JP6566546B2 - Method for producing amide compound - Google Patents
Method for producing amide compound Download PDFInfo
- Publication number
- JP6566546B2 JP6566546B2 JP2015057937A JP2015057937A JP6566546B2 JP 6566546 B2 JP6566546 B2 JP 6566546B2 JP 2015057937 A JP2015057937 A JP 2015057937A JP 2015057937 A JP2015057937 A JP 2015057937A JP 6566546 B2 JP6566546 B2 JP 6566546B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- oxime
- catalyst
- amide compound
- salt
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- -1 amide compound Chemical class 0.000 title claims description 67
- 238000004519 manufacturing process Methods 0.000 title claims description 19
- 239000003054 catalyst Substances 0.000 claims description 44
- 238000006237 Beckmann rearrangement reaction Methods 0.000 claims description 21
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 7
- 239000000741 silica gel Substances 0.000 claims description 7
- 229910002027 silica gel Inorganic materials 0.000 claims description 7
- 159000000000 sodium salts Chemical class 0.000 claims description 7
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 claims description 6
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 claims description 6
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 claims description 6
- 150000001868 cobalt Chemical class 0.000 claims description 6
- 159000000003 magnesium salts Chemical class 0.000 claims description 6
- MFUVDXOKPBAHMC-UHFFFAOYSA-N magnesium;dinitrate;hexahydrate Chemical compound O.O.O.O.O.O.[Mg+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O MFUVDXOKPBAHMC-UHFFFAOYSA-N 0.000 claims description 6
- 150000002815 nickel Chemical class 0.000 claims description 6
- CDBYLPFSWZWCQE-UHFFFAOYSA-L sodium carbonate Substances [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 claims description 6
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 claims description 3
- 229910001629 magnesium chloride Inorganic materials 0.000 claims description 3
- 229910052943 magnesium sulfate Inorganic materials 0.000 claims description 3
- 235000019341 magnesium sulphate Nutrition 0.000 claims description 3
- 235000017557 sodium bicarbonate Nutrition 0.000 claims description 3
- 229910000030 sodium bicarbonate Inorganic materials 0.000 claims description 3
- WBHQBSYUUJJSRZ-UHFFFAOYSA-M sodium bisulfate Chemical compound [Na+].OS([O-])(=O)=O WBHQBSYUUJJSRZ-UHFFFAOYSA-M 0.000 claims description 3
- 229910000342 sodium bisulfate Inorganic materials 0.000 claims description 3
- 229910000029 sodium carbonate Inorganic materials 0.000 claims description 3
- 235000017550 sodium carbonate Nutrition 0.000 claims description 3
- 229910052938 sodium sulfate Inorganic materials 0.000 claims description 3
- 235000011152 sodium sulphate Nutrition 0.000 claims description 3
- JBKVHLHDHHXQEQ-UHFFFAOYSA-N epsilon-caprolactam Chemical compound O=C1CCCCCN1 JBKVHLHDHHXQEQ-UHFFFAOYSA-N 0.000 description 28
- 239000000047 product Substances 0.000 description 19
- 238000006243 chemical reaction Methods 0.000 description 18
- VEZUQRBDRNJBJY-UHFFFAOYSA-N cyclohexanone oxime Chemical compound ON=C1CCCCC1 VEZUQRBDRNJBJY-UHFFFAOYSA-N 0.000 description 18
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 15
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 15
- 239000000203 mixture Substances 0.000 description 14
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 12
- 125000004432 carbon atom Chemical group C* 0.000 description 10
- 239000002904 solvent Substances 0.000 description 10
- 125000000962 organic group Chemical group 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 239000006227 byproduct Substances 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 8
- 235000002639 sodium chloride Nutrition 0.000 description 8
- 125000003342 alkenyl group Chemical group 0.000 description 7
- 125000000304 alkynyl group Chemical group 0.000 description 7
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 6
- 125000000753 cycloalkyl group Chemical group 0.000 description 6
- 238000001914 filtration Methods 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 239000011541 reaction mixture Substances 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- 125000003710 aryl alkyl group Chemical group 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 125000000392 cycloalkenyl group Chemical group 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 238000005406 washing Methods 0.000 description 5
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- 125000002947 alkylene group Chemical group 0.000 description 4
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 4
- 125000000623 heterocyclic group Chemical group 0.000 description 4
- SCRFXJBEIINMIC-UHFFFAOYSA-N n-cyclododecylidenehydroxylamine Chemical compound ON=C1CCCCCCCCCCC1 SCRFXJBEIINMIC-UHFFFAOYSA-N 0.000 description 4
- JHNRZXQVBKRYKN-VQHVLOKHSA-N (ne)-n-(1-phenylethylidene)hydroxylamine Chemical compound O\N=C(/C)C1=CC=CC=C1 JHNRZXQVBKRYKN-VQHVLOKHSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 150000004677 hydrates Chemical class 0.000 description 3
- 229910017053 inorganic salt Inorganic materials 0.000 description 3
- 150000003951 lactams Chemical class 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 3
- 239000011780 sodium chloride Substances 0.000 description 3
- FVAUCKIRQBBSSJ-UHFFFAOYSA-M sodium iodide Chemical compound [Na+].[I-] FVAUCKIRQBBSSJ-UHFFFAOYSA-M 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- XXOHMWCSTKXDLH-YFHOEESVSA-N (nz)-n-[1-(4-methoxyphenyl)ethylidene]hydroxylamine Chemical compound COC1=CC=C(C(\C)=N/O)C=C1 XXOHMWCSTKXDLH-YFHOEESVSA-N 0.000 description 2
- SYBYTAAJFKOIEJ-UHFFFAOYSA-N 3-Methylbutan-2-one Chemical compound CC(C)C(C)=O SYBYTAAJFKOIEJ-UHFFFAOYSA-N 0.000 description 2
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- FZERHIULMFGESH-UHFFFAOYSA-N N-phenylacetamide Chemical compound CC(=O)NC1=CC=CC=C1 FZERHIULMFGESH-UHFFFAOYSA-N 0.000 description 2
- IOVCWXUNBOPUCH-UHFFFAOYSA-M Nitrite anion Chemical compound [O-]N=O IOVCWXUNBOPUCH-UHFFFAOYSA-M 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 125000006615 aromatic heterocyclic group Chemical group 0.000 description 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 2
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- RWGFKTVRMDUZSP-UHFFFAOYSA-N cumene Chemical compound CC(C)C1=CC=CC=C1 RWGFKTVRMDUZSP-UHFFFAOYSA-N 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- OBNCKNCVKJNDBV-UHFFFAOYSA-N ethyl butyrate Chemical compound CCCC(=O)OCC OBNCKNCVKJNDBV-UHFFFAOYSA-N 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 150000002484 inorganic compounds Chemical class 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 229960002337 magnesium chloride Drugs 0.000 description 2
- YIXJRHPUWRPCBB-UHFFFAOYSA-N magnesium nitrate Chemical compound [Mg+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O YIXJRHPUWRPCBB-UHFFFAOYSA-N 0.000 description 2
- 229960003390 magnesium sulfate Drugs 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- DIKCFMMRNVHRSS-UHFFFAOYSA-N n-[1-(2-methoxyphenyl)ethylidene]hydroxylamine Chemical compound COC1=CC=CC=C1C(C)=NO DIKCFMMRNVHRSS-UHFFFAOYSA-N 0.000 description 2
- YPFOSEYKSLTSSF-UHFFFAOYSA-N n-[1-(4-fluorophenyl)ethylidene]hydroxylamine Chemical compound ON=C(C)C1=CC=C(F)C=C1 YPFOSEYKSLTSSF-UHFFFAOYSA-N 0.000 description 2
- OENGSNXUALAIFP-UHFFFAOYSA-N n-cycloheptylidenehydroxylamine Chemical compound ON=C1CCCCCC1 OENGSNXUALAIFP-UHFFFAOYSA-N 0.000 description 2
- KTPUHSVFNHULJH-UHFFFAOYSA-N n-cyclooctylidenehydroxylamine Chemical compound ON=C1CCCCCCC1 KTPUHSVFNHULJH-UHFFFAOYSA-N 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 150000002825 nitriles Chemical class 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- BKIMMITUMNQMOS-UHFFFAOYSA-N nonane Chemical compound CCCCCCCCC BKIMMITUMNQMOS-UHFFFAOYSA-N 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 125000004400 (C1-C12) alkyl group Chemical group 0.000 description 1
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 description 1
- FWSXGNXGAJUIPS-WAYWQWQTSA-N (nz)-n-pentan-2-ylidenehydroxylamine Chemical compound CCC\C(C)=N/O FWSXGNXGAJUIPS-WAYWQWQTSA-N 0.000 description 1
