JP7069473B2 - Method for producing high-purity boron trichloride - Google Patents

Method for producing high-purity boron trichloride Download PDF

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JP7069473B2
JP7069473B2 JP2018033491A JP2018033491A JP7069473B2 JP 7069473 B2 JP7069473 B2 JP 7069473B2 JP 2018033491 A JP2018033491 A JP 2018033491A JP 2018033491 A JP2018033491 A JP 2018033491A JP 7069473 B2 JP7069473 B2 JP 7069473B2
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boron trichloride
boron
chlorine
activated carbon
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JP2019147715A (en
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昌志 白井
常実 杉本
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Ube Corp
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本発明は、高純度三塩化ホウ素の製造方法に関する。本発明で得られる高純度三塩化ホウ素は、例えば、アルミニウム配線のドライエッチングガス等として有用な化合物である。 The present invention relates to a method for producing high-purity boron trichloride. The high-purity boron trichloride obtained in the present invention is a compound useful as, for example, a dry etching gas for aluminum wiring.

従来、高純度三塩化ホウ素の製造方法として、例えば、ホスゲン50ppm及び2ppmの塩素を含む三塩化ホウ素と、水分を除去した椰子系活性炭(ケイ素含有量0.12%)とを200℃で接触させ、塩素を活性炭に吸着させることにより、ホスゲン0.1ppm以下及び塩素2ppm以下の高純度三塩化ホウ素を製造する方法が知られている(例えば、特許文献1参照)。 Conventionally, as a method for producing high-purity boron trichloride, for example, boron trichloride containing 50 ppm of phosgene and 2 ppm of chlorine is brought into contact with coconut-based activated carbon (silicon content 0.12%) from which water has been removed at 200 ° C. , A method for producing high-purity boron trichloride having phosgene of 0.1 ppm or less and chlorine of 2 ppm or less by adsorbing chlorine on activated carbon is known (see, for example, Patent Document 1).

また、ホスゲン87.5質量ppm及び10質量ppmの塩素を含む三塩化ホウ素と四ホウ化炭素(炭化ホウ素)とを反応させた後、蒸留して精製することにより高沸点化合物を除去することで、ホスゲンの含有量が0.2質量ppm未満及び塩素の含有量が1.0質量ppm未満である高純度三塩化ホウ素を製造する方法が知られている(例えば、特許文献2参照)。 Further, by reacting phosgene with boron trichloride containing 87.5% by mass and 10% by mass of chlorine with carbon tetraboride (boron carbide), and then distilling and purifying, the high boiling point compound is removed. , A method for producing high-purity boron trichloride having a phosgene content of less than 0.2 mass ppm and a chlorine content of less than 1.0 mass ppm is known (see, for example, Patent Document 2).

特開平10-265216号公報Japanese Unexamined Patent Publication No. 10-265216 特開2013-144644号公報Japanese Unexamined Patent Publication No. 2013-144644

特許文献1の方法では、活性炭中の水分を予め除去しなければならず、また活性炭中に一定量のケイ素を含有させる必要があった。 In the method of Patent Document 1, the water content in the activated carbon must be removed in advance, and the activated carbon needs to contain a certain amount of silicon.

特許文献2の方法では、三塩化ホウ素と炭化ホウ素とを反応させることによってホスゲンと塩素の量が低減できているものの、三塩化ホウ素と炭化ホウ素中の微量成分、例えば、金属成分や表面酸化物などとの反応により、三塩化ホウ素が分解して塩素を発生させるなどの蓋然性があった(比較例1において検証)。 In the method of Patent Document 2, although the amount of phosgene and chlorine can be reduced by reacting boron trichloride with boron carbide, trace components in boron trichloride and boron carbide, such as metal components and surface oxides, can be reduced. There was a possibility that boron trichloride would be decomposed to generate chlorine due to the reaction with the above (verified in Comparative Example 1).

