm is 20% or less (preferably 15% or less, more preferably 10% or less), and the minimum transmittance in the wavelength range of 900 to 1300 nm is A filter that is 70% or more (preferably 75% or more, more preferably 80% or more).
(3): The maximum transmittance in the wavelength range of 400 to 830 nm is 20% or less (preferably 15% or less, more preferably 10% or less), and the minimum transmittance in the wavelength range of 1000 to 1300 nm is A filter that is 70% or more (preferably 75% or more, more preferably 80% or more).
(4): The maximum transmittance in the wavelength range of 400 to 950 nm is 20% or less (preferably 15% or less, more preferably 10% or less), and the minimum transmittance in the wavelength range of 1100 to 1300 nm is A filter that is 70% or more (preferably 75% or more, more preferably 80% or more).

In the structure of the present invention, the two pixels are two-dimensionally arranged in contact with each other. The expression “in contact with each other” means that two predetermined two-dimensionally arranged pixels are in contact with each other on at least a part of the opposing side surfaces. If two predetermined pixels are partially in contact with each other, there may be a partition between the two pixels that is thinner than the thickness of the two pixels. The height of this low barrier rib can be, for example, 10-90% of the pixel thickness, and can be 30-70%. In addition, when two pixels are in contact with each other at some position between the pixels, there may be a partition higher than the thickness of the pixels at another position between the pixels. Moreover, it is preferable that the partition wall is made of a material having a lower refractive index than the near-infrared transmission filter pixel. According to this aspect, it is possible to further improve the near-infrared sensitivity by further enhancing the near-infrared light-collecting property.

In the structure of the present invention, the two pixels are pixels containing different pigments, and the two pixels are red pixel, green pixel, blue pixel, yellow pixel, cyan pixel, and magenta pixel, respectively. , a black pixel, a white pixel, a near-infrared cut filter pixel, and a near-infrared transmission filter pixel. Which pixels the structure of the present invention contains is designed according to the desired function of the structure. For example, the structures of the present invention may be used as dichroic color filters containing dichroic pixels (e.g. red and green pixels), as RGB type color filters containing red, green and blue pixels, or It can function as a CMY type color filter containing cyan pixels, magenta pixels and yellow pixels. Further, for example, the structure of the present invention can be used as an optical filter in which a near-infrared cut filter (black pixels) is added to an RGB color filter, as an optical filter in which a near-infrared transmission filter is added to an RGB color filter, or , can function as an optical filter in which white pixels are added to an RGB type color filter. Specifically, it is as follows.

The structure of the present invention can be, for example, a structure containing a two-color color filter. FIG. 1 is a schematic diagram showing a structure S1 containing a two-color type color filter, FIG. 1a being a top view of the structure S1, and FIGS. FIG. 4 is a cross-sectional view of body S1; Here, for example, the pixel P1 is a green pixel and the pixel P2 is a red pixel. In the structure shown in FIG. 1, the pixels P1 and the pixels P2 are alternately arranged on the support 1, and the pixels P1 and the pixels P2 are in contact with each other on all sides when viewed from above. is. On the other hand, FIG. 1b is a cross-sectional view when there is no partition between the pixels P1 and P2, and FIG. 1c is a cross-sectional view when there is a partition 2 between the pixels P1 and P2. In FIG. 1b, since there is no partition between pixels, it can be said that the two adjacent pixels P1 and P2 are in contact with each other on all opposing sides. It can be said that the two pixels P1 and P2 are in contact with each other at part of the opposing side surfaces.

In such an optical filter, as described above, voids are likely to occur in the vicinity region R of the portion where two pixels are in contact with each other in the deep part of the pixel. Specifically, this region R is, for example, in the case of FIG. It is in the vicinity of the area where the contact surfaces of the two pixels P1 and P2 and the top surfaces of the partition walls 2 intersect. In the present invention, as described above, the stability can be improved by accelerating the hardening of the pixel deep layer portion including the region R more than conventionally.

Moreover, the structure of the present invention can be a structure including, for example, a three-color type color filter. FIG. 2 is a schematic diagram showing a structure S2 including a three-color type color filter, FIG. 2a is a top view of the structure S2, and FIG. FIG. 2c is a cross-sectional view of structure S2 in a plane containing pixel P1 and pixel P3. Here, for example, the pixel P1 is a green pixel, the pixel P2 is a red pixel, and the pixel P3 is a blue pixel. In the structure S2 of FIG. 2, the pixels P1, the pixels P2, and the pixels P3 are alternately laid out on the support 1 at a number ratio of 2:1:1. and pixel P3 are in contact with adjacent pixels on all sides when viewed from above. On the other hand, as shown in FIGS. 2b and 2c, since the structure S2 has the partition wall 2 between the pixels, it can be said that two adjacent pixels are in contact with each other at part of the opposing side surfaces. In the structure S2, as in the structure S1 of FIG. 1b, the partition may be omitted. The region where voids are likely to occur is similar to that of the structure S1.

Furthermore, the structure of the present invention can be a structure including, for example, a trichromatic color filter and an IR filter. FIG. 3 is a schematic diagram showing a structure S3 containing trichromatic color filters and an IR filter, FIG. 3a being a top view of the structure S3 and FIG. 3c is a cross-sectional view of structure S3 in the plane containing pixel P1 and pixel P3, and FIG. 3d is a cross-sectional view of structure S3 in the plane containing pixel P4 and pixel P2. be. Here, for example, the pixel P1 is a green pixel, the pixel P2 is a red pixel, the pixel P3 is a blue pixel, and the pixel P4 is a near-infrared transmission filter pixel. In the structure S3 of FIG. 3, the pixels P1 to P4 are alternately laid on the support 1 at a number ratio of 1:1:1:1. When viewed from above, it is in contact with adjacent pixels on all sides. On the other hand, as shown in FIGS. 3b to 3d, in the structure S3, since the partition walls 2 are provided between the pixels, it can be said that two adjacent pixels are in contact with each other at part of the opposing side surfaces. In the structure S3, as in the structure S1 of FIG. 1b, the partition may be omitted. The region where voids are likely to occur is similar to that of the structure S1. Furthermore, as shown in FIG. 3e, the structure S3 can be provided with near-infrared cut filters SIR below the color filter pixels P1 to P3, for example. The near-infrared cut filter SIR can also be provided in each structure shown in FIGS. 1 and 2 in the same manner.

In addition, the structure of the present invention is, for example, a structure including a three-color color filter and a white pixel, or a structure adopting CMY color filters as the three-color color filter in the structure described above. can also Moreover, the structure of the present invention may be provided with an antireflection film, a planarization film, a lens, and the like on the optical filter. A coloring material that absorbs infrared light may be added to the lens material for forming the lens. The refractive index of the lens material for light with a wavelength of 550 nm is preferably 1.5 to 1.8. The upper limit of this numerical range is more preferably 1.75 or less, and even more preferably 1.70 or less. Moreover, the lower limit of this numerical range is more preferably 1.55 or more, and even more preferably 1.58. The minimum transmittance of the lens material for light with a wavelength of 400 to 700 nm is preferably 90% or more, more preferably 95% or more when a lens material film having a thickness of 0.35 μm is formed. . The upper limit of this transmittance is preferably 100%, and practically about 98%. In addition, the transmittance of the lens material for light with a wavelength of 820 nm is preferably 70% or less, more preferably 60% or less when a lens material film having a thickness of 0.35 μm is formed. It is more preferably 50% or less. The lower limit of this transmittance is preferably 0%, and practically about 50%.

In the structure of the present invention, the width of at least one of the two pixels is preferably 0.3-5.0 μm. In particular, in applications using relatively large pixels such as single-lens reflex cameras, the upper limit of the width of each pixel is preferably 4.0 μm or less, more preferably 3.5 μm or less. It is preferably 3.0 μm or less, and particularly preferably 3.0 μm or less. In addition, the lower limit of the width of each pixel in this application is independently more preferably 1.7 μm or more, more preferably 2.0 μm or more, and particularly preferably 2.5 μm or more. On the other hand, in applications using relatively small-sized pixels such as mobile devices, the upper limit of the width of each pixel is preferably 1.7 μm or less, more preferably 1.5 μm or less. 1.2 μm or less is particularly preferable. In addition, the lower limit of the width of each pixel in this application is independently more preferably 0.5 μm or more, more preferably 0.6 μm or more, and particularly preferably 0.7 μm or more. The thickness of at least one of the two pixels is preferably 0.1-2.0 μm. In particular, in large-size applications as described above, the upper limit of the thickness of each pixel is preferably 1.8 μm or less, more preferably 1.6 μm or less, and 1.4 μm or less. It is particularly preferred to have In addition, the lower limit of the thickness of each pixel in this application is independently more preferably 0.8 μm or more, further preferably 0.9 μm or more, and particularly preferably 1.0 μm or more. . On the other hand, in small-size applications as described above, the upper limit of the thickness of each pixel is independently more preferably 0.8 μm or less, further preferably 0.7 μm or less, and 0.6 μm or less. It is particularly preferred to have In addition, the lower limit of the width of each pixel in this application is independently more preferably 0.2 μm or more, more preferably 0.3 μm or more, and particularly preferably 0.4 μm or more. As described above, the smaller the width and thickness of each pixel, the greater the effect of voids generated in the deep layer of the pixel, and the greater the usefulness of the present invention.

<<Composition for Forming Pixel>>
In the structure of the present invention, each pixel contains pigments, pigment derivatives and resins depending on the desired function. Such pixels are formed by, for example, forming a film of a photosensitive composition containing a pigment, a pigment derivative, and a resin (hereinafter also simply referred to as the “composition”), as will be described in detail later. It is formed by performing processing such as exposure and development. The structure of the present invention is obtained by repeating such a pixel forming process until all necessary pixels are formed. Hereinafter, the content of the composition for forming pixels in the present invention will be described.

<<<pigment>>>
In the present invention, the photosensitive composition contains pigments. Pigments include white pigments, black pigments, chromatic pigments, near-infrared absorbing pigments, and the like. In the present invention, the white pigment includes not only pure white but also bright gray (for example, grayish white, light gray, etc.) pigments close to white. In addition, the pigment may be either an inorganic pigment or an organic pigment, and the organic pigment is preferable because the dispersion stability is likely to be improved. Also, the pigment preferably has a maximum absorption wavelength in the wavelength range of 400 to 2000 nm, and more preferably has a maximum absorption wavelength in the wavelength range of 400 to 700 nm. Also, the pigment may be used alone or in combination with a dye. As the pigment, an inorganic pigment or a material obtained by partially replacing an organic-inorganic pigment with an organic chromophore can also be used. By replacing inorganic pigments or organic-inorganic pigments with organic chromophores, hue design can be facilitated.

When forming a pixel for a color filter, a predetermined pigment appropriately selected from chromatic pigments, for example, is used as the pigment. Moreover, when forming the pixel for near-infrared cut filters, a near-infrared absorption pigment is used as a pigment. When forming a pixel for a near-infrared transmission filter, a black pigment or a black pigment is used by combining two or more chromatic pigments.

The average primary particle size of the pigment is preferably 1 to 200 nm. The lower limit is more preferably 5 nm or more, more preferably 10 nm or more. The upper limit is more preferably 180 nm or less, still more preferably 150 nm or less, and particularly preferably 100 nm or less. When the average primary particle size of the pigment is within the above range, the dispersion stability of the pigment in the photosensitive composition is good. In the present invention, the primary particle size of the pigment can be determined from the photograph obtained by observing the primary particles of the pigment with a transmission electron microscope. Specifically, the projected area of the primary particles of the pigment is obtained, and the corresponding circle equivalent diameter is calculated as the primary particle diameter of the pigment. Further, the average primary particle size in the present invention is the arithmetic mean value of the primary particle sizes of 400 primary particles of the pigment. Further, the primary particles of the pigment refer to independent particles without agglomeration.

The pigment content in one pixel is preferably 25 to 65 mass %. The upper limit is more preferably 60% by mass or less, and even more preferably 55% by mass or less. The lower limit is more preferably 25% by mass or more, still more preferably 30% by mass or more, and particularly preferably 35% by mass or more. Examples of pigments include those shown below.
(chromatic pigment)
The chromatic pigment is not particularly limited, and known chromatic pigments can be used. Examples of chromatic pigments include pigments having a maximum absorption wavelength in the wavelength range of 400 to 700 nm. Examples include yellow pigments, orange pigments, red pigments, green pigments, purple pigments, blue pigments, and the like. Specific examples of these include the following.

Color Index (C.I.) Pigment Yellow 1,2,3,4,5,6,10,11,12,13,14,15,16,17,18,20,24,31,32,34, 35, 35: 1, 36, 36: 1, 37, 37: 1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125, 126, 127, 128, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 155, 156, 161, 162, 164, 166, 167, 168, 169, 170, 171, 172, 173, 174, 175, 176, 177, 179, 180, 181, 182, 185, 187, 188, 193, 194, 199, 213, 214, 215, 228, 231, 232 (methine), 233 (quinoline), 234 ( aminoketone-based), 235 (aminoketone-based), 236 (aminoketone-based), etc. (the above are yellow pigments; hereinafter also simply referred to as "PY1" and the like).
C. I. Pigment Orange 2, 5, 13, 16, 17: 1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, 73, etc. (The above is an orange pigment. Hereinafter, it may be simply referred to as "PO2" or the like.).
C. I. Pigment Red 1, 2, 3, 4, 5, 6, 7, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48: 1, 48: 2, 48: 3, 48: 4, 49, 49:1, 49:2, 52:1, 52:2, 53:1, 57:1, 60:1, 63:1, 66, 67, 81:1, 81:2, 81:3, 83,88,90,105,112,119,122,123,144,146,149,150,155,166,168,169,170,171,172,175,176,177,178,179,184, 185, 187, 188, 190, 200, 202, 206, 207, 208, 209, 210, 216, 220, 224, 226, 242, 246, 254, 255, 264, 269, 270, 272, 279, 291, 294 (xanthene-based, Organo Ultramarine, Bluish Red), 295 (monoazo-based), 296 (diazo-based), 297 (aminoketone-based), etc. (red pigments; hereinafter also simply referred to as "PR1", etc.).
C. I. Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64 (phthalocyanine), 65 (phthalocyanine), 66 (phthalocyanine), etc. Say.).
C. I. Pigment Violet 1, 19, 23, 27, 32, 37, 42, 60 (triarylmethane-based), 61 (xanthene-based), etc. (the above are purple pigments; hereinafter also simply referred to as "PV1", etc.).
C. I. Pigment Blue 1,2,15,15:1,15:2,15:3,15:4,15:6,16,22,29,60,64,66,79,80,87 (monoazo), 88 (methine-based) and the like (above, blue pigments; hereinafter also simply referred to as "PB1" and the like).

Further, as a green pigment, a halogenated zinc phthalocyanine pigment having an average number of halogen atoms of 10 to 14, an average number of bromine atoms of 8 to 12, and an average number of chlorine atoms of 2 to 5 per molecule. can also be used. Specific examples include compounds described in International Publication No. 2015/118720. In addition, as a green pigment, the compound described in Chinese Patent Application Publication No. 106909027, the phthalocyanine compound having a phosphoric acid ester as a ligand described in WO 2012/102395, described in JP 2019-008014. A phthalocyanine compound, a phthalocyanine compound described in JP-A-2018-180023, a compound described in JP-A-2019-038958, and the like can also be used.

Also, an aluminum phthalocyanine compound having a phosphorus atom can be used as the blue pigment. Specific examples include compounds described in paragraphs 0022 to 0030 of JP-A-2012-247591 and paragraph 0047 of JP-A-2011-157478.
Further, as the yellow pigment, compounds described in JP-A-2017-201003, compounds described in JP-A-2017-197719, paragraph numbers 0011-0062 of JP-A-2017-171912, described in 0137-0276 Compounds, compounds described in paragraph numbers 0010 to 0062, 0138 to 0295 of JP 2017-171913, compounds described in paragraph numbers 0011 to 0062, 0139 to 0190 of JP 2017-171914, JP 2017- Compounds described in paragraph numbers 0010 to 0065 and 0142 to 0222 of JP-A-171915, quinophthalone compounds described in paragraph numbers 0011-0034 of JP-A-2013-054339, paragraph numbers 0013-0058 of JP-A-2014-026228 Quinophthalone compounds described in, isoindoline compounds described in JP-A-2018-062644, quinophthalone compounds described in JP-A-2018-203798, quinophthalone compounds described in JP-A-2018-062578, Patent No. 6432076 Quinophthalone compounds described in the publication, quinophthalone compounds described in JP-A-2018-155881, quinophthalone compounds described in JP-A-2018-111757, quinophthalone compounds described in JP-A-2018-040835, JP-A-2017- Quinophthalone compounds described in 197640, quinophthalone compounds described in JP-A-2016-145282, quinophthalone compounds described in JP-A-2014-085565, quinophthalone compounds described in JP-A-2014-021139, JP-A quinophthalone compounds described in JP-A-2013-209614, quinophthalone compounds described in JP-A-2013-209435, quinophthalone compounds described in JP-A-2013-181015, quinophthalone compounds described in JP-A-2013-061622, Quinophthalone compounds described in JP-A-2013-032486, quinophthalone compounds described in JP-A-2012-226110, quinophthalone compounds described in JP-A-2008-074987, quinophthalones described in JP-A-2008-081565 Compounds, quinophthalone compounds described in JP-A-2008-074986, quinophthalone compounds described in JP-A-2008-074985, quinophthalone compounds described in JP-A-2008-050420, JP-A-2 008-031281, the quinophthalone compound described in JP-B-48-032765, the quinophthalone compound described in JP-A-2019-008014, the compound represented by the following formula (QP1), the following formula A compound represented by (QP2) can also be used.

In formula (QP1), X ¹ to X ¹⁶ each independently represent a hydrogen atom or a halogen atom, and Z ¹ represents an alkylene group having 1 to 3 carbon atoms. Specific examples of the compound represented by formula (QP1) include compounds described in paragraph 0016 of Japanese Patent No. 6443711.

In formula (QP2), Y ¹ to Y ³ each independently represent a halogen atom. n and m are integers from 0 to 6; p is an integer from 0 to 5; (n+m) is 1 or more. Specific examples of the compound represented by formula (QP2) include compounds described in paragraphs 0047 to 0048 of Japanese Patent No. 6432077.

As red pigments, diketopyrrolopyrrole compounds in which at least one bromine atom is substituted in the structure described in JP-A-2017-201384, diketopyrrolopyrrole compounds described in paragraphs 0016 to 0022 of Japanese Patent No. 6248838, Diketopyrrolopyrrole compounds described in WO 2012/102399, diketopyrrolopyrrole compounds described in WO 2012/117965, naphthol azo compounds described in JP 2012-229344, Patent No. 6516119 The red colorant described in the publication, the red colorant described in Japanese Patent No. 6525101, and the like can also be used. Also, as a red pigment, a compound having a structure in which an aromatic ring group in which a group having an oxygen atom, a sulfur atom or a nitrogen atom is bonded to an aromatic ring is bonded to a diketopyrrolopyrrole skeleton may be used. can.

In the present invention, chromatic pigments may be used in combination of two or more. When two or more chromatic pigments are used in combination, the combination of two or more chromatic pigments may form a black color. Examples of such combinations include the following aspects (1) to (7). When the composition contains two or more chromatic pigments and the combination of two or more chromatic pigments exhibits a black color, the composition can be preferably used as a near-infrared transmission filter.
(1) A mode containing a red pigment and a blue pigment.
(2) A mode containing a red pigment, a blue pigment and a yellow pigment.
(3) A mode containing a red pigment, a blue pigment, a yellow pigment, and a purple pigment.
(4) A mode containing a red pigment, a blue pigment, a yellow pigment, a purple pigment, and a green pigment.
(5) A mode containing a red pigment, a blue pigment, a yellow pigment, and a green pigment.
(6) A mode containing a red pigment, a blue pigment, and a green pigment.
(7) A mode containing a yellow pigment and a purple pigment.

(white pigment)
White pigments include titanium oxide, strontium titanate, barium titanate, zinc oxide, magnesium oxide, zirconium oxide, aluminum oxide, barium sulfate, silica, talc, mica, aluminum hydroxide, calcium silicate, aluminum silicate, hollow Examples include resin particles and zinc sulfide. The white pigment is preferably particles containing titanium atoms, more preferably titanium oxide. Further, the white pigment is preferably particles having a refractive index of 2.10 or more for light with a wavelength of 589 nm. The aforementioned refractive index is more preferably 2.10 to 3.00, even more preferably 2.50 to 2.75.

As the white pigment, titanium oxide described in "Titanium Oxide, Physical Properties and Applied Techniques, Manabu Seino, pp. 13-45, June 25, 1991, published by Gihodo Publishing" can also be used.

The white pigment may be composed not only of a single inorganic substance, but also of composite particles with other materials. For example, particles having voids or other materials inside, particles having a core particle to which a large number of inorganic particles are attached, and core-shell composite particles consisting of a core particle made of polymer particles and a shell layer made of inorganic nanoparticles are used. is preferred. For the core-shell composite particles composed of the core particles composed of the polymer particles and the shell layer composed of the inorganic nanoparticles, for example, the description of paragraphs 0012 to 0042 of JP-A-2015-047520 can be referred to, The contents of which are incorporated herein.

Hollow inorganic particles can also be used as the white pigment. A hollow inorganic particle is an inorganic particle having a structure having a cavity inside, and refers to an inorganic particle having a cavity surrounded by an outer shell. Examples of hollow inorganic particles include hollow inorganic particles described in JP 2011-075786, WO 2013/061621, JP 2015-164881, etc., the contents of which are incorporated herein. be

(black pigment)
The black pigment is not particularly limited, and known ones can be used. For example, carbon black, titanium black, graphite and the like can be mentioned, carbon black and titanium black are preferred, and titanium black is more preferred. Titanium black is black particles containing titanium atoms, preferably low order titanium oxide or titanium oxynitride. Titanium black can be surface-modified as necessary for the purpose of improving dispersibility, suppressing cohesion, and the like. For example, it is possible to coat the surface of titanium black with silicon oxide, titanium oxide, germanium oxide, aluminum oxide, magnesium oxide, or zirconium oxide. Further, treatment with a water-repellent substance as disclosed in Japanese Patent Laid-Open No. 2007-302836 is also possible. Examples of black pigments include Color Index (C.I.) Pigment Black 1, 7 and the like. Titanium black preferably has a small primary particle size and an average primary particle size of individual particles. Specifically, the average primary particle size is preferably 10 to 45 nm. Titanium black can also be used as a dispersion. For example, a dispersion containing titanium black particles and silica particles, in which the content ratio of Si atoms and Ti atoms in the dispersion is adjusted to the range of 0.20 to 0.50. Regarding the dispersion, the description in paragraphs 0020 to 0105 of JP-A-2012-169556 can be considered, and the contents thereof are incorporated herein. Commercially available examples of titanium black include titanium black 10S, 12S, 13R, 13M, 13M-C, 13R-N, 13M-T (trade name: manufactured by Mitsubishi Materials Corporation), Tilac D ( Trade name: manufactured by Ako Kasei Co., Ltd.) and the like. Perylene blacks (Lumogen Black FK4280, etc.) described in paragraphs 0016 to 0020 of JP-A-2017-226821 may also be used.

