JP5919719B2 - Shutter device - Google Patents

Description

  The present invention relates to a shutter device.

  For example, as a method for adjusting the resonance frequency of the vibrator, a method of changing the mass of the vibrator is known. Such a method is provided, for example, between an oscillator, an ion gun that removes part of the oscillator by irradiating the ion beam to the oscillator to reduce the mass of the oscillator, and the oscillator and the ion gun. This is performed using a device having a shutter device (see Patent Document 1).

  The shutter device of Patent Document 1 includes a plurality of shutter portions arranged in parallel in a predetermined direction and an actuator that drives each shutter portion. Here, in recent years, in order to be able to process more vibrators at a time, it is desired to arrange the shutter portions at a narrow pitch and increase the number of shutter portions included in the shutter. However, in the cited document 1, the configuration of the shutter is unclear, and the configuration in which the shutter portions are arranged at a narrow pitch cannot be realized.

JP 2010-34719 A

  An object of the present invention is to provide a shutter device in which shutter portions can be arranged in parallel at a narrow pitch.

SUMMARY An advantage of some aspects of the invention is to solve at least a part of the problems described above, and the invention can be implemented as the following forms or application examples.
[Application Example 1]
The shutter device of the present invention is a shutter device capable of switching between an open state and a closed state,
When two axes orthogonal to each other are a first axis and a second axis, a direction parallel to the first axis is a first axis direction, and a direction parallel to the second axis is a second axis direction,
A shutter part capable of reciprocating in the first axis direction;
A drive unit that generates a drive force for moving the shutter unit in the first axis direction;
In order to guide the movement of the shutter portion in the first axial direction, the guide means provided with two step surfaces that are opposite to each other on the axis in the second axial direction,
The shutter portion is disposed between at least the two step surfaces and the shielding portion having a width in the second axial direction of L1, the width in the second axial direction is L2, and the shielding portion. A connecting portion for transmitting the driving force to
When the distance between the two step surfaces in the second axis direction is L3, the relationship of L2 <L3 <L1 is satisfied .
The step surface is a convex curved surface .
Thereby, the shutter apparatus which can arrange a shutter part (shielding part) in parallel at a narrow pitch can be provided. Moreover, the contact area when a connection part and a convex part contact can be made smaller, and the frictional force which can generate | occur | produce between a connection part and a convex part can be made small. Therefore, the connecting portion can be slid more smoothly.

[Application Example 2 ]
In the shutter device of the present invention, it is preferable that a plurality of sets of the two step surfaces are provided in the first axis direction.
Thereby, the arrangement | positioning space of a convex part can be made small.
[Application Example 3 ]
In the shutter device according to the aspect of the invention, it is preferable that the shielding portion is detachable from the connecting portion.
Thereby, replacement | exchange of the shielding part which is consumables can be performed easily.
[Application Example 4 ]
The shutter device of the present invention is preferably a shutter device for mass adjustment of a vibration device.
Thereby, the mass adjustment of the vibration device can be performed with higher accuracy.

It is the schematic of the frequency adjustment apparatus to which the shutter apparatus concerning 1st Embodiment of this invention is applied. It is a top view (top view) of the shutter device concerning a 1st embodiment of the present invention. It is a top view (top view) of the shutter device concerning a 1st embodiment of the present invention. FIG. 3 is a side view of the shutter device shown in FIG. 2. It is a figure (side view) for demonstrating the action | operation of the shutter apparatus shown in FIG. It is sectional drawing of the guide means which the shutter apparatus shown in FIG. 2 has. It is sectional drawing of the guide means which the shutter apparatus shown in FIG. 2 has. It is a top view of the guide means which the shutter apparatus concerning 2nd Embodiment of this invention has. It is a top view of the guide means which the shutter apparatus concerning 2nd Embodiment of this invention has. It is a top view of the guide means which the shutter apparatus concerning 3rd Embodiment of this invention has. It is a top view which shows the modification of a shutter part. It is a top view which shows the modification of a shutter part. It is a top view which shows the modification of a shutter part.

Hereinafter, a shutter device of the present invention will be described in detail based on a preferred embodiment shown in the accompanying drawings.
<First Embodiment>
FIG. 1 is a schematic diagram of a frequency adjusting device to which the shutter device according to the first embodiment of the present invention is applied, and FIGS. 2 and 3 are plan views (top views) of the shutter device according to the first embodiment of the present invention. 4 is a side view of the shutter device shown in FIG. 2, FIG. 5 is a diagram (side view) for explaining the operation of the shutter device shown in FIG.
6 and 7 are cross-sectional views of guide means included in the shutter device shown in FIG.

Since FIG. 1 is a diagram for explaining the outline of the frequency adjustment device, the number of unit shutter devices 2 included in the shutter device 1 illustrated in FIG. 1 is the number of unit shutter devices included in the shutter device illustrated in FIG. It is different from the number of 2. In the following description, for convenience of explanation, the upper side in FIGS. 1 to 7 will be described as “upper”, the lower side as “lower”, the right side as “right”, and the left side as “left”. In addition, as shown in FIG. 1, three axes orthogonal to each other are defined as an x-axis (first axis), a y-axis (second axis), and a z-axis (third axis). "Direction (first axis direction)", a direction parallel to the y axis is called "y axis direction (second axis direction)", and a direction parallel to the z axis is "z axis direction (third axis direction)". Say.
Hereinafter, when the shutter device of the present invention is applied to the frequency adjusting device 100 for adjusting the resonance frequency of a vibrator (vibrating device) 9 such as a crystal vibrator, for example, the shutter apparatus of the present invention is used as the vibrator 9. A case where the present invention is applied to the mass adjusting shutter device will be described. However, the application of the shutter device of the present invention is not limited to this.

1. Frequency Adjustment Device The frequency adjustment device 100 shown in FIG. 1 includes a chamber 110 that can have a desired environment inside, a shutter device 1 that can be switched between open and closed states, an ion gun 120, and a shielding plate 130. Yes. In addition to the above, for example, the frequency adjustment apparatus 100 may also be provided with a mask or the like that covers other than the predetermined portion of the vibrator 9 so that only a predetermined portion of the vibrator 9 is irradiated with an ion beam IB described later. Good.

  The ion gun 120 emits an ion beam IB by applying an electric field to an inert gas such as Ar or Ne and accelerating it, and constitutes a mass changing means for changing the mass of the vibrator 9. It is. Such an ion gun 120 is positioned below the shutter device 1 in the chamber 110 and emits an ion beam IB upward.

Further, the shielding plate 130 is positioned above the shutter device 1 (on the + direction side of the z-axis) in the chamber 110, and includes a pair of adjacent shutter units 3 among a plurality of shutter units 3 described later. The ion beam IB leaking upward from the gap is blocked.
As illustrated in FIG. 2, the shutter device 1 includes a plurality (eight in the present embodiment) of unit shutter devices 2 and a support portion 8 that supports the plurality of unit shutter devices 2.

