JP5668918B2 - Liquid ejecting apparatus and method for wiping nozzle forming surface of liquid ejecting head - Google Patents

Description

  According to the present invention, the first nozzle row for discharging the first liquid and the second nozzle row for discharging the second liquid are arranged on the nozzle forming surface in a direction intersecting with the transport direction of the liquid ejecting material. The present invention relates to a liquid ejecting apparatus comprising: a liquid ejecting head provided; and a wiping device including a wiper that wipes the nozzle forming surface with respect to the nozzle forming surface; and a method for wiping the nozzle forming surface of the liquid ejecting head. Is.

A pre-coating layer is formed by ejecting a first liquid as a reaction liquid onto a sheet, which is an example of a liquid ejecting material, and a second liquid as a reacting liquid is ejected onto the pre-coating layer. 2. Description of the Related Art Forming aggregates on a jetting material to improve image quality is performed by a liquid jetting apparatus such as an ink jet printer.
In this case, a first nozzle row that discharges the first liquid and a second nozzle row that discharges the second liquid on the nozzle formation surface of the same liquid jet head due to product cost and storage space. Is provided.

In this structure, when the operation of the liquid discharge nozzle is recovered by wiping the nozzle forming surface with a wiper or the like, an aggregate is generated by mixing the first liquid and the second liquid on the nozzle forming surface. There's a problem. This agglomerate prevents the liquid from being ejected from the liquid ejection nozzle and causes a reduction in image quality.
In the following Patent Document 1, a wiper having a two-sheet configuration including a wide blade and a deterrent plate is provided in order to prevent the aggregate generated on the nozzle forming surface as described above from damaging the nozzle forming surface. A structure for supplying a cleaning liquid to a space surrounded by a nozzle forming surface and the two wipers is disclosed.

JP 2010-58338 A

  However, the structure disclosed in Patent Document 1 cannot completely remove aggregates produced by reaction on the nozzle forming surface. Therefore, there is a problem that the normal operation of the discharge nozzle is hindered by the aggregate.

  An object of the present invention is to provide a liquid ejecting head in which a first nozzle row for discharging a first liquid and a second nozzle row for discharging a second liquid are provided on the same nozzle forming surface. When the nozzle forming surface is wiped with a wiper, the first liquid and the second liquid are prevented from being generated on the same nozzle forming surface.

  In the liquid ejecting apparatus according to the first aspect of the present invention, the first nozzle row for ejecting the first liquid and the second nozzle row for ejecting the second liquid are ejected on the nozzle forming surface. A liquid ejecting head arranged in parallel in a direction intersecting the conveying direction of the material, a wiping device provided with a wiper for wiping the nozzle forming surface so as to be able to advance and retreat with respect to the nozzle forming surface, and a forward and backward movement of the wiper, A liquid ejecting apparatus comprising: a control unit that controls a wiping operation that is performed by combining the wiper and a relative movement operation of the liquid ejecting head in the intersecting direction, wherein the control unit is configured such that the wiper includes the first wiper. The wiper is brought into contact with the wiping start position with the position between the nozzle row and the second nozzle row as the wiping start position, and the wiping in one direction is performed by moving the relative movement in one direction, The wiper Contacting again the wiping start position, and is characterized in that it is configured to perform wiping of the other direction by the movement in the other direction of the relative movement.

  According to this aspect, the wiping operation by the wiper performed to recover the operation of the discharge nozzle of the liquid ejecting head is started between the first nozzle row and the second nozzle row provided on the nozzle forming surface. Starting from the position, it is performed in one direction and the other direction in the relative movement direction. Therefore, since the wiper does not move across both the first nozzle row and the second nozzle row during the wiping operation, the first liquid and the second liquid are mixed on the nozzle formation surface. There is no. Thereby, the production | generation of the aggregate on a nozzle formation surface is prevented.

  Here, the relative movement of the wiper and the liquid ejecting head can be performed by the movement of the liquid ejecting head passing through the wiping start position of the wiper.

  As a result, the relative movement between the wiper and the liquid ejecting head can be performed by using the existing moving structure of the liquid ejecting head, so that the wiper has a simple configuration in which only an advance / retreat mechanism (elevating mechanism) is provided. By this, it becomes possible to execute the wiping operation.

  Further, the relative movement between the wiper and the liquid ejecting head can be performed by moving the wiper in the direction of the relative movement and moving the wiper through the wiping start position.

  Accordingly, the wiping operation is executed by moving the wiper in the relative direction so that the wiper and the liquid ejecting head can move relative to each other without changing the movement mode of the existing liquid ejecting head. It becomes possible.

  Further, the relative movement of the wiper and the liquid ejecting head can also be performed by the movement of both the liquid ejecting head and the wiper passing through the wiping start position of the wiper.

  Thereby, the relative movement of the wiper and the liquid ejecting head can be realized without changing the movement mode of the existing liquid ejecting head. In addition, since the movement of the liquid ejecting head and the movement of the wiper in the relative movement direction are performed in combination, an effect of shortening the movement distance of the wiper can be obtained.

  According to a second aspect of the present invention, in the liquid ejecting apparatus according to the first aspect, the control unit advances from the retracted position of the wiper and moves the wiper and the liquid ejecting according to the movement to the contact position. The relative movement of the head to the wiping start position of the wiper is performed, and the wiper tip when the wiper contacts the nozzle forming surface according to the moving direction of the relative movement when the wiper contacts the nozzle forming surface. It is configured to control the bending posture.

