JP6468478B2 - Imprint mold, imprint method, and method of manufacturing wire grid polarizer - Google Patents

Description

  The present invention relates to an imprint mold, an imprint method, and a method for manufacturing a wire grid polarizer.

  In recent years, a pattern forming technique using an imprint method has attracted attention as a pattern forming technique that replaces the photolithography technique. In the imprint method, for example, an imprint mold having a pattern region including a fine concavo-convex structure (hereinafter referred to as a mold) is used, and the concavo-convex structure is transferred to a molding material to transfer the fine structure at an equal magnification. This is a pattern formation technique (Patent Document 1).

  For example, an imprint method using a photocurable resin composition as a molding material is performed as follows. First, droplets of the photocurable resin composition are supplied to the surface of the transfer substrate. Next, the photocurable resin composition is filled into the concavo-convex structure by bringing a mold having a pattern region including a desired concavo-convex structure and the photocurable resin composition close to or in contact with each other to a predetermined distance. In this state, the resin layer is formed by irradiating light from the mold side to cure the photocurable resin composition. Thereafter, by separating the mold and the resin layer, a pattern structure having a concavo-convex structure (concavo-convex pattern) in which the concavo-convex structure in the pattern region of the mold is inverted is formed. Thereafter, the transfer substrate may be etched using such a pattern structure as an etching resist.

  An imprint method using such an imprint mold is expected to be employed in the manufacture of various products. For example, a wire grid polarizer can be mentioned as a product that can be manufactured by the imprint method.

  The wire grid polarizer is provided with a plurality of fine metal wires in parallel and is used for photo-alignment processing (Patent Document 2). For example, in Patent Document 3, a polarizing element unit is configured by arranging a plurality of wire grid polarizers in a holding frame so that fine metal wires are aligned in one direction, and the polarizing element unit is irradiated with ultraviolet rays. It is disclosed that a photo-alignment treatment is performed by giving anisotropy by irradiating a curable resin composition with emitted linearly polarized light. Such a wire grid polarizer can be used for various applications such as a member for improving the luminance of a display in addition to the photo-alignment treatment.

JP 2013-175671 A JP 2009-265290 A JP 2012-203294 A

  By the way, in imprint using a mold that does not have flexibility, it is required that the mold and the transfer substrate be kept parallel in order to make the residual film thickness in the resin layer separated from the mold uniform. . However, when the area of such a mold that does not have flexibility is increased, a large peeling stress acts upon separation from the resin layer, so that it is difficult to release the mold without causing a defect in the pattern. For this reason, there was a limit to increasing the area of the imprint mold that does not have flexibility.

  On the other hand, as an imprint method, so-called roller imprint is also known. In this roller imprint, a mold is formed by forming a pattern region including a fine concavo-convex structure on a flexible substrate, and the mold is formed with a roller from the back surface (the surface where the concavo-convex structure is not formed) of the mold. For example, a mold is brought into contact with a resin composition such as an etching resist, the resin composition is cured after the contact, and then the resin layer cured with the resin composition is released from the mold. It is. When such a roller imprint is employed, the area can be easily increased as compared with an imprint method using a non-flexible mold.

  By the way, the conventional mold used in the roller imprint as described above is generally composed of a flexible base material and a resin layer provided on one surface of the base material to form a pattern region. It is configured. Thereby, the conventional mold is ensured in flexibility and can be easily bent when pressed by a roller.

  However, the inventor of the present invention is prone to deformation such as tilt and waviness due to the flexibility of the conventional mold, and when such deformation occurs, the film thickness is locally localized in the resin composition in contact with the mold. It has been found that a defect region that becomes thinner is more likely to occur.

  Such a defective area is assumed to be caused by the following phenomenon.

  First, when the mold and the resin composition are brought into contact with each other, the resin composition flows. Due to the influence of such a flow, the mold is inclined so as to be recessed toward the resin composition side, or undulation is generated. And when such inclination and a wave | undulation arise, a pressure nonuniformity arises between a mold and a resin composition, a space | gap arises in the area | region where a pressure is low, and the film thickness of a resin composition becomes non-uniform | heterogenous. As a result, it is presumed that a defective region having a locally thin film thickness occurs in the resin composition.

  In addition, the flow of the resin composition exists in a position where the resin composition is drawn into a concave portion in the concave-convex structure of the mold by a capillary phenomenon, or in a position facing the convex portion with the resin composition existing in a position facing the concave portion of the concave-convex structure. It is considered that the difference occurs in volume density between the resin composition and the resin composition. Moreover, it is thought that it generate | occur | produces because the difference in volume density arises between the resin composition which exists in the position facing the uneven structure of a mold, and the resin composition which exists in the area | region (non-pattern area | region) of the outer side.

  When such a defective region occurs, not only a defect occurs in the resin composition, but also a formed product formed thereafter may have a defect. For example, the resin composition is an etching resist (hereinafter referred to as a resist) for forming a mask, and when the above-described defect region is formed in the resist, the formed product after etching the resist Also defects can occur. Specifically, for example, when a defect region such as that described above occurs in the manufacture of a wire grid polarizer by roller imprinting, defects may also occur in the wire grid polarizer formed after etching. There is a risk of quality degradation.

  The present invention has been made in consideration of the above circumstances, and its purpose is to form a defect region on a molding material that is in contact with a pattern region of an imprint mold by deformation due to the flexibility of the mold. An object of the present invention is to provide an imprint mold, an imprint method, and a method of manufacturing a wire grid polarizer that can prevent the occurrence of the above.

