JP6664984B2 - Fluorine-containing siloxane compound, method for producing the same, coating agent containing the same, and surface treatment method for glass substrate - Google Patents
Fluorine-containing siloxane compound, method for producing the same, coating agent containing the same, and surface treatment method for glass substrate Download PDFInfo
- Publication number
- JP6664984B2 JP6664984B2 JP2016026044A JP2016026044A JP6664984B2 JP 6664984 B2 JP6664984 B2 JP 6664984B2 JP 2016026044 A JP2016026044 A JP 2016026044A JP 2016026044 A JP2016026044 A JP 2016026044A JP 6664984 B2 JP6664984 B2 JP 6664984B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- compound
- cdcl
- nmr
- mhz
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- -1 siloxane compound Chemical class 0.000 title claims description 151
- 239000000758 substrate Substances 0.000 title claims description 56
- 239000011521 glass Substances 0.000 title claims description 48
- 229910052731 fluorine Inorganic materials 0.000 title claims description 45
- 238000000034 method Methods 0.000 title claims description 41
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 title claims description 32
- 239000011737 fluorine Substances 0.000 title claims description 32
- 239000011248 coating agent Substances 0.000 title claims description 26
- 238000004381 surface treatment Methods 0.000 title description 22
- 238000004519 manufacturing process Methods 0.000 title description 6
- 239000007788 liquid Substances 0.000 claims description 40
- 125000004432 carbon atom Chemical group C* 0.000 claims description 39
- 125000003545 alkoxy group Chemical group 0.000 claims description 18
- 125000005843 halogen group Chemical group 0.000 claims description 18
- 125000003709 fluoroalkyl group Chemical group 0.000 claims description 17
- 125000001153 fluoro group Chemical group F* 0.000 claims description 14
- 125000000217 alkyl group Chemical group 0.000 claims description 10
- 150000001875 compounds Chemical class 0.000 description 81
- DCAYPVUWAIABOU-UHFFFAOYSA-N hexadecane Chemical compound CCCCCCCCCCCCCCCC DCAYPVUWAIABOU-UHFFFAOYSA-N 0.000 description 56
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 52
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 49
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 48
- 238000005481 NMR spectroscopy Methods 0.000 description 43
- 238000004817 gas chromatography Methods 0.000 description 37
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 36
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 33
- 239000000243 solution Substances 0.000 description 30
- 238000006243 chemical reaction Methods 0.000 description 29
- 238000004821 distillation Methods 0.000 description 28
- 229910052786 argon Inorganic materials 0.000 description 26
- 239000003960 organic solvent Substances 0.000 description 25
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 21
- 238000002290 gas chromatography-mass spectrometry Methods 0.000 description 21
- 239000000203 mixture Substances 0.000 description 21
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 19
- 238000005160 1H NMR spectroscopy Methods 0.000 description 19
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 18
- 238000003756 stirring Methods 0.000 description 17
- 239000007983 Tris buffer Substances 0.000 description 16
- 230000015572 biosynthetic process Effects 0.000 description 16
- 238000003618 dip coating Methods 0.000 description 16
- 238000003786 synthesis reaction Methods 0.000 description 16
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 15
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 14
- 239000002904 solvent Substances 0.000 description 14
- 238000000023 Kugelrohr distillation Methods 0.000 description 13
- 238000001914 filtration Methods 0.000 description 11
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 10
- 229910000077 silane Inorganic materials 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 9
- 125000001309 chloro group Chemical group Cl* 0.000 description 9
- CBVJWBYNOWIOFJ-UHFFFAOYSA-N chloro(trimethoxy)silane Chemical compound CO[Si](Cl)(OC)OC CBVJWBYNOWIOFJ-UHFFFAOYSA-N 0.000 description 9
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 9
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 9
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 8
- 239000011541 reaction mixture Substances 0.000 description 8
- 229910052801 chlorine Inorganic materials 0.000 description 7
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 7
- 239000003921 oil Substances 0.000 description 7
- 239000012044 organic layer Substances 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- BYSLSRHFTODHDS-UHFFFAOYSA-N C[Si](C)(CCC(F)(F)F)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O Chemical compound C[Si](C)(CCC(F)(F)F)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O BYSLSRHFTODHDS-UHFFFAOYSA-N 0.000 description 6
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 6
- UUPWKXJCCSCJFJ-UHFFFAOYSA-N [[dimethylsilyloxy(methyl)silyl]oxy-methylsilyl]oxy-hydroxy-methyl-(3,3,3-trifluoropropyl)silane Chemical compound FC(CC[Si](O[SiH](O[SiH](O[SiH](C)C)C)C)(O)C)(F)F UUPWKXJCCSCJFJ-UHFFFAOYSA-N 0.000 description 6
- 150000001412 amines Chemical class 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 6
- 230000035484 reaction time Effects 0.000 description 6
- 239000002335 surface treatment layer Substances 0.000 description 6
- IYAXRCCWFZVXKE-UHFFFAOYSA-N C[Si](O[Si](OC)(OC)OC)(O[Si](O[Si](O[SiH3])(C)C)(C)C)C Chemical compound C[Si](O[Si](OC)(OC)OC)(O[Si](O[Si](O[SiH3])(C)C)(C)C)C IYAXRCCWFZVXKE-UHFFFAOYSA-N 0.000 description 5
- QBFRLPLSZWDIQE-UHFFFAOYSA-N FC(CC[Si](O[Si](OC)(OC)OC)(O[Si](O[Si](O[SiH](C)C)(C)CCC(F)(F)F)(C)CCC(F)(F)F)C)(F)F Chemical compound FC(CC[Si](O[Si](OC)(OC)OC)(O[Si](O[Si](O[SiH](C)C)(C)CCC(F)(F)F)(C)CCC(F)(F)F)C)(F)F QBFRLPLSZWDIQE-UHFFFAOYSA-N 0.000 description 5
- WPIIUSOHUBHLFS-UHFFFAOYSA-N [[[dimethylsilyloxy(dimethyl)silyl]oxy-dimethylsilyl]oxy-dimethylsilyl] trimethyl silicate Chemical compound CO[Si](OC)(OC)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[SiH](C)C WPIIUSOHUBHLFS-UHFFFAOYSA-N 0.000 description 5
- 238000009835 boiling Methods 0.000 description 5
- 239000010410 layer Substances 0.000 description 5
- 238000000746 purification Methods 0.000 description 5
- ZTNGVPACBYQUCA-UHFFFAOYSA-N trichloro-[[[dimethylsilyloxy-methyl-(3,3,3-trifluoropropyl)silyl]oxy-methyl-(3,3,3-trifluoropropyl)silyl]oxy-methyl-(3,3,3-trifluoropropyl)silyl]oxysilane Chemical compound FC(CC[Si](O[Si](Cl)(Cl)Cl)(O[Si](O[Si](O[SiH](C)C)(C)CCC(F)(F)F)(C)CCC(F)(F)F)C)(F)F ZTNGVPACBYQUCA-UHFFFAOYSA-N 0.000 description 5
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 4
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 4
- FPBVBPRRXAHKFI-UHFFFAOYSA-N FC(CC[SiH2]O[SiH](O[SiH](O[SiH](O[SiH](C)C)C)C)C)(F)F Chemical compound FC(CC[SiH2]O[SiH](O[SiH](O[SiH](O[SiH](C)C)C)C)C)(F)F FPBVBPRRXAHKFI-UHFFFAOYSA-N 0.000 description 4
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 4
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 4
- 239000012298 atmosphere Substances 0.000 description 4
- XYBQTTAROZGWOZ-UHFFFAOYSA-N bis[[hydroxy(dimethyl)silyl]oxy]-dimethylsilane Chemical group C[Si](C)(O)O[Si](C)(C)O[Si](C)(C)O XYBQTTAROZGWOZ-UHFFFAOYSA-N 0.000 description 4
- YGHUUVGIRWMJGE-UHFFFAOYSA-N chlorodimethylsilane Chemical compound C[SiH](C)Cl YGHUUVGIRWMJGE-UHFFFAOYSA-N 0.000 description 4
- 229910001873 dinitrogen Inorganic materials 0.000 description 4
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 238000004128 high performance liquid chromatography Methods 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 239000011261 inert gas Substances 0.000 description 4
- 150000002576 ketones Chemical class 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- SKTCDJAMAYNROS-UHFFFAOYSA-N methoxycyclopentane Chemical compound COC1CCCC1 SKTCDJAMAYNROS-UHFFFAOYSA-N 0.000 description 4
- 150000007530 organic bases Chemical class 0.000 description 4
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 4
- 238000010992 reflux Methods 0.000 description 4
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 4
- 238000005292 vacuum distillation Methods 0.000 description 4
- MTXMQFTVQXPJEF-UHFFFAOYSA-N C[Si](C)(CCC(F)(F)F)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](Cl)(Cl)Cl Chemical compound C[Si](C)(CCC(F)(F)F)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](Cl)(Cl)Cl MTXMQFTVQXPJEF-UHFFFAOYSA-N 0.000 description 3
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 3
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 3
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 3
- IHMWVSNXULAOAZ-UHFFFAOYSA-N chloro-dimethyl-(3,3,4,4,5,5,6,6,6-nonafluorohexyl)silane Chemical compound C[Si](C)(Cl)CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)F IHMWVSNXULAOAZ-UHFFFAOYSA-N 0.000 description 3
- 229940125898 compound 5 Drugs 0.000 description 3
- 150000002170 ethers Chemical class 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- QBERHIJABFXGRZ-UHFFFAOYSA-M rhodium;triphenylphosphane;chloride Chemical compound [Cl-].[Rh].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 QBERHIJABFXGRZ-UHFFFAOYSA-M 0.000 description 3
- 150000003613 toluenes Chemical class 0.000 description 3
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- 125000004206 2,2,2-trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 2
- 125000004777 2-fluoroethyl group Chemical group [H]C([H])(F)C([H])([H])* 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- NNQASXKOWIXPMO-UHFFFAOYSA-N CO[Si](OC)(OC)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)CCC(F)(F)F Chemical compound CO[Si](OC)(OC)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)CCC(F)(F)F NNQASXKOWIXPMO-UHFFFAOYSA-N 0.000 description 2
- MMYZOQHKNSEFGH-UHFFFAOYSA-N CO[Si](OC)(OC)O[Si](C)(CCC(F)(F)F)O[Si](C)(CCC(F)(F)F)O[Si](C)(CCC(F)(F)F)O[Si](C)(C)CCC(C(C(C(F)(F)F)(F)F)(F)F)(F)F Chemical compound CO[Si](OC)(OC)O[Si](C)(CCC(F)(F)F)O[Si](C)(CCC(F)(F)F)O[Si](C)(CCC(F)(F)F)O[Si](C)(C)CCC(C(C(C(F)(F)F)(F)F)(F)F)(F)F MMYZOQHKNSEFGH-UHFFFAOYSA-N 0.000 description 2
- HDWUXBNKHQULQU-UHFFFAOYSA-N CO[Si](OC)(OC)O[Si](C)(CCC(F)(F)F)O[Si](C)(CCC(F)(F)F)O[Si](C)(CCC(F)(F)F)O[Si](C)(C)CCC(F)(F)F Chemical compound CO[Si](OC)(OC)O[Si](C)(CCC(F)(F)F)O[Si](C)(CCC(F)(F)F)O[Si](C)(CCC(F)(F)F)O[Si](C)(C)CCC(F)(F)F HDWUXBNKHQULQU-UHFFFAOYSA-N 0.000 description 2
- GGNJUOBIFXPEBQ-UHFFFAOYSA-N C[Si](C)(C(F)F)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](Cl)(Cl)Cl Chemical compound C[Si](C)(C(F)F)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](Cl)(Cl)Cl GGNJUOBIFXPEBQ-UHFFFAOYSA-N 0.000 description 2
- BOPDMYVMGNELTN-UHFFFAOYSA-N C[Si](C)(CC(F)(F)F)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](Cl)(Cl)Cl Chemical compound C[Si](C)(CC(F)(F)F)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](Cl)(Cl)Cl BOPDMYVMGNELTN-UHFFFAOYSA-N 0.000 description 2
- SUJXJQVLZLLZKR-UHFFFAOYSA-N C[Si](C)(CCC(C(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](Cl)(Cl)Cl Chemical compound C[Si](C)(CCC(C(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](Cl)(Cl)Cl SUJXJQVLZLLZKR-UHFFFAOYSA-N 0.000 description 2
- JVVIBXFUPUWWOO-UHFFFAOYSA-N C[Si](C)(CCC(C(F)(F)F)(F)F)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](Cl)(Cl)Cl Chemical compound C[Si](C)(CCC(C(F)(F)F)(F)F)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](Cl)(Cl)Cl JVVIBXFUPUWWOO-UHFFFAOYSA-N 0.000 description 2
- HYKABFWBYXXYCP-UHFFFAOYSA-N C[Si](C)(CCC(F)(F)F)O[Si](C)(CCC(F)(F)F)O[Si](C)(CCC(F)(F)F)O[Si](C)(CCC(F)(F)F)O[Si](Cl)(Cl)Cl Chemical compound C[Si](C)(CCC(F)(F)F)O[Si](C)(CCC(F)(F)F)O[Si](C)(CCC(F)(F)F)O[Si](C)(CCC(F)(F)F)O[Si](Cl)(Cl)Cl HYKABFWBYXXYCP-UHFFFAOYSA-N 0.000 description 2
- YWOOTMVAFQDBRK-UHFFFAOYSA-N C[Si](C)(CF)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](Cl)(Cl)Cl Chemical compound C[Si](C)(CF)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](Cl)(Cl)Cl YWOOTMVAFQDBRK-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- YRQMSLOMMAYYIB-UHFFFAOYSA-N O[Si](O[Si](O[Si](O[Si](C)(C)CCC(C(F)(F)F)(F)F)(C)C)(C)C)(C)C Chemical compound O[Si](O[Si](O[Si](O[Si](C)(C)CCC(C(F)(F)F)(F)F)(C)C)(C)C)(C)C YRQMSLOMMAYYIB-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 2
- 150000001350 alkyl halides Chemical class 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- AKYGPHVLITVSJE-UHFFFAOYSA-N chloro-dimethyl-(3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl)silane Chemical compound C[Si](C)(Cl)CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F AKYGPHVLITVSJE-UHFFFAOYSA-N 0.000 description 2
- 229940126214 compound 3 Drugs 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 2
- 125000001028 difluoromethyl group Chemical group [H]C(F)(F)* 0.000 description 2
- 229940043279 diisopropylamine Drugs 0.000 description 2
- UBHZUDXTHNMNLD-UHFFFAOYSA-N dimethylsilane Chemical compound C[SiH2]C UBHZUDXTHNMNLD-UHFFFAOYSA-N 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 125000004216 fluoromethyl group Chemical group [H]C([H])(F)* 0.000 description 2
- 238000005194 fractionation Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 150000008282 halocarbons Chemical class 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- JJWLVOIRVHMVIS-UHFFFAOYSA-N isopropylamine Chemical compound CC(C)N JJWLVOIRVHMVIS-UHFFFAOYSA-N 0.000 description 2
- 229910052743 krypton Inorganic materials 0.000 description 2
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 2
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 229910052754 neon Inorganic materials 0.000 description 2
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 2
- 238000003953 normal phase liquid chromatography Methods 0.000 description 2
- 229960004624 perflexane Drugs 0.000 description 2
- ZJIJAJXFLBMLCK-UHFFFAOYSA-N perfluorohexane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F ZJIJAJXFLBMLCK-UHFFFAOYSA-N 0.000 description 2
- 239000010702 perfluoropolyether Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- 238000004366 reverse phase liquid chromatography Methods 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 238000000859 sublimation Methods 0.000 description 2
- 230000008022 sublimation Effects 0.000 description 2
- 239000012756 surface treatment agent Substances 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- ZUHZGEOKBKGPSW-UHFFFAOYSA-N tetraglyme Chemical compound COCCOCCOCCOCCOC ZUHZGEOKBKGPSW-UHFFFAOYSA-N 0.000 description 2
- RLLCWYHGCBEVIM-UHFFFAOYSA-N trimethyl silyloxysilyloxysilyloxysilyl silicate Chemical compound CO[Si](O[SiH2]O[SiH2]O[SiH2]O[SiH3])(OC)OC RLLCWYHGCBEVIM-UHFFFAOYSA-N 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- PCTZLSCYMRXUGW-UHFFFAOYSA-N 1,1,1,2,2-pentafluorobutane Chemical group [CH2]CC(F)(F)C(F)(F)F PCTZLSCYMRXUGW-UHFFFAOYSA-N 0.000 description 1
- 125000004493 2-methylbut-1-yl group Chemical group CC(C*)CC 0.000 description 1
- 125000004135 2-norbornyl group Chemical group [H]C1([H])C([H])([H])C2([H])C([H])([H])C1([H])C([H])([H])C2([H])* 0.000 description 1
- NKAMGQZDVMQEJL-UHFFFAOYSA-N 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodec-1-ene Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C=C NKAMGQZDVMQEJL-UHFFFAOYSA-N 0.000 description 1
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- UHBZFADOSSMYNH-UHFFFAOYSA-N CO[Si](O[Si](O[Si](O[Si](O[Si](C)(C)C(F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(OC)OC Chemical compound CO[Si](O[Si](O[Si](O[Si](O[Si](C)(C)C(F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(OC)OC UHBZFADOSSMYNH-UHFFFAOYSA-N 0.000 description 1
- LAYXCIYUDNDJRO-UHFFFAOYSA-N CO[Si](O[Si](O[Si](O[Si](O[Si](C)(C)CCC(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(OC)OC Chemical compound CO[Si](O[Si](O[Si](O[Si](O[Si](C)(C)CCC(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(OC)OC LAYXCIYUDNDJRO-UHFFFAOYSA-N 0.000 description 1
- ZHIBBNBFCMCWLY-UHFFFAOYSA-N CO[Si](O[Si](O[Si](O[Si](O[Si](C)(C)CCC(C(F)(F)F)(F)F)(C)C)(C)C)(C)C)(OC)OC Chemical compound CO[Si](O[Si](O[Si](O[Si](O[Si](C)(C)CCC(C(F)(F)F)(F)F)(C)C)(C)C)(C)C)(OC)OC ZHIBBNBFCMCWLY-UHFFFAOYSA-N 0.000 description 1
- KWSCYWXBWNHBTG-UHFFFAOYSA-N C[SiH](O[Si](Cl)(Cl)Cl)O[SiH](O[SiH](O[SiH](C)C)C)C Chemical compound C[SiH](O[Si](Cl)(Cl)Cl)O[SiH](O[SiH](O[SiH](C)C)C)C KWSCYWXBWNHBTG-UHFFFAOYSA-N 0.000 description 1
- AZGLPTOAEDRLPE-UHFFFAOYSA-N C[SiH](O[Si](OC)(OC)OC)O[SiH](O[SiH](O[SiH](C)C)C)C Chemical compound C[SiH](O[Si](OC)(OC)OC)O[SiH](O[SiH](O[SiH](C)C)C)C AZGLPTOAEDRLPE-UHFFFAOYSA-N 0.000 description 1
- IAUBKIGEWUIGFH-UHFFFAOYSA-N Cl[Si](O[Si](O[Si](O[Si](O[Si](C)(C)C(C(F)(F)F)(F)F)(C)C)(C)C)(C)C)(Cl)Cl Chemical compound Cl[Si](O[Si](O[Si](O[Si](O[Si](C)(C)C(C(F)(F)F)(F)F)(C)C)(C)C)(C)C)(Cl)Cl IAUBKIGEWUIGFH-UHFFFAOYSA-N 0.000 description 1
- NGCULYRAAMCFAY-UHFFFAOYSA-N Cl[Si](O[Si](O[Si](O[Si](O[Si](C)(C)C(F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(Cl)Cl Chemical compound Cl[Si](O[Si](O[Si](O[Si](O[Si](C)(C)C(F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(Cl)Cl NGCULYRAAMCFAY-UHFFFAOYSA-N 0.000 description 1
- SAODKPBVHXSJRU-UHFFFAOYSA-N Cl[Si](O[Si](O[Si](O[Si](O[Si](C)(C)CC(C(F)(F)F)(F)F)(C)C)(C)C)(C)C)(Cl)Cl Chemical compound Cl[Si](O[Si](O[Si](O[Si](O[Si](C)(C)CC(C(F)(F)F)(F)F)(C)C)(C)C)(C)C)(Cl)Cl SAODKPBVHXSJRU-UHFFFAOYSA-N 0.000 description 1
- GHQVCBGVDVVJAA-UHFFFAOYSA-N Cl[Si](O[Si](O[Si](O[Si](O[Si](C)(C)CC(F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(Cl)Cl Chemical compound Cl[Si](O[Si](O[Si](O[Si](O[Si](C)(C)CC(F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(Cl)Cl GHQVCBGVDVVJAA-UHFFFAOYSA-N 0.000 description 1
- WIGMZJLAVATMBW-UHFFFAOYSA-N Cl[Si](O[Si](O[Si](O[Si](O[Si](C)(C)CCC(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(Cl)Cl Chemical compound Cl[Si](O[Si](O[Si](O[Si](O[Si](C)(C)CCC(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(Cl)Cl WIGMZJLAVATMBW-UHFFFAOYSA-N 0.000 description 1
- LKWNXLMIKYLHFQ-UHFFFAOYSA-N Cl[Si](O[Si](O[Si](O[Si](O[Si](C)(C)CCC(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(C)C)(C)C)(C)C)(Cl)Cl Chemical compound Cl[Si](O[Si](O[Si](O[Si](O[Si](C)(C)CCC(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(C)C)(C)C)(C)C)(Cl)Cl LKWNXLMIKYLHFQ-UHFFFAOYSA-N 0.000 description 1
- LBXRNRRUQFJILQ-UHFFFAOYSA-N Cl[Si](O[Si](O[Si](O[Si](O[Si](C)(C)CCC(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(Cl)Cl Chemical compound Cl[Si](O[Si](O[Si](O[Si](O[Si](C)(C)CCC(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(Cl)Cl LBXRNRRUQFJILQ-UHFFFAOYSA-N 0.000 description 1
- VFZIHAHAEABKOQ-UHFFFAOYSA-N Cl[Si](O[Si](O[Si](O[Si](O[Si](C)(C)CCC(C(C(F)(F)F)(F)F)(F)F)(C)C)(C)C)(C)C)(Cl)Cl Chemical compound Cl[Si](O[Si](O[Si](O[Si](O[Si](C)(C)CCC(C(C(F)(F)F)(F)F)(F)F)(C)C)(C)C)(C)C)(Cl)Cl VFZIHAHAEABKOQ-UHFFFAOYSA-N 0.000 description 1
- NHJRGNGUQBATQI-UHFFFAOYSA-N Cl[Si](O[Si](O[Si](O[Si](O[Si](C)(C)CCC(C(F)(F)F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(Cl)Cl Chemical compound Cl[Si](O[Si](O[Si](O[Si](O[Si](C)(C)CCC(C(F)(F)F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(Cl)Cl NHJRGNGUQBATQI-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- QHDPGHKTMGKKKS-UHFFFAOYSA-N FC(CC[SiH](O[SiH](O[SiH](O[SiH](C)C)C)C)C)(F)F Chemical compound FC(CC[SiH](O[SiH](O[SiH](O[SiH](C)C)C)C)C)(F)F QHDPGHKTMGKKKS-UHFFFAOYSA-N 0.000 description 1
- KOZXHENGTCUHNM-UHFFFAOYSA-N FC(CC[Si](O[Si](O[Si](O)(C)C)(C)C)(C)C)(C(C(C(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)F Chemical compound FC(CC[Si](O[Si](O[Si](O)(C)C)(C)C)(C)C)(C(C(C(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)F KOZXHENGTCUHNM-UHFFFAOYSA-N 0.000 description 1
- VDCAAHBSOYXKLL-UHFFFAOYSA-N FC(CC[Si](O[Si](O[Si](O)(C)C)(C)C)(C)C)(C(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(F)F)F Chemical group FC(CC[Si](O[Si](O[Si](O)(C)C)(C)C)(C)C)(C(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(F)F)F VDCAAHBSOYXKLL-UHFFFAOYSA-N 0.000 description 1
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 1
- PGCKDKMARKTIIQ-UHFFFAOYSA-N O[Si](O[Si](O[Si](O[Si](C)(C)C(F)(F)F)(C)C)(C)C)(C)C Chemical compound O[Si](O[Si](O[Si](O[Si](C)(C)C(F)(F)F)(C)C)(C)C)(C)C PGCKDKMARKTIIQ-UHFFFAOYSA-N 0.000 description 1
- ZXXUGKSAAZWFBB-UHFFFAOYSA-N O[Si](O[Si](O[Si](O[Si](C)(C)C(F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F Chemical compound O[Si](O[Si](O[Si](O[Si](C)(C)C(F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F ZXXUGKSAAZWFBB-UHFFFAOYSA-N 0.000 description 1
- RZYGYCXIYOMZIY-UHFFFAOYSA-N O[Si](O[Si](O[Si](O[Si](C)(C)C(F)F)(C)C)(C)C)(C)C Chemical compound O[Si](O[Si](O[Si](O[Si](C)(C)C(F)F)(C)C)(C)C)(C)C RZYGYCXIYOMZIY-UHFFFAOYSA-N 0.000 description 1
- HFIDVRQZUSGSEC-UHFFFAOYSA-N O[Si](O[Si](O[Si](O[Si](C)(C)CC(C(F)(F)F)(F)F)(C)C)(C)C)(C)C Chemical compound O[Si](O[Si](O[Si](O[Si](C)(C)CC(C(F)(F)F)(F)F)(C)C)(C)C)(C)C HFIDVRQZUSGSEC-UHFFFAOYSA-N 0.000 description 1
- ONGYIKGLEVESOC-UHFFFAOYSA-N O[Si](O[Si](O[Si](O[Si](C)(C)CC(F)(F)F)(C)C)(C)C)(C)C Chemical compound O[Si](O[Si](O[Si](O[Si](C)(C)CC(F)(F)F)(C)C)(C)C)(C)C ONGYIKGLEVESOC-UHFFFAOYSA-N 0.000 description 1
- UREHLMDYKIWZRR-UHFFFAOYSA-N O[Si](O[Si](O[Si](O[Si](C)(C)CC(F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F Chemical compound O[Si](O[Si](O[Si](O[Si](C)(C)CC(F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F UREHLMDYKIWZRR-UHFFFAOYSA-N 0.000 description 1
- CJUPOURTYSVNOO-UHFFFAOYSA-N O[Si](O[Si](O[Si](O[Si](C)(C)CCC(C(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(C)C)(C)C)(C)C Chemical compound O[Si](O[Si](O[Si](O[Si](C)(C)CCC(C(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(C)C)(C)C)(C)C CJUPOURTYSVNOO-UHFFFAOYSA-N 0.000 description 1
- CDTDEUXCPJJKRQ-UHFFFAOYSA-N O[Si](O[Si](O[Si](O[Si](C)(C)CCC(C(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F Chemical compound O[Si](O[Si](O[Si](O[Si](C)(C)CCC(C(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F CDTDEUXCPJJKRQ-UHFFFAOYSA-N 0.000 description 1
- JQOIUMZHCDCRHP-UHFFFAOYSA-N O[Si](O[Si](O[Si](O[Si](C)(C)CCC(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F Chemical compound O[Si](O[Si](O[Si](O[Si](C)(C)CCC(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F JQOIUMZHCDCRHP-UHFFFAOYSA-N 0.000 description 1
- DDKZOFKLKDUTOA-UHFFFAOYSA-N O[Si](O[Si](O[Si](O[Si](C)(C)CCC(C(F)(F)F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F Chemical compound O[Si](O[Si](O[Si](O[Si](C)(C)CCC(C(F)(F)F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F)(C)CCC(F)(F)F DDKZOFKLKDUTOA-UHFFFAOYSA-N 0.000 description 1
- SFBQDYCVKZPBFC-UHFFFAOYSA-N O[Si](O[Si](O[Si](O[Si](C)(C)CF)(C)C)(C)C)(C)C Chemical compound O[Si](O[Si](O[Si](O[Si](C)(C)CF)(C)C)(C)C)(C)C SFBQDYCVKZPBFC-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000002519 antifouling agent Substances 0.000 description 1
- JHXKRIRFYBPWGE-UHFFFAOYSA-K bismuth chloride Chemical compound Cl[Bi](Cl)Cl JHXKRIRFYBPWGE-UHFFFAOYSA-K 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000005345 chemically strengthened glass Substances 0.000 description 1
- KBAZUXSLKGQRJF-UHFFFAOYSA-N chloro-dimethyl-(3,3,3-trifluoropropyl)silane Chemical compound C[Si](C)(Cl)CCC(F)(F)F KBAZUXSLKGQRJF-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229940125904 compound 1 Drugs 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000004851 cyclopentylmethyl group Chemical group C1(CCCC1)C* 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- JZLCKKKUCNYLDU-UHFFFAOYSA-N decylsilane Chemical compound CCCCCCCCCC[SiH3] JZLCKKKUCNYLDU-UHFFFAOYSA-N 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002451 electron ionisation mass spectrometry Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000002605 large molecules Chemical class 0.000 description 1
- 239000005355 lead glass Substances 0.000 description 1
- 238000004811 liquid chromatography Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- AMXINEOLQNYXRZ-UHFFFAOYSA-N methyl(silyloxysilyloxysilyloxysilyloxy)silane Chemical compound C[SiH2]O[SiH2]O[SiH2]O[SiH2]O[SiH3] AMXINEOLQNYXRZ-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000005005 perfluorohexyl group Chemical group FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)* 0.000 description 1
- YVBBRRALBYAZBM-UHFFFAOYSA-N perfluorooctane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F YVBBRRALBYAZBM-UHFFFAOYSA-N 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000003548 sec-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Surface Treatment Of Glass (AREA)
- Materials Applied To Surfaces To Minimize Adherence Of Mist Or Water (AREA)
- Paints Or Removers (AREA)
Description
本発明は、基材表面に撥水撥油性を付与する表面処理に好適に用いることができる含フッ素シロキサン化合物、その製造方法、それを含むコーティング剤及びガラス基材の表面処理方法に関する。 The present invention relates to a fluorine-containing siloxane compound which can be suitably used for surface treatment for imparting water / oil repellency to a substrate surface, a method for producing the same, a coating agent containing the same, and a surface treatment method for a glass substrate.
