JP6998620B1 - Firing plate cleaning device and cleaning method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To use electrolyzed water which has high detergency as a cleaning liquid, does not have a harmful effect on food even if it remains, and requires only a small amount of cleaning water even when cleaning, so that waste liquid treatment is not required and cleaning work can be performed. Provided is an easy-to-use fired plate cleaning device and cleaning method in which the residue does not adversely affect the machine and its surroundings. SOLUTION: The firing plate cleaning device according to the present invention is a firing plate cleaning device attached to a food manufacturing apparatus having a plurality of firing plates circulating by intermittent feeding along the transport direction of the transport device, and is a firing plate cleaning device. A baking plate having a liquid injection nozzle on the upstream side in the return transport direction and a wiping processing unit on the downstream side, in which the firing surface for baking food faces downward, and the injection nozzle and the wiping processing unit are orthogonal to the transport direction. Attached to a moving means that moves along the above, the injection nozzle injects electrolytic water toward the firing surface of the firing plate, and the wiping treatment unit fires the firing plate after a predetermined leaving time has elapsed after the injection of the electrolytic water. It is characterized by wiping off the electrolytic water on the surface. [Selection diagram] Fig. 3

Description

The present invention relates to a fired plate cleaning device and a cleaning method, and particularly uses electrolytic water having high cleaning power as a cleaning liquid, having no harmful effect on food even if it remains, and requiring a small amount of cleaning water even when cleaning. The present invention relates to an easy-to-use fired plate cleaning device and cleaning method, which does not require waste liquid treatment and does not adversely affect the machine and its surroundings due to the residue of the cleaning work.

Food manufacturing equipment that supplies food dough onto a baking plate that is attached to a transport device and circulates, and then fires the food dough while passing it through a baking furnace to process it into baked food is widely used for various foods. ing. Generally, a copper plate or a copper alloy having good thermal conductivity is used for the baking plate of such a food manufacturing apparatus. The fired surface of the baking plate to which the food dough is supplied is often used while undergoing treatments such as removing debris with a rotating brush and supplying oil with an oil wiping device to prevent the food dough from adhering, but it is still used for a long time. When used, stains such as carbon stains gradually become noticeable due to repeated heating of residual components of food dough.

For this reason, in the past, it was necessary to remove the firing plates on a regular basis and wash them manually with a solvent, and the work of cleaning and reattaching dozens of heavy firing plates with just one plate would be a heavy burden. It was.
In order to eliminate the burden of such work, an automatic cleaning device that automatically cleans the fired plate while it is attached to the transport device has also been developed.

Patent Document 1 describes a cleaning device used in a dora-yaki manufacturing device, which includes a solvent tank for supplying a solvent for cleaning, a blower for sucking the waste liquid discharged by cleaning, and a waste liquid sucked by the blower. Rinse by spraying cleaning water from the injection nozzle onto the waste liquid tank to be collected, the coating unit that sprays the solvent sent from the solvent tank onto the upper surface of the firing plate with the coating nozzle, and the upper surface of the firing plate that has been sprayed with the solvent. Disclosed is an automatic cleaning device for a fired plate provided with a water washing unit that sucks the rinsed waste liquid from a suction nozzle with a blower and sends it out to a waste liquid tank.

According to the invention described in Patent Document 1, every time the firing plate is advanced and stopped, cleaning with a cleaning liquid and rinsing with cleaning water are performed, so that the burden on the operator for cleaning the firing plate is greatly reduced. Will be done. However, the device of the present invention uses a solvent for cleaning, and if a chlorine-based solvent that is extremely effective against carbon stains is used, there is a problem in the durability of the sponge and other parts to prevent the solvent from scattering, and the solvent is scattered. It is not easy to prevent. In addition, as a food manufacturing device, it is necessary to rinse sufficiently so that no solvent remains, and there are various problems such as the use of a large amount of washing water and the need for waste liquid treatment equipment that is compatible with the solvent for waste liquid treatment. is doing.
Therefore, although it has high detergency, it does not use a large amount of cleaning water, does not require special waste liquid treatment, and has no adverse effect on the machine and the surroundings due to the residue of the cleaning work. Is desired to be provided.

Japanese Patent No. 5156981

The present invention has been made in view of the problems in the conventional fired plate cleaning apparatus, and an object of the present invention is that the cleaning liquid has high detergency and does not have a harmful effect on food even if it remains. By using electrolytic water that requires only a small amount of cleaning water even when cleaning, we provide an easy-to-use fired plate cleaning device and cleaning method that does not require waste liquid treatment and does not adversely affect the machine and surroundings due to the residue of cleaning work. To do.

