JP6413300B2 - Display body and manufacturing method of display body - Google Patents

Description

  The present invention relates to a display body using structural color development and a manufacturing method thereof.

  The structural coloration represented by morpho butterfly scales and iridescent epidermis is not the color development associated with the energy transition of the electronic state of molecules such as dyes and pigments, but the coloration phenomenon caused by the action of optical phenomena such as light diffraction, interference and scattering. is there.

  For example, multi-layer interference, which occupies the largest distribution among the structural colors existing in the natural world, is a structural color generated when reflected light generated at each interface of the laminate interferes, and a specific wavelength range is selectively used. It can be applied to a wavelength-selectable optical element that transmits or reflects light.

  However, in the optical element using the multilayer interference described above, the wavelength of the reflected light is limited by the film thickness of each layer of the laminate, and thus a display body composed of a plurality of color components on a single substrate. In order to manufacture this, masking and multilayer film formation must be repeated by the number of color components, which makes the manufacturing process very complicated.

  Therefore, a wavelength selection element using guided mode resonance has been devised (see Patent Document 1). The element has a structure in which a waveguiding layer and a grating layer made of a material having a higher refractive index than that of the substrate are sequentially formed on the substrate, and a sub-wavelength grating structure grating formed in the grating layer. It is described that a reflectivity of 100% is theoretically shown in a narrow band by optimally designing the height, structure period, fill factor (grating volume occupancy in one period), and thickness of the waveguide layer.

JP 2009-25558 A

  According to the above-mentioned Patent Document 1, even if the thickness of the grating layer is the same, different spectral characteristics can be obtained depending on the grating structure. Therefore, the thickness of the waveguide layer is set to 500 nm or less, and the light in the visible wavelength region is used. If the propagation mode is designed to be a single mode, it is said that, for example, three primary color wavelength selection elements such as color filters can be formed by batch processing using a mold or a mask.

  However, in the case of the wavelength selective element described in Patent Document 1, the structure period and fill factor of the lattice structure, the structure height, and the thickness of the waveguide layer are designed to be optimum values, so that theoretically for a specific wavelength. Although it is possible to show 100% reflection, the reflected light is limited to a narrow band. For example, when the structural period is set to 350 nm and the dimensional parameters of the lattice structure are optimized, the peak FWHM exhibiting a reflectance of 100% in the green wavelength band (full width at half maximum when the reflection peak is fitted to a Gaussian function) is about 20 nm. It is described as a degree.

  For example, a reflective color filter using a wavelength selection element that theoretically exhibits 100% reflection as a narrow band as described above as R (red), G (green), and B (blue) sub-pixels. Therefore, when a reflected image having a color is expressed under a white light source such as sunlight or a fluorescent lamp, since the FWHM of the reflection peak is narrow, the brightness of the reflected light on the element surface is small, and the reflectivity is theoretically 100%. Even if it is shown, it becomes an unclear reflection image with human eyes.

  Furthermore, in the wavelength selective element described in Patent Document 1, when the reflectance of the peak portion of the reflection spectrum is designed to be increased, as a side effect, the reflectance also increases in the base portion other than the peak portion, and as a result, the reflected light There is concern that the hue and saturation may be impaired.

  Although the reflectance of the base portion can be lowered by the design of the lattice structure, the reflectance of the peak portion is lowered as a side effect, and the FWHM of the reflection peak is narrowed, resulting in a decrease in brightness as a result. Concerned.

  From the above, for example, even if pixels or sub-pixels consisting of wavelength selection elements designed to have a theoretical reflectance of 100% in each RGB wavelength band are formed by batch processing, they can be expressed by these three primary colors. Since the color space is limited, it is difficult to express various colors under a white light source such as sunlight or a fluorescent lamp.

  In view of the above problems, the present invention provides the following display body in order to solve this problem.