フルオロアルキル部位を分子内に有する化合物は、高い潤滑性及び撥水撥油性等を示すため、表面処理剤として好適に用いられる。基材表面に撥水撥油性を付与すると汚れを拭き取りやすくなるなど、汚れの除去性が向上する。このような目的に対しては、フルオロアルキル基を有する反応性シラン化合物や、ペルフルオロポリエーテルを主鎖とし、末端に反応性シリル基を有する含フッ素エーテル化合物を、防汚剤、潤滑剤、撥水撥油剤等の表面処理剤として用いることができる(特許文献1〜3)。反応性シリル基を有する化合物は、該反応性シリル基が基材の表面と強固に化学結合するため、良好な耐久性が得られやすい。 Compounds having a fluoroalkyl moiety in the molecule exhibit high lubricity and water / oil repellency, and are therefore suitably used as a surface treatment agent. When water- and oil-repellency is imparted to the surface of the base material, dirt can be easily wiped off, thereby improving dirt removal. For this purpose, a reactive silane compound having a fluoroalkyl group or a fluorinated ether compound having a perfluoropolyether as a main chain and having a reactive silyl group at a terminal is used as an antifouling agent, a lubricant, It can be used as a surface treatment agent such as a water repellent agent (Patent Documents 1 to 3). A compound having a reactive silyl group is likely to have good durability because the reactive silyl group is strongly chemically bonded to the surface of the substrate.
しかし、フルオロアルキル主鎖のみを置換基とした官能性シラン類を利用した表面処理層は、タッチパネル等の用途に対し、滑り特性に劣る傾向があった。また、ペルフルオロポリエーテル鎖を主鎖とし、末端に反応性シリル基を有する含フッ素エーテル化合物は、滑り特性は改善するものの分子量分布を有する高分子量化合物であって、その蒸気圧が低いために蒸留による精製が難しく、蒸着には高温高真空を必要とすること、また、高価なペルフルオロヘキサンなどのフルオラス溶媒にのみ可溶であるという問題があった。 However, a surface treatment layer using functional silanes having only a fluoroalkyl main chain as a substituent tends to be inferior in sliding properties for applications such as touch panels. In addition, a fluorinated ether compound having a perfluoropolyether chain as a main chain and having a reactive silyl group at a terminal is a high molecular weight compound having a molecular weight distribution although the sliding property is improved, and its vapor pressure is low. However, there is a problem that high-temperature and high-vacuum are required for vapor deposition, and that it is soluble only in a fluorous solvent such as expensive perfluorohexane.
本発明は、上記事情に鑑みなされたもので、基材表面に良好な撥水撥油性を付与できるとともに、蒸留精製が可能で簡便に製造が可能な含フッ素シロキサン化合物の提供を課題とする。また本発明は該含フッ素シロキサン化合物と媒体とを含むコーティング剤、および該コーティング剤を用いて、ガラス基材の表面処理方法の提供を目的とする。 The present invention has been made in view of the above circumstances, and it is an object of the present invention to provide a fluorine-containing siloxane compound which can impart good water / oil repellency to a substrate surface, can be purified by distillation, and can be easily produced. Another object of the present invention is to provide a coating agent containing the fluorine-containing siloxane compound and a medium, and a method for treating the surface of a glass substrate using the coating agent.
本発明者らは、上記目的を達成するために鋭意検討を重ねた結果、両末端に水酸基を有するジヒドロキシシロキサン化合物に、フルオロアルキル置換シラン化合物、次いで反応性基を有するシラン化合物を反応させることにより、所望の特性を有する含フッ素シロキサン化合物を製造できることを見出し、本発明を完成するに至った。
即ち、本発明は、下記[1]〜[8]の構成を有する含フッ素シロキサン化合物、その製造方法、それを含むコーティング剤及びガラス基材の表面処理方法に関する。
[1]
一般式(1)
The present inventors have conducted intensive studies to achieve the above object, and as a result, by reacting a dialkylsiloxane compound having a hydroxyl group at both terminals with a fluoroalkyl-substituted silane compound and then a silane compound having a reactive group. It has been found that a fluorine-containing siloxane compound having desired characteristics can be produced, and the present invention has been completed.
That is, the present invention relates to a fluorine-containing siloxane compound having the following constitutions [1] to [8], a method for producing the same, a coating agent containing the same, and a surface treatment method for a glass substrate.
[1]
General formula (1)
(式中、R1は炭素数1〜8のフルオロアルキル基を表す。R2、R3、R4及びR5は、各々独立に、フッ素原子で置換されていてもよい炭素数1〜8のアルキル基を表す。nは2又は3を表す。Zは水素原子、又は一般式(2) (In the formula, R 1 represents a fluoroalkyl group having 1 to 8 carbon atoms. R 2 , R 3 , R 4 and R 5 each independently represent a C 1 to C 8 optionally substituted by a fluorine atom. And n represents 2 or 3. Z is a hydrogen atom or the general formula (2)
(式中、R6、R7及びR8は、各々独立に、炭素数1〜2のアルキル基、ハロゲン原子又は炭素数1〜3のアルコキシ基を表し、R6、R7又はR8の少なくとも1つはハロゲン原子又は炭素数1〜3のアルコキシ基である。)で表される置換シリル基を表す。)で表される含フッ素シロキサン化合物。
[2]
一般式(3)
(Wherein, R 6 , R 7 and R 8 each independently represent an alkyl group having 1 to 2 carbon atoms, a halogen atom or an alkoxy group having 1 to 3 carbon atoms, and R 6 , R 7 or R 8 represents At least one is a halogen atom or an alkoxy group having 1 to 3 carbon atoms). A) a fluorine-containing siloxane compound represented by the formula:
[2]
General formula (3)
(式中、R1は炭素数1〜8のフルオロアルキル基を表す。R2、R3、R4及びR5は、各々独立に、フッ素原子で置換されていてもよい炭素数1〜8のアルキル基を表す。R6、R7及びR8は、各々独立に、炭素数1〜2のアルキル基、ハロゲン原子又は炭素数1〜3のアルコキシ基を表し、R6、R7又はR8の少なくとも1つはハロゲン原子又は炭素数1〜3のアルコキシ基である。nは2又は3を表す。)で表される項目1に記載の含フッ素シロキサン化合物。
[3]
一般式(4)
(In the formula, R 1 represents a fluoroalkyl group having 1 to 8 carbon atoms. R 2 , R 3 , R 4 and R 5 each independently represent a C 1 to C 8 optionally substituted by a fluorine atom. R 6 , R 7 and R 8 each independently represent an alkyl group having 1 to 2 carbon atoms, a halogen atom or an alkoxy group having 1 to 3 carbon atoms, and R 6 , R 7 or R Wherein at least one of 8 is a halogen atom or an alkoxy group having 1 to 3 carbon atoms, and n represents 2 or 3.)
[3]
General formula (4)
(式中、R1は炭素数1〜8のフルオロアルキル基を表す。R2、R3、R4及びR5は、各々独立に、フッ素原子で置換されていてもよい炭素数1〜8のアルキル基を表す。nは2又は3を表す。)で表される項目1に記載の含フッ素シロキサン化合物。
[4]
一般式(5)
(In the formula, R 1 represents a fluoroalkyl group having 1 to 8 carbon atoms. R 2 , R 3 , R 4 and R 5 each independently represent a C 1 to C 8 optionally substituted by a fluorine atom. Wherein n represents 2 or 3.) The fluorine-containing siloxane compound according to item 1, which is represented by the following formula:
[4]
General formula (5)
(式中、R4及びR5は、各々独立に、フッ素原子で置換されていてもよい炭素数1〜8のアルキル基を表す。nは2又は3を表す。)で表されるジヒドロキシシロキサン化合物と、下記一般式(6) (Wherein, R 4 and R 5 each independently represent an alkyl group having 1 to 8 carbon atoms which may be substituted by a fluorine atom, and n represents 2 or 3). A compound represented by the following general formula (6)
(式中、R1は炭素数1〜8のフルオロアルキル基を表す。R2及びR3は、各々独立に、フッ素原子で置換されていてもよい炭素数1〜8のアルキル基を表す。Xはハロゲン原子又は炭素数1〜3のアルコキシ基を表す。)で表されるフルオロアルキル置換シラン化合物とを反応させることを特徴とする、一般式(4) (In the formula, R 1 represents a fluoroalkyl group having 1 to 8 carbon atoms. R 2 and R 3 each independently represent an alkyl group having 1 to 8 carbon atoms which may be substituted by a fluorine atom. X represents a halogen atom or an alkoxy group having 1 to 3 carbon atoms.) And a fluoroalkyl-substituted silane compound represented by the following general formula (4):
(式中、R1は炭素数1〜8のフルオロアルキル基を表す。R2、R3、R4及びR5は、各々独立に、フッ素原子で置換されていてもよい炭素数1〜8のアルキル基を表す。nは2又は3を表す。)で表される含フッ素シロキサン化合物の製造方法。
[5]
一般式(4)
(In the formula, R 1 represents a fluoroalkyl group having 1 to 8 carbon atoms. R 2 , R 3 , R 4 and R 5 each independently represent a C 1 to C 8 optionally substituted by a fluorine atom. Wherein n represents 2 or 3.) A method for producing a fluorine-containing siloxane compound represented by the formula:
[5]
General formula (4)
(式中、R1は炭素数1〜8のフルオロアルキル基を表す。R2、R3、R4及びR5は、各々独立に、フッ素原子で置換されていてもよい炭素数1〜8のアルキル基を表す。nは2又は3を表す。)で表される含フッ素シロキサン化合物と、一般式(7) (In the formula, R 1 represents a fluoroalkyl group having 1 to 8 carbon atoms. R 2 , R 3 , R 4 and R 5 each independently represent a C 1 to C 8 optionally substituted by a fluorine atom. And n represents 2 or 3.) and a fluorine-containing siloxane compound represented by the general formula (7):
(式中、R6、R7及びR8は、各々独立に、炭素数1〜2のアルキル基、ハロゲン原子又は炭素数1〜3のアルコキシ基を表し、R6、R7又はR8の少なくとも1つはハロゲン原子又は炭素数1〜3のアルコキシ基である。Xは、ハロゲン原子又は炭素数1〜3のアルコキシ基を表す。)で表されるシラン化合物を反応させることを特徴とする、一般式(3) (Wherein, R 6 , R 7 and R 8 each independently represent an alkyl group having 1 to 2 carbon atoms, a halogen atom or an alkoxy group having 1 to 3 carbon atoms, and R 6 , R 7 or R 8 represents At least one of which is a halogen atom or an alkoxy group having 1 to 3 carbon atoms, and X represents a halogen atom or an alkoxy group having 1 to 3 carbon atoms). , General formula (3)
(式中、R1は炭素数1〜8のフルオロアルキル基を表す。R2、R3、R4及びR5は、各々独立に、フッ素原子で置換されていてもよい炭素数1〜8のアルキル基を表す。R6、R7及びR8は、各々独立に、炭素数1〜2のアルキル基、ハロゲン原子又は炭素数1〜3のアルコキシ基を表し、R6、R7又はR8の少なくとも1つはハロゲン原子又は炭素数1〜3のアルコキシ基である。nは2又は3を表す。)で表される含フッ素シロキサン化合物の製造方法。
[6]
項目1、2又は3に記載の含フッ素シロキサン化合物と、液状媒体とを含む、コーティング剤。
[7]
項目6のコーティング剤を基材の表面に塗布した後、液状媒体を除去する、ガラス基材の表面処理方法。
(In the formula, R 1 represents a fluoroalkyl group having 1 to 8 carbon atoms. R 2 , R 3 , R 4 and R 5 each independently represent a C 1 to C 8 optionally substituted by a fluorine atom. R 6 , R 7 and R 8 each independently represent an alkyl group having 1 to 2 carbon atoms, a halogen atom or an alkoxy group having 1 to 3 carbon atoms, and R 6 , R 7 or R Wherein at least one of 8 is a halogen atom or an alkoxy group having 1 to 3 carbon atoms, and n represents 2 or 3.)
[6]
A coating agent comprising the fluorine-containing siloxane compound according to item 1, 2 or 3, and a liquid medium.
[7]
A method for treating a glass substrate, comprising applying the coating agent according to item 6 to the surface of the substrate and removing the liquid medium.
本発明の方法によれば、単位質量当りのフッ素含量が多く、分子内に単数又は複数のフルオロアルキル基を有し、基材と結合可能な反応性基を有する低分子量含フッ素シロキサン化合物を提供することができる。これは、分子量分布の無い単一組成の化合物で、蒸留による精製が可能であり、汎用有機溶剤に易溶である。 According to the method of the present invention, there is provided a low-molecular-weight fluorine-containing siloxane compound having a high fluorine content per unit mass, having one or more fluoroalkyl groups in a molecule, and having a reactive group capable of binding to a substrate. can do. This is a compound having a single composition with no molecular weight distribution, can be purified by distillation, and is easily soluble in general-purpose organic solvents.
本発明の含フッ素シロキサン化合物は、溶剤に溶かしてコーティング剤を作製しこれを塗布処理することにより、基材表面に良好な撥水撥油性を付与することができる。 The fluorine-containing siloxane compound of the present invention can impart good water / oil repellency to the surface of the substrate by preparing a coating agent by dissolving it in a solvent and applying the coating agent.
以下、本発明を具体的に詳説する。 Hereinafter, the present invention will be described in detail.
最初に、一般式(1)〜(8)中のR1、R2、R3、R4、R5、R6、R7、R8及びXの定義について説明する。式中、R1で表される炭素数1〜8のフルオロアルキル基としては、直鎖状、分岐状及び環状のいずれでも良い。具体的にはフルオロメチル基、ジフルオロメチル基、トリフルオロメチル基、2−フルオロエチル基、1,1,2,2,2−ペンタフルオロエチル基、2,2,2−トリフルオロエチル基、1,1,2,2−テトラフルオロエチル基、1,1,2,2,3,3,3−ヘプタフルオロプロピル基、3,3,3−トリフルオロプロピル基、2,2,2−トリフルオロ−1−(トリフルオロメチル)エチル基、1,2,2,2−テトラフルオロ−1−(トリフルオロメチル)エチル基、3,3,4,4,4−ペンタフルオロブチル基、2,2,3,3,4,4,4−ヘプタフルオロブチル基、3,3,3−トリフルオロ−(2−トリフルオロメチル)プロピル基、3,3,3−トリフルオロ−(1−トリフルオロメチル)プロピル基、2,2,2−トリフルオロ−1,1−ビス(トリフルオロメチル)エチル基、3,3,4,4,5,5,5−ヘプタフルオロペンチル基、2,2,3,3,4,4,5,5,5−ノナフルオロペンチル基、3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル基、2,2,3,3,4,4,5,5,6,6,6−ウンデカフルオロヘキシル基、3,3,4,4,5,5,6,6,7,7,7−ウンデカフルオロヘプチル基、2,2,3,3,4,4,5,5,6,6,7,7,7−トリデカフルオロヘプチル基、2,2,3,3,4,4,5,5,6,6,7,7,8,8,8−ペンタデカフルオロオクチル基、3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチル基などを例示することが出来る。化合物の安定性及び撥水特性の点で、R1は3,3,3−トリフルオロプロピル基、3,3,4,4,4−ペンタフルオロブチル基、3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル基又は3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチル基が好ましく、3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル基、又は3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチル基が更に好ましく、3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル基が殊更好ましい。 First, the definitions of R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 and X in the general formulas (1) to (8) will be described. In the formula, the fluoroalkyl group having 1 to 8 carbon atoms represented by R 1 may be linear, branched or cyclic. Specifically, a fluoromethyl group, a difluoromethyl group, a trifluoromethyl group, a 2-fluoroethyl group, a 1,1,2,2,2-pentafluoroethyl group, a 2,2,2-trifluoroethyl group, , 1,2,2-tetrafluoroethyl group, 1,1,2,2,3,3,3-heptafluoropropyl group, 3,3,3-trifluoropropyl group, 2,2,2-trifluoro -1- (trifluoromethyl) ethyl group, 1,2,2,2-tetrafluoro-1- (trifluoromethyl) ethyl group, 3,3,4,4,4-pentafluorobutyl group, 2,2 , 3,3,4,4,4-heptafluorobutyl group, 3,3,3-trifluoro- (2-trifluoromethyl) propyl group, 3,3,3-trifluoro- (1-trifluoromethyl ) Propyl group, 2,2,2- Trifluoro-1,1-bis (trifluoromethyl) ethyl group, 3,3,4,4,5,5,5-heptafluoropentyl group, 2,2,3,3,4,4,5,5 5-nonafluoropentyl group, 3,3,4,4,5,5,6,6,6-nonafluorohexyl group, 2,2,3,3,4,4,5,5,6,6,6 6-undecafluorohexyl group, 3,3,4,4,5,5,6,6,7,7,7-undecafluoroheptyl group, 2,2,3,3,4,4,5 5,6,6,7,7,7-tridecafluoroheptyl group, 2,2,3,3,4,4,5,5,6,6,7,7,8,8,8-pentadeca Examples thereof include a fluorooctyl group, 3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl group. In terms of the stability and water repellency of the compound, R 1 represents 3,3,3-trifluoropropyl, 3,3,4,4,4-pentafluorobutyl, 3,3,4,4,5 , 5,6,6,6-nonafluorohexyl group or 3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl group is preferred, 3,4,4,5,5,6,6,6-nonafluorohexyl group or 3,3,4,4,5,5,6,6,7,7,8,8,8-trideca A fluorooctyl group is more preferred, and a 3,3,4,4,5,5,6,6,6-nonafluorohexyl group is particularly preferred.
また、式中、R2、R3、R4及びR5で表される炭素数1〜8のアルキル基としては、直鎖状、分岐状及び環状のいずれでも良く、具体的にはメチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基、イソブチル基、sec−ブチル基、t−ブチル基、シクロブチル基、n−ペンチル基、1−メチルブチル基、2−メチルブチル基、イソペンチル基、ネオペンチル基、シクロペンチル基、n−ヘキシル基、1−メチルペンチル基、2,3−ジメチルブチル基、シクロヘキシル基、シクロペンチルメチル基、n−ヘプチル基、2−ノルボルニル基、n−オクチル基、などを例示することが出来る。また、これらは水素原子のうち一部または全部がフッ素原子で置換されていてもよい。具体的にはフルオロメチル基、ジフルオロメチル基、トリフルオロメチル基、2−フルオロエチル基、1,1,2,2,2−ペンタフルオロエチル基、2,2,2−トリフルオロエチル基、1,1,2,2−テトラフルオロエチル基、1,1,2,2,3,3,3−ヘプタフルオロプロピル基、3,3,3−トリフルオロプロピル基、2,2,2−トリフルオロ−1−(トリフルオロメチル)エチル基、1,2,2,2−テトラフルオロ−1−(トリフルオロメチル)エチル基、3,3,4,4,4−ペンタフルオロブチル基、2,2,3,3,4,4,4−ヘプタフルオロブチル基、3,3,3−トリフルオロ−(2−トリフルオロメチル)プロピル基、3,3,3−トリフルオロ−(1−トリフルオロメチル)プロピル基、2,2,2−トリフルオロ−1,1−ビス(トリフルオロメチル)エチル基、3,3,4,4,5,5,5−ヘプタフルオロペンチル基、2,2,3,3,4,4,5,5,5−ノナフルオロペンチル基、3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル基、2,2,3,3,4,4,5,5,6,6,6−ウンデカフルオロヘキシル基、3,3,4,4,5,5,6,6,7,7,7−ウンデカフルオロヘプチル基、2,2,3,3,4,4,5,5,6,6,7,7,7−トリデカフルオロヘプチル基、2,2,3,3,4,4,5,5,6,6,7,7,8,8,8−ペンタデカフルオロオクチル基、3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチル基を例示することができる。化合物の安定性及び撥水特性の点で、R2、R3、R4及びR5は、メチル基、エチル基、n−プロピル基、3,3,3−トリフルオロプロピル基、3,3,4,4,4−ペンタフルオロブチル基、3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル基、又は3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチル基が好ましく、メチル基、又は3,3,3−トリフルオロプロピル基が更に好ましく、メチル基が殊更好ましい。 In the formula, the alkyl group having 1 to 8 carbon atoms represented by R 2 , R 3 , R 4 and R 5 may be any of linear, branched and cyclic, and specifically, a methyl group , Ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, t-butyl, cyclobutyl, n-pentyl, 1-methylbutyl, 2-methylbutyl, isopentyl , Neopentyl group, cyclopentyl group, n-hexyl group, 1-methylpentyl group, 2,3-dimethylbutyl group, cyclohexyl group, cyclopentylmethyl group, n-heptyl group, 2-norbornyl group, n-octyl group, etc. Examples can be given. These may be partially or entirely replaced with fluorine atoms. Specifically, a fluoromethyl group, a difluoromethyl group, a trifluoromethyl group, a 2-fluoroethyl group, a 1,1,2,2,2-pentafluoroethyl group, a 2,2,2-trifluoroethyl group, , 1,2,2-tetrafluoroethyl group, 1,1,2,2,3,3,3-heptafluoropropyl group, 3,3,3-trifluoropropyl group, 2,2,2-trifluoro -1- (trifluoromethyl) ethyl group, 1,2,2,2-tetrafluoro-1- (trifluoromethyl) ethyl group, 3,3,4,4,4-pentafluorobutyl group, 2,2 , 3,3,4,4,4-heptafluorobutyl group, 3,3,3-trifluoro- (2-trifluoromethyl) propyl group, 3,3,3-trifluoro- (1-trifluoromethyl ) Propyl group, 2,2,2- Trifluoro-1,1-bis (trifluoromethyl) ethyl group, 3,3,4,4,5,5,5-heptafluoropentyl group, 2,2,3,3,4,4,5,5 5-nonafluoropentyl group, 3,3,4,4,5,5,6,6,6-nonafluorohexyl group, 2,2,3,3,4,4,5,5,6,6,6 6-undecafluorohexyl group, 3,3,4,4,5,5,6,6,7,7,7-undecafluoroheptyl group, 2,2,3,3,4,4,5 5,6,6,7,7,7-tridecafluoroheptyl group, 2,2,3,3,4,4,5,5,6,6,7,7,8,8,8-pentadeca Examples thereof include a fluorooctyl group and a 3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl group. R 2 , R 3 , R 4 and R 5 are a methyl group, an ethyl group, an n-propyl group, a 3,3,3-trifluoropropyl group, a 3,3 , 4,4,4-pentafluorobutyl group, 3,3,4,4,5,5,6,6,6-nonafluorohexyl group, or 3,3,4,4,5,5,6 A 6,7,7,8,8,8-tridecafluorooctyl group is preferred, a methyl group or a 3,3,3-trifluoropropyl group is more preferred, and a methyl group is particularly preferred.
