JP6474695B2 - Particle production equipment - Google Patents

Description

  The present invention relates to a particle manufacturing apparatus that obtains particles used in electronic devices such as phosphors, solar cells, and semiconductors using a spray pyrolysis method.

  Submicron to micron-order fine particles used for phosphors in displays such as cathode ray tubes (CRT), field emission displays (FEDs), and plasma display panels (PDPs) are ultrasonic. It is generally manufactured using a spray flame method. The ultrasonic spray flame method, which is a spray pyrolysis method, is a method developed as a method for producing fine particles that can replace the solid phase method used in industry.

  In the fine particle production apparatus using the ultrasonic spray flame method, an ultrasonic sprayer that sprays a raw material solution to form liquid droplets by using ultrasonic waves to obtain a liquid raw material, a burner that generates a flame, It is generally composed of an electrostatic collector that collects fine particles obtained by introducing liquid droplets into the flame, and a burner is installed above the ultrasonic sprayer. A flame is generated at the upper part of the burner composed of a plurality of cylinders having a coaxial center. As a fine particle manufacturing apparatus having such a configuration, for example, there is a manufacturing apparatus disclosed in Patent Document 1.

  In an ultrasonic atomizer, a raw material solution is sprayed using ultrasonic waves to form a droplet-shaped raw material. The droplet-shaped raw material formed by the ultrasonic atomizer is introduced into the flame with a carrier gas, and the temperature in the flame is controlled to generate fine particles in the flame. Fine particles generated by reaction in the flame of the burner are collected in an electrostatic collector. A gas such as a carrier gas that has risen together with the fine particles generated in the flame is collected in a cooling trap by a suction pump and discharged through the suction pump.

  In order to suppress the particle size distribution in the conventional fine particle manufacturing apparatus having the above-described configuration, the raw material solution is formed into droplets using ultrasonic waves that can form relatively uniform droplets (droplet-shaped raw materials). The method was used. Moreover, it is possible to control the particle diameter of the particles by changing the concentration of the raw material solution.

JP 2005-120283 A

  In the conventional ultrasonic spray flame method, since the raw material in droplet form, which is a raw material solution made into droplets, is directly introduced into the flame to generate fine particles, the process of producing the particles is simplified, but the particles The electrostatic collector that collects the water is indispensable.

  In the conventional fine particle manufacturing apparatus, even if the temperature of the flame was changed, no change in the particle size of the fine particles was observed. However, as the concentration of the raw material solution increased, the particle diameter of the fine particles tended to increase. However, in the conventional fine particle manufacturing apparatus, a raw material solution having a constant concentration and a constant volume is introduced into a batch type ultrasonic sprayer, and the concentration and volume of the raw material solution cannot be changed. There was a problem that continuous production was not possible.

  The present invention has been made to solve the above-described problems. At least one of obtaining an apparatus capable of producing and recovering particles with a relatively simple apparatus configuration and continuously producing particles can be achieved. It aims at obtaining the particle manufacturing apparatus which implement | achieves.

  According to a first aspect of the present invention, there is provided a particle manufacturing apparatus comprising: a raw material solution atomizing mechanism for atomizing a raw material solution in an atomization container to obtain a liquid droplet; and the liquid droplet forming material in a capture space. A particle production capturing mechanism that thermally decomposes to obtain raw material particles, and a raw material conveyance unit that conveys the droplet-shaped raw material toward the particle production capturing mechanism, and the particle production capturing mechanism has the capture space. And a chamber provided so as to introduce the droplet-shaped raw material into the capture space along a horizontal direction, and outside the chamber so as to sandwich the capture space in a vertical direction perpendicular to the horizontal direction. An upper heater and a lower heater provided in the upper and lower portions of the capture space, and a particle collection substrate provided in the lower portion of the capture space in the chamber, and the heating temperature of the upper heater is Of the lower heater It is set higher than the thermal temperature.

  In the particle manufacturing apparatus of the present invention according to claim 1, the droplet-shaped raw material introduced along the horizontal direction into the capture space is thermally decomposed into raw material particles by heat treatment with a partial heater and a lower heater. By depositing on the particle collection substrate provided in the lower part of the capture space, the raw material particles can be generated and captured in the chamber.

