JP7176470B2 - gas analyzer - Google Patents

Description

The present disclosure relates to gas analyzers.

2. Description of the Related Art Conventionally, there has been known a technique of spectroscopically obtaining information about an analysis target such as the component concentration of a gas to be measured based on a spectroscopic spectrum such as an optical absorption spectrum. For example, Patent Literature 1 discloses a gas concentration measuring device that spectroscopically calculates the component concentration of a gas to be measured flowing through a predetermined flow path.

JP 2010-185694 A

In such a gas analyzer, a purge gas is discharged from inside the device toward the flow channel to suppress contact between the gas to be measured flowing through the flow channel and the optical components in order to prevent problems such as contamination and corrosion of the optical components. be done. At this time, the temperature of the purge gas is increased so that the gas to be measured is not cooled more than necessary by the purge gas. However, the temperature of the purge gas is limited by the heat resistance temperature of each component of the gas analyzer arranged near the path through which the purge gas flows, and it is difficult to sufficiently suppress the cooling of the gas to be measured that has a temperature higher than the heat resistance temperature. Met.

An object of the present disclosure is to provide a gas analyzer capable of suppressing cooling of the gas to be measured by the purge gas even when the temperature of the gas to be measured is higher than the heat-resistant temperature of each component.

A gas analyzer according to some embodiments is a gas analyzer that analyzes an analyte component in a gas to be measured using a light to be measured that is based on irradiation light applied to a gas to be measured flowing through a flow path. An optical section having at least one optical system and an outlet facing an area formed between the optical section and the flow path are arranged, and have a temperature higher than the heat resistant temperature of the optical section. A first pipe, through which a first purge gas flows, and an outlet, which is positioned closer to the optical part than the first pipe and faces the region, are arranged, and a second purge gas, having a temperature equal to or lower than the heat resistant temperature, flows through. 2 piping. According to such a gas analyzer, cooling of the gas under measurement by the purge gas can be suppressed even when the temperature of the gas under measurement is higher than the heat-resistant temperature of each component. More specifically, the gas analyzer discharges the first purge gas having a temperature higher than the heat-resistant temperature of the optical section into the flow path from the first pipe arranged on the side of the flow path. and the high-temperature first purge gas can be brought into direct contact with each other to suppress cooling of the gas to be measured. In addition, the gas analyzer discharges the second purge gas having a temperature equal to or lower than the heat-resistant temperature of the optical section into the flow path from the second pipe arranged on the side of the optical section, thereby making the optical section heat-resistant. It is possible to operate at sub-temperatures.

In the gas analyzer according to one embodiment, the first pipe has a temperature higher than the condensation temperature when the condensation temperature of the liquefied component contained in the gas to be measured is higher than the heat resistant temperature. 1 purge gas may be circulated. This effectively suppresses the cooling of the gas to be measured. That is, the condensation of the liquefied components contained in the gas to be measured is suppressed. Therefore, the adhesion of the liquefied components to the boundary separating the inner space of the flow path and the inside of the gas analyzer is suppressed. As a result, the scattering of the irradiation light and the light to be measured is also suppressed, so that the gas analyzer can accurately perform analysis on component concentrations.

A gas analyzer according to an embodiment may steadily release the corresponding purge gas from each pipe. As a result, the gas analyzer can release the purge gas through simple control without the need to perform complicated timing control or the like for releasing the purge gas. In addition, since the purge gas is constantly discharged from the inside of the gas analyzer into the flow path, the gas analyzer is designed to prevent defects such as contamination and corrosion of the optical parts. contact with the optical component can be more effectively suppressed.

A gas analyzer according to one embodiment includes a temperature measurement unit that measures the temperature of the gas to be measured, constantly discharges the second purge gas from the second pipe, and measures the temperature measured by the temperature measurement unit. When the temperature of the gas to be measured is higher than the condensing temperature, the discharge of the first purge gas from the first pipe is stopped, and the temperature of the gas to be measured measured by the temperature measuring unit falls below the condensing temperature. Then, the first purge gas may be discharged from the first pipe. As a result, the gas analyzer can discharge the first purge gas into the flow path as needed, and can suppress consumption of the first purge gas. That is, the first purge gas is effectively used and the cost is reduced.

In the gas analyzer according to one embodiment, the optical unit includes a first optical unit that irradiates the gas under measurement flowing through the flow path with the irradiation light, and acquires a received light signal based on the light under measurement. and a second optical unit that analyzes the component to be analyzed by using The pair of the first pipe and the second pipe may be provided for each of the first optical section and the second optical section. As a result, the gas analyzer can be configured, for example, as a facing type in which the light source and the photodetector are separated with the gas to be measured interposed therebetween.

According to the present disclosure, it is possible to provide a gas analyzer capable of suppressing cooling of the gas under measurement by the purge gas even when the temperature of the gas under measurement is higher than the heat-resistant temperature of each component.

It is a schematic diagram mainly showing an example of the configuration related to the optical section of the gas analyzer according to one embodiment. It is a block diagram showing an example of composition of a gas analysis device concerning one embodiment. FIG. 2 is a schematic diagram showing an example of the configuration of a purge gas supply system arranged on the second optical section side of FIG. 1; FIG. 2 is a schematic diagram mainly showing a modification of the configuration of the optical section of the gas analyzer of FIG. 1;

First, the background and problems of the prior art will be mainly described.

For example, a gas analyzer is directly attached to a flow path through which a gas to be measured such as a process gas flows, and concentration analysis of a component to be analyzed is performed. Gases to be measured include, for example, CO (carbon monoxide) _{, CO2} (carbon dioxide), _H2O (water), _CnHm (hydrocarbon), _NH3 (ammonia), and _O2 (oxygen). Contains gas molecules. Flow paths include pipes, flues, combustion furnaces, and the like.