Also, in the present invention, an organic black colorant can be used. The organic black colorant may be either a pigment or a dye, preferably a pigment. Examples of organic black colorants include bisbenzofuranone compounds, azomethine compounds, perylene compounds, and azo compounds, with bisbenzofuranone compounds and perylene compounds being preferred. Examples of the bisbenzofuranone compound include compounds described in JP-T-2010-534726, JP-T-2012-515233, JP-T-2012-515234, etc. For example, "Irgaphor Black" manufactured by BASF Corporation. Available. As a perylene compound, C.I. I. Pigment Black 31, 32 and the like. Examples of azomethine compounds include those described in JP-A-01-170601, JP-A-02-034664, etc., and can be obtained, for example, as "Chromofine Black A1103" manufactured by Dainichiseika Co., Ltd.

(Near-infrared absorbing pigment)
The near-infrared absorbing pigment is preferably an organic pigment. Also, the near-infrared absorbing pigment preferably has a maximum absorption wavelength in the range of more than 700 nm and less than or equal to 1400 nm. The maximum absorption wavelength of the near-infrared absorbing pigment is more preferably 1200 nm or less, still more preferably 1000 nm or less, and particularly preferably 950 nm or less. In the near-infrared absorbing pigment, _A550 / _Amax , which is the ratio of the absorbance A550 at a wavelength of ₅₅₀ nm to the absorbance _Amax at the maximum absorption wavelength, is preferably 0.1 or less, and preferably 0.05 or less. is more preferably 0.03 or less, and particularly preferably 0.02 or less. The lower limit is not particularly limited, but can be, for example, 0.0001 or more, and can also be 0.0005 or more. If the absorbance ratio is within the above range, the near-infrared absorbing pigment can have excellent visible light transparency and near-infrared shielding properties. In the present invention, the maximum absorption wavelength of the near-infrared absorbing pigment and the absorbance at each wavelength are values obtained from the absorption spectrum of a film formed using a photosensitive composition containing the near-infrared absorbing pigment.

The near-infrared absorbing pigment is not particularly limited, but includes pyrrolopyrrole compounds, rylene compounds, oxonol compounds, squarylium compounds, cyanine compounds, croconium compounds, phthalocyanine compounds, naphthalocyanine compounds, pyrylium compounds, azulenium compounds, indigo compounds and pyrromethene compounds. is preferably at least one selected from a pyrrolopyrrole compound, a squarylium compound, a cyanine compound, a phthalocyanine compound and a naphthalocyanine compound, more preferably a pyrrolopyrrole compound or a squarylium compound, and a pyrrolopyrrole compound is particularly preferred.

In the present invention, the photosensitive composition can contain a dye. The dye is not particularly limited, and known dyes can be used. The dye may be a chromatic dye or a near-infrared absorbing dye. As chromatic dyes, pyrazole azo compounds, anilinoazo compounds, triarylmethane compounds, anthraquinone compounds, anthrapyridone compounds, benzylidene compounds, oxonol compounds, pyrazolotriazole azo compounds, pyridone azo compounds, cyanine compounds, phenothiazine compounds, pyrrolopyrazole azomethine compounds , xanthene compounds, phthalocyanine compounds, benzopyran compounds, indigo compounds, and pyrromethene compounds. In addition, thiazole compounds described in JP-A-2012-158649, azo compounds described in JP-A-2011-184493, and azo compounds described in JP-A-2011-145540 can also be used. Further, as the yellow dye, quinophthalone compounds described in paragraph numbers 0011 to 0034 of JP-A-2013-054339, quinophthalone compounds described in paragraph numbers 0013-0058 of JP-A-2014-026228, and the like can also be used. In addition, from the viewpoint of improving heat resistance, as a yellow dye, the methine compounds described in JP-A-2019-073695, JP-A-2019-073696, JP-A-2019-073697, and JP-A-2019-073698 are also It can be used preferably. Near-infrared absorbing dyes include pyrrolopyrrole compounds, rylene compounds, oxonol compounds, squarylium compounds, cyanine compounds, croconium compounds, phthalocyanine compounds, naphthalocyanine compounds, pyrylium compounds, azulenium compounds, indigo compounds and pyrromethene compounds. In addition, the squarylium compound described in JP-A-2017-197437, the squarylium compound described in paragraph numbers 0090 to 0107 of WO 2017/213047, the squarylium compound described in paragraph numbers 0019 to 0075 of JP-A-2018-054760 Pyrrole ring-containing compounds, pyrrole ring-containing compounds described in paragraphs 0078 to 0082 of JP 2018-040955, pyrrole ring-containing compounds described in paragraphs 0043 to 0069 of JP 2018-002773, JP 2018 -Squarylium compounds having an aromatic ring at the amide α-position described in paragraphs 0024 to 0086 of JP-A-041047, amide-linked squarylium compounds described in JP-A-2017-179131, and those described in JP-A-2017-141215 Compounds having a pyrrole bis-type squarylium skeleton or croconium skeleton, dihydrocarbazole bis-type squarylium compounds described in JP-A-2017-082029, asymmetric compounds described in paragraphs 0027 to 0114 of JP-A-2017-068120 , a pyrrole ring-containing compound (carbazole type) described in JP-A-2017-067963, a phthalocyanine compound described in Japanese Patent No. 6251530, and the like can also be used.

The dye content in the total solid content of the photosensitive composition is preferably 1% by mass or more, more preferably 5% by mass or more, and particularly preferably 10% by mass or more. Although the upper limit is not particularly limited, it is preferably 70% by mass or less, more preferably 65% by mass or less, and even more preferably 60% by mass or less.

Also, the content of the dye is preferably 5 to 50 parts by mass with respect to 100 parts by mass of the pigment. The upper limit is more preferably 45 parts by mass or less, and even more preferably 40 parts by mass or less. The lower limit is more preferably 10 parts by mass or more, and even more preferably 15 parts by mass or more.

Moreover, in the present invention, the photosensitive composition may be substantially free of dyes. In the present invention, when the photosensitive composition does not substantially contain a dye, in the present invention, the content of the dye in the total solid content of the photosensitive composition is preferably 0.1% by mass or less. It is more preferably 0.05% by mass or less, and particularly preferably not contained.

<<<pigment derivative>>>
In the present invention, the photosensitive composition contains a pigment derivative having a maximum molar absorption coefficient (εmax) of 3000 L·mol ⁻¹ ·cm ⁻¹ or less in the wavelength region of 400 to 700 nm. By containing the pigment derivative in the composition, the dispersibility of the pigment in the composition is improved. In addition, since the pigment derivative has a light absorption property that satisfies the above requirements, as described above, the curing of the composition in the deep layer of the pixel is promoted more than before.

In the present invention, the εmax of the pigment derivative is more preferably 1000 L·mol ⁻¹ ·cm ⁻¹ or less, further preferably 100 L·mol ⁻¹ ·cm ⁻¹ or less. According to this aspect, it is easier to improve the adhesion of the resulting film to the support. The lower limit of εmax is, for example, 1 L·mol ⁻¹ ·cm ⁻¹ or more, and may be 10 L·mol ⁻¹ ·cm ⁻¹ or more. When there are two or more types of pigment derivatives, the εmax of at least one of them is preferably 1000 L·mol ⁻¹ cm ⁻¹ or less, and the εmax of all the types is 1000 L·mol ⁻¹ ·cm ⁻¹ or less. is preferably In the present invention, the value of the molar extinction coefficient of the pigment derivative is the value measured by the method described in Examples below.

In the present invention, the pigment derivative preferably satisfies any one of the following spectral characteristics (a) to (d).
(a) The maximum value of the molar extinction coefficient in the wavelength range of more than 700 nm and 750 nm or less is preferably 3000 L mol ^-1 cm ^-1 or less, and preferably 1000 L mol ^-1 cm ^-1 or less. More preferably, it is 100 L·mol ⁻¹ ·cm ⁻¹ or less.
(b) The maximum value of the molar extinction coefficient in the wavelength range of more than 750 nm and 800 nm or less is preferably 3000 L mol ^-1 cm ^-1 or less, and preferably 1000 L mol ^-1 cm ^-1 or less. More preferably, it is 100 L·mol ⁻¹ ·cm ⁻¹ or less.
(c) The maximum value of the molar extinction coefficient in the wavelength range of more than 800 nm and 850 nm or less is preferably 3000 L mol ^-1 cm ^-1 or less, and preferably 1000 L mol ^-1 cm ^-1 or less. More preferably, it is 100 L·mol ⁻¹ ·cm ⁻¹ or less.
(d) The maximum value of the molar extinction coefficient in the wavelength range of more than 850 nm and 900 nm or less is preferably 3000 L mol ^-1 cm ^-1 or less, and preferably 1000 L mol ^-1 cm ^-1 or less. More preferably, it is 100 L·mol ⁻¹ ·cm ⁻¹ or less.

In the present invention, the pigment derivative preferably contains an aromatic ring. The aromatic ring may be an aromatic hydrocarbon ring or an aromatic heterocyclic ring. Moreover, the aromatic ring may be a monocyclic ring or a condensed ring. Specifically, the aromatic ring includes a benzene ring, a naphthalene ring, a fluorene ring, a perylene ring, an imidazole ring, a pyrazole ring, an oxazole ring, a thiazole ring, an imidazoline ring, a pyridine ring, a triazole ring, an imidazoline ring, a pyrazine ring, and a pyrimidine. ring, pyridazine ring, quinoline ring, isoquinoline ring, quinoxaline ring, quinazoline ring, benzimidazole ring, benzopyrazole ring, benzoxazole ring, benzothiazole ring, benzotriazole ring, indole ring, isoindole ring, triazine ring, pyrrole ring, Aromatic rings selected from carbazole ring, benzimidazolinone ring, phthalimide ring, phthalocyanine ring, anthraquinone ring, diketopyrrolopyrrole ring, isoindolinone ring, isoindoline ring and quinacridone ring, or containing these aromatic rings Condensed rings and the like are preferred. The condensed ring as a whole may be either an aromatic ring or a non-aromatic ring, but is preferably an aromatic ring.

In addition, the pigment derivative may have only one aromatic ring or condensed ring, but the more aromatic rings, the better the pigment adsorptivity due to the ππ interaction, which improves the storage stability of the composition. It is preferable to have two or more of these rings because it is easy to form.

The above aromatic ring or condensed ring may further have a substituent. Examples of the substituent include the substituent T described later.

The pigment derivative preferably has a structure that easily interacts with the pigment contained in the photosensitive composition or a structure similar to the pigment. According to this aspect, the dispersibility of the pigment in the photosensitive composition can be improved, and the storage stability of the photosensitive composition can be further improved. In addition, the pigment derivative preferably has an aromatic heterocycle, more preferably has a nitrogen-containing aromatic heterocycle, and further preferably has a triazine ring, because the effects of the present invention are likely to be obtained more remarkably. preferable.

式中、＊は結合手を表し、
Ｙａ^１およびＹａ^２は、それぞれ独立して－Ｎ（Ｒａ^１）－または－Ｏ－を表し、
Ｒａ^１は、水素原子、アルキル基、アルケニル基、アルキニル基またはアリール基を表し、
Ｂ^１およびＢ^２は、それぞれ独立して水素原子または置換基を表す。In the present invention, the pigment derivative particularly preferably has a group represented by the following formula (A1) containing a triazine ring as an aromatic ring.

In the formula, * represents a bond,
Ya ¹ and Ya ² each independently represent -N(Ra ¹ )- or -O-;
Ra ¹ represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group;
B ¹ and B ² each independently represent a hydrogen atom or a substituent.

In formula (A1), Ya ¹ and Ya ² each independently represent -N(Ra ¹ )- or -O-, and -N(Ra ¹ ) because the effects of the present invention are likely to be obtained more remarkably. - is preferred.

Ra ¹ represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group, preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom.
The number of carbon atoms in the alkyl group represented by Ra ¹ is preferably 1-20, more preferably 1-15, even more preferably 1-8. The alkyl group may be linear, branched or cyclic, preferably linear or branched, more preferably linear. The alkyl group represented by Ra ¹ may further have a substituent. Examples of the substituent include the substituent T described later.
The alkenyl group represented by Ra ¹ preferably has 2 to 20 carbon atoms, more preferably 2 to 12 carbon atoms, and particularly preferably 2 to 8 carbon atoms. The alkenyl group may be linear, branched or cyclic, preferably linear or branched, more preferably linear. The alkenyl group represented by Ra ¹ may further have a substituent. Examples of the substituent include the substituent T described later.
The alkynyl group represented by Ra ¹ preferably has 2 to 40 carbon atoms, more preferably 2 to 30 carbon atoms, and particularly preferably 2 to 25 carbon atoms. The alkynyl group may be linear, branched or cyclic, preferably linear or branched, more preferably linear. The alkynyl group represented by Ra ¹ may further have a substituent. Examples of the substituent include the substituent T described later.
The aryl group represented by Ra ¹ preferably has 6 to 30 carbon atoms, more preferably 6 to 20 carbon atoms, and still more preferably 6 to 12 carbon atoms. The aryl group represented by Ra ¹ may further have a substituent. Examples of the substituent include the substituent T described later.

In formula (A1), B ¹ and B ² each independently represent a hydrogen atom or a substituent. Examples of the substituent include a substituent T described later, which is preferably an alkyl group, an aryl group or a heterocyclic group, more preferably an aryl group or a heterocyclic group. Aryl groups are more preferred because they are easy to use. At least one of B ¹ and B ² is also preferably a heterocyclic group because it is easier to suppress color unevenness. The heterocyclic group is preferably a nitrogen-containing heterocyclic group, more preferably a benzimidazolone group.
The alkyl group, aryl group and heterocyclic group represented by B ¹ and B ² may further have a substituent. Further substituents include alkyl groups (preferably alkyl groups having 1 to 30 carbon atoms), fluoroalkyl groups (preferably fluoroalkyl groups having 1 to 30 carbon atoms), alkenyl groups (preferably fluoroalkyl groups having 2 to 30 carbon atoms). alkenyl group), alkynyl group (preferably alkynyl group having 2 to 30 carbon atoms), aryl group (preferably aryl group having 6 to 30 carbon atoms), amino group (preferably amino group having 0 to 30 carbon atoms), alkoxy group (preferably alkoxy group having 1 to 30 carbon atoms), aryloxy group (preferably aryloxy group having 6 to 30 carbon atoms), heteroaryloxy group, acyl group (preferably acyl group having 1 to 30 carbon atoms) , an alkoxycarbonyl group (preferably an alkoxycarbonyl group having 2 to 30 carbon atoms), an aryloxycarbonyl group (preferably an aryloxycarbonyl group having 7 to 30 carbon atoms), an acyloxy group (preferably an acyloxy group having 2 to 30 carbon atoms) ), an acylamino group (preferably an acylamino group having 2 to 30 carbon atoms), an alkoxycarbonylamino group (preferably an alkoxycarbonylamino group having 2 to 30 carbon atoms), an aryloxycarbonylamino group (preferably having 7 to 30 carbon atoms aryloxycarbonylamino group), sulfamoyl group (preferably sulfamoyl group having 0 to 30 carbon atoms), carbamoyl group (preferably carbamoyl group having 1 to 30 carbon atoms), alkylthio group (preferably alkylthio group having 1 to 30 carbon atoms) ), an arylthio group (preferably an arylthio group having 6 to 30 carbon atoms), a heteroarylthio group (preferably a heteroarylthio group having 1 to 30 carbon atoms), an alkylsulfonyl group (preferably an alkylsulfonyl group having 1 to 30 carbon atoms group), arylsulfonyl group (preferably arylsulfonyl group having 6 to 30 carbon atoms), heteroarylsulfonyl group (preferably heteroarylsulfonyl group having 1 to 30 carbon atoms), alkylsulfinyl group (preferably 1 to 30 carbon atoms alkylsulfinyl group), arylsulfinyl group (preferably arylsulfinyl group having 6 to 30 carbon atoms), heteroarylsulfinyl group (preferably heteroarylsulfinyl group having 1 to 30 carbon atoms), ureido group (preferably 1 carbon atom to 30 ureido groups), phosphoramide groups (preferably phosphoramide groups having 1 to 30 carbon atoms), hydroxyl groups, carboxyl groups, sulfo groups, phosphoric acid groups, mercapto groups, halogen atoms, cyano groups, alkylsulfur fino group, arylsulfino group, hydrazino group, imino group, alkyl group, fluoroalkyl group, alkoxy group, amino group, halogen atom, alkenyl group, hydroxyl group, alkoxycarbonyl group, acyloxy group, acylamino group, nitro groups are preferred.
It is also preferred that the alkyl, aryl and heterocyclic groups represented by B ¹ and B ² do not have further substituents as described above.

(substituent T)
Substituent T includes halogen atom, cyano group, nitro group, alkyl group, alkenyl group, alkynyl group, aryl group, heterocyclic group, -ORt ¹ , -CORt ¹ , -COORt ¹ , -OCORt ¹ , -NRt ¹ Rt ² , —NHCORt ¹ , —CONRt ¹ Rt ² , —NHCONRt ¹ Rt ² , —NHCOORt ¹ , —SRt ¹ , —SO ₂ Rt ¹ , —SO ₂ ORt ¹ , —NHSO ₂ Rt ¹ or —SO ₂ NRt ^{1 Rt2} can be mentioned. Rt ¹ and Rt ² each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group or a heteroaryl group. Rt ¹ and Rt ² may combine to form a ring.

Halogen atoms include fluorine, chlorine, bromine and iodine atoms.
The number of carbon atoms in the alkyl group is preferably 1-30, more preferably 1-15, even more preferably 1-8. The alkyl group may be linear, branched or cyclic, preferably linear or branched, more preferably linear.
The alkenyl group preferably has 2 to 30 carbon atoms, more preferably 2 to 12 carbon atoms, and particularly preferably 2 to 8 carbon atoms. The alkenyl group may be straight-chain, straight-chain, branched or cyclic, preferably straight-chain or branched, more preferably straight-chain.
The alkynyl group preferably has 2 to 30 carbon atoms, more preferably 2 to 25 carbon atoms. The alkynyl group may be linear, branched or cyclic, preferably linear or branched, more preferably linear.
The number of carbon atoms in the aryl group is preferably 6-30, more preferably 6-20, even more preferably 6-12.
The heterocyclic group may be monocyclic or condensed. The heterocyclic group is preferably a monocyclic ring or a condensed ring having 2 to 4 condensed rings. The number of heteroatoms constituting the ring of the heterocyclic group is preferably 1-3. A heteroatom constituting the ring of the heterocyclic group is preferably a nitrogen atom, an oxygen atom or a sulfur atom. The number of carbon atoms constituting the ring of the heterocyclic group is preferably 3-30, more preferably 3-18, and more preferably 3-12.
Alkyl groups, alkenyl groups, alkynyl groups, aryl groups and heterocyclic groups may have a substituent or may be unsubstituted. Examples of the substituent include the substituents described for the substituent T described above.

As for the pigment derivative of the present invention, specific examples of the aromatic ring and the group represented by the above formula (A1) include groups having the following structures. In the following structural formulas, Me represents a methyl group.

In the present invention, the pigment derivative preferably contains at least one group selected from acid groups and basic groups.

The acid group is preferably at least one selected from a carboxyl group, a sulfo group, a phosphoric acid group and salts thereof, more preferably at least one selected from a carboxyl group, a sulfo group and salts thereof. . Atoms or atomic groups constituting the salt include alkali metal ions (Li ⁺ , Na ⁺ , K ⁺ etc.), alkaline earth metal ions (Ca ²⁺ , Mg ²⁺ etc.), ammonium ions, imidazolium ions, pyridinium ions, phosphonium ion and the like.

The basic group is preferably at least one selected from an amino group, a pyridyl group and salts thereof, an ammonium group salt, and a phthalimidomethyl group, and an amino group, an amino group salt, and an ammonium group salt. It is more preferably at least one selected, more preferably an amino group or a salt of an amino group. The amino group includes -NH ₂ , dialkylamino group, alkylarylamino group, diarylamino group, cyclic amino group and the like. The dialkylamino group, alkylarylamino group, diarylamino group, and cyclic amino group may further have a substituent. Examples of the substituent include the substituent T described later. Atoms or atomic groups constituting salts include hydroxide ions, halogen ions, carboxylate ions, sulfonate ions, and phenoxide ions.

式中、＊は結合手を表し、
Ｙｚ^１は－Ｎ（Ｒｙ^１）－または－Ｏ－を表し、
Ｒｙ^１は、水素原子、アルキル基、アルケニル基、アルキニル基またはアリール基を表し、
Ｌｚ^１は２価の連結基を表し、
Ｒｚ^１およびＲｚ^２は、それぞれ独立して水素原子、アルキル基、アルケニル基、アルキニル基またはアリール基を表し、
Ｒｚ^１とＲｚ^２は２価の基を介して結合して環を形成していてもよく、
ｍは１～５の整数を表す。In the present invention, the pigment derivative having an aromatic ring is preferably a compound represented by the following formula (1) (hereinafter also referred to as compound (1)).
A ¹ -L ¹ -Z ¹ (1)
In formula (1), A ¹ represents a group containing an aromatic ring,
L ¹ represents a single bond or a divalent linking group,
Z ¹ represents an acid group or a basic group.
Furthermore, Z ¹ is preferably a basic group, more preferably a group represented by the following formula (Z1), for the reason that color unevenness can be more easily suppressed.

In the formula, * represents a bond,
Yz ¹ represents -N(Ry ¹ )- or -O-,
Ry ¹ represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group;
Lz ¹ represents a divalent linking group,
Rz ¹ and Rz ² each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group;
Rz ¹ and Rz ² may be bonded via a divalent group to form a ring,
m represents an integer of 1 to 5;

In formula ( ¹ ), the aromatic ring contained in A1 is the same as the above-mentioned aromatic ring that is preferably contained in the pigment derivative. A ¹ is preferably a group represented by formula (A1) above. Specific examples of A ¹ are the same as the specific examples of the group represented by formula (A1) above.

In formula ( ¹ ), L1 represents a single bond or a divalent linking group, preferably a divalent linking group. The divalent linking group represented by L ¹ includes an alkylene group, an arylene group, a heterocyclic group, -O-, -N(R ^L1 )-, -NHCO-, -CONH-, -OCO-, -COO-, -CO-, -SO ₂ NH-, -SO ₂ - and combinations thereof. The number of carbon atoms in the alkylene group is preferably 1-30, more preferably 1-15, still more preferably 1-8, and particularly preferably 1-5. The alkylene group may be linear, branched, or cyclic, preferably linear or branched, and particularly preferably linear. The arylene group preferably has 6 to 30 carbon atoms, more preferably 6 to 15 carbon atoms. The arylene group is preferably a phenylene group. R ^L1 represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group, preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom. The preferred ranges of the alkyl group, alkenyl group, alkynyl group and aryl group represented by R ^L1 are the same as the preferred ranges of the alkyl group, alkenyl group, alkynyl group and aryl group of Ra ¹ .

