JP6941758B2 - Optical shutter device and its manufacturing method, optical device, and image forming method. - Google Patents

Description

The present invention relates to an optical shutter device, a method for manufacturing the same, an optical device, and an image forming method.

A microshutter array in which a large number of minute microshutters are integrated can open and close the microshutters independently by a mechanical operation in response to an external signal. When the micro shutter is open, the light emitted to the shutter portion can be passed through. Further, when the micro shutter is closed, the light emitted to the shutter portion can be shielded. By independently opening and closing the microshutters that are accumulated in large numbers according to a preset light irradiation pattern, an image can be formed by the light passing through the microshutter array. Such a microshutter array is used in an optical device. For example, Patent Document 1 describes a display device using the microshutter array.

Japanese Unexamined Patent Publication No. 2012-252211

Most of the existing methods have a mechanical shutter, and these have various problems such as difficulty in miniaturization, a certain limit in durability, and high cost. For example, in the micro shutter array described in Patent Document 1, since the shutter is opened and closed by a mechanical operation , it is necessary to give a certain strength to the moving portion, and there is a limit to the miniaturization of the shutter size. In addition, material fatigue caused by repeated use causes damage to the members constituting the shutter. In addition, even when the shutter is open, there is a portion other than the shutter opening that does not transmit light, and the aperture ratio, which is the area of the opening in the total area of the micro shutter array, is low, so the light that passes through the micro shutter array. There is a problem that the energy utilization efficiency of the. Further, since it is necessary to apply a voltage independently to the microshutters constituting the microshutter array, when a large number of microshutters are integrated, a complicated manufacturing process is required to form complicated wiring, and the manufacturing cost is increased. Is increasing, and there is a limit to miniaturization.

According to the first aspect of the present invention, there is provided an optical shutter device that integrates a minute optical shutter containing a photochromic material.

According to the second aspect of the present invention, an optical shutter unit containing a photochromic material and
A light source that outputs the first light that projects a light irradiation pattern onto the optical shutter unit,
A light source that outputs a second light to irradiate the optical shutter on which a light irradiation pattern is projected by the first light, and a light source.
Including
In the optical shutter unit on which the light irradiation pattern of the first light is projected,
By partially transmitting or shielding the second light
An optical device is provided that is capable of forming a second light irradiation pattern.

According to the third viewpoint of the present invention, a step of projecting an image formed by modulating the first light with a spatial light modulation element onto an optical shutter unit containing a photochromic material,
A step of forming an image by the second light that partially transmits or shields the optical shutter portion by irradiating the optical shutter portion on which the image is projected with a second light.
An image forming method comprising the above is provided .

According to the present invention, it is possible to contribute to the enrichment of an optical shutter device, its manufacturing method, an optical device, and an image forming method.

It is a figure which showed the arrangement of the microcells which concerns on one Embodiment of this invention. It is a figure which showed the arrangement of the microcells which concerns on one Embodiment of this invention. It is a figure which showed the arrangement of the microcells which concerns on one Embodiment of this invention. It is a figure which showed the cross section of the optical shutter device which concerns on one Embodiment of this invention. It is a figure which showed the cross section of the optical shutter device which concerns on one Embodiment of this invention. It is a figure which showed the cross section of the optical shutter device which concerns on one Embodiment of this invention. It is a figure which showed the cross section of the optical shutter device which concerns on one Embodiment of this invention. It is a figure which showed the structure of the optical apparatus which concerns on 1st Embodiment of this invention. It is a flowchart for demonstrating operation of 1st Embodiment of this invention. It is a figure which showed the structure of the optical apparatus which concerns on the 2nd Embodiment of this invention. It is a figure for demonstrating the operation principle of the 2nd Embodiment of this invention. It is a figure for demonstrating the operation principle of the 2nd Embodiment of this invention.

Hereinafter, the optical shutter device according to the embodiment of the present invention will be described with reference to the drawings. In all the drawings below, the dimensions and ratios of the components are appropriately different in order to make the drawings easier to see.

The optical shutter device of the present embodiment is an optical shutter device in which minute optical shutters including a photochromic material are integrated.

A photochromic material is a material whose color changes reversibly in response to light. When the photochromic material is irradiated with light of a specific wavelength, the absorption spectrum of the compound constituting the photochromic material changes. When the irradiation of light having the specific wavelength is stopped, the photochromic material has the property of returning to its original state of being thermally stable and returning to its original color. In addition, a photochromic material whose color is restored by irradiation with light of another wavelength is also known.

Inorganic, organic and organometallic complexes are known as photochromic materials. The photochromic material used for the optical shutter of the present embodiment is not limited, but the inorganic photochromic material is preferable from the viewpoint of excellent chemical and thermal stability. Specific examples of the inorganic photochromic material include molybdenum oxide, tungsten oxide, niobium oxide, a mixture of tungsten oxide and titanium oxide, silver nanoparticles of titanium oxide, silver halide, copper halide, mercury halide, and oxygen-containing hydrogenation. Examples thereof include ittrium and divanadium pentoxide. Examples of the photochromic material composed of the organometallic complex include 2-aminomethylpyridine platinum complex and ruthenium (II) -polypyridylamine complex.

As the photochromic material of the present embodiment, the organic photochromic material is preferable from the viewpoint of high responsiveness and high color development and decolorization speed. Specific examples of the organic photochromic material include azobenzene derivative, hexaarylbis imidazole derivative, pentaarylbis imidazole derivative, phenoxyl-imidazolyl radical complex, tetraphenylhydrazine derivative, diphenyldisulfide derivative, spiropyran derivative, spiroxazine derivative, and naphthopyrane. Derivatives, metacyclophandiene derivatives, 1-aryl-2-vinylcyclopentene derivatives, anthracene dimer derivatives, tetracene derivatives, N
-Salicylidene aniline derivative, trans-biindenylidene dione derivative, cyclopentenone derivative, propargylalene derivative, 1,4-bisindenidenecyclohexane derivative, flugide derivative, diarylethene derivative, phenoxynaphthenequinone derivative, stillben derivative , Diphenylbutadiene derivative, thioindigo derivative, nitron derivative.

Among the above photochromic materials, a diarylethene derivative is preferable because of its excellent thermal stability, and a hexaarylbisimidazole derivative, a pentaarylbisimidazole derivative, and a phenoxyl-imidazolyl radical complex are preferable because of its high response rate. Among them, [2.2] paracyclophane-crosslinked bisimidazole derivative, pentaaryl bisimidazole derivative, or phenoxyl-imidazolyl radical complex is more preferable because of its high quenching rate.

Further, a compound having a functional group exhibiting photochromic properties in the side chain of the polymerizable functional group is also known. Such a compound is preferable because it can be easily polymerized to form a resin composition, and it can be copolymerized with another polymerizable compound to impart photochromic properties to the resin composition. The photochromic compound having a polymerizable functional group is commercially available from Merck Group, Inc. under the trade name of, for example, Dispersed Red 1 Methacrylate. Further, the polymer compound formed by polymerizing the above-mentioned photochromic compound having a polymerizable functional group includes, for example, poly (dispersred 1 methacrylate) and poly (methylmethacrylate) -co- (dispersed 1 methacrylate). ) Etc. are commercially available from Merck Co., Ltd.

The optical shutter device of the present embodiment integrates minute optical shutters containing a photochromic compound. The optical shutter is preferably composed of microcells capable of reversibly changing the absorption spectrum in response to the first light and changing the transmission pattern of the second light. The optical shutter changes the properties of the members constituting the shutter according to an external signal, and changes the optical properties such as the amplitude, wavelength, phase, frequency, waveform, polarization, optical path, and focal position of the light transmitted through the shutter. It is to be modulated. The optical shutter contains a photochromic material, can change the absorption spectrum of the photochromic compound in response to the first light, and can change the optical physical characteristics of the second light transmitted through the optical shutter. can.

The optical shutter device can be applied to various optical devices, but when used in an optical modeling device, particularly a two-photon microphoton modeling device utilizing the two-photon absorption phenomenon, the second light is 600 nanometers. Wavelengths from meters to 1100 nanometers are preferably used. When used in the two-photon microphoton modeling method, this wavelength region has high transparency of the photosensitive resin to be irradiated with laser light, and induces the two-photon absorption phenomenon without inducing the one-photon absorption phenomenon. It is preferable because it can be used. In this case, the optical shutter of the present embodiment preferably changes the transmittance in the wavelength region of 600 nanometers to 1100 nanometers in response to the first light. For example, [2.2] paracyclophane crosslinked bisimidazole derivative or pentaaryl bisimidazole derivative, phenoxyl-imidazolyl radical complex is not absorbed in the visible light and near infrared light regions in the ground state, and is exposed to ultraviolet light. When excited, it exhibits a wide range of absorption from the visible light region to the near infrared light region, which is preferable.

In this case, the first light is, for example, a third harmonic having a wavelength of 355 nanometers obtained by converting the light output from an ultraviolet laser having a wavelength of 365 nanometers or a YAG laser having a wavelength of 1064 nanometers by a nonlinear optical crystal. A second harmonic having a wavelength of 400 nanometers or the like obtained by wavelength-converting the light output from a near-infrared laser having a wavelength of 800 nanometers by a nonlinear optical crystal can be used. The nonlinear optical crystal used for wavelength conversion is not limited as long as the wavelength of the incident light can be converted to obtain the wavelength of the first light, but for example, a BBO crystal, an LBO crystal, a CLBO crystal, or a KTP crystal. , KDB crystals and the like can be used.

The high-precision light irradiation pattern is that the optical shutter is composed of microcells capable of reversibly changing the absorption spectrum in response to the first light and changing the transmission pattern of the second light. Is preferable because it can be obtained. Here, the "microcell" refers to a microstructure spatially or optically separated from other regions having a size of several tens of nanometers to a millimeter. The size of the microcell is defined by the microcell pitch, which is the sum of the dimension defined by the diameter of the circle circumscribing the microcell and the length of the gap between adjacent microcells. In order to form a highly accurate image, a smaller microcell pitch is preferable, 100 micrometers or less is preferable, 50 micrometers or less is more preferable, and 10 micrometers or less is further preferable.

The optical shutter device of the present embodiment is a collection of a large number of the microcells. The number of the microcells is appropriately selected according to the purpose of the optical device provided with the optical shutter device, but is preferably 100 or more, preferably 1000 or more, in order to form a high-resolution image. It is more preferable that there are 10,000 or more.