Each of the plurality of unit shutter devices 2 includes a shutter unit 3 that can reciprocate (slide) in the x-axis direction, a drive unit 4 that reciprocates the shutter unit 3 in the x-axis direction, and movement of the shutter unit 3. And a guide means 7 for guiding the movement of the shutter unit 3. The shutter unit 3 connects the plate-shaped shielding unit 31 for shielding the ion beam IB, the shielding unit 31 and the driving unit 4, and transmits the driving force from the driving unit 4 to the shielding unit 31. Part 32.
The driving of each of the plurality of unit shutter devices 2 is controlled independently, and can be switched between an open state that allows the passage of the ion beam IB and a closed state that blocks the ion beam IB.

  In such a frequency adjusting device 100, a plurality of transducers 9 are arranged so that one transducer 9 is positioned above one unit shutter device 2. Then, the ion beam IB is emitted from the ion gun 120 and the unit shutter device 2 is opened to irradiate the vibrator 9 with the ion beam IB, and a part of the vibrator 9 (for example, a part of the electrode). Remove. Thereby, the mass of the vibrator 9 is reduced and the resonance frequency is increased. When the resonance frequency of the vibrator 9 reaches a predetermined value due to the irradiation of the ion beam IB, the unit shutter device 2 is immediately closed to prevent the ion beam IB from being further irradiated onto the vibrator 9. By controlling such control independently for each unit shutter device 2, the resonance frequency of each vibrator 9 can be adjusted independently. A method for adjusting the frequency of the vibrator 9 using the frequency adjusting device 100 will be described in detail later.

Next, the shutter device 1 will be described in detail.
The support portion 8 includes a first base plate 81, a second base plate 82, and a guide support portion 83. The first and second base plates 81 and 82 each have a plate shape in which the thickness direction is the z-axis direction and spreads in the xy plane. Further, the second base plate 82 is provided above the first base plate 81 and is fixed to the first base plate 81 via a plurality of support columns 84. The guide support portion 83 supports a pair of guide portions 71 and 72 included in the guide means 7 and is fixed to the first and second base plates 81 and 82.

  The constituent material of the support portion 8 (the first base plate 81, the second base plate 82, and the guide support portion 83) is not particularly limited. For example, iron, nickel, cobalt, copper, manganese, aluminum, magnesium And various metals such as these, alloys or intermetallic compounds containing at least one of these, and oxides, nitrides, carbides, and the like of these metals.

Next, the configuration of the unit shutter device 2 will be described. Since the configurations of the plurality of unit shutter devices 2 are the same as each other, the following description will be made on the basis of one unit shutter device 2 and the other shutters. The description is omitted.
The shielding part 31 has a plate shape with a thickness in the z-axis direction, and extends in the x-axis direction. The width (the length in the y-axis direction) of the shielding part 31 is not particularly limited, and varies depending on the size of the vibrator 9, but is preferably about 1 mm or more and 2 mm or less, for example. By setting it as such a width | variety, the shielding part 31 can be made small enough.

  Such a shielding part 31 is provided so as to be able to reciprocate in the x-axis direction, but the movement distance (displacement length) of the shielding part 31 is not particularly limited, and is, for example, about 1 to 5 mm. Is preferred. Thereby, while being able to set it as the movement distance sufficient to select the acceptance | permission and interruption | blocking of the passage of ion beam IB, the movement distance of the shielding part 31 can be suppressed. Therefore, the unit shutter device 2 can be changed from the open state to the closed state or from the closed state to the open state more quickly and in a short time.

  Such a shielding part 31 is made of, for example, carbon, titanium or the like having excellent ion etching resistance as a constituent material. Thereby, damage and abrasion of the shielding part 31 by the ion beam IB can be suppressed effectively. Moreover, by comprising the shielding part 31 with such a material, the shielding part 31 can be reduced in weight, and the reactivity and moving speed of the shielding part 31 can be improved.

In addition, the shielding part 31 is, for example, various metals such as iron, nickel, cobalt, copper, manganese, aluminum, and magnesium, or an alloy or intermetallic compound including at least one of these, and further, these metals. A structure in which a DLC (diamond-like carbon) film having excellent ion etching resistance is formed on the surface of a main body made of oxide, nitride, carbide, or the like can also be used.
The drive unit 4 is a drive source for sliding (reciprocating) the shielding unit 31 in the x-axis direction. The driving unit 4 is not particularly limited as long as the shielding unit 31 can be slid in the x-axis direction.

  In this embodiment, a direct-acting solenoid actuator is used as the drive unit 4, and includes a main body 41 and a shaft 42 that can reciprocate in the x-axis direction with respect to the main body 41. By using such a linear solenoid actuator, the drive unit 4 can be reduced in size, and the driving force from the drive unit 4 can be efficiently transmitted to the shutter unit 3.

  The solenoid actuator constituting the driving unit 4 is preferably a self-holding solenoid actuator. A self-holding solenoid actuator is, for example, a built-in permanent magnet in a solenoid actuator, which can obtain an adsorption holding force (non-excitation adsorption force) due to the magnetic force of the permanent magnet even in a non-energized state, and keeps it for a long time. Is possible. Further, since the attracting force of the permanent magnet is used, the moving speed of the shaft 42 in the attracting direction can be increased. In addition, since power is supplied only during operation, power saving drive can be realized, and further, heat generation of the coil can be suppressed.

  In such a self-holding solenoid actuator, energization is performed so that the electromagnetic force of the exciting coil is added to the magnetic force of the built-in permanent magnet, and the attractive force is increased to attract the movable iron core. On the other hand, in order to restore (open) the movable iron core that is held (non-excited) during non-excitation, an attractive current is applied to the coil to reverse the magnetic force of the permanent magnet to reduce the adsorption holding force. The movable iron core is pulled apart by the return force of a spring or the like (spring). The shaft 42 is moved in the x-axis direction using such movement of the movable iron core.

  As will be described later, the shaft 42 of the drive unit 4 is coupled to the shielding unit 31 via the coupling unit 32. Therefore, when the shaft 42 of the drive unit 4 is moved to the right side in FIG. 2 (the + direction side of the x axis) so as to protrude from the main body 41, the shutter unit 3 moves to the right side in FIG. By the movement, the unit shutter device 2 changes from the open state to the closed state. On the contrary, when the shaft 42 of the drive unit 4 is moved to the left side in FIG. 2 so as to be retracted into the main body 41 (the negative direction side of the x axis), the shutter unit 3 is moved to the right side in FIG. The unit shutter device 2 is moved from the closed state to the opened state by the movement.

