JP5466414B2 - Charged particle beam drawing apparatus, pattern inspection apparatus, and layout display method - Google Patents

Description

  The present invention relates to a charged particle beam drawing apparatus having a screen for laying out and displaying layered data for a charged particle beam drawing apparatus, and a layered pattern inspection for inspecting a pattern drawn by a charged particle beam The present invention relates to a pattern inspection apparatus having a screen for displaying the layout of apparatus data, and a layout display method for laying out and displaying hierarchized charged particle beam drawing apparatus data or pattern inspection apparatus data on a screen.

  2. Description of the Related Art Conventionally, a charged particle beam drawing apparatus having a screen for displaying a layout (viewer process) of hierarchized charged particle beam drawing apparatus data for drawing a pattern with a charged particle beam is known. An example of this type of charged particle beam drawing apparatus is described in FIG. 7 and paragraph [0041] of Patent Document 1 (Japanese Patent Laid-Open No. 2008-244196), for example.

  In the charged particle beam drawing apparatus described in Patent Document 1, data for a charged particle beam drawing apparatus for drawing a pattern with a charged particle beam has a chip hierarchy, a frame hierarchy, a block hierarchy, a cell hierarchy, and a figure hierarchy. It is layered. The chip hierarchy, frame hierarchy, block hierarchy, cell hierarchy, and figure hierarchy are described in detail in, for example, Patent Document 2.

  In detail, in the charged particle beam drawing apparatus described in Patent Document 1, when the hierarchical charged particle beam drawing apparatus data is subjected to layout display (viewer processing), a cell to be displayed in a layout can be selected. This is described in paragraph [0041] of Patent Document 1.

JP 2008-244196 A FIG. 2 of JP 2008-47722 A

  By the way, Patent Document 1 does not describe in detail how to select a cell to be displayed in layout when hierarchically displaying charged particle beam drawing apparatus data.

  Patent Document 1 describes what processing is performed when the magnification of the layout display is increased until reading of a large number of figures in the figure hierarchy of the charged particle beam drawing apparatus data is started. It has not been.

  In general, the data amount of the graphic layer included in the charged particle beam drawing apparatus data is much larger than the data amount of the chip hierarchy, frame hierarchy, block hierarchy, and cell layer included in the charged particle beam drawing apparatus data. ing. Further, in a general method of displaying the data for the charged particle beam drawing apparatus on the screen, when the layout display magnification is low, the chip hierarchy, the frame hierarchy, the block hierarchy, and the cell hierarchy included in the charged particle beam drawing apparatus data However, the graphic hierarchy data is not read and the layout is not displayed on the screen. Therefore, when the magnification of the layout display is low, the time required to read the data for the charged particle beam lithography system (specifically, the data of the chip hierarchy, the frame hierarchy, the block hierarchy, and the cell hierarchy) and the layout display (viewer time) is compared. Shorter.

  However, in a general method for displaying the data for the charged particle beam drawing apparatus on the screen, when the magnification of the layout display is expanded to a predetermined value, reading of a large amount of figure hierarchy data is started. The time (View Time) required for reading and layout display of the data for the particle beam drawing apparatus (specifically, data of the chip hierarchy, frame hierarchy, block hierarchy, cell hierarchy, and graphic hierarchy) will be very long.

  In view of the above-described problems, an object of the present invention is to provide a charged particle beam drawing apparatus capable of displaying layout data for hierarchized charged particle beam drawing apparatus at high speed.

  It is another object of the present invention to provide a pattern inspection apparatus capable of displaying layout data for hierarchized pattern inspection apparatuses at high speed.

  It is another object of the present invention to provide a layout display method capable of performing layout display of hierarchized charged particle beam drawing apparatus data or pattern inspection apparatus data at high speed.

According to one aspect of the present invention, for a charged particle beam lithography apparatus that includes a first layer element and includes at least a first element and a second element in a second layer lower than the first layer. Reading means for reading data,
A screen for layout display of data for a charged particle beam drawing apparatus;
A map having flags in a plurality of sections arranged roughly in a grid pattern;
When the first element of the second layer is read and the section on the map corresponding to the position of the first element is calculated, the flag of the section corresponding to the position of the first element of the second layer is set to “second layer Switching means for switching from the "element layout display possible" state to the "second layer element layout not displayable"state;
Determining means for determining whether or not the flag of the section corresponding to the position of the second element of the second hierarchy is in a state of “impossible to display layout of elements of the second hierarchy”;
Since the section on the map corresponding to the position of the first element and the section on the map corresponding to the position of the second element are the same, the section corresponding to the position of the second element of the second hierarchy Layout display processing stop means for canceling the processing of displaying the second element of the second hierarchy on the screen when the flag is in a state of “impossible to display the layout of the element of the second hierarchy” ;
The charged particle is characterized in that the screen displays a layout on the map corresponding to the position of the first element, which is in a state in which “the layout display of the elements of the second hierarchy is possible” before the switching. A beam drawing apparatus is provided.

According to another aspect of the present invention, the image is drawn by a charged particle beam that includes an element in the first layer and includes at least a first element and a second element in a second layer lower than the first layer. A reading means for reading data for a layered pattern inspection apparatus for inspecting a pattern;
A screen for layout display of data for the pattern inspection device;
A map having flags in a plurality of sections arranged roughly in a grid pattern;
When the first element of the second layer is read and the section on the map corresponding to the position of the first element is calculated, the flag of the section corresponding to the position of the first element of the second layer is set to “second layer Switching means for switching from the "element layout display possible" state to the "second layer element layout not displayable"state;
Determining means for determining whether or not the flag of the section corresponding to the position of the second element of the second hierarchy is in a state of “impossible to display layout of elements of the second hierarchy”;
Since the section on the map corresponding to the position of the first element and the section on the map corresponding to the position of the second element are the same, the section corresponding to the position of the second element of the second hierarchy Layout display processing stop means for canceling the processing of displaying the second element of the second hierarchy on the screen when the flag is in a state of “impossible to display the layout of the element of the second hierarchy” ;
The screen displays a layout on the map corresponding to the position of the first element, which is in a state in which “the layout display of the elements of the second hierarchy is possible” before the switching. An apparatus is provided.

According to still another aspect of the present invention, charged particle beam lithography apparatus data includes an element of a first hierarchy and includes at least a first element and a second element in a second hierarchy lower than the first hierarchy. Alternatively, in a layout display method for displaying pattern inspection device data on a screen,
A step of creating a map having flags in a plurality of sections arranged in a substantially grid pattern when the magnification of the layout display is expanded until reading of the first element and the second element of the second hierarchy is started;
Reading the first element of the second hierarchy;
Displaying a layout of the first element of the second hierarchy on the screen;
When the first element of the second layer is read and the section on the map corresponding to the position of the first element is calculated, the flag of the section corresponding to the position of the first element of the second layer is set to “second layer Switching from the “element layout display enabled” state to the “second layer element layout display disabled” state;
Reading the second element of the second hierarchy;
Determining whether the flag of the section corresponding to the position of the second element of the second hierarchy is in a state of “impossible to display layout of elements of the second hierarchy”;
Since the section on the map corresponding to the position of the first element and the section on the map corresponding to the position of the second element are the same, the section corresponding to the position of the second element of the second hierarchy If the flag is in a state of "layout display not the elements of the second hierarchy", seen including a step to stop the process of displaying a layout of the second element of the second hierarchy on the screen,
When displaying the layout of the first element on the screen, the section of the map corresponding to the position of the first element and in which the layout of the element of the second hierarchy was in the state of “possible to display the layout of the element of the second hierarchy” before the switching A layout display method is provided.

  According to the present invention, hierarchized charged particle beam drawing apparatus data or pattern inspection apparatus data can be laid out and displayed at high speed.

1 is a schematic configuration diagram of a charged particle beam drawing apparatus 10 according to a first embodiment. It is the figure which showed roughly the data D1 for charged particle beam drawing apparatuses shown in FIG. FIG. 3 is a diagram showing a relationship between a screen of a monitor 10d5 shown in FIG. 1 and a cell CL1 shown in FIG. It is the figure which showed the arrangement | positioning coordinate (xFG1, yFG1) and magnitude | size (X direction dimension wFG1, Y direction dimension hFG1), etc. of figure FG1. It is the figure which showed the screen of the monitor 10d5 etc. in the state by which the figure FG1 was layout-displayed. It is the figure which showed the arrangement | positioning coordinate (xFG2, yFG2) and magnitude | size (X direction dimension wFG2, Y direction dimension hFG2), etc. of figure FG2. The arrangement coordinates (xFGn-1, yFGn-1) and size (X direction dimension wFGn-1, Y direction dimension hFGn) of the figure hierarchy FG corresponding to the cell CL1 shown in FIG. 2 and FIG. -1) and the like. It is a figure showing the state of the flag of map MPCL1 in the stage of judging whether the layout display of the element (figure FGn-1, ...) of figure hierarchy FG is possible. It is the figure which showed the screen etc. of the monitor 10d5 in the state by which the figure FGn-1 was layout-displayed. FIG. 4 is a diagram showing the arrangement coordinates (xFGn, yFGn) and size (X-direction dimension wFGn, Y-direction dimension hFGn) and the like of the figure FGn of the figure hierarchy FG corresponding to the cell CL1 shown in FIGS. 2 and 3A. . It is the figure which showed the screen of the monitor 10d5 etc. in the state by which the figure FGn was layout-displayed. In the case where the magnification of the layout display is set higher than that in FIG. 3, the outline of the cell CL1 on the screen of the monitor 10d5 and the boundary line of two adjacent pixels on the screen of the monitor 10d5 do not match. This is a case for explaining a case where the contour of one pixel PX00 on the screen of the monitor 10d5 does not correspond (match) with the contour of one section SC00 of the map MPCL1. The figure which showed the arrangement | positioning coordinate (xFGm, yFGm) and magnitude | size (X direction dimension wFGm, Y direction dimension hFGm), etc. of the figure FGm when the process by the charged particle beam drawing apparatus 10 of 1st Embodiment is not performed. is there. It is the figure which showed the screen etc. of the monitor 10d5 by which the figure FGm was layout-displayed when the process by the charged particle beam drawing apparatus 10 of 1st Embodiment is not performed. It is the figure which showed the arrangement | positioning coordinate (xFGm + 1, yFGm + 1), magnitude | size (X direction dimension wFGm + 1, Y direction dimension hFGm + 1), etc. of figure FGm + 1. FIG. 5 is a diagram showing the arrangement coordinates (xFGm, yFGm) and size (X-direction dimension wFGm, Y-direction dimension hFGm) and the like of a figure FGm when processing by the charged particle beam drawing apparatus 10 of the first embodiment is performed. . FIG. 5 is a diagram showing a screen of a monitor 10d5 on which an assumed figure FGm ′ is laid out when processing by the charged particle beam drawing apparatus 10 of the first embodiment is performed. It is a figure for demonstrating the effect of the charged particle beam drawing apparatus 10 of 1st Embodiment. It is the figure which showed the relationship between the screen of monitor 10d5 of the charged particle beam drawing apparatus 10 of 11th Embodiment, and block BL21. It is the figure which showed arrangement | positioning coordinate (xCL1, yCL1) and size (X direction dimension wCL1, Y direction dimension hCL1), etc. of the cell CL1. It is the figure which showed the screen and the like of monitor 10d5 in the state where cell CL1 is displayed layout. It is the figure which showed the arrangement | positioning coordinate (xCL2, yCL2) and size (X direction dimension wCL2, Y direction dimension hCL2), etc. of the cell CL2. It is a figure for demonstrating the effect of the charged particle beam drawing apparatus 10 of 11th Embodiment. It is the figure which showed the relationship between the screen of the monitor 10d5 of the charged particle beam drawing apparatus 10 of 13th Embodiment, and the cell CL1 shown in FIG. It is the figure which showed the arrangement | positioning coordinate (xFG11, yFG11) and magnitude | size (X direction dimension wFG11, Y direction dimension hFG11), etc. of the figure FG11 which belongs to a 1st layer. It is the figure which showed the screen and the like of monitor 10d5 in the state where the figure FG11 which belongs to the 1st layer is displayed layout. It is the figure which showed the arrangement | positioning coordinate (xFG12, yFG12) and magnitude | size (X direction dimension wFG12, Y direction dimension hFG12), etc. of the figure FG12 which belongs to a 1st layer. It is the figure which showed the arrangement | positioning coordinate (xFG21, yFG21) and magnitude | size (X direction dimension wFG21, Y direction dimension hFG21), etc. of the figure FG21 which belongs to a 2nd layer. It is the figure which showed the screen of the monitor 10d5 etc. in the state by which the figure FG11 which belongs to the 1st layer, and the figure FG21 which belongs to the 2nd layer were displayed by layout. It is the figure which showed the arrangement | positioning coordinate (xFG22, yFG22) and magnitude | size (X direction dimension wFG22, Y direction dimension hFG22), etc. of the figure FG22 which belongs to a 2nd layer. It is the figure which showed the arrangement | positioning coordinate (xFG21, yFG21) and magnitude | size (X direction dimension wFG21, Y direction dimension hFG21), etc. of the figure FG21 which belongs to a 2nd layer. It is a figure showing the screen of monitor 10d5, etc. in the state where the figure FG21 which belongs to the 2nd layer was displayed by layout. It is a schematic block diagram of the pattern inspection apparatus 20 of 1st Embodiment.

  A charged particle beam drawing apparatus according to a first embodiment of the present invention will be described below. FIG. 1 is a schematic configuration diagram of a charged particle beam drawing apparatus 10 according to the first embodiment. In the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIG. 1, a charged particle beam 10 a 1 b is irradiated onto a sample M such as a mask (blank), a wafer, etc. A drawing unit 10a for drawing a target pattern is provided.

  In the charged particle beam drawing apparatus 10 of the first embodiment, for example, an electron beam is used as the charged particle beam. However, in the charged particle beam drawing apparatus 10 of the second embodiment, for example, an ion beam is used as the charged particle beam instead. It is also possible to use a charged particle beam other than the electron beam.

  In the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIG. 1, a charged particle gun 10a1a, deflectors 10a1f and 10a1i for deflecting a charged particle beam 10a1b from the charged particle gun 10a1a, and a deflector 10a1f. , 10a1i is provided with a movable stage 10a2a on which a sample M to be drawn by a charged particle beam 10a1b deflected by 10a1i is placed.

  Specifically, in the charged particle beam drawing apparatus 10 according to the first embodiment, as shown in FIG. 1, for example, a movable stage 10a2a on which a sample M is placed in a drawing chamber 10a2 that constitutes a part of the drawing unit 10a. Is arranged. Further, an optical barrel 10a1 that constitutes a part of the drawing unit 10a includes, for example, a charged particle gun 10a1a, an illumination lens 10a1c, a first shaping aperture 10a1d, a projection lens 10a1e, a deflector 10a1f, and a second shaping aperture. 10a1g, objective lens 10a1h, and deflector 10a1i are arranged.

  In the charged particle beam drawing apparatus 10 according to the first embodiment, as shown in FIG. 1, for example, layout data (design data, CAD data) such as a semiconductor integrated circuit is converted by, for example, a drawing data creation apparatus (not shown). Data D1 for the charged particle beam drawing apparatus obtained in this way is input, for example, in a disk format.