The shape of the microcell is not limited and can be any shape. 1 to 3 are views showing the arrangement of microcells according to an embodiment of the present invention. As shown in FIG. 1, it is preferable that the microcell 11 has a circular shape when viewed from a direction orthogonal to the microcell arrangement surface 12 because it is easy to form the microcell 11. Further, as shown in FIGS. 2 and 3, the microcell 11 may have a polygonal shape. Above all, the square or regular hexagon shown in FIGS. 2 and 3 is preferable because the microcells 11 can be accumulated at a high density.

The optical shutter device of the present embodiment is not limited as long as it integrates a large number of the microcells 11, but it is preferable that the microcells 11 are arranged on the microcell arrangement surface 12. The microcell arranging surface 12 is not limited as long as it can hold the microcells, but it is preferable to use a base material made of a material that transmits the first light and the second light. As the base material, it is preferable to use a transparent substrate such as glass, quartz, or plastic because it is highly transparent to the first light and the second light.

The optical shutter device is not limited as long as it integrates a large number of the microcells 11, but from the viewpoint of manufacturing the optical shutter device, for example, those shown in FIGS. 4 to 7 are preferable. 4 to 7 are views illustrating a cross section of the optical shutter device. The optical shutter device may be arranged on a base material as shown in FIG. 4 or 7, or may be embedded in a groove provided in the base material as shown in FIG. , It may be embedded in a hole penetrating the base material as shown in FIG. Among them, those arranged on the base material as shown in FIG. 4 or 7 are preferable because high-density and minute microcells 11 can be accumulated. Further, the shape of the base material is not limited, and may be on a flat plate as shown in FIGS. 4 to 7, and may be a curved surface or a stepped shape depending on the purpose of use of the optical shutter device. Is also good.

The microcell 11 is preferably formed so as to function as a lens. The first function of the microcell 11 is the function as the optical shutter described above, but when it is assumed that the microcell 11 is used in an optical device, the second function is to collect the light transmitted through the microcell 11. Alternatively, it preferably has a function as a diffusing lens. For example, as shown in FIG. 7, by molding the microcell 11 arranged on the base material into the shape of a convex lens, the microcell 11 can be formed to function as a condenser lens. When the microcell 11 is not formed to function as a lens, the light can be focused or diffused by providing a second lens on the optical path of the light transmitted through the microcell 11.

The shape of the microcell 11 is not limited as long as it functions as a lens, but it is preferable that a spherical lens or an aspherical convex lens or a concave lens is formed, and the shape seen from the upper surface is a square lens or a hexagon. Hexagonal lenses are preferable because they can integrate lenses at high density.

The method for manufacturing an optical shutter device of the present embodiment includes a step of setting a pattern of microcells constituting an optical shutter device in which minute optical shutters are integrated, and accumulating microcells containing a photochromic material according to the pattern. It is preferable to include a step.

The step of setting the microcell pattern is a step of enabling the accumulation of microcells containing a photochromic compound according to the designed microcell pattern. For example, a mold making step when molding a resin composition, a photomask making step when forming microcells by a photolithography method, and a nanoimprint mold when forming microcells by a nanoimprint method. The microcell pattern includes a step of making, a step of making a mold when embedding a photochromic compound in a mold by vapor deposition or coating, a step of making a mask when depositing or coating a photochromic material through a mask, and the like. Corresponds to the process of setting.

The step of accumulating microcells containing the photochromic material means a step of arranging a large number of microcells, preferably 100 or more microcells. The photochromic material or the composition containing the photochromic material may be directly arranged, or the photochromic material may be added after forming the microcell with the composition not containing the photochromic material. As described above, the optical shutter device preferably has the microcells arranged on a transparent base material such as glass, quartz, or plastic. It is also possible to embed a photochromic compound or a composition containing a photochromic compound inside the holes of a mesh-like base material having a large number of holes.

The step of accumulating the composition containing the photochromic material is preferably a step of molding the resin composition containing the photochromic material because the step is simple. The resin composition containing the photochromic material can be obtained by mixing the photochromic material, the matrix resin, the solvent and other necessary components. As the matrix resin, those having low reactivity with the photochromic material and those having high transparency are preferable. As such a matrix resin, an acrylic resin, a silicone resin, and an epoxy resin are preferable. Among them, it is preferable to use an acrylic resin as the matrix resin because the photochromic material has high stability and excellent transparency.

Further, it is preferable to use a compound having a functional group exhibiting photochromic properties in the side chain of the above-mentioned polymerizable functional group because a resin composition containing a photochromic material can be easily obtained. For example, the above-mentioned disperse red 1 methacrylate is an acrylic monomer, which can be copolymerized with other acrylic monomers represented by methyl methacrylate, and an acrylic resin composition can be easily obtained. It is preferable because it can be obtained. Further, the above-mentioned poly (methylmethacrylate) -co- (disperse red 1methacrylate) is a polymer compound having a functional group exhibiting photochromic properties in the side chain of an acrylic resin, and is a resin containing a photochromic material as it is. It is preferable because it can be used as a composition or it can be mixed with another polymer compound to obtain a resin composition.

The step of molding the resin composition containing the photochromic material includes, for example, a step of molding using a molding method such as injection molding or extrusion molding using a mold, a step of printing by an inkjet method, and a photochromic compound. Examples thereof include a step of molding by a photolithography method using a photosensitive resin composition, and a step of molding by a nanoimprint method using a photosensitive resin containing a photochromic compound or a thermosetting resin. Above all, the molding step by the photolithography method or the nanoimprint method is preferable because it can form minute microcells.

Further, as a step of accumulating the photochromic material, after forming a microcell using a composition containing no photochromic material, the microcell may be a step of adding a photochromic material or a composition containing a photochromic material. can. Examples of the step of adding the photochromic material or the composition containing the photochromic material include a step of immersing or applying the photochromic material or the composition containing the photochromic material. When the photochromic material is liquid or amorphous, it can be used as it is, and when the photochromic material is dissolved in a solvent, a solution in which the photochromic material is dissolved can be used. Further, a resin composition containing a photochromic material can also be used. The step of immersing or applying the photochromic material or the composition containing the photochromic material is performed so that the microcells are optically separated from each other so that the photochromic material does not come into contact with the gap between adjacent microcells, or the microcells. It is preferable to put a mask between the cells and remove the mask after application or immersion.

As described above, the microcell is preferably formed so as to function as a lens. When the microcell is made of a resin composition containing a photochromic material, the microcell can be formed by molding the resin composition into the shape of a lens. When the above microcell is molded by injection molding or extrusion molding using a mold, or when molding by the nanoimprint method using a mold, the mold or mold is molded by forming a shape corresponding to the lens shape. can do. Further, a lens shape can be formed by forming microcells from a photosensitive resin composition containing a photochromic material by a photolithography method and heating and melting the microcells. This method is preferable because a microcell that functions as a lens can be formed in a simple process.

Another step of accumulating the photochromic material may be a step of removing the mask after accumulating the photochromic material by vapor deposition or coating using a mask having the microcell pattern set. As the mask, for example, a mesh-shaped mask in which a large number of holes are formed in a plate made of metal or the like can be used. By physically vapor-depositing or chemically vapor-depositing a photochromic material on the mask and then removing the mask, a microcell in which a large number of minute patterns of the photochromic material are accumulated can be obtained. Further, by applying the composition containing the photochromic material on the mask and then removing the mask, a microcell in which a large number of minute patterns composed of the composition containing the photochromic material are accumulated can be obtained.

Further, as the mask, a resist mask formed by a lithography method using a photosensitive resin can also be used. When a resist mask is used, a composition containing a photochromic material or a photochromic material is deposited or applied on the resist pattern and between the resist patterns, and then the resist mask is removed by a lift-off method. It is possible to obtain a microcell in which a large number of micropatterns composed of the above are integrated. In this case, the resist mask can be removed by using an organic solvent or a special resist stripping solution composition, and the photochromic material on the resist pattern is also removed together with the resist mask to form the microcell as the photochromic material between the resist patterns. Can be formed.

Further, the step of accumulating the photochromic material may be a step of embedding the photochromic material or the composition containing the photochromic material in the mold. A groove is formed in the transparent base material, and a microcell containing the photochromic material or the composition containing the photochromic material can be formed by vapor deposition or coating of the photochromic material or the composition containing the photochromic material so as to be embedded in the groove. In order to optically separate the microcell containing the photochromic material or the composition containing the photochromic material from other microcells, it is preferable to remove the photochromic material in the portion other than the groove provided on the transparent substrate. The photochromic material in the portion other than the groove can be washed with an organic solvent or the like, or physically removed by a method such as polishing.

Further, as the mold, a mesh-like base material having a large number of holes formed in a plate such as metal can be used. A photochromic material or a composition containing a photochromic material can be embedded in such a mesh-like substrate by vapor deposition or coating to form a microcell containing the photochromic material or the composition containing the photochromic material. In order to optically separate the microcell containing the photochromic material or the composition containing the photochromic material from other microcells, it is preferable to remove the photochromic material in the portion other than the mesh portion of the mesh-like base material. The photochromic material in the portion other than the mesh portion can be physically removed by washing with an organic solvent or the like, or by a method such as polishing.

The microcell made of the photochromic material or the composition containing the photochromic material is preferably sealed with a transparent material because it can stabilize the photochromic material and extend the life of the optical shutter device. The transparent material preferably has high transparency and low reactivity with a photochromic material, and examples thereof include silicon oxide, silicon nitride, aluminum oxide, aluminum nitride, titanium oxide, and titanium nitride. These inorganic transparent materials can be obtained by physical or chemical vapor deposition, or by preparing a composition containing a metal oxide or a nitride and firing it. Further, the transparent material may be an organic substance, and an acrylic resin, a silicone resin, and an epoxy resin are preferable because they have high transparency and low reactivity with a photochromic material.

When the optical shutter device of the present embodiment is used for an optical device such as a display device, a spectroscopic device, or a laser processing device, the optical shutter device can collect or diffuse the light formed by the optical shutter device. It is preferable that the optical device has a lens arranged on an optical path of light passing through the shutter device. The lens is not limited, but is preferably a concave lens or a convex lens which is a spherical lens or an aspherical lens, for example.

