JP6588309B2 - Gas governor - Google Patents

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JP6588309B2
JP6588309B2 JP2015220359A JP2015220359A JP6588309B2 JP 6588309 B2 JP6588309 B2 JP 6588309B2 JP 2015220359 A JP2015220359 A JP 2015220359A JP 2015220359 A JP2015220359 A JP 2015220359A JP 6588309 B2 JP6588309 B2 JP 6588309B2
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pressure chamber
valve
gas
governor
secondary pressure
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祥充 梅津
祥充 梅津
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Rinnai Corp
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  • Feeding And Controlling Fuel (AREA)
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Description

本発明は、バーナに対するガス供給路等に介設するガスガバナに関する。   The present invention relates to a gas governor interposed in a gas supply path or the like for a burner.

従来、この種のガスガバナとして、一次圧室と、一次圧室の上方の二次圧室と、一次圧室と二次圧室との間の弁座とを有するケーシングと、一次圧室の下面を覆うダイヤフラムと、弁座に形成した弁孔に挿通され、上方に向けて外径を次第に大きくした弁体部を有するガバナバルブとを備え、弁体部からのびるガバナバルブの軸部をダイヤフラムに連結し、一次圧室内のガス圧変動に応じダイヤフラムを介してガバナバルブを変位させて、二次圧室内のガス圧変動を抑制するようにしたものが知られている(例えば、特許文献1参照)。   Conventionally, as this type of gas governor, a casing having a primary pressure chamber, a secondary pressure chamber above the primary pressure chamber, a valve seat between the primary pressure chamber and the secondary pressure chamber, and a lower surface of the primary pressure chamber And a governor valve having a valve body portion that is inserted through a valve hole formed in the valve seat and has an outer diameter gradually increasing upward, and the shaft portion of the governor valve extending from the valve body portion is connected to the diaphragm. In addition, there is known a system in which the governor valve is displaced through a diaphragm in accordance with the gas pressure fluctuation in the primary pressure chamber to suppress the gas pressure fluctuation in the secondary pressure chamber (for example, see Patent Document 1).

ところで、ガス供給路の上流部にはフィルタを介設するが、フィルタを通過した異物がガスガバナを介して下流側に流れた場合、ノズルの詰りを生じたり、下流側の電磁弁の弁体に異物が付着して弁洩れを生じたりすることがある。そのため、ガスに混入した異物の少なくとも一部をガスガバナで捕集可能とすることが望まれるが、このようなガスガバナは未だ開発されていない。   By the way, a filter is installed in the upstream part of the gas supply path, but when foreign matter that has passed through the filter flows downstream through the gas governor, the nozzle is clogged, or the valve body of the downstream solenoid valve Foreign matter may adhere and cause valve leakage. Therefore, it is desired that at least a part of the foreign matter mixed in the gas can be collected by the gas governor, but such a gas governor has not been developed yet.

特開2013−249874号公報JP 2013-249874 A

本発明は、以上の点に鑑み、ガスに混入した異物の少なくとも一部を捕集可能としたガスガバナを提供することをその課題としている。   This invention makes it the subject to provide the gas governor which enabled the collection of at least one part of the foreign material mixed in gas in view of the above point.

上記課題を解決するために、本発明は、一次圧室と、一次圧室の上方の二次圧室と、一次圧室と二次圧室との間の弁座とを有するケーシングと、一次圧室の下面を覆うダイヤフラムと、弁座に形成した弁孔に挿通され、上方に向けて外径を次第に大きくした弁体部を有するガバナバルブとを備え、弁体部からのびるガバナバルブの軸部をダイヤフラムに連結し、一次圧室内のガス圧変動に応じダイヤフラムを介してガバナバルブを変位させて、二次圧室内のガス圧変動を抑制するようにしたガスガバナにおいて、弁座及び弁孔が二次圧室の出口側に偏った位置に存し、二次圧室は、弁座の直上空間から二次圧室の出口と反対方向に広がる拡張空間と、拡張空間の下で弁座よりも下方に窪む窪み部とを有することを特徴とする。 In order to solve the above problems, the present invention provides a primary pressure chamber, a casing having a secondary pressure chamber above the primary pressure chamber, a valve seat between the primary pressure chamber and the secondary pressure chamber, and a primary pressure chamber. A diaphragm that covers the lower surface of the pressure chamber, and a governor valve that is inserted through a valve hole formed in the valve seat and has a valve body portion that gradually increases in outer diameter toward the upper side, and has a shaft portion of the governor valve that extends from the valve body portion. In a gas governor that is connected to a diaphragm and that controls the gas pressure fluctuation in the secondary pressure chamber by displacing the governor valve via the diaphragm according to the gas pressure fluctuation in the primary pressure chamber, the valve seat and the valve hole have the secondary pressure. The secondary pressure chamber is located on the outlet side of the chamber, and the secondary pressure chamber extends from the space directly above the valve seat in the opposite direction to the outlet of the secondary pressure chamber, and below the valve seat under the expansion space. It has the hollow part which becomes hollow, It is characterized by the above-mentioned.