- GETTZEONDQJALK-UHFFFAOYSA-N (trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC=C1 GETTZEONDQJALK-UHFFFAOYSA-N 0.000 description 1
- BYEAHWXPCBROCE-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoropropan-2-ol Chemical compound FC(F)(F)C(O)C(F)(F)F BYEAHWXPCBROCE-UHFFFAOYSA-N 0.000 description 1
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- KEQGZUUPPQEDPF-UHFFFAOYSA-N 1,3-dichloro-5,5-dimethylimidazolidine-2,4-dione Chemical compound CC1(C)N(Cl)C(=O)N(Cl)C1=O KEQGZUUPPQEDPF-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- 125000004973 1-butenyl group Chemical group C(=CCC)* 0.000 description 1
- 125000006023 1-pentenyl group Chemical group 0.000 description 1
- 125000006017 1-propenyl group Chemical group 0.000 description 1
- 125000000530 1-propynyl group Chemical group [H]C([H])([H])C#C* 0.000 description 1
- VBBUVIWLZBAEEF-UHFFFAOYSA-N 2,6-dihydroxypyrrolo[3,4-f]isoindole-1,3,5,7-tetrone Chemical compound C1=C2C(=O)N(O)C(=O)C2=CC2=C1C(=O)N(O)C2=O VBBUVIWLZBAEEF-UHFFFAOYSA-N 0.000 description 1
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 1
- 125000002941 2-furyl group Chemical group O1C([*])=C([H])C([H])=C1[H] 0.000 description 1
- CFMZSMGAMPBRBE-UHFFFAOYSA-N 2-hydroxyisoindole-1,3-dione Chemical compound C1=CC=C2C(=O)N(O)C(=O)C2=C1 CFMZSMGAMPBRBE-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 125000004105 2-pyridyl group Chemical group N1=C([*])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 125000000175 2-thienyl group Chemical group S1C([*])=C([H])C([H])=C1[H] 0.000 description 1
- 125000006201 3-phenylpropyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- BVZSQTRWIYKUSF-TWGQIWQCSA-N 4-[(Z)-N-hydroxy-C-methylcarbonimidoyl]phenol Chemical compound C1=C(C=CC(=C1)O)/C(=N\O)/C BVZSQTRWIYKUSF-TWGQIWQCSA-N 0.000 description 1
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 229910015900 BF3 Inorganic materials 0.000 description 1
- 239000007848 Bronsted acid Substances 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- SXVPOSFURRDKBO-UHFFFAOYSA-N Cyclododecanone Natural products O=C1CCCCCCCCCCC1 SXVPOSFURRDKBO-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical compound ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 description 1
- JHWNWJKBPDFINM-UHFFFAOYSA-N Laurolactam Chemical compound O=C1CCCCCCCCCCCN1 JHWNWJKBPDFINM-UHFFFAOYSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- RJUFJBKOKNCXHH-UHFFFAOYSA-N Methyl propionate Chemical compound CCC(=O)OC RJUFJBKOKNCXHH-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- NQTADLQHYWFPDB-UHFFFAOYSA-N N-Hydroxysuccinimide Chemical compound ON1C(=O)CCC1=O NQTADLQHYWFPDB-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- RGVFJFJFKWWUHD-UHFFFAOYSA-N N-cyclononadecylidenehydroxylamine Chemical compound ON=C1CCCCCCCCCCCCCCCCCC1 RGVFJFJFKWWUHD-UHFFFAOYSA-N 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- PSVPFWIGAHOXSS-UHFFFAOYSA-N ON=C(O)C1=CC(=C(C=2C(=CC=CC12)C(=O)O)C(=O)O)C(O)=NO Chemical compound ON=C(O)C1=CC(=C(C=2C(=CC=CC12)C(=O)O)C(=O)O)C(O)=NO PSVPFWIGAHOXSS-UHFFFAOYSA-N 0.000 description 1
- RHQDFWAXVIIEBN-UHFFFAOYSA-N Trifluoroethanol Chemical compound OCC(F)(F)F RHQDFWAXVIIEBN-UHFFFAOYSA-N 0.000 description 1
- 235000010724 Wisteria floribunda Nutrition 0.000 description 1
- 229960001413 acetanilide Drugs 0.000 description 1
- 235000011054 acetic acid Nutrition 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- PXAJQJMDEXJWFB-UHFFFAOYSA-N acetone oxime Chemical compound CC(C)=NO PXAJQJMDEXJWFB-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 125000004423 acyloxy group Chemical group 0.000 description 1
- 238000005377 adsorption chromatography Methods 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000004414 alkyl thio group Chemical group 0.000 description 1
- 230000029936 alkylation Effects 0.000 description 1
- 238000005804 alkylation reaction Methods 0.000 description 1
- 125000004103 aminoalkyl group Chemical group 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
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- 238000004458 analytical method Methods 0.000 description 1
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- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000005110 aryl thio group Chemical group 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
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- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 description 1
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- ZBDSFTZNNQNSQM-UHFFFAOYSA-H cobalt(2+);diphosphate Chemical compound [Co+2].[Co+2].[Co+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O ZBDSFTZNNQNSQM-UHFFFAOYSA-H 0.000 description 1
- AMFIJXSMYBKJQV-UHFFFAOYSA-L cobalt(2+);octadecanoate Chemical compound [Co+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O AMFIJXSMYBKJQV-UHFFFAOYSA-L 0.000 description 1
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- 238000010438 heat treatment Methods 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
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- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 1
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- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
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- 150000002500 ions Chemical class 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
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- WRUGWIBCXHJTDG-UHFFFAOYSA-L magnesium sulfate heptahydrate Chemical compound O.O.O.O.O.O.O.[Mg+2].[O-]S([O-])(=O)=O WRUGWIBCXHJTDG-UHFFFAOYSA-L 0.000 description 1
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- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
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- GEMHFKXPOCTAIP-UHFFFAOYSA-N n,n-dimethyl-n'-phenylcarbamimidoyl chloride Chemical compound CN(C)C(Cl)=NC1=CC=CC=C1 GEMHFKXPOCTAIP-UHFFFAOYSA-N 0.000 description 1
- FNMOWADXAAVOPW-UHFFFAOYSA-N n-(1-cyclohexylpropylidene)hydroxylamine Chemical compound CCC(=NO)C1CCCCC1 FNMOWADXAAVOPW-UHFFFAOYSA-N 0.000 description 1
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- QVHGZSFAPAAEDP-UHFFFAOYSA-N n-cyclohexadecylidenehydroxylamine Chemical compound ON=C1CCCCCCCCCCCCCCC1 QVHGZSFAPAAEDP-UHFFFAOYSA-N 0.000 description 1
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- MIMLVMHHSQXPAY-UHFFFAOYSA-N n-cyclopentadecylidenehydroxylamine Chemical compound ON=C1CCCCCCCCCCCCCC1 MIMLVMHHSQXPAY-UHFFFAOYSA-N 0.000 description 1
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- KBJMLQFLOWQJNF-UHFFFAOYSA-N nickel(ii) nitrate Chemical compound [Ni+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O KBJMLQFLOWQJNF-UHFFFAOYSA-N 0.000 description 1
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- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
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- 125000002958 pentadecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
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- DLYUQMMRRRQYAE-UHFFFAOYSA-N phosphorus pentoxide Inorganic materials O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 description 1
- 125000004482 piperidin-4-yl group Chemical group N1CCC(CC1)* 0.000 description 1
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- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
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- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 235000009518 sodium iodide Nutrition 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- HIFJUMGIHIZEPX-UHFFFAOYSA-N sulfuric acid;sulfur trioxide Chemical compound O=S(=O)=O.OS(O)(=O)=O HIFJUMGIHIZEPX-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- AHZJKOKFZJYCLG-UHFFFAOYSA-K trifluoromethanesulfonate;ytterbium(3+) Chemical compound [Yb+3].[O-]S(=O)(=O)C(F)(F)F.[O-]S(=O)(=O)C(F)(F)F.[O-]S(=O)(=O)C(F)(F)F AHZJKOKFZJYCLG-UHFFFAOYSA-K 0.000 description 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Other In-Based Heterocyclic Compounds (AREA)
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Description
本発明は、アミド化合物の製造する方法に関し、特に、オキシム化合物をベックマン転位反応させることによりアミド化合物を製造する方法に関する。 The present invention relates to a method for producing an amide compound, and more particularly to a method for producing an amide compound by subjecting an oxime compound to a Beckmann rearrangement reaction.