本発明の課題は、即ち、上記問題点を解決し、かつ、簡便な方法により、塩素が低減された高純度三塩化ホウ素の製造方法を提供することにある。 An object of the present invention is to provide a method for producing high-purity boron trichloride in which chlorine is reduced by solving the above-mentioned problems and by a simple method.

本発明の課題は、塩素を含んでいても良い三塩化ホウ素と、炭化ホウ素と活性炭との混合物とを、350℃~800℃で接触させることを特徴とする、高純度三塩化ホウ素の製造方法によって解決される。 An object of the present invention is a method for producing high-purity boron trichloride, which comprises contacting boron trichloride, which may contain chlorine, with a mixture of boron carbide and activated carbon at 350 ° C to 800 ° C. Will be solved by.

本発明により、塩素を含む粗三塩化ホウ素から、高純度三塩化ホウ素を製造することができる。 According to the present invention, high-purity boron trichloride can be produced from crude boron trichloride containing chlorine.

比較例1、2において作製した反応管の模式図である。It is a schematic diagram of the reaction tube produced in Comparative Examples 1 and 2. 実施例1~3において作製した反応管の模式図である。It is a schematic diagram of the reaction tube produced in Examples 1 to 3.

本発明に係る高純度三塩化ホウ素の製造方法では、塩素を含んでいても良い三塩化ホウ素と、炭化ホウ素と活性炭との混合物とを、350℃~800℃で接触させて、高純度三塩化ホウ素を製造する。このため、高純度三塩化ホウ素を好適に製造し得る。 In the method for producing high-purity boron trichloride according to the present invention, boron trichloride, which may contain chlorine, and a mixture of boron carbide and activated carbon are brought into contact with each other at 350 ° C. to 800 ° C. to bring them into contact with each other at 350 ° C. to 800 ° C. to obtain high-purity boron trichloride. Produces boron. Therefore, high-purity boron trichloride can be suitably produced.

本発明においては、塩素を含んでいても良い三塩化ホウ素と、炭化ホウ素と活性炭との混合物とを接触させる。このとき、三塩化ホウ素は、混合物中の炭化ホウ素と接触するため、金属成分や表面酸化物などとの反応により分解し、塩素を発生させるなどの蓋然性がある。 In the present invention, boron trichloride, which may contain chlorine, is brought into contact with a mixture of boron carbide and activated carbon. At this time, since boron trichloride comes into contact with boron carbide in the mixture, there is a possibility that it will be decomposed by a reaction with a metal component, a surface oxide, or the like to generate chlorine.

一方で、三塩化ホウ素の分解によって発生した塩素の一部は、混合物中の炭化ホウ素と反応することにより、三塩化ホウ素へと変換される。未反応の塩素は混合物中の活性炭により処理・除去される。 On the other hand, a part of chlorine generated by the decomposition of boron trichloride is converted into boron trichloride by reacting with boron carbide in the mixture. Unreacted chlorine is treated and removed by activated carbon in the mixture.

このように、三塩化ホウ素が最初から塩素を含んでいても、三塩化ホウ素と炭化ホウ素との接触で塩素が発生した場合であっても、塩素が混合物中の活性炭と接触するため、塩素濃度が低減される。よって、効率的に高純度三塩化ホウ素を製造することができる。 In this way, even if boron trichloride contains chlorine from the beginning, even if chlorine is generated by the contact between boron trichloride and boron carbide, chlorine comes into contact with the activated carbon in the mixture, so that the chlorine concentration Is reduced. Therefore, high-purity boron trichloride can be efficiently produced.

なお、工業的規模の製造方法において、塩素を含んでいても良い三塩化ホウ素中にホスゲンが含まれることがあるが、当該ホスゲンは、高温下(350℃~800℃)で炭化ホウ素と接触することにより、一酸化炭素と塩素に可逆的に分解する(COCl→CO+Cl)。ここで、発生した塩素は活性炭により処理・除去される。 In an industrial scale production method, phosgene may be contained in boron trichloride which may contain chlorine, and the phosgene comes into contact with boron carbide at a high temperature (350 ° C. to 800 ° C.). As a result, it is reversibly decomposed into carbon monoxide and chlorine (COCl 2 → CO + Cl 2 ). Here, the generated chlorine is treated and removed by activated carbon.