The display according to claim 1 includes a base material, a waveguide layer formed on the base material, and a lattice layer formed on the waveguide layer, and reflects light in a specific wavelength region. A display body having a pixel or sub-pixel region in which a lattice layer formed in the pixel or sub-pixel region is a one-dimensional diffractive structure or a lattice-like periodic concavo-convex structure having a linear periodic concavo-convex structure consists of a two dimensional diffraction structure consisting period of the one-dimensional diffractive structure or the two-dimensional diffraction structure constituting the grating layer, der 2 or more is, one-dimensional diffraction having two or more structural period In a structure or a two-dimensional diffractive structure, a difference in peak wavelength position between a reflection peak in an arbitrary structure period and a reflection peak in another structure period adjacent thereto is the FWHM value of a single reflection peak in an arbitrary structure period Less than twice Structural period is characterized that you have been determined so that.

The display according to claim 2 is characterized in that the ratio of the convex dimension to the structural period of the one-dimensional diffractive structure or the two-dimensional diffractive structure is constant regardless of the structural period.

The display according to claim 3 is characterized in that the refractive index in the visible light wavelength region of the material constituting the waveguide layer is larger than the refractive index in the visible light wavelength region of the material constituting the substrate. To do.

The display according to claim 4 is characterized in that at least the lattice layer is made of a resin material.

The display body according to claim 5 is characterized in that the waveguide layer and the lattice layer are made of the same material.

  Moreover, this invention provides the manufacturing method of the following display bodies.

6. A method of manufacturing a display body, comprising: a step of preparing a mold; and the mold (i) a one-dimensional diffractive structure comprising a linear periodic concavo-convex structure having two or more types of structural periods on a surface. or a pixel or region of sub-pixels which are constituted by a two-dimensional diffraction structure consisting periodic lattice uneven structure, at the corresponding pixel or sub-pixel of the display to be replicated by transferring from (ii) those the mold In a one-dimensional diffractive structure or a two-dimensional diffractive structure, a difference in peak wavelength position between a reflection peak in an arbitrary structure period and a reflection peak in another adjacent structure period is a single reflection peak in an arbitrary structure period. The structural period of the diffractive structure formed in the pixel or sub-pixel region of the mold is determined so that it is less than twice the FWHM value of (iii). In the diffractive structure formed in the subpixel region, the ratio of the convex dimension to the structural period is constant regardless of the structural period. A diffractive structure formed in the pixel or sub-pixel region on the photo-curable resin applied from the mold to the substrate by the photo-nanoimprint method by applying a photo-curable resin composed of a material with a high refractive index. It comprises the process of transferring a body.

7. A method of manufacturing a display body, comprising: a step of preparing a mold; and (i) a one-dimensional diffractive structure having a linear periodic concavo-convex structure having two or more types of structural periods on a surface. or a pixel or region of sub-pixels which are constituted by a two-dimensional diffraction structure consisting periodic lattice uneven structure, at the corresponding pixel or sub-pixel of the display to be replicated by transferring from (ii) those the mold In a one-dimensional diffractive structure or a two-dimensional diffractive structure, a difference in peak wavelength position between a reflection peak in an arbitrary structure period and a reflection peak in another adjacent structure period is a single reflection peak in an arbitrary structure period. The structural period of the diffractive structure formed in the pixel or sub-pixel region of the mold is determined so that it is less than twice the FWHM value of (iii). In the diffractive structure formed in the subpixel region, the ratio of the convex dimension to the structural period is constant regardless of the structural period. Applying a thermoplastic resin or thermosetting resin composed of a material with a high refractive index and applying a thermal nanoimprint method to the thermoplastic resin or thermosetting resin applied to the substrate from the mold, the pixel or subpixel And a step of transferring the diffractive structure formed in the region.

  According to the present invention, the FWHM of the reflection spectrum in the pixel or subpixel region is widened by forming a plurality of diffractive structures having different structural periods in the pixel or subpixel region. Furthermore, even when the diffraction structure of each structure period is designed so that the reflectance of the base portion of the reflection spectrum is low, the reflection peak in the structure of a single period is low and the FWHM is narrow, but the pixel or sub-structure is reduced. The FWHM of the reflection spectrum in the entire area of the pixel becomes wider. In addition, since the ratio of the convex dimension to the structural period of the diffractive structure having a different structural period formed in the pixel or sub-pixel region is constant regardless of the structural period, for example, by batch processing by the nanoimprint method. Even when pixels or sub-pixels are formed and the formed remaining film is used as a waveguide layer, the remaining film thickness is constant regardless of the structural period. As a result, for example, even when sub-pixels that reflect the wavelength bands of the three primary colors of RGB are collectively processed by the nanoimprint method and used as a color filter, the color space that can be expressed by these three primary colors can be expanded. There is an effect that various colors can be expressed under a white light source such as light or fluorescent light.