  In the drive part 4, it is preferable to move the shaft 42 to the right side in FIG. 2 by the return force of the spring. The moving speed of the movable iron core when using the attracting force of the permanent magnet and the moving speed of the moving iron core when using the return force of the spring are faster when the return force of the spring is used. Therefore, the unit shutter device 2 can be changed from the open state to the closed state in a shorter time, and the ion beam IB can be cut off more quickly when the vibrator 9 reaches a predetermined resonance frequency. That is, the time difference between the time when the command (signal) for closing the unit shutter device 2 is issued and the time when the unit shutter device 2 is actually closed in response to the command can be further shortened. The frequency of the vibrator 9 can be adjusted to a predetermined value with higher accuracy.

The connecting part 32 has a function of connecting the shaft 42 of the driving part 4 and the shielding part 31 and transmitting the driving force from the driving part 4, that is, the displacement of the shaft 42 in the x-axis direction to the shielding part 31. As shown in FIG. 2, the connecting portion 32 has a substantially “L” shape, and includes a first connecting portion 321 and a second connecting portion 322.
The first connecting portion 321 extends in the x-axis direction and supports the shielding portion 31 at the tip portion. Specifically, as shown in FIG. 4, a pair of protrusions 321 a and 321 b that are spaced apart in the x-axis direction and protrude upward (in the + direction side of the z-axis) are provided at the tip of the first connecting portion 321. Is formed. On the other hand, the shielding part 31 is formed with a pair of through holes 311 and 312 that engage with the pair of protrusions 321a and 321b. By inserting the protrusions 321a and 321b into the through holes 311 and 312, the shielding part 31 is shielded. The part 31 is supported by the first connecting part 321. Here, it is preferable that the shielding part 31 is detachably supported with respect to the first connecting part 321. Thereby, replacement | exchange of the shielding part 31 which is a consumable can be performed easily.

Further, the width (length in the y-axis direction) of the first connecting portion 321 is designed to be smaller than the width (length in the y-axis direction) of the shielding portion 31. In addition, the central axis of the first connecting part 321 coincides with the central axis of the shielding part 31 in a plan view (xy planar view) of the shielding part 31.
The second connecting portion 322 extends in the y-axis direction, and connects the base end portion of the first connecting portion 321 and the shaft 42.

  According to the connecting part 32 having such a shape, the shaft 42 of the driving part 4 and the shielding part 31 of the shutter part 3 can be shifted in the y-axis direction with a simple configuration. More specifically, as shown in FIG. 2, the drive axis (center axis) x1 of the shaft 42 and the drive axis (center axis) x2 of the shielding part 31 can be shifted in the y-axis direction. Therefore, regardless of the size of the drive unit 4, the shielding units 31 of the plurality of unit shutter devices 2 can be arranged side by side with a narrow pitch in the y-axis direction.

Moreover, in the connection part 32 of this embodiment, the 1st connection part 321 and the 2nd connection part 322 are integrally formed. Thereby, the connection part 32 can be formed easily. Such a connection part 32 can be easily formed by, for example, bending a plate-like long member at a substantially right angle in the middle thereof.
As shown in FIG. 4, the connecting portion 32 corrects the positional deviation in the z-axis direction between the shielding portion 31 and the shaft 42, if necessary, in the middle of the z-axis direction (z-axis component). May have a portion extending in a direction including In other words, the connecting portion 32 may have a shape having a step in the z-axis direction.

The constituent material of the connecting portion 32 is not particularly limited, and for example, various metals such as iron, nickel, cobalt, copper, manganese, aluminum, and magnesium can be used. Among these, it is preferable to use a lightweight and good workability material such as aluminum.
Such a connection part 32 is supported by a pair of guide parts 71 and 72, and its movement is guided. The pair of guide portions 71 and 72 will be described in detail later.

The regulating means 6 has a function of regulating the movement of the shutter unit 3. As shown in FIG. 2, such a restricting means 6 has a pair of stoppers 61 and 62 provided on the support portion 8 so as to sandwich the second connecting portion 322 in the x-axis direction. Therefore, the second connecting portion 322 can move in the x-axis direction between the pair of stoppers 61 and 62.
Specifically, when the second connecting portion 322 contacts the stopper 61, further protrusion of the shaft 42 (movement toward the front end side), that is, further movement of the shutter portion 3 toward the front end side is restricted. The

On the contrary, when the second connecting portion 322 contacts the stopper 62, further retraction (movement toward the base end side) of the shaft 42, that is, further movement of the shutter portion 3 toward the base end side is restricted. The
Thereby, the movement of the shutter part 3 can be controlled and the shutter part 3 can be moved by the same movement distance every time. Therefore, the resonance frequency of the vibrator 9 can be adjusted in the same manner every time, and high-accuracy frequency adjustment is possible.

  If the moving distance of the shutter unit 3 changes, the time taken for the unit shutter device 2 to change from the open state to the closed state, more specifically, a command for closing the unit shutter device 2 ( The time from when the signal) is issued until the unit shutter device 2 is actually completely closed in response to the command is changed. When the time required for the unit shutter device 2 to change from the open state to the closed state changes in this way, the irradiation time of the ion beam IB to the vibrator 9 changes accordingly, and the mass of the vibrator 9 is more than necessary. Or the resonance frequency of the vibrator 9 deviates from a predetermined frequency. That is, if the moving distance of the shutter unit 3 changes, the resonance frequency of the vibrator 9 may not be adjusted with high accuracy.

  The configuration of the unit shutter device 2 has been described in detail above. In the unit shutter device 2 having such a configuration, the state where the second connecting portion 322 is in contact with the stopper 61, that is, the state shown in FIG. 5A is a closed state where the irradiation of the ion beam IB to the vibrator 9 is blocked. It is. Therefore, when the driving unit 4 is driven from the closed state to move the shutter unit 3 to the proximal end side, the second connecting unit 322 contacts the stopper 62, and as shown in FIG. Becomes an open state in which irradiation of the vibrator 9 with the ion beam IB is permitted. On the other hand, when the drive unit 4 is driven from the open state to move the shielding unit 31 to the distal end side, the second connecting portion 322 comes into contact with the stopper 61 and the closed state described above as shown in FIG. It becomes.

Next, the arrangement of the plurality of unit shutter devices 2 will be described.
As shown in FIG. 2, the shielding portions 31 of the plurality of shutter portions 3 are arranged in parallel along the y-axis direction. In addition, although it does not specifically limit as a separation distance of a pair of adjacent shielding part 31, It is preferable that it is about 0.1 mm or more and 0.5 mm or less. Thereby, since the some shielding part 31 can be arranged with a sufficiently narrow pitch, size reduction of the shutter apparatus 1 can be achieved. In addition, since more shielding portions 31 can be arranged in a predetermined region, the number of vibrators 9 that can adjust the resonance frequency at the same time can be increased, and the resonance frequency of the vibrator 9 can be adjusted. Can be done efficiently.