Such a gas analyzer includes, for example, a TDLAS (Tunable Diode Laser Absorption Spectroscopy) type laser gas analyzer. A TDLAS type laser gas analyzer analyzes the concentration of a component to be analyzed by, for example, irradiating a gas to be measured with a laser beam.

Gas molecules contained in the gas to be measured exhibit optical absorption spectra in the infrared to near-infrared region based on molecular vibrational and rotational energy transitions. Optical absorption spectra are specific to component molecules. According to the Lambert-Beer law, the absorbance of a gas molecule with respect to laser light is proportional to its component concentration and optical path length. Therefore, the concentration of the analyte component can be analyzed by measuring the intensity of the light absorption spectrum.

In TDLAS, a gas to be measured is irradiated with a semiconductor laser beam having a line width sufficiently narrower than the absorption line width of energy transition of gas molecules. The oscillation wavelength is swept by modulating the injection current of the semiconductor laser at high speed. By measuring the light intensity of the semiconductor laser light that has passed through the gas to be measured, one independent light absorption spectrum is measured.

The sweep range of semiconductor laser light varies depending on the application. When the component to be analyzed is O ₂ , the line width of the semiconductor laser light is, for example, 0.0002 nm, and the sweep width is, for example, 0.1 to 0.2 nm. A light absorption spectrum is measured by sweeping the sweep width from 0.1 to 0.2 nm. The concentration of the component to be analyzed is calculated by performing concentration conversion from one acquired light absorption spectrum. Concentration conversion methods include known methods such as the peak height method, spectrum area method, and 2f method.

In the gas analyzer as described above, a purge gas that suppresses the contact between the gas to be measured flowing through the flow path and the optical parts is directed toward the flow path from inside the apparatus so as to prevent problems such as contamination and corrosion of the optical parts. released. At this time, if the measured gas were cooled by the purge gas, some inconveniences would occur.

For example, when a liquefied component in the gas to be measured is cooled by the purge gas, the liquefied component condenses and adheres to the boundary separating the inner space of the flow path and the inside of the device. Here, the liquefied component includes a component that is contained in the gas to be measured and that can be liquefied during the process depending on the temperature and pressure of the gas to be measured. For example, when a liquefied component is present in a gas under measurement, and the temperature of the gas under measurement is higher than a predetermined temperature including the condensation temperature of the liquefied component, the liquefied component does not liquefy and remains in a state of gas or fine particles. exists in the gas under test. On the other hand, when the liquefied component is present in the gas to be measured and the temperature of the gas to be measured falls below a predetermined temperature, the liquefied component condenses (liquefies or aggregates) and adheres to the boundary portion. . The above description of the liquefying component also applies to one embodiment of the present disclosure, which will be described later.

Irradiation light emitted from the light-emitting part for measurement of the light absorption spectrum is scattered by the liquefied component adhering to the boundary portion when emitted from the inside of the device into the internal space of the channel. Similarly, when the transmitted light as the light to be measured based on the irradiation light irradiated to the gas to be measured is incident on the inside of the device from the internal space of the flow channel due to the liquefied component adhering to the boundary portion, scatter. Due to the above, there is a risk that the analysis of component concentrations will not be performed accurately.

For example, when the heat energy of the gas to be measured as the process gas is used in a heat exchanger, when the gas to be measured is cooled by the purge gas, it can be exchanged by the heat exchanger located at the end of the flow path. thermal energy is reduced.

In order to solve the above problems, the temperature of the purge gas is set higher than a predetermined threshold so that the gas under measurement is not cooled more than necessary by the purge gas. The predetermined threshold includes, for example, the condensation temperature of liquefied components contained in the gas under measurement. The predetermined threshold includes, for example, the minimum required temperature of the gas to be measured for use in the heat exchanger. However, the temperature of the purge gas is limited by the heat-resistant temperatures of the components of the gas analyzer arranged near the path through which the purge gas flows. As a result, when the temperature of the measured gas is higher than the heat resistant temperature and the predetermined threshold value is higher than the heat resistant temperature, it is difficult to sufficiently suppress the cooling of the measured gas with the purge gas that is limited to the heat resistant temperature or less. there were.

An object of the present disclosure is to provide a gas analyzer capable of suppressing cooling of the gas to be measured by the purge gas even when the temperature of the gas to be measured is higher than the heat-resistant temperature of each component. An embodiment of the present disclosure will be mainly described below with reference to the accompanying drawings.

FIG. 1 is a schematic diagram mainly showing an example of the configuration of the optical section 2 of the gas analyzer 1 according to one embodiment. The dashed-dotted line in FIG. 1 indicates the optical axis of light including the irradiation light L1 and the light to be measured L2. The dashed arrows in FIG. 1 indicate the flow of gas containing the gas to be measured G and each purge gas. The configuration and functions of the optical unit 2 of the gas analyzer 1 according to one embodiment will be mainly described with reference to FIG. 1 .

The gas analyzer 1 irradiates, for example, the gas G to be measured flowing through the flow path F with the irradiation light L1, and analyzes the concentration of the component to be analyzed in the gas G to be measured based on the received signal of the light L2 to be measured. . The gas analyzer 1 includes, for example, a TDLAS type laser gas analyzer. In this case, the light to be measured L2 includes transmitted light based on the irradiation light L1 with which the gas G to be measured is irradiated.

The measured gas G includes gas molecules such _as CO, _CO2 , _H2O , _CnHm , _NH3 , and _O2 . As shown in FIG. 1, the gas to be measured G flows through the flow path F in one direction, for example, from the bottom to the top.

