JP7112592B2 - Resin composition, film, near-infrared cut filter, near-infrared transmission filter, solid-state imaging device, image display device, and infrared sensor - Google Patents

Description

The present invention relates to a resin composition containing a squarylium compound. The present invention also relates to a film using a composition containing a squarylium compound, a near-infrared cut filter, a near-infrared transmission filter, a solid-state imaging device, an image display device, and an infrared sensor.

2. Description of the Related Art CCDs (charge-coupled devices) and CMOSs (complementary metal-oxide semiconductors), which are solid-state imaging devices for color images, are used in video cameras, digital still cameras, mobile phones with camera functions, and the like. These solid-state imaging devices use silicon photodiodes that are sensitive to infrared rays in their light receiving portions. For this reason, a near-infrared cut filter may be provided to correct visibility.

A near-infrared cut filter is manufactured using a resin composition containing a near-infrared absorbing dye. A squarylium compound is known as one of near-infrared absorbing dyes. Further, Patent Documents 1 and 2 describe a squarylium compound having a specific structure, which is a near-infrared absorbing dye.

On the other hand, Patent Document 3 describes an invention relating to an optical filter composition containing a dye having a maximum absorption wavelength in the range of 500 to 1200 nm and a predetermined metal complex. Paragraph No. 0014 of Patent Document 3 describes that in the optical filter composition of Patent Document 3, the dye having a maximum absorption wavelength in a wavelength range of 500 to 1200 nm has a function of imparting predetermined absorption characteristics to the resulting optical filter, It is described that the metal complex, in the state of the composition or in the state of an optical filter obtained using the composition, has a function of imparting light resistance to a dye having a maximum absorption wavelength of 500 to 1200 nm. there is

WO2018/230486 JP 2019-011455 A JP 2018-028605 A

When the inventors of the present invention investigated films using the resin compositions containing the squarylium compounds described in Patent Documents 1 and 2, it was found that there is room for improvement in the spectral characteristics in the near-infrared region.

In addition, in Patent Document 3, the metal complex according to Patent Document 3 is used for the purpose of improving the light resistance of the dye.

Accordingly, an object of the present invention is to provide a resin composition capable of forming a film having excellent spectral characteristics in the near-infrared region. Another object of the present invention is to provide a film, a near-infrared cut filter, a near-infrared transmissive filter, a solid-state imaging device, an image display device, and an infrared sensor using the aforementioned resin composition.

式中、Ｒｓ^１１９およびＲｓ^１２０はそれぞれ独立して置換基を表し、
Ａ^１およびＡ^２は、それぞれ独立して、酸素原子または－Ｎ（Ｒｓ^１２５）－を表し、
Ｒｓ^１２１～Ｒｓ^１２５はそれぞれ独立して、水素原子または置換基を表し、
Ｅ^１およびＥ^２はそれぞれ独立に炭素原子、ホウ素原子または－Ｃ（＝Ｏ）－を表し、
Ｅ^１が炭素原子の場合にはｎｓ３２は２であり、ホウ素原子の場合にはｎｓ３２は１であり、－Ｃ（＝Ｏ）－の場合にはｎｓ３２は０であり、
Ｅ^２が炭素原子の場合にはｎｓ３３は２であり、ホウ素原子の場合にはｎｓ３３は１であり、－Ｃ（＝Ｏ）－の場合にはｎｓ３３は０であり、
ｎｓ３０およびｎｓ３１はそれぞれ独立に０～５の整数を表し、
ｎｓ３０が２以上の場合は、複数のＲｓ^１１９は、同一であっても異なっていてもよく、複数のＲｓ^１１９のうち２個のＲｓ^１１９同士が結合して環を形成してもよく、
ｎｓ３１が２以上の場合は、複数のＲｓ^１２０は、同一であっても異なっていてもよく、複数のＲｓ^１２０のうち２個のＲｓ^１２０同士が結合して環を形成してもよく、
ｎｓ３２が２の場合は、２個のＲｓ^１２１は同一であっても異なっていてもよく、２個のＲｓ^１２１同士が結合して環を形成してもよく、
ｎｓ３３が２の場合は、２個のＲｓ^１２２は同一であっても異なっていてもよく、２個のＲｓ^１２２同士が結合して環を形成してもよく、
Ａｒ^１００はアリーレン基またはヘテロアリーレン基を表し、
ｎｓ１００は０～２の整数を表す。

式（ＭＣ１）中、環Ｚ^ｍｃ１および環Ｚ^ｍｃ２は、それぞれ独立に含窒素複素環を表し、
Ｒ^ｍｃ１およびＲ^ｍｃ２はそれぞれ独立に単結合または－ＣＲ^Ｙ１Ｒ^Ｙ２－を表し、Ｒ^Ｙ１およびＲ^Ｙ２はそれぞれ独立に水素原子または置換基を表し、
Ｍ^ｍｃ１は１価～３価の遷移金属を表す。
＜２＞ 式（ＭＣ１）で表される金属錯体を２種以上含む、＜１＞に記載の樹脂組成物。
＜３＞ 式（ＳＱ１）で表される近赤外線吸収色素が、式（ＳＱ２）で表される近赤外線吸収色素である、＜１＞または＜２＞に記載の樹脂組成物；

式中、Ｌ^４１～Ｌ^４４はそれぞれ独立に、アルキレン基、アルキニレン基、アリーレン基、複素環基、又は、これらを２以上結合した二価の基を表し、
Ｚ^４１およびＺ^４２はそれぞれ独立に、単結合、－Ｏ－、－Ｃ（＝Ｏ）－、－Ｓ－、－Ｎ（Ｒ^Ｎ１）－、－Ｓ（＝Ｏ）－、又は、－Ｓ（＝Ｏ）_２－を表し、
Ａ^４１およびＡ^４２は、それぞれ独立して酸素原子または－Ｎ（Ｒ^Ｎ２）－を表し、
Ｒ^Ｎ１およびＲ^Ｎ２は、それぞれ独立して水素原子、アルキル基、又は、アリール基を表し、
Ｒｓ^１４１およびＲｓ^１４２は、それぞれ独立して置換基を表し、
ｎｓ４１およびｎｓ４２はそれぞれ独立して０～５の整数を表し、
ｎｓ４１が２以上の場合は、複数のＲｓ^１４１は、同一であっても異なっていてもよく、複数のＲｓ^１４１のうち２個のＲｓ^１４１同士が結合して環を形成してもよく、
ｎｓ４２が２以上の場合は、複数のＲｓ^１４２は、同一であっても異なっていてもよく、複数のＲｓ^１４２のうち２個のＲｓ^１４２同士が結合して環を形成してもよい；
ただし、Ｌ^４１～Ｌ^４４がアルキレン基で、Ｚ^４１およびＺ^４２が単結合で、Ａ^４１およびＡ^４２が－Ｎ（Ｒ^Ｎ２）－の場合、ｎｓ４１およびｎｓ４２の少なくとも一方は１～５の整数である。
＜４＞ 式（ＳＱ１）で表される近赤外線吸収色素が、式（ＳＱ３）で表される近赤外線吸収色素である、＜１＞または＜２＞に記載の樹脂組成物；

式中、Ｑ^１、Ｑ^４、Ｑ^５、Ｑ^８、Ｑ^１１、Ｑ^１４、Ｑ^１５およびＱ^１８は、それぞれ独立に、炭素原子又は窒素原子を表す；
Ｒｓ^１～Ｒｓ^５、Ｒｓ^１１～Ｒｓ^１５は、それぞれ独立に、水素原子、アルキル基、スルホ基、－ＳＯ_３Ｍ^１又はハロゲン原子を表し、Ｍ^１は無機又は有機のカチオンを表し、Ｒｓ^２とＲｓ^３、Ｒｓ^１２とＲｓ^１３は互いに結合して環を形成してもよい；
Ｒｓ^２１～Ｒｓ^２８、Ｒｓ^３１～Ｒｓ^３８は、それぞれ独立に、水素原子、アルキル基、アルケニル基、アリール基、アラルキル基、アルコキシ基、アリールオキシ基、ヒドロキシ基、－ＮＲ^Ｘ１Ｒ^Ｘ２、スルホ基、－ＳＯ_３Ｍ^２、－ＳＯ_２ＮＲ^Ｘ１Ｒ^Ｘ２、－ＣＯＯＲ^Ｘ３、－ＣＯＮＲ^Ｘ１Ｒ^Ｘ２、ニトロ基、シアノ基又はハロゲン原子を表し、Ｍ^２は無機又は有機のカチオンを表し、Ｒ^Ｘ１～Ｒ^Ｘ３は、それぞれ独立に、水素原子、アルキル基、アリール基、アシル基又は複素環基を表し、Ｒ^Ｘ１とＲ^Ｘ２は互いに結合して環を形成してもよく、Ｒｓ^２１～Ｒｓ^２８、Ｒｓ^３１～Ｒｓ^３８のうち、隣接する基同士は互いに結合して環を形成してもよい；
Ｑ^１が窒素原子の場合、Ｒｓ^２１は存在せず、Ｑ^４が窒素原子の場合、Ｒｓ^２４は存在せず、Ｑ^５が窒素原子の場合、Ｒｓ^２５は存在せず、Ｑ^８が窒素原子の場合、Ｒｓ^２８は存在せず、Ｑ^１１が窒素原子の場合、Ｒｓ^３１は存在せず、Ｑ^１４が窒素原子の場合、Ｒｓ^３４は存在せず、Ｑ^１５が窒素原子の場合、Ｒｓ^３５は存在せず、Ｑ^１８が窒素原子の場合、Ｒｓ^３８は存在しない。
＜５＞ 上記樹脂は、塩基性基を有する樹脂を含む、＜１＞～＜４＞のいずれか１つに記載の樹脂組成物。
＜６＞ 上記樹脂は、アルカリ可溶性樹脂を含む、＜１＞～＜５＞のいずれか１つに記載の樹脂組成物。
＜７＞ 更に界面活性剤を含み、界面活性剤の含有量が樹脂組成物の全固形分中０．００１～０．２質量％である、＜１＞～＜６＞のいずれか１つに記載の樹脂組成物。
＜８＞ 更に重合性化合物および光重合開始剤を含む、＜１＞～＜７＞のいずれか１つに記載の樹脂組成物。
＜９＞ 更に近赤外線を透過させて可視光を遮光する色材を含む、＜１＞～＜８＞のいずれか１つに記載の樹脂組成物。
＜１０＞ ＜１＞～＜９＞のいずれか１つに記載の樹脂組成物を用いて得られる膜。
＜１１＞ ＜１０＞に記載の膜を有する近赤外線カットフィルタ。
＜１２＞ ＜１０＞に記載の膜を有する近赤外線透過フィルタ。
＜１３＞ ＜１０＞に記載の膜を有する固体撮像素子。
＜１４＞ ＜１０＞に記載の膜を有する画像表示装置。
＜１５＞ ＜１０＞に記載の膜を有する赤外線センサ。The present inventors conducted intensive studies on a resin composition containing a near-infrared absorbing dye represented by formula (SQ1) and a resin. The inventors have found that the above object can be achieved, and have completed the present invention. The present invention provides the following.
<1> a near-infrared absorbing dye represented by the following formula (SQ1);
a metal complex represented by the following formula (MC1);
a resin;
A resin composition comprising;

wherein Rs ¹¹⁹ and Rs ¹²⁰ each independently represent a substituent;
A ¹ and A ² each independently represent an oxygen atom or -N(Rs ¹²⁵ )-,
Rs ¹²¹ to Rs ¹²⁵ each independently represent a hydrogen atom or a substituent,
E ¹ and E ² each independently represent a carbon atom, a boron atom or -C(=O)-,
ns32 is 2 when E1 is a carbon atom, ns32 is ¹ when it is a boron atom, and ns32 is 0 when it is -C(=O)-;
ns33 is ² when E2 is a carbon atom, ns33 is 1 when it is a boron atom, and ns33 is 0 when it is -C(=O)-;
ns30 and ns31 each independently represent an integer of 0 to 5,
When ns30 is 2 or more, the plurality of Rs ¹¹⁹ may be the same or different, and two Rs ^119s among the plurality of Rs ¹¹⁹ may combine to form a ring,
When ns31 is 2 or more, the plurality of Rs ¹²⁰ may be the same or different, and two Rs ^120s among the plurality of Rs ¹²⁰ may combine to form a ring,
when ns32 is 2, two Rs ¹²¹ may be the same or different, and two Rs ¹²¹ may combine to form a ring;
when ns33 is 2, two Rs ¹²² may be the same or different, and two Rs ¹²² may combine to form a ring;
Ar ¹⁰⁰ represents an arylene group or a heteroarylene group,
ns100 represents an integer of 0-2.

In formula (MC1), ring Z ^mc1 and ring Z ^mc2 each independently represent a nitrogen-containing heterocycle,
R ^mc1 and R ^mc2 each independently represent a single bond or -CR ^Y1 R ^Y2 -, R ^Y1 and R ^Y2 each independently represent a hydrogen atom or a substituent,
M ^mc1 represents a monovalent to trivalent transition metal.
<2> The resin composition according to <1>, containing two or more metal complexes represented by formula (MC1).
<3> The resin composition according to <1> or <2>, wherein the near-infrared absorbing dye represented by formula (SQ1) is a near-infrared absorbing dye represented by formula (SQ2);

In the formula, L ⁴¹ to L ⁴⁴ each independently represents an alkylene group, an alkynylene group, an arylene group, a heterocyclic group, or a divalent group in which two or more of these are bonded,
Z ⁴¹ and Z ⁴² are each independently a single bond, -O-, -C(=O)-, -S-, -N(R ^N1 )-, -S(=O)-, or -S( = O) ₂ -,
A ⁴¹ and A ⁴² each independently represent an oxygen atom or -N(R ^N2 )-,
R ^N1 and R ^N2 each independently represent a hydrogen atom, an alkyl group, or an aryl group;
Rs ¹⁴¹ and Rs ¹⁴² each independently represent a substituent,
ns41 and ns42 each independently represent an integer of 0 to 5,
When ns41 is 2 or more, the plurality of Rs ¹⁴¹ may be the same or different, and two Rs ¹⁴¹ among the plurality of Rs ¹⁴¹ may combine to form a ring,
When ns42 is 2 or more, the plurality of Rs ¹⁴² may be the same or different, and two Rs ¹⁴² of the plurality of Rs ¹⁴² may combine to form a ring;
provided that when L ⁴¹ to L ⁴⁴ are alkylene groups, Z ⁴¹ and Z ⁴² are single bonds, and A ⁴¹ and A ⁴² are —N(R ^N2 )—, at least one of ns41 and ns42 is an integer of 1 to 5 is.
<4> The resin composition according to <1> or <2>, wherein the near-infrared absorbing dye represented by formula (SQ1) is a near-infrared absorbing dye represented by formula (SQ3);

wherein Q ¹ , Q ⁴ , Q ⁵ , Q ⁸ , Q ¹¹ , Q ¹⁴ , Q ¹⁵ and Q ¹⁸ each independently represent a carbon atom or a nitrogen atom;
Rs ¹ to Rs ⁵ and Rs ¹¹ to Rs ¹⁵ each independently represent a hydrogen atom, an alkyl group, a sulfo group, —SO ₃ M ¹ or a halogen atom, M ¹ represents an inorganic or organic cation, Rs ² and Rs ³ , Rs ¹² and Rs ¹³ may combine with each other to form a ring;
Rs ²¹ to Rs ²⁸ and Rs ³¹ to Rs ³⁸ are each independently a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, an aralkyl group, an alkoxy group, an aryloxy group, a hydroxy group, —NR ^X1 R ^X2 and a sulfo group. , —SO ₃ M ² , —SO ₂ NR ^X1 R ^X2 , —COOR ^X3 , —CONR ^X1 R ^X2 , a nitro group, a cyano group or a halogen atom, M ² represents an inorganic or organic cation, and R ^X1 to R ^X3 each independently represents a hydrogen atom, an alkyl group, an aryl group, an acyl group or a heterocyclic group; R ^X1 and R ^X2 may ^combine with each other to form a ^ring ; Adjacent groups among Rs ³¹ to Rs ³⁸ may combine with each other to form a ring;
When ^Q1 is a nitrogen atom, ^Rs21 is absent, When ^Q4 is a nitrogen atom, ^Rs24 is absent, When ^Q5 is a nitrogen atom, ^Rs25 is absent, ^Q8 is a nitrogen atom When ^Q11 is a nitrogen atom, ^Rs31 is absent, When ^Q14 is a nitrogen atom, ^Rs34 is ^absent , When ^Q15 is a nitrogen atom, ^Rs35 is absent and Rs ³⁸ is absent when Q ¹⁸ is a nitrogen atom.
<5> The resin composition according to any one of <1> to <4>, wherein the resin includes a resin having a basic group.
<6> The resin composition according to any one of <1> to <5>, wherein the resin includes an alkali-soluble resin.
<7> Any one of <1> to <6>, which further contains a surfactant and has a surfactant content of 0.001 to 0.2% by mass in the total solid content of the resin composition The described resin composition.
<8> The resin composition according to any one of <1> to <7>, further comprising a polymerizable compound and a photopolymerization initiator.
<9> The resin composition according to any one of <1> to <8>, further comprising a coloring material that transmits near-infrared rays and blocks visible light.
<10> A film obtained using the resin composition according to any one of <1> to <9>.
<11> A near-infrared cut filter having the film according to <10>.
<12> A near-infrared transmission filter having the film according to <10>.
<13> A solid-state imaging device having the film according to <10>.
<14> An image display device comprising the film according to <10>.
<15> An infrared sensor comprising the film according to <10>.

According to the present invention, it is possible to provide a resin composition, a film, a near-infrared cut filter, a near-infrared transmission filter, a solid-state imaging device, an image display device, and an infrared sensor capable of forming a film having excellent spectral characteristics in the near-infrared region. can be done.

1 is a schematic diagram illustrating one embodiment of an infrared sensor; FIG. It is a figure explaining the position of the step on the silicon wafer selected at the time of striation evaluation.

The contents of the present invention will be described in detail below.
In the present specification, the term "~" is used to include the numerical values before and after it as lower and upper limits.
In the description of a group (atomic group) in the present specification, a description that does not describe substitution or unsubstituted includes a group (atomic group) having no substituent as well as a group (atomic group) having a substituent. For example, an "alkyl group" includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).
In the present specification, "exposure" includes not only exposure using light but also drawing using particle beams such as electron beams and ion beams, unless otherwise specified. Light used for exposure includes actinic rays or radiation such as emission line spectra of mercury lamps, far ultraviolet rays represented by excimer lasers, extreme ultraviolet rays (EUV light), X-rays, and electron beams.
In this specification, "(meth)acrylate" represents both or either acrylate and methacrylate, "(meth)acryl" represents both or either acrylic and methacrylic, and "(meth) ) acryloyl” refers to acryloyl and/or methacryloyl.
In this specification, the weight average molecular weight and number average molecular weight are defined as polystyrene equivalent values in gel permeation chromatography (GPC) measurement.
In the present specification, Me in the chemical formulas represents a methyl group, Et represents an ethyl group, Bu represents a butyl group, and Ph represents a phenyl group.
As used herein, near-infrared rays refer to light (electromagnetic waves) with a wavelength of 700 to 2500 nm.
As used herein, the term "total solid content" refers to the total mass of all components of the composition excluding the solvent.
As used herein, a pigment means a compound that is difficult to dissolve in a solvent. For example, the pigment preferably has a solubility of less than 0.1 g in 100 g of water at 23° C. and a solubility in 100 g of propylene glycol monomethyl ether acetate at 23° C., more preferably 0.01 g or less.
As used herein, the term "process" includes not only an independent process, but also when the intended action of the process is achieved even if it cannot be clearly distinguished from other processes. .

<Resin composition>
The resin composition of the present invention is characterized by containing a near-infrared absorbing dye represented by formula (SQ1), a metal complex represented by formula (MC1), and a resin.

By using the resin composition of the present invention, a film having excellent spectral characteristics in the near-infrared region can be formed. Although the detailed reason why such an effect is obtained is unknown, it is presumed to be due to the following. As a result of intensive studies by the present inventors on a film obtained using a resin composition containing a near-infrared absorbing dye represented by (SQ1), this film has an absorption spectrum in the near-infrared region. It was found that splitting occurs easily, and the shielding property against near-infrared rays, in particular, the shielding property against longer-wave near-infrared rays tends to deteriorate. Although the detailed reason is unknown, since the near-infrared absorbing dye represented by (SQ1) has a structure in which a bulky substituent is attached to squaric acid, the molecules are diagonally staggered in the film. It is presumed that the state is easy to form. Therefore, the near-infrared absorbing dye represented by (SQ1) is likely to form H-association and J-association in the film, respectively. It is presumed that the absorption of light on the long-wavelength side is reduced, and the near-infrared shielding property, particularly the near-infrared shielding property of longer wavelengths, is likely to deteriorate. Since the resin composition of the present invention further contains a metal complex represented by the formula (MC1) in addition to the near-infrared absorbing dye represented by the formula (SQ1), it can be represented by the formula (MC1) during film formation. It is presumed that the metal complex facilitates the formation of a J-aggregation between the near-infrared absorbing dyes represented by the formula (SQ1), and as a result, the decrease in the absorption of light on the longer wavelength side can be suppressed. Therefore, it is presumed that by using the resin composition of the present invention, a film having excellent spectral characteristics in the near-infrared region could be formed.

The resin composition of the present invention preferably contains two or more metal complexes represented by formula (MC1). By including the metal complex represented by the formula (MC1) in the resin composition containing the near-infrared absorbing dye represented by the formula (SQ1), during storage of the resin composition represented by the formula (MC1) Aggregates and the like derived from the metal complex may precipitate, and the storage stability of the resin composition may decrease. It is possible to suppress the precipitation of aggregates derived from the metal complex represented by the formula (MC1) during storage of the resin composition by reducing the crystallinity of the metal complex represented by MC1), and the storage stability of the resin composition. can improve sexuality.

