JP6799990B2 - Radar cover manufacturing method - Google Patents

Description

The present invention relates to a method for manufacturing a radar cover.

In recent years, a radar unit that detects obstacles and the like around the vehicle by using radio waves such as millimeter waves has been mounted on the vehicle. Such a radar unit is arranged inside a radiator grill or an emblem provided on the front surface of the vehicle, and transmits / receives radio waves transmitted through the emblem or the like. Therefore, in a vehicle equipped with the radar unit as described above, it is necessary to form the emblem or the like so that the radio wave can be transmitted while suppressing the attenuation of the radio wave.

On the other hand, since the emblem or the like is arranged on the front surface of the vehicle, it is an extremely important part in the design of the vehicle, and in many cases, metal brilliance is imparted in order to improve the sense of quality and texture. Conventionally, in order to impart such metallic brilliance, it has been common to perform a plating treatment, but the plating layer does not transmit radio waves. For this reason, in recent years, in order to impart metal brilliance and make radio waves transmissible, a technique for forming a thin film such as indium (In) that can transmit radio waves by vacuum deposition has been used (see Patent Document 1). ).

Japanese Unexamined Patent Publication No. 2011-46183

By the way, the metal thin film capable of transmitting radio waves as described above has radio wave transmission because it is a discontinuous film having a plurality of islands arranged with a gap. In vacuum deposition, these islands grow according to the deposition time. Therefore, by lengthening the vapor deposition time, the area seen from the direction orthogonal to the vapor deposition surface of the island portion increases, and the brilliance increases. However, the island portion grows in the direction orthogonal to the vapor deposition surface at the same time as the above area expands. For this reason, conventionally, when trying to form a highly brilliant radio wave transmitting metal thin film by vacuum deposition, the film thickness of the metal thin film inevitably increases, and the amount of indium or the like, which is a rare metal, increases. ..

The present invention has been made in view of the above-mentioned problems, and an object of the present invention is to make it possible to reduce the material for forming a metal thin film in a method for manufacturing a radar cover including a metal thin film having radio wave transmission.

The present invention employs the following configuration as a means for solving the above problems.

The first invention is a method for manufacturing a radar cover for forming a metal thin film having a structure having a plurality of islands arranged with a gap on the surface of a base material by vacuum deposition, wherein the base material of the islands is formed. A configuration is adopted in which the metal thin film forming step of forming the metal thin film is performed by adjusting the ratio of the dimension along the surface of the base material and the dimension in the direction orthogonal to the surface of the base material by an ion beam.

According to the second invention, in the first invention, in the metal thin film forming step, the vapor-deposited material is accelerated by the ion beam and collides with the base material, whereby the surface of the base material on the island portion is formed. A configuration is adopted in which the ratio of the dimension in the along direction and the dimension in the direction orthogonal to the surface of the base material is adjusted.

In the third invention, in the first invention, the metal thin film forming step is formed by the film forming step of forming the metal thin film on the surface of the base material by the vacuum vapor deposition and the film forming step. A shape adjusting step of irradiating the island portion of the metal thin film with an ion beam to adjust the ratio of the dimension of the island portion in the direction along the surface of the base material and the dimension in the direction orthogonal to the surface of the base material. Adopt the configuration of having.

The fourth invention adopts the configuration that the vapor deposition material is indium in any one of the first to third inventions.

When a metal thin film having radio wave transmission is formed by vacuum deposition, the islands constituting the metal thin film grow depending on the vapor deposition time. At this time, the ratio of the width dimension and the thickness dimension of the island portion is substantially uniquely determined by the vapor deposition time. That is, in the conventional vacuum vapor deposition, once the vapor deposition time is determined, the width dimension and the thickness dimension of the island portion at the vapor deposition time cannot be adjusted. According to the present invention, the ratio of the dimension along the surface of the base material of the island portion (hereinafter, width dimension) and the dimension in the direction orthogonal to the surface of the base material (hereinafter, thickness dimension) is adjusted by an ion beam. To form a metal thin film. Therefore, the ratio of the width dimension and the thickness dimension of the island portion can be changed as compared with the case of simply performing vacuum deposition. Therefore, according to the present invention, it is possible to increase the width dimension while suppressing the thickness dimension of the island portion, and it is possible to reduce the material for forming the metal thin film.