なお、本発明においては、これら活性炭による塩素の処理・除去は、吸着が起こらない高温下で行われるため、単なる活性炭による吸着によるものではないと推定される。 In the present invention, it is presumed that the treatment / removal of chlorine by these activated carbons is performed at a high temperature at which adsorption does not occur, and therefore is not simply due to adsorption by activated carbon.

[塩素を含んでいても良い三塩化ホウ素]
本発明において「塩素を含んでいても良い三塩化ホウ素」は、塩素を含むか、塩素濃度が検出限界以下である三塩化ホウ素である。尚、塩素を含んでいても良い三塩化ホウ素は、窒素ガスなどの不活性ガスにより希釈されていても良い。
[Boron trichloride that may contain chlorine]
In the present invention, "boron trichloride which may contain chlorine" is boron trichloride which contains chlorine or whose chlorine concentration is below the detection limit. Boron trichloride, which may contain chlorine, may be diluted with an inert gas such as nitrogen gas.

[粗三塩化ホウ素]
本発明で使用する「粗三塩化ホウ素」は、塩素などの不純物を含む三塩化ホウ素であり、より具体的には、最初から塩素を含む三塩化ホウ素か、三塩化ホウ素と炭化ホウ素との接触により生じた塩素を含む三塩化ホウ素である。なお、粗三塩化ホウ素は、窒素ガスなどの不活性ガスにより希釈されていても良い。
[Coarse Boron Trichloride]
The "crude boron trichloride" used in the present invention is boron trichloride containing impurities such as chlorine, and more specifically, boron trichloride containing chlorine from the beginning or contact between boron trichloride and boron carbide. Boron trichloride containing chlorine produced by. The crude boron trichloride may be diluted with an inert gas such as nitrogen gas.

三塩化ホウ素は、例えば、活性炭に担持させた酸化ホウ素と塩素との反応などによって製造することができる。工業的規模で三塩化ホウ素を製造する場合においては、未反応の残留塩素が三塩化ホウ素中に混入したり、副生したホスゲンなどが三塩化ホウ素中に混入し、粗三塩化ホウ素となる場合がある。工業的規模の製造方法においては、ホスゲンの混入量は、通常、50質量ppm~900質量ppmであり、塩素の混入量が2質量ppm以上である。 Boron trichloride can be produced, for example, by reacting boron oxide carried on activated carbon with chlorine. In the case of producing boron trichloride on an industrial scale, unreacted residual chlorine is mixed in boron trichloride, or phosgene produced as a by-product is mixed in boron trichloride, resulting in crude boron trichloride. There is. In an industrial scale production method, the amount of phosgen mixed is usually 50% by mass to 900% by mass, and the amount of chlorine mixed is 2% by mass or more.

[炭化ホウ素]
本発明で使用する炭化ホウ素としては、例えば、一般的に市販されているものを使用できる。ここで、炭化ホウ素としては、好ましくは粒径が1mm~4mmの粒状のものが用いられる。
[Boron Carbide]
As the boron carbide used in the present invention, for example, commercially available boron carbide can be used. Here, as the boron carbide, granular one having a particle size of 1 mm to 4 mm is preferably used.

[活性炭]
本発明で使用する活性炭としては、例えば、一般的に市販されているものを使用できる。ここで、活性炭としては、好ましくは粒径が2mm~100mmの粒状のものが用いられる。
[Activated carbon]
As the activated carbon used in the present invention, for example, a commercially available one can be used. Here, as the activated carbon, granular carbon having a particle size of 2 mm to 100 mm is preferably used.

