JP6338835B2 - Acid gel for decontamination of radioactive material and decontamination method - Google Patents
Acid gel for decontamination of radioactive material and decontamination method Download PDFInfo
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- JP6338835B2 JP6338835B2 JP2013175461A JP2013175461A JP6338835B2 JP 6338835 B2 JP6338835 B2 JP 6338835B2 JP 2013175461 A JP2013175461 A JP 2013175461A JP 2013175461 A JP2013175461 A JP 2013175461A JP 6338835 B2 JP6338835 B2 JP 6338835B2
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- Prior art keywords
- acid
- decontamination
- gel
- radioactive
- acidic gel
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- 230000003588 decontaminative effect Effects 0.000 title claims description 28
- 239000002253 acid Substances 0.000 title claims description 21
- 239000012857 radioactive material Substances 0.000 title claims description 3
- 230000002378 acidificating effect Effects 0.000 claims description 30
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- 239000000941 radioactive substance Substances 0.000 claims description 9
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- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 8
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Description
本発明は、表面に放射性物質を有する固体の表面を除染するために使用することができる酸性ゲル、及びその酸性ゲルを用いた除染方法に関する。除染は、例えば放射能除染であってよい。 The present invention relates to an acidic gel that can be used to decontaminate a solid surface having a radioactive substance on the surface, and a decontamination method using the acidic gel. The decontamination may be, for example, radioactive decontamination.
酸性ゲルは、金属、プラスチック、セラミック、多孔質(例えばコンクリート)などの処理すべき全ての種類の固体の表面に使用することができる。 Acid gels can be used on the surface of all types of solids to be treated, such as metals, plastics, ceramics, porous (eg concrete).
放射能除染をはじめとした除染は、一般に、高い除去率で、除染に使用する薬液量が少なく、かつ、作業負担が少ない、すなわち、除染作業にかかる時間が短い、大型の処理設備の必要がない、等の事項が重要視される。 In general, decontamination including radioactive decontamination is a large-scale treatment with a high removal rate, a small amount of chemical solution used for decontamination, and a low work load, that is, a short time for decontamination work. Matters such as no need for facilities are regarded as important.
除染の一例として、特許文献1にはマロン酸とヒドラジンを有効成分として含有する、高い洗浄性を有する組成物が提案されている。しかし、薬液中に除染対象物を浸漬しなければならないため新たな設備や機材が必要である。また80℃〜100℃の溶液の中に除染対象物を浸漬しなければならないため、作業中の薬液の管理や長時間の連続作業等の人的負担が大きい。 As an example of decontamination, Patent Document 1 proposes a composition having high detergency containing malonic acid and hydrazine as active ingredients. However, since the decontamination object must be immersed in the chemical solution, new equipment and equipment are required. Moreover, since it is necessary to immerse the decontamination target in a solution at 80 ° C. to 100 ° C., human burdens such as management of chemicals during work and continuous work for a long time are great.
特許文献2には、硝フッ酸、硝フッ酸及びシュウ酸、硝フッ酸及び過マンガン酸、硝フッ酸及び過マンガン酸カリウム、硝フッ酸及びクエン酸のいずれか1つ以上を含み、かつゲル化剤、および溶媒を含有する、除染対象表面に塗布し表面に保持される組成物が提案されている。しかし、除染工程後の線量が除染前の1/2以下と除去率が低い。特許文献3および4には、除染対象表面に塗布後、ブラッシング・吸引等により容易に除去可能な無機酸、酸化剤、ゲル化剤、等を含有するコロイド溶液が提案されている。しかし、塗布後の薬品は最終的には乾燥するが時間を要するため、周辺環境によっては乾燥した薬品が除染工程中に除染対象表面から剥離する可能性が潜在的に存在する。 Patent Document 2 includes one or more of nitric hydrofluoric acid, nitric hydrofluoric acid and oxalic acid, nitric hydrofluoric acid and permanganic acid, nitric hydrofluoric acid and potassium permanganate, nitric hydrofluoric acid and citric acid, and A composition containing a gelling agent and a solvent, which is applied to the surface to be decontaminated and held on the surface, has been proposed. However, the dose after the decontamination process is 1/2 or less before the decontamination and the removal rate is low. Patent Documents 3 and 4 propose colloidal solutions containing an inorganic acid, an oxidizing agent, a gelling agent, and the like that can be easily removed by brushing, suction, or the like after being applied to the surface to be decontaminated. However, since the chemical after application is finally dried, it takes time. Depending on the surrounding environment, there is a possibility that the dried chemical may be detached from the surface to be decontaminated during the decontamination process.