オキシム化合物のベックマン転位によるアミド化合物への変換反応は、出発原料と目的生成物とを構成する元素の種類と数とが全く同じである“アトムエコノミー(atom economy)”100%の反応である。工業的なアミド化合物の製造方法としては、液相中で濃硫酸や発煙硫酸などの強酸を使用してシクロヘキサノンオキシムをベックマン転位反応させてε−カプロラクタムを製造する方法が良く知られているが、該方法では生成したラクタムが添加した強酸と塩を形成するために、強酸を過剰に用いることが常である。従って、反応生成液からε−カプロラクタムを分離するときの中和工程で、アンモニア水溶液を用いるため、多量の硫酸アンモニウムが副生するという問題がある。 The conversion reaction of the oxime compound into the amide compound by the Beckmann rearrangement is a 100% “atom economy” reaction in which the types and numbers of elements constituting the starting material and the target product are exactly the same. As an industrial amide compound production method, a method of producing ε-caprolactam by Beckmann rearrangement of cyclohexanone oxime using a strong acid such as concentrated sulfuric acid or fuming sulfuric acid in a liquid phase is well known. In this method, in order to form a salt with the strong acid added by the produced lactam, the strong acid is usually used in excess. Accordingly, since an aqueous ammonia solution is used in the neutralization step when separating ε-caprolactam from the reaction product solution, there is a problem that a large amount of ammonium sulfate is by-produced.
上記問題を解決するために、本発明者らは、単独で用いた場合には活性の低い触媒量(10mol%程度)のコバルト塩やニッケル塩を、10〜20mol%の触媒量のルイス酸、ブレンステッド酸、酸無水物、あるいは酸塩化物などと組み合わせて使用することにより、副生成物の生成を抑制して高選択率でアミド化合物を製造できることを見出した。この方法においては、生成したアミド化合物を最も効率良く取り出すためには、従来法と同様に塩基処理をすることが好ましいが、塩基処理により副生する無機塩は1/5〜1/3以下に減じることができる(特許文献1乃至4)。 In order to solve the above problems, the present inventors, when used alone, have a catalytic amount (about 10 mol%) of a cobalt salt or nickel salt having a low activity, a Lewis acid having a catalytic amount of 10 to 20 mol%, It has been found that by using in combination with Bronsted acid, acid anhydride, acid chloride or the like, it is possible to produce an amide compound with high selectivity by suppressing the formation of by-products. In this method, in order to take out the produced amide compound most efficiently, it is preferable to perform a base treatment in the same manner as in the conventional method, but the inorganic salt produced as a by-product by the base treatment is reduced to 1/5 to 1/3 or less. It can be reduced (Patent Documents 1 to 4).
その他にも、ベックマン転位反応に用いる触媒に関しては、種々、検討されている。例えば、N,N−ジメチルホルムアミドとクロロスルホン酸から生成するイオン対(ビルスマイヤー錯体)からなる触媒(非特許文献1)、エポキシ化合物と強酸(三フッ化ホウ素・エーテラート等)から生成するアルキル化剤、及びN,N−ジアルキルホルムアミドからなる触媒(非特許文献2)、リン酸若しくは縮合性リン酸化合物からなる触媒(特許文献5)、N,N−ジアルキルホルムアミド等の化合物、五酸化リン、及び含フッ素強酸若しくはその誘導体からなる触媒(特許文献6)、インジウムトリフラート(非特許文献3)、イッテルビウムトリフラート(非特許文献4)等の触媒などが知られている。 In addition, various studies have been made on the catalyst used in the Beckmann rearrangement reaction. For example, a catalyst (non-patent document 1) consisting of an ion pair (Vilsmeier complex) generated from N, N-dimethylformamide and chlorosulfonic acid, an alkylation generated from an epoxy compound and a strong acid (such as boron trifluoride / etherate) And a catalyst comprising N, N-dialkylformamide (Non-patent Document 2), a catalyst comprising phosphoric acid or a condensable phosphoric acid compound (Patent Document 5), a compound such as N, N-dialkylformamide, phosphorus pentoxide, In addition, a catalyst such as a catalyst comprising a strong fluorine-containing acid or a derivative thereof (Patent Document 6), indium triflate (Non-Patent Document 3), ytterbium triflate (Non-Patent Document 4), and the like are known.
しかしながら、それらの方法では空気中で不安定な触媒を使用したり、分解することにより腐食性のガスを発生する触媒を使用する等の理由により、産業上利用するためには好ましくない。また、依然として塩基処理が必要であり、無機塩の副生を避けられない。そのため、取り扱いが容易な触媒を用いて、副生成物の生成を抑制して高選択率でアミド化合物を製造する方法の開発が望まれる。 However, these methods are not preferable for industrial use because of the use of an unstable catalyst in the air or the use of a catalyst that generates a corrosive gas by decomposition. Moreover, base treatment is still necessary, and the by-product of inorganic salt cannot be avoided. Therefore, it is desired to develop a method for producing an amide compound with high selectivity by suppressing the formation of by-products using a catalyst that is easy to handle.
本発明は、上記のような問題を鑑みてなされたものであって、オキシム化合物をベックマン転位反応させることによりアミド化合物を製造する方法において、副生成物の生成を抑制して高選択率でアミド化合物を製造できるアミド化合物の製造方法を提供することを目的とする。 The present invention has been made in view of the above problems, and in a method for producing an amide compound by subjecting an oxime compound to a Beckmann rearrangement reaction, the formation of a by-product is suppressed and the amide has a high selectivity. It aims at providing the manufacturing method of the amide compound which can manufacture a compound.
以上の目的を達成するために、本発明者らは鋭意研究を重ねた結果、下記(A)乃至(C)から構成される触媒の存在下でベックマン転位反応させることにより、副生成物の生成を抑制して高選択率でアミド化合物を製造できることを見出し、本発明に至った。 In order to achieve the above object, the present inventors have conducted extensive research, and as a result, Beckmann rearrangement reaction is carried out in the presence of a catalyst composed of the following (A) to (C) to produce a by-product. The inventors have found that an amide compound can be produced with high selectivity while suppressing the above, and have led to the present invention.
すなわち、本発明は、オキシム化合物をベックマン転位反応させることによりアミド化合物を製造する方法において、(A)コバルト塩及びニッケル塩のうちいずれか1以上、(B)マグネシウム塩及びナトリウム塩のうちいずれか1以上、並びに(C)シリカゲルから構成される触媒の存在下でベックマン転位反応させることを特徴とするアミド化合物の製造方法に関するものである。 That is, the present invention provides a method for producing an amide compound by subjecting an oxime compound to a Beckmann rearrangement reaction, wherein (A) any one or more of a cobalt salt and a nickel salt, and (B) any of a magnesium salt and a sodium salt. The present invention relates to a method for producing an amide compound, characterized by carrying out a Beckmann rearrangement reaction in the presence of a catalyst composed of one or more and (C) silica gel.
本発明によれば、副生成物の生成を抑制して高選択率でアミド化合物を製造できるアミド化合物の製造方法を提供することができる。また、反応後に、塩基処理をすることなく、単に濾過のみで生成物を単離することも可能で、無機塩を副生しないアミド化合物の製造方法を提供することができる。 ADVANTAGE OF THE INVENTION According to this invention, the production method of the amide compound which can suppress the production | generation of a by-product and can manufacture an amide compound with high selectivity can be provided. Further, after the reaction, the product can be isolated only by filtration without performing a base treatment, and a method for producing an amide compound which does not produce an inorganic salt as a by-product can be provided.