  The present invention provides an imprint mold having a pattern region and a non-pattern region, comprising: a flexible base material; and a resin layer that is provided on one surface of the base material and forms the pattern region. The substrate includes at least a portion corresponding to the pattern region, and a pair of substrate bodies, and an adhesive layer that is interposed between the substrate bodies and functions as an elastic layer. A printing mold.

  In the imprint mold of the present invention, the base material may be composed of one base material body of the pair of base material bodies corresponding to the non-pattern region.

  In the imprint mold of the present invention, the adhesive layer may have a thickness of 50 μm to 200 μm.

  In the imprint mold of the present invention, the adhesive layer may be formed of a material containing an epoxy resin composition.

  In addition, the present invention is an imprint mold having a pattern region and a non-pattern region, and a flexible base material and a resin that is provided on one surface of the base material and forms the pattern region An imprint in which at least a portion corresponding to the pattern region includes a pair of base body bodies and an adhesive layer that functions as an elastic layer. A preparatory step for preparing a mold for the transfer, and pressurizing the pattern area of the imprint mold with a roller from the surface of the substrate opposite to the surface on which the resin layer is provided. A contact step of contacting the molding material located on one surface of the pattern, and a pattern corresponding to the pattern region by curing the molding material brought into contact with the imprint mold And a mold release step for placing the pattern structure as the transfer layer on the transfer substrate by separating the transfer layer and the imprint mold from each other. And an imprint method characterized by comprising:

  In addition, the present invention is an imprint mold having a pattern region and a non-pattern region, and a flexible base material and a resin that is provided on one surface of the base material and forms the pattern region An imprint in which at least a portion corresponding to the pattern region includes a pair of base body bodies and an adhesive layer that functions as an elastic layer. A preparatory step of preparing a mold for molding, and pressing the pattern area of the imprint mold with a roller from the surface of the substrate opposite to the surface on which the resin layer is provided. A contact step of contacting a transparent substrate having a wire grid material layer on the surface with an etching resist layer positioned on the wire grid material layer, and contacting with the imprint mold A curing step of curing the etching resist layer to form a resist pattern layer to which a pattern corresponding to the pattern region has been transferred, a release step of separating the resist pattern layer and the imprint mold, and the resist pattern Etching the wire grid material layer using the layer as an etching mask to form a wire grid, and a method for manufacturing a wire grid polarizer.

  ADVANTAGE OF THE INVENTION According to this invention, it can prevent that a defect area | region arises in the to-be-molded material contacted with the pattern area | region of the mold for imprints by the deformation | transformation resulting from the flexibility of the said mold.

It is a top view of the mold for imprint concerning the 1st Embodiment of this invention. It is sectional drawing which follows the II-II line | wire of FIG. It is process drawing of the imprint method concerning 1st Embodiment. It is process drawing of the imprint method concerning 1st Embodiment. It is sectional drawing which follows the VV line of FIG. 4 (B). It is a figure explaining the effect of 1st Embodiment. It is a top view of the wire grid polarizer manufactured using the mold for imprint concerning a 1st embodiment. It is process drawing of the manufacturing method of the wire grid polarizer manufactured using the mold for imprint concerning 1st Embodiment. It is a figure explaining the mold for imprint concerning the 2nd Embodiment of this invention. It is a top view of the mold for imprint concerning the 3rd Embodiment of this invention.

  Embodiments of the present invention will be described below with reference to the drawings. Drawing is an illustration and may exaggerate a characteristic part for explanation, and may differ from an actual thing. In the following drawings, the same parts are denoted by the same reference numerals.

(First embodiment)
FIG. 1 is a plan view of an imprint mold 11 according to the first embodiment of the present invention, and FIG. 2 is a cross-sectional view taken along line II-II in FIG. This imprint mold 11 is used for roller imprint. First, the imprint mold 11 according to the first embodiment will be described with reference to FIGS. 1 and 2.

[Imprint mold]
As shown in FIGS. 1 and 2, the imprint mold 11 according to the present embodiment includes a pattern region 11P and a non-pattern region 11N. In FIG. 1, a rectangle S indicated by a two-dot chain line indicates a boundary between the pattern region 11P and the non-pattern region 11N. In the illustrated example, a region inside the rectangle S is the pattern region 11P, and the rectangle S The region outside the non-pattern region 11N.

  The imprint mold 11 includes a flexible base 12 and a resin layer 13 provided on one surface 12a of the base 12. In the illustrated example, the base 12 and Both resin layers 13 are formed in a rectangular shape in plan view. As is apparent from FIGS. 1 and 2, in the present embodiment, a portion of the resin layer 13 located inside the above-described rectangle S forms a rectangular pattern region 11P. On the other hand, a rectangular frame-shaped peripheral portion located outside the above-described rectangle S in the resin layer 13 and a portion located outside the resin layer 13 in the substrate 12 are the above-described non-pattern region 11N. Is forming. In addition, in this Embodiment, although the base material 12, the resin layer 13, and the pattern area | region 11P are formed in the rectangle by planar view, these may be formed in another shape.

  A pattern region 11P formed by the resin layer 13 is brought into contact with a molding material 103 (see FIGS. 3 and 4) positioned on one surface 101a of the transfer substrate 101 described later, and the pattern is transferred to the molding material 103. This is a region including the pattern portion 15 to be processed. On the other hand, the non-pattern region 11N means a region that does not have a shape corresponding to the pattern transferred to the molding material 103.

