JP5423045B2 - Method for manufacturing solar cell and method for manufacturing solar cell module - Google Patents

Description

The present invention relates to a manufacturing how such mainly solar cell. More particularly, it relates to a manufacturing method of the production method及BiFutoshi solar cell module of solar cells to form an electrode through the silicon nitride layer of the solar cell.

  Conventionally, what has a p-type semiconductor substrate as a solar cell is known. A pn junction is created in the solar cell, and radiation of an appropriate wavelength toward the pn junction serves as a source of external energy that generates hole-electron pairs in the solar cell. And due to the potential difference present at the pn junction, the holes and electrons cross this junction in the opposite direction, thereby causing a current flow that can deliver power to the external circuit. Yes. And most solar cells having such a configuration take the form of a metallized silicon wafer, i.e. a silicon wafer provided with conductive metal contacts.

  Here, most power generation solar cells currently used on the earth are silicon solar cells. In this solar cell, a p-type semiconductor substrate is used, an n-type semiconductor layer is formed on the upper surface of the p-type semiconductor substrate to form a pn junction, and a silicon nitride layer is formed on the n-type semiconductor layer as an antireflection coating. Furthermore, it forms. An electrode that penetrates the silicon nitride layer and is electrically connected to the n-type semiconductor layer is formed on the silicon nitride layer. Here, the process for producing such silicon solar cells is generally aimed at maximizing simplification and minimizing manufacturing costs to enable mass production. Yes. For this reason, the electrode is formed by a procedure called “fire-through”.

  A specific procedure called “fire-through” for forming this electrode is to first print a paste-like conductive composition on a silicon nitride layer in a linear or comb-like shape using a method such as screen printing. To do. This conductive composition contains silver powder. By firing the paste, the silver is infiltrated into the silicon nitride layer, so that the electrode obtained by firing the paste penetrates the silicon nitride layer. Thus, the n-type semiconductor layer under the silicon nitride layer is electrically connected. And the conductive paste containing boron is proposed as a thing for making such an electrode (for example, refer patent document 1).

JP 2006-93433 A (specification [0014], FIG. 3)

  However, in the formation of the electrode called “fire-through”, if a silicon nitride layer remains between the electrode obtained by firing the slurry-like conductive composition and the n-type semiconductor layer, the adhesion of the electrode There is a problem that cannot be secured. On the other hand, when the silver in the paste-like conductive composition that penetrates into the silicon nitride layer during firing further penetrates into the n-type semiconductor layer under the silicon nitride layer, the electrode directly conducts with the p-type semiconductor substrate. As a result, there arises a problem that sufficient conductivity between the electrode and the n-type semiconductor layer cannot be obtained. For this reason, in order to increase the performance of the solar cell, it is necessary to ensure appropriate electrical conductivity between the electrode penetrating the silicon nitride layer and the n-type semiconductor layer.

An object of the present invention is to provide a manufacturing method and a conductive composition used therefor suitable electrical performance and the substrate and the solar battery cells that give to ensure adhesion of the resulting electrode by firing is there.

Another object of the present invention is to provide a method for producing a solar cell module formed by using solar cells that ensure appropriate electrical performance of electrodes obtained by firing and adhesion to a substrate. .

The first aspect of the present invention includes a step of removing etching damage to the p-type semiconductor substrate 14 by subjecting the p-type semiconductor substrate 14 to etching with acid or alkali, and a texture etching treatment of the p-type semiconductor substrate 14. Then, the step of forming a texture structure on the upper surface of the p-type semiconductor substrate 14 and the thermal diffusion of the n-type dopant on the upper surface of the p-type semiconductor substrate 14 make the n-type semiconductor layer 12 on the upper surface of the p-type semiconductor substrate 14. A step of forming, a step of forming a silicon nitride layer 11 on the n-type semiconductor layer 12, a step of printing and drying a conductive composition on the silicon nitride layer 11 in a linear or comb shape, and a p-type semiconductor. A process of printing and drying a metal paste containing a metal other than Al and an Al paste 17 on the lower surface of the substrate 14, and the printed conductive composition, metal paste and Al paste 1 By firing the p-type semiconductor substrate 14 having the form electrode 13 which does not conduct directly with the p-type semiconductor substrate and electrically connected to the n-type semiconductor layer 12 through the silicon nitride layer 11, and beyond the n-type semiconductor layer And the step of forming the p + layer 16, the Al-Si alloy layer 19, the lead wire holder and the aluminum back electrode 18, and the conductive composition is composed of silver powder, glass powder not containing PbO, and organic matter. The ratio of the silver powder in the composition is not less than 70% by mass and not more than 95% by mass, the glass powder is contained in an amount of 1 to 10 parts by mass with respect to 100 parts by mass of the silver powder, The basicity is 0.3 or more and 0.4 or less, the glass transition point is 320 ° C. to 370 ° C., the glass powder is a _binary glass of Bi ₂ O ₃ —B ₂ O ₃ , and the glass powder is TiO ₂ , SiO ₂ , Al ₂ O ₃ , ZrO ₂ and NiO, one or more selected from the group consisting of NiO as a trace component, the content of the trace component in the glass powder is greater than 0 mol%, and 5 mol % Or less, a method for producing a solar battery cell.