[炭化ホウ素と活性炭との混合物における、活性炭に対する炭化ホウ素の体積割合]
本発明における炭化ホウ素と活性炭との混合物における、活性炭に対する炭化ホウ素の体積割合(炭化ホウ素の体積/活性炭の体積)は、好ましくは0.1/1~50/1であり、更に好ましくは0.25/1~20/1である。
[Volume ratio of boron carbide to activated carbon in the mixture of boron carbide and activated carbon]
The volume ratio of boron carbide to activated carbon (volume of boron carbide / volume of activated carbon) in the mixture of boron carbide and activated carbon in the present invention is preferably 0.1 / 1 to 50/1, and more preferably 0. It is 25/1 to 20/1.

[接触条件]
本発明では、例えば、反応装置に炭化ホウ素と活性炭との混合物を充填した後、反応装置の上部より塩素を含んでいても良い三塩化ホウ素を供給する。塩素を含んでいても良い三塩化ホウ素と、炭化ホウ素と活性炭との混合物とを接触させながら反応させることによって、塩素が低減された高純度三塩化ホウ素を得ることができる。
[Contact conditions]
In the present invention, for example, after the reactor is filled with a mixture of boron carbide and activated carbon, boron trichloride, which may contain chlorine, is supplied from the upper part of the reactor. By reacting boron trichloride, which may contain chlorine, with a mixture of boron carbide and activated carbon in contact with each other, high-purity boron trichloride with reduced chlorine can be obtained.

(接触時間)
上記の接触条件における塩素を含んでいても良い三塩化ホウ素と、炭化ホウ素と活性炭との混合物との接触時間は、好ましくは1秒~200秒であり、より好ましくは10秒~50秒である。
(Contact time)
The contact time between boron trichloride, which may contain chlorine under the above contact conditions, and the mixture of boron carbide and activated carbon is preferably 1 second to 200 seconds, more preferably 10 seconds to 50 seconds. ..

(接触温度及び反応圧力)
塩素を含んでいても良い三塩化ホウ素と、炭化ホウ素と活性炭との混合物との接触温度は、好ましくは350℃~800℃であり、より好ましくは400℃~800℃であり、反応圧力は特に制限されない。
(Contact temperature and reaction pressure)
The contact temperature between boron trichloride, which may contain chlorine, and the mixture of boron carbide and activated carbon is preferably 350 ° C. to 800 ° C., more preferably 400 ° C. to 800 ° C., and the reaction pressure is particularly high. Not limited.

次に、実施例を挙げて本発明を具体的に説明するが、本発明の範囲はこれらに限定されるものではない。 Next, the present invention will be specifically described with reference to examples, but the scope of the present invention is not limited thereto.

比較例1(炭化ホウ素と三塩化ホウ素との接触)
図1に示すように、長さ700mm×内径φ38mmの円筒形の石英製反応管1に、炭化ホウ素45mlを充填した。窒素ガス流通下、反応管を600℃まで加熱した後、窒素ガスから三塩化ホウ素ガス(塩素濃度:検出限界未満(0.1質量ppm未満))に切り替えた。三塩化ホウ素ガスの流速は28.6sccmとした。三塩化ホウ素ガスと炭化ホウ素との接触時間は、31秒であった。
Comparative Example 1 (contact between boron carbide and boron trichloride)
As shown in FIG. 1, a cylindrical quartz reaction tube 1 having a length of 700 mm and an inner diameter of φ38 mm was filled with 45 ml of boron carbide. After heating the reaction tube to 600 ° C. under the flow of nitrogen gas, the reaction was switched from nitrogen gas to boron trichloride gas (chlorine concentration: less than the detection limit (less than 0.1 mass ppm)). The flow rate of boron trichloride gas was 28.6 sccm. The contact time between the boron trichloride gas and boron carbide was 31 seconds.

反応管出口の塩素濃度を経時的に測定した結果、2.5時間後に三塩化ホウ素の分解に起因して生成したと考えられる塩素7.7質量ppmが確認された。 As a result of measuring the chlorine concentration at the outlet of the reaction tube over time, 7.7 mass ppm of chlorine, which is considered to be generated due to the decomposition of boron trichloride, was confirmed after 2.5 hours.