The divalent linking group represented by L1 is preferably ^a group represented by the following formula (L1).
-L ^1A -L ^1B -L ^1C - (L1)
wherein L ^1A and L ^1C are each independently -O-, -N(R ^L1 )-, -NHCO-, -CONH-, -OCO-, -COO-, -CO-, -SO ₂ NH represents - or -SO ₂ -, and L ^1B represents a single bond or a divalent linking group.

The divalent linking group represented by L ^1B includes an alkylene group, an arylene group, a single bond between an alkylene group and an arylene group, or -O-, -N(R ^L1 )-, -NHCO-, -CONH-, and -OCO- , —COO—, —CO—, —SO ₂ NH—, —SO ₂ — and groups bonded through a group consisting of a combination thereof, alkylene groups or arylene groups may be replaced by —O—, —N(R ^L1 )-, -NHCO-, -CONH-, -OCO-, -COO-, -CO-, -SO ₂ NH-, -SO ₂ - and a group bonded through a group consisting of combinations thereof. .

Specific examples of L ¹ include groups having the following structures.

When Z ¹ in formula (1) is an acid group, the acid group is preferably at least one selected from a carboxyl group, a sulfo group, a phosphoric acid group and salts thereof, and a carboxyl group and a sulfo group. and salts thereof. Atoms or atomic groups constituting the salt include alkali metal ions (Li ⁺ , Na ⁺ , K ⁺ etc.), alkaline earth metal ions (Ca ²⁺ , Mg ²⁺ etc.), ammonium ions, imidazolium ions, pyridinium ions, phosphonium ion and the like.

式中、＊は結合手を表し、
Ｙｚ^１は－Ｎ（Ｒｙ^１）－または－Ｏ－を表し、
Ｒｙ^１は、水素原子、アルキル基、アルケニル基、アルキニル基またはアリール基を表し、
Ｌｚ^１は、２価の連結基を表し、
Ｒｚ^１およびＲｚ^２は、それぞれ独立して水素原子、アルキル基、アルケニル基、アルキニル基またはアリール基を表し、
Ｒｚ^１とＲｚ^２は２価の基を介して結合して環を形成していてもよく、
ｍは１～５の整数を表す。When Z ¹ in formula (1) is a basic group, as described above, Z ¹ is preferably a group represented by formula (Z1) below.

In the formula, * represents a bond,
Yz ¹ represents -N(Ry ¹ )- or -O-,
Ry ¹ represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group;
Lz ¹ represents a divalent linking group,
Rz ¹ and Rz ² each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group;
Rz ¹ and Rz ² may be bonded via a divalent group to form a ring,
m represents an integer of 1 to 5;

In formula (Z1), Yz ¹ represents -N(Ry ¹ )- or -O-, and is preferably -N(Ry ¹ )- because it tends to improve durability.

Ry ¹ represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group, preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom. The preferred ranges of the alkyl group, alkenyl group, alkynyl group and aryl group represented by Ry ¹ are the same as the preferred ranges of the alkyl group, alkenyl group, alkynyl group and aryl group of Ra ¹ .

In formula (Z1), the divalent linking group represented by Lz ¹ includes an alkylene group, an arylene group, a heterocyclic group, -O-, -N(R ^L1 )-, -NHCO-, -CONH-, and -OCO. -, -COO-, -CO-, -SO ₂ NH-, -SO ₂ - and combinations thereof, with alkylene groups being preferred. The number of carbon atoms in the alkylene group is preferably 1-30, more preferably 1-15, still more preferably 1-8, and particularly preferably 1-5. The alkylene group may be linear, branched, or cyclic, preferably linear or branched, and particularly preferably linear.

In formula (Z1), Rz ¹ and Rz ² each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group, preferably an alkyl group or an aryl group, and an alkyl group. is more preferred. The number of carbon atoms in the alkyl group is preferably 1-10, more preferably 1-5, still more preferably 1-3, and particularly preferably 1 or 2. The alkyl group may be linear, branched or cyclic, preferably linear or branched, more preferably linear. The alkenyl group preferably has 2 to 10 carbon atoms, more preferably 2 to 8 carbon atoms, and particularly preferably 2 to 5 carbon atoms. The alkenyl group may be linear, branched or cyclic, preferably linear or branched, more preferably linear. The alkynyl group preferably has 2 to 10 carbon atoms, more preferably 2 to 8 carbon atoms, and particularly preferably 2 to 5 carbon atoms. The alkynyl group may be linear, branched or cyclic, preferably linear or branched, more preferably linear. The number of carbon atoms in the aryl group is preferably 6-30, more preferably 6-20, even more preferably 6-12.

In formula (Z1), Rz ¹ and Rz ² may combine via a divalent group to form a ring. Divalent groups include -CH ₂ -, -O- and -SO ₂ -. Specific examples of the ring formed by Rz ¹ and Rz ² via a divalent group include the following.

In formula (Z1), m represents an integer of 1 to 5, preferably 1 to 4, more preferably 1 to 3, still more preferably 2 to 3, and particularly preferably 2.

式中、＊は結合手を表し、
Ｙｚ^２およびＹｚ^３は、それぞれ独立して－Ｎ（Ｒｙ^２）－または－Ｏ－を表し、
Ｒｙ^２は、水素原子、アルキル基、アルケニル基、アルキニル基またはアリール基を表し、
Ｌｚ^２およびＬｚ^３は、それぞれ独立して２価の連結基を表し、
Ｒｚ^３～Ｒｚ^６は、それぞれ独立して水素原子、アルキル基、アルケニル基、アルキニル基またはアリール基を表し、
Ｒｚ^３とＲｚ^４、および、Ｒｚ^５とＲｚ^６は、それぞれ２価の基を介して結合して環を形成していてもよい。In formula (1), Z ¹ is preferably a group represented by formula (Z2) below.

In the formula, * represents a bond,
Yz ² and Yz ³ each independently represent -N(Ry ² )- or -O-;
Ry ² represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group;
Lz ² and Lz ³ each independently represent a divalent linking group,
Rz ³ to Rz ⁶ each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group;
Rz ³ and Rz ⁴ , and Rz ⁵ and Rz ⁶ may each combine via a divalent group to form a ring.

Yz ² and Yz ³ in formula (Z2) have the same meaning as Yz ¹ in formula (Z1), and the preferred ranges are also the same. ^Ry2 represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group, preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom. The preferred ranges of the alkyl group, alkenyl group, alkynyl group and aryl group represented by Ry ² are the same as the preferred ranges of the alkyl group, alkenyl group, alkynyl group and aryl group of Ra ¹ .

Lz ² and Lz ³ in formula (Z2) have the same meaning as Lz ¹ in formula (Z1), and the preferred ranges are also the same. Rz ³ to Rz ⁶ in formula (Z2) are synonymous with Rz ¹ and Rz ² in formula (Z1), and the preferred ranges are also the same.

Specific examples of Z ¹ include groups having the following structures. In the following structural formulas, Ph represents a phenyl group.

In the present invention, the compound (1) used in the photosensitive composition is preferably a compound represented by the following formula (2). By using such compounds, the effects of the present invention can be obtained more remarkably.
A ¹ -X ¹ -L ² -X ² -Z ¹ (2)
In formula (2), A ¹ represents a group containing an aromatic ring,
X ¹ and X ² are each independently a single bond, -O-, -N(R ¹ )-, -NHCO-, -CONH-, -OCO-, -COO-, -CO-, -SO ₂ NH -, or -SO ₂ -,
R ¹ represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group;
L2 represents a single bond or a ^divalent linking group,
Z ¹ represents a group represented by formula (Z1) described above.

A ¹ and Z ¹ in formula (2) are synonymous with A ¹ and Z ¹ in formula (1), and preferred ranges are also the same.

X ¹ and X ² in formula (2) are each independently a single bond, -O-, -N(R ¹ )-, -NHCO-, -CONH-, -OCO-, -COO-, -CO- , —SO ₂ NH—, or —SO ₂ —, and —O—, —N(R ¹ )—, —NHCO—, —CONH—, —OCO—, —COO—, —CO—, —SO ₂ NH- or -SO ₂ - is preferred. R ¹ represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group, preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom. The preferred ranges of the alkyl group, alkenyl group, alkynyl group and aryl group represented by R ¹ are the same as the preferred ranges of the alkyl group, alkenyl group, alkynyl group and aryl group represented by Ra ¹ .

L2 in formula ( ² ) represents a single bond or a divalent linking group. The divalent linking group represented by L ² includes an alkylene group, an arylene group, a single bond between an alkylene group and an arylene group, or -O-, -N(R ² )-, -NHCO-, -CONH-, and -OCO- , —COO—, —CO—, —SO ₂ NH—, —SO ₂ — and groups bonded through a group consisting of a combination thereof, alkylene groups or arylene groups, and —O—, —N(R ² )-, -NHCO-, -CONH-, -OCO-, -COO-, -CO-, -SO ₂ NH-, -SO ₂ - and a group bonded through a group consisting of combinations thereof. . ^R2 represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group, preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom. The preferred ranges of the alkyl group, alkenyl group, alkynyl group and aryl group represented by R ² are the same as the preferred ranges of the alkyl group, alkenyl group, alkynyl group and aryl group represented by Ra ¹ .

Specific examples of compound (1) include the following. In the table below, the symbols described in the columns for the structure of A ¹ , the structure of L ¹ , and the structure of Z ¹ are specific examples of A ¹ (that is, specific examples of the group represented by the above formula (A1)). , L ¹ , and Z ¹ .

The content of the pigment derivative in the total solid content of the photosensitive composition is preferably 0.3 to 20% by mass. The lower limit is more preferably 0.6% by mass or more, and even more preferably 0.9% by mass or more. The upper limit is more preferably 15% by mass or less, even more preferably 12.5% by mass or less, and particularly preferably 10% by mass or less.

The weight ratio of the pigment derivative content in the total solid content of the composition to the pigment content in the total solid content of the composition is preferably 3:97 to 20:80. The upper limit of this mass ratio is more preferably 15:85 or less, and even more preferably 13:87 or less. The lower limit of this mass ratio is more preferably 5:95 or more, and even more preferably 8:92 or more. In other words, the content of the pigment derivative is preferably 3 to 25 parts by mass with respect to 100 parts by mass of the pigment. The upper limit is more preferably 17.6 parts by mass or less, and even more preferably 14.9 mass % or less. The lower limit is more preferably 5.3% by mass or more, and even more preferably 8.7% by mass or more.

Further, the total content of the pigment and the pigment derivative (pigment concentration) in the total solid content of the composition is preferably 25 to 65% by mass. The lower limit is more preferably 30% by mass or more, still more preferably 35% by mass or more, and particularly preferably 40% by mass or more. The upper limit is more preferably 63% by mass or less, and even more preferably 60% by mass or less.

The content of a certain solid component in the total solid content of the composition is approximately equal to the content of the solid component in pixels formed by curing the composition.

Only one pigment derivative may be used, or two or more pigment derivatives may be used in combination. When two or more are used in combination, the total amount thereof is preferably within the above range.

In the present invention, the photosensitive composition comprises a pigment derivative having a maximum molar extinction coefficient ( ^εmax ) of 3000 L·mol ⁻¹ cm ⁻¹ or less in a wavelength region of 400 to 700 nm, and • A pigment derivative exceeding cm ⁻¹ may be used in combination. When these are used in combination, the content of the pigment derivative having εmax of 3000 L·mol ⁻¹ cm ⁻¹ or less is preferably 40% by mass or more, more preferably 60% by mass or more, based on the total pigment derivative. More preferably, it is 80% by mass or more.

<<polymerizable compound>>
Pixels in the structure of the present invention preferably contain a polymerizable compound. As the polymerizable compound, known compounds that can be crosslinked by radicals, acids or heat can be used. In the present invention, the polymerizable compound is preferably, for example, a compound having an ethylenically unsaturated bond group. Examples of ethylenically unsaturated bond groups include vinyl groups, (meth)allyl groups, and (meth)acryloyl groups. The polymerizable compound used in the present invention is preferably a radically polymerizable compound.

The polymerizable compound may be in any chemical form such as monomer, prepolymer, oligomer, etc., but monomer is preferred. The molecular weight of the polymerizable compound is preferably 100-3000. The upper limit is more preferably 2000 or less, and even more preferably 1500 or less. The lower limit is more preferably 150 or more, even more preferably 250 or more.

The polymerizable compound is preferably a compound containing 3 or more ethylenically unsaturated bond groups, more preferably a compound containing 3 to 15 ethylenically unsaturated bond groups. Compounds containing 3 to 6 groups are more preferred. The polymerizable compound is preferably a 3- to 15-functional (meth)acrylate compound, more preferably a 3- to 6-functional (meth)acrylate compound. Specific examples of the polymerizable compound include paragraph numbers 0095 to 0108 of JP-A-2009-288705, paragraph 0227 of JP-A-2013-029760, paragraph numbers 0254-0257 of JP-A-2008-292970, and JP-A-2008-292970. 2013-253224, paragraphs 0034 to 0038, JP 2012-208494, paragraph 0477, JP 2017-048367, JP 6057891, the compound described in JP 6031807 , the contents of which are incorporated herein.

As the polymerizable compound, dipentaerythritol triacrylate (commercially available as KAYARAD D-330; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetraacrylate (commercially available as KAYARAD D-320; Nippon Kayaku Co., Ltd. ), dipentaerythritol penta (meth) acrylate (commercially available as KAYARAD D-310; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol hexa (meth) acrylate (commercially available as KAYARAD DPHA; Nippon Kayaku Co., Ltd., NK Ester A-DPH-12E; Shin-Nakamura Chemical Co., Ltd.), and structures in which these (meth)acryloyl groups are bonded via ethylene glycol and / or propylene glycol residues Compounds (eg SR454, SR499, commercially available from Sartomer) are preferred. Further, as the polymerizable compound, diglycerin EO (ethylene oxide) modified (meth) acrylate (commercially available M-460; manufactured by Toagosei), pentaerythritol tetraacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., NK Ester A -TMMT), 1,6-hexanediol diacrylate (manufactured by Nippon Kayaku Co., Ltd., KAYARAD HDDA), RP-1040 (manufactured by Nippon Kayaku Co., Ltd.), Aronix TO-2349 (manufactured by Toagosei Co., Ltd.) , NK Oligo UA-7200 (manufactured by Shin-Nakamura Chemical Co., Ltd.), 8UH-1006, 8UH-1012 (manufactured by Taisei Fine Chemical Co., Ltd.), light acrylate POB-A0 (manufactured by Kyoeisha Chemical Co., Ltd.), etc. can also

In addition, as the polymerizable compound, trimethylolpropane tri(meth)acrylate, trimethylolpropane propyleneoxy-modified tri(meth)acrylate, trimethylolpropane ethyleneoxy-modified tri(meth)acrylate, isocyanuric acid ethyleneoxy-modified tri(meth)acrylate. , pentaerythritol tri(meth)acrylate and the like are also preferably used. Commercial products of trifunctional (meth)acrylate compounds include Aronix M-309, M-310, M-321, M-350, M-360, M-313, M-315, M-306 and M-305. , M-303, M-452, M-450 (manufactured by Toagosei Co., Ltd.), NK Ester A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A-TMM-3L, A -TMM-3LM-N, A-TMPT, TMPT (manufactured by Shin-Nakamura Chemical Co., Ltd.), KAYARAD GPO-303, TMPTA, THE-330, TPA-330, PET-30 (manufactured by Nippon Kayaku Co., Ltd.) etc.

For example, in the present invention, a compound having the following structure can be used as the polymer compound.

In addition, in the present invention, a mixture of two types of compounds each having the following structure (7:3 molar ratio between the left side and the right side) can also be used as the polymer compound.

A compound having an acid group can also be used as the polymerizable compound. By using a polymerizable compound having an acid group, the polymerizable compound in the unexposed area is easily removed during development, and generation of development residue can be suppressed. The acid group includes a carboxyl group, a sulfo group, a phosphoric acid group and the like, and a carboxyl group is preferred. Commercially available polymerizable compounds having an acid group include Aronix M-510, M-520 and Aronix TO-2349 (manufactured by Toagosei Co., Ltd.). The acid value of the polymerizable compound having an acid group is preferably 0.1-40 mgKOH/g, more preferably 5-30 mgKOH/g. When the acid value of the polymerizable compound is 0.1 mgKOH/g or more, the solubility in the developer is good, and when it is 40 mgKOH/g or less, it is advantageous in terms of production and handling.

It is also a preferred embodiment that the polymerizable compound is a compound having a caprolactone structure. Polymerizable compounds having a caprolactone structure are commercially available from Nippon Kayaku Co., Ltd. under the KAYARAD DPCA series, including DPCA-20, DPCA-30, DPCA-60, DPCA-120, and the like.

A polymerizable compound having an alkyleneoxy group can also be used as the polymerizable compound. The polymerizable compound having an alkyleneoxy group is preferably a polymerizable compound having an ethyleneoxy group and / or a propyleneoxy group, more preferably a polymerizable compound having an ethyleneoxy group, and 3 to 4 having 4 to 20 ethyleneoxy groups. A hexafunctional (meth)acrylate compound is more preferred. Commercially available polymerizable compounds having an alkyleneoxy group include, for example, SR-494, a tetrafunctional (meth)acrylate having four ethyleneoxy groups and a trifunctional (meth)acrylate having three isobutyleneoxy groups manufactured by Sartomer Co., Ltd. KAYARAD TPA-330, which is an acrylate, and the like.

A polymerizable compound having a fluorene skeleton can also be used as the polymerizable compound. Commercially available polymerizable compounds having a fluorene skeleton include Ogsol EA-0200 and EA-0300 (manufactured by Osaka Gas Chemicals Co., Ltd., (meth)acrylate monomers having a fluorene skeleton).

As the polymerizable compound, it is also preferable to use a compound that does not substantially contain environmental regulation substances such as toluene. Commercially available products of such compounds include KAYARAD DPHA LT and KAYARAD DPEA-12 LT (manufactured by Nippon Kayaku Co., Ltd.).

Examples of the polymerizable compound include urethane acrylates such as those described in JP-B-48-041708, JP-A-51-037193, JP-B-02-032293, JP-B-02-016765, Urethane compounds having an ethylene oxide skeleton described in JP-B-58-049860, JP-B-56-017654, JP-B-62-039417 and JP-B-62-039418 are also suitable. It is also preferable to use a polymerizable compound having an amino structure or a sulfide structure in the molecule described in JP-A-63-277653, JP-A-63-260909 and JP-A-01-105238. Further, as the polymerizable compound, UA-7200 (manufactured by Shin-Nakamura Chemical Co., Ltd.), DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA-306I, AH-600 , T-600, AI-600, and LINC-202UA (manufactured by Kyoeisha Chemical Co., Ltd.) can also be used.

The content of the polymerizable compound in the total solid content of the photosensitive composition is preferably 0.1 to 50% by mass. The lower limit is more preferably 0.5% by mass or more, and even more preferably 1% by mass or more. The upper limit is more preferably 45% by mass or less, and even more preferably 40% by mass or less. The polymerizable compound may be used singly or in combination of two or more. When two or more are used in combination, it is preferable that the total of them is within the above range.

<<Oxime-based photopolymerization initiator>>
In the present invention, the photosensitive composition may contain an oxime photopolymerization initiator as a photopolymerization initiator. Examples of the oxime-based photopolymerization initiator include compounds having an oxime site in the molecule (oxime compounds).

The oxime photopolymerization initiator used in the present invention is preferably a radical photopolymerization initiator. Moreover, the oxime-based photopolymerization initiator is preferably a compound having photosensitivity to light in the ultraviolet region to the visible region. The oxime photopolymerization initiator is preferably a compound having a maximum absorption wavelength in the wavelength range of 350 to 500 nm, more preferably a compound having a maximum absorption wavelength in the wavelength range of 360 to 480 nm. In addition, the molar extinction coefficient of the oxime compound at a wavelength of 365 nm or a wavelength of 405 nm is preferably high from the viewpoint of sensitivity, more preferably 1000 to 300000, even more preferably 2000 to 300000, even more preferably 5000 to 200000. is particularly preferred. The molar extinction coefficient of an oxime compound can be measured using a known method. For example, it is preferably measured at a concentration of 0.01 g/L using an ethyl acetate solvent with a spectrophotometer (Cary-5 spectrophotometer manufactured by Varian).

Examples of the oxime-based photopolymerization initiator include compounds described in JP-A-2001-233842, compounds described in JP-A-2000-080068, compounds described in JP-A-2006-342166, J. Am. C. S. Compounds described in Perkin II (1979, pp. 1653-1660), J. Am. C. S. Perkin II (1979, pp.156-162), compounds described in Journal of Photopolymer Science and Technology (1995, pp.202-232), compounds described in JP-A-2000-066385, Compounds described in JP-A-2000-080068, compounds described in JP-A-2004-534797, compounds described in JP-A-2006-342166, compounds described in JP-A-2017-019766, Patent No. Compounds described in WO 2015/152153, compounds described in WO 2017/051680, compounds described in JP 2017-198865, WO 2017/164127 and the compounds described in paragraphs 0025 to 0038 of No. Specific examples of oxime photopolymerization initiators include 3-benzoyloxyiminobutane-2-one, 3-acetoxyiminobutane-2-one, 3-propionyloxyiminobutane-2-one, 2-acetoxyiminopentane- 3-one, 2-acetoxyimino-1-phenylpropan-1-one, 2-benzoyloxyimino-1-phenylpropan-1-one, 3-(4-toluenesulfonyloxy)iminobutan-2-one, and 2 -ethoxycarbonyloxyimino-1-phenylpropan-1-one and the like. Commercially available products include IRGACURE-OXE01, IRGACURE-OXE02, IRGACURE-OXE03, IRGACURE-OXE04 (manufactured by BASF), TR-PBG-304 (manufactured by Changzhou Tenryu Electric New Materials Co., Ltd.), and Adeka Optomer N-1919. (manufactured by ADEKA Corporation, photopolymerization initiator 2 described in JP-A-2012-014052).

As the oxime-based photopolymerization initiator, it is also preferable to use an oxime compound having no coloring property or an oxime compound having high transparency and resistance to discoloration. Commercially available products include ADEKA Arkles NCI-730, NCI-831, and NCI-930 (manufactured by ADEKA Corporation).

In the present invention, an oxime compound having a fluorene ring can also be used as the oxime photopolymerization initiator. Specific examples of oxime compounds having a fluorene ring include compounds described in JP-A-2014-137466. The contents of which are incorporated herein.

In the present invention, an oxime compound having a fluorine atom can also be used as the oxime-based photopolymerization initiator. Specific examples of the oxime compound having a fluorine atom include compounds described in JP-A-2010-262028, compounds 24, 36 to 40 described in JP-A-2014-500852, and JP-A-2013-164471. and the compound (C-3) of. The contents of which are incorporated herein.

In the present invention, an oxime compound having a nitro group can be used as the oxime photopolymerization initiator. The oxime compound having a nitro group is also preferably a dimer. Specific examples of the oxime compound having a nitro group include the compounds described in paragraph numbers 0031 to 0047 of JP-A-2013-114249 and paragraph numbers 0008-0012 and 0070-0079 of JP-A-2014-137466; Compounds described in paragraphs 0007 to 0025 of Japanese Patent No. 4223071 and ADEKA Arkles NCI-831 (manufactured by ADEKA Corporation) can be mentioned.