The resin composition of the present invention further contains a surfactant, and the content of the surfactant is preferably 0.001 to 0.2% by mass based on the total solid content of the resin composition. According to this aspect, the applicability of the resin composition can be further improved, and even when the resin composition is applied to a surface having steps such as unevenness, the occurrence of radial streaks called striations can be suppressed. Furthermore, the storage stability of the resin composition can also be improved. In particular, when two or more metal complexes represented by the formula (MC1) were blended, striations tended to occur. can be effectively suppressed. Therefore, a particularly remarkable effect is obtained when the resin composition contains two or more kinds of metal complexes represented by the formula (MC1).

式中、Ｒｓ^１１９およびＲｓ^１２０はそれぞれ独立して置換基を表し、
Ａ^１およびＡ^２は、それぞれ独立して、酸素原子または－Ｎ（Ｒｓ^１２５）－を表し、
Ｒｓ^１２１～Ｒｓ^１２５はそれぞれ独立して、水素原子または置換基を表し、
Ｅ^１およびＥ^２はそれぞれ独立に炭素原子、ホウ素原子または－Ｃ（＝Ｏ）－を表し、
Ｅ^１が炭素原子の場合にはｎｓ３２は２であり、ホウ素原子の場合にはｎｓ３２は１であり、－Ｃ（＝Ｏ）－の場合にはｎｓ３２は０であり、
Ｅ^２が炭素原子の場合にはｎｓ３３は２であり、ホウ素原子の場合にはｎｓ３３は１であり、－Ｃ（＝Ｏ）－の場合にはｎｓ３３は０であり、
ｎｓ３０およびｎｓ３１はそれぞれ独立に０～５の整数を表し、
ｎｓ３０が２以上の場合は、複数のＲｓ^１１９は、同一であっても異なっていてもよく、複数のＲｓ^１１９のうち２個のＲｓ^１１９同士が結合して環を形成してもよく、
ｎｓ３１が２以上の場合は、複数のＲｓ^１２０は、同一であっても異なっていてもよく、複数のＲｓ^１２０のうち２個のＲｓ^１２０同士が結合して環を形成してもよく、
ｎｓ３２が２の場合は、２個のＲｓ^１２１は同一であっても異なっていてもよく、２個のＲｓ^１２１同士が結合して環を形成してもよく、
ｎｓ３３が２の場合は、２個のＲｓ^１２２は同一であっても異なっていてもよく、２個のＲｓ^１２２同士が結合して環を形成してもよく、
Ａｒ^１００はアリーレン基またはヘテロアリーレン基を表し、
ｎｓ１００は０～２の整数を表す。<<Near-infrared absorbing dye represented by formula (SQ1)>>
The resin composition of the present invention contains a near-infrared absorbing dye represented by formula (SQ1). The near-infrared absorbing dye represented by formula (SQ1) is preferably a pigment.

wherein Rs ¹¹⁹ and Rs ¹²⁰ each independently represent a substituent;
A ¹ and A ² each independently represent an oxygen atom or -N(Rs ¹²⁵ )-,
Rs ¹²¹ to Rs ¹²⁵ each independently represent a hydrogen atom or a substituent,
E ¹ and E ² each independently represent a carbon atom, a boron atom or -C(=O)-,
ns32 is 2 when E1 is a carbon atom, ns32 is ¹ when it is a boron atom, and ns32 is 0 when it is -C(=O)-;
ns33 is ² when E2 is a carbon atom, ns33 is 1 when it is a boron atom, and ns33 is 0 when it is -C(=O)-;
ns30 and ns31 each independently represent an integer of 0 to 5,
When ns30 is 2 or more, the plurality of Rs ¹¹⁹ may be the same or different, and two Rs ^119s among the plurality of Rs ¹¹⁹ may combine to form a ring,
When ns31 is 2 or more, the plurality of Rs ¹²⁰ may be the same or different, and two Rs ^120s among the plurality of Rs ¹²⁰ may combine to form a ring,
when ns32 is 2, two Rs ¹²¹ may be the same or different, and two Rs ¹²¹ may combine to form a ring;
when ns33 is 2, two Rs ¹²² may be the same or different, and two Rs ¹²² may combine to form a ring;
Ar ¹⁰⁰ represents an arylene group or a heteroarylene group,
ns100 represents an integer of 0-2.

Substituents represented by Rs ¹¹⁹ and Rs ¹²⁰ include the groups described for the substituent T described later, and halogen atoms, alkyl groups, sulfo groups and --SO ₃ M are preferred. M represents an inorganic or organic cation. As the inorganic or organic cation represented by M, any known cation can be employed without limitation. Examples include alkali metal ions (Li ⁺ , Na ⁺ , K ⁺ etc.), ammonium ions, imidazolium ions, pyridinium ions, phosphonium ions and the like. Halogen atoms include fluorine, chlorine, bromine and iodine atoms. The number of carbon atoms in the alkyl group is preferably 1-20, more preferably 1-15, still more preferably 1-8, even more preferably 1-5, and particularly preferably 1-3. The alkyl group may be linear, branched or cyclic, preferably linear or branched, more preferably linear. The alkyl group may have a substituent or may be unsubstituted. Examples of the substituent include the groups described for the substituent T described later.

A ¹ and A ² each independently represent an oxygen atom or -N(Rs ¹²⁵ )-, preferably -N(Rs ¹²⁵ )-.

Substituents represented by Rs ¹²¹ to Rs ¹²⁵ include the groups described below for the substituent T. Rs ¹²³ to Rs ¹²⁵ are preferably hydrogen atoms, alkyl groups or aryl groups, more preferably hydrogen atoms. Also, Rs ¹²¹ to Rs ¹²⁵ are preferably each independently a substituent.

E ¹ and E ² each independently represent a carbon atom, a boron atom or -C(=O)-, preferably a carbon atom. Further, E ¹ is a carbon atom and two Rs ¹²¹ are bonded together to form a ring, and E ² is a carbon atom and two Rs ¹²² are bonded together to form a ring. It is more preferable to have The ring formed by combining Rs ¹²¹ and the ring formed by combining Rs ¹²² may be a hydrocarbon ring or a heterocyclic ring. Moreover, the hydrocarbon ring and the heterocyclic ring may be aromatic rings or non-aromatic rings. Further, the hydrocarbon ring and heterocyclic ring may be monocyclic or condensed. The ring formed by combining Rs ¹²¹ and the ring formed by combining Rs ¹²² are preferably condensed rings, and more preferably condensed rings having three or more rings. The ring formed by combining Rs ¹²¹ and the ring formed by combining Rs ¹²² may further have a substituent. Examples of the substituent include the groups described for the substituent T described later.

ns30 and ns31 each independently represent an integer of 0 to 5, preferably 0 to 4, more preferably 0 to 3, still more preferably 0 to 2, and even more preferably 0 or 1. When ns30 is 2 or more, the plurality of Rs ¹¹⁹ may be the same or different, and two Rs ¹¹⁹ among the plurality of Rs ¹¹⁹ may combine to form a ring, is 2 or more, the plurality of Rs ¹²⁰ may be the same or different, and two Rs ^120s among the plurality of Rs ¹²⁰ may combine to form a ring. The ring formed by combining Rs ¹¹⁹ and the ring formed by combining Rs ¹²⁰ may be a hydrocarbon ring or a heterocyclic ring. Moreover, the hydrocarbon ring and the heterocyclic ring may be aromatic rings or non-aromatic rings. Further, the hydrocarbon ring and heterocyclic ring may be monocyclic or condensed. The ring formed by combining Rs ¹¹⁹ and the ring formed by combining Rs ¹²⁰ are preferably a 5- or 6-membered hydrocarbon ring or heterocyclic ring, and a 5-membered ring Alternatively, it is more preferably a 6-membered hydrocarbon ring.

式中、Ｘａ^１～Ｘａ^８はそれぞれ独立して、硫黄原子、酸素原子またはＮＲｘ^ａを表し、Ｒｘ^ａは水素原子または置換基を表し、＊は結合手を表す。Ｒｘ^ａが表す置換基としては、後述する置換基Ｔで説明する基が挙げられる。Ar ¹⁰⁰ represents an arylene group or a heteroarylene group. Arylene groups and heteroarylene groups may be monocyclic or condensed. The arylene group and heteroarylene group are preferably groups represented by any one of the following formulas (Ar-1) to (Ar-7).

In the formula, Xa ¹ to Xa ⁸ each independently represent a sulfur atom, an oxygen atom or NRx ^a , Rx ^a represents a hydrogen atom or a substituent, and * represents a bond. Examples of the substituent represented by Rx ^a include the groups described below for the substituent T.

ns100 represents an integer of 0 to 2, preferably 0 or 1, more preferably 0.

式中、Ｌ^４１～Ｌ^４４はそれぞれ独立に、アルキレン基、アルキニレン基、アリーレン基、複素環基、又は、これらを２以上結合した二価の基を表し、
Ｚ^４１およびＺ^４２はそれぞれ独立に、単結合、－Ｏ－、－Ｃ（＝Ｏ）－、－Ｓ－、－Ｎ（Ｒ^Ｎ１）－、－Ｓ（＝Ｏ）－、又は、－Ｓ（＝Ｏ）_２－を表し、
Ａ^４１およびＡ^４２は、それぞれ独立して酸素原子または－Ｎ（Ｒ^Ｎ２）－を表し、
Ｒ^Ｎ１およびＲ^Ｎ２は、それぞれ独立して水素原子、アルキル基、又は、アリール基を表し、
Ｒｓ^１４１およびＲｓ^１４２は、それぞれ独立して置換基を表し、
ｎｓ４１およびｎｓ４２はそれぞれ独立して０～５の整数を表し、
ｎｓ４１が２以上の場合は、複数のＲｓ^１４１は、同一であっても異なっていてもよく、複数のＲｓ^１４１のうち２個のＲｓ^１４１同士が結合して環を形成してもよく、
ｎｓ４２が２以上の場合は、複数のＲｓ^１４２は、同一であっても異なっていてもよく、複数のＲｓ^１４２のうち２個のＲｓ^１４２同士が結合して環を形成してもよい；
ただし、Ｌ^４１～Ｌ^４４がアルキレン基で、Ｚ^４１およびＺ^４２が単結合で、Ａ^４１およびＡ^４２が－Ｎ（Ｒ^Ｎ２）－の場合、ｎｓ４１およびｎｓ４２の少なくとも一方は１～５の整数である。The near-infrared absorbing dye represented by formula (SQ1) is preferably a near-infrared absorbing dye represented by formula (SQ2).

In the formula, L ⁴¹ to L ⁴⁴ each independently represents an alkylene group, an alkynylene group, an arylene group, a heterocyclic group, or a divalent group in which two or more of these are bonded,
Z ⁴¹ and Z ⁴² are each independently a single bond, -O-, -C(=O)-, -S-, -N(R ^N1 )-, -S(=O)-, or -S( = O) ₂ -,
A ⁴¹ and A ⁴² each independently represent an oxygen atom or -N(R ^N2 )-,
R ^N1 and R ^N2 each independently represent a hydrogen atom, an alkyl group, or an aryl group;
Rs ¹⁴¹ and Rs ¹⁴² each independently represent a substituent,
ns41 and ns42 each independently represent an integer of 0 to 5,
When ns41 is 2 or more, the plurality of Rs ¹⁴¹ may be the same or different, and two Rs ¹⁴¹ of the plurality of Rs ¹⁴¹ may combine to form a ring,
When ns42 is 2 or more, the plurality of Rs ¹⁴² may be the same or different, and two Rs ¹⁴² of the plurality of Rs ¹⁴² may combine to form a ring;
provided that when L ⁴¹ to L ⁴⁴ are alkylene groups, Z ⁴¹ and Z ⁴² are single bonds, and A ⁴¹ and A ⁴² are —N(R ^N2 )—, at least one of ns41 and ns42 is an integer of 1 to 5 is.

L ⁴¹ to L ⁴⁴ each independently represent an alkylene group, an alkynylene group, an arylene group, a heterocyclic group, or a divalent group in which two or more of these are bonded. The number of carbon atoms in the alkylene group is preferably 1 to 20, more preferably 1 to 15, still more preferably 1 to 8, even more preferably 1 to 5, and particularly preferably 1 to 3. The alkylene group may be linear, branched or cyclic. The alkylene group may have a substituent or may be unsubstituted. Examples of the substituent include the groups described for the substituent T described later. The alkynylene group preferably has 2 to 20 carbon atoms, more preferably 2 to 12 carbon atoms, and particularly preferably 2 to 8 carbon atoms. The alkynylene group may be either linear or branched. The alkynylene group may have a substituent or may be unsubstituted. Examples of the substituent include the groups described for the substituent T described later. The arylene group preferably has 6 to 30 carbon atoms, more preferably 6 to 20 carbon atoms, and even more preferably 6 to 12 carbon atoms. The arylene group may have a substituent or may be unsubstituted. Examples of the substituent include the groups described for the substituent T described later. The heterocyclic group is preferably a monocyclic heterocyclic group or a condensed heterocyclic group having 2 to 8 condensed rings, more preferably a monocyclic heterocyclic group or a condensed heterocyclic group having 2 to 4 condensed rings. A monocyclic heterocyclic group is more preferred. The number of heteroatoms constituting the ring of the heterocyclic group is preferably 1-3. The heteroatom constituting the ring of the heterocyclic group is preferably a nitrogen atom, an oxygen atom or a sulfur atom, more preferably a nitrogen atom. The heterocyclic group is preferably a 5- or 6-membered ring. The number of carbon atoms constituting the ring of the heterocyclic group is preferably 3-30, more preferably 3-18, and more preferably 3-12. The heterocyclic group may have a substituent or may be unsubstituted. Examples of the substituent include the groups described for the substituent T described later.

Each of L ⁴¹ to L ⁴⁴ is preferably an arylene group or a heterocyclic group, more preferably an arylene group.

Z ⁴¹ and Z ⁴² are each independently a single bond, -O-, -C(=O)-, -S-, -N(R ^N1 )-, -S(=O)-, or -S( =O) ₂ —, preferably a single bond.

A ⁴¹ and A ⁴² each independently represent an oxygen atom or -N(R ^N2 )-, preferably -N(R ^N2 )-. R ^N2 is preferably a hydrogen atom.

The number of carbon atoms in the alkyl group represented by R ^N1 and R ^N2 is preferably 1 to 20, more preferably 1 to 15, even more preferably 1 to 8, even more preferably 1 to 5, and particularly preferably 1 to 3. The alkyl group may be linear, branched or cyclic, preferably linear or branched, more preferably linear. The alkyl group may have a substituent or may be unsubstituted. Examples of the substituent include the groups described for the substituent T described later. The aryl group represented by R ^{1 N1} and R ^{2 N2} preferably has 6 to 30 carbon atoms, more preferably 6 to 20 carbon atoms, and still more preferably 6 to 12 carbon atoms. The aryl group may have a substituent or may be unsubstituted. Examples of the substituent include the groups described for the substituent T described later.

Substituents represented by Rs ¹⁴¹ and Rs ¹⁴² include the groups described for the substituent T described later, and halogen atoms, alkyl groups, sulfo groups and --SO ₃ M are preferred. M represents an inorganic or organic cation. As the inorganic or organic cation represented by M, any known cation can be employed without limitation. Examples include alkali metal ions (Li ⁺ , Na ⁺ , K ⁺ etc.), ammonium ions, imidazolium ions, pyridinium ions, phosphonium ions and the like. Halogen atoms include fluorine, chlorine, bromine and iodine atoms. The number of carbon atoms in the alkyl group is preferably 1-20, more preferably 1-15, still more preferably 1-8, even more preferably 1-5, and particularly preferably 1-3. The alkyl group may be linear, branched or cyclic, preferably linear or branched, more preferably linear. The alkyl group may have a substituent or may be unsubstituted. Examples of the substituent include the groups described for the substituent T described later.

Each of ns41 and ns42 independently represents an integer of 0 to 5, preferably 0 to 4, more preferably 0 to 3, still more preferably 0 to 2, and even more preferably 0 or 1. When ^ns41 is 2 or more, the plurality of Rs ¹⁴¹ may be the same or different, two of the plurality of Rs ¹⁴¹ may combine to form a ring, is 2 or more, the plurality of Rs ¹⁴² may be the same or different, and two Rs ¹⁴² of the plurality of Rs ¹⁴² may combine to form a ring. The ring formed by combining Rs ¹⁴¹ and the ring formed by combining Rs ¹⁴² may be a hydrocarbon ring or a heterocyclic ring. Moreover, the hydrocarbon ring and the heterocyclic ring may be aromatic rings or non-aromatic rings. Further, the hydrocarbon ring and heterocyclic ring may be monocyclic or condensed. The ring formed by combining Rs ¹⁴¹ and the ring formed by combining Rs ¹⁴² are preferably 5- or 6-membered hydrocarbon or heterocyclic rings, and are preferably 5-membered rings. Alternatively, it is more preferably a 6-membered hydrocarbon ring.

式中、Ｑ^１、Ｑ^４、Ｑ^５、Ｑ^８、Ｑ^１１、Ｑ^１４、Ｑ^１５およびＱ^１８は、それぞれ独立に、炭素原子又は窒素原子を表す；
Ｒｓ^１～Ｒｓ^５、Ｒｓ^１１～Ｒｓ^１５は、それぞれ独立に、水素原子、アルキル基、スルホ基、－ＳＯ_３Ｍ^１又はハロゲン原子を表し、Ｍ^１は無機又は有機のカチオンを表し、Ｒｓ^２とＲｓ^３、Ｒｓ^１２とＲｓ^１３は互いに結合して環を形成してもよい；
Ｒｓ^２１～Ｒｓ^２８、Ｒｓ^３１～Ｒｓ^３８は、それぞれ独立に、水素原子、アルキル基、アルケニル基、アリール基、アラルキル基、アルコキシ基、アリールオキシ基、ヒドロキシ基、－ＮＲ^Ｘ１Ｒ^Ｘ２、スルホ基、－ＳＯ_３Ｍ^２、－ＳＯ_２ＮＲ^Ｘ１Ｒ^Ｘ２、－ＣＯＯＲ^Ｘ３、－ＣＯＮＲ^Ｘ１Ｒ^Ｘ２、ニトロ基、シアノ基又はハロゲン原子を表し、Ｍ^２は無機又は有機のカチオンを表し、Ｒ^Ｘ１～Ｒ^Ｘ３は、それぞれ独立に、水素原子、アルキル基、アリール基、アシル基又は複素環基を表し、Ｒ^Ｘ１とＲ^Ｘ２は互いに結合して環を形成してもよく、Ｒｓ^２１～Ｒｓ^２８、Ｒｓ^３１～Ｒｓ^３８のうち、隣接する基同士は互いに結合して環を形成してもよい；
Ｑ^１が窒素原子の場合、Ｒｓ^２１は存在せず、Ｑ^４が窒素原子の場合、Ｒｓ^２４は存在せず、Ｑ^５が窒素原子の場合、Ｒｓ^２５は存在せず、Ｑ^８が窒素原子の場合、Ｒｓ^２８は存在せず、Ｑ^１１が窒素原子の場合、Ｒｓ^３１は存在せず、Ｑ^１４が窒素原子の場合、Ｒｓ^３４は存在せず、Ｑ^１５が窒素原子の場合、Ｒｓ^３５は存在せず、Ｑ^１８が窒素原子の場合、Ｒｓ^３８は存在しない。The near-infrared absorbing dye represented by formula (SQ1) is preferably a near-infrared absorbing dye represented by formula (SQ3).

wherein Q ¹ , Q ⁴ , Q ⁵ , Q ⁸ , Q ¹¹ , Q ¹⁴ , Q ¹⁵ and Q ¹⁸ each independently represent a carbon atom or a nitrogen atom;
Rs ¹ to Rs ⁵ and Rs ¹¹ to Rs ¹⁵ each independently represent a hydrogen atom, an alkyl group, a sulfo group, —SO ₃ M ¹ or a halogen atom, M ¹ represents an inorganic or organic cation, Rs ² and Rs ³ , Rs ¹² and Rs ¹³ may combine with each other to form a ring;
Rs ²¹ to Rs ²⁸ and Rs ³¹ to Rs ³⁸ are each independently a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, an aralkyl group, an alkoxy group, an aryloxy group, a hydroxy group, —NR ^X1 R ^X2 and a sulfo group. , —SO ₃ M ² , —SO ₂ NR ^X1 R ^X2 , —COOR ^X3 , —CONR ^X1 R ^X2 , a nitro group, a cyano group or a halogen atom, M ² represents an inorganic or organic cation, and R ^X1 to R ^X3 each independently represents a hydrogen atom, an alkyl group, an aryl group, an acyl group or a heterocyclic group; R ^X1 and R ^X2 may ^combine with each other to form a ^ring ; Adjacent groups among Rs ³¹ to Rs ³⁸ may combine with each other to form a ring;
When ^Q1 is a nitrogen atom, ^Rs21 is absent, When ^Q4 is a nitrogen atom, ^Rs24 is absent, When ^Q5 is a nitrogen atom, ^Rs25 is absent, ^Q8 is a nitrogen atom When ^Q11 is a nitrogen atom, ^Rs31 is absent, When ^Q14 is a nitrogen atom, ^Rs34 is ^absent , When ^Q15 is a nitrogen atom, ^Rs35 is absent and Rs ³⁸ is absent when Q ¹⁸ is a nitrogen atom.

Q ¹ , Q ⁴ , Q ⁵ , Q ⁸ , Q ¹¹ , Q ¹⁴ , Q ¹⁵ and Q ¹⁸ are preferably carbon atoms from the viewpoint of various resistances such as heat resistance and light resistance.