The gas analyzer 1 has an optical section 2 with at least one optical system. For example, the optical section 2 has a first optical section 10 and a second optical section 20 which are arranged separately from each other along the direction orthogonal to the extending direction of the flow path F. Here, the extension direction is, for example, the direction in which the gas to be measured G flows through the flow path F, and corresponds to the vertical direction in FIG. The direction orthogonal to the extending direction is, for example, the direction orthogonal to the direction in which the gas to be measured G flows through the flow path F, and corresponds to the left-right direction in FIG.

More specifically, the optical section 2 has a first optical section 10 forming a light emitting side. The first optical section 10 includes a light emitting section 11 . The optical section 2 has a second optical section 20 forming a light receiving side. The second optical section 20 includes a light receiving section 21a and a computing section 21b. For example, in the gas analyzer 1, the first optical section 10 including the light emitting section 11 faces the second optical section 20 including the light receiving section 21a across the channel F through which the gas G to be measured flows. are placed.

The light emitting section 11 included in the first optical section 10 includes, for example, any light source capable of measuring the gas G to be measured by TDLAS. The light emitting unit 11 includes, for example, a semiconductor laser. The light emitting unit 11 irradiates the measurement gas G flowing through the flow path F with the irradiation light L1. More specifically, the light emitting unit 11 irradiates the measurement gas G with the irradiation light L1 whose oscillation wavelength is swept based on the injection current as the wavelength sweep signal. The oscillation wavelength of the light emitting unit 11 is determined according to the analysis wavelength of the component to be analyzed contained in the gas G to be measured.

The gas analyzer 1 has a first fixed tube 12 that attaches the first optical section 10 to the wall W of the channel F. As shown in FIG. The gas analyzer 1 has a first pipe 13 and a second pipe 14 attached to the first optical section 10 side. The outlet of the first pipe 13 is arranged to face the first region R1 formed between the first optical section 10 and the flow path F along the optical axis of the irradiation light L1. The outlet of the second pipe 14 is located closer to the first optical unit 10 than the first pipe 13 and is arranged to face the first region R1.

The gas analyzer 1 circulates the first purge gas G11 having a temperature higher than the heat-resistant temperature of the first optical section 10 through the first pipe 13, and discharges the first purge gas G11 from the first pipe 13 so as to flow into the flow path F. For example, when the predetermined threshold is higher than the heat-resistant temperature of the first optical unit 10, the first pipe 13 circulates the first purge gas G11 having a temperature higher than the predetermined threshold. The predetermined threshold includes, for example, the condensation temperature of the liquefied components contained in the gas G under measurement. The predetermined threshold includes, for example, the minimum required temperature of the gas G to be measured that is required for use in the heat exchanger. The gas analyzer 1 circulates the second purge gas G12 having a temperature equal to or lower than the heat-resistant temperature of the first optical section 10 through the second pipe 14 and discharges the second purge gas G12 from the second pipe 14 so as to flow into the flow path F. The first purge gas G11 and the second purge gas G12 suppress mixing of the measurement target gas G into the arrangement region of the optical components that constitute the light emitting unit 11 and the like. More specifically, the first purge gas G11 and the second purge gas G12 suppress the contact of the measurement target gas G with the optical components so as to prevent defects such as contamination and corrosion of the optical components.

The gas analysis device 1 may have a first insertion tube 15 arranged inside the first fixed tube 12 and formed with respective outlets of the first pipe 13 and the second pipe 14 . In the first insertion tube 15 , the outlet of the first pipe 13 is arranged closer to the flow path F than the outlet of the second pipe 14 . The tip of the first insertion tube 15 on the side of the flow path F is positioned inside the flow path F. As shown in FIG. The first insertion pipe 15 propagates the irradiation light L1 emitted from the light emitting part 11 to the inside of the flow path F, and the first purge gas G11 and the second purge gas emitted from the first pipe 13 and the second pipe 14, respectively. G12 is guided to the inside of the channel F.

The first insertion pipe 15 is arranged to narrow the width of the path of the first purge gas G11 and the second purge gas G12 from the discharge port to the flow path F. As a result, the pressure of each purge gas is increased, and the contact between the gas to be measured G flowing through the flow path F and the optical components in the gas analyzer 1 is efficiently suppressed.

Although the gas analyzer 1 has been described as having the first insertion tube 15, it is not limited to this. The gas analyzer 1 may not have the first insertion tube 15 as long as the contact between the gas to be measured G flowing through the flow path F and the optical components in the gas analyzer 1 can be sufficiently suppressed. At this time, each outlet of the first pipe 13 and the second pipe 14 may be directly formed in the first fixed pipe 12 .

The light receiving section 21a included in the second optical section 20 includes, for example, any photodetector capable of measuring the gas G to be measured by TDLAS. The light receiving section 21a includes, for example, a photodiode. The light receiving unit 21a outputs a light receiving signal of the light L2 to be measured based on the irradiation light L1. The received light signal includes information on the spectroscopic spectrum of the component to be analyzed contained in the gas G to be measured. Spectral spectrum includes, for example, optical absorption spectrum.

The arithmetic unit 21b included in the second optical unit 20 includes one or more processors. For example, the calculation unit 21b includes a processor that enables processing related to the second optical unit 20. FIG. More specifically, the calculation unit 21b acquires from the light receiving unit 21a the light receiving signal of the light to be measured L2 output by the light receiving unit 21a. The calculation unit 21b analyzes the concentration of the component to be analyzed in the gas G to be measured based on the received light signal acquired from the light receiving unit 21a.

The gas analyzer 1 has a second fixed tube 22 that attaches the second optical section 20 to the wall W of the channel F. As shown in FIG. The gas analyzer 1 has a first pipe 23 and a second pipe 24 attached to the second optical section 20 side. The outlet of the first pipe 23 is arranged to face the second region R2 formed between the second optical section 20 and the flow path F along the optical axis of the light L2 to be measured. The outlet of the second pipe 24 is located closer to the second optical unit 20 than the first pipe 23 and is arranged to face the second region R2.

