JP6709029B2 - Composition, method for producing composition, film, near-infrared cut filter, solid-state imaging device, camera module, and image display device - Google Patents

Description

The present invention relates to a composition containing an infrared absorber and a solvent. It also relates to a method for producing the above composition. The present invention also relates to a film, a near infrared ray cut filter, a solid-state image sensor, a camera module and an image display device using the above composition.

CCDs (charge coupled devices) and CMOSs (complementary metal oxide semiconductors), which are solid-state imaging devices for color images, are used in video cameras, digital still cameras, mobile phones with camera functions, and the like. Since these solid-state image pickup devices use silicon photodiodes having sensitivity to infrared rays in their light receiving portions, it is necessary to correct the luminosity, and a near infrared cut filter is often used.

In Patent Document 1, 1 to 50 of a composite tungsten oxide compound is added to 100 parts by mass of an organic solvent on the surface of a molded body obtained by curing a curable composition containing a nonionic near-infrared absorbing compound. An infrared absorbing material having a layer formed by applying a solution containing parts by mass is described.

JP 2012-20448 A

A near-infrared cut filter having a desired film thickness is manufactured by adjusting the viscosity and solid content concentration of the composition. For example, in the case of a composition using a copper compound as an infrared absorber, the film thickness of the near infrared cut filter may be adjusted to about 100 μm by adjusting the viscosity and solid content concentration of the composition.

However, according to the study by the present inventors, it has been found that defects are likely to occur in the near-infrared cut filter as the viscosity and the solid content concentration of the composition are increased. Further, in recent years, further improvement in the liquid stability of the composition has been demanded. According to the study by the present inventors, it has been found that it is difficult for the method described in Patent Document 1 to achieve both the liquid stability of the composition and the suppression of film defects.

Therefore, an object of the present invention is to provide a composition having good liquid stability and capable of producing a film with few defects, a method for producing the composition, a film, a near-infrared cut filter, a solid-state image sensor, a camera module and an image display device. To provide.

As a result of intensive studies, the present inventors have found that in a composition containing an infrared absorber and a solvent, the amount of dissolved oxygen can be set within a predetermined range to achieve the above object, and the present invention has been completed. Came to do. The present invention provides the following.
<1> A composition comprising an infrared absorber and a solvent, wherein the amount of dissolved oxygen in the liquid at 25° C. at 0.1 MPa is 0.1 to 50 mg/L.
<2> The composition according to <1>, wherein the amount of dissolved gas in the liquid at 25° C. at 0.1 MPa is 0.1 to 50 mg/L.
<3> The composition according to <1> or <2>, wherein the infrared absorber is a copper compound.
<4> The composition according to any one of <1> to <3>, which has a solid content concentration of 40% by mass or more.
<5> The composition according to any one of <1> to <4>, which has a viscosity at 25°C of 0.05 to 10 Pa·s.
<6> The composition according to any one of <1> to <5>, further including a compound having a crosslinkable group.
<7> The compound having a crosslinkable group includes the compound having a partial structure represented by MX, and the composition according to <6>, wherein M is selected from Si, Ti, Zr and Al. And X is one selected from a hydroxy group, an alkoxy group, an acyloxy group, a phosphoryloxy group, a sulfonyloxy group, an amino group, an oxime group, and O═C(R ^a )(R ^b ). , R ^a and R ^b each independently represent a monovalent organic group, and when X is O═C(R ^a )(R ^b ), it is a non-shared electron pair of the oxygen atom of the carbonyl group and M Join.
<8> The composition according to <6> or <7>, in which the content of the compound having a crosslinkable group is 15% by mass or more of the total solid content of the composition.
<9> A method for producing a composition according to any one of <1> to <8>, which comprises a step of defoaming a composition A containing an infrared absorber and a solvent. Manufacturing method.
<10> The composition A contains two or more kinds of solvents, and the difference between the boiling point of the solvent having the highest boiling point and the boiling point of the solvent having the lowest boiling point is 10° C. or more. A method for producing the composition according to <9>.
<11> The method for producing a composition according to <9> or <10>, wherein defoaming treatment is performed by at least one method selected from ultrasonic irradiation and reduced pressure.
<12> The method for producing a composition according to any one of <9> to <11>, in which the composition A is filtered and then defoamed.
<13> A film formed by using the composition according to any one of <1> to <8>.
<14> A near infrared cut filter comprising the composition according to any one of <1> to <8>.
<15> A solid-state image sensor having the near infrared cut filter according to <14>.
<16> A camera module having the near infrared cut filter according to <14>.
<17> An image display device having the near infrared cut filter according to <14>.

According to the present invention, it is possible to provide a composition having good liquid stability and capable of producing a film with few defects, and a method for producing the composition. Further, it has become possible to provide a film, a near infrared cut filter, a solid-state image sensor, a camera module, and an image display device.

It is a schematic sectional drawing which shows the structure of the camera module which has a near-infrared cut filter based on embodiment of this invention. It is a schematic sectional drawing which shows an example of the near-infrared cut filter peripheral part in a camera module. It is a schematic sectional drawing which shows an example of the near-infrared cut filter peripheral part in a camera module. It is a schematic sectional drawing which shows an example of the near-infrared cut filter peripheral part in a camera module.

The contents of the present invention will be described in detail below.
In the present specification, “to” is used to mean that the numerical values described before and after it are included as a lower limit value and an upper limit value.
In the description of the group (atomic group) in the present specification, the notation that does not indicate substituted or unsubstituted includes a group (atomic group) having no substituent and a group (atomic group) having a substituent. To do. For example, an “alkyl group” includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).
In the present specification, “(meth)acrylate” means acrylate and methacrylate, “(meth)acrylic” means acryl and methacryl, and “(meth)acryloyl” means acryloyl and methacryloyl.
The method for measuring the weight average molecular weight and the number average molecular weight of the compound used in the present invention can be measured by gel permeation chromatography (GPC), and is defined as a polystyrene conversion value by GPC measurement.
Near-infrared light refers to light (electromagnetic waves) having a maximum absorption wavelength region of 700 to 2500 nm.
In this specification, the total solid content refers to the total mass of components excluding the solvent from the total composition. The solid content in the present invention is the solid content at 25°C.

<Composition>
The composition of the present invention is a composition containing an infrared absorber and a solvent, and having a dissolved oxygen amount in a liquid at 25°C of 0.1 to 50 mg/L. The dissolved oxygen content of the composition is preferably 0.1 to 30 mg/L, more preferably 1 to 10 mg/L, and even more preferably 1 to 5 mg/L.

The composition of the present invention can be a composition capable of producing a film having good liquid stability and few defects by setting the amount of dissolved oxygen in the above range. That is, when the amount of dissolved oxygen is equal to or less than the above-mentioned upper limit value, the proportion of bubble components in the composition can be reduced, and a film such as a near infrared cut filter having few defects can be manufactured. Further, if the amount of dissolved oxygen is not less than the above lower limit, the detailed reason is unknown, but the liquid stability is excellent. The mechanism of improving the liquid stability by setting the amount of dissolved oxygen to the above lower limit or higher is that radicals generated when the material is decomposed in the composition is quenched by a trace amount of oxygen contained in the composition. It is presumed that this is because it is possible.

In the composition of the present invention, the amount of dissolved gas in the liquid at 25° C. at 0.1 MPa is preferably 0.1 to 50 mg/L, more preferably 0.1 to 30 mg/L, and 1 to 10 mg/L. L is more preferred. The dissolved gas in the composition includes oxygen, hydrogen, carbon dioxide, nitrogen and the like.
In the present invention, the dissolved gas amount and the dissolved oxygen amount of the composition can be measured by a known method such as a gas chromatograph and a dissolved oxygen meter. For example, the amount of dissolved oxygen can be calculated from the ratio of the oxygen partial pressure to that of the saturated dissolved oxygen solution using an Orbisphere 510 gas analyzer (manufactured by Hack Ultra Co., Ltd.).

The composition of the present invention preferably has a viscosity at 25° C. of 0.05 to 10 Pa·s. The upper limit is preferably 1.0 Pa·s or less, more preferably 0.5 Pa·s or less. The lower limit is preferably 0.075 Pa·s or more, more preferably 0.1 Pa·s or more. In the present specification, the value of viscosity is a value measured by the method described in Examples below.
The solid content concentration of the composition of the present invention is, for example, preferably 40% by mass or more. The lower limit is preferably 45% by mass or more, more preferably 50% by mass or more. The upper limit is preferably 95% by mass or less, and more preferably 60% by mass or less.
As the viscosity and solid content concentration of the composition are increased, bubbles tend to be mixed in during the production of the composition, and the dissolved oxygen content of the composition tends to increase, resulting in defects in the film and liquid stability of the composition. However, according to the present invention, by setting the amount of dissolved oxygen in the range described above, even with a composition having such a viscosity and a solid content concentration, liquid stability is good, A composition capable of producing a film with few defects can be obtained. That is, in the case of a composition having a viscosity and a solid content concentration, the effect of the present invention can be more remarkably obtained.
Hereinafter, the composition of the present invention will be described in detail.

<<Infrared absorber>>
The composition of the present invention contains an infrared absorber. The infrared absorbent is preferably a compound having a maximum absorption wavelength in the range of 700 to 1200 nm, more preferably a compound having a maximum absorption wavelength in the range of 700 to 1000 nm. The infrared absorbent is a compound that has absorption in the infrared wavelength region (preferably in the wavelength range of 700 to 1200 nm) and transmits light in the visible region (preferably in the wavelength range of 400 to 650 mn). preferable.

As the infrared absorber, for example, a copper compound, a pyrrolopyrrole compound, a squarylium compound, a cyanine compound, a phthalocyanine compound, a naphthalocyanine compound, a diimmonium compound, a thiol complex compound, a transition metal oxide compound, a quaterylene compound, a croconium compound Etc. Among them, a copper compound, a pyrrolopyrrole compound, a squarylium compound, a cyanine compound, a phthalocyanine compound, a naphthalocyanine compound is preferable, because it is easy to form a film excellent in both near-infrared shielding property and visible transmittance, and a copper compound, Pyrrolopyrrole compounds, squarylium compounds, and cyanine compounds are more preferable. Further, as the infrared absorber, a copper compound is particularly preferable because the effect of the present invention can be remarkably obtained.

(Copper compound)
In the present invention, the copper compound used as the infrared absorber is preferably a copper complex. As the copper complex, a complex of copper and a compound (ligand) having a coordination site for copper is preferable. Examples of the coordination site for copper include a coordination site that coordinates with an anion and a coordination atom that coordinates with an unshared electron pair. The copper complex may have two or more ligands. When two or more ligands are included, the respective ligands may be the same or different. The copper complex is exemplified by four-coordinate, five-coordinate and six-coordinate, more preferably four-coordinate and five-coordinate, still more preferably five-coordinate. Further, the copper complex preferably has a 5-membered ring and/or a 6-membered ring formed by copper and a ligand. Such a copper complex has a stable shape and is excellent in complex stability.

In the present invention, the copper complex is also preferably a copper complex other than the phthalocyanine copper complex. Here, the phthalocyanine copper complex is a copper complex having a compound having a phthalocyanine skeleton as a ligand. In a compound having a phthalocyanine skeleton, a π-electron conjugated system spreads throughout the molecule and has a planar structure. The phthalocyanine copper complex absorbs light at the π-π* transition. In order to absorb light in the infrared region by the π-π* transition, the compound forming the ligand needs to have a long conjugated structure. However, when the conjugated structure of the ligand is lengthened, the visible light transmittance tends to decrease. Therefore, the phthalocyanine copper complex may have insufficient visible light transmittance.
It is also preferable that the copper complex is a copper complex having a compound having no maximum absorption wavelength in the wavelength region of 400 to 600 nm as a ligand. When a copper complex having a compound having a maximum absorption wavelength in the wavelength region of 400 to 600 nm as a ligand has absorption in the visible region (for example, the wavelength region of 400 to 600 nm), the visible light transmittance is insufficient. There is. Examples of the compound having the maximum absorption wavelength in the wavelength region of 400 to 600 nm include a compound having a long conjugated structure and having a large absorption of the light of the π-π* transition. Specific examples include compounds having a phthalocyanine skeleton.

The copper complex can be obtained, for example, by mixing and reacting with a copper component (copper or a compound containing copper) a compound (ligand) having a coordination site for copper. The compound (ligand) having a coordination site for copper may be a low molecular weight compound or a polymer. Both can be used together.

The copper component is preferably a compound containing divalent copper. As the copper component, only one kind may be used, or two or more kinds may be used. As the copper component, for example, copper oxide or a copper salt can be used. Copper salts include, for example, copper carboxylates (for example, copper acetate, copper ethylacetoacetate, copper formate, copper benzoate, copper stearate, copper naphthenate, copper citrate, copper 2-ethylhexanoate), copper sulfonate, and the like. (For example, copper methanesulfonate, etc.), copper phosphate, copper phosphate, copper phosphonate, copper phosphonate, copper phosphinate, copper amide, sulfonamide copper, imide copper, acyl sulfonimide copper, bissulfonimide Copper, methide copper, alkoxy copper, phenoxy copper, copper hydroxide, copper carbonate, copper sulfate, copper nitrate, copper perchlorate, copper fluoride, copper chloride, copper bromide is preferable, copper carboxylate, copper sulfonate, Sulfonamide copper, imide copper, acyl sulfonimide copper, bissulfonimide copper, alkoxy copper, phenoxy copper, copper hydroxide, copper carbonate, copper fluoride, copper chloride, copper sulfate, copper nitrate is more preferable, copper carboxylate, Acyl sulfonimide copper, phenoxy copper, copper chloride, copper sulfate and copper nitrate are more preferable, and copper carboxylate, acyl sulfonimide copper, copper chloride and copper sulfate are particularly preferable.

In the present invention, the copper complex is preferably a compound having a maximum absorption wavelength in the wavelength range of 700 to 1200 nm. The maximum absorption wavelength of the copper complex is more preferably in the wavelength range of 720 to 1200 nm, further preferably in the wavelength range of 800 to 1100 nm. The maximum absorption wavelength can be measured by using, for example, Cary 5000 UV-Vis-NIR (Spectrophotometer manufactured by Agilent Technology Co., Ltd.).
The molar absorption coefficient of the copper complex at the maximum absorption wavelength in the above-mentioned wavelength region is preferably 120 (L/mol·cm) or more, more preferably 150 (L/mol·cm) or more, and 200 (L/mol·cm). ) Or more is more preferable, 300 (L/mol·cm) or more is still more preferable, and 400 (L/mol·cm) or more is particularly preferable. The upper limit is not particularly limited, but can be, for example, 30,000 (L/mol·cm) or less. If the molar extinction coefficient of the copper complex is 100 (L/mol·cm) or more, it is possible to form a film excellent in infrared ray shielding property even if it is a thin film.
The Gram extinction coefficient at 800 nm of the copper complex is preferably 0.11 (L/g·cm) or more, more preferably 0.15 (L/g·cm) or more, and 0.24 (L/g·cm). The above is more preferable.
In the present invention, the molar extinction coefficient and gram extinction coefficient of the copper complex are determined by dissolving the copper complex in a solvent to prepare a solution having a concentration of 1 g/L, and measuring the absorption spectrum of the solution in which the copper complex is dissolved. Can be asked. As a measuring device, UV-1800 (wavelength region 200 to 1100 nm) manufactured by Shimadzu Corporation, Cary 5000 (wavelength region 200 to 1300 nm) manufactured by Agilent, and the like can be used. Examples of the measurement solvent include water, N,N-dimethylformamide, propylene glycol monomethyl ether, 1,2,4-trichlorobenzene, and acetone. In the present invention, of the above-mentioned measurement solvents, those capable of dissolving the copper complex to be measured are selected and used. Among them, in the case of a copper complex that dissolves in propylene glycol monomethyl ether, it is preferable to use propylene glycol monomethyl ether as the measurement solvent. The term “dissolved” means that the solubility of the copper complex in a solvent at 25° C. exceeds 0.01 g/100 g Solvent.
In the present invention, the molar extinction coefficient and gram extinction coefficient of the copper complex are preferably values measured using any one of the above-mentioned measurement solvents, and more preferably values of propylene glycol monomethyl ether. .

[Low molecular type copper compound]
As the copper compound, for example, a copper complex represented by the following formula (Cu-1) can be used. This copper complex is a copper compound in which a ligand L is coordinated with copper as a central metal, and copper is usually divalent copper. For example, it can be obtained by mixing and reacting a compound or a salt thereof which becomes the ligand L with a copper component.
Cu(L) _n1 ·(X) _n2 formula (Cu-1)
In the above formula, L represents a ligand that coordinates with copper, and X represents a counter ion. n1 represents the integer of 1-4. n2 represents the integer of 0-4.

X represents a counter ion. The copper compound may be a cation complex or an anion complex in addition to a neutral complex having no electric charge. In this case, a counterion is optionally present to neutralize the charge on the copper compound.
When the counterion is a negative counterion, it may be, for example, an inorganic anion or an organic anion. Specific examples thereof include hydroxide ion, halogen anion (eg, fluoride ion, chloride ion, bromide ion, iodide ion, etc.), and substituted or unsubstituted alkylcarboxylate ion (acetate ion, trifluoroacetate ion). Etc.), substituted or unsubstituted arylcarboxylate ion (benzoate ion, etc.), substituted or unsubstituted alkylsulfonate ion (methanesulfonate ion, trifluoromethanesulfonate ion, etc.), substituted or unsubstituted arylsulfonic acid Ions (for example, para-toluenesulfonate ion, para-chlorobenzenesulfonate ion, etc.), aryldisulfonate ions (for example, 1,3-benzenedisulfonate ion, 1,5-naphthalenedisulfonate ion, 2,6-naphthalenedisulfonate ion) Ion, etc.), alkylsulfate ion (eg, methylsulfate ion), sulfate ion, thiocyanate ion, nitrate ion, perchlorate ion, tetrafluoroborate ion, tetraarylborate ion, tetrakis(pentafluorophenyl)borate ion ^{_{(B - (C 6 F 5}} ) 4), ( comprising an amide substituted with an acyl group or a sulfonyl group) hexafluorophosphate ion, picrate ion, amide ion, substituted with Mechidoion (acyl group or a sulfonyl group Methides are included), halogen anions, substituted or unsubstituted alkylcarboxylate ions, sulfate ions, nitrate ions, tetrafluoroborate ions, tetraarylborate ions, hexafluorophosphate ions, amide ions (acyl groups). And an amide substituted with a sulfonyl group) and a methide ion (including a methide substituted with an acyl group or a sulfonyl group) are preferable.
When the counter ion is a positive counter ion, for example, an inorganic or organic ammonium ion (eg, tetraalkylammonium ion such as tetrabutylammonium ion, triethylbenzylammonium ion, pyridinium ion, etc.), phosphonium ion (eg, tetrabutylphosphonium ion) Ion such as tetraalkylphosphonium ion, alkyltriphenylphosphonium ion, triethylphenylphosphonium ion), alkali metal ion or proton.
The counter ion may be a metal complex ion, and in particular, the counter ion may be a copper complex, that is, a salt of a cationic copper complex and an anionic copper complex.

The ligand L is a compound having a coordination site for copper, and is one kind selected from a coordination site for coordinating an anion with copper and a coordination atom for coordinating an unshared electron pair with copper. The compound which has the above is mentioned. The coordination site coordinated with an anion may be dissociated or non-dissociated. The ligand L is preferably a compound (polydentate ligand) having two or more coordination sites for copper. Further, in order to improve the visible transparency, the ligand L preferably does not have a plurality of π-conjugated systems such as aromatics continuously bonded. As the ligand L, a compound having one coordination site for copper (monodentate ligand) and a compound having two or more coordination sites for copper (polydentate ligand) can be used in combination. Examples of the monodentate ligand include a monodentate ligand that coordinates with an anion or an unshared electron pair. Ligands that coordinate with anions include halide anions, hydroxide anions, alkoxide anions, phenoxide anions, amide anions (including amides substituted with acyl groups and sulfonyl groups), imide anions (acyl groups and sulfonyl groups). (Including substituted imide), anilide anion (including anilide substituted with an acyl group or a sulfonyl group), thiolate anion, hydrogen carbonate anion, carboxylate anion, thiocarboxylate anion, dithiocarboxylate anion, hydrogen sulfate anion, sulfone Acid anion, dihydrogen phosphate anion, phosphate diester anion, phosphonate monoester anion, phosphonate hydrogen anion, phosphinate anion, nitrogen-containing heterocyclic anion, nitrate anion, hypochlorite anion, cyanide anion, cyan Examples thereof include naate anion, isocyanate anion, thiocyanate anion, isothiocyanate anion and azide anion. The monodentate ligand coordinated with a non-covalent electron pair, water, alcohol, phenol, ether, amine, aniline, amide, imide, imine, nitrile, isonitrile, thiol, thioether, carbonyl compound, thiocarbonyl compound, sulfoxide, The hetero ring, carbonic acid, carboxylic acid, sulfuric acid, sulfonic acid, phosphoric acid, phosphonic acid, phosphinic acid, nitric acid, or an ester thereof can be used.

The anion contained in the ligand may be any anion that can coordinate with a copper atom in the copper component, and is preferably an oxygen anion, a nitrogen anion or a sulfur anion. The coordination site coordinated with an anion is preferably at least one selected from the following monovalent functional group group (AN-1) or divalent functional group group (AN-2). In addition, the wavy line in the following structural formulas is the bonding position with the atomic group constituting the ligand.

Group (AN-1)

Group (AN-2)

In the above formula, X represents N or CR, and R's each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group or a heteroaryl group.
The alkyl group represented by R may be linear, branched or cyclic, but is preferably linear. 1-10 are preferable, as for carbon number of an alkyl group, 1-6 are more preferable, and 1-4 are still more preferable. A methyl group is mentioned as an example of an alkyl group. The alkyl group may have a substituent, and examples of the substituent include a halogen atom, a carboxyl group and a hetero group. The heterocyclic group as a substituent may be monocyclic or polycyclic, and may be aromatic or non-aromatic. 1-3 are preferable and, as for the number of the hetero atoms which comprise a heterocycle, 1 or 2 is preferable. The hetero atom constituting the hetero ring is preferably a nitrogen atom. When the alkyl group has a substituent, it may further have a substituent.
The alkenyl group represented by R may be linear, branched or cyclic, but is preferably linear. 1-10 are preferable and, as for carbon number of an alkenyl group, 1-6 are more preferable. The alkenyl group may be unsubstituted or may have a substituent. Examples of the substituent include those mentioned above.
The alkynyl group represented by R may be linear, branched or cyclic, but is preferably linear. 1-10 are preferable and, as for carbon number of an alkynyl group, 1-6 are more preferable. The alkynyl group may be unsubstituted or may have a substituent. Examples of the substituent include those mentioned above.
The aryl group represented by R may be monocyclic or polycyclic, but monocyclic is preferable. 6-18 are preferable, as for carbon number of an aryl group, 6-12 are more preferable, and 6 is more preferable. The aryl group may be unsubstituted or may have a substituent. Examples of the substituent include those mentioned above.
R represents.
The heteroaryl group may be monocyclic or polycyclic. The number of heteroatoms constituting the heteroaryl group is preferably 1 to 3. The hetero atom constituting the heteroaryl group is preferably a nitrogen atom, a sulfur atom or an oxygen atom. 6-18 are preferable and, as for carbon number of a heteroaryl group, 6-12 are more preferable. The heteroaryl group may be unsubstituted or may have a substituent. Examples of the substituent include those mentioned above.

Examples of coordination sites coordinated with anions include monoanionic coordination sites. The monoanionic coordination site represents a site that coordinates with a copper atom via a functional group having one negative charge. Examples thereof include acid groups having an acid dissociation constant (pKa) of 12 or less. Specific examples thereof include a phosphorus atom-containing acid group (phosphoric acid diester group, phosphonic acid monoester group, phosphinic acid group, etc.), a sulfo group, a carboxyl group, an imidic acid group, and the like. preferable.

The coordinating atom coordinated by the unshared electron pair is preferably an oxygen atom, a nitrogen atom, a sulfur atom or a phosphorus atom, more preferably an oxygen atom, a nitrogen atom or a sulfur atom, further preferably an oxygen atom or a nitrogen atom, and a nitrogen atom. Is particularly preferable. When the coordinating atom coordinated by the unshared electron pair is a nitrogen atom, the atom adjacent to the nitrogen atom is preferably a carbon atom or a nitrogen atom, and more preferably a carbon atom.

A coordinating atom that coordinates with an unshared electron pair is included in a ring, or the following monovalent functional group (UE-1), divalent functional group (UE-2), and trivalent functional group. It is preferably contained in at least one partial structure selected from the base group (UE-3). In addition, the wavy line in the following structural formulas represents the bonding position with the atomic group constituting the ligand.
Group (UE-1)

Group (UE-2)

Group (UE-3)

In the groups (UE-1) to (UE-3), R ¹ represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group or a heteroaryl group, and R ² represents a hydrogen atom, an alkyl group, an alkenyl. Represents a group, alkynyl group, aryl group, heteroaryl group, alkoxy group, aryloxy group, heteroaryloxy group, alkylthio group, arylthio group, heteroarylthio group, amino group or acyl group.

