JP6778631B2 - Building design information correction support device, building design information correction support method, and program - Google Patents

Description

The present invention is a building design information correction support device and a building for associating 3D measurement information obtained by actually measuring a building with design information (3D model information such as a design stage) and correcting the design information according to the actual measurement. Design information correction support method and program.

When any equipment is newly installed in the plant building, the layout plan must be made by comparing it with the building design drawing (design information) and maintaining consistency with underground piping, etc., which is difficult to measure. Using this layout plan, consider where in the building the equipment can be installed, and which equipment already installed in the building and how to move it to improve occupancy efficiency and utilization efficiency. To do.

At this time, there is a desire to grasp the detailed dimensional relationship such as the position of the equipment and piping by measuring the position information of the building and the interior parts such as the equipment already installed in the building three-dimensionally and associating it with the building design drawing. There is. Generally, the point cloud data of the object is measured with a 3D measuring instrument or the like to confirm the execution status in the plant building, and the difference between the point cloud data and the design information (3D model information) is confirmed. The dimensional model information is modified or added.

However, it may be difficult to align the 3D model with the point cloud data. In a building such as a plant, many interiors that are not entered in the building blueprint are installed, and the movement of the interiors is not reflected in the building blueprint, or the interiors are complicated and the building structure In many cases, the current state of the building and the building blueprint are inconsistent, such as not being entered in the building blueprint of. When the current state of the building and the building blueprint are inconsistent, it was not possible to perform pattern matching between the actually measured three-dimensional position information (hereinafter, also simply referred to as "three-dimensional information") and the building blueprint. .. In addition, in a building such as a plant where interior parts such as pipes, control panels, and equipment are densely installed, the walls are less exposed, and the actual building structure and the building design drawing are roughly associated (rotation and rotation). Even horizontal displacement, etc.) was difficult.

For example, Patent Document 1 discloses a technique of identifying a part of a wall that has escaped from shielding an interior object from actually measured three-dimensional information, performing pattern matching between the wall and the three-dimensional model, and associating them with each other. There is.

Japanese Unexamined Patent Publication No. 2014-041500

However, with the technique of Patent Document 1, it is not possible to acquire three-dimensional measurement information that can sufficiently represent a characteristic wall surface pattern, or with a wall surface pattern having a symmetrical structure, a plurality of pattern matching candidates are generated, and the correspondence is made. Sometimes it didn't work.

From the above situation, there has been a demand for a method capable of associating the measurement information with the three-dimensional model information which is the design information even if the measurement information has a small amount of information.

In the building design information correction support device of one aspect of the present invention, the arrangement of the penetrating portion which is the connecting portion between the surface portion constituting the structure of the building and the interior is based on the three-dimensional information of the building measured by the three-dimensional measuring unit. From the measurement arrangement pattern extraction unit that extracts one or more measurement arrangement patterns that represent, and the three-dimensional model information that indicates the three-dimensional model of the building that is stored in the storage unit in advance, the surfaces and interiors that make up the structure of the building. The design placement pattern generator that generates one or more design placement patterns that represent the placement of the penetration part, which is the connection part of, and the measurement placement pattern and the design placement pattern are pattern-matched, and the design placement is highly correlated with the measurement placement pattern. It is provided with an arrangement pattern matching unit for selecting a pattern.

The building design information correction support method of one aspect of the present invention is based on the three-dimensional information of the building measured by the three-dimensional measuring unit, and arranges the penetrating portion which is the connecting portion between the surface portion constituting the structure of the building and the interior. From the measurement arrangement pattern step for extracting one or more measurement arrangement patterns representing the above and the three-dimensional model information indicating the three-dimensional model of the building stored in the storage unit in advance, the surface portion and the interior object constituting the structure of the building A design layout pattern generation step that generates one or more design layout patterns that represent the layout of the penetration portion that is the connection part, and pattern matching between the measurement layout pattern and the design layout pattern are performed, and the design layout pattern has a high correlation with the measurement layout pattern. Includes an arrangement pattern matching step to select.

The program of one aspect of the present invention is a program for causing a computer to execute the above-mentioned building design information correction support method.

According to at least one aspect of the present invention, it is possible to align the measurement information of the building and the three-dimensional model information based on the arrangement pattern of the wall including at least the penetrating portion. Therefore, it is possible to easily realize the correspondence between the measurement information with a small amount of information and the three-dimensional model information.
Issues, configurations and effects other than those described above will be clarified by the description of the following embodiments.

It is explanatory drawing which shows the whole structure example of the building design information correction support system which concerns on one Embodiment of this invention. It is explanatory drawing which shows the structural example of the wall of the plant building which concerns on one Embodiment of this invention. It is explanatory drawing of the opening formed in the wall of a plant building. It is schematic cross-sectional view which shows the wall, penetration part and point cloud data acquisition example of the plant building which concerns on one Embodiment of this invention. It is a block diagram which shows the hardware configuration example of the building design information correction support device which concerns on one Embodiment of this invention. It is a flowchart which shows the processing example of the measurement arrangement pattern extraction part which concerns on one Embodiment of this invention. It is explanatory drawing of the normal orthogonal direction point group slice and the continuous part which concerns on one Embodiment of this invention. It is a flowchart which shows the subroutine of the arrangement pattern generation step which concerns on one Embodiment of this invention. It is explanatory drawing of the projection transformation of the plane part including the penetration part which concerns on one Embodiment of this invention. It is a flowchart which shows the processing example of the design arrangement pattern generation part which concerns on one Embodiment of this invention. It is a flowchart which shows the processing example of the arrangement pattern matching part which concerns on one Embodiment of this invention. It is explanatory drawing of the pattern matching of the measurement arrangement pattern and the design arrangement pattern which concerns on one Embodiment of this invention.