A second aspect of the present invention is a p-type semiconductor substrate 14, an n-type semiconductor layer 12 formed on the upper surface of the p-type semiconductor substrate 14, and a silicon nitride layer 11 formed on the n-type semiconductor layer 12. A linear or comb-like shape formed by baking of a conductive composition, penetrating through the silicon nitride layer 11 and conducting to the n-type semiconductor layer 12 and not directly conducting to the p-type semiconductor substrate across the n-type semiconductor layer . It is a manufacturing method of the photovoltaic cell which forms the electrode 13, Comprising: The said electrically conductive composition contains the glass powder which does not contain silver powder, PbO, and the vehicle which consists of organic substance, The ratio in the composition of silver powder is 70. The glass powder is contained in an amount of 1 to 10 parts by mass with respect to 100 parts by mass of the silver powder, and the basicity of the glass powder is 0.3 to 0.4 and glass is contained. Transition point of 320 ° C to 370 ° C There, the glass powder is binary glass _{Bi 2 O 3 -B 2 O 3} , 1 kind or glass powder is selected from the group consisting of _{TiO 2, SiO 2, Al 2} O 3, ZrO 2 and NiO A method for producing a solar cell, comprising two or more kinds as trace components, wherein the content of the trace components in the glass powder is more than 0 mol% and 5 mol% or less.
In the solar battery cell obtained by this method, appropriate electrical conductivity between the electrode 13 penetrating the silicon nitride layer 11 and the n-type semiconductor layer 12 is ensured, and the performance can be increased.

A third aspect of the present invention is an invention based on the first or second aspect, in which the silicon nitride layer 11 is formed to a thickness of 700 to 900 mm by plasma CVD, and the temperature during firing or baking is set to 700. ˜975 ° C.

In the conductive composition, although the glass powder does not contain PbO, since the basicity of the glass powder is 0.3 or more, the silicon nitride layer 11 in the solar battery cell 10 can be surely penetrated by firing, Adhesion of the obtained electrode can be ensured. Further, since the basicity is 0.4 or less, the electrode obtained by firing avoids itself that the electrode obtained by baking directly conducts with the p-type semiconductor substrate beyond the n-type semiconductor layer 12, and the obtained electrode Sufficient conductivity of the n-type semiconductor layer 12 can be obtained. Moreover, the adhesiveness with respect to the n-type semiconductor layer 12 of the electrode 13 after baking can be improved.

The 4th viewpoint of this invention is a manufacturing method of a solar cell module including the process of manufacturing a photovoltaic cell by the method of the 1st thru | or 3rd viewpoint.

In the manufacturing method according to the first aspect of the present invention, since the linear or comb-like electrode is formed using the conductive composition, the silicon nitride layer in the solar battery cell can be surely penetrated by firing. The adhesion of the obtained electrode is ensured, and the obtained electrode is directly connected to the p-type semiconductor substrate beyond the n-type semiconductor layer, so that the electrode and the n-type semiconductor layer are sufficiently connected. A solar cell having excellent conductivity can be manufactured.

In the manufacturing method according to the second aspect of the present invention, since a linear or comb-like electrode is formed by baking the conductive composition, appropriate conduction between the electrode penetrating the silicon nitride layer and the n-type semiconductor layer is achieved. Performance can be secured and its performance can be increased.

