JP5371794B2 - Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an active ray-sensitive or radiation-sensitive resin composition which is excellent in sensitivity, resolution, roughness characteristics and aging stability and enables formation of a pattern of a good shape, and to provide a pattern forming method using the same. <P>SOLUTION: The active ray-sensitive or radiation-sensitive resin composition comprises: a resin including a repeating unit which decomposes by the action of an acid and generates sulfonic acid, the repeating unit having an acetal structure; and a compound which generates an acid by irradiation with active rays or radiation. <P>COPYRIGHT: (C)2011,JPO&amp;INPIT

Description

  The present invention relates to an actinic ray-sensitive or radiation-sensitive resin composition and a pattern forming method using the same. In particular, the present invention is suitable for an ultra-microlithography process applicable to a manufacturing process of a VLSI and a high-capacity microchip, a mold making process for nanoimprinting, a manufacturing process of a high-density information recording medium, and other photofabrication processes. The present invention relates to a composition used, and a pattern forming method using the composition.

  In the present invention, “active light” or “radiation” means, for example, an emission line spectrum of a mercury lamp, far ultraviolet rays represented by an excimer laser, extreme ultraviolet rays, X-rays, and electron beams. In the present invention, “light” means actinic rays or radiation.

  The chemically amplified resist composition generates an acid in the exposed area by irradiation with radiation such as far ultraviolet light, and the acid-catalyzed reaction changes the solubility of the active radiation irradiated area and non-irradiated area in the developer. And a pattern forming material for forming a pattern on the substrate.

  When a KrF excimer laser is used as an exposure light source, a resin having a basic skeleton of poly (hydroxystyrene) having a small absorption mainly in the 248 nm region is used as a main component. A pattern is formed, which is a better system than the conventional naphthoquinone diazide / novolak resin system.

On the other hand, when a further short wavelength light source, for example, an ArF excimer laser (193 nm) is used as an exposure light source, the compound having an aromatic group exhibits a large absorption in the 193 nm region. It wasn't.
For this reason, an ArF excimer laser resist containing a resin having an alicyclic hydrocarbon structure has been developed.

A triphenylsulfonium salt is generally known as an acid generator that is a main constituent of a chemically amplified resist (see, for example, Patent Document 1).
However, since the acid generators still have many inadequate points, it is desired to develop a photosensitive composition having improved sensitivity, resolution, pattern shape, roughness characteristics, etc. by improving the acid generator. ing.
In particular, roughness characteristics and resolution become more serious as the pattern dimensions are smaller. Therefore, in lithography using X-rays, electron beams, or EUV, since a fine pattern formation of several tens of nanometers is targeted, it is particularly required to have excellent resolution and roughness characteristics.

  In addition, when an electron beam, X-ray, EUV light source, or the like is used, exposure is performed under vacuum, so that low boiling point compounds such as solvents and resist materials decomposed by high energy volatilize and contaminate the exposure apparatus. Outgassing issues are becoming important. In recent years, various studies have been made on the reduction of outgas, and a radical trap that suppresses volatilization of a low-molecular compound by providing a topcoat layer (see, for example, Patent Document 2) or suppresses decomposition of a polymer. Various attempts such as adding an agent (see, for example, Patent Document 3) have been tried, and an contrivance for reducing outgas is also desired for an acid generator.

  Furthermore, Non-Patent Document 1 describes a photoresist using polymer acid amplifiers (Polymeric Acid Amplifiers). This polymer type acid proliferating agent includes a repeating unit that decomposes by the action of an acid to generate a sulfonic acid. And as this repeating unit, the structure using 2-hydroxy-3-pinanyl p-styrenesulfonate (2-hydroxy-3-pinanyl p-styrenesulfonate) as a monomer is employ | adopted.

  On the other hand, in recent years, in addition to lithography using excimer laser light, development using lithography using electron beams, X-rays, soft X-rays, or EUV light is also progressing. In addition, microfabrication with a resist composition is not only used directly in the manufacture of integrated circuits, but also recently applied to the production of so-called imprint mold structures (for example, Patent Documents 4 and 5). And Non-Patent Document 2). Therefore, even when using electron beam, X-ray, soft X-ray or EUV light as an exposure light source, it is important to satisfy high sensitivity, high resolution, good pattern shape and good roughness characteristics at the same time. It is a difficult issue and needs to be resolved.

US Pat. No. 6,548,221 European Patent No. 1480078 specification US Pat. No. 6,680,157 JP 2004-158287 A JP 2008-162101 A

Sang-Wook Park et al. “A Novel Photoresist Based on Polymeric Acid Amplifiers”, Chemistry Letters, 2000, p. 1036-1037. Yoshihiko Hirai (edited) "Nanoimprint Basics and Technology Development / Application Deployment-Nanoimprint Substrate Technology and Latest Technology Deployment" Frontier Publishing (issued in June 2006)

  The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition that is excellent in sensitivity, resolution, roughness characteristics and stability over time and can form a pattern having a good shape, and a pattern forming method using the same. For the purpose.

  For example, the present invention is as follows.

  (1) A resin containing a repeating unit that decomposes by the action of an acid to generate a sulfonic acid, wherein the repeating unit has a resin having an acetal structure and a compound that generates an acid upon irradiation with actinic rays or radiation An actinic ray-sensitive or radiation-sensitive resin composition.

(2) The composition according to (1), wherein at least a part of the repeating unit has a structure represented by the following general formula (I).

Where
Each of R _{1 to} R ₄ represents a hydrogen atom or a substituent. Two or more of R _{1 to} R ₄ may be bonded to each other to form a ring structure.
Each of R ₅ and R ₆ represents a substituent. R ₅ and R ₆ may be bonded to each other to form a cyclic acetal structure.

(3) The composition according to (2), wherein at least a part of the repeating unit is represented by the following general formula (II).

Where
Ra and Rb each independently represents a hydrogen atom, an alkyl group or a cyano group.

Rc represents a hydrogen atom or a substituent.
L represents a single bond or a linking group. When Rc is the substituent and L is the linking group, Rc and L may be bonded to each other to form a ring structure.
Each of R _{1 to} R ₄ represents a hydrogen atom or a substituent. Two or more of R _{1 to} R ₄ may be bonded to each other to form a ring structure.
Each of R ₅ and R ₆ represents a substituent. R ₅ and R ₆ may be bonded to each other to form a cyclic acetal structure.