A coordinating atom that coordinates with an unshared electron pair may be contained in the ring. When the ring contains a coordinating atom that coordinates with an unshared electron pair, the ring containing the coordinating atom that coordinates with the unshared electron pair may be a monocycle or a polycycle, and It may be aromatic or non-aromatic. The ring containing a coordinating atom that coordinates with an unshared electron pair is preferably a 5- to 12-membered ring, and more preferably a 5- to 7-membered ring.
The ring containing a coordinating atom that coordinates with an unshared electron pair may have a substituent, and as the substituent, a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, or a carbon number Examples thereof include an aryl group having 6 to 12, a halogen atom, a silicon atom, an alkoxy group having 1 to 12 carbon atoms, an acyl group having 2 to 12 carbon atoms, an alkylthio group having 1 to 12 carbon atoms, and a carboxyl group.
When the ring containing a coordinating atom that coordinates with an unshared electron pair has a substituent, it may further have a substituent, and from a ring containing a coordinating atom that coordinates with an unshared electron pair. Group, a group containing at least one kind of partial structure selected from the groups (UE-1) to (UE-3) described above, an alkyl group having 1 to 12 carbon atoms, an acyl group having 2 to 12 carbon atoms, and hydroxy. Groups.

When the coordinating atom that coordinates with the unshared electron pair is included in the partial structures represented by the groups (UE-1) to (UE-3), R ¹ represents a hydrogen atom, an alkyl group, an alkenyl group, or an alkynyl group. Represents an aryl group or a heteroaryl group, R ² is a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, a heteroaryloxy group, an alkylthio group, an arylthio group. Represents a heteroarylthio group, an amino group or an acyl group.
The alkyl group, the alkenyl group, the alkynyl group, the aryl group, and the heteroaryl group have the same meanings as the alkyl group, the alkenyl group, the alkynyl group, the aryl group, and the heteroaryl group described for the coordination site coordinated with the anion. The preferred range is also the same.
1-12 are preferable and, as for carbon number of an alkoxy group, 3-9 are more preferable.
6-18 are preferable and, as for carbon number of an aryloxy group, 6-12 are more preferable.
The heteroaryloxy group may be monocyclic or polycyclic. The heteroaryl group constituting the heteroaryloxy group has the same meaning as the heteroaryl group described for the coordination site coordinated with the anion, and the preferred range is also the same.
1-12 are preferable and, as for carbon number of an alkylthio group, 1-9 are more preferable.
6-18 are preferable and, as for carbon number of an arylthio group, 6-12 are more preferable.
The heteroarylthio group may be monocyclic or polycyclic. The heteroaryl group constituting the heteroarylthio group has the same meaning as the heteroaryl group described for the coordination site coordinated with the anion, and the preferred range is also the same.
2-12 are preferable and, as for carbon number of an acyl group, 2-9 are more preferable.

When the ligand has a coordination site coordinated with an anion and a coordination atom coordinated with a non-shared electron pair in one molecule, a ligand site coordinated with a coordination site coordinated with an anion with a non-shared electron pair. The number of atoms connecting with the coordinating atom positioned is preferably from 1 to 6, and more preferably from 1 to 3. With such a structure, the structure of the copper complex is more likely to be distorted, so that the color value can be further improved, and the molar absorption coefficient can be easily increased while increasing the visible light transmittance. The number of kinds of atoms connecting the coordination site coordinated with the anion and the coordination atom coordinated with the unshared electron pair may be one kind or two or more kinds. A carbon atom or a nitrogen atom is preferable.

When the ligand has two or more coordinating atoms that coordinate with an unshared electron pair in one molecule, it may have three or more coordinating atoms that coordinate with an unshared electron pair. It is preferable to have ~5, and more preferable to have 4. The number of atoms connecting the coordinating atoms coordinated by the unshared electron pair is preferably 1 to 6, more preferably 1 to 3, further preferably 2 to 3, and particularly preferably 3. With such a structure, the structure of the copper complex is more likely to be distorted, so that the color value can be further improved. The atom connecting the coordinating atoms that coordinate with the unshared electron pair may be one kind or two or more kinds. The atom connecting the coordinating atoms that coordinate with the unshared electron pair is preferably a carbon atom.

The ligand is preferably a compound having at least two coordination sites (also referred to as a polydentate ligand). The ligand preferably has at least three coordination sites, more preferably has 3 to 5, and most preferably has 4 to 5 coordination sites. The polydentate ligand acts as a chelate ligand for the copper component. That is, when at least two coordination sites of the polydentate ligand are chelated to copper, the structure of the copper complex is distorted, high transmittance in the visible light region is obtained, and the infrared absorption ability is increased. It can be improved and the color value is also considered to be improved.

The polydentate ligand is a compound containing at least one coordination site coordinated with an anion and at least one coordination atom coordinated with an unshared electron pair, and a coordination coordinated with an unshared electron pair. Examples thereof include compounds having two or more atoms, compounds containing two coordination sites coordinated by anions, and the like. These compounds may be used alone or in combination of two or more. Further, as the compound serving as a ligand, a compound having only one coordination site can be used.

The polydentate ligand is preferably a compound represented by the following general formulas (IV-1) to (IV-14). For example, when the ligand is a compound having four coordination sites, compounds represented by the following formulas (IV-3), (IV-6), (IV-7) and (IV-12) are The compound represented by (IV-12) is more preferable because it is more strongly coordinated to the metal center and a stable pentacoordinated complex having high heat resistance is easily formed. Moreover, for example, when the ligand is a compound having five coordination sites, the following formulas (IV-4), (IV-8) to (IV-11), (IV-13), and (IV- The compound represented by 14) is preferable, and it is (IV-9) to (IV-10), (IV-10), (IV-10), (IV-10), (IV-10) and (IV-10), because it is more strongly coordinated to the metal center and easily forms a stable pentacoordinated complex with high heat resistance. The compounds represented by IV-13) and (IV-14) are more preferable, and the compounds represented by (IV-13) are particularly preferable.

In formulas (IV-1) to (IV-14), X ^{1 to} X ⁵⁹ each independently represent a coordination site, and L ^{1 to} L ²⁵ each independently represent a single bond or a divalent linking group. , L ^{26 to} L ³² each independently represent a trivalent linking group, and L ^{33 to} L ³⁴ each independently represent a tetravalent linking group.
X ^{1 to} X ⁴² are each independently selected from the group consisting of a ring containing a coordinating atom that coordinates with an unshared electron pair, the group (AN-1) or the group (UE-1) described above. It is preferable to represent at least one kind.
X ^{43 to} X ⁵⁶ are each independently selected from the group consisting of a ring containing a coordinating atom coordinated by an unshared electron pair, the group (AN-2) or the group (UE-2) described above. It is preferable to represent at least one kind.
It is preferable that X ^{57 to} X ⁵⁹ each independently represent at least one selected from the group (UE-3) described above.
L ^{1 to} L ²⁵ each independently represent a single bond or a divalent linking group. The divalent linking group is preferably an alkylene group having 1 to 12 carbon atoms, an arylene group having 6 to 12 carbon atoms, —SO—, —O—, —SO ₂ — or a group consisting of a combination thereof, and carbon number 1-3 alkylene group, a phenylene group, -SO ₂ - or more preferably a group comprising a combination thereof.
L ^{26 to} L ³² each independently represent a trivalent linking group. Examples of the trivalent linking group include groups obtained by removing one hydrogen atom from the divalent linking group described above.
L ^{33 to} L ³⁴ each independently represent a tetravalent linking group. Examples of the tetravalent linking group include groups obtained by removing two hydrogen atoms from the divalent linking group described above.
Here, the group (AN-1) R in ~ (AN-2), and, R ¹ in group (UE-1) ~ (UE -3) is, R to each other, R ¹ or between, and R R ¹ may be connected to each other to form a ring.

Specific examples of the compound forming the ligand include the compounds shown below, the compounds shown as preferable specific examples of the polydentate ligand described below, and salts of these compounds. Examples of atoms constituting the salt include metal atoms and tetrabutylammonium. As the metal atom, an alkali metal atom or an alkaline earth metal atom is more preferable. Examples of the alkali metal atom include sodium and potassium. Examples of the alkaline earth metal atom include calcium and magnesium. Further, the descriptions of paragraphs 0022 to 0042 of JP-A-2014-41318 and the descriptions of paragraphs 0021 to 0039 of JP-A-2015-43063 can be referred to, and the contents thereof are incorporated in the specification of the present application.

As the copper complex, for example, the following embodiments (1) to (5) are mentioned as preferable examples, (2) to (5) are more preferable, (3) to (5) are further preferable, and (4) or (5) is more preferable.
(1) Copper complex having one or two compounds having two coordination sites as ligands (2) Copper complex having a compound having three coordination sites as ligands (3) Three coordinations Copper complex having a compound having a coordination site and a compound having two coordination sites as ligands (4) Copper complex having a compound having four coordination sites as a ligand (5) Five coordination sites Complex having a compound containing a metal as a ligand

In the aspect of the above (1), the compound having two coordination sites is a compound having two coordination atoms which coordinate with a non-shared electron pair, or a coordination site which coordinates with an anion and a non-shared electron pair. Compounds having a coordinating atom that coordinates with are preferred. Moreover, when two of the compounds having two coordination sites are used as the ligand, the compounds of the ligand may be the same or different.
Moreover, in the aspect of (1), the copper complex may further have a monodentate ligand. The number of monodentate ligands may be 0 or 1 to 3. As the type of monodentate ligand, both a monodentate ligand coordinated with an anion and a monodentate ligand coordinated with a non-covalent electron pair are preferable, and a compound having two coordination sites is a non-covalent electron pair. In the case of a compound having two coordinating coordinating atoms, a monodentate ligand coordinated with an anion is more preferable because the coordinating force is strong, and a compound having two coordination sites is coordinated with an anion. In the case of a compound having a coordination site and a coordinating atom that coordinates with an unshared electron pair, a monodentate ligand that coordinates with an unshared electron pair is more preferable because the entire complex has no charge.

In the aspect of (2) above, the compound having three coordination sites is preferably a compound having a coordination atom coordinated with an unshared electron pair, and has three coordination atoms coordinated with an unshared electron pair. Compounds are more preferred.
Moreover, in the aspect of (2), the copper complex may further have a monodentate ligand. The number of monodentate ligands may be zero. Further, the number may be one or more, more preferably 1 to 3 or more, still more preferably 1 to 2, and even more preferably 2. As the type of monodentate ligand, both a monodentate ligand coordinated with an anion and a monodentate ligand coordinated with an unshared electron pair are preferable, and a monodentate ligand coordinated with an anion is preferable for the reason described above. More preferable.

In the aspect of (3) above, the compound having three coordination sites is preferably a compound having a coordination site coordinated with an anion and a coordination atom coordinated with an unshared electron pair, and coordinated with an anion. A compound having two coordination sites and one coordination atom coordinated by an unshared electron pair is more preferred. Furthermore, it is particularly preferable that the two anions have different coordination sites. Further, the compound having two coordination sites is preferably a compound having a coordination atom coordinated with an unshared electron pair, and more preferably a compound having two coordination atoms coordinated with an unshared electron pair. Among them, a compound having three coordination sites is a compound having two coordination sites which coordinate with an anion and one coordination atom which coordinates with an unshared electron pair. A combination in which the compound having a moiety is a compound having two coordinating atoms that coordinate with an unshared electron pair is particularly preferable.
Moreover, in the aspect of (3), the copper complex may further have a monodentate ligand. The number of monodentate ligands may be 0, or 1 or more. 0 is more preferable.

In the aspect of (4) above, the compound having four coordination sites is preferably a compound having a coordination atom coordinated with an unshared electron pair, and has two or more coordination atoms coordinated with an unshared electron pair. The compound is more preferable, and the compound having four coordinating atoms coordinated by an unshared electron pair is further preferable.
Moreover, in the aspect of (4), the copper complex may further have a monodentate ligand. The number of monodentate ligands may be 0, 1 or more, or 2 or more. One is preferable. As the type of monodentate ligand, both a monodentate ligand coordinated with an anion and a monodentate ligand coordinated with an unshared electron pair are preferable.

In the aspect of (5) above, the compound having five coordination sites is preferably a compound having a coordination atom coordinated with an unshared electron pair, and has two or more coordination atoms coordinated with an unshared electron pair. The compound is more preferable, and the compound having 5 coordinating atoms coordinated by an unshared electron pair is further preferable.
Moreover, in the aspect of (5), the copper complex may further have a monodentate ligand. The number of monodentate ligands may be 0, or 1 or more. The number of monodentate ligands is preferably 0.

Examples of the polydentate ligand include compounds having two or more coordination sites among the compounds described in the specific examples of the above-mentioned ligand, and compounds shown below.

[Phosphate ester copper complex]
In the present invention, a phosphoric acid ester copper complex may be used as the copper compound. The phosphoric acid ester copper complex has copper as a central metal and a phosphoric acid ester compound as a ligand. The phosphoric acid ester compound forming the ligand of the phosphoric acid ester copper complex is preferably a compound represented by the following formula (L-100) or a salt thereof.
_{(HO) n -P (= O} ) - (OR 1) 3-n Formula (L-100)
In the formula, R ¹ represents an alkyl group having 1 to 18 carbon atoms, an aryl group having 6 to 18 carbon atoms, an aralkyl group having 1 to 18 carbon atoms, or an alkenyl group having 1 to 18 carbon atoms, or —OR ¹ is Represents a polyoxyalkyl group having 4 to 100 carbon atoms, a (meth)acryloyloxyalkyl group having 4 to 100 carbon atoms, or a (meth)acryloylpolyoxyalkyl group having 4 to 100 carbon atoms, and n is 1 or 2 Represents. When n is 1, R ² may be the same or different.

In the above formula, it is preferable that at least one of -OR ¹ represents a (meth)acryloyloxyalkyl group having 4 to 100 carbon atoms or a (meth)acryloylpolyoxyalkyl group having 4 to 100 carbon atoms. More preferably, it represents 4 to 100 (meth)acryloyloxyalkyl groups. The polyoxyalkyl group, the (meth)acryloyloxyalkyl group, and the (meth)acryloylpolyoxyalkyl group each preferably have 4 to 20 carbon atoms, and more preferably 4 to 10 carbon atoms.
The molecular weight of the phosphoric acid ester compound is preferably 300 to 1500, and more preferably 320 to 900.

Specific examples of the phosphoric acid ester compound include the above-mentioned ligands. Further, the descriptions in paragraphs 0022 to 0042 of JP-A-2014-41318 can be referred to, and the contents thereof are incorporated in the present specification.

[Sulfonic acid copper complex]
In the present invention, a sulfonic acid copper complex may be used as the copper compound. The sulfonic acid copper complex has copper as a central metal and a sulfonic acid compound as a ligand. The sulfonic acid compound forming the ligand of the sulfonic acid copper complex is preferably a compound represented by the following formula (L-200) or a salt thereof.
R ² -SO ₂ -OH Formula (L-200)

In the formula, R ² represents a monovalent organic group. Examples of the monovalent organic group include an alkyl group, an aryl group, and a heteroaryl group.
The alkyl group may be linear, branched or cyclic, but is preferably linear. 1-30 are preferable, as for carbon number of an alkyl group, 1-20 are more preferable, and 1-10 are more preferable.
The aryl group may be monocyclic or polycyclic, but monocyclic is preferable. 6-25 are preferable and, as for carbon number of an aryl group, 6-10 are more preferable.
The heteroaryl group may be monocyclic or polycyclic. The number of heteroatoms constituting the heteroaryl group is preferably 1 to 3. The hetero atom constituting the heteroaryl group is preferably a nitrogen atom, a sulfur atom or an oxygen atom. 6-18 are preferable and, as for carbon number of a heteroaryl group, 6-12 are more preferable.
The alkyl group, aryl group and heteroaryl group may be unsubstituted or may have a substituent. As the substituent, a polymerizable group (preferably a vinyl group, a (meth)acryloyloxy group), a group having an ethylenically unsaturated bond such as a (meth)acryloyl group), a halogen atom (fluorine atom, chlorine atom, bromine) Atom, iodine atom), alkyl group, carboxylic acid ester group (for example, —CO ₂ CH ₃ ), halogenated alkyl group (), alkoxy group, methacryloyloxy group, acryloyloxy group, ether group, alkylsulfonyl group, arylsulfonyl group , A sulfide group, an amide group, an acyl group, a hydroxy group, a carboxyl group, a sulfonic acid group, an acid group containing a phosphorus atom, an amino group, a carbamoyl group, a carbamoyloxy group and the like.
The halogenated alkyl group is preferably an alkyl group substituted with a fluorine atom. In particular, an alkyl group having two or more fluorine atoms and having 1 to 10 carbon atoms is preferable. The halogenated alkyl group may be linear, branched or cyclic, but is preferably linear or branched. 1-10 are more preferable, as for carbon number in a halogenated alkyl group, 1-5 are more preferable, and 1-3 are more preferable. The alkyl group substituted with a fluorine atom preferably has a terminal structure of (—CF ₃ ). The alkyl group substituted with a fluorine atom preferably has a fluorine atom substitution rate of 50 to 100%, more preferably 80 to 100%. Here, the substitution rate of a fluorine atom means a rate (%) in which a hydrogen atom is substituted with a fluorine atom in an alkyl group substituted with a fluorine atom. In particular, as the halogenated alkyl group, a perfluoroalkyl group is more preferable, a perfluoroalkyl group having 1 to 10 carbon atoms is further preferable, and a trifluoroethyl group and a trifluoromethyl group are further preferable.

The above-mentioned alkyl group, aryl group and heteroaryl group may have a divalent linking group. Examples of the divalent linking _{group, - (CH 2) m -} (m is 1 to 10 integer, preferably 1 to 6 integer, more preferably 1 to 4 integer), the cyclic 5 to 10 carbon atoms An alkylene group or a group consisting of these groups and at least one combination of —O—, —COO—, —S—, —NH— and —CO— is preferable.

In formula (L-200), R ² is preferably an organic group having a formula weight of 300 or less, more preferably an organic group having a formula weight of 50 to 200, and further preferably an organic group having a formula weight of 60 to 100. .
80-750 are preferable, as for the molecular weight of the sulfonic acid compound represented by Formula (L-200), 80-600 are more preferable, and 80-450 are still more preferable.

The sulfonic acid copper complex preferably has a structure represented by the following formula (L-201).
_{^{R 2A -SO 2 -O- * (L}} -201)
In the formula, R ^2A has the same meaning as R ² in formula (L-200), and the preferred range is also the same.

Specific examples of the sulfonic acid compound include the above-mentioned ligands. Further, the descriptions in paragraphs 0021 to 0039 of JP-A-2015-43063 can be referred to, and the contents thereof are incorporated in the present specification.

[Polymer type copper compound]
In the present invention, a copper-containing polymer having a copper complex site in the polymer side chain can be used as the copper compound. Since the copper-containing polymer has a copper complex site in the side chain of the polymer, it is considered that a cross-linked structure is formed between the side chains of the polymer starting from copper, and a film having excellent heat resistance can be obtained. The polymer type copper compound (copper-containing polymer) is a component different from the resin described later.

Examples of the copper complex site include those having copper and a site (coordination site) that coordinates with copper. Examples of the site that coordinates with copper include a site that coordinates with an anion or an unshared electron pair. Further, the copper complex site preferably has a site that is tetradentate or pentadentate with respect to copper. The details of the coordination site include those described in the above-mentioned low molecular weight copper compound, and the preferred range is also the same.

The copper-containing polymer is a polymer having a coordination site (also referred to as a polymer (B1)), a polymer obtained by a reaction with a copper component, or a polymer having a reactive site in a polymer side chain (hereinafter also referred to as a polymer (B2)). And a copper complex having a functional group capable of reacting with the reactive site of the polymer (B2). 2000 or more are preferable, as for the weight average molecular weight of a copper containing polymer, 2000-2 million are more preferable, and 6000-200,000 are still more preferable.

一般式１中、環Ａおよび環Ｂは、それぞれ独立に、芳香族環を表し、
Ｘ^AおよびＸ^Bはそれぞれ独立に置換基を表し、
Ｇ^AおよびＧ^Bはそれぞれ独立に置換基を表し、
ｋＡは０〜ｎＡの整数を表し、ｋＢは０〜ｎＢの整数を表し、
ｎＡは、Ａ環に置換可能な最大の整数を表し、ｎＢは、Ｂ環に置換可能な最大の整数を表し、
Ｘ^AとＧ^A、Ｘ^BとＧ^Bは互いに結合して環を形成しても良く、Ｇ^AおよびＧ^Bがそれぞれ複数存在する場合は、互いに結合して環を形成していても良い。 (Squarylium compound)
The squarylium compound is preferably a compound represented by the following general formula 1.
General formula 1

In the general formula 1, ring A and ring B each independently represent an aromatic ring,
X ^A and X ^B each independently represent a substituent,
G ^A and G ^B each independently represent a substituent,
kA represents an integer of 0 to nA, kB represents an integer of 0 to nB,
nA represents the maximum integer substitutable on the A ring, nB represents the maximum integer substitutable on the B ring,
X ^A and G ^A , and X ^B and G ^B may be bonded to each other to form a ring, and when a plurality of G ^A and G ^B are present, they may be bonded to each other to form a ring.

In the general formula 1, G ^A and G ^B each independently represent a substituent.
As the substituent, a halogen atom, a cyano group, a nitro group, an alkyl group, an alkenyl group, an alkynyl group, an aralkyl group, an aryl group, a heteroaryl group, -OR ^c1 , -COR ^c2 , -COOR ^c3 , -OCOR ^c4 ,- NR ^c5 R ^c6 , -NHCOR ^c7 , -CONR ^c8 R ^c9 , -NHCONR ^c10 R ^c11 , -NHCOOR ^c12 , -SR ^c13 , -SO ₂ R ^c14 , -SO ₂ OR ^c15 , -NHSO ₂ R ^c16 or -SO ₂ NR ^c17 R ^c18 can be mentioned. R ^{c1 to} R ^c18 each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group or a heteroaryl group. When R ^{c3 of} —COOR ^c3 is a hydrogen atom (that is, a carboxyl group), the hydrogen atom may be dissociated (that is, a carbonate group) or may be in a salt state. When R ^{c15 of} —SO ₂ OR ^c15 is a hydrogen atom (ie, a sulfo group), the hydrogen atom may be dissociated (ie, a sulfonate group) or may be in a salt state.

Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
1-20 are preferable, as for carbon number of an alkyl group, 1-12 are more preferable, and 1-8 are especially preferable. The alkyl group may be linear, branched or cyclic. The alkyl group may be unsubstituted or may have a substituent.
2-20 are preferable, as for carbon number of an alkenyl group, 2-12 are more preferable, and 2-8 are especially preferable. The alkenyl group may be linear, branched or cyclic.
2-20 are preferable, as for carbon number of an alkynyl group, 2-12 are more preferable, and 2-8 are especially preferable. The alkynyl group may be linear, branched or cyclic.
6-25 are preferable, as for carbon number of an aryl group, 6-15 are more preferable, and 6-10 are the most preferable.
The alkyl part of the aralkyl group is the same as the above alkyl group. The aryl part of the aralkyl group is the same as the above aryl group. 7-40 are preferable, as for carbon number of an aralkyl group, 7-30 are more preferable, and 7-25 are more preferable.
The heteroaryl group is preferably a monocycle or a condensed ring, more preferably a monocycle or a condensed ring having 2 to 8 condensations, and more preferably a monocycle or a condensed ring having 2 to 4 condensations. The number of hetero atoms constituting the ring of the heteroaryl group is preferably 1 to 3. The hetero atom forming the ring of the heteroaryl group is preferably a nitrogen atom, an oxygen atom or a sulfur atom. The heteroaryl group is preferably a 5-membered ring or a 6-membered ring. The heteroaryl group is preferably a 5-membered ring or a 6-membered ring. 3-30 are preferable, as for the number of carbon atoms which comprise the ring of a heteroaryl group, 3-18 are more preferable, and 3-12 are more preferable.
The alkyl group, alkenyl group, alkynyl group, aralkyl group, aryl group and heteroaryl group may have a substituent or may be unsubstituted. Examples of the substituent include the substituents described above for G ^A and G ^B , and examples thereof include a halogen atom, a hydroxyl group, a carboxyl group, a sulfo group, an alkoxy group, and an amino group.

In the general formula 1, X ^A and X ^B each independently represent a substituent. Substituent is preferably a group having an active hydrogen, -OH, -SH, -COOH, -SO 3 H, -NHR x1, -NR x1 R x2, -NHCOR x1, -CONR x1 R x2, -NHCONR x1 R ^x2 , -NHCOOR ^x1 , -NHSO ₂ R ^x1 , -B(OH) ₂ , -PO(OH) ₃ and -NHBR ^x1 R ^x2 are preferable, and -OH, -NHCOR ^x1 , -NHCONR ^x1 R ^x2 , -NHCOOR ^x1. , -NHSO ₂ R ^x1 and -NHBR ^x1 R ^x2 are more preferable, -NHCOR ^x1 , -NHCONR ^x1 R ^x2 , -NHCOOR ^x1 and -NHSO ₂ R ^x1 are more preferable, and -NHCOR ^x1 and -NHSO ₂ R ^x1 are particularly preferable. preferable.