In the said electrically conductive composition, the ratio in the composition of silver powder is 70 to 95 mass%, glass powder is contained 1 to 10 mass parts with respect to 100 mass parts of silver powder, PbO Binary glass in which the basicity of the glass powder containing no glass is 0.3 or more and 0.4 or less, the glass transition point is 320 ° C. to 370 ° C., and the glass powder is Bi ₂ O ₃ —B ₂ O ₃ The glass powder contains one or more selected from the group consisting of TiO ₂ , SiO ₂ , Al ₂ O ₃ , ZrO ₂ and NiO as a trace component, and the content of the trace component in the glass powder is Since it is a requirement that it is more than 0 mol% and 5 mol% or less, the silicon nitride layer in the solar battery cell can be surely penetrated by firing, and the adhesion of the obtained electrode is ensured and obtained. Electrode By avoiding the direct conduction with the p-type semiconductor substrate beyond the n-type semiconductor layer, sufficient conductivity between the electrode and the n-type semiconductor layer can be obtained.

In the manufacturing method of the solar cell module of the 4th viewpoint of this invention, since it forms using such a photovoltaic cell, the performance can be increased.

It is an expanded sectional view of the photovoltaic cell using the electroconductive composition of this invention embodiment. It is sectional drawing corresponding to FIG. 1 which shows the state before baking of the solar cell. It is a top view of the photovoltaic cell of this invention embodiment. It is a back view of the photovoltaic cell of this invention embodiment. It is a schematic sectional drawing of the solar cell module of this invention embodiment.

  Next, an embodiment for carrying out the present invention will be described with reference to the drawings.

As shown in FIG. 1, the conductive composition used in the present invention penetrates through the silicon nitride layer 11 in the solar battery cell 10 and is electrically connected to the n-type semiconductor layer 12 formed under the silicon nitride layer 11. This is for forming the electrode 13. The conductive composition includes silver powder, glass powder not containing PbO, and a vehicle made of organic matter. Here, the ratio in the composition of silver powder is 70 mass% or more and 95 mass% or less. This is because when the silver powder is less than 70% by mass, the electric resistance of the electrode 13 after firing becomes high, and there is a possibility that the characteristics of the solar battery cell 10 may be deteriorated. This is because the property tends to decrease. Here, the ratio of the silver powder in the composition is more preferably 80% by mass or more and 90% by mass or less. Further, the silver powder has an average particle diameter of 0.1 to 2.0 μm obtained by a laser diffraction scattering method from the viewpoint of the coating property and the uniformity of the coating film. Is preferable, and it is still more preferable that it is 0.5-1.0 micrometer.

  The glass powder does not contain PbO and is contained in an amount of 1 to 10 parts by mass with respect to 100 parts by mass of the silver powder. This glass powder is added in order to improve the adhesion in the electrode 13 after firing, and when the glass powder is less than 1 part by mass with respect to 100 parts by mass of the silver powder, the electrode 13 after firing. If the glass powder exceeds 10 parts by mass with respect to 100 parts by mass of silver powder, segregation of the glass may occur. The glass powder is more preferably 3 parts by mass or more and 7 parts by mass or less with respect to 100 parts by mass of the silver powder. The reason why the glass powder is limited to those containing no PbO is to reduce the burden on the environment.

The basicity of the glass powder is 0.3 or more and 0.4 or less . This `` basicity '' was proposed by Kenji Morinaga et al., For example, his book `` K. Morinaga, H. Yoshida And H. Takebe: J. Am Cerm. Soc., 77, 3113 (1994) ''. The basicity of the glass powder is defined using the following formula. This excerpt is shown below.

"Coupling force between M _i -O oxide M _i O cation - given by the following equation as an oxygen ion attraction between A _i.

A _i = Z _i · Z ₀₂₋ / (r _i + r ₀₂₋ ) ² = Z _i · 2 / (r _i +1.40) ²
Z _i : valence of cation, oxygen ion is 2
R _i : cation radius (Å), oxygen ion is 1.40Å
The A _i of the inverse B _i a (1 / A _i) a single-component oxide M _i O oxygen donating ability.