(4) The composition according to any one of (1) to (3), wherein the resin further includes a repeating unit represented by the following general formula (VI).

In the formula, R ₀₁ and R ₀₂ each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group, or an alkoxycarbonyl group. R ₀₃ represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group, or an alkoxycarbonyl group, or is bonded to the following Ar ₁ to form a ring structure. Ar ₁ represents an aromatic ring group. n represents an integer of 1 to 4.

  (5) The composition according to any one of (1) to (4), which is exposed to an electron beam, an X-ray or EUV light.

  (6) A resist film formed using the composition according to any one of (1) to (5).

  (7) A pattern including forming a film using the composition according to any one of (1) to (5), exposing the film, and developing the exposed film Forming method.

  According to the present invention, there are provided an actinic ray-sensitive or radiation-sensitive resin composition that is excellent in sensitivity, resolution, roughness characteristics and stability over time and can form a pattern having a good shape, and a pattern forming method using the same. It becomes possible to do.

Hereinafter, embodiments of the present invention will be described in detail.
Here, the groups and atomic groups that do not explicitly indicate substitution or non-substitution include both those that do not have a substituent and those that have a substituent. For example, an “alkyl group” that does not clearly indicate substitution or unsubstituted is not only an alkyl group that does not have a substituent (unsubstituted alkyl group) but also an alkyl group that has a substituent (substituted alkyl group) Is also included.

  The actinic ray-sensitive or radiation-sensitive resin composition according to the present invention includes an acid proliferator-carrying resin and a compound that generates an acid upon irradiation with an actinic ray or radiation (hereinafter also referred to as a photoacid generator). Yes. Hereinafter, these will be described.

<Acid propagating agent-carrying resin>
The acid proliferator-carrying resin includes an acid proliferator unit. This acid proliferator unit is a repeating unit that decomposes by the action of an acid or by the action of an acid and heating to generate sulfonic acid. Further, this acid proliferator unit has an acetal structure.

  As described above, the composition according to the present invention includes an acid proliferator-carrying resin and a photoacid generator. Therefore, when the composition according to the present invention is irradiated with actinic rays or radiation, the photoacid generator generates an acid. At least a part of the acid growth agent unit contained in the acid growth agent-carrying resin is decomposed by the action of the acid generated from the photoacid generator or by the action of this acid and heating to generate sulfonic acid. Furthermore, other acid proliferator units are decomposed by the action of the generated sulfonic acid. Thereby, the other acid proliferator unit further generates sulfonic acid. In this way, each of the acid proliferator units can generate an acid in a chain.

The acid proliferator unit has an acetal structure as described above.
The present inventors have found that an acid proliferator-supporting resin including an acid proliferator unit having an acetal structure has higher acid proliferating ability and stability than conventional acid proliferators. The reason for this is not always clear, but the present inventors speculate as follows. That is, it is presumed that the excellent acid growth ability is due to the ease of acetal deprotection reaction and / or β elimination reaction in the presence of acid. In addition, it is estimated that the excellent stability is due to the high thermal stability of the acetal structure.

  Therefore, when an acid proliferator-supported resin including an acid proliferator unit having an acetal structure is used, a composition excellent in both sensitivity and stability over time can be obtained. In other words, this makes it possible to achieve both excellent sensitivity and excellent temporal stability.

This acid proliferator unit preferably has a structure represented by the following general formula (I).

In the formula, each of R _{1 to} R ₄ represents a hydrogen atom or a substituent. Two or more of R _{1 to} R ₄ may be bonded to each other to form a ring structure.
Each of R ₅ and R ₆ represents a substituent. R ₅ and R ₆ may be bonded to each other to form a cyclic acetal structure.

The structure represented by the general formula (I) can generate a sulfonic acid by the action of an acid. Although the mechanism is not necessarily clear, the present inventors consider that the reaction proceeds according to the following scheme. In the following scheme, the portion represented by “◯” means a binding site having a structure represented by the general formula (I).

Hereinafter, the structure represented by the general formula (I) will be described in detail.
First, R _{1 to} R ₄ will be described.

Each of R _{1 to} R ₄ represents a hydrogen atom or a substituent. Examples of the substituent include an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, a halogen atom, an alkoxy group, an aryloxy group, an alkanoyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, and an alkylsulfonyloxy group. , Arylsulfonyloxy group, alkylsulfonyl group, arylsulfonyl group, cyano group, alkylthioxy group, arylthioxy group and heterocyclic group.

Each of R _{1 to} R ₃ is preferably a hydrogen atom, an alkyl group, or an alkoxy group.
R ₄ is preferably a hydrogen atom, an alkyl group, an aryl group, or a cyano group.

  As the alkyl group, an alkyl group having 1 to 30 carbon atoms is preferable. For example, a methyl group, an ethyl group, a propyl group, a butyl group, a hexyl group, an octyl group, a decyl group, a dodecyl group, an ocdadecyl group, an isopropyl group, and an isobutyl group. , Sec-butyl group, t-butyl group, 1-ethylpentyl group, trifluoromethyl group, 2-ethylhexyl group, phenacyl group, 1-naphthoylmethyl group, 2-naphthoylmethyl group, 4-methylsulfanylphenacyl Group, 4-phenylsulfanylphenacyl group, 4-dimethylaminophenacyl group, 4-cyanophenacyl group, 4-methylphenacyl group, 2-methylphenacyl group, 3-fluorophenacyl group, 3-trifluoromethylphena A sil group and a 3-nitrophenacyl group are mentioned.

  The cycloalkyl group may have a monocyclic structure or a polycyclic structure. As the cycloalkyl group having a monocyclic structure, a cyclopentyl group, a cyclohexyl group, a cyclooctyl group and the like are preferable. As the cycloalkyl group having a polycyclic structure, a norbornyl group, a tricyclodecanyl group, a tetracyclodecanyl group, a tetracyclododecanyl group, an adamantyl group, and the like are preferable. A cycloalkyl group having 3 to 8 carbon atoms is preferred, and for example, a cyclopentyl group and a cyclohexyl group are more preferred.

  As an alkenyl group, a C2-C10 alkenyl group is preferable, for example, a vinyl group, an allyl group, a styryl group, etc. are mentioned.

  The alkynyl group is preferably an alkynyl group having 2 to 10 carbon atoms, and examples thereof include an ethynyl group, a propynyl group, and a propargyl group.

