JP6482129B2

JP6482129B2 - Electric force / magnetic force microscope and electric / magnetic field simultaneous measurement method

Info

Publication number: JP6482129B2
Application number: JP2015560054A
Authority: JP
Inventors: 準齊藤; 哲吉村; 幸則木下
Original assignee: Akita University NUC
Current assignee: Akita University NUC
Priority date: 2014-01-30
Filing date: 2015-01-30
Publication date: 2019-03-13
Anticipated expiration: 2035-01-30
Also published as: WO2015115622A1; JPWO2015115622A1

Description

本発明は、試料から発生する電場と磁場とを同時に測定することができる、電気力／磁気力顕微鏡および電場／磁場同時測定方法に関する。
本発明では、周波数が異なる交流電場と交流磁場とを、励振している導電性のソフト磁性探針に印加し、前記ソフト磁性探針の振動を検出することで、前記試料から発生する電場と磁場とが同時に測定される。The present invention relates to an electric force / magnetic force microscope and an electric field / magnetic field simultaneous measurement method capable of simultaneously measuring an electric field and a magnetic field generated from a sample.
In the present invention, an alternating electric field and an alternating magnetic field having different frequencies are applied to an excited conductive soft magnetic probe, and the electric field generated from the sample is detected by detecting the vibration of the soft magnetic probe. The magnetic field is measured simultaneously.

試料の直流磁場を測定する技術として、図１（Ａ）に示す磁気力顕微鏡（ＭＦＭ８）が知られている（特許文献１：ＷＯ２０１３／０４７５３７参照）。
このＭＦＭ８では、先端に探針チップ８１１が設けられた探針部材８１（カンチレバー）が励振される。そして、バネ振動している探針チップ８１１により、試料８２の表面を走査し、前記探針チップ８１１の振動を検出することで、試料８２の表面の磁場を測定することができる。A magnetic force microscope (MFM8) shown in FIG. 1A is known as a technique for measuring a DC magnetic field of a sample (see Patent Document 1: WO2013 / 047537).
In the MFM 8, a probe member 81 (cantilever) having a probe tip 811 provided at the tip is excited. Then, the surface of the sample 82 is scanned by the probe tip 811 that vibrates in spring, and the magnetic field on the surface of the sample 82 can be measured by detecting the vibration of the probe tip 811.

試料８２の下方には交流磁場発生用のコイル８４が設けられており、探針チップ８１１には、試料８２が生成する直流磁場Ｈ＿ＤＣ_SMPLと、コイル８４が生成する交流磁場Ｈ＿ＡＣとの重畳磁場が印加される。
レーザ（ＬＡＳＥＲ）８３１とフォトダイオード（ＰＤ）８３２とからなる振動検出器により、探針部材８１の振動（みかけ上のバネ定数が変化することによって生じた振動変調）が検出され、図示しない直流磁場測定部により試料８２の表面の直流磁場が測定される。
なお、探針チップ８１１は、錐形のＳｉにソフト磁性体（例えばＦｅ−Ｃｏ、Ｆｅ−Ｃｏ−Ｂ、パーマロイ（Ｎｉ−Ｆｅ）、Ｃｏ−Ｚｒ−Ｎｂ等。）の薄膜を形成することで作製される。A coil 84 for generating an alternating magnetic field is provided below the sample 82, and a superposed magnetic field of the direct magnetic field H_DC _SMPL generated by the sample 82 and the alternating magnetic field H_AC generated by the coil 84 is provided on the probe tip 811. Applied.
A vibration detector composed of a laser (LASER) 831 and a photodiode (PD) 832 detects vibration of the probe member 81 (vibration modulation caused by a change in the apparent spring constant), and a DC magnetic field (not shown) A DC magnetic field on the surface of the sample 82 is measured by the measurement unit.
The probe tip 811 is formed by forming a thin film of a soft magnetic material (for example, Fe—Co, Fe—Co—B, permalloy (Ni—Fe), Co—Zr—Nb, etc.) on conical Si. Produced.

図１（Ａ）に示した従来の磁気力顕微鏡（ＭＦＭ８）の動作原理を説明する。
直流磁場勾配（∂Ｈ＿ＤＣ_SMPL／∂ｚ）の計測は、試料８２上の、探針チップ８１１に空間的に一様な交流磁場を印加して、探針チップ８１１の磁気モーメントを周期的に変化させることで可能となる。
図１（Ｂ）に、探針チップ８１１に使用されるソフト磁性体のＭ−Ｈ特性の一例を示す。
図１（Ｂ）では交流磁場の印加による磁化Ｍの時間変化を併せて示してある。
探針チップ８１１に、交流磁場により探針の共振周波数と異なる、非共振の交番磁気力が与えられたときのカンチレバー（探針部材８１）の運動方程式は、式（１）で表される。The operation principle of the conventional magnetic force microscope (MFM8) shown in FIG.
The DC magnetic field gradient (∂H_DC _SMPL / SMz) is measured by applying a spatially uniform alternating magnetic field to the probe tip 811 on the sample 82 and periodically changing the magnetic moment of the probe tip 811. This is possible.
FIG. 1B shows an example of the MH characteristic of the soft magnetic material used for the probe tip 811.
FIG. 1B also shows the change over time of the magnetization M due to the application of an alternating magnetic field.
The equation of motion of the cantilever (probe member 81) when a non-resonant alternating magnetic force different from the probe resonance frequency is applied to the probe tip 811 by an alternating magnetic field is expressed by equation (1).

ｚ（ｔ）：ソフト磁性探針（探針チップ８１１）の変位の時間変化（ここで、ｚ方向は、試料面に垂直な方向にとり、探針の振動方向とする）
ω₀：加振角周波数
ω_m：交流磁気力の角周波数
ｍ：ソフト磁性探針（探針チップ８１１）の等価質量
γ：減衰係数
ｋ₀：カンチレバー（探針部材８１）固有のバネ定数
Δｋ：カンチレバー（探針部材８１）のバネ定数のみかけ上の周期的変化の振幅
Δｋ≪ｋ₀であるので、式（１）の解は式（２）で与えられる。

z (t): time change of displacement of the soft magnetic probe (probe tip 811) (here, the z direction is a direction perpendicular to the sample surface and is the vibration direction of the probe)
ω ₀ : Excitation angular frequency ω _m : AC magnetic force angular frequency m: Equivalent mass of soft magnetic probe (probe tip 811) γ: Damping coefficient k ₀ : Spring constant specific to cantilever (probe member 81) Δk : Since the apparent periodic variation amplitude Δk << k ₀ of the spring constant of the cantilever (probe member 81), the solution of equation (1) is given by equation (2).

非共振の交流磁場をソフト磁性探針（探針チップ８１１）に印加することにより、探針部材８１のバネ定数は、式（３）のように周期的に時間変化する項を含む。
Δｋ（ｔ）＝｛ｑ_tip ^dc＋ｑ_tip ^acｃｏｓ（ω_mｔ）｝
・［（∂Ｈ＿ＤＣ_SMPL／∂ｚ）
＋（∂Ｈ＿ＡＣ／∂ｚ）ｃｏｓ（ω_mｔ）］（３）
Ｈ＿ＤＣ_SMPL：試料から発生する直流磁場
Ｈ＿ＡＣ：ソフト磁性探針（探針チップ８１１）に印加する交流磁場の振幅
ｑ_tip ^ac：振幅がＨ＿ＡＣの交流磁場により探針チップ８１１に生じた交流磁荷（以下、「交流磁極」と言う）の振幅
ｑ_tip ^dc：直流電場Ｅ＿ＤＣ_SMPLにより探針チップ８１１に生じた直流の磁荷（以下、「磁極」と言う）By applying a non-resonant alternating magnetic field to the soft magnetic probe (probe tip 811), the spring constant of the probe member 81 includes a term that periodically changes over time as shown in Equation (3).
Δk (t) = {q _tip ^dc + q _tip ^ac cos (ω _m t)}
・ [(∂H_DC _SMPL / ∂z)
+ (∂H_AC / ∂z) cos (ω _m t)] (3)
H_DC _SMPL : DC magnetic field generated from sample H_AC: Amplitude of AC magnetic field applied to soft magnetic probe (probe tip 811) q _tip ^ac : AC magnetic charge generated in probe tip 811 by AC magnetic field with amplitude H_AC ( (Hereinafter referred to as “AC magnetic pole”) amplitude q _tip ^dc : DC magnetic charge generated in the probe tip 811 by the DC electric field E_DC _SMPL (hereinafter referred to as “magnetic pole”)

外部から印加する交流磁場Ｈ＿ＡＣが空間的に一様な場合、
｜∂Ｈ＿ＡＣ／∂ｚ｜≪１
となり、Δｋ（ｔ）は、式（４）で表される。
Δｋ（ｔ）≒ｑ_tip ^ac（∂Ｈ＿ＤＣ_SMPL／∂ｚ）ｃｏｓ（ω_mｔ）（４）
ｑ_tip ^acの値は、Ｈ＿ＡＣの値を一定にすることで一定となるので、Δｋ（ｔ）のｃｏｓ（ω_mｔ）で時間変化する成分を検出することで、試料８２の表面の直流磁場の勾配を知ることができる。When the AC magnetic field H_AC applied from the outside is spatially uniform,
｜ ∂H_AC / ∂z ｜ << 1
Thus, Δk (t) is expressed by Equation (4).
Δk (t) ≈q _tip ^ac (∂H_DC _SMPL / ∂z) cos (ω _m t) (4)
Since the value of q _tip ^ac becomes constant when the value of H_AC is made constant, a DC magnetic field on the surface of the sample 82 is detected by detecting a component that changes over time with cos (ω _m t) of Δk (t). You can know the gradient.

ＷＯ２０１３／０４７５３７Ａ１WO2013 / 047537A1

ところで、磁場の発生源である電流や磁気モーメントと、電場の発生源である電荷や電気分極とが共存する、磁場と同時に電場を発生する試料においては、試料の物性や特性測定といった観点から、試料から発生する直流磁場の測定だけでなく、直流電場と直流磁場の同時測定が必要な場合が生じる。
従来、このような要請（電場と磁場の同時測定）に応える技術は提供されていない。By the way, in the sample that generates the electric field at the same time as the magnetic field, the current and magnetic moment that are the magnetic field source and the electric charge and electric polarization that are the electric field source coexist. In addition to the measurement of the DC magnetic field generated from the sample, there are cases where simultaneous measurement of a DC electric field and a DC magnetic field is necessary.
Conventionally, a technology that meets such a requirement (simultaneous measurement of electric and magnetic fields) has not been provided.

本発明の目的は、試料から発生する電場と磁場とを同時に測定することができる電気力／磁気力顕微鏡および電場／磁場同時測定方法を提供することである。 An object of the present invention is to provide an electric force / magnetic force microscope and an electric field / magnetic field simultaneous measurement method capable of simultaneously measuring an electric field and a magnetic field generated from a sample.

本発明では、周波数が異なる交流電場と交流磁場とを、励振しているソフト磁性探針に印加し、ソフト磁性探針の振動を検出する。これにより、試料から発生する電場と磁場とが同時に測定される。 In the present invention, an alternating electric field and an alternating magnetic field having different frequencies are applied to the excited soft magnetic probe to detect the vibration of the soft magnetic probe. Thereby, the electric field and magnetic field which generate | occur | produce from a sample are measured simultaneously.

本発明の構成を、図面を参照しつつ説明する。
〔１〕
図２は、本発明の電気力／磁気力顕微鏡の基本的な実施形態を示す全体図である。
図２において、電気力／磁気力顕微鏡１は、探針部材１１と、探針励振部１２、交流電場印加部１３１と、交流磁場印加部１３２と、交流電場駆動部１４１と、交流磁場駆動部１４２と、探針振動検出部１５と、探針走査部１６と、復調部（信号抽出部）１７と、電場測定部１８１と、磁場測定部１８２とを備えている。
探針部材１１は、その先端に設けられたソフト磁性探針１１２を有する。ソフト磁性探針１１２は、たとえば、表面に導電性のソフト磁性体薄膜が形成された錐形の探針チップからなる。
探針励振部１２は、探針部材１１を励振させることができる。
交流電場印加部１３１は、交流電場（角周波数ω_e，振幅Ｅ＿ＡＣ）を発生し当該交流電場をソフト磁性探針１１２に印加し、交流磁場印加部１３２は、交流磁場（角周波数ω_m，振幅Ｈ＿ＡＣ）を発生し当該交流磁場をソフト磁性探針１１２に印加する。
交流電場駆動部１４１は、交流電場印加部１３１を駆動し、交流磁場駆動部１４２は、交流磁場印加部を駆動する。
探針振動検出部１５は、探針部材１１の振動を検出し、振動検出信号ＶＩＢを生成する。
探針走査部１６は、ソフト磁性探針１１２により試料ＳＭＰＬを走査するために、探針部材１１を空間駆動する。
復調部１７は、振動検出信号ＶＩＢを取得し、試料と前記ソフト磁性探針との間に生じた交流電気力に係る信号および交流磁気力に係る信号を復調する（図２では、これらの信号をＥＦ／ＨＦで示す）。
電場測定部１８１は、復調部１７により復調された交流電気力を用いて、試料ＳＭＰＬから発生する電場Ｅ_SMPL（Ｅ＿ＤＣ_SMPLおよび／またはＥ＿ＡＣ_SMPL）を測定し、磁場測定部１８２は、復調部１７により復調された交流磁気力を用いて、試料ＳＭＰＬから発生する磁場Ｈ_SMPL（Ｈ＿ＤＣ_SMPLおよび／またはＨ＿ＡＣ_SMPL）を測定する。
測定結果は、たとえば測定結果出力部１９により画像出力することができる。The configuration of the present invention will be described with reference to the drawings.
[1]
FIG. 2 is an overall view showing a basic embodiment of the electric / magnetic force microscope of the present invention.
2, the electric force / magnetic force microscope 1 includes a probe member 11, a probe excitation unit 12, an AC electric field application unit 131, an AC magnetic field application unit 132, an AC electric field drive unit 141, and an AC magnetic field drive unit. 142, a probe vibration detection unit 15, a probe scanning unit 16, a demodulation unit (signal extraction unit) 17, an electric field measurement unit 181, and a magnetic field measurement unit 182.
The probe member 11 has a soft magnetic probe 112 provided at the tip thereof. The soft magnetic probe 112 is made of, for example, a cone-shaped probe tip having a conductive soft magnetic thin film formed on the surface thereof.
The probe excitation unit 12 can excite the probe member 11.
The AC electric field applying unit 131 generates an AC electric field (angular frequency ω _e , amplitude E_AC) and applies the AC electric field to the soft magnetic probe 112, and the AC magnetic field applying unit 132 is an AC magnetic field (angular frequency ω _m , amplitude). H_AC) is generated and the AC magnetic field is applied to the soft magnetic probe 112.
The AC electric field driving unit 141 drives the AC electric field applying unit 131, and the AC magnetic field driving unit 142 drives the AC magnetic field applying unit.
The probe vibration detector 15 detects the vibration of the probe member 11 and generates a vibration detection signal VIB.
The probe scanning unit 16 spatially drives the probe member 11 in order to scan the sample SMPL with the soft magnetic probe 112.
The demodulator 17 acquires the vibration detection signal VIB and demodulates the signal related to the AC electric force and the signal related to the AC magnetic force generated between the sample and the soft magnetic probe (in FIG. 2, these signals are demodulated). Is indicated by EF / HF).
The electric field measuring unit 181 measures the electric field E _SMPL (E_DC _SMPL and / or E_AC _SMPL ) generated from the sample SMPL using the AC electric force demodulated by the demodulating unit 17, and the magnetic field measuring unit 182 Is used to measure the magnetic field H _SMPL (H_DC _SMPL and / or H_AC _SMPL ) generated from the sample SMPL.
The measurement result can be output as an image by the measurement result output unit 19, for example.

