JP6677255B2 - Method for producing halogenated acrylate derivative - Google Patents
Method for producing halogenated acrylate derivative Download PDFInfo
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- JP6677255B2 JP6677255B2 JP2017536454A JP2017536454A JP6677255B2 JP 6677255 B2 JP6677255 B2 JP 6677255B2 JP 2017536454 A JP2017536454 A JP 2017536454A JP 2017536454 A JP2017536454 A JP 2017536454A JP 6677255 B2 JP6677255 B2 JP 6677255B2
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- 238000004519 manufacturing process Methods 0.000 title claims description 62
- 150000001252 acrylic acid derivatives Chemical class 0.000 title claims description 38
- 238000006243 chemical reaction Methods 0.000 claims description 101
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical class C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims description 52
- 125000001424 substituent group Chemical group 0.000 claims description 51
- -1 alkali metal alkoxide Chemical class 0.000 claims description 41
- 239000003054 catalyst Substances 0.000 claims description 39
- 150000001875 compounds Chemical class 0.000 claims description 37
- 125000000217 alkyl group Chemical group 0.000 claims description 36
- 239000011949 solid catalyst Substances 0.000 claims description 36
- 238000000034 method Methods 0.000 claims description 29
- 125000003118 aryl group Chemical group 0.000 claims description 28
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 24
- 150000007514 bases Chemical class 0.000 claims description 23
- 229910052799 carbon Inorganic materials 0.000 claims description 21
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 21
- 238000006116 polymerization reaction Methods 0.000 claims description 20
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 18
- 239000007789 gas Substances 0.000 claims description 18
- 239000003444 phase transfer catalyst Substances 0.000 claims description 18
- QQONPFPTGQHPMA-UHFFFAOYSA-N Propene Chemical class CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 claims description 16
- 229910052731 fluorine Inorganic materials 0.000 claims description 16
- 239000012071 phase Substances 0.000 claims description 16
- 229910044991 metal oxide Inorganic materials 0.000 claims description 15
- 150000004706 metal oxides Chemical class 0.000 claims description 15
- 125000001153 fluoro group Chemical group F* 0.000 claims description 14
- 239000003112 inhibitor Substances 0.000 claims description 14
- 239000010457 zeolite Substances 0.000 claims description 14
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 12
- 238000009835 boiling Methods 0.000 claims description 11
- 229910052801 chlorine Inorganic materials 0.000 claims description 11
- 150000001721 carbon Chemical group 0.000 claims description 10
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 10
- FJTRNRFAIZEJJJ-UHFFFAOYSA-N 1,1-dimethoxyethene Chemical compound COC(=C)OC FJTRNRFAIZEJJJ-UHFFFAOYSA-N 0.000 claims description 9
- 239000012159 carrier gas Substances 0.000 claims description 9
- 239000011787 zinc oxide Substances 0.000 claims description 9
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 8
- 239000007791 liquid phase Substances 0.000 claims description 8
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 8
- 229910052783 alkali metal Inorganic materials 0.000 claims description 6
- 125000001559 cyclopropyl group Chemical class [H]C1([H])C([H])([H])C1([H])* 0.000 claims description 6
- 229910021536 Zeolite Inorganic materials 0.000 claims description 5
- 230000002378 acidificating effect Effects 0.000 claims description 5
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 claims description 5
- 150000003242 quaternary ammonium salts Chemical group 0.000 claims description 5
- 150000008044 alkali metal hydroxides Chemical class 0.000 claims description 4
- 239000006229 carbon black Substances 0.000 claims description 4
- 125000005843 halogen group Chemical group 0.000 claims description 4
- 229910052500 inorganic mineral Inorganic materials 0.000 claims description 4
- 229910001463 metal phosphate Inorganic materials 0.000 claims description 4
- 239000011707 mineral Substances 0.000 claims description 4
- 239000002808 molecular sieve Substances 0.000 claims description 4
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 claims description 4
- 229910000102 alkali metal hydride Inorganic materials 0.000 claims description 3
- 150000008046 alkali metal hydrides Chemical class 0.000 claims description 3
- 229910001510 metal chloride Inorganic materials 0.000 claims description 3
- 229910001512 metal fluoride Inorganic materials 0.000 claims description 3
- 229910052976 metal sulfide Inorganic materials 0.000 claims description 3
- 150000003467 sulfuric acid derivatives Chemical class 0.000 claims description 3
- 229910052744 lithium Inorganic materials 0.000 claims description 2
- 150000002148 esters Chemical class 0.000 description 48
- 150000001942 cyclopropanes Chemical class 0.000 description 34
- 239000002253 acid Substances 0.000 description 28
- 239000002904 solvent Substances 0.000 description 27
- 125000004432 carbon atom Chemical group C* 0.000 description 22
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical class C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 22
- 238000004821 distillation Methods 0.000 description 19
- 238000000746 purification Methods 0.000 description 15
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 14
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 14
- 238000005160 1H NMR spectroscopy Methods 0.000 description 13
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 13
- 125000003342 alkenyl group Chemical group 0.000 description 12
- 125000000623 heterocyclic group Chemical group 0.000 description 12
- 239000007788 liquid Substances 0.000 description 12
- 125000000392 cycloalkenyl group Chemical group 0.000 description 11
- 239000002994 raw material Substances 0.000 description 11
- 125000003545 alkoxy group Chemical group 0.000 description 10
- 125000000304 alkynyl group Chemical group 0.000 description 10
- 125000001072 heteroaryl group Chemical group 0.000 description 10
- 239000000543 intermediate Substances 0.000 description 9
- 125000004104 aryloxy group Chemical group 0.000 description 8
- 239000006227 byproduct Substances 0.000 description 8
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 8
- UMNKXPULIDJLSU-UHFFFAOYSA-N dichlorofluoromethane Chemical compound FC(Cl)Cl UMNKXPULIDJLSU-UHFFFAOYSA-N 0.000 description 8
- 229940099364 dichlorofluoromethane Drugs 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- 150000002430 hydrocarbons Chemical group 0.000 description 8
- 239000012044 organic layer Substances 0.000 description 8
- 229920000642 polymer Polymers 0.000 description 8
- 239000000047 product Substances 0.000 description 8
- 239000011973 solid acid Substances 0.000 description 8
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 7
- 125000004414 alkyl thio group Chemical group 0.000 description 7
- 235000010354 butylated hydroxytoluene Nutrition 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 238000005481 NMR spectroscopy Methods 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 125000003277 amino group Chemical group 0.000 description 6
- 238000000354 decomposition reaction Methods 0.000 description 6
- 230000007423 decrease Effects 0.000 description 6
- 125000004663 dialkyl amino group Chemical group 0.000 description 6
- 125000004986 diarylamino group Chemical group 0.000 description 6
- 239000010410 layer Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- JEHWQBPIOCHEKO-UHFFFAOYSA-N 1-chloro-1-fluoro-2,2-dimethoxycyclopropane Chemical compound ClC1(C(C1)(OC)OC)F JEHWQBPIOCHEKO-UHFFFAOYSA-N 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 239000003814 drug Substances 0.000 description 5
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 5
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 5
- 238000010813 internal standard method Methods 0.000 description 5
- 238000011002 quantification Methods 0.000 description 5
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 5
- 238000005292 vacuum distillation Methods 0.000 description 5
- VOPWNXZWBYDODV-UHFFFAOYSA-N Chlorodifluoromethane Chemical compound FC(F)Cl VOPWNXZWBYDODV-UHFFFAOYSA-N 0.000 description 4
- XPDWGBQVDMORPB-UHFFFAOYSA-N Fluoroform Chemical compound FC(F)F XPDWGBQVDMORPB-UHFFFAOYSA-N 0.000 description 4
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 4
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 4
- CREMABGTGYGIQB-UHFFFAOYSA-N carbon carbon Chemical compound C.C CREMABGTGYGIQB-UHFFFAOYSA-N 0.000 description 4
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 4
- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical compound CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 4
- 125000005842 heteroatom Chemical group 0.000 description 4
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- BKIMMITUMNQMOS-UHFFFAOYSA-N nonane Chemical compound CCCCCCCCC BKIMMITUMNQMOS-UHFFFAOYSA-N 0.000 description 4
- 125000004430 oxygen atom Chemical group O* 0.000 description 4
- LPNYRYFBWFDTMA-UHFFFAOYSA-N potassium tert-butoxide Chemical compound [K+].CC(C)(C)[O-] LPNYRYFBWFDTMA-UHFFFAOYSA-N 0.000 description 4
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 4
- BGHCVCJVXZWKCC-UHFFFAOYSA-N tetradecane Chemical compound CCCCCCCCCCCCCC BGHCVCJVXZWKCC-UHFFFAOYSA-N 0.000 description 4
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 4
- IIYFAKIEWZDVMP-UHFFFAOYSA-N tridecane Chemical compound CCCCCCCCCCCCC IIYFAKIEWZDVMP-UHFFFAOYSA-N 0.000 description 4
- RSJKGSCJYJTIGS-UHFFFAOYSA-N undecane Chemical compound CCCCCCCCCCC RSJKGSCJYJTIGS-UHFFFAOYSA-N 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- VTGIVYVOVVQLRL-UHFFFAOYSA-N 1,1-diethoxyethene Chemical compound CCOC(=C)OCC VTGIVYVOVVQLRL-UHFFFAOYSA-N 0.000 description 3
- PBKONEOXTCPAFI-UHFFFAOYSA-N 1,2,4-trichlorobenzene Chemical compound ClC1=CC=C(Cl)C(Cl)=C1 PBKONEOXTCPAFI-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 3
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 238000002425 crystallisation Methods 0.000 description 3
- 230000008025 crystallization Effects 0.000 description 3
- 229940079593 drug Drugs 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 238000000605 extraction Methods 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 239000000395 magnesium oxide Substances 0.000 description 3
- HZVOZRGWRWCICA-UHFFFAOYSA-N methanediyl Chemical compound [CH2] HZVOZRGWRWCICA-UHFFFAOYSA-N 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000012074 organic phase Substances 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 229930195734 saturated hydrocarbon Natural products 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- NHGXDBSUJJNIRV-UHFFFAOYSA-M tetrabutylammonium chloride Chemical class [Cl-].CCCC[N+](CCCC)(CCCC)CCCC NHGXDBSUJJNIRV-UHFFFAOYSA-M 0.000 description 3
- HDPNBNXLBDFELL-UHFFFAOYSA-N 1,1,1-trimethoxyethane Chemical group COC(C)(OC)OC HDPNBNXLBDFELL-UHFFFAOYSA-N 0.000 description 2
- DDCYKQUZWJBETF-UHFFFAOYSA-N 1,1-difluoro-2,2-dimethoxycyclopropane Chemical compound FC1(CC1(OC)OC)F DDCYKQUZWJBETF-UHFFFAOYSA-N 0.000 description 2
- RELMFMZEBKVZJC-UHFFFAOYSA-N 1,2,3-trichlorobenzene Chemical compound ClC1=CC=CC(Cl)=C1Cl RELMFMZEBKVZJC-UHFFFAOYSA-N 0.000 description 2
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 2
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 2
- JJAPPFMZOVZUPJ-UHFFFAOYSA-N 2-fluoro-3,3,3-trimethoxyprop-1-ene Chemical compound FC(=C)C(OC)(OC)OC JJAPPFMZOVZUPJ-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 125000005396 acrylic acid ester group Chemical group 0.000 description 2
- 238000005273 aeration Methods 0.000 description 2
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 239000008346 aqueous phase Substances 0.000 description 2
- GGNQRNBDZQJCCN-UHFFFAOYSA-N benzene-1,2,4-triol Chemical compound OC1=CC=C(O)C(O)=C1 GGNQRNBDZQJCCN-UHFFFAOYSA-N 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- KYKAJFCTULSVSH-UHFFFAOYSA-N chloro(fluoro)methane Chemical compound F[C]Cl KYKAJFCTULSVSH-UHFFFAOYSA-N 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 150000001924 cycloalkanes Chemical class 0.000 description 2
- 229940117389 dichlorobenzene Drugs 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004817 gas chromatography Methods 0.000 description 2
- 238000010574 gas phase reaction Methods 0.000 description 2
- 239000007792 gaseous phase Substances 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 150000001247 metal acetylides Chemical class 0.000 description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 description 2
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 229950000688 phenothiazine Drugs 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 125000003367 polycyclic group Chemical group 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 238000007086 side reaction Methods 0.000 description 2
- 125000003003 spiro group Chemical group 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 125000004434 sulfur atom Chemical group 0.000 description 2
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- 125000004973 1-butenyl group Chemical group C(=CCC)* 0.000 description 1
- 125000004972 1-butynyl group Chemical group [H]C([H])([H])C([H])([H])C#C* 0.000 description 1
- PCGBMCITRPJLJZ-UHFFFAOYSA-N 1-chloro-2,2-diethoxy-1-fluorocyclopropane Chemical compound CCOC1(OCC)CC1(F)Cl PCGBMCITRPJLJZ-UHFFFAOYSA-N 0.000 description 1
- 125000006039 1-hexenyl group Chemical group 0.000 description 1
- 125000006019 1-methyl-1-propenyl group Chemical group 0.000 description 1
- 125000006021 1-methyl-2-propenyl group Chemical group 0.000 description 1
- 125000006023 1-pentenyl group Chemical group 0.000 description 1
- 125000006017 1-propenyl group Chemical group 0.000 description 1
- 125000000530 1-propynyl group Chemical group [H]C([H])([H])C#C* 0.000 description 1
- IRPGOXJVTQTAAN-UHFFFAOYSA-N 2,2,3,3,3-pentafluoropropanal Chemical compound FC(F)(F)C(F)(F)C=O IRPGOXJVTQTAAN-UHFFFAOYSA-N 0.000 description 1
- VUZNLSBZRVZGIK-UHFFFAOYSA-N 2,2,6,6-Tetramethyl-1-piperidinol Chemical group CC1(C)CCCC(C)(C)N1O VUZNLSBZRVZGIK-UHFFFAOYSA-N 0.000 description 1
- JZODKRWQWUWGCD-UHFFFAOYSA-N 2,5-di-tert-butylbenzene-1,4-diol Chemical compound CC(C)(C)C1=CC(O)=C(C(C)(C)C)C=C1O JZODKRWQWUWGCD-UHFFFAOYSA-N 0.000 description 1
- LILXDMFJXYAKMK-UHFFFAOYSA-N 2-bromo-1,1-diethoxyethane Chemical compound CCOC(CBr)OCC LILXDMFJXYAKMK-UHFFFAOYSA-N 0.000 description 1
- 125000004974 2-butenyl group Chemical group C(C=CC)* 0.000 description 1
- 125000000069 2-butynyl group Chemical group [H]C([H])([H])C#CC([H])([H])* 0.000 description 1
- SVYXLQRWNWOHSJ-UHFFFAOYSA-N 2-fluoro-3-hydroxypropanoic acid Chemical compound OCC(F)C(O)=O SVYXLQRWNWOHSJ-UHFFFAOYSA-N 0.000 description 1
- 125000006020 2-methyl-1-propenyl group Chemical group 0.000 description 1
- 125000006022 2-methyl-2-propenyl group Chemical group 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 description 1
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 1
- 125000004975 3-butenyl group Chemical group C(CC=C)* 0.000 description 1
- 125000000474 3-butynyl group Chemical group [H]C#CC([H])([H])C([H])([H])* 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- KLZUFWVZNOTSEM-UHFFFAOYSA-K Aluminum fluoride Inorganic materials F[Al](F)F KLZUFWVZNOTSEM-UHFFFAOYSA-K 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical class C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- BWGNESOTFCXPMA-UHFFFAOYSA-N Dihydrogen disulfide Chemical compound SS BWGNESOTFCXPMA-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical class CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- BGNXCDMCOKJUMV-UHFFFAOYSA-N Tert-Butylhydroquinone Chemical compound CC(C)(C)C1=CC(O)=CC=C1O BGNXCDMCOKJUMV-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000005083 Zinc sulfide Substances 0.000 description 1
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 description 1
- XXWNWOGCTPGCCR-UHFFFAOYSA-N [O-2].[Zn+2].[O-2].[Zr+4] Chemical compound [O-2].[Zn+2].[O-2].[Zr+4] XXWNWOGCTPGCCR-UHFFFAOYSA-N 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 229910000288 alkali metal carbonate Inorganic materials 0.000 description 1
- 150000008041 alkali metal carbonates Chemical class 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 229910003481 amorphous carbon Inorganic materials 0.000 description 1
- 125000002490 anilino group Chemical group [H]N(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- BKNBVEKCHVXGPH-UHFFFAOYSA-N anthracene-1,4,9,10-tetrol Chemical compound C1=CC=C2C(O)=C3C(O)=CC=C(O)C3=C(O)C2=C1 BKNBVEKCHVXGPH-UHFFFAOYSA-N 0.000 description 1
- 125000002178 anthracenyl group Chemical group C1(=CC=CC2=CC3=CC=CC=C3C=C12)* 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 125000003725 azepanyl group Chemical group 0.000 description 1
- 239000000440 bentonite Substances 0.000 description 1