  The aryl group is preferably an aryl group having 6 to 30 carbon atoms, for example, a phenyl group, a biphenyl group, a 1-naphthyl group, a 2-naphthyl group, a 9-anthryl group, a 9-phenanthryl group, a 1-pyrenyl group, 5 -Naphthacenyl group, 1-indenyl group, 2-azurenyl group, 9-fluorenyl group, terphenyl group, quarterphenyl group, o-, m- and p-tolyl group, xylyl group, o-, m- and p-cumenyl Group, mesityl group, pentarenyl group, binaphthalenyl group, turnaphthalenyl group, quarternaphthalenyl group, heptaenyl group, biphenylenyl group, indacenyl group, fluoranthenyl group, acenaphthylenyl group, aceanthrylenyl group, phenalenyl group, fluorenyl group, anthryl group , Biantracenyl group, teranthracenyl group, quarter N-thracenyl group, anthraquinolyl group, phenanthryl group, triphenylenyl group, pyrenyl group, chrycenyl group, naphthacenyl group, preadenyl group, picenyl group, perylenyl group, pentaphenyl group, pentacenyl group, tetraphenylenyl group, hexaphenyl group, hexacenyl group , Rubicenyl group, coronenyl group, trinaphthylenyl group, heptaphenyl group, heptacenyl group, pyrantrenyl group, and oberenyl group.

  Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.

  Examples of the alkoxy group include a methoxy group, an ethoxy group, a propoxy group, an n-butoxy group, a trifluoromethoxy group, a hexyloxy group, a t-butoxy group, a 2-ethylhexyloxy group, a cyclohexyloxy group, a decyloxy group, and a dodecyloxy group. Is mentioned.

  Examples of the aryloxy group include phenyloxy group, 1-naphthyloxy group, 2-naphthyloxy group, tolyloxy group, methoxyphenyloxy group, naphthyloxy group, chlorophenyloxy group, trifluoromethylphenyloxy group, and cyanophenyloxy. Groups and nitrophenyloxy groups.

  The alkanoyl group is preferably an alkanoyl group having 2 to 20 carbon atoms. For example, acetyl group, propanoyl group, butanoyl group, trifluoromethylcarbonyl group, pentanoyl group, benzoyl group, 1-naphthoyl group, 2-naphthoyl group, 4 -Methylsulfanylbenzoyl group, 4-phenylsulfanylbenzoyl group, 4-dimethylaminobenzoyl group, 4-diethylaminobenzoyl group, 2-chlorobenzoyl group, 2-methylbenzoyl group, 2-methoxybenzoyl group, 2-butoxybenzoyl group, Examples include 3-chlorobenzoyl group, 3-trifluoromethylbenzoyl group, 3-cyanobenzoyl group, 3-nitrobenzoyl group, 4-fluorobenzoyl group, 4-cyanobenzoyl group and 4-methoxybenzoyl group.

  The alkoxycarbonyl group is preferably an alkoxycarbonyl group having 2 to 20 carbon atoms, for example, a methoxycarbonyl group, an ethoxycarbonyl group, a propoxycarbonyl group, a butoxycarbonyl group, a hexyloxycarbonyl group, an octyloxycarbonyl group, a decyloxycarbonyl group. , Octadecyloxycarbonyl group and trifluoromethyloxycarbonyl group.

  Examples of the aryloxycarbonyl group include phenoxycarbonyl group, 1-naphthyloxycarbonyl group, 2-naphthyloxycarbonyl group, 4-methylsulfanylphenyloxycarbonyl group, 4-phenylsulfanylphenyloxycarbonyl group, 4-dimethylaminophenyl. Oxycarbonyl group, 4-diethylaminophenyloxycarbonyl group, 2-chlorophenyloxycarbonyl group, 2-methylphenyloxycarbonyl group, 2-methoxyphenyloxycarbonyl group, 2-butoxyphenyloxycarbonyl group, 3-chlorophenyloxycarbonyl group, 3-trifluoromethylphenyloxycarbonyl group, 3-cyanophenyloxycarbonyl group, 3-nitrophenyloxycarbonyl group, 4-fluorophenyl Alkoxycarbonyl group, 4-cyanophenyl oxycarbonyl group and a 4-methoxyphenyl oxycarbonyl group.

  As the alkylsulfonyloxy group, an alkylsulfonyloxy group having 1 to 20 carbon atoms is preferable. For example, a methylsulfonyloxy group, an ethylsulfonyloxy group, a propylsulfonyloxy group, an isopropylsulfonyloxy group, a butylsulfonyloxy group, a hexylsulfonyloxy group. Group, cyclohexylsulfonyloxy group, octylsulfonyloxy group, 2-ethylhexylsulfonyloxy group, decanoylsulfonyloxy group, dodecanoylsulfonyloxy group, octadecanoylsulfonyloxy group, cyanomethylsulfonyloxy group, methoxymethylsulfonyloxy group and A perfluoroalkylsulfonyloxy group may be mentioned.

  The arylsulfonyloxy group is preferably an arylsulfonyloxy group having 6 to 30 carbon atoms. For example, a phenylsulfonyloxy group, a 1-naphthylsulfonyloxy group, a 2-naphthylsulfonyloxy group, a 2-chlorophenylsulfonyloxy group, 2- Methylphenylsulfonyloxy group, 2-methoxyphenylsulfonyloxy group, 2-butoxyphenylsulfonyloxy group, 3-chlorophenylsulfonyloxy group, 3-trifluoromethylphenylsulfonyloxy group, 3-cyanophenylsulfonyloxy group, 3-nitro Phenylsulfonyloxy group, 4-fluorophenylsulfonyloxy group, 4-cyanophenylsulfonyloxy group, 4-methoxyphenylsulfonyloxy group, 4-methylsulfanylphenylsulfonate Oxy group, and a 4-phenylsulfanyl-phenyl sulfonyloxy group and a 4-dimethylaminophenyl sulfonyloxy group.

  As the alkylsulfonyl group, an alkylsulfonyl group having 1 to 20 carbon atoms is preferable. For example, a methylsulfonyl group, an ethylsulfonyl group, a propylsulfonyl group, an isopropylsulfonyl group, a butylsulfonyl group, a hexylsulfonyl group, a cyclohexylsulfonyl group, an octylsulfonyl group. Group, 2-ethylhexylsulfonyl group, decanoylsulfonyl group, dodecanoylsulfonyl group, octadecanoylsulfonyl group, cyanomethylsulfonyl group, methoxymethylsulfonyl group and perfluoroalkylsulfonyl group.