〔２〕
図３は、本発明の電気力／磁気力顕微鏡の一の実施形態を示す全体図である。
本実施形態の電気力／磁気力顕微鏡１は、試料ＳＭＰＬから発生する時間変化しない直流電場と直流磁場とを同時に測定するために好適である。
本実施形態では、電場測定部１８１’は、交流電気力測定部１８１１と、直流電場測定部１８１２とを備えている。
交流電気力測定部１８１１は、試料ＳＭＰＬとソフト磁性探針１１２との間に生じた交流電気力を測定する。直流電場測定部１８１２は、交流電気力測定部１８１１により測定した交流電気力から、交流電場印加部１３１が印加する交流電場の周波数に等しい周波数成分（図３では角周波数ω_e）を抽出することにより、時間変化しない直流電場Ｅ＿ＤＣ_SMPL（具体的には、試料ＳＭＰＬから発生する直流電場：電場振幅Ｒ_{E_DC}と位相θ_{E_DC}との組、または同相信号Ｘ_{E_DC}と直交信号Ｙ_{E_DC}との組）を測定することができる。
ここで、（Ｒ_{E_DC}，θ_{E_DC}）と（Ｘ_{E_DC}，Ｙ_{E_DC}）との間には、式（５）の関係が成り立つ。
Ｒ_{E_DC}ｅｘｐ（ｉθ_{E_DC}）＝Ｘ_{E_DC}＋ｉＹ_{E_DC} （５）
ここでｉは虚数単位である。[2]
FIG. 3 is an overall view showing one embodiment of the electric / magnetic force microscope of the present invention.
The electric force / magnetic force microscope 1 of this embodiment is suitable for simultaneously measuring a DC electric field and a DC magnetic field that are generated from the sample SMPL and do not change with time.
In the present embodiment, the electric field measurement unit 181 ′ includes an AC electric force measurement unit 1811 and a DC electric field measurement unit 1812.
The AC electric force measurement unit 1811 measures an AC electric force generated between the sample SMPL and the soft magnetic probe 112. The DC electric field measuring unit 1812 extracts a frequency component (angular frequency ω _{e in} FIG. 3) equal to the frequency of the AC electric field applied by the AC electric field applying unit 131 from the AC electric force measured by the AC electric force measuring unit 1811. DC electric field E_DC _SMPL that does not change with time (specifically, DC electric field generated from sample SMPL: a set of electric field amplitude R _{E_DC} and phase θ _{E_DC} or a set of in-phase signal X _{E_DC} and quadrature signal Y _{E_DC} ) Can be measured.
Here, the relationship of Expression (5) is established between (R _{E_DC} , θ _{E_DC} ) and (X _{E_DC} , Y _{E_DC} ).
R _{E_DC} exp (iθ _{E_DC} ) = X _{E_DC} + iY _{E_DC} (5)
Here, i is an imaginary unit.

本実施形態では、磁場測定部１８２’は、交流磁気力測定部１８２１と、直流磁場測定部１８２２とを備えている。
交流磁気力測定部１８２１は、試料ＳＭＰＬとソフト磁性探針１１２との間に生じた交流磁気力を測定する。直流磁場測定部１８２２は、交流磁気力測定部１８２１により測定した交流磁気力から、交流磁場印加部１３２が印加する交流磁場の周波数に等しい周波数成分（図３では角周波数ω_m）を抽出することにより、時間変化しない直流磁場Ｈ＿ＤＣ_SMPL（具体的には、試料ＳＭＰＬから発生する直流磁場：磁場振幅Ｒ_{H_DC}と位相θ_{H_DC}との組、または同相信号Ｘ_{H_DC}と直交信号Ｙ_{H_DC}との組）を測定することができる。
ここで、（Ｒ_{H_DC}，θ_{H_DC}）と（Ｘ_{H_DC}，Ｙ_{H_DC}）との間には、式（６）の関係が成り立つ。
Ｒ_{H_DC}ｅｘｐ（ｉθ_{H_DC}）＝Ｘ_{H_DC}＋ｉＹ_{H_DC} （６）In the present embodiment, the magnetic field measurement unit 182 ′ includes an AC magnetic force measurement unit 1821 and a DC magnetic field measurement unit 1822.
The AC magnetic force measurement unit 1821 measures AC magnetic force generated between the sample SMPL and the soft magnetic probe 112. The DC magnetic field measuring unit 1822 extracts a frequency component (angular frequency ω _{m in} FIG. 3) equal to the frequency of the AC magnetic field applied by the AC magnetic field applying unit 132 from the AC magnetic force measured by the AC magnetic force measuring unit 1821. DC magnetic field H_DC _SMPL that does not change with time (specifically, DC magnetic field generated from sample SMPL: a set of magnetic field amplitude R _{H_DC} and phase θ _{H_DC} or a set of in-phase signal X _{H_DC} and quadrature signal Y _{H_DC} ) Can be measured.
Here, the relationship of Equation (6) is established between (R _{H — DC} , θ _{H — DC} ) and (X _{H — DC} , Y _{H — DC} ).
R _{H_DC} exp (iθ _{H_DC} ) = X _{H_DC} + iY _{H_DC} (6)

〔３〕
図４は、本発明の電気力／磁気力顕微鏡の他の一の実施形態を示す全体図である。
上述した〔２〕の態様では、直流電場測定部１８１２および直流磁場測定部１８２２は、試料ＳＭＰＬから発生する時間変化しない直流電場および直流磁場を測定している。[3]
FIG. 4 is an overall view showing another embodiment of the electric / magnetic force microscope of the present invention.
In the aspect [2] described above, the DC electric field measurement unit 1812 and the DC magnetic field measurement unit 1822 measure the DC electric field and the DC magnetic field that are generated from the sample SMPL and do not change with time.

本実施形態の電気力／磁気力顕微鏡１では、試料ＳＭＰＬから発生する周期的に時間変化する交流電場と交流磁場とを同時に測定することができる。
図４の構成要素は、電場測定部１８１''および磁場測定部１８２''以外は図３に記載の構成要素と概略同じである。
図３では、電場測定部１８１’は交流電気力測定部１８１１と直流電場測定部１８１２とを有しているのに対し、本実施形態では図４に示すように、電場測定部１８１''は交流電気力測定部１８１１と交流電場測定部１８１３とを有している。
また、図３では、磁場測定部１８２’は交流磁気力測定部１８２１と直流磁場測定部１８２２とを有しているのに対し、本実施形態では図４に示すように、磁場測定部１８２''は交流磁気力測定部１８２１と交流磁場測定部１８２３とを有している。In the electric force / magnetic force microscope 1 of the present embodiment, it is possible to simultaneously measure an alternating electric field and an alternating magnetic field which are generated from the sample SMPL and periodically change over time.
The components shown in FIG. 4 are substantially the same as those shown in FIG. 3 except for the electric field measuring unit 181 ″ and the magnetic field measuring unit 182 ″.
In FIG. 3, the electric field measurement unit 181 ′ includes an AC electric force measurement unit 1811 and a DC electric field measurement unit 1812. In the present embodiment, as shown in FIG. An AC electric force measurement unit 1811 and an AC electric field measurement unit 1813 are included.
In FIG. 3, the magnetic field measuring unit 182 ′ includes an AC magnetic force measuring unit 1821 and a DC magnetic field measuring unit 1822. In the present embodiment, as shown in FIG. 4, the magnetic field measuring unit 182 ′. 'Has an AC magnetic force measurement unit 1821 and an AC magnetic field measurement unit 1823.

図４において、交流電場測定部１８１３および交流磁場測定部１８２３は、試料ＳＭＰＬから発生する周期的に時間変化する交流電場Ｅ＿ＡＣ_SMPL（具体的には、電場振幅Ｒ_{E_AC}と位相θ_{E_AC}との組、または同相信号Ｘ_{E_AC}と直交信号Ｙ_{E_AC}との組）および交流磁場Ｈ＿ＡＣ_SMPL（具体的には、磁場振幅Ｒ_{H_AC}と位相θ_{H_AC}との組、または同相信号Ｘ_{H_AC}と直交信号Ｙ_{H_AC}との組）を測定することができる。
ここで、（Ｒ_{E_AC}，θ_{E_AC}）と（Ｘ_{E_AC}，Ｙ_{E_AC}）との間には
Ｒ_{E_AC}ｅｘｐ（ｉθ_{E_AC}）＝Ｘ_{E_AC}＋ｉＹ_{E_AC}
の関係が成り立ち、（Ｒ_{H_AC}，θ_{H_AC}）と（Ｘ_{H_AC}，Ｙ_{H_AC}）との間には
Ｒ_{H_AC}ｅｘｐ（ｉθ_{H_AC}）＝Ｘ_{H_AC}＋ｉＹ_{H_AC}
の関係が成り立つ。
これらの測定量には、通常、高周波成分が含まれる。In FIG. 4, an alternating electric field measuring unit 1813 and an alternating magnetic field measuring unit 1823 are arranged to generate a periodic time-varying alternating electric field E_AC _SMPL generated from a sample _SMPL (specifically, a set of electric field amplitude R _{E_AC} and phase θ _{E_AC} , Or a set of in-phase signal X _{E_AC} and quadrature signal Y _{E_AC} ) and AC magnetic field H_AC _SMPL (specifically, a set of magnetic field amplitude R _{H_AC} and phase θ _{H_AC} or in-phase signal X _{H_AC} and quadrature signal Y _{H_AC} Can be measured.
Here, between (R _{E_AC} , θ _{E_AC} ) and (X _{E_AC} , Y _{E_AC} ), R _{E_AC} exp (iθ _{E_AC} ) = X _{E_AC} + iY _{E_AC}
This relationship holds, and between (R _{H_AC} , θ _{H_AC} ) and (X _{H_AC} , Y _{H_AC} ), R _{H_AC} exp (iθ _{H_AC} ) = X _{H_AC} + iY _{H_AC}
The relationship holds.
These measurement amounts usually include high-frequency components.

交流電場測定部１８１３は、交流電気力測定部１８１１により測定した交流電気力から、交流電場印加部１３１が印加する交流電場の周波数のＮ倍（Ｎは２以上の整数であり、好ましくは２、３等である。）の周波数成分（角周波数Ｎω_e）を抽出することにより、周期的に時間変化する交流電場を測定することができる。
また、交流磁場測定部１８２３は、交流磁気力測定部１８２１により測定した交流磁気力から、交流磁場印加部１３２が印加する交流磁場の周波数のＮ倍（Ｎは２以上の整数であり、好ましくは２、３等である。）の周波数成分（角周波数Ｎω_m）を抽出することにより、周期的に時間変化する交流電場を測定することができる。The AC electric field measuring unit 1813 is N times the frequency of the AC electric field applied by the AC electric field applying unit 131 from the AC electric force measured by the AC electric force measuring unit 1811 (N is an integer of 2 or more, preferably 2, By extracting the frequency component (angular frequency Nω _e ) of 3), it is possible to measure an alternating electric field that periodically changes over time.
The AC magnetic field measuring unit 1823 is N times the frequency of the AC magnetic field applied by the AC magnetic field applying unit 132 from the AC magnetic force measured by the AC magnetic force measuring unit 1821 (N is an integer of 2 or more, preferably By extracting the frequency component (angular frequency Nω _m ) of 2, 3, etc., it is possible to measure an alternating electric field that periodically changes over time.