  FIG. 2 is a diagram schematically showing the charged particle beam drawing apparatus data D1 shown in FIG. As shown in FIG. 2, the charged particle beam drawing apparatus data D1 used in the charged particle beam drawing apparatus 10 of the first embodiment includes, for example, a chip hierarchy CP, a frame hierarchy FR lower than the chip hierarchy CP, and a frame It is hierarchized into a block hierarchy BL lower than the hierarchy FR, a cell hierarchy CL lower than the block hierarchy BL, and a graphic hierarchy FG lower than the cell hierarchy CL.

  Specifically, in the example illustrated in FIG. 2, for example, the chip CP1 which is a part of the element of the chip hierarchy CP of the charged particle beam drawing apparatus data D1 is an element of the frame hierarchy FR of the charged particle beam drawing apparatus data D1. Corresponds to three frames FR1, FR2 and FR3. Further, for example, a frame FR2 which is a part of the element of the frame hierarchy FR of the charged particle beam drawing apparatus data D1 is 18 blocks which are a part of the elements of the block hierarchy BL of the charged particle beam drawing apparatus data D1. It corresponds to BL00, BL10, BL20, BL30, BL40, BL50, BL01, BL11, BL21, BL31, BL41, BL51, BL02, BL12, BL22, BL32, BL42, BL52. Further, for example, the block BL21 which is a part of the element of the block hierarchy BL of the charged particle beam drawing apparatus data D1 is four cells which are a part of the elements of the cell hierarchy CL of the charged particle beam drawing apparatus data D1. It corresponds to CL1, CL2, CL3, and CL4. In addition, for example, the cell CL1 that is a part of the element of the cell hierarchy CL of the charged particle beam drawing apparatus data D1 is a large number of figures FG1 that are part of the elements of the figure hierarchy FG of the charged particle beam drawing apparatus data D1. , FG2,.

  In the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIG. 1, the charged particle beam drawing apparatus data D1 is converted into the apparatus internal format by the apparatus internal format data creation unit 10b, and charged particle beam drawing is performed. Device data D2 is created. Next, the charged particle beam drawing apparatus data D2 is input to the drawing control unit 10c, and the drawing control unit 10c controls the drawing unit 10a. As a result, a target pattern is drawn on the sample M by the charged particle beam 10a1b.

  In the charged particle beam drawing apparatus 10 of the first embodiment, the charged particle beam drawing apparatus data D2 created by the apparatus internal format data creation unit 10b is also shown in FIG. It is layered as shown.

  Further, in the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIG. 1, not only the charged particle beam drawing apparatus data D1 is input to the apparatus internal format data creation unit 10b but also a layout display. It is input also to the part 10d. In other words, in the charged particle beam drawing apparatus 10 of the first embodiment, the hierarchical charged particle beam drawing apparatus data D1 as shown in FIG. 2 is displayed on the screen of the monitor 10d5 of the layout display unit 10d (viewer). It is processed.

  Specifically, in the charged particle beam drawing apparatus 10 according to the first embodiment, the hierarchized charged particle beam drawing apparatus data D2 is not only input to the drawing control unit 10c but also indicated by a broken line in FIG. As described above, the layout display unit 10d can also be input. That is, in the charged particle beam drawing apparatus 10 of the first embodiment, the charged particle beam drawing apparatus data D2 hierarchized in the same manner as the charged particle beam drawing apparatus data D1 shown in FIG. Layout display (viewer processing) can be performed on the screen of the monitor 10d5.

  FIG. 3 is a diagram showing the relationship between the screen of the monitor 10d5 shown in FIG. 1 and the cell CL1 shown in FIG. Specifically, FIG. 3A shows the relationship between the screen of the monitor 10d5 and the cell CL1 when the magnification of the layout display is set to a predetermined value, and FIG. 3B is the same as FIG. The map MPCL1 created corresponding to the cell CL1 shown in FIG.

  In the charged particle beam drawing apparatus 10 of the first embodiment, the charged particle beam drawing apparatus data D1 (see FIG. 1) is stored in the monitor 10d5 (see FIG. 3A) of the layout display unit 10d (see FIG. 1). When the layout is displayed on the screen (viewer processing), the X-direction dimension (width dimension) wCL1 (FIG. 3A) of the cell CL1 (see FIG. 3A) on the screen of the monitor 10d5 (see FIG. 3A). )) Is smaller than the X-direction dimension (width dimension) of, for example, five pixels of the monitor 10d5 (see FIG. 3A), and the Y-direction dimension hCL1 (see FIG. 3) of the cell CL1 (see FIG. 3A). 3 (A)) is smaller than the Y-direction dimension of, for example, five pixels of the monitor 10d5 (see FIG. 3 (A)) (that is, when the magnification of the layout display is not enlarged), the cell CL1 (Fig. 3 (A Elements of figure hierarchy FG corresponding to the reference) (figure FG1, FG2, · ·) is not loaded, the monitor 10D5 (FIG. 3 (A) is not laid on the screen of the reference).

  That is, in the charged particle beam drawing apparatus 10 of the first embodiment, the magnification of the layout display is such that the elements of the graphic hierarchy FG (graphics FG1, FG2,...) In the charged particle beam drawing apparatus data D1 are not read. Is low (that is, when the layout display magnification is lower than that in FIG. 3A) and the layout display of the elements of the chip hierarchy CP (chips CP1,...) Is selected, for example, As shown in FIGS. 1 and 2, the elements (chips CP1,...) In the chip hierarchy CP in the charged particle beam drawing apparatus data D1 are sequentially read by the data reading unit 10d1. Next, the data processing unit 10d2 calculates the position on the screen of the monitor 10d5 corresponding to the arrangement coordinates and sizes (X-direction dimensions and Y-direction dimensions) of the elements (chips CP1,...) Of the chip hierarchy CP. Next, the layout display object generation unit 10d3 adds information such as a color for displaying the elements of the chip hierarchy CP (chips CP1,...) In a layout manner, and generates an object for layout display. Next, the layout display unit 10d4 displays, for example, the outline of the elements of the chip hierarchy CP (chips CP1,...) On the screen of the monitor 10d5.

  In the charged particle beam drawing apparatus 10 of the first embodiment, the magnification of layout display is such that the elements (figure FG1, FG2,...) Of the figure hierarchy FG in the charged particle beam drawing apparatus data D1 are not read. Is low (that is, when the layout display magnification is lower than that in FIG. 3A) and the layout display of the elements of the frame hierarchy FR (frames FR1, FR2,...) Is selected. For example, as shown in FIGS. 1 and 2, the elements (frames FR1, FR2,...) Of the frame layer FR in the charged particle beam drawing apparatus data D1 are sequentially read by the data reading unit 10d1. Next, the data processing unit 10d2 calculates the position on the screen of the monitor 10d5 corresponding to the arrangement coordinates and sizes (X-direction dimensions and Y-direction dimensions) of the elements (frames FR1, FR2,...) Of the frame hierarchy FR. The Next, the layout display object generation unit 10d3 adds information such as the color for displaying the elements of the frame hierarchy FR (frames FR1, FR2,...) In a layout manner, and generates an object for layout display. Next, the layout display unit 10d4 displays, for example, the outline of the elements of the frame hierarchy FR (frames FR1, FR2,...) On the screen of the monitor 10d5.

  Furthermore, in the charged particle beam drawing apparatus 10 of the first embodiment, the magnification of the layout display is such that the elements of the graphic hierarchy FG (graphics FG1, FG2,...) In the charged particle beam drawing apparatus data D1 are not read. Is low (that is, when the layout display magnification is lower than that in FIG. 3A) and the layout display of the elements of the block hierarchy BL (blocks BL00, BL10,...) Is selected. For example, as shown in FIGS. 1 and 2, the elements (blocks BL00, BL10,...) In the block hierarchy BL in the charged particle beam drawing apparatus data D1 are sequentially read by the data reading unit 10d1. Next, the data processing unit 10d2 calculates the position on the screen of the monitor 10d5 corresponding to the arrangement coordinates and sizes (X-direction dimensions and Y-direction dimensions) of the elements (blocks BL00, BL10,...) Of the block hierarchy BL. The Next, the layout display object generation unit 10d3 adds information such as colors for layout display of the elements of the block hierarchy BL (blocks BL00, BL10,...), And generates an object for layout display. Next, the layout display unit 10d4 displays, for example, the outline of the elements of the block hierarchy BL (blocks BL00, BL10,...) On the screen of the monitor 10d5.

  In the charged particle beam drawing apparatus 10 of the first embodiment, the magnification of layout display is such that the elements (figure FG1, FG2,...) Of the figure hierarchy FG in the charged particle beam drawing apparatus data D1 are not read. Is low (that is, when the layout display magnification is lower than that in FIG. 3A) and the layout display of the elements (cells CL1, CL2,...) Of the cell hierarchy CL is selected. For example, as shown in FIGS. 1 and 2, the elements (cells CL1, CL2,...) Of the cell hierarchy CL in the charged particle beam drawing apparatus data D1 are sequentially read by the data reading unit 10d1. Next, the data processing unit 10d2 calculates the position on the screen of the monitor 10d5 corresponding to the arrangement coordinates and size (X direction dimension and Y direction dimension) of the elements (cells CL1, CL2,...) Of the cell hierarchy CL. The Next, the layout display object generation unit 10d3 adds information such as a color for displaying the elements of the cell hierarchy CL (cells CL1, CL2,...) In a layout manner, and generates an object for layout display. Next, the layout display unit 10d4 displays, for example, the outline of the elements of the cell hierarchy CL (cells CL1, CL2,...) On the screen of the monitor 10d5. Specifically, in this case, the cells CL1, CL2,.

  Furthermore, in the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIG. 3A, the X-direction dimension (width dimension) wCL1 of the cell CL1 on the screen of the monitor 10d5 is, for example, a pixel of the monitor 10d5. When the magnification of the layout display is increased until it becomes equal to the five X-direction dimensions (width dimensions), reading of the elements of the graphic hierarchy FG (graphics FG1, FG2,...) Corresponding to the cell CL1 is started. .

  Specifically, in the charged particle beam drawing apparatus 10 of the first embodiment, for example, as shown in FIG. 3A, the elements of the graphic hierarchy FG (graphics FG1, FG2,...) Corresponding to the cell CL1. As shown in FIG. 3B, when the magnification of the layout display is increased until the reading of the image is started, the elements of the graphic hierarchy FG (graphics FG1, FG2,...) Corresponding to the cell CL1 are read. First, a plurality of partitions SC00, SC10, SC20, SC30, SC40, SC01, SC11, SC21, SC31, SC41, SC02, SC12, SC22, SC32, SC42, SC03, SC13, arranged in a substantially grid pattern. SC23, SC33, SC43, SC04, SC14, SC24, SC34, SC44, SC05, SC15, SC25, SC3 , Map MPCL1 having a flag ( "0" or "1") is created SC45.

  Specifically, in the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIGS. 3A and 3B, a map MPCL1 is created corresponding to the cell CL1. Further, by dividing the map MPCL1 into a plurality of pieces in the X direction, for example, and dividing the map MPCL1 into a plurality of pieces in the Y direction, for example, a plurality of partitions SC00, SC10,..., SC35, SC45 are created.

  Next, in the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIG. 3B, the flags of the sections SC00, SC10,..., SC35, SC45 are initialized. That is, the flags of the sections SC00, SC10,..., SC35, and SC45 are set to the state “0” indicating that “the layout display of the elements of the graphic hierarchy FG (graphics FG1, FG2,.

  Next, in the charged particle beam drawing apparatus 10 of the first embodiment, the data reading unit 10d1 (see FIG. 1) causes the elements (figure FG1) of the figure hierarchy FG in the charged particle beam drawing apparatus data D1 (FIG. 2 and FIG. 2). 3A) is read.

  FIG. 4 is a diagram showing the arrangement coordinates (xFG1, yFG1) and size (X-direction dimension wFG1, Y-direction dimension hFG1) of the figure FG1. Specifically, FIG. 4A shows the arrangement coordinates (xFG1, yFG1) and size (X-direction dimension wFG1, Y-direction dimension hFG1) of the figure FG1, and FIG. 4B shows the screen on the monitor 10d5. The position of the figure FG1 is shown, and FIG. 4C shows the position of the figure FG1 on the map MPCL1.

  Next, in the charged particle beam drawing apparatus 10 according to the first embodiment, as shown in FIGS. 4A and 4B, the data processing unit 10d2 (see FIG. 1) uses the elements (graphics) of the graphic hierarchy FG. The position (pixel PX22) on the screen of the monitor 10d5 corresponding to the arrangement coordinates (xFG1, yFG1) and size (X-direction dimension wFG1 and Y-direction dimension hFG1) of FG1) is calculated. Also, as shown in FIGS. 4A and 4C, the data processing unit 10d2 (see FIG. 1) allows the arrangement coordinates (xFG1, yFG1) and size (figure FG1) of the element (figure FG1) of the figure hierarchy FG. A position (section SC22) on the map MPCL1 corresponding to the X-direction dimension wFG1 and the Y-direction dimension hFG1) is calculated.

  FIG. 5 is a diagram showing a screen of the monitor 10d5 and the like in a state where the figure FG1 is laid out. Specifically, FIG. 5A shows the screen of the monitor 10d5 in a state where the graphic FG1 (see FIG. 4B) is laid out, and FIG. 5B shows the graphic FG1 (FIG. 4C). Reference) shows the flag state of the map MPCL1 after the layout display.

  Next, in the charged particle beam drawing apparatus 10 according to the first embodiment, the layout display object generation unit 10d3 (see FIG. 1) adds information such as a color for displaying the layout of the elements of the graphic hierarchy FG (graphic FG1). An object for layout display is generated. Next, as shown in FIG. 5A, the layout display unit 10d4 (see FIG. 1) causes the element (figure FG1) in the graphic hierarchy FG (see FIG. 4B) to be the pixel PX22 on the screen of the monitor 10d5. The layout is displayed at the position. Also, as shown in FIGS. 4C and 5B, the flag of the partition SC22 corresponding to the position of the element (figure FG1) of the figure hierarchy FG is “elements of the figure hierarchy FG (figure FG2,. ) ”In the“ displayable layout display ”state (see FIG. 3B) is switched to the“ 1 ”in the layout display disabled state of the elements of the graphic hierarchy FG (graphics FG2,...).

  Next, in the charged particle beam drawing apparatus 10 of the first embodiment, the data reading unit 10d1 (see FIG. 1) causes the elements (figure FG2) of the figure hierarchy FG in the charged particle beam drawing apparatus data D1 (see FIG. 2). 3A) is read.

  FIG. 6 is a diagram showing the arrangement coordinates (xFG2, yFG2) and size (X-direction dimension wFG2, Y-direction dimension hFG2) of the figure FG2. Specifically, FIG. 6A shows the arrangement coordinates (xFG2, yFG2) and size (X-direction dimension wFG2, Y-direction dimension hFG2) of the figure FG2, and FIG. 6B shows the screen on the monitor 10d5. FIG. 6C shows the position of the figure FG2 on the map MPCL1.

  Next, in the charged particle beam drawing apparatus 10 according to the first embodiment, as shown in FIGS. 6A and 6B, the data processing unit 10d2 (see FIG. 1) uses the elements (graphics) of the graphic hierarchy FG. The position (pixel PX22) on the screen of the monitor 10d5 corresponding to the arrangement coordinates (xFG2, yFG2) and the size (X direction dimension wFG2 and Y direction dimension hFG2) of FG2) is calculated. Further, as shown in FIGS. 6A and 6C, the data processing unit 10d2 (see FIG. 1) allows the arrangement coordinates (xFG2, yFG2) and the size (figure FG2) of the element (figure FG2) of the figure hierarchy FG. A position (section SC22) on the map MPCL1 corresponding to the X-direction dimension wFG2 and the Y-direction dimension hFG2) is calculated.

