JP7029183B2 - How to defrost and how to use the electrode device for the defroster - Google Patents

Description

The present disclosure relates to a defroster and an electrode device for the defroster.

Due to changes in eating habits due to the declining birthrate and aging population, and advances in freezing technology, we often see frozen foods. Most frozen foods must be thawed and eaten. Conventional thawing methods have been used properly according to the ingredients and cooking purposes, such as natural thawing, blast thawing, and running water thawing. However, these thawing methods take time, and unevenness and drip occur in the thawing state.

For thawing, a thawing function in a microwave oven by a microwave heating method may be used. The frequency of microwaves in a microwave oven is generally 2450 MHz. However, defrosting by the microwave heating method tends to cause surface burning because the wavelength of the microwave is short.

As a good defrosting method, there is a high frequency dielectric heating method in which a high frequency of 3 MHz to 300 MHz is used. Since this high-frequency dielectric heating method has a longer wavelength than the microwave heating method, the object to be defrosted can be heated deeply.

Patent Document 1 discloses a high-frequency defrosting device that performs defrosting by dielectric heating at a high frequency of several to several tens of MHz. The high frequency defrosting device of Patent Document 1 includes a pair of electrodes installed in a defrosting chamber. A high frequency electric field is generated between the pair of electrodes. The object to be thawed is placed between a pair of electrodes and thawed by a high frequency electric field generated between the pair of electrodes.

FIG. 11 schematically shows a pair of electrodes 101 and 102 for conventional high-frequency dielectric heating. The pair of electrodes 101, 102 includes an upper electrode 101 and a lower electrode 102. The oscillator 103 connected to the pair of electrodes 101 and 102 generates a high frequency electric field between the pair of electrodes 101 and 102. The object to be thawed (dielectric) arranged between the pair of electrodes 101 and 102 is thawed by induction heating by a high frequency electric field.

Japanese Patent Application Laid-Open No. 2002-35964

In the case of the electrode structure shown in FIG. 11, the high-frequency energy emitted from the pair of electrodes 101 and 102 includes the first energy 110 emitted in the space sandwiched between the pair of electrodes 101 and 102 and the pair of electrodes. There is also a second energy 111 released outside the space sandwiched between 101 and 102. In the case of the electrode structure shown in FIG. 11, the emission of the second energy 111 is large, so that the efficiency of dielectric heating is lowered.

It is conceivable to adopt the electrode structure shown in FIG. 12 instead of the electrode structure shown in FIG. The electrode structure shown in FIG. 12 has a structure similar to that of a patch antenna. That is, the electrode structure shown in FIG. 12 includes an electrode 121 that radiates a high frequency and a ground electrode 122 that is arranged on the side opposite to the object to be thawed 130 when viewed from the electrode 121. Here, the electrode structure shown in FIG. 12 is referred to as a patch type electrode structure.

As shown in FIG. 12, in the case of the patch type electrode structure, it is considered that high frequency energy can be efficiently radiated to the range directly above the electrode 121 on the opposite side of the ground electrode 122, similarly to the patch antenna.

However, according to the experiment of the present inventor, it was difficult to efficiently thaw the object to be thawed even with the patch type electrode structure as shown in FIG. Therefore, more efficient defrosting is desired. For efficient heating, it is desirable to efficiently increase the electric field energy. As a result of diligent studies, the present inventor has found a structure that efficiently increases the electric field energy.

One aspect of this disclosure is the defroster. The disclosed thawing machine includes a thawing chamber in which a thawing process of an object to be defrosted is performed, and a line-shaped electrode that radiates a high frequency to the object to be defrosted in the thawing chamber. The bending is formed so that a leakage electric field is generated between the first position and the second position different from the first position, and the leakage electric field is applied to the object to be thawed.

Another aspect of the present disclosure is an electrode device. The disclosed electrode device comprises a line-shaped electrode that radiates a high frequency to an object to be thawed, and the line-shaped electrode leaks between a first position in the line-shaped electrode and a second position different from the first position. It is bent so as to generate an electric field, and the leaked electric field is applied to the object to be thawed.