Schematic diagram of pixels or sub-pixels of a display body according to an embodiment of the present invention Schematic diagram of a sub-pixel of a display body according to an embodiment of the present invention. Calculation result of reflection spectrum by RCWA method for sub-pixels in which lattice layer is formed with linear periodic irregularities with single structure period Calculation result of reflection spectrum by RCWA method for sub-pixels in which lattice layers are sequentially formed with linear periodic irregularities with seven different structural periods

Embodiments of the present invention will be described with reference to the drawings.
The present invention is not limited to the target wavelength region, but in the embodiment described below, light in the visible light wavelength region that can be identified by the human naked eye will be described. In the present invention, a pixel includes the meaning of a unit (dot) for performing a minimum drawing expression on a printed matter or the like. In the present invention, the sub-pixel refers to a plurality of pixels forming one pixel, such as each RGB region in a color filter or the like.

  FIG. 1 is a schematic diagram of pixels or sub-pixels of a display body according to an embodiment of the present invention. FIG. 1A is a plan view of a pixel or subpixel region as viewed from directly above, and FIG. 1B is a cross-sectional view showing a structural period in the pixel or subpixel region.

  As shown in FIG. 1A, i (i is an integer of 2 or more) lattice layer forming regions 31 to 32 are formed in the pixel or sub-pixel region forming the display body of the present invention. . In each lattice layer forming region, diffractive structures having i types of structural periods from the structural period P1 to the structural period Pi are sequentially formed. As shown in FIG. 1 (b), in each of the diffractive structures having the structural periods P 1 to Pi, the waveguide layer 2 is formed on the substrate 1, and the lattice layer 3 is formed on the waveguide layer 2. This is a so-called guided mode resonance grating structure.

  In order to obtain a guided mode resonant grating, the structural period Pi of the diffractive structure formed in the grating layer 3 needs to be a sub-wavelength period shorter than the wavelength at which it acts. Furthermore, at least the material constituting the waveguide layer 2 needs to be composed of a material having a high refractive index with respect to the visible light wavelength region of the material constituting the substrate 1. It can be said that the larger the refractive index difference between the base material 1 and the waveguide layer 2 in the visible light wavelength region, the better. In addition, the extinction coefficient of the material constituting at least the waveguide layer 2 and the grating layer 3 with respect to the visible light wavelength region is preferably close to zero.

  Since the structure formed in the lattice layer 3 is a subwavelength structure, photolithography, charged particle beam lithography, nanoimprint lithography, or the like may be used to form the display body of the present invention. A resin pattern having a subwavelength structure is formed by the lithography, and the lattice layer 3 can be formed by an existing technique such as dry etching using the resin pattern as a mask. In this case, the material forming the waveguide layer 2 needs to be resistant to the dry etching conditions of the material forming the lattice layer 3. When the refractive index of the resin material satisfies the above condition, the resin material can be applied as it is as the lattice layer 3. However, when nanoimprint lithography is applied, a residual film peculiar to the process is generated, and it is necessary to remove this residual film by plasma exposure. In this case, the material forming the waveguide layer 2 needs to have resistance to the remaining film removal conditions.

  In addition, since the refractive index with respect to the visible light wavelength range of the material which comprises the waveguide layer 2 and the grating layer 3 may be equal, it is also possible to form the waveguide layer 2 and the grating layer 3 with the same material. is there. Therefore, for example, a photo-curing resin, a thermoplastic resin, or a thermosetting resin is applied on the substrate 1 and pattern transfer is performed by the nanoimprint method, whereby the waveguide layer 2 and the lattice layer 3 are collectively formed. It is also possible. In this case, the waveguide layer 2 corresponds to the remaining film formed by nanoimprinting. However, when transferring a pixel having a plurality of structural periods as shown in FIG. It is preferable that the fill factor (wi / Pi) of the structure period is constant (see FIG. 1B).