(オキシム化合物)
本発明において用いられるオキシム化合物は、特に制限されず、製造目的とするアミド化合物に応じて適宜選択することができる。オキシム化合物としては、例えば、下記式(1)で表される化合物が挙げられる。
(Oxime compounds)
The oxime compound used in the present invention is not particularly limited and can be appropriately selected depending on the amide compound to be produced. As an oxime compound, the compound represented by following formula (1) is mentioned, for example.
式(1)中、R1及びR2は、それぞれ有機基を示す。また、R1及びR2は、互いに結合して環を形成した2価の有機基であってもよい。 In formula (1), R 1 and R 2 each represents an organic group. R 1 and R 2 may be a divalent organic group bonded to each other to form a ring.
R1、R2における前記有機基としては、例えば、アルキル基、アルケニル基、アルキニル基、シクロアルキル基、シクロアルケニル基、アリール基、アラルキル基、並びに複素環基が挙げられる。 Examples of the organic group in R 1 and R 2 include alkyl groups, alkenyl groups, alkynyl groups, cycloalkyl groups, cycloalkenyl groups, aryl groups, aralkyl groups, and heterocyclic groups.
アルキル基としては、例えば、炭素原子数1〜20のアルキル基が挙げられ、炭素原子数1〜12のアルキル基であることが好ましく、炭素原子数2〜8のアルキル基であることがさらに好ましい。アルキル基として、具体的には、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、s−ブチル基、t−ブチル基、ペンチル基、イソペンチル基、ヘキシル基、イソヘキシル基、ヘプチル基、オクチル基、ノニル基、デシル基、ドデシル基、及びペンタデシル基などが挙げられる。 As an alkyl group, a C1-C20 alkyl group is mentioned, for example, It is preferable that it is a C1-C12 alkyl group, and it is more preferable that it is a C2-C8 alkyl group. . Specific examples of the alkyl group include methyl, ethyl, propyl, isopropyl, butyl, isobutyl, s-butyl, t-butyl, pentyl, isopentyl, hexyl, isohexyl, and heptyl. Group, octyl group, nonyl group, decyl group, dodecyl group, pentadecyl group and the like.
アルケニル基としては、例えば、炭素原子数2〜20のアルケニル基が挙げられ、炭素原子数2〜12のアルケニル基であることが好ましく、炭素原子数2〜8のアルケニル基であることがさらに好ましい。アルケニル基として、具体的には、ビニル基、アリル基、1−プロペニル基、1−ブテニル基、1−ペンテニル基、及び1−オクテニル基などが挙げられる。 Examples of the alkenyl group include alkenyl groups having 2 to 20 carbon atoms, preferably alkenyl groups having 2 to 12 carbon atoms, and more preferably alkenyl groups having 2 to 8 carbon atoms. . Specific examples of the alkenyl group include a vinyl group, an allyl group, a 1-propenyl group, a 1-butenyl group, a 1-pentenyl group, and a 1-octenyl group.
アルキニル基としては、例えば、炭素原子数2〜20のアルキニル基が挙げられ、炭素原子数2〜12のアルキニル基であることが好ましく、炭素原子数2〜8のアルキニル基であることがさらに好ましい。アルキニル基として、具体的には、エチニル基、及び1−プロピニル基などが挙げられる。 Examples of the alkynyl group include alkynyl groups having 2 to 20 carbon atoms, preferably alkynyl groups having 2 to 12 carbon atoms, and more preferably alkynyl groups having 2 to 8 carbon atoms. . Specific examples of the alkynyl group include ethynyl group and 1-propynyl group.
シクロアルキル基としては、例えば、炭素原子数3〜20のシクロアルキル基が挙げられ、炭素原子数3〜15のシクロアルキル基であることが好ましい。シクロアルキル基として、具体的には、シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基、シクロヘプチル基、シクロオクチル基、及びシクロドデシル基などが挙げられる。 Examples of the cycloalkyl group include a cycloalkyl group having 3 to 20 carbon atoms, and a cycloalkyl group having 3 to 15 carbon atoms is preferable. Specific examples of the cycloalkyl group include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, and a cyclododecyl group.
シクロアルケニル基としては、例えば、炭素原子数3〜20のシクロアルケニル基が挙げられ、炭素原子数3〜15のシクロアルケニル基であることが好ましい。シクロアルケニル基として、具体的には、シクロペンテニル基、シクロヘキセニル基、及びシクロオクテニル基などが挙げられる。 As a cycloalkenyl group, a C3-C20 cycloalkenyl group is mentioned, for example, It is preferable that it is a C3-C15 cycloalkenyl group. Specific examples of the cycloalkenyl group include a cyclopentenyl group, a cyclohexenyl group, and a cyclooctenyl group.
アリール基としては、例えば、炭素原子数6〜24のアリール基が挙げられる。アリール基として、具体的には、フェニル基、及びナフチル基などが挙げられる。 As an aryl group, a C6-C24 aryl group is mentioned, for example. Specific examples of the aryl group include a phenyl group and a naphthyl group.
アラルキル基としては、例えば、炭素原子数7〜25のアラルキル基が挙げられる。アラルキル基として、具体的には、ベンジル基、2−フェニルエチル基、及び3−フェニルプロピル基などが挙げられる。 Examples of the aralkyl group include aralkyl groups having 7 to 25 carbon atoms. Specific examples of the aralkyl group include a benzyl group, a 2-phenylethyl group, and a 3-phenylpropyl group.
複素環基としては、例えば、芳香族性の複素環基及び非芳香族性の複素環基が挙げられ、炭素数1〜24の複素環基であることが好ましい。複素環基として、具体的には、2−ピリジル基、2−キノリル基、2−フリル基、2−チエニル基、及び4−ピペリジニル基などが挙げられる。 As a heterocyclic group, an aromatic heterocyclic group and a non-aromatic heterocyclic group are mentioned, for example, It is preferable that it is a C1-C24 heterocyclic group. Specific examples of the heterocyclic group include a 2-pyridyl group, a 2-quinolyl group, a 2-furyl group, a 2-thienyl group, and a 4-piperidinyl group.
R1及びR2が、互いに結合して環を形成した有機基である場合、2価の有機基としては、例えば、直鎖若しくは分岐アルキレン基が挙げられ、直鎖アルキレン基であることが好ましい。アルキレン基は、式(1)で表されるオキシム化合物の炭素原子を含めて、3〜30員環を形成していることが好ましく、4〜20員環を形成していることがさらに好ましく、5〜14員環を形成していることが特に好ましい。2価のアルキレン基として、具体的には、エチレン基、トリメチレン基、及びプロピレン基などが挙げられる。 When R 1 and R 2 are an organic group bonded to each other to form a ring, examples of the divalent organic group include a linear or branched alkylene group, and a linear alkylene group is preferable. . The alkylene group preferably includes a 3- to 30-membered ring including the carbon atom of the oxime compound represented by the formula (1), more preferably a 4- to 20-membered ring, It is particularly preferable that a 5- to 14-membered ring is formed. Specific examples of the divalent alkylene group include an ethylene group, a trimethylene group, and a propylene group.
有機基は、ベックマン転位反応を阻害しなければ特に限定されることなく、種々の置換基を有してもよい。置換基としては、例えば、ハロゲン原子、オキソ基、メルカプト基、アルコキシ基、アリールオキシ基、アシルオキシ基、アルキルチオ基、アリールチオ基、ヘテロアリールチオ基、オキシカルボニル基、カルバモイル基、シアノ基、ニトロ基、アミノアルキル基、アルケニル基、アルキニル基、シクロアルキル基、シクロアルケニル基、アリール基、ヘテロアリール基、アラルキル基、及び複素環基などが挙げられる。 The organic group is not particularly limited as long as it does not inhibit the Beckmann rearrangement reaction, and may have various substituents. Examples of the substituent include a halogen atom, oxo group, mercapto group, alkoxy group, aryloxy group, acyloxy group, alkylthio group, arylthio group, heteroarylthio group, oxycarbonyl group, carbamoyl group, cyano group, nitro group, Examples include aminoalkyl groups, alkenyl groups, alkynyl groups, cycloalkyl groups, cycloalkenyl groups, aryl groups, heteroaryl groups, aralkyl groups, and heterocyclic groups.