Further details will be described in the embodiments described below.

FIG. 1 is a perspective view of a defroster according to the first embodiment. FIG. 2 is a cross-sectional view of the defroster according to the first embodiment. FIG. 3 is a plan view of the electrode device according to the first embodiment. FIG. 4 is an explanatory diagram of a high frequency voltage and a high frequency current in the line-shaped electrode. FIG. 5 is a diagram of an electric field generated by a line-shaped electrode. FIG. 6 is an explanatory diagram of a voltage in a bent line-shaped electrode. FIG. 7 is a diagram of an electric field generated by a bent line-shaped electrode. FIG. 8 is a side view showing a line-shaped electrode having a laminated structure. FIG. 9 is a plan view showing a line-shaped electrode according to a modified example. FIG. 10 is an explanatory diagram of a high frequency voltage and a high frequency current in the line-shaped electrode. FIG. 11 is a perspective view showing a conventional electrode structure. FIG. 12 is a perspective view showing a patch type electrode structure.

<1. Overview of defroster and electrode device for defroster>

(1) The thawing machine according to the embodiment includes a thawing chamber in which the thawing process of the object to be thawed is performed, and a line-shaped electrode that radiates a high frequency to the object to be defrosted in the thawing chamber. The line-shaped electrode is bent and formed. In the bent-formed line-shaped electrode, a leakage electric field is generated between the first position of the line-shaped electrode and the second position different from the first position. The leaking electric field is applied to the object to be thawed. In the linear line-shaped electrode, a high frequency voltage distribution is generated along the line, and a first electric field is generated by a potential difference due to the distribution of the high frequency voltage along the line. However, in the line-shaped electrode according to the embodiment, the line-shaped electrode is bent and formed, so that a second electric field, which is a leakage electric field, is generated between the first position and the second position. That is, when the line-shaped electrode is bent, the shortest distance connecting the first position and the second position is longer than the first distance between the first position and the second position along the bent line in the line-shaped electrode. A certain second distance is shorter. The electric field increases even if the potential difference between the two points is the same, if the distance between the two points is small. Therefore, the electric field strength of the leakage electric field can be increased by bending the line-shaped electrode.

The bending formation means that the line-shaped electrode has a bent portion at least a part thereof, and the entire line-shaped electrode is non-linear. The bending angle at the bent portion is not particularly limited. The bent portion may be smoothly bent or bent as shown in FIG. The bent line-shaped electrode may be partially linear. Further, "bending is formed" does not limit the manufacturing method of the line-shaped electrode, and therefore, it is not necessary to have a "bending step" in the step of manufacturing the line-shaped electrode. That is, "flexion formed" indicates a bent state.

In the thawing machine according to the embodiment, not only the first electric field but also the second electric field, which is a leakage electric field, is applied to the object to be defrosted. Moreover, since the leakage electric field has high strength and tends to be concentrated in the vicinity of the line-shaped electrode, the electric field energy can be efficiently applied to the object to be defrosted arranged in the vicinity of the line-shaped electrode. Therefore, the electric field energy applied to the object to be thawed increases, and efficient heating is possible.

(2) The line-shaped electrode preferably includes a first line extending from the feeding portion.

(3) The first line preferably has a meander shape. The meander shape makes it easy to increase the line length of the line-shaped electrode in a small space.

(4) It is preferable that the line-shaped electrode further includes a second line extending from the feeding portion in addition to the first line.

(5) The second line preferably has a meander shape.

(6) The second line can have the same line length as the first line.

(7) The second line may have a line length different from that of the first line.

(8) The line-shaped electrode preferably has a line length depending on the frequency of the high frequency.

(9) The line-shaped electrode is preferably composed of a single wire.

(10) The line-shaped electrode is preferably formed of a conductor pattern formed on a substrate.

(11) The line-shaped electrode is preferably made of a conductor plate.

(12) The line-shaped electrode is preferably composed of a plurality of laminated conductor layers.