It is a front view of the radiator grill provided with the emblem manufactured by the method of manufacturing the emblem in one Embodiment of this invention. It is an enlarged front view of the emblem manufactured by the method of manufacturing the emblem in one Embodiment of this invention. (A) is a cross-sectional view of the emblem of the present invention, and (b) is a cross-sectional view of an inner emblem included in the emblem. It is a schematic diagram for demonstrating the manufacturing process of the emblem in one Embodiment of this invention. It is a schematic diagram of the vacuum vapor deposition apparatus used in the manufacturing process of the emblem in one Embodiment of this invention. It is a schematic diagram which compared the bright film formed by the manufacturing method of the emblem in one Embodiment of this invention, and the bright film formed by the conventional manufacturing method. A table comparing the brightness (L value) when a bright film is formed by vacuum deposition under different conditions, the thickness dimension (film thickness) of the island part, and the average width dimension (island size) of the island part. is there. It is a schematic diagram for demonstrating the modification of the method of manufacturing an emblem in one Embodiment of this invention.

Hereinafter, an embodiment of the method for manufacturing a radar cover according to the present invention will be described with reference to the drawings. In the drawings below, the scale of each member is appropriately changed in order to make each member recognizable.

FIG. 1 is a front view of a radiator grill 1 provided with an emblem 10 (radar cover) manufactured by the method for manufacturing a radar cover according to the present invention. Further, FIG. 2 is an enlarged front view of the emblem 10 of the present embodiment. Further, in FIG. 3, (a) is a cross-sectional view of the emblem 10, and (b) is a cross-sectional view of the inner emblem 12 included in the emblem 10.

The radiator grill 1 is provided on the front surface of the vehicle so as to close the opening leading to the engine room of the vehicle, ensuring ventilation to the engine room and preventing foreign matter from entering the engine room. In the center of the radiator grill 1, an emblem 10 is provided so as to face the radar unit R arranged in the engine room. The radar unit R (see FIG. 3A) has, for example, a transmitting unit that transmits millimeter waves, a receiving unit that receives reflected waves, an arithmetic unit that performs arithmetic processing, and the like. The radar unit R transmits and receives radio waves transmitted through the emblem 10, and detects the surrounding conditions of the vehicle based on the received radio waves. For example, the radar unit R calculates and outputs the distance to the obstacle, the relative speed of the obstacle, and the like.

The emblem 10 is arranged so as to cover the radar unit R when viewed from the front side of the vehicle. As shown in FIG. 2, the emblem 10 has a bright region 10A representing a figure or a character indicating a vehicle manufacturer's emblem and a black region 10B for improving the visibility of the bright region 10A when viewed from the front side of the vehicle. It is a part having. As shown in FIG. 3A, such an emblem 10 includes a transparent member 11, an inner emblem 12, and a base member 13.

The transparent member 11 is a portion formed of a substantially rectangular transparent material arranged on the outermost side of the vehicle. In order to improve the visibility of the inner emblem 12 from the outside of the vehicle, the transparent member 11 has a smooth surface on the front side. Further, a recess 11a on which the inner emblem 12 is arranged is formed on the back surface of the transparent member 11. Further, the region on the back surface of the transparent member 11 where the recess 11a is not provided is a fixed surface with the base member 13.

The recess 11a is a portion for accommodating the inner emblem 12, and makes the accommodated inner emblem 12 three-dimensionally visible from the front side of the vehicle. The recess 11a is provided along the shape of a figure such as an emblem of a vehicle manufacturer or a character. By accommodating the inner emblem 12 in such a recess 11a, the above-mentioned bright region 10A is formed.

Such a transparent member 11 is formed of, for example, a transparent synthetic resin such as colorless PC (polycarbonate) or PMMA (polymethyl methacrylate resin), and has a thickness of about 1.5 mm to 10 mm. Further, the front surface of the transparent member 11 is subjected to a hard coat treatment for preventing scratches or a clear coat treatment of urethane-based paint, if necessary. If it is a transparent synthetic resin having scratch resistance, these scratch prevention treatments are unnecessary.

As shown in FIG. 3B, the inner emblem 12 includes a base portion 12a, a base coat layer 12b, a glittering film 12c (metal thin film), and a top coat layer 12d. The base portion 12a is formed by injection molding or the like, and is formed of, for example, a synthetic resin such as ABS, PC or PET. The base portion 12a has a convex shape in which the recess 11a of the transparent member 11 is embedded, and is fitted into the recess 11a of the transparent member 11. The base coat layer 12b is formed between the base portion 12a and the glittering film 12c, and is for improving the adhesion between the base portion 12a and the glittering film 12c. The base coat layer 12b is formed by, for example, clear coating using a transparent (including colored transparent) synthetic resin.