The lens arrangement position is not limited as long as it is installed on the optical path of light passing through the optical shutter device of the present embodiment. For example, when the optical shutter device of the present embodiment is used as a display device, a concave lens is provided between the optical shutter device and the image display surface so that an image formed by the optical shutter device can be projected and displayed. It is preferable to provide it. Further, when the optical shutter device of the present embodiment is used as a laser processing device, in order to increase the energy density of the second light and obtain the energy required for processing, between the optical shutter device and the object to be irradiated. It is preferable to provide a condenser lens in the.

The condensing lens is not limited as long as it can condense light, but for example, an oil-immersed objective lens and a water-immersed objective lens can have a numerical aperture of more than 1, and high resolution can be obtained. , Suitable for use. As the above lens, one lens may be used, or a plurality of lenses may be used in combination. Combining a plurality of lenses has the advantage that the refractive index can be adjusted and the aberration can be corrected, but on the other hand, there is a problem that the transmittance of the laser light is lowered. preferable.

As the material of the lens, various materials such as glass, quartz, and resin can be used. The glass lens has an advantage that the coefficient of thermal expansion is small and the optical characteristics are not easily affected by the temperature change of the external environment. Compared with glass lenses, resin lenses have the advantage that they are easy to mold and can easily form various shapes. Further, by using a plurality of resins having different refractive indexes in combination, there is an advantage that the optical characteristics of the lens can be adjusted. Examples of the resin used for the resin lens include, but are not limited to, epoxy resin, silicone resin, and acrylic resin. Further, the calcium fluoride lens can be suitably used because it exhibits high transmittance at a wavelength in the near infrared region used in the laser irradiation apparatus of the present embodiment.

Further, when the optical shutter device of the present embodiment is used in a laser processing device, it is preferable to use a microlens array as the lens because the aberration of the focused light can be reduced. A microlens array is a collection of a large number of microlenses with a size of micrometer to millimeter.

Various materials such as glass, quartz, calcium fluoride, and resin can be used for the microlens array. Glass or quartz lenses have the advantages of low coefficient of thermal expansion and low optical properties that are not easily affected by temperature changes in the external environment. In addition, the calcium fluoride lens has an advantage of high transmittance in a wide wavelength range. Resin lenses have the advantages of being easy to mold and easy to form various shapes. Further, by using a plurality of resins having different refractive indexes in combination, there is an advantage that the optical characteristics of the lens can be adjusted. Examples of the resin used for the resin lens include, but are not limited to, epoxy resin, silicone resin, and acrylic resin.

The microlens array using glass, quartz or calcium fluoride can be produced by a method such as cutting and polishing, press molding or wet etching. The microlens array using a resin can be manufactured by a nanoimprint method or a photolithography method. The nanoimprint method is a method in which a resin is pressed against a mold called a nanoimprint mold to form a mold. A thermal nanoimprint method in which a thermoplastic resin is pressed against a heated nanoimprint mold to form an ultraviolet curable resin composition with ultraviolet rays such as quartz. An ultraviolet nanoimprint method is known in which a nanoimprint mold made of a transparent material is pressed against the nanoimprint mold to irradiate the ultraviolet rays. Above all, it is preferable to manufacture a microlens array by an ultraviolet nanoimprint method because it is possible to perform high-precision molding without thermal expansion and contraction due to heating and cooling. Further, a method in which a photosensitive resin composition is formed into a pattern by a photolithography method and then heated and melted to form a lens is also preferably used because high-precision molding is possible.

The shape of the microlenses constituting the microlens array is not limited, and a circular oval lens, a quadrangular square lens, a hexagonal hexagonal lens, or the like can be used in which the shape of the microlens viewed from above is circular. Of these, a square lens or a hexagonal lens is preferable because the microlenses can be arranged without gaps to increase the energy efficiency of the laser beam. Further, the microlens array preferably has microlenses arranged according to the arrangement of microcells constituting the optical shutter device of the present embodiment.

Further, it is preferable to fill the space between the microshutter array of the present embodiment and the lens with a medium having a high refractive index because the resolution of the laser light irradiation pattern can be increased. As the high refractive index medium, a liquid such as water or oil may be used, or a high refractive index resin or high refractive index glass may be installed between the lens and the object to be irradiated.

FIG. 8 is a diagram showing the configuration of the optical device of the first embodiment. The optical device 1 of the present embodiment includes an optical shutter unit 81 containing a photochromic material, a light source 82 that outputs the first light, and a light source 83 that outputs the second light. The light source 82 that outputs the first light and the light source 83 that outputs the second light may use different light sources as shown in FIG. 8, or the light output from one light source may be used by the beam splitter. It may be divided by such an optical element, and one or both of the divided lights may be modulated by the optical element to obtain the first light and the second light having different wavelengths and phases.

The optical device 1 preferably includes a spatial light modulation element 84 that modulates _{the first light LB 1 to form a light irradiation pattern.} Further, the optical device 1 preferably includes a selective mirror 85 that transmits _{one of the first light LB 1} and the second light LB _{2 and reflects the other.} Further, the optical device 1 preferably includes a lens 86, a stage 88 for holding the irradiated object 87, and a control device 89.

The optical device 1 of the present embodiment _{partially transmits or shields the second light LB 2} by the optical shutter unit 81 that projects the light irradiation pattern of _{the first light LB 1} , and the second light. An irradiation pattern of LB _{2 can be formed.} Here, "passing or shielding" _{does not mean that the second light LB 2} is completely passed or completely blocked, but the amplitude, wavelength, phase, and frequency of _{the second light LB 2 are used.} , The light that has passed through the region irradiated with _{the first light LB 1} of the optical shutter unit 81 by changing at least one of the optical properties such as waveform, polarization, optical path, and focal position, and the first This means that the light that has passed through the region that is not irradiated with the _{light LB 1 has different optical properties.}

When the optical device 1 of the present embodiment is used as a laser processing device, when an _{ultraviolet laser or a visible light laser is used as the first light LB 1} , the optical shutter portion 81 containing a photochromic material is irradiated and its absorption spectrum is changed. It is preferable because it is suitable for making. Further, it is preferable to use a near-infrared laser or an infrared laser as the second light LB _{2 because it is suitable for processing various materials.} Said second light LB _2, out of the optical shutter unit 81, when transmitting the portion irradiated with the first light LB _1, is absorbed by the first photochromic material that is excited by light LB _1, energy The density decreases. On the other hand, in the _{portion not irradiated with the first light LB 1} , the photochromic material is not excited and _{the absorption of the second light LB 2} is small, so that the decrease in energy density is small. _{The energy density of the second light LB 2} that has passed through the portion irradiated with the first light LB ₁ is equal to or less than the energy threshold required for processing by the laser processing apparatus, and the first light LB ₁ is not irradiated. _{By adjusting the energy density of the second light LB 2} that has passed through the portion to be equal to or higher than the energy threshold, _{a light irradiation pattern by the second light LB 2} is formed and used in the laser processing apparatus. Can be done.

When the optical device 1 of the present embodiment is used as a laser processing device, the optical shutter unit 81 is a photochromic material that reversibly changes the absorption spectrum in response to ultraviolet rays or visible rays and changes the transmission pattern of near infrared rays or infrared rays. It is preferable that it contains. Among such photochromic materials, [2.2] paracyclophane crosslinked bisimidazole derivative, pentaaryl bisimidazole derivative, and phenoxyl-imidazolyl radical complex are excited by ultraviolet irradiation, and in the excited state, they are in the visible light region. Since it exhibits a wide range of absorption from to near-infrared light region, it can be preferably used.

The optical shutter 81 may include a photochromic material, in a state where no irradiation with the first light LB _1, transmitted through the second light LB _2, in a state irradiated with the aforementioned first light LB _1, the It is not limited as long as it can shield the second light LB ₂ , but for example, a thin film containing a photochromic material is placed on a base material that transmits _{the first light LB 1} and the second light LB _2. The formed one can be used. When the irradiation pattern of the first light LB ₁ is projected onto the thin film, the absorption spectrum of the portion irradiated with _{the first light LB 1 changes.} Of the thin films, the portion irradiated with _{the first light LB 1 shields the second light LB 2} , and the portion not irradiated with the first light LB ₁ is the second light. Those that are transparent to LB _{2 are preferable.} Here, "shielding" and "transmission" are as described above. The thin film used for the optical shutter unit 81 is included in the optical shutter unit 81 and the wavelengths of _{the first light LB 1} and the second light LB ₂ so that the thin film functions as an optical shutter. It is preferable to appropriately select the photochromic material to be used.

It is preferable that the optical shutter unit 81 is an optical shutter device in which a minute optical shutter containing a photochromic material is integrated, because an irradiation pattern of _{the second optical LB 2 having a high resolution can be obtained.} The embodiment of the optical shutter device is as described above.

The light source 82 that outputs the first light LB ₁ is not limited as long as it irradiates the photochromic material to change its absorption spectrum, but it can change the absorption spectrum of various photochromic materials. An ultraviolet laser light source or a visible light laser light source is preferable. Above all, it is preferable to use a solid-state laser having a wavelength of 365 nanometers as the light source 82 because a stable output can be obtained. Further, since a high-power ultraviolet laser can be obtained, a YAG (ythrium aluminum garnet) laser having a wavelength of 1064 nanometers is used as the light source 82, and the wavelength is converted by a nonlinear optical crystal to obtain a wavelength of 355 nanometers. It is preferable to use the third harmonic as the first optical LB _1. Further, since a high-power ultraviolet laser can be obtained, a titanium sapphire laser having a wavelength of 800 nanometers is used as the light source 82, and the wavelength is converted by a nonlinear optical crystal to obtain the second harmonic having a wavelength of 400 nanometers. It is preferable to use it as one light LB _1.

Since the light source 82 continuously changes the irradiation pattern of the output light, it is preferably a pulse laser, and more preferably an ultraviolet pulse laser laser. In order to change the irradiation pattern of the first light LB ₁ at high speed, the oscillation frequency of the pulse laser is preferably 100 hertz or more, and more preferably 1 kilohertz or more. The light source 82 is preferably driven in synchronization with the light source 83, the spatial light modulation element 84, and the stage 88, and preferably has a maximum oscillation frequency of several hundred kilohertz or 1 megahertz or more and can adjust the oscillation frequency. ..