  The thickness of the waveguiding layer 2 needs to be 500 nm or less at which the propagation mode becomes a single mode in the visible light wavelength region. In the case where light having a wavelength longer than the visible light wavelength region is targeted, the thickness of the waveguide layer 2 may be 500 nm or more.

  A reflection spectrum from a waveguide mode resonance grating having a constant structure period can be calculated by using, for example, the Rigorous Coupled-Wave Analysis (RCWA) method. If the RCWA method is used, it is possible to predict the reflection spectrum of the waveguide mode resonance grating by inputting parameters such as the structure period, fill factor, and the thickness of the grating layer 3 and the waveguide layer 2. The structural period of the diffractive structure formed in the pixel or subpixel region can be determined based on the calculation result by the RCWA method.

  In the waveguide mode resonance grating, if the parameters other than the structure period are constant and the reflection spectrum when the structure period is changed is calculated by the RCWA method, the reflection peak wavelength is shifted according to the change amount of the structure period. Therefore, for example, a pixel region is divided into 10 equal parts in the X direction, and a grating layer in which a diffractive structure having a structural period P1 is formed in the 10 regions and a grating layer in which a diffractive structure having a structural period P2 is formed. If the lattice layer formation region of each structural period is sufficiently smaller than the spatial resolution on the light receiving side, the reflected light from the pixel region is assumed to be a mixture of the reflected light from each diffractive structure. It will be observed at the light receiving part. At this time, if the shift amount of the reflection peak wavelength with respect to the change of the structure period is smaller than twice the FWHM of the reflection peak of each structure period alone, the reflection spectrum observed at the light receiving portion is 2 without the peak being separated. Two peaks are superimposed. The FWHM obtained by fitting this reflection peak to the Gaussian function is larger than the FWHM of the reflection peak of the diffraction structure composed of the structural periods of P1 and P2 alone.

  In the present invention, since the FWHM of the reflection peak can be widened by forming the grating layer 3 in which the diffractive structure having a plurality of structural periods is formed, a single color that can be recognized by the human naked eye is single. Brighter than a pixel or subpixel in which a grating layer made of a diffractive structure having a structure period is formed. Therefore, for example, when the grating structure is designed so that the reflectance of the base portion is lowered in order to increase the hue and saturation, it is possible to widen the FWHM by arranging a plurality of diffraction structures having different structural periods. For this reason, it is possible to manufacture a display body having good hue and saturation in addition to lightness.

  In the schematic diagram of the pixel or sub-pixel in FIG. 1 in which i types of structure periods are arranged, the structure period and the numerical value of i corresponding to the FWHM to be obtained are determined using the calculation by the RCWA method, and the lattice layer 3 is passed. It ’s fine.

  The pixel or subpixel region shown in FIG. 1 may be determined based on the spatial resolution on the light receiving side. For example, the spatial resolution of the human naked eye is typically 100 μm when viewed from a distance of 30 cm. Therefore, if a square region having a side of 100 μm is used as one pixel and diffractive structures having different structure periods are sequentially formed therein, a display body using a structural color by a waveguide mode resonance grating can be manufactured. Since the grating layer 3 is a sub-wavelength structure, the size of the pixel region may be set to 5 μm or 10 μm, for example, in order to produce a higher resolution display.

  As shown in FIG. 1, when a pixel or sub-pixel region is divided in the X direction and a diffractive structure having a different structure period is formed in each divided region, the structure period changes if the division period in the X direction is constant. When a periodic structure other than the adjacent structural period is formed at the boundary, the joint may occur at the boundary where the structural period changes. In that case, for example, a joint is not generated by making one side dividing a pixel or subpixel region a multiple of each structural period.