The gas analyzer 1 circulates the first purge gas G21 having a temperature higher than the heat-resistant temperature of the second optical section 20 through the first pipe 23 and discharges it from the first pipe 23 so as to flow into the flow path F. For example, when the predetermined threshold is higher than the heat-resistant temperature of the second optical section 20, the first pipe 23 circulates the first purge gas G21 having a temperature higher than the predetermined threshold. The gas analyzer 1 circulates the second purge gas G22 having a temperature equal to or lower than the heat-resistant temperature of the second optical section 20 through the second pipe 24 and discharges the second purge gas G22 from the second pipe 24 so as to flow into the flow path F. The first purge gas G21 and the second purge gas G22 suppress mixing of the measurement target gas G into the arrangement region of the optical components constituting the light receiving section 21a and the like. More specifically, the first purge gas G21 and the second purge gas G22 suppress the contact of the measurement target gas G with the optical components so as to prevent defects such as contamination and corrosion of the optical components.

As described above, a pair of the first pipe and the second pipe are provided for each of the first optical section 10 and the second optical section 20 . Each purge gas discharged on the first optical section 10 side and the second optical section 20 side contains gas molecules such as air and nitrogen. Each purge gas may be composed of the same components, or may be composed of different components.

The gas analysis device 1 may have a second insertion tube 25 arranged inside the second fixed tube 22 and formed with respective outlets of the first pipe 23 and the second pipe 24 . In the second insertion tube 25 , the outlet of the first pipe 23 is arranged closer to the flow path F than the outlet of the second pipe 24 . The tip of the second insertion tube 25 on the side of the flow path F is located inside the flow path F. As shown in FIG. The second insertion tube 25 propagates the light L2 to be measured based on the irradiation light L1 toward the light receiving part 21a, and the first purge gas G21 and the second purge gas G22 emitted from the first pipe 23 and the second pipe 24, respectively. is guided to the inside of the flow channel F.

The second insertion pipe 25 is arranged to narrow the width of the path of the first purge gas G21 and the second purge gas G22 from the discharge port to the flow path F. As a result, the pressure of each purge gas is increased, and the contact between the gas to be measured G flowing through the flow path F and the optical components in the gas analyzer 1 is efficiently suppressed.

Although the gas analyzer 1 has been described as having the second insertion tube 25, it is not limited to this. The gas analyzer 1 may not have the second insertion tube 25 as long as the contact between the gas to be measured G flowing through the flow path F and the optical components in the gas analyzer 1 can be sufficiently suppressed. At this time, each outlet of the first pipe 23 and the second pipe 24 may be directly formed in the second fixed pipe 22 .

FIG. 2 is a block diagram showing an example of the configuration of the gas analyzer 1 according to one embodiment. In FIG. 2, the configuration of the purge gas supply system 40 is simplified for the purpose of simple illustration. A detailed configuration of the purge gas supply system 40 will be described later with reference to FIG. With reference to FIG. 2, the configuration and functions of the components of the gas analyzer 1 other than the optical unit 2 described with reference to FIG. 1 will be mainly described.

The gas analyzer 1 has a controller 30 , a purge gas supply system 40 , and a temperature measurement section 50 in addition to the first optical section 10 and the second optical section 20 . The control device 30 has a control section 31 , a storage section 32 , a display section 33 and an input section 34 .

Control unit 31 includes one or more processors. For example, the controller 31 includes a processor that enables processing related to the gas analyzer 1 . The control unit 31 is connected to each component constituting the gas analyzer 1, and controls and manages the entire gas analyzer 1 including each component. For example, the control section 31 may output a control signal to the first optical section 10 to control the light emitting operation of the light emitting section 11 . For example, the control unit 31 may acquire data related to concentration analysis of the component to be analyzed in the gas G to be measured from the second optical unit 20 and store the data in the storage unit 32 . The control unit 31 may display the concentration of the component to be analyzed in the measurement gas G on the display unit 33 as the result of the concentration analysis. For example, the control unit 31 may acquire information about the temperature of the gas G under measurement from the temperature measurement unit 50 and control the purge gas supply system 40 based on the temperature of the gas G under measurement.

The storage unit 32 is, for example, an HDD (Hard Disk Drive), SSD (Solid State Drive), EEPROM (Electrically Erasable Programmable Read-Only Memory), ROM (Read-Only Memory), and RAM (Random Access Memory). of memory. The storage unit 32 may function, for example, as a main storage device, an auxiliary storage device, or a cache memory. The storage unit 32 is not limited to one built into the gas analyzer 1, and may be an external storage device connected via a digital input/output port such as a USB. For example, the storage unit 32 may store data relating to concentration analysis of the component to be analyzed in the gas G to be measured.

Display 33 includes any output interface that affects the user's vision. The display unit 33 includes, for example, any display device such as a liquid crystal display. The display unit 33 may include, for example, a touch panel. The display unit 33 may display, for example, the concentration of the component to be analyzed in the measurement gas G as the result of the concentration analysis.

The input unit 34 includes any input interface such as a touch panel, a touch pad, a keyboard, a mouse, and a microphone through which various instructions are input by voice. For example, the input unit 34 may be configured integrally with a liquid crystal display that constitutes the display unit 33 as a touch panel. The input unit 34 , for example, receives user input on the screen displayed on the display unit 33 and outputs the acquired input information to the control unit 31 .