The firing plate cleaning device according to the present invention, which has been made to achieve the above object, is a firing plate cleaning device attached to a food manufacturing device having a plurality of firing plates that circulate and travel along the transport direction of the transport device by intermittent feeding. A liquid injection nozzle is provided on the upstream side in the return transport direction with the baking surface for baking food on the baking plate facing downward, and a wiping processing unit is provided on the downstream side. Attached to a moving means that moves along a direction orthogonal to the transport direction of the above, the injection nozzle injects electrolytic water toward the firing surface of the firing plate, and the wiping treatment unit is left for a predetermined time after injection of the electrolytic water. After the lapse of time, the electrolytic water on the fired surface of the fired plate is wiped off.

The electrolyzed water ejected by the injection nozzle is preferably alkaline electrolyzed water having a pH of 12.5 or higher.
It is preferable that the firing plate on which the electrolyzed water is sprayed is heated and has a temperature higher than room temperature.
The injection nozzle is configured to be capable of injecting the electrolytic water or the washing water for washing the electrolytic water by a switching valve. It is preferable to wipe off the sprayed washing water.

The method for cleaning a fired plate according to the present invention, which has been performed to achieve the above object, is a method for cleaning a fired plate by a fired plate cleaning device attached to a food manufacturing apparatus having a fired plate that circulates by intermittent feeding along the transport direction of the transport device. It is a cleaning method, a step of injecting electrolytic water onto the baking surface for baking food on the baking plate by an injection nozzle, and a step of leaving the injected electrolytic water for a predetermined time to raise dirt on the baking plate, and wiping. It is characterized by having a stage of wiping off the dirt raised by the processing portion.

According to the fired plate cleaning device and cleaning method according to the present invention, electrolyzed water is used for cleaning, but 99.9% of the electrolyzed water is water, and even if it remains, it gradually returns to fresh water over time. Unlike chlorine-based solvents that are generally used for cleaning oil stains, they have no harmful effects on processed foods or the human body. In addition, when the solvent is scattered, the components solidify and remain as foreign substances, which creates a risk of foreign substances entering the food and may lead to malfunction of the machine. Therefore, it is necessary to take strict measures to prevent scattering, but electrolyzed water. Is basically water and does not leave foreign matter, and it is not necessary to take measures to prevent scattering as in the case of using a solvent. Further, since a small amount of water is required for cleaning and the amount can be wiped off by the wiping treatment unit, it is not necessary to prepare a waste liquid treatment tank or waste liquid treatment equipment. Further, since the amount of washing water can be supplied by the tank, it is possible to install and operate the firing plate washing device without installing the factory piping for supplying the washing water.

According to the fired plate cleaning device and cleaning method according to the present invention, the electrolyzed water used for cleaning has a high cleaning effect, is effective in removing stains even in a small amount, and does not cause a problem due to residual components even if scattered. It is not necessary to provide a shatterproof means such as a sponge as in the case of cleaning using a solvent.

Further, since the fired plate cleaning device according to the present invention is provided below the return path of the transport device that is not used for food processing, a fired plate cleaning device that can be inlined without lengthening the food manufacturing device is realized. It is possible to do. In particular, when the food manufacturing equipment is equipped with an oil wiping processing device that detachably installs a buff cloth for oil wiping and a wiping processing device that also serves as debris removal, the operation mode can be set between the normal food processing mode and the baking plate cleaning mode. Although it is necessary to separate them, the wiping processing unit of the firing plate cleaning device according to the present invention can also serve as the wiping processing unit of the oil wiping processing device and the wiping processing device, and the firing plate cleaning device is installed more compactly. It becomes possible. Further, in the prior art document shown in Patent Document 1, it is necessary to operate the machine at a speed different from the baking time of the food at the time of washing, but the baking plate cleaning apparatus according to the present invention fires (produces) the food. ) It is possible to perform cleaning operation according to the speed, and it is possible to shorten the time without devoting time other than production to cleaning, and it is also possible to use it without removing dirt and not accumulating dirt.

It is a figure which shows typically an example of the food manufacturing apparatus provided with the firing plate cleaning apparatus by embodiment of this invention. It is a figure which shows schematic structure of the firing plate cleaning apparatus by embodiment of this invention. It is a perspective view which shows schematic structure of the firing plate cleaning apparatus by embodiment of this invention. It is a figure which shows an example of the cleaning effect of the firing plate cleaning apparatus by embodiment of this invention. It is a flowchart for demonstrating the firing plate cleaning method by embodiment of this invention.