〔４〕
図５は、本発明の電気力／磁気力顕微鏡のさらに他の一の実施形態を示す全体図である。
本実施形態の電気力／磁気力顕微鏡１では、試料から発生する時間変化しない直流電場と直流磁場、および試料から発生する周期的に時間変化する交流電場と交流磁場を同時に測定することができる。
図５の構成要素は、電場測定部１８１'''および電場測定部１８２'''以外は図３または図４に記載の構成要素と概略同じである。
図３における電場測定部１８１’は交流電気力測定部１８１１と直流電場測定部１８１２とを有しており、図４における電場測定部１８１''は交流電気力測定部１８１１と交流電場測定部１８１３とを有しているのに対し、本実施形態では図５に示すように、電場測定部１８１'''は交流電気力測定部１８１１と直流電場測定部１８１２と交流電場測定部１８１３とを有している。
また、図３における磁場測定部１８２’は交流磁気力測定部１８２１と直流磁場測定部１８２２とを有しており、図４における磁場測定部１８２''は交流磁気力測定部１８２１と交流磁場測定部１８２３とを有しているのに対し、本実施形態では図５に示すように、磁場測定部１８２'''は、交流磁気力測定部１８２１と直流磁場測定部１８２２と交流磁場測定部１８２３とを有している。[4]
FIG. 5 is an overall view showing still another embodiment of the electric / magnetic force microscope of the present invention.
In the electric force / magnetic force microscope 1 of the present embodiment, it is possible to simultaneously measure a DC electric field and a DC magnetic field that are generated from a sample and do not change with time, and an AC electric field and an AC magnetic field that are generated from the sample and change periodically with time.
The components in FIG. 5 are substantially the same as the components described in FIG. 3 or FIG. 4 except for the electric field measurement unit 181 ′ ″ and the electric field measurement unit 182 ′ ″.
3 includes an AC electric force measurement unit 1811 and a DC electric field measurement unit 1812. An electric field measurement unit 181 ″ in FIG. 4 includes an AC electric force measurement unit 1811 and an AC electric field measurement unit 1813. In this embodiment, as shown in FIG. 5, the electric field measuring unit 181 ′ ″ has an AC electric force measuring unit 1811, a DC electric field measuring unit 1812, and an AC electric field measuring unit 1813. doing.
3 has an AC magnetic force measurement unit 1821 and a DC magnetic field measurement unit 1822, and the magnetic field measurement unit 182 ″ in FIG. 4 has an AC magnetic force measurement unit 1821 and an AC magnetic field measurement. In this embodiment, as shown in FIG. 5, the magnetic field measuring unit 182 ′ ″ includes an AC magnetic force measuring unit 1821, a DC magnetic field measuring unit 1822, and an AC magnetic field measuring unit 1823. And have.

図５において、直流電場測定部１８１２及び直流磁場測定部１８２２は、試料ＳＭＰＬから発生する時間変化しない直流電場Ｅ＿ＤＣ_SMPL（電場振幅Ｒ_{E_DC}と位相θ_{E_DC}との組、または同相信号Ｘ_{E_DC}と直交信号Ｙ_{E_DC}との組）および直流磁場Ｈ＿ＤＣ_SMPL（磁場振幅Ｒ_{H_DC}と位相θ_{H_DC}との組、または同相信号Ｘ_{H_DC}と直交信号Ｙ_{H_DC}との組）を測定することができる。
ここで、（Ｒ_{E_DC}，θ_{E_DC}）と（Ｘ_{E_DC}，Ｙ_{E_DC}）との間には、次式が成り立つ。
Ｒ_{E_DC}ｅｘｐ（ｉθ_{E_DC}）＝Ｘ_{E_DC}＋ｉＹ_{E_DC}
また、（Ｒ_{H_DC}，θ_{H_DC}）と（Ｘ_{H_DC}，Ｙ_{H_DC}）との間には次式が成り立つ。
Ｒ_{H_DC}ｅｘｐ（ｉθ_{H_DC}）＝Ｘ_{H_DC}＋ｉＹ_{H_DC} In FIG. 5, a DC electric field measuring unit 1812 and a DC magnetic field measuring unit 1822 are a DC electric field E_DC _SMPL (a set of electric field amplitude R _{E_DC} and phase θ _{E_DC} generated by the sample SMPL or orthogonal to the in-phase signal X _{E_DC.} Signal Y _{E_DC} ) and DC magnetic field H_DC _SMPL (magnetic field amplitude R _{H_DC} and phase θ _{H_DC} or in-phase signal X _{H_DC} and quadrature signal Y _{H_DC} ).
Here, the following equation holds between (R _{E_DC} , θ _{E_DC} ) and (X _{E_DC} , Y _{E_DC} ).
R _{E_DC} exp (iθ _{E_DC} ) = X _{E_DC} + iY _{E_DC}
_Further , the following equation holds between (R _{H_DC} , θ _{H_DC} ) and (X _{H_DC} , Y _{H_DC} ).
R _{H_DC} exp (iθ _{H_DC} ) = X _{H_DC} + iY _{H_DC}

また、図５において、交流電場測定部１８１３及び交流磁場測定部１８２３は、試料ＳＭＰＬから発生する周期的に時間変化する交流電場Ｅ＿ＡＣ_SMPL（電場振幅Ｒ_{E_AC}と位相θ_{E_AC}との組、または同相信号Ｘ_{E_AC}と直交信号Ｙ_{E_AC}との組）および交流磁場Ｈ＿ＡＣ_SMPL（磁場振幅Ｒ_{H_AC}と位相θ_{H_AC}との組、または同相信号Ｘ_{H_AC}と直交信号Ｙ_{H_AC}との組）を測定することができる。
ここで、（Ｒ_{E_AC}，θ_{E_AC}）と（Ｘ_{E_AC}，Ｙ_{E_AC}）との間には、次式が成り立つ。
Ｒ_{E_AC}ｅｘｐ（ｉθ_{E_AC}）＝Ｘ_{E_AC}＋ｉＹ_{E_AC}
また、（Ｒ_{H_AC}，θ_{H_AC}）と（Ｘ_{H_AC}，Ｙ_{H_AC}）との間には、次式が成り立つ。
Ｒ_{H_AC}ｅｘｐ（ｉθ_{H_AC}）＝Ｘ_{H_AC}＋ｉＹ_{H_AC}
これらの測定量には、通常、高周波成分が含まれる。In FIG. 5, an AC electric field measurement unit 1813 and an AC magnetic field measurement unit 1823 are configured to generate an AC electric field E_AC _SMPL (a set of electric field amplitude R _{E_AC} and phase θ _{E_AC} or in-phase generated periodically from the sample SMPL. _{Measuring the} signal X _{E_AC} and the quadrature signal Y _{E_AC} ) and the alternating magnetic field H_AC _SMPL (the magnetic field amplitude R _{H_AC} and the phase θ _{H_AC} or the in-phase signal X _{H_AC} and the quadrature signal Y _{H_AC} ). it can.
Here, the following equation holds between (R _{E_AC} , θ _{E_AC} ) and (X _{E_AC} , Y _{E_AC} ).
R _{E_AC} exp (iθ _{E_AC} ) = X _{E_AC} + iY _{E_AC}
Further, the following equation holds between (R _{H_AC} , θ _{H_AC} ) and (X _{H_AC} , Y _{H_AC} ).
R _{H_AC} exp (iθ _{H_AC} ) = X _{H_AC} + iY _{H_AC}
These measurement amounts usually include high-frequency components.

〔５〕
上記〔１〕〜〔４〕の実施形態において、交流電場印加部が試料に印加する交流電場の周波数ω_eと、交流磁場印加部が試料に印加する交流磁場の周波数ω_mとが、１以上のいかなる整数ｎについてもω_m≠ｎω_eかつｎω_m≠ω_eをみたすことが好ましい。[5]
In the embodiments [1] to [4], the frequency ω _{e of the} AC electric field applied to the sample by the AC electric field applying unit and the frequency ω _{m of the} AC magnetic field applied to the sample by the AC magnetic field applying unit are 1 or more. It is preferable to satisfy ω _m ≠ nω _e and nω _m ≠ ω _e for any integer n.

〔６〕
本発明の電場／磁場同時測定方法では、励振している探針部材の先端に設けたソフト磁性探針（表面に導電性のソフト磁性体薄膜が形成された探針チップからなる）に、周波数が異なる交流電場と交流磁場とを印加し、ソフト磁性探針により試料を走査し、ソフト磁性探針の振動を検出することで、試料から発生する電場と磁場とを同時に測定することができる。
本発明の電場／磁場同時測定方法は、以下のステップを含む。
探針励振ステップ：探針励振部により、探針部材を励振させる。
交流電場／交流磁場印加ステップ：交流電場印加部により交流電場を発生し、当該交流電場をソフト磁性探針に印加するとともに、交流磁場印加部により交流磁場を発生し、当該交流磁場をソフト磁性探針に印加する。
探針振動検出ステップ：探針振動検出部により、探針部材の振動を検出し振動検出信号を生成する。
探針走査ステップ：探針走査部により、探針部材を空間駆動し、ソフト磁性探針により試料を走査する。
復調ステップ：復調部により、振動検出信号を用いて試料とソフト磁性探針との間に生じた交流電気力および交流磁気力を復調（抽出）する。
電場測定ステップ：電場測定部により、復調ステップにおいて復調された交流電気力を用いて、試料から発生する電場を測定する。
磁場測定ステップ：磁場測定部により、復調ステップにおいて復調された交流磁気力を用いて、試料から発生する磁場を測定する。[6]
In the electric field / magnetic field simultaneous measurement method of the present invention, a frequency is applied to a soft magnetic probe (consisting of a probe tip having a conductive soft magnetic thin film formed on the surface) provided at the tip of an excited probe member. By applying an alternating electric field and an alternating magnetic field different from each other, scanning the sample with the soft magnetic probe, and detecting the vibration of the soft magnetic probe, the electric field and magnetic field generated from the sample can be measured simultaneously.
The electric field / magnetic field simultaneous measurement method of the present invention includes the following steps.
Probe excitation step: The probe member is excited by the probe excitation unit.
AC electric field / AC magnetic field applying step: An AC electric field is generated by the AC electric field applying unit, the AC electric field is applied to the soft magnetic probe, an AC magnetic field is generated by the AC magnetic field applying unit, and the AC magnetic field is detected by the soft magnetic probe. Apply to the needle.
Probe vibration detection step: The probe vibration detector detects the vibration of the probe member and generates a vibration detection signal.
Probe scanning step: The probe member is spatially driven by the probe scanning unit, and the sample is scanned by the soft magnetic probe.
Demodulation step: The demodulating unit demodulates (extracts) the AC electric force and AC magnetic force generated between the sample and the soft magnetic probe using the vibration detection signal.
Electric field measurement step: The electric field measurement unit measures the electric field generated from the sample using the AC electric force demodulated in the demodulation step.
Magnetic field measurement step: The magnetic field generated from the sample is measured by the magnetic field measurement unit using the alternating magnetic force demodulated in the demodulation step.

〔７〕
本発明の電場／磁場同時測定方法の一の実施形態では、電場測定ステップは、交流電気力測定ステップと直流電場測定ステップとを含み、磁場測定ステップは、交流磁気力測定ステップと直流磁場測定ステップとを含む。
交流電気力測定ステップ：交流電気力測定部により、試料とソフト磁性探針との間に生じた交流電気力を測定する。
直流電場測定ステップ：直流電場測定部により、交流電気力測定ステップにおいて測定した交流電気力から、交流電場印加ステップにおいて印加された交流電場の周波数に等しい周波数成分を抽出することにより、時間変化しない直流電場を測定する。
交流磁気力測定ステップ：交流磁気力測定部により、試料とソフト磁性探針との間に生じた交流磁気力を測定する。
直流磁場測定ステップ：直流磁場測定部により、交流磁気力測定ステップにおいて測定した交流磁気力から、交流磁場印加ステップにおいて印加された交流磁場の周波数に等しい周波数成分を抽出することにより、時間変化しない直流磁場を測定する。[7]
In one embodiment of the simultaneous electric field / magnetic field measurement method of the present invention, the electric field measurement step includes an AC electric force measurement step and a DC electric field measurement step, and the magnetic field measurement step includes an AC magnetic force measurement step and a DC magnetic field measurement step. Including.
AC electric force measurement step: The AC electric force measurement unit measures the AC electric force generated between the sample and the soft magnetic probe.
DC electric field measurement step: The DC electric field measurement unit extracts a frequency component equal to the frequency of the AC electric field applied in the AC electric field application step from the AC electric force measured in the AC electric force measurement step, thereby preventing DC electric power that does not change with time. Measure the field.
AC magnetic force measurement step: The AC magnetic force measuring unit measures the AC magnetic force generated between the sample and the soft magnetic probe.
DC magnetic field measurement step: The DC magnetic field measurement unit extracts a frequency component equal to the frequency of the alternating magnetic field applied in the alternating magnetic field application step from the alternating magnetic force measured in the alternating magnetic force measurement step, thereby preventing time-varying direct current. Measure the magnetic field.

〔８〕
本発明の電場／磁場同時測定方法の他の一の実施形態では、電場測定ステップは、交流電気力測定ステップと交流電場測定ステップとを含み、磁場測定ステップは、交流磁気力測定ステップと交流磁場測定ステップとを含む。
交流電気力測定ステップ：交流電気力測定部により、試料とソフト磁性探針との間に生じた交流電気力を測定する。
交流電場測定ステップ：交流電場測定部により、交流電気力測定ステップにおいて測定した交流電気力から、交流電場印加ステップにおいて印加された交流電場の周波数のＮ倍（Ｎは２以上の整数であり、好ましくは２、３等である。）の周波数成分（角周波数Ｎω_e）を抽出することにより、周期的に時間変化する交流電場を測定する。
交流磁気力測定ステップ：交流磁気力測定部により、試料とソフト磁性探針との間に生じた交流磁気力を測定する。
交流磁場測定ステップ：交流磁場測定部により、交流電気力測定ステップにおいて測定した交流磁気力から、交流磁場印加ステップにおいて印加された交流磁場の周波数のＮ倍（Ｎは２以上の整数であり、好ましくは２、３等である。）の周波数成分（角周波数Ｎω_e）を抽出することにより、周期的に時間変化する交流磁場を測定する。[8]
In another embodiment of the simultaneous electric field / magnetic field measurement method of the present invention, the electric field measurement step includes an AC electric force measurement step and an AC electric field measurement step, and the magnetic field measurement step includes an AC magnetic force measurement step and an AC magnetic field measurement step. Measuring step.
AC electric force measurement step: The AC electric force measurement unit measures the AC electric force generated between the sample and the soft magnetic probe.
AC electric field measurement step: N times the frequency of the AC electric field applied in the AC electric field application step from the AC electric force measured in the AC electric force measurement step by the AC electric field measurement unit (N is an integer of 2 or more, preferably Is a frequency component (angular frequency Nω _e ) of 2), 3 etc.), and an alternating electric field that periodically changes over time is measured.
AC magnetic force measurement step: The AC magnetic force measuring unit measures the AC magnetic force generated between the sample and the soft magnetic probe.
AC magnetic field measurement step: N times the frequency of the alternating magnetic field applied in the alternating magnetic field application step from the alternating magnetic force measured in the alternating electric force measurement step by the alternating magnetic field measurement unit (N is an integer of 2 or more, preferably Is a frequency component (angular frequency Nω _e ) of 2), 3 etc.), and an alternating magnetic field that changes with time periodically is measured.