In the present invention, an oxime compound having a benzofuran skeleton can also be used as the oxime-based photopolymerization initiator. Specific examples include OE-01 to OE-75 described in WO 2015/036910.

In the present invention, a bifunctional or trifunctional oxime photopolymerization initiator may be used as the oxime photopolymerization initiator. By using such an oxime-based photopolymerization initiator, two or more radicals are generated from one molecule of the oxime-based photopolymerization initiator, so good sensitivity can be obtained. In addition, when a compound having an asymmetric structure is used as the oxime-based photopolymerization initiator, the crystallinity is lowered and the solubility in a solvent or the like is improved. Stability can be improved. Specific examples of bifunctional or trifunctional oxime-based photopolymerization initiators include JP 2010-527339, JP 2011-524436, WO 2015/004565, JP 2016-532675. Paragraph Nos. 0407 to 0412 of International Publication No. 2017/033680 Paragraph Nos. 0039 to 0055 of the oxime compound dimer described in JP-A-2013-522445 Compound (E) and compounds described in (G), Cmpd 1 to 7 described in International Publication No. 2016/034963, oxime-based photopolymerization initiator described in paragraph number 0007 of JP 2017-523465, JP 2017-167399 Oxime-based photopolymerization initiators described in paragraph numbers 0020 to 0033 of JP-A-2017-151342, the photopolymerization initiator described in paragraph numbers 0017 to 0026 (A), and the like.

Specific examples of the oxime-based photopolymerization initiator preferably used in the present invention are shown below, but the present invention is not limited thereto.

The content of the oxime photopolymerization initiator in the total solid content of the photosensitive composition is preferably 0.1 to 30% by mass. The lower limit is more preferably 0.5% by mass or more, and even more preferably 1% by mass or more. The upper limit is more preferably 20% by mass or less, and even more preferably 15% by mass or less. In the present invention, only one type of oxime-based photopolymerization initiator may be used, or two or more types may be used. When two or more are used, the total amount thereof is preferably within the above range.

<<Other photoinitiators>>
In the present invention, the photosensitive composition can contain a photopolymerization initiator other than the oxime photopolymerization initiator (another photopolymerization initiator) as a photopolymerization initiator. Other photopolymerization initiators include halogenated hydrocarbon derivatives (e.g., compounds having a triazine skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazoles, organic peroxides, thio compounds, Ketone compounds, aromatic onium salts, α-hydroxyketone compounds, α-aminoketone compounds and the like. Other photopolymerization initiators, from the viewpoint of exposure sensitivity, include trihalomethyltriazine compounds, benzyldimethylketal compounds, α-hydroxyketone compounds, α-aminoketone compounds, acylphosphine compounds, phosphine oxide compounds, metallocene compounds, and triarylimidazole dimers. , onium compounds, benzothiazole compounds, benzophenone compounds, acetophenone compounds, cyclopentadiene-benzene-iron complexes, halomethyloxadiazole compounds and 3-aryl-substituted coumarin compounds, α-hydroxyketone compounds, α-aminoketones compounds and acylphosphine compounds are more preferred.

Commercially available α-hydroxyketone compounds include IRGACURE-184, DAROCUR-1173, IRGACURE-500, IRGACURE-2959, and IRGACURE-127 (manufactured by BASF). Commercially available α-aminoketone compounds include IRGACURE-907, IRGACURE-369, IRGACURE-379, and IRGACURE-379EG (manufactured by BASF). Commercially available acylphosphine compounds include IRGACURE-819 and DAROCUR-TPO (manufactured by BASF).

In the present invention, when the photosensitive composition contains another photopolymerization initiator, the content of the other photopolymerization initiator in the total solid content of the composition is preferably 0.1 to 30% by mass. The lower limit is more preferably 0.5% by mass or more, and even more preferably 1% by mass or more. The upper limit is more preferably 20% by mass or less, and even more preferably 15% by mass or less.

Also, the content of the other photopolymerization initiator is preferably 1 to 100 parts by mass with respect to 100 parts by mass of the oxime-based photopolymerization initiator. The upper limit is more preferably 90 parts by mass or less, and even more preferably 80 parts by mass or less. The lower limit is more preferably 5 parts by mass or more, and even more preferably 10 parts by mass or more.

In the present invention, the total content of the oxime initiator and other photopolymerization initiators in the total solid content of the photosensitive composition is preferably 0.1 to 30% by mass. The lower limit is more preferably 0.5% by mass or more, and even more preferably 1% by mass or more. The upper limit is more preferably 20% by mass or less, and even more preferably 15% by mass or less.

In the present invention, it is also preferred that the photosensitive composition does not substantially contain other photopolymerization initiators. According to this aspect, it is easy to form a film having excellent adhesion. In the present invention, when the photosensitive composition does not substantially contain other photopolymerization initiators, the content of other photopolymerization initiators in the total solid content of the composition is 0.05% by mass or less. is preferred, it is more preferably 0.01% by mass or less, and it is particularly preferred not to contain.

<<Resin>>
In the present invention, the photosensitive composition contains resin. The resin is blended, for example, for dispersing particles such as pigments in the photosensitive composition or as a binder. A resin that is mainly used to disperse particles such as pigments is also called a dispersant. However, such uses of the resin are only examples, and the resin can be used for purposes other than such uses.

The weight average molecular weight (Mw) of the resin is preferably 3,000 to 2,000,000. The upper limit is more preferably 1,000,000 or less, and even more preferably 500,000 or less. The lower limit is more preferably 4000 or more, and even more preferably 5000 or more.

Resins include (meth)acrylic resins, ene-thiol resins, polycarbonate resins, polyether resins, polyarylate resins, polysulfone resins, polyethersulfone resins, polyphenylene resins, polyarylene ether phosphine oxide resins, polyimide resins, and polyamideimide resins. , polyolefin resins, cyclic olefin resins, polyester resins, styrene resins, and the like. One of these resins may be used alone, or two or more may be mixed and used. In addition, resins described in paragraph numbers 0041 to 0060 of JP-A-2017-206689 and resins described in paragraph numbers 0022-0071 of JP-A-2018-010856 can also be used.

In the present invention, it is preferable to use a resin having an acid group as the resin. According to this aspect, the developability of the photosensitive composition can be improved, and pixels with excellent rectangularity can be easily formed. The acid group includes a carboxyl group, a phosphoric acid group, a sulfo group, a phenolic hydroxyl group and the like, and a carboxyl group is preferred. A resin having an acid group can be used, for example, as an alkali-soluble resin.

The resin having an acid group preferably contains a repeating unit having an acid group on its side chain, and more preferably contains 5 to 70 mol % of repeating units having an acid group on its side chain in the total repeating units of the resin. The upper limit of the content of repeating units having an acid group in the side chain is more preferably 50 mol % or less, particularly preferably 30 mol % or less. The lower limit of the content of repeating units having an acid group in the side chain is more preferably 10 mol % or more, particularly preferably 20 mol % or more.

Resins having an acid group, for example, ether dimers described in JP-A-2013-029760 can also be used. The contents of which are incorporated herein.

式（Ｘ）中、Ｒ_１は、水素原子またはメチル基を表し、Ｒ_２は炭素数２～１０のアルキレン基を表し、Ｒ_３は、水素原子またはベンゼン環を含んでもよい炭素数１～２０のアルキル基を表す。ｎは１～１５の整数を表す。It is also preferable that the resin used in the present invention contains a repeating unit derived from a compound represented by the following formula (X).

In formula (X), R ₁ represents a hydrogen atom or a methyl group, R ₂ represents an alkylene group having 2 to 10 carbon atoms, R ₃ represents a hydrogen atom or 1 to 20 carbon atoms which may contain a benzene ring. represents an alkyl group of n represents an integer from 1 to 15;

For the resin having an acid group, JP 2012-208494, paragraph numbers 0558 to 0571 (corresponding US Patent Application Publication No. 2012/0235099, paragraph numbers 0685 to 0700), JP 2012-198408 The descriptions in paragraphs 0076 to 0099 of the publication can be referred to, and the contents thereof are incorporated herein. Moreover, resin which has an acid group can also use a commercial item.

The acid value of the resin having acid groups is preferably 30-500 mgKOH/g. The lower limit is more preferably 50 mgKOH/g or more, and even more preferably 70 mgKOH/g or more. The upper limit is more preferably 400 mgKOH/g or less, still more preferably 300 mgKOH/g or less, and particularly preferably 200 mgKOH/g or less. The weight average molecular weight (Mw) of the acid group-containing resin is preferably 5,000 to 100,000. Moreover, the number average molecular weight (Mn) of the resin having an acid group is preferably 1,000 to 20,000.

Resins having an acid group include, for example, resins having the following structures.

In the present invention, the photosensitive composition can also contain a resin as a dispersant. Dispersants include acidic dispersants (acidic resins) and basic dispersants (basic resins). Here, the acidic dispersant (acidic resin) represents a resin in which the amount of acid groups is greater than the amount of basic groups. The acidic dispersant (acidic resin) is preferably a resin in which the amount of acid groups is 70 mol % or more when the total amount of acid groups and basic groups is 100 mol %. A resin consisting only of groups is more preferred. The acid group possessed by the acidic dispersant (acidic resin) is preferably a carboxyl group. The acid value of the acidic dispersant (acidic resin) is preferably from 40 to 105 mgKOH/g, more preferably from 50 to 105 mgKOH/g, even more preferably from 60 to 105 mgKOH/g. Further, a basic dispersant (basic resin) represents a resin in which the amount of basic groups is greater than the amount of acid groups. The basic dispersant (basic resin) is preferably a resin in which the amount of basic groups exceeds 50 mol % when the total amount of acid groups and basic groups is 100 mol %. The basic group possessed by the basic dispersant is preferably an amino group.

The resin used as the dispersant preferably contains a repeating unit having an acid group. When the resin used as the dispersant contains a repeating unit having an acid group, it is possible to further suppress the generation of development residues when forming a pattern by photolithography.

It is also preferable that the resin used as the dispersant is a graft resin. Details of the graft resin can be referred to paragraphs 0025 to 0094 of JP-A-2012-255128, the contents of which are incorporated herein. Moreover, it is also preferable that the resin used as the dispersant is a resin containing a hindered amine quaternary salt. Details of such resins can be referred to, for example, the description of JP-A-2019-095548, the contents of which are incorporated herein.

It is also preferable that the resin used as the dispersant is a polyimine-based dispersant containing a nitrogen atom in at least one of the main chain and the side chain. The polyimine-based dispersant has a main chain having a partial structure having a functional group with a pKa of 14 or less and a side chain having 40 to 10,000 atoms, and at least one of the main chain and the side chain has a basic nitrogen atom. A resin having The basic nitrogen atom is not particularly limited as long as it is a nitrogen atom exhibiting basicity. Regarding the polyimine-based dispersant, the description in paragraphs 0102 to 0166 of JP-A-2012-255128 can be referred to, and the contents thereof are incorporated herein.

It is also preferable that the resin used as the dispersant has a structure in which a plurality of polymer chains are bonded to the core portion. Such resins include, for example, dendrimers (including star polymers). Further, specific examples of dendrimers include polymer compounds C-1 to C-31 described in paragraphs 0196 to 0209 of JP-A-2013-043962.

Moreover, the above-described resin having an acid group (alkali-soluble resin) can also be used as a dispersant.

The resin used as the dispersant is also preferably a resin containing a repeating unit having an ethylenically unsaturated bond group in its side chain. The content of repeating units having an ethylenically unsaturated bond group in the side chain is preferably 10 mol% or more, more preferably 10 to 80 mol%, more preferably 20 to 70 mol, of the total repeating units of the resin. % is more preferred.

Dispersants are also available as commercial products, and specific examples thereof include BYK Chemie's DISPERBYK series (e.g., DISPERBYK-111, 161, etc.), Nippon Lubrizol Co., Ltd.'s Solsperse series ( For example, Solsperse 76500, etc.). Also, the pigment dispersants described in paragraphs 0041 to 0130 of JP-A-2014-130338 can be used, the contents of which are incorporated herein. In addition, the resin described as the dispersant can also be used for purposes other than the dispersant. For example, it can also be used as a binder.

In the present invention, when the photosensitive composition contains a resin, the content of the resin in the total solid content of the photosensitive composition is preferably 5 to 50% by mass. The lower limit is more preferably 10% by mass or more, and even more preferably 15% by mass or more. The upper limit is more preferably 40% by mass or less, even more preferably 35% by mass or less, and particularly preferably 30% by mass or less. Moreover, the content of the resin having an acid group in the total solid content of the photosensitive composition is preferably 5 to 50% by mass. The lower limit is more preferably 10% by mass or more, and even more preferably 15% by mass or more. The upper limit is more preferably 40% by mass or less, even more preferably 35% by mass or less, and particularly preferably 30% by mass or less. In addition, the content of the resin having an acid group in the total amount of the resin is preferably 30% by mass or more, more preferably 50% by mass or more, and still more preferably 70% by mass or more, for the reason that excellent developability can be easily obtained. 80% by mass or more is particularly preferred. The upper limit can be 100% by mass, 95% by mass, or 90% by mass or less.

Further, the total content of the polymerizable compound and the resin in the total solid content of the photosensitive composition is preferably 10 to 65% by mass from the viewpoint of curability, developability and film formation. The lower limit is more preferably 15% by mass or more, still more preferably 20% by mass or more, and particularly preferably 30% by mass or more. The upper limit is more preferably 60% by mass or less, even more preferably 50% by mass or less, and particularly preferably 40% by mass or less. Moreover, it is preferable to contain 30 to 300 parts by mass of the resin with respect to 100 parts by mass of the polymerizable compound. The lower limit is more preferably 50 parts by mass or more, and even more preferably 80 parts by mass or more. The upper limit is more preferably 250 parts by mass or less, and even more preferably 200 parts by mass or less.

<<Compound Having a Cyclic Ether Group>>
In the present invention, the photosensitive composition can contain a compound having a cyclic ether group. Cyclic ether groups include epoxy groups and oxetanyl groups. The compound having a cyclic ether group is preferably a compound having an epoxy group. Compounds having an epoxy group include compounds having one or more epoxy groups in one molecule, and compounds having two or more epoxy groups are preferred. It is preferable to have 1 to 100 epoxy groups in one molecule. The upper limit of the number of epoxy groups may be, for example, 10 or less, or 5 or less. The lower limit of epoxy groups is more preferably two or more. As the compound having an epoxy group, paragraph numbers 0034 to 0036 of JP-A-2013-011869, paragraph numbers 0147-0156 of JP-A-2014-043556, paragraph numbers 0085-0092 of JP-A-2014-089408 The compounds described in JP-A-2017-179172 can also be used. The contents of these are incorporated herein.

The compound having an epoxy group may be a low-molecular compound (e.g., molecular weight less than 2000, further molecular weight less than 1000), or a macromolecule (e.g., molecular weight 1000 or more, in the case of a polymer, weight-average molecular weight 1000 or more). The weight average molecular weight of the epoxy group-containing compound is preferably 200 to 100,000, more preferably 500 to 50,000. The upper limit of the weight average molecular weight is more preferably 10,000 or less, particularly preferably 5,000 or less, and still more preferably 3,000 or less.

An epoxy resin can be preferably used as the compound having an epoxy group. Examples of epoxy resins include epoxy resins that are glycidyl etherified compounds of phenolic compounds, epoxy resins that are glycidyl etherified compounds of various novolak resins, alicyclic epoxy resins, aliphatic epoxy resins, heterocyclic epoxy resins, glycidyl ester-based Epoxy resins, glycidylamine-based epoxy resins, epoxy resins obtained by glycidylating halogenated phenols, condensation products of silicon compounds with epoxy groups and other silicon compounds, polymerizable unsaturated compounds with epoxy groups and other Examples include copolymers with other polymerizable unsaturated compounds. The epoxy equivalent of the epoxy resin is preferably 310 to 3300 g/eq, more preferably 310 to 1700 g/eq, even more preferably 310 to 1000 g/eq.

Examples of commercially available compounds having a cyclic ether group include EHPE3150 (manufactured by Daicel Corporation), EPICLON N-695 (manufactured by DIC Corporation), Marproof G-0150M, G-0105SA, G-0130SP, G -0250SP, G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, G-01758 (these are epoxy group-containing polymers manufactured by NOF Corporation) and the like.

In the present invention, when the photosensitive composition contains a compound having a cyclic ether group, the content of the compound having a cyclic ether group in the total solid content of the photosensitive composition is preferably 0.1 to 20% by mass. . The lower limit is, for example, more preferably 0.5% by mass or more, and even more preferably 1% by mass or more. The upper limit is, for example, more preferably 15% by mass or less, and even more preferably 10% by mass or less. Only one kind of compound having a cyclic ether group may be used, or two or more kinds thereof may be used. When two or more types are used, the total amount thereof is preferably within the above range.

<<Silane coupling agent>>
In the present invention, the photosensitive composition can contain a silane coupling agent. According to this aspect, the adhesion of the obtained membrane to the support can be further improved. In the present invention, a silane coupling agent means a silane compound having a hydrolyzable group and other functional groups. Further, the hydrolyzable group refers to a substituent that is directly bonded to a silicon atom and capable of forming a siloxane bond by at least one of a hydrolysis reaction and a condensation reaction. Hydrolyzable groups include, for example, halogen atoms, alkoxy groups, acyloxy groups and the like, with alkoxy groups being preferred. That is, the silane coupling agent is preferably a compound having an alkoxysilyl group. Examples of functional groups other than hydrolyzable groups include vinyl group, (meth)allyl group, (meth)acryloyl group, mercapto group, epoxy group, oxetanyl group, amino group, ureido group, sulfide group and isocyanate group. , phenyl group, etc., and amino group, (meth)acryloyl group and epoxy group are preferred. Specific examples of the silane coupling agent include compounds described in paragraph numbers 0018 to 0036 of JP-A-2009-288703 and compounds described in paragraph numbers 0056-0066 of JP-A-2009-242604. the contents of which are incorporated herein.

Examples of silane coupling agents include compounds having the following structures.

The content of the silane coupling agent in the total solid content of the photosensitive composition is preferably 0.1 to 5 mass %. The upper limit is more preferably 3% by mass or less, and even more preferably 2% by mass or less. The lower limit is more preferably 0.5% by mass or more, and even more preferably 1% by mass or more. The number of silane coupling agents may be one, or two or more. When two or more types are used, the total amount thereof is preferably within the above range.

<<Surfactant>>
In the present invention, the photosensitive composition can contain a surfactant. As the surfactant, various surfactants such as fluorine-based surfactants, nonionic surfactants, cationic surfactants, anionic surfactants and silicon surfactants can be used. For surfactants, reference can be made to paragraphs 0238-0245 of WO2015/166779, the contents of which are incorporated herein.

In the present invention, the surfactant is preferably a fluorosurfactant. By incorporating a fluorine-based surfactant into the photosensitive composition, the liquid properties (particularly fluidity) are further improved, and the liquid saving property can be further improved. In addition, it is also possible to form a film with less unevenness in thickness.

The fluorine content in the fluorosurfactant is preferably 3 to 40% by mass, more preferably 5 to 30% by mass, and particularly preferably 7 to 25% by mass. A fluorosurfactant having a fluorine content within this range is effective in terms of uniformity of the thickness of the coating film and liquid saving, and has good solubility in the photosensitive composition.

As the fluorine-based surfactant, JP 2014-041318 Paragraph Nos. 0060 to 0064 (corresponding International Publication No. 2014/017669 Paragraph Nos. 0060 to 0064) surfactants described in, JP 2011- 132503, paragraphs 0117-0132, the contents of which are incorporated herein. Commercially available fluorosurfactants include, for example, MEGAFACE F171, F172, F173, F176, F177, F141, F142, F143, F144, R30, F437, F475, F479, F482, F554, F780, EXP, MFS -330 (manufactured by DIC Corporation), Florard FC430, FC431, FC171 (manufactured by Sumitomo 3M Limited), Surflon S-382, SC-101, SC-103, SC-104, SC-105, SC-1068, SC-381, SC-383, S-393, KH-40 (manufactured by AGC Seimi Chemical Co., Ltd.), PolyFox PF636, PF656, PF6320, PF6520, PF7002 (manufactured by OMNOVA) and the like. .

Fluorine-based surfactants also include acrylic compounds that have a molecular structure with a functional group containing a fluorine atom, and when heat is applied, the portion of the functional group containing a fluorine atom is cleaved and the fluorine atom volatilizes. It can be used preferably. Examples of such fluorine-based surfactants include Megafac DS series manufactured by DIC Corporation (Kagaku Kogyo Nippo, February 22, 2016) (Nikkei Sangyo Shimbun, February 23, 2016), such as Megafac DS. -21.

It is also preferable to use a polymer of a fluorine atom-containing vinyl ether compound having a fluorinated alkyl group or a fluorinated alkylene ether group and a hydrophilic vinyl ether compound as the fluorosurfactant. For such fluorine-based surfactants, the description in JP-A-2016-216602 can be referred to, the content of which is incorporated herein.

上記の化合物の重量平均分子量は、好ましくは３０００～５００００であり、例えば、１４０００である。上記の化合物中、繰り返し単位の割合を示す％はモル％である。A block polymer can also be used as the fluorosurfactant. Examples thereof include compounds described in JP-A-2011-089090. The fluorosurfactant has a repeating unit derived from a (meth)acrylate compound having a fluorine atom and 2 or more (preferably 5 or more) alkyleneoxy groups (preferably ethyleneoxy groups and propyleneoxy groups) (meta) A fluorine-containing polymer compound containing a repeating unit derived from an acrylate compound can also be preferably used. The following compounds are also exemplified as fluorosurfactants used in the present invention.

The weight average molecular weight of the above compound is preferably 3000-50000, for example 14000. In the above compounds, % indicating the ratio of repeating units is mol %.

A fluoropolymer having an ethylenically unsaturated bond group in a side chain can also be used as the fluorosurfactant. Specific examples include the compounds described in paragraph numbers 0050 to 0090 and paragraph numbers 0289 to 0295 of JP-A-2010-164965, such as Megafac RS-101, RS-102 and RS-718K manufactured by DIC Corporation. , RS-72-K and the like. Compounds described in paragraphs 0015 to 0158 of JP-A-2015-117327 can also be used as the fluorine-based surfactant.

The content of the surfactant in the total solid content of the photosensitive composition is preferably 0.001% by mass to 5.0% by mass, more preferably 0.005% by mass to 3.0% by mass. Only one type of surfactant may be used, or two or more types may be used. When two or more types are used, the total amount thereof is preferably within the above range.