  The arylsulfonyl group is preferably an arylsulfonyl group having 6 to 30 carbon atoms, such as a phenylsulfonyl group, 1-naphthylsulfonyl group, 2-naphthylsulfonyl group, 2-chlorophenylsulfonyl group, 2-methylphenylsulfonyl group, 2 -Methoxyphenylsulfonyl group, 2-butoxyphenylsulfonyl group, 3-chlorophenylsulfonyl group, 3-trifluoromethylphenylsulfonyl group, 3-cyanophenylsulfonyl group, 3-nitrophenylsulfonyl group, 4-fluorophenylsulfonyl group, 4 -Cyanophenylsulfonyl group, 4-methoxyphenylsulfonyl group, 4-methylsulfanylphenylsulfonyl group, 4-phenylsulfanylphenylsulfonyl group and 4-dimethylaminophenylsulfonyl group It is.

  Examples of the alkylthioxy group include a methylthioxy group, an ethylthioxy group, a propylthioxy group, an n-butylthioxy group, a trifluoromethylthioxy group, a hexylthioxy group, a t-butylthioxy group, a 2-ethylhexylthioxy group, and a cyclohexylthio group. Examples include an oxy group, a decylthioxy group, and a dodecylthioxy group.

  Examples of the arylthioxy group include phenylthioxy group, 1-naphthylthioxy group, 2-naphthylthioxy group, tolyltyoxy group, methoxyphenylthioxy group, naphthylthioxy group, chlorophenylthioxy group, and trifluoromethyl. Examples thereof include a phenylthioxy group, a cyanophenylthioxy group, and a nitrophenylthioxy group.

  The heterocyclic group is preferably an aromatic or aliphatic heterocyclic group containing a nitrogen atom, oxygen atom, sulfur atom or phosphorus atom. Examples of this heterocyclic group include a thienyl group, a benzo [b] thienyl group, a naphtho [2,3-b] thienyl group, a thiantenyl group, a furyl group, a pyranyl group, an isobenzofuranyl group, a chromenyl group, and a xanthenyl group. Phenoxathiinyl group, 2H-pyrrolyl group, pyrrolyl group, imidazolyl group, pyrazolyl group, pyridyl group, pyrazinyl group, pyrimidinyl group, pyridazinyl group, indolizinyl group, isoindolyl group, 3H-indolyl group, indolyl group, 1H-indazolyl Group, prynyl group, 4H-quinolidinyl group, isoquinolyl group, quinolyl group, phthalazinyl group, naphthyridinyl group, quinoxanilyl group, quinazolinyl group, cinnolinyl group, pteridinyl group, 4aH-carbazolyl group, carbazolyl group, β-carbolinyl group, phenanthridine Le group, Cridinyl, perimidinyl, phenanthrolinyl, phenazinyl, phenalsadinyl, isothiazolyl, phenothiazinyl, isoxazolyl, furazanyl, phenoxazinyl, isochromanyl, chromanyl, pyrrolidinyl, pyrrolinyl, imidazolidinyl, imidazolidinyl Group, pyrazolidinyl group, pyrazolinyl group, piperidyl group, piperazinyl group, indolinyl group, isoindolinyl group, quinuclidinyl group, morpholinyl group and thioxanthryl group.

Examples of the substituent that any of R _{1 to} R ₄ may have include, for example, halogen atoms such as fluorine atom, chlorine atom, bromine atom and iodine atom; alkoxy groups such as methoxy group, ethoxy group and tert-butoxy group; Aryloxy groups such as phenoxy group and p-tolyloxy group; alkoxycarbonyl groups such as methoxycarbonyl group, butoxycarbonyl group and phenoxycarbonyl group; acyloxy groups such as acetoxy group, propionyloxy group and benzoyloxy group; acetyl group, benzoyl group Acyl groups such as isobutyryl group, acryloyl group, methacryloyl group and methoxalyl group; alkylsulfanyl groups such as methylsulfanyl group and tert-butylsulfanyl group; arylsulfuryl groups such as phenylsulfanyl group and p-tolylsulfanyl group Nyl group; alkylamino group such as methylamino group and cyclohexylamino group; dialkylamino group such as dimethylamino group, diethylamino group, morpholino group and piperidino group; arylamino group such as phenylamino group and p-tolylamino group; methyl group Alkyl groups such as ethyl group, tert-butyl group and dodecyl group; aryl groups such as phenyl group, p-tolyl group, xylyl group, cumenyl group, naphthyl group, anthryl group and phenanthryl group; hydroxy group; carboxy group; formyl Group; mercapto group; sulfo group; mesyl group; p-toluenesulfonyl group; amino group; nitro group; cyano group; trifluoromethyl group; trichloromethyl group; trimethylsilyl group; phosphinico group; Sulfoniumyl Groups, as well as the triphenylphenacylphosphoniumyl group.

As described above, two or more of R _{1 to} R ₄ may be bonded to each other to form a ring structure. This ring structure may be an aliphatic or aromatic hydrocarbon ring or a heterocycle containing a hetero atom. Further, these R _{1 to} R ₄ may form a condensed ring.

  Examples of the aliphatic or aromatic hydrocarbon ring include those having a 6-membered, 5-membered or 7-membered ring structure. This hydrocarbon ring preferably has a 6-membered or 5-membered ring structure, and particularly preferably has a 5-membered ring structure.

  Examples of the heterocyclic ring include those containing a sulfur atom, oxygen atom or nitrogen atom as a hetero atom. As this heterocyclic ring, those containing a sulfur atom as a hetero atom are more preferred.

  As a condensed ring, the condensed ring which consists only of hydrocarbon rings is mentioned, for example. Examples of the polycyclic fused ring include those in which 2 to 4 benzene rings form a condensed ring and those in which a benzene ring and a 5-membered unsaturated ring form a condensed ring.

  The condensed ring may be a condensed ring containing at least one heterocyclic ring. Examples of this condensed ring include those in which a benzene ring and a 5-membered heterocyclic ring form a condensed ring, and those in which a benzene ring and a 6-membered heterocyclic ring form a condensed ring.