The output of the light source 82 is not limited as long as the optical shutter unit 81 can excite a photochromic material to change the absorption spectrum. Considering that the first light LB ₁ is divided into a large number of laser lights by the spatial light modulation element 84, the output of the light source 82 is preferably a certain value or more. Specifically, the maximum output of the light source 82 is preferably 1 milliwatt or more, more preferably 100 milliwatts or more, further preferably 1 watt or more, and it is preferable that the output can be adjusted to the maximum output or less.

In order to change the irradiation pattern of the first light LB ₁ at high speed, the shorter the pulse width of the pulsed laser light output from the light source 82, the more preferable. Specifically, 1 microsecond or less is preferable, 100 nanoseconds or less is more preferable, and 10 nanoseconds or less is more preferable. The first irradiation pattern of the light LB ₁ by irradiating the optical shutter 81, when forming the second irradiation pattern of the light LB _2, and the second pulse width of the light LB _2, the optical It is preferable to appropriately set the pulse width of _{the first optical LB 1 in} consideration of the color development time and the decolorization time of the photochromic material contained in the shutter unit 81. Therefore, as the light source 82 that outputs the first light, it is preferable that the minimum pulse width is 10 nanoseconds or less and the pulse width can be adjusted.

When a laser light source is used as the light source 82 that outputs the first light LB ₁ , the beam cross-sectional area of the output laser light is not particularly limited, but in order to avoid energy loss of the laser light, the entire laser light is used. Since the laser light irradiation pattern is formed by the space light modulation element 84, it is preferably smaller than the area of the light receiving portion of the space light modulation element 84. Specifically, the beam diameter of the laser beam is preferably 30 mm or less, and more preferably 15 mm or less. Further, in the spatial light modulation element 84, _{the area for receiving the first light LB 1} is set to a certain area or more to form a high-resolution laser light irradiation pattern, so that the beam of the first light LB ₁ is cut off. The area is preferably a certain amount or more. Specifically, the beam diameter of the second light LB ₁ is preferably 1 mm or more, and more preferably 3 mm or more. When the beam diameter of the first light LB ₁ is out of the preferable range, the beam diameter can be adjusted by using a laser beam aligner or the like.

Such an ultraviolet pulse laser is not limited, but for example, Quasar 355-60 (registered trademark) manufactured by Spectra Physics is preferable from the viewpoint of wavelength, output, frequency, pulse width, and beam diameter.

The light source 83 that outputs the second light LB ₂ can be appropriately selected according to the purpose of the optical device 1 of the present embodiment. When the optical device of the present embodiment is used in a laser processing device, particularly a two-photon microphoton modeling device, as described above, light having a wavelength of 600 nanometers to 1100 nanometers is preferably used as _{the second light LB 2.} .. In this case, the photochromic material used in the optical shutter device 81 has a transmittance in the wavelength region of 600 nanometers to 1100 nanometers by irradiation _{with the first light LB 1 having a wavelength of about 360 nanometers.} It is preferable that the For example, [2.2] paracyclophane cross-linked bisimidazole derivative or pentaaryl bisimidazole derivative, phenoxyl-imidazolyl radical complex exhibits a wide range of absorption from the visible light region to the near infrared light region by ultraviolet irradiation. preferable. Further, when a pulse laser is used as the light source 82 for outputting the first light LB ₁ , the photochromic material continuously changes the light irradiation pattern, so that the response speed to light is high, and high-speed light emission and high speed are achieved. Those that can be extinguished are preferable. The above-mentioned [2.2] paracyclophane cross-linked bisimidazole derivative, pentaaryl bisimidazole derivative, and phenoxyl-imidazolyl radical complex have a high response speed to light, and are capable of high-speed emission and high-speed quenching. , Can be preferably used.

When the optical device 1 of the present embodiment is used in a two-photon microphoton modeling device, a high photon density is required to induce a two-photon absorption phenomenon. In this case, _{as the light source 83 that outputs the second light LB 2} , an ultrashort pulse laser is preferable because a high output can be instantaneously obtained and the photon density can be increased. As the ultrashort pulse laser, a device using various laser media such as titanium sapphire, dye, hypersaturated absorber, erbium-doped fiber, and itterbium-doped fiber can be used, but stable high-power laser oscillation can be used. A titanium sapphire laser that enables this is preferable.

The specifications of the light source 83 that outputs the second light LB ₂ are not limited as long as the laser light used for the optical device 1 of the present embodiment is output. For example, when the optical device 1 is used in a two-photon microphoton modeling device, energy exceeding the reaction threshold of the photosensitive resin composition to be irradiated is required, so that a high output can be obtained instantaneously. A pulsed laser is preferably used. In this case, the higher the average output of the pulse laser, the larger the pulse energy can be obtained. Therefore, the average output of the pulse laser is preferably 100 milliwatts or more, more preferably 1 watt or more, and 5 watts or more. It is more preferable to have. The upper limit of the average output of the pulse laser is not limited, but it is preferable that the output of 10 watts or more is possible and the average output can be adjusted.

When a pulsed laser light source is used as the light source 83 for outputting the second light LB ₂ , the lower the repetition frequency of the pulsed laser light source, the larger the pulse energy can be obtained. On the other hand, if the repetition frequency is low, when the optical device 1 of the present embodiment is used in the two-photon microphoton modeling device, the processing time for manufacturing the three-dimensional structure becomes long. From the viewpoint of pulse energy, the repetition frequency of the pulsed laser light source is preferably 100 kHz or less, and more preferably 10 kHz or less. From the viewpoint of processing time, the repetition frequency of the pulsed laser light source is preferably 100 hertz or more, and more preferably 500 hertz or more.

As the pulsed laser light source, an ultrashort pulse laser, particularly a so-called femtosecond laser capable of laser oscillation having a pulse width of 1 picosecond or less is preferably used. The femtosecond laser has an extremely short pulse width of the output laser light, and can output a pulsed laser light having a high peak power. The pulse width of the light output from the pulsed laser light source is preferably 1 picosecond or less, more preferably 500 femtoseconds or less, and even more preferably 200 femtoseconds or less from the viewpoint of peak power. The lower limit of the pulse width of the pulsed laser light source is not limited, but when the pulse width is 1 femtosecond or less, it is necessary to consider increasing the size and price of the pulsed laser device.

As described above, the wavelength of the light output from the second light source 83 is preferably 600 nanometers to 1100 nanometers. The wavelength of the pulsed laser light source is preferably 600 nanometers to 1100 nanometers, more preferably 700 nanometers to 900 nanometers, from the viewpoint of the oscillation efficiency of the titanium sapphire laser preferably used as the second light source 83. It is preferred, more preferably 750 nanometers to 850 nanometers.

When a laser light source is used as the light source 83 for outputting the second light LB ₂ , the beam cross-sectional area of the output laser light is not particularly limited, but in order to avoid energy loss of the laser light, the entire laser light is used. Since the laser light irradiation pattern is formed by the optical shutter portion 81 of the present embodiment, it is preferably smaller than the area of the optical shutter portion 81. Specifically, the beam diameter of the laser beam is preferably 30 mm or less, and more preferably 15 mm or less. Further, in order to form a high-resolution laser light irradiation pattern by making the area transmitted by _{the second light LB 2 of the} optical shutter unit 81 equal to or larger than a certain level, the beam cross-sectional area of _{the second light LB 2 is formed.} Is preferably above a certain level. Specifically, the beam diameter of the second light LB ₂ is preferably 1 mm or more, and more preferably 3 mm or more. When the beam diameter of the second light LB ₂ is out of the preferable range, the beam diameter can be adjusted by using a laser beam aligner or the like.

The femtosecond laser product that can be suitably used for the optical device 1 of the present embodiment of the light source 83 that outputs the second light LB _{2 is not limited, but is limited to Spectra Physics, Coherent, Cyber Laser, and the like.} Products commercially available from can be used. For example, Solstice Ace®, manufactured by Spectra Physics, is preferred from the standpoint of average output, repetition frequency, pulse width, wavelength and beam diameter.

Further, when the output of the femtosecond laser product used as the light source 83 is small and the required pulse energy cannot be obtained, the output can be increased by using a laser amplifier or the like.

In the optical device 1 of the present embodiment, _{it is preferable that the first optical LB 1} has a light irradiation pattern formed by the spatial light modulation element 84 and is irradiated to the optical shutter portion 81. Here, the first light LB ₁ can irradiate the optical shutter portion 81 from any direction, but as shown in FIG. 8, the first light LB ₁ and the second light Irradiation of LB ₂ coaxially is preferable because it is possible to form a high-resolution irradiation pattern of the second light. In order to irradiate the first light LB ₁ and the second light LB ₂ coaxially, as shown in FIG. 8, a selection _{that reflects the first light LB 1} and transmits the second light LB _2. It is preferable to use the target mirror 85. On the contrary, a selective mirror that _{transmits the first light LB 1} and reflects the second light LB _{2 may be used.} Such a selective mirror is not limited as long as it is an optical element having a property of reflecting or transmitting wavelength-selectively, but is called, for example, a cold mirror that reflects ultraviolet rays and visible rays and transmits near infrared rays and infrared rays. Optical elements can be used.

The optical device of the present embodiment preferably includes the spatial light modulation element 84 in order to form the irradiation pattern of _{the first optical LB 1.} The spatial light modulator (SLM), also called a Spatial Light Modulator (SLM), is an element that modulates the spatial distribution of light such as amplitude, phase, and polarization. The spatial light modulation element 84 is _{not limited as long as it can form the irradiation pattern of the first optical LB 1} , and examples thereof include a microshutter array and a digital micromirror device.

As the microshutter array, for example, the microshutter array described in Patent Document 1 can be used. Patent Document 1 describes a mechanical microshutter array. The microshutter constituting the mechanical microshutter array is provided with a microshutter on a substrate having a large number of minute openings, and the microshutter is electrostatically generated by a potential difference given between the substrate and the microshutter. By sliding by action, the large number of minute openings can be opened and closed independently. The configuration and manufacturing method of the sliding microshutter array are described in detail in Patent Document 1.

