JP6524844B2 - Coating apparatus, method of producing coated film, and coated film - Google Patents

Description

  The present invention relates to a coating apparatus, a method for producing a coated film using the coating apparatus, and a coated film.

  DESCRIPTION OF RELATED ART Conventionally, the apparatus provided with a backup roll is known as a coating apparatus which coats a coating liquid on a base film, and obtains a coated film (refer patent documents 1-3). In this coating device, the coating solution is coated on the base film while the base film is conveyed in a state where the base film is supported on the outer peripheral surface of the backup roll. Coating of the coating liquid is performed using a coater such as a die coater provided in the vicinity of the outer peripheral surface of the backup roll. The outer peripheral surface of the backup roll is a surface from the viewpoint of suppressing deformation of the base film, improving the surface accuracy of the outer peripheral surface of the backup roll, suppressing damage to the base film by rough surface, and suppressing eccentricity of the backup roll. It is generally a highly smooth surface with small roughness (usually, the arithmetic average roughness Ra is less than 0.02 μm).

Unexamined-Japanese-Patent No. 10-5664 JP, 2009-136712, A JP, 2005-046805, A

  In a coating apparatus using a backup roll, air may enter between the backup roll and the base film when the base film enters the backup roll. The invading air is retained between the backup roll and the base film to form an air pool, and causes the base film to be deformed such as wrinkles and slack. When such a deformed portion is generated in the base film, it becomes impossible to coat the coating liquid with a uniform thickness on the base film, and thickness unevenness occurs in the coated layer.

  When the thickness unevenness occurs, light interference may occur in the portion of the coating layer in which the thickness unevenness is formed, and the appearance may be uneven. Moreover, the thickness unevenness as described above may cause blocking when the coated film is wound in a roll shape. Furthermore, in the case where the coating layer contains particles for adjusting the surface shape of the coating layer, in the portion where thickness unevenness is formed, the thickness becomes excessive and the number of particles becomes extremely large and the haze is partially There is a possibility that the particles may be detached from the coating layer due to the height being increased or the thickness being insufficient. Therefore, it is desirable to suppress thickness unevenness.

  In patent document 1, when coating a coating liquid, conveying a metal web as a base film with a backup roll in order to suppress the above thickness unevenness, the metal web conveyed by a backup roll is used. A technique of pressing with an auxiliary roll has been proposed. According to the technology described in Patent Document 1, air that has entered between the metal web and the backup roll can be discharged by mechanical force as the auxiliary roll presses the metal web. However, in the technique described in Patent Document 1, since the auxiliary roll is brought into contact with the metal web, there is a possibility that adhesion of foreign matter may occur, and there is a possibility that the quality of the coated layer may be deteriorated.

  Moreover, in patent document 2, the technique of providing the pressure reduction apparatus which pressure-reduces the space formed between a base film and a backup roll in the position which a base film starts a contact with a backup roll is proposed. According to the technology described in Patent Document 2, it is possible to reduce the amount of air intruding between the base film and the backup roll. Therefore, the thickness nonuniformity of the coating layer which made the cause the air which infiltrates between a backup roll and a base film normally can be suppressed.

  However, in the case of application of the coating liquid to the base film whose surface smoothness is particularly high, the technique described in Patent Document 2 has difficulty in suppressing thickness unevenness of the coating layer. Since a common base film has a predetermined surface roughness, even when the base film is in contact with the backup roll, micro voids are formed between the base film and the backup roll. Therefore, when the amount of air which infiltrates by the technique of patent document 2 is reduced, since air can be accommodated in the said space | gap, a deformation | transformation of a base film can be suppressed. However, since the base film having particularly high surface smoothness does not have the above-mentioned voids, the deformation of the base film is suppressed even if the amount of air invading between the base film and the backup roll is small. It will be difficult to do. Therefore, when coating a coating liquid to a base film with especially high surface smoothness, with the technique of patent document 2, it was difficult to suppress the thickness nonuniformity of a coating layer.

  Further, Patent Document 3 describes a technique in which a concavo-convex pattern is formed on the outer peripheral surface of a backup roll, and a concave portion of the concavo-convex pattern is used as a suction port. If attention is focused only on the air that infiltrates between the base film and the backup roll, the air is considered to be sucked and removed from the suction port. However, in the technique described in Patent Document 3, the base film undulates along the uneven pattern on the outer peripheral surface of the backup roll. Therefore, a coating liquid can not be coated by uniform thickness on a substrate film, and it is difficult to eliminate thickness nonuniformity of a coating layer.

  Moreover, when conveying a base film by a backup roll, carrying out so that a base film may not slip on the outer peripheral surface of a backup roll is calculated | required. If the base film slips on the outer peripheral surface of the backup roll, position control of the base film becomes difficult, and it is difficult to stably coat the coating liquid.

  The present invention has been made in view of the problems described above, and on the base film having high surface smoothness, the slip of the base film on the outer peripheral surface of the backup roll is suppressed, and thickness unevenness is A coating apparatus capable of applying a coating liquid while suppressing; suppressing slippage of the base film on the outer peripheral surface of the backup roll on a base film having high surface smoothness, and suppressing thickness unevenness A method of producing a coated film, which can coat a coating liquid to produce a coated film; and a long coated film comprising a coated layer having a small number density of thickness unevenness. The purpose is

As a result of intensive studies to solve the above problems, the present inventor has found that by appropriately roughening the surface roughness of the outer peripheral surface of the backup roll, it is possible to suppress the slippage and thickness unevenness of the base film, It was completed.
That is, the present invention is as follows.

[1] A coating apparatus for coating a coating liquid on a substrate film,
A backup roll having an outer peripheral surface and rotatable while supporting the base film on the outer peripheral surface;
A coater which is provided to face the outer peripheral surface of the backup roll and can coat the coating solution on the base film supported by the outer peripheral surface of the backup roll;
The average value M (Ra (R)) of the arithmetic average roughness Ra (R) measured at five measurement positions on the outer peripheral surface of the backup roll is expressed by the following equation (1)
0.020 μm ≦ M (Ra (R)) <0.350 μm (1)
Meet the coating device.
[2] Average value M (RSm (R)) of average length RSm (R) of roughness curvilinear elements measured at five measurement positions of the outer circumferential surface of the backup roll, and of the backup roll The standard deviation σ (RSm (R)) of the average length RSm (R) of the roughness curvilinear element measured at five measurement positions on the outer peripheral surface is expressed by the following equation (2)
10% <σ (RSm (R)) / M (RSm (R)) <50% (2)
The coating apparatus according to [1], satisfying
[3] The coating apparatus according to [1] or [2], wherein the coater includes a die capable of discharging the coating liquid.
[4] A manufacturing method for producing a coated film using the coating apparatus according to any one of [1] to [3],
Conveying the base film while supporting the base film on the outer peripheral surface of the backup roll;
Applying a coating solution by the coater on the base film supported on the outer peripheral surface of the backup roll;
Average value M (Ra (F)) of arithmetic mean roughness Ra (F) measured at five measurement positions on the surface on the backup roll side of the substrate film, and the backup of the substrate film The mean value M (RSm (F)) of the average length RSm (F) of the roughness curvilinear element measured at five measurement positions on the surface on the roll side is expressed by the following equation (3)
M (Ra (F)) / M (RSm (F)) <1.5 × 10 ⁻⁵ (3)
A method for producing a coated film that satisfies
[5] The method for producing a coated film according to [4], wherein the viscosity of the coating liquid is 0.5 mPa · s to 30 mPa · s.
[6] The coating apparatus includes a supply roll which is provided immediately before the backup roll and can supply the base film to the backup roll.
The manufacturing method of the coated film as described in [4] or [5] whose tension of the said base film measured by the said supply roll is 50 N / m or more and less than 500 N / m.
[7] Any one of [4] to [6], wherein the coating solution is applied to the base film so that the coater forms a coating layer having a wet film thickness of 0.5 μm to 50 μm. The manufacturing method of the coated film as described in a term.
[8] The gap according to any one of [4] to [7], wherein there is a gap of 30 μm to 150 μm between the coater and the base film supported on the outer peripheral surface of the backup roll. Method of producing a coated film.
[9] Long base film,
And a coated layer provided on the substrate film,
Average value M (Ra (F)) of arithmetic mean roughness Ra (F) measured at five measurement positions on the surface of the base film opposite to the coating layer, and the coating The average value M (RSm (F)) of the average spacing RSm (F) of the unevenness measured at five measurement positions on the surface of the base film opposite to the layer is represented by the following formula (3)
M (Ra (F)) / M (RSm (F)) <1.5 × 10 ⁻⁵ (3)
Meet the
The coated film whose number of the thickness nonuniformity per unit area of the said coating layer is 20 pieces / m < ² > or less.

  ADVANTAGE OF THE INVENTION According to this invention, a coating liquid is coated on the base film with high surface smoothness, suppressing the slip of the said base film in the outer peripheral surface of a backup roll, and suppressing thickness nonuniformity. Coating device capable of coating the coating liquid on the base film having high surface smoothness while suppressing the slip of the base film on the outer peripheral surface of the backup roll and suppressing the thickness unevenness It is possible to provide a method for producing a coated film capable of producing a coated film; and a long coated film comprising a coated layer having a small number density of thickness unevenness.

FIG. 1 is a front view schematically showing a coating apparatus according to an embodiment of the present invention. FIG. 2 is a front view schematically showing a coating apparatus as an example of a conventional coating apparatus. FIG. 3 is a cross-sectional view schematically showing, in an enlarged manner, a portion of the base film to which the coating liquid is applied by the coater in the coating apparatus according to the embodiment of the present invention. FIG. 4 is a perspective view schematically showing the state of hybrid alignment of the discotic liquid crystal compound. FIG. 5 is a top view schematically showing the state of hybrid alignment of the discotic liquid crystal compound.

  Hereinafter, the present invention will be described in detail by way of examples and embodiments, but the present invention is not limited to the examples and embodiments shown below, and the scope of the claims of the present invention and the equivalents thereof In the range which does not deviate, it can change arbitrarily and can implement.

  In the following description, “upstream” refers to the upstream of the transport direction of the substrate film, and “downstream” refers to the downstream of the transport direction of the substrate film, unless otherwise specified.

  In the following description, unless otherwise specified, “axial direction” indicates the axial direction of the backup roll, “radial direction” indicates the radial direction of the backup roll, and “circumferential direction” indicates the circumferential direction of the backup roll. Show.

  In the following description, unless otherwise specified, "coating layer" indicates a layer on a substrate film formed by applying a coating liquid on a substrate film, and in this coating layer It includes both a liquid coating liquid layer and a solid layer obtained by drying or curing the coating liquid.

  In the following description, unless otherwise stated, the term "(meth) acrylate" includes both "acrylate" and "methacrylate", and the term "(meth) acryloyl group" means "acryloyl group" and "methacryloyl group" Encompass both.

  In the following description, unless otherwise specified, element orientations “parallel”, “vertical” and “orthogonal” include errors within a range that does not impair the effects of the present invention, for example, within ± 5 °. It may be.

  In the following description, members such as “polarizing plate”, “circularly polarizing plate”, “λ / 2 wavelength plate”, “λ / 4 wavelength plate” and “retardation plate” are rigid members unless otherwise specified. It is not limited and may be film-like and flexible.

  In the following description, the slow axis of a layer refers to the slow axis in the plane of the layer, unless otherwise specified.

[1. Outline of coating apparatus]
FIG. 1 is a front view schematically showing a coating apparatus 10 according to an embodiment of the present invention.
As shown in FIG. 1, a coating apparatus 10 according to an embodiment of the present invention is an apparatus for applying a coating liquid 30 onto a substrate film 20, and includes a backup roll 100, a coater 200, and the like. , Supply roll 300.

[2. Backup role]
The backup roll 100 has an outer circumferential surface 110 capable of supporting a base film. The backup roll 100 is provided to be able to rotate in the circumferential direction while supporting the base film 20 on the outer circumferential surface 110. In the present embodiment, a rotational driving force is applied to the backup roll 100 from a driving device such as a motor (not shown), and the example illustrates that the backup roll 100 rotationally driven by the rotational driving force can transport the base film 20. Do.

In the present embodiment, the average value M (Ra (R)) of the arithmetic average roughness Ra (R) measured at five measurement positions on the outer circumferential surface 110 of the backup roll 100 satisfies the following formula (1) .
0.020 μm ≦ M (Ra (R)) <0.350 μm (1)

  More specifically, the range of the average value M (Ra (R)) of the arithmetic average roughness Ra (R) is usually 0.002 μm or more, preferably 0.05 μm or more, more preferably 0.08 μm or more, Usually, it is less than 0.350 μm, preferably 0.300 μm or less, more preferably 0.250 μm or less. When the average value M (Ra (R)) of the arithmetic average roughness Ra (R) is equal to or more than the lower limit value of the range, thickness unevenness is generated on the base film 20 having high smoothness of the surface 21. The coating layer 30 can be formed by coating the coating liquid 30 while suppressing the coating. In addition, when the average value M (Ra (R)) of the arithmetic average roughness Ra (R) is less than the upper limit value of the range, the slip of the base film 20 on the outer peripheral surface 110 of the backup roll 100 Can be suppressed. Therefore, when the average value M (Ra (R)) of the arithmetic average roughness Ra (R) satisfies the equation (1), the back-up roll 100 is formed on the base film 20 with high smoothness of the surface 21. It is possible to coat the coating liquid 30 while suppressing the slip of the base film 20 on the outer circumferential surface 110 and suppressing the thickness unevenness.

  Arithmetic mean roughness Ra (R) of the outer peripheral surface 110 of the backup roll 100 can be measured by setting the axial direction of the backup roll 100 in the scanning direction at a scanning distance of 50 mm in accordance with JIS B0601-2001. Also, the five measurement positions can be set arbitrarily. It is preferable that five measurement positions be five positions obtained by equally dividing the backup roll 100 into six equally in the axial direction according to the position of the end of the base film 20 to be used. As a measuring apparatus, a surface roughness and contour shape measuring machine ("Surfcom 130A" manufactured by Tokyo Seimitsu Co., Ltd.) can be used.

  The structure which can suppress the thickness nonuniformity at the time of coating the coating liquid 30 on the base film 20 by satisfy | filling Formula (1) is demonstrated in contrast with the prior art. However, the present invention is not limited by the mechanism described below.

FIG. 2 is a front view schematically showing a coating apparatus 900 as an example of a conventional coating apparatus. Moreover, in FIG. 2, the base film 920 and the coating layer 930 show cross sections.
As shown in FIG. 2, when the base film 920 enters the backup roll 910, air may enter between the backup roll 910 and the base film 920, as indicated by an arrow A1. This air stays between the backup roll 910 and the base film 920, and as a result, a deformed portion 940 is formed in the base film 920.

  The deformed portion 940 of the base film 920 is conveyed by the rotation of the backup roll 910, and after the coating layer 930 is formed on the deformed portion 940 by the coater 950, the backup roll 910 is formed as shown by reference numeral 960. Try to leave the At the same time as the deformation portion 940 of the base film 920 separates from the backup roll 910, a conveying tension acts on the deformation portion 940, and the deformation portion 940 returns sharply to be flat. At this time, an impact load is applied to the coating layer 930 of the deformation portion 940 due to the rapid movement when the deformation portion 940 returns to flat. And a coating liquid flows by this impact load and thickness unevenness arises. In general, the coating liquid on the top portion (a portion protruding in the radial direction) of the deformed portion 940 flows so as to move to the periphery thereof, and thickness unevenness occurs in the coated layer 930. Such thickness unevenness is particularly likely to occur particularly when the smoothness of the surface 921 of the base film 920 on the backup roll 910 side is high.

  On the other hand, in the coating apparatus 10 of this embodiment shown in FIG. 1, the outer peripheral surface 110 of the backup roll 100 is a rough surface which satisfy | fills Formula (1). Therefore, even when the smoothness of the surface 21 of the base film 20 on the backup roll 100 side is high, the distance between the outer peripheral surface 110 of the backup roll 100 and the base film 20 supported by the outer peripheral surface 110 is There is a minute air gap (not shown). Since the air gap can accommodate the air that has entered between the backup roll 100 and the base film 20, deformation of the base film 20 can be suppressed. Therefore, since the thickness nonuniformity at the time of applying the coating liquid 30 on the base film 20 can be suppressed, the coating layer 40 of uniform thickness can be obtained. Here, the surface 21 of the base film 20 on the backup roll 100 side indicates the surface of the base film 20 that can be in contact with the backup roll 100.

  Moreover, the surface roughness of the outer peripheral surface 110 of the backup roll 100 is set to an appropriate range in which the roughness is not excessive. Therefore, since the contact area of the outer peripheral surface 110 of the backup roll 100 and the base film 20 can be enlarged, the outer peripheral surface 110 of the backup roll 100 can support the base film 20 with a high frictional force. Therefore, the base film 20 can be prevented from slipping on the outer circumferential surface 110 of the backup roll 100. Thereby, position control of the base film 20 is enabled, and the behavior of the base film 20 can be stabilized.

Average value M (RSm (R)) of average length RSm (R) of roughness curvilinear elements measured at five measurement positions of outer peripheral surface 110 of backup roll 100, and outer peripheral surface 110 of backup roll 100 It is preferable that the standard deviation σ (RSm (R)) of the average length RSm (R) of the roughness curvilinear element measured at the five measurement positions of 4 satisfies the following formula (2).
10% <σ (RSm (R)) / M (RSm (R)) <50% (2)

  More specifically, the range of the above ratio “σ (RSm (R)) / M (RSm (R))” is preferably more than 10%, more preferably 15% or more, particularly preferably 20% or more Preferably, it is less than 50%, more preferably 45% or less, and particularly preferably 40% or less. The fact that the ratio “σ (RSm (R)) / M (RSm (R))” satisfies the formula (2) means that the irregularity of the arrangement of irregularities on the outer circumferential surface 110 of the backup roll 100 is high. Show. When the outer peripheral surface 110 of the backup roll 100 is roughened, the pressure applied from the backup roll 100 to the base film 20 is viewed macroscopically because the irregularity of the arrangement of the unevenness on the outer peripheral surface 110 is high. Can be made uniform. Therefore, the deformation of the base film 20 due to the concentration of pressure can be effectively suppressed, and the unevenness in thickness when the coating liquid 30 is applied to the base film 20 can be effectively suppressed.

  The average length RSm (R) of the roughness curvilinear element of the outer circumferential surface 110 of the backup roll 100 is measured by setting the axial direction of the backup roll 100 in the scanning direction at a scanning distance of 50 mm in accordance with JIS B0601-2001. It can. Also, the five measurement positions can be set arbitrarily. The five measurement positions are preferably five positions equally divided into six in the axial direction of the backup roll 100 in accordance with the positions of the ends of the base film 20 to be used. As a measuring apparatus, a surface roughness and contour shape measuring machine ("Surfcom 130A" manufactured by Tokyo Seimitsu Co., Ltd.) can be used.

