JP6445821B2 - Intracranial electrode structure - Google Patents
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Description
本発明は、頭蓋内の脳表面に留置する頭蓋内電極構造体に関する。 The present invention relates to an intracranial electrode structure that is placed on the surface of the brain inside the skull.
従来、この種の頭蓋内電極構造体としては、脳表面に接触する扁平な接触部を有する電極をフレキシブルな基板に１×２〜８×８程度に配列した硬膜下電極（例えば、特許文献１参照）や、脳表面から０．５ｍｍ〜１．５ｍｍ程度の深さに刺入するための２ｍｍ程度の長さの針状の電極を微小範囲に１０×１０程度に複数配列して電極アレイとした微小電極（例えば、非特許文献１参照）などが提案されている。これらの頭蓋内電極は、頭蓋内に留置されて、てんかんの焦点部位の同定に用いられたり、発作の予測や抑制の研究に用いられたり、ブレイン・マシン・インタフェース（Brain-machine Interface : BMI）の研究に用いられたりしている。なお、頭蓋内電極としては脳の深部に刺入して深部の脳波を測定する長い針状の深部電極も提案されている。 Conventionally, as this type of intracranial electrode structure, a subdural electrode in which electrodes having a flat contact portion in contact with the brain surface are arranged on a flexible substrate in about 1 × 2 to 8 × 8 (for example, Patent Documents) 1), and a plurality of needle-like electrodes having a length of about 2 mm for insertion into the brain surface at a depth of about 0.5 mm to 1.5 mm are arranged in a small range of about 10 × 10 in an electrode array. The microelectrode (for example, refer nonpatent literature 1) etc. which were made are proposed. These intracranial electrodes are placed in the skull and used to identify the focal site of epilepsy, to study seizure prediction and suppression, and to the brain-machine interface (BMI). Or used for research. In addition, as an intracranial electrode, a long needle-like deep electrode that is inserted into the deep part of the brain and measures an electroencephalogram in the deep part has been proposed.
硬膜下電極は、頭蓋内に留置したときの長期的な安定性を有するものの、電極が脳表面に接触する扁平な接触部を有するため、電極により検出される信号には脳の複数の神経組織からの信号が反映されてしまい、信号を復号化するときにはその精度は低くなってしまう。一方、微小電極は、微小範囲に１０×１０（１０行１０列）程度に配置された複数の各電極には、その近傍の神経からの信号が反映されるため、微小範囲内に生じる複数の信号（脳波）を精度良く検出し、信号（脳波）を復号化する際の精度も非常に良好なものとなるが、電極アレイの各電極は脳表面からある程度の深さに刺入されるものであるため、脳表面に張り巡らされた基幹的な血管を避ける必要から、その大きさは限られ、広範囲な大きさにすることができない。また、微小電極は、各電極を脳表面から均等な深さに刺入するのに必要な刺入圧力は大きくなるため、電極アレイの各電極の刺入に特殊な器具を用いる必要がある。さらに、微小電極は、脳表面の微小範囲に多数の電極を刺入することから、脳と癒着しやすいため、頭蓋内の長期留置は不適なものとなる。 Although the subdural electrode has long-term stability when placed in the cranium, it has a flat contact area where the electrode contacts the brain surface. The signal from the tissue is reflected, and the accuracy is reduced when the signal is decoded. On the other hand, a plurality of electrodes arranged in a minute range of about 10 × 10 (10 rows and 10 columns) reflect signals from nerves in the vicinity thereof, and thus a plurality of microelectrodes generated within the minute range. The signal (electroencephalogram) is detected accurately and the accuracy when decoding the signal (electroencephalogram) is very good, but each electrode of the electrode array is inserted to a certain depth from the brain surface Therefore, since it is necessary to avoid a basic blood vessel stretched around the brain surface, its size is limited and cannot be made in a wide range. In addition, since the insertion pressure required for inserting each electrode at a uniform depth from the brain surface is increased, it is necessary to use a special instrument for inserting each electrode of the electrode array. Furthermore, since a microelectrode inserts a large number of electrodes into a microscopic area on the surface of the brain and easily adheres to the brain, long-term placement in the skull becomes unsuitable.