  In FIG. 1, the resin layer 13 includes a region Z1 including a part of a peripheral portion forming the non-pattern region 11N located on the outer peripheral side and a portion forming the pattern region 11P in the resin layer 13, and a pattern in the resin layer 13. A region Z2 including only a portion forming the region 11P is shown enlarged. As shown in these regions Z1, Z2 and FIG. 2, in the present embodiment, a pattern portion 15 configured by arranging a plurality of line-shaped convex patterns 15L via a desired space is positioned in the pattern region 11P. doing. In the illustrated example, a line-shaped convex pattern 15L extending in the direction indicated by the arrow A in FIG. 1 is formed over the entire pattern region 11P. On the other hand, the surrounding part 16 surrounding the pattern part 15 is located in the peripheral part which is the non-pattern area 11N in the resin layer 13. In the regions Z1 and Z2 in FIG. 1, the surfaces of the convex pattern 15L and the surrounding portion 16 are indicated by hatching. In the present embodiment, the pattern portion 15 is configured by arranging a plurality of line-shaped convex patterns 15L via a desired space, but the pattern portion 15 is arranged in a mesh pattern, for example. It may be configured such as being configured.

  The line width Wa of the convex pattern 15L can be set as appropriate according to the purpose of use of the imprint mold 11, and the width of the space located between the convex patterns 15L can also be set as appropriate. Further, the thickness (height) of the convex pattern 15L and the thickness (height) of the surrounding portion 16 may be substantially the same or different.

  The resin layer 13 is, for example, a photocurable resin composition or a thermosetting resin composition, and the pattern portion 15 in the resin layer 13 is imprinted by a mold having an uneven structure corresponding to the pattern portion 15. It is formed by that. Since the pattern portion 15 can be formed by imprinting by a conventionally known imprinting method, detailed description thereof is omitted.

  On the other hand, as shown in FIG. 2, the base material 12 of the present embodiment includes a pair of base material bodies 21 and 22 and an adhesive layer 23 that is interposed between the base material bodies 21 and 22 and functions as an elastic layer. ,have. In the illustrated example, one surface 12 a on which the resin layer 13 is provided in the substrate 12 is set on the surface of the substrate body 21 opposite to the surface facing the adhesive layer 23 side. Here, in the present embodiment, the resin layer 13 is directly provided (laminated) on the one surface 12a set in the base body 21, but the resin layer 13 is provided via the intermediate layer. May be.

  In the present embodiment, each of the substrate main bodies 21 and 22 and the adhesive layer 23 is rectangular in plan view, has the same dimensions, and the entire substrate 12 has a three-layer structure. However, the substrate 12 may have a multilayer structure of four or more layers. In the illustrated example, the entire substrate 12 has a three-layer structure (multilayer structure), but a part of the substrate 12 may be a single layer. In this case, at least a portion corresponding to the pattern region 11P or the resin layer 13 is formed in a three-layer structure (multilayer structure). An example of such an aspect will be described in detail in the second embodiment.

  The imprint mold 11 according to the present embodiment has flexibility that can be used for roller imprinting, and the base bodies 21 and 22 and the adhesive layer 23 are made of materials and thicknesses so as to have desired flexibility. Is selected. Further, in the present embodiment, while having flexibility that can be used for roller imprinting, elasticity (rigidity) that prevents undesired deformation of the imprint mold 11 during imprinting is ensured. Material and thickness are selected. Furthermore, in this embodiment, since a photocurable resin composition is used as a molding material to be described later in roller imprinting, light that can transmit light, such as ultraviolet rays, is used as the substrate main bodies 21 and 22 and the adhesive layer 23. It is preferable that a material having permeability is selected.

  In addition, the above-mentioned light transmittance means that the light transmittance in the wavelength 200-400 nm is 50% or more, Preferably it is 70% or more. The light transmittance can be measured using V-650 manufactured by JASCO Corporation. In addition, when using a thermosetting resin composition as a molding material in roller imprinting, light transmittance is not particularly required.

  And in this Embodiment, the base-material main bodies 21 and 22 consist of polyethylene terephthalate (PET) which is excellent in an optical characteristic as an example. In addition, as a material of the base-material main bodies 21 and 22, as long as it has flexibility, transparent flexible materials, such as another transparent resin film and thin plate glass, can also be used. Moreover, when light transmittance is not requested | required, transparent flexible materials, such as a colored resin film and a colored thin plate glass, can also be used.

  The thicknesses of the substrate bodies 21 and 22 are preferably 50 μm or more and 200 μm or less in consideration of flexibility, elasticity, and light transmittance. The substrate body 21 and the base body 22 may be formed with the same material and / or the same thickness, but may be formed with different materials and / or different thicknesses. However, in consideration of bending during roller imprinting and deformation of the pattern region 11P in the resin layer 13 due to thermal deformation, the same material and / or the same thickness, particularly the same material and the same thickness. preferable.

  Further, the adhesive layer 23 of the present embodiment bonds the base body 21 and the base body 22. Therefore, the material for forming the adhesive layer 23 is selected in consideration of adhesiveness in addition to flexibility, elasticity, and light transmittance. In the present embodiment, as an example, the adhesive layer 23 is formed of a material containing an epoxy resin composition. The present inventor has found that the epoxy resin composition has excellent light transmittance and suitable elasticity.

  The adhesive layer 23 has adhesiveness on both main surfaces, both the main surfaces are covered with the release layer, and the adhesive layer 23 is used by being peeled off at the time of adhesion to the base material bodies 21 and 22. It may be formed from a tape or may be formed from a material applied in a liquid state. In the present embodiment, the material including the epoxy resin composition is used as the material of the adhesive layer 23. However, any material having desired flexibility, elasticity, light transmittance, and adhesiveness may be used. Needless to say, these materials may be used.

  In addition, the thickness of the adhesive layer 23 is preferably 50 μm or more and 200 μm or less in consideration of flexibility, elasticity, and light transmittance.