<<Ultraviolet absorber>>
In the present invention, the photosensitive composition can contain an ultraviolet absorber. A conjugated diene compound, an aminodiene compound, a salicylate compound, a benzophenone compound, a benzotriazole compound, an acrylonitrile compound, a hydroxyphenyltriazine compound, an indole compound, a triazine compound, or the like can be used as the ultraviolet absorber. For details of these, paragraph numbers 0052 to 0072 of JP-A-2012-208374, paragraph numbers 0317-0334 of JP-A-2013-068814, and paragraph numbers 0061-0080 of JP-A-2016-162946 are described. The contents of which can be referred to are incorporated herein. Specific examples of the ultraviolet absorber include compounds having the following structures. Examples of commercially available UV absorbers include UV-503 (manufactured by Daito Kagaku Co., Ltd.). Moreover, as a benzotriazole compound, the MYUA series made from Miyoshi oil and fats (Chemical Daily, February 1, 2016) is mentioned.

The content of the ultraviolet absorber in the total solid content of the photosensitive composition is preferably 0.01 to 10% by mass, more preferably 0.01 to 5% by mass. In the present invention, only one ultraviolet absorber may be used, or two or more ultraviolet absorbers may be used. When two or more are used, the total amount thereof is preferably within the above range.

<<Solvent>>
In the present invention, the photosensitive composition can contain a solvent. Solvents that can be used include organic solvents. The solvent is basically not particularly limited as long as it satisfies the solubility of each component and the coatability of the photosensitive composition. Organic solvents include ester-based solvents, ketone-based solvents, alcohol-based solvents, amide-based solvents, ether-based solvents, and hydrocarbon-based solvents. For these details, reference can be made to paragraph 0223 of WO2015/166779, the content of which is incorporated herein. Ester-based solvents substituted with cyclic alkyl groups and ketone-based solvents substituted with cyclic alkyl groups can also be preferably used. Specific examples of organic solvents include polyethylene glycol monomethyl ether, dichloromethane, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2 - heptanone, cyclohexanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether (PGME), propylene glycol monomethyl ether acetate (PGMEA), 3-methoxy-N,N-dimethylpropanamide , 3-butoxy-N,N-dimethylpropanamide and the like. However, aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.) as solvents may be better reduced for environmental reasons (e.g., 50 mass ppm (parts per million) or less, 10 mass ppm or less, or 1 mass ppm or less).

The content of the solvent in the photosensitive composition is preferably 10 to 95% by mass, more preferably 20 to 90% by mass, even more preferably 30 to 90% by mass.

<<Other Ingredients>>
In the present invention, the photosensitive composition optionally contains a polymerization inhibitor, a sensitizer, a curing accelerator, a filler, a thermosetting accelerator, a plasticizer and other auxiliary agents (e.g., conductive particles, fillers, agent, antifoaming agent, flame retardant, leveling agent, release accelerator, fragrance, surface tension modifier, chain transfer agent, etc.). Properties such as film physical properties can be adjusted by appropriately containing these components. These components are, for example, described in JP 2012-003225, paragraph number 0183 and later (corresponding US Patent Application Publication No. 2013/0034812, paragraph number 0237), JP 2008-250074 paragraph The descriptions of numbers 0101 to 0104, 0107 to 0109, etc. can be referred to, and the contents thereof are incorporated herein. Moreover, in this invention, the photosensitive composition may contain a latent antioxidant as needed. The latent antioxidant is a compound in which the site functioning as an antioxidant is protected with a protective group, and is heated at 100 to 250°C, or heated at 80 to 200°C in the presence of an acid/base catalyst. A compound that functions as an antioxidant by removing the protective group by the reaction is exemplified. Examples of latent antioxidants include compounds described in International Publication No. 2014/021023, International Publication No. 2017/030005, and JP-A-2017-008219. Commercially available products include ADEKA Arkles GPA-5001 (manufactured by ADEKA Co., Ltd.).

Moreover, in the present invention, the photosensitive composition may contain a metal oxide in order to adjust the refractive index of the resulting film. Examples of metal oxides include TiO ₂ , ZrO ₂ , Al ₂ O ₃ and SiO ₂ . The primary particle size of the metal oxide is preferably 1 to 100 nm, more preferably 3 to 70 nm, most preferably 5 to 50 nm. The metal oxide may have a core-shell structure, in which case the core may be hollow.

In the present invention, the photosensitive composition preferably contains 100 ppm or less, more preferably 50 ppm or less, and 10 ppm or less of free metal that is not bound or coordinated with a pigment or the like. It is more preferable, and it is particularly preferable that it does not contain substantially. According to this aspect, stabilization of pigment dispersibility (prevention of aggregation), improvement of spectral characteristics due to improvement of dispersibility, stabilization of curable components, suppression of conductivity fluctuations due to elution of metal atoms and metal ions, Display characteristics can be improved. In addition, JP-A-2012-153796, JP-A-2000-345085, JP-A-2005-200560, JP-A-08-043620, JP-A-2004-145078, JP-A-2014-119487, Described in JP 2010-083997, JP 2017-090930, JP 2018-025612, JP 2018-025797, JP 2017-155228, JP 2018-036521, etc. You can also get the effect of Examples of the free metal types include Na, K, Ca, Sc, Ti, Mn, Cu, Zn, Fe, Cr, Co, Mg, Al, Sn, Zr, Ga, Ge, Ag, Au, Pt, Cs, Ni, Cd, Pb, Bi and the like are included. In addition, the composition preferably has a free halogen content of 100 ppm or less, more preferably 50 ppm or less, even more preferably 10 ppm or less, and substantially It is particularly preferred not to contain Methods for reducing free metals and halogens in the composition include methods such as washing with ion-exchanged water, filtration, ultrafiltration, and purification with an ion-exchange resin.

Moreover, it is preferable that the photosensitive composition does not substantially contain a terephthalic acid ester.

<<Container>>
The storage container for the photosensitive composition is not particularly limited, and known storage containers can be used. In addition, as a storage container, a multi-layer bottle whose inner wall is composed of 6 types and 6 layers of resin or a 7-layer structure of 6 types of resin is used for the purpose of suppressing the contamination of raw materials and photosensitive compositions with impurities. It is also preferred to use bottles. Examples of such a container include the container described in JP-A-2015-123351. In addition, it is also preferable to make the inner wall of the storage container made of glass, stainless steel, or the like for the purpose of preventing metal elution from the inner wall of the container, enhancing the storage stability of the composition, and suppressing deterioration of components.

<Method of Forming Pixel>
Pixels in the structure of the present invention can be formed by photolithography using a photosensitive composition containing the pixel components described above. Pattern formation by photolithography includes the steps of forming a photosensitive composition layer on a support using a photosensitive composition, patternwise exposing the photosensitive composition layer, and exposing the photosensitive composition layer. forming a pattern (pixels) by developing and removing the unexposed portions. If necessary, a step of baking the photosensitive composition layer (pre-baking step) and a step of baking the developed pattern (pixels) (post-baking step) may be provided.

From the viewpoint of flatness of the underlying layer of the photosensitive composition layer, it is also preferable to form an undercoat layer on the support before forming the photosensitive composition layer. Details of the primer layer are described in WO2018/062130, the contents of which are incorporated herein.

<<Method for preparing composition>>
A photosensitive composition for forming the pixels in the structure of the present invention can be prepared by mixing the aforementioned components. In preparing the photosensitive composition, all the components may be dissolved and/or dispersed in a solvent at the same time to prepare the photosensitive composition. They may be prepared as liquids and mixed at the time of use (at the time of application) to prepare a photosensitive composition.

Moreover, it is preferable that a process of dispersing a pigment is included in the preparation of the photosensitive composition. In the process of dispersing pigments, mechanical forces used for dispersing pigments include compression, squeezing, impact, shearing, cavitation, and the like. Specific examples of these processes include bead mills, sand mills, roll mills, ball mills, paint shakers, microfluidizers, high speed impellers, sand grinders, flow jet mixers, high pressure wet atomization, ultrasonic dispersion, and the like. In pulverizing the pigment in a sand mill (bead mill), it is preferable to use beads with a small diameter or to increase the filling rate of the beads so as to increase the pulverization efficiency. Moreover, it is preferable to remove coarse particles by filtration, centrifugation, or the like after the pulverization treatment. In addition, the process and dispersing machine for dispersing pigments are described in ``Dispersion Technology Encyclopedia, Information Organization Co., Ltd., July 15, 2005'' and ``Dispersion Technology Centered on Suspension (Solid/Liquid Dispersion System) and Industrial Applications'' The process and disperser described in paragraph number 0022 of Japanese Patent Application Laid-Open No. 2015-157893 can be suitably used. In the process of dispersing the pigment, the particles may be made finer in the salt milling step. Materials, equipment, processing conditions, etc. used in the salt milling process can be referred to, for example, Japanese Patent Application Laid-Open Nos. 2015-194521 and 2012-046629.

In preparing the photosensitive composition, it is preferable to filter the photosensitive composition with a filter for the purpose of removing foreign substances and reducing defects. As the filter, any filter that has been conventionally used for filtration or the like can be used without particular limitation. For example, fluorine resins such as polytetrafluoroethylene (PTFE), polyamide resins such as nylon (eg nylon-6, nylon-6,6), polyethylene, polyolefin resins such as polypropylene (PP) (high density, ultra high molecular weight including polyolefin resin). Among these materials, polypropylene (including high density polypropylene) and nylon are preferred.

The pore size of the filter is preferably 0.01-7.0 μm, more preferably 0.01-3.0 μm, even more preferably 0.05-0.5 μm. If the pore diameter of the filter is within the above range, fine foreign matter can be removed more reliably. For the pore size value of the filter, reference can be made to the filter manufacturer's nominal value. Various filters provided by Nippon Pall Co., Ltd. (DFA4201NIEY, etc.), Advantech Toyo Co., Ltd., Nihon Entegris Co., Ltd. (former Japan Microlith Co., Ltd.), Kitz Micro Filter Co., Ltd., and the like can be used as filters.

It is also preferable to use a fibrous filter medium as the filter. Examples of fibrous filter media include polypropylene fibers, nylon fibers, and glass fibers. Commercially available products include SBP type series (SBP008, etc.), TPR type series (TPR002, TPR005, etc.), and SHPX type series (SHPX003, etc.) manufactured by Roki Techno.

When using filters, different filters (eg, a first filter and a second filter, etc.) may be combined. At that time, filtration with each filter may be performed only once, or may be performed twice or more. Also, filters with different pore sizes within the range described above may be combined. Further, the filtration with the first filter may be performed only on the dispersion liquid, and after mixing other components, the filtration with the second filter may be performed.
<<Step of Forming Photosensitive Composition Layer>>
In the step of forming a photosensitive composition layer, a photosensitive composition is used to form a photosensitive composition layer on the support. The support is not particularly limited and can be appropriately selected depending on the application. Examples thereof include glass substrates and silicon substrates, and silicon substrates are preferred. Also, a charge-coupled device (CCD), a complementary metal oxide semiconductor (CMOS), a transparent conductive film, or the like may be formed on the silicon substrate. In some cases, the silicon substrate is formed with a black matrix that isolates each pixel. In addition, the silicon substrate may be provided with an undercoat layer for improving adhesion to the upper layer, preventing diffusion of substances, or planarizing the substrate surface.

A known method can be used as a method for applying the photosensitive composition. For example, drop method (drop cast); slit coating method; spray method; roll coating method; spin coating method (spin coating); methods described in publications); inkjet (e.g., on-demand method, piezo method, thermal method), discharge system printing such as nozzle jet, flexo printing, screen printing, gravure printing, reverse offset printing, metal mask printing method, etc. Examples include various printing methods; transfer methods using molds and the like; nanoimprinting methods and the like. The application method for inkjet is not particularly limited. 133 page), and methods described in JP-A-2003-262716, JP-A-2003-185831, JP-A-2003-261827, JP-A-2012-126830, JP-A-2006-169325, etc. mentioned. In addition, regarding the method of applying the photosensitive composition, the descriptions in WO2017/030174 and WO2017/018419 can be referred to, and the contents thereof are incorporated herein.

The photosensitive composition layer formed on the support may be dried (pre-baked). Pre-baking may not be performed when the film is manufactured by a low-temperature process. When pre-baking is performed, the pre-baking temperature is preferably 150° C. or lower, more preferably 120° C. or lower, and even more preferably 110° C. or lower. The lower limit can be, for example, 50° C. or higher, and can also be 80° C. or higher. The pre-bake time is preferably 10 to 300 seconds, more preferably 40 to 250 seconds, even more preferably 80 to 220 seconds. Pre-baking can be performed using a hot plate, an oven, or the like.

<<Exposure process>>
Next, the photosensitive composition layer is patternwise exposed (exposure step). For example, the photosensitive composition layer can be exposed in a pattern by exposing through a mask having a predetermined mask pattern using a stepper exposure machine, a scanner exposure machine, or the like. Thereby, the exposed portion can be cured.

Radiation (light) that can be used for exposure includes g-line, i-line, and the like. Light with a wavelength of 300 nm or less (preferably light with a wavelength of 180 to 300 nm) can also be used. Light having a wavelength of 300 nm or less includes KrF rays (wavelength: 248 nm), ArF rays (wavelength: 193 nm), etc., and KrF rays (wavelength: 248 nm) are preferred. A long-wave light source of 300 nm or more can also be used.

Further, the exposure may be performed by continuously irradiating the light, or by pulsing the light (pulse exposure). Note that the pulse exposure is an exposure method in which light irradiation and pause are repeated in a cycle of short time (for example, less than millisecond level). In the case of pulse exposure, the pulse width is preferably 100 nanoseconds (ns) or less, more preferably 50 nanoseconds or less, and even more preferably 30 nanoseconds or less. The lower limit of the pulse width is not particularly limited, but may be 1 femtosecond (fs) or more, and may be 10 femtoseconds or more. The frequency is preferably 1 kHz or higher, more preferably 2 kHz or higher, and even more preferably 4 kHz or higher. The upper limit of the frequency is preferably 50 kHz or less, more preferably 20 kHz or less, and even more preferably 10 kHz or less. The maximum instantaneous illuminance is preferably 50000000 W/ ^m2 or more, more preferably 100000000 W/ ^m2 or more, and even more preferably 200000000 W/ ^m2 or more. The upper limit of the maximum instantaneous illuminance is preferably 1000000000 W/m ² or less, more preferably 800000000 W/m ² or less, and even more preferably 500000000 W/m ² or less. It should be noted that the pulse width is the time during which light is applied in the pulse cycle. Also, frequency is the number of pulse cycles per second. Further, the maximum instantaneous illuminance is the average illuminance within the time during which the light is irradiated in the pulse cycle. Further, the pulse cycle is a cycle in which light irradiation and rest in pulse exposure are set as one cycle.

The irradiation amount (exposure amount) is, for example, preferably 0.03 to 2.5 J/cm ² , more preferably 0.05 to 1.0 J/cm ² . The oxygen concentration at the time of exposure can be selected as appropriate, and in addition to exposure in the atmosphere, for example, in a low oxygen atmosphere with an oxygen concentration of 19% by volume or less (e.g., 15% by volume, 5% by volume, or substantially oxygen-free) or in a high-oxygen atmosphere with an oxygen concentration exceeding 21% by volume (for example, 22% by volume, 30% by volume, or 50% by volume). In addition, the exposure illuminance can be set as appropriate, and is usually selected from the range of 1000 W/m ² to 100000 W/m ² (eg, 5000 W/m ² , 15000 W/m ² or 35000 W/m ² ). can be done. Oxygen concentration and exposure illuminance may be appropriately combined. For example, illuminance of 10000 W/m ² at oxygen concentration of 10% by volume and illuminance of 20000 W/m ² at oxygen concentration of 35% by volume.

<<development process>>
Next, the unexposed portion of the photosensitive composition layer is removed by development to form a pattern (pixels). The development removal of the unexposed portion of the photosensitive composition layer can be performed using a developer. As a result, the unexposed portion of the photosensitive composition layer in the exposure step is eluted into the developer, leaving only the photocured portion. As the developer, an organic alkaline developer that does not damage the underlying elements and circuits is desirable. The temperature of the developer is preferably 20 to 30° C., for example. The development time is preferably 20 to 180 seconds. Moreover, in order to improve the residue removability, the step of shaking off the developer every 60 seconds and then supplying new developer may be repeated several times.

The developer is preferably an alkaline aqueous solution (alkali developer) obtained by diluting an alkaline agent with pure water. Examples of alkaline agents include ammonia, ethylamine, diethylamine, dimethylethanolamine, diglycolamine, diethanolamine, hydroxylamine, ethylenediamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, and tetrabutylammonium hydroxide. , ethyltrimethylammonium hydroxide, benzyltrimethylammonium hydroxide, dimethylbis(2-hydroxyethyl)ammonium hydroxide, choline, pyrrole, piperidine, 1,8-diazabicyclo[5.4.0]-7-undecene. Alkaline compounds and inorganic alkaline compounds such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, sodium silicate and sodium metasilicate. A compound having a large molecular weight is preferable for the alkaline agent from the standpoint of environment and safety. The concentration of the alkaline agent in the alkaline aqueous solution is preferably 0.001 to 10% by mass, more preferably 0.01 to 1% by mass. Moreover, the developer may further contain a surfactant. Examples of surfactants include the surfactants described above, and nonionic surfactants are preferred. From the viewpoint of transportation and storage convenience, the developer may be produced once as a concentrated solution and then diluted to the required concentration when used. Although the dilution ratio is not particularly limited, it can be set, for example, in the range of 1.5 to 100 times. It is also preferable to wash (rinse) with pure water after development. Rinsing is preferably carried out by supplying a rinse solution to the photosensitive composition layer after development while rotating the support on which the photosensitive composition layer after development is formed. It is also preferable to move the nozzle for discharging the rinsing liquid from the central portion of the support to the peripheral portion of the support. At this time, when moving the nozzle from the center of the support to the periphery, the moving speed of the nozzle may be gradually decreased. By performing rinsing in this manner, in-plane variations in rinsing can be suppressed. A similar effect can be obtained by gradually decreasing the rotation speed of the support while moving the nozzle from the center of the support to the periphery.

After development, it is preferable to carry out additional exposure treatment and heat treatment (post-baking) after drying. Additional exposure treatment and post-baking are heat treatments after development for complete curing, and the heating temperature is, for example, preferably 100 to 240.degree. Post-baking can be performed continuously or batchwise using a heating means such as a hot plate, a convection oven (hot air circulating dryer), or a high-frequency heater so that the developed film satisfies the above conditions. .

When the additional exposure process is performed, the light used for exposure preferably has a wavelength of 400 nm or less. Further, the additional exposure process may be performed by the method described in Korean Patent Publication No. 1020170122130.

One pixel is formed through the above steps. When forming the next pixel, the above coating, exposure and development are repeated.

EXAMPLES The present invention will be described more specifically with reference to examples below. The materials, usage amounts, ratios, processing details, processing procedures, etc. shown in the following examples can be changed as appropriate without departing from the gist of the present invention. Accordingly, the scope of the present invention is not limited to the specific examples shown below. "Parts" and "%" are based on mass unless otherwise specified. The weight average molecular weight and number average molecular weight are polystyrene equivalent values measured by the GPC method as described above.

<Preparation of Undercoat Layer Composition>
A composition for forming an undercoat layer was prepared by mixing the following raw materials.
- The following resin A (54% by mass PGME solution) 0.7 parts by mass - Surfactant A (0.2% by mass PGMEA solution) 0.8 parts by mass The details of the raw materials are as follows.
- PGMEA 98.5 parts by mass - Resin A: Cychromer P (ACA) 230AA (manufactured by Daicel Corporation, acid value = 30 mgKOH/g, Mw = 15000)
-Surfactant A: the following mixture (Mw = 14000, % indicating the proportion of repeating units is mass%)

<Preparation of photosensitive composition>
Various compositions shown in Tables 2 to 10 were prepared using the following raw materials and according to the procedures and formulations described below.

<<raw materials>>
<<<coloring materials: pigments, dyes>>>
・PR122: C.I. I. Pigment Red 122
・PR177: C.I. I. Pigment Red 177
・PR254: C.I. I. Pigment Red 254
・PR272: C.I. I. Pigment Red 272
・PG7: C.I. I. Pigment Green 7
- PG36: C.I. I. Pigment Green 36
- PG58: C.I. I. Pigment Green 58
- PB15:6: C.I. I. Pigment Blue 15:6
- PO71: C.I. I. Pigment Orange 71
・PV23: C.I. I. Pigment Violet 23
- PY139: C.I. I. Pigment Yellow 139
- PY150: C.I. I. Pigment Yellow 150
- PY185: C.I. I. Pigment Yellow 185
・ TiO ₂ : TTO-51 (C) (manufactured by Ishihara Sangyo Co., Ltd.)

- Al phthalocyanine: a compound having the following structure

・Xanthene: a compound having the following structure

- IR dye 1: a compound having the following structure

- IR dye 2: a compound having the following structure

- IR dye 3: a compound having the following structure

・Perylene black: a compound having the following structure

・Bisbenzofuranone: a compound having the following structure

<<<Pigment Derivatives of Examples>>>
The maximum molar absorption coefficient (εmax) in the wavelength region of 400 to 700 nm for each pigment derivative below was measured as follows. 20 mg of each compound was dissolved in 200 mL of methanol, and methanol was added to 2 mL of this solution to make 50 mL. The absorbance of this solution was measured using a Cary 5000 UV-Vis-NIR spectrophotometer (manufactured by Agilent Technologies) in the wavelength range of 200 to 800 nm, and the maximum measured value was normalized by the molar concentration to give εmax. was calculated.
・Pigment derivative 1: Compound C-1 in Table 1 above (εmax: 100 L mol ⁻¹ cm ⁻¹ or less, basic)
・Pigment derivative 2: Compound C-20 in Table 1 above (εmax: greater than 1000 L mol ⁻¹ cm ⁻¹ and 3000 L mol ⁻¹ cm ⁻¹ or less, basic)
・Pigment derivative 3: Compound C-36 (εmax: 100 L mol ⁻¹ cm ⁻¹ or less, basic) in Table 1 above
Pigment derivative 4: Compound C-51 in Table 1 above (εmax: greater than 100 L mol ^-1 cm ^-1 and 1000 L mol ^-1 cm ^-1 or less, basic)
・Pigment derivative 5: Compound C-87 in Table 1 above (εmax: 100 L mol ⁻¹ cm ⁻¹ or less, basic)
・Pigment derivative 6: a compound having the following structure (εmax: 100 L mol ⁻¹ cm ⁻¹ or less, acidic)
・Pigment derivative 7: a compound having the following structure (εmax: 100 L mol ⁻¹ cm ⁻¹ or less, acidic)
・Pigment derivative 8: a compound having the following structure (εmax: 100 L mol ⁻¹ cm ⁻¹ or less, acidic)
・ Pigment derivative 9: a compound having the following structure (εmax: 100 L mol ⁻¹ cm ⁻¹ or less, acidic)
・Pigment derivative 10: a compound having the following structure (εmax: 100 L mol ⁻¹ cm ⁻¹ or less, acidic)
- Pigment derivative A: a compound having the following structure (yellow, basic)

<<<Pigment Derivative of Comparative Example>>>
For each of the following pigment derivatives, εmax was measured in the same manner as the pigment derivatives of the above examples. All pigment derivatives were colored and had εmax greater than 3000 L·mol ⁻¹ ·cm ⁻¹ .
- Comparative derivative 1: a compound having the following structure (yellow, basic)
- Comparative derivative 2: a compound having the following structure (red, basic)
- Comparative derivative 3: a compound having the following structure (yellow, basic)
- Comparative derivative 4: a compound having the following structure (blue, basic)
- Comparative derivative 5: a compound having the following structure (purple, basic)

<<<Dispersant>>>
- Dispersant 1: A compound (acidic) having the following structure. The numerical value attached to the main chain is the molar ratio of the repeating units, and the numerical value attached to the side chain is the number of repeating units.

