JP6565158B2 - Coloring composition, filter segment for color filter, and color filter - Google Patents

Description

  The present invention relates to a coloring composition, a color filter filter segment, and a color filter used in a method for producing a filter segment for an etching color filter used for a color liquid crystal display device, a color image pickup tube element, and the like.

In the liquid crystal display device, a liquid crystal material and a pixel are interposed between two polarizing plates, a voltage is applied to each pixel to change the alignment state of the liquid crystal material, and the degree of polarization of light passing through the first polarizing plate is changed. It is a display device that changes and controls the transmitted light passing through the second polarizing plate to display the screen.
By providing a color filter between the two polarizing plates, color display becomes possible, and it has come to be used for televisions, personal computers, monitors and the like.

  The color filter is provided with a grid-like light-shielding film black matrix (hereinafter referred to as BM) for the purpose of preventing color mixture of transmitted light and increasing display contrast on a transparent substrate such as a glass plate, and then a plurality of colors (usually red, Green and blue) filter segments are provided. The filter segments are as fine as several microns to several hundreds of microns, and the filter segments are arranged in the form of fine bands (stripes) of two or more different hues (stripe arrangement), or are arranged vertically and horizontally. (Delta arrangement) etc. The filter segment and the BM are formed by drying at a high temperature of generally 200 ° C. or higher, preferably 230 ° C. by applying a coloring composition.

  In a color liquid crystal display device, a transparent electrode for driving a liquid crystal is formed on a color filter by vapor deposition or sputtering, and an alignment film for aligning the liquid crystal in a certain direction is formed thereon. In order to sufficiently obtain the performance of these transparent electrodes and alignment films, the formation thereof must generally be performed at a high temperature of 200 ° C. or higher, preferably 230 ° C. or higher. For this reason, at present, as a method for producing a color filter, a method called a pigment dispersion method using a pigment having excellent light resistance and heat resistance as a colorant is mainly used.

  Further, as a patterning method, a negative photosensitive coloring composition or a positive photosensitive coloring composition is used, and a photomask having a predetermined pattern by various radiations such as ultraviolet rays, far ultraviolet rays, electron beams, and X-rays. The resist is exposed to a photo resist and baked as necessary. Thereafter, unnecessary portions are developed and removed, and the baking process is repeated. A photolithography method or a positive resist on a non-photosensitive coloring composition. Etching methods, etc. are known in which a photolithographic process is used, and after etching, a positive resist is peeled off to obtain a filter segment.

  In order to improve the color reproduction characteristics of color filters and the light-shielding property of black matrix, which are required in recent years, it is necessary to increase the content of the colorant in the photosensitive coloring composition or to increase the film thickness. . However, in such a method using a negative photosensitive coloring composition or a positive photosensitive coloring composition, sensitivity reduction, developability, and resolution are deteriorated in a method of increasing the content of the colorant. In the method of increasing the film thickness, the exposure light does not reach the bottom of the film and the pattern shape becomes defective.

  In addition, when a photopolymerization initiator is used for photolithographic processing by photocuring, coloring due to a color unique to the photopolymerization initiator, a decrease in heat resistance, a decrease in light transmittance, a decrease in resolution, and the like may occur. On the other hand, since patterning by etching is not easily affected by photocuring, it is possible to form a filter segment with an excellent pattern shape even when the colorant content is high or the film thickness is large. .

However, in the etching method, a step of applying a positive resist on the colored layer is necessary, and resistance to the positive resist is necessary. Therefore, as a resin of the coloring composition conventionally used in such an etching method, It was necessary to use a resin such as polyimide made of polyamic acid as a raw material (for example, Patent Documents 1 to 3).
On the other hand, in order to respond to the recent demands for high brightness and high contrast ratio, if an attempt is made to perform patterning by an etching method with a coloring composition using an acrylic resin having excellent transparency, resistance to a positive resist is not good. It was sufficient that the colored layer was eluted into the positive resist, causing a change in hue. In addition, the etching property is poor, the etching time is extremely slow, and it takes a long time for etching, or the etching time is extremely fast, resulting in poor patterning accuracy. Further, unlike the negative photosensitive coloring composition, there is no step of curing the coating film by exposure, so that there is a problem that the heat resistance and chemical resistance of the filter segment are poor.

JP 2000-136253 A JP 2003-121633 A JP 2009-051891 A

  An object of the present invention is to provide a colored composition that does not elute into a positive resist and has good etching properties even in a positive resist etching method using a colored composition containing an acrylic resin. And In addition, it is possible to make high-quality color filter filter segments with excellent heat resistance and chemical resistance, and color filters that can be suitably used in the field of electronic materials that require high-precision processing. The purpose is to provide.

  As a result of intensive studies, the present inventors have found that the above-described problems can be solved by using a specific acrylic resin as the coloring composition in the positive resist etching method, and have reached the present invention.

  That is, the present invention includes a step (i) of forming a coating film on a substrate using a coloring composition containing a colorant [A], an acrylic resin [B], and an organic solvent, and a positive resist [C]. On the coating film, exposing and patterning by etching, and removing the positive resist [C] remaining after the step (ii) with a peeling solvent [D] (iii) It is a coloring composition used for the manufacturing method of the filter segment for color filters, Comprising: The acrylic resin [B] contains acrylic resin (B1) whose glass transition temperature (Tg) is 40-160 degreeC, It is characterized by the above-mentioned. The present invention relates to a coloring composition.

  Moreover, this invention relates to the said coloring composition characterized by the acrylic resin (B1) containing 5 to 35 weight% of structural units which have a carboxyl group on the basis of the weight of all the structural units of resin.

  The present invention also relates to the colored composition, wherein the structural unit having an aromatic ring of the acrylic resin (B1) is 20% by weight or less based on the weight of all the structural units of the resin.

  In addition, the present invention relates to the colored composition, wherein the acrylic resin (B1) contains 2 to 30% by weight of a structural unit having a hydroxyl group based on the weight of all the structural units of the resin.

  Moreover, this invention relates to the filter segment for color filters formed using the said coloring composition.

  The present invention also relates to a color filter including the filter segment.

  Moreover, this invention is the coloring containing the coloring agent [A] on the base material, acrylic resin [B] containing acrylic resin (B1) whose glass transition temperature (Tg) is 40-160 degreeC, and the organic solvent. A step (i) of forming a coating film using the composition, a step (ii) of applying and exposing a positive resist [C] on the coating film, patterning by etching, and a step of using a peeling solvent [D] And (ii) a step (iii) of peeling off the remaining positive resist [C].

  By using the colored composition of the present invention, even in a positive resist etching method using a colored composition using an acrylic resin, the colored layer does not elute during the positive resist coating, and the etching property is also good. A colored composition can be provided. In addition, it is possible to provide a filter segment for a color filter having excellent heat resistance and chemical resistance.

Hereinafter, the present invention will be described in detail.
Note that “CI” in this specification means a color index (CI).
Further, in the present application, when expressed as “(meth) acrylate”, “(meth) acrylic acid”, or “(meth) acrylamide”, unless otherwise specified, “acrylate and / or methacrylate”, It shall represent “acrylic acid and / or methacrylic acid” or “acrylamide and / or methacrylamide”.

"Coloring composition"
The coloring composition of the present invention includes a colorant [A], an acrylic resin [B] containing an acrylic resin (B1) having a glass transition temperature (Tg) of 40 to 160 ° C., and an organic solvent. By using the acrylic resin [B], it is possible to obtain a filter segment with excellent brightness as compared to the case of using polyimide made of polyamic acid or the like as a raw material, and by containing the acrylic resin (B1), a positive type The colored layer does not elute at the time of resist coating, and it becomes possible to obtain a colored composition having good etching properties.

<Colorant [A]>
The coloring composition of the present invention includes, as the colorant [A], pigments such as inorganic pigments and organic pigments, oil-soluble dyes, acid dyes, direct dyes, basic dyes, mordant dyes, dyes such as acid mordant dyes, In the case where the dye is used after being raked, a form such as a salt-forming compound of the dye and the nitrogen-containing compound can be used. Of these, pigments having high color developability and high heat resistance are preferred, and organic pigments are usually used.
These colorants can be used singly or as a mixture of two or more at any ratio as required.

The content of the colorant [A] is preferably 5% by weight or more and less than 20% by weight in 100% by weight of the colored composition. When the content is in this range, it is preferable for expanding the color reproduction region.
The content of the colorant is preferably 5% by weight or more and less than 60% by weight in 100% by weight of the total solid content of the colored composition. According to the method for producing a positive etching resist of the present invention, a filter segment having excellent color reproduction characteristics and excellent pattern shape as well as brightness and contrast ratio can be obtained even when the colorant concentration is high.

  Examples of organic pigments include diketopyrrolopyrrole pigments, azo pigments such as azo, disazo, and polyazo, phthalocyanine pigments such as copper phthalocyanine, aluminum phthalocyanine, copper halide phthalocyanine, and metal-free phthalocyanine, aminoanthraquinone, diaminodianthraquinone, Anthrapyrimidine, flavantron, anthanthrone, indanthrone, pyranthrone, violanthrone and other anthraquinone pigments, quinacridone pigments, dioxazine pigments, perinone pigments, perylene pigments, thioindigo pigments, isoindoline pigments, isoindolinone pigments Examples thereof include pigments, quinophthalone pigments, selenium pigments, and metal complex pigments.

