JP6488693B2 - Manufacturing method of observation container and polishing method of transparent substrate - Google Patents

Description

  The present invention relates to an observation transparent substrate used for observing an observation object, an observation container and a method for producing the same, a method for polishing a transparent substrate, and a method for observing the observation object.

  In recent years, in biotechnology-related fields such as drug discovery development and regenerative medicine, cells isolated from living tissues, cell components (eg, membrane vesicles (exosomes) secreted from cultured cells, cell small cells) Organ (organelle), vesicle (lysosome, endosome, phagosome, vacuole, etc.), granule (melanosome, microbody, glyoxysome, bibel-parade body, etc.), cytoskeleton, centriole, flagella, cilia, ribosome Etc.) has been actively conducted. In general, a test / research using cultured cells is advantageous in that it is less expensive than a test / research using animals, requires only a small amount of reagent to be evaluated, and easily obtains homogeneous experimental data. In such tests and researches, it is important to suppress cell death of cells isolated from living tissue, and to stably culture and proliferate the cells.

  In order to stably cultivate and proliferate cells, development of cell culture containers for culturing cells has been advanced. Conventionally, as a cell culture container capable of increasing the survival rate of cells to be cultured and capable of stable culture, a cell culture container in which a plurality of fine protrusions are provided on a surface on which cells are cultured has been proposed (Patent Literature). 1).

International Publication No. 2007/105418

  In the cell culture container described in Patent Document 1, a plurality of fine protrusions are formed on the cell culture surface, the width or diameter of the protrusions is 20 nm to 3 μm, and the aspect ratio is 0.2 to 3. By being 0.0, cells can form adhesion spots that become pseudo-scaffolds and adhere on the protrusions, so that the survival rate of the cells to be cultured can be increased and stable culture becomes possible.

  Incidentally, in the process of culturing cells using the cell culture container described in Patent Document 1, it is important to regularly observe whether or not the cells are stably cultured. As such a cell observation technique, a general method is to use an inverted microscope and observe from the bottom side of a container containing cells. This is because, when an observation is made using an upright microscope, the objective lens comes into contact with the culture solution in the container.

  In such cell observation, in order to observe cells at a higher magnification using an inverted microscope, it is necessary to shorten the distance between the objective lens located on the bottom side of the container and the cells that are observation objects. . In this regard, in the cell culture container described in Patent Document 1, it is difficult to observe cells at a high magnification using an inverted microscope because the bottom surface of the container is too thick. Therefore, the cell culture container has a problem that it is not suitable for observing cultured cells, particularly at high magnification.

  In view of such problems, the present invention provides a transparent substrate for observation, an observation container and a method for manufacturing the same, a polishing method for a transparent substrate, which can observe an observation object at a high magnification using an inverted microscope, An object is to provide an observation method.

Furthermore, the present invention provides a step of preparing a transparent substrate having a first surface and a second surface opposite to the first surface, wherein a nano uneven pattern is formed on the first surface side, and the first A step of forming a metal-containing film covering the nano-concave pattern on the surface side, a step of forming an organic film on the metal-containing film, and the transparent substrate on which the organic film is formed on the second surface side A polishing method characterized in that the thickness of the transparent substrate after polishing from the second surface side is 0.5 mm or less (Invention 1 ).

In the said invention (invention 1 ), it is preferable that the dimension of the said nano uneven | corrugated pattern is 100-500 nm (invention 2 ), it is preferable that the thickness of the said metal containing film | membrane is 50 nm or more (invention 3 ), the said transparent The substrate preferably has a plurality of regions where the nano uneven pattern is formed (invention 4 ).

Furthermore, the present invention has a container body having a bottom part formed with a through-hole and a peripheral wall part continuous with an outer peripheral edge of the bottom part, a first surface and a second surface facing the first surface, A transparent substrate for observation used for observing an observation object on the first surface from the second surface side, and a method for producing an observation container in which the transparent substrate for observation is attached to the bottom. By polishing a transparent substrate having a first surface and a second surface opposite to the first surface and having a nano uneven pattern formed on the first surface side, from the second surface side. The prepared transparent substrate for observation is positioned in the container main body so that the nano uneven pattern of the transparent substrate for observation overlaps the through hole in a plan view of the container main body, and closes the through hole. Attaching to the bottom surface of the container body The observation transparent substrate provides a manufacturing method of the observation container, characterized in that in which the invention has been produced by polishing the transparent substrate by the polishing method according to (invention 1 to 4) ( Invention 5 ).

In the said invention (invention 5 ), the said transparent substrate for observation is attached to the said bottom part of the said container main body so that the said nano uneven | corrugated pattern may be physically included in the said through-hole in planar view of the said container main body. Preferably (Invention 6 ), the observation transparent substrate is preferably attached to the outer surface of the bottom of the container body so that the nano uneven pattern is exposed from the through-hole (Invention 7 ). Is preferably attached to the bottom portion via an adhesive (Invention 8 ), and the observation object is preferably a cell or a cell component constituting the cell (Invention 9 ).