  The plurality of shielding portions 31 are located on the same plane parallel to the xy plane (a plane formed by the x axis and the y axis). Thereby, the separation distance between the shielding unit 31 and the corresponding vibrator 9 can be made equal among the plurality of shutter units 3. Therefore, each vibrator 9 can be irradiated with the ion beam IB under the same conditions, and the resonance frequency of the vibrator 9 can be adjusted efficiently.

If the separation distance between the shielding unit 31 of the shutter unit 3 and the vibrator 9 is different among the plurality of shutter units 3, that is, in a certain unit shutter device 2, the separation distance between the shielding unit 31 and the vibrator 9 is If the distance between the shielding part 31 and the vibrator 9 is long in the other unit shutter devices 2, the following problems occur.
In the unit shutter device 2 with the longer separation distance, the ion beam IB that has passed through the open shutter unit 3 is more circulated than the unit shutter device 2 with the shorter separation distance. As the wraparound of the ion beam IB increases, the ion beam IB is not efficiently irradiated to a predetermined position of the vibrator 9, and the amount of mass decrease per unit time of the vibrator 9 decreases, or the side surface of the vibrator 9 In other words, a portion that is not desired to be removed is removed, and the accuracy of adjusting the resonance frequency of the vibrator 9 is deteriorated. Therefore, if the separation distance between the shielding unit 31 and the vibrator 9 is different among the plurality of unit shutter devices 2, the speed at which the mass is reduced between the plurality of vibrators 9 and the area to be removed are different. The vibrator 9 cannot be processed under the same conditions. Thereby, the precision of the resonance frequency adjustment of the vibrator 9 is lowered, or the resonance frequency adjustment is complicated.

Next, the arrangement of the plurality of drive units 4 will be described.
The first base plate 81 includes a drive unit 4 (4 ′) connected to a plurality of odd-numbered shutter units 3 (3 ′) from the lower side in FIG. 2 and FIG. They are arranged in the same order. On the other hand, on the second base plate 82, a drive unit 4 (4 '') connected to a plurality of even shutter units 3 (3 '') from the lower side in FIGS. Arranged in the same order as the order.

  A description will be given of the plurality of drive units 4 ′ arranged on the first base plate 81. The width (length in the y-axis direction) of each drive unit 4 ′ is larger than the width of the shielding unit 31 ′ of the shutter unit 3 ′. wide. Further, the separation distance between the pair of adjacent drive portions 4 ′ is wider than the separation distance between the shielding portions 31 ′ of the pair of adjacent shutter portions 3 ′. Therefore, the plurality of driving units 4 ′ are arranged so as to spread over a wider area in the y-axis direction than the plurality of shutter units 3 ′.

  Further, the distance in the y-axis direction between the movement axis x1 of the shaft 42 of the drive unit 4 ′ and the movement axis x2 of the shielding unit 31 ′ of the shutter unit 3 ′ corresponding to the drive unit 4 ′ is the lower side in FIG. The unit shutter device 2 ′ gradually increases from the unit shutter device 2 ′ toward the upper unit shutter device 2 ′. Therefore, the length of the second connecting portion 322 ′ of the connecting portion 32 ′ connecting them is also gradually increased from the lower unit shutter device 2 ′ toward the upper unit shutter device 2 ′ in FIG. 3.

  The plurality of drive units 4 ′ are arranged along the direction inclined with respect to the x-axis and the y-axis, and the drive unit 4 ′ and the shielding unit 31 of the shutter unit 3 ′ corresponding to the drive unit 4 ′. 3 is gradually decreased from the unit shutter device 2 ′ on the lower side (the + direction side of the y axis) in FIG. 3 toward the unit shutter device 2 ′ on the upper side (the − direction side of the y axis). doing. Therefore, the length of the first connecting portion 321 ′ of the connecting portion 32 ′ connecting them is gradually reduced from the lower unit shutter device 2 ′ to the upper unit shutter device 2 ′ in FIG. 3.

  In this way, by configuring the plurality of connecting portions 32 ′ so that the length of the first connecting portion 321 ′ decreases as the length of the second connecting portion 322 ′ increases, a plurality of units can be obtained. The shift of the entire length of the connecting portion 32 ′ (the sum of the length of the first connecting portion 321 ′ and the length of the second connecting portion 322 ′) between the shutter devices 2 ′ can be reduced. For this reason, for example, it is possible to reduce the deviation of the weight of the connecting portion 32 ′ between the plurality of unit shutter devices 2 ′. Can be approximately equal. In addition, it is preferable that the full length of several connection part 32 'is mutually equal. Thereby, said effect becomes more remarkable.

  Similarly, a description will be given of the plurality of driving units 4 ″ arranged on the second base plate 82. The width (length in the y-axis direction) of each driving unit 4 ″ is the shielding unit 31 of the shutter unit 3 ″. The separation distance between a pair of adjacent drive sections 4 "is wider than the separation distance between the shielding sections 31" of a pair of adjacent shutter sections 3 ". Therefore, the plurality of drive sections 4" The plurality of shutter portions 3 ″ are arranged so as to spread over a wider area in the y-axis direction than the plurality of shutter portions 3 ″.

  Further, the distance in the y-axis direction between the movement axis x1 of the shaft 42 of the drive unit 4 ″ and the movement axis x2 of the shielding unit 31 ″ of the shutter unit 3 ″ corresponding to the drive unit 4 ″ is the lower side in FIG. It gradually increases from the unit shutter device 2 ″ on the + direction side of the y axis toward the unit shutter device 2 ″ on the upper side (− direction side of the y axis). For this reason, the length of the second connecting portion 322 ″ of the connecting portion 32 ″ for connecting them also gradually increases from the lower unit shutter device 2 ″ to the upper unit shutter device 2 ″ in FIG.

  The plurality of drive units 4 ″ are arranged along a direction inclined with respect to the x-axis and the y-axis, and the drive unit 4 ″ and the shielding unit 31 of the shutter unit 3 ″ corresponding to the drive unit 4 ″. 2 is gradually decreased from the lower unit shutter device 2 ″ in FIG. 2 toward the upper unit shutter device 2 ″. For this reason, the distance of the connecting portion 32 ″ connecting them is reduced. The length of one connecting portion 321 ″ is also gradually reduced from the lower unit shutter device 2 ″ in FIG. 2 toward the upper unit shutter device 2 ″.

As described above, the plurality of connecting portions 32 ″ are configured such that the length of the first connecting portion 321 ″ decreases as the length of the second connecting portion 322 ″ increases. The shift of the entire length of the connecting portion 32 ″ (the sum of the length of the first connecting portion 321 ″ and the length of the second connecting portion 322 ″) between the shutter devices 2 ″ can be reduced. For example, the shift of the weight of the connecting portion 32 ″ can be reduced between the shutter devices 2 ″, and the operability (such as the moving speed of the shutter portion 3 ″) of the plurality of unit shutter devices 2 ″ can be made substantially equal to each other. The total length of the plurality of connecting portions 32 ″ is preferably equal to each other, and more preferably the same as the total length of the connecting portions 32 ′. Thereby, said effect becomes more remarkable.
The arrangement of the plurality of unit shutter devices 2 has been described above.

