JP6547887B2 - Illumination optical system, exposure apparatus and device manufacturing method - Google Patents

Description

  The present invention relates to an illumination optical apparatus, an exposure apparatus and an exposure method, and more particularly to an exposure apparatus for manufacturing micro devices such as semiconductor elements, imaging elements, liquid crystal display elements, thin film magnetic heads and the like by a lithography process.

  In a typical exposure apparatus of this type, a light flux emitted from a light source is a secondary surface as a substantial surface light source consisting of a large number of light sources via a fly eye lens (or a microlens array) as an optical integrator. A light source (generally, a predetermined light intensity distribution in the illumination pupil plane) is formed. The luminous flux from the secondary light source is limited via an aperture stop disposed near the back focal plane of the fly's eye lens and then enters a condenser lens.

  The luminous flux collected by the condenser lens illuminates the mask on which a predetermined pattern is formed in a superimposed manner. The light transmitted through the mask pattern is imaged on the wafer through the projection optical system. Thus, the mask pattern is projected (transferred) onto the wafer. The pattern formed on the mask is highly integrated, and in order to accurately transfer this fine pattern onto the wafer, it is essential to obtain a uniform illuminance distribution on the wafer.

  Therefore, a circular secondary light source is formed on the back focal plane of the fly's eye lens, and its size is changed to change the coherence of illumination σ (σ value = aperture stop diameter / pupil diameter of projection optical system, or σ A technique that changes the value = emission side numerical aperture of the illumination optical system / incident side numerical aperture of the projection optical system) has attracted attention. In addition, a technique of forming a ring-shaped or quadrupolar secondary light source on the rear side focal plane of the fly's eye lens to improve the depth of focus and resolution of the projection optical system has attracted attention.

  In the conventional exposure apparatus as described above, ordinary circular illumination based on the circular secondary light source is performed according to the pattern characteristics of the mask, or modified illumination based on the annular or quadrupolar secondary light source Band illumination and quadruple illumination). However, diverse illumination conditions can not be realized with respect to appropriate illumination conditions necessary for faithfully transferring mask patterns having various characteristics, for example, light intensity distribution and polarization state of secondary light sources. The

  The present invention has been made in view of the above problems, and for example, when it is mounted on an exposure apparatus, appropriate illumination conditions necessary for faithfully transferring a mask pattern having various characteristics, for example, secondary An object of the present invention is to provide an illumination optical apparatus capable of realizing diverse illumination conditions with respect to the light intensity distribution and the polarization state of a light source. Also, the present invention is realized according to the pattern characteristics of the mask, for example, using an illumination optical device capable of realizing appropriate illumination conditions necessary for faithfully transferring the mask pattern having various characteristics. An object of the present invention is to provide an exposure apparatus and an exposure method capable of performing a good exposure under appropriate illumination conditions.

In order to solve the above-mentioned subject, in the 1st form of the present invention, in the lighting optical device which illuminates a field to be irradiated,
An illumination pupil distribution having a light intensity distribution located in a central region including an optical axis and light intensity distributions located in a plurality of peripheral regions spaced from the optical axis at or near a pupil plane of the illumination optical device Illumination pupil forming means for forming, and area changing means for changing the position and size of the light intensity distribution located in the plurality of peripheral areas independently of the light intensity distribution located in the central area Provided is an illumination optical apparatus characterized by comprising.

  According to a preferred aspect of the first aspect, the illumination pupil forming unit converts the incident light beam into a central light beam corresponding to the central region and a plurality of peripheral light beams respectively corresponding to the plurality of peripheral regions, and the region It has a light flux conversion element for entering into the changing means. Further, the area changing means includes: a first prism having a refracting surface of a concave cross section; and a second prism having a refracting surface of a convex cross section formed substantially complementary to the refracting surface of the concave cross section of the first prism. It is preferable that the distance between the first prism and the second prism be variable, and the refracting surface have a planar central portion substantially orthogonal to the optical axis.

  In this case, the refracting surface preferably has the central portion and a peripheral conical portion corresponding to a side surface of the conical body centered on the optical axis. Also, in this case, preferably, the peripheral cone has one peripheral cone corresponding to the side of one cone centered on the optical axis. Alternatively, the peripheral cone has an inner peripheral cone corresponding to a side surface of the first cone centered on the optical axis, and a second apex centered on the optical axis and smaller than the first cone. It is preferred to have an outer peripheral cone which corresponds to the side of the two cones. In the first aspect, it is preferable that the area changing unit has a plurality of sets of the replaceable first prism and the second prism, and the area of the central portion is different for each set.

According to a second aspect of the present invention, in an illumination optical apparatus for illuminating a surface to be illuminated,
Illumination pupil forming means for forming an illumination pupil distribution having a light intensity distribution located in a first region and a light intensity distribution located in a second region in the pupil plane of the illumination optical device or in the vicinity thereof; There is provided an illumination optical apparatus comprising: a polarization setting means for setting a light flux passing through one area to a non-polarization state and setting a light flux passing through the second area to a polarization state. .

  According to a preferred mode of the second aspect, the first region has a central region including an optical axis, and the second region has a peripheral region spaced from the optical axis. In this case, the second area has two peripheral areas arranged substantially symmetrically with respect to the optical axis along the first direction, and the polarization setting means is configured to polarize the light flux passing through the two peripheral areas. It is preferable to set the state to a linear polarization state having a polarization plane in a direction substantially orthogonal to the first direction. Alternatively, the second region may be arranged at the position of each vertex of a rectangular quadrilateral having a side along a first direction and a side along a second direction substantially orthogonal to the first direction. It is preferable that a peripheral region is provided, and the polarization setting unit sets the polarization state of the light flux passing through the four peripheral regions to a linear polarization state having a polarization plane in the first direction or the second direction.

  Alternatively, in the second embodiment, the second region is located at the vertex position of each rectangular quadrilateral having a side along a first direction and a side along a second direction substantially orthogonal to the first direction. There are four peripheral regions arranged, and the polarization setting means makes the polarization state of the light flux passing through the four peripheral regions in a direction forming an angle of approximately 45 degrees with the first direction or the second direction. It is preferable to set to a linear polarization state having a polarization plane. In this case, the polarization setting unit is configured to set the polarization state of the light flux passing through one pair of peripheral regions facing each other across the optical axis among the four peripheral regions at an angle of approximately 45 degrees with the first direction. And the polarization state of the light beam passing through the peripheral region of the other pair opposed across the optical axis is approximately 45 degrees with respect to the first direction. It is preferable to set a linear polarization state having a polarization plane in a fourth direction which is at an angle and substantially orthogonal to the third direction.

  Alternatively, in the second embodiment, the second region is a vertex of each rectangular first quadrangle having a side along a first direction and a side along a second direction substantially orthogonal to the first direction. Of each of the rectangular second quadrilaterals having four inner peripheral regions arranged at positions, a side along the first direction, and a side along the second direction and surrounding the first quadrilateral And four outer peripheral regions disposed at the position of the vertex, wherein the polarization setting means is configured to polarize the polarization state of the light beam passing through the four inner peripheral regions in the first direction or the second direction. It is preferable that the polarization state of the light flux passing through the four outer peripheral regions is set to a linear polarization state having a polarization plane in the second direction or the first direction, while being set in the linear polarization state having

  Alternatively, in the second embodiment, the second region is a vertex of each rectangular first quadrangle having a side along a first direction and a side along a second direction substantially orthogonal to the first direction. Of each of the rectangular second quadrilaterals having four inner peripheral regions arranged at positions, a side along the first direction, and a side along the second direction and surrounding the first quadrilateral And four outer peripheral regions arranged at the position of the vertex, wherein the polarization setting means sets the polarization states of the light beams passing through the four inner peripheral regions and the four outer peripheral regions to the first direction. It is preferable to set a linear polarization state having a polarization plane in a direction forming an angle of approximately 45 degrees.

  Further, according to a preferable mode of the second mode, the polarization setting means has a depolarizer for depolarizing a light beam of linearly polarized light directed to the first region as needed. Further, it is preferable that the polarization setting unit has a phase member for changing the polarization plane of the light beam of the linear polarization toward the second region as needed. Preferably, the polarization setting means further includes a second phase member for changing incident elliptically polarized light into linearly polarized light having a polarization plane in a predetermined direction. Further, it is preferable to further include area changing means for changing the position and size of the plurality of peripheral areas independently of the central area. In this case, the illumination pupil forming unit converts the incident luminous flux into a central luminous flux toward the central area and a plurality of peripheral luminous fluxes respectively directing to the plurality of peripheral areas, and makes the luminous flux conversion for entering the area changing section. It is preferable to have an element.

  Further, according to a preferred aspect of the second aspect, the area changing means is a convex formed substantially complementary to the first prism having a refracting surface of a concave cross section and the refracting surface of the concave cross section of the first prism. And a second prism having a refracting surface of a rectangular cross section, wherein a distance between the first prism and the second prism is variably configured, and the refracting surface is a planar central portion substantially orthogonal to the optical axis Have. In this case, the refracting surface preferably has the central portion and a peripheral conical portion corresponding to a side surface of the conical body centered on the optical axis. Also, in this case, preferably, the peripheral cone has one peripheral cone corresponding to the side of one cone centered on the optical axis. Alternatively, the peripheral cone has an inner peripheral cone corresponding to a side surface of the first cone centered on the optical axis, and a second apex centered on the optical axis and smaller than the first cone. It is preferred to have an outer peripheral cone which corresponds to the side of the two cones. Further, it is preferable that the area changing unit has a plurality of sets of the replaceable first prism and the second prism, and the area of the central portion is different for each set.