The brilliant film 12c is a layer having metal brilliance, which is formed on the front surface (the surface on the transparent member 11 side) of the base 12a and is arranged so as to cover the base 12a. The glittering film 12c is a metal thin film made of indium (In). The brilliant film 12c has a structure having a plurality of island portions 12c1 (see FIG. 6) arranged with gaps between them, and is a discontinuous film having a large number of fine gaps. Such a brilliant film 12c is capable of transmitting radio waves through these gaps.

The top coat layer 12d is formed on the bright film 12c so as to cover the bright film 12c, and is for protecting the bright film 12c. Like the base coat layer 12b, the top coat layer 12d is also formed by clear coating using a transparent (including colored transparent) synthetic resin.

The base coat layer 12b and the top coat layer 12d can also be a transparent ceramic coat layer made of silicon oxide (SiOx). In this case, it has high heat resistance and high radio wave transmission as compared with a base coat layer or a top coat layer made of a resin formed by clear coating or the like.

Further, in the present embodiment, the glitter film 12c is formed on the surface of the base portion 12a on which the base coat layer 12b is formed. Therefore, in the present embodiment, the base material is composed of the base coat layer 12b and the base portion 12a. When the glittering film 12c having high corrosion resistance is used, the base coat layer 12b can be omitted. In such a case, since the glitter film 12c is formed directly on the surface of the base portion 12a, the base material is composed of the base portion 12a.

The base member 13 is a portion fixed to the back side of the transparent member 11, and is formed of a black resin material. The base member 13 has an engaging portion 13a that projects toward the engine room side. The tip of the engaging portion 13a is formed in a claw shape, and the tip is locked to, for example, a radiator grill body. The base member 13 fixed to the back surface of the transparent member 11 in this way is visible from the outside of the transparent member 11 and forms the black region 10B described above. The base member 13 makes a region other than the bright region 10A visible in black, and relatively improves the visibility of the bright region 10A.

Such a base member 13 includes ABS (acrylonitrile / butadiene / styrene copolymer synthetic resin), AES (acrylonitrile / ethylene / styrene copolymer synthetic resin), ASA (acrylonitrile / styrene / acrylate), PBT (polybutylene terephthalate), and the like. It is made of colored PC, synthetic resin such as PET (polybutylene terephthalate), or a composite resin thereof, and has a thickness of about 0.5 mm to 10 mm.

Subsequently, the method for manufacturing the emblem 10 of the present embodiment will be described with reference to FIGS. 4 to 6. FIG. 4 is a schematic view for explaining a method of manufacturing the emblem 10 of the present embodiment. Further, FIG. 5 is a schematic view of the vacuum vapor deposition apparatus 20 used in the method for manufacturing the emblem 10 of the present embodiment.

First, in the method for manufacturing the emblem 10 of the present embodiment, the transparent member 11 is formed as shown in FIG. 4 (a). For example, the transparent member 11 is formed by injection molding. Since the transparent member 11 having the recess 11a can be formed by this injection molding, it is not necessary to form the recess 11a in the subsequent process. If necessary, the surface side (the surface facing the outside of the vehicle) or the entire surface of the transparent member 11 may be subjected to a hard coat treatment for improving scratch resistance and the like.

Next, as shown in FIG. 4B, the base portion 12a of the inner emblem 12 is formed. For example, the base 12a is formed by injection molding. Subsequently, as shown in FIG. 4C, a base coat coating step is performed. Here, the base portion 12a is subjected to clear coating and then dried to form the base coat layer 12b.

Subsequently, as shown in FIG. 4D, an indium film forming step (metal thin film forming step) is performed. Here, as shown in FIG. 4 (d), the brilliant film 12c is formed on the base coat layer 12b by the vacuum vapor deposition apparatus 20 shown in FIG. As shown in FIG. 5, the vacuum vapor deposition apparatus 20 includes a chamber 21, an evaporation source 22, an ion irradiation unit 23, a holder 24, a gas supply device 25, an exhaust device 26, and a control unit 27. There is. Although not shown in FIG. 5, the vacuum vapor deposition apparatus 20 has the same configuration as a general vacuum vapor deposition apparatus such as a shutter and a heater, in addition to the above configuration. Further, since FIG. 5 is a conceptual diagram, only one base 12a of the inner emblem 12 is shown largely, but in reality, a large number of bases 12a are held inside the chamber 21 while being held by the holder 24. Be placed.