  The backup roll 100 having the outer circumferential surface 110 with the surface roughness as described above includes, for example, a step of preparing a material roll to be a material of the backup roll 100, a step of roughening the outer circumferential surface of the material roll, And D. a step of grinding or polishing the outer peripheral surface of the surface-roughened material roll.

  Examples of the surface roughening treatment include shot blast processing, laser processing, electron beam processing, and electrical discharge processing. By subjecting the outer peripheral surface of the material roll to the roughening treatment, the outer peripheral surface of the material roll can be roughened, and the outer peripheral surface can be roughened. Under the present circumstances, it is preferable to make arithmetic mean roughness Ra of the outer peripheral surface of a material roll larger than arithmetic mean roughness Ra (R) of the outer peripheral surface 110 of the backup roll 100 made into the objective. For example, the arithmetic mean roughness Ra of the outer peripheral surface of the material roll subjected to the roughening treatment is 0.1 μm to 0.2 μm more than the arithmetic mean roughness Ra (R) of the outer peripheral surface 110 of the backup roll 100 It is preferable to make it large.

  The grinding and polishing processes are not limited as long as adequate surface roughness can be achieved. For example, as a grinding process, a cylindrical grinder using any grindstone or a grinding process using a grinder may be employed. In addition, as the polishing treatment, electrolytic polishing treatment; chemical polishing treatment; lap polishing using fixed abrasives or loose abrasives; buff polishing; cylindrical polishing using a cylindrical abrasive; synergetic effect of mechanical action and chemical action Any polishing process may be performed, such as CMP that results in; By performing the grinding process or the polishing process, it is possible to flatten the tip of the projection on the outer peripheral surface of the material roll formed by the surface roughening process. As a result, the arithmetic mean roughness Ra can be reduced while maintaining the arrangement of the irregularities on the outer peripheral surface of the material roll, so that the backup roll 100 having the outer peripheral surface 110 with the desired surface roughness can be obtained.

  As a material which forms the surface of backup roll 100, what can support base film 20 with high frictional force is preferred. Such materials include, for example, tungsten carbide (WC), hard chromium plating, SUS, iron and the like.

  The diameter Φ of the backup roll 100 is preferably 100 mm or more, more preferably 150 mm or more, preferably 300 mm or less, more preferably 250 mm or less. When the diameter Φ of the backup roll 100 is equal to or more than the lower limit value of the above range, the weight of the backup roll 100 does not vibrate with respect to the film shaking that may occur during conveyance. Further, by making the diameter が of the backup roll 100 equal to or less than the upper limit value of the above range, it is not necessary to make the shaft for holding the weight of the backup roll 100 large, so the installation of the roll 100 is simplified. Can.

  It is preferable to set the backup roll 100 so that the winding angle θ of the base film 20 transported by the backup roll 100 falls within a desired range. Here, the winding angle θ of the base film 20 is a central angle of a fan-shaped portion of the peripheral surface portion of the backup roll 100 in contact with the base film 20. Further, the central angle is an angle when the backup roll 100 is observed from the axial direction. The specific range of the winding angle θ is preferably 90 ° or more, more preferably 100 ° or more, particularly preferably 150 ° or more, preferably 210 ° or less, more preferably 200 ° or less, particularly preferably 180 ° It is below. When the winding angle θ is equal to or more than the lower limit value of the range, the film shake on the backup roll 100 can be suppressed even if the film unexpectedly shakes during conveyance of the film. Further, when the winding angle θ is equal to or less than the upper limit value of the range, the transport path line of the film before and after the backup roll 100 can be easily set.

  Further, the backup roll 100 is provided with a flow path for passing temperature-controlled water in order to suppress the temperature drop of the backup roll 100 caused by the temperature drop of the base film 20 due to the solvent evaporation in the coating liquid 30. May be

[3. Coater]
The coater 200 is an apparatus capable of applying the coating liquid 30 to the base film 20 supported by the outer circumferential surface 110 of the backup roll 100. The coater 200 is a part of the back-up roll 100 so that the coating liquid 30 can be coated on the surface 22 of the base film 20 supported by the outer peripheral face 110 of the back-up roll 100 opposite to the back-up roll 100. It is provided to face the outer circumferential surface 110. Here, the surface 22 of the base film 20 opposite to the backup roll 100 indicates a surface not in contact with the backup roll 100.

As the coater 200, it is preferable to use a noncontact coater in which the coater 200 does not press the base film 20. By using a noncontact coater, damage to the base film 20 can be suppressed, and the film thickness in the flow direction can be stably kept constant.
Further, in general, in the noncontact coater, since the noncontact coater does not press the base film, it is difficult to eliminate the deformed portion of the base film, and it is particularly difficult to suppress thickness unevenness by conventional techniques. The On the other hand, when the manufacturing apparatus 10 according to the present embodiment is used, it is possible to suppress thickness unevenness even when using such a noncontact coater. Therefore, it is preferable to use a non-contact type coater as the coater 200 also from the viewpoint of solving the problem which was particularly difficult to solve in the prior art.

  A particularly preferred coater 200 is a die coater comprising a die 210. Thus, in the present embodiment, an example using a die coater provided with a die 210 as the coater 200 will be described.

FIG. 3 is a cross-sectional view schematically showing an enlarged part of the coating film 30 coated on the base film 20 by the coater 200 in the coating apparatus 10 according to an embodiment of the present invention.
As shown in FIG. 3, the coater 200 of the coating apparatus 10 includes a die 210 capable of discharging the coating liquid 30. The die 210 is formed with a flow path 220 through which the coating liquid 30 can flow, and a discharge port 230 through which the coating liquid 30 flowing through the flow path 220 can be discharged.

  The flow path 220 includes a pocket 221 for storing the coating liquid 30 supplied from a coating liquid supply device (not shown), and a slot 222 for guiding the coating liquid 30 from the pocket 221 to the discharge port 230. The pockets 221 and the slots 222 are both formed to have the cross-sectional shape in the width direction of the die 210 perpendicular to the transport direction of the base film 20. Further, it is preferable that an angle な す formed by the slot 222 and the transport direction of the base film 20 transported by the backup roll 100 be 30 ° or more and 90 ° or less.

  The discharge port 230 is generally formed as a slit-like opening extending in parallel with the width direction of the base film 20. The length of the discharge port 230 (the length in the width direction of the base film 20) is set to substantially the same length as the width of the coating layer 40 formed on the base film 20.

  The die 210 is provided so as to be closest to the backup roll 100 at the lip portion 240 in which the discharge port 230 is formed. The lip portion 240 includes an upstream lip portion 241 provided on the upstream side of the base film 20 in the transport direction, and a downstream lip portion 242 provided on the downstream side of the base film 20 in the transport direction. The discharge port 230 is opened between the upstream lip portion 241 and the downstream lip portion 242. Usually, the die 210 has a tapered shape in which the thickness is smaller toward the portion closer to the lip portion 240, and the flat portion extends in the width direction of the die 210 at the tips of the upstream lip portion 241 and the downstream lip portion 242. Lands 241a and 242a are respectively formed.

Usually, the die 210 is configured by assembling a plurality of members, and the main members thereof are the upstream block 250 on the upstream side in the transport direction of the base film 20 and the downstream block 260 on the downstream side. The blocks 250 and 260 are generally integrated by being fastened by block fastening bolts not shown. These blocks 250 and 260 are preferably formed of a material having a low coefficient of linear thermal expansion from the viewpoint of suppressing deformation of the die 210 due to temperature change. The specific linear thermal expansion coefficient is preferably 6.0 × 10 ⁻⁶ [1 / K] or less. When the lip portion 240 of the die 210 is formed of a material different from the blocks 250 and 260 as described later, it is preferable that the blocks 250 and 260 be formed of a material having a lower linear thermal expansion coefficient than the lip portion 240 . By lowering the linear thermal expansion coefficient of the blocks 250 and 260 having a volume larger than that of the lip portion 240, the influence of a temperature change and the like can be effectively reduced.

  It is preferable that the lip portion 240 of the die 210 be precisely controlled in structure in order to apply the coating liquid with high thickness accuracy. For example, the lands 241a and 242a of the upstream lip portion 241 and the downstream lip portion 242 are formed with a high degree of straightness such that the variation width of the heights of the concave and convex portions of the lands 241a and 242a can be 5 μm or less. Is preferred. Thus, the lip portion 240 of the die 210 may be formed of a cemented carbide material different from the blocks 250 and 260 described above. As a cemented carbide material, for example, WC carbide crystals may be bonded by a bonding metal such as Co, and WC crystals having an average particle diameter of 5 μm or less may be used. By using such a cemented carbide material, the surface shape can be made uniform, and at the same time, the wear by the coating liquid can be suppressed (see Japanese Patent Application Laid-Open No. 2003-200097).

  Further, the die 210 is usually installed and used on a stand not shown. From the viewpoint of increasing the accuracy of the mount, a mount formed by grinding an integral casting may be used as such a mount (see Japanese Patent No. 4358010).

  The coater 200 as described above is provided so as not to contact the substrate film 20. Therefore, the coater 200 is provided so as to leave a gap C between the coater 200 and the base film 20 supported on the outer circumferential surface 110 of the backup roll 100. In the coater 200 provided with the die 210 as shown in the present embodiment, the lip portion 240 of the die 210 is usually provided so as to be closest to the base film 20. Therefore, in the present embodiment, the gap C is It is open between the lip 240 and the base film 20. The size of the gap C is preferably 30 μm or more, more preferably 40 μm or more, particularly preferably 50 μm or more, preferably 150 μm or less, more preferably 140 μm or less, particularly preferably 130 μm or less. When the size of the gap C is equal to or more than the lower limit value of the above range, the vibration from the die 210 is less likely to be transmitted to the liquid pool 31, so that thickness unevenness in the coating layer 40 can be effectively suppressed. In addition, when the size of the gap C is equal to or less than the upper limit value of the range, the liquid pool 31 can be stabilized, so that the generation of streaks in the coating layer 40 can be suppressed.

[4. Supply roll]
As shown in FIG. 1, the supply roll 300 is a roll provided immediately in front of the backup roll 100 in the transport path of the base film 20. Here, that the supply roll 300 is provided "immediately before" of the backup roll 100 means that there is no other roll in contact with the base film 20 between the supply roll 300 and the backup roll 100. means. The supply roll 300 is rotatably provided in the circumferential direction so that the base film 20 can be supplied to the backup roll 100. Further, the supply roll 300 may be provided with a tension sensor (not shown) for measuring the tension of the base film 20.

[5. Optional elements that can be included in the coating device]
The coating apparatus 10 may further include optional elements in addition to the backup roll 100, the coater 200, and the supply roll 300 described above.
For example, the coating apparatus 10 may include a decompression chamber (not shown) on the upstream side of the lip portion 240 of the die 210 in the transport direction of the base film 20. By providing the pressure reduction chamber, sufficient pressure reduction adjustment can be performed on the liquid reservoir 31 of the coating liquid 30, so thickness unevenness of the coating layer 40 can be effectively suppressed.

  Further, in the upstream block 250 and the downstream block 260 of the die 210, a flow path for passing temperature control water in order to suppress the dimensional change of the block due to the temperature decrease accompanying the flow of the coating liquid 30. May be provided.

[6. Substrate film]
Next, the base film 20 to which the coating liquid 30 is applied by the coating apparatus 10 will be described. As the base film 20, usually, a film with high smoothness of the surface 21 on the backup roll 100 side is used.

Specifically, the average value M (Ra (F)) of the arithmetic average roughness Ra (F) measured at five measurement positions on the surface 21 on the backup roll 100 side of the base film 20, and The average value M (RSm (F)) of the average length RSm (F) of the roughness curvilinear element measured at five measurement positions of the surface 21 on the backup roll 100 side of the material film 20 is usually the following formula Meet (3).
M (Ra (F)) / M (RSm (F)) <1.5 × 10 ⁻⁵ (3)

More specifically, the range of the ratio “M (Ra (F)) / M (RSm (F))” is usually less than 1.5 × 10 ⁻⁵ , preferably less than 1.0 × 10 ⁻⁵ . More preferably, it is less than 8.0 × 10 ⁻⁶ . The coating apparatus 10 which concerns on this embodiment is an apparatus for coating the coating liquid 30 on the base film 20 which has the surface 21 with high smoothness in this way, suppressing thickness nonuniformity. In addition, by setting the ratio “M (Ra (F)) / M (RS m (F))” to the upper limit value of the range or less, the base film 20 slips on the outer peripheral surface 110 of the backup roll 100 Can be suppressed. Furthermore, since the base film 20 excellent in the smoothness of the surface 21 as described above can reduce the haze, it is suitably used as an optical film. There is no particular limitation on the lower limit value of the above ratio “M (Ra (F)) / M (RS m (F))”, but a practical range in industrial production is usually 5.0 × 10 ^−6. It is above.

  The average value M (Ra (F)) of the arithmetic average roughness Ra (F) is preferably 0.02 μm or less, more preferably 0.01 μm or less, and particularly preferably 0.005 μm or less. Slippage of the base film 20 on the outer circumferential surface 110 of the backup roll 100 is particularly effectively suppressed by the average value M (Ra (F)) of the arithmetic average roughness Ra (F) falling within the above range The haze of the base film 20 can be significantly reduced. The lower limit value of the average value M (Ra (F)) of the arithmetic average roughness Ra (F) is not particularly limited, but a practical range in industrial production is usually 0.001 μm or more.

  Furthermore, the average value M (RSm (F)) of the average length RSm (F) of the roughness curve element is preferably 100 μm or more, more preferably 300 μm or more, and particularly preferably 500 μm or more. The slippage of the base film 20 on the outer circumferential surface 110 of the backup roll 100 is particularly effective when the mean value M (RSm (F)) of the average length RSm (F) of the roughness curvilinear element falls within the above range. The haze of the base film 20 can be significantly reduced. The upper limit value of the average value M (RSm (F)) of the average length RSm (F) of the roughness curvilinear element is not particularly limited, but a practical range in industrial production is usually 1,000 μm or less .

  The mean value M (Ra (F)) of the arithmetic mean roughness Ra (F) and the mean value M (RSm (F)) of the mean length RSm (F) of the roughness curvilinear element are respectively the base films It is an index value which shows the smoothness of field 21 side by the side of 20 backup rolls 100. Therefore, the average value M (Ra (F)) of the arithmetic average roughness Ra (F) and the average value M (RSm (F)) of the average length RSm (F) of the roughness curvilinear element can be backed up by itself alone. A correlation is shown in the slipperiness of the base film 20 on the outer circumferential surface 110 of the roll 100. However, according to the study of the inventor of the present invention, the average value M (Ra (F)) of the arithmetic average roughness Ra (F) and the average value M (RSm (F) of the average length RSm (F) of the roughness curvilinear element In any case, it has been found that the correlation with the slipperiness of the base film 20 on the outer peripheral surface 110 of the backup roll 100 is not high. On the other hand, the average value M (Ra (F)) of the arithmetic average roughness Ra (F) and the average value M of the average length RSm (F) of the roughness curvilinear element as in the above-mentioned equation (3) The ratio “M (Ra (F)) / M (RSm (F))” of RSm (F) shows high correlation with the slipperiness of the base film 20 on the outer peripheral surface 110 of the backup roll 100. Therefore, in order to stably suppress the slip of the base film 20 on the outer peripheral surface 110 of the backup roll 100 when the coating liquid is applied, in the present embodiment, the surface satisfying the above-mentioned formula (3) A base film 20 having 21 is used.

  The arithmetic average roughness Ra (F) of the surface 21 of the base film 20 and the average length RSm (F) of the roughness curvilinear element scan the film width direction at a scanning distance of 50 mm in accordance with JIS B0601-2001. It can be set by setting the direction. Also, the five measurement positions can be set arbitrarily. The five measurement positions are preferably five positions obtained by equally dividing the base film 20 to be used into six in the width direction. As a measuring apparatus, a CNC surface roughness measuring machine ("Surftest Extreme V-3000 CNC" manufactured by Mitutoyo Co., Ltd.) can be used.

  As described above, the base film 20 having the highly smooth surface 21 can be obtained by various methods. For example, when base film 20 is a resin film, the method of using resin which does not contain particles is mentioned. Moreover, for example, when the base film 20 is a resin film, a method of subjecting the resin film to a stretching process may be mentioned. Furthermore, for example, when the base film 20 is a film produced by a melt extrusion method or a solution flow method, the lip of the die for the melt extrusion method or the solution flow method is subjected to electropolishing treatment to obtain the lip The method of making it smooth (for example, arithmetic mean roughness Ra 0.010 micrometer-0.001 micrometer) is mentioned.

  As said base film 20, the film of the single layer structure provided with only 1 layer may be used, and the film of the multilayer structure provided with a layer of two or more layers may be used. As such a substrate film 20, for example, a resin film can be used. Examples of the resin include resins containing various polymers. As the said polymer, an alicyclic structure containing polymer, a cellulose ester, polyvinyl alcohol, a polyimide, a polycarbonate, a polysulfone, a polyether sulfone, an epoxy polymer, a polystyrene, an acrylic polymer, a methacrylic polymer, polyethylene, a polypropylene, and these A combination of Among these, from the viewpoints of transparency, low hygroscopicity, dimensional stability, lightness and the like, alicyclic structure-containing polymers and cellulose esters are preferable, and alicyclic structure-containing polymers are more preferable.

  An alicyclic structure-containing polymer is a polymer in which a structural unit of the polymer has an alicyclic structure. The alicyclic structure-containing polymer includes a polymer having an alicyclic structure in the main chain, a polymer having an alicyclic structure in a side chain, a polymer having an alicyclic structure in the main chain and a side chain, and It may be a mixture of two or more of these in any ratio. Among them, an alicyclic structure-containing polymer having an alicyclic structure in its main chain is preferable from the viewpoint of mechanical strength and heat resistance.

  Examples of alicyclic structures include saturated alicyclic hydrocarbon (cycloalkane) structures, and unsaturated alicyclic hydrocarbon (cycloalkenes, cycloalkynes) structures. Among them, in view of mechanical strength and heat resistance, a cycloalkane structure and a cycloalkene structure are preferable, and a cycloalkane structure is particularly preferable.

  The number of carbon atoms constituting the alicyclic structure is preferably 4 or more, more preferably 5 or more, particularly preferably 6 or more, and preferably 30 or less, per one alicyclic structure. Is 20 or less, particularly preferably 15 or less. When the number of carbon atoms constituting the alicyclic structure is in this range, the mechanical strength, the heat resistance and the formability of the base film 20 are highly balanced.