  According to the present invention, there are provided a transparent substrate for observation, an observation container and a manufacturing method thereof, a polishing method for a transparent substrate, and an observation method capable of observing an observation object at high magnification using an inverted microscope. be able to.

FIG. 1 is a plan view showing a schematic configuration of an observation transparent substrate according to an embodiment of the present invention. 2 is a cross-sectional end view taken along the line II in FIG. 1, showing a schematic configuration of the transparent substrate for observation according to the embodiment of the present invention. FIG. 3 is a process flow diagram showing the manufacturing process of the observation transparent substrate according to the embodiment of the present invention in a cut end view. FIG. 4 is a process for manufacturing an observation transparent substrate according to an embodiment of the present invention, and each step (each step of the transparent substrate polishing method) following the step shown in FIG. 3 is shown in a cut end view. FIG. FIG. 5 is a plan view showing a schematic configuration of an observation container in one embodiment of the present invention. 6 is a sectional view taken along line II-II in FIG. 5, showing a schematic configuration of the observation container in one embodiment of the present invention. FIG. 7 is a schematic view showing an observation method using an observation container in one embodiment of the present invention.

Embodiments of the present invention will be described with reference to the drawings.
[Transparent substrate for observation]
FIG. 1 is a plan view illustrating a schematic configuration of the observation transparent substrate according to the present embodiment, and FIG. 2 illustrates a schematic configuration of the observation transparent substrate according to the present embodiment, taken along the line II in FIG. It is an end view.

  As shown in FIGS. 1 and 2, the observation transparent substrate 10 according to the present embodiment includes a base 11 having a first surface 11a and a second surface 11b facing the first surface 11a. A nano uneven pattern 12 is formed in the observation region 13A on the surface 11a side. The transparent substrate for observation 10 according to the present embodiment is a cell as an observation object or a cell component constituting the cell (for example, a membrane vesicle (exosome) secreted from cultured cells) present on the nano uneven pattern 12. , Organelles, vesicles (lysosomes, endosomes, phagosomes, vacuoles, etc.), granules (melanosomes, microbodies, glyoxisomes, bibel-parade bodies, etc.), cytoskeleton, central bodies, flagella, Cilia, ribosome, etc.) are used for observing from the second surface 11b side using an inverted microscope. Hereinafter, it may be referred to as “cells” including cells and cell components.

  In the present embodiment, “transparent” means that light having a wavelength of 190 to 800 nm is irradiated from one side (the first surface 11a side or the second surface 11b side) of an object (in this embodiment, the observation transparent substrate 10). This means that light reaches the opposite side (the second surface 11b side or the first surface 11a side) from the irradiated side. If a suitable standard is expressed by transmittance, it is 20% or more, preferably 50% or more, particularly preferably 80% or more.

  Materials constituting the base 11 include quartz glass, synthetic quartz glass, soda glass, fluorite, calcium fluoride, magnesium fluoride, acrylic glass, borosilicate glass, and the like; polycarbonate, polypropylene, polyethylene, polystyrene, and others A transparent material such as a resin material such as polyolefin can be used.

  The shape (plan view shape) of the base 11 is not particularly limited, and examples thereof include a substantially rectangular shape in plan view and a substantially circular shape in plan view. In addition, the size of the base 11 in plan view is not particularly limited. As will be described later, the observation transparent substrate 10 according to the present embodiment is preferably a container body 2 having a through hole 2c. It is used by being attached to the bottom 2a so as to close the through hole 2c (see FIGS. 5 and 6). Therefore, it is preferable that the size of the base 11 is set to such an extent that the through hole 2c can be closed according to the size of the through hole 2c of the container body 2.

The thickness T _{11 of the} base 11 is 0.5 mm or less, preferably 0.03 to 0.5 mm, and particularly preferably 0.1 to 0.2 mm. The observation transparent substrate 10 according to the present embodiment is used for observing an observation target existing on the nano uneven pattern 12 from the second surface 11b side using an inverted microscope. In particular, when observing a cell or the like as an observation object, it is desirable that observation is possible at an extremely high magnification (20 times or more, preferably about 50 times or more). When the thickness T _{11 of the} base 11 exceeds 0.5 mm, the distance between the object to be observed on the nano uneven pattern 12 and the objective lens of the inverted microscope that faces the second surface 11b and faces the base 11 is sandwiched. It becomes long and observation at a high magnification (about 20 times or more) becomes difficult.

In the present embodiment, the thickness T ₁₁ of the base 11 means the length in the plate thickness direction between the top of the nano uneven pattern 12 formed on the first surface 11a side and the second surface 11b. The thickness T ₁₁ can be measured using a micrometer or the like.