式中、R6、R7及びR8で表される炭素数1〜2のアルキル基、ハロゲン原子又は炭素数1〜3のアルコキシ基としては、メチル基、エチル基、フッ素原子、塩素原子、臭素原子、ヨウ素原子、メトキシ基、エトキシ基、(n−プロピル)オキシ基、(1−メチルエチル)オキシ基などを例示することができる。収率、安定性及び撥水特性の点で、R6、R7及びR8は、メチル基、エチル基、塩素原子、臭素原子、メトキシ基、エトキシ基が好ましく、メチル基、塩素原子、又はメトキシ基が更に好ましく、メトキシ基が殊更好ましい。 In the formula, the alkyl group having 1 to 2 carbon atoms, a halogen atom or an alkoxy group having 1 to 3 carbon atoms represented by R 6 , R 7 and R 8 includes a methyl group, an ethyl group, a fluorine atom, a chlorine atom, Examples thereof include a bromine atom, an iodine atom, a methoxy group, an ethoxy group, a (n-propyl) oxy group, and a (1-methylethyl) oxy group. In terms of yield, stability, and water repellency, R 6 , R 7, and R 8 are preferably a methyl group, an ethyl group, a chlorine atom, a bromine atom, a methoxy group, an ethoxy group, and a methyl group, a chlorine atom, or Methoxy groups are more preferred, and methoxy groups are even more preferred.
式中、Xで表されるハロゲン原子または炭素数1〜3のアルコキシ基としては、フッ素原子、塩素原子、臭素原子、ヨウ素原子、メトキシ基、エトキシ基、(n−プロピル)オキシ基、(1−メチルエチル)オキシ基などを例示することができる。収率、安定性及び撥水特性の点で、Xは、塩素原子、臭素原子、メトキシ基、エトキシ基が好ましく、塩素原子、又はメトキシ基が更に好ましく、塩素原子が殊更好ましい。 In the formula, the halogen atom represented by X or the alkoxy group having 1 to 3 carbon atoms includes a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a methoxy group, an ethoxy group, an (n-propyl) oxy group, a (1 -Methylethyl) oxy group and the like. In terms of yield, stability, and water repellency, X is preferably a chlorine atom, a bromine atom, a methoxy group, or an ethoxy group, more preferably a chlorine atom or a methoxy group, and particularly preferably a chlorine atom.
本発明により製造可能な含フッ素シロキサン化合物(化合物4)としては、1−ヒドロキシ−7−(トリフルオロメチル)−1,1,3,3,5,5,7,7−オクタメチルテトラシロキサン、1−ヒドロキシ−7−(ジフルオロメチル)−1,1,3,3,5,5,7,7−オクタメチルテトラシロキサン、1−ヒドロキシ−7−(フルオロメチル)−1,1,3,3,5,5,7,7−オクタメチルテトラシロキサン、1−ヒドロキシ−7−(3,3,3−トリフルオロプロピル)−1,1,3,3,5,5,7,7−オクタメチルテトラシロキサン、1−ヒドロキシ−7−(2,2,2−トリフルオロエチル)−1,1,3,3,5,5,7,7−オクタメチルテトラシロキサン、1−ヒドロキシ−7−(1,1,2,2,2−ペンタフルオロエチル)−1,1,3,3,5,5,7,7−オクタメチルテトラシロキサン、1−ヒドロキシ−7−(3,3,3−トリフルオロプロピル)−1,1,3,3,5,5,7,7−オクタメチルテトラシロキサン、1−ヒドロキシ−7−(2,2,3,3,3−ペンタフルオロプロピル)−1,1,3,3,5,5,7,7−オクタメチルテトラシロキサン、1−ヒドロキシ−7−(3,3,4,4,4−ペンタフルオロブチル)−1,1,3,3,5,5,7,7−オクタメチルテトラシロキサン、1−ヒドロキシ−7−(3,3,4,4,5,5,5−ヘプタフルオロペンチル)−1,1,3,3,5,5,7,7−オクタメチルテトラシロキサン、1−ヒドロキシ−7−(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル)−1,1,3,3,5,5,7,7−オクタメチルテトラシロキサン、1−ヒドロキシ−7−(3,3,4,4,5,5,6,6,7,7,7−ウンデカフルオロへプチル)−1,1,3,3,5,5,7,7−オクタメチルテトラシロキサン、1−ヒドロキシ−7−(3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチル)−1,1,3,3,5,5,7,7−オクタメチルテトラシロキサン、1−ヒドロキシ−7−(トリフルオロメチル)−1,3,5−トリス(3,3,3−トリフルオロプロピル)−1,3,5,7,7−ペンタメチルテトラシロキサン、1−ヒドロキシ−7−(3,3,3−トリフルオロプロピル)−1,3,5−トリス(3,3,3−トリフルオロプロピル)−1,3,5,7,7−ペンタメチルテトラシロキサン、1−ヒドロキシ−7−(2,2,2−トリフルオロエチル)−1,3,5−トリス(3,3,3−トリフルオロプロピル)−1,3,5,7,7−ペンタメチルテトラシロキサン、1−ヒドロキシ−1,3,5,7−テトラキス(3,3,3−トリフルオロプロピル)−1,3,5,7,7−ペンタメチルテトラシロキサン、1−ヒドロキシ−7−(3,3,4,4,4−ペンタフルオロブチル)−1,3,5−トリス(3,3,3−トリフルオロプロピル)−1,3,5,7,7−ペンタメチルテトラシロキサン、1−ヒドロキシ−7−(3,3,4,4,5,5,5−ヘプタフルオロペンチル)−1,3,5−トリス(3,3,3−トリフルオロプロピル)−1,3,5,7,7−ペンタメチルテトラシロキサン、1−ヒドロキシ−7−(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル)−1,3,5−トリス(3,3,3−トリフルオロプロピル)−1,3,5,7,7−ペンタメチルテトラシロキサン、1−ヒドロキシ−7−(3,3,4,4,5,5,6,6,7,7,7−ウンデカフルオロへプチル)−1,3,5−トリス(3,3,3−トリフルオロプロピル)−1,3,5,7,7−ペンタメチルテトラシロキサン、1−ヒドロキシ−7−(3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチル)−1,3,5−トリス(3,3,3−トリフルオロプロピル)−1,3,5,7,7−ペンタメチルテトラシロキサン等が例示出来る。収率、安定性及び撥水特性の点で、1−ヒドロキシ−7−(3,3,3−トリフルオロプロピル)−1,1,3,3,5,5,7,7−オクタメチルテトラシロキサン、1−ヒドロキシ−7−(3,3,4,4,4−ペンタフルオロブチル)−1,1,3,3,5,5,7,7−オクタメチルテトラシロキサン、1−ヒドロキシ−7−(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル)−1,3,5−トリス(3,3,3−トリフルオロプロピル)−1,3,5,7,7−ペンタメチルテトラシロキサンが好ましく、1−ヒドロキシ−7−(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル)−1,3,5−トリス(3,3,3−トリフルオロプロピル)−1,3,5,7,7−ペンタメチルテトラシロキサンが殊更好ましい。 Examples of the fluorine-containing siloxane compound (compound 4) that can be produced by the present invention include 1-hydroxy-7- (trifluoromethyl) -1,1,3,3,5,5,7,7-octamethyltetrasiloxane, 1-hydroxy-7- (difluoromethyl) -1,1,3,3,5,5,7,7-octamethyltetrasiloxane, 1-hydroxy-7- (fluoromethyl) -1,1,3,3 , 5,5,7,7-octamethyltetrasiloxane, 1-hydroxy-7- (3,3,3-trifluoropropyl) -1,1,3,3,5,5,7,7-octamethyl Tetrasiloxane, 1-hydroxy-7- (2,2,2-trifluoroethyl) -1,1,3,3,5,5,7,7-octamethyltetrasiloxane, 1-hydroxy-7- (1 , 1,2,2,2-pentane (Fluoroethyl) -1,1,3,3,5,5,7,7-octamethyltetrasiloxane, 1-hydroxy-7- (3,3,3-trifluoropropyl) -1,1,3,3 5,5,7,7-octamethyltetrasiloxane, 1-hydroxy-7- (2,2,3,3,3-pentafluoropropyl) -1,1,3,3,5,5,7,7 -Octamethyltetrasiloxane, 1-hydroxy-7- (3,3,4,4,4-pentafluorobutyl) -1,1,3,3,5,5,7,7-octamethyltetrasiloxane, 1 -Hydroxy-7- (3,3,4,4,5,5,5-heptafluoropentyl) -1,1,3,3,5,5,7,7-octamethyltetrasiloxane, 1-hydroxy- 7- (3,3,4,4,5,5,6,6,6-nonafluoro Xyl) -1,1,3,3,5,5,7,7-octamethyltetrasiloxane, 1-hydroxy-7- (3,3,4,4,5,5,6,6,7,7 , 7-Undecafluoroheptyl) -1,1,3,3,5,5,7,7-octamethyltetrasiloxane, 1-hydroxy-7- (3,3,4,4,5,5, 6,6,7,7,8,8,8-tridecafluorooctyl) -1,1,3,3,5,5,7,7-octamethyltetrasiloxane, 1-hydroxy-7- (trifluoro Methyl) -1,3,5-tris (3,3,3-trifluoropropyl) -1,3,5,7,7-pentamethyltetrasiloxane, 1-hydroxy-7- (3,3,3- (Trifluoropropyl) -1,3,5-tris (3,3,3-trifluoropropyl) -1,3,5 , 7,7-Pentamethyltetrasiloxane, 1-hydroxy-7- (2,2,2-trifluoroethyl) -1,3,5-tris (3,3,3-trifluoropropyl) -1,3 , 5,7,7-pentamethyltetrasiloxane, 1-hydroxy-1,3,5,7-tetrakis (3,3,3-trifluoropropyl) -1,3,5,7,7-pentamethyltetra Siloxane, 1-hydroxy-7- (3,3,4,4,4-pentafluorobutyl) -1,3,5-tris (3,3,3-trifluoropropyl) -1,3,5,7 , 7-Pentamethyltetrasiloxane, 1-hydroxy-7- (3,3,4,4,5,5,5-heptafluoropentyl) -1,3,5-tris (3,3,3-trifluoro Propyl) -1,3,5,7,7-pentamethyl Tetrasiloxane, 1-hydroxy-7- (3,3,4,4,5,5,6,6,6-nonafluorohexyl) -1,3,5-tris (3,3,3-trifluoropropyl ) To 1,3,5,7,7-pentamethyltetrasiloxane, 1-hydroxy-7- (3,3,4,4,5,5,6,6,7,7,7-undecafluoro Butyl) -1,3,5-tris (3,3,3-trifluoropropyl) -1,3,5,7,7-pentamethyltetrasiloxane, 1-hydroxy-7- (3,3,4, 4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl) -1,3,5-tris (3,3,3-trifluoropropyl) -1,3,5 , 7,7-pentamethyltetrasiloxane and the like. In terms of yield, stability and water repellency, 1-hydroxy-7- (3,3,3-trifluoropropyl) -1,1,3,3,5,5,7,7-octamethyltetra Siloxane, 1-hydroxy-7- (3,3,4,4,4-pentafluorobutyl) -1,1,3,3,5,5,7,7-octamethyltetrasiloxane, 1-hydroxy-7 -(3,3,4,4,5,5,6,6,6-nonafluorohexyl) -1,3,5-tris (3,3,3-trifluoropropyl) -1,3,5 7,7-Pentamethyltetrasiloxane is preferred, and 1-hydroxy-7- (3,3,4,4,5,5,6,6,6-nonafluorohexyl) -1,3,5-tris (3 , 3,3-trifluoropropyl) -1,3,5,7,7-pentamethyltetrasiloxane A further preferred.
本発明により製造可能な含フッ素シロキサン化合物(化合物3)としては、1,1,1−トリクロロ−9−(トリフルオロメチル)−3,3,5,5,7,7,9,9−オクタメチルペンタシロキサン、1,1,1−トリクロロ−9−(ジフルオロメチル)−3,3,5,5,7,7,9,9−オクタメチルペンタシロキサン、1,1,1−トリクロロ−9−(フルオロメチル)−3,3,5,5,7,7,9,9−オクタメチルペンタシロキサン、1,1,1−トリクロロ−9−(3,3,3−トリフルオロプロピル)−3,3,5,5,7,7,9,9−オクタメチルペンタシロキサン、1,1,1−トリクロロ−9−(2,2,2−トリフルオロエチル)−3,3,5,5,7,7,9,9−オクタメチルペンタシロキサン、1,1,1−トリクロロ−9−(1,1,2,2,2−ペンタフルオロエチル)−3,3,5,5,7,7,9,9−オクタメチルペンタシロキサン、1,1,1−トリクロロ−9−(2,2,3,3,3−ペンタフルオロプロピル)−3,3,5,5,7,7,9,9−オクタメチルペンタシロキサン、1,1,1−トリクロロ−9−(3,3,4,4,4−ペンタフルオロブチル)−3,3,5,5,7,7,9,9−オクタメチルペンタシロキサン、1,1,1−トリクロロ−9−(3,3,4,4,5,5,5−ヘプタフルオロペンチル)−3,3,5,5,7,7,9,9−オクタメチルペンタシロキサン、1,1,1−トリクロロ−9−(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル)−3,3,5,5,7,7,9,9−オクタメチルペンタシロキサン、1,1,1−トリクロロ−9−(3,3,4,4,5,5,6,6,7,7,7−ウンデカフルオロへプチル)−3,3,5,5,7,7,9,9−オクタメチルペンタシロキサン、1,1,1−トリクロロ−9−(3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチル)−3,3,5,5,7,7,9,9−オクタメチルペンタシロキサン、1,1,1−トリクロロ−9−(トリフルオロメチル)−3,5,7−トリス(3,3,3−トリフルオロプロピル)−3,5,7,9,9−ペンタメチルペンタシロキサン、1,1,1−トリクロロ−9−(3,3,3−トリフルオロプロピル)−3,5,7−トリス(3,3,3−トリフルオロプロピル)−3,5,7,9,9−ペンタメチルペンタシロキサン、1,1,1−トリクロロ−9−(2,2,2−トリフルオロエチル)−3,5,7−トリス(3,3,3−トリフルオロプロピル)−3,5,7,9,9−ペンタメチルペンタシロキサン、1,1,1−トリクロロ−3,5,7,9−テトラキス(3,3,3−トリフルオロプロピル)−3,5,7,9,9−ペンタメチルペンタシロキサン、1,1,1−トリクロロ−9−(3,3,4,4,4−ペンタフルオロブチル)−3,5,7−トリス(3,3,3−トリフルオロプロピル)−3,5,7,9,9−ペンタメチルペンタシロキサン、1,1,1−トリクロロ−9−(3,3,4,4,5,5,5−ヘプタフルオロペンチル)−3,5,7−トリス(3,3,3−トリフルオロプロピル)−3,5,7,9,9−ペンタメチルペンタシロキサン、1,1,1−トリクロロ−9−(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル)−3,5,7−トリス(3,3,3−トリフルオロプロピル)−3,5,7,9,9−ペンタメチルペンタシロキサン、1,1,1−トリクロロ−9−(3,3,4,4,5,5,6,6,7,7,7−ウンデカフルオロへプチル)−3,5,7−トリス(3,3,3−トリフルオロプロピル)−3,5,7,9,9−ペンタメチルペンタシロキサン、1,1,1−トリクロロ−9−(3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチル)−3,5,7−トリス(3,3,3−トリフルオロプロピル)−3,5,7,9,9−ペンタメチルペンタシロキサン、1,1,1−トリクロロ−9−(トリフルオロメチル)−3,3,5,5,7,7,9,9−オクタメチルペンタシロキサン、1,1,1−トリクロロ−9−(ジフルオロメチル)−3,3,5,5,7,7,9,9−オクタメチルペンタシロキサン、1,1,1−トリクロロ−9−(フルオロメチル)−3,3,5,5,7,7,9,9−オクタメチルペンタシロキサン、1,1,1−トリクロロ−9−(3,3,3−トリフルオロプロピル)−3,3,5,5,7,7,9,9−オクタメチルペンタシロキサン、1,1,1−トリクロロ−9−(2,2,2−トリフルオロエチル)−3,3,5,5,7,7,9,9−オクタメチルペンタシロキサン、1,1,1−トリクロロ−9−(1,1,2,2,2−ペンタフルオロエチル)−3,3,5,5,7,7,9,9−オクタメチルペンタシロキサン、1,1,1−トリクロロ−9−(2,2,3,3,3−ペンタフルオロプロピル)−3,3,5,5,7,7,9,9−オクタメチルペンタシロキサン、1,1,1−トリクロロ−9−(3,3,4,4,4−ペンタフルオロブチル)−3,3,5,5,7,7,9,9−オクタメチルペンタシロキサン、1,1,1−トリクロロ−9−(3,3,4,4,5,5,5−ヘプタフルオロペンチル)−3,3,5,5,7,7,9,9−オクタメチルペンタシロキサン、1,1,1−トリクロロ−9−(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル)−3,3,5,5,7,7,9,9−オクタメチルペンタシロキサン、1,1,1−トリクロロ−9−(3,3,4,4,5,5,6,6,7,7,7−ウンデカフルオロへプチル)−3,3,5,5,7,7,9,9−オクタメチルペンタシロキサン、1,1,1−トリクロロ−9−(3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチル)−3,3,5,5,7,7,9,9−オクタメチルペンタシロキサン、1,1,1−トリメトキシ−9−(トリフルオロメチル)−3,5,7−トリス(3,3,3−トリフルオロプロピル)−3,5,7,9,9−ペンタメチルペンタシロキサン、1,1,1−トリメトキシ−9−(3,3,3−トリフルオロプロピル)−3,5,7−トリス(3,3,3−トリフルオロプロピル)−3,5,7,9,9−ペンタメチルペンタシロキサン、1,1,1−トリメトキシ−9−(2,2,2−トリフルオロエチル)−3,5,7−トリス(3,3,3−トリフルオロプロピル)−3,5,7,9,9−ペンタメチルペンタシロキサン、1,1,1−トリメトキシ−3,5,7,9−テトラキス(3,3,3−トリフルオロプロピル)−3,5,7,9,9−ペンタメチルペンタシロキサン、1,1,1−トリメトキシ−9−(3,3,4,4,4−ペンタフルオロブチル)−3,5,7−トリス(3,3,3−トリフルオロプロピル)−3,5,7,9,9−ペンタメチルペンタシロキサン、1,1,1−トリメトキシ−9−(3,3,4,4,5,5,5−ヘプタフルオロペンチル)−3,5,7−トリス(3,3,3−トリフルオロプロピル)−3,5,7,9,9−ペンタメチルペンタシロキサン、1,1,1−トリメトキシ−9−(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル)−3,5,7−トリス(3,3,3−トリフルオロプロピル)−3,5,7,9,9−ペンタメチルペンタシロキサン、1,1,1−トリメトキシ−9−(3,3,4,4,5,5,6,6,7,7,7−ウンデカフルオロへプチル)−3,5,7−トリス(3,3,3−トリフルオロプロピル)−3,5,7,9,9−ペンタメチルペンタシロキサン、1,1,1−トリメトキシ−9−(3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチル)−3,5,7−トリス(3,3,3−トリフルオロプロピル)−3,5,7,9,9−ペンタメチルペンタシロキサン等が例示出来る。収率、安定性及び撥水特性の点で、1,1,1−トリクロロ−9−(3,3,3−トリフルオロプロピル)−3,3,5,5,7,7,9,9−オクタメチルペンタシロキサン、1,1,1−トリメトキシ−9−(3,3,3−トリフルオロプロピル)−3,3,5,5,7,7,9,9−オクタメチルペンタシロキサン、1,1,1−トリクロロ−9−(3,3,4,4,4−ペンタフルオロブチル)−3,3,5,5,7,7,9,9−オクタメチルペンタシロキサン、1,1,1−トリメトキシ−9−(3,3,4,4,4−ペンタフルオロブチル)−3,3,5,5,7,7,9,9−オクタメチルペンタシロキサン、1,1,1−トリクロロ−9−(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル)−3,5,7−トリス(3,3,3−トリフルオロプロピル)−3,5,7,9,9−ペンタメチルペンタシロキサン、1,1,1−トリメトキシ−9−(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル)−3,5,7−トリス(3,3,3−トリフルオロプロピル)−3,5,7,9,9−ペンタメチルペンタシロキサンが好ましく、1,1,1−トリメトキシ−9−(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル)−3,5,7−トリス(3,3,3−トリフルオロプロピル)−3,5,7,9,9−ペンタメチルペンタシロキサンが殊更好ましい。 Examples of the fluorine-containing siloxane compound (Compound 3) that can be produced by the present invention include 1,1,1-trichloro-9- (trifluoromethyl) -3,3,5,5,7,7,9,9-octa. Methylpentasiloxane, 1,1,1-trichloro-9- (difluoromethyl) -3,3,5,5,7,7,9,9-octamethylpentasiloxane, 1,1,1-trichloro-9- (Fluoromethyl) -3,3,5,5,7,7,9,9-octamethylpentasiloxane, 1,1,1-trichloro-9- (3,3,3-trifluoropropyl) -3, 3,5,5,7,7,9,9-octamethylpentasiloxane, 1,1,1-trichloro-9- (2,2,2-trifluoroethyl) -3,3,5,5,7 , 7,9,9-octamethylpentasiloxane, 1,1, -Trichloro-9- (1,1,2,2,2-pentafluoroethyl) -3,3,5,5,7,7,9,9-octamethylpentasiloxane, 1,1,1-trichloro- 9- (2,2,3,3,3-pentafluoropropyl) -3,3,5,5,7,7,9,9-octamethylpentasiloxane, 1,1,1-trichloro-9- ( 3,3,4,4,4-pentafluorobutyl) -3,3,5,5,7,7,9,9-octamethylpentasiloxane, 1,1,1-trichloro-9- (3,3 , 4,4,5,5,5-heptafluoropentyl) -3,3,5,5,7,7,9,9-octamethylpentasiloxane, 1,1,1-trichloro-9- (3, 3,4,4,5,5,6,6,6-nonafluorohexyl) -3,3,5,5,7,7,9, -Octamethylpentasiloxane, 1,1,1-trichloro-9- (3,3,4,4,5,5,6,6,7,7,7-undecafluoroheptyl) -3,3 5,5,7,7,9,9-octamethylpentasiloxane, 1,1,1-trichloro-9- (3,3,4,4,5,5,6,6,7,7,8, 8,8-tridecafluorooctyl) -3,3,5,5,7,7,9,9-octamethylpentasiloxane, 1,1,1-trichloro-9- (trifluoromethyl) -3,5 , 7-Tris (3,3,3-trifluoropropyl) -3,5,7,9,9-pentamethylpentasiloxane, 1,1,1-trichloro-9- (3,3,3-trifluoro Propyl) -3,5,7-tris (3,3,3-trifluoropropyl) -3,5,7,9,9 -Pentamethylpentasiloxane, 1,1,1-trichloro-9- (2,2,2-trifluoroethyl) -3,5,7-tris (3,3,3-trifluoropropyl) -3,5 , 7,9,9-Pentamethylpentasiloxane, 1,1,1-trichloro-3,5,7,9-tetrakis (3,3,3-trifluoropropyl) -3,5,7,9,9 -Pentamethylpentasiloxane, 1,1,1-trichloro-9- (3,3,4,4,4-pentafluorobutyl) -3,5,7-tris (3,3,3-trifluoropropyl) -3,5,7,9,9-pentamethylpentasiloxane, 1,1,1-trichloro-9- (3,3,4,4,5,5,5-heptafluoropentyl) -3,5 7-tris (3,3,3-trifluoropropyl) -3,5 7,9,9-pentamethylpentasiloxane, 1,1,1-trichloro-9- (3,3,4,4,5,5,6,6,6-nonafluorohexyl) -3,5,7 Tris (3,3,3-trifluoropropyl) -3,5,7,9,9-pentamethylpentasiloxane, 1,1,1-trichloro-9- (3,3,4,4,5, 5,6,6,7,7,7-undecafluoroheptyl) -3,5,7-tris (3,3,3-trifluoropropyl) -3,5,7,9,9-pentamethyl Pentasiloxane, 1,1,1-trichloro-9- (3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl) -3,5 7-tris (3,3,3-trifluoropropyl) -3,5,7,9,9-pentamethylpentasiloxane, 1 1,1-trichloro-9- (trifluoromethyl) -3,3,5,5,7,7,9,9-octamethylpentasiloxane, 1,1,1-trichloro-9- (difluoromethyl)- 3,3,5,5,7,7,9,9-octamethylpentasiloxane, 1,1,1-trichloro-9- (fluoromethyl) -3,3,5,5,7,7,9, 9-octamethylpentasiloxane, 1,1,1-trichloro-9- (3,3,3-trifluoropropyl) -3,3,5,5,7,7,9,9-octamethylpentasiloxane, 1,1,1-trichloro-9- (2,2,2-trifluoroethyl) -3,3,5,5,7,7,9,9-octamethylpentasiloxane, 1,1,1-trichloro -9- (1,1,2,2,2-pentafluoroethyl) -3,3 , 5,5,7,7,9,9-octamethylpentasiloxane, 1,1,1-trichloro-9- (2,2,3,3,3-pentafluoropropyl) -3,3,5 5,7,7,9,9-octamethylpentasiloxane, 1,1,1-trichloro-9- (3,3,4,4,4-pentafluorobutyl) -3,3,5,5,7 , 7,9,9-octamethylpentasiloxane, 1,1,1-trichloro-9- (3,3,4,4,5,5,5-heptafluoropentyl) -3,3,5,5 7,7,9,9-octamethylpentasiloxane, 1,1,1-trichloro-9- (3,3,4,4,5,5,6,6,6-nonafluorohexyl) -3,3 , 5,5,7,7,9,9-octamethylpentasiloxane, 1,1,1-trichloro-9- (3,3 , 4,5,5,6,6,7,7,7-undecafluoroheptyl) -3,3,5,5,7,7,9,9-octamethylpentasiloxane, 1,1,1 -Trichloro-9- (3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl) -3,3,5,5,7,7, 9,9-octamethylpentasiloxane, 1,1,1-trimethoxy-9- (trifluoromethyl) -3,5,7-tris (3,3,3-trifluoropropyl) -3,5,7, 9,9-pentamethylpentasiloxane, 1,1,1-trimethoxy-9- (3,3,3-trifluoropropyl) -3,5,7-tris (3,3,3-trifluoropropyl)- 3,5,7,9,9-pentamethylpentasiloxane, 1,1,1-trimethoxy-9- (2 2,2-trifluoroethyl) -3,5,7-tris (3,3,3-trifluoropropyl) -3,5,7,9,9-pentamethylpentasiloxane, 1,1,1-trimethoxy -3,5,7,9-tetrakis (3,3,3-trifluoropropyl) -3,5,7,9,9-pentamethylpentasiloxane, 1,1,1-trimethoxy-9- (3 3,4,4,4-pentafluorobutyl) -3,5,7-tris (3,3,3-trifluoropropyl) -3,5,7,9,9-pentamethylpentasiloxane, 1,1 , 1-Trimethoxy-9- (3,3,4,4,5,5,5-heptafluoropentyl) -3,5,7-tris (3,3,3-trifluoropropyl) -3,5 7,9,9-pentamethylpentasiloxane, 1,1,1-tri Methoxy-9- (3,3,4,4,5,5,6,6,6-nonafluorohexyl) -3,5,7-tris (3,3,3-trifluoropropyl) -3,5 , 7,9,9-Pentamethylpentasiloxane, 1,1,1-trimethoxy-9- (3,3,4,4,5,5,6,6,7,7,7-undecafluoroheptyl ) -3,5,7-Tris (3,3,3-trifluoropropyl) -3,5,7,9,9-pentamethylpentasiloxane, 1,1,1-trimethoxy-9- (3,3 , 4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl) -3,5,7-tris (3,3,3-trifluoropropyl) -3, 5,7,9,9-pentamethylpentasiloxane and the like can be exemplified. In terms of yield, stability and water repellency, 1,1,1-trichloro-9- (3,3,3-trifluoropropyl) -3,3,5,5,7,7,9,9 -Octamethylpentasiloxane, 1,1,1-trimethoxy-9- (3,3,3-trifluoropropyl) -3,3,5,5,7,7,9,9-octamethylpentasiloxane, , 1,1-Trichloro-9- (3,3,4,4,4-pentafluorobutyl) -3,3,5,5,7,7,9,9-octamethylpentasiloxane, 1,1, 1-trimethoxy-9- (3,3,4,4,4-pentafluorobutyl) -3,3,5,5,7,7,9,9-octamethylpentasiloxane, 1,1,1-trichloro -9- (3,3,4,4,5,5,6,6,6-nonafluorohexyl) -3,5,7- Lis (3,3,3-trifluoropropyl) -3,5,7,9,9-pentamethylpentasiloxane, 1,1,1-trimethoxy-9- (3,3,4,4,5,5 , 6,6,6-nonafluorohexyl) -3,5,7-tris (3,3,3-trifluoropropyl) -3,5,7,9,9-pentamethylpentasiloxane, 1,1-trimethoxy-9- (3,3,4,4,5,5,6,6,6-nonafluorohexyl) -3,5,7-tris (3,3,3-trifluoropropyl) Particularly preferred is -3,5,7,9,9-pentamethylpentasiloxane.