式(1)中、R1及びR2が、それぞれ有機基であるオキシム化合物としては、例えば、アセトンオキシム、2−ブタノンオキシム、2−ペンタノンオキシム、3−ペンタノンオキシム、1−シクロヘキシル−1−プロパノンオキシム、アセトフェノンオキシム、p−メトキシアセトフェノンオキシム、o−メトキシアセトフェノンオキシム、p−フルオロアセトフェノンオキシム、ベンゾフェノンオキシム、及び4−ヒドロキシアセトフェノンオキシムが挙げられる。式(1)中、R1及びR2が、互いに結合して環を形成した2価の有機基であるオキシム化合物としては、例えば、シクロプロパノンオキシム、シクロブタノンオキシム、シクロヘキサノンオキシム、シクロへプタノンオキシム、シクロオクタノンオキシム、シクロノナノンオキシム、シクロデカノンオキシム、シクロドデカノンオキシム、シクロトリデカノンオキシム、シクロテトラデカノンオキシム、シクロペンタデカノンオキシム、シクロヘキサデカノンオキシム、シクロオクタデカノンオキシム、及びシクロノナデカノンオキシムが挙げられる。これらのオキシム化合物の中では、シクロドデカノンオキシム、シクロヘキサノンオキシム、アセトフェノンオキシム、p−メトキシアセトフェノンオキシム、o−メトキシアセトフェノンオキシム、p−フルオロアセトフェノンオキシムであることが好ましく、シクロドデカノンオキシム又はシクロヘキサノンオキシムであることがさらに好ましい。オキシム化合物は、1種又は2種以上を選択して使用することができる。 In formula (1), examples of the oxime compound in which R 1 and R 2 are each an organic group include acetone oxime, 2-butanone oxime, 2-pentanone oxime, 3-pentanone oxime, and 1-cyclohexyl-1 -Propanone oxime, acetophenone oxime, p-methoxyacetophenone oxime, o-methoxyacetophenone oxime, p-fluoroacetophenone oxime, benzophenone oxime, and 4-hydroxyacetophenone oxime. Examples of the oxime compound in which R 1 and R 2 in formula (1) are divalent organic groups bonded to each other to form a ring include, for example, cyclopropanone oxime, cyclobutanone oxime, cyclohexanone oxime, cycloheptanone Oxime, cyclooctanone oxime, cyclononanone oxime, cyclodecanone oxime, cyclododecanone oxime, cyclotridecanone oxime, cyclotetradecanone oxime, cyclopentadecanone oxime, cyclohexadecanone oxime, cyclooctadecanone oxime, And cyclononadecanone oxime. Among these oxime compounds, cyclododecanone oxime, cyclohexanone oxime, acetophenone oxime, p-methoxyacetophenone oxime, o-methoxyacetophenone oxime, and p-fluoroacetophenone oxime are preferable, and cyclododecanone oxime or cyclohexanone oxime is preferable. More preferably it is. One or more oxime compounds can be selected and used.
オキシム化合物は、式(1)で表されるオキシム化合物に対応するケトンとヒドロキシルアミンを反応させることによって得ることができる。また、オキシム化合物は、脂肪族多価カルボン酸無水物若しくは芳香族多価カルボン酸無水物から誘導されるN−ヒドロキシイミド化合物、又はそのN−ヒドロキシイミド化合物のヒドロキシル基に保護基(例えば、アセチル基等のアシル基)を導入することにより得られる化合物の存在下、メチル基又はメチレン基を有する化合物と、亜硝酸エステル又は亜硝酸塩とを反応させることによっても得ることができる。脂肪族多価カルボン酸無水物若しくは芳香族多価カルボン酸無水物としては、例えば、N−ヒドロキシコハク酸イミド、N−ヒドロキシフタル酸イミド、N,N’−ジヒドロキシピロメリット酸ジイミド、N−ヒドロキシグルタルイミド、N−ヒドロキシ−1,8−ナフタレンジカルボン酸イミド、及びN,N’−ジヒドロキシ−1,3,4,5−ナフタレンテトラカルボン酸ジイミドを挙げることができる(例えば、特開2009−298706号公報)。 The oxime compound can be obtained by reacting a ketone corresponding to the oxime compound represented by the formula (1) with hydroxylamine. The oxime compound is an N-hydroxyimide compound derived from an aliphatic polyvalent carboxylic acid anhydride or an aromatic polyvalent carboxylic acid anhydride, or a protective group (for example, acetyl group) on the hydroxyl group of the N-hydroxyimide compound. It can also be obtained by reacting a compound having a methyl group or a methylene group with a nitrite or nitrite in the presence of a compound obtained by introducing an acyl group such as a group. Examples of the aliphatic polycarboxylic anhydride or aromatic polycarboxylic anhydride include N-hydroxysuccinimide, N-hydroxyphthalimide, N, N′-dihydroxypyromellitic diimide, and N-hydroxy. Examples include glutarimide, N-hydroxy-1,8-naphthalenedicarboxylic acid imide, and N, N′-dihydroxy-1,3,4,5-naphthalenetetracarboxylic acid diimide (for example, JP 2009-298706 A). Issue gazette).
((A)コバルト塩及びニッケル塩のうちいずれか1以上)
本発明において用いられるコバルト塩としては、例えば、酸化コバルト、塩化コバルト、臭化コバルト、硝酸コバルト、硫酸コバルト、リン酸コバルト、過塩素酸コバルト、テトラフルオロホウ酸コバルトなどの無機化合物;酢酸コバルト、ナフテン酸コバルト、ステアリン酸コバルトなどの有機酸塩;コバルトアセチルアセトナトなどの錯体のコバルト化合物など、並びにそれらの水和物が挙げられる。前記水和物としては、硝酸コバルト六水和物、過塩素酸コバルト六水和物、テトラフルオロホウ酸コバルト六水和物であることが好ましく、テトラフルオロホウ酸コバルト六水和物であることが特に好ましい。これらは、市販品を用いることができる。
((A) one or more of cobalt salt and nickel salt)
Examples of the cobalt salt used in the present invention include inorganic compounds such as cobalt oxide, cobalt chloride, cobalt bromide, cobalt nitrate, cobalt sulfate, cobalt phosphate, cobalt perchlorate, and cobalt tetrafluoroborate; cobalt acetate, Examples include organic acid salts such as cobalt naphthenate and cobalt stearate; cobalt compounds of complexes such as cobalt acetylacetonate, and the hydrates thereof. The hydrate is preferably cobalt nitrate hexahydrate, cobalt perchlorate hexahydrate, or cobalt tetrafluoroborate hexahydrate, and is cobalt tetrafluoroborate hexahydrate. Is particularly preferred. Commercial products can be used for these.
また、本発明において用いられるニッケル塩としては、例えば、酸化ニッケル、塩化ニッケル、臭化ニッケル、硝酸ニッケル、硫酸ニッケル、リン酸ニッケル、過塩素酸ニッケル、テトラフルオロホウ酸ニッケルなどの無機化合物;酢酸ニッケル、ナフテン酸ニッケル、ステアリン酸ニッケルなどの有機酸塩;ニッケルアセチルアセトナトなどの錯体のニッケル化合物など、並びにそれらの水和物が挙げられる。前記水和物としては、硝酸ニッケル六水和物、硫酸ニッケル六水和物、過塩素酸ニッケル六水和物、テトラフルオロホウ酸ニッケル六水和物であることが好ましく、テトラフルオロホウ酸ニッケル六水和物であることが特に好ましい。これらは、市販品を用いることができる。 Examples of the nickel salt used in the present invention include inorganic compounds such as nickel oxide, nickel chloride, nickel bromide, nickel nitrate, nickel sulfate, nickel phosphate, nickel perchlorate and nickel tetrafluoroborate; Examples thereof include organic acid salts such as nickel, nickel naphthenate and nickel stearate; nickel compounds of complexes such as nickel acetylacetonate and the like, and hydrates thereof. The hydrate is preferably nickel nitrate hexahydrate, nickel sulfate hexahydrate, nickel perchlorate hexahydrate, nickel tetrafluoroborate hexahydrate, nickel tetrafluoroborate Hexahydrate is particularly preferred. Commercial products can be used for these.
コバルト塩及びニッケル塩の使用量は、オキシム化合物の0.1〜100mol%であることが好ましく、1.0〜50mol%であることがさらに好ましい。 The amount of cobalt salt and nickel salt used is preferably 0.1 to 100 mol%, more preferably 1.0 to 50 mol% of the oxime compound.