The number of carbon atoms in the alkyl group represented by Rs ¹ to Rs ⁵ and Rs ¹¹ to Rs ¹⁵ is preferably 1 to 20, more preferably 1 to 15, still more preferably 1 to 8, even more preferably 1 to 5, and 1 to 3 is particularly preferred. The alkyl group may be linear, branched or cyclic, preferably linear or branched, more preferably linear. The alkyl group may have a substituent or may be unsubstituted. Examples of the substituent include the groups described for the substituent T described later.

In —SO ₃ M ¹ represented by Rs ¹ to Rs ⁵ and Rs ¹¹ to Rs ¹⁵ , known inorganic or organic cations for M ¹ can be employed without limitation. Examples include alkali metal ions (Li ⁺ , Na ⁺ , K ⁺ etc.), ammonium ions, imidazolium ions, pyridinium ions, phosphonium ions and the like.

Halogen atoms represented by Rs ¹ to Rs ⁵ and Rs ¹¹ to Rs ¹⁵ include fluorine, chlorine, bromine and iodine atoms.

^Rs2 and ^Rs3 , and ^Rs12 and ^Rs13 may combine with each other to form a ring. The ring formed may be a hydrocarbon ring or a heterocyclic ring. Moreover, the hydrocarbon ring and the heterocyclic ring may be aromatic rings or non-aromatic rings. Further, the hydrocarbon ring and heterocyclic ring may be monocyclic or condensed. The ring to be formed is preferably a 5- or 6-membered hydrocarbon ring or heterocyclic ring, more preferably a 5- or 6-membered hydrocarbon ring.

From the viewpoint of imparting resistance, Rs ¹ to Rs ⁵ are hydrogen atoms, or ^{four of Rs 1 to Rs 5 are hydrogen} atoms, ^one is a sulfo group, and —SO ₃ M ¹ Alternatively, it is preferably a halogen atom. Among these, it is particularly preferred that Rs ¹ to Rs ⁵ are hydrogen atoms, or four of Rs ¹ to Rs ⁵ are hydrogen atoms and one is a sulfo group or a halogen atom. ^{In addition, from the viewpoint of imparting resistance, Rs 11 to Rs 15 are either hydrogen atoms, or four of Rs 11 to Rs 15 are hydrogen} atoms, one is a sulfo group, and —SO ₃ It is preferably M ¹ or a halogen atom. Among these, it is particularly preferred that Rs ¹¹ to Rs ¹⁵ are hydrogen atoms, or four of Rs ¹¹ to Rs ¹⁵ are hydrogen atoms and one is a sulfo group or a halogen atom.

The number of carbon atoms in the alkyl group and alkoxy group represented by Rs ²¹ to Rs ²⁸ and Rs ³¹ to Rs ³⁸ is preferably 1 to 20, more preferably 1 to 15, still more preferably 1 to 8, even more preferably 1 to 5. , 1 to 3 are particularly preferred. The alkyl group and alkoxy group may be linear, branched or cyclic, preferably linear or branched, more preferably linear. An alkyl group and an alkoxy group may have a substituent or may be unsubstituted. Examples of the substituent include the groups described for the substituent T described later.

The alkenyl groups represented by Rs ²¹ to Rs ²⁸ and Rs ³¹ to Rs ³⁸ preferably have 2 to 20 carbon atoms, more preferably 2 to 12 carbon atoms, and particularly preferably 2 to 8 carbon atoms. The alkenyl group may be linear or branched, preferably linear. The alkenyl group may have a substituent or may be unsubstituted. Examples of the substituent include the groups described for the substituent T described later.

The number of carbon atoms in the aryl group and aryloxy group represented by Rs ²¹ to Rs ²⁸ and Rs ³¹ to Rs ³⁸ is preferably 6-30, more preferably 6-20, even more preferably 6-12. An aryl group and an aryloxy group may have a substituent or may be unsubstituted. Examples of the substituent include the groups described for the substituent T described later.

The number of carbon atoms in the aralkyl groups represented by Rs ²¹ to Rs ²⁸ and Rs ³¹ to Rs ³⁸ is preferably 7-40, more preferably 7-30, even more preferably 7-25.

In —SO ₃ M ² represented by Rs ²¹ to Rs ²⁸ and Rs ³¹ to Rs ³⁸ , known inorganic or organic cations for M ² can be employed without limitation. Examples include alkali metal ions (Li ⁺ , Na ⁺ , K ⁺ etc.), ammonium ions, imidazolium ions, pyridinium ions, phosphonium ions and the like.

Halogen atoms represented by Rs ²¹ to Rs ²⁸ and Rs ³¹ to Rs ³⁸ include fluorine, chlorine, bromine and iodine atoms.

In -NR ^X1 R ^X2 , -SO ₂ NR ^X1 R ^X2 , -COOR ^X3 and -CONR ^X1 R ^X2 represented by Rs ²¹ to Rs ²⁸ and Rs ³¹ to Rs ³⁸ , R ^X1 to R ^X3 are each independently It represents a hydrogen atom, an alkyl group, an aryl group, an acyl group or a heterocyclic group.

The number of carbon atoms in the alkyl groups represented by R ^X1 to R ^X3 is preferably 1 to 20, more preferably 1 to 15, still more preferably 1 to 8, even more preferably 1 to 5, and particularly preferably 1 to 3. The alkyl group may be linear, branched or cyclic, preferably linear or branched, more preferably linear. The alkyl group may have a substituent or may be unsubstituted. Examples of the substituent include the groups described for the substituent T described later.

The aryl group represented by R ^X1 to R ^X3 preferably has 6 to 30 carbon atoms, more preferably 6 to 20 carbon atoms, and still more preferably 6 to 12 carbon atoms. The aryl group may have a substituent or may be unsubstituted. Examples of the substituent include the groups described for the substituent T described later.

The heterocyclic group represented by R ^X1 to R ^X3 is preferably a monocyclic heterocyclic group or a condensed heterocyclic group having 2 to 8 condensed rings, and a monocyclic heterocyclic group or a condensed heterocyclic group having 2 to 4 condensed rings. A cyclic heterocyclic group is more preferred, and a monocyclic heterocyclic group is even more preferred. The number of heteroatoms constituting the ring of the heterocyclic group is preferably 1-3. The heteroatom constituting the ring of the heterocyclic group is preferably a nitrogen atom, an oxygen atom or a sulfur atom, more preferably a nitrogen atom. The heterocyclic group is preferably a 5- or 6-membered ring. The number of carbon atoms constituting the ring of the heterocyclic group is preferably 3-30, more preferably 3-18, and more preferably 3-12. The heterocyclic group may have a substituent or may be unsubstituted. Examples of the substituent include the groups described for the substituent T described later. Specific examples of heterocyclic groups include pyridinyl groups. A pyridinyl group may have a substituent.

Acyl groups represented by R ^X1 to R ^X3 include formyl groups, alkylcarbonyl groups and arylcarbonyl groups. The number of carbon atoms in the alkylcarbonyl group is preferably 2-20, more preferably 2-15, even more preferably 2-8. The number of carbon atoms in the arylcarbonyl group is preferably 7-30, more preferably 7-20, even more preferably 7-12. The alkyl portion of the alkylcarbonyl group and the aryl portion of the arylcarbonyl group may have a substituent or may be unsubstituted. Examples of the substituent include the groups described for the substituent T described later.

In -NR ^X1 R ^X2 , -SO ₂ NR ^X1 R ^X2 and -CONR ^X1 R ^X2 , R ^X1 and R ^X2 may combine with each other to form a ring. The ring formed is preferably a 5- or 6-membered ring.

Adjacent groups among Rs ²¹ to Rs ²⁸ and Rs ³¹ to Rs ³⁸ may combine with each other to form a ring. The ring formed may be a hydrocarbon ring or a heterocyclic ring. Moreover, the hydrocarbon ring and the heterocyclic ring may be aromatic rings or non-aromatic rings. Further, the hydrocarbon ring and heterocyclic ring may be monocyclic or condensed. The ring to be formed is preferably a 5- or 6-membered hydrocarbon ring or heterocyclic ring, more preferably a 5- or 6-membered hydrocarbon ring.

Rs ²¹ to Rs ²⁸ and Rs ³¹ to Rs ³⁸ are each independently a hydrogen atom, an alkyl group, a hydroxy group, —NR ^X1 R ^X2 , a sulfo group, —SO ₃ M ² , —COOR ^X3 , a nitro group or a halogen atom; is preferred, and a hydrogen atom is more preferred.

(substituent T)
Substituent T includes halogen atom, cyano group, nitro group, alkyl group, alkenyl group, alkynyl group, aryl group, heterocyclic group, -ORt ¹ , -CORt ¹ , -COORt ¹ , -OCORt ¹ , -NRt ¹ Rt ² , —NHCORt ¹ , —CONRt ¹ Rt ² , —NHCONRt ¹ Rt ² , —NHCOORt ¹ , —SRt ¹ , —SO ₂ Rt ¹ , —SO ₂ ORt ¹ , —NHSO ₂ Rt ¹ , —SO ₂ NRt ¹ Rt ² and —SO ₃ Mt ¹ . Rt ¹ and Rt ² each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group or a heterocyclic group. Rt ¹ and Rt ² may combine to form a ring. Mt ¹ represents an inorganic or organic cation.

Halogen atoms include fluorine, chlorine, bromine and iodine atoms.
The number of carbon atoms in the alkyl group is preferably 1-20, more preferably 1-15, even more preferably 1-8. The alkyl group may be linear, branched or cyclic, preferably linear or branched.
The alkenyl group preferably has 2 to 20 carbon atoms, more preferably 2 to 12 carbon atoms, and particularly preferably 2 to 8 carbon atoms. Alkenyl groups may be straight or branched.
The alkynyl group preferably has 2 to 40 carbon atoms, more preferably 2 to 30 carbon atoms, and particularly preferably 2 to 25 carbon atoms. Alkynyl groups may be straight or branched.
The number of carbon atoms in the aryl group is preferably 6-30, more preferably 6-20, even more preferably 6-12.
The heterocyclic group is preferably a monocyclic heterocyclic group or a condensed heterocyclic group with 2 to 8 condensed rings, more preferably a monocyclic heterocyclic group or a condensed heterocyclic group with 2 to 4 condensed rings. preferable. The number of heteroatoms constituting the ring of the heterocyclic group is preferably 1-3. A heteroatom constituting the ring of the heterocyclic group is preferably a nitrogen atom, an oxygen atom or a sulfur atom. The heterocyclic group is preferably a 5- or 6-membered ring. The number of carbon atoms constituting the ring of the heterocyclic group is preferably 3-30, more preferably 3-18, and more preferably 3-12.
Alkyl groups, alkenyl groups, alkynyl groups, aryl groups and heterocyclic groups may have a substituent or may be unsubstituted. Examples of the substituent include the substituents described for the substituent T described above.
Inorganic or organic cations represented by Mt ¹ include alkali metal ions (Li ⁺ , Na ⁺ , K ⁺ , etc.), ammonium ions, imidazolium ions, pyridinium ions, phosphonium ions, and the like.

Note that the cations in formula (SQ1) are present in a delocalized manner. For example, in a compound having the structure below, cations are present in a delocalized manner as follows.

The near-infrared absorbing dye represented by formula (SQ1) is preferably a compound having a maximum absorption wavelength in the wavelength range of 700 to 1300 nm, and a compound having a maximum absorption wavelength in the wavelength range of 700 to 1000 nm. more preferred.

Specific examples of the near-infrared absorbing dye represented by formula (SQ1) include compounds having the following structures, compounds described in paragraphs 0224 to 0341 of JP-A-2019-011455, and paragraphs of WO 2018/230486. Examples include compounds described in Nos. 0221-0377.

The content of the near-infrared absorbing dye represented by formula (SQ1) is preferably 1% by mass or more in the total solid content of the resin composition of the present invention, preferably 3% by mass or more, and 5% by mass % or more, and particularly preferably 10 mass % or more. Further, the upper limit of the content of the near-infrared absorbing dye represented by formula (SQ1) is preferably 50% by mass or less, more preferably 45% by mass or less, and 40% by mass or less. More preferred. The resin composition may contain only one type of near-infrared absorbing dye represented by formula (SQ1), or may contain two or more types. When two or more kinds are included, it is preferable that the total amount thereof is within the above range.

式（ＭＣ１）中、環Ｚ^ｍｃ１および環Ｚ^ｍｃ２は、それぞれ独立に含窒素複素環を表し、
Ｒ^ｍｃ１およびＲ^ｍｃ２はそれぞれ独立に単結合または－ＣＲ^Ｙ１Ｒ^Ｙ２－を表し、Ｒ^Ｙ１およびＲ^Ｙ２はそれぞれ独立に水素原子または置換基を表し、
Ｍ^ｍｃ１は１価～３価の遷移金属を表す。<<Metal Complex Represented by Formula (MC1)>>
The resin composition of the present invention contains a metal complex represented by formula (MC1).

In formula (MC1), ring Z ^mc1 and ring Z ^mc2 each independently represent a nitrogen-containing heterocycle,
R ^mc1 and R ^mc2 each independently represent a single bond or -CR ^Y1 R ^Y2 -, R ^Y1 and R ^Y2 each independently represent a hydrogen atom or a substituent,
M ^mc1 represents a monovalent to trivalent transition metal.

The nitrogen-containing heterocyclic ring represented by ring Z ^mc1 and ring Z ^mc2 is preferably a 5- or 6-membered ring. In addition, the nitrogen-containing heterocycle represented by ring Z ^mc1 and ring Z ^mc2 may be either an aromatic ring or a non-aromatic ring, but is preferably an aromatic ring. Ring Z ^mc1 and ring Z ^mc2 are particularly preferably each independently a 5- or 6-membered nitrogen-containing aromatic heterocyclic ring. The nitrogen-containing heterocyclic ring represented by Ring Z ^mc1 and Ring Z ^mc2 may have a substituent. Examples of substituents include halogen atoms, alkyl groups having 1 to 15 carbon atoms (preferably 1 to 8 carbon atoms), aryl groups having 6 to 21 carbon atoms, aralkyl groups having 7 to 21 carbon atoms, 1 to 15 carbon atoms ( preferably an alkoxy group having 1 to 8 carbon atoms, a nitro group, a cyano group, -COOR ¹⁰⁰ , -OCOR ¹⁰⁰ , -NR ¹⁰⁰ COR ¹⁰¹ , -CONR ¹⁰⁰ R ¹⁰¹ , -NR ¹⁰⁰ CONR ¹⁰¹ R ¹⁰² , -SO ₂ R ¹⁰⁰ , -NR ¹⁰⁰ SO ₂ R ¹⁰¹ and -SO ₂ NR ¹⁰¹ SO ₂ R ¹⁰² and the like. R ¹⁰⁰ to R ¹⁰² are each independently a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. In the above alkyl group, aryl group, aralkyl group, alkoxy group, and alkyl group represented by R ¹⁰⁰ to R ¹⁰² , part of the hydrogen atoms may be substituted with halogen atoms (preferably fluorine atoms).

R ^mc1 and R ^mc2 each independently represent a single bond or -CR ^Y1 R ^Y2 -, and R ^Y1 and R ^Y2 each independently represent a hydrogen atom or a substituent. Substituents represented by R ^Y1 and R ^Y2 include those described as examples of the substituents that ring Z ^mc1 and ring Z ^mc2 may have, and alkyl groups and halogen atoms are preferred. R ^Y1 and R ^Y2 are preferably hydrogen atoms. R ^mc1 and R ^mc2 are preferably single bonds.

M ^mc1 represents a monovalent to trivalent transition metal. Transition metals represented by ^Mmc1 include Co, Ni, Cu, Rh, Ag, Ir, Pt and Au, with Cu, Ni and Co being preferred, Ni or Cu being preferred, and Cu being more preferred.

The metal complex represented by the formula (MC1) preferably has a molar extinction coefficient (ε) of 100 L/(mol cm) or less, more preferably 50 L/(mol cm) or less, in light having a wavelength of 430 to 480 nm. is more preferably 20 L/(mol·cm) or less, and particularly preferably 10 L/(mol·cm) or less.

式（Ｌ１）において、環Ｚ^ｍｃ１は含窒素複素環を表し、Ｒ^ｍｃ１は単結合または－ＣＲ^Ｙ１Ｒ^Ｙ２－を表し、Ｒ^Ｙ１およびＲ^Ｙ２はそれぞれ独立に水素原子または置換基を表す。式（Ｌ２）において、環Ｚ^ｍｃ２は含窒素複素環を表し、Ｒ^ｍｃ２は単結合または－ＣＲ^Ｙ１Ｒ^Ｙ２－を表し、Ｒ^Ｙ１およびＲ^Ｙ２はそれぞれ独立に水素原子または置換基を表す。The two ligands of the metal complex represented by formula (MC1) may be the same or different. The metal complex represented by the formula (MC1) is prepared by, for example, adding a salt of ^Mmc1 , a compound represented by the formula (L1), and a compound represented by the formula (L2) into a solvent and dissolving them. , can be prepared by adding an equivalent amount of base. When the two ligands in the metal complex represented by formula (MC1) are the same, the compound represented by formula (L1) and the compound represented by formula (L2) are the same compound.

In formula (L1), ring Z ^mc1 represents a nitrogen-containing heterocyclic ring, R ^mc1 represents a single bond or -CR ^Y1 R ^Y2 -, and R ^Y1 and R ^Y2 each independently represent a hydrogen atom or a substituent. In formula (L2), ring Z ^mc2 represents a nitrogen-containing heterocycle, R ^mc2 represents a single bond or -CR ^Y1 R ^Y2 -, and R ^Y1 and R ^Y2 each independently represent a hydrogen atom or a substituent.

The metal complex represented by Formula (MC1) preferably has a structure represented by Formula (MC2) below.

In formula (MC2), R ^mc11 to R ^mc18 each independently represent a hydrogen atom or a substituent, and M ^mc1 represents a monovalent to trivalent transition metal.

M ^{mc1 in formula (MC2) has the same meaning as M mc1 in} formula (MC1), and the preferred range is also the same.

Examples of substituents represented by R ^mc11 to R ^mc18 include those described as examples of the substituents that ring Z ^mc1 and ring Z ^mc2 may have.

In formula (MC2), at least one of R ^mc11 to R ^mc18 is an alkyl group having 1 to 15 carbon atoms (preferably 1 to 8 carbon atoms) optionally substituted with a halogen atom or substituted with a halogen atom. An alkoxy group having 1 to 15 carbon atoms (preferably 1 to 8 carbon atoms) is preferred. A fluorine atom is preferable as the halogen atom. At least one of R ^mc1 to R ^mc18 is preferably a CF ₃ group or a methoxy group, particularly preferably a CF ₃ group.

At least one of R ^mc11 to R ^mc14 and at least one of R ^mc15 to R ^mc18 are each preferably the above substituents, and R ^mc14 and R ^mc18 are each the above substituents, and the rest are hydrogen. Atoms are more preferred.

Specific examples of the metal complex represented by the formula (MC1) include compounds having the following structures, compounds described in paragraphs 0095 and 0096 of JP-A-2018-028605, compounds described in Examples described later, and the like. mentioned.

The resin composition of the present invention preferably contains two or more metal complexes represented by formula (MC1). According to this aspect, the storage stability of the resin composition can be improved.

The content of the metal complex represented by formula (MC1) is preferably 10 to 150 parts by mass with respect to 100 parts by mass of the near-infrared absorbing dye represented by formula (SQ1). The lower limit is preferably 15 parts by mass or more. The upper limit is preferably 100 parts by mass or less, more preferably 80 parts by mass or less. When the resin composition contains two or more metal complexes represented by formula (MC1), the total amount thereof is preferably within the above range.

<<Resin>>
The resin composition of the present invention contains a resin. The resin is blended, for example, for the purpose of dispersing particles such as pigment in the resin composition and for the purpose of binder. A resin that is mainly used to disperse particles such as pigments is also called a dispersant. However, such uses of the resin are only examples, and the resin can be used for purposes other than such uses.

The weight average molecular weight (Mw) of the resin is preferably 2,000 to 2,000,000. The upper limit is preferably 1,000,000 or less, more preferably 500,000 or less. The lower limit is preferably 3000 or more, more preferably 5000 or more.

Examples of resins include (meth)acrylic resins, epoxy resins, ene-thiol resins, polycarbonate resins, polyether resins, polyarylate resins, polysulfone resins, polyethersulfone resins, polyphenylene resins, polyarylene ether phosphine oxide resins, polyimide resins, Examples include polyamideimide resins, polyolefin resins, cyclic olefin resins, polyester resins, and styrene resins. One of these resins may be used alone, or two or more may be mixed and used. As the cyclic olefin resin, norbornene resin is preferable from the viewpoint of improving heat resistance. Commercially available norbornene resins include, for example, the ARTON series manufactured by JSR Corporation (for example, ARTON F4520). Examples of epoxy resins include epoxy resins that are glycidyl etherified compounds of phenolic compounds, epoxy resins that are glycidyl etherified compounds of various novolak resins, alicyclic epoxy resins, aliphatic epoxy resins, heterocyclic epoxy resins, glycidyl ester-based Epoxy resins, glycidylamine-based epoxy resins, epoxy resins obtained by glycidylating halogenated phenols, condensation products of silicon compounds with epoxy groups and other silicon compounds, polymerizable unsaturated compounds with epoxy groups and other Examples include copolymers with other polymerizable unsaturated compounds. Epoxy resins include Marproof G-0150M, G-0105SA, G-0130SP, G-0250SP, G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, G-01758 (NOF). Co., Ltd., epoxy group-containing polymer) and the like can also be used. Also, resins described in Examples of International Publication No. 2016/088645 can be used as the resin. In addition, when the resin has an ethylenically unsaturated bond-containing group, particularly a (meth)acryloyl group, in the side chain, the main chain and the ethylenically unsaturated bond-containing group are connected via a divalent linking group having an alicyclic structure. Bonding is also preferred.