  The nano uneven pattern 12 is formed in an observation region 13A on the first surface 11a of the base 11 as a structure integrated with the base 11. The size of the observation region 13A on the first surface 11a of the base 11 is not particularly limited. As will be described later, the observation transparent substrate 10 according to the present embodiment is preferably the bottom 2a. Are attached to the outer surface (outside the container body 2) of the bottom 2a of the container body 2 in which the through hole 2c is formed at substantially the center of the container body 2 so that the nano uneven pattern 12 is exposed from the through hole 2c (FIG. 5). And FIG. 6). Therefore, the size of the observation region 13A, in other words, the size of the region where the nano uneven pattern 12 should be formed depends on the size of the through hole 2c of the container body 2 from the through hole 2c. It is appropriately set to such an extent that it can be exposed, that is, to the extent that the observation region 13A can be physically included in the through hole 2c in a plan view of the container body 2 to which the observation transparent substrate 10 is attached (see FIG. 1).

  The shape of the nano-concave pattern 12 is preferably a substantially circular pillar shape, a substantially rectangular or substantially polygonal pillar shape, a line shape, etc., but is not limited to these shapes. The shape may be a substantially rectangular or substantially polygonal hole. Moreover, the nano uneven | corrugated pattern 12 may have the side wall shape of a taper shape or a reverse taper shape.

  The size of the nano uneven pattern 12 is preferably 100 to 500 nm. Since the size of the nano uneven pattern 12 is within the above range, the cell as the observation object exhibits good adhesiveness to the nano uneven pattern 12, and therefore, observation of the cell, particularly long time observation is easy. become.

  The dimension of the nano uneven pattern 12 is, for example, the length of one side of the square if the nano uneven pattern 12 has a substantially square pillar shape in plan view, and the diameter of the circle in the case of a substantially circular pillar shape in plan view. If it is a line, it means the width in the short direction.

  The height (aspect ratio) of the nano concavo-convex pattern 12 is not particularly limited and can be appropriately set according to the dimensions of the nano concavo-convex pattern 12. Usually, the height of the nano uneven pattern 12 can be set so that the aspect ratio of the nano uneven pattern 12 is about 0.5 to 5.

  The region outside the observation region 13A on the first surface 11a of the base portion 11 is an adhesive when attached to the outer surface of the bottom portion 2a of the container body 2 in which a through hole 2c is formed in the approximate center of the bottom portion 2a described later. Is configured as a region to be coated.

According to the transparent substrate for observation 10 according to the present embodiment having the above-described configuration, the observation object on the first surface 11a can be turned into an inverted microscope because the thickness T11 of the base ₁₁ is as very thin as 0.5 mm or less. Can be observed at a high magnification from the second surface 11b side. Moreover, since the nano uneven | corrugated pattern 12 is formed in the 1st surface 11a side, since the cell as an observation object shows favorable adhesiveness with respect to the said nano uneven | corrugated pattern 12, it observes for a long time using an inverted microscope. Can be easily performed.

[Method of manufacturing transparent substrate for observation]
The observation transparent substrate 10 having the above-described configuration can be manufactured as follows. FIG. 3 is a process flow diagram showing a manufacturing process of the observation transparent substrate according to this embodiment in a cut end view, and FIG. 4 is a process of manufacturing the observation transparent substrate according to this embodiment. FIG. 4 is a process flow diagram showing each process (each process of the transparent substrate polishing method) continued from the process shown in 3 in a cut end view.

  First, a transparent substrate 31 having a first surface 31a and a second surface 31b opposite to the first surface 31a and having a hard mask layer 41 and a resist film 42 formed in that order on the first surface 31a is prepared. (See FIG. 3A).

  As the transparent substrate 31, the constituent material of the observation transparent substrate 10 according to the present embodiment (for example, quartz glass, synthetic quartz glass, soda glass, fluorite, calcium fluoride, magnesium fluoride, acrylic glass, borosilicate glass) A substrate made of a glass material such as polycarbonate; polypropylene, polyethylene, polystyrene, and other transparent resin materials such as polyolefin) can be used. The transparent substrate 31 has a thickness exceeding 0.5 mm, and usually has a thickness of about 1.0 to 6.35 mm.

  In the present embodiment, the transparent base material 31 is a multi-faced transparent base material in which regions corresponding to the plurality of transparent substrates for observation 10 are allocated on the first surface 31a side, and will be described later (FIG. 4D The transparent substrate for observation 10 is manufactured by being cut in ()).