((B)マグネシウム塩及びナトリウム塩のうちいずれか1以上)
本発明において用いられるマグネシウム塩としては、例えば、硝酸マグネシウム、硫酸マグネシウム、塩化マグネシウム、臭化マグネシウム、ヨウ化マグネシウム、並びにそれらの水和物が挙げられる。前記水和物としては、硝酸マグネシウム六水和物、塩化マグネシウム六水和物、硫酸マグネシウム七水和物などが挙げられる。マグネシウム塩としては、硫酸マグネシウム、塩化マグネシウム、硝酸マグネシウム六水和物であることが特に好ましい。これらは、市販品を用いることができる。
(One or more of (B) magnesium salt and sodium salt)
Examples of the magnesium salt used in the present invention include magnesium nitrate, magnesium sulfate, magnesium chloride, magnesium bromide, magnesium iodide, and hydrates thereof. Examples of the hydrate include magnesium nitrate hexahydrate, magnesium chloride hexahydrate, magnesium sulfate heptahydrate and the like. The magnesium salt is particularly preferably magnesium sulfate, magnesium chloride, or magnesium nitrate hexahydrate. Commercial products can be used for these.
また、本発明において用いられるナトリウム塩としては、例えば、硫酸水素ナトリウム、硫酸ナトリウム、炭酸水素ナトリウム、炭酸ナトリウム、塩化ナトリウム、臭化ナトリウム、ヨウ化ナトリウムなどが挙げられる。ナトリウム塩としては、硫酸水素ナトリウム、硫酸ナトリウム、炭酸水素ナトリウム、炭酸ナトリウムであることが特に好ましい。これらは、市販品を用いることができる。 Examples of the sodium salt used in the present invention include sodium hydrogen sulfate, sodium sulfate, sodium hydrogen carbonate, sodium carbonate, sodium chloride, sodium bromide, sodium iodide and the like. The sodium salt is particularly preferably sodium hydrogen sulfate, sodium sulfate, sodium hydrogen carbonate or sodium carbonate. Commercial products can be used for these.
マグネシウム塩及びナトリウム塩の使用量は、オキシム化合物の0.1〜100mol%であることが好ましく、5.0〜60mol%であることがさらに好ましい。 The amount of magnesium salt and sodium salt used is preferably 0.1 to 100 mol%, more preferably 5.0 to 60 mol% of the oxime compound.
((C)シリカゲル)
本発明において、シリカゲルは、市販品を用いることができ、特に限定はされないが、粒子径500μm以下のものが好ましい。また、シリカゲルの形状は、破砕状や球状などが挙げられるが、特に限定はされない。
((C) Silica gel)
In the present invention, a commercially available silica gel can be used, and is not particularly limited, but those having a particle diameter of 500 μm or less are preferable. The shape of the silica gel includes a crushed shape and a spherical shape, but is not particularly limited.
シリカゲルの使用量は、オキシム化合物の0.1mol%以上であることが好ましいが、多すぎると撹拌が容易でなくなる傾向にあるため、5.0〜70mol%であることがさらに好ましい。 The amount of silica gel used is preferably 0.1 mol% or more of the oxime compound, but if it is too much, stirring tends to be difficult, and more preferably 5.0 to 70 mol%.
(ベックマン転位反応)
本発明において、ベックマン転位反応は、無溶媒又は溶媒の存在下で行うことができる。溶媒を使用する場合、溶媒としては、反応を阻害しないものであれば特に限定されず、例えば、ベンゼン、トルエン、キシレン、クメン、及びクロロベンゼン等の芳香族炭化水素類;n−ヘキサン、n−ヘプタン、n−オクタン、n−ノナン、シクロヘキサン、シクロオクタン、シクロデカン、シクロドデカン、及びハイドロクメン等の脂肪族炭化水素類;アセトン、メチルエチルケトン、メチルイソプロピルケトン、メチルイソブチルケトン、シクロヘキサノン、及びシクロドデカノン等のケトン類;アセトニトリル、プロピオニトリル、及びベンゾニトリル等のニトリル類;ホルムアミド、アセトアミド、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド、N−メチルピロリドン、及び1,3−ジメチル−2−イミダゾリノン等のアミド類;ジメチルスルホキシド、及びスルホラン等のスルホキシド、スルホン類;蟻酸エチル、酢酸メチル、酢酸エチル、酢酸ブチル、プロピオン酸メチル、及びブタン酸エチル等のエステル類;蟻酸、酢酸、プロピオン酸、ブタン酸、及びトリフルオロ酢酸等のカルボン酸類;ジエチルエーテル、ジイソプロピルエーテル、テトラヒドロフラン、及びジオキサン等のエーテル類;ヘキサメチルリン酸トリアミド等のリン酸アミド類;クロロホルム、ジクロロメタン、ジクロロエタン、四塩化炭素、クロロベンゼン、及びトリフルオロメチルベンゼン等のハロゲン化炭化水素;ニトロベンゼン、ニトロメタン、及びニトロエタン等のニトロ化合物;並びに、ヘキサフルオロイソプロピルアルコール、及びトリフルオロエタノール等のフッ素系アルコールを挙げることができる。これらの中では、ニトリル類であることが好ましく、アセトニトリルであることがさらに好ましい。溶媒は、単独で用いることもできるし、2種以上の溶媒を混合して用いてもよい。
(Beckmann rearrangement reaction)
In the present invention, the Beckmann rearrangement reaction can be performed without solvent or in the presence of a solvent. When a solvent is used, the solvent is not particularly limited as long as it does not inhibit the reaction. For example, aromatic hydrocarbons such as benzene, toluene, xylene, cumene, and chlorobenzene; n-hexane, n-heptane , N-octane, n-nonane, cyclohexane, cyclooctane, cyclodecane, cyclododecane, and hydrocumene, and other aliphatic hydrocarbons; acetone, methyl ethyl ketone, methyl isopropyl ketone, methyl isobutyl ketone, cyclohexanone, and cyclododecanone Ketones; Nitriles such as acetonitrile, propionitrile, and benzonitrile; formamide, acetamide, N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone, and 1,3-dimethyl-2-imidazoli Amides such as dimethyl sulfoxide; Sulfoxides such as dimethyl sulfoxide and sulfolane; Sulfones; Esters such as ethyl formate, methyl acetate, ethyl acetate, butyl acetate, methyl propionate, and ethyl butanoate; Formic acid, acetic acid, propionic acid, Carboxylic acids such as butanoic acid and trifluoroacetic acid; ethers such as diethyl ether, diisopropyl ether, tetrahydrofuran, and dioxane; phosphoric acid amides such as hexamethylphosphoric triamide; chloroform, dichloromethane, dichloroethane, carbon tetrachloride, chlorobenzene And halogenated hydrocarbons such as trifluoromethylbenzene; nitro compounds such as nitrobenzene, nitromethane, and nitroethane; and hexafluoroisopropyl alcohol, trifluoroethanol, and the like Mention may be made of a fluorine-based alcohol. Of these, nitriles are preferable, and acetonitrile is more preferable. A solvent can also be used independently and may mix and use 2 or more types of solvents.
溶媒の使用量は、特に限定されないが、オキシム化合物の0〜100重量倍であることが好ましく、1〜50重量倍であることがさらに好ましい。 Although the usage-amount of a solvent is not specifically limited, It is preferable that it is 0-100 weight times of an oxime compound, and it is more preferable that it is 1-50 weight times.
ベックマン転位反応条件は、使用する触媒、及び溶媒等の種類や量により適宜選択でき、特に制限はない。一般的には、反応温度は、20〜120℃であることが好ましく、50〜110℃がより好ましく、60〜100℃が特に好ましい。反応圧力は、常圧又は加圧条件下で行うことができる。反応は、窒素やアルゴンなどの不活性ガス雰囲気下で行ってもよく、空気や酸素雰囲気下で行ってもよい。反応時間は、一般的には、0.01時間以上であることが好ましいが、長すぎると製造効率が低下するために0.5〜30時間であることがさらに好ましい。反応装置は、通常の撹拌装置を備えた反応器を用いることができる。 The Beckmann rearrangement reaction conditions can be appropriately selected depending on the type and amount of the catalyst and solvent used, and are not particularly limited. In general, the reaction temperature is preferably 20 to 120 ° C, more preferably 50 to 110 ° C, and particularly preferably 60 to 100 ° C. The reaction pressure can be carried out under normal pressure or pressurized conditions. The reaction may be performed in an inert gas atmosphere such as nitrogen or argon, or may be performed in an air or oxygen atmosphere. In general, the reaction time is preferably 0.01 hours or longer. However, if the reaction time is too long, the production efficiency is lowered, and therefore it is more preferably 0.5 to 30 hours. As the reaction apparatus, a reactor equipped with a normal stirring apparatus can be used.
