JP7155895B2 - 3D printer - Google Patents

Description

The present invention relates to a three-dimensional modeling apparatus.

Patent Literature 1 and Patent Literature 2 disclose techniques related to three-dimensional modeling apparatuses. For example, Patent Literature 1 discloses an electron beam source used in a modeling apparatus. Also, US Pat. No. 5,200,000 presents the problem of contamination of the vacuum chamber and/or the electron beam source, and the pressure in the second section, where the electron beam source is located, and the pressure in the first section, where the powder material is located. Disclose relationships.

JP 2014-216182 A JP 2017-532719 A

When an energy beam is applied to a powder material placed in a vacuum environment, ions originating from the powder material are generated. These ions may strike the beam source that produces the energetic beam and damage the beam source.

Accordingly, the present invention provides a three-dimensional modeling apparatus that suppresses damage to the beam source.

A three-dimensional modeling apparatus according to one aspect of the present invention includes a modeling housing section that forms an irradiation space in which an energy beam is irradiated onto a powder material, and a beam source housing section that houses a beam source for the energy beam. a connecting housing disposed between the modeling housing and the beam source housing and communicating with the modeling housing and the beam source housing; The housing part and the connecting housing part form a decompressible closed space including the irradiation space, and the connecting housing part is provided with a gas supply part for supplying gas to the inside of the connecting housing part, The body section is provided with a modeling exhaust section that decompresses the inside of the modeling housing section.

When the powder material is irradiated with an energy beam emitted from the beam source, ions are generated. Since the ions are charged particles, they can move towards the beam source. That is, ions can move from the shaping housing to the beam source housing via the connecting housing. Here, when gas is supplied from the gas supply unit to the interior of the decompressed connecting housing, the pressure of the connecting housing becomes relatively higher than the pressures of the modeling housing and the beam source housing. Become. Then, when the modeling exhaust section decompresses the inside of the modeling casing section, a flow of gas from the connecting casing section toward the modeling casing section is generated. That is, the direction of gas flow is opposite to the direction of ion movement. As a result, the gas flow impedes the movement of ions towards the beam source housing. Therefore, since the number of ions reaching the beam source housing is reduced, damage to the beam source housed in the beam source housing can be suppressed.

In one aspect, the beam source housing may be provided with a beam source exhaust for reducing the pressure inside the beam source housing. According to this configuration, the pressure of the beam source housing is efficiently reduced. As a result, it is possible to suppress the decrease in energy beam generation efficiency caused by the beam source.

In one aspect, the coupling housing section may be provided with a gas supply section and a beam control section that controls the energy beam. According to this configuration, it is possible to irradiate the powder material with an energy beam having a desired mode.

In one aspect, the connection housing section has an upstream chamber formed on the beam source housing section side and a downstream chamber formed on the modeling housing section side along the direction of the emission axis of the energy beam. Alternatively, the upstream chamber may be provided with a gas supply section, and the downstream chamber may be provided with a beam control section for controlling the energy beam. According to this configuration, it is possible to satisfactorily prevent the movement of ions. As a result, fewer ions reach the beam source, so damage to the beam source can be suppressed.

In one aspect, the connection housing section has an upstream chamber arranged on the beam source housing section side and a downstream chamber arranged on the modeling housing section side along the direction of the emission axis of the energy beam. However, the upstream chamber may be provided with a beam control section for controlling the energy beam, and the downstream chamber may be provided with a gas supply section. This configuration also satisfactorily prevents the movement of ions, so that damage to the beam source can be suppressed.

In one aspect, the coupling housing section may have a compound chamber in which a beam control section for controlling the energy beam and a gas supply section are provided. This configuration also satisfactorily prevents the movement of ions, so that damage to the beam source can be suppressed.

In one aspect, the beam source has a cathode and an anode, and the beam source housing may house the cathode and the anode. With this configuration, the beam source can favorably emit an energy beam.

ADVANTAGE OF THE INVENTION According to this invention, the three-dimensional modeling apparatus which can suppress the damage which a beam source receives is provided.