Next, a specific example of the embodiment for carrying out the fired plate cleaning device and the cleaning method according to the present invention will be described in detail with reference to the drawings.
FIG. 1 is a diagram schematically showing an example of a food manufacturing apparatus provided with a baking plate cleaning apparatus according to an embodiment of the present invention.

Referring to FIG. 1, in the food manufacturing apparatus 1 provided with the baking plate cleaning device 100 according to the embodiment of the present invention, a plurality of baking plates 11 for conveying the dough to be baked are attached in parallel and circulated by intermittent feeding. It has a transfer device 10 for making the dough, a dough filling machine 20, a baking device 30, a content filling machine 40, a molding device 50, and a taking-out device 60 attached to the transfer device 10.

The baking plate 11 is horizontally conveyed from the most upstream dough filling machine 20 to the most downstream taking-out device 60, and is folded back by a roller portion provided at the downstream end of the conveying device 10. Subsequently, by the return transfer, the baking surface 12 for baking the food is conveyed to the upstream side in a downward direction, folded back by the roller portion provided at the upstream end of the transfer device 10, and again the dough filling machine 20. Return to the position of.

The food manufacturing apparatus 1 supplies the food dough 21 onto the baking surface 12 of the baking plate 11 by the dough filling machine 20, and heats the food in the upper baking portion 31 and the lower baking portion 32 while transporting the inside of the baking apparatus 30. Bake the dough 21. The baked food dough 21 is conveyed to the content filling machine 40, filled with the contents such as cream and bean paste, and then subjected to molding processing such as folding in the molding device 50, and finally the next taking-out device 60 performs the next molding process. It is taken out from the food manufacturing apparatus 1 for the process.

In the food manufacturing apparatus 1 having a plurality of baking plates 11 that circulate in this way, generally, while the baking surface 12 of the baking plate 11 is conveyed facing upward, the food dough 21 supplied to the baking surface 12 varies. After the processed food dough 21 has been processed and taken out, the baking plate 11 is folded back and the return transport path is returned toward the next processing of the food dough 21. The food manufacturing apparatus 1 shown in FIG. 1 is only one embodiment of the food manufacturing apparatus 1 provided with the fired plate cleaning apparatus 100 according to the embodiment of the present invention. The food manufacturing apparatus 1 to which the baking plate cleaning device 100 is applied includes a conveying device 10 in which at least a plurality of baking plates 11 for conveying the dough to be baked are attached in parallel and circulated by intermittent feeding, and the baking plate 11. It is provided with a baking device 30 for baking the food dough 21 placed on the baking surface 12, and does not necessarily have to be equipped with a content filling machine 40, a molding device 50, or the like. Further, the firing device 30 may also have a configuration of only one of the upper firing unit 31 and the lower firing unit 32.

In such a food manufacturing apparatus 1, when the baking step of baking the food dough 21 is repeated, the residue and oil of the food dough component are gradually carbonized and stick to the baking surface 12 of the baking plate 11 as carbon stains. If you continue to use it in this state, the finished condition of the baked food dough 21 will be affected, and if it is left as it is, carbon will peel off from the baked plate 11 and there is a risk of contamination with food, so it is regular. It is necessary to clean the fired plate 11.

The baking plate cleaning device 100 according to the embodiment of the present invention automatically fires without removing the baking plate 11 from the transport device 10 by utilizing the return path of the baking plate 11 which is not used for processing the food dough 21. It is a device for cleaning the plate 11. The firing plate cleaning device 100 is provided below the return transport path of the firing plate 11, and includes a liquid injection nozzle 110 on the upstream side in the return transport direction and a wiping processing unit 120 on the downstream side. With such an arrangement, it is possible to install the food manufacturing apparatus 1 without increasing the external size.

Conventionally, a solvent such as a chlorine-based solvent has been used for cleaning the fired plate 11. When washing with a solvent, it is necessary to wash thoroughly with washing water so that the solvent does not remain after washing. In the case of the integrated food manufacturing apparatus 1 that continuously performs a plurality of processes as shown in FIG. 1, the number of baking plates 11 used is large, and a large amount of washing water is required for washing. In addition, the washing water containing a solvent cannot be drained as it is, and treatment such as waste liquid treatment is required, so that the washing work is not easy.