- 229910000278 bentonite Inorganic materials 0.000 description 1
- SVPXDRXYRYOSEX-UHFFFAOYSA-N bentoquatam Chemical compound O.O=[Si]=O.O=[Al]O[Al]=O SVPXDRXYRYOSEX-UHFFFAOYSA-N 0.000 description 1
- FWLORMQUOWCQPO-UHFFFAOYSA-N benzyl-dimethyl-octadecylazanium Chemical class CCCCCCCCCCCCCCCCCC[N+](C)(C)CC1=CC=CC=C1 FWLORMQUOWCQPO-UHFFFAOYSA-N 0.000 description 1
- 125000002619 bicyclic group Chemical group 0.000 description 1
- 150000001639 boron compounds Chemical class 0.000 description 1
- 229910052810 boron oxide Inorganic materials 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 229910001634 calcium fluoride Inorganic materials 0.000 description 1
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 229910000428 cobalt oxide Inorganic materials 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- 150000003983 crown ethers Chemical class 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000001316 cycloalkyl alkyl group Chemical group 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 150000001934 cyclohexanes Chemical group 0.000 description 1
- 125000000596 cyclohexenyl group Chemical group C1(=CCCCC1)* 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- GUJOJGAPFQRJSV-UHFFFAOYSA-N dialuminum;dioxosilane;oxygen(2-);hydrate Chemical compound O.[O-2].[O-2].[O-2].[Al+3].[Al+3].O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O GUJOJGAPFQRJSV-UHFFFAOYSA-N 0.000 description 1
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- ZPWVASYFFYYZEW-UHFFFAOYSA-L dipotassium hydrogen phosphate Chemical compound [K+].[K+].OP([O-])([O-])=O ZPWVASYFFYYZEW-UHFFFAOYSA-L 0.000 description 1
- 235000019797 dipotassium phosphate Nutrition 0.000 description 1
- 229910000396 dipotassium phosphate Inorganic materials 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 description 1
- 229910000397 disodium phosphate Inorganic materials 0.000 description 1
- 235000019800 disodium phosphate Nutrition 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 229910052675 erionite Inorganic materials 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000000031 ethylamino group Chemical group [H]C([H])([H])C([H])([H])N([H])[*] 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 229910001657 ferrierite group Inorganic materials 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- ZYMKZMDQUPCXRP-UHFFFAOYSA-N fluoro prop-2-enoate Chemical compound FOC(=O)C=C ZYMKZMDQUPCXRP-UHFFFAOYSA-N 0.000 description 1
- 238000004508 fractional distillation Methods 0.000 description 1
- 229910003472 fullerene Inorganic materials 0.000 description 1
- 229920001002 functional polymer Polymers 0.000 description 1
- 125000002541 furyl group Chemical group 0.000 description 1
- 238000002309 gasification Methods 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 125000005980 hexynyl group Chemical group 0.000 description 1
- 229910000042 hydrogen bromide Inorganic materials 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 125000001041 indolyl group Chemical group 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000012442 inert solvent Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910000358 iron sulfate Inorganic materials 0.000 description 1
- BAUYGSIQEAFULO-UHFFFAOYSA-L iron(2+) sulfate (anhydrous) Chemical compound [Fe+2].[O-]S([O-])(=O)=O BAUYGSIQEAFULO-UHFFFAOYSA-L 0.000 description 1
- 125000002510 isobutoxy group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])O* 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000004491 isohexyl group Chemical group C(CCC(C)C)* 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 229910052622 kaolinite Inorganic materials 0.000 description 1
- 125000000040 m-tolyl group Chemical group [H]C1=C([H])C(*)=C([H])C(=C1[H])C([H])([H])[H] 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 229910052987 metal hydride Inorganic materials 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- ZTZJVAOTIOAZGZ-UHFFFAOYSA-N methyl 2-fluoroacrylate Chemical compound COC(=O)C(F)=C ZTZJVAOTIOAZGZ-UHFFFAOYSA-N 0.000 description 1
- 125000000250 methylamino group Chemical group [H]N(*)C([H])([H])[H] 0.000 description 1
- ZUZLIXGTXQBUDC-UHFFFAOYSA-N methyltrioctylammonium Chemical class CCCCCCCC[N+](C)(CCCCCCCC)CCCCCCCC ZUZLIXGTXQBUDC-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910000476 molybdenum oxide Inorganic materials 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229910052901 montmorillonite Inorganic materials 0.000 description 1
- 229910052680 mordenite Inorganic materials 0.000 description 1
- 125000002757 morpholinyl group Chemical group 0.000 description 1
- 125000006606 n-butoxy group Chemical group 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001298 n-hexoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000003935 n-pentoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003506 n-propoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 125000004888 n-propyl amino group Chemical group [H]N(*)C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000005244 neohexyl group Chemical group [H]C([H])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- 125000003261 o-tolyl group Chemical group [H]C1=C([H])C(*)=C(C([H])=C1[H])C([H])([H])[H] 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 125000002971 oxazolyl group Chemical group 0.000 description 1
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 125000003538 pentan-3-yl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 125000001792 phenanthrenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C=CC12)* 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 125000004193 piperazinyl group Chemical group 0.000 description 1
- 125000003386 piperidinyl group Chemical group 0.000 description 1
- 229960005235 piperonyl butoxide Drugs 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 229910000160 potassium phosphate Inorganic materials 0.000 description 1
- 235000011009 potassium phosphates Nutrition 0.000 description 1
- ZLMJMSJWJFRBEC-OUBTZVSYSA-N potassium-40 Chemical compound [40K] ZLMJMSJWJFRBEC-OUBTZVSYSA-N 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 125000003373 pyrazinyl group Chemical group 0.000 description 1
- 125000003226 pyrazolyl group Chemical group 0.000 description 1
- 125000002098 pyridazinyl group Chemical group 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 125000000714 pyrimidinyl group Chemical group 0.000 description 1
- 125000000719 pyrrolidinyl group Chemical group 0.000 description 1
- 125000000168 pyrrolyl group Chemical group 0.000 description 1
- 125000005493 quinolyl group Chemical group 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000000066 reactive distillation Methods 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 125000005920 sec-butoxy group Chemical group 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 1
- 239000012312 sodium hydride Substances 0.000 description 1
- 229910000104 sodium hydride Inorganic materials 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 235000011008 sodium phosphates Nutrition 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 125000005346 substituted cycloalkyl group Chemical group 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 239000004250 tert-Butylhydroquinone Substances 0.000 description 1
- 125000004213 tert-butoxy group Chemical group [H]C([H])([H])C(O*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 235000019281 tert-butylhydroquinone Nutrition 0.000 description 1
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- UGNWTBMOAKPKBL-UHFFFAOYSA-N tetrachloro-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(Cl)=C(Cl)C1=O UGNWTBMOAKPKBL-UHFFFAOYSA-N 0.000 description 1
- 125000003718 tetrahydrofuranyl group Chemical group 0.000 description 1
- 125000000335 thiazolyl group Chemical group 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 125000001425 triazolyl group Chemical group 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 229910001935 vanadium oxide Inorganic materials 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- LRXTYHSAJDENHV-UHFFFAOYSA-H zinc phosphate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LRXTYHSAJDENHV-UHFFFAOYSA-H 0.000 description 1
- 229910000165 zinc phosphate Inorganic materials 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C41/00—Preparation of ethers; Preparation of compounds having groups, groups or groups
- C07C41/48—Preparation of compounds having groups
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C43/00—Ethers; Compounds having groups, groups or groups
- C07C43/30—Compounds having groups
- C07C43/303—Compounds having groups having acetal carbon atoms bound to acyclic carbon atoms
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C43/00—Ethers; Compounds having groups, groups or groups
- C07C43/32—Compounds having groups or groups
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C67/00—Preparation of carboxylic acid esters
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C67/00—Preparation of carboxylic acid esters
- C07C67/27—Preparation of carboxylic acid esters from ortho-esters
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/62—Halogen-containing esters
- C07C69/65—Halogen-containing esters of unsaturated acids
- C07C69/653—Acrylic acid esters; Methacrylic acid esters; Haloacrylic acid esters; Halomethacrylic acid esters
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
- C07B61/00—Other general methods
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C41/00—Preparation of ethers; Preparation of compounds having groups, groups or groups
- C07C41/60—Preparation of compounds having groups or groups
Description
本発明は、ハロゲン化アクリル酸エステル誘導体の新規な製造方法に関する。 The present invention relates to a novel method for producing a halogenated acrylate derivative.
ハロゲン化アクリル酸エステル誘導体を代表するα−フルオロアクリル酸エステルは、医薬、ポリマー、光学材料、塗料、半導体レジスト材料等の合成中間体として、或いは機能性高分子の単量体として有用である。
α−フルオロアクリル酸エステルの製造方法としては、塩化チオニルを用いて3−ヒドロキシ−2−フルオロプロピオン酸エステルを3−クロロ−2−フルオロプロピオン酸エステルに変換し、これから塩化水素を脱離して2−フルオロアクリル酸エステルとする方法(特許文献1)が知られている。
特許文献2には、カリウムt−ブトキシドと大過剰のクロロフルオロカーボンを用いてエチレン誘導体をシクロプロパン誘導体に導き、これを分解してα−フルオロアクリル酸エチルエステルを製造する方法が開示されている。
特許文献2で使用するエチレン誘導体の合成方法としては、1,1−ジエトキシ−2−ブロモエタンにカリウムt−ブトキシドを作用させ、臭化水素酸を脱離させて、1,1−ジエトキシエテンを得る方法が知られている(非特許文献1)。Α-Fluoroacrylates representing halogenated acrylate derivatives are useful as synthetic intermediates for drugs, polymers, optical materials, paints, semiconductor resist materials and the like, or as monomers of functional polymers.
As a method for producing an α-fluoroacrylic acid ester, 3-hydroxy-2-fluoropropionic acid ester is converted to 3-chloro-2-fluoropropionic acid ester using thionyl chloride, and hydrogen chloride is eliminated therefrom to remove 2-hydroxy-2-fluoropropionic acid ester. A method for producing a fluoroacrylate (Patent Document 1) is known.
Patent Document 2 discloses a method for producing an ethyl derivative of α-fluoroacrylic acid by deriving an ethylene derivative into a cyclopropane derivative using potassium t-butoxide and a large excess of chlorofluorocarbon, and decomposing the derivative.
As a method for synthesizing an ethylene derivative used in Patent Document 2, potassium 1,2-butoxide is allowed to act on 1,1-diethoxy-2-bromoethane, and hydrobromic acid is eliminated to form 1,1-diethoxyethene. A method for obtaining the same is known (Non-Patent Document 1).
特許文献1の方法は、塩化チオニルを用いる必要がある点、腐蝕性の高い塩化水素が発生する点で、工業経済的に不利である。また、原料の3−ヒドロキシ−2−フルオロプロピオン酸エステルの調製に取り扱いの難しいF2(フッ素ガス)を使用する点でも、工業経済的に不利である。
特許文献2の方法も、高価なカリウムt−ブトキシドと大過剰のクロロフルオロカーボンを用いるため、工業経済的に不利である。また、その原料となるエチレン誘導体(1,1−ジエトキシエテン等)の製造方法も限られている。たとえば、非特許文献1の方法は、高価なカリウムt−ブトキシドを用いる必要がある点、腐蝕性の高い臭化水素が発生する点で、工業経済的なエチレン誘導体の製造とはなり得ない。The method of Patent Document 1 is disadvantageous in industrial economics in that it requires the use of thionyl chloride and generates highly corrosive hydrogen chloride. Further, it is industrially disadvantageous in that F 2 (fluorine gas), which is difficult to handle, is used for preparing 3-hydroxy-2-fluoropropionate as a raw material.
The method of Patent Document 2 is disadvantageous in industrial economy because expensive potassium t-butoxide and a large excess of chlorofluorocarbon are used. Also, the method for producing an ethylene derivative (1,1-diethoxyethene or the like) as a raw material thereof is limited. For example, the method of Non-Patent Document 1 cannot use industrially economical production of an ethylene derivative because expensive potassium t-butoxide needs to be used and hydrogen bromide having high corrosiveness is generated.
本発明者らは、高転化率、高選択率、及び高収率を達成し、工業経済的に優れたハロゲン化アクリル酸エステル誘導体の新規な製造方法、および、それに有用な中間体を見出した。 The present inventors have achieved a high conversion, a high selectivity, and a high yield, and have found a novel method for producing a halogenated acrylate derivative which is industrially and economically excellent, and an intermediate useful for the method. .
すなわち、本発明は、以下の発明を包含する。
[1]
下式(1)で表される化合物であり、かつ、沸点が500℃以下である化合物を、気相において、固体触媒の存在下に脱R3OH反応させることを特徴とする、下式(2)で表されるエテン誘導体の製造方法。That is, the present invention includes the following inventions.
[1]
A compound represented by the following formula (1) and having a boiling point of 500 ° C. or lower is subjected to a de-R 3 OH reaction in the gas phase in the presence of a solid catalyst, A method for producing an ethene derivative represented by 2).
(式中、
R1及びR2はそれぞれ独立に、水素原子、又は炭素原子を必須とする1価の基を表すか、またはR1及びR2は共同して、それらが結合する炭素原子とともに環を形成してもよく、
R3は、脱R3OH反応によって基R3Oが脱離し得る1価の基を表し、
R4及びR5はそれぞれ独立に、水素原子、又は炭素原子を必須とする1価の基を表す。)(Where
R 1 and R 2 each independently represent a hydrogen atom or a monovalent group that requires a carbon atom, or R 1 and R 2 together form a ring together with the carbon atom to which they are attached; May be
R 3 represents a monovalent group from which a group R 3 O can be eliminated by a de-R 3 OH reaction;
R 4 and R 5 each independently represent a hydrogen atom or a monovalent group essentially having a carbon atom. )
(式中、R1、R2、R4及びR5は前記の通りである。)
[2]
R1及びR2が、共に水素原子であり、かつ
R3、R4及びR5がそれぞれ独立に、アルキル基、シクロアルキル基、アリール基、置換基を有しているアルキル基、置換基を有しているシクロアルキル基、または置換基を有しているアリール基である、[1]に記載の製造方法。
[3]
反応の温度が、100〜500℃である、[1]または[2]に記載の製造方法。
[4]
反応が、気化させた式(1)で表される化合物をキャリアガスとともに固体触媒層に流通させることにより行われる、[1]〜[3]のいずれか一項に記載の製造方法。
[5]
キャリアガスの使用量が、式(1)で表される化合物の1モルに対して、0超〜20モルである、[4]に記載の製造方法。
[6]
固体触媒が、金属触媒及び金属酸化物触媒から選ばれる少なくとも1種の固体触媒である、[1]〜[5]のいずれか一項に記載の製造方法。
[7]
固体触媒が、金属酸化物触媒である、[1]〜[5]のいずれか一項に記載の製造方法。
[8]
固体触媒が、ジルコニア、アルミナ、ゼオライト及び酸化亜鉛からなる群から選ばれる少なくとも1種を含む触媒である、[1]〜[5]のいずれか一項に記載の製造方法。
[9]
固体触媒が、酸化亜鉛を含む触媒である、[1]〜[5]のいずれか一項に記載の製造方法。
[10]
固体触媒が、天然鉱物、モレキュラーシーブ、カーボンブラック、金属塩化物、金属フッ化物、金属硫酸塩、金属硫化物、および金属リン酸塩から選ばれる少なくとも1種の固体触媒である、[1]〜[5]のいずれか一項に記載の製造方法。(In the formula, R 1 , R 2 , R 4 and R 5 are as described above.)
[2]
R 1 and R 2 are both hydrogen atoms, and R 3 , R 4 and R 5 each independently represent an alkyl group, a cycloalkyl group, an aryl group, an alkyl group having a substituent, The production method according to [1], which is a cycloalkyl group having the substituent or an aryl group having a substituent.
[3]
The production method according to [1] or [2], wherein the reaction temperature is 100 to 500 ° C.
[4]
The production method according to any one of [1] to [3], wherein the reaction is performed by flowing the vaporized compound represented by the formula (1) together with a carrier gas through the solid catalyst layer.
[5]
The production method according to [4], wherein the amount of the carrier gas used is more than 0 to 20 mol per 1 mol of the compound represented by the formula (1).
[6]
The production method according to any one of [1] to [5], wherein the solid catalyst is at least one solid catalyst selected from a metal catalyst and a metal oxide catalyst.
[7]
The production method according to any one of [1] to [5], wherein the solid catalyst is a metal oxide catalyst.
[8]
The production method according to any one of [1] to [5], wherein the solid catalyst is a catalyst containing at least one selected from the group consisting of zirconia, alumina, zeolite and zinc oxide.
[9]
The production method according to any one of [1] to [5], wherein the solid catalyst is a catalyst containing zinc oxide.
[10]
The solid catalyst is [1] to at least one solid catalyst selected from natural minerals, molecular sieves, carbon black, metal chlorides, metal fluorides, metal sulfates, metal sulfides, and metal phosphates. The production method according to any one of [5].
[11]
[1]〜[10]のいずれか一項に記載の製造方法によって式(2)で表されるエテン誘導体を得て、該エテン誘導体を、塩基性化合物及び相間移動触媒の存在下に下式(3)で表される化合物と反応させることを特徴とする、下式(4)で表されるシクロプロパン誘導体の製造方法。[11]
An ethene derivative represented by the formula (2) is obtained by the production method according to any one of [1] to [10], and the ethene derivative is converted into the following formula in the presence of a basic compound and a phase transfer catalyst. A method for producing a cyclopropane derivative represented by the following formula (4), characterized by reacting with a compound represented by the following (3).
(式中、X、Y、及びZはそれぞれ独立に、ハロゲン原子を表す。) (In the formula, X, Y, and Z each independently represent a halogen atom.)