(13) It is preferable that the defroster further includes a ground electrode arranged on the side opposite to the defrosted object when viewed from the line-shaped electrode. By providing the ground electrode, an electric field can be efficiently applied to the object to be thawed, and the input impedance of the line-shaped electrode can be optimized.

(14) Further provided with an auxiliary ground electrode arranged on the side of the object to be thawed when viewed from the line-shaped electrode, the auxiliary ground electrode is located at a position facing the line-shaped electrode with the object to be defrosted interposed therebetween. It may be arranged at at least one of the lateral positions of the object to be thawed with respect to the line-shaped electrode.

(15) The defroster according to the embodiment can be provided with a plurality of high frequency radiation sources. Each of the plurality of high frequency radiation sources includes a line-shaped electrode. The line-shaped electrode is bent and formed so that a leakage electric field is generated between a first position of the line-shaped electrode and a second position different from the first position, and the leakage electric field is radiated to the object to be thawed. To.

(16) The electrode device according to the embodiment includes a line-shaped electrode that radiates a high frequency to the object to be thawed. The line-shaped electrode is bent and formed so that a leakage electric field is generated between a first position of the line-shaped electrode and a second position different from the first position, and the leakage electric field is applied to the object to be thawed. ..

<2. Examples of defrosters and electrode devices for defrosters>

<2.1 First Embodiment>

The thawing machine 10 shown in FIGS. 1 and 2 includes a housing 20 in which a thawing chamber 30 in which a thawing process of a thawed object (heated object) 60 is performed is formed. The illustrated defrosting chamber 30 includes a bottom surface 31, a top surface 32, a right side surface 33, a left side surface 34, and a back surface (back side surface) 35. The object to be thawed 60 such as food is arranged in the thawing chamber 30 for thawing. The front of the thawing chamber 30 is opened and closed by a door portion (not shown).

The defroster 10 includes an electrode device 40 that serves as a high-frequency radiation source. The electrode device 40 of the embodiment is arranged in the housing 20 so as to be located below the bottom surface 31 which is a position outside the thawing chamber 30. The electrode device 40 is arranged so as to face the thawing chamber 30. Since the electrode device 40 of the embodiment is miniaturized, the defroster 10 is also miniaturized. The defroster 10 of the embodiment may be, for example, as large as a household microwave oven. The electrode device 40 may be provided on any of the surfaces 32, 33, 34, 35 other than the bottom surface 31. Further, the electrode device 40 may be provided on each of two or more of the plurality of surfaces 31, 32, 33, 34 constituting the thawing chamber 30. By arranging the electrode device 40 as a high-frequency radiation source on multiple surfaces, the object to be thawed 60 can be efficiently heated.

The electrode device 40 has a structure similar to the patch type electrode structure described above. That is, as shown in FIGS. 2 and 3, the electrode device 40 includes an electrode 41 that radiates a high frequency and a ground electrode 42 that is arranged on the side opposite to the object to be thawed 60 when viewed from the electrode 41. The electrode 41 of the embodiment is a line-shaped electrode. Since the electrode device 40 has a structure similar to that of the patch type electrode structure, high frequency energy is irradiated from the line-shaped electrode 41 toward the object to be thawed 60. Therefore, the electrode device 40 has better emission efficiency of high frequency energy than the electrode structure shown in FIG. 11, and can be heated efficiently.

A high frequency is supplied to the electrode device 40 via the feeder line 50. The feeder line 50 is composed of, for example, a coaxial cable. The inner conductor (high frequency transmission line) of the coaxial cable is connected to the line-shaped electrode 41, and the outer conductor (ground) of the coaxial cable is connected to the ground electrode 42.

The electrode device 40 includes a substrate 43 having a first surface 43A and a second surface 43B. The first surface 43A is a surface facing the thawing chamber 30 side, and is a surface facing upward in FIG. 2. The second surface 43B is the opposite surface of the first surface 43A, and is a surface facing downward in FIG. 2.

The line-shaped electrode 41 is arranged on the first surface 43A. The line-shaped electrode 41 irradiates the object to be thawed 60 in the thawing chamber 30 with high frequency. The line-shaped electrode 41 is composed of a line-shaped conductor such as a conductive cable. The conductive cable constituting the line-shaped electrode 41 is, for example, a single wire cable. The line-shaped electrode 41 may be configured by a conductor pattern formed on the substrate 43.