The resin composition of the present invention preferably contains an alkali-soluble resin. Since the resin composition of the present invention contains an alkali-soluble resin, the developability of the resin composition is improved. can be effectively suppressed. Alkali-soluble resins include resins having acid groups. The acid group includes a carboxyl group, a phosphoric acid group, a sulfo group, a phenolic hydroxy group and the like, and a carboxyl group is preferred. The number of acid groups that the alkali-soluble resin has may be one, or two or more. The alkali-soluble resin can also be used as a dispersant.

The alkali-soluble resin preferably contains a repeating unit having an acid group on its side chain, and more preferably contains 5 to 70 mol % of repeating units having an acid group on its side chain in the total repeating units of the resin. The upper limit of the content of repeating units having an acid group in a side chain is preferably 50 mol % or less, more preferably 30 mol % or less. The lower limit of the content of repeating units having an acid group in the side chain is preferably 10 mol % or more, more preferably 20 mol % or more.

The alkali-soluble resin is also preferably an alkali-soluble resin having a polymerizable group. Polymerizable groups include (meth)allyl groups, (meth)acryloyl groups, and the like. The alkali-soluble resin having a polymerizable group is preferably a resin containing a repeating unit having a polymerizable group in its side chain and a repeating unit having an acid group in its side chain.

The alkali-soluble resin is a monomer component containing a compound represented by the following formula (ED1) and/or a compound represented by the following formula (ED2) (hereinafter, these compounds may be referred to as "ether dimer"). It is also preferred to include repeating units derived from

式（ＥＤ２）中、Ｒは、水素原子または炭素数１～３０の有機基を表す。式（ＥＤ２）の詳細については、特開２０１０－１６８５３９号公報の記載を参酌でき、この内容は本明細書に組み込まれる。In formula (ED1), R ¹ and R ² each independently represent a hydrogen atom or a hydrocarbon group having 1 to 25 carbon atoms which may have a substituent.

In formula (ED2), R represents a hydrogen atom or an organic group having 1 to 30 carbon atoms. For details of the formula (ED2), the description in JP-A-2010-168539 can be referred to, the content of which is incorporated herein.

As a specific example of the ether dimer, for example, the description of paragraph number 0317 of JP-A-2013-029760 can be referred to, and this content is incorporated herein.

式（Ｘ）中、Ｒ_１は、水素原子またはメチル基を表し、Ｒ_２は炭素数２～１０のアルキレン基を表し、Ｒ_３は、水素原子またはベンゼン環を含んでもよい炭素数１～２０のアルキル基を表す。ｎは１～１５の整数を表す。The alkali-soluble resin also preferably contains a repeating unit derived from a compound represented by formula (X) below.

In formula (X), R ₁ represents a hydrogen atom or a methyl group, R ₂ represents an alkylene group having 2 to 10 carbon atoms, R ₃ represents a hydrogen atom or 1 to 20 carbon atoms which may contain a benzene ring. represents an alkyl group of n represents an integer of 1-15.

For the alkali-soluble resin, JP 2012-208494, paragraph numbers 0558 to 0571 (corresponding US Patent Application Publication No. 2012/0235099, paragraph numbers 0685 to 0700), JP 2012-198408 can be referred to, and the contents thereof are incorporated herein.

The acid value of the alkali-soluble resin is preferably 30-500 mgKOH/g. The lower limit is preferably 50 mgKOH/g or more, more preferably 70 mgKOH/g or more. The upper limit is preferably 400 mgKOH/g or less, more preferably 300 mgKOH/g or less, and even more preferably 200 mgKOH/g or less.

Specific examples of alkali-soluble resins include resins having the following structures. In the following structural formulas, Me represents a methyl group.

The resin composition of the present invention also preferably contains a resin having a basic group. Basic groups include amino groups and ammonium bases. The resin having a basic group may further have an acid group in addition to the basic group. A resin having a basic group is preferably used as a dispersant for the near-infrared absorbing dye represented by formula (SQ1). In addition, when the resin having a basic group further has an acid group, such a resin is also an alkali-soluble resin.

Resins having a basic group include resins having a tertiary amino group and a quaternary ammonium base. A resin having a tertiary amino group and a quaternary ammonium base is preferably used as a dispersant for the near-infrared absorbing dye represented by formula (SQ1). The resin having a tertiary amino group and a quaternary ammonium base is preferably a resin having a repeating unit having a tertiary amino group and a repeating unit having a quaternary ammonium base. Moreover, the resin having a tertiary amino group and a quaternary ammonium base may further have a repeating unit having an acid group. The resin having a tertiary amino group and a quaternary ammonium base also preferably has a block structure. The resin having a tertiary amino group and a quaternary ammonium base preferably has an amine value of 10 to 250 mgKOH/g and a quaternary ammonium salt value of 10 to 90 mgKOH/g, and an amine value of 50 to 200 mgKOH. /g, and a quaternary ammonium salt value of 10 to 50 mgKOH/g. The weight average molecular weight (Mw) of the resin having a tertiary amino group and a quaternary ammonium base is preferably 3,000 to 300,000, more preferably 5,000 to 30,000. A resin having a tertiary amino group and a quaternary ammonium group is an ethylenically unsaturated monomer having a tertiary amino group, an ethylenically unsaturated monomer having a quaternary ammonium group, and optionally other ethylenic It can be produced by copolymerizing unsaturated monomers. Examples of ethylenically unsaturated monomers having a tertiary amino group and ethylenically unsaturated monomers having a quaternary ammonium base include those described in paragraphs 0150 to 0170 of WO 2018/230486. , the contents of which are incorporated herein.

Moreover, as the resin having a basic group, a resin containing a nitrogen atom in the main chain is also preferable. This resin is also preferably used as a dispersant for the near-infrared absorbing dye represented by formula (SQ1). Resins containing nitrogen atoms in the main chain (hereinafter also referred to as oligoimine-based resins) include poly-lower alkyleneimine-based repeating units, polyallylamine-based repeating units, polydiallylamine-based repeating units, and metaxylenediamine-epichlorohydrin polycondensates. It preferably contains at least one repeating unit having a nitrogen atom selected from repeating units based on repeating units and polyvinylamine based repeating units. Further, the oligoimine resin is a resin having a repeating unit having a partial structure X having a functional group with a pKa of 14 or less and a repeating unit having a side chain containing an oligomer chain or polymer chain Y having 40 to 10000 atoms. is preferred. The oligoimine resin may further have a repeating unit having an acid group. Regarding the oligoimine resin, the description in paragraphs 0102 to 0166 of JP-A-2012-255128 can be referred to, and the contents thereof are incorporated herein.

The resin composition of the present invention can also contain a resin as a dispersant, and preferably contains a resin as a dispersant. Dispersants include acidic dispersants (acidic resins) and basic dispersants (basic resins). Here, the acidic dispersant (acidic resin) represents a resin in which the amount of acid groups is greater than the amount of basic groups. The acidic dispersant (acidic resin) is preferably a resin in which the amount of acid groups is 70 mol % or more when the total amount of acid groups and basic groups is 100 mol %. A resin consisting only of groups is more preferred. The acid group possessed by the acidic dispersant (acidic resin) is preferably a carboxyl group. Further, a basic dispersant (basic resin) represents a resin in which the amount of basic groups is greater than the amount of acid groups. The basic dispersant (basic resin) is preferably a resin in which the amount of basic groups exceeds 50 mol % when the total amount of acid groups and basic groups is 100 mol %. The dispersant is preferably a resin having a basic group, more preferably a basic dispersant.

Examples of the resin used as the dispersant include the resin having a tertiary amino group and a quaternary ammonium base, the oligoimine resin, and the like. Also, the resin used as the dispersant is preferably a graft resin. Grafted resins include resins having repeating units with grafted chains. The graft resin may further have repeating units with acid groups. Details of the graft resin can be referred to paragraphs 0025 to 0094 of JP-A-2012-255128, the contents of which are incorporated herein. Also, the resin used as the dispersant is preferably a resin containing a repeating unit having an acid group. It is also preferable that the resin used as the dispersant has a structure in which a plurality of polymer chains are bonded to the core portion. Such resins include, for example, dendrimers (including star polymers). Further, specific examples of dendrimers include polymer compounds C-1 to C-31 described in paragraphs 0196 to 0209 of JP-A-2013-043962. Moreover, the alkali-soluble resin mentioned above can also be used as a dispersing agent.

Dispersants are also commercially available, and specific examples thereof include Disperbyk-111 (manufactured by BYK Chemie) and Solsperse 76500 (manufactured by Nippon Lubrizol Co., Ltd.). Dispersants described in paragraphs 0041 to 0130 of JP-A-2014-130338 can also be used, the contents of which are incorporated herein.

The resin content is preferably 1 to 50% by mass based on the total solid content of the resin composition. The lower limit is preferably 5% by mass or more, more preferably 7% by mass or more. The upper limit is preferably 40% by mass or less, more preferably 30% by mass or less.

Further, when the resin composition of the present invention contains a resin having a basic group, the content of the resin having a basic group is, relative to 100 parts by mass of the near-infrared absorbing dye represented by formula (SQ1), 1 to 100 parts by mass is preferred. The upper limit is preferably 80 parts by mass or less, more preferably 60 parts by mass or less. The lower limit is preferably 2.5 parts by mass or more, more preferably 5 parts by mass or more. Further, the content of the resin having a basic group in the resin contained in the resin composition is preferably 10 to 70% by mass, more preferably 20 to 65% by mass, and 25 to 60% by mass. is more preferable.

Moreover, when the resin composition of the present invention contains an alkali-soluble resin, the content of the alkali-soluble resin is preferably 1 to 50% by mass based on the total solid content of the resin composition. The lower limit is preferably 5% by mass or more, more preferably 7% by mass or more. The upper limit is preferably 40% by mass or less, more preferably 30% by mass or less. Further, the content of the alkali-soluble resin in the resin contained in the resin composition is preferably 1 to 100% by mass, more preferably 3 to 100% by mass, and 5 to 100% by mass. is more preferred.

Moreover, when the resin composition of the present invention contains a resin as a dispersant, the content of the resin as a dispersant is preferably 0.1 to 40% by mass based on the total solid content of the resin composition. The upper limit is preferably 20% by mass or less, more preferably 10% by mass or less. The lower limit is preferably 0.5% by mass or more, more preferably 1% by mass or more. Also, the content of the resin as a dispersant is preferably 1 to 100 parts by mass with respect to 100 parts by mass of the near-infrared absorbing dye represented by formula (SQ1). The upper limit is preferably 80 parts by mass or less, more preferably 60 parts by mass or less. The lower limit is preferably 2.5 parts by mass or more, more preferably 5 parts by mass or more.

The resin composition of the present invention may contain only one type of resin, or may contain two or more types. When two or more kinds are included, it is preferable that the total amount thereof is within the above range.

<<Other near-infrared absorbers>>
The resin composition of the present invention can contain a near-infrared absorbing agent other than the near-infrared absorbing dye represented by formula (SQ1). Other near-infrared absorbers include pyrrolopyrrole compounds, cyanine compounds, squarylium compounds, phthalocyanine compounds, naphthalocyanine compounds, quaterrylene compounds, merocyanine compounds, croconium compounds, oxonol compounds, iminium compounds, dithiol compounds, triarylmethane compounds, and pyrromethene. compounds, azomethine compounds, anthraquinone compounds, dibenzofuranone compounds, dithiolene metal complexes, metal oxides, metal borides, and the like.

The content of the other near-infrared absorbing agent is preferably 50 parts by mass or less, more preferably 40 parts by mass or less with respect to 100 parts by mass of the near-infrared absorbing dye represented by formula (SQ1). It is more preferably not more than parts by mass. Further, the total content of the near-infrared absorbing dye represented by the formula (SQ1) and other near-infrared absorbing agents is preferably 1% by mass or more in the total solid content of the resin composition of the present invention, The content is preferably 3% by mass or more, more preferably 5% by mass or more, and particularly preferably 10% by mass or more. The upper limit of the total content is preferably 50% by mass or less, more preferably 45% by mass or less, and even more preferably 40% by mass or less. The near-infrared absorbing layer may contain only one other near-infrared absorbing agent, or may contain two or more kinds thereof. When two or more kinds are included, it is preferable that the total amount thereof is within the above range.

Moreover, it is also preferable that the resin composition of the present invention does not substantially contain other near-infrared absorbing agents. Substantially containing no other near-infrared absorbent means that the content of the other near-infrared absorbent in the total solid content of the resin composition is preferably 0.5% by mass or less, and 0.1 mass % or less, more preferably 0.05% by mass or less, and it is particularly preferable not to contain other near-infrared absorbing agents.

<<Dye derivative>>
The resin composition of the present invention can contain a dye derivative. The dye derivative may be either an acidic dye derivative or a basic dye derivative, but an acidic dye derivative is preferable from the viewpoint of dispersibility of the near-infrared absorbing dye represented by formula (SQ1).

Examples of acidic dye derivatives include compounds in which an acid group is bonded to a dye skeleton. Acid groups include sulfo groups, carboxyl groups, phosphoric acid groups, boronic acid groups, sulfonimide groups, sulfonamide groups and salts thereof. Atoms or atomic groups constituting the salt include alkali metal ions (Li ⁺ , Na ⁺ , K ⁺ etc.), alkaline earth metal ions (Ca ²⁺ , Mg ²⁺ etc.), ammonium ions, imidazolium ions, pyridinium ions, phosphonium ion and the like. The acid group of the acidic dye derivative is preferably a sulfo group, a carboxyl group, a phosphoric acid group, a boronic acid group, a sulfonimide group, a sulfonamide group and salts thereof, and a sulfo group, a carboxyl group, a phosphoric acid group and a sulfonimide group. , a sulfonamide group and salts thereof are more preferred, a sulfo group, a carboxyl group and salts thereof are more preferred, and a sulfo group is particularly preferred.

Basic dye derivatives include compounds in which a basic group is bonded to a dye skeleton. Basic groups include amino groups, pyridinyl groups and salts thereof, salts of ammonium groups, and phthalimidomethyl groups. Atoms or atomic groups constituting salts include hydroxide ions, halogen ions, carboxylate ions, sulfonate ions, and phenoxide ions. The basic group is preferably an amino group, a pyridinyl group and salts thereof, an ammonium group salt, and a phthalimidomethyl group, more preferably an amino group or a phthalimidomethyl group, and still more preferably an amino group.

The dye derivative is preferably a compound represented by Formula (B1). Also, the acidic dye derivative is preferably a compound in which X in Formula (B1) is an acid group. Also, the basic dye derivative is preferably a compound in which X in Formula (B1) is a basic group.

式（Ｂ１）中、Ｐは色素骨格を表し、Ｌは単結合または連結基を表し、Ｘは酸基または塩基性を表し、ｍは１以上の整数を表し、ｎは１以上の整数を表し、ｍが２以上の場合は複数のＬおよびＸは互いに異なっていてもよく、ｎが２以上の場合は複数のＸは互いに異なっていてもよい。

In formula (B1), P represents a dye skeleton, L represents a single bond or a linking group, X represents an acid group or basicity, m represents an integer of 1 or more, and n represents an integer of 1 or more. , when m is 2 or more, a plurality of Ls and Xs may be different from each other, and when n is 2 or more, a plurality of Xs may be different from each other.

The dye skeleton represented by P in formula (B1) includes a squarylium dye skeleton, a pyrrolopyrrole dye skeleton, a diketopyrrolopyrrole dye skeleton, a quinacridone dye skeleton, an anthraquinone dye skeleton, a dianthraquinone dye skeleton, a benzoisoindole dye skeleton, and a thiazine. Indigo dye skeleton, azo dye skeleton, quinophthalone dye skeleton, phthalocyanine dye skeleton, naphthalocyanine dye skeleton, dioxazine dye skeleton, perylene dye skeleton, perinone dye skeleton, benzimidazolone dye skeleton, benzothiazole dye skeleton, benzimidazole dye skeleton and benzo At least one selected from a squarylium dye skeleton, a pyrrolopyrrole dye skeleton, a diketopyrrolopyrrole dye skeleton, a phthalocyanine dye skeleton, a quinacridone dye skeleton, and a benzimidazolone dye skeleton is preferred, and a squarylium dye skeleton is more preferred. preferable.

The linking group represented by L in formula (B1) includes 1 to 100 carbon atoms, 0 to 10 nitrogen atoms, 0 to 50 oxygen atoms, 1 to 200 hydrogen atoms, and 0 to 20 and a group consisting of a sulfur atom. For example, hydrocarbon group, heterocyclic group, -O-, -S-, -CO-, -COO-, -OCO-, -SO ₂ -, -NR ^L -, -NR ^L CO-, -CONR ^L - , —NR ^L SO ₂ —, —SO ₂ NR ^L — and combinations thereof. ^RL represents a hydrogen atom, an alkyl group or an aryl group. The hydrocarbon group may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group. Examples of hydrocarbon groups include alkylene groups, arylene groups, and groups obtained by removing one or more hydrogen atoms from these groups. The number of carbon atoms in the alkylene group is preferably 1-30, more preferably 1-15, even more preferably 1-10. The alkylene group may be linear, branched or cyclic. Moreover, the cyclic alkylene group may be monocyclic or polycyclic. The arylene group preferably has 6 to 18 carbon atoms, more preferably 6 to 14 carbon atoms, and even more preferably 6 to 10 carbon atoms. The heterocyclic group is preferably a monocyclic ring or a condensed ring having 2 to 4 condensed rings. The number of heteroatoms constituting the ring of the heterocyclic group is preferably 1-3. A heteroatom constituting the ring of the heterocyclic group is preferably a nitrogen atom, an oxygen atom or a sulfur atom. The number of carbon atoms constituting the ring of the heterocyclic group is preferably 3-30, more preferably 3-18, and more preferably 3-12. A hydrocarbon group and a heterocyclic group may have a substituent. Examples of the substituent include the groups exemplified for the substituent T described above. The number of carbon atoms in the alkyl group represented by R 1 ^L is preferably 1-20, more preferably 1-15, even more preferably 1-8. The alkyl group may be linear, branched or cyclic, preferably linear or branched, more preferably linear. The alkyl group represented by ^RL may further have a substituent. Examples of the substituent include the substituent T described above. The aryl group represented by R ^L preferably has 6 to 30 carbon atoms, more preferably 6 to 20 carbon atoms, and still more preferably 6 to 12 carbon atoms. The aryl group represented by ^RL may further have a substituent. Examples of the substituent include the substituent T described above.

X represents an acid group or a basic group, preferably an acid group.

上記式中、波線は結合手を表す。The dye derivative is preferably a compound having a maximum absorption wavelength in the wavelength range of 700 to 1200 nm, preferably a compound having a maximum absorption wavelength in the wavelength range of 700 to 1100 nm, and a wavelength range of 700 to 1000 nm. A compound having a wavelength is also preferred. A dye derivative having a maximum absorption wavelength in the above wavelength range can be easily approached with a near-infrared absorbing dye whose π plane spread is represented by the formula (SQ1), and adsorption of the near-infrared absorbing dye represented by the formula (SQ1). properties are improved, and more excellent dispersion stability is likely to be obtained. Also, the dye derivative is preferably a compound having a π-conjugated plane with the same structure as the π-conjugated plane contained in the near-infrared absorbing dye represented by formula (SQ1). Further, the number of π-electrons contained in the π-conjugated plane of the pigment derivative is preferably 8 to 100. The upper limit is preferably 90 or less, more preferably 80 or less. The lower limit is preferably 10 or more, more preferably 12 or more. Further, the dye derivative has a π-conjugated plane containing a partial structure represented by the following formula (SQ-a), or has a π-conjugated plane containing a partial structure represented by the following formula (CR-a). A compound is also preferable, and a compound having a π-conjugated plane containing a partial structure represented by the following formula (SQ-a) is more preferable.

In the above formula, the wavy line represents a bond.

The dye derivative is preferably at least one selected from a compound represented by the following formula (Syn1) and a compound represented by the following formula (Syn2), and is preferably a compound represented by the following formula (Syn1). more preferred.

In formula (Syn1), Rsy ¹ and Rsy ² each independently represent an organic group, L ¹ represents a single bond or a p1+1 valent group, A ¹ represents an acid group or basic, p1 and q1 each Each independently represents an integer of 1 or more. When p1 is ² or more, multiple A1s may be the same or different. When q1 is 2 or more, multiple L ¹ and A ¹ may be the same or different.

In formula (Syn2), Rsy ³ and Rsy ⁴ each independently represent an organic group, L ² represents a single bond or a p2 + monovalent group, A ² represents an acid group or basic, p2 and q2 each Each independently represents an integer of 1 or more. When p2 is ² or more, multiple A2 may be the same or different. When q2 is 2 or more, multiple L ² and A ² may be the same or different.

Examples of the organic groups represented by Rsy ¹ and Rsy ² of formula (Syn1) and the organic groups represented by Rsy ³ and Rsy ⁴ of formula (Syn2) include aryl groups, heteroaryl groups, and the following formulas (R1) to (R7). The group represented by is mentioned.

In formula (R1), R ¹ to R ³ each independently represent a hydrogen atom or a substituent, As ³ represents a heteroaryl group, n _r1 represents an integer of 0 or more, R ¹ and R ² may combine with each other to form a ring, R ¹ and As ³ may combine with each other to form a ring, R ² and R ³ may combine with each other to form a ring Well, when n _r1 is 2 or more, a plurality of R ² and R ³ may be the same or different, and * represents a bond.

In formula (R2), ring Z ¹ represents an aromatic heterocycle or a condensed ring containing an aromatic heterocycle which may have one or more substituents, and ring Z ² represents one or more represents an optionally substituted 4- to 9-membered hydrocarbon ring or heterocyclic ring, and when ring Z ¹ and ring Z ² have multiple substituents, the multiple substituents may be the same; They may be different, and * represents a bond.