On the other hand, in the fired plate cleaning device 100 according to the embodiment of the present invention, it is electrolyzed water that is sprayed by the injection nozzle 110 and used for cleaning, and no solvent is used. Since the electrolyzed water used here cleans the fired plate 11 containing copper or a copper alloy as a main component, chloride (NaCl, etc.) is not used as an electrolyte at the time of formation, and chlorine ions (Cl ⁻ ) that cause corrosion do not be used. Electrolyzed water produced using, for example, potassium carbide is desirable. Further, in order to remove the sticky carbon stains, those having high detergency are effective, and it is desirable that the electrolyzed water is strongly alkaline with a pH of 12.5 or higher.

Such electrolyzed water has high permeability, and the ionic components in the permeated electrolyzed water surround the carbon stains and float from the firing surface 12 to exert a cleaning effect. The electrolyzed water used in the fired plate cleaning device 100 according to the embodiment of the present invention is mainly composed of water, and even if it remains, the fired plate 11 does not contain harmful components such as corrosion. A small amount of washing water may be used, and the washing water after being used for washing does not need to be treated with waste liquid.

The higher the temperature of the electrolyzed water, the higher the detergency. Therefore, in general cleaning applications, the electrolyzed water may be heated and used when it is heavily soiled. However, since the fired plate 11 has a very large heat capacity, it cools immediately even if heated electrolyzed water is sprayed, and the effect of heating cannot be expected. Therefore, the firing plate cleaning device 100 according to the embodiment of the present invention injects electrolyzed water onto the firing surface 12 of the firing plate 11 that has been preheated by the firing device 30 of the food manufacturing device 1 to which the firing plate cleaning device 100 is attached. .. The higher the temperature of the fired plate 11, the more the cleaning effect can be expected. However, if the temperature of the fired plate 11 is too high, the electrolyzed water evaporates before it permeates the carbon stains and raises the stains. The temperature is preferably in the temperature range of 80 to 120 ° C.

FIG. 2 is a diagram schematically showing the configuration of a fired plate cleaning device according to an embodiment of the present invention.
Referring to FIG. 2, the firing plate cleaning device 100 according to the embodiment of the present invention is supported by two guide shafts 131 extending in a direction orthogonal to the return transport direction of the firing plate 11 and is supported by a drive motor. A moving means 126 that reciprocates along the guide shaft 131 by a chain 129 that rotates with the rotation of 128 is provided. The moving means 126 is provided with a nozzle mounting shaft 112 extending in the direction opposite to the return transport direction of the firing plate 11, that is, toward the upstream side, and an injection nozzle 110 mounted near the tip of the nozzle mounting shaft 112.

The injection nozzle 110 is installed facing upward so as to face the firing surface 12 which is conveyed downward. The piping tube for supplying the liquid to be injected to the injection nozzle 110 is connected to a supply tank filled with the electrolyzed water 70 so as to inject at least the electrolyzed water 70. In one embodiment, the cleaning of the fired surface 12 with the electrolyzed water 70 is repeated once or a plurality of times to complete the final cleaning with the cleaning water 80. Therefore, the piping tube that supplies the liquid to be injected is branched into two via the switching valve 111 on the way, one is connected to the supply tank filled with the electrolyzed water 70, and the other is connected to the supply source of the washing water 80. .. The source of the washing water 80 may be a water supply or a water supply pipe of a factory, but as described above, since the washing water 80 used in the firing plate cleaning device 100 can be used in a small amount, the washing water 80 is also used as shown in FIG. It may be connected so as to supply the washing water 80 filled in the supply tank.

In order to inject the electrolyzed water 70 or the washing water 80 from the injection nozzle 110, it is necessary to increase the pressure of the electrolyzed water 70 or the washing water 80 and supply it to the injection nozzle 110, but no special pump or the like is required for that purpose. , Commercially available products can be used, and detailed description thereof will be omitted.

The switching of the switching valve 111 is controlled by a control unit of a firing plate cleaning device 100 (not shown). Therefore, for example, the number of firing plates 11 to be attached to the food manufacturing apparatus 1 is registered in the control unit in advance, and the control unit electrolyzes the switching valve 111 when the cleaning of all the firing plates 11 is completed for the specified number of repeated cleanings. It may be configured to switch from the water 70 side to the washing water 80 side.

The electrolyzed water 70 ejected from the injection nozzle 110 may have various injection forms depending on the shape of the opening of the nozzle, but the electrolyzed water 70 can obtain a high cleaning effect even in a small amount, and the firing surface 12 is covered with the electrolyzed water 70. In the embodiment, the electrolyzed water 70 is sprayed in the form of a spray because the amount of the electrolyzed water 70 may be sufficient. The washing water 80 is also sprayed in the same manner.