The purge gas supply system 40 supplies the first purge gas G11 and the second purge gas G12 to the first optical section 10 side. The purge gas supply system 40 supplies the first purge gas G21 and the second purge gas G22 to the second optical section 20 side. The purge gas supply system 40 has a gas cylinder 41 , a pressure reducing valve 42 , a flow meter 43 , a temperature controller 44 and a valve 45 . The purge gas flowing out of the gas cylinder 41 is decompressed to a predetermined pressure by the decompression valve 42 . The decompressed purge gas passes through flow meter 43 . The purge gas flow rate is measured by a flow meter 43 . After passing through the flow meter 43 , the purge gas passes through the temperature controller 44 . The temperature of the purge gas is adjusted by the temperature controller 44 . For example, the purge gas is heated by a heater included in temperature controller 44 . The purge gas whose temperature is adjusted by the temperature controller 44 passes through the valve 45 and is supplied to the first optical section 10 side and the second optical section 20 side.

Temperature measurement unit 50 includes, for example, at least one temperature sensor. The temperature measurement unit 50 is arranged, for example, downstream of the measured gas G than the second optical unit 20, and includes one temperature sensor that measures the temperature of the measured gas G, as shown in FIG. In addition, the temperature measurement unit 50 may include a plurality of temperature sensors arranged in the first insertion tube 15 shown in FIG. 1 and measuring the temperatures of the first purge gas G11 and the second purge gas G12 respectively. Similarly, the temperature measurement unit 50 may include a plurality of temperature sensors arranged inside the second insertion tube 25 shown in FIG. 1 and measuring the temperatures of the first purge gas G21 and the second purge gas G22, respectively.

FIG. 3 is a schematic diagram showing an example of the configuration of the purge gas supply system 40 arranged on the side of the second optical section 20 in FIG. In FIG. 3, illustration of the second insertion tube 25 is omitted for the purpose of simple illustration. FIG. 3 shows only the configuration of the purge gas supply system 40 on the second optical section 20 side, but a similar configuration is also arranged on the first optical section 10 side.

As shown in FIG. 3, in the purge gas supply system 40 on the side of the second optical unit 20, the above-described plurality of of piping components are installed. More specifically, the purge gas supply system 40 has a gas cylinder 41a attached to the first pipe 23, a pressure reducing valve 42a, a flow meter 43a, a temperature controller 44a, and a valve 45a. Similarly, the purge gas supply system 40 has a gas cylinder 41b attached to the second pipe 24, a pressure reducing valve 42b, a flow meter 43b, a temperature controller 44b, and a valve 45b.

In FIG. 3, different gas cylinders 41a and 41b are arranged for the first pipe 23 and the second pipe 24, respectively, but the present invention is not limited to this. Only one common gas cylinder 41 may be arranged for the first pipe 23 and the second pipe 24 . Similarly, a plurality of different gas cylinders 41 may be arranged on the first optical section 10 side and the second optical section 20 side, respectively, or only one common gas cylinder 41 may be arranged.

In the following, the control regarding the release of the first purge gas G21 and the second purge gas G22 using the purge gas supply system 40 on the second optical section 20 side will be mainly described. The same description as below also applies to the purge gas supply system 40 on the side of the first optical section 10 . Below, for example, a case where the predetermined threshold is higher than the heat-resistant temperature of the second optical unit 20 is considered.

In the first control example, the gas analyzer 1 controls the pressure reducing valve 42 including the pressure reducing valve 42a and the pressure reducing valve 42b, the temperature controller 44 including the temperature controller 44a and the temperature controller 44b, and the valve 45a and the valve 45b. The valve 45 containing is operated steadily.

More specifically, the gas analyzer 1 steadily releases the corresponding purge gas from each pipe at a constant temperature and flow rate. For example, the gas analyzer 1 is heated by the temperature regulator 44 a to steadily release the first purge gas G<b>21 having a temperature higher than the heat-resistant temperature of the second optical section 20 from the first pipe 23 . For example, the gas analyzer 1 steadily releases the first purge gas G21 having a temperature higher than a predetermined threshold from the first pipe 23 . For example, the gas analyzer 1 is heated by the temperature regulator 44 b to steadily release the second purge gas G<b>22 having a temperature equal to or lower than the heat-resistant temperature of the second optical section 20 from the second pipe 24 .

In a first control example, the valve 45 may be always opened manually or under control by the controller 31 shown in FIG. Without being limited to this, the purge gas supply system 40 may directly discharge each purge gas that has passed through the temperature controller 44 without having the valve 45 . The controller 31 controls the temperature adjusters 44a and 44b so that the first purge gas G21 and the second purge gas G22 have the above-described temperatures steadily. The controller 31 controls the pressure reducing valves 42a and 42b so that the first purge gas G21 and the second purge gas G22 have constant flow rates.

In the second control example, the gas analyzer 1 unsteadily operates only the valve 45 a among the pressure reducing valve 42 , the temperature controller 44 and the valve 45 .

More specifically, the gas analyzer 1 is heated by the temperature controller 44b, and the second purge gas G22 having a temperature equal to or lower than the heat-resistant temperature of the second optical unit 20 is steadily supplied from the second pipe 24 at a constant flow rate. released to On the other hand, the gas analyzer 1 stops discharging the first purge gas G21 from the first pipe 23 when the temperature of the gas G to be measured measured by the temperature measuring unit 50 shown in FIG. 2 is higher than a predetermined threshold value. Let In the gas analyzer 1, for example, when the temperature of the gas to be measured G becomes equal to or lower than a predetermined threshold value due to the second purge gas G22 having a temperature equal to or lower than the heat-resistant temperature of the second optical section 20, the gas analyzer 1 is heated by the temperature controller 44a to a predetermined temperature. The first purge gas G21 having a temperature higher than the threshold of is discharged from the first pipe 23 at a constant flow rate.