In formula (R3), each of R ¹¹ to R ¹⁴ independently represents a hydrogen atom or a substituent, and two adjacent groups among R ¹¹ to R ¹⁴ may be bonded to each other to form a ring. Often ^R20 represents an aryl or heteroaryl group, ^R21 represents a substituent and ^X10 represents CO or _SO2 .

In formula (R4), R ²² and R ²³ each independently represent a hydrogen atom or a substituent, R ²² and R ²³ may combine to form a ring, and X ²⁰ is an oxygen atom , a sulfur atom, NR ²⁴ , a selenium atom or a tellurium atom, R ²⁴ represents a hydrogen atom or a substituent, and when X ²⁰ is NR ²⁴ , R ²⁴ and R ²² are bonded to each other to form a ring n _r2 represents an integer of 0 to 5, and when n _r2 is 2 or more, the plurality of R ²² may be the same or different, and two of the plurality of R ²² R ²² may combine to form a ring, and * represents a bond.

In formula (R5), R ³⁵ to R ³⁸ each independently represent a hydrogen atom or a substituent, and R ³⁵ and R ³⁶ , R ³⁶ and R ³⁷ , and R ³⁷ and R ³⁸ combine to form a ring * represents a bond.

In formula (R6), R ³⁹ to R ⁴⁵ each independently represent a hydrogen atom or a substituent, R ³⁹ and R ⁴⁵ , R ⁴⁰ and R ⁴¹ , R ⁴⁰ and R ⁴² , R ⁴² and R ⁴³ , R ⁴³ and R ⁴⁴ , R ⁴⁴ and R ⁴⁵ may combine with each other to form a ring, and * represents a bond.
In formula (R7), X ²¹ represents a ring structure, R ⁴⁶ to R ⁵⁰ each independently represent a hydrogen atom or a substituent, and R ⁴⁷ and R ⁴⁸ may combine with each other to form a ring. Often * represents a bond.

Examples of the p1+ ¹ -valent group represented by L1 in formula (Syn1) and the p2+1 ^- valent group represented by L2 in formula (Syn2) include the groups described as the linking group represented by L in formula (B1) above. be done.

Specific examples of dye derivatives include compounds having the following structures. In the structural formulas below, Ph is a phenyl group. Further, specific examples of dye derivatives include JP-A-56-118462, JP-A-63-264674, JP-A-01-217077, JP-A-03-009961, JP-A-03-026767. Publications, JP-A-03-153780, JP-A-03-045662, JP-A-04-285669, JP-A-06-145546, JP-A-06-212088, JP-A-06-240158, JP-A-10-030063, JP-A-10-195326, paragraphs 0086 to 0098 of WO 2011/024896, and paragraphs 0063 to 0094 of WO 2012/102399 also include compounds described in , the contents of which are incorporated herein.

The content of the dye derivative is preferably 1 to 50 parts by mass with respect to 100 parts by mass of the near-infrared absorbing dye represented by formula (SQ1). The lower limit is preferably 3 parts by mass or more, more preferably 5 parts by mass or more. The upper limit is preferably 40 parts by mass or less, more preferably 30 parts by mass or less. When the content of the dye derivative is within the above range, the dispersibility of the near-infrared absorbing dye represented by formula (SQ1) can be enhanced, and the storage stability of the resin composition can be improved. Only one kind of pigment derivative may be used, or two or more kinds thereof may be used. When two or more kinds are used, the total amount is preferably within the above range.

<<Chromatic coloring agent>>
The resin composition of the present invention can contain a chromatic colorant. In the present invention, a chromatic colorant means a colorant other than a white colorant and a black colorant. The chromatic colorant is preferably a colorant that absorbs in a wavelength range of 400 nm or more and less than 650 nm.

Chromatic colorants include red colorants, green colorants, blue colorants, yellow colorants, violet colorants and orange colorants. A chromatic colorant may be a pigment or a dye. A pigment and a dye may be used in combination. Moreover, the pigment may be either an inorganic pigment or an organic pigment. As the pigment, an inorganic pigment or a material in which a part of an organic-inorganic pigment is replaced with an organic chromophore can also be used. By replacing inorganic pigments or organic-inorganic pigments with organic chromophores, hue design can be facilitated.

The average primary particle size of the pigment is preferably 1 to 200 nm. The lower limit is preferably 5 nm or more, more preferably 10 nm or more. The upper limit is preferably 180 nm or less, more preferably 150 nm or less, and even more preferably 100 nm or less. When the average primary particle size of the pigment is within the above range, the dispersion stability of the pigment in the resin composition is good. In the present invention, the primary particle diameter of the pigment can be determined from the image photograph obtained by observing the primary particles of the pigment with a transmission electron microscope. Specifically, the projected area of the primary particles of the pigment is obtained, and the corresponding circle equivalent diameter is calculated as the primary particle diameter of the pigment. Further, the average primary particle size in the present invention is the arithmetic mean value of the primary particle sizes of 400 primary particles of the pigment. Further, the primary particles of the pigment refer to independent particles without agglomeration.

The chromatic colorant preferably contains a pigment. The content of the pigment in the chromatic colorant is preferably 50% by mass or more, more preferably 70% by mass or more, still more preferably 80% by mass or more, and 90% by mass or more. is particularly preferred. Examples of pigments include those shown below.

Color Index (C.I.) Pigment Yellow 1,2,3,4,5,6,10,11,12,13,14,15,16,17,18,20,24,31,32,34, 35, 35: 1, 36, 36: 1, 37, 37: 1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125, 126, 127, 128, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 155, 156, 161, 162, 164, 166, 167, 168, 169, 170, 171, 172, 173, 174, 175,176,177,179,180,181,182,185,187,188,193,194,199,213,214,215,228,231,232 (methine), 233 (quinoline), etc. , yellow pigment),
C. I. Pigment Orange 2, 5, 13, 16, 17: 1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, 73, etc. (above, orange pigment),
C. I. Pigment Red 1, 2, 3, 4, 5, 6, 7, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48: 1, 48: 2, 48: 3, 48: 4, 49, 49:1, 49:2, 52:1, 52:2, 53:1, 57:1, 60:1, 63:1, 66, 67, 81:1, 81:2, 81:3, 83,88,90,105,112,119,122,123,144,146,149,150,155,166,168,169,170,171,172,175,176,177,178,179,184, 185, 187, 188, 190, 200, 202, 206, 207, 208, 209, 210, 216, 220, 224, 226, 242, 246, 254, 255, 264, 270, 272, 279, 294 (xanthene , Organo Ultramarine, Bluish Red), 295 (azo type), 296 (azo type), etc. (above, red pigment),
C. I. Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, etc. (above, green pigment),
C. I. Pigment Violet 1, 19, 23, 27, 32, 37, 42, 60 (triarylmethane-based), 61 (xanthene-based), etc. (purple pigments),
C. I. Pigment Blue 1,2,15,15:1,15:2,15:3,15:4,15:6,16,22,29,60,64,66,79,80,87 (monoazo), 88 (methine-based), etc. (above, blue pigments);

Further, as a green pigment, a halogenated zinc phthalocyanine pigment having an average number of halogen atoms of 10 to 14, an average number of bromine atoms of 8 to 12, and an average number of chlorine atoms of 2 to 5 per molecule. can also be used. Specific examples include compounds described in International Publication No. 2015/118720. Further, as the green pigment, the compound described in Chinese Patent Application No. 106909027, the phthalocyanine compound having a phosphoric acid ester as a ligand described in WO2012/102395, and the like can also be used.

Also, an aluminum phthalocyanine compound having a phosphorus atom can be used as the blue pigment. Specific examples include compounds described in paragraph numbers 0022 to 0030 of JP-A-2012-247591 and paragraph number 0047 of JP-A-2011-157478.

Further, as the yellow pigment, pigments described in JP-A-2008-074985, compounds described in JP-A-2008-074987, quinophthalone compounds described in JP-A-2013-061622, particularly A quinophthalone compound described in JP-A-2013-181015, a coloring agent described in JP-A-2014-085565, a pigment described in JP-A-2016-145282, JP-A-2017-201003. Pigments described in JP-A-2017-197719, pigments described in JP-A-2017-171912, paragraph numbers 0011-0062, 0137-0276, JP-A-2017-171913 The pigments described in paragraph numbers 0010 to 0062 and 0138 to 0295 of the publication, the pigments described in paragraph numbers 0011 to 0062 and 0139 to 0190 of JP 2017-171914, JP 2017-171915 Pigments described in paragraph numbers 0010 to 0065, 0142 to 0222 of, quinophthalone compounds described in JP-A-2017-197640, quinophthalone-based pigments described in JP-A-2018-040835, JP-A Pigments described in 2018-203798, pigments described in JP-A-2018-062578, quinophthalone-based yellow pigments described in JP-A-2018-155881, JP-A-2018-062644 , quinophthalone compounds described in Japanese Patent No. 6432077, and pigments described in Japanese Patent No. 6443711 can also be used.

Further, as a yellow pigment, compounds described in JP-A-2018-062644 can also be used. This compound can also be used as a pigment derivative.

As red pigments, diketopyrrolopyrrole compounds in which at least one bromine atom is substituted in the structure described in JP-A-2017-201384, diketopyrrolopyrrole compounds described in paragraphs 0016 to 0022 of Japanese Patent No. 6248838, The diketopyrrolopyrrole compounds described in International Publication No. 2012/102399, the diketopyrrolopyrrole compounds described in International Publication No. 2012/117965, and the naphthol azo compounds described in JP-A-2012-229344 can also be used. can. Also, as a red pigment, a compound having a structure in which an aromatic ring group in which a group having an oxygen atom, a sulfur atom or a nitrogen atom is bonded to an aromatic ring is bonded to a diketopyrrolopyrrole skeleton may be used. can.

In the present invention, a dye can also be used as the coloring material. The dye is not particularly limited, and known dyes can be used. For example, pyrazole azo, anilinoazo, triarylmethane, anthraquinone, anthrapyridone, benzylidene, oxonol, pyrazolotriazole azo, pyridone azo, cyanine, phenothiazine, pyrrolopyrazole azomethine, xanthene, Phthalocyanine-based, benzopyran-based, indigo-based, and pyrromethene-based dyes can be used. Further, thiazole compounds described in JP-A-2012-158649, azo compounds described in JP-A-2011-184493, and azo compounds described in JP-A-2011-145540 can also be preferably used. Further, as the yellow dye, quinophthalone compounds described in paragraph numbers 0011 to 0034 of JP-A-2013-054339, quinophthalone compounds described in paragraph numbers 0013-0058 of JP-A-2014-026228, and the like can also be used.

When the resin composition of the present invention contains a chromatic colorant, the content of the chromatic colorant is preferably 1 to 50% by mass based on the total solid content of the resin composition of the present invention. When the resin composition of the present invention contains two or more chromatic colorants, the total amount thereof is preferably within the above range.

<<coloring material that transmits near-infrared rays and blocks visible light>>
The resin composition of the present invention is a coloring material that transmits near-infrared rays (light with a wavelength in the near-infrared region) and blocks visible light (light with a wavelength in the visible region) (hereinafter also referred to as a coloring material that blocks visible light). ) can also be included. A resin composition containing a colorant that blocks visible light is preferably used as a resin composition for forming a near-infrared transmission filter.

In the present invention, the colorant that blocks visible light is preferably a colorant that absorbs light in the wavelength range from violet to red. In the present invention, the coloring material that blocks visible light is preferably a coloring material that blocks light in the wavelength range of 450 to 650 nm. Further, the coloring material that blocks visible light is preferably a coloring material that transmits light with a wavelength of 900 to 1300 nm. In the present invention, the colorant that blocks visible light preferably satisfies at least one of the following requirements (A) and (B).
(A): Two or more chromatic colorants are included, and a combination of two or more chromatic colorants forms a black color.
(B): Contains an organic black colorant.

The chromatic colorants include those described above. Examples of organic black colorants include bisbenzofuranone compounds, azomethine compounds, perylene compounds, and azo compounds, with bisbenzofuranone compounds and perylene compounds being preferred. Examples of the bisbenzofuranone compound include compounds described in JP-T-2010-534726, JP-T-2012-515233, JP-T-2012-515234, etc. For example, "Irgaphor Black" manufactured by BASF Corporation. Available. Examples of perylene compounds include compounds described in paragraphs 0016 to 0020 of JP-A-2017-226821, C.I. I. Pigment Black 31, 32 and the like. Examples of the azomethine compound include compounds described in JP-A-01-170601, JP-A-02-034664, and the like.

When two or more chromatic colorants are combined to form a black color, examples of combinations of chromatic colorants include the following.
(1) An embodiment containing a yellow colorant, a blue colorant, a purple colorant and a red colorant.
(2) An embodiment containing a yellow colorant, a blue colorant and a red colorant.
(3) An embodiment containing a yellow colorant, a purple colorant and a red colorant.
(4) An embodiment containing a yellow colorant and a purple colorant.
(5) An embodiment containing a green colorant, a blue colorant, a purple colorant and a red colorant.
(6) An embodiment containing a purple colorant and an orange colorant.
(7) An embodiment containing a green colorant, a purple colorant and a red colorant.
(8) An embodiment containing a green colorant and a red colorant.

When the resin composition of the present invention contains a coloring material that blocks visible light, the content of the coloring material that blocks visible light is preferably 1 to 50% by mass based on the total solid content of the resin composition.

<<polymerizable compound>>
The resin composition of the present invention preferably contains a polymerizable compound. As the polymerizable compound, a compound that can be polymerized by the action of radicals is preferred. That is, the polymerizable compound is preferably a radically polymerizable compound. The polymerizable compound is preferably a compound having one or more ethylenically unsaturated bond-containing groups, more preferably a compound having two or more ethylenically unsaturated bond-containing groups, containing an ethylenically unsaturated bond Compounds having 3 or more groups are more preferred. The upper limit of the number of ethylenically unsaturated bond-containing groups is, for example, preferably 15 or less, more preferably 6 or less. Examples of the ethylenically unsaturated bond-containing group include a vinyl group, a styrene group, a (meth)allyl group, and a (meth)acryloyl group, with a (meth)acryloyl group being preferred. The polymerizable compound is preferably a 3- to 15-functional (meth)acrylate compound, more preferably a 3- to 6-functional (meth)acrylate compound. Specific examples of the polymerizable compound include paragraph numbers 0095 to 0108 of JP-A-2009-288705, paragraph 0227 of JP-A-2013-029760, paragraph numbers 0254-0257 of JP-A-2008-292970, and JP-A-2008-292970. 2013-253224, paragraphs 0034 to 0038, JP 2012-208494, paragraph 0477, JP 2017-048367, JP 6057891, JP 6031807, JP 2017-194662 Compounds described in publications are included, the contents of which are incorporated herein.

The polymerizable compound may be in the form of either a monomer or a polymer, but a monomer is preferred. The monomer type polymerizable compound preferably has a molecular weight of 100 to 3,000. The upper limit is preferably 2000 or less, more preferably 1500 or less. The lower limit is preferably 150 or more, more preferably 250 or more. Also, the polymerizable compound is preferably a compound having substantially no molecular weight distribution. Here, the compound having substantially no molecular weight distribution is preferably a compound having a degree of dispersion (weight average molecular weight (Mw)/number average molecular weight (Mn)) of 1.0 to 1.5. 1.0 to 1.3 is more preferable.

As the polymerizable compound, dipentaerythritol triacrylate (commercially available as KAYARAD D-330; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetraacrylate (commercially available as KAYARAD D-320; Nippon Kayaku Co., Ltd. ), dipentaerythritol penta (meth) acrylate (commercially available as KAYARAD D-310; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol hexa (meth) acrylate (commercially available as KAYARAD DPHA; Nippon Kayaku Co., Ltd., NK Ester A-DPH-12E; Shin-Nakamura Chemical Co., Ltd.), and structures in which these (meth)acryloyl groups are bonded via ethylene glycol and / or propylene glycol residues Compounds (eg SR454, SR499, commercially available from Sartomer) are preferred. Further, as the polymerizable compound, diglycerin EO (ethylene oxide) modified (meth) acrylate (commercially available M-460; manufactured by Toagosei), pentaerythritol tetraacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., NK Ester A -TMMT), 1,6-hexanediol diacrylate (manufactured by Nippon Kayaku Co., Ltd., KAYARAD HDDA), RP-1040 (manufactured by Nippon Kayaku Co., Ltd.), Aronix TO-2349 (manufactured by Toagosei Co., Ltd.) , NK Oligo UA-7200 (manufactured by Shin-Nakamura Chemical Co., Ltd.), 8UH-1006, 8UH-1012 (manufactured by Taisei Fine Chemical Co., Ltd.), light acrylate POB-A0 (manufactured by Kyoeisha Chemical Co., Ltd.), etc. can also

In addition, as the polymerizable compound, trimethylolpropane tri(meth)acrylate, trimethylolpropane propyleneoxy-modified tri(meth)acrylate, trimethylolpropane ethyleneoxy-modified tri(meth)acrylate, isocyanuric acid ethyleneoxy-modified tri(meth)acrylate. , pentaerythritol tri(meth)acrylate and the like are also preferably used. Commercial products of trifunctional (meth)acrylate compounds include Aronix M-309, M-310, M-321, M-350, M-360, M-313, M-315, M-306 and M-305. , M-303, M-452, M-450 (manufactured by Toagosei Co., Ltd.), NK Ester A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A-TMM-3L, A -TMM-3LM-N, A-TMPT, TMPT (manufactured by Shin-Nakamura Chemical Co., Ltd.), KAYARAD GPO-303, TMPTA, THE-330, TPA-330, PET-30 (manufactured by Nippon Kayaku Co., Ltd.) etc.

A compound having an acid group can also be used as the polymerizable compound. By using a polymerizable compound having an acid group, the polymerizable compound in the unexposed area is easily removed during development, and generation of development residue can be suppressed. The acid group includes a carboxyl group, a sulfo group, a phosphoric acid group and the like, and a carboxyl group is preferred. Commercially available polymerizable compounds having an acid group include Aronix M-305, M-510, M-520 and Aronix TO-2349 (manufactured by Toagosei Co., Ltd.). The acid value of the polymerizable compound having an acid group is preferably 0.1-40 mgKOH/g, more preferably 5-30 mgKOH/g.

A compound having a caprolactone structure can also be used as the polymerizable compound. Polymerizable compounds having a caprolactone structure are commercially available from Nippon Kayaku Co., Ltd. under the KAYARAD DPCA series, including DPCA-20, DPCA-30, DPCA-60, DPCA-120, and the like.

A polymerizable compound having an alkyleneoxy group can also be used as the polymerizable compound. The polymerizable compound having an alkyleneoxy group is preferably a polymerizable compound having an ethyleneoxy group and / or a propyleneoxy group, more preferably a polymerizable compound having an ethyleneoxy group, and 3 to 4 having 4 to 20 ethyleneoxy groups. A hexafunctional (meth)acrylate compound is more preferred. Commercially available polymerizable compounds having an alkyleneoxy group include, for example, SR-494, a tetrafunctional (meth)acrylate having four ethyleneoxy groups and a trifunctional (meth)acrylate having three isobutyleneoxy groups manufactured by Sartomer Co., Ltd. KAYARAD TPA-330, which is an acrylate, and the like.

A polymerizable compound having a fluorene skeleton can also be used as the polymerizable compound. Commercially available polymerizable compounds having a fluorene skeleton include Ogsol EA-0200 and EA-0300 (manufactured by Osaka Gas Chemicals Co., Ltd., (meth)acrylate monomers having a fluorene skeleton).

As the polymerizable compound, it is also preferable to use a compound that does not substantially contain environmental regulation substances such as toluene. Commercially available products of such compounds include KAYARAD DPHA LT and KAYARAD DPEA-12 LT (manufactured by Nippon Kayaku Co., Ltd.).

Examples of the polymerizable compound include urethane acrylates such as those described in JP-B-48-041708, JP-A-51-037193, JP-B-02-032293, JP-B-02-016765, Urethane compounds having an ethylene oxide skeleton described in JP-B-58-049860, JP-B-56-017654, JP-B-62-039417 and JP-B-62-039418 are also suitable. It is also preferable to use a polymerizable compound having an amino structure or a sulfide structure in the molecule described in JP-A-63-277653, JP-A-63-260909 and JP-A-01-105238. Further, the polymerizable compound includes UA-7200 (manufactured by Shin-Nakamura Chemical Co., Ltd.), DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA-306I, AH-600, Commercially available products such as T-600, AI-600, LINC-202UA (manufactured by Kyoeisha Chemical Co., Ltd.) can also be used.

The content of the polymerizable compound is preferably 0.1 to 40% by mass based on the total solid content of the resin composition. The lower limit is preferably 0.5% by mass or more, more preferably 1% by mass or more. The upper limit is preferably 30% by mass or less, more preferably 20% by mass or less. The resin composition may contain only one type of polymerizable compound, or may contain two or more types. When two or more kinds are included, it is preferable that the total amount thereof is within the above range.

<<Photoinitiator>>
When the resin composition of the present invention contains a polymerizable compound, the resin composition of the present invention preferably further contains a photopolymerization initiator. The photopolymerization initiator is not particularly limited and can be appropriately selected from known photopolymerization initiators. For example, compounds having photosensitivity to light in the ultraviolet region to the visible region are preferred. The photopolymerization initiator is preferably a photoradical polymerization initiator.