The wiper moves (rises) toward the nozzle forming surface of the stationary liquid ejecting head, and when the wiper is pressed against the nozzle forming surface, the tip of the wiper is bent in either direction. At that time, the bending direction of the tip is not constant. In this state, when the wiping operation is executed by the subsequent relative movement, if the bending direction and the wiping operation are not an appropriate combination, wiping cannot be performed appropriately.
However, according to this aspect, the timing of the movement of the wiper to the contact position (movement direction and movement speed) and the relative movement of the wiper and the liquid ejecting head to the wiping start position (movement direction and movement speed). Therefore, the bending posture (bending direction) of the wiper tip when the wiper comes into contact with the nozzle forming surface can be controlled. Accordingly, it is possible to appropriately adjust the bending posture of the wiper tip in accordance with the relative movement direction of the wiper and the liquid ejecting head.

  According to a third aspect of the present invention, in the liquid ejecting apparatus according to the first aspect or the second aspect, the distal end portion of the wiper is in contact with the nozzle forming surface in a stationary state. Further, it is configured to bend and deform so as to be in a uniform contact state in both directions of the subsequent relative movement.

  According to this aspect, when the tip of the wiper comes into contact with the nozzle forming surface in a stationary state, the wiper is deformed so as to be in a uniform contact state in both directions of the subsequent relative movement. Since it is comprised, even if it does not perform control which was demonstrated by the 2nd aspect of this invention mentioned above, the wiping performance of the said wiper comes to be exhibited stably. Moreover, since it is realizable only by changing the structure of a wiper front-end | tip part, a structure is also very simple.

  According to a fourth aspect of the present invention, in the liquid ejecting apparatus according to any one of the first to third aspects, a recess is formed at a portion facing the nozzle forming surface at the tip of the wiper. It is characterized by being.

  According to this aspect, a part of the first liquid and the second liquid wiped off by the wiper during the wiping operation can be received in the recess. Therefore, the amount that the wiper can wipe during the wiping operation increases, and the wiping performance is improved.

  According to a fifth aspect of the present invention, in the liquid ejecting apparatus according to any one of the first to fourth aspects, a cleaning mechanism for cleaning the wiper after the wiping operation is provided. It is a feature.

  According to this aspect, even if a single wiper is used repeatedly, it is cleaned by the cleaning mechanism, so that there is little possibility that the first liquid and the second liquid are mixed on the nozzle forming surface. This makes it possible to prevent the formation of aggregates on the nozzle forming surface over a long period of time. In addition, the cleaning of the wiper can prevent the first liquid and the second liquid from adhering to the surface of the wiper, and foreign substances such as dust and dust attached to the wiper can be removed.

  The method for wiping the nozzle formation surface of the liquid jet head according to the sixth aspect of the present invention includes wiping between the first nozzle row and the second nozzle row provided on the nozzle formation surface of the liquid jet head. A first moving step of relatively moving the liquid ejecting head so that the retracted wiper is positioned at a start position; and the wiper is advanced toward the wiping start position of the nozzle forming surface, and the tip of the wiper A first wiper abutting step that abuts the wiping start position, and the liquid ejecting head is moved in one direction in the relative movement direction to contact the nozzle forming surface on the side where the first nozzle row exists. A first wiping step of wiping with a wiper; a first wiper evacuation step of evacuating the wiper after the first wiping step; and a wiper in a evacuated state at the wiping start position of the nozzle forming surface A second moving step of moving the liquid ejecting head relative to the wiping start position of the nozzle forming surface toward the wiping start position so that the tip of the wiper contacts the wiping start position. A second wiper contact step, and a second wiping step in which the liquid ejecting head is moved in the other direction in the relative movement direction and wiped with the wiper in contact with the nozzle forming surface on the side where the second nozzle row exists. And a second wiper retracting step for retracting the wiper after the second wiping step.

  According to this aspect, when the wiper advances (up), retreats (down), and relative movement of the liquid ejecting head, the wiper moves both the first nozzle row and the second nozzle row during each step. Never move across. Therefore, the first liquid and the second liquid are not mixed on the nozzle formation surface, and the formation of aggregates on the nozzle formation surface is prevented. Further, the wiper advances (rises) during the wiping operation and is positioned at the contact position. When the wiping operation is not performed, the wiper is retracted to the comparison position, so that inadvertent contact with the liquid ejecting head is prevented. ing.

BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a longitudinal front view of a periphery of a wiping treatment area showing an outline of an internal structure of a liquid ejecting apparatus to which a wiping apparatus according to Embodiment 1 of the present invention is applied. The top view of the periphery of the wiping process area | region which shows the outline of the internal structure of the liquid ejecting apparatus to which the wiping apparatus which concerns on Example 1 of this invention is applied. The longitudinal cross-sectional view which shows the various aspect (A) (B) (C) (D) of the wiper applicable to this invention. The longitudinal section front view showing two kinds of modes (A) and (B) of the washing mechanism applied to the present invention. The schematic diagram which shows the flow of operation | movement of the wiping apparatus which concerns on Example 1 of this invention in steps. The flowchart which shows the flow of operation | movement of the wiping apparatus which concerns on Example 1 of this invention. The schematic diagram which shows the flow of operation | movement of the wiping apparatus which concerns on Example 2 of this invention in steps. The flowchart which shows the flow of operation | movement of the wiping apparatus which concerns on Example 2 of this invention. The schematic diagram which shows the flow of operation | movement of the wiping apparatus which concerns on Example 3 of this invention in steps. The flowchart which shows the flow of operation | movement of the wiping apparatus which concerns on Example 3 of this invention. The schematic diagram which shows the flow of operation | movement of the wiping apparatus which concerns on Example 4 of this invention in steps. The flowchart which shows the flow of operation | movement of the wiping apparatus which concerns on Example 4 of this invention. The schematic diagram which shows the flow of operation | movement of the wiping apparatus which concerns on Example 5 of this invention in steps. The flowchart which shows the flow of operation | movement of the wiping apparatus which concerns on Example 5 of this invention.