Examples of red pigments that can be used include C.I. I. Pigment Red 1, 2, 3, 4, 5, 6, 7, 8, 9, 12, 14, 15, 16, 17, 21, 22, 23, 31, 32, 37, 38, 41, 47, 48, 48: 1, 48: 2, 48: 3, 48: 4, 49, 49: 1, 49: 2, 50: 1, 52: 1, 52: 2, 53, 53: 1, 53: 2, 53: 3, 57, 57: 1, 57: 2, 58: 4, 60, 63, 63: 1, 63: 2, 64, 64: 1, 68, 69, 81, 81: 1, 81: 2, 81: 3, 81: 4, 83, 88, 90: 1, 101, 101: 1, 104, 108, 108: 1, 109, 112, 113, 114, 122, 123, 144, 146, 147, 149, 151 166, 168, 169, 170, 172, 173, 174, 175, 176, 177, 178, 17 9, 181, 184, 185, 187, 188, 190, 193, 194, 200, 202, 206, 207, 208, 209, 210, 214, 216, 220, 221, 224, 230, 231, 232, 233, 235, 236, 237, 238, 239, 242, 243, 245, 247, 249, 250, 251, 253, 254, 255, 256, 257, 258, 259, 260, 262, 263, 264, 265, 266, 267, 268, 269, 270, 271, 272, 273, 274, 275, 276, and the like.
Examples of orange pigments that can be used include C.I. I. Orange pigments such as CI Pigment Orange 36, 38, 43, 51, 55, 59, 61 can be used.
Among these, from the viewpoint of obtaining a high contrast ratio and high brightness, C.I. I. Pigment red 254, C.I. I. Pigment red 177, or C.I. I. It is particularly preferable to use Pigment Red 242.

  Examples of green pigments that can be used include C.I. I. Pigment green 1, 2, 4, 7, 8, 10, 13, 14, 15, 17, 18, 19, 26, 36, 45, 48, 50, 51, 54, 55 or 58. Among these, from the viewpoint of obtaining a high contrast ratio and high brightness, C.I. I. Pigment Green 7, 36 or 58.

  Examples of blue pigments that can be used include C.I. I. Pigment Blue 1, 1: 2, 9, 14, 15, 15: 1, 15: 2, 15: 3, 15: 4, 15: 6, 16, 17, 19, 25, 27, 28, 29, 33, 35, 36, 56, 56: 1, 60, 61, 61: 1, 62, 63, 66, 67, 68, 71, 72, 73, 74, 75, 76, 78, 79 and the like. Among these, from the viewpoint of obtaining a high contrast ratio and high brightness, C.I. I. Pigment Blue 15, 15: 1, 15: 2, 15: 3, 15: 4, or 15: 6, and more preferably C.I. I. Pigment Blue 15: 6.

  Examples of yellow pigments that can be used include C.I. I. Pigment Yellow 1, 1: 1, 2, 3, 4, 5, 6, 9, 10, 12, 13, 14, 16, 17, 24, 31, 32, 34, 35, 35: 1, 36, 36: 1, 37, 37: 1, 40, 41, 42, 43, 48, 53, 55, 61, 62, 62: 1, 63, 65, 73, 74, 75, 81, 83, 87, 93, 94, 95, 97, 100, 101, 104, 105, 108, 109, 110, 111, 116, 117, 119, 120, 126, 127, 127: 1, 128, 129, 133, 134, 136, 138, 139, 142, 147, 148, 150, 151, 153, 154, 155, 157, 158, 159, 160, 161, 162, 163, 164, 165, 166, 167, 168, 169, 170, 172, 17 174, 175, 176, 180, 181, 182, 183, 184, 185, 188, 189, 190, 191, 191: 1, 192, 193, 194, 195, 196, 197, 198, 199, 200, 202 , 203, 204, 205, 206, 207, 208, and the like. Among these, from the viewpoint of obtaining a high contrast ratio and high brightness, C.I. I. Pigment Yellow 83, 117, 129, 138, 139, 150, 154, 155, 180, or 185, more preferably C.I. I. Pigment yellow 83, 138, 139, 150, or 180.

  Examples of purple pigments that can be used include C.I. I. Pigment Violet 1, 1: 1, 2, 2: 2, 3, 3: 1, 3: 3, 5, 5: 1, 14, 15, 16, 19, 23, 25, 27, 29, 31, 32, 37, 39, 42, 44, 47, 49, 50 and the like. Among these, from the viewpoint of obtaining a high contrast ratio and high brightness, C.I. I. Pigment violet 19 or 23, more preferably C.I. I. Pigment Violet 23.

<Refining pigments>
The pigment used in the colored composition of the present invention is preferably used after being refined. There are no particular limitations on the method of miniaturization. For example, any of wet grinding, dry grinding, and dissolution precipitation can be used. As exemplified in the present invention, salt milling treatment by a kneader method, which is one type of wet grinding. Etc. can be made finer. It is preferable that the average primary particle diameter calculated | required by TEM (transmission electron microscope) of a pigment is the range of 5-90 nm. When the thickness is smaller than 5 nm, dispersion in an organic solvent becomes difficult. When the thickness is larger than 90 nm, a sufficient contrast ratio cannot be obtained. For these reasons, a more preferable average primary particle size is in the range of 10 to 70 nm.

  Salt milling is a process in which a mixture of pigment, water-soluble inorganic salt and water-soluble organic solvent is heated using a kneader such as a kneader, two-roll mill, three-roll mill, ball mill, attritor, or sand mill. After kneading, the water-soluble inorganic salt and the water-soluble organic solvent are removed by washing with water. The water-soluble inorganic salt serves as a crushing aid, and the pigment is crushed using the high hardness of the inorganic salt during salt milling. By optimizing the conditions for salt milling the pigment, it is possible to obtain a pigment having a sharp particle size distribution with a very fine primary particle diameter and a wide distribution range.

  As the water-soluble inorganic salt, sodium chloride, barium chloride, potassium chloride, sodium sulfate and the like can be used, but sodium chloride (salt) is preferably used from the viewpoint of cost. The water-soluble inorganic salt is preferably used in an amount of 50 to 2000 parts by weight, and most preferably 300 to 1000 parts by weight with respect to 100 parts by weight of the pigment, from the viewpoint of both processing efficiency and production efficiency.

  The water-soluble organic solvent functions to wet the pigment and the water-soluble inorganic salt, and is not particularly limited as long as it dissolves (mixes) in water and does not substantially dissolve the inorganic salt to be used. However, a high boiling point solvent having a boiling point of 120 ° C. or higher is preferable from the viewpoint of safety because the temperature rises during salt milling and the solvent is easily evaporated. For example, 2-methoxyethanol, 2-butoxyethanol, 2- (isopentyloxy) ethanol, 2- (hexyloxy) ethanol, diethylene glycol, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, triethylene glycol, triethylene glycol monomethyl ether, Liquid polyethylene glycol, 1-methoxy-2-propanol, 1-ethoxy-2-propanol, dipropylene glycol, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, liquid polypropylene glycol and the like are used. The water-soluble organic solvent is preferably used in an amount of 5 to 1000 parts by weight, and most preferably 50 to 500 parts by weight, based on 100 parts by weight of the pigment.

  When the salt is milled, a resin may be added as necessary. The type of resin used is not particularly limited, and natural resins, modified natural resins, synthetic resins, synthetic resins modified with natural resins, and the like can be used. The resin used is solid at room temperature, preferably insoluble in water, and more preferably partially soluble in the organic solvent. The amount of the resin used is preferably in the range of 5 to 200 parts by weight with respect to 100 parts by weight of the pigment.

<Acrylic resin [B]>
The acrylic resin [B] used in the present invention is characterized by containing an acrylic resin (B1) having a glass transition temperature (Tg) of 40 to 160 ° C.
Since the acrylic resin [B] has high colorlessness, a filter segment with high brightness can be obtained. For this reason, the acrylic resin [B] preferably has a spectral transmittance of 80% or more, more preferably 95% or more in the entire wavelength region of 400 to 700 nm in the visible light region.
The colored composition of the present invention may be used in combination with an acrylic resin other than the acrylic resin (B1) as long as the effects of the present invention are not impaired.

In addition, the glass transition temperature in this invention has shown the value computed by the following Fox formula from Tg of each homopolymer to copolymerize.
Fox formula 1 / Tg = W1 / Tg1 + W2 / Tg2 +... + Wn / Tgn
W1 to Wn represent the weight fraction of the monomer used, and Tg1 to Tgn represent the glass transition temperature of the monomer homopolymer (unit is absolute temperature “K”).
Tg (glass transition temperature) of the homopolymer of the main monomer used for calculation is illustrated below.

Methacrylic acid (MAA): 130 ° C
Methyl methacrylate (MMA): 105 ° C
Butyl acrylate (BA): -54 ° C
Butyl methacrylate (BMA): 20 ° C
2-hydroxyethyl methacrylate (HEMA): 55 ° C.
4-hydroxybutyl acrylate (4HBA): -80 ° C
Benzyl acrylate (BzA): 0 ° C
Benzyl methacrylate (BzMA): 55 ° C
Biscote # 315 (manufactured by Osaka Organic Chemical Industry): 35 ° C
Styrene (St): 100 ° C
Paracumylphenoxyethyl acrylate (M110): 35 ° C
2-ethylhexyl methacrylate (2-EHMA): -10 ° C
Dicyclopentanyl methacrylate (FA-513M) (Hitachi Chemical Co., Ltd.): 175 ° C
Phenylmaleimide (PhMA): 165 ° C
Glycidyl methacrylate (GMA): 41 ° C
Cyclohexyl methacrylate (CHMA): 66 ° C
Methoxymethyl acrylate (2-MTA): -50 ° C

<< Acrylic resin (B1) >>
The acrylic resin (B1) is an acrylic resin having a glass transition temperature (Tg) of 40 to 160 ° C. By using such a resin, when the positive resist is applied to the colored layer, the colored layer is positive. It is possible to produce a filter segment for a color filter that does not elute into the mold resist and has good etching properties.
The glass transition temperature (Tg) of the acrylic resin (B1) is more preferably 70 to 140 ° C. from the viewpoint of preventing the colored layer from eluting into the positive resist and the etching property, and more preferably, 90-120 ° C.
When the temperature is 70 ° C. or higher, the effect of preventing elution into the positive resist is increased. When the temperature is 140 ° C. or lower, the etching time is in a sufficient range, and the etching property is excellent. .