The line-shaped electrode 41 has a line length depending on the frequency of the radiated high frequency. The high frequency frequency is preferably in the range of 3 MHz to 300 MHz. The line length depending on the frequency of the high frequency is, for example, 1/2 or 1/4 times the wavelength λ of the high frequency.

Since the wavelength λ of the high frequency is long, the line length of the line-shaped electrode 41, which is determined depending on the frequency of the high frequency, tends to be long. For example, when the high frequency frequency is 40 MHz, the wavelength λ is 7.5 m. When the line length of the line-shaped electrode 41 is set to 1/2 of the wavelength λ, the line length is about 3.7 m.

As shown in FIG. 3, the line-shaped electrode 41 is formed to be bent in a plane. Therefore, even if the line-shaped electrode 41 has a length of, for example, 3.7 m, the area occupied by the line-shaped electrode 41 may be small, and the electrode device 40 can be miniaturized. As a result, even if a high frequency having a long wavelength is used, the mounting area of the electrode device 40 can be reduced, and the electrode device 40 can be arranged in a relatively small housing 20. Further, as shown in FIG. 3, in the plan view of the electrode device 40, the line-shaped electrode 41 is within the range of the region where the ground electrode 42 is formed. In other words, in a plan view, the region where the ground electrode 42 is formed extends around (outside) the curved line-shaped electrode 41.

The line length of the line-shaped electrode 41 is preferably set so as to satisfy the boundary condition for the electrode device 40 to have the optimum impedance. Since the electrode device 40 has the optimum impedance, impedance matching is facilitated and high frequency power can be efficiently supplied.

The ground electrode 42 is composed of a conductive pattern formed on the second surface 43B. The ground electrode 42 is located behind the line-shaped electrode 41, that is, on the side opposite to the thawed object 60 when viewed from the line-shaped electrode 41. The ground electrode 42 reflects the electric field energy emitted from the line-shaped electrode 41 in all directions toward the object to be thawed 60. Since the ground electrode 42 is provided behind the line-shaped electrode 41, the electric field energy can be efficiently applied to the object to be heated 60.

Further, the ground electrode 42 provided behind the line-shaped electrode 41 also has a role of optimizing the impedance of the electrode device 40.

A dielectric member such as a substrate 43 may be present between the line-shaped electrode 41 and the ground electrode 42, or an air layer may be present by omitting the substrate 43.

The defroster 10 shown in FIG. 2 includes auxiliary ground electrodes 45, 46, 47 in addition to the electrode device 40. The auxiliary ground electrodes 45, 46, 47 are arranged on the side of the object to be thawed 60 when viewed from the line-shaped electrode 41. The auxiliary ground electrodes 45, 46, 47 shown in FIG. 2 are one or a plurality of surfaces 32, 32, 33, 34, 35 of the surfaces 31, 32, 33, 34, 35 that partition the thawing chamber 30, other than the surface 31 provided with the electrode device 40. , 33, 34, 35 can be provided. In FIG. 2, the auxiliary ground electrodes 45, 46, 47 are provided on the top surface 32, the side surface 33, and the side surface 34. The top surface 32 is a position facing the line-shaped electrode 41 with the object to be thawed 60 interposed therebetween. The side surface 33, the side surface 34, and the back surface 35 are lateral positions of the object to be thawed when viewed from the line-shaped electrode. The auxiliary ground electrodes 45, 46, 47 are provided inside the housing 20 so as to be located outside the thawing chamber 30 and facing the thawing chamber 30.

By providing the auxiliary ground electrodes 45, 46, 47, the high frequency energy radiated from the electrode device 40 can be efficiently concentrated in the thawing chamber 30. The auxiliary grounds 45, 46, 47 may be omitted.