(式中、R1、R2、R4及びR5は[1]の通りであり、X及びYは前記の通りである。)
[12]
塩基性化合物が、アルカリ金属水酸化物、アルカリ金属アルコキシド、アルカリ金属水素化物及びアルキルリチウムからなる群から選択される少なくとも1種である、[11]に記載の製造方法。
[13]
相間移動触媒が、4級アンモニウム塩である、[11]又は[12]に記載の製造方法。
[14]
Xがフッ素原子であり、かつYが塩素原子又はフッ素原子である、[11]〜[13]のいずれか一項に記載の製造方法。
[15]
式(2)で表されるエテン誘導体が、1,1−ジメトキシエテンである、[11]〜[14]のいずれか一項に記載の製造方法。
[16]
式(3)で表される化合物の使用量が、式(2)で表されるエテン誘導体の1モルに対して1〜5モルである、[11]〜[15]のいずれか一項に記載の製造方法。
[17]
塩基性化合物の使用量が、式(3)で表される化合物の1モルに対して1〜10モルである、[11]〜[16]のいずれか一項に記載の製造方法。
[18]
相間移動触媒の使用量が、式(2)で表されるエテン誘導体の質量に対して0.001〜5質量%である、[11]〜[17]のいずれか一項に記載の製造方法。(In the formula, R 1 , R 2 , R 4 and R 5 are as defined in [1], and X and Y are as defined above.)
[12]
The production method according to [11], wherein the basic compound is at least one selected from the group consisting of an alkali metal hydroxide, an alkali metal alkoxide, an alkali metal hydride and an alkyl lithium.
[13]
The production method according to [11] or [12], wherein the phase transfer catalyst is a quaternary ammonium salt.
[14]
The production method according to any one of [11] to [13], wherein X is a fluorine atom and Y is a chlorine atom or a fluorine atom.
[15]
The production method according to any one of [11] to [14], wherein the ethene derivative represented by the formula (2) is 1,1-dimethoxyethene.
[16]
The compound according to any one of [11] to [15], wherein the amount of the compound represented by the formula (3) is 1 to 5 mol per 1 mol of the ethene derivative represented by the formula (2). The manufacturing method as described.
[17]
The production method according to any one of [11] to [16], wherein the amount of the basic compound used is 1 to 10 mol per 1 mol of the compound represented by the formula (3).
[18]
The production method according to any one of [11] to [17], wherein the amount of the phase transfer catalyst used is 0.001 to 5% by mass relative to the mass of the ethene derivative represented by the formula (2). .
[19]
[11]〜[18]のいずれか一項に記載の製造方法によって式(4)で表されるシクロプロパン誘導体を得て、該シクロプロパン誘導体を、液相又は気相において加熱することにより、脱R4Y反応させることを特徴とする、下式(5)で表されるハロゲン化アクリル酸エステル誘導体の製造方法。[19]
By obtaining the cyclopropane derivative represented by the formula (4) by the production method according to any one of [11] to [18], and heating the cyclopropane derivative in a liquid phase or a gas phase, A method for producing a halogenated acrylate derivative represented by the following formula (5), wherein the reaction is performed by removing R 4 Y.
(式中、R1、R2、R4及びR5は[1]の通りであり、X及びYは[11]の通りである。)
[20]
脱R4Y反応の温度が、80〜400℃である、[19]に記載の製造方法。(In the formula, R 1 , R 2 , R 4 and R 5 are as defined in [1], and X and Y are as defined in [11].)
[20]
The production method according to [19], wherein the temperature of the R 4 Y reaction is 80 to 400 ° C.
[21]
[11]〜[18]のいずれか一項に記載の製造方法によって式(4)で表されるシクロプロパン誘導体と下式(8)で表されるプロペン誘導体を得て、次に、該シクロプロパン誘導体と該プロペン誘導体とを分離し、次に分離した該プロペン誘導体を、酸性条件下で分解させることを特徴とする、下式(5)で表されるハロゲン化アクリル酸エステル誘導体の製造方法。[21]
According to the production method described in any one of [11] to [18], a cyclopropane derivative represented by the formula (4) and a propene derivative represented by the following formula (8) are obtained. A method for producing a halogenated acrylate derivative represented by the following formula (5), comprising separating a propane derivative and the propene derivative, and then decomposing the separated propene derivative under acidic conditions. .
(式中、R1、R2、R3、R4及びR5は[1]の通りであり、Xは[11]の通りである。)(In the formula, R 1 , R 2 , R 3 , R 4 and R 5 are as defined in [1], and X is as defined in [11].)
(式中、R1、R2、R5及びXは前記の通りである。)
[22]
式(5)で表されるハロゲン化アクリル酸エステル誘導体を製造する際に、重合禁止剤の存在下で製造を行う、[19]〜[21]のいずれか一項に記載の製造方法。
[23]
重合禁止剤の添加量が、式(5)で表されるハロゲン化アクリル酸エステル誘導体に対して10ppm以上である、[22]に記載の製造方法。(In the formula, R 1 , R 2 , R 5 and X are as described above.)
[22]
The production method according to any one of [19] to [21], wherein the production is performed in the presence of a polymerization inhibitor when producing the halogenated acrylate derivative represented by the formula (5).
[23]
The production method according to [22], wherein the amount of the polymerization inhibitor added is 10 ppm or more based on the halogenated acrylate derivative represented by the formula (5).
[24]
下式(6)で表される化合物。[24]
A compound represented by the following formula (6).
(式中、Meはメチル基を表し、Y1は塩素原子またはフッ素原子を表す。)
[25]
下式(7)で表される化合物。(In the formula, Me represents a methyl group, and Y 1 represents a chlorine atom or a fluorine atom.)
[25]
A compound represented by the following formula (7).
(式中、Meはメチル基を表す。) (In the formula, Me represents a methyl group.)
本発明によれば、安価かつ入手の容易な原料から、新規かつ有用な中間体を経て、高転化率、高選択率、高収率で、ハロゲン化アクリル酸エステル誘導体を製造できる。 ADVANTAGE OF THE INVENTION According to this invention, a halogenated acrylate derivative can be manufactured with a high conversion, a high selectivity, and a high yield from a cheap and easily available raw material through a new and useful intermediate.
本明細書における用語を下記の通り定義する。 Terms in this specification are defined as follows.
「アルキル基」とは、直鎖状又は分岐鎖状の1価飽和炭化水素基を意味する。アルキル基の炭素数は1〜20個が好ましく、1〜15個がより好ましく、1〜12個がさらに好ましく、1〜6個が特に好ましい。アルキル基としては、例えばメチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基、イソブチル基、sec−ブチル基、tert−ブチル基、n−ペンチル基、イソペンチル基、ネオペンチル基、tert−ペンチル基、1−エチルプロピル基、n−ヘキシル基、イソヘキシル基、ネオヘキシル基等が挙げられる。
「アルキル基」は、部分的に環構造を有する1価飽和炭化水素基であってもよい。たとえば、シクロアルキルアルキル基等が挙げられる。“Alkyl group” means a linear or branched monovalent saturated hydrocarbon group. The alkyl group has preferably 1 to 20 carbon atoms, more preferably 1 to 15 carbon atoms, further preferably 1 to 12 carbon atoms, and particularly preferably 1 to 6 carbon atoms. Examples of the alkyl group include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n-pentyl, isopentyl, neopentyl, tert -Pentyl, 1-ethylpropyl, n-hexyl, isohexyl, neohexyl and the like.
The “alkyl group” may be a monovalent saturated hydrocarbon group partially having a ring structure. For example, a cycloalkylalkyl group is exemplified.
「シクロアルキル基」とは、環状の1価飽和炭化水素基を意味する。シクロアルキル基の炭素数は3〜20個が好ましく、3〜15個がより好ましく、3〜12個がさらに好ましく、3〜6個が特に好ましい。シクロアルキル基中の環構造の数は1つであっても、2つ以上であってもよい。2つ以上の場合は、縮合多環構造、橋かけ環構造又はスピロ環構造を有する。シクロアルキル基としては、例えばシクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基等が挙げられる。 “Cycloalkyl group” means a cyclic monovalent saturated hydrocarbon group. The carbon number of the cycloalkyl group is preferably 3 to 20, more preferably 3 to 15, still more preferably 3 to 12, and particularly preferably 3 to 6. The number of ring structures in the cycloalkyl group may be one, or two or more. In the case of two or more, it has a condensed polycyclic structure, a bridged ring structure or a spiro ring structure. Examples of the cycloalkyl group include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, and the like.
「アルケニル基」とは、前記アルキル基(ただしメチル基は除く。)の任意の炭素−炭素単結合が、炭素−炭素二重結合と置き換わった基を意味する。アルケニル基の炭素数は2〜20個が好ましく、2〜15個がより好ましく、2〜12個がさらに好ましく、2〜6個が特に好ましい。アルケニル基としては、例えばエテニル基、1−プロペニル基、2−プロペニル基、1−メチル−1−エテニル基、1−ブテニル基、2−ブテニル基、3−ブテニル基、2−メチル−1−プロペニル基、2−メチル−2−プロペニル基、1−エチルエテニル基、1−メチル−1−プロペニル基、1−メチル−2−プロペニル基、1−ペンテニル基、1−ヘキセニル基等が挙げられる。 The “alkenyl group” means a group in which an arbitrary carbon-carbon single bond of the above-mentioned alkyl group (excluding a methyl group) is replaced with a carbon-carbon double bond. The carbon number of the alkenyl group is preferably 2 to 20, more preferably 2 to 15, more preferably 2 to 12, and particularly preferably 2 to 6. Examples of the alkenyl group include ethenyl, 1-propenyl, 2-propenyl, 1-methyl-1-ethenyl, 1-butenyl, 2-butenyl, 3-butenyl, and 2-methyl-1-propenyl. Group, 2-methyl-2-propenyl group, 1-ethylethenyl group, 1-methyl-1-propenyl group, 1-methyl-2-propenyl group, 1-pentenyl group, 1-hexenyl group and the like.
「シクロアルケニル基」とは、前記シクロアルキル基の任意の炭素−炭素単結合が、炭素−炭素二重結合と置き換わった基を意味する。シクロアルケニル基中の環構造の数は、1つであっても、2つ以上であってもよい。2つ以上の場合は、縮合多環構造、橋かけ環構造又はスピロ環構造を有する。シクロアルケニル基の炭素数は3〜20個が好ましく、3〜15個がより好ましく、3〜12個がさらに好ましく、3〜6個が特に好ましい。シクロアルケニル基としては、例えば、1−シクロペンテニル基、2−シクロペンテニル基、3−シクロペンテニル基、1−メチル−2−シクロペンテニル基、1−シクロヘキセニル基、2−シクロヘキセニル基、3−シクロヘキセニル基等が挙げられる。 The “cycloalkenyl group” means a group in which an arbitrary carbon-carbon single bond of the cycloalkyl group is replaced with a carbon-carbon double bond. The number of ring structures in the cycloalkenyl group may be one, or two or more. In the case of two or more, it has a condensed polycyclic structure, a bridged ring structure or a spiro ring structure. The carbon number of the cycloalkenyl group is preferably 3 to 20, more preferably 3 to 15, still more preferably 3 to 12, and particularly preferably 3 to 6. Examples of the cycloalkenyl group include a 1-cyclopentenyl group, a 2-cyclopentenyl group, a 3-cyclopentenyl group, a 1-methyl-2-cyclopentenyl group, a 1-cyclohexenyl group, a 2-cyclohexenyl group, and a 3-cyclopentenyl group. And cyclohexenyl group.
「アルキニル基」とは、前記アルキル基(ただしメチル基は除く。)の任意の炭素−炭素単結合、又は前記アルケニル基の任意の炭素−炭素単結合もしくは炭素−炭素二重結合が、炭素−炭素三重結合と置き換わった基を意味する。アルキニル基の炭素数は2〜20個が好ましく、2〜15個がより好ましく、2〜12個がさらに好ましく、2〜6個が特に好ましい。アルキニル基としては、例えばエチニル基、1−プロピニル基、2−プロピニル基、1−ブチニル基、2−ブチニル基、3−ブチニル基、1−メチル−2−プロピニル基、1−ペンチニル基、1−ヘキシニル基等が挙げられる。 The term “alkynyl group” means that any carbon-carbon single bond of the alkyl group (excluding the methyl group) or any carbon-carbon single bond or carbon-carbon double bond of the alkenyl group is a carbon-carbon bond. It means a group replaced with a carbon triple bond. The alkynyl group preferably has 2 to 20 carbon atoms, more preferably has 2 to 15 carbon atoms, further preferably has 2 to 12 carbon atoms, and particularly preferably has 2 to 6 carbon atoms. Examples of the alkynyl group include an ethynyl group, a 1-propynyl group, a 2-propynyl group, a 1-butynyl group, a 2-butynyl group, a 3-butynyl group, a 1-methyl-2-propynyl group, a 1-pentynyl group, and a 1-pentynyl group. And a hexynyl group.
「アルコキシ基」とは、エーテル性酸素原子(−O−)に前記アルキル基が結合した基を意味する。アルコキシ基の構造は直鎖状又は分岐鎖状が好ましい。アルコキシ基の炭素数は1〜20個が好ましく、1〜15個がより好ましく、1〜12個がさらに好ましく、1〜6個が特に好ましい。アルコキシ基としては、例えばメトキシ基、エトキシ基、n−プロポキシ基、イソプロポキシ基、n−ブトキシ基、イソブトキシ基、sec−ブトキシ基、tert−ブトキシ基、n−ペンチルオキシ基、n−ヘキシルオキシ基等が挙げられる。 “Alkoxy group” means a group in which the alkyl group is bonded to an etheric oxygen atom (—O—). The structure of the alkoxy group is preferably linear or branched. The carbon number of the alkoxy group is preferably 1 to 20, more preferably 1 to 15, further preferably 1 to 12, and particularly preferably 1 to 6. Examples of the alkoxy group include a methoxy group, an ethoxy group, an n-propoxy group, an isopropoxy group, an n-butoxy group, an isobutoxy group, a sec-butoxy group, a tert-butoxy group, an n-pentyloxy group, and an n-hexyloxy group And the like.
「アリール基」とは、単環又は2環式以上の芳香族炭化水素基を意味する。アリール基の炭素数は6〜22個が好ましく、6〜18個がより好ましく、6〜14個がさらに好ましく、6〜10個が特に好ましい。アリール基としては、例えばフェニル基、o−、p−又はm−トリル基、ナフチル基、フェナントレニル基、アントラセニル基、フルオレニル基等が挙げられる。 “Aryl group” means a monocyclic or bicyclic or higher aromatic hydrocarbon group. The carbon number of the aryl group is preferably 6 to 22, more preferably 6 to 18, more preferably 6 to 14, and particularly preferably 6 to 10. Examples of the aryl group include a phenyl group, an o-, p- or m-tolyl group, a naphthyl group, a phenanthrenyl group, an anthracenyl group, a fluorenyl group and the like.
「ヘテロアリール基」とは、1個以上のヘテロ原子を有する芳香族基を意味する。ヘテロ原子としては、酸素原子、硫黄原子、窒素原子が好ましい。ヘテロアリール基の炭素数は3〜21個が好ましく、3〜17個がより好ましく、3〜13個がさらに好ましく、3〜9個が特に好ましい。ヘテロアリール基としては、例えばピリジル基、ピリミジニル基、ピリダジニル基、ピラジニル基、チエニル基、フリル基、ピロリル基、ピラゾリル基、トリアゾリル基、イミダゾリル基、チアゾリル基、オキサゾリル基、インドリル基、キノリル基等が挙げられる。 “Heteroaryl group” means an aromatic group having one or more heteroatoms. As the hetero atom, an oxygen atom, a sulfur atom, and a nitrogen atom are preferable. The carbon number of the heteroaryl group is preferably 3 to 21, more preferably 3 to 17, still more preferably 3 to 13, and particularly preferably 3 to 9. Examples of the heteroaryl group include a pyridyl group, a pyrimidinyl group, a pyridazinyl group, a pyrazinyl group, a thienyl group, a furyl group, a pyrrolyl group, a pyrazolyl group, a triazolyl group, an imidazolyl group, a thiazolyl group, an oxazolyl group, an indolyl group, and a quinolyl group. No.
「アリールオキシ基」とは、エーテル性酸素原子(−O−)に前記アリール基が結合した基を意味する。アリールオキシ基の炭素数は7〜23個が好ましく、7〜19個が特に好ましく、7〜15個がより好ましく、7〜11個がさらに好ましい。アリールオキシ基としては、例えばフェノキシ基等が挙げられる。 “Aryloxy group” means a group in which the aryl group is bonded to an etheric oxygen atom (—O—). The carbon number of the aryloxy group is preferably from 7 to 23, particularly preferably from 7 to 19, more preferably from 7 to 15, and even more preferably from 7 to 11. Examples of the aryloxy group include a phenoxy group.
「アルキルチオ基」とは、−S−に前記アルキル基が結合した基を意味する。アルキルチオ基の炭素数は1〜20個が好ましく、炭素数1〜15個がより好ましく、炭素数1〜12個がさらに好ましく、炭素数1〜6個が特に好ましい。アルキルチオ基としては、例えばメタンチオ基、エタンチオ基、n−プロパンチオ基、イソプロパンチオ基、n−ブタンチオ基、イソブタンチオ基、s−ブタンチオ基、t−ブタンチオ基、n−ペンタンチオ基、n−ヘキサンチオ基等が挙げられる。 “Alkylthio group” means a group in which the alkyl group is bonded to —S—. The alkylthio group preferably has 1 to 20 carbon atoms, more preferably has 1 to 15 carbon atoms, further preferably has 1 to 12 carbon atoms, and particularly preferably has 1 to 6 carbon atoms. Examples of the alkylthio group include methanethio, ethanethio, n-propanethio, isopropanethio, n-butanethio, isobutanethio, s-butanethio, t-butanethio, n-pentanethio, and n-hexanethio. And the like.
