JP6031562B2 - Silica-based material and method for producing the same, noble metal support and method for producing carboxylic acids using the same as a catalyst - Google Patents
Silica-based material and method for producing the same, noble metal support and method for producing carboxylic acids using the same as a catalyst Download PDFInfo
- Publication number
- JP6031562B2 JP6031562B2 JP2015130002A JP2015130002A JP6031562B2 JP 6031562 B2 JP6031562 B2 JP 6031562B2 JP 2015130002 A JP2015130002 A JP 2015130002A JP 2015130002 A JP2015130002 A JP 2015130002A JP 6031562 B2 JP6031562 B2 JP 6031562B2
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- Prior art keywords
- silica
- based material
- noble metal
- mol
- aluminum
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 542
- 239000000377 silicon dioxide Substances 0.000 title claims description 253
- 239000000463 material Substances 0.000 title claims description 238
- 229910000510 noble metal Inorganic materials 0.000 title claims description 168
- 239000003054 catalyst Substances 0.000 title claims description 112
- 238000004519 manufacturing process Methods 0.000 title claims description 35
- 150000001735 carboxylic acids Chemical class 0.000 title description 2
- 239000002245 particle Substances 0.000 claims description 185
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 141
- 239000000203 mixture Substances 0.000 claims description 132
- 230000000737 periodic effect Effects 0.000 claims description 112
- 238000000034 method Methods 0.000 claims description 109
- 229910052782 aluminium Inorganic materials 0.000 claims description 101
- 150000001875 compounds Chemical class 0.000 claims description 77
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 76
- 239000007787 solid Substances 0.000 claims description 69
- 229910052759 nickel Inorganic materials 0.000 claims description 63
- 229910052710 silicon Inorganic materials 0.000 claims description 63
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 60
- 239000010703 silicon Substances 0.000 claims description 60
- 238000009826 distribution Methods 0.000 claims description 47
- 239000011777 magnesium Substances 0.000 claims description 47
- 239000010931 gold Substances 0.000 claims description 36
- 229910052749 magnesium Inorganic materials 0.000 claims description 35
- -1 aluminum compound Chemical class 0.000 claims description 34
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 33
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical group [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 31
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 28
- 229910052737 gold Inorganic materials 0.000 claims description 21
- 238000010335 hydrothermal treatment Methods 0.000 claims description 20
- 229910052783 alkali metal Inorganic materials 0.000 claims description 19
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 17
- 229910052763 palladium Inorganic materials 0.000 claims description 16
- 229910052761 rare earth metal Inorganic materials 0.000 claims description 16
- 239000011701 zinc Substances 0.000 claims description 16
- 229910017052 cobalt Inorganic materials 0.000 claims description 15
- 239000010941 cobalt Substances 0.000 claims description 15
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 15
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 14
- 229910052725 zinc Inorganic materials 0.000 claims description 14
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 13
- 229910052742 iron Inorganic materials 0.000 claims description 13
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 13
- 229910052707 ruthenium Inorganic materials 0.000 claims description 13
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 12
- 150000001340 alkali metals Chemical class 0.000 claims description 9
- 238000004453 electron probe microanalysis Methods 0.000 claims description 8
- 150000001342 alkaline earth metals Chemical class 0.000 claims description 7
- 229910052697 platinum Inorganic materials 0.000 claims description 7
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 5
- 229910052741 iridium Inorganic materials 0.000 claims description 5
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 5
- 229910052709 silver Inorganic materials 0.000 claims description 5
- 239000004332 silver Substances 0.000 claims description 5
- 229910052762 osmium Inorganic materials 0.000 claims description 4
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 claims description 4
- 229910052702 rhenium Inorganic materials 0.000 claims description 4
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 claims description 4
- 239000010948 rhodium Substances 0.000 claims description 4
- 229910052703 rhodium Inorganic materials 0.000 claims description 4
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 4
- 125000003262 carboxylic acid ester group Chemical class [H]C([H])([*:2])OC(=O)C([H])([H])[*:1] 0.000 claims 2
- 239000011148 porous material Substances 0.000 description 180
- 238000006243 chemical reaction Methods 0.000 description 102
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 81
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 80
- 238000005259 measurement Methods 0.000 description 74
- 239000002253 acid Substances 0.000 description 55
- 239000007864 aqueous solution Substances 0.000 description 54
- 229910052751 metal Inorganic materials 0.000 description 42
- 239000002131 composite material Substances 0.000 description 41
- 239000000126 substance Substances 0.000 description 41
- 239000002184 metal Substances 0.000 description 39
- 229910052757 nitrogen Inorganic materials 0.000 description 39
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 36
- 238000001179 sorption measurement Methods 0.000 description 36
- 238000003756 stirring Methods 0.000 description 35
- 239000000243 solution Substances 0.000 description 33
- STNJBCKSHOAVAJ-UHFFFAOYSA-N Methacrolein Chemical compound CC(=C)C=O STNJBCKSHOAVAJ-UHFFFAOYSA-N 0.000 description 31
- 150000001299 aldehydes Chemical class 0.000 description 31
- 229910002027 silica gel Inorganic materials 0.000 description 31
- 239000000741 silica gel Substances 0.000 description 31
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 29
- 230000005540 biological transmission Effects 0.000 description 27
- 238000012360 testing method Methods 0.000 description 27
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 25
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 25
- MFUVDXOKPBAHMC-UHFFFAOYSA-N magnesium;dinitrate;hexahydrate Chemical compound O.O.O.O.O.O.[Mg+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O MFUVDXOKPBAHMC-UHFFFAOYSA-N 0.000 description 24
- 238000010304 firing Methods 0.000 description 23
- 239000002002 slurry Substances 0.000 description 23
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 22
- 239000012153 distilled water Substances 0.000 description 22
- 239000002585 base Substances 0.000 description 21
- 230000008859 change Effects 0.000 description 21
- 230000000694 effects Effects 0.000 description 21
- 239000000047 product Substances 0.000 description 21
- 239000000395 magnesium oxide Substances 0.000 description 20
- 239000001301 oxygen Substances 0.000 description 20
- 229910052760 oxygen Inorganic materials 0.000 description 20
- 239000002923 metal particle Substances 0.000 description 19
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 19
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 18
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 18
- 238000000634 powder X-ray diffraction Methods 0.000 description 18
- AOPCKOPZYFFEDA-UHFFFAOYSA-N nickel(2+);dinitrate;hexahydrate Chemical compound O.O.O.O.O.O.[Ni+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O AOPCKOPZYFFEDA-UHFFFAOYSA-N 0.000 description 17
- 229910018505 Ni—Mg Inorganic materials 0.000 description 16
- 238000001035 drying Methods 0.000 description 16
- 239000007789 gas Substances 0.000 description 16
- 239000011521 glass Substances 0.000 description 16
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 15
- 230000000704 physical effect Effects 0.000 description 15
- 238000010438 heat treatment Methods 0.000 description 14
- 239000002904 solvent Substances 0.000 description 14
- 239000006228 supernatant Substances 0.000 description 14
- 239000012298 atmosphere Substances 0.000 description 13
- 150000002500 ions Chemical class 0.000 description 13
- 229910000480 nickel oxide Inorganic materials 0.000 description 13
- 239000002244 precipitate Substances 0.000 description 13
- 238000001228 spectrum Methods 0.000 description 13
- BNGXYYYYKUGPPF-UHFFFAOYSA-M (3-methylphenyl)methyl-triphenylphosphanium;chloride Chemical compound [Cl-].CC1=CC=CC(C[P+](C=2C=CC=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 BNGXYYYYKUGPPF-UHFFFAOYSA-M 0.000 description 12
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 12
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 239000007791 liquid phase Substances 0.000 description 12
- YIXJRHPUWRPCBB-UHFFFAOYSA-N magnesium nitrate Chemical compound [Mg+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O YIXJRHPUWRPCBB-UHFFFAOYSA-N 0.000 description 12
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 12
- 239000011268 mixed slurry Substances 0.000 description 11
- 239000002994 raw material Substances 0.000 description 11
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 10
- 230000002378 acidificating effect Effects 0.000 description 10
- 238000004458 analytical method Methods 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 10
- 239000013078 crystal Substances 0.000 description 10
- 239000007788 liquid Substances 0.000 description 10
- 238000002360 preparation method Methods 0.000 description 10
- 238000006722 reduction reaction Methods 0.000 description 10
- 239000000523 sample Substances 0.000 description 10
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 9
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 9
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
- 229910004298 SiO 2 Inorganic materials 0.000 description 9
- 150000001733 carboxylic acid esters Chemical class 0.000 description 9
- 239000000499 gel Substances 0.000 description 9
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 9
- 238000007254 oxidation reaction Methods 0.000 description 9
- 230000009467 reduction Effects 0.000 description 9
- 238000005245 sintering Methods 0.000 description 9
- XNDZQQSKSQTQQD-UHFFFAOYSA-N 3-methylcyclohex-2-en-1-ol Chemical compound CC1=CC(O)CCC1 XNDZQQSKSQTQQD-UHFFFAOYSA-N 0.000 description 8
- HGINCPLSRVDWNT-UHFFFAOYSA-N Acrolein Chemical compound C=CC=O HGINCPLSRVDWNT-UHFFFAOYSA-N 0.000 description 8
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 8
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 8
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 8
- 239000001257 hydrogen Substances 0.000 description 8
- 229910052739 hydrogen Inorganic materials 0.000 description 8
- 230000003647 oxidation Effects 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- 230000002829 reductive effect Effects 0.000 description 8
- 239000011734 sodium Substances 0.000 description 8
- 229910021128 PdPb Inorganic materials 0.000 description 7
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 7
- 238000005984 hydrogenation reaction Methods 0.000 description 7
- KBJMLQFLOWQJNF-UHFFFAOYSA-N nickel(ii) nitrate Chemical compound [Ni+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O KBJMLQFLOWQJNF-UHFFFAOYSA-N 0.000 description 7
- 230000036961 partial effect Effects 0.000 description 7
- 150000003839 salts Chemical class 0.000 description 7
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 6
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 6
- 125000001931 aliphatic group Chemical group 0.000 description 6
- 239000011575 calcium Substances 0.000 description 6
- 239000007795 chemical reaction product Substances 0.000 description 6
- 239000000470 constituent Substances 0.000 description 6
- 238000000354 decomposition reaction Methods 0.000 description 6
- 239000000945 filler Substances 0.000 description 6
- 238000004817 gas chromatography Methods 0.000 description 6
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 229910017604 nitric acid Inorganic materials 0.000 description 6
- 229910052700 potassium Inorganic materials 0.000 description 6
- 239000011343 solid material Substances 0.000 description 6
- 239000007921 spray Substances 0.000 description 6
- 150000007513 acids Chemical class 0.000 description 5
- 150000001298 alcohols Chemical class 0.000 description 5
- 150000001336 alkenes Chemical class 0.000 description 5
- 229910052791 calcium Inorganic materials 0.000 description 5
- 239000001569 carbon dioxide Substances 0.000 description 5
- 229910002092 carbon dioxide Inorganic materials 0.000 description 5
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 5
- 238000010908 decantation Methods 0.000 description 5
- 230000007423 decrease Effects 0.000 description 5
- 229910001882 dioxygen Inorganic materials 0.000 description 5
- 239000000017 hydrogel Substances 0.000 description 5
- 150000004706 metal oxides Chemical group 0.000 description 5
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- 230000001590 oxidative effect Effects 0.000 description 5
- 230000001376 precipitating effect Effects 0.000 description 5
- 238000001556 precipitation Methods 0.000 description 5
- 239000002243 precursor Substances 0.000 description 5
- 238000010298 pulverizing process Methods 0.000 description 5
- 229910052701 rubidium Inorganic materials 0.000 description 5
- 229910052708 sodium Inorganic materials 0.000 description 5
- 238000001694 spray drying Methods 0.000 description 5
- 230000006641 stabilisation Effects 0.000 description 5
- 238000011105 stabilization Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- AMIMRNSIRUDHCM-UHFFFAOYSA-N Isopropylaldehyde Chemical compound CC(C)C=O AMIMRNSIRUDHCM-UHFFFAOYSA-N 0.000 description 4
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- 150000001242 acetic acid derivatives Chemical class 0.000 description 4
- 229910052788 barium Inorganic materials 0.000 description 4
- 229910052792 caesium Inorganic materials 0.000 description 4
- 239000002537 cosmetic Substances 0.000 description 4
- 238000005336 cracking Methods 0.000 description 4
- 238000004132 cross linking Methods 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 4
- 238000004880 explosion Methods 0.000 description 4
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 4
- 229910052744 lithium Inorganic materials 0.000 description 4
- 229910052748 manganese Inorganic materials 0.000 description 4
- 239000011572 manganese Substances 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 239000003921 oil Substances 0.000 description 4
- 238000006709 oxidative esterification reaction Methods 0.000 description 4
- 239000012071 phase Substances 0.000 description 4
- 239000000049 pigment Substances 0.000 description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 230000008707 rearrangement Effects 0.000 description 4
- YBCAZPLXEGKKFM-UHFFFAOYSA-K ruthenium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Ru+3] YBCAZPLXEGKKFM-UHFFFAOYSA-K 0.000 description 4
- 239000006104 solid solution Substances 0.000 description 4
- 238000005507 spraying Methods 0.000 description 4
- 239000010935 stainless steel Substances 0.000 description 4
- 229910001220 stainless steel Inorganic materials 0.000 description 4
- 229910052712 strontium Inorganic materials 0.000 description 4
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 4
- 238000004876 x-ray fluorescence Methods 0.000 description 4
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 3
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- 229910052684 Cerium Inorganic materials 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 3
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 3
- 229910052777 Praseodymium Inorganic materials 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 229910007572 Zn-K Inorganic materials 0.000 description 3
- 239000001361 adipic acid Substances 0.000 description 3
- 235000011037 adipic acid Nutrition 0.000 description 3
- 150000001341 alkaline earth metal compounds Chemical class 0.000 description 3
- ANBBXQWFNXMHLD-UHFFFAOYSA-N aluminum;sodium;oxygen(2-) Chemical compound [O-2].[O-2].[Na+].[Al+3] ANBBXQWFNXMHLD-UHFFFAOYSA-N 0.000 description 3
- 229910021529 ammonia Inorganic materials 0.000 description 3
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 3
- 229910052790 beryllium Inorganic materials 0.000 description 3
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 3
- 239000000969 carrier Substances 0.000 description 3
- 238000006757 chemical reactions by type Methods 0.000 description 3
- 150000001805 chlorine compounds Chemical class 0.000 description 3
- 239000003085 diluting agent Substances 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 238000011049 filling Methods 0.000 description 3
- 239000000706 filtrate Substances 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- 150000004679 hydroxides Chemical class 0.000 description 3
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 3
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 description 3
- 238000005470 impregnation Methods 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 229910052746 lanthanum Inorganic materials 0.000 description 3
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 3
- 229910044991 metal oxide Inorganic materials 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 239000002105 nanoparticle Substances 0.000 description 3
- 238000006386 neutralization reaction Methods 0.000 description 3
- 150000002823 nitrates Chemical class 0.000 description 3
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- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 238000010813 internal standard method Methods 0.000 description 1
- QZRHHEURPZONJU-UHFFFAOYSA-N iron(2+) dinitrate nonahydrate Chemical compound O.O.O.O.O.O.O.O.O.[Fe+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O QZRHHEURPZONJU-UHFFFAOYSA-N 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 230000002262 irrigation Effects 0.000 description 1
- 238000003973 irrigation Methods 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- FGSLWIKEHNEHLX-UHFFFAOYSA-N lanthanum(3+) trinitrate nonahydrate Chemical compound O.O.O.O.O.O.O.O.O.[N+](=O)([O-])[O-].[La+3].[N+](=O)([O-])[O-].[N+](=O)([O-])[O-] FGSLWIKEHNEHLX-UHFFFAOYSA-N 0.000 description 1
- RLJMLMKIBZAXJO-UHFFFAOYSA-N lead nitrate Chemical compound [O-][N+](=O)O[Pb]O[N+]([O-])=O RLJMLMKIBZAXJO-UHFFFAOYSA-N 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- YMKHJSXMVZVZNU-UHFFFAOYSA-N manganese(2+);dinitrate;hexahydrate Chemical compound O.O.O.O.O.O.[Mn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O YMKHJSXMVZVZNU-UHFFFAOYSA-N 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 150000004692 metal hydroxides Chemical class 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 229910001960 metal nitrate Inorganic materials 0.000 description 1
- 229910001463 metal phosphate Inorganic materials 0.000 description 1
- QCAWEPFNJXQPAN-UHFFFAOYSA-N methoxyfenozide Chemical compound COC1=CC=CC(C(=O)NN(C(=O)C=2C=C(C)C=C(C)C=2)C(C)(C)C)=C1C QCAWEPFNJXQPAN-UHFFFAOYSA-N 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- 229940017219 methyl propionate Drugs 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 235000010981 methylcellulose Nutrition 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000004570 mortar (masonry) Substances 0.000 description 1
- MBHINSULENHCMF-UHFFFAOYSA-N n,n-dimethylpropanamide Chemical compound CCC(=O)N(C)C MBHINSULENHCMF-UHFFFAOYSA-N 0.000 description 1
- DIOQZVSQGTUSAI-UHFFFAOYSA-N n-butylhexane Natural products CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 1
- GKYQBMNOFTZZSX-UHFFFAOYSA-K n-ethylethanamine;trichlorogold Chemical compound Cl[Au](Cl)Cl.CCNCC GKYQBMNOFTZZSX-UHFFFAOYSA-K 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- BFDHFSHZJLFAMC-UHFFFAOYSA-L nickel(ii) hydroxide Chemical compound [OH-].[OH-].[Ni+2] BFDHFSHZJLFAMC-UHFFFAOYSA-L 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- DWYJHMSKXMHOAP-UHFFFAOYSA-N oxetan-2-ol Chemical compound OC1CCO1 DWYJHMSKXMHOAP-UHFFFAOYSA-N 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 238000006464 oxidative addition reaction Methods 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- YJVFFLUZDVXJQI-UHFFFAOYSA-L palladium(ii) acetate Chemical compound [Pd+2].CC([O-])=O.CC([O-])=O YJVFFLUZDVXJQI-UHFFFAOYSA-L 0.000 description 1
- 238000005502 peroxidation Methods 0.000 description 1
- 239000011941 photocatalyst Substances 0.000 description 1
- 229920001084 poly(chloroprene) Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 150000004032 porphyrins Chemical class 0.000 description 1
- 239000004323 potassium nitrate Substances 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical compound [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000011946 reduction process Methods 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- RTHYXYOJKHGZJT-UHFFFAOYSA-N rubidium nitrate Inorganic materials [Rb+].[O-][N+]([O-])=O RTHYXYOJKHGZJT-UHFFFAOYSA-N 0.000 description 1
- GTCKPGDAPXUISX-UHFFFAOYSA-N ruthenium(3+);trinitrate Chemical compound [Ru+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O GTCKPGDAPXUISX-UHFFFAOYSA-N 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- 238000010583 slow cooling Methods 0.000 description 1
- VILMUCRZVVVJCA-UHFFFAOYSA-M sodium glycolate Chemical compound [Na+].OCC([O-])=O VILMUCRZVVVJCA-UHFFFAOYSA-M 0.000 description 1
- DTNJZLDXJJGKCM-UHFFFAOYSA-K sodium;trichlorogold Chemical compound [Na].Cl[Au](Cl)Cl DTNJZLDXJJGKCM-UHFFFAOYSA-K 0.000 description 1
- 239000008234 soft water Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000010421 standard material Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- KHAUBYTYGDOYRU-IRXASZMISA-N trospectomycin Chemical compound CN[C@H]([C@H]1O2)[C@@H](O)[C@@H](NC)[C@H](O)[C@H]1O[C@H]1[C@]2(O)C(=O)C[C@@H](CCCC)O1 KHAUBYTYGDOYRU-IRXASZMISA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 1
- 229960001763 zinc sulfate Drugs 0.000 description 1
- 229910000368 zinc sulfate Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Landscapes
- Silicon Compounds (AREA)
- Silicates, Zeolites, And Molecular Sieves (AREA)
- Catalysts (AREA)
Description
本発明は、シリカ系材料及びその製造方法、並びに貴金属担持物及びそれを触媒として用いるカルボン酸類の製造方法に関する。 The present invention relates to a silica-based material and a method for producing the same, and a noble metal support and a method for producing a carboxylic acid using the same as a catalyst.
シリカ系材料は、様々な用途にその特性を活かした材料として利用されている。その例として、液体クロマトグラフィー用充填剤、化粧品基剤、触媒、触媒担体、流動調整剤、希釈剤が挙げられる。これらの用途に求められる要件を満たすために高比表面積等の物性を満たそうとする手段の一つとして、シリカ系材料を多孔質化することが挙げられるが、それではシリカ系材料の機械的強度が弱くなる。一方、シリカ系材料の機械的強度を高くしようとして、その前駆体を高い温度で焼成すると、その比表面積が小さくなる。このように機械的強度が高くかつ比表面積が大きいという、相反する物性を満たすシリカ系材料を得ることは難しく、両要件を満足するシリカ系材料は現在のところ得られていない。 Silica-based materials are used as materials that take advantage of their properties in various applications. Examples thereof include liquid chromatography fillers, cosmetic bases, catalysts, catalyst carriers, flow regulators, and diluents. One of the means to satisfy physical properties such as high specific surface area in order to satisfy the requirements for these applications is to make the silica-based material porous. Becomes weaker. On the other hand, when the precursor is fired at a high temperature in order to increase the mechanical strength of the silica-based material, the specific surface area becomes small. Thus, it is difficult to obtain a silica-based material satisfying the contradicting physical properties of high mechanical strength and large specific surface area, and no silica-based material satisfying both requirements has been obtained at present.
シリカ系の物質の一つである石英は硬く、その機械的強度が高いことが知られている。しかしながら、一般的に、石英は機械的強度に優れているが比表面積が低く(1m2/g以下)、高い比表面積を必要とする用途に用いることができない。触媒担体として用いるべく、シリカ系材料の比表面積を大きくするようにして合成することもあるが、その場合、機械的強度が犠牲になっており、表面積と機械的強度とを兼ね備えた例はない。 It is known that quartz, which is one of silica-based materials, is hard and has high mechanical strength. However, in general, quartz is excellent in mechanical strength but has a low specific surface area (1 m 2 / g or less) and cannot be used for applications requiring a high specific surface area. In order to use it as a catalyst carrier, it may be synthesized by increasing the specific surface area of the silica-based material, but in that case, mechanical strength is sacrificed, and there is no example that combines surface area and mechanical strength. .
特許文献1には、カルボン酸エステル製造用触媒の担体として、アルミニウムをAl2O3として5〜40重量%、マグネシウムをMgOとして3〜30重量%、ケイ素をSiO2として50〜92重量%の範囲で含有するシリカ−アルミナ−マグネシアが記載されている。 Patent Document 1, as a carrier of a carboxylic acid ester production catalyst, 5-40 wt% of aluminum as Al 2 O 3, magnesium 3-30% by weight MgO, silicon as SiO 2 of 50 to 92 wt% A range of silica-alumina-magnesia is described.
特許文献1に記載されたシリカ−アルミナ−マグネシア担体は、機械的強度が大きく、かつ比表面積も大きく、シリカに比べて高い耐水性を有し、アルミナに比べて耐酸性が高いという特徴を有する。しかしながら、その担体をカルボン酸エステル製造用触媒の担体として用いる場合、通常の使用条件下では機械的強度を満足できるものの、粒子同士、粒子と撹拌バネ等との激しい混合等の条件、例えば懸濁反応における過酷な条件での反応では、それらの摩擦等に起因して、割れ、欠けの問題が生じる場合がある。 The silica-alumina-magnesia support described in Patent Document 1 has the characteristics of high mechanical strength, large specific surface area, high water resistance compared to silica, and high acid resistance compared to alumina. . However, when the carrier is used as a carrier for a catalyst for producing a carboxylate ester, the mechanical strength can be satisfied under normal use conditions, but conditions such as vigorous mixing between particles, particles and stirring springs, etc., for example, suspension In a reaction under severe conditions in the reaction, there may be a problem of cracking or chipping due to such friction.
さらに、本発明者らの検討によると、特許文献1に記載された担体を有する触媒を用いて長期的に反応を実施した場合、徐々にではあるが、細孔径の拡大及び粒子成長に起因する触媒粒子の構造変化が起こることが判明した。細孔径の拡大は、反応固有の酸成分の副生及びアルカリ成分の添加操作により、触媒粒子が局所的に酸と塩基とに繰り返し曝され、シリカ−アルミナ−マグネシア担体中のケイ素、アルミニウムの一部が溶解、析出し、シリカ・アルミナ架橋構造の再配列が生じることによって、生じるものと考えられる。また、細孔径の拡大と同時に、担持貴金属のシンタリングによって粒子成長が進行し、その結果、触媒活性が低下することも判明した。 Further, according to the study by the present inventors, when the reaction is carried out over a long period of time using the catalyst having the carrier described in Patent Document 1, it is gradually caused by expansion of the pore diameter and particle growth. It has been found that the structure of the catalyst particles changes. The expansion of the pore diameter is due to the by-product of the reaction-specific acid component and the addition of the alkali component, whereby the catalyst particles are repeatedly exposed locally to acids and bases, and one of silicon and aluminum in the silica-alumina-magnesia support. This is considered to be caused by dissolution and precipitation of the part and rearrangement of the silica / alumina crosslinked structure. It was also found that the particle growth progressed by sintering of the supported noble metal simultaneously with the expansion of the pore diameter, and as a result, the catalytic activity decreased.
本発明は上記事情にかんがみてなされたものであり、機械的強度が強く、比表面積も大きなシリカ系材料であって、しかも耐酸性及び塩基性に優れたシリカ系材料、その製造方法、及びそのシリカ系材料を含有する貴金属担持物を提供することを目的とする。 The present invention has been made in view of the above circumstances, and is a silica-based material having high mechanical strength and a large specific surface area, and having excellent acid resistance and basicity, a method for producing the same, and its The object is to provide a noble metal support containing a silica-based material.
本発明者らは、シリカゲルの化学的安定性及び機械的強度を改善する観点から、シリカゲルを構成しているシリカ鎖(−Si−O−)の特異な構造に着目し、これらの構造と物性との相関について鋭意研究を進めた。その結果、意外にも、ケイ素と、アルミニウムと、鉄、コバルト、ニッケル及び亜鉛からなる群より選択される少なくとも1種の元素と、アルカリ金属元素、アルカリ土類金属元素及び希土類元素からなる群より選択される少なくとも1種の塩基性元素とを含む複合酸化物からなるシリカ系材料が耐酸性及び塩基性に優れており、従来のシリカ系材料に認められる上述のような各々の欠点を克服し、上記課題を解決できることを見出し、本発明を完成させた。 From the viewpoint of improving the chemical stability and mechanical strength of silica gel, the present inventors paid attention to the unique structure of silica chains (-Si-O-) constituting the silica gel, and these structures and physical properties. Research on the correlation with As a result, surprisingly, at least one element selected from the group consisting of silicon, aluminum, iron, cobalt, nickel and zinc, and a group consisting of alkali metal elements, alkaline earth metal elements and rare earth elements A silica-based material composed of a composite oxide containing at least one selected basic element has excellent acid resistance and basicity, and overcomes each of the above-mentioned drawbacks found in conventional silica-based materials. The inventors have found that the above problems can be solved, and have completed the present invention.
すなわち、本発明は以下のとおりである。
[1]
ケイ素と、
アルミニウムと、
鉄、コバルト、ニッケル及び亜鉛からなる群より選択される少なくとも1種の第4周期元素と、
アルカリ金属元素、アルカリ土類金属元素及び希土類元素からなる群より選択される少なくとも1種の塩基性元素と、
を、前記ケイ素と前記アルミニウムと前記第4周期元素と前記塩基性元素との合計モル量に対して、それぞれ、57.6〜90モル%、3.1〜30モル%、0.75〜15モル%、2〜36.6モル%、の範囲で含有するシリカ系材料であって、
前記シリカ系材料を電子プローブ微小部分析法で観察測定した場合、測定される前記第4周期元素の濃度の分布範囲が10%以内である、シリカ系材料からなる、
触媒担体。
[2]
前記シリカ系材料が、前記ケイ素と前記アルミニウムと前記第4周期元素と前記塩基性元素とを、前記合計モル量に対して、それぞれ、70〜90モル%、5〜15モル%、0.75〜15モル%、2〜15モル%、の範囲で含有する、[1]に記載の触媒担体。
[3]
前記アルミニウムに対する前記第4周期元素の組成比がモル基準で0.02〜2.0である、[1]又は[2]に記載の触媒担体。
[4]
前記塩基性元素に対する前記第4周期元素の組成比がモル基準で0.02〜2.0である、[1]〜[3]のいずれか1項に記載の触媒担体。
[5]
前記第4周期元素がニッケルであり、前記塩基性元素がマグネシウムである、[1]〜[4]のいずれか1項に記載の触媒担体。
[6]
[1]〜[5]のいずれか1項に記載の触媒担体を製造するための方法であって、
シリカと、アルミニウム化合物と、鉄、コバルト、ニッケル及び亜鉛からなる群より選択される少なくとも1種の第4周期元素の化合物と、アルカリ金属元素、アルカリ土類金属元素及び希土類元素からなる群より選択される少なくとも1種の塩基性元素の化合物と、を含有する組成物を得る工程と、
前記組成物又はその組成物の乾燥物を焼成して固形物を得る工程と、
を有し、
ケイ素と、アルミニウムと、鉄、コバルト、ニッケル及び亜鉛からなる群より選択される少なくとも1種の第4周期元素と、アルカリ金属元素、アルカリ土類金属元素及び希土類元素からなる群より選択される少なくとも1種の塩基性元素と、を含有するシリカ系材料からなる触媒担体を得る、触媒担体の製造方法。
[7]
前記固形物を水熱処理する工程を更に有する、[6]に記載の触媒担体の製造方法。
[8]
[1]〜[5]のいずれか1項に記載の触媒担体と、
前記シリカ系材料に担持され、ルテニウム、ロジウム、パラジウム、銀、レニウム、オスミウム、イリジウム、白金、金からなる群より選択される少なくとも1種の貴金属成分と、
を含む、カルボン酸エステル製造用貴金属担持触媒。
[9]
前記貴金属成分の平均粒子径が2〜10nmである、[8]に記載のカルボン酸エステル製造用貴金属担持触媒。
That is, the present invention is as follows.
[1]
Silicon,
With aluminum,
At least one fourth periodic element selected from the group consisting of iron, cobalt, nickel and zinc;
At least one basic element selected from the group consisting of alkali metal elements, alkaline earth metal elements and rare earth elements;
Are 57.6 to 90 mol%, 3.1 to 30 mol%, and 0.75 to 15 with respect to the total molar amount of the silicon, the aluminum, the fourth periodic element, and the basic element, respectively. A silica-based material containing in the range of mol%, 2 to 36.6 mol%,
When the silica-based material is observed and measured by the electron probe microanalysis method, the distribution range of the concentration of the fourth periodic element to be measured is within 10% .
Catalyst carrier .
[2]
The silica-based material contains the silicon, the aluminum, the fourth periodic element, and the basic element in an amount of 70 to 90 mol%, 5 to 15 mol%, and 0.75, respectively, with respect to the total molar amount. The catalyst support according to [1], which is contained in a range of ˜15 mol% and 2 to 15 mol%.
[3]
The catalyst carrier according to [1] or [2], wherein the composition ratio of the fourth periodic element to the aluminum is 0.02 to 2.0 on a molar basis.
[4]
The catalyst carrier according to any one of [1] to [3], wherein the composition ratio of the fourth periodic element to the basic element is 0.02 to 2.0 on a molar basis.
[5]
The catalyst carrier according to any one of [1] to [4], wherein the fourth periodic element is nickel and the basic element is magnesium.
[6]
A method for producing the catalyst carrier according to any one of [1] to [5],
Selected from the group consisting of a compound of at least one fourth periodic element selected from the group consisting of silica, an aluminum compound, iron, cobalt, nickel and zinc, an alkali metal element, an alkaline earth metal element, and a rare earth element Obtaining a composition containing at least one basic element compound,
Baking the composition or a dried product thereof to obtain a solid;
Have
At least one fourth periodic element selected from the group consisting of silicon, aluminum, iron, cobalt, nickel and zinc, and at least selected from the group consisting of alkali metal elements, alkaline earth metal elements and rare earth elements obtaining a one basic element, a catalyst carrier comprising silica-based material having including a method of producing a catalyst carrier.
[7]
The method for producing a catalyst carrier according to [6], further comprising hydrothermally treating the solid.
[8]
The catalyst carrier according to any one of [1] to [5],
Supported on the silica-based material, at least one noble metal component selected from the group consisting of ruthenium, rhodium, palladium, silver, rhenium, osmium, iridium, platinum, and gold;
A noble metal-supported catalyst for producing a carboxylic acid ester .
[9]
The noble metal-supported catalyst for carboxylic acid ester production according to [8] , wherein an average particle size of the noble metal component is 2 to 10 nm.
本発明によれば、機械的強度が強く、かつ比表面積も大きなシリカ系材料であって、しかも耐酸性及び塩基性に優れたシリカ系材料及びそのシリカ系材料を含有する貴金属担持物を提供することができる。 According to the present invention, there is provided a silica-based material having a high mechanical strength and a large specific surface area, which is excellent in acid resistance and basicity, and a noble metal support containing the silica-based material. be able to.
以下、本発明を実施するための形態(以下、単に「本実施形態」という。)について詳細に説明する。なお、本発明は、以下の実施の形態に限定されるものではなく、その要旨の範囲内で種々変形して実施することができる。 Hereinafter, a mode for carrying out the present invention (hereinafter simply referred to as “the present embodiment”) will be described in detail. In addition, this invention is not limited to the following embodiment, It can implement by changing variously within the range of the summary.
本実施形態のシリカ系材料は、
ケイ素と、
アルミニウムと、
鉄、コバルト、ニッケル及び亜鉛からなる群より選択される少なくとも1種の第4周期元素と、
アルカリ金属元素、アルカリ土類金属元素及び希土類元素からなる群より選択される少なくとも1種の塩基性元素と、
を、前記ケイ素と前記アルミニウムと前記第4周期元素と前記塩基性元素との合計モル量に対して、それぞれ、42〜90モル%、3〜38モル%、0.5〜20モル%、2〜38モル%、の範囲で含有する。
The silica-based material of the present embodiment is
Silicon,
With aluminum,
At least one fourth periodic element selected from the group consisting of iron, cobalt, nickel and zinc;
At least one basic element selected from the group consisting of alkali metal elements, alkaline earth metal elements and rare earth elements;
Are 42 to 90 mol%, 3 to 38 mol%, 0.5 to 20 mol%, 2 to 2%, respectively, with respect to the total molar amount of the silicon, the aluminum, the fourth periodic element, and the basic element. It is contained in the range of ˜38 mol%.
本実施形態のシリカ系材料は、ケイ素と、アルミニウムと、鉄(Fe)、コバルト(Co)、ニッケル(Ni)及び亜鉛(Zn)からなる群より選択される少なくとも1種の第4周期元素と、アルカリ金属元素、アルカリ土類金属元素及び希土類元素からなる群より選択される少なくとも1種の塩基性元素と、を含む複合酸化物からなるものであり、いわゆるシリカ系複合材料である。 The silica-based material of the present embodiment includes silicon, aluminum, and at least one fourth periodic element selected from the group consisting of iron (Fe), cobalt (Co), nickel (Ni), and zinc (Zn). A composite oxide containing at least one basic element selected from the group consisting of alkali metal elements, alkaline earth metal elements, and rare earth elements, and is a so-called silica-based composite material.
以下、本実施形態のシリカ系材料の特性について説明する。本実施形態において、シリカ系材料の耐酸性及び塩基性、機械的強度を大きく改善できた理由については、以下のように推定される。 Hereinafter, the characteristics of the silica-based material of the present embodiment will be described. In the present embodiment, the reason why the acid resistance, basicity, and mechanical strength of the silica-based material can be greatly improved is estimated as follows.
本実施形態のシリカ系材料では、シリカゲルのような未架橋シリカ(Si−O)鎖を有するシリカにアルミニウム(Al)が共存することで、Si−O−Al−O−Si結合のようなSi−O鎖のAlによる架橋構造(以下、「シリカ・アルミナ架橋構造」ともいう)が新たに形成され、Si−O鎖本来の酸性物質に対する安定性を失うことなく、Alによる架橋構造が形成されると考えられる。これにより、Si−O結合が強化されると共に、耐加水分解安定性(以下、単に「耐水性」ともいう)が格段に向上すると考えられる。また、シリカ・アルミナ架橋構造が形成されると、シリカ単独の場合に比べてSi−O未架橋鎖が減少し、機械的強度も大きくなると考えられる。すなわち、シリカ・アルミナ架橋構造の形成量と、得られるシリカ系材料の機械的強度及び耐水性の向上とが相関するものと推定される。 In the silica-based material of the present embodiment, aluminum (Al) coexists in silica having uncrosslinked silica (Si—O) chains such as silica gel, so that Si such as Si—O—Al—O—Si bond is present. -O chain Al cross-linked structure (hereinafter also referred to as "silica / alumina cross-linked structure") is newly formed, and Al- cross-linked structure is formed without losing stability to the original acidic substance of Si-O chain. It is thought. Thereby, it is considered that Si—O bond is strengthened and hydrolysis stability (hereinafter also simply referred to as “water resistance”) is remarkably improved. Moreover, when a silica-alumina crosslinked structure is formed, it is considered that Si—O uncrosslinked chains are reduced and mechanical strength is increased as compared with the case of silica alone. That is, it is presumed that the amount of silica-alumina crosslinked structure formed correlates with the improvement in mechanical strength and water resistance of the resulting silica-based material.