FIG. 1 is a diagram showing the configuration of a three-dimensional modeling apparatus according to the present invention. FIG. 2 is a diagram showing the operation of the 3D modeling apparatus according to the present invention. FIG. 3 is a schematic diagram showing the pressure distribution of the 3D modeling apparatus according to the present invention. FIG. 4 is a diagram showing the configuration of a three-dimensional modeling apparatus according to a modification. FIG. 5 is a diagram showing the configuration of a three-dimensional modeling apparatus according to another modification. FIG. 6 is a diagram showing the configuration of a gas supply unit included in a three-dimensional modeling apparatus according to some other modifications.

BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, embodiments for carrying out the present invention will be described in detail with reference to the accompanying drawings. In the description of the drawings, the same elements are denoted by the same reference numerals, and overlapping descriptions are omitted.

The three-dimensional laminate-molded article manufacturing apparatus (hereinafter referred to as "three-dimensional modeling apparatus 1") shown in FIG. 1 is a so-called 3D printer. The three-dimensional modeling apparatus 1 applies energy to the powder material 101 arranged in layers. In other words, the 3D modeling apparatus 1 raises the temperature of the powder material 101 . As a result, powder material 101 is melted or sintered. Then, when the three-dimensional modeling apparatus 1 stops applying energy, the temperature of the melted powder material 101 drops, so that it solidifies. In other words, the three-dimensional modeling apparatus 1 manufactures the product 102 by repeating applying and stopping the energy a plurality of times.

The powder material 101 is metal powder, such as titanium-based metal powder, Inconel powder, and aluminum powder. Further, the powder material 101 is not limited to metal powder, and may be powder containing carbon fiber and resin, such as CFRP (Carbon Fiber Reinforced Plastics). Alternatively, the powder material 101 may be another powder having electrical conductivity.

The product 102 is, for example, a machine part. Note that the article to be manufactured 102 may be another structure.

A three-dimensional modeling apparatus 1 has an electron source 2 , a modeling chamber 3 , and a positive pressure section 4 . The positive pressure section 4 is arranged between the electron source 2 and the modeling chamber 3 . That is, it can be said that the positive pressure section 4 is arranged on the downstream side of the electron source 2 , and it can be said that the positive pressure section 4 is arranged on the upstream side of the modeling chamber 3 . The terms “upstream” and “downstream” referred to here are based on the emission direction of the electron beam 103 . The electron source 2 generates an electron beam 103 (energy beam) and provides the electron beam 103 to the modeling chamber 3 through the positive pressure section 4 . The modeling chamber 3 forms a modeling space S<b>1 (irradiation space) that accommodates the powder material 101 and receives the electron beam 103 to melt and solidify the powder material 101 .

The electron source 2 has an electron gun 6 . The electron gun 6 has power supplies 6a, 6f, 6g, a cathode 6b, an anode 6c, a filament 6d, and a grid electrode 6e. A power supply 6a is electrically connected to the grid electrode 6e and the anode 6c. Specifically, the negative electrode of the power supply 6a is connected to the grid electrode 6e. The positive electrode of the power supply 6a is grounded and connected to the anode 6c. A power supply 6a creates a potential difference between the grid electrode 6e and the anode 6c. This potential difference is the acceleration voltage. A power supply 6a provides a voltage of, for example, -60 kV to the grid electrode 6e and zero volts (ground potential) to the anode 6c. Therefore, the acceleration voltage is -60 kV, for example.

Cathode 6b is heated by filament 6d. As a result of heating, the cathode 6b emits thermoelectrons. Thermoelectrons have a negative charge and are accelerated by the anode 6c. In other words, thermoelectrons are accelerated according to the potential difference between cathode 6b and anode 6c. The accelerated thermal electrons form electron beam 103 . The direction in which the electron beam 103 is emitted, that is, the direction in which thermoelectrons are accelerated, is the emission direction of the electron source 2 . A virtual axis representing the emission direction of the electron source 2 is the emission axis A. As shown in FIG.

The electron source 2 further has a beam source housing 7 (beam source housing section) and a beam source pump 8 (beam source exhaust section).

The beam source housing 7 forms a beam source space S2 that accommodates the cathode 6b, the anode 6c, the filament 6d and the grid electrode 6e. The beam source housing 7 has an upper surface to which the filament 6d is attached and a lower surface facing the upper surface. A beam source hole 7a is provided on the bottom surface. The beam source hole 7a is provided in a region including the emission axis A of the electron beam 103 on the bottom surface. That is, the beam source hole 7a allows the electron beam 103 to pass therethrough. Further, on the lower surface, an anode 6c is arranged around the beam source hole 7a.