It is preferable to use a digital micromirror device as the spatial light modulation element 84 because a high-resolution light irradiation pattern can be obtained. The digital micromirror device _{reflects the first light LB 1} to form a light irradiation pattern. The digital micromirror device is an element provided with a drive mechanism in which a large number of minute micromirrors are arranged on a substrate and the angle of the micromirrors with respect to the substrate can be changed independently. As the digital micromirror device, a large number of rectangular micromirrors having a size of about 5 to 20 micrometers on each side are arranged on the substrate in two directions orthogonal to each other, and the angle of each micromirror with respect to the substrate can be changed. It is preferable that the element is provided with a drive mechanism. By using such a digital micromirror device, the micromirror can be arranged without a gap on the substrate, and the energy efficiency of _{the first optical LB 1 can be improved.} Further, as the digital micromirror device, square micromirrors having a side of about 10 micrometers are arranged on a substrate in a total of about 5 to 2000 pieces in each side direction, for a total of about 250,000 to 4 million pieces. An element having a drive mechanism capable of changing the angle of the mirror with respect to the substrate is more preferable from the viewpoint of the resolution of the laser light irradiation pattern. As shown in FIG. 8, _{it is preferable that the entire first} light LB 1 is irradiated and reflected on the digital micromirror device from the viewpoint of light energy utilization efficiency.

The digital micromirror device has a mechanism for independently changing the angle of the micromirrors arranged on the substrate with respect to the substrate as described above. As shown in FIG. 8, the mechanism is used _{to switch between a portion that reflects the first light LB 1} and irradiates the selective mirror 85 and a portion that does not irradiate the selective mirror 85. The angle of the micromirror is set so as to irradiate the selective mirror 85 in the portion of the first light LB _{1 that irradiates the selective mirror 85.} Of the first light LB _1, the portion that does not irradiate the selective mirror 85 also reflects the first LB 1, but the angle of reflection is different from that of the portion that irradiates the selective mirror 85. The target mirror 85 is not irradiated. The first light LB ₁ irradiated to the selective mirror 85 is reflected by the selective mirror 85, and 81 is irradiated to the optical shutter portion. _{In this way, the irradiation pattern of the first light LB 1} formed by the digital micromirror device is transferred to the optical shutter unit 81. When the first light LB ₁ is a high-energy laser light, the portion of the first light LB ₁ that does not irradiate the selective mirror 85 is a laser beam damper or a laser beam trap. , It is preferable for safety to terminate with a device called a laser beam diffuser or the like that absorbs laser light.

In the optical device 1 of the present embodiment, _{the incident angle at which the first optical LB 1} is incident on the spatial light modulation element 84 can be appropriately selected according to the spatial light modulation element 84. For example, when a microshutter array is used as the spatial light modulation element 84, _{it is highly likely that the first light LB 1} is vertically incident on the surface on which the microshutter is arranged and passes through the opening of the microshutter. It is preferable because an irradiation pattern of light output from the light source 82 that outputs the first light at a resolution can be obtained. When a digital micromirror device is used as the spatial light modulation element 84, the incident angle defined by the angle formed by the incident light and the line perpendicular to the digital micromirror device is smaller, and the closer to the vertical incident, the smaller the incident angle. This is preferable because the irradiation pattern of the first light LB _{1 can be obtained with high resolution.} In this case, as shown in FIG. 8, the first light LB ₁ may be directly applied to the digital micromirror device, but the light source 82 that outputs the first light in order to adjust the incident angle It is also possible to reduce the angle of incidence by arranging one or more mirrors.

The dimensions of the digital micromirror device are determined by the dimensions of the micromirrors constituting the digital micromirror device, the micromirror pitch formed by the gap between the micromirrors, and the number of the micromirrors. The dimensions of the digital micromirror device are not limited as long as they can reflect the light output from the first light source 82 and form an irradiation pattern of light by the optical device 1 of the present embodiment, but the micromirror pitch is limited. The smaller the value, the higher the resolution of the irradiation pattern, which is preferable. Specifically, the micromirror pitch is preferably 20 micrometers or less, and more preferably 10 micrometers or less. Further, the larger the number of the micromirrors is, the higher the resolution of the irradiation pattern can be formed, which is preferable. Further, as the number of the micromirrors increases, the size of the reflective surface of the digital micromirror device increases, and the area of the reflective surface increases the beam interruption of the light output from the light source 82 that outputs the first light. If it is larger than the area, the entire energy of light can be used, which is preferable from the viewpoint of energy efficiency. Specifically, it is preferable that 100 or more are arranged in two orthogonal directions, for a total of 10,000 or more, and more preferably 300 or more are arranged in two orthogonal directions, for a total of 90,000 or more, and they are orthogonal to each other. It is more preferable that 500 or more are arranged in each of the two directions, for a total of 250,000 or more.

As described above, ultraviolet rays having a wavelength of about 360 nanometers are preferably used for the first light source 82, but the higher the reflectance of each micromirror constituting the digital micromirror device, the more the above. This is preferable because the energy loss of the light output from the first light source 82 can be reduced. The reflectance of the laser beam of the micromirror is preferably 90% or more, more preferably 95% or more. The material of each mirror constituting the digital micromirror device is not limited, but aluminum or an aluminum alloy is preferable because high reflectance can be obtained. Further, a micromirror having a protective film formed of a transparent film to protect the surface of the aluminum or the aluminum alloy from oxidation and scratches is also preferably used as the digital micromirror device.

The digital micromirror device includes a drive mechanism capable of independently changing the angle of each micromirror constituting the digital micromirror device with respect to the substrate. In the optical device 1 of the present embodiment _{, since the image formed by the first optical LB 1} is switched at high speed, the higher the driving speed of the driving mechanism is, the more preferable. Specifically, the drive frequency, which is the number of times the angle can be changed per second, is preferably 100 hertz or more, and preferably 500 hertz or more. In the optical device 1 of the present embodiment, since _{the suitable oscillation frequency of the light source 83 that outputs the second optical LB 2} is 10 kHz or less, the digital micromirror device also adjusts the drive frequency to 10 kHz or less. It is preferable that it can be done.

The digital micromirror device 12 used for an optical device 1 of the present embodiment is not limited to, for example, can utilize Texas Instruments Inc. ultraviolet ray digital micromirror device DLP9000XUV (registered trademark).

The optical device 1 of the present embodiment is output from the second light source 83 that passes through the optical shutter device 81 in order to form an irradiation pattern of light output from the second light source 83 with high resolution. It is preferable that the lens 86 is installed on the optical path of light. The lens 86 can be installed at an arbitrary position on the optical path output from the second light source, but since it can form an irradiation pattern of high-resolution light, as shown in FIG. 1, the lens 86 is described above. It is preferable to install it between the optical shutter device 81 and the object to be irradiated 87. The embodiment of the lens 86 is as described above.

Further, since the optical device 1 of the present embodiment forms an _{irradiation pattern of the light LB 2} having a high resolution, it is preferable that the irradiation pattern of the first light LB _{1 also has a high resolution.} As described above, the _{irradiation pattern of the first optical LB 1} is preferably formed by using a digital micromirror device in which a large number of minute micromirrors are integrated. To further increase the resolution, the optical device 1 of this embodiment, the digital micromirror device and provided with a condenser lens between the optical shutter 81, the digital micromirror said first light formed by devices It is preferable that the image obtained by LB ₁ can be reducedly projected onto the optical shutter unit 81. In this case, since the condenser lens reduces only the light output from the first light source 82, it may be installed between the digital micromirror device and the selective mirror 85, or the first light source 82 may be installed. In order to reduce the light output from the first light source 82 and the second light source 83, it may be installed between the selective mirror 85 and the optical shutter unit 81.

The optical device 1 of the present embodiment preferably includes a stage 88 that holds the irradiated object 87. As shown in FIG. 8, the optical device 1 fixes the optical shutter device 81, the first light source 82, and the second light source 83, and moves the stage 88 to move the irradiated object. It is preferable to move 87 to form a three-dimensional structure corresponding to the irradiation pattern of the laser beam. By adopting such a method, the optical system can be stabilized and a high-precision laser light irradiation pattern can be formed, and the configuration of the laser irradiation device 1 of the present embodiment can be simplified and the device can be miniaturized. , Has the advantage of being easy to control.

When the optical axis direction of the second light passing through the optical shutter device 81 is the Z axis and the plane perpendicular to the Z axis is the XY plane, the stage 88 is moved in parallel with the XY plane. It is preferable to change the irradiation position of the pulsed laser light on the object to be irradiated 87 to form a two-dimensional irradiation pattern because the laser irradiation device 1 of the present embodiment can be easily controlled.

As shown in FIG. 1, the stage 88 of the present embodiment may be movable in the XYZ axis direction, or may be movable in one or two axial directions of the XYZ axes. A plurality of these may be used in combination.

Since the stage 88 requires precise operation, it is preferable that the stage 88 has a displacement sensor, a drive mechanism, and a control mechanism. The displacement sensor is a mechanism for detecting how far the stage 88 is from the reference point. The displacement sensor preferably has a mechanism for converting the distance between the stage 88 and the reference point into another physical quantity such as a voltage. As the displacement sensor, various types such as a laser interferometer and a linear scale type can be used. Above all, a displacement sensor using a linear encoder is preferably used because it enables highly accurate positioning.

The drive mechanism is a mechanism that generates power to move the stage 88. The drive mechanism preferably includes an actuator, a feed mechanism, and a guide mechanism in order to enable precise operation. A motor or a piezoelectric element can be used for the actuator. Above all, a stepping motor is preferable because the position of the stage 88 can be changed stepwise with high accuracy. The feed mechanism is a mechanism that converts the rotational power generated by the actuator into power in the linear direction. For the stage 88, for example, a ball screw method, a linear motor method, or the like can be used. The ball screw method is preferable because it can be simplified and miniaturized. The guide mechanism is a mechanism for moving the horizontal power generated by the feed mechanism in a predetermined direction, and for the stage 88, for example, a linear ball guide, a cross roller guide, or the like can be used.

The control mechanism is a mechanism for reducing an error between the target value of the position of the stage 88 and the position where the stage 88 actually moves. Various control methods such as sequence control, feedback control, and feedforward control can be adopted as the control mechanism, but feedback control is preferable because the position of the stage 88 can be precisely controlled. Feedback control refers to a mechanism that compares an output target value with an actual output value and automatically controls so that the output value and the target value match. Among the feedback controls, PID (Proportional-Integral-Differencil) control is preferably used because the position of the stage 14 can be precisely controlled and automated. PID control is a kind of feedback control in which the input value is controlled by three elements of the deviation between the output value and the target value, its integral, and the derivative.