シリカ・アルミナ架橋構造の生成に伴い、Si(4価)とAl(3価)との価数の違いに基づいて、電荷が不安定となる。そこで、本実施形態のシリカ系材料では、ケイ素及びアルミニウムに加えて、アルカリ金属元素、アルカリ土類金属元素及び希土類元素より選択される少なくとも1種の塩基性元素が共存する。これにより、1〜3価の塩基性元素が補償中和し、電荷の安定化が促される。さらに、三成分系となることにより、さらに電荷的なバランスがとれるため、その構造の安定性がより高められるものと推定される。その根拠の一つとして、シリカ−アルミナでは酸性を示すのに対し、シリカ−アルミナ−マグネシアではほぼ中性を示す。 With the generation of the silica-alumina crosslinked structure, the charge becomes unstable based on the difference in valence between Si (tetravalent) and Al (trivalent). Therefore, in the silica-based material of the present embodiment, at least one basic element selected from alkali metal elements, alkaline earth metal elements, and rare earth elements coexists in addition to silicon and aluminum. Thereby, 1 to 3 basic elements are compensated and neutralized, and charge stabilization is promoted. Furthermore, it is presumed that the stability of the structure can be further improved because the ternary system can further balance the charge. One reason for this is that silica-alumina is acidic while silica-alumina-magnesia is almost neutral.
さらに、本実施形態のシリカ系材料は、上記三成分元素に加えて、鉄、コバルト、ニッケル及び亜鉛からなる群より選択される少なくとも1種の第4周期元素を含むことで、その第4周期元素を含有しないものと比較して、耐酸性及び塩基性が高くなる。そのため、酸、塩基に繰り返し曝されるpHスイング条件においても、構造安定性が高く、細孔径の拡大と比表面積の低下とが抑制される。 Furthermore, the silica-based material of the present embodiment contains at least one fourth periodic element selected from the group consisting of iron, cobalt, nickel and zinc in addition to the above three component elements, so that the fourth period Acid resistance and basicity are higher than those not containing elements. Therefore, even under pH swing conditions where the acid and base are repeatedly exposed, the structural stability is high, and an increase in pore diameter and a decrease in specific surface area are suppressed.
本発明者らの検討によると、シリカ−アルミナ又はシリカ−アルミナ−マグネシアを酸、塩基に繰り返し曝した場合、徐々にではあるがこれらシリカ系材料の構造変化が起こることが明らかになった。この現象は、これらのシリカ系材料が局所的に酸と塩基とに繰り返し曝され、シリカ系材料中のシリカ及びアルミニウムの一部が溶解、析出し、シリカ・アルミナ架橋構造の再配列が生じることによって、シリカ系材料の細孔径が拡大することに起因すると考えられる。また、上記シリカ系材料に貴金属が担持された金属担持物の場合、pHスイングによる細孔径の拡大に伴って、担持された貴金属のシンタリングが起こり、貴金属の比表面積が低下することによって、触媒活性が低下することも判明した。 According to the study by the present inventors, it has been clarified that when silica-alumina or silica-alumina-magnesia is repeatedly exposed to acids and bases, the structural changes of these silica-based materials occur gradually. This phenomenon is that these silica-based materials are repeatedly exposed to acids and bases locally, and some silica and aluminum in the silica-based materials dissolve and precipitate, resulting in rearrangement of the silica-alumina crosslinked structure. This is considered to be caused by the increase in the pore diameter of the silica-based material. In addition, in the case of a metal-carrying material in which a noble metal is supported on the silica-based material, sintering of the supported noble metal occurs as the pore diameter increases due to pH swing, and the specific surface area of the noble metal decreases, thereby reducing the catalyst. It was also found that the activity decreased.
一方、本実施形態のシリカ系材料においては、上記第4周期元素が、そのシリカ系材料の構成元素であるアルミニウム及び/又は塩基性元素と反応することによって、第4周期元素を含む複合酸化物が生成していると考えられる。そのような化合物の形成がシリカ・アルミナ架橋構造の安定化に作用した結果、シリカ系材料の耐酸性及び塩基性が向上し、構造変化が大きく改善されたと考えられる。 On the other hand, in the silica-based material of the present embodiment, the fourth periodic element reacts with aluminum and / or a basic element that is a constituent element of the silica-based material, so that a composite oxide containing the fourth periodic element is obtained. Is considered to be generated. As a result of the formation of such a compound acting on the stabilization of the silica-alumina crosslinked structure, it is considered that the acid resistance and basicity of the silica-based material are improved, and the structural change is greatly improved.
ここで、本明細書中の「複合酸化物」とは、2種以上の金属を含む酸化物を表す。すなわち、「複合酸化物」とは、金属酸化物の2種以上が化合物を形成した酸化物であり、その構造の単位としてオキソ酸のイオンが存在しない複酸化物(例えば、ニッケルのペロブスカイト型酸化物やスピネル型酸化物)を包含する。ただし、複酸化物よりも広い概念であり、2種以上の金属が複合した酸化物を全て包含する。2種以上の金属酸化物が固溶体を形成した酸化物も「複合酸化物」の範疇である。 Here, the “composite oxide” in the present specification represents an oxide containing two or more metals. That is, the “composite oxide” is an oxide in which two or more kinds of metal oxides form a compound, and a double oxide in which an oxoacid ion does not exist as a structural unit (for example, perovskite oxidation of nickel). Products and spinel oxides). However, it is a concept wider than a double oxide, and includes all oxides in which two or more metals are combined. An oxide in which two or more metal oxides form a solid solution is also a category of “composite oxide”.
例えば、上記第4周期元素としてニッケル、塩基性元素としてマグネシウムを選定し、ケイ素−アルミニウム−ニッケル−マグネシウムを含む複合酸化物からなるシリカ系材料について、二結晶型高分解能蛍光X線分析法(HRXRF)によってニッケルの化学状態を解析すると、本実施形態のシリカ系材料中のニッケルは、単一化合物である酸化ニッケルとしては存在しない。そのニッケルは、酸化ニッケルとアルミナ及び/又はマグネシアとが結合して生成するニッケルの酸化化合物若しくは固溶体又はこれらの混合物等の、ニッケルを含む複合酸化物として存在する。 For example, nickel is selected as the fourth periodic element, magnesium is selected as the basic element, and a silica-based material composed of a composite oxide containing silicon-aluminum-nickel-magnesium is subjected to double-crystal high-resolution X-ray fluorescence analysis (HRXRF). ), The nickel in the silica-based material of this embodiment does not exist as nickel oxide which is a single compound. The nickel exists as a composite oxide containing nickel, such as a nickel oxide compound or a solid solution formed by combining nickel oxide and alumina and / or magnesia, or a mixture thereof.
二結晶型高分解能蛍光X線分析法(HRXRF)は、そのエネルギー分解能が極めて高く、得られるスペクトルのエネルギー位置(化学シフト)や形状から元素の化学状態が分析できる。特に、3d遷移金属元素のKαスペクトルにおいては、価数や電子状態の変化によって化学シフトやスペクトル形状に変化が現れ、元素の化学状態を詳細に解析することができる。本実施形態のシリカ系材料は、酸化ニッケルの場合と比較するとNiKαスペクトルが異なっており、単一化合物である酸化ニッケルとは異なるニッケルの化学状態が確認される。 The double-crystal type high-resolution X-ray fluorescence analysis (HRXRF) has extremely high energy resolution, and can analyze the chemical state of an element from the energy position (chemical shift) and shape of the spectrum obtained. In particular, in the Kα spectrum of a 3d transition metal element, a chemical shift and a spectrum shape change due to a change in valence and electronic state, and the chemical state of the element can be analyzed in detail. The silica-based material of the present embodiment has a NiKα spectrum different from that of nickel oxide, and a nickel chemical state different from nickel oxide, which is a single compound, is confirmed.
本実施形態のシリカ系材料において、ニッケルは、例えば、酸化ニッケルとアルミナとのスピネル化合物であるアルミン酸ニッケル(NiAl2O4)、あるいは、酸化ニッケルとマグネシアとの固溶体(NiO・MgO)として存在すると推定される。ニッケル以外の上記第4周期元素についても同様に、その酸化物がアルミナとのスピネル化合物又は塩基性金属酸化物との固溶体を形成することによって、シリカ・アルミナ架橋構造の安定化に作用し、化学的安定性が高くなったものと考えられる。 In the silica-based material of the present embodiment, nickel exists as, for example, nickel aluminate (NiAl 2 O 4 ), which is a spinel compound of nickel oxide and alumina, or a solid solution (NiO · MgO) of nickel oxide and magnesia. It is estimated that. Similarly, for the fourth periodic element other than nickel, the oxide forms a solid solution with a spinel compound or basic metal oxide with alumina, which acts to stabilize the silica-alumina crosslinked structure. It is thought that the stability of the product has increased.
本実施形態のシリカ系材料は、その比表面積は特に限定されないが、担体として用いる場合は、20〜500m2/gであるのが好ましく、より好ましくは50〜400m2/g、さらに好ましくは50〜350m2/gである。シリカ系材料を担体として用いる場合、貴金属等の担持成分の担持しやすさの観点から、また前記担持物を触媒として用いる場合は触媒活性の観点から、シリカ系材料の比表面積は20m2/g以上であることが好ましい。また、機械的強度及び耐水性の観点から、シリカ系材料の比表面積は、500m2/g以下であることが好ましい。 Silica based material according to the present embodiment is not limited to the specific surface area, especially when used as a carrier is preferably from 20 to 500 m 2 / g, more preferably 50 to 400 m 2 / g, more preferably 50 -350 m < 2 > / g. When using a silica-based material as a support, the specific surface area of the silica-based material is 20 m 2 / g from the viewpoint of easy support of a support component such as a noble metal and from the viewpoint of catalytic activity when the support is used as a catalyst. The above is preferable. From the viewpoint of mechanical strength and water resistance, the specific surface area of the silica-based material is preferably 500 m 2 / g or less.
シリカ系材料が触媒担体として用いられる場合、その細孔径は好ましくは3〜50nm、より好ましくは3〜30nm、さらに好ましくは3〜10nmである。触媒を液相反応で使用する場合に、反応基質の拡散過程を律速にしないよう細孔内拡散抵抗を大きくし過ぎず、反応活性を高く維持する観点から、細孔径は3nm以上であることが好ましい。一方、触媒の割れ難さ、貴金属等、担持成分の剥離し難さの観点から50nm以下であることが好ましい。 When a silica-based material is used as a catalyst carrier, the pore diameter is preferably 3 to 50 nm, more preferably 3 to 30 nm, and still more preferably 3 to 10 nm. When the catalyst is used in a liquid phase reaction, the pore diameter should be 3 nm or more from the viewpoint of maintaining a high reaction activity without increasing the diffusion resistance in the pores so as not to limit the diffusion process of the reaction substrate. preferable. On the other hand, the thickness is preferably 50 nm or less from the viewpoint of difficulty in cracking the catalyst and difficulty in peeling off the supported components such as noble metals.
シリカ系材料の細孔容積は、強度、担持特性の観点から0.1〜1.0mL/gの範囲が好ましく、より好ましくは0.1〜0.5mL/gの範囲である。シリカ系材料中の細孔は、担持成分を担持するために必要となる。本実施形態のシリカ系材料は、機械的強度及び耐水性の観点から、比表面積、細孔径及び細孔容積が共に上記範囲にあるものが好ましい。ここで、シリカ系材料の比表面積、細孔径及び細孔容積は、後述する方法に準拠して測定される。 The pore volume of the silica-based material is preferably in the range of 0.1 to 1.0 mL / g, more preferably in the range of 0.1 to 0.5 mL / g, from the viewpoint of strength and support characteristics. The pores in the silica-based material are necessary for supporting the supporting component. From the viewpoint of mechanical strength and water resistance, the silica-based material of the present embodiment preferably has a specific surface area, pore diameter, and pore volume within the above ranges. Here, the specific surface area, the pore diameter, and the pore volume of the silica-based material are measured according to a method described later.
ケイ素、アルミニウム、上記第4周期元素及び上記塩基性元素を含む複合酸化物からなるシリカ系材料は、ケイ素とアルミニウムと第4周期元素と塩基性元素との合計モル量に対して、ケイ素を42〜90モル%、アルミニウムを3〜38モル%、第4周期元素を0.5〜20モル%、塩基性元素を2〜38モル%の範囲で含む。ケイ素、アルミニウム、第4周期元素及び塩基性元素の量が上記範囲内であると、ケイ素、アルミニウム、第4周期元素、塩基性元素及び酸素原子が互いに特定の安定な結合構造を形成し、しかもその結合構造がシリカ系材料中で均一に分散した状態で形成され易い。ケイ素を70〜90モル%、アルミニウムを5〜30モル%、第4周期元素を0.75〜15モル%、塩基性元素を2〜30モル%含むことが好ましく、ケイ素を75〜90モル%、アルミニウムを5〜15モル%、第4周期元素を1〜10モル%、塩基性元素を2〜15モル%の範囲で含むことがより好ましい。特に、第4周期元素の組成比を0.75モル%以上とし、各成分が材料全体に均一に分散した状態にすると、構造中に第4周期元素が存在しない部分が少なく、繰り返し酸及び/又は塩基に晒した場合でも耐性を示す(耐酸性及び塩基性が高い)シリカ系材料を得ることができる。機械的強度が高く、比表面積が大きいシリカ系材料を得る観点から、第4周期元素は10モル%以下、塩基性元素は30モル%以下であることが好ましい。ケイ素とアルミニウムの組成比は、シリカ系材料の耐酸性及び塩基性、耐水性の観点で好ましい範囲に設定している。アルミニウムに対するケイ素の組成比は、好ましくは(ケイ素/アルミニウム)=2〜4である。(ケイ素/アルミニウム)が上記範囲より小さいと、耐酸性及び塩基性が低くなる傾向にある。(ケイ素/アルミニウム)が上記範囲より大きいと、耐水性が低くなる傾向にある。 The silica-based material composed of a composite oxide containing silicon, aluminum, the fourth periodic element, and the basic element contains 42 silicon relative to the total molar amount of silicon, aluminum, the fourth periodic element, and the basic element. -90 mol%, aluminum is included in the range of 3-38 mol%, the fourth periodic element is included in the range of 0.5-20 mol%, and the basic element is included in the range of 2-38 mol%. When the amounts of silicon, aluminum, the fourth periodic element and the basic element are within the above ranges, silicon, aluminum, the fourth periodic element, the basic element and the oxygen atom form a specific stable bond structure with each other, The bond structure is easily formed in a state of being uniformly dispersed in the silica-based material. It is preferable to contain 70 to 90 mol% of silicon, 5 to 30 mol% of aluminum, 0.75 to 15 mol% of the fourth periodic element, and 2 to 30 mol% of the basic element, and 75 to 90 mol% of silicon. More preferably, aluminum is contained in an amount of 5 to 15 mol%, the fourth periodic element is contained in an amount of 1 to 10 mol%, and a basic element is contained in an amount of 2 to 15 mol%. In particular, when the composition ratio of the fourth periodic element is set to 0.75 mol% or more and each component is uniformly dispersed throughout the material, there are few portions where the fourth periodic element does not exist in the structure, and repetitive acids and / or Alternatively, a silica-based material that exhibits resistance even when exposed to a base (high acid resistance and basicity) can be obtained. From the viewpoint of obtaining a silica-based material having high mechanical strength and a large specific surface area, the fourth periodic element is preferably 10 mol% or less and the basic element is preferably 30 mol% or less. The composition ratio of silicon and aluminum is set in a preferable range from the viewpoint of acid resistance, basicity, and water resistance of the silica-based material. The composition ratio of silicon to aluminum is preferably (silicon / aluminum) = 2-4. When (silicon / aluminum) is smaller than the above range, acid resistance and basicity tend to be low. When (silicon / aluminum) is larger than the above range, the water resistance tends to be low.
塩基性元素のアルカリ金属元素の例としては、リチウム(Li)、ナトリウム(Na)、カリウム(K)、ルビジウム(Rb)、セシウム(Cs)が、アルカリ土類金属元素の例としては、ベリリウム(Be)、マグネシウム(Mg)、カルシウム(Ca)、ストロンチウム(Sr)、バリウム(Ba)が、希土類元素の例としては、ランタン(La)、セリウム(Ce)、プラセオジム(Pr)がそれぞれ挙げられる。 Examples of basic alkali metal elements include lithium (Li), sodium (Na), potassium (K), rubidium (Rb), and cesium (Cs). Examples of alkaline earth metal elements include beryllium ( Examples of rare earth elements include Be), magnesium (Mg), calcium (Ca), strontium (Sr), and barium (Ba), and lanthanum (La), cerium (Ce), and praseodymium (Pr).
本実施形態においては、第4周期元素とアルミニウム又は塩基性元素との組成比に好適な範囲が存在する。アルミニウムに対する第4周期元素の組成比(第4周期元素/アルミニウム)は、モル基準で、好ましくは0.02〜2.0、より好ましくは0.05〜1.75、さらに好ましくは0.1〜1.2である。また、塩基性元素に対する第4周期元素の組成比(第4周期元素/塩基性元素)は、モル基準で、好ましくは0.02〜2.0、より好ましくは0.05〜1.75、さらに好ましくは0.1〜1.2である。第4周期元素とアルミニウム又は塩基性元素との組成比が上記範囲内であると、アルミニウムの溶出及びシリカ系材料の構造変化の改善効果が大きくなる傾向がある。これは、この範囲内で第4周期元素、アルミニウム、塩基性元素が特定の複合酸化物を形成し、安定な結合構造を形成するためと考えられる。つまり、シリカ系材料中で、塩基性元素又はアルミニウムに対する第4周期元素の比率が低すぎると、好ましい構造は局所的には形成されるものの、シリカ系材料全体にわたって十分な存在密度で形成されるとは限らない。これに対し、上述の組成比、特に(第4周期元素/アルミニウム)=0.05〜1.75、(第4周期元素/塩基性元素)=0.05〜1.75を満たす場合は、好ましい構造が材料全体の安定化に寄与できる程度に存在し得ると考えられる。 In the present embodiment, there is a suitable range for the composition ratio between the fourth periodic element and aluminum or a basic element. The composition ratio of the fourth periodic element to aluminum (fourth periodic element / aluminum) is preferably 0.02 to 2.0, more preferably 0.05 to 1.75, and still more preferably 0.1 on a molar basis. ~ 1.2. The composition ratio of the fourth periodic element to the basic element (fourth periodic element / basic element) is preferably 0.02 to 2.0, more preferably 0.05 to 1.75 on a molar basis. More preferably, it is 0.1-1.2. When the composition ratio of the fourth periodic element and aluminum or the basic element is within the above range, the effect of improving the elution of aluminum and the structural change of the silica-based material tends to increase. This is presumably because the fourth periodic element, aluminum, and the basic element form a specific composite oxide within this range to form a stable bond structure. That is, if the ratio of the fourth periodic element to the basic element or aluminum is too low in the silica-based material, a preferable structure is formed locally, but is formed with a sufficient density over the entire silica-based material. Not necessarily. On the other hand, when the above composition ratio, particularly (fourth periodic element / aluminum) = 0.05 to 1.75, (fourth periodic element / basic element) = 0.05 to 1.75 is satisfied, It is believed that a preferred structure can exist to the extent that it can contribute to the stabilization of the overall material.
第4周期元素がニッケル、塩基性元素がマグネシウムである場合、ケイ素と、アルミニウムと、ニッケルと、マグネシウムとを含む複合酸化物からなるシリカ系材料は、耐酸性及び塩基性、機械的強度及び耐水性の観点で、ケイ素とアルミニウムとニッケルとマグネシウムとの合計モル量に対して、好ましくは、ケイ素を42〜90モル%、アルミニウムを3〜38モル%、ニッケルを0.5〜20モル%、マグネシウムを2〜38モル%の範囲で含む。より好ましくは、ケイ素を70〜90モル%、アルミニウムを5〜30モル%、ニッケルを0.75〜15モル%、マグネシウムを2〜30モル%、さらに好ましくは、ケイ素を75〜90モル%、アルミニウムを5〜15モル%、ニッケルを1〜10モル%、マグネシウムを2〜15モル%の範囲で含む。ケイ素、アルミニウム、ニッケル及びマグネシウムの元素組成が上記範囲内であると、ケイ素、アルミニウム、ニッケル及びマグネシウムが特定の安定な結合構造を形成し易い。特に、より好ましい組成比の場合、上述の安定な結合構造は、シリカ系材料中に均一に分散していると想定しても、シリカ系材料全体の安定化に寄与するのに十分な存在密度で形成されると期待される。その結果、シリカ系材料は、繰り返しの使用にも耐えうる良好な耐酸性、塩基性及び機械的強度を示す傾向にある。 When the fourth periodic element is nickel and the basic element is magnesium, the silica-based material made of a composite oxide containing silicon, aluminum, nickel, and magnesium has acid resistance and basicity, mechanical strength, and water resistance. From the viewpoint of safety, preferably, silicon is 42 to 90 mol%, aluminum is 3 to 38 mol%, nickel is 0.5 to 20 mol%, based on the total molar amount of silicon, aluminum, nickel and magnesium. Magnesium is contained in the range of 2 to 38 mol%. More preferably, silicon is 70-90 mol%, aluminum is 5-30 mol%, nickel is 0.75-15 mol%, magnesium is 2-30 mol%, more preferably, silicon is 75-90 mol%, It contains 5 to 15 mol% aluminum, 1 to 10 mol% nickel, and 2 to 15 mol% magnesium. When the elemental composition of silicon, aluminum, nickel and magnesium is within the above range, silicon, aluminum, nickel and magnesium can easily form a specific stable bond structure. In particular, in the case of a more preferable composition ratio, even if it is assumed that the above-described stable bonding structure is uniformly dispersed in the silica-based material, the existing density is sufficient to contribute to the stabilization of the entire silica-based material. Is expected to be formed. As a result, silica-based materials tend to exhibit good acid resistance, basicity and mechanical strength that can withstand repeated use.
本実施形態のシリカ系材料の固体形態としては、所定の物性が得られるものであれば特に限定されない。 The solid form of the silica-based material of the present embodiment is not particularly limited as long as predetermined physical properties can be obtained.
本実施形態のシリカ系材料中における第4周期元素の分散状態は、特に限定されないが、シリカ系材料全体の構造を安定化する観点で、材料全体に偏りなく分散していることが好ましい。具体的には、シリカ材料の断面を電子プローブ微小部分析法(EPMA)で観察測定し、いずれの観察場所においても、第4周期元素がほぼ同濃度で存在している状態であることが好ましい。このような分散状態であると、ケイ素、アルミニウム、第4周期元素及び塩基性元素が形成する特定の安定な結合構造が材料全体の安定化に寄与できる程度に存在し、長期間に渡って繰り返し使用しても耐酸性及び塩基性を維持する傾向にある。ここで、「ほぼ同濃度」とは、測定値の分布範囲が10%以内である状態をいう。 The dispersion state of the fourth periodic element in the silica-based material of the present embodiment is not particularly limited, but it is preferable that the fourth periodic element is uniformly distributed in the entire material from the viewpoint of stabilizing the structure of the entire silica-based material. Specifically, the cross-section of the silica material is observed and measured by an electron probe microanalysis (EPMA), and it is preferable that the fourth periodic element is present at almost the same concentration at any observation location. . In such a dispersed state, there exists a specific stable bond structure formed by silicon, aluminum, the fourth periodic element and the basic element to the extent that it can contribute to the stabilization of the whole material, and it is repeated over a long period of time. Even if used, it tends to maintain acid resistance and basicity. Here, “substantially the same concentration” means a state where the distribution range of measured values is within 10%.
シリカ系材料の実質的な厚さ又は粒子径は、μmからcmのオーダーの様々の大きさでよく、形状も特に限定されない。シリカ系材料の形状の具体例としては、球状、楕円状、円柱状、錠剤状、中空円柱状、板状、棒状、シート状、ハニカム状が挙げられる。触媒又は触媒担体として用いる場合、本実施形態のシリカ系材料の形状を、用いる反応形式によって適宜変えることができる。例えば、固定床反応にシリカ系材料を用いる場合、圧力損失の少ない中空円柱状又はハニカム状が好ましく、液相スラリー懸濁条件では、一般的に球状が好ましい。特に、シリカ系材料を流動床反応に使われる触媒の担体とする場合、その形状は球状の粒子状であることが好ましく、その粒子径は、平均粒子径で好ましくは1〜200μm、より好ましくは10〜200μm、さらに好ましくは30〜150μmである。シリカ系材料をこのような粒子として用いることで、本発明の優れた効果を一層有効かつ確実に引き出すことが可能になる。シリカ系材料の平均粒子径は、後述する方法に準拠して測定される。 The substantial thickness or particle diameter of the silica-based material may be various sizes on the order of μm to cm, and the shape is not particularly limited. Specific examples of the shape of the silica-based material include a spherical shape, an elliptical shape, a cylindrical shape, a tablet shape, a hollow cylindrical shape, a plate shape, a rod shape, a sheet shape, and a honeycomb shape. When used as a catalyst or a catalyst carrier, the shape of the silica-based material of the present embodiment can be appropriately changed depending on the reaction type used. For example, when a silica-based material is used for the fixed bed reaction, a hollow cylindrical shape or a honeycomb shape with a small pressure loss is preferable, and a spherical shape is generally preferable under liquid phase slurry suspension conditions. In particular, when a silica-based material is used as a carrier for a catalyst used in a fluidized bed reaction, the shape is preferably a spherical particle, and the particle size is preferably an average particle size of 1 to 200 μm, more preferably It is 10-200 micrometers, More preferably, it is 30-150 micrometers. By using a silica-based material as such particles, the excellent effects of the present invention can be more effectively and reliably extracted. The average particle diameter of the silica-based material is measured according to the method described later.
ケイ素、アルミニウム、上記第4周期元素及び上記塩基性元素を含む複合酸化物からなるシリカ系材料は、シリカに比べて高い耐水性を有し、アルミナに比べて耐酸性が高い。また、そのシリカ系材料は、シリカに比べて機械的強度が高い等、優れた物性を備えている。しかも、そのシリカ系材料は、シリカ−アルミナ又はシリカ−アルミナ−マグネシアに比べて化学的安定性が極めて高く、例えば、酸、塩基に繰り返し曝されるpHスイング条件において、ケイ素、アルミニウムの一部が溶解、析出することによる細孔径の拡大や比表面積の低下等の構造変化が抑制されるものである。 A silica-based material made of a composite oxide containing silicon, aluminum, the fourth periodic element, and the basic element has higher water resistance than silica and higher acid resistance than alumina. In addition, the silica-based material has excellent physical properties such as higher mechanical strength than silica. In addition, the silica-based material has extremely high chemical stability compared to silica-alumina or silica-alumina-magnesia. For example, in the pH swing condition that is repeatedly exposed to an acid or a base, a part of silicon and aluminum is present. Structural changes such as expansion of pore diameter and reduction of specific surface area due to dissolution and precipitation are suppressed.
次に、上記のような組成を有する本実施形態のシリカ系材料の製造方法について説明する。 Next, the manufacturing method of the silica type material of this embodiment which has the above compositions is demonstrated.
ケイ素、アルミニウム、上記第4周期元素及び上記塩基性元素を含む複合酸化物からなるシリカ系材料の製造方法としては、特に限定されず、例えば、以下の(1)〜(6)の方法によりシリカとアルミニウム化合物と第4周期元素の化合物と塩基性元素の化合物とを含む組成物を得る工程と、その組成物を必要に応じて乾燥して乾燥物を得る工程と、その乾燥物又は上記組成物を後述する条件で焼成する工程とを有する。
(1)市販のシリカ−アルミナ組成物と第4周期元素の化合物及び塩基性元素の化合物とを反応させる。
(2)予めシリカ−アルミナゲルを形成させ、第4周期元素の化合物及び塩基性元素の化合物をゲルに添加し、反応させる。
(3)シリカゾルと、アルミニウム化合物、第4周期元素の化合物及び塩基性元素の化合物とを反応させる。
(4)シリカゾルと、水に不溶のアルミニウム化合物、水に不溶の第4周期元素の化合物及び水に不溶の塩基性元素の化合物とを反応させる。
(5)シリカゲルと、水溶性アルミニウム化合物、水溶性の第4周期元素の化合物及び水溶性の塩基性元素の化合物の水溶液とを反応させる。
(6)シリカゲルと、アルミニウム化合物、第4周期元素の化合物及び塩基性元素の化合物とを固相反応させる。
The method for producing a silica-based material comprising a composite oxide containing silicon, aluminum, the fourth periodic element and the basic element is not particularly limited. For example, silica is produced by the following methods (1) to (6). And a step of obtaining a composition comprising an aluminum compound, a compound of a fourth periodic element, and a compound of a basic element, a step of drying the composition as necessary to obtain a dried product, and the dried product or the above composition And baking the product under conditions described later.
(1) A commercially available silica-alumina composition is reacted with a compound of a fourth periodic element and a compound of a basic element.
(2) A silica-alumina gel is formed in advance, and a compound of a fourth periodic element and a compound of a basic element are added to the gel and reacted.
(3) The silica sol is reacted with an aluminum compound, a fourth periodic element compound, and a basic element compound.
(4) A silica sol is reacted with an aluminum compound insoluble in water, a compound of a fourth periodic element insoluble in water, and a compound of a basic element insoluble in water.
(5) The silica gel is reacted with an aqueous solution of a water-soluble aluminum compound, a water-soluble fourth periodic element compound, and a water-soluble basic element compound.
(6) Solid phase reaction of silica gel with an aluminum compound, a fourth periodic element compound, and a basic element compound.
以下に、上記(1)〜(6)の方法を用いたシリカ系材料の調製方法について詳細に説明する。 Below, the preparation method of the silica-type material using the method of said (1)-(6) is demonstrated in detail.
上記(1)の方法では、市販のシリカ−アルミナ組成物に第4周期元素を含む化合物と塩基性元素を含む化合物とを混合して、スラリーを得る。そのスラリーを乾燥して、さらに後述する条件で焼成することにより、シリカ系材料を調製することができる。第4周期元素を含む化合物及び塩基性元素を含む化合物としては、塩化物、炭酸塩、硝酸塩、酢酸塩に代表される水溶性化合物が好ましい。ただし、水酸化物、酸化物等の水に不溶な化合物も用いることができる。 In the method (1), a commercially available silica-alumina composition is mixed with a compound containing a fourth periodic element and a compound containing a basic element to obtain a slurry. The silica-based material can be prepared by drying the slurry and firing it under the conditions described later. As the compound containing the fourth periodic element and the compound containing the basic element, water-soluble compounds represented by chlorides, carbonates, nitrates and acetates are preferable. However, water-insoluble compounds such as hydroxides and oxides can also be used.
上記(2)〜(6)の方法においては、シリカ源として、例えば、シリカゾル、水ガラス又はシリカゲルを用いることができる。シリカゲルとしてはAlと反応する未架橋Si部位を有するものであればよく、Si−O鎖の長さについては特に制約はない。アルミニウム化合物としては、アルミン酸ソーダ、塩化アルミニウム6水和物、過塩素酸アルミニウム6水和物、硫酸アルミニウム、硝酸アルミニウム9水和物、二酢酸アルミニウムに代表される水溶性化合物が好ましい。ただし、水酸化アルミニウム、酸化アルミニウム等の水に不溶な化合物であってもよく、シリカゾル、シリカゲル中の未架橋Siと反応する化合物であれば、シリカ系材料の調製に用いることが可能である。第4周期元素又は塩基性元素を含む化合物としては、例えば、それらの元素の酸化物、水酸化物、塩化物、炭酸塩、硫酸塩、硝酸塩、酢酸塩が挙げられる。 In the methods (2) to (6), for example, silica sol, water glass, or silica gel can be used as the silica source. As long as it has an uncrosslinked Si site | part which reacts with Al as silica gel, there is no restriction | limiting in particular about the length of a Si-O chain | strand. As the aluminum compound, water-soluble compounds represented by sodium aluminate, aluminum chloride hexahydrate, aluminum perchlorate hexahydrate, aluminum sulfate, aluminum nitrate nonahydrate, and aluminum diacetate are preferable. However, it may be a water-insoluble compound such as aluminum hydroxide or aluminum oxide, and any compound that reacts with silica sol or uncrosslinked Si in silica gel can be used for preparing a silica-based material. Examples of the compound containing the fourth periodic element or basic element include oxides, hydroxides, chlorides, carbonates, sulfates, nitrates, and acetates of these elements.
シリカ−アルミナゲルを用いる(2)の方法の場合、予め水ガラスに硫酸を加えてpH8〜10.5のシリカヒドロゲルを作製し、これにpHが2又はそれ以下のAl2(SO4)3溶液を加え、さらにpHが5〜5.5のアルミン酸ソーダを添加してシリカ−アルミナヒドロゲルを調製する。次いで、そのヒドロゲルに含まれる水分を噴霧乾燥等により10〜40%に調整し、そこに第4周期元素の化合物と塩基性元素の化合物とを添加して組成物を得る。そして、その組成物を乾燥した後、後述の条件で焼成することにより、シリカ系材料を得ることができる。 In the case of the method (2) using silica-alumina gel, sulfuric acid is previously added to water glass to prepare a silica hydrogel having a pH of 8 to 10.5, and Al 2 (SO 4 ) 3 having a pH of 2 or lower. A silica-alumina hydrogel is prepared by adding the solution and further adding sodium aluminate having a pH of 5 to 5.5. Next, the moisture contained in the hydrogel is adjusted to 10 to 40% by spray drying or the like, and a compound of a fourth periodic element and a compound of a basic element are added thereto to obtain a composition. And after drying the composition, a silica-type material can be obtained by baking on the conditions mentioned later.
シリカゾルを出発原料とする(3)及び(4)の方法の場合、シリカゾルに、アルミニウム化合物と第4周期元素の化合物と塩基性元素の化合物とを混合して、シリカゾルとアルミニウム化合物と第4周期元素の化合物と塩基性元素の化合物とを含む組成物である混合物ゾルを得、次いで、その混合物ゾルを乾燥してゲルを得、後述の温度、時間、雰囲気条件でそのゲルを焼成する。あるいは、上記混合物ゾルにアルカリ性水溶液を加えて、シリカとアルミニウム化合物と第4周期元素の化合物と塩基性元素の化合物とを共沈させ、その共沈物を乾燥後、後述の条件で焼成する。また、上記混合物ゾルをそのままスプレードライヤーを用いて乾燥すると共に微粉化したり、上記混合物ゾルを乾燥してゲルを造粒したりする工程を経ることによって、所望の粒子径を有するシリカ系材料を得ることも可能である。 In the case of the methods (3) and (4) using silica sol as a starting material, an aluminum compound, a fourth periodic element compound and a basic element compound are mixed in the silica sol, and the silica sol, aluminum compound and fourth period are mixed. A mixture sol which is a composition containing a compound of an element and a compound of a basic element is obtained, then the mixture sol is dried to obtain a gel, and the gel is fired at the temperature, time and atmospheric conditions described below. Alternatively, an alkaline aqueous solution is added to the mixture sol to coprecipitate silica, an aluminum compound, a fourth periodic element compound, and a basic element compound, and the coprecipitate is dried and then fired under the conditions described below. In addition, a silica-based material having a desired particle size is obtained by passing the mixture sol as it is using a spray dryer and pulverizing the mixture sol, or drying the mixture sol and granulating the gel. It is also possible.
特に(4)の方法の場合、シリカゾルと、水に不溶のアルミニウム化合物、水に不溶の第4周期元素の化合物及び水に不溶の塩基性元素の化合物とを反応させるが、この時、アルミニウム化合物、第4周期元素の化合物及び塩基性元素の化合物をそれぞれ若しくはまとめて、予め所定の粒子径にまで粉砕しておくか、あるいは、予備的に粗粉砕しておくこともできる。水に不溶のアルミニウム化合物、水に不溶の第4周期元素の化合物及び水に不溶の塩基性元素の化合物と、シリカゾルとを混合して反応させた後、反応物を乾燥し、さらに後述する条件で焼成する。なお、アルミニウム化合物、第4周期元素の化合物及び塩基性元素の化合物を予め粉砕したり予備的に粗粉砕したりせず、焼成後のシリカ−アルミナ−第4周期元素−塩基性元素の組成物を所定の粒径まで粉砕してもよい。 In particular, in the case of the method (4), silica sol, an aluminum compound insoluble in water, a compound of a fourth periodic element insoluble in water, and a compound of a basic element insoluble in water are reacted. The fourth periodic element compound and the basic element compound may be pulverized to a predetermined particle diameter in advance or preliminarily or coarsely pulverized. Conditions obtained by mixing the aluminum compound insoluble in water, the compound of the fourth periodic element insoluble in water, the compound of the basic element insoluble in water, and the silica sol, and then drying the reaction product, and further described below Bake with. In addition, the composition of silica-alumina-fourth periodic element-basic element after firing without preliminarily pulverizing or preliminarily coarsely pulverizing the aluminum compound, the fourth periodic element compound, and the basic element compound. May be pulverized to a predetermined particle size.