The beam source pump 8 evacuates gas present in the beam source space S2. In other words, the beam source pump 8 decompresses the beam source space S2. The beam source pump 8 is a so-called vacuum pump. By evacuating the gas inside the beam source housing 7, that is, by making the inside of the beam source housing 7 into a high vacuum state, chemical reaction between the high-temperature cathode 6b and the gas is suppressed. Therefore, the formation of a film of the compound on the surface of the cathode 6b is suppressed. As a result, a decrease in the number of thermoelectrons emitted from the cathode 6b can be suppressed.

The modeling chamber 3 has a table 9 , a lifting device 11 and a powder supply device 12 .

The table 9 has, for example, a plate shape, and a powder material 101 that is a raw material of a product 102 is placed thereon. The table 9 has a rectangular shape in plan view. The shape of the table 9 is not limited to a rectangle. The table 9 may be circular or other shapes. The lifting device 11 lifts the table 9 up and down. The lifting device 11 includes, for example, a rack-and-pinion drive mechanism. The lifting device 11 is not limited to a rack-and-pinion drive mechanism, and may be other mechanisms such as a ball screw and a cylinder. The powder feeder 12 arranges the powder material 101 on the table 9 in layers, for example, in a plurality of layers. The powder supply device 12 includes a raw material tank 12a and a powder application mechanism 12b. The raw material tank 12 a stores the powder material 101 and supplies the powder material 101 onto the table 9 . The powder coating mechanism 12b smoothes the surface of the powder material 101 on the table 9. FIG. Note that the three-dimensional modeling apparatus 1 may adopt a mechanism including a roller portion, a rod-shaped member, a brush portion, etc. instead of the powder coating mechanism 12b, or may adopt a mechanism for scattering the powder material 101. .

The modeling chamber 3 further includes a modeling housing 13 (modeling housing section) and a modeling pump 14 (modeling exhaust section). The modeling housing 13 forms a modeling space S<b>1 that accommodates the table 9 , the lifting device 11 and the powder supply device 12 . The shaped housing 13 has a shaped upper surface to which the positive pressure part 4 is connected. A modeling hole 13a is provided on the top surface of the modeling. The modeling hole 13a is provided in a region including the emission axis A of the electron beam 103 on the top surface of the modeling. That is, the shaping hole 13a allows the electron beam 103 to pass through.

The modeling pump 14 exhausts the gas existing in the modeling space S1 of the modeling housing 13, and sets the pressure of the modeling space S1 to a predetermined value. The modeling pump 14 is a so-called vacuum pump.

The positive pressure section 4 forms a high pressure section between the electron source 2 and the modeling chamber 3 . High pressure here means that the pressure of the positive pressure section 4 is higher than the pressure of the electron source 2 and the pressure of the modeling chamber 3 . That is, the “positive pressure” of the positive pressure section 4 (positive pressure space S3) in this embodiment refers to the relationship between the pressure of the positive pressure section 4 and the pressure of the electron source 2, and the pressure of the positive pressure section 4 and the modeling chamber. 3, it does not mean the pressure in the space outside the three-dimensional modeling apparatus 1 or the state in which the pressure is higher than the atmospheric pressure. The pressure in the positive pressure section 4 (positive pressure space S3) may be a pressure lower than the pressure of the space outside the three-dimensional modeling apparatus 1 or the atmospheric pressure, or may be a pressure within a range called a vacuum. For example, it may be in a low vacuum state. While the pressure of the electron source 2 is high vacuum, the positive pressure section 4 may be low vacuum. The positive pressure section 4 is arranged between the electron source 2 and the modeling chamber 3 . In other words, the positive pressure section 4 is arranged downstream of the electron source 2 in the direction of the emission axis A of the electron beam 103 . The positive pressure section 4 is arranged upstream of the modeling chamber 3 in the direction of the emission axis A of the electron beam 103 .

The positive pressure section 4 has a positive pressure housing 16 (connecting housing section), a beam shaping section 17 (beam control section), a gas supply section 18 and a pressure adjustment section 19 .