〔９〕
本発明の電場／磁場同時測定方法のさらに他の一の実施形態では、電場測定ステップは、交流電気力測定ステップと直流電場測定ステップと交流電場測定ステップとを含み、磁場測定ステップは、交流磁気力測定ステップと直流磁場測定ステップと交流磁場測定ステップを含む。
交流電気力測定ステップ：交流電気力測定部により、試料とソフト磁性探針との間に生じた交流電気力を測定する。
直流電場測定ステップ：直流電場測定部により、交流電気力測定ステップにおいて測定した交流電気力から、交流電場印加ステップにおいて印加された交流電場の周波数に等しい周波数成分を抽出することにより、時間変化しない直流電場を測定する。
交流電場測定ステップ：交流電場測定部により、交流電気力測定ステップにおいて測定した交流電気力から、交流電場印加ステップにおいて印加された交流電場の周波数のＮ倍（Ｎは２以上の整数であり、好ましくは２、３等である。）の周波数成分（角周波数Ｎω_e）を抽出することにより、周期的に時間変化する交流電場を測定する。
交流磁気力測定ステップ：交流磁気力測定部により、試料とソフト磁性探針との間に生じた交流磁気力を測定する。
直流磁場測定ステップ：直流磁場測定部により、交流磁気力測定ステップにおいて測定した交流磁気力から、交流磁場印加ステップにおいて印加された交流磁場の周波数に等しい周波数成分を抽出することにより、時間変化しない直流磁場を測定する。
交流磁場測定ステップ：交流磁場測定部により、交流電気力測定ステップにおいて測定した交流磁気力から、交流磁場印加ステップにおいて印加された交流磁場の周波数のＮ倍（Ｎは２以上の整数であり、好ましくは２、３等である。）の周波数成分（角周波数Ｎω_e）を抽出することにより、周期的に時間変化する交流磁場を測定する。[9]
In still another embodiment of the electric field / magnetic field simultaneous measurement method of the present invention, the electric field measurement step includes an AC electric force measurement step, a DC electric field measurement step, and an AC electric field measurement step, and the magnetic field measurement step includes an AC magnetic field measurement step. A force measurement step, a DC magnetic field measurement step, and an AC magnetic field measurement step.
AC electric force measurement step: The AC electric force measurement unit measures the AC electric force generated between the sample and the soft magnetic probe.
DC electric field measurement step: The DC electric field measurement unit extracts a frequency component equal to the frequency of the AC electric field applied in the AC electric field application step from the AC electric force measured in the AC electric force measurement step, thereby preventing DC electric power that does not change with time. Measure the field.
AC electric field measurement step: N times the frequency of the AC electric field applied in the AC electric field application step from the AC electric force measured in the AC electric force measurement step by the AC electric field measurement unit (N is an integer of 2 or more, preferably Is a frequency component (angular frequency Nω _e ) of 2), 3 etc.), and an alternating electric field that periodically changes over time is measured.
AC magnetic force measurement step: The AC magnetic force measuring unit measures the AC magnetic force generated between the sample and the soft magnetic probe.
DC magnetic field measurement step: The DC magnetic field measurement unit extracts a frequency component equal to the frequency of the alternating magnetic field applied in the alternating magnetic field application step from the alternating magnetic force measured in the alternating magnetic force measurement step, thereby preventing time-varying direct current. Measure the magnetic field.
AC magnetic field measurement step: N times the frequency of the alternating magnetic field applied in the alternating magnetic field application step from the alternating magnetic force measured in the alternating electric force measurement step by the alternating magnetic field measurement unit (N is an integer of 2 or more, preferably Is a frequency component (angular frequency Nω _e ) of 2), 3 etc.), and an alternating magnetic field that changes with time periodically is measured.

〔１０〕
上記〔６〕〜〔９〕の実施形態において、交流電場印加部が試料に印加する交流電場の周波数ω_eと、交流磁場印加部が試料に印加する交流磁場の周波数ω_mとが、１以上のいかなる整数ｎについてもω_m≠ｎω_eかつｎω_m≠ω_eをみたすことが好ましい。[10]
In the above embodiments [6] to [9], the frequency ω _{e of the} AC electric field applied to the sample by the AC electric field applying unit and the frequency ω _{m of the} AC magnetic field applied to the sample by the AC magnetic field applying unit are 1 or more. It is preferable to satisfy ω _m ≠ nω _e and nω _m ≠ ω _e for any integer n.

本発明によれば、試料の表面の電場と磁場とを同時に測定することができる。 According to the present invention, an electric field and a magnetic field on the surface of a sample can be measured simultaneously.

図１（Ａ）は、直流磁場を測定するための磁気力顕微鏡（ＭＦＭ）を示す図である。図１（Ｂ）は、ソフト磁性体のＭ−Ｈ特性の例を示す図である。FIG. 1A is a diagram showing a magnetic force microscope (MFM) for measuring a DC magnetic field. FIG. 1B is a diagram illustrating an example of the MH characteristic of the soft magnetic material. 図２は、本発明の電気力／磁気力顕微鏡の基本的な実施形態を示す全体図である。FIG. 2 is an overall view showing a basic embodiment of the electric / magnetic force microscope of the present invention. 図３は、本発明の電気力／磁気力顕微鏡の一の実施形態を示す全体図である。FIG. 3 is an overall view showing one embodiment of the electric / magnetic force microscope of the present invention. 図４は、本発明の電気力／磁気力顕微鏡の他の一の実施形態を示す全体図である。FIG. 4 is an overall view showing another embodiment of the electric / magnetic force microscope of the present invention. 図５は、本発明の電気力／磁気力顕微鏡のさらに他の一の実施形態を示す全体図である。FIG. 5 is an overall view showing still another embodiment of the electric / magnetic force microscope of the present invention. 図６は本発明の電気力／磁気力顕微鏡の一実施形態を示す説明図である。FIG. 6 is an explanatory view showing an embodiment of the electric force / magnetic force microscope of the present invention. 図７は、外部から印加する交流電場および交流磁場と、試料から発生する電場および磁場との関係を示す図である。FIG. 7 is a diagram showing a relationship between an AC electric field and an AC magnetic field applied from the outside and an electric field and a magnetic field generated from the sample. 図８は、図６に示した電気力／磁気力顕微鏡を用いた電場／磁場同時測定方法の処理を示すフローチャートである。FIG. 8 is a flowchart showing processing of the electric field / magnetic field simultaneous measurement method using the electric force / magnetic force microscope shown in FIG. 図９は、測定結果出力部により出力された画像を示す図である。図９（Ａ）は直流電場測定部の振幅出力から作成した画像である。図９（Ｂ）は直流電場測定部の位相角出力から作成した画像である。図９（Ｃ）は直流磁場測定部の振幅出力から作成した画像である。図９（Ｄ）は直流磁場測定部の位相角出力から作成した画像である。図９（Ｅ）は図９（Ａ）の切断ラインＬ１における直流電場測定部の振幅出力信号を示す図である。図９（Ｆ）は図９（Ｂ）の切断ラインＬ２における直流電場測定部の位相角出力信号を示す図である。図９（Ｇ）は図９（Ｃ）の切断ラインＬ３における直流磁場測定部の振幅出力信号を示す図である。図９（Ｈ）は図９（Ｄ）の切断ラインＬ４における直流磁場測定部の位相角出力信号を示す図である。FIG. 9 is a diagram illustrating an image output by the measurement result output unit. FIG. 9A is an image created from the amplitude output of the DC electric field measurement unit. FIG. 9B is an image created from the phase angle output of the DC electric field measurement unit. FIG. 9C is an image created from the amplitude output of the DC magnetic field measurement unit. FIG. 9D is an image created from the phase angle output of the DC magnetic field measurement unit. FIG. 9 (E) is a diagram showing an amplitude output signal of the DC electric field measurement unit in the cutting line L1 in FIG. 9 (A). FIG. 9F is a diagram showing a phase angle output signal of the DC electric field measurement unit in the cutting line L2 in FIG. 9B. FIG. 9G is a diagram illustrating an amplitude output signal of the DC magnetic field measurement unit in the cutting line L3 in FIG. 9C. FIG. 9H is a diagram showing a phase angle output signal of the DC magnetic field measurement unit in the cutting line L4 in FIG. 9D.

《発明の原理》
本発明の原理を以下に示す。
交流電場（振幅：Ｅ＿ＡＣ）と交流磁場（振幅：Ｈ＿ＡＣ）とを、導電性を有するソフト磁性探針（探針チップ）に、同時に外部から印加する。
これにより、探針チップの先端に、交流変化する電荷（振幅：ｑ_e ^ac）と交流変化する磁極（振幅：ｑ_m ^ac）が発生する。<< Principle of invention >>
The principle of the present invention is shown below.
An alternating electric field (amplitude: E_AC) and an alternating magnetic field (amplitude: H_AC) are simultaneously applied to the soft magnetic probe (probe tip) having conductivity from the outside.
As a result, an alternating charge (amplitude: q _e ^ac ) and an alternating change magnetic pole (amplitude: q _m ^ac ) are generated at the tip of the probe tip.

これらの外部から印加する交流電場と交流磁場により、試料の直流電場の発生源である電荷あるいは電気分極、および試料の直流磁場の発生源である電流あるいは磁気モーメントが変化しない場合には、試料からは直流電場および直流磁場が発生し、交流電場および交流磁場は発生しない。この場合、探針装置（カンチレバー）のバネ定数は、みかけ上変化し、式（７）で与えられる。以下、Δｋ（ｔ）を「みかけ上のバネ定数」と称する。 If the externally applied AC electric field and AC magnetic field do not change the charge or electric polarization that is the source of the sample's DC electric field, and the current or magnetic moment that is the source of the sample's DC magnetic field, Generates a DC electric field and a DC magnetic field, and does not generate an AC electric field and an AC magnetic field. In this case, the spring constant of the probe device (cantilever) apparently changes and is given by equation (7). Hereinafter, Δk (t) is referred to as “apparent spring constant”.

Δｋ（ｔ）＝｛ｑ_e ^dc＋ｑ_e ^acｃｏｓ（ω_eｔ）｝
・［（∂Ｅ＿ＤＣ_SMPL／∂ｚ）
＋（∂Ｅ＿ＡＣ／∂ｚ）ｃｏｓ（ω_eｔ）］
＋｛ｑ_m ^dc＋ｑ_m ^acｃｏｓ（ω_eｔ）｝
・［（∂Ｈ＿ＤＣ_SMPL／∂ｚ）
＋（∂Ｈ＿ＡＣ／∂ｚ）ｃｏｓ（ω_mｔ）］（７）
Ｅ＿ＤＣ_SMPL：試料から発生する直流電場
Ｅ＿ＡＣ：探針チップに印加する交流電場の振幅
ω_e：交流電場Ｅ＿ＡＣの角周波数
ｑ_e ^dc：試料から発生する直流電場Ｅ＿ＤＣ_SMPLにより探針チップに生じた直流電荷
ｑ_e ^ac：交流電場Ｅ＿ＡＣにより探針チップに生じた交流電荷の振幅
Ｈ＿ＤＣ_SMPL：試料から発生する直流磁場
Ｈ＿ＡＣ：探針チップに印加する交流磁場の振幅
ω_e：交流磁場Ｈ＿ＡＣの角周波数
ｑ_m ^dc：試料から発生する直流磁場Ｈ＿ＤＣ_SMPLにより探針チップに生じた直流磁極
ｑ_m ^ac：交流磁場Ｈ＿ＡＣにより探針チップに生じた交流磁極の振幅Δk (t) = {q _e ^dc + q _e ^ac cos (ω _e t)}
・ [(∂E_DC _SMPL / ∂z)
+ (∂E_AC / ∂z) cos (ω _e t)]
+ {Q _m ^dc + q _m ^ac cos (ω _e t)}
・ [(∂H_DC _SMPL / ∂z)
+ (∂H_AC / ∂z) cos (ω _m t)] (7)
E_DC _SMPL : DC electric field generated from the sample E_AC: Amplitude of AC electric field applied to the probe tip ω _e : Angular frequency of AC electric field E_AC q _e ^dc : DC electric field generated on the probe tip by the DC electric field E_DC _SMPL generated from the sample Charge q _e ^ac : Amplitude of AC charge generated in probe tip by AC electric field E_AC H_DC _SMPL : DC magnetic field generated from sample H_AC: Amplitude of AC magnetic field applied to probe tip ω _e : Angular frequency of AC magnetic field H_AC q _m ^dc : DC magnetic pole generated in the probe tip by the DC magnetic field H_DC _SMPL generated from the sample q _m ^ac : Amplitude of the AC magnetic pole generated in the probe tip by the AC magnetic field H_AC

外部から印加する交流電場Ｅ＿ＡＣおよび交流磁場Ｈ＿ＡＣが空間的に一様な場合、次の関係が成立する。
｜∂Ｅ＿ＡＣ／∂ｚ｜≪１
および、
｜∂Ｈ＿ＡＣ／∂ｚ｜≪１
このとき、探針チップの見かけ上のバネ定数Δｋ（ｔ）は、式（８）で与えられる。
Δｋ（ｔ）≒ｑ_e ^ac（∂Ｅ＿ＤＣ_SMPL／∂ｚ）ｃｏｓ（ω_eｔ）
＋ｑ_m ^ac（∂Ｈ＿ＤＣ_SMPL／∂ｚ）ｃｏｓ（ω_mｔ）（８）When the AC electric field E_AC and the AC magnetic field H_AC applied from the outside are spatially uniform, the following relationship is established.
｜ ∂E_AC / ∂z ｜ << 1
and,
｜ ∂H_AC / ∂z ｜ << 1
At this time, the apparent spring constant Δk (t) of the probe tip is given by equation (8).
Δk (t) ≈q _e ^ac (∂E_DC _SMPL / ∂z) cos (ω _e t)
+ Q _m ^ac (∂H_DC _SMPL / ∂z) cos (ω _m t) (8)

したがって、Δｋ（ｔ）のω_e成分（すなわち式（６）の第１項）を検出すれば、（∂Ｅ＿ＤＣ_SMPL／∂ｚ）（すなわち、試料の直流電場の勾配）を求めることができる。
また、Δｋ（ｔ）のω_m成分（すなわち式（６）の第２項）を検出すれば、（∂Ｈ＿ＤＣ_SMPL／∂ｚ）（すなわち、試料の直流磁場の勾配）を求めることができる。Therefore, (∂E_DC _SMPL / すなわち z) (that is, the gradient of the DC electric field of the sample) can be obtained by detecting the ω _e component of Δk (t) (that is, the first term of Equation (6)).
Further, by detecting the ω _m component of Δk (t) (that is, the second term of Expression (6)), (∂H_DC _SMPL / ∂z) (that is, the gradient of the DC magnetic field of the sample) can be obtained.