  Further, by including such an acrylic resin (B1), the dispersion stability of the colored composition of the present invention becomes better, and when a colored pixel layer of a color filter is formed using the colored composition, pigment aggregation It is possible to obtain a filter segment with few things, good etching properties and a good pattern shape.

  The acrylic resin (B1) is preferably used in an amount of 20 parts by weight or more with respect to 100 parts by weight of the colorant [A] because the film formability and various resistances are good, and the colorant concentration is high and good. Since color characteristics can be expressed, it is preferably used in an amount of 1000 parts by weight or less.

  The acrylic resin (B1) preferably has a weight average molecular weight of 5000 to 50000. More preferably, the weight average molecular weight is 10,000 to 40,000. When the weight average molecular weight is 5000 or more, the film forming property of the coating film of the colorant dispersion is good, and the development margin is sufficient. On the other hand, when the weight average molecular weight is 50000 or less, the colorant dispersion can be excellent in fluidity.

  Here, the weight average molecular weight (Mw) is a molecular weight in terms of polystyrene in gel permeation chromatography (GPC) measurement.

  The acrylic resin (B1) has 5 to 35% by weight of the structural unit having a carboxyl group, 2 to 30% by weight of the structural unit having a hydroxyl group, and an aromatic group based on the weight of all the structural units of the resin. It is preferable to contain 0 to 20% by weight of structural units and 15 to 93% by weight of other structural units.

  Specifically, based on the weight of all the structural units of the resin, from the viewpoint of etching properties, the structural unit having a carboxyl group is 5 to 35% by weight, more preferably 10 to 30% by weight, and still more preferably 15 to 25%. It is preferably contained by weight, and from the viewpoint of chemical resistance, it is preferred that the structural unit having a hydroxyl group is contained in an amount of 2 to 30% by weight, more preferably 5 to 20% by weight, still more preferably 8 to 15% by weight, From the viewpoint of chemical resistance, the structural unit having an aromatic group is preferably 20% by weight or less, more preferably 15% by weight or less, and still more preferably 10% by weight or less.

  Below, the ethylenically unsaturated monomer (b1) which has a carboxyl group which is a precursor of the structural unit which comprises an acrylic resin (B1), the ethylenically unsaturated monomer (b2) which has a hydroxyl group, an aromatic group The ethylenically unsaturated monomer (b3) having other and the other ethylenically unsaturated monomer (b4) will be described in order. In the present specification, the weight percentage of each constituent unit is the weight percentage of the precursor that brings each constituent unit to the resin.

(Ethylenically unsaturated monomer having carboxyl group (b1))
The acrylic resin (B1) preferably contains an ethylenically unsaturated monomer (b1) having a carboxyl group. By containing the ethylenically unsaturated monomer (b1), etching with an alkaline etching solution becomes possible.

The ethylenically unsaturated monomer (b1) having a carboxyl group is not particularly limited as long as it is a monomer having a carboxyl group and an ethylenically unsaturated group, and examples thereof include (meth) acrylic acid and (meth) acrylic. Acid dimer, itaconic acid, maleic acid, fumaric acid, crotonic acid, 2- (meth) acryloyloxyethyl phthalate, 2- (meth) acryloyloxypropyl phthalate, 2- (meth) acryloyloxyethyl hexahydrophthalate, Examples include 2- (meth) acryloyloxypropyl hexahydrophthalate, β-carboxyethyl (meth) acrylate, and ω-carboxypolycaprolactone (meth) acrylate.
These ethylenically unsaturated monomers (b1) having a carboxyl group can be used alone or in admixture of two or more at any ratio as required.

  Preferably, it is (meth) acrylic acid from the point of etchability.

The content of the ethylenically unsaturated monomer (b1) having a carboxyl group is 5 to 5 based on the weight (100% by weight) of the total ethylenically unsaturated monomer in the precursor of the acrylic resin (B1). 35 weight% is preferable, More preferably, it is 10-30 weight%, More preferably, it is 15-25 weight%.
By being 5 weight% or more, an etching time can be shortened and it can be excellent in etching property. Further, it is preferable that the content is 35% by weight or less because patterning property can be controlled.

(Ethylenically unsaturated monomer having a hydroxyl group (b2))
By containing the structural unit having a hydroxyl group, the chemical resistance can be improved.

Examples of the unsaturated ethylenic monomer having a hydroxyl group include 2-hydroxyethyl (meth) acrylate, 2- or 3-hydroxypropyl (meth) acrylate, 2- or 3- or 4-hydroxybutyl (meth) acrylate, and glycerol Examples thereof include hydroxyalkyl (meth) acrylates such as (meth) acrylate or cyclohexanedimethanol mono (meth) acrylate, and these may be used alone or in combination of two or more. Further, polyether mono (meth) acrylate obtained by addition polymerization of ethylene oxide, propylene oxide, and / or butylene oxide to the above hydroxyalkyl (meth) acrylate, (poly) γ-valerolactone, (poly) ε-caprolactone And / or (poly) ester mono (meth) acrylate added with (poly) 12-hydroxystearic acid and the like.
These unsaturated ethylenic monomers (b2) having a hydroxyl group can be used alone or in admixture of two or more at any ratio as required.

  Preferably, it is 2-hydroxyethyl (meth) acrylate in terms of chemical resistance.

The content of the ethylenically unsaturated monomer (b2) having a hydroxyl group is based on the weight of all ethylenically unsaturated monomers in the precursor of the acrylic resin (B1) in terms of chemical resistance (100 wt. %) Is preferably 2 to 30% by weight, more preferably 5 to 20% by weight, still more preferably 8 to 15% by weight.
When it is 2% by weight or more, chemical resistance can be improved, and when it is 30% by weight or less, heat resistance is not deteriorated, which is preferable.

(Ethylenically unsaturated monomer having an aromatic group (b3))
When a large amount of the structural unit having an aromatic group is contained, it is easy to elute into the positive resist even if the Tg of the acrylic resin (B1) is in the range of 40 to 160 ° C.

The ethylenically unsaturated monomer (b3) having an aromatic group is not particularly limited as long as it is a monomer having an aromatic group and an ethylenically unsaturated group, and examples thereof include benzyl (meth) acrylate and phenoxyethyl. (Meth) acrylate, styrene, α-methylstyrene and the like can be mentioned.
These ethylenically unsaturated monomers (b3) having an aromatic group can be used alone or in admixture of two or more at any ratio as required.

  The content of the ethylenically unsaturated monomer (b3) having an aromatic group is the weight of the total ethylenically unsaturated monomer in the precursor of the acrylic resin (B1) in that elution of the positive resist is suppressed. Is preferably 20% by weight or less, more preferably 15% by weight or less, and still more preferably 10% by weight or less. The ethylenically unsaturated monomer (b3) having an aromatic group may not be contained.

(Other ethylenically unsaturated monomer (b4))
The other ethylenically unsaturated monomer (b4) is not particularly limited as long as it has an ethylenically unsaturated group. For example, methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate , Isopropyl (meth) acrylate, butyl (meth) acrylate, isobutyl (meth), tertiary butyl (meth) acrylate, isoamyl (meth) acrylate, octyl (meth) acrylate, isooctyl (meth) acrylate, 2-ethylhexyl (meth) Acrylate, cetyl (meth) acrylate, decyl (meth) acrylate, isodecyl (meth) acrylate, lauryl (meth) acrylate, tridecyl (meth) acrylate, isomyristyl (meth) acrylate, stearyl (meth) acrylate And isostearyl (meth) linear or branched alkyl acrylates such as (meth) acrylates;
Cyclic alkyl (meth) acrylates such as cyclohexyl (meth) acrylate, tertiarybutylcyclohexyl (meth) acrylate, dicyclopentanyl (meth) acrylate, dicyclopentenyl (meth) acrylate, and isobornyl (meth) acrylate;
(Meth) acrylates having a heterocyclic ring such as tetrahydrofurfuryl (meth) acrylate, 3-methyl-3-oxetanyl (meth) acrylate, and glycidyl (meth) acrylate;
Fluoroalkyl (meth) acrylates such as trifluoroethyl (meth) acrylate, octafluoropentyl (meth) acrylate, perfluorooctylethyl (meth) acrylate, and tetrafluoropropyl (meth) acrylate;
(Meth) acryloxy-modified polydimethylsiloxanes (silicone macromers);
Tertiary amino such as N, N-dimethylaminoethyl (meth) acrylate, N, N-diethylaminoethyl (meth) acrylate, N, N-dimethylaminopropyl (meth) acrylate, N, N-diethylaminopropyl (meth) acrylate, etc. (Meth) acrylates having a group;
(Meth) acrylates having an ether bond such as methoxymethyl (meth) acrylate and methoxyethyl (meth) acrylate;
N-substituted (meth) acrylamides such as (meth) acrylamide, dimethyl (meth) acrylamide, N, N-diethyl (meth) acrylamide, N-isopropyl (meth) acrylamide, diacetone (meth) acrylamide, and acryloylmorpholine; In addition, nitriles such as (meth) acrylonitrile are exemplified.
Vinyl ethers such as ethyl vinyl ether, n-propyl vinyl ether, isopropyl vinyl ether, n-butyl vinyl ether, and isobutyl vinyl ether;
In addition, fatty acid vinyls such as vinyl acetate and vinyl propionate can also be used.
These other ethylenically unsaturated monomers (b4) can be used alone or in admixture of two or more at any ratio as required.