In a third aspect of the present invention, an illumination optical apparatus for illuminating a surface to be illuminated includes:
Illumination pupil forming means for forming an illumination pupil distribution having a light intensity distribution located in a first region and a light intensity distribution located in a second region in the pupil plane of the illumination optical device or in the vicinity thereof; An illumination optical apparatus comprising: polarization state changing means for changing the polarization state of a light beam passing through two regions independently of the polarization state of a light beam passing through the first region. .

  According to a preferred aspect of the third aspect, the first region has a central region including an optical axis, and the second region has a peripheral region spaced from the optical axis. Preferably, the polarization state changing means changes the state of the light beam passing through the first region between a non-polarization state and a linear polarization state. Preferably, the polarization state changing means changes the state of the light beam passing through the second region between two linearly polarized states having polarization planes in different directions. Further, it is preferable that the polarization state changing means has a depolarizing element for depolarizing a light beam of linear polarization toward the first region as necessary. In this case, the depolarization element is preferably configured to be insertable into and removable from the optical path.

  Further, according to a preferred aspect of the third aspect, the polarization state changing means has a phase member for changing the polarization plane of the light beam of the linear polarization toward the second region as necessary. Preferably, the polarization state changing means further includes a second phase member for changing incident elliptically polarized light into linearly polarized light having a polarization plane in a predetermined direction. Further, it is preferable to further include area changing means for changing the position and size of the plurality of peripheral areas independently of the central area. In this case, the illumination pupil forming unit converts the incident luminous flux into a central luminous flux toward the central area and a plurality of peripheral luminous fluxes respectively directing to the plurality of peripheral areas, and makes the luminous flux conversion for entering the area changing section. It is preferable to have an element.

  Further, according to a preferable aspect of the third aspect, the area changing means is a convex formed substantially complementary to the first prism having a refracting surface of a concave cross section and the refracting surface of the concave cross section of the first prism. And a second prism having a refracting surface of a rectangular cross section, wherein a distance between the first prism and the second prism is variably configured, and the refracting surface is a planar central portion substantially orthogonal to the optical axis Have. In this case, the refracting surface preferably has the central portion and a peripheral conical portion corresponding to a side surface of the conical body centered on the optical axis. Also, in this case, preferably, the peripheral cone has one peripheral cone corresponding to the side of one cone centered on the optical axis. Alternatively, the peripheral cone has an inner peripheral cone corresponding to a side surface of the first cone centered on the optical axis, and a second apex centered on the optical axis and smaller than the first cone. It is preferred to have an outer peripheral cone which corresponds to the side of the two cones. Further, it is preferable that the area changing unit has a plurality of sets of the replaceable first prism and the second prism, and the area of the central portion is different for each set.

According to a fourth aspect of the present invention, there is provided an illumination optical apparatus for illuminating a surface to be illuminated,
An illumination pupil forming means for forming a light intensity distribution located in a ring-shaped area substantially centered on the optical axis is provided at or near the pupil plane of the illumination optical device.
The ring-shaped area has a plurality of areas along the circumferential direction of a circle substantially centered on the optical axis, and the polarization states of a plurality of light beams respectively passing through the plurality of areas of the ring-shaped area The illumination optical apparatus further includes polarization setting means for setting a linear polarization state having a polarization plane along a direction substantially in contact with the circle substantially at the center of each of the plurality of regions.

  According to a preferred aspect of the fourth aspect, the polarization setting means has a plurality of phase members arranged to correspond to the plurality of regions, and each phase member has a polarization plane of linearly polarized light incident thereon. Change as needed.

  According to a fifth aspect of the present invention, there is provided an exposure apparatus comprising the illumination optical device according to any one of the first to fourth aspects for illuminating a mask, and exposing the pattern of the mask onto a photosensitive substrate. . In this case, the apparatus further comprises a projection optical system for forming an image of the pattern of the mask on the photosensitive substrate, and a pupil plane of the illumination optical device is positioned substantially conjugate to a pupil position of the projection optical system Is preferred.

In a sixth aspect of the present invention, an illumination step of illuminating a mask using the illumination optical device of the first to fourth aspects,
And an exposure step of exposing the pattern of the mask onto a photosensitive substrate. In this case, the exposure step includes a projection step of forming an image of the pattern of the mask on the photosensitive substrate using a projection optical system, and a pupil plane of the illumination optical device is a pupil position of the projection optical system Preferably, it is positioned approximately conjugate to

  In the illumination optical apparatus according to the present invention, the position and the size of the light intensity distribution formed in the pupil plane or in the vicinity thereof and located in a plurality of peripheral areas separated from the optical axis by the action of the area changing means consisting of a prism pair, for example Can be changed independently of the light intensity distribution located in the central region including the optical axis. Further, for example, by the action of polarization setting means comprising a half-wave plate and a deflection prism assembly, the light flux passing through the first area as a central area including the optical axis is set to a non-polarization state and The light flux passing through the second area as one or more peripheral areas spaced from the light source can be set to a linear polarization state (generally, a polarization state). In addition, the polarization of the light beam passing through the second area as one or more peripheral areas separated from the optical axis by the action of the polarization state changing means consisting of, for example, a half wave plate and the deflection prism assembly. The state can be changed independently of the polarization state of the light flux passing through the first area as a central area including the optical axis.

  Therefore, for example, when the illumination optical apparatus of the present invention is mounted on an exposure apparatus, appropriate illumination conditions necessary for faithfully transferring a mask pattern having various characteristics, such as light intensity distribution and polarization state of a secondary light source, etc. Can realize diverse lighting conditions. Further, in the exposure apparatus and the exposure method using the illumination optical device of the present invention, appropriate illumination conditions necessary for faithfully transferring a mask pattern having various characteristics can be realized, so Good exposure can be performed under appropriate lighting conditions realized accordingly, which in turn can produce good devices with high throughput.

It is a figure showing roughly the composition of the exposure device provided with the illumination optical device concerning a 1st embodiment of the present invention. It is a figure which shows the secondary light source of the Z direction tripolar form formed in a pupil plane, and the secondary light source of the X direction tripolar form. It is a figure which shows roughly the structure and operation | movement of a prism pair arrange | positioned in the optical path between the front lens group of an afocal lens, and a back lens group. It is a figure explaining the effect | action of a prism pair with respect to a Z direction tripolar secondary light source. It is a figure explaining the effect | action of the zoom lens with respect to a Z direction 3 pole-like secondary light source. It is a figure explaining the effect | action of a prism pair with respect to the X direction 3 pole-like secondary light source. It is a figure explaining the effect | action of the zoom lens with respect to the X direction 3 pole-like secondary light source. It is a figure which shows the 5-pole-like secondary light source and the 9-pole-like secondary light source formed in a pupil plane. It is a figure explaining the effect | action of a prism pair with respect to a 5 pole-like secondary light source. It is a figure explaining the effect | action of the zoom lens with respect to a 5 pole-like secondary light source. FIG. 6 schematically illustrates the configuration and operation of a two-stage prism pair for 9-pole illumination. It is a figure explaining the effect | action of a two-stage-type prism pair with respect to a 9 pole-like secondary light source. FIG. 7 schematically shows an example of interchangeable prism pairs having different central areas. It is a figure which shows roughly the structure of the exposure apparatus provided with the illumination optical apparatus concerning 2nd Embodiment of this invention. It is a figure showing roughly the important section composition of a 2nd embodiment. It is a figure explaining the setting example of the polarization | polarized-light state of the peripheral surface light source in 3 pole illumination of 2nd Embodiment, and a center surface light source. It is a figure explaining the example of a setup of the polarization state of the peripheral surface light source and the central surface light source in 5-pole illumination of a 2nd embodiment. It is a figure explaining another setting example of a polarization state of a peripheral surface light source and a central surface light source in 5-pole illumination of a 2nd embodiment. It is a figure explaining the setting example of the polarization state of the peripheral surface light source in 9 pole illumination of a 2nd embodiment, and a central surface light source. It is a figure explaining another setting example of a polarization state of a peripheral surface light source and a central surface light source in 9 pole illumination of a 2nd embodiment. It is a figure which shows roughly an example of the principal part structure for implement | achieving the polarization | polarized-light state of FIG. FIG. 20 is a view schematically showing another example of the main configuration for achieving the polarization state of FIG. 19; It is a figure explaining the setting example of the polarization state in annular zone illumination of a 2nd embodiment. It is a flowchart of the method at the time of obtaining the semiconductor device as a micro device. It is a flowchart of the method at the time of obtaining the liquid crystal display element as a micro device.

  Embodiments of the present invention will be described based on the attached drawings.

  FIG. 1 is a view schematically showing a configuration of an exposure apparatus provided with an illumination optical apparatus according to a first embodiment of the present invention. In FIG. 1, the Z axis is along the normal direction of the wafer W, which is a photosensitive substrate, the Y axis is in the direction parallel to the paper surface of FIG. The X axis is set in the direction perpendicular to the paper. The exposure apparatus of the first embodiment includes a light source 1 for supplying exposure light (illumination light).

  As the light source 1, for example, a KrF excimer laser light source for supplying light of a wavelength of 248 nm, an ArF excimer laser light source for supplying light of a wavelength of 193 nm, or the like can be used. A substantially parallel light beam emitted from the light source 1 along the Z direction has a rectangular cross section elongated along the X direction, and enters a beam expander 2 composed of a pair of lenses. Each lens has negative refractive power and positive refractive power, respectively, in the plane of FIG. 1 (in the YZ plane). Therefore, the light flux incident on the beam expander 2 is expanded in the plane of the drawing of FIG. 1 and shaped into a light flux having a predetermined rectangular cross section.