本発明の頭蓋内電極構造体は、比較的長期の留置に適しており、取り付けやすく、且つ、より詳細な信号を検出するものを提案することを主目的とする。 The main purpose of the intracranial electrode structure of the present invention is to propose one that is suitable for indwelling for a relatively long period of time, is easy to attach, and detects a more detailed signal.
本発明の頭蓋内電極構造体は、上述の主目的を達成するために以下の手段を採った。 The intracranial electrode structure of the present invention employs the following means in order to achieve the main object described above.
本発明の頭蓋内電極構造体は、
頭蓋内の脳表面に留置する頭蓋内電極構造体であって、
脳表面に接触する扁平な接触部を有する少なくとも１つの接触用電極と、
脳表面から刺入するために針状に形成されて前記接触部の径以上の間隔をもって配置された複数の針状電極と、
を備えることを要旨とする。
The intracranial electrode structure of the present invention is
An intracranial electrode structure placed on the surface of the brain inside the skull,
At least one contact electrode having a flat contact portion in contact with the brain surface;
A plurality of needle-like electrodes formed in a needle shape for insertion from the surface of the brain and arranged at intervals equal to or larger than the diameter of the contact portion;
It is a summary to provide.
この本発明の頭蓋内電極構造体では、接触用電極は、脳表面に接触する接触部の近傍に生じる信号（脳波）を検出し、接触用電極の接触部の径以上の間隔をもって配置された複数の針状電極は、脳表面から刺入された各針状電極の近傍に生じる信号（脳波）を検出する。したがって、単位面積当たりの電極数は、接触用電極だけを用いる場合（一般的な硬膜下電極）に比して多くなるから、より複数の信号（脳波）を検出することができ、信号（脳波）を復号化する際の精度も良好なものとすることができる。複数の針状電極は、接触用電極の接触部の径以上の間隔をもって配置されているから、各針状電極を脳表面から均等な深さに刺入するのに必要な刺入圧力は小さくなり、各針状電極の刺入に特殊な器具を用いる必要がない。また、複数の針状電極は、接触用電極の接触部の径以上の間隔をもって配置されているから、微小電極に比して、脳と癒着は生じ難いものとなり、頭蓋内の長期留置が好適なものとなる。複数の針状電極の本数が少ない場合には、各針状電極の刺入位置を目視（肉眼）で確認しながら刺入することができる。しかも、接触用電極を多数用いることにより、広範囲な大きさとすることもできる。 In this intracranial electrode structure of the present invention, the contact electrode detects a signal (electroencephalogram) generated in the vicinity of the contact portion that contacts the brain surface, and is arranged with an interval equal to or larger than the diameter of the contact portion of the contact electrode. The plurality of needle-like electrodes detect signals (electroencephalograms) generated in the vicinity of each needle-like electrode inserted from the brain surface. Therefore, the number of electrodes per unit area is larger than when only the contact electrode is used (general subdural electrode), so that more signals (electroencephalograms) can be detected. The accuracy at the time of decoding (electroencephalogram) can also be improved. Since the plurality of needle-like electrodes are arranged with an interval equal to or larger than the diameter of the contact portion of the contact electrode, the insertion pressure required to insert each needle-like electrode at a uniform depth from the brain surface is small. Therefore, it is not necessary to use a special instrument for inserting each needle electrode. In addition, since the plurality of needle-like electrodes are arranged with an interval equal to or larger than the diameter of the contact portion of the contact electrode, adhesion to the brain is less likely to occur compared to the microelectrode, and long-term placement in the skull is preferable. It will be something. When the number of the plurality of needle-like electrodes is small, the needles can be inserted while confirming the insertion positions of the needle-like electrodes with the naked eye. In addition, a wide range of sizes can be obtained by using a large number of contact electrodes.