シリカゲルを出発原料として用いる(5)の方法の場合、シリカゲルに水溶性アルミニウム化合物、水溶性の第4周期元素の化合物及び水溶性の塩基性元素の化合物の水溶液を反応させるが、この時、シリカゲルを予め所定の粒径まで粉砕しておくか、又は、予備的に粗粉砕しておいてもよい。(5)の方法の場合、シリカゲルと、水溶性アルミニウム化合物の水溶液、水溶性の第4周期元素の化合物の水溶液及び水溶性の塩基性元素の化合物の水溶液とを混合したスラリーを得た後、そのスラリーを乾燥し、さらに後述する条件で1〜48時間焼成する。あるいは、シリカゲルを予め粉砕したり予備的に粗粉砕したりせず、焼成後のシリカ−アルミナ−第4周期元素−塩基性元素の組成物を所定の粒径まで粉砕してもよい。 In the case of the method (5) using silica gel as a starting material, the silica gel is reacted with an aqueous solution of a water-soluble aluminum compound, a water-soluble fourth-period element compound, and a water-soluble basic element compound. May be previously pulverized to a predetermined particle size, or may be preliminarily coarsely pulverized. In the case of the method (5), after obtaining a slurry in which silica gel is mixed with an aqueous solution of a water-soluble aluminum compound, an aqueous solution of a water-soluble fourth periodic element compound, and an aqueous solution of a water-soluble basic element compound, The slurry is dried and further baked for 1 to 48 hours under the conditions described below. Alternatively, the composition of calcined silica-alumina-fourth periodic element-basic element may be pulverized to a predetermined particle size without preliminarily pulverizing or preliminarily coarsely pulverizing the silica gel.
同じくシリカゲルを出発原料として用いる(6)の方法は、シリカゲルと、アルミニウム化合物、第4周期元素の化合物及び塩基性元素の化合物とを固相反応させて、組成物である反応物を得るものである。この場合、Alを未架橋Siと固相状態で反応させる。シリカゲル、アルミニウム化合物、第4周期元素の化合物及び塩基性元素の化合物を予め所定の粒径まで粉砕しておいてもよく、また、予備的に粗粉砕しておいてもよい。この際、各物質を単独で粉砕してもよく、両者を混合して粉砕してもよい。固相反応させて得られた反応物を、必要に応じて乾燥した後、更に焼成する。焼成は後述する温度、時間、雰囲気条件で行うと好ましい。シリカゲル、アルミニウム化合物、第4周期元素の化合物、塩基性元素の化合物を予め粉砕したり予備的に粗粉砕したりせず、反応により得られた反応物を所望の粒子径まで粉砕して用いてもよい。 Similarly, the method (6) using silica gel as a starting material is a method in which a silica gel is reacted with an aluminum compound, a compound of a fourth periodic element and a compound of a basic element to obtain a reactant which is a composition. is there. In this case, Al is reacted with uncrosslinked Si in a solid state. Silica gel, an aluminum compound, a fourth periodic element compound, and a basic element compound may be preliminarily pulverized to a predetermined particle diameter, or may be preliminarily coarsely pulverized. At this time, each substance may be pulverized alone, or both may be mixed and pulverized. The reaction product obtained by the solid phase reaction is dried if necessary and then further baked. Firing is preferably performed under the temperature, time, and atmospheric conditions described below. Silica gel, aluminum compound, 4th period element compound, basic element compound are not pulverized or preliminarily coarsely pulverized, and the reaction product obtained by the reaction is pulverized to a desired particle size. Also good.
シリカとアルミニウム化合物と第4周期元素の化合物と塩基性元素の化合物とを含む組成物の他の調製方法として、ケイ素、アルミニウム及び第4周期元素を含む複合酸化物からなるシリカ系材料に、上記塩基性元素の成分を吸着させる方法を用いることもできる。この場合、例えば、塩基性元素の化合物を溶解した液中に上記シリカ系材料を加えて乾燥処理を行う等の浸漬法を用いた方法や、細孔容量分の塩基性元素の化合物を上記シリカ系材料に染み込ませて乾燥処理を行う含浸法を用いる方法を適用できる。 As another method for preparing a composition containing silica, an aluminum compound, a compound of a fourth periodic element, and a compound of a basic element, a silica-based material composed of a composite oxide containing silicon, aluminum, and the fourth periodic element, A method of adsorbing a basic element component can also be used. In this case, for example, a method using an immersion method such as adding the silica-based material in a solution in which the compound of the basic element is dissolved and performing a drying treatment, or a method using a basic element compound corresponding to the pore volume of the silica A method using an impregnation method in which the material is soaked and dried is applicable.
ケイ素、アルミニウム及び塩基性元素を含む複合酸化物からなるシリカ系材料に、第4周期元素を含む成分を吸着させる方法も用いることができる。この場合、例えば、第4周期元素を含む化合物を溶解した液中に上記シリカ系材料を加えて乾燥処理を行う等の浸漬法を用いた方法や、細孔容量分の第4周期元素を含む化合物を上記シリカ系材料に染み込ませて乾燥処理を行う含浸法を用いる方法を適用できる。ただし、後から塩基性元素を含む成分又は第4周期元素を含む成分を吸着させる方法は、シリカ系材料に塩基性元素を含む成分又は第4周期元素を含む成分を高分散化する上で、液乾燥処理を緩和な条件で行う等の注意が必要である。 A method of adsorbing a component containing a fourth periodic element to a silica-based material made of a composite oxide containing silicon, aluminum, and a basic element can also be used. In this case, for example, a method using an immersion method such as adding a silica-based material to a solution in which a compound containing a fourth periodic element is dissolved and performing a drying treatment, or a fourth periodic element corresponding to the pore volume is included. A method using an impregnation method in which a compound is soaked in the silica-based material and subjected to a drying treatment can be applied. However, a method for adsorbing a component containing a basic element or a component containing a fourth periodic element later is to highly disperse a component containing a basic element or a component containing a fourth periodic element in a silica-based material. Care must be taken such as performing the liquid drying process under mild conditions.
上述のようにして得られた各種原料を含むスラリーに、スラリー性状の制御並びに生成物の細孔構造等の特性及び得られる物性を微調整するために、無機物や有機物を添加してもよい。無機物の具体例としては、硝酸、塩酸、硫酸等の鉱酸類;Li、Na、K、Rb、Cs等のアルカリ金属、Mg、Ca、Sr、Ba等のアルカリ土類金属等の金属塩;及びアンモニアや硝酸アンモニウム等、の水溶性化合物のほか、水中で分散して懸濁液を生じる粘土鉱物が挙げられる。また、有機物の具体例としては、ポリエチレングリコール、メチルセルロース、ポリビニルアルコール、ポリアクリル酸、ポリアクリルアミド等の重合体が挙げられる。 To the slurry containing various raw materials obtained as described above, an inorganic substance or an organic substance may be added in order to control the slurry properties, finely adjust the properties such as the pore structure of the product and the obtained physical properties. Specific examples of inorganic substances include mineral acids such as nitric acid, hydrochloric acid and sulfuric acid; alkali metals such as Li, Na, K, Rb and Cs; metal salts such as alkaline earth metals such as Mg, Ca, Sr and Ba; and In addition to water-soluble compounds such as ammonia and ammonium nitrate, clay minerals that are dispersed in water to form a suspension can be mentioned. Specific examples of organic substances include polymers such as polyethylene glycol, methyl cellulose, polyvinyl alcohol, polyacrylic acid, and polyacrylamide.
無機物及び有機物を添加することにより得られる効果は様々であるが、主には、シリカ系材料の球状への成形、細孔径及び細孔容積の制御が挙げられる。より具体的には、球状のシリカ系材料を得るには、混合スラリーの液質が重要な因子となる。無機物又は有機物を添加して、スラリーの粘度や固形分濃度を調整することによって、球状のシリカ系材料が得られやすい液質に変更できる。また、細孔径及び細孔容積を制御するには、シリカ系材料の成形段階でその内部に残存し、成形後の焼成及び洗浄操作により除去され得る最適な有機化合物を選択すればよい。 There are various effects obtained by adding an inorganic substance and an organic substance. Mainly, the silica-based material is formed into a spherical shape, and the pore diameter and the pore volume are controlled. More specifically, the liquid quality of the mixed slurry is an important factor for obtaining a spherical silica-based material. By adding an inorganic substance or an organic substance and adjusting the viscosity and solid content concentration of the slurry, it can be changed to a liquid quality in which a spherical silica-based material can be easily obtained. In order to control the pore diameter and pore volume, an optimal organic compound that remains in the silica-based material during the molding step and can be removed by firing and washing operations after the molding may be selected.
次いで、前述の各種原料及び添加物を含むスラリーやゲル、反応物等の組成物を乾燥する。乾燥する方法としては特に限定されないが、シリカ系材料の粒子径を制御する観点から噴霧乾燥が好ましい。この場合、混合スラリーを液滴化する方法として、回転円盤方式、二流体ノズル方式、加圧ノズル方式等の公知の噴霧装置を用いる方法が挙げられる。 Next, a composition such as a slurry, gel, or reactant containing the above-described various raw materials and additives is dried. Although it does not specifically limit as a method to dry, Spray drying is preferable from a viewpoint of controlling the particle diameter of a silica type material. In this case, as a method for forming the mixed slurry into droplets, a method using a known spraying device such as a rotating disk method, a two-fluid nozzle method, a pressure nozzle method, or the like can be given.
噴霧する液(スラリー)は、よく混合された状態で用いられることが必要である。混合状態が悪い場合には、組成の偏在によって耐久性が低下する等、シリカ系材料の性能に影響する。特に各原料を調合する時には、スラリーの粘度上昇及び一部ゲル化(コロイドの縮合)が生じる場合もあり、不均一な粒子を形成することが懸念される。そのため、各原料を攪拌下で徐々に混合する等配慮する他、酸やアルカリを加える等の方法によって、例えば、pH2付近のシリカゾルの準安定領域に混合物を制御しながら、混合スラリーを調製することが好ましい場合もある。 The liquid to be sprayed (slurry) needs to be used in a well-mixed state. When the mixed state is poor, the performance of the silica-based material is affected, for example, the durability is lowered due to the uneven distribution of the composition. In particular, when each raw material is prepared, the viscosity of the slurry may increase and the gelation (condensation of the colloid) may occur, and there is a concern that uneven particles may be formed. Therefore, in addition to considering each material gradually mixed under stirring, etc., a mixed slurry is prepared by controlling the mixture in the metastable region of silica sol near pH 2, for example, by adding acid or alkali. May be preferred.
噴霧する液は、所定範囲の粘度と固形分濃度とを有していると好ましい。粘度や固形分濃度が所定範囲よりも低いと、噴霧乾燥で得られる多孔質体が真球とならずに、陥没した球状の多孔質体が多く生成する傾向にある。また、それらが所定範囲よりも高いと、多孔質体同士の分散性に悪影響を及ぼすことがある他、性状によっては安定に液滴が形成しなくなる。そのため、噴霧する液の粘度としては、噴霧可能であれば、噴霧時の温度で5〜10000cpの範囲にあることが好ましい。また、形状の観点から、噴霧可能な範囲で高い粘度の方が好ましい傾向が見られ、操作性とのバランスから、その粘度は、より好ましくは10〜1000cpの範囲にある。また、固形分濃度は10〜50質量%の範囲内にあることが形状や粒子径の観点から好ましい。なお、噴霧乾燥条件の目安として、噴霧乾燥器の乾燥塔入り口の熱風温度が200〜280℃、乾燥塔出口温度が110〜140℃の範囲であると好ましい。 The liquid to be sprayed preferably has a predetermined range of viscosity and solid content concentration. When the viscosity and the solid content concentration are lower than the predetermined range, the porous body obtained by spray drying does not become a true sphere, and there is a tendency that many depressed spherical porous bodies are generated. Moreover, when they are higher than the predetermined range, the dispersibility between the porous bodies may be adversely affected, and depending on the properties, droplets cannot be stably formed. Therefore, the viscosity of the liquid to be sprayed is preferably in the range of 5 to 10000 cp at the spraying temperature as long as spraying is possible. Further, from the viewpoint of the shape, a tendency that a higher viscosity is preferable in a sprayable range is observed, and the viscosity is more preferably in the range of 10 to 1000 cp from the balance with operability. Moreover, it is preferable from a viewpoint of a shape and a particle diameter that solid content concentration exists in the range of 10-50 mass%. In addition, as a standard of spray drying conditions, it is preferable that the hot air temperature at the entrance of the drying tower of the spray dryer is in the range of 200 to 280 ° C and the outlet temperature of the drying tower is in the range of 110 to 140 ° C.
次に、上記(1)〜(5)の方法を経て更に乾燥した後の組成物又は(6)の方法で得られた反応物を焼成することによって固形物が得られる。その焼成温度は、一般的には200〜800℃の範囲である。800℃以下で上記組成物を焼成すると、シリカ系材料の比表面積を大きくすることができ、200℃以上で上記組成物を焼成すると、ゲル間の脱水や縮合反応がより十分となり、細孔容積が大きく嵩高くなるのを更に抑制することができる。焼成温度が300〜600℃の範囲であると、物性のバランス及び操作性等の観点から好ましい。ただし、組成物が硝酸塩を含む場合、その硝酸塩の分解温度以上で焼成することが好ましい。焼成温度や昇温速度によって、多孔質性等のシリカ系材料の物性を変化させることが可能であり、目標とする物性に合わせて、適切な焼成温度及び昇温条件を選定すればよい。すなわち、焼成温度を適切な条件に設定することで複合酸化物として耐久性の維持が良好となり、細孔容積の低下も抑制できる。また、昇温条件として、プログラム昇温等を利用し徐々に昇温していくことが好ましい。これにより、無機物及び有機物のガス化や燃焼が激しくなって、それに伴い設定以上の高温状態に曝されやすくなったり、ひび割れが起こりやすくなったりして、その結果として粉砕が起こる、ということを防ぐことができる。 Next, a solid substance is obtained by baking the composition after further drying through the methods (1) to (5) or the reaction product obtained by the method (6). The firing temperature is generally in the range of 200 to 800 ° C. When the composition is fired at 800 ° C. or lower, the specific surface area of the silica-based material can be increased, and when the composition is fired at 200 ° C. or higher, dehydration and condensation reaction between gels becomes more sufficient, and the pore volume. Can be further suppressed from becoming large and bulky. A firing temperature in the range of 300 to 600 ° C. is preferable from the viewpoint of balance of physical properties and operability. However, when the composition contains a nitrate, it is preferably fired at a temperature higher than the decomposition temperature of the nitrate. The physical properties of the silica-based material such as the porosity can be changed by the firing temperature and the temperature raising rate, and an appropriate firing temperature and temperature raising condition may be selected in accordance with the target physical properties. That is, by setting the firing temperature to an appropriate condition, the durability of the composite oxide can be maintained well, and a decrease in pore volume can be suppressed. Further, it is preferable to gradually increase the temperature using a program temperature increase or the like as the temperature increase condition. As a result, the gasification and combustion of inorganic and organic substances become severe, and accordingly, it becomes easy to be exposed to a high temperature state higher than the setting, and cracking is likely to occur, and as a result, crushing is prevented as a result. be able to.
焼成雰囲気は特に限定されないが、空気中又は窒素中で焼成するのが一般的である。また、焼成時間は、焼成後のシリカ系材料の比表面積に応じて決めることができるが、一般的に1〜48時間である。これらの焼成条件によっても、多孔質性等のシリカ系材料の物性を変化させることが可能であり、目標とする物性に合わせて、各焼成条件を選定すればよい。 The firing atmosphere is not particularly limited, but firing in air or nitrogen is common. Moreover, although baking time can be determined according to the specific surface area of the silica-type material after baking, it is generally 1 to 48 hours. Also depending on these firing conditions, the physical properties of the silica-based material such as porosity can be changed, and each firing condition may be selected according to the target physical properties.
上述のようにして焼成する工程を経て得られた固形物を本実施形態のシリカ系材料として用いてもよいが、その固形物をさらに水熱処理することが好ましい。水熱処理する工程を経ることにより、驚くべきことに大部分の細孔の細孔径が3〜5nmという狭い範囲に存在するような均一な細孔構造を有すると共に、比表面積も機械的強度も大きなシリカ系材料を得ることができる。 Although the solid material obtained through the firing step as described above may be used as the silica-based material of the present embodiment, it is preferable that the solid material is further subjected to hydrothermal treatment. Surprisingly, through the hydrothermal treatment process, the pore diameter of most of the pores has a uniform pore structure that exists in a narrow range of 3 to 5 nm, and the specific surface area and mechanical strength are also large. A silica-based material can be obtained.
ここでいう「水熱処理」とは、水又は水を含む溶液中に、上記固形物を浸漬し、加温しながら一定の時間保持する操作である。これにより、固形物の細孔内に十分な水が存在するようになり、その水を媒体として物質移動が起こり、細孔の再構成が進行すると本発明者らは推定している。したがって、速やかな物質移動を促す観点から、水熱処理の温度は好ましくは60℃以上、より好ましくは70℃以上、さらに好ましくは80℃以上、特に好ましくは90℃以上である。水熱処理の温度は100℃以上の高い温度であってもよいが、その場合、水分が過度に蒸発しないよう、加圧装置が必要になる。また、水熱処理の温度が60℃未満の低い温度でも、本実施形態のシリカ系材料を得ることは可能であるが、処理時間が長くなる傾向にある。また、上述から明らかなように、加圧下で溶液の沸点以上の温度で水熱処理することは短時間で効果を発現する利点がある。ただし、操作の容易性の観点から、通常は沸点以下の範囲で、より高い温度で水熱処理することが好ましい。水熱処理の時間は、固形物の構成金属の種類、金属量、金属組成比、処理温度等の条件により異なるが、好ましくは1分間〜5時間、より好ましくは5分間〜3時間、更に好ましくは5分間〜1時間の範囲内である。 “Hydrothermal treatment” as used herein is an operation of immersing the solid in water or a solution containing water and holding the solid for a certain period of time while heating. As a result, the present inventors presume that sufficient water is present in the pores of the solid matter, mass transfer occurs using the water as a medium, and the reconstruction of the pores proceeds. Therefore, from the viewpoint of promoting rapid mass transfer, the hydrothermal treatment temperature is preferably 60 ° C. or higher, more preferably 70 ° C. or higher, still more preferably 80 ° C. or higher, and particularly preferably 90 ° C. or higher. The temperature of the hydrothermal treatment may be a high temperature of 100 ° C. or higher, but in that case, a pressure device is required so that moisture does not evaporate excessively. Even if the temperature of the hydrothermal treatment is a low temperature of less than 60 ° C., it is possible to obtain the silica-based material of the present embodiment, but the treatment time tends to be long. Further, as is clear from the above, hydrothermal treatment at a temperature equal to or higher than the boiling point of the solution under pressure is advantageous in that the effect is manifested in a short time. However, from the viewpoint of ease of operation, it is preferable to perform hydrothermal treatment at a higher temperature, usually in the range below the boiling point. The hydrothermal treatment time varies depending on conditions such as the type of metal constituting the solid, the amount of metal, the metal composition ratio, and the treatment temperature, but preferably 1 minute to 5 hours, more preferably 5 minutes to 3 hours, and even more preferably. Within 5 minutes to 1 hour.
水熱処理によって細孔分布が狭くなる理由については定かではなく、詳細な検討は不十分であるが、現在のところ、本発明者らはその理由を下記のとおりに推測している。すなわち、シリカを含有する上述のような組成物に成形、乾燥、焼成等を施すことによって、組成物中の粒子間の架橋反応が進行し、まずは2〜10nmの細孔分布を有する構造体(固形物)が形成される。乾燥する工程や焼成する工程においては、ガス雰囲気下での加熱によるゲル間の脱水反応、架橋反応が進むが、これらの反応は固相反応であるから、得られたシリカ系材料は必ずしも均一な細孔分布にはならない。ところが、固形物にさらに水熱処理を施すことによって、固形物の加水分解と再架橋反応とによる反応が進行し、構造の組み替えが起こると推測される。また、得られる細孔容積が粒子の最密充填による空隙率に近いことも参酌すると、水熱処理による水熱反応によって熱力学的に安定な充填構造に変化し、この結果、細孔径3〜5nmの狭い範囲に細孔分布を有するシリカ系材料が得られるものと推測される。 The reason why the pore distribution is narrowed by hydrothermal treatment is not clear, and detailed studies are insufficient. At present, the present inventors presume the reason as follows. That is, by subjecting the above-described composition containing silica to molding, drying, firing, and the like, a crosslinking reaction between particles in the composition proceeds, and first a structure having a pore distribution of 2 to 10 nm ( Solids) are formed. In the drying process and the baking process, dehydration reaction and cross-linking reaction between gels by heating in a gas atmosphere proceed, but since these reactions are solid phase reactions, the obtained silica-based material is not necessarily uniform. There is no pore distribution. However, it is speculated that by subjecting the solid matter to further hydrothermal treatment, the reaction by the hydrolysis and re-crosslinking reaction of the solid matter proceeds and the rearrangement of the structure occurs. In addition, taking into account that the obtained pore volume is close to the porosity due to the close-packing of particles, the hydrothermal reaction by hydrothermal treatment changes to a thermodynamically stable packed structure, resulting in a pore diameter of 3 to 5 nm. It is presumed that a silica-based material having a pore distribution in a narrow range is obtained.
次に、本実施形態のシリカ系材料の好ましい他の製造方法について説明する。この製造方法は、シリカと、アルミニウム化合物と、アルカリ金属元素、アルカリ土類金属元素及び希土類元素からなる群より選択される少なくとも1種の塩基性元素の化合物と、を含有する組成物又はその組成物の乾燥物を焼成して固形物を得る工程(第1の工程)と、上記固形物と、鉄、コバルト、ニッケル及び亜鉛からなる群より選択される少なくとも1種の第4周期元素を含む可溶性金属塩の酸性水溶液との混合物を中和して上記固形物に第4周期元素を析出させる工程(第2の工程)と、第4周期元素を析出した上記固形物を水熱処理する工程(第3の工程)と、その水熱処理する工程を経た固形物を加熱処理する工程(第4の工程)とを有するものである。 Next, another preferable method for producing the silica-based material of the present embodiment will be described. This production method comprises a composition containing silica, an aluminum compound, and a compound of at least one basic element selected from the group consisting of alkali metal elements, alkaline earth metal elements, and rare earth elements, or a composition thereof A step (first step) of baking a dried product to obtain a solid, and the solid, and at least one fourth periodic element selected from the group consisting of iron, cobalt, nickel and zinc A step of neutralizing a mixture of the soluble metal salt with an acidic aqueous solution and precipitating a fourth periodic element on the solid (second step); and a step of hydrothermally treating the solid on which the fourth periodic element is precipitated ( (3rd process) and the process (4th process) which heat-processes the solid substance which passed through the process of hydrothermally treating.
第1の工程では、シリカ、アルミニウム化合物及び上記塩基性元素の化合物をさらに含むスラリーを調合し、乾燥した後、焼成して固形物を得る。スラリーは、第4周期元素の化合物を含まないこと以外は、上述の実施形態と同様の方法により調合すればよい。また、焼成温度は、上述の実施形態における焼成温度と同様であればよい。 In the first step, a slurry further containing silica, an aluminum compound and a compound of the basic element is prepared, dried, and then fired to obtain a solid. What is necessary is just to mix | blend a slurry by the method similar to the above-mentioned embodiment except not containing the compound of a 4th period element. Moreover, the firing temperature should just be the same as the firing temperature in the above-mentioned embodiment.
次いで、第2の工程では、第1の工程で得られた固形物と、上記第4周期元素を含む酸性水溶液との混合物を中和することによって、固形物に第4周期元素を含む成分を析出させる。この際、酸性水溶液と混合する固形物は、それを水に分散させた水スラリーの状態であってもよい。この段階で水溶液中の第4周期元素のイオンと塩基との中和反応によって、例えば第4周期元素の水酸化物の状態で、第4周期元素を含む成分が固形物に析出して固定化される。 Next, in the second step, by neutralizing the mixture of the solid matter obtained in the first step and the acidic aqueous solution containing the fourth periodic element, a component containing the fourth periodic element is added to the solid matter. Precipitate. Under the present circumstances, the solid substance mixed with acidic aqueous solution may be in the state of the water slurry which disperse | distributed it to water. At this stage, due to the neutralization reaction between the ions of the fourth periodic element in the aqueous solution and the base, for example, in the state of the hydroxide of the fourth periodic element, the component containing the fourth periodic element precipitates on the solid and is immobilized. Is done.
第2の工程で中和する際に用いられる塩基としては、例えば、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウム、炭酸カリウム、アンモニアが挙げられる。また、固形物又はその固形物を含む水スラリーにアルカリ金属元素(Li、Na、K、Rb、Cs)、アルカリ土類金属元素(Be、Mg、Ca、Sr、Ba)及び希土類元素(La、Ce、Pr)からなる群より選択される1種又は2種以上の塩基性元素を含む成分が含まれていてもよい。そのような塩基性元素を含む成分としては、例えば、水酸化カリウム、水酸化ルビジウム、酸化マグネシウム、酸化ストロンチウム、酸化ランタン、酸化セリウムが挙げられる。 Examples of the base used when neutralizing in the second step include sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, and ammonia. Further, an alkali metal element (Li, Na, K, Rb, Cs), an alkaline earth metal element (Be, Mg, Ca, Sr, Ba) and a rare earth element (La, A component containing one or more basic elements selected from the group consisting of Ce and Pr) may be included. Examples of the component containing such a basic element include potassium hydroxide, rubidium hydroxide, magnesium oxide, strontium oxide, lanthanum oxide, and cerium oxide.
第2の工程においては、例えば、第4周期元素を含む可溶性金属塩の酸性水溶液と固形物とを混合して攪拌しながら塩基で中和して、固形物上に第4周期元素の成分を沈澱により析出させる。第4周期元素の成分を析出させる際、第4周期元素を含む酸性水溶液の濃度、塩基、水溶液のpH、温度等の条件を適宜選択すればよい。
上記酸性水溶液における第4周期元素の濃度(第4周期元素が2種以上含まれる場合は、各々の第4周期元素の濃度)は、好ましくは0.0001〜1.0mol/L、より好ましくは0.001〜0.5mol/L、更に好ましくは0.005〜0.2mol/Lの範囲である。
In the second step, for example, an acidic aqueous solution of a soluble metal salt containing a fourth periodic element and a solid are mixed and neutralized with a base while stirring, and the components of the fourth periodic element are then mixed on the solid. Precipitate by precipitation. When precipitating the component of the fourth periodic element, conditions such as the concentration of the acidic aqueous solution containing the fourth periodic element, the base, the pH of the aqueous solution, and the temperature may be selected as appropriate.
The concentration of the fourth periodic element in the acidic aqueous solution (when two or more fourth periodic elements are contained, the concentration of each fourth periodic element) is preferably 0.0001 to 1.0 mol / L, more preferably The range is 0.001 to 0.5 mol / L, more preferably 0.005 to 0.2 mol / L.
塩基で中和する際、水溶液のpHが好ましくは5〜10、より好ましくは6〜8の範囲内になるように塩基の量を調整すればよい。その水溶液の温度は、好ましくは0〜100℃、より好ましくは30〜90℃、さらに好ましくは60〜90℃である。 When neutralizing with a base, the amount of the base may be adjusted so that the pH of the aqueous solution is preferably in the range of 5 to 10, more preferably 6 to 8. The temperature of the aqueous solution is preferably 0 to 100 ° C, more preferably 30 to 90 ° C, still more preferably 60 to 90 ° C.
第4周期元素を含む成分を析出させる際に要する時間は、アルミナ、第4周期元素及び塩基性元素の含有量や温度等の条件により異なるが、好ましくは1分間〜5時間、より好ましくは5分間〜3時間、更に好ましくは5分間〜1時間の範囲である。 The time required for precipitating the component containing the fourth periodic element varies depending on conditions such as the content of alumina, the fourth periodic element and the basic element, and the temperature, but preferably 1 minute to 5 hours, more preferably 5 The range is from minutes to 3 hours, more preferably from 5 minutes to 1 hour.
次に、第3の工程では、第4周期元素を含む成分が析出した固形物を水熱処理して混合物を得る。固形物を水熱処理することによって、シリカゲルの加水分解と再架橋反応とが進行し、構造の組み替えが起こると同時に第4周期元素の化合物の複合化が進行する。 Next, in a 3rd process, the solid substance in which the component containing a 4th period element precipitated is hydrothermally processed, and a mixture is obtained. By subjecting the solid to hydrothermal treatment, the hydrolysis and re-crosslinking reaction of the silica gel proceed, and the rearrangement of the structure occurs, and at the same time, the compound of the fourth periodic element proceeds.
水熱処理は、上記実施形態におけるものと同様であってもよく、第2の工程で用いた中和液をそのまま加熱して水熱処理を施してもよい。水熱処理は好ましくは60℃以上の温度範囲で、1〜48時間実施される。60℃未満の低い温度でも水熱処理することは可能であるが、処理時間が長くなる傾向にある。操作性、処理時間等の観点から、水熱処理は、60〜90℃で行うことが好ましい。 The hydrothermal treatment may be the same as that in the above embodiment, and the neutralization liquid used in the second step may be heated as it is to perform the hydrothermal treatment. The hydrothermal treatment is preferably carried out at a temperature range of 60 ° C. or higher for 1 to 48 hours. Hydrothermal treatment is possible even at a low temperature of less than 60 ° C., but the treatment time tends to be longer. From the viewpoint of operability, treatment time, etc., the hydrothermal treatment is preferably performed at 60 to 90 ° C.
さらに、第3の工程で得られた混合物に含まれる固形物を必要に応じて水洗、乾燥した後、第4の工程で、加熱処理する。こうして本実施形態のシリカ系材料を得ることができる。
第4の工程における固形物の加熱処理温度は、好ましくは40〜900℃、より好ましくは80〜800℃、更に好ましくは200〜700℃、特に好ましくは300〜600℃である。
Furthermore, after the solid contained in the mixture obtained in the third step is washed with water and dried as necessary, heat treatment is performed in the fourth step. Thus, the silica-based material of this embodiment can be obtained.
The heat treatment temperature of the solid in the fourth step is preferably 40 to 900 ° C, more preferably 80 to 800 ° C, still more preferably 200 to 700 ° C, and particularly preferably 300 to 600 ° C.
加熱処理の雰囲気は、空気中(又は大気中)、酸化性雰囲気中(酸素、オゾン、窒素酸化物、二酸化炭素、過酸化水素、次亜塩素酸、無機・有機過酸化物等)、及び不活性ガス雰囲気中(ヘリウム、アルゴン、窒素等)が挙げられる。加熱処理時間は、加熱処理温度及び固形物の量に応じて適宜選択すればよい。 Heat treatment can be performed in air (or in the air), in oxidizing atmospheres (oxygen, ozone, nitrogen oxides, carbon dioxide, hydrogen peroxide, hypochlorous acid, inorganic / organic peroxides, etc.) Examples include an active gas atmosphere (helium, argon, nitrogen, etc.). The heat treatment time may be appropriately selected according to the heat treatment temperature and the amount of solid matter.
本実施形態のシリカ系材料は、顔料、充填剤、研磨剤、化粧品基剤、農薬用担体、触媒担体、吸着材、膜構成材料等に好適に用いることができる。 The silica-based material of the present embodiment can be suitably used for pigments, fillers, abrasives, cosmetic bases, agricultural chemical carriers, catalyst carriers, adsorbents, film constituent materials, and the like.
以下に各用途について具体例を挙げて説明する。まず、顔料には、水、油、有機溶剤などに不溶性の微細な粉末で、機械的強度が強いことが求められている。本実施形態のシリカ系材料からなる球状粒子は機械的強度が大きく、さらに耐水性、耐油性、耐有機溶剤性にも優れていることから、顔料として好ましく用いられ得る。また、顔料としては小さな粒子が一般的に用いられ、平均粒子径が10μm以下であることが好ましく、より好ましくは5μm以下である。 Each application will be described below with specific examples. First, pigments are required to be fine powders that are insoluble in water, oil, organic solvents, etc. and have high mechanical strength. The spherical particles made of the silica-based material of the present embodiment have high mechanical strength and are excellent in water resistance, oil resistance, and organic solvent resistance, and therefore can be preferably used as a pigment. As the pigment, small particles are generally used, and the average particle diameter is preferably 10 μm or less, more preferably 5 μm or less.
従来、充填剤として用いられていた合成シリカ充填剤は、嵩密度が0.04〜0.2g/cm3と小さいので、輸送、取り扱いが不便であった。本実施形態のシリカ系材料は、その嵩密度を0.9〜1.2g/cm3と高くすることもできるので、従来の合成シリカ充填剤の欠点を解決している。また、このシリカ系材料は機械的強度も高いので、ポリマーの強度を増加させる補強剤として有用である。さらに、このシリカ系材料は、艶消し剤や塩化ビニルペースト、エポキシ樹脂、ポリエステル樹脂のプレポリマーの粘度調整材としても有用である。 Conventionally, the synthetic silica filler used as a filler has a bulk density as small as 0.04 to 0.2 g / cm 3 , so that it is inconvenient to transport and handle. Since the silica-based material of the present embodiment can have a bulk density as high as 0.9 to 1.2 g / cm 3 , it solves the drawbacks of the conventional synthetic silica filler. In addition, since this silica-based material has high mechanical strength, it is useful as a reinforcing agent for increasing the strength of the polymer. Further, the silica-based material is useful as a matting agent, a vinyl chloride paste, an epoxy resin, a polyester resin prepolymer viscosity modifier.
本実施形態のシリカ系材料は、後述の方法に準拠して測定される耐磨耗性が1.0質量%/15時間以下であると好ましく、これにより、研磨剤としても有用となる。研磨剤としては、形状及び嵩密度の幾何学的性質が重要である。ケイ砂、浮き石、ケイソウ土等と比較して、本実施形態のシリカ系材料は機械的強度が強く、球状で嵩密度が高いので研磨剤としての特性に優れている。また、研磨する対象によって粒径を揃える必要があるが、機械的強度が強いので、分級しても破損等が起こり難く、研磨対象に応じた粒度の球状粒子物を得ることができる。研磨剤としての平均粒子径は、研磨する対象によって様々な範囲をとることができ、一般的には1〜300μmが好ましく、用途によって最適な粒子径のものが用いられる。本実施形態のシリカ系材料は、ガラス、木材の研磨や、錆び落とし、汚れ落とし、金属、木材、象牙等の骨細工品の仕上げ、美術工芸品、セラミック、軟質金属の光沢出し等に有用な研磨剤としても用いられ得る。 The silica-based material of the present embodiment preferably has an abrasion resistance of 1.0% by mass / 15 hours or less measured in accordance with a method described later, and thereby becomes useful as an abrasive. As an abrasive, shape and bulk density geometric properties are important. Compared to silica sand, float stone, diatomaceous earth, and the like, the silica-based material of this embodiment has a high mechanical strength, a spherical shape and a high bulk density, and thus has excellent properties as an abrasive. Moreover, although it is necessary to arrange | equalize a particle size with the object to grind | polish, since mechanical strength is strong, even if it classifies, damage etc. do not occur easily and the spherical particle thing of the particle size according to grinding | polishing object can be obtained. The average particle diameter as an abrasive can take various ranges depending on the object to be polished, and is generally preferably 1 to 300 μm, and those having an optimum particle diameter are used depending on the application. The silica-based material of this embodiment is useful for polishing glass, wood, rust removal, dirt removal, finishing of bones such as metal, wood, ivory, art crafts, ceramics, soft metal glossing, etc. It can also be used as an abrasive.
化粧品基剤としては、人体に対して安定性が高いこと、使用性が良いことが望まれている。本実施形態のシリカ系材料は、耐水性、耐油性、耐有機溶剤性に優れているので人体に対する安定性が高く、球形である場合、滑らかな感触を与え、使用性も高いので化粧品基剤として有用である。 As a cosmetic base, it is desired that the cosmetic base has high stability and good usability. The silica-based material of the present embodiment is excellent in water resistance, oil resistance, and organic solvent resistance, so it has high stability to the human body, and when it is spherical, it gives a smooth feel and has high usability. Useful as.
農薬用担体として用いられる粒子は、粒度分布が斉一であると好ましく、かつ、10μm以下の粒子が分級などの処理によって取り除かれたものであると好ましい。10μm以下の粒子が取り除かれていると、粉剤の物理性、例えば、吐粉性、分散性、飛散性等、及び経時的安定性が著しく改善される。 The particles used as an agrochemical carrier preferably have a uniform particle size distribution, and preferably have particles of 10 μm or less removed by a treatment such as classification. When particles of 10 μm or less are removed, the physical properties of the powder, such as powdering properties, dispersibility, scattering properties, and stability over time, are remarkably improved.
本実施形態のシリカ系材料は、細孔径を3〜5nmの範囲に制御することが可能であり、細孔分布が狭いことから、インクジェットプリンター用紙のインク吸収材等としても有効に用いられる。また、本実施形態のシリカ系材料は、細孔容積が小さく、嵩密度が高いことから、従来の合成シリカ充填剤の有していた欠点が解消され、機械的強度も高いことから、ポリマーの強度を増加させる補強剤として有用である。さらに、本実施形態のシリカ系材料は、艶消し剤や塩化ビニルペースト、エポキシ樹脂、ポリエステル樹脂のプレポリマー粘度調整材としても有用である。 The silica-based material of the present embodiment can control the pore diameter in the range of 3 to 5 nm and has a narrow pore distribution, so that it is effectively used as an ink absorbing material for inkjet printer paper. In addition, since the silica-based material of the present embodiment has a small pore volume and a high bulk density, the disadvantages of the conventional synthetic silica filler are eliminated, and the mechanical strength is also high. Useful as a reinforcing agent to increase strength. Furthermore, the silica-based material of the present embodiment is also useful as a matting agent, vinyl chloride paste, epoxy resin, polyester resin prepolymer viscosity modifier.