  In the alicyclic structure-containing polymer, the proportion of structural units having an alicyclic structure is preferably 50% by weight or more, more preferably 70% by weight or more, and particularly preferably 90% by weight or more. When the ratio of the structural unit having an alicyclic structure in the alicyclic structure-containing polymer is in this range, the transparency and the heat resistance of the base film 20 become good.

  Specific examples of the alicyclic structure-containing polymer include (1) norbornene polymer, (2) monocyclic cyclic olefin polymer, (3) cyclic conjugated diene polymer, and (4) vinyl alicyclic hydrocarbon heavy chain And coalesced, and hydrogenates of these. Among these, from the viewpoint of transparency and moldability, norbornene polymers and hydrogenated products thereof are more preferable.

  Examples of the norbornene-based polymer include a ring-opening polymer of a monomer having a norbornene structure and a hydride thereof; an addition polymer of a monomer having a norbornene structure and a hydride thereof. Further, as an example of a ring-opening polymer of a monomer having a norbornene structure, a ring-opening homopolymer of one kind of monomer having a norbornene structure, a ring-opening of two or more kinds of monomers having a norbornene structure Copolymers and ring-opened copolymers of monomers having a norbornene structure and any monomers copolymerizable therewith can be mentioned. Furthermore, as an example of an addition polymer of a monomer having a norbornene structure, an addition homopolymer of one type of monomer having a norbornene structure, an addition copolymer of two or more types of monomers having a norbornene structure And addition copolymers of monomers having a norbornene structure and optional monomers copolymerizable therewith. As these polymers, the polymer currently indicated by Unexamined-Japanese-Patent No. 2002-321302 etc. is mentioned, for example. Among these, a hydride of a ring-opening polymer of a monomer having a norbornene structure is particularly preferable from the viewpoint of transparency, moldability, heat resistance, low hygroscopicity, dimensional stability and lightness.

  The weight average molecular weight (Mw) of the alicyclic structure-containing polymer is preferably 10,000 or more, more preferably 25,000 or more, preferably 100,000 or less, more preferably 80,000 or less, particularly preferably Is less than 50,000. When the weight average molecular weight of the polymer is in such a range, the mechanical strength and the moldability of the substrate film 20 are highly balanced.

  The molecular weight distribution (weight average molecular weight (Mw) / number average molecular weight (Mn)) of the alicyclic structure-containing polymer is preferably 1 or more, more preferably 1.2 or more, preferably 10 or less, more preferably It is 4 or less, particularly preferably 3.5 or less.

  Here, the weight-average molecular weight and number-average molecular weight of the polymer are determined by gel permeation chromatography using cyclohexane as a solvent (however, toluene may be used if the sample is not dissolved in cyclohexane). It can be measured as a value of polyisoprene conversion (when the solvent is toluene, it is polystyrene conversion).

  The glass transition temperature of the alicyclic structure-containing polymer is preferably 80 ° C. or more, more preferably 100 ° C. or more, and preferably 250 ° C. or less. The alicyclic structure-containing polymer having a glass transition temperature in such a range is excellent in durability because the generation of deformation and stress in use at high temperature is suppressed.

  In the resin containing an alicyclic structure-containing polymer, the content of a resin component having a molecular weight of 2,000 or less (that is, an oligomer component) is preferably 5% by weight or less, more preferably 3% by weight or less, still more preferably It is 2% by weight or less. When the content of the oligomer component is in the above range, the occurrence of fine projections on the surfaces 21 and 22 of the base film 20 is reduced, the variation in thickness is reduced, and the surface accuracy is improved. The reduction of the amount of the oligomer component can be carried out, for example, by appropriately setting the selection of a polymerization catalyst and a hydrogenation catalyst; reaction conditions such as polymerization and hydrogenation; and temperature conditions in the process of pelletizing a resin as a molding material. It can be done. Also, the amount of oligomer component can be measured by the above-mentioned gel permeation chromatography.

  The resin containing an alicyclic structure-containing polymer may contain only an alicyclic structure-containing polymer, but may contain any component other than the alicyclic structure-containing polymer. The proportion of the alicyclic structure-containing polymer in the resin containing the alicyclic structure-containing polymer is preferably 70% by weight or more, and more preferably 80% by weight or more.

  A film of a resin containing an alicyclic structure-containing polymer can be produced, for example, by molding the resin by any film forming method. Examples of the film forming method include a cast forming method, an extrusion forming method, and an inflation forming method. Among them, the melt extrusion method which does not use a solvent can efficiently reduce the amount of volatile components, and is preferable from the viewpoint of global environment, the viewpoint of work environment, and the viewpoint of production efficiency. Examples of the melt extrusion method include an inflation method using a die, and a method using a T-die is preferable in terms of excellent productivity and thickness accuracy.

  As a preferable specific example of resin containing an alicyclic structure containing polymer, "Zeonor 1420" and "Zeonor 1420R" by Nippon Zeon Co., Ltd. can be mentioned.

  When a film of a resin containing an alicyclic structure-containing polymer is used as the base film 20, the thickness of the base film 20 is preferably 1 μm or more, more preferably 5 μm or more, particularly preferably 10 μm or more, and preferably Is 1000 μm or less, more preferably 300 μm or less, particularly preferably 100 μm or less. The base film 20 having such a thickness has good productivity, is thin, and can be reduced in weight.

  As the cellulose ester, lower fatty acid esters of cellulose (for example, cellulose acetate, cellulose acetate butyrate and cellulose acetate propionate) are representative. The lower fatty acid means a fatty acid having 6 or less carbon atoms per molecule. Cellulose acetate includes triacetyl cellulose (TAC) and cellulose diacetate (DAC).

  The degree of acetylation of cellulose acetate is preferably 50% to 70%, and more preferably 55% to 65%. The weight average molecular weight of cellulose acetate is preferably 70000 to 120000, and more preferably 80000 to 100000. Furthermore, the above-mentioned cellulose acetate may be partially esterified with fatty acids such as propionic acid and butyric acid as long as the above-mentioned degree of acetylation is satisfied, in addition to acetic acid. In addition, the resin contained in the resin film may contain a combination of cellulose acetate and a cellulose ester other than cellulose acetate (cellulose propionate, cellulose butyrate and the like). In that case, it is preferable that all of these cellulose esters satisfy the above-mentioned degree of acetylation.

  When a film of a resin containing triacetyl cellulose is used as the base film 20, the base film 20 is produced using triacetyl cellulose dope obtained by dissolving triacetyl cellulose in a solvent substantially free of dichloromethane. Films are preferred. Thereby, environmental conservation is good. As a method of dissolving triacetyl cellulose in a solvent substantially free of the above triacetyl cellulose-doped dichloromethane, a low temperature dissolution method or a high temperature dissolution method can be used. Also, a film of a resin containing triacetyl cellulose can be produced by a casting method.

  In the casting method, a material flake of triacetyl cellulose is dissolved in a solvent, and an optional component is mixed as needed to prepare a solution (dope). Thereafter, the dope is cast from a dope feeder (such as a die) onto a support to obtain a flowable product. When this cast material is dried to some extent to impart rigidity, it is peeled off from the support as a film. Then, the resin film is obtained by further drying the said film and removing a solvent.

  As a solvent for dissolving the raw material flakes, for example, halogenated hydrocarbon solvents (dichloromethane etc.), alcohol solvents (methanol, ethanol, butanol etc.), ester solvents (methyl formate, methyl acetate etc.), ether solvents (dioxane, dioxolane, And diethyl ether etc.

Examples of optional components that can be mixed in the dope include a retardation increasing agent, a plasticizer, an ultraviolet absorber, an antidegradant, a slip agent, a peeling accelerator and the like.
The support for casting the dope includes, for example, a horizontal endless metal belt and a rotating drum.

In casting the dope, a single dope may be cast in a single layer, or a plurality of layers may be co-cast. In the case of co-casting a plurality of layers, for example, a plurality of layers of low concentration cellulose ester dope and a plurality of layers of high concentration cellulose ester dope provided in contact with the front surface and the back surface are formed. Can be cast sequentially.
As an example of a means to dry a film and to remove a solvent, the means to convey a film and to let the inside pass through the drying part set to the conditions suitable for drying is mentioned.

  Preferred examples of the film of a resin containing triacetyl cellulose include those disclosed in "TAC-TD80U" manufactured by Fuji Photo Film Co., Ltd., and JP-A No. 2001-1745.

  When a film of a resin containing triacetyl cellulose is used as the base film 20, the thickness of the base film 20 is preferably 20 μm or more, more preferably 30 μm or more, particularly preferably 40 μm or more, and preferably 150 μm or less. More preferably, it is 130 μm or less, particularly preferably 120 μm or less.

  The resin film may be subjected to a stretching process. By applying the stretching treatment, the smoothness of the surface of the resin film can be improved. In addition, by subjecting the resin film to stretching treatment under appropriate stretching conditions, it is possible to cause the resin film to exhibit optical characteristics such as retardation, or to cause the surface of the resin film to exhibit an orientation regulating force.

  When the surface of the resin film has an alignment regulating power, when the liquid crystal composition is coated on the surface to form a coating layer, the liquid crystal compound in the liquid crystal composition contained in the coating layer is It is oriented according to Therefore, when using a liquid-crystal composition as a coating liquid, it is useful to use the resin film to which the above extending | stretching processes were performed as the base film 20. As shown in FIG.

  The direction in which the orientation control force is expressed in the resin film by stretching usually coincides with the orientation direction by stretching. The orientation direction by stretching is the direction of the orientation of molecules constituting the resin film, which is produced by stretching, and usually corresponds to the stretching direction itself.

  The angle between the orientation direction by stretching and the width direction of the resin film may be 0 to 90 °. In particular, the angle may be more than 0 ° and less than 90 °. By having the orientation direction at such a range of angles, the resin film can be made a material that enables efficient production such as a circularly polarizing plate.

  In one aspect, an angle between the orientation direction of the resin film and the width direction of the resin film is preferably 10 ° to 60 °, and particularly preferably 40 ° to 50 °. By setting it as such an angular relationship, the said resin film can be made into the material which enables efficient manufacture of a specific circularly-polarizing plate. Specifically, efficient production of a circularly polarizing plate having a linear polarizer and one or two retardation plates is possible.

  More specifically, the angle between the orientation direction of the resin film and the width direction of the resin film is preferably 15 ° ± 5 °, 22.5 ± 5 °, 45 ° ± 5 °, 75 ° ± 5 °, More preferably, 15 ° ± 4 °, 22.5 ± 4 °, 45 ° ± 4 °, 75 ° ± 4 °, even more preferably 15 ° ± 3 °, 22.5 ° ± 3 °, 45 ° ± 3 By setting it as a specific range, such as ° and 75 ° ± 3 °, the resin film can be made a material that enables efficient production of a specific circularly polarizing plate.

  Usually, a long film is used as the base film 20. A long film refers to a shape having a length 5 times or more the width, preferably 10 times or more, and more specifically wound in a roll and stored or It refers to the shape of a film having a length that can be transported. The specific length of the base film 20 is preferably 500 m or more, more preferably 1,000 m or more, and particularly preferably 2,000 m or more. As described above, when the coating liquid 30 is applied to the long base film 20 to form the coating layer 40, according to the coating device 10 described above, the occurrence frequency of thickness unevenness in the coating layer 40 can be reduced. . As a result, the yield of the coated film 50 can be enhanced, and a great advantage can be obtained in industrial production. The upper limit of the length of the substrate film 20 is not particularly limited, but is preferably 8,000 m or less, more preferably 5,000 m or less, and particularly preferably 4,000 m or less.

  The width of the substrate film 20 is preferably 1,000 mm or more, more preferably 1,200 mm or more, particularly preferably 1,300 mm or more, preferably 3,000 mm or less, more preferably 2,600 mm or less, particularly preferably Is less than 2,500 mm.

[7. Coating fluid]
Next, the coating liquid 30 applied by the coating apparatus 10 will be described. As the coating liquid 30, any material in liquid form can be used. Therefore, the type of the coating liquid 30 may be selected as appropriate depending on the application of the coating film 50 to be produced.

  As the coating liquid 30, for example, a hard coating liquid is used. By using this hard coat liquid as the coating liquid 30, a hard coat layer having high hardness can be obtained as the coated layer 40 after curing.

  As the hard coat solution, a liquid composition containing a polymerizable monomer can be used. Here, the term "liquid composition" includes not only materials containing two or more components but also materials containing only one component. In particular, a hard coat solution is preferably a liquid composition containing, as a polymerizable monomer, a compound having three or more (meth) acryloyl groups in one molecule in 50% by weight or more of the total amount of the polymerizable monomer. Such hard coat solution can usually be cured by irradiation with active energy rays.

  Examples of compounds having three or more (meth) acryloyl groups in one molecule include pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol tetra (meth) acrylate, and dipentaerythritol penta ( Examples include meta) acrylates and dipentaerythritol hexa (meth) acrylates.

  Moreover, the compound which has 3 or more of (meth) acryloyl groups in 1 molecule may be used individually by 1 type, and may be used combining 2 or more types by arbitrary ratios. For example, combination of pentaerythritol tri (meth) acrylate and pentaerythritol tetra (meth) acrylate; combination of dipentaerythritol tetra (meth) acrylate and dipentaerythritol penta (meth) acrylate and dipentaerythritol hexa (meth) acrylate May be used.

  Among them, as the hard coat solution, a liquid composition containing a compound having four or more (meth) acryloyl groups in one molecule in an amount of 60% by weight or more of the total amount of polymerizable monomers is preferable. Furthermore, as the hard coat solution, 80 weight of the total of the polymerizable monomers in total is a compound having four compounds having five (meth) acryloyl groups in one molecule, and a compound having six compounds in one molecule. Particularly preferred is a liquid composition containing at least%.

  The hard coat solution may contain any polymerizable monomer in combination with a compound having three or more (meth) acryloyl groups in one molecule. As the optional polymerizable monomer, for example, trifunctional (meth) acrylates such as trimethylolpropane tri (meth) acrylate and pentaerythritol tri (meth) acrylate; ethylene glycol diacrylate, ethylene glycol dimethacrylate, diethylene glycol Polyfunctional unsaturated monomers such as dimethacrylate, allyl methacrylate, diallyl phthalate, trimethylolpropane triacrylate, glycerin diallyl ether, polyethylene glycol dimethacrylate, polyethylene glycol diacrylate; bisphenoxyethanol fluoro orange acrylate, 2-prope acrylate Noic acid [5,5 '-(9-fluoren-9-ylidene) bis (1,1'-biphenyl) -2- (polyoxyethylene) ester] Aromatic rings and (meth) acryloyl groups such as 2-propenoic acid [5,5'-4- (1,1'biphenylyl) methylene bis (1,1'-biphenyl) -2- (polyoxyethylene) ester] and the like Compounds having methyl; (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, hexyl (meth) acrylate, cyclohexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, octyl (meth) acrylate, nonyl The acrylic unsaturated monomers of C1-C30 alkyl (meth) acrylates, such as (meth) acrylate, lauryl (meth) acrylate, stearyl (meth) acrylate; etc. are mentioned. Moreover, these may be used individually by 1 type and may be used combining 2 or more types by arbitrary ratios.

  The hard coat solution preferably contains 0.01 to 5% by weight of a compound having a carboxyl group and a polymerizable carbon-carbon double bond in the total amount of the polymerizable monomer. Thereby, the surface resistance value of the hard coat layer can be lowered. Examples of the compound having a carboxyl group and a polymerizable carbon-carbon double bond include acrylic acid, methacrylic acid, crotonic acid, fumaric acid, itaconic acid, muconic acid, half ester of maleic anhydride and monoalcohol A compound in which a part of hydroxyl groups in acrylates having hydroxyl groups such as dipentaerythritol pentaacrylate and pentaerythritol triacrylate is added to a carbon-carbon double bond of acrylic acid; dipentaerythritol pentaacrylate and pentaerythritol triacrylate The compound which the hydroxyl group in acrylates which have hydroxyl groups, such as an acrylate, and dicarboxylic acid or carboxylic acid anhydride reacted, etc. are mentioned. One of these may be used alone, or two or more of them may be used in combination at an arbitrary ratio.

The acid value of the hard coat solution is preferably 0.01 mg KOH / g to 0.05 mg KOH / g. When the acid value of the hard coat solution is not less than the lower limit value of the above range, the surface resistance value of the hard coat layer can be effectively lowered, and by being not more than the upper limit value of the above range, Good stability can be achieved.
The above oxidation can be measured according to JIS K 0070 (Test method of acid value, saponification value, ester value, iodine value, hydroxyl value and unsaponifiable matter of chemical product) using bromothymol blue as an indicator.

  The hard coat solution preferably contains a photopolymerization initiator. Examples of the photopolymerization initiator include benzoin derivatives, benzyl ketals, α-hydroxyacetophenones, α-aminoacetophenones, acyl phosphine oxides, o-acyl oximes and the like. In addition, examples of commercially available photopolymerization initiators include combinations of benzophenone / amine, Michler's ketone / benzophenone, thioxanthone / amine and the like (“IRGACURE” and “Darocure” manufactured by Ciba Geigy, etc.). A photoinitiator may be used individually by 1 type, and may be used combining 2 or more types by arbitrary ratios.

  The amount of the photopolymerization initiator is preferably 1 part by weight or more, more preferably 2 parts by weight or more, particularly preferably 3 parts by weight or more, and preferably 20 parts by weight with respect to 100 parts by weight of the polymerizable monomer. The content is more preferably 15 parts by weight or less, particularly preferably 10 parts by weight or less. By setting the amount of the photopolymerization initiator in the above range, the polymerization of the polymerizable monomer can be efficiently progressed, and the excessive mixing of the photopolymerization initiator is avoided, and the unreacted photopolymerization initiator It is possible to suppress the yellowing of the hard coat layer and the change in film physical properties caused by the

  The above hard coat layer may optionally contain a solvent. As a solvent, for example, water; alcohols such as water, methanol, ethanol, propanol, isopropanol, butanol, diacetone alcohol, furfuryl alcohol, tetrahydrofurfuryl alcohol, ethylene glycol, hexylene glycol, isopropyl glycol, etc .; acetic acid methyl ester, acetic acid Esters such as ethyl ester; Diethyl ether, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, propylene glycol monomethyl ether, ethers such as tetrahydrofuran; acetone, methyl ethyl ketone, Methyl isobutyl ketone, acetylacetonate Emissions, ketones such as acetoacetate; methyl cellosolve, ethyl cellosolve, cellosolve such as butyl cellosolve; toluene, aromatic compounds such as xylene; isophorone; and the like. A solvent may be used individually by 1 type, and may be used combining 2 or more types by arbitrary ratios.