本発明によれば、弁孔との間に弁体部の全周に亘って生ずる隙間を介して一次圧室から二次圧室に流入するガスのうち拡張空間側に流れたものは、直ぐには出口に流れずに拡張空間に暫くの間滞留する。そして、ガスが拡張空間に滞留している間に、ガスに混入していた異物が窪み部に落下してそこに溜まる。従って、ガスに混入した異物の一部をガスガバナで捕集することができる。   According to the present invention, the gas that flows from the primary pressure chamber to the secondary pressure chamber through the gap generated between the valve hole and the entire circumference of the valve body portion flows to the expansion space side immediately. Does not flow to the outlet and stays in the expansion space for a while. While the gas stays in the expansion space, the foreign matter mixed in the gas falls into the recessed portion and accumulates there. Therefore, a part of the foreign matter mixed in the gas can be collected by the gas governor.

本発明の第1実施形態のガスガバナを用いて構成したガバナ付き比例弁装置の断面図。Sectional drawing of the proportional valve apparatus with a governor comprised using the gas governor of 1st Embodiment of this invention. 図1のガバナ付き比例弁装置の上蓋を取外した状態の斜視図。The perspective view of the state which removed the upper cover of the proportional valve apparatus with a governor of FIG.

図1を参照して、Aは、本発明の実施形態のガスガバナを用いて構成したガバナ付き比例弁装置を示している。この比例弁装置Aは、ガスバーナに対するガス供給路に介設されるものであり、一次圧室11と、一次圧室11の上方に位置する二次圧室12と、一次圧室11と二次圧室12との間の弁座13とを有するケーシング1を備えている。弁座13には、一次圧室11と二次圧室12とを接続する弁孔14が形成されている。   With reference to FIG. 1, A shows the proportional valve apparatus with a governor comprised using the gas governor of embodiment of this invention. This proportional valve device A is interposed in a gas supply path to the gas burner, and includes a primary pressure chamber 11, a secondary pressure chamber 12 positioned above the primary pressure chamber 11, a primary pressure chamber 11, and a secondary pressure chamber. A casing 1 having a valve seat 13 between the pressure chamber 12 is provided. A valve hole 14 for connecting the primary pressure chamber 11 and the secondary pressure chamber 12 is formed in the valve seat 13.

尚、一次圧室11は、その一側部(図1で右側部)に開口する入口11aを介してガス供給路の上流側部分に連通し、二次圧室12は、その他側部(図1で左側部)に開口する出口12aを介してガス供給路の下流側部分に連通している。また、二次圧室12の上面は、ケーシング1に取付けた上蓋15で閉塞されている。   The primary pressure chamber 11 communicates with the upstream portion of the gas supply path via an inlet 11a that opens to one side (right side in FIG. 1), and the secondary pressure chamber 12 communicates with the other side (FIG. 1 communicates with the downstream portion of the gas supply path via an outlet 12a that opens to the left side. Further, the upper surface of the secondary pressure chamber 12 is closed with an upper lid 15 attached to the casing 1.

比例弁装置Aは、更に、一次圧室11の下面を覆うダイヤフラム2と、ダイヤフラム2に連結した樹脂製のガバナバルブ3と、ガバナバルブ3を上方の開き側に押圧する電磁ソレノイド4とを備えている。   The proportional valve device A further includes a diaphragm 2 that covers the lower surface of the primary pressure chamber 11, a resin governor valve 3 that is connected to the diaphragm 2, and an electromagnetic solenoid 4 that presses the governor valve 3 upward. .

ダイヤフラム2の外周部分は、ケーシング1の下面に締結する押え板21により、一次圧室11の下面外周部に挟圧固定されている。そして、ダイヤフラム2と押え板21との間に、大気開放される背圧室22が画成されるようにしている。また、ダイヤフラム2の下側には、ダイヤフラム2の下面に座金23を介して接する上端のフランジ部24aを有する筒状のバルブホルダ24が設けられている。   The outer peripheral portion of the diaphragm 2 is clamped and fixed to the outer peripheral portion of the lower surface of the primary pressure chamber 11 by a presser plate 21 fastened to the lower surface of the casing 1. A back pressure chamber 22 that is opened to the atmosphere is defined between the diaphragm 2 and the presser plate 21. A cylindrical valve holder 24 having an upper flange portion 24 a that is in contact with the lower surface of the diaphragm 2 via a washer 23 is provided on the lower side of the diaphragm 2.