[Imprint method]
Next, an imprint method according to the first embodiment using the imprint mold 11 described above, that is, a roller imprint will be described. In the present embodiment, optical roller imprint using a photocurable resin composition as a molding material in roller imprint will be described.

  In the imprint method of the present embodiment, as a general rule, the above-described imprint mold 11 is used, and pressure is applied by a roller from the back surface (the surface on which the pattern region 11P is not formed) of the imprint mold 11. The imprint mold 11 is brought into contact with the molding material 103 (see FIGS. 3 and 4), the molding material 103 is cured after the contact, and then the cured transfer layer 104 (see FIGS. 3 and 4) is imprinted with the imprinting mold 103. Release from the printing mold 11 is performed. 3 and 4 are process diagrams for explaining the imprint method according to the present embodiment. FIG. 5 is a cross-sectional view taken along line VV of the transfer substrate shown in FIG. Hereinafter, each process is explained in full detail.

<Preparation process>
In this embodiment, first, the imprint mold 11 shown in FIGS. 1 and 2 is prepared. In addition, a transfer substrate 101 shown in FIG. In the transfer substrate 101, an etching target layer 102 is provided on one surface 101 a, and a molding material 103 is positioned on the etching target layer 102.

  The transfer substrate 101 used here can be selected as appropriate, for example, glass such as quartz, soda lime glass, borosilicate glass, semiconductor such as silicon, gallium arsenide, gallium nitride, resin such as polycarbonate, polypropylene, polyethylene, etc. A substrate, a metal substrate, or a composite substrate made of any combination of these materials can be used. Further, for example, a desired pattern structure such as a fine wiring used in a semiconductor or a display, a photonic crystal structure, an optical waveguide, or an optical structure such as holography may be formed. The etched layer 102 may be a thin film made of a material required as a pattern material formed on the transfer substrate 101. For example, an inorganic thin film, an organic thin film, an organic-inorganic composite thin film, or the like can be selected as appropriate. it can. In addition, although the shape of the transfer substrate 101 is a flat plate shape in the illustrated example, for example, it may be a mesa structure having a convex structure plane portion protruding from the periphery on one surface 101a.

  Further, the molding material 103 is formed by using a desired resin composition, for example, a photocurable resin composition, a thermosetting resin composition, etc., using a spin coating method, a dispense coating method, a dip coating method, a spray coating method, It can be formed by a known coating means such as an ink jet method. In the present embodiment, since the optical roller imprint using the photocurable resin composition is performed as the molding material 103, the molding material 103 is a photocurable resin composition. The thickness of the molding material 103 is such that the height of the convex pattern 15L of the pattern region 11P of the imprint mold 11 to be used, the depth of the concave portion between them, and the residual film (convex) generated in the pattern structure to be formed. It can be set in consideration of the allowable range of the thickness of the portion located between the patterns.

<Contact process>
Next, in the contact step, the roller 151 from the other surface 12b (surface opposite to the adhesive layer 23 side of the base body 22) where the pattern region 11P of the flexible imprint mold 11 is not formed. Then, the pattern area 11P of the imprint mold 11 is brought into contact with the molding material 103 by pressurizing the imprint mold 11 (FIGS. 3B and 4A). Here, in the present embodiment, the peripheral portion 16 that forms the non-pattern region 11N in the resin layer 13 is also in contact with the molding material 103.

  As shown in FIGS. 3B and 4A, when the pattern area 11P of the imprint mold 11 is brought into contact with the molding material 103 by the pressure of the roller 151, the transfer substrate 101 is moved as shown in FIG. The imprint mold 11 and the molding material 103 are moved at the same speed by conveying in the arrow a direction shown in FIG. 3 and rotating the roller 151 in the arrow b direction shown in FIG. , Make sure there is no gap between them. In this contact step, the imprint mold 11 is brought into contact with the molding material 103 along the line direction of the pattern portion 15 of the imprint mold 11 (the direction indicated by the arrow A in FIG. 4A). Thus, the deformation of the pattern portion 15 of the imprint mold 11 can be prevented.

  Further, the pressure applied by the roller 151 can be set as appropriate as long as the unevenness of the pattern portion 15 of the imprint mold 11 can be completely embedded in the molding material 103. Therefore, for example, the distance from the stage (not shown) that conveys the transfer substrate 101 to the roller 151 is fixed to a desired value, and the transfer substrate 101 and the imprint mold 11 pass between the stage and the roller 151. Thus, when the unevenness of the pattern portion 15 of the imprint mold 11 is completely embedded in the molding material 103, it is not necessary to apply pressure by biasing the roller 151 toward the transfer substrate 101.

  In the present embodiment, as described above, the imprint mold 11 includes the pair of base body bodies 21 and 22 and the adhesive layer 23 that is interposed between the base body bodies 21 and 22 and functions as an elastic layer. ,have. This prevents the imprint mold 11 from being undesirably deformed when the imprint mold 11 and the molding material 103 are brought into contact in this contact step. Thereby, it is prevented that the defect area | region where the film thickness became locally thin in the to-be-molded material 103 contacted with the mold 11 for imprints arises.

<Curing process>
Next, the molding material 103 brought into contact with the imprint mold 11 is cured to transfer the pattern region 11P of the imprint mold 11, that is, the pattern corresponding to the concavo-convex pattern including the pattern portion 15. 104. In the example shown in FIG. 3 (B) and FIG. 4 (A), light is irradiated from the light irradiation device 161 through the imprint mold 11 immediately after being contacted with the imprint mold 11. Although the molding material 103 is cured to form the transfer layer 104, the molding material 103 may be cured after the contact between the imprint mold 11 and the molding material 103 is completed to form the transfer layer 104. In addition, when the transfer substrate 101 is light transmissive, a light irradiation device 161 is provided on the back side of the transfer substrate 101, and the transfer substrate 101 can be applied to the molding material 103 that has completed contact with the imprint mold 11. Light may be irradiated from the light irradiation device 161 via 101 to cure the molding material 103. Further, the light irradiation from the light irradiation device 161 via the imprint mold 11 and the light irradiation from the light irradiation device 161 via the transfer substrate 101 are used together to complete the contact with the imprint mold 11. The molding material 103 may be cured.