  When capturing the raw material particles, the heating temperature of the upper heater is set to be higher than the heating temperature of the lower heater, so that the upward air flow caused by the heating temperature of the lower heater is suppressed, and the raw material is placed on the particle collection substrate without any trouble. Particles can be deposited.

  As a result, since the particle production apparatus of the present invention according to claim 1 can perform the generation and collection of raw material particles in one chamber, it is possible to simplify the apparatus configuration and from the raw material solution. Raw material particles can be obtained.

It is a block diagram which shows typically the structure of the particle manufacturing apparatus which is Embodiment 1 of this invention. It is a block diagram which shows typically the structure of the particle manufacturing apparatus which is Embodiment 2 of this invention. It is a block diagram which shows typically the structure of the particle manufacturing apparatus which is Embodiment 3 of this invention.

<Embodiment 1>
FIG. 1 is a block diagram schematically showing the configuration of a particle production apparatus 100 according to Embodiment 1 of the present invention. The particle manufacturing apparatus 100 of Embodiment 1 has a carrier introduction mechanism 60, a raw material solution atomizing mechanism 50, and a particle manufacturing capturing mechanism 80 as main components.

  The raw material solution atomizing mechanism 50 uses the ultrasonic vibrator 1 that generates ultrasonic waves to atomize the raw material solution 5 charged into the atomizing container 4 into droplets of micrometer size to obtain droplet-shaped raw materials. .

  The particle production capturing mechanism 80 directly produces raw material particles and collects raw material particles in a cubic chamber 7 (chamber) provided with a particle collecting substrate 9 therein.

  The carrier introduction mechanism 60 is a gas supply source necessary for conveying the droplet-shaped raw material obtained by the raw material solution atomizing mechanism 50 into the cubic chamber 7.

  In the raw material solution atomizing mechanism 50 of the particle manufacturing apparatus 100, as the ultrasonic vibrator 1, for example, an ultrasonic frequency in the range of 1.5 to 2.5 MHz can be used. By introducing water 3 into the water tank 2 as a medium for propagation of ultrasonic waves generated by the ultrasonic vibrator 1 into the water tank 2 provided on the ultrasonic vibrator 1 and driving the ultrasonic vibrator 1, The raw material solution 5 charged into 4 is made into droplets to obtain droplet-shaped raw materials which are micrometer-sized droplets.

  By supplying the carrier gas sent from the carrier gas cylinder 16 in the carrier introduction mechanism 60 into the atomization container 4 from the carrier gas introduction line 6, the droplet-shaped raw material sprayed in the internal space of the atomization container 4 is Then, it is carried into a cubic chamber 7 arranged horizontally via a mist supply line 71. That is, the carrier introduction mechanism 60 functions as a raw material transport unit that transports the liquid material generated in the atomization container 4 toward the cubic chamber 7 that is a particle generation unit.

  Droplet-like raw material is introduced in the horizontal direction D7 from the inlet 7i of the cubic chamber 7 through the mist supply line 71 and guided to the internal capture space SP7. The cubic chamber 7 has an upper surface 7u and a bottom surface 7b and two side surfaces along the horizontal direction in order to form a rectangular parallelepiped-shaped capture space SP7, and an inlet 7i connected to the mist supply line 71 and The discharge port 7o connected to the exhaust gas discharge line 72 is provided at an intermediate position between the upper surface 7u and the bottom surface 7b. Thus, the cubic chamber 7 is provided so as to introduce the droplet-shaped raw material into the space between the capture spaces SP7 along the horizontal direction D7.

  Outside the cubic chamber 7, a plate-like ceiling hot plate 8a (upper heater) is provided on the upper surface 7u, and a plate-like floor hot plate 8b (lower heater) is provided on the bottom surface 7b. That is, the hot plate group 8 is configured by the ceiling hot plate 8a and the floor hot plate 8b provided above and below the capture space SP7 so as to sandwich the capture space SP7 in the vertical direction orthogonal to the horizontal direction D7.

  On the other hand, a particle collection substrate 9 is provided on the bottom surface 7 b inside the cubic chamber 7. As described above, the particle manufacturing apparatus 100 according to the first embodiment uses the cubic chamber 7 having the rectangular parallelepiped-shaped capture space SP7 as a capture container in the particle production capture mechanism 80. A particle collection substrate 9 for collecting particles can be installed on the bottom surface 7b.