シリカ系材料には、様々な金属イオンを担持することも可能であり、触媒担体として用いることができる。触媒担体として用いる場合、このシリカ系材料に触媒活性成分を担持させるが、その触媒活性成分は、対象になる反応により適宜選定される。活性成分として担持する金属成分としては、ルテニウム、ロジウム、パラジウム、銀、レニウム、オスミウム、イリジウム、白金、金からなる群より選択される少なくとも1種の貴金属成分であることが好ましい。貴金属成分の中でも、より好ましいのはルテニウム、パラジウム、白金、金からなる群より選択される少なくとも1種である。これらの貴金属成分は1種を単独で又は2種以上を組み合わせて用いられる。貴金属成分の化学状態は、金属単体、酸化物、水酸化物、2種以上の貴金属元素を含む複合化合物、又はこれらの混合物のいずれでもよいが、好ましい化学状態は金属単体又は金属酸化物である。 The silica-based material can also support various metal ions and can be used as a catalyst carrier. When used as a catalyst carrier, a catalytically active component is supported on this silica-based material, and the catalytically active component is appropriately selected depending on the target reaction. The metal component supported as the active component is preferably at least one noble metal component selected from the group consisting of ruthenium, rhodium, palladium, silver, rhenium, osmium, iridium, platinum, and gold. Among the noble metal components, at least one selected from the group consisting of ruthenium, palladium, platinum, and gold is more preferable. These noble metal components are used alone or in combination of two or more. The chemical state of the noble metal component may be any of a simple metal, an oxide, a hydroxide, a composite compound containing two or more kinds of noble metal elements, or a mixture thereof, but a preferable chemical state is a simple metal or a metal oxide. .
貴金属粒子は、担体に高分散の状態で担持されているのが好ましい。具体的には、貴金属粒子は、粒子が担体との積層方向に互いに重ならないような状態で担持されていると好ましく、微粒子状(すなわち、粒子同士が接していない状態)又は薄膜状(すなわち、粒子同士が互いに接しているが、担体との積層方向に重なっていない状態)で分散して担持されているのがより好ましい。貴金属粒子の平均粒子径は、好ましくは2〜10nm、より好ましくは2〜8nm、さらに好ましくは2〜6nmである。 The noble metal particles are preferably supported on the carrier in a highly dispersed state. Specifically, the noble metal particles are preferably supported in a state in which the particles do not overlap each other in the stacking direction with the carrier, and are in the form of fine particles (that is, the particles are not in contact with each other) or in the form of a thin film (that is, It is more preferable that the particles are in contact with each other but are dispersed and supported in a state where the particles do not overlap in the stacking direction with the carrier. The average particle diameter of the noble metal particles is preferably 2 to 10 nm, more preferably 2 to 8 nm, and further preferably 2 to 6 nm.
貴金属粒子の平均粒子径が上記範囲内にあると、特定の活性種構造が形成され、反応活性が向上する傾向にある。ここで、本実施形態における「平均粒子径」は、透過型電子顕微鏡(TEM)により測定された数平均粒子径を意味する。具体的には、透過型電子顕微鏡で観察される画像において、黒いコントラストの部分が複合粒子であり、その画像内での各粒子の直径を全て測定してその数平均として算出される。 When the average particle diameter of the noble metal particles is within the above range, a specific active species structure is formed and the reaction activity tends to be improved. Here, the “average particle diameter” in the present embodiment means the number average particle diameter measured by a transmission electron microscope (TEM). Specifically, in an image observed with a transmission electron microscope, a black contrast portion is a composite particle, and all the diameters of each particle in the image are measured and calculated as the number average.
貴金属担持物は、貴金属成分の他に第2成分元素を含有してもよい。第2成分元素としては、周期律表第4周期、第5周期及び第6周期の4〜16族元素からなる群より選択される少なくとも1種の金属が挙げられる。第2成分元素の具体例としては、チタン、バナジウム、クロム、マンガン、鉄、コバルト、ニッケル、銅、亜鉛、ガリウム、ジルコニウム、ニオブ、モリブデン、カドミウム、インジウム、スズ、アンチモン、テルル、ハフニウム、タングステン、イリジウム、水銀、タリウム、鉛、ビスマス等が挙げられる。更に、第2成分元素として、アルカリ金属、アルカリ土類金属及び希土類金属を含有してもよい。 The noble metal carrier may contain a second component element in addition to the noble metal component. Examples of the second component element include at least one metal selected from the group consisting of Group 4 to 16 elements of the 4th, 5th, and 6th periods of the periodic table. Specific examples of the second component element include titanium, vanadium, chromium, manganese, iron, cobalt, nickel, copper, zinc, gallium, zirconium, niobium, molybdenum, cadmium, indium, tin, antimony, tellurium, hafnium, tungsten, Examples include iridium, mercury, thallium, lead, and bismuth. Furthermore, you may contain an alkali metal, alkaline-earth metal, and rare earth metal as a 2nd component element.
これらの金属元素は1種を単独で又は2種以上を組み合わせて用いられる。これらの金属元素の化学状態は、金属単体、酸化物、水酸化物、2種以上の金属元素を含む複合物、又はこれらの混合物のいずれでもよいが、好ましい化学状態としては金属単体又は金属酸化物である。 These metal elements are used alone or in combination of two or more. The chemical state of these metal elements may be any of simple metals, oxides, hydroxides, composites containing two or more metal elements, or a mixture thereof. Preferred chemical states include simple metals or metal oxides. It is a thing.
各貴金属成分の担持量は特に限定されない。ルテニウム、ロジウム、パラジウム、銀、レニウム、オスミウム、イリジウム、白金、金からなる群より選択される少なくとも1種の貴金属成分が担持される場合のそれらの担持量は、担体100質量%に対して、合計で好ましく0.1〜20質量%、より好ましくは1〜10質量%である。貴金属成分は貴金属の単体でもよいし、貴金属元素の化合物(例えば、酸化物、水酸化物)でもよい。 The amount of each noble metal component supported is not particularly limited. In the case where at least one noble metal component selected from the group consisting of ruthenium, rhodium, palladium, silver, rhenium, osmium, iridium, platinum, and gold is supported, their supported amount is based on 100% by mass of the carrier, The total is preferably 0.1 to 20% by mass, more preferably 1 to 10% by mass. The noble metal component may be a single noble metal or a compound of a noble metal element (for example, an oxide or a hydroxide).
周期律表第4周期、第5周期及び第6周期の4〜16族元素からなる群より選択される少なくとも1種の金属元素及び/又はその金属元素の化合物が担持される場合のそれらの担持量は、貴金属担持物の質量あたり、合計で好ましくは0.01〜20質量%、より好ましくは0.05〜10質量%であり、アルカリ金属、アルカリ土類金属、希土類金属が担持される場合それらの担持量は、貴金属担持物の質量あたり、合計で好ましくは0.5〜30質量%、より好ましくは1〜15質量%である。 Supporting at least one metal element selected from the group consisting of Group 4 to 16 elements of the 4th period, 5th period and 6th period of the periodic table and / or a compound of the metal element is supported The total amount is preferably 0.01 to 20% by mass, more preferably 0.05 to 10% by mass, based on the mass of the noble metal support, and when alkali metal, alkaline earth metal, or rare earth metal is supported. The total amount thereof is preferably 0.5 to 30% by mass, more preferably 1 to 15% by mass, based on the mass of the noble metal support.
本実施形態の貴金属担持物の比表面積は、反応活性の向上及び活性成分の離脱し難さの観点から、BET窒素吸着法による測定で、好ましくは20〜500m2/gであり、より好ましくは50〜400m2/g、さらに好ましくは100〜350m2/gの範囲である。 The specific surface area of the noble metal support of the present embodiment is preferably 20 to 500 m 2 / g, more preferably, as measured by the BET nitrogen adsorption method, from the viewpoint of improving reaction activity and difficulty in detaching the active component. The range is 50 to 400 m 2 / g, more preferably 100 to 350 m 2 / g.
本実施形態の貴金属担持物の細孔構造は、貴金属成分の担持特性、剥離等を含めた長期安定性、触媒として用いた場合の反応特性の観点から極めて重要な物性の一つであり、細孔径はこれらの特性を発現するための指標となる物性値である。その細孔径が3nmよりも小さいと、担持貴金属成分の剥離性状は良好となる傾向にはあるが、触媒として液相反応等で用いる場合に、反応基質の細孔内拡散抵抗が大きくなり、その拡散過程が律速となりやすく反応活性が低下する傾向にある。したがって、細孔径は3nm以上であるのが好ましい。一方、担持物の割れ難さ、担持した貴金属粒子の剥離し難さの観点から、細孔径は50nm以下であるのが好ましい。したがって、貴金属担持物の細孔径は、好ましくは3nm〜50nmであり、より好ましくは3nm〜30nm、さらに好ましくは3nm〜10nmである。細孔容積は、担持特性及び反応特性の観点から、0.1〜1.0mL/gの範囲が好ましく、より好ましくは0.1〜0.5mL/g、さらに好ましくは0.1〜0.3mL/gの範囲である。本実施形態の貴金属担持物は、細孔径及び細孔容積が共に上記範囲を満たすものが好ましい。 The pore structure of the noble metal support of the present embodiment is one of the extremely important physical properties from the viewpoint of the support characteristics of the noble metal component, long-term stability including peeling, and reaction characteristics when used as a catalyst. The pore diameter is a physical property value that serves as an index for developing these characteristics. If the pore diameter is smaller than 3 nm, the release property of the supported noble metal component tends to be good, but when used as a catalyst in a liquid phase reaction or the like, the diffusion resistance in the pores of the reaction substrate increases, The diffusion process tends to be rate limiting and the reaction activity tends to decrease. Therefore, the pore diameter is preferably 3 nm or more. On the other hand, the pore diameter is preferably 50 nm or less from the viewpoint of the difficulty of cracking the supported material and the difficulty of peeling the supported noble metal particles. Therefore, the pore diameter of the noble metal support is preferably 3 nm to 50 nm, more preferably 3 nm to 30 nm, and still more preferably 3 nm to 10 nm. The pore volume is preferably in the range of 0.1 to 1.0 mL / g, more preferably 0.1 to 0.5 mL / g, and still more preferably 0.1 to 0. The range is 3 mL / g. The noble metal support of the present embodiment preferably has a pore diameter and a pore volume that satisfy the above ranges.
貴金属成分をシリカ系材料に担持させる方法としては、上記のような担持物が得られる限り特に限定はされず、一般的に用いられる金属担持物の製法、例えば含浸法(吸着法、ポアフィリング法、蒸発乾固法、スプレー法)、沈殿法(共沈法、沈着法、混錬法)、イオン交換法、気相蒸着法等を適用することができる。貴金属以外の各金属成分を貴金属担持物の調製時に添加してもよいが、貴金属担持物を触媒として用いる場合、その触媒を用いた反応系に添加することも可能である。
貴金属成分の他に第2成分元素を含有する場合、第2成分元素は貴金属担持物の製造や反応の際に貴金属担持物中に含有させてもよいし、あらかじめ担体に含有させておいてもよい。なお、第2成分元素が貴金属担持物中でどのような構造をとるかは特に制限されず、貴金属粒子と合金又は金属間化合物を形成していてもよいし、貴金属粒子とは別に担体に担持されていてもよい。アルカリ金属化合物、アルカリ土類金属化合物についても、貴金属担持物の調製時に予め共存させてもよく、貴金属担持物の調製時又は反応系に添加することもできる。触媒調製に用いられる金属原料としては、上記金属の無機化合物、有機金属化合物等の化合物が用いられるが、好ましくは金属ハロゲン化物、金属酸化物、金属水酸化物、金属硝酸塩、金属硫酸塩、金属酢酸塩、金属リン酸塩、金属カルボニル、金属アセチルアセトナト、金属ポルフィリン類、金属フタロシアニン類である。
The method for supporting the noble metal component on the silica-based material is not particularly limited as long as the above-mentioned support can be obtained, and a generally used metal support manufacturing method such as an impregnation method (adsorption method, pore filling method). , Evaporating and drying methods, spraying methods), precipitation methods (coprecipitation methods, deposition methods, kneading methods), ion exchange methods, vapor deposition methods, and the like can be applied. Each metal component other than the noble metal may be added at the time of preparing the noble metal support, but when the noble metal support is used as a catalyst, it can be added to a reaction system using the catalyst.
When the second component element is contained in addition to the noble metal component, the second component element may be contained in the noble metal carrier during the production or reaction of the noble metal carrier, or may be previously contained in the support. Good. Note that the structure of the second component element in the noble metal support is not particularly limited, and may form an alloy or intermetallic compound with the noble metal particles, or may be supported on the carrier separately from the noble metal particles. May be. Alkali metal compounds and alkaline earth metal compounds may also be previously present at the time of preparation of the noble metal support, or can be added to the reaction system during preparation of the noble metal support. As the metal raw material used for the catalyst preparation, compounds such as the above-mentioned metal inorganic compounds and organometallic compounds are used, but preferably metal halide, metal oxide, metal hydroxide, metal nitrate, metal sulfate, metal Acetates, metal phosphates, metal carbonyls, metal acetylacetonates, metal porphyrins, metal phthalocyanines.
[貴金属成分の他に第2成分元素を含有する貴金属担持物の調製方法]
貴金属担持物のうち、貴金属成分の他に第2成分元素を含有する場合の調製方法について、沈澱法を例にとって説明する。例えば、第1の工程として、第2成分及び貴金属が含まれる可溶性金属塩の酸性水溶液を中和することによってシリカ系材料に第2成分及び貴金属成分を析出させて貴金属担持物の前駆体を得る。この段階で水溶液中の第2成分及び貴金属イオンが塩基との中和反応によって第2成分及び貴金属成分(例えば水酸化物)がシリカ系材料に析出して固定化される。次いで、第2の工程として、前記第1の工程で得られた貴金属担持物の前駆体を必要に応じて水洗、乾燥した後、熱処理することによって貴金属担持物を得ることができる。
[Preparation method of a noble metal support containing a second component element in addition to a noble metal component]
A preparation method in the case of containing a second component element in addition to the noble metal component in the noble metal support will be described by taking a precipitation method as an example. For example, as a first step, the second component and the noble metal component are precipitated on the silica-based material by neutralizing an acidic aqueous solution of a soluble metal salt containing the second component and the noble metal, thereby obtaining a precursor of the noble metal support. . At this stage, the second component and the noble metal ion in the aqueous solution are precipitated and immobilized on the silica-based material by the neutralization reaction of the second component and the noble metal ion with the base. Next, as a second step, the noble metal support can be obtained by subjecting the precursor of the noble metal support obtained in the first step to water washing and drying as necessary, followed by heat treatment.
貴金属担持物の調製に用いられる第2成分元素が含まれる可溶性金属塩としては、第2成分元素の硝酸塩、酢酸塩及び塩化物が挙げられる。また、貴金属成分が含まれる可溶性金属塩の例としては、貴金属としてパラジウムを選択する場合は、塩化パラジウム及び酢酸パラジウムが、ルテニウムの場合は、塩化ルテニウム及び硝酸ルテニウムが、金の場合は、塩化金酸、塩化金ナトリウム、ジシアノ金酸カリウム、ジエチルアミン金三塩化物及びシアン化金が、銀の場合は、塩化銀及び硝酸銀が挙げられる。 Examples of the soluble metal salt containing the second component element used for the preparation of the noble metal support include nitrates, acetates and chlorides of the second component element. Examples of soluble metal salts containing a noble metal component include palladium chloride and palladium acetate when selecting palladium as the noble metal, ruthenium chloride and ruthenium nitrate when ruthenium, and gold chloride when gold. When acid, sodium gold chloride, potassium dicyanoaurate, diethylamine gold trichloride and gold cyanide are silver, silver chloride and silver nitrate can be mentioned.
貴金属担持物の調製に用いられる塩基としては、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウム、炭酸カリウム、アンモニア等が用いられる。また、担体にアルカリ金属(Li,Na,K,Rb,Cs)、アルカリ土類金属(Be,Mg,Ca,Sr,Ba)及び希土類金属(La,Ce,Pr)から選ばれる単独もしくは複数種の塩基性金属成分が含まれていてもよい。 Examples of the base used for preparing the noble metal support include sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, ammonia and the like. In addition, the support may be one or more selected from alkali metals (Li, Na, K, Rb, Cs), alkaline earth metals (Be, Mg, Ca, Sr, Ba) and rare earth metals (La, Ce, Pr). The basic metal component may be contained.
第1の工程においては、第2成分元素及び貴金属が含まれる可溶性金属塩の酸性水溶液とシリカ系材料を混合して攪拌しながら塩基で中和し、シリカ系材料上に第2成分元素及び貴金属成分の沈澱を析出させる。第2成分元素及び貴金属成分を析出させる際、第2成分元素及び貴金属成分を含む水溶液の濃度、塩基、水溶液のpH、温度等の条件を適宜選択すればよい。 In the first step, an acidic aqueous solution of a soluble metal salt containing a second component element and a noble metal and a silica-based material are mixed and neutralized with a base while stirring, and the second component element and the noble metal are mixed on the silica-based material. Precipitate the components. When precipitating the second component element and the noble metal component, conditions such as the concentration of the aqueous solution containing the second component element and the noble metal component, the base, the pH of the aqueous solution, and the temperature may be selected as appropriate.
第2成分元素及び貴金属を含む水溶液の各々の濃度は、通常0.0001〜1.0mol/L、好ましくは0.001〜0.5mol/L、より好ましくは0.005〜0.2mol/Lの範囲である。水溶液中の第2成分元素及び貴金属の比率は、第2成分元素/貴金属原子比で0.1〜10の範囲が好ましく、より好ましくは0.2〜5.0、さらに好ましくは0.5〜3.0である。 The concentration of each of the aqueous solutions containing the second component element and the noble metal is usually 0.0001 to 1.0 mol / L, preferably 0.001 to 0.5 mol / L, more preferably 0.005 to 0.2 mol / L. Range. The ratio of the second component element and the noble metal in the aqueous solution is preferably in the range of 0.1 to 10 in terms of the second component element / noble metal atomic ratio, more preferably 0.2 to 5.0, still more preferably 0.5 to 3.0.
水溶液のpHは、通常5〜10、好ましくは6〜8の範囲内になるように前記塩基で調整すればよい。水溶液の温度は、通常0〜100℃の範囲、好ましくは30〜90℃、より好ましくは60〜90℃である。 What is necessary is just to adjust pH of aqueous solution with the said base so that it may become normally in the range of 5-10, preferably 6-8. The temperature of the aqueous solution is usually in the range of 0 to 100 ° C, preferably 30 to 90 ° C, more preferably 60 to 90 ° C.
第2成分元素及び貴金属成分を析出させる際の時間は特に限定されるものでなく、シリカ系材料種、第2成分元素及び貴金属の担持量、比率等の条件により異なるが、通常1分〜5時間、好ましくは5分〜3時間、より好ましくは5分〜1時間である。 The time for precipitating the second component element and the noble metal component is not particularly limited and varies depending on conditions such as the silica-based material type, the loading amount of the second component element and the noble metal, and the ratio, but usually from 1 minute to 5 minutes Time, preferably 5 minutes to 3 hours, more preferably 5 minutes to 1 hour.
第2工程における貴金属担持物の前駆体の熱処理温度は、通常40〜900℃、好ましくは80〜800℃、より好ましくは200〜700℃、さらに好ましくは300〜600℃である。 The heat treatment temperature of the precursor of the noble metal support in the second step is usually 40 to 900 ° C, preferably 80 to 800 ° C, more preferably 200 to 700 ° C, and further preferably 300 to 600 ° C.
熱処理の雰囲気は、空気中(又は大気中)、酸化性雰囲気中(酸素、オゾン、窒素酸化物、二酸化炭素、過酸化水素、次亜塩素酸、無機・有機過酸化物等)又は不活性ガス雰囲気中(ヘリウム、アルゴン、窒素等)で行われる。熱処理時間は、熱処理温度及び貴金属担持物の前駆体の量に応じて適宜選択すればよい。 The atmosphere for the heat treatment is in the air (or in the air), in an oxidizing atmosphere (oxygen, ozone, nitrogen oxide, carbon dioxide, hydrogen peroxide, hypochlorous acid, inorganic / organic peroxide, etc.) or inert gas Performed in an atmosphere (helium, argon, nitrogen, etc.). The heat treatment time may be appropriately selected according to the heat treatment temperature and the amount of the noble metal support precursor.
上述した第2の工程の後、必要に応じて還元性雰囲気中(水素、ヒドラジン、ホルマリン、蟻酸等)で還元処理を行うこともできる。還元処理の温度及び時間は、還元剤の種類、貴金属の種類及び貴金属担持物の量に応じて適宜選択すればよい。 After the second step described above, reduction treatment can be performed in a reducing atmosphere (hydrogen, hydrazine, formalin, formic acid, etc.) as necessary. What is necessary is just to select suitably the temperature and time of a reduction process according to the kind of reducing agent, the kind of noble metal, and the quantity of a noble metal carrier.
上記熱処理又は還元処理の後、必要に応じて空気中(又は大気中)又は酸化性雰囲気中(酸素、オゾン、窒素酸化物、二酸化炭素、過酸化水素、次亜塩素酸、無機・有機過酸化物等)で酸化処理することもできる。その場合の温度及び時間は、酸化剤の種類、貴金属の種類及び貴金属担持物の量に応じて適宜選択される。 After the above heat treatment or reduction treatment, in the air (or in the air) or in an oxidizing atmosphere (oxygen, ozone, nitrogen oxide, carbon dioxide, hydrogen peroxide, hypochlorous acid, inorganic / organic peroxidation as necessary Or the like. The temperature and time in that case are appropriately selected according to the type of oxidizing agent, the type of noble metal, and the amount of the noble metal support.
[貴金属担持物を触媒として用いた化合物の製造方法]
本実施形態の貴金属担持物は、広く化学合成用の触媒として用いられる。この貴金属担持物は、例えば、アルカンの酸化、アルコールの酸化、アルデヒドの酸化、カルボニルの酸化、アルケンの酸化、アルケンのエポキシ化、アルケンの酸化的付加、アルデヒドとアルコールとの酸化的エステル化、アルコールの酸化的エステル化、グリコールとアルコールとの酸化的エステル化、アルケンの水素化、アルキンの水素化、フェノール類の水素化、α,β不飽和ケトンの選択水素化反応、ニトロ、オレフィン、カルボニル、芳香族環等の水添反応、アミノ化、水素及び酸素からの直接過酸化水素合成、一酸化炭素の酸化、水性ガスシフト反応等の化学合成触媒、あるいはNOxの還元触媒、光触媒として用いられ得る。
[Method for producing compound using noble metal support as catalyst]
The noble metal support of the present embodiment is widely used as a catalyst for chemical synthesis. This noble metal support is, for example, alkane oxidation, alcohol oxidation, aldehyde oxidation, carbonyl oxidation, alkene oxidation, alkene epoxidation, alkene oxidative addition, aldehyde and alcohol oxidative esterification, alcohol Oxidative esterification of glycol, oxidative esterification of glycol with alcohol, alkene hydrogenation, alkyne hydrogenation, phenol hydrogenation, selective hydrogenation reaction of α, β unsaturated ketone, nitro, olefin, carbonyl, It can be used as a hydrogenation reaction of aromatic rings, amination, synthesis of hydrogen peroxide directly from hydrogen and oxygen, oxidation of carbon monoxide, water gas shift reaction, or other chemical synthesis catalyst, NOx reduction catalyst, or photocatalyst.
以下に、本実施形態の貴金属担持物を触媒として用いて、アルデヒド及びアルコールから酸素存在下で酸化的エステル化反応によりカルボン酸エステルを製造する方法を例に挙げて説明する。 Hereinafter, a method for producing a carboxylic acid ester by oxidative esterification reaction in the presence of oxygen from an aldehyde and an alcohol using the noble metal support of the present embodiment as a catalyst will be described as an example.
原料として用いるアルデヒドとしては、例えば、ホルムアルデヒド、アセトアルデヒド、プロピオンアルデヒド、イソブチルアルデヒド、グリオキサール等のC1−C10脂肪族飽和アルデヒド;アクロレイン、メタクロレイン、クロトンアルデヒド等のC3−C10脂肪族α,β−不飽和アルデヒド;ベンズアルデヒド、トリルアルデヒド、ベンジルアルデヒド、フタルアルデヒド等のC6−C20芳香族アルデヒド;並びにこれらアルデヒドの誘導体が挙げられる。これらのアルデヒドは1種を単独で又は2種以上の混合物として用いられる。それらのうち、アルデヒドが、アクロレイン、メタクロレイン、及びそれらの混合物からなる群より選ばれる少なくとも1種であると、本実施形態の貴金属担持物を触媒として更に有効に用いることができるので好ましい。 Examples of the aldehyde used as a raw material include C1-C10 aliphatic saturated aldehydes such as formaldehyde, acetaldehyde, propionaldehyde, isobutyraldehyde, glyoxal; C3-C10 aliphatic α, β-unsaturated such as acrolein, methacrolein, and crotonaldehyde. Examples include aldehydes; C6-C20 aromatic aldehydes such as benzaldehyde, tolylaldehyde, benzylaldehyde, and phthalaldehyde; and derivatives of these aldehydes. These aldehydes are used alone or as a mixture of two or more. Among them, it is preferable that the aldehyde is at least one selected from the group consisting of acrolein, methacrolein, and a mixture thereof because the noble metal support of the present embodiment can be used more effectively as a catalyst.
アルコールとしては、例えば、メタノール、エタノール、イソプロパノール、ブタノール、2−エチルヘキサノール、オクタノール等のC1−C10脂肪族飽和アルコール;シクロペンタノール、シクロヘキサノール等のC5−C10脂環族アルコール;エチレングリコール、プロピレングリコール、ブタンジオール等のC2−C10ジオール;アリルアルコール、メタリルアルコール等のC3−C10脂肪族不飽和アルコール;ベンジルアルコール等のC6−C20芳香族アルコール;3−アルキル−3−ヒドロキシメチルオキセタン等のヒドロキシオキセタンが挙げられる。これらのアルコールは1種を単独で又は2種以上の混合物として用いられる。それらのうち、アルコールがメタノールであると、本実施形態の貴金属担持物を触媒として更に有効に用いることができるので好ましい。 Examples of the alcohol include C1-C10 aliphatic saturated alcohols such as methanol, ethanol, isopropanol, butanol, 2-ethylhexanol and octanol; C5-C10 alicyclic alcohols such as cyclopentanol and cyclohexanol; ethylene glycol, propylene C2-C10 diols such as glycol and butanediol; C3-C10 aliphatic unsaturated alcohols such as allyl alcohol and methallyl alcohol; C6-C20 aromatic alcohols such as benzyl alcohol; 3-alkyl-3-hydroxymethyloxetane and the like And hydroxy oxetane. These alcohols are used alone or as a mixture of two or more. Among them, it is preferable that the alcohol is methanol because the noble metal support of the present embodiment can be used more effectively as a catalyst.
アルデヒドとアルコールとの量比は、特に限定されず、例えば、アルコールに対するアルデヒドの比(アルデヒド/アルコール)がモル基準で、10〜1/1000のような広い範囲であってもよいが、一般的には1/2〜1/50である。 The amount ratio of aldehyde to alcohol is not particularly limited. For example, the ratio of aldehyde to alcohol (aldehyde / alcohol) may be in a wide range such as 10 to 1/1000 on a molar basis. Is 1/2 to 1/50.
触媒の使用量は、反応原料の種類、触媒の組成や調製法、反応条件、反応形式等によって大幅に変更することができ、特に限定されない。触媒をスラリー状態で反応させる場合、触媒は、スラリー中の固形分濃度として、好ましくは1〜50質量/容量%、より好ましくは3〜30質量/容量%、さらに好ましくは10〜25質量/容量%の範囲で用いられる。 The amount of the catalyst used is not particularly limited, and can be changed greatly depending on the type of reaction raw material, the composition and preparation method of the catalyst, reaction conditions, reaction mode, and the like. When the catalyst is reacted in a slurry state, the catalyst is preferably 1 to 50 mass / volume%, more preferably 3 to 30 mass / volume%, still more preferably 10 to 25 mass / volume, as the solid content concentration in the slurry. % Range.
カルボン酸エステルの製造は、気相反応、液相反応、潅液反応等の任意の方法で、回分式又は連続式のいずれによっても実施できる。 The carboxylic acid ester can be produced by any method such as a gas phase reaction, a liquid phase reaction, and an irrigation reaction, either batchwise or continuously.
その反応は、無溶媒でも実施され得るが、反応成分(反応基質、反応生成物及び触媒)に対して不活性な溶媒、例えば、ヘキサン、デカン、ベンゼン、ジオキサンを用いても実施され得る。 The reaction can be carried out without solvent, but can also be carried out using a solvent inert to the reaction components (reaction substrate, reaction product and catalyst) such as hexane, decane, benzene, dioxane.
反応形式は、固定床式、流動床式、攪拌槽式等の従来公知の形式であればよい。例えば、液相で反応させる際には、気泡塔反応器、ドラフトチューブ型反応器、撹拌槽反応器等の任意の反応器形式を採用することができる。 The reaction format may be a conventionally known format such as a fixed bed type, a fluidized bed type, and a stirring tank type. For example, when reacting in the liquid phase, any reactor type such as a bubble column reactor, a draft tube reactor, a stirred tank reactor, etc. can be employed.
カルボン酸エステルの製造に用いる酸素は、分子状酸素、すなわち、酸素ガス自体、又は、酸素ガスを反応に不活性な希釈剤、例えば、窒素、炭酸ガス等で希釈した混合ガスの形であってもよい。酸素原料としては、操作性、経済性等の観点から、空気が好ましく用いられる。 The oxygen used in the production of the carboxylic acid ester is in the form of molecular oxygen, that is, oxygen gas itself or a mixed gas obtained by diluting the oxygen gas with a diluent inert to the reaction, such as nitrogen or carbon dioxide. Also good. As the oxygen raw material, air is preferably used from the viewpoints of operability and economy.
酸素分圧は、アルデヒド種、アルコール種等の反応原料、反応条件又は反応器形式等により変化するが、実用的には、反応器出口の酸素分圧を爆発範囲の下限以下の濃度となる範囲とし、例えば、20〜80kPaに管理することが好ましい。反応圧力については、減圧から加圧下の任意の広い圧力範囲でもよく、例えば0.05〜2MPaの範囲の反応圧力である。また、反応器から流出するガス中の酸素濃度が爆発限界を超えないように全圧を設定(例えば、酸素濃度8%)することが安全性の観点から好ましい。 The oxygen partial pressure varies depending on the reaction raw materials such as aldehyde species and alcohol species, the reaction conditions, or the reactor type, but practically, the oxygen partial pressure at the outlet of the reactor is in a range where the concentration is below the lower limit of the explosion range. For example, it is preferable to manage at 20 to 80 kPa. About reaction pressure, the arbitrary wide pressure range from pressure reduction to pressurization may be sufficient, for example, reaction pressure of the range of 0.05-2 Mpa. Further, it is preferable from the viewpoint of safety to set the total pressure (for example, oxygen concentration 8%) so that the oxygen concentration in the gas flowing out from the reactor does not exceed the explosion limit.
カルボン酸エステルの製造反応を液相等で実施する場合、反応系にアルカリ金属又はアルカリ土類金属の化合物(例えば、酸化物、水酸化物、炭酸塩、カルボン酸塩)を添加して反応系のpHを6〜9に保持することが好ましい。これらのアルカリ金属又はアルカリ土類金属の化合物は、1種を単独で又は2種以上を組み合わせて用いられる。 When the production reaction of a carboxylic acid ester is carried out in the liquid phase or the like, an alkali metal or alkaline earth metal compound (eg, oxide, hydroxide, carbonate, carboxylate) is added to the reaction system. It is preferable to maintain pH of 6-9. These alkali metal or alkaline earth metal compounds are used singly or in combination of two or more.
カルボン酸エステルを製造する際の反応温度は、200℃を超える高温でもよいが、好ましくは30〜200℃であり、より好ましくは40〜150℃、さらに好ましくは60〜120℃である。反応時間は、特に限定されるものではなく、設定した条件により異なるので一義的には決められないが、通常1〜20時間である。 Although the reaction temperature at the time of manufacturing carboxylic acid ester may be high temperature exceeding 200 degreeC, Preferably it is 30-200 degreeC, More preferably, it is 40-150 degreeC, More preferably, it is 60-120 degreeC. The reaction time is not particularly limited and is not uniquely determined because it varies depending on the set conditions, but is usually 1 to 20 hours.
次に、本実施形態の貴金属担持物を触媒として用い、水を含む液相中でアルデヒドを酸化してカルボン酸を製造する方法を例に挙げて説明する。 Next, a method for producing a carboxylic acid by oxidizing an aldehyde in a liquid phase containing water using the noble metal support of the present embodiment as a catalyst will be described as an example.
液相に含まれる水としては、特に限定されないが、例えば、軟水、精製された工業用水、イオン交換水等を挙げることができる。通常の水質を持つ水であればよいが、あまり不純物(Fe、Ca、Mg等のイオン)を多く含むものは好ましくない。カルボン酸の製造において使用するアルデヒドとしては、例えば、ホルムアルデヒド、アセトアルデヒド、プロピオンアルデヒド、イソブチルアルデヒド、グリオキサール等のC1−C10脂肪族飽和アルデヒド;アクロレイン、メタクロレイン、クロトンアルデヒド等のC3−C10脂肪族α,β−不飽和アルデヒド;ベンズアルデヒド、トリルアルデヒド、ベンジルアルデヒド、フタルアルデヒド等のC6−C20芳香族アルデヒド及びこれらのアルデヒドの誘導体が挙げられる。なかでも、メタクロレイン、アクロレインが好ましい。これらのアルデヒドは単独もしくは任意の2種以上の混合物として用いることができる。 Although it does not specifically limit as water contained in a liquid phase, For example, soft water, refined industrial water, ion-exchange water etc. can be mentioned. Water having normal water quality may be used, but water containing a large amount of impurities (ions such as Fe, Ca, and Mg) is not preferable. Examples of the aldehyde used in the production of carboxylic acid include C1-C10 aliphatic saturated aldehydes such as formaldehyde, acetaldehyde, propionaldehyde, isobutyraldehyde, glyoxal; C3-C10 aliphatic α, such as acrolein, methacrolein, and crotonaldehyde. β-unsaturated aldehydes: C6-C20 aromatic aldehydes such as benzaldehyde, tolylaldehyde, benzylaldehyde, phthalaldehyde, and derivatives of these aldehydes. Of these, methacrolein and acrolein are preferable. These aldehydes can be used alone or as a mixture of two or more kinds.
アルデヒドと水の量比に特に限定はなく、例えば、アルデヒド/水のモル比で1/10〜1/1000のような広い範囲で実施できるが、一般的には1/2〜1/100の範囲で実施される。 The amount ratio of aldehyde and water is not particularly limited. For example, the molar ratio of aldehyde / water can be carried out in a wide range such as 1/10 to 1/1000, but is generally 1/2 to 1/100. Implemented in a range.
アルデヒドと水からなる混合液相中、すなわち無溶媒の条件下でアルデヒドを酸化することも可能であるが、アルデヒドと水からなる混合液に溶媒を添加し、アルデヒド、水、溶媒からなる混合液としても差し支えない。溶媒としては、例えば、ケトン類、ニトリル類、アルコール類、有機酸エステル類、炭化水素類、有機酸類、アミド類を使用することができる。ケトン類としては、例えば、アセトン、メチルエチルケトン、メチルイソブチルケトンが挙げられる。ニトリル類としては、例えば、アセトニトリル、プロピオニトリルが挙げられる。アルコール類としては、例えば、ターシャリーブタノール、シクロヘキサノールが挙げられる。有機酸エステル類としては、例えば、酢酸エチル、プロピオン酸メチルが挙げられる。炭化水素類としては、例えば、ヘキサン、シクロヘキサン、トルエンが挙げられる。有機酸類としては、例えば、酢酸、プロピオン酸、n−酪酸、イソ酪酸、n−吉草酸、イソ吉草酸が挙げられる。アミド類としては、例えば、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド、N,N−ジメチルプロピオンアミド、ヘキサメチルホスホアミドが挙げられる。また、溶媒は1種類でも、2種類以上の混合溶媒でもよい。水と溶媒を混合する場合、その混合比は反応原料であるアルデヒドの種類、触媒の組成や調製法、反応条件、反応形式等によって大幅に変更することができ、特に限定はされないが、高選択性及び高生産性でアルデヒドからカルボン酸を製造する観点から、溶媒の量は水の質量に対して8〜65質量%が好ましく、8〜55質量%がより好ましい。アルデヒドと水からなる混合液、もしくはアルデヒド、水、溶媒からなる混合液は均一であることが好ましいが、不均一な状態で用いても差し支えない。 Although it is possible to oxidize aldehyde in a mixed liquid phase consisting of aldehyde and water, that is, under solvent-free conditions, a solvent is added to a mixed liquid consisting of aldehyde and water, and a mixed liquid consisting of aldehyde, water and solvent. It does not matter. As the solvent, for example, ketones, nitriles, alcohols, organic acid esters, hydrocarbons, organic acids, amides can be used. Examples of ketones include acetone, methyl ethyl ketone, and methyl isobutyl ketone. Examples of nitriles include acetonitrile and propionitrile. Examples of alcohols include tertiary butanol and cyclohexanol. Examples of the organic acid esters include ethyl acetate and methyl propionate. Examples of the hydrocarbons include hexane, cyclohexane, and toluene. Examples of organic acids include acetic acid, propionic acid, n-butyric acid, isobutyric acid, n-valeric acid, and isovaleric acid. Examples of amides include N, N-dimethylformamide, N, N-dimethylacetamide, N, N-dimethylpropionamide, and hexamethylphosphoamide. Further, the solvent may be one type or a mixed solvent of two or more types. When water and solvent are mixed, the mixing ratio can be changed greatly depending on the type of aldehyde that is the reaction raw material, the composition and preparation method of the catalyst, reaction conditions, reaction type, etc. From the viewpoint of producing carboxylic acids from aldehydes with high productivity and high productivity, the amount of the solvent is preferably 8 to 65% by mass, more preferably 8 to 55% by mass with respect to the mass of water. A mixed solution composed of aldehyde and water, or a mixed solution composed of aldehyde, water and solvent is preferably uniform, but may be used in a non-uniform state.