<Mold release process>
Next, by separating the transfer layer 104 and the imprint mold 11 from each other, the pattern structure as the transfer layer 104 is positioned on the transfer substrate 101 (FIGS. 3C and 4B). ). As shown in FIG. 5, the transfer layer 104 formed in this way has a pattern portion 115 in which the concavo-convex pattern of the pattern portion 15 of the imprint mold 11 is reversed. The pattern portion 115 has a shape in which a plurality of convex patterns 115L extending in a line shape are arranged. In FIG. 4B, the pattern portion 115 included in the formed transfer layer 104 is not shown.

  The direction of separation between the transfer layer 104 and the imprint mold 11 is preferably the line direction of the pattern portion 15 of the imprint mold 11 as in the above-described contact step. Thereby, generation | occurrence | production of the pattern defect by a deformation | transformation and damage of the pattern part 115 of the transfer layer 104 can be prevented.

  The transfer layer 104 and the imprint mold 11 can be separated after the contact of the imprint mold 11 with the molding material 103 and the formation of the transfer layer 104 by curing of the molding material 103 are completed. Further, before the contact of the imprint mold 11 with the molding material 103 is completed, the imprinting material 103 is imprinted from the transfer layer 104 formed by curing the molding material 103 that is already in contact with the imprint mold 11. The mold 11 may be separated as appropriate. Further, after the transfer layer 104 and the imprint mold 11 are separated from each other, additional exposure may be performed to completely cure the transfer layer 104.

  After that, the remaining film 115a (see FIG. 5) is removed from the pattern portion 115 of the pattern structure 104, which is the transfer layer 104 formed as described above, and then the object to be etched using the pattern structure 104 as a mask. A desired pattern can be formed on the transfer substrate 101 by etching the layer 102. In addition, a concavo-convex structure can be formed on the transfer substrate 101 by etching the transfer substrate 101 using the pattern thus formed as a mask.

  As described above, in the present embodiment, the imprint mold 11 having the pattern region 11P and the non-pattern region 11N is provided on the flexible substrate 12 and the one surface 12a of the substrate 12. And the resin layer 13 that forms the pattern region 11P, and the base material 12 includes a pair of base material bodies 21 and 22, and an adhesive layer that is interposed between the base material bodies 21 and 22 and functions as an elastic layer. Have. And roller imprint is performed by such an imprint mold 11.

  Such an imprint mold 11 is prevented from being undesirably deformed when the imprint mold 11 and the molding material 103 are brought into contact with each other by ensuring a predetermined elasticity. Thereby, according to this Embodiment, it prevents that a defect area | region arises in the to-be-molded material 103 contacted with the pattern area | region 11P of the mold 11 for imprints by the deformation | transformation resulting from the flexibility of the said mold. Can do.

  FIG. 6 is a diagram for explaining the operational effects of the first embodiment. FIG. 6 (A) shows a molding material imprinted by a conventional imprint mold composed of only a base material made of single-layer PET and a resin layer forming a pattern region. On the other hand, FIG. 6B shows a molding material 103 imprinted by the imprint mold 11 of the present embodiment.

  In FIG. 6A, reference numeral 305L indicates a convex pattern extending in a line shape transferred onto a molding material imprinted by a conventional imprint mold. In the corner portion of the convex pattern 305L, a defective region including a void (portion displayed in white) indicated by reference numeral 306 occurred along the peripheral edge portion. On the other hand, FIG. 6B shows a convex pattern 115L transferred onto the molding material 103 imprinted by the imprint mold 11 of the present embodiment. As shown in FIG. 6B, when the imprint mold 11 of the present embodiment is used, the defect region 306 as shown in FIG. 6A did not occur. Also from this result, the effect of this Embodiment has been confirmed.

[Method of manufacturing wire grid polarizer]
Below, the manufacturing method of the wire grid polarizer using the mold 11 for imprints is demonstrated as an example of the method which employ | adopted the imprint method by the mold 11 for imprints of 1st Embodiment concretely.

  FIG. 7 is a plan view of a wire grid polarizer manufactured using the imprint mold 11. FIG. 8 is a process diagram of a method for manufacturing the wire grid polarizer 201 manufactured using the imprint mold 11. FIG. 8D of FIGS. 8A to 8D shows a cross-sectional view along the line DD in FIG. First, the structure of the manufactured wire grid polarizer 201 will be described.

  As shown in FIGS. 7 and 8D, the wire grid polarizer 201 includes a transparent substrate 202, a wire grid material layer 203 located on one surface 202a of the transparent substrate 202, and the wire grid material layer 203. And a wire grid region 213 set to. As shown in FIG. 7, the wire grid region 213 has a rectangular outer shape. In FIG. 7, a partial region Z3 of the wire grid region 213 is shown enlarged. In the wire grid region 213, a wire grid 215 configured by arranging a plurality of line-shaped opening lines 215L via a desired space (wire grid material layer) is located. In the illustrated example, a line-shaped opening line 215 </ b> L extending in the direction indicated by the arrow A in FIG. 7 is formed over the entire wire grid region 213. In FIG. 7, the surface of the wire grid 215 is indicated by hatching.