  Moreover, since each of the ceiling hot plate 8a and the floor hot plate 8b can be configured using a resistance heating element or the like, the temperature in the capture space SP7 of the cubic chamber 7 can be arbitrarily set to 100 depending on the raw material particles to be manufactured. It can be controlled within a range of ˜1000 ° C. The heating temperature of the ceiling hot plate 8a is set higher than the heating temperature of the floor hot plate 8b.

  The carrier gas obtained from the carrier introduction mechanism 60 uses nitrogen gas mainly for the purpose of conveying droplet-shaped raw materials, and the nitrogen carrier gas flow rate is 2 to 10 L / min. Further, hydrogen gas for making a reducing atmosphere or oxygen gas for making an oxidizing atmosphere is mixed according to the target raw material particles.

  In the particle manufacturing apparatus 100 having such a configuration, the cubic particle manufacturing chamber 7 can collect the raw material particles obtained from the droplet-shaped raw material introduced in the horizontal direction D7 on the particle collecting substrate 9.

  Hereinafter, this point will be described in detail. In the trapped material SP7 of the cubic chamber 7, the solvent is evaporated by the heat treatment by the hot plate group 8, the raw material is thermally decomposed to generate raw material particles, and the raw material particles are dropped and trapped. It is collected by depositing on the collecting substrate 9.

  Note that an upward air flow may occur in the capture space SP7 due to the heating temperature of the floor hot plate 8b provided on the bottom surface 7b, but the heating temperature of the ceiling hot plate 8a provided on the upper surface 7u is set to the floor hot plate 8b. By setting the temperature higher than the heating temperature, it is possible to suppress the upward air flow caused by the floor hot plate 8b, and to easily deposit the raw material particles on the particle collection substrate 9.

  Further, the carrier gas containing the pyrolysis product of the raw material and the solvent vapor is processed by the exhaust gas treatment device 10 connected to the exhaust port 7o of the cubic chamber 7 through the exhaust gas exhaust line 72, and then from the exhaust gas output line 19. Released into the atmosphere.

  As described above, in the particle manufacturing apparatus 100 of the first embodiment, the raw material particles are generated in the cubic chamber 7 in which the droplet-shaped raw material is introduced into the capture space SP7, and the collection can be realized together. Separately, the raw material particles can be generated and collected with a relatively simple configuration without using a particle collecting apparatus. As a result, by simplifying the production process of the particles, the production cost of the particles can be reduced, and improvement in operability and maintainability of the particle production apparatus 100 can be expected.

  As described above, in the particle manufacturing apparatus 100 according to the first embodiment, the droplet-shaped raw material introduced into the capture space SP7 of the cubic chamber 7 in the horizontal direction D7 has a reduced flow velocity in the capture space SP7. The raw material particles are thermally decomposed by the heat treatment by the hot plate group 8 and become raw material particles, which are deposited on the particle collecting substrate 9 provided in the lower part of the capturing space SP7, thereby generating and capturing the raw material particles in the cubic chamber 7. It can be carried out.

  When capturing the raw material particles described above, by setting the heating temperature of the ceiling hot plate 8a higher than the heating temperature of the floor hot plate 8b, the upward air flow generated by the heating temperature of the floor hot plate 8b is suppressed and particle collection is performed without any trouble. Raw material particles can be deposited on the substrate 9.

  As a result, the particle production capturing mechanism 80 in the particle production apparatus 100 according to Embodiment 1 can perform the generation and collection of raw material particles in one cubic chamber 7, thereby simplifying the apparatus configuration. The effect that the raw material particles can be obtained from the raw material solution is achieved.

<Embodiment 2>
FIG. 2 is a block diagram schematically showing a configuration of a particle manufacturing apparatus 100B according to Embodiment 2 of the present invention. The particle manufacturing apparatus 100B of the second embodiment includes a carrier introduction mechanism 60, a raw material solution atomizing mechanism 50B, and a particle manufacturing capturing mechanism 80 as main components.

  The raw material solution atomizing mechanism 50B includes a raw material solution supply tank 11, a solvent supply tank 12, a raw material supply line 41, and a solvent supply line 42 in addition to the configuration of the raw material solution atomizing mechanism 50 of the first embodiment. It is a feature. Other configurations (the carrier introduction mechanism 60, the particle production capturing mechanism 80, and the exhaust gas treatment apparatus 10) are the same as those of the particle production apparatus 100 shown in FIG. .