  Preferably, it is methyl (meth) acrylate from the viewpoint of suppressing elution into the positive resist.

  The content of other ethylenically unsaturated monomers (b4) is 15 to 93 weights based on the weight (100% by weight) of all ethylenically unsaturated monomers in the precursor of the acrylic resin (B1). % Is preferable, more preferably 30 to 80% by weight, still more preferably 40 to 70% by weight.

<Other resins>
The coloring composition of the present invention may further contain other resins. The other resin is preferably a resin having a transmittance of preferably 80% or more, more preferably 95% or more in the entire wavelength region of 400 to 700 nm in the visible light region. Other resins include thermoplastic resins, thermosetting resins, and photosensitive resins, and these can be used alone or in admixture of two or more.

  Examples of the thermoplastic resin include butyral resin, styrene-maleic acid copolymer, chlorinated polyethylene, chlorinated polypropylene, polyvinyl resin, polyvinyl chloride resin, polyvinylidene chloride resin, vinyl chloride-vinyl acetate copolymer, poly Vinyl acetate, polyurethane resin, polyester resin, methacrylic resin, alkyd resin, polystyrene resin, silicone resin, fluorine resin, polyamide resin, rubber resin, cyclized rubber resin, chlorinated rubber, oxidized rubber, hydrochloric acid rubber, celluloses , Polyethylene (HDPE, LDPE), polybutadiene, polyimide resin, petroleum resin, casein, shellac, nitrocellulose, cellulose acetate butyrate and the like, but are not necessarily limited thereto.

  Examples of thermosetting resins include epoxy resins, benzoguanamine resins, melamine resins, rosin modified maleic resins, rosin modified fumaric resins, rosin modified maleic resins, rosin modified phenol resins, urea resins, amino resins, phenol resins, Saturated polyester resins, drying oils, synthetic drying oils and the like can be mentioned, but are not necessarily limited thereto. They can also be used in combination as a thermal crosslinking agent for the thermoplastic resin.

  Moreover, a hardening | curing agent, a hardening accelerator, etc. may be included as needed. As the curing agent, amine compounds, acid anhydrides, active esters, carboxylic acid compounds, sulfonic acid compounds and the like are effective, but are not particularly limited, and can react with thermosetting compounds. Any curing agent may be used as long as it is. Examples of the curing accelerator include amine compounds (for example, dicyandiamide, benzyldimethylamine, 4- (dimethylamino) -N, N-dimethylbenzylamine, 4-methoxy-N, N-dimethylbenzylamine, 4-methyl). -N, N-dimethylbenzylamine, etc.), quaternary ammonium salt compounds (eg, triethylbenzylammonium chloride, etc.), blocked isocyanate compounds, imidazole derivative bicyclic amidine compounds and salts thereof (eg, imidazole, 2-methylimidazole, 2-ethylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 4-phenylimidazole, 1-cyanoethyl-2-phenylimidazole, 1- (2-cyanoethyl) -2-ethyl-4-methylimidazole ), Phosphorus compounds (eg, triphenylphosphine), S-triazine derivatives (eg, 2,4-diamino-6-methacryloyloxyethyl-S-triazine, 2-vinyl-2,4-diamino-S-triazine, 2-vinyl-4,6-diamino-S-triazine / isocyanuric acid adduct, 2,4-diamino-6-methacryloyloxyethyl-S-triazine / isocyanuric acid adduct, etc.) can be used. These may be used alone or in combination of two or more.

<Organic solvent>
In the coloring composition of the present invention, the colorant [A] is sufficiently dispersed in a dye carrier such as an acrylic resin [B], and the dry film thickness is 0.2 to 10 μm on a transparent substrate such as a glass substrate. Used to facilitate the formation of filter segments.

Examples of the organic solvent include 1,2,3-trichloropropane, 1,3-butanediol, 1,3-butylene glycol, 1,3-butylene glycol diacetate, 1,4-dioxane, 2-heptanone, 2- Methyl-1,3-propanediol, 3,5,5-trimethyl-2-cyclohexen-1-one, 3,3,5-trimethylcyclohexanone, ethyl 3-ethoxypropionate, 3-methyl-1,3-butane Diol, 3-methoxy-3-methyl-1-butanol, 3-methoxy-3-methylbutyl acetate, 3-methoxybutanol, 3-methoxybutyl acetate, 4-heptanone, m-xylene, m-diethylbenzene, m-di Chlorobenzene, N, N-dimethylacetamide, N, N-dimethylformamide, n-butyl Lucol, n-butylbenzene, n-propyl acetate, N-methylpyrrolidone, o-xylene, o-chlorotoluene, o-diethylbenzene, o-dichlorobenzene, p-chlorotoluene, p-diethylbenzene, sec-butylbenzene, tert -Butylbenzene, γ-butyrolactone, isobutyl alcohol, isophorone, ethylene glycol diethyl ether, ethylene glycol dibutyl ether, ethylene glycol monoisopropyl ether, ethylene glycol monoethyl ether, ethylene glycol monoethyl ether acetate, ethylene glycol monotertiary butyl ether, ethylene Glycol monobutyl ether, ethylene glycol monobutyl ether acetate, ethylene glycol monopropylene Ether, ethylene glycol monohexyl ether, ethylene glycol monomethyl ether, ethylene glycol monomethyl ether acetate, diisobutyl ketone, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol monoisopropyl ether, diethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether, diethylene glycol monobutyl ether acetate, diethylene glycol Monomethyl ether, cyclohexanol, cyclohexanol acetate, cyclohexanone, dipropylene glycol dimethyl ether, dipropylene glycol methyl ether acetate, dipropylene glycol monoethyl ether, dipropylene Glycol monobutyl ether, dipropylene glycol monopropyl ether, dipropylene glycol monomethyl ether, diacetone alcohol, triacetin, tripropylene glycol monobutyl ether, tripropylene glycol monomethyl ether, propylene glycol diacetate, propylene glycol phenyl ether, propylene glycol monoethyl Ether, propylene glycol monoethyl ether acetate, propylene glycol monobutyl ether, propylene glycol monopropyl ether, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether propionate, benzyl alcohol, methyl isobutyl Ketone, methyl cyclohexanol, acetic acid n- amyl acetate n- butyl, isoamyl acetate, isobutyl acetate, propyl acetate, and dibasic acid esters.
These organic solvents can be used alone or in admixture of two or more at any ratio as required.

Among them, the dispersibility of the coloring agent, the penetrability, and the coating property of the coloring composition are good, so that ethyl lactate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl It is preferable to use glycol acetates such as ether acetate, alcohols such as benzyl alcohol, diacetone alcohol and 3-methoxybutanol, and ketones such as cyclohexanone.
By using a colored composition containing an acrylic resin, amides such as N-methyl-2-pyrrolidone, N, N-dimethylacetamide, N, N-dimethylformamide, etc., which are generally used when polyimide resin is used, β- Compared with lactones such as propiolactone, γ-butyrolactone, γ-valerolactone, δ-valerolactone, γ-caprolactone, and ε-caprolactone, the hue of the pigment is not impaired, and the brightness and contrast ratio are high. Filter segments can be formed.

  The organic solvent can be used in an amount of 100 to 10,000 parts by weight, preferably 500 to 5000 parts by weight, with respect to 100 parts by weight of the colorant [A] in the coloring composition.

<Leveling agent>
It is preferable to add a leveling agent to the colored composition of the present invention in order to improve the leveling property of the colored composition on a substrate such as a transparent substrate. As the leveling agent, dimethylsiloxane having a polyether structure or a polyester structure in the main chain is preferable. Specific examples of dimethylsiloxane having a polyether structure in the main chain include FZ-2122 manufactured by Toray Dow Corning, BYK-333 manufactured by Big Chemie. Specific examples of dimethylsiloxane having a polyester structure in the main chain include BYK-310 and BYK-370 manufactured by BYK Chemie. Dimethylsiloxane having a polyether structure in the main chain and dimethylsiloxane having a polyester structure in the main chain can be used in combination.
In general, the leveling agent content is preferably 0.003 to 1.0% by weight in 100% by weight of the total weight of the coloring composition.

  Particularly preferred as a leveling agent is a kind of so-called surfactant having a hydrophobic group and a hydrophilic group in the molecule, having a hydrophilic group but low solubility in water, and when added to a coloring composition, It has the characteristics of low surface tension reduction ability, and it is useful to have good wettability to the glass plate despite its low surface tension reduction ability. Those that can sufficiently suppress the chargeability can be preferably used. As a leveling agent having such preferable characteristics, dimethylpolysiloxane having a polyalkylene oxide unit can be preferably used. Examples of the polyalkylene oxide unit include a polyethylene oxide unit and a polypropylene oxide unit, and dimethylpolysiloxane may have both a polyethylene oxide unit and a polypropylene oxide unit.