1 to 6, Example 2 shown in FIGS. 7 and 8, Example 3 shown in FIGS. 9 and 10, Example 4 shown in FIGS. 11 and 12, Using Example 5 shown in FIGS. 13 and 14 as an example, the configuration of the wiping device 1 in the present invention, the configuration of the liquid ejecting apparatus 2 according to the present invention to which the wiping device 1 is applied, and the wiping device 1 are used. A method for wiping the nozzle forming surface of the liquid jet head according to the present invention, which is executed by doing so, will be specifically described.
In the following description, first, the schematic configuration of the liquid ejecting apparatus 2 according to the present invention will be described based on FIGS. 1 and 2, and then the configuration of the wiping apparatus 1 applied to the present invention and the present invention will be described. The configuration of the wiping method of the nozzle forming surface will be described in order by taking the five examples of the first to fifth embodiments described above as examples.

  The illustrated liquid ejecting apparatus 2 is an ink jet printer 2 (using the same reference numeral as the liquid ejecting apparatus) that is an example of a recording apparatus. The ink jet printer 2 ejects a reaction liquid, which is the first liquid C1, onto the liquid jetting surface 9 of the liquid jetting material (hereinafter also referred to as “paper”) P to form the first liquid layer 51A. The precoat layer 11 is formed, and the first liquid C1 and the second liquid C2 are reacted on the precoat layer 11 by injecting a reaction liquid that is the second liquid C2 onto the precoat layer 11. This is an ink jet printer capable of forming an image 13 by obtaining an aggregate.

  Specifically, the transport means 3 that transports the paper P in the transport direction A (FIG. 2), the first nozzle row 5A that ejects the first liquid C1, and the second liquid C2 that ejects the second liquid C2. A liquid ejecting head 15 provided on the same nozzle forming surface 8 in a state where two nozzle rows 5B are arranged in parallel in a scanning direction B intersecting the transport direction A, and the liquid ejecting head 15 is mounted. By including a carriage 17 that reciprocates in the scanning direction B, and a wiping device 1 that is used during the wiping process of each nozzle 7 constituting the first nozzle row 5A and the second nozzle row 5B. The illustrated inkjet printer 2 is basically configured.

As shown in FIG. 2, the transport unit 3 includes a pair of nip rollers provided upstream of a liquid ejection execution area 23 and a recovery process area (hereinafter also referred to as “wiping process area”) 24 of the liquid ejection head. It is comprised as an example by providing the roller 25 for conveyance, and the discharge roller 27 comprised similarly by the pair of nip rollers provided in the downstream position of the said liquid injection execution area | region 23 and the wiping process area | region 24. FIG.
The wiping process area 24 is an area used during the wiping process of the liquid discharge nozzle 7 executed by the wiping device 1 described later, and is the home position or carriage position of the carriage 17 positioned on the side of the liquid ejection execution area 23. It is provided in the return position area.

The liquid ejecting head 15 ejects a first nozzle row 5A for ejecting the first liquid C1 for forming the precoat layer 11 and a second liquid C2 for ejecting the second liquid C2 for forming the image 13. The nozzle rows 5B are arranged side by side on the same nozzle forming surface 8 so as to be aligned in the scanning direction B.
As an example, as shown in FIGS. 1 and 2, in the illustrated liquid jet head 15, the first nozzle row 5 </ b> A on the left side with the intermediate portion 6 interposed therebetween, and the second nozzle on the right side. Each row 5B is arranged.

  In addition, an area having a boundary width between the first nozzle row 5A and the second nozzle row 5B is defined as an intermediate portion 6 in this specification, and the intermediate portion 6 is used as a starting point as described later. The wiping on the first nozzle row 5A side and the wiping on the second nozzle row 5B side are configured to be performed separately.

The carriage 17 is a reciprocating conveyance unit of the liquid ejecting head 15 that reciprocates in the scanning direction B along a carriage guide shaft 37 extending in the scanning direction B.
The power for reciprocating the carriage 17 is received from a motor 39 capable of forward and reverse rotation and capable of precise feed control for each unit step, and the rotation of the motor 39 is performed via the toothed belt 41. It is transmitted to the carriage 17.

  Further, the wiping device 1 according to the present invention applied to the liquid ejecting apparatus 2 configured as described above moves to the rising position H that contacts the nozzle forming surface 8 during the wiping operation, and the wiping device 1 when the wiping operation is not performed. A wiper 29 that can be moved up and down to move to a lowering position L that is separated from the nozzle forming surface 8, and a relative position in the scanning direction B of the wiper 29 and the liquid ejecting head 15 are controlled to be provided on the nozzle forming surface 8. The position where the intermediate portion 6 between the first nozzle row 5A and the second nozzle row 5B is located is set as a wiping start position S, and the wiper 29 is first brought into contact with the wiping start position S and then the wiper 29 And a control unit 21 that relatively moves leftward or rightward in the scanning direction B.