  Among the above-mentioned solvents, hydrophilic solvents are preferable. By using a hydrophilic solvent, whitening due to absorption of moisture in the air can be suppressed when the hard coat solution is applied. In particular, water-soluble ketones having a water solubility at 25 ° C. of 5 g (water) / 100 g (ketone) or more are preferable, and specifically, methyl ethyl ketone and acetone are preferable.

  Generally, in a film obtained by forming a coating layer transparent to a base film, light interference occurs at the interface between the base film and the coating layer and at the interface between the coating layer and the air layer. Rainbow-like interference fringes may occur and interfere with film visibility (fringe). On the other hand, when a solvent that strongly corrodes the base film is used, the interface between the base film and the coating layer is roughened, so that light reflected at the interface can be disturbed. Therefore, it is possible to suppress interference of light and reduce interference fringes. Thus, when using triacetyl cellulose as a base film, for example, esters and ketones may be mentioned as a solvent which is strongly eroded to the base film, and among them, methyl acetate, dimethyl carbonate, methyl ethyl ketone and acetone are mentioned. preferable.

  The amount of the solvent can be set so that the viscosity of the hard coating solution falls within the preferable range required for the coating solution.

  In addition to the above-mentioned polymerizable monomer, photopolymerization initiator and solvent, the hard coat solution may contain optional components. Optional components include, for example, fine particles of metal oxide for adjusting refractive index, imparting conductivity, imparting of antireflective ability; organic fine particles for preventing blocking; coloring agents such as dyes and pigments; fluorescent materials, phosphorescent materials, etc. Leveling agent, thixo agent, gelling agent, polysaccharide, UV absorber, infrared absorber, antioxidant, ion exchange resin, and the like. In addition, as the optional components, one type may be used alone, or two or more types may be used in combination at an optional ratio. The blending ratio of such optional additives is usually 0.1 to 20 parts by weight for each 100 parts by weight of the polymerizable monomer.

  In addition, as the coating liquid 30, for example, a liquid crystal composition containing a polymerizable liquid crystal compound (hereinafter, the composition may be abbreviated as "composition (A)") can be used. By using this composition (A), an optically anisotropic layer containing cured liquid crystal molecules can be obtained as the coated layer 40 after curing. The “cured liquid crystal molecule” means a molecule of a compound capable of exhibiting a liquid crystal phase when the compound is made solid as it is in a state of exhibiting a liquid crystal phase. Examples of the cured liquid crystal molecules include those obtained by curing a curable liquid crystal compound, and more specifically, polymers obtained by polymerizing a polymerizable liquid crystal compound.

  The liquid crystal compound as a component of the composition (A) is a compound which can exhibit a liquid crystal phase when it is blended in the composition (A) and oriented. The polymerizable liquid crystal compound is a liquid crystal compound which can be polymerized in the composition (A) in a state of exhibiting such a liquid crystal phase, and can become a polymer while maintaining the alignment of molecules in the liquid crystal phase. Furthermore, the reverse wavelength dispersion polymerizable liquid crystal compound is a polymerizable liquid crystal compound in which the obtained polymer exhibits reverse wavelength dispersibility when it is thus made into a polymer. In the following description, it is a component of the composition (A), and a compound having a polymerizability (a polymerizable liquid crystal compound and another compound having a polymerizability, etc.) is generically referred to simply as a "polymerizable compound". is there.

  Examples of the polymerizable liquid crystal compound include various discotic liquid crystal compounds and rod-like liquid crystal compounds.

  Examples of the discotic liquid crystal compound include various compounds having a discotic core (discotic core) and a polymerizable group and capable of exhibiting a liquid crystal phase. In the discotic liquid crystal compound, usually the molecule itself has optically negative uniaxiality. Especially as a discotic liquid crystal compound, what can be hybrid-aligned is preferable. An optically anisotropic layer formed by using a discotic liquid crystal compound and hybrid-aligned is useful, for example, for improving the viewing angle characteristics of a TN liquid crystal cell. As the discotic liquid crystal compound, one having a crosslinking group such as an epoxy group or an acrylate group at the side chain terminal is used to keep the orientation structure thermally stable by crosslinking in the discotic nematic phase forming temperature range. it can.

  More specific examples of the discotic liquid crystal compound include the following discotic liquid crystal compounds D1 to D3.

In the discotic liquid crystal compounds D1 to D3, examples of the substituent R include —O—C (= O) —C _n H _{2n + 1} , —O—C (= O) —Ph—O—C _n H _{2n + 1} , − _{O-C (= O) -C} n H 2n -O-C (= O) -CH = CH 2, -O-C (= O) -C n H 2n -O-C (= O) -C ( CH ₃ ) = CH ₂ , —O—C (= O) —C _n H _{2 n} —O—CH = CH ₂ , —O—C (= O) —C _n H _{2 n} —O—C (CH ₃ ) = _{CH 2, -O-C (=} O) -Ph-O-C n H 2n -O-C (= O) -CH = CH 2, -O-C (= O) -Ph-O-C n H _{2n -O-C (= O)} -C (CH 3) = CH 2, -O-C (= O) -Ph-O-C n H 2n -O-CH = CH 2, and -O-C ( _{= O) -Ph-O-C} n H 2n -O-C ( H ₃₎ = CH ₂ and the like. Among _{them, -O-C (= O)} -C n H 2n -O-C (= O) -CH = CH 2, -O-C (= O) -Ph-O-C n H 2n -O -C (= O) -CH = CH ₂ and -O-C (= O) -Ph-O-C _n H _{2 n} -O-CH = CH ₂ are preferable, and -O-C (= O) -Ph _{-O-C n H 2n -O-} C (= O) -CH = CH 2 is more preferable. Here, "-Ph-" represents a phenylene group.

In the substituent R, n is preferably a natural number of 3 to 10, and more preferably a natural number of 4 to 8. In the discotic liquid crystal compound D2, X is CH ₂ , O, S or NH. Among them, CH ₂ or O is preferable, and CH ₂ is more preferable.

  Other specific examples of the discotic liquid crystal compound include: JP-A-8-52206 and a document (C. Destrade et al., Mol. Crysr. Liq. Cryst., Vol. 71, page 111 (1981); Chemical Society of Japan, Quarterly Chemical Review, No. 22, Chemistry of Liquid Crystals, Chapter 5, Chapter 10, Section 2 (1994); B. Kohne et al., Angew. Chem. Soc. Chem. Comm., Page 1794 (1985); J. Zhang et al., J. Am. Chem. Soc., Vol. 116, page 2655 (1994)).

When a discotic liquid crystal compound, an aromatic polyester having an aromatic main chain skeleton, an aromatic polycarbonate, an aromatic polyimide, an aromatic polyamide or the like is used as the polymerizable liquid crystal compound, the obtained optically anisotropic layer is It can be a layer having uniaxiality. The negative uniaxiality of the optically anisotropic layer has a relationship of n1 <n2 = n3 when the refractive index in the triaxial direction of the optically anisotropic layer is n1, n2 and n3 in ascending order of their values. It is a nature. Therefore, in the optically anisotropic layer having negative uniaxiality, the refractive index in the optical axis direction is the smallest. However, the values of n2 and n3 do not have to be strictly equal, and if they are approximately equal, they may have negative uniaxiality. In particular,
(| N2-n3 | / | n2-n1 |) ≦ 0.2
Can be put to practical use as a layer having negative uniaxiality. Further, in order to obtain an optical anisotropic layer capable of greatly improving the viewing angle characteristics of the twisted nematic liquid crystal cell, the optical axis has an inclination β of 5 from the normal direction of the surface of the optical anisotropic layer. It is preferable that it is 60 to 60 °, more preferably 10 to 50 °, and particularly preferably 20 to 40 °. Further, the optically anisotropic layer preferably satisfies the condition of 50 ≦ Re ≦ 400 (nm).

  Examples of rod-like liquid crystal compounds include: JP-A-2002-030042, JP-A-2004-204190, JP-A-2005-263789, JP-A-2007-119415, JP-A-2007-186430, and the like. The rod-shaped liquid crystal compound which has a polymeric group described in the Hei 11-513360 gazette is mentioned. Moreover, if the example of a preferable liquid crystal compound is mentioned by a product name, "LC242" by BASF Corporation etc. will be mentioned. The liquid crystal compounds may be used alone or in combination of two or more at any ratio.

The refractive index anisotropy Δn of the rod-like liquid crystal compound is preferably 0.02 or more, more preferably 0.05 or more, preferably 0.30 or less, more preferably 0.25 or less. If the refractive index anisotropy Δn is less than 0.02, the thickness of the optically anisotropic layer may be thickened to obtain the desired optical function, and the orientation uniformity may be lowered, and it is economical and economical Is also disadvantageous. If the refractive index anisotropy Δn is larger than 0.30, the thickness of the optically anisotropic layer becomes thin in order to obtain a desired optical function, which is disadvantageous for thickness accuracy. When Δn is larger than 0.30, the absorption edge on the long wavelength side of the ultraviolet absorption spectrum of the optically anisotropic layer may extend to the visible range, but it is desirable even if the absorption end of the spectrum extends to the visible range. It can be used as long as it does not adversely affect the optical performance. When the composition (A) contains only one kind of liquid crystal compound, the refractive index anisotropy of the liquid crystal compound is taken as it is as the refractive index anisotropy of the liquid crystal compound in the composition (A). When the composition (A) contains two or more liquid crystal compounds, the refractive index anisotropy Δn determined from the value of the refractive index anisotropy Δn of each liquid crystal compound and the content ratio of each liquid crystal compound The value is taken as the refractive index anisotropy of the liquid crystal compound in the composition (A). The value of the refractive index anisotropy Δn can be measured by the Senalmon method.
These liquid crystal compounds and the reverse wavelength dispersion polymerizable liquid crystal compounds described below may be used alone or in combination of two or more at an arbitrary ratio.

  A reverse wavelength dispersion polymerizable liquid crystal compound can be used as a part or all of the polymerizable liquid crystal compound. By using a reverse wavelength dispersion polymerizable liquid crystal compound, an optically anisotropic layer having reverse wavelength dispersion can be easily obtained.

  Examples of the reverse wavelength dispersion polymerizable liquid crystal compound include a compound having a main chain mesogen and a side chain mesogen bonded to the main chain mesogen in the molecule. In the state where such a reverse wavelength dispersion polymerizable liquid crystal compound is aligned, the side chain mesogen can be aligned in a direction different from that of the main chain mesogen. Therefore, in the optically anisotropic layer, the main chain mesogen and the side chain mesogen may be oriented in different directions. Such orientation can cause the optically anisotropic layer to exhibit reverse wavelength dispersion characteristics.

  Examples of the reverse wavelength dispersion polymerizable liquid crystal compound include a compound represented by the following formula (I) (hereinafter sometimes referred to as “compound (I)”).

If reverse wavelength dispersion polymerizable liquid crystal compound is a compound (I), group ^{-Y 5 -A 4 -Y 3 -A 2} -Y 1 -A 1 -Y 2 -A 3 -Y 4 -A 5 -Y 6 -Is a main chain mesogen, while one group> A ¹ -C (Q ¹ ) = N-N (A ^x ) A ^y is a side chain mesogen, and the group A ¹ has the properties of both the main chain mesogen and the side chain mesogen Affect

In the formula (I), Y ^{1 to} Y ⁸ each independently represent a chemical single bond, -O-, -S-, -O-C (= O)-, -C (= O)- O-, -O-C (= O) -O-, -NR ¹ -C (= O)-, -C (= O) -NR ^1- , -O-C (= O) -NR ^1- , ^{-NR 1 -C (= O) -O} -, - NR 1 -C (= O) -NR 1 -, - O-NR 1 -, or represents ^-NR 1 -O-.

Here, R ¹ represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.
As a C1-C6 alkyl group of R ¹ , for example, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, t-butyl group, n-pentyl group, n-hexyl group etc. are mentioned.
As R ¹ , a hydrogen atom or an alkyl group having 1 to 4 carbon atoms is preferable.

In compound (I), Y ^{1 to} Y ⁸ each independently represent a single chemical bond, —O—, —O—C (= O) —, —C (= O) —O—, or And —O—C (= O) —O— is preferable.

In Formula (I), G ¹ and G ² each independently represent a divalent aliphatic group having 1 to 20 carbon atoms which may have a substituent.
As the divalent aliphatic group having 1 to 20 carbon atoms, for example, a divalent aliphatic group having a chain structure such as an alkylene group having 1 to 20 carbon atoms, an alkenylene group having 2 to 20 carbon atoms; Divalent aliphatic groups, such as a 3-20 cycloalkanediyl group, a C4-C20 cycloalkene diyl group, and a C10-C30 bivalent alicyclic fused ring group;

As a substituent of the divalent aliphatic group of G ¹ and G ² , for example, halogen atoms such as fluorine atom, chlorine atom, bromine atom, iodine atom, etc .; methoxy group, ethoxy group, n-propoxy group, isopropoxy group And alkoxy groups having 1 to 6 carbon atoms, such as n-butoxy group, sec-butoxy group, t-butoxy group, n-pentyloxy group and n-hexyloxy group; Among them, a fluorine atom, a methoxy group and an ethoxy group are preferable.

Further, in the aliphatic group, one or more -O-, -S-, -O-C (= O)-, -C (= O) -O-, -O-C per aliphatic group. ^{(= O) -O -, -} NR 2 -C (= O) -, - C (= O) -NR 2 -, - NR 2 -, or, -C (= O) - is be interposed Good. However, it excludes the case where two or more -O- or -S- respectively adjoin and intervene. Here, R ² represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms as in the case of R ^1, and is preferably a hydrogen atom or a methyl group.
As a group which intervenes in the said aliphatic group, -O-, -OC (= O)-, -C (= O) -O-, -C (= O)-is preferable.

Among them, G ¹ and G ² are each independently an alkylene group having 1 to 20 carbon atoms, an alkenylene group having 2 to 20 carbon atoms, or the like from the viewpoint of exhibiting the desired effects of the present invention better. A divalent aliphatic group having a chain structure is preferable, and a methylene group, ethylene group, trimethylene group, propylene group, tetramethylene group, pentamethylene group, hexamethylene group, octamethylene group, decamethylene group [-(CH ₂ )] ₁₀ - a] and the like, more preferably an alkylene group having 1 to 12 carbon atoms, a tetramethylene group [- _{(CH 2) 4} -], hexamethylene group [- _{(CH 2) 6} -], octamethylene [- ( CH _{2) 8} -], and, decamethylene [- _{(CH 2) 10} -] is particularly preferred.

In Formula (I), each of Z ¹ and Z ² independently represents an alkenyl group having 2 to 10 carbon atoms which may be unsubstituted or substituted with a halogen atom.
As carbon number of this alkenyl group, 2-6 are preferable. As the halogen atom which is a substituent of the alkenyl group of Z ¹ and Z ^2, a fluorine atom, a chlorine atom, bromine atom and the like, a chlorine atom is preferable.

Among them, from the viewpoint of better expressing the desired effect of the present invention, Z ¹ and Z ² are each independently CH ₂ CHCH—, CH ₂ CC (CH ₃ ) —, CH ₂ =. _{C (Cl) -, CH 2} = CH-CH 2 -, CH 2 = C (CH 3) -CH 2 -, _{or, CH 2 = C (CH 3} ) -CH 2 -CH 2 - are preferred, CH _{2 = CH-, CH 2 = C (} CH 3) -, _{or, CH 2 = C (Cl)} - are more _preferred, particularly preferably CH 2 = CH-.

In Formula (I), A ^x represents an organic group having 2 to 30 carbon atoms, which has at least one aromatic ring selected from the group consisting of an aromatic hydrocarbon ring and an aromatic heterocycle. The “aromatic ring” is a cyclic structure having a broad aromaticity according to Huckel's rule, that is, a cyclic conjugated structure having (4n + 2) π electrons, and sulfur, oxygen, typified by thiophene, furan, benzothiazole, etc. It refers to a cyclic structure in which a lone electron pair of a heteroatom such as nitrogen participates in the π electron system to exhibit aromaticity.

The organic group having 2 to 30 carbon atoms having at least one aromatic ring selected from the group consisting of an aromatic hydrocarbon ring and an aromatic heterocyclic ring of A ^x may have a plurality of aromatic rings And may have an aromatic hydrocarbon ring and an aromatic heterocyclic ring.

  As said aromatic hydrocarbon ring, a benzene ring, a naphthalene ring, an anthracene ring etc. are mentioned, for example. Examples of the aromatic heterocyclic ring include monocyclic aromatic heterocyclic rings such as pyrrole ring, furan ring, thiophene ring, pyridine ring, pyridazine ring, pyrimidine ring, pyrazine ring, pyrazole ring, imidazole ring, oxazole ring and thiazole ring; Benzothiazole ring, benzoxazole ring, quinoline ring, phthalazine ring, benzoimidazole ring, benzopyrazole ring, benzofuran ring, benzothiophene ring, thiazolopyridine ring, oxazolopyridine ring, thiazolopyrazine ring, oxazolopyrazine ring, thia And aromatic heterocycles such as fused rings such as a zolopyridazine ring, an oxazolopyridazine ring, a thiazolo pyrimidine ring, an oxazolo pyrimidine ring, and the like.

The aromatic ring possessed by A ^x may have a substituent. Examples of such substituent include halogen atoms such as fluorine atom and chlorine atom; cyano group; alkyl group having 1 to 6 carbon atoms such as methyl group, ethyl group and propyl group; carbon number 2 such as vinyl group and allyl group Alkenyl groups of 6 to 6; halogenated alkyl groups of 1 to 6 carbon atoms such as trifluoromethyl group; substituted amino groups such as dimethylamino group; alkoxy of 1 to 6 carbon atoms such as methoxy, ethoxy and isopropoxy groups group; a nitro group; a phenyl group, an aryl group such as phenyl or ^{naphthyl; -C (= O) -R 5} ; -C (= O) -OR 5; -SO 2 R 6; and the like. Here, R ⁵ represents an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, or a cycloalkyl group having 3 to 12 carbon atoms, and R ⁶ is a carbon similar to R ⁴ described later It represents an alkyl group of 1 to 20, an alkenyl group of 2 to 20 carbon atoms, a phenyl group or a 4-methylphenyl group.

Further, the aromatic ring possessed by A ^x may have a plurality of identical or different substituents, and two adjacent substituents may be joined together to form a ring. The ring to be formed may be a single ring, a condensed polycyclic ring, an unsaturated ring or a saturated ring.
Incidentally, "the number of carbon atoms" of the organic group having 2 to 30 carbon atoms A ^x is meant the total number of carbon atoms of the total organic groups that do not contain carbon atoms of substituents (the same in A ^y that will be described later.) .