  When the diffractive structure formed on the grating layer 3 is a one-dimensional diffractive structure having a linear periodic concavo-convex structure, a change occurs in the spectrum obtained by the polarization of light. In order to reduce the influence of light polarization, a one-dimensional diffractive structure composed of a linear periodic concavo-convex structure in which a pixel or subpixel region is divided not only in the X direction but also in the Y direction and arranged in the X direction; A one-dimensional diffractive structure composed of linear periodic concavo-convex structures arranged in the Y direction may be appropriately arranged, or a two-dimensional diffractive structure composed of a lattice-shaped periodic concavo-convex structure may be used. The arrangement of the diffractive structures may be ordered or random.

Embodiments in which subpixels are manufactured using the present invention will be described below with reference to the drawings.
FIG. 2 is a schematic view of a sub-pixel of a display body produced in the example of the present invention. FIG. 2A is a plan view of the subpixel region as viewed from directly above, and FIG. 2B is a cross-sectional view of the single structure periodic region. In this embodiment, an optical nanoimprint method using ultraviolet light as a light source is employed, but thermal nanoimprint using a thermoplastic resin or a thermosetting resin may be applied as long as the refractive index of the material satisfies the conditions.

  First, in order to determine the structure period P, the fill factor F = w / P, the structure height d1, and the waveguide layer thickness d2 of the linear periodic concavo-convex structure, calculation by the RCWA method was performed. As the refractive index of the material used for the calculation, the refractive index of the synthetic quartz glass is used for the base material 1, and the refractive index of the photocurable resin MUR-6 (manufactured by Maruzen Petrochemical Co., Ltd.) is used for the waveguide layer 2 and the lattice layer 3. Applied respectively. The calculation by the RCWA method in this example was performed assuming an RGB three-color filter.

  First, the calculation was performed assuming that the structure period of the linear periodic concavo-convex structure formed in the subpixel is single. FIG. 3 shows a reflection spectrum obtained by calculation by the RCWA method. 3A shows the reflection spectrum of the blue (B) subpixel, FIG. 3B shows the reflection spectrum of the green (G) subpixel, and FIG. 3C shows the reflection spectrum of the red (R) subpixel. In this calculation, the structural design was performed so as to make the reflection intensity of the base portion as low as possible. In the reflection spectrum shown in FIG. 3, the values of the structural height d1 and the waveguide layer thickness d2 are fixed, and d1 = 250 nm and d2 = 150 nm, respectively. In the blue (B) subpixel of FIG. 3A, P = 292 nm and F = 0.45. In the green (G) subpixel of FIG. 3B, P = 360 nm and F = 0.40. In the red (R) subpixel of FIG. 3A, P = 418 nm and F = 0.35.

  Subsequently, as shown in FIG. 2A, the sub-pixel region is divided into seven regions 51 to 57 in the X direction, and linear periodic concavo-convex structures having seven different structural periods are sequentially formed in these regions 51 to 57. Calculated for the case of formation. FIG. 4 shows a reflection spectrum obtained by calculation by the RCWA method. 4A shows the reflection spectrum of the blue (B) subpixel, FIG. 4B shows the reflection spectrum of the green (G) subpixel, and FIG. 4C shows the reflection spectrum of the red (R) subpixel. The values of the structure height d1 and the waveguide layer thickness d2 are the same as those in FIG. In the subpixel of blue (B) in FIG. 4A, the structural period is changed by ± 4 nm around the structural period of 292 nm, Pa = 280 nm, Pb = 284 nm, Pc = 288 nm, Pd = 292 nm, Pe = 296 nm, Pf = 300 nm, Pg = 304 nm, and F = 0.45 for all structural periods. In the green (G) subpixel of FIG. 4B, the structure period is changed by ± 4 nm around the structure period of 360 nm, and Pa = 348 nm, Pb = 352 nm, Pc = 356 nm, Pd = 360 nm, Pe = 364 nm, Pf = 368 nm, Pg = 372 nm, and F = 0.40 in all structural periods. In the red (R) subpixel of FIG. 4C, the structural period is changed by ± 4 nm around the structural period of 418 nm, Pa = 406 nm, Pb = 410 nm, Pc = 414 nm, Pd = 418 nm, Pe = 422 nm, Pf = 426 nm, Pg = 430 nm, and F = 0.35 in all structural periods.