本発明に係るアミド化合物の製造方法において、式(1)中、R1及びR2が、それぞれ有機基であるオキシム化合物をベックマン転位させた場合には、アミド結合部分が環状に含まれていないアミド化合物が得られる。例えば、アセトフェノンオキシムからは、アセトアニリドが得られる。R1及びR2が、互いに結合して環を形成した2価の有機基であるオキシム化合物をベックマン転位させた場合には、ラクタムが得られる。例えば、シクロアルカノンオキシムからは、員環数の1つ多いラクタムが得られる。具体的には、シクロヘキサノンオキシムからは、ε−カプロラクタムが、シクロヘプタノンオキシムからは、7−ヘプタンラクタムが、シクロオクタノンオキシムからは、8−オクタンラクタムが、シクロドデカノンオキシムからは、ラウロラクタムが得られる。 In the method for producing an amide compound according to the present invention, in the formula (1), when R 1 and R 2 are each an organic group oxime compound, Beckmann rearrangement does not include an amide bond portion in a cyclic form. An amide compound is obtained. For example, acetanilide is obtained from acetophenone oxime. When an oxime compound, which is a divalent organic group in which R 1 and R 2 are bonded to each other to form a ring, undergoes Beckmann rearrangement, a lactam is obtained. For example, cycloalkanone oxime provides a lactam having one more member ring. Specifically, ε-caprolactam is from cyclohexanone oxime, 7-heptane lactam is from cycloheptanone oxime, 8-octane lactam is from cyclooctanone oxime, and laurolactam is from cyclododecanone oxime. Is obtained.
ベックマン転位反応終了後、得られたアミド化合物は、例えば、濾過、濃縮、蒸留、抽出、晶析、再結晶、吸着、又はカラムクロマトグラフィーなどの分離手段や、これらの組み合わせにより分離精製してもよい。 After completion of the Beckmann rearrangement reaction, the obtained amide compound may be separated and purified by separation means such as filtration, concentration, distillation, extraction, crystallization, recrystallization, adsorption, or column chromatography, or a combination thereof. Good.
例えば、ベックマン転位反応後の分離精製としては、得られたアミド化合物含有液を、水洗浄(水を加えて水溶液として除去する方法)および/または塩基洗浄(塩基性の水溶液により、酸性の触媒成分等を除去する洗浄)し、触媒成分等を除去することにより、アミド化合物を得ることができる。さらに、蒸留・結晶化等により分離精製してもよい。 For example, as separation and purification after the Beckmann rearrangement reaction, the obtained amide compound-containing liquid is washed with water (a method of removing water as an aqueous solution) and / or basic washing (basic aqueous solution, an acidic catalyst component. The amide compound can be obtained by removing the catalyst component and the like. Furthermore, it may be separated and purified by distillation, crystallization or the like.
また、本発明においては、ベックマン転位反応後に、上記のような洗浄処理をすることなく、単に濾過のみでアミド化合物を単離することも可能である。濾過のみでアミド化合物を単離すると、無機塩を副生しないため好ましい。 In the present invention, after the Beckmann rearrangement reaction, it is also possible to isolate the amide compound only by filtration without performing the washing treatment as described above. It is preferable to isolate the amide compound only by filtration because inorganic salts are not by-produced.
以下、実施例により本発明を具体的に説明するが、本発明はこれらの実施例に限定されるものではない。 EXAMPLES Hereinafter, although an Example demonstrates this invention concretely, this invention is not limited to these Examples.
(実施例1〜8)
下記式(2)に示すベックマン転位反応を行った。具体的には、ネジ付き試験管に、シクロヘキサノンオキシム(56.6mg,0.5mmol)、触媒(A)乃至(C)(触媒(C)は、富士シリシア化学株式会社製PSQ−100B)、およびアセトニトリル(1ml)を加え、窒素を封入した後に80℃に加熱・24時間撹拌した。反応混合物を酢酸エチル(10ml)で希釈し、食塩を飽和させた0.4N水酸化ナトリウム水溶液(2ml)を加えて溶媒を減圧下で除去した。残渣にジクロロメタン(50ml)を加えて良く撹拌し、不溶分を濾別し、ジクロロメタン(50ml)で洗浄した。濾液と洗液とを併せて減圧下で濃縮し、得られた反応混合物の1H NMRスペクトルから、生成物の組成比を求めた。それぞれの実施例において、用いた触媒の種類及び量、並びに結果を表1に示す。なお、収率の合計が100にならないのは、水層に生成物が移動して回収できていない(塩基処理)か、又は一部がシリカゲルに吸着したままで回収できていない(単純濾過)ことが理由だと考えられる。1H NMRによる分析では、回収された生成物中にシクロヘキサノンオキシムとε−カプロラクタム以外のものは認められなかった。
(Examples 1-8)
A Beckmann rearrangement reaction represented by the following formula (2) was performed. Specifically, in a threaded test tube, cyclohexanone oxime (56.6 mg, 0.5 mmol), catalysts (A) to (C) (catalyst (C) is PSQ-100B manufactured by Fuji Silysia Chemical Ltd.), and Acetonitrile (1 ml) was added, nitrogen was sealed, and the mixture was heated to 80 ° C. and stirred for 24 hours. The reaction mixture was diluted with ethyl acetate (10 ml), 0.4N aqueous sodium hydroxide solution (2 ml) saturated with sodium chloride was added, and the solvent was removed under reduced pressure. Dichloromethane (50 ml) was added to the residue and stirred well. Insoluble matter was filtered off and washed with dichloromethane (50 ml). The filtrate and washings were combined and concentrated under reduced pressure, and the composition ratio of the product was determined from the 1 H NMR spectrum of the resulting reaction mixture. In each Example, the type and amount of the catalyst used, and the results are shown in Table 1. It should be noted that the total yield does not reach 100 because the product has moved to the aqueous layer and cannot be recovered (base treatment), or partly adsorbed on silica gel and cannot be recovered (simple filtration). This is thought to be the reason. In the analysis by 1 H NMR, nothing other than cyclohexanone oxime and ε-caprolactam was found in the recovered product.
(比較例1)
触媒(A)を用いなかったこと以外は実施例1と同様に反応を行い、生成物の組成比を求めた。結果を下記表1に示す。
(Comparative Example 1)
The reaction was carried out in the same manner as in Example 1 except that the catalyst (A) was not used, and the composition ratio of the product was determined. The results are shown in Table 1 below.
(比較例2)
触媒(A)を用いなかったこと以外は実施例2と同様に反応を行い、生成物の組成比を求めた。結果を下記表1に示す。
(Comparative Example 2)
The reaction was carried out in the same manner as in Example 2 except that the catalyst (A) was not used, and the composition ratio of the product was determined. The results are shown in Table 1 below.
(比較例3)
触媒(B)及び(C)を用いなかったこと以外は実施例1と同様に反応を行い、生成物の組成比を求めた。結果を下記表1に示す。
(Comparative Example 3)
The reaction was carried out in the same manner as in Example 1 except that the catalysts (B) and (C) were not used, and the composition ratio of the product was determined. The results are shown in Table 1 below.
上記表1より、触媒(A)を用いないとε−カプロラクタムが生成されないのに対し、触媒(A)乃至(C)を用いると良好な収率でε−カプロラクタムが得られることがわかる。また、実施例2と実施例6、実施例4と実施例7、実施例5と実施例8をそれぞれ比較すると、触媒(C)の増加ばかりでなく、触媒(B)の増加によってもε−カプロラクタムの収率が向上することがわかる。 From Table 1 above, it can be seen that ε-caprolactam cannot be produced unless the catalyst (A) is used, whereas ε-caprolactam can be obtained in good yield when the catalysts (A) to (C) are used. Moreover, when Example 2 and Example 6, Example 4 and Example 7, Example 5 and Example 8 are compared, respectively, not only the increase in the catalyst (C) but also the increase in the catalyst (B), ε− It can be seen that the yield of caprolactam is improved.