Hereinafter, examples of embodiments for carrying out the present invention will be described with reference to the accompanying drawings. In the accompanying drawings, components having substantially the same function or configuration are designated by the same reference numerals, and duplicate description will be omitted. The accompanying drawings show specific embodiments and implementation examples based on the principles of the present invention, but these are for the purpose of understanding the present invention, and in order to interpret the present invention in a limited manner. Not used.

<1. One Embodiment>
Inventors and others focus on penetrations on walls such as pipes that have more features in plants. A through portion such as a pipe corresponds to an opening portion of a through hole formed in a wall surface, and is always present at a main part in the plant. The penetrating portion exists with certain characteristics with respect to the wall surface, the floor surface, and the ceiling surface. The arrangement pattern of these penetration portions is rarely the same in the plant, and it is possible to specify the position in the plant by looking at the arrangement pattern. Such an arrangement pattern can be acquired from a part of the wall surface information without acquiring the information on the wall surface of the entire room. Hereinafter, as an embodiment of the present invention, a building design information correction support system focusing on an arrangement pattern of a penetrating portion such as a pipe will be described.

[Configuration of building design information correction support system]
FIG. 1 shows an overall configuration example of a building design information correction support system according to an embodiment of the present invention. The building design information correction support system 1 includes a design information holding unit 11, a measurement information holding unit 12, and a matching device 20. The matching device 20 is also an example of a building design information correction support device, and is composed of a measurement arrangement pattern extraction unit 21, a design arrangement pattern generation unit 22, an arrangement pattern matching unit 23, a three-dimensional position identification unit 24, and a correction processing unit 25. Will be done.

The three-dimensional measuring unit 30 measures the distances from any one or a plurality of points in the plant building to a plurality of measuring points radially. Here, the measurement point is a point on the surface of an object (interior object, wall, etc.) at a position that can be seen from the three-dimensional measurement unit 30, and can represent the outer shape of the object.

An optical measuring instrument can be used as the three-dimensional measuring unit 30. For example, when a laser measuring instrument is used as the three-dimensional measuring unit 30, the laser beam of the laser measuring instrument is projected in the horizontal direction and swept in the vertical direction, and the distance is derived based on the reflected light of the object with respect to the projected light. By performing such a sweeping operation in the vertical direction in the circumferential direction centered on the vertical axis (horizontal 360 degrees), the distances of all the objects existing in the visible range in the building 10 can be derived. Can be done. In the present embodiment, a laser measuring instrument will be described as an example as the three-dimensional measuring unit 30.

However, the three-dimensional measuring unit 30 is not limited to the laser measuring instrument, and various existing distance measuring means such as a visible camera and infrared rays can be used. For example, if a camera is used as the three-dimensional measuring unit 30, the positions (angles of view) of the objects (measurement points) in the captured images captured by the plurality of cameras are used, and the objects are measured by the three-point positioning method. Distance can be derived.

The measurement by the three-dimensional measuring unit 30 is a connection portion between the surface portion (wall surface, etc.) constituting the structure of the plant building and the interior from the CAD (Computer-Aided Design) model previously held in the design information holding unit 11. It is desirable to extract the penetrating portion and perform it at a measurement position where the arrangement pattern of the penetrating portion on the surface portion can be specified. As a result, efficient point cloud measurement becomes possible.

The design information holding unit 11 (an example of a storage unit) holds CAD models and attribute data at the design stage or after construction as design information of the plant building. The CAD model is three-dimensional model information showing a three-dimensional model including walls, floors, ceilings, and the like as a structure of a plant building. The structure of a plant building is a member that constitutes a room in which interior objects are arranged, and is also a part of the frame of the plant building. The members that make up the room are, for example, walls, floors, and ceilings. Interior objects are pipes, wiring, equipment, and the like. The attribute data is data representing the attributes of each part of the three-dimensional model information. Attribute data includes, for example, buildings, structures (walls, floors, ceilings, etc.), pipes, equipment, and the like. The design information holding unit 11 includes a ROM 62, a non-volatile storage 67, and the like shown in FIG. 5, which will be described later.

The measurement information holding unit 12 (an example of the storage unit) holds the measurement information measured by the three-dimensional measuring unit 30. The measurement information is derived from the measurement results of the three-dimensional measurement unit 30 based on the distances to a plurality of measurement points and the relative direction of the measurement points with respect to the three-dimensional measurement unit 30, and the three-dimensional position of each measurement point. Includes 3D information for all measurement points summarizing (3D coordinates).

The measurement arrangement pattern extraction unit 21 represents the arrangement of the penetration portion which is the connection portion between the surface portion constituting the structure of the plant building and the interior object from the three-dimensional information in the plant building measured by the three-dimensional measurement unit 30. Performs a process of extracting one or more measurement arrangement patterns. The measurement arrangement pattern extraction unit 21 detects a group of points on the plane at each position by gradually shifting the plane having the same normal as the surface portion of the structure in the normal direction, and places close to each plane. A continuous portion in a range of a predetermined length or more in which a group of points in the above is continuously detected is detected as an interior object.

The design arrangement pattern generation unit 22 is a connection portion between the surface portion constituting the structure of the plant building and the interior object from the three-dimensional model information indicating the three-dimensional model of the plant building stored in the design information holding unit 11 in advance. A process is performed to generate one or more design arrangement patterns representing the arrangement of the penetrating portions.

The arrangement pattern matching unit 23 performs pattern matching between the measurement arrangement pattern and the design arrangement pattern, and performs a process of selecting a design arrangement pattern having a high correlation with the measurement arrangement pattern. Then, the arrangement pattern matching unit 23 outputs the information on the correspondence between the measurement arrangement pattern and the design arrangement pattern to the three-dimensional position identification unit 24 as a result of the selection.