The chamber 21 is a container in which the evaporation source 22 and the ion irradiation unit 23 are arranged inside and house the base portion 12a to be vapor-deposited. The evaporation source 22 is a member that holds indium (In), which is a vapor deposition material, and is arranged at the bottom of the chamber 21. The ion irradiation unit 23 is located at the bottom of the chamber 21 and on the side of the evaporation source 22. The ion irradiation unit 23 ionizes the introduced gas (for example, argon (Ar) gas) supplied from the gas supply device 25 and irradiates the base portion 12a held in the holder 24 as an ion beam.

The holder 24 is located above the chamber 21 and is supported by a support mechanism (not shown). The holder 24 holds the base portion 12a on which the base coat layer 12b is formed so that the base coat layer 12b faces downward (evaporation source 22 side). The holder 24 is capable of holding a plurality of bases 12a. The gas supply device 25 is connected to the ion irradiation unit 23, and supplies a predetermined amount of introduced gas to the ion irradiation unit 23 under the control of the control unit 27. The exhaust device 26 is connected to the chamber 21 and exhausts the air inside the chamber 21 to the outside to create a vacuum inside the chamber 21. The control unit 27 is electrically connected to the ion irradiation unit 23 and the gas supply device 25, and controls the ion irradiation unit 23 and the gas supply device 25.

In such a vacuum vapor deposition apparatus 20, while the holder 24 holds the base portion 12a, the vapor deposition material held in the evaporation source 22 is evaporated by a heater (not shown), and ions are emitted from the ion irradiation unit 23 toward the base portion 12a. Irradiate the beam. When the ion beam is irradiated toward the base portion 12a in this way, the molecules ionized in the ion irradiation unit 23 accelerate the vaporized vapor-deposited material and increase the collision speed of the vapor-deposited material with the base portion 12a. Therefore, the vapor-deposited material can be thinly and widely adhered to the base coat layer 12b of the base portion 12a as compared with the case where the ion beam is not irradiated.

FIG. 6 is a schematic view comparing the brilliant film 12c formed by the manufacturing method of the present embodiment and the brilliant film 30 formed by the conventional manufacturing method. The production method of the present embodiment is a production method in which ions are irradiated by the ion irradiation unit 23 as described above when indium (In) is vapor-deposited on the base coat layer 12b. Further, the conventional manufacturing method is a manufacturing method in which ions are not irradiated when indium (In) is deposited on the base coat layer 12b. In FIG. 6, the solid line shows the brilliant film 12c formed by the manufacturing method of the present embodiment, and the imaginary line shows the brilliant film 30 formed by the conventional manufacturing method.

The brilliant film 12c formed by the production method of the present embodiment is formed by a plurality of island portions 12c1 arranged with a gap. The brilliant film 12c formed by the manufacturing method of the present embodiment has radio wave transmission by transmitting radio waves through the gaps between the islands 12c1. Further, the brilliant film 30 formed by the conventional manufacturing method is also formed by a plurality of island portions 31 arranged with a gap, and has radio wave transmission property. Note that FIG. 6 is a schematic view, and in reality, the gaps between the brilliant film 12c and the brilliant film 30 are arranged irregularly as compared with FIG.

Generally, a metal thin film made of indium (In) having a structure having a plurality of islands arranged with a gap has a metallic luster required for an exterior part of a vehicle unless the thickness dimension is 10 nm or more. I can't. This is because the width dimension of the island (dimension along the surface of the substrate) increases in proportion to the thickness dimension of the island (dimension in the direction orthogonal to the surface of the substrate) due to vacuum deposition. This is because the area of the islands seen from the direction perpendicular to the vapor deposition surface does not grow to the extent that humans can perceive it as metallic luster unless the dimensions grow to 10 nm. That is, in the glitter film 30 formed by the conventional manufacturing method, the width dimension Da that can obtain metallic luster cannot be obtained unless the thickness dimension d1 of the island portion 31 shown in FIG. 6 is 10 nm or more.

On the other hand, in the glitter film 12c formed by the manufacturing method of the present embodiment, the thickness dimension D1 of the island portion 12c1 shown in FIG. 6 is the island portion 31 of the glitter film 30 formed by the conventional manufacturing method. In a state smaller than the thickness dimension d1, the width dimension Da is such that metallic luster can be obtained. As described above, in the manufacturing method of the present embodiment, by adjusting the collision speed of the vapor-deposited material by irradiating the ion beam, a width dimension Da that can obtain metallic luster can be obtained while the thickness dimension D1 of the island portion is small. Be done. That is, in the production method of the present embodiment, the vapor-deposited material can be thinly and widely adhered to the base coat layer 12b of the base portion 12a as compared with the case where the ion beam is not irradiated.