When the optical device 1 of the present embodiment is used in the stereolithography device, the higher the driving speed of the stage 88 is, the more preferable it is from the viewpoint of processing time. Specifically, the drive frequency defined by the number of steps in which the stage 88 can be moved per second is preferably 100 hertz or more, and more preferably 500 hertz or more. As described above, in the optical device 1 of the present embodiment, a pulsed laser light source is preferably used as the first light source 82 and the second light source 83, and an irradiation pattern of light output from the first light source 82 is formed. A digital micromirror device is preferably used as the spatial optical modulation element 84, but since the stage 88 is driven in synchronization with the pulsed laser light source and the digital micromirror device, the suitable oscillation frequency of the pulsed laser light source and the suitable oscillation frequency of the pulsed laser light source are used. It is preferable that the digital micromirror device can be adjusted at a suitable drive frequency of 10 kilohertz or less.

The stage 88 is not limited, and for example, a 1-nanometer feedback stage system FS-1020UPX manufactured by SIGMA KOKI Co., Ltd. can be used.

The stage 88 has a mechanism for holding the irradiated object 87. When the optical device 1 is used in a stereolithography device, the photosensitive resin composition to be irradiated is generally a viscous liquid, so the liquid tank is filled with the photosensitive resin composition and the liquid tank is staged. By holding at 88, it can be used in a stereolithography apparatus. It is also possible to hold the slide glass on the stage 88 and hold the photosensitive resin composition sandwiched between the slide glass and the cover glass. In that case, it is preferable to use a spacer to keep the distance between the slide glass and the cover glass constant.

Further, the photosensitive resin composition may be applied to a substrate, and the substrate to which the photosensitive resin composition is applied in a thin film may be held on the stage 88. The photosensitive resin composition can be applied by a known method such as dip coating, bar coating, or spin coating, but it is preferably applied by spin coating because a thin film having a wide area and high homogeneity can be formed. Further, as the photosensitive resin composition, a film-like photosensitive resin composition, so-called dry film resist, may be used. In the dry film resist, a thin film of the resist composition, which is a photosensitive resin composition, can be formed by sticking a film on the substrate. Either a negative type dry film resist or a positive type dry film resist may be used as the dry film resist, but processing is easy when the laser light irradiation device 1 of the present embodiment is used for the optical modeling device. Therefore, a negative dry film resist is preferable.

The substrate for applying the liquid photosensitive resin composition or attaching the photosensitive resin composition on the film is not limited, but is limited to glass, metal, silicon, compound semiconductors, resins, ceramics and the like. You can choose. Of these, glass and silicon wafers are preferable because they have high smoothness and can form a thin film of a photosensitive resin composition in a large area.

It is preferable that the stage 88 can fix the liquid tank filled with the photosensitive resin composition or the substrate coated with the photosensitive resin composition. The fixing method is not limited, and can be fixed by using an adhesive tape, an adhesive or an adhesive. Further, it is preferable to use a vacuum chuck or an electrostatic chuck because the liquid tank or the substrate can be quickly attached and detached.

The photosensitive resin composition is preferably a photocurable resin composition because it is easy to process when the laser irradiation device 1 of the present embodiment is used in the stereolithography device. As the photocurable resin composition, a commercially available resin composition for negative resist can be used. The resin composition for a negative resist is not limited as long as it cures when the pulsed laser beam is focused and irradiated by the above-mentioned optical modeling apparatus, but a resin composition containing a reaction initiator and a monomer is preferable, and an oligomer and a chain transfer are further used. Additives such as agents, diluents can be included.

As the photocurable resin composition, a radical polymerization type, a cationic polymerization type, an anion polymerization type and the like can be used, but the radical polymerization type is preferable because high reactivity can be obtained, and the cationic polymerization type shrinks during curing. Is preferable because it is small.

As the radical polymerization type photocurable resin composition, urethane-based, acrylic-based, and urethane acrylate-based photocurable resin compositions are preferably used. The radical polymerization type photocurable resin composition contains a radical polymerization initiator and a monomer, and can further contain additives such as an oligomer, a chain transfer agent, and a diluent.

The radical polymerization type photocurable resin composition is not limited, but SCR500 or Z7012C, which is a negative resist composition manufactured by JSR Corporation, can be used.

The cationically polymerized photocurable resin composition has a small shrinkage during curing and can be processed with high accuracy. Therefore, when the laser light irradiation apparatus 1 of the present embodiment is used as a stereolithography apparatus, it is preferably used. As the cationically polymerized photocurable resin composition, an epoxy-based, vinyl ether-based, or acrylic-based composition is preferable because a high reaction rate can be obtained. The cationically polymerized photocurable resin composition preferably contains a photoacid generator as a polymerization initiator. Further, it is preferable that it contains an epoxy-based, vinyl ether-based, acrylic-based or other monomer, and contains an additive such as a cross-linking agent or a reactive diluent that promotes a photocuring reaction by cationic polymerization.

The cationically polymerized photocurable resin composition is not limited to SU-8, which is an epoxy-based negative resist manufactured by MicroChem, and TSR series, which is an epoxy-based photosensitive resin composition manufactured by Seamet Co., Ltd. Can be used.

Among the above photocurable resin compositions, a resin composition called dual cure, which is cured by both light and heat, is known and is used when the laser irradiation device 1 of the present embodiment is used in the stereolithography device. can do. In that case, it is possible to further increase the processing speed by taking a method of curing the outer frame of the three-dimensional structure manufactured by the stereolithography apparatus by photocuring and then curing the inside of the object to be processed by thermosetting after development. be.

Further, a compound called a sensitizer is added to the photocurable resin composition used in the stereolithography apparatus to lower the energy threshold required for the photocuring reaction and facilitate the photocuring reaction. Can be done. When a photocurable resin composition containing a sensitizer is irradiated with pulsed laser light, a multiphoton absorption phenomenon of sensitizer molecules first occurs, and the sensitizer molecules are excited from a basal state to an excited state, and then excited. It is considered that electron transfer from the sensitizer to the polymerization initiator and the monomer contained in the photocurable resin composition occurs to induce a photocuring reaction. As the compound used for the sensitizer, the multiphoton absorption cross-sectional area is large, the energy level in the excited state is higher than the energy level in the excited state of the polymerization initiator or the monomer, and the electron-transferred polymerization initiator or the monomer has an electron-transferred energy level. When the excited state has a long lifetime, the excited state lifetime of the sensitizer is long, and a radical is generated by the excitation of the sensitizer, it is preferable that the radical generation efficiency is high and the radical lifetime is long. Used for.

The sensitizer is not limited, and for example, compounds such as Anthracure UVS-581, UVS-1331, UVS-1011, and Eosin Y are known. The Anthracure series can be obtained from Kawasaki Kasei Chemicals, Ltd., and Eosin Y can be obtained from Fuji Film Wako Pure Chemical Industries, Ltd.

The optical device 1 of the present embodiment preferably includes a control device 89. The control device 89 is connected to the first light source 82, the second light source 83, the spatial light modulation element 84, and the stage 88, and by controlling them, the optical device 1 of the present embodiment is used. It forms an image. In the control device 89, as shown in FIG. 8, even if one control device is connected to all of the first light source 82, the second light source 83, the spatial light modulation element 84, and the stage 88. Alternatively, a plurality of those connected to any one or two or more may be used in combination.

The control device 89 preferably includes a computer system. Further, the control device 89 preferably has an arithmetic processing unit, a storage device, and an input / output interface. The arithmetic processing device performs arithmetic processing according to a computer program stored in the storage device, and transmits a control signal for controlling the optical device 1 of the present embodiment via the input / output interface device. Output to one light source 82, the second light source 83, the spatial light modulation element 84, and the stage 88. Further, the control device 89 is preferably connected to a display means composed of a display device for displaying a processing operation state, an image, or the like, or an input means used for inputting processing content information or the like.

When the optical device 1 of the present embodiment is used as an optical modeling device, the control device 89 includes three-dimensional data of a three-dimensional structure to be created and two-dimensional slice data created based on the three-dimensional data. Is preferable. The above three-dimensional data may be created by using computer-aided design (CAD) software, computer graphics (CG) software, or the like, or by scanning an existing three-dimensional structure using a 3D scanner. You may. Further, the control device 89 preferably includes software for creating two-dimensional slice data based on the three-dimensional data. The software is not particularly limited, and for example, commercially available software for a 3D printer can be used.

The optical device 1 of the present embodiment is preferably installed on a vibration isolator, a vibration isolator, or the like in order to eliminate the influence of minute vibrations and stably form a precise laser light irradiation pattern. In addition, since changes in temperature and humidity may affect the dimensions and operating system of each component that constitutes the optical device 1, measures such as installing a stereolithography device in a constant temperature / humidity chamber should be taken. Can be done.

Subsequently, the operation of the optical device 1 of the present embodiment will be described. The optical device 1 of the present embodiment _{irradiates the spatial light modulation element 84 with the laser light LB 1} output from the first light source 82, forms a light irradiation pattern by the spatial light modulation element 84, and forms the optical irradiation pattern. The shutter portion 81 is irradiated. In the region of the optical shutter unit 81 _{irradiated with the first light LB 1} , the photochromic material contained in the region is excited to change the absorption spectrum. When the absorption spectrum of the region irradiated with the first light LB ₁ changes, the transmittance of _{the second light LB 2 decreases.} On the other hand, in the _{region not irradiated with the first light LB 1} , the absorption spectrum does not change and _{the transmittance of the second light LB 2} does not decrease. In this way, according to the irradiation pattern of _{the first light LB 1 , a portion that transmits the second light LB 2} and a portion that shields the second light LB 2 are formed on the optical shutter portion 81. Here, the second light LB ₂ by irradiating the optical shutter unit 81, the image formation is made possible by the second light LB _2.

FIG. 9 is a flowchart showing the operation of the optical device 1 of the first embodiment. In the optical device 1 of the present embodiment, the light source 82 that outputs the first light, the light source 83 that outputs the second light, the spatial light modulation element 84, and the stage 88 are driven in synchronization with each other. It is preferable that the light source is used.