  In addition, the bonding form of the polyalkylene oxide unit with dimethylpolysiloxane includes a pendant type in which the polyalkylene oxide unit is bonded in the repeating unit of dimethylpolysiloxane, a terminal-modified type in which the end of dimethylpolysiloxane is bonded, and dimethylpolysiloxane. Any of linear block copolymer types in which they are alternately and repeatedly bonded may be used. Dimethylpolysiloxane having a polyalkylene oxide unit is commercially available from Toray Dow Corning Co., Ltd., for example, FZ-2110, FZ-2122, FZ-2130, FZ-2166, FZ-2191, FZ-2203, FZ. -2207, but is not limited thereto.

An anionic, cationic, nonionic or amphoteric surfactant can be supplementarily added to the leveling agent. Two or more kinds of surfactants may be mixed and used.
Anionic surfactants added to the leveling agent as auxiliary agents include polyoxyethylene alkyl ether sulfate, sodium dodecylbenzene sulfonate, alkali salt of styrene-acrylic acid copolymer, sodium alkyl naphthalene sulfonate, alkyl diphenyl ether disulfonic acid Sodium, lauryl sulfate monoethanolamine, lauryl sulfate triethanolamine, ammonium lauryl sulfate, monoethanolamine stearate, sodium stearate, sodium lauryl sulfate, monoethanolamine of styrene-acrylic acid copolymer, polyoxyethylene alkyl ether phosphate Examples include esters.

  Examples of the chaotic surfactant that is supplementarily added to the leveling agent include alkyl quaternary ammonium salts and their ethylene oxide adducts. Nonionic surfactants added to the leveling agent as auxiliary agents include polyoxyethylene oleyl ether, polyoxyethylene lauryl ether, polyoxyethylene nonylphenyl ether, polyoxyethylene alkyl ether phosphate ester, polyoxyethylene sorbitan monostearate And amphoteric surfactants such as alkyl dimethylamino acetic acid betaine and alkylimidazolines, and fluorine-based and silicone-based surfactants.

<Other ingredients>
The coloring composition for a color filter of the present invention contains an adhesion improver such as a silane coupling agent or an amine compound that has a function of reducing dissolved oxygen in order to improve adhesion to a transparent substrate. Can be made.

  Examples of the silane coupling agent include vinyl silanes such as vinyl tris (β-methoxyethoxy) silane, vinyl ethoxy silane, and vinyl trimethoxy silane, (meth) acryl silanes such as γ-methacryloxypropyl trimethoxy silane, β- ( 3,4-epoxycyclohexyl) ethyltrimethoxysilane, β- (3,4-epoxycyclohexyl) methyltrimethoxysilane, β- (3,4-epoxycyclohexyl) ethyltriethoxysilane, β- (3,4-epoxy (Cyclohexyl) methyltriethoxysilane, γ-glycidoxypropyltrimethoxysilane, epoxysilanes such as γ-glycidoxypropyltriethoxysilane, N-β (aminoethyl) γ-aminopropyltrimethoxysilane, N-β (Aminoethyl) γ-amino Propyltriethoxysilane, N-β (aminoethyl) γ-aminopropylmethyldiethoxysilane, γ-aminopropyltriethoxysilane, γ-aminopropyltrimethoxysilane, N-phenyl-γ-aminopropyltrimethoxysilane, Examples include aminosilanes such as N-phenyl-γ-aminopropyltriethoxysilane, and thiosilanes such as γ-mercaptopropyltrimethoxysilane and γ-mercaptopropyltriethoxysilane.

  The silane coupling agent can be used in an amount of 0.01 to 10 parts by weight, preferably 0.05 to 5 parts by weight, with respect to 100 parts by weight of the colorant [A] in the coloring composition.

  Examples of amine compounds include triethanolamine, methyldiethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, 2-dimethylaminoethyl benzoate, 4 -2-ethylhexyl dimethylaminobenzoate, N, N-dimethyl paratoluidine, etc. are mentioned.

<The manufacturing method of a coloring composition>
The coloring composition of the present invention comprises a three-roll mill, a two-roll mill, a sand mill, a kneader in a coloring agent carrier such as an acrylic resin [B] containing an acrylic resin (B1) and / or an organic solvent. The dispersion is finely dispersed using various dispersing means such as an attritor to produce a colorant dispersion. If necessary, the colorant dispersion may further include an acrylic resin [B], an organic solvent, a leveling agent, and storage stability. It can be produced by mixing and stirring the agent and other components. Moreover, the coloring composition containing 2 or more types of coloring agents may be produced by mixing each coloring agent dispersion separately in a coloring agent carrier and / or an organic solvent.

When the colorant [A] is dispersed in the acrylic resin [B] and / or the solvent, a dispersion aid such as a resin-type pigment dispersant, a surfactant, or a pigment derivative can be appropriately contained. Since the dispersion aid is excellent in pigment dispersion and has a great effect of preventing reaggregation of the pigment after dispersion, a coloring composition obtained by dispersing the pigment in a resin and / or solvent using the dispersion aid is used. If so, a color filter excellent in transparency can be obtained.
The dispersion aid can be used in an amount of 0.1 to 40 parts by weight, preferably 0.1 to 30 parts by weight, based on 100 parts by weight of the colorant [A] in the coloring composition.

《Dispersing aid》
When dispersing the colorant in the colorant carrier, a dispersion aid such as a pigment derivative, a resin-type dispersant, or a surfactant may be appropriately contained. Since the dispersion aid has a great effect of preventing re-aggregation of the colorant after dispersion, the color composition obtained by dispersing the colorant in the colorant carrier using the dispersion aid has spectral characteristics and viscosity stability. Will be better.

  Examples of the dye derivative include a compound obtained by introducing a basic substituent, an acidic substituent, or a phthalimidomethyl group which may have a substituent into an organic pigment, anthraquinone, acridone, or triazine. 63-305173, JP-B-57-15620, JP-B-59-40172, JP-B-63-17102, JP-B-5-9469, etc. can be used. These can be used alone or in combination of two or more.

  The blending amount of the pigment derivative is preferably 0.5 parts by weight or more, more preferably 1 part by weight or more, most preferably 3 parts per 100 parts by weight of the colorant [A] from the viewpoint of improving the dispersibility of the added colorant. It is more than part by weight. Further, from the viewpoint of heat resistance and light resistance, the amount is preferably 40 parts by weight or less, more preferably 35 parts by weight or less with respect to 100 parts by weight of the colorant.

  The resin-type dispersant has a colorant affinity part that has the property of adsorbing to the colorant and a part that is compatible with the colorant carrier, and adsorbs to the added colorant to stabilize dispersion in the colorant carrier. It works to make it. Specific examples of resin-type dispersants include polycarboxylic acid esters such as polyurethane and polyacrylate, unsaturated polyamides, polycarboxylic acids, polycarboxylic acid (partial) amine salts, polycarboxylic acid ammonium salts, and polycarboxylic acid alkylamine salts. , Polysiloxane, long-chain polyaminoamide phosphate, hydroxyl group-containing polycarboxylic acid ester, modified products thereof, amides formed by reaction of poly (lower alkyleneimine) and polyester having a free carboxyl group, and salts thereof Oil-soluble dispersants such as, (meth) acrylic acid-styrene copolymer, (meth) acrylic acid- (meth) acrylic acid ester copolymer, styrene-maleic acid copolymer, polyvinyl alcohol, polyvinylpyrrolidone, etc. Resin, water-soluble polymer, polyester, modified poly Acrylate-based, ethylene oxide / propylene oxide adduct, phosphoric ester or the like is used, they may be used alone or in combination, it is not necessarily limited thereto.

  Among the above dispersants, a polymer dispersant having a basic functional group is preferable because the viscosity of the dispersion is lowered and a high contrast ratio is exhibited with a small addition amount, and a nitrogen atom-containing graft copolymer or side chain is preferable. A nitrogen atom-containing acrylic block copolymer and a urethane polymer dispersant having a functional group containing a tertiary amino group, a quaternary ammonium base, a nitrogen-containing heterocyclic ring, and the like are preferable.

  Commercially available resin-type dispersants include Dsperbyk-101, 103, 107, 108, 110, 111, 116, 130, 140, 154, 161, 162, 163, 164, 165, 166, 170 manufactured by Big Chemie Japan. 171, 174, 180, 181, 182, 183, 184, 185, 190, 2000, 2001, 2020, 2025, 2050, 2070, 2095, 2150, 2155 or Anti-Terra-U, 203, 204, or BYK- P104, P104S, 220S, LPN6919, or LACTIMON, LACTIMON-WS or BYKUMEN, etc., SOLPERSE-3000, 9000, 13000, 13240, 13650, 13940, 16 manufactured by Lubrizol Japan 00, 17000, 18000, 20000, 21000, 24000, 26000, 27000, 28000, 31845, 32000, 32500, 32550, 33500, 32600, 34750, 35100, 36600, 38500, 41000, 41090, 53095, 55000, 76500, etc., BASF EFKA-46, 47, 48, 452, 4008, 4009, 4010, 4015, 4020, 4047, 4050, 4055, 4060, 4080, 4400, 4401, 4402, 4403, 4406, 4408, 4300, 4310, 4320 , 4330, 4340, 450, 451, 453, 4540, 4550, 4560, 4800, 5010, 5065, 5066, 5070, 7500, 755 , 1101,120,150,1501,1502,1503, etc., Ajinomoto Fine-Techno Co., Ltd. of AJISPER PA111, PB711, PB821, PB822, PB824, and the like.