  The substantially parallel light flux passing through the beam expander 2 as the shaping optical system is deflected in the Y direction by the bending mirror, and then enters the afocal lens (relay optical system) 4 via the diffractive optical element 3. In general, a diffractive optical element is configured by forming a step having a pitch of about the wavelength of exposure light (illumination light) on a substrate, and has the function of diffracting an incident beam to a desired angle. Specifically, when a parallel beam having a rectangular cross section is incident, the diffractive optical element 3 has, for example, a circular light intensity centered on the optical axis AX in the far field (or the Fraunhofer diffraction region). It has a function of forming three circular light intensity distributions consisting of a distribution and two circular light intensity distributions spaced in the Z direction with the optical axis AX as the center.

  On the other hand, the afocal lens 4 is set so that its front focal position and the position of the diffractive optical element 3 substantially coincide, and that the rear focal position and the position of the predetermined surface 5 indicated by a broken line in the drawing substantially coincide. It is an afocal system (afocal optical system). Therefore, after forming substantially circular light intensity distributions on the pupil plane of the afocal lens 4, the approximately parallel light beams entering the diffractive optical element 3 are emitted from the afocal lens 4 as approximately parallel light beams. In the optical path between the front lens group 4a and the rear lens group 4b of the afocal lens 4, a prism pair 6 as an axicon system is disposed in the pupil or in the vicinity thereof. The action will be described later.

  The diffractive optical element 3 is configured to be insertable into and removable from the illumination light path, and is configured to be exchangeable with other diffractive optical elements that form different light intensity distributions in the far field. Similarly, the prism pair 6 is configured to be insertable into and removable from the illumination light path, and is configured to be interchangeable with other prism pairs having different configurations and functions. Hereinafter, in order to simplify the description, the basic configuration and operation of the first embodiment will be described, neglecting the operation of the prism pair 6. The light flux passing through the afocal lens 4 is incident on the microlens array 8 through the zoom lens (variable magnification optical system) 7.

  Here, the position of the predetermined surface 6 is disposed near the front focal position of the zoom lens 7, and the incident surface of the microlens array 8 is disposed near the rear focal position of the zoom lens 7. In other words, the zoom lens 7 arranges the predetermined surface 6 and the incident surface of the microlens array 8 substantially in a Fourier transform relationship, and hence the pupil surface of the afocal lens 4 and the incident surface of the microlens array 8. It is arranged optically almost conjugately. Therefore, similarly to the pupil plane of the afocal lens 4, on the incident plane of the microlens array 8, the illumination field of a circular shape centered on the optical axis AX and the space in the Z direction centered on the optical axis AX are separated. Three circular illumination fields are formed, which consist of two circular illumination fields. The overall shapes of the three circular illumination fields change analogously depending on the focal length of the zoom lens 7.

  The microlens array 8 is an optical element composed of microlenses having a large number of positive refracting powers which are densely and longitudinally arranged. In general, a microlens array is configured, for example, by etching a plane-parallel plate to form a microlens group. Here, each microlens forming the microlens array is smaller than each lens element forming the fly's eye lens. Also, unlike a fly's-eye lens consisting of lens elements separated from one another, the micro lens array is integrally formed without a large number of micro lenses (micro refracting surfaces) being separated from one another. However, the microlens array is an optical integrator of the same wavefront splitting type as the fly's-eye lens in that lens elements having positive refracting power are arranged longitudinally and laterally.

  Each of the micro lenses forming the micro lens array 8 has a rectangular cross section similar to the shape of the illumination field to be formed on the mask M (and thus the shape of the exposure region to be formed on the wafer W). The light beam incident on the microlens array 8 is divided two-dimensionally by a large number of microlenses, and the illumination formed by the incident light beam on the microlens array 8 is formed on the back focal plane (and hence on the illumination pupil plane or the like). As shown in FIG. 2A, a secondary light source having substantially the same light intensity distribution as that of the field, a circular light intensity distribution (substantially surface light source) 30a centered on the optical axis AX and the optical axis AX Thus, a Z direction tripolar secondary light source is formed, which is composed of two circular light intensity distributions (substantially surface light sources) 30b separated in the Z direction.

  A light flux from a Z direction tripolar secondary light source formed on the back focal plane of the microlens array 8 (generally, a predetermined light intensity distribution formed in the pupil plane of the illumination optical device or in the vicinity thereof) After passing through the condenser optical system 9, the mask blind 10 is illuminated in a superimposed manner. Thus, in the mask blind 10 as the illumination field stop, a rectangular illumination field is formed in accordance with the shape and focal length of each of the microlenses constituting the microlens array 8. The light beam passing through the rectangular opening (light transmitting portion) of the mask blind 10 receives the light condensing action of the imaging optical system 11, and illuminates the mask M on which a predetermined pattern is formed in a superimposed manner.

  Thus, the imaging optical system 11 forms an image of the rectangular opening of the mask blind 10 on the mask M. The light beam transmitted through the pattern of the mask M forms an image of the mask pattern on the wafer W, which is a photosensitive substrate, through the projection optical system PL. Thus, by performing collective exposure or scan exposure while drivingly controlling the wafer W in a two-dimensional manner in a plane (XY plane) orthogonal to the optical axis AX of the projection optical system PL, a mask is provided for each exposure region of the wafer W The M patterns are sequentially exposed.

  As described above, the diffractive optical element 3, the afocal lens 4, the zoom lens 7, and the micro lens array 8 are positioned in the central area including the optical axis AX at or near the pupil plane of the illumination optical device (1 to 11). Light intensity distribution, ie, a circular surface light source 30a centered on the optical axis AX, and light intensity distributions located in a plurality of peripheral regions spaced from the optical axis AX, ie, an interval in the Z direction centered on the optical axis AX An illumination pupil forming means is formed to form an illumination pupil distribution having two circular surface light sources 30b separated from each other. In addition, the diffractive optical element 3 has two incident light beams, a central light beam corresponding to a circular surface light source 30a centered on the optical axis AX, and two circular shapes spaced in the Z direction centered on the optical axis AX. The luminous flux conversion element for converting into the several peripheral luminous flux respectively corresponded to the surface light source 30b of is comprised.

  FIG. 3 is a diagram schematically showing the configuration and operation of a prism pair disposed in the optical path between the front lens group and the rear lens group of the afocal lens. As shown in FIG. 3, the prism pair 6 has a first prism member 6a having a flat surface directed to the light source side and a refracting surface of a concave cross section directed to the mask side and a flat surface directed to the mask side, as shown in FIG. It is comprised by the 2nd prism member 6b which turned the refractive surface of the convex-shaped cross section to the side. The refracting surface of the concave cross section of the first prism member 6a and the refracting surface of the convex cross section of the second prism member 6b are formed complementarily so as to be able to contact each other.

  More specifically, the refracting surface of the concave cross section of the first prism member 6a has a planar central portion 6c orthogonal to the optical axis AX, and a peripheral conical portion corresponding to the side surface of a cone centered on the optical axis AX And 6d. Similarly, the refracting surface of the convex cross section of the second prism member 6b has a planar central portion 6e orthogonal to the optical axis AX and a peripheral conical portion 6f corresponding to the side surface of the conical body centered on the optical axis AX Have. Further, at least one of the first prism member 6a and the second prism member 6b is configured to be movable along the optical axis AX, and the refracting surface of the concave cross section of the first prism member 6a and the second prism member 6b The distance between the convex cross section and the refracting surface is variable.

  In the prism pair 6, as shown in FIG. 3, the central luminous flux 31a forming the circular central surface light source 30a of the Z direction tripolar secondary light source with the optical axis AX at the center is the first prism member 6a. And the central portion 6e of the second prism member 6b. On the other hand, two peripheral light beams 31b forming two circular peripheral surface light sources 30b spaced apart in the Z direction centering on the optical axis AX among the Z direction three pole secondary light sources are the first prism member It passes through the peripheral cone 6d of 6a and the peripheral cone 6f of the second prism member 6b.

  Here, in a state where the concave refracting surface of the first prism member 6a and the convex refracting surface of the second prism member 6b are in contact with each other, the prism pair 6 is parallel to the central light beam 31a and the two peripheral light beams 31b. It functions as a flat plate and has no influence on the formed Z-direction tripolar secondary light source. However, when the concave refracting surface of the first prism member 6a and the convex refracting surface of the second prism member 6b are separated, the prism pair 6 does not affect the central light beam 31a, but the two peripheral light beams 31b are In contrast, the prism pair 6 functions as a so-called beam expander.

  FIG. 4 is a diagram for explaining the action of a prism pair on a Z-direction tripolar secondary light source. As shown in FIG. 4, the two circular peripheral surface light sources 32 b constituting the Z direction tripolar secondary light source expand the distance between the pair of prisms 6 from zero to a predetermined value, and thereby the optical axis AX While moving outward along the radial direction of the circle centering on, the shape changes from circular to elliptical. That is, a line connecting the central point of the circular peripheral surface light source 32b before the change and the central point of the elliptical peripheral surface light source 33b after the change passes the optical axis AX, and the movement distance of the central point is the prism pair 6 Depends on the interval of

  Furthermore, the angle at which the circular peripheral surface light source 32b before change is viewed from the optical axis AX (the angle formed by a pair of tangents from the optical axis AX to the peripheral surface light source 32b) and the elliptical peripheral surface light source 33b after change The angle seen from the optical axis AX is equal. Then, the difference between the diameter of the circular peripheral surface light source 32b before the change, that is, the difference between the radius of the circle circumscribing the two peripheral surface light sources 32b as the optical axis AX and the radius of the inscribed circle, and the ellipse after the change as the optical axis AX. The difference between the radius of the circle circumscribing the peripheral surface light source 33b of the shape and the radius of the inscribed circle is equal. Thus, the circular peripheral surface light source 32b changes in the circumferential direction depending on the distance between the prism pairs 6, but does not change in the radial direction. On the other hand, the circular central surface light source 32a constituting the Z direction tripolar secondary light source is not affected even if the distance between the prism pairs 6 is increased from zero to a predetermined value.