実施例1(炭化ホウ素と活性炭との混合物と三塩化ホウ素との接触)
図2に示すように、長さ700mm×内径φ38mmの円筒形の石英製反応管1に、炭化ホウ素と活性炭との混合物(炭化ホウ素45ml/活性炭18ml(炭化ホウ素の体積/活性炭の体積=2.5/1))を充填した。なお、炭化ホウ素の粒径は、3mm~5mmであった。活性炭の粒径は、3mm~8mmであった。窒素ガス流通下、反応管を600℃まで加熱した後、窒素ガスから、三塩化ホウ素ガス(塩素濃度:検出限界未満(0.1質量ppm未満))に切り替えた。三塩化ホウ素ガスの流速は28.6sccmとした。三塩化ホウ素ガスと、炭化ホウ素と活性炭との混合物との接触時間は、43秒であった。
Example 1 (contact of a mixture of boron carbide and activated carbon with boron trichloride)
As shown in FIG. 2, a mixture of boron carbide and activated carbon (boron carbide 45 ml / activated carbon 18 ml (volume of boron carbide / volume of activated carbon = 2.) was placed in a cylindrical quartz reaction tube 1 having a length of 700 mm and an inner diameter of φ38 mm. 5/1)) was filled. The particle size of boron carbide was 3 mm to 5 mm. The particle size of the activated carbon was 3 mm to 8 mm. After heating the reaction tube to 600 ° C. under the flow of nitrogen gas, the reaction was switched from nitrogen gas to boron trichloride gas (chlorine concentration: less than the detection limit (less than 0.1 mass ppm)). The flow rate of boron trichloride gas was 28.6 sccm. The contact time between the boron trichloride gas and the mixture of boron carbide and activated carbon was 43 seconds.

反応管出口の塩素濃度を経時的に測定した結果、1時間から5時間後までの1時間ごとのいずれにおいても塩素濃度は、検出限界未満(0.1質量ppm未満)であり、三塩化ホウ素と炭化ホウ素から発生する塩素は実質的に全て除去されたことが確認された。 As a result of measuring the chlorine concentration at the outlet of the reaction tube over time, the chlorine concentration was below the detection limit (less than 0.1 mass ppm) in every hour from 1 hour to 5 hours later, and boron trichloride. It was confirmed that substantially all the chlorine generated from boron carbide was removed.

実施例2(炭化ホウ素と活性炭との混合物と粗三塩化ホウ素(塩素含有)との接触)
図2に示すように、長さ700mm×内径φ38mmの円筒形の石英製反応管1に、炭化ホウ素と活性炭との混合物(炭化ホウ素40ml/活性炭5ml(炭化ホウ素の体積/活性炭の体積=8/1))を充填した。なお、炭化ホウ素の粒径は、3mm~5mmであった。活性炭の粒径は、3mm~8mmであった。窒素ガス流通下、反応管を600℃まで加熱した後、窒素ガスから、三塩化ホウ素ガス(塩素濃度:検出限界未満(0.1質量ppm未満))と2000質量ppmの塩素を含む窒素ガスに切り替えた。三塩化ホウ素ガス及び2000質量ppmの塩素を含む窒素ガスの流速をそれぞれ、25sccm、0.5sccmとした(三塩化ホウ素ガスと2000質量ppmの塩素とを含む混合ガス(粗三塩化ホウ素ガス)中の塩素濃度:40質量ppm)。三塩化ホウ素ガスと、炭化ホウ素と活性炭との混合物との接触時間は、35秒であった。
Example 2 (Contact between a mixture of boron carbide and activated carbon and crude boron trichloride (containing chlorine))
As shown in FIG. 2, a mixture of boron carbide and activated carbon (boron carbide 40 ml / activated carbon 5 ml (volume of boron carbide / volume of activated carbon = 8 /) is placed in a cylindrical quartz reaction tube 1 having a length of 700 mm and an inner diameter of φ38 mm. 1)) was filled. The particle size of boron carbide was 3 mm to 5 mm. The particle size of the activated carbon was 3 mm to 8 mm. After heating the reaction tube to 600 ° C under the flow of nitrogen gas, from nitrogen gas to nitrogen gas containing boron trichloride gas (chlorine concentration: less than the detection limit (less than 0.1 mass ppm)) and 2000 mass ppm of chlorine. I switched. The flow rates of boron trichloride gas and nitrogen gas containing 2000 mass ppm chlorine were set to 25 sccm and 0.5 sccm, respectively (in a mixed gas containing boron trichloride gas and 2000 mass ppm chlorine (crude boron trichloride gas). Chlorine concentration: 40 mass ppm). The contact time between the boron trichloride gas and the mixture of boron carbide and activated carbon was 35 seconds.