  Surfactants include sodium lauryl sulfate, polyoxyethylene alkyl ether sulfate, sodium dodecylbenzene sulfonate, alkali salt of styrene-acrylic acid copolymer, sodium stearate, sodium alkyl naphthalene sulfonate, sodium alkyl diphenyl ether disulfonate Anionic surfactants such as lauryl sulfate monoethanolamine, lauryl sulfate triethanolamine, ammonium lauryl sulfate, monoethanolamine stearate, monoethanolamine of styrene-acrylic acid copolymer, polyoxyethylene alkyl ether phosphate; Polyoxyethylene oleyl ether, polyoxyethylene lauryl ether, polyoxyethylene nonylphenyl ether, polyoxyethylene Nonionic surfactants such as alkyl ether phosphates, polyoxyethylene sorbitan monostearate and polyethylene glycol monolaurate; chaotic surfactants such as alkyl quaternary ammonium salts and their ethylene oxide adducts; alkyldimethylamino Examples include amphoteric surfactants such as alkylbetaines such as betaine acetate and alkylimidazolines, and these can be used alone or in admixture of two or more, but are not necessarily limited thereto.

  The amount of the resin-type dispersant and the surfactant added is preferably 0.1 to 55 parts by weight, more preferably 0.1 to 45 parts by weight with respect to 100 parts by weight of the colorant [A]. . When the blending amount of the resin-type dispersant and the surfactant is less than 0.1 parts by weight, it is difficult to obtain the added effect. May affect.

  The colored composition is removed by means of centrifugal separation, sintering filter, membrane filter, etc. to remove coarse particles of 5 μm or more, preferably coarse particles of 1 μm or more, more preferably 0.5 μm or more and coarse particles It is preferable to carry out.

"Method for manufacturing filter segments for color filters"
The manufacturing method of the filter segment for color filters of this invention is acrylic resin [B] containing the acrylic resin (B1) whose colorant [A] and glass transition temperature (Tg) are 40-160 degreeC on a base material. And (i) a step of forming a coating film using a coloring composition containing an organic solvent, a step (ii) of applying a positive resist [C] onto the coating film, exposing and patterning by etching, And a step (iii) of removing the positive resist [C] remaining after the step (ii) with a peeling solvent [D].
Further, by using such a positive resist etching method, the coloring composition has a higher colorant than a negative photosensitive coloring composition or a method of directly patterning using a positive photosensitive coloring composition. Even if it is a density | concentration, in the photolithographic processing process, since it is not influenced by photocuring, it can be set as the thing excellent in patterning property.

<< Step (i) >>
Step (i) is a step of forming a coating film using the colored composition.
A colorant [A], an acrylic resin [B] containing an acrylic resin (B1), and a colored composition containing an organic solvent are spray coated, spin coated, slit coated, roll coated, etc. on a substrate such as a transparent substrate. The coating method is applied so that the dry film thickness is 0.2 to 10 μm, and is dried if necessary.

<< Step (ii) >>
Step (i) is a step in which a positive resist [C] is applied onto the coating film, exposed, and patterned by etching.
On the base material coated with the colored composition obtained in the step (i), first, a positive resist [C] is applied by a coating method such as spray coating, spin coating, slit coating, roll coating, etc. It applies so that it may become 0.2-2.5 micrometers.

  Subsequently, the dried coating film is exposed to ultraviolet rays through a mask having a predetermined pattern provided in contact or non-contact with the coating film, if necessary.

  Thereafter, the filter segment can be formed by immersing in a solvent or an alkali developer or spraying the developer by spraying or the like to remove the dissolved portion (exposed portion) and forming a desired pattern by etching. Furthermore, in order to accelerate the thermal crosslinking of the filter segment formed by development, heating can be performed as necessary. According to the positive resist etching method, it is possible to form a filter segment with higher accuracy than the photolithography method.

In the development / etching, an organic alkali such as dimethylbenzylamine or triethanolamine is used as an alkali developer, and an aqueous solution such as sodium carbonate or sodium hydroxide can also be used. Moreover, an antifoamer and surfactant can also be added to a developing solution.
As a development processing method, a shower development method, a spray development method, a dip (immersion) development method, a paddle (liquid accumulation) development method, or the like can be applied.

<Positive resist (C)>
In the resist stripping method of the present invention, the target resist can be generally applied to a known positive resist. The positive resist in the present invention includes a chemically amplified resist.

  When the typical thing of the resist which can apply the resist peeling solvent of this invention is illustrated, what consists of a quinonediazide type photosensitizer and alkali-soluble resin is mentioned in a positive type, for example.

The type of the positive resist used in the present invention is not particularly limited as long as it is a commercially available general solvent. For example, propylene glycol monomethyl ether acetate, diacetone alcohol, 2-ethyl 1-butanol, 1-hexanol, 1-octanol, 1-pentanol, 1-heptanol, 2-ethylhexanol, dimethylacetamide, isobutyl alcohol, N, N -Dimethylformamide, toluene, tripropylene glycol, butyl lactate, diethyl oxalate, methylcyclohexanone, diethyl maleate, tert-butyl alcohol, sec-butyl alcohol, tripropylene glycol, ethyl lactate, dodecanol, ethylene glycol diethyl ether, isobutyl acetate 3,5,5-trimethylhexanol, methyl amyl ketone, tripropylene glycol methyl ether, diethyl ketone, allyl alcohol Lumpur, benzyl alcohol, furfuryl alcohol, ethanol, methanol and the like, without limitation.
Since the colored composition of the present invention is excellent in resistance to the solvent contained in these positive resists, there is no elution and an excellent filter segment can be formed.

  An example of a quinonediazide-based photosensitizer and an alkali-soluble resin, which is a resist material composed of a quinonediazide-based photosensitizer and an alkali-soluble resin, includes 1,2-benzoquinonediazide-4-sulfonic acid, 1 , 2-naphthoquinonediazide-4-sulfonic acid, 1,2-naphthoquinonediazide-5-sulfonic acid, esters or amides of these sulfonic acids, and alkali-soluble resins include polyvinylphenol, polyvinyl alcohol, acrylic acid, Is produced from a copolymer of methacrylic acid or one or more of phenols such as phenol, o-cresol, m-cresol, p-cresol and xylenol, and aldehydes such as formaldehyde and paraformaldehyde. Novolac resin And the like.

  A chemically amplified resist is also a preferable resist to which the resist stripping solvent of the present invention is applied. A chemically amplified resist generates an acid upon irradiation and forms a pattern by changing the solubility of the irradiated portion in the developer by a chemical change caused by the catalytic action of this acid. Containing an acid-generating compound to be generated and an acid-sensitive group-containing resin that decomposes in the presence of an acid to produce an alkali-soluble group such as a phenolic hydroxyl group or a carboxyl group, an alkali-soluble resin, a crosslinking agent, and an acid generator What consists of an agent is mentioned.

  The resist applied on the substrate is pre-baked, for example, on a hot plate to remove the solvent, and a resist coating having a thickness of usually about 1 to 2.5 microns is formed. The pre-baking temperature varies depending on the type of solvent or resist used, and is usually 20 to 200 ° C., preferably about 50 to 150 ° C. The resist coating is then applied using a known irradiation device such as a high-pressure mercury lamp, a metal halide lamp, an ultrahigh-pressure mercury lamp, a KrF excimer laser, an ArF excimer laser, a soft X-ray irradiation device, or an electron beam drawing device, with a mask as necessary. Exposure is performed, and after exposure, after baking is performed as necessary to improve developability, resolution, pattern shape, and the like, development is performed, and a resist pattern is formed. The development of the resist is usually performed using an alkaline developer. As the alkaline developer, for example, an aqueous solution or aqueous solution of sodium hydroxide, potassium hydroxide, tetramethylammonium hydroxide (TMAH), or the like is used.

<< Process (iii) >>
Step (iii) is a step of stripping the positive resist [C] remaining after step (ii) with a stripping solvent [D].

  As the peeling treatment method, a shower development method, a spray development method, a dip (immersion) development method, a paddle (liquid accumulation) development method, or the like can be applied.

  The obtained coating film may be heated and cured (post-baked) as necessary. The heating temperature is preferably in the range of 140 to 230 ° C., and a vacuum dryer, a convection oven, an IR oven, a hot plate, or the like may be used. The dry film thickness of the filter segment is preferably 0.2 to 10 μm, more preferably 0.2 to 5 μm.

<Peeling solvent [D]>
The peeling solvent [D] is not limited as long as it is a solvent that dissolves the positive resist. Stripping solvents include diacetone alcohol, 2-ethyl 1-butanol, 1-hexanol, 1-octanol, 1-pentanol, 1-heptanol, 2-ethylhexanol, dimethylacetamide, isobutyl alcohol, N, N-dimethylformamide , Toluene, tripropylene glycol, butyl lactate, diethyl oxalate, methylcyclohexanone, diethyl maleate, tert-butyl alcohol, sec-butyl alcohol, tripropylene glycol, ethyl lactate, dodecanol, ethylene glycol diethyl ether, isobutyl acetate, 3, 5,5-trimethylhexanol, methyl amyl ketone, tripropylene glycol methyl ether, diethyl ketone, allyl alcohol, benzyl alcohol, furfuryl alcohol Call, ethanol, methanol, propylene glycol monomethyl ether acetate and the like, but are not limited to.

"Color filter"
Next, the color filter of the present invention will be described.
The color filter of the present invention comprises a filter segment for a color filter produced by a method for producing a filter segment of the present invention using a colored composition on a base material such as a transparent substrate. The color filter comprises a black matrix, at least one red filter segment, at least one green filter segment, and at least one blue filter segment. Further, at least one magenta color filter segment, at least one cyan color filter segment, or at least one yellow color filter segment may be provided.