  The manufacturing method of the wire grid polarizer 201 using the imprint mold 11 is roughly a resist pattern layer on the wire grid material layer 203 provided on the transparent substrate 202 by the above-described imprint method according to the present embodiment. 205 (see FIG. 8C) is formed, and the wire grid material layer 203 is etched using the resist pattern layer 205 as an etching mask, whereby the wire grid 215 is formed. Hereinafter, each process is explained in full detail.

<Preparation process>
In this manufacturing method, first, the imprint mold 11 shown in FIGS. 1 and 2 is prepared. In addition, a transparent substrate 202 shown in FIG. In the transparent substrate 202, a wire grid material layer 203 is provided on one surface 202 a thereof, and an etching resist layer 204 is positioned on the wire grid material layer 203.

  The transparent substrate 202 used here can be appropriately selected. For example, a rigid material such as quartz glass, synthetic quartz, and magnesium fluoride, or a transparent material having flexibility such as a transparent resin film and an optical resin plate. A flexible material or the like can be used. Here, the term “transparent” means that the light transmittance at a wavelength of 200 to 800 nm is 50% or more, preferably 70% or more. The measurement of light transmittance can be performed using JASCO Corporation V-650.

  Examples of the material of the wire grid material layer 203 include metals such as aluminum, gold, silver, copper, platinum, molybdenum silicide, and titanium oxide, conductive materials such as metal compounds, and dielectric materials. Any of these can be used alone or in combination. The thickness of such a wire grid material layer can be appropriately set within a range of 10 to 500 nm. The wire grid material layer 203 can be formed to a desired thickness by a vacuum film formation method or the like.

  Moreover, the etching resist layer 204 expresses etching resistance in the etching of the wire grid material layer 203, and can be appropriately selected from conventional etching resist materials according to the material of the wire grid material layer 203 and the like. it can. Moreover, a metal thin film is formed on the wire grid material layer 203, a hard mask is formed by etching the metal thin film through the etching resist layer 204, and the wire grid material layer 203 is etched through the hard mask. May be. The etching resist layer 204 can be formed using a known coating means such as a spin coating method, a dispense coating method, a dip coating method, a spray coating method, an ink jet method or the like. The thickness of the etching resist layer 204 is such that the height of the convex pattern portion 15L of the pattern region 11P of the imprint mold 11 to be used, the depth between these, and the residual film (between the convex patterns) formed in the resist pattern to be formed. The thickness can be set in consideration of the allowable range of the thickness of the portion located at (3).

<Contact process>
Next, in the contact step, the roller 271 is moved from the other surface 12b (the surface opposite to the adhesive layer 23 side of the base body 22) where the pattern region 11P of the flexible imprint mold 11 is not formed. Then, the pattern area 11P of the imprint mold 11 is brought into contact with the etching resist layer 204 by pressurizing the imprint mold 11 (FIG. 8B).

  As shown in FIG. 8B, in the contact between the pattern region 11P of the imprint mold 11 and the etching resist layer 204 by the pressure of the roller 271, the transparent substrate 202 is conveyed in the direction of arrow a, and the roller 271 is moved. By rotating in the direction of the arrow b, the imprint mold 11 and the etching resist layer 204 are moved at the same speed so that no deviation occurs between them. In this contact step, the imprint mold 11 is brought into contact with the etching resist layer 204 along the line direction of the pattern portion 15 of the imprint mold 11.

  Further, the pressurization by the roller 271 can be set as appropriate as long as the unevenness of the pattern portion 15 of the imprint mold 11 can be completely embedded in the etching resist layer 204. Therefore, for example, the distance from the stage (not shown) that transports the transparent substrate 202 to the roller 271 is fixed to a desired value, and the transparent substrate 202 and the imprint mold 11 pass between the stage and the roller 271. Thus, when the unevenness of the pattern portion 15 of the imprint mold 11 is completely embedded in the etching resist layer 204, it is not necessary to apply pressure by biasing the roller 271 toward the transparent substrate 202.

  In the present embodiment, as described above, the imprint mold 11 includes the pair of base body bodies 21 and 22 and the adhesive layer 23 that is interposed between the base body bodies 21 and 22 and functions as an elastic layer. ,have. This prevents the imprint mold 11 from being undesirably deformed when the imprint mold 11 and the etching resist layer 204 are contacted in the contact step. As a result, it is possible to prevent a defective region having a locally thin film thickness from occurring in the etching resist layer 204 in contact with the imprint mold 11.

<Curing process>
Next, the etching resist layer 204 that is in contact with the imprint mold 11 is cured to transfer a pattern corresponding to the pattern region 11P of the imprint mold 11, that is, the concavo-convex pattern including the pattern portion 15. Layer 205 is assumed. In the example shown in FIG. 8B, the etching resist layer 204 is cured by irradiating light from the light irradiation device 281 through the imprint mold 11 immediately after being contacted with the imprint mold 11. However, the etching resist layer 204 may be cured after the contact between the imprint mold 11 and the etching resist layer 204 is completed.

<Mold release process>
Next, the resist pattern layer 205 and the imprint mold 11 are separated from each other, so that the resist pattern layer 205 is positioned on the wire grid material layer 203 (FIG. 8C). FIG. 8C shows a longitudinal section in a direction orthogonal to the transport direction (direction indicated by arrow a) of the transparent substrate 202 shown in FIG. The resist pattern layer 205 has a pattern portion 206 in which the concavo-convex pattern of the pattern portion 15 of the imprint mold 11 is inverted. The pattern portion 206 has a shape in which a plurality of convex patterns 206L extending in a line shape are arranged. In FIG. 8C, the remaining film (resist layer remaining between the convex portions) in the resist pattern layer 205 is omitted.