触媒の使用量については、反応原料の種類、触媒の組成や調製法、反応条件、反応形式等によって大幅に変更することができ、特に限定はされないが、触媒をスラリー状態で反応させる場合は、スラリー中の触媒濃度として、好ましくは4〜50質量/容量%、より好ましくは4〜30質量/容量%、さらに好ましくは10〜25質量/容量%の範囲内に収まるように使用する。すなわち、液体成分の体積(L)に対する触媒の質量(kg)が、好ましくは4〜50%、より好ましくは4〜30%、さらに好ましくは10〜25%の範囲内に収まるように使用する。 The amount of the catalyst used can be significantly changed depending on the type of reaction raw material, the composition and preparation method of the catalyst, reaction conditions, reaction type, etc., and is not particularly limited, but when reacting the catalyst in a slurry state, The catalyst concentration in the slurry is preferably 4 to 50 mass / volume%, more preferably 4 to 30 mass / volume%, and still more preferably 10 to 25 mass / volume%. That is, the catalyst is used such that the mass (kg) of the catalyst with respect to the volume (L) of the liquid component falls within the range of preferably 4 to 50%, more preferably 4 to 30%, and still more preferably 10 to 25%.
液相におけるカルボン酸の製造は、連続式、バッチ式のいずれの形式で行ってもよいが、生産性を考慮すると工業的には連続式が好ましい。 The production of the carboxylic acid in the liquid phase may be carried out in either a continuous type or a batch type, but in view of productivity, the continuous type is preferred industrially.
酸化のための酸素源としては、反応器に酸素ガス自体を供給してもよいし、酸素ガスを反応に不活性な希釈剤、例えば、窒素、炭酸ガス等で希釈した混合ガスを供給してもよいが、酸素源としては空気を用いるのが操作性、経済性等の面から好適である。 As an oxygen source for oxidation, oxygen gas itself may be supplied to the reactor, or a mixed gas obtained by diluting oxygen gas with a diluent inert to the reaction, for example, nitrogen, carbon dioxide gas, or the like may be supplied. However, it is preferable to use air as the oxygen source in terms of operability and economy.
好ましい酸素分圧は、アルデヒド種や溶媒種、反応条件や反応器形式等により異なるが、実用的には反応器出口の酸素分圧は、爆発範囲の下限以下の濃度となる範囲で、例えば、20〜80kPaに管理することが好ましい。反応圧力は、減圧から加圧下の任意の広い圧力範囲で実施することができるが、通常は0.05〜5MPaの圧力で実施される。安全性の観点から、反応器流出ガスの酸素濃度が爆発限界(8%)を超えないように全圧を設定することが好ましい。 The preferred oxygen partial pressure varies depending on the aldehyde species, solvent species, reaction conditions, reactor type, etc., but practically, the oxygen partial pressure at the reactor outlet is in a range where the concentration is below the lower limit of the explosion range, for example, It is preferable to manage to 20-80 kPa. The reaction pressure can be carried out in any wide pressure range from reduced pressure to increased pressure, but is usually carried out at a pressure of 0.05 to 5 MPa. From the viewpoint of safety, it is preferable to set the total pressure so that the oxygen concentration of the reactor effluent gas does not exceed the explosion limit (8%).
カルボン酸を製造する際の反応温度は30〜200℃が好ましく、40〜150℃がより好ましく、60〜120℃がさらに好ましい。反応時間は特に限定されず、通常1〜20時間である。 30-200 degreeC is preferable, the reaction temperature at the time of manufacturing carboxylic acid has more preferable 40-150 degreeC, and 60-120 degreeC is further more preferable. The reaction time is not particularly limited, and is usually 1 to 20 hours.
なお、シリカ系材料の構成元素(Si、Al、第4周期元素、塩基性元素)の含有量の決定、アルミニウム又は塩基性元素に対する第4周期元素の組成比の決定、比表面積、細孔径及び細孔容積の測定、形状観察、平均粒子径の測定、嵩密度(CBD)の測定、耐摩耗性の測定、結晶構造の解析、第4周期元素の化学状態解析、貴金属担持物の形態観察は、次の方法により実施することができる。 In addition, determination of content of constituent elements (Si, Al, fourth periodic element, basic element) of silica-based material, determination of composition ratio of fourth periodic element to aluminum or basic element, specific surface area, pore diameter and Measurement of pore volume, shape observation, measurement of average particle diameter, measurement of bulk density (CBD), measurement of wear resistance, analysis of crystal structure, chemical state analysis of fourth periodic element, morphology observation of noble metal support The following method can be used.
[シリカ系材料及び貴金属担持物の構成元素の含有量の決定]
シリカ系材料中のSi、Al、第4周期元素及び塩基性元素の濃度は、サーモフィッシャーサイエンティフィック社製のICP発光分析装置(ICP−AES、MS)である「IRIS Intrepid II XDL型」(商品名)を用いて定量される。
試料は下記のとおりに調製する。まず、シリカ系材料をテフロン(登録商標)製分解容器に秤取り、そこに硝酸及びフッ化水素を加える。得られた溶液を、マイルストーンゼネラル社製のマイクロウェーブ分解装置である「ETHOS・TC型」(商品名)にて加熱分解後、ヒーター上で蒸発乾固する。次いで、析出した残留物に硝酸及び塩酸を加えて、上記マイクロウェーブ分解装置にて加圧分解し、得られた分解液を純水で一定容量としたものを試料とする。
上記ICP−AESにて内標準法で試料の定量を行い、同時に実施した操作ブランク値を差し引いてシリカ系材料中のSi、Al、第4周期元素及び塩基性元素の含有量並びに貴金属担持物中の金属元素の含有量を求め、組成比(モル基準)、担持量を算出する。
[Determination of content of constituent elements of silica-based material and noble metal support]
The concentrations of Si, Al, the fourth periodic element and the basic element in the silica-based material are “IRIS Intrepid II XDL type” (ICP-AES, MS) manufactured by Thermo Fisher Scientific Co., Ltd. ( Product name).
Samples are prepared as follows. First, the silica-based material is weighed in a Teflon (registered trademark) decomposition vessel, and nitric acid and hydrogen fluoride are added thereto. The obtained solution is thermally decomposed with “ETHOS · TC type” (trade name), which is a microwave decomposition apparatus manufactured by Milestone General, and then evaporated to dryness on a heater. Next, nitric acid and hydrochloric acid are added to the deposited residue, and pressure decomposition is performed with the above microwave decomposition apparatus, and the obtained decomposition solution is made to have a constant volume with pure water as a sample.
Samples were quantified by the internal standard method in the above ICP-AES, and simultaneously performed blank values were subtracted from the contents of Si, Al, fourth period element and basic element in the silica-based material, and in the noble metal support. The content of the metal element is determined, and the composition ratio (molar basis) and the supported amount are calculated.
[組成比の決定]
上記「シリカ系材料及び貴金属担持物の構成元素の含有量の決定」で測定したAl、第4周期元素及び塩基性元素の含有量から、アルミニウムに対する第4周期元素の組成比(X/Al)、及び、塩基性元素に対する第4周期元素の組成比(X/B)を算出する。
[Determination of composition ratio]
The composition ratio of the fourth periodic element to aluminum (X / Al) based on the contents of Al, the fourth periodic element and the basic element measured in the above “determination of content of constituent elements of silica-based material and noble metal support” And the composition ratio (X / B) of the fourth periodic element with respect to the basic element.
[比表面積、細孔径及び細孔容積の測定]
ユアサ・アイオニクス社製のガス吸着量測定装置「オートソーブ3MP」(商品名)により、吸着ガスとして窒素を用いて、シリカ系材料及び貴金属担持物の比表面積、細孔径及び細孔容積を測定する(窒素吸着法)。比表面積はBET法、細孔径及び細孔分布はBJH法、細孔容積はP/P0、Maxでの吸着量を採用する。
[Measurement of specific surface area, pore diameter and pore volume]
Measure the specific surface area, pore diameter, and pore volume of silica-based materials and precious metal supports using nitrogen as the adsorbent gas with the “Autosorb 3MP” (trade name) gas adsorption measuring device manufactured by Yuasa Ionics. (Nitrogen adsorption method). The specific surface area adopts the BET method, the pore diameter and pore distribution adopt the BJH method, the pore volume adopts P / P0, and the adsorption amount at Max.
[形状観察]
日立製作所社製のX−650走査型電子顕微鏡装置(SEM)を用いて、シリカ系材料(担体)及び貴金属担持物(触媒)粒子を観察する。
[Shape observation]
Using an X-650 scanning electron microscope (SEM) manufactured by Hitachi, Ltd., silica-based material (support) and noble metal support (catalyst) particles are observed.
[平均粒子径の測定]
ベックマン・コールター社製のLS230型レーザー回折・散乱法粒度分布測定装置を用いて、シリカ系材料及び貴金属担持物の平均粒子径(体積基準)を測定する。
[Measurement of average particle size]
The average particle diameter (volume basis) of the silica-based material and the noble metal support is measured using an LS230 laser diffraction / scattering particle size distribution analyzer manufactured by Beckman Coulter.
[嵩密度(CBD)の測定]
前処理として、まず、シリカ系材料をステンレスルツボに約120g採取し、500℃のマッフル炉で1時間焼成を行う。焼成後のシリカ系材料を、デシケータ(シリカゲル入り)に入れ、室温まで冷却する。このようにして前処理したシリカ系材料を100.0g採取し、250mLのメスシリンダーに移し、メスシリンダー内にシリカ系材料を振とう器で15分間タッピング充填する。メスシリンダーを振とう器から取り外し、メスシリンダー内のシリカ系材料表面を平らにならし、充填容積を読み取った。嵩密度はシリカ系材料の質量を充填容積で除した値である。
[Measurement of bulk density (CBD)]
As a pretreatment, first, about 120 g of a silica-based material is collected in a stainless crucible and baked in a muffle furnace at 500 ° C. for 1 hour. The fired silica-based material is placed in a desiccator (with silica gel) and cooled to room temperature. 100.0 g of the silica-based material pretreated in this way is collected, transferred to a 250 mL measuring cylinder, and the silica-based material is tapped and filled in the measuring cylinder with a shaker for 15 minutes. The graduated cylinder was removed from the shaker, the silica-based material surface in the graduated cylinder was leveled, and the filling volume was read. The bulk density is a value obtained by dividing the mass of the silica-based material by the filling volume.
[耐摩耗性の測定]
底部に1/64インチの3つのオリフィスを有する穴あき円板を備えた、内径1.5インチの垂直チューブにシリカ系材料約50gを精秤して投入する。外部から垂直チューブ内に穴あき円板を通して、毎時15CF(Cubic Feet)の速度で空気を吹き込み、激しくチューブ内のシリカ系材料の粒子を流動させる。空気の吹き込みを開始してから5〜20時間の間に微細化して垂直チューブの上部から逸散したシリカ系材料の粒子の総量の、初期に投入した量に対する割合(質量%)を、「耐摩耗性」として求める。
[Measurement of wear resistance]
About 50 g of silica-based material is precisely weighed and put into a vertical tube having an inner diameter of 1.5 inches and having a perforated disk having three orifices of 1/64 inch at the bottom. Air is blown from the outside through a perforated disk into a vertical tube at a speed of 15 CF (Cubic Feet) per hour, and the particles of silica-based material in the tube are vigorously flowed. The ratio (mass%) of the total amount of silica-based material particles that have been refined and dissipated from the top of the vertical tube within 5 to 20 hours from the start of air blowing to the initially charged amount is expressed as “resistance resistance”. It is calculated as “abrasion”.
[結晶構造の解析]
リガク社製の粉末X線回折装置(XRD)「Rint2500型」(商品名)を用い、X線源Cu管球(40kV、200mA)、測定範囲5〜65deg(0.02deg/step)、測定速度0.2deg/分、スリット幅(散乱、発散、受光)1deg、1deg、0.15mmの条件でシリカ系材料の結晶構造の解析を行う。
測定は、試料を無反射試料板上に均一に散布し、ネオプレンゴムで固定して行う。
[Analysis of crystal structure]
X-ray source Cu tube (40 kV, 200 mA), measurement range 5 to 65 deg (0.02 deg / step), measurement speed using Rigaku's powder X-ray diffractometer (XRD) “Rint 2500 type” (trade name) The crystal structure of the silica-based material is analyzed under the conditions of 0.2 deg / min and slit width (scattering, divergence, light reception) of 1 deg, 1 deg, and 0.15 mm.
The measurement is performed by uniformly spreading the sample on a non-reflective sample plate and fixing it with neoprene rubber.
[第4周期元素(ニッケル)の化学状態解析]
シリカ系材料のNiKαスペクトルをTechnos社製のXFRA190型二結晶型高分解能蛍光X線分析装置(HRXRF)で測定し、得られた各種パラメーターを標準物質(ニッケル金属、酸化ニッケル)のそれらと比較し、シリカ系材料中のニッケルの価数等の化学状態を推測する。
測定試料として、調製したシリカ系材料をそのままの状態で用いる。NiのKαスペクトルの測定は、部分スペクトルモードで行う。この際、分光結晶にはGe(220)、スリットは縦発散角1°のものを用い、励起電圧及び電流はそれぞれ35kV及び80mAに設定する。その上で、標準試料ではアブソーバとしてろ紙を用い、シリカ系材料試料では計数時間を試料毎に選択してKαスペクトルのピーク強度が3000cps以下、10000counts以上になるように測定する。それぞれの試料で5回測定を繰り返し、その繰り返し測定前後にニッケル金属の測定を行う。実測スペクトルを平滑化処理(S−G法7点―5回)後、ピーク位置、半値幅(FWHM)、非対称性係数(AI)を算出し、ピーク位置は試料の測定前後に測定したニッケル金属の測定値からのズレ、化学シフト(ΔE)として取り扱う。
[Chemical state analysis of the fourth periodic element (nickel)]
The NiKα spectrum of silica-based materials was measured with XFRA190 double-crystal high-resolution X-ray fluorescence spectrometer (HRXRF) manufactured by Technos, and the obtained parameters were compared with those of standard materials (nickel metal, nickel oxide). The chemical state such as the valence of nickel in the silica-based material is estimated.
The prepared silica-based material is used as it is as a measurement sample. The measurement of the Ni Kα spectrum is performed in the partial spectrum mode. At this time, Ge (220) is used as the spectral crystal, and the slit has a vertical divergence angle of 1 °, and the excitation voltage and current are set to 35 kV and 80 mA, respectively. In addition, a filter paper is used as an absorber in the standard sample, and a counting time is selected for each sample in the silica-based material sample, and measurement is performed so that the peak intensity of the Kα spectrum is 3000 cps or less and 10,000 counts or more. The measurement is repeated five times for each sample, and nickel metal is measured before and after the repeated measurement. After smoothing the measured spectrum (SG method 7 points-5 times), the peak position, full width at half maximum (FWHM), and asymmetry coefficient (AI) were calculated. The peak position was the nickel metal measured before and after the measurement of the sample. It is treated as a deviation from the measured value, chemical shift (ΔE).
[第4周期元素の分散状態観察]
シリカ系材料の断面の解析を、島津製作所製: EPMA1600を用い、加速電圧:20KeVで測定する。
[Observation of dispersion state of fourth period element]
The analysis of the cross section of the silica-based material is measured using Shimadzu Corporation EPMA1600 at an acceleration voltage of 20 KeV.
[金属担持物の形態観察]
JEOL社製の3100FEF型透過型電子顕微鏡(TEM)[加速電圧300kV、エネルギー分散型X線検出器(EDX)付属]を用いて、TEMの明視野像を観察する。
試料として、貴金属担持物を乳鉢で破砕後、エタノールに分散させ、超音波洗浄を約1分間行った後、Mo製マイクログリット上に滴下し風乾したものを用いる。
[Observation of morphology of metal support]
A bright field image of TEM is observed using a 3100FEF transmission electron microscope (TEM) manufactured by JEOL [acceleration voltage 300 kV, with energy dispersive X-ray detector (EDX) attached].
As a sample, a precious metal-carrying material is crushed in a mortar, dispersed in ethanol, subjected to ultrasonic cleaning for about 1 minute, then dropped onto Mo microgrit and air-dried.
以下、本発明を実施例によりさらに詳細に説明するが、本発明はこれらの実施例に限定されるものではない。当業者は、以下に示す実施例のみならず様々な変更を加えて実施することが可能であり、かかる変更も本特許請求の範囲に包含される。なお実施例及び比較例におけるシリカ系材料の構成元素の含有量の決定、アルミニウム又は塩基性元素に対する第4周期元素の組成比の決定、比表面積、細孔径及び細孔容積の測定、形状観察、平均粒子径の測定、嵩密度の測定、耐摩耗性の測定、結晶構造の解析、第4周期元素の化学状態解析、金属担持物の形態観察は、それぞれ上述のとおりとした。 EXAMPLES Hereinafter, although an Example demonstrates this invention further in detail, this invention is not limited to these Examples. Those skilled in the art can implement various modifications as well as the following embodiments, and such modifications are also included in the scope of the claims. In addition, determination of the content of the constituent elements of the silica-based material in Examples and Comparative Examples, determination of the composition ratio of the fourth periodic element with respect to aluminum or basic element, measurement of specific surface area, pore diameter and pore volume, shape observation, The measurement of the average particle diameter, the measurement of the bulk density, the measurement of wear resistance, the analysis of the crystal structure, the analysis of the chemical state of the fourth periodic element, and the observation of the form of the metal support were as described above.
〔実施例1〕
硝酸アルミニウム9水和物1.5kg、硝酸ニッケル6水和物0.24kg、硝酸マグネシウム6水和物0.98kg及び60%硝酸0.27kgを、純水3.0Lに溶解した水溶液を準備した。その水溶液を15℃に保持した攪拌状態のコロイド粒子径10〜20nmのシリカゾル溶液(日産化学社製、商品名「スノーテックスN−30」、SiO2含有量:30質量%)10.0kg中へ徐々に滴下し、シリカゾル、硝酸アルミニウム、硝酸ニッケル及び硝酸マグネシウムの混合スラリーを得た。その後、出口温度を130℃に設定したスプレードライヤー装置で混合スラリーを噴霧乾燥し固形物を得た。
[Example 1]
An aqueous solution prepared by dissolving 1.5 kg of aluminum nitrate nonahydrate, 0.24 kg of nickel nitrate hexahydrate, 0.98 kg of magnesium nitrate hexahydrate and 0.27 kg of 60% nitric acid in 3.0 L of pure water was prepared. . Into 10.0 kg of a silica sol solution (manufactured by Nissan Chemical Co., trade name “Snowtex N-30”, SiO 2 content: 30% by mass) with a colloidal particle diameter of 10 to 20 nm in a stirred state in which the aqueous solution is maintained at 15 ° C. The mixture was gradually added dropwise to obtain a mixed slurry of silica sol, aluminum nitrate, nickel nitrate and magnesium nitrate. Thereafter, the mixed slurry was spray-dried with a spray dryer apparatus whose outlet temperature was set to 130 ° C. to obtain a solid.
次いで、得られた固形物を上部が開放されたステンレス製容器に厚さ約1cm程充填し、電気炉で室温から300℃まで2時間かけて昇温後、300℃で3時間保持した。さらに600℃まで2時間で昇温後、600℃で3時間保持して焼成した。その後、徐冷して、ケイ素−アルミニウム−ニッケル−マグネシウムを含む複合酸化物からなるシリカ系材料を得た。 Next, the obtained solid was filled in a stainless steel container having an open top with a thickness of about 1 cm, heated from room temperature to 300 ° C. over 2 hours in an electric furnace, and then held at 300 ° C. for 3 hours. Further, the temperature was raised to 600 ° C. in 2 hours, and then calcined by holding at 600 ° C. for 3 hours. Then, it annealed and the silica type material which consists of complex oxide containing silicon-aluminum-nickel-magnesium was obtained.
得られたシリカ系材料は、ケイ素とアルミニウムとニッケルとマグネシウムとの合計モル量に対して、ケイ素を85.3モル%、アルミニウムを6.8モル%、ニッケルを1.4モル%、マグネシウムを6.5モル%含んでいた。Ni(X)/Alの組成比はモル基準で0.21、Ni(X)/Mg(B)の組成比はモル基準で0.22であった。
窒素吸着法による比表面積は223m2/g、細孔容積は0.26mL/g、平均細孔径は5.1nmであった。嵩密度は0.97CBD、耐摩耗性は0.1質量%であった。平均粒子径は、レーザー・散乱法粒度分布測定による結果から、62μmであった。また、走査型電子顕微鏡(SEM)による観察から、シリカ系材料に割れや欠けはなく、形状はほぼ球状であった。固体形態について、粉末X線回折(XRD)の結果から、シリカゲルと同様の非晶質パターンが得られた。
The obtained silica-based material was 85.3 mol% silicon, 6.8 mol% aluminum, 1.4 mol% nickel, and magnesium based on the total molar amount of silicon, aluminum, nickel and magnesium. It contained 6.5 mol%. The composition ratio of Ni (X) / Al was 0.21 on a molar basis, and the composition ratio of Ni (X) / Mg (B) was 0.22 on a molar basis.
The specific surface area determined by the nitrogen adsorption method was 223 m 2 / g, the pore volume was 0.26 mL / g, and the average pore diameter was 5.1 nm. The bulk density was 0.97 CBD, and the wear resistance was 0.1% by mass. The average particle diameter was 62 μm from the result of measurement by laser / scattering particle size distribution measurement. Further, from observation with a scanning electron microscope (SEM), the silica-based material was not cracked or chipped, and the shape was almost spherical. As for the solid form, an amorphous pattern similar to that of silica gel was obtained from the results of powder X-ray diffraction (XRD).
シリカ系材料中のニッケルの化学状態について、二結晶型高分解能蛍光X線分析法(HRXRF)の結果から、ニッケルのハイスピン2価と推測され、NiKαスペクトルの相違から単一化合物である酸化ニッケルとは異なる化学状態であることが判明した。実測スペクトルから得られたシリカ系材料のNiKαスペクトルの半値幅(FWHM)は3.474、化学シフト(ΔE)は0.331であった。標準物質として測定した酸化ニッケルのNiKαスペクトルの半値幅(FWHM)は3.249、化学シフト(ΔE)は0.344であった。 Regarding the chemical state of nickel in silica-based materials, it is estimated from the results of double-crystal high-resolution X-ray fluorescence analysis (HRXRF) that nickel is high-spin divalent. From the difference in NiKα spectra, nickel oxide is a single compound. Were found to be in different chemical states. The full width at half maximum (FWHM) of the Ni Kα spectrum of the silica-based material obtained from the measured spectrum was 3.474 and the chemical shift (ΔE) was 0.331. The full width at half maximum (FWHM) of the Ni Kα spectrum of nickel oxide measured as a standard substance was 3.249, and the chemical shift (ΔE) was 0.344.
シリカ系材料中のニッケルの分散状態は、電子プローブ微小部分析法(EPMA)の結果から、いずれの場所でもニッケルがほぼ同濃度で存在している状態であった。 The dispersion state of nickel in the silica-based material was a state where nickel was present at almost the same concentration at any location from the result of electron probe microanalysis (EPMA).
次に、シリカ系材料の耐酸性及び塩基性を評価するために、以下の方法によりpHスイング試験を行った。
上記のようにして得られたシリカ系材料10gを、ガラス容器に入れたpH4の緩衝液100mLに添加し、90℃で10分間攪拌を続けた後、静置して上澄みを除去し、水洗、デカンテーションを行った。こうして得られた固形物を、ガラス容器に入れたpH10の緩衝液100mLに添加し、90℃で10分間攪拌を続けた後、静置して上澄みを除去し、水洗、デカンテーションを行った。以上の操作を1サイクルとし、計50サイクルのpHスイング処理を実施した。その結果、pHスイング処理後のシリカ系材料の比表面積は220m2/g、細孔容積は0.27mL/g、平均細孔径は5.2nmであり、pHスイング処理によるシリカ系材料の構造変化は認められなかった。
Next, in order to evaluate the acid resistance and basicity of the silica-based material, a pH swing test was performed by the following method.
10 g of the silica-based material obtained as described above was added to 100 mL of a pH 4 buffer solution in a glass container, and after stirring at 90 ° C. for 10 minutes, the mixture was left to stand to remove the supernatant, washed with water, Decanted. The solid material thus obtained was added to 100 mL of a pH 10 buffer solution placed in a glass container, and stirring was continued at 90 ° C. for 10 minutes. Then, the solid was left to stand to remove the supernatant, washed with water, and decanted. The above operation was made into 1 cycle, and the pH swing process of 50 cycles in total was implemented. As a result, the specific surface area of the silica-based material after the pH swing treatment is 220 m 2 / g, the pore volume is 0.27 mL / g, and the average pore diameter is 5.2 nm. Was not recognized.
〔実施例2〕
硝酸アルミニウム9水和物1.5kgに代えて硝酸アルミニウム9水和物4.0kg、硝酸ニッケル6水和物0.24kgに代えて硝酸亜鉛6水和物0.11kg、硝酸マグネシウム6水和物0.98kgに代えて硝酸カリウム1.1kgを用いた以外は実施例1と同様にして、ケイ素を69.7モル%、アルミニウムを15.0モル%、亜鉛を0.5モル%、カリウムを14.9モル%含むシリカ系材料を得た。Zn(X)/Alの組成比はモル基準で0.03、Zn(X)/K(B)の組成比はモル基準で0.03であった。窒素吸着法による比表面積は170m2/g、細孔容積は0.27mL/g、平均細孔径は5.3nmであった。嵩密度は0.95CBD、耐摩耗性は0.1質量%であった。平均粒子径は、レーザー・散乱法粒度分布測定による結果から、64μmであった。また、走査型電子顕微鏡(SEM)による観察から、シリカ系材料に割れや欠けもなく、形状はほぼ球状であった。固体形態について、粉末X線回折(XRD)の結果から、シリカゲルと同様の非晶質パターンが得られた。
[Example 2]
Instead of aluminum nitrate 9 hydrate 1.5 kg, aluminum nitrate 9 hydrate 4.0 kg, nickel nitrate hexahydrate 0.24 kg, zinc nitrate hexahydrate 0.11 kg, magnesium nitrate hexahydrate 69.7 mol% silicon, 15.0 mol% aluminum, 0.5 mol% zinc, 14 mol potassium and similar to Example 1 except that 1.1 kg potassium nitrate was used instead of 0.98 kg. A silica-based material containing 9 mol% was obtained. The composition ratio of Zn (X) / Al was 0.03 on a molar basis, and the composition ratio of Zn (X) / K (B) was 0.03 on a molar basis. The specific surface area determined by the nitrogen adsorption method was 170 m 2 / g, the pore volume was 0.27 mL / g, and the average pore diameter was 5.3 nm. The bulk density was 0.95 CBD, and the wear resistance was 0.1% by mass. The average particle diameter was 64 μm from the result of measurement by laser / scattering particle size distribution measurement. Further, from observation with a scanning electron microscope (SEM), the silica-based material was not cracked or chipped, and the shape was almost spherical. As for the solid form, an amorphous pattern similar to that of silica gel was obtained from the results of powder X-ray diffraction (XRD).
次に、上記のようにして得られたシリカ系材料の耐酸性及び塩基性を評価するために、実施例1と同様の方法によりpHスイング試験を行った。その結果、pHスイング処理後のシリカ系材料の比表面積は169m2/g、細孔容積は0.26mL/g、平均細孔径は5.7nmであり、pHスイング処理によるシリカ系材料の構造変化はほとんど認められなかった。 Next, in order to evaluate the acid resistance and basicity of the silica-based material obtained as described above, a pH swing test was performed by the same method as in Example 1. As a result, the specific surface area of the silica-based material after the pH swing treatment is 169 m 2 / g, the pore volume is 0.26 mL / g, and the average pore diameter is 5.7 nm. Was hardly recognized.
〔実施例3〕
硝酸アルミニウム9水和物1.5kgに代えて硝酸アルミニウム9水和物2.0kg、硝酸ニッケル6水和物0.24kgに代えて硝酸コバルト6水和物0.75kg、硝酸マグネシウム6水和物0.98kgに代えて硝酸ルビジウム0.38kgを用いた以外は実施例1と同様にして、ケイ素を82.7モル%、アルミニウムを8.8モル%、コバルトを4.3モル%、ルビジウムを4.3モル%含むシリカ系材料を得た。Co(X)/Alの組成比はモル基準で0.49、Co(X)/Rb(B)の組成比はモル基準で0.99であった。窒素吸着法による比表面積は196m2/g、細孔容積は0.26mL/g、平均細孔径は5.1nmであった。嵩密度は0.96CBD、耐摩耗性は0.1質量%であった。平均粒子径は、レーザー・散乱法粒度分布測定による結果から、62μmであった。また、走査型電子顕微鏡(SEM)による観察から、シリカ系材料に割れや欠けもなく、形状はほぼ球状であった。固体形態について、粉末X線回折(XRD)の結果から、シリカゲルと同様の非晶質パターンが得られた。
Example 3
Instead of aluminum nitrate 9 hydrate 1.5 kg, aluminum nitrate 9 hydrate 2.0 kg, nickel nitrate hexahydrate 0.24 kg, cobalt nitrate hexahydrate 0.75 kg, magnesium nitrate hexahydrate Except that 0.38 kg of rubidium nitrate was used in place of 0.98 kg, the same procedure as in Example 1 was carried out, 82.7 mol% of silicon, 8.8 mol% of aluminum, 4.3 mol% of cobalt, and rubidium. A silica-based material containing 4.3 mol% was obtained. The composition ratio of Co (X) / Al was 0.49 on a molar basis, and the composition ratio of Co (X) / Rb (B) was 0.99 on a molar basis. The specific surface area determined by the nitrogen adsorption method was 196 m 2 / g, the pore volume was 0.26 mL / g, and the average pore diameter was 5.1 nm. The bulk density was 0.96 CBD, and the wear resistance was 0.1% by mass. The average particle diameter was 62 μm from the result of measurement by laser / scattering particle size distribution measurement. Further, from observation with a scanning electron microscope (SEM), the silica-based material was not cracked or chipped, and the shape was almost spherical. As for the solid form, an amorphous pattern similar to that of silica gel was obtained from the results of powder X-ray diffraction (XRD).
シリカ系材料中のコバルトの分散状態は、電子プローブ微小部分析法(EPMA)の結果から、いずれの場所でもコバルトがほぼ同濃度で存在している状態であった。 From the result of electron probe microanalysis (EPMA), the dispersion state of cobalt in the silica-based material was a state where cobalt was present at almost the same concentration at any location.
次に、上記のようにして得られたシリカ系材料の耐酸性及び塩基性を評価するために、実施例1と同様の方法によりpHスイング試験を行った。その結果、pHスイング処理後のシリカ系材料の比表面積は198m2/g、細孔容積は0.26mL/g、平均細孔径は5.0nmであり、pHスイング処理による構造変化は認められなかった。 Next, in order to evaluate the acid resistance and basicity of the silica-based material obtained as described above, a pH swing test was performed by the same method as in Example 1. As a result, the specific surface area of the silica-based material after the pH swing treatment was 198 m 2 / g, the pore volume was 0.26 mL / g, the average pore diameter was 5.0 nm, and no structural change was observed due to the pH swing treatment. It was.
〔実施例4〕
硝酸ニッケル6水和物0.24kgに代えて硝酸鉄9水和物0.2kg、硝酸マグネシウム6水和物0.98kgに代えて硝酸ランタン9水和物0.48kgを用いた以外は実施例1と同様にして、ケイ素を89.9モル%、アルミニウムを7.2モル%、鉄を0.9モル%、ランタンを2.0モル%含むシリカ系材料を得た。Fe(X)/Alの組成比はモル基準で0.12、Fe(X)/La(B)の組成比はモル基準で0.45であった。窒素吸着法による比表面積は232m2/g、細孔容積は0.28mL/g、平均細孔径は5.0nmであった。嵩密度は0.98CBD、耐摩耗性は0.1質量%であった。平均粒子径は、レーザー・散乱法粒度分布測定による結果から、64μmであった。また、走査型電子顕微鏡(SEM)による観察から、シリカ系材料に割れや欠けもなく、形状はほぼ球状であった。固体形態について、粉末X線回折(XRD)の結果から、シリカゲルと同様の非晶質パターンが得られた。
Example 4
Example except that 0.24 kg of nickel nitrate hexahydrate was used instead of 0.2 kg of iron nitrate nonahydrate, and 0.48 kg of lanthanum nitrate nonahydrate was used instead of 0.98 kg of magnesium nitrate hexahydrate. In the same manner as in Example 1, a silica-based material containing 89.9 mol% silicon, 7.2 mol% aluminum, 0.9 mol% iron, and 2.0 mol% lanthanum was obtained. The composition ratio of Fe (X) / Al was 0.12 on a molar basis, and the composition ratio of Fe (X) / La (B) was 0.45 on a molar basis. The specific surface area determined by the nitrogen adsorption method was 232 m 2 / g, the pore volume was 0.28 mL / g, and the average pore diameter was 5.0 nm. The bulk density was 0.98 CBD, and the wear resistance was 0.1% by mass. The average particle diameter was 64 μm from the result of measurement by laser / scattering particle size distribution measurement. Further, from observation with a scanning electron microscope (SEM), the silica-based material was not cracked or chipped, and the shape was almost spherical. As for the solid form, an amorphous pattern similar to that of silica gel was obtained from the results of powder X-ray diffraction (XRD).
次に、上記のようにして得られたシリカ系材料の耐酸性及び塩基性を評価するために、実施例1と同様の方法によりpHスイング試験を行った。その結果、pHスイング処理後のシリカ系材料の比表面積は230m2/g、細孔容積は0.27mL/g、平均細孔径は5.3nmであり、pHスイング処理による構造変化は認められなかった。 Next, in order to evaluate the acid resistance and basicity of the silica-based material obtained as described above, a pH swing test was performed by the same method as in Example 1. As a result, the specific surface area of the silica-based material after the pH swing treatment was 230 m 2 / g, the pore volume was 0.27 mL / g, the average pore diameter was 5.3 nm, and no structural change was observed due to the pH swing treatment. It was.
〔実施例5〕
水ガラス3号(SiO2:28〜30質量%、Na2O:9〜10質量%)10kgに、pHが9になるまで硫酸を添加し、次いで硫酸アルミニウムを添加し、pHを2とした。さらにアルミン酸ソーダを添加し、pHを5〜5.5とし、一部を脱水してシリカ−アルミナを約10質量%含むヒドロゲルを得た。このヒドロゲルを130℃でスプレードライにて噴霧乾燥後、Na2Oが0.02質量%、SO4が0.5質量%以下になるように洗浄した。これに、酸化マグネシウム0.83kgと酸化ニッケル1.8kgとを添加、混合してスラリーを得た。そのスラリーを、ろ過、洗浄後、110℃で6時間乾燥し、次いで700℃まで3時間かけて昇温後、700℃で3時間保持して焼成した。その後、除冷して、シリカ系材料を得た。
Example 5
To 10 kg of water glass No. 3 (SiO 2 : 28 to 30% by mass, Na 2 O: 9 to 10% by mass), sulfuric acid was added until the pH reached 9, and then aluminum sulfate was added to adjust the pH to 2. . Further, sodium aluminate was added to adjust the pH to 5 to 5.5, and a part was dehydrated to obtain a hydrogel containing about 10% by mass of silica-alumina. This hydrogel was spray-dried at 130 ° C. by spray drying, and then washed so that Na 2 O was 0.02 mass% and SO 4 was 0.5 mass% or less. To this, 0.83 kg of magnesium oxide and 1.8 kg of nickel oxide were added and mixed to obtain a slurry. The slurry was filtered, washed, dried at 110 ° C. for 6 hours, then heated to 700 ° C. over 3 hours, and held at 700 ° C. for 3 hours for firing. Then, it cooled and obtained the silica type material.