  It may also comprise a black matrix, at least one magenta color filter segment, at least one cyan color filter segment, and at least one yellow color filter segment.

  As the substrate, glass plates such as soda lime glass, low alkali borosilicate glass and non-alkali aluminoborosilicate glass, and resin plates such as polycarbonate, polymethyl methacrylate, and polyethylene terephthalate are used. In addition, a transparent electrode made of indium oxide, tin oxide, or the like may be formed on the surface of the glass plate or the resin plate in order to drive the liquid crystal after forming the panel.

  If the black matrix is formed in advance before forming the filter segment on the substrate, the contrast of the liquid crystal display panel can be further increased. As the black matrix, a chromium, chromium / chromium oxide multilayer film, an inorganic film such as titanium nitride, or a resin film in which a light shielding agent is dispersed is used. A thin film transistor (TFT) may be formed in advance on the transparent substrate or the reflective substrate, and then a filter segment may be formed. By forming the filter segment and / or the black matrix on the TFT substrate, the aperture ratio of the liquid crystal display panel can be increased and the luminance can be improved.

  The dry film thickness of the filter segment is preferably 0.2 to 10 μm, more preferably 0.2 to 5 μm. When drying the coating film, a vacuum dryer, a convection oven, an IR oven, a hot plate, or the like may be used.

  An overcoat film, a columnar spacer, a transparent conductive film, a liquid crystal alignment film, and the like are formed on the color filter as necessary.

  The color filter is bonded to the counter substrate using a sealant, and after injecting liquid crystal from the injection port provided in the seal part, the injection port is sealed, and if necessary, a polarizing film or a retardation film is placed outside the substrate. A liquid crystal display panel is manufactured by bonding.

  Such liquid crystal display panels include twisted nematic (TN), super twisted nematic (STN), in-plane switching (IPS), vertical alignment (VA), and optically convented bend (OCB). It can be used in a liquid crystal display mode in which colorization is performed using a color filter such as the above.

Hereinafter, the present invention will be described based on examples, but the present invention is not limited thereto. In the examples, “parts” and “%” represent “parts by weight” and “% by weight”, respectively. “PGMAC” means propylene glycol monomethyl ether acetate.

Moreover, the measuring method of the weight average molecular weight (Mw) of resin and the chromaticity of a coating film is as follows.
(Weight average molecular weight of resin (Mw))
The weight average molecular weight (Mw) of the resin was measured in terms of polystyrene measured using TSKgel column (manufactured by Tosoh Corporation) and GPC equipped with RI detector (manufactured by Tosoh Corporation, HLC-8120GPC) using THF as a developing solvent. It is a weight average molecular weight (Mw).

(Chromaticity of coating film)
It is a value with a C light source measured using a microspectrophotometer ("OSP-SP200" manufactured by Olympus Optical Co., Ltd.).

  Then, the manufacturing method of the acrylic resin solution used for the Example and the comparative example, the refinement | purification process pigment, and a coloring agent dispersion is demonstrated.

<Method for producing acrylic resin solution>
(Acrylic resin solution (B1-1))
A separable four-necked flask equipped with a thermometer, a cooling pipe, a nitrogen gas introduction pipe, a dropping pipe, and a stirring device was charged with 40.0 parts of propylene glycol monoethyl ether acetate and 30.0 parts of 3-methoxybutanol and heated to 80 ° C. After warming and purging the inside of the reaction vessel with nitrogen, 0.4 part of 2,2′-azobisisobutyronitrile and 29.6 parts of ethylenically unsaturated monomer were added from the dropping tube with methacrylic acid (MAA): Methyl methacrylate (MMA): 2-hydroxyethyl methacrylate (HEMA) = 20 wt%: 70 wt%: A mixture adjusted to be 10 wt% was added dropwise over 2 hours. After completion of the dropping, the reaction was further continued for 3 hours to obtain an acrylic resin solution having a weight average molecular weight (Mw) of 26,000.
After cooling to room temperature, about 2 parts of the resin solution was sampled and heated and dried at 180 ° C. for 20 minutes to measure the non-volatile content, and the previously synthesized resin solution had a non-volatile content of 20% by weight. Ethyl ether acetate was added to obtain an acrylic resin solution (B1-1).

(Acrylic resin (B1-2-22, B-1, 2))
Synthesis was carried out in the same manner as for the acrylic resin (B1-1) except that 29.6 parts of the ethylenically unsaturated monomer were changed so as to have the composition and weight% shown in Table 1, and the acrylic resin (B1- 2-22, B-1, 2) were obtained.

<Manufacture of refined pigments>
(Red refined pigment (PR254-1))
Red pigment C.I. I. Pigment Red 254 (PR254) ("Irga Fore Red B-CF" manufactured by BASF) 152 parts, 8 parts of a pigment derivative of the chemical formula (1), 1600 parts of sodium chloride, and 190 parts of diethylene glycol 1 gallon kneader (Inoue Seisakusho) And kneaded at 60 ° C. for 10 hours. Next, the mixture is poured into 3 liters of warm water, stirred at a high speed mixer for about 1 hour while being heated to about 80 ° C. to form a slurry, filtered and washed repeatedly to remove sodium chloride and solvent, and then 80 It was dried for 1 day at 0 ° C. to obtain a red refined pigment (PR254-1).

Chemical formula (1)

(Red refined pigment (PR177-1))
Red pigment C.I. I. 500 parts of Pigment Red 177 (PR177) (“chromophthaled red A2B” manufactured by BASF), 3500 parts of sodium chloride, and 250 parts of diethylene glycol were charged into a 1 gallon kneader (manufactured by Inoue Seisakusho) and kneaded at 120 ° C. for 8 hours. . Next, the kneaded product is poured into 5 liters of warm water, stirred for 1 hour while heating to 70 ° C. to form a slurry, filtered and washed repeatedly to remove sodium chloride and diethylene glycol, and then dried at 80 ° C. overnight. As a result, a red-refined pigment (PR177-1) was obtained.

(Red refined pigment (PR242-1))
Red pigment C.I. I. 200 parts of Pigment Red 242 (“NOVOPERM SCARLET 4RF” manufactured by Clariant), 1400 parts of sodium chloride, and 360 parts of diethylene glycol were charged into a stainless gallon kneader (manufactured by Inoue Seisakusho) and kneaded at 80 ° C. for 6 hours. Next, the kneaded product is put into 8 liters of warm water, stirred for 2 hours while heating to 80 ° C. to form a slurry, filtered and washed repeatedly to remove sodium chloride and diethylene glycol, and then dried at 85 ° C. overnight. As a result, a red refined pigment (PR242-1) was obtained.

(Green refined pigment (PG58-1))
Phthalocyanine green pigment C.I. I. 200 parts of Pigment Green 58 (“FASTOGEN GREEN A110” manufactured by DIC Corporation), 1400 parts of sodium chloride, and 360 parts of diethylene glycol were charged into a 1 gallon kneader (manufactured by Inoue Seisakusho) and kneaded at 80 ° C. for 6 hours. Next, the kneaded product is put into 8000 parts of warm water, stirred for 2 hours while heating to 80 ° C. to form a slurry, filtered and washed with water repeatedly to remove sodium chloride and diethylene glycol, and then dried at 85 ° C. overnight. A fine green pigment (PG58-1) was obtained.

(Yellow refined pigment (PY150-1))
Nickel complex yellow pigment C.I. I. 200 parts of Pigment Yellow 150 (“E-4GN” manufactured by LANXESS), 1400 parts of sodium chloride, and 360 parts of diethylene glycol were charged into a stainless gallon kneader (manufactured by Inoue Seisakusho) and kneaded at 80 ° C. for 6 hours. Next, the kneaded product is poured into 8 liters of warm water, stirred for 2 hours while heating to 80 ° C. to form a slurry, filtered and washed repeatedly to remove sodium chloride and diethylene glycol, and then dried at 85 ° C. overnight. A fine yellow pigment (PY150-1) was obtained.

(Blue refined pigment (PB15: 6-1))
Blue pigment C.I. I. Pigment Blue 15: 6 (PB15: 6) (“Lionol Blue ES” manufactured by Toyocolor Co., Ltd.) 500 parts, 2500 parts of sodium chloride, and 250 parts of diethylene glycol were charged into a stainless steel 1 gallon kneader (manufactured by Inoue Seisakusho). The mixture was kneaded at 120 ° C. for 12 hours. Next, the kneaded product is poured into 5 liters of warm water, stirred for 1 hour while heating to 70 ° C. to form a slurry, filtered and washed repeatedly to remove sodium chloride and diethylene glycol, and then dried at 80 ° C. overnight. As a result, a blue refined pigment (PB15: 6-1) was obtained.

(Purple refinement treatment pigment (PV23-1))
Dioxazine-based purple pigment C.I. I. 500 parts of Pigment Violet 23 (PV23) (“Fast Violet RL” manufactured by Clariant), 2500 parts of sodium chloride, and 250 parts of polyethylene glycol (manufactured by Tokyo Chemical Industry Co., Ltd.) were charged into a stainless 1 gallon kneader (manufactured by Inoue Seisakusho). The mixture was kneaded at 120 ° C. for 12 hours. Next, this mixture is poured into about 5 liters of warm water, heated to about 70 ° C. and stirred with a high speed mixer for about 1 hour to form a slurry, then filtered and washed to remove sodium chloride and diethylene glycol, It dried at 80 degreeC all day and night, and obtained the purple refinement | purification processed pigment (PV23-1).