次に本発明の製造方法について説明する。化合物(4)で表される含フッ素シロキサン化合物は、ジヒドロキシシロキサン化合物(化合物5)とフルオロアルキル置換シラン化合物(化合物6)とを反応させる工程1により製造することが出来る。また化合物(3)で表される含フッ素シロキサン化合物は、含フッ素シロキサン化合物(4)とシラン化合物(7)とを反応させる工程2により製造することが出来る。 Next, the manufacturing method of the present invention will be described. The fluorine-containing siloxane compound represented by the compound (4) can be produced by the step 1 of reacting a dihydroxysiloxane compound (compound 5) with a fluoroalkyl-substituted silane compound (compound 6). The fluorine-containing siloxane compound represented by the compound (3) can be produced by the step 2 of reacting the fluorine-containing siloxane compound (4) with the silane compound (7).
(式中、R1は炭素数1〜8のフルオロアルキル基を表す。R2、R3、R4及びR5は、各々独立に、フッ素原子で置換されていてもよい炭素数1〜8のアルキル基を表す。Xはハロゲン原子又は炭素数1〜3のアルコキシ基を表す。nは2又は3を表す。) (In the formula, R 1 represents a fluoroalkyl group having 1 to 8 carbon atoms. R 2 , R 3 , R 4 and R 5 each independently represent a C 1 to C 8 optionally substituted by a fluorine atom. X represents a halogen atom or an alkoxy group having 1 to 3 carbon atoms, and n represents 2 or 3.)
(式中、R1は炭素数1〜8のフルオロアルキル基を表す。R2、R3、R4及びR5は、各々独立に、フッ素原子で置換されていてもよい炭素数1〜8のアルキル基を表す。R6、R7及びR8は、各々独立に、炭素数1〜2のアルキル、ハロゲン原子又は炭素数1〜3のアルコキシ基を表し、R6、R7又はR8の少なくとも1つはハロゲン原子又は炭素数1〜3のアルコキシ基である。Xはハロゲン原子又は炭素数1〜3のアルコキシ基を表す。nは2又は3を表す。) (In the formula, R 1 represents a fluoroalkyl group having 1 to 8 carbon atoms. R 2 , R 3 , R 4 and R 5 each independently represent a C 1 to C 8 optionally substituted by a fluorine atom. R 6 , R 7 and R 8 each independently represent an alkyl group having 1 to 2 carbon atoms, a halogen atom or an alkoxy group having 1 to 3 carbon atoms, and R 6 , R 7 or R 8 Is a halogen atom or an alkoxy group having 1 to 3 carbon atoms, X represents a halogen atom or an alkoxy group having 1 to 3 carbon atoms, and n represents 2 or 3.)
(工程1)
工程1について説明する。工程1の原料として用いるジヒドロキシシロキサン化合物(5)のうち、nが2又は3である直鎖状含フッ素トリシロキサン化合物は、多くの特許及び非特許文献に記載の方法で、当業者であれば容易に製造することが出来る(特開2000−113942、Zeitschrift fuer Anorganische und Allgemeine Chemie,536巻,197頁,1986年.)。また、一般式(6)で表されるフルオロアルキル置換シラン化合物は、多くの特許及び非特許文献に記載の方法で、当業者であれば容易に製造することが出来る(Inorganica Chimica Acta,359巻,2674頁,2006年.特開平04−059782.)。
(Step 1)
Step 1 will be described. Among the dihydroxysiloxane compounds (5) used as a raw material in the step 1, the linear fluorinated trisiloxane compound in which n is 2 or 3 can be obtained by a method described in many patents and non-patent documents by those skilled in the art. It can be easily manufactured (JP-A-2000-113942, Zeitschrift fur Anorganische und Allgemeine Chemie, 536, 197, 1986). Further, the fluoroalkyl-substituted silane compound represented by the general formula (6) can be easily produced by those skilled in the art by the methods described in many patents and non-patent documents (Inorganica Chimica Acta, Vol. 359). , P. 2474, 2006. JP-A-04-059782.).
化合物4においては、フルオロアルキル基を少なくとも1つ以上有することが必須である。化合物4の合成は、化合物5の有機溶剤溶液に対し、化合物6を加え反応させることにより製造できる。化合物5に対する化合物6の化学当量は、0.5〜2当量の範囲で製造することが好ましく、収率が高い点で0.8〜1.2当量であることがより好ましい。この製造の際、反応を加速するため、有機塩基を加えることが好ましい。有機塩基としては、有機アミンが好適に利用可能であり、当該有機アミンとしては、トリメチルアミン、ジエチルアミン、トリエチルアミン、プロピルアミン、イソプロピルアミン、ジイソプロピルアミン、ピリジン、アニリン、キノリンなどが例示できる。有機アミンの化学当量は、化合物6に対して1〜10当量の範囲内であることが好ましく、1〜2当量がより好ましい。 It is essential that compound 4 has at least one fluoroalkyl group. Compound 4 can be synthesized by adding compound 6 to a solution of compound 5 in an organic solvent and reacting. The chemical equivalent of compound 6 to compound 5 is preferably prepared in the range of 0.5 to 2 equivalents, and more preferably 0.8 to 1.2 equivalents in terms of a high yield. At the time of this production, it is preferable to add an organic base to accelerate the reaction. As the organic base, an organic amine can be suitably used, and examples of the organic amine include trimethylamine, diethylamine, triethylamine, propylamine, isopropylamine, diisopropylamine, pyridine, aniline, and quinoline. The chemical equivalent of the organic amine is preferably in the range of 1 to 10 equivalents relative to compound 6, and more preferably 1 to 2 equivalents.
工程1は、空気又は乾燥空気雰囲気下で実施することも可能であるが、収率が良い点で不活性ガス雰囲気で実施するのが好ましい。用いることが出来る不活性ガスの例としては、ヘリウム、ネオン、アルゴン、クリプトン、キセノンなどの希ガスや窒素ガスを挙げることが出来、アルゴン又は窒素ガスが更に好ましい。反応温度には特に制限はなく、当業者が水酸基を有するシロキサン化合物を製造するときの一般的な温度条件を用いることが出来る。具体例としては、−80℃〜80℃の温度範囲から適宜選択した反応温度において、本発明の含フッ素シロキサン化合物を収率良く得ることが出来る。収率、安全性及び操作性の点から、−30〜30℃の範囲から選ばれる実施温度が好ましく、より好ましくは室温である。反応時間は、反応の進行を機器分析により確認することによって適宜決定され、典型的には10分間から200時間の範囲から適宜選択した反応時間で実施することが好ましい。 Step 1 can be carried out in an atmosphere of air or dry air, but is preferably carried out in an inert gas atmosphere in terms of a good yield. Examples of the inert gas that can be used include rare gases such as helium, neon, argon, krypton, and xenon, and nitrogen gas, and argon or nitrogen gas is more preferable. The reaction temperature is not particularly limited, and a general temperature condition for a person skilled in the art to produce a siloxane compound having a hydroxyl group can be used. As a specific example, the fluorine-containing siloxane compound of the present invention can be obtained in a high yield at a reaction temperature appropriately selected from a temperature range of -80 ° C to 80 ° C. From the viewpoints of yield, safety and operability, an operating temperature selected from the range of -30 to 30 ° C is preferred, and more preferably room temperature. The reaction time is appropriately determined by confirming the progress of the reaction by instrumental analysis. Typically, the reaction is preferably performed with a reaction time appropriately selected from the range of 10 minutes to 200 hours.
工程1は、収率が良い点で有機溶媒中において実施するのが好ましい。使用可能な有機溶媒は、反応を阻害しないものであれば制限は無く、具体的にはペンタン、ヘキサン、シクロヘキサン、ヘプタンなどの脂肪族炭化水素、ベンゼン、トルエン、キシレン、エチルベンゼンなどの芳香族炭化水素、ジエチルエーテル、ジイソプロピルエーテル、シクロペンチルメチルエーテル(CPME)、テトラヒドロフラン(THF)、1,4−ジオキサン、1,2−ジメトキシエタンなどのエーテル類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類、ジクロロメタン、クロロホルム等のハロゲン化炭化水素を例示することが出来る。これら有機溶媒は、一種類を単独で用いることも、複数種を任意の割合で混合して用いることも出来る。収率が良く反応時間が短い点で、有機溶媒としてはエーテル類が好ましく、ジエチルエーテル及びTHFが好ましく、THFが更に好ましい。 Step 1 is preferably performed in an organic solvent in terms of good yield. Usable organic solvents are not limited as long as they do not hinder the reaction.Specifically, aliphatic hydrocarbons such as pentane, hexane, cyclohexane and heptane, and aromatic hydrocarbons such as benzene, toluene, xylene and ethylbenzene , Diethyl ether, diisopropyl ether, cyclopentyl methyl ether (CPME), ethers such as tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone, dichloromethane, Halogenated hydrocarbons such as chloroform can be exemplified. One of these organic solvents can be used alone, or a plurality of them can be used as a mixture at an arbitrary ratio. As the organic solvent, ethers are preferred, diethyl ether and THF are preferred, and THF is more preferred, in that the yield is good and the reaction time is short.
工程1では、反応終了後に必要に応じて当業者が水酸基を有するシロキサン化合物を精製するときの一般的な精製方法を適宜選択して用いることによって目的物を精製することが出来る。具体的な精製方法としては、洗浄、ろ過、濃縮、抽出、蒸留、昇華、再結晶、順相・逆相液体クロマトグラフィーによる分取などを例示することが出来る。 In step 1, the desired product can be purified by appropriately selecting and using a general purification method for purifying a siloxane compound having a hydroxyl group by a person skilled in the art as necessary after the completion of the reaction. Specific examples of the purification method include washing, filtration, concentration, extraction, distillation, sublimation, recrystallization, fractionation by normal phase / reverse phase liquid chromatography, and the like.
(工程2)
化合物3においては、フルオロアルキル基を少なくとも1つ以上有することが必須である。工程2で原料として用いることが出来る含フッ素シロキサン化合物(4)は、前述の工程1により製造することが出来る。化合物4に対する化合物7の化学当量は、収率が良い点で0.5〜100当量の範囲であることが好ましく、1〜10当量であることがより好ましい。また、シラン化合物(7)は、多くの特許及び非特許文献に記載の方法で、当業者であれば容易に製造することが出来る(Angewandte Chemie International Edition, 50巻、10708頁、2011年)。
(Step 2)
It is essential that compound 3 has at least one fluoroalkyl group. The fluorine-containing siloxane compound (4) which can be used as a raw material in the step 2 can be produced by the step 1 described above. The chemical equivalent of compound 7 with respect to compound 4 is preferably in the range of 0.5 to 100 equivalents, more preferably 1 to 10 equivalents, in terms of good yield. The silane compound (7) can be easily produced by those skilled in the art by the methods described in many patents and non-patent documents (Angewante Chemie International Edition, 50, 10708, 2011).
工程2では、反応を加速するため、有機塩基を加えることが好ましい。有機塩基としては、有機アミンが利用可能であり、当該有機アミンとしては、トリメチルアミン、ジエチルアミン、トリエチルアミン、プロピルアミン、イソプロピルアミン、ジイソプロピルアミン、ピリジン、アニリン、キノリンなどが例示できる。有機アミンの化学当量は、化合物7に対して1〜10当量の範囲内であることが好ましく、1〜2当量がより好ましい。
工程2は、空気又は乾燥空気雰囲気下で実施することも可能であるが、収率が良い点で不活性ガス雰囲気で実施するのが好ましい。用いることが出来る不活性ガスの例としては、ヘリウム、ネオン、アルゴン、クリプトン、キセノンなどの希ガスや窒素ガスを挙げることが出来、アルゴン又は窒素ガスが更に好ましい。反応温度には特に制限はなく、当業者が水酸基を有するシロキサン化合物を製造するときの一般的な温度条件を用いることが出来る。具体例としては、−80℃〜80℃の温度範囲から適宜選択した反応温度において、本発明の含フッ素シロキサン化合物を収率良く得ることが出来る。収率、安全性及び操作性の点から、−30〜30℃の範囲から選ばれる実施温度が好ましく、より好ましくは室温である。反応時間は、反応の進行を機器分析により確認することによって適宜決定されるが、10分間から200時間の範囲から適宜選択した反応時間で実施することが好ましい。
In step 2, it is preferable to add an organic base to accelerate the reaction. An organic amine can be used as the organic base, and examples of the organic amine include trimethylamine, diethylamine, triethylamine, propylamine, isopropylamine, diisopropylamine, pyridine, aniline, and quinoline. The chemical equivalent of the organic amine is preferably in the range of 1 to 10 equivalents relative to compound 7, and more preferably 1 to 2 equivalents.
Step 2 can be carried out in an atmosphere of air or dry air, but is preferably carried out in an atmosphere of an inert gas in terms of good yield. Examples of the inert gas that can be used include rare gases such as helium, neon, argon, krypton, and xenon, and nitrogen gas, and argon or nitrogen gas is more preferable. The reaction temperature is not particularly limited, and a general temperature condition for a person skilled in the art to produce a siloxane compound having a hydroxyl group can be used. As a specific example, the fluorine-containing siloxane compound of the present invention can be obtained in a high yield at a reaction temperature appropriately selected from a temperature range of -80 ° C to 80 ° C. From the viewpoints of yield, safety and operability, an operating temperature selected from the range of -30 to 30 ° C is preferred, and more preferably room temperature. The reaction time is appropriately determined by confirming the progress of the reaction by instrumental analysis, and is preferably performed with a reaction time appropriately selected from the range of 10 minutes to 200 hours.
工程2は、収率が良い点で有機溶媒中において実施するのが好ましい。使用可能な有機溶媒は、反応を阻害しないものであれば制限は無く、具体的にはペンタン、ヘキサン、シクロヘキサン、ヘプタンなどの脂肪族炭化水素、ベンゼン、トルエン、キシレン、エチルベンゼン等の芳香族炭化水素、ジエチルエーテル、ジイソプロピルエーテル、シクロペンチルメチルエーテル(CPME)、テトラヒドロフラン(THF)、1,4−ジオキサン、1,2−ジメトキシエタン等のエーテル類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類、ジクロロメタン、クロロホルム等のハロゲン化炭化水素を例示することが出来る。これら有機溶媒は、一種類を単独で用いることも、複数種を任意の割合で混合して用いることも出来る。収率が良く反応時間が短い点で、有機溶媒としてはエーテル類が好ましく、ジエチルエーテル及びTHFが好ましく、THFが更に好ましい。 Step 2 is preferably performed in an organic solvent in terms of good yield. Usable organic solvents are not limited as long as they do not inhibit the reaction.Specifically, aliphatic hydrocarbons such as pentane, hexane, cyclohexane and heptane, and aromatic hydrocarbons such as benzene, toluene, xylene and ethylbenzene Ethers such as diethyl ether, diisopropyl ether, cyclopentyl methyl ether (CPME), tetrahydrofuran (THF), 1,4-dioxane and 1,2-dimethoxyethane, ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone, dichloromethane, Halogenated hydrocarbons such as chloroform can be exemplified. One of these organic solvents can be used alone, or a plurality of them can be used as a mixture at an arbitrary ratio. As the organic solvent, ethers are preferred, diethyl ether and THF are preferred, and THF is more preferred, in that the yield is good and the reaction time is short.
工程2では、反応終了後に必要に応じて当業者が反応性基を有するシロキサン化合物を精製するときの一般的な精製方法を適宜選択して用いることによって目的物を精製することが出来る。具体的な精製方法としては、洗浄、ろ過、抽出、濃縮、蒸留、昇華、再結晶、順相・逆相液体クロマトグラフィーによる分取などを例示することが出来る。高分子量の不純物を除き、より純度を高められるという点から、減圧蒸留による精製がより好適である。 In step 2, the desired product can be purified by appropriately selecting and using a general purification method for purifying a siloxane compound having a reactive group by a person skilled in the art as necessary after the completion of the reaction. Specific examples of the purification method include washing, filtration, extraction, concentration, distillation, sublimation, recrystallization, and fractionation by normal-phase / reverse-phase liquid chromatography. Purification by distillation under reduced pressure is more preferable in that the purity can be increased by removing high molecular weight impurities.
<コーティング剤>
本発明のコーティング剤は、含フッ素シロキサン化合物(1)、(2)又は(3)と液状媒体とを含み、それらを混合することによって製造が出来る。本発明のコーティング剤は液状であればよく、溶液でもよく、分散液でもよい。本発明のコーティング剤は、含フッ素シロキサン化合物(1)、(2)又は(3)を含んでいればよく、工程1や工程2で生成した副生成物などの不純物を含んでもよい。本発明のコーティング剤は、本発明の含フッ素シロキサン化合物(1)、(2)又は(3)を0.001〜10質量%含むことが好ましく、0.1〜1質量%が更に好ましい。本発明のコーティング剤は、工程1や工程2を通じて純度95質量%以上に精製した含フッ素シロキサン化合物(1)、(2)又は(3)と液状媒体とを含むことが殊更好ましい。
<Coating agent>
The coating agent of the present invention contains the fluorine-containing siloxane compound (1), (2) or (3) and a liquid medium, and can be produced by mixing them. The coating agent of the present invention may be a liquid, and may be a solution or a dispersion. The coating agent of the present invention only needs to contain the fluorine-containing siloxane compound (1), (2) or (3), and may contain impurities such as by-products generated in the steps 1 and 2. The coating agent of the present invention preferably contains the fluorine-containing siloxane compound (1), (2) or (3) of the present invention in an amount of 0.001 to 10% by mass, more preferably 0.1 to 1% by mass. It is particularly preferable that the coating agent of the present invention contains a fluorine-containing siloxane compound (1), (2) or (3) purified to a purity of 95% by mass or more through Steps 1 and 2, and a liquid medium.
<液状媒体>
本発明における液状媒体の沸点は−10〜200℃が好ましく、40〜150℃が特に好ましい。液状媒体としては有機溶媒が好ましい。有機溶媒としてはフッ素系有機溶媒でもよく、非フッ素系有機溶媒でもよい。フッ素系有機溶媒としては、ペルフルオロヘキサン、ペルフルオロオクタン、ペルフルオロケロセンが好適な例として挙げられる。非フッ素系有機溶媒としては、炭化水素系有機溶媒、アルコール系有機溶媒、ケトン系有機溶媒、エーテル系有機溶媒、エステル系有機溶媒及びハロアルカンが好適な例として挙げられる。炭化水素系有機溶媒としては、ヘキサン、へプタン、シクロヘキサン等が好ましい。ケトン系有機溶媒としては、アセトン、メチルエチルケトン、メチルイソブチルケトン等が好ましい。エーテル系有機溶媒としては、ジエチルエーテル、テトラヒドロフラン、テトラエチレングリコールジメチルエーテル等が好ましい。エステル系有機溶媒としては、酢酸エチル、酢酸ブチル等が好ましい。ハロアルカンとしては、ジクロロメタン、クロロホルム、四塩化炭素などが好ましい。保存安定性に優れ、溶解性が高い点において、クロロホルムが更に好ましい。コーティング剤は、化合物(1)、(2)又は(3)及び液状媒体の他に、本発明の効果を損なわない範囲で、他の成分を含有してもよい。
<Liquid medium>
The boiling point of the liquid medium in the present invention is preferably from -10 to 200C, particularly preferably from 40 to 150C. Organic solvents are preferred as the liquid medium. The organic solvent may be a fluorinated organic solvent or a non-fluorinated organic solvent. Preferred examples of the fluorinated organic solvent include perfluorohexane, perfluorooctane, and perfluorokerosene. Preferred examples of the non-fluorinated organic solvent include hydrocarbon organic solvents, alcohol organic solvents, ketone organic solvents, ether organic solvents, ester organic solvents, and haloalkanes. As the hydrocarbon organic solvent, hexane, heptane, cyclohexane and the like are preferable. As the ketone organic solvent, acetone, methyl ethyl ketone, methyl isobutyl ketone and the like are preferable. As the ether-based organic solvent, diethyl ether, tetrahydrofuran, tetraethylene glycol dimethyl ether and the like are preferable. As the ester organic solvent, ethyl acetate, butyl acetate and the like are preferable. As the haloalkane, dichloromethane, chloroform, carbon tetrachloride and the like are preferable. Chloroform is more preferred because of its excellent storage stability and high solubility. The coating agent may contain, besides the compound (1), (2) or (3) and the liquid medium, other components as long as the effects of the present invention are not impaired.
本発明の含フッ素シロキサン化合物を含むコーティング剤を基材の表面に塗布して塗布膜を形成し、該塗布膜から液状媒体を除去することにより、基材の表面処理を行うことができる。コーティング剤の塗布方法は公知の手法を適宜用いることができる。塗布方法としては、スピンコート法、ワイプコート法、スプレーコート法、ディップコート法、インクジェット法、ロールコート法、キャスト法、ラングミュア・ブロジェット法またはグラビアコート法が好ましく、スピンコート法及びディップコート法がより好ましい。
液状媒体を除去する方法は、コーティング剤の塗布膜から液状媒体を蒸発除去できる方法であればよく、公知の手法を適宜用いることができる。液状媒体を蒸発除去する温度は液状媒体の沸点以上であればよく、液状媒体の種類により適宜選択される。また、場合により減圧下で除去することもできるので液状媒体の沸点未満の温度で液状媒体を蒸発除去することもできる。
The surface treatment of the substrate can be performed by applying a coating agent containing the fluorine-containing siloxane compound of the present invention to the surface of the substrate to form a coating film and removing the liquid medium from the coating film. A known method can be appropriately used as a method for applying the coating agent. The coating method is preferably a spin coating method, a wipe coating method, a spray coating method, a dip coating method, an ink jet method, a roll coating method, a casting method, a Langmuir-Blodgett method or a gravure coating method, and a spin coating method and a dip coating method. Is more preferred.
The method for removing the liquid medium may be any method capable of evaporating and removing the liquid medium from the coating film of the coating agent, and a known method can be appropriately used. The temperature at which the liquid medium is removed by evaporation may be any temperature as long as it is equal to or higher than the boiling point of the liquid medium, and is appropriately selected depending on the type of the liquid medium. Further, in some cases, the liquid medium can be removed under reduced pressure, so that the liquid medium can be removed by evaporation at a temperature lower than the boiling point of the liquid medium.