Here, "driven synchronously" means the light source 82 that outputs _{the first light LB 1 , the light source 83 that outputs the second light LB 2} , the spatial light modulation element 84, and the stage. It does not mean that the 88 is driven at exactly the same timing, but as shown in FIG. 9, the spatial light modulation element 84 and the stage 88 are first adjusted to the set initial conditions (S1), and then the first time. The first light LB ₁ is output from the light source 82 (S2), and the second light LB ₂ is output from the light source 83 (S2). Next, _{before the second light LB 1} and the second light LB ₂ are output from the light sources 82 and 83, the spatial light modulation element 84 and the stage 88 are set under the conditions. It means that it is adjusted to (S1). By repeating this a set number of times, a two-dimensional or three-dimensional laser light irradiation pattern can be formed.

Here, when the light source 82 and the condition 83 are different light sources, _{the timing of outputting the first light LB 1} and the second light LB ₂ from the light source 82 and the condition 83 is adjusted, and the first light LB ₁ and the second light LB ₂ is preferably to adjust the timing to reach the optical shutter 81. Further, when the light source 82 and the condition 83 are the same light source and the output light is _{divided into the first light LB 1} and the second light LB ₂ by using an optical element, the second light The optical path until the LB ₂ reaches the optical shutter portion 81 is lengthened, the second optical LB ₂ is modulated by an optical element, and the second optical LB 2 is adjusted to be out of phase with _{the first optical LB 1.} , the first light LB ₁ and the second light LB _2, it is preferable to adjust the timing to reach the optical shutter 81.

As described above, when the optical device 1 of the present embodiment is used in the two-photon microphoton modeling method, it is used for the preferable oscillation frequency of the light source 83 that outputs _{the second light LB 2 and the spatial light modulation element 84.} The preferred drive frequency of the digital micromirror device and the preferred drive frequency of the stage 88 are 10 kilohertz or less. It is preferable that the oscillation frequency of the light source 82 that outputs the first light is also adjusted to 10 kHz or less, and the light source 82, the light source 83, the digital micromirror device, and the stage 88 are driven at the same frequency. ..

For example, the light source 82 that outputs the first light, the light source 83 that outputs the second light, the spatial light modulation element 84, and the stage 88 are synchronized at a suitable frequency of 1 kilohertz. The case of driving will be described. Since the frequency is 1 kilohertz (1000 hertz), the time required to perform one cycle of the steps S1 to S3 shown in FIG. 9 is 1/1000 second (1 millisecond). As described above, the _{preferable pulse widths of the first optical LB 1} and the second optical LB ₂ are 100 nanoseconds or less and 1 picosecond or less, respectively, which is the time for performing the one cycle. Since it is sufficiently short with respect to millisecond, the light source 82 that outputs the first light and the second light source 82 that outputs the first light after setting the spatial optical modulation element 84 and the stage 88 within 1 millisecond. By outputting light from the light source 83, the optical device 1 can be driven according to the flowchart shown in FIG.

The photochromic material contained in the optical shutter unit 81 constituting the optical device 1 immediately develops a color by irradiation with _{the first light LB 1 in order to enable the above-mentioned operation, and the irradiation of the first light LB 1} is completed. Those that quickly decolorize later are preferable. Among the above-mentioned photochromic materials, the pentaarylbisimidazole derivative and the phenoxyl-imidazolyl radical complex show a high photoresponse rate, and the color development rate and the decolorization rate can be adjusted by introducing a substituent into the molecule. Therefore, it is preferable.

FIG. 10 is a diagram showing the configuration of the optical device 2 of the second embodiment. In FIG. 10, components other than the optical shutter device 101 and the micromirror device 102 are common to the optical device 1 of the first embodiment shown in FIG.

11 and 12 are diagrams showing an operation principle of forming an image by _{the second optical LB 2} by using the optical device 2 of the second embodiment. As shown in FIG. 11, the digital micromirror device 102 _{reflects the first light LB 1} and partially irradiates the selective mirror 85 according to a set light irradiation pattern, and a part thereof. The selective mirror 85 is not irradiated. The first light LB ₁ irradiated on the selective mirror 85 is reflected by the selective mirror 85 and irradiated on the optical shutter device 101. Since the optical shutter device 101 is composed of microcells containing a photochromic material, among the microcells, the microcell irradiated with _{the first light LB 1 shown by the diagonal line in FIG. 11 is the microcell.} Change the absorption spectrum.

Subsequently, as shown in FIG. 12, the second optical LB ₂ is output. The second light LB ₂ passes through the selective mirror 85 and irradiates the optical shutter device 101. Among the microcells constituting the optical shutter device 101, the microcells _{that have absorbed the first light LB 1} shown by the diagonal lines in FIG. 12 function as an optical shutter that shields the second light LB _2. Further, since the microcell that does not absorb the first light LB _{1 transmits the second light LB 2} , the optical shutter device 101 partially transmits _{the second light LB 2.} Alternatively, by shielding, an _{image by the second optical LB 2} can be formed.

In order to enable such an operation, it is preferable that the photochromic material included in the optical shutter device 101 and _{the wavelengths of the first light LB 1} and the second light LB ₂ are appropriately selected. Further, in order to enable such an operation, the light source 82 that outputs _{the first light LB 1 , the light source 83 that outputs the second light LB 2} , the digital micromirror device 102, and the stage 88 are synchronized. It is preferable to drive the vehicle. The embodiment of the photochromic material included in the optical shutter device 101 is as described above. Further, since the optical shutter device 101 is formed so that the microcell containing the photochromic material functions as a condenser lens, the second light LB ₂ transmitted through the optical shutter device 101 is collected. It is illuminated and the object to be irradiated 87 is irradiated. With such a configuration, the optical device 2 can realize a simple optical system and can stably form a high-precision image.

Among the components of the optical device 2, the embodiments of the components common to the optical device 1 other than the optical shutter device 101 are as described above.

When the optical device 2 of the present embodiment is used for an optical modeling device, particularly a two-photon microphoton modeling device, the second light LB ₂ is focused and irradiated on the object to be irradiated 87, so that the second light LB ₂ The spot size of the focal point is smaller than that of the microcells constituting the optical shutter device 101. Therefore, the stage 88 moves the microcell of the optical shutter device 101 in parallel with one surface at a distance corresponding to the distance between two adjacent condensing point spots formed by the second light LB _2. This is preferable because the laser beam can be irradiated over the entire irradiated surface of the irradiated object 87. Further, by moving the stage 88 while switching the angle of the micromirror constituting the digital micromirror device 102 according to the preset irradiation pattern of the first optical LB _{1, a highly accurate two-dimensional pattern is obtained.} Is preferable because it can form.

When the optical device 2 of the present embodiment is used in the two-photon microphoton modeling device, the second light source 83 is preferably a pulse laser light source because a high energy density can be obtained. Since the two-photon microphoton modeling apparatus utilizes the two-photon absorption phenomenon, the size of the region where pulse energy exceeding the threshold for exciting the two-photon absorption phenomenon can be obtained is the spot size of the focal point of the pulsed laser light. Become. At this time, the spot size of the focal point of the pulsed laser light is the pulse energy, the output of the light source 83 that outputs the second light, the numerical aperture of the laser light divided by the optical shutter device 101, and the optical type. It depends on the numerical aperture of the microcells constituting the shutter device 101. In order to obtain the irradiation pattern of the pulsed laser light with high resolution, the pulse energy of the pulsed laser light source and the number and numerical apertures of the microcells constituting the optical shutter device 101 can be adjusted to enable the spot size of the focal point. It is preferable to make it as small as possible. Specifically, the spot size of the focal point is preferably 100 nanometers or less, more preferably 50 nanometers or less, and further preferably adjusted to about 10 nanometers.

_{Here, the optical axis direction of the second light LB 2} irradiated to the optical shutter device 101 is defined as the Z-axis and the arbitrary axes orthogonal to the Z-axis and orthogonal to each other are defined as the X-axis and the Y-axis. When the above optical device 2 is used in a two-photon microoptical modeling method, for example, a large number of microcells containing a photochromic material and forming a square lens having a side length of 1 micrometer are formed on a transparent substrate without gaps. When the integrated optical shutter device 101 is installed parallel to the X-axis and the Y-axis and the second light LB ₂ is applied to the optical shutter device along the Z-axis, the optical shutter device 101 is irradiated between adjacent condensing point spots. The distance is approximately equal to the distance from the center of the adjacent square lens to the center, which is approximately 1 micrometer. As described above, when the output of the light source 83, the number of microcells constituting the optical shutter device 101 and the numerical aperture are adjusted, and the spot size of the focal point is set to 10 nanometers, the stage 88 is displayed. It is preferable to move the light source 82 in the X-axis direction and the Y-axis direction by 10 nanometers per step in synchronization with the light source 82 because a highly accurate irradiation pattern can be obtained. While switching the angle of the micromirrors constituting the digital micromirror device 102 according to a preset two-dimensional pattern, the stage 88 is moved by 10 nanometers in 10,000 steps in the X-axis direction and the Y-axis direction. By doing so, it is possible to form a laser light irradiation pattern consisting of 10,000 pixels on a plane of 1 micrometer square per microlens. In the optical device 2 of the present embodiment, a large number of laser light irradiation patterns are simultaneously formed by forming a large number of laser light irradiation patterns per microlens through the optical shutter device 101 in which a large number of microlenses are arranged. This is preferable because the laser beam irradiation pattern can be formed at high speed and in a wide range. Further, by moving the stage 88 in the Z-axis direction as well, a desired three-dimensional pattern can be formed on the irradiated object 87.

When the optical device 2 is used in an optical production device, as described above, since the divided laser light is focused and irradiated to the photosensitive resin composition, each of the divided laser light is a photosensitive resin. It is preferable that the energy threshold required for the reaction of the composition is exceeded.

The energy threshold required for the reaction of the photosensitive resin composition depends on the type of resin contained in the photosensitive resin composition and components such as a sensitizer and a polymerization initiator. For example, a commercially available photocurable resin composition When an object is used, the pulse energy of one divided pulsed laser beam is preferably 1 nanojoule or more, and more preferably 5 nanojoules or more.