  Therefore, if the distance between the pair of prisms 6 is increased from zero to a predetermined value, the position and size of the two circular peripheral surface light sources 32b constituting the Z direction three pole secondary light source is three poles in the Z direction. Changes independently of the circular central surface light source 32a constituting the secondary light source. In other words, the prism pair 6 is formed at or near the pupil plane, and the position and size of the light intensity distribution (two peripheral surface light sources 32b) located at a plurality of peripheral regions spaced from the optical axis AX The area changing means is configured to change independently of the light intensity distribution (central plane light source 32a) formed in the pupil plane or in the vicinity thereof and located in the central area including the optical axis AX.

  FIG. 5 is a diagram for explaining the action of the zoom lens with respect to the Z direction tripolar secondary light source. As shown in FIG. 5, when the focal length of the zoom lens 7 changes, the two circular peripheral surface light sources 32b spaced in the Z direction with respect to the optical axis AX maintain the circular shape and the optical axis AX Move along the radial direction of the circle centered on. A line connecting the center point of the peripheral surface light source 32b before the change and the center point of the peripheral surface light source 34b after the change passes the optical axis AX, and the movement distance and movement direction of the center point is the focal point of the zoom lens 7. It depends on the change of distance.

  Further, the angle at which the peripheral surface light source 32b before change is viewed from the optical axis AX is equal to the angle at which the peripheral surface light source 34b after change is viewed from the optical axis AX. On the other hand, when the focal length of the zoom lens 7 changes, the central point of the circular central surface light source 32a centered on the optical axis AX does not move, but the size changes. Specifically, the ratio of the diameter of central surface light source 32a before change to the diameter of central surface light source 34a after change is the diameter of peripheral surface light source 32b before change and the diameter of peripheral surface light source 34b after change. It is the same as the ratio. Thus, by changing the focal length of the zoom lens 7, it is possible to change the overall shape of the tripolar secondary light source similarly.

  In addition, X direction three pole illumination can be performed by setting a diffractive optical element for X direction three pole illumination in the illumination light path instead of the diffractive optical element 3 for Z direction three pole illumination. The diffractive optical element for three-pole illumination in the X direction is, for example, a circular light intensity distribution centered on the optical axis AX and an interval in the X direction centered on the optical axis AX in the far field when parallel luminous flux is incident And the function of forming three circular light intensity distributions consisting of two circular light intensity distributions. Therefore, as shown in FIG. 2B, the light beam passing through the diffractive optical element for X-direction triode illumination has a circular light intensity distribution (central surface light source) 30a centered on the optical axis AX and the optical axis A three-pole X-direction secondary light source is formed, which is composed of two circular light intensity distributions (peripheral surface light sources) 30c spaced apart in the X direction with AX as a center.

  Then, as shown in FIG. 6, when the distance between the pair of prisms 6 is expanded from zero to a predetermined value, as in the case of the Z-direction three-pole illumination in FIG. The positions and sizes of the two circular peripheral surface light sources 32c change independently of the circular central surface light source 32a constituting the X direction tripolar secondary light source. That is, depending on the distance between the pair of prisms, the center position of the circular peripheral surface light source 32c moves in the radial direction, and the size thereof changes only in the circumferential direction, and the elliptical peripheral surface light source 33c become. On the other hand, the central position and size of the circular central surface light source 32a do not change even if the distance between the pair of prisms 6 changes.

  Further, as shown in FIG. 7, when the focal length of the zoom lens 7 is changed, as in the case of the Z-direction tripolar illumination of FIG. 5, the circular central surface light source 32a and the two circular peripheral surface light sources The overall shape of the X direction triode-like secondary light source consisting of 32c changes similarly. That is, depending on the change of the focal length of the zoom lens 7, the center position of the circular peripheral surface light source 32c moves in the radial direction, and the size thereof changes in a similar manner. It becomes a light source 34c. On the other hand, the circular central surface light source 32a changes its size in a similar manner depending on the change of the focal length of the zoom lens 7 to become the circular central surface light source 34a, but the central position changes do not do.

  In addition, instead of the diffractive optical element 3 for Z-direction tripolar illumination, pentapolar illumination can be performed by setting a diffractive optical element for 5-pole illumination in the illumination light path. The diffractive optical element for five-pole illumination has, for example, a circular light intensity distribution centered on the optical axis AX and an X direction centered on the optical axis AX in the far field when a collimated beam is incident. It has a function of forming five circular light intensity distributions consisting of four circular light intensity distributions disposed at the positions of the vertices of a square (or rectangle) having sides and sides along the Z direction. Therefore, as shown in FIG. 8A, the light beam passing through the diffractive optical element for five-pole illumination has a circular light intensity distribution (central surface light source) 30a centered on the optical axis AX, and the optical axis AX Light intensity distribution (peripheral surface light source) 30d arranged at the position of each vertex of a square having a side along the X direction and a side along the Z direction centering on Form the next light source.

  Then, as shown in FIG. 9, when the distance between the pair of prisms 6 is expanded from zero to a predetermined value, as in the case of three-pole illumination in the Z direction in FIG. 4 and three-pole illumination in the X direction in FIG. The positions and sizes of the four circular peripheral surface light sources 32d constituting the secondary light source change independently of the circular central surface light source 32a constituting the pentapolar secondary light source. That is, depending on the distance between the pair of prisms, the central position of the circular peripheral surface light source 32d moves in the radial direction, and the size thereof changes only in the circumferential direction, and the elliptical peripheral surface light source 33d become. On the other hand, the central position and size of the circular central surface light source 32a do not change even if the distance between the pair of prisms 6 changes.

  Further, as shown in FIG. 10, when the focal length of the zoom lens 7 is changed, the circular central surface light source 32a is used as in the case of the Z direction tripolar illumination of FIG. 5 or the X direction tripolar illumination of FIG. The overall shape of the five-pole secondary light source, which is composed of the four circular peripheral surface light sources 32d, similarly changes. That is, depending on the change of the focal length of the zoom lens 7, the central position of the circular peripheral surface light source 32d moves in the radial direction, and the size thereof changes in a similar manner. It becomes a light source 34d. On the other hand, the circular central surface light source 32a changes its size in a similar manner depending on the change of the focal length of the zoom lens 7 to become the circular central surface light source 34a, but the central position changes do not do.

  Further, nine-pole illumination can be performed by setting a diffractive optical element for nine-pole illumination in the illumination light path instead of the diffractive optical element 3 for Z-direction three-pole illumination. The diffractive optical element for nine-pole illumination has, for example, a circular light intensity distribution centered on the optical axis AX and an X direction centered on the optical axis AX in the far field when a collimated beam is incident. Four circular light intensity distributions arranged at positions of vertices of a first square (or a first rectangle) having a side and a side along the Z direction, and a side along the X direction centered on the optical axis AX And four circular light intensity distributions disposed at the apexes of a second square (or second rectangle) having sides along the Z direction and surrounding the first square (or first rectangle) It has a function of forming a light intensity distribution of five circular shapes.

  Therefore, as shown in FIG. 8B, the light beam passing through the diffractive optical element for nine-pole illumination has a circular light intensity distribution (central surface light source) 30a centered on the optical axis AX, and the optical axis AX Light intensity distribution (inner peripheral surface light source) 30e arranged at the position of each vertex of the first square having a side along the X direction centering on the X direction and a side along the Z direction, and the optical axis AX Light intensity distribution of four circular shapes (outer peripheral surface) arranged at the position of each vertex of the second square surrounding the first square with the side along the X direction and the side along the Z direction centering on Light source) 30f forms a nine-pole secondary light source.

  In this case, although not shown, when the distance between the pair of prisms 6 is increased from zero to a predetermined value, as in the case of five-pole illumination in FIG. The position and the size of the inner peripheral surface light source and the four circular outer peripheral surface light sources change independently of the circular central surface light source constituting the nine-pole secondary light source. That is, depending on the distance between the pair of prisms 6, the center position of the circular inner peripheral surface light source and the outer peripheral surface light source moves in the radial direction, and the size changes only in the circumferential direction, thereby forming an elliptical shape. Become the inner peripheral surface light source and the outer peripheral surface light source. On the other hand, in the case of a circular central surface light source, the center position and the size thereof do not change even if the distance between the prism pairs 6 changes.

  Further, when the focal length of the zoom lens 7 is changed, as in the case of the five-pole illumination of FIG. 10, a circular central surface light source, four circular inner peripheral surface light sources, and four circular outer peripheral surfaces The overall shape of the nine-pole secondary light source comprising the light source changes analogously. That is, the center positions of the circular inner peripheral surface light source and the outer peripheral surface light source move in the radial direction depending on the change of the focal length of the zoom lens 7, and the sizes change similarly. It becomes circular inner peripheral surface light source and outer peripheral surface light source. On the other hand, the circular central surface light source changes its size in a similar manner depending on the change of the focal length of the zoom lens 7 to become a circular central surface light source, but the central position does not change.

  In the above description, in the case of 9-pole illumination, as shown in FIG. 2, a one-stage prism pair 6 having a peripheral conical portion (6d, 6f) whose refractive surface is one is used. However, for nine-pole illumination, it is also possible to use a two-staged prism pair 60 whose refractive surface has two peripheral cones as shown in FIG. Referring to FIG. 11, the two-stage prism pair 60 has a first prism member 60a having a flat surface directed to the light source side and a refractive surface of a concave cross section directed to the mask side and a flat surface directed to the mask side. And it is comprised by the 2nd prism member 60b which turned the refractive surface of the convex-shaped cross section to the light source side. The refracting surface of the concave cross section of the first prism member 60a and the refracting surface of the convex cross section of the second prism member 60b are formed complementarily so as to be able to abut each other.