Examples of the organic group having 2 to 30 carbon atoms having at least one aromatic ring selected from the group consisting of an aromatic hydrocarbon ring and an aromatic heterocyclic ring of A ^x include, for example, an aromatic hydrocarbon ring group; aromatic Heterocyclic group; C3-C30 alkyl group having at least one aromatic ring selected from the group consisting of aromatic hydrocarbon ring group and aromatic heterocyclic group; aromatic hydrocarbon ring group and aromatic heterocyclic ring Group having at least one aromatic ring selected from the group consisting of alkenyl groups having 4 to 30 carbon atoms; and at least one aromatic ring selected from the group consisting of an aromatic hydrocarbon ring group and an aromatic heterocyclic group C4-C30 alkynyl group; etc. are mentioned.

Among them, A ^x is more preferably any of the groups shown below. In the formulas, X represents, NR ^7, oxygen atom, sulfur atom, -SO-, or, -SO ₂ - represents a (where oxygen atom, a sulfur atom, -SO -, - SO ₂ - is, respective adjacent Except case). R ⁷ represents a hydrogen atom; or an alkyl group having 1 to 6 carbon atoms such as a methyl group, an ethyl group or a propyl group.

The ring which A ^x has may have a substituent. Examples of such substituent include halogen atoms such as fluorine atom and chlorine atom; cyano group; alkyl group having 1 to 6 carbon atoms such as methyl group, ethyl group and propyl group; carbon number 2 such as vinyl group and allyl group Alkenyl groups of 6 to 6; halogenated alkyl groups of 1 to 6 carbon atoms such as trifluoromethyl group; substituted amino groups such as dimethylamino group; alkoxy of 1 to 6 carbon atoms such as methoxy, ethoxy and isopropoxy groups group; a nitro group; a phenyl group, an aryl group such as phenyl or ^{naphthyl; -C (= O) -R 8} ; -C (= O) -OR 8; -SO 2 R 6; and the like. Here, R ⁸ represents an alkyl group having 1 to 6 carbon atoms such as a methyl group or an ethyl group; or an aryl group having 6 to 14 carbon atoms such as a phenyl group. Especially, a halogen atom, a cyano group, a C1-C6 alkyl group, and a C1-C6 alkoxy group are preferable.

The ring possessed by A ^x may have a plurality of identical or different substituents, and two adjacent substituents may be joined together to form a ring. The ring to be formed may be a single ring or a condensed polycyclic ring.
"The number of carbon atoms" of the organic group having 2 to 30 carbon atoms A ^x is meant the total number of carbon atoms of the total organic groups that do not contain carbon atoms of substituents (the same in A ^y that will be described later.).

In the formula (I), A ^y is a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, an alkenyl group having 2 to 20 carbon atoms which may have a substituent, A cycloalkyl group having 3 to 12 carbon atoms which may have a substituent, an alkynyl group having 2 to 20 carbon atoms which may have a substituent, -C (= O) -R ³ , -SO ₂ An organic group having a carbon number of 2 to 30 having at least one aromatic ring selected from the group consisting of -R ⁴ , -C (= S) NH-R ⁹ , or an aromatic hydrocarbon ring and an aromatic heterocycle Represent. Here, R ³ has an alkyl group having 1 to 20 carbon atoms which may have a substituent, an alkenyl group having 2 to 20 carbon atoms which may have a substituent, and a substituent. R ³ represents an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, or a cycloalkyl group having 3 to 12 carbon atoms or an aromatic hydrocarbon group having 5 to 12 carbon atoms. R ⁹ represents a phenyl group or a 4-methylphenyl group, and R ⁹ is an alkyl group having 1 to 20 carbon atoms which may have a substituent, and an alkenyl having 2 to 20 carbon atoms which may have a substituent This represents a group, a cycloalkyl group having 3 to 12 carbon atoms which may have a substituent, or an aromatic group having 5 to 20 carbon atoms which may have a substituent.

As a C1-C20 alkyl group of the C1-C20 alkyl group which may have a substituent of ^Ay , For example, a methyl group, an ethyl group, n-propyl group, isopropyl group, n -Butyl, isobutyl, 1-methylpentyl, 1-ethylpentyl, sec-butyl, t-butyl, n-pentyl, isopentyl, neopentyl, n-hexyl, isohexyl, n -Heptyl group, n-octyl group, n-nonyl group, n-decyl group, n-undecyl group, n-dodecyl group, n-tridecyl group, n-tetradecyl group, n-pentadecyl group, n-hexadecyl group, n- -A heptadecyl group, n-octadecyl group, n-nonadecyl group, n-icosyl group is mentioned. It is preferable that carbon number of the C1-C20 alkyl group which may have a substituent is 1-12, and it is still more preferable that it is 4-10.

As an alkenyl group having 2 to 20 carbon atoms of the alkenyl group having 2 to 20 carbon atoms which may have a substituent, of A ^y , for example, a vinyl group, a propenyl group, an isopropenyl group, a butenyl group, an isobutenyl group And pentenyl group, hexenyl group, heptenyl group, octenyl group, decenyl group, undecenyl group, dodecenyl group, tridecenyl group, tetradecenyl group, pentadecenyl group, hexadecenyl group, heptadecenyl group, octadecenyl group, nonadecenyl group, icosenyl group and the like. It is preferable that carbon number of the C2-C20 alkenyl group which may have a substituent is 2-12.

The cycloalkyl group of 3 to 12 carbon atoms of the cycloalkyl group of 3 to 12 carbon atoms which may have a substituent, of A ^y is, for example, cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group, A cyclooctyl group etc. are mentioned.

As an alkynyl group having 2 to 20 carbon atoms of the alkynyl group having 2 to 20 carbon atoms which may have a substituent, of A ^y , for example, ethynyl group, propynyl group, 2-propynyl group (propargyl group), Butynyl group, 2-butynyl group, 3-butynyl group, pentynyl group, 2-pentynyl group, hexynyl group, 5-hexynyl group, heptynyl group, octynyl group, 2-octynyl group, nonanyl group, decanyl group, 7-decanyl group Etc.

As a substituent of the C1-C20 alkyl group which may have a substituent of ^Ay , and the C2-C20 alkenyl group which may have a substituent, it is a fluorine atom, for example Halogen atoms such as chlorine atom; cyano group; substituted amino group such as dimethylamino group; alkoxy group having 1 to 20 carbon atoms such as methoxy group, ethoxy group, isopropoxy group, butoxy group; methoxymethoxy group, methoxyethoxy group And the like, an alkoxy group having 1 to 12 carbon atoms substituted with an alkoxy group having 1 to 12 carbon atoms; a nitro group; an aryl group such as a phenyl group and a naphthyl group; a carbon number such as a cyclopropyl group, a cyclopentyl group and a cyclohexyl group 3 to 8 cycloalkyl groups; cycloalkyloxy groups having 3 to 8 carbon atoms such as cyclopentyloxy and cyclohexyloxy groups; tetrahydrofuranyl Cyclic ether groups having 2 to 12 carbon atoms such as tetrahydropyranyl, dioxolanyl and dioxanyl; aryloxys having 6 to 14 carbons such as phenoxy and naphthoxy; trifluoromethyl and pentafluoroethyl Group, a fluoroalkoxy group having 1 to 12 carbon atoms in which at least one is substituted with a fluorine atom, such as -CH ₂ CF ₃ ; a benzofuryl group; a benzopyranyl group; a benzodioxolyl group; a benzodioxanyl group; _{^{(= O) -R 7a; -C}} (= O) -OR 7a; alkoxy group ^{-SR 10} carbon atoms substituted with ^{1~12;; -SO 2 R 8a;} -SR 10 hydroxyl; and the like. Here, R ^7a and R ¹⁰ each independently represent an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, or 6 to 12 carbon atoms R ^8a represents an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, a phenyl group or a 4-methylphenyl group as in the above R ⁴ .

As a substituent of the cycloalkyl group having 3 to 12 carbon atoms which may have a substituent of A ^y , for example, halogen atoms such as fluorine atom and chlorine atom; cyano group; substituted amino such as dimethylamino group Alkyl group having 1 to 6 carbon atoms such as methyl group, ethyl group and propyl group; alkoxy group having 1 to 6 carbon atoms such as methoxy group, ethoxy group and isopropoxy group; nitro group; phenyl group and naphthyl group Aryl group of 3 to 8 carbon atoms such as cyclopropyl group, cyclopentyl group and cyclohexyl group; -C (= O) -R ^7a ; -C (= O) -OR ^7a ; -SO ₂ R ^8a Hydroxyl group; and the like. Here, R ^7a and R ^8a represent the same meaning as described above.

As a substituent of the C2-C20 alkynyl group which may have a substituent of A ^y , for example, a C 1-20 alkyl group which may have a substituent, and a substituent And the same substituents as those of the alkenyl group having 2 to 20 carbon atoms which may have one of the following.

In the group represented by -C (= O) -R ³ of A ^y , R ³ is an alkyl group having 1 to 20 carbon atoms which may have a substituent, or even if it has a substituent It represents a good C2-C20 alkenyl group, a C3-C12 cycloalkyl group which may have a substituent, or a C5-C12 aromatic hydrocarbon group. Specific examples of these, the A ^y, alkyl group of carbon atoms which may 20 have a substituent, an alkenyl group having carbon atoms of 2 to 20 which may have a substituent, a substituent The same thing as what was mentioned as an example of the C3-C12 cycloalkyl group which may be possessed is mentioned.

In the group represented by -SO ₂ -R ⁴ of A ^y , R ⁴ is an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, a phenyl group or a 4-methylphenyl group Represent. Of R ^4, specific examples of the alkyl group, and alkenyl group having 2 to 20 carbon atoms having 1 to 20 carbon atoms, of the ^{A y,} alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms The same ones as mentioned in the examples may be mentioned.

Examples of the organic group having 2 to 30 carbon atoms having at least one aromatic ring selected from the group consisting of an aromatic hydrocarbon ring and an aromatic heterocyclic ring of A ^y are the same as those exemplified for the aforementioned A ^x Can be mentioned.

Among these, as A ^y , a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, an alkenyl group having 2 to 20 carbon atoms which may have a substituent, a substituent A cycloalkyl group having 3 to 12 carbon atoms which may have a substituent, an alkynyl group having 2 to 20 carbon atoms which may have a substituent, -C (= O) -R ³ , -SO ₂ -R ⁴ or a group represented by a C2 to C30 organic group having at least one aromatic ring selected from the group consisting of an aromatic hydrocarbon ring and an aromatic heterocyclic ring is preferable. Further, A ^y has a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, an alkenyl group having 2 to 20 carbon atoms which may have a substituent, and a substituent. Optionally substituted C 3-12 cycloalkyl group, optionally substituted C 2-20 alkynyl group, optionally substituted C 6-12 aromatic hydrocarbon A hydrogen group, an aromatic heterocyclic group having 3 to 9 carbon atoms which may have a substituent, and a group represented by —C (= O) —R ³ or —SO ₂ —R ⁴ are more preferable. Here, R ³ and R ⁴ represent the same meaning as described above.

Of A ^y, alkyl group of carbon atoms which may 20 have a substituent, an alkenyl group which may 2-20 carbon atoms which may have a substituent, which may have a substituent carbon The substituent of the alkynyl group having 2 to 20 carbon atoms is a halogen atom, a cyano group, an alkoxy group having 1 to 20 carbon atoms, an alkoxy group having 1 to 12 carbon atoms substituted with an alkoxy group having 1 to 12 carbon atoms, Group, cyclohexyl group, cyclic ether group having 2 to 12 carbon atoms, aryloxy group having 6 to 14 carbon atoms, hydroxyl group, benzodioxanyl group, phenylsulfonyl group, 4-methylphenylsulfonyl group, benzoyl group, -SR ¹⁰ Is preferred. Here, R ¹⁰ represents the same meaning as described above.

Of A ^y, a cycloalkyl group having from 3 to 12 carbon atoms which may have a substituent, an aromatic hydrocarbon group having 6 to 12 carbon atoms which may have a substituent, have a substituent The substituent of the aromatic heterocyclic group having 3 to 9 carbon atoms is preferably a fluorine atom, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, or a cyano group.

Also, A ^x and A ^y may be taken together to form a ring. As such a ring, for example, an unsaturated heterocyclic ring having 4 to 30 carbon atoms and an unsaturated carbocyclic ring having 6 to 30 carbon atoms which may have a substituent can be mentioned.

  The unsaturated heterocyclic ring having 4 to 30 carbon atoms and the unsaturated carbocyclic ring having 6 to 30 carbon atoms are not particularly limited, and may or may not have aromaticity.

The total number of π electrons contained in A ^x and A ^y is preferably 4 or more, more preferably 6 or more, preferably 24 or less, more preferably from the viewpoint of achieving the desired effects of the present invention better. It is 20 or less, particularly preferably 18 or less.

Particularly preferred combinations of A ^x and A ^y are:
(Δ) A ^x is any of a group having the following structure, A ^y is a hydrogen atom, a cycloalkyl group having 3 to 8 carbon atoms, (a halogen atom, a cyano group, an alkyl group having 1 to 6 carbon atoms, carbon An aromatic hydrocarbon group having 6 to 12 carbon atoms which may have an alkoxy group having 1 to 6 carbon atoms or a cycloalkyl group having 3 to 8 carbon atoms as a substituent, (halogen atom, 1 to 6 carbon atoms Of an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a cyano group) as a substituent, an aromatic heterocyclic group having 3 to 9 carbon atoms, or 1 carbon atom optionally having a substituent -20 alkyl group, alkenyl group having 1 to 20 carbon atoms which may have a substituent, or alkynyl group having 2 to 20 carbon atoms which may have a substituent, and the substituent is , Halogen atom, cyano group, alkoxy group having 1 to 20 carbon atoms, carbon number Alkoxy group having 1 to 12 carbon atoms, phenyl, cyclohexyl, cyclic ether having 2 to 12 carbons, aryloxy having 6 to 14 carbons, hydroxyl, benzodioxax substituted with alkoxy of 1 to 12 group, a benzenesulfonyl group, a benzoyl group, and a combination of any of -SR ^10. In the following formulae, X represents the same meaning as described above. Here, R ¹⁰ represents the same meaning as described above.

In Formula (I), A ¹ represents a trivalent aromatic group which may have a substituent. The trivalent aromatic group may be a trivalent carbocyclic aromatic group or a trivalent heterocyclic aromatic group. From the viewpoint of expressing the desired effects of the present invention better, a trivalent carbocyclic aromatic group is preferable, a trivalent benzene ring group or a trivalent naphthalene ring group is more preferable, and a trivalent benzene ring group is more preferable. Or a trivalent naphthalene ring group is more preferred.

Among these, groups represented by formulas (A11) to (A25) shown below are more preferable as A ¹ , and in formulas (A11), (A13), (A15), (A19), (A19) and (A23) Groups represented are more preferable, and groups represented by formulas (A11) and (A23) are particularly preferable. In the following formulas, in order to clarify the bonding state, substituents Y ¹ and Y ² are described for convenience (Y ¹ and Y ² have the same meanings as described above. The same applies to the following). .

As a substituent which the trivalent aromatic group of A ¹ may have, the same ones as exemplified as the substituent of the aromatic group of the above A ^X can be mentioned. As A ^{1, one} not having a substituent is preferable.

In Formula (I), each of A ² and A ³ independently represents a C3-C30 divalent alicyclic hydrocarbon group which may have a substituent. As a C3-C30 bivalent alicyclic hydrocarbon group, a C3-C30 cycloalkanediyl group, a C10-C30 bivalent alicyclic fused ring group etc. are mentioned, for example .

  Examples of the cycloalkanediyl group having 3 to 30 carbon atoms include cyclopropanediyl group; cyclobutanediyl group such as cyclobutane-1,2-diyl group and cyclobutane-1,3-diyl group; cyclopentane-1,2 Cyclohexanediyl groups such as diyl group, cyclopentane-1,3-diyl group etc. Cyclohexanediyl such as cyclohexane-1,2-diyl group, cyclohexane-1,3-diyl group, cyclohexane-1,4-diyl group etc A cycloheptanediyl group such as cycloheptane-1,2-diyl group, cycloheptane-1,3-diyl group, cycloheptane-1,4-diyl group, etc .; cyclooctane-1,2-diyl group, cyclooctane Cyclooctane such as 1,3-diyl group, cyclooctane-1,4-diyl group, cyclooctane-1,5-diyl group Cyclodecandiyl groups such as didoyl group; cyclodecane-1,2-diyl group, cyclodecane-1,3-diyl group, cyclodecane-1,4-diyl group, cyclodecane-1,5-diyl group, etc. cyclododecane-1, Cyclododecanediyl group such as 2-diyl group, cyclododecane-1,3-diyl group, cyclododecane-1,4-diyl group, cyclododecane-1,5-diyl group; cyclotetradecane-1,2-diyl group Cyclotetradecanediyl group such as cyclotetradecane-1,3-diyl group, cyclotetradecane-1,4-diyl group, cyclotetradecane-1,5-diyl group, cyclotetradecane-1,7-diyl group, etc .; cycloeicosane And -1,2-diyl groups, cycloeicosane-1,10-diyl groups, etc .;

  As a C10-C30 divalent alicyclic fused ring group, for example, a decalin diyl group such as decalin-2,5-diyl group, decalin-2,7-diyl group, etc .; adamantane-1,2-diyl group An adamantanediyl group such as adamantane-1,3-diyl group; bicyclo [2.2.1] heptane-2,3-diyl group; bicyclo [2.2.1] heptan-2,5-diyl group And bicyclo [2.2.1] heptandiyl groups such as bicyclo [2.2.1] heptane-2,6-diyl group; and the like.

These divalent alicyclic hydrocarbon groups may have a substituent at any position. Examples of the substituent include the same as those exemplified as the substituent of the aromatic group of the aforementioned A ^X.

Among these, as A ² and A ³ , a divalent alicyclic hydrocarbon group having 3 to 12 carbon atoms is preferable, and a cycloalkanediyl group having 3 to 12 carbon atoms is more preferable, and the following formula (A31) to The group represented by (A34) is more preferable, and the group represented by the formula (A32) is particularly preferable.

Divalent alicyclic hydrocarbon groups of said 3 to 30 carbon atoms, based on the difference in the configuration of the carbon atom bonded to the Y ¹ and Y ^{3 (or} Y ² and Y ^4), the cis- and trans Stereoisomers may exist. For example, in the case of a cyclohexane-1,4-diyl group, as shown below, cis isomer (A32a) and trans isomer (A32b) may exist.

  The C3-C30 divalent alicyclic hydrocarbon group may be cis-type, trans-type or a mixture of cis- and trans-type isomers. Among them, the trans type or cis type is preferable, and the trans type is more preferable, because the orientation is good.

In Formula (I), each of A ⁴ and A ⁵ independently represents a divalent aromatic group having 6 to 30 carbon atoms which may have a substituent. The aromatic group of A ⁴ and A ⁵ may be monocyclic or polycyclic.