  As a material constituting the hard mask layer 41, for example, metal chromium, chromium oxide, chromium nitride, chromium oxynitride, or the like can be used. The hard mask layer 41 is a layer for forming a hard mask pattern 44 used for etching the transparent substrate 31 by a process described later (see FIG. 3C). Therefore, it is comprised by the material which considered the etching selection ratio with the material which comprises the transparent base material 31, and the aspect-ratio of the nano uneven | corrugated pattern 12 in the transparent substrate 10 for observation. For example, when the transparent base material 31 is made of quartz glass, the hard mask layer 41 is preferably made of metal chromium or the like.

  The resist material constituting the resist film 42 is not particularly limited, and a conventionally known energy ray sensitive resist material (for example, an electron beam sensitive resist material, an ultraviolet sensitive resist material, etc.) or the like may be used. it can.

  Next, the resist film 42 is patterned so that a resist pattern 43 corresponding to the nano uneven pattern 12 of the observation transparent substrate 10 is observed on the first surface 31a side of the transparent base material 31 on the observation region 13A of the observation transparent substrate 10. It forms in the area | region (refer FIG.1 and FIG.2) (refer FIG.3 (B)).

  The method for forming the resist pattern 43 is not particularly limited. For example, the resist pattern 43 can be formed by an electron beam lithography method, a photolithography method, a nanoimprint lithography method, or the like.

  Subsequently, the hard mask layer 41 is etched by dry etching using the resist pattern 43 as a mask to form a hard mask pattern 44 (see FIG. 3C). Then, the first surface 31a of the transparent substrate 31 is etched using the hard mask pattern 44 as a mask to form the nano uneven pattern 12, and then the hard mask pattern 44 is removed (see FIG. 3D).

  In this way, the transparent substrate 31 having the nano uneven pattern 12 formed on the first surface 31a side is polished from the second surface 31b side so that the thickness of the transparent substrate 31 is 0.5 mm or less. The method for polishing the transparent substrate 31 can be carried out as follows. FIG. 4 is a process flow schematically showing the steps of the method for polishing the transparent substrate 31 (the transparent substrate 31 having the nano uneven pattern 12 formed on the first surface 31 side) in the present embodiment in a cut end view. FIG.

  First, the metal-containing film 51 is formed on the first surface 31a so as to cover the entire surface of the first surface 31 of the transparent substrate 31 on which the nano uneven pattern 12 is formed on the first surface 31a (FIG. 4 ( A)).

  Examples of the material constituting the metal-containing film 51 include metal materials such as chromium and copper, oxides and nitrides of the metals, and the like. Considering that the metal-containing film 51 is peeled off by an etching process after a polishing step (see FIG. 4C) described later (see FIG. 4E), when using quartz glass as the transparent substrate 31, From the standpoint of selectivity, etc., it is preferable to use chromium, chromium oxide or the like that can be easily peeled as a material constituting the metal-containing film 51.

  The thickness of the metal-containing film 51 (thickness on the top of the nano uneven pattern 12) is preferably 50 nm or more, and preferably 50 to 200 nm. In the present embodiment, the transparent substrate 31 is polished from the second surface 31b side until the thickness of the transparent substrate 31 becomes 0.5 mm or less (see FIG. 4C). As the thickness of the material 31 decreases, the strength of the transparent substrate 31 decreases. Further, as will be described later, the transparent substrate for observation 10 is manufactured by cutting the transparent base material 31 polished to a thickness of 0.5 mm or less into individual pieces (FIGS. 4D and 4D). E)). Therefore, if the thickness of the metal-containing film 51 is less than 50 nm, the reinforcing effect of the transparent base material 31 becomes insufficient, and the transparent base material 31 may be damaged in a polishing process or a cutting process.

  The method for forming the metal-containing film 51 on the first surface 31a is not particularly limited, and for example, a known film forming method such as a sputtering method, a CVD method, a PVD method, or a vacuum evaporation method may be employed. it can.

  Next, an organic film 52 is formed over the metal-containing film 51 (see FIG. 4B). In a polishing step (see FIG. 4C), which will be described later, fine particles and the like are generated. By forming the organic film 52 on the metal-containing film 51, the particles and the like are removed in the process of removing the organic film 52. Can also be removed at the same time, so that the particles or the like can be prevented from adhering in the nano uneven pattern 12.

The material constituting the organic film 52 is not particularly limited, and for example, a material similar to the material constituting the resist film 42 (see FIG. 3A) described above can be used.
The method for forming the organic film 52 on the metal-containing film 51 is not particularly limited. For example, after applying a material constituting the organic film 52 by a known coating method such as a spin coating method, the material It is possible to employ a method of curing

  The thickness of the organic film 52 is not particularly limited, and can prevent fine particles or the like that may be generated in a polishing step (see FIG. 4C) described later from adhering to the nano uneven pattern 12. Any thickness may be used. For example, the thickness of the organic film 52 is about 200 to 500 nm.