R ^x1 and R ^x2 each independently represent a substituent. Examples of the substituent include an alkyl group and an aryl group, and an alkyl group is preferable. 1-20 are preferable, as for carbon number of an alkyl group, 1-15 are more preferable, 1-8 are more preferable, and 1-5 are especially preferable. The alkyl group may be linear, branched or cyclic, preferably linear or branched. 6-30 are preferable, as for carbon number of an aryl group, 6-20 are more preferable, and 6-12 are more preferable. The alkyl group and the aryl group may have a substituent or may be unsubstituted, but preferably have a substituent. Examples of the substituent include the substituents described below for R _Z. For example, a halogen atom, an aryl group, an alkoxy group and the like can be mentioned. From the viewpoint of heat resistance and light resistance, a halogen atom is preferable, and a fluorine atom is more preferable.
^Each of R ^x1 and R ^x2 is preferably a group having a fluorine atom, more preferably an alkyl group having a fluorine atom or an aryl group having a fluorine atom, further preferably an alkyl group having a fluorine atom, and having 1 to 5 carbon atoms. Fluoroalkyl groups are particularly preferred.

In the general formula 1, ring A and ring B each independently represent an aromatic ring. The aromatic ring may be a single ring or a condensed ring. The aromatic ring may be an aromatic hydrocarbon ring or an aromatic heterocycle. Specific examples of the aromatic ring include a benzene ring, a naphthalene ring, a pentalene ring, an indene ring, an azulene ring, a heptalene ring, an indecene ring, a perylene ring, a pentacene ring, an acetaphthalene ring, a phenanthrene ring, an anthracene ring, a naphthacene ring and a chrysene ring. , Triphenylene ring, fluorene ring, biphenyl ring, pyrrole ring, furan ring, thiophene ring, imidazole ring, oxazole ring, thiazole ring, pyridine ring, pyrazine ring, pyrimidine ring, pyridazine ring, indolizine ring, indole ring, benzofuran ring, Benzothiophene ring, isobenzofuran ring, quinolidine ring, quinoline ring, phthalazine ring, naphthyridine ring, quinoxaline ring, quinoxazoline ring, isoquinoline ring, carbazole ring, phenanthridine ring, acridine ring, phenanthroline ring, thianthrene ring, chromene ring, xanthene Examples thereof include a ring, a phenoxathiin ring, a phenothiazine ring, and a phenazine ring. A benzene ring or a naphthalene ring is preferable, and a naphthalene ring is more preferable.
The aromatic ring may be unsubstituted or may have a substituent. Examples of the substituent include the substituents described for G ^A and G ^B.

In Formula 1, X ^A and G ^A, X ^B and G ^B may combine with each other to form a ring, if G ^A and G ^B are present in plural is, G ^A or between,, G ^B They may be bonded to each other to form a ring. The ring is preferably a 5-membered ring or a 6-membered ring. The ring may be a monocycle or a polycycle. When X ^A and G ^A , X ^B and G ^B , and G ^A or G ^B are bonded to each other to form a ring, they may be directly bonded to each other to form a ring, and an alkylene group, —CO—, You may couple|bond together via the bivalent coupling group selected from the group which consists of -O-, -NH-, -BR-, and those combinations, and may form a ring. It is preferable that X ^A and G ^A , X ^B and G ^B , and G ^A or G ^B are bonded to each other via —BR— to form a ring. R represents a hydrogen atom or a substituent. Examples of the substituent include an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heteroaryl group. The details of the alkyl group, alkenyl group, alkynyl group, aryl group, and heteroaryl group are the same as those described in G ^A and G ^B.

In the general formula 1, kA represents an integer of 0 to nA, kB represents an integer of 0 to nB, nA represents the maximum integer substitutable in the A ring, and nB represents the maximum substitutable in the B ring. Represents the integer.
0-4 are preferable, kA and kB each independently, 0-2 are more preferable, and 0-1 are especially preferable.

式中、Ｒ¹およびＲ²は、それぞれ独立に、アルキル基、アルケニル基、アリール基、ヘテロアリールまたは、下式（Ｗ）で表される基を表し、
Ｒ³およびＲ⁴は、それぞれ独立に、水素原子、または、アルキル基を表し、
Ｘ¹およびＸ²は、それぞれ独立に、酸素原子、または、−Ｎ（Ｒ⁵）−を表し、
Ｒ⁵は、水素原子、アルキル基、アリール基またはヘテロアリール基を表し、
Ｙ¹〜Ｙ⁴は、それぞれ独立に、置換基を表し、Ｙ¹とＹ²、および、Ｙ³とＹ⁴は、互いに結合して環を形成していてもよく、
Ｙ¹〜Ｙ⁴は、それぞれ複数有する場合は、互いに結合して環を形成していてもよく、
ｐおよびｓは、それぞれ独立に０〜３の整数を表し、
ｑおよびｒは、それぞれ独立に０〜２の整数を表す；
−Ｓ¹−Ｌ¹−Ｔ¹ ・・・（Ｗ）
式（Ｗ）において、Ｓ¹は、単結合、アリーレン基またはヘテロアリーレン基を表し、
Ｌ¹は、アルキレン基、アルケニレン基、アルキニレン基、−Ｏ−、−Ｓ−、−ＮＲ^L1−、−ＣＯ−、−ＣＯＯ−、−ＯＣＯ−、−ＣＯＮＲ^L1−、−ＮＲ^L1ＣＯ−、−ＳＯ₂−、−ＯＲ^L2−、または、これらを組み合わせてなる基を表し、Ｒ^L1は、水素原子またはアルキル基を表し、Ｒ^L2は、アルキレン基を表し、
Ｔ¹は、アルキル基、シアノ基、ヒドロキシ基、ホルミル基、カルボキシ基、アミノ基、チオール基、スルホ基、ホスホリル基、ボリル基、ビニル基、エチニル基、アリール基、ヘテロアリール基、トリアルキルシリル基またはトリアルコキシシリル基を表す。 The compound represented by the general formula 1 is preferably a compound represented by the following general formula 1-1. This compound has excellent heat resistance.
General formula 1-1

In the formula, R ¹ and R ² each independently represent an alkyl group, an alkenyl group, an aryl group, a heteroaryl, or a group represented by the following formula (W):
R ³ and R ⁴ each independently represent a hydrogen atom or an alkyl group,
X ¹ and X ² each independently represent an oxygen atom or —N(R ⁵ )—,
R ⁵ represents a hydrogen atom, an alkyl group, an aryl group or a heteroaryl group,
Y ^{1 to} Y ⁴ each independently represent a substituent, and Y ¹ and Y ² and Y ³ and Y ⁴ may be bonded to each other to form a ring,
When each of Y ^{1 to} Y ⁴ has a plurality, Y ^{1 to} Y ⁴ may combine with each other to form a ring,
p and s each independently represent an integer of 0 to 3,
q and r each independently represent an integer of 0 to 2;
^{-S 1 -L 1 -T 1 ··· (} W)
In formula (W), S ¹ represents a single bond, an arylene group or a heteroarylene group,
L ¹ is an alkylene group, an alkenylene group, an alkynylene group, —O—, —S—, —NR ^L1 —, —CO—, —COO—, —OCO—, —CONR ^L1 —, —NR ^L1 CO—, — ^{_{SO 2 -, - oR L2 -}} , or represents a group formed by combining these, R ^L1 represents a hydrogen atom or an alkyl group, R ^L2 represents an alkylene group,
T ¹ is an alkyl group, cyano group, hydroxy group, formyl group, carboxy group, amino group, thiol group, sulfo group, phosphoryl group, boryl group, vinyl group, ethynyl group, aryl group, heteroaryl group, trialkylsilyl group. Represents a group or a trialkoxysilyl group.

In General Formula 1-1, R ¹ and R ² each independently represent an alkyl group, an alkenyl group, an aryl group, a heteroaryl, or a group represented by the formula (W), and at least R ¹ and R ² One of them preferably represents a group represented by the formula (W). In the general formula 1-1, R ¹ and R ² may be the same or different groups. More preferably, R ¹ and R ² are the same group. In addition, in this specification, an aryl group means an aromatic hydrocarbon group and a heteroaryl group means an aromatic heterocyclic group.

The alkyl group represented by R ¹ and R ² preferably has 1 to 40 carbon atoms. The lower limit is more preferably 3 or more, further preferably 5 or more, further preferably 10 or more, and particularly preferably 13 or more. The upper limit is more preferably 35 or less, further preferably 30 or less. The alkyl group may be linear, branched or cyclic, but linear or branched is preferable, and branched is particularly preferable. The number of branches of the branched alkyl group is, for example, preferably 2 to 10, and more preferably 2 to 8. When the number of branches is in the above range, the solvent solubility is good.
The alkenyl group represented by R ¹ and R ² preferably has 2 to 40 carbon atoms. The lower limit is, for example, more preferably 3 or more, further preferably 5 or more, further preferably 8 or more, particularly preferably 10 or more. The upper limit is more preferably 35 or less, further preferably 30 or less. The alkenyl group is preferably linear or branched, and particularly preferably branched. 2-10 are preferable and, as for the number of branches of a branched alkenyl group, 2-8 are more preferable. When the number of branches is in the above range, the solvent solubility is good.
R ¹ and the carbon number of the aryl group represented by R ² is preferably 6 to 30, more preferably 6 to 20, 6 to 12 is more preferable.
The heteroaryl group represented by R ¹ and R ² may be monocyclic or polycyclic. The number of hetero atoms constituting the ring of the heteroaryl group is preferably 1 to 3. The hetero atom forming the ring of the heteroaryl group is preferably a nitrogen atom, an oxygen atom or a sulfur atom. 3-30 are preferable, as for the number of carbon atoms which comprise the ring of a heteroaryl group, 3-18 are more preferable, and 3-12 are more preferable.

(Group represented by formula (W))
Next, the group represented by formula (W) will be described.
In formula (W), S ¹ represents a single bond, an arylene group or a heteroarylene group, and from the viewpoint of stability of the bond with the boron atom, an arylene group or a heteroarylene group is preferable, and an arylene group is more preferable.
The arylene group may be monocyclic or polycyclic. Monocycles are preferred. 6-20 are preferable and, as for carbon number of an arylene group, 6-12 are more preferable.
The heteroaryl group may be monocyclic or polycyclic. Monocycles are preferred. The number of hetero atoms constituting the ring of the heteroaryl group is preferably 1 to 3. The hetero atom forming the ring of the heteroaryl group is preferably a nitrogen atom, an oxygen atom, a sulfur atom or a selenium atom. 3-30 are preferable, as for the number of carbon atoms which comprise the ring of a heteroaryl group, 3-18 are more preferable, and 3-12 are more preferable.
Specific examples of the arylene group and the heteroarylene group represented by S ¹ include the structures shown below.

式中、波線部分は一般式１−１のホウ素原子との結合位置を表し、＊は、Ｌ¹との結合位置を表し、Ｒ’は置換基を表し、Ｒ^Nは、水素原子またはアルキル基を表し、ｍは０以上の整数を表す。
Ｒ’が表す置換基としては、上述した一般式１のＧ^AおよびＧ^Bで説明した置換基が挙げられる。
Ｒ^Nが表すアルキル基の炭素数は、１〜２０が好ましく、１〜１０がより好ましく、１〜４が更に好ましく、１〜２が特に好ましい。アルキル基は、直鎖、分岐のいずれでもよい。
ｍは０以上の整数を表す。ｍの上限は、各基の最大置換数である。ｍは、０が好ましい。

In the formula, the wavy line represents the bonding position with the boron atom of the general formula 1-1, * represents the bonding position with L ¹ , R′ represents a substituent, and R ^N represents a hydrogen atom or an alkyl group. And m represents an integer of 0 or more.
Examples of the substituent represented by R′ include the substituents described for G ^A and G ^B in the general formula 1 described above.
R ^N number of carbon atoms of the alkyl group represented by is preferably 1 to 20, more preferably 1 to 10, more preferably 1 to 4, 1 to 2 is particularly preferred. The alkyl group may be linear or branched.
m represents an integer of 0 or more. The upper limit of m is the maximum number of substitutions of each group. m is preferably 0.

In the formula (W), L ¹ is an alkylene group, an alkenylene group, an alkynylene group, —O—, —S—, —NR ^L1 —, —CO—, —COO—, —OCO—, —CONR ^L1 —, —. NR ^L1 CO—, —SO ₂ —, —OR ^L2 — or a group formed by combining these, R ^L1 represents a hydrogen atom or an alkyl group, and R ^L2 represents an alkylene group.
In formula (W), L ¹ is an alkylene group, an alkenylene group, an alkynylene group, —O—, —S—, —NR ^L1 —, —COO—, —OCO—, —CONR ^L1 —, —SO ₂ —, —OR ^L2 — or a group formed by combining these is preferable, and from the viewpoint of flexibility and solvent solubility, an alkylene group, an alkenylene group, —O—, —OR ^L2 —, or a group formed by combining these is more preferable. , An alkylene group, an alkenylene group, —O— or —OR ^L2 — is more preferable, and an alkylene group, —O— or —OR ^L2 — is particularly preferable.

The alkylene group represented by L ¹ preferably has 1 to 40 carbon atoms. The lower limit is more preferably 3 or more, further preferably 5 or more, further preferably 10 or more, and particularly preferably 13 or more. The upper limit is more preferably 35 or less, further preferably 30 or less. The alkylene group may be linear, branched or cyclic, but linear or branched is preferable, and branched is particularly preferable. The number of branches is, for example, preferably 2 to 10, and more preferably 2 to 8. When the number of branches is in the above range, the solvent solubility is good.
The alkenylene group and alkynylene group represented by L ¹ preferably have 2 to 40 carbon atoms. The lower limit is, for example, more preferably 3 or more, further preferably 5 or more, further preferably 8 or more, particularly preferably 10 or more. The upper limit is more preferably 35 or less, further preferably 30 or less. The alkenylene group and alkynylene group may be linear or branched, preferably linear or branched, and particularly preferably branched. 2-10 are preferable and, as for the number of branches, 2-8 are more preferable. When the number of branches is in the above range, the solvent solubility is good.

R ^L1 represents a hydrogen atom or an alkyl group, and preferably a hydrogen atom. 1-20 are preferable, as for carbon number of an alkyl group, 1-10 are more preferable, 1-4 are more preferable, and 1-2 are especially preferable. The alkyl group may be linear or branched.

R ^L2 represents an alkylene group. The alkylene group represented by R ^L2 has the same meaning as the alkylene group described for L ¹ , and the preferred range is also the same.

In the formula (W), T ¹ is an alkyl group, a cyano group, a hydroxy group, a formyl group, a carboxy group, an amino group, a thiol group, a sulfo group, a phosphoryl group, a boryl group, a vinyl group, an ethynyl group, an aryl group, or a hetero group. It represents an aryl group, a trialkylsilyl group or a trialkoxysilyl group.
The alkyl group, the alkyl group of the trialkylsilyl group and the alkyl group of the trialkoxysilyl group preferably have 1 to 40 carbon atoms. The lower limit is more preferably 3 or more, further preferably 5 or more, further preferably 10 or more, and particularly preferably 13 or more. The upper limit is more preferably 35 or less, further preferably 30 or less. The alkyl group may be linear, branched or cyclic, but linear or branched is preferred.
The aryl group and the heteroaryl group have the same meanings as the aryl group and the heteroaryl group described for R ¹ and R ² , and their preferable ranges are also the same.

In the formula (W), when S ¹ is a single bond, L ¹ is an alkylene group, and T ¹ is an alkyl group, the total number of carbon atoms contained in L ¹ and T ¹ is preferably 13 or more. From the viewpoint of solvent solubility, 21 or more is preferable. The upper limit is, for example, preferably 40 or less, more preferably 35 or less.
When S ¹ is an arylene group, the total number of carbon atoms contained in L ¹ and T ¹ is preferably 5 or more, more preferably 9 or more and more preferably 10 or more from the viewpoint of solvent solubility. The upper limit is, for example, preferably 40 or less, more preferably 35 or less.

In a preferred embodiment of formula (W), S ¹ is an arylene group or a heteroarylene group, L ¹ is an alkylene group, an alkenylene group, an alkynylene group, —O—, —S—, —NR ^L1 —, —COO—. ^{, -OCO -, - CONR L1 -} , - SO 2 -, - oR L2 - or a group formed by combining these, T ¹ is as combinations is an alkyl group or a trialkylsilyl group. S ¹ is more preferably an arylene group. L ¹ is alkylene group, alkenylene group, -O -, - OR ^L2 - or group is more preferably made of a combination of these, an alkylene group, an alkenylene group, -O- or -OR ^L2 - more preferably, an alkylene group , -O-, or -OR ^L2- is particularly preferable. More preferably, T ¹ is an alkyl group.

In formula (W), -L ¹ -T ¹ moiety preferably comprises a branched alkyl structure. Specifically, -L ¹ -T ¹ moiety, particularly preferably an alkyl group or a branched alkoxy group branch. -L number of branches ¹ -T ¹ part, preferably from 2 to 10, 2 to 8 is more preferred. -L Number ¹ -T ¹ part of carbon is preferably 5 or more, preferably at least 9, and more preferably 10 or more. The upper limit is, for example, preferably 40 or less, more preferably 35 or less.

In formula (W), -L ¹ -T ¹ moiety preferably comprises an asymmetric carbon. According to this aspect, the compound represented by Formula 1-1 can include a plurality of optical isomers, and as a result, the solvent solubility of the compound can be further improved. The number of asymmetric carbon atoms is preferably 1 or more. The upper limit of the asymmetric carbon is not particularly limited, but is preferably 4 or less.

In Formula 1-1, R ³ and R ⁴ each independently represent a hydrogen atom or an alkyl group. R ³ and R ⁴ may be the same or different groups. More preferably, R ³ and R ⁴ are the same group.
R ³ and R ⁴ carbon atoms in the alkyl group represented by is preferably 1 to 20, more preferably 1 to 10, more preferably 1 to 4, 1 to 2 is particularly preferred. The alkyl group may be linear or branched. Specific examples include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group and the like.
R ³ and R ⁴ are preferably each independently a hydrogen atom, a methyl group or an ethyl group, more preferably a hydrogen atom or a methyl group, and particularly preferably a hydrogen atom.

In Formula 1-1, X ¹ and X ² each independently represent an oxygen atom (—O—) or —N(R ⁵ )—. X ¹ and X ² may be the same or different, but are preferably the same.
R ⁵ represents a hydrogen atom, an alkyl group, an aryl group or a heteroaryl group.
R ⁵ is preferably a hydrogen atom, an alkyl group or an aryl group. The alkyl group, aryl group and heteroaryl group represented by R ⁵ may be unsubstituted or may have a substituent. Examples of the substituent include the substituents described for G ^A and G ^B in the above general formula 1.
1-20 are preferable, as for carbon number of an alkyl group, 1-10 are more preferable, 1-4 are more preferable, and 1-2 are especially preferable. The alkyl group may be linear or branched.
6-20 are preferable and, as for carbon number of an aryl group, 6-12 are more preferable.
The heteroaryl group may be monocyclic or polycyclic. The number of hetero atoms constituting the ring of the heteroaryl group is preferably 1 to 3. The hetero atom forming the ring of the heteroaryl group is preferably a nitrogen atom, an oxygen atom or a sulfur atom. 3-30 are preferable, as for the number of carbon atoms which comprise the ring of a heteroaryl group, 3-18 are more preferable, and 3-12 are more preferable.

式中、Ｒ^5aはアルキル基を表し、Ｒ⁶〜Ｒ⁸は、それぞれ独立に、置換基を表し、ａは０〜５の整数を表し、ｂおよびｃはそれぞれ０〜７の整数を表し、＊は連結手を表す。
Ｒ⁶〜Ｒ⁸が表す、置換基としては、上述した一般式１のＧ^AおよびＧ^Bで説明した置換基が挙げられる。 X ¹ and X ² are preferably each independently represented by an oxygen atom or any of the following.

In the formula, R ^5a represents an alkyl group, R ^{6 to} R ⁸ each independently represent a substituent, a represents an integer of 0 to 5, b and c each represent an integer of 0 to 7, * Represents a connecting hand.
Examples of the substituent represented by R ^{6 to} R ⁸ include the substituents described for G ^A and G ^B in the general formula 1 described above.

In Formula 1-1, Y ^{1 to} Y ⁴ each independently represent a substituent.
Examples of the substituent include the substituents described for G ^A and G ^B in the above general formula 1.

In the general formula 1-1, Y ¹ and Y ² , and Y ³ and Y ⁴ may be bonded to each other to form a ring. For example, Y ¹ and Y ² may be bonded to each other to form a naphthalene ring which is directly connected to Y ¹ and Y ² together with, for example, three rings such as an acenaphthene ring and an acenaphthylene ring.
When each of Y ^{1 to} Y ⁴ has a plurality, Y ^{1 to} Y ⁴ may be bonded to each other to form a ring structure. For example, when Y ¹ has a plurality, even if Y ¹ is bonded to each other and is combined with the naphthalene ring directly connected to Y ¹ and Y ² to form, for example, three rings such as an anthracene ring and a phenanthrene ring. Good. When Y ^{1 s} are bonded to each other to form a ring structure, it is not always necessary to have a plurality of substituents Y ^{2 to} Y ⁴ other than Y ¹ . Further, Y ^{2 to} Y ⁴ may not be present. The same applies when Y ^{2 s} , Y ^{3 s,} and Y ^{4 s} are bonded to each other to form a ring structure.
p and s each independently represent an integer of 0 to 3, preferably 0 to 1, and particularly preferably 0.
q and r each independently represent an integer of 0 to 2, preferably 0 to 1, and particularly preferably 0.

In the general formula (1), cations are delocalized and exist as follows.

Examples of the squarylium compound represented by the general formula 1 include the compounds shown below. In addition, compounds described in paragraph Nos. 0044 to 0049 of JP2011-208101A are mentioned, and the contents thereof are incorporated in the present specification.

一般式２中、Ｒ^1aおよびＲ^1bは、それぞれ独立に、アルキル基、アリール基またはヘテロアリール基を表し、
Ｒ²〜Ｒ⁵は、それぞれ独立に、水素原子または置換基を表し、Ｒ²とＲ³、Ｒ⁴とＲ⁵は、それぞれ結合して環を形成していてもよく、
Ｒ⁶およびＲ⁷は、それぞれ独立に、水素原子、アルキル基、アリール基、ヘテロアリール基、−ＢＲ^AＲ^B、または金属原子を表し、Ｒ^AおよびＲ^Bは、各々独立に、水素原子または置換基を表し、
Ｒ⁶は、Ｒ^1aまたはＲ³と、共有結合もしくは配位結合していてもよく、Ｒ⁷は、Ｒ^1bまたはＲ⁵と、共有結合もしくは配位結合していてもよい。 (Pyrrolopyrrole compound)
The pyrrolopyrrole compound is preferably a compound represented by the following general formula 2.
General formula 2

In the general formula 2, R ^1a and R ^1b each independently represent an alkyl group, an aryl group or a heteroaryl group,
R ^{2 to} R ⁵ each independently represent a hydrogen atom or a substituent, and R ² and R ³ , R ⁴ and R ⁵ may be bonded to each other to form a ring,
R ⁶ and R ⁷ each independently represent a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, —BR ^A R ^B , or a metal atom, and R ^A and R ^B are each independently a hydrogen atom or Represents a substituent,
R ⁶ may be covalently bonded or coordinated to R ^1a or R ^3, and R ⁷ may be covalently or coordinately bonded to R ^1b or R ⁵ .

In formula 2, R ^1a and R ^1b each independently represent an alkyl group, an aryl group or a heteroaryl group, preferably an aryl group or a heteroaryl group, and more preferably an aryl group.
1-40 are preferable, as for carbon number of the alkyl group which R ^{< 1a>} and R ^<1b> represent, 1-30 are more preferable, and 1-25 are especially preferable. The alkyl group may be linear, branched or cyclic, but linear or branched is preferable, and branched is particularly preferable.
The aryl group represented by R ^1a and R ^1b preferably has 6 to 30 carbon atoms, more preferably has 6 to 20 carbon atoms, and further preferably has 6 to 12 carbon atoms. The aryl group is preferably phenyl.
The heteroaryl group represented by R ^1a and R ^1b is preferably a monocycle or a condensed ring, more preferably a monocycle or a condensed ring having a condensed number of 2 to 8, and further preferably a monocycle or a condensed ring having a condensed number of 2 to 4. .. The number of hetero atoms constituting the ring of the heteroaryl group is preferably 1 to 3. The hetero atom forming the ring of the heteroaryl group is preferably a nitrogen atom, an oxygen atom or a sulfur atom. 3-30 are preferable, as for the number of carbon atoms which comprise a heteroaryl group, 3-18 are more preferable, 3-12 are more preferable, and 3-10 are especially preferable. The heteroaryl group is preferably a 5-membered ring or a 6-membered ring.