Examples of photopolymerization initiators include halogenated hydrocarbon derivatives (e.g., compounds having a triazine skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazoles, oxime compounds, organic peroxides, thio compounds. , ketone compounds, aromatic onium salts, α-hydroxyketone compounds, α-aminoketone compounds, and the like. From the viewpoint of exposure sensitivity, photopolymerization initiators include trihalomethyltriazine compounds, benzyldimethylketal compounds, α-hydroxyketone compounds, α-aminoketone compounds, acylphosphine compounds, phosphine oxide compounds, metallocene compounds, oxime compounds, and triarylimidazoles. dimers, onium compounds, benzothiazole compounds, benzophenone compounds, acetophenone compounds, cyclopentadiene-benzene-iron complexes, halomethyloxadiazole compounds and 3-aryl-substituted coumarin compounds, oxime compounds, α-hydroxyketone compounds , α-aminoketone compounds, and acylphosphine compounds, more preferably oxime compounds. Examples of the photopolymerization initiator include compounds described in paragraphs 0065 to 0111 of JP-A-2014-130173 and Japanese Patent No. 6301489, the contents of which are incorporated herein.

Commercially available α-hydroxyketone compounds include Omnirad 184, Omnirad 1173, Omnirad 2959, and Omnirad 127 (manufactured by IGM Resins B.V.). Commercially available α-aminoketone compounds include Omnirad 907, Omnirad 369, Omnirad 369E, and Omnirad 379EG (manufactured by IGM Resins B.V.). Commercially available acylphosphine compounds include Omnirad 819 and Omnirad TPO (manufactured by IGM Resins B.V.).

Examples of the oxime compound include compounds described in JP-A-2001-233842, compounds described in JP-A-2000-080068, compounds described in JP-A-2006-342166, J. Am. C. S. Compounds described in Perkin II (1979, pp. 1653-1660), J. Am. C. S. compounds described in Perkin II (1979, pp.156-162), compounds described in Journal of Photopolymer Science and Technology (1995, pp.202-232), compounds described in JP-A-2000-066385, Compounds described in JP-A-2000-080068, compounds described in JP-A-2004-534797, compounds described in JP-A-2006-342166, compounds described in JP-A-2017-019766, Patent No. Compounds described in WO 2015/152153, compounds described in WO 2017/051680, compounds described in JP 2017-198865, WO 2017/164127 Compounds described in paragraph numbers 0025 to 0038 of No. 2013, compounds described in International Publication No. 2013/167515, and the like. Specific examples of oxime compounds include 3-benzoyloxyiminobutane-2-one, 3-acetoxyiminobutane-2-one, 3-propionyloxyiminobutane-2-one, 2-acetoxyiminopentane-3-one, 2-acetoxyimino-1-phenylpropan-1-one, 2-benzoyloxyimino-1-phenylpropan-1-one, 3-(4-toluenesulfonyloxy)iminobutan-2-one, and 2-ethoxycarbonyloxy and imino-1-phenylpropan-1-one. Commercially available products include IRGACURE-OXE01, IRGACURE-OXE02, IRGACURE-OXE03, IRGACURE-OXE04 (manufactured by BASF), TR-PBG-304 (manufactured by Changzhou Yuan Electronics New Materials Co., Ltd.), and Adeka Optomer N-1919. (manufactured by ADEKA Corporation, photopolymerization initiator 2 described in JP-A-2012-014052). As the oxime compound, it is also preferable to use a compound having no coloring property or a compound having high transparency and resistance to discoloration. Commercially available products include ADEKA Arkles NCI-730, NCI-831, and NCI-930 (manufactured by ADEKA Corporation).

In the present invention, an oxime compound having a fluorene ring can also be used as a photopolymerization initiator. Specific examples of oxime compounds having a fluorene ring include compounds described in JP-A-2014-137466.

As a photopolymerization initiator, an oxime compound having a skeleton in which at least one benzene ring of a carbazole ring is a naphthalene ring can also be used. Specific examples of such oxime compounds include compounds described in WO2013/083505.

In the present invention, an oxime compound having a fluorine atom can also be used as a photopolymerization initiator. Specific examples of the oxime compound having a fluorine atom include compounds described in JP-A-2010-262028, compounds 24, 36 to 40 described in JP-A-2014-500852, and JP-A-2013-164471. and the compound (C-3) of.

In the present invention, an oxime compound having a nitro group can be used as a photopolymerization initiator. The oxime compound having a nitro group is also preferably a dimer. Specific examples of the oxime compound having a nitro group include the compounds described in paragraph numbers 0031 to 0047 of JP-A-2013-114249 and paragraph numbers 0008-0012 and 0070-0079 of JP-A-2014-137466; Compounds described in paragraphs 0007 to 0025 of Japanese Patent No. 4223071 and ADEKA Arkles NCI-831 (manufactured by ADEKA Corporation) can be mentioned.

In the present invention, an oxime compound having a benzofuran skeleton can also be used as a photopolymerization initiator. Specific examples include OE-01 to OE-75 described in WO 2015/036910.

Specific examples of oxime compounds preferably used in the present invention are shown below, but the present invention is not limited thereto.

The oxime compound is preferably a compound having a maximum absorption wavelength in the wavelength range of 350 to 500 nm, more preferably a compound having a maximum absorption wavelength in the wavelength range of 360 to 480 nm. Further, the molar extinction coefficient of the oxime compound at a wavelength of 365 nm or a wavelength of 405 nm is preferably high from the viewpoint of sensitivity, more preferably 1000 to 300000, further preferably 2000 to 300000, even more preferably 5000 to 200000. It is particularly preferred to have The molar extinction coefficient of a compound can be measured using known methods. For example, it is preferably measured at a concentration of 0.01 g/L using an ethyl acetate solvent with a spectrophotometer (Cary-5 spectrophotometer manufactured by Varian).

As the photopolymerization initiator, a bifunctional or trifunctional or higher functional radical photopolymerization initiator may be used. By using such a radical photopolymerization initiator, two or more radicals are generated from one molecule of the radical photopolymerization initiator, so good sensitivity can be obtained. In addition, when a compound having an asymmetric structure is used, the crystallinity is lowered, the solubility in a solvent or the like is improved, and precipitation becomes difficult over time, and the stability over time of the resin composition can be improved. . Specific examples of bifunctional or trifunctional or higher photoradical polymerization initiators include Japanese Patent Publication No. 2010-527339, Japanese Patent Publication No. 2011-524436, International Publication No. 2015/004565, and Japanese Patent Publication No. 2016-532675. Paragraph numbers 0407 to 0412, dimers of oxime compounds described in paragraph numbers 0039 to 0055 of International Publication No. 2017/033680, compound (E) and compounds described in JP-A-2013-522445 ( G), Cmpd1 to 7 described in International Publication No. 2016/034963, oxime ester photoinitiators described in paragraph number 0007 of JP 2017-523465, JP 2017-167399 Photoinitiators described in paragraph numbers 0020 to 0033, photoinitiators (A) described in paragraph numbers 0017 to 0026 of JP-A-2017-151342, and the like.

The photopolymerization initiator also preferably contains an oxime compound and an α-aminoketone compound. By using both together, the developability is improved, and it is easy to form a pattern excellent in rectangularity. When an oxime compound and an α-aminoketone compound are used together, the α-aminoketone compound is preferably 50 to 600 parts by mass, more preferably 150 to 400 parts by mass, per 100 parts by mass of the oxime compound.

The content of the photopolymerization initiator is preferably 0.1 to 40% by mass, more preferably 0.5 to 30% by mass, still more preferably 1 to 20% by mass, based on the total solid content of the resin composition. The resin composition may contain only one type of photopolymerization initiator, or may contain two or more types. When two or more kinds are included, it is preferable that the total amount thereof is within the above range.

<<epoxy compound>>
The resin composition of the present invention can contain a compound having an epoxy group (hereinafter also referred to as an epoxy compound). Examples of epoxy compounds include monofunctional or polyfunctional glycidyl ether compounds, polyfunctional aliphatic glycidyl ether compounds, compounds having an alicyclic epoxy group, and the like. The epoxy compound is preferably a compound having 1 to 100 epoxy groups per molecule. The upper limit of the number of epoxy groups may be 10 or less, or 5 or less. The lower limit is preferably two or more. The epoxy compound may be a low-molecular compound (eg, molecular weight less than 1000) or a macromolecule (eg, molecular weight 1000 or more, weight average molecular weight 1000 or more in the case of polymers). The weight average molecular weight of the epoxy compound is preferably 2,000 to 100,000. The upper limit of the weight average molecular weight is preferably 10,000 or less, more preferably 5,000 or less, and even more preferably 3,000 or less.

Commercially available epoxy compounds include EHPE3150 (manufactured by Daicel Corporation), EPICLON N-695 (manufactured by DIC Corporation), and ADEKA GLYCIROL ED-505 (manufactured by ADEKA Corporation). In addition, as the epoxy compound, paragraph numbers 0034 to 0036 of JP-A-2013-011869, paragraph numbers 0147-0156 of JP-A-2014-043556, and paragraph numbers 0085-0092 of JP-A-2014-089408 are described. It is also possible to use the compounds described.

The content of the epoxy compound is preferably 0.1 to 40% by mass based on the total solid content of the resin composition. The lower limit is preferably 0.5% by mass or more, more preferably 1% by mass or more. The upper limit is preferably 30% by mass or less, more preferably 20% by mass or less. Further, when the resin composition contains a polymerizable compound and an epoxy compound, the mass ratio of the two is preferably polymerizable compound:epoxy compound=100:1 to 100:400, more preferably 100:1 to 100:100. preferable. The resin composition may contain only one type of epoxy compound, or may contain two or more types. When two or more kinds are included, it is preferable that the total amount thereof is within the above range.

<<epoxy curing agent>>
When the resin composition of the present invention contains an epoxy compound, the resin composition of the present invention preferably further contains an epoxy curing agent. Examples of epoxy curing agents include amine-based compounds, acid anhydride-based compounds, amide-based compounds, phenol-based compounds, polyvalent carboxylic acids, and thiol compounds. From the viewpoint of heat resistance and transparency of the cured product, the epoxy curing agent is preferably a polyvalent carboxylic acid, and most preferably a compound having two or more carboxylic acid anhydride groups in the molecule. Specific examples of epoxy curing agents include butanedioic acid and the like. The epoxy curing agent can also use compounds described in paragraphs 0072 to 0078 of JP-A-2016-075720, the contents of which are incorporated herein. The content of the epoxy curing agent is preferably 0.01 to 20 parts by mass, more preferably 0.01 to 10 parts by mass, and even more preferably 0.1 to 6.0 parts by mass with respect to 100 parts by mass of the epoxy compound. . The resin composition may contain only one type of epoxy curing agent, or may contain two or more types. When two or more kinds are included, it is preferable that the total amount thereof is within the above range.

<<Solvent>>
The resin composition of the present invention preferably contains a solvent. An organic solvent is preferable as the solvent. Examples of organic solvents include ester-based solvents, ketone-based solvents, alcohol-based solvents, amide-based solvents, ether-based solvents, and hydrocarbon-based solvents. For these details, reference can be made to paragraph 0223 of WO2015/166779, the content of which is incorporated herein. Ester-based solvents substituted with cyclic alkyl groups and ketone-based solvents substituted with cyclic alkyl groups can also be preferably used. Specific examples of organic solvents include polyethylene glycol monomethyl ether, dichloromethane, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2 -heptanone, cyclohexanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate and the like. However, aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.) as organic solvents may be better reduced for environmental reasons (for example, 50 mass ppm (parts per million) or less, 10 mass ppm or less, or 1 mass ppm or less)

In the present invention, it is preferable to use an organic solvent with a low metal content, and the metal content of the organic solvent is preferably, for example, 10 mass ppb (parts per billion) or less. If necessary, a mass ppt (parts per trillion) level organic solvent may be used, and such an organic solvent is provided, for example, by Toyo Gosei Co., Ltd. (Chemical Daily, November 13, 2015).

Methods for removing impurities such as metals from organic solvents include, for example, distillation (molecular distillation, thin film distillation, etc.) and filtration using a filter. The filter pore size of the filter used for filtration is preferably 10 μm or less, more preferably 5 μm or less, and even more preferably 3 μm or less. The material of the filter is preferably polytetrafluoroethylene, polyethylene or nylon.

The organic solvent may contain isomers (compounds having the same number of atoms but different structures). Moreover, only one isomer may be contained, or a plurality of isomers may be contained.

The content of peroxide in the organic solvent is preferably 0.8 mmol/L or less, and more preferably substantially free of peroxide.

The content of the solvent is preferably 10 to 97% by mass with respect to the total amount of the resin composition. The lower limit is preferably 30% by mass or more, more preferably 40% by mass or more, even more preferably 50% by mass or more, even more preferably 60% by mass or more, and 70% by mass. It is particularly preferable that it is above. The upper limit is preferably 96% by mass or less, more preferably 95% by mass or less. The resin composition may contain only one type of solvent, or may contain two or more types. When two or more kinds are included, it is preferable that the total amount thereof is within the above range.

<<polymerization inhibitor>>
The resin composition of the present invention can contain a polymerization inhibitor. Polymerization inhibitors include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4′-thiobis(3-methyl-6-tert-butylphenol), 2,2′-methylenebis(4-methyl-6-t-butylphenol), N-nitrosophenylhydroxyamine salts (ammonium salts, cerous salts, etc.), and p-methoxyphenol is preferred. The content of the polymerization inhibitor is preferably 0.0001 to 5% by mass based on the total solid content of the resin composition. The resin composition may contain only one type of polymerization inhibitor, or may contain two or more types. When two or more kinds are included, it is preferable that the total amount thereof is within the above range.

<<Silane coupling agent>>
The resin composition of the present invention can contain a silane coupling agent. In the present invention, a silane coupling agent means a silane compound having a hydrolyzable group and other functional groups. Further, the hydrolyzable group refers to a substituent that is directly bonded to a silicon atom and capable of forming a siloxane bond by at least one of hydrolysis reaction and condensation reaction. Hydrolyzable groups include, for example, halogen atoms, alkoxy groups, acyloxy groups and the like, with alkoxy groups being preferred. That is, the silane coupling agent is preferably a compound having an alkoxysilyl group. Examples of functional groups other than hydrolyzable groups include vinyl group, styryl group, (meth)acryloyl group, mercapto group, epoxy group, oxetanyl group, amino group, ureido group, sulfide group, isocyanate group, and phenyl group. etc., and (meth)acryloyl groups and epoxy groups are preferred. The silane coupling agent includes compounds described in paragraph numbers 0018 to 0036 of JP-A-2009-288703 and compounds described in paragraph numbers 0056-0066 of JP-A-2009-242604. incorporated into the specification. The content of the silane coupling agent is preferably 0.01 to 15.0% by mass, more preferably 0.05 to 10.0% by mass, based on the total solid content of the resin composition. The resin composition may contain only one type of silane coupling agent, or may contain two or more types. When two or more kinds are included, it is preferable that the total amount thereof is within the above range.

<<Surfactant>>
The resin composition of the present invention preferably contains a surfactant. According to this aspect, it is possible to suppress the occurrence of striations during application of the resin composition. Furthermore, the storage stability of the resin composition can also be improved.

As the surfactant, various surfactants such as fluorine-based surfactants, nonionic surfactants, cationic surfactants, anionic surfactants and silicon surfactants can be used. Surfactants include those described in paragraphs 0238-0245 of WO2015/166779, the contents of which are incorporated herein. The surfactant is preferably a fluorosurfactant. By including a fluorosurfactant in the resin composition, the above effect can be obtained more remarkably.

The fluorine content in the fluorosurfactant is preferably 3 to 40% by mass, more preferably 5 to 30% by mass, and particularly preferably 7 to 25% by mass. A fluorosurfactant having a fluorine content within this range is effective in terms of uniformity of the thickness of the coating film and saving liquid, and has good solubility in the composition.

As the fluorine-based surfactant, JP 2014-041318 Paragraph Nos. 0060 to 0064 (corresponding International Publication No. 2014/017669 Paragraph Nos. 0060 to 0064) surfactants described in, JP 2011- 132503, paragraphs 0117-0132, the contents of which are incorporated herein. Commercially available fluorosurfactants include, for example, MEGAFACE F171, F172, F173, F176, F177, F141, F142, F143, F144, R30, F437, F475, F479, F482, F554, F780, EXP, MFS -330 (manufactured by DIC Corporation), Florard FC430, FC431, FC171 (manufactured by Sumitomo 3M Limited), Surflon S-382, SC-101, SC-103, SC-104, SC-105, SC-1068, SC-381, SC-383, S-393, KH-40 (manufactured by Asahi Glass Co., Ltd.), PolyFox PF636, PF656, PF6320, PF6520, PF7002 (manufactured by OMNOVA) and the like. .

In addition, fluorine-based surfactants have a molecular structure with a functional group containing a fluorine atom, and when heat is applied, the portion of the functional group containing a fluorine atom is cleaved and the fluorine atom volatilizes. It can be used preferably. As such a fluorosurfactant, Megafac DS series manufactured by DIC Corporation (The Chemical Daily (February 22, 2016), Nikkei Sangyo Shimbun (February 23, 2016)), for example, Megafac and DS-21.

It is also preferable to use a polymer of a fluorine atom-containing vinyl ether compound having a fluorinated alkyl group or a fluorinated alkylene ether group and a hydrophilic vinyl ether compound as the fluorosurfactant. Such fluorosurfactants include fluorosurfactants described in JP-A-2016-216602, the contents of which are incorporated herein.

上記の化合物の重量平均分子量は、好ましくは３０００～５００００であり、例えば、１４０００である。上記の化合物中、繰り返し単位の割合を示す％はモル％である。A block polymer can also be used as the fluorosurfactant. The fluorosurfactant has 2 or more (preferably 5 or more) repeating units derived from a (meth)acrylate compound having a fluorine atom and an alkyleneoxy group (preferably an ethyleneoxy group or a propyleneoxy group) (meta). A fluorine-containing polymer compound containing a repeating unit derived from an acrylate compound can also be preferably used. Further, the fluorine-containing surfactants described in paragraphs 0016 to 0037 of JP-A-2010-032698 and the following compounds are also exemplified as fluorine-based surfactants used in the present invention.

The weight average molecular weight of the above compound is preferably 3000-50000, for example 14000. In the above compounds, % indicating the ratio of repeating units is mol %.

A fluoropolymer having an ethylenically unsaturated bond-containing group in a side chain can also be used as the fluorosurfactant. Specific examples include compounds described in paragraph numbers 0050 to 0090 and paragraph numbers 0289 to 0295 of JP-A-2010-164965, MEGAFACE RS-101, RS-102 and RS-718K manufactured by DIC Corporation, and RS-72-K. Further, as the fluorosurfactant, compounds described in paragraphs 0015 to 0158 of JP-A-2015-117327 can also be used.

Nonionic surfactants include glycerol, trimethylolpropane, trimethylolethane and their ethoxylates and propoxylates (e.g., glycerol propoxylate, glycerol ethoxylate, etc.), polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, Polyoxyethylene oleyl ether, polyoxyethylene octylphenyl ether, polyoxyethylene nonylphenyl ether, polyethylene glycol dilaurate, polyethylene glycol distearate, sorbitan fatty acid ester, Pluronic L10, L31, L61, L62, 10R5, 17R2, 25R2 (BASF company), Tetronic 304, 701, 704, 901, 904, 150R1 (manufactured by BASF), Solsperse 20000 (manufactured by Nippon Lubrizol Co., Ltd.), NCW-101, NCW-1001, NCW-1002 (Wako Pure Chemical Industries, Ltd.) Kogyo Co., Ltd.), Pionin D-6112, D-6112-W, D-6315 (Takemoto Oil Co., Ltd.), Olfine E1010, Surfynol 104, 400, 440 (Nissin Chemical Industry Co., Ltd.) etc.

Examples of silicone-based surfactants include Toray Silicone DC3PA, Toray Silicone SH7PA, Toray Silicone DC11PA, Toray Silicone SH21PA, Toray Silicone SH28PA, Toray Silicone SH29PA, Toray Silicone SH30PA, Toray Silicone SH8400 (the above, Toray Dow Corning Co., Ltd. ), TSF-4440, TSF-4300, TSF-4445, TSF-4460, TSF-4452 (manufactured by Momentive Performance Materials), KP-341, KF-6001, KF-6002 (above, Shin-Etsu Silicone Co., Ltd.), BYK307, BYK323, BYK330 (all manufactured by BYK-Chemie).

The content of the surfactant is preferably 0.001 to 1% by mass, more preferably 0.001 to 0.5% by mass, based on the total solid content of the resin composition. 0.001 to 0.2% by mass is more preferable because it is possible to more effectively suppress the The resin composition may contain only one surfactant, or may contain two or more surfactants. When two or more kinds are included, it is preferable that the total amount thereof is within the above range.

<<Ultraviolet absorber>>
The resin composition can contain an ultraviolet absorber. Examples of ultraviolet absorbers include conjugated diene compounds, aminodiene compounds, salicylate compounds, benzophenone compounds, benzotriazole compounds, acrylonitrile compounds, hydroxyphenyltriazine compounds, indole compounds, and triazine compounds. Specific examples of such compounds include paragraph numbers 0038 to 0052 of JP-A-2009-217221, paragraph numbers 0052-0072 of JP-A-2012-208374, paragraph numbers 0317-0317 of JP-A-2013-068814. 0334, and compounds described in paragraphs 0061 to 0080 of JP-A-2016-162946, the contents of which are incorporated herein. Examples of commercially available UV absorbers include UV-503 (manufactured by Daito Kagaku Co., Ltd.). Moreover, as a benzotriazole compound, the MYUA series made from Miyoshi oil and fats (Chemical Daily, February 1, 2016) is mentioned. Further, the compounds described in paragraphs 0049 to 0059 of Japanese Patent No. 6268967 can also be used as the ultraviolet absorber. The content of the ultraviolet absorber is preferably 0.01 to 10% by mass, more preferably 0.01 to 5% by mass, based on the total solid content of the resin composition. The resin composition may contain only one type of ultraviolet absorber, or may contain two or more types. When two or more kinds are included, it is preferable that the total amount thereof is within the above range.