  More specifically, the refracting surface of the concave cross section of the first prism member 60a has a flat central portion 60c orthogonal to the optical axis AX and an inner side corresponding to the side surface of the first cone centered on the optical axis AX. It has a peripheral cone 60d and an outer peripheral cone 60e corresponding to the side of the second cone centered on the optical axis AX and having a smaller apex angle than the first cone. Similarly, the refracting surface of the convex cross section of the second prism member 60b has an inner peripheral cone corresponding to a flat central portion 60f orthogonal to the optical axis AX and a side surface of the first cone centered on the optical axis AX. It has a portion 60g and an outer peripheral conical portion 60h corresponding to the side of the second cone centered on the optical axis AX and having a smaller apex angle than the first cone. Further, at least one of the first prism member 60a and the second prism member 60b is configured to be movable along the optical axis AX, and the refracting surface of the concave cross section of the first prism member 60a and the second prism member 60b The distance between the convex cross section and the refracting surface is variable.

  In the two-stage prism pair 60, as shown in FIG. 11, the central luminous flux 31a forming the circular central surface light source 30a of the nine-pole secondary light source with the optical axis AX at the center is the first prism member. It passes through the central portion 60c of 60a and the central portion 60f of the second prism member 60b. Further, among the nine-pole secondary light sources, four inner peripheral light beams 31e forming the four inner peripheral surface light sources 30e disposed at the positions of the apexes of the first square centered on the optical axis AX It passes through the inner peripheral conical portion 60d of the first prism member 60a and the peripheral conical portion 60g of the second prism member 60b. Further, among the nine-pole secondary light sources, four outer peripheral luminous fluxes 31f forming four outer peripheral surface light sources 30f disposed at the positions of the vertices of the second square centered on the optical axis AX are It passes through the outer peripheral conical portion 60e of the first prism member 60a and the peripheral conical portion 60h of the second prism member 60b.

  Here, when the concave refracting surface of the first prism member 60a and the convex refracting surface of the second prism member 60b are in contact with each other, the central luminous flux 31a, the four inner peripheral luminous fluxes 31e and the four outer peripheral luminous fluxes 31f On the other hand, the two-stage prism pair 60 functions as a plane-parallel plate and has no influence on the formed nine-pole secondary light source. However, when the concave refracting surface of the first prism member 60a and the convex refracting surface of the second prism member 60b are separated, the two-stage prism pair 60 does not affect the central light beam 31a, but the four inner sides The two-stage prism pair 60 functions as a so-called beam expander for the peripheral light beam 31e and the four outer peripheral light beams 31f.

  FIG. 12 is a diagram for explaining the operation of a two-stage prism pair on a nine-pole secondary light source. However, in FIG. 12, only the central surface light source 32a, one inner peripheral surface light source 32e, and one outer peripheral surface light source 32f among the nine-pole secondary light source are shown for clarity of the drawing. . As shown in FIG. 12, the inner peripheral surface light source 32e and the outer peripheral surface light source 32f have a diameter of a circle centered on the optical axis AX by expanding the distance between the two-stage prism pair 60 from zero to a predetermined value. As it moves outward along the direction, its shape changes from circular to elliptical. That is, the line connecting the center points of the circular inner peripheral surface light source 32e and the outer peripheral surface light source 32f before the change and the central points of the elliptical inner peripheral surface light source 33e and the outer peripheral surface light source 33f after the change Through the axis AX, the distance traveled by the center point depends on the distance between the two-stage prism pair 60.

  Here, in the case of the two-stage prism pair 60, the moving distance from the circular outer peripheral surface light source 32f before the change to the elliptical peripheral outer surface light source 33f after the change is the circular shape before the change The moving distance from the inner peripheral surface light source 32 e to the elliptical peripheral inner peripheral surface light source 33 e after the change is larger, and the difference in the moving distance changes depending on the distance between the two-stage prism pair 60. Furthermore, the angle at which the circular inner peripheral surface light source 32e before change is viewed from the optical axis AX (the angle formed by a pair of tangents from the optical axis AX to the inner peripheral surface light source 32e), and the elliptical inner peripheral surface after the change. The angle at which the light source 33e is viewed from the optical axis AX is equal.

  Similarly, an angle at which the circular outer peripheral surface light source 32f before change is viewed from the optical axis AX (an angle formed by a pair of tangents from the optical axis AX to the outer peripheral surface light source 32f) and an elliptical outer peripheral edge after the change. The angle at which the surface light source 33f is viewed from the optical axis AX is equal. Here, when the circular inner peripheral surface light source 32e before the change and the circular outer peripheral surface light source 32f before the change have the same size, the circular inner peripheral surface light source 32e before the change has the optical axis AX The angle seen from the front is larger than the angle taken from the optical axis AX to the circular outer peripheral surface light source 32 f before the change.

  Then, the diameter of the circular inner peripheral surface light source 32e before the change, that is, the difference between the radius of the circle circumscribing the four inner peripheral surface light sources 32e as the optical axis AX and the radius of the circular inscribed to the four inner peripheral surface light sources The difference between the radius of the circle circumscribing the elliptical peripheral inner peripheral surface light source 33e and the radius of the inscribed circle is equal. Similarly, the diameter of the circular outer peripheral surface light source 32f before change, that is, the difference between the radius of the circle circumscribing the four outer peripheral surface light sources 32f as the optical axis AX and the radius of the inscribed circle, and the change as the optical axis AX The difference between the radius of the circle circumscribing the later elliptical outer peripheral surface light source 33f and the radius of the inscribed circle is equal. On the other hand, the circular central surface light source 32a constituting the nine-pole secondary light source is not affected even if the distance between the two-stage prism pair 60 is increased from zero to a predetermined value.

  As described above, in the first embodiment, a plurality of pupils formed at or near the pupil plane and separated from the optical axis AX by the action of the prism pair 6 (or the two-stage prism pair 60) as the area changing means The position and the size of the light intensity distribution (peripheral surface light source) located in the peripheral region of can be changed independently of the light intensity distribution (central surface light source) located in the central region including the optical axis AX. As a result, in the first embodiment, for example, the light intensity is rich in diversity with respect to the position and the size of a plurality of peripheral surface light sources which are changed independently of the central surface light source (that is, light intensity formed in or near the pupil plane) It is possible to realize three-pole illumination, five-pole illumination and nine-pole illumination, which are rich in distribution.

  In the first embodiment described above, a secondary light source is formed, which comprises a circular central surface light source centered on the optical axis AX and a plurality of circular peripheral surface light sources arranged symmetrically with respect to the optical axis AX. ing. However, the shape and position of each surface light source are not limited thereto, and in general, the light intensity distribution located in the central region including the optical axis AX and the light located in a plurality of peripheral regions spaced from the optical axis AX It is possible to form a secondary light source (illumination pupil distribution) having an intensity distribution.

  Further, in the above-described first embodiment, the secondary light sources having substantially the same size as the central surface light source including the optical axis AX and the peripheral surface light sources spaced from the optical axis AX are formed. However, the present invention is not limited to this, and by setting a diffractive optical element having desired characteristics in the illumination light path, the central surface light source can be made substantially larger than each peripheral surface light source, or each peripheral surface light source Variations are also possible in which the central surface light source is substantially reduced. In this case, it is preferable to replaceably provide one or more prism pairs having different central areas.

  Specifically, when the central surface light source is set to be substantially smaller than each peripheral surface light source, it is possible to use a prism pair having a relatively small area in the central portion as shown in FIG. 13 (a). When the central surface light source is set to be substantially larger than each peripheral surface light source, it is possible to use a prism pair having a relatively large area in the central portion as shown in FIG. 13 (b). Although only one example of a one-stage prism pair is shown in FIG. 13, it is possible to replaceably provide one or more two-stage prism pairs having different central areas if necessary. preferable.

  FIG. 14 is a view schematically showing a configuration of an exposure apparatus provided with an illumination optical apparatus according to a second embodiment of the present invention. Moreover, FIG. 15 is a figure which shows roughly the principal part structure of 2nd Embodiment. In FIG. 14 and FIG. 15, the illumination optical device is set to the Z-direction tripolar illumination state. The second embodiment has a configuration similar to that of the first embodiment. However, in the second embodiment, the quarter-wave plate 12 and the half-wave plate 13 are attached to the light source side of the prism pair 6, and the half-wave plate 14 and the deflection angle prism set on the mask side of the prism pair 6. The point in which the solid 15 is attached is different from the first embodiment. Hereinafter, the second embodiment will be described focusing on differences from the first embodiment.

  Referring to FIGS. 14 and 15, in the second embodiment, in the optical path between the front lens group 4a of the afocal lens 4 and the prism pair 6, in order from the light source side, the crystal optical axis is centered on the optical axis AX. A quarter-wave plate 12 configured to be rotatable, and a half-wave plate 13 having a crystal optical axis configured to be rotatable about an optical axis AX are disposed. Here, the 1⁄4 wavelength plate 12 has a function of converting the incident elliptically polarized light into linearly polarized light. The half-wave plate 13 has a function of converting the incident linearly polarized light into linearly polarized light having a polarization plane in a predetermined direction.

  When a KrF excimer laser light source or an ArF excimer laser light source is used as the light source 1, substantially linearly polarized light is supplied from the light source 1. In addition, in the optical path between the light source 1 and the diffractive optical element 3, a plurality of right-angle prisms as back surface reflecting mirrors are usually arranged. In general, when linearly polarized light is incident on a right-angle prism as a rear surface reflecting mirror, if the polarization plane of the incident linearly-polarized light does not match the p-polarization plane or the s-polarization plane, linearly polarized light is elliptical due to total reflection at the right-angle prism. It changes to polarization.