Returning to FIG. 4, when the formation of the brilliant film 12c is completed as described above, as shown in FIG. 4 (e), the surface of the brilliant film 12c is cleared and then dried to form a top. A coat layer 12d is formed. The inner emblem 12 is formed by the steps shown in FIGS. 4 (b) to 4 (e) and FIG. The step of forming the inner emblem 12 shown in FIGS. 4 (b) to 4 (e) does not need to wait for the step of forming the transparent member 11 shown in FIG. 4 (a). By forming the inner emblem 12 in parallel with the step of forming the transparent member 11 shown in FIG. 4A, the manufacturing time of the emblem 10 can be shortened.

Next, as shown in FIG. 4 (f), the inner emblem 12 is fitted into the recess 11a of the transparent member 11. Next, as shown in FIG. 4 (g), the base member 13 is formed. Here, the transparent member 11 in which the inner emblem 12 is installed in the recess 11a is placed inside the mold for injection molding, and insert molding is performed by injecting the molten resin onto the back side of the transparent member 11. The base member 13 is formed. Such a base member 13 is welded to the transparent member 11 by heat during insert molding, and is arranged so as to cover the inner emblem 12. As a result, the inner emblem 12 is fixed to the transparent member 11.

The emblem 10 of the present embodiment is manufactured by the above steps. In the conventional manufacturing method, the thickness dimension of the island portion 31 cannot be adjusted to other than the thickness dimension d1 shown in FIG. 6 in order to obtain the width dimension Da that can obtain the metallic luster shown in FIG. On the other hand, according to the manufacturing method of the present embodiment, the ratio of the width dimension and the thickness dimension of the island portion 12c1 is adjusted by an ion beam to form the glitter film 12c. Therefore, the ratio of the width dimension and the thickness dimension of the island portion 12c1 can be changed as compared with the case of simply performing vacuum deposition. Therefore, according to the manufacturing method of the present embodiment, the thickness dimension of the island portion 12c1 can be suppressed to the thickness dimension D1 shown in FIG. 6, and the width dimension Da can obtain a desired metallic luster. It is possible to reduce the material for forming the film 12c.

FIG. 7 shows the brightness (L value), the thickness dimension (film thickness) of the island portion, and the average width dimension (island size) of the island portion when the bright film is formed by vacuum vapor deposition under different conditions. It is a comparison table. The brilliant film shown by "No. 1" in FIG. 7 is formed by a conventional production method, and the amount of indium (In) used is 1 g. The brilliant film shown in "No. 2" of FIG. 7 was formed by a conventional production method, and the amount of indium (In) used was 0.5 g. The brilliant film shown in "No. 3" of FIG. 7 is formed by the production method of the present embodiment, the amount of indium (In) used is 0.5 g, and the ionized gas is argon (Ar) gas. The energy amount of the ion beam is set to 300 eV. The brilliant film shown in "No. 4" of FIG. 7 was formed by a conventional production method, and the amount of indium (In) used was 0.15 g. The glittering film shown in "No. 5" of FIG. 7 is formed by the production method of the present embodiment, the amount of indium (In) used is 0.1 g, and the ionized gas is argon (Ar) gas. The energy amount of the ion beam is set to 300 eV.

Comparing "No. 1" and "No. 2", the brightness (L value) of "No. 1" is 81.24, whereas the brightness (L value) of "No. 2" is 81.24. It is 67.47. This indicates that when the amount of indium (In) used is reduced, the brightness (L value) decreases. That is, it can be seen that when the island size (width dimension) is small, the brightness (L value) decreases and the metallic luster is lost.

Comparing "No. 2" and "No. 3", the brightness (L value) of "No. 2" is 67.47, the thickness dimension (film thickness) is 48 nm, and the island size (width dimension) is 46 nm. On the other hand, the brightness (L value) of "No. 3" is 80.49, the thickness dimension (film thickness) is 30 nm, and the island size (width dimension) is 72 nm. This is because, according to the manufacturing method of the present embodiment, even if the thickness dimension of the island portion is small, the width dimension of the island portion is secured wider than that of the conventional manufacturing method, and the brightness (L value) is increased. Shown. That is, according to the production method of the present embodiment, it can be seen that a desired metallic luster can be obtained even if the amount of the vapor-deposited material used is reduced.