  Next, in the charged particle beam drawing apparatus 10 of the first embodiment, the data processing unit 10d2 (see FIG. 1) sets the flag of the partition SC22 corresponding to the position of the element (graphic FG2) of the graphic hierarchy FG to “graphic hierarchy FG”. It is determined whether or not the state “1” of the layout display impossibility of the element (graphic FG2,. At this stage, as shown in FIG. 5B, the flag of the section SC22 corresponding to the position of the element (figure FG2) of the graphic hierarchy FG indicates that “the layout display of the elements (figure FG2,. In the charged particle beam drawing apparatus 10 according to the first embodiment, the figure hierarchy by the layout display object generation unit 10d3 (see FIG. 1) and the layout display unit 10d4 (see FIG. 1). Processing for displaying the layout of the FG element (figure FG2) on the screen of the monitor 10d5 is not performed.

  Specifically, if the elements of the graphic hierarchy FG (graphic FG1) are laid out and displayed on the screen of the monitor 10d5, and the elements of the graphic hierarchy FG (graphic FG2) are laid out and displayed on the screen of the monitor 10d5, As in the charged particle beam drawing apparatus 10 of the first embodiment, the elements of the graphic hierarchy FG (graphic FG1) are laid out and displayed on the screen of the monitor 10d5, and the elements of the graphic hierarchy FG (graphic FG2) are displayed on the screen of the monitor 10d5. When the layout is not displayed, the layout display result is the same (that is, the pixel PX22 is filled) (see FIG. 5A).

  In view of this point, in the charged particle beam drawing apparatus 10 of the first embodiment, the layout display result when the elements of the graphic hierarchy FG (graphic FG2) are laid out on the screen of the monitor 10d5 and the elements of the graphic hierarchy FG ( When the layout display result in the case where the graphic FG2) is not displayed on the screen of the monitor 10d5 is the same as the layout display result, the graphic hierarchy FG of the layout display object generation unit 10d3 (see FIG. 1) and the layout display unit 10d4 (see FIG. 1) Processing for displaying the layout of the element (figure FG2) on the screen of the monitor 10d5 is omitted.

  Therefore, according to the charged particle beam drawing apparatus 10 of the first embodiment, the elements (figure FG2) of the figure hierarchy FG are displayed by the layout display object generation unit 10d3 (see FIG. 1) and the layout display unit 10d4 (see FIG. 1). The layout display of the hierarchized charged particle beam drawing apparatus data D1 can be performed at a higher speed than when the process for displaying the layout on the screen of the monitor 10d5 is performed.

  In other words, according to the charged particle beam drawing apparatus 10 of the first embodiment, the layout display object generation unit 10d3 (see FIG. 1) and the layout display unit 10d4 (see FIG. 1) for all elements of the graphic hierarchy FG. The layout display of the hierarchized charged particle beam drawing apparatus data D1 can be performed at a higher speed than when the process for displaying the layout on the screen of the monitor 10d5 is performed.

  Further, in the charged particle beam drawing apparatus 10 of the first embodiment, in order to further speed up the layout display of the hierarchized charged particle beam drawing apparatus data D1, processing as described later is also performed.

  FIG. 7 shows the arrangement coordinates (xFGn−1, yFGn−1) and size (X-direction dimension wFGn−1, Y) of the figure hierarchy FG corresponding to the cell CL1 shown in FIG. 2 and FIG. It is the figure which showed the direction dimension hFGn-1). Specifically, FIG. 7A shows the arrangement coordinates (xFGn-1, yFGn-1) and size (X-direction dimension wFGn-1, Y-direction dimension hFGn-1) of the figure FGn-1. 7B shows the position of the figure FGn-1 on the screen of the monitor 10d5, and FIG. 7C shows the position of the figure FGn-1 on the map MPCL1.

  In the charged particle beam drawing apparatus 10 of the first embodiment, the data reading unit 10d1 (see FIG. 1) causes the elements (figure FGn-1) (figure FGn-1) (FIG. 7 ( A)) is read.

  Next, in the charged particle beam drawing apparatus 10 according to the first embodiment, as shown in FIGS. 7A and 7B, the data processing unit 10d2 (see FIG. 1) uses the elements (graphics) of the graphic hierarchy FG. The position (pixel PX10) on the screen of the monitor 10d5 corresponding to the arrangement coordinates (xFGn-1, yFGn-1) and size (X direction dimension wFGn-1 and Y direction dimension hFGn-1) of FGn-1) is calculated. Is done. Also, as shown in FIGS. 7A and 7C, the data processing unit 10d2 (see FIG. 1) causes the arrangement coordinates (xFGn−1, yFGn−) of the elements (graphic FGn−1) of the graphic hierarchy FG. 1) The position (section SC10) on the map MPCL1 corresponding to the size (X-direction dimension wFGn-1 and Y-direction dimension hFGn-1) is calculated.

  Next, in the charged particle beam drawing apparatus 10 of the first exemplary embodiment, the data processing unit 10d2 (see FIG. 1) sets the flag of the partition SC10 corresponding to the position of the element (figure FGn-1) of the figure hierarchy FG to “figure”. It is determined whether or not the state “1” of the layout display impossibility of the element (graphic FGn−1,...) Of the hierarchy FG is determined.

  FIG. 8 is a diagram showing the state of the flag of the map MPCL1 at the stage where it is determined whether or not the layout display of the elements of the graphic hierarchy FG (graphic FGn-1,...) Is possible. As shown in FIG. 8, at this stage, the flag of the section SC10 corresponding to the position of the element (figure FGn-1) of the figure hierarchy FG is "layout display of the elements (figure FGn-1, ...) of the figure hierarchy FG. In the charged particle beam drawing apparatus 10 according to the first embodiment, the element (figure FGn−1) of the figure hierarchy FG is obtained by the layout display object generation unit 10d3 (see FIG. 1). ) Is added to the layout display information, and a layout display object is generated.

  FIG. 9 is a diagram showing a screen of the monitor 10d5 and the like in a state where the figure FGn-1 is laid out. Specifically, FIG. 9A shows a screen of the monitor 10d5 in a state where the figure FGn-1 (see FIG. 7B) is displayed in a layout, and FIG. 9B shows the figure FGn-1 (see FIG. 9). 7 (C)) shows the state of the flag of the map MPCL1 after the layout display.

  Next, in the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIG. 9A, the layout display unit 10d4 (see FIG. 1) uses the elements of the graphic hierarchy FG (graphic FGn-1) (FIG. 7B) is displayed in a layout at the position of the pixel PX10 on the screen of the monitor 10d5. Further, as shown in FIGS. 7C and 9B, the flag of the partition SC10 corresponding to the position of the element (graphic FGn-1) of the graphic hierarchy FG indicates that the element of the graphic hierarchy FG (graphic FGn, ..) Layout display enabled state “0” (see FIG. 8) is switched to “hierarchy FG element (graphic FGn,...) Layout display disabled” state “1”.

  FIG. 10 shows the arrangement coordinates (xFGn, yFGn) and size (X-direction dimension wFGn, Y-direction dimension hFGn) of the figure FGn of the figure hierarchy FG corresponding to the cell CL1 shown in FIGS. 2 and 3A. FIG. Specifically, FIG. 10 (A) shows the arrangement coordinates (xFGn, yFGn) and size (X-direction dimension wFGn, Y-direction dimension hFGn) of the figure FGn, and FIG. 10 (B) is on the screen of the monitor 10d5. FIG. 10C shows the position of the figure FGn on the map MPCL1.

  Next, in the charged particle beam drawing apparatus 10 of the first embodiment, the data reading unit 10d1 (see FIG. 1) causes the elements (figure FGn) (figure FGn) (FIG. 10 (FIG. 10)) in the charged particle beam drawing apparatus data D1. A)) is read.

  Next, in the charged particle beam drawing apparatus 10 according to the first embodiment, as shown in FIGS. 10A and 10B, the data processing unit 10d2 (see FIG. 1) uses the elements (graphics) of the graphic hierarchy FG. The position (pixel PX12) on the screen of the monitor 10d5 corresponding to the arrangement coordinates (xFGn, yFGn) and the size (X-direction dimension wFGn and Y-direction dimension hFGn) of FGn) is calculated. Also, as shown in FIGS. 10A and 10C, the data processing unit 10d2 (see FIG. 1) allows the arrangement coordinates (xFGn, yFGn) and the size (figure FGn) of the elements (figure FGn) of the figure hierarchy FG. A position (section SC12) on the map MPCL1 corresponding to the X-direction dimension wFGn and the Y-direction dimension hFGn) is calculated.

  Next, in the charged particle beam drawing apparatus 10 of the first embodiment, the data processing unit 10d2 (see FIG. 1) sets the flag of the partition SC12 corresponding to the position of the element (graphic FGn) of the graphic hierarchy FG to “graphic hierarchy FG”. It is determined whether or not the state (1) of the element “figure FGn,...

  As shown in FIG. 9B, at this stage, the flag of the section SC12 corresponding to the position of the element (figure FGn) of the figure hierarchy FG indicates that the layout display of the element (figure FGn,...) Of the figure hierarchy FG is possible. In the charged particle beam drawing apparatus 10 of the first embodiment, the layout display object generation unit 10d3 (see FIG. 1) lays out the elements (figure FGn) of the figure hierarchy FG. Information such as the color to be displayed is added, and an object for layout display is generated.

  FIG. 11 is a diagram showing a screen of the monitor 10d5 and the like in a state in which the figure FGn is laid out. Specifically, FIG. 11A shows the screen of the monitor 10d5 in a state where the graphic FGn (see FIG. 10B) is displayed in a layout, and FIG. 11B shows the graphic FGn (FIG. 10C). FIG. 11C shows the arrangement coordinates (xFGn + 1, yFGn + 1) and size (X-direction dimension wFGn + 1, Y-direction dimension hFGn + 1) of the figure FGn + 1. Is shown.

  Next, in the charged particle beam drawing apparatus 10 according to the first embodiment, as shown in FIG. 11A, the layout display unit 10d4 (see FIG. 1) uses the elements of the graphic hierarchy FG (graphic FGn) (FIG. 10 ( B) is displayed in a layout at the position of the pixel PX12 (see FIGS. 9A and 10B) on the screen of the monitor 10d5. Further, as shown in FIGS. 10C and 11B, the flag of the partition SC12 corresponding to the position of the element (graphic FGn) of the graphic hierarchy FG is “element of graphic hierarchy FG (graphic FGn + 1,... ) Layout display enabled ”state“ 0 ”(see FIG. 9B) is switched to“ 1 ”of“ hierarchical display of elements (graphic FGn + 1,...) Of graphic hierarchy FG ”. As a result, as shown in FIG. 11B, the flag states of all the partitions SC00, SC10,..., SC35, SC45 of the map MPCL1 are “the layout of the elements of the graphic hierarchy FG (graphic FGn + 1,. The state “1” is displayed.

  In the charged particle beam drawing apparatus 10 of the first exemplary embodiment, as shown in FIG. 11B, the state of the flag is “a layout display of the elements (figure FGn + 1,...) Of the graphic hierarchy FG cannot be performed”. When the ratio of the partitions SC00, SC10,..., SC35, SC45 reaches 100%, for example, the elements of the graphic hierarchy FG (graphic FGn + 1,...) By the data reading unit 10d1 (see FIG. 1) Reading of (see FIG. 11C) is completed.

  Specifically, if the elements of the graphic hierarchy FG (graphics FGn + 1,...) Are read by the data reading unit 10d1 (see FIG. 1) and displayed on the screen of the monitor 10d5, the first embodiment will be described. As in the case of the charged particle beam drawing apparatus 10 of FIG. 1, the layout display result is the same as when the elements (figure FGn + 1,...) Of the figure hierarchy FG are not read by the data reading unit 10d1 (see FIG. 1) (that is, PX40, PX01, ..., PX41, P02, ..., PX42, PX03, ..., PX43, PX04, ..., PX44, PX05, ... , PX45 (see FIG. 3A) is filled in) (see FIG. 11A).

  In view of this point, in the charged particle beam drawing apparatus 10 of the first embodiment, the elements (figure FGn + 1,...) Of the figure hierarchy FG are read by the data reading unit 10d1 (see FIG. 1) and laid out on the screen of the monitor 10d5. When the layout display result in the case of display and the layout display result in the case where the elements (figure FGn + 1,...) Of the graphic hierarchy FG are not read by the data reading unit 10d1 (see FIG. 1) are the same, the data reading unit 10d1. Processing for reading the elements (figure FGn + 1,...) Of the graphic hierarchy FG (see FIG. 1), processing for the elements (figure FGn + 1,...) Of the graphic hierarchy FG by the data processing unit 10d2 (see FIG. 1) Display object generation unit 10d3 (see FIG. 1) and layer DOO display unit 10d4 (see FIG. 1) by the graphic hierarchy FG elements (figure FGn + 1, · ·) processing for layout display the screen of the monitor 10d5 is omitted.

  Therefore, according to the charged particle beam drawing apparatus 10 of the first embodiment, the process of reading the elements (figure FGn + 1,...) Of the figure hierarchy FG by the data reading unit 10d1 (see FIG. 1), the data processing unit 10d2 (see FIG. 1) and the elements of the graphic hierarchy FG by the layout display object generation unit 10d3 (see FIG. 1) and the layout display unit 10d4 (see FIG. 1) (graphics FGn + 1,...) The layout display of the hierarchized charged particle beam drawing apparatus data D1 can be performed at a higher speed than when processing for displaying the layout of FGn + 1,...) On the screen of the monitor 10d5 is performed.

  In other words, according to the charged particle beam drawing apparatus 10 of the first embodiment, the reading process by the data reading unit 10d1 (see FIG. 1) and the data processing unit 10d2 (see FIG. 1) are performed on all elements of the figure hierarchy FG. 1), and a layered charged particle beam as compared with the case where the layout display object generation unit 10d3 (see FIG. 1) and the layout display unit 10d4 (see FIG. 1) perform the layout display. The layout display of the drawing device data D1 can be performed at high speed.

  In the charged particle beam drawing apparatus 10 according to the first embodiment, the sections SC00, SC10, in which the flag is in the state “1” in which “the layout display of the elements (figure FGn + 1,... When the ratio of SC35 and SC45 reaches, for example, 100%, the element (figure FGn + 1,...) (See FIG. 11C) is read by the data reading unit 10d1 (see FIG. 1). However, in the charged particle beam drawing apparatus 10 of the third exemplary embodiment, instead, the state “1” in which the state of the flag is “impossible to display the layout of the element (figure FGn + 1,...) Of the figure hierarchy FG” When the ratio of the partitions SC00, SC10,..., SC35, SC45 reaches a value other than 100%, such as 50% to 95%, the data read Unit 10d1 (see FIG. 1) graphic hierarchy FG elements by (figure FGn + 1, · ·) it is also possible to terminate the reading of (FIG. 11 (C) see).