The 3D position specifying unit 24 aligns the design arrangement pattern selected by the arrangement pattern matching unit 23 with the corresponding measurement arrangement pattern, and positions the penetration portion of the 3D information in the corresponding surface portion of the 3D model information ( Performs the process of specifying the coordinates).

The correction processing unit 25 corrects the position of the corresponding penetrating portion of the three-dimensional model information based on the position of the penetrating portion of the three-dimensional information specified by the three-dimensional position specifying unit 24, and the three-dimensional design information holding unit 11 Performs the process of updating the model information.

The details of the processing of each processing unit constituting the matching device 20 will be described later. Hereinafter, an example of a plant building to which the present invention is applied will be described.

[Explanation of plant building]
FIG. 2 shows an example of the structure of the wall of the plant building.
FIG. 3 shows an opening formed in the wall of a plant building.

The plant building shown in FIG. 2 has walls 50A to 50C as a skeleton. The wall 50A and the wall 50C are installed in parallel, and the wall 50B is installed so as to be orthogonal to the wall 50A and the wall 50C. One end side of the wall 50B is connected to the wall 50A, and the other end side of the wall 50B is connected to the wall 50C.

The plant building has a plurality of pipes such as pipes 51A to 51D. The pipes 51A to 51D are a part of a system passing through a route penetrating the wall 50A. The pipe 51A penetrates the hole filling member 53A of the opening 52A formed in the wall 50A. Further, the pipe 51B penetrates the hole filling member 53B of the opening 52B, and the pipes 51C and 51D penetrate the hole filling member 53C of the opening 52C. That is, the hole filling members 53A to 53C have through holes (penetration portions) for passing the pipes 51A to 51D to be penetrated. As the hole filling member, a plate-shaped member, a curable resin, or the like can be used.

When constructing a plant building, a hole (opening) larger than the thickness of the pipe is made in the wall so that the pipe route can be passed even if it is slightly deviated. After laying the pipe, the pipe can be penetrated into the wall without a gap by closing the opening with a hole filling member.

Since the through hole is an important part in the alignment between the construction side of the plant building and the construction side of the interior equipment, high accuracy is required for the arrangement when constructing the building. In addition, in a plant building, there are many such through holes in each room, and the arrangement pattern is usually different for each wall. Therefore, by checking the arrangement pattern, it is possible to determine which surface in the room it is. It is possible.

Generally, in the design stage, as shown in FIG. 3, the through hole 54B is designed to be located at the center of the hole filling member 53B fitted in the opening 52B of the wall 50A. However, as a result of the alignment between the construction side of the plant building and the construction side of the interior equipment, a through hole 54Br represented by a chain double-dashed line may be finally provided at a position deviated from the center. Although it has been described as a wall above, the same applies to the ceiling and floor as well as the wall in a plant building that spreads three-dimensionally in the vertical, horizontal, and front-back directions.

FIG. 4 is a schematic cross-sectional view showing a wall, a through hole (penetration portion), and a point cloud data acquisition example of the plant building. FIG. 4 is a diagram illustrating a cross section of the interior of the plant building, but does not correspond to FIG. 2. The cross-sectional view may be considered as a cross section of a horizontal plane or a cross section of a vertical plane.

The space 100 in FIG. 4 is a space surrounded by one room 101 in the plant building. Room 101 is a skeleton of a plant building that partitions a room including a wall, ceiling, and floor, and in FIG. 4, walls P1 to P5 are provided as walls. Although not shown in FIG. 4, the adjacent space inside the plant building extends across the room 101. An opening 52D is formed in the wall P1, and openings 52E and 52F are formed in the wall P2. The hole filling members 53D, 53E, 53F attached to the openings 52D, 52E, 52F each have a through portion. Two pipes 51E and 51F penetrate through the hole filling member 53D and are connected to the space adjacent to the room 101. Further, pipes 51G and 51H penetrate through the hole filling members 53E and 53F, respectively.

The device 102 is a device to which the pipes 51E to 51H are connected. The parts shown by thick lines in the pipes 51E to 51H, the equipment 102, the room 101 (framework), and the hole filling members 53D to 53F are provided by the three-dimensional measuring unit 30 using a laser scanner (an example of an optical three-dimensional measuring unit). It represents the obtained measurement point (point group pg). Although the measurement points are represented by lines, they are actually a group of three-dimensional measurement points (point cloud) including measurement errors. The non-thick line represents a shielded portion generated by the positional relationship between the device 102 and the pipes 51E to 51H and the three-dimensional measuring unit 30, and a portion where a measurement point could not be obtained due to the material and color of the object to be measured.

Due to the influence of the shielded part by piping etc., the penetrating part initially obtained from the point cloud data may not have a closed shape such as a circle, but the penetrating part with a closed shape is calculated using a well-known interpolation processing technique. It is possible to obtain.

If there are few penetrations in the wall surface inside the plant building, the distance between the measurement points is measured at multiple points at different positions at the same time or at different positions multiple times, and the measurement results are measured. It may be integrated (overlapped). In any case, the three-dimensional measuring unit 30 is installed at a position where the distance to the portion where the penetrating portion of the wall is formed can be measured. Further, in FIG. 4, the three-dimensional measuring unit 30 is arranged in the room of the plant building, and the point cloud data of the inner surface of the structure of the room (the wall in FIG. 4) is acquired, but the present invention is not limited to this example. It is also possible to acquire the point cloud data of the outer surface of the structure (wall, etc.) of the room by the 3D measurement unit 30 arranged outside the room, and perform the arrangement pattern matching with the 3D model using the point cloud data. Is.

[Hardware configuration example]
FIG. 5 is a block diagram showing a hardware configuration example of the building design information correction support system 1. FIG. 5 illustrates the hardware configuration of the computer 60 constituting the building design information correction support system 1. Each part of the computer 60 is selected according to the function and purpose of use of each device.