  As described above, in each unit shutter device 2, the movement axis x1 of the drive unit 4 and the movement axis x2 of the shielding unit 31 of the shutter unit 3 are shifted in the y-axis direction. The amount of displacement (separation distance) of the movement axes x1 and x2 in the y-axis direction can be set independently by each unit shutter device 2 by adjusting the length of the second connecting portion 322 of the connecting portion 32. it can. According to such a configuration, the arrangement of the plurality of shielding portions 31 and the arrangement of the plurality of driving units 4 corresponding thereto can be set independently. In other words, it is not necessary to consider the arrangement of the plurality of driving units 4 when setting the arrangement of the plurality of shielding parts 31.

Therefore, the plurality of shielding portions 31 can be arranged (arranged) at a narrower pitch in the y-axis direction. Thereby, size reduction of the shutter apparatus 1 can be achieved. In addition, more shutter units 3 can be arranged in a predetermined area.
In the present embodiment, since the plurality of driving units 4 are divided into a plurality of stages (two stages) in the z-axis direction and supported by the support unit 8, the spread of the xy plane of the shutter device 1 can be suppressed. Further downsizing can be achieved. Note that the plurality of drive units 4 may be supported by the support unit 8 in three or more stages, or may be supported by one stage. The number of steps to be supported can be set as appropriate depending on the shape of the chamber 110, the number and size of the driving units 4, and the like.

  In the present embodiment, for example, in the first base plate 81, the connection portion 32 ′ corresponding to the predetermined drive portion 4 ′ is restricted from moving in the x-axis direction by the pair of stoppers 61 and 62. Yes. The stopper 61 functions as a stopper 62 of the connecting portion 32 ′ corresponding to the driving portion 4 ′ adjacent to the upper side of the predetermined driving portion 4 ′ in FIG. 2, and the stopper 62 is a diagram of the predetermined driving portion 4 ′. 2 may function as a stopper 61 of the connecting portion 32 ′ corresponding to the driving portion 4 ′ adjacent to the lower side in the middle. The same applies to the drive unit 4 ″ supported by the second base plate 82. Thus, the stopper 61 and the stopper 62 of the predetermined unit shutter device 2 are replaced by the stoppers 62 of the other unit shutter devices 2. By also serving as the stopper 61, it is possible to reduce the number of components of the shutter device 1. Therefore, the shutter device 1 can be downsized.

Next, the guide means 7 for guiding the shutter unit 3 of each unit shutter device 2 will be described.
The guide means 7 includes a pair of guide portions 71 and 72 and rotation means 73 and 74 that rotate the guide portions 71 and 72. The pair of guide portions 71 and 72 support the shutter portion 3 by the connecting portion 32 (first connecting portion 321), and guide the movement of the first connecting portion 321 in the x-axis direction, thereby moving the shielding portion 31. It is configured to guide you. The pair of guide portions 71 and 72 are provided apart from each other in the x-axis direction. Thereby, since the 1st connection part 321 can be supported by two different points spaced apart in the x-axis direction, the 1st connection part 321 can be supported stably, and the 1st connection part 321 can be z It is possible to smoothly slide the guide portions 71 and 72 in the x-axis direction while suppressing the axial displacement.

Hereinafter, although the guide parts 71 and 72 are demonstrated, since a pair of guide parts 71 and 72 are the mutually same structures, below, the one guide part 71 is demonstrated and the description about the guide part 72 is abbreviate | omitted. To do.
As shown in FIGS. 6 and 7, the guide portion 71 includes a columnar main body 711 and a plurality of guide grooves (concave portions) 712 that open to the side surface (outer periphery) of the main body 711. In other words, the guide portion 71 includes a columnar main body 711 and a plurality of convex portions 719 that protrude from the side surface of the main body 711 and are spaced apart from each other in the y-axis direction. Guide grooves 712 are formed. The guide means 7 of each unit shutter device 2 has one guide groove 712.

  The main body 711 has a cylindrical shape extending in the y-axis direction. Such a main body 711 is supported at both ends by the guide support portion 83 so as to be rotatable around the central axis y1. The constituent material of the main body 711 is not particularly limited. For example, various metals such as iron, nickel, cobalt, copper, manganese, aluminum, magnesium, zinc, lead, tin, titanium, and tungsten, or among these metals An alloy containing at least one kind or an intermetallic compound can be used. Among these, examples of the alloy include various aluminum alloys such as stainless steel, general structural rolled steel (JIS G 3101), Inconel, and other duralumin.

  Each of the plurality of guide grooves 712 has an annular shape (ring shape) that opens to the side surface of the main body 711 and extends in the circumferential direction of the main body 711. The plurality of guide grooves 712 are spaced apart in the y-axis direction and formed at an equal pitch. The first connecting portion 321 is slidably engaged with each guide groove 712. Accordingly, each guide groove 712 functions as a guide for guiding the movement of the first connecting portion 321 in the x-axis direction.

  As shown in FIG. 6, the guide groove 712 has a substantially U-shaped cross section, and includes a bottom surface 712a and a pair of side surfaces (step surfaces) 712b that are orthogonal to the bottom surface 712a and face each other in the y-axis direction. Have. The first connecting portion 321 is slidably engaged with the groove 712, and the bottom surface 712a of the guide groove 712 and the lower surface of the first connecting portion 321 are in contact with each other. Thus, the first connecting portion 321 is supported by the guide groove 712 in a state where displacement in the z-axis direction is prevented by the bottom surface 712a and displacement in the y-axis direction is prevented by the pair of side surfaces 712b. Therefore, the first connecting portion 321 can be slid in the x-axis direction smoothly and stably with respect to the guide groove 712.

  Further, since the guide groove 712 has a ring shape with the central axis y1 as the central axis, the bottom surface 712a and the lower surface of the first connecting portion 321 extend in the y-axis direction and are in line contact. That is, the contact portion 300 between the bottom surface 712a and the first connecting portion 321 has a linear shape (linear shape) extending in the y-axis direction. Thereby, the contact area between the bottom surface 712a and the first connecting portion 321 is reduced, and the frictional force in the x-axis direction generated between the bottom surface 712a and the first connecting portion 321 can be reduced. Therefore, the first connecting portion 321 can be smoothly slid with respect to the guide groove 712, whereby the shutter portion 3 can be stably moved in the x-axis direction and the moving speed is increased. Can do.

The “line contact” has a certain width in the x-axis direction, and this width is, for example, 0.5 mm or less. In other words, the “line contact” includes a contact portion 300 having a length in the x-axis direction of 0.5 mm or less.
Thus, the guide groove 712 has a ring shape, so that the contact portion 300 can be easily formed in a linear shape extending in the y-axis direction.