得られたシリカ系材料は、ケイ素とアルミニウムとニッケルとマグネシウムとの合計モル量に対して、ケイ素を42.2モル%、アルミニウム20.4モル%、ニッケルを19.8モル%、マグネシウムを17.6モル%含んでいた。Ni(X)/Alの組成比はモル基準で0.97、Ni(X)/Mg(B)の組成比はモル基準で1.13であった。
窒素吸着法による比表面積は73m2/g、細孔容積は0.26mL/g、平均細孔径は5.4nmであった。嵩密度は1.05CBD、耐摩耗性は0.1質量%であった。平均粒子径は、レーザー・散乱法粒度分布測定による結果から、63μmであった。また、走査型電子顕微鏡(SEM)による観察から、シリカ系材料に割れや欠けはなく、形状はほぼ球状であった。固体形態について、粉末X線回折(XRD)の結果から、シリカゲルと同様の非晶質パターンが得られた。
The obtained silica-based material was 42.2 mol% silicon, 20.4 mol% aluminum, 19.8 mol% nickel, 17 magnesium based on the total molar amount of silicon, aluminum, nickel and magnesium. Contained 6 mol%. The composition ratio of Ni (X) / Al was 0.97 on a molar basis, and the composition ratio of Ni (X) / Mg (B) was 1.13 on a molar basis.
The specific surface area determined by the nitrogen adsorption method was 73 m 2 / g, the pore volume was 0.26 mL / g, and the average pore diameter was 5.4 nm. The bulk density was 1.05 CBD, and the wear resistance was 0.1% by mass. The average particle size was 63 μm from the result of measurement by laser / scattering particle size distribution measurement. Further, from observation with a scanning electron microscope (SEM), the silica-based material was not cracked or chipped, and the shape was almost spherical. As for the solid form, an amorphous pattern similar to that of silica gel was obtained from the results of powder X-ray diffraction (XRD).
次に、上記のようにして得られたシリカ系材料の耐酸性及び塩基性を評価するために、実施例1と同様の方法によりpHスイング試験を行った。その結果、pHスイング処理後のシリカ系材料の比表面積は72m2/g、細孔容積は0.27mL/g、平均細孔径は5.3nmであり、pHスイング処理による構造変化は認められなかった。 Next, in order to evaluate the acid resistance and basicity of the silica-based material obtained as described above, a pH swing test was performed by the same method as in Example 1. As a result, the specific surface area of the silica-based material after the pH swing treatment was 72 m 2 / g, the pore volume was 0.27 mL / g, the average pore diameter was 5.3 nm, and no structural change was observed due to the pH swing treatment. It was.
〔実施例6〕
硝酸アルミニウム9水和物1.5kgに代えて酸化アルミニウム4.4kg、硝酸ニッケル6水和物0.24kgに代えて酸化ニッケル0.93kg、硝酸マグネシウム6水和物0.98kgに代えて酸化マグネシウム0.42kgを用い、焼成温度を600℃から800℃に代えた以外は実施例1と同様にして、ケイ素を42.9モル%、アルミニウムを37.0モル%、ニッケルを10.9モル%、マグネシウムを9.1モル%含むシリカ系材料を得た。Ni(X)/Alの組成比はモル基準で0.30、Ni(X)/Mg(B)の組成比はモル基準で1.20であった。窒素吸着法による比表面積は78m2/g、細孔容積は0.27mL/g、平均細孔径は5.2nmであった。嵩密度は1.02CBD、耐摩耗性は0.1質量%であった。平均粒子径は、レーザー・散乱法粒度分布測定による結果から、62μmであった。また、走査型電子顕微鏡(SEM)による観察から、シリカ系材料に割れや欠けはなく、形状はほぼ球状であった。固体形態について、粉末X線回折(XRD)の結果から、シリカゲルと同様の非晶質パターンが得られた。
Example 6
In place of 1.5 kg of aluminum nitrate nonahydrate 4.4 kg of aluminum oxide, in place of nickel nitrate hexahydrate 0.24 kg, nickel oxide 0.93 kg, magnesium nitrate hexahydrate 0.98 kg in place of magnesium oxide Except for using 0.42 kg and changing the firing temperature from 600 ° C. to 800 ° C., in the same manner as in Example 1, 42.9 mol% of silicon, 37.0 mol% of aluminum, and 10.9 mol% of nickel A silica-based material containing 9.1 mol% of magnesium was obtained. The composition ratio of Ni (X) / Al was 0.30 on a molar basis, and the composition ratio of Ni (X) / Mg (B) was 1.20 on a molar basis. The specific surface area determined by the nitrogen adsorption method was 78 m 2 / g, the pore volume was 0.27 mL / g, and the average pore diameter was 5.2 nm. The bulk density was 1.02 CBD, and the wear resistance was 0.1% by mass. The average particle diameter was 62 μm from the result of measurement by laser / scattering particle size distribution measurement. Further, from observation with a scanning electron microscope (SEM), the silica-based material was not cracked or chipped, and the shape was almost spherical. As for the solid form, an amorphous pattern similar to that of silica gel was obtained from the results of powder X-ray diffraction (XRD).
次に、上記のようにして得られたシリカ系材料の耐酸性及び塩基性を評価するために、実施例1と同様の方法によりpHスイング試験を行った。その結果、pHスイング処理後のシリカ系材料の比表面積は77m2/g、細孔容積は0.27mL/g、平均細孔径は5.2nmであり、pHスイング処理による構造変化は認められなかった。 Next, in order to evaluate the acid resistance and basicity of the silica-based material obtained as described above, a pH swing test was performed by the same method as in Example 1. As a result, the specific surface area of the silica-based material after the pH swing treatment was 77 m 2 / g, the pore volume was 0.27 mL / g, the average pore diameter was 5.2 nm, and no structural change was observed due to the pH swing treatment. It was.
〔実施例7〕
硝酸アルミニウム9水和物1.5kgに代えて硝酸アルミニウム9水和物1.0kg、硝酸ニッケル6水和物0.24kgに代えて水酸化ニッケル0.23kg、硝酸マグネシウム6水和物0.98kgに代えて水酸化マグネシウム1.9kgを用い、焼成温度を600℃から650℃に代えた以外は実施例1と同様にして、ケイ素を57.6モル%、アルミニウムを3.1モル%、ニッケルを2.8モル%、マグネシウムを36.6モル%含むシリカ系材料を得た。Ni(X)/Alの組成比はモル基準で0.91、Ni(X)/Mg(B)の組成比はモル基準で0.08であった。窒素吸着法による比表面積は92m2/g、細孔容積は0.28mL/g、平均細孔径は5.1nmであった。嵩密度は0.99CBD、耐摩耗性は0.1質量%であった。平均粒子径は、レーザー・散乱法粒度分布測定による結果から、62μmであった。また、走査型電子顕微鏡(SEM)による観察から、シリカ系材料に割れや欠けはなく、形状はほぼ球状であった。固体形態について、粉末X線回折(XRD)の結果から、シリカゲルと同様の非晶質パターンが得られた。
Example 7
Instead of aluminum nitrate 9 hydrate 1.5 kg, aluminum nitrate 9 hydrate 1.0 kg, nickel nitrate hexahydrate 0.24 kg, nickel hydroxide 0.23 kg, magnesium nitrate hexahydrate 0.98 kg In the same manner as in Example 1 except that 1.9 kg of magnesium hydroxide was used and the firing temperature was changed from 600 ° C. to 650 ° C., 57.6 mol% of silicon, 3.1 mol% of aluminum, nickel As a result, a silica-based material containing 2.8 mol% of magnesium and 36.6 mol% of magnesium was obtained. The composition ratio of Ni (X) / Al was 0.91 on a molar basis, and the composition ratio of Ni (X) / Mg (B) was 0.08 on a molar basis. The specific surface area determined by the nitrogen adsorption method was 92 m 2 / g, the pore volume was 0.28 mL / g, and the average pore diameter was 5.1 nm. The bulk density was 0.99 CBD, and the wear resistance was 0.1% by mass. The average particle diameter was 62 μm from the result of measurement by laser / scattering particle size distribution measurement. Further, from observation with a scanning electron microscope (SEM), the silica-based material was not cracked or chipped, and the shape was almost spherical. As for the solid form, an amorphous pattern similar to that of silica gel was obtained from the results of powder X-ray diffraction (XRD).
次に、上記のようにして得られたシリカ系材料の耐酸性及び塩基性を評価するために、実施例1と同様の方法によりpHスイング試験を行った。その結果、pHスイング処理後のシリカ系材料の比表面積は94m2/g、細孔容積は0.27mL/g、平均細孔径は5.0nmであり、pHスイング処理による構造変化は認められなかった。 Next, in order to evaluate the acid resistance and basicity of the silica-based material obtained as described above, a pH swing test was performed by the same method as in Example 1. As a result, the specific surface area of the silica-based material after the pH swing treatment was 94 m 2 / g, the pore volume was 0.27 mL / g, the average pore diameter was 5.0 nm, and no structural change was observed due to the pH swing treatment. It was.
〔実施例8〕
実施例1で得られた固形物であるシリカ系材料100gを90℃に加熱された1.0Lの蒸留水中に投入し、攪拌しながら90℃で1時間保持して水熱処理を行った。
次いで、水熱処理後の混合物を静置して上澄みを除去し、蒸留水で数回洗浄し、濾過した後の固形物を105℃で16時間乾燥した。得られたシリカ系材料の比表面積は240m2/g、細孔容積は0.27mL/g、平均細孔径は3.9nmであった。シリカ系材料の平均粒子径は、レーザー・散乱法粒度分布測定による結果から、62μmであった。また、走査型電子顕微鏡(SEM)による観察から、シリカ系材料に割れや欠けはなく、形状はほぼ球状であった。粉末X線回折(XRD)の結果から、シリカゲルと同様の非晶質パターンが得られた。
Example 8
100 g of the silica-based material, which is a solid material obtained in Example 1, was put into 1.0 L of distilled water heated to 90 ° C., and hydrothermally treated by holding at 90 ° C. for 1 hour while stirring.
Next, the mixture after hydrothermal treatment was allowed to stand to remove the supernatant, washed several times with distilled water, and the solid after filtration was dried at 105 ° C. for 16 hours. The obtained silica-based material had a specific surface area of 240 m 2 / g, a pore volume of 0.27 mL / g, and an average pore diameter of 3.9 nm. The average particle diameter of the silica-based material was 62 μm from the result of measurement by laser / scattering particle size distribution measurement. Further, from observation with a scanning electron microscope (SEM), the silica-based material was not cracked or chipped, and the shape was almost spherical. From the result of powder X-ray diffraction (XRD), an amorphous pattern similar to that of silica gel was obtained.
次に、上記のようにして得られたシリカ系材料の耐酸性及び塩基性を評価するために、実施例1と同様の方法によりpHスイング試験を行った。その結果、pHスイング処理後のシリカ系材料の比表面積は242m2/g、細孔容積は0.26mL/g、平均細孔径は4.0nmであり、pHスイング処理による構造変化は認められなかった。 Next, in order to evaluate the acid resistance and basicity of the silica-based material obtained as described above, a pH swing test was performed by the same method as in Example 1. As a result, the specific surface area of the silica-based material after the pH swing treatment was 242 m 2 / g, the pore volume was 0.26 mL / g, the average pore diameter was 4.0 nm, and no structural change was observed due to the pH swing treatment. It was.
〔実施例9〕
硝酸アルミニウム9水和物2.0kg、硝酸マグネシウム1.5kg、及び、60%硝酸0.27kgを純水3.0Lに溶解した水溶液を準備した。その水溶液を15℃に保持した攪拌状態のコロイド粒子径10〜20nmのシリカゾル溶液(日産化学社製、商品名「スノーテックスN−30」、SiO2含有量:30質量%)10.0kg中へ徐々に滴下し、シリカゾル、硝酸アルミニウム及び硝酸マグネシウムの混合スラリーを得た。その後、混合スラリーを50℃で24時間保持して熟成させた。熟成させた混合スラリーを室温に冷却した後、出口温度を130℃に設定したスプレードライヤー装置で噴霧乾燥し乾燥物を得た。
次いで、得られた乾燥物を上部が開放したステンレス製容器に厚さ約1cm程充填し、電気炉で室温から300℃まで2時間かけて昇温後、300℃で3時間保持した。さらに600℃まで2時間で昇温後、600℃で3時間保持して焼成した。その後、徐冷して、固形物であるシリカ−アルミナ−マグネシアを得た。
Example 9
An aqueous solution prepared by dissolving 2.0 kg of aluminum nitrate nonahydrate, 1.5 kg of magnesium nitrate, and 0.27 kg of 60% nitric acid in 3.0 L of pure water was prepared. Into 10.0 kg of a silica sol solution (manufactured by Nissan Chemical Co., trade name “Snowtex N-30”, SiO 2 content: 30% by mass) with a colloidal particle diameter of 10 to 20 nm in a stirred state in which the aqueous solution is maintained at 15 ° C. The mixture was gradually added dropwise to obtain a mixed slurry of silica sol, aluminum nitrate and magnesium nitrate. Thereafter, the mixed slurry was aged by holding at 50 ° C. for 24 hours. The aged mixed slurry was cooled to room temperature and then spray-dried with a spray dryer apparatus whose outlet temperature was set to 130 ° C. to obtain a dried product.
Next, the obtained dried product was filled in a stainless steel container having an open top with a thickness of about 1 cm, heated from room temperature to 300 ° C. over 2 hours in an electric furnace, and then kept at 300 ° C. for 3 hours. Further, the temperature was raised to 600 ° C. in 2 hours, and then calcined by holding at 600 ° C. for 3 hours. Then, it annealed and obtained the silica-alumina-magnesia which is a solid substance.
次に、硝酸ニッケル6水和物27gを含む水溶液1.0Lを90℃に加温した。この水溶液に上記のようにして得られた固形物であるシリカ−アルミナ−マグネシア300gを投入し、攪拌しながら90℃で1時間保持して、ニッケル成分を固形物に析出させた。次いで、その混合物を静置して上澄みを除去し、蒸留水で数回洗浄し、濾過した後の固形物を105℃で16時間乾燥し、さらに空気中600℃で5時間焼成した。こうして、ケイ素を80.3モル%、アルミニウムを8.7モル%、ニッケルを1.5モル%、マグネシウムを9.5モル%含むシリカ系材料を得た。Ni(X)/Alの組成比はモル基準で0.18、Ni(X)/Mg(B)の組成比はモル基準で0.16であった。
窒素吸着法による比表面積は245m2/g、細孔容積は0.26mL/g、平均細孔径は4.0nmであった。嵩密度は0.99CBD、耐摩耗性は0.1質量%であった。平均粒子径は、レーザー・散乱法粒度分布測定による結果から、62μmであった。また、走査型電子顕微鏡(SEM)による観察から、シリカ系材料に割れや欠けはなく、形状はほぼ球状であった。固体形態について、粉末X線回折(XRD)の結果から、シリカゲルと同様の非晶質パターンが得られた。
Next, 1.0 L of an aqueous solution containing 27 g of nickel nitrate hexahydrate was heated to 90 ° C. Into this aqueous solution, 300 g of silica-alumina-magnesia, which was a solid obtained as described above, was added and kept at 90 ° C. for 1 hour with stirring to precipitate a nickel component on the solid. The mixture was then allowed to stand to remove the supernatant, washed several times with distilled water, filtered and the solid material was dried at 105 ° C. for 16 hours and further calcined in air at 600 ° C. for 5 hours. Thus, a silica-based material containing 80.3 mol% silicon, 8.7 mol% aluminum, 1.5 mol% nickel, and 9.5 mol% magnesium was obtained. The composition ratio of Ni (X) / Al was 0.18 on a molar basis, and the composition ratio of Ni (X) / Mg (B) was 0.16 on a molar basis.
The specific surface area determined by the nitrogen adsorption method was 245 m 2 / g, the pore volume was 0.26 mL / g, and the average pore diameter was 4.0 nm. The bulk density was 0.99 CBD, and the wear resistance was 0.1% by mass. The average particle diameter was 62 μm from the result of measurement by laser / scattering particle size distribution measurement. Further, from observation with a scanning electron microscope (SEM), the silica-based material was not cracked or chipped, and the shape was almost spherical. As for the solid form, an amorphous pattern similar to that of silica gel was obtained from the results of powder X-ray diffraction (XRD).
次に、上記のようにして得られたシリカ系材料の耐酸性及び塩基性を評価するために、実施例1と同様の方法によりpHスイング試験を行った。その結果、pHスイング処理後のシリカ系材料の比表面積は243m2/g、細孔容積は0.27mL/g、平均細孔径は4.1nmであり、pHスイング処理によるシリカ系材料の構造変化は認められなかった。 Next, in order to evaluate the acid resistance and basicity of the silica-based material obtained as described above, a pH swing test was performed by the same method as in Example 1. As a result, the specific surface area of the silica-based material after the pH swing treatment is 243 m 2 / g, the pore volume is 0.27 mL / g, and the average pore diameter is 4.1 nm. Was not recognized.
〔実施例10〕
硝酸アルミニウム9水和物188g、硝酸ニッケル6水和物145g、硝酸マグネシウム6水和物128g及び60%硝酸46gを、純水552mLに溶解した水溶液を準備した。その水溶液を15℃に保持した攪拌状態のコロイド粒子径10〜20nmのシリカゾル溶液(日産化学社製、商品名「スノーテックスN−30」、SiO2含有量:30質量%)993g中へ徐々に滴下し、シリカゾル、硝酸アルミニウム、硝酸ニッケル及び硝酸マグネシウムの混合スラリーを得た。その後、出口温度を130℃に設定したスプレードライヤー装置で混合スラリーを噴霧乾燥し固形物を得た。
Example 10
An aqueous solution in which 188 g of aluminum nitrate nonahydrate, 145 g of nickel nitrate hexahydrate, 128 g of magnesium nitrate hexahydrate and 46 g of 60% nitric acid were dissolved in 552 mL of pure water was prepared. Gradually into 993 g of a silica sol solution (manufactured by Nissan Chemical Co., trade name “Snowtex N-30”, SiO 2 content: 30 mass%) with a colloidal particle size of 10 to 20 nm in a stirred state in which the aqueous solution was maintained at 15 ° C. The slurry was added dropwise to obtain a mixed slurry of silica sol, aluminum nitrate, nickel nitrate and magnesium nitrate. Thereafter, the mixed slurry was spray-dried with a spray dryer apparatus whose outlet temperature was set to 130 ° C. to obtain a solid.
次いで、実施例1と同様の方法で加熱・焼成、徐冷して、ケイ素を76.9モル%、アルミニウムを7.7モル%、ニッケルを7.7モル%、マグネシウムを7.7モル%含むシリカ系材料を得た。Ni(X)/Alの組成比はモル基準で1.0、Ni(X)/Mg(B)の組成比はモル基準で1.0であった。窒素吸着法による比表面積は130m2/g、細孔容積は0.25mL/g、平均細孔径は7.8nmであった。嵩密度は0.96CBD、耐摩耗性は0.1質量%であった。平均粒子径は、レーザー・散乱法粒度分布測定による結果から、62μmであった。また、走査型電子顕微鏡(SEM)による観察から、シリカ系材料に割れや欠けもなく、形状はほぼ球状であった。 Next, heating, firing, and slow cooling were performed in the same manner as in Example 1 to obtain 76.9 mol% silicon, 7.7 mol% aluminum, 7.7 mol% nickel, and 7.7 mol% magnesium. A silica-based material containing was obtained. The composition ratio of Ni (X) / Al was 1.0 on a molar basis, and the composition ratio of Ni (X) / Mg (B) was 1.0 on a molar basis. The specific surface area determined by the nitrogen adsorption method was 130 m 2 / g, the pore volume was 0.25 mL / g, and the average pore diameter was 7.8 nm. The bulk density was 0.96 CBD, and the wear resistance was 0.1% by mass. The average particle diameter was 62 μm from the result of measurement by laser / scattering particle size distribution measurement. Further, from observation with a scanning electron microscope (SEM), the silica-based material was not cracked or chipped, and the shape was almost spherical.
次に、上記のようにして得られたシリカ系材料の耐酸性及び塩基性を評価するために、実施例1と同様の方法によりpHスイング試験を行った。その結果、pHスイング処理後のシリカ系材料の比表面積は131m2/g、細孔容積は0.26mL/g、平均細孔径は7.9nmであり、pHスイング処理によるシリカ系材料の構造変化はほとんど認められなかった。 Next, in order to evaluate the acid resistance and basicity of the silica-based material obtained as described above, a pH swing test was performed by the same method as in Example 1. As a result, the specific surface area of the silica-based material after the pH swing treatment is 131 m 2 / g, the pore volume is 0.26 mL / g, and the average pore diameter is 7.9 nm. Was hardly recognized.
〔実施例11〕
硝酸ニッケル6水和物145gに代えて硝酸ニッケル218g、純水552mLに代えて純水704mLを用いた以外は実施例10と同様にして、ケイ素を74.1モル%、アルミニウムを7.4モル%、ニッケルを11.1モル%、マグネシウムを7.4モル%含むシリカ系材料を得た。Ni(X)/Alの組成比はモル基準で1.5、Ni(X)/Mg(B)の組成比はモル基準で1.5であった。窒素吸着法による比表面積は100m2/g、細孔容積は0.20mL/g、平均細孔径は8.2nmであった。嵩密度は0.95CBD、耐摩耗性は0.1質量%であった。平均粒子径は、レーザー・散乱法粒度分布測定による結果から、63μmであった。また、走査型電子顕微鏡(SEM)による観察から、シリカ系材料に割れや欠けもなく、形状はほぼ球状であった。
Example 11
74.1 mol% of silicon and 7.4 mol of aluminum were the same as in Example 10 except that 218 g of nickel nitrate was used instead of 145 g of nickel nitrate hexahydrate and 704 mL of pure water was used instead of 552 mL of pure water. %, A silica-based material containing 11.1 mol% nickel and 7.4 mol% magnesium. The composition ratio of Ni (X) / Al was 1.5 on a molar basis, and the composition ratio of Ni (X) / Mg (B) was 1.5 on a molar basis. The specific surface area determined by the nitrogen adsorption method was 100 m 2 / g, the pore volume was 0.20 mL / g, and the average pore diameter was 8.2 nm. The bulk density was 0.95 CBD, and the wear resistance was 0.1% by mass. The average particle size was 63 μm from the result of measurement by laser / scattering particle size distribution measurement. Further, from observation with a scanning electron microscope (SEM), the silica-based material was not cracked or chipped, and the shape was almost spherical.
次に、上記のようにして得られたシリカ系材料の耐酸性及び塩基性を評価するために、実施例1と同様の方法によりpHスイング試験を行った。その結果、pHスイング処理後のシリカ系材料の比表面積は99m2/g、細孔容積は0.20mL/g、平均細孔径は8.3nmであり、pHスイング処理によるシリカ系材料の構造変化はほとんど認められなかった。 Next, in order to evaluate the acid resistance and basicity of the silica-based material obtained as described above, a pH swing test was performed by the same method as in Example 1. As a result, the specific surface area of the silica-based material after the pH swing treatment was 99 m 2 / g, the pore volume was 0.20 mL / g, and the average pore diameter was 8.3 nm. Was hardly recognized.
〔実施例12〕
実施例9で得られたシリカ系材料30gを、ガラス容器内に入れた蒸留水100mLに添加し、60℃で攪拌しながら、所定量の塩化パラジウム水溶液を滴下し、さらに0.5N水酸化ナトリウム水溶液を添加して、上記水溶液のpHを8に調整した。そのまま1時間攪拌を続けた後、混合液を静置して上澄みを除去し、さらにClイオンが検出されなくなるまで蒸留水で洗浄した固形物を105℃で16時間乾燥した後、空気中300℃で5時間焼成した。次いで、得られた固形物に対して、水素雰囲気中で400℃、3時間の還元処理を行うことにより、パラジウム2.4質量%を担持した貴金属担持物を得た。
Example 12
30 g of the silica-based material obtained in Example 9 was added to 100 mL of distilled water placed in a glass container, and while stirring at 60 ° C., a predetermined amount of palladium chloride aqueous solution was dropped, and 0.5 N sodium hydroxide was further added. An aqueous solution was added to adjust the pH of the aqueous solution to 8. After stirring for 1 hour, the mixture was allowed to stand to remove the supernatant, and the solid washed with distilled water until no Cl ions were detected was dried at 105 ° C. for 16 hours, and then 300 ° C. in air. For 5 hours. Next, the obtained solid was subjected to reduction treatment at 400 ° C. for 3 hours in a hydrogen atmosphere to obtain a noble metal-supported product supporting 2.4% by mass of palladium.
この貴金属担持物について、窒素吸着法による比表面積は247m2/g、細孔容積は0.26mL/g、平均細孔径は4.0nmであった。得られた貴金属担持物の平均粒子径は、レーザー・散乱法粒度分布測定による結果から、62μmであった。走査型電子顕微鏡(SEM)による観察から、貴金属担持物に割れや欠けはなく、形状はほぼ球状であった。
また、この貴金属担持物の形態を透過型電子顕微鏡(TEM)で観察したところ、粒子4〜5nmに極大分布(数平均粒子径:4.3nm(算出個数:100))を有するパラジウム粒子が担体としてのシリカ系材料に担持されていることが確認された。
This noble metal support had a specific surface area of 247 m 2 / g, a pore volume of 0.26 mL / g, and an average pore diameter of 4.0 nm as determined by the nitrogen adsorption method. The average particle size of the obtained noble metal-supported product was 62 μm from the result of measurement by laser / scattering particle size distribution measurement. From observation with a scanning electron microscope (SEM), the noble metal support was not cracked or chipped, and the shape was almost spherical.
Further, when the form of the noble metal support was observed with a transmission electron microscope (TEM), palladium particles having a maximum distribution (number average particle diameter: 4.3 nm (calculated number: 100)) in the particles of 4 to 5 nm were supported. It was confirmed that it was supported on a silica-based material.
次に、上記のようにして得られた貴金属担持物の耐酸性及び塩基性を評価するために、実施例1と同様の方法によりpHスイング試験を行った。その結果、pHスイング処理後の貴金属担持物の比表面積は245m2/g、細孔容積は0.26mL/g、平均細孔径は4.1nmであり、pHスイング処理による構造変化は認められなかった。また、透過型電子顕微鏡(TEM)によるパラジウム粒子の平均粒子径は4.4nm(算出個数:100)であり、パラジウム粒子のシンタリングはほとんど観察されなかった。 Next, in order to evaluate the acid resistance and basicity of the noble metal support obtained as described above, a pH swing test was performed in the same manner as in Example 1. As a result, the specific surface area of the noble metal support after the pH swing treatment was 245 m 2 / g, the pore volume was 0.26 mL / g, the average pore diameter was 4.1 nm, and no structural change was observed due to the pH swing treatment. It was. Moreover, the average particle diameter of the palladium particle | grains by a transmission electron microscope (TEM) is 4.4 nm (calculation number: 100), and the sintering of palladium particle | grains was hardly observed.
〔実施例13〕
実施例4で得られたシリカ系材料30gを、ガラス容器内に入れた蒸留水100mLに添加し、80℃で攪拌しながら、所定量の塩化ルテニウム水溶液を滴下し、さらに0.5N水酸化ナトリウム水溶液を添加して、上記水溶液のpHを8に調整した。そのまま1時間攪拌を続けた後、混合液を静置して上澄みを除去し、さらにClイオンが検出されなくなるまで蒸留水で洗浄した固形物を105℃で16時間乾燥した後、空気中300℃で3時間焼成した。次いで、得られた固形物に対して、水素雰囲気中で350℃、3時間の還元処理を行うことにより、ルテニウム2.1質量%を担持した貴金属担持物を得た。
Example 13
30 g of the silica-based material obtained in Example 4 was added to 100 mL of distilled water placed in a glass container, and while stirring at 80 ° C., a predetermined amount of an aqueous ruthenium chloride solution was added dropwise, and 0.5 N sodium hydroxide was further added. An aqueous solution was added to adjust the pH of the aqueous solution to 8. After stirring for 1 hour, the mixture was allowed to stand to remove the supernatant, and the solid washed with distilled water until no Cl ions were detected was dried at 105 ° C. for 16 hours, and then 300 ° C. in air. For 3 hours. Next, the obtained solid was subjected to a reduction treatment at 350 ° C. for 3 hours in a hydrogen atmosphere to obtain a noble metal-supported product supporting 2.1% by mass of ruthenium.
この貴金属担持物について、窒素吸着法による比表面積は241m2/g、細孔容積は0.27mL/g、平均細孔径は3.9nmであった。得られた貴金属担持物の平均粒子径は、レーザー・散乱法粒度分布測定による結果から、62μmであった。走査型電子顕微鏡(SEM)による観察から、貴金属担持物に割れや欠けはなく、形状はほぼ球状であった。
また、この貴金属担持物の形態を透過型電子顕微鏡(TEM)で観察したところ、粒子4〜5nmに極大分布(数平均粒子径:4.4nm(算出個数:100))を有するルテニウム粒子が担体としてのシリカ系材料に担持されていることが確認された。
The noble metal support had a specific surface area of 241 m 2 / g, a pore volume of 0.27 mL / g, and an average pore diameter of 3.9 nm according to the nitrogen adsorption method. The average particle size of the obtained noble metal-supported product was 62 μm from the result of measurement by laser / scattering particle size distribution measurement. From observation with a scanning electron microscope (SEM), the noble metal support was not cracked or chipped, and the shape was almost spherical.
Further, when the form of the noble metal support was observed with a transmission electron microscope (TEM), ruthenium particles having a maximum distribution (number average particle diameter: 4.4 nm (calculated number: 100)) in the particles of 4 to 5 nm were supported. It was confirmed that it was supported on a silica-based material.
次に、上記のようにして得られた貴金属担持物の耐酸性及び塩基性を評価するために、実施例1と同様の方法によりpHスイング試験を行った。その結果、pHスイング処理後の貴金属担持物の比表面積は240m2/g、細孔容積は0.26mL/g、平均細孔径は4.2nmであり、pHスイング処理による構造変化は認められなかった。また、透過型電子顕微鏡(TEM)によるルテニウム粒子の平均粒子径は4.7nm(算出個数:100)であり、ルテニウム粒子のシンタリングはほとんど観察されなかった。 Next, in order to evaluate the acid resistance and basicity of the noble metal support obtained as described above, a pH swing test was performed in the same manner as in Example 1. As a result, the specific surface area of the noble metal support after the pH swing treatment was 240 m 2 / g, the pore volume was 0.26 mL / g, the average pore diameter was 4.2 nm, and no structural change was observed due to the pH swing treatment. It was. Further, the average particle diameter of ruthenium particles by a transmission electron microscope (TEM) was 4.7 nm (calculated number: 100), and almost no sintering of ruthenium particles was observed.
〔実施例14〕
実施例2で得られたシリカ系材料30gを、ガラス容器内に入れた蒸留水100mLに添加し、80℃で攪拌しながら、所定量の塩化金酸水溶液を滴下し、さらに0.5N水酸化ナトリウム水溶液を添加して、上記水溶液のpHを8に調整した。そのまま1時間攪拌を続けた後、混合液を静置して上澄みを除去し、さらにClイオンが検出されなくなるまで蒸留水で洗浄した固形物を105℃で16時間乾燥した後、空気中400℃で3時間焼成を行うことにより、金1.8質量%を担持した貴金属担持物を得た。
Example 14
30 g of the silica-based material obtained in Example 2 was added to 100 mL of distilled water in a glass container, and a predetermined amount of chloroauric acid aqueous solution was added dropwise with stirring at 80 ° C. An aqueous sodium solution was added to adjust the pH of the aqueous solution to 8. After stirring for 1 hour, the mixture was allowed to stand to remove the supernatant, and the solid washed with distilled water until no Cl ions were detected was dried at 105 ° C. for 16 hours, and then 400 ° C. in air. Was carried out for 3 hours to obtain a precious metal-carrying product carrying 1.8% by mass of gold.
この貴金属担持物について、窒素吸着法による比表面積は175m2/g、細孔容積は0.27mL/g、平均細孔径は4.0nmであった。得られた貴金属担持物の平均粒子径は、レーザー・散乱法粒度分布測定による結果から、62μmであった。走査型電子顕微鏡(SEM)による観察から、貴金属担持物に割れや欠けはなく、形状はほぼ球状であった。
また、この貴金属担持物の形態を透過型電子顕微鏡(TEM)で観察したところ、粒子3〜4nmに極大分布(数平均粒子径:3.5nm(算出個数:100))を有する金粒子が担体としてのシリカ系材料に担持されていることが確認された。
The noble metal support had a specific surface area of 175 m 2 / g, a pore volume of 0.27 mL / g, and an average pore diameter of 4.0 nm as determined by the nitrogen adsorption method. The average particle size of the obtained noble metal-supported product was 62 μm from the result of measurement by laser / scattering particle size distribution measurement. From observation with a scanning electron microscope (SEM), the noble metal support was not cracked or chipped, and the shape was almost spherical.
Further, when the form of the noble metal-supported material was observed with a transmission electron microscope (TEM), gold particles having a maximum distribution (number average particle diameter: 3.5 nm (calculated number: 100)) in the particles of 3 to 4 nm were supported. It was confirmed that it was supported on a silica-based material.
次に、上記のようにして得られた貴金属担持物の耐酸性及び塩基性を評価するために、実施例1と同様の方法によりpHスイング試験を行った。その結果、pHスイング処理後の貴金属担持物の比表面積は173m2/g、細孔容積は0.26mL/g、平均細孔径は4.5nmであり、pHスイング処理による構造変化はほとんど認められなかった。また、透過型電子顕微鏡(TEM)による金粒子の平均粒子径は3.9nm(算出個数:100)であり、金粒子のシンタリングはほとんど観察されなかった。 Next, in order to evaluate the acid resistance and basicity of the noble metal support obtained as described above, a pH swing test was performed in the same manner as in Example 1. As a result, the specific surface area of the noble metal support after the pH swing treatment was 173 m 2 / g, the pore volume was 0.26 mL / g, the average pore diameter was 4.5 nm, and almost no structural change was observed due to the pH swing treatment. There wasn't. Moreover, the average particle diameter of the gold particles by a transmission electron microscope (TEM) was 3.9 nm (calculated number: 100), and almost no sintering of the gold particles was observed.
表1に、実施例1〜11のシリカ系材料及び実施例12〜14の貴金属担持物の物性を示す。 Table 1 shows the physical properties of the silica-based materials of Examples 1 to 11 and the noble metal support of Examples 12 to 14.
〔比較例1〕
原料としてシリカゾル溶液を日産化学社製、商品名「スノーテックスN−30」から同社製、商品名「スノーテックスN−40」(SiO2含有量:40質量%)に代え、硝酸アルミニウム、硝酸ニッケル、硝酸マグネシウムを添加せずにシリカ単独の組成にした以外は実施例1と同様にして、スプレードライヤー装置による混合スラリーの噴霧乾燥まで行い固形物を得た。次に、得られた固形物をロータリーキルンで室温から300℃まで2時間かけて昇温後、300℃で1時間保持した。さらに600℃まで2時間で昇温後、600℃で1時間保持して焼成した。その後、徐冷して、シリカを得た。
窒素吸着法による比表面積は215m2/g、細孔容積は0.26mL/g、平均細孔径は5.5nmであった。嵩密度は0.55CBD、耐摩耗性は3.3質量%であった。平均粒子径は、レーザー・散乱法粒度分布測定による結果から、66μmであった。また、走査型電子顕微鏡(SEM)による観察から、シリカに割れや欠けが認められた。シリカの形状はほぼ球状であった。固体形態について、粉末X線回折(XRD)の結果から、非晶質パターンが得られた。
次に、上記のようにして得られたシリカの耐酸性及び塩基性を評価するために、実施例1と同様の方法によりpHスイング試験を行った。その結果、pHスイング処理後のシリカの比表面積は198m2/g、細孔容積は0.27mL/g、平均細孔径は9.8nmであり、pHスイング処理による構造変化が認められた。
[Comparative Example 1]
Silica sol solution as a raw material is made by Nissan Chemical Co., Ltd., trade name “Snowtex N-30”, made by the company, trade name “Snowtex N-40” (SiO 2 content: 40 mass%), aluminum nitrate, nickel nitrate A solid was obtained in the same manner as in Example 1 except that the composition of the silica alone was not added without adding magnesium nitrate until the mixed slurry was spray-dried with a spray dryer. Next, the obtained solid was heated from room temperature to 300 ° C. with a rotary kiln over 2 hours and then held at 300 ° C. for 1 hour. Further, the temperature was raised to 600 ° C. in 2 hours, and then calcined by holding at 600 ° C. for 1 hour. Thereafter, it was gradually cooled to obtain silica.
The specific surface area determined by the nitrogen adsorption method was 215 m 2 / g, the pore volume was 0.26 mL / g, and the average pore diameter was 5.5 nm. The bulk density was 0.55 CBD, and the wear resistance was 3.3% by mass. The average particle diameter was 66 μm from the result of measurement by laser / scattering particle size distribution measurement. Moreover, from the observation with a scanning electron microscope (SEM), the silica was cracked or chipped. The shape of silica was almost spherical. For the solid form, an amorphous pattern was obtained from the results of powder X-ray diffraction (XRD).
Next, in order to evaluate the acid resistance and basicity of the silica obtained as described above, a pH swing test was performed in the same manner as in Example 1. As a result, the specific surface area of the silica after the pH swing treatment was 198 m 2 / g, the pore volume was 0.27 mL / g, the average pore diameter was 9.8 nm, and structural changes due to the pH swing treatment were observed.