  The raw material solution supply tank 11 has a raw material solution 5 r for the raw material solution 5 therein, and continuously supplies the raw material solution 5 r into the atomization container 4 via the raw material supply line 41. The solvent supply tank 12 has a solvent 5 s for the raw material solution 5 inside, and continuously supplies the solvent 5 s into the atomization container 4 through the solvent supply line 42.

  Thus, the raw material solution atomizing mechanism 50B in the particle manufacturing apparatus 100B of the second embodiment includes the raw material solution supply tank 11 and the raw material supply line 41 as the raw material solution supply unit, and the solvent supply tank 12 and the solvent supply unit as the solvent supply unit. A solvent supply line 42 is provided.

  Therefore, the raw material solution 5r and the solvent 5s can be replenished from the raw material solution supply tank 11 and the solvent supply tank 12 so that the raw material solution 5 in the atomization container 4 is not lost. As a result, the raw material solution atomizing mechanism 50B can continuously generate the raw material in the form of droplets, and the particle manufacturing apparatus 100B can continuously generate the raw material particles.

  Furthermore, the concentration of the raw material solution 5 in the atomization container 4 is set by adjusting the ratio of the raw material solution 5 r supplied from the raw material solution supply tank 11 and the solvent 5 s supplied from the solvent supply tank 12. Therefore, adjustment of the particle diameter of the raw material particles can be realized even during production.

  Hereinafter, examples of adjusting the particle diameter of the raw material particles will be shown. It is generally known that the particle size of the raw material particles has a positive correlation with the concentration of the raw material solution 5.

  The concentration control of the raw material solution 5 in the atomization container 4 can be performed while appropriately changing the supply ratio of the raw material solution 5r and the solvent 5s from the raw material solution supply tank 11 and the solvent supply tank 12. Here, it is assumed that the concentration of the raw material solution 5r in the raw material solution supply tank 11 is set to 1%.

  In order to adjust 100 mL (milliliter) of the raw material solution 5 having a concentration of 1% to a concentration of 0.1%, it is possible to supply 900 mL of the solvent 5s and reduce the concentration of the raw material solution 5 to 1/10.

  Thereafter, in order to raise the raw material solution 5 (1000 mL) adjusted to a concentration of 0.1% to a concentration of 0.5%, the raw material solution in the atomization vessel 4 is supplied by supplying 800 mL of the 1% raw material solution 5r. The concentration of 5 (1800 ml) can be adjusted to 0.5%.

  Actually, since the raw material solution 5 in the atomization container 4 is consumed by the generation of the droplet-shaped raw material, the raw material supplied from the raw material solution supply tank 11 and the solvent supply tank 12 while taking these amounts into consideration. It is necessary to set the supply ratio of the solution 5r and the solvent 5s.

  The consumption flow rate of the raw material solution 5 in the atomization container 4 can be estimated from the carrier gas flow rate supplied from the carrier introduction mechanism 60.

<Embodiment 3>
In the particle manufacturing apparatuses 100 and 100B according to the first and second embodiments described above, the raw material solution 5 put into the atomization container 4 is formed into droplets using the ultrasonic vibrator 1 that generates ultrasonic waves. By transporting the obtained droplet-shaped raw material into the cubic chamber 7 by the carrier gas supplied from the carrier gas cylinder 16 through the carrier gas introduction line 6 into the atomization vessel 4 in the carrier introduction mechanism 60. The case where the raw material particles are simply manufactured has been described.

  FIG. 3 is a block diagram schematically showing the configuration of a particle manufacturing apparatus 100C according to Embodiment 3 of the present invention. The particle manufacturing apparatus 100C of the third embodiment includes a carrier introduction mechanism 60C, a raw material solution atomizing mechanism 50C, a particle manufacturing capturing mechanism 80C, and a particle size control unit 30 as main components.

  In addition to the structure of the carrier introduction mechanism 60 (see FIGS. 1 and 2), the carrier introduction mechanism 60C is provided with a carrier gas flow rate adjusting valve 6b on the carrier gas introduction line 6 whose opening / closing degree is controlled by a control signal C6. The point is different. The carrier introduction mechanism 60C functions as a raw material transport unit that transports the droplet-shaped raw material generated in the atomization container 4 toward the tubular reaction furnace 13 that is a particle generation unit.