  Specifically, in the charged particle beam drawing apparatus 10 of the third embodiment, the elements of the figure hierarchy FG (figure FGn + 1,...) Are read by the data reading unit 10d1 (see FIG. 1) and displayed on the screen of the monitor 10d5. When the layout display result in the case where the data is read by the data reading unit 10d1 (see FIG. 1) is almost the same as the layout display result in the case where the elements (figure FGn + 1,. For example, when the data reading unit 10d1 (see FIG. 1) reads the elements (figure FGn + 1,...) Of the graphic hierarchy FG and the data processing unit 10d2 (see FIG. 1) Processing for figure FGn + 1,..., And layout display object generation unit Doo 10D3 (see FIG. 1) and the layout display unit 10d4 elements of the graphic hierarchy FG by (see FIG. 1) (figure FGn + 1, · ·) processing for layout display the screen of the monitor 10d5 is omitted.

  3 to 11 show the layout display so that the X-direction dimension (width dimension) wCL1 of the cell CL1 on the screen of the monitor 10d5 is equal to the X-direction dimension (width dimension) of five pixels of the monitor 10d5. The state when the magnification is set is shown. Specifically, in the example shown in FIGS. 3 to 11, for example, as shown in FIGS. 3A and 3B, the outline of the cell CL1 on the screen of the monitor 10d5 and the screen of the monitor 10d5 are adjacent to each other. The boundary line of the two pixels matches, and the contour of one pixel PX00 on the screen of the monitor 10d5 and the contour of one section SC00 of the map MPCL1 correspond (match).

  When the rectangular area displayed on the screen of the monitor 10d5 is specified in the layout display unit 10d of the charged particle beam drawing apparatus 10 of the first embodiment and the magnification of the layout display is set, the monitor 10d5 is naturally set. When the outline of the cell CL1 on the screen and the boundary line between two adjacent pixels on the screen of the monitor 10d5 do not match as shown in FIG. 3A (when it does not become as shown in FIG. 3A) ), Or the outline of one pixel PX00 on the screen of the monitor 10d5 and the outline of one section SC00 of the map MPCL1 do not correspond (match) as shown in FIGS. 3A and 3B ( 3 (A)). In such a case, what kind of processing is performed in the charged particle beam drawing apparatus 10 of the first embodiment will be described.

  FIG. 12 shows a case where the magnification of the layout display is set higher than that in FIG. 3, and the outline of the cell CL1 on the screen of the monitor 10d5 and the boundary line between two adjacent pixels on the screen of the monitor 10d5. Is a diagram for explaining a case where the outline of one pixel PX00 on the screen of the monitor 10d5 does not correspond (match) with the outline of one section SC00 of the map MPCL1. Specifically, FIG. 12A shows the relationship between a part of the screen of the monitor 10d5 and a part of the cell CL1 when the magnification of the layout display is set to be higher than that of FIG. FIG. 12B shows a part of the map MPCL1 created corresponding to the cell CL1 shown in FIG.

  In the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIG. 12A, when the magnification of layout display and the rectangular area (not shown) displayed on the screen of the monitor 10d5 are set, Reading of the elements (graphics FGm, FGm + 1,...) Of the graphic hierarchy FG corresponding to the cell CL1 is started.

  Specifically, in the charged particle beam drawing apparatus 10 of the first embodiment, before the elements of the graphic hierarchy FG (graphics FGm, FGm + 1,...) Corresponding to the cell CL1 are read, FIG. As shown, a map MPCL1 having flags in a plurality of sections SC00, SC10,..., SC01, SC11,.

  Next, in the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIG. 12B, the flags of the sections SC00, SC10,..., SC01, SC11,. That is, the flags of the sections SC00, SC10,..., SC01, SC11,... Are set to the state “0” of “the layout display of the elements of the graphic hierarchy FG (graphics FGm, FGm + 1,. .

  Next, in the charged particle beam drawing apparatus 10 of the first embodiment, the data reading unit 10d1 (see FIG. 1) causes the elements (figure FGm) of the figure hierarchy FG in the charged particle beam drawing apparatus data D1 (figure FGm) (FIG. 12 ( A)) is read.

  Subsequent processing will be described separately when the processing by the charged particle beam drawing apparatus 10 of the first embodiment is performed and when such processing is not performed. First, the case where the process by the charged particle beam drawing apparatus 10 of 1st Embodiment is not performed is demonstrated.

  FIG. 13 shows the arrangement coordinates (xFGm, yFGm) and size (X-direction dimension wFGm, Y-direction dimension hFGm) and the like of the figure FGm when processing by the charged particle beam drawing apparatus 10 of the first embodiment is not performed. It is a figure. Specifically, FIG. 13A shows the arrangement coordinates (xFGm, yFGm) and size (X-direction dimensions wFGm, Y) of the figure FGm when processing by the charged particle beam drawing apparatus 10 of the first embodiment is not performed. Direction dimension hFGm), and FIG. 13B shows the position of the graphic FGm on the screen of the monitor 10d5 when the process by the charged particle beam drawing apparatus 10 of the first embodiment is not performed. FIG. 13C shows the position of the figure FGm on the map MPCL1 when the process by the charged particle beam drawing apparatus 10 of the first embodiment is not performed.

  If the process by the charged particle beam drawing apparatus 10 of the first embodiment is not performed, then, as shown in FIGS. 13A and 13B, the data processing unit 10d2 (see FIG. 1) The position (pixel PX01) on the screen of the monitor 10d5 corresponding to the arrangement coordinates (xFGm, yFGm) and size (X-direction dimension wFGm and Y-direction dimension hFGm) of the element (graphic FGm) of the graphic hierarchy FG is calculated. . Further, as shown in FIGS. 13A and 13C, the data processing unit 10d2 (see FIG. 1) allows the arrangement coordinates (xFGm, yFGm) and the size (figure FGm) of the element (graphic FGm) of the graphic hierarchy FG. A position (section SC00) on the map MPCL1 corresponding to the X-direction dimension wFGm and the Y-direction dimension hFGm) is calculated.

  FIG. 14 is a diagram showing a screen of a monitor 10d5 on which a graphic FGm is displayed in a layout when processing by the charged particle beam drawing apparatus 10 of the first embodiment is not performed. Specifically, FIG. 14A shows a screen of the monitor 10d5 on which a graphic FGm (see FIG. 13B) is laid out when processing by the charged particle beam drawing apparatus 10 of the first embodiment is not performed. FIG. 14B shows the map MPCL1 after the graphic FGm (see FIG. 13C) is laid out when the process by the charged particle beam drawing apparatus 10 of the first embodiment is not performed. Indicates the state of the flag.

  When the process by the charged particle beam drawing apparatus 10 of the first embodiment is not performed, the layout display object generation unit 10d3 (see FIG. 1) then displays the elements of the graphic hierarchy FG (graphic FGm). Information such as color is added, and an object for layout display is generated. Next, as shown in FIG. 14A, the layout display unit 10d4 (see FIG. 1) causes the element (figure FGm) of the figure hierarchy FG (see FIG. 13B) to be the pixel PX01 on the screen of the monitor 10d5. The layout is displayed at the position. Further, as shown in FIGS. 13C and 14B, the flag of the block SC00 corresponding to the position of the element (graphic FGm) of the graphic hierarchy FG is “element of graphic hierarchy FG (graphic FGm + 1,... ) ”“ Layout display possible ”state“ 0 ”(see FIG. 12B) is switched to“ 1 ”which is“ non-displayable layout of graphic hierarchy FG elements (figure FGm + 1,...) ”.

  If the processing by the charged particle beam drawing apparatus 10 according to the first embodiment is not performed, the data reading unit 10d1 (see FIG. 1) then causes the elements of the graphic hierarchy FG in the charged particle beam drawing apparatus data D1 to be processed. (Figure FGm + 1) (see FIG. 12A) is read.

  FIG. 15 is a diagram showing the arrangement coordinates (xFGm + 1, yFGm + 1) and size (X-direction dimension wFGm + 1, Y-direction dimension hFGm + 1) of the figure FGm + 1. Specifically, FIG. 15A shows the arrangement coordinates (xFGm + 1, yFGm + 1) and the size (X-direction dimension wFGm + 1, Y-direction dimension hFGm + 1) of the figure FGm + 1, and FIG. 15B shows the screen on the monitor 10d5. FIG. 15C shows the position of the figure FGm + 1 on the map MPCL1.

  If processing by the charged particle beam drawing apparatus 10 of the first embodiment is not performed, then, as shown in FIGS. 15A and 15B, the data processing unit 10d2 (see FIG. 1). The position (pixel PX11) on the screen of the monitor 10d5 corresponding to the arrangement coordinates (xFGm + 1, yFGm + 1) and size (X-direction dimension wFGm + 1 and Y-direction dimension hFGm + 1) of the element (graphic FGm + 1) of the graphic hierarchy FG is calculated. . Further, as shown in FIGS. 15A and 15C, the data processing unit 10d2 (see FIG. 1) causes the arrangement coordinates (xFGm + 1, yFGm + 1) and size (figure FGm + 1) of the element (figure FGm + 1) of the figure hierarchy FG. The position (section SC00) on the map MPCL1 corresponding to the X direction dimension wFGm + 1 and the Y direction dimension hFGm + 1) is calculated.

  If the processing by the charged particle beam drawing apparatus 10 of the first embodiment is not performed, then the data processing unit 10d2 (see FIG. 1) uses the section corresponding to the position of the element (graphic FGm + 1) of the graphic hierarchy FG. It is determined whether or not the flag of SC00 is in the state “1” indicating that “the layout display of the elements of the graphic hierarchy FG (graphic FGm + 1,...) Cannot be displayed”. At this stage, as shown in FIG. 14B, the flag of the section SC00 corresponding to the position of the element (figure FGm + 1) of the figure hierarchy FG is “the layout display of the element (figure FGm + 1,... "1". Therefore, when the process by the charged particle beam drawing apparatus 10 of the first embodiment is not performed, the graphic hierarchy FG of the layout display object generation unit 10d3 (see FIG. 1) and the layout display unit 10d4 (see FIG. 1) is changed. Processing for displaying the element (figure FGm + 1) on the screen of the monitor 10d5 is not performed.

  That is, when the process by the charged particle beam drawing apparatus 10 of the first embodiment is not performed, as shown in FIG. 15B, the element of the graphic hierarchy FG (graphic FGm + 1) is displayed on the screen of the monitor 10d5. 14A, the pixel PX11 on the screen of the monitor 10d5 is maintained in a state where the pixel PX11 is not filled, as shown in FIG. 14A. That is, as shown in FIG. 14A, a layout display indicating that an element (graphic FGm + 1) (see FIG. 15B) of the graphic hierarchy FG does not exist at a position corresponding to the pixel PX11 on the screen of the monitor 10d5. Will be maintained.

  In order to avoid this situation, the charged particle beam drawing apparatus 10 of the first embodiment performs processing as described below.

  FIG. 16 shows the arrangement coordinates (xFGm, yFGm) and size (X-direction dimension wFGm, Y-direction dimension hFGm) and the like of the figure FGm when processing by the charged particle beam drawing apparatus 10 of the first embodiment is performed. FIG. Specifically, FIG. 16A shows the arrangement coordinates (xFGm, yFGm) and size (X direction dimension wFGm, Y direction) of the figure FGm when processing by the charged particle beam drawing apparatus 10 of the first embodiment is performed. FIG. 16B shows the positions of the figure FGm and the deemed figure FGm ′ on the screen of the monitor 10d5 when processing by the charged particle beam drawing apparatus 10 of the first embodiment is performed. FIG. 16C shows the positions of the graphic FGm and the deemed graphic FGm ′ on the map MPCL1 when processing by the charged particle beam drawing apparatus 10 of the first embodiment is performed.

  When processing by the charged particle beam drawing apparatus 10 of the first embodiment is performed, then, as shown in FIGS. 16A and 16B, the data processing unit 10d2 (see FIG. 1) The position (pixel PX01) on the screen of the monitor 10d5 corresponding to the arrangement coordinates (xFGm, yFGm) and size (X-direction dimension wFGm and Y-direction dimension hFGm) of the element (graphic FGm) of the graphic hierarchy FG is calculated. Also, as shown in FIGS. 16A and 16C, the data processing unit 10d2 (see FIG. 1) causes the arrangement coordinates (xFGm, yFGm) and size (figure FGm) of the elements (figure FGm) of the figure hierarchy FG (see FIG. 1). A position (section SC00) on the map MPCL1 corresponding to the X-direction dimension wFGm and the Y-direction dimension hFGm) is calculated.

  When the process by the charged particle beam drawing apparatus 10 of the first embodiment is performed, as shown in FIGS. 16B and 16C, the data processing unit 10d2 (see FIG. 1) For example, a “deemed figure FGm ′” corresponding to the size of the section SC00 on the map MPCL1 where the element of the figure hierarchy FG (figure FGm) is located is created.

  FIG. 17 is a diagram illustrating a screen of the monitor 10d5 on which an assumed figure FGm ′ is displayed in a layout when processing by the charged particle beam drawing apparatus 10 of the first embodiment is performed. Specifically, FIG. 17A shows a screen of the monitor 10d5 on which an assumed figure FGm ′ (see FIG. 16B) is displayed in a layout when processing by the charged particle beam drawing apparatus 10 of the first embodiment is performed. FIG. 17B shows the state of the flag of the map MPCL1 after the layout of the deemed figure FGm ′ (see FIG. 16C).

  When the processing by the charged particle beam drawing apparatus 10 of the first embodiment is performed, the layout display object generation unit 10d3 (see FIG. 1) then causes the elements of the graphic hierarchy FG (deemed graphic FGm ′) (FIG. 16). Information such as a color for displaying the layout is added, and an object for layout display is generated. Next, as shown in FIG. 17A, the layout display unit 10d4 (see FIG. 1) causes the elements of the figure hierarchy FG (deemed figure FGm ′) (see FIG. 16B) to be pixels on the screen of the monitor 10d5. A layout is displayed at positions PX00, PX10, PX20, PX01, PX11, PX21, PX02, PX12, and PX22 (see FIG. 16B). Specifically, for example, all the pixels PX00, PX10, PX20, PX01, PX11, PX21, PX02, PX12, and PX22 (see FIG. 16B) on the screen of the monitor 10d5 including the deemed figure FGm ′ are filled. It is.

  Further, when processing by the charged particle beam drawing apparatus 10 of the first embodiment is performed, as shown in FIGS. 16C and 17B, elements of the graphic hierarchy FG (deemed graphic FGm ′). The flag of the block SC00 corresponding to the position of “from the state“ 0 ”(see FIG. 12B) of“ the layout display of the elements of the figure hierarchy FG (figure FGm + 1,...) ”Is possible. The state is switched to the state “1” of “non-displayable layout of figure FGm + 1,.

  Therefore, according to the charged particle beam drawing apparatus 10 of the first embodiment, as in the case where the process by the charged particle beam drawing apparatus 10 of the first embodiment is not performed, the elements of the graphic hierarchy FG (graphic FGm + 1) The pixel PX11 (see FIG. 14A) on the screen of the monitor 10d5 is filled in even though the pixel (see FIG. 12A) exists at a position corresponding to the pixel PX11 on the screen of the monitor 10d5. It is possible to avoid a situation in which it is maintained in a state where there is no.

  In other words, according to the charged particle beam drawing apparatus 10 of the first embodiment, pixels on the screen of the monitor 10d5 are used as in the case where the process by the charged particle beam drawing apparatus 10 of the first embodiment is not performed. A layout display (see FIG. 14A) indicating that there is no graphic hierarchy FG element (figure FGm + 1) (see FIG. 12A) at the position corresponding to PX11 (see FIG. 14A) is maintained. Can be avoided.