「モノアルキルアミノ基」とは、アミノ基(−NH2)の水素原子の1つが前記アルキル基と置き換わった基を意味する。「ジアルキルアミノ基」とは、アミノ基の水素原子の2つが前記アルキル基と置き換わった基を意味する。モノアルキルアミノ基の炭素数は1〜20個が好ましく、1〜15個がより好ましく、1〜12個がさらに好ましく、1〜8個が特に好ましい。ジアルキルアミノ基の炭素数は2〜20個が好ましく、2〜15個がより好ましく、2〜12個がさらに好ましく、2〜8個が特に好ましい。モノアルキルアミノ基としては、例えばメチルアミノ基、エチルアミノ基、n−プロピルアミノ基、イソプロピルアミノ基、t−ブチルアミノ基、n−ペンチルアミノ基、n−ヘキシルアミノ基等が挙げられる。ジアルキルアミノ基としては、例えばN,N−ジメチルアミノ基、N,N−ジエチルアミノ基等が挙げられる。“Monoalkylamino group” means a group in which one of the hydrogen atoms of an amino group (—NH 2 ) is replaced with the above-mentioned alkyl group. “Dialkylamino group” means a group in which two hydrogen atoms of an amino group have been replaced with the above-mentioned alkyl group. The carbon number of the monoalkylamino group is preferably 1 to 20, more preferably 1 to 15, further preferably 1 to 12, and particularly preferably 1 to 8. The dialkylamino group preferably has 2 to 20 carbon atoms, more preferably has 2 to 15 carbon atoms, further preferably has 2 to 12 carbon atoms, and particularly preferably has 2 to 8 carbon atoms. Examples of the monoalkylamino group include a methylamino group, an ethylamino group, an n-propylamino group, an isopropylamino group, a t-butylamino group, an n-pentylamino group, and an n-hexylamino group. Examples of the dialkylamino group include an N, N-dimethylamino group and an N, N-diethylamino group.
「モノアリールアミノ基」とは、アミノ基の水素原子の1つが前記アリール基と置き換わった基を意味する。「ジアリールアミノ基」とは、アミノ基の水素原子の2つが前記アリール基と置き換わった基を意味する。モノアリールアミノ基の炭素数は6〜22個が好ましく、6〜18個がより好ましく、6〜14個がさらに好ましく、炭素数6〜10個が特に好ましい。ジアリールアミノ基の炭素数は12〜24個が好ましく、12〜20個がより好ましく、12〜16個がさらに好ましい。モノアリールアミノ基としては、例えばフェニルアミノ基等が挙げられる。ジアリールアミノ基としては、例えばジフェニルアミノ基等が挙げられる。 “Monoarylamino group” means a group in which one of the hydrogen atoms of an amino group has been replaced with the above-mentioned aryl group. “Diarylamino group” means a group in which two hydrogen atoms of an amino group have been replaced with the above-mentioned aryl group. The monoarylamino group preferably has 6 to 22 carbon atoms, more preferably has 6 to 18 carbon atoms, still more preferably has 6 to 14 carbon atoms, and particularly preferably has 6 to 10 carbon atoms. The carbon number of the diarylamino group is preferably 12 to 24, more preferably 12 to 20, and still more preferably 12 to 16. Examples of the monoarylamino group include a phenylamino group. Examples of the diarylamino group include a diphenylamino group.
「ヘテロシクリル基」とは、1個以上のヘテロ原子を有する飽和又は不飽和の1価複素環基を意味する。ヘテロ原子としては、酸素原子、硫黄原子、窒素原子が好ましい。ヘテロシクリル基の炭素数は3〜21個が好ましく、3〜17個がより好ましく、3〜13個がさらに好ましく、3〜9個が特に好ましい。ヘテロシクリル基としては、例えばアゼパニル基、ピロリジニル基、ピペリジニル基、ピペラジニル基、モルホリニル基、テトラヒドロフリル基等が挙げられる。 “Heterocyclyl group” means a saturated or unsaturated monovalent heterocyclic group having one or more heteroatoms. As the hetero atom, an oxygen atom, a sulfur atom, and a nitrogen atom are preferable. The carbon number of the heterocyclyl group is preferably 3 to 21, more preferably 3 to 17, still more preferably 3 to 13, and particularly preferably 3 to 9. Examples of the heterocyclyl group include an azepanyl group, a pyrrolidinyl group, a piperidinyl group, a piperazinyl group, a morpholinyl group, and a tetrahydrofuryl group.
「ハロゲン原子」とは、フッ素原子、塩素原子、臭素原子又はヨウ素原子を意味し、フッ素原子又は塩素原子が好ましい。 “Halogen atom” means a fluorine atom, a chlorine atom, a bromine atom or an iodine atom, and a fluorine atom or a chlorine atom is preferable.
前記「アルキル基」、「シクロアルキル基」、「アルケニル基」、「シクロアルケニル基」、「アルキニル基」、「アルコキシ基」、「アリール基」、「ヘテロアリール基」、「アリールオキシ基」、「アルキルチオ基」、「モノアルキルアミノ基」、「ジアルキルアミノ基」、「モノアリールアミノ基」、「ジアリールアミノ基」および「ヘテロシクリル基」は、置換基で置換されていてもよい。該置換基で置換された基を、置換基を有している基という。置換基としては例えば、アルキル基、アルケニル基、アルコキシ基、アリール基、アルキルチオ基、ニトロ基、アミノ基、カルボキシル基、シクロアルキル基、水酸基、ハロゲン原子、シアノ基、フェニル基、及びヘテロシクリル基が挙げられる。 The aforementioned “alkyl group”, “cycloalkyl group”, “alkenyl group”, “cycloalkenyl group”, “alkynyl group”, “alkoxy group”, “aryl group”, “heteroaryl group”, “aryloxy group”, “Alkylthio group”, “monoalkylamino group”, “dialkylamino group”, “monoarylamino group”, “diarylamino group” and “heterocyclyl group” may be substituted with a substituent. The group substituted with the substituent is referred to as a group having a substituent. Examples of the substituent include an alkyl group, an alkenyl group, an alkoxy group, an aryl group, an alkylthio group, a nitro group, an amino group, a carboxyl group, a cycloalkyl group, a hydroxyl group, a halogen atom, a cyano group, a phenyl group, and a heterocyclyl group. Can be
次に本発明の製造方法について更に詳細に説明する。本発明の製造プロセスの概念は、下式で示される。 Next, the production method of the present invention will be described in more detail. The concept of the manufacturing process of the present invention is represented by the following equation.
(式中、R1、R2、R3、R4、R5、X、Y及びZは前記の通りである。)(In the formula, R 1 , R 2 , R 3 , R 4 , R 5 , X, Y and Z are as described above.)
[工程(i)]
工程(i)は、式(1)で表される化合物であって、沸点が500℃以下である化合物(以下、該化合物を「オルトカルボン酸エステル(1)」とも記す。)を、気相において、固体触媒の存在下に脱R3OH反応させ、式(2)で表されるエテン誘導体(以下、単に「エテン誘導体(2)」とも記す。)を製造する工程である。[Step (i)]
In the step (i), a compound represented by the formula (1) and having a boiling point of 500 ° C. or lower (hereinafter also referred to as “orthocarboxylic acid ester (1)”) is vapor-phased. In this step, a de-R 3 OH reaction is performed in the presence of a solid catalyst to produce an ethene derivative represented by the formula (2) (hereinafter, also simply referred to as “ethene derivative (2)”).
オルトカルボン酸エステル(1)において、R1及びR2はそれぞれ独立に、水素原子、又は炭素原子を必須とする1価の基である。
R1及びR2はそれぞれ独立に、水素原子、アルキル基、シクロアルキル基、アルケニル基、シクロアルケニル基、アルキニル基、アルコキシ基、アリール基、ヘテロアリール基、アリールオキシ基、アルキルチオ基、モノアルキルアミノ基、ジアルキルアミノ基、モノアリールアミノ基、ジアリールアミノ基、ヘテロシクリル基、置換基を有しているアルキル基、置換基を有しているシクロアルキル基、置換基を有しているアルケニル基、置換基を有しているシクロアルケニル基、置換基を有しているアルキニル基、置換基を有しているアルコキシ基、置換基を有しているアリール基、置換基を有しているヘテロアリール基、置換基を有しているアリールオキシ基、置換基を有しているアルキルチオ基、置換基を有しているモノアルキルアミノ基、置換基を有しているジアルキルアミノ基、置換基を有しているモノアリールアミノ基、置換基を有しているジアリールアミノ基、または置換基を有しているヘテロシクリル基が好ましい。
また、R1及びR2は共同して、それらが結合する炭素原子とともに環を形成してもよい。R1及びR2が共同して、それらが結合する炭素原子とともに形成する環としては、シクロヘキサン等のシクロアルカン、またはアルキル基が置換したシクロヘキサン等の、置換基を有するシクロアルカン等が挙げられる。
R1及びR2はそれぞれ独立に、水素原子、アルキル基、シクロアルキル基、アルコキシ基、アリール基、アリールオキシ基、置換基を有しているアルキル基、置換基を有しているシクロアルキル基、置換基を有しているアルコキシ基、置換基を有しているアリール基、または置換基を有しているアリールオキシ基がより好ましい。
R1及びR2は、共に水素原子が特に好ましい。In the orthocarboxylic acid ester (1), R 1 and R 2 are each independently a hydrogen atom or a monovalent group essentially having a carbon atom.
R 1 and R 2 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, a cycloalkenyl group, an alkynyl group, an alkoxy group, an aryl group, a heteroaryl group, an aryloxy group, an alkylthio group, a monoalkylamino Group, dialkylamino group, monoarylamino group, diarylamino group, heterocyclyl group, alkyl group having a substituent, cycloalkyl group having a substituent, alkenyl group having a substituent, substitution Cycloalkenyl group having a group, alkynyl group having a substituent, alkoxy group having a substituent, aryl group having a substituent, heteroaryl group having a substituent , An aryloxy group having a substituent, an alkylthio group having a substituent, a monoalkyl having a substituent Amino group, a dialkylamino group having a substituent, mono-arylamino group having a substituent, a diarylamino group has a substituent, or a heterocyclyl group having a substituent, are preferred.
Also, R 1 and R 2 may together form a ring with the carbon atom to which they are attached. Examples of the ring formed by R 1 and R 2 together with the carbon atom to which they are bonded include a cycloalkane such as cyclohexane or a cycloalkane having a substituent such as cyclohexane substituted with an alkyl group.
R 1 and R 2 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, an aryl group, an aryloxy group, a substituted alkyl group, or a substituted cycloalkyl group. And an alkoxy group having a substituent, an aryl group having a substituent, and an aryloxy group having a substituent are more preferable.
Each of R 1 and R 2 is particularly preferably a hydrogen atom.
R3は、脱R3OH反応によって基R3Oが脱離し得る1価の基である。R3は、アルキル基、シクロアルキル基、アルケニル基、シクロアルケニル基、アルキニル基、アリール基、ヘテロアリール基、ヘテロシクリル基、置換基を有しているアルキル基、置換基を有しているシクロアルキル基、置換基を有しているアルケニル基、置換基を有しているシクロアルケニル基、置換基を有しているアルキニル基、置換基を有しているアリール基、置換基を有しているヘテロアリール基、または置換基を有しているヘテロシクリル基が好ましい。
R3は、アルキル基、シクロアルキル基、アリール基、置換基を有しているアルキル基、置換基を有しているシクロアルキル基、または置換基を有しているアリール基がより好ましい。
R3は、アルキル基がさらに好ましく、メチル基が特に好ましい。R 3 is a monovalent group from which a group R 3 O can be eliminated by a de-R 3 OH reaction. R 3 represents an alkyl group, a cycloalkyl group, an alkenyl group, a cycloalkenyl group, an alkynyl group, an aryl group, a heteroaryl group, a heterocyclyl group, an alkyl group having a substituent, a cycloalkyl group having a substituent, Group, alkenyl group having a substituent, cycloalkenyl group having a substituent, alkynyl group having a substituent, aryl group having a substituent, having a substituent A heteroaryl group or a substituted heterocyclyl group is preferred.
R 3 is more preferably an alkyl group, a cycloalkyl group, an aryl group, an alkyl group having a substituent, a cycloalkyl group having a substituent, or an aryl group having a substituent.
R 3 is more preferably an alkyl group, particularly preferably a methyl group.
R4及びR5はそれぞれ独立に、水素原子、又は炭素原子を必須とする1価の基であり、具体的には、水素原子、アルキル基、シクロアルキル基、アルケニル基、シクロアルケニル基、アルキニル基、アリール基、ヘテロアリール基、ヘテロシクリル基、置換基を有しているアルキル基、置換基を有しているシクロアルキル基、置換基を有しているアルケニル基、置換基を有しているシクロアルケニル基、置換基を有しているアルキニル基、置換基を有しているアリール基、置換基を有しているヘテロアリール基、または置換基を有しているヘテロシクリル基が好ましい。
R4及びR5は、それぞれ独立に、アルキル基、シクロアルキル基、アリール基、置換基を有しているアルキル基、置換基を有しているシクロアルキル基、または置換基を有しているアリール基がより好ましい。
R4及びR5はそれぞれ独立に、アルキル基がさらに好ましく、メチル基が特に好ましい。R 4 and R 5 are each independently a hydrogen atom or a monovalent group essentially having a carbon atom, and specifically include a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, a cycloalkenyl group, and an alkynyl. Group, aryl group, heteroaryl group, heterocyclyl group, alkyl group having a substituent, cycloalkyl group having a substituent, alkenyl group having a substituent, having a substituent A cycloalkenyl group, an alkynyl group having a substituent, an aryl group having a substituent, a heteroaryl group having a substituent, or a heterocyclyl group having a substituent is preferable.
R 4 and R 5 each independently have an alkyl group, a cycloalkyl group, an aryl group, an alkyl group having a substituent, a cycloalkyl group having a substituent, or a substituent Aryl groups are more preferred.
R 4 and R 5 are each independently preferably an alkyl group, and particularly preferably a methyl group.
好適なオルトカルボン酸エステル(1)としては、
R1及びR2が、共に水素原子であり、かつ
R3、R4及びR5がそれぞれ独立に、アルキル基、シクロアルキル基、アリール基、置換基を有しているアルキル基、置換基を有しているシクロアルキル基、または置換基を有しているアリール基である、化合物である。Suitable orthocarboxylic esters (1) include:
R 1 and R 2 are both hydrogen atoms, and R 3 , R 4 and R 5 each independently represent an alkyl group, a cycloalkyl group, an aryl group, an alkyl group having a substituent, A compound having a cycloalkyl group or an aryl group having a substituent.
より好適なオルトカルボン酸エステル(1)としては、
R1及びR2が、共に水素原子であり、かつ
R3、R4及びR5がそれぞれ独立に、アルキル基である、化合物である。More preferred orthocarboxylic acid esters (1) include
A compound wherein R 1 and R 2 are both hydrogen atoms, and R 3 , R 4 and R 5 are each independently an alkyl group.
さらに好適なオルトカルボン酸エステル(1)としては、
R1及びR2が、共に水素原子であり、かつ
R3、R4及びR5が、共にメチル基である、化合物である。Further preferred orthocarboxylic acid esters (1) include:
A compound wherein R 1 and R 2 are both hydrogen atoms, and R 3 , R 4 and R 5 are both methyl groups.
前記オルトカルボン酸エステル(1)における置換基は、オルトカルボン酸エステル(1)の沸点が500℃以下となるように選定しなければならない。 The substituent in the orthocarboxylic acid ester (1) must be selected so that the boiling point of the orthocarboxylic acid ester (1) is 500 ° C. or less.
オルトカルボン酸エステル(1)は、有機化学の常法に従い、公知の方法又はその類似方法によって合成できる。その典型であるオルト酢酸トリメチルは市販されており極めて容易に入手できる。
工程(i)の反応は気相において行うため、オルトカルボン酸エステル(1)の沸点は、反応温度と反応圧力において、オルトカルボン酸エステル(1)が気化する温度であることが好ましい。以下における沸点は、1気圧(絶対圧)における沸点をいう。
オルトカルボン酸エステル(1)の沸点は、500℃以下であり、450℃以下が好ましく、400℃以下がより好ましい。また、取り扱いが容易である観点から、オルトカルボン酸エステル(1)の沸点は、0℃以上が好ましく、20℃以上がより好ましく、50℃以上がさらに好ましい。The orthocarboxylic acid ester (1) can be synthesized by a known method or a similar method thereof according to a conventional method of organic chemistry. A typical example is trimethyl orthoacetate, which is commercially available and very easily available.
Since the reaction in the step (i) is performed in a gas phase, the boiling point of the orthocarboxylic acid ester (1) is preferably a temperature at which the orthocarboxylic acid ester (1) is vaporized at the reaction temperature and the reaction pressure. The boiling point in the following refers to the boiling point at 1 atm (absolute pressure).
The boiling point of the orthocarboxylic acid ester (1) is 500 ° C. or lower, preferably 450 ° C. or lower, more preferably 400 ° C. or lower. Further, from the viewpoint of easy handling, the boiling point of the orthocarboxylic acid ester (1) is preferably 0 ° C. or higher, more preferably 20 ° C. or higher, even more preferably 50 ° C. or higher.