The above-mentioned aryl group and heteroaryl group may have a substituent or may be unsubstituted. It preferably has a substituent from the viewpoint of improving the solubility in a solvent.
As the substituent, a hydrocarbon group which may contain an oxygen atom, an amino group, an acylamino group, a sulfonylamino group, a sulfamoyl group, a carbamoyl group, an alkylthio group, an arylthio group, an alkylsulfonyl group, an arylsulfonyl group, an alkylsulfinyl group, an aryl group Sulfinyl group, ureido group, phosphoramide group, mercapto group, sulfo group, carboxyl group, nitro group, hydroxamic acid group, sulfino group, hydrazino group, imino group, silyl group, hydroxy group, halogen atom, cyano group and the like. Be done.

Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
Examples of the hydrocarbon group include an alkyl group, an alkenyl group and an aryl group.
The alkyl group preferably has 1 to 40 carbon atoms. The lower limit is more preferably 3 or more, further preferably 5 or more, further preferably 8 or more, and particularly preferably 10 or more. The upper limit is more preferably 35 or less, further preferably 30 or less. The alkyl group may be linear, branched or cyclic, but linear or branched is preferable, and branched is particularly preferable. The branched alkyl group preferably has 3 to 40 carbon atoms. The lower limit is, for example, more preferably 5 or more, further preferably 8 or more, and further preferably 10 or more. The upper limit is more preferably 35 or less, further preferably 30 or less. The number of branches of the branched alkyl group is, for example, preferably 2 to 10, and more preferably 2 to 8. When the number of branches is in the above range, the solvent solubility is good.
The alkenyl group preferably has 2 to 40 carbon atoms. The lower limit is, for example, more preferably 3 or more, further preferably 5 or more, further preferably 8 or more, particularly preferably 10 or more. The upper limit is more preferably 35 or less, further preferably 30 or less. The alkenyl group may be linear, branched or cyclic, but is preferably linear or branched, and particularly preferably branched. The branched alkenyl group preferably has 3 to 40 carbon atoms. The lower limit is, for example, more preferably 5 or more, further preferably 8 or more, and further preferably 10 or more. The upper limit is more preferably 35 or less, further preferably 30 or less. 2-10 are preferable and, as for the number of branches of a branched alkenyl group, 2-8 are more preferable. When the number of branches is in the above range, the solvent solubility is good.
6-30 are preferable, as for carbon number of an aryl group, 6-20 are more preferable, and 6-12 are more preferable.
Examples of the hydrocarbon group containing an oxygen atom include a group represented by ^-LRx1 .
L represents -O-, -CO-, -COO-, -OCO-, -( ^ORx2 ) _m- or -( ^Rx2O ) _m- . R ^x1 represents an alkyl group, an alkenyl group or an aryl group. R ^x2 represents an alkylene group or an arylene group. m represents an integer of 2 or more, and m R ^{x2 s} may be the same or different.
L is preferably -O-, -( ^ORx2 ) _m- or -( ^Rx2O ) _m- , more preferably -O-.
The alkyl group, alkenyl group and aryl group represented by R ^x1 have the same ^{meanings as} described above, and the preferred ranges are also the same. R ^x1 is preferably an alkyl group or an alkenyl group, more preferably an alkyl group.
1-20 are preferable, as for carbon number of the alkylene group which ^Rx2 represents, 1-10 are more preferable, and 1-5 are more preferable. The alkylene group may be linear, branched or cyclic, but linear or branched is preferred. 6-20 are preferable and, as for carbon number of the arylene group which ^Rx2 represents, 6-12 are more preferable. R ^x2 is preferably an alkylene group.
m represents an integer of 2 or more, preferably 2 to 20, and more preferably 2 to 10.

The substituent is preferably a group having a branched alkyl structure. According to this aspect, the solvent solubility is further improved. Further, the substituent is preferably a hydrocarbon group which may contain an oxygen atom, and more preferably a hydrocarbon group containing an oxygen atom. The hydrocarbon group containing an oxygen atom is preferably a group represented by —O—R ^x1 . R ^x1 is preferably an alkyl group or an alkenyl group, more preferably an alkyl group, and particularly preferably a branched alkyl group. That is, the substituent is more preferably an alkoxy group, and particularly preferably a branched alkoxy group. When the substituent is an alkoxy group, an infrared absorber having excellent heat resistance and light resistance can be obtained. And since it is a branched alkoxy group, solvent solubility is good.
The alkoxy group preferably has 1 to 40 carbon atoms. The lower limit is, for example, more preferably 3 or more, further preferably 5 or more, further preferably 8 or more, particularly preferably 10 or more. The upper limit is more preferably 35 or less, further preferably 30 or less. The alkoxy group may be linear, branched or cyclic, but linear or branched is preferable, and branched is particularly preferable. The branched alkoxy group preferably has 3 to 40 carbon atoms. The lower limit is, for example, more preferably 5 or more, further preferably 8 or more, and further preferably 10 or more. The upper limit is more preferably 35 or less, further preferably 30 or less. 2-10 are preferable and, as for the branch number of the branched alkoxy group, 2-8 are more preferable.

R ^{2 to} R ⁵ each independently represent a hydrogen atom or a substituent. As the substituent, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group, an amino group (including an alkylamino group, an arylamino group and a heterocyclic amino group), an alkoxy group, an aryloxy group, a heteroaryloxy Group, acyl group, alkylcarbonyl group, arylcarbonyl group, alkoxycarbonyl group, aryloxycarbonyl group, acyloxy group, acylamino group, alkoxycarbonylamino group, aryloxycarbonylamino group, sulfonylamino group, sulfamoyl group, carbamoyl group, alkylthio Group, arylthio group, heteroarylthio group, alkylsulfonyl group, arylsulfonyl group, alkylsulfinyl group, arylsulfinyl group, ureido group, phosphoramide group, hydroxy group, mercapto group, halogen atom, cyano group, sulfo group, carboxyl Group, nitro group, hydroxamic acid group, sulfino group, hydrazino group, imino group, silyl group and the like.

One of R ² and R ³ and one of R ⁴ and R ⁵ are preferably electron withdrawing groups.
The substituent having a positive Hammett's σp value (sigma para value) acts as an electron-withdrawing group.
In the present invention, a substituent having a Hammett's σp value of 0.2 or more can be exemplified as the electron-withdrawing group. The σp value is preferably 0.25 or more, more preferably 0.3 or more, and particularly preferably 0.35 or more. The upper limit is not particularly limited, but is preferably 0.80.
Specific examples of the electron-withdrawing group include a cyano group (0.66), a carboxyl group (-COOH:0.45), an alkoxycarbonyl group (-COOMe:0.45), an aryloxycarbonyl group (-COOPh:0). .44), a carbamoyl group (-CONH _2: 0.36), an alkylcarbonyl group (-COMe: 0.50), an arylcarbonyl group (-COPh: 0.43), an alkylsulfonyl group (-SO ₂ Me: 0 .72), an arylsulfonyl group (—SO ₂ Ph:0.68), and the like. Particularly preferred is a cyano group. Here, Me represents a methyl group and Ph represents a phenyl group.
Regarding the Hammett's σp value, for example, paragraphs 0024 to 0025 of JP 2009-263614 A can be referred to, and the contents thereof are incorporated in the present specification.

One of R ² and R ³ and one of R ⁴ and R ⁵ are preferably a heteroaryl group.
The heteroaryl group is preferably a monocycle or a condensed ring, more preferably a monocycle or a condensed ring having 2 to 8 condensations, and more preferably a monocycle or a condensed ring having 2 to 4 condensations. The number of heteroatoms constituting the heteroaryl group is preferably 1 to 3. The hetero atom constituting the heteroaryl group is preferably a nitrogen atom, an oxygen atom or a sulfur atom. The heteroaryl group preferably has one or more nitrogen atoms. 3-30 are preferable, as for the number of carbon atoms which comprise a heteroaryl group, 3-18 are more preferable, 3-12 are more preferable, and 3-10 are especially preferable. The heteroaryl group is preferably a 5-membered ring or a 6-membered ring. Specific examples of the heteroaryl group include, for example, imidazolyl group, pyridyl group, pyrazyl group, pyrimidyl group, pyridazyl group, triazyl group, quinolyl group, quinoxalyl group, isoquinolyl group, indolenyl group, furyl group, thienyl group, benzoxazolyl group. Group, benzimidazolyl group, benzthiazolyl group, naphthothiazolyl group, benzoxazoli group, m-carbazolyl group, azepinyl group, and benzo-condensed group or naphtho-condensed group of these groups.
The heteroaryl group may have a substituent or may be unsubstituted. Examples of the substituent include the substituents represented by R ^{2 to} R ⁵ described above. A halogen atom, an alkyl group, an alkoxy group or an aryl group is preferable. As the halogen atom, a fluorine atom, a chlorine atom, a bromine atom and an iodine atom are preferable, and a chlorine atom is particularly preferable. 1-40 are preferable, as for carbon number of an alkyl group and an alkoxy group, 1-30 are more preferable, and 1-25 are especially preferable. The alkyl group and the alkoxy group are preferably linear or branched, and particularly preferably linear. 6-30 are preferable, as for carbon number of an aryl group, 6-20 are more preferable, and 6-12 are more preferable.

In the general formula 2, R ² and R ³ , and R ⁴ and R ⁵ may combine with each other to form a ring. When R ² and R ³ , and R ⁴ and R ⁵ are bonded to each other to form a ring, it is preferable to form a 5- to 7-membered ring (preferably a 5- or 6-membered ring). The ring formed is preferably a ring used as an acidic nucleus in a merocyanine dye. As a specific example, for example, the structure described in paragraph No. 0026 of JP 2010-222557 A can be cited, and the contents thereof are incorporated in the present specification.
The ring formed by combining R ² and R ³ , and R ⁴ and R ⁵ with each other is preferably a 1,3-dicarbonyl nucleus, a pyrazolinone nucleus, a 2,4,6-triketohexahydropyrimidine nucleus (also a thioketone body). ), 2-thio-2,4-thiazolidinedione nucleus, 2-thio-2,4-oxazolidinedione nucleus, 2-thio-2,5-thiazolidinedione nucleus, 2,4-thiazolidinedione nucleus, 2,4 An imidazolidinedione nucleus, a 2-thio-2,4-imidazolidinedione nucleus, a 2-imidazolin-5-one nucleus, a 3,5-pyrazolidinedione nucleus, a benzothiophen-3-one nucleus, or an indanone nucleus. And more preferably 1,3-dicarbonyl nucleus, 2,4,6-triketohexahydropyrimidine nucleus (including thioketone body), 3,5-pyrazolidinedione nucleus, benzothiophen-3-one nucleus, Or the Indanone nucleus.

R ⁶ and R ⁷ each independently represent a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, a -BR ^A R ^B, or a metal atom, it is more preferable -BR ^A R ^B.
1-40 are preferable, as for carbon number of an alkyl group, 1-30 are more preferable, and 1-25 are especially preferable. The alkyl group may be linear, branched or cyclic, but is preferably linear or branched, and particularly preferably linear. The alkyl group may be unsubstituted or may have a substituent. Examples of the substituent include the substituents represented by R ^{2 to} R ⁵ described above.
6-30 are preferable, as for carbon number of an aryl group, 6-20 are more preferable, and 6-12 are more preferable. The aryl group may be unsubstituted or may have a substituent. Examples of the substituent include the substituents represented by R ^{2 to} R ⁵ described above.
The heteroaryl group is preferably a monocycle or a condensed ring, more preferably a monocycle. The number of hetero atoms constituting the ring of the heteroaryl group is preferably 1 to 3. The hetero atom forming the ring of the heteroaryl group is preferably a nitrogen atom, an oxygen atom or a sulfur atom. 3-30 are preferable, as for the number of carbon atoms which comprise a heteroaryl group, 3-18 are more preferable, 3-12 are more preferable, and 3-5 are especially preferable. The heteroaryl group is preferably a 5-membered ring or a 6-membered ring. The heteroaryl group may be unsubstituted or may have a substituent. Examples of the substituent include the substituents represented by R ^{2 to} R ⁵ described above.
The metal atom is preferably magnesium, aluminum, calcium, barium, zinc, tin, aluminum, zinc, tin, vanadium, iron, cobalt, nickel, copper, palladium, iridium or platinum, and aluminum, zinc, vanadium, iron or copper. , Palladium, iridium and platinum are particularly preferred.

In the group represented by —BR ^A R ^B , R ^A and R ^B each independently represent a substituent. Examples of the substituent represented by R ^A and R ^B include the substituents represented by R ^{2 to} R ⁵ described above. A halogen atom, an alkyl group, an alkoxy group, an aryl group and a heteroaryl group are preferable. As the halogen atom, a fluorine atom, a chlorine atom, a bromine atom and an iodine atom are preferable, and a fluorine atom is particularly preferable. 1-40 are preferable, as for carbon number of an alkyl group and an alkoxy group, 1-30 are more preferable, and 1-25 are especially preferable. The alkyl group and the alkoxy group are preferably linear or branched, and particularly preferably linear. The alkyl group and the alkoxy group may have a substituent or may be unsubstituted. Examples of the substituent include an aryl group, a heteroaryl group, a halogen atom and the like. 6-20 are preferable and, as for carbon number of an aryl group, 6-12 are more preferable. The aryl group may have a substituent or may be unsubstituted. Examples of the substituent include an alkyl group, an alkoxy group, a halogen atom and the like. The heteroaryl group may be monocyclic or polycyclic. The number of heteroatoms constituting the heteroaryl group is preferably 1 to 3. The hetero atom constituting the heteroaryl group is preferably a nitrogen atom, an oxygen atom or a sulfur atom. 3-30 are preferable, as for the number of carbon atoms which comprise a heteroaryl group, 3-18 are more preferable, 3-12 are more preferable, and 3-5 are especially preferable. The heteroaryl group is preferably a 5-membered ring or a 6-membered ring. The heteroaryl group may have a substituent or may be unsubstituted. Examples of the substituent include an alkyl group, an alkoxy group, a halogen atom and the like.

In the general formula 2, R ⁶ may form a covalent bond or a coordinate bond with R ^1a or R ³ . R ⁷ may be covalently or coordinately bonded to R ^1b or R ⁵ .

Examples of the pyrrolopyrrole compound represented by the general formula 2 include the compounds shown below. Further, compounds D-1 to D-162 described in paragraph Nos. 0049 to 0062 of JP 2010-222557 A are mentioned, and the contents thereof are incorporated in the present specification. In the following formula, Ph represents a phenyl group.

一般式３中、Ｚ¹およびＺ²は、それぞれ独立に、縮環してもよい５員または６員の含窒素複素環を形成する非金属原子群であり、
Ｒ¹⁰¹およびＲ¹⁰²は、それぞれ独立に、アルキル基、アルケニル基、アルキニル基、アラルキル基またはアリール基を表し、
Ｌ¹は、奇数個のメチン基を有するメチン鎖を表し、
ａおよびｂは、それぞれ独立に、０または１であり、
ａが０の場合は、炭素原子と窒素原子とが二重結合で結合し、ｂが０の場合は、炭素原子と窒素原子とが単結合で結合し、
式中のＣｙで表される部位がカチオン部である場合、Ｘ¹はアニオンを表し、ｃは電荷のバランスを取るために必要な数を表し、式中のＣｙで表される部位がアニオン部である場合、Ｘ¹はカチオンを表し、ｃは電荷のバランスを取るために必要な数を表し、式中のＣｙで表される部位の電荷が分子内で中和されている場合、ｃは０である。 (Cyanine compound)
The cyanine compound is preferably a compound represented by the following general formula 3.
General formula 3

In the general formula 3, Z ¹ and Z ² are each independently a nonmetallic atom group forming a 5-membered or 6-membered nitrogen-containing heterocycle which may be condensed.
R ¹⁰¹ and R ¹⁰² each independently represent an alkyl group, an alkenyl group, an alkynyl group, an aralkyl group or an aryl group,
L ¹ represents a methine chain having an odd number of methine groups,
a and b are each independently 0 or 1,
When a is 0, a carbon atom and a nitrogen atom are bonded by a double bond, and when b is 0, a carbon atom and a nitrogen atom are bonded by a single bond,
When the site represented by Cy in the formula is a cation part, X ¹ represents an anion, c represents a number necessary for balancing charges, and the site represented by Cy in the formula is an anion part. X ¹ represents a cation, c represents the number necessary for balancing the charges, and when the charge at the site represented by Cy in the formula is neutralized in the molecule, c represents It is 0.

In the general formula 3, Z ¹ and Z ² each independently represent a nonmetallic atom group forming a 5-membered or 6-membered nitrogen-containing heterocycle which may be condensed. Another heterocycle, an aromatic ring or an aliphatic ring may be condensed with the nitrogen-containing heterocycle. The nitrogen-containing heterocycle is preferably a 5-membered ring. A structure in which a benzene ring or a naphthalene ring is condensed with a 5-membered nitrogen-containing heterocycle is more preferable. Specific examples of the nitrogen-containing heterocyclic ring, oxazole ring, isoxazole ring, benzoxazole ring, naphthoxazole ring, oxazolocarbazole ring, oxazolodibenzofuran ring, thiazole ring, benzothiazole ring, naphthothiazole ring, indolenine ring, Benzindolenin ring, imidazole ring, benzimidazole ring, naphthimidazole ring, quinoline ring, pyridine ring, pyrrolopyridine ring, furopyrrole ring, indolizine ring, imidazoquinoxaline ring, quinoxaline ring, etc., quinoline ring, indolenine ring , Benzoindolenine ring, benzoxazole ring, benzothiazole ring and benzimidazole ring are preferable, and indolenine ring, benzothiazole ring and benzimidazole ring are particularly preferable. The nitrogen-containing heterocycle and the ring condensed therewith may have a substituent. Examples of the substituent include the substituents described for G ^A and G ^B in the general formula 1.

In Formula 3, R ¹⁰¹ and R ¹⁰² each independently represent an alkyl group, an alkenyl group, an alkynyl group, an aralkyl group or an aryl group.
1-20 are preferable, as for carbon number of an alkyl group, 1-12 are more preferable, and 1-8 are especially preferable. The alkyl group may be linear, branched or cyclic.
2-20 are preferable, as for carbon number of an alkenyl group, 2-12 are more preferable, and 2-8 are especially preferable. The alkenyl group may be linear, branched or cyclic.
2-20 are preferable, as for carbon number of an alkynyl group, 2-12 are more preferable, and 2-8 are especially preferable. The alkynyl group may be linear, branched or cyclic.
6-25 are preferable, as for carbon number of an aryl group, 6-15 are more preferable, and 6-10 are the most preferable. The aryl group may be unsubstituted or may have a substituent.
The alkyl part of the aralkyl group is the same as the above alkyl group. The aryl part of the aralkyl group is the same as the above aryl group. 7-40 are preferable, as for carbon number of an aralkyl group, 7-30 are more preferable, and 7-25 are more preferable.
The alkyl group, alkenyl group, alkynyl group, aralkyl group and aryl group may have a substituent or may be unsubstituted. Examples of the substituent include a halogen atom, a hydroxyl group, a carboxyl group, a sulfo group, an alkoxy group, an amino group and the like. A carboxyl group and a sulfo group are preferable, and a sulfo group is particularly preferable. In the carboxyl group and the sulfo group, the hydrogen atom may be dissociated or may be in a salt state.

式（ａ）中、＊は、メチン鎖との連結部を表し、Ａ¹は、酸素原子または硫黄原子を表す。 In Formula 3, L ¹ represents a methine chain having an odd number of methine groups. L ¹ is preferably a methine chain having 3, 5 or 7 methine groups.
The methine group may have a substituent. The methine group having a substituent is preferably a central (meso-position) methine group. Specific examples of the substituent include a substituent which the nitrogen-containing heterocycle represented by Z ¹ and Z ² may have, and a group represented by the following formula (a). In addition, two substituents of the methine chain may combine to form a 5- or 6-membered ring.

In formula (a), * represents a linking part with the methine chain, and A ¹ represents an oxygen atom or a sulfur atom.

In the general formula 3, a and b are each independently 0 or 1. When a is 0, the carbon atom and the nitrogen atom are bonded by a double bond, and when b is 0, the carbon atom and the nitrogen atom are bonded by a single bond. Both a and b are preferably 0. When a and b are both 0, general formula 3 is expressed as follows.

In the general formula 3, when the site represented by Cy in the formula is a cation part, X ¹ represents an anion, and c represents a number necessary for balancing charges. Examples of the anion include halide ion (Cl ⁻ , Br ⁻ , I ⁻ ), p-toluenesulfonate ion, ethyl sulfate ion, PF ₆ ⁻ , BF ₄ ⁻ or ClO ₄ ⁻ , tris(halogenoalkylsulfonyl)methide anion ( Examples thereof include (CF ₃ SO ₂ ) ₃ C ⁻ ), di(halogenoalkylsulfonyl)imide anion (eg (CF ₃ SO ₂ ) ₂ N ⁻ ), tetracyanoborate anion, and the like.
In the general formula 3, when the site represented by Cy in the formula is an anion part, X ¹ represents a cation, and c represents a number necessary for balancing charges. As cations, alkali metal ions (Li ⁺ , Na ⁺ , K ^+, etc.), alkaline earth metal ions (Mg ²⁺ , Ca ²⁺ , Ba ²⁺ , Sr ^2+, etc.), transition metal ions (Ag ⁺ , Fe ²⁺ , Co ²⁺ , Ni ²⁺ , Cu ²⁺ , Zn ^2+, etc.), other metal ions (Al ^3+, etc.), ammonium ion, triethylammonium ion, tributylammonium ion, pyridinium ion, tetrabutylammonium Ion, guanidinium ion, tetramethylguanidinium ion, diazabicycloundecenium and the like. As the cation, Na ⁺ , K ⁺ , Mg ²⁺ , Ca ²⁺ , Zn ²⁺ and diazabicycloundecenium are preferable.
In the general formula 3, when the charge at the site represented by Cy in the formula is neutralized in the molecule, X ¹ does not exist. That is, c is 0.

式（３−１）および（３−２）中、Ｒ^1A、Ｒ^2A、Ｒ^1BおよびＲ^2Bは、それぞれ独立に、アルキル基、アルケニル基、アルキニル基、アラルキル基またはアリール基を表し、
Ｌ^1AおよびＬ^1Bは、それぞれ独立に奇数個のメチン基を有するメチン鎖を表し、
Ｙ¹およびＹ²は、各々独立に−Ｓ−、−Ｏ−、−ＮＲ^X1−または−ＣＲ^X2Ｒ^X3−を表し、
Ｒ^X1、Ｒ^X2およびＲ^X3は、各々独立に水素原子またはアルキル基を表し、
Ｖ^1A、Ｖ^2A、Ｖ^1BおよびＶ^2Bは、それぞれ独立に、ハロゲン原子、シアノ基、ニトロ基、アルキル基、アルケニル基、アルキニル基、アラルキル基、アリール基、ヘテロアリール基、−ＯＲ^c1、−ＣＯＲ^c2、−ＣＯＯＲ^c3、−ＯＣＯＲ^c4、−ＮＲ^c5Ｒ^c6、−ＮＨＣＯＲ^c7、−ＣＯＮＲ^c8Ｒ^c9、−ＮＨＣＯＮＲ^c10Ｒ^c11、−ＮＨＣＯＯＲ^c12、−ＳＲ^c13、−ＳＯ₂Ｒ^c14、−ＳＯ₂ＯＲ^c15、−ＮＨＳＯ₂Ｒ^c16または−ＳＯ₂ＮＲ^c17Ｒ^c18を表し、Ｖ^1A、Ｖ^2A、Ｖ^1BおよびＶ^2Bは、縮合環を形成していてもよく、
Ｒ^c1〜Ｒ^c18は、それぞれ独立に、水素原子、アルキル基、アルケニル基、アルキニル基、アリール基またはヘテロアリール基を表し、
−ＣＯＯＲ^c3のＲ^c3が水素原子の場合および−ＳＯ₂ＯＲ^c15のＲ^c15が水素原子の場合は、水素原子が解離しても、塩の状態であってもよく、
ｍ１およびｍ２は、それぞれ独立に０〜４を表し、
式中のＣｙで表される部位がカチオン部である場合、Ｘ¹はアニオンを表し、ｃは電荷のバランスを取るために必要な数を表し、
式中のＣｙで表される部位がアニオン部である場合、Ｘ¹はカチオンを表し、ｃは電荷のバランスを取るために必要な数を表し、
式中のＣｙで表される部位の電荷が分子内で中和されている場合、Ｘ¹は存在しない。 The compound represented by the general formula 3 is also preferably a compound represented by the following (3-1) or (3-2). This compound has excellent heat resistance.