  Subsequently, the transparent base material 31 on which the organic film 52 is formed is polished from the second surface 31b side until the thickness becomes 0.5 mm or less (see FIG. 4C). Since the metal-containing film 51 is formed on the first surface 31a side, the transparent substrate 31 can be polished until the thickness becomes 0.5 mm or less without damaging the transparent substrate 31. In addition, since the organic film 52 is formed on the metal-containing film 51, it is possible to prevent particles or the like generated in the polishing process from adhering to the nano uneven pattern 12.

  The method for polishing the transparent substrate 31 is not particularly limited, and examples thereof include chemical mechanical polishing (CMP) and mechanical polishing using a rotary polishing disk. Preferably, after polishing (primary polishing) to a thickness of more than 0.5 mm to about 1 mm or less by mechanical polishing treatment, polishing (secondary polishing) is performed to a thickness of 0.5 mm or less by CMP.

  The transparent base material 31 thus polished and having a thickness of 0.5 mm or less is cut into pieces by using a dicing apparatus or the like (see FIG. 4D). Finally, the transparent substrate 10 for observation according to the present embodiment is manufactured by peeling the organic film 52 and the metal-containing film 51 from the first surface 31a side of each transparent base material 31 that is cut and separated. (See FIG. 4E).

  The method for removing the organic film 52 and the metal-containing film 51 is not particularly limited. For example, the method for dissolving and removing the organic film 52 with a cleaning solution containing sulfuric acid or the like, the metal constituting the metal-containing film 51 Examples include a method of removing the metal-containing film 51 using an etchant that can etch the material.

  According to the polishing method and the manufacturing method of the observation transparent substrate 10 including the same in the present embodiment, the thickness of the transparent substrate 31 formed with the nano uneven pattern 12 on the first surface 31a side is reduced to 0. The observation transparent substrate 10 that can be polished to 5 mm or less and can be observed from the second surface 11b side using an inverted microscope can be easily manufactured.

[Observation vessel]
The observation transparent substrate 10 having the above-described configuration is for observing an observation object (cell or the like) existing on the nano uneven pattern 12 on the first surface 11a side from the second surface 11b side using an inverted microscope. Although used, it is preferable to be used in the form of an observation container to be described later. 5 is a plan view (top view) showing a schematic configuration of the observation container in the present embodiment, and FIG. 6 shows a schematic configuration of the observation container in the present embodiment, taken along the line II-II in FIG. It is an end view.

  As shown in FIGS. 5 and 6, the observation container 1 in the present embodiment has a bottom portion 2 a and a peripheral wall portion 2 b continuous to the outer peripheral edge of the bottom portion 2 a, and a through hole 2 c is formed at substantially the center of the bottom portion 2 a. The container main body 2 thus formed, and the observation transparent substrate 10 according to the present embodiment attached to the bottom 2a of the container main body 2 are provided.

  In the present embodiment, the container body 2 is a petri dish-like container having a through hole 2c formed in the approximate center of the bottom 2a and opening upward. However, as long as the through hole is formed in the bottom, such a mode It is not limited to. For example, a flask-like container having a through-hole formed in the bottom may be used.

  The size of the container body 2 in plan view is not particularly limited, and is preferably the same diameter as a petri dish generally used in cell culture or the like, for example, about 30 to 60 mm in diameter. Moreover, the thickness of the bottom part 2a of the container main body 2 is about 0.8-1.5 mm.

  The container body 2 may be made of synthetic resin or glass. Further, the peripheral wall 2b and the bottom 2a may be made of different materials (for example, the peripheral wall 2b is made of synthetic resin and the bottom 2a is made of glass or the like).

  The size of the through-hole 2c is not particularly limited, but is a size that can physically include the nano uneven pattern 12 formed in the observation region 13A of the first surface 11a of the observation transparent substrate 10. For example, the diameter is about 10 to 30 mm.

  In the present embodiment, the observation transparent substrate 10 is formed so that the nano uneven pattern 12 is positioned in the container body 2, that is, the nano uneven pattern 12 is exposed from the through hole 2 c. It is attached to the outer surface. Then, in a plan view (top view) of the observation container 1 (container body 2), the observation transparent substrate 10 is arranged so that the nano uneven pattern 12 overlaps the through hole 2c, that is, the nano uneven pattern 12 is in the through hole 2c. It is attached to the outer surface of the bottom 2a of the container body 2 so as to be physically included.

  The observation transparent substrate 10 is attached to the outer surface of the bottom 2a of the container body 2 so as to close the through hole 2c. That is, the bottom surface of the container body 2 is configured by the bottom 2a in which the through hole 2c is formed and the observation transparent substrate 10 that closes the through hole 2c.