工程(i)の反応に使用する固体触媒は、オルトカルボン酸エステル(1)の脱R3OH反応を促進する触媒から選択され、脱R3OH反応を促進する固体酸量を有する固体触媒から選択されるのが好ましい。The solid catalyst used in the reaction of the step (i) is selected from catalysts that promote the de-R 3 OH reaction of the orthocarboxylic acid ester (1), and includes a solid catalyst having a solid acid amount that promotes the de-R 3 OH reaction. Preferably, it is selected.
固体触媒としては、金属触媒、金属酸化物触媒、天然鉱物、モレキュラーシーブ、カーボンブラック等が挙げられる。天然鉱物は、酸性白土、カオリナイト、ベントナイト、モンモリロナイト、タルク、ケイ酸ジルコニウム、またはゼオライトが好ましい。カーボンブラックは、無定形炭素、木炭、活性炭、グラファイトまたはフラーレン類が好ましい。固体触媒は、金属触媒及び金属酸化物触媒から選ばれる少なくとも1種が好ましく、金属酸化物触媒がより好ましい。 Examples of the solid catalyst include metal catalysts, metal oxide catalysts, natural minerals, molecular sieves, carbon black and the like. The natural mineral is preferably acid clay, kaolinite, bentonite, montmorillonite, talc, zirconium silicate, or zeolite. The carbon black is preferably amorphous carbon, charcoal, activated carbon, graphite or fullerenes. The solid catalyst is preferably at least one selected from a metal catalyst and a metal oxide catalyst, and more preferably a metal oxide catalyst.
金属触媒としては、周期律表のIVB族及びVIII族の金属からなる触媒が好ましく、モリブデン、タングステン、クロム、鉄、コバルト、ニッケル、白金、パラジウム、イリジウム、オスミウム、ロジウム、レニウム、またはルテニウムが好ましい。 As the metal catalyst, a catalyst composed of a metal of Groups IVB and VIII of the periodic table is preferable, and molybdenum, tungsten, chromium, iron, cobalt, nickel, platinum, palladium, iridium, osmium, rhodium, rhenium, or ruthenium is preferable. .
金属酸化物触媒とは金属酸化物を含む触媒をいい、シリカ、アルミナ、ジルコニア、チタニア、酸化タングステン、酸化マグネシウム(マグネシア)、酸化バナジウム、酸化クロム、酸化マンガン、酸化鉄、酸化ニッケル、酸化コバルト、酸化銅、酸化亜鉛、酸化モリブデン、酸化スズ、酸化カルシウム、酸化ホウ素(ボリア)、ゼオライト、またはそれらの混合物が好ましい。金属酸化物触媒は、任意のモル比でシリカ−アルミナ、シリカ−マグネシア、シリカ−ボリア、アルミナ−ボリア、シリカ−チタニア、シリカ−ジルコニア、酸化亜鉛−ジルコニア、モレキュラーシーブ等の複合金属酸化物として使用してもよい。 A metal oxide catalyst refers to a catalyst containing a metal oxide, such as silica, alumina, zirconia, titania, tungsten oxide, magnesium oxide (magnesia), vanadium oxide, chromium oxide, manganese oxide, iron oxide, nickel oxide, and cobalt oxide. Copper oxide, zinc oxide, molybdenum oxide, tin oxide, calcium oxide, boron oxide (boria), zeolites, or mixtures thereof are preferred. The metal oxide catalyst is used as a composite metal oxide such as silica-alumina, silica-magnesia, silica-boria, alumina-boria, silica-titania, silica-zirconia, zinc oxide-zirconia, and molecular sieve in an arbitrary molar ratio. May be.
金属酸化物触媒としては、活性の点から、ジルコニア(酸化ジルコニウム)、アルミナ、ゼオライト及び酸化亜鉛からなる群から選ばれる少なくとも1種を含む触媒がより好ましく、酸化亜鉛を含む触媒が特に好ましい。この場合、金属酸化物触媒中のジルコニア、アルミナ、ゼオライト及び酸化亜鉛からなる群から選ばれる少なくとも1種の金属酸化物の含有量は、金属酸化物触媒に対して50質量%以上が好ましく、60質量%以上がより好ましく、70質量%以上がさらに好ましい。 As the metal oxide catalyst, from the viewpoint of activity, a catalyst containing at least one selected from the group consisting of zirconia (zirconium oxide), alumina, zeolite and zinc oxide is more preferable, and a catalyst containing zinc oxide is particularly preferable. In this case, the content of at least one metal oxide selected from the group consisting of zirconia, alumina, zeolite and zinc oxide in the metal oxide catalyst is preferably 50% by mass or more based on the metal oxide catalyst, It is more preferably at least 70% by mass, even more preferably at least 70% by mass.
金属酸化物のうち、ゼオライトとしては、A型ゼオライト、L型ゼオライト、X型ゼオライト、Y型ゼオライト、ZSM−5型に代表されるMFIゼオライト、MWW型ゼオライト、β型ゼオライト、モルデナイト、フェリエライト、またはエリオナイトが好ましい。 Among the metal oxides, zeolites include A-type zeolites, L-type zeolites, X-type zeolites, Y-type zeolites, MFI zeolites represented by ZSM-5 type, MWW-type zeolites, β-type zeolites, mordenite, ferrierite, Or erionite is preferred.
前記以外の工程(i)の反応に使用する固体触媒としては、塩化アルミニウム等の金属塩化物、フッ化アルミニウム、フッ化カルシウム等の金属フッ化物、硫酸鉄等の金属硫酸塩、硫化亜鉛等の金属硫化物、リン酸亜鉛等の金属リン酸塩、メタロシリケート触媒等の固体触媒、不活性担体上にリン化合物、ホウ素化合物などを担持させた固体触媒が挙げられる。
工程(i)の反応に使用する固体触媒は、1種を単独で使用してもよく、2種以上を併用してもよい。
固体触媒の固体酸量は、0超〜5.0mmol/gが好ましく、0超〜3.0mmol/gがより好ましく、0超〜1.0mmol/gがさらに好ましい。固体触媒の固体酸量が下限値以上であれば、オルトカルボン酸エステル(1)の転化率が向上する。固体触媒の固体酸量が上限値以下であれば、副生成物の生成を抑制しやすい。
固体触媒の比表面積は、0.1〜1000m2/gが好ましく、0.5〜500m2/gがより好ましく、1〜350m2/gがさらに好ましい。固体触媒の比表面積が下限値以上であれば、オルトカルボン酸エステル(1)の転化率が向上する。固体触媒の比表面積が上限値以下であれば、副生成物の生成を抑制しやすい。Examples of the solid catalyst used in the reaction of the step (i) other than the above include metal chlorides such as aluminum chloride, metal fluorides such as aluminum fluoride and calcium fluoride, metal sulfates such as iron sulfate, and zinc sulfide. Examples include metal sulfides, metal phosphates such as zinc phosphate, solid catalysts such as metallosilicate catalysts, and solid catalysts in which a phosphorus compound, a boron compound, and the like are supported on an inert carrier.
As the solid catalyst used in the reaction of step (i), one type may be used alone, or two or more types may be used in combination.
The solid acid amount of the solid catalyst is preferably more than 0 to 5.0 mmol / g, more preferably more than 0 to 3.0 mmol / g, and even more preferably more than 0 to 1.0 mmol / g. When the amount of the solid acid of the solid catalyst is equal to or more than the lower limit, the conversion of the orthocarboxylic acid ester (1) is improved. When the amount of the solid acid of the solid catalyst is equal to or less than the upper limit, generation of by-products is easily suppressed.
The specific surface area of the solid catalyst is preferably 0.1~1000m 2 / g, more preferably 0.5~500m 2 / g, more preferably 1~350m 2 / g. When the specific surface area of the solid catalyst is equal to or more than the lower limit, the conversion of the orthocarboxylic acid ester (1) is improved. When the specific surface area of the solid catalyst is equal to or less than the upper limit, generation of by-products is easily suppressed.
工程(i)の反応は気相において行う。気相での反応は、慣用の気相流通法により行うことができる。気相流通法とは、反応器に固体触媒を充填し、気化させたオルトカルボン酸エステル(1)を固体触媒層に流通させて反応させる方法である。具体的には、固定床流通方式、固定床循環方式、流動床流通方式等の反応方式が挙げられ、本発明ではこれらいずれの反応形式も適用できる。 The reaction of step (i) is performed in a gas phase. The reaction in the gas phase can be carried out by a conventional gas phase flow method. The gas phase flow method is a method in which a solid catalyst is filled in a reactor, and the vaporized orthocarboxylic acid ester (1) is allowed to flow through the solid catalyst layer to cause a reaction. Specific examples include reaction systems such as a fixed bed circulation system, a fixed bed circulation system, and a fluidized bed circulation system. In the present invention, any of these reaction systems can be applied.
例えば、気相流通法では、気化させたオルトカルボン酸エステル(1)を固体触媒層に流通させるが、オルトカルボン酸エステル(1)は単体で流通させてもよく、キャリアガスとともに流通させてもよい。キャリアガスとしては特に制限されないが、窒素ガス、ヘリウムガス、アルゴンガス等の不活性ガス、又はこれらの混合ガスが好ましい。キャリアガスとともに流通させる場合のキャリアガスの使用量は、オルトカルボン酸エステル(1)の1モルに対して、0超〜20モルが好ましく、0超〜10モルがより好ましい。一般に、キャリアガスが多いとオルトカルボン酸エステル(1)の転化率が低下する、キャリアガス少ないと副生成物が生成する、固体触媒表面に炭化物等の不純物が付着して触媒活性が低下する、等の可能性がある。最適な使用量は反応温度、接触時間にも依存する。 For example, in the gas-phase flow method, the vaporized orthocarboxylic acid ester (1) is passed through the solid catalyst layer. However, the orthocarboxylic acid ester (1) may be passed alone or with the carrier gas. Good. The carrier gas is not particularly limited, but is preferably an inert gas such as a nitrogen gas, a helium gas, or an argon gas, or a mixed gas thereof. When used together with the carrier gas, the amount of the carrier gas used is preferably more than 0 to 20 mol, more preferably more than 0 to 10 mol, per 1 mol of the orthocarboxylic acid ester (1). In general, when the amount of the carrier gas is large, the conversion rate of the orthocarboxylic acid ester (1) is reduced. When the amount of the carrier gas is small, by-products are generated. And so on. The optimum amount depends on the reaction temperature and the contact time.
反応圧力は特に限定されず、加圧、常圧又は減圧でもよい。操作が容易であることから、反応圧力は、常圧から微加圧が好ましい。
所望によりスタティックミキサーやラシヒリング等の充填材を入れることができる。The reaction pressure is not particularly limited, and may be pressurized, normal pressure or reduced pressure. From the viewpoint of easy operation, the reaction pressure is preferably from normal pressure to slight pressure.
If desired, a filler such as a static mixer or Raschig ring can be added.
反応器の加熱方法は特に制限されないが、熱媒オイル、溶融塩、電気ヒーター、砂を用いて加熱する方法が好ましい。工程(i)の反応温度は100〜500℃が好ましく、120〜450℃がより好ましく、150〜400℃がさらに好ましい。一般に温度が低いとオルトカルボン酸エステル(1)の転化率が低下する、温度が高いと副生成物が生成する、固体触媒表面に炭化物等の不純物が付着して触媒活性が低下する、等の可能性がある。最適な反応温度は接触時間にも依存する。 The method of heating the reactor is not particularly limited, but a method of heating using a heating medium oil, a molten salt, an electric heater, and sand is preferable. The reaction temperature in the step (i) is preferably from 100 to 500C, more preferably from 120 to 450C, even more preferably from 150 to 400C. In general, when the temperature is low, the conversion of the orthocarboxylic acid ester (1) decreases, when the temperature is high, by-products are formed, impurities such as carbides adhere to the surface of the solid catalyst, and the catalytic activity decreases. there is a possibility. The optimum reaction temperature also depends on the contact time.
また、工程(i)の反応時間は、オルトカルボン酸エステル(1)と固体触媒が接触する時間(以下、「接触時間」という。)に相当する。接触時間は0.1〜60秒が好ましく、1〜30秒がより好ましい。一般に接触時間が短いとオルトカルボン酸エステル(1)の転化率が低下する、長いと副生成物が生成する、固体触媒表面に炭化物等の不純物が付着して触媒活性が低下する、等の可能性がある。最適な接触時間は反応温度に依存する。例えば、100℃で接触時間が極端に短いと実質的に反応が進行しない場合もあり、500℃において接触時間が極端に長いと、副生成物が生成したり、タールやオイルが生成することにより反応器が閉塞する場合もある。 In addition, the reaction time of the step (i) corresponds to a time during which the orthocarboxylic acid ester (1) comes into contact with the solid catalyst (hereinafter, referred to as “contact time”). The contact time is preferably from 0.1 to 60 seconds, more preferably from 1 to 30 seconds. In general, if the contact time is short, the conversion of the orthocarboxylic acid ester (1) decreases, if the contact time is long, by-products are generated, impurities such as carbides adhere to the surface of the solid catalyst, and the catalytic activity decreases. There is. The optimal contact time depends on the reaction temperature. For example, if the contact time is extremely short at 100 ° C., the reaction may not substantially proceed. If the contact time is extremely long at 500 ° C., by-products may be generated or tar or oil may be generated. The reactor may become blocked.
工程(i)は、固体触媒を使用することにより、従来では難しかったエテン誘導体(2)の製造を、取り扱い、生産性等において極めて有利な気相反応で行う工程である。 Step (i) is a step of using a solid catalyst to carry out the production of the ethene derivative (2), which was conventionally difficult, by a gas phase reaction which is extremely advantageous in handling, productivity and the like.
工程(i)の反応は、気相反応であるため、例えば管状の反応器にオルトカルボン酸エステル(1)を流通させる反応形式とすることにより連続的にエテン誘導体(2)を製造でき、バッチ式である従来の製造方法よりも生産性において極めて優れている。また、気相において反応を行うため生成物の分離が極めて容易である。さらに工程(i)は、腐蝕性の高い塩化水素等が生成せず、安全性が高く反応装置の制約が少なく工業的に極めて有利である。 Since the reaction in the step (i) is a gas phase reaction, the ethene derivative (2) can be continuously produced by, for example, a reaction system in which the orthocarboxylic acid ester (1) is passed through a tubular reactor, and the batch reaction can be performed. It is much better in productivity than the conventional manufacturing method which is a formula. Further, since the reaction is performed in the gas phase, separation of the product is extremely easy. Furthermore, in the step (i), highly corrosive hydrogen chloride or the like is not generated, the safety is high, and the restriction of the reactor is small, which is industrially extremely advantageous.
本発明の工程(i)に係る反応では、従来法では工業的、経済的に製造が難しかったR4およびR5がメチルであるエテン誘導体(2)(1,1−ジメトキシエテン)が容易かつ高収率で得られる。In the reaction according to the step (i) of the present invention, the ethene derivative (2) (1,1-dimethoxyethene) in which R 4 and R 5 are methyl, which was difficult to produce industrially and economically by the conventional method, is easily and easily obtained. Obtained in high yield.
工程(i)で得られたエテン誘導体(2)は、各種化学品の合成中間体として有用である。本発明においては、得られたエテン誘導体(2)を用いて、以下の工程(ii)を行い、目的とするハロゲン化アクリル酸エステルを得ることが好ましい。 The ethene derivative (2) obtained in the step (i) is useful as a synthetic intermediate for various chemicals. In the present invention, it is preferable to perform the following step (ii) using the obtained ethene derivative (2) to obtain a target halogenated acrylate.
[工程(ii)]
工程(ii)は、工程(i)で得られたエテン誘導体(2)を、塩基性化合物及び相間移動触媒の存在下に式(3)で表されるハロゲン化メタン(以下、単に「ハロゲン化メタン(3)」とも記す。)と反応させ、式(4)で表されるシクロプロパン誘導体(以下、単に「シクロプロパン誘導体(4)」とも記す。)を製造する工程である。[Step (ii)]
In the step (ii), the ethene derivative (2) obtained in the step (i) is converted into a halogenated methane represented by the formula (3) in the presence of a basic compound and a phase transfer catalyst (hereinafter simply referred to as “halogenated”). This is a step of producing a cyclopropane derivative represented by the formula (4) (hereinafter, also simply referred to as “cyclopropane derivative (4)”) by reacting with methane (3).
工程(ii)の反応に使用するエテン誘導体(2)は、工程(i)で得られたものを未精製のまま工程(ii)の反応に使用してもよく、精製した後に反応に使用してもよい。精製の方法としては、例えば溶媒を用いた抽出、蒸留、結晶化等の公知の方法が挙げられる。精製においては、工程(i)の生成物中に未反応のまま含まれていたオルトカルボン酸エステル(1)を分離して工程(i)で再利用することも可能であり、更に生産性を向上できる。 The ethene derivative (2) used in the reaction of the step (ii) may be used in the reaction of the step (ii) without purification, or the ethene derivative (2) obtained in the step (i) may be used in the reaction after purification. You may. Examples of the purification method include known methods such as extraction using a solvent, distillation, and crystallization. In the purification, it is also possible to separate the orthocarboxylic acid ester (1) which has been left unreacted in the product of the step (i) and reuse it in the step (i). Can be improved.
工程(ii)の反応においては、使用されるハロゲン化メタン(3)は、塩基性化合物の作用によりカルベンを生成し、エテン誘導体(2)の二重結合に挿入されると考えられる。 In the reaction of step (ii), the halogenated methane (3) used is considered to generate a carbene by the action of a basic compound and to be inserted into the double bond of the ethene derivative (2).