外部から印加する交流電場と交流磁場により、試料の直流電場の発生源である電荷あるいは電気分極、および試料の直流磁場の発生源である電流あるいは磁気モーメントが変化する場合には、試料からも交流電場と交流磁場が発生する。
以下の説明には、試料から発生する交流電場および交流磁場が、試料に印加する交流電場および交流磁場に対して飽和等で非線形に変化する場合も含まれる。
この場合、試料から発生する交流電場および交流磁場はフーリエ級数で式（９）のように展開できる。
Ｅ＿ＡＣ_SMPL（ｔ）
＝Ｅ＿ＡＣ_SMPL ¹ｃｏｓ（ω_eｔ）
＋Ｅ＿ＡＣ_SMPL ²ｃｏｓ（２ω_eｔ）
＋Ｅ＿ＡＣ_SMPL ³ｃｏｓ（３ω_eｔ）
＋・・・
Ｈ＿ＡＣ_SMPL（ｔ）
＝Ｈ＿ＡＣ_SMPL ¹ｃｏｓ（ω_eｔ）
＋Ｈ＿ＡＣ_SMPL ²ｃｏｓ（２ω_eｔ）
＋Ｈ＿ＡＣ_SMPL ³ｃｏｓ（３ω_eｔ）
＋・・・
（９）When the electric charge or electric polarization that is the source of the DC electric field of the sample and the current or magnetic moment that is the source of the DC magnetic field of the sample change due to the AC electric field and AC magnetic field applied from the outside, the AC also from the sample An electric field and an alternating magnetic field are generated.
The following description includes a case where the AC electric field and AC magnetic field generated from the sample change nonlinearly with saturation or the like with respect to the AC electric field and AC magnetic field applied to the sample.
In this case, the alternating electric field and alternating magnetic field generated from the sample can be expanded as shown in Equation (9) by Fourier series.
E_AC _SMPL (t)
= E_AC _SMPL ¹ cos (ω _e t)
+ E_AC _SMPL ² cos (2ω _e t)
+ E_AC _SMPL ³ cos (3ω _e t)
+ ...
H_AC _SMPL (t)
= H_AC _SMPL ¹ cos (ω _e t)
+ H_AC _SMPL ² cos (2ω _e t)
+ H_AC _SMPL ³ cos (3ω _e t)
+ ...
(9)

このとき、探針チップの見かけ上のバネ定数Δｋ（ｔ）は、式（１０）で与えられる。
Δｋ（ｔ）＝｛ｑ_e ^dc＋ｑ_e ^acｃｏｓ（ω_eｔ）｝
・［（∂Ｅ＿ＤＣ_SMPL／∂ｚ）
＋（∂Ｅ＿ＡＣ／∂ｚ）ｃｏｓ（ω_eｔ）
＋（∂Ｅ＿ＡＣ_SMPL ¹／∂ｚ）ｃｏｓ（ω_eｔ）
＋（∂Ｅ＿ＡＣ_SMPL ²／∂ｚ）ｃｏｓ（２ω_eｔ）
＋（∂Ｅ＿ＡＣ_SMPL ³／∂ｚ）ｃｏｓ（３ω_eｔ）
＋・・・］
＋｛ｑ_m ^ac＋ｑ_m ^acｃｏｓ（ω_mｔ）｝
・［（∂Ｈ＿ＤＣ_SMPL／∂ｚ）
＋（∂Ｈ＿ＡＣ／∂ｚ）ｃｏｓ（ω_mｔ）
＋（∂Ｈ＿ＡＣ_SMPL ¹／∂ｚ）ｃｏｓ（ω_mｔ）
＋（∂Ｈ＿ＡＣ_SMPL ²／∂ｚ）ｃｏｓ（２ω_mｔ）
＋（∂Ｈ＿ＡＣ_SMPL ³／∂ｚ）ｃｏｓ（３ω_mｔ）
＋・・・］（１０）At this time, the apparent spring constant Δk (t) of the probe tip is given by equation (10).
Δk (t) = {q _e ^dc + q _e ^ac cos (ω _e t)}
・ [(∂E_DC _SMPL / ∂z)
+ (∂E_AC / ∂z) cos (ω _e t)
+ (∂E_AC _SMPL ¹ / ∂z) cos (ω _e t)
+ (∂E_AC _SMPL ² / ∂z) cos (2ω _e t)
+ (∂E_AC _SMPL ³ / ∂z) cos (3ω _e t)
+ ...]
+ {Q _m ^ac + q _m ^ac cos (ω _m t)}
・ [(∂H_DC _SMPL / ∂z)
+ (∂H_AC / ∂z) cos (ω _m t)
+ (∂H_AC _SMPL ¹ / ∂z) cos (ω _m t)
+ (∂H_AC _SMPL ² / ∂z) cos (2ω _m t)
+ (∂H_AC _SMPL ³ / ∂z) cos (3ω _m t)
+ ...] (10)

外部から印加する交流電場Ｅ＿ＡＣおよび交流磁場Ｈ＿ＡＣが空間的に一様な場合、式（１１ａ）及び（１１ｂ）の関係が成立する。
｜∂Ｅ＿ＡＣ／∂ｚ｜≪１（１１ａ）
｜∂Ｈ＿ＡＣ／∂ｚ｜≪１（１１ｂ）
このとき、探針チップの見かけ上のバネ定数Δｋ（ｔ）は、式（１２）で与えられる。
Δｋ（ｔ）
≒｛ｑ_e ^ac（∂Ｅ＿ＤＣ_SMPL／∂ｚ）
＋ｑ_e ^dc（∂Ｅ＿ＡＣ_SMPL ¹／∂ｚ）
＋（ｑ_e ^ac／２）（∂Ｅ＿ＡＣ_SMPL ¹／∂ｚ）｝ｃｏｓ（ω_eｔ）
＋｛（ｑ_e ^ac／２）（∂Ｅ＿ＡＣ_SMPL ¹／∂ｚ）
＋ｑ_e ^dc（∂Ｅ＿ＡＣ_SMPL ²／∂ｚ）
＋（ｑ_e ^ac／２）（∂Ｅ＿ＡＣ_SMPL ³／∂ｚ）｝ｃｏｓ（２ω_eｔ）
＋｛（ｑ_e ^ac／２）（∂Ｅ＿ＡＣ_SMPL ²／∂ｚ）
＋（ｑ_e ^dc／２）（∂Ｅ＿ＡＣ_SMPL ³／∂ｚ）｝ｃｏｓ（３ω_eｔ）
＋｛ｑ_m ^ac（∂Ｈ＿ＤＣ_SMPL／∂ｚ）
＋ｑ_m ^dc（∂Ｈ＿ＡＣ_SMPL ¹／∂ｚ）
＋（ｑ_m ^ac／２）（∂Ｈ＿ＡＣ_SMPL ¹／∂ｚ）｝ｃｏｓ（ω_mｔ）
＋｛（ｑ_m ^ac／２）（∂Ｈ＿ＡＣ_SMPL ¹／∂ｚ）
＋ｑ_m ^dc（∂Ｈ＿ＡＣ_SMPL ²／∂ｚ）
＋（ｑ_m ^ac／２）（∂Ｈ＿ＡＣ_SMPL ³／∂ｚ）｝ｃｏｓ（２ω_mｔ）
＋｛（ｑ_m ^ac／２）（∂Ｈ＿ＡＣ_SMPL ²／∂ｚ）
＋（ｑ_m ^dc／２）（∂Ｈ＿ＡＣ_SMPL ³／∂ｚ）｝ｃｏｓ（３ω_mｔ）
＋・・・
（１２）
ここで、電場と磁場とを分離して検出するために、印加する交流磁場の周波数ω_mおよび印加する交流電場の周波数ω_eには、異なる周波数を選択する。好ましくは、印加する交流磁場の周波数ω_mは印加する交流電場の周波数ω_eの整数倍ではなく、且つ、印加する交流電場の周波数ω_eは印加する交流磁場の周波数ω_mの整数倍ではないように、印加する交流磁場の周波数ω_mおよび印加する交流電場の周波数ω_eを選ぶ。すなわち、ω_mおよびω_eを、１以上のいかなる整数ｎについてもω_m≠ｎω_eかつｎω_m≠ω_eを満たすように選ぶ。When the AC electric field E_AC and the AC magnetic field H_AC applied from the outside are spatially uniform, the relationship of Expressions (11a) and (11b) is established.
｜ ∂E_AC / ∂z | << 1 (11a)
｜ ∂H_AC / ∂z | << 1 (11b)
At this time, the apparent spring constant Δk (t) of the probe tip is given by equation (12).
Δk (t)
≒ {q _e ^ac (∂E_DC _SMPL / ∂z)
+ Q _e ^dc (∂E_AC _SMPL ¹ / ∂z)
+ (Q _e ^ac / 2) (∂E_AC _SMPL ¹ / ∂z)} cos (ω _e t)
+ {(Q _e ^ac / 2) (∂E_AC _SMPL ¹ / ∂z)
+ Q _e ^dc (∂E_AC _SMPL ² / ∂z)
+ (Q _e ^ac / 2) (∂E_AC _SMPL ³ / ∂z)} cos (2ω _e t)
+ {(Q _e ^ac / 2) (∂E_AC _SMPL ² / ∂z)
+ (Q _e ^dc / 2) (∂E_AC _SMPL ³ / ∂z)} cos (3ω _e t)
+ {Q _m ^ac (∂H_DC _SMPL / ∂z)
+ Q _m ^dc (∂H_AC _SMPL ¹ / ∂z)
+ (Q _m ^ac / 2) (∂H_AC _SMPL ¹ / ∂z)} cos (ω _m t)
+ {(Q _m ^ac / 2) (∂H_AC _SMPL ¹ / ∂z)
+ Q _m ^dc (∂H_AC _SMPL ² / ∂z)
+ (Q _m ^ac / 2) (∂H_AC _SMPL ³ / ∂z)} cos (2ω _m t)
+ {(Q _m ^ac / 2) (∂H_AC _SMPL ² / ∂z)
+ (Q _m ^dc / 2) (∂H_AC _SMPL ³ / ∂z)} cos (3ω _m t)
+ ...
(12)
Here, in order to detect the electric field and the magnetic field separately, different frequencies are selected as the frequency ω _m of the applied AC magnetic field and the frequency ω _e of the applied AC electric field. Preferably, the frequency omega _m of the alternating magnetic field to be applied is not an integer multiple of the frequency omega _e of the alternating field applied, and the frequency omega _e of the alternating field applied is not an integer multiple of the frequency omega _m of the alternating magnetic field applied Thus, the frequency ω _m of the applied AC magnetic field and the frequency ω _e of the applied AC electric field are selected. That is, ω _m and ω _e are selected so that ω _m ≠ nω _e and nω _m ≠ ω _e for any integer n greater than or equal to 1.

以上より、外部から印加する交流電場と交流磁場により、試料から交流電場と交流磁場が発生する場合には、Δｋ（ｔ）に、２ω_e成分以上の高次項、および２ω_m成分以上の高次項が発生することがわかる。
したがって、Δｋ（ｔ）の２ω_e成分以上の高次項、および２ω_m成分以上の高次項の存在により、試料から発生する交流電場の勾配および交流磁場の勾配の大きさや線形性を評価することができる。なお実際上は、Δｋ（ｔ）のＮω_e成分およびＮω_m成分（いずれもＮは２以上の整数）の強度は、次数Ｎが増大するにつれて急激に減少する。
ただし、試料が強誘電性・強磁性共存物質等の、電気分極と磁気モーメントが相互作用により強く結合している物質の場合には、交流電場（角周波数ω_e）による電気分極の変化と交流磁場（角周波数ω_m）による磁気モーメントの変化が競合し、これらの内、相互作用が強い方の角周波数で、電気分極と磁気モーメントが変化することになる。From the above, when an AC electric field and an AC magnetic field are generated from a sample by an AC electric field and an AC magnetic field applied from the outside, Δk (t) has a higher-order term of 2ω _e component or higher and a higher-order term of 2ω _m component or higher. It turns out that occurs.
Accordingly, it is possible to evaluate the magnitude and linearity of the gradient of the AC electric field generated from the sample and the gradient of the AC magnetic field due to the presence of the higher-order term of Δk (t) higher than the 2ω _e component and the higher-order term higher than 2ω _m component. it can. Incidentally practice, the strength of Enuomega _e component and Enuomega _m components (both N is an integer of 2 or more) of .DELTA.k (t) decreases rapidly as the order N is increased.
However, if the sample is a substance in which electrical polarization and magnetic moment are strongly coupled by interaction, such as a ferroelectric / ferromagnetic coexisting substance, the change in electrical polarization due to the alternating electric field (angular frequency ω _e ) and alternating current Changes in the magnetic moment due to the magnetic field (angular frequency ω _m ) compete, and among these, the electric polarization and the magnetic moment change at the angular frequency with the stronger interaction.

図６は本発明の電気力／磁気力顕微鏡の一実施形態を示す説明図である。
図６において、電気力／磁気力顕微鏡１は、探針部材１１、探針励振部１２、交流電場印加部１３１、交流磁場印加部１３２、交流電場駆動部１４１、交流磁場駆動部１４２、探針振動検出部１５、探針走査部１６、復調部１７、電場測定部１８１、磁場測定部１８２および測定結果出力部１９とを有している。
なお、本実施形態では、探針部材１１、試料ＳＭＰＬ、交流電場印加部１３１、交流磁場印加部１３２等は、説明の便宜上、実際のサイズとは異なるように記載してある。FIG. 6 is an explanatory view showing an embodiment of the electric force / magnetic force microscope of the present invention.
6, the electric force / magnetic force microscope 1 includes a probe member 11, a probe excitation unit 12, an AC electric field application unit 131, an AC magnetic field application unit 132, an AC electric field drive unit 141, an AC magnetic field drive unit 142, and a probe. The vibration detection unit 15, the probe scanning unit 16, the demodulation unit 17, the electric field measurement unit 181, the magnetic field measurement unit 182, and the measurement result output unit 19 are included.
In the present embodiment, the probe member 11, the sample SMPL, the AC electric field application unit 131, the AC magnetic field application unit 132, and the like are described so as to be different from the actual size for convenience of explanation.