  The observation transparent substrate 10 is preferably attached by adhering to the vicinity of the periphery of the through hole 2c on the outer surface of the bottom 2a of the container body 2 via an adhesive (not shown). Such an adhesive is not particularly limited, and has a high adhesive force to the observation transparent substrate 10 and the constituent material of the bottom 2a of the container main body 2, and is a culture accommodated in the observation container 1. It is preferable that it has a sealing property (liquid tightness) against liquids and the like, and does not adversely affect observation objects such as cells (no toxicity etc.). As the adhesive, for example, a deoxime-type silicone-based adhesive can be used.

According to the observation container 1 of the present embodiment having the above-described configuration, the observation transparent substrate 10 having a thickness T _{11 of} 0.5 mm or less is provided on the outer surface of the bottom 2a of the container main body 2, and the nano uneven pattern 12 is provided on the container main body. By observing the observation object (cells, etc.) existing on the nano uneven pattern 12 at a high magnification using an inverted microscope by being attached so as to be physically included in the two through holes 2c. Can do. In addition, since the cells as the observation target exhibit good adhesion to the nano uneven pattern 12, according to the observation container 1 in this embodiment, it is easy to observe the cells on the nano uneven pattern 12 for a long time. It becomes.

[Method for manufacturing observation container]
The observation container 1 described above prepares a container body 2 having a bottom 2a and a peripheral wall 2b continuous to the outer peripheral edge of the bottom 2a, and having a through-hole 2c formed substantially at the center of the bottom 2a. It can be manufactured by attaching the observation transparent substrate 10 to the outer surface of the bottom 2a of the main body 2 via an adhesive applied to the outer peripheral region of the observation region 13A of the first surface 11a of the observation transparent substrate 10.

  At this time, the observation transparent substrate 10 is placed at the bottom of the container body 2 so as to close the through hole 2c of the container body 2 and so that the nano uneven pattern 12 in the observation transparent substrate 10 is exposed from the through hole 2c. Attach to 2a. Thereby, the nano uneven | corrugated pattern 12 can be located in the container main body 2. FIG.

  According to the present embodiment, the observation container 1 can be manufactured simply by adhering the observation transparent substrate 10 so as to block the through hole 2c formed in the approximate center of the bottom 2a of the container body 2. The observation container 1 can be easily manufactured.

[Observation method]
The observation container 1 described above is used for observing an observation object. Hereinafter, a method of observing a cell as an observation object using the observation container 1 will be described. FIG. 7 is a schematic view showing an observation method in the present embodiment.

  As shown in FIG. 7, in the present embodiment, cells 71 as observation objects are accommodated in the observation container 1, and the observation container 1 is placed on the stage 61 of an inverted microscope (not shown). To do. Since the opening 61 of a predetermined size is formed in the stage 61 of the inverted microscope, the observation container 1 is placed so that the nano uneven pattern 12 of the observation container 1 is positioned in the opening 62. .

  Examples of the method for accommodating the cells 71 as the observation object in the observation container 1 include a method of dropping a droplet of the culture solution 72 containing the cells 71 on the nano uneven pattern 12 of the observation container 1. Can do.

  Then, the objective lens 63 of the inverted microscope is brought close to the second surface 11b side of the observation transparent substrate 10 bonded to the bottom 2a of the observation container 1, so that the cells 71 are brought into the second surface 11b at a desired magnification. Observe from the side.

According to the observation method in the present embodiment, the observation T present on the nano uneven pattern 12 by the thickness T ₁₁ of the observation transparent substrate 10 attached to the bottom 2a of the observation container 1 being 0.5 mm or less. The distance between the cell 71 as the object and the objective lens 63 can be observed with an extremely short distance. Therefore, the observation object can be observed at an extremely high magnification. In addition, when the cells 71 as the observation object are present on the nano uneven pattern 12, the cells 71 exhibit good adhesion to the nano uneven pattern 12, and therefore, long-time observation can be easily performed. .

  The embodiment described above is described for facilitating understanding of the present invention, and is not described for limiting the present invention. Therefore, each element disclosed in the above embodiment is intended to include all design changes and equivalents belonging to the technical scope of the present invention.

  In the above embodiment, the observation container 1 is formed by attaching the observation transparent substrate 10 to the outer surface of the bottom 2a of the container body 2, but the present invention is not limited to such an embodiment. For example, an adhesive is applied to the second surface 11 b side of the observation transparent substrate 10, and the observation transparent substrate 10 is adhered to the outer peripheral edge region of the through hole 2 c of the bottom 2 a in the container body 2. 10 may be attached in the container main body 2.

  In the said embodiment, although the transparent substrate 10 for observation was demonstrated and demonstrated as an example the aspect used attaching to the said bottom part 2a of the container main body 2 by which the through-hole 2c is formed in the bottom part 2a, this invention is such However, the present invention is not limited to such an embodiment. The said observation transparent substrate 10 may be used for the observation use of an observation target object as it is.