In formulas (3-1) and (3-2), R ^1A , R ^2A , R ^1B and R ^2B each independently represent an alkyl group, an alkenyl group, an alkynyl group, an aralkyl group or an aryl group,
L ^1A and L ^1B each independently represent a methine chain having an odd number of methine groups,
Y ¹ and Y ² each independently represent —S—, —O—, —NR ^X1 — or —CR ^X2 R ^X3 —,
R ^X1 , R ^X2 and R ^X3 each independently represent a hydrogen atom or an alkyl group,
V ^1A , V ^2A , V ^1B and V ^2B are each independently a halogen atom, a cyano group, a nitro group, an alkyl group, an alkenyl group, an alkynyl group, an aralkyl group, an aryl group, a heteroaryl group, —OR ^c1 , — COR ^c2 , -COOR ^c3 , -OCOR ^c4 , -NR ^c5 R ^c6 , -NHCOR ^c7 , -CONR ^c8 R ^c9 , -NHCONR ^c10 R ^c11 , -NHCOOR ^c12 , -SR ^c13 , -SO ₂ R ^c14 , -SO ₂ OR ^c15 , —NHSO ₂ R ^c16 or —SO ₂ NR ^c17 R ^c18 , V ^1A , V ^2A , V ^1B and V ^2B may form a condensed ring,
R ^{c1 to} R ^c18 each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group or a heteroaryl group,
When R ^{c3 of} —COOR ^c3 is a hydrogen atom and R ^{c15 of} —SO ₂ OR ^c15 is a hydrogen atom, the hydrogen atom may be dissociated or may be in the form of a salt,
m1 and m2 each independently represent 0 to 4,
When the moiety represented by Cy in the formula is a cation moiety, X ¹ represents an anion, c represents a number necessary for balancing charges,
When the site represented by Cy in the formula is an anion part, X ¹ represents a cation, c represents a number necessary for balancing charges,
When the charge of the site represented by Cy in the formula is neutralized in the molecule, X ¹ does not exist.

The group represented by R ^1A , R ^2A , R ^1B and R ^2B has the same meaning as the alkyl group, the alkenyl group, the alkynyl group, the aralkyl group and the aryl group described for R ¹⁰¹ and R ¹⁰² in the general formula 3, and their preferable ranges are also included. It is the same. These groups may be unsubstituted or may have a substituent. Examples of the substituent include a halogen atom, a hydroxyl group, a carboxyl group, a sulfo group, an alkoxy group, an amino group and the like. A carboxyl group and a sulfo group are preferable, and a sulfo group is particularly preferable. In the carboxyl group and the sulfo group, the hydrogen atom may be dissociated or may be in a salt state. When R ^1A , R ^2A , R ^1B and R ^2B represent an alkyl group, it is more preferably a linear alkyl group.

Y ¹ and Y ² are each independently -S -, - O -, - NR X1 - or -CR ^X2 R ^X3 - represents, -NR ^X1 - it is preferred. R ^X1 , R ^X2 and R ^X3 each independently represent a hydrogen atom or an alkyl group, preferably an alkyl group. 1-10 are preferable, as for carbon number of an alkyl group, 1-5 are more preferable, and 1-3 are especially preferable. The alkyl group may be linear, branched or cyclic, but is preferably linear or branched, and particularly preferably linear. The alkyl group is particularly preferably a methyl group or an ethyl group.

L ^1A and L ^1B have the same meaning as L ^{1 in} formula 3, and the preferable ranges are also the same.
The groups represented by V ^1A , V ^2A , V ^1B and V ^2B have the same meanings as those described for G ^A and G ^B in formula 1, and the preferred ranges are also the same.
m1 and m2 each independently represent 0 to 4, and preferably 0 to 2.
The anion and cation represented by X ¹ have the same meaning as the range described for X ¹ in formula 3, and the preferred range is also the same.

Examples of the compound represented by the general formula 3 include the compounds shown below. Further, compounds described in paragraph numbers 0044 to 0045 of JP-A-2009-108267 can be mentioned, and the contents thereof are incorporated in the present specification. In the table below, Et represents an ethyl group.

The compound represented by the general formula 3 is "Heterocyclic Compounds Cyanine Dyes and Related Compounds" by FM Harmer, "Heterocyclic Compounds Cyanine Dyes and Related Compounds". -John Wiley & Sons, New York, London, 1964, and DM Sturmer, "Heterocyclic Compounds-Special Topics in Heterocyc." Click chemistry (Heterocyclic Compounds-Specialtopics in heterocyclic chemistry)", Chapter 18, Section 14, pp. 482-515, John Wiley & Sons, "New York 19 & Sons, John Wiley, 19-Sons, NY". Rods Chemistry of Carbon Compounds" 2nd. Ed. vol. IV, part B, 1977, Chapter 15, 369-422, Elsevier Science Publishing Company Inc., New York, JP-A-6-313939 and JP-A-5-339. It can be easily synthesized with reference to Japanese Patent No. 88293.

(Phthalocyanine compound)
The phthalocyanine compound is preferably a compound represented by the following formula (PC).

In formula (PC), X ^{1 to} X ¹⁶ each independently represent a hydrogen atom or a substituent, and M ¹ represents Cu or V═O.

Examples of the substituent represented by X ^{1 to} X ¹⁶ include the groups described for the above-mentioned substituent T, and an alkyl group, a halogen atom, an alkoxy group, a phenoxy group, an alkylthio group, a phenylthio group, an alkylamino group, and an anilino group are preferable. ..
Of X ^{1 to} X ¹⁶ , the number of substituents is preferably 0 to ¹⁶ , more preferably 0 to 4, further preferably 0 to 1, and particularly preferably 0. In addition, M ¹ is preferably Ti═O.

Specific examples of the compound represented by the general formula (PC) include, for example, the compound described in paragraph No. 0093 of JP2012-77153A, the oxytitanium phthalocyanine described in JP2006-343631A, and the like. Can be mentioned.

一般式（ＮＰＣ）において、Ｘ¹〜Ｘ²⁴は、各々独立に、水素原子又は置換基を表し、Ｍ¹は、Ｃｕ又はＶ＝Ｏを表す。Ｘ¹〜Ｘ²⁴が表す置換基は、上述した置換基Ｔ群で説明した基が挙げられ、アルキル基、ハロゲン原子、アルコキシ基、フェノキシ基、アルキルチオ基、フェニルチオ基、アルキルアミノ基、アニリノ基が好ましい。Ｍ¹は、Ｖ＝Ｏが好ましい。 (Naphthalocyanine compound)
The naphthalocyanine compound is preferably a compound represented by the following formula (NPC).

In General Formula (NPC), X ^{1 to} X ²⁴ each independently represent a hydrogen atom or a substituent, and M ¹ represents Cu or V═O. Examples of the substituents represented by X ^{1 to} X ²⁴ include the groups described in the above-mentioned substituent group T, and include an alkyl group, a halogen atom, an alkoxy group, a phenoxy group, an alkylthio group, a phenylthio group, an alkylamino group, and an anilino group. preferable. M ¹ is preferably V═O.

Specific examples of the compound represented by the general formula (NPC) include compounds described in paragraph No. 0093 of JP 2012-77153 A.

The content of the infrared absorber is preferably 1 to 80 mass% with respect to the total solid content of the composition. The lower limit is preferably 5% by mass or more, and more preferably 10% by mass or more. The upper limit is preferably 70% by mass or less.
When a copper compound is used as the infrared absorber, the content of the copper compound is preferably 30 to 70 mass% with respect to the total solid content of the composition. The upper limit is preferably 60% by mass or less, and more preferably 50% by mass or less. The lower limit is preferably 35% by mass or more, and more preferably 40% by mass or more.
The content of the copper compound in the infrared absorber is preferably 50 to 100% by mass, more preferably 60 to 100% by mass, and even more preferably 70 to 100% by mass. Moreover, the infrared absorber may be substantially only a copper compound. When the infrared absorber is substantially only the copper compound, the content of the copper compound in the infrared absorber is, for example, preferably 99% by mass or more, more preferably 99.9% by mass or more, and only the copper compound. More preferably, it is configured.

<<solvent>>
The composition of the present invention contains a solvent. The solvent is not particularly limited, and can be appropriately selected depending on the purpose as long as it can uniformly dissolve or disperse each component of the composition. For example, water and an organic solvent can be used, and an organic solvent is preferable.

Preferable examples of the organic solvent include alcohols (eg, methanol), ketones, esters, aromatic hydrocarbons, halogenated hydrocarbons, and dimethylformamide, dimethylacetamide, dimethylsulfooxide, sulfolane and the like. .. Specific examples of the alcohols, aromatic hydrocarbons and halogenated hydrocarbons include those described in JP-A-2012-194534, paragraph 0136 and the like, the contents of which are incorporated in the present specification. In addition, specific examples of the esters, ketones, and ethers include those described in JP-A-2012-208494, paragraph 0497 (corresponding US Patent Application Publication No. 2012/0235099, [0609]). Be done.
Examples of the esters include ethyl acetate, -n-butyl acetate, isobutyl acetate, cyclohexyl acetate, amyl acetate, isoamyl acetate, isobutyl acetate, butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate, methyl lactate, ethyl lactate. , Alkyl oxyacetate (eg, methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate (eg, methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, etc.)), alkyl 3-oxypropionate Esters (eg, methyl 3-oxypropionate, ethyl 3-oxypropionate, etc. (eg, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, etc. )), 2-oxypropionic acid alkyl esters (eg, methyl 2-oxypropionate, ethyl 2-oxypropionate, propyl 2-oxypropionate, etc. (eg, methyl 2-methoxypropionate, 2-methoxypropionic acid Ethyl, propyl 2-methoxypropionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate)), methyl 2-oxy-2-methylpropionate and ethyl 2-oxy-2-methylpropionate (for example, 2 -Methyl methoxy-2-methylpropionate, ethyl 2-ethoxy-2-methylpropionate, etc.), methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, methyl 2-oxobutanoate, 2 -Ethyl oxobutanoate etc. are mentioned.
Examples of ethers include diethylene glycol dimethyl ether, tetrahydrofuran, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methyl cellosolve acetate, ethyl cellosolve acetate, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol. Examples include monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, and the like.
Examples of ketones include methyl ethyl ketone, cyclohexanone, cyclopentanone, 2-heptanone, and 3-heptanone.
Examples of aromatic hydrocarbons include toluene and xylene.

The solvent may be used alone or in combination of two or more. When two or more solvents are used in combination, a combination in which the difference between the boiling point of the solvent having the highest boiling point and the boiling point of the solvent having the lowest boiling point is 10° C. or more is preferred. The boiling point difference is preferably 20° C. or higher, more preferably 50° C. or higher, even more preferably 70° C. or higher. The upper limit is preferably 100° C. or lower, for example. In the present invention, the boiling point value of the solvent is a value at 0.1 MPa.
By using two or more kinds of solvents in combination as described above, it is easy to adjust the dissolved gas amount and the dissolved oxygen amount of the composition within the ranges specified in the present invention. For example, when a composition containing an infrared absorber and a solvent is subjected to a treatment such as defoaming to adjust the dissolved gas amount and the dissolved oxygen amount of the composition to a range defined by the present invention, the composition is dissolved in the composition. The generated gas and oxygen are easily defoamed, and the dissolved gas amount and dissolved oxygen amount of the composition are easily adjusted within the range specified in the present invention. Since the solvent having a low boiling point may be removed from the composition along with the bubbles during defoaming, it may remain in the composition after adjusting the dissolved oxygen concentration.
Examples of the combination of the above organic solvents include a solvent A having a boiling point of 100° C. or higher (preferably 120° C. or higher, more preferably 150° C. or higher) and a boiling point of 130° C. or lower (preferably 100° C. or lower, further preferably Is preferably 80° C. or lower) and the solvent B is preferably selected from the solvent A and the solvent B so that the difference in boiling point is 10° C. or higher. Examples of the solvent A include cyclohexanone, propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, propylene glycol monomethyl acetate, butyl acetate and the like. Examples of the solvent B include methanol, ethanol, 2-butanol and the like. Examples of the combination of the solvent A and the solvent B include a combination of cyclohexanone and methanol.

The amount of the solvent in the composition is preferably such that the solid content is 10 to 90% by mass. The lower limit is preferably 15% by mass or more, and more preferably 20% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 70% by mass or less.

<< resin >>
The composition of the present invention may contain a resin. The resin is not particularly limited. For example, (meth)acrylic resin, styrene resin, epoxy resin, ene/thiol resin, polycarbonate resin, polyether resin, polyarylate resin, polysulfone resin, polyethersulfone resin, polyparaphenylene resin, polyarylene ether phosphine oxide. Resin, polyimide resin, polyamide resin, polyamideimide resin, polyolefin resin, cyclic olefin resin, polyester resin, maleimide resin, acrylonitrile resin, polyvinyl acetal resin, poly-N-vinyl acetamide resin, polyvinylpyrrolidone resin, fluorene polycarbonate resin, fluorene polyester Resin, polyethylene naphthalate resin, fluorinated aromatic polymer resin, allyl ester resin, silsesquioxane resin and the like can be mentioned. One of these resins may be used alone, or two or more thereof may be mixed and used. Regarding the resin, the description in paragraphs 0056 to 0060 of JP-A-2014-218597 and the description in paragraphs 0074 to 0156 of JP-A-2013-218312 can be referred to, and the contents thereof are incorporated in the present specification.

The weight average molecular weight (Mw) of the resin is preferably 2,000 to 2,000,000. The upper limit is preferably 1,000,000 or less, more preferably 500,000 or less. The lower limit is preferably 3,000 or more, more preferably 5,000 or more. In the case of an epoxy resin, the weight average molecular weight (Mw) is preferably 100 or more, more preferably 200 to 2,000,000. The upper limit is preferably 1,000,000 or less, more preferably 500,000 or less.

Examples of the (meth)acrylic resin include polymers containing a structural unit derived from (meth)acrylic acid and/or its ester. Specific examples thereof include polymers obtained by polymerizing at least one selected from (meth)acrylic acid, (meth)acrylic acid esters, (meth)acrylamide and (meth)acrylonitrile.

Polyester resins include polyols (eg, ethylene glycol, propylene glycol, glycerin, trimethylolpropane) and polybasic acids (eg, terephthalic acid, isophthalic acid, naphthalenedicarboxylic acid, and other aromatic dicarboxylic acids and their aromatic nuclei). Aromatic dicarboxylic acids in which hydrogen atoms are substituted with methyl groups, ethyl groups, phenyl groups, etc., aliphatic dicarboxylic acids having 2 to 20 carbon atoms such as adipic acid, sebacic acid, dodecanedicarboxylic acid, and fats such as cyclohexanedicarboxylic acid And a polymer obtained by the ring-opening polymerization of a cyclic ester compound such as a caprolactone monomer (for example, polycaprolactone).

Examples of the epoxy resin include bisphenol A type epoxy resin, bisphenol F type epoxy resin, phenol novolac type epoxy resin, cresol novolac type epoxy resin, and aliphatic epoxy resin.

The resin may have an acid group. Examples of the acid group include a carboxyl group, a phosphoric acid group, a sulfonic acid group, and a phenolic hydroxyl group. These acid groups may be only one kind or two or more kinds. Examples of the resin having an acid group include the alkali-soluble resins described in paragraphs 0180 to 0202 of JP-A-2005-043063, the contents of which are incorporated herein. The acid value of the resin having an acid group is preferably 30 to 200 mgKOH/g. The lower limit is preferably 50 mgKOH/g or more, more preferably 70 mgKOH/g or more. The upper limit is preferably 150 mgKOH/g or less, more preferably 120 mgKOH/g or less. The acid value of the resin having an acid group is preferably 30 to 200 mgKOH/g. The lower limit is preferably 50 mgKOH/g or more, more preferably 70 mgKOH/g or more. The upper limit is preferably 150 mgKOH/g or less, more preferably 120 mgKOH/g or less.

式中、Ｒ⁵は水素原子またはアルキル基を表し、Ｌ⁴〜Ｌ⁷はそれぞれ独立に、単結合または２価の連結基を表し、Ｒ¹⁰〜Ｒ¹³はそれぞれ独立にアルキル基またはアリール基を表す。 In the present invention, the resin also preferably has a structural unit represented by the following formulas (A3-1) to (A3-6).

In the formula, R ⁵ represents a hydrogen atom or an alkyl group, L ^{4 to} L ⁷ each independently represent a single bond or a divalent linking group, and R ^{10 to} R ¹³ each independently represent an alkyl group or an aryl group. Represent

R ⁵ represents a hydrogen atom or an alkyl group. 1-5 are preferable, as for carbon number of an alkyl group, 1-3 are more preferable, and 1 is especially preferable. R ⁵ is preferably a hydrogen atom or a methyl group.

L ^{4 to} L ⁷ each independently represent a single bond or a divalent linking group. Examples of the divalent linking group include an alkylene group, an arylene group, -O -, - S -, - CO -, - COO -, - OCO -, - SO 2 -, - NR 10 - (R 10 is or a hydrogen atom Or a group consisting of a combination thereof, or a group consisting of a combination of at least one of an alkylene group, an arylene group and an alkylene group with —O— is preferable. 1-30 are preferable, as for carbon number of an alkylene group, 1-15 are more preferable, and 1-10 are more preferable. The alkylene group may have a substituent, but is preferably unsubstituted. The alkylene group may be linear, branched or cyclic. The cyclic alkylene group may be either monocyclic or polycyclic. 6-18 are preferable, as for carbon number of an arylene group, 6-14 are more preferable, and 6-10 are more preferable.

The alkyl group represented by R ¹⁰ may be linear, branched or cyclic, and is preferably cyclic. The alkyl group may have the above-mentioned substituent or may be unsubstituted. 1-30 are preferable, as for carbon number of an alkyl group, 1-20 are more preferable, and 1-10 are more preferable. The aryl group represented by R ¹⁰ preferably has 6 to 18 carbon atoms, more preferably has 6 to 12 carbon atoms, and further preferably has 6 carbon atoms. R ¹⁰ is preferably a cyclic alkyl group or aryl group.

The alkyl group represented by R ¹¹ and R ¹² may be linear, branched or cyclic, and is preferably linear or branched. The alkyl group may have the above-mentioned substituent or may be unsubstituted. 1-12 are preferable, as for carbon number of an alkyl group, 1-6 are more preferable, and 1-4 are still more preferable. The aryl group represented by R ¹¹ and R ¹² preferably has 6 to 18 carbon atoms, more preferably has 6 to 12 carbon atoms, and further preferably has 6 carbon atoms. R ¹¹ and R ¹² are preferably linear or branched alkyl groups.

The alkyl group represented by R ¹³ may be linear, branched or cyclic, preferably linear or branched. The alkyl group may have the above-mentioned substituent or may be unsubstituted. 1-12 are preferable, as for carbon number of an alkyl group, 1-6 are more preferable, and 1-4 are still more preferable. The aryl group represented by R ¹³ preferably has 6 to 18 carbon atoms, more preferably has 6 to 12 carbon atoms, and further preferably has 6 carbon atoms. R ¹³ is preferably a linear or branched alkyl group or an aryl group.

The content of the resin is preferably 1 to 70 mass% with respect to the total solid content of the composition. The lower limit is more preferably 5% by mass or more, still more preferably 10% by mass or more. The upper limit may be, for example, 65% by mass or less, or 60% by mass or less. The resin may be only one kind or two or more kinds. When two or more kinds are used, the total amount is preferably within the above range.

<<Compound Having Crosslinkable Group (Crosslinkable Compound)>>
The composition of the present invention can contain a compound having a crosslinkable group (crosslinkable compound). By containing the crosslinkable compound in the composition of the present invention, a near infrared cut filter having excellent heat resistance and solvent resistance can be produced. As the crosslinkable compound, a known compound that can be crosslinked by a radical, an acid or heat can be used. Examples thereof include a compound having a group having an ethylenically unsaturated bond, a compound having a cyclic ether group, a compound having a methylol group, and a compound having a partial structure represented by M-X described later. Examples of the group having an ethylenically unsaturated bond include a vinyl group, a styryl group, a (meth)allyl group, a (meth)acryloyl group, and the like, and a (meth)allyl group and a (meth)acryloyl group are preferable. Examples of the cyclic ether group include an epoxy group and an oxetanyl group, and an epoxy group is preferable.

The crosslinkable compound may be in the form of a monomer or a polymer. Examples of the polymer type crosslinkable compound include an epoxy resin described below and a resin containing a structural unit having a crosslinkable group. Examples of the structural unit having a crosslinkable group include the following (A2-1) to (A2-4).

R ¹ represents a hydrogen atom or an alkyl group. 1-5 are preferable, as for carbon number of an alkyl group, 1-3 are more preferable, and 1 is especially preferable. R ¹ is preferably a hydrogen atom or a methyl group.

L ⁵¹ represents a single bond or a divalent linking group. Examples of the divalent linking group include an alkylene group, an arylene group, -O -, - S -, - CO -, - COO -, - OCO -, - SO 2 -, - NR 10 - (R 10 is or a hydrogen atom Or a group consisting of a combination thereof, or a group consisting of a combination of at least one of an alkylene group, an arylene group and an alkylene group with —O— is preferable. 1-30 are preferable, as for carbon number of an alkylene group, 1-15 are more preferable, and 1-10 are more preferable. The alkylene group may have a substituent, but is preferably unsubstituted. The alkylene group may be linear, branched or cyclic. The cyclic alkylene group may be either monocyclic or polycyclic. 6-18 are preferable, as for carbon number of an arylene group, 6-14 are more preferable, and 6-10 are more preferable.

P ¹ represents a crosslinkable group. The crosslinkable group, a group having an ethylenically unsaturated bond, cyclic ether groups, methylol groups, a group represented by the -M- (X ²⁾ _n and the like. -M- (X ²⁾ In the group represented by _n, M represents an atom selected Si, Ti, of Zr and Al, X ² represents a substituent or a ligand, n pieces of X ² Of these, at least one is one selected from a hydroxy group, an alkoxy group, an acyloxy group, a phosphoryloxy group, a sulfonyloxy group, an amino group, an oxime group, and O═C(R ^a )(R ^b ). X ^{2 s} may be bonded to each other to form a ring, and n represents the number of bonds of M to X ² .

The molecular weight of the monomer-type crosslinkable compound is preferably less than 2000, more preferably 100 or more and less than 2000, further preferably 200 or more and less than 2000. The upper limit is preferably 1500 or less, for example. The weight average molecular weight (Mw) of the polymer type crosslinkable compound is preferably 2,000 to 2,000,000. The upper limit is preferably 1,000,000 or less, more preferably 500,000 or less. The lower limit is preferably 3,000 or more, more preferably 5,000 or more. In the case of a compound having a cyclic ether group, the weight average molecular weight (Mw) is preferably 100 or more, more preferably 200 to 2,000,000. The upper limit is preferably 1,000,000 or less, more preferably 500,000 or less.

(Compound having a group having an ethylenically unsaturated bond)
The compound having a group having an ethylenically unsaturated bond is preferably a 3- to 15-functional (meth)acrylate compound, and more preferably a 3- to 6-functional (meth)acrylate compound. As examples of the compound containing a group having an ethylenically unsaturated bond, the description in paragraphs 0033 to 0034 of JP2013-253224A can be referred to, and the contents thereof are incorporated in the present specification. Specific examples include ethyleneoxy-modified pentaerythritol tetraacrylate (commercially available NK ester ATM-35E; manufactured by Shin Nakamura Chemical Co., Ltd.), dipentaerythritol triacrylate (commercially available KAYARAD D-330; Nippon Kayaku Co., Ltd.). Dipentaerythritol tetraacrylate (commercially available KAYARAD D-320; manufactured by Nippon Kayaku Co., Ltd.) dipentaerythritol penta(meth)acrylate (commercially available KAYARAD D-310; manufactured by Nippon Kayaku Co., Ltd.) , Dipentaerythritol hexa(meth)acrylate (as a commercial product, KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd., A-DPH-12E; manufactured by Shin-Nakamura Chemical Co., Ltd.), and these (meth)acryloyl groups are ethylene glycol. A structure via a propylene glycol residue is preferred. Moreover, these oligomer types can also be used. Further, the description of the polymerizable compound in paragraphs 0034 to 0038 of JP2013-253224A can be referred to, and the contents thereof are incorporated in the present specification. Moreover, the polymerizable monomer etc. which were described in Unexamined-Japanese-Patent No. 2012-208494 paragraph 0477 ([0585] of corresponding US Patent application publication 2012/0235099) are mentioned, The content of these is integrated in this specification. Be done. Further, diglycerin EO (ethylene oxide) modified (meth)acrylate (M-460 as a commercial product; manufactured by Toagosei) is preferable. Pentaerythritol tetraacrylate (manufactured by Shin-Nakamura Chemical, A-TMMT) and 1,6-hexanediol diacrylate (manufactured by Nippon Kayaku Co., Ltd., KAYARAD HDDA) are also preferable. These oligomer types can also be used. For example, RP-1040 (made by Nippon Kayaku Co., Ltd.) etc. are mentioned.