こうした本発明の頭蓋内電極構造体において、前記接触用電極と前記複数の針状電極とが配置された樹脂製の基板と、前記接触用電極の接触部を露出させるための少なくとも１つの貫通孔を有し、前記基板に前記接触用電極と前記針状電極とを配置した状態で前記貫通孔から前記接触部を露出させるように且つ前記複数の針状電極を貫通させるように前記基板に取り付けられたシリコンシートと、を備えるものとすることもできる。 In such an intracranial electrode structure of the present invention, a resin substrate on which the contact electrode and the plurality of needle-like electrodes are arranged, and at least one through hole for exposing a contact portion of the contact electrode Attached to the substrate so as to expose the contact portion from the through-hole and to penetrate the plurality of needle-shaped electrodes in a state where the contact electrode and the needle-shaped electrode are disposed on the substrate. It is also possible to provide a silicon sheet.
また、本発明の頭蓋内電極構造体において、前記複数の針状電極は、隣接する針状電極の長さが異なるように形成されているものとすることもできる。こうすれば、複数の針状電極のうちの長さが長い針状電極の順に脳表面から刺入することになるから、刺入に必要な力を小さくすることができる。この場合、前記複数の針状電極は、第１の長さの第１針状電極と前記第１の長さとは異なる第２の長さの第２針状電極とを有するものとすることもできる。更にこの場合、前記複数の針状電極は、前記第１針状電極と前記第２針状電極とが交互に配列しているものとすることもできる。 In the intracranial electrode structure of the present invention, the plurality of needle-like electrodes may be formed so that adjacent needle-like electrodes have different lengths. In this way, since the needles are inserted from the brain surface in the order of the longer needle-like electrode among the plurality of needle-like electrodes, the force required for the insertion can be reduced. In this case, the plurality of acicular electrodes may include a first acicular electrode having a first length and a second acicular electrode having a second length different from the first length. it can. Furthermore, in this case, the plurality of needle-shaped electrodes may be configured such that the first needle-shaped electrodes and the second needle-shaped electrodes are alternately arranged.
本発明の頭蓋内電極構造体において、前記接触用電極は１×１（１行１列）から２×４(２行４列）の範囲内で配列しており、前記複数の針状電極は１×２（１行２列）から３×５（３行５列）の範囲内で配列している、ものとすることもできる。この程度の配列数とすれば、比較的小型なものとなるため、各針状電極の刺入位置を目視（肉眼）で確認しながら刺入することができる。 In the intracranial electrode structure of the present invention, the contact electrodes are arranged within a range of 1 × 1 (1 row and 1 column) to 2 × 4 (2 rows and 4 columns), and the plurality of needle electrodes are It can also be arranged within a range of 1 × 2 (1 row 2 columns) to 3 × 5 (3 rows 5 columns). With this number of arrangements, the size is relatively small, so that the insertion position of each needle electrode can be inserted while visually confirming (with the naked eye).
次に、本発明を実施するための形態を実施例を用いて説明する。 Next, the form for implementing this invention is demonstrated using an Example.
図１は、本発明の一実施例としての頭蓋内電極構造体２０の構成の概略を示す斜視図であり、図２は、図１の頭蓋内電極構造体２０を斜め下から見た平面図であり、図３は、図１の頭蓋内電極構造体２０のＡ−Ａ断面を示す断面図である。実施例の頭蓋内電極構造体は、図示するように、基板２２と、３つの硬膜下電極３０と、３つの若干長い針状電極４０と、３つの若干短い針状電極４２と、を備え、各電極にはリードが取り付けられており、各リードは、リード取り出し部５０に取り付けられたシリコンチューブによって外部に取り出すことができるようになっている。 FIG. 1 is a perspective view showing an outline of the configuration of an intracranial electrode structure 20 as an embodiment of the present invention, and FIG. 2 is a plan view of the intracranial electrode structure 20 of FIG. FIG. 3 is a cross-sectional view showing an AA cross section of the intracranial electrode structure 20 of FIG. The intracranial electrode structure of the embodiment includes a substrate 22, three subdural electrodes 30, three slightly long needle electrodes 40, and three slightly short needle electrodes 42, as shown in the figure. Each electrode is provided with a lead, and each lead can be taken out by a silicon tube attached to the lead take-out portion 50.