[Example 1] (See FIGS. 1 to 6)
In the wiping device 1 </ b> A according to the first embodiment, the relative movement of the wiper 29 and the liquid ejecting head 15 in the scanning direction B passes through the wiping start position S of the wiper 29. This is done by moving to B.
The wiper 29 is a member that directly contacts the nozzle formation surface 8 of the liquid jet head 15 and executes a wiping operation for wiping off the first liquid C1 and the second liquid C2 adhering to the nozzle formation surface 8. . The wiper 29 is configured to bend and deform so as to be in a uniform contact state in both the left and right directions in the scanning direction B when the tip portion 31 contacts the nozzle forming surface 8 in a stationary state. Has been. As a specific example, the wiper 29 is formed of a synthetic resin material or the like that can be bent and deformed. The front end portion 31 has a flat top surface and a wide T-shape in the scanning direction B. It is comprised as an example by the front-end | tip part 31A.
Incidentally, the front-view substantially T-shape of the distal end portion 31A is bent and deformed so as to be in a uniform contact state in both the left and right directions in the scanning direction B when the wiper 29 rises and comes into contact with the nozzle forming surface 8. To realize.

The tip 31 of the wiper 29 can be of various types having different shapes, as shown in FIG. 3B, in addition to the tip 31A shown in FIG. Thus, it may be a plate-like tip 31B having the same thickness as that of the other part of the wiper 29, or the first liquid C1 to the second liquid wiped off during the wiping operation as shown in FIG. It is also possible to use a tip portion 31C in which a recess 33 for receiving a part of the liquid C2 is formed.
3D further includes a drainage (ink) communication passage 35 connected to one surface on the scanning direction B side as an example of the wiper 29 at the bottom of the recess 33 shown in FIG. 3C. It is also possible to employ a tip 31D having a structure as shown.

The control unit 21 </ b> A according to the present embodiment controls the movement of the wiper 29 in the vertical direction and the movement of the liquid ejecting head 15 in the scanning direction B.
Specifically, the recovery process (wiping process) of the nozzle 7 by the wiping apparatus 1A according to the present embodiment is performed in the flow of operations illustrated in the schematic diagram illustrated in FIG. 5 and the flowchart illustrated in FIG. The specific control flow will be described together in the description of the wiping method of the nozzle forming surface of the liquid jet head according to the present invention described below.

  And the wiping method of the nozzle formation surface which concerns on this invention performed by using 1 A of wiping apparatuses which concern on a present Example of such a structure is (1) 1st movement process, (2) 1st wiper A contact process; (3) a first wiping process; (4) a first wiper retracting process; (5) a second moving process; (6) a second wiper contacting process; and (7) a second wiping process. The method basically includes a step and (8) a second wiper retracting step.

(1) 1st movement process (refer to Drawing 5 (A) (B) and Drawing 6)
In the first movement step, the position where the intermediate portion 6 of the first nozzle row 5A and the second nozzle row 5B provided on the nozzle forming surface 8 of the liquid jet head 15 is located at the wiping start position S of the wiper 29. In this way, the liquid ejecting head 15 is moved in the scanning direction B.
That is, when execution of the wiping process of the nozzle 7 by the wiping device 1 is instructed, a signal is sent from the control unit 21 to the motor 39 that moves the liquid ejecting head 15, and the liquid ejecting execution region 23 is performed in step S 1 in FIG. The liquid ejecting head 15 that has existed in the position moves to the left toward the wiping start position S (see FIGS. 5A and 5B).

(2) 1st wiper contact process (refer to Drawing 5 (C) and Drawing 6)
In the first wiper contact step, the wiper 29 that has been retracted at the lowered position L is raised toward the nozzle formation surface 8 of the liquid jet head 15 that has reached the wiping start position S, and the tip 31 of the wiper 29 is moved. It is a step of contacting the wiping start position S where the intermediate portion 6 of the nozzle forming surface 8 exists.
That is, when the liquid ejecting head 15 reaches the wiping start position S, the process proceeds to step S2 in FIG. 6 to move the wiper 29 to the raised position H (see FIG. 5C).

(3) 1st wiping process (refer to Drawing 5 (D) (E) and Drawing 6)
The first wiping step is a step of wiping the nozzle forming surface 8 on the side where the second nozzle row 5B exists by moving the liquid jet head 15 leftward or rightward in the scanning direction B.
That is, when the wiper 29 reaches the ascending position H, the process proceeds to step S3 in FIG. 6, and the liquid ejecting head 15 is moved in the direction of wiping the second nozzle row 5B (leftward in this embodiment). (See FIG. 5D). Next, when it is determined in step S4 in FIG. 6 whether or not the wiping of the second nozzle row 5B has been completed, the process returns to step S3 to move the liquid ejecting head 15. Will continue.
On the other hand, when the wiping of the second nozzle row 5B is completed, the process proceeds to step S5, and the liquid ejecting head 15 is stopped at the left end position of the recovery processing region 24 (see FIG. 5E).

(4) First wiper retracting step (see FIGS. 5F and 6)
The first wiper retracting step is a step of lowering the wiper 29 that has been moved to the raised position H along with the wiping of the second nozzle row 5B and retracting it to the lowered position L.
That is, when the liquid ejecting head 15 stops at the left end position of the recovery processing region 24, the process proceeds to step S6 in FIG. 6, and the wiper 29 is lowered and retracted to the lowered position L (see FIG. 5 (F)).

(5) Second moving step (see FIGS. 5G and 6)
The second moving step is a step of moving the liquid ejecting head 15 so that the position where the intermediate portion 6 exists is at the wiping start position S of the wiper 29.
That is, when the wiper 29 reaches the lowered position L, the process proceeds to step S7 in FIG. 6 and the liquid ejecting head 15 is moved rightward from the left end position of the recovery processing region 24 toward the wiping start position S (FIG. 5 (G)).