(実施例9〜10)
触媒(B)の種類を下記表2に示すように変えたこと以外は実施例1と同様に反応を行い、生成物の組成比を求めた。結果を下記表2に示す。
(Examples 9 to 10)
The reaction was carried out in the same manner as in Example 1 except that the type of catalyst (B) was changed as shown in Table 2 below, and the composition ratio of the product was determined. The results are shown in Table 2 below.
(比較例4)
触媒(A)を用いなかったこと以外は実施例9と同様に反応を行い、生成物の組成比を求めた。結果を下記表2に示す。
(Comparative Example 4)
The reaction was carried out in the same manner as in Example 9 except that the catalyst (A) was not used, and the composition ratio of the product was determined. The results are shown in Table 2 below.
(比較例5)
触媒(A)を用いなかったこと以外は実施例10と同様に反応を行い、生成物の組成比を求めた。結果を下記表2に示す。
(Comparative Example 5)
The reaction was carried out in the same manner as in Example 10 except that the catalyst (A) was not used, and the composition ratio of the product was determined. The results are shown in Table 2 below.
上記表2より、触媒(A)を用いないとε−カプロラクタムの収率は12%未満であるのに対し、触媒(A)乃至(C)を用いると80%以上の良好な収率でε−カプロラクタムが得られることがわかる。 From Table 2 above, the yield of ε-caprolactam is less than 12% when the catalyst (A) is not used, whereas the yield of ε-caprolactam is as high as 80% or more when the catalysts (A) to (C) are used. -It can be seen that caprolactam is obtained.
(実施例11〜14)
触媒(B)の種類及び反応温度を下記表3に示すように変えたこと以外は実施例1と同様に反応を行い、生成物の組成比を求めた。結果を下記表3に示す。
(Examples 11-14)
The reaction was performed in the same manner as in Example 1 except that the type of catalyst (B) and the reaction temperature were changed as shown in Table 3 below, and the composition ratio of the product was determined. The results are shown in Table 3 below.
上記表3より、反応温度を変えても、触媒(A)乃至(C)を用いると良好な収率でε−カプロラクタムが得られることがわかる。 From Table 3 above, it can be seen that ε-caprolactam can be obtained in good yield when the catalysts (A) to (C) are used even if the reaction temperature is changed.
(実施例15〜18)
ネジ付き試験管に、シクロヘキサノンオキシム(56.6mg,0.5mmol)、触媒(A)乃至(C)、およびアセトニトリル(1ml)を加え、窒素を封入した後に80℃に加熱・3時間撹拌した。反応混合物を酢酸エチル(10ml)で希釈し、食塩を飽和させた0.4N水酸化ナトリウム水溶液(2ml)を加えて溶媒を減圧下で除去した。残渣にジクロロメタン(50ml)を加えて良く撹拌し、不溶分を濾別し、ジクロロメタン(50ml)で洗浄した。濾液と洗液とを併せて減圧下で濃縮し、得られた反応混合物の1H NMRスペクトルから、生成物の組成比を求めた。それぞれの実施例において、用いた触媒の種類及び量、並びに結果を表4に示す。
(Examples 15 to 18)
Cyclohexanone oxime (56.6 mg, 0.5 mmol), catalysts (A) to (C), and acetonitrile (1 ml) were added to a threaded test tube, nitrogen was sealed, and the mixture was heated to 80 ° C. and stirred for 3 hours. The reaction mixture was diluted with ethyl acetate (10 ml), 0.4N aqueous sodium hydroxide solution (2 ml) saturated with sodium chloride was added, and the solvent was removed under reduced pressure. Dichloromethane (50 ml) was added to the residue and stirred well. Insoluble matter was filtered off and washed with dichloromethane (50 ml). The filtrate and washings were combined and concentrated under reduced pressure, and the composition ratio of the product was determined from the 1 H NMR spectrum of the resulting reaction mixture. Table 4 shows the types and amounts of the catalysts used and the results in each example.
上記表4より、触媒(B)としてナトリウム塩を用いた場合でも、触媒(A)乃至(C)を用いると良好な収率でε−カプロラクタムが得られることがわかる。 From Table 4 above, it can be seen that, even when a sodium salt is used as the catalyst (B), ε-caprolactam can be obtained in good yield when the catalysts (A) to (C) are used.
(実施例19〜21)
触媒(B)の種類を下記表5に示すように変えたこと以外は実施例1と同様に反応を行い、生成物の組成比を求めた。結果を下記表5に示す。
(Examples 19 to 21)
The reaction was carried out in the same manner as in Example 1 except that the type of the catalyst (B) was changed as shown in Table 5 below, and the composition ratio of the product was determined. The results are shown in Table 5 below.
上記表5より、触媒(A)としてニッケル塩を用いた場合でも、触媒(A)乃至(C)を用いると良好な収率でε−カプロラクタムが得られることがわかる。 From Table 5 above, it can be seen that even when a nickel salt is used as the catalyst (A), ε-caprolactam can be obtained in a good yield when the catalysts (A) to (C) are used.
(実施例22〜23)
ネジ付き試験管に、シクロヘキサノンオキシム(56.6mg,0.5mmol)、触媒(A)乃至(C)、およびアセトニトリル(1ml)を加え、窒素を封入した後に80℃に加熱・24時間撹拌した。反応混合物を酢酸エチル(10ml)で希釈し、不溶分を濾別した後に減圧下で濃縮し、得られた反応混合物の1H NMRスペクトルから、生成物の組成比を求めた。それぞれの実施例において、用いた触媒の種類及び量、並びに結果を表6に示す。
(Examples 22 to 23)
Cyclohexanone oxime (56.6 mg, 0.5 mmol), catalysts (A) to (C), and acetonitrile (1 ml) were added to a threaded test tube, and nitrogen was sealed, followed by heating to 80 ° C. and stirring for 24 hours. The reaction mixture was diluted with ethyl acetate (10 ml), insolubles were filtered off and concentrated under reduced pressure, and the composition ratio of the product was determined from the 1 H NMR spectrum of the resulting reaction mixture. Table 6 shows the type and amount of the catalyst used and the results in each example.
上記表6より、触媒(A)乃至(C)を用いると、反応後に塩基洗浄(塩基処理)をすることなく、単に濾過のみでも良好な収率でε−カプロラクタムが得られることがわかる。 From Table 6 above, it can be seen that, when the catalysts (A) to (C) are used, ε-caprolactam can be obtained in a good yield even by simple filtration without base washing (base treatment) after the reaction.
Claims (2)
(A)コバルト塩及びニッケル塩のうちいずれか1以上、(B)マグネシウム塩及びナトリウム塩のうちいずれか1以上、並びに(C)シリカゲルから構成される触媒の存在下でベックマン転位反応させることを含み、
前記触媒の(A)成分が、テトラフルオロホウ酸コバルト六水和物及びテトラフルオロホウ酸ニッケル六水和物のうちいずれか1以上であり、
前記触媒の(B)成分が、硫酸マグネシウム、塩化マグネシウム、硝酸マグネシウム六水和物、硫酸水素ナトリウム、硫酸ナトリウム、炭酸水素ナトリウム及び炭酸ナトリウムのうちいずれか1以上である
ことを特徴とするアミド化合物の製造方法。 In a method for producing an amide compound by subjecting an oxime compound to a Beckmann rearrangement reaction,
(A) Any one or more of cobalt salt and nickel salt, (B) Any one or more of magnesium salt and sodium salt, and (C) Beckmann rearrangement reaction in the presence of a catalyst composed of silica gel. Including
(A) component of the catalyst is any one or more of cobalt tetrafluoroborate hexahydrate and nickel tetrafluoroborate hexahydrate,
The component (B) of the catalyst is any one or more of magnesium sulfate, magnesium chloride, magnesium nitrate hexahydrate, sodium hydrogen sulfate, sodium sulfate, sodium hydrogen carbonate and sodium carbonate.
Method for producing an amide compound characterized by.
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