B _i ≡1 / A _i
When the _{B i B CaO = 1, B} SiO2 = to 0 and the normalized, B _i of each single component oxides - index is given. When the _Bi -index of each component is expanded to a multi-component system by the cation fraction, the B-index (= basicity) of a glass oxide melt having an arbitrary composition can be calculated. B = Σn _i・ B _i
n _i : Cation fraction The basicity defined in this way represents the oxygen donating ability as described above, and the larger the value, the easier it is to donate oxygen and the easier transfer of oxygen with other metal oxides. . "
As is clear from the above description, “basicity” can be said to represent the degree of dissolution in the glass melt, and if the basicity of the glass powder obtained by the above formula is 0.16 or more, By firing, the silicon nitride layer 11 in the solar battery cell 10 can be reliably penetrated, and the adhesion of the obtained electrode can be ensured. On the other hand, when the basicity of the glass powder was 0.44 or less, the electrode obtained by firing was obtained by avoiding itself that the electrode obtained by firing directly connected to the p-type semiconductor substrate beyond the n-type semiconductor layer 12 was obtained. Sufficient conductivity between the electrode and the n-type semiconductor layer 12 can be obtained. The reason why such a range of basicity is required is that the glass powder does not contain PbO . Also, glass transition point of the glass powder is 320 ° C. to 370 ° C.. The glass transition point Tg was measured as follows. Using a differential thermal balance (TG-DTA2000S, manufactured by Mac Science Co., Ltd.), a glass powder as a sample and a reference material were set on the differential thermal balance, and the room temperature was 10 ° C./min as a measurement condition. To 900 ° C. At this time, a curve (DTA curve) in which the temperature difference between the glass powder as a sample and the reference material was plotted against temperature was obtained. From the DTA curve thus obtained, the intersection of the tangent along the base line and the tangent along the curve from the first inflection point to the second inflection point was defined as the glass transition point Tg.

  The vehicle is for forming a viscous composition called a “paste” having hydrodynamic properties suitable for printing, and is required to be an organic substance. Examples of this vehicle include those obtained by dissolving ethyl cellulose, acrylic resin, alkyd resin, and the like in a solvent. Other examples include polymers including ethyl hydroxyethyl cellulose, wood rosin, a mixture of ethyl cellulose and a phenol resin, a polymethacrylate of a lower alcohol, and a monobutyl ether of ethylene glycol monoacetate. The vehicle may or may not contain thickeners, stabilizers, or other common additives.

Next, the manufacturing procedure of the photovoltaic cell using the said electroconductive composition is demonstrated.

  As shown in FIG. 2, first, a p-type semiconductor substrate 14 is prepared. When a Si substrate is used as this substrate, either a single crystal substrate or a polycrystalline substrate may be used. In this case, in order to remove the slice damage of the substrate 14 sliced to a desired thickness first, the surface is mixed with hydrofluoric acid (hydrofluoric acid) and nitric acid or an alkaline solution such as sodium hydroxide for about 10 to 20 μm. Etching is preferred. In the case of using a single crystal substrate, it is preferable to form a texture structure on the upper surface in order to suppress reflection on the upper surface. This texture structure can be formed by adding 3 to 10% of IPA to an alkaline solution such as 1 to 5% sodium hydroxide and etching at around 80 ° C. for 30 to 60 minutes. Further, by forming an oxide film of several hundreds nm on the lower surface of the p-type semiconductor substrate 14 before performing the texture etching, only the light receiving surface can have a texture structure.

A p + layer 16 is formed on the lower surface of the p-type semiconductor substrate 14 by a conventionally known appropriate method. In the figure, an Al paste is used. As shown in FIG. 2, the Al paste 17 is printed on the lower surface of the p-type semiconductor substrate 14, dried, and then fired. This baking can be performed simultaneously with the baking for forming the electrode 13 to be described later. However, when separately performed, the Al paste 17 is fired first. The Al paste 17 is converted from the dried state to the aluminum back electrode 18 shown in FIG. 1 by firing. During firing, the boundary between the Al paste 17 on the back surface and the back surface of the p-type semiconductor substrate 14 forms an alloy state, and an Al—Si alloy layer 19 is formed at the boundary after firing. Then, a p + layer 16 is formed on the Al-Si alloy layer 19 on the p-type semiconductor substrate 14 side. In addition, on the lower surface of the p-type semiconductor substrate 14, a lead wire holding body 19 is formed for connecting the solar cells 10 in series with the lead wires 31 when the solar cell module 30 is formed. The lead wire holder 19 can be formed by applying and baking a metal paste containing a metal other than Al. Note that this firing can be performed simultaneously with the firing in forming the electrode 13 described later. Specifically, before printing the Al paste 17 on the lower surface of the p-type semiconductor substrate 14, a portion of the lower surface of the p-type semiconductor substrate 14, that is, a portion where the Al paste 17 is not printed, is previously printed using a screen plate. Keep it. The printed metal paste is then dried and then fired. Examples of the metal contained in the metal paste include gold, platinum, silver, a silver-palladium alloy, nickel, and the like. As a method for forming the p + layer 16, the Al paste 17 is not necessarily used. Other methods may be used. For example, the p + layer 16 may be formed on the lower surface of the p-type semiconductor substrate 14 by vapor phase diffusion of BBr ₃ at 700 to 1000 ° C. for several tens of minutes. When the p + layer 16 is formed by this method, it is necessary to previously form an oxide film or the like on the light receiving surface side so as not to diffuse to the light receiving surface side. Alternatively, a method of spin-coating a chemical solution containing a boron compound on the p-type semiconductor substrate 14 and then annealing at 700 to 1000 ° C. or a method of diffusing and forming the p + layer 16 by ion implantation may be used.