従来の化学除染法は、除染対象物が大型の場合、除染処理設備の新設や大型化、多量の薬品が必要となることや作業後の廃液処理費用が増大するという問題があった。また、薬液の使用量が少なくても、除染や安全といった面で十分でなかった。 Conventional chemical decontamination methods have problems in that if the object to be decontaminated is large, a new decontamination treatment facility is installed, the size is increased, a large amount of chemicals are required, and the cost of waste liquid treatment after work increases. . Moreover, even if the amount of the chemical used is small, it is not sufficient in terms of decontamination and safety.
本発明は、新たな設備や施設を必要としない、薬液の使用量が少なく安定に除染可能な除洗材料及び除染方法を提供することを目的とする。 An object of the present invention is to provide a decontamination material and a decontamination method that do not require new equipment and facilities and that can be stably decontaminated with a small amount of chemical solution.
本発明は、以下の酸性ゲルおよび除染方法を提供するものである。
項1.
(i) 無機酸及び有機酸からなる群から選ばれる少なくとも1種の酸(ii)有機高分子系増粘剤及び(iii)水溶性の非プロトン性溶媒を含有する酸性ゲルであって、(i)酸の割合が、5〜80重量%である酸性ゲル。
項2.
(i)酸が、硫酸、硝酸、塩酸及びフッ酸からなる群から選ばれる少なくとも1種を含む、項1に記載の酸性ゲル。
項3.
(ii)有機高分子系増粘剤が粘度平均分子量170万以上のポリエチレングリコールである項1又は2のいずれか1項に記載の酸性ゲル。
項4.
(ii)有機高分子系増粘剤がキサンタンガムである項1〜3のいずれか1項に記載の酸性ゲル。
項5.
(iii)水溶性の非プロトン性溶媒がジメチルホルムアミド、ジメチルスルホキシト゛から選ばれる1種もしくは2種である項1〜4のいずれか1項に記載の酸性ゲル。
項6.
酸性ゲル100重量部に対し、(ii)有機高分子系増粘剤を3〜20重量%含む項1〜5のいずれか1項に記載の酸性ゲル。
項7.
項1〜6のいずれか1項に記載の酸性ゲルを表面に放射性物質を有する除染対象の固体の表面に接触させることを特徴とする、固体の除染方法。
項8.
除染対象の固体表面が金属表面である項7に記載の方法。
項9.
除染対象の固体表面がステンレス表面である項7又は8に記載の方法。
The present invention provides the following acidic gel and decontamination method.
Item 1.
(i) an acidic gel containing at least one acid selected from the group consisting of inorganic acids and organic acids (ii) an organic polymer thickener and (iii) a water-soluble aprotic solvent, i) An acidic gel having an acid ratio of 5 to 80% by weight.
Item 2.
(I) The acidic gel according to item 1, wherein the acid comprises at least one selected from the group consisting of sulfuric acid, nitric acid, hydrochloric acid and hydrofluoric acid.
Item 3.
(Ii) The acidic gel according to any one of Items 1 and 2, wherein the organic polymer thickener is polyethylene glycol having a viscosity average molecular weight of 1.7 million or more.
Item 4.
(Ii) The acidic gel according to any one of Items 1 to 3, wherein the organic polymer thickener is xanthan gum.
Item 5.
(Iii) The acidic gel according to any one of Items 1 to 4, wherein the water-soluble aprotic solvent is one or two selected from dimethylformamide and dimethyl sulfoxide.
Item 6.
Item 6. The acidic gel according to any one of Items 1 to 5, comprising 3 to 20% by weight of an organic polymer thickener with respect to 100 parts by weight of the acidic gel.
Item 7.