The divalent aromatic group of A ⁴ and A ⁵ may have a substituent at any position. Examples of the substituent include a halogen atom, a cyano group, a hydroxyl group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a nitro group, and a —C (= O) —OR ^8b group; It can be mentioned. Here, R ^8b is an alkyl group having 1 to 6 carbon atoms. Among them, a halogen atom, an alkyl group having 1 to 6 carbon atoms, and an alkoxy group are preferable. Moreover, as a halogen atom, a fluorine atom is more preferable, As a C1-C6 alkyl group, a methyl group, an ethyl group, and a propyl group are more preferable, As an alkoxy group, a methoxy group and an ethoxy group are more preferable.

Among these, from the viewpoint of exhibiting the desired effects of the present invention better, A ⁴ and A ⁵ may each independently have a substituent, and the following formulas (A41) and (A42) Or the group represented by (A43) is more preferable, and the group represented by the formula (A41) which may have a substituent is particularly preferable.

In Formula (I), Q ¹ represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms which may have a substituent. The optionally substituted alkyl group having 1 to 6 carbon atoms, the same ones as exemplified in the A ^X and the like. Among these, Q ¹ is preferably a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, and more preferably a hydrogen atom and a methyl group.

  Compound (I) can be produced, for example, by the reaction of a hydrazine compound and a carbonyl compound, as described in WO 2012/147904.

  When the composition (A) contains a reverse wavelength dispersion polymerizable liquid crystal compound as a polymerizable liquid crystal compound, the composition (A) may contain a polymerizable monomer (a) as an optional component. The "polymerizable monomer (a)" refers to a compound other than the reverse wavelength dispersion polymerizable liquid crystal compound, in particular, among the compounds having a polymerization ability and capable of functioning as a monomer.

As the polymerizable monomer (a), for example, those having one or more polymerizable groups per molecule can be used. By having such a polymerizable group, polymerization can be achieved in the formation of the optically anisotropic layer. When the polymerizable monomer (a) is a crosslinkable monomer having two or more polymerizable groups per molecule, crosslinkable polymerization can be achieved. Examples of such a polymerizable group include the same groups as the groups Z ¹ -Y ⁷ -and the groups Z ² -Y ^8- in the compound (I), and more specifically, for example, an acryloyl group, Methacryloyl group and epoxy group can be mentioned.

  The polymerizable monomer (a) may itself be liquid crystalline or non-liquid crystalline. Here, “non-liquid crystalline” per se means that the polymerizable monomer (a) itself is on the substrate film 20 that has been subjected to the alignment treatment even when the temperature is from room temperature to 200 ° C. And those that do not show orientation. Whether or not the orientation is indicated can be determined by whether or not there is contrast between light and dark when the rubbing direction is rotated in a plane phase in cross Nicol transmission observation of a polarizing microscope.

In the composition (A), the blending ratio of the polymerizable monomer (a) is preferably 1 to 100 parts by weight, preferably 5 to 50 parts by weight with respect to 100 parts by weight of the reverse wavelength dispersion polymerizable liquid crystal compound. It is. Within this range, precise control of the reverse wavelength dispersion characteristics is facilitated by appropriately adjusting the blend ratio of the polymerizable monomer (a) so as to exhibit the desired reverse wavelength dispersion characteristics.
In addition, the curing degree of the polymerizable liquid crystal composition can be increased by blending the polymerizable monomer (a).

  The polymerizable monomer (a) can be produced by a known production method. Alternatively, those having a similar structure to compound (I) can be produced according to the method for producing compound (I).

  The composition (A) may contain, in addition to the polymerizable liquid crystal compound and any of the above-mentioned optional compounds (polymerizable monomer (a) etc.), if necessary, any components such as those exemplified below. .

  Composition (A) may contain a polymerization initiator. The polymerization initiator may be appropriately selected according to the type of the polymerizable liquid crystal compound, the polymerizable monomer (a) and the polymerizable group of the other polymerizable compound in the composition (A). For example, if the polymerizable group is radically polymerizable, a radical polymerization initiator may be used, if it is an anionically polymerizable group, an anionic polymerization initiator may be used, and if it is a cationically polymerizable group, a cationic polymerization initiator may be used. .

  As a radical polymerization initiator, a thermal radical generator which is a compound which generates active species capable of initiating polymerization of a polymerizable compound by heating; and visible light, ultraviolet light (such as i ray), far ultraviolet light, electron beam And any photo radical generator which is a compound that generates active species capable of initiating polymerization of a polymerizable compound upon exposure to exposure light such as X-ray; Is preferred.

  As the photoradical generator, for example, acetophenone type compounds, biimidazole type compounds, triazine type compounds, O-acyloxime type compounds, onium salt type compounds, benzoin type compounds described in International Publication WO 2012/147904, Examples include benzophenone compounds, α-diketone compounds, polynuclear quinone compounds, xanthone compounds, diazo compounds, imidosulfonate compounds and the like.

  Examples of the anionic polymerization initiator include alkyl lithium compounds; monolithium salts or monosodium salts such as biphenyl, naphthalene and pyrene; and polyfunctional initiators such as dilithium salts and trilithium salts.

  Also, as the cationic polymerization initiator, for example, a protonic acid such as sulfuric acid, phosphoric acid, perchloric acid, trifluoromethanesulfonic acid, etc .; a Lewis acid such as boron trifluoride, aluminum chloride, titanium tetrachloride or tin tetrachloride A combination system of an aromatic onium salt or an aromatic onium salt and a reducing agent;

Examples of commercially available products that can be used as a polymerization initiator include photopolymerization initiators such as Irgacure 907 and Irgacure 379 (manufactured by BASF).
One of these polymerization initiators may be used alone, or two or more of them may be used in combination in an arbitrary ratio.

  In the composition (A), the blending ratio of the polymerization initiator is preferably 0.1 parts by weight to 30 parts by weight, more preferably 0.5 parts by weight to 10 parts by weight with respect to 100 parts by weight of the polymerizable compound. .

  Composition (A) may contain a surfactant to adjust surface tension. As the said surfactant, nonionic surfactant is preferable. A commercial item can be used as the said nonionic surfactant. For example, the nonionic surfactant which is an oligomer whose molecular weight is about several thousands is mentioned. Specific examples of these surfactants which are commercially available are "PF-151N", "PF-636", "PF-6320", "PF-656", and "PF-6520" of PolyFox of OMNOVA. "PF-3320", "PF-651", "PF-652"; "FTX-209F", "FTX-208G", "FTX-204D" from Neos Corporation Futergent; "KH-40" from Seimi Chemical Surfron “S-420” or the like can be used. Moreover, surfactant may be used individually by 1 type, and may be used combining two or more types by arbitrary ratios. In the composition (A), the blending ratio of the surfactant is preferably 0.01 parts by weight to 10 parts by weight, more preferably 0.1 parts by weight to 2 parts by weight with respect to 100 parts by weight of the polymerizable compound. .

  The composition (A) may contain a cellulose-based polymer compound for the purpose of adjusting surface tension and the like. When a discotic liquid crystal compound is used as the polymerizable liquid crystal compound, repelling at the time of coating can be suppressed by containing the cellulose-based polymer compound. The cellulose-based polymer compound is well compatible with the discotic liquid crystal compound, and has a low tendency to disturb the alignment state. Examples of the cellulose-based polymer compound include cellulose acetate butyrate, cellulose acetate propyrate, hydroxypropyl cellulose, methyl cellulose and carboxymethyl cellulose. The blending ratio of the cellulose-based polymer compound in the composition (A) is preferably 1% to 8%, more preferably 1.5% to 6% as a weight percentage to the total amount of the polymerizable liquid crystal compound. When the blending ratio of the cellulose-based polymer compound is at least the lower limit of the above range, an effective repelling suppression effect can be obtained, and by being at the upper limit% or less of the above range, the orientation speed of the discotic liquid crystal compound Extreme drop can be avoided.

  The composition (A) may contain a solvent such as an organic solvent. Examples of such solvents include ketone solvents such as cyclopentanone, cyclohexanone, methyl ethyl ketone, acetone and methyl isobutyl ketone; acetic acid ester solvents such as butyl acetate and amyl acetate; halogenated hydrocarbon solvents such as chloroform, dichloromethane and dichloroethane; And ether solvents such as 4-dioxane, cyclopentyl methyl ether, tetrahydrofuran, tetrahydropyran, 1,3-dioxolane, 1,2-dimethoxyethane; and aromatic hydrocarbon solvents such as toluene, xylene and mesitylene. Moreover, a solvent may be used individually by 1 type, and may be used combining 2 or more types by arbitrary ratios. The boiling point of the solvent is preferably 60 ° C. to 250 ° C., and more preferably 60 ° C. to 150 ° C., from the viewpoint of excellent handleability. The amount of the solvent used is preferably 100 parts by weight to 1000 parts by weight with respect to 100 parts by weight of the polymerizable compound.

  Composition (A) further includes metals, metal complexes, dyes, pigments, fluorescent materials, phosphorescent materials, leveling agents, thixo agents, gelling agents, polysaccharides, UV absorbers, infrared absorbers, antioxidants, ions It may contain additives such as exchange resins and metal oxides such as titanium oxide. A combination agent may be used individually by 1 type, and may be used combining two or more types by arbitrary ratios. In the composition (A), the ratio of such an optional compounding agent is preferably 0.1 parts by weight to 20 parts by weight with respect to 100 parts by weight of the polymerizable compound.

The viscosity of the coating liquid 30 is preferably 0.5 mPa · s or more, more preferably 1.0 mPa · s or more, particularly preferably 2.0 mPa · s or more, preferably 30 mPa · s or less, more preferably 20 mPa · s. S or less, particularly preferably 15 mPa · s or less. By the viscosity of the coating liquid 30 being more than the lower limit value of the said range, dripping can be suppressed. In addition, when the viscosity of the coating liquid 30 is equal to or less than the upper limit value of the above range, deformation of the liquid pool 31 due to the influence of the carrier air flow can be suppressed, so formation of streaks in the coating layer 40 can be suppressed.
The viscosity of the coating liquid 30 can be measured at a temperature of 23 ° C. of the coating liquid 30.

[8. Method of producing coated film]
The coated film 50 can be manufactured by using the coating device 10 described above. Hereinafter, the manufacturing method of this coating film 50 is demonstrated. In the manufacturing method of this coating film 50, the coating film 50 is manufactured continuously, conveying the base film 20 continuously to a film longitudinal direction.

  In the manufacturing method of the coating film 50 which concerns on this embodiment, as shown in FIG. 1, the process of supplying the base film 20 to the backup roll 100 by the supply roll 300 is performed. At this time, the tension of the base film 20 measured by the supply roll 300 is preferably 50 N / m or more, more preferably 100 N / m or more, particularly preferably 130 N / m or more, preferably less than 500 N / m, More preferably, it is 400 N / m or less, particularly preferably 350 N / m or less.

  The tension of the base film 20 measured by the supply roll 300 indicates the tension of the base film 20 as it enters the backup roll 100. Therefore, depending on the magnitude of the tension, the base film 20 slips on the outer circumferential surface 110 of the backup roll 100 and the infiltration of air between the backup roll 100 and the base film 20 is easy. Be affected. Specifically, slippage of the base film 20 on the outer circumferential surface 110 of the backup roll 100 can be effectively suppressed by the tension being at least the lower limit value of the range. In addition, when the tension is equal to or less than the upper limit value of the range, the infiltration of air between the backup roll 100 and the base film 20 can be suppressed, so that deformation of the base film 20 due to wrinkles and breakage is caused. The formation of the part can be effectively suppressed.

  In addition, by setting the tension of the base film 20 measured by the supply roll 300 within the above range, it is possible to suppress fluttering of the base film 20 being transported. Therefore, even in the state of being supported by the outer peripheral surface 110 of the backup roll 100, it is possible to suppress the rattling of the base film 20, so that the coating liquid 30 can be coated particularly uniformly.

  The conveyance speed of the substrate film 20 is preferably 5 m / min or more, more preferably 7 m / min or more, particularly preferably 10 m / min or more, preferably 50 m / min or less, more preferably 45 m / min or less, particularly Preferably it is 40 m / min or less. When the conveyance speed of the base film 20 is equal to or more than the lower limit value of the above range, the conveyance of the base film 20 can be stabilized, and the coating thickness can be made uniform. Further, when the transport speed is equal to or less than the upper limit value of the range, the transport air when the base film 20 intrudes into the backup roll 100 can be reduced.

  Then, the process which conveys the said base film 20 is performed, supporting the base film 20 by the outer peripheral surface 110 of the backup roll 100. FIG. The base film 20 supplied to the backup roll 100 starts contact with the outer circumferential surface 110 of the backup roll 100 and is supported by the outer circumferential surface 110. Then, while being supported by the outer circumferential surface 110 of the backup roll 100 in this manner, the sheet is transported according to the rotation of the backup roll 100.

  Air normally enters between the backup roll 100 and the base film 20 at a point P1 at which the base film 20 starts to be supported by the outer circumferential surface 110 of the backup roll 100. Here, since the outer peripheral surface 110 of the backup roll 100 has a surface roughness satisfying the formula (1), a minute gap is formed between the backup roll 100 and the base film 20. . Therefore, the intruding air is accommodated in the minute gap. Therefore, in the base film 20 supported by the outer peripheral surface 110 of the backup roll 100, the formation of the deformed portion (see the deformed portion 940 in FIG. 2) is suppressed.

  In addition, if the gap between the backup roll and the base film is too large, it is conceivable that the contact area between the backup roll and the base film becomes small and a sufficient frictional force can not be obtained. However, the outer peripheral surface 110 of the backup roll 100 having the surface roughness satisfying the formula (1) can contact the base film 20 with a sufficiently large area. Therefore, in the present embodiment, the outer peripheral surface 110 of the backup roll 100 can support the base film 20 with a high frictional force, so that the slip of the base film 20 on the outer peripheral surface 110 can be suppressed. Therefore, on the outer peripheral surface 110 of the backup roll 100, accurate position control of the base film 20 is possible.

  When the base film 20 supported by the outer peripheral surface 110 of the backup roll 100 is transported to the position where the coater 200 is provided, the coating solution 30 is coated on the base film 20 by the coater 200. To be done. In the present embodiment, as shown in FIG. 3, the coating liquid 30 is discharged from the discharge port 230 of the die 210 of the coater 200 to the surface 22 of the base film 20 to coat the coating liquid 30. Do the work.

  The coating liquid 30 discharged from the discharge port 230 of the die 210 forms a liquid pool 31 on the surface 22 of the base film 20. Then, the coating liquid 30 of the liquid pool 31 is fixed to the surface 22 of the base film 20, whereby the coating of the coating liquid 30 is achieved, and the coating layer 40 is formed on the base film 20. Ru. In the present embodiment, since the base film 20 does not have a deformed portion due to the entry of air, the coating liquid 30 can be coated with a uniform thickness. Furthermore, in the present embodiment, since the gap C of an appropriate size is provided between the coater 200 and the base film 20, it is difficult for the vibration of a pump or the like to be transmitted to the liquid pool 31 through the die 210. Therefore, it is possible to apply the coating liquid 30 while suppressing thickness unevenness particularly effectively.

  The base film 20 having the coating layer 40 formed on the surface 22 as described above is further transported as the backup roll 100 rotates as shown in FIG. Thereafter, when the base film 20 is conveyed to a point P2 at which the support of the base film 20 on the outer peripheral surface 110 of the backup roll 100 ends, the base film 20 is separated from the backup roll 100. Under the present circumstances, since there is no deformation part (refer deformation part 940 of FIG. 2) by the penetration of air in the base film 20, there is no sudden movement of the base film 20 when it separates from the backup roll 100, The flow of the construction layer 40 does not occur. Therefore, the coated film 50 provided with the base film 20 and the coating layer 40 with high uniformity of the thickness formed on the surface 22 of the base film 20 can be obtained by the manufacturing method described above.

  In the above manufacturing method, the coating of the coating liquid 30 on the substrate film 20 by the coater 200 is preferably performed so as to form a coating layer 40 having a desired wet film thickness. Here, the wet film thickness of the coating layer 40 shows the thickness of the coating layer 40 in the state which maintained the liquid state, and does not show the thickness of the coating layer 40 after drying or hardening. The specific wet film thickness of the coating layer 40 is preferably 0.5 μm or more, more preferably 1 μm or more, particularly preferably 5 μm or more, preferably 50 μm or less, more preferably 40 μm or less, particularly preferably 30 μm or less It is. When the wet film thickness of the coating layer 40 is at least the lower limit value of the above range, it is possible to easily control the uniformity of the thickness in the width direction of the coating layer 40, and the upper limit of the above range By being less than a value, it is possible to suppress the dripping of the coating liquid 30, and to form the coating layer 40 uniform in a flow direction and the width direction.

  The wet film thickness of the coating layer 40 depends on, for example, the transport speed of the base film 20 and the coating speed of the coating liquid 30 (in the embodiment, the discharge amount of the coating liquid 30 per unit time). It can be adjusted.

  The manufacturing method of the coating film 50 mentioned above may further include an arbitrary process in addition to the process mentioned above. For example, a step of drying the coating layer 40, a step of curing the coating layer 40, a step of orienting a liquid crystal compound contained in the coating layer 40, a step of surface treating the coating film 50, a coating film 50 A step of stretching, a step of laminating a protective film on the coated surface of the coated film 50 or the opposite surface (non-coated surface), a step of slitting the coated film 50, a step of continuously winding the coated film 50 Etc. may be included.

[9. Coating film]
The coating film 50 manufactured by the manufacturing method mentioned above is a film of a multilayer structure provided with the base film 20 and the coating layer 40 provided on this base film 20. As shown in FIG. When the long base film 20 is used, this coating film 50 is also obtained as a long film. In the coating film 50, the surface 21 of the base film 20 on the opposite side to the coating layer 40 has high smoothness satisfying formula (3), and thickness unevenness in the coating layer 40 is suppressed. There is.

Since the thickness unevenness is suppressed, the coated layer 40 usually has a small number density of thickness unevenness. Here, the number density of thickness unevenness means the number of thickness unevenness per unit area. The specific number density of the thickness unevenness of the coating layer 40 is preferably 20 pieces / m ² or less, more preferably 10 pieces / m ² or less, particularly preferably 5 pieces / m ² or less, and ideally It is 0 piece / m ² . Conventionally, it has been difficult to reduce the number density of thickness unevenness in a long coated film in this manner, but in the above-described manufacturing method, a coating provided with a coating layer 40 having a small number density of thickness unevenness is used. A working film 50 is obtained. Therefore, according to the manufacturing method mentioned above, it is possible to raise the yield of coating film 50.