The compound containing a group having an ethylenically unsaturated bond may further have an acid group such as a carboxyl group, a sulfonic acid group or a phosphoric acid group. Examples of the compound having an acid group include an ester of an aliphatic polyhydroxy compound and an unsaturated carboxylic acid. A polyfunctional monomer having an acid group obtained by reacting an unreacted hydroxyl group of the aliphatic polyhydroxy compound with a non-aromatic carboxylic acid anhydride is preferable, and particularly preferably, the aliphatic polyhydroxy compound is pentaerythritol and/or Alternatively, it is dipentaerythritol. Examples of commercially available products include Aronix series M-305, M-510, and M-520 as polybasic acid-modified acrylic oligomers manufactured by Toagosei Co., Ltd. The acid value of the compound having an acid group is preferably 0.1 to 40 mgKOH/g. The lower limit is preferably 5 mgKOH/g or more. The upper limit is preferably 30 mgKOH/g or less.

The compound having a group having an ethylenically unsaturated bond is also preferably a compound having a caprolactone structure. As the compound having a caprolactone structure, the description in paragraphs 0042 to 0045 of JP2013-253224A can be referred to, and the contents thereof are incorporated in the present specification. Examples of commercially available products include SR-494, which is a tetrafunctional acrylate having four ethyleneoxy chains manufactured by Sartomer, DPCA-60, which is a hexafunctional acrylate having six pentyleneoxy chains manufactured by Nippon Kayaku Co., Ltd., Examples thereof include TPA-330, which is a trifunctional acrylate having three isobutyleneoxy chains.

In the present invention, as the compound having a group having an ethylenically unsaturated bond, a polymer having a side chain having a group having an ethylenically unsaturated bond can also be used. The content of the constituent unit having a group having an ethylenically unsaturated bond in the side chain is preferably 5 to 100% by mass based on all constituent units constituting the polymer. The lower limit is more preferably 10% by mass or more, further preferably 15% by mass or more. The upper limit is more preferably 90% by mass or less, further preferably 80% by mass or less, and particularly preferably 70% by mass or less.

The polymer may contain other constitutional unit in addition to the constitutional unit having a group having an ethylenically unsaturated bond in its side chain. The other structural unit may include a functional group such as an acid group. It need not contain a functional group. Examples of the acid group include a carboxyl group, a sulfonic acid group, and a phosphoric acid group. Only one type of acid group may be contained, or two or more types may be contained. The proportion of the constituent unit having an acid group is preferably 0 to 50% by mass based on all constituent units constituting the polymer. The lower limit is more preferably 1% by mass or more, further preferably 3% by mass or more. The upper limit is more preferably 35% by mass or less, further preferably 30% by mass or less.

Specific examples of the polymer include (meth)allyl (meth)acrylate/(meth)acrylic acid copolymer. Examples of commercially available products of the above-mentioned polymer include DIANR NR series (manufactured by Mitsubishi Rayon Co., Ltd.), Photomer 6173 (COOH-containing polymerethane acrylic oligomer. Osaka Organic Chemical Industry Co., Ltd.), Cyclomer P series (for example, ACA230AA), Praxel CF200 series (all manufactured by Daicel Chemical Industries, Ltd.), Ebecryl 3800 (manufactured by Daicel UCB Co., Ltd.), Acrycure-RD-F8 (Japan). (Catalyst Co., Ltd.) and the like. Moreover, the polymers shown below are also mentioned.

(Compound having a cyclic ether group)
In the present invention, a compound having a cyclic ether group can also be used as the crosslinkable compound. Examples of the cyclic ether group include an epoxy group and an oxetanyl group, and an epoxy group is preferable.
Examples of the compound having a cyclic ether group include a polymer having a cyclic ether group in a side chain, a monomer or an oligomer having two or more cyclic ether groups in the molecule, and the like. Examples thereof include bisphenol A type epoxy resin, bisphenol F type epoxy resin, phenol novolac type epoxy resin, cresol novolac type epoxy resin, and aliphatic epoxy resin. Moreover, a monofunctional or polyfunctional glycidyl ether compound is also mentioned, and a polyfunctional aliphatic glycidyl ether compound is preferable. As the compound having a cyclic ether group, a compound having a glycidyl group such as glycidyl (meth)acrylate or allyl glycidyl ether, or a compound having an alicyclic epoxy group can be used. As such a thing, the description of JP, 2009-265518, A paragraph 0045 etc. can be considered, and the contents of these are included in this specification.

A commercial item can also be used for the compound which has a cyclic ether group. As a commercial product of a compound having a cyclic ether group, for example, the description in JP 2012-155288 A, paragraph 0191 and the like can be referred to, and the contents thereof are incorporated in the present specification.
Examples of the bisphenol A type epoxy resin include JER827, JER828, JER834, JER1001, JER1002, JER1003, JER1055, JER1007, JER1009, JER1010 (above, manufactured by Mitsubishi Chemical Corporation), EPICLON860, EPICLON1050, EPICLON1051 and EPICLON105 (EPICLON105, EPICLON105 (EPICLON105). Co., Ltd.) and the like.
As the bisphenol F type epoxy resin, JER806, JER807, JER4004, JER4005, JER4007, JER4010 (above, manufactured by Mitsubishi Chemical Corporation), EPICLON830, EPICLON835 (above, manufactured by DIC Corporation), LCE-21, RE-602S. (The above are manufactured by Nippon Kayaku Co., Ltd.) and the like.
Examples of the phenol novolac type epoxy resin include JER152, JER154, JER157S70, JER157S65 (manufactured by Mitsubishi Chemical Corporation), EPICLON N-740, EPICLON N-740, EPICLON N-770, EPICLON N-775 (or more, DIC. (Manufactured by Co., Ltd.) and the like.
As the cresol novolac type epoxy resin, EPICLON N-660, EPICLON N-665, EPICLON N-670, EPICLON N-673, EPICLON N-680, EPICLON N-690, EPICLON N-695 (above, manufactured by DIC Corporation). ), EOCN-1020 (above, Nippon Kayaku Co., Ltd. product), etc. are mentioned.
As the aliphatic epoxy resin, ADEKA RESIN EP-4080S, EP-4085S, EP-4088S (above, manufactured by ADEKA) Celoxide 2021P, Celoxide 2081, Celoxide 2083, Celoxide 2085, EHPE3150, EPOLEAD PB 3600, and the same. PB4700 (above, Daicel Corporation make), Denacol EX-212L, EX-214L, EX-216L, EX-321L, EX-850L (above, Nagase Chemtex Co., Ltd. product) etc. are mentioned.
In addition, ADEKA RESIN EP-4000S, EP-4003S, EP-4010S, EP-4011S (above, manufactured by ADEKA), NC-2000, NC-3000, NC-7300, XD-1000, EPPN-501, EPPN-502 (above, ADEKA Corporation make), JER1031S (Mitsubishi Chemical Corporation make), Lipoxy SPCF-9X (Showa Denko KK make) etc. are mentioned.

(Compound having a partial structure represented by MX)
In the present invention, a compound having a partial structure represented by MX can be used as the crosslinkable compound. In particular, when a copper compound is used as the infrared absorber, it is preferable to use a compound having a partial structure represented by MX as the crosslinkable compound. According to this aspect, it is easy to manufacture a near-infrared cut filter having excellent heat resistance and solvent resistance.

In the compound having the partial structure represented by MX, M is an atom selected from Si, Ti, Zr and Al, preferably Si, Ti and Zr, and more preferably Si.

In the compound having a partial structure represented by MX, X is a hydroxy group, an alkoxy group, an acyloxy group, a phosphoryloxy group, a sulfonyloxy group, an amino group, an oxime group and O=C(R ^a )(R ^b ), an alkoxy group, an acyloxy group and an oxime group are preferable, and an alkoxy group is more preferable. In addition, when X is O=C( ^Ra )( ^Rb ), it couple|bonds with M by the unshared electron pair of the oxygen atom of a carbonyl group (-CO-). R ^a and R ^b each independently represent a monovalent organic group.
The partial structure represented by MX is preferably a combination in which M is Si and X is an alkoxy group. According to this combination, since the composition has an appropriate reactivity, the storage stability of the composition can be improved. Furthermore, it is easy to manufacture a near-infrared cut filter having more excellent heat resistance.

1-20 are preferable, as for carbon number of the alkoxy group which X represents, 1-10 are more preferable, 1-5 are more preferable, and 1-2 are especially preferable. The alkoxy group may be linear, branched or cyclic, but is preferably linear or branched, more preferably linear. The alkoxy group may be unsubstituted or may have a substituent, but is preferably unsubstituted. As the substituent, a halogen atom (preferably a fluorine atom), a vinyl group, a (meth)acryloyl group, a styryl group, an epoxy group, an oxetanyl group, an amino group, an isocyanate group, an isocyanurate group, a ureido group, a mercapto group, a sulfide group. , Sulfo group, carboxyl group, hydroxyl group and the like.
Examples of the acyloxy group represented by X include a substituted or unsubstituted alkylcarbonyloxy group having 2 to 30 carbon atoms, a substituted or unsubstituted arylcarbonyloxy group having 6 to 30 carbon atoms, and the like. Examples thereof include a formyloxy group, an acetyloxy group, a pivaloyloxy group, a stearoyloxy group, a benzoyloxy group, a p-methoxyphenylcarbonyloxy group and the like. As the substituent, those mentioned above can be mentioned.
1-20 are preferable, as for carbon number of the oxime group which X represents, 1-10 are more preferable, and 1-5 are more preferable. For example, an ethylmethylketoxime group and the like can be mentioned.
The amino group represented by X is an amino group, a substituted or unsubstituted alkylamino group having 1 to 30 carbon atoms, a substituted or unsubstituted arylamino group having 6 to 30 carbon atoms, or a heterocyclic amino group having 0 to 30 carbon atoms. Groups and the like. Examples thereof include amino, methylamino, dimethylamino, anilino, N-methyl-anilino, diphenylamino, N-1,3,5-triazin-2-ylamino and the like. As the substituent, those mentioned above can be mentioned.
Examples of the monovalent organic group represented by R ^a and R ^b include an alkyl group, an aryl group, and a group represented by —R ¹⁰¹ —COR ¹⁰² . 1-20 are preferable and, as for carbon number of an alkyl group, 1-10 are more preferable. The alkyl group may be linear, branched or cyclic. The alkyl group may be unsubstituted or may have the above-mentioned substituent. 6-20 are preferable and, as for carbon number of an aryl group, 6-12 are more preferable. The aryl group may be unsubstituted or may have the substituent described above. In the group represented by —R ¹⁰¹ —COR ¹⁰² , R ¹⁰¹ represents an arylene group, and R ¹⁰² represents an alkyl group or an aryl group. 1-20 are preferable and, as for carbon number of the arylene group which R< ¹⁰¹ > represents, 1-10 are more preferable. The arylene group may be linear, branched or cyclic. The arylene group may be unsubstituted or may have the above-mentioned substituent. ^Examples of the alkyl group and aryl group represented by R ¹⁰² include those described for R ^a and R ^b , and the preferred ranges are also the same.

The compound having a partial structure represented by MX may be in the form of a low molecular weight compound or a polymer, but a polymer is preferable because it is easy to form a film having more excellent heat resistance. Among the compounds having the partial structure represented by MX, the low molecular weight compound preferably has a molecular weight of 100 to 1,000. The upper limit is preferably 800 or less, more preferably 700 or less. The molecular weight is a theoretical value obtained from the structural formula. Among the compounds having the partial structure represented by MX, the weight average molecular weight of the polymer type compound is preferably 500 to 300,000. The lower limit is preferably 1000 or more, more preferably 2000 or more. The upper limit is preferably 250,000 or less, more preferably 200,000 or less.

Among the compounds having a partial structure represented by MX, examples of the low molecular weight compound include compounds represented by the following (MX1).
_{^{M- (X 1) m ··· (}} MX1)
M represents an atom selected from Si, Ti, Zr and Al, X ¹ represents a substituent or a ligand, and at least one of m X ¹ is a hydroxy group, an alkoxy group or an acyloxy group. , A phosphoryloxy group, a sulfonyloxy group, an amino group, an oxime group and O═C(R ^a )(R ^b ), and X ^{1 s} are bonded to each other to form a ring. Also, m represents the number of bonds of M with X ¹ . R ^a and R ^b each independently represent a monovalent organic group. When X ¹ is O═C(R ^a )(R ^b ), it is bonded to M by an unshared electron pair of the oxygen atom of the carbonyl group (—CO—).

M is an atom selected from Si, Ti, Zr and Al, preferably Si, Ti and Zr, more preferably Si. X ¹ represents a substituent or a ligand, and at least ^one of m X ¹ is a hydroxy group, an alkoxy group, an acyloxy group, a phosphoryloxy group, a sulfonyloxy group, an amino group, an oxime group and O═C. It is preferably one selected from (R ^a )(R ^b ), and at least one of m X ¹ is one selected from an alkoxy group, an acyloxy group and an oxime group, and m of pieces of X ^1, more preferably at least one is an alkoxy group, all of X ¹ is more preferably an alkoxy group.

Among the substituents and ligands, a hydroxy group, an alkoxy group, an acyloxy group, a phosphoryloxy group, a sulfonyloxy group, an amino group, an oxime group and O=C(R ^a )(R ^b ) have the same meanings as described above. And the preferred range is also the same.

As the substituent other than the hydroxy group, the alkoxy group, the acyloxy group, the phosphoryloxy group, the sulfonyloxy group, the amino group and the oxime group, a hydrocarbon group is preferable. Examples of the hydrocarbon group include an alkyl group, an alkenyl group and an aryl group. The hydrocarbon group may have a substituent or may be unsubstituted. As the substituent, an alkyl group, a halogen atom (preferably a fluorine atom), a vinyl group, a (meth)acryloyl group, a styryl group, an epoxy group, an oxetanyl group, an amino group, an isocyanate group, an isocyanurate group, a ureido group, a mercapto group. , A sulfide group, a sulfo group, a carboxyl group, a hydroxyl group, an alkoxy group and the like.
The alkyl group may be linear, branched or cyclic. 1-20 are preferable, as for carbon number of a linear alkyl group, 1-12 are more preferable, and 1-8 are more preferable. 3-20 are preferable, as for carbon number of a branched alkyl group, 3-12 are more preferable, and 3-8 are still more preferable. The cyclic alkyl group may be either monocyclic or polycyclic. 3-20 are preferable, as for carbon number of a cyclic alkyl group, 4-10 are more preferable, and 6-10 are more preferable.
2-10 are preferable, as for carbon number of an alkenyl group, 2-8 are more preferable, and 2-4 are more preferable.
6-18 are preferable, as for carbon number of an aryl group, 6-14 are more preferable, and 6-10 are more preferable.

Examples of compounds in which M is represented by Si include methyltrimethoxysilane, dimethyldimethoxysilane, phenyltrimethoxysilane, methyltriethoxysilane, dimethyldiethoxysilane, phenyltriethoxysilane, n-propyltrimethoxysilane, and n-propyl. Triethoxysilane, hexyltrimethoxysilane, hexyltriethoxysilane, octyltriethoxysilane, decyltrimethoxysilane, 1,6-bis(trimethoxysilyl)hexane, trifluoropropyltrimethoxysilane, hexamethyldisilazane, vinyltri Methoxysilane, vinyltriethoxysilane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyl Diethoxysilane, 3-glycidoxypropyltriethoxysilane, p-styryltrimethoxysilane, 3-methacryloxypropylmethyldimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-methacryloxypropylmethyldiethoxysilane, 3 -Methacryloxypropyltriethoxysilane, 3-acryloxypropyltrimethoxysilane, N-2-(aminoethyl)-3-aminopropylmethyldimethoxysilane, N-2-(aminoethyl)-3-aminopropyltrimethoxysilane , 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-triethoxysilyl-N-(1,3-dimethyl-butylidene)propylamine, N-phenyl-3-aminopropyltrimethoxysilane, N Hydrochloride of -(vinylbenzyl)-2-aminoethyl-3-aminopropyltrimethoxysilane, tris-(trimethoxysilylpropyl)isocyanurate, 3-ureidopropyltriethoxysilane, 3-mercaptopropylmethyldimethoxysilane, 3 -Mercaptopropyltrimethoxysilane, bis(triethoxysilylpropyl) tetrasulfide, 3-isocyanatopropyltriethoxysilane and the like.
As commercial products, KBM-13, KBM-22, KBM-103, KBE-13, KBE-22, KBE-103, KBM-3033, KBE-3033, KBM-3063, KBE-3063, manufactured by Shin-Etsu Silicone Co., Ltd. KBE-3083, KBM-3103, KBM-3066, KBM-7103, SZ-31, KPN-3504, KBM-1003, KBE-1003, KBM-303, KBM-402, KBM-403, KBE-402, KBE-. 403, KBM-1403, KBM-502, KBM-503, KBE-502, KBE-503, KBM-5103, KBM-602, KBM-603, KBM-903, KBE-903, KBE-9103, KBM-573, KBM-575, KBM-9659, KBE-585, KBM-802, KBM-803, KBE-846, KBE-9007 and the like can be mentioned.

Examples of compounds in which M is represented by Ti include tetraisopropyl titanate, tetranormal butyl titanate, butyl titanate dimer, tetraoctyl titanate, titanium diisopropoxybis(acetylacetonate), titanium tetraacetylacetonate, and titanium diisopropoxybis. (Ethyl acetoacetate), titanium phosphate compound, titanium di-2-ethylhexoxybis (2-ethyl-3-hydroxyhexoxide), titanium diisopropoxybis (ethylacetoacetate), titanium lactate ammonium salt, titanium Lactate, titanium diisopropoxybis(triethanolaminate), tertiary amyl titanate, tetratert-butyl titanate, tetrastearyl titanate, titanium-1,3-propanedioxybis(ethylacetoacetate), titanium dodecylbenzene sulfonate Examples thereof include compounds, titanium isostearate, titanium diethanolaminate, titanium aminoethylaminoethanolate, and the like. As commercially available products, Organix series manufactured by Matsumoto Fine Chemical Co. (for example, TA-10, TA-21, TA-23, TA-30, TC-100, TC-401, TC-710, TC-1040, TC- 201, TC-750, TC-300, TC-310, TC-315, TC-400, TA-60, TA-80, TA-90, TC-120, TC-220, TC-730, TC-810, TC-800, TC-500, TC-510, etc.), Ajinomoto Fine-Techno's Plane Act series (for example, TTS, 46B, 55, 41B, 38S, 138S, 238S, 338X, 44, 9SA, ET, etc.) Can be mentioned.

Examples of the compound in which M is represented by Zr include zirconium tetranormal propoxide, zirconium tetranormal butoxide, zirconium tetraacetylacetonate, zirconium tributoxymonoacetylacetonate, and zirconium dibutoxybis(ethylacetoacetate). As a commercially available product, the Organix series manufactured by Matsumoto Fine Chemical Co. (eg, ZA-45, ZA-65, ZC-150, ZC-540, ZC-700, ZC-580, ZC-200, ZC-320, ZC-). 126, ZC-300, etc.).

Examples of the compound in which M is represented by Al include alkyl acetoacetate aluminum diisopropylate. Examples of commercially available products include Planeact AL-M manufactured by Ajinomoto Fine-Techno Co., Inc.

Among the compounds having the partial structure represented by MX, examples of the polymer type compound include acrylic resin, acrylamide resin, styrene resin, polysiloxane and the like. Of these, acrylic resins, acrylamide resins, and styrene resins are preferable because of their improved film properties and ease of adjusting the viscosity of the coating liquid.
Specific examples of the polymer type compound include, for example, a structural unit represented by the following (MX2-1), a structural unit represented by the following (MX2-2), and a structural unit represented by the following (MX2-3). Examples thereof include polymers having one selected from

M represents an atom selected from Si, Ti, Zr and Al, X ² represents a substituent or a ligand, and at least one of n X ^{2 s} is a hydroxy group, an alkoxy group or an acyloxy group. , A phosphoryloxy group, a sulfonyloxy group, an amino group, an oxime group and O═C(R ^a )(R ^b ), and X ^{2 s} are bonded to each other to form a ring. Alternatively, R ¹ represents a hydrogen atom or an alkyl group, L ¹ represents a single bond or a divalent linking group, and n represents the number of bonds of M with X ² . R ^a and R ^b each independently represent a monovalent organic group. When X ² is O=C( ^Ra )( ^Rb ), it is bonded to M by an unshared electron pair of the oxygen atom of the carbonyl group (-CO-).

M and X ² have the same meanings as M and X ^{1 in} (MX1), and the preferred ranges are also the same.
R ¹ represents a hydrogen atom or an alkyl group. 1-5 are preferable, as for carbon number of an alkyl group, 1-3 are more preferable, and 1 is especially preferable. The alkyl group is preferably linear or branched, and more preferably linear. In the alkyl group, some or all of hydrogen atoms may be replaced with halogen atoms (preferably fluorine atoms).
L ¹ represents a single bond or a divalent linking group. Examples of the divalent linking group include an alkylene group, an arylene group, -O -, - S -, - CO -, - COO -, - OCO -, - SO 2 -, - NR 10 - (R 10 is or a hydrogen atom Or a group consisting of a combination thereof, or a group consisting of a combination of at least one of an alkylene group, an arylene group and an alkylene group with —O— is preferable.
1-30 are preferable, as for carbon number of an alkylene group, 1-15 are more preferable, and 1-10 are more preferable. The alkylene group may have a substituent, but is preferably unsubstituted. The alkylene group may be linear, branched or cyclic. The cyclic alkylene group may be either monocyclic or polycyclic.
6-18 are preferable, as for carbon number of an arylene group, 6-14 are more preferable, 6-10 are more preferable, and a phenylene group is especially preferable.

The polymer type compound may contain another structural unit in addition to the structural units represented by the formulas (MX2-1), (MX2-2) and (MX2-3). Components constituting other structural units are disclosed in paragraph numbers 0068 to 0075 of JP 2010-106268 A (corresponding to US Patent Application Publication No. 2011/0124824, [0112] to [0118]). The description of the copolymerization component can be referred to, and the contents thereof are incorporated in the present specification.
Further, it may have the structural units represented by (A3-1) to (A3-6) described in the above resin. Examples of the polymer type compound include the polymers shown below.

When the compound of the polymer type includes other structural units (preferably structural units represented by formulas ((A3-1) to (A3-6)), formulas (MX2-1) to (MX2-3) The molar ratio of the total of the structural units represented by and the total of the other structural units is preferably 95:5 to 20:80, more preferably 90:10 to 40:60. Moisture resistance and solvent resistance tend to be further improved by increasing the content rates of the structural units represented by (MX2-1) to (MX2-3) within the above range. ) To (MX2-3), the heat resistance tends to be further improved by lowering the content rate of the structural unit represented by the formula (MX2-3) within the above range.

The content of the crosslinkable compound is preferably 15% by mass or more, more preferably 20% by mass or more, and further preferably 25% by mass or more, based on the total solid content of the composition. The upper limit is preferably 90% by mass or less, more preferably 80% by mass or less, and further preferably 70% by mass or less.
The total content of the resin and the crosslinkable compound is preferably 15% by mass or more, more preferably 20% by mass or more, and further preferably 25% by mass or more, based on the total solid content of the composition. The upper limit is preferably 90% by mass or less, more preferably 80% by mass or less, and further preferably 70% by mass or less.
The content of the polymer-type crosslinkable compound (preferably, the resin having the structural unit having a crosslinkable group) in the crosslinkable compound is preferably 10 to 100% by mass based on the whole crosslinkable compound. The lower limit may be 30% by mass or more, and may be 50% by mass or more. The upper limit may be 90 mass% or less, or 70 mass% or less.
The crosslinkable compound may be only one kind or two or more kinds. When two or more kinds are used, the total amount is preferably within the above range.

<<gelatin>>
The composition of the present invention may contain gelatin. By containing gelatin, it is easy to form a near infrared cut filter having excellent heat resistance. Although the detailed mechanism is unknown, it is presumed that this is because the infrared absorber and gelatin easily form an aggregate. In particular, when a cyanine compound is used as the infrared absorber, a near infrared cut filter having excellent heat resistance can be easily formed.

In the present invention, the gelatin includes acid-treated gelatin and alkali-treated gelatin (lime treatment and the like) depending on the synthesis method, and both can be preferably used. The molecular weight of gelatin is preferably 10,000 to 1,000,000. In addition, modified gelatin that has been modified using the amino group or carboxyl group of gelatin can also be used (for example, phthalated gelatin). As gelatin, inert gelatin (for example, Nitta gelatin 750), phthalated gelatin (for example, Nitta gelatin 801), etc. can be used.

In order to enhance the water resistance and mechanical strength of the near infrared cut filter, it is preferable to harden gelatin using various compounds. As the curing agent, conventionally known ones can be used, for example, aldehyde compounds such as formaldehyde and glutaraldehyde, compounds having a reactive halogen described in US Pat. No. 3,288,775 and others, Compounds having a reactive ethylenically unsaturated bond described in US Pat. No. 3,642.486, Japanese Patent Publication No. 49-13563 and others, and aziridine described in US Pat. No. 3,017,280. Compounds, Escherichia coli compounds described in U.S. Pat. No. 3,091,537, halogen carboxyl aldehydes such as mucochloric acid, dioxane such as dihydroxydioxane and dichlorodioxane, or inorganic hard film Examples of the agent include chrome alum and zirconium sulfate. A specific example is 1,3-divinylsulfonyl-2-propanol.