表面処理後、必要に応じて表面処理層を洗浄してもよい。具体的な洗浄方法としては、例えば、表面処理層に溶剤をかけ流す方法や、溶剤をしみ込ませた布でふき取る方法が挙げられる。 After the surface treatment, the surface treatment layer may be washed as necessary. Specific examples of the cleaning method include a method of pouring a solvent through the surface treatment layer and a method of wiping with a cloth impregnated with the solvent.
<基材>
本発明において、表面処理の対象となる基材は、撥水撥油性の付与が求められているガラス基材であれば特に限定されない。
<Substrate>
In the present invention, the substrate to be subjected to the surface treatment is not particularly limited as long as it is a glass substrate which is required to be imparted with water / oil repellency.
本発明の含フッ素シロキサン化合物(化合物(1))または該化合物を含むコーティング剤を用いて基材の表面を処理して表面処理層が形成されることにより、良好な撥水撥油性が付与される。また、該表面処理層は無色透明であるため、タッチパネルを構成する部材として好適である。タッチパネルとは、指等による接触によってその接触位置情報を入力する装置と表示装置とを組み合わせた入力/表示装置(タッチパネル装置)の、入力装置を意味する。タッチパネルは、基材と、入力検出方式に応じて、透明導電膜、電極、配線、IC等とから構成されている。基材の表面処理層を有する面をタッチパネルの入力面とすることにより、良好な指紋除去性を有するタッチパネルが得られる。タッチパネル用基材の材質は透光性を有する。タッチパネル用基材の材質としては、ガラス基材が好ましい。ガラスとしてはソーダライムガラス、ホウ珪酸ガラス、無アルカリガラス、クリスタルガラス、石英ガラスが好ましく、化学強化ガラスが特に好ましい。 By treating the surface of the substrate with the fluorine-containing siloxane compound (compound (1)) of the present invention or a coating agent containing the compound to form a surface-treated layer, good water and oil repellency is imparted. You. Further, since the surface treatment layer is colorless and transparent, it is suitable as a member constituting a touch panel. The touch panel means an input device of an input / display device (touch panel device) in which a device for inputting contact position information by contact with a finger or the like and a display device are combined. The touch panel includes a base material, a transparent conductive film, an electrode, a wiring, an IC, and the like according to an input detection method. By using the surface of the substrate having the surface treatment layer as the input surface of the touch panel, a touch panel having good fingerprint removability can be obtained. The material of the substrate for the touch panel has a light transmitting property. As the material of the substrate for the touch panel, a glass substrate is preferable. As the glass, soda lime glass, borosilicate glass, alkali-free glass, crystal glass, and quartz glass are preferable, and chemically strengthened glass is particularly preferable.
また、本発明における基材として、液晶ディスプレイ、CRTディスプレイ、プロジェクションディスプレイ、プラズマディスプレイ、ELディスプレイ等の各種ディスプレイの最表面を構成するディスプレイ用基材も好適であり、本発明の含フッ素シロキサン化合物またはコーティング剤を用いた表面処理によって表面処理層を形成することにより、良好な汚れ除去性が得られる。 Further, as a substrate in the present invention, a display substrate constituting the outermost surface of various displays such as a liquid crystal display, a CRT display, a projection display, a plasma display, and an EL display is also suitable. By forming the surface treatment layer by surface treatment using a coating agent, good stain removal properties can be obtained.
以下、実施例および参考例を示し、本発明を具体的に説明するが、本発明は下記の実施例に制限されるものではない。 Hereinafter, the present invention will be described specifically with reference to Examples and Reference Examples, but the present invention is not limited to the following Examples.
(参考例1) (Reference Example 1)
磁気撹拌子及びジムロート冷却管を備えた200mL二つ口フラスコをアルゴンで置換し、クロロトリス(トリフェニルホスフィン)ロジウム(I)0.125g(0.135mmol)、脱水トルエン50mL、3,3,4,4,5,5,6,6,6−ノナフルオロ−1−ヘキセン12.4g(50.3mmol)及びクロロジメチルシラン9.46g(100mmol)を収めた。120℃で10時間加熱還流し、ガスクロマトグラフィーにて反応終了を確認した。常圧蒸留でトルエンを留去後、減圧蒸留(沸点67℃/2.9kPa)することにより、クロロ(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル)ジメチルシランを無色透明な液体として6.78g(収率39.6%,GC純度80%)得た。
GC−MS(EI,70eV)m/z(%):228(2),189(21),145(24),119(8),109(100);1H−NMR(400MHz,CDCl3):δ0.48(s,6H),1.04〜1.08(m,2H),2.10〜2.23(m,2H);13C−NMR(100MHz,CDCl3):δ1.36,8.95,25.6,116.3,118.9,121.6;29Si−NMR(79MHz,CDCl3):δ−22.9;19F−NMR(376MHz,CDCl3):δ−123.1,−124.2,−116.0,−81.0;IR(neat,cm−1):2970,2908,1442,1350,1211,879,849,802,702.
A 200 mL two-necked flask equipped with a magnetic stirrer and a Dimroth condenser was replaced with argon, and 0.125 g (0.135 mmol) of chlorotris (triphenylphosphine) rhodium (I), 50 mL of dehydrated toluene, 3, 3, 4, It contained 12.4 g (50.3 mmol) of 4,5,5,6,6,6-nonafluoro-1-hexene and 9.46 g (100 mmol) of chlorodimethylsilane. The mixture was heated under reflux at 120 ° C. for 10 hours, and the completion of the reaction was confirmed by gas chromatography. After distilling off toluene by atmospheric pressure distillation, chloro (3,3,4,4,5,5,6,6,6-nonafluorohexyl) dimethyl is obtained by distillation under reduced pressure (boiling point 67 ° C./2.9 kPa). 6.78 g (yield 39.6%, GC purity 80%) of silane was obtained as a colorless transparent liquid.
GC-MS (EI, 70 eV) m / z (%): 228 (2), 189 (21), 145 (24), 119 (8), 109 (100); 1 H-NMR (400 MHz, CDCl 3 ) : Δ 0.48 (s, 6H), 1.04 to 1.08 (m, 2H), 2.10 to 2.23 (m, 2H); 13 C-NMR (100 MHz, CDCl 3 ): δ 1.36 , 8.95, 25.6, 116.3, 118.9, 121.6; 29 Si-NMR (79 MHz, CDCl 3 ): δ-22.9; 19 F-NMR (376 MHz, CDCl 3 ): δ. -123.1, -124.2, -116.0, -81.0; IR (neat, cm -1 ): 2970, 2908, 1442, 1350, 1211, 879, 849, 802, 702.
(参考例2) (Reference Example 2)
磁気撹拌子及びジムロート冷却管を備えた200mL二つ口フラスコをアルゴンで置換し、クロロトリス(トリフェニルホスフィン)ロジウム(I)0.268g(0.290mmol)、脱水トルエン50mL、(パ−フルオロヘキシル)エチレン21.1g(60.8mmol)及びクロロジメチルシラン12.8g(136mmol)を収めた。150℃で18時間加熱還流後、クロロジメチルシラン5.48g(57.9mmol)を加え150℃で3時間加熱還流させた。ガスクロマトグラフィーにて反応終了を確認した。減圧下でトルエンを留去後、クーゲルロール蒸留装置を用いて減圧蒸留(蒸留温度50℃/40Pa)することによりクロロ(3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチル)ジメチルシランを無色透明な液体として14.7g(収率55.0%,GC純度91%)得た。
GC−MS(EI,70eV)m/z(%):309(3),269(2),245(13),239(14),219(3),119(8),109(100);1H−NMR(400MHz,CDCl3):δ0.48(s,6H),1.04〜1.09(m,2H),2.10〜2.23(m,2H);13C−NMR(100MHz,CDCl3):δ1.27,9.36,26.17,109.64,122.26,114.48,116.80,119.48,122.18;29Si−NMR(79MHz,CDCl3):δ−31.7;19F−NMR(376MHz,CDCl3):δ−126.2,−123.3,−122.9,−122.0,−81.0;IR(neat,cm−1):2968,2910,1442,1362,1234,1066,844,810,802,634.
The 200-mL two-necked flask equipped with a magnetic stirrer and a Dimroth condenser was replaced with argon, and 0.268 g (0.290 mmol) of chlorotris (triphenylphosphine) rhodium (I), 50 mL of dehydrated toluene, (perfluorohexyl) It contained 21.1 g (60.8 mmol) of ethylene and 12.8 g (136 mmol) of chlorodimethylsilane. After heating under reflux at 150 ° C. for 18 hours, 5.48 g (57.9 mmol) of chlorodimethylsilane was added, and the mixture was heated under reflux at 150 ° C. for 3 hours. The completion of the reaction was confirmed by gas chromatography. After toluene was distilled off under reduced pressure, chloro (3,3,4,4,5,5,6,7,6,7,7) was distilled under reduced pressure (distillation temperature 50 ° C / 40Pa) using a Kugelrohr distillation apparatus. (8,8,8-Tridecafluorooctyl) dimethylsilane was obtained as a colorless and transparent liquid (14.7 g, yield 55.0%, GC purity 91%).
GC-MS (EI, 70 eV) m / z (%): 309 (3), 269 (2), 245 (13), 239 (14), 219 (3), 119 (8), 109 (100); 1 H-NMR (400 MHz, CDCl 3 ): δ 0.48 (s, 6H), 1.04 to 1.09 (m, 2H), 2.10 to 2.23 (m, 2H); 13 C-NMR (100 MHz, CDCl 3 ): δ 1.27, 9.36, 26.17, 109.64, 122.26, 114.48, 116.80, 119.48, 122.18; 29 Si-NMR (79 MHz, CDCl 3 ): δ-31.7; 19 F-NMR (376 MHz, CDCl 3 ): δ-126.2, -123.3, -122.9, -122.0, -81.0; IR (neat , cm -1): 2968,291 , 1442,1362,1234,1066,844,810,802,634.
(参考例3) (Reference Example 3)
磁気撹拌子及びジムロート冷却管を備えた200mL二つ口フラスコをアルゴンで置換し、クロロトリス(トリフェニルホスフィン)ロジウム(I)0.110g(0.119mmol)、脱水トルエン25mL、3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−ヘプタデカフルオロ−1−デセン11.2g(25.1mmol)及びクロロジメチルシラン4.78g(50.5mmol)を収めた。150℃で17時間加熱還流し、ガスクロマトグラフィーにて反応終了を確認した。減圧下でトルエンを留去後、クーゲルロール蒸留装置を用いて減圧蒸留(蒸留温度120℃/40Pa)することにより、クロロ(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−ヘプタデカフルオロデシル)ジメチルシランを無色透明な液体として10.3g(収率75.5%,GC純度94%)得た。
GC−MS(EI,70eV)m/z(%):409(2),339(10),119(112),109(100);1H−NMR(400MHz,CDCl3):δ0.48(s,6H),1.04〜1.08(m,2H),2.10〜2.23(m,2H);13C−NMR(100MHz,CDCl3):δ0.97,8.97,25.73,106.39,109.08,111.51,111.57,114.56,116.30,118.99,121.69;29Si−NMR(79MHz,CDCl3):δ−31.3;19F−NMR(376MHz,CDCl3):δ−126.2,−123.3,−122.3,−122.7,−122.0,−121.8,−115.9,−80.9;IR(neat,cm−1):2962,2908,1442,1357,1203,1149,848,802,656.
The 200 mL two-necked flask equipped with a magnetic stirrer and a Dimroth condenser was replaced with argon, and 0.110 g (0.119 mmol) of chlorotris (triphenylphosphine) rhodium (I), 25 mL of dehydrated toluene, 3,3,4, 4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluoro-1-decene 11.2 g (25.1 mmol) and chlorodimethylsilane 4.78 g (50.5 mmol). The mixture was heated under reflux at 150 ° C. for 17 hours, and the completion of the reaction was confirmed by gas chromatography. After distilling off toluene under reduced pressure, chloro (3, 3, 4, 4, 5, 5, 6, 6, 7, 7 10.3 g (75.5%, GC purity 94%) of 7,8,8,9,9,10,10,10-heptadecafluorodecyl) dimethylsilane was obtained as a colorless transparent liquid.
GC-MS (EI, 70 eV) m / z (%): 409 (2), 339 (10), 119 (112), 109 (100); 1 H-NMR (400 MHz, CDCl 3 ): δ 0.48 ( s, 6H), 1.04 to 1.08 (m, 2H), 2.10 to 2.23 (m, 2H); 13 C-NMR (100 MHz, CDCl 3 ): δ 0.97, 8.97, 25.73, 106.39, 109.08, 111.51, 111.57, 114.56, 116.30, 118.99, 121.69; 29 Si-NMR (79 MHz, CDCl 3 ): δ-31. .3; 19 F-NMR (376 MHz, CDCl 3 ): δ-126.2, -123.3, -122.3, -122.7, -122.0, -121.8, -115.9, -80.9; IR (neat, m -1): 2962,2908,1442,1357,1203,1149,848,802,656.
(参考例4) (Reference Example 4)
磁気撹拌子、100mL滴下ロートおよびジムロートを備えた500mL三つ口フラスコをアルゴンで置換し、t−ブチルメチルエ−テル(155g,1.77mol)及び塩化ビスマス(1.87g,5.89mmol)を収め、室温で滴下ロ−トから四塩化ケイ素(99.2g,0.589mol)を2時間かけて滴下した。15時間常温で撹拌した後、ガスクロマトグラフィーにより反応が完結したことを確認した。この混合物を常圧で蒸留し(沸点112℃)、目的とするクロロトリメトキシシランを67.4g(収率73.1%)得た。
GC−MS(EI,70eV),m/z(%):141([M−CH3]+,9.4),111(12),120(100).1HNMR(400MHz,CDCl3),a(ppm):3.60(s,9H,OMe).13CNMR(100MHz,CDCl3),a(ppm):51.8.29SiNMR(79MHz,CDCl3),a(ppm):−66.6.
A 500 mL three-necked flask equipped with a magnetic stir bar, a 100 mL dropping funnel and a Dimroth was replaced with argon, and charged with t-butylmethyl ether (155 g, 1.77 mol) and bismuth chloride (1.87 g, 5.89 mmol). At room temperature, silicon tetrachloride (99.2 g, 0.589 mol) was added dropwise from the dropping funnel over 2 hours. After stirring at room temperature for 15 hours, it was confirmed by gas chromatography that the reaction was completed. The mixture was distilled under normal pressure (boiling point: 112 ° C.) to obtain 67.4 g (yield: 73.1%) of the target chlorotrimethoxysilane.
GC-MS (EI, 70eV) , m / z (%): 141 ([M-CH 3] +, 9.4), 111 (12), 120 (100). 1 H NMR (400 MHz, CDCl 3 ), a (ppm): 3.60 (s, 9H, OMe). 13 C NMR (100 MHz, CDCl 3 ), a (ppm): 51.8. 29 Si NMR (79 MHz, CDCl 3 ), a (ppm): −66.6.
(実施例1)7−(3,3,3−トリフルオロプロピル)−1,1,3,3,5,5,7,7−オクタメチルテトラシロキサン−1−オール(化合物2−A)の合成 Example 1 7- (3,3,3-trifluoropropyl) -1,1,3,3,5,5,7,7-octamethyltetrasiloxane-1-ol (Compound 2-A) Synthesis
磁気撹拌子、リービッヒ冷却管及び滴下ロートを備えた200mL三つ口フラスコをアルゴンで置換し、フラスコに1,1,3,3,5,5−ヘキサメチルトリシロキサン−1,5−ジオール5.56g(23.1mmol)及び脱水ジエチルエーテル50.0mL、トリエチルアミン2.24g(23.2mmol)を収めた。滴下ロートに脱水ジエチルエーテル50.0mL及び(3,3,3−トリフルオロプロピル)クロロジメチルシラン3.94g(20.7mmol)を収め、フラスコを0℃まで冷却し、2.5時間かけて滴下した。滴下後、25℃で1時間撹拌し、ガスクロマトグラフィー(GC)にて反応終了を確認した。反応混合物を分液ロート中水で洗浄し、有機層をロータリーエバポレーターで濃縮後、リサイクル型高速液体クロマトグラフィー(移動層:メタノール)を用いて分取することにより、目的とする7−(3,3,3−トリフルオロプロピル)−1,1,3,3,5,5,7,7−オクタメチルテトラシロキサン−1−オール(化合物2−A)を無色透明の液体として5.12g(収率62.7%,GC純度99%)得た。
GC−MS(EI,70eV)m/z(%):379(1),281(100),227(35),207(71),133(49);1H−NMR(400MHz,CDCl3):δ0.07(s,6H),0.09(s,6H),0.13(s,6H),0.14(s,6H)0.74〜0.79(m,2H),2.00〜2.13(m,2H);13C−NMR(100MHz,CDCl3):δ−0.14,0.32,1.00,1.10,9.87,28.3,128;29Si−NMR(79MHz,CDCl3):δ−20.9,−20.3,−10.6,7.09;19F−NMR(376MHz,CDCl3):δ−68.7;IR(neat,cm−1):3322,2962,2906,1446,1365,1259,1065,1028,791,685.
A 200 mL three-necked flask equipped with a magnetic stirrer, a Liebig condenser, and a dropping funnel was replaced with argon, and 1,1,3,3,5,5-hexamethyltrisiloxane-1,5-diol was added to the flask. 56 g (23.1 mmol), 50.0 mL of dehydrated diethyl ether, and 2.24 g (23.2 mmol) of triethylamine were contained. 50.0 mL of dehydrated diethyl ether and 3.94 g (20.7 mmol) of (3,3,3-trifluoropropyl) chlorodimethylsilane were placed in a dropping funnel, and the flask was cooled to 0 ° C. and dropped over 2.5 hours. did. After the dropwise addition, the mixture was stirred at 25 ° C. for 1 hour, and the completion of the reaction was confirmed by gas chromatography (GC). The reaction mixture is washed with water in a separating funnel, the organic layer is concentrated with a rotary evaporator, and then separated using a recycle-type high performance liquid chromatography (mobile layer: methanol) to obtain the desired 7- (3,3). 5.12 g (3,3-trifluoropropyl) -1,1,3,3,5,5,7,7-octamethyltetrasiloxane-1-ol (compound 2-A) as a colorless and transparent liquid was obtained. 62.7%, GC purity 99%).
GC-MS (EI, 70 eV) m / z (%): 379 (1), 281 (100), 227 (35), 207 (71), 133 (49); 1 H-NMR (400 MHz, CDCl 3 ) : Δ 0.07 (s, 6H), 0.09 (s, 6H), 0.13 (s, 6H), 0.14 (s, 6H) 0.74 to 0.79 (m, 2H), 2 .00~2.13 (m, 2H); 13 C-NMR (100MHz, CDCl 3): δ-0.14,0.32,1.00,1.10,9.87,28.3,128 29 Si-NMR (79 MHz, CDCl 3 ): δ-20.9, -20.3, -10.6, 7.09; 19 F-NMR (376 MHz, CDCl 3 ): δ-68.7; IR (neat, cm -1): 3322,2962,2906,1446,136 , 1259,1065,1028,791,685.
(実施例2)7−(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル)−1,1,3,3,5,5,7,7−オクタメチルテトラシロキサン−1−オール(化合物2−B)の合成 Example 2 7- (3,3,4,4,5,5,6,6,6-nonafluorohexyl) -1,1,3,3,5,5,7,7-octamethyltetra Synthesis of siloxane-1-ol (Compound 2-B)
磁気撹拌子、リービッヒ冷却管及び滴下ロートを備えた100mL三つ口フラスコをアルゴンで置換し、フラスコに1,1,3,3,5,5−ヘキサメチルトリシロキサン−1,5−ジオール3.89g(16.2mmol)、脱水ジエチルエーテル15.0mL、及びトリエチルアミン1.65g(16.3mmol)を収めた。滴下漏斗に脱水ジエチルエーテル15.0mL及びクロロジメチル(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル)シラン5.04g(14.8mmol)を収め、30分かけて滴下した。滴下後、25℃で1時間撹拌し、ガスクロマトグラフィー(GC)にて反応終了を確認した。反応混合物を水で洗浄し、有機層をロータリーエバポレーターで濃縮後、リサイクル型高速液体クロマトグラフィー(移動層:メタノール)を用いて分取することにより、目的とする7−(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル)−1,1,3,3,5,5,7,7ーオクタメチルテトラトリシロキサン−1−オール(化合物2−B)を無色透明の液体として4.70g(収率58.4%,GC純度82%)得た。
GC−MS(EI,70eV)m/z(%):529(2),285(100),281(85),207(40),133(9);1H−NMR(400MHz,CDCl3):δ0.07(s,6H),0.09(s,6H),0.14(s,6H),0.15(s,6H)0.76〜0.80(m,2H),2.00〜2.13(m,2H);13C−NMR(100MHz,CDCl3):δ−0.11,0.35,1.00,1.10,7.53,25.4,111.01,116.13,118.81,121.50;29Si−NMR(79MHz,CDCl3):δ−20.9,−20.3,−10.7,7.38;19F−NMR(376MHz,CDCl3):δ−126.1,−124.3,−122.3,−81.05;IR(neat,cm−1):3323,2962,2908,1442,1352,1259,1066,1032,795,702.
A 100 mL three-necked flask equipped with a magnetic stir bar, a Liebig condenser, and a dropping funnel was replaced with argon, and 1,1,3,3,5,5-hexamethyltrisiloxane-1,5-diol was added to the flask. 89 g (16.2 mmol), 15.0 mL of dehydrated diethyl ether, and 1.65 g (16.3 mmol) of triethylamine were contained. In a dropping funnel, 15.0 mL of dehydrated diethyl ether and 5.04 g (14.8 mmol) of chlorodimethyl (3,3,4,4,5,5,6,6,6-nonafluorohexyl) silane were placed, and over 30 minutes And dropped. After the dropwise addition, the mixture was stirred at 25 ° C. for 1 hour, and the completion of the reaction was confirmed by gas chromatography (GC). The reaction mixture is washed with water, the organic layer is concentrated with a rotary evaporator, and then fractionated using a recycle-type high performance liquid chromatography (mobile layer: methanol) to obtain the desired 7- (3,3,4,7). 4,5,5,6,6,6-nonafluorohexyl) -1,1,3,3,5,5,7,7-octamethyltetratrisiloxane-1-ol (compound 2-B) 4.70 g (yield 58.4%, GC purity 82%) was obtained as a transparent liquid.
GC-MS (EI, 70 eV) m / z (%): 529 (2), 285 (100), 281 (85), 207 (40), 133 (9); 1 H-NMR (400 MHz, CDCl 3 ) : Δ 0.07 (s, 6H), 0.09 (s, 6H), 0.14 (s, 6H), 0.15 (s, 6H) 0.76 to 0.80 (m, 2H), 2 0.02 to 2.13 (m, 2H); 13 C-NMR (100 MHz, CDCl 3 ): δ-0.11, 0.35, 1.00, 1.10, 7.53, 25.4, 111 .01, 116.13, 118.81, 121.50; 29 Si-NMR (79 MHz, CDCl 3 ): δ-20.9, -20.3, -10.7, 7.38; 19 F-NMR (376MHz, CDCl 3): δ -126.1, -124.3, -122.3, 81.05; IR (neat, cm -1 ): 3323,2962,2908,1442,1352,1259,1066,1032,795,702.
(実施例3)7−(3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチル)−1,1,3,3,5,5,7,7−オクタメチルテトラシロキサン−1−オール(化合物2−C)の合成 (Example 3) 7- (3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl) -1,1,3,3,5 Synthesis of 5,7,7-octamethyltetrasiloxane-1-ol (compound 2-C)
磁気撹拌子、リービッヒ冷却管及び滴下ロートを備えた50mL三つ口フラスコをアルゴンで置換し、フラスコに1,1,3,3,5,5−ヘキサメチルトリシロキサン−1,5−ジオール1.47g(6.10mmol)、脱水ジエチルエーテル5.0mL及びトリエチルアミン0.627g(6.20mmol)を収めた。滴下漏斗に脱水ジエチルエーテル5.0mL及びクロロジメチル(3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチル)シラン2.43gを収め、30分かけて滴下した。滴下後、25℃で1時間撹拌し、ガスクロマトグラフィー(GC)にて反応終了を確認した。反応混合物を水で洗浄し、有機層をロータリーエバポレーターで濃縮後、リサイクル型高速液体クロマトグラフィー(移動層:メタノール)を用いて分取することにより、目的とする7−(3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチル)−1,1,3,3,5,5,7,7−オクタメチルテトラシロキサン−1−オール(化合物2−C)を無色透明の液体として2.91g(収率81.7%,GC純度96%)得た。
GC−MS(EI,70eV)m/z(%):629(2),285(100),281(87),207(39),133(8);1H−NMR(400MHz,CDCl3):δ0.07(s,6H),0.09(s,6H),0.14(s,6H),0.15(s,6H)0.76〜0.80(m,2H),2.00〜2.13(m,2H);13C−NMR(100MHz,CDCl3):δ−0.17,0.29,0.94,1.04,7.55,25.5,108.7,111.3,114.0,116.2,118.8,121.0;29Si−NMR(79MHz,CDCl3):δ−20.8,−20.3,−10.4,7.38;19F−NMR(376MHz,CDCl3):δ−126.2,−123.3,−122.9,−122.0,−116.1,−80.87;IR(neat,cm−1):3303,2962,2908,1442,1350,1259,1066,1033,795,705.
A 50 mL three-necked flask equipped with a magnetic stir bar, a Liebig condenser, and a dropping funnel was replaced with argon, and 1,1,3,3,5,5-hexamethyltrisiloxane-1,5-diol was added to the flask. 47 g (6.10 mmol), 5.0 mL of dehydrated diethyl ether and 0.627 g (6.20 mmol) of triethylamine were contained. 5.0 mL of dehydrated diethyl ether and 2.43 g of chlorodimethyl (3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl) silane were placed in a dropping funnel. Over 30 minutes. After the dropwise addition, the mixture was stirred at 25 ° C. for 1 hour, and the completion of the reaction was confirmed by gas chromatography (GC). The reaction mixture is washed with water, the organic layer is concentrated with a rotary evaporator, and then fractionated using a recycle-type high performance liquid chromatography (mobile layer: methanol) to obtain the desired 7- (3,3,4,7). 4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl) -1,1,3,3,5,5,7,7-octamethyltetrasiloxane-1-ol 2.91 g of (Compound 2-C) was obtained as a colorless transparent liquid (yield: 81.7%, GC purity: 96%).