(6) Second wiper contact process (see FIGS. 5H and 6)
In the second wiper contact step, the wiper 29 that has been retracted at the lowered position L is raised toward the nozzle formation surface 8 of the liquid jet head 15 that has reached the wiping start position S, and the tip 31 of the wiper 29 is moved. In this step, the nozzle forming surface 8 is brought into contact with a position where the intermediate portion 6 exists.
That is, when the liquid ejecting head 15 reaches the wiping start position S, the process proceeds to step 8 in FIG. 6 to move the wiper 29 to the raised position H (see FIG. 5H).

(7) 2nd wiping process (refer FIG. 5 (I) (J) and FIG. 6)
The second wiping step is a step of wiping the nozzle forming surface 8 on the side where the first nozzle row 5A exists by moving the liquid jet head 15 to the right or left in the scanning direction B.
That is, when the wiper 29 reaches the ascending position H, the process proceeds to step S9 in FIG. 6 and the liquid ejecting head 15 is moved in the direction of wiping the first nozzle row 5A (rightward in this embodiment). (See FIG. 5I). Next, when it is determined in step 10 in FIG. 6 whether or not the wiping of the first nozzle row 5A has been completed, the process returns to step S9 to move the liquid ejecting head 15. Will continue.
On the other hand, when the wiping of the first nozzle row 5A has been completed, the process proceeds to step S11, and the liquid ejecting head 15 is stopped at the right end position of the recovery processing region 24 (see FIG. 5J).

(8) Second wiper retracting step (see FIGS. 5K and 6)
The second wiper retracting step is a step of lowering and retracting the wiper 29 that has been moved to the raised position in accordance with the wiping of the first nozzle row 5A.
That is, when the liquid jet head 15 stops at the right end position of the recovery processing region 24, the process proceeds to step S12 in FIG. 6 and the wiper 29 is lowered and retracted to the lowered position L to prepare for the next wiping process of the nozzle 7. . Further, the liquid ejecting head 15 moves from the recovery processing area 24 to the liquid ejecting execution area 23 and restarts the liquid ejecting execution operation (see FIG. 5K).

In addition, after the first wiping step (3) and after the second wiping step (7), it is possible to provide a cleaning step for cleaning the wiper 29 after the wiping operation to prepare for the next use. is there.
In this case, a cleaning mechanism 53 as shown in FIGS. 4A and 4B can be applied as an example in the cleaning step. 4A, the cleaning mechanism 53A shown in FIG. 4A is provided at the lowering position L of the wiper 29 on the tongue piece portion 57 that acts on the distal end surface 31a of the distal end portion 31 of the wiper 29 and the side peripheral surface 31b of the distal end portion 31. A wiping member 55 having a liquid-absorbing property, which is integrally provided with a cylindrical portion 59 that acts, is disposed, and further, a liquid tank 63 containing a cleaning liquid 61 is disposed around the wiping member 55. Yes.

That is, in the case of the cleaning mechanism 53A shown in FIG. 4A, when the wiper 29 is raised or lowered, the distal end surface 31a and the side peripheral surface 31b of the distal end portion 31 of the wiper 29 are the tongue pieces of the wiping member 55. By slidably contacting the portion 57 and the cylinder upper portion 59, the first liquid C1 and the second liquid C2 adhering to the distal end portion 31 of the wiper 29 are wiped off.
Further, since the lower part of the wiping member 55 is immersed in the cleaning liquid 61 as shown in the figure, the cleaning liquid 61 is sucked up and spreads over the entire wiping member 55, so that the cleaning action by the cleaning liquid 61 can also be expected.

On the other hand, the cleaning mechanism 53B shown in FIG. 4B is provided with a cleaning head 65 that can be reciprocated in the scanning direction B on the scanning path of the liquid jet head 15, and discharges the cleaning liquid 61 to the cleaning head 65. The cleaning liquid nozzle 67 and the air nozzle 71 for injecting air 69 are disposed.
That is, in the case of the cleaning mechanism 53B shown in FIG. 4B, the cleaning head 65 is moved to the wiping start position S at the timing when the liquid ejecting head 15 is not positioned at the wiping start position S where the wiper 29 exists. Let Then, the wiper 29 is cleaned by the cleaning liquid 61 discharged from the cleaning liquid nozzle 67, and the surface of the wiper 29 cleaned by the air 69 sprayed from the air nozzle 71 is dried, or the foreign matter adhering to the wiper 29 is blown off. It is like that.

  And according to the wiping apparatus 1A which concerns on Example 1 comprised in this way, and the wiping method of the nozzle formation surface which concerns on this invention performed by using this wiping apparatus 1A, said 1st liquid C1 And the second liquid C2 are effectively mixed on the same nozzle forming surface 8 to effectively prevent the generation of aggregates and to recover the operation of the nozzle. Accordingly, it is possible to improve the liquid ejection execution quality while maintaining the performance of the liquid ejection head 15 in a good state.

[Example 2] (See FIGS. 7 and 8)
The wiping device 1B according to the second embodiment has the same structure as the wiping device 1A according to the first embodiment, and relative movement of the wiper 29 and the liquid ejecting head 15 in the scanning direction B is applied to the wiper 29. The configuration is the same as that of the above-described embodiment in that the liquid ejecting head 15 moves in the scanning direction B through the wiping start position S.