ガバナバルブ3は、弁孔14に挿通され、上方に向けて次第に外径を大きくした傘状の弁体部31と、弁体部31からのびてダイヤフラム2に連結される軸部32とを有している。軸部32の下端部には、ダイヤフラム2の上面に接する肩面から下方に突出する小径軸部32aが突設されており、この小径軸部32aをダイヤフラム2の中心に形成した孔を通してバルブホルダ24に嵌合固定することにより、ガバナバルブ3をダイヤフラム2に連結している。尚、軸部32は、弁体部31からダイヤフラム2に向けて下方にのびるだけでなく弁体部31から上方にものびている。   The governor valve 3 includes an umbrella-shaped valve body portion 31 that is inserted into the valve hole 14 and gradually increases in outer diameter toward the upper side, and a shaft portion 32 that extends from the valve body portion 31 and is connected to the diaphragm 2. ing. A small diameter shaft portion 32a projecting downward from a shoulder surface in contact with the upper surface of the diaphragm 2 is projected at the lower end portion of the shaft portion 32, and the valve holder is passed through a hole formed at the center of the diaphragm 2 with the small diameter shaft portion 32a. The governor valve 3 is connected to the diaphragm 2 by being fitted and fixed to 24. The shaft portion 32 extends not only downward from the valve body portion 31 toward the diaphragm 2 but also upward from the valve body portion 31.

電磁ソレノイド4は、押え板21の下面に取付けられるヨーク41と、ヨーク41内のボビン42に巻回したコイル43と、ヨーク41の内周の筒状ガイド44に上下方向に移動自在に挿通したプランジャ45と、プランジャ45を上方に付勢してプランジャ45の自重をキャンセルするスプリング46とを有している。プランジャ45は、ガバナバルブ3の小径軸部32aの下端に当接し、コイル43への通電電流値に比例した押圧力でガバナバルブ3を上方の開き側に押圧する。   The electromagnetic solenoid 4 is inserted into a yoke 41 attached to the lower surface of the holding plate 21, a coil 43 wound around a bobbin 42 in the yoke 41, and a cylindrical guide 44 on the inner periphery of the yoke 41 so as to be movable in the vertical direction. A plunger 45 and a spring 46 that urges the plunger 45 upward to cancel the weight of the plunger 45 are provided. The plunger 45 contacts the lower end of the small-diameter shaft portion 32a of the governor valve 3 and presses the governor valve 3 upward with a pressing force proportional to the value of the current supplied to the coil 43.

ここで、電流値を大きくするほどガバナバルブ3が開き側に変位して、弁孔14の周面と弁体部31との間の隙間(開度)が大きくなり、二次圧室12内のガス圧が増加する。従って、ガスバーナへの供給ガス量が電流値に比例して変化することになる。また、一次圧室11内のガス圧が変動すると、ダイヤフラム2を介してガバナバルブ3が変位して、ガス圧変動を吸収するように開度が変化し、二次圧室12内のガス圧変動が抑制される。そのため、一次圧室11内のガス圧変動を生じても、二次圧室12内のガス圧は電流値に応じた所定圧に維持される。   Here, as the current value is increased, the governor valve 3 is displaced to the opening side, and the gap (opening) between the peripheral surface of the valve hole 14 and the valve body portion 31 is increased, and the inside of the secondary pressure chamber 12 is increased. Gas pressure increases. Therefore, the amount of gas supplied to the gas burner changes in proportion to the current value. Further, when the gas pressure in the primary pressure chamber 11 fluctuates, the governor valve 3 is displaced through the diaphragm 2 and the opening degree changes so as to absorb the gas pressure fluctuation, and the gas pressure fluctuation in the secondary pressure chamber 12 changes. Is suppressed. Therefore, even if the gas pressure fluctuation in the primary pressure chamber 11 occurs, the gas pressure in the secondary pressure chamber 12 is maintained at a predetermined pressure corresponding to the current value.

ところで、ガスに混入した異物がガスガバナAの下流側に流れた場合、下流端のノズルの詰りを生じたり、下流側の電磁弁の弁体に異物が付着して弁洩れを生じたりすることがある。そこで、本実施形態のガスガバナAは、ガスに混入した異物の少なくとも一部を捕集できるように構成されている。以下、この点について図2も参照して説明する。   By the way, when the foreign matter mixed in the gas flows downstream of the gas governor A, the nozzle at the downstream end may be clogged, or foreign matter may adhere to the valve body of the downstream solenoid valve and cause valve leakage. is there. Therefore, the gas governor A of the present embodiment is configured to collect at least a part of the foreign matter mixed in the gas. This point will be described below with reference to FIG.