The computer 60 includes a CPU (Central Processing Unit) 61, a ROM (Read Only Memory) 62, and a RAM (Random Access Memory) 63, which are connected to the bus 64, respectively. Further, the computer 60 includes a display unit 65, an operation unit 66, a non-volatile storage 67, and a network interface 68.

The CPU 61 reads the program code of the software that realizes each function according to the present embodiment from the ROM 62 and executes it. The computer 60 may be provided with a processing device such as an MPU (Micro-Processing Unit) instead of the CPU 61. The RAM 63 is a work area of the CPU 61, and variables, parameters, and the like generated during the arithmetic processing are temporarily written.

The display unit 65 is, for example, a liquid crystal display monitor, and displays the result of processing performed by the computer 60 or the like. For example, a keyboard, a mouse, a touch panel, or the like is used for the operation unit 66, and the observer can perform predetermined operation input and instruction. Further, the operation unit 66 may be an operator such as an operation key or a button switch.

Examples of the non-volatile storage 67 include HDD (Hard Disk Drive), SSD (Solid State Drive), flexible disk, optical disk, magneto-optical disk, CD-ROM, CD-R, magnetic tape, non-volatile memory card and the like. Used. In this non-volatile storage 67, in addition to the OS (Operating System), various parameters and data, a program for operating the computer 60 may be recorded. For example, the non-volatile storage 67 functions as a design information holding unit 11 and a measurement information holding unit 12.

For the network interface 68, for example, a NIC (Network Interface Card) or the like is used, and various data can be transmitted and received to and from an external device via a network N such as a LAN.

The measurement arrangement pattern extraction unit 21, the design arrangement pattern generation unit 22, the arrangement pattern matching unit 23, the three-dimensional position identification unit 24, and the correction processing unit 25 included in the matching device 20 may be configured by one computer. , May consist of multiple computers. Hereinafter, the processing of each processing unit of the matching device 20 will be described in detail.

[Processing example of measurement arrangement pattern extraction unit]
First, a processing example of the measurement arrangement pattern extraction unit 21 of the matching device 20 will be described with reference to FIG.
FIG. 6 is a flowchart showing a processing example of the measurement arrangement pattern extraction unit 21. The processing of the flowchart of FIG. 6 is realized by the CPU 61 reading the program recorded in the ROM 62 into the RAM 63 and executing the program.

For example, when the operation unit 66 instructs the start of the measurement arrangement pattern extraction process, the measurement arrangement pattern extraction unit 21 performs a point cloud data reading process from the measurement information holding unit 12 (S1). The point cloud data reading process is a process of reading the point cloud data measured by the three-dimensional measuring unit 30 and held in the measurement information holding unit 12.

Next, the measurement arrangement pattern extraction unit 21 searches for a plane unit from the point cloud data (S2). The plane portion search is a process of finding a point cloud that is considered to be in the same plane from the point cloud data. For example, the spread of a point cloud can be investigated by performing principal component analysis on the coordinate values of adjacent measurement points included in the point cloud. By calculating the position of the center of gravity of the target point group, finding the difference between the position of the center of gravity and each measurement point, and finding the eigenvalue of the covariance matrix of the difference, whether the measurement point group is aligned on the line or not. It is possible to determine whether it is aligned on the top or spread three-dimensionally. Further, in the process of step S2, the normal of the plane can be obtained by the eigenvalue analysis.

Next, the measurement arrangement pattern extraction unit 21 performs an iterative process including steps S4 to S12 for all the flat surface portions P extracted in the process of step S2 (S3).

First, the measurement arrangement pattern extraction unit 21 determines whether or not the flat surface portion P has a predetermined area or more (S4). In the determination process of step S4, a flat surface portion P having a point cloud on one plane (S2 above) and having a size equal to or larger than a predetermined area is extracted as a processing target (wall, floor, ceiling). It is a process. Here, when the flat surface portion P is smaller than the specified area (NO in S4), the measurement arrangement pattern extraction unit 21 proceeds to step S13 and determines whether or not the next flat surface portion P exists. When the measurement arrangement pattern extraction unit 21 determines that the next plane portion P exists, the measurement arrangement pattern extraction unit 21 repeatedly performs a repetitive process including steps S4 to S12 on the next plane portion P.

On the other hand, when the plane portion P is equal to or larger than the specified area (YES in S4), the measurement arrangement pattern extraction unit 21 performs a process of generating a point cloud slice in the normal orthogonal direction (S5). This process is a process of detecting a point cloud on the plane (slice portion) at each position by slightly shifting the plane having the same normal as the plane portion P in the normal direction n. The normal orthogonal point cloud slice will be described with reference to FIG.

FIG. 7 is an explanatory diagram of the normal orthogonal direction point cloud slice and the continuous portion.
In FIG. 7, a plane having the same normal line as the plane portion P corresponding to the wall surface is gradually shifted in the normal direction n, and the object corresponding to the pipe 51 (that is, the continuous portion C) and the shifted plane are displaced. Overlapping portions are detected as slice portions S1, S2, ..., Sn. Then, the object composed of the slice portions S1, S2, ..., Sn is detected as the continuous portion C when a predetermined condition is satisfied. The connecting portion between the flat surface portion P and the continuous portion C (slice portion S1) is the penetrating portion h corresponding to the through hole.

Return to the description of step S6. Next, the measurement arrangement pattern extraction unit 21 has a range (FIG.) in which point clouds located close to each slice unit S1, S2, ..., Sn are continuously detected (that is, the coordinates in each plane are the same or close). The continuous portion C) of 7 is extracted (S6).

Next, the measurement arrangement pattern extraction unit 21 performs an iterative process including steps S8 to S10 for each of the detected continuous units C (S7).