In a second example of control, the valve 45b may be always opened manually or under the control of the controller 31 . Without being limited to this, the purge gas supply system 40 may directly discharge the second purge gas G22 that has passed through the temperature controller 44b without having the valve 45b. The controller 31 controls the temperature controller 44b so that the second purge gas G22 constantly has a temperature equal to or lower than the heat-resistant temperature of the second optical section 20 . The controller 31 controls the pressure reducing valve 42b so that the second purge gas G22 has a constant flow rate.

On the other hand, the control unit 31 determines whether or not the temperature of the gas under measurement G is higher than a predetermined threshold based on the information regarding the temperature of the gas under measurement G acquired from the temperature measurement unit 50 . When the control unit 31 determines that the temperature of the gas G to be measured is higher than the predetermined threshold value, the control unit 31 closes the valve 45 a to stop the discharge of the first purge gas G21 from the first pipe 23 . When the control unit 31 determines that the temperature of the gas G to be measured is equal to or lower than the predetermined threshold value, the control unit 31 opens the valve 45 a to release the first purge gas G<b>21 from the first pipe 23 . The controller 31 controls the temperature adjuster 44a so that the first purge gas G21 constantly has a temperature higher than a predetermined threshold. The controller 31 controls the pressure reducing valve 42a so that the first purge gas G21 has a constant flow rate after the valve 45a is opened.

In the third control example, the gas analyzer 1 unsteadily operates only the temperature controller 44 out of the pressure reducing valve 42 , the temperature controller 44 and the valve 45 .

More specifically, the gas analyzer 1 stops the temperature controllers 44a and 44b when the temperature of the gas G under measurement measured by the temperature measuring unit 50 is higher than a predetermined threshold. The gas analyzer 1 steadily discharges the first purge gas G21 and the second purge gas G22 that are not heated by the temperature controllers 44a and 44b from the first pipe 23 and the second pipe 24 at a constant flow rate, respectively. .

On the other hand, the gas analyzer 1 operates the temperature controllers 44a and 44b, for example, when the temperature of the measurement gas G becomes equal to or lower than a predetermined threshold value due to each purge gas that is not heated by the temperature controller 44. The gas analyzer 1 is heated by the temperature controller 44b to steadily release the second purge gas G22 having a temperature equal to or lower than the heat-resistant temperature of the second optical section 20 from the second pipe 24 at a constant flow rate. The gas analyzer 1 is heated by the temperature controller 44a to steadily release the first purge gas G21 having a temperature higher than a predetermined threshold from the first pipe 23 at a constant flow rate.

In a third control example, the valve 45 may always be opened manually or under the control of the controller 31 . Without being limited to this, the purge gas supply system 40 may directly discharge each purge gas that has passed through the temperature controller 44 without having the valve 45 . The controller 31 controls the pressure reducing valves 42a and 42b so that the first purge gas G21 and the second purge gas G22 have constant flow rates.

On the other hand, the control unit 31 determines whether or not the temperature of the gas under measurement G is higher than a predetermined threshold based on the information regarding the temperature of the gas under measurement G acquired from the temperature measurement unit 50 . When the control unit 31 determines that the temperature of the gas G to be measured is higher than the predetermined threshold value, the control unit 31 stops the temperature controller 44 . When the control unit 31 determines that the temperature of the gas G to be measured is equal to or lower than the predetermined threshold value, the control unit 31 operates the temperature controller 44 . At this time, the controller 31 may simultaneously operate the temperature controllers 44a and 44b. The control unit 31 operates one of the temperature controllers 44 so that one of the purge gases has a desired temperature, and then adjusts the other purge gas to have a desired temperature. The other temperature controller 44 may be operated.

Without being limited to the above first to third control examples, the gas analyzer 1 can suppress the cooling of the measurement gas G by the purge gas, and the second optical section 20 can be heated to a temperature higher than the heat resistant temperature. Any control that does not expose to the environment may be implemented. For example, the gas analyzer 1 may operate the pressure reducing valve 42 unsteadily based on the temperature of the gas G under measurement measured by the temperature measuring section 50 .

For example, the gas analyzer 1 may operate any combination of piping components among the pressure reducing valve 42, the temperature regulator 44, and the valve 45 in an unsteady manner. For example, the gas analyzer 1 may operate the temperature controller 44 and the valve 45a unsteadily. In this case, the gas analyzer 1 stops the temperature regulator 44 and closes the valve 45a when the temperature of the gas G to be measured is higher than a predetermined threshold. When the temperature of the gas to be measured G becomes equal to or lower than a predetermined threshold value, the gas analyzer 1 first operates the temperature controller 44b, for example. Subsequently, the gas analyzer 1 opens the valve 45a. Subsequently, the gas analyzer 1 operates the temperature controller 44a.

According to the gas analyzer 1 according to the embodiment as described above, cooling of the gas G to be measured by the purge gas can be suppressed even when the temperature of the gas G to be measured is higher than the heat-resistant temperature of each component. More specifically, the gas analyzer 1 discharges the first purge gas having a temperature higher than the heat-resistant temperature of the optical section 2 into the flow path F from the first pipe arranged on the flow path F side. , the gas G to be measured and the high-temperature first purge gas can be brought into direct contact with each other, and the cooling of the gas G to be measured can be suppressed.

By heating the second purge gas to a temperature equal to or lower than the heat-resistant temperature of the optical section 2 , the gas analyzer 1 can reduce the temperature difference from the first purge gas having a temperature higher than the heat-resistant temperature of the optical section 2 . Accordingly, even when the first purge gas and the second purge gas are mixed and flow into the flow path F, the temperature drop of the first purge gas is suppressed. As a result, cooling of the gas G to be measured can be suppressed.