Item 7. A solid decontamination method, wherein the acidic gel according to any one of Items 1 to 6 is brought into contact with the surface of a solid to be decontaminated having a radioactive substance on the surface.
Item 8.
Item 8. The method according to Item 7, wherein the solid surface to be decontaminated is a metal surface.
Item 9.
Item 9. The method according to Item 7 or 8, wherein the solid surface to be decontaminated is a stainless steel surface.
本発明の酸性ゲルは、時間経過に伴う粘度低下が少ないため、粘度低下後の薬品が除染対象表面から除去されず保持され、安定した除染が可能となる。また、本発明の酸性ゲルは、有機高分子系の増粘剤を用いたゲルであり、放射性廃棄物の量を減量できる。加えて、塗布のみで施工できるため、新たな設備や機器は必要としない。 Since the acidic gel of the present invention has little decrease in viscosity over time, the chemical after the decrease in viscosity is retained without being removed from the surface to be decontaminated, and stable decontamination is possible. The acidic gel of the present invention is a gel using an organic polymer thickener, and can reduce the amount of radioactive waste. In addition, since it can be applied only by coating, no new equipment or equipment is required.
本発明のゲルは、(i) 無機酸及び有機酸からなる群から選ばれる少なくとも1種の酸(ii)有機高分子系増粘剤及び(iii)水溶性の非プロトン性溶媒を含有する酸性ゲルであって、(i)酸の割合が、15〜60重量%である酸性ゲルからなる。 The gel of the present invention comprises (i) at least one acid selected from the group consisting of inorganic acids and organic acids (ii) an organic polymer thickener and (iii) a water-soluble aprotic solvent. It is a gel comprising (i) an acidic gel having an acid ratio of 15 to 60% by weight.
(i) 無機酸及び有機酸からなる群から選ばれる少なくとも1種の酸
有機酸としては、ギ酸、酢酸、グリコール酸、乳酸、リンゴ酸、酒石酸、ヒドロキシアクリル酸、オキシ酪酸、グリセリン酸、グルコン酸、クエン酸、ヒドロキシピバリン酸、グリセリン酸、タルトロン酸、マンデル酸、β−ヒドロキシプロピオン酸、β−ヒドロキシブタン酸、β−ヒドロキシペンタン酸、マロン酸、コハク酸、グルタル酸、アジピン酸、ピメリン酸、アゼライン酸、ジグリコール酸、マレイン酸、フマル酸、1,2,3−プロパントリカルボン酸、1,2,3,4−ブタンテトラカルボン酸、メタンスルホン酸、エタンスルホン酸、トルエンスルホン酸等が挙げられる。無機酸としてはフッ酸、硝酸、塩酸、臭化水素酸、硫酸、リン酸、ホウ酸、過塩素酸を挙げることができる。これらの酸は除去対象の材質に応じて選択することができるが、好ましくは無機酸であり、さらに好ましくは硫酸、硝酸、塩酸、フッ酸である。これらの酸は1種単独で、又は2種以上を組合せて用いることができる。
(i) At least one acid selected from the group consisting of inorganic acids and organic acids Organic acids include formic acid, acetic acid, glycolic acid, lactic acid, malic acid, tartaric acid, hydroxyacrylic acid, oxybutyric acid, glyceric acid, gluconic acid , Citric acid, hydroxypivalic acid, glyceric acid, tartronic acid, mandelic acid, β-hydroxypropionic acid, β-hydroxybutanoic acid, β-hydroxypentanoic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, Azelaic acid, diglycolic acid, maleic acid, fumaric acid, 1,2,3-propanetricarboxylic acid, 1,2,3,4-butanetetracarboxylic acid, methanesulfonic acid, ethanesulfonic acid, toluenesulfonic acid, etc. It is done. Examples of inorganic acids include hydrofluoric acid, nitric acid, hydrochloric acid, hydrobromic acid, sulfuric acid, phosphoric acid, boric acid, and perchloric acid. These acids can be selected according to the material to be removed, but are preferably inorganic acids, and more preferably sulfuric acid, nitric acid, hydrochloric acid, and hydrofluoric acid. These acids can be used alone or in combination of two or more.