The positive pressure housing 16 has a partition plate 22 . The positive pressure housing 16 includes a positive pressure space S3 (upstream chamber) and a beam shaping space S4 (downstream chamber) separated from each other by the partition plate 22 . The positive pressure space S3 is adjacent to the electron source 2 . The beam shaping space S4 is adjacent to the modeling room 3 . The partition plate 22 has a central positive pressure hole 16a formed in a region including a position intersecting the output axis A. As shown in FIG. In the positive pressure housing 16, an upper positive pressure hole 16b is provided in the end face of the beam source housing 7 side. The upper positive pressure hole 16b communicates with the beam source hole 7a. That is, the beam source housing 7 and the positive pressure housing 16 communicate with each other through the beam source hole 7a and the upper positive pressure hole 16b. A lower positive pressure hole 16c is provided in the end face on the modeling housing 13 side. The lower positive pressure hole 16c communicates with the shaping hole 13a. That is, the modeling housing 13 and the positive pressure housing 16 communicate with each other through the modeling hole 13a and the lower positive pressure hole 16c. Therefore, the beam source housing 7, the modeling housing 13 and the positive pressure housing 16 form one closed space S that is airtight. In other words, the closed space S includes the build space S1, the beam source space S2, the positive pressure space S3, and the beam shaping space S4.

In the above description, the beam source housing 7, the modeling housing 13, and the positive pressure housing 16 of the three-dimensional modeling apparatus 1 are separate components. For example, in at least one housing, the three-dimensional modeling apparatus 1 separates the inside of the housing with a partition plate having a through hole, thereby separating the beam source housing, the modeling housing, and the positive pressure housing. may be configured.

The beam shaping section 17 shapes the electron beam 103 emitted from the electron source 2 .

The beam shaping section 17 is arranged in the side wall of the positive pressure housing 16 that forms the beam shaping space S4. The beam shaping section 17 forms a magnetic field in the front region of the electron source 2 . The front region is the front (downstream) region in the direction of the emission axis A of the electron beam 103 . The beam shaping section 17 includes an aberration correction coil 17a, a focus coil 17b and a deflection coil 17c. The aberration correction coil 17a, the focus coil 17b and the deflection coil 17c are arranged in this order from the electron source 2 side in the direction of the emission axis A of the electron beam 103, for example. Also, the aberration correction coil 17 a , the focusing coil 17 b and the deflection coil 17 c are arranged so as to surround the electron beam 103 emitted from the electron source 2 . The aberration correction coil 17a corrects the astigmatism of the electron beam 103. FIG. The focusing coil 17b focuses the electron beam 103 narrowly. A deflection coil 17 c deflects the converged electron beam 103 . Electromagnetic beam deflection can provide faster scanning speeds than mechanical beam deflection. According to such a configuration, the electron beam 103 emitted from the electron source 2 is corrected for astigmatism by the aberration correction coil 17a, narrowly converged by the focusing coil 17b, and deflected by the deflection coil 17c. A predetermined position is irradiated.

The gas supply unit 18 is arranged in the positive pressure space S3. That is, it can be said that the gas supply unit 18 is arranged downstream from the electron source 2 (on the molding chamber 3 side), and it can be said that it is arranged downstream from the cathode 6b and the anode 6c. Furthermore, it can be said that the gas supply unit 18 is arranged upstream of the modeling chamber 3 (on the side of the electron source 2), and on the upstream side of the beam shaping unit 17 (on the side of the electron source 2), which will be described later. It can be said that it is located in

The gas supply unit 18 has a gas tank 18a and a gas valve 18b. The gas tank 18a accommodates gas provided to the three-dimensional modeling apparatus 1 . The gas is, for example, a gas with a small atomic number such as hydrogen gas or helium gas. In the following explanation, the gas supplied by the gas supply unit 18 is hydrogen, but the gas is not limited to hydrogen, and may be other gas such as helium gas. The gas valve 18b controls the start and stop of gas supply.

The pressure adjuster 19 adjusts the pressure in the positive pressure space S3. The pressure adjustment unit 19 is arranged in a portion of the positive pressure housing 16 that forms the positive pressure space S3. The pressure adjustment unit 19 has an exhaust adjustment valve 19a and a positive pressure pump 19b.

The operation of the three-dimensional modeling apparatus 1 will be described below.