Examples of the ring structure that R _{1 to} R ₄ can form include, for example, benzene ring, naphthalene ring, anthracene ring, phenanthrene ring, fluorene ring, triphenylene ring, naphthacene ring, biphenyl ring, pyrrole ring, furan ring, thiophene ring, dithiolane. Ring, oxirane, dioxirane ring, thiirane ring, pyrrolidine ring, piperidine ring, imidazole ring, isoxazole ring, benzodithiol ring, oxazole ring, thiazole ring, benzothiazole ring, benzimidazole ring, benzoxazole ring, pyridine ring, pyrazine ring , Pyrimidine ring, pyridazine ring, indolizine ring, indole ring, benzofuran ring, benzothiophene ring, benzodithiol ring, isobenzofuran ring, quinolidine ring, quinoline ring, phthalazine ring, naphthyridine ring, quinoxaline ring Quinazoline ring, an isoquinoline ring, a carbazole ring, a phenanthridine ring, an acridine ring, a phenanthroline ring, thianthrene ring, chromene ring, xanthene ring, phenoxathiin ring, include phenothiazine ring and a phenazine ring. Among these, a dithiolane ring, a benzodithiol ring, a benzothiazole ring, a benzimidazole ring, and a benzoxazole ring are particularly preferable.

Examples of R _{1 to} R ₄ in the general formula (1) include those described in the following chemical formula.

Next, R ₅ and R ₆ will be described.
In formula (I), each of R ₅ and R ₆ represents a substituent. As this substituent, an organic group and a silyl group are mentioned, for example. Examples of the organic group include an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, an alkanoyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an alkylsulfonyl group, an arylsulfonyl group, an alkylthiocarbonyl group, and an arylthio group. Examples include a carbonyl group and a dialkylaminocarbonyl group. These organic groups may further have a substituent.

Each of R ₅ and R ₆ is preferably an alkyl group. Further, as described later, it is more preferable that R ₅ and R ₆ are bonded to each other to form a cyclic acetal structure.

As the alkyl group, cycloalkyl group, alkenyl group, alkynyl group, aryl group, alkanoyl group, alkoxycarbonyl group, aryloxycarbonyl group, alkylsulfonyl group, arylsulfonyl group, alkylthiocarbonyl group and arylthiocarbonyl group, for example, Are the same as those enumerated for R _{1 to} R ₄ .

  Examples of the dialkylaminocarbonyl group which may have a substituent include a dimethylaminocarbonyl group, a dimethylaminocarbonyl group, a dipropylaminocarbonyl group, and a dibutylaminocarbonyl group.

R ₅ and R ₆ are preferably bonded to each other to form a cyclic acetal structure. In this way, the outgas performance can be further improved. This cyclic acetal structure may have an aliphatic or aromatic hydrocarbon ring or a heterocyclic ring containing a hetero atom as a substituent. These hydrocarbon rings and / or heterocycles may form a condensed ring with the cyclic acetal.

  Examples of the aliphatic or aromatic hydrocarbon ring include those having a 6-membered, 5-membered or 7-membered ring structure. This hydrocarbon ring preferably has a 6-membered or 5-membered ring structure, and particularly preferably has a 5-membered ring structure.

  Examples of the heterocyclic ring include those containing a sulfur atom, oxygen atom or nitrogen atom as a hetero atom. As this heterocyclic ring, those containing a sulfur atom as a hetero atom are more preferred.

  As a condensed ring, the condensed ring which consists only of hydrocarbon rings is mentioned, for example. Examples of the condensed ring include those in which 2 to 4 benzene rings form a condensed ring and those in which a benzene ring and a 5-membered unsaturated ring form a condensed ring.

  The condensed ring may be a condensed ring containing at least one heterocyclic ring. Examples of this condensed ring include those in which a benzene ring and a 5-membered heterocyclic ring form a condensed ring, and those in which a benzene ring and a 6-membered heterocyclic ring form a condensed ring.

Examples of the ring structure that R ₅ and R ₆ can form include, for example, a benzene ring, naphthalene ring, anthracene ring, phenanthrene ring, fluorene ring, triphenylene ring, naphthacene ring, biphenyl ring, pyrrole ring, furan ring, thiophene ring, Dithiolane, oxirane, dioxirane, thiirane, pyrrolidine, piperidine, imidazole, isoxazole, benzodithiol, oxazole, thiazole, benzothiazole, benzimidazole, benzoxazole, pyridine, pyrazine Ring, pyrimidine ring, pyridazine ring, indolizine ring, indole ring, benzofuran ring, benzothiophene ring, benzodithiol ring, isobenzofuran ring, quinolidine ring, quinoline ring, phthalazine ring, naphthyridine ring, quinoxaline ring Quinazoline ring, an isoquinoline ring, a carbazole ring, a phenanthridine ring, an acridine ring, a phenanthroline ring, thianthrene ring, chromene ring, xanthene ring, phenoxathiin ring, include phenothiazine ring and a phenazine ring. Among these, a dithiolane ring, a benzodithiol ring, a benzothiazole ring, a benzimidazole ring, and a benzoxazole ring are particularly preferable.

As R < ₅ > and R < ₆ > in General formula (1), what is described in the following chemical formula is mentioned, for example.

At least a part of the acid proliferator unit is preferably a repeating unit represented by the following general formula (II). That is, at least a part of the acid proliferator unit preferably includes the structure represented by the general formula (I) in the form represented by the following general formula (II).

In general formula (II), Ra and Rb each independently represent a hydrogen atom, an alkyl group, or a cyano group.
Rc represents a hydrogen atom or a substituent. L represents a single bond or a linking group. When Rc is the substituent and L is the linking group, Rc and L may be bonded to each other to form a ring structure.
Each of R _{1 to} R _{6 has} the same meaning as described for the general formula (I).

  When at least a part of the acid proliferator unit is a repeating unit represented by the general formula (II), the sulfonic acid can be generated in a form bound to the resin. Accordingly, in this case, diffusion of the generated sulfonic acid in the composition is difficult to occur. Therefore, in this case, the resolution and roughness characteristics of the actinic ray-sensitive or radiation-sensitive resin composition can be further improved.

  Each of Ra and Rb represents a hydrogen atom, an alkyl group, or a cyano group as described above. This alkyl group may further have a substituent. As this substituent, halogen atoms, such as a fluorine atom and a chlorine atom, and a hydroxy group are mentioned, for example. Examples of the alkyl group for Ra or Rb include a methyl group, a chloromethyl group, a trifluoromethyl group, and a hydroxymethyl group. Each of Ra and Rb is preferably a hydrogen atom or a methyl group, and more preferably a hydrogen atom.