On the other hand, an n-type semiconductor layer 12 is formed on the upper surface of the p-type semiconductor substrate 14. The n-type semiconductor layer 12 can be formed by thermal diffusion of an n-type dopant such as phosphorus (P). In this case, phosphorus oxychloride (POCl ₃ ) is generally used as a phosphorus diffusion source. For example, after the semiconductor layer 12 is formed on the entire surface of the p-type semiconductor substrate 14 and the upper surface thereof is protected with a resist or the like, it is removed from most surfaces by etching so that the n-type semiconductor layer 12 remains only on the upper surface. Next, the n-type semiconductor layer 12 can be formed on the upper surface of the p-type semiconductor substrate 14 by removing the resist using an organic solvent or the like. The n-type semiconductor layer 12 preferably has a sheet resistivity of about several tens of ohms per square and a thickness of about 0.3 to 0.5 μm.

  Next, the silicon nitride layer 11 as an antireflection coating is formed on the n-type semiconductor layer 12. The silicon nitride layer 11 can be formed on the n-type semiconductor layer 12 by a process such as plasma enhanced chemical vapor deposition (CVD) to a thickness of about 700 to 900 mm.

  Then, using the conductive composition described above, an electrode 13 that penetrates the silicon nitride layer 11 and is electrically connected to the n-type semiconductor layer 12 formed thereunder is formed by a procedure called “fire-through”. Specifically, as shown in FIG. 2, the paste 21 made of the conductive composition described above is printed on the silicon nitride layer 11 in a linear or comb shape. Screen printing is preferable for printing the paste 21, but other printing methods may be used. Thereafter, firing is performed for several minutes to several tens of minutes in an infrared furnace having a temperature range of about 700 to 975 ° C. By this baking, silver in the paste 21 penetrates into the silicon nitride layer 11, and as shown in FIG. 1, the electrode 13 obtained by baking passes through the silicon nitride layer 11 and below the silicon nitride layer 11. Conductive with the n-type semiconductor layer 12. Thus, the electrode 13 obtained by firing can ensure the appropriate electrical performance and adhesion between the n-type semiconductor layer 12.

  Thus, the p-type semiconductor substrate 14, the n-type semiconductor layer 12 formed on the upper surface of the p-type semiconductor substrate 14, the silicon nitride layer 11 formed on the n-type semiconductor layer 12, and the A solar cell 10 cell provided with a linear or comb-like electrode 13 that penetrates the silicon nitride layer 11 and is electrically connected to the n-type semiconductor layer 12 is obtained.

  In the solar battery 10 cell configured as described above, as a result of ensuring appropriate electrical conductivity between the electrode 13 penetrating the silicon nitride layer 11 and the n-type semiconductor layer 12, the performance can be increased.

Then, the manufacturing procedure of the solar cell module 31 using this photovoltaic cell 10 is demonstrated. FIG. 5 is a schematic cross-sectional view schematically illustrating the manufacturing procedure of the solar cell module of the present invention. In the solar cell module 31 shown in FIG. 5, the adjacent solar cells 10 obtained by the above method are electrically connected in series. FIG. 3 is a top view of the solar battery cell 10, and FIG. 4 is a rear view of the solar battery cell 10. Solar cell 10, as shown in FIG. 3, the electrode 13 and the collector electrode 20 formed by the upper Kishirube conductive composition is formed on the surface thereof. In addition, this collector electrode 20 can be formed using the said electrically conductive composition similarly to the electrode 13. FIG. On the other hand, as shown in FIG. 4, the above-described lead wire holding body 19 is formed on the back surface. Adjacent solar cells 10 are connected to each other using a lead wire 31 with a lead wire holder 19 formed on the back surface of one solar cell 10 and an electrode 13 formed on the surface of the other solar cell 10. This is done by soldering. Thereby, as shown in FIG. 5, adjacent cells are electrically connected in series.