  In the said embodiment, after forming the nano uneven | corrugated pattern 12 in the 1st surface 31a side of the transparent base material 31, after removing the hard mask pattern 44, the metal containing film | membrane 51 is formed. It is not limited to such an aspect. For example, the metal-containing film 51 may be formed without removing the hard mask pattern 44. In this case, since it is preferable that the hard mask pattern 44 can be removed together with the metal-containing film 51 in the step of peeling the metal-containing film 51 (see FIG. 4E), the hard mask pattern 44, the metal-containing film 51, and Are preferably made of a material that can be etched with the same etching solution.

  In the above-described embodiment, an example in which the observation transparent substrate 10 is manufactured using the multi-sided transparent base material 31 in which regions corresponding to the plurality of observation transparent substrates 10 are allocated on the first surface 31a side is given as an example. However, the present invention is not limited to such an embodiment. For example, one observation transparent substrate 10 may be manufactured using a transparent base material having a size corresponding to one observation transparent substrate 10. According to such an aspect, the process (refer FIG.4 (D)) which cut | disconnects the transparent base material after grinding | polishing can be skipped.

  EXAMPLES Hereinafter, although an Example etc. are given and this invention is demonstrated further in detail, this invention is not limited at all by the following Example etc.

[Example 1]
A transparent base material 31 (quartz glass substrate, size: 152 mm × 152 mm, thickness: 6.35 mm) in which a hard mask layer 41 made of metallic chromium having a thickness of 6 nm is provided on the first surface 31a is prepared. A resist (product name: SEBP-9902, manufactured by Shin-Etsu Chemical Co., Ltd.) was applied on the hard mask layer 41 to form a resist film 42 (thickness: 100 nm). A pillar shape is formed using an electron beam drawing apparatus (JBX9000, manufactured by JEOL Ltd.) in each of the regions corresponding to the plurality of observation regions 13A (size that can be physically included in 14 mmφ) on the resist film 42. The resist pattern 43 was formed.

Next, the hard mask layer 41 was dry-etched (etching gas: Cl ₂ + O ₂ ) using the resist pattern 43 as a mask, and the remaining resist pattern 43 was removed to form a hard mask pattern 44.

  The transparent base material 31 (quartz glass substrate) is etched using the hard mask pattern 44 formed as described above as a mask, and the hard mask pattern 44 is peeled off, whereby the transparent base material 31 (quartz glass substrate) is peeled off. A pillar-shaped nano uneven pattern 12 (dimension: 200 nm) was formed on the first surface 31a.

  Subsequently, a metal chromium film as a metal-containing film 51 is formed on the first surface 31a with a thickness of 100 nm so as to cover the pillar-shaped nano uneven pattern 12 on the first surface 31a side, and the metal-containing film An electron beam sensitive resist (product name: SEBP-9902, manufactured by Shin-Etsu Chemical Co., Ltd.) was applied onto 51 by a spin coating method and cured to form an organic film 52 having a thickness of 350 nm.

  An organic material having adhesiveness is applied onto the organic film 52 of the transparent substrate 31 (quartz glass substrate) on which the metal-containing film 51 and the organic film 52 are formed in this order, and a polishing machine having a diamond grindstone ( The transparent base material 31 (quartz glass substrate) was fixed to a surface plate made by TSSC Co., Ltd. (product name: KUUKAI), and was polished (primary polishing) from the second surface 31b side. Thereafter, polishing (secondary polishing) was further performed from the second surface 1b side by CMP treatment using CMP slurry (manufactured by AGC Seimi Chemical Co., Ltd., product name: Luminox Lumitop).

  The polished transparent base material 31 (quartz glass substrate) was cut into 20 mm square pieces by a dicing apparatus using a diamond blade and separated into individual pieces. And after washing | cleaning the organic film 52 with a sulfuric acid, the metal containing film | membrane 51 was removed by being immersed in chromium etching liquid, and the transparent substrate 10 for observation was produced. In addition, as a result of measuring the thickness of the produced transparent substrate for observation 10 using a micrometer, the thickness was 0.17 mm.

  The transparent substrate for observation 10 thus produced is a perforated dish (manufactured by Matsunami Glass Industrial Co., Ltd., product name: 35 mmφ glass bottom dish) as a container body 2 having a through hole 2c formed in the center of the bottom 2a. The observation container 1 was manufactured by attaching to the bottom 2a with an adhesive (manufactured by Shin-Etsu Silicone Co., Ltd., one-component RTV rubber) so as to close the through hole 2c.

[Example 2]
First surface of transparent substrate 31 (quartz glass substrate) is prepared by a nanoimprint lithography method using a nanoimprint apparatus (manufactured by Toshiba Machine Co., Ltd., ST50) by preparing an imprint mold having a fine concavo-convex pattern corresponding to nano concavo-convex pattern 12 An observation transparent substrate 10 (thickness: 0.17 mm) was produced in the same manner as in Example 1 except that the nano uneven pattern 12 was formed on 31a, and the observation container 1 was produced.