  In the charged particle beam drawing apparatus 10 according to the first embodiment, an assumed figure FGm ′ is created as shown in FIGS. 16B and 16C, and an assumed figure is shown as shown in FIG. 17A. FGm ′ is laid out and displayed on the screen of the monitor 10d5, but the layout display result in which the pixel PX11 on the screen of the monitor 10d5 is filled as in the charged particle beam drawing apparatus 10 of the first embodiment (see FIG. 17A). And the layout display result in which the pixel PX11 on the screen of the monitor 10d5 is not filled (see FIG. 14A) are substantially the same (specifically, for example, it looks the same), the deemed figure FGm It is also possible to omit the process of creating 'and the process of displaying the assumed figure FGm' on the screen of the monitor 10d5.

  That is, in the charged particle beam drawing apparatus 10 of the first embodiment, the assumed figure FGm ′ is created and the assumed figure FGm ′ is laid out and displayed on the screen of the monitor 10d5. The charged particle beam drawing of the fourth embodiment In the apparatus 10, it is also possible to omit the process of creating the deemed figure FGm ′ and the process of displaying the deemed figure FGm ′ on the screen of the monitor 10d5 instead.

  FIG. 18 is a diagram for explaining the effect of the charged particle beam drawing apparatus 10 of the first embodiment. Specifically, the horizontal axis in FIG. 18 indicates the magnification (Zoom No) of the screen layout display of the monitor 10d5, and the vertical axis in FIG. 18 indicates the screen of the monitor 10d5 among the charged particle beam drawing apparatus data D1. The time (View Time) required for the element positioned at the position to be read and displayed in the layout is shown. In FIG. 18, “VT1” indicates the View Time of the charged particle beam drawing apparatus 10 of the first embodiment, and “VT2” indicates that all elements of the graphic hierarchy FG located on the screen of the monitor 10d5 are displayed. The View Time of the conventional charged particle beam drawing apparatus which is read and displayed in the layout is shown.

  In the example shown in FIG. 18, when the magnification (Zoom No) of the screen layout display of the monitor 10d5 is 1 to 11 times, the X-direction dimensions (widths) of all the cells CL1, CL2,. (Dimensions) wCL1, wCL2,... (See FIG. 3A) is smaller than the X-direction dimension (width dimension) of five pixels of the monitor 10d5, and the Y-direction dimensions of all the cells CL1, CL2,. hCL1, hCL2,... (see FIG. 3A) is smaller than the Y-direction dimension (width dimension) of five pixels of the monitor 10d5. Therefore, in the charged particle beam drawing apparatus 10 of the first embodiment and the conventional charged particle beam drawing apparatus, the elements (graphics FG1, FG2,...) (Figure FG1, FG2,...) (FIG. 5) located on the screen of the monitor 10d5. 3 (see (A)) and the layout display are not performed (specifically, the cells CL1, CL2,... Are painted out on the screen of the monitor 10d5). As a result, the View Time “VT1” of the charged particle beam drawing apparatus 10 of the first embodiment and the View Time “VT2” of the conventional charged particle beam drawing apparatus are both small values.

  Further, in the example shown in FIG. 18, when the magnification (Zoom No) of the screen layout display of the monitor 10d5 is enlarged to 13 times, almost all the cells CL1, CL2,. The dimension (width dimension) wCL1, wCL2,... (See FIG. 3A) is equal to or larger than the X-direction dimension (width dimension) of five pixels of the monitor 10d5, or almost all the cells CL1, CL2. The Y-direction dimensions hCL1, hCL2,... (See FIG. 3A) are larger than the Y-direction dimensions (width dimensions) of five pixels of the monitor 10d5.

  As a result, in the conventional charged particle beam drawing apparatus, all elements (graphics FG1, FG2,...) (See FIG. 3A) located on the screen of the monitor 10d5 are read. The process of laying out a plurality of elements (figure FG1, FG2) (see FIG. 3A) of the figure hierarchy FG at the same position (pixel PX22) (see FIG. 3A) on the screen of the monitor 10d5 is duplicated. Done. Therefore, the View Time “VT2” of the conventional charged particle beam drawing apparatus becomes a very large value.

  On the other hand, in the charged particle beam drawing apparatus 10 of the first embodiment, maps MPCL1,... Are created as shown in FIG. 3B, and, for example, as shown in FIGS. A process of laying out and displaying a plurality of elements (figure FG1, FG2) at the same position (pixel PX22) (see FIG. 3A) on the screen of the monitor 10d5 is not repeated. In the charged particle beam drawing apparatus 10 of the first embodiment, all the elements (graphics FG1, FG2,...) (See FIG. 3A) located on the screen of the monitor 10d5 are read. Instead, as shown in FIG. 11 (B), the statuses of the flags SC00 and SC10 are in the state “1” indicating that the layout of the graphic hierarchy FG element (graphic FGn + 1,... Cannot be displayed). When the ratio of SC35, SC45 reaches, for example, 100%, reading of the elements of the graphic hierarchy FG (graphic FGn + 1,...) (See FIG. 11C) is completed. Therefore, the View Time “VT1” of the charged particle beam lithography apparatus 10 of the first embodiment is suppressed to a very small value as compared to the View Time “VT2” of the conventional charged particle beam lithography apparatus (FIG. (See arrow ↓ in 18).

  In the charged particle beam drawing apparatus 10 of the first embodiment, when the magnification (Zoom No) (see FIG. 18) of the screen layout display of the monitor 10d5 is 12 to 38 times, the map MPCL1,. B) process), a plurality of elements (graphics FG1, FG2,...) Of the graphic hierarchy FG are displayed in a layout overlappingly at the same position (pixel PX22,...) On the screen of the monitor 10d5. (See FIG. 4 to FIG. 6), and processing (see FIG. 10 and FIG. 11) for completing reading of the elements (figure FGn + 1,...) Of the figure hierarchy FG are performed. In the charged particle beam drawing apparatus 10 of the embodiment, instead, for example, the X-direction dimension (width dimension) of the figures FG1, FG2,... On the screen of the monitor 10d5 is the pitch of the monitor 10d5. When the magnification (Zoom No) (see FIG. 18) of the screen layout display of the monitor 10d5 is enlarged to a degree larger than the X-direction dimension (width dimension) of one cell (for example, the layout of FIG. 18). It is also possible not to perform these processes when the display magnification (Zoom No) is higher than 23 times.

  Further, in the charged particle beam drawing apparatus 10 of the first embodiment, when the map MPCL1,... (See FIG. 3B) is created, the magnification (Zoom No) of the screen layout display of the monitor 10d5 (FIG. 18) is 12 times to 38 times, for example, the map MPCL1 is divided into 5 parts in the X direction and 6 parts in the Y direction, and 30 partitions SC00, SC10,..., SC35, SC45 are created. However, in the charged particle beam drawing apparatus 10 of the sixth embodiment, instead, for example, the magnification (Zoom No) of the screen layout display of the monitor 10d5 (see FIG. 18) is used. When the display is low (for example, when the layout display magnification (Zoom No) in FIG. 18 is 12 to 18 times), the screen layout display magnification (Zoom No) of the monitor 10d5 is low. It is included in the map MPCL1,... (See FIG. 3B) than when it is high (for example, when the layout display magnification (Zoom No) in FIG. 18 is 19 to 23 times). It is also possible to reduce the number of partitions SC00,.

  Specifically, in the charged particle beam drawing apparatus 10 according to the sixth embodiment, the map MPCL1,... (FIG. 3B) according to the magnification (Zoom No) (see FIG. 18) of the screen layout display of the monitor 10d5. It is also possible to change the number of partitions SC00,. According to the charged particle beam drawing apparatus 10 of the sixth embodiment, when the magnification (Zoom No) (see FIG. 18) of the screen layout display of the monitor 10d5 is low (for example, the magnification (Zoom No) of the layout display in FIG. 18). ) Is 12 times to 18 times), the number of elements (figure FG1, FG2,...) (See FIG. 3A) read and displayed in layout can be reduced. Thereby, View Time (refer FIG. 18) can be suppressed to a small value.

  Furthermore, in the charged particle beam drawing apparatus 10 of the first embodiment, when the map MPCL1,... (See FIG. 3B) is created, the magnification (Zoom No) of the screen layout display of the monitor 10d5 is 12. At all times of times to 38 times (see FIG. 18), for example, the map MPCL1 is divided into 5 parts in the X direction and 6 parts in the Y direction, and 30 partitions SC00, SC10,..., SC35, SC45 are created. However, in the charged particle beam drawing apparatus 10 of the seventh embodiment, instead, for example, when the magnification (Zoom No) of the screen display of the monitor 10d5 is 12 to 38 times (see FIG. 18). The screen of the monitor 10d5 when the number (data amount) of the elements (graphics FG1, FG2,...) (See FIG. 3 (A)) on the screen of the monitor 10d5 is large. The map MPCL1,... (Refer to FIG. 3 (B)) than when the number (data amount) of the elements (graphics FG1, FG2,...) (Refer to FIG. 3 (A)) of the upper graphic hierarchy FG is small. It is also possible to reduce the number of included partitions SC00,.

  Specifically, in the charged particle beam drawing apparatus 10 of the seventh embodiment, the number (data) of the elements (graphics FG1, FG2,...) (See FIG. 3A) on the graphic layer FG on the screen of the monitor 10d5. The number of partitions SC00,... Included in the map MPCL1,... (See FIG. 3B) can be changed according to the amount. According to the charged particle beam drawing apparatus 10 of the seventh embodiment, the number (data amount) of elements (graphics FG1, FG2,...) (See FIG. 3A) of the graphic hierarchy FG on the screen of the monitor 10d5. When there are many, the number of elements (figure FG1, FG2,...) (See FIG. 3A) of the figure hierarchy FG displayed in the layout can be reduced, and the view time (see FIG. 18) can be reduced. It can be suppressed to a small value.

  In the charged particle beam drawing apparatus 10 of the first embodiment, a cell map is used to display the charged particle beam drawing apparatus data D1 having a large number of elements (FG1, FG2,...) In the figure hierarchy FG at high speed. CLMP1 (see FIG. 3B) is created, and a part of the reading process of the elements (FG1, FG2,...) Of the graphic hierarchy FG and the elements (FG1, FG2,...) Of the graphic hierarchy FG are laid out. Although a part of the processing for displaying is omitted, in the charged particle beam drawing apparatus 10 of the eighth embodiment, instead, charging with a large number of elements (CL1, CL2,...) Of the cell hierarchy CL is performed. In order to display and display the particle beam drawing apparatus data D1 at high speed, a block map (not shown) is created, and a part of the reading process of the elements (CL1, CL2,...) Of the cell hierarchy CL, Preliminary / or, it is also possible to omit part of the processing for layout display cell hierarchy CL elements (CL1, CL2, · ·) and.

  In the charged particle beam drawing apparatus 10 of the ninth embodiment, instead, the charged particle beam drawing apparatus data D1 having a large number of elements (BL00, BL10,...) In the block hierarchy BL is displayed in a layout manner at high speed. Therefore, a frame map (not shown) is created and a part of the reading process of the elements (BL00, BL10,...) Of the block hierarchy BL and / or the elements (BL00, BL10,. ) May be partially omitted.

  Alternatively, in the charged particle beam drawing apparatus 10 of the tenth embodiment, instead, the charged particle beam drawing apparatus data D1 having a large number of elements (FR1, FR2,...) In the frame hierarchy FR is laid out and displayed at high speed. Therefore, a chip map (not shown) is created and a part of the reading process of the elements (FR1, FR2,...) Of the frame hierarchy FR and / or the elements (FR1, FR2,. ) May be partially omitted.

  On the other hand, for example, the charged particle beam drawing apparatus data D1 having a large number of elements (FG1, FG2,...) In the graphic hierarchy FG and a large number of elements (CL1, CL2,. In some cases, it is necessary to display the layout at high speed. In view of this point, in the charged particle beam drawing apparatus 10 of the eleventh embodiment, a cell map CLMP1 (see FIG. 3B) is created in the same manner as the charged particle beam drawing apparatus 10 of the first embodiment. A part of the reading process of the elements (FG1, FG2,...) Of the graphic hierarchy FG and a part of the process for layout display of the elements (FG1, FG2,...) Of the graphic hierarchy FG are omitted. As will be described later, a block map BLMP21 (see FIG. 19A) is created, and a part of the process for displaying the layout of the elements (CL1, CL2,...) Of the cell hierarchy CL and / or the cell A part of the reading process of the elements (CL1, CL2,...) Of the hierarchy CL is omitted.

  FIG. 19 is a diagram showing the relationship between the screen of the monitor 10d5 of the charged particle beam drawing apparatus 10 of the eleventh embodiment and the block BL21. Specifically, FIG. 19A shows the relationship between the screen of the monitor 10d5 (see FIG. 1) and the block BL21 (see FIG. 2) when the layout display magnification is set to a predetermined value. 19 (B) shows a map MPBL21 created corresponding to the block BL21 shown in FIG. 19 (A).

  In the charged particle beam drawing apparatus 10 according to the eleventh embodiment, when the charged particle beam drawing apparatus data D1 is layout-displayed (viewer processing) on the screen of the monitor 10d5 of the layout display unit 10d, FIG. As shown, the X-direction dimension (width dimension) wBL21 of the block BL21 on the screen of the monitor 10d5 is smaller than the X-direction dimension (width dimension) of, for example, five pixels of the monitor 10d5, and the Y-direction dimension hBL21 of the block BL21 is When the monitor 10d5 is smaller than the Y-direction dimension (width dimension) of, for example, five pixels (that is, when the magnification of the layout display is not enlarged), the element of the cell hierarchy CL (cell CL1) corresponding to the block BL21 , CL2,...) Are not read and the layout is not displayed on the screen of the monitor 10d5.

  That is, in the charged particle beam drawing apparatus 10 of the eleventh embodiment, the layout display magnification is such that the elements (cells CL1, CL2,...) Of the cell hierarchy CL in the charged particle beam drawing apparatus data D1 are not read. Is low (that is, when the layout display magnification is lower than in FIG. 19A) and the layout display of the elements of the chip hierarchy CP (chips CP1,...) Is selected, Similar to the charged particle beam drawing apparatus 10 of the first embodiment, for example, the outlines of the elements of the chip hierarchy CP (chips CP1,...) Are laid out and displayed on the screen of the monitor 10d5.

  In the charged particle beam drawing apparatus 10 of the eleventh embodiment, the magnification of the layout display is such that the elements (cells CL1, CL2,...) Of the cell hierarchy CL in the charged particle beam drawing apparatus data D1 are not read. Is low (that is, when the layout display magnification is lower than that in FIG. 19A) and the layout display of the elements of the frame hierarchy FR (frames FR1, FR2,...) Is selected. As in the charged particle beam drawing apparatus 10 of the first embodiment, for example, the outlines of the elements of the frame hierarchy FR (frames FR1, FR2,...) Are laid out and displayed on the screen of the monitor 10d5.

  Further, in the charged particle beam drawing apparatus 10 of the eleventh embodiment, the layout display magnification is such that the elements (cells CL1, CL2,...) Of the cell hierarchy CL in the charged particle beam drawing apparatus data D1 are not read. Is low (that is, when the layout display magnification is lower than that in FIG. 19A) and the layout display of the elements of the block hierarchy BL (blocks BL00, BL10,...) Is selected. Similarly to the charged particle beam drawing apparatus 10 of the first embodiment, for example, the outlines of the elements of the block hierarchy BL (blocks BL00, BL10,...) Are laid out and displayed on the screen of the monitor 10d5.