  And as shown in FIG. 5, the transparent member 32 which consists of white board tempered glass, the filler 33 which consists of transparent ethylene vinyl acetate copolymer (EVA), etc., and the surface of the photovoltaic cell 10 adjacent by the lead wire 31 A plurality of solar cells 10 in which electrodes and back electrodes are alternately connected, a light-resistant film 34 in which polyethylene terephthalate (PET) or metal foil is sandwiched between polyvinyl fluoride resins (PVF) are sequentially laminated, The filler 33 is cured and polymerized by degassing, heating and pressing therein, and the solar cell module 31 can be formed by integrating the members. Thereafter, a frame 35 such as aluminum is fitted around the periphery. Furthermore, one end of the electrode of the first cell and the last cell of the plurality of solar cells 10 connected in series is connected to a terminal box 36 which is an output extraction portion by an output extraction wiring 37.

Thus solar cell module 31 thus obtained is to be formed by using the solar battery cell 10 obtained by the method described above, it is possible to increase its performance.

  Next, examples of the present invention will be described in detail together with comparative examples.

<Example 1>
A conductive paste was prepared as follows.

First, 13 parts by weight of a solvent in which α-terpineol and butyl carbitol acetate were mixed at a ratio of 2: 1 was mixed with 1.5 parts by weight of an ethyl cellulose resin and 0.5 parts by weight of a dicarboxylic acid-based dispersant as a dispersant. Got the vehicle .

Next, 82.5 parts by weight of Ag powder having an average particle diameter of 0.8 μm as a conductive powder and an average particle diameter of 0.5 μm having a glass transition point of 370 ° C. and a basicity of 0.3 as a lead-free glass frit After mixing 2.5 parts by weight of Bi ₂ O ₃ —B ₂ O ₃ with 15 parts by weight of the vehicle , the mixture is kneaded with three rolls to disperse the Ag powder and the glass powder. A paste made of a conductive composition containing a vehicle was obtained.

  Next, a substrate with an electrode was produced as follows using the paste.

A substrate in which a silicon nitride film having a thickness of 0.07 μm was formed on one side of a 20 mm square, 0.6 mm thick n-type Si wafer by plasma CVD was produced. On the substrate, the conductive paste was screen-printed using a screen plate having a line width of 100 μm, a space width of 2 mm, and an emulsion thickness of 30 μm to form a printed pattern having a width of about 120 μm and a thickness of about 25 μm. Then, it dried for 10 minutes at 150 degreeC with the belt-type drying furnace. Further, using an infrared lamp heating furnace, the temperature was raised from room temperature to 800 ° C. in 15 seconds in 15 seconds, then cooled to room temperature in 15 seconds, and the printed pattern was baked to obtain a substrate with electrodes. Thus, Example 1 was a substrate with an electrode using a paste containing glass powder having a glass transition point of 370 ° C. and a basicity of 0.3. The glass powder used at this time contained a total of 0.2 mol% of TiO ₂ , SiO ₂ , Al ₂ O ₃ , ZrO ₂ and NiO as trace components.

<Example 2>
Example 1 except that the lead-free glass frit in the conductive paste is Bi ₂ O ₃ —B ₂ O ₃ having a glass transition point of 340 ° C. and a basicity of 0.35 and an average particle size of 0.5 μm. Similarly, a conductive paste was prepared, and then an electrode-attached substrate was prepared under the same conditions and procedures as in Example 1. Thus, the substrate with an electrode using the paste containing glass powder having a glass transition point of 340 ° C. and a basicity of 0.35 was defined as Example 2.

<Example 3>
Example 1 except that the lead-free glass frit in the conductive paste is Bi ₂ O ₃ —B ₂ O ₃ having an average particle size of 0.5 μm and a glass transition point of 320 ° C. and a basicity of 0.4. Similarly, a conductive paste was prepared, and then an electrode-attached substrate was prepared under the same conditions and procedures as in Example 1. A substrate with an electrode using a paste containing glass powder having a glass transition point of 320 ° C. and a basicity of 0.4 in this manner was designated as Example 3.

<Comparative Example 1>
Example 1 except that the lead-free glass frit in the conductive paste is Bi ₂ O ₃ —B ₂ O ₃ having an average particle size of 0.5 μm with a glass transition point of 455 ° C. and a basicity of 0.15. Similarly, a conductive paste was prepared, and then an electrode-attached substrate was prepared under the same conditions and procedures as in Example 1. Thus, a substrate with an electrode using a paste containing glass powder having a glass transition point of 455 ° C. and a basicity of 0.15 was defined as Comparative Example 1.