  Rc represents a hydrogen atom or a substituent as described above. Examples of the substituent include a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, an alkanoyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an alkylsulfonyl group, an arylsulfonyl group, and an alkylthiocarbonyl group. , Arylthiocarbonyl group, heterocyclic group, (di) alkylaminocarbonyl group, and aminothiocarbonyl group.

L represents a single bond or a linking group as described above.
This linking group is preferably a single bond, an arylene group, an alkylene group, a cycloalkylene group, —O—, —S—, —SO ₂ —, —CO—, —N (R ₃₃ ) — or a combination thereof. is there. This linking group is more preferably a single bond, an arylene group, an alkylene group, —O—, —SO ₂ —, —CO—, —N (R ₃₃ ) —, or a combination thereof. Here, R ₃₃ represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an aryl group or an aralkyl group.

  Rc and L may be bonded to each other to form a ring structure. Examples of the ring structure include monocyclic hydrocarbons, condensed polycyclic hydrocarbons, and heterocyclic rings.

Ra, Rb, Rc and L in the general formula (II) are preferably the following general formulas (III-1), (III-2), (III-3), (IV-1) and (IV-2). Or it has the structure shown to (V-1). Among these, the structure represented by the general formula (III-1) or (III-2) is particularly preferable.

Where
Ar _1a represents an arylene group.
R ₀₁ represents a hydrogen atom, an alkyl group, or a cyano group. This alkyl group may further have a substituent. As this substituent, halogen atoms, such as a fluorine atom and a chlorine atom, are mentioned, for example. Examples of the alkyl group for R ₀₁ include a methyl group, a chloromethyl group, and a trifluoromethyl group. R ₀₁ is preferably a hydrogen atom or a methyl group, and more preferably a hydrogen atom.

Each of R ₀₂ and R ₀₂₁ represents a single bond or a divalent linking group. The divalent linking group is, for example, an arylene group, an alkylene group, a cycloalkylene group, —O—, —S—, —SO ₂ —, —CO—, —N (R ₃₃ ) —, or a combination thereof. . Here, R ₃₃ represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an aryl group or an aralkyl group.

The arylene group as R ₀₂ or R ₀₂₁ preferably has 6 to 14 carbon atoms, and specific examples include a phenylene group, a tolylene group, and a naphthylene group. This arylene group may further have a substituent.

The alkylene group as R ₀₂ or R ₀₂₁ is preferably an alkylene group having 1 to 8 carbon atoms such as a methylene group, an ethylene group, a propylene group, a butylene group, a hexylene group and an octylene group. This alkylene group may further have a substituent.

The cycloalkylene group as R ₀₂ or R ₀₂₁ is preferably a cycloalkylene group having 5 to 8 carbon atoms such as a cyclopentylene group and a cyclohexylene group. This cycloalkylene group may further have a substituent.

R ₀₃ and R ₀₁₉ each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group or an aralkyl group.

The alkyl group as R ₀₃ or R ₀₁₉ is preferably a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, a sec-butyl group, a hexyl group, a 2-ethylhexyl group, an octyl group, and a dodecyl group. Has a carbon number of 20 or less, more preferably a carbon number of 8 or less.

The cycloalkyl group as R ₀₃ or R ₀₁₉ may be monocyclic or polycyclic. Examples of the cycloalkyl group include monocyclic cycloalkyl groups having 3 to 8 carbon atoms such as a cyclopropyl group, a cyclopentyl group, and a cyclohexyl group.

The aryl group as R ₀₃ or R ₀₁₉ preferably has 6 to 15 carbon atoms. Examples of such an aryl group include a phenyl group, a tolyl group, a naphthyl group, and an anthryl group.

The aralkyl group as R ₀₃ or R ₀₁₉ is preferably one having 6 to 20 carbon atoms. Examples of such aralkyl groups include a benzyl group and a phenethyl group.

  Each of these alkyl group, cycloalkyl group, aryl group and aralkyl group may have a substituent. Examples of the substituent include a hydroxyl group; a halogen atom such as fluorine, chlorine, bromine and iodine atoms; a nitro group; a cyano group; an amide group; a sulfonamide group; a methyl group, an ethyl group, a propyl group, an isopropyl group, n- Alkyl groups such as butyl, sec-butyl, hexyl, 2-ethylhexyl, octyl and dodecyl; alkoxy groups such as methoxy, ethoxy, hydroxyethoxy, propoxy, hydroxypropoxy and butoxy; Examples include alkoxycarbonyl groups such as methoxycarbonyl group and ethoxycarbonyl group; acyl groups such as formyl group, acetyl group and benzoyl group; acyloxy groups such as acetoxy group and butyryloxy group, and carboxy group. These substituents preferably have 8 or less carbon atoms.

The arylene group as Ar _1a is preferably one having 6 to 14 carbon atoms. Examples of such an arylene group include a phenylene group, a tolylene group, and a naphthylene group.

This arylene group may have a substituent. Examples of the substituent include those similar to those listed above for R ₀₃ and R ₀₁₉ .

As a preferable partial structure of general formula (II), the following are mentioned, for example.

Hereinafter, specific examples of the polymerizable compound corresponding to the acid proliferator unit will be given, but the scope of the present invention is not limited thereto.

  The content of the acid proliferating agent unit in the acid proliferating agent-supporting resin is preferably in the range of 3 to 80 mol%, and preferably in the range of 5 to 70 mol%, based on all repeating units. More preferably, it is particularly preferably in the range of 7 to 60 mol%.

  As a method for producing an acid proliferator monomer corresponding to an acid proliferator unit, a corresponding alcohol compound and a sulfonyl halide or sulfonic anhydride having a polymerizable group are used in the presence of a base (for example, triethylamine or pyridine). In an inert solvent such as THF, DMF and acetonitrile or a basic solvent such as pyridine. As reaction temperature, -10-60 degreeC is preferable.

  Further, by using an alkylsulfonyl halide, an arylsulfonyl halide, or the like as the sulfonyl halide, various corresponding acid proliferator monomers can be synthesized.

  It is preferable that the acid proliferator-carrying resin further includes the following repeating units in addition to the acid proliferator unit described above. That is, the acid proliferator-carrying resin contains (A) an acid-decomposable unit, (B) an alkali-soluble unit, (C) a repeating unit having an alicyclic hydrocarbon structure substituted with a polar group, and / or (D) development. It is preferable to further include a repeating unit having an auxiliary group. Hereinafter, these repeating units will be described in order.