  In the present embodiment, since the main body 711 has a columnar shape, the contact area between the side surface 712b of the guide groove 712 and the first connecting portion 321 can be reduced. Therefore, the frictional force that can be generated in the contact between the first connecting portion 321 and the side surface 712b when the first connecting portion 321 slides with respect to the guide groove 712 can be suppressed as much as possible. Thereby, the 1st connection part 321 can be slid more smoothly with respect to the guide groove 712. FIG.

  Further, as described above, the first connecting portion 321 has a width (length in the y-axis direction) L2 that is shorter than the width L1 of the shielding portion 31. Therefore, the length of the contact part 300 in the y-axis direction can be shortened, and the contact area between the bottom surface 712a and the first connecting part 321 can be further reduced. Thereby, the frictional force in the x-axis direction generated between the bottom surface 712a and the first connection portion 321 can be further reduced, and the first connection portion 321 can slide more smoothly with respect to the guide groove 712. Can do.

  The width L2 of the first connecting part 321 is not particularly limited as long as it is smaller than the width L1 of the shielding part 31, but is preferably about 0.3 mm or more and 1.0 mm or less. Thereby, the said effect can be exhibited more effectively, maintaining the mechanical strength of the 1st connection part 321. FIG. In addition, as width L2, the part which can be located in the guide groove 712 should just satisfy the relationship of L1> L3> L2 mentioned later, and may be L3 or more about another part.

  The width L3 of the guide groove 712 is preferably slightly larger than the width L2 of the first connecting portion 321. Specifically, the width L2 of the guide groove 712 is preferably larger than the width L2 of the first connecting portion 321 by about 0.05 mm or more and 0.2 mm or less. This prevents excessive contact between the first connecting portion 321 and the side surface 712b when the first connecting portion 321 slides with respect to the guide groove 712, and between the first connecting portion 321 and the side surface 712b. The frictional force that can be generated can be suppressed as much as possible. In addition, an excessively large gap is prevented from being formed between the first connecting portion 321 and the side surface 712b, and displacement of the first connecting portion 321 in the y-axis direction can be effectively suppressed. Therefore, the first connecting portion 321 can be smoothly and stably slid with respect to the guide groove 712 in the x-axis direction.

  As shown in FIG. 6, the width L3 of the guide groove 712 (the separation distance between a pair of adjacent convex portions 719) L3 is smaller than the width L2 of the shielding portion 31. That is, L1 to L3 satisfy the relationship L1> L3> L2. Accordingly, the guide grooves 712 can be formed in accordance with the arrangement pitch of the shielding portions 31. In other words, the plurality of shielding portions 31 can be arranged in parallel in the y-axis direction at a narrower pitch. Therefore, the shutter device 1 can be downsized. If the width L3 of the guide groove 712 is larger than the width L1 of the shielding part 31, the shielding part 31 must be arranged in parallel in the y-axis direction according to the formation pitch of the guide groove 712. The installation pitch becomes large, and the shutter device 1 cannot be downsized.

  As shown in FIG. 6, each guide groove 712 is located inside the shielding part 31 in the y-axis direction. In other words, the guide groove 712 is located between a pair of straight lines A1 and A2 that intersect with both ends of the shielding portion 31 in the y-axis direction and extend in the z-axis direction. Thereby, the some shielding part 31 can be arranged in parallel by the y-axis direction with a narrower pitch. Therefore, the shutter device 1 can be downsized.

  The depth of the guide groove 712 is not particularly limited, but is preferably about 0.1 mm or more and 1 mm or less. Accordingly, the height of the side surface 712b is sufficiently high to guide the movement of the shutter unit 3 in the x-axis direction, and the contact area when the side surface 712b and the first connecting portion 321 are in contact with each other is reduced. The excessive increase in the frictional force that can occur between these can be suppressed. Therefore, the first connecting portion 321 can be smoothly and stably slid in the x-axis direction with respect to the guide groove 712 while suppressing the frictional force that can be generated between the first connecting portion 321 and the side surface 712b as much as possible. it can.

In the present embodiment, a coating layer 713 that reduces frictional resistance generated between the groove 712 and the first connecting portion 321 is formed on the inner surface of the groove 712. As a result, the frictional force generated between the first connecting portion 321 and the guide groove 712 can be further reduced, and the first connecting portion 321 can slide smoothly and stably in the x-axis direction with respect to the guide groove 712. Can be moved.
The covering layer 713 can be composed of, for example, a metal plating film. By forming the coating layer 713 with a metal plating film, the coating layer 713 can be provided with wear resistance in addition to low friction. Therefore, the wear and deterioration of the coating layer 713 due to the sliding with the first connecting portion 321 can be effectively suppressed, and the change with time of the sliding property of the first connecting portion 321 with respect to the guide groove 712 can be suppressed. it can.

  The metal plating film is not particularly limited, and is selected from the group consisting of, for example, nickel plating, molybdenum plating, tin plating, chrome plating, cranifron plating, Kanigen plating, iron alloy plating, aluminum alloy plating, and copper alloy plating. It is preferable that it is at least one kind. Of these, craniflon plating is particularly preferable. Kaniflon plating has a good balance between low friction and wear resistance compared to other metal plating films, and can exhibit these at a sufficiently high level at the same time. As a method for producing the metal plating film, for example, electrolytic plating or electroless plating can be used.

  Note that the coating layer 713 is not limited to being formed of a metal plating film. For example, polyolefin such as polyethylene and polypropylene, polyvinyl chloride, polyester (PET, PBT, etc.), polyamide, polyimide, polyurethane, polystyrene, It may be a resin film made of polycarbonate, silicone resin, fluorine-based resin (PTFE, ETFE, etc.), or a composite material thereof. Such a resin film can also exhibit low friction.

The diameter of the main body 711 is not particularly limited, and is preferably about 3 mm or more and 10 mm or less, for example. Accordingly, the curvature of the bottom surface 712a of the guide groove 712 is sufficiently large even when the depth of the guide groove 712 is not excessively deep, that is, when the preferable range is 0.1 to 1 mm. can do. Therefore, the contact area between the first connecting portion 321 and the bottom surface 712a (the length of the contact portion 300 in the x-axis direction) can be further reduced, and the frictional resistance therebetween can be further reduced. Therefore, the first connecting portion 321 can be slid more smoothly and stably with respect to the guide groove 712.
The guide unit 71 has been described above.

The guide portions 71 and 72 having such a configuration are rotatably supported (axially supported) on the guide support portion 83 at both ends thereof. These guide portions 71 and 72 can be rotated by rotating means 73 and 74.
The rotation means 73 and 74 have a drive source such as a motor (for example, a stepping motor), and the guide portions 71 and 72 can be rotated around the y axis (center axis) by driving the drive source. These rotation means 73 and 74 can be controlled independently, and the guide parts 71 and 72 can be rotated independently. By having such rotating means 73 and 74, the following effects can be exhibited.