As described above, the line-shaped electrode 41 having a relatively long line length is bent and formed on the first surface 43A. The line-shaped electrode shown in FIG. 3 has a meander shape. The line-shaped electrode 41 shown in FIG. 3 has a plurality of straight portions, a plurality of bent portions, and a plurality of bent portions between the first end 41A in the longitudinal direction and the second end 41B which is the opposite end of the first end 41A. Has. The bent portion has a bending angle of 180 °. The plurality of straight lines are arranged in parallel with each other.

By bending and forming the continuous line-shaped electrodes 41, a shape in which a plurality of line portions (for example, a straight line portion in FIG. 3) are parallel to each other can be obtained when the line-shaped electrodes 41 are viewed in the line width direction. Since the continuous line-shaped electrodes 41 have a shape having a plurality of parallel line portions, a leakage electric field can be efficiently generated. It should be noted that the plurality of parallel line portions do not have to be linear and may be curved. Further, it is preferable that the intervals between the plurality of parallel line portions are substantially the same.

In FIG. 3, nine linear line portions of the line-shaped electrode 41 are provided, and eight bent portions are provided. Four (plural) bent portions are provided on one end side in the longitudinal direction of the plurality of linear line portions, and four (plural) are provided on the other end side in the longitudinal direction. The number of linear line portions may be further increased. The number of linear line portions is, for example, in the range of 10 to 50 lines, preferably in the range of 20 lines to 40 lines. By appropriately setting the number of linear line portions, the line-shaped electrode 41 can be made compact.

In FIG. 3, the feeding point (feeding portion) 41C to the line-shaped electrode 41 is provided at a position halved of the line length of the entire line-shaped electrode 41. The inner conductor of the coaxial cable, which is a feeder line, is connected to the feeder point 41C. Therefore, the line-shaped electrode 41 includes a first line 141A extending from the feeding point 41C to the first end 41A, and a second line 141B extending from the feeding point 41C to the second end 41B. The first line 141A and the second line 141B each have a meander shape. That is, the first line 141A and the second line 141B each have a plurality of parallel line portions.

The first line 141A and the second line 141B are point-symmetrical with respect to the feeding point 41C. The first line 141A and the second line 141B may be line-symmetrical with respect to the line passing through the feeding point 41C. Since the first line 141A and the second line 141B are arranged symmetrically, the generated electric field can be made uniform. Further, since the first line 141A and the second line 141B are point-symmetrical, the generated electric field can be made more uniform. The symmetric arrangement does not have to be a strict symmetric arrangement, and a substantially symmetric arrangement is sufficient. For example, even if a slight asymmetry occurs due to the convenience of manufacturing or mounting the line-shaped electrode 41, it can be regarded as a substantially symmetrical arrangement.

In the line-shaped electrode 41 shown in FIG. 3, the lengths of the first line 141A and the second line 141B are the same. However, the lengths of the first line 141A and the second line 141B may be different. For example, when the line length of the entire line-shaped electrode 41 is L, the line length of the first line 141A may be (5/8) L and the line length of the second line 141B may be (3/8) L.

FIG. 4 shows a high frequency voltage and a high frequency current generated in the line-shaped electrode 41. The line-shaped electrode 41 shown in FIG. 4 has a linear shape. Further, in the line-shaped electrode 41 shown in FIG. 4, the line length L from the first end 41A to the second end 41B is ½ of the high frequency wavelength λ. In FIG. 4, the feeding point 41C is set at a position halved of the line length L. As shown in FIG. 4, the high-frequency current becomes maximum near the feeding point 41C and decreases as it approaches both ends 41A and 41B. Further, the high frequency voltage becomes almost zero near the feeding point 41C, and the absolute value becomes the maximum at both ends 41A and 41B. For example, the high frequency voltage on the first end 41A side is + Vr_max, and the high frequency voltage on the second end 41B side is -Vr_max.