ハロゲン化メタン(3)としては、例えば、クロロホルム、ジクロロフルオロメタン、クロロジフルオロメタン、またはトリフルオロメタンが好ましい。
Xがフッ素原子であり、Yが塩素原子又はフッ素原子であるハロゲン化メタン(3)がより好ましく、ジクロロフルオロメタン、クロロジフルオロメタン、トリフルオロメタンがより好ましい。
Xがフッ素原子であり、Yが塩素原子であるハロゲン化メタン(3)がさらに好ましく、具体的には、ジクロロフルオロメタン、クロロジフルオロメタンがさらに好ましい。
ハロゲン化メタン(3)はガス化させて反応させてもよく、液体で反応させてもよい。また、反応液を同時に抜き出して連続的に行ってもよく、同時に抜き出さずにバッチ式で行ってもよい。生産性の観点から、連続的に行うのが有利である。
ハロゲン化メタン(3)の使用量は、エテン誘導体(2)の1モルに対して1モル以上が好ましく、1〜5モルがより好ましく、1〜2モルがさらに好ましい。As the halogenated methane (3), for example, chloroform, dichlorofluoromethane, chlorodifluoromethane, or trifluoromethane is preferable.
Halogenated methane (3) in which X is a fluorine atom and Y is a chlorine atom or a fluorine atom is more preferable, and dichlorofluoromethane, chlorodifluoromethane, and trifluoromethane are more preferable.
Halogenated methane (3) in which X is a fluorine atom and Y is a chlorine atom is more preferred, and specifically, dichlorofluoromethane and chlorodifluoromethane are more preferred.
The halogenated methane (3) may be reacted by gasification or may be reacted with a liquid. Further, the reaction solution may be simultaneously withdrawn and continuously performed, or may be performed in a batch system without simultaneously withdrawing the reaction solution. From the viewpoint of productivity, it is advantageous to carry out continuously.
The amount of the halogenated methane (3) to be used is preferably 1 mol or more, more preferably 1 to 5 mol, and still more preferably 1 to 2 mol, per 1 mol of the ethene derivative (2).
工程(ii)の反応に使用する塩基性化合物は、ハロゲン化メタン(3)からカルベンを生成させる反応を促進する化合物である。
塩基性化合物としては、水酸化ナトリウム、水酸化カリウム等のアルカリ土類又はアルカリ金属の水酸化物;ナトリウムメトキシド、ナトリウムエトキシド、t−ブトキシカリウム等のアルカリ金属アルコキシド;水素化ナトリウム等のアルカリ金属水素化物;ブチルリチウム等のアルキルリチウム;炭酸ナトリウム、炭酸カリウム等のアルカリ金属炭酸塩;リン酸ナトリウム、リン酸カリウム、リン酸水素ナトリウム、リン酸水素カリウム等のアルカリ金属リン酸水素塩又はアルカリ金属リン酸塩が好ましい。
より好ましい塩基性化合物は、アルカリ金属水酸化物、アルカリ金属アルコキシド、アルカリ金属水素化物又はアルキルリチウムである。さらに好ましい塩基性化合物は、アルカリ金属水酸化物である。最も好ましい塩基性化合物は水酸化ナトリウムまたは水酸化カリウムである。塩基性化合物は1種を単独で使用してもよく、2種以上を併用してもよい。これら塩基性化合物は水溶液として使用してもよく、有機溶媒に混合させて使用してもよい。塩基性化合物の溶媒中の濃度は、5〜60重量%が好ましく、10〜60重量%がより好ましい。塩基性化合物の溶液中の濃度が低いとエテン誘導体(2)の転化率が低下する、高いとエテン誘導体(2)の転化率が上がる。The basic compound used in the reaction of the step (ii) is a compound that promotes a reaction for producing a carbene from a halogenated methane (3).
Examples of the basic compound include hydroxides of alkaline earth or alkali metals such as sodium hydroxide and potassium hydroxide; alkali metal alkoxides such as sodium methoxide, sodium ethoxide and potassium t-butoxide; alkalis such as sodium hydride Metal hydrides; alkyl lithiums such as butyl lithium; alkali metal carbonates such as sodium carbonate and potassium carbonate; alkali metal hydrogen phosphates or alkalis such as sodium phosphate, potassium phosphate, sodium hydrogen phosphate, and potassium hydrogen phosphate Metal phosphates are preferred.
More preferred basic compounds are alkali metal hydroxides, alkali metal alkoxides, alkali metal hydrides or alkyllithiums. Further preferred basic compounds are alkali metal hydroxides. The most preferred basic compound is sodium hydroxide or potassium hydroxide. One basic compound may be used alone, or two or more basic compounds may be used in combination. These basic compounds may be used as an aqueous solution, or may be used by being mixed with an organic solvent. The concentration of the basic compound in the solvent is preferably 5 to 60% by weight, more preferably 10 to 60% by weight. If the concentration of the basic compound in the solution is low, the conversion of the ethene derivative (2) decreases, and if the concentration is high, the conversion of the ethene derivative (2) increases.
工程(ii)の反応に使用する塩基性化合物の使用量は、ハロゲン化メタン(3)からエテン化合物との反応に十分なカルベンを生成させることができる量であり、ハロゲン化メタン(3)の1モルに対して1〜10モルが好ましく、1〜8モルがより好ましく、1〜6モルがさらに好ましい。 The amount of the basic compound used in the reaction of the step (ii) is an amount capable of generating a carbene sufficient for the reaction with the ethene compound from the halogenated methane (3), 1 to 10 mol is preferable, 1 to 8 mol is more preferable, and 1 to 6 mol is more preferable for 1 mol.
工程(ii)の反応は、塩基性化合物とともに相間移動触媒を存在させて行われる。相間移動触媒としては、一般式(Ra)4M+A−(式中、Raは独立して水素原子又はC1−25炭化水素基であり、MはN又はPであり、AはOH、F、Br、Cl、I、HSO4、CN、CH3SO3又はPhCH2CO2である。ただし、Phはフェニル基を示す)で表される化合物やクラウンエーテルが好ましい。具体的には、テトラブチルアンモニウム塩、トリオクチルメチルアンモニウム塩、ベンジルジメチルオクタデシルアンモニウム塩等の4級アンモニウム塩が挙げられる。C1−25炭化水素基としては、炭素数1〜25の直鎖アルキル基が好ましく、炭素数1〜20の直鎖のアルキル基がより好ましい。好ましい相間移動触媒としては、テトラブチルアンモニウムブロミド、テトラブチルアンモニウムクロリド等の4級アンモニウム塩が好ましい。これら相間移動触媒は水溶液として使用してもよく、有機溶媒に混合させて使用してもよい。
相間移動触媒の使用量は、エテン誘導体(2)の質量に対して0.001〜5質量%が好ましく、0.01〜3質量%がより好ましく、0.05〜2質量%がさらに好ましい。
一般に、相間移動触媒を使用することにより反応を促進できる。また、汎用の相間移動触媒(4級アンモニウム塩等)の使用がコスト面で有利である。The reaction of step (ii) is performed in the presence of a phase transfer catalyst together with a basic compound. Examples of the phase transfer catalyst include a compound represented by the general formula (R a ) 4 M + A − (wherein Ra is independently a hydrogen atom or a C 1-25 hydrocarbon group, M is N or P, and A is OH, F, Br, Cl, I, HSO 4 , CN, CH 3 SO 3 or PhCH 2 CO 2 (wherein Ph represents a phenyl group), or a crown ether is preferable. Specific examples include quaternary ammonium salts such as tetrabutylammonium salt, trioctylmethylammonium salt, and benzyldimethyloctadecylammonium salt. As the C1-25 hydrocarbon group, a linear alkyl group having 1 to 25 carbon atoms is preferable, and a linear alkyl group having 1 to 20 carbon atoms is more preferable. As a preferable phase transfer catalyst, a quaternary ammonium salt such as tetrabutylammonium bromide and tetrabutylammonium chloride is preferable. These phase transfer catalysts may be used as an aqueous solution, or may be used by being mixed with an organic solvent.
The amount of the phase transfer catalyst to be used is preferably 0.001 to 5% by mass, more preferably 0.01 to 3% by mass, and still more preferably 0.05 to 2% by mass with respect to the mass of the ethene derivative (2).
Generally, the reaction can be promoted by using a phase transfer catalyst. Also, the use of a general-purpose phase transfer catalyst (such as a quaternary ammonium salt) is advantageous in terms of cost.
相間移動触媒は、水相と有機相の相間の触媒として使用してもよく、塩素化フッ素化炭化水素溶媒と炭化水素溶媒等のように、相分離する2つの有機相間の触媒として使用してもよい。一般に、相間移動触媒の使用により相分離する2種の溶媒を使用する反応を促進できる。 The phase transfer catalyst may be used as a catalyst between an aqueous phase and an organic phase, or as a catalyst between two organic phases to be phase-separated, such as a chlorinated fluorinated hydrocarbon solvent and a hydrocarbon solvent. Is also good. In general, the use of a phase transfer catalyst can facilitate a reaction using two solvents that phase separate.
工程(ii)の反応は、液相中で行い、溶媒の存在下に実施することが好ましい。
溶媒は、水、脂肪族炭化水素、ハロゲン化脂肪族炭化水素、芳香族炭化水素、又はハロゲン化芳香族炭化水素が好ましい。溶媒の具体例としては、ベンゼン、トルエン、キシレン、モノクロロベンゼン、ジクロロベンゼン、トリクロロベンゼン、石油エーテル類、ペンタン、ヘキサン、シクロヘキサン、ヘプタン、オクタン、ノナン、デカン、ウンデカン、ドデカン、トリデカン、テトラデカン、ジクロロメタン、クロロホルム、四塩化炭素が挙げられる。溶媒は、1種を単独で使用してもよく、2種以上を併用してもよい。
溶媒に水を用いる場合、有機溶媒と組み合わせて相乗的な効果が得られる。例えば、原料であるエテン誘導体(2)やハロゲン化メタン(3)、および生成物であるシクロプロパン誘導体(4)は有機相に存在するため、水との接触効率が下がることで、水による副反応を抑制できる。また、水溶性の塩基性化合物を使用する場合、水相で均一な状態となるため、局所的な副反応を抑制できる。
溶媒の使用量は、エテン誘導体(2)の100容積%に対して10〜1000容積%が好ましく、50〜800容積%がより好ましい。The reaction of the step (ii) is performed in a liquid phase, and is preferably performed in the presence of a solvent.
The solvent is preferably water, an aliphatic hydrocarbon, a halogenated aliphatic hydrocarbon, an aromatic hydrocarbon, or a halogenated aromatic hydrocarbon. Specific examples of the solvent include benzene, toluene, xylene, monochlorobenzene, dichlorobenzene, trichlorobenzene, petroleum ethers, pentane, hexane, cyclohexane, heptane, octane, nonane, decane, undecane, dodecane, tridecane, tetradecane, dichloromethane, Chloroform and carbon tetrachloride. One type of solvent may be used alone, or two or more types may be used in combination.
When water is used as a solvent, a synergistic effect can be obtained in combination with an organic solvent. For example, since the ethene derivative (2) and the halogenated methane (3) as raw materials and the cyclopropane derivative (4) as a product are present in the organic phase, the contact efficiency with water is reduced, so that the secondary The reaction can be suppressed. In addition, when a water-soluble basic compound is used, a uniform state is formed in the aqueous phase, so that local side reactions can be suppressed.
The use amount of the solvent is preferably from 10 to 1000% by volume, more preferably from 50 to 800% by volume, based on 100% by volume of the ethene derivative (2).
工程(ii)において、エテン誘導体(2)、ハロゲン化メタン(3)、塩基性化合物、相間移動触媒を反応容器に導入する順序に特に限定はなく、同時に反応器に導入し、混合してもよい。また、塩基性化合物、相間移動触媒を反応器中で混合しておいてからエテン誘導体(2)、ハロゲン化メタン(3)を、逐次又は同時に投入してもよい。また、ハロゲン化メタン(3)を最後に投入してもよい。
一般に反応を行う際、予め溶媒や触媒等を混合し、その後原料等を逐次又は同時に投入する。反応の発熱量が大きい場合は、原料の全て又は一部を逐次投入するのが好ましい。In the step (ii), the order of introducing the ethene derivative (2), the halogenated methane (3), the basic compound, and the phase transfer catalyst into the reaction vessel is not particularly limited. Good. Further, after mixing the basic compound and the phase transfer catalyst in the reactor, the ethene derivative (2) and the halogenated methane (3) may be added sequentially or simultaneously. Further, the halogenated methane (3) may be added last.
In general, when a reaction is performed, a solvent, a catalyst, and the like are mixed in advance, and then, raw materials and the like are sequentially or simultaneously charged. When the calorific value of the reaction is large, it is preferable to charge all or a part of the raw materials sequentially.
工程(ii)の反応温度は、−20℃〜+50℃が好ましく、−10℃〜+40℃がより好ましく、0℃〜+30℃がさらに好ましい。反応圧力は特に限定されず、加圧、常圧又は減圧のいずれでも反応を行うことができる。 The reaction temperature in the step (ii) is preferably from -20C to + 50C, more preferably from -10C to + 40C, and still more preferably from 0C to + 30C. The reaction pressure is not particularly limited, and the reaction can be carried out under any of pressurization, normal pressure or reduced pressure.
工程(ii)の反応は連続的に行うことができ、バッチ式である従来の製造方法よりも生産性において極めて優れている。さらに、腐蝕性の高い塩化水素等が生成せず、安全性が高く反応装置の制約が少なく工業的に極めて有利である。 The reaction of the step (ii) can be carried out continuously, and is extremely superior in productivity as compared with a conventional batch-type production method. Further, highly corrosive hydrogen chloride and the like are not generated, and the safety is high, and there are few restrictions on the reactor, which is industrially extremely advantageous.
工程(i)で得られたエテン誘導体(2)を未精製のまま工程(ii)に使用した場合、シクロプロパン誘導体(4)とともに、工程(i)で生じたR3OHに起因して下式(8)で表される化合物(以下、該化合物を「プロペン誘導体(8)」とも記す。)が生成する。When the ethene derivative (2) obtained in the step (i) is used in the step (ii) without purification, the ethene derivative (2) is added together with the cyclopropane derivative (4) due to R 3 OH generated in the step (i). A compound represented by the formula (8) (hereinafter, the compound is also referred to as “propene derivative (8)”) is produced.
(式中、R1、R2、R3、R4、R5及びXは前記の通りである。)(In the formula, R 1 , R 2 , R 3 , R 4 , R 5 and X are as described above.)
プロペン誘導体(8)は、溶媒の存在下に、酸性条件下で分解することにより後述する工程(iii)の生成物であるハロゲン化アクリル酸エステル誘導体(5)へと変換できる。よって、プロペン誘導体(8)を回収し、ハロゲン化アクリル酸エステルを製造することにより、収率と生産性を向上できる。 The propene derivative (8) can be converted into a halogenated acrylate derivative (5), which is a product of the step (iii) described below, by decomposing it under acidic conditions in the presence of a solvent. Therefore, the yield and productivity can be improved by recovering the propene derivative (8) and producing a halogenated acrylate.
プロペン誘導体(8)の分解反応は、酸性条件下で行うことが好ましく、pH0〜7で行うことが好ましく、pH0〜5で行うことがより好ましい。酸性条件下とするには、反応系中に塩酸、硫酸等の酸を存在させることが好ましい。分解反応に使用する溶媒は、メタノール、エタノールなどのアルコール類が好ましい。また、溶媒の使用量は、プロペン誘導体(8)の100容積%に対して、10〜1000容積%が好ましく、20〜800容積%がより好ましい。反応温度は、−20〜+100℃が好ましく、−10〜+80℃がより好ましい。 The decomposition reaction of the propene derivative (8) is preferably performed under acidic conditions, preferably at pH 0 to 7, and more preferably at pH 0 to 5. In order to achieve acidic conditions, it is preferable that an acid such as hydrochloric acid or sulfuric acid be present in the reaction system. The solvent used for the decomposition reaction is preferably an alcohol such as methanol or ethanol. The amount of the solvent used is preferably from 10 to 1000% by volume, more preferably from 20 to 800% by volume, based on 100% by volume of the propene derivative (8). The reaction temperature is preferably −20 to + 100 ° C., and more preferably −10 to + 80 ° C.
好ましいプロペン誘導体(8)としては、例えば下式(7)で表される化合物が挙げられる。 Preferred propene derivatives (8) include, for example, compounds represented by the following formula (7).
(式中、Meはメチル基を表す。)
工程(ii)で得られたシクロプロパン誘導体(4)は、医薬、ポリマー等の中間体として有用である。特に、式(4)においてXがフッ素原子であり、Yが塩素原子又はフッ素原子であるシクロプロパン誘導体(4)は有用である。(In the formula, Me represents a methyl group.)
The cyclopropane derivative (4) obtained in the step (ii) is useful as an intermediate for medicines, polymers and the like. Particularly, the cyclopropane derivative (4) in which X is a fluorine atom and Y is a chlorine atom or a fluorine atom in the formula (4) is useful.
さらに、下式(6)で表される化合物は、新規な化合物である。 Further, the compound represented by the following formula (6) is a novel compound.
(式中、Meはメチル基を表し、Y1は塩素原子またはフッ素原子を表す。)
式(6)で表される化合物の具体例としては、下記化合物が挙げられる。(In the formula, Me represents a methyl group, and Y 1 represents a chlorine atom or a fluorine atom.)
Specific examples of the compound represented by the formula (6) include the following compounds.