  That is, the first connecting portion 321 slides with respect to the bottom surface 712a of the guide groove 712, and the sliding is repeated, whereby the contact portion 300 of the bottom surface 712a is worn by friction generated by the sliding, so that the contact portion 300 is worn. The surface roughness of the surface becomes rough or the contact portion 300 becomes flat. When such a problem occurs, the frictional resistance between the bottom surface 712a and the first connecting portion 321 increases, and the slidability of the first connecting portion 321 with respect to the guide groove 712 deteriorates.

  Therefore, for example, when the wear of the contact portion 300 exceeds an allowable range, the guide portions 71 and 72 are rotated by the rotating means 73 and 74, and a different position of the bottom surface 712a is used as the new contact portion 300. An increase in frictional resistance between the bottom surface 712a and the first connecting portion 321 due to wear of the portion 300 can be suppressed. Therefore, the excellent slidability of the first connecting portion 321 with respect to the guide groove 712 can be maintained.

In particular, the guide groove 712 has an annular shape, and the curvature of the bottom surface 712a is equal throughout the extending direction. Further, the depth (the height of the side surface 712b) is the same in the entire region in the extending direction of the guide groove 712. That is, the cross-sectional shape is the same in the entire region in the extending direction of the guide groove 712. Therefore, each part of the bottom surface 712a can contact the first connecting part 321 under the same condition. Therefore, the entire region in the extending direction of the bottom surface 712a can be used as a new contact portion 300 under the same conditions, and the life of the guide portion 71 can be extended.
Although the guide means 7 has been described above, the rotation of the guides 71 and 72 by the rotation means 73 and 74 is carried out when necessary. Otherwise, the guide parts 71 and 72 are attached to the guide support part 83 so that the rotation does not occur. It is supported.
The frequency adjustment device 100 has been described above.

2. Frequency Adjustment Method Next, a frequency adjustment method for the vibrator 9 using the above-described frequency adjustment device 100 will be described.
The frequency adjustment of the vibrator 9 by the frequency adjusting device 100 is performed by arranging a plurality of vibrators 9 in the chamber 110 so that the single vibrator 9 is positioned immediately above the one shielding portion 31, and reducing the pressure in the chamber 110. It is performed in a state (preferably a vacuum state). Further, the detection is performed while intermittently detecting the resonance frequency of the vibrator 9, and the detection result is sent to a control means (not shown) in real time.

  Each of the plurality of vibrators 9 is preferably supported by a plate-like or sheet-like carrier. In this state, the frequency of the vibrator 9 is adjusted as follows. Since the method of adjusting the frequency of each vibrator 9 is the same as each other, a method for adjusting the frequency of one vibrator 9 will be described below, and a method for adjusting the frequency of another vibrator 9 will be described. Description is omitted.

First, the unit shutter device 2 is closed. Next, the ion gun 120 is turned on, and the ion beam IB is emitted upward. Then, the unit shutter device 2 is left in a closed state until the ion beam IB is stabilized. Next, the unit shutter device 2 is opened. When the unit shutter device 2 is opened, the ion beam IB is irradiated onto the vibrator 9, and a part of the vibrator 9, more specifically, a part of the electrode is removed. Due to the decrease, the resonance frequency of the vibrator 9 gradually increases. Next, when the resonance frequency of the vibrator 9 reaches a predetermined frequency, the unit shutter device 2 is closed. The adjustment of the resonance frequency of the vibrator 9 is completed through the above steps.
Thus, by adjusting the frequency (mass adjustment) of the vibrator 9 using the shutter device 1, the chamber 110 can be reduced in size, so that the frequency of the vibrator 9 can be adjusted efficiently. Can do.

  Further, as described above, since the sliding property of the first connecting portion 321 with respect to the guide groove 712 is excellent and the moving speed of the shutter portion 3 is fast, for example, in order to end the frequency adjustment, the unit shutter device 2 is provided. The time difference from the time when the command (signal) for closing the state is output to the time when the unit shutter device 2 is closed when the command is received can be further reduced. As a result, the deviation of the resonance frequency of the vibrator 9 from the target value can be further reduced, and the frequency of the vibrator 9 can be adjusted with high accuracy.

  Moreover, the fall of the slidability with respect to the guide groove 712 of the connection part 32 can be suppressed, and the moving speed of the shutter part 3 can be kept substantially constant. Therefore, the time difference from the time when the command (signal) for closing the unit shutter device 2 is output to the time when the unit shutter device 2 is closed in response to the command can be kept almost constant each time. Thereby, the output timing of the command can be easily corrected based on the time difference, and the frequency of the vibrator 9 can be adjusted with high accuracy.

Second Embodiment
Next, a second embodiment of the shutter device of the present invention will be described.
8 and 9 are plan views of the guide means included in the shutter device according to the second embodiment of the present invention.
Hereinafter, the shutter device according to the second embodiment will be described with a focus on differences from the above-described embodiment, and description of similar matters will be omitted.

The shutter device according to the second embodiment of the present invention is the same as that of the first embodiment described above except that the configuration of the guide means is different. In addition, the same code | symbol is attached | subjected to the structure similar to 1st Embodiment mentioned above. Since the guide means included in each unit shutter device have the same configuration, the guide means included in one unit shutter device will be representatively described below for convenience of explanation.
As shown in FIGS. 8 and 9, in the present embodiment, the shutter unit 3 is supported by the first base plate 81.

  Further, the guide means 7 included in each unit shutter device 2 includes a pair of convex portions 751 and 752 provided on the first base plate 81 and a pair of convex portions 761 and 762. The pair of convex portions 751 and 752 are separated in the y-axis direction, and the connecting portion 32 (first connecting portion 321) is positioned therebetween. Similarly, the pair of convex portions 761 and 762 are also separated in the y-axis direction, and the connecting portion 32 (first connecting portion 321) is positioned therebetween. The convex portions 751 and 761 are arranged side by side in the x-axis direction, and the convex portions 752 and 762 are also arranged side by side in the x-axis direction. Since the pair of convex portions 751 and 752 and the pair of convex portions 761 and 762 have the same configuration, the pair of convex portions 751 and 752 will be described as a representative, and the pair of convex portions 761 and 762 will be described below. The description of is omitted.

The convex portions 751 and 752 are provided so as to protrude from the upper surface of the first base plate 81 in the z-axis direction, and the side surfaces thereof constitute step surfaces. In addition, each of the convex portions 751 and 752 has a substantially cylindrical shape. The distance L3 between the convex portions 751 and 752 is larger than the width L2 of the first connecting portion 321 and smaller than the width L1 of the shielding portion 31. That is, L1 to L3 satisfy the relationship L1>L3> L2. Further, the space S between the convex portions 751 and 752 is located inside the shielding portion 31 in the y-axis direction. In other words, the space S is located between a pair of straight lines A1 and A2 that intersect with both ends of the shielding portion 31 in the y-axis direction and extend in the x-axis direction.
Thus, as in the first embodiment described above, the convex portions 731 and 732 can be formed in accordance with the arrangement pitch of the shielding portions 31, so that the plurality of shielding portions 31 are arranged at a narrower pitch in the y-axis direction. Can be installed side by side. Therefore, the shutter device 1 can be downsized.