For example, the condensation temperature of the liquefied component contained in the measurement gas G is higher than the heat resistant temperature of the optical section 2, and the temperature of the first purge gas is higher than the condensation temperature, so that the measurement gas G can be effectively cooled. Suppressed. Thereby, the condensation of the liquefied components contained in the gas G to be measured is suppressed. Therefore, adhesion of liquefied components to the boundary portion separating the inner space of the flow path F and the inside of the gas analyzer 1 is suppressed. Here, the inside of the gas analyzer 1 includes, for example, the insides of the first fixed tube 12 and the first insertion tube 15 and the insides of the second fixed tube 22 and the second insertion tube 25 . The boundary portion includes, for example, tip portions including openings on the flow path F side exposed to the gas G to be measured in each of the first insertion tube 15 and the second insertion tube 25 . In addition, the boundary portion may include any optical window or the like that separates the internal space of the flow path F and the inside of the gas analyzer 1 . As a result, the scattering of the irradiation light L1 and the light L2 to be measured is also suppressed, so that the gas analyzer 1 can accurately analyze the component concentration.

For example, the required temperature of the gas G to be measured, which is the minimum required for use in the heat exchanger, is higher than the heat resistant temperature of the optical section 2, and the temperature of the first purge gas is higher than the required temperature. cooling is effectively suppressed. That is, even when the thermal energy of the gas G to be measured as the process gas is used in the heat exchanger, cooling of the gas G to be measured itself can be suppressed. As a result, the heat energy that can be exchanged by the heat exchanger arranged ahead of the flow path F is maintained.

The gas analyzer 1 discharges the second purge gas having a temperature equal to or lower than the heat resistance temperature of the optical section 2 from the second pipe arranged on the side of the optical section 2 to the flow path F, thereby making the optical section 2 heat resistant. It is possible to operate at sub-temperatures. More specifically, the gas analyzer 1 can suppress the inflow of the first purge gas to the optical section 2 side by discharging the second purge gas from the optical section 2 side toward the first purge gas. Therefore, the gas analyzer 1 does not expose the optical section 2 to a temperature environment higher than the heat-resistant temperature, and can appropriately protect the optical section 2 by suppressing problems caused by heat.

It will be apparent to those skilled in the art that the present disclosure can be embodied in certain other forms than those described above without departing from the spirit or essential characteristics thereof. Accordingly, the preceding description is exemplary, and not limiting. The scope of the disclosure is defined by the appended claims rather than by the foregoing description. Any changes that come within the range of equivalence are included therein.

For example, the shape, arrangement, orientation, number, and the like of each component described above are not limited to the contents illustrated in the above description and drawings. The shape, arrangement, orientation, number, and the like of each component may be arbitrarily configured as long as the function can be realized.

For example, each step in the control of the purge gas supply system 40 described above and the functions included in each step can be rearranged so as not to be logically inconsistent, the order of the steps can be changed, or a plurality of steps can be combined into one. can be combined or divided into

Although the purge gas supply system 40 is described above as discharging only the first purge gas and the second purge gas having different temperatures, the present invention is not limited to this. The purge gas supply system 40 may supply, in addition to the first purge gas and the second purge gas, a third purge gas discharged toward the flow path F at a pressure sufficiently higher than these purge gases. At this time, the purge gas supply system 40 may periodically release the third purge gas at predetermined time intervals. For example, the predetermined time interval is such that after the third purge gas is finally released, the light intensities of the irradiation light L1 and the light L2 to be measured interfere with accurate concentration analysis of the analysis target component due to the liquefied component adhering to the boundary portion. It may be determined based on the time it takes to reach the desired light intensity.

The purge gas supply system 40 may have a new pipe for flowing such a third purge gas in addition to the first pipe and the second pipe, or one of the first pipe and the second pipe may be connected to the third purge gas. You may use it also as piping for. The purge gas supply system 40 may discharge the third purge gas toward the flow path F without heating it, or may, for example, supply the third purge gas heated by a temperature controller attached to the piping through which the third purge gas flows. You may discharge toward the flow path F. With such a high-pressure third purge gas, the gas analyzer 1 can more effectively blow off the liquefied components adhering to the boundary portion that have not been completely removed by only discharging the first and second purge gases. is.

In the above description, the gas analyzer 1 controls the purge gas supply system 40 based on the information about the temperature of the gas G to be measured obtained from the temperature measuring section 50, but the present invention is not limited to this. The gas analyzer 1 may have a pressure measurement section including a pressure sensor that measures the pressure of the gas G to be measured in addition to or instead of the temperature measurement section 50 . In addition to or instead of the information about the temperature of the gas G to be measured obtained from the temperature measuring part 50, the gas analyzer 1 controls the purge gas supply system 40 based on the information about the pressure of the gas G to be measured obtained from the pressure measuring part. may be controlled in the same manner as above.

In FIG. 1, the first optical section 10 including the light emitting section 11 is arranged so as to face the second optical section 20 including the light receiving section 21a across the channel F through which the gas G to be measured flows. explained. The gas analyzer 1 is not limited to this, and the first optical section 10 and the second optical section 20 are separated from each other along the extending direction of the flow path F or a direction orthogonal to the extending direction. It may have any configuration in which it is arranged in a closed position.

For example, the first optical section 10 and the second optical section 20 may be arranged separately along the extending direction of the flow path F in a state of being spaced apart from each other. For example, in a state in which the optical axis of the irradiation light L1 and the optical axis of the light L2 to be measured are inclined at a predetermined angle with respect to the extending direction of the flow path F, the first optical section 10 and the second optical section 20 They may be arranged on the same side of the flow path F in the direction orthogonal to the extending direction. At this time, the light L2 to be measured includes scattered light scattered at a predetermined scattering angle based on the irradiation light L1 irradiated to the gas G to be measured.