In the case of the linear line-shaped electrode 41 shown in FIG. 4, an electric field (first electric field) E1 as shown in FIG. 5 is generated. Here, the strength of the electric field E [V / m] when the potential difference between two points having a distance d [m] is V [V] is E = V / d. For example, the potential difference V becomes maximum between the ends 41A and 41B, but the distance d also increases, so that the strength of the electric field E does not increase so much. Further, when focusing on two adjacent points of the line-shaped electrode 41, the distance d becomes small, but the potential difference V also becomes small between the two adjacent points, so that the strength of the electric field (first electric field) E1 is also not so great. It doesn't grow. If the strength of the electric field E1 is small, sufficient electric field energy is not given to the object to be thawed.

On the other hand, when the line-shaped electrode 41 is bent as shown in FIG. 3, a relatively strong leakage electric field (second electric field) can be generated. FIG. 6 shows a plurality of positions 41C, 101, 102, 103, 104, 105, 106, 107, 108 existing on a straight line in the line width direction passing through the feeding point 41C in the bent line-shaped electrode 41 shown in FIG. The potentials V1, V2, V3, V4, V5 in each are shown. In FIG. 6, the potential differences ΔV1, ΔV2, ΔV3, and ΔV4 between adjacent positions in the line width direction are also shown.

In FIG. 6, a potential difference ΔV1 (V2-V1) between the position (first position) 41C and the position (second position) 101 having a size corresponding to the line length L1 between the position 41C and the position 101. Occurs.

Between the position (first position) 101 and the position (second position) 102, the potential difference ΔV2 (= V3-) according to the magnitude of the line length L1 (see FIG. 3) between the position 101 and the position 102. V2) occurs.

Between the position (first position) 102 and the position (second position) 103, a potential difference ΔV3 (= V4-V3) corresponding to the magnitude of the line length L1 between the position 102 and the position 103 is generated.

Between the position (first position) 103 and the position (second position) 104, a potential difference ΔV4 (= V5-V4) corresponding to the magnitude of the line length L1 between the position 103 and the position 104 is generated.

Further, between the position (first position) 41C and the position (second position) 105, a potential difference ΔV1 (V2-V1) having a size corresponding to the line length L1 between the position 41C and the position 105 is generated. ..

A potential difference ΔV2 (= V3-V2) is generated between the position (first position) 105 and the position (second position) 106 according to the magnitude of the line length L1 between the position 105 and the position 106.

A potential difference ΔV3 (= V4-V3) is generated between the position (first position) 106 and the position (second position) 107 according to the magnitude of the line length L1 between the position 106 and the position 107.

A potential difference ΔV4 (= V5-V4) is generated between the position (first position) 107 and the position (second position) 108 according to the magnitude of the line length L1 between the position 107 and the position 108.

Here, let d (see FIG. 3) be the linear distance between each of the two points that cause the potential differences ΔV1, ΔV2, ΔV3, and ΔV4. In this case, as shown in FIG. 7, a leakage electric field (second electric field) E2 having a strength of ΔV1 / d is generated between the position 41C and the position 101. A leak electric field (second electric field) E2 having a strength of ΔV2 / d is generated between the position 101 and the position 102. A leak electric field (second electric field) E2 having a strength of ΔV3 / d is generated between the position 102 and the position 103. A leak electric field (second electric field) E2 having a strength of ΔV4 / d is generated between the position 103 and the position 104.

Similarly, a leakage electric field (second electric field) E2 having a strength of ΔV1 / d is generated between the position 41C and the position 105. A leak electric field (second electric field) E2 having a strength of ΔV2 / d is generated between the position 105 and the position 106. A leak electric field (second electric field) E2 having a strength of ΔV3 / d is generated between the position 106 and the position 107. A leak electric field (second electric field) E2 having a strength of ΔV4 / d is generated between the position 107 and the position 108.

Since the linear distance d between the two points is smaller than the line length L1 between the two points, the leakage electric field (second electric field) is stronger than the above-mentioned electric field (first electric field) E1. Sufficient electric field energy is given to the object to be thawed 60 by the strong electric field (second electric field), and efficient heating can be performed. Moreover, since the two points are close to each other, the generated electric field can be concentrated in the vicinity of the line-shaped electrode 41, and the defrosted object 60 arranged in the vicinity of the line-shaped electrode 41 can be efficiently used. Can be heated.