  In the present embodiment, the convex portion 751 of the pair of convex portions 751 and 752 provided with the predetermined first coupling portion 321 (321A) interposed therebetween is the first coupling portion located next (upper side in FIG. 8). The convex portion 752 also serves as the convex portion 752 corresponding to the first connecting portion 322 located next to the opposite side (lower side in FIG. 8). In other words, the convex portion 751 included in the predetermined unit shutter device 2 and the convex portion 752 included in the unit shutter device 2 located adjacent to the predetermined unit shutter device 2 (upper side in FIG. 8) are integrally formed. A convex portion 752 included in the shutter device 2 and a convex portion 751 included in the unit shutter device 2 located adjacent to the convex portion 752 (lower side in FIG. 8) are integrally formed. Thereby, compared with the case where it does not form integrally, the arrangement space of the convex parts 731 and 732 can be made small. Therefore, the plurality of shielding portions 31 can be arranged in parallel in the y-axis direction at a narrower pitch.

Further, as described above, the convex portions 751 and 752 of the present embodiment each have a cylindrical shape. That is, the side surfaces of the convex portions 751 and 752 (surfaces facing the first connecting portion 321) are configured as curved convex surfaces that are convex toward the first connecting portion 321. Therefore, when the convex parts 751 and 752 and the 1st connection part 321 contact, these are line-contacted so that it may extend in az axis direction. Thereby, the contact area when the 1st connection part 321 and the convex parts 751 and 752 contact can be made smaller, and the friction which can generate | occur | produce between the 1st connection part 321 and the convex parts 751 and 752 is possible. The power can be reduced. Therefore, the 1st connection part 321 can be slid more smoothly.
Also according to the second embodiment, the same effects as those of the first embodiment described above can be exhibited.

<Third Embodiment>
Next, a third embodiment of the shutter device of the present invention will be described.
FIG. 10 is a plan view of a shutter unit included in the shutter device according to the third embodiment of the present invention.
Hereinafter, the shutter device according to the third embodiment will be described with a focus on differences from the above-described embodiment, and description of similar matters will be omitted.

  The shutter device according to the third embodiment of the present invention is the same as that of the above-described first embodiment except that the configuration of the shutter unit included in each unit shutter device is different. In addition, the same code | symbol is attached | subjected to the structure similar to 1st Embodiment mentioned above. In addition, since the shutter units included in each unit shutter device have the same configuration, the shutter units included in one unit shutter device will be described as a representative for convenience of explanation.

  As shown in FIG. 10, in the shutter portion 3 of the present embodiment, the width (the length in the y-axis direction) of the lower side portion of the first connecting portion 321 gradually decreases toward the lower side. In other words, the width of the lower end portion (the portion in contact with the first base plate 81) of the first connecting portion 321 is smaller than the width on the upper side thereof. Thereby, since the contact area of the 1st connection part 321 and the 1st base plate 81 reduces compared with 2nd Embodiment mentioned above, for example, the slidability of the 1st connection part 321 improves. Therefore, the shutter unit 3 can be moved more smoothly in the x-axis direction.

Also according to the third embodiment, the same effects as those of the first embodiment described above can be exhibited.
The shutter device of the present invention has been described based on the illustrated embodiment. However, the present invention is not limited to this, and the configuration of each part is replaced with an arbitrary configuration having the same function. can do. In addition, any other component may be added to the present invention. Moreover, you may combine each embodiment suitably.

In the above-described embodiment, the method of changing the resonance frequency of the vibrator by reducing the mass of the vibrator by the ion beam has been described. However, the present invention is not limited to this. For example, metal particles are attached to the vibrator by vapor deposition. The resonance frequency of the vibrator may be changed by increasing the mass of the vibrator.
In the above-described embodiment, the configuration in which the connecting portion 32 and the shielding portion 31 are formed as separate bodies has been described. However, as shown in FIGS. 11 and 12, the connecting portion 32 and the shielding portion 31 are integrated. It may be formed automatically. In addition, as illustrated in FIG. 13, the first connecting portion 321 may have a width (length in the y-axis direction) that changes in the z-axis direction.

  DESCRIPTION OF SYMBOLS 1 ... Shutter device 2, 2 ', 2 "... Unit shutter device 3, 3', 3" ... Shutter part 31, 31 ', 31 "... Blocking part 311, 312 ... Through-hole 32, 32', 32 "…… Connecting part 321, 321 ', 321" ... 1st connecting part 321a, 321b ... Projection 322, 322', 322 "... 2nd connecting part 4, 4 ', 4" ... Drive part 41 …… Body 42 …… Shaft 6 …… Regulating means 61, 62 …… Stopper 7 …… Guide means 71, 72 …… Guide part 711 …… Body 712 …… Guide groove 712a …… Bottom surface 712b …… Side surface 713 …… Coating layer 719 ... convex part 73, 74 ... rotating means 751, 752, 761, 762 ... convex part 8 ... support part 81 ... first base plate 82 ... second base plate 83 ... guide support part4... 9. Vibrator 10... Shutter assembly 100... Frequency adjusting device 110 .. Chamber 120... Ion gun 130 .. Shielding plate 300 .. Contact portion x1. ... Center axes L1, L2, L3 ... Width

Claims (4)

A shutter device capable of switching between an open state and a closed state,
When two axes orthogonal to each other are a first axis and a second axis, a direction parallel to the first axis is a first axis direction, and a direction parallel to the second axis is a second axis direction,
A shutter part capable of reciprocating in the first axis direction;
A drive unit that generates a drive force for moving the shutter unit in the first axis direction;
In order to guide the movement of the shutter portion in the first axial direction, the guide means provided with two step surfaces that are opposite to each other on the axis in the second axial direction,
The shutter portion is disposed between at least the two step surfaces and the shielding portion having a width in the second axial direction of L1, the width in the second axial direction is L2, and the shielding portion. A connecting portion for transmitting the driving force to
When the distance between the two step surfaces in the second axis direction is L3, the relationship of L2 <L3 <L1 is satisfied .
The shutter surface device is characterized in that the step surface is a convex curved surface . The two stepped surface, the shutter device according to claim 1, further comprising a plurality of sets in the first axial direction. The shielding portion, the shutter device according to claim 1 or 2 which is detachable from the connecting portion. The shutter device according to any one of claims 1 to 3 , wherein the shutter device is a shutter device for mass adjustment of a vibration device.

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