  When the xy coordinates of the xy chromaticity diagram are calculated from the respective reflection spectra of FIGS. 3 and 4, x = 0.2308 and y = 0.1304 in FIG. 3A, and x = 0 in FIG. 3B. 2906, y = 0.5487, and in FIG. 3C, x = 0.5808 and y = 0.3678, whereas in FIG. 4A, x = 0.1771, y = 0.0639, In FIG. 4B, x = 0.2689 and y = 0.6621, and in FIG. 4C, x = 0.6198 and y = 0.3409. As described above, when the linear periodic concavo-convex structure having seven different structural periods is sequentially formed as shown in FIG. 2A, the linear periodic concavo-convex structure has a single structure period. It was confirmed that the color reproduction range was widened.

  Among the subpixels calculated by the RCWA method, the subpixel shown in FIG. 2 was fabricated using the optical nanoimprint method for the green (G) subpixel shown in FIG. 4B.

  On the synthetic quartz glass substrate 4 serving as a mold, an area was formed in which one-dimensional diffractive structures composed of linear periodic concavo-convex structures having seven different structural periods were sequentially formed as shown in FIG. In order to transfer the mold and form a sub-pixel having a structural design showing a reflection spectrum in FIG. 4B, the region arrangement of the linear periodic concavo-convex structure having seven different structural periods formed on the mold surface is mirror-inverted, A linear periodic uneven structure having a factor F = 0.60 was adopted. The height of the concavo-convex structure was 250 nm, the same as d1. The sub-pixel region was a square with a side of 70 μm, and 10,000 of them were arranged without overlapping in a square region with a side of 7 cm. The mold manufacturing method is based on a combination of the conventional charged particle beam exposure method and dry etching. The structural period and fill factor were controlled by the charged particle beam lithography process, and the structural height was controlled by dry etching. Thus, an ultraviolet nanoimprint mold was prepared.

  Optool HD-1100Z (manufactured by Daikin Industries) was applied as a release agent to the surface of the mold for ultraviolet nanoimprint.

Subsequently, a photocurable resin MUR-6 (manufactured by Maruzen Petrochemical Co., Ltd.) having a film thickness of 250 nm is applied onto the quartz glass substrate 4 and brought into contact with the surface of the ultraviolet nanoimprint mold on which the release agent has been applied. Then, ultraviolet light having a wavelength of 365 nm was irradiated from the back surface of the mold for ultraviolet nanoimprint to cure the photocurable resin. This treatment was performed at room temperature, and the exposure amount of ultraviolet light was 100 mJ / cm ² .

  Next, the quartz glass substrate 4 is peeled off from the ultraviolet nanoimprint mold, and the lattice layer forming region 51 having the structural period Pa, the lattice layer forming region 52 having the structural period Pb, the lattice layer forming region 53 having the structural period Pc, and the structural period Pd. A waveguide made of a photocurable resin, in which a lattice layer forming region 54, a lattice layer forming region 55 having a structural period Pe, a lattice layer forming region 56 having a structural period Pf, and a lattice layer forming region 57 having a structural period Pg are sequentially formed. The display body which consists of a subpixel in which the layer and the lattice layer 5 were formed was obtained.

  The wavelength of green having a wide FWHM that is not different from the reflection spectrum shown in FIG. 4B in the sub-pixel region in which the linear periodic concavo-convex structure having the seven different structural periods shown in FIG. Band reflection was confirmed. As described above, a display body excellent in hue, saturation, and brightness using structural coloration by the waveguide mode resonance grating in the region where the sub-pixel was formed was obtained.

  The display body of this invention can be utilized for the display thing with high design property. Moreover, since it is a display body having a fine pattern formed with high precision, it is expected to be used for anti-counterfeiting technology.