〔比較例2〕
硝酸ニッケル、硝酸マグネシウムを用いなかった以外は、実施例1と同様にして、ケイ素を93.0モル%、アルミニウムを7.0モル%含むシリカ−アルミナ組成物を得た。窒素吸着法による比表面積は220m2/g、細孔容積は0.30mL/g、平均細孔径は5.2nmであった。嵩密度は0.94CBD、耐摩耗性は0.2質量%であった。シリカ−アルミナ組成物の平均粒子径は、レーザー・散乱法粒度分布測定による結果から、62μmであった。また、走査型電子顕微鏡(SEM)による観察から、シリカ−アルミナ組成物に割れや欠けはなく、形状はほぼ球状であった。固体形態について、粉末X線回折(XRD)の結果から、非晶質パターンが得られた。
[Comparative Example 2]
A silica-alumina composition containing 93.0 mol% silicon and 7.0 mol% aluminum was obtained in the same manner as in Example 1 except that nickel nitrate and magnesium nitrate were not used. The specific surface area determined by the nitrogen adsorption method was 220 m 2 / g, the pore volume was 0.30 mL / g, and the average pore diameter was 5.2 nm. The bulk density was 0.94 CBD, and the wear resistance was 0.2% by mass. The average particle size of the silica-alumina composition was 62 μm based on the results of laser / scattering particle size distribution measurement. Moreover, from the observation with a scanning electron microscope (SEM), the silica-alumina composition was not cracked or chipped, and the shape was almost spherical. For the solid form, an amorphous pattern was obtained from the results of powder X-ray diffraction (XRD).
次に、上記のようにして得られたシリカ−アルミナの耐酸性及び塩基性を評価するために、実施例1と同様の方法によりpHスイング試験を行った。その結果、pHスイング処理後のシリカ−アルミナ組成物の比表面積は210m2/g、細孔容積は0.32mL/g、平均細孔径は9.5nmであり、pHスイング処理による構造変化が認められた。 Next, in order to evaluate the acid resistance and basicity of the silica-alumina obtained as described above, a pH swing test was performed in the same manner as in Example 1. As a result, the specific surface area of the silica-alumina composition after the pH swing treatment was 210 m 2 / g, the pore volume was 0.32 mL / g, the average pore diameter was 9.5 nm, and structural changes due to the pH swing treatment were observed. It was.
〔比較例3〕
硝酸ニッケルを用いなかった以外は、実施例1と同様の方法にして、ケイ素を86.5モル%、アルミニウムを6.9モル%、マグネシウムを6.6モル%含むシリカ−アルミナ−マグネシア組成物を得た。窒素吸着法による比表面積は213m2/g、細孔容積は0.27mL/g、平均細孔径は5.1nmであった。嵩密度は0.96CBD、耐摩耗性は0.1質量%であった。シリカ−アルミナ−マグネシア組成物の平均粒子径は、レーザー・散乱法粒度分布測定による結果から、62μmであった。また、走査型電子顕微鏡(SEM)による観察から、シリカ−アルミナ−マグネシア組成物に割れや欠けはなく、形状はほぼ球状であった。固体形態について、粉末X線回折(XRD)の結果から、シリカゲルと同様の非晶質パターンが得られた。
[Comparative Example 3]
A silica-alumina-magnesia composition containing 86.5 mol% silicon, 6.9 mol% aluminum, and 6.6 mol% magnesium in the same manner as in Example 1 except that nickel nitrate was not used. Got. The specific surface area determined by the nitrogen adsorption method was 213 m 2 / g, the pore volume was 0.27 mL / g, and the average pore diameter was 5.1 nm. The bulk density was 0.96 CBD, and the wear resistance was 0.1% by mass. The average particle size of the silica-alumina-magnesia composition was 62 μm from the result of laser / scattering particle size distribution measurement. Further, from the observation with a scanning electron microscope (SEM), the silica-alumina-magnesia composition had no cracks or chips, and the shape was almost spherical. As for the solid form, an amorphous pattern similar to that of silica gel was obtained from the results of powder X-ray diffraction (XRD).
次に、上記のようにして得られたシリカ−アルミナ−マグネシア組成物の耐酸性及び塩基性を評価するために、実施例1と同様の方法によりpHスイング試験を行った。その結果、pHスイング処理後のシリカ−アルミナ−マグネシアの比表面積は204m2/g、細孔容積は0.26mL/g、平均細孔径は8.5nmであり、pHスイング処理による構造変化が認められた。 Next, in order to evaluate the acid resistance and basicity of the silica-alumina-magnesia composition obtained as described above, a pH swing test was conducted by the same method as in Example 1. As a result, the specific surface area of silica-alumina-magnesia after the pH swing treatment was 204 m 2 / g, the pore volume was 0.26 mL / g, the average pore diameter was 8.5 nm, and structural changes due to the pH swing treatment were observed. It was.
〔比較例4〕
硝酸アルミニウム9水和物1.5kgに代えて硝酸アルミニウム9水和物2.3kg、硝酸ニッケル6水和物0.24kgに代えて硝酸ニッケル6水和物0.37kg、硝酸マグネシウム6水和物0.98kgに代えて硝酸マグネシウム6水和物0.21kg、シリカゾル溶液(日産化学社製、商品名「スノーテックスN−30」、SiO2含有量:30質量%)10.0kgに代えてそのシリカゾル溶液1.0kgを用いた以外は、実施例1と同様にして、ケイ素を37.3モル%、アルミニウムを46.2モル%、ニッケルを10.1モル%、マグネシウムを6.5モル%含むシリカ−アルミナ−酸化ニッケル−マグネシア組成物を得た。Ni(X)/Alの組成比はモル基準で0.22、Ni(X)/Mg(B)の組成比はモル基準で1.56であった。窒素吸着法による比表面積は195m2/g、細孔容積は0.3mL/g、平均細孔径は5.3nmであった。嵩密度は0.85CBD、耐摩耗性は0.5質量%であった。平均粒子径は、レーザー・散乱法粒度分布測定による結果から、64μmであった。また、走査型電子顕微鏡(SEM)による観察から、シリカ−アルミナ−酸化ニッケル−マグネシア組成物に割れや欠けが認められた。形状はほぼ球状であった。固体形態について、粉末X線回折(XRD)の結果から、アルミナに由来する結晶パターンが得られた。
[Comparative Example 4]
Instead of aluminum nitrate nonahydrate 1.5 kg, aluminum nitrate nonahydrate 2.3 kg, nickel nitrate hexahydrate 0.24 kg instead of nickel nitrate hexahydrate 0.37 kg, magnesium nitrate hexahydrate Instead of 0.98 kg, magnesium nitrate hexahydrate 0.21 kg, silica sol solution (trade name “Snowtex N-30”, manufactured by Nissan Chemical Co., Ltd., SiO 2 content: 30% by mass) instead of 10.0 kg Except that 1.0 kg of silica sol solution was used, 37.3 mol% silicon, 46.2 mol% aluminum, 10.1 mol% nickel, and 6.5 mol% magnesium were the same as in Example 1. A silica-alumina-nickel oxide-magnesia composition was obtained. The composition ratio of Ni (X) / Al was 0.22 on a molar basis, and the composition ratio of Ni (X) / Mg (B) was 1.56 on a molar basis. The specific surface area determined by the nitrogen adsorption method was 195 m 2 / g, the pore volume was 0.3 mL / g, and the average pore diameter was 5.3 nm. The bulk density was 0.85 CBD, and the wear resistance was 0.5% by mass. The average particle diameter was 64 μm from the result of measurement by laser / scattering particle size distribution measurement. Moreover, from the observation with a scanning electron microscope (SEM), the silica-alumina-nickel oxide-magnesia composition was found to be cracked or chipped. The shape was almost spherical. About the solid form, the crystal pattern derived from an alumina was obtained from the result of the powder X-ray diffraction (XRD).
次に、上記のようにして得られたシリカ−アルミナ−酸化ニッケル−マグネシア組成物の耐酸性及び塩基性を評価するために、実施例1と同様の方法によりpHスイング試験を行った。その結果、pHスイング処理後のシリカ−アルミナ−酸化ニッケル−マグネシア組成物の比表面積は180m2/g、細孔容積は0.29mL/g、平均細孔径は8.7nmであり、pHスイング処理による構造変化が認められた。 Next, in order to evaluate the acid resistance and basicity of the silica-alumina-nickel oxide-magnesia composition obtained as described above, a pH swing test was performed in the same manner as in Example 1. As a result, the specific surface area of the silica-alumina-nickel oxide-magnesia composition after the pH swing treatment was 180 m 2 / g, the pore volume was 0.29 mL / g, and the average pore diameter was 8.7 nm. A structural change was observed.
〔比較例5〕
硝酸アルミニウム9水和物1.5kgに代えて硝酸アルミニウム9水和物1.0kg、硝酸ニッケル6水和物0.24kgに代えて硝酸ニッケル6水和物0.05kg、硝酸マグネシウム6水和物0.98kgに代えて硝酸マグネシウム6水和物0.23kgを用いた以外は、実施例1と同様にして、ケイ素を93.1モル%、アルミニウムを5.0モル%、ニッケルを0.3モル%、マグネシウムを1.6モル%含むシリカ−アルミナ−酸化ニッケル−マグネシア組成物を得た。Ni(X)/Alの組成比はモル基準で0.07、Ni(X)/Mg(B)の組成比はモル基準で0.22であった。窒素吸着法による比表面積は210m2/g、細孔容積は0.27mL/g、平均細孔径は5.4nmであった。嵩密度は0.9CBD、耐摩耗性は2.0質量%であった。平均粒子径は、レーザー・散乱法粒度分布測定による結果から、65μmであった。また、走査型電子顕微鏡(SEM)による観察から、シリカ−アルミナ−酸化ニッケル−マグネシア組成物に割れや欠けが認められた。形状はほぼ球状であった。固体形態について、粉末X線回折(XRD)の結果から、シリカゲルと同様の非晶質パターンが得られた。
[Comparative Example 5]
Instead of aluminum nitrate 9 hydrate 1.5 kg, aluminum nitrate 9 hydrate 1.0 kg, nickel nitrate hexahydrate 0.24 kg, nickel nitrate hexahydrate 0.05 kg, magnesium nitrate hexahydrate Except that 0.28 kg of magnesium nitrate hexahydrate was used instead of 0.98 kg, 93.1 mol% silicon, 5.0 mol% aluminum, 0.3 wt% nickel were obtained in the same manner as in Example 1. A silica-alumina-nickel oxide-magnesia composition containing mol% and 1.6 mol% magnesium was obtained. The composition ratio of Ni (X) / Al was 0.07 on a molar basis, and the composition ratio of Ni (X) / Mg (B) was 0.22 on a molar basis. The specific surface area determined by the nitrogen adsorption method was 210 m 2 / g, the pore volume was 0.27 mL / g, and the average pore diameter was 5.4 nm. The bulk density was 0.9 CBD, and the wear resistance was 2.0 mass%. The average particle diameter was 65 μm from the result of measurement by laser / scattering particle size distribution measurement. Moreover, from the observation with a scanning electron microscope (SEM), the silica-alumina-nickel oxide-magnesia composition was found to be cracked or chipped. The shape was almost spherical. As for the solid form, an amorphous pattern similar to that of silica gel was obtained from the results of powder X-ray diffraction (XRD).
次に、上記のようにして得られたシリカ−アルミナ−酸化ニッケル−マグネシア組成物の耐酸性及び塩基性を評価するために、実施例1と同様の方法によりpHスイング試験を行った。その結果、pHスイング処理後のシリカ−アルミナ−酸化ニッケル−マグネシア組成物の比表面積は195m2/g、細孔容積は0.27mL/g、平均細孔径は8.5nmであり、pHスイング処理による構造変化が認められた。 Next, in order to evaluate the acid resistance and basicity of the silica-alumina-nickel oxide-magnesia composition obtained as described above, a pH swing test was performed in the same manner as in Example 1. As a result, the specific surface area of the silica-alumina-nickel oxide-magnesia composition after the pH swing treatment was 195 m 2 / g, the pore volume was 0.27 mL / g, and the average pore diameter was 8.5 nm. A structural change was observed.
〔比較例6〕
硝酸ニッケル6水和物0.24kgに代えて硝酸マンガン6水和物0.24kgを用いた以外は、実施例1と同様にして、ケイ素を85.3モル%、アルミニウムを6.8モル%、マンガンを1.4モル%、マグネシウムを6.5モル%含むシリカ−アルミナ−酸化マンガン−マグネシア組成物を得た。窒素吸着法による比表面積は220m2/g、細孔容積は0.27mL/g、平均細孔径は5.1nmであった。嵩密度は0.98CBD、耐摩耗性は0.1質量%であった。平均粒子径は、レーザー・散乱法粒度分布測定による結果から、62μmであった。また、走査型電子顕微鏡(SEM)による観察から、形状はほぼ球状であった。固体形態について、粉末X線回折(XRD)の結果から、シリカゲルと同様の非晶質パターンが得られた。
[Comparative Example 6]
Except that 0.24 kg of manganese nitrate hexahydrate was used instead of 0.24 kg of nickel nitrate hexahydrate, 85.3 mol% of silicon and 6.8 mol% of aluminum were obtained in the same manner as in Example 1. A silica-alumina-manganese oxide-magnesia composition containing 1.4 mol% manganese and 6.5 mol% magnesium was obtained. The specific surface area determined by the nitrogen adsorption method was 220 m 2 / g, the pore volume was 0.27 mL / g, and the average pore diameter was 5.1 nm. The bulk density was 0.98 CBD, and the wear resistance was 0.1% by mass. The average particle diameter was 62 μm from the result of measurement by laser / scattering particle size distribution measurement. Moreover, the shape was substantially spherical from the observation with a scanning electron microscope (SEM). As for the solid form, an amorphous pattern similar to that of silica gel was obtained from the results of powder X-ray diffraction (XRD).
次に、上記のようにして得られたシリカ−アルミナ−酸化マンガン−マグネシア組成物の耐酸性及び塩基性を評価するために、実施例1と同様の方法によりpHスイング試験を行った。その結果、pHスイング処理後のシリカ−アルミナ−酸化マンガン−マグネシア組成物の比表面積は210m2/g、細孔容積は0.27mL/g、平均細孔径は8.1nmであり、pHスイング処理による構造変化が認められた。 Next, in order to evaluate the acid resistance and basicity of the silica-alumina-manganese oxide-magnesia composition obtained as described above, a pH swing test was performed in the same manner as in Example 1. As a result, the specific surface area of the silica-alumina-manganese oxide-magnesia composition after the pH swing treatment was 210 m 2 / g, the pore volume was 0.27 mL / g, and the average pore diameter was 8.1 nm. A structural change was observed.
〔比較例7〕
硝酸ニッケルを用いなかった以外は実施例12と同様にして、シリカ−アルミナ−マグネシア組成物にパラジウムが担持された貴金属担持物を得た。得られた貴金属担持物は、ケイ素とアルミニウムとマグネシウムの合計モル量に対して、ケイ素を81.7モル%、アルミニウムを8.8モル%、マグネシウムを9.5モル%含んでいた。パラジウムの担持量は2.1質量%であった。
[Comparative Example 7]
A noble metal-supported product in which palladium was supported on a silica-alumina-magnesia composition was obtained in the same manner as in Example 12 except that nickel nitrate was not used. The obtained noble metal support contained 81.7 mol% silicon, 8.8 mol% aluminum, and 9.5 mol% magnesium with respect to the total molar amount of silicon, aluminum, and magnesium. The supported amount of palladium was 2.1% by mass.
窒素吸着法による比表面積は243m2/g、細孔容積は0.27mL/g、平均細孔径は4.1nmであった。この貴金属担持物の平均粒子径は、レーザー・散乱法粒度分布測定による結果から、62μmであった。また、走査型電子顕微鏡(SEM)による観察から、貴金属担持物に割れや欠けはなく、形状はほぼ球状であった。
また、この貴金属担持物の形態を透過型電子顕微鏡(TEM)で観察したところ、粒子4〜5nmに極大分布(数平均粒子径:4.2nm(算出個数:100))を有するパラジウム粒子が担体に担持されていることが確認された。
The specific surface area determined by the nitrogen adsorption method was 243 m 2 / g, the pore volume was 0.27 mL / g, and the average pore diameter was 4.1 nm. The average particle size of this noble metal-supported product was 62 μm from the results of laser / scattering particle size distribution measurement. Further, from observation with a scanning electron microscope (SEM), the noble metal support was not cracked or chipped, and the shape was almost spherical.
Further, when the form of the noble metal support was observed with a transmission electron microscope (TEM), palladium particles having a maximum distribution (number average particle diameter: 4.2 nm (calculated number: 100)) in the particles of 4 to 5 nm were supported. It was confirmed that it was supported on the surface.
次に、上記で得られた貴金属担持物の耐酸性及び塩基性を評価するために、実施例1と同様の方法によりpHスイング試験を行った。その結果、pHスイング処理後の金属担持物の比表面積は224m2/g、細孔容積は0.28mL/g、平均細孔径は8.4nmであり、pHスイング処理による構造変化が認められた。また、透過型電子顕微鏡(TEM)による複合粒子の平均粒子径は6.7nm(算出個数:100)であり、貴金属担持物の細孔径の拡大とともにパラジウム粒子のシンタリングが観察された。 Next, in order to evaluate the acid resistance and basicity of the noble metal support obtained above, a pH swing test was performed by the same method as in Example 1. As a result, the specific surface area of the metal support after the pH swing treatment was 224 m 2 / g, the pore volume was 0.28 mL / g, the average pore diameter was 8.4 nm, and structural changes due to the pH swing treatment were observed. . Moreover, the average particle diameter of the composite particles by a transmission electron microscope (TEM) was 6.7 nm (calculated number: 100), and sintering of palladium particles was observed as the pore diameter of the noble metal support increased.
〔実施例15〕
実施例1のシリカ系材料300gを、蒸留水1Lを入れたガラス容器に添加し、60℃で撹拌しながら、所定量の塩化金酸水溶液を素早く滴下した。次いで、0.5N水酸化ナトリウム水溶液を更に添加して上記水溶液のpHを8に調整し、そのまま1時間攪拌を続けた。その後、ガラス容器を静置してから上澄みを除去して沈殿物を回収し、その沈殿物をClイオンが検出されなくなるまで蒸留水で洗浄し、これを105℃で16時間乾燥した後、さらに空気中400℃で5時間焼成して、Auを2.0質量%担持した貴金属担持物(2%Au/Si−Al−Ni−Mg複合酸化物)を得た。
Example 15
300 g of the silica-based material of Example 1 was added to a glass container containing 1 L of distilled water, and a predetermined amount of aqueous chloroauric acid solution was quickly added dropwise while stirring at 60 ° C. Subsequently, 0.5N aqueous sodium hydroxide solution was further added to adjust the pH of the aqueous solution to 8, and the stirring was continued for 1 hour. Thereafter, the glass container is allowed to stand, and then the supernatant is removed to collect the precipitate. The precipitate is washed with distilled water until no Cl ions are detected, and is dried at 105 ° C. for 16 hours. Firing in air at 400 ° C. for 5 hours gave a noble metal-supported product (2% Au / Si—Al—Ni—Mg composite oxide) supporting 2.0% by mass of Au.
この貴金属担持物について、窒素吸着法による比表面積は242m2/g、細孔容積は0.27mL/g、平均細孔径は3.9nmであった。その平均粒子径は、レーザー・散乱法粒度分布測定による結果から、62μmであった。また、走査型電子顕微鏡(SEM)による観察から、貴金属担持物に割れや欠けはなく、形状はほぼ球状であった。 The noble metal support had a specific surface area of 242 m 2 / g, a pore volume of 0.27 mL / g, and an average pore diameter of 3.9 nm according to the nitrogen adsorption method. The average particle diameter was 62 μm from the result of measurement by laser / scattering particle size distribution measurement. Further, from observation with a scanning electron microscope (SEM), the noble metal support was not cracked or chipped, and the shape was almost spherical.
上記貴金属担持物の粉末X線回折(XRD)の結果によれば、Auに帰属される回折ピークが観察された。透過型電子顕微鏡(TEM)を用いて上記貴金属担持物の微細構造を観察したところ、粒子径2〜3nmのAu粒子が担体表面上に均一に担持されていた。Au粒子の数平均粒子径は3.1nmであった(算出個数:100)。 According to the powder X-ray diffraction (XRD) result of the noble metal-supported product, a diffraction peak attributed to Au was observed. When the fine structure of the above-mentioned noble metal support was observed using a transmission electron microscope (TEM), Au particles having a particle diameter of 2 to 3 nm were uniformly supported on the surface of the carrier. The number average particle diameter of Au particles was 3.1 nm (calculated number: 100).
次に、上記貴金属担持物の耐酸性及び塩基性を評価するために、実施例1と同様の方法によりpHスイング試験を行った。その結果、pHスイング処理後の貴金属担持物の比表面積は243m2/g、細孔容積は0.27mL/g、平均細孔径は3.9nmであり、pHスイング処理による貴金属担持物の構造変化は認められなかった。また、透過型電子顕微鏡(TEM/STEM)によるAu粒子の平均粒子径は3.2nm(算出個数:100)であり、Au粒子の粒子成長はほとんど観察されなかった。 Next, in order to evaluate the acid resistance and basicity of the noble metal support, a pH swing test was performed in the same manner as in Example 1. As a result, the specific surface area of the noble metal support after the pH swing treatment was 243 m 2 / g, the pore volume was 0.27 mL / g, and the average pore diameter was 3.9 nm. Was not recognized. Further, the average particle diameter of Au particles by a transmission electron microscope (TEM / STEM) was 3.2 nm (calculated number: 100), and almost no particle growth of Au particles was observed.
触媒として、上記貴金属担持物(2%Au/Si−Al−Ni−Mg複合酸化物)240gを、触媒分離器を備え、液相部が1.2リットルの攪拌型ステンレス製反応器に仕込んだ。その反応器中の攪拌羽の先端速度4m/秒の速度で内容物を攪拌しながら、アルデヒド及びアルコールからの酸化的カルボン酸エステルの生成反応を実施した。36.7質量%のメタクロレイン/メタノール溶液を0.6リットル/時間、1〜4質量%のNaOH/メタノール溶液を0.06リットル/時間で、それぞれ連続的に反応器に供給した。反応温度80℃、反応圧力0.5MPaで出口酸素濃度が4.0容量%(酸素分圧0.02MPa相当)となるように空気を吹き込み、反応系のpHが7となるように反応器に供給するNaOH濃度を調整した。反応生成物は、反応器出口からのオーバーフローラインにより連続的に抜き出し、ガスクロマトグラフィーでその組成を分析して反応性を調べた。 As a catalyst, 240 g of the above-mentioned noble metal support (2% Au / Si—Al—Ni—Mg composite oxide) was charged in a stirred stainless steel reactor equipped with a catalyst separator and having a liquid phase portion of 1.2 liters. . The content of the stirring blade in the reactor was stirred at a speed of 4 m / sec, and the oxidative carboxylic acid ester was formed from the aldehyde and alcohol. A 36.7% by weight methacrolein / methanol solution was continuously supplied to the reactor at 0.6 liter / hour, and a 1-4% by weight NaOH / methanol solution was continuously supplied to the reactor at 0.06 liter / hour. Air was blown into the reactor such that the reaction temperature was 80 ° C., the reaction pressure was 0.5 MPa, and the outlet oxygen concentration was 4.0 vol% (corresponding to an oxygen partial pressure of 0.02 MPa). The supplied NaOH concentration was adjusted. The reaction product was continuously extracted through an overflow line from the reactor outlet, and its composition was analyzed by gas chromatography to examine the reactivity.
反応開始から500時間経過時点のメタクロレイン転化率は45.8%、メタクリル酸メチルの選択率は87.5%、触媒の単位質量当たりのメタクリル酸メチルの生成活性は4.36mol/時間/kg−触媒であった。反応開始から1000時間経過時点のメタクロレイン転化率は45.5%、メタクリル酸メチルの選択率は87.4%、メタクリル酸メチルの生成活性は4.33mol/時間/kg−触媒であり、反応活性はほとんど変化しなかった。 The methacrolein conversion at the time of 500 hours from the start of the reaction was 45.8%, the methyl methacrylate selectivity was 87.5%, and the methyl methacrylate production activity per unit mass of the catalyst was 4.36 mol / hour / kg. -It was a catalyst. The methacrolein conversion rate after 1000 hours from the start of the reaction was 45.5%, the methyl methacrylate selectivity was 87.4%, and the methyl methacrylate production activity was 4.33 mol / hour / kg-catalyst. The activity hardly changed.
反応開始から1000時間経過後の触媒を抜き出し、走査型電子顕微鏡(SEM)で調べたところ触媒粒子に割れ、欠けはほとんど見られなかった。また、窒素吸着法による触媒の比表面積は243m2/g、細孔容積は0.27mL/g、平均細孔径は4.0nmであった。 When the catalyst was removed after 1000 hours from the start of the reaction and examined with a scanning electron microscope (SEM), the catalyst particles were hardly cracked or chipped. Further, the specific surface area of the catalyst as determined by the nitrogen adsorption method was 243 m 2 / g, the pore volume was 0.27 mL / g, and the average pore diameter was 4.0 nm.
次に、反応開始から1000時間経過後の触媒を透過型電子顕微鏡(TEM/STEM)で観察したところ、粒子径2〜3nmに極大分布(数平均粒子径:3.3nm)を有するナノ粒子が担体に担持されていることが確認され、Au粒子のシンタリングは観察されなかった。 Next, when the catalyst after 1000 hours from the start of the reaction was observed with a transmission electron microscope (TEM / STEM), nanoparticles having a maximum distribution (number average particle size: 3.3 nm) in a particle size of 2 to 3 nm were found. It was confirmed that it was supported on the carrier, and sintering of Au particles was not observed.
〔実施例16〕
実施例1で得られた担体300gを、ガラス容器に入れた蒸留水1Lに添加し、60℃で撹拌しながら、それぞれPd及びPbとして2.5質量%に相当する量の塩化パラジウムの希塩酸溶液及び硝酸鉛水溶液を素早く滴下した。その後、ガラス容器の内容物を1時間保持し、そこにヒドラジンを化学量論量の1.2倍添加して還元した。還元後の内容物からデカンテーションにより上澄みを除去して沈殿物を回収し、その沈殿物をClイオンが検出されなくなるまで蒸留水で洗浄し、さらに60℃で真空乾燥して、Pd、Pbを各々2.5質量%担持した貴金属担持物(PdPb/Si−Al−Ni−Mg複合酸化物)を得た。
Example 16
300 g of the carrier obtained in Example 1 was added to 1 L of distilled water in a glass container and stirred at 60 ° C., and diluted with hydrochloric acid in palladium chloride in an amount corresponding to 2.5% by mass as Pd and Pb, respectively. And the lead nitrate aqueous solution was dripped quickly. Thereafter, the contents of the glass container were held for 1 hour, and hydrazine was added to the stoichiometric amount 1.2 times and reduced. The supernatant is removed from the reduced contents by decantation, and the precipitate is recovered. The precipitate is washed with distilled water until no Cl ions are detected, and further dried at 60 ° C. under vacuum to remove Pd and Pb. A noble metal support (PdPb / Si—Al—Ni—Mg composite oxide) supported by 2.5% by mass was obtained.
この貴金属担持物について、窒素吸着法による比表面積は240m2/g、細孔容積は0.26mL/g、平均細孔径は4.0nmであった。その平均粒子径は、レーザー・散乱法粒度分布測定による結果から、62μmであった。また、走査型電子顕微鏡(SEM)による観察から、貴金属担持物に割れや欠けはなく、形状はほぼ球状であった。 The noble metal support had a specific surface area of 240 m 2 / g, a pore volume of 0.26 mL / g, and an average pore diameter of 4.0 nm as determined by the nitrogen adsorption method. The average particle diameter was 62 μm from the result of measurement by laser / scattering particle size distribution measurement. Further, from observation with a scanning electron microscope (SEM), the noble metal support was not cracked or chipped, and the shape was almost spherical.
上記貴金属担持物の粉末X線回折(XRD)の結果によれば、Pd3Pb1の金属間化合物に帰属される回折ピーク(2θ=38.6°、44.8°、65.4°、78.6°)が観察された。透過型電子顕微鏡(TEM)を用いて上記貴金属担持物の微細構造を観察したところ、粒子径5〜6nmのPdPb粒子が担体表面上に均一に担持されていた。PdPb粒子の数平均粒子径は5.5nmであった(算出個数:100)。 According to the result of powder X-ray diffraction (XRD) of the above-mentioned noble metal support, diffraction peaks (2θ = 38.6 °, 44.8 °, 65.4 °, 78.6) attributed to the intermetallic compound of Pd3Pb1. °) was observed. When the fine structure of the above-mentioned noble metal support was observed using a transmission electron microscope (TEM), PdPb particles having a particle diameter of 5 to 6 nm were uniformly supported on the support surface. The number average particle diameter of the PdPb particles was 5.5 nm (calculated number: 100).
次に、上記のようにして得られた貴金属担持物の化学的安定性を評価するために、実施例1と同様の方法によりpHスイング試験を行った。その結果、pHスイング処理後の貴金属担持物の比表面積は241m2/g、細孔容積は0.27mL/g、平均細孔径は4.0nmであり、pHスイング処理による構造変化は認められなかった。また、透過型電子顕微鏡(TEM)によるPdPb粒子の平均粒子径は5.1nm(算出個数:100)であり、PdPb粒子の粒子成長はほとんど観察されなかった。 Next, in order to evaluate the chemical stability of the noble metal support obtained as described above, a pH swing test was performed in the same manner as in Example 1. As a result, the specific surface area of the noble metal support after the pH swing treatment was 241 m 2 / g, the pore volume was 0.27 mL / g, the average pore diameter was 4.0 nm, and no structural change was observed due to the pH swing treatment. It was. Moreover, the average particle diameter of the PdPb particles by a transmission electron microscope (TEM) was 5.1 nm (calculated number: 100), and almost no particle growth of the PdPb particles was observed.
触媒として、上記で得られた貴金属担持物(PdPb/Si−Al−Ni−Mg複合酸化物)240gを用いた以外は、実施例15と同様にして、メタクロレインからメタクリル酸メチルを製造した。 Methyl methacrylate was produced from methacrolein in the same manner as in Example 15 except that 240 g of the noble metal support (PdPb / Si—Al—Ni—Mg composite oxide) obtained above was used as the catalyst.
反応開始から500時間経過時点のメタクロレイン転化率は44.2%、メタクリル酸メチルの選択率は91.5%、触媒の単位質量当たりのメタクリル酸メチルの生成活性は4.40mol/時間/kg−触媒であった。反応開始から1000時間経過時点のメタクロレイン転化率は44.6%、メタクリル酸メチルの選択率は91.3%、メタクリル酸メチルの生成活性は4.43mol/時間/kg−触媒であり、反応活性はほとんど変化しなかった。 The conversion rate of methacrolein after the elapse of 500 hours from the start of the reaction was 44.2%, the selectivity of methyl methacrylate was 91.5%, and the methyl methacrylate production activity per unit mass of the catalyst was 4.40 mol / hour / kg. -It was a catalyst. The methacrolein conversion rate after 1000 hours from the start of the reaction was 44.6%, the selectivity of methyl methacrylate was 91.3%, and the methyl methacrylate production activity was 4.43 mol / hour / kg-catalyst. The activity hardly changed.
反応開始から1000時間経過後の触媒を抜き出し、走査型電子顕微鏡(SEM)で調べたところ触媒粒子に割れ、欠けはほとんど見られなかった。また、窒素吸着法による触媒の比表面積は241m2/g、細孔容積は0.27mL/g、平均細孔径は4.1nmであった。 When the catalyst was removed after 1000 hours from the start of the reaction and examined with a scanning electron microscope (SEM), the catalyst particles were hardly cracked or chipped. Further, the specific surface area of the catalyst as determined by the nitrogen adsorption method was 241 m 2 / g, the pore volume was 0.27 mL / g, and the average pore diameter was 4.1 nm.
次に、反応開始から1000時間経過後の触媒を透過型電子顕微鏡(TEM/STEM)で観察したところ、粒子径5〜6nmに極大分布(数平均粒子径:5.2nm)を有するナノ粒子が担体に担持されていることが確認され、PdPb粒子のシンタリングは観察されなかった Next, the catalyst after 1000 hours from the start of the reaction was observed with a transmission electron microscope (TEM / STEM). As a result, nanoparticles having a maximum distribution (number average particle size: 5.2 nm) at a particle size of 5 to 6 nm were obtained. It was confirmed that it was supported on a carrier, and sintering of PdPb particles was not observed.
〔実施例17〕
触媒として、実施例14で得られた貴金属担持物(Au/Si−Al−Zn−K複合酸化物)240gを用いた以外は、実施例15と同様にして、メタクロレインからメタクリル酸メチルを製造した。
Example 17
Methyl methacrylate was produced from methacrolein in the same manner as in Example 15 except that 240 g of the noble metal support (Au / Si—Al—Zn—K composite oxide) obtained in Example 14 was used as the catalyst. did.
反応開始から500時間経過時点のメタクロレイン転化率は33.5%、メタクリル酸メチルの選択率は86.7%、触媒の単位質量当たりのメタクリル酸メチルの生成活性は3.16mol/時間/kg−触媒であった。反応開始から1000時間経過時点のメタクロレイン転化率は33.2%、メタクリル酸メチルの選択率は86.5%、メタクリル酸メチルの生成活性は3.12mol/時間/kg−触媒であり、反応活性はほとんど変化しなかった。 The conversion rate of methacrolein at the time when 500 hours had elapsed from the start of the reaction was 33.5%, the selectivity of methyl methacrylate was 86.7%, and the methyl methacrylate production activity per unit mass of the catalyst was 3.16 mol / hour / kg. -It was a catalyst. The methacrolein conversion rate after 1000 hours from the start of the reaction was 33.2%, the methyl methacrylate selectivity was 86.5%, and the methyl methacrylate production activity was 3.12 mol / hr / kg-catalyst. The activity hardly changed.
反応開始から1000時間経過後の触媒を抜き出し、走査型電子顕微鏡(SEM)で調べたところ触媒粒子に割れ、欠けはほとんど見られなかった。また、窒素吸着法による触媒の比表面積は171m2/g、細孔容積は0.26mL/g、平均細孔径は4.7nmであった。 When the catalyst was removed after 1000 hours from the start of the reaction and examined with a scanning electron microscope (SEM), the catalyst particles were hardly cracked or chipped. Further, the specific surface area of the catalyst as determined by the nitrogen adsorption method was 171 m 2 / g, the pore volume was 0.26 mL / g, and the average pore diameter was 4.7 nm.
次に、反応開始から1000時間経過後の触媒を透過型電子顕微鏡(TEM/STEM)で観察したところ、粒子径3〜4nmに極大分布(数平均粒子径:4.1nm)を有するナノ粒子が担体に担持されていることが確認され、Au粒子のシンタリングはほとんど観察されなかった。 Next, when the catalyst after 1000 hours from the start of the reaction was observed with a transmission electron microscope (TEM / STEM), nanoparticles having a maximum distribution (number average particle diameter: 4.1 nm) in a particle diameter of 3 to 4 nm were found. It was confirmed that it was supported on the carrier, and almost no sintering of Au particles was observed.
〔比較例8〕
担体を比較例3で得られたシリカ系材料に代えた以外は実施例15と同様にして、Auを2.0質量%担持した貴金属担持物(2%Au/SiO2−Al2O3−MgO)を得た。
[Comparative Example 8]
A noble metal support (2.0% Au / SiO 2 —Al 2 O 3 —) supporting 2.0% by mass of Au in the same manner as in Example 15 except that the support was replaced with the silica-based material obtained in Comparative Example 3. MgO) was obtained.
この貴金属担持物について、窒素吸着法による比表面積は232m2/g、細孔容積は0.28mL/g、平均細孔径は4.0nmであった。その平均粒子径は、レーザー・散乱法粒度分布測定による結果から、62μmであった。また、走査型電子顕微鏡(SEM)による観察から、貴金属担持物に割れや欠けはなく、形状はほぼ球状であった。 The noble metal support had a specific surface area of 232 m 2 / g, a pore volume of 0.28 mL / g, and an average pore diameter of 4.0 nm as determined by the nitrogen adsorption method. The average particle diameter was 62 μm from the result of measurement by laser / scattering particle size distribution measurement. Further, from observation with a scanning electron microscope (SEM), the noble metal support was not cracked or chipped, and the shape was almost spherical.
透過型電子顕微鏡(TEM)を用いて上記貴金属担持物の微細構造を観察したところ、粒子径3〜4nmのAu粒子が担体表面上に均一に担持されていた。Au粒子の数平均粒子径は3.4nmであった(算出個数:100)。 When the microstructure of the noble metal-supported material was observed using a transmission electron microscope (TEM), Au particles having a particle diameter of 3 to 4 nm were uniformly supported on the surface of the carrier. The number average particle diameter of Au particles was 3.4 nm (calculated number: 100).
次に、上記のようにして得られた貴金属担持物の耐酸性及び塩基性を評価するために、実施例1と同様の方法によりpHスイング試験を行った。その結果、pHスイング処理後の貴金属担持物の比表面積は242m2/g、細孔容積は0.27mL/g、平均細孔径は8.2nmであり、pHスイング処理による構造変化が認められた。また、透過型電子顕微鏡(TEM)によるAu粒子の平均粒子径は5.6nm(算出個数:100)であり、Au粒子の粒子成長が観察された。 Next, in order to evaluate the acid resistance and basicity of the noble metal support obtained as described above, a pH swing test was performed in the same manner as in Example 1. As a result, the specific surface area of the noble metal support after the pH swing treatment was 242 m 2 / g, the pore volume was 0.27 mL / g, the average pore diameter was 8.2 nm, and structural changes due to the pH swing treatment were observed. . Moreover, the average particle diameter of Au particles by a transmission electron microscope (TEM) was 5.6 nm (calculated number: 100), and particle growth of Au particles was observed.