酸は酸性ゲルの総量を基準として5〜80重量%、好ましくは10〜70重量%、さらに好ましくは15〜60重量%である。 The acid is 5 to 80% by weight, preferably 10 to 70% by weight, more preferably 15 to 60% by weight, based on the total amount of the acidic gel.
(ii)有機高分子系増粘剤
有機高分子系の増粘剤は、例えば、ポリアルキレングリコール、カルボキシビニルポリマー、ポリアクリル酸およびその中和物、ポリビニルアルコール、ポリビニルピロリドン、ポリエーテル、等に代表される高分子化合物、ヒドロキシエチルセルロース、キサンタンガム、ダイユータンガム、ジェランガム、タマリンドガム、グアーガム、アルギン酸ナトリウム、カラギーナン、ペクチン等に代表される多糖類誘導体、デキストリン脂肪酸エステル、イヌリン脂肪酸エステル等に代表されるオイルゲル化剤、両末端リジン変性シリコーン、架橋型ジメチルシリコーン等に代表されるシリコーン系増粘ゲル化剤、ポリアミド樹脂、アミノ酸系ゲル化剤、ジステアリン酸アルミニウム、ゼラチン、等を挙げることができ、好ましくはポリエチレングリコール、キサンタンガムである。無機増粘剤を含有しないことが好ましい。
(Ii) Organic polymer thickener Organic polymer thickeners include, for example, polyalkylene glycol, carboxyvinyl polymer, polyacrylic acid and neutralized products thereof, polyvinyl alcohol, polyvinyl pyrrolidone, polyether, etc. Representative polymer compounds, such as hydroxyethylcellulose, xanthan gum, diyutan gum, gellan gum, tamarind gum, guar gum, sodium alginate, carrageenan, pectin, and other polysaccharide derivatives, dextrin fatty acid esters, inulin fatty acid esters, etc. Examples include an oil gelling agent, a silicone-based thickening gelling agent represented by lysine-modified silicone at both ends, a crosslinked dimethylsilicone, a polyamide resin, an amino acid-based gelling agent, aluminum distearate, gelatin, and the like. , Preferably polyethylene glycol, xanthan gum. It is preferable not to contain an inorganic thickener.
ポリエチレングリコールの分子量は、粘度平均分子量が100万以上であり、好ましくは130万以上、さらに好ましくは170万以上である。粘度平均分子量は、GPC装置の検出器として示差屈折率計を使い、分子量分布のピークトップのリテンションタイムから算出することができる。 As for the molecular weight of polyethylene glycol, the viscosity average molecular weight is 1 million or more, preferably 1.3 million or more, and more preferably 1.7 million or more. The viscosity average molecular weight can be calculated from the retention time at the peak top of the molecular weight distribution using a differential refractometer as a detector of the GPC apparatus.
有機高分子系の増粘剤は酸性ゲルの総量を基準として1〜40重量%、好ましくは2〜30重量%、さらに好ましくは3〜20重量%である。本発明は増粘剤が少量であっても高粘度のゲルを得ることができるため、酸濃度を高めたい場合等、任意に増粘剤濃度を調整することが可能である。 The organic polymer thickener is 1 to 40% by weight, preferably 2 to 30% by weight, more preferably 3 to 20% by weight, based on the total amount of the acidic gel. In the present invention, since a highly viscous gel can be obtained even with a small amount of thickener, it is possible to arbitrarily adjust the thickener concentration when it is desired to increase the acid concentration.