基板２２は、３つの硬膜下電極３０の台座部３４を嵌め込んで３つの硬膜下電極３０を支持するアクリル基板２４と、３つ貫通孔から硬膜下電極３０の接触電極部３２を露出させると共に針状電極４０，４２を貫通させてアクリル基板２４全体を覆うシリコンシート２６と、により構成されている。実施例では、アクリル基板２４としては、幅が５ｍｍで長さが１１ｍｍで厚みが０．５ｍｍのものを用い、シリコンシート２６としては、厚みが０．１ｍｍのものを用いた。 The substrate 22 includes an acrylic substrate 24 that supports the three subdural electrodes 30 by fitting the pedestals 34 of the three subdural electrodes 30, and a contact electrode unit 32 of the subdural electrode 30 through three through holes. And a silicon sheet 26 that is exposed and covers the entire acrylic substrate 24 through the needle electrodes 40 and 42. In the embodiment, the acrylic substrate 24 is 5 mm in width, 11 mm in length, and 0.5 mm in thickness, and the silicon sheet 26 is 0.1 mm in thickness.
３つの硬膜下電極３０は、白金により形成されており、図示するように、基板２２に支持される直径３．５ｍｍの円盤状の台座部３２と、脳表面に接触する扁平な直径１．５ｍｍの接触電極部３４と、によりボタン状に構成されている。３つの硬膜下電極３０は、実施例では、図示するように、一列になるように配置されている。 The three subdural electrodes 30 are made of platinum, and as shown in the figure, a disc-shaped pedestal 32 having a diameter of 3.5 mm supported by the substrate 22 and a flat diameter 1. A 5 mm contact electrode portion 34 is formed into a button shape. In the embodiment, the three subdural electrodes 30 are arranged in a line as illustrated.
針状電極４０は、白金により直径が０．２ｍｍで長さが２．５ｍｍの画鋲状に形成されており、針状電極４２は、白金により直径が０．２ｍｍで長さが１．５ｍｍの画鋲状に形成されている。針状電極４０と針状電極４２は、３つの硬膜下電極３０の周囲に少なくとも接触電極部３４の直径より離れるように２列に交互に配置されている。 The needle-shaped electrode 40 is formed in a thumbtack shape having a diameter of 0.2 mm and a length of 2.5 mm with platinum, and the needle-shaped electrode 42 is made of platinum with a diameter of 0.2 mm and a length of 1.5 mm. It is shaped like a thumbtack. The acicular electrodes 40 and acicular electrodes 42 are alternately arranged in two rows around the three subdural electrodes 30 so as to be separated from at least the diameter of the contact electrode portion 34.