First, the measurement arrangement pattern extraction unit 21 detects the length of the continuous unit C in the normal direction n (S8). Next, the measurement arrangement pattern extraction unit 21 determines whether or not the continuous unit C has a predetermined length or more (S9). Here, if the continuous unit C is smaller than the specified length (NO in S9), the measurement arrangement pattern extraction unit 21 proceeds to step S11 and determines whether or not the processing has been completed for all the continuous units C. When the processing is not completed for all the continuous units C, the measurement arrangement pattern extraction unit 21 repeatedly performs the repetitive processing including steps S8 to S10 for the next continuous unit C.

On the other hand, when the continuous portion C is longer than the specified length, the measurement arrangement pattern extraction unit 21 determines that the connecting portion between the penetrating portion C and the flat surface portion P is the penetrating portion h (YES in S9), and the measurement information holding unit The penetration portion h is registered in the penetration portion list CL stored in 12 (S10).

Next, the measurement arrangement pattern extraction unit 21 determines whether or not the processing has been completed for all the continuous units C (S11), and if the processing has not been completed for all the continuous units C, the next continuous unit C. Repeated processing including steps S8 to S10 is performed on C. On the other hand, when the processing for all the continuous units C is completed, the measurement arrangement pattern extraction unit 21 ends the iterative processing including steps S8 to S10, and proceeds to the processing in step S12.

Next, the measurement arrangement pattern extraction unit 21 performs a process of generating an arrangement pattern of the plane portion P by the plane portion P and the penetration portion list CL (S12). This process will be described later with reference to the flowchart shown in FIG.

Then, the measurement arrangement pattern extraction unit 21 determines whether or not the processing has been completed for all the flat surface portions P (S13), and if the processing has not been completed for all the flat surface portions P, the next flat surface portion Repeated processing including steps S4 to S12 is performed on P. On the other hand, the measurement arrangement pattern extraction unit 21 ends the iterative processing including steps S4 to S12 when the processing is completed for all the flat surface portions P. After the process of step S13, a series of processes of this flowchart is completed.

[Example of placement pattern generation processing]
Here, the arrangement pattern generation process in step S12 will be described with reference to FIGS. 8 and 9.
FIG. 8 is a flowchart showing a subroutine of the arrangement pattern generation process in step S12.
FIG. 9 is an explanatory diagram of a projective transformation of a flat surface portion including a penetrating portion. In the present embodiment, the arrangement pattern is represented by a two-dimensional image.

First, when the arrangement pattern generation process is started, the measurement arrangement pattern extraction unit 21 draws the plane portion P on the two-dimensional image plane i as shown in FIG. 9 (S21).

Next, the measurement arrangement pattern extraction unit 21 performs an iterative process including step S23 for each penetration portion h of the plane portion P registered in the penetration portion list CL in step S10 (S22).

Next, the measurement arrangement pattern extraction unit 21 generates a parallel projection image along the normal line of the plane portion P from the penetration portion h, and draws the parallel projection image on the two-dimensional image plane i (S23).

Next, the measurement arrangement pattern extraction unit 21 determines whether or not the processing has been completed for all the penetrating portions h (S24), and if the processing has not been completed for all the penetrating portions h, the next penetrating portion has been completed. The process of step S23 is performed on the part h. On the other hand, when the processing for all the penetrating portions h is completed, the measurement arrangement pattern extraction unit 21 ends the iterative processing including step S23 and proceeds to the processing in step S25.

Then, the measurement arrangement pattern extraction unit 21 registers the two-dimensional image plane i as an arrangement pattern (here, the measurement arrangement pattern) and saves it in, for example, the measurement information holding unit 12 (S25). After the process of step S25, the process of this flowchart is finished, and the process proceeds to step S13.

[Processing example of design layout pattern generator]
Next, a processing example of the design arrangement pattern generation unit 22 of the matching device 20 will be described with reference to FIG.
FIG. 10 is a flowchart showing a processing example of the design arrangement pattern generation unit 22 that generates an arrangement pattern from the three-dimensional model. When the CPU 61 reads the program recorded in the ROM 62 into the RAM 63 and executes it, the processing of the flowchart of FIG. 10 is realized.

First, when the design arrangement pattern generation process is started, the design arrangement pattern generation unit 22 searches the plane unit P representing the wall, floor, or ceiling from the three-dimensional model based on the attribute data (S31).

Next, the design arrangement pattern generation unit 22 performs iterative processing including steps S33 and S34 for each of the searched plane units P (S32).

First, the design arrangement pattern generation unit 22 searches for the penetration portion h on the flat surface portion P (S33). Next, the design arrangement pattern generation unit 22 performs a process of generating an arrangement pattern of the plane portion P by the plane portion P and the searched penetration portion h (S34). The process of this step S34 is the same as the arrangement pattern generation process of FIG.

Then, the design arrangement pattern generation unit 22 determines whether or not the processing is completed for all the flat surface portions P (S35), and if the processing is not completed for all the flat surface portions P, the next flat surface portion Repeated processing including steps S33 and S34 is performed on P. On the other hand, the design arrangement pattern generation unit 22 ends the iterative processing including steps S33 and 34 when the processing is completed for all the flat surface portions P. After the process of step S35, a series of processes of this flowchart is completed.

[Processing example of arrangement pattern matching part]
FIG. 11 is a flowchart showing a processing example of the arrangement pattern matching unit 23. The processing of the flowchart of FIG. 11 is realized by the CPU 61 reading the program recorded in the ROM 62 into the RAM 63 and executing the program. The arrangement pattern matching unit 23 compares the measurement arrangement pattern Ia with the design arrangement pattern Ib, and performs a process of detecting the design arrangement pattern Ib that best matches the measurement arrangement pattern Ia.