  However, the wiper 29 has the structure shown in FIG. 3B, and the control method of the wiper 29 and the liquid jet head 15 is somewhat different from that of the first embodiment. That is, in this embodiment, relative movement of the wiper 29 and the liquid jet head 15 to the wiping start position S of the wiper 29 is performed in accordance with the movement of the wiper 29 from the lowered position L to the raised position H, and Depending on the moving direction of the liquid jet head 15 when the nozzle forming surface 8 contacts the wiper 29, the bending posture of the tip 31 of the wiper 29 when contacting the nozzle forming surface 8, that is, the tip 31 is Controls the direction of the turn.

Specifically, in step S1 in FIG. 8, the liquid jet head 15 is moved to the left toward the wiping start position S, and at the same time, the wiper 29 is moved to the raised position H (FIGS. 7A and 7B). (See FIG. 8). In this case, when the distal end portion 31 of the wiper 29 comes into contact with the nozzle forming surface 8, the distal end portion 31 of the wiper 29 is moved to the distal end portion 31 of the wiper 29 by the movement of the liquid jet head 15 to the left as shown in the drawing. A bending posture that bends to the left is given (see FIG. 7B).
Next, steps S2 to S5 in FIG. 8 similar to steps S3 to S6 in FIG. 6 are executed (see FIGS. 7C, 7D, and 7E), and the process proceeds to step S6 in FIG. .

In step S6 in FIG. 8, the liquid ejecting head 15 is moved rightward toward the wiping start position S, and at the same time, the wiper 29 is moved to the raised position H (see FIG. 7F). In this case, when the tip 31 of the wiper 29 comes into contact with the nozzle forming surface 8, the tip 31 of the wiper 29 is moved to the right by the movement of the liquid jet head 15 as shown in the figure. A bending posture opposite to that shown in FIG. 7B which is bent to the right is given (see FIG. 7F).
Next, steps S7 to S10 in FIG. 8 similar to steps S9 to S12 in FIG. 6 are executed (FIGS. 7G, 7H, and 7I), and a series of wiping processes for the nozzles 7 are completed. .

  The wiping device 1B according to the second embodiment that performs such control also exhibits the same operations and effects as those of the first embodiment. Further, as the specific operations and effects of the present embodiment, the wiper 29 rises and the liquid By simultaneously moving the ejection head 15 in the scanning direction B at the same time, the process can be shortened, and the bending posture of the tip 31 of the wiper 29 can be controlled (bent) regardless of the shape of the tip 31 of the wiper 29. Direction control).

[Example 3] (See FIGS. 9 and 10)
The wiping device 1C according to the third embodiment has the same structure as the wiping device 1A according to the first embodiment. However, in the first embodiment, the relative movement of the wiper 29 and the liquid jet head 15 in the scanning direction B is performed by the movement of the wiper 29 in the scanning direction B passing the wiping start position S of the wiper 29. Is different.

  That is, in this embodiment, the wiper 29 is moved in the scanning direction in place of the individual wiping operation of the nozzle rows 5A and 5B by moving the liquid jet head 15 in the scanning direction B in the first embodiment. By moving to B, individual wiping operations for the same nozzle rows 5A and 5B are performed.

Specifically, in step S1 in FIG. 10, the liquid ejecting head 15 is moved to the left toward the wiping start position S, and at the same time, the wiper 29 is moved to the wiping start position S (FIGS. 9A and 9B). reference).
Next, the process proceeds to step S2 in FIG. 10, and the wiper 29 is moved to the raised position H to bring the wiper 29 into contact with the wiping start position S of the nozzle forming surface 8 (see FIG. 9C).

  Next, the process proceeds to step S3 in FIG. 10, and the wiper 29 is moved to the right, which is the direction in which the second nozzle row 5B is wiped (see FIG. 9D).

Next, the process proceeds to step S4 in FIG. 10 to determine whether or not the wiping of the second nozzle row 5B is completed. If not, the process returns to step S4 in FIG. If it has, the process proceeds to step S5 in FIG. 10 to stop the wiper 29 at the right end position of the recovery processing area 24 (see FIG. 9E).
Next, the process proceeds to step S6 in FIG. 10, the wiper 29 is retracted to the lowered position L (see FIG. 9F), and the process proceeds to step S7 in FIG. 10 to recover the wiper 29. The wiping start position S is moved to the left where the wiping start position S is located (see FIG. 9G).

Next, the process proceeds to step S8 in FIG. 10, and the wiper 29 is moved to the raised position H and brought into contact with the wiping start position S (see FIG. 9H). Further, the process proceeds to step S9 in FIG. 10, and the wiper 29 is moved to the left, which is the direction of wiping the first nozzle row 5A (see FIG. 9I).
Next, the process proceeds to step S10 in FIG. 10 to determine whether or not the wiping of the first nozzle row 5A is completed. If it is determined that the wiping is not completed, the process proceeds to step S9 in FIG. Returning to step S11 in FIG. 10 when it is determined that the process has been completed, the wiper 29 is stopped at the left end position of the collection processing area 24 (see FIG. 9J).
Further, the process proceeds to step S12 in FIG. 10, and the wiper 29 is retracted to the lowered position L (see FIG. 9K).

  The wiping device 1C according to the third embodiment that performs such control also exhibits the same operations and effects as those of the first embodiment. Further, the existing liquid ejecting head 15 has the unique operations and effects of the present embodiment. It is possible to execute the wiping operation without changing the movement mode.

[Example 4] (See FIGS. 11 and 12)
The wiping device 1D according to the fourth embodiment has the same structure as the wiping device 1A according to the first embodiment. However, the wiper 29 has the structure of FIG. 3B, and the relative movement of the wiper 29 and the liquid jet head 15 in the scanning direction B is the same as that of the wiping device 1C according to the third embodiment. This is different from the first embodiment in that it is performed by movement in the scanning direction B of 29.