  The direction in which the resist pattern layer 205 and the imprint mold 11 are separated is the line direction of the pattern portion 15 of the imprint mold 11 as in the above-described bonding step. Thereby, the formed resist pattern layer 205 can prevent the occurrence of pattern defects due to deformation and damage of the pattern portion 206. The resist pattern layer 205 and the imprint mold 11 are separated after the contact of the imprint mold 11 with the etching resist layer 204 and the formation of the resist pattern layer 205 by the curing of the etching resist layer 204 are completed. it can. Further, even before the contact of the imprint mold 11 with the etching resist layer 204 is completed, the imprint mold 11 is appropriately separated from the resist pattern layer 205 formed by curing the etching resist layer 204 after the contact. May be.

<Etching process>
Next, the remaining film (not shown) is removed from the pattern portion 206 of the resist pattern layer 205 formed as described above, and then the wire grid material layer 203 is etched using the resist pattern layer 205 as a mask. Then, the wire grid 215 constituted by the opening line 215L is formed (FIG. 8D).

  In the manufacturing method described above, when the imprint mold 11 according to the present embodiment is used, when the imprint mold 11 and the etching resist layer 204 are brought into contact, the imprint mold 11 is Undesirable deformation is prevented. Thereby, it is possible to prevent a defective region from being generated in the etching resist layer 204 in contact with the pattern region 11P of the imprint mold 11 due to deformation due to the flexibility of the mold. For this reason, it can prevent that a defect arises also in the wire grid polarizer 201 manufactured after an etching, and the quality of the wire grid polarizer 201 can be improved.

(Second Embodiment)
Next, a second embodiment of the present invention will be described. FIG. 9 is a diagram for explaining an imprint mold 31 according to the second embodiment of the present invention. FIG. 9A shows a plan view of the imprint mold 31, and FIG. 9B is a cross-sectional view taken along line IX-IX in FIG. 9A.

  The imprint mold 31 according to the second embodiment of the present invention includes a flexible base material 32 and a resin layer 33 provided on one surface 32a of the base material 32. The entire surface (the entire surface) of the resin layer 13 forms a pattern region 31P. On the other hand, the part located outside the resin layer 13 of the base material 32 forms a non-pattern region 31N. Similar to the first embodiment, the pattern region 31P is a region including a pattern portion that is brought into contact with a molding material positioned on one surface of the transfer substrate and transfers the pattern to the molding material. On the other hand, the non-pattern region 31N means a region that does not have a shape corresponding to the pattern transferred to the molding material. In the illustrated example, the base material 32 and the resin layer 33 are both formed in a rectangular shape in plan view, but the base material 32 and the resin layer 33 may be formed in other shapes.

  In FIG. 9B, a region Z4 including a portion for forming the pattern region 11P in the resin layer 33 is shown enlarged. As shown in the region Z4, in the present embodiment, the pattern portion 35 configured by arranging a plurality of line-shaped convex patterns 35L via a desired space is located in the pattern region 31P. The resin layer 33 is formed from the same material as in the first embodiment.

  On the other hand, as shown in FIG. 9B, in the present embodiment, only a portion of the base material 32 corresponding to the pattern region 31P is a pair of base material bodies 41, 42 and base material bodies 41, 42. It has a structure having an adhesive layer 43 interposed therebetween and functioning as an elastic layer, and among these, a resin layer 33 is provided (laminated) on the base body 41. In the present embodiment, one surface 32 a of the base material 32 described above is set on the surface of the base material body 41. More specifically, in the present embodiment, only the portion of the base material 32 where the resin layer 33 is laminated is a multilayer structure having a pair of base material bodies 41 and 42 and an adhesive layer 43. It has become. The base body 41 and the adhesive layer 43 are formed in the same size as the resin layer 33 in a plan view, while the base body 42 is in the plan view in a base view 41, the adhesive layer 43, and the resin layer 33. It is formed in such a size that it is larger than that of the periphery thereof.

  In the present embodiment, a portion of the base material 32 corresponding to the non-pattern region 32N is formed of the base material body 42. More specifically, in the present embodiment, the portion of the base material 32 where the resin layer 33 is not laminated and the non-pattern region 33N is formed is formed of the base material main body 42.

  According to such an imprint mold 31 according to the second embodiment, when the imprint mold 31 and the material to be molded are brought into contact with each other, the pattern area 31P of the imprint mold 31 is supported. Predetermined elasticity is ensured in the portion to be prevented, and this portion is prevented from being undesirably deformed. Thereby, it is prevented that the defect area | region where the film thickness became locally thin in the to-be-molded material contacted with the mold 31 for imprint arises, and the to-be-molded material is deformed due to the flexibility of the mold. Generation of a defective area can be prevented. On the other hand, in the whole imprint mold 31, the single layer region of the base material body 42 occupies most, so that the followability of deformation due to the pressure of the roller becomes good, and the imprint mold 31 and the molding target It is also possible to stabilize the contact state with the material.

  In addition, in the resin layer 33 of 2nd Embodiment, when the surrounding part which forms a non-pattern area | region like 1st Embodiment is provided, it respond | corresponds to the resin layer 33 of the base material 32. It is preferable that the portion, that is, the portion where the resin layer 33 is laminated has a multilayer structure.

(Third embodiment)
Next, a third embodiment of the present invention will be described. FIG. 10 is a plan view of an imprint mold 51 according to the third embodiment of the present invention.