The electrolyzed water 70 injected from the injection nozzle 110 reaches the firing surface 12 while spreading in a conical shape. Therefore, the injection nozzle 110 moves the electrolyzed water 70 and the washing water while being moved by the moving means 126 so that the electrolyzed water 70 and the washing water 80 to be jetted are distributed on the firing surface 12 of the firing plate 11 which is long in the direction orthogonal to the return transport direction. 80 injections are performed. When the electrolyzed water 70 is sprayed, the amount of the electrolyzed water 70 to be jetted is such that the electrolyzed water 70 wets and spreads over the entire firing surface 12, and the firing surface 12 is covered with the electrolyzed water 70 but does not drip. It is desirable, and in the embodiment, the injection amount of the electrolyzed water 70 is 450 to 500 ml / m ² . When injecting the washing water 80, the injection amount may be the same as the injection amount of the electrolyzed water 70.

When the same product is mass-produced by the food manufacturing apparatus 1, the position and shape of the food dough 21 supplied to the baking plate 11 are fixed. Therefore, in such a case, the carbon stains on the fired plate 11 occur in substantially the same form as the position and shape of the food dough 21 to be supplied. Therefore, in one embodiment, the position for injecting the electrolyzed water 70 can be input and specified in the control unit of the firing plate cleaning device 100, and when the injection nozzle 110 is moved by the moving means 126, each time it moves to the designated position. The electrolyzed water 70 may be sprayed into the water. With such a configuration, it is possible to reduce the amount of electrolyzed water 70 to be used to the minimum necessary.

In another embodiment, the firing plate cleaning device 100 further includes a camera that captures an image of the firing surface 12 and an image recognition unit that recognizes a dirty state of the firing surface 12, and the control unit of the firing plate cleaning device 100 is Based on the recognition data of the image recognition unit, it may be controlled to inject the electrolyzed water 70 toward the area where a predetermined level of carbon stain is recognized. With such a configuration, it is also possible to provide a firing plate cleaning device 100 that notifies the completion of cleaning of the firing plate 11 when the recognition data of the firing plate 11 for one round does not detect a predetermined level of carbon contamination. Will be.

A wiping processing unit 120 is attached to the upper part of the moving means 126 of the firing plate cleaning device 100.
The wiping treatment unit 120 wipes off the carbon stains raised by the effect of the electrolyzed water 70 sprayed on the firing surface 12 together with the remaining electrolyzed water 70. Therefore, the wiping processing unit 120 wipes the firing surface 12 along the longitudinal direction of the firing plate 11 as the moving means 126 moves while the wiping unit 121 provided at the uppermost portion is in contact with the firing surface 12. ..

FIG. 3 is a perspective view schematically showing the configuration of a fired plate cleaning device according to an embodiment of the present invention.
FIG. 3 is a perspective view corresponding to FIG. 2, but the drive motor 128 and the supply tanks for the electrolyzed water 70 and the washing water 80 are omitted.

Referring to FIG. 3, in the return transfer path, the firing plate 11 is intermittently conveyed in the direction of the arrow A with the firing surface 12 facing down, so as to face the firing surface 12 below the firing plate 11. Is provided with a firing plate cleaning device 100 having an injection nozzle 110 and a wiping processing unit 120. The firing plate cleaning device 100 includes bearings 127 individually fitted to the two guide shafts 131 and has a moving means 126 movably attached along the guide shaft 131 in the longitudinal direction of the firing plate 11.

The moving means 126 moves in conjunction with the chain 129 that rotates around the chain sprocket 130 driven by a drive motor 128 (not shown), and the injection nozzle 110 and the wiping processing unit 120 attached to the moving means 126 move. Following the movement of the means 126, it reciprocates along the direction of the arrow B.

The wiping portion 120 is provided with two wiping portions 121 on the uppermost portion of the firing plate 11 facing the firing surface 12, and the two wiping portions 121 are individually attached to the firing surface 12 by two independent sets of elastic means 122. It is designed to come into contact with the force. Further, each wiping portion 121 is provided with a latch opening / closing means 123 and a buff holding lever 124, and a buff cloth 125 attached so as to cover the wiping portion 121 from above is attached and detachably fixed. When replacing the buff cloth 125, the latch opening / closing means 123 is slid to release the latch, and the buff holding lever 124 is opened like the wiping portion 121 on the right side in the drawing. In this state, the used buff cloth 125 can be removed and a new buff cloth 125 can be attached. After replacing the buff cloth 125, the buff holding lever 124 is closed and the latch opening / closing means 123 is returned to complete the fixing.