探針部材１１は、先端にソフト磁性探針１１２を有している。ソフト磁性探針１１２は、導電性を有するソフト磁性体薄膜が表面に形成された探針チップである。
探針部材１１は、シリコンにより構成されたカンチレバーを母材として作製され、アーム１１１の先端に、表面にソフト磁性体薄膜（後述する、図７の符号１１３参照）が形成された円錐形の探針チップ（ソフト磁性探針１１２）が備えられている。ソフト磁性体薄膜１１３を構成するソフト磁性体としては、たとえば、Ｆｅ−Ｃｏ、Ｆｅ−Ｃｏ−Ｂ、パーマロイ（Ｎｉ−Ｆｅ）、Ｃｏ−Ｚｒ−Ｎｂ等を好ましく採用できる。
探針励振部１２は、探針部材１１を励振させることができる。探針励振部１２は、交流電源１２１と、探針部材１１に振動を与える圧電素子１２２とからなる。The probe member 11 has a soft magnetic probe 112 at the tip. The soft magnetic probe 112 is a probe tip on which a conductive soft magnetic thin film is formed.
The probe member 11 is manufactured using a cantilever made of silicon as a base material, and a conical probe having a soft magnetic thin film (see reference numeral 113 in FIG. A needle tip (soft magnetic probe 112) is provided. As the soft magnetic material constituting the soft magnetic thin film 113, for example, Fe—Co, Fe—Co—B, permalloy (Ni—Fe), Co—Zr—Nb and the like can be preferably employed.
The probe excitation unit 12 can excite the probe member 11. The probe excitation unit 12 includes an AC power source 121 and a piezoelectric element 122 that applies vibration to the probe member 11.

交流電場印加部１３１は、交流電場Ｅ＿ＡＣを発生し、交流電場Ｅ＿ＡＣがソフト磁性探針１１２に印加される。ソフト磁性探針１１２は導電性を有するので、静電誘導によりソフト磁性探針１１２の表面（ソフト磁性体薄膜１１３）に交流電荷が発生する。
交流磁場印加部１３２は、交流磁場Ｈ＿ＡＣを発生し、交流磁場Ｈ＿ＡＣがソフト磁性探針１１２に印加される。ソフト磁性探針１１２はソフト磁性を有するので、ソフト磁性探針１１２の表面に交流磁極が発生する。
交流電場印加部１３１は、板状または薄膜状の電極であり、試料台を兼ねることもできる。電極は、導電性の材料（Ａｌ，Ａｕ，Ｐｔ，Ｔａ等の非磁性体金属、Ｎｉ，Ｃｏ，Ｆｅ，パーマロイ等の高透磁率を有する合金，等の強磁性体金属、あるいはこれらの積層体）から構成することができる。なお、試料ＳＭＰＬが、導電性を有する場合には、試料ＳＭＰＬ自体を電極とすることができる。また，試料ＳＭＰＬが、導電性の下地層を有する場合には、下地層を電極とすることができる。通常、導電性を有するソフト磁性探針１１２は接地されており（後述する図６の「ＧＮＤ」参照）、交流電場印加部１３１とソフト磁性探針１１２間に交流電場が発生する。
交流磁場印加部１３２は、交流電流ＡＣにより駆動される交流コイルからなり、交流電場印加部１３１は、交流磁場印加部１３２の中央に配置することができる。The AC electric field application unit 131 generates an AC electric field E_AC, and the AC electric field E_AC is applied to the soft magnetic probe 112. Since the soft magnetic probe 112 has conductivity, an alternating charge is generated on the surface of the soft magnetic probe 112 (soft magnetic thin film 113) by electrostatic induction.
The AC magnetic field application unit 132 generates an AC magnetic field H_AC, and the AC magnetic field H_AC is applied to the soft magnetic probe 112. Since the soft magnetic probe 112 has soft magnetism, an AC magnetic pole is generated on the surface of the soft magnetic probe 112.
The AC electric field application unit 131 is a plate-like or thin-film electrode, and can also serve as a sample stage. The electrode is made of a conductive material (nonmagnetic metal such as Al, Au, Pt, Ta, etc., ferromagnetic metal such as an alloy having high magnetic permeability such as Ni, Co, Fe, permalloy, or a laminate thereof. ). Note that when the sample SMPL has conductivity, the sample SMPL itself can be used as an electrode. Further, when the sample SMPL has a conductive underlayer, the underlayer can be used as an electrode. Normally, the soft magnetic probe 112 having conductivity is grounded (see “GND” in FIG. 6 described later), and an AC electric field is generated between the AC electric field applying unit 131 and the soft magnetic probe 112.
The AC magnetic field application unit 132 includes an AC coil driven by an AC current AC, and the AC electric field application unit 131 can be disposed at the center of the AC magnetic field application unit 132.

交流電場駆動部１４１は、角周波数ω_eの駆動電圧を出力する交流電源であり交流電場印加部１３１を駆動する。
交流磁場駆動部１４２は、角周波数ω_mの駆動電流を出力する交流電源であり交流磁場印加部１３２を駆動する。
ω_mおよびω_eは互いに異なる周波数である。ω_mおよびω_eは、いかなる自然数ｎ（ｎ≧１）についてもω_m≠ｎω_eかつｎω_m≠ω_eをみたしていることが好ましく、これにより試料から発生する直流磁場の測定に際して電場由来の成分を分離して測定することができ、且つ、試料から発生する直流電場の測定に際して磁場由来の成分を分離して測定することができる。The AC electric field driving unit 141 is an AC power source that outputs a driving voltage having an angular frequency ω _e and drives the AC electric field applying unit 131.
The AC magnetic field driving unit 142 is an AC power source that outputs a driving current having an angular frequency ω _m and drives the AC magnetic field applying unit 132.
ω _m and ω _e are different frequencies. omega _m and omega _e, it is preferable that satisfies even ω _m ≠ nω _e and nω _m ≠ _ω _e for any natural number n (n ≧ 1), thereby the electric field derived for the measurement of the DC magnetic field generated from the sample Can be measured separately, and the component derived from the magnetic field can be separated and measured when measuring the DC electric field generated from the sample.

図７に、交流電場駆動部１４１が発生する交流電場Ｅ＿ＡＣと、交流磁場駆動部１４２が発生する交流磁場Ｈ＿ＡＣと、試料ＳＭＰＬから発生する電場（図７のＥ_SMPL参照）と、試料ＳＭＰＬから発生する磁場（図７のＨ_SMPL参照）との関係を示す。FIG. 7 shows the AC electric field E_AC generated by the AC electric field driving unit 141, the AC magnetic field H_AC generated by the AC magnetic field driving unit 142, the electric field generated from the sample SMPL (see E _{SMPL in} FIG. 7), and the sample SMPL. The relationship with the magnetic field (refer to _{HSMPL in} FIG. 7) is shown.

探針振動検出部１５は、探針部材１１の振動（すなわち、ソフト磁性探針１１２の振動）を検出し振動検出信号ＶＩＢを生成する。
探針振動検出部１５は、レーザ（ＬＳＲ）１５１とフォトディテクタ（ＰＤ）１５２とを有している。ソフト磁性探針１１２の先端上面には反射ミラーが形成されている。ＬＳＲ１５１から出射されたレーザビームＬＢは探針部材１１の先端上面で反射されてＰＤ１５２に入射される。
探針走査部１６は、ソフト磁性探針１１２が試料ＳＭＰＬの表面を走査できるように、探針部材１１を空間駆動（ＸＹ駆動）する。図６では、試料ＳＭＰＬがセットされたステージＳＴＧを移動させることで、ソフト磁性探針１１２により試料ＳＭＰＬの表面を走査する例を示しているが、ソフト磁性探針１１２を試料ＳＭＰＬに対して相対的に移動させることで、ソフト磁性探針１１２により試料ＳＭＰＬの上面を走査することもできる。The probe vibration detection unit 15 detects the vibration of the probe member 11 (that is, the vibration of the soft magnetic probe 112) and generates a vibration detection signal VIB.
The probe vibration detection unit 15 includes a laser (LSR) 151 and a photo detector (PD) 152. A reflection mirror is formed on the top surface of the tip of the soft magnetic probe 112. The laser beam LB emitted from the LSR 151 is reflected by the top surface of the tip of the probe member 11 and enters the PD 152.
The probe scanning unit 16 drives the probe member 11 in space (XY drive) so that the soft magnetic probe 112 can scan the surface of the sample SMPL. FIG. 6 shows an example in which the surface of the sample SMPL is scanned by the soft magnetic probe 112 by moving the stage STG on which the sample SMPL is set, but the soft magnetic probe 112 is relative to the sample SMPL. Therefore, the upper surface of the sample SMPL can be scanned by the soft magnetic probe 112.

復調部１７は、探針振動検出部１５により検出された振動検出信号ＶＩＢを取得し復調信号を出力する。
本実施形態では、振動検出信号ＶＩＢの変調成分の分離にはＰＬＬ（ＰｈａｓｅＬｏｃｋｅｄＬｏｏｐ）回路が使用されている。図６では、復調部１７の出力信号をＥＦ／ＨＦで示す。The demodulator 17 acquires the vibration detection signal VIB detected by the probe vibration detector 15 and outputs a demodulated signal.
In the present embodiment, a PLL (Phase Locked Loop) circuit is used for separating the modulation component of the vibration detection signal VIB. In FIG. 6, the output signal of the demodulator 17 is indicated by EF / HF.

電場測定部１８１は、復調部１７からの復調信号に基づき、試料ＳＭＰＬの表面の電場勾配（電気特性）を測定する。本実施形態では電場測定部１８１はロックインアンプであり、復調信号の強度Ｒ_Eおよび位相θ_Eの組、または復調信号の同相信号Ｘ_Eおよび直交信号Ｙ_Eの組を検出することで、試料ＳＭＰＬの表面の電場勾配（電気特性）を測定することができる。
磁場測定部１８２は、復調部１７からの復調信号に基づき、試料ＳＭＰＬの表面の磁場勾配（磁気特性）を測定する。本実施形態では磁場測定部１８２はロックインアンプであり、復調信号の強度Ｒ_Hおよび位相θ_Hの組、または復調信号の同相信号Ｘ_Hおよび直交信号Ｙ_Hの組を検出することで、試料ＳＭＰＬの表面の磁場勾配（磁気特性）を測定することができる。The electric field measuring unit 181 measures the electric field gradient (electric characteristic) on the surface of the sample SMPL based on the demodulated signal from the demodulating unit 17. In the present embodiment, the electric field measuring unit 181 is a lock-in amplifier, and by detecting a set of the demodulated signal intensity R _E and the phase θ _E or a set of the in-phase signal X _E and the quadrature signal Y _E of the demodulated signal, The electric field gradient (electric property) on the surface of the sample SMPL can be measured.
The magnetic field measurement unit 182 measures the magnetic field gradient (magnetic property) on the surface of the sample SMPL based on the demodulated signal from the demodulation unit 17. Magnetic field measuring unit 182 in the present embodiment is a lock-in amplifier and detecting the set of in-phase signal X _H and the quadrature signal Y _H of the intensity R _H and the phase theta _H sets or demodulated signal, the demodulated signal, The magnetic field gradient (magnetic property) on the surface of the sample SMPL can be measured.

測定結果出力部１９は、電場測定部１８１により測定された電場勾配（電気特性）を画像化することができ、磁場測定部１８２により測定された磁場勾配（磁気特性）を画像化することができる。 The measurement result output unit 19 can image the electric field gradient (electric characteristic) measured by the electric field measurement unit 181, and can image the magnetic field gradient (magnetic characteristic) measured by the magnetic field measurement unit 182. .

以上のように、本実施形態では、電気力／磁気力顕微鏡１は、励振しているソフト磁性探針１１２に、周波数が異なる交流電場Ｅ＿ＡＣと交流磁場Ｈ＿ＡＣとを印加し、ソフト磁性探針１１２により試料ＳＭＰＬの表面を走査し、ソフト磁性探針１１２の振動を検出する。
試料ＳＭＰＬが、交流電場Ｅ＿ＡＣと交流磁場Ｈ＿ＡＣの印加により、交流電場および交流磁場を発生しない場合には、試料ＳＭＰＬの表面の直流電場Ｅ＿ＤＣ_SMPLおよび直流磁場Ｈ＿ＤＣ_SMPLを同時に測定することができる。
また、試料ＳＭＰＬが、交流電場Ｅ＿ＡＣと交流磁場Ｈ＿ＡＣの印加により、交流電場および交流磁場を発生する場合には、試料ＳＭＰＬから発生する交流電場Ｅ＿ＡＣ_SMPLの勾配および交流磁場Ｈ＿ＡＣ_SMPLの勾配の、大きさや線形性も評価することができる。As described above, in the present embodiment, the electric force / magnetic force microscope 1 applies the alternating electric field E_AC and the alternating magnetic field H_AC having different frequencies to the excited soft magnetic probe 112, and the soft magnetic probe 112. By scanning the surface of the sample SMPL, the vibration of the soft magnetic probe 112 is detected.
Sample SMPL is by application of the alternating electric field E_AC the alternating magnetic field H_AC, when not generating an alternating electric field and an AC magnetic field can be measured DC field E_DC _SMPL and DC magnetic field H_DC _SMPL of the surface of the sample SMPL simultaneously.
When the sample SMPL generates an AC electric field and an AC magnetic field by applying the AC electric field E_AC and the AC magnetic field H_AC, the gradient of the AC electric field E_AC _SMPL generated from the sample SMPL and the gradient of the AC magnetic field H_AC _SMPL are large. Sheath linearity can also be evaluated.