[Example 1]
(Blue coloring composition (PB-1))
The following mixture was stirred and mixed so as to be uniform, and then dispersed with an Eiger mill (“Mini Model M-250 MKII” manufactured by Eiger Japan) using zirconia beads having a diameter of 0.5 mm, and then 5.0 μm. The blue colored composition (PB-1) was produced by filtering with a filter.

Blue refined pigment (PB15: 6-1): 10.0 parts Purple refined pigment (PV23-1): 2.0 parts Resin-type dispersant: 1.0 part ("EFKA4300" manufactured by BASF)
Acrylic resin solution (B1-1): 35.0 parts Solvent PGMAC: 42.0 parts (propylene glycol monomethyl ether acetate)
3-methoxybutanol: 10.0 parts

[Examples 2 to 24, Comparative Examples 1 and 2]
(Blue coloring composition (PB-2 to 24), red coloring composition (PR-1), green coloring composition (PG-1))
A blue colored composition is the same as the blue colored composition (PB-1) except that the colorant, the resin-type dispersant, and the acrylic resin solution are changed to the compositions and blending amounts (parts by weight) shown in Table 2. (PB-2 to 24), a red colored composition (PR-1), and a green colored composition (PG-1) were produced.

In Table 2, EFKA4300 and BYK-LPN6919 are as follows.
EFKA4300: “EFKA4300” manufactured by BASF
BYK-LPN6919: “BYK-LPN6919” manufactured by Big Chemie Japan

<Evaluation method>
The coloring compositions obtained in the examples and comparative examples were evaluated for elution into a positive resist, etching properties, heat resistance, and chemical resistance by the following methods. Table 3 shows the evaluation results.

(Filter segment manufacturing method)
<< Step (i) >>
Filter segments finally obtained by using the spin coater on the obtained colored compositions (PB-1 to 24, PR-1, PG-1) on glass substrates of 100 mm × 100 mm and 1.1 mm thickness, respectively. Was applied to a film thickness of 2 μm, dried under reduced pressure, heated at 70 ° C. for 20 minutes, and allowed to cool to obtain a coating film (chromaticity 1).
<< Step (ii) >>
A positive resist (manufactured by AZ Electronic Materials Co., Ltd .: AZ P1350; PGMAC solution) was applied to the coating film by rotating it at 800 rpm for 10 seconds using a spin coater, and irradiated with 150 mJ / cm ² of ultraviolet rays. Next, spray development and etching were performed with an alkali developer composed of a 0.238 wt% tetramethylammonium hydroxide aqueous solution to remove the positive resist and the colored composition in the exposed portion, and then washed with ion-exchanged water.
The development and etching times were the etching times obtained by the etching property evaluation described later.
<< Process (iii) >>
The positive resist remaining on the obtained coating film was stripped using tripropylene glycol as a stripping solvent (chromaticity 2).
The obtained coating film was heated in an oven at 230 ° C. for 20 minutes to obtain a filter segment (chromaticity 3).

[Elution into positive resist]
Chromaticity of the coating film obtained in step (i) (chromaticity 1) L * (1), a * (1), b * (1)), and positive resist peeling obtained in step (iii) The chromaticity (chromaticity 2) (L * (2), a * (2), b * (2)) of the subsequent coating film was measured, and the color difference ΔE * ab was calculated by the following formula.

ΔE * ab = √ ((L * (2)-L * (1)) ² + (a * (2)-a * (1)) ² + (b * (2)-b * (1)) ² )

Based on the color difference ΔE * ab, the solvent resistance of the coating film was evaluated according to the following criteria. The smaller the color difference ΔE * ab, the smaller the chromaticity change before and after the filter segment production of the colored composition, and it can be said that the colored composition is less likely to elute into the positive resist. Evaluation was made according to the following criteria. In addition, (double-circle) is a very favorable level, (circle) is a favorable level, (triangle | delta) is a practical level, and x is a level which is not suitable for practical use.

◎: ΔE * ab is less than 1.0 ○: ΔE * ab is 1.0 or more and less than 3.0 Δ: ΔE * ab is 3.0 or more and less than 5.0 ×: ΔE * ab is 5.0 or more

[Etching property]
The etching property was determined by measuring the time until the substrate surface was exposed by developing and etching a part of the coating film that was not developed and etched when producing the filter segment in step (ii).

If the etching time is too slow, the productivity of the filter segment is lowered, and if it is too early, patterning control is difficult.
In addition, (double-circle) is a very favorable level, (circle) is a favorable level, (triangle | delta) is a practical level, and x is a level which is not suitable for practical use.

A: Etching time 25 seconds to less than 35 seconds B: Etching time 15 seconds to less than 25 seconds, or 35 seconds to less than 45 seconds Δ: Etching time 10 seconds to less than 15 seconds, or 45 seconds to less than 60 seconds × : Etching time is less than 10 seconds or 60 seconds or more

[Heat-resistant]
The heat resistance is the chromaticity (chromaticity 3) (L * (3), a * (3), b * (3)) of the filter segment obtained in the step (iii), and further heated at 230 ° C. for 1 hour. Evaluation was made on the chromaticity change (ΔE * ab) before and after heating in the subsequent chromaticity (chromaticity 4) (L * (4), a * (4), b * (4)).
Using the measured chromaticity value, the color difference ΔE * ab was calculated by the following formula.

ΔE * ab = √ ((L * (4)-L * (3)) ² + (a * (4)-a * (3)) ² + (b * (4)-b * (3)) ² )

Based on the color difference ΔE * ab, the solvent resistance of the coating film was evaluated according to the following criteria. In addition, (double-circle) is a very favorable level, (circle) is a favorable level, (triangle | delta) is a practical level, and x is a level which is not suitable for practical use.

◎: ΔE * ab is less than 0.5 ○: ΔE * ab is 0.5 or more and less than 1.0 Δ: ΔE * ab is 1.0 or more and less than 3.0 ×: ΔE * ab is 3.0 or more

[chemical resistance]
The chemical resistance is determined by the chromaticity (chromaticity 3) (L * (3), a * (3), b * (3)) of the filter segment obtained in the step (iii), and then N-methyl- Change in chromaticity before and after immersion in chromaticity (chromaticity 5) (L * (5), a * (5), b * (5)) after immersion in 2-pyrrolidone (NMP) for 30 minutes (ΔE * ab) was evaluated.
Using the measured chromaticity value, the color difference ΔE * ab was calculated by the following formula.

ΔE * ab = √ ((L * (5)-L * (3)) ² + (a * (5)-a * (3)) ² + (b * (5)-b * (3)) ² )

Based on the color difference ΔE * ab, the solvent resistance of the coating film was evaluated according to the following criteria. In addition, (double-circle) is a very favorable level, (circle) is a favorable level, (triangle | delta) is a practical level, and x is a level which is not suitable for practical use.

◎: ΔE * ab is less than 0.5 ○: ΔE * ab is 0.5 or more and less than 1.0 Δ: ΔE * ab is 1.0 or more and less than 3.0 ×: ΔE * ab is 3.0 or more

  As shown in Table 3, by containing an acrylic soluble resin (B1) having a Tg of 40 to 160 ° C., a good colored composition that does not elute into the positive resist even in the etching method and has excellent etching properties is obtained. In addition, the filter segment was excellent in heat resistance and chemical resistance.

<Color filter manufacturing method>
A black matrix was patterned on a glass substrate, and a red filter segment using a red coloring composition (PR-1) was obtained by a method for producing a filter segment. Similarly, a green filter segment using the green coloring composition (PG-1) and a blue filter segment using the blue coloring composition (PB-1) were formed to obtain a color filter.
The obtained color filter had no elution into the positive resist and had good heat resistance and light resistance. Moreover, since it was excellent in etching property, it was a color filter with good productivity and good pattern shape.

  Therefore, according to the present invention, a high-quality color filter can be produced in the filter segment manufacturing method using the positive resist etching method.

Claims (3)

A step (i) of forming a coating film on the substrate using a coloring composition containing a colorant [A], an acrylic resin [B], and an organic solvent, and a positive resist [C] on the coating film A filter for a color filter comprising: a step (ii) of applying, exposing to light, and patterning by etching; and a step (iii) of removing the positive resist [C] remaining after the step (ii) with a release solvent [D]. A colored composition used in a method for producing a segment, wherein the acrylic resin [B] has a glass transition temperature (Tg) of 90 to 120 ° C. and has a carboxyl group based on the weight of all the structural units of the resin An acrylic resin (B1) containing 15 to 25% by weight of units, 20% by weight or less of structural units having an aromatic ring, and 2 to 30% by weight of structural units having a hydroxyl group Composition.
On the substrate, the colorant [A] has a glass transition temperature (Tg) of 90 to 120 ° C., and 15 to 25% by weight of structural units having a carboxyl group based on the weight of all structural units of the resin, aroma Coating is performed using an acrylic resin [B] containing an acrylic resin (B1) containing 20% by weight or less of a structural unit having a ring and 2 to 30% by weight of a structural unit having a hydroxyl group, and a coloring composition containing an organic solvent. A step (i) of forming a film, and applying a positive resist [C] on the coating film;
Manufacture of a filter segment for a color filter comprising a step (ii) of patterning by exposure and etching, and a step (iii) of stripping the positive resist [C] remaining after the step (ii) with a stripping solvent [D]. Method.
  The manufacturing method of the color filter which comprises the filter segment for color filters formed using the manufacturing method of Claim 2.