  In addition to the configuration of the raw material solution atomizing mechanism 50B (see FIG. 2), the raw material solution atomizing mechanism 50C is a supply flow rate adjusting valve 11b whose opening / closing degree is controlled by control signals C11 and C12 of the raw material solution 5r and the solvent 5s. And the valve 12 b is provided on the raw material supply line 41 and the solvent supply line 42. In addition, in the raw material solution atomizing mechanism 50B of the particle manufacturing apparatus 100B of the second embodiment, valves 11b and 12b are provided for controlling the supply ratio of the raw material solution 5r and the solvent 5s as in the raw material solution atomizing mechanism 50C. Also good.

  The particle production capturing mechanism 80C includes a tubular reaction furnace 13, a particle classifier 14, a fine particle outlet 15, a particle particle size measuring device 17, a particle collector 18, a coarse particle outlet 25, a particle particle size measuring device 27, and a particle collecting device. The device 28 is configured.

  The droplet-shaped raw material sprayed in the internal space of the atomization container 4 is carried into the particle classifier 14 via the mist supply line 22. The tubular reactor 13 is formed in a cylindrical shape so as to cover the outer periphery of the mist supply line 22 in the vicinity of the inlet 14i of the particle classifier 14, and can work equivalent to the flame used in the conventional ultrasonic spray flame method. Perform heat treatment. That is, the tubular reaction furnace 13 functions as a particle generation unit that thermally decomposes the droplet-shaped raw material in the reaction space SP22 in the mist supply line 22 covered with the tubular reaction furnace 13 to obtain raw material particles.

  Accordingly, the droplet-shaped raw material in the reaction space SP22 of the mist supply line 22 is thermally decomposed by the heat treatment by the tubular reaction furnace 13 and is supplied into the particle classifier 14 as raw material particles.

  The particle classifier 14 receives the raw material particles generated in the reaction space SP22 covered with the tubular reactor 13, separates the raw material particles into fine particles and coarse particles, outputs the fine particles from the fine particle outlet 15, and coarse particles are coarsely separated. Output from the particle outlet 25.

  The particle size measuring device 17 (first particle size measuring unit) measures the particle size of the fine particles (first raw material particles which are the raw material particles separated as fine particles) obtained from the fine particle outlet 15 and the fine particle measurement result. After obtaining M17 (first measurement result), fine particles are output to the particle collector 18 via the relay line 37.

  The particle size measuring device 27 (second particle size measuring unit) measures the particle size of coarse particles (second raw material particles which are raw material particles separated as coarse particles) obtained from the coarse particle outlet 25. After obtaining the coarse particle measurement result M27 (second measurement result), the coarse particles are output to the particle collector 28 via the relay line 47.

  The particle classifier 14, the particle size measuring device 17, and the particle size measuring device 27 are realized using existing devices.

  The particle collector 18 (first particle collector) collects fine particles, and the particle collector 28 (second particle collector) collects coarse particles. The particle collectors 18 and 28 are realized using an existing particle collector such as a filter-type collector or a centrifugal collector similar to the electrostatic collector disclosed in Patent Document 1. it can.

  The carrier gas containing the pyrolysis product of the raw material and the solvent vapor is treated by the exhaust gas treatment devices 20 and 30 connected to the particle collectors 18 and 28 via the relay lines 38 and 48, and then the exhaust gas output line. 39 and 49 are released into the atmosphere.

  The particle manufacturing apparatus 100 </ b> C of the third embodiment is characterized by further having a particle size control unit 30. The particle size control unit 30 receives the fine particle measurement result M17 and the coarse particle measurement result M27 from the particle size measurement devices 17 and 27. Then, the exhaust gas treatment device 20 outputs the control signal C6, the control signal C11, and the control signal C12 to the valve 6b, the valve 11b, and the valve 12b based on the fine particle measurement result M17 and the coarse particle measurement result M27. The opening / closing degree of 11b and 12b is controlled.

  Therefore, the particle size control unit 30 controls the flow rate of the droplet-shaped material, which is the capability of conveying the droplet-shaped material by the carrier introduction mechanism 60C, by opening / closing control of the valve 6b, and the raw material solution by controlling the opening / closing of the valve 11b. The supply flow rate of the raw material solution 5r, which is the supply capability of 5r, is controlled, and the supply flow rate of the solvent 5s, which is the supply capability of the solvent 5s, is controlled by opening / closing control of the valve 12b. It has a particle size adjustment function for adjusting to the target particle size.