こうして構成された実施例の頭蓋内電極構造体２０は、脳表面における各針状電極４０，４２の刺入位置を目視（肉眼）で確認しながら各針状電極４０，４２を刺入して頭蓋内に設置する。頭蓋内では、硬膜下電極３０の接触電極部３４は、脳表面に接触し、その近傍に生じる信号（脳波）を検出し、針状電極４０，４２は、脳表面から刺入された各針状電極４０，４２の近傍に生じる信号（脳波）を検出する。したがって、単位面積当たりの電極数は、硬膜下電極３０だけを用いる場合に比して多くなるから、より複数の信号（脳波）を検出することができ、信号（脳波）を復号化する際の精度も良好なものとすることができる。この実施例の頭蓋内電極構造体２０は、難治性てんかんの焦点診断に用いたり、発作の予測や抑制の研究に用いたり、ブレイン・マシン・インタフェース（Brain-machine Interface : BMI）の研究に用いたりすることができる。ＢＭＩの研究への適用の一例を図４に示す。図４は、「ら」「り」「る」「れ」「ろ」と発言したときに１つの針状電極４０により検出される信号（脳波）を解析した結果として得られる解析図の一例である。図中、縦軸は信号から割り出した神経細胞の活動頻度であり、横軸は発言したときを値０とする経過時間を示す。図示するように、１つの針状電極４０で検出される信号（脳波）は「ら」「り」「る」「れ」「ろ」の発言により異なることが解る。したがって、複数の針状電極４０，４２および複数の硬膜下電極３０により検出される信号（脳波）を用いれば、発言や行動、思考の際の信号（脳波）をより良好に復号化することができる。 The intracranial electrode structure 20 of the embodiment configured in this way inserts each needle-like electrode 40, 42 while confirming the insertion position of each needle-like electrode 40, 42 on the brain surface with the naked eye. Install in the skull. In the cranium, the contact electrode portion 34 of the subdural electrode 30 contacts the brain surface and detects a signal (electroencephalogram) generated in the vicinity thereof, and the needle-like electrodes 40 and 42 are inserted from the brain surface. A signal (electroencephalogram) generated in the vicinity of the needle-like electrodes 40 and 42 is detected. Therefore, since the number of electrodes per unit area is larger than when only the subdural electrode 30 is used, a plurality of signals (electroencephalograms) can be detected, and the signal (electroencephalogram) can be decoded. The accuracy of the can also be good. The intracranial electrode structure 20 of this embodiment is used for focus diagnosis of refractory epilepsy, for the prediction and suppression of seizures, and for the study of brain-machine interface (BMI). Can be. An example of application to BMI research is shown in FIG. FIG. 4 is an example of an analysis diagram obtained as a result of analyzing a signal (electroencephalogram) detected by one needle-like electrode 40 when saying “ra” “ri” “ru” “re” “ro”. is there. In the figure, the vertical axis represents the activity frequency of the nerve cell determined from the signal, and the horizontal axis represents the elapsed time with a value of 0 when speaking. As shown in the figure, it can be seen that a signal (electroencephalogram) detected by one needle-like electrode 40 differs depending on the remarks of “ra” “ri” “ru” “re” “ro”. Therefore, if signals (electroencephalograms) detected by the plurality of needle-like electrodes 40 and 42 and the plurality of subdural electrodes 30 are used, signals (electroencephalograms) at the time of speech, action, and thought can be decoded better. Can do.
以上説明した実施例の頭蓋内電極構造体２０によれば、３つの硬膜下電極３０と３つの針状電極４０と３つの針状電極４２とを有するから、硬膜下電極３０だけを用いる場合に比して、より複数の信号（脳波）を検出することができ、信号（脳波）を復号化する際の精度をより良好なものとすることができる。しかも、３つの針状電極４０と３つの針状電極４２を３つの硬膜下電極３０の周囲に接触電極部３４の直径より離れるように２列に交互に配置したことにより、各針状電極４０，４２を脳表面から均等な深さに刺入するのに必要な刺入圧力を小さくすることができ、各針状電極４０，４２の刺入に特殊な器具を用いる必要がない。また、針状電極４０，４２は、硬膜下電極３０の接触電極部３４の直径より大きな間隔をもって配置されているから、ユタ電極（微小電極）に比して、脳と癒着は生じ難いものとなり、頭蓋内の長期留置が好適なものとなる。また、針状電極４０，４２は６本と少ないから、各針状電極４０，４２の刺入位置を目視（肉眼）で確認しながら刺入することができる。 According to the intracranial electrode structure 20 of the embodiment described above, since the three subdural electrodes 30, the three acicular electrodes 40, and the three acicular electrodes 42 are provided, only the subdural electrode 30 is used. As compared with the case, a plurality of signals (electroencephalograms) can be detected, and the accuracy in decoding the signals (electroencephalograms) can be improved. In addition, the three needle-like electrodes 40 and the three needle-like electrodes 42 are alternately arranged in two rows around the three subdural electrodes 30 so as to be separated from the diameter of the contact electrode portion 34, whereby each needle-like electrode is obtained. The insertion pressure required to insert the needles 40 and 42 at a uniform depth from the brain surface can be reduced, and there is no need to use a special instrument for the insertion of the needle electrodes 40 and 42. In addition, since the needle-like electrodes 40 and 42 are arranged with a larger interval than the diameter of the contact electrode portion 34 of the subdural electrode 30, adhesion to the brain is less likely to occur compared to a Utah electrode (microelectrode). Therefore, long-term indwelling in the skull is suitable. Further, since the number of needle-like electrodes 40 and 42 is as small as six, the needle-like electrodes 40 and 42 can be inserted while being visually confirmed (with the naked eye).