GC-MS (EI, 70 eV) m / z (%): 629 (2), 285 (100), 281 (87), 207 (39), 133 (8); 1 H-NMR (400 MHz, CDCl 3 ) : Δ 0.07 (s, 6H), 0.09 (s, 6H), 0.14 (s, 6H), 0.15 (s, 6H) 0.76 to 0.80 (m, 2H), 2 0.02 to 2.13 (m, 2H); 13 C-NMR (100 MHz, CDCl 3 ): δ-0.17, 0.29, 0.94, 1.04, 7.55, 25.5, 108 .7, 111.3, 114.0, 116.2, 118.8, 121.0; 29 Si-NMR (79 MHz, CDCl 3 ): δ-20.8, −20.3, −10.4, 7.38; 19 F-NMR (376MHz , CDCl 3): δ-126.2, -123.3 -122.9, -122.0, -116.1, -80.87; IR (neat, cm -1): 3303,2962,2908,1442,1350,1259,1066,1033,795,705.
(実施例4)7−(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−ヘプタデカフルオロデシル)−1,1,3,3,5,5,7,7−オクタメチルテトラシロキサン−1−オール(化合物2−D)の合成 (Example 4) 7- (3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl) -1, Synthesis of 1,3,3,5,5,7,7-octamethyltetrasiloxane-1-ol (Compound 2-D)
磁気撹拌子、リービッヒ冷却管及び滴下ロートを備えた100mL三つ口フラスコをアルゴンで置換し、フラスコに1,1,3,3,5,5−ヘキサメチルトリシロキサン−1,5−ジオール2.88g(12.0mmol)、脱水ジエチルエーテル10.0mL及びトリエチルアミン1.32g(13.0mmol)を収めた。滴下漏斗に脱水ジエチルエーテル15.0mL及びクロロジメチル(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−ヘプタデカフルオロデシル)シラン5.40g(9.99mmol)を収め、1時間かけて滴下した。滴下後、25℃で3時間撹拌し、ガスクロマトグラフィー(GC)にて反応終了を確認した。反応混合物を水で洗浄し、有機層をロータリーエバポレーターで濃縮後、リサイクル型高速液体クロマトグラフィー(移動層:メタノール)を用いて分取することにより、目的とする(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−ヘプタデカフルオロデシル)−1,1,3,3,5,5,7,7−オクタメチルトリシロキサン−1−オール(化合物2−D)を無色透明の液体として5.64g(収率72.9%,GC純度73%)得た。
EI−MS(70eV)m/z(%):729(3),285(100),281(91),207(40),133(8);1H−NMR(400MHz,CDCl3):δ0.07(s,6H),0.09(s,6H),0.14(s,6H),0.15(s,6H)0.76〜0.80(m,2H),2.00−2.14(m,2H);13C−NMR(100MHz,CDCl3):δ−1.93,−0.48,0.59,0.77,7.49,25.4,106.2,108.7,110.5,111.1,111.5,111.6,117.4,118.6;29Si−NMR(79MHz,CDCl3):δ−20.8,−20.3,−10.3,7.40;19F−NMR(376MHz,CDCl3):δ−126.1,−123.3,−122.6,−81.1;IR(neat,cm−1):3286,2962,2908,1442,1357,1234,1033,795,705.
A 100 mL three-necked flask equipped with a magnetic stir bar, a Liebig condenser, and a dropping funnel was purged with argon, and the flask was charged with 1,1,3,3,5,5-hexamethyltrisiloxane-1,5-diol. It contained 88 g (12.0 mmol), 10.0 mL of dehydrated diethyl ether and 1.32 g (13.0 mmol) of triethylamine. 15.0 mL of dehydrated diethyl ether and chlorodimethyl (3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluoro) were added to the dropping funnel. 5.40 g (9.99 mmol) of (decyl) silane was added and added dropwise over 1 hour. After the dropwise addition, the mixture was stirred at 25 ° C. for 3 hours, and the completion of the reaction was confirmed by gas chromatography (GC). The reaction mixture is washed with water, the organic layer is concentrated with a rotary evaporator, and then separated using a recycle-type high performance liquid chromatography (mobile layer: methanol) to obtain the desired compound (3,3,4,4) 5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl) -1,1,3,3,5,5,7,7-octamethyl 5.64 g (yield: 72.9%, GC purity: 73%) of trisiloxane-1-ol (compound 2-D) was obtained as a colorless and transparent liquid.
EI-MS (70 eV) m / z (%): 729 (3), 285 (100), 281 (91), 207 (40), 133 (8); 1 H-NMR (400 MHz, CDCl 3 ): δ0 0.07 (s, 6H), 0.09 (s, 6H), 0.14 (s, 6H), 0.15 (s, 6H) 0.76-0.80 (m, 2H), 2.00 -2.14 (m, 2H); 13 C-NMR (100 MHz, CDCl 3 ): δ-1.93, -0.48, 0.59, 0.77, 7.49, 25.4, 106. 2, 108.7, 110.5, 111.1, 111.5, 111.6, 117.4, 118.6; 29 Si-NMR (79 MHz, CDCl 3 ): δ-20.8, -20. 3, -10.3,7.40; 19 F-NMR (376MHz, CDCl 3): δ-12 .1, -123.3, -122.6, -81.1; IR (neat, cm -1): 3286,2962,2908,1442,1357,1234,1033,795,705.
(実施例5)9−(3,3,3−トリフルオロプロピル)−3,3,5,5,7,7,9,9−オクタメチル−1,1,1−トリメトキシペンタシロキサン(化合物1−A)の合成 Example 5 9- (3,3,3-trifluoropropyl) -3,3,5,5,7,7,9,9-octamethyl-1,1,1-trimethoxypentasiloxane (Compound 1 Synthesis of -A)
磁気撹拌子及びリービッヒ冷却管を備えた100mL二つ口フラスコをアルゴンで置換し、7−(3,3,3−トリフルオロプロピル)−1,1,3,3,5,5,7,7−オクタメチルテトラシロキサン−1−オール3.85g(9.75mmol)及び脱水ジエチルエーテル30.0mL、ピリジン2.46g(31.0mmol)を収めた。トリメトキシクロロシラン4.65g(29.7mmol)をシリンジで10分かけて加え、25℃で2時間撹拌し、ガスクロマトグラフィー(GC)にて反応終了を確認した。焼結ガラスフィルターを備えたシュレンク管でろ過後、減圧下で溶媒を留去した。クーゲルロール蒸留装置を用いて減圧蒸留(蒸留温度135℃/40Pa)することにより、目的とする9−(3,3,3−トリフルオロプロピル)−3,3,5,5,7,7,9,9−オクタメチル−1,1,1−トリメトキシペンタシロキサン(化合物1−A)を無色透明の液体として3.26g(収率65.0%,GC純度98.8%)得た。
GC−MS(EI,70eV)m/z(%):499(14),347(100),313(84),297(47),273(65),269(63),195(32);1H−NMR(400MHz,CDCl3):δ0.06(s,6H),0.09(s,6H),0.12(s,6H),0.15(s,6H),0.73−0.78(m,2H),1.99−2.12(m,2H),3.56(s,9H);13C−NMR(100MHz,CDCl3):δ−0.15,0.64,0.92,1.04,9.85,28.2,51.0,25.2,128;29Si−NMR(79MHz,CDCl3):δ−85.3,−21.3,−20.5,−19.7,6.84;19F−NMR(376MHz,CDCl3):δ−68.7;IR(neat,cm−1)2960,2908,2844,1446,1365,1259,1201,1065,1026,796,687.
The 100 mL two-necked flask equipped with a magnetic stir bar and a Liebig condenser was replaced with argon, and 7- (3,3,3-trifluoropropyl) -1,1,3,3,5,5,7,7 3.85 g (9.75 mmol) of -octamethyltetrasiloxane-1-ol, 30.0 mL of dehydrated diethyl ether, and 2.46 g (31.0 mmol) of pyridine were contained. 4.65 g (29.7 mmol) of trimethoxychlorosilane was added with a syringe over 10 minutes, the mixture was stirred at 25 ° C. for 2 hours, and the completion of the reaction was confirmed by gas chromatography (GC). After filtration through a Schlenk tube equipped with a sintered glass filter, the solvent was distilled off under reduced pressure. The desired 9- (3,3,3-trifluoropropyl) -3,3,5,5,7,7,7-distilled by distillation under reduced pressure (distillation temperature 135 ° C./40 Pa) using a Kugelrohr distillation apparatus. 3.26 g (yield: 65.0%, GC purity: 98.8%) of 9,9-octamethyl-1,1,1-trimethoxypentasiloxane (compound 1-A) was obtained as a colorless and transparent liquid.
GC-MS (EI, 70 eV) m / z (%): 499 (14), 347 (100), 313 (84), 297 (47), 273 (65), 269 (63), 195 (32); 1 H-NMR (400 MHz, CDCl 3 ): δ 0.06 (s, 6H), 0.09 (s, 6H), 0.12 (s, 6H), 0.15 (s, 6H), 0.73 −0.78 (m, 2H), 1.99-2.12 (m, 2H), 3.56 (s, 9H); 13 C-NMR (100 MHz, CDCl 3 ): δ−0.15, 0 .64, 0.92, 1.04, 9.85, 28.2, 51.0, 25.2, 128; 29 Si-NMR (79 MHz, CDCl 3 ): δ-85.3, -21.3. , -20.5, -19.7, 6.84; 19 F-NMR (376 MHz, CDCl 3 ): δ-68.7; IR (neat, cm -1 ) 2960, 2908, 2844, 1446, 1365, 1259, 1201, 1065, 1026, 796, 687.
(実施例6)9−(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル)−3,3,5,5,7,7,9,9−オクタメチル−1,1,1−トリメトキシペンタシロキサン(化合物1−B)の合成 (Example 6) 9- (3,3,4,4,5,5,6,6,6-nonafluorohexyl) -3,3,5,5,7,7,9,9-octamethyl-1 Of 1,1,1-trimethoxypentasiloxane (Compound 1-B)
磁気撹拌子及びリービッヒ冷却管を備えた50mL二つ口フラスコをアルゴンで置換し、7−(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル)1,1,3,3,5,5,7,7−オクタメチルトリシロキサン−1−オール3.68g(6.75mmol)、脱水ジエチルエーテル20.0mL及びピリジン1.54g(19.5mmol)を収めた。トリメトキシクロロシラン3.19g(20.4mmol)をシリンジで10分かけて加え、25℃で2時間撹拌し、ガスクロマトグラフィー(GC)にて反応終了を確認した。焼結ガラスフィルターを備えたシュレンク管でろ過後、減圧下で溶媒を留去した。クーゲルロール蒸留装置を用いて減圧蒸留(蒸留温度135℃/40Pa)することにより、目的とする9−(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル)−3,3,5,5,7,7,9,9−オクタメチル−1,1,1−トリメトキシペンタシロキサン(化合物1−B)を無色透明の液体として2.85g(収率63.5%,GC純度94%)得た。
GC−MS(EI,70eV)m/z(%):649(25),417(9),313(100),297(42),269(22),195(27),163(31);1H−NMR(400MHz,CDCl3):δ0.07(s,6H),0.09(s,6H),0.14(s,6H),0.15(s,6H)0.75−0.79(m,2H),1.99−2.13(m,2H);13C−NMR(100MHz,CDCl3):δ−0.10,0.68,0.94,1.06,7.58,25.4,51.1,111.1,116.1,118.9,121.6;29Si−NMR(79MHz,CDCl3):δ−85.3,−21.2,−20.4,19.63,7.16;19F−NMR(376MHz,CDCl3):δ−126.1,−124.3,−116.3,−81.06;IR(neat,cm−1)2962,2844,1442,1352,1259,1066,1029,796,702.
The 50 mL two-necked flask equipped with a magnetic stir bar and a Liebig condenser was replaced with argon, and 7- (3,3,4,4,5,5,6,6,6-nonafluorohexyl) 1,1,1 was added. 3.68 g (6.75 mmol) of 3,3,5,5,7,7-octamethyltrisiloxane-1-ol, 20.0 mL of dehydrated diethyl ether and 1.54 g (19.5 mmol) of pyridine were contained. 3.19 g (20.4 mmol) of trimethoxychlorosilane was added with a syringe over 10 minutes, the mixture was stirred at 25 ° C. for 2 hours, and completion of the reaction was confirmed by gas chromatography (GC). After filtration through a Schlenk tube equipped with a sintered glass filter, the solvent was distilled off under reduced pressure. The desired 9- (3,3,4,4,5,5,6,6,6-nonafluorohexyl)-was obtained by performing vacuum distillation (a distillation temperature of 135 ° C./40 Pa) using a Kugelrohr distillation apparatus. 2.85 g of 3,3,5,5,7,7,9,9-octamethyl-1,1,1-trimethoxypentasiloxane (compound 1-B) as a colorless and transparent liquid (yield 63.5%) , GC purity 94%).
GC-MS (EI, 70 eV) m / z (%): 649 (25), 417 (9), 313 (100), 297 (42), 269 (22), 195 (27), 163 (31); 1 H-NMR (400 MHz, CDCl 3 ): δ 0.07 (s, 6H), 0.09 (s, 6H), 0.14 (s, 6H), 0.15 (s, 6H) 0.75- 0.79 (m, 2H), 1.99-2.13 (m, 2H); 13 C-NMR (100 MHz, CDCl 3 ): δ-0.10, 0.68, 0.94, 1.06 , 7.58, 25.4, 51.1, 111.1, 116.1, 118.9, 121.6; 29 Si-NMR (79 MHz, CDCl 3 ): δ-85.3, -21.2. , -20.4, 19.63, 7.16; 19 F-NMR (376 MHz, CDCl 3 ): Δ-126.1, -124.3, -116.3, -81.06; IR (neat, cm- 1 ) 2962,2844,1442,1352,1259,1066,1029,796,702.
(実施例7)9−(3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチル)−3,3,5,5,7,7,9,9−オクタメチル−1,1,1−トリメトキシペンタシロキサン(化合物1−C)の合成 Example 7 9- (3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl) -3,3,5,5,7, Synthesis of 7,9,9-octamethyl-1,1,1-trimethoxypentasiloxane (Compound 1-C)
磁気撹拌子及びリービッヒ冷却管を備えた50mL二つ口フラスコをアルゴンで置換し、7−(3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチル)−1,1,3,3,5,5,7,7−オクタメチルトリシロキサン−1−オール2.46g(3.82mmol)、脱水ジエチルエーテル10.0mL及びピリジン0.620g(7.84mmol)を収めた。トリメトキシクロロシラン1.23g(7.85mmol)をシリンジで10分かけて加え、25℃で2時間撹拌し、ガスクロマトグラフィー(GC)にて反応終了を確認した。焼結ガラスフィルターを備えたシュレンク管でろ過後、減圧下で溶媒を留去した。クーゲルロール蒸留装置を用いて減圧蒸留(蒸留温度120℃/40Pa)することにより、目的とする9−(3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチル)−3,3,5,5,7,7,9,9−オクタメチル−1,1,1−トリメトキシペンタシロキサン(化合物1−C)を無色透明の液体として1.83g(収率61.6%,GC純度91%)得た。
GC−MS(EI,70eV)m/z(%):749(22),417(10),313(100),297(42),268(22),195(27),163(30);1H−NMR(400MHz,CDCl3):δ0.07(s,6H),0.09(s,6H),0.14(s,6H),0.15(s,6H)0.75−0.79(m,2H),1.99−2.13(m,2H);13C−NMR(100MHz,CDCl3):δ−0.11,0.64,0.90,1.03,7.54,25.4,51.06,108.9,111.4,113.5,116.0,118.7,121.4;29Si−NMR(79MHz,CDCl3):δ−85.4,−21.4,−20.5,−19.7,7.13;19F−NMR(376MHz,CDCl3):δ−126.1,−123.3,−122.9,−122.0,−116.0,−80.81;IR(neat,cm−1):2962,2844,1442,1356,1259,1068,1027,796,706.
The 50 mL two-necked flask equipped with a magnetic stir bar and a Liebig condenser was replaced with argon, and 7- (3,3,4,4,5,5,6,6,7,7,8,8,8- (Tridecafluorooctyl) -1,1,3,3,5,5,7,7-octamethyltrisiloxane-1-ol 2.46 g (3.82 mmol), dehydrated diethyl ether 10.0 mL and pyridine 0.620 g (7.84 mmol). 1.23 g (7.85 mmol) of trimethoxychlorosilane was added with a syringe over 10 minutes, the mixture was stirred at 25 ° C for 2 hours, and completion of the reaction was confirmed by gas chromatography (GC). After filtration through a Schlenk tube equipped with a sintered glass filter, the solvent was distilled off under reduced pressure. The desired 9- (3,3,4,4,5,5,6,6,7,7,8,8) was obtained by performing vacuum distillation (distillation temperature 120 ° C./40 Pa) using a Kugelrohr distillation apparatus. , 8-Tridecafluorooctyl) -3,3,5,5,7,7,9,9-octamethyl-1,1,1-trimethoxypentasiloxane (Compound 1-C) as a colorless transparent liquid 0.83 g (yield 61.6%, GC purity 91%) was obtained.
GC-MS (EI, 70 eV) m / z (%): 749 (22), 417 (10), 313 (100), 297 (42), 268 (22), 195 (27), 163 (30); 1 H-NMR (400 MHz, CDCl 3 ): δ 0.07 (s, 6H), 0.09 (s, 6H), 0.14 (s, 6H), 0.15 (s, 6H) 0.75- 0.79 (m, 2H), 1.99-2.13 (m, 2H); 13 C-NMR (100 MHz, CDCl 3 ): δ-0.11, 0.64, 0.90, 1.03 , 7.54,25.4,51.06,108.9,111.4,113.5,116.0,118.7,121.4; 29 Si-NMR ( 79MHz, CDCl 3): δ- 85.4, -21.4, -20.5, -19.7,7.13; 19 F-NM (376MHz, CDCl 3): δ -126.1, -123.3, -122.9, -122.0, -116.0, -80.81; IR (neat, cm -1): 2962,2844 , 1442, 1356, 1259, 1068, 1027, 796, 706.
(実施例8)9−(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−ヘプタデカフルオロデシル)−3,3,5,5,7,7,9,9−オクタメチル−1,1,1−トリメトキシペンタシロキサン(化合物1−D)の合成 (Example 8) 9- (3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl) -3, Synthesis of 3,5,5,7,7,9,9-octamethyl-1,1,1-trimethoxypentasiloxane (Compound 1-D)
磁気撹拌子及びリービッヒ冷却管を備えた50mL二つ口フラスコをアルゴンで置換し、(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−ヘプタデカフルオロデシル)−1,1,3,3,5,5,7,7−オクタメチルトリシロキサン−1−オール4.51g(6.05mmol)、脱水ジエチルエーテル20.0mL及びピリジン1.44g(18.2mmol)を収めた。トリメトキシクロロシラン2.90g(18.5mmol)をシリンジで10分かけて加え、25℃で2時間撹拌し、ガスクロマトグラフィー(GC)にて反応終了を確認した。焼結ガラスフィルターを備えたシュレンク管でろ過後、減圧下で溶媒を留去した。クーゲルロール蒸留装置を用いて減圧蒸留(蒸留温度145℃/40Pa)することにより、目的とする9−(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−ヘプタデカフルオロデシル)−3,3,5,5,7,7,9,9−オクタメチル−1,1,1−トリメトキシペンタシロキサン(化合物1−D)を無色透明の液体として4.09g(収率78.2%,GC純度97%)得た。
GC−MS(EI,70eV)m/z(%):417(10),371(13),313(100),297(43),269(23),195(25),163(29);1H−NMR(400MHz,CDCl3):δ0.07(s,6H),0.09(s,6H),0.14(s,6H),0.15(s,6H)0.75〜0.79(m,2H),1.99〜2.13(m,2H);13C−NMR(100MHz,CDCl3):δ−0.10,0.68,0.96,1.06,7.62,25.4,51.1,105.73,108.2,110.1,110.6,111.0,111.2,116.9,118.3;29Si−NMR(79MHz,CDCl3):δ−85.3,−21.2,−20.4,−19.6,7.17;19F−NMR(376MHz,CDCl3):δ−126.1,−123.3,−122.7,−121.9,−121.7,−116.0,−80.84;IR(neat,cm−1):2962,2846,1442,1357,1242,1034,802,702.
The 50 mL two-necked flask equipped with a magnetic stir bar and a Liebig condenser was replaced with argon, and (3,3,4,4,5,5,6,6,7,7,8,8,9,9,9, 4.5.10 g (6.05 mmol) of 10,10,10-heptadecafluorodecyl) -1,1,3,3,5,5,7,7-octamethyltrisiloxane-1-ol, dehydrated diethyl ether It contained 0 mL and 1.44 g (18.2 mmol) of pyridine. 2.90 g (18.5 mmol) of trimethoxychlorosilane was added with a syringe over 10 minutes, the mixture was stirred at 25 ° C. for 2 hours, and the completion of the reaction was confirmed by gas chromatography (GC). After filtration through a Schlenk tube equipped with a sintered glass filter, the solvent was distilled off under reduced pressure. The desired 9- (3,3,4,4,5,5,6,6,7,7,8,8) was obtained by performing vacuum distillation (distillation temperature: 145 ° C./40 Pa) using a Kugelrohr distillation apparatus. , 9,9,10,10,10-heptadecafluorodecyl) -3,3,5,5,7,7,9,9-octamethyl-1,1,1-trimethoxypentasiloxane (compound 1-D ) Was obtained as a colorless transparent liquid (4.09 g, yield 78.2%, GC purity 97%).
GC-MS (EI, 70 eV) m / z (%): 417 (10), 371 (13), 313 (100), 297 (43), 269 (23), 195 (25), 163 (29); 1 H-NMR (400 MHz, CDCl 3 ): δ 0.07 (s, 6H), 0.09 (s, 6H), 0.14 (s, 6H), 0.15 (s, 6H) 0.75 0.79 (m, 2H), 1.99 to 2.13 (m, 2H); 13 C-NMR (100 MHz, CDCl 3 ): δ-0.10, 0.68, 0.96, 1.06 , 7.62, 25.4, 51.1, 105.73, 108.2, 110.1, 110.6, 111.0, 111.2, 116.9, 118.3; 29 Si-NMR ( 79MHz, CDCl 3): δ- 85.3, -21.2, -20.4, -19.6, .17; 19 F-NMR (376MHz , CDCl 3): δ-126.1, -123.3, -122.7, -121.9, -121.7, -116.0, -80.84; IR (neat, cm- 1 ): 2962, 2846, 1442, 1357, 1242, 1034, 802, 702.
(実施例9)7−(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル)−1,3,5−トリス(3,3,3−トリフルオロプルピル)−1,3,5,7,7−ペンタメチルテトラシロキサン−1−オール(化合物2−E)の合成 Example 9 7- (3,3,4,4,5,5,6,6,6-nonafluorohexyl) -1,3,5-tris (3,3,3-trifluoropropyl) Synthesis of -1,3,5,7,7-pentamethyltetrasiloxane-1-ol (Compound 2-E)
撹拌子、ジムロート冷却管及び滴下ロートを備えた50mL三つ口フラスコをアルゴンで置換し、1,3,5−トリス(3,3,3−トリフルオロプルピル)−1,3,5−トリメチルシロキサン−1,5−ジオール2.85g、脱水ジエチルエーテル8.0mL及びトリエチルアミン0.865gを収めた。滴下漏斗に脱水ジエチルエーテル8.0mL及びクロロジメチル(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル)シラン4.21gを収めた。滴下後、室温で2時間撹拌し、ガスクロマトグラフィー(GC)で反応終了を確認した。反応混合物を水で洗浄し、ロータリーエバポレーターで溶媒を濃縮後、液体クロマトグラフィー(メタノール)を用いて7−(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル)−1,3,5−トリス(3,3,3−トリフルオロプルピル)−1,3,5,7,7−ペンタメチルテトラシロキサン−1−オール(化合物2−E)を無色透明液体として3.65g(収率55.2%)得た。
GC−MS(EI,70eV)m/z(%):293(4),237(33),233(40),215(81),159(26),137(100),109(29);1H−NMR(400MHz,CDCl3):δ0.13〜0.19(m,15H),0.76〜0.80(m,2H),2.00〜2.13(m,2H);13C−NMR(100MHz,CDCl3):δ-1.50,−0.89,−0.77,−0.22,7.45,9.00,25.2,27.96,111.01,116.13,118.81,121.50;29Si−NMR(79MHz,CDCl3):δ−22.8,−22.5,−22.2,−13.0,−12.8,9.13,9.36;19F−NMR(376MHz,CDCl3):δ−126.1,−124.3,−116.3,−81.07,−68.73;IR(neat,cm−1):3410,2964,2908,1446,1369,1263,1207,1065,898,701.
A 50 mL three-necked flask equipped with a stirrer, a Dimroth condenser, and a dropping funnel was replaced with argon, and 1,3,5-tris (3,3,3-trifluoropropyl) -1,3,5-trimethyl was replaced with argon. It contained 2.85 g of siloxane-1,5-diol, 8.0 mL of dehydrated diethyl ether and 0.865 g of triethylamine. The dropping funnel contained 8.0 mL of dehydrated diethyl ether and 4.21 g of chlorodimethyl (3,3,4,4,5,5,6,6,6-nonafluorohexyl) silane. After the dropwise addition, the mixture was stirred at room temperature for 2 hours, and the completion of the reaction was confirmed by gas chromatography (GC). After washing the reaction mixture with water and concentrating the solvent with a rotary evaporator, 7- (3,3,4,4,5,5,6,6,6-nonafluorohexyl) is used by liquid chromatography (methanol). -1,3,5-Tris (3,3,3-trifluoropropyl) -1,3,5,7,7-pentamethyltetrasiloxane-1-ol (compound 2-E) as a colorless transparent liquid 3.65 g (55.2% yield) was obtained.