(iii)水溶性の非プロトン性溶媒は、例えば、アセトニトリル、プロピオニトリル等に代表されるニトリル類、ジメチルホルムアミド、ホルムアミド、ジメチルアセトアミド、アセトアミド等に代表されるアミド類、ジエチレングリコールジメチルエーテル、ジエチレングリコールジエチルエーテル、エチレングリコールジメチルエーテル、エチレングリコールジエチルエーテル、テトラヒドロフラン、ジオキサン等に代表されるエーテル類、N−メチルピロリドン等に代表される含窒素有機化合物、ジメチルスルホキシド等に代表される含硫黄有機化合物、等を挙げることができ、好ましくはジメチルホルムアミド、ジメチルスルホキシドから選ばれる1種、もしくはその両者である。これらの溶媒は、キサンタンガム、ポリエチレングリコール等の有機高分子系増粘剤を分散し、ゲルの製造を容易とする。 (Iii) Water-soluble aprotic solvents include, for example, nitriles represented by acetonitrile, propionitrile, amides represented by dimethylformamide, formamide, dimethylacetamide, acetamide, diethylene glycol dimethyl ether, diethylene glycol diethyl ether , Ethers typified by ethylene glycol dimethyl ether, ethylene glycol diethyl ether, tetrahydrofuran, dioxane, etc., nitrogen-containing organic compounds typified by N-methylpyrrolidone, sulfur-containing organic compounds typified by dimethyl sulfoxide, etc. Preferably, it is one or both selected from dimethylformamide and dimethylsulfoxide. These solvents disperse organic polymer thickeners such as xanthan gum and polyethylene glycol to facilitate gel production.
水溶性の非プロトン性溶媒は酸性ゲルの総量を基準として好ましくは5〜30重量%、さらに好ましくは10〜20重量%である。 The water-soluble aprotic solvent is preferably 5 to 30% by weight, more preferably 10 to 20% by weight, based on the total amount of the acidic gel.
本発明は、上記(i)(ii)(iii)の他、必要に応じて、水、酸化・還元剤、防錆・防食剤、乳化剤、分散剤、防腐剤、消泡剤、浸透剤、着色剤、香料、等の添加物を加えることができる。 In addition to the above (i), (ii), and (iii), the present invention, if necessary, water, oxidation / reduction agent, rust / corrosion inhibitor, emulsifier, dispersant, antiseptic, antifoaming agent, penetrant, Additives such as colorants, fragrances and the like can be added.
本発明では、各成分の添加の順番は特に限定しないが、望ましい添加の順番は、最初に(ii)有機高分子系増粘剤と(iii)非プロトン性溶媒を混合し、ここに(i)酸および任意で水を添加する。 In the present invention, the order of addition of each component is not particularly limited, but the desired order of addition is to first mix (ii) an organic polymer thickener and (iii) an aprotic solvent, where (i ) Add acid and optionally water.
水は濃度調整のために添加することができるが、酸を高濃度で使用する場合は添加しなくてもよい。 Water can be added to adjust the concentration, but it may not be added when the acid is used at a high concentration.
本発明の除染対象表面の材質は、金属、プラスチック、セラミックおよび/または多孔質(例えばコンクリート)などが挙げられ、これらの表面に使用することができる。金属としては、ステンレス、鋼、鋳鉄等が好ましく例示され、具体的にはステンレスとしては、オーステナイト系ステンレス鋼とフェライト系ステンレス鋼、マルテンサイト系ステンレス鋼、二相系ステンレス鋼が挙げられる。オーステナイト系ステンレス鋼にはSUS304、SUS304L、SUS316、SUS316L、SUS317、SUS317L、SUS321、SUS310S、SUS347、フェライト系ステンレス鋼にはSUS430、SUS444、SUS445J1、SUS443J1、二相系ステンレス鋼にはSUS329J4L、SUS329J3L、マルテンサイト系ステンレス鋼にはSUS420J2が各々包含される。また鋼としては、普通鋼、合金鋼、工具鋼が挙げられる。普通鋼にはSS(一般構造用圧延鋼材)、SPCC(冷間圧延鋼板及び鋼帯)、合金鋼にはSC(機械構造用炭素鋼鋼材)、SCM(クロムモリブデン鋼鋼材)、工具鋼にはSKH(高速度工具鋼鋼材)、SK(炭素工具鋼鋼材)、鋳鉄にはFC(ねずみ鋳鉄品)、FCD(球状黒鉛鋳鉄品)が各々包含される。 Examples of the material for the decontamination target surface of the present invention include metals, plastics, ceramics, and / or porous materials (for example, concrete), and these materials can be used on these surfaces. Preferred examples of the metal include stainless steel, steel, cast iron, and specific examples of the stainless steel include austenitic stainless steel, ferritic stainless steel, martensitic stainless steel, and duplex stainless steel. SUS304, SUS304L, SUS316, SUS316L, SUS317, SUS317L, SUS321, SUS310S, SUS347, ferritic stainless steel, SUS430, SUS444, SUS445J1, SUS443J3, L SUS420J2 is included in each site-based stainless steel. Examples of steel include ordinary steel, alloy steel, and tool steel. SS (general structural rolled steel), SPCC (cold rolled steel plate and steel strip) for ordinary steel, SC (carbon steel for mechanical structure), SCM (chromium molybdenum steel), tool steel for alloy steel SKH (high speed tool steel), SK (carbon tool steel), and cast iron include FC (gray cast iron) and FCD (spheroidal graphite cast iron), respectively.