When the laser light irradiation method of the present embodiment is used for multiphoton microoptical modeling, as shown in FIG. 10, an output pulse is used as a light source 83 for outputting _{the second light LB 2.} The laser beam is divided into 1 million or more by the optical shutter device 101 composed of 1 million or more microcells, and a laser light irradiation pattern is formed by the optical shutter device 101 to form an irradiated object 87. Is preferable because a high-precision image can be formed over a wide range. In this case, the pulse energy of the pulsed laser light output from the pulsed laser light source is the photosensitive resin composition so that the pulse energy per divided laser light exceeds the energy threshold of the photosensitive resin composition. It is preferably 1 million times or more the energy threshold of the object. The pulse energy of the laser light output from the pulsed laser light source, which is the light source 83 that outputs the second light LB _{2, is preferably 1 millijoule or more, more preferably 5 millijoules or more.} It is more preferably 10 millijoules or more.

The energy of the pulsed laser light output from the pulsed laser light source depends on the average output and the oscillation frequency of the pulsed laser light source, but even if the average output is the same, the pulse energy can be adjusted by adjusting the oscillation frequency low. Can be high. Therefore, in the method of irradiating the laser beam of the present embodiment, the method of irradiating the laser beam of the present embodiment is to increase the oscillation frequency as much as possible within the range exceeding the energy threshold required for the reaction of the photosensitive resin composition. When used for manufacturing a three-dimensional structure, it is preferable because the manufacturing speed can be increased. Further, it is preferable to adjust the photosensitive resin composition to be lower than the energy threshold value at which photodamage occurs.

The optical device 2 of the present embodiment has an advantage in that when it is used for manufacturing a three-dimensional structure by a two-photon micro stereolithography method, it can perform precise processing with high resolution. In the vicinity of the focal point where the pulsed laser light is focused, the size of the focused spot where the pulse energy exceeds the energy threshold required for the reaction of the photosensitive resin composition is set to the energy threshold required for the reaction of the photosensitive resin composition. Although it depends on the energy of the pulsed laser light output from the pulsed laser light source, the number of divided pulsed laser lights divided by the optical shutter device 101, and the number of openings of the microcells constituting the optical shutter device. Can also be adjusted by. When a pulsed laser light having an energy sufficiently exceeding the energy threshold required for the reaction of the photosensitive resin composition is irradiated, the size of the focused spot becomes large and the pulsed laser light having an energy close to the energy threshold is irradiated. If so, the size of the focused spot will be smaller. When the optical device 2 is used for manufacturing a three-dimensional structure by the two-photon microoptical modeling method, the size of the condensing spot is 200 nanometers or less from the viewpoint of processing accuracy of the three-dimensional structure. It is preferably 100 nanometers or less, more preferably 50 nanometers or less.

In the optical device 2 of the present embodiment, as shown in FIG. 10, the stage 88 that holds the irradiated object 87 orthogonal to the Z axis is installed, but the present invention is not limited to this, and the subject is not limited to this. The irradiated object 87 may be installed at an angle to the Z axis. Further, although FIG. 1 is drawn so as to irradiate the laser beam from the upper surface of the object to be irradiated 87, with such a configuration, the laser beam is focused on the photosensitive resin composition which is the object to be processed. When irradiating, there is nothing that blocks the laser beam, and there is an advantage that the configuration of the device can be simplified. Further, the irradiation is not limited to the irradiation from the upper surface of the object to be irradiated 87, and the irradiation may be performed from the side surface, the lower surface, or diagonally. When irradiating the pulsed laser light from other than the upper surface, it is preferable to provide a window made of a material that transmits the laser light in the stage 88 or the container holding the object to be irradiated 87 so that the laser light is not blocked.

When the laser light irradiation method of the present embodiment is used as a method for producing a three-dimensional structure by a multiphoton microphotomorphization method, a photoreaction is induced by condensing and irradiating the photosensitive resin composition with the pulsed laser light. Later, in the positive-type photosensitive resin composition, the portion of the positive-type photosensitive resin composition that was reacted by irradiating the positive-type photosensitive resin composition with the pulsed laser light was subjected to, and in the negative-type photosensitive resin composition, the negative-type photosensitive resin composition. It is preferable to include a development step of cleaning and removing an unreacted portion of the object without irradiating the object with the pulsed laser beam. The developer that can be used in the developing step is not limited as long as it can wash and remove the reacted portion of the positive photosensitive resin composition or the unreacted portion of the negative photosensitive resin composition. An aqueous developer such as pure water or an aqueous solution of tetramethylammonium is preferably used because it can reduce the environmental load. Since the photosensitive resin composition to be developed is required to be dissolved in an aqueous cleaning agent in the aqueous developer, when a photocurable resin composition that is not water-soluble is used, an organic solvent is used. It is preferable to use and develop. The organic solvent is not limited, and for example, acetone, ethanol, isopropyl alcohol, γ-butyrolactone, hexane, ethyl acetate, N-methylpyrrolidone, dimethyl sulfoxide, tetrahydrofuran and the like can be used. These organic solvents may be used alone or in combination of two or more. Further, a commercially available cleaning agent composition may be used, and for example, a cleaning agent TSC-100 for stereolithography manufactured by Seamet Co., Ltd. may be used.

By the developing step, the reacted portion of the positive photosensitive resin composition or the unreacted portion of the negative photosensitive resin composition can be washed and removed, but the positive which is the object to be processed during development can be removed. The structure of the type photosensitive resin composition or the negative type photosensitive resin composition may be destroyed. In particular, when the three-dimensional structure produced by the stereolithography method contains a fine structure of 100 nanometers or less, the fine structure may be destroyed by the surface tension of the developing solution. Therefore, the developer preferably has a low surface tension. Specifically, the surface tension of pure water is 72.75 mN / m at 20 ° C., but the surface tension of the developer used in the stereolithography apparatus of the present invention is preferably 50 mN / m or less at 20 ° C. , 30 mN / m or less is more preferable, and 20 mN / m or less is further preferable. When the surface tension of the developing solution is higher than the preferable value, the surface tension can be lowered by adding a surfactant to the developing solution. As the surfactant, a nonionic surfactant is preferable because it has a high effect of lowering the surface tension, and a fluorine-containing nonionic surfactant is more preferable.

When it is necessary to further reduce the surface tension, it is preferable to perform so-called supercritical development using a supercritical fluid having a surface tension of zero. As the supercritical fluid, supercritical carbon dioxide is preferably used because a supercritical state can be easily obtained and the uncured portion of the photocurable resin composition is highly soluble.

(Additional notes on means for solving problems)
(Appendix 1) An optical shutter device that integrates minute optical shutters containing photochromic materials.

(Appendix 2) The optical according to Appendix 1, wherein the optical shutter is composed of microcells capable of reversibly changing the absorption spectrum in response to the first light and changing the transmission pattern of the second light. Type shutter device.

(Appendix 3) The optical shutter device according to Appendix 2, wherein the microcell is formed to function as a lens.

(Appendix 4) A process of setting a pattern of microcells constituting an optical shutter device in which minute optical shutters are integrated, and
According to the above pattern, a step of accumulating microcells containing a photochromic material and
A method of manufacturing an optical shutter device including.

(Appendix 5) The method for manufacturing an optical shutter device according to Appendix 4, wherein the step of accumulating the composition containing the photochromic material is a step of molding a resin composition containing the photochromic material.

(Appendix 6) An optical shutter device that integrates minute optical shutters containing photochromic materials,
A lens arranged on the optical path of light passing through the optical shutter and
Optical equipment including.

(Appendix 7) The optical device according to Appendix 6, wherein the lens is a microlens array.

(Appendix 8) An optical shutter unit containing a photochromic material and
A light source that outputs the first light that projects a light irradiation pattern onto the optical shutter unit,
A light source that outputs a second light to irradiate the optical shutter on which a light irradiation pattern is projected by the first light, and a light source.
Including
In the optical shutter unit on which the light irradiation pattern of the first light is projected,
By partially transmitting or shielding the second light
An optical device characterized in that an irradiation pattern of a second light can be formed.

(Supplementary Note 9) The optical device according to Appendix 8, wherein the optical shutter unit is composed of an optical shutter device in which minute optical shutters including a photochromic material are integrated.

(Supplementary Note 10) The optical device according to Supplementary note 8 or 9, further comprising a spatial light modulation element capable of forming a light irradiation pattern from the first light.

(Supplementary Note 11) The optical device according to any one of Supplementary note 8 to 10, wherein the light source that outputs the first light is an ultraviolet laser light source or a visible light laser light source.

(Supplementary Note 12) The optical device according to any one of Supplementary note 8 to 11, wherein the light source that outputs the second light is a near-infrared laser light source or an infrared laser light source.

(Supplementary note 13) The above-mentioned item 1 of Supplementary note 8 to 12, wherein at least one of the light source that outputs the first light and the light source that outputs the second light is a pulse laser light source. Optical device.

(Appendix 14) A step of projecting an image formed by modulating the first light with a spatial light modulation element onto an optical shutter unit containing a photochromic material, and
A step of forming an image by the second light that partially transmits or shields the optical shutter portion by irradiating the optical shutter portion on which the image is projected with a second light.
An image forming method comprising.

(Appendix 15) The image forming method according to Appendix 14, wherein the optical shutter unit is an optical shutter device in which minute optical shutters including a photochromic material are integrated.

(Appendix 16) An optical device including an optical shutter unit on which a thin film containing a photochromic material is formed and a microlens array.

(Appendix 17) The first light and the second light divide the light output from one light source by an optical element, and at least one of the divided light is modulated by the optical element, and the wavelength or phase is different. The optical device according to any one of Supplementary note 8 to 13, wherein the light is the first light and the second light.

1 Optical device 2 Optical device 11 Microcell 12 Microcell placement surface 81 Optical shutter unit 82 Light source that outputs the first light 83 Light source that outputs the second light 84 Spatial light modulation element 85 Selective mirror 86 Lens 87 Irradiation Object 88 Stage 89 Control device 101 Optical shutter device 102 Digital micromirror device LB ₁ First light LB ₂ Second light

Claims (1)

An optical shutter containing photochromic material and
A light source that outputs the first light that projects a light irradiation pattern onto the optical shutter unit,
A light source that outputs a second light to irradiate the optical shutter on which a light irradiation pattern is projected by the first light, and a light source.
Including
In the optical shutter unit on which the light irradiation pattern of the first light is projected,
By partially transmitting or shielding the second light
A second formable der Ru optical science device an irradiation pattern of light,
An optical device characterized in that the optical shutter unit is composed of an optical shutter device in which minute optical shutters containing a photochromic material are arranged in a plane corresponding to a range in which the light irradiation pattern is projected .

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