(A) Acid-decomposable unit An acid-decomposable unit is a repeating unit containing a group (hereinafter referred to as an acid-decomposable group) that decomposes by the action of an acid to generate an alkali-soluble group.

  Examples of the acid-decomposable group include those in which a hydrogen atom of an alkali-soluble group such as a —COOH group and a —OH group is substituted with a group capable of leaving by the action of an acid.

  Examples of the group capable of leaving by the action of an acid include -C (R36) (R37) (R38), -C (= O) -OC (R36) (R37) (R38), -C (R01). The groups represented by (R02) (OR39), -C (R01) (R02) -C (= O) -OC (R36) (R37) (R38), and -CH (R36) (Ar) Can be mentioned.

In the formula, R36 to R39 each independently represents an alkyl group, a cycloalkyl group, an aryl group, an aralkyl group or an alkenyl group. R36 and R37 may be bonded to each other to form a ring.
R01 to R02 each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, an aralkyl group or an alkenyl group.
Ar represents an aryl group.

As an acid-decomposable unit, the repeating unit represented by the following general formula (IA) is mentioned, for example.

Where
R ₀₁ and R ₀₂ each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group.
R ₀₃ represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group, or an alkoxycarbonyl group, or is bonded to the following Ar ₁ to form a ring structure.
Ar ₁ represents an aromatic ring group.
n Y's each independently represent a hydrogen atom or a group capable of leaving by the action of an acid. However, at least one of Y represents a group capable of leaving by the action of an acid.
n represents an integer of 1 to 4, preferably 1 to 2, and more preferably 1.

Examples of the alkyl group as R _{01 to} R ₀₃ include a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, a sec-butyl group, a hexyl group, a 2-ethylhexyl group, an octyl group, and a dodecyl group. An alkyl group having 20 or less carbon atoms, preferably an alkyl group having 8 or less carbon atoms. These alkyl groups may have a substituent.

The alkyl group contained in the alkoxycarbonyl group as R _{01 to} R ₀₃ is, for example, the same as the alkyl group as R _{01 to} R ₀₃ described above.

The cycloalkyl group as R _{01 to} R ₀₃ may be monocyclic or polycyclic. As this cycloalkyl group, Preferably, C3-C8 monocyclic cycloalkyl groups, such as a cyclopropyl group, a cyclopentyl group, and a cyclohexyl group, are mentioned. These cycloalkyl groups may have a substituent.

  As a halogen atom, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom are mentioned, for example. Among these, a fluorine atom is particularly preferable.

Examples of the ring structure that can be formed by combining R ₀₃ and Ar ₁ include a 5-membered ring or a 6-membered ring structure.

The aromatic ring group as Ar ₁ preferably has 6 to 14 carbon atoms, and specific examples include a benzene ring group and a naphthalene ring group.

  As described above, at least one of the n Ys represents a group that is eliminated by the action of an acid. Examples of the group leaving by the action of an acid include -C (R36) (R37) (R38), -C (= O) -OC (R36) (R37) (R38), -C (R01). ) (R02) (OR39), -C (R01) (R02) -C (= O) -OC (R36) (R37) (R38), and -CH (R36) (Ar) Is mentioned.

In the formula, R36 to R39 each independently represents an alkyl group, a cycloalkyl group, an aryl group, an aralkyl group or an alkenyl group. R36 and R37 may be bonded to each other to form a ring.
R01 to R02 each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, an aralkyl group or an alkenyl group.
Ar represents an aryl group.

  The alkyl group as R36 to R39, R01, or R02 is preferably an alkyl group having 1 to 8 carbon atoms, such as a methyl group, an ethyl group, a propyl group, an n-butyl group, a sec-butyl group, A xyl group and an octyl group are mentioned.

  The cycloalkyl group as R36 to R39, R01, or R02 may be a monocyclic cycloalkyl group or a polycyclic cycloalkyl group. The monocyclic cycloalkyl group is preferably a cycloalkyl group having 3 to 8 carbon atoms, and examples thereof include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, and a cyclooctyl group. The polycyclic cycloalkyl group is preferably a cycloalkyl group having 6 to 20 carbon atoms, such as an adamantyl group, norbornyl group, isobornyl group, camphanyl group, dicyclopentyl group, α-pinel group, tricyclodecanyl group, A tetracyclododecyl group and an androstanyl group are mentioned. A part of carbon atoms in the cycloalkyl group may be substituted with a hetero atom such as an oxygen atom.

  The aryl group as R36 to R39, R01, R02, or Ar is preferably an aryl group having 6 to 10 carbon atoms, and examples thereof include a phenyl group, a naphthyl group, and an anthryl group.

  The aralkyl group as R36 to R39, R01, or R02 is preferably an aralkyl group having 7 to 12 carbon atoms, and for example, a benzyl group, a phenethyl group, and a naphthylmethyl group are preferable.

  The alkenyl group as R36 to R39, R01, or R02 is preferably an alkenyl group having 2 to 8 carbon atoms, and examples thereof include a vinyl group, an allyl group, a butenyl group, and a cyclohexenyl group.

  The ring that R36 and R37 may be bonded to each other may be monocyclic or polycyclic. The monocyclic type is preferably a cycloalkane structure having 3 to 8 carbon atoms, and examples thereof include a cyclopropane structure, a cyclobutane structure, a cyclopentane structure, a cyclohexane structure, a cycloheptane structure, and a cyclooctane structure. As the polycyclic type, a cycloalkane structure having 6 to 20 carbon atoms is preferable, and examples thereof include an adamantane structure, a norbornane structure, a dicyclopentane structure, a tricyclodecane structure, and a tetracyclododecane structure. Note that some of the carbon atoms in the ring structure may be substituted with a heteroatom such as an oxygen atom.

  Each of the above groups may have a substituent. Examples of the substituent include alkyl groups, cycloalkyl groups, aryl groups, amino groups, amide groups, ureido groups, urethane groups, hydroxy groups, carboxy groups, halogen atoms, alkoxy groups, thioether groups, acyl groups, and acyloxy groups. , Alkoxycarbonyl group, cyano group and nitro group. These substituents preferably have 8 or less carbon atoms.

As the group capable of leaving by the action of an acid, a structure represented by the following general formula (IIA) is more preferable.