  In the second embodiment, even if elliptically polarized light is incident on the diffractive optical element 3 due to, for example, a right angle prism, the crystal optical axis of the quarter wavelength plate 12 is set according to the characteristics of the incident elliptically polarized light As a result, linearly polarized light enters the subsequent half-wave plate 13. The linearly polarized light incident on the half-wave plate 13 is converted into linearly polarized light having a polarization plane in an arbitrary direction according to the direction of the crystal optical axis. Thus, by the cooperative action of the 1⁄4 wavelength plate 12 and the 1⁄2 wavelength plate 13, linearly polarized light having a polarization plane in any direction is guided to the prism pair 6. Incidentally, even if the quarter wavelength plate 12 is disposed on the mask side of the half wavelength plate 13, an optically equivalent effect can be obtained.

  Further, in the second embodiment, between the pair of prisms 6 and the rear lens group 4b of the afocal lens 4, two peripheral light beams 31b forming two peripheral surface light sources 30b separated from the optical axis AX. In the light path, a ring-shaped half wave plate 14 in which a crystal optical axis is configured to be rotatable about an optical axis AX is disposed. Further, in the optical path of the central luminous flux 31a forming the central surface light source 30a including the optical axis AX between the prism pair 6 and the rear lens group 4b of the afocal lens 4, a wedge-shaped quartz prism 15a, A deflection prism assembly 15 integrally formed of a wedge-shaped quartz prism 15 b having a shape complementary to the quartz prism 15 a is disposed.

  The deflection prism assembly 15 is configured to be rotatable about the optical axis AX. Further, in the deflection prism assembly 15, the vertex direction of the quartz prism 15a and the vertex direction of the quartz prism 15b are set in the opposite direction so that the quartz prism 15b compensates (corrects) the deflection operation by the quartz prism 15a. It is configured. In the deflection prism assembly 15, the direction of the crystal optical axis of the quartz prism 15 a is set at an angle of 45 degrees with respect to the polarization plane of the incident linearly polarized light, so that the light is emitted from the deflection prism assembly 15. The light is converted to light in a substantially unpolarized state. On the other hand, if the direction of the crystal optical axis of the quartz prism 15a is at an angle of 0 ° or 90 ° with respect to the plane of polarization of the incident linearly polarized light, the plane of polarization of the incident linearly polarized light is unchanged as it is. It passes through the prismatic prism assembly 15.

  Thus, the half-wave plate 14 constitutes a phase member for changing the polarization plane of the linearly polarized light fluxes toward the two peripheral surface light sources 30b spaced from the optical axis AX as necessary. Specifically, by setting the crystal optical axis of the half-wave plate 14 to a desired angular position, the polarization state of the light reaching the two peripheral surface light sources 30b is linearly polarized light having a polarization plane in any direction. It can be set to the state.

  In addition, the deflection prism assembly 15 constitutes a depolarization element for depolarizing the light flux of the linear polarization toward the central plane light source 30a including the optical axis AX, as necessary. Specifically, by setting the crystal optical axis of the quartz crystal prism 15a in the deflection prism assembly 15 to a required angular position, the polarization state of the light reaching the central plane light source 30a can be expressed as a linear polarization state and a non-polarization state. Can be switched between. Alternatively, the deflection prism assembly 15 can be inserted into and removed from the light path, and a non-polarization state can be realized by setting the deflection prism assembly 15 in the light path, or the deflection prism assembly 15 can be It is also possible to realize a linearly polarized state while avoiding the light quantity loss by retracting the lens. Hereinafter, a setting example of the polarization state of the peripheral surface light source and the central surface light source in the 3-pole illumination, 5-pole illumination and 9-pole illumination of the second embodiment will be specifically described.

  FIG. 16 is a diagram for explaining a setting example of the polarization states of the peripheral surface light source and the central surface light source in the three-pole illumination of the second embodiment. In the case of the Z-direction tripolar illumination or the X-direction triode illumination, as shown in FIG. 16, they are spaced around the optical axis AX along the pitch direction of the line-and-space pattern 51 formed on the mask. Two peripheral surface light sources 41b are formed, and the polarization state of the light flux passing through the two peripheral surface light sources 41b is a straight line having a polarization plane (indicated by a double arrow in the figure) in a direction orthogonal to the pitch direction of the pattern 51, for example. Set to polarization state. In addition, the polarization state of the light flux passing through the central plane light source 41a about the optical axis AX is set to, for example, a non-polarization state.

  In this case, two-pole illumination suitable for the line-and-space pattern 51 (illumination of the mask by light flux from the two peripheral surface light sources 41b) and small σ illumination suitable for the isolated pattern 52 (central surface light source 41a The tripolar illumination in combination with the illumination of the mask by the light flux can realize faithful pattern transfer while improving the imaging performance of the projection optical system. In tripolar illumination, it is also possible to set the polarization state of the light flux passing through the central surface light source 41a to a linear polarization state having a polarization plane in a desired direction. Also, the polarization state of the light flux passing through the two peripheral surface light sources 41b can be set to a linear polarization state having a polarization plane in a desired direction.

  FIG. 17 is a diagram for explaining a setting example of the polarization states of the peripheral surface light source and the central surface light source in the five-pole illumination of the second embodiment. In the case of five-pole illumination, as shown in FIG. 17, four peripheral planes are located at the apex of each square (or rectangle) having sides along the pitch direction of the line-and-space pattern 51 formed on the mask. The light source 41d is formed, and the polarization state of the light flux passing through the four peripheral surface light sources 41d is set to, for example, a linear polarization state having a polarization plane (indicated by a double arrow in the figure) in the direction orthogonal to the pitch direction of the pattern 51. Do. In addition, the polarization state of the light flux passing through the central plane light source 41a about the optical axis AX is set to, for example, a non-polarization state.

  In this case, four-pole illumination (illumination of the mask by the light flux from the four peripheral surface light sources 41d) suitable for the line-and-space pattern 51 and small σ illumination (central surface light source 41a suitable for the isolated pattern 52) The five-pole illumination consisting of the combination with the illumination of the mask by the light flux makes it possible to realize a faithful pattern transfer while improving the imaging performance of the projection optical system. In the five-pole illumination, it is also possible to set the polarization state of the light flux passing through the central surface light source 41a to a linear polarization state having a polarization plane in a desired direction. Also, the polarization state of the light flux passing through the four peripheral surface light sources 41d can be set to a linear polarization state having a polarization plane in a desired direction. In particular, the polarization state of the light beam passing through the four peripheral surface light sources 41d can be set to, for example, a linear polarization state having a polarization plane in a direction forming an angle of 45 degrees with the spacing direction of the peripheral surface light sources 41d.

  Also, the polarization state of the light flux passing through each peripheral surface light source 41d can be set to a linear polarization state having a polarization plane in each desired direction. Typically, as shown in FIG. 18, the polarization state of the light flux passing through one pair of peripheral surface light sources 41d1 and 41d3 facing each other across the optical axis AX among the four peripheral surface light sources is referred to as the peripheral surface light source. A light beam passing through the other pair of peripheral surface light sources 41d2 and 41d4 opposite to each other with the optical axis AX set to a linearly polarized state having a polarization plane in the same direction that forms an angle of 45 degrees with the spacing direction of 41d1 and 41d3. It is also possible to set the polarization state of (1) to a linear polarization state having a polarization plane in the direction orthogonal to the polarization plane direction of the linear polarization passing through the peripheral surface light sources 41d1 and 41d3. However, in order to realize the polarization state shown in FIG. 18, instead of the ring-shaped half wave plate 14 shown in FIG. 15, it is possible to use the first light path in the optical path toward the pair of peripheral surface light sources 41 d 1 and 41 d 3. It is necessary to provide a half-wave plate and a second half-wave plate in the optical path of the light flux directed to the other pair of peripheral surface light sources 41d2 and 41d4.

  FIG. 19 is a diagram for explaining a setting example of the polarization states of the peripheral surface light source and the central surface light source in the 9-pole illumination of the second embodiment. In the case of nine-pole illumination, as shown in FIG. 19, four inner peripheral edges are located at the respective apexes of a square (or rectangle) having sides along the pitch direction of the line and space pattern 51a formed on the mask. A plane light source 41e is formed, and the polarization state of the light flux passing through the four inner peripheral surface light sources 41e is, for example, a linear polarization state having a polarization plane (indicated by a double arrow in the drawing) in a direction orthogonal to the pitch direction of the pattern 51a. Set to In addition, the polarization state of the light beam passing through the four outer peripheral surface light sources 41f is a polarization plane (indicated by a double-headed arrow in the drawing) in the direction orthogonal to the polarization plane direction of linearly polarized light passing the four inner peripheral surface light sources 41e. Set to linear polarization state.

  In addition, the polarization state of the light flux passing through the central plane light source 41a about the optical axis AX is set to, for example, a non-polarization state. In this case, the four-pole illumination (illumination of the mask by the light flux from the four inner peripheral surface light sources 41e) suitable for the line-and-space pattern 51a, and finer than the pattern 51a and orthogonal to the pitch direction of the pattern 51a Quadrupole illumination (illumination of the mask by the light flux from the four outer peripheral surface light sources 41f) suitable for the line-and-space pattern 51b having the pitch direction, and small sigma illumination (central surface light source 41a) suitable for the isolated pattern 52 By means of the nine-pole illumination consisting of the combination with the illumination of the mask by the light flux from the lens, it is possible to realize a faithful pattern transfer while improving the imaging performance of the projection optical system.

  In the nine-pole illumination, the polarization state of the light flux passing through the central surface light source 41a can be set to a linear polarization state having a polarization plane in a desired direction. Further, the polarization states of the light beams passing through the four inner peripheral surface light sources 41e and the polarization states of the light beams passing through the four outer peripheral surface light sources 41f are respectively set to linear polarization states having polarization planes in desired directions. You can also. In particular, the polarization states of the light flux passing through the four inner peripheral light sources 41e and the polarization states of the light flux passing through the four outer peripheral light sources 41f are polarized, for example, in a direction forming an angle of 45 degrees with the spacing direction of the peripheral light sources. It can also be set to a linear polarization state with faces.