  As particle size adjustment functions based on the fine particle measurement result M17 and the coarse particle measurement result M27, fine particle particle size priority control emphasizing the fine particle measurement result M17, coarse particle particle size priority control emphasizing the coarse particle measurement result M27, and fine particle measurement. A fine particle / coarse particle equality control and the like that equally emphasize the result M17 and the coarse particle measurement result M27 can be considered.

  For convenience of explanation, the configuration in which the control signals C6, C11, and C12 are output to the valves 6b, 11b, and 12b is shown, but the control signals C6, C11, and C12 are output to the flow rate control devices of the valves 6b, 11b, and 12b, respectively. Of course, the degree of opening and closing of the valves 6b, 11b and 12b may be controlled by the flow rate control device.

  Further, using a method other than the adjustment of the degree of opening / closing of the valves 6b, 11b and 12b, the droplet-form raw material carrying ability (conveying flow rate), the raw material solution 5r feeding ability (feeding flow rate), and the solvent 5s feeding ability (Supply flow rate) may be controlled.

  The carrier introduction mechanism 60C of the particle manufacturing apparatus 100C of the third embodiment is similar to the carrier introduction mechanism 60B in that the raw material solution supply tank 11, the solvent supply tank 12, the raw material supply line 41, and the solvent are the raw material solution supply unit and the solvent supply unit. By providing the supply line 42, as in the particle manufacturing apparatus 100B of the second embodiment, the raw material particles can be continuously generated, and the particle size of the raw material particles can be adjusted even during the manufacturing.

  Further, the third embodiment uses the particle size adjustment function based on the fine particle measurement result M17 and the coarse particle measurement result M27 by the particle size control unit 30, so that the fine particles and coarse particles (first and second particles) can be obtained even during continuous production of raw material particles. It is possible to control the fine particles and coarse particles so as to have target particle size values while actually measuring the particle size of the raw material particles.

  As described above, according to the particle manufacturing apparatus 100C of the third embodiment, the particle classifier 14 separates the particles into fine particles and coarse particles, adjusts the particle size of the raw material particles during continuous particle production, and sets the target particle size. Raw material particles can be obtained. That is, the particle size adjustment function by the particle classifier 14 and the particle size control unit 30 realizes an automatic particle size adjustment system for the raw material particles to be produced, and the raw material particles having a small particle size distribution range and a uniform particle size are produced. Therefore, the added value of the particle manufacturing apparatus can be increased.

  It should be noted that the present invention can be freely combined with each other within the scope of the invention, and each embodiment can be appropriately modified or omitted.

DESCRIPTION OF SYMBOLS 1 Ultrasonic vibrator 4 Atomization container 5,5s Raw material solution 7 Cubic chamber 8a Ceiling hot plate 8b Floor hot plate 9 Particle collection board 11 Raw material solution supply tank 12 Solvent supply tank 13 Tubular reactor 14 Particle classifier 17, 27 Particle size measuring device 18, 28 Particle collector 30 Particle size control unit 50, 50B, 50C Raw material solution atomization mechanism 60, 60C Carrier introduction mechanism 80, 80C Particle production capture mechanism

Claims (2)

A raw material solution atomization mechanism that atomizes the raw material solution in the atomization container to obtain a droplet-shaped raw material;
A particle production capturing mechanism that thermally decomposes the droplet-shaped raw material in a capture space to obtain raw material particles;
A raw material transport unit that transports the droplet-shaped raw material toward the particle production capturing mechanism,
The particle production capture mechanism is:
A chamber having the capture space and provided to introduce the droplet-shaped raw material into the capture space along a horizontal direction;
Outside the chamber, an upper heater and a lower heater provided above and below the capture space so as to sandwich the capture space in a vertical direction perpendicular to the horizontal direction, and inside the chamber, Including a particle collection substrate provided at the bottom,
The heating temperature of the upper heater is set higher than the heating temperature of the lower heater,
Particle production equipment. The particle manufacturing apparatus according to claim 1,
A raw material solution supply unit for supplying the raw material solution to the atomization container;
A solvent supply unit for supplying the solvent for the raw material solution to the atomization container,
Particle production equipment.

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