<<Antioxidant>>
The resin composition of the present invention can contain an antioxidant. Antioxidants include phenol compounds, phosphite ester compounds, thioether compounds and the like. Any phenolic compound known as a phenolic antioxidant can be used as the phenolic compound. Preferred phenolic compounds include hindered phenolic compounds. A compound having a substituent at a site adjacent to the phenolic hydroxy group (ortho position) is preferred. As the aforementioned substituent, a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms is preferred. The antioxidant is also preferably a compound having a phenol group and a phosphite ester group in the same molecule. Phosphorus-based antioxidants can also be suitably used as antioxidants. As a phosphorus antioxidant, tris[2-[[2,4,8,10-tetrakis(1,1-dimethylethyl)dibenzo[d,f][1,3,2]dioxaphosphepin-6 -yl]oxy]ethyl]amine, tris[2-[(4,6,9,11-tetra-tert-butyldibenzo[d,f][1,3,2]dioxaphosphepin-2-yl ) oxy]ethyl]amine, ethyl bis(2,4-di-tert-butyl-6-methylphenyl) phosphite, and the like. Examples of commercially available antioxidants include Adekastab AO-20, Adekastab AO-30, Adekastab AO-40, Adekastab AO-50, Adekastab AO-50F, Adekastab AO-60, Adekastab AO-60G, Adekastab AO-80. , ADEKA STAB AO-330 (manufactured by ADEKA Corporation) and the like. In addition, antioxidants include compounds described in paragraphs 0023 to 0048 of Japanese Patent No. 6268967, compounds described in WO 2017/006600, and compounds described in WO 2017/164024. can also be used. The content of the antioxidant is preferably 0.01 to 20% by mass, more preferably 0.3 to 15% by mass, based on the total solid content of the resin composition. The resin composition may contain only one kind of antioxidant, or may contain two or more kinds. When two or more kinds are included, it is preferable that the total amount thereof is within the above range.

<<Other Ingredients>>
The resin composition of the present invention may optionally contain sensitizers, curing accelerators, fillers, thermosetting accelerators, plasticizers and other auxiliaries (e.g., conductive particles, fillers, antifoaming agents, flame retardants, leveling agents, release accelerators, fragrances, surface tension modifiers, chain transfer agents, etc.). Properties such as film physical properties can be adjusted by appropriately containing these components. These components are described, for example, from paragraph number 0183 of JP-A-2012-003225 (paragraph number 0237 of corresponding US Patent Application Publication No. 2013/0034812), paragraph of JP-A-2008-250074 The descriptions of numbers 0101 to 0104, 0107 to 0109, etc. can be referred to, and the contents thereof are incorporated herein. Moreover, the resin composition of the present invention may contain a latent antioxidant, if necessary. The latent antioxidant is a compound in which the site functioning as an antioxidant is protected by a protective group, and is heated at 100 to 250°C, or heated at 80 to 200°C in the presence of an acid/base catalyst. A compound that functions as an antioxidant by removing the protective group by the reaction is exemplified. Examples of latent antioxidants include compounds described in International Publication No. 2014/021023, International Publication No. 2017/030005, and JP-A-2017-008219. Commercially available latent antioxidants include ADEKA Arkles GPA-5001 (manufactured by ADEKA Co., Ltd.).

The viscosity (23° C.) of the resin composition of the present invention is preferably 1 to 100 mPa·s when forming a film by coating. The lower limit is more preferably 2 mPa·s or more, and even more preferably 3 mPa·s or more. The upper limit is more preferably 50 mPa·s or less, still more preferably 30 mPa·s or less, and particularly preferably 15 mPa·s or less.

<Container>
The storage container for the resin composition of the present invention is not particularly limited, and known storage containers can be used. In addition, as a storage container, a multi-layer bottle whose inner wall is composed of 6 types and 6 layers of resins and a bottle with a 7-layer structure of 6 types of resins are used for the purpose of suppressing contamination of raw materials and resin compositions. It is also preferred to use Examples of such a container include the container described in JP-A-2015-123351. Further, the inner wall of the container is preferably made of glass or stainless steel for the purpose of preventing metal elution from the inner wall of the container, enhancing the storage stability of the resin composition, and suppressing deterioration of components.

<Application of resin composition>
The resin composition of the present invention can be preferably used as a resin composition for forming a near-infrared cut filter or a near-infrared transmitting filter. When the resin composition of the present invention is used as a resin composition for forming a near-infrared transmission filter, the resin composition of the present invention preferably further contains a coloring material that blocks visible light. By using such a resin composition, it is possible to form a near-infrared transmission filter that can block visible light and transmit only near-infrared rays having a specific wavelength or more. The resin composition of the present invention can also be used for heat ray cutting materials, photothermal conversion materials, laser welding materials, and the like.

<Method for preparing resin composition>
The resin composition of the present invention can be prepared by mixing the aforementioned components. In preparing the resin composition, all the components may be simultaneously dissolved or dispersed in a solvent to prepare the resin composition, or if necessary, two or more solutions or dispersions in which each component is appropriately blended. may be prepared in advance and mixed at the time of use (at the time of application) to prepare a composition.

Further, when the near-infrared absorbing dye represented by formula (SQ1) is a pigment, it is preferable that the preparation of the resin composition includes a process of dispersing the pigment. In the process of dispersing pigments, mechanical forces used for dispersing pigments include compression, squeezing, impact, shearing, cavitation, and the like. Specific examples of these processes include bead mills, sand mills, roll mills, ball mills, paint shakers, microfluidizers, high speed impellers, sand grinders, flow jet mixers, high pressure wet atomization, ultrasonic dispersion, and the like. In pulverizing the pigment in a sand mill (bead mill), it is preferable to use beads with a small diameter or to increase the filling rate of the beads so as to increase the pulverization efficiency. Moreover, it is preferable to remove coarse particles by filtration, centrifugation, or the like after the pulverization treatment. In addition, the process and dispersing machine for dispersing pigments are described in ``Dispersion Technology Encyclopedia, Information Organization Co., Ltd., July 15, 2005'' and ``Dispersion Technology Centered on Suspension (Solid/Liquid Dispersion System) and Industrial Applications'' The process and disperser described in paragraph number 0022 of Japanese Patent Application Laid-Open No. 2015-157893 can be suitably used. In the process of dispersing the pigment, the particles may be made finer in the salt milling process. Materials, equipment, processing conditions, etc. used in the salt milling process can be referred to, for example, Japanese Patent Application Laid-Open Nos. 2015-194521 and 2012-046629.

Preferred embodiments of the method for preparing the resin composition include the following embodiments 1 and 2, and the following embodiment 2 is preferred from the viewpoint of storage stability.

Aspect 1: A near-infrared absorbing dye represented by the formula (SQ1), a metal complex represented by the formula (MC1), a resin, and a solvent are mixed and dispersed to prepare a dispersion, and the dispersion and A mode in which a resin composition is prepared by further mixing other components such as a resin and a solvent as necessary.
Aspect 2: A near-infrared absorbing dye represented by formula (SQ1), a resin, and a solvent are mixed and dispersed to prepare a dispersion, and this dispersion and a metal complex represented by formula (MC1). A mode in which a resin composition is prepared by further mixing other components such as a resin and a solvent as necessary.

In preparing the resin composition, it is preferable to filter the resin composition with a filter for the purpose of removing foreign substances and reducing defects. As the filter, any filter that has been conventionally used for filtration or the like can be used without particular limitation. For example, fluorine resins such as polytetrafluoroethylene (PTFE), polyamide resins such as nylon (eg nylon-6, nylon-6,6), polyethylene, polyolefin resins such as polypropylene (PP) (high density, ultra high molecular weight including polyolefin resin). Among these materials, polypropylene (including high density polypropylene) and nylon are preferred.

The pore size of the filter is preferably 0.01-7.0 μm, more preferably 0.01-3.0 μm, even more preferably 0.05-0.5 μm. If the pore diameter of the filter is within the above range, fine foreign matter can be removed more reliably. For the pore size value of the filter, reference can be made to the filter manufacturer's nominal value. Various filters provided by Nihon Pall Co., Ltd. (DFA4201NIEY, etc.), Advantech Toyo Co., Ltd., Nihon Entegris Co., Ltd. (former Japan Microlith Co., Ltd.), Kitz Micro Filter Co., Ltd., and the like can be used as filters.

It is also preferable to use a fibrous filter medium as the filter. Examples of fibrous filter media include polypropylene fibers, nylon fibers, and glass fibers. Commercially available products include SBP type series (SBP008, etc.), TPR type series (TPR002, TPR005, etc.), and SHPX type series (SHPX003, etc.) manufactured by Roki Techno.

When using filters, different filters (eg, a first filter and a second filter, etc.) may be combined. At that time, filtration with each filter may be performed only once, or may be performed twice or more. Also, filters with different pore sizes within the range described above may be combined. Further, the filtration with the first filter may be performed only on the dispersion liquid, and after mixing other components, the filtration with the second filter may be performed.

<Membrane>
Next, the film of the present invention will be explained. The film of the present invention is obtained from the resin composition of the present invention described above. The film of the present invention can be preferably used as a near-infrared cut filter or a near-infrared transmissive filter. The film of the present invention can also be used as a heat ray shielding filter. The film of the present invention may have a pattern or may be a film without a pattern (flat film). Moreover, the film of the present invention may be used by laminating it on a support, or may be used by peeling the film of the present invention from the support. Examples of the support include semiconductor substrates such as silicon substrates and transparent substrates.

A charge-coupled device (CCD), a complementary metal-oxide semiconductor (CMOS), a transparent conductive film, or the like may be formed on the semiconductor substrate used as the support. Also, a black matrix that isolates each pixel may be formed on the semiconductor substrate. In addition, if necessary, an undercoat layer may be provided on the semiconductor substrate for improving adhesion to the upper layer, preventing diffusion of substances, or flattening the surface of the substrate.

The transparent substrate used as the support is not particularly limited as long as it is composed of a material that can transmit at least visible light. Examples thereof include base materials made of materials such as glass and resin. Examples of resins include polyester resins such as polyethylene terephthalate and polybutylene terephthalate; polyolefin resins such as polyethylene, polypropylene, and ethylene-vinyl acetate copolymer; acrylic resins such as norbornene resin, polyacrylate, and polymethyl methacrylate; urethane resins; , fluororesin, polycarbonate resin, polyvinyl butyral resin, polyvinyl alcohol resin, and the like. Examples of glass include soda-lime glass, borosilicate glass, alkali-free glass, quartz glass, glass containing copper, and the like. Glass containing copper includes phosphate glass containing copper, fluorophosphate glass containing copper, and the like. A commercially available glass containing copper can also be used. Commercially available glass containing copper includes NF-50 (manufactured by AGC Techno Glass Co., Ltd.).

The thickness of the film of the present invention can be appropriately adjusted depending on the purpose. The thickness of the film is preferably 20 μm or less, more preferably 10 μm or less, even more preferably 5 μm or less. The lower limit of the film thickness is preferably 0.1 μm or more, more preferably 0.2 μm or more.

When the film of the present invention is used as a near-infrared cut filter, the film of the present invention preferably has a maximum absorption wavelength in the wavelength range of 700 to 1800 nm (preferably 700 to 1300 nm, more preferably 700 to 1000 nm). . In addition, the average transmittance of light with a wavelength of 400 to 600 nm is preferably 50% or more, more preferably 70% or more, even more preferably 80% or more, particularly 85% or more. preferable. Also, the transmittance in the entire wavelength range of 400 to 600 nm is preferably 50% or more, more preferably 70% or more, and even more preferably 80% or more. In addition, the film of the present invention preferably has a transmittance of 15% or less at at least one point in the wavelength range of 700 to 1800 nm (preferably a wavelength of 700 to 1300 nm, more preferably a wavelength of 700 to 1000 nm). The following is more preferable, and 5% or less is even more preferable. In the film of the present invention, A ₁ /A ₂ , which is the ratio of the maximum absorbance A ₁ in the wavelength range of 400 to 600 nm to the absorbance A ₂ at the maximum absorption wavelength, is preferably 0.30 or less. , is more preferably 0.20 or less, still more preferably 0.15 or less, and particularly preferably 0.10 or less.

When the film of the present invention is used as a near-infrared transmission filter, the film of the present invention has a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 830 nm. The minimum transmittance in the wavelength range of 1100 to 1300 nm is preferably 70% or more (preferably 75% or more, more preferably 80% or more). The film of the present invention used as a near-infrared transmission filter preferably satisfies the following spectral characteristics of either (1) or (2).
(1): The maximum transmittance in the wavelength range of 400 to 830 nm is 20% or less (preferably 15% or less, more preferably 10% or less), and the minimum transmittance in the wavelength range of 1000 to 1300 nm is 70% or more (preferably 75% or more, more preferably 80% or more).
(2): The maximum transmittance in the wavelength range of 400 to 950 nm is 20% or less (preferably 15% or less, more preferably 10% or less), and the minimum transmittance in the wavelength range of 1100 to 1300 nm is 70% or more (preferably 75% or more, more preferably 80% or more).

The films of the present invention can also be used in combination with color filters containing chromatic colorants. A color filter can be produced using a coloring composition containing a chromatic colorant. Examples of the chromatic colorant include the chromatic colorants exemplified as those that may be contained in the resin composition of the present invention. Further, the film of the present invention may contain a chromatic colorant to form a filter having the functions of a near-infrared cut filter and a color filter.

When the film of the present invention is used as a near-infrared cut filter and the film of the present invention is used in combination with a color filter, the color filter is preferably arranged on the optical path of the film of the present invention. For example, it is preferable to laminate the film of the present invention and a color filter and use it as a laminate. In the laminate, the film of the present invention and the color filter may or may not be adjacent in the thickness direction. When the film of the present invention and the color filter are not adjacent in the thickness direction, the film of the present invention may be formed on a support other than the support on which the color filter is formed. Other members (for example, a microlens, a planarization layer, etc.) constituting the solid-state imaging device may be interposed between the film and the color filter.

The film of the present invention can be used in various devices such as solid-state imaging devices such as CCDs (charge-coupled devices) and CMOSs (complementary metal oxide semiconductors), infrared sensors, and image display devices.

<Method for producing membrane>
The film of the present invention can be produced through the step of applying the resin composition of the present invention.

Supports include those described above. A known method can be used as a method for applying the resin composition. For example, dropping method (drop cast); slit coating method; spray method; roll coating method; spin coating method (spin coating); methods described in publications); inkjet (e.g., on-demand method, piezo method, thermal method), discharge system printing such as nozzle jet, flexo printing, screen printing, gravure printing, reverse offset printing, metal mask printing method, etc. Examples include various printing methods; transfer methods using molds and the like; nanoimprinting methods and the like. The application method for inkjet is not particularly limited. 133 page), and methods described in JP-A-2003-262716, JP-A-2003-185831, JP-A-2003-261827, JP-A-2012-126830, JP-A-2006-169325, etc. mentioned.

The resin composition layer formed by applying the resin composition may be dried (pre-baked). When pre-baking is performed, the pre-baking temperature is preferably 150° C. or lower, more preferably 120° C. or lower, and even more preferably 110° C. or lower. The lower limit can be, for example, 50° C. or higher, and can also be 80° C. or higher. The prebaking time is preferably 10 seconds to 3000 seconds, more preferably 40 seconds to 2500 seconds, and even more preferably 80 seconds to 220 seconds. Drying can be performed using a hot plate, an oven, or the like.

The film manufacturing method may further include a step of forming a pattern. Examples of the pattern forming method include a pattern forming method using a photolithographic method and a pattern forming method using a dry etching method, and the pattern forming method using the photolithographic method is preferable. In addition, when the film of the present invention is used as a flat film, the step of forming a pattern may not be performed. The process of forming the pattern will be described in detail below.

(When patterning by photolithography)
The pattern forming method by photolithography comprises a step of patternwise exposing the resin composition layer formed by coating the resin composition of the present invention (exposure step), and developing the unexposed portion of the resin composition layer. and a step of removing to form a pattern (developing step). If necessary, a step of baking the developed pattern (post-baking step) may be provided. Each step will be described below.

<<Exposure process>>
In the exposure step, the resin composition layer is exposed in a pattern. For example, the resin composition layer can be exposed in a pattern by exposing through a mask having a predetermined mask pattern using a stepper exposure machine, a scanner exposure machine, or the like. Thereby, the exposed portion can be cured.

Radiation (light) that can be used for exposure includes g-line, i-line, and the like. Light with a wavelength of 300 nm or less (preferably light with a wavelength of 180 to 300 nm) can also be used. Light having a wavelength of 300 nm or less includes KrF rays (wavelength: 248 nm), ArF rays (wavelength: 193 nm), etc., and KrF rays (wavelength: 248 nm) are preferred. A long-wave light source of 300 nm or more can also be used.

Further, the exposure may be performed by continuously irradiating the light, or by pulsing the light (pulse exposure). Note that the pulse exposure is an exposure method in which light irradiation and pause are repeated in a cycle of short time (for example, less than millisecond level). In the case of pulse exposure, the pulse width is preferably 100 nanoseconds (ns) or less, more preferably 50 nanoseconds or less, and even more preferably 30 nanoseconds or less. The lower limit of the pulse width is not particularly limited, but may be 1 femtosecond (fs) or more, and may be 10 femtoseconds or more. The frequency is preferably 1 kHz or higher, more preferably 2 kHz or higher, and even more preferably 4 kHz or higher. The upper limit of the frequency is preferably 50 kHz or less, more preferably 20 kHz or less, and even more preferably 10 kHz or less. The maximum instantaneous illuminance is preferably 50000000 W/ ^m2 or more, more preferably 100000000 W/ ^m2 or more, and even more preferably 200000000 W/ ^m2 or more. The upper limit of the maximum instantaneous illuminance is preferably 1000000000 W/m ² or less, more preferably 800000000 W/m ² or less, and even more preferably 500000000 W/m ² or less. It should be noted that the pulse width is the time during which the light is applied in the pulse period. Also, the frequency is the number of pulse cycles per second. Further, the maximum instantaneous illuminance is the average illuminance within the time during which the light is irradiated in the pulse cycle. Further, the pulse cycle is a cycle in which light irradiation and rest in pulse exposure are set as one cycle.

The irradiation amount (exposure amount) is, for example, preferably 0.03 to 2.5 J/cm ² , more preferably 0.05 to 1.0 J/cm ² . The oxygen concentration at the time of exposure can be selected as appropriate, and in addition to exposure in the atmosphere, for example, in a low oxygen atmosphere with an oxygen concentration of 19% by volume or less (e.g., 15% by volume, 5% by volume, or substantially oxygen-free) or in a high-oxygen atmosphere with an oxygen concentration exceeding 21% by volume (for example, 22% by volume, 30% by volume, or 50% by volume). In addition, the exposure illuminance can be set as appropriate, and is usually selected from the range of 1000 W/m ² to 100000 W/m ² (eg, 5000 W/m ² , 15000 W/m ² or 35000 W/m ² ). can be done. Oxygen concentration and exposure illuminance may be appropriately combined. For example, illuminance of 10000 W/m ² at oxygen concentration of 10% by volume and illuminance of 20000 W/m ² at oxygen concentration of 35% by volume.

<<development process>>
Next, an unexposed portion of the resin composition layer after exposure is removed by development to form a pattern. The development and removal of the unexposed portion of the resin composition layer can be performed using a developer. As a result, the unexposed portion of the resin composition layer in the exposure step is eluted into the developer, leaving only the photocured portion on the support. The temperature of the developer is preferably 20 to 30° C., for example. The development time is preferably 20 to 180 seconds. Moreover, in order to improve the residue removability, the step of shaking off the developer every 60 seconds and then supplying new developer may be repeated several times.

Examples of the developer include organic solvents and alkaline developers, and the alkaline developer is preferably used. As the alkaline developer, an alkaline aqueous solution (alkali developer) obtained by diluting an alkaline agent with pure water is preferable. Examples of alkali agents include ammonia, ethylamine, diethylamine, dimethylethanolamine, diglycolamine, diethanolamine, hydroxylamine, ethylenediamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, and tetrabutylammonium hydroxide. , ethyltrimethylammonium hydroxide, benzyltrimethylammonium hydroxide, dimethylbis(2-hydroxyethyl)ammonium hydroxide, choline, pyrrole, piperidine, 1,8-diazabicyclo[5.4.0]-7-undecene. Alkaline compounds and inorganic alkaline compounds such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, sodium silicate and sodium metasilicate. A compound having a large molecular weight is preferable for the alkaline agent from the standpoint of environment and safety. The concentration of the alkaline agent in the alkaline aqueous solution is preferably 0.001 to 10% by mass, more preferably 0.01 to 1% by mass. Moreover, the developer may further contain a surfactant. A nonionic surfactant is preferable as the surfactant. From the viewpoint of transportation and storage convenience, the developer may be produced once as a concentrated solution and then diluted to the required concentration when used. Although the dilution ratio is not particularly limited, it can be set, for example, in the range of 1.5 to 100 times. It is also preferable to wash (rinse) with pure water after development. Rinsing is preferably carried out by supplying a rinse liquid to the composition layer after development while rotating the support on which the composition layer after development is formed. It is also preferable to move the nozzle for discharging the rinsing liquid from the central portion of the support to the peripheral portion of the support. At this time, when moving the nozzle from the center of the support to the periphery, the moving speed of the nozzle may be gradually decreased. By performing rinsing in this manner, in-plane variations in rinsing can be suppressed. A similar effect can be obtained by gradually decreasing the rotation speed of the support while moving the nozzle from the center of the support to the periphery.

After development, it is preferable to carry out additional exposure treatment and heat treatment (post-baking) after drying. Additional exposure processing and post-baking are post-development curing treatments for complete curing. The heating temperature in post-baking is, for example, preferably 100 to 240.degree. C., more preferably 200 to 240.degree. Post-baking can be performed continuously or batchwise using a heating means such as a hot plate, a convection oven (hot air circulating dryer), or a high-frequency heater so that the developed film satisfies the above conditions. . When the additional exposure process is performed, the light used for exposure preferably has a wavelength of 400 nm or less. Also, the additional exposure process may be performed by the method described in Korean Patent Publication No. 10-2017-0122130.