The pitch of the two wipes 121 is equal to the pitch of the firing plate 11 attached to the transfer device 10, which is also equal to the pitch at which the transfer device 10 intermittently feeds the firing plate 11. With such a positional relationship, by providing two wiping portions 121, the carbon stains lifted by the electrolyzed water 70 are wiped off by the wiping portion 121 on the upstream side, and the finish wiping is performed by the wiping portion 121 on the downstream side. Can be used properly.

Further, the positions of the injection nozzle 110 and the wiping portion 121 are also the pitch of the firing plate 11 attached to the transport device 10 and equal to or an integral multiple of the pitch at which the transport device 10 intermittently feeds the firing plate 11. Install so that they are equal to. The distance between the injection nozzle 110 of the firing plate cleaning device 100 shown in FIGS. 2 and 3 and the wiping portion 121 on the injection nozzle 110 side is twice the pitch of the firing plate 11 attached to the transport device 10. It is installed in.

When the firing plate 11 is stopped at a position facing the injection nozzle 110 due to intermittent feeding, the electrolyzed water 70 is ejected, and the firing surface 12 is covered with the electrolyzed water 70. In the next intermittent feed, the firing plate 11 is fed by one pitch, but since the wiping portion 121 does not face this position, it is left as it is at this position. During this time, the permeation of the electrolyzed water 70 sprayed onto the firing surface 12 into the carbon stains and the floating of the stains proceed. Further, when the fired plate 11 is fed by one pitch in the next intermittent feed, it becomes a position facing the wiping portion 121, so that the wiping portion 121 wipes off the dirt.

The fired plate cleaning device 100 shown in FIGS. 2 and 3 is an embodiment, and its configuration can be variously modified. For example, FIGS. 2 and 3 show a configuration in which two wiping portions 121 are provided, but the number of wiping portions 121 is not limited to two and may be one or three or more. Further, the injection nozzle 110 and the wiping portion 121 on the injection nozzle 110 side are not limited to two pitches of the pitch of the firing plate 11 attached to the transfer device 10, but may be separated by one pitch or three or more pitches. However, in either case, the distance between the injection nozzle 110 and the wiping portion 121 on the injection nozzle 110 side is set to be an integral multiple of the pitch of the firing plate 11 attached to the transfer device 10. Further, when there are a plurality of wiping portions 121, they are similarly installed between the adjacent wiping portions 121 so as to be an integral multiple of the pitch of the firing plate 11.

In order to clean efficiently, it is necessary to leave the electrolyzed water 70 on the fired surface 12 for a predetermined time until the carbon stains come up. However, the injection nozzle 110 and the wiping portion 121 on the injection nozzle 110 side are required. When the distance between the and is one pitch of the firing plate 11 attached to the transport device 10, the stop time after intermittent feeding is adjusted so that the wiping portion 121 starts moving after a predetermined leaving time. Set to.

The food manufacturing apparatus 1 provided with the transfer device 10 and the firing device 30 includes a debris removing device that mechanically removes the debris from the firing surface 12 of the firing plate 11 and an oil wiping device that supplies oil to the firing surface 12. There is something that is equipped with. The wiping processing unit 120 of the firing plate cleaning device 100 can also be used as the wiping processing unit of such a debris removing device or an oil wiping device. That is, in the case of the wiping processing unit 120 having two wiping portions 121 as shown in FIGS. An oil supply unit can be attached to the standby area of the section 121 to be used as an oil wiping device, and when the processing of the food dough 21 is completed, the buff cloths 125 of the two wiping sections 121 can be exchanged to inject the injection nozzle 110. It is possible to switch to the state and perform the cleaning cycle of the fired plate 11. Here, the waiting place is a position where the wiping processing unit 120 is retracted to the outside of the firing plate 11 in order to avoid interference with the firing plate 11 during the transportation of the firing plate 11.
Even if only one wiping unit 121 is provided, the wiping processing unit 120 can be used by switching between the oil wiping device and the wiping unit 121 for cleaning the firing plate 11.

FIG. 4 is a diagram showing an example of the cleaning effect of the fired plate cleaning device according to the embodiment of the present invention. FIG. 4A is a diagram showing a state before cleaning in which carbon stain 13 is attached to the firing surface 12 of the firing plate 11, and FIG. 4B is a diagram showing the firing surface 12 after cleaning with electrolyzed water 70. It is a figure which shows the state.