First, when the arrangement pattern matching process is started, the arrangement pattern matching unit 23 performs repetitive processing including steps S42 to S48 for all the measurement arrangement patterns Ia extracted by the measurement arrangement pattern extraction unit 21 (S41).

First, the arrangement pattern matching unit 23 initializes the maximum value Rmax of the correlation index Rab, which represents the strength of correlation (matching degree) of the mutual arrangement patterns to be compared, to, for example, zero (S42).

Next, the arrangement pattern matching unit 23 repeats the processes of steps S44 to S46 for each design arrangement pattern Ib (S43).

First, the arrangement pattern matching unit 23 calculates the correlation index Rab between the measurement arrangement pattern Ia and the design arrangement pattern Ib (S44). For example, as a method of calculating the correlation index Rab, a template matching process in image processing or the like can be used as an example.

Next, the arrangement pattern matching unit 23 compares the maximum value Rmax so far with the value of the correlation index Rab currently being processed to determine the magnitude (S45). Here, when the correlation index Rab is equal to or less than the maximum value Rmax (NO in S45), the arrangement pattern matching unit 23 proceeds to step S47 and determines whether or not the processing has been completed for all the design arrangement patterns Ib. To do. When the processing is not completed for all the design arrangement patterns Ib, the arrangement pattern matching unit 23 performs the iterative processing including steps S44, S45, and S46 for the next design arrangement pattern Ib.

On the other hand, when the correlation index Rab is larger than the maximum value Rmax (YES in S45), the arrangement pattern matching unit 23 replaces the maximum value Rmax with the correlation index Rab and replaces the design arrangement pattern Ib currently being processed with the maximum correlation pattern. It is held in the design information holding unit 11 as Imax (S46).

Next, the arrangement pattern matching unit 23 determines whether or not the processing is completed for all the design arrangement patterns Ib (S47), and if the processing is not completed for all the design arrangement patterns Ib, the next Repeated processing including steps S44 to S46 is performed on the design arrangement pattern Ib. On the other hand, when the processing for all the design arrangement patterns Ib is completed, the arrangement pattern matching unit 23 ends the iterative processing including steps S44 to S46, and proceeds to the processing in step S48.

Next, the arrangement pattern matching unit 23 outputs the design arrangement pattern Imax that most correlates with the measurement arrangement pattern Ia currently being processed to the three-dimensional position identification unit 24 as the maximum correlation pattern Ibmax (S48). Information on the correspondence between the measurement arrangement pattern Ia and the design arrangement pattern Imax (maximum correlation pattern Ibmax) may be stored in the design information holding unit 11 or the measurement information holding unit 12.

Next, the arrangement pattern matching unit 23 determines whether or not the processing is completed for all the measurement arrangement patterns Ia (S49), and if the processing is not completed for all the measurement arrangement patterns Ia, the next Repeated processing including steps S42 to S48 is performed on the measurement arrangement pattern Ia. On the other hand, the arrangement pattern matching unit 23 ends the iterative processing including steps S42 to S48 when the processing for all the measurement arrangement patterns Ia is completed. After the process of step S49, a series of processes of this flowchart is completed.

FIG. 12 is an explanatory diagram of pattern matching between the measurement arrangement pattern Ia and the design arrangement pattern Ib.
All the design arrangement patterns Ib generated based on the design information are compared with the measurement arrangement pattern Ia. In FIG. 12, the correlation index of the design placement pattern Ib1 was Rab1, the correlation index of the design placement pattern Ib2 was Rab2, the correlation index of the design placement pattern Ibn was Rabn, and the correlation index Rab2 of the design placement pattern Ib2 was the highest value. In this case, the design arrangement pattern Ib2 is the highly correlated design arrangement pattern Imax, and becomes the maximum correlation pattern Ibmax. The maximum value Rmax of the correlation index of the maximum correlation pattern Ibmax at this time is the correlation index Rab2 of the design arrangement pattern Ib2.

In the present embodiment, the arrangement pattern matching unit 23 is configured to select the design arrangement pattern Ib having the highest correlation with the measurement arrangement pattern Ia, but detects the design arrangement pattern Ib whose correlation index is equal to or higher than the default value. It may be configured.

As described above, it is possible to specify which place (plane portion) the three-dimensional information (point cloud data) obtained by the three-dimensional measurement unit 30 corresponds to in the three-dimensional model. Then, in the three-dimensional position specifying unit 24 (FIG. 1), the state in which the design arrangement pattern Ib (maximum correlation pattern Ibmax) having the highest correlation with the measurement arrangement pattern Ia to be processed is specified is set as the initial value, and the ICP ( By using the Iterative Closest Point) method or the like, the process of aligning the position of the 3D information and the 3D model with higher accuracy is performed. The three-dimensional position specifying unit 24 calculates the amount of deviation (movement amount) of the corresponding penetrating portion obtained from the actual observation information with respect to the penetrating portion of the corresponding plane portion in the three-dimensional model of the design information.

The ICP method is a matching method that automatically aligns two point clouds given as inputs. In the ICP method, for each point constituting one point group, a rigid body that searches for the nearest neighbor point in the other point group, uses these as temporary correspondence points, and minimizes the distance between such correspondence points. Estimate the transformation. By repeating this corresponding point search and rigid transformation estimation, the motion of aligning the two point clouds is estimated. In other words, it calculates how much one point group should be moved in order to align one point group with respect to the other point group most accurately. In the ICP method, when the motion (movement amount) for aligning two point groups is large, the corresponding point search does not work unless an appropriate initial value is set, and the motion estimation may become unstable due to a local solution. is there.

In the present embodiment, the design arrangement pattern Ib having the highest correlation with the measurement arrangement pattern Ia is specified, and the three-dimensional position identification unit 24 uses this correspondence as an initial value to align the two by the ICP method or the like. It is possible to align with high accuracy.