In order to sufficiently increase the leakage electric field (second electric field) E2, it is preferable that the line-shaped electrode 41 is bent so as to have two points satisfying the following conditions.
Condition: The linear distance d between two points on the line is 1/10 or less, more preferably 1/50 or less, still more preferably 1/100 or less of the line length L1 between the two points.

The irradiation amount of the first electric field E1 applied to the object to be thawed 60 changes according to the distance between the line-shaped electrode 41 and the ground electrode 42. When the distance between the line-shaped electrode 41 and the ground electrode 42 is increased, the amount of electric field irradiation is increased and the defrosting performance is improved. On the other hand, if the distance between the line-shaped electrode 41 and the ground electrode 42 is reduced, it is possible to suppress fluctuations in the electrode impedance due to differences in the quantity of the object to be thawed 60, changes in the state, and the like.

<2.2 Second Embodiment: Stacked line-shaped electrode>

FIG. 8 shows the electrode device 40 according to the second embodiment. The points not particularly described in the second embodiment are the same as those in the first embodiment. The track-shaped electrode 41 of the first embodiment is configured by bending a conductive cable, but the track-shaped electrode 41 of the second embodiment is configured by a conductor plate processed into a meander shape. Machining into a meander shape is performed, for example, by cutting or pressing. Since the line-shaped electrode is processed into a meander shape in advance, a bending step for forming the meander shape becomes unnecessary.

The line-shaped electrode 41 shown in FIG. 8 has a laminated structure in which a plurality (4 sheets) of conductor plates are laminated. That is, the line-shaped electrode 41 has a plurality of conductor layers 241,242,243,244. Since each of the plurality of conductor layers 241,242, 243, and 244 has a surface, the line-shaped electrode 41 having a laminated structure has a larger surface area than the line-shaped electrode made of a single material. By increasing the surface area, the high frequency transmission efficiency due to the skin effect can be increased, and the high frequency transmission loss can be reduced. Therefore, the object to be thawed 60 can be heated more efficiently.

<2.3 Third Embodiment>

9 and 10 show the electrode device 40 according to the third embodiment. The points not particularly described in the third embodiment are the same as those in the first and second embodiments. In the line-shaped electrode 41 of the first embodiment, the feeding point 41C is provided at a position of ½ of the line length, but in the third embodiment, it is provided at the first end 41A. The line length of the line-shaped electrode 41 is 1/2 of the wavelength λ of the high frequency. As shown in FIG. 10, the third embodiment also has the same high frequency voltage and high frequency current distribution as the first embodiment. Therefore, also in the third embodiment, heating using the leakage electric field (second electric field) is possible as in the first embodiment.

<3. Addendum>
The present invention is not limited to the above embodiment, and various modifications are possible.

10: Defroster 20: Housing 30: Defrosting chamber 31: Bottom surface 32: Top surface 33: Right side surface 34: Left side surface 35: Back surface 40: Electrode device 41: Line-shaped electrode 41A: First end 41B: Second end 41C : Feeding point (feeding part)
42: Ground electrode 43: Substrate 43A: First surface 43B: Second surface 45: Auxiliary ground electrode 46: Auxiliary ground electrode 47: Auxiliary ground electrode 50: Feed line 60: Defrosted object 101: Upper electrode 102: Lower electrode 103 : Oscillator 110: First energy 111: Second energy 121: Electrode 122: Ground electrode 130: Object to be thawed 141A: First line 141B: Second line 241: Conductor layer 242: Conductor layer 243: Conductor layer 244: Conductor layer

Claims (15)