図８は、図６に示した電気力／磁気力顕微鏡１を用いた本発明の電場・磁場同時測定方法の処理を示すフローチャートである。 FIG. 8 is a flowchart showing the process of the electric field / magnetic field simultaneous measurement method of the present invention using the electric force / magnetic force microscope 1 shown in FIG.

探針励振ステップＳ１１０：探針励振部１２により、アーム１１１の先端に設けられた導電性を有するソフト磁性探針１１２（導電性を有するソフト磁性体薄膜が表面に形成された探針チップ）を励振させる。 Probe Excitation Step S110: Conductive soft magnetic probe 112 (probe tip having a conductive soft magnetic thin film formed on the surface) provided at the tip of arm 111 by probe excitation unit 12 is used. Excited.

交流電場／交流磁場印加ステップＳ１２０：交流電場印加部１３１および交流磁場印加部１３２により、周波数が異なる交流電場Ｅ＿ＡＣと交流磁場Ｈ＿ＡＣとをソフト磁性探針１１２に印加し、探針部材１１の振動（ソフト磁性探針１１２の振動）に、変調を生じさせる。 AC electric field / AC magnetic field applying step S120: The AC electric field applying unit 131 and the AC magnetic field applying unit 132 apply the AC electric field E_AC and the AC magnetic field H_AC having different frequencies to the soft magnetic probe 112, and the probe member 11 vibrates ( The vibration of the soft magnetic probe 112 is modulated.

探針振動検出ステップＳ１３０：探針部材１１の振動（ソフト磁性探針１１２の振動）を検出し振動検出信号ＶＩＢを生成する。 Probe vibration detection step S130: The vibration of the probe member 11 (vibration of the soft magnetic probe 112) is detected to generate a vibration detection signal VIB.

復調ステップＳ１４０：探針振動検出ステップＳ１３０において検出された振動検出信号ＶＩＢを用いて、試料ＳＭＰＬとソフト磁性探針１１２との間に生じた交流電気力および交流磁気力を復調（抽出）する。 Demodulation step S140: Using the vibration detection signal VIB detected in the probe vibration detection step S130, the AC electric force and AC magnetic force generated between the sample SMPL and the soft magnetic probe 112 are demodulated (extracted).

電場測定ステップ１５１：復調ステップＳ１４０において復調した信号（復調信号）に基づき、試料ＳＭＰＬの表面の電場勾配（電気特性）を測定する。
磁場測定ステップ１５２：復調ステップＳ１４０において復調した信号（復調信号）に基づき、試料ＳＭＰＬの表面の磁場勾配（磁気特性）を測定する。
なお、電場測定ステップ１５１は、交流電気力測定ステップと直流電場測定ステップとを含むことができ、磁場測定ステップ１５２は、交流磁気力測定ステップと直流磁場測定ステップとを含むことができる。
また、電場測定ステップ１５１は、交流電気力測定ステップと交流電場測定ステップとを含むことができ、磁場測定ステップ１５２は、交流磁気力測定ステップと交流磁場測定ステップとを含むことができる。
さらに、電場測定ステップ１５１は、交流電気力測定ステップと直流電場測定ステップと交流電場測定ステップとを含むことができ、磁場測定ステップ１５２は、交流磁気力測定ステップと直流磁場測定ステップと交流磁場測定ステップとを含むことができる。Electric field measurement step 151: Based on the signal (demodulation signal) demodulated in the demodulation step S140, the electric field gradient (electrical characteristic) on the surface of the sample SMPL is measured.
Magnetic field measurement step 152: Based on the signal (demodulation signal) demodulated in the demodulation step S140, the magnetic field gradient (magnetic characteristic) of the surface of the sample SMPL is measured.
The electric field measurement step 151 can include an AC electric force measurement step and a DC electric field measurement step, and the magnetic field measurement step 152 can include an AC magnetic force measurement step and a DC magnetic field measurement step.
The electric field measurement step 151 can include an AC electric force measurement step and an AC electric field measurement step, and the magnetic field measurement step 152 can include an AC magnetic force measurement step and an AC magnetic field measurement step.
Further, the electric field measurement step 151 can include an AC electric force measurement step, a DC electric field measurement step, and an AC electric field measurement step, and the magnetic field measurement step 152 includes an AC magnetic force measurement step, a DC magnetic field measurement step, and an AC magnetic field measurement. Steps.

データ蓄積ステップ１６０：電場測定ステップ１５１および磁場測定ステップ１５２において測定されたデータを、測定結果出力部１９に含まれる記憶装置１９１に記憶する。 Data accumulation step 160: The data measured in the electric field measurement step 151 and the magnetic field measurement step 152 are stored in the storage device 191 included in the measurement result output unit 19.

走査続行判断ステップ１７０：Ｓ１３０〜Ｓ１６０の処理の後、試料ＳＭＰＬの表面の他の場所について、電場勾配（電気特性）および磁場勾配（磁気特性）の測定を行うかを判断する（すなわち、走査を続行するか終了するかを判断する。）。他の場所について測定を行う場合には、処理をＳ１３０に戻し、測定を終了する場合には、処理をＳ１８０に進める。
このようにして、ソフト磁性探針１１２を走査（ＸＹ駆動）して、多数の観察点（観察場所）について電場勾配（電気特性）および磁場勾配（磁気特性）の測定が行われる。Scan Continuation Determination Step 170: After the processing of S130 to S160, it is determined whether to measure the electric field gradient (electric property) and the magnetic field gradient (magnetic property) at other locations on the surface of the sample SMPL (that is, scan is performed). Determine whether to continue or finish.) If measurement is to be performed for another location, the process returns to S130, and if the measurement is to be terminated, the process proceeds to S180.
In this way, the soft magnetic probe 112 is scanned (XY drive), and the electric field gradient (electrical characteristic) and magnetic field gradient (magnetic characteristic) are measured at a large number of observation points (observation places).

測定結果出力ステップ１８０：測定結果出力部１９により、測定された電場勾配（電気特性）および磁場勾配（磁気特性）を画像化して出力する。 Measurement result output step 180: The measurement result output unit 19 images and outputs the measured electric field gradient (electrical characteristic) and magnetic field gradient (magnetic characteristic).

以上のようにして、励振しているソフト磁性探針１１２により試料ＳＭＰＬの表面を走査し、ソフト磁性探針１１２の振動を検出することで、試料ＳＭＰＬの表面の直流電場Ｅ＿ＤＣ_SMPL及び直流磁場Ｈ＿ＤＣ_SMPLを同時に測定すること、交流電場Ｅ＿ＡＣ_SMPL及び交流磁場Ｈ＿ＡＣ_SMPLを同時に測定すること、または、直流電場Ｅ＿ＤＣ_SMPL、直流磁場Ｈ＿ＤＣ_SMPL、交流電場Ｅ＿ＡＣ_SMPL、及び交流磁場Ｈ＿ＡＣ_SMPLを同時に測定することができる。As described above, the surface of the sample SMPL is scanned by the excited soft magnetic probe 112 and the vibration of the soft magnetic probe 112 is detected, so that the DC electric field E_DC _SMPL and the DC magnetic field H_DC on the surface of the sample SMPL are detected. Measuring _SMPL simultaneously, measuring AC electric field E_AC _SMPL and AC magnetic field H_AC _SMPL simultaneously, or measuring DC electric field E_DC _SMPL , DC magnetic field H_DC _SMPL , AC electric field E_AC _SMPL , and AC magnetic field H_AC _SMPL simultaneously it can.

本発明に関する上記説明では、試料ＳＭＰＬに印加する外部磁場が交流磁場Ｈ＿ＡＣである形態の電気力／磁気力顕微鏡１、及びこれを用いた電場／磁場同時測定方法を例示したが、本発明は当該形態に限定されない。例えば、試料から発生する直流磁場によってソフト磁性探針の磁化が飽和するために磁場検出感度が低下し、磁場測定が困難になるような場合には、交流磁場だけでなく、試料から発生する直流磁場とは逆の方向を有する空間的に一様な直流磁場をソフト磁性探針に印加することで、ソフト磁性探針の磁化の飽和を防止する形態の電気力／磁気力顕微鏡および電場／磁場同時測定方法とすることも可能である。 In the above description regarding the present invention, the electric force / magnetic force microscope 1 in the form in which the external magnetic field applied to the sample SMPL is the alternating magnetic field H_AC and the electric field / magnetic field simultaneous measurement method using the electric force / magnetic force microscope 1 are exemplified. The form is not limited. For example, when the magnetic field detection sensitivity is reduced due to saturation of the soft magnetic probe magnetization caused by the DC magnetic field generated from the sample, it becomes difficult to measure the magnetic field. An electric / magnetic force microscope and an electric / magnetic field in a form that prevents saturation of the magnetization of the soft magnetic probe by applying a spatially uniform DC magnetic field having a direction opposite to the magnetic field to the soft magnetic probe. A simultaneous measurement method can also be used.

以下の条件・構成で電気力／磁気力顕微鏡１により、本発明の効果の検証を行った。
試料ＳＭＰＬ：ＳｉＯ₂基板上に、Ｔａ／Ｐｔ／（Ｂｉ_0.6Ｂａ_0.4）ＦｅＯ₃の薄膜を形成した。Ｔａ／Ｐｔが交流電場印加部１３１として機能する。
本試料ＳＭＰＬは、外部からの交流電場および交流磁場の印加により、交流電場および交流磁場を発生させない。したがって本試料ＳＭＰＬにおいては、電場測定部は直流電場測定部として動作し、磁場測定部は直流磁場測定部として動作する。
ソフト磁性探針（探針チップ）１１２：Ｃｏ‐Ｚｒ‐Ｎｂのソフト磁性体を、探針部材１１の先端の円錐形のＳｉＯ₂の表面に、膜厚３０ｎｍで形成することにより構成した。
バイアス電圧Ｖ_BIAS：試料ＳＭＰＬの３×３μｍの領域にＤＣ１２Ｖを与え、走査領域の中央の１×１μｍの領域に−１２Ｖを与えた。これにより、電場書き込みによって長方形領域に電気的分域と磁気的分域（磁区）を形成した。
交流電場Ｅ＿ＡＣ：周波数３００Ｈｚ（ｆ_e）、ピーク間の電圧０．２Ｖ（振幅０．２Ｖ_ｐ−ｐ）の交流電場をソフト磁性探針１１２と交流電場印加部１３１との間に発生させた。
交流磁場Ｈ＿ＡＣ：周波数７８Ｈｚ（ｆ_m）、強度２００Ｏｅの交流磁場を交流磁場印加部１３２から発生させた。
なお、試料の電気分極モーメントおよび磁気モーメントは試料面に垂直方向（上向き、下向き）の成分を有する。The effect of the present invention was verified with the electric force / magnetic force microscope 1 under the following conditions and configuration.
Sample SMPL: A thin film of Ta / Pt / (Bi _0.6 Ba _0.4 ) FeO ₃ was formed on a SiO ₂ substrate. Ta / Pt functions as the AC electric field applying unit 131.
This sample SMPL does not generate an AC electric field and an AC magnetic field by applying an AC electric field and an AC magnetic field from the outside. Therefore, in this sample SMPL, the electric field measurement unit operates as a DC electric field measurement unit, and the magnetic field measurement unit operates as a DC magnetic field measurement unit.
Soft magnetic probe (probe tip) 112: A Co—Zr—Nb soft magnetic material was formed on the surface of the conical SiO ₂ at the tip of the probe member 11 with a film thickness of 30 nm.
Bias voltage V _BIAS : DC12V was applied to the 3 × 3 μm region of the sample SMPL, and −12V was applied to the 1 × 1 μm region in the center of the scanning region. Thereby, an electric domain and a magnetic domain (magnetic domain) were formed in the rectangular area by electric field writing.
AC electric field E_AC: An AC electric field having a frequency of 300 Hz (f _e ) and a peak-to-peak voltage of 0.2 V (amplitude 0.2 V _p-p ) was generated between the soft magnetic probe 112 and the AC electric field applying unit 131.
AC magnetic field H_AC: An AC magnetic field having a frequency of 78 Hz (f _m ) and an intensity of 200 Oe was generated from the AC magnetic field application unit 132.
Note that the electric polarization moment and magnetic moment of the sample have components in the direction perpendicular to the sample surface (upward and downward).

以上の条件・構成の下、探針走査部１６により、３×３μｍの領域を走査し、測定結果出力部１９により画像を作成した。
図９に測定結果出力部１９により出力された画像を示す。
測定結果出力部１９による直流電場Ｅ＿ＤＣ_SMPLの出力結果を図９（Ａ），（Ｂ）に示す。図９（Ａ）は電場測定部１８１の振幅出力から作成した画像であり、図９（Ｂ）は電場測定部１８１の位相角出力から作成した画像である。
測定結果出力部１９による直流磁場Ｈ＿ＤＣ_SMPLの出力結果を図９（Ｃ），（Ｄ）に示す。図９（Ｃ）は磁場測定部１８２の振幅出力から作成した画像であり、図９（Ｄ）は磁場測定部１８２の位相角出力から作成した画像である。
図９（Ｅ）は図９（Ａ）の切断ラインＬ１における電場測定部１８２の振幅出力信号を示す図であり、図９（Ｆ）は図９（Ｂ）の切断ラインＬ２における電場測定部１８１の位相角出力信号を示す図である。
図９（Ｇ）は図９（Ｃ）の切断ラインＬ３における磁場測定部１８２の振幅出力信号を示す図であり、図９（Ｈ）は図９（Ｄ）の切断ラインＬ４における磁場測定部１８２の位相角出力信号を示す図である。Under the above conditions and configuration, the probe scanning unit 16 scanned a 3 × 3 μm region, and the measurement result output unit 19 created an image.
FIG. 9 shows an image output by the measurement result output unit 19.
The output result of the DC electric field E_DC _SMPL by the measurement result output unit 19 is shown in FIGS. 9A is an image created from the amplitude output of the electric field measurement unit 181, and FIG. 9B is an image created from the phase angle output of the electric field measurement unit 181.
The output result of the direct-current magnetic field H_DC _SMPL by the measurement result output unit 19 is shown in FIGS. FIG. 9C is an image created from the amplitude output of the magnetic field measurement unit 182, and FIG. 9D is an image created from the phase angle output of the magnetic field measurement unit 182.
FIG. 9E is a diagram showing an amplitude output signal of the electric field measuring unit 182 in the cutting line L1 in FIG. 9A, and FIG. 9F is an electric field measuring unit 181 in the cutting line L2 in FIG. 9B. It is a figure which shows the phase angle output signal of.
9G is a diagram showing an amplitude output signal of the magnetic field measurement unit 182 in the cutting line L3 in FIG. 9C, and FIG. 9H is a magnetic field measurement unit 182 in the cutting line L4 in FIG. 9D. It is a figure which shows the phase angle output signal of.