  Further, the control method of the wiper 29 and the liquid ejecting head 15 is somewhat different from that of the third embodiment, and the wiper 29 moves to the raised position H as in the wiping device 1B according to the second embodiment. At the same time, relative movement of the wiper 29 and the liquid jet head 15 to the wiping start position S is executed, and the wiper 29 contacts the nozzle forming surface 8 depending on the moving direction of the wiper 29 when the wiper 29 contacts the nozzle forming surface 8. The bending posture (bending direction) at the distal end portion 31 of the wiper 29 is controlled.

Specifically, in step S1 in FIG. 12, the liquid ejecting head 15 is moved to the left where the wiping start position S is located, and at the same time, the wiper 29 is moved to the right where the wiping start position S is located and moved to the raised position H. (See FIGS. 11A and 11B). In this case, when the leading end portion 31 of the wiper 29 comes into contact with the nozzle forming surface 8, the wiper 29 is moved by either or both of the rightward movement of the wiper 29 and the leftward movement of the liquid ejecting head 15. As shown in the figure, the distal end portion 31 of 29 is bent such that the distal end portion 31 bends to the left (see FIG. 11B).
Next, steps S2 to S5 in FIG. 12 similar to steps S3 to S6 in FIG. 10 are executed (see FIGS. 11C, 11D, and 11E), and the process proceeds to step S6 in FIG. .

In step S6 in FIG. 12, the wiper 29 is moved from the right end position of the recovery processing region 24 to the left side where the wiping start position S is moved to the raised position H (see FIG. 11F). In this case, when the tip 31 of the wiper 29 comes into contact with the nozzle forming surface 8, the tip 31 of the wiper 29 is moved to the right as shown in the figure by the movement of the wiper 29 to the left. The bending attitude | position opposite to said FIG.11 (B) bent to the direction is provided (refer FIG.11 (F)).
Next, steps S7 to S10 in FIG. 12 similar to steps S9 to S12 in FIG. 10 are executed (FIGS. 11G, 11H, and 11), and the series of nozzle 7 wiping processes ends. .

  The wiping apparatus 1D according to the fourth embodiment that performs such control also exhibits the same operations and effects as those of the first embodiment. Further, the wiper 29 rises and scans as specific operations and effects of the present embodiment. By simultaneously executing the movement in the direction B at the same time, it is possible to shorten the process and to control the bending posture (bending direction) of the tip 31 of the wiper 29 regardless of the shape of the tip 31 of the wiper 29. become.

[Example 5] (See FIGS. 13 and 14)
The wiping device 1E according to the fifth embodiment has the same structure as the wiping device 1A according to the first embodiment. However, the second embodiment is different from the first embodiment in that the relative movement of the wiper 29 and the liquid ejecting head 15 in the scanning direction B is performed by both of them.

  Accordingly, the control method of the wiper 29 and the liquid ejecting head 15 is somewhat different from that of the fourth embodiment.

Specifically, in step S1 in FIG. 14, the liquid ejecting head 15 is moved to the left where the wiping start position S is located, and at the same time the wiper 29 is moved to the raised position H (see FIGS. 13A and 13B). . Also in this case, as in the second embodiment, the distal end portion 31 of the wiper 29 is given a bending posture in which the distal end portion 31 bends to the left as shown (see FIG. 13B).
Next, steps S2 to S6 in FIG. 14 similar to steps S2 to S6 in FIG. 12 are executed (see FIGS. 13C, 13D, 13E, and 13F), and step S7 in FIG. Migrate to

Further, in step S7 in FIG. 14, the liquid jet head 15 is moved to the right, which is the direction to wipe off the first nozzle row 5A (see FIG. 13G). Next, the process proceeds to step S8 in FIG. 14 to determine whether or not the wiping of the first nozzle row 5A is completed. If not, the process returns to step S7 in FIG. If completed, the process proceeds to step S9 in FIG. 14, and the liquid jet head 15 is stopped at the right end position of the recovery processing region 24 (see FIG. 13H).
Further, the process proceeds to step S10 in FIG. 14, the wiper 29 is lowered and retracted to the lowered position L, and the next wiping process of the nozzle 7 is awaited.

  The wiping device 1E according to the fifth embodiment that performs such control also exhibits the same operations and effects as those of the first embodiment. Further, in the case of this embodiment, the wiper of the fourth embodiment is used. 29, the moving stroke in the scanning direction B becomes shorter, so that the wiping process of the nozzle 7 becomes smoother and the efficient wiping process of the nozzle 7 can be executed.

[Other embodiments]
The wiping device 1 according to the present invention, the liquid ejecting device 2 to which the wiping device 1 is applied, and the nozzle recovery method executed by using the wiping device 1 are basically configured as described above. However, it is of course possible to change or omit the partial configuration without departing from the gist of the present invention.

For example, in addition to providing only one type of wiper 29, the first wiper that wipes off the nozzle forming surface 8 provided with the first nozzle row 5A and the nozzle provided with the second nozzle row 5B are provided. The second wiper that wipes off the formation surface 8 may be provided separately from each other in the direction of relative movement.
With this configuration, only the first wiper is in contact with the first nozzle row 5A and only the second wiper is in contact with the second nozzle row 5B. There is an effect that the second liquid and the second liquid are not mixed on the nozzle forming surface.