The number density of the thickness unevenness of the coating layer 40 in the coating film 50 can be measured by the following method.
A black film is bonded to the surface 21 of the coated film 50 opposite to the coated layer 40. Thereafter, the surface of the coating film 50 on the coating layer 40 side is illuminated with a three-wavelength fluorescent tube, and the reflected light is observed. In the portion where the coating layer 40 has uneven thickness, annular unevenness that is colored due to interference of light due to uneven thickness is observed. Therefore, the number density unevenness of the coating layer 40 can be measured by counting the number of annular unevenness having a diameter of 5 mm or more by the above method, and the number density of the thickness unevenness can be obtained.

  Moreover, according to the manufacturing method mentioned above, not only the generation | occurrence | production frequency of thickness nonuniformity but the intensity | strength of thickness nonuniformity can be suppressed normally. Therefore, normally, in the coating layer 40, the difference in thickness between the thick portion and the thin portion in the thickness unevenness is small. Therefore, even when the film portion including the thickness unevenness is cut out from the coating film 50 and provided as an optical film in the image display device, the display unevenness does not easily occur in the image display device. Here, the display unevenness refers to a portion where the color or the luminance is different from the other portion of the screen, and refers to a circular shape having a diameter of 1 mm or more.

  The thickness of the coating layer 40 may be appropriately set according to the function and physical properties required of the coating layer 40, preferably 0.1 μm or more, more preferably 0.5 μm or more, particularly preferably 1.0 μm. It is the above, Preferably it is 10.0 micrometers or less, More preferably, it is 7.0 micrometers or less, Especially preferably, it is 5.0 micrometers or less.

  Usually, in the coating film 50, the coating layer 40 is a cured layer by being subjected to a drying process or a curing process. The cured coating layer 40 may contain, for example, the solid content of the coating liquid 30, or the reaction product of the components contained in the coating liquid 30.

  For example, when a hard coating solution is used as the coating solution 30, the cured coating layer 40 may be a hard coating layer made of a resin containing a polymer of a polymerizable monomer.

  Further, for example, when the composition (A) is used as the coating liquid 30, the cured coating layer 40 may be an optically anisotropic layer containing cured liquid crystal molecules. In particular, when a resin film subjected to a stretching treatment is used as the base film 20, the optically anisotropic layer can usually have a slow axis along substantially the same direction as the orientation direction by the stretching of the resin film. . Specifically, the cured liquid crystal molecules contained in the optically anisotropic layer exhibit alignment regularity by the alignment regulating force of the resin film, whereby the direction of the slow axis is controlled. The cured liquid crystal molecules may have homogeneous alignment order or hybrid alignment order.

  Here, “having hybrid orientation regularity” means that molecules are horizontally oriented with respect to the surface of the resin film as the base film 20 near the surface, and the molecules closer to the air interface further from the surface have a horizontal direction It has the orientation regularity which inclines to. In one aspect, the cured liquid crystal molecules are a cured product of a discotic liquid crystal compound, and in this aspect, the liquid crystal molecules may be hybrid-aligned.

  An example of hybrid orientation is described with reference to FIGS. 4 and 5. 4 and 5 are a perspective view and a top view schematically showing the state of the hybrid alignment of the discotic liquid crystal compound. FIGS. 4 and 5 show a state in which the discotic liquid crystal compound 411 is aligned on the surface of the resin film placed in the horizontal direction (the direction orthogonal to the arrow 422). The orientation direction of the resin film by stretching is indicated by an arrow 421. In the discotic liquid crystal compound 411, the molecules on the lower side, ie, near the surface of the resin film, are horizontally aligned, while the molecules on the upper side are inclined in the direction of the arrow 415. The hybrid alignment of such a discotic liquid crystal compound is as follows: from the polar angle 0 direction (direction of arrow 422) and the polar angle 0 direction to the arrows 431 to 434, the refractive index anisotropy of the optically anisotropic layer It can be confirmed by measuring from various directions at different azimuth and polar angles as shown. The layer of the discotic liquid crystal compound thus hybrid-oriented usually has a slow axis in the direction in which the arrow 415 tilts, and thus has a slow axis in the direction of the normal arrow 421.

  On the other hand, “having homogeneous orientation regularity” means that the average direction of the line obtained by projecting the long axis direction of the mesogen of the cured liquid crystal molecules onto the surface of the resin film as the base film 20 is horizontal to the surface (Eg, the direction of the surface director of the resin film). Furthermore, homogeneous alignment regularity “along” a predetermined direction means that the alignment direction is substantially the same as the predetermined direction. The predetermined direction may be an orientation direction by stretching of a resin film. Whether or not the cured liquid crystal molecules have homogeneous alignment regularity, and the alignment direction thereof, the measurement of the slow axis direction using a retardation meter as represented by AxoScan (manufactured by Axometrics), and the slow phase This can be confirmed by measurement of the retardation distribution for each incident angle in the axial direction and in the direction orthogonal to the slow axis.

  Here, when the cured liquid crystal molecules are obtained by polymerizing a polymerizable liquid crystal compound having a rod-like molecular structure, usually, the long axis direction of the mesogen of the polymerizable liquid crystal compound is the mesogen of the cured liquid crystal molecules. The long axis direction of In addition, as in the case where a reverse wavelength dispersion polymerizable liquid crystal compound is used as the polymerizable liquid crystal compound, in the case where plural kinds of mesogens having different alignment directions are present in the optically anisotropic layer, the longest kind among them is selected. The direction in which the long axis directions of the mesogens of the are aligned is the alignment direction.

  In the present application, the angle between the orientation direction by stretching the resin film and the slow axis along the “substantially” same direction is within 5 ° between the orientation direction by the stretching of the resin film and the slow axis. Say The angle is preferably within 3 °, more preferably within 1 °.

  By using the predetermined one described above as the resin film and further selecting the material of the optically anisotropic layer appropriately, the optically anisotropic layer is oriented along substantially the same direction as the orientation direction by the stretching of the resin film Regularity can be imparted, and as a result, an optically anisotropic layer having orientation regularity can be obtained.

  The optically anisotropic layer preferably has reverse wavelength dispersion. That is, the optically anisotropic layer preferably has wavelength dispersion exhibiting high in-plane retardation for transmitted light having a wavelength longer than that of the short wavelength. The optically anisotropic layer preferably has such reverse wavelength dispersion in at least part of, and preferably all of the visible light band. When the optically anisotropic layer has reverse wavelength dispersion, it can exhibit functions uniformly in a wide band in optical applications such as λ / 4 wavelength plate or λ / 2 wavelength plate.

In a preferred embodiment, the optically anisotropic layer has optical properties that can be used as a λ / 4 wavelength plate or a λ / 2 wavelength plate. Specifically, when the in-plane retardation Re measured at a measurement wavelength of 550 nm is in the range of 108 nm to 168 nm, it can be used as a λ / 4 wavelength plate. When the in-plane retardation Re measured at a measurement wavelength of 550 nm is in the range of 245 nm to 305 nm, it can be used as a λ / 2 wavelength plate. More specifically, in the case of a λ / 4 wavelength plate, the in-plane retardation Re measured at a measurement wavelength of 550 nm is preferably in the range of 128 nm to 148 nm, more preferably 133 nm to 143 nm. In the case of a λ / 2 wavelength plate, the in-plane retardation Re measured at a measurement wavelength of 550 nm is preferably in the range of 265 nm to 285 nm, and more preferably 270 nm to 280 nm. Here, the in-plane retardation Re is calculated according to the following equation.
Re = (nx−ny) × d (wherein, nx is the refractive index in the direction of the slow axis in the plane of the optically anisotropic layer (maximum refractive index in the plane), and ny is the optical anisotropy The refractive index in the direction perpendicular to the in-plane slow axis of the layer, and d is the thickness (nm) of the optically anisotropic layer.
When the optically anisotropic layer has optical properties that can be used as such a λ / 4 wavelength plate or λ / 2 wavelength plate, a circle having the λ / 4 wavelength plate or λ / 2 wavelength plate is utilized by using it. An optical element such as a polarizing plate can be easily manufactured.

  The angle between the slow axis of the optically anisotropic layer and the width direction of the optically anisotropic layer is the same as the angle between the orientation direction of the resin film as the base film 20 and the width direction of the resin film. sell. Specifically, the angle between the slow axis of the optically anisotropic layer and the width direction of the optically anisotropic layer may be 0 ° to 90 °. Further, in an aspect, it is particularly preferable that an angle formed by the slow axis of the optically anisotropic layer and the width direction of the optically anisotropic layer is 40 ° to 50 °. More specifically, the angle between the slow axis of the optically anisotropic layer and the width direction of the optically anisotropic layer is preferably 15 ° ± 5 °, 22.5 ± 5 °, 45 ° ± 5. °, 75 ° ± 5 °, more preferably 15 ° ± 4 °, 22.5 ± 4 °, 45 ° ± 4 °, 75 ° ± 4 °, even more preferably 15 ° ± 3 °, 22.5 ± It may be a specific range such as 3 °, 45 ° ± 3 °, 75 ° ± 3 °. By having such an angular relationship, the coating film 50 can be made into the material which enables efficient manufacture of a specific circularly-polarizing plate.

The coating film 50 preferably has high transparency in order to be used as an optical film.
The specific total light transmittance of the coating film 50 is preferably 85% or more, more preferably 86% or more, and particularly preferably 88% or more. The total light transmittance of the coating film 50 can be measured in the wavelength range of 380 nm to 780 nm using an ultraviolet and visible spectrometer.
The specific haze of the coating film 50 is preferably 5% or less, more preferably 3% or less, and particularly preferably 1% or less. The haze of the coated film 50 can be measured using a haze meter ("Haze Guard II" manufactured by Toyo Seiki Co., Ltd.) in accordance with JIS K7136.

[10. Image display device]
The coating film 50 manufactured by the manufacturing method mentioned above can be used for a wide range of applications, and it is preferable to use for optical applications especially. When used for optical applications, an optical film may be cut out from the coated film 50 with an appropriate shape and size, and the optical film may be used. For example, the optical film can be used by being provided in an image display device such as a liquid crystal display device and an organic electroluminescence display device.

EXAMPLES Hereinafter, the present invention will be specifically described by way of examples. However, the present invention is not limited to the examples described below, and is within the scope of the claims of the present invention and the equivalent scope thereof. You may implement it by changing it arbitrarily.
In the following description, "%" and "parts" representing quantities are by weight unless otherwise specified. Moreover, unless otherwise indicated, the operation described below was performed under conditions of normal temperature and normal pressure.

[Description of evaluation method]
[Method of measuring viscosity of coating liquid]
The viscosity of the coating liquid was measured at a liquid temperature of 23 ° C. using a tuning fork type vibration viscometer (“SV-A series” manufactured by A & D Co., Ltd.).

[Method of measuring surface roughness of substrate film]
The base film was cut out into 200 mm (width direction) x 300 mm (conveying direction) to obtain a sample film.
On the surface of the backup roll side of this sample film, five measurement positions were set. Arithmetic mean roughness Ra (F) and mean length RSm (F) of roughness curvilinear elements at this measurement position are measured using a CNC surface roughness measuring machine (Mitsutoyo "Surf Test Extreme V-3000 CNC") The width direction was measured as the scanning direction. At this time, the measurement conditions were a scanning distance of 50 mm, a scanning speed of 0.3 mm / s, and a cutoff value of 0.3 mm.
From the measured values obtained, the average value M (Ra (F)) of the arithmetic average roughness Ra (F), and the average value M (RSm (F)) of the average length RSm (F) of the roughness curve element Was calculated.

[Method of measuring surface roughness of backup roll]
Five measurement positions were set on the outer peripheral surface of the backup roll. Arithmetic mean roughness Ra (R) and mean length RSm (R) of roughness curvilinear elements at this measurement position are measured using a surface roughness / contour shape measuring machine ("Surfcom 130A" manufactured by Tokyo Seimitsu Co., Ltd.). The direction was measured as the scan direction. At this time, the measurement conditions were a scanning distance of 50 mm and a scanning speed of 0.3 mm / s.
From the measured values obtained, the average value M (Ra (R)) of the arithmetic average roughness Ra (R), the average value M (RSm (R)) of the average length RSm (R) of the roughness curve element, and The standard deviation σ (RSm (R)) of the mean length RSm (R) of the roughness curve elements was calculated.

[Method of measuring the number of uneven thickness of coated layer]
On the surface of the coated film on the opposite side to the coated layer, a black polyethylene terephthalate film ("Kokikiri Miere" manufactured by Yodogawa Paper Mill Co., Ltd.) was bonded. Thereafter, the surface on the coated layer side of the coated film was illuminated with a three-wavelength fluorescent tube, and the reflected light was observed. And in the range of length 1m x coating width of a coating film, the number of the interference nonuniformity of circular 5 mm diameter or more which arises by interference of light was counted as the number of thickness nonuniformity of a coating layer.

[Method 1 for evaluating display unevenness on liquid crystal display device]
A polarizer produced by doping a polyvinyl alcohol film with iodine and stretching in one direction was prepared. The coated film or hard coating solution (2) prepared in Examples 1 to 8 and 12 and Comparative Examples 1 and 2 and Reference Example 1 using the hard coating solution (1) on one side of this polarizer The surface on the substrate film side of the coated film produced in Example 9 was bonded with an ultraviolet curable acrylic adhesive. Under the present circumstances, the slow axis of the coating film was made to make an angle of 45 degrees with respect to the transmission axis of a polarizer, seeing from the thickness direction.
Further, on the other surface of the polarizer, as a polarizing plate protective film, a cycloolefin film subjected to transverse uniaxial stretching was bonded with an ultraviolet curable acrylic adhesive. At this time, the slow axis of the cycloolefin film was parallel to the transmission axis of the polarizer when viewed from the thickness direction.
Thereafter, the polarizing plate is provided with a polarizing plate protective film, a layer of an adhesive, a polarizer, a layer of an adhesive, a base film, and a coating layer in this order in the thickness direction by irradiating ultraviolet rays to cure the adhesive. Obtained.
The polarizing plate mounted on a liquid crystal panel provided with a known in-cell type touch sensor was peeled off, and the polarizing plate manufactured above was mounted instead to manufacture a liquid crystal display device for evaluation. Under the present circumstances, the direction of the polarizing plate was set so that the surface of a coating layer might turn to the visual recognition side.
After that, the liquid crystal display was turned to black display, and the screen was observed in a state where the reflected light was strong under a bright environment where the external light is bright. Then, the presence or absence of display unevenness different from the other portions in color or luminance observed on the screen was evaluated. Display unevenness tends to be displayed strongly when the difference in thickness between the thick part and the thin part is large in the thickness unevenness of the coated layer. Therefore, the strength of the thickness unevenness (difference in thickness between the thick portion and the thin portion) can be evaluated by the display unevenness.
The case where no display unevenness of 1 mm or more in diameter was not observed in the liquid crystal display device having an in-cell touch panel was regarded as "none", and the case where one or more were observed was regarded as "present".

[Method 2 for evaluating display unevenness in liquid crystal display device]
A liquid crystal display device was prepared comprising a twisted nematic liquid crystal cell (product of the difference between the refractive index of the extraordinary light and the ordinary light of the liquid crystal and the gap size of the liquid crystal cell of 450 nm, twist angle 90 °). The two polarizing plates mounted in the liquid crystal cell were peeled off from the liquid crystal cell, and an optical film obtained by cutting out from the coated film produced in Example 11 was mounted on the peeled polarizing plate. At this time, the optical film was mounted such that the surface on the side of the base film faced the polarizing plate. Thereafter, these polarizing plates were mounted on the liquid crystal cell in the following order from the viewer side: polarizing plate / optical film / liquid crystal cell / optical film / polarizing plate. Thereafter, the liquid crystal display was displayed in black and the screen was observed. Then, the presence or absence of display unevenness different from the other portions in color or luminance observed on the screen was evaluated. Display unevenness tends to be displayed strongly with phase difference unevenness when the thickness difference between the thick portion and the thin portion is large in the thickness unevenness of the coating layer. Therefore, it is possible to evaluate the strength of the thickness unevenness and the strength of the phase difference unevenness (difference in thickness between the thick portion and the thin portion) by the display unevenness.
The case where no display unevenness of 1 mm or more in diameter was not observed in the twisted nematic type liquid crystal display device was regarded as "none", and the case where one or more were observed was regarded as "present".

[Method for evaluating display unevenness on organic electroluminescent display device]
A polarizing film ("HLC2-5618S" manufactured by Sanritz, thickness 180 μm, film having an absorption axis in the direction of 90 ° with respect to the width direction) was prepared. The optical film obtained by cutting out from the coated film manufactured in Example 10 was bonded to one surface of this polarizing film. Under the present circumstances, the optical film was bonded in the direction to which the surface at the side of a base film faces a polarizing film. In addition, bonding was performed via a layer of a pressure-sensitive adhesive (“CS9621T” manufactured by Nitto Denko Corporation). Thereby, the polarizing plate which has a layer structure of the layer of a polarizing film / layer of an adhesive / optical film was obtained.

The touch panel was removed from a commercially available RGB-colored organic electroluminescent display device (manufactured by SAMSUNG). The polarizing plate produced above was disposed on the light emitting panel. Thereafter, the organic electroluminescent display was displayed in black, and the screen was observed under bright field. Then, the presence or absence of display unevenness different from the other portions in color or luminance observed on the screen was evaluated. By the display unevenness, it is possible to evaluate the strength of the phase difference unevenness (difference in thickness between the thick portion and the thin portion) due to the thickness unevenness.
The case where no display unevenness of 1 mm or more in diameter was not observed in the organic EL display device was regarded as "none", and the case where one or more were observed was regarded as "presence".

[Method for evaluating grip of base film on outer peripheral surface of backup roll]
The base film in a state of being supported by the outer peripheral surface of the backup roll was visually observed.
If the base film does not slide on the outer peripheral surface of the backup roll and the end position of the base film in the film width direction is substantially constant in the flow direction, it is judged as "good" and the base film slips on the backup roll When the end position of the base film deviates in the flow direction, it was determined as "defective".

Production Example 1 Production of Hard Coat Liquid (1)]
A mixed solution was prepared by dissolving 130 g of potassium stannate and 30 g of potassium antimonyl tartrate in 400 g of pure water.
An aqueous solution in which 1.0 g of ammonium nitrate and 12 g of 15% ammonia water were dissolved in 1000 g of pure water was prepared. While stirring this aqueous solution at 60 ° C., the above mixed solution was added to this aqueous solution over 12 hours to carry out hydrolysis. At this time, a 10% nitric acid solution was simultaneously added to the aqueous solution so as to keep the aqueous solution at pH 9.0. The hydrolysis formed a precipitate in the aqueous solution.