<Comparative example 2>
Example 1 except that the lead-free glass frit in the conductive paste is Bi ₂ O ₃ —B ₂ O ₃ with a glass transition point of 280 ° C. and a basicity of 0.45 and an average particle size of 0.5 μm. Similarly, a conductive paste was prepared, and then an electrode-attached substrate was prepared under the same conditions and procedures as in Example 1. Thus, the substrate with an electrode using the paste containing the glass powder having a glass transition point of 280 ° C. and a basicity of 0.45 was defined as Comparative Example 2.

<Comparison test and evaluation>
The film thickness of silicon nitride directly under each electrode of the substrates with electrodes in Examples 1 to 3, Comparative Example 1 and Comparative Example 2 was measured. This measurement was performed by polishing a cross section of each substrate and using a transmission electron microscope (TEM).

If the silicon nitride film is removed directly under the electrode, the glass layer thickness and glass composition at the electrode-substrate interface can be quantified using TEM and X-ray microanalyzer (EPMA) or Auger electron spectroscopy (AES). In accordance with the following calculation, the depth of the Si wafer that reacted with the glass and became SiO ₂ was determined.

The glass composition measured by TEM after firing was measured for Bi ₂ O ₃ (a mol%)-B ₂ O ₃ (100-a mol%), molecular weight M ₁ , specific gravity d ₁ g / cm ³ . Bi ₂ O ₃ (a / (100 + b) mol%)-B ₂ O ₃ ((100-a) / (100 + b) mol%)-SiO ₂ (b / (100 + b) mol%) From the composition, the amount of glass before firing is G (mol%) = a / (100 + b) + (100−a) / (100 + b) = 100 / (100 + b). The amount of SiO ₂ increased after firing is ΔG (mol%) = b / (100 + b).

Therefore, the molar ratio (G / ΔG) of the amount of glass before firing and the amount of SiO ₂ increased after firing is 100 / b (1).

When the molar ratio formula (1) is converted into a volume ratio, from the molecular weight M _{SiO2 of} SiO ₂ and the specific gravity d _SiO2 g / cm ³ ,
Equation (1) = (100 × M 1 × d SiO2) / (b × d 1 × M SiO2) ··· (2).

  Equation (2) is equivalent to the ratio of the thickness of the glass before firing and the thickness of the glass increased after firing, per unit area.

Here, D _fired is expressed by the following formula (3) from the thickness of the glass layer after firing.

D _fired = (thickness of glass layer before firing: D) + (thickness of SiO ₂ layer increased after firing: ΔD) = {formula (2) +1} × ΔD (3)
Therefore, from equation (3), the thickness of the SiO ₂ layer increased after firing: ΔD is
ΔD = D _fired / {(100 × M ₁ × d _SiO2 ) / (b × d ₁ × M _SiO2 ) +1} (4)
It becomes.

What we want to find is the depth of the Si wafer that has become SiO ₂ by firing: ΔD _Si , and therefore, from the specific gravity d _{Si of Si} ,
ΔD _Si = ΔD × d _{SiO 2} / d _Si (5)
It becomes.

The measurement result of the silicon nitride film thickness and the depth of the Si wafer that became SiO ₂ after firing calculated from the measurement were used as evaluation items. As for pass / fail, since the purpose is to obtain predetermined characteristics in actual solar cells, the presence or absence of the silicon nitride film is judged as bad and the case without it is good, and the depth of the Si wafer after the reaction is also good. Is less than 0.4 μm, which is the thickness of a general n layer, and is 0.4 μm or more. The case was considered bad. Furthermore, as a comprehensive evaluation, the above two evaluation items were judged good only when both passed, and others were judged as poor. These results are shown in Table 1.

表１から明らかなように、ガラス粉末のガラス転移点が３２０〜３７０℃の範囲内であり、かつ塩基度が０．３以上０．４以下である導電性組成物を用いた実施例１〜３にあっては、電極とｎ型半導体層の間に窒化ケイ素層が残存せず、かつｎ型半導体層への浸透も程度が少ないことが判る。

As is clear from Table 1, Examples 1 to 1 using a conductive composition having a glass transition point of 320 to 370 ° C. and a basicity of 0.3 to 0.4 in the glass powder. 3 indicates that the silicon nitride layer does not remain between the electrode and the n-type semiconductor layer, and the penetration into the n-type semiconductor layer is small.