実施例の頭蓋内電極構造体２０では、３つの硬膜下電極３０を一列に配置し、その周囲に長さの異なる２種の針状電極４０，４２を交互に２列に配置したが、硬膜下電極３０は１つ以上であればいくつでもよく、針状電極４０，４２は２本以上であれば何本でも構わない。頭蓋内電極構造体を目視によって設置することを考えると、硬膜下電極３０は１×１（１行１列）から２×４（２行４列）の範囲内とすると共に、針状電極４０，４２は１×２（１行２列）から３×５（３行５列）の範囲内とするのが好ましい。また、実施例の頭蓋内電極構造体２０では、硬膜下電極３０の周囲に針状電極４０，４２を配置するものとしたが、例えば、硬膜下電極３０を４×６（４行６列）程度に配置し、数本の針状電極４０，４２を疎らに配置するものとしたりしても構わない。 In the intracranial electrode structure 20 of the example, the three subdural electrodes 30 are arranged in a row, and two kinds of needle-like electrodes 40 and 42 having different lengths are alternately arranged in two rows around the subdural electrode 30. Any number of subdural electrodes 30 may be used as long as one or more, and any number of acicular electrodes 40 and 42 may be used as long as there are two or more. Considering that the intracranial electrode structure is installed visually, the subdural electrode 30 is in the range of 1 × 1 (1 row and 1 column) to 2 × 4 (2 rows and 4 columns), and the needle electrode 40 and 42 are preferably in the range of 1 × 2 (1 row and 2 columns) to 3 × 5 (3 rows and 5 columns). Further, in the intracranial electrode structure 20 of the embodiment, the needle-like electrodes 40 and 42 are arranged around the subdural electrode 30. For example, the subdural electrode 30 is 4 × 6 (4 rows 6 It is also possible to arrange several needle-like electrodes 40, 42 sparsely.
実施例の頭蓋内電極構造体２０では、直径が０．２ｍｍで長さが２．５ｍｍの針状電極４０と直径が０．２ｍｍで長さが１．５ｍｍの針状電極４２とを用いるものとしたが、針状電極４０，４２の直径や長さはこれらに限定されるものではなく、如何なる直径でも如何なる長さでも構わない。また、実施例の頭蓋内電極構造体２０では、直径３．５ｍｍの台座部３２と直径１．５ｍｍの接触電極部３４とからなる硬膜下電極３０を用いるものとしたが、硬膜下電極のサイズはこれに限定されるものではなく、如何なるサイズのものを用いても構わない。 In the intracranial electrode structure 20 of the embodiment, a needle electrode 40 having a diameter of 0.2 mm and a length of 2.5 mm and a needle electrode 42 having a diameter of 0.2 mm and a length of 1.5 mm are used. However, the diameters and lengths of the needle-like electrodes 40 and 42 are not limited to these, and may be any diameter and any length. In the intracranial electrode structure 20 of the example, the subdural electrode 30 including the pedestal portion 32 having a diameter of 3.5 mm and the contact electrode portion 34 having a diameter of 1.5 mm is used. The size is not limited to this, and any size may be used.