GC-MS (EI, 70 eV) m / z (%): 293 (4), 237 (33), 233 (40), 215 (81), 159 (26), 137 (100), 109 (29); 1 H-NMR (400 MHz, CDCl 3 ): δ 0.13 to 0.19 (m, 15H), 0.76 to 0.80 (m, 2H), 2.00 to 2.13 (m, 2H); 13 C-NMR (100 MHz, CDCl 3 ): δ-1.50, -0.89, -0.77, -0.22, 7.45, 9.00, 25.2, 27.96, 111. 01, 116.13, 118.81, 121.50; 29 Si-NMR (79 MHz, CDCl 3 ): δ-22.8, −22.5, −22.2, −13.0, −12.8. , 9.13, 9.36; 19 F-NMR (376 MHz, CDCl 3 ): δ -126.1, -124.3, -116.3, -81.07, -68.73; IR (neat, cm- 1 ): 3410, 2964, 2908, 1446, 1369, 1263, 1207, 1065. 898, 701.
(実施例10)9−(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル)−3,5,7−トリス(3,3,3−トリフルオロプロピル)−3,5,7,9,9−ペンタメチル−1,1,1−トリメトキシペンタシロキサン(化合物1−E)の合成 (Example 10) 9- (3,3,4,4,5,5,6,6,6-nonafluorohexyl) -3,5,7-tris (3,3,3-trifluoropropyl)- Synthesis of 3,5,7,9,9-pentamethyl-1,1,1-trimethoxypentasiloxane (Compound 1-E)
磁気撹拌子及びリービッヒ冷却管を備えた50mL二つ口フラスコをアルゴンで置換し、7−(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル)−1,3,5−トリス(3,3,3−トリフルオロプルピル)−1,3,5,7,7−ペンタメチルテトラシロキサン−1−オール2.32g(2.93mmol)及び脱水ジエチルエーテル12.0mL、ピリジン1.01g(12.7mmol)を収めた。トリメトキシクロロシラン1.77g(11.3mmol)をシリンジで10分かけて加え、25℃で3時間撹拌し、ガスクロマトグラフィー(GC)にて反応終了を確認した。焼結ガラスフィルターを備えたシュレンク管でろ過後、減圧下で溶媒を留去した。クーゲルロール蒸留装置を用いて減圧蒸留(蒸留温度150℃/35Pa)することにより、目的とする9−(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル)−3,5,7−トリス(3,3,3−トリフルオロプロピル)−3,5,7,9,9−ペンタメチル−1,1,1−トリメトキシペンタシロキサン(化合物1−E)を無色透明の液体として1.45g(収率54.4%)得た。
GC−MS(EI,70eV)m/z(%):491(5),335(54),277(34),253(38),199(100),137(96),105(47);1H−NMR(400MHz,CDCl3):δ0.13〜0.19(m,15H),0.71〜0.82(m,8H),2.00〜2.13(m,8H),3.56(s,9H);13C−NMR(100MHz,CDCl3):δ−1.29,−0.98,−0.82,−0.22,7.39,9.03,25.2,27.8,51.1,126.2,128.9,131.7;29Si−NMR(79MHz,CDCl3):δ−85.6,−22.4,−21.3,9.17;19F−NMR(376MHz,CDCl3):δ−126.1,−124.4,−116.2,−81.1,−68.9;IR(neat,cm−1)2951,2848,1446,1369,1263,1207,1089,1024,837,769,702.
The 50 mL two-necked flask equipped with a magnetic stir bar and a Liebig condenser was replaced with argon, and 7- (3,3,4,4,5,5,6,6,6-nonafluorohexyl) -1,3 2.32 g (2.93 mmol) of 1,5-tris (3,3,3-trifluoropropyl) -1,3,5,7,7-pentamethyltetrasiloxane-1-ol and 12.0 mL of dehydrated diethyl ether , 1.01 g (12.7 mmol) of pyridine. 1.77 g (11.3 mmol) of trimethoxychlorosilane was added with a syringe over 10 minutes, the mixture was stirred at 25 ° C. for 3 hours, and completion of the reaction was confirmed by gas chromatography (GC). After filtration through a Schlenk tube equipped with a sintered glass filter, the solvent was distilled off under reduced pressure. The desired 9- (3,3,4,4,5,5,6,6,6-nonafluorohexyl)-was obtained by performing vacuum distillation (distillation temperature 150 ° C./35 Pa) using a Kugelrohr distillation apparatus. Colorless and transparent 3,5,7-tris (3,3,3-trifluoropropyl) -3,5,7,9,9-pentamethyl-1,1,1-trimethoxypentasiloxane (Compound 1-E) 1.45 g (yield 54.4%) was obtained as a liquid.
GC-MS (EI, 70 eV) m / z (%): 491 (5), 335 (54), 277 (34), 253 (38), 199 (100), 137 (96), 105 (47); 1 H-NMR (400 MHz, CDCl 3 ): δ 0.13 to 0.19 (m, 15H), 0.71 to 0.82 (m, 8H), 2.00 to 2.13 (m, 8H), 3.56 (s, 9H); 13 C-NMR (100 MHz, CDCl 3 ): δ-1.29, -0.98, -0.82, -0.82, -0.22, 7.39, 9.03, 25 .2,27.8,51.1,126.2,128.9,131.7; 29 Si-NMR (79 MHz, CDCl 3 ): δ-85.6, -22.4, -21.3. 9.17; 19 F-NMR (376MHz , CDCl 3): δ-126.1, -124 4, -116.2, -81.1, -68.9; IR (neat, cm -1) 2951,2848,1446,1369,1263,1207,1089,1024,837,769,702.
(実施例11)9−(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル)−3,5,7−トリス(3,3,3−トリフルオロプロピル)−3,5,7,9,9−ペンタメチル−1,1,1−トリクロロペンタシロキサン(化合物1−F)の合成 Example 11 9- (3,3,4,4,5,5,6,6,6-nonafluorohexyl) -3,5,7-tris (3,3,3-trifluoropropyl)- Synthesis of 3,5,7,9,9-pentamethyl-1,1,1-trichloropentasiloxane (Compound 1-F)
磁気撹拌子、リービッヒ冷却管及び滴下漏斗を備えた100mL三つ口フラスコをアルゴンで置換し、フラスコに脱水ジエチルエーテル10.0mL、テトラクロロシラン3.41g(20.3mmol)及びトリエチルアミン1.99g(19.7mmol)を収めた。滴下ロートに7−(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル)−1,3,5−トリス(3,3,3−トリフルオロプルピル)−1,3,5,7,7−ペンタメチルテトラシロキサン−1−オール3.17g(4.01mmol)及び脱水ジエチルエーテル10.0mLを収め、1時間かけて滴下した。滴下後、25℃で60時間撹拌し、GCーMSにて反応終了を確認した。焼結ガラスフィルターを備えたシュレンク管でろ過後、減圧下で溶媒を留去した。クーゲルロール蒸留装置を用いて減圧蒸留(蒸留温度145℃/40Pa)することにより、目的とする9−(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル)−3,5,7−トリス(3,3,3−トリフルオロプロピル)−3,5,7,9,9−ペンタメチル−1,1,1−トリクロロペンタシロキサン(化合物1−F)を無色透明の液体として0.457g(収率12.3%)得た。
GC−MS(EI,70eV)m/z(%):293(5),233(47),215(53),155(44),137(100),109(23);1H−NMR(400MHz,CDCl3):δ0.14(s,3H),0.17(s,6H),0.19(s,3H),0.31(s,3H),0.72〜0.82(m,8H),1.97〜2.14(m,8H);29Si−NMR(79MHz,CDCl3):δ−22.4,−21.7,−17.7,3.38,9.42;19F−NMR(376MHz,CDCl3):δ−126.1,−124.4,−116.3,−81.1,−68.7;IR(neat,cm−1):2960,2910,1446,1369,1263,1207,1066,1024,841,771,600.
A 100 mL three-necked flask equipped with a magnetic stir bar, a Liebig condenser, and a dropping funnel was purged with argon, and 10.0 mL of dehydrated diethyl ether, 3.41 g (20.3 mmol) of tetrachlorosilane and 1.99 g of triethylamine (19) were added to the flask. .7 mmol). Add 7- (3,3,4,4,5,5,6,6,6-nonafluorohexyl) -1,3,5-tris (3,3,3-trifluoropropyl) -1 to the dropping funnel. , 3,5,7,7-Pentamethyltetrasiloxane-1-ol 3.17 g (4.01 mmol) and dehydrated diethyl ether 10.0 mL were added and added dropwise over 1 hour. After the dropwise addition, the mixture was stirred at 25 ° C. for 60 hours, and the completion of the reaction was confirmed by GC-MS. After filtration through a Schlenk tube equipped with a sintered glass filter, the solvent was distilled off under reduced pressure. The desired 9- (3,3,4,4,5,5,6,6,6-nonafluorohexyl)-is obtained by distillation under reduced pressure (distillation temperature: 145 ° C./40 Pa) using a Kugelrohr distillation apparatus. 3,5,7-Tris (3,3,3-trifluoropropyl) -3,5,7,9,9-pentamethyl-1,1,1-trichloropentasiloxane (Compound 1-F) 0.457 g (yield 12.3%) was obtained as a liquid.
GC-MS (EI, 70 eV) m / z (%): 293 (5), 233 (47), 215 (53), 155 (44), 137 (100), 109 (23); 1 H-NMR ( 400 MHz, CDCl 3 ): δ 0.14 (s, 3H), 0.17 (s, 6H), 0.19 (s, 3H), 0.31 (s, 3H), 0.72 to 0.82 ( m, 8H), 1.97~2.14 (m , 8H); 29 Si-NMR (79MHz, CDCl 3): δ-22.4, -21.7, -17.7,3.38,9 .42; 19 F-NMR (376 MHz, CDCl 3 ): δ-126.1, -124.4, -116.3, -81.1, -68.7; IR (neat, cm −1 ): 2960 , 2910, 1446, 1369, 1263, 1207, 1066, 1024, 8 1,771,600.
(実施例12)5−(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル)−1,1,3,3,5,5−ヘキサメチルトリシロキサン−1−オール(化合物2−F)の合成 Example 12 5- (3,3,4,4,5,5,6,6,6-nonafluorohexyl) -1,1,3,3,5,5-hexamethyltrisiloxane-1- Synthesis of all (compound 2-F)
磁気撹拌子、リービッヒ冷却管及び滴下ロートを備えた50mL三つ口フラスコをアルゴンで置換し、フラスコに1,1,3,3−テトラメチルジシロキサン−2,4−ジオール1.64g(9.85mmol)、脱水ジエチルエーテル10.0mL及びトリエチルアミン0.953g(9.42mmol)を収めた。滴下漏斗に脱水ジエチルエーテル5.0mL及びクロロジメチル(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル)シラン2.51g(7.36mmol)を収め、35分かけて滴下した。滴下後、25℃で3時間撹拌し、ガスクロマトグラフィー(GC)にて反応終了を確認した。反応混合物を水で洗浄し、有機層をロータリーエバポレーターで濃縮後、クーゲルロール蒸留装置を用いて減圧蒸留(蒸留温度100℃/40Pa)することにより、目的とする5−(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル)−1,1,3,3,5,5−ヘキサメチルトリシロキサン−1−オール(化合物2−F)を無色透明の液体として2.08g(収率60.0%)得た。
GC−MS(EI,70eV)m/z(%):455(1),227(19),211(100),207(94),191(14);1H−NMR(400MHz,CDCl3):δ0.08(s,6H),0.13(s,6H),0.15(s,6H),0.76〜0.80(m,2H),2.00〜2.14(m,2H);13C−NMR(100MHz,CDCl3):δ−0.11,0.28,1.06,7.48,25.3,116,118,119,121;29Si−NMR(79MHz,CDCl3):δ−19.9,−10.8,7.37;19F−NMR(376MHz,CDCl3):δ−126,−124,−116,−81.1;IR(neat,cm−1):3305,2962,2906,1259,1218,1041,796.
A 50 mL three-necked flask equipped with a magnetic stir bar, a Liebig condenser, and a dropping funnel was purged with argon, and 1.64 g (1,9,3,3-tetramethyldisiloxane-2,4-diol) was added to the flask. 85 mmol), 10.0 mL of dehydrated diethyl ether and 0.953 g (9.42 mmol) of triethylamine. 5.0 mL of dehydrated diethyl ether and 2.51 g (7.36 mmol) of chlorodimethyl (3,3,4,4,5,5,6,6,6-nonafluorohexyl) silane were placed in a dropping funnel, and over 35 minutes And dropped. After the dropwise addition, the mixture was stirred at 25 ° C. for 3 hours, and the completion of the reaction was confirmed by gas chromatography (GC). The reaction mixture is washed with water, the organic layer is concentrated by a rotary evaporator, and then subjected to reduced pressure distillation (distillation temperature: 100 ° C./40 Pa) using a Kugelrohr distillation apparatus to obtain the desired 5- (3,3,4,4). 4,5,5,6,6,6-nonafluorohexyl) -1,1,3,3,5,5-hexamethyltrisiloxane-1-ol (compound 2-F) as a colorless and transparent liquid 2 0.08 g (yield 60.0%) was obtained.
GC-MS (EI, 70 eV) m / z (%): 455 (1), 227 (19), 211 (100), 207 (94), 191 (14); 1 H-NMR (400 MHz, CDCl 3 ) : Δ 0.08 (s, 6H), 0.13 (s, 6H), 0.15 (s, 6H), 0.76 to 0.80 (m, 2H), 2.00 to 2.14 (m , 2H); 13 C-NMR (100 MHz, CDCl 3 ): δ-0.11, 0.28, 1.06, 7.48, 25.3, 116, 118, 119, 121; 29 Si-NMR ( 79 MHz, CDCl 3 ): δ-19.9, -10.8, 7.37; 19 F-NMR (376 MHz, CDCl 3 ): δ-126, -124, -116, -81.1; IR (neat , cm -1): 3305,2962,2906,12 9,1218,1041,796.
(実施例13)5−(3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチル)−1,1,3,3,5,5−ヘキサメチルトリシロキサン−1−オール(化合物2−G)の合成 Example 13 5- (3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl) -1,1,3,3,5 Synthesis of 5-hexamethyltrisiloxane-1-ol (Compound 2-G)
磁気撹拌子、リービッヒ冷却管及び滴下ロートを備えた500mL三つ口フラスコをアルゴンで置換し、フラスコに1,1,3,3−テトラメチルジシロキサン−2,4−ジオール3.15g(18.9mmol)、脱水ジエチルエーテル130mL及びトリエチルアミン1.92g(19.0mmol)を収めた。滴下ロートに脱水ジエチルエーテル20.0mL及びクロロジメチル(3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチル)シラン7.10gを収め、25分かけて滴下した。滴下後、25℃で3時間撹拌した。反応混合物を水で洗浄し、有機層をロータリーエバポレーターで濃縮後、クーゲルロール蒸留装置を用いて減圧蒸留(蒸留温度95℃/20Pa)することにより、目的とする5−(3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチル)−1,1,3,3,5,5−ヘキサメチルトリシロキサン−1−オール(化合物2−G)を無色透明の液体として6.85g(収率74.6%)得た。
GC−MS(EI,70eV)m/z(%):555(0.4),227(23),223(35),211(100),207(99),191(16);1H−NMR(400MHz,CDCl3):δ0.08(s,6H),0.13(s,6H),0.15(s,6H),0.76〜0.80(m,2H),2.00〜2.14(m,2H);13C−NMR(100MHz,CDCl3):δ−0.11,0.27,1.05,7.47,25.1−25.6;29Si−NMR(79MHz,CDCl3):δ−19.9,−10.6,7.39;19F−NMR(376MHz,CDCl3):δ−126.1,−123.3,−122.9,−121.9,−80.8;IR(neat,cm−1):3338,2964,1442,1236,1045,796,702.
A 500 mL three-necked flask equipped with a magnetic stir bar, a Liebig condenser, and a dropping funnel was purged with argon, and 3.15 g of 1,1,3,3-tetramethyldisiloxane-2,4-diol (18. 9 mmol), 130 mL of dehydrated diethyl ether and 1.92 g (19.0 mmol) of triethylamine. 20.0 mL of dehydrated diethyl ether and 7.10 g of chlorodimethyl (3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl) silane were placed in a dropping funnel. Over 25 minutes. After the addition, the mixture was stirred at 25 ° C. for 3 hours. The reaction mixture is washed with water, the organic layer is concentrated on a rotary evaporator, and then subjected to reduced-pressure distillation (distillation temperature: 95 ° C./20 Pa) using a Kugelrohr distillation apparatus to obtain the desired 5- (3,3,4,4). 4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl) -1,1,3,3,5,5-hexamethyltrisiloxane-1-ol (compound 2- G) was obtained as a colorless transparent liquid (6.85 g, yield 74.6%).
GC-MS (EI, 70eV) m / z (%): 555 (0.4), 227 (23), 223 (35), 211 (100), 207 (99), 191 (16); 1 H- NMR (400 MHz, CDCl 3 ): δ 0.08 (s, 6H), 0.13 (s, 6H), 0.15 (s, 6H), 0.76-0.80 (m, 2H), 2. 00-2.14 (m, 2H); 13 C-NMR (100 MHz, CDCl 3 ): δ-0.11, 0.27, 1.05, 7.47, 25.1-25.6; 29 Si -NMR (79 MHz, CDCl 3 ): δ-19.9, -10.6, 7.39; 19 F-NMR (376 MHz, CDCl 3 ): δ-126.1, -123.3, -122.9. , -121.9, -80.8; IR (neat , cm -1): 3338, 964,1442,1236,1045,796,702.
(実施例14)5−(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−ヘプタデカフルオロデシル)−1,1,3,3,5,5−ヘキサメチルトリシロキサン−1−オール(化合物2−H)の合成 (Example 14) 5- (3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl) -1, Synthesis of 1,3,3,5,5-hexamethyltrisiloxane-1-ol (Compound 2-H)
磁気撹拌子、リービッヒ冷却管及び50mL滴下ロートを備えた300mL三つ口フラスコをアルゴンで置換し、フラスコに1,1,3,3-テトラメチルジシロキサン-2,4-ジオール3.30g(20.0mmol)、脱水ジエチルエーテル140mL及びトリエチルアミン1.70g(16.8mmol)を収めた。滴下漏斗に脱水ジエチルエーテル10.0mL及びクロロジメチル(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−ヘプタデカフルオロデシル)シラン7.01g(13.0mmol)を収め、氷浴で0℃まで冷却し、20分かけて滴下した。滴下後、25℃で90分撹拌した。反応混合物を水で洗浄し、有機層をロータリーエバポレーターで濃縮後、クーゲルロール蒸留装置を用いて減圧蒸留(蒸留温度110℃/20Pa)することにより、目的とする5−(3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチル)−1,1,3,3,5,5−ヘキサメチルトリシロキサン−1−オール(化合物2−H)を無色透明の液体として6.52g(収率75.0%)得た。
GC−MS(EI,70eV)m/z(%):655(0.4),227(27),223(38),211(100),207(99.5);1H−NMR(400MHz,CDCl3):δ0.08(s,6H),0.14(s,6H),0.15(s,6H),0.76〜0.80(m,2H),2.01〜2.14(m,2H);13C−NMR(100MHz,CDCl3):δ−1.10,0.26,1.04,7.48,25.5;29Si−NMR(79MHz,CDCl3):δ−19.9,−10.6,7.35;19F−NMR(376MHz,CDCl3):δ−126.1,−123.3,−122.7,−122.0,−121.7,−116.0,−80.74;IR(neat,cm−1):3286,2962,1201,1145,1043,796,795,704.
A 300 mL three-necked flask equipped with a magnetic stir bar, a Liebig condenser, and a 50 mL dropping funnel was purged with argon, and the flask was charged with 3.30 g of 1,1,3,3-tetramethyldisiloxane-2,4-diol (20 mL). 1.0 mmol), 140 mL of dehydrated diethyl ether and 1.70 g (16.8 mmol) of triethylamine. In a dropping funnel, 10.0 mL of dehydrated diethyl ether and chlorodimethyl (3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluoro) 7.01 g (13.0 mmol) of decyl) silane was placed, cooled to 0 ° C. in an ice bath, and added dropwise over 20 minutes. After the dropwise addition, the mixture was stirred at 25 ° C. for 90 minutes. The reaction mixture is washed with water, the organic layer is concentrated by a rotary evaporator, and then subjected to reduced pressure distillation (distillation temperature 110 ° C./20 Pa) using a Kugelrohr distillation apparatus to obtain the desired 5- (3,3,4,4). 4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl) -1,1,3,3,5,5-hexamethyltrisiloxane-1-ol (compound 2- 6.52 g (yield 75.0%) of H) was obtained as a colorless and transparent liquid.
GC-MS (EI, 70 eV) m / z (%): 655 (0.4), 227 (27), 223 (38), 211 (100), 207 (99.5); 1 H-NMR (400 MHz) , CDCl 3 ): δ 0.08 (s, 6H), 0.14 (s, 6H), 0.15 (s, 6H), 0.76 to 0.80 (m, 2H), 2.01 to 2 .14 (m, 2H); 13 C-NMR (100MHz, CDCl 3): δ-1.10,0.26,1.04,7.48,25.5; 29 Si-NMR (79MHz, CDCl 3 ): Δ-19.9, -10.6, 7.35; 19 F-NMR (376 MHz, CDCl 3 ): δ-126.1, -123.3, -122.7, -122.0, − 121.7, -116.0, -80.74; IR ( neat, cm -1): 3 86,2962,1201,1145,1043,796,795,704.
(実施例15)7−(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル)−3,3,5,5,7,7−ヘキサメチル−1,1,1−トリメトキシペンタシロキサン(化合物1−G)の合成 (Example 15) 7- (3,3,4,4,5,5,6,6,6-nonafluorohexyl) -3,3,5,5,7,7-hexamethyl-1,1,1 -Synthesis of trimethoxypentasiloxane (Compound 1-G)
磁気撹拌子、リービッヒ冷却管及び25mL滴下ロートを備えた50mL三つ口フラスコをアルゴンで置換し、5−(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル)−1,1,3,3,5,5−ヘキサメチルトリシロキサン−1−オール1.88g(3.99mmol)及び脱水ジエチルエーテル5.0mL、ピリジン0.469g(5.93mmol)を収めた。滴下漏斗に脱水ジエチルエーテル5.0mL及びトリメトキシクロロシラン0.981g(6.26mmol)を収め、0℃で10分かけて滴下した。25℃で3時間撹拌した。焼結ガラスフィルターを備えたシュレンク管でろ過後、減圧下で溶媒を留去した。クーゲルロール蒸留装置を用いて減圧蒸留(蒸留温度80℃/25Pa)することにより、目的とする7−(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル)−3,3,5,5,7,7−ヘキサメチル−1,1,1−トリメトキシペンタシロキサン(化合物1−G)を無色透明の液体として1.40g(収率59.4%)得た。
GC−MS(EI,70eV)m/z(%):575(21),347(60),343(100),239(60),223(39),105(39);1H−NMR(400MHz,CDCl3):δ0.08(s,6H),0.14(m,12H),0.75〜0.79(m,2H),1.99〜2.13(m,2H);13C−NMR(100MHz,CDCl3):δ−0.15,0.60,0.98,7.49,25.3,51.1;29Si−NMR(79MHz,CDCl3):δ−85.3,−20.0,19.5,7.31;19F−NMR(376MHz,CDCl3):δ−126.1,−124.3,−116.3,−81.1;IR(neat,cm−1)2962,2844,1442,1352,1261,1087,1035,829,798,746.
A 50 mL three-necked flask equipped with a magnetic stir bar, a Liebig condenser, and a 25 mL dropping funnel was purged with argon, and 5- (3,3,4,4,5,5,6,6,6-nonafluorohexyl) was added. 1.88 g (3.99 mmol) of -1,1,3,3,5,5-hexamethyltrisiloxane-1-ol, 5.0 mL of dehydrated diethyl ether, and 0.469 g (5.93 mmol) of pyridine were contained. 5.0 mL of dehydrated diethyl ether and 0.981 g (6.26 mmol) of trimethoxychlorosilane were placed in a dropping funnel and added dropwise at 0 ° C. over 10 minutes. Stirred at 25 ° C. for 3 hours. After filtration through a Schlenk tube equipped with a sintered glass filter, the solvent was distilled off under reduced pressure. The desired 7- (3,3,4,4,5,5,6,6,6-nonafluorohexyl)-was obtained by distillation under reduced pressure (distillation temperature 80 ° C./25 Pa) using a Kugelrohr distillation apparatus. 1.40 g (yield: 59.4%) of 3,3,5,5,7,7-hexamethyl-1,1,1-trimethoxypentasiloxane (compound 1-G) was obtained as a colorless and transparent liquid.
GC-MS (EI, 70 eV) m / z (%): 575 (21), 347 (60), 343 (100), 239 (60), 223 (39), 105 (39); 1 H-NMR ( 400MHz, CDCl 3): δ0.08 ( s, 6H), 0.14 (m, 12H), 0.75~0.79 (m, 2H), 1.99~2.13 (m, 2H); 13 C-NMR (100 MHz, CDCl 3 ): δ-0.15, 0.60, 0.98, 7.49, 25.3, 51.1; 29 Si-NMR (79 MHz, CDCl 3 ): δ- 85.3, -20.0, 19.5, 7.31; 19 F-NMR (376 MHz, CDCl 3 ): δ-126.1, -124.3, -116.3, -81.1; IR (neat, cm -1) 2962,2844,1442,1352 1261,1087,1035,829,798,746.