FIG. 4 is a schematic diagram mainly showing a modification of the configuration of the optical section 2 of the gas analyzer 1 of FIG. In the gas analysis device 1 described above, the first optical section 10 and the second optical section 20 are arranged separately and separated from each other along the extending direction of the flow path F or a direction orthogonal to the extending direction. explained that it is The gas analyzer 1 is not limited to this, and the first optical section 10 and the second optical section 20 are integrated, and the light emitting section 11 and the light receiving section 21a extend in a direction perpendicular to the extending direction of the flow path F. may have configurations that are located on the same side of the . For example, the gas analyzer 1 may be configured such that the light emitting section 11, the light receiving section 21a, and the computing section 21b are collectively included in the optical section 2. FIG.

More specifically, the gas analyzer 1 includes a probe portion 60 extending so as to overlap the gas G to be measured along the optical axes of the irradiation light L1 and the light L2 to be measured, and the gas G to be measured. and a reflecting portion 70 located at the tip of the probe portion 60 so as to face the light emitting portion 11 . At this time, the light receiving section 21a is arranged on the same side as the light emitting section 11 so as to face the reflecting section 70 with the gas G to be measured interposed therebetween.

In the gas analyzer 1 as shown in FIG. 4, a portion of the gas G to be measured flowing upward through the flow path F flows from below through the notch 61 into the measurement region R3 in the probe section 60. influx. Another part of the gas G to be measured goes around from the opening 62 and flows into the measurement region R3 in the probe section 60 from above. In this manner, the gas to be measured G flowing through the flow path F circulates inside the probe section 60 . The measured gas G that has flowed through the inside of the probe section 60 flows out into the flow path F again through the opening 62, for example. Here, the measurement region R3 includes the internal space of the probe section 60 exposed inside the flow channel F through the opening 62 . Thus, the measurement region R3 is filled with the gas G to be measured.

On the other hand, the purge gas having the same configuration as above is supplied to regions R4 and R5 formed on the left and right sides of the measurement region R3 inside the probe section 60, respectively. In FIG. 4, the boundary between the measurement regions R3 and R4 and the boundary between the measurement regions R3 and R5 are indicated by dotted lines. The purge gas prevents the measurement gas G from contacting the optical components such as the reflecting section 70, the light emitting section 11, and the light receiving section 21a so as not to cause problems such as contamination and corrosion of these optical components. Thus, the regions R4 and R5 are filled with the purge gas.

In the above embodiment, the explanation was limited to TDLAS, but the gas analyzer 1 can be applied to any analyzer that performs spectroscopic analysis of any analysis target.

In the above embodiment, the spectroscopic spectrum has been described as including the light absorption spectrum, but it is not limited to this. The gas analyzer 1 may analyze the analysis target component using any spectroscopic method other than such an absorption spectroscopic method. Spectroscopy may include, for example, fluorescence spectroscopy and Raman spectroscopy. For example, in fluorescence spectroscopy, spectroscopic spectra include fluorescence spectra. For example, in Raman spectroscopy, spectroscopic spectra include Raman spectra.

1 gas analyzer 2 optical unit 10 first optical unit 11 light emitting unit 12 first fixed pipe 13 first pipe 14 second pipe 15 first insertion pipe 20 second optical unit 21a light receiving unit 21b calculation unit 22 second fixed pipe 23 First pipe 24 Second pipe 25 Second insertion pipe 30 Control device 31 Control unit 32 Storage unit 33 Display unit 34 Input unit 40 Purge gas supply system 41, 41a, 41b Gas cylinders 42, 42a, 42b Pressure reducing valves 43, 43a, 43b Flow rate Totals 44, 44a, 44b Temperature controllers 45, 45a, 45b Valve 50 Temperature measuring section 60 Probe section 61 Notch 62 Opening 70 Reflecting section F Channel G Gas to be measured G11, G21 First purge gas G12, G22 Second purge gas L1 Irradiation light L2 Light to be measured R1 First region R2 Second region R3 Measurement region R4 Region R5 Region W Wall

Claims (5)

A gas analyzer for analyzing a component to be analyzed in a gas under measurement using a light to be measured based on irradiation light applied to the gas under measurement flowing through a flow path,
an optical section having at least one optical system;
A first purge gas having a temperature higher than the heat-resistant temperature of each component included in the optical section and having a discharge port facing a region formed between the optical section and the flow path flows through the first purge gas. piping;
a second pipe having an outlet located closer to the optical unit than the first pipe and facing the region, through which a second purge gas having a temperature equal to or lower than the heat resistant temperature flows;
comprising a
gas analyzer. The first pipe circulates the first purge gas having a temperature higher than the condensation temperature when the condensation temperature of the liquefied component contained in the gas to be measured is higher than the heat resistant temperature.
The gas analyzer according to claim 1. steadily discharging the corresponding purge gas from each pipe,
The gas analyzer according to claim 1 or 2. A temperature measuring unit that measures the temperature of the gas to be measured,
steadily releasing the second purge gas from the second pipe;
stopping discharge of the first purge gas from the first pipe when the temperature of the gas to be measured measured by the temperature measuring unit is higher than the condensation temperature;
discharging the first purge gas from the first pipe when the temperature of the gas under measurement measured by the temperature measuring unit becomes equal to or lower than the condensation temperature;
The gas analyzer according to claim 2. The optical section is
a first optical unit that irradiates the gas to be measured flowing through the flow path with the irradiation light;
a second optical unit that acquires a received light signal based on the light to be measured and analyzes the component to be analyzed;
has
The first optical section and the second optical section are arranged separately and separated from each other along the extending direction of the flow path or a direction orthogonal to the extending direction,
A pair of the first pipe and the second pipe are provided for each of the first optical unit and the second optical unit,
The gas analyzer according to any one of claims 1 to 4.

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