The three-dimensional modeling apparatus 1 controls the power source 6a to supply current to the filament 6d. Specifically, as shown in FIGS. 1 and 2, the cathode 6b is provided at the tip of the filament 6d. A power supply 6a is connected to the filament 6d and the anode 6c respectively. For example, one end of the power source 6a is connected to the anode 6c, and the other end is connected to the grid electrode 6e via the power source 6f. The grid electrode 6e is an electron suppression electrode and controls the amount of current provided from the cathode 6b. The power source 6a creates a potential difference between the anode 6c and the grid electrode 6e corresponding to the power sources 6a, 6f. The other end of the power source 6a is connected to one end of the filament 6d and is also connected to the other end of the filament 6d through the power source 6g. As a result, the filament 6d generates a current corresponding to the power supply 6g. Then, the temperature of the filament 6d rises, and the temperature of the cathode 6b also rises with the temperature rise of the filament 6d. Thermal electrons P1 are generated by this temperature rise of the cathode 6b. Furthermore, the three-dimensional modeling apparatus 1 applies a predetermined voltage (-60 kV) to the cathode 6b and also applies a predetermined voltage (zero volt) to the anode 6c. Thermal electrons P1, which have a negative charge, are then attracted to the anode 6c, which has a relatively high potential with respect to the cathode 6b. That is, the anode 6c accelerates the thermoelectrons P1. As a result, an electron beam 103 is emitted by a plurality of accelerated thermoelectrons P1.

The electron beam 103 is directed from the beam source space S2 to the positive pressure space S3. Furthermore, the electron beam 103 is guided from the positive pressure space S3 to the beam shaping space S4. Here, the electron beam 103 is shaped by the beam shaping section 17 in the beam shaping space S4. Furthermore, the electron beam 103 is directed into the modeling space S1. The electron beam 103 is then applied to the powder material 101 . When the powder material 101 is irradiated with the electron beam 103, the temperature of the powder material 101 rises, and when the temperature exceeds the melting point, the powder material 101 melts.

When the powder material 101 is irradiated with the electron beam 103, ions P2 of the powder material 101 may be generated. If the powder material 101 is metal, metal ions having a relatively large mass are generated. The ions P2 may move in the direction opposite to the direction of the emission axis A of the electron beam 103 (the movement direction of the thermoelectrons P1). Since the ions P2 have a positive charge, they can be accelerated by the electric field generated by the anode 6c and collide with the cathode 6b. Since the metal ions have a large mass, the damage to the cathode 6b due to the collision is likely to increase.

Here, the three-dimensional modeling apparatus 1 of the embodiment has a positive pressure section 4 provided between the electron source 2 and the modeling chamber 3 . Hydrogen gas G is supplied to the positive pressure section 4 from the gas supply section 18 . When the modeling pump 14 provided in the modeling housing 13 operates to evacuate the modeling chamber 3 , hydrogen P<b>3 flows from the positive pressure section 4 toward the modeling chamber 3 . The direction of movement of the hydrogen P3 is opposite to the direction of movement of the ions P2 from the modeling chamber 3 to the electron source 2 described above. Therefore, the movement of the ions P2 is hindered by the flow of the hydrogen P3 from the positive pressure section 4 toward the modeling chamber 3 . Therefore, since the number of ions P2 reaching the electron source 2 is reduced, the damage received by the cathode 6b can be preferably reduced.

Moreover, the effects of the three-dimensional modeling apparatus 1 of the embodiment can also be explained as follows. That is, the beam source housing 7, the modeling housing 13, and the positive pressure housing 16 communicate with each other through thin holes (beam source hole 7a, modeling hole 13a, upper positive pressure hole 16b, lower positive pressure hole 16c). Then, it is evacuated by the beam source pump 8, the shaping pump 14 and the positive pressure pump 19b. According to this configuration, as shown in FIG. 3, a predetermined pressure difference can be maintained among the pressure B2 of the beam source housing 7, the pressure B4 of the modeling housing 13, and the pressure B3 of the positive pressure housing 16. can be done.