反応管出口の塩素濃度を経時的に測定した結果、6時間後、12時間後、18時間後、24時間後のいずれにおいても塩素濃度は、検出限界未満(0.1質量ppm未満)であり、三塩化ホウ素と炭化ホウ素から発生する塩素は実質的に全て除去されたことが確認された。 As a result of measuring the chlorine concentration at the outlet of the reaction tube over time, the chlorine concentration was below the detection limit (less than 0.1 mass ppm) at any of 6 hours, 12 hours, 18 hours, and 24 hours. , It was confirmed that substantially all the chlorine generated from boron trichloride and boron carbide was removed.

比較例2(炭化ホウ素と三塩化ホウ素との接触)
図1に示すように、長さ700mm×内径φ38mmの円筒形の石英製反応管1に、炭化ホウ素45mlを充填した。窒素ガス流通下、反応管を800℃まで加熱した後、窒素ガスから三塩化ホウ素ガス(検出限界未満(0.1質量ppm未満))に切り替えた。三塩化ホウ素ガスの流速は28.6sccmとした。三塩化ホウ素ガスと炭化ホウ素との接触時間は、31秒であった。
反応管出口の塩素濃度を経時的に測定した結果、1時間後に三塩化ホウ素の分解に起因して生成したと考えられる塩素54質量ppmの生成が確認され、更に3時間後には塩素120質量ppmが確認された。
Comparative Example 2 (contact between boron carbide and boron trichloride)
As shown in FIG. 1, a cylindrical quartz reaction tube 1 having a length of 700 mm and an inner diameter of φ38 mm was filled with 45 ml of boron carbide. After heating the reaction tube to 800 ° C. under the flow of nitrogen gas, the reaction was switched from nitrogen gas to boron trichloride gas (below the detection limit (less than 0.1 mass ppm)). The flow rate of boron trichloride gas was 28.6 sccm. The contact time between the boron trichloride gas and boron carbide was 31 seconds.
As a result of measuring the chlorine concentration at the outlet of the reaction tube over time, it was confirmed that 54 mass ppm of chlorine, which was considered to be generated due to the decomposition of boron trichloride, was produced after 1 hour, and 120 mass ppm of chlorine was further 3 hours later. Was confirmed.

実施例3(炭化ホウ素と活性炭との混合物と三塩化ホウ素との接触)
図2に示すように、長さ700mm×内径φ38mmの円筒形の石英製反応管1に、炭化ホウ素と活性炭との混合物(炭化ホウ素45ml/活性炭18ml(炭化ホウ素の体積/活性炭の体積=2.5/1))を充填した。なお、炭化ホウ素の粒径は、3mm~5mmであった。活性炭の粒径は、3mm~8mmであった。窒素ガス流通下、反応管を800℃まで加熱した後、窒素ガスから、三塩化ホウ素ガス(検出限界未満(0.1質量ppm未満))に切り替えた。三塩化ホウ素ガスの流速は28.6sccmとした。三塩化ホウ素ガスと、炭化ホウ素と活性炭との混合物との接触時間は、43秒であった。
Example 3 (contact of a mixture of boron carbide and activated carbon with boron trichloride)
As shown in FIG. 2, a mixture of boron carbide and activated carbon (boron carbide 45 ml / activated carbon 18 ml (volume of boron carbide / volume of activated carbon = 2.) was placed in a cylindrical quartz reaction tube 1 having a length of 700 mm and an inner diameter of φ38 mm. 5/1)) was filled. The particle size of boron carbide was 3 mm to 5 mm. The particle size of the activated carbon was 3 mm to 8 mm. After heating the reaction tube to 800 ° C. under the flow of nitrogen gas, the reaction was switched from nitrogen gas to boron trichloride gas (below the detection limit (less than 0.1 mass ppm)). The flow rate of boron trichloride gas was 28.6 sccm. The contact time between the boron trichloride gas and the mixture of boron carbide and activated carbon was 43 seconds.