  The formed precipitate was separated by filtration and washed, and then dispersed again in water to prepare a dispersion of a hydroxide of Sb-doped tin oxide precursor having a solid concentration of 20% by weight. The dispersion was spray dried at a temperature of 100 ° C. to obtain a powder. The obtained powder was heat-treated at 550 ° C. for 2 hours in an air atmosphere to obtain a powder of antimony-doped tin oxide.

  60 parts of this powder was dispersed in 140 parts of potassium hydroxide aqueous solution having a concentration of 4.3% by weight to obtain an aqueous dispersion. The aqueous dispersion was milled with a sand mill for 3 hours while maintaining at 30 ° C. to prepare a sol. Next, this sol was subjected to a de-alkali ion treatment with an ion exchange resin until the pH reached 3.0. Then, pure water was added to the sol to prepare a particle dispersion containing particles of antimony-doped tin oxide at a solid content concentration of 20% by weight. The pH of this particle dispersion was 3.3. In addition, the average particle size of the particles was 9 nm.

Then, 100 g of the above-mentioned particle dispersion is adjusted to 25 ° C., and 4.0 g of tetraethoxysilane (manufactured by Tama Chemical Co., Ltd .: positive ethyl silicate, SiO ₂ concentration 28.8%) is added over 3 minutes, and then 30 minutes Stirring was performed. Thereafter, 100 parts of ethanol was added thereto over 1 minute, and the temperature was raised to 50 ° C. over 30 minutes, and heat treatment was performed for 15 hours. The solid concentration of the dispersion after heat treatment was 10%.

  Subsequently, water, which is a dispersion medium of the dispersion, was replaced with ethanol by an ultrafiltration membrane. As a result, a metal oxide particle dispersion liquid containing, as metal oxide particles, particles of antimony-doped tin oxide coated with silica at a solid content concentration of 20% was obtained. The metal oxide particles in the dispersion liquid are linked in a chain by a plurality of aggregations of the metal oxide particles to form a chain linkage. At this time, the average number of connection of the metal oxide particles in the aforementioned connected body was five. In addition, the average connection number is obtained by photographing a photograph of a connected body of metal oxide particles using a transmission electron microscope, determining the connected number for each of 100 connected bodies, and calculating this average value, 1 decimal place It calculated by rounding off the digit.

  Polymerizable monomer composition comprising dipentaerythritol hexaacrylate (6A), dipentaerythritol pentaacrylate (5A) and dipentaerythritol tetraacrylate (4A) (weight ratio (6A) / (5A) / (4A) =) 45.9 parts of 64/17/19, solid content concentration 100%, 42.7 parts of methyl ethyl ketone, and 2.3 parts of a photopolymerization initiator ("IRGACURE 184" manufactured by Ciba Specialty Co., Ltd. 100% solid content) Mix thoroughly to obtain a mixture. This mixture was mixed with 9.17 parts of the metal oxide particle dispersion liquid containing the above chain-like linked metal oxide particle to obtain a hard coat solution (1).

[Production example 2: Production of hard coating solution (2)]
A mixture was obtained by mixing 187.2 g of isoboronyl methacrylate, 2.8 g of methyl methacrylate and 10.0 g of methacrylic acid.
In a 1000 ml reaction vessel equipped with a stirring blade, a nitrogen introducing pipe, a cooling pipe and a dropping funnel, 360 g of propylene glycol monomethyl ether was placed and heated to 110 ° C. under a nitrogen atmosphere. Into the reaction vessel, the above mixture was dropped at a constant speed over 3 hours. Further, simultaneously with the dropping of the above mixture, a solution containing 2.0 g of tertiary butylperoxy-2-ethylhexaate and 80.0 g of propylene glycol monomethyl ether was dropped at a constant speed into a reaction vessel. Thus, a reaction solution was obtained in the reaction vessel. Thereafter, the reaction solution was allowed to react at 110 ° C. for 1 hour.

  Thereafter, a solution containing 0.2 g of tert-butylperoxy-2-ethylhexaate and 17 g of propylene glycol monomethyl ether was added dropwise to the reaction solution and reacted at 110 ° C. for 30 minutes.

  Thereafter, a solution containing 1.5 g of tetrabutylammonium bromide, 0.1 g of hydroquinone and 6 g of propylene glycol monomethyl ether was added to the reaction solution. Furthermore, while performing air bubbling, a solution containing 24.4 g of 4-hydroxybutyl acrylate glycidyl ether and 5.0 g of propylene glycol monomethyl ether is added dropwise to the reaction solution over 1 hour, and then further reacted over 5 hours. The Thus, an acrylic copolymer containing unsaturated double bonds was obtained. The acrylic copolymer had a number average molecular weight of 5,500, a weight average molecular weight (Mw) of 18,000, an SP value of 9.7, and a glass transition temperature of 92 ° C.

  1.5 parts of this acrylic copolymer, 20 parts of triethylene glycol-trimethylolpropane triacrylate (SP value: 11.6), 39.25 parts of dipentaerythritol hexaacrylate (SP value 12.1), pentaerythritol triol A hard coat solution (2) was obtained by mixing 39.25 parts of acrylate (SP value 12.7), 5 parts of 1-hydroxy-cyclohexyl-phenyl-ketone as a photopolymerization initiator, and methyl isobutyl ketone. The amount of methyl isobutyl ketone was set such that the nonvolatile component ratio of the hard coat solution (2) was 50% by weight.

Production Example 3: Production of Liquid Crystal Composition (1)
21.25 parts of a reverse wavelength dispersion polymerizable liquid crystal compound represented by the formula (B1), 0.11 parts of a surfactant ("Surflon S420" manufactured by AGC Seimi Chemical Co., Ltd.), a polymerization initiator ("IRGACURE 379" manufactured by BASF Corp.) 0.64 part and a solvent (Cyclopentanone, manufactured by Nippon Zeon Co., Ltd.) 78.00 parts were mixed to prepare a liquid crystal composition (1). The surface tension of the obtained liquid crystal composition (1) was 33.4 mN / m.

Production Example 4 Production of Liquid Crystal Composition (2)
6 parts of cellulose acetate butyrate (“CAB-531-1” manufactured by Kodak Chemical Co., Ltd.) and the following discotic compounds D1 {R synthesized with reference to JP-A-9-95467 are all —O—C ( = _O) represents the _{-Ph-O-C 4 H 8} -O-C (= O) -CH = CH 2. A liquid crystal composition (2) was prepared by mixing 100 parts, 10 parts of tripropylene glycol diacrylate (manufactured by Tokyo Chemical Industry Co., Ltd.), 2 parts of a photopolymerization initiator (“IRGACURE 907” manufactured by BASF), and 400 parts of methyl ethyl ketone . The surface tension of the obtained liquid crystal composition (2) was measured to be 28.3 mN / m.

Example 1
A material roll having a smooth outer peripheral surface formed of SUS304 was prepared. After sandblasting the outer peripheral surface of the material roll, the outer peripheral surface is ground and hard chromium plating is further performed to obtain a backup roll having a diameter of 200 mm. The surface roughness of this backup roll was measured by the method described above.

  Using the backup roll described above, as shown in FIG. 1, a coating apparatus 10 having the structure described in the above embodiment was assembled. The coating apparatus 10 includes a backup roll 100, a coater 200 including a die 210, and a supply roll 300. In the coating apparatus 10, the winding angle θ of the base film 20 transported by the backup roll 100 was set to 178 °. Further, the position of the die 210 was adjusted so that the size of the gap C which is open between the downstream lip 242 of the die 210 and the base film 20 was 80 μm.

  A long unstretched film made of a resin ("Zeonor 1420R" manufactured by Nippon Zeon Co., Ltd .; glass transition temperature: 138 ° C) containing an alicyclic structure-containing polymer was prepared. This film before stretching is stretched in an oblique direction which is neither parallel nor perpendicular to the longitudinal direction of the film before stretching under the conditions of a stretching temperature of 140 ° C. and a stretching speed of 20 m / min, and a diagonally stretched film (thickness 47 μm) The base film 20 was prepared. The surface roughness of the surface 21 on the backup roll side of the base film 20 was measured. The base film 20 was supplied to the coating device 10 assembled as described above, and was supported by the outer peripheral surface 110 of the backup roll 100. During the period supported by the outer peripheral surface 110 of the backup roll 100, the base film 20 did not slip on the outer peripheral surface 110 of the backup roll 100, and no deformed portion was generated in the base film 20. Then, in a state where the base film 20 is supported by the outer peripheral surface 110 of the backup roll 100 as described above, the hard coat liquid (1) is applied as the coating liquid 30 on the base film 20. Under the present circumstances, the conveyance speed of the base film 20 set 20 m / min, and the tension | tensile_strength of the base film 20 in the supply roll 300 was set to 130 N / m. Further, the discharge amount of the coating liquid 30 from the die 210 was adjusted so that the coating layer 40 having a wet film thickness of 10 μm could be formed.

The coating layer 40 was formed on the base film 20 by coating the coating liquid 30, and the coating film 50 was obtained. The coated layer 40 of the coated film 50 is dried by heating at 80 ° C. for 60 seconds, and then irradiated with ultraviolet light from a high pressure mercury lamp with an illuminance of 200 mW / cm ² at a wavelength of 365 nm and an integrated light quantity of 300 mJ / cm ^2. It was allowed to cure. About the coating film 50 obtained in this way, measurement of the number of objects of the thickness nonuniformity of a coating layer and the evaluation using a liquid crystal display device were performed by the method mentioned above.

Example 2
In place of the base film used in Example 1, a base film with a thickness of 22 μm which was similarly subjected to oblique stretching was prepared. The stretching treatment was performed under the same conditions as in Example 1. The surface roughness of the surface on the backup roll side of this stretched film was measured.
A coated film was produced and evaluated in the same manner as in Example 1 except that the stretched film thus obtained was used as a base film.

[Example 3]
Manufacture and evaluation of a coated film were carried out in the same manner as in Example 1 except that the surface roughness of the outer peripheral surface of the backup roll was made larger than in Example 1 by changing the conditions of grinding treatment of the material roll. The

Example 4
Production and evaluation of a coated film were carried out in the same manner as in Example 1 except that the surface roughness of the outer peripheral surface of the backup roll was made smaller than in Example 1 by changing the conditions of grinding treatment of the material roll. The

[Example 5]
A coated film in the same manner as in Example 1 except that the position of the die included in the coater was adjusted so that the size of the gap C between the downstream lip of the die and the base film would be 20 μm. Production and evaluation.

[Example 6]
A coated film in the same manner as in Example 1 except that the position of the die included in the coater was adjusted so that the size of the gap C between the downstream lip of the die and the base film would be 160 μm. Production and evaluation.

[Example 7]
A coated film was produced and evaluated in the same manner as in Example 1 except that the tension of the substrate film at the supply roll was changed to 40 N / m.
In this Example 7, streaks were formed on the coating layer, but the streaks were shallow and had no problem in practical use.

[Example 8]
A coated film was produced and evaluated in the same manner as in Example 1 except that the tension of the substrate film at the feed roll was changed to 520 N / m.

[Example 9]
The type of the coating liquid was changed to the hard coat liquid (2) manufactured in Production Example 2, and the discharge amount of the coating liquid was adjusted to obtain a coating layer having a wet film thickness of 52.0 μm. Production and evaluation of a coated film were performed in the same manner as Example 1 except for the above.
In this example 9, streaks were formed on the coating layer, but the streaks were shallow and were practically acceptable.

[Example 10]
A coated film was produced in the same manner as in Example 1 except that the type of the coating liquid was changed to the liquid crystal composition (1) produced in Production Example 3. About the obtained coated film, measurement of the number of objects of the thickness nonuniformity of a coating layer and evaluation using an organic electroluminescent display apparatus were performed by the method mentioned above.

[Example 11]
The type of the coating liquid was changed to the liquid crystal composition (2) manufactured in Production Example 4, and the evaluation of the coated film was carried out by the method described in [Evaluation method 2 of display unevenness in liquid crystal display device] Manufacture and evaluation of a coated film were performed like Example 1 except having carried out.

[Example 12]
A resin film of 80 μm in thickness made of a resin containing triacetyl cellulose was prepared, and the surface roughness of the surface on the backup roll side of this resin film was measured. A coated film was produced and evaluated in the same manner as in Example 1 except that this resin film was used as a base film.

Comparative Example 1
Coating was performed in the same manner as in Example 1, except that the surface roughness of the outer peripheral surface of the backup roll was made smaller than that of Example 1 by performing electrolytic polishing on the outer peripheral surface of the material roll instead of polishing. The film was manufactured and evaluated.

Comparative Example 2
Manufacture and evaluation of a coated film were carried out in the same manner as in Example 1 except that the surface roughness of the outer peripheral surface of the backup roll was made larger than in Example 1 by changing the conditions of grinding treatment of the material roll. The

[Reference Example 1]
A 100 μm thick film (“Cosmo Shine A4100” manufactured by Toyobo Co., Ltd.) made of a resin containing polyethylene terephthalate was prepared, and the surface roughness of the surface on the side opposite to the adhesive side (backup roll side) of this resin film was measured. A coated film was produced and evaluated in the same manner as in Example 1 except that this resin film was used as a base film.

[result]
The results of the examples, comparative examples, and reference examples described above are shown in the following table. In the following table, the meanings of the abbreviations are as follows.
COP: A resin film made of a resin containing an alicyclic structure-containing polymer.
TAC: A resin film made of a resin containing triacetyl cellulose.
PET: A resin film made of a resin containing polyethylene terephthalate.
C: A gap between the downstream lip of the die and the substrate film.
Tension: Tension of the substrate film measured at the feed roll.
HC (1): hard coating solution (1).
HC (2): hard coating solution (2).
LC (1): liquid crystal composition (1).
LC (2): liquid crystal composition (2).

[Consideration]
As can be seen from the above-mentioned table, in the example, since the number density of the thickness unevenness can be made smaller than that of Comparative Example 1, it can be seen that the coating liquid can be applied while suppressing the thickness unevenness. Moreover, in any Example, since favorable evaluation is obtained in grip property, it turns out that the slip of the base film on the outer peripheral surface of a backup roll can be suppressed. Therefore, according to the present invention, the coating film is coated by applying the coating liquid while suppressing the slip of the base film on the outer peripheral surface of the backup roll and suppressing the thickness unevenness on the base film. It was confirmed that the method for producing a coated film that can be produced can be realized.

  Further, in general, the coating layer obtained by using the liquid crystal composition in the coating liquid has retardation, so that the influence of thickness unevenness is easily detected, and display unevenness occurs when provided in the image display device. Cheap. However, in Examples 10 and 11, while using the liquid crystal composition as the coating liquid, there is no display unevenness in the image display device. Therefore, it was confirmed from the results of Examples 10 and 11 that according to the present invention, not only the number of uneven thickness but also the strength of the uneven thickness (difference in thickness between thick and thin portions) can be suppressed.

  In addition, the reference example 1 has shown as a reference the experimental example at the time of using the base film with low surface smoothness. In the reference example 1, the slip of the base film on the outer peripheral surface of the backup roll can not be suppressed. When this result is compared with the result of the example, it can be understood that the coating device according to the present invention can exhibit particularly excellent effects by applying to a base film having high surface smoothness.

DESCRIPTION OF REFERENCE NUMERALS 10 coating apparatus 20 base film 21 surface of base film on backup roll side 22 surface of base film opposite to backup roll 30 coating liquid 31 liquid pool 40 coating layer 50 coating film 100 backup roll 110 Outer peripheral surface of backup roll 200 coater 210 die 220 flow path 221 pocket 222 slot 230 discharge port 240 lip portion 241 upstream lip portion downstream lip portion 250 upstream block 260 downstream block 300 supply roll

Claims (8)

It is a coating apparatus for coating a coating liquid on a base film,
A backup roll having an outer peripheral surface and rotatable while supporting the base film on the outer peripheral surface;
A coater which is provided to face the outer peripheral surface of the backup roll and can coat the coating solution on the base film supported by the outer peripheral surface of the backup roll;
The average value M (Ra (R)) of the arithmetic average roughness Ra (R) measured at five measurement positions on the outer peripheral surface of the backup roll is expressed by the following equation (1)
0.020 μm ≦ M (Ra (R)) <0.350 μm (1)
Meet the,
Average value M (RSm (R)) of average length RSm (R) of roughness curvilinear elements measured at five measurement positions of the outer peripheral surface of the backup roll, and the outer peripheral surface of the backup roll The standard deviation σ (RSm (R)) of the average length RSm (R) of the roughness curve element measured at five measurement positions of the following formula (2)
10% <σ (RSm (R)) / M (RSm (R)) <50% (2)
The less than you, the coating apparatus. The coater comprises a die that can discharge the coating liquid, the coating apparatus according to claim 1. It is a manufacturing method which manufactures a coating film using the coating device according to claim 1 or 2 ;
Conveying the base film while supporting the base film on the outer peripheral surface of the backup roll;
Applying a coating solution by the coater on the base film supported on the outer peripheral surface of the backup roll;
Average value M (Ra (F)) of arithmetic mean roughness Ra (F) measured at five measurement positions on the surface on the backup roll side of the substrate film, and the backup of the substrate film The mean value M (RSm (F)) of the average length RSm (F) of the roughness curvilinear element measured at five measurement positions on the surface on the roll side is expressed by the following equation (3)
M (Ra (F)) / M (RSm (F)) <1.5 × 10 ⁻⁵ (3)
A method for producing a coated film that satisfies The viscosity of the coating liquid is a 0.5mPa · s~30mPa · s, a manufacturing method of a coating film according to claim 3, wherein. The coating apparatus includes a supply roll which is provided immediately before the backup roll and can supply the base film to the backup roll.
The manufacturing method of the coated film of Claim 3 or 4 whose tension | tensile_strength of the said base film measured by the said supply roll is 50 N / m or more and less than 500 N / m. The coating according to any one of claims 3 to 5 , wherein the coating solution is applied to the base film so as to form a coating layer having a wet film thickness of 0.5 μm to 50 μm. How to make a film. The manufacturing of the coated film as described in any one of Claims 3-6 with a 30 micrometers-150 micrometers space | interval between the said coater and the said base film supported by the said outer peripheral surface of the said backup roll. Method. Long base film,
And a coated layer provided on the substrate film,
Average value M (Ra (F)) of arithmetic mean roughness Ra (F) measured at five measurement positions on the surface of the base film opposite to the coating layer, and the coating The average value M (RSm (F)) of the average spacing RSm (F) of the unevenness measured at five measurement positions on the surface of the base film opposite to the layer is represented by the following formula (3)
M (Ra (F)) / M (RSm (F)) <1.5 × 10 ⁻⁵ (3)
Meet the
The coated film whose number of the thickness nonuniformity per unit area of the said coating layer is 20 pieces / m < ² > or less.

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