As a result, a region of pressure B4 greater than the pressure B2 of the electron source 2 and the pressure B3 of the modeling chamber 3 is formed between the electron source 2 and the modeling chamber 3 . For example, it can be said that a negative pressure gradient is formed along the direction of the emission axis A between the modeling chamber 3 and the positive pressure section 4 . Here, it is assumed that particles existing in the modeling chamber 3 move to the electron source 2 . In this movement, it is necessary to oppose the pressure difference between the pressure B3 in the modeling chamber 3 and the pressure B4 in the positive pressure section 4, so movement of the particles from the modeling chamber 3 to the electron source 2 is hindered. Therefore, since the number of ions P2 reaching the electron source 2 is reduced, the damage received by the cathode 6b can be preferably reduced.

Further, the beam source housing 7 is provided with a beam source pump 8 for reducing the pressure inside the beam source housing 7 . According to this configuration, the pressure inside the beam source housing 7 is efficiently reduced. As a result, the generation efficiency of the thermoelectrons P1 at the cathode 6b can be increased.

The positive pressure housing 16 is provided with a gas supply section 18 and a beam shaping section 17 that shapes the electron beam 103 . According to this configuration, the powder material 101 can be irradiated with the electron beam 103 having a desired form.

The positive pressure housing 16 includes a positive pressure space S3 formed on the beam source housing 7 side and a beam shaping space formed on the modeling housing 13 side along the direction of the emission axis A of the electron beam 103. and S4. A gas supply unit 18 is provided in the positive pressure space S3. A beam shaping section 17 that shapes the electron beam 103 is provided in the beam shaping space S4. According to this configuration, it is possible to satisfactorily prevent the movement of the ions P2. As a result, fewer ions P2 reach the cathode 6b, so damage to the electron gun 6 can be suppressed.

The three-dimensional modeling apparatus according to the present invention is not limited to the above embodiments.

For example, as shown in FIG. 4, a 3D modeling apparatus 1A has a positive pressure section 4A different from the above embodiment. The positive pressure section 4A includes a beam shaping space S4 formed on the beam source housing 7 side and a positive pressure space S3 formed on the modeling housing 13 side along the direction of the emission axis A of the electron beam 103. and have In the positive pressure housing 16, a side wall forming the positive pressure space S3 is provided with a gas supply section 18 and a pressure adjustment section 19. As shown in FIG. In addition, in the positive pressure housing 16, a beam shaping section 17 is provided on the side wall forming the beam shaping space S4. That is, in the positive pressure section 4</b>A, the positions of the gas supply section 18 and the beam shaping section 17 are reversed with respect to the three-dimensional modeling apparatus 1 . Even in such a configuration, the number of ions reaching the beam source housing 7 is reduced, so damage to the cathode 6b accommodated in the beam source housing 7 can be suppressed.

For example, as shown in FIG. 5, a 3D modeling apparatus 1B has a positive pressure section 4B different from the above embodiment. The positive pressure section 4B has a composite space S5 (complex chamber). A beam shaping section 17 for shaping the electron beam 103 and a gas supply section 18 are provided on the side wall forming the composite space S5 in the positive pressure housing 16 . In other words, the three-dimensional modeling apparatus 1B according to Modification 2 differs from the three-dimensional modeling apparatus 1 in that the positive pressure section 4B forms one space. Even in such a configuration, the number of ions reaching the beam source housing 7 is reduced, so damage to the cathode 6b accommodated in the beam source housing 7 can be suppressed.

For example, as shown in part (a) of FIGS. 1 and 6, the gas supply unit 18 may have a configuration for supplying hydrogen gas G to the beam shaping space S4 in addition to the positive pressure space S3. That is, the gas introduction pipe extending from the gas valve 18b is connected to the positive pressure housing 16. As shown in FIG. Further, a branch gas introduction pipe branched from the gas introduction pipe is connected to the beam shaping section 17 . According to such a configuration, the hydrogen gas G can be simultaneously supplied to the positive pressure space S3 and the beam shaping space S4 by controlling the opening/closing of the gas valve 18b.

For example, as shown in part (b) of FIG. 6, the gas supply section 18A may have a gas valve 18d instead of the gas valve 18b. The gas valve 18d selectively supplies the hydrogen gas G to either one of the positive pressure space S3 and the beam shaping space S4.

For example, as shown in part (c) of FIG. 6, the gas supply unit 18B may branch from a gas introduction pipe connecting the gas tank 18a and the gas valve 18b and have a gas introduction pipe having a gas valve 18c. . According to this configuration, by controlling the gas valves 18b and 18c, the hydrogen gas G is supplied only to the positive pressure space S3 and not supplied to the beam shaping space S4. A second mode in which the hydrogen gas G is provided only to the positive pressure space S3 and not provided to the positive pressure space S3, and a third mode in which the hydrogen gas G is provided to the positive pressure space S3 and the beam shaping space S4 at the same time.