DESCRIPTION OF SYMBOLS 1 ... Base material 2 ... Waveguide layer 3 ... Lattice layer 4 ... Quartz glass substrate 5 ... Waveguide layer and grating layer 31 which consist of photocurable resin ... Structural period P1 Lattice layer formation region 32 ... lattice layer formation region 51 with structure period Pi ... lattice layer formation region 52 with structure period Pa ... lattice layer formation region 53 with structure period Pb ... lattice layer with structure period Pc Formation region 54 ... Lattice layer formation region 55 with structure period Pd ... Lattice layer formation region 56 with structure period Pe ... Lattice layer formation region 57 with structure period Pf ... Lattice layer formation region with structure period Pg

Claims (7)

A pixel or sub-pixel having a substrate, a waveguide layer formed on the substrate, and a lattice layer formed on the waveguide layer, and having an element that reflects light in a specific wavelength region A display body having a region,
The grating layer formed in the pixel or sub-pixel region is composed of a one-dimensional diffractive structure composed of a linear periodic concavo-convex structure or a two-dimensional diffractive structure composed of a lattice-shaped periodic concavo-convex structure,
Structural period of the one-dimensional diffractive structure or the two-dimensional diffraction structure constituting the grating layer state, and are two or more,
In the one-dimensional diffractive structure or the two-dimensional diffractive structure having the two or more types of structure periods, a difference in peak wavelength position between a reflection peak in an arbitrary structure period and a reflection peak in another structure period adjacent thereto. but wherein the Rukoto structure period is determined to be less than 2 times the FWHM value of the reflection peak of sole in the arbitrary structural period, the display body. 2. The display body according to claim 1, wherein a ratio of a convex portion dimension to a structural period of the one-dimensional diffractive structure or the two-dimensional diffractive structure is constant regardless of a structural period. Refractive index in the visible light wavelength region of the material of the waveguide layer, being greater than the refractive index in the visible light wavelength region of the material constituting the substrate, according to claim 1 or claim 2 Display body described in 1. At least the grating layer, characterized in that it is composed of a resin material, a display element according to any one of claims 1 to 3. The waveguide layer and said grid layer, characterized in that it is made of the same material, the display body according to any one of claims 1 to 4. A method of manufacturing a display body,
Preparing a mold;
The mold has (i) a pixel or sub-surface composed of a one-dimensional diffractive structure composed of a linear periodic concavo-convex structure having two or more types of structural periods or a two-dimensional diffractive structure composed of a lattice-shaped periodic concavo-convex structure on the surface. It has a region of pixels, (ii) reflection peak in the corresponding in one-dimensional diffraction structure or two-dimensional diffraction structure in a pixel or sub-pixel, any structural period of the display to be replicated by transferring from this the mold And the pixel or sub-pixel of the mold so that the difference in peak wavelength position between the reflection peak in the other structural period and the adjacent structural period is less than twice the FWHM value of the single reflection peak in the arbitrary structural period. And (iii) in the diffractive structure formed in the pixel or sub-pixel region, the structure period is determined. The ratio of the convex dimension to is constant regardless of the structure period,
On the base material, a step of applying a photocurable resin composed of a material having a higher refractive index with respect to the visible light wavelength region than the base material;
A step of transferring a diffractive structure formed in the region of the pixel or subpixel to the photocurable resin applied on the base material from the mold by an optical nanoimprint method, Manufacturing method of display body. A method of manufacturing a display body,
Preparing a mold;
The mold has (i) a pixel or sub-surface composed of a one-dimensional diffractive structure composed of a linear periodic concavo-convex structure having two or more types of structural periods or a two-dimensional diffractive structure composed of a lattice-shaped periodic concavo-convex structure on the surface. It has a region of pixels, (ii) reflection peak in the corresponding in one-dimensional diffraction structure or two-dimensional diffraction structure in a pixel or sub-pixel, any structural period of the display to be replicated by transferring from this the mold And the pixel or sub-pixel of the mold so that the difference in peak wavelength position between the reflection peak in the other structural period and the adjacent structural period is less than twice the FWHM value of the single reflection peak in the arbitrary structural period. And (iii) in the diffractive structure formed in the pixel or sub-pixel region, the structure period is determined. The ratio of the convex dimension to is constant regardless of the structure period,
Applying a thermoplastic resin or a thermosetting resin made of a material having a higher refractive index to the visible light wavelength region than the base material on the base material;
Transferring the diffractive structure formed in the region of the pixel or sub-pixel from the mold to the thermoplastic resin or the thermosetting resin applied on the substrate by the thermal nanoimprint method. A method for producing a display body characterized by the above.

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