In contrast, the glass transition point of the glass powder is 455 ° C. and the basicity is 0 . In Comparative Example 1, which is 15, the silicon nitride layer remains. This is thought to be due to the low basicity. On the other hand, the glass transition point of the glass powder is 280 ° C. and the basicity is 0 . In Comparative Example 2 which is 45, it can be seen that although the silicon nitride layer does not remain, the degree of penetration into the n-type semiconductor layer is large. This is considered due to the fact that the basicity is too large.

Therefore, when the glass powder does not contain PbO, a conductive composition having a glass transition point of 320 to 370 ° C. and a basicity of 0.3 to 0.4 is used. Thus, it can be seen that appropriate conductivity between the electrode penetrating the silicon nitride layer in the solar cell and the n-type semiconductor layer can be secured.

DESCRIPTION OF SYMBOLS 10 Solar cell 11 Silicon nitride layer 12 N-type semiconductor layer 13 Electrode 14 P-type semiconductor substrate

Claims (4)

performing an etching treatment with acid or alkali on the p-type semiconductor substrate to remove slice damage of the p-type semiconductor substrate;
Applying a texture etching process to the p-type semiconductor substrate to form a texture structure on the upper surface of the p-type semiconductor substrate;
Forming an n-type semiconductor layer on the upper surface of the p-type semiconductor substrate by thermally diffusing an n-type dopant on the upper surface of the p-type semiconductor substrate;
Forming a silicon nitride layer on the n-type semiconductor layer;
Printing the conductive composition on the silicon nitride layer in a linear or comb shape and drying;
Printing and drying a metal paste containing a metal other than Al and an Al paste on the lower surface of the p-type semiconductor substrate;
By firing the p-type semiconductor substrate having the printed conductive composition, metal paste and Al paste, the silicon nitride layer is penetrated to be electrically connected to the n-type semiconductor layer and beyond the n-type semiconductor layer. Forming an electrode that is not directly connected to the p-type semiconductor substrate, and forming a p + layer, an Al-Si alloy layer, a lead wire holder, and an aluminum back electrode.
The conductive composition includes a silver powder, a glass powder not containing PbO, and a vehicle made of an organic material, and a ratio of the silver powder in the composition is 70% by mass to 95% by mass, and the glass powder is 1 to 10 parts by mass with respect to 100 parts by mass of the silver powder, the basicity of the glass powder is 0.3 to 0.4 and the glass transition point is 320 ° C. to 370 ° C. The glass powder is a _binary glass of Bi ₂ O ₃ —B ₂ O ₃ , and the glass powder is one selected from the group consisting of TiO ₂ , SiO ₂ , Al ₂ O ₃ , ZrO ₂ and NiO. Or the manufacturing method of the photovoltaic cell characterized by including 2 or more types as a trace component, and the content in the said glass powder of the said trace component is more than 0 mol% and 5 mol% or less. a p-type semiconductor substrate; an n-type semiconductor layer formed on an upper surface of the p-type semiconductor substrate; a silicon nitride layer formed on the n-type semiconductor layer; and a nitridation formed by baking a conductive composition. Manufacture of a solar cell that forms a linear or comb-like electrode that penetrates a silicon layer and is electrically connected to the n-type semiconductor layer and that is not directly connected to the p-type semiconductor substrate across the n-type semiconductor layer A method,
The conductive composition includes a silver powder, a glass powder not containing PbO, and a vehicle made of an organic material, and a ratio of the silver powder in the composition is 70% by mass to 95% by mass, and the glass powder is 1 to 10 parts by mass with respect to 100 parts by mass of the silver powder, the basicity of the glass powder is 0.3 to 0.4 and the glass transition point is 320 ° C. to 370 ° C. The glass powder is a _binary glass of Bi ₂ O ₃ —B ₂ O ₃ , and the glass powder is one selected from the group consisting of TiO ₂ , SiO ₂ , Al ₂ O ₃ , ZrO ₂ and NiO. Or the manufacturing method of the photovoltaic cell characterized by including 2 or more types as a trace component, and the content in the said glass powder of the said trace component is more than 0 mol% and 5 mol% or less.   3. The method for manufacturing a solar cell according to claim 1, wherein the silicon nitride layer is formed to a thickness of 700 to 900 mm by plasma CVD, and a temperature during the baking or baking is set to 700 to 975 ° C. 4.   The manufacturing method of a solar cell module including the process of manufacturing a photovoltaic cell by the method of any one of Claim 1 thru | or 3.

Images