For example, as shown in part (d) of FIG. 6, the gas supply unit 18C may be configured to supply the hydrogen gas G to the beam shaping space S4 and not supply the hydrogen gas G to the positive pressure space S3. That is, the gas supply unit 18C has a gas valve 18c connected to the beam shaping unit 17. As shown in FIG.

Also, a part of the positive pressure part may enter the modeling housing 13 .

1, 1A, 1B three-dimensional modeling apparatus 2 electron generation source 3 modeling chamber 4, 4A, 4B positive pressure section 6 electron guns 6a, 6f, 6g power supply 6b cathode 6c anode 6d filament 6e grid electrode 7 beam source housing (beam source housing)
7a beam source hole 8 beam source pump (beam source exhaust part)
9 Table 11 Lifting device 12 Powder supply device 12b Powder application mechanism 12a Raw material tank 13 Modeling case (modeling case part)
13a modeling hole 14 modeling pump (modeling exhaust part)
16 positive pressure housing (connecting housing section)
17 beam shaping section (beam control section)
17a Aberration correction coil 17b Focusing coil 17c Deflection coils 18, 18A, 18B, 18C Gas supply unit 18a Gas tanks 18b, 18c, 18d Gas valve 19 Pressure adjustment unit 19a Exhaust adjustment valve 19b Positive pressure pump 22 Partition plate 4A Positive pressure unit 16a Central positive Pressure hole 16b Upper positive pressure hole 16c Lower positive pressure hole 101 Powder material 102 Work piece 103 Electron beam (energy beam)
A Emission axis G Hydrogen gas S Closed space S1 Modeling space (irradiation space)
S2 beam source space S3 positive pressure space (upstream chamber)
S4 beam shaping space (downstream chamber)
S5 Composite space (Complex room)
P1 Thermal electron P2 Ion P3 Hydrogen

Claims (6)

a modeling casing forming an irradiation space in which the powder material is irradiated with the energy beam;
a beam source housing forming a beam source space containing a beam source for the energy beam;
is disposed between the modeling housing and the beam source housing, communicates with the irradiation space of the modeling housing through a lower hole, and communicates with the beam source housing through an upper hole ; a connection housing portion forming a space communicating with the beam source space ;
the modeling housing, the beam source housing and the connecting housing form a depressurizable closed space including the irradiation space and the beam source space ;
The connecting housing is provided with a gas supply unit that supplies gas to the interior of the connecting housing,
The modeling housing section is provided with a modeling exhaust section for depressurizing the irradiation space inside the modeling housing section ,
The three-dimensional modeling apparatus , wherein the beam source housing section is provided with a beam source exhaust section for decompressing the beam source space inside the beam source housing section . 2. The three-dimensional modeling apparatus according to claim 1 , wherein said gas supply section and a beam control section for controlling said energy beam are provided in said connection housing section. The connection housing section includes an upstream chamber formed on the beam source housing section side, a downstream chamber formed on the modeling housing section side, and the upstream chamber along the direction of the emission axis of the energy beam. a partition plate that separates the chamber and the downstream chamber ,
The upstream chamber is provided with the gas supply unit,
3. The three-dimensional modeling apparatus according to claim 1, wherein said downstream chamber is provided with a beam controller for controlling said energy beam. The connection housing section includes an upstream chamber arranged on the beam source housing section side, a downstream chamber arranged on the shaping housing section side, and the upstream chamber along the direction of the emission axis of the energy beam. a partition plate that separates the chamber and the downstream chamber ,
The upstream chamber is provided with a beam control unit for controlling the energy beam,
The three-dimensional modeling apparatus according to claim 1 or 2 , wherein the gas supply unit is provided in the downstream chamber. 3. The three-dimensional modeling apparatus according to claim 1, wherein said connection housing section has a composite chamber in which said beam control section for controlling said energy beam and said gas supply section are provided. the beam source has a cathode and an anode;
The three-dimensional modeling apparatus according to any one of claims 1 to 5 , wherein the beam source housing part accommodates the cathode and the anode.

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