The gelatin content is preferably 1 to 99 mass% with respect to the total solid content of the composition. The lower limit is preferably 10% by mass or more, more preferably 20% by mass or more. The upper limit is preferably 95% by mass or less, more preferably 90% by mass or less.

<< photopolymerization initiator >>
The composition of the present invention may contain a photopolymerization initiator. The content of the photopolymerization initiator is preferably 0.01 to 30 mass% with respect to the total solid content of the composition. The lower limit is preferably 0.1% by mass or more, more preferably 0.5% by mass or more. The upper limit is preferably 20% by mass or less, more preferably 15% by mass or less. The photopolymerization initiator may be of one type or of two or more types, and in the case of two or more types, the total amount is preferably within the above range.

The photopolymerization initiator is appropriately selected depending on the intended purpose without any limitation, as long as it has the ability to initiate crosslinking (polymerization) of the crosslinkable compound by light. When the polymerization is initiated by light, it is preferable that the composition has photosensitivity to visible light in the ultraviolet region.

The photopolymerization initiator is preferably a compound having at least an aromatic group, for example, an acylphosphine compound, an acetophenone compound, an α-aminoketone compound, a benzophenone compound, a benzoin ether compound, a ketal derivative compound, a thioxanthone compound. Onium salt compounds such as oxime compounds, hexaarylbiimidazole compounds, trihalomethyl compounds, azo compounds, organic peroxides, diazonium compounds, iodonium compounds, sulfonium compounds, azinium compounds, benzoin ether compounds, ketal derivative compounds and metallocene compounds , Organic boron salt compounds, disulfone compounds, thiol compounds and the like.
As the photopolymerization initiator, the description in paragraphs 0217 to 0228 of JP 2013-253224 A can be referred to, and the contents thereof are incorporated in the present specification.
As the oxime compound, commercially available products IRGACURE-OXE01 (manufactured by BASF), IRGACURE-OXE02 (manufactured by BASF), TR-PBG-304 (manufactured by Changzhou Power Electronics Co., Ltd.), ADEKA ARKUL'S NCI-831. (Made by ADEKA), ADEKA ARKUL'S NCI-930 (made by ADEKA), etc. can be used.
As the acetophenone compound, commercially available products such as IRGACURE-907, IRGACURE-369, and IRGACURE-379 (trade names: all manufactured by BASF) can be used. As the acylphosphine compound, commercially available products such as IRGACURE-819 and DAROCUR-TPO (trade names: all manufactured by BASF) can be used.
In the present invention, an oxime compound having a fluorine atom can be used as the photopolymerization initiator. Specific examples of the oxime compound having a fluorine atom include compounds described in JP2010-262028A, compounds 24, 36 to 40 described in JP-A-2014-500852, and compounds described in JP2013-164471A. C-3) etc. are mentioned. This content is incorporated herein.
It is also possible to use an oxime compound having a nitro group as the photopolymerization initiator. Specific examples of the oxime compound having a nitro group include compounds described in paragraphs 0031 to 0047 of JP2013-114249A, paragraphs 0008 to 0012 and 0070 to 0079 of JP2014-137466A, and ADEKA. Acres NCI-831 (made by ADEKA) is mentioned.

<<Temperature Stabilizer>>
The composition of the present invention can also contain an oxime compound as a heat stability-imparting agent. In particular, when a copper compound is used as the infrared absorbing agent, the heat resistance of the infrared absorbing layer can be further improved by incorporating a heat stability imparting agent such as an oxime compound. As the oxime compound, commercially available products IRGACURE-OXE01 (manufactured by BASF), IRGACURE-OXE02 (manufactured by BASF), TR-PBG-304 (manufactured by Changzhou Power Electronics Co., Ltd.), ADEKA ARKUL'S NCI-831. (Made by ADEKA), ADEKA ARKUL'S NCI-930 (made by ADEKA), etc. can be used. Further, the oxime compound having a fluorine atom and the oxime compound having a nitro group described above can also be used.
The content of the heat stability imparting agent is preferably 0.01 to 30% by mass based on the total solid content of the composition. The lower limit is preferably 0.1% by mass or more. The upper limit is preferably 20% by mass or less, and more preferably 10% by mass or less.

<<Catalyst>>
The composition of the present invention may contain a catalyst. By containing a catalyst, an infrared cut filter having excellent solvent resistance and heat resistance can be easily obtained. In particular, when the compound having the partial structure represented by M-X described above is used as the crosslinkable compound, the crosslinking reaction is promoted, and an infrared cut filter having excellent solvent resistance and heat resistance is easily obtained. Examples of the catalyst include organic metal-based catalysts, acid-based catalysts, amine-based catalysts, and organic metal-based catalysts are preferable. Examples of the organometallic catalyst include tris(2,4-pentanedionato)aluminum(III). The content of the catalyst is preferably 0.01 to 5 mass% with respect to the total solid content of the composition. The lower limit is preferably 0.05% by mass or more. The upper limit is preferably 3% by mass or less, and more preferably 1% by mass or less.

<< Surfactant >>
The composition of the present invention may contain a surfactant. As the surfactant, only one kind may be used, or two or more kinds may be combined. The content of the surfactant is preferably 0.0001 to 5 mass% with respect to the total solid content of the composition. The lower limit is preferably 0.005% by mass or more, more preferably 0.01% by mass or more. The upper limit is preferably 2% by mass or less, and more preferably 1% by mass or less.
As the surfactant, various surfactants such as a fluorine-based surfactant, a nonionic surfactant, a cationic surfactant, an anionic surfactant, and a silicone-based surfactant can be used. The infrared absorbing composition preferably contains at least one of a fluorine-based surfactant and a silicone-based surfactant. The interfacial tension between the surface to be coated and the coating liquid is reduced, and the wettability to the surface to be coated is improved. Therefore, the liquid characteristics (particularly the fluidity) of the composition are improved, and the uniformity of the coating thickness and the liquid saving property are further improved. As a result, even when a thin film of about several μm is formed with a small amount of liquid, it is possible to form a film having a uniform thickness and a small thickness variation.

上記の化合物の重量平均分子量は、好ましくは３，０００〜５０，０００であり、例えば、１４，０００である。
また、エチレン性不飽和基を側鎖に有する含フッ素重合体をフッ素系界面活性剤として用いることもできる。具体例としては、特開２０１０−１６４９６５号公報００５０〜００９０段落および０２８９〜０２９５段落に記載された化合物、例えばＤＩＣ社製のメガファックＲＳ−１０１、ＲＳ−１０２、ＲＳ−７１８Ｋ、ＲＳ−７２−Ｋ等が挙げられる。なお、エチレン性不飽和基を側鎖に有する含フッ素重合体は、界面活性剤に該当し、上述した架橋性基を有する樹脂および架橋性化合物とは異なる成分である。
フッ素系界面活性剤は、特開２０１５−１１７３２７号公報の段落００１５〜０１５８に記載の化合物を用いることもできる。 The fluorine content of the fluorine-based surfactant is preferably 3 to 40% by mass. The lower limit is preferably 5% by mass or more, more preferably 7% by mass or more. The upper limit is preferably 30% by mass or less, and more preferably 25% by mass or less. When the fluorine content is within the above range, it is effective in terms of uniformity of the thickness of the coating film and liquid saving, and the solubility is also good.
Specific examples of the fluorinated surfactant include the surfactants described in paragraphs 0060 to 0064 of JP-A-2014-41318 (corresponding paragraphs 0060 to 0064 of WO2014/17669 pamphlet). The contents of these are incorporated herein. Examples of commercially available fluorine-based surfactants include Megafac F-171, F-172, F-173, F-176, F-177, F-141, F-142, and F-142. F-143, F-144, R30, F-437, F-475, F-479, F-482, F-554, F-780 (above, manufactured by DIC Corporation) , Florard FC430, FC431, FC171 (above, manufactured by Sumitomo 3M Ltd.), Surflon S-382, SC-101, SC-103, SC-104, SC-105, SC1068, SC. -381, SC-383, S393, KH-40 (above, Asahi Glass Co., Ltd. product), etc. are mentioned.
A block polymer may be used as the fluorine-based surfactant, and specific examples thereof include compounds described in JP 2011-89090 A. Further, the following compounds are also exemplified as the fluorine-based surfactant used in the present invention.

The weight average molecular weight of the above compound is preferably 3,000 to 50,000, for example, 14,000.
Further, a fluoropolymer having an ethylenically unsaturated group in its side chain can also be used as the fluorosurfactant. As specific examples, compounds described in JP-A-2010-164965, paragraphs 0050 to 0090 and paragraphs 0289 to 0295, for example, Megafac RS-101, RS-102, RS-718K, RS-72- manufactured by DIC Corporation. K etc. are mentioned. The fluoropolymer having an ethylenically unsaturated group in its side chain corresponds to a surfactant and is a component different from the above-mentioned resin and crosslinkable compound having a crosslinkable group.
As the fluorine-based surfactant, the compounds described in paragraphs 0015 to 0158 of JP-A-2005-117327 can also be used.

Specific examples of the nonionic surfactants include nonionic surfactants described in JP-A-2012-208494, paragraph 0553 (corresponding US Patent Application Publication No. 2012/0235099, [0679]). The contents of which are incorporated herein.
Specific examples of the cationic surfactants include the cationic surfactants described in JP-A-2012-208494, paragraph 0554 (corresponding to US Patent Application Publication No. 2012/0235099, [0680]). , Their contents are incorporated herein.
Specific examples of the anionic surfactant include W004, W005, W017 (manufactured by Yusho Co., Ltd.) and the like.
Examples of the silicone-based surfactant include the silicone-based surfactants described in JP-A-2012-208494, paragraph 0556 (corresponding US Patent Application Publication No. 2012/0235099, [0682]). , Their contents are incorporated herein.

<< polymerization inhibitor >>
The composition of the present invention may contain a polymerization inhibitor. As the polymerization inhibitor, hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4′-thiobis(3-methyl-6-tert-butylphenol), 2,2′-methylenebis(4-methyl-6-tert-butylphenol), N-nitrosophenylhydroxyamine primary cerium salt and the like can be mentioned, with p-methoxyphenol being preferred. The content of the polymerization inhibitor is preferably 0.01 to 5 mass% with respect to the total solid content of the composition.

<<UV absorber>>
The composition of the present invention may contain an ultraviolet absorber. A known compound can be used as the ultraviolet absorber. Examples of commercially available products include UV503 (Daito Kagaku Co., Ltd.). The content of the ultraviolet absorber is preferably 0.01 to 10% by mass, and more preferably 0.01 to 5% by mass, based on the total solid content of the composition.

(Antioxidant)
The composition of the present invention may contain an antioxidant. Examples of antioxidants include phenol compounds, phosphite ester compounds, and thioether compounds. A phenol compound having a molecular weight of 500 or more, a phosphite compound having a molecular weight of 500 or more, or a thioether compound having a molecular weight of 500 or more is more preferable. You may use these in mixture of 2 or more types. As the phenol compound, any phenol compound known as a phenolic antioxidant can be used. Preferred phenol compounds include hindered phenol compounds. In particular, a compound having a substituent at the site (ortho position) adjacent to the phenolic hydroxyl group is preferable. As the above-mentioned substituent, a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms is preferable, and a methyl group, an ethyl group, a propionyl group, an isopropionyl group, a butyl group, an isobutyl group, a t-butyl group, a pentyl group, an isopentyl group. A group, a t-pentyl group, a hexyl group, an octyl group, an isooctyl group, and a 2-ethylhexyl group are more preferable. Further, a compound (antioxidant) having a phenol group and a phosphite group in the same molecule is also preferable.

Further, as the antioxidant, a phosphorus-based antioxidant can also be preferably used. As the phosphorus-based antioxidant, tris[2-[[2,4,8,10-tetrakis(1,1-dimethylethyl)dibenzo[d,f][1,3,2]dioxaphosphepin-6 is used. -Yl]oxy]ethyl]amine, tris[2-[(4,6,9,11-tetra-tert-butyldibenzo[d,f][1,3,2]dioxaphosphepin-2-yl ) Oxy]ethyl]amine, and at least one compound selected from the group consisting of ethylbisphosphite (2,4-ditert-butyl-6-methylphenyl).

These are easily available as commercial products, and are Adeka Stab AO-20, Adeka Stab AO-30, Adeka Stab AO-40, Adeka Stab AO-50, Adeka Stub AO-60F, Adeka Stab AO-60, Adeka Stub AO-60G, Adeka Stab AO-60G. -80, ADEKA STAB AO-330 (ADEKA, Inc.) and the like.

The content of the antioxidant is preferably 0.01 to 20% by mass, and more preferably 0.3 to 15% by mass, based on the total solid content of the composition. The antioxidant may be only one type or two or more types. When two or more kinds are used, the total amount is preferably within the above range.

<<other ingredients>>
The composition of the present invention includes, for example, a dispersant, a sensitizer, a curing accelerator, a filler, a plasticizer, an adhesion promoter and other auxiliaries (for example, conductive particles, a filler, a defoaming agent, a flame retardant). , A leveling agent, a peeling accelerator, an antioxidant, a fragrance, a surface tension adjusting agent, a chain transfer agent, etc.) can be further contained. These components are described, for example, in paragraph Nos. 0183 to 0228 of JP2012-003225A ([0237] to [0309] of corresponding US Patent Application Publication No. 2013/0034812) and JP2008-250074A. The description of paragraph numbers 0101 to 0102, paragraph numbers 0103 to 0104, paragraph numbers 0107 to 0109, and paragraph numbers 0159 to 0184 of JP2013-195480A can be referred to, and the contents thereof are incorporated in the present specification. ..

<Method for producing composition>
The composition of the present invention was prepared by mixing the infrared absorbent, the solvent, and the above-mentioned components, if necessary, to prepare the composition A, and adjusting the dissolved oxygen amount in the liquid at 25°C at 0.1 MPa to 0. It can be manufactured by adjusting to 1 to 50 mg/L. In the production of the composition, the respective components may be blended together, or the respective components may be dissolved and dispersed in a solvent and then sequentially blended. In addition, there is no particular restriction on the order of addition and the working conditions when blending.
As a method of adjusting the amount of dissolved oxygen of the composition in the above range, for example, when the amount of dissolved oxygen of the composition is too small, a method of aerating a gas such as oxygen or air to the composition is used. A method of adjusting the dissolved oxygen amount of the substance within the above range can be mentioned. Further, when the amount of dissolved oxygen in the composition is too large, a method of performing degassing treatment to adjust the amount of dissolved oxygen in the composition can be mentioned. Examples of the deaeration treatment include ultrasonic irradiation and deaeration under reduced pressure. The method of performing deaeration by decompression under a pressure of 0.001 to 0.01 Pa and a temperature of 0 to 50° C. for 1 to 10 minutes can be mentioned.

When preparing the composition, it is preferable to perform a filtration treatment for the purpose of removing foreign matters and reducing defects. The filtration treatment is preferably filtration with a filter. The filter can be used without particular limitation as long as it has been conventionally used for filtration and the like. For example, fluororesins such as polytetrafluoroethylene (PTFE), polyamide resins such as nylon (eg nylon-6, nylon-6,6), polyolefin resins such as polyethylene and polypropylene (PP) (high density, ultra high molecular weight). (Including) and the like. Among these materials, polypropylene (including high-density polypropylene) and nylon are preferable.
The pore size of the filter is suitably about 0.01 to 7.0 μm, preferably about 0.01 to 3.0 μm, and more preferably about 0.05 to 0.5 μm. By setting this range, it becomes possible to reliably remove fine foreign matter which hinders the preparation of a uniform and smooth composition in the subsequent step. Further, it is also preferable to use a fibrous filter medium, and examples of the filter medium include polypropylene fiber, nylon fiber, glass fiber, and the like. Specifically, SBP type series (such as SBP008) and TPR type series (TPR002) manufactured by Roki Techno Co., Ltd. , TPR005, etc.) and SHPX type series (SHPX003, etc.) filter cartridges can be used.

When using the filters, different filters may be combined. At that time, the filtering by the first filter may be performed only once, or may be performed twice or more.
Moreover, you may combine the 1st filter of a different hole diameter within the range mentioned above. For the pore size here, the nominal value of the filter manufacturer can be referred to. The commercially available filter is selected from various filters provided by, for example, Nippon Pole Co., Ltd. (DFA4201NXEY, etc.), Advantech Toyo Co., Ltd., Japan Entegris Co., Ltd. (formerly Japan Microlith Co., Ltd.), or Kits Micro Filter Co., Ltd. can do.
The second filter may be made of the same material as the first filter described above.

When the filtration treatment is carried out, it is preferable to adjust the dissolved oxygen amount in the above-mentioned range for the composition after the filtration treatment. This is because the amount of dissolved oxygen may change due to the filter filtration.

The method for producing the composition of the present invention preferably includes the step of defoaming the composition A described above. According to this aspect, it is easy to adjust the dissolved oxygen amount of the composition within the above range.
The composition A contains two or more kinds of solvents, and the difference between the boiling point of the solvent having the highest boiling point and the boiling point of the solvent having the lowest boiling point among the two or more kinds of solvents is 10° C. or more (preferably 20° C. or higher, more preferably 50° C. or higher, particularly preferably 70° C. or higher). Examples of the combination of the above organic solvents include a solvent A having a boiling point of 100° C. or higher (preferably 120° C. or higher, more preferably 150° C. or higher) and a boiling point of 130° C. or lower (preferably 100° C. or lower, further preferably Is preferably 80° C. or lower) and the solvent B is preferably selected from the solvent A and the solvent B so that the difference in boiling point is 10° C. or higher. Examples of the solvent A and the solvent B include those described for the organic solvent described above. According to this aspect, when the composition A is subjected to the defoaming treatment, the gas and oxygen dissolved in the composition A are easily defoamed, and the dissolved oxygen amount of the composition is adjusted to the range specified in the present invention. It's easy to do.

<Film, near infrared cut filter>
Next, the film of the present invention will be described. The film of the present invention comprises the composition of the present invention described above. Since the film of the present invention is excellent in infrared shielding property and visible transparency, it can be preferably used as an infrared cut filter. That is, the composition of the present invention is also a near infrared absorbing composition. The composition of the present invention can be suitably used as a composition for a near infrared cut filter. The film of the present invention may or may not have a pattern (flat film).
Further, the near infrared cut filter of the present invention comprises the above-mentioned composition of the present invention.

The near infrared cut filter of the present invention has a light transmittance of preferably 85% or more, more preferably 90% or more, further preferably 95% or more in the entire wavelength range of 400 to 550 nm. preferable. The higher the transmittance in the visible region is, the more preferable, and it is preferable that the transmittance is high at a wavelength of 400 to 550 nm. Further, the light transmittance at at least one point in the wavelength range of 700 to 800 nm is preferably 20% or less, and more preferably the light transmittance in the entire wavelength range of 700 to 800 nm is 20% or less. ..

The film thickness of the near infrared cut filter of the present invention can be appropriately selected according to the purpose. For example, it is preferably 500 μm or less, more preferably 300 μm or less, further preferably 250 μm or less, and particularly preferably 200 μm or less. The lower limit of the film thickness is, for example, preferably 0.1 μm or more, more preferably 0.2 μm or more, and even more preferably 0.5 μm or more.

The near-infrared cut filter of the present invention may further have an ultraviolet/infrared light reflecting film or an ultraviolet absorbing layer. By having the ultraviolet/infrared light reflecting film, an effect of improving the incident angle dependency can be obtained. As the ultraviolet/infrared light reflecting film, for example, the reflecting layer described in paragraphs 0033 to 0039 of JP2013-68688A and paragraphs 0110 to 0114 of WO2015/0999060 can be referred to, and the contents thereof can be considered. Incorporated in the description. By having the ultraviolet absorbing layer, it is possible to obtain a near-infrared cut filter having excellent ultraviolet shielding properties. As the ultraviolet absorbing layer, for example, the absorbing layer described in paragraphs 0040 to 0070 and 0119 to 0145 of WO2015/0999060 can be referred to, and the contents thereof are incorporated in the present specification.

The near-infrared cut filter of the present invention is a lens having a function of absorbing/cutting near-infrared rays (lens for camera such as digital camera, mobile phone and vehicle-mounted camera, optical lens such as f-θ lens, pickup lens) and semiconductor light receiving. Optical filter for elements, near-infrared absorbing film or near-infrared absorbing plate that blocks heat rays for energy saving, agricultural coating agent for selective use of sunlight, recording medium utilizing near-infrared absorbing heat, It is used for near-infrared filters for electronic equipment and photography, protective glasses, sunglasses, heat ray blocking film, optical character reading and recording, protection of copying confidential documents, electrophotographic photoreceptors, laser welding, etc. It is also useful as a noise cut filter for CCD cameras and a filter for CMOS image sensors.

<Method of manufacturing near infrared cut filter>
The near infrared cut filter of the present invention can be manufactured using the composition of the present invention. Specifically, it can be produced through a step of applying the composition of the present invention to a support or the like to form a composition layer, a step of drying the composition layer and/or a step of curing the composition layer. Moreover, you may perform the process of forming a pattern further. The film thickness, laminated structure and the like can be appropriately selected according to the purpose.

The step of forming the composition layer is performed, for example, by using the composition of the present invention on a support by a dropping method (drop casting), a spin coater, a slit spin coater, a slit coater, screen printing, applicator coating, or the like. it can. In the case of the dropping method (drop casting), it is preferable to form a dropping region of the composition having photoresist as partition walls on the support so that a uniform film having a predetermined film thickness can be obtained. A desired film thickness can be obtained by adjusting the dropping amount and solid content concentration of the composition and the area of the dropping region. The thickness of the dried film is not particularly limited and can be appropriately selected depending on the purpose.
The support may be a transparent substrate such as glass. It may also be a solid-state image sensor. Further, it may be another substrate provided on the light receiving side of the solid-state image sensor. Further, it may be a layer such as a flattening layer provided on the light receiving side of the solid-state image sensor.

In the step of drying the composition layer, the drying conditions also vary depending on each component, the type of solvent, the usage ratio, and the like. For example, a temperature of 80°C to 200°C and 30 seconds to 15 minutes are preferable.

In the step of curing the composition layer, the method of curing the composition layer is not particularly limited and can be appropriately selected according to the purpose. For example, the whole surface exposure treatment, the whole surface heat treatment and the like are suitable. Here, in the present invention, “exposure” is used to include not only light of various wavelengths but also irradiation with radiation such as electron beams and X-rays. The exposure is preferably performed by irradiation of radiation, and as the radiation that can be used in the exposure, ultraviolet rays and visible light such as electron beam, KrF, ArF, g ray, h ray and i ray are particularly preferably used. Examples of the exposure method include stepper exposure and exposure with a high pressure mercury lamp. Exposure is preferably 5~3000mJ / cm ^2, more preferably ^{10~2000mJ / cm 2, 50~1000mJ / cm} 2 is particularly preferred. Examples of the method of exposing the entire surface include a method of exposing the entire surface of the composition layer. By exposing the entire surface, the curing of the crosslinking component in the film is promoted, the curing of the film further proceeds, and the solvent resistance and heat resistance of the film are improved. The apparatus for performing the whole surface exposure is not particularly limited and may be appropriately selected depending on the purpose, but, for example, an ultraviolet exposure device such as an ultra-high pressure mercury lamp is suitable. Moreover, as a method of the entire surface heat treatment, a method of heating the entire surface of the composition layer can be mentioned. By heating the entire surface, the solvent resistance and heat resistance of the film are improved.
The heating temperature in the entire surface heating is preferably 120°C to 250°C, more preferably 160°C to 220°C. When the heating temperature is 120° C. or higher, the film strength is improved by the heat treatment, and when the heating temperature is 250° C. or lower, the decomposition of the film component can be suppressed. The heating time for heating the entire surface is preferably 3 minutes to 180 minutes, more preferably 5 minutes to 120 minutes. The apparatus for heating the entire surface is not particularly limited and can be appropriately selected from known apparatuses according to the purpose, and examples thereof include a dry oven, a hot plate, and an infrared (IR) heater.

In the step of curing the composition layer, prebaking (preheating) may be performed before the curing treatment. The heating temperature is preferably 80°C to 200°C, more preferably 90°C to 150°C. The heating time is preferably 30 to 240 seconds, more preferably 60 to 180 seconds.

In the step of curing the composition layer, post-baking (post-heating) may be further performed after the curing treatment. The post-heating is a heating treatment for completing the curing of the film after the curing treatment. The heating temperature is preferably 100 to 240°C. From the viewpoint of film curing, 200 to 230°C is more preferable. The heating time is preferably 30 to 1000 seconds, more preferably 60 to 500 seconds.

In the step of forming the pattern, examples of the method of forming the pattern include pattern formation by the photolithography method and pattern by the dry etching method.