The correction processing unit 25 (FIG. 1) automatically positions the position of the penetration portion (piping, etc.) of the design information held in the design information holding unit 11 based on the calculation result of the deviation amount of the three-dimensional position specifying unit 24. Fix it. Alternatively, the three-dimensional position specifying unit 24 may display the calculation result of the deviation amount on the display unit 65, and the design worker may confirm the displayed calculation result and give a correction instruction to the design information. When the correction processing unit 25 receives a correction instruction for the design information of the design worker via the operation unit 66, the correction processing unit 25 corrects the position of the penetration portion (pipe, etc.) of the design information held in the design information holding unit 11.

According to the embodiment configured as described above, the measurement information (point cloud data) and the design information are aligned based on the arrangement pattern of the penetrating portion of the wall (structure) included in the measurement information. Can be done. That is, it is possible to align the measurement information (point cloud data) and the three-dimensional model information based on the arrangement pattern of the structure including at least the penetrating portion. Therefore, it is possible to easily realize the correspondence between the measurement information with a small amount of information and the three-dimensional model information. In other words, even if the contour pattern of the wall surface cannot be acquired due to shielding by the interior object or the like, the design arrangement pattern corresponding to the measurement arrangement pattern can be specified, so that the wall surface coordinates can be specified.

Further, in the above-described embodiment, since the penetration portion (through opening) of the structure such as a wall is extracted, not only the arrangement pattern of the penetration portion on the surface portion but also the difference in the shape of the penetration portion can be robustly detected. it can. That is, it is possible to match the measurement arrangement pattern of the penetration portion with the design arrangement pattern corresponding to the shapes of various penetration portions.

The above-described embodiment is particularly suitable for application to a building in which piping, wiring, and the like are complicatedly intricate, such as a plant building. In this embodiment, the arrangement pattern of the penetration portion such as a flat wall is used, but the measurement information (point cloud) is based on the arrangement pattern of the penetration portion on the curved wall surface (floor surface, ceiling surface). It is also possible to align the data) with the 3D model information.

In the above-described embodiment, the building design information correction support system 1 is provided with the design information holding unit 11, but the matching device 20 may be configured to acquire the design information from the server connected to the network N. Further, the measurement information may also be acquired via the network N.

Further, in the above-described embodiment, after positioning in the three-dimensional position specifying unit 24, point cloud data having a position close to that of the CAD model is extracted, the extracted point cloud data is compared with the CAD model, and a location having a large difference is obtained. May be presented on the display unit 65. This makes it possible to support the work of reflecting the physical state of the plant or system in the three-dimensional model information (design information), for example, at the time of delivery after the completion of enforcement.

Further, in the above-described embodiment, after the alignment in the three-dimensional position specifying unit 24, the point cloud data whose position is close to that of the CAD model is extracted, the point cloud data is divided, and the divided point cloud data is applied to the CAD model. It may have attribute data. As a result, the point cloud can be specified by the attribute data, and it becomes easy to extract the measurement point to be operated from the point cloud data.

The present invention is not limited to the above-described embodiments, and it goes without saying that various other application examples and modifications can be taken as long as the gist of the present invention described in the claims is not deviated.

For example, the above-described embodiment describes the configurations of the apparatus and the system in detail and concretely in order to explain the present invention in an easy-to-understand manner, and is not necessarily limited to those including all the described configurations. .. In addition, it is possible to replace a part of the configuration of one embodiment with the configuration of another embodiment. It is also possible to add the configuration of another embodiment to the configuration of one embodiment. Further, it is also possible to add, delete, or replace a part of the configuration of each embodiment with another configuration.

Further, each of the above configurations, functions, processing units, processing means and the like may be realized by hardware by designing a part or all of them by, for example, an integrated circuit. Further, each component of the building design information correction support system 1 according to the embodiment may be implemented in any hardware as long as the respective hardware can send and receive information to and from each other via the network. Further, the processing performed by a certain processing unit may be realized by one hardware, or may be realized by distributed processing by a plurality of hardware.

In addition, the control lines and information lines indicate those that are considered necessary for explanation, and do not necessarily indicate all the control lines and information lines in the product. In practice, it can be considered that almost all configurations are interconnected.

Further, in the present specification, the processing steps for describing the time-series processing are not necessarily the processing performed in the time-series according to the described order, but are parallel or individual. It also includes processing executed in (for example, parallel processing or processing by an object).

1 ... Building design information correction support system, 11 ... Design information holding unit, 12 ... Measurement information holding unit, 20 ... Building design information correction support device, 21 ... Measurement arrangement pattern extraction unit, 22 ... Design arrangement pattern generation unit, 23 ... Arrangement pattern matching unit, 23 ... 3D position identification unit, 25 ... Correction processing unit, 30 ... 3D measurement unit, 50A to 50C ... Wall, 51, 51A to 51H ... Piping, 52A to 52F ... Opening, 53A to 53F ... Filling member, 54B, 54Br ... Penetration part, 60 ... Computer, 61 ... CPU, 100 ... Space, 101 ... Room, C ... Continuous part, h ... Penetration part, I ... Two-dimensional image plane, Ia ... Measurement arrangement pattern , Ib, Ib1, Ib2, Ibn ... Design arrangement pattern, Ibmax ... Maximum correlation pattern, P ... Plane part, P1 to P5 ... Wall, pg ... Point group, Rab ... Correlation index, Rmax ... Maximum value, S1 to Sn ... Slice Department

Claims (9)