Also, various tip portions 31 of the wiper 29 shown in FIG. 3 described in the description of the first embodiment can be applied to the second to fifth embodiments. It is also possible to apply the cleaning mechanism 53 shown in FIG.
Further, the tip 31 of the wiper 29 is not limited to that shown in FIG. 3, but may be a tip 31 of another shape or structure that exhibits the same action and effect. Similarly, the cleaning mechanism 53 is not limited to that shown in FIG. 4, and other mechanisms that exhibit similar functions and effects can be employed.

  In addition, the liquid ejecting apparatus 2 to which the wiping apparatus 1 of the present invention is applied is not limited to the ink jet printer 2 as described above, and the nozzle row 5 that discharges the two liquids that react is arranged in the scanning direction B in parallel. The present invention can be applied to various types of liquid ejecting apparatuses 2.

1 wiping device, 2 ink jet printer (liquid ejecting device), 3 transport means,
5 nozzle row, 6 middle part, 7 nozzle, 8 nozzle forming surface, 9 liquid ejection surface,
11 Precoat layer, 13 images, 15 Liquid jet head, 17 Carriage,
21 control unit, 23 liquid ejection execution area, 24 recovery process area (wiping process area),
25 Transport roller, 27 Discharge roller, 29 Wiper, 31 Tip,
31a tip surface, 31b side peripheral surface, 33 recess, 35 communication path,
37 Carriage guide shaft, 39 Motor, 41 Toothed belt,
51 liquid (ink) layer, 53 cleaning mechanism, 55 wiping member, 57 tongue piece,
59 cylindrical part, 61 cleaning liquid, 63 liquid tank, 65 cleaning head, 67 cleaning liquid nozzle,
69 air, 71 air nozzle, P paper (liquid jetting material), A transport direction,
B scanning direction, C liquid (ink), H ascending position, L descending position,
S Wiping start position

Claims (6)

A liquid ejecting head in which a first nozzle row for discharging a first liquid and a second nozzle row for discharging a second liquid are arranged in parallel on a nozzle forming surface;
A wiper provided so as to be able to contact the nozzle forming surface and wiping the nozzle forming surface;
In the recovery processing region located on the side of the liquid ejection execution region in which the liquid ejecting head ejects the liquid onto the liquid ejecting material, the wiper contact operation and the wiper intersect the nozzle row of the liquid ejecting head. A control unit that controls a wiping operation that is executed in combination with a relative movement operation in a direction to perform,
The control unit causes the wiper to contact the wiper at a wiping start position with a position between the first nozzle row and the second nozzle row as a wiping start position, and moves in one direction of the relative movement. The wiper performs unidirectional wiping in which the wiper moves from the wiping start position on the nozzle forming surface to a region closer to the liquid ejection execution region, and then the wiper is brought into contact with the wiping start position again to perform the relative movement. A liquid configured to execute wiping in the other direction in which the wiper moves to a region away from the liquid jetting execution region from the wiping start position on the nozzle forming surface by moving in the other direction. Injection device. The liquid ejecting apparatus according to claim 1,
The control unit performs relative movement of the wiper and the liquid ejecting head to the wiping start position of the wiper in accordance with the movement of the wiper from the non-contact position to the contact position, and the wiper moves the nozzle forming surface. A liquid ejecting apparatus configured to control a bending posture of a wiper tip when abutting against the nozzle forming surface according to a moving direction of the relative movement when abutting against a nozzle. The liquid ejecting apparatus according to claim 1 or 2,
In the relative movement direction, the width of the top surface of contact with the nozzle forming surface of the distal end portion of the wiper is wider in both directions of the relative movement direction than the portion other than the tip portion, the first nozzle row and the second A liquid ejecting apparatus characterized in that it is narrower than the distance between the nozzle row . In the liquid ejecting apparatus according to any one of claims 1 to 3,
In the relative movement direction, the width of the tip of the wiper is narrower than the distance between the first nozzle row and the second nozzle row, and a recess is formed at a portion of the tip facing the nozzle formation surface. A liquid ejecting apparatus which is formed. In the liquid ejecting apparatus according to any one of claims 1 to 4,
A wiping member that slides on the wiper after the wiping operation and a liquid tank capable of supplying a cleaning liquid to the wiping member are provided at a retracted position of the wiper after the wiping operation , and a cleaning mechanism for cleaning the wiper is provided. A liquid ejecting apparatus. The liquid ejecting head is relatively moved such that the wiper in the retracted state is positioned at the wiping start position located between the first nozzle row and the second nozzle row provided on the nozzle forming surface of the liquid ejecting head. 1 moving process,
A first wiper contact step of bringing the tip of the wiper into contact with the wiping start position toward the wiping start position of the nozzle forming surface;
A first wiping step in which the liquid ejecting head is moved in one direction in the relative movement direction and wiped with the wiper contacting the nozzle forming surface on the side where the first nozzle row exists;
A first wiper retracting step of retracting the wiper after the first wiping step, the first wiper retracting step including a cleaning step of cleaning when the wiper is retracted ;
A second moving step of relatively moving the liquid jet head as the wiper of the saving state to the wiping start position of the nozzle formation surface is positioned,
A second wiper contact step of bringing the tip of the wiper into contact with the wiping start position toward the wiping start position of the nozzle forming surface;
A second wiping step of moving the liquid ejecting head in the other direction of the relative movement direction and wiping with the wiper contacting the nozzle forming surface on the side where the second nozzle row exists;
A liquid comprising: a second wiper retracting process for retracting the wiper after the second wiping process, and a second wiper retracting process including a cleaning process for cleaning when the wiper is retracted. A method of wiping the nozzle forming surface of the ejection head.

Images