Dispersant 2: a compound having the following structure (the numerical value attached to the main chain is the molar ratio of the repeating unit, and the numerical value attached to the side chain is the number of repeating units. Mw: 20000, C = C valence : 0.4 mmol/g, acid value: 70 mgKOH/g)

Dispersant 3: a compound having the following structure (k: l: m: n = 25: 40: 5: 30 (polymerization molar ratio), p = 60, q = 60, weight average molecular weight 10,000, basic)

<<< Resin >>>
- Resin 1: A compound having the following structure. Numerical values attached to the main chain represent molar ratios of repeating units.

- Resin 2: A compound having the following structure. The numerical value attached to the main chain represents the molar ratio of repeating units.

<<<polymerizable monomer>>>
-Polymerizable monomer 1: a compound having the following structure

- Polymerizable monomer 2: a compound having the following structure

-Polymerizable monomer 3: a mixture of two compounds each having the following structure (molar ratio of left side and right side: 7:3)

<<<photoinitiator>>>
- Photoinitiator 1: a compound having the following structure

- Photopolymerization initiator 2: a compound having the following structure

- Photoinitiator 3: a compound having the following structure

<<< Surfactant >>>
Surfactant 1: a mixture of two compounds each having the following structure (Mw = 14000, described in mass%)

<<<Ultraviolet Absorber>>>
- Ultraviolet absorber 1: a compound having the following structure

<<<epoxy resin>>>
Epoxy resin 1: EHPE3150 (manufactured by Daicel Corporation, 1,2-epoxy-4-(2-oxiranyl)cyclohexane adduct of 2,2′-bis(hydroxymethyl)-1-butanol)

<<<Silane coupling agent>>>
- Silane coupling agent 1: a compound having the following structure (Mw = 14000, described in mass%)

<<<Solvent>>>
・PGMEA: Propylene glycol monomethyl ether acetate ・EEP: Ethyl 3-ethoxypropionate

<<Green Composition G1>>
(Preparation of Pigment Dispersion G1)
A mixed liquid obtained by mixing the following raw materials was mixed and dispersed for 3 hours using a bead mill (zirconia beads with a diameter of 0.1 mm) to prepare a pigment dispersion liquid. Thereafter, using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) equipped with a decompression mechanism, dispersion treatment was carried out under conditions of a pressure of 2000 kg/cm ³ and a flow rate of 500 g/min. This dispersing treatment was repeated up to 10 times to obtain a pigment dispersion liquid G1.
Ingredients for the dispersion:
PG58 8.5 parts by mass PY185 2.9 parts by mass Pigment derivative 1 1.6 parts by mass Dispersant 1 4.7 parts by mass PGMEA 82.3 parts by mass (preparation of green composition G1)
Subsequently, after stirring a mixed liquid obtained by mixing the following raw materials, the mixture was filtered through a nylon filter (manufactured by Nippon Pall Co., Ltd.) having a pore size of 0.45 μm to obtain a green composition G1.
Ingredients of the composition:
Pigment dispersion liquid G1 69.0 parts by mass Resin 1 (40% by mass PGMEA solution) 1.2 parts by mass Polymerizable monomer 1 1.1 parts by mass Photopolymerization initiator 1 0.5 parts by mass Surfactant 1 (1% by mass PGMEA solution) 4.2 parts by mass ・Ultraviolet absorbent 1 0.5 parts by mass ・Epoxy resin 1 0.2 parts by mass ・PGMEA 23.3 parts by mass

<<Green Composition G4>>
(Preparation of Pigment Dispersion G4)
Except for changing the type of green pigment to PG36, the same components and ingredients as those of the pigment dispersion liquid G1 were used. Then, a pigment dispersion liquid G4 was obtained by the same procedure as the method for producing the pigment dispersion liquid G1.
(Preparation of green composition G4)
Subsequently, after stirring a mixed liquid obtained by mixing the following raw materials, the mixture was filtered through a nylon filter (manufactured by Nippon Pall Co., Ltd.) having a pore size of 0.45 μm to obtain a green composition G4.
Ingredients of the composition:
Pigment dispersion liquid G4 46.0 parts by mass Resin 1 (40% by mass PGMEA solution) 8.6 parts by mass Polymerizable monomer 1 1.7 parts by mass Photopolymerization initiator 1 0.8 parts by mass Surfactant 1 (1% by mass PGMEA solution) 4.2 parts by mass ・Ultraviolet absorbent 1 0.8 parts by mass ・Epoxy resin 1 0.2 parts by mass ・PGMEA 37.7 parts by mass

<<Green Composition G5>>
(Preparation of Pigment Dispersion G5)
Pigment Dispersion G5 was obtained by using the same raw material as the raw material of Pigment Dispersion G4 and following the same procedure as the method for producing Pigment Dispersion G4.
(Preparation of green composition G5)
Subsequently, after stirring a mixed liquid obtained by mixing the following raw materials, the mixture was filtered through a nylon filter (manufactured by Nippon Pall Co., Ltd.) having a pore size of 0.45 μm to obtain a green composition G5.
Ingredients of the composition:
Pigment dispersion liquid G5 28.8 parts by mass Resin 1 (40% by mass PGMEA solution) 14.0 parts by mass Polymerizable monomer 1 2.1 parts by mass Photopolymerization initiator 1 1.0 parts by mass Surfactant 1 (1% by mass PGMEA solution) 4.2 parts by mass ・Ultraviolet absorbent 1 1.1 parts by mass ・Epoxy resin 1 0.2 parts by mass ・PGMEA 48.6 parts by mass

<<Green Composition G20>>
(Preparation of Pigment Dispersion G20)
Pigment Dispersion G20 was obtained in the same manner as for Pigment Dispersion G1, except that the raw materials for the dispersion were changed to the following raw materials.
Ingredients for the dispersion:
PG58 8.1 parts by mass PY185 1.5 parts by mass PY150 1.8 parts by mass Pigment derivative 1 1.6 parts by mass Dispersant 1 4.7 parts by mass PGMEA 82.3 parts by mass (green composition Production of G20)
A green composition G20 was obtained in the same manner as the green composition G1, except that the pigment dispersion G1 was changed to the pigment dispersion G20.

<<Green Composition G21>>
(Preparation of Pigment Dispersion G21)
Pigment Dispersion G21 was obtained in the same manner as for Pigment Dispersion G1, except that the raw materials for the dispersion were changed to the following raw materials.
Ingredients for the dispersion:
PG36 8.0 parts by mass PY185 1.5 parts by mass PY150 1.9 parts by mass Pigment derivative 1 1.6 parts by mass Dispersant 1 4.7 parts by mass PGMEA 82.3 parts by mass (green composition Production of G21)
Subsequently, after stirring a mixed liquid obtained by mixing the following raw materials, the mixture was filtered through a nylon filter (manufactured by Nippon Pall Co., Ltd.) having a pore size of 0.45 μm to obtain a green composition G21.
Ingredients of the composition:
Pigment dispersion liquid G21 69.0 parts by mass Resin 1 (40% by mass PGMEA solution) 1.2 parts by mass Polymerizable monomer 1 1.1 parts by mass Photopolymerization initiator 3 0.5 parts by mass Surfactant 1 (1% by mass PGMEA solution) 4.2 parts by mass ・Ultraviolet absorbent 1 0.5 parts by mass ・Epoxy resin 1 0.2 parts by mass ・PGMEA 23.3 parts by mass

<<Green Composition G22>>
(Preparation of Pigment Dispersion G22)
Pigment Dispersion G22 was obtained in the same manner as for Pigment Dispersion G21, except that the raw materials for the dispersion were changed to the following raw materials.
Ingredients for the dispersion:
PG36 8.5 parts by mass PY185 2.9 parts by mass Pigment derivative 1 0.7 parts by mass Pigment derivative A 0.9 parts by mass Dispersant 1 4.7 parts by mass PGMEA 82.3 parts by mass (green Preparation of composition G22)
A green composition G22 was obtained in the same manner as the green composition G21, except that the pigment dispersion G21 was changed to the pigment dispersion G22.

<<Green Composition G23>>
(Preparation of Pigment Dispersion G23)
Pigment Dispersion G23 was obtained in the same manner as for Pigment Dispersion G22, except that the content of the pigment derivative, which accounts for 1.6 parts by mass of the pigment dispersion, was changed as follows.
Pigment derivative 1 1.0 parts by mass Pigment derivative A 0.6 parts by mass (preparation of green composition G23)
A green composition G23 was obtained in the same manner as the green composition G21, except that the pigment dispersion G21 was changed to the pigment dispersion G23.

<<Green Composition G24>>
(Preparation of Pigment Dispersion G24)
Pigment Dispersion G24 was obtained in the same manner as Pigment Dispersion G21, except that the raw materials for the dispersion were changed to the following raw materials.
Ingredients for the dispersion:
PG36 8.0 parts by mass PY185 0.9 parts by mass PY150 2.5 parts by mass Pigment derivative 1 1.0 parts by mass Pigment derivative A 0.6 parts by mass Dispersant 1 4.7 parts by mass PGMEA 82.3 parts by mass (preparation of green composition G24)
A green composition G24 was obtained in the same manner as the green composition G21, except that the pigment dispersion G21 was changed to the pigment dispersion G24.

<<Green Compositions G2 to G3, G6 to G19 and Compositions of Comparative Examples>>
As shown in Table 2, green compositions G2 to G3, G6 to G19 and green compositions G2 to G3, G6 to G19 and Comparative green compositions (comparative compositions G1 to G3, G6 to G14) were obtained. As for the coloring materials, the corresponding components were changed for each column of "coloring material 1", "coloring material 2" and "coloring material 3" in the table. The same is true for other compositions.

Further, as shown in Table 2, a comparative composition G4 was obtained using the same components, formulations and procedures as in the case of the green composition G4, except that the type of pigment derivative was changed. Further, as shown in Table 2, Comparative Composition G5 was obtained using the same components, blending and procedures as in Green Composition G5, except that the type of pigment derivative was changed.

Table 2 shows the characteristic components of each of the above green compositions. In addition, in Table 2, descriptions of surfactants, ultraviolet absorbers, epoxy resins, and PGMEA are omitted because they are common components in all compositions. The table also shows the total content of pigments and pigment derivatives relative to total solids (pigments concentration) for each composition. Each numerical value in parentheses in the item of the pigment derivative represents the proportion (parts by mass) of the pigment derivative 1 or the pigment derivative A in the dispersion liquid.

<<Red Composition R1>>
(Preparation of pigment dispersion liquid R1)
A mixed liquid obtained by mixing the following raw materials was mixed and dispersed for 3 hours using a bead mill (zirconia beads with a diameter of 0.1 mm) to prepare a pigment dispersion liquid. Thereafter, using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) equipped with a decompression mechanism, dispersion treatment was carried out under conditions of a pressure of 2000 kg/cm ³ and a flow rate of 500 g/min. This dispersion treatment was repeated up to 10 times to obtain a pigment dispersion liquid R1.
Ingredients for the dispersion:
・PR254 10.5 parts by mass ・PY139 0.9 parts by mass ・Pigment derivative 1 1.6 parts by mass ・Dispersant 1 4.7 parts by mass ・PGMEA 82.3 parts by mass (preparation of red composition R1)
Subsequently, after stirring a mixed liquid obtained by mixing the following raw materials, the mixture was filtered through a nylon filter (manufactured by Nippon Pall Co., Ltd.) having a pore size of 0.45 μm to obtain a red composition R1.
Ingredients of the composition:
Pigment dispersion liquid R1 58.9 parts by mass Resin 1 (40% by mass PGMEA solution) 2.0 parts by mass Polymerizable monomer 1 0.9 parts by mass Photopolymerization initiator 1 0.5 parts by mass Surfactant 1 (1% by mass PGMEA solution) 4.2 parts by mass ・Ultraviolet absorbent 1 0.1 parts by mass ・Epoxy resin 1 0.1 parts by mass ・PGMEA 33.3 parts by mass

<<Red Composition R2>>
(Preparation of pigment dispersion liquid R2)
Except for changing half of the PR254 pigment to PO71, the same components and ingredients as those of the pigment dispersion liquid R1 were used. Then, a pigment dispersion liquid R2 was obtained by the same procedure as the method for producing the pigment dispersion liquid R1.
(Preparation of red composition R2)
Subsequently, after stirring a mixed liquid obtained by mixing the following raw materials, the mixture was filtered through a nylon filter (manufactured by Nippon Pall Co., Ltd.) having a pore size of 0.45 μm to obtain a red composition R2.
Ingredients of the composition:
Pigment dispersion liquid R2 58.9 parts by mass Resin 2 (40% by mass PGMEA solution) 2.0 parts by mass Polymerizable monomer 2 0.9 parts by mass Photopolymerization initiator 3 0.5 parts by mass Surfactant 1 (1% by mass PGMEA solution) 4.2 parts by mass ・Ultraviolet absorbent 1 0.1 parts by mass ・Epoxy resin 1 0.1 parts by mass ・PGMEA 33.3 parts by mass

<<Red Composition R4>>
(Preparation of Pigment Dispersion R4)
A pigment dispersion liquid R4 was obtained by using the same raw material as the raw material of the pigment dispersion liquid R1 and following the same procedure as the production method of the pigment dispersion liquid R1.
(Preparation of red composition R4)
Subsequently, after stirring a mixed liquid obtained by mixing the following raw materials, the mixture was filtered through a nylon filter (manufactured by Nippon Pall Co., Ltd.) having a pore size of 0.45 μm to obtain a red composition R4.
Ingredients of the composition:
Pigment dispersion liquid R4 39.3 parts by mass Resin 1 (40% by mass PGMEA solution) 8.5 parts by mass Polymerizable monomer 1 1.3 parts by mass Photopolymerization initiator 1 0.7 parts by mass Surfactant 1 (1% by mass PGMEA solution) 4.2 parts by mass UV absorber 1 0.4 parts by mass Epoxy resin 1 0.1 parts by mass PGMEA 45.5 parts by mass

<<Red Composition R5>>
(Preparation of pigment dispersion liquid R5)
A pigment dispersion liquid R5 was obtained by using the same raw material as the raw material of the pigment dispersion liquid R1 and following the same procedure as the method for producing the pigment dispersion liquid R1.
(Preparation of red composition R5)
Subsequently, after stirring a mixed liquid obtained by mixing the following raw materials, the mixture was filtered through a nylon filter (manufactured by Nippon Pall Co., Ltd.) having a pore size of 0.45 μm to obtain a red composition R5.
Ingredients of the composition:
Pigment dispersion liquid R5 24.5 parts by mass Resin 1 (40% by mass PGMEA solution) 13.2 parts by mass Polymerizable monomer 1 1.6 parts by mass Photopolymerization initiator 1 0.8 parts by mass Surfactant 1 (1% by mass PGMEA solution) 4.2 parts by mass ・Ultraviolet absorbent 1 0.6 parts by mass ・Epoxy resin 1 0.1 parts by mass ・PGMEA 55.0 parts by mass

<<Red Compositions R3, R6 to R19 and Compositions of Comparative Examples>>
As shown in Table 3, red compositions R3, R6 to R19 and comparative examples were prepared using the same components, formulations, and procedures as for red composition R1, except that the types of components of the dispersion and composition were changed. of red compositions (comparative compositions R1 to R3, R6 to R14) were obtained.

Further, as shown in Table 3, Comparative Composition R4 was obtained using the same components, formulations and procedures as in Red Composition R4, except that the type of pigment derivative was changed. Further, as shown in Table 3, Comparative Composition R5 was obtained using the same components, formulations and procedures as in Red Composition R5, except that the type of pigment derivative was changed.

Table 3 shows the characteristic ingredients of each of the above red compositions. In addition, in Table 3, descriptions of surfactants, ultraviolet absorbers, epoxy resins, and PGMEA are omitted because they are components common to all compositions. Also shown in the table is the pigment concentration for each composition.

<<Blue Composition B1>>
(Preparation of pigment dispersion B1)
A mixed liquid obtained by mixing the following raw materials was mixed and dispersed for 3 hours using a bead mill (zirconia beads with a diameter of 0.1 mm) to prepare a pigment dispersion liquid. Thereafter, using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) equipped with a decompression mechanism, dispersion treatment was carried out under conditions of a pressure of 2000 kg/cm ³ and a flow rate of 500 g/min. This dispersing treatment was repeated up to 10 times to obtain a pigment dispersion B1.
Ingredients for the dispersion:
PB15: 6 9.6 parts by mass PV23 2.4 parts by mass Pigment derivative 1 1.0 parts by mass Dispersant 1 4.7 parts by mass PGMEA 82.3 parts by mass (preparation of blue composition B1)
Subsequently, after stirring a mixed liquid obtained by mixing the following raw materials, the mixture was filtered through a nylon filter (manufactured by Nippon Pall Co., Ltd.) having a pore size of 0.45 μm to obtain a blue composition B1.
Ingredients of the composition:
Pigment dispersion liquid B1 54.1 parts by mass Resin 1 (40% by mass PGMEA solution) 1.0 parts by mass Polymerizable monomer 1 0.9 parts by mass Photopolymerization initiator 1 0.6 parts by mass Surfactant 1 (1% by mass PGMEA solution) 4.2 parts by mass ・Ultraviolet absorbent 1 0.1 parts by mass ・Epoxy resin 1 0.1 parts by mass ・PGMEA 39.0 parts by mass

<<Blue Composition B3>>
(Preparation of Pigment Dispersion B3)
Pigment Dispersion B3 was obtained by using the same raw material as the raw material of Pigment Dispersion B1 and following the same procedure as the method for producing Pigment Dispersion B1.
(Preparation of blue composition B3)
Subsequently, after stirring a mixed liquid obtained by mixing the following raw materials, the mixture was filtered through a nylon filter (manufactured by Nippon Pall Co., Ltd.) having a pore size of 0.45 μm to obtain a blue composition B3.
Ingredients of the composition:
Pigment dispersion liquid B3 36.0 parts by mass Resin 1 (40% by mass PGMEA solution) 6.6 parts by mass Polymerizable monomer 1 1.3 parts by mass Photopolymerization initiator 1 0.9 parts by mass Surfactant 1 (1% by mass PGMEA solution) 4.2 parts by mass ・Ultraviolet absorbent 1 0.4 parts by mass ・Epoxy resin 1 0.1 parts by mass ・PGMEA 50.5 parts by mass

<<Blue Composition B4>>
(Preparation of Pigment Dispersion B4)
Pigment Dispersion B4 was obtained by using the same raw material as the raw material of Pigment Dispersion B1 and following the same procedure as the method for producing Pigment Dispersion B1.
(Preparation of blue composition B4)
Subsequently, after stirring a mixed liquid obtained by mixing the following raw materials, the mixture was filtered through a nylon filter (manufactured by Nippon Pall Co., Ltd.) having a pore size of 0.45 μm to obtain a blue composition B4.
Ingredients of the composition:
Pigment dispersion liquid B4 22.5 parts by mass Resin 1 (40% by mass PGMEA solution) 10.7 parts by mass Polymerizable monomer 1 1.6 parts by mass Photopolymerization initiator 1 1.2 parts by mass Surfactant 1 (1% by mass PGMEA solution) 4.2 parts by mass ・Ultraviolet absorbent 1 0.6 parts by mass ・Epoxy resin 1 0.1 parts by mass ・PGMEA 59.1 parts by mass

<<Blue Compositions B2, B5 to B18 and Compositions of Comparative Examples>>
As shown in Table 4, blue compositions B2, B5 to B18 and comparative examples were prepared using the same components, formulations, and procedures as for blue composition B1, except that the types of components of the dispersion and composition were changed. were obtained (comparative compositions B1 to B2, B5 to B13).

Further, as shown in Table 4, Comparative Composition B3 was obtained using the same components, formulation and procedure as in the case of Blue Composition B3, except that the type of pigment derivative was changed. Further, as shown in Table 4, Comparative Composition B4 was obtained with the same components, formulation and procedure as in the case of Blue Composition B4, except that the type of pigment derivative was changed.

Table 4 shows the characteristic components of each of the above blue compositions. In addition, in Table 4, descriptions of surfactants, ultraviolet absorbers, epoxy resins, and PGMEA are omitted because they are components common to all compositions. Also shown in the table is the pigment concentration for each composition.

<<Yellow composition Y1>>
(Preparation of Pigment Dispersion Y1)
A mixed liquid obtained by mixing the following raw materials was mixed and dispersed for 3 hours using a bead mill (zirconia beads with a diameter of 0.1 mm) to prepare a pigment dispersion liquid. Thereafter, using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) equipped with a decompression mechanism, dispersion treatment was carried out under conditions of a pressure of 2000 kg/cm ³ and a flow rate of 500 g/min. This dispersing treatment was repeated up to 10 times to obtain a pigment dispersion liquid Y1.
Ingredients for the dispersion:
・PY150 10.0 parts by mass ・Pigment derivative 3 1.1 parts by mass ・Dispersant 2 6.7 parts by mass ・PGMEA 82.2 parts by mass (preparation of yellow composition Y1)
Subsequently, after stirring a mixed liquid obtained by mixing the following raw materials, it was filtered through a nylon filter (manufactured by Nippon Pall Co., Ltd.) having a pore size of 0.45 μm to obtain a yellow composition Y1.
Ingredients of the composition:
Pigment dispersion liquid Y1 53.8 parts by mass Resin 2 (40% by mass PGMEA solution) 3.3 parts by mass Polymerizable monomer 2 2.4 parts by mass Photopolymerization initiator 3 0.9 parts by mass Surfactant 1 (1% by mass PGMEA solution) 4.2 parts by mass ・Ultraviolet absorbent 1 0.7 parts by mass ・PGMEA 34.7 parts by mass

<<Yellow Composition Y2 and Compositions of Comparative Examples>>
As shown in Table 5, the yellow composition Y2 and the yellow composition of the comparative example were prepared using the same components, formulations, and procedures as in the case of yellow composition Y1, except that the types of components of the dispersion and composition were changed, respectively. (Comparative Compositions Y1 to Y2) were obtained.

Table 5 shows the characteristic ingredients for each of the above yellow compositions. In addition, in Table 5, descriptions of surfactants, ultraviolet absorbers, and PGMEA are omitted because they are common components in all compositions. Also shown in the table is the pigment concentration for each composition.