本実施形態のガスガバナAの二次圧室12は、弁座13の直上空間121から二次圧室12の出口12aと反対方向、即ち、図1で右方に広がる拡張空間122と、拡張空間122の下で弁座13よりも下方に窪む窪み部123とを有している。   The secondary pressure chamber 12 of the gas governor A of the present embodiment includes an expansion space 122 that extends from the space 121 directly above the valve seat 13 in the direction opposite to the outlet 12a of the secondary pressure chamber 12, that is, to the right in FIG. And a recess 123 that is recessed below the valve seat 13 below the valve seat 13.

これによれば、弁孔14との間にガバナバルブ3の弁体部31の全周に亘って生ずる隙間を介して一次圧室11から二次圧室12に流入するガスのうち拡張空間122側に流れたものは、直ぐには出口12aに流れずに拡張空間122に暫くの間滞留する。そして、ガスが拡張空間122に滞留している間に、ガスに混入していた異物が窪み部123に落下してそこに溜まる。従って、ガスに混入した異物の一部をガスガバナAで捕集して、ノズル詰りや弁洩れの発生を抑制することができる。   According to this, the expansion space 122 side of the gas flowing into the secondary pressure chamber 12 from the primary pressure chamber 11 through the gap generated between the valve hole 14 and the entire circumference of the valve body portion 31 of the governor valve 3. The material that has flowed into the expansion space 122 does not flow immediately to the outlet 12a but stays in the expansion space 122 for a while. Then, while the gas stays in the expansion space 122, the foreign matter mixed in the gas falls into the recessed portion 123 and accumulates there. Therefore, part of the foreign matter mixed in the gas can be collected by the gas governor A, and the occurrence of nozzle clogging and valve leakage can be suppressed.

以上、本発明の実施形態について図面を参照して説明したが、本発明はこれに限定されない。例えば、上記実施形態は、電磁ソレノイド4を備えるガバナ付き比例弁装置を構成するガスガバナに本発明を適用したものであるが、電磁ソレノイド4を具備しない通常のガスガバナにも同様に本発明を適用できる。   As mentioned above, although embodiment of this invention was described with reference to drawings, this invention is not limited to this. For example, in the above embodiment, the present invention is applied to a gas governor that constitutes a proportional valve device with a governor including the electromagnetic solenoid 4, but the present invention can be similarly applied to a normal gas governor that does not include the electromagnetic solenoid 4. .

1…ケーシング、11…一次圧室、12…二次圧室、12a…出口、121…直上空間、122…拡張空間、123…窪み部、13…弁座、14…弁孔、2…ダイヤフラム、3…ガバナバルブ、31…弁体部、32…軸部。

DESCRIPTION OF SYMBOLS 1 ... Casing, 11 ... Primary pressure chamber, 12 ... Secondary pressure chamber, 12a ... Outlet, 121 ... Space immediately above, 122 ... Expansion space, 123 ... Depression part, 13 ... Valve seat, 14 ... Valve hole, 2 ... Diaphragm, 3 ... governor valve, 31 ... valve body part, 32 ... shaft part.

Claims (1)

一次圧室と、一次圧室の上方の二次圧室と、一次圧室と二次圧室との間の弁座とを有するケーシングと、一次圧室の下面を覆うダイヤフラムと、弁座に形成した弁孔に挿通され、上方に向けて外径を次第に大きくした弁体部を有するガバナバルブとを備え、弁体部からのびるガバナバルブの軸部をダイヤフラムに連結し、一次圧室内のガス圧変動に応じダイヤフラムを介してガバナバルブを変位させて、二次圧室内のガス圧変動を抑制するようにしたガスガバナにおいて、
弁座及び弁孔が二次圧室の出口側に偏った位置に存し、二次圧室は、弁座の直上空間から二次圧室の出口と反対方向に広がる拡張空間と、拡張空間の下で弁座よりも下方に窪む窪み部とを有することを特徴とするガスガバナ。
A casing having a primary pressure chamber, a secondary pressure chamber above the primary pressure chamber, a valve seat between the primary pressure chamber and the secondary pressure chamber, a diaphragm covering the lower surface of the primary pressure chamber, and a valve seat A governor valve having a valve body portion that is inserted through the formed valve hole and has an outer diameter gradually increasing upward, and the shaft portion of the governor valve extending from the valve body portion is connected to the diaphragm to change the gas pressure in the primary pressure chamber. In accordance with the gas governor in which the governor valve is displaced via the diaphragm to suppress the gas pressure fluctuation in the secondary pressure chamber,
The valve seat and the valve hole are located in a position biased toward the outlet side of the secondary pressure chamber, and the secondary pressure chamber extends from the space immediately above the valve seat in the direction opposite to the outlet of the secondary pressure chamber, and the expansion space A gas governor comprising: a recessed portion that is recessed below the valve seat.
JP2015220359A 2015-11-10 2015-11-10 Gas governor Active JP6588309B2 (en)

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