Referring to FIG. 4A, circular black carbon stains 13 separated by a certain distance are attached to the firing surface 12. This is because when the same product is mass-produced, the supply location and shape of the food dough 21 are fixed, so that the same circular food dough 21 is supplied to the position where the carbon stain 13 is generated on the baking surface 12 and baked. It is the result of repeating what to do.

FIG. 4B shows the state of the firing surface 12 after the firing plate 11 of FIG. 4A is sprayed with electrolyzed water 70 having a pH of 12.5 or higher, left to stand for a predetermined time, and then wiped off 6 times. It is confirmed that the sticking carbon stain 13 has been removed cleanly.
Here, the process of spraying and wiping the electrolytic water 70 is repeated 6 times, but if one cleaning is repeated 6 times of spraying and wiping the electrolytic water 70 as described above, and the washing water 80 is repeated. Assuming that the washing with water is performed three times, the amount of electrolytic water 70 and the washing water 80 used and the washing time in this case are the amount of the solvent and the washing water used in the washing method described in Patent Document 1 and the washing time. The comparison is as follows.

In the invention described in Patent Document 1, the firing plate 11 is composed of 40 sheets, and the cleaning time for each firing plate 11 is 30 seconds. During this period, the solvent is applied and washed with water in the first lap, and two laps are performed. Only wash with water with eyes. Therefore, the cleaning time is
Cleaning time = 40 sheets x 30 seconds x 2 times = 40 (minutes)
The amount of solvent and cleaning water used is
Amount of solvent used = 700 (ml)
Amount of wash water used = 60 (l)
It has become.

On the other hand, in one embodiment of the present invention, the washing time per one of the fired plates 11 may be 4.5 seconds, and the washing of the electrolyzed water 70 is performed 6 times and the washing with the washing water 80 is performed 3 times, for a total of 9 times. Cleaning time = 40 sheets x 4.5 seconds x 9 times = 27 (minutes)
Further, the amount of the electrolyzed water 70 and the washing water 80 used is about 0.05 (l) per one of the fired plates 11 in one embodiment based on the above-mentioned 450 to 500 ml / m ² , so that the total electrolysis is performed. Amount of water 70 used = 0.05l x 40 sheets x 6 times = 12 (l)
Amount of wash water 80 used = 0.05l x 40 sheets x 3 times = 6 (l)
Will be.
As described above, the cleaning time is longer than that of the conventional technique described in Patent Document 1, although the amount of electrolyzed water 70 used for cleaning is longer than that of the solvent, the cleaning time is about 3/4 and the amount of cleaning water 80 is 1/10. Moreover, the washed water after the treatment does not require wastewater treatment, which is very effective.

FIG. 5 is a flowchart for explaining a fired plate cleaning method according to an embodiment of the present invention.
With reference to FIG. 5, the temperature of the firing plate 11 is confirmed in step S500, and when the temperature is lower than the predetermined temperature. The baking plate 11 is heated by the baking apparatus 30 of the food manufacturing apparatus 1 to which the baking plate cleaning device 100 is attached (step S510). The predetermined temperature is, for example, the above-mentioned temperature range of 80 to 120 ° C. Here, for example, when the baking plate 11 is washed after the processing of the food dough 21 is completed, when the temperature of the baking plate 11 is equal to or higher than the predetermined temperature, the step S510 is not heated but cooled to a predetermined temperature by leaving or cooling by blowing air or the like. Try to wait for. When cleaning the fired plate 11 in a situation where the cleaning frequency is high and the degree of carbon stain 13 is light, it is not necessary to heat the fired plate 11 to the above-mentioned predetermined temperature, and in some cases, the steps S500 and S510 may be omitted.

Further, in order to confirm the temperature of the firing plate cleaning device 100, the firing plate cleaning device 100 is provided with a temperature sensor for detecting the temperature of the firing plate 11, and the control unit of the firing plate cleaning device 100 receives data from the temperature sensor. It may be displayed on the monitor or the injection may be controlled based on the data from the temperature sensor.

Next, in step S520, the firing plate cleaning device 100 injects electrolyzed water 70 from the injection nozzle 110 toward the firing surface 12. The injection of the electrolyzed water 70 is performed while moving along the longitudinal direction of the firing plate 11 during the stop time after the intermittent feeding of the firing plate 11.
The fired plate 11 sprayed with the electrolyzed water 70 is left for a predetermined time in order to raise the carbon stain 13 (step S530). This neglect may be secured by adjusting the stop time between intermittent feeds, or an unprocessed position may be sandwiched between the position of the injection nozzle 110 and the position of the wiping portion 121, and intermittently for several pitches. It may be possible to secure a leaving time during feeding.