<<Magenta Color Composition M1>>
(Preparation of Pigment Dispersion M1)
A mixed liquid obtained by mixing the following raw materials was mixed and dispersed for 3 hours using a bead mill (zirconia beads with a diameter of 0.1 mm) to prepare a pigment dispersion liquid. Thereafter, using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) equipped with a decompression mechanism, dispersion treatment was carried out under conditions of a pressure of 2000 kg/cm ³ and a flow rate of 500 g/min. This dispersing treatment was repeated up to 10 times to obtain a pigment dispersion liquid M1.
Ingredients for the dispersion:
・PR122 10.0 parts by mass ・Pigment derivative 2 1.1 parts by mass ・Dispersant 1 6.7 parts by mass ・PGMEA 82.2 parts by mass (preparation of magenta color composition M1)
Subsequently, after stirring a mixed liquid obtained by mixing the following raw materials, the mixed liquid was filtered through a nylon filter (manufactured by Nippon Pall Co., Ltd.) having a pore size of 0.45 μm to obtain a magenta color composition M1.
Ingredients of the composition:
Pigment dispersion liquid M1 62.4 parts by mass Resin 2 (40% by mass PGMEA solution) 0.6 parts by mass Polymerizable monomer 3 2.2 parts by mass Photopolymerization initiator 1 0.7 parts by mass Surfactant 1 (1% by mass PGMEA solution) 4.2 parts by mass ・Ultraviolet absorbent 1 0.4 parts by mass ・Silane coupling agent 1 0.1 parts by mass ・PGMEA 29.4 parts by mass

<<Magenta Color Composition M2 and Compositions of Comparative Examples>>
As shown in Table 6, magenta-colored composition M2 and comparative magenta-colored compositions were prepared using the same components, formulations, and procedures as for magenta-colored composition M1, except that the types of components of the dispersion and composition were changed, respectively. Color compositions (comparative compositions M1-M2) were obtained.

Table 6 shows the characteristic components of each of the above magenta compositions. In addition, in Table 6, descriptions of surfactants, ultraviolet absorbers, silane coupling agents, and PGMEA are omitted because they are components common to all compositions. Also shown in the table is the pigment concentration for each composition.

<<Cyan composition C1>>
(Preparation of Pigment Dispersion C1)
A mixed liquid obtained by mixing the following raw materials was mixed and dispersed for 3 hours using a bead mill (zirconia beads with a diameter of 0.1 mm) to prepare a pigment dispersion liquid. Thereafter, using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) equipped with a decompression mechanism, dispersion treatment was carried out under conditions of a pressure of 2000 kg/cm ³ and a flow rate of 500 g/min. This dispersing treatment was repeated up to 10 times to obtain a pigment dispersion C1.
Ingredients for the dispersion:
PG7 10.0 parts by mass Pigment derivative 1 1.1 parts by mass Dispersant 1 6.7 parts by mass PGMEA 82.2 parts by mass (preparation of cyan composition C1)
Subsequently, after stirring a mixed liquid obtained by mixing the following raw materials, the mixture was filtered through a nylon filter (manufactured by Nippon Pall Co., Ltd.) having a pore size of 0.45 μm to obtain a cyan composition C1.
Ingredients of the composition:
Pigment dispersion liquid C1 49.3 parts by mass Resin 1 (40% by mass PGMEA solution) 0.6 parts by mass Polymerizable monomer 2 3.0 parts by mass Photopolymerization initiator 2 0.6 parts by mass Surfactant 1 (0.2% by mass EEP solution) 4.2 parts by mass ・Ultraviolet absorbent 1 0.4 parts by mass ・PGMEA 15.6 parts by mass ・EEP 26.3 parts by mass

<<Cyan-colored compositions C2 to C3 and compositions of comparative examples>>
As shown in Table 7, cyan compositions C2 to C3 and comparative examples were prepared using the same components, formulations, and procedures as for cyan composition C1, except that the types of components of the dispersion and composition were changed. cyan-colored compositions (comparative compositions C1 to C3) were obtained. The coloring materials of composition C2 and comparative composition C2 are mixed pigments obtained by changing 1/3 of PG7 to PG36 from the content of the coloring material of composition C1.

<<Cyan composition C4>>
(Preparation of Pigment Dispersion Liquid C4)
A mixed liquid obtained by mixing the following raw materials was mixed and dispersed for 3 hours using a bead mill (zirconia beads with a diameter of 0.1 mm) to prepare a pigment dispersion liquid. Thereafter, using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) equipped with a decompression mechanism, dispersion treatment was carried out under conditions of a pressure of 2000 kg/cm ³ and a flow rate of 500 g/min. This dispersing treatment was repeated up to 10 times to obtain a pigment dispersion liquid C4.
Ingredients for the dispersion:
・PB16 12.0 parts by mass ・Pigment derivative 3 1.0 parts by mass ・Dispersant 1 4.7 parts by mass ・PGMEA 82.3 parts by mass (Preparation of cyan color composition C4)
Subsequently, after stirring a mixed liquid obtained by mixing the following raw materials, the mixture was filtered through a nylon filter (manufactured by Nippon Pall Co., Ltd.) having a pore size of 0.45 μm to obtain a cyan composition C4.
Ingredients of the composition:
Pigment dispersion liquid C4 22.5 parts by mass Resin 1 (40% by mass PGMEA solution) 10.7 parts by mass Polymerizable monomer 1 1.6 parts by mass Photopolymerization initiator 1 1.2 parts by mass Surfactant 1 (1% by mass PGMEA solution) 4.2 parts by mass ・Ultraviolet absorbent 1 0.6 parts by mass ・Epoxy resin 1 0.1 parts by mass ・PGMEA 59.1 parts by mass

<<Cyan composition C5 and compositions of comparative examples>>
As shown in Table 7, cyan composition C5 and comparative cyan were prepared using the same components, formulations, and procedures as for cyan composition C4, except that the types of components of the dispersion and composition were changed, respectively. Color compositions (comparative compositions C4-C5) were obtained.

Table 7 shows the characteristic components of each of the above cyan compositions. In addition, in Table 7, descriptions of surfactants, ultraviolet absorbers, PGMEA and EEP are omitted because they are common components in all compositions. Also shown in the table is the pigment concentration for each composition.

<<Near-infrared cut filter composition SIR1>>
(Preparation of pigment dispersion liquid SIR1)
A mixed liquid obtained by mixing the following raw materials was mixed and dispersed for 3 hours using a bead mill (zirconia beads with a diameter of 0.1 mm) to prepare a pigment dispersion liquid. Thereafter, using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) equipped with a decompression mechanism, dispersion treatment was carried out under conditions of a pressure of 2000 kg/cm ³ and a flow rate of 500 g/min. This dispersing treatment was repeated up to 10 times to obtain a pigment dispersion liquid SIR1.
Ingredients for the dispersion:
・IR dye 1 10.0 parts by mass ・Pigment derivative 5 1.1 parts by mass ・Dispersant 2 6.7 parts by mass ・PGMEA 82.2 parts by mass (Preparation of composition SIR1 for near-infrared cut filter)
Subsequently, after stirring a mixed liquid obtained by mixing the following raw materials, the mixture was filtered through a nylon filter (manufactured by Nippon Pall Co., Ltd.) having a pore size of 0.45 μm to obtain a near-infrared cut filter composition SIR1.
Ingredients of the composition:
Pigment dispersion liquid SIR1 53.8 parts by mass Resin 1 (40% by mass PGMEA solution) 3.3 parts by mass Polymerizable monomer 1 2.4 parts by mass Photopolymerization initiator 2 0.9 parts by mass Surfactant 1 (1% by mass PGMEA solution) 4.2 parts by mass ・Ultraviolet absorbent 1 0.7 parts by mass ・PGMEA 34.7 parts by mass

<<Compositions SIR2 to SIR3 for near-infrared cut filters and compositions of comparative examples>>
As shown in Table 8, a near-infrared cut filter composition was prepared in the same manner as in the near-infrared cut filter composition SIR1, except that the types of the components of the dispersion and the composition were changed. SIR2 to SIR3 and comparative near-infrared cut filter compositions (comparative compositions SIR1 to SIR3) were obtained.

Table 8 shows characteristic components of each of the compositions for near-infrared cut filters. In addition, in Table 8, descriptions of surfactants, ultraviolet absorbers, and PGMEA are omitted because they are common components in all compositions. Also shown in the table is the pigment concentration for each composition.

<<Near-infrared transmission filter composition IRP1>>
(Preparation of pigment dispersion liquid IRP1)
A mixed liquid obtained by mixing the following raw materials was mixed and dispersed for 3 hours using a bead mill (zirconia beads with a diameter of 0.1 mm) to prepare a pigment dispersion liquid. Thereafter, using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) equipped with a decompression mechanism, dispersion treatment was carried out under conditions of a pressure of 2000 kg/cm ³ and a flow rate of 500 g/min. This dispersing treatment was repeated up to 10 times to obtain a pigment dispersion liquid IRP1.
Ingredients for the dispersion:
・PR254 5.7 parts by mass ・PY139 0.5 parts by mass ・PV23 1.1 parts by mass ・PB15: 6 4.4 parts by mass ・Pigment derivative 5 1.3 parts by mass ・Dispersant 2 4.7 parts by mass ・PGMEA 82.3 parts by mass (preparation of composition for near-infrared transmission filter IRP1)
After stirring a mixed liquid obtained by mixing the following raw materials, the mixture was filtered through a nylon filter (manufactured by Nippon Pall Co., Ltd.) having a pore size of 0.45 μm to obtain a near-infrared transmission filter composition IRP1.
Ingredients of the composition:
Pigment dispersion liquid IRP1 69.0 parts by mass Resin 1 (40% by mass PGMEA solution) 1.6 parts by mass Polymerizable monomer 1 1.2 parts by mass Photopolymerization initiator 1 0.6 parts by mass Surfactant 1 (0.2% by mass PGMEA solution) 4.2 parts by mass Silane coupling agent 1 0.4 parts by mass PGMEA 23.0 parts by mass

<<Near-infrared transmission filter composition IRP2>>
(Preparation of pigment dispersion liquid IRP2)
A mixed liquid obtained by mixing the following raw materials was mixed and dispersed for 3 hours using a bead mill (zirconia beads with a diameter of 0.1 mm) to prepare a pigment dispersion liquid. Thereafter, using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) equipped with a decompression mechanism, dispersion treatment was carried out under conditions of a pressure of 2000 kg/cm ³ and a flow rate of 500 g/min. This dispersing treatment was repeated up to 10 times to obtain a pigment dispersion liquid IRP2.
Ingredients for the dispersion:
・Perylene black 5.7 parts by mass ・PY139 0.5 parts by mass ・PV23 1.1 parts by mass ・PB15: 6 4.4 parts by mass ・Pigment derivative 2 1.3 parts by mass ・Dispersant 1 4.7 parts by mass ・PGMEA 82.3 parts by mass (preparation of composition for near-infrared transmission filter IRP2)
After stirring a mixed liquid obtained by mixing the following raw materials, the mixture was filtered through a nylon filter (manufactured by Nippon Pall Co., Ltd.) having a pore size of 0.45 μm to obtain a near-infrared transmission filter composition IRP2.
Ingredients of the composition:
Pigment dispersion liquid IRP2 69.0 parts by mass Resin 2 (40% by mass PGMEA solution) 1.6 parts by mass Polymerizable monomer 3 1.2 parts by mass Photopolymerization initiator 1 0.6 parts by mass Surfactant 1 (0.2% by mass PGMEA solution) 4.2 parts by mass Silane coupling agent 1 0.4 parts by mass PGMEA 23.0 parts by mass

<<Near-infrared transmission filter composition IRP3>>
(Preparation of pigment dispersion liquid IRP3)
A mixed liquid obtained by mixing the following raw materials was mixed and dispersed for 3 hours using a bead mill (zirconia beads with a diameter of 0.1 mm) to prepare a pigment dispersion liquid. Thereafter, using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) equipped with a decompression mechanism, dispersion treatment was carried out under conditions of a pressure of 2000 kg/cm ³ and a flow rate of 500 g/min. This dispersing treatment was repeated up to 10 times to obtain a pigment dispersion liquid IRP3.
Ingredients for the dispersion:
Bisbenzofuranone 5.7 parts by mass PY139 0.5 parts by mass PV23 1.1 parts by mass PB15: 6 4.4 parts by mass Pigment derivative 1 1.3 parts by mass Dispersant 2 4.7 parts by mass · PGMEA 82.3 parts by mass (preparation of composition for near-infrared transmission filter IRP3)
After stirring a mixed liquid obtained by mixing the following raw materials, the mixture was filtered through a nylon filter (manufactured by Nippon Pall Co., Ltd.) having a pore size of 0.45 μm to obtain a near-infrared transmission filter composition IRP3.
Ingredients of the composition:
Pigment dispersion liquid IRP3 69.0 parts by mass Resin 1 (40% by mass PGMEA solution) 1.6 parts by mass Polymerizable monomer 2 1.2 parts by mass Photopolymerization initiator 1 0.6 parts by mass Surfactant 1 (0.2% by mass PGMEA solution) 4.2 parts by mass Silane coupling agent 1 0.4 parts by mass PGMEA 23.0 parts by mass

<<Composition for Near-infrared Transmission Filter of Comparative Example>>
As shown in Table 9, the near-infrared transmission filter of the comparative example was prepared in the same manner as in the case of the near-infrared transmission filter composition IRP1, except that the types of the components of the dispersion and the composition were changed. (comparative compositions IRP1 to IRP3) were obtained.

Table 9 shows characteristic components of each of the compositions for near-infrared transmission filters. In addition, in Table 9, descriptions of surfactants, silane coupling agents, and PGMEA are omitted because they are components common to all compositions. Also shown in the table is the pigment concentration for each composition.

<<White composition W>>
(Preparation of Pigment Dispersion W)
A mixed liquid obtained by mixing the following raw materials was mixed and dispersed for 3 hours using a bead mill (zirconia beads with a diameter of 0.1 mm) to prepare a pigment dispersion liquid. Thereafter, using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) equipped with a decompression mechanism, dispersion treatment was carried out under conditions of a pressure of 2000 kg/cm ³ and a flow rate of 500 g/min. This dispersing treatment was repeated up to 10 times to obtain a pigment dispersion W.
Ingredients for the dispersion:
・TiO ₂ 12.3 parts by mass ・Pigment derivative 4 0.7 parts by mass ・Dispersant 1 4.7 parts by mass ・PGMEA 82.3 parts by mass (preparation of white composition W)
Subsequently, after stirring a mixed liquid obtained by mixing the following raw materials, the mixture was filtered through a nylon filter (manufactured by Nippon Pall Co., Ltd.) having a pore size of 0.45 μm to obtain a white composition W.
Ingredients of the composition:
Pigment dispersion liquid W 48.3 parts by mass Resin 2 (40% by mass PGMEA solution) 0.6 parts by mass Polymerizable monomer 1 2.7 parts by mass Photopolymerization initiator 1 0.5 parts by mass Surfactant 1 (1% by mass cyclohexanone solution) 2.5 parts by mass ・Ultraviolet absorbent 1 1.1 parts by mass ・PGMEA 2.2 parts by mass ・Cyclohexanone 42.1 parts by mass

<<Comparative White Composition>>
As shown in Table 10, a white composition of a comparative example (comparative composition W ).

Table 10 shows the characteristic ingredients of each of the above white compositions. Note that in Table 10, surfactants, ultraviolet absorbers, PGMEA, and cyclohexanone are omitted because they are common components in all compositions. Also shown in the table is the pigment concentration for each composition.

<Production of structure>
<<Example 1>>
First, an 8-inch (1 inch=approximately 25.4 mm) silicon wafer was prepared. Then, the undercoat composition was applied onto the silicon wafer by spin coating, and heated at 100° C. for 2 minutes and then at 230° C. for 2 minutes using a hot plate to form a 10 nm-thick undercoat layer on the wafer. formed to Subsequently, the green composition G1 is applied onto the undercoat layer by spin coating, and heated at 100° C. for 2 minutes using a hot plate to form a green composition layer having a thickness of 0.5 μm on the undercoat layer. did. Then, using an i-line stepper exposure apparatus FPA-3000i5+ (manufactured by Canon Inc.), the green composition layer was exposed through a mask having a Bayer pattern of 1.0 μm square with an exposure amount of 150 mJ/cm ² . . Next, using a 0.3% by mass aqueous solution of tetramethylammonium hydroxide (TMAH), the green composition layer was subjected to puddle development at 23° C. for 60 seconds. After that, rinsing by spin shower and washing with pure water are performed, and the wafer is heated at 220° C. for 5 minutes using a hot plate to form green pixels with a thickness of 0.5 μm and 1.0 μm square. did.

Then, using the red composition R1, the same process was performed on this silicon wafer on which the green pixels were formed, and 0.5 μm and 1.0 μm thick layers were formed on the silicon wafer at positions adjacent to the green pixels. Four red pixels were formed. As a result, a structure in which green pixels and red pixels are adjacent to each other on opposite sides, specifically, a structure (structure type I) having a pixel arrangement as shown in FIG. 1 was formed. Here, for example, the green pixel is the first pixel P1 and the red pixel is the second pixel P2.

<<Examples 2 to 9, 20 to 25 and Comparative Examples 1 to 9, 20 to 27, 29 to 30>>
As combinations of compositions for forming structures of structural type I, the combinations shown in Tables 11 and 12 are adopted, and the same processing as in Example 1 is performed to sequentially form the first pixel and the second pixel. By forming, structures of structure type I were each made.

<<Example 10>>
First, green pixels each having a thickness of 0.5 μm and 1.0 μm square were formed on a silicon wafer in the same manner as in Example 1 using the green composition G1. Then, using the red composition R1, the silicon wafer on which the green pixels were formed was subjected to the same treatment, and the positions adjacent to the green pixels on the silicon wafer were coated with a thickness of 0.5 μm and 1.0 μm. Four red pixels were formed. Finally, using the blue composition B1, the same process was performed on this silicon wafer on which the green pixels and red pixels were formed. and 1.0 μm square blue pixels were formed. In forming the red pixels and the blue pixels, a mask having an island pattern of 1.0 μm square was used at the time of exposure.

As a result, a structure in which green pixels and red pixels are adjacent to each other on opposite sides and green pixels and blue pixels are adjacent to each other on opposite sides, specifically, a pixel arrangement as shown in FIG. 2a. A structure (structure type IIa) was formed with Here, for example, the green pixel is the first pixel P1, the red pixel is the second pixel P2, and the blue pixel is the third pixel P3.

<<Examples 11 to 13 and Comparative Examples 10 to 13, 28>>
As combinations of compositions for forming structures of structure type IIa, the combinations shown in Tables 11 and 12 were employed, and the same processing as in Example 10 was performed to obtain the first pixel, the second pixel, and the second pixel. By sequentially forming 3 pixels, each structure of structure type IIa was produced.

<<Example 14>>
The undercoat composition is applied onto the same silicon wafer as in Example 1 by spin coating, and heated at 100° C. for 2 minutes and at 230° C. for 2 minutes using a hot plate to form an undercoat layer having a thickness of 10 nm. was formed on the wafer. Subsequently, the green composition G1 is applied onto the undercoat layer by spin coating, and heated at 100° C. for 2 minutes using a hot plate to form a green composition layer having a thickness of 0.5 μm on the undercoat layer. did. Then, using an i-line stepper exposure apparatus FPA-3000i5+ (manufactured by Canon Inc.), the green composition layer was exposed through a mask having an island pattern of 1.0 μm square with an exposure amount of 150 mJ/cm ² . . Next, using a 0.3% by mass aqueous solution of tetramethylammonium hydroxide (TMAH), the green composition layer was subjected to puddle development at 23° C. for 60 seconds. After that, rinsing by spin shower and washing with pure water are performed, and the wafer is heated at 220° C. for 5 minutes using a hot plate to form green pixels with a thickness of 0.5 μm and 1.0 μm square. did.

Then, using the red composition R1, the silicon wafer on which the green pixels were formed was subjected to the same treatment, and the positions adjacent to the green pixels on the silicon wafer were coated with a thickness of 0.5 μm and 1.0 μm. Four red pixels were formed. Then, using the blue composition B1, the same process was performed on this silicon wafer on which green pixels and red pixels were formed, and a 0.5 μm thick and a A 1.0 μm square blue pixel was formed. Finally, using the near-infrared transmission filter composition IRP1, the silicon wafer on which green pixels, red pixels and blue pixels are formed is subjected to the same process, and the green pixels on the silicon wafer and the green pixels on the silicon wafer Near-infrared transmitting pixels having a thickness of 0.5 μm and a square of 1.0 μm were formed at positions facing each other.

Accordingly, the green pixel and the red pixel are adjacent on one side facing each other, the green pixel and the blue pixel are adjacent on one side facing each other, and the near-infrared transmission pixel is adjacent to both the red pixel and the blue pixel. A structure having a pixel arrangement as shown in FIG. 3a (structure type III) was formed. Here, for example, the green pixel is the first pixel P1, the red pixel is the second pixel P2, the blue pixel is the third pixel P3, and the near-infrared transmission pixel is the fourth pixel P4.

<<Examples 15 to 19 and Comparative Examples 14 to 19>>
As combinations of compositions for forming structures of structural type III, the combinations shown in Tables 11 and 12 were adopted, and the same processing as in Example 14 was performed to obtain the first pixel, the second pixel, and the second pixel. By sequentially forming 3 pixels and a 4th pixel, structures of structure type III were produced respectively.

<<Example 26>>
A silicon oxide layer was formed on an 8-inch silicon wafer by plasma CVD. Next, this silicon oxide layer is patterned by a dry etching method under the conditions described in paragraphs 0128 to 0133 of Japanese Patent Application Laid-Open No. 2016-014856, and partition walls made of silicon oxide (width 0.1 μm, thickness 0.25 μm) were formed in a grid pattern at intervals of 1.0 μm. The dimensions of the opening of the partition on the silicon wafer (the area partitioned by the partition on the silicon wafer) were 1.0 μm long and 1.0 μm wide.

Next, green pixels having a thickness of 0.5 μm and a square of 1.0 μm were formed on the silicon wafer having the partition walls in the same manner as in Example 1 using the green composition G1. At this time, the position of the mask during exposure was adjusted so that one pixel corresponded to one region separated by the partition wall. Then, using the red composition R1, the silicon wafer on which the green pixels were formed was subjected to the same treatment, and the positions adjacent to the green pixels on the silicon wafer were coated with a thickness of 0.5 μm and 1.0 μm. Four red pixels were formed. Finally, using the blue composition B1, the same process was performed on this silicon wafer on which the green pixels and red pixels were formed. and 1.0 μm square blue pixels were formed. In forming the red pixels and the blue pixels, a mask having an island pattern of 1.0 μm square was used at the time of exposure.

As a result, a structure in which green pixels and red pixels are adjacent to each other on opposite sides and green pixels and blue pixels are adjacent to each other on opposite sides, specifically, a pixel arrangement as shown in FIG. 2a. A structure (structural type IIb) having partition walls at the boundaries between pixels as shown in FIGS. 2b and 2c was formed. Here, for example, the green pixel is the first pixel P1, the red pixel is the second pixel P2, and the blue pixel is the third pixel P3.

<<Examples 27-32>>
As combinations of compositions for forming structures of structure type IIb, the combinations shown in Table 11 were adopted, and the same processing as in Example 26 was performed to form the first, second and third pixels. By sequentially forming, structures of structure type IIb were produced respectively.

<Preparation of photosensitive composition>
Furthermore, in addition to the above photosensitive composition, various compositions shown in Tables 13 to 23 were newly prepared by using the above raw materials and the following new raw materials according to the procedures and formulations described later.