It is a method of thawing the object to be thawed using a thawing machine.
The defroster
The thawing chamber where the thawing process of the object to be thawed is performed, and
A line-shaped electrode that radiates a high frequency in the range of 3 MHz to 300 MHz to the object to be thawed in the thawing chamber,
Equipped with
The line-shaped electrode has a first end in the longitudinal direction of the line-shaped electrode and a second end opposite to the first end, and the line length between the first end and the second end is , The line length depends on the frequency of the high frequency due to the emission of the high frequency.
The line-shaped electrode is bent and formed between the first end and the second end, which have a line length depending on the frequency of the high frequency due to the radiation of the high frequency.
The defrosting method is
The leakage electric field generated concentrated in the vicinity of the line-shaped electrode between the first position between the first end and the second end and the second position different from the first position is the defrosted object. The object to be thawed is placed in the vicinity of the line-shaped electrode so as to be given to.
It is provided that the defrosted object arranged in the vicinity of the line-shaped electrode is thawed by the leakage electric field concentrated in the vicinity of the line-shaped electrode.
Decompression method. The defrosting method according to claim 1, wherein the line-shaped electrode includes a first line extending from a feeding portion. The defrosting method according to claim 2, wherein the first line has a meander shape. The defrosting method according to claim 2 or 3, wherein the line-shaped electrode further includes a second line extending from the feeding portion in addition to the first line. The defrosting method according to claim 4, wherein the second line has a meander shape. The defrosting method according to claim 4, wherein the second line has the same line length as the first line. The defrosting method according to claim 4, wherein the second line has a line length different from that of the first line. The defrosting method according to any one of claims 1 to 7, wherein the line-shaped electrode is composed of a single wire. The defrosting method according to any one of claims 1 to 7, wherein the line-shaped electrode is formed of a conductor pattern formed on a substrate. The defrosting method according to any one of claims 1 to 7, wherein the line-shaped electrode is composed of a conductor plate. The defrosting method according to any one of claims 1 to 7, wherein the line-shaped electrode is composed of a plurality of laminated conductor layers. The defrosting method according to any one of claims 1 to 11, wherein the defrosting machine further includes a ground electrode arranged on the side opposite to the defrosted object when viewed from the line-shaped electrode. The defroster further includes an auxiliary ground electrode arranged on the defrosted object side when viewed from the line-shaped electrode.
The auxiliary ground electrode is
The twelfth aspect of claim 12, wherein the object to be thawed is arranged at at least one of the positions facing the line-shaped electrode and the lateral position of the object to be defrosted when viewed from the line-shaped electrode. How to decompress. It is a method of thawing the object to be thawed using a thawing machine.
The defroster is equipped with multiple high frequency radiation sources.
Each of the plurality of high frequency radiation sources includes a line-shaped electrode that emits a high frequency in the range of 3 MHz to 300 MHz .
The line-shaped electrode has a first end in the longitudinal direction of the line-shaped electrode and a second end opposite to the first end, and the line length between the first end and the second end is , The line length depends on the frequency of the high frequency due to the emission of the high frequency.
The line-shaped electrode is bent and formed between the first end and the second end, which have a line length depending on the frequency of the high frequency due to the radiation of the high frequency.
The defrosting method is
The leakage electric field generated concentrated in the vicinity of the line-shaped electrode between the first position between the first end and the second end and the second position different from the first position is the defrosted object. The object to be thawed is placed in the vicinity of the line-shaped electrode so as to be given to.
It is provided that the defrosted object arranged in the vicinity of the line-shaped electrode is thawed by the leakage electric field concentrated in the vicinity of the line-shaped electrode.
Decompression method. It is a method of using an electrode device for a defroster provided with a line-shaped electrode that radiates a high frequency in the range of 3 MHz to 300 MHz to an object to be defrosted.
The line-shaped electrode has a first end in the longitudinal direction of the line-shaped electrode and a second end opposite to the first end, and the line length between the first end and the second end is , The line length depends on the frequency of the high frequency due to the emission of the high frequency.
The line-shaped electrode is bent and formed between the first end and the second end, which have a line length depending on the frequency of the high frequency due to the radiation of the high frequency.
The usage method is
The leakage electric field generated concentrated in the vicinity of the line-shaped electrode between the first position between the first end and the second end and the second position different from the first position is the defrosted object. The object to be thawed is placed in the vicinity of the line-shaped electrode so as to be given to.
It is provided that the defrosted object arranged in the vicinity of the line-shaped electrode is thawed by the leakage electric field concentrated in the vicinity of the line-shaped electrode.
How to use the electrode device for the defroster.

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