反応管出口の塩素濃度を経時的に測定した結果、20分後には塩素が検出されず、4時間後には1.1質量ppmの塩素が検出された程度であった。 As a result of measuring the chlorine concentration at the outlet of the reaction tube over time, chlorine was not detected after 20 minutes, and only 1.1 mass ppm of chlorine was detected after 4 hours.

以上の結果より、炭化ホウ素を使用した場合には、出口において大量の塩素の発生が確認されたものの、炭化ホウ素と活性炭との混合物を使用した場合には、600℃~800℃において検出限界未満(0.1質量ppm未満)から最大でも1.1質量ppmの塩素しか検出されなかった。 From the above results, it was confirmed that a large amount of chlorine was generated at the outlet when boron carbide was used, but when a mixture of boron carbide and activated carbon was used, it was below the detection limit at 600 ° C to 800 ° C. Only 1.1 mass ppm of chlorine was detected at the maximum from (less than 0.1 mass ppm).

本発明により、高純度三塩化ホウ素の製造方法を提供することができる。 INDUSTRIAL APPLICABILITY According to the present invention, a method for producing high-purity boron trichloride can be provided.

1 石英製反応管
1 Quartz reaction tube

Claims (5)

塩素を含んでいても良い三塩化ホウ素と、炭化ホウ素と活性炭との混合物とを、350℃~800℃で接触させることを特徴する、高純度三塩化ホウ素の製造方法。 A method for producing high-purity boron trichloride, which comprises contacting boron trichloride, which may contain chlorine, with a mixture of boron carbide and activated carbon at 350 ° C to 800 ° C. 塩素を含んでいても良い三塩化ホウ素と、炭化ホウ素と活性炭との混合物との接触時間が1秒~200秒である、請求項1に記載の高純度三塩化ホウ素の製造方法。 The method for producing high-purity boron trichloride according to claim 1, wherein the contact time between boron trichloride, which may contain chlorine, and a mixture of boron carbide and activated carbon is 1 second to 200 seconds. 活性炭は、粒径が2mm~100mmの粒状である、請求項1又は2に記載の高純度三塩化ホウ素の製造方法。 The method for producing high-purity boron trichloride according to claim 1 or 2, wherein the activated carbon is granular with a particle size of 2 mm to 100 mm. 炭化ホウ素は、粒径が1mm~4mmの粒状である、請求項1~3のいずれか一項に記載の高純度三塩化ホウ素の製造方法。 The method for producing high-purity boron trichloride according to any one of claims 1 to 3, wherein the boron carbide is granular with a particle size of 1 mm to 4 mm. 炭化ホウ素と活性炭との混合物における、活性炭に対する炭化ホウ素の体積割合(炭化ホウ素の体積/活性炭の体積)が0.1/1~50/1である、請求項1~4のいずれか1項に記載の高純度三塩化ホウ素の製造方法。 In any one of claims 1 to 4, the volume ratio of boron carbide to activated carbon (volume of boron carbide / volume of activated carbon) in the mixture of boron carbide and activated carbon is 0.1 / 1 to 50/1. The method for producing high-purity boron trichloride according to the above.
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JP2010111550A (en) 2008-11-07 2010-05-20 Ube Ind Ltd High-purity boron trichloride and production method thereof
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