Measurement arrangement that extracts one or more measurement arrangement patterns representing the arrangement of the penetration part that is the connection part between the surface part constituting the structure of the building and the interior object from the three-dimensional information of the building measured by the three-dimensional measurement unit. Pattern extractor and
From the 3D model information indicating the 3D model of the building stored in advance in the storage unit, one or more design arrangements representing the arrangement of the penetrating portion which is the connecting portion between the surface portion constituting the structure of the building and the interior. A design layout pattern generator that generates patterns, and
It is provided with an arrangement pattern matching unit that performs pattern matching between the measurement arrangement pattern and the design arrangement pattern and selects the design arrangement pattern having a high correlation with the measurement arrangement pattern .
The measurement arrangement pattern extraction unit detects a group of points on the plane at each position by gradually shifting the plane having the same normal as the surface portion in the normal direction, and is located close to each plane. A building design information correction support device that detects a continuous portion in a range of a predetermined length or longer in which a point group is continuously detected as the interior object . Measurement arrangement that extracts one or more measurement arrangement patterns representing the arrangement of the penetration part that is the connection part between the surface part constituting the structure of the building and the interior object from the three-dimensional information of the building measured by the three-dimensional measurement unit. Pattern extractor and
From the 3D model information indicating the 3D model of the building stored in advance in the storage unit, one or more design arrangements representing the arrangement of the penetrating portion which is the connecting portion between the surface portion constituting the structure of the building and the interior. A design layout pattern generator that generates patterns, and
An arrangement pattern matching unit that performs pattern matching between the measurement arrangement pattern and the design arrangement pattern and selects the design arrangement pattern having a high correlation with the measurement arrangement pattern.
3 Aligns the design arrangement pattern selected by the arrangement pattern matching unit with the measurement arrangement pattern corresponding to the arrangement pattern matching unit, and specifies the position of the penetration portion of the three-dimensional information on the corresponding surface portion of the three-dimensional model information. Dimensional position identification part and
Building design information correction support device equipped with. The second aspect of claim 2 , further comprising a correction processing unit that corrects the position of the corresponding penetrating portion of the three-dimensional model information based on the position of the penetrating portion of the three-dimensional information specified by the three-dimensional position specifying unit. Building design information correction support device. The building design information correction support device according to any one of claims 1 to 3, wherein the structure is a member constituting a room in which the interior is arranged. The building design information correction support device according to any one of claims 1 to 4 , wherein the interior is piping or wiring. Measurement arrangement that extracts one or more measurement arrangement patterns representing the arrangement of the penetration part that is the connection part between the surface part constituting the structure of the building and the interior object from the three-dimensional information of the building measured by the three-dimensional measurement unit. Pattern extraction step and
A design arrangement pattern generation step for generating one or more design arrangement patterns representing the arrangement of the penetration portion from the three-dimensional model information indicating the three-dimensional model of the building stored in the storage unit in advance.
The measurement arrangement pattern and performs pattern matching between the design layout pattern, seen including and a arrangement pattern matching step of selecting a high correlation between the measurement arrangement pattern said design arrangement pattern,
In the measurement arrangement pattern extraction step, a plane having the same normal as the surface portion is gradually shifted in the normal direction to detect a point group on the plane at each position, and the points are located close to each plane. A building design information correction support method for detecting a continuous portion in a range of a predetermined length or longer in which a point group is continuously detected as the interior object . Measurement arrangement that extracts one or more measurement arrangement patterns representing the arrangement of the penetration part that is the connection part between the surface part constituting the structure of the building and the interior object from the three-dimensional information of the building measured by the three-dimensional measurement unit. Pattern extraction step and
A design arrangement pattern generation step for generating one or more design arrangement patterns representing the arrangement of the penetration portion from the three-dimensional model information indicating the three-dimensional model of the building stored in the storage unit in advance.
An arrangement pattern matching step of performing pattern matching between the measurement arrangement pattern and the design arrangement pattern and selecting the design arrangement pattern having a high correlation with the measurement arrangement pattern.
Aligning the design arrangement pattern selected by the arrangement pattern matching step with the measurement arrangement pattern corresponding to the arrangement pattern matching step, and specifying the position of the penetration portion of the three-dimensional information on the corresponding surface portion of the three-dimensional model information 3 Dimensional positioning step and
Building design information correction support method including. A process of extracting one or more measurement arrangement patterns representing the arrangement of a penetration portion which is a connection portion between a surface portion constituting the structure of the building and an interior object from the three-dimensional information of the building measured by the three-dimensional measurement unit. ,
A process of generating one or more design layout patterns representing the layout of the penetration portion from the three-dimensional model information indicating the three-dimensional model of the building stored in the storage unit in advance.
A process of performing pattern matching between the measurement arrangement pattern and the design arrangement pattern and selecting the design arrangement pattern having a high correlation with the measurement arrangement pattern.
In the process of extracting the measurement arrangement pattern, a plane having the same normal as the surface portion is gradually shifted in the normal direction to detect a point group on the plane at each position, and a location close to each plane. A process of detecting a continuous portion in a range of a predetermined length or longer in which the point group in the above is continuously detected as the interior object, and
A program that lets your computer run. A process of extracting one or more measurement arrangement patterns representing the arrangement of a penetration portion which is a connection portion between a surface portion constituting the structure of the building and an interior object from the three-dimensional information of the building measured by the three-dimensional measurement unit. ,
A process of generating one or more design layout patterns representing the layout of the penetration portion from the three-dimensional model information indicating the three-dimensional model of the building stored in the storage unit in advance.
A process of performing pattern matching between the measurement arrangement pattern and the design arrangement pattern and selecting the design arrangement pattern having a high correlation with the measurement arrangement pattern.
A process of aligning the design arrangement pattern selected by the pattern matching with the measurement arrangement pattern corresponding to the pattern matching and specifying the position of the penetration portion of the three-dimensional information on the corresponding surface portion of the three-dimensional model information.
A program that lets your computer run.

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