  Typically, as shown in FIG. 20, of the four inner peripheral surface light sources, the polarization state of the light flux passing through one pair of opposed inner peripheral surface light sources 41e1 and 41e3 across the optical axis AX is The other pair of inner peripheral surface light sources 41e2 and 41e4 are set to linearly polarized light having a polarization plane in the same direction that forms an angle of 45 degrees with the spacing direction of the peripheral surface light sources 41e1 and 41e3 and sandwiches the optical axis AX. It is also possible to set the polarization state of the light flux passing through to the linear polarization state having the polarization plane in the direction orthogonal to the polarization plane direction of the linearly polarized light passing through the inner peripheral surface light sources 41e1 and 41e3.

  Similarly, among the four outer peripheral surface light sources, the polarization state of the light flux passing through one pair of the outer peripheral surface light sources 41f1 and 41f3 facing each other across the optical axis AX is the distance between the outer peripheral surface light sources 41f1 and 41f3. The polarization state of the light beam passing through the other pair of outer peripheral surface light sources 41f2 and 41f4 opposed to each other across the optical axis AX is set to a linear polarization state having a polarization plane in the same direction forming an angle of 45 degrees with the direction. It is also possible to set a linearly polarized light having a polarization plane in a direction orthogonal to the polarization plane direction of the linearly polarized light passing through the outer peripheral surface light sources 41f1 and 41f3.

  However, in order to realize the polarization state shown in FIG. 19, as shown in FIG. 21, instead of the prism pair 6 shown in FIG. 15, a two-stage prism pair 60 is disposed (or the prism pair 6 is used as it is) , Instead of the ring-shaped half-wave plate 14 shown in FIG. 15, a first ring-shaped half-wave rotatable about the optical axis AX in the optical path of the luminous flux 31e directed to the inner peripheral surface light source 41e In addition to the plate 14a, it is necessary to provide a second ring-shaped half wave plate 14b rotatable around the optical axis AX in the optical path of the light flux 31f directed to the outer peripheral surface light source 41f.

  Alternatively, as shown in FIG. 22, instead of the first ring-shaped half wave plate 14a of FIG. 21, in the optical path of the luminous flux 31a directed to the central surface light source 41a and the luminous flux 31e directed to the inner peripheral surface light source 41e. While providing the first circular half-wave plate 14c rotatable about the optical axis AX and replacing the second ring-shaped half-wave plate 14b of FIG. 21, it is directed to the central surface light source 41a. A configuration in which a second circular half-wave plate 14d rotatable about the optical axis AX is provided in the optical path of the luminous flux 31a, the luminous flux 31e directed to the inner peripheral surface light source 41e, and the luminous flux 31f directed to the outer peripheral surface light source 41f Is also possible.

  In the configuration of FIG. 22, the polarization state of the light flux passing through the inner peripheral surface light source 41e and the polarization state of the light flux passing through the outer peripheral surface light source 41f can both be set to the horizontal polarization state or the longitudinal polarization state. Also, the polarization state of the light flux passing through the inner peripheral surface light source 41e can be set to the transverse polarization state, and the polarization state of the light flux passing through the outer peripheral surface light source 41f can be set to the longitudinal polarization state. Also, the polarization state of the light flux passing through the inner peripheral surface light source 41e can be set to the longitudinal polarization state, and the polarization state of the light flux passing through the outer peripheral surface light source 41f can be set to the transverse polarization state.

  On the other hand, in order to realize the polarization state shown in FIG. 20, instead of the prism pair 6 shown in FIG. 15, a two-stage prism pair 60 is disposed (or using the prism pair 6 as it is). In place of the half-wave plate 14 of the first embodiment, a first half-wave plate is provided in the optical path of the light beam directed to one pair of inner peripheral surface light sources 41e1 and 41e3, and the other pair of inner peripheral surface light sources 41e2 and A second half-wave plate is provided in the light path of the light beam toward 41e4, and a third half-wave plate is provided in the light path of the light beam toward one pair of outer peripheral surface light sources 41f1 and 41f3; It is necessary to provide a fourth half-wave plate in the optical path of the light flux towards the pair of outer peripheral surface light sources 41f2 and 41f4.

  As described above, in the second embodiment, the half-wave plate 14 and the deflection prism assembly 15 are central plane light sources centered on the optical axis AX (generally, the center including the optical axis at or near the pupil plane). The light flux passing through the first region as a region is set to a non-polarization state, and one or a plurality of peripheral surface light sources spaced apart from the optical axis AX (generally spaced from the optical axis at or near the pupil plane) A polarization setting unit is configured to set a light beam passing through a plurality of second regions as peripheral regions to a linear polarization state (generally, a polarization state).

  According to another aspect, the half-wave plate 14 and the deflection prism assembly 15 are spaced apart from the optical axis AX (generally at or near the pupil plane). The polarization state of the light flux passing through one or more peripheral regions (second region) is defined as a central region including the optical axis at or near the pupil plane (generally at or near the pupil plane) about the optical axis AX. The polarization state changing means is configured to be changed independently of the polarization state of the light flux passing through the first region). The polarization state changing means (14, 15) changes the state of a light beam passing through a central plane light source (first region) centering on the optical axis AX, for example, between a non-polarization state and a linear polarization state.

  Further, the polarization state changing means (14, 15) are, for example, two straight lines having polarization planes in directions different from each other in polarization state of light flux passing through the peripheral surface light source (second region) spaced from the optical axis AX. Change between polarization states. As a result, in the second embodiment, in addition to the effect of the first embodiment, tripolar illumination, pentapolar illumination, and nine-pole illumination can be realized with a wide variety of positions and sizes of peripheral surface light sources. It is possible to realize tripolar illumination, pentapole illumination, and 9-pole illumination which are rich in the polarization state (including non-polarization state) of the peripheral surface light source and the central surface light source.

  In the second embodiment described above, the diffractive optical element for annular illumination is set in the illumination light path instead of the diffractive optical element 3 for Z-direction three-pole illumination, and the refractive surface is The annular illumination can be performed by using a prism pair having only one conical portion (hereinafter referred to as a “conical prism pair”) without having a planar central portion. The diffractive optical element for annular illumination has a function of forming a circular light intensity distribution centered on the optical axis AX, for example, in the far field when a collimated light beam is incident.

  Therefore, the light flux passing through the diffractive optical element for annular illumination forms a circular light intensity distribution centered on the optical axis AX on the pupil plane of the afocal lens 4. Then, in accordance with the distance between the pair of conical prisms, a ring-shaped illumination field centered on the optical axis AX is formed on the incident surface of the microlens array 8. As a result, as shown in FIG. 23A, the rear focal plane of the microlens array 8 (the pupil plane of the illumination optical device or in the vicinity thereof) is a ring-shaped substantial plane centered on the optical axis AX. A light source 35 is formed.

  Usually, a light flux passing through a ring-shaped surface light source has a constant polarization state (including a non-polarization state) throughout its entire area. On the other hand, a ring-shaped surface light source 35 shown in FIG. 23A has a plurality of (eight in FIG. 23) regions 35a to 35h along the circumferential direction of the circle centered on the optical axis AX, The polarization state of the light flux passing through each of the regions 35a to 35h is set to a linear polarization state having a polarization plane (indicated by a double-headed arrow in the drawing) along a direction substantially in contact with the circle at the center of each of the regions 35a to 35h There is.

  To realize the polarization state shown in FIG. 23 (a), for example, a phase member set shown in FIG. 23 (b) instead of the ring-shaped half wave plate 14 and deflection prism assembly 15 shown in FIG. It is necessary to set the solid 16 in the light path. Here, the phase member 16 has eight phase members 16a to 16h corresponding to eight regions 35a to 35h constituting the ring-shaped surface light source 35, and each of the phase members 16a to 16h is incident linearly polarized light Change the polarization plane of as necessary. Specifically, when linearly polarized light having a polarization plane in the horizontal direction in the drawing, ie, light of horizontal polarization, is incident on the phase member 16, the phase members 16a and 16e make an angle of 0 ° with the horizontal direction in the drawing. And a half wave plate having a crystal optical axis.

  Further, the phase members 16c and 16g are formed of half-wave plates having a crystal optical axis in a direction forming an angle of 45 degrees with respect to the horizontal direction in the drawing. Further, the phase members 16b and 16f are formed of half wave plates having a crystal optical axis in a direction forming an angle of 22.5 degrees counterclockwise with respect to the horizontal direction in the drawing. Further, the phase members 16d and 16h are formed of half-wave plates having a crystal optical axis in a direction forming an angle of 22.5 degrees clockwise with respect to the horizontal direction in the drawing.

  With this configuration, it is possible to set the light irradiated onto the mask M or the wafer W to a polarization state having S polarization as a main component. If the optical system (illumination optical system or projection optical system) on the wafer W side of the phase member assembly 16 has polarization aberration (retardation), it is caused by this polarization aberration (retardation). Polarization direction may change. In this case, in consideration of the influence of the polarization aberration of these optical systems, the state of changing the polarization plane by the phase member assembly 16 may be set. When a reflecting member is disposed in an optical system (illumination optical system or projection optical system) closer to the wafer W than the phase member assembly 16, the reflected light in the reflecting member has a phase difference for each polarization direction. Sometimes. Also in this case, it is sufficient to set a state in which the polarization plane is changed by the phase member assembly 16 in consideration of the phase difference of the light flux due to the polarization characteristic of the reflection surface. Here, the above-described matters can be applied not only to the modification shown in FIG. 23 but also to the first embodiment and the second embodiment. In the modification shown in FIG. 23, in addition to the ring-shaped surface light source 35 having a polarization plane in the circumferential direction, a circular central surface light source centered on the optical axis AX may be formed. .