  The imprint mold 51 according to the third embodiment of the present invention includes a flexible base 52 and a plurality (four in the illustrated example) provided on one surface 52a of the base 52. The resin layer 53 is provided. Each of the resin layers 53 forms a pattern region 51P. On the other hand, the part located outside each of the resin layers 53 of the substrate 52 forms a non-pattern region 51N. As in the first and second embodiments, the pattern region 51P is brought into contact with the molding material positioned on one surface of the transfer substrate, and the pattern portion that transfers the pattern to the molding material. It is an area including On the other hand, the non-pattern region 51N means a region that does not have a shape corresponding to the pattern transferred to the molding material. Moreover, in the example of illustration, although the base material 52 and each resin layer 53 are formed in the rectangle by planar view, the base material 52 and each resin layer 53 may be formed in another shape. The resin layer 53 is formed from the same material as in the first embodiment.

  Although not shown, each pattern region 51P has a pattern portion configured by arranging a plurality of line-shaped convex patterns with a desired space therebetween. The pattern portion may be configured such that, for example, convex patterns are arranged in a mesh shape. Further, different pattern portions may be located in each pattern region 51P.

  Moreover, in this Embodiment, the base material 52 has a pair of base material main bodies 61 and 62 and the contact bonding layer 63 interposed between the base material main bodies 61 and 62 and functioning as an elastic layer. As in the first embodiment, each of the base body bodies 61 and 62 and the adhesive layer 63 is rectangular, has the same dimensions, and the whole base material 52 has a three-layer structure. As a modification of the third embodiment, the portion corresponding to the non-pattern region 51N in the base material 52 may be a base material body as in the second embodiment.

  According to the imprint mold 51 according to the third embodiment, the imprint mold 51 may be undesirably deformed when the imprint mold 31 and the molding material are brought into contact with each other. Is prevented. As a result, it is possible to prevent a defective region having a locally thin film thickness from occurring in the molding material that is in contact with the imprint mold 51, and to the molding material due to deformation due to the flexibility of the mold. Generation of a defective area can be prevented. In addition, a plurality of resin layers 53 are provided on the base material 52, and each resin layer 53 forms a pattern region 51P, so that a plurality of pattern structures can be obtained by one imprint, thereby improving productivity. be able to.

11, 31, 51 Imprint mold 11P, 31P, 51P Pattern area 11N, 31N, 51N Non-pattern area 12, 32, 52 Base material 12a, 32a, 52a One surface 12b Other surface 13, 33, 53 Resin layer 15, 35 Pattern part 15L, 35L Convex pattern 16 Surrounding part 21, 41, 61 Base body 22, 42, 62 Base body 23, 43, 63 Adhesive layer 101 Transfer substrate 101a One surface 102 Etched layer 103 Molded Material 104 Transfer layer 115 Pattern part 115L Convex pattern 151 Roller 161 Light irradiation device 201 Wire grid polarizer 202 Transparent substrate 202a One surface 203 Wire grid material layer 204 Etching resist layer 205 Resist pattern layer 206 Pattern part 206L Convex pattern 213 Wire grid Territory Area 215 Wire grid 215L Opening line 271 Roller 281 Light irradiation device

Claims (6)

In a flexible imprint mold having a pattern region and a non-pattern region,
A flexible substrate;
A resin layer provided on one surface of the base material and forming the pattern region;
The substrate may possess a portion corresponding to at least the pattern regions, a pair of substrate body, is interposed between the substrate main body, and an adhesive layer which functions as an elastic layer, and
The pair of base body imprint mold characterized that you have been formed of the same material. 2. The imprint mold according to claim 1, wherein a portion of the base material corresponding to the non-pattern region is formed of one base material body of the pair of base material bodies. The imprint mold according to claim 1, wherein the adhesive layer has a thickness of 50 μm or more and 200 μm or less. The imprint mold according to any one of claims 1 to 3, wherein the adhesive layer is formed of a material containing an epoxy resin composition. In the imprint method,
A flexible imprint mold having a pattern region and a non-pattern region, a flexible base material, a resin layer provided on one surface of the base material and forming the pattern region; , wherein the substrate is a portion corresponding to at least the pattern regions, a pair of substrate body, is interposed between the substrate body, possess an adhesive layer which functions as an elastic layer, a pair base body includes a preparation step of preparing the imprint mold that is formed of the same material,
The molding area positioned on one surface of the transfer substrate by pressing the pattern area of the imprint mold with a roller from the surface of the substrate opposite to the surface on which the resin layer is provided. A contact process for contacting the material;
A curing step in which a pattern corresponding to the pattern region is transferred by curing the molding material brought into contact with the imprint mold; and
An imprinting method comprising: a releasing step of separating the transfer layer from the imprint mold to place the pattern structure as the transfer layer on the transfer substrate. . In the manufacturing method of the wire grid polarizer,
A flexible imprint mold having a pattern region and a non-pattern region, a flexible base material, a resin layer provided on one surface of the base material and forming the pattern region; , wherein the substrate is a portion corresponding to at least the pattern regions, a pair of substrate body, is interposed between the substrate body, possess an adhesive layer which functions as an elastic layer, a pair base body includes a preparation step of preparing the imprint mold that is formed of the same material,
A transparent surface having a wire grid material layer on one surface by pressing the pattern region of the imprint mold with a roller from the surface of the substrate opposite to the surface on which the resin layer is provided. Contacting with an etching resist layer located on the wire grid material layer of the substrate;
A curing step of curing a pattern corresponding to the pattern region by curing the etching resist layer brought into contact with the imprint mold; and
A mold release step of separating the resist pattern layer and the imprint mold;
Etching the wire grid material layer by using the resist pattern layer as an etching mask to form a wire grid, and a method of manufacturing a wire grid polarizer.