<Solid-state image sensor, camera module>
The solid-state image sensor of the present invention includes the near infrared cut filter of the present invention. Further, the camera module of the present invention includes the near infrared cut filter of the present invention.

FIG. 1 is a schematic cross-sectional view showing the configuration of a camera module having a near infrared cut filter according to an embodiment of the present invention.
The camera module 10 shown in FIG. 1 includes a solid-state image sensor 11, a flattening layer 12 provided on the main surface side (light-receiving side) of the solid-state image sensor, a near-infrared cut filter 13, and a near-infrared cut filter. And a lens holder 15 having the imaging lens 14 arranged therein. In the camera module 10, incident light hν from the outside reaches the image pickup device section of the solid-state image pickup device 11 after sequentially passing through the image pickup lens 14, the near-infrared cut filter 13, and the flattening layer 12.

The solid-state imaging device 11 has, for example, a photodiode, an interlayer insulating film (not shown), a base layer (not shown), a color filter 17, an overcoat (not shown), and a microlens 18 on the main surface of the substrate 16. Are provided in this order. The color filter 17 (red color filter, green color filter, blue color filter) and the microlens 18 are arranged so as to correspond to the solid-state image sensor 11. Instead of providing the near-infrared cut filter 13 on the surface of the flattening layer 12, a near-infrared cut filter 13 may be provided near the surface of the microlens 18, between the base layer and the color filter 17, or between the color filter 17 and the overcoat. The infrared cut filter 13 may be provided. For example, the near infrared cut filter 13 may be provided at a position within 2 mm (more preferably within 1 mm) from the surface of the microlens. When it is provided at this position, the process of forming the near-infrared cut filter can be simplified, and unnecessary near-infrared rays to the microlens can be sufficiently cut, so that the near-infrared shielding property can be further enhanced.

Since the near infrared cut filter of the present invention has excellent heat resistance, it can be subjected to the solder reflow process. By manufacturing the camera module by the solder reflow process, it is possible to automatically mount electronic component mounting boards that need to be soldered, and the productivity is markedly improved compared to the case where the solder reflow process is not used. Can be improved. Further, since it can be performed automatically, cost reduction can be achieved. When it is subjected to the solder reflow process, it is exposed to a temperature of about 250 to 270° C. Therefore, the near-infrared cut filter has heat resistance that can withstand the solder reflow process (hereinafter also referred to as “solder reflow resistance”). ) Is preferred. In the present specification, “having solder reflow resistance” means maintaining the characteristics as a near infrared cut filter before and after heating at 180° C. for 1 minute. More preferably, the characteristics are maintained before and after heating at 230° C. for 10 minutes. More preferably, the characteristics are maintained before and after heating at 250° C. for 3 minutes. In the case of not having solder reflow resistance, the near infrared ray shielding property of the near infrared ray cut filter may be deteriorated or the function as a film may be insufficient when held under the above conditions.
The camera module of the present invention can further have an ultraviolet absorbing layer. According to this aspect, it is possible to enhance the ultraviolet shielding property. For the ultraviolet absorbing layer, for example, the description in paragraphs 0040 to 0070 and 0119 to 0145 of WO2015/0999060 can be referred to, and the contents thereof are incorporated in the present specification. Further, it may further have an ultraviolet/infrared light reflecting film described later. The ultraviolet absorbing layer and the ultraviolet/infrared light reflecting film may be used in combination, or only one of them may be used.

2 to 4 are schematic cross-sectional views showing an example of a near-infrared cut filter peripheral portion in the camera module.

As shown in FIG. 2, the camera module includes a solid-state imaging device 11, a flattening layer 12, an ultraviolet/infrared light reflecting film 19, a transparent base material 20, and a near infrared ray absorbing layer (near infrared ray cut filter) 21. And the antireflection layer 22 may be provided in this order. The ultraviolet/infrared light reflecting film 19 has an effect of imparting or enhancing the function of a near-infrared cut filter. For example, see paragraphs 0033 to 0039 of JP2013-68688A and paragraphs 0110 to 0114 of WO2015/0999060. Can be taken into account, the content of which is incorporated herein. The transparent base material 20 transmits light having a wavelength in the visible range, and for example, paragraphs 0026 to 0032 of JP2013-68688A can be referred to, and the contents thereof are incorporated in the present specification. The near infrared absorption layer 21 can be formed by applying the composition of the present invention described above. The antireflection layer 22 has a function of improving the transmittance by preventing reflection of light incident on the near-infrared cut filter and efficiently utilizing the incident light, and is disclosed in, for example, JP-A-2013-68688. Paragraph 0040 of the present disclosure may be referred to, the contents of which are incorporated herein.

As shown in FIG. 3, the camera module includes a solid-state imaging device 11, a near-infrared absorption layer (near-infrared cut filter) 21, an antireflection layer 22, a flattening layer 12, an antireflection layer 22, and a transparent substrate. The material 20 and the ultraviolet/infrared light reflecting film 19 may be provided in this order.

As shown in FIG. 4, the camera module includes a solid-state imaging device 11, a near-infrared absorbing layer (near-infrared cut filter) 21, an ultraviolet/infrared light reflecting film 19, a flattening layer 12, and an antireflection layer 22. The transparent base material 20 and the antireflection layer 22 may be provided in this order.

<Image display device>
The image display device of the present invention has the near infrared cut filter of the present invention. The near-infrared cut filter of the present invention can also be used in image display devices such as liquid crystal display devices and organic electroluminescence (organic EL) display devices. For example, by using together with each colored pixel (for example, red, green, blue), the infrared light included in the backlight of the display device (for example, white light emitting diode (white LED)) is blocked, and malfunction of peripheral devices is prevented. It can be used for the purpose of forming a pixel for infrared light in addition to each colored display pixel.

For definitions of display devices and details of each display device, see, for example, “Electronic display device (Akio Sasaki, published by Industrial Research Institute Co., Ltd., 1990)”, “Display device (Junsho Ibuki, Sangyo Tosho Co., Ltd.) First year issued)" etc. Further, the liquid crystal display device is described in, for example, "Next-generation liquid crystal display technology (edited by Tatsuo Uchida, published by Industrial Research Institute Co., Ltd., 1994)". The liquid crystal display device to which the present invention can be applied is not particularly limited, and for example, the present invention can be applied to various types of liquid crystal display devices described in the above-mentioned “next-generation liquid crystal display technology”.

The image display device may have a white organic EL element. The white organic EL element preferably has a tandem structure. Regarding the tandem structure of the organic EL element, Japanese Patent Laid-Open No. 2003-45676, supervised by Akiyoshi Mikami, "Forefront of Organic EL Technology Development-High Brightness, High Precision, Long Life, Know-how", Technical Information Institute, Pp. 326-328, 2008, etc. The spectrum of white light emitted by the organic EL element preferably has a strong maximum emission peak in the blue region (430 nm-485 nm), the green region (530 nm-580 nm) and the yellow region (580 nm-620 nm). In addition to these emission peaks, those having a maximum emission peak in the red region (650 nm to 700 nm) are more preferable.

Hereinafter, the present invention will be described more specifically with reference to examples. The materials, usage amounts, ratios, processing contents, processing procedures, and the like shown in the following examples can be appropriately changed without departing from the spirit of the present invention. Therefore, the scope of the present invention is not limited to the specific examples shown below. In addition, "%" and "parts" are based on mass unless otherwise specified. In the following, propylene glycol monomethyl ether acetate will be referred to as PGMEA. Further, NMR is an abbreviation for nuclear magnetic resonance.

<Measurement of weight average molecular weight (Mw)>
The weight average molecular weight (Mw) was measured by the following method.
Column type: TSKgel Sup
er AWM-H (manufactured by Tosoh Corporation, 6.0 mm (inner diameter) x 15.0 cm)
Developing solvent: 10 mmol/L lithium bromide NMP (N-methylpyrrolidinone) solution column temperature: 40°C
Flow rate (sample injection volume): 10 μL
Device name: HLC-8220 (manufactured by Tosoh Corporation)
Calibration curve base resin: polystyrene

<Method of measuring viscosity>
The viscosity of the composition at 25° C. was measured using a B type viscometer.

樹脂１：下記構造（Ｍｗ＝１．５万、主鎖に付記した数値は、各構成単位のモル比である）

<Method for preparing composition>
(Composition 1)
45 parts by mass of Copper Complex 1 shown below, 49.95 parts by mass of Resin 1 shown below, 5 parts by mass of IRGACURE-OXE02 (manufactured by BASF), and tris(2,4-pentanedionato)aluminum. (III) (manufactured by Tokyo Chemical Industry Co., Ltd.) was mixed with 0.05 parts by mass and 100 parts by mass of cyclohexanone, and after stirring, a nylon filter having a pore diameter of 0.45 μm (manufactured by Nippon Pall Co., Ltd.) ), and the composition 1 was prepared. The viscosity of this composition at 25° C. was 150 mP·s.
Copper complex 1: structure below

Resin 1: the following structure (Mw=15,000, the numerical value attached to the main chain is the molar ratio of each structural unit)

(Composition 2)
Composition 2 was prepared in the same manner as composition 1 except that the same amount of copper complex 2 was used instead of copper complex 1. The viscosity of this composition at 25° C. was 150 mP·s.
Copper complex 2: structure below

(Composition 3)
A composition 3 was prepared in the same manner as the composition 1 except that the same amount of the copper complex 3 was used instead of the copper complex 1. The viscosity of this composition at 25° C. was 150 mP·s.
Copper complex 3: structure below

(Composition 4)
A composition 4 was prepared in the same manner as the composition 1 except that the same amount of the copper complex 4 was used instead of the copper complex 1. The viscosity of this composition at 25° C. was 150 mP·s.
Copper complex 4: A copper complex having the following compound as a ligand.

(Composition 5)
A composition 5 was prepared in the same manner as the composition 1 except that the same amount of the copper complex 5 was used instead of the copper complex 1. The viscosity of this composition at 25° C. was 150 mP·s.
Copper complex 5: A copper complex having the following compound as a ligand.

(Composition 6)
To an eggplant-shaped flask, 7.00 g (35.06 mmol) of copper acetate monohydrate and 140 g of methanol were added and stirred at 20° C. for 1 hour to obtain a solution (solution A). In a different container, 1.75 g of Prysurf A219B (manufactured by Dai-ichi Kogyo Seiyaku Co., Ltd.) and 4.82 g of n-butylphosphonic acid were dissolved in 100 g of methanol to obtain a solution (solution B). Solution B was added dropwise to solution A over 3 hours. The reaction solution was stirred at 20° C. for 10 hours. Then, the solvent was distilled off from the reaction solution by an evaporator (water bath 60° C.). To the solid content from which the solvent had been distilled off, 100 g of toluene was added, and the mixture was distilled off with an evaporator until a constant weight was reached and the smell of acetic acid disappeared. A yield of 8.75 g (100% yield) of a blue-green solid was obtained. Toluene 211g was added to this and ultrasonic irradiation was performed for 6 hours, and the n-butyl phosphonic acid copper salt toluene dispersion liquid (1) was obtained.
Next, 1.90 g of triethylene glycol bis(2-ethylhexanoate), 250 ml of toluene, and 5.00 g of polyvinyl butyral (PVB) were added to the flask. To this was added a solution of 4.8 mg of meso-erythritol in 1 ml of methanol. To this, 3.65 g (containing 0.583 mmol of copper salt) of the above n-butylphosphonic acid copper salt toluene dispersion liquid (1) was added, and the mixture was stirred at 20° C. for 10 hours and then sonicated for 1.5 hours to obtain PVB. Was uniformly dissolved to obtain a composition 6.

(Composition 7)
Resin 2 shown below is 8.04 parts by mass, compound SQ-23 shown below is 0.1 part by mass, and KAYARAD DPHA (manufactured by Nippon Kayaku Co., Ltd.) as a crosslinkable compound is 0.07 parts by mass. And 0.265 parts by mass of Megafac RS-72K (manufactured by DIC Corporation), 0.38 parts by mass of the following compound as a photopolymerization initiator, and 82.51 parts by mass of PGMEA as a solvent. Then, the mixture was stirred, and then filtered through a nylon filter (manufactured by Nippon Pall Co., Ltd.) having a pore size of 0.45 μm to prepare a composition 7. The viscosity of this composition at 25° C. was 4 mP·s.

化合物ＳＱ−２３：下記構造

光重合開始剤：下記構造

Resin 2: The following compound (Mw: 41000, the numerical value attached to the main chain is the molar ratio of each structural unit)

Compound SQ-23: the following structure

Photopolymerization initiator: structure below

(Composition 8)
A composition 8 was prepared in the same manner as the composition 7, except that the same amount of the following compound A-52 was used instead of the compound SQ-23. The viscosity of this composition at 25° C. was 4 mP·s.
Compound A-52: the following structure

(Composition 9)
0.5 mass parts of the following compound C-15 was dissolved in 69.5 mass parts of ion-exchanged water, 30.0 mass parts of a 10 mass% aqueous solution of gelatin was further added, and 1,3-divinylsulfonyl-as a hardening agent. Composition 9 was prepared by adding 0.3 parts by mass of 2-propanol and stirring the mixture. The viscosity of this composition at 25° C. was 10 mP·s.
Compound C-15: the following structure

(Composition 10)
A composition 10 was prepared in the same manner as the composition 9 except that the same amount of the following compound 31 was used instead of the compound C-15. The viscosity of this composition at 25° C. was 10 mP·s.
Compound 31: the following structure

(Composition 11)
A composition 11 was prepared in the same manner as the composition 7 except that the same amount of Acrycure-RD-F8 (manufactured by Nippon Shokubai Co., Ltd.) was used instead of the resin 2. The viscosity of this composition at 25° C. was 4 mP·s.

(Composition 12)
A composition 12 was prepared in the same manner as the composition 1 except that the same amount of Acrycure-RD-F8 (manufactured by Nippon Shokubai Co., Ltd.) was used instead of the resin 1. The viscosity of this composition at 25° C. was 4 mP·s.

(Composition 13)
A composition 13 was prepared in the same manner as the composition 5 except that the composition 5 was not filtered. The viscosity of this composition at 25° C. was 150 mP·s.

(Composition 14)
A composition 14 was prepared in the same manner as the composition 1 except that 5 parts by mass of methanol was added to the composition 1. The viscosity of this composition at 25° C. was 145 mP·s.

(Composition 15)
Composition 15 was prepared in the same manner as Composition 1 except that the amount of cyclohexanone in Composition 1 was changed to 66.6 parts by mass. The viscosity of this composition at 25° C. was 300 mP·s.

(Composition 16)
Composition 16 was prepared in the same manner as Composition 7 except that PGMEA was changed to 13 parts by mass. The viscosity of this composition at 25° C. was 16 mP·s.

(Composition 17)
Composition 17 was prepared in the same manner as Composition 16 except that the same amount of Compound A-52 was used instead of Compound SQ-23. The viscosity of this composition at 25° C. was 16 mP·s.

(Composition 18)
A composition 18 was prepared in the same manner as the composition 16 except that the same amount of Acrycure-RD-F8 (manufactured by Nippon Shokubai Co., Ltd.) was used instead of the resin 2. The viscosity of this composition at 25° C. was 16 mP·s.

<Dissolved oxygen amount adjustment method>
(Adjustment method 1)
Oxygen was bubbled through the prepared composition at a normal temperature (25° C.) under 1 atm (0.1 MPa) at a rate of 0.5 L/min to adjust the dissolved oxygen amount shown in the following table. In addition, the amount of dissolved oxygen described in the following table is a value in liquid at 25° C. at 0.1 MPa. The dissolved oxygen amount was calculated from the ratio of the oxygen partial pressure to that of the saturated dissolved oxygen solution using an Orbisphere 510 gas analyzer (manufactured by Hack Ultra Co., Ltd.).

(Adjustment method 2)
The adjusted composition was decompressed to 0.1 atm (0.01 MPa) with an aspirator to adjust the dissolved oxygen amount shown in the following table.

(Adjustment method 3)
The prepared composition was irradiated with ultrasonic waves at 25° C. to adjust the dissolved oxygen amount shown in the following table.

<Manufacture of near infrared cut filter>
(Production Example 1) Method for producing near-infrared cut filter using compositions 1 to 7 and 12 to 15 Each composition having the dissolved oxygen content adjusted in the following table was dried to a film thickness of 100 μm on a glass wafer. As such, a spin coater was applied thereto, and a hot plate at 160° C. was used for heat treatment for 1.5 hours to produce a near infrared cut filter.

<Manufacture of near infrared cut filter>
(Production Example 2) Method for producing near-infrared cut filter using compositions 8 to 11 and 16 to 18 Each composition having dissolved oxygen content adjusted in the following table was applied using a spin coater to form a coating film. Then, after preheating (prebaking) at 100° C. for 120 seconds, the entire surface was exposed at 1000 mJ/cm ² using an i-line stepper. Then, after-heating (post-baking) was performed at 220° C. for 300 seconds to manufacture a near-infrared cut filter having a film thickness of 0.8 μm.

<Evaluation of defects>
The 7.5×7.5 cm range of the near-infrared cut filter was observed with a magnifying glass (magnification: 15 times) to evaluate the presence or absence of bubbles. The case where no bubbles were observed was A, the case of 1 to 3 bubbles was B, and the case of 4 or more bubbles was C.

<Evaluation of liquid stability>
Each composition adjusted to the amount of dissolved oxygen shown in the following table was heated at 45° C. for 3 days, and liquid stability was evaluated by the ratio of viscosity before heating and after heating. The case where the viscosity variation is less than 1% is A, the case where the viscosity variation is 1% or more and less than 5% is B, and the case where the viscosity variation is 5% or more is C.

From the above results, the example was excellent in liquid stability. Further, the near infrared cut filter of the example had few defects. On the other hand, the near infrared cut filter of the comparative example had many defects.

10 camera module, 11 solid-state imaging device, 12 flattening layer, 13 near-infrared cut filter, 14 imaging lens, 15 lens holder, 16 silicon substrate, 17 color filter, 18 microlens, 19 ultraviolet/infrared reflecting film, 20 Transparent substrate, 21 near infrared absorption layer, 22 antireflection layer

Claims (24)

A composition containing a copper compound, a pyrrolopyrrole compound, a squarylium compound, a cyanine compound, a phthalocyanine compound and at least one infrared absorber selected from a naphthalocyanine compound, a solvent, and a compound having a crosslinkable group,
The amount of dissolved oxygen in the liquid at 25° C. at 0.1 MPa is 0.1 to 50 mg/L,
The compound having a crosslinkable group is seen containing a compound having a partial structure represented by M-X,
A composition in which the solid content concentration of the composition is 40% by mass or more ;
However, M is an atom selected from Si, Ti, and Zr, and X is a hydroxy group, an alkoxy group, an acyloxy group, a phosphoryloxy group, a sulfonyloxy group, an amino group, an oxime group, and O=C(R ^a )(R ^b ), R ^a and R ^b each independently represent a monovalent organic group, and when X is O═C(R ^a )(R ^b ), It is bonded to M by an unshared electron pair of the oxygen atom of the carbonyl group. The composition according to claim 1, wherein the M is Si and the X is an alkoxy group. The composition according to claim 2, wherein the alkoxy group has 1 to 2 carbon atoms. The composition according to any one of claims 1 to 3, wherein the amount of dissolved gas in the liquid at 25°C at 0.1 MPa is 0.1 to 50 mg/L. The composition according to any one of claims 1 to 3, wherein the amount of dissolved oxygen in the liquid at 25°C at 0.1 MPa is 1 to 10 mg/L. The infrared absorbing agent is a copper compound, composition according to any one of claims 1-5. Solid concentration is 45 wt% or more, the composition according to any one of claims 1-6. The viscosity at 25 ° C., is 0.05 to 10 Pa · s, the composition according to any one of claims 1-7. The composition according to any one of claims 1 to 7, which has a viscosity at 25°C of 0.1 to 0.5 Pa·s. The content of the compound having a crosslinkable group is 15 mass% or more of total solids of said composition according to any one of claims 1-9. The content of the infrared absorber, based on the total solid content of the composition, from 10 to 80 wt%, the composition according to any one of claims 1-10. The composition contains two or more kinds of solvents, and the difference between the boiling point of the solvent having the highest boiling point and the boiling point of the solvent having the lowest boiling point is 70° C. or more among the two or more kinds of solvents. The composition according to any one of 1 to 11. The composition comprises two or more kinds of solvents, and the two or more kinds of solvents include a solvent having a boiling point of 120° C. or higher and a solvent having a boiling point of 100° C. or lower. The composition as described. A method of manufacturing a composition according to any one of claim 1 to 13
Defoaming the composition A containing at least one infrared absorber selected from a copper compound, a pyrrolopyrrole compound, a squarylium compound, a cyanine compound, a phthalocyanine compound and a naphthalocyanine compound, a solvent, and a compound having a crosslinkable group. Including processing steps,
The method for producing a composition, wherein the compound having a crosslinkable group includes a compound having a partial structure represented by MX.
However, M is an atom selected from Si, Ti, and Zr, and X is a hydroxy group, an alkoxy group, an acyloxy group, a phosphoryloxy group, a sulfonyloxy group, an amino group, an oxime group, and O=C(R ^a )(R ^b ), R ^a and R ^b each independently represent a monovalent organic group, and when X is O═C(R ^a )(R ^b ), It is bonded to M by an unshared electron pair of the oxygen atom of the carbonyl group. The composition A contains two or more kinds of solvents, and the difference between the boiling point of the solvent having the highest boiling point and the boiling point of the solvent having the lowest boiling point is 10° C. or more among the two or more kinds of solvents. 15. The method for producing the composition according to 14 . 25 at 0.1 MPa, containing at least one infrared absorbing agent selected from a copper compound, a pyrrolopyrrole compound, a squarylium compound, a cyanine compound, a phthalocyanine compound and a naphthalocyanine compound, a solvent, and a compound having a crosslinkable group. A method for producing a composition containing a compound having a partial structure represented by MX, wherein the amount of dissolved oxygen in the liquid at 0°C is 0.1 to 50 mg/L, and the compound having a crosslinkable group is ,
Defoaming the composition A containing at least one infrared absorber selected from a copper compound, a pyrrolopyrrole compound, a squarylium compound, a cyanine compound, a phthalocyanine compound and a naphthalocyanine compound, a solvent, and a compound having a crosslinkable group. Including processing steps,
The compound having a crosslinkable group includes a compound having a partial structure represented by MX.
The composition A contains two or more kinds of solvents, and the difference between the boiling point of the solvent having the highest boiling point and the boiling point of the solvent having the lowest boiling point is 70° C. or more among the two or more kinds of solvents.
A method for producing the composition;
However, M is an atom selected from Si, Ti and Zr, and X is a hydroxy group, an alkoxy group, an acyloxy group, a phosphoryloxy group, a sulfonyloxy group, an amino group, an oxime group and O=C(R ^a ) (R ^b ), and R ^a And R ^b Each independently represents a monovalent organic group, and X is O=C(R ^a ) (R ^b ), it is bonded to M by an unshared electron pair of the oxygen atom of the carbonyl group. 25 at 0.1 MPa, containing at least one infrared absorbing agent selected from a copper compound, a pyrrolopyrrole compound, a squarylium compound, a cyanine compound, a phthalocyanine compound and a naphthalocyanine compound, a solvent, and a compound having a crosslinkable group. A method for producing a composition containing a compound having a partial structure represented by MX, wherein the amount of dissolved oxygen in the liquid at 0°C is 0.1 to 50 mg/L, and the compound having a crosslinkable group is ,
Defoaming the composition A containing at least one infrared absorber selected from a copper compound, a pyrrolopyrrole compound, a squarylium compound, a cyanine compound, a phthalocyanine compound and a naphthalocyanine compound, a solvent, and a compound having a crosslinkable group. Including processing steps,
The compound having a crosslinkable group includes a compound having a partial structure represented by MX.
The composition A contains a solvent having a boiling point of 120° C. or higher and a solvent having a boiling point of 100° C. or lower,
A method for producing the composition;
However, M is an atom selected from Si, Ti and Zr, and X is a hydroxy group, an alkoxy group, an acyloxy group, a phosphoryloxy group, a sulfonyloxy group, an amino group, an oxime group and O=C(R ^a ) (R ^b ), and R ^a And R ^b Each independently represents a monovalent organic group, and X is O=C(R ^a ) (R ^b ), it is bonded to M by an unshared electron pair of the oxygen atom of the carbonyl group. The method for producing the composition according to any one of claims 14 to 17 , wherein the defoaming treatment is performed by at least one method selected from ultrasonic irradiation and reduced pressure. The method for producing the composition according to claim 14 , wherein the defoaming treatment is performed after the composition A is filtered. Film made from the composition according to any one of claims 1 to 13. Near infrared cut filter formed by using the composition according to any one of claims 1 to 13. A solid-state image sensor having the near-infrared cut filter according to claim 21 . A camera module having the near infrared cut filter according to claim 21 . An image display device comprising the near-infrared cut filter according to claim 21 .

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