(When patterning by dry etching method)
Pattern formation by the dry etching method is carried out by curing the resin composition layer formed by coating the resin composition on a support to form a cured layer, and then applying a photo patterned on the cured layer. A method such as forming a resist layer and then dry-etching the cured product layer using an etching gas using the patterned photoresist layer as a mask can be used. In forming the photoresist layer, pre-baking is preferably performed. Regarding pattern formation by a dry etching method, descriptions in paragraphs 0010 to 0067 of JP-A-2013-064993 can be referred to, and the contents thereof are incorporated into this specification.

<Near-infrared cut filter>
The near-infrared cut filter of the present invention has the film of the present invention described above. The near-infrared cut filter of the present invention preferably has an average transmittance of 70% or more, more preferably 80% or more, even more preferably 85% or more, for light having a wavelength of 400 to 600 nm. % or more is particularly preferable. Also, the transmittance in the entire wavelength range of 400 to 600 nm is preferably 70% or more, more preferably 80% or more, and even more preferably 90% or more. In addition, the preferred range of the near-infrared shielding property of the near-infrared cut filter varies depending on the application, but the transmittance at at least one point in the range of wavelengths 700 to 1800 nm (preferably wavelengths 700 to 1300 nm, more preferably wavelengths 700 to 1000 nm) is preferably 20% or less, more preferably 15% or less, even more preferably 10% or less.

The near-infrared cut filter of the present invention may further have a layer containing copper, a dielectric multilayer film, an ultraviolet absorbing layer, etc., in addition to the film of the present invention described above. Examples of the ultraviolet absorbing layer include the absorbing layers described in paragraphs 0040 to 0070 and 0119 to 0145 of International Publication No. 2015/099060. Dielectric multilayer films include dielectric multilayer films described in paragraphs 0255 to 0259 of JP-A-2014-041318. As the layer containing copper, a glass substrate made of glass containing copper (copper-containing glass substrate) or a layer containing a copper complex (copper complex-containing layer) can be used. Copper-containing glass substrates include copper-containing phosphate glass, copper-containing fluorophosphate glass, and the like. Commercially available copper-containing glasses include NF-50 (manufactured by AGC Techno Glass Co., Ltd.), BG-60, BG-61 (manufactured by Schott), CD5000 (manufactured by HOYA Corporation), and the like.

<Near-infrared transmission filter>
The near-infrared transmission filter of the invention has the film of the invention described above. The near-infrared transmission filter of the present invention has a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 830 nm, and the transmission in the wavelength range of 1100 to 1300 nm. It is preferable that the minimum value of the ratio is 70% or more (preferably 75% or more, more preferably 80% or more). The near-infrared transmission filter of the present invention preferably satisfies the spectral characteristics of either (1) or (2) below.
(1): The maximum transmittance in the wavelength range of 400 to 830 nm is 20% or less (preferably 15% or less, more preferably 10% or less), and the minimum transmittance in the wavelength range of 1000 to 1300 nm is 70% or more (preferably 75% or more, more preferably 80% or more).
(2): The maximum transmittance in the wavelength range of 400 to 950 nm is 20% or less (preferably 15% or less, more preferably 10% or less), and the minimum transmittance in the wavelength range of 1100 to 1300 nm is 70% or more (preferably 75% or more, more preferably 80% or more).

<Solid-state image sensor>
The solid-state imaging device of the present invention includes the film of the present invention described above. The configuration of the solid-state imaging device is not particularly limited as long as it has the film of the present invention and functions as a solid-state imaging device. For example, the following configuration can be mentioned.

A plurality of photodiodes constituting the light receiving area of the solid-state imaging device and transfer electrodes made of polysilicon or the like are provided on the support, and light shielding made of tungsten or the like with only the light receiving portions of the photodiodes being opened on the photodiodes and the transfer electrodes. A device protective film made of silicon nitride or the like is formed on the light shielding film so as to cover the entire surface of the light shielding film and the photodiode light receiving portion, and the film of the present invention is provided on the device protective film. be. Furthermore, on the device protective film, a structure having a condensing means (for example, a microlens, etc.; the same applies hereinafter) under the film of the present invention (on the side close to the support), or a condensing means on the film of the present invention A configuration or the like having a means may be used. Moreover, the color filter may have a structure in which a film forming each pixel is embedded in a space partitioned by partition walls, for example, in a grid pattern. The partition in this case preferably has a lower refractive index than each pixel. Examples of imaging devices having such a structure include devices described in JP-A-2012-227478 and JP-A-2014-179577.

<Image display device>
The image display device of the invention comprises the film of the invention. Examples of image display devices include liquid crystal display devices and organic electroluminescence (organic EL) display devices. For the definition and details of the image display device, see, for example, "Electronic Display Device (written by Akio Sasaki, Industrial Research Institute, 1990)", "Display Device (written by Junsho Ibuki, published by Sangyo Tosho Co., Ltd., 1989). issued)”, etc. Liquid crystal display devices are described, for example, in "Next Generation Liquid Crystal Display Technology (edited by Tatsuo Uchida, published by Kogyo Choukai Co., Ltd., 1994)". There is no particular limitation on the liquid crystal display device to which the present invention can be applied, and for example, the present invention can be applied to liquid crystal display devices of various systems described in the above-mentioned "next generation liquid crystal display technology". The image display device may have a white organic EL element. A white organic EL device preferably has a tandem structure. Regarding the tandem structure of the organic EL element, see Japanese Patent Application Laid-Open No. 2003-045676, supervised by Akiyoshi Mikami, "Forefront of Organic EL Technology Development -High Brightness, High Precision, Long Life, Collection of Know-how-", Technical Information Association, 326-328, 2008, and others. The spectrum of white light emitted by the organic EL element preferably has strong maximum emission peaks in the blue region (430-485 nm), green region (530-580 nm) and yellow region (580-620 nm). In addition to these emission peaks, those having a maximum emission peak in the red region (650 to 700 nm) are more preferred.

<Infrared sensor>
The infrared sensor of the invention comprises the membrane of the invention as described above. The configuration of the infrared sensor is not particularly limited as long as it functions as an infrared sensor. An embodiment of the infrared sensor of the present invention will be described below with reference to the drawings.

In FIG. 1, reference numeral 110 denotes a solid-state imaging device. A near-infrared cut filter 111 and a near-infrared transmission filter 114 are arranged on the imaging area of the solid-state imaging device 110 . A color filter 112 is arranged on the near-infrared cut filter 111 . A microlens 115 is arranged on the incident light hν side of the color filter 112 and the near-infrared transmission filter 114 . A planarization layer 116 is formed to cover the microlens 115 .

The near-infrared cut filter 111 can be formed using the resin composition of the present invention. The spectral characteristics of the near-infrared cut filter 111 are selected according to the emission wavelength of the infrared light emitting diode (infrared LED) used. The color filter 112 is a color filter formed with pixels that transmit and absorb light of a specific wavelength in the visible region, and is not particularly limited, and conventionally known color filters for forming pixels can be used. For example, a color filter having red (R), green (G), and blue (B) pixels is used. For example, paragraph numbers 0214 to 0263 of JP-A-2014-043556 can be referred to, and the contents thereof are incorporated herein. The characteristics of the near-infrared transmission filter 114 are selected according to the emission wavelength of the infrared LED used.

In the infrared sensor shown in FIG. 1 , a near-infrared cut filter (another near-infrared cut filter) different from the near-infrared cut filter 111 may be further arranged on the planarization layer 116 . Other near-infrared cut filters include those having copper-containing layers and/or dielectric multilayer films. These details are given above. A dual bandpass filter may be used as another near-infrared cut filter.

EXAMPLES The present invention will be described more specifically with reference to examples below. The materials, usage amounts, ratios, processing details, processing procedures, etc. shown in the following examples can be changed as appropriate without departing from the gist of the present invention. Me in the structural formula represents a methyl group, and Ph represents a phenyl group.

<Preparation of IR Dispersion>
(IR Dispersions 1 to 26)
A mixed solution having the following composition was mixed for 2 hours in a bead mill (high-pressure disperser NANO-3000-10 with decompression mechanism (manufactured by Nippon BEE Co., Ltd.)) using zirconia beads with a diameter of 0.3 mm. Each dispersion was prepared. The numerical values shown in the table below are parts by mass.

The raw materials listed in the above table are as follows.

(Near-infrared absorbing dye)
IR Dyes 1 to 16: Compounds IR-1 to IR-16 having the following structures

誘導体２：下記構造の化合物（塩基性色素誘導体）

誘導体３：下記構造の化合物（酸性色素誘導体）

誘導体４：下記構造の化合物（酸性色素誘導体）

誘導体５：下記構造の化合物（酸性色素誘導体）

(dye derivative)
Derivative 1: compound having the following structure (acidic dye derivative)

Derivative 2: a compound having the following structure (basic dye derivative)

Derivative 3: compound having the following structure (acidic dye derivative)

Derivative 4: compound having the following structure (acidic dye derivative)

Derivative 5: compound having the following structure (acidic dye derivative)

分散剤２：ソルスパース３６０００（日本ルーブリゾール（株）製）(dispersant)
Dispersant 1: Block type resin having the following structure (amine value = 90 mgKOH/g, quaternary ammonium salt value = 30 mgKOH/g, weight average molecular weight = 9800). The numerical value attached to the main chain represents the molar ratio of repeating units.

Dispersant 2: Solsperse 36000 (manufactured by Nippon Lubrizol Co., Ltd.)

(Organic solvent)
Solvent 1: propylene glycol methyl ether acetate (PGMEA)
Solvent 2: Cyclohexanone

金属錯体２：下記構造の化合物

(metal complex)
Metal complex 1: compound having the following structure

Metal complex 2: a compound having the following structure

<Preparation of resin composition>
After mixing and stirring the raw materials shown in the table below in the proportions (parts by mass) shown in the table below, the resin composition was filtered through a nylon filter with a pore size of 0.45 μm (manufactured by Nippon Pall Co., Ltd.). prepared. The numerical values shown in the table below are parts by mass. The mass ratio (metal complex/near-infrared absorbing dye (IR dye)) of the metal complex and the near-infrared absorbing dye contained in the resin composition is also described.

The raw materials shown in the above table are as follows.

(dispersion liquid)
IR Dispersions 1 to 26: Dispersions prepared above

(resin)
Resin 1: Resin having the following structure (weight average molecular weight: 41,400, numerical values attached to repeating units of the main chain are molar ratios.)

(Polymerizable compound)
Polymerizable compound 1: NK ester A-TMMT (manufactured by Shin-Nakamura Chemical Co., Ltd.)
Polymerizable compound 2: NK ester A-DPH-12E (manufactured by Shin-Nakamura Chemical Co., Ltd.)

(Photoinitiator)
Photoinitiator 1: IRGACURE-OXE01 (manufactured by BASF)

(Ultraviolet absorber)
UV absorber 1: UV-503 (manufactured by Daito Chemical Co., Ltd.)

(Antioxidant)
Antioxidant 1: Neo Heliopan 357 (manufactured by Symrise)

金属錯体４：下記構造の化合物

(metal complex)
Metal complexes 1 and 2: compounds having the structures described above Metal complex 3: compounds having the following structures

Metal complex 4: a compound having the following structure

(Polymerization inhibitor)
Polymerization inhibitor 1: p-methoxyphenol

(Surfactant)
Surfactant 1: compound having the following structure (Mw = 14000, in the following formula, % indicating the ratio of repeating units is mol%)

(solvent)
Solvent 1: PGMEA

<Evaluation of spectral characteristics in the near-infrared region>
The resin composition was applied onto an 8-inch (20.32 cm) glass wafer by spin coating so that the film thickness after forming the film would be 1.0 μm. Then, using a hot plate, it was heated at 100° C. for 2 minutes. Next, using an i-line stepper exposure apparatus FPA-3000i5+ (manufactured by Canon Inc.), exposure is performed at an exposure amount of 1000 mJ/cm ² and then heated at 200° C. for 5 minutes to form a film (near-infrared cut filter). did. The obtained film was measured for absorbance in a wavelength range of 400 to 1300 nm using an ultraviolet-visible-near-infrared spectrophotometer (U-4100, manufactured by Hitachi High-Technologies Corporation). The ODL (absorbance) and ODS (absorbance) shown were determined, the ratio of ODS to ODL (ODS/ODL) was calculated, and the spectral characteristics in the near-infrared region were evaluated according to the following criteria. The smaller the ODS/ODL value, the better the near-infrared shielding property and the better the spectral characteristics in the near-infrared region.

When there are two or more maximum absorption wavelengths in the wavelength range of 600 to 1300 nm, the absorbance at the maximum absorption wavelength λ1 on the longest wavelength side is ODL, and the maximum absorption wavelength λ1 is shorter than the maximum absorption wavelength λ1 and is closest to the maximum absorption wavelength λ1. Let the absorbance at the maximum absorption wavelength λ2 be ODS.
When there is only one maximum absorption wavelength in the wavelength range of 600 to 1300 nm, the absorbance at the maximum absorption wavelength is ODL, and the wavelength indicating the inflection point of the absorption spectrum in the wavelength range of 600 to 1300 nm is from the maximum absorption wavelength. is on the short wavelength side and the absorbance at the wavelength closest to the maximum absorption wavelength is defined as ODS.

Evaluation criteria for spectral characteristics in the near-infrared region are as follows.
A: ODS/ODL≤0.9
B: 0.9<ODS/ODL≤1.1
C: 1.1<ODS/ODL

<Evaluation of storage stability>
The resin composition immediately after production was applied onto an 8-inch (20.32 cm) glass wafer by a spin coating method so that the film thickness after forming the film would be 1.0 μm. Then, using a hot plate, it was heated at 100° C. for 2 minutes. Next, using an i-line stepper exposure apparatus FPA-3000i5+ (manufactured by Canon Inc.), exposure is performed at an exposure amount of 1000 mJ/cm ² and then heated at 200° C. for 5 minutes to form a film (near-infrared cut filter). did. The obtained film was measured for transmittance in the wavelength range of 700 to 1300 nm using an ultraviolet-visible-near-infrared spectrophotometer (U-4100, manufactured by Hitachi High-Technologies Corporation).
Next, the resin composition immediately after production was left in a constant temperature bath at 23° C. for 2 months. A film is formed in the same manner as described above using the resin composition after standing, and the obtained film is measured with an ultraviolet-visible-near-infrared spectrophotometer (U-4100, manufactured by Hitachi High-Technologies Co., Ltd.). was used to measure the transmittance in the wavelength range of 700 to 1300 nm.
The transmittance change (ΔT%) at the wavelength with the largest transmittance change in the wavelength range of 700 to 1300 nm of the film obtained using the resin composition before and after standing in a constant temperature bath is measured and stored according to the following criteria. Stability was evaluated. The smaller the value of ΔT%, the better the storage stability.
A: ΔT<2%
B: 2% ≤ ΔT% < 5%
C: 5% ≤ ΔT%

<Evaluation of Striation>
Using an etching method, a stepped (concave) pattern with a size of 3000 μm×4000 μm and a depth of 1.5 μm was formed in a grid pattern on the entire surface of an 8-inch (20.32 cm) silicon wafer. The interval between steps was set to 100 μm. The resin composition was applied by spin coating onto the silicon wafer on which the stepped pattern was formed, and heated at 100° C. for 120 seconds using a hot plate. After that, it was further heated at 200° C. for 300 seconds using a hot plate. Steps located at locations 1 to 28 shown in FIG. 2 were selected, and the corners of these steps were observed with an optical microscope (50x magnification). As for the corners of the steps, the corners farthest from the center of the silicon wafer among the four corners were observed, and striations were evaluated according to the following criteria.
(Evaluation of Striation)
A: Striation was not observed at any of sites 1 to 28 in FIG.
B: Two or less striations were observed at any of sites 1 to 28 in FIG.
C: Three or more striations were observed at any of sites 1 to 28 in FIG.

As shown in the above table, the examples had good spectral characteristics in the near-infrared region. In Example 2, the photopolymerization initiator 1 was replaced with IRGACURE-OXE02 (manufactured by BASF), and the same evaluation was performed, and the same results were obtained. In Example 2, the photopolymerization initiator 1 was replaced with Omnirad 907 (manufactured by IGM Resins B.V.), and the same evaluation was performed, and the same results were obtained. As a result of evaluation in the same manner as in Example 2 except for polymerization inhibitor 1, the same results were obtained. A near-infrared cut filter, a near-infrared transmission filter, a solid-state imaging device, an image display device, and an infrared sensor using the film obtained using the resin composition described in the examples of the present invention had good performance. .

110: solid-state imaging device, 111: near-infrared cut filter, 112: color filter, 114: near-infrared transmission filter, 115: microlens, 116: flattening layer

Claims (14)

a near-infrared absorbing dye represented by the following formula (SQ 2 );
a metal complex represented by the following formula (MC1);
a resin;
A resin composition comprising:

(In formula (SQ2), L ⁴¹ to L ⁴⁴ each independently represent an alkylene group, an alkynylene group, an arylene group, a heterocyclic group, or a divalent group in which two or more of these are bonded,
Z ⁴¹ and Z ⁴² are each independently a single bond, -O-, -C(=O)-, -S-, -N(R ^N1 )-, -S(=O)-, or -S( = O) ₂ -,
A ⁴¹ and A ⁴² each independently represent an oxygen atom or -N(R ^N2 )-,
R ^N1 and R ^N2 each independently represent a hydrogen atom, an alkyl group, or an aryl group;
Rs ¹⁴¹ and Rs ¹⁴² each independently represent a substituent,
ns41 and ns42 each independently represent an integer of 0 to 5,
When ns41 is 2 or more, the plurality of Rs ¹⁴¹ may be the same or different, and two Rs ¹⁴¹ among the plurality of Rs ¹⁴¹ may combine to form a ring,
When ns42 is 2 or more, the plurality of Rs ¹⁴² may be the same or different, and two Rs 142 of ^the plurality of Rs ¹⁴² may combine to form a ring;
provided that when L ⁴¹ to L ⁴⁴ are alkylene groups, Z ⁴¹ and Z ⁴² are single bonds, and A ⁴¹ and A ⁴² are —N(R ^N2 )—, at least one of ns41 and ns42 is an integer of 1 to 5 is. )

( In formula (MC1), ring Z ^mc1 and ring Z ^mc2 each independently represent a nitrogen-containing aromatic heterocycle ,
R ^mc1 and R ^mc2 each independently represent a single bond or -CR ^Y1 R ^Y2 -, R ^Y1 and R ^Y2 each independently represent a hydrogen atom or a substituent,
^Mmc1 represents Co, Ni, Cu, Rh, Ag, Ir, Pt or Au . ) 2. The resin composition according to claim 1, comprising two or more metal complexes represented by the formula (MC1). The resin composition according to claim 1 or 2, wherein the near-infrared absorbing dye represented by the formula (SQ 2 ) is a near-infrared absorbing dye represented by the formula (SQ3);

( in formula (SQ3) , Q ¹ , Q ⁴ , Q ⁵ , Q ⁸ , Q ¹¹ , Q ¹⁴ , Q ¹⁵ and Q ¹⁸ each independently represent a carbon atom or a nitrogen atom;
Rs ¹ to Rs ⁵ and Rs ¹¹ to Rs ¹⁵ each independently represent a hydrogen atom, an alkyl group, a sulfo group, —SO ₃ M ¹ or a halogen atom, M ¹ represents an inorganic or organic cation, Rs ² and Rs ³ , Rs ¹² and Rs ¹³ may combine with each other to form a ring;
Rs ²¹ to Rs ²⁸ and Rs ³¹ to Rs ³⁸ are each independently a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, an aralkyl group, an alkoxy group, an aryloxy group, a hydroxy group, —NR ^X1 R ^X2 and a sulfo group. , —SO ₃ M ² , —SO ₂ NR ^X1 R ^X2 , —COOR ^X3 , —CONR ^X1 R ^X2 , a nitro group, a cyano group or a halogen atom, M ² represents an inorganic or organic cation, and R ^X1 to R ^X3 each independently represents a hydrogen atom, an alkyl group, an aryl group, an acyl group or a heterocyclic group; R ^X1 and R ^X2 may ^combine with each other to form a ^ring ; Adjacent groups among Rs ³¹ to Rs ³⁸ may combine with each other to form a ring;
When ^Q1 is a nitrogen atom, ^Rs21 is absent, When ^Q4 is a nitrogen atom, ^Rs24 is absent, When ^Q5 is a nitrogen atom, ^Rs25 is absent, ^Q8 is a nitrogen atom When ^Q11 is a nitrogen atom, ^Rs31 is absent, When ^Q14 is a nitrogen atom, ^Rs34 is ^absent , When ^Q15 is a nitrogen atom, ^Rs35 is absent and Rs ³⁸ is absent when Q ¹⁸ is a nitrogen atom. ) The resin composition according to any one of claims 1 to 3 , wherein the resin contains a resin having a basic group. The resin composition according to any one of claims 1 to 4 , wherein the resin includes an alkali-soluble resin. The resin according to any one of claims 1 to 5 , further comprising a surfactant, and the content of the surfactant is 0.001 to 0.2% by mass based on the total solid content of the resin composition. Composition. The resin composition according to any one of claims 1 to 6 , further comprising a polymerizable compound and a photopolymerization initiator. The resin composition according to any one of claims 1 to 7 , further comprising a coloring material that transmits near-infrared rays and blocks visible light. A film obtained using the resin composition according to any one of claims 1 to 8 . A near-infrared cut filter comprising the film according to claim 9 . A near-infrared transmission filter comprising the film according to claim 9 . A solid-state imaging device comprising the film according to claim 9 . An image display device comprising the film according to claim 9 . An infrared sensor comprising the membrane according to claim 9 .

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