除染は、例えば放射能除染であってよい。好ましい除染対象は、定期点検時または廃炉時における原子力発電所の部品などが挙げられる。 The decontamination may be, for example, radioactive decontamination. Preferred decontamination targets include nuclear power plant parts during periodic inspection or decommissioning.
本発明において酸性ゲルの塗布方法は、噴霧、刷毛、ローラー、または浸漬を用いることができる。酸性ゲルは微細なゲルにすることで、除染対象表面への塗布を容易にすることができる。 In the present invention, spray, brush, roller, or dipping can be used as the method for applying the acidic gel. The acidic gel can be easily applied to the surface to be decontaminated by making it a fine gel.
本発明の酸性ゲルにおける表面処理の時間は処理基材、付着物に応じて適宜選択すればよいが通常1〜48時間、好ましくは2〜24時間である。 The surface treatment time in the acidic gel of the present invention may be appropriately selected according to the treatment substrate and the deposit, but is usually 1 to 48 hours, preferably 2 to 24 hours.
以下に実施例を用いて本発明を詳細に説明するが、本発明は以下の実施例に限定されるものではない。 EXAMPLES The present invention will be described in detail below using examples, but the present invention is not limited to the following examples.
実施例1〜12及び比較例1〜2
酸性ゲルを表1および表2に示す組成で調整し、SUS316もしくはSS400のテストピース(20×20mm)に浸漬して塗布した。25℃で24時間静置し、目視で酸性ゲルの流動性を評価した。また、酸性ゲルを水で洗浄後、テストピースを乾燥させ、初期質量から処理後の質量を差し引いた質量変化から膜厚減少量を求めた。放射性物質で汚染された配管等の酸化皮膜の厚さは1μmから2μmと言われており、除染を目的とする場合、2μmのエッチングで十分と考えられる。
Examples 1-12 and Comparative Examples 1-2
The acidic gel was prepared with the composition shown in Tables 1 and 2, and dipped in a SUS316 or SS400 test piece (20 × 20 mm) and applied. It left still at 25 degreeC for 24 hours, and evaluated the fluidity | liquidity of the acidic gel visually. Moreover, after wash | cleaning acidic gel with water, the test piece was dried and the film thickness reduction | decrease amount was calculated | required from the mass change which deducted the mass after a process from the initial mass. It is said that the thickness of oxide film such as piping contaminated with radioactive material is 1 to 2 μm, and 2 μm etching is considered sufficient for decontamination purposes.
[流動性]
塗布24時間後、ゲルは高粘度で流動しない ○
塗布24時間後、ゲルは高粘度だが流動する △
塗布24時間後、ゲルは水と同程度の粘度に低下 ×
[エッチング評価]
塗布24時間後、基材表面のエッチングが2μm以上 ○
塗布24時間後、基材表面のエッチングが1〜2μm △
塗布24時間後、基材表面のエッチングが1μm以下 ×
[Liquidity]
After 24 hours of application, the gel is highly viscous and does not flow ○
24 hours after application, the gel is highly viscous but flows.
24 hours after application, the gel drops to the same viscosity as water.
[Etching evaluation]
After 24 hours of coating, etching of the substrate surface is 2 μm or more ○
24 hours after coating, etching of the substrate surface is 1 to 2 μm.
24 hours after coating, etching of the substrate surface is 1 μm or less.
Claims (8)
Priority Applications (1)
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