(式中、Meはメチル基を表す。)
例えば、従来報告されている、R1及びR2が共に水素原子であり、R4及びR5が共にエチル基であり、Xがフッ素原子であり、かつYが塩素原子であるシクロプロパン誘導体(4)は沸点が高いため、分解を抑えるために低温で蒸留精製を行うことが非常に困難であった。たとえば、通常の減圧蒸留装置を用いて減圧蒸留した場合、減圧蒸留可能な最低温度である50℃で蒸留精製した場合には、該シクロプロパン誘導体(4)は20%以上分解する。それと比較して、本発明の式(6)で表される化合物は、沸点が低いため、同一の減圧蒸留装置を用いて20℃以下にて蒸留精製が可能であり、その分解を1%未満に抑制できるため、工業経済的に非常に有用である。(In the formula, Me represents a methyl group.)
For example, conventionally reported cyclopropane derivatives in which R 1 and R 2 are both hydrogen atoms, R 4 and R 5 are both ethyl groups, X is a fluorine atom, and Y is a chlorine atom ( Since 4) had a high boiling point, it was very difficult to carry out distillation purification at a low temperature in order to suppress decomposition. For example, when vacuum distillation is performed using a general vacuum distillation apparatus, when distillation and purification are performed at 50 ° C., which is the lowest temperature at which vacuum distillation is possible, the cyclopropane derivative (4) is decomposed by 20% or more. In comparison, the compound represented by the formula (6) of the present invention has a low boiling point, so that it can be purified by distillation at 20 ° C. or less using the same vacuum distillation apparatus, and its decomposition is less than 1%. Therefore, it is very useful industrially and economically.
[工程(iii)]
工程(iii)は、工程(ii)で得られたシクロプロパン誘導体(4)を、液相又は気相において加熱することにより、脱R4Y反応させ、式(5)で表されるハロゲン化アクリル酸エステル誘導体(以下、単に「ハロゲン化アクリル酸エステル誘導体(5)」とも記す。)を製造する工程である。[Step (iii)]
In the step (iii), the cyclopropane derivative (4) obtained in the step (ii) is heated in a liquid phase or a gaseous phase to cause a de-R 4 Y reaction, thereby obtaining a halogenated compound represented by the formula (5). This is a step of producing an acrylate derivative (hereinafter, also simply referred to as “halogenated acrylate derivative (5)”).
工程(iii)で使用するシクロプロパン誘導体(4)は、工程(ii)で得られたものを未精製のまま工程(iii)の反応に使用してもよく、精製した後に使用してもよい。シクロプロパン誘導体(4)の精製方法としては、例えば溶媒を用いた抽出、蒸留、又は結晶化等の公知の方法を使用できる。
精製の際に、工程(ii)で得られたシクロプロパン誘導体(4)中に未反応のまま含まれているエテン誘導体(2)やハロゲン化メタン(3)を分離して工程(ii)に戻すことも可能である。The cyclopropane derivative (4) used in the step (iii) may be used in the reaction of the step (iii) without purification of the compound obtained in the step (ii), or may be used after purification. . As a method for purifying the cyclopropane derivative (4), a known method such as extraction with a solvent, distillation, or crystallization can be used.
At the time of purification, the ethene derivative (2) and the halogenated methane (3) contained in the cyclopropane derivative (4) obtained in the step (ii), which are not reacted, are separated and subjected to the step (ii). It is also possible to return.
工程(iii)は、工程(ii)で得たシクロプロパン誘導体(4)を反応器中で加熱する。工程(iii)の反応は脱離反応であり、式R4Yで表される化合物が脱離する。工程(iii)の反応は、気相で行ってもよく、液相で行ってもよい。工程(iii)の反応温度は、80℃〜400℃が好ましく、100℃〜350℃がより好ましく、120℃〜300℃がさらに好ましい。反応圧力は特に限定されず、加圧、常圧又は減圧のいずれでも行うことができる。一般に温度が低いとシクロプロパン誘導体(4)の転化率が低下する、高いと副生成物が生成する、重合が促進される、等の可能性がある。最適な反応温度は接触時間に依存する。In the step (iii), the cyclopropane derivative (4) obtained in the step (ii) is heated in a reactor. The reaction of the step (iii) is an elimination reaction, and the compound represented by the formula R 4 Y is eliminated. The reaction of step (iii) may be performed in a gas phase or in a liquid phase. The reaction temperature in the step (iii) is preferably from 80 ° C to 400 ° C, more preferably from 100 ° C to 350 ° C, even more preferably from 120 ° C to 300 ° C. The reaction pressure is not particularly limited, and the reaction can be performed under any of pressurization, normal pressure or reduced pressure. In general, when the temperature is low, there is a possibility that the conversion of the cyclopropane derivative (4) is reduced, and when the temperature is high, by-products are generated, polymerization is accelerated, and the like. The optimal reaction temperature depends on the contact time.
液相または気相で行う場合、予め加熱した反応器に原料を導入してもよく、加熱する前に導入してもよく、予め加熱して実施するのが好ましい。また、ハロゲン化アクリル酸エステル誘導体(5)を含む反応液や反応ガスを同時に抜き出して連続的に行ってもよく、同時に抜き出さずにバッチ式で行ってもよい。生産性の観点から、連続的に行うのが有利である。 When the reaction is performed in a liquid phase or a gaseous phase, the raw materials may be introduced into a preheated reactor, or may be introduced before heating, and it is preferable to heat the reactor in advance. Further, the reaction solution or the reaction gas containing the halogenated acrylic acid ester derivative (5) may be extracted simultaneously and continuously, or may be batch-wise extracted without being extracted simultaneously. From the viewpoint of productivity, it is advantageous to carry out continuously.
工程(iii)において、連続的に反応を行う場合、反応器内における滞留時間はシクロプロパン誘導体(4)が十分に転化される時間であればよく、1秒以上が好ましく、10秒以上がより好ましく、30秒以上がさらに好ましい。また、重合等の副反応を抑制する観点から、5時間以内が好ましく、2時間以内がより好ましく、1時間以内がさらに好ましい。一般に接触時間が短いとシクロプロパン誘導体(4)の転化率が低下する、長いと副生成物が生成する、重合が促進される、等の可能性がある。 In the case where the reaction is continuously performed in the step (iii), the residence time in the reactor may be a time during which the cyclopropane derivative (4) is sufficiently converted, and is preferably 1 second or more, more preferably 10 seconds or more. Preferably, it is more preferably 30 seconds or more. Further, from the viewpoint of suppressing side reactions such as polymerization, the time is preferably within 5 hours, more preferably within 2 hours, further preferably within 1 hour. In general, if the contact time is short, there is a possibility that the conversion of the cyclopropane derivative (4) decreases, and if the contact time is long, a by-product is generated, and polymerization is accelerated.
工程(iii)を液相において行う場合には溶媒の存在下又は不存在下に実施でき、溶媒の存在下に実施することが好ましい。工程(iii)において溶媒を使用する場合、溶媒は加熱に対して安定であり、工程(iii)の反応において不活性な溶媒が好ましい。溶媒としては、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素溶媒;モノクロロベンゼン、ジクロロベンゼン、トリクロロベンゼン等のハロゲン化芳香族炭化水素溶媒;シクロヘキサン、ヘプタン、オクタン、ノナン、デカン、ウンデカン、ドデカン、トリデカン、テトラデカン等の炭化水素溶媒;メタノール、エタノール、プロパノール等のアルコール溶媒;クロロホルム、四塩化炭素等のハロゲン化炭化水素溶媒が好ましい。
溶媒の使用量は、シクロプロパン誘導体(4)の100容積%に対して0〜1000容積%が好ましく、0〜800容積%がより好ましい。When the step (iii) is carried out in a liquid phase, it can be carried out in the presence or absence of a solvent, and is preferably carried out in the presence of a solvent. When a solvent is used in step (iii), the solvent is stable to heating and is preferably an inert solvent in the reaction of step (iii). Examples of the solvent include aromatic hydrocarbon solvents such as benzene, toluene, and xylene; halogenated aromatic hydrocarbon solvents such as monochlorobenzene, dichlorobenzene, and trichlorobenzene; cyclohexane, heptane, octane, nonane, decane, undecane, dodecane; Preferred are hydrocarbon solvents such as tridecane and tetradecane; alcohol solvents such as methanol, ethanol and propanol; and halogenated hydrocarbon solvents such as chloroform and carbon tetrachloride.
The amount of the solvent used is preferably from 0 to 1000% by volume, more preferably from 0 to 800% by volume, based on 100% by volume of the cyclopropane derivative (4).
工程(iii)で得られたハロゲン化アクリル酸エステル誘導体(5)は、例えば溶媒を用いた抽出、蒸留、又は結晶化等の公知の方法により精製できる。
また、工程(iii)で得られたハロゲン化アクリル酸エステル誘導体(5)は、構造によっては工程(iii)の途中や単離精製後に容易に重合してポリマーを生成する場合もある。その場合には重合禁止剤の添加によって工程(iii)の途中や単離精製後において重合を防ぐことが好ましい。The halogenated acrylate derivative (5) obtained in the step (iii) can be purified by a known method such as extraction with a solvent, distillation, or crystallization.
The halogenated acrylate derivative (5) obtained in the step (iii) may be easily polymerized during the step (iii) or after isolation and purification to produce a polymer, depending on the structure. In this case, it is preferable to prevent polymerization during the step (iii) or after isolation and purification by adding a polymerization inhibitor.
重合禁止剤としては、2,2,6,6−テトラメチルピペリジンN−オキシル、p−ベンゾキノン、ヒドロキノン、メトキノン、2,6−ジ−tert−ブチル−4−メチルフェノール(BHT)、4−tert−ブチルカテコール、tert−ブチルヒドロキノン、2,5−ジ−tert−ブチルヒドロキノン、1,2,4−トリヒドロキシベンゼン、ロイコキニザリン、クロラニル、フェノチアジン、Q−1300、Q−1301、テトラエチルチラウムジスルフィド、硫黄等が好ましく、ヒドロキノン、2,6−ジ−tert−ブチル−4−メチルフェノール(BHT)、フェノチアジンがより好ましい。重合禁止剤は、1種を単独で使用してもよく、2種以上を併用してもよい。
重合禁止剤の使用量は、工程(iii)で得られたハロゲン化アクリル酸エステル誘導体(5)に対して10ppm以上が好ましく、20〜50000ppmが特に好ましい。重合禁止剤の使用量が少ないと重合禁止効果が低く、多いと廃棄物の量が増える、コスト面で劣る等の可能性がある。Examples of the polymerization inhibitor include 2,2,6,6-tetramethylpiperidine N-oxyl, p-benzoquinone, hydroquinone, methoquinone, 2,6-di-tert-butyl-4-methylphenol (BHT), and 4-tert. -Butylcatechol, tert-butylhydroquinone, 2,5-di-tert-butylhydroquinone, 1,2,4-trihydroxybenzene, leucoquinizarin, chloranil, phenothiazine, Q-1300, Q-1301, tetraethyltyrium disulfide, sulfur And the like, and hydroquinone, 2,6-di-tert-butyl-4-methylphenol (BHT), and phenothiazine are more preferable. One type of polymerization inhibitor may be used alone, or two or more types may be used in combination.
The amount of the polymerization inhibitor to be used is preferably at least 10 ppm, particularly preferably from 20 to 50,000 ppm, based on the halogenated acrylate derivative (5) obtained in the step (iii). If the amount of the polymerization inhibitor is small, the effect of inhibiting the polymerization is low. If the amount is large, there is a possibility that the amount of waste increases and the cost is inferior.
重合禁止剤の添加方法は、特に制限されず、ハロゲン化アクリル酸エステル誘導体(5)が存在する系に重合禁止剤を存在させることが好ましい。具体的には、反応系中、蒸留精製時の釜の中、及び蒸留精製後のハロゲン化アクリル酸エステル誘導体(5)に重合禁止剤を存在させることが好ましい。また、蒸留精製の際に、重合禁止剤とエアレーションを組み合わせることにより、ハロゲン化アクリル酸エステル誘導体(5)の気相状態での自己重合も効果的に抑制できる。蒸留中のエアレーションにおける酸素導入量は特に制限はないが、蒸留のシステム全体を含めて爆発が誘発されない量であればよい。 The method for adding the polymerization inhibitor is not particularly limited, and it is preferable that the polymerization inhibitor be present in a system in which the halogenated acrylate derivative (5) is present. Specifically, it is preferable that a polymerization inhibitor is present in the reaction system, in the kettle during distillation purification, and in the halogenated acrylate derivative (5) after distillation purification. In addition, by combining the polymerization inhibitor and aeration during distillation purification, self-polymerization of the halogenated acrylate derivative (5) in the gas phase can be effectively suppressed. The amount of oxygen introduced during aeration during distillation is not particularly limited, but may be any amount that does not induce explosion, including the entire distillation system.
工程(iii)の反応は連続的に実施でき、バッチ式である従来の製造方法よりも生産性に極めて優れている。また、気相において反応を行う場合、生成物の分離が極めて容易である。さらに、腐蝕性の高い塩化水素等の生成もなく、安全性が高く反応装置の制約が少なく工業的に極めて有利である。 The reaction of the step (iii) can be carried out continuously, and is extremely superior in productivity as compared with a conventional batch-type production method. When the reaction is carried out in the gas phase, the separation of the product is extremely easy. Further, there is no generation of highly corrosive hydrogen chloride and the like, and the safety is high, and there are few restrictions on the reactor, which is extremely advantageous industrially.
ハロゲン化アクリル酸エステル誘導体(5)は、医薬品、ポリマー、光学材料、塗料、半導体レジスト材料等の原料として有用である。特にα−フルオロアクリル酸エステル誘導体は、医薬用途や、ポリマーや光学材料の基礎原料として極めて有用である。
つまり、本発明の製造方法によって得られた式(5)で表されるハロゲン化アクリル酸エステル誘導体を重合させることにより、該ハロゲン化アクリル酸エステル誘導体に基づく重合単位を含む重合体の製造方法が、工業経済的に実現する。The halogenated acrylate derivative (5) is useful as a raw material for pharmaceuticals, polymers, optical materials, paints, semiconductor resist materials and the like. In particular, α-fluoroacrylic acid ester derivatives are extremely useful for medical applications and as basic materials for polymers and optical materials.
That is, by polymerizing the halogenated acrylate derivative represented by the formula (5) obtained by the production method of the present invention, a method for producing a polymer containing a polymerized unit based on the halogenated acrylate derivative is achieved. Realized industrially and economically.
そのようなハロゲン化アクリル酸エステル誘導体(5)としては、例えば、下式(9)で表される化合物が挙げられる。 Examples of such a halogenated acrylate derivative (5) include a compound represented by the following formula (9).
(式中、Meはメチル基を表す。)
前記の工程(i)〜(iii)は単独で行うこともできるが、連続で行うことが工業的には有利である。例えば、工程(i)を気相中で行った後、生成物を冷却し、未精製のまま工程(ii)を液相中で行い、工程(ii)の生成物を未精製のまま加熱して工程(iii)を行う連続プロセスとして実施できる。このような連続フローに、前記したように未反応の原料を分離して前工程に戻す経路を更に加えることにより、一層生産的なプロセスを構築できる。(In the formula, Me represents a methyl group.)
The above steps (i) to (iii) can be performed alone, but it is industrially advantageous to perform them continuously. For example, after performing step (i) in the gas phase, cooling the product, performing step (ii) in the liquid phase unpurified, and heating the product of step (ii) unpurified. Step (iii) can be carried out as a continuous process. As described above, a path that separates unreacted raw materials and returns to the previous step is further added to such a continuous flow, whereby a more productive process can be constructed.
本発明の各工程(i)〜(iii)は、下記の反応基質において行うことが好ましい。各工程において得られる中間体や最終製品の化合物は、医薬、ポリマー等の中間体として有用な化合物である。 Each of the steps (i) to (iii) of the present invention is preferably performed using the following reaction substrate. The intermediate or the final product compound obtained in each step is a compound useful as an intermediate such as a drug or a polymer.
(式中、Meはメチル基を表す。) (In the formula, Me represents a methyl group.)
以下、実施例により本発明を具体的に説明するが、本発明はこれらの例によって限定されるものではない。 Hereinafter, the present invention will be described specifically with reference to Examples, but the present invention is not limited to these Examples.
[実施例1〜3、比較例1]
<触媒の調製> 直径4.8mm、長さ9.8mmの円柱状酸化亜鉛(比表面積39m2/g、固体酸量0.1mmol/g(NH3換算)、日揮触媒化成社製“N748”)触媒を内径15mm、長さ300mmのSUS316製反応管に充填し、電気ヒーターを取り付けた。触媒層の温度が250℃になるように加熱して窒素を3時間流通し触媒を乾燥させた。[Examples 1 to 3, Comparative Example 1]
<Preparation of Catalyst> Columnar zinc oxide having a diameter of 4.8 mm and a length of 9.8 mm (specific surface area 39 m 2 / g, solid acid amount 0.1 mmol / g (in terms of NH 3 ), “N748” manufactured by JGC Catalysts and Chemicals, Inc.) ) The catalyst was filled in a SUS316 reaction tube having an inner diameter of 15 mm and a length of 300 mm, and an electric heater was attached. The temperature of the catalyst layer was heated to 250 ° C., and nitrogen was passed for 3 hours to dry the catalyst.