  In the charged particle beam drawing apparatus 10 of the eleventh embodiment, as shown in FIG. 19A, the X-direction dimension (width dimension) wBL21 of the block BL21 on the screen of the monitor 10d5 is, for example, a pixel of the monitor 10d5. The layout display magnification is increased until the X-direction dimension (width dimension) of five pieces or more, or the Y-direction dimension hBL21 of the block BL21 becomes more than the Y-direction dimension of, for example, five pixels of the monitor 10d5. Then, reading of the elements (cells CL1, CL2,...) Of the cell hierarchy CL corresponding to the block BL21 is started.

  Specifically, in the charged particle beam drawing apparatus 10 of the eleventh embodiment, for example, as shown in FIG. 19A, elements of the cell hierarchy CL (cells CL1, CL2,...) Corresponding to the block BL21. When the magnification of the layout display is expanded until the reading of the data is started, before the elements (cells CL1, CL2,...) Of the cell hierarchy CL corresponding to the block BL21 are read, as shown in FIG. First, a plurality of partitions SC00, SC10, SC20, SC30, SC40, SC01, SC11, SC21, SC31, SC41, SC02, SC12, SC22, SC32, SC42, SC03, SC13, arranged in a substantially grid pattern. SC23, SC33, SC43, SC04, SC14, SC24, SC34, SC44, SC05, SC15 SC25, SC35, SC45 map MPBL21 having a flag ( "0" or "1") is created.

  Specifically, in the charged particle beam drawing apparatus 10 of the eleventh embodiment, as shown in FIGS. 19A and 19B, a map MPBL21 is created corresponding to the block BL21. Further, by dividing the map MPBL21 into a plurality of pieces in the X direction, for example, and dividing the map MPBL21 into a plurality of pieces in the Y direction, for example, a plurality of partitions SC00, SC10,..., SC35, SC45 are created.

  Next, in the charged particle beam drawing apparatus 10 of the eleventh embodiment, as shown in FIG. 19B, the flags of the sections SC00, SC10,..., SC35, SC45 are initialized. That is, the flags of the sections SC00, SC10,..., SC35, SC45 are set to the state “0” of “the layout display of the elements of the cell hierarchy CL (cells CL1, CL2,...)”.

  Next, in the charged particle beam drawing apparatus 10 of the eleventh embodiment, the data reading unit 10d1 (see FIG. 1) causes the element (cell CL1) of the cell hierarchy CL in the charged particle beam drawing apparatus data D1 (cell CL1) (see FIG. 2 and FIG. 2). 19A) is read.

  FIG. 20 is a diagram showing the arrangement coordinates (xCL1, yCL1) and size (X-direction dimension wCL1, Y-direction dimension hCL1) of the cell CL1. Specifically, FIG. 20A shows the arrangement coordinates (xCL1, yCL1) and size (X-direction dimension wCL1, Y-direction dimension hCL1) of the cell CL1, and FIG. 20B shows the screen on the monitor 10d5. 20C shows the position of the cell CL1, and FIG. 20C shows the position of the cell CL1 on the map MPBL21.

  Next, in the charged particle beam drawing apparatus 10 according to the eleventh embodiment, as shown in FIGS. 20A and 20B, the data processing unit 10d2 (see FIG. 1) uses the elements (cells) of the cell hierarchy CL. The positions (pixels PX11, PX21, PX12, PX22) of the monitor 10d5 corresponding to the arrangement coordinates (xCL1, yCL1) and the size (X-direction dimension wCL1 and Y-direction dimension hCL1) of CL1) are calculated. 20A and 20C, the data processing unit 10d2 (see FIG. 1) allows the arrangement coordinates (xCL1, yCL1) and size (xCL1, yCL1) of the element (cell CL1) of the cell hierarchy CL. The positions (sections SC11, SC21, SC12, SC22) on the map MPBL21 corresponding to the X direction dimension wCL1 and the Y direction dimension hCL1) are calculated.

  FIG. 21 is a diagram showing a screen of the monitor 10d5 in a state where the cell CL1 is displayed in a layout manner. Specifically, FIG. 21A shows a screen of the monitor 10d5 in a state where the cell CL1 (see FIG. 20B) is laid out, and FIG. 21B shows the cell CL1 (FIG. 20C). Reference) shows the state of the flag of the map MPBL21 after the layout display.

  Next, in the charged particle beam drawing apparatus 10 of the eleventh embodiment, the layout display object generation unit 10d3 (see FIG. 1) adds information such as a color for displaying the elements of the cell hierarchy CL (cell CL1) in layout, An object for layout display is generated. Next, as shown in FIG. 21A, the layout display unit 10d4 (see FIG. 1) causes the element (cell CL1) (see FIG. 20B) of the cell hierarchy CL to be the pixel PX11, The layout is displayed at the positions of PX21, PX12, and PX22. Further, as shown in FIGS. 20C and 21B, the flags of the partitions SC11, SC21, SC12, and SC22 corresponding to the position of the element (cell CL1) of the cell hierarchy CL are “elements of the cell hierarchy CL”. The state “0” (see FIG. 19B) of “cell CL2,... Layout display is possible” is changed to the state “1” of “cell hierarchy CL element (cell CL2,. Can be switched.

  Next, in the charged particle beam drawing apparatus 10 according to the eleventh embodiment, an element (cell CL2) of the cell hierarchy CL in the charged particle beam drawing apparatus data D1 (cell CL2) (see FIG. 2 and FIG. 2) by the data reading unit 10d1 (see FIG. 1). 19A) is read.

  FIG. 22 is a diagram showing the arrangement coordinates (xCL2, yCL2) and size (X-direction dimension wCL2, Y-direction dimension hCL2) of the cell CL2. Specifically, FIG. 22A shows the arrangement coordinates (xCL2, yCL2) and the size (X-direction dimension wCL2, Y-direction dimension hCL2) of the cell CL2, and FIG. 22B shows the monitor 10d5 on the screen. 22C shows the position of the cell CL2, and FIG. 22C shows the position of the cell CL2 on the map MPBL21.

  Next, in the charged particle beam drawing apparatus 10 according to the eleventh embodiment, as shown in FIGS. 22A and 22B, the data processing unit 10d2 (see FIG. 1) uses the elements (cells) of the cell hierarchy CL. The position (pixel PX21) on the screen of the monitor 10d5 corresponding to the arrangement coordinates (xCL2, yCL2) and the size (X direction dimension wCL2 and Y direction dimension hCL2) of CL2) is calculated. Also, as shown in FIGS. 22A and 22C, the data processing unit 10d2 (see FIG. 1) uses the arrangement coordinates (xCL2, yCL2) and size (xCL2, yCL2) of the element (cell CL2) of the cell hierarchy CL. The position (section SC21) on the map MPBL21 corresponding to the X-direction dimension wCL2 and the Y-direction dimension hCL2) is calculated.

  Next, in the charged particle beam drawing apparatus 10 of the eleventh embodiment, the data processing unit 10d2 (see FIG. 1) sets the flag of the partition SC21 corresponding to the position of the element (cell CL2) of the cell hierarchy CL to “cell hierarchy CL It is determined whether or not the element “cell CL2,... At this stage, as shown in FIG. 21B, the flag of the partition SC21 corresponding to the position of the element (cell CL2) of the cell hierarchy CL is “the layout display of the elements (cell CL2,...) Of the cell hierarchy CL is not possible. In the charged particle beam drawing apparatus 10 of the eleventh embodiment, the cell hierarchy by the layout display object generation unit 10d3 (see FIG. 1) and the layout display unit 10d4 (see FIG. 1). Processing for displaying the CL element (cell CL2) on the screen of the monitor 10d5 is not performed.

  Specifically, if the element of the cell hierarchy CL (cell CL1) is laid out on the monitor 10d5 screen and the element of the cell hierarchy CL (cell CL2) is laid out on the monitor 10d5 screen, Like the charged particle beam drawing apparatus 10 of the eleventh embodiment, the elements of the cell hierarchy CL (cell CL1) are laid out on the screen of the monitor 10d5, and the elements of the cell hierarchy CL (cell CL2) are displayed on the screen of the monitor 10d5. When the layout is not displayed, the layout display result is the same (that is, the pixels PX11, PX21, PX12, and PX22 are filled) (see FIG. 21A).

  In view of this point, in the charged particle beam drawing apparatus 10 of the eleventh embodiment, the layout display result when the element of the cell hierarchy CL (cell CL2) is laid out on the screen of the monitor 10d5, and the element of the cell hierarchy CL ( When the layout display result when the cell CL2) is not displayed on the screen of the monitor 10d5 is the same, the layout display object generation unit 10d3 (see FIG. 1) and the layout display unit 10d4 (see FIG. 1) Processing for displaying the element (cell CL2) on the screen of the monitor 10d5 is omitted.

  Therefore, according to the charged particle beam drawing apparatus 10 of the eleventh embodiment, the elements (cell CL2) of the cell hierarchy CL are changed by the layout display object generation unit 10d3 (see FIG. 1) and the layout display unit 10d4 (see FIG. 1). The layout display of the hierarchized charged particle beam drawing apparatus data D1 can be performed at a higher speed than when the process for displaying the layout on the screen of the monitor 10d5 is performed.

  In other words, according to the charged particle beam drawing apparatus 10 of the eleventh embodiment, the layout display object generation unit 10d3 (see FIG. 1) and the layout display unit 10d4 (see FIG. 1) for all elements of the cell hierarchy CL. The layout display of the hierarchized charged particle beam drawing apparatus data D1 can be performed at a higher speed than when the process for displaying the layout on the screen of the monitor 10d5 is performed.

  FIG. 23 is a diagram for explaining the effect of the charged particle beam drawing apparatus 10 of the eleventh embodiment. Specifically, the horizontal axis of FIG. 23 indicates the screen layout display magnification (Zoom No) of the monitor 10d5, and the vertical axis of FIG. 23 indicates the charged particle beam drawing apparatus data D1 on the monitor 10d5 screen. The time (View Time) required for the element positioned at the position to be read and displayed in the layout is shown. In FIG. 23, “VT11” indicates the View Time of the charged particle beam drawing apparatus 10 of the eleventh embodiment, and “VT12” indicates that all elements of the cell hierarchy CL located on the screen of the monitor 10d5 are displayed. The View Time of the conventional charged particle beam drawing apparatus which is read and displayed in the layout is shown.

  In the example shown in FIG. 23, when the magnification (Zoom No) of the screen layout display of the monitor 10d5 is higher than, for example, 1 time, almost all the blocks BL00,..., BL21,. The dimension (width dimension) wBL00,..., WBL21 (see FIG. 19A),... Is equal to or larger than the X-direction dimension (width dimension) of five pixels of the monitor 10d5, or almost all blocks. BL00,..., BL21,... Y-direction dimension (width dimension) hBL00,..., HBL21 (see FIG. 19A),. ) Or more.

  As a result, also in the charged particle beam drawing apparatus 10 of the eleventh embodiment, as in the conventional charged particle beam drawing apparatus, a number of elements (cells CL1, CL2, CL2) located on the screen of the monitor 10d5 ..) (see FIG. 19A) is read.

  On the other hand, in the charged particle beam drawing apparatus 10 of the eleventh embodiment, maps MPBL21,... Are created as shown in FIG. 19B, and, for example, as shown in FIGS. A process of laying out a plurality of elements (cells CL1, CL2) at the same position (pixels PX11, PX21, PX12, PX22) (see FIG. 19A) on the screen of the monitor 10d5 is not performed. Therefore, when the magnification (Zoom No) of the screen layout display of the monitor 10d5 is 1 to 6 times, for example, the View Time “VT11” of the charged particle beam drawing apparatus 10 of the eleventh embodiment is a conventional charged particle beam. Compared to the view time “VT12” of the drawing apparatus, the value is suppressed to a small value.

  In the charged particle beam drawing apparatus 10 of the eleventh embodiment, even when the magnification (Zoom No) (see FIG. 23) of the screen layout display of the monitor 10d5 is 7 to 11 times, for example, the map MPBL21,. 19 (B)), a plurality of elements (cells CL1, CL2,...) Of the cell hierarchy CL are at the same position (pixels PX11, PX21, PX12, PX22,...) On the screen of the monitor 10d5. Processing to avoid overlapping layout display (see FIGS. 20 to 22) and the like are performed. However, in the charged particle beam drawing apparatus 10 of the twelfth embodiment, the layout display of the screen of the monitor 10d5 is used instead. When the magnification (Zoom No) (see FIG. 23) is 7 times to 11 times, for example, it is possible not to perform these processes.

  That is, in the charged particle beam drawing apparatus 10 of the twelfth embodiment, when the magnification (Zoom No) (see FIG. 23) of the screen layout display of the monitor 10d5 is 1 to 6 times, for example, the map MPBL21 (FIG. 19 ( A))),... Is performed. Further, when the magnification (Zoom No) (see FIG. 23) of the screen layout display of the monitor 10d5 is 7 to 11 times, for example, conventional charged particles that do not use the map MPBL21 (see FIG. 19A),. Processing similar to that performed by the beam drawing apparatus is performed. Further, when the magnification (Zoom No) (see FIG. 23) of the screen layout display of the monitor 10d5 is higher than 12 times, for example, the map MPCL1 (see FIG. 3A),. Processing similar to that of the charged particle beam drawing apparatus 10 is performed.

  The charged particle beam drawing apparatus 10 of the first embodiment is configured such that the map flag has two types of states (“0” and “1”) (FIGS. 3B and 5B). However, the charged particle beam drawing apparatus 10 of the thirteenth embodiment is configured such that the map flag has three or more states (“0”, “1”, “2”,...). Yes.

  FIG. 24 is a diagram showing the relationship between the screen of the monitor 10d5 of the charged particle beam drawing apparatus 10 of the thirteenth embodiment and the cell CL1 shown in FIG. Specifically, FIG. 24A shows the relationship between the screen of the monitor 10d5 and the cell CL1 when the layout display magnification is set to a predetermined value, and FIG. 24B shows the relationship between FIG. The map MPCL1 created corresponding to the cell CL1 shown in FIG.

  In the charged particle beam drawing apparatus 10 according to the thirteenth embodiment, when the charged particle beam drawing apparatus data D1 is layout-displayed (viewer processing) on the screen of the monitor 10d5 of the layout display unit 10d, FIG. As shown, the X-direction dimension (width dimension) wCL1 of the cell CL1 on the screen of the monitor 10d5 is smaller than the X-direction dimension (width dimension) of, for example, five pixels of the monitor 10d5, and the Y-direction dimension hCL1 of the cell CL1 is When the monitor 10d5 is smaller than the Y-direction dimension (width dimension) of, for example, five pixels (that is, when the magnification of the layout display is not enlarged), the element (graphic FG11) of the graphic hierarchy FG corresponding to the cell CL1. , FG12, FG21, FG22,...) Are not read and the layout is not displayed on the screen of the monitor 10d5.

  That is, in the charged particle beam drawing apparatus 10 of the thirteenth embodiment, the elements of the figure hierarchy FG (figure FG11, FG12, FG21, FG22,...) In the charged particle beam drawing apparatus data D1 are not read. When the layout display magnification is low (that is, when the layout display magnification is lower than that in FIG. 24A) and the layout display of the elements of the chip hierarchy CP (chips CP1,...) Is selected. In the same manner as in the charged particle beam drawing apparatus 10 of the first embodiment, for example, the outlines of the elements of the chip hierarchy CP (chips CP1,...) Are laid out and displayed on the screen of the monitor 10d5.