図９（Ａ），図９（Ｃ）の強度像、および図９（Ｅ），図９（Ｇ）の振幅出力信号のラインプロファイルでは、書き込み領域の境界で信号強度が極小となっており、書込み領域の境界における場の方向は概ね試料面に対して平行な方向になっていることがわかる。
図９（Ｂ），図９（Ｄ）の位相像、および図９（Ｆ），図９（Ｈ）の位相角出力信号のラインプロファイルでは、書き込み領域の境界で位相が反転（位相角が１８０度変化）しており、場の垂直成分が書込み領域の境界で上向きから下向きに変化していることがわかる。
以上の結果より、本発明によれば、電場と磁場の同時イメージングが実現できていることがわかる。In the intensity images of FIGS. 9A and 9C and the line profile of the amplitude output signal of FIGS. 9E and 9G, the signal intensity is minimal at the boundary of the writing area. It can be seen that the direction of the field at the boundary of the writing region is substantially parallel to the sample surface.
In the phase images of FIGS. 9B and 9D and the line profile of the phase angle output signal of FIGS. 9F and 9H, the phase is inverted at the boundary of the writing area (the phase angle is 180). It can be seen that the vertical component of the field changes from upward to downward at the boundary of the writing area.
From the above results, it can be seen that according to the present invention, simultaneous imaging of an electric field and a magnetic field can be realized.

１電気力／磁気力顕微鏡
１１探針部材
１１１アーム
１１２ソフト磁性探針
１１３ソフト磁性体薄膜
１２探針励振部
１２１交流電源
１２２圧電素子
１３１交流電場印加部
１３２交流磁場印加部
１４１交流電場駆動部
１４２交流磁場駆動部
１５探針振動検出部
１５１ＬＳＲ（レーザ）
１５２ＰＤ（フォトディテクタ）
１６探針走査部
１７復調部
１８１電場測定部
１８１１交流電気力測定部
１８１２直流電場測定部
１８１３交流電場測定部
１８２磁場測定部
１８２１交流磁気力測定部
１８２２直流磁場測定部
１８２３交流磁場測定部
１９測定結果出力部
１９１記憶装置
８１１探針チップ
８２試料
８４コイルDESCRIPTION OF SYMBOLS 1 Electric force / Magnetic force microscope 11 Probe member 111 Arm 112 Soft magnetic probe 113 Soft magnetic thin film 12 Probe excitation part 121 AC power supply 122 Piezoelectric element 131 AC electric field application part 132 AC magnetic field application part 141 AC electric field drive part 142 AC magnetic field drive unit 15 Probe vibration detection unit 151 LSR (laser)
152 PD (Photodetector)
16 Probe scanning unit 17 Demodulating unit 181 Electric field measuring unit 1811 AC electric force measuring unit 1812 DC electric field measuring unit 1813 AC electric field measuring unit 182 Magnetic field measuring unit 1821 AC magnetic force measuring unit 1822 DC magnetic field measuring unit 1823 AC magnetic field measuring unit 19 measurement Result output unit 191 Storage device 811 Probe tip 82 Sample 84 Coil

Claims

An AC electric field and an AC magnetic field having different frequencies are applied to a conductive soft magnetic probe provided at the tip of an excited probe member, the sample is scanned by the soft magnetic probe, and the probe member is vibrated. An electric force / magnetic force microscope that simultaneously measures an electric field and a magnetic field generated from the sample by detecting
The probe member;
A probe exciter for exciting the probe member;
An alternating electric field application unit that generates the alternating electric field and applies the alternating electric field to the soft magnetic probe;
An alternating magnetic field application unit that generates the alternating magnetic field and applies the alternating magnetic field to the soft magnetic probe;
An AC electric field driving unit for driving the AC electric field applying unit;
An alternating magnetic field drive unit for driving the alternating magnetic field application unit;
A probe vibration detector that detects vibration of the probe member and generates a vibration detection signal;
A probe scanning unit that spatially drives the probe member to scan the sample with the soft magnetic probe;
A demodulator that acquires the vibration detection signal and demodulates an alternating current electric force and an alternating magnetic force generated between the sample and the soft magnetic probe;
An electric field measurement unit that measures the electric field generated from the sample using the alternating current electric power demodulated by the demodulation unit;
A magnetic field measurement unit for measuring the magnetic field generated from the sample using the alternating magnetic force demodulated by the demodulation unit;
An electric / magnetic force microscope characterized by comprising:

The electric / magnetic force microscope according to claim 1, for simultaneously measuring a DC electric field and a DC magnetic field generated from a sample which do not change with time,
The electric field measuring unit is
An AC electric force measurement unit that measures the AC electric force generated between the sample and the conductive soft magnetic probe;
By measuring a frequency component equal to the frequency of the AC electric field applied by the AC electric field applying unit from the AC electric force measured by the AC electric force measuring unit, the DC electric field that does not change over time generated from the sample is measured. A direct current electric field measuring unit,
With
The magnetic field measurement unit includes:
An AC magnetic force measurement unit that measures the AC magnetic force generated between the sample and the soft magnetic probe;
The time-varying DC magnetic field generated from the sample is measured by extracting a frequency component equal to the frequency of the AC magnetic field applied by the AC magnetic field application unit from the AC magnetic force measured by the AC magnetic force measurement unit. A direct current magnetic field measurement unit,
An electric / magnetic force microscope characterized by comprising:

The electric / magnetic force microscope according to claim 1, for simultaneously measuring a periodic time-varying alternating electric field and alternating magnetic field generated from a sample,
The electric field measuring unit is
An AC electric force measurement unit that measures the AC electric force generated between the sample and the conductive soft magnetic probe;
By extracting a frequency component more than twice the frequency of the AC electric field applied by the AC electric field applying unit from the AC electric force measured by the AC electric force measuring unit, the time variation generated periodically from the sample is changed. An alternating electric field measuring unit for measuring the alternating electric field;
With
The magnetic field measurement unit includes:
An AC magnetic force measurement unit that measures an AC magnetic force generated between the sample and the soft magnetic probe;
By extracting a frequency component that is twice or more the frequency of the AC magnetic field applied by the AC magnetic field application unit from the AC magnetic force measured by the AC magnetic force measurement unit, the time variation generated periodically from the sample is changed. An alternating magnetic field measurement unit for measuring the alternating magnetic field;
An electric / magnetic force microscope characterized by comprising:

The electric force / magnetic force microscope according to claim 1 for simultaneously measuring a DC electric field and a DC magnetic field generated from a sample that do not change with time, and an AC electric field and an AC magnetic field generated from the sample that change periodically with time. And
The electric field measuring unit is
An AC electric force measurement unit that measures the AC electric force generated between the sample and the conductive soft magnetic probe;
By measuring a frequency component equal to the frequency of the AC electric field applied by the AC electric field applying unit from the AC electric force measured by the AC electric force measuring unit, the DC electric field that does not change over time generated from the sample is measured. A direct current electric field measuring unit,
By extracting a frequency component more than twice the frequency of the AC electric field applied by the AC electric field applying unit from the AC electric force measured by the AC electric force measuring unit, the time variation generated periodically from the sample is changed. An alternating electric field measuring unit for measuring the alternating electric field;
With
The magnetic field measurement unit includes:
An AC magnetic force measurement unit that measures the AC magnetic force generated between the sample and the soft magnetic probe;
The time-varying DC magnetic field generated from the sample is measured by extracting a frequency component equal to the frequency of the AC magnetic field applied by the AC magnetic field application unit from the AC magnetic force measured by the AC magnetic force measurement unit. A direct current magnetic field measurement unit,
By extracting a frequency component that is twice or more the frequency of the AC magnetic field applied by the AC magnetic field application unit from the AC magnetic force measured by the AC magnetic force measurement unit, the time variation generated periodically from the sample is changed. An alternating magnetic field measurement unit for measuring the alternating magnetic field;
An electric / magnetic force microscope characterized by comprising:

The frequency ω _{e of the} AC electric field applied to the sample by the AC electric field applying unit and the frequency ω _{m of the} AC magnetic field applied to the sample by the AC magnetic field applying unit are ω for any integer n of 1 or more. _m ≠ _nω _e and satisfying nω _m ≠ ω _e, electric force / magnetic force microscope according to claim 1.

An AC electric field and an AC magnetic field having different frequencies are applied to a conductive soft magnetic probe provided at the tip of an excited probe member, the sample is scanned by the soft magnetic probe, and the soft magnetic probe is scanned. By simultaneously detecting an electric field and a magnetic field generated from the sample by detecting vibration of the electric field / magnetic field,
A probe excitation step for exciting the probe member by a probe excitation unit;
The alternating electric field application unit generates the alternating electric field, applies the alternating electric field to the soft magnetic probe, and the alternating magnetic field application unit generates the alternating magnetic field, and the alternating magnetic field is applied to the soft magnetic probe. An AC electric field / AC magnetic field applying step to be applied;
A probe vibration detection step for detecting vibration of the probe member and generating a vibration detection signal by a probe vibration detection unit;
A probe scanning step of spatially driving the probe member by a probe scanning unit and scanning the sample with the soft magnetic probe;
Demodulating step of demodulating AC electric force and AC magnetic force generated between the sample and the soft magnetic probe using the vibration detection signal by a demodulator;
An electric field measurement step for measuring the electric field generated from the sample by using the AC electric force demodulated in the demodulation step by an electric field measurement unit;
A magnetic field measurement step for measuring the magnetic field generated from the sample using the AC magnetic force demodulated in the demodulation step by a magnetic field measurement unit;
A method for simultaneous measurement of an electric field / magnetic field, comprising:

The method for simultaneously measuring an electric field / magnetic field according to claim 6 for simultaneously measuring a DC electric field and a DC magnetic field generated from a sample which do not change with time,
The electric field measuring step includes
AC electric force measurement step of measuring the AC electric force generated between the sample and the soft magnetic probe by an AC electric force measuring unit;
Time generated from the sample by extracting a frequency component equal to the frequency of the AC electric field applied in the AC electric field application step from the AC electric force measured in the AC electric force measurement step by a DC electric field measurement unit A DC electric field measurement step for measuring the DC electric field that does not change, and
The magnetic field measuring step includes
AC magnetic force measurement step of measuring the AC magnetic force generated between the sample and the soft magnetic probe by an AC magnetic force measurement unit;
The time generated from the sample by extracting a frequency component equal to the frequency of the alternating magnetic field applied in the alternating magnetic field application step from the alternating magnetic force measured in the alternating magnetic force measurement step by a direct magnetic field measurement unit. DC magnetic field measurement step for measuring the DC magnetic field that does not change;
Having
An electric field / magnetic field simultaneous measurement method characterized by the above.

The method of simultaneously measuring an electric field / magnetic field according to claim 6 for simultaneously measuring a periodic time-varying alternating electric field and alternating magnetic field generated from a sample,
The electric field measuring step includes
AC electric force measurement step of measuring the AC electric force generated between the sample and the soft magnetic probe by an AC electric force measuring unit;
By extracting a frequency component more than twice the frequency of the AC electric field applied in the AC electric field applying step from the AC electric force measured in the AC electric force measuring step by the AC electric field measuring unit, from the sample An alternating electric field measuring step for measuring the alternating electric field generated periodically and time-varying;
Including, and
The magnetic field measuring step includes
AC magnetic force measurement step of measuring the AC magnetic force generated between the sample and the soft magnetic probe by an AC magnetic force measurement unit;
By extracting a frequency component more than twice the frequency of the alternating magnetic field applied in the alternating magnetic field application step from the alternating magnetic force measured in the alternating magnetic force measurement step by the alternating magnetic field measurement unit, from the sample An alternating magnetic field measuring step for measuring the alternating magnetic field generated periodically and time-varying;
An electric field / magnetic field simultaneous measurement method comprising:

The method of simultaneously measuring an electric field / magnetic field according to claim 6 for simultaneously measuring a DC electric field and a DC magnetic field generated from a sample, which do not change with time, and an AC electric field and an AC magnetic field which change with time periodically.
The electric field measuring step includes
AC electric force measurement step of measuring the AC electric force generated between the sample and the soft magnetic probe by an AC electric force measuring unit;
Time generated from the sample by extracting a frequency component equal to the frequency of the AC electric field applied in the AC electric field application step from the AC electric force measured in the AC electric force measurement step by a DC electric field measurement unit A DC electric field measuring step for measuring the DC electric field not changing;
By extracting a frequency component more than twice the frequency of the AC electric field applied in the AC electric field applying step from the AC electric force measured in the AC electric force measuring step by the AC electric field measuring unit, from the sample An alternating electric field measuring step for measuring the alternating electric field generated periodically and time-varying, and
The magnetic field measuring step includes
AC magnetic force measurement step of measuring the AC magnetic force generated between the sample and the soft magnetic probe by an AC magnetic force measurement unit;
The time generated from the sample by extracting a frequency component equal to the frequency of the alternating magnetic field applied in the alternating magnetic field application step from the alternating magnetic force measured in the alternating magnetic force measurement step by a direct magnetic field measurement unit. DC magnetic field measurement step for measuring the DC magnetic field that does not change;
By extracting a frequency component more than twice the frequency of the alternating magnetic field applied in the alternating magnetic field application step from the alternating magnetic force measured in the alternating magnetic force measurement step by the alternating magnetic field measurement unit, from the sample An alternating magnetic field measuring step for measuring the alternating magnetic field generated periodically and time-varying;
An electric field / magnetic field simultaneous measurement method comprising:

The frequency ω _{e of the} AC electric field applied to the sample by the AC electric field applying unit and the frequency ω _{m of the} AC magnetic field applied to the sample by the AC magnetic field applying unit are ω for any integer n of 1 or more. _m satisfies ≠ nω _e and nω _m ≠ ω _e, electric / magnetic field simultaneous measurement method according to any one of claims 6-9.