<工程(i)> 触媒層の温度が表1に記載の温度になるように電気ヒーターで加熱し、表1に示す条件で原料のオルト酢酸トリメチルを流通させることで反応を実施した。反応器出口の粗液を0℃のコールドトラップで捕集しガスクロマトグラフで分析することで反応生成物の組成解析を行った。また、比較例として固体触媒を使用せずに実施例1と同様の操作で反応を行った。結果を表1に示す。 <Step (i)> The reaction was carried out by heating with an electric heater so that the temperature of the catalyst layer became the temperature shown in Table 1, and flowing trimethyl orthoacetate as a raw material under the conditions shown in Table 1. The crude liquid at the outlet of the reactor was collected by a cold trap at 0 ° C. and analyzed by gas chromatography to analyze the composition of the reaction product. In addition, as a comparative example, a reaction was performed in the same operation as in Example 1 without using a solid catalyst. Table 1 shows the results.
また、充填カラムを用いた常圧蒸留で分留することにより1,1−ジメトキシエテンが無色の液体として得られる。
1,1−ジメトキシエテンの1H−NMRを下に示す。
1H−NMR(400MHz,CDCl3),δppm;2.91(s,2H),3.41(s,6H)。Further, 1,1-dimethoxyethene is obtained as a colorless liquid by fractional distillation under atmospheric pressure using a packed column.
The 1 H-NMR of 1,1-dimethoxyethene is shown below.
1 H-NMR (400 MHz, CDCl 3 ), δ ppm; 2.91 (s, 2H), 3.41 (s, 6H).
[実施例4〜6]
触媒を変える以外は全て実施例2と同様の操作で反応を行った。結果を表2に示す。[Examples 4 to 6]
The reaction was carried out in the same manner as in Example 2 except that the catalyst was changed. Table 2 shows the results.
※触媒1:球状α−アルミナ(比表面積3m2/g、固体酸量0.9mmol/g(NH3換算)、ニッカトー社製“HDボール”)
※触媒2:円柱状γ−アルミナ(比表面積280m2/g、固体酸量0.2mmol/g(NH3換算)、N.E.ケムキャット社製“selexsorb COS”)
※触媒3:5%酸化亜鉛−酸化ジルコニウム(比表面積60m2/g、固体酸量0.06mmol/g(NH3換算)、N.E.ケムキャット社製)* Catalyst 1: Spherical α-alumina (specific surface area 3 m 2 / g, solid acid amount 0.9 mmol / g (NH 3 conversion), Nikkato “HD ball”)
* Catalyst 2: Columnar γ-alumina (specific surface area: 280 m 2 / g, solid acid amount: 0.2 mmol / g (converted to NH 3 ), “Selexsorb COS” manufactured by NE Chemcat)
* Catalyst 3: 5% zinc oxide-zirconium oxide (specific surface area 60 m 2 / g, solid acid amount 0.06 mmol / g (NH 3 equivalent), NE Chemcat)
[実施例7〜15]
触媒を変える以外は全て実施例2と同様の操作で反応を行った。結果を表3に示す。[Examples 7 to 15]
The reaction was carried out in the same manner as in Example 2 except that the catalyst was changed. Table 3 shows the results.
[実施例16(工程(ii))]
300mlのフラスコに、1,1−ジメトキシエテン20g、テトラブチルアンモニウムブロミド0.1g、48%水酸化カリウム水溶液80g、ヘキサン40gを混合し、5℃に冷却し、撹拌したところへ、ジクロロフルオロメタン32gを反応温度が10℃を超えないように連続フィードした。ジクロロフルオロメタンのフィード終了後、ガスクロマトグラフで1,1−ジメトキシエテンの消失を確認してから蒸留水40gを添加し、有機層を二層分離した。得られた有機層粗液中に含まれる1−クロロ−1−フルオロ−2,2−ジメトキシシクロプロパンの含量は1H−NMR(内部標準法による定量)より29gであった。収率は83.6%であった。
1−クロロ−1−フルオロ−2,2−ジメトキシシクロプロパンの1H−NMR及び19F−NMRを下に示す。
1H−NMR(400MHz,CDCl3),δppm;1.51(dd,1H),1.74(dd,1H),3.47(s,3H),3.49(s,3H)。
19F−NMR(400MHz,CDCl3),δppm;−147.35(dd,1F)。[Example 16 (Step (ii))]
In a 300 ml flask, 20 g of 1,1-dimethoxyethene, 0.1 g of tetrabutylammonium bromide, 80 g of a 48% aqueous solution of potassium hydroxide, and 40 g of hexane were mixed, cooled to 5 ° C., and stirred, whereupon 32 g of dichlorofluoromethane was added. Was continuously fed so that the reaction temperature did not exceed 10 ° C. After the feed of dichlorofluoromethane was completed, the disappearance of 1,1-dimethoxyethene was confirmed by gas chromatography, and then 40 g of distilled water was added, and the organic layer was separated into two layers. The content of 1 -chloro-1-fluoro-2,2-dimethoxycyclopropane contained in the obtained crude organic layer liquid was 29 g by 1 H-NMR (quantification by an internal standard method). The yield was 83.6%.
1 H-NMR and 19 F-NMR of 1 -chloro-1-fluoro-2,2-dimethoxycyclopropane are shown below.
1 H-NMR (400 MHz, CDCl 3 ), δ ppm; 1.51 (dd, 1H), 1.74 (dd, 1H), 3.47 (s, 3H), 3.49 (s, 3H).
19 F-NMR (400 MHz, CDCl 3 ), δ ppm; -147.35 (dd, 1F).
また、2−フルオロ−3,3,3−トリメトキシ−1−プロペンの含量は1H−NMR(内部標準法による定量)より1.7gであった。収率は5.0%であった。
2−フルオロ−3,3,3−トリメトキシ−1−プロペンの1H−NMR及び19F−NMRを下に示す。
1H−NMR(400MHz,CDCl3),δppm;3.22(s,9H),5.22(dd,1H),6.92(dd,1H)。
19F−NMR(400MHz,CDCl3),δppm;−126.09(dd,1F)。Further, the content of 2-fluoro-3,3,3-trimethoxy-1-propene was 1.7 g by 1 H-NMR (quantification by an internal standard method). Yield was 5.0%.
The 1 H-NMR and 19 F-NMR of 2-fluoro-3,3,3-trimethoxy-1-propene are shown below.
1 H-NMR (400 MHz, CDCl 3 ), δ ppm; 3.22 (s, 9H), 5.22 (dd, 1H), 6.92 (dd, 1H).
19 F-NMR (400 MHz, CDCl 3 ), δ ppm; -126.09 (dd, 1F).
なお、実施例16で製造した1−クロロ−1−フルオロ−2,2−ジメトキシシクロプロパンを含む有機層粗液を、充填カラムを用いた減圧蒸留装置により蒸留した場合、バス温20℃、圧力13hPaにて蒸留可能であった。得られた1−クロロ−1−フルオロ−2,2−ジメトキシシクロプロパンは無色の液体であり、蒸留における1−クロロ−1−フルオロ−2,2−ジメトキシシクロプロパンの分解率は1%未満であった。
一方、同一の減圧蒸留装置を用いて、実施例16における1,1−ジメトキシエテンを1,1−ジエトキシエテンに変更する以外は同様にして得た、1−クロロ−1−フルオロ−2,2−ジエトキシシクロプロパンを含む有機層粗液を蒸留した場合、バス温50℃、圧力10hPaの条件にて蒸留可能であった。しかし、蒸留における1−クロロ−1−フルオロ−2,2−ジエトキシシクロプロパンの分解率が24%であった。In addition, when the organic layer crude liquid containing 1-chloro-1-fluoro-2,2-dimethoxycyclopropane produced in Example 16 was distilled by a reduced pressure distillation apparatus using a packed column, the bath temperature was 20 ° C. and the pressure was 20 ° C. Distillation was possible at 13 hPa. The obtained 1-chloro-1-fluoro-2,2-dimethoxycyclopropane is a colorless liquid, and the decomposition rate of 1-chloro-1-fluoro-2,2-dimethoxycyclopropane in distillation is less than 1%. there were.
On the other hand, using the same vacuum distillation apparatus, 1-chloro-1-fluoro-2, obtained in the same manner as in Example 16 except that 1,1-dimethoxyethene was changed to 1,1-diethoxyethene. When the organic layer crude liquid containing 2-diethoxycyclopropane was distilled, distillation was possible under the conditions of a bath temperature of 50 ° C. and a pressure of 10 hPa. However, the decomposition rate of 1-chloro-1-fluoro-2,2-diethoxycyclopropane in distillation was 24%.
[実施例17〜22]
テトラブチルアンモニウムブロミド、48%水酸化カリウム水溶液、ジクロロフルオロメタンの使用量を変える以外は、実施例16と同様の操作で反応を行った。結果を表4に示す。表中、TBABはテトラブチルアンモニウムブロミドを、KOH溶液は48%水酸化カリウム水溶液を、CHCl2Fはジクロロフルオロメタンを示す。[Examples 17 to 22]
The reaction was carried out in the same manner as in Example 16, except that the amounts of tetrabutylammonium bromide, 48% aqueous potassium hydroxide solution and dichlorofluoromethane were changed. Table 4 shows the results. In the table, TBAB indicates tetrabutylammonium bromide, KOH solution indicates a 48% aqueous potassium hydroxide solution, and CHCl 2 F indicates dichlorofluoromethane.
[実施例23]
ジクロロフルオロメタン32gをクロロジフルオロメタン27gに変える以外は、実施例16と同様の操作で反応を行った。得られた有機層粗液中に含まれる1,1−ジフルオロ−2,2−ジメトキシシクロプロパンの含量は1H−NMR(内部標準法による定量)より26gであった。収率は81.5%であった。
1,1−ジフルオロ−2,2−ジメトキシシクロプロパンの1H−NMR及び19F−NMRを下に示す。
1H−NMR(400MHz,CDCl3),δppm;1.55(m,2H),3.30(s,6H)。
19F−NMR(400MHz,CDCl3),δppm;−145.25(m,2F)。[Example 23]
The reaction was carried out in the same manner as in Example 16, except that 32 g of dichlorofluoromethane was changed to 27 g of chlorodifluoromethane. The content of 1,1-difluoro-2,2-dimethoxycyclopropane contained in the obtained crude organic layer solution was 26 g by 1 H-NMR (quantification by an internal standard method). The yield was 81.5%.
The 1 H-NMR and 19 F-NMR of 1,1-difluoro-2,2-dimethoxycyclopropane are shown below.
1 H-NMR (400 MHz, CDCl 3 ), δ ppm; 1.55 (m, 2H), 3.30 (s, 6H).
19 F-NMR (400 MHz, CDCl 3 ), δ ppm; -145.25 (m, 2F).
[実施例24(工程(iii))]
反応蒸留用の受器(0℃に冷却、重合禁止剤として2,6−ジ−tert−ブチル−4−メチルフェノール(BHT)0.5gを初期添加)を接続した100mlの三口フラスコに2,6−ジ−tert−ブチル−4−メチルフェノール(BHT)0.5g、1,2,4−トリクロロベンゼン100mlを入れ、360torrの真空度とした。145℃に加熱したところへ実施例16で製造した有機層粗液45gの滴下を開始し、内温が145℃に維持されるような速度で滴下を継続した。生成したα−フルオロアクリル酸メチルは蒸留受器に溜まった。蒸留受器に溜まった粗液中に含まれるα−フルオロアクリル酸メチルの含量は1H−NMR(内部標準法による定量)より10gであった。収率は94.6%であった。[Example 24 (Step (iii))]
A 100-ml three-necked flask connected to a receiver for reactive distillation (cooled to 0 ° C. and initially added with 0.5 g of 2,6-di-tert-butyl-4-methylphenol (BHT) as a polymerization inhibitor) was added. 0.5 g of 6-di-tert-butyl-4-methylphenol (BHT) and 100 ml of 1,2,4-trichlorobenzene were charged, and the pressure was reduced to 360 torr. When the mixture was heated to 145 ° C., the dropping of 45 g of the organic layer crude liquid produced in Example 16 was started, and the dropping was continued at such a rate that the internal temperature was maintained at 145 ° C. The formed α-methyl methyl fluoroacrylate accumulated in the distillation receiver. The content of methyl α-fluoroacrylate contained in the crude liquid collected in the distillation receiver was 10 g according to 1 H-NMR (quantification by an internal standard method). The yield was 94.6%.
[実施例25]
実施例16で製造した有機層粗液を実施例23で製造した有機層粗液に変える以外は、実施例24と同様の操作で反応を行った。蒸留受器に溜まった粗液中に含まれるα−フルオロアクリル酸メチルの収率は1H−NMR(内部標準法による定量)より91.7%であった。[Example 25]
The reaction was carried out in the same manner as in Example 24, except that the crude organic layer liquid produced in Example 16 was changed to the crude organic layer liquid produced in Example 23. The yield of α-methyl methyl acrylate contained in the crude liquid collected in the distillation receiver was 91.7% from 1 H-NMR (quantification by an internal standard method).
本発明に係るハロゲン化アクリル酸エステル誘導体の製造方法は、入手が容易なオルトカルボン酸誘導体を原料として、高転化率、高選択率、高収率で最終製品であるハロゲン化アクリル酸エステル誘導体に導く方法であり、工業的に極めて有用である。また、本発明に係るハロゲン化アクリル酸エステル誘導体の製造方法により製造される中間体や最終製品の化合物は、医薬、ポリマー等の中間体として有用な化合物である。 The method for producing a halogenated acrylic acid ester derivative according to the present invention is based on a method in which a readily available orthocarboxylic acid derivative is used as a raw material, and a high conversion rate, a high selectivity, and a high yield are obtained. It is a method of deriving and is extremely useful industrially. In addition, intermediates and compounds of final products produced by the method for producing a halogenated acrylate derivative according to the present invention are compounds useful as intermediates such as pharmaceuticals and polymers.
本出願は、日本で2015年8月27日に出願された特願2015−168339号および2016年3月8日に出願された特願2016−044724号を基礎としており、その内容は本明細書にすべて包含される。 The present application is based on Japanese Patent Application No. 2015-168339 filed on August 27, 2015 in Japan and Japanese Patent Application No. 2006-044724 filed on March 8, 2016, the contents of which are described in the present specification. Are all included.
Claims (19)
(式中、
R1及びR2はそれぞれ独立に、水素原子、又は炭素原子を必須とする1価の基を表すか、またはR1及びR2は共同して、それらが結合する炭素原子とともに環を形成してもよく、
R3は、脱R3OH反応によって基R3Oが脱離し得る1価の基を表し、
R4及びR5はそれぞれ独立に、水素原子、又は炭素原子を必須とする1価の基を表す。)
(式中、R1、R2、R4及びR5は前記の通りである。) In the gas phase, a compound represented by the following formula (1) and having a boiling point of 500 ° C. or less is used as a metal oxide catalyst, a natural mineral, molecular sieve, carbon black, a metal chloride, and a metal fluoride. , metal sulfates, metal sulfides, and characterized de R 3 be OH reaction in the presence of at least one solid catalyst selected from metal phosphates, ethene derivative represented by the following formula (2) Manufacturing method.
(Where
R 1 and R 2 each independently represent a hydrogen atom or a monovalent group that requires a carbon atom, or R 1 and R 2 together form a ring together with the carbon atom to which they are attached; May be
R 3 represents a monovalent group from which a group R 3 O can be eliminated by a de-R 3 OH reaction;
R 4 and R 5 each independently represent a hydrogen atom or a monovalent group essentially having a carbon atom. )
(In the formula, R 1 , R 2 , R 4 and R 5 are as described above.)
R3、R4及びR5がそれぞれ独立に、アルキル基、シクロアルキル基、アリール基、置換基を有しているアルキル基、置換基を有しているシクロアルキル基、または置換基を有しているアリール基である、請求項1に記載の製造方法。 R 1 and R 2 are both hydrogen atoms, and R 3 , R 4 and R 5 each independently represent an alkyl group, a cycloalkyl group, an aryl group, an alkyl group having a substituent, The production method according to claim 1, wherein the production method is a cycloalkyl group having an aryl group or an aryl group having a substituent.
(式中、X、Y、及びZはそれぞれ独立に、ハロゲン原子を表す。)
(式中、R1、R2、R4及びR5は請求項1の通りであり、X及びYは前記の通りである。) An ethene derivative represented by the formula (2) is obtained by the production method according to any one of claims 1 to 6 , and the ethene derivative is converted into the following formula (3) in the presence of a basic compound and a phase transfer catalyst. A method for producing a cyclopropane derivative represented by the following formula (4), characterized by reacting with a compound represented by the following formula:
(In the formula, X, Y, and Z each independently represent a halogen atom.)
(Wherein R 1 , R 2 , R 4 and R 5 are as defined in claim 1 and X and Y are as defined above)
(式中、R1、R2、R4及びR5は請求項1の通りであり、X及びYは請求項7の通りである。) The cyclopropane derivative represented by the formula (4) is obtained by the production method according to any one of claims 7 to 14 , and the cyclopropane derivative is heated in a liquid phase or a gas phase to remove R. 4. A method for producing a halogenated acrylate derivative represented by the following formula (5), characterized by performing a Y reaction.
(Wherein R 1 , R 2 , R 4 and R 5 are as defined in claim 1, and X and Y are as defined in claim 7 )
(式中、R1、R2、R3、R4及びR5は請求項1の通りであり、Xは請求項7の通りである。)
(式中、R1、R2、R5及びXは前記の通りである。) A cyclopropane derivative represented by the formula (4) and a propene derivative represented by the following formula (8) are obtained by the production method according to any one of claims 7 to 14 , and then the cyclopropane derivative is obtained. And producing the halogenated acrylate derivative represented by the following formula (5), wherein the propene derivative is separated under an acidic condition.
(Wherein R 1 , R 2 , R 3 , R 4 and R 5 are as defined in claim 1 and X is as defined in claim 7 )
(In the formula, R 1 , R 2 , R 5 and X are as described above.)
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