  In the charged particle beam drawing apparatus 10 of the thirteenth embodiment, the elements of the figure hierarchy FG (figure FG11, FG12, FG21, FG22,...) In the charged particle beam drawing apparatus data D1 are not read. When the layout display magnification is low (that is, when the layout display magnification is lower than that in FIG. 24A), the layout display of the elements of the frame hierarchy FR (frames FR1, FR2,...) Is selected. If, for example, the outline of the elements (frames FR1, FR2,...) Of the frame hierarchy FR is laid out and displayed on the screen of the monitor 10d5, as in the charged particle beam drawing apparatus 10 of the first embodiment.

  Further, in the charged particle beam drawing apparatus 10 of the thirteenth embodiment, the elements of the figure hierarchy FG (figure FG11, FG12, FG21, FG22,...) In the charged particle beam drawing apparatus data D1 are not read. When the layout display magnification is low (that is, when the layout display magnification is lower than that in FIG. 24A), the layout display of the elements of the block hierarchy BL (blocks BL00, BL10,...) Is selected. In the same manner as in the charged particle beam drawing apparatus 10 of the first embodiment, for example, the outlines of the elements of the block hierarchy BL (blocks BL00, BL10,...) Are displayed on the screen of the monitor 10d5.

  In the charged particle beam drawing apparatus 10 of the thirteenth embodiment, the elements of the figure hierarchy FG (figure FG11, FG12, FG21, FG22,...) In the charged particle beam drawing apparatus data D1 are not read. When the layout display magnification is low (that is, when the layout display magnification is lower than that in FIG. 24A), the layout display of the elements (cells CL1, CL2,...) Of the cell hierarchy CL is selected. In the same manner as in the charged particle beam drawing apparatus 10 of the first embodiment, for example, the outlines of the elements (cells CL1, CL2,...) Of the cell hierarchy CL are laid out and displayed on the screen of the monitor 10d5.

  Furthermore, in the charged particle beam drawing apparatus 10 of the thirteenth embodiment, as shown in FIG. 24A, the X-direction dimension (width dimension) wCL1 of the cell CL1 on the screen of the monitor 10d5 is, for example, a pixel of the monitor 10d5. The layout display magnification is increased until the X-direction dimension (width dimension) of 5 pieces or more, or the Y-direction dimension hCL1 of the cell CL1 is over the Y-direction dimension of, for example, 5 pixels of the monitor 10d5. Then, reading of the elements of the graphic hierarchy FG (graphics FG11, FG12, FG21, FG22,...) Corresponding to the cell CL1 is started.

  Specifically, in the charged particle beam drawing apparatus 10 according to the thirteenth embodiment, for example, as shown in FIG. 24A, the elements of the graphic hierarchy FG corresponding to the cell CL1 (graphics FG11, FG12, FG21, FG22). When the layout display magnification is increased until reading of the graphic hierarchy FG is started, before the elements of the graphic hierarchy FG (graphics FG11, FG12, FG21, FG22,...) Corresponding to the cell CL1 are read. As shown in FIG. 24 (B), first, a plurality of partitions SC00, SC10, SC20, SC30, SC40, SC01, SC11, SC21, SC31, SC41, SC02, SC12, SC22, arranged roughly in a grid pattern. SC32, SC42, SC03, SC13, SC23, SC33, SC43, SC04, SC14, SC24, S 34, SC44, SC05, SC15, SC25, SC35, SC45 flag map having a ( "0", "1", "2" or "3") MPCL1 is created.

  Specifically, in the charged particle beam drawing apparatus 10 according to the thirteenth embodiment, as shown in FIGS. 24A and 24B, a map MPCL1 is created corresponding to the cell CL1. Further, by dividing the map MPCL1 into a plurality of pieces in the X direction, for example, and dividing the map MPCL1 into a plurality of pieces in the Y direction, for example, a plurality of partitions SC00, SC10,..., SC35, SC45 are created.

  Next, in the charged particle beam drawing apparatus 10 of the thirteenth embodiment, as shown in FIG. 24B, the flags of the sections SC00, SC10,..., SC35, SC45 are initialized. That is, the flags of the sections SC00, SC10,..., SC35, and SC45 indicate that “the elements of the graphic hierarchy FG belonging to the first layer (graphics FG11, FG12,...) Can be displayed and belong to the second layer. The state “0” of the layout display of the elements of the figure hierarchy FG (graphics FG21, FG22,...) Is set.

  The elements of the graphic hierarchy FG belonging to the first layer (graphics FG11, FG12,...) Are read before the elements of the graphic hierarchy FG belonging to the second layer (graphics FG21, FG22,...) Whether the elements of the graphic hierarchy FG belonging to the two layers (graphics FG21, FG22,...) Are read before the elements of the graphic hierarchy FG belonging to the first layer (graphics FG11, FG12,. . First, when the elements of the graphic hierarchy FG belonging to the first layer (graphics FG11, FG12,...) Are read before the elements of the graphic hierarchy FG belonging to the second layer (graphics FG21, FG22,...). Will be described.

  In the charged particle beam drawing apparatus 10 of the thirteenth embodiment, following initialization of the flag of the map MPCL1, the data reading unit 10d1 (see FIG. 1) belongs to the first layer in the charged particle beam drawing apparatus data D1. Elements of the graphic hierarchy FG (graphic FG11) (see FIG. 24A) are read.

  FIG. 25 is a diagram showing the arrangement coordinates (xFG11, yFG11) and size (X-direction dimension wFG11, Y-direction dimension hFG11) of the figure FG11 belonging to the first layer. Specifically, FIG. 25A shows the arrangement coordinates (xFG11, yFG11) and size (X-direction dimension wFG11, Y-direction dimension hFG11) of the figure FG11 belonging to the first layer, and FIG. The position of the figure FG11 on the screen of the monitor 10d5 is shown, and FIG. 25C shows the position of the figure FG11 on the map MPCL1.

  Next, in the charged particle beam drawing apparatus 10 according to the thirteenth embodiment, as shown in FIGS. 25A and 25B, the graphic hierarchy belonging to the first layer is obtained by the data processing unit 10d2 (see FIG. 1). The position (pixel PX00) on the screen of the monitor 10d5 corresponding to the arrangement coordinates (xFG11, yFG11) and the size (X direction dimension wFG11 and Y direction dimension hFG11) of the FG element (figure FG11) is calculated. Also, as shown in FIGS. 25A and 25C, the data processing unit 10d2 (see FIG. 1) causes the arrangement coordinates (xFG11, yFG11) of the elements (graphic FG11) of the graphic hierarchy FG belonging to the first layer. ), A position (section SC00) on the map MPCL1 corresponding to the size (X-direction dimension wFG11 and Y-direction dimension hFG11) is calculated.

  FIG. 26 is a diagram showing the screen of the monitor 10d5 and the like in a state where the figure FG11 belonging to the first layer is displayed in a layout manner. Specifically, FIG. 26A shows the screen of the monitor 10d5 in a state in which the graphic FG11 (see FIG. 25B) belonging to the first layer is displayed in a layout, and FIG. 26B shows the first layer. The state of the flag of the map MPCL1 after the figure FG11 (see FIG. 25C) belonging to is displayed in a layout manner is shown.

  Next, in the charged particle beam drawing apparatus 10 according to the thirteenth embodiment, the layout display object generation unit 10d3 (see FIG. 1) performs layout display of elements (figure FG11) of the figure hierarchy FG belonging to the first layer. Information is added and an object for layout display is generated. Next, as shown in FIG. 26A, the layout display unit 10d4 (see FIG. 1) causes the elements of the graphic hierarchy FG (graphic FG11) (see FIG. 25B) belonging to the first layer to be displayed on the screen of the monitor 10d5. The layout is displayed at the position of the upper pixel PX00 (filled with the first color). As shown in FIGS. 25C and 26B, the flag of the section SC00 corresponding to the position of the element (figure FG11) of the figure hierarchy FG belonging to the first layer is “figure belonging to the first layer”. State “0” of the layout display of the elements of the hierarchy FG (graphic FG12,... And the layout display of the elements of the graphic hierarchy FG belonging to the second layer (graphics FG21, FG22,...) ”(FIG. 24). (See (B)) from “the layout of the graphic layer FG belonging to the first layer (graphic FG12,...) Cannot be displayed and the graphic layer FG elements (graphic FG21, FG22,...) Belonging to the second layer. Is switched to state “1”.

  Next, in the charged particle beam drawing apparatus 10 according to the thirteenth embodiment, the data reading unit 10d1 (see FIG. 1) causes the elements (figure FG12) of the figure hierarchy FG belonging to the first layer in the charged particle beam drawing apparatus data D1. ) (See FIG. 24A) is read.

  FIG. 27 is a diagram showing the arrangement coordinates (xFG12, yFG12) and size (X-direction dimension wFG12, Y-direction dimension hFG12) of the figure FG12 belonging to the first layer. Specifically, FIG. 27A shows the arrangement coordinates (xFG12, yFG12) and size (X-direction dimension wFG12, Y-direction dimension hFG12) of the figure FG12 belonging to the first layer, and FIG. The position of the figure FG12 on the screen of the monitor 10d5 is shown, and FIG. 27C shows the position of the figure FG12 on the map MPCL1.

  Next, in the charged particle beam drawing apparatus 10 according to the thirteenth embodiment, as shown in FIGS. 27A and 27B, the data processing unit 10d2 (see FIG. 1) uses the graphic hierarchy belonging to the first layer. The position (pixel PX00) on the screen of the monitor 10d5 corresponding to the arrangement coordinates (xFG12, yFG12) and size (X direction dimension wFG12 and Y direction dimension hFG12) of the FG element (figure FG12) is calculated. Also, as shown in FIGS. 27A and 27C, the data processing unit 10d2 (see FIG. 1) causes the arrangement coordinates (xFG12, yFG12) of the elements (graphic FG12) of the graphic hierarchy FG belonging to the first layer. ), A position (section SC00) on the map MPCL1 corresponding to the size (X-direction dimension wFG12 and Y-direction dimension hFG12) is calculated.

  Next, in the charged particle beam drawing apparatus 10 according to the thirteenth embodiment, the data processing unit 10d2 (see FIG. 1) uses the flag of the partition SC00 corresponding to the position of the element (figure FG12) of the figure hierarchy FG belonging to the first layer. “The layout of the elements of the graphic hierarchy FG belonging to the first layer (graphic FG12,...) Cannot be displayed, and the elements of the graphic hierarchy FG belonging to the second layer (graphics FG21, FG22,...) Can be displayed.” "1" or "the layout of the elements of the graphic hierarchy FG belonging to the first layer (graphic FG12,...) Cannot be displayed, and the layout of the elements of the graphic hierarchy FG belonging to the second layer (graphic FG22,...) It is determined whether or not the state “3” of “not displayable” is set. At this stage, as shown in FIG. 26B, the flag of the partition SC00 corresponding to the position of the element (figure FG12) of the graphic hierarchy FG belonging to the first layer is “element of graphic hierarchy FG belonging to the first layer ( Since the layout display of the figure FG12,... Is not possible and the layout display of the elements of the figure hierarchy FG belonging to the second layer (graphics FG21, FG22,...) Is “1”, In the charged particle beam drawing apparatus 10 of the embodiment, the elements (figure FG12) of the figure hierarchy FG belonging to the first layer are monitored by the layout display object generation unit 10d3 (see FIG. 1) and the layout display unit 10d4 (see FIG. 1). Processing for displaying the layout on the 10d5 screen is not performed.

  Next, in the charged particle beam drawing apparatus 10 according to the thirteenth embodiment, the data reading unit 10d1 (see FIG. 1) causes the elements (figure FG21) of the figure hierarchy FG belonging to the second layer in the charged particle beam drawing apparatus data D1. ) (See FIG. 24A) is read.

  FIG. 28 is a diagram showing the arrangement coordinates (xFG21, yFG21) and size (X-direction dimension wFG21, Y-direction dimension hFG21) of the figure FG21 belonging to the second layer. Specifically, FIG. 28A shows the arrangement coordinates (xFG21, yFG21) and size (X-direction dimension wFG21, Y-direction dimension hFG21) of the figure FG21 belonging to the second layer, and FIG. The position of the figure FG21 on the screen of the monitor 10d5 is shown, and FIG. 28C shows the position of the figure FG21 on the map MPCL1.

  Next, in the charged particle beam drawing apparatus 10 of the thirteenth embodiment, as shown in FIGS. 28 (A) and 28 (B), the graphic hierarchy belonging to the second layer is obtained by the data processing unit 10d2 (see FIG. 1). The position (pixel PX00) on the screen of the monitor 10d5 corresponding to the arrangement coordinates (xFG21, yFG21) and size (X-direction dimension wFG21 and Y-direction dimension hFG21) of the FG element (figure FG21) is calculated. Further, as shown in FIGS. 28A and 28C, the data processing unit 10d2 (see FIG. 1) causes the arrangement coordinates (xFG21, yFG21) of the elements (graphic FG21) of the graphic hierarchy FG belonging to the second layer. ), A position (section SC00) on the map MPCL1 corresponding to the size (X-direction dimension wFG21 and Y-direction dimension hFG21) is calculated.

  FIG. 29 is a diagram showing a screen of the monitor 10d5 and the like in a state where the graphic FG11 belonging to the first layer and the graphic FG21 belonging to the second layer are displayed in a layout manner. Specifically, FIG. 29A shows a monitor 10d5 in a state in which a figure FG11 (see FIG. 25B) belonging to the first layer and a figure FG21 (see FIG. 28B) belonging to the second layer are layout-displayed. FIG. 29B shows a layout after the figure FG11 (see FIG. 25C) belonging to the first layer and the figure FG21 (see FIG. 28C) belonging to the second layer are laid out. The map MPCL1 flag state is shown.

  Next, in the charged particle beam drawing apparatus 10 according to the thirteenth embodiment, the layout display object generation unit 10d3 (see FIG. 1) uses the graphic layer FG element (graphic FG11) belonging to the first layer and the graphic belonging to the second layer. Information such as a color for displaying the elements of the hierarchy FG (figure FG21) in layout is added to generate an object for layout display. Next, as shown in FIG. 29A, the layout display unit 10d4 (see FIG. 1) uses the graphic layer FG elements (figure FG11) (see FIG. 25B) belonging to the first layer and the second layer. The element of the figure hierarchy FG to which it belongs (figure FG21) (see FIG. 28B) is laid out and displayed at the position of the pixel PX00 on the screen of the monitor 10d5 (filled with the second color). Also, as shown in FIGS. 28C and 29B, at the positions of the elements of the graphic hierarchy FG belonging to the first layer (graphic FG11) and the elements of the graphic hierarchy FG belonging to the second layer (graphic FG21). The flag of the corresponding section SC00 is “The layout of the element of the graphic hierarchy FG belonging to the first layer (graphic FG12,...) Cannot be displayed, and the element of the graphic hierarchy FG belonging to the second layer (graphic FG22,. From the state “1” (see FIG. 26B) of “the display of the layout can be displayed” and “the display of the layout of the elements (figure FG12,...) Belonging to the first layer cannot be displayed and the figure belongs to the second layer The state is switched to the state “3” in which “the layout display of the elements (figure FG22,...) Of the hierarchy FG cannot be displayed”.