<<raw materials>>
<<<coloring materials: pigments, dyes>>>
・PR202: C.I. I. Pigment Red 202
・PR264: C.I. I. Pigment Red 264
・PR269: C.I. I. Pigment Red 269
・PR291: C.I. I. Pigment Red 291
・PR296: C.I. I. Pigment Red 296
・PR297: C.I. I. Pigment Red 297
- PG59: C.I. I. Pigment Green 59
- PG63: C.I. I. Pigment Green 63
- PB15:3: C.I. I. Pigment Blue 15:3
- PB15:4: C.I. I. Pigment Blue 15:4
- PB16: C.I. I. Pigment Blue 16
・PV19: C.I. I. Pigment Violet 19
- PY215: C.I. I. Pigment Yellow 215
- PY228: C.I. I. Pigment Yellow 228
- PY231: C.I. I. Pigment Yellow 231
- PY233: C.I. I. Pigment Yellow 233
・PV2: C.I. I. Pigment Violet 2
・PV19: C.I. I. Pigment Violet 19
・PV37: C.I. I. Pigment Violet 37

<<<Pigment Derivatives of Examples>>>
Pigment derivative 101: compound C-60 in Table 1 above (εmax: 100 L mol ⁻¹ cm ⁻¹ or less, basic)
・Pigment derivative 102: a compound having the following structure (εmax: 100 L mol ⁻¹ cm ⁻¹ or less, basic)
・Pigment derivative 103: a compound having the following structure (εmax: 100 L mol ⁻¹ cm ⁻¹ or less, basic)
Pigment derivative 104: Compound C-93 (εmax: 100 L mol ⁻¹ cm ⁻¹ or less, basic) in Table 1 above
Pigment derivative 105: Compound C-95 in Table 1 above (εmax: 100 L mol ⁻¹ cm ⁻¹ or less, basic)

・分散剤５：ソルスパース２００００（ルーブリゾール社製）。<<<Dispersant>>>
- Dispersant 4: a compound having the following structure (Mw: 30000). The numerical value attached to the main chain represents the molar ratio of repeating units.

- Dispersant 5: Solsperse 20000 (manufactured by Lubrizol).

<<< Resin >>>
- Resin 3: Cychromer P (ACA) 230AA (Mw: 14000, manufactured by Daicel Allnex).
- Resin 4: A compound having the following structure (Mw: 14000). The numerical value attached to the main chain represents the molar ratio of repeating units.

・光重合開始剤５：下記構造を有する化合物。

<<<Photoinitiator>>>
- Photopolymerization initiator 4: a compound having the following structure.

- Photopolymerization initiator 5: a compound having the following structure.

<<< Surfactant >>>
- Surfactant 2: Nonionic surfactant (Pionin D 6112W, manufactured by Takemoto Yushi Co., Ltd.).

<<<epoxy resin>>>
- Epoxy resin 2: Epiclon N-695 (manufactured by DIC).

<<<polymerization inhibitor>>>
- Polymerization inhibitor 1: a compound having the following structure.

<<<Solvent>>>
・PGME: propylene glycol monomethyl ether

<<Green Compositions G101 to G135>>
As shown in Table 13, green compositions G101 to G112, G115 to G123, G128-G135 were obtained. Further, as shown in the same table, green compositions G113, G124, and G126 were obtained in the same manner as the green composition G20 except that the types of components of the dispersion were changed. Further, as shown in the same table, green compositions G114, G125, and G127 were obtained in the same manner as the green composition G21 except that the types of components of the dispersion were changed.

<<Red Compositions R101, R103 to R118>>
As shown in Table 14, red compositions R101, R103 to R118 were obtained using the same components, formulations, and procedures as for red composition R1, except that the types of components of the dispersion and composition were changed. .

<<Red Composition R102>>
(Preparation of Pigment Dispersion R102)
A mixed liquid obtained by mixing the following raw materials was mixed and dispersed for 3 hours using a bead mill (zirconia beads with a diameter of 0.1 mm) to prepare a pigment dispersion liquid. Thereafter, using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) equipped with a decompression mechanism, dispersion treatment was carried out under conditions of a pressure of 2000 kg/cm ³ and a flow rate of 500 g/min. This dispersing treatment was repeated up to 10 times to obtain a pigment dispersion liquid R1.
Ingredients for the dispersion:
・PR254 5.25 parts by mass ・PY139 0.90 parts by mass ・PO71 5.25 parts by mass ・Pigment derivative 101 1.60 parts by mass ・Dispersant 1 4.70 parts by mass ・PGMEA 82.30 parts by mass (red composition Production of R102)
Subsequently, after stirring a mixed liquid obtained by mixing the following raw materials, the mixture was filtered through a nylon filter (manufactured by Nippon Pall Co., Ltd.) having a pore size of 0.45 μm to obtain a red composition R102.
Ingredients of the composition:
Pigment dispersion liquid R102 58.9 parts by mass Resin 2 (40% by mass PGMEA solution) 2.0 parts by mass Polymerizable monomer 2 0.9 parts by mass Photopolymerization initiator 3 0.5 parts by mass Surfactant 1 (1% by mass PGMEA solution) 4.2 parts by mass ・Ultraviolet absorbent 1 0.1 parts by mass ・Epoxy resin 1 0.1 parts by mass ・PGMEA 33.3 parts by mass

<<Red Compositions R119 to R126>>
As shown in Table 14, red compositions R119 to R126 were obtained using the same components, formulations and procedures as for red composition R102, except that the types of components of the dispersion and composition were changed.

<<Blue Compositions B101 to B114>>
As shown in Table 15, blue compositions B101 to B114 were obtained using the same components, formulations, and procedures as for blue composition B1, except that the types of components of the dispersion and composition were changed.

<<Yellow Compositions Y101 to Y112>>
As shown in Table 16, yellow compositions Y101 to Y112 were obtained using the same components, formulations and procedures as for yellow composition Y1, except that the types of components of the dispersion and composition were changed.

<<Magenta Color Compositions M101 to M110>>
As shown in Table 17, magenta-colored compositions M101 to M110 were obtained in the same manner as in the case of magenta-colored composition M1, except that the types of components of the dispersion and composition were changed. .

<<Cyan color compositions C101 to C116>>
As shown in Table 18, cyan-colored compositions C101 to C104 and C109- C112 was obtained. The colorants in compositions C102, C103, C110, and C111 are mixed pigments obtained by changing 1/3 of PG7 to colorant 2 in the table from the colorant content of cyan color composition C1. Further, as shown in the same table, cyan compositions C105 to C108, C105 to C108, C103-C116 were obtained.

<<Near-infrared cut filter compositions SIR101 to SIR106>>
As shown in Table 19, a composition for a near-infrared cut filter was prepared in the same manner as in the case of the near-infrared cut filter composition SIR1, except that the types of the components of the dispersion and the composition were changed. SIR101 to SIR106 were obtained.

<<Near-infrared transmission filter compositions IRP101 to IRP118>>
As shown in Table 20, except that the types of components of the dispersion liquid and the composition were changed, a composition for a near-infrared transmission filter was prepared in the same manner as in the case of the composition for near-infrared transmission filter IRP1, formulation, and procedure. IRP101, IRP104, IRP107, IRP110, IRP113 and IRP116 were obtained. Further, as shown in the same table, except that the types of the components of the dispersion liquid and the composition were changed, the same components, formulations and procedures as in the case of the composition IRP2 for near-infrared transmission filters were used for near-infrared transmission filters. Compositions IRP102, IRP105, IRP108, IRP111, IRP114, IRP117 were obtained. Further, as shown in the same table, except that the types of the components of the dispersion liquid and the composition were changed, the same components, formulations and procedures as in the case of the near-infrared transmission filter composition IRP3 were used for the near-infrared transmission filter. Compositions IRP103, IRP106, IRP109, IRP112, IRP115, IRP118 were obtained.

<<white composition W101, 102>>
As shown in Table 21, white compositions W101 and W102 were obtained in the same manner as for white composition W1, except that the components of the dispersion and composition were changed.

<<Green Composition G201>>
(Preparation of Pigment Dispersion G201)
A mixed liquid obtained by mixing raw materials shown in Table 22(a) below was mixed and dispersed for 3 hours using a bead mill (zirconia beads with a diameter of 0.1 mm) to prepare a pigment dispersion liquid. Thereafter, using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) equipped with a decompression mechanism, dispersion treatment was carried out under conditions of a pressure of 2000 kg/cm ³ and a flow rate of 500 g/min. This dispersion treatment was repeated up to 10 times to obtain Pigment Dispersion G201.
(Preparation of green composition G201)
Subsequently, after stirring the mixture obtained by mixing the raw materials shown in Table 22(b) below, it was filtered through a nylon filter (manufactured by Nippon Pall Co., Ltd.) with a pore size of 0.45 μm to obtain a green composition G201. .

<<Green Composition G202>>
(Preparation of Pigment Dispersion G202)
A mixed liquid obtained by mixing raw materials shown in Table 23(a) below was mixed and dispersed for 3 hours using a bead mill (zirconia beads with a diameter of 0.1 mm) to prepare a pigment dispersion liquid. Thereafter, using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) equipped with a decompression mechanism, dispersion treatment was carried out under conditions of a pressure of 2000 kg/cm ³ and a flow rate of 500 g/min. This dispersing treatment was repeated up to 10 times to obtain a pigment dispersion liquid G202.
(Preparation of green composition G202)
Subsequently, after stirring the mixture obtained by mixing the raw materials shown in Table 23(b) below, it was filtered through a nylon filter with a pore size of 0.45 μm (manufactured by Nippon Pall Co., Ltd.) to obtain a green composition G202. .

<Production of structure>
<<Examples 101 to 109>>
As a combination of compositions for forming a structure of structural type I, the combination shown in Table 24 is adopted for each example, and the same processing as in Example 1 is performed to sequentially form the first pixel and the second pixel. formed.

<<Examples 110 to 113>>
As a combination of compositions for forming a structure of structural type IIa, the combination shown in Table 24 was adopted for each example, and the same processing as in Example 10 was performed to obtain the first pixel, the second pixel and the second pixel. Three pixels were formed sequentially.

<<Examples 114 to 121>>
As a combination of compositions for forming a structure of structural type III, the combinations shown in Table 24 were adopted for each example, and the same processing as in Example 14 was performed to obtain the first pixel, the second pixel, and the second pixel. 3 pixels and a 4th pixel were formed sequentially.

<<Examples 122 to 125>>
As a combination of compositions for forming a structure of structural type IIb, the combination shown in Table 24 was adopted for each example, and the same processing as in Example 26 was performed to obtain the first pixel, the second pixel and the second pixel. Three pixels were formed sequentially.

<<Examples 201 and 202>>
As a combination of compositions for forming a structure of structural type I, the combination shown in Table 25 is adopted for each example, and the same processing as in Example 1 is performed to sequentially form the first pixel and the second pixel. formed.

<<Examples 203 and 204>>
As a combination of compositions for forming a structure of structure type IIa, the combination shown in Table 25 was adopted for each example, and the same processing as in Example 10 was performed to obtain the first pixel, the second pixel and the second pixel. Three pixels were formed sequentially.

<<Examples 205 and 206>>
As a combination of compositions for forming a structure of structure type III, the combinations shown in Table 25 were adopted for each example, and the same processing as in Example 14 was performed to obtain the first pixel, the second pixel, and the second pixel. 3 pixels and a 4th pixel were formed sequentially.

<<Examples 207 and 208>>
As a combination of compositions for forming a structure of structural type IIb, the combination shown in Table 25 was adopted for each example, and the same processing as in Example 26 was performed to obtain the first pixel, the second pixel and the second pixel. Three pixels were formed sequentially.

<Evaluation of stability>
A constant temperature and humidity test was performed for 2000 hours in a constant temperature and humidity chamber at a temperature of 50° C. and a humidity of 85% for each structure of the example and the comparative example. After the constant temperature and humidity test, the cross section of the structure was observed with a transmission electron microscope at a magnification of 40,000 times to examine the occurrence rate of voids between pixels. Then, the stability was evaluated using the void generation rate as an index. An evaluation level of 3 or higher is a level at which it can be said that the stability of the pixel deep layer portion is excellent.
Rating levels and their content:
5: Occurrence rate of voids = 0
4: 0 < occurrence rate of voids ≤ 0.1
3: 0.1 < occurrence rate of voids ≤ 0.2
2: 0.2 < occurrence rate of voids ≤ 0.5
1: 0.5 < occurrence rate of voids ≤ 1.0

The void generation rate was calculated by the following formula for each combination of pixels in contact with each other.
Occurrence rate of voids = [number of boundaries with voids among observed boundaries]/[number of observed boundaries]
In this example, 20 cross sections were randomly selected from the structure, and the presence or absence of voids was observed in 10 boundary groups arranged continuously for each cross section. Observe the boundaries.

The results are shown in Tables 11, 12, 24 and 25. In the table, in the item of "stability", "a" represents the evaluation result in the cross section of the first pixel and the second pixel, and "b" represents the evaluation result in the cross section of the first pixel and the third pixel. , “c” represents the evaluation result in the cross section of the second pixel and the fourth pixel, and “d” represents the evaluation result in the cross section of the third pixel and the fourth pixel.

As shown in each table, by using a transparent pigment derivative in pixels adjacent to each other, it is possible to obtain a structure having excellent stability in the deep part of the pixel. In particular, the comparison between Example 2 and Comparative Example 23, the comparison between Example 6 and Comparative Example 24, and the comparison between Example 12 and Comparative Example 25 show that only one of the adjacent pixels uses the transparent pigment derivative. However, the result was that the transparent pigment derivative did not contribute much to the improvement of stability.

Further, when the pigment concentration was 25% by mass, the use of the transparent pigment derivative improved the stability judgment value from 2 to 5 (comparison between Examples 23 to 25 and Comparative Examples 23 to 25). . On the other hand, when the pigment concentration was 60% by mass and when the pigment concentration was 40% by mass, the use of the transparent pigment derivative improved the stability judgment value from 1 to 5 (respectively, Comparison between Examples 1-3 and Comparative Examples 1-3, and comparison between Examples 20-22 and Comparative Examples 20-22). In other words, when the pigment concentration in the pixel is as high as about 40% by mass or more, the deep layer of the pixel tends to be hard to cure and the stability over time tends to decrease. It can be said that it is very useful.

Also, in the above Examples and Comparative Examples, similar results were obtained when green pixels were formed using green compositions G2 to G3 and G6 to G24 in place of green composition G1. In the above examples and comparative examples, similar results were obtained even when the red pixels were formed using the red compositions R2 to R3 and R6 to R19 in place of the red composition R1. In the above examples and comparative examples, similar results were obtained even when the blue pixels were formed using the blue compositions B2 and B5 to R18 in place of the blue composition B1. In the above Examples and Comparative Examples, the same results were obtained even when yellow pixels were formed using the yellow composition Y2 instead of the yellow composition Y1. In the above examples and comparative examples, similar results were obtained even when the magenta color pixels were formed using the magenta color composition M2 instead of the magenta color composition M1. Similar results were obtained when cyan pixels were formed by using the cyan compositions C2 to C5 in place of the cyan composition C1 in the above examples. Similar results were obtained in the above comparative examples even when the cyan color pixels were formed using the cyan color compositions C2 to C5 in place of the cyan color composition C1. In the above examples and comparative examples, even if the near-infrared cut filter compositions SIR2 and SIR3 were used instead of the near-infrared cut filter composition SIR1 to form the near-infrared cut filter pixels, equivalent results were obtained. was taken. In the above examples and comparative examples, even if the near-infrared transmission filter compositions IRP2 and IRP3 were used instead of the near-infrared transmission filter composition IRP1 to form the near-infrared transmission filter pixels, equivalent results were obtained. was taken. Similar results were obtained when pixels were formed using the compositions of other comparative examples.

Furthermore, as the initiator in the composition, when an oxime compound other than the oxime compound used in the examples is used, when two types of oxime compounds are used in combination, when an oxime compound and an initiator other than the oxime compound are used, and Even when two kinds of initiators other than the oxime compound were used in combination, a structure excellent in stability was obtained similarly to the examples of the present invention. Also, even when two types of solid components in the composition, such as the resin, the polymerizable monomer, and the solvent, were used in combination, a structure excellent in stability was obtained as in the examples of the present invention.

When each structure of the example was built into a solid-state imaging device according to a known method and the image quality was evaluated, good performance was obtained.

<Application of structure>
Furthermore, three structures similar to the structure of Example 1 were prepared, and the following lens material compositions L1 to L3 for IR lenses were used on optical filters consisting of all pixels in each structure. Three structures with lenses were produced by forming microlenses respectively by the following method. When the same stability evaluation as above was performed, each structure was found to be stable as in Example 1. As for the structure of Example 10, three structures with lenses were produced by the same procedure, and the same stability evaluation was performed. This lensed structure was stable as in Example 10. As for the structure of Example 18, three structures with lenses were produced by the same procedure, and the same stability evaluation was performed. This lensed structure was stable as in Example 18. As for the structure of Example 26, three structures with lenses were produced by the same procedure, and the same stability evaluation was performed. This lensed structure was as stable as Example 26.

<<Lens Material Composition L1>>
(Preparation of pigment dispersion liquid L1)
A mixed liquid obtained by mixing the following raw materials was mixed and dispersed for 3 hours using a bead mill (zirconia beads with a diameter of 0.1 mm) to prepare a pigment dispersion liquid. Thereafter, using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) equipped with a decompression mechanism, dispersion treatment was carried out under conditions of a pressure of 2000 kg/cm ³ and a flow rate of 500 g/min. This dispersing treatment was repeated up to 10 times to obtain a pigment dispersion liquid L1.
Ingredients for the dispersion:
・IR dye 1 6.8 parts by mass ・Derivative 10 0.8 parts by mass ・Dispersant 3 6.0 parts by mass ・PGMEA 86.4 parts by mass (preparation of lens material composition L1)
Subsequently, after stirring a mixed liquid obtained by mixing the following raw materials, it was filtered through a nylon filter (manufactured by Nippon Pall Co., Ltd.) having a pore size of 0.45 μm to obtain a lens material composition L1.
Ingredients of the composition:
・Pigment dispersion liquid L1 13.0 parts by mass ・Ogsol PG-100 (manufactured by Osaka Gas Chemicals Co., Ltd.) 16.1 parts by mass ・Resin 1 (40% by mass PGMEA solution) 3.3 parts by mass ・1,2-dimethylimidazole 0 .6 parts by mass Adekastab AO-80 (manufactured by ADEKA) 0.2 parts by mass Surfactant 1 (0.2% by mass PGMEA solution) 4.2 parts by mass PGMEA 62.6 parts by mass

<<Lens Material Compositions L2, L3>>
As shown in Table 26, lens material compositions L2 and L3 were obtained in the same manner as in lens material composition L1, except that the types of components of the dispersion and composition were changed. .

In this table, descriptions of Adekastab AO-80 and surfactant as additives and PGMEA as solvent are omitted because they are common components in all compositions. As for the components, corresponding components were changed for each column of "Component 1", "Component 2" and "Component 3" in the table. Ogsol PG-100 and Ogsol CG-500 (manufactured by Osaka Gas Chemicals Co., Ltd.) are epoxy resins having a fluorene skeleton, and CR-1030 (manufactured by Osaka Gas Chemicals Co., Ltd.) is an acid-modified fluorene-type polyester resin.

Refractive index for light with a wavelength of 550 nm, minimum transmittance for light with a wavelength of 400 to 700 nm (film thickness: 0.35 μm), and transmittance for light with a wavelength of 820 nm (film thickness: 0.35 μm) for each of the lens material compositions L1 to L3. is as shown in Table 27. A film (film thickness of 0.35 μm) for measuring the refractive index was obtained by applying each lens material composition on a silicon wafer by spin coating, heating the wafer at 100° C. for 2 minutes using a hot plate, , by heating the wafer at 220° C. for 5 minutes using a hot plate. On the other hand, a film for spectroscopic measurement (thickness 0.35 μm) was obtained by applying each lens material composition onto a glass wafer by spin coating, heating the wafer at 100° C. for 2 minutes using a hot plate, and It was made by heating the wafer at 220° C. for 5 minutes using a hot plate.

<<Method of Forming Microlenses>>
After producing an optical filter on a silicon wafer, each lens material composition was applied by spin coating, heated at 100° C. for 2 minutes using a hot plate, and further heated at 220° C. using a hot plate. Heating was performed for 5 minutes to form a lens material composition layer having a film thickness of 1.2 μm. After that, using a well-known etch-back transfer method, the lens material composition layer was processed so that the height from the lens top to the lens bottom was 400 nm, thereby forming a microlens.

1 Support 2 Partitions P1 to P4 Pixel R Areas S1 to S3 where voids are likely to occur Structural body SIR Near-infrared cut filter

Claims (6)

having two pixels that are two-dimensionally arranged in contact with each other;
A photosensitive composition in which each of the two pixels contains a pigment, a pigment derivative having a maximum molar absorption coefficient of 3000 L·mol ⁻¹ cm ⁻¹ or less in a wavelength region of 400 to 700 nm, and a resin. is a pixel formed using
The pigment derivative is a compound represented by the following formula (1),
the two pixels have a width of 0.5 μm or more and 1.7 μm or less and a thickness of 0.2 μm or more and 0.8 μm or less;
A total content of the pigment and the pigment derivative contained in at least one of the two pixels is 40 to 65% by mass, and the content of the pigment derivative and the content of the pigment derivative are contained in the same pixel. A structure in which the weight ratio of the pigment to the content of the pigment is 3:97 to 20:80.
A ¹ -L ¹ -Z ¹ (1)
(In formula (1), A ¹ represents a group containing an aromatic ring,
L ¹ represents a single bond or a divalent linking group,
Z ¹ represents a group represented by formula (Z1). )

(In the formula, * represents a bond,
Yz ¹ represents -N(Ry ¹ )- or -O-,
Ry ¹ represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group;
Lz ¹ represents a divalent linking group,
Rz ¹ and Rz ² each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group;
Rz ¹ and Rz ² may be bonded via a divalent group to form a ring,
m represents an integer of 1 to 5; ) 2. The structure according to claim 1 , wherein A1 in formula ( ¹ ) is a group represented by formula (A1) below .

(In the formula, * represents a bond,
Ya ¹ and Ya ² each independently represent -N(Ra ¹ )- or -O-;
Ra ¹ represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group or an aryl group;
B ¹ and B ² each independently represent a hydrogen atom or a substituent. ) the two pixels are pixels containing different pigments;
Each of the two pixels is selected from a red pixel, a green pixel, a blue pixel, a yellow pixel, a cyan pixel, a magenta pixel, a black pixel, a white pixel, a near-infrared cut filter pixel, and a near-infrared transmit filter pixel. is one pixel that is
3. A structure according to claim 1 or 2 . Furthermore, between the two pixels, having a partition lower than the thickness of the two pixels,
The structure according to any one of claims 1-3. A solid-state imaging device comprising the structure according to any one of claims 1 to 4 on a semiconductor substrate. An image display device comprising the structure according to any one of claims 1 to 4 on a glass substrate.

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