Comparing "No. 4" and "No. 5", the brightness (L value) of "No. 4" is 41.53 and the thickness dimension (film thickness) is 10 nm, whereas "No. 4" The brightness (L value) of ".5" is 53.36, and the thickness dimension (film thickness) is 6 nm. According to the manufacturing method of the present embodiment, the thickness dimension (film thickness) is about 6 nm, and the brightness (L) is the same as 10 nm, which is the lower limit thickness dimension (film thickness) capable of exhibiting the conventional metallic luster. Value) is obtained. That is, it was found that the metallic luster can be obtained with a film thickness of about 6 nm according to the production method of the present embodiment.

Although the preferred embodiment of the present invention has been described above with reference to the accompanying drawings, it goes without saying that the present invention is not limited to the above embodiment. The various shapes and combinations of the constituent members shown in the above-described embodiment are examples, and can be variously changed based on design requirements and the like without departing from the spirit of the present invention.

For example, in the above embodiment, when the emblem 10 is manufactured, a configuration in which the base portion 12a is fitted into the recess 11a after the glittering film 12c is formed on the base portion 12a side has been described. However, the present invention is not limited to this, and it is also possible to adopt a configuration in which a glittering film 12c is formed on the inner surface of the recess 11a and then the base portion 12a is fitted. In this case, the transparent member 11 (including the top coat layer 12d when forming the top coat layer 12d) is the base material.

Further, in the above embodiment, a configuration is adopted in which the thickness dimension and the width dimension of the island portion are adjusted by irradiating the ion beam at the same time when the vapor deposition material is vacuum-deposited. However, the present invention is not limited to this. It is also possible to perform the film forming step of forming the metal thin film and the shape adjusting step of adjusting the ratio of the thickness dimension and the width dimension of the island portion in separate steps. In such a case, for example, as shown in FIG. 8A, the island portion 40 having a width dimension narrower than the width dimension in which a desired metallic luster can be obtained is formed without irradiating the ion beam. (Film formation process). When the island portion 40 is irradiated with an ion beam after the island portion 40 is formed, the island portion 40 is flattened by the collision of ions as shown in FIG. 8 (b). As a result, the thickness dimension of the island portion 40 decreases and the width dimension of the island portion 40 increases. Then, the ion beam is irradiated until the width dimension of the island portion 40 becomes the width dimension in which the desired metallic luster can be obtained (shape adjustment step). In this way, by performing the film forming process and the shape adjustment process in separate steps, the thickness dimension and the width dimension of the island portion can be separated from the formation of the island portion, and the thickness dimension of the island portion can be obtained. It is possible to finely adjust the width dimension.

Further, when the film forming step and the shape adjusting step are performed in separate steps, the ion molecules collide with the island portion 40, so that minute irregularities can be formed on the surface of the island portion 40. Therefore, the surface area of the island portion 40 can be increased, and the adhesion between the top coat layer 12d and the brilliant film 12c can be improved. Further, by forming minute irregularities on the surface of the island portion 40, the light reflection state on the surface of the island portion 40 can be changed, and the visibility of the glitter film 12c can be adjusted.

Further, in the above embodiment, the configuration in which the vapor deposition material is indium (In) has been described. However, the present invention is not limited to this, and the vapor deposition material can be another material such as aluminum (Al).

Further, in the above embodiment, the configuration in which the radar cover of the present invention is applied to the emblem 10 has been described. However, the present invention is not limited to this, and can be applied to a radar cover installed at a place other than the emblem.

10 ... Emblem (radar cover), 12 ... Inner emblem, 12a ... Base, 12b ... Base coat layer, 12c ... Bright film (metal thin film), 12c1 ... Shimabe

Claims (2)

A method for manufacturing a radar cover in which a metal thin film having a structure having a plurality of islands arranged with a gap is formed on the surface of a base material by vacuum deposition.
Have a thin metal film formation step of forming the metal thin film the ratio between the dimension in the direction orthogonal to the the direction of the dimension along the surface of the substrate of the island portion and the substrate surface is adjusted by ion beam,
In the metal thin film forming step, the vapor-deposited material is accelerated by the ion beam and collides with the base material, so that the dimensions of the island portion in the direction along the surface of the base material are orthogonal to the surface of the base material. Adjust the ratio to the directional dimension
A method of manufacturing a radar cover, which is characterized in that. Method for producing a radar cover according to claim 1, wherein the deposition material is indium.

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