  Next, in the charged particle beam drawing apparatus 10 according to the thirteenth embodiment, the data reading unit 10d1 (see FIG. 1) causes the elements (figure FG22) of the figure hierarchy FG belonging to the second layer in the charged particle beam drawing apparatus data D1. ) (See FIG. 24A) is read.

  FIG. 30 is a diagram showing the arrangement coordinates (xFG22, yFG22) and size (X-direction dimension wFG22, Y-direction dimension hFG22) and the like of the figure FG22 belonging to the second layer. Specifically, FIG. 30A shows the arrangement coordinates (xFG22, yFG22) and size (X-direction dimension wFG22, Y-direction dimension hFG22) of the figure FG22 belonging to the second layer, and FIG. The position of the figure FG22 on the screen of the monitor 10d5 is shown, and FIG. 30C shows the position of the figure FG22 on the map MPCL1.

  Next, in the charged particle beam drawing apparatus 10 according to the thirteenth embodiment, as shown in FIGS. 30A and 30B, a data hierarchy belonging to the second layer is obtained by the data processing unit 10d2 (see FIG. 1). The position (pixel PX00) on the screen of the monitor 10d5 corresponding to the arrangement coordinates (xFG22, yFG22) and size (X-direction dimension wFG22 and Y-direction dimension hFG22) of the FG element (figure FG22) is calculated. Further, as shown in FIGS. 30A and 30C, the data processing unit 10d2 (see FIG. 1) causes the arrangement coordinates (xFG22, yFG22) of the elements (graphic FG22) of the graphic hierarchy FG belonging to the second layer. ), A position (section SC00) on the map MPCL1 corresponding to the size (X-direction dimension wFG22 and Y-direction dimension hFG22) is calculated.

  Next, in the charged particle beam drawing apparatus 10 according to the thirteenth embodiment, the data processing unit 10d2 (see FIG. 1) uses the flag of the partition SC00 corresponding to the position of the element (figure FG22) of the figure hierarchy FG belonging to the second layer. "The layout of the elements of the graphic hierarchy FG belonging to the first layer (graphics FG11, FG12,...) Can be displayed, and the layout of the elements of the graphic hierarchy FG belonging to the second layer (graphic FG22,...) Cannot be displayed." "2" or "the layout of the element (figure FG12,...) Belonging to the first layer cannot be displayed and the layout of the element (figure FG22,...) Belonging to the second layer cannot be displayed. It is determined whether or not the state “3” of “not displayable” is set. At this stage, as shown in FIG. 29B, the flag of the partition SC00 corresponding to the position of the element (figure FG22) of the graphic hierarchy FG belonging to the second layer is “element of graphic hierarchy FG belonging to the first layer ( Since the layout display of the graphic FG12,... Is not possible and the layout of the graphic hierarchy FG element (graphic FG22,...) Belonging to the second layer is “3”, the state is “13”. In the charged particle beam drawing apparatus 10 of the embodiment, the element (graphic FG22) of the graphic hierarchy FG belonging to the second layer by the layout display object generation unit 10d3 (see FIG. 1) and the layout display unit 10d4 (see FIG. 1) is displayed on the monitor 10d5. Processing to display the layout on the screen is not performed.

  Next, the case where the elements of the graphic hierarchy FG belonging to the second layer (graphics FG21, FG22,...) Are read before the elements of the graphic hierarchy FG belonging to the first layer (graphics FG11, FG12,...). explain.

  In the charged particle beam drawing apparatus 10 according to the thirteenth embodiment, following the initialization of the flag of the map MPCL1 (see FIG. 24B), the data reading unit 10d1 (see FIG. 1) uses the charged particle beam drawing apparatus data. Elements of the graphic hierarchy FG (graphic FG21) (see FIG. 24A) belonging to the second layer in D1 are read.

  FIG. 31 is a diagram showing the arrangement coordinates (xFG21, yFG21) and size (X-direction dimension wFG21, Y-direction dimension hFG21) and the like of the figure FG21 belonging to the second layer. Specifically, FIG. 31A shows the arrangement coordinates (xFG21, yFG21) and size (X-direction dimension wFG21, Y-direction dimension hFG21) of the figure FG21 belonging to the second layer, and FIG. The position of the figure FG21 on the screen of the monitor 10d5 is shown, and FIG. 31C shows the position of the figure FG21 on the map MPCL1.

  Next, in the charged particle beam drawing apparatus 10 according to the thirteenth embodiment, as shown in FIG. 31A and FIG. 31B, the data processing unit 10d2 (see FIG. 1) uses the graphic hierarchy belonging to the second layer. The position (pixel PX00) on the screen of the monitor 10d5 corresponding to the arrangement coordinates (xFG21, yFG21) and size (X-direction dimension wFG21 and Y-direction dimension hFG21) of the FG element (figure FG21) is calculated. Further, as shown in FIGS. 31A and 31C, the data processing unit 10d2 (see FIG. 1) causes the arrangement coordinates (xFG21, yFG21) of the element (graphic FG21) of the graphic hierarchy FG belonging to the second layer. ), A position (section SC00) on the map MPCL1 corresponding to the size (X-direction dimension wFG21 and Y-direction dimension hFG21) is calculated.

  FIG. 32 is a diagram showing the screen of the monitor 10d5 and the like in a state where the figure FG21 belonging to the second layer is displayed in a layout manner. Specifically, FIG. 32A shows the screen of the monitor 10d5 in a state where the figure FG21 (see FIG. 31B) belonging to the second layer is displayed in a layout, and FIG. 32B shows the second layer. This shows the state of the flag of the map MPCL1 after the graphic FG21 (see FIG. 31C) belonging to is displayed in the layout.

  Next, in the charged particle beam drawing apparatus 10 according to the thirteenth embodiment, the layout display object generation unit 10d3 (see FIG. 1) performs layout display of elements of the graphic hierarchy FG belonging to the second layer (graphic FG21). Information is added and an object for layout display is generated. Next, as shown in FIG. 32A, the layout display unit 10d4 (see FIG. 1) causes the element of the graphic hierarchy FG (graphic FG21) (see FIG. 31B) belonging to the second layer to be displayed on the screen of the monitor 10d5. A layout is displayed at the position of the upper pixel PX00 (filled with the third color). Further, as shown in FIGS. 31C and 32B, the flag of the section SC00 corresponding to the position of the element (figure FG21) of the figure hierarchy FG belonging to the second layer is “figure belonging to the first layer”. State “0” of the layout display of the elements of the hierarchy FG (graphics FG11, FG12,... And the layout display of the elements of the graphic hierarchy FG belonging to the second layer (graphic FG22,...) ”(FIG. 24). (See (B)) to “the layout display of the elements of the graphic hierarchy FG belonging to the first layer (graphics FG11, FG12,...) And the elements of the graphic hierarchy FG belonging to the second layer (graphic FG22,...) Is switched to state “2”.

  In the charged particle beam drawing apparatus 10 of the fourteenth embodiment, the above-described charged particle beam drawing apparatus 10 of the first to thirteenth embodiments can be appropriately combined.

  Hereinafter, a first embodiment of a pattern inspection apparatus of the present invention will be described. FIG. 33 is a schematic configuration diagram of the pattern inspection apparatus 20 according to the first embodiment. In the pattern inspection apparatus 20 of the first embodiment, as shown in FIG. 33, layout data (design data, CAD data) such as a semiconductor integrated circuit is converted by, for example, a pattern inspection apparatus data creation apparatus (not shown). The pattern inspection apparatus data D3 obtained by doing so is input in a disk format, for example. The pattern inspection apparatus data D3 is, for example, the chip hierarchy CP, the frame hierarchy FR lower than the chip hierarchy CP, and the block hierarchy lower than the frame hierarchy FR, similarly to the charged particle beam drawing apparatus data D1 shown in FIG. BL, a cell hierarchy CL lower than the block hierarchy BL, and a graphic hierarchy FG lower than the cell hierarchy CL.

  Furthermore, in the pattern inspection apparatus 20 of the first embodiment, as shown in FIG. 33, for example, the pattern inspection apparatus 20 is actually drawn on the sample M by the charged particle beam 10a1b of the charged particle beam drawing apparatus 10 of the first embodiment. The pattern inspection apparatus data D4 created based on the pattern is input in a disk format, for example.

  Specifically, in the pattern inspection apparatus 20 of the first embodiment, as shown in FIG. 33, for example, the charge of the first embodiment is based on the pattern inspection apparatus data D3 and D4 input to the inspection unit 20a. Inspection of a pattern actually drawn on the sample M by the charged particle beam 10a1b of the particle beam drawing apparatus 10 is performed.

  Furthermore, in the pattern inspection apparatus 20 of the first embodiment, as shown in FIG. 33, the pattern inspection apparatus data D3 is input not only to the inspection section 20a but also to the layout display section 20b. That is, in the pattern inspection apparatus 20 of the first embodiment, the pattern inspection apparatus data D3 hierarchized similarly to the charged particle beam drawing apparatus data D1 shown in FIG. 2 is displayed on the screen of the monitor 20b5 of the layout display unit 20b. The layout is displayed (viewer processing).

  The data reading unit 20b1 of the layout display unit 20b of the pattern inspection apparatus 20 of the first embodiment is the same as the data reading unit 10d1 of the layout display unit 10d of the charged particle beam drawing apparatus 10 of the first embodiment shown in FIG. It is configured. Further, the data processing unit 20b2 of the layout display unit 20b of the pattern inspection apparatus 20 of the first embodiment is the data processing unit 10d2 of the layout display unit 10d of the charged particle beam drawing apparatus 10 of the first embodiment shown in FIG. It is configured in the same way. Furthermore, the layout display object generation unit 20b3 of the layout display unit 20b of the pattern inspection apparatus 20 of the first embodiment performs layout display of the layout display unit 10d of the charged particle beam drawing apparatus 10 of the first embodiment shown in FIG. The configuration is the same as that of the object generation unit 10d3.

  The layout display unit 20b4 of the layout display unit 20b of the pattern inspection apparatus 20 of the first embodiment is the layout display unit 10d4 of the layout display unit 10d of the charged particle beam drawing apparatus 10 of the first embodiment shown in FIG. It is configured in the same way. Furthermore, the monitor 20b5 of the layout display unit 20b of the pattern inspection apparatus 20 of the first embodiment is configured similarly to the monitor 10d5 of the layout display unit 10d of the charged particle beam drawing apparatus 10 of the first embodiment shown in FIG. Has been.

  Furthermore, in the layout display unit 20b of the pattern inspection apparatus 20 of the first embodiment, the charged particle beam drawing apparatus in the layout display unit 10d of the charged particle beam drawing apparatus 10 of any of the first to fourteenth embodiments described above. The same process as the process for displaying the layout of the data D1 is performed on the pattern inspection apparatus data D3.

10 charged particle beam drawing apparatus 10a drawing unit 10a1b charged particle beam 10d layout display unit 10d5 monitor

Claims (5)

Reading means for reading the data for the hierarchical charged particle beam drawing apparatus including the elements of the first hierarchy and including at least the first element and the second element in the second hierarchy lower than the first hierarchy;
A screen for layout display of data for a charged particle beam drawing apparatus;
A map having flags in a plurality of sections arranged roughly in a grid pattern;
When the first element of the second layer is read and the section on the map corresponding to the position of the first element is calculated, the flag of the section corresponding to the position of the first element of the second layer is set to “second layer Switching means for switching from the "element layout display possible" state to the "second layer element layout not displayable"state;
Determining means for determining whether or not the flag of the section corresponding to the position of the second element of the second hierarchy is in a state of “impossible to display layout of elements of the second hierarchy”;
Since the section on the map corresponding to the position of the first element and the section on the map corresponding to the position of the second element are the same, the section corresponding to the position of the second element of the second hierarchy Layout display processing stop means for canceling the processing of displaying the second element of the second hierarchy on the screen when the flag is in a state of “impossible to display the layout of the element of the second hierarchy” ;
The charged particle is characterized in that the screen displays a layout on the map corresponding to the position of the first element, which is in a state in which “the layout display of the elements of the second hierarchy is possible” before the switching. Beam drawing device. The charged particle beam writing apparatus data includes a number of elements in the second layer in addition to the first element and the second element.
When the ratio of the section in which the flag state has changed from the state in which the layout of the elements in the second hierarchy can be displayed to the state in which the layout of the elements in the second hierarchy cannot be displayed reaches a predetermined value, The charged particle beam drawing apparatus according to claim 1, further comprising a reading end unit that ends reading of an element. A hierarchized pattern for inspecting a pattern drawn by a charged particle beam, including an element of the first hierarchy and including at least a first element and a second element in a second hierarchy lower than the first hierarchy A reading means for reading data for the inspection device;
A screen for layout display of data for the pattern inspection device;
A map having flags in a plurality of sections arranged roughly in a grid pattern;
When the first element of the second layer is read and the section on the map corresponding to the position of the first element is calculated, the flag of the section corresponding to the position of the first element of the second layer is set to “second layer Switching means for switching from the "element layout display possible" state to the "second layer element layout not displayable"state;
Determining means for determining whether or not the flag of the section corresponding to the position of the second element of the second hierarchy is in a state of “impossible to display layout of elements of the second hierarchy”;
Since the section on the map corresponding to the position of the first element and the section on the map corresponding to the position of the second element are the same, the section corresponding to the position of the second element of the second hierarchy Layout display processing stop means for canceling the processing of displaying the second element of the second hierarchy on the screen when the flag is in a state of “impossible to display the layout of the element of the second hierarchy” ;
The screen displays a layout on the map corresponding to the position of the first element, which is in a state in which “the layout display of the elements of the second hierarchy is possible” before the switching. apparatus. The charged particle beam drawing apparatus data or the pattern inspection apparatus data including the elements of the first hierarchy and including at least the first element and the second element in the second hierarchy lower than the first hierarchy are displayed on the screen. In the layout display method,
A step of creating a map having flags in a plurality of sections arranged in a substantially grid pattern when the magnification of the layout display is expanded until reading of the first element and the second element of the second hierarchy is started;
Reading the first element of the second hierarchy;
Displaying a layout of the first element of the second hierarchy on the screen;
When the first element of the second layer is read and the section on the map corresponding to the position of the first element is calculated, the flag of the section corresponding to the position of the first element of the second layer is set to “second layer Switching from the “element layout display enabled” state to the “second layer element layout display disabled” state;
Reading the second element of the second hierarchy;
Determining whether the flag of the section corresponding to the position of the second element of the second hierarchy is in a state of “impossible to display layout of elements of the second hierarchy”;
Since the section on the map corresponding to the position of the first element and the section on the map corresponding to the position of the second element are the same, the section corresponding to the position of the second element of the second hierarchy If the flag is in a state of "layout display not the elements of the second hierarchy", seen including a step to stop the process of displaying a layout of the second element of the second hierarchy on the screen,
When displaying the layout of the first element on the screen, the section of the map corresponding to the position of the first element and in which the layout of the element of the second hierarchy was in the state of “possible to display the layout of the element of the second hierarchy” before the switching A layout display method characterized by:   When the ratio of the section in which the flag state has changed from the state in which the layout of the elements in the second hierarchy can be displayed to the state in which the layout of the elements in the second hierarchy cannot be displayed reaches a predetermined value, The layout display method according to claim 4, further comprising a step of ending the reading of elements.

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