In the formula, L ₁ and L ₂ each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group or an aralkyl group.
M represents a single bond or a divalent linking group.
Q represents an alkyl group, a cycloalkyl group, an alicyclic group, an aromatic ring group, an amino group, an ammonium group, a mercapto group, a cyano group, or an aldehyde group. In addition, these alicyclic groups and aromatic ring groups may contain a hetero atom.
In addition, at least two of Q, M, and L ₁ may be bonded to each other to form a 5-membered or 6-membered ring.

The alkyl group as L ₁ and L ₂ is, for example, an alkyl group having 1 to 8 carbon atoms, and specifically includes a methyl group, an ethyl group, a propyl group, an n-butyl group, a sec-butyl group, a hexyl group, and An octyl group is mentioned.

The cycloalkyl group as L ₁ and L ₂ is, for example, a cycloalkyl group having 3 to 15 carbon atoms, and specific examples include a cyclopentyl group, a cyclohexyl group, a norbornyl group, and an adamantyl group.

The aryl group as L ₁ and L ₂ is, for example, an aryl group having 6 to 15 carbon atoms, and specifically includes a phenyl group, a tolyl group, a naphthyl group, and an anthryl group.

The aralkyl group as L ₁ and L ₂ is, for example, an aralkyl group having 6 to 20 carbon atoms, and specific examples include a benzyl group and a phenethyl group.

The divalent linking group as M is, for example, an alkylene group (for example, methylene group, ethylene group, propylene group, butylene group, hexylene group or octylene group), cycloalkylene group (for example, cyclopentylene group or cyclohexylene group). ), an alkenylene group (e.g., an ethylene group, a propenylene group or a butenylene group), an arylene group (e.g., phenylene, tolylene or naphthylene group), - S -, - O -, - CO -, - SO 2 -, - N (R ₀ ) — or a combination of two or more thereof. Here, R ₀ is a hydrogen atom or an alkyl group. The alkyl group as R ₀ is, for example, an alkyl group having 1 to 8 carbon atoms, and specifically includes a methyl group, an ethyl group, a propyl group, an n-butyl group, a sec-butyl group, a hexyl group, and an octyl group. Can be mentioned.

The alkyl group and cycloalkyl group as Q are the same as the above-described groups as L ₁ and L ₂ .

Examples of the alicyclic group or aromatic ring group as Q include the cycloalkyl group and aryl group as L ₁ and L ₂ described above. These cycloalkyl group and aryl group are preferably groups having 3 to 15 carbon atoms.

  Examples of the alicyclic group or aromatic ring group containing a hetero atom as Q include thiirane, cyclothiolane, thiophene, furan, pyrrole, benzothiophene, benzofuran, benzopyrrole, triazine, imidazole, benzimidazole, triazole, thiadiazole, thiazole. And a group having a heterocyclic structure such as pyrrolidone. However, the ring is not limited to these as long as it is a ring formed of carbon and a heteroatom, or a ring formed only of a heteroatom.

Examples of the ring structure that can be formed by bonding at least two of Q, M, and L ₁ to each other include a 5-membered or 6-membered ring structure in which these form a propylene group or a butylene group. This 5-membered or 6-membered ring structure contains an oxygen atom.

Each group represented by L ₁ , L ₂ , M and Q in the general formula (IIA) may have a substituent. Examples of the substituent include alkyl groups, cycloalkyl groups, aryl groups, amino groups, amide groups, ureido groups, urethane groups, hydroxy groups, carboxy groups, halogen atoms, alkoxy groups, thioether groups, acyl groups, and acyloxy groups. , Alkoxycarbonyl group, cyano group and nitro group. These substituents preferably have 8 or less carbon atoms.

  The group represented by-(MQ) is preferably a group having 1 to 30 carbon atoms, and more preferably a group having 5 to 20 carbon atoms.

Specific examples of the repeating unit represented by the general formula (IA) are shown below, but are not limited thereto.

Further, as the acid-decomposable unit, a repeating unit represented by the following general formula (X) can also be adopted.

Where
Xa ₁ represents a hydrogen atom, a methyl group, a trifluoromethyl group or a hydroxymethyl group.
T represents a single bond or a divalent linking group.
Rx ₁ to Rx ₃ independently represents a linear or branched alkyl group, or a cycloalkyl group of monocyclic or polycyclic ring. In addition, at least two of Rx _{1 to} Rx ₃ may be bonded to each other to form a monocyclic or polycyclic cycloalkyl group.

  Examples of the divalent linking group as T include an alkylene group, a-(COO-Rt)-group, and a-(O-Rt)-group. Here, Rt represents an alkylene group or a cycloalkylene group.

T is preferably a single bond or a-(COO-Rt)-group. Here, Rt is preferably an alkylene group having 1 to 5 carbon atoms, more preferably a —CH ₂ — group or a — (CH ₂ ) ₃ — group.

The alkyl group as Rx _{1 to} Rx ₃ is preferably an alkyl group having 1 to 4 carbon atoms such as methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group and t-butyl group. It is.

The cycloalkyl group as Rx _{1 to} Rx ₃ is preferably a monocyclic cycloalkyl group such as a cyclopentyl group and a cyclohexyl group, or a norbornyl group, a tetracyclodecanyl group, a tetracyclododecanyl group and an adamantyl group. It is a polycyclic cycloalkyl group.

Examples of the cycloalkyl group that can be formed by combining at least two of Rx _{1 to} Rx ₃ with each other include a monocyclic cycloalkyl group such as a cyclopentyl group and a cyclohexyl group, or a norbornyl group, a tetracyclodecanyl group, a tetracyclododecane group, and the like. Polycyclic cycloalkyl groups such as nyl group and adamantyl group are preferred.

In particular, an embodiment in which Rx ₁ is a methyl group or an ethyl group, and Rx ₂ and Rx ₃ are bonded to each other to form the above-described cycloalkyl group is preferable.

Specific examples of the repeating unit represented by the general formula (X) are shown below, but the scope of the present invention is not limited thereto.

  The content of the acid-decomposable unit in the acid-proliferating agent-supported resin is preferably in the range of 3 to 90 mol%, and in the range of 5 to 80 mol%, based on all repeating units. More preferably, it is particularly preferably in the range of 7 to 70 mol%.

  The molar ratio of the acid proliferator unit to the acid decomposable unit (number of moles of acid proliferator unit / number of moles