In step S540, the wiping unit 121 of the wiping processing unit 120 wipes off the raised carbon stain 13 on the fired surface 12, and then it is confirmed in step S550 whether or not the cleaning of the electrolyzed water 70 is completed.

In the case of strong carbon stain 13 as shown in FIG. 4A, it may not be sufficiently cleaned by one cleaning treatment, and in such a case, the treatments of steps S520 to S540 are repeated. The number of repetitions at this time may be such that the operator of the firing plate cleaning device 100 confirms the cleaning state each time and sequentially adds the cleaning if the cleaning is not sufficient, or the control of the firing plate cleaning device 100 is performed in advance. The number of cleanings may be input to the unit, or when the firing plate cleaning device 100 includes a camera and an image recognition unit that recognizes a dirty state of the firing surface 12, the firing plate cleaning device is based on the recognition data. It may be repeated until the control unit of 100 determines the end of cleaning.

When the operator or the control unit of the firing plate cleaning device 100 determines in step S550 that the cleaning with the electrolyzed water 70 is completed, the cleaning water 80 is sprayed onto the firing surface 12 of the firing plate 11 in step S560 and finally wiped. The cleaning water 80 on the firing surface 12 is wiped off by the processing unit 120, and the cleaning of the firing plate 11 is completed (step S570).

Even if the electrolyzed water 70 remains, the fired plate 11 does not contain harmful components and returns to neutral water over time. Therefore, for example, the fired plate 11 is washed after the processing of the food dough 21 is completed. If there is time until the next processing, it is not necessary to add cleaning with the cleaning water 80. In such a case, the flowchart of FIG. 5 omits the step S560 and the step S570, and the washing of the firing plate 11 is finished at the end of the step S550.

Although the embodiments of the present invention have been described in detail with reference to the drawings, the present invention is not limited to the above-described embodiments and is variously modified within the range not departing from the technical scope of the present invention. It is possible to do.

1 Food manufacturing equipment 10 Conveyor equipment 11 Baking plate 12 Baking surface 13 Carbon stain 20 Dough filling machine 30 Baking equipment 40 Content filling machine 50 Molding equipment 60 Extraction device 70 Electrolytic water 80 Cleaning water 100 Baking plate cleaning equipment 110 Injection nozzle 111 Switching valve 112 Nozzle mounting shaft 120 Wipe processing part 121 Wipe part 122 Elastic means 123 Latch opening / closing means 124 Buff holding lever 125 Buff cloth 126 Moving means 127 Bearing 128 Drive motor 129 Chain 130 Chain sprocket 131 Guide shaft

Claims (5)

A firing plate cleaning device attached to a food manufacturing device having a plurality of firing plates that circulate and travel along the transport direction of the transport device by intermittent feeding.
A liquid injection nozzle is provided on the upstream side in the return transport direction with the baking surface for baking food on the baking plate facing downward, and a wiping processing unit is provided on the downstream side.
The injection nozzle and the wiping processing unit are attached to a moving means that moves along a direction orthogonal to the transport direction of the firing plate.
The injection nozzle ejects electrolyzed water toward the fired surface of the fired plate, and the wiping treatment unit wipes off the electrolyzed water on the fired surface of the fired plate after a predetermined leaving time has elapsed after the injection of the electrolyzed water. Firing plate cleaning device. The fired plate cleaning device according to claim 1, wherein the electrolyzed water ejected by the injection nozzle is alkaline electrolyzed water having a pH of 12.5 or higher. The firing plate cleaning device according to claim 1 or 2, wherein the firing plate on which the electrolyzed water is sprayed is heated and has a temperature higher than room temperature. The injection nozzle is configured to be capable of injecting the electrolyzed water or the washing water for washing the electrolyzed water by a switching valve, and after injecting the electrolyzed water and wiping treatment, injecting the washing water.
The fired plate cleaning device according to any one of claims 1 to 3, wherein the wiping processing unit wipes off the sprayed cleaning water. It is a method of cleaning a fired plate by a fired plate cleaning device attached to a food manufacturing apparatus having a fired plate that circulates by intermittent feeding along the conveying direction of the transporting device.
At the stage of injecting electrolyzed water onto the baking surface for baking food on the baking plate with the injection nozzle,
At the stage where the sprayed electrolyzed water is left for a predetermined time to raise the dirt on the firing plate,
A method for cleaning a fired plate, which comprises a stage of wiping off dirt that has been lifted by a wiping processing unit.

Images