  In the exposure apparatus according to the above-described embodiment, the mask (reticle) is illuminated by the illumination optical device (illumination step), and the transfer pattern formed on the mask is exposed on the photosensitive substrate using the projection optical system (exposure As a result, micro devices (semiconductor devices, imaging devices, liquid crystal display devices, thin film magnetic heads, etc.) can be manufactured. Hereinafter, referring to the flowchart in FIG. 24 for an example of a method for obtaining a semiconductor device as a micro device by forming a predetermined circuit pattern on a wafer as a photosensitive substrate or the like using the exposure apparatus of the above embodiment. To explain.

  First, in step 301 of FIG. 24, a metal film is deposited on one lot of wafers. In the next step 302, a photoresist is applied on the metal film on the one lot wafer. Thereafter, in step 303, using the exposure apparatus of the above-described embodiment, the image of the pattern on the mask is sequentially exposed and transferred to each shot area on the wafer of one lot through the projection optical system. Thereafter, development of the photoresist on the wafer of one lot is performed at step 304, and then etching is performed using the resist pattern as a mask on the wafer of one lot at step 305 to form a pattern on the mask. Corresponding circuit patterns are formed in each shot area on each wafer. Thereafter, by forming a circuit pattern of an upper layer and the like, a device such as a semiconductor element is manufactured. According to the above-described semiconductor device manufacturing method, a semiconductor device having a very fine circuit pattern can be obtained with high throughput.

  Moreover, in the exposure apparatus of the above-mentioned embodiment, the liquid crystal display element as a microdevice can also be obtained by forming a predetermined pattern (a circuit pattern, an electrode pattern, etc.) on a plate (glass substrate). Hereinafter, an example of the method at this time will be described with reference to the flowchart of FIG. In FIG. 25, in the pattern formation step 401, a so-called photolithographic step is performed in which the pattern of the mask is transferred and exposed onto a photosensitive substrate (a glass substrate or the like coated with a resist) using the exposure apparatus of the above embodiment. . By the photolithography process, a predetermined pattern including a large number of electrodes and the like is formed on the photosensitive substrate. Thereafter, the exposed substrate is subjected to steps such as a developing step, an etching step and a resist removing step to form a predetermined pattern on the substrate, and the process proceeds to the next color filter forming step 402.

  Next, in the color filter formation step 402, a set of three dots corresponding to R (Red), G (Green), and B (Blue) are arranged in a large number in a matrix, or three R, G, B The color filters are formed by arranging a set of stripe filters in a plurality of horizontal scan line directions. Then, after the color filter formation step 402, a cell assembly step 403 is performed. In the cell assembling step 403, a liquid crystal panel (liquid crystal cell) is assembled using the substrate having the predetermined pattern obtained in the pattern forming step 401, the color filter obtained in the color filter forming step 402, and the like.

  In the cell assembling step 403, for example, a liquid crystal is injected between the substrate having the predetermined pattern obtained in the pattern forming step 401 and the color filter obtained in the color filter forming step 402, Manufacture). Thereafter, in a module assembly process 404, components such as an electric circuit for performing a display operation of the assembled liquid crystal panel (liquid crystal cell) and a backlight are attached to complete a liquid crystal display element. According to the method of manufacturing a liquid crystal display element described above, a liquid crystal display element having a very fine circuit pattern can be obtained with high throughput.

In the above embodiment, KrF excimer laser light (wavelength: 248 nm) or ArF excimer laser light (wavelength: 193 nm) is used as the exposure light, but the present invention is not limited to this and other appropriate laser light sources The present invention can also be applied to, for example, an F ₂ laser light source that supplies laser light having a wavelength of 157 nm. Furthermore, although the present invention has been described by taking the projection exposure apparatus provided with the illumination optical device as an example in the above-mentioned embodiment, the present invention is applied to a general illumination optical apparatus for illuminating an illuminated surface other than a mask. It is clear that you can.

  Further, in the above-described embodiment, a method of filling a medium (typically, liquid) having a refractive index larger than 1.1, that is, a so-called liquid immersion method, is applied in the optical path between the projection optical system and the photosensitive substrate. You may. In this case, as a method for filling the liquid in the optical path between the projection optical system and the photosensitive substrate, a method for filling the liquid locally as disclosed in International Publication No. WO 99/49504, or A method of moving a stage holding a substrate to be exposed, as disclosed in Japanese Patent Application Laid-Open No. 6-124873, in a liquid tank, or a predetermined depth on a stage as disclosed in Japanese Patent Application Laid-Open No. 10-303114. For example, a method of forming a liquid reservoir and holding a substrate in the liquid reservoir can be employed.

As the liquid, it is preferable to use a liquid which is transparent to exposure light and has as high a refractive index as possible, and is stable to a projection optical system and a photoresist coated on the substrate surface, for example, KrF excimer laser light When the exposure light is ArF excimer laser light, pure water or deionized water can be used as the liquid. When F ₂ laser light is used as the exposure light, a fluorine-based liquid such as fluorine-based oil or perfluoropolyether (PFPE) capable of transmitting F ₂ laser light may be used as the liquid.

1 light source 3 diffractive optical element 4 afocal lens 6 prism pair (axicon system)
Reference Signs List 7 zoom lens 8 micro lens array 9 condenser optical system 10 mask blind 11 imaging optical system 12 quarter wave plate 13 half wave plate 14 half wave plate 15 depolarizing element 15 a quartz deflection prism 15 b quartz deflection angle Prism M Mask PL Projection Optical System W Wafer

Claims (17)

  An illumination optical apparatus for illuminating an object with illumination light, comprising:
  A polarizing element that changes the polarization state of the illumination light;
  An area changing member capable of changing the position of the illumination light distributed in an area away from the optical axis of the illumination optical apparatus in the illumination pupil plane of the illumination optical apparatus;
  And a fly's eye lens disposed in an optical path between the polarization element and the illumination pupil plane in the optical path of the illumination light,
  The polarizing element includes a first phase member and a second phase member arranged side by side with respect to the direction of the optical axis,
  In the first phase member and the second phase member, a part of the luminous flux of the illumination light passes through the first and second phase members, and the other part of the luminous flux is the first and the second phase members. It is arranged so as to pass through one of the two phase members but not through the other, so that the part of the light flux and the other part of the light flux are linearly polarized with polarization directions different from each other in the illumination pupil plane. Change the polarization state of the illumination light to
  The area changing member is disposed in an optical path on an incident side of the first phase member and the second phase member in an optical path of the illumination light.   The illumination optical device according to claim 1,
  The illumination optical device according to claim 1, wherein the light path of the other part of the light flux is farther from the light axis than the light path of the some light flux in the first phase member.   The illumination optical device according to claim 1 or 2, wherein
  The first and second phase members change the polarization state of the illumination light such that the polarization direction of the part of the light flux and the polarization direction of the other part of the light flux are orthogonal to each other in the illumination pupil plane. , Illumination optics.   The illumination optical device according to any one of claims 1 to 3, wherein
  The illumination optical apparatus, wherein the first phase member and the second phase member are each rotatably disposed.   The illumination optical device according to any one of claims 1 to 4, wherein
  The illumination optical device according to claim 1, wherein the first phase member and the second phase member are spaced apart from each other in the direction of the optical axis.   The illumination optical device according to any one of claims 1 to 5, wherein
  The polarizing element includes a half wave plate rotatably provided in an optical path on the incident side of the area changing member in the light path of the illumination light, and the half wave plate includes the light flux of the part An illumination optical device arranged to pass the other part of luminous flux.   The illumination optical device according to any one of claims 1 to 6, wherein
  The polarizing element includes a quarter wavelength plate rotatably provided in an optical path on the incident side of the area changing member in the light path of the illumination light, and the quarter wavelength plate includes the light flux of the part An illumination optical device arranged to pass the other part of luminous flux.   The illumination optical device according to any one of claims 1 to 7, wherein
  The illumination optical apparatus, wherein a crystal optical axis of the first phase member and a crystal optical axis of the second phase member are set in different directions in a plane intersecting the optical axis. The illumination optical device according to any one of claims 1 to 8, wherein
The fly-eye lens is disposed such that a back focal plane of the fly-eye lens coincides with the illumination pupil plane. In an exposure apparatus for transferring a pattern formed on a mask to a substrate,
The illumination optical device according to any one of claims 1 to 9, wherein the pattern is illuminated by illumination light;
And a projection optical system for projecting an image of the pattern illuminated by the illumination light onto the substrate. In the exposure apparatus according to claim 10,
The exposure apparatus according to claim 1, wherein the illumination optical device is disposed such that a position of the illumination pupil plane is conjugate to a pupil position of the projection optical system. In the exposure apparatus according to claim 10 or 11,
The exposure apparatus, wherein the projection optical system forms an image of the pattern on the substrate through a liquid provided in an optical path between the projection optical system and the substrate. In an exposure method for transferring a pattern formed on a mask to a substrate,
Illuminating the pattern with illumination light from the illumination optical device according to any one of claims 1 to 9;
Projecting an image of the pattern illuminated by the illumination light onto the substrate by a projection optical system;
Exposure method. In the exposure method according to claim 13,
Providing a liquid in the light path between the projection optics and the substrate;
Projecting an image of the pattern onto the substrate through the liquid;
Exposure method. Illuminating the mask with illumination light from the illumination optical device according to any one of claims 1 to 9;
Transferring the pattern on the mask illuminated by the illumination light to a substrate;
Developing the substrate to which the pattern has been transferred;
A device manufacturing method including: Transferring a pattern onto a substrate using the exposure apparatus according to any one of claims 10 to 12;
Developing the substrate to which the pattern has been transferred;
A device manufacturing method including: Transferring a pattern onto a substrate using the exposure method according to claim 13 or 14;
Developing the substrate to which the pattern has been transferred;
A device manufacturing method including:

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