[Reference Example 1]
In the same manner as in Example 1, the nano uneven pattern 12 is formed on the first surface 31a of the transparent substrate 31, and the metal-containing film 51 and the organic film 52 are formed on the first surface 31a on which the nano uneven pattern 12 is formed. Without polishing the transparent base material 31 from the second surface 31b side, the transparent base material 31 was damaged before the thickness of the transparent base material 31 became 0.5 mm or less.

[Reference Example 2]
In the same manner as in Example 1, the nano uneven pattern 12 is formed on the first surface 31a of the transparent substrate 31, and the metal-containing film 51 is not formed on the first surface 31a on which the nano uneven pattern 12 is formed. When only 52 was formed and polished from the second surface 31b side of the transparent base material 31, the transparent base material 31 was damaged before the thickness of the transparent base material 31 became 0.5 mm or less.

[Reference Example 3]
A transparent substrate for observation was produced in the same manner as in Example 1 except that the organic film 52 was not formed. When the nano uneven | corrugated pattern 12 of the said transparent substrate for observation was observed using the electron microscope, it was confirmed that the fine particle considered to have arisen at the time of a grinding | polishing process has adhered on the nano uneven | corrugated pattern 12. FIG.

[Test Example 1]
A culture solution 72 containing oral epithelial cells 71 is dropped on the nano-concave pattern 12 of the observation container 1 of Example 1, and the inverted microscope (manufactured by Nikon Corporation, product name: ECLIPSE Ti) is used at a magnification of 50 times. Cells were observed. As a result, it was possible to clearly observe the cells and the cell components constituting the cells. Moreover, it has confirmed that the cell was adhere | attached on the nano uneven | corrugated pattern 12. FIG.

  From the test example 1, an observation container in which a very thin observation transparent substrate 1 is attached to the bottom 2a so as to close the through-hole 2c of the container body 2 in which the through-hole 2c is formed in the bottom 2a. By using 1, it became clear that the cells as the observation object can be observed at an extremely high magnification using an inverted microscope.

  The present invention is useful for cell observation in biotechnology related fields such as drug development and regenerative medicine.

DESCRIPTION OF SYMBOLS 1 ... Observation container 2 ... Container main body 2a ... Bottom part 2b ... Perimeter wall part 2c ... Through-hole 10 ... Transparent substrate 11 for observation 11 ... Base 11a ... 1st surface 11b ... 2nd surface 12 ... Nano uneven | corrugated pattern 13A ... Observation region

Claims (9)

Preparing a transparent substrate having a first surface and a second surface facing the first surface, wherein a nano uneven pattern is formed on the first surface side; and
Forming a metal-containing film covering the nano uneven pattern on the first surface side;
Forming an organic film on the metal-containing film;
Polishing the transparent substrate on which the organic film is formed from the second surface side,
A polishing method, wherein the thickness of the transparent substrate after being polished from the second surface side is 0.5 mm or less. The polishing method according to claim 1 , wherein a dimension of the nano uneven pattern is 100 to 500 nm. The polishing method according to claim 1 or 2, wherein the thickness of the metal-containing film is 50nm or more. The polishing method according to any one of claims 1 to 3 , wherein the transparent base material is assigned a plurality of regions where the nano uneven pattern is formed. A container body having a bottom formed with a through-hole and a peripheral wall continuous to the outer peripheral edge of the bottom; a first surface; and a second surface facing the first surface, and observation on the first surface A method for producing an observation container comprising an observation transparent substrate used for observing an object from the second surface side, wherein the observation transparent substrate is attached to the bottom,
It was produced by polishing a transparent substrate having a first surface and a second surface opposite to the first surface and having a nano uneven pattern formed on the first surface side from the second surface side. The observation transparent substrate is positioned in the container main body so that the nano uneven pattern of the observation transparent substrate overlaps the through hole in a plan view of the container main body and closes the through hole. Including attaching to the bottom of the container body,
The observation transparent substrate, a manufacturing method of the observation container, characterized in that those made by polishing the transparent substrate by the polishing method according to any one of claims 1-4. As the nano concave-convex pattern in a plan view of the container body is physically embraced the through-hole, according to claim 5, characterized in that attaching the observation transparent substrate to the bottom of the container body Manufacturing method of the observation container. The method for manufacturing an observation container according to claim 5 or 6 , wherein the observation transparent substrate is attached to an outer surface of the bottom portion of the container main body so as to expose the nano uneven pattern from the through hole. . Manufacturing method of the observation vessel according to any one of claims 5-7, characterized in that attaching the observation transparent substrate, the bottom via an adhesive. The method for producing an observation container according to any one of claims 5 to 8 , wherein the observation object is a cell or a cell component constituting the cell.

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