上記貴金属担持物(2%Au/SiO2−Al2O3−MgO)を用いた以外は実施例15と同様にして反応を行った。その結果、反応開始から500時間経過時点のメタクロレイン転化率は39.4%、メタクリル酸メチルの選択率は82.1%、触媒の単位質量当たりのメタクリル酸メチルの生成活性は3.52mol/時間/kg−触媒であった。反応開始から1000時間経過時点のメタクロレイン転化率は31.1%、メタクリル酸メチルの選択率は78.2%、メタクリル酸メチルの生成活性は2.39mol/時間/kg−触媒であり、反応活性の低下が認められた。 The reaction was performed in the same manner as in Example 15 except that the noble metal support (2% Au / SiO 2 —Al 2 O 3 —MgO) was used. As a result, the methacrolein conversion rate after 500 hours from the start of the reaction was 39.4%, the methyl methacrylate selectivity was 82.1%, and the methyl methacrylate production activity per unit mass of the catalyst was 3.52 mol / Time / kg-catalyst. The methacrolein conversion rate after 1000 hours from the start of the reaction was 31.1%, the methyl methacrylate selectivity was 78.2%, and the methyl methacrylate production activity was 2.39 mol / hour / kg-catalyst. A decrease in activity was observed.
反応開始から1000時間経過後の触媒を抜き出し、走査型電子顕微鏡(SEM)で調べたところ触媒粒子に割れ、欠けはほとんど見られなかった。また、窒素吸着法による触媒の比表面積は212m2/g、細孔容積は0.27mL/g、平均細孔径は8.2nmであり、触媒の構造変化が認められた。 When the catalyst was removed after 1000 hours from the start of the reaction and examined with a scanning electron microscope (SEM), the catalyst particles were hardly cracked or chipped. Further, the specific surface area of the catalyst as determined by the nitrogen adsorption method was 212 m 2 / g, the pore volume was 0.27 mL / g, the average pore diameter was 8.2 nm, and a change in the structure of the catalyst was observed.
次に、反応開始から1000時間経過後の触媒を透過型電子顕微鏡(TEM)で観察したところ、Au粒子の数平均粒子径は5.5nmであり、細孔径の拡大と同時にAu粒子のシンタリングが観察された。 Next, the catalyst after 1000 hours from the start of the reaction was observed with a transmission electron microscope (TEM). As a result, the number average particle diameter of the Au particles was 5.5 nm. Was observed.
〔実施例18〕
実施例15と同じ貴金属担持物(2%Au/Si−Al−Ni−Mg複合酸化物)0.5g、メタクロレイン0.5g、水6.3g、溶媒としてアセトニトリル3.2gをマグネチックスターラーを備えたSUS316製の高圧オートクレーブ式反応器(総容量120ml)に仕込み、オートクレーブを閉じて、系内を窒素ガスで置換した後、7体積%の酸素を含有する窒素の混合ガスを気相部に導入し、系内全圧を3.0MPaまで昇圧した。
次いで、オイルバスに反応器を固定し、攪拌下に反応温度を100℃にして4時間反応させた。冷却後、残留圧を除いてオートクレーブを開放した後、触媒を濾別し、濾液をガスクロマトグラフによって分析した。その結果、メタクロレイン転化率は49.7%、メタクリル酸選択率は95.3%、メタクリル酸収率は47.4%であった。
Example 18
0.5 g of the same noble metal support (2% Au / Si—Al—Ni—Mg composite oxide) as in Example 15, 0.5 g of methacrolein, 6.3 g of water, 3.2 g of acetonitrile as a solvent, and magnetic stirrer. The SUS316 high-pressure autoclave reactor (total volume 120 ml) was charged, the autoclave was closed, and the system was replaced with nitrogen gas, and then a mixed gas of nitrogen containing 7% by volume of oxygen was added to the gas phase part. The total system pressure was increased to 3.0 MPa.
Subsequently, the reactor was fixed to the oil bath, and the reaction temperature was set to 100 ° C. with stirring for 4 hours. After cooling, the autoclave was removed by removing the residual pressure, the catalyst was filtered off, and the filtrate was analyzed by gas chromatography. As a result, methacrolein conversion was 49.7%, methacrylic acid selectivity was 95.3%, and methacrylic acid yield was 47.4%.
〔実施例19〕
溶媒をアセトンとした以外は実施例18と同様の方法で、実施例15と同じ貴金属担持物(2%Au/Si−Al−Ni−Mg複合酸化物)を用いて、メタクロレインからメタクリル酸を製造した。その結果、メタクロレイン転化率は61.1%、メタクリル酸選択率は96.6%、メタクリル酸収率は59.0%であった。
Example 19
Using the same noble metal support (2% Au / Si—Al—Ni—Mg composite oxide) as in Example 15 except that acetone was used as the solvent, methacrylic acid was converted from methacrolein. Manufactured. As a result, methacrolein conversion was 61.1%, methacrylic acid selectivity was 96.6%, and methacrylic acid yield was 59.0%.
〔実施例20〕
溶媒をターシャリーブタノールとした以外は実施例18と同様にして、実施例15と同じ貴金属担持物(2%Au/Si−Al−Ni−Mg複合酸化物)を用いて、メタクロレインからメタクリル酸を製造した。その結果、メタクロレイン転化率は64.7%、メタクリル酸選択率は96.8%、メタクリル酸収率は62.6%であった。
Example 20
Using the same noble metal support (2% Au / Si—Al—Ni—Mg composite oxide) as in Example 15 except that the solvent was tertiary butanol, methacrolein to methacrylic acid was used. Manufactured. As a result, the methacrolein conversion rate was 64.7%, the methacrylic acid selectivity was 96.8%, and the methacrylic acid yield was 62.6%.
〔実施例21〕
所定量の塩化金酸水溶液と硝酸ニッケル6水和物を含む水溶液1.0Lを90℃に加温した。この水溶液に実施例1で得られたシリカ系材料300gを投入し、攪拌下90℃に保持しながら、1時間攪拌を続け、金成分とニッケル成分をシリカ系材料上に析出させた。
次いで、静置して上澄みを除去し、蒸留水で数回洗浄した後、濾過した。これを105℃で16時間乾燥した後、空気中500℃で3時間焼成することにより、金1.5質量%、ニッケル1.5質量%を担持した貴金属担持物(AuNiO/Si−Al−Ni−Mg複合酸化物)を得た。
Example 21
1.0 L of an aqueous solution containing a predetermined amount of chloroauric acid aqueous solution and nickel nitrate hexahydrate was heated to 90 ° C. 300 g of the silica-based material obtained in Example 1 was added to this aqueous solution, and stirring was continued for 1 hour while maintaining the temperature at 90 ° C. with stirring, so that a gold component and a nickel component were precipitated on the silica-based material.
Next, the mixture was allowed to stand to remove the supernatant, washed several times with distilled water, and then filtered. This was dried at 105 ° C. for 16 hours and then calcined in air at 500 ° C. for 3 hours to thereby carry a noble metal support (AuNiO / Si—Al—Ni supporting 1.5% by weight of gold and 1.5% by weight of nickel). -Mg composite oxide).
この貴金属担持物について、窒素吸着法による比表面積は227m2/g、細孔容積は0.26mL/g、平均細孔径は4.9nmであった。その平均粒子径は、レーザー・散乱法粒度分布測定による結果から、65μmであった。また、走査型電子顕微鏡(SEM)による観察から、貴金属担持物に割れや欠けはなく、形状はほぼ球状であった。 The noble metal support had a specific surface area of 227 m 2 / g, a pore volume of 0.26 mL / g, and an average pore diameter of 4.9 nm as determined by the nitrogen adsorption method. The average particle diameter was 65 μm from the result of measurement by laser / scattering particle size distribution measurement. Further, from observation with a scanning electron microscope (SEM), the noble metal support was not cracked or chipped, and the shape was almost spherical.
透過型電子顕微鏡(TEM)を用いて上記貴金属担持物の微細構造を観察したところ、粒子径2〜3nmの金属粒子がシリカ材料表面上に均一に担持されていた。金属粒子の数平均粒子径は3.0nmであった(算出個数:100)。 When the microstructure of the noble metal support was observed using a transmission electron microscope (TEM), metal particles having a particle diameter of 2 to 3 nm were uniformly supported on the surface of the silica material. The number average particle diameter of the metal particles was 3.0 nm (calculated number: 100).
次に、上記のようにして得られた貴金属担持物の化学的安定性を評価するために、実施例1と同様の方法によりpHスイング試験を行った。その結果、pHスイング処理後の貴金属担持物の比表面積は229m2/g、細孔容積は0.27mL/g、平均細孔径は4.9nmであり、pHスイング処理による構造変化は認められなかった。また、透過型電子顕微鏡(TEM)による金属粒子の平均粒子径は3.0nm(算出個数:100)であり、金属粒子の粒子成長はほとんど観察されなかった。 Next, in order to evaluate the chemical stability of the noble metal support obtained as described above, a pH swing test was performed in the same manner as in Example 1. As a result, the specific surface area of the noble metal support after the pH swing treatment was 229 m 2 / g, the pore volume was 0.27 mL / g, the average pore diameter was 4.9 nm, and no structural change was observed due to the pH swing treatment. It was. Moreover, the average particle diameter of the metal particles by a transmission electron microscope (TEM) was 3.0 nm (calculated number: 100), and almost no particle growth of the metal particles was observed.
上記の貴金属担持物(AuNiO/Si−Al−Ni−Mg複合酸化物)を用いて、実施例16と同様の方法で、メタクロレインからメタクリル酸を製造した。その結果、メタクロレイン転化率は59.9%、メタクリル酸選択率は96.1%、メタクリル酸収率は57.6%であった。 Methacrylic acid was produced from methacrolein in the same manner as in Example 16 using the above-mentioned noble metal support (AuNiO / Si—Al—Ni—Mg composite oxide). As a result, methacrolein conversion was 59.9%, methacrylic acid selectivity was 96.1%, and methacrylic acid yield was 57.6%.
〔実施例22〕
実施例21と同じ貴金属担持物(AuNiO/Si−Al−Ni−Mg複合酸化物)50g、メタクロレイン100g、水580g、溶媒としてアセトン320gをSUS316製の攪拌型オートクレーブ(15L)に仕込み、オートクレーブを閉じて系内を窒素ガスで置換した後、7体積%の酸素を含有する窒素の混合ガスを気相部に導入し、系内全圧を3.0MPaまで昇圧した。
反応温度を110℃にして8時間反応後、冷却し、残留圧を除いてオートクレーブを開放した後、反応液をガスクロマトグラフによって分析した。その結果、メタクロレイン転化率は53.7%、メタクリル酸選択率は95.9%、メタクリル酸収率は51.5%であった。
[Example 22]
50 g of the same noble metal support (AuNiO / Si—Al—Ni—Mg composite oxide) as in Example 21, 100 g of methacrolein, 580 g of water, and 320 g of acetone as a solvent were charged into a stirring type autoclave (15 L) made of SUS316. After closing and replacing the inside of the system with nitrogen gas, a mixed gas of nitrogen containing 7% by volume of oxygen was introduced into the gas phase portion, and the total pressure in the system was increased to 3.0 MPa.
After reacting for 8 hours at a reaction temperature of 110 ° C., the mixture was cooled, the residual pressure was removed, the autoclave was opened, and the reaction solution was analyzed by gas chromatography. As a result, the methacrolein conversion rate was 53.7%, the methacrylic acid selectivity was 95.9%, and the methacrylic acid yield was 51.5%.
〔実施例23〕
硝酸アルミニウム9水和物1.5kgに代えて、酸化アルミニウム4.4kg、硝酸ニッケル6水和物0.24kgに代えて酸化ニッケル0.93kg、硝酸マグネシウム6水和物0.98kgに代えて酸化マグネシウム0.42kgを用い、焼成温度を600℃から800℃に代えた以外は実施例1の(1)と同様にして、ケイ素を42.9モル%、アルミニウムを37.0モル%、ニッケルを10.9モル%、マグネシウムを9.1モル%含む担体を得た。Ni(X)/Alの組成比はモル基準で0.30、Ni(X)/Mg(B)の組成比はモル基準で1.20であった。窒素吸着法による比表面積は78m2/g、細孔容積は0.27mL/g、平均細孔径は5.2nmであった。嵩密度は1.02CBD、耐摩耗性は0.1質量%であった。平均粒子径は、レーザー・散乱法粒度分布測定による結果から、62μmであった。また、走査型電子顕微鏡(SEM)による観察から、担体に割れや欠けはなく、形状はほぼ球状であった。固体形態について、粉末X線回折(XRD)の結果から、シリカゲルと同様の非晶質パターンが得られた。
Example 23
In place of 1.5 kg of aluminum nitrate nonahydrate, 4.4 kg of aluminum oxide, 0.93 kg of nickel oxide in place of 0.24 kg of nickel nitrate hexahydrate, and oxidized in place of 0.98 kg of magnesium nitrate hexahydrate Except for using 0.42 kg of magnesium and changing the firing temperature from 600 ° C. to 800 ° C., in the same manner as in (1) of Example 1, silicon was 42.9 mol%, aluminum was 37.0 mol%, nickel was A carrier containing 10.9 mol% and 9.1 mol% magnesium was obtained. The composition ratio of Ni (X) / Al was 0.30 on a molar basis, and the composition ratio of Ni (X) / Mg (B) was 1.20 on a molar basis. The specific surface area determined by the nitrogen adsorption method was 78 m 2 / g, the pore volume was 0.27 mL / g, and the average pore diameter was 5.2 nm. The bulk density was 1.02 CBD, and the wear resistance was 0.1% by mass. The average particle diameter was 62 μm from the result of measurement by laser / scattering particle size distribution measurement. Further, from observation with a scanning electron microscope (SEM), the carrier was not cracked or chipped, and the shape was almost spherical. As for the solid form, an amorphous pattern similar to that of silica gel was obtained from the results of powder X-ray diffraction (XRD).
上記のようにして得られたシリカ系材料300gを、蒸留水1Lを入れたガラス容器に添加し、60℃で撹拌しながら、所定量の塩化金酸水溶液と硝酸ニッケル6水和物との希塩酸溶液を素早く滴下した。次いで、0.5N水酸化ナトリウム水溶液を更に添加して上記水溶液のpHを8に調整し、そのまま1時間攪拌を続けた。その後、ガラス容器の内容物にヒドラジンを化学量論量の1.2倍添加して還元した。還元後の内容物からデカンテーションにより上澄みを除去して沈殿物を回収し、その沈殿物をClイオンが検出されなくなるまで蒸留水で洗浄し、さらに60℃で真空乾燥して、Au、Niを各々3.0質量%担持した貴金属担持物(AuNi/Si−Al−Ni−Mg複合酸化物)を得た。 300 g of the silica-based material obtained as described above is added to a glass container containing 1 L of distilled water, and while stirring at 60 ° C., dilute hydrochloric acid of a predetermined amount of chloroauric acid aqueous solution and nickel nitrate hexahydrate. The solution was quickly added dropwise. Subsequently, 0.5N aqueous sodium hydroxide solution was further added to adjust the pH of the aqueous solution to 8, and the stirring was continued for 1 hour. Thereafter, hydrazine was added to the contents of the glass container 1.2 times the stoichiometric amount and reduced. The supernatant is removed from the reduced content by decantation, and the precipitate is recovered. The precipitate is washed with distilled water until Cl ions are no longer detected, and further dried at 60 ° C. under vacuum to remove Au and Ni. A noble metal support (AuNi / Si—Al—Ni—Mg composite oxide) supported in an amount of 3.0% by mass was obtained.
この貴金属担持物について、窒素吸着法による比表面積は105m2/g、細孔容積は0.27mL/g、平均細孔径は4.0nmであった。その平均粒子径は、レーザー・散乱法粒度分布測定による結果から、62μmであった。また、走査型電子顕微鏡(SEM)による観察から、貴金属担持物に割れや欠けはなく、形状はほぼ球状であった。 The noble metal support had a specific surface area of 105 m 2 / g, a pore volume of 0.27 mL / g, and an average pore diameter of 4.0 nm as determined by the nitrogen adsorption method. The average particle diameter was 62 μm from the result of measurement by laser / scattering particle size distribution measurement. Further, from observation with a scanning electron microscope (SEM), the noble metal support was not cracked or chipped, and the shape was almost spherical.
透過型電子顕微鏡(TEM)を用いて上記貴金属担持物の微細構造を観察したところ、粒子径4〜5nmの金属粒子が担体表面上に均一に担持されていた。金属粒子の数平均粒子径は4.5nmであった(算出個数:100)。 When the microstructure of the noble metal support was observed using a transmission electron microscope (TEM), metal particles having a particle diameter of 4 to 5 nm were uniformly supported on the surface of the carrier. The number average particle diameter of the metal particles was 4.5 nm (calculated number: 100).
次に、上記のようにして得られた貴金属担持物の化学的安定性を評価するために、実施例1と同様の方法によりpHスイング試験を行った。その結果、pHスイング処理後の貴金属担持物の比表面積は107m2/g、細孔容積は0.27mL/g、平均細孔径は4.1nmであり、pHスイング処理による構造変化は認められなかった。また、透過型電子顕微鏡(TEM)による金属粒子の平均粒子径は4.7nm(算出個数:100)であり、金属粒子の粒子成長はほとんど観察されなかった。 Next, in order to evaluate the chemical stability of the noble metal support obtained as described above, a pH swing test was performed in the same manner as in Example 1. As a result, the specific surface area of the noble metal support after the pH swing treatment was 107 m 2 / g, the pore volume was 0.27 mL / g, the average pore diameter was 4.1 nm, and no structural change was observed due to the pH swing treatment. It was. Moreover, the average particle diameter of the metal particles by a transmission electron microscope (TEM) was 4.7 nm (calculated number: 100), and almost no particle growth of the metal particles was observed.
上記の貴金属担持物(AuNi/Si−Al−Ni−Mg複合酸化物)を用いて、実施例18と同様の方法で、メタクロレインからメタクリル酸を製造した。その結果、メタクロレイン転化率は38.9%、メタクリル酸選択率は94.9%、メタクリル酸収率は36.7%であった。 Methacrylic acid was produced from methacrolein in the same manner as in Example 18 using the above-mentioned noble metal support (AuNi / Si—Al—Ni—Mg composite oxide). As a result, the methacrolein conversion rate was 38.9%, the methacrylic acid selectivity was 94.9%, and the methacrylic acid yield was 36.7%.
〔実施例24〕
実施例2で得られた担体300gを、蒸留水1Lを入れたガラス容器に添加し、60℃で撹拌しながら、所定量の塩化金酸水溶液と塩化白金酸との希塩酸溶液を素早く滴下した。次いで、0.5N水酸化ナトリウム水溶液を更に添加して上記水溶液のpHを8に調整し、そのまま1時間攪拌を続けた。その後、ガラス容器の内容物にヒドラジンを化学量論量の1.2倍添加して還元した。還元後の内容物からデカンテーションにより上澄みを除去して沈殿物を回収し、その沈殿物をClイオンが検出されなくなるまで蒸留水で洗浄し、さらに60℃で真空乾燥して、Au、Ptを各々2.0質量%担持した貴金属担持物(AuPt/Si−Al−Zn−K複合酸化物)を得た。
Example 24
300 g of the carrier obtained in Example 2 was added to a glass container containing 1 L of distilled water, and a dilute hydrochloric acid solution of a predetermined amount of chloroauric acid aqueous solution and chloroplatinic acid was rapidly added dropwise with stirring at 60 ° C. Subsequently, 0.5N aqueous sodium hydroxide solution was further added to adjust the pH of the aqueous solution to 8, and the stirring was continued for 1 hour. Thereafter, hydrazine was added to the contents of the glass container 1.2 times the stoichiometric amount and reduced. The supernatant is removed from the reduced content by decantation, and the precipitate is recovered. The precipitate is washed with distilled water until Cl ions are no longer detected, and further dried at 60 ° C. under vacuum to remove Au and Pt. A noble metal support (AuPt / Si—Al—Zn—K composite oxide) supported at 2.0% by mass was obtained.
この貴金属担持物について、窒素吸着法による比表面積は220m2/g、細孔容積は0.27mL/g、平均細孔径は3.9nmであった。その平均粒子径は、レーザー・散乱法粒度分布測定による結果から、62μmであった。また、走査型電子顕微鏡(SEM)による観察から、貴金属担持物に割れや欠けはなく、形状はほぼ球状であった。 The noble metal support had a specific surface area of 220 m 2 / g, a pore volume of 0.27 mL / g, and an average pore diameter of 3.9 nm according to the nitrogen adsorption method. The average particle diameter was 62 μm from the result of measurement by laser / scattering particle size distribution measurement. Further, from observation with a scanning electron microscope (SEM), the noble metal support was not cracked or chipped, and the shape was almost spherical.
透過型電子顕微鏡(TEM)を用いて上記貴金属担持物の微細構造を観察したところ、粒子径3〜4nmの金属粒子が担体表面上に均一に担持されていた。金属粒子の数平均粒子径は3.5nmであった(算出個数:100)。 When the fine structure of the noble metal support was observed using a transmission electron microscope (TEM), metal particles having a particle diameter of 3 to 4 nm were uniformly supported on the support surface. The number average particle diameter of the metal particles was 3.5 nm (calculated number: 100).
次に、上記のようにして得られた貴金属担持物の化学的安定性を評価するために、実施例1と同様の方法によりpHスイング試験を行った。その結果、pHスイング処理後の貴金属担持物の比表面積は217m2/g、細孔容積は0.27mL/g、平均細孔径は4.0nmであり、pHスイング処理による構造変化は認められなかった。また、透過型電子顕微鏡(TEM)による金属粒子の平均粒子径は3.7nm(算出個数:100)であり、金属粒子の粒子成長はほとんど観察されなかった。 Next, in order to evaluate the chemical stability of the noble metal support obtained as described above, a pH swing test was performed in the same manner as in Example 1. As a result, the specific surface area of the noble metal support after the pH swing treatment was 217 m 2 / g, the pore volume was 0.27 mL / g, the average pore diameter was 4.0 nm, and no structural change was observed due to the pH swing treatment. It was. Moreover, the average particle diameter of the metal particles by a transmission electron microscope (TEM) was 3.7 nm (calculated number: 100), and almost no particle growth of the metal particles was observed.
上記の貴金属担持物(AuPt/Si−Al−Zn−K複合酸化物)を用いて、実施例18と同様の方法でメタクロレインからメタクリル酸を製造した。その結果、メタクロレイン転化率は63.1%、メタクリル酸選択率は96.3%、メタクリル酸収率は60.8%であった。 Methacrylic acid was produced from methacrolein in the same manner as in Example 18 using the above-mentioned noble metal support (AuPt / Si—Al—Zn—K composite oxide). As a result, the methacrolein conversion rate was 63.1%, the methacrylic acid selectivity was 96.3%, and the methacrylic acid yield was 60.8%.
〔実施例25〕
実施例12と同じ貴金属担持物(Pd/Si−Al−Ni−Mg複合酸化物)を用いて、実施例18と同様の方法でメタクロレインからメタクリル酸を製造した。その結果、メタクロレイン転化率は6.0%、メタクリル酸選択率は66.6%、メタクリル酸収率は4.0%であった。
Example 25
Methacrylic acid was produced from methacrolein in the same manner as in Example 18 using the same noble metal support (Pd / Si—Al—Ni—Mg composite oxide) as in Example 12. As a result, methacrolein conversion was 6.0%, methacrylic acid selectivity was 66.6%, and methacrylic acid yield was 4.0%.
〔実施例26〕
触媒として、実施例12と同じ貴金属担持物(Pd/Si−Al−Ni−Mg複合酸化物)10gと10質量%のエチレングリコール水溶液を、液相部が0.5リットルの攪拌型ステンレス製反応器に仕込んだ。その反応器中の攪拌羽の先端速度1.5m/秒の速度で内容物を攪拌しながら、エチレングリコールの酸化反応を実施した。反応温度を50℃とし、空気を常圧で350ml/分で吹き込み、反応系のpHが8〜10となるように2.5質量%のNaOH水溶液を反応器に供給しながら4時間反応を実施後、触媒を濾別し、濾液をロータリーエバポレーターで蒸発乾固し、ヒドロキシ酢酸ナトリウムの白色粉末63gを得た。
Example 26
As a catalyst, 10 g of the same noble metal support (Pd / Si—Al—Ni—Mg composite oxide) as in Example 12 and a 10% by mass ethylene glycol aqueous solution were used. I put it in a vessel. The ethylene glycol oxidation reaction was carried out while stirring the contents at a tip speed of 1.5 m / sec of the stirring blade in the reactor. The reaction temperature was 50 ° C., air was blown at 350 ml / min at normal pressure, and the reaction was carried out for 4 hours while supplying a 2.5 mass% NaOH aqueous solution to the reactor so that the pH of the reaction system would be 8-10. Thereafter, the catalyst was filtered off, and the filtrate was evaporated to dryness with a rotary evaporator to obtain 63 g of white powder of sodium hydroxyacetate.
〔実施例27〕
触媒として、実施例12と同じ貴金属担持物(Pd/Si−Al−Ni−Mg複合酸化物)1gと150gの液状フェノールを攪拌型ステンレス製反応器(500ml)に仕込んだ。系内を窒素ガスで置換した後、水素ガスを気相部に導入し、系内全圧を2.5MPaまで昇圧した。反応温度を140℃とし、攪拌羽の先端速度1.5m/秒の速度で内容物を攪拌しながら、フェノールのシクロヘキサノンへの水素化反応を実施した。1時間反応を実施後冷却し、残留圧を除いてオートクレーブを開放した後、触媒を濾別し、濾液をガスクロマトグラフによって分析した。その結果、フェノール転化率は99.7%、シクロヘキサノン選択率は91.3%であった。
Example 27
As a catalyst, 1 g of the same noble metal support (Pd / Si—Al—Ni—Mg composite oxide) as in Example 12 and 150 g of liquid phenol were charged into a stirred stainless steel reactor (500 ml). After replacing the inside of the system with nitrogen gas, hydrogen gas was introduced into the gas phase portion, and the total pressure in the system was increased to 2.5 MPa. The reaction temperature was 140 ° C., and the hydrogenation reaction of phenol to cyclohexanone was carried out while stirring the contents at a tip speed of 1.5 m / sec. The reaction was carried out for 1 hour and then cooled, the residual pressure was removed, the autoclave was opened, the catalyst was filtered off, and the filtrate was analyzed by gas chromatography. As a result, the phenol conversion was 99.7% and the cyclohexanone selectivity was 91.3%.
〔実施例28〕
実施例4で得られたシリカ系材料30gを、ガラス容器内に入れた蒸留水100mLに添加し、80℃で攪拌しながら、所定量の塩化ルテニウム水溶液と硝酸亜鉛水溶液を滴下し、さらに0.5N水酸化ナトリウム水溶液を添加して、上記水溶液のpHを8に調整した。そのまま1時間攪拌を続けた後、混合液を静置して上澄みを除去し、さらにClイオンが検出されなくなるまで蒸留水で洗浄した固形物を105℃で16時間乾燥した後、空気中300℃で3時間焼成した。次いで、得られた固形物に対して、水素雰囲気中で350℃、3時間の還元処理を行うことにより、ルテニウム10.4質量%、亜鉛/ルテニウムの原子比が0.11である亜鉛を担持した貴金属担持物(RuZn/Si−Al−Fe−La複合酸化物)を得た。
Example 28
30 g of the silica-based material obtained in Example 4 was added to 100 mL of distilled water placed in a glass container, and while stirring at 80 ° C., a predetermined amount of an aqueous ruthenium chloride solution and an aqueous zinc nitrate solution were added dropwise. A 5N aqueous sodium hydroxide solution was added to adjust the pH of the aqueous solution to 8. After stirring for 1 hour, the mixture was allowed to stand to remove the supernatant, and the solid washed with distilled water until no Cl ions were detected was dried at 105 ° C. for 16 hours, and then 300 ° C. in air. For 3 hours. Next, the obtained solid material is subjected to a reduction treatment at 350 ° C. for 3 hours in a hydrogen atmosphere, thereby supporting 10.4% by mass of ruthenium and zinc having a zinc / ruthenium atomic ratio of 0.11. A noble metal support (RuZn / Si—Al—Fe—La composite oxide) was obtained.
上記の貴金属担持物(RuZn/Si−Al−Fe−La複合酸化物)0.5gと10質量%の硫酸亜鉛水溶液280mLを1リットルのハステロイ製のオートクレーブに仕込み、攪拌しながら水素で置換し、150℃に昇温後、22時間保持し、触媒スラリーの前処理を行った。その後ベンゼン140mLを圧入し、全圧5MPaで高速攪拌しながら、ベンゼンの部分水素化反応を実施した。この反応液を経時的に抜き出し、ガスクロマトグラフィーにより液相の組成を分析したところ、ベンゼンの転化率が50%におけるシクロヘキセンの選択率は81.5%であった。 0.5 g of the above-mentioned noble metal support (RuZn / Si—Al—Fe—La composite oxide) and 280 mL of 10% by mass zinc sulfate aqueous solution were charged into a 1 liter Hastelloy autoclave and replaced with hydrogen while stirring. After raising the temperature to 150 ° C., the slurry was kept for 22 hours to pretreat the catalyst slurry. Thereafter, 140 mL of benzene was injected, and a partial hydrogenation reaction of benzene was carried out while stirring at a high pressure at a total pressure of 5 MPa. The reaction solution was taken out over time and the composition of the liquid phase was analyzed by gas chromatography. As a result, the selectivity for cyclohexene at a benzene conversion rate of 50% was 81.5%.
〔実施例29〕
実施例1で得られたシリカ系材料30gを、ガラス容器内に入れた蒸留水100mLに添加し、80℃で攪拌しながら、所定量の塩化ルテニウム、塩化白金酸、塩化スズとの希塩酸溶液を滴下し、さらに0.5N水酸化ナトリウム水溶液を添加して、上記水溶液のpHを8に調整した。そのまま1時間攪拌を続けた後、混合液を静置して上澄みを除去し、さらにClイオンが検出されなくなるまで蒸留水で洗浄した固形物を105℃で16時間乾燥した後、空気中300℃で3時間焼成した。次いで、得られた固形物に対して、水素雰囲気中で350℃、3時間の還元処理を行うことにより、ルテニウム6.1質量%、スズ5.0質量%、白金3.4質量%を担持した貴金属担持物(RuSnPt/Si−Al−Ni−Mg複合酸化物)を得た。
Example 29
30 g of the silica-based material obtained in Example 1 was added to 100 mL of distilled water in a glass container, and a dilute hydrochloric acid solution with a predetermined amount of ruthenium chloride, chloroplatinic acid, and tin chloride was added while stirring at 80 ° C. The solution was added dropwise, and a 0.5N aqueous sodium hydroxide solution was further added to adjust the pH of the aqueous solution to 8. After stirring for 1 hour, the mixture was allowed to stand to remove the supernatant, and the solid washed with distilled water until no Cl ions were detected was dried at 105 ° C. for 16 hours, and then 300 ° C. in air. For 3 hours. Next, the obtained solid was subjected to reduction treatment at 350 ° C. for 3 hours in a hydrogen atmosphere to carry 6.1% by mass of ruthenium, 5.0% by mass of tin, and 3.4% by mass of platinum. A noble metal support (RuSnPt / Si—Al—Ni—Mg composite oxide) was obtained.
上記の貴金属担持物(RuSnPt/Si−Al−Ni−Mg複合酸化物)0.15gと水5g、コハク酸23質量%、グルタル酸60質量%、アジピン酸17質量%からなるコハク酸、グルタル酸、アジピン酸の混合物2.1gを30mLのオートクレーブに仕込み、室温下窒素でオートクレーブ内の雰囲気を置換した後、水素ガスを気相部に導入して系内全圧を2.0MPaまで昇圧し、180℃まで昇温した。180℃に達した時点で水素ガスを導入し、系内全圧を15MPaとした後、10時間水素化還元反応を実施した。反応終了後、デカンテーションにより触媒を分離し、触媒はイオン交換水で洗浄した。デカンテーションにより分離した反応液と触媒洗浄液を併せて各ジカルボン酸の転化率とジオールの収率を液体クロマトグラフィーとガスクロマトグラフィーで分析した結果、コハク酸、グルタル酸、アジピン酸の転化率はそれぞれ93%、93%、95%であり、1,4-ブタンジオール、1,5-ペンタンジオール、1,6-ヘキサンジオールの収率は、それぞれ51%、75%、61%であった。 Succinic acid and glutaric acid composed of 0.15 g of the above-mentioned noble metal support (RuSnPt / Si—Al—Ni—Mg composite oxide) and 5 g of water, 23% by mass of succinic acid, 60% by mass of glutaric acid and 17% by mass of adipic acid Then, 2.1 g of the mixture of adipic acid was charged into a 30 mL autoclave, the atmosphere in the autoclave was replaced with nitrogen at room temperature, hydrogen gas was introduced into the gas phase part, and the total internal pressure was increased to 2.0 MPa. The temperature was raised to 180 ° C. When the temperature reached 180 ° C., hydrogen gas was introduced to bring the total pressure in the system to 15 MPa, and then a hydrogen reduction reaction was carried out for 10 hours. After completion of the reaction, the catalyst was separated by decantation, and the catalyst was washed with ion-exchanged water. As a result of analyzing the conversion rate of each dicarboxylic acid and the yield of diol by liquid chromatography and gas chromatography, combining the reaction solution separated by decantation and the catalyst washing solution, the conversion rates of succinic acid, glutaric acid and adipic acid were The yields of 1,4-butanediol, 1,5-pentanediol, and 1,6-hexanediol were 51%, 75%, and 61%, respectively.
本発明によれば、機械的強度が強く、かつ比表面積も大きなシリカ系材料であって、しかも耐酸性及び塩基性に優れたシリカ系材料及びそのシリカ系材料を含有する貴金属担持物を提供することができる。 According to the present invention, there is provided a silica-based material having a high mechanical strength and a large specific surface area, which is excellent in acid resistance and basicity, and a noble metal support containing the silica-based material. be able to.
Claims (9)
アルミニウムと、
鉄、コバルト、ニッケル及び亜鉛からなる群より選択される少なくとも1種の第4周期元素と、
アルカリ金属元素、アルカリ土類金属元素及び希土類元素からなる群より選択される少なくとも1種の塩基性元素と、
を、前記ケイ素と前記アルミニウムと前記第4周期元素と前記塩基性元素との合計モル量に対して、それぞれ、57.6〜90モル%、3.1〜30モル%、0.75〜15モル%、2〜36.6モル%、の範囲で含有するシリカ系材料であって、
前記シリカ系材料を電子プローブ微小部分析法で観察測定した場合、測定される前記第4周期元素の濃度の分布範囲が10%以内である、シリカ系材料からなる、
触媒担体。 Silicon,
With aluminum,
At least one fourth periodic element selected from the group consisting of iron, cobalt, nickel and zinc;
At least one basic element selected from the group consisting of alkali metal elements, alkaline earth metal elements and rare earth elements;
Are 57.6 to 90 mol%, 3.1 to 30 mol%, and 0.75 to 15 with respect to the total molar amount of the silicon, the aluminum, the fourth periodic element, and the basic element, respectively. A silica-based material containing in the range of mol%, 2 to 36.6 mol%,
When the silica-based material is observed and measured by the electron probe microanalysis method, the distribution range of the concentration of the fourth periodic element to be measured is within 10% .
Catalyst carrier .
シリカと、アルミニウム化合物と、鉄、コバルト、ニッケル及び亜鉛からなる群より選択される少なくとも1種の第4周期元素の化合物と、アルカリ金属元素、アルカリ土類金属元素及び希土類元素からなる群より選択される少なくとも1種の塩基性元素の化合物と、を含有する組成物を得る工程と、
前記組成物又はその組成物の乾燥物を焼成して固形物を得る工程と、
を有し、
ケイ素と、アルミニウムと、鉄、コバルト、ニッケル及び亜鉛からなる群より選択される少なくとも1種の第4周期元素と、アルカリ金属元素、アルカリ土類金属元素及び希土類元素からなる群より選択される少なくとも1種の塩基性元素と、を含有するシリカ系材料からなる触媒担体を得る、触媒担体の製造方法。 A method for producing the catalyst carrier according to any one of claims 1 to 5,
Selected from the group consisting of a compound of at least one fourth periodic element selected from the group consisting of silica, an aluminum compound, iron, cobalt, nickel and zinc, an alkali metal element, an alkaline earth metal element, and a rare earth element Obtaining a composition containing at least one basic element compound,
Baking the composition or a dried product thereof to obtain a solid;
Have
At least one fourth periodic element selected from the group consisting of silicon, aluminum, iron, cobalt, nickel and zinc, and at least selected from the group consisting of alkali metal elements, alkaline earth metal elements and rare earth elements obtaining a one basic element, a catalyst carrier comprising silica-based material having including a method of producing a catalyst carrier.
前記シリカ系材料に担持され、ルテニウム、ロジウム、パラジウム、銀、レニウム、オスミウム、イリジウム、白金、金からなる群より選択される少なくとも1種の貴金属成分と、
を含む、カルボン酸エステル製造用貴金属担持触媒。 The catalyst carrier according to any one of claims 1 to 5,
Supported on the silica-based material, at least one noble metal component selected from the group consisting of ruthenium, rhodium, palladium, silver, rhenium, osmium, iridium, platinum, and gold;
A noble metal-supported catalyst for producing a carboxylic acid ester .
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