実施例の頭蓋内電極構造体２０では、長さの異なる２種の針状電極４０，４２を配置するものとしたが、長さの異なる３種以上の針状電極を配置するものとしてもよいし、同一の長さの１種だけの針状電極しか配置されないものとしても構わない。 In the intracranial electrode structure 20 of the embodiment, two types of needle-like electrodes 40 and 42 having different lengths are arranged, but three or more types of needle-like electrodes having different lengths may be arranged. However, only one type of needle electrode having the same length may be disposed.
以上、本発明を実施するための形態について実施例を用いて説明したが、本発明はこうした実施例に何等限定されるものではなく、本発明の要旨を逸脱しない範囲内において、種々なる形態で実施し得ることは勿論である。 As mentioned above, although the form for implementing this invention was demonstrated using the Example, this invention is not limited at all to such an Example, In the range which does not deviate from the summary of this invention, it is with various forms. Of course, it can be implemented.
本発明は、頭蓋内電極構造体の製造産業などに利用可能である。 The present invention can be used in the manufacturing industry of an intracranial electrode structure.
２０ 頭蓋内電極構造体、２２ 基板、２４ アクリル基板、２６ シリコンシート、３０ 硬膜下電極、３２ 台座部、３４ 接触電極部、４０，４２ 針状電極、５０ リード取り出し部。 20 Intracranial electrode structure, 22 substrate, 24 acrylic substrate, 26 silicon sheet, 30 subdural electrode, 32 pedestal part, 34 contact electrode part, 40, 42 needle electrode, 50 lead extraction part.
Claims (3)
脳表面に接触する扁平な接触部を有する少なくとも１つの接触用電極と、
脳表面から刺入するために針状に形成されて前記接触部の径以上の間隔をもって配置された複数の針状電極と、
を備え、
前記複数の針状電極は、隣接する針状電極の長さが異なるように形成されており、
前記複数の針状電極は、第１の長さの第１針状電極と前記第１の長さとは異なる第２の長さの第２針状電極とを有し、前記第１針状電極と前記第２針状電極とが交互に配列している、
頭蓋内電極構造体。 An intracranial electrode structure placed on the surface of the brain inside the skull,
At least one contact electrode having a flat contact portion in contact with the brain surface;
A plurality of needle-like electrodes formed in a needle shape for insertion from the surface of the brain and arranged at intervals equal to or larger than the diameter of the contact portion;
Equipped with a,
The plurality of needle-like electrodes are formed so that the lengths of adjacent needle-like electrodes are different from each other,
The plurality of needle-shaped electrodes include a first needle-shaped electrode having a first length and a second needle-shaped electrode having a second length different from the first length, and the first needle-shaped electrode And the second acicular electrodes are alternately arranged,
Intracranial electrode structure.
前記接触用電極と前記複数の針状電極とが配置された樹脂製の基板と、
前記接触用電極の接触部を露出させるための少なくとも１つの貫通孔を有し、前記基板に前記接触用電極と前記針状電極とを配置した状態で前記貫通孔から前記接触部を露出させるように且つ前記複数の針状電極を貫通させるように前記基板に取り付けられたシリコンシートと、
を備える頭蓋内電極構造体。 The intracranial electrode structure according to claim 1,
A resin substrate on which the contact electrode and the plurality of needle-like electrodes are disposed;
It has at least one through hole for exposing the contact portion of the contact electrode, and the contact portion is exposed from the through hole in a state where the contact electrode and the needle electrode are arranged on the substrate. And a silicon sheet attached to the substrate so as to penetrate the plurality of needle-like electrodes,
An intracranial electrode structure comprising:
前記接触用電極は、１×１から２×４の範囲内で配列しており、
前記複数の針状電極は、１×２から３×５の範囲内で配列している、
頭蓋内電極構造体。
An intracranial electrode structure according to claim 1 or 2 ,
The contact electrodes are arranged within a range of 1 × 1 to 2 × 4,
The plurality of needle-like electrodes are arranged within a range of 1 × 2 to 3 × 5,
Intracranial electrode structure.
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