(実施例16)7−(3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチル)−3,3,5,5,7,7−ヘキサメチル−1,1,1−トリメトキシペンタシロキサン(化合物1−H)の合成 (Example 16) 7- (3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl) -3,3,5,5,7, Synthesis of 7-hexamethyl-1,1,1-trimethoxypentasiloxane (Compound 1-H)
磁気撹拌子、リービッヒ冷却管及び50mL滴下ロートを備えた100mL三つ口フラスコをアルゴンで置換し、5−(3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチル)−1,1,3,3,5,5−ヘキサメチルトリシロキサン−1−オール1.92g(3.37mmol)、脱水ジエチルエーテル30.0mL及びピリジン0.48g(6.12mmol)を収めた。滴下漏斗に脱水ジエチルエーテル10.0mL、トリメトキシクロロシラン1.67g(10.6mmol)を収め、5分かけて滴下した。25℃で2時間撹拌した。焼結ガラスフィルターを備えたシュレンク管でろ過後、減圧下で溶媒を留去した。クーゲルロール蒸留装置を用いて減圧蒸留(蒸留温度120℃/45Pa)することにより、目的とする7−(3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチル)−3,3,5,5,7,7−ヘキサメチル−1,1,1−トリメトキシペンタシロキサン(化合物1−H)を無色透明の液体として1.56g(収率75.2%)得た。
GC−MS(EI,70eV)m/z(%):675(17),347(66),343(100),273(29),268(24),239(58),223(37),105(32);1H−NMR(400MHz,CDCl3):δ0.08(s,6H),0.14(s,12H),0.75〜0.80(m,2H),1.99〜2.13(m,2H)3.56(s,12H);13C−NMR(100MHz,CDCl3):δ−0.16,0.57,0.96,7.43,25.3,51.0;29Si−NMR(79MHz,CDCl3):δ−85.4,−20.1,−19.6,7.30;19F−NMR(376MHz,CDCl3):δ−126.1,−123.4,−122.9,−122.0,−116.1,−80.8;IR(neat,cm−1):2962,2846,1442,1362,1238,1194,1088,1036,827,798,706.
A 100 mL three-necked flask equipped with a magnetic stir bar, a Liebig condenser, and a 50 mL dropping funnel was replaced with argon, and 5- (3,3,4,4,5,5,6,6,7,7,8, 8,8-tridecafluorooctyl) -1,1,3,3,5,5-hexamethyltrisiloxane-1-ol 1.92 g (3.37 mmol), dehydrated diethyl ether 30.0 mL and pyridine 0.48 g (6.12 mmol). 10.0 mL of dehydrated diethyl ether and 1.67 g (10.6 mmol) of trimethoxychlorosilane were placed in a dropping funnel, and dropped over 5 minutes. Stirred at 25 ° C. for 2 hours. After filtration through a Schlenk tube equipped with a sintered glass filter, the solvent was distilled off under reduced pressure. The desired 7- (3,3,4,4,5,5,6,6,7,7,8,8) was obtained by distillation under reduced pressure (distillation temperature 120 ° C./45 Pa) using a Kugelrohr distillation apparatus. , 8-Tridecafluorooctyl) -3,3,5,5,7,7-hexamethyl-1,1,1-trimethoxypentasiloxane (Compound 1-H) as a colorless transparent liquid (1.56 g, yield 75.2%).
GC-MS (EI, 70 eV) m / z (%): 675 (17), 347 (66), 343 (100), 273 (29), 268 (24), 239 (58), 223 (37), 105 (32); 1 H-NMR (400 MHz, CDCl 3 ): δ 0.08 (s, 6H), 0.14 (s, 12H), 0.75 to 0.80 (m, 2H), 1.99. 2.12.13 (m, 2H) 3.56 (s, 12H); 13 C-NMR (100 MHz, CDCl 3 ): δ-0.16, 0.57, 0.96, 7.43, 25.3. , 51.0; 29 Si-NMR (79 MHz, CDCl 3 ): δ-85.4, -20.1, -19.6, 7.30; 19 F-NMR (376 MHz, CDCl 3 ): δ-126 .1, -123.4, -122.9, -122.0, -116 1, -80.8; IR (neat, cm -1): 2962,2846,1442,1362,1238,1194,1088,1036,827,798,706.
(実施例17)7−(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−ヘプタデカフルオロデシル)−3,3,5,5,7,7−ヘキサメチル−1,1,1−トリメトキシペンタシロキサン(化合物1−I)の合成 (Example 17) 7- (3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl) -3, Synthesis of 3,5,5,7,7-hexamethyl-1,1,1-trimethoxypentasiloxane (Compound 1-I)
磁気撹拌子、リービッヒ冷却管及び25mL滴下ロートを備えた100mL三つ口フラスコをアルゴンで置換し、5−(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−ヘプタデカフルオロデシル)−1,1,3,3,5,5−ヘキサメチルトリシロキサン−1−オール2.21g(3.29mmol)及び脱水ジエチルエーテル25.0mL、ピリジン0.323g(4.08mmol)を収めた。滴下漏斗に脱水ジエチルエーテル15.0mL、トリメトキシクロロシラン0.787g(5.24mmol)を収め、20分かけて滴下した後25℃で3時間撹拌した。焼結ガラスフィルターを備えたシュレンク管でろ過後、減圧下で溶媒を留去した。クーゲルロール蒸留装置を用いて減圧蒸留(蒸留温度110℃/40Pa)することにより、目的とする7−(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−ヘプタデカフルオロデシル)−3,3,5,5,7,7−ヘキサメチル−1,1,1−トリメトキシペンタシロキサン(化合物1−I)を無色透明の液体として1.87g(収率71.9%)得た。
GC−MS(EI,70eV)m/z(%):775(9),347(60),343(100),273(27),239(43),223(26),105(24);1H−NMR(400MHz,CDCl3):δ0.08(s,6H),0.14(s,12H),0.15(s,6H)0.75〜0.80(m,2H),1.99〜2.13(m,2H);13C−NMR(100MHz,CDCl3):δ−0.16,0.58,0.96,7.47,25.4,51.0;29Si−NMR(79MHz,CDCl3):δ−85.4,−20.1,−19.6,7.30;19F−NMR(376MHz,CDCl3):δ−126.1,−123.3,−122.7,−122.0,−121.8,−116.1,−80.76;IR(neat,cm−1):2962,2846,1201,1090,1035,1034,829,798,704.
A 100 mL three-necked flask equipped with a magnetic stir bar, a Liebig condenser, and a 25 mL dropping funnel was purged with argon, and 5- (3,3,4,4,5,5,6,6,7,7,8, 8,9,9,10,10,10-heptadecafluorodecyl) -1,1,3,3,5,5-hexamethyltrisiloxane-1-ol 2.21 g (3.29 mmol) and dehydrated diethyl ether 25.0 mL and 0.323 g (4.08 mmol) of pyridine were contained. 15.0 mL of dehydrated diethyl ether and 0.787 g (5.24 mmol) of trimethoxychlorosilane were placed in a dropping funnel, added dropwise over 20 minutes, and then stirred at 25 ° C for 3 hours. After filtration through a Schlenk tube equipped with a sintered glass filter, the solvent was distilled off under reduced pressure. The desired 7- (3,3,4,4,5,5,6,6,7,7,8,8) was obtained by distillation under reduced pressure (distillation temperature 110 ° C./40 Pa) using a Kugelrohr distillation apparatus. , 9,9,10,10,10-heptadecafluorodecyl) -3,3,5,5,7,7-hexamethyl-1,1,1-trimethoxypentasiloxane (compound 1-I) 1.87 g (yield 71.9%) was obtained as a liquid.
GC-MS (EI, 70 eV) m / z (%): 775 (9), 347 (60), 343 (100), 273 (27), 239 (43), 223 (26), 105 (24); 1 H-NMR (400 MHz, CDCl 3 ): δ 0.08 (s, 6H), 0.14 (s, 12H), 0.15 (s, 6H) 0.75 to 0.80 (m, 2H), 1.99 to 2.13 (m, 2H); 13 C-NMR (100 MHz, CDCl 3 ): δ-0.16, 0.58, 0.96, 7.47, 25.4, 51.0; 29 Si-NMR (79 MHz, CDCl 3 ): δ-85.4, -20.1, -19.6, 7.30; 19 F-NMR (376 MHz, CDCl 3 ): δ-126.1, -123 .3, -122.7, -122.0, -121.8, -116.1, 80.76; IR (neat, cm -1 ): 2962,2846,1201,1090,1035,1034,829,798,704.
(実施例18)化合物1−Aのガラス基材への表面処理
化合物1−Aの0.3重量%クロロホルム溶液を調整し、この溶液に50℃でソーダガラス基材をディップコートで成膜を行った。改質面5ヶ所で水及びヘキサデカン(液滴量1μL)の接触角をθ/2法により求め、平均を求めたところ、水に対する接触角は65.5°、ヘキサデカンに対する接触角は18.9°という値を得た。
Example 18 Surface Treatment of Compound 1-A on Glass Substrate A 0.3 wt% chloroform solution of compound 1-A was prepared, and a soda glass substrate was formed by dip coating on this solution at 50 ° C. went. The contact angles of water and hexadecane (droplet volume: 1 μL) were determined at five locations on the modified surface by the θ / 2 method, and the average was determined. The contact angle with water was 65.5 ° and the contact angle with hexadecane was 18.9. ° was obtained.
(実施例19)化合物1−Bのガラス基材への表面処理
化合物1−Bの0.3重量%クロロホルム溶液を調整し、この溶液に50℃でソーダガラス基材をディップコートで成膜を行った。改質面5ヶ所で水及びヘキサデカン(液滴量1μL)の接触角をθ/2法により求め、平均を求めたところ、水に対する接触角は75.1°、ヘキサデカンに対する接触角は26.1°という値を得た。
Example 19 Surface Treatment of Compound 1-B on Glass Substrate A 0.3 wt% chloroform solution of compound 1-B was prepared, and a soda glass substrate was formed by dip coating on this solution at 50 ° C. went. The contact angles of water and hexadecane (droplet volume: 1 μL) were determined at five places on the modified surface by the θ / 2 method, and the average was determined. The contact angle with water was 75.1 °, and the contact angle with hexadecane was 26.1. ° was obtained.
(実施例20)化合物1−Cのガラス基材への表面処理
化合物1−Cの0.3重量%クロロホルム溶液を調整し、この溶液に50℃でソーダガラス基材をディップコートで成膜を行った。改質面5ヶ所で水及びヘキサデカン(液滴量1μL)の接触角をθ/2法により求め、平均を求めたところ、水に対する接触角は49.8°、ヘキサデカンに対する接触角は22.1°という値を得た。
Example 20 Surface Treatment of Compound 1-C on Glass Substrate A 0.3 wt% chloroform solution of compound 1-C was prepared, and a soda glass substrate was formed on this solution at 50 ° C. by dip coating. went. The contact angles of water and hexadecane (droplet volume: 1 μL) were determined by the θ / 2 method at the five modified surfaces, and the average was determined. The contact angle with water was 49.8 ° and the contact angle with hexadecane was 22.1. ° was obtained.
(実施例21)化合物1−Dのガラス基材への表面処理
化合物1−Dの0.3重量%クロロホルム溶液を調整し、この溶液に50℃でソーダガラス基材をディップコートで成膜を行った。改質面5ヶ所で水及びヘキサデカン(液滴量1μL)の接触角をθ/2法により求め、平均を求めたところ、水に対する接触角は64.6°、ヘキサデカンに対する接触角は17.8°という値を得た。
Example 21 Surface Treatment of Compound 1-D on Glass Substrate A 0.3 wt% chloroform solution of compound 1-D was prepared, and a soda glass substrate was formed on this solution by dip coating at 50 ° C. went. The contact angle of water and hexadecane (droplet volume: 1 μL) was determined by the θ / 2 method at five places on the modified surface, and the average was determined. The contact angle with water was 64.6 °, and the contact angle with hexadecane was 17.8. ° was obtained.
(実施例22)化合物1−Eのガラス基材への表面処理
化合物1−Eの0.3重量%クロロホルム溶液を調整し、この溶液に50℃でソーダガラス基材をディップコートで成膜を行った。改質面5ヶ所で水及びヘキサデカン(液滴量1μL)の接触角kをθ/2法により求め、平均を求めたところ、水に対する接触角は73.8°、ヘキサデカンに対する接触角は24.7°という値を得た。
Example 22 Surface Treatment of Compound 1-E on Glass Substrate A 0.3 wt% chloroform solution of compound 1-E was prepared, and a soda glass substrate was formed on this solution by dip coating at 50 ° C. went. The contact angle k of water and hexadecane (droplet volume 1 μL) was determined by the θ / 2 method at five places on the modified surface, and the average was determined. The contact angle with water was 73.8 °, and the contact angle with hexadecane was 24. A value of 7 ° was obtained.
(実施例23)化合物1−Fのガラス基材への表面処理
化合物1−Fの0.3重量%クロロホルム溶液を調整し、この溶液に50℃でソーダガラス基材をディップコートで成膜を行った。改質面5ヶ所で水及びヘキサデカン(液滴量1μL)の接触角kをθ/2法により求め、平均を求めたところ、水に対する接触角は92.2°、ヘキサデカンに対する接触角は44.0°という値を得た。
(Example 23) Surface treatment of compound 1-F on glass substrate A 0.3 wt% chloroform solution of compound 1-F was prepared, and a soda glass substrate was formed by dip coating on this solution at 50 ° C. went. The contact angle k of water and hexadecane (droplet amount: 1 μL) was determined at the five modified surfaces by the θ / 2 method, and the average was determined. The contact angle with water was 92.2 ° and the contact angle with hexadecane was 44. A value of 0 ° was obtained.
(実施例24)化合物2−Aのガラス基材への表面処理
化合物2−Aの0.3重量%クロロホルム溶液を調整し、この溶液に50℃でソーダガラス基材をディップコートで成膜を行った。改質面5ヶ所で水及びヘキサデカン(液滴量1μL)の接触角kをθ/2法により求め、平均を求めたところ、水に対する接触角は54.8°、ヘキサデカンに対する接触角は15.4°という値を得た。
Example 24 Surface Treatment of Compound 2-A on Glass Substrate A 0.3 wt% chloroform solution of compound 2-A was prepared, and a soda glass substrate was formed on this solution by dip coating at 50 ° C. went. The contact angle k between water and hexadecane (droplet volume: 1 μL) was determined by the θ / 2 method at five places on the modified surface, and the average was determined. The contact angle with water was 54.8 ° and the contact angle with hexadecane was 15. A value of 4 ° was obtained.
(実施例25)化合物2−Bのガラス基材への表面処理
化合物2−Bの0.3重量%クロロホルム溶液を調整し、この溶液に50℃でソーダガラス基材をディップコートで成膜を行った。改質面5ヶ所で水及びヘキサデカン(液滴量1μL)の接触角kをθ/2法により求め、平均を求めたところ、水に対する接触角は63.4°、ヘキサデカンに対する接触角は20.5°という値を得た。
(Example 25) Surface treatment of glass substrate with compound 2-B A 0.3% by weight chloroform solution of compound 2-B was prepared, and a soda glass substrate was formed by dip coating on this solution at 50 ° C. went. The contact angle k of water and hexadecane (droplet amount: 1 μL) was determined by the θ / 2 method at five places on the modified surface, and the average was determined. The contact angle with water was 63.4 ° and the contact angle with hexadecane was 20. A value of 5 ° was obtained.
(実施例26)化合物2−Cのガラス基材への表面処理
化合物2−Cの0.3重量%クロロホルム溶液を調整し、この溶液に50℃でソーダガラス基材をディップコートで成膜を行った。改質面5ヶ所で水及びヘキサデカン(液滴量1μL)の接触角kをθ/2法により求め、平均を求めたところ、水に対する接触角は53.8°、ヘキサデカンに対する接触角は16.7°という値を得た。
Example 26 Surface Treatment of Compound 2-C on Glass Substrate A 0.3 wt% chloroform solution of compound 2-C was prepared, and a soda glass substrate was formed on this solution by dip coating at 50 ° C. went. The contact angle k of water and hexadecane (droplet volume: 1 μL) was determined by the θ / 2 method at five places on the modified surface, and the average was determined. The contact angle with water was 53.8 ° and the contact angle with hexadecane was 16. A value of 7 ° was obtained.
(実施例27)化合物2−Dのガラス基材への表面処理
化合物2−Dの0.3重量%クロロホルム溶液を調整し、この溶液に50℃でソーダガラス基材をディップコートで成膜を行った。改質面5ヶ所で水及びヘキサデカン(液滴量1μL)の接触角kをθ/2法により求め、平均を求めたところ、水に対する接触角は58.2°、ヘキサデカンに対する接触角は20.8°という値を得た。
Example 27 Surface Treatment of Compound 2-D on Glass Substrate A 0.3 wt% chloroform solution of compound 2-D was prepared, and a soda glass substrate was formed by dip coating on this solution at 50 ° C. went. The contact angle k of water and hexadecane (droplet amount: 1 μL) was determined at the five modified surfaces by the θ / 2 method, and the average was determined. The contact angle with water was 58.2 ° and the contact angle with hexadecane was 20. A value of 8 ° was obtained.
(実施例27)化合物2−Eのガラス基材への表面処理
化合物2−Eの0.3重量%クロロホルム溶液を調整し、この溶液に50℃でソーダガラス基材をディップコートで成膜を行った。改質面5ヶ所で水及びヘキサデカン(液滴量1μL)の接触角kをθ/2法により求め、平均を求めたところ、水に対する接触角は47.6°、ヘキサデカンに対する接触角は16.3°という値を得た。
(Example 27) Surface treatment of compound 2-E on glass substrate A 0.3% by weight chloroform solution of compound 2-E was prepared, and a soda glass substrate was formed by dip coating on this solution at 50 ° C. went. The contact angle k between water and hexadecane (droplet volume: 1 μL) was determined by the θ / 2 method at five places on the modified surface, and the average was determined. The contact angle with water was 47.6 °, and the contact angle with hexadecane was 16. A value of 3 ° was obtained.
(実施例28)化合物1−Gのガラス基材への表面処理
化合物1−Gの0.3重量%クロロホルム溶液を調整し、この溶液に50℃でソーダガラス基材をディップコートで成膜を行った。改質面5ヶ所で水及びヘキサデカン(液滴量1μL)の接触角kをθ/2法により求め、平均を求めたところ、水に対する接触角は66.5°、ヘキサデカンに対する接触角は34.1°という値を得た。
Example 28 Surface Treatment of Compound 1-G on Glass Substrate A 0.3 wt% chloroform solution of compound 1-G was prepared, and a soda glass substrate was formed by dip coating on this solution at 50 ° C. went. The contact angle k of water and hexadecane (droplet amount: 1 μL) was determined at the five modified surfaces by the θ / 2 method, and the average was determined. The contact angle with water was 66.5 °, and the contact angle with hexadecane was 34. A value of 1 ° was obtained.
(実施例29)化合物1−Hのガラス基材への表面処理
化合物1−Hの0.3重量%クロロホルム溶液を調整し、この溶液に50℃でソーダガラス基材をディップコートで成膜を行った。改質面5ヶ所で水及びヘキサデカン(液滴量1μL)の接触角kをθ/2法により求め、平均を求めたところ、水に対する接触角は91.6°、ヘキサデカンに対する接触角は37.1°という値を得た。
Example 29 Surface Treatment of Compound 1-H on Glass Substrate A 0.3 wt% chloroform solution of compound 1-H was prepared, and a soda glass substrate was formed on this solution by dip coating at 50 ° C. went. The contact angle k of water and hexadecane (drop volume: 1 μL) was determined by the θ / 2 method at five places on the modified surface, and the average was determined. As a result, the contact angle with water was 91.6 ° and the contact angle with hexadecane was 37. A value of 1 ° was obtained.
(比較例1)1,1,1−トリメトキシ−7−フェニル−1,1,3,3,5,5,7,7−オクタメチルペンタシロキサンのガラス基材への表面処理
1,1,1−トリメトキシ−7−フェニル−1,1,3,3,5,5,7,7−オクタメチルペンタシロキサンの0.3重量%クロロホルム溶液を調整し、この溶液に50℃でソーダガラス基材をディップコートで成膜を行った。改質面5ヶ所で水及びヘキサデカン(液滴量1μL)の接触角kをθ/2法により求め、平均を求めたところ、水に対する接触角は63.7°、ヘキサデカンに対する接触角は10.0°という値を得た。
(Comparative Example 1) Surface treatment of glass substrate with 1,1,1-trimethoxy-7-phenyl-1,1,3,3,5,5,7,7-octamethylpentasiloxane 1,1,1 A 0.3 wt% chloroform solution of trimethoxy-7-phenyl-1,1,3,3,5,5,7,7-octamethylpentasiloxane was prepared, and a soda glass substrate was added to this solution at 50 ° C. Film formation was performed by dip coating. The contact angle k between water and hexadecane (droplet volume: 1 μL) was determined at the five modified surfaces by the θ / 2 method, and the average was determined. The contact angle with water was 63.7 °, and the contact angle with hexadecane was 10. A value of 0 ° was obtained.
本発明により製造された含フッ素シロキサン化合物を利用することにより、撥水撥油性を表面に付与したガラス基材を提供することができる。また、含フッ素シランカップリング剤として、基材表面を改質し、基材の接着及び分散剤として利用することができる。
By using the fluorine-containing siloxane compound produced according to the present invention, a glass substrate having water / oil repellency on the surface can be provided. Further, as a fluorine-containing silane coupling agent, the surface of a substrate can be modified and used as an adhesive and dispersant for the substrate.
Claims (3)
(式中、R1は炭素数2〜8のフルオロアルキル基を表す。R2、R3、R4及びR5は、各々独立に、フッ素原子で置換されていてもよい炭素数1〜8のアルキル基を表す。nは2又は3を表す。Zは一般式(2)
(式中、R6、R7及びR8は、各々独立に、炭素数1〜2のアルキル基、ハロゲン原子又は炭素数1〜3のアルコキシ基を表し、R6、R7又はR8の少なくとも2つはハロゲン原子又は炭素数1〜 3のアルコキシ基である。)で表される置換シリル基を表す。)で表される含フッ素シロキサン化合物。 General formula (1)
(Wherein, R 1 represents a fluoroalkyl group having 2 to 8 carbon atoms. R 2 , R 3 , R 4 and R 5 each independently represent a C 1 to C 8 optionally substituted with a fluorine atom. And n represents 2 or 3. Z represents the general formula (2)
(Wherein, R 6 , R 7 and R 8 each independently represent an alkyl group having 1 to 2 carbon atoms, a halogen atom or an alkoxy group having 1 to 3 carbon atoms, and R 6 , R 7 or R 8 represents At least two of them are a halogen atom or an alkoxy group having 1 to 3 carbon atoms.). A) a fluorine-containing siloxane compound represented by the formula:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016026044A JP6664984B2 (en) | 2016-02-15 | 2016-02-15 | Fluorine-containing siloxane compound, method for producing the same, coating agent containing the same, and surface treatment method for glass substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016026044A JP6664984B2 (en) | 2016-02-15 | 2016-02-15 | Fluorine-containing siloxane compound, method for producing the same, coating agent containing the same, and surface treatment method for glass substrate |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2017145199A JP2017145199A (en) | 2017-08-24 |
JP6664984B2 true JP6664984B2 (en) | 2020-03-13 |
Family
ID=59681931
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016026044A Active JP6664984B2 (en) | 2016-02-15 | 2016-02-15 | Fluorine-containing siloxane compound, method for producing the same, coating agent containing the same, and surface treatment method for glass substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP6664984B2 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3539887B1 (en) * | 2018-03-16 | 2021-05-26 | Schott AG | Hollow body, in particular for packaging a pharmaceutical composition, having a layer of glass and a surface region with a contact angle for wetting with water |
JP6947109B2 (en) | 2018-04-03 | 2021-10-13 | 株式会社デンソー | Manufacturing method of sensors and structures |
WO2023181867A1 (en) * | 2022-03-24 | 2023-09-28 | Agc株式会社 | Compound, composition, surface treatment agent, article manufacturing method, and article |
-
2016
- 2016-02-15 JP JP2016026044A patent/JP6664984B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
JP2017145199A (en) | 2017-08-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP7298664B2 (en) | Fluorine-containing ether compound, fluorine-containing ether composition, coating liquid and article | |
JP6127985B2 (en) | Fluorinated ether compound, fluorinated ether composition and coating liquid, and substrate having surface treatment layer and method for producing the same | |
JP6127987B2 (en) | Fluorinated ether compound, fluorinated ether composition and coating liquid, and substrate having surface treatment layer and method for producing the same | |
JP6127986B2 (en) | Fluorinated ether compound, fluorinated ether composition and coating liquid, and substrate having surface treatment layer and method for producing the same | |
JP7063335B2 (en) | Fluorine-containing ether compound, fluorine-containing ether composition, coating liquid, article and its manufacturing method | |
CN111051383B (en) | Fluorine-containing ether compound, composition, and article | |
JP6959864B2 (en) | Fluorine compound | |
JP7156276B2 (en) | Fluorine-containing ether compound, fluorine-containing ether composition, coating liquid, article, and method for producing the same | |
JP6107659B2 (en) | Fluorine-containing ether compound, coating liquid, and method for producing substrate having surface treatment layer | |
US9611399B2 (en) | Fluorinated coatings with lubricious additive | |
TW201443100A (en) | Fluorine-containing ether compound, fluorine-containing ether composition, and coating solution, as well as substrate having surface layer, and method for manufacturing same | |
JP6664984B2 (en) | Fluorine-containing siloxane compound, method for producing the same, coating agent containing the same, and surface treatment method for glass substrate | |
JP7001097B2 (en) | Fluorine-containing ether compound, fluorine-containing ether composition, coating liquid, article and its manufacturing method | |
CN114867730A (en) | Fluorine-containing ether compound, surface treatment agent, fluorine-containing ether composition, coating liquid, article, and method for producing article | |
JP5952750B2 (en) | Novel fluorine-containing alkoxysilane compound having a pentaerythritol skeleton, surface modifier using the same, and intermediates thereof | |
JP2017137509A (en) | Method for producing fluorine-containing ether compound | |
WO2021054413A1 (en) | Fluorine-containing ether compound, surface treatment agent, fluorine-containing ether composition, coating liquid, article, and compound | |
JP2006022079A (en) | New fluoroalkyl group-containing acetylene alcohol and method for producing the same | |
WO2021182166A1 (en) | Fluorine-containing ether compound and production method therefor, compound and production method therefor, fluorine-containing ether composition, coating liquid, and article and production methods therefor | |
WO2022059623A1 (en) | Composition, substrate with surface layer, method for producing substrate with surface layer, compound, and method for producing compound |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20160226 |
|
A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A712 Effective date: 20180111 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20190110 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20191003 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20191105 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20191225 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20200218 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20200219 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6664984 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |