JP5710738B2 - Liquid processing method, liquid processing apparatus, and storage medium - Google Patents

Description

  The present invention relates to a liquid processing method, a liquid processing apparatus, and a storage medium.

  Conventionally, a rinsing liquid such as pure water is applied to a substrate to be processed (object to be processed) in which a plurality of fine convex portions are formed as a fine pattern on the surface side of the substrate body (main body portion), and the substrate is processed. A liquid processing method is known in which a rinsing liquid is applied to a substrate and then a drying process is performed. However, when such a liquid processing method is used, when the rinse liquid supplied to the substrate to be processed is dried, the surface tension of the rinse liquid acts between the convex portions protruding from the substrate body. However, adjacent convex portions may be pulled and collapsed.

  In order to prevent such collapse of the convex portion, the substrate to be processed is cleaned using a chemical solution, the chemical solution is removed using pure water, and then a water-repellent protective film is formed on the surface of the substrate to be processed. A technique is known (see Patent Document 1).

Japanese Patent No. 4403202

  However, when the surface of the substrate main body (base surface) and the surface of the convex portion are made entirely water-repellent, depending on the pattern shape or the like of the convex portion, the rinsing liquid is not necessarily applied to the substrate to be processed. It does not necessarily dry uniformly in the surface, and a portion where the rinse liquid is dried and a portion wetted with the rinse liquid may be mixed. In this case, the balance of the surface tension of the rinsing liquid acting on the convex portion on the substrate main body is lost between the portion where the rinse liquid is dried and the portion wetted with the rinse liquid. As a result, the convex portion collapses. There is a risk.

  The present invention has been made in consideration of such points, and when the rinse liquid is dried, the portion where the rinse liquid is dried and the portion wet with the rinse liquid are prevented from being mixed, and the convex portion Provided are a liquid processing method, a liquid processing apparatus, and a storage medium that can prevent the liquid from collapsing.

  A substrate processing method according to the present invention includes a main body portion and a plurality of convex portions projecting from the main body portion, and a substrate having a base surface formed on the main body portion and between the convex portions. In a liquid treatment method for treating a treatment object, a surface treatment step for making the ground surface of the object to be treated hydrophilic and making the surface of the convex portion water repellent, and the surface-treated object to be treated A rinsing liquid supply step for supplying a rinsing liquid to the processing body and a drying step for removing the rinsing liquid from the object to be processed are provided.

  A substrate processing apparatus according to the present invention includes a main body portion and a plurality of convex portions projecting from the main body portion, and a substrate having a base surface formed on the main body portion and between the convex portions. In a liquid processing apparatus for processing a processing object, a substrate holding mechanism for holding the object to be processed, a surface processing mechanism for performing a surface treatment on the object to be processed held by the substrate holding mechanism, and the object to be processed A rinsing liquid supply mechanism for supplying a rinsing liquid to the surface, and a control unit for controlling the surface treatment mechanism and the rinsing liquid supply mechanism, wherein the control unit controls the surface treatment mechanism to perform the processing. The rinsing liquid is applied to the surface-treated object by controlling the rinsing liquid supply mechanism so that the base surface of the body becomes hydrophilic and the surface of the convex portion becomes water repellent. It is characterized by supplying.

  The recording medium according to the present invention is a storage medium storing a computer program for causing a liquid processing apparatus to execute a liquid processing method. The liquid processing method includes a main body portion and a plurality of convex shapes protruding from the main body portion. A liquid processing method for processing a target object on which the base surface is formed on the main body part and between the convex parts, wherein the base surface of the target object is hydrophilized, And a surface treatment step for making the surface of the convex portion water-repellent, a rinsing liquid supply step for supplying a rinsing liquid to the surface-treated object, and from the object to be treated And a drying step for removing the rinse liquid.

  According to the present invention, the surface treatment process for surface-treating the object to be treated is provided before the rinse liquid supply process for supplying the rinse liquid to the object to be treated, so that the lower ground of the object to be treated becomes hydrophilic and convex. The surface of the shaped part is made water-repellent. As a result, when removing the rinsing liquid from the object to be processed, the portion where the rinsing liquid is dried and the part wet with the rinsing liquid are prevented from being mixed in the surface of the object to be processed, and the convex part collapses. This can be prevented.

It is a figure which shows the to-be-processed substrate (to-be-processed object) used for the liquid processing method in one embodiment of this invention. 1 is a side sectional view showing a configuration of a liquid processing apparatus according to an embodiment of the present invention. 1 is an upper plan view showing a configuration of a liquid processing apparatus according to an embodiment of the present invention. It is a flowchart which shows the liquid processing method by one embodiment of this invention. It is a schematic sectional drawing which shows the state of the to-be-processed substrate in each process of the liquid processing method by one embodiment of this invention. It is a sectional side view for demonstrating the principle that the convex part of a to-be-processed substrate collapses. It is a schematic sectional drawing which shows the to-be-processed substrate at the time of drying and removing the rinse liquid from a to-be-processed substrate. It is a flowchart which shows the liquid processing method by the modification of one embodiment of this invention. It is a flowchart which shows the liquid processing method by the modification of one embodiment of this invention. It is an upper top view which shows the structure of the liquid processing apparatus by the modification of one embodiment of this invention. It is a flowchart which shows the liquid processing method by the modification of one embodiment of this invention. It is a flowchart which shows the liquid processing method by the modification of one embodiment of this invention. It is side sectional drawing which shows another aspect of the to-be-processed substrate used by one embodiment of this invention. It is a schematic sectional drawing which shows a to-be-processed substrate at the time of drying and removing the rinse liquid from a to-be-processed substrate in a comparative example.

  Hereinafter, an embodiment of the present invention will be described with reference to FIGS.

Configuration of the object to be processed First, the structure of the substrate to be processed (object to be processed) used in the liquid processing method according to the present embodiment will be described with reference to FIGS. FIG. 1A is a schematic plan view showing a part of a substrate to be processed, and FIG. 1B is a schematic cross-sectional view showing a part of the substrate to be processed (II line in FIG. 1A). FIG.

As shown in FIGS. 1 (a) and 1 (b), a substrate to be processed (object to be processed) W used in the liquid processing method according to the present embodiment includes a plate-like substrate main body (main body) _Wi and a substrate. and a plurality of convex portions W _m which protrudes on the body portion W _i. Among the convex portions W _m is formed on the substrate body W _i in a predetermined pattern, respectively specifically comprises a cylinder (cylindrical) shape. As shown in FIG. 1 (a), the convex portion W _m are arranged at predetermined intervals in the vertical and horizontal as viewed from the plane.

Further, between the convex portion W _m a substrate main body W _i, underlying surface W _f is formed. Examples of the material constituting the underlying surface _{W f} of the substrate body _{W i,} for example SiN, Si, mention may be made of Si material of SiO _2, etc., as the material constituting the convex portion _{W m,} for example TiN Examples thereof include metal materials such as (titanium nitride), W (tungsten), Hf (hafnium), and Poly-Si. In the following, initially, underlying surface W _f of the substrate body W _i consists of water-repellent material (e.g. SiN), a case where the surface of the convex portion W _m of the material (e.g., TiN) is hydrophilic for example Although explained, it is not limited to this. Moreover, as such a to-be-processed substrate W, to-be-processed substrates, such as a semiconductor wafer, can be mentioned as an example, However, It is not limited to this.

Next, the configuration of the liquid processing apparatus according to this embodiment will be described with reference to FIGS. 2 and 3 are diagrams showing a liquid processing apparatus according to the present embodiment.

As shown in FIG. 2, the liquid processing apparatus 10 includes a substrate holding mechanism 50 that rotatably holds a substrate W to be processed. The substrate holding mechanism 50 includes a support plate 51 which is a hollow structure, provided on the support plate 51, and a support portion 57 for supporting and holding the substrate body W _i of the target substrate W .

A rotating shaft 52 that extends in the vertical direction and has a hollow structure is connected to the lower surface of the support plate 51. The hollow of the support plate 51, are arranged lift pin plate 55 having a contact capable of lift pins 55a on the rear surface (lower surface) of the substrate body W _i of the target substrate W. A lift shaft 56 extending in the vertical direction in the hollow of the rotary shaft 52 is connected to the lower surface of the lift pin plate 55.

  A lift driving unit 45 that moves the lift shaft 56 in the vertical direction is provided at the lower end of the lift shaft 56. Further, a cup 59 is provided outside the periphery of the support plate 51 to cover the periphery of the substrate W to be processed supported by the support portion 57 and the obliquely upper side thereof. In FIG. 2, only one lift pin 55 a is shown, but in reality, three lift pins 55 a are provided on the lift pin plate 55.

  Further, as shown in FIG. 2, the liquid processing apparatus includes a pulley 43 disposed on the outer periphery of the rotating shaft 52 and a motor 41 that applies a driving force to the pulley 43 via a driving belt 42. A drive mechanism 40 is further provided.

  The rotation drive mechanism 40 rotates the support shaft 57 around the rotation shaft 52 when the motor 41 rotates the rotation shaft 52. As a result, the rotation drive mechanism 40 is supported and supported by the support portion 57 of the substrate holding mechanism 50. The processed substrate W is rotated. A bearing 44 is disposed on the outer periphery of the rotating shaft 52.

  Further, as shown in FIG. 3, the liquid processing apparatus 10 includes a chemical liquid supply mechanism 20 that supplies a chemical liquid, a rinsing liquid, and a substitution accelerating liquid to the target substrate W held by the substrate holding mechanism 50, and a rinsing liquid. A supply mechanism 25 and a substitution promoting liquid supply mechanism 30 are provided. Further, the liquid processing apparatus 10 performs surface treatment on the substrate W to be processed, so that the lower ground (Si-based material, eg, SiN) of the substrate W to be processed becomes hydrophilic with respect to the rinsing liquid, and the convex portion A surface treatment mechanism 70 is further provided to make the surface (metallic material, for example, TiN) water repellent with respect to the rinsing liquid.

  Among these, the chemical solution supply mechanism 20 supplies the chemical solution to the substrate W to be processed supported by the support portion 57 of the substrate holding mechanism 50. The chemical solution supply mechanism 20 discharges the chemical solution supplied from the chemical solution supply pipe 22, the chemical solution supply pipe 22 that guides the chemical solution supplied from the chemical solution supply section 21, and the substrate to be processed W. And a liquid supply nozzle 23. A part of the chemical liquid supply pipe 22 passes through the liquid supply arm 11, and the liquid supply nozzle 23 is provided at the end of the liquid supply arm 11. Examples of the chemical solution used in the present embodiment include dilute hydrofluoric acid (DHF), sulfuric acid / hydrogen peroxide (SPM), and ammonia hydrogen peroxide (SC1), but are not limited thereto. .

  The rinse liquid supply mechanism 25 supplies a rinse liquid to the substrate W to be processed, and a rinse liquid supply that guides the rinse liquid supply unit 26 and the rinse liquid supplied from the rinse liquid supply unit 26. Tube 27. The liquid supply nozzle 23 is connected to the end of the rinse liquid supply pipe 27. A part of the rinse liquid supply pipe 27 passes through the liquid supply arm 11. In addition, as a rinse liquid used in this Embodiment, although pure water (DIW) can be used, for example, it is not restricted to this.

  The substitution promoting liquid supply mechanism 30 supplies a substitution promoting liquid to the substrate W to be processed. The substitution promoting liquid supply unit 31 and the substitution promoting liquid supplied from the substitution promoting liquid supply unit 31 are supplied. It has a substitution promoting liquid supply pipe 32 for guiding, and a substitution promoting liquid supply nozzle 33 connected to an end of the substitution promoting liquid supply pipe 32. A part of the substitution promoting liquid supply pipe 32 passes through the liquid supply arm 11. In addition, as a substitution acceleration | stimulation liquid used by this Embodiment, although amphiphilic liquids, such as IPA (isopropyl alcohol), PGMEA (propylene glycol monomethyl ether acetate), HFE (hydrofluoroether), can be used, for example. It is not limited to this.

  Further, as shown in FIG. 3, the surface treatment mechanism 70 includes a hydrophilic treatment liquid supply mechanism 71 and a water repellent treatment liquid supply mechanism 75.

Among hydrophilic treatment liquid supply mechanism 71 is for supplying the hydrophilic treatment liquid for hydrophilic underlying surface W _f of the water repellency of the treated the substrate W, supplies to a hydrophilic treatment liquid hydrophilic treatment liquid supply unit 72 A hydrophilic treatment liquid supply pipe 73 for guiding the hydrophilic treatment liquid supplied from the hydrophilic treatment liquid supply unit 72; a hydrophilic treatment connected to the hydrophilic treatment liquid supply pipe 73 and provided at the end of the liquid supply arm 11; And a liquid supply nozzle 74. A part of the hydrophilic treatment liquid supply pipe 73 passes through the liquid supply arm 11. As the hydrophilic treatment liquid used in the present embodiment, for example, a chemical liquid containing ozone water, a chemical liquid containing SPM, or the like can be used, but the invention is not limited thereto.

On the other hand, water-repellent liquid supply mechanism 75 is for supplying a water-repellent liquid for water repellent surface of the convex portion W _m of the hydrophilic treated the substrate W, supplies the water-repellent liquid A water repellent treatment liquid supply section 76, a water repellent treatment liquid supply pipe 77 for guiding the water repellent treatment liquid supplied from the water repellent treatment liquid supply section 76, and a water repellent treatment liquid supply pipe 77 connected to the liquid. A water repellent treatment liquid supply nozzle 78 is provided at the end of the supply arm 11. A part of the water repellent treatment liquid supply pipe 77 passes through the liquid supply arm 11. Examples of the water repellent treatment liquid used in the present embodiment include dimethylaminotrimethylsilane (TMSDMA), dimethyl (dimethylamino) silane (DMSDMA), 1,1,3,3-tetramethyldisilane (TMDS). A silylating agent such as hexamethyldisilazane (HMDS), a chemical solution containing a fluoropolymer, a surfactant, or the like can be used, but is not limited thereto.

  As shown in FIG. 3, the liquid processing apparatus 10 has a liquid supply arm moving unit 13 that swings the liquid supply arm 11 in the horizontal direction (a direction orthogonal to the rotation shaft 52) around the swing shaft 12. doing. Further, as shown in FIG. 2, the liquid processing apparatus 10 includes the liquid processing apparatus 10 itself, in particular, the chemical liquid supply mechanism 20, the rinse liquid supply mechanism 25, the substitution promoting liquid supply mechanism 30, the rotation drive mechanism 40, and the lift drive unit 45. A control unit 62 that controls the substrate holding mechanism 50 and the surface treatment mechanism 70 is also provided.

  By the way, in the present embodiment, a computer program for causing the liquid processing apparatus 10 to execute a liquid processing method to be described later is stored in the storage medium 61 (see FIG. 2). The liquid processing apparatus also includes a computer 60 that receives the storage medium 61. And the control part 62 receives the signal from the computer 60, liquid processing apparatus itself (more specifically, the chemical | medical solution supply mechanism 20, the rinse liquid supply mechanism 25, the substitution promotion liquid supply mechanism 30, the rotation drive mechanism 40, The lift driving unit 45, the substrate holding mechanism 50, the surface treatment mechanism 70, and the like are configured to be controlled. In the present application, the storage medium 61 means a storage medium storing a computer program that operates on a computer, such as a CD, a DVD, an MD, a hard disk, and a RAM.

Liquid Treatment Method Using Liquid Treatment Device Next, the operation of the present embodiment having such a configuration, specifically, the liquid treatment method using the above-described liquid treatment device will be described. The following operations are controlled by the control unit 62.

  First, the lift drive unit 45 positions the lift pin plate 55 at the upper position (position where the transfer robot (not shown) delivers the substrate W to be processed) (upper positioning process). At this time, the liquid supply arm 11 is located at a position off the upper side of the support plate 51.

  Next, the substrate to be processed W is received from the transfer robot by the three lift pins 55a of the lift pin plate 55, and the back surface (lower surface) of the substrate to be processed W is supported by the lift pins 55a (receiving step).

  Next, the lift drive unit 45 positions the lift pin plate 55 at a lower position (a position where the substrate W to be processed is processed with a chemical solution) (lower positioning step) (see FIG. 2).

During this so that the lift pin plate 55 is positioned in the lower position, by the support portion 57 of the support plate 51, supported by (supporting step) together with the substrate body part W _i of the target substrate W is held (see FIG. 2 ). At this time, the target substrate W is located above the convex portion W _m, (see FIG. 1 (b)) of the substrate main body portion W _i is positioned so as to be positioned downward.

  At this time, the liquid supply arm 11 is moved in the horizontal direction around the swing shaft 12 by the liquid supply arm moving unit 13, and the liquid supply arm 11 is moved above the substrate W to be processed.

  Next, when the rotating shaft 52 is rotationally driven by the motor 41, the substrate W to be processed held and supported by the support portion 57 of the support plate 51 rotates (rotation process) (see arrow A in FIG. 3). . And while the to-be-processed substrate W rotates in this way, the following processes are performed.

Note Initially, the target substrate W is a substrate main body W _i, between a plurality of convex portions W _m, for example in a state of oxide film W _o is formed consisting of SiO ₂ (FIG. 5 (See (a)).

First, a chemical solution is supplied to the substrate W to be processed by the chemical solution supply mechanism 20 (chemical solution supply step S1) (see FIGS. 3 and 4). Thus, the substrate main body portion W _i on the formed oxide film W _o of the substrate W is selectively etched away (see Figure 5 (b)).

  Next, the rinse liquid is supplied from the rinse liquid supply mechanism 25 to the surface of the substrate W to be processed after the chemical liquid is supplied by the chemical liquid supply mechanism 20 (rinse liquid supply step S2) (see FIGS. 3 and 4). ). By supplying the rinse liquid to the substrate to be processed W in this way, the reaction of the chemical liquid on the substrate to be processed W can be stopped and the chemical liquid can be removed.

Next, the hydrophilic treatment liquid is supplied from the hydrophilic treatment liquid supply mechanism 71 of the surface treatment mechanism 70 to the surface of the substrate W to be processed (hydrophilic treatment liquid supply step S3) (see FIGS. 3 and 4). As a result, the water-repellent ground W _f (for example, SiN) of the substrate W to be processed is selectively hydrophilized (see the bold line portion in FIG. 5C). Incidentally, when the underlying surface W _f of the thus treated substrate W is hydrophilic, it is preferable that the contact angle between the rinse solution and the underlying surface W _f is at least 80 °, to be a least 90 ° Further preferred.

  Next, replacement promotion for replacing the hydrophilic treatment liquid with the water repellent treatment liquid on the surface of the substrate W after the hydrophilic treatment liquid supply mechanism 71 supplies the hydrophilic treatment liquid from the substitution promotion liquid supply mechanism 30. Liquid is supplied (substitution promoting liquid supply step S4) (see FIGS. 3 and 4). In addition, before this substitution acceleration | stimulation liquid supply process S4, the rinse liquid may be supplied to the surface of the to-be-processed substrate W from the rinse liquid supply mechanism 25 (rinse liquid supply process).

Next, the water repellent treatment liquid is supplied from the water repellent treatment liquid supply mechanism 75 of the surface treatment mechanism 70 to the surface of the substrate W to be processed (water repellent treatment liquid supply step S5) (see FIGS. 3 and 4). . Thus, to be processed the substrate W, the surface of the convex portion W _m which is a hydrophilic (e.g., TiN) is selectively water-repellent (see bold lines in FIG. 5 (d)). Underlying surface W _f in this case the target substrate W is in the state of being hydrophilic. Incidentally, when the surface of the convex portion W _m of the thus substrate W is water-repellent, it is preferable that the contact angle between the rinsing liquid and the convex portion W _m becomes 30 ° or less, 20 ° More preferably, it is more preferably 10 ° or less.

Thus, the water-repellent liquid from hydrophilic treatment liquid and water-repellent liquid supply mechanism 75 from hydrophilic treatment liquid supply means 71, the underlying surface W _f of the target substrate W is selectively hydrophilic and convex The surface of the W-shaped portion W _m is selectively made water-repellent. In the present embodiment, the hydrophilic treatment liquid supply step S3 and the water repellent treatment liquid supply step S5 constitute a surface treatment step.

  Subsequently, the replacement for replacing the water-repellent treatment liquid with the rinse liquid on the surface of the substrate W after the water-repellent treatment liquid supply mechanism 75 supplies the water-repellent treatment liquid from the substitution promoting liquid supply mechanism 30. The accelerating liquid is supplied (substitution accelerating liquid supplying step S6) (see FIGS. 3 and 4).

  Next, a rinsing liquid is supplied from the rinsing liquid supply unit 26 to the surface of the substrate W to be processed (rinsing liquid supply step S7) (see FIGS. 3 and 4).

Incidentally, during the chemical liquid supply process S1 described above to rinsing liquid supplying step S7, keep as convex portion W _m of the substrate to be processed W is not exposed from the liquid surface.

  Thereafter, the supply of the rinsing liquid from the rinsing liquid supply unit 26 is stopped, the rotation speed of the motor 41 is then increased, and the substrate holding mechanism 50 is rotated to dry the substrate W to be processed (drying step S8). ). Thereby, the rinse liquid is removed from the surface of the substrate W to be processed (see FIG. 5E).

As a result, although the target substrate W is exposed from the liquid surface of the rinsing liquid, the surface of the convex portion W _m is water-repellent with respect to the rinsing liquid, the surface tension acting between the convex portion W _m can be reduced, the convex portion W _m can be prevented from being destroyed. At the same time, the underlying surface W _f of the substrate W to be processed because it is hydrophilic with respect to the rinsing liquid, the wet part portion and rinsing liquid rinsing liquid in the plane of the substrate W is dried coexist it is possible to prevent the prevent the convex portion W _m is collapsed it.

  In addition, while the substrate to be processed W is rotated and dried as described above, the liquid supply arm 11 is moved in the horizontal direction around the swing shaft 12 by the liquid supply arm moving unit 13, so that the processing target is processed. The liquid supply arm 11 is moved to a position off the upper side of the substrate W.

  Next, the rotation of the motor 41 is stopped, and the rotation of the substrate W to be processed is stopped (see FIG. 3). Next, the lift pin plate 55 is positioned at the upper position by the lift driving unit 45, and the substrate W to be processed is lifted by the lift pins 55a (upper positioning process). Thereafter, the substrate W is received and carried out by the carrying robot (unloading step).

As described above, according to the present embodiment, before the step of supplying the rinsing liquid (rinsing liquid supply step S7), the hydrophilic treatment liquid and the water repellent treatment liquid are supplied to the substrate to be processed W (hydrophilicity). treatment liquid supplying step S3 and the water-repellent treatment liquid supply step S5), so that a state of the underlying surface W _f of the target substrate W is hydrophilic, and the surface of the convex portion W _m is water repellent. Thus, it is possible to prevent the surface tension acts between the convex portion W _m. Further, when the rinsing liquid is removed by drying from the substrate to be processed W, the portion where the rinsing liquid is dried and the portion wetted with the rinsing liquid are prevented from being mixed in the surface of the substrate W to be processed. convex portion W _m by collapse balanced surface tension of the rinsing liquid acting on W _m can be prevented from being destroyed.

Specifically, the force F that attempts to collapse the convex portion W _m when rinsing liquid R between the convex portion W _m is present, is guided by the following equation (see FIG. 6 (a)).

Here, γ means the interfacial tension between the rinse liquid R and the convex portion W _m , θ (θ ₁ ) means the inclination angle of the rinse liquid R with respect to the surface of the convex portion W _m , and H is means a rinse liquid surface level of the R between the convex portion W _m, D denotes the length in the depth of the convex portion W _m (not shown), S is between the convex portion W _m This means an interval (see FIG. 6A).

If the surface of the convex portion W _m is not water-repellent, by rinsing liquid R is pulled in the convex portion W _m, the inclination angle theta ₁ is decreased as shown in FIG. 6 (b) put away (cosθ ₁ is increased). As a result, the force F that attempts to collapse the convex portion W _m becomes large, the convex portion W _m will be collapsed (see Figure 6 (c)).

In contrast, in the present embodiment, since the surface of the convex portion W _m is water-repellent by the water-repellent treatment liquid, in the course of the target substrate W is gradually dried, convex rinsing liquid R The inclination angle θ ₁ with respect to the surface of the portion W _m can be maintained at 80 ° or more, or 90 ° or more (see FIG. 6A), and the force F can be reduced. Thus, it is possible to prevent the convex portion W _m is collapsed.

In the present embodiment, since the lower ground W _{f of the} substrate to be processed W is made hydrophilic, the interfacial tension of the hydrophilic lower ground W _f is increased, and the upper surface W _{f of the} substrate W to be processed is increased. It is possible to maintain a state in which the rinse liquid spreads. Accordingly, when removing by drying the rinsing liquid from the substrate W (drying step S8), the liquid film of the rinse liquid spreads on hydrophilized underlying surface W _f. And while this state is maintained, the to-be-processed substrate W can be dried so that a liquid film may become thin gradually.

  FIG. 7 is a schematic cross-sectional view showing the surface of the substrate to be processed W when the rinse liquid is thus removed by drying (drying step S8). In FIG. 7, the right side corresponds to the central portion of the substrate to be processed W, and the left side corresponds to the peripheral portion of the substrate to be processed W (the same applies to FIG. 14 described later).

As shown in FIG. 7, since the underlying surface W _f of the substrate to be processed W is hydrophilic, the liquid film of rinsing liquid R is spread throughout the underlying surface W _f of the target substrate W, the substrate to be processed W The portion where the rinse liquid R is dried in the surface and the portion wetted with the rinse liquid R are not mixed. Accordingly, the convex portion W _m by the balance of the surface tension of the rinse liquid R that acts on the convex portion W _m is lost can be prevented from being destroyed. Further, the centrifugal force when the target substrate W is rotated, the liquid film of rinsing liquid R is thin at the central portion of the substrate W, becomes thicker at the peripheral portion, between the convex portion W _m is the since the difference in thickness is extremely small, the phenomenon that the convex portion W _m is collapse does not occur.

Further, as described above, since the surface of the convex portion W _m is in the state of being water-repellent by the water-repellent treatment liquid (water-repellent liquid supplying step S5), the convex due to the difference in the way off of the rinse liquid R even force to collapse the Jo unit W _m occurs, the force is negligible and, convex portion W _m will not be destroyed.

On the other hand, as in the comparative example shown in FIG. 14, when both the lower ground W _{f of the} substrate to be processed W and the surface of the convex portion W _m are made water repellent, the liquid of the rinsing liquid R on the substrate to be processed W Drops are produced. Thus, a portion part and rinsing liquid R is present rinsing liquid R within the plane of the substrate to be processed W is absent are mixed, since the balance of the surface tension of the rinse liquid R that acts on the convex portion W _m is lost , there is a possibility that the convex portion W _m is collapsed. Further, since the droplet of the rinsing liquid R moves from the central portion of the substrate to be processed W toward the peripheral edge (see the arrow in FIG. 14), the droplets of the rinsing liquid R may be wetted by the rinsing liquid R even at the same location on the substrate to be processed W. to repeat that or dry, work surface tension in the convex portion W _m each time, the convex portion W _m there is a risk of collapse.

Modified Examples Hereinafter, modified examples of the present embodiment will be described with reference to FIGS. 8 to 13, the same parts as those of the embodiment shown in FIGS. 1 to 7 are denoted by the same reference numerals, and detailed description thereof is omitted.

  In the above description, the surface treatment process has been described using the aspect in which the water-repellent treatment liquid supply process S5 is performed after the hydrophilic treatment liquid supply process S3. However, the present invention is not limited to this, and the water-repellent treatment liquid supply process S5. Thereafter, the hydrophilic treatment liquid supply step S3 may be performed. That is, as shown in FIG. 8, between the chemical solution supplying step S1 and the drying step S8, a rinsing solution supplying step S2, a substitution accelerating solution supplying step S9, a water repellent treatment solution supplying step S5, a substitution accelerating solution supplying step S4, a hydrophilic The treatment liquid supply step S3 and the rinse liquid supply step S7 may be performed sequentially.

In this case, the surface of the convex portion W _m of the hydrophilic and water repellent by the water-repellent treatment liquid, and, since the underlying surface W _f of the water repellency may be hydrophilic by hydrophilic treatment liquid, a drying step S8 convex portion W _m can be prevented from being collapsed in.

Alternatively, the hydrophilic treatment liquid supplying step S3, instead of performing the water repellent treatment liquid supplying step S5 separately, in the surface treatment step, a hydrophilizing the underlying surface W _f, water-repellent surface of the convex portion W _m May be performed simultaneously. That is, as shown in FIG. 9, between the chemical liquid supply process S1 and the drying process S8, the rinse liquid supply process S2, the hydrophilic water-repellent treatment liquid supply process S10, and the rinse liquid supply process S7 may be sequentially performed. In this case, in the surface treatment step, performed on the processed the substrate W, the method comprising hydrophilic underlying surface W _f of the water repellency, and to water-repellent surface of the convex portion W _m of the hydrophilic simultaneously The hydrophilic water-repellent treatment liquid is supplied (hydrophilic water-repellent treatment liquid supply step S10). In addition, as such a hydrophilic water-repellent treatment liquid, for example, a chemical liquid containing a surfactant can be used.

Thus, when supplying a hydrophilic water-repellent treatment liquid onto the target substrate W, as shown in FIG. 10, the surface processing mechanism 70 are that the hydrophilic underlying surface W _f of the water repellent, hydrophilic and the surface of the convex portion W _m having a hydrophilic water-repellent liquid hydrophilic water-repellent liquid supply mechanism 81 supplies to perform the method comprising: water-repellent at the same time. In this case, the hydrophilic water-repellent treatment liquid supply mechanism 81 guides the hydrophilic water-repellent treatment liquid supply part 82 that supplies the hydrophilic water-repellent treatment liquid and the hydrophilic water-repellent treatment liquid supplied from the hydrophilic water-repellent treatment liquid supply part 82. A hydrophilic water-repellent treatment liquid supply pipe 83, and a hydrophilic water-repellent treatment liquid supply pipe 84 connected to the hydrophilic water-repellent treatment liquid supply pipe 83 and provided at the end of the liquid supply arm 11. A part of the hydrophilic water-repellent treatment liquid supply pipe 83 passes through the liquid supply arm 11.

In this case, the hydrophilic water-repellent liquid, selectively hydrophilic underlying surface W _f of the water repellency, and it is possible to selectively water-repellent surface of the convex portion W _m of the hydrophilic , it is possible to prevent the convex portion W _m is collapsed in the drying step S8. Furthermore, the method comprising hydrophilic underlying surface W _f of the water repellency, and to water-repellent surface of the convex portion W _m of the hydrophilic can be performed efficiently in one step.

Incidentally, in the above, initially, if the underlying surface W _f of the substrate body W _i consists of water-repellent material (e.g. SiN), the surface of the convex portion W _m of the material (e.g., TiN) is in the hydrophilic However, the present invention is not limited to this.

For example, while the surface of the material of the convex portion W _m is hydrophilic, if the underlying surface W _f of the substrate body W _i is made of hydrophilic material from the beginning, omitting a hydrophilic treatment liquid supply process S3 May be. That is, as shown in FIG. 11, between the chemical solution supplying step S1 and the drying step S8, a rinsing solution supplying step S2, a substitution accelerating solution supplying step S4, a water repellent treatment solution supplying step S5, a substitution accelerating solution supplying step S6, and The rinse liquid supply step S7 may be performed sequentially. In this case, the hydrophilic treatment liquid supply mechanism 71 may be omitted from the surface treatment mechanism 70 in FIG.

Alternatively, while the underlying surface W _f of the substrate body W _i is made of a material of water-repellent, when the surface of the material of the convex portion W _m is water-repellent from the beginning, omitting a water-repellent treatment liquid supplying step S5 You may do it. That is, as shown in FIG. 12, between the chemical liquid supply process S1 and the drying process S8, the rinse liquid supply process S2, the hydrophilic treatment liquid supply process S3, and the rinse liquid supply process S7 may be sequentially performed. In this case, the water repellent treatment liquid supply mechanism 75 in the surface treatment mechanism 70 may be omitted in FIG.

Incidentally, in the above description with reference to embodiments in which each convex portion W _m of the substrate W is made of a cylinder (cylindrical) shape, respectively (see FIG. 1 (a) (b)), limited to this Absent. For example, as shown in FIG. 13 (a) (b), the convex portion W _m of the substrate to be processed W may have an elongated plate shape. In such treated the substrate W, the convex portion W _m in the drying step S8 is able to prevent collapse. 13A is a schematic plan view showing a part of the substrate to be processed, and FIG. 13B is a schematic cross-sectional view showing a part of the substrate to be processed (XIII- in FIG. 13A). FIG.

W Substrate (Subject)
_Wi substrate body (main body)
W _m convex portion W _f base surface 10 liquid processing device 11 liquid supply arm 20 chemical liquid supply mechanism 25 rinse liquid supply mechanism 30 substitution acceleration liquid supply mechanism 40 rotation drive mechanism 50 substrate holding mechanism 51 support plate 52 rotation shaft 56 lift shaft 57 Support unit 60 Computer 61 Storage medium 62 Control unit 70 Surface treatment mechanism 71 Hydrophilic treatment liquid supply mechanism 75 Water repellent treatment liquid supply mechanism 81 Hydrophilic water repellent treatment liquid supply mechanism

Claims (10)

A main body and a plurality of hydrophilic convex portions projecting from the main body, and a water repellent ground is formed between the convex portions on the main body. In a liquid treatment method for treating a body,
A surface treatment step for making the ground surface of the object to be treated hydrophilic and making the surface of the convex portion water repellent, wherein the ground surface is water repellent to the object to be treated. A hydrophilic treatment liquid supplying step for supplying a hydrophilic treatment liquid for hydrophilizing, and a water repellent treatment liquid supply for supplying a water repellent treatment liquid for repelling the hydrophilic convex surface to the object to be treated A surface treatment process including a process;
A rinsing liquid supply step of supplying a rinsing liquid to the object to be treated which has been subjected to a surface treatment in a state where the base surface is hydrophilized and the surface of the convex portion is water repellent;
A drying step of removing the rinse liquid from the object to be processed,
A replacement accelerating liquid for replacing the hydrophilic treatment liquid and the water repellent treatment liquid with each other is supplied to the object to be processed between the hydrophilic treatment liquid supply step and the water repellent treatment liquid supply step. An accelerating liquid supply step is provided;
The liquid processing method characterized in that the convex portion of the object to be processed is not exposed from the liquid surface during the period from the surface treatment step to the rinse liquid supply step.   The liquid processing method according to claim 1, wherein each of the convex portions of the object to be processed has a cylinder shape.   The liquid processing method according to claim 1, wherein the base surface is made of a Si-based material, and each of the convex portions is made of a metal-based material. The liquid treatment according to any one of claims 1 to 3, wherein a rinsing liquid supply step for supplying a rinsing liquid to the object to be processed is provided before the replacement accelerating liquid supply step. Method. A main body and a plurality of hydrophilic convex portions projecting from the main body, and a water repellent ground is formed between the convex portions on the main body. In a liquid treatment apparatus for treating the body,
A substrate holding mechanism for holding the object to be processed;
A surface treatment mechanism for performing a surface treatment on the object to be processed held by the substrate holding mechanism; a rinse liquid supply mechanism for supplying a rinse liquid to the object to be processed;
A controller that controls the surface treatment mechanism and the rinse liquid supply mechanism,
The surface treatment mechanism includes: a hydrophilic treatment liquid supply mechanism that supplies a hydrophilic treatment liquid that hydrophilizes the water-repellent base surface to the object to be treated; and a hydrophilic treatment liquid and a repellent property to the object to be treated. A replacement accelerating liquid supply mechanism that supplies a substitution accelerating liquid for substituting the water treatment liquid with each other, and a water repellent treatment liquid that repels the hydrophilic surface of the convex portion is supplied to the object to be processed. Including a water repellent treatment liquid supply mechanism,
The controller is
Controlling the hydrophilic treatment liquid supply mechanism of the surface treatment mechanism so that the base surface of the object to be treated is in a hydrophilic state, and controlling the water repellent treatment liquid supply mechanism of the surface treatment mechanism; In order for the surface of the convex part to be in a water-repellent state,
Controlling the rinsing liquid supply mechanism to supply the rinsing liquid to the object to be treated which has been subjected to a surface treatment in a state in which the base surface is hydrophilized and the convex surface is water repellent;
Between making the said base surface of the said to-be-processed body hydrophilic by the said hydrophilic treatment liquid supply mechanism, and making the said convex-shaped part surface water-repellent by the said water-repellent treatment liquid supply mechanism. In addition, the replacement acceleration liquid supply mechanism is controlled to supply the replacement acceleration liquid to the object to be processed.
Supplying the rinsing liquid after making the base surface of the object to be treated hydrophilic by the hydrophilic treatment liquid supply mechanism and making the surface of the convex portion water repellent by the water repellent treatment liquid supply mechanism The liquid processing apparatus, wherein the convex portion of the target object is not exposed from the liquid surface until the rinse liquid is supplied to the target object by a mechanism. The substrate holding mechanism rotatably holds the object to be processed, and the control unit controls the substrate holding mechanism to rotate the substrate holding mechanism, so that the rinse from the object to be processed is performed. The liquid processing apparatus according to claim 5, wherein the liquid is removed. The liquid processing apparatus according to claim 5 or 6 , wherein each of the convex portions of the object to be processed has a cylindrical shape. It becomes the lower ground a Si-based material, the liquid processing apparatus of any one of claims 5 to 7 wherein each said convex portion is characterized in that it consists of metallic material. The controller controls the rinsing liquid supply mechanism to supply the rinsing liquid to the object to be processed before the replacement accelerating liquid supply mechanism supplies the replacement accelerating liquid to the object to be processed. The liquid processing apparatus according to claim 5, wherein the apparatus is a liquid processing apparatus. In a storage medium storing a computer program for causing a liquid processing apparatus to execute a liquid processing method,
The liquid treatment method includes:
A main body and a plurality of hydrophilic convex portions projecting from the main body, and a water repellent ground is formed between the convex portions on the main body. A liquid treatment method for treating a body,
A surface treatment step for making the ground surface of the object to be treated hydrophilic and making the surface of the convex portion water repellent, wherein the ground surface is water repellent to the object to be treated. A hydrophilic treatment liquid supplying step for supplying a hydrophilic treatment liquid for hydrophilizing, and a water repellent treatment liquid supply for supplying a water repellent treatment liquid for repelling the hydrophilic convex surface to the object to be treated A surface treatment process including a process;
A rinsing liquid supply step of supplying a rinsing liquid to the object to be treated which has been subjected to a surface treatment in a state where the base surface is hydrophilized and the surface of the convex portion is water repellent;
A drying step of removing the rinse liquid from the object to be processed,
A replacement accelerating liquid for replacing the hydrophilic treatment liquid and the water repellent treatment liquid with each other is supplied to the object to be processed between the hydrophilic treatment liquid supply step and the water repellent treatment liquid supply step. An accelerating liquid supply step is provided;
The storage medium, wherein the convex portion of the object to be processed is not exposed from the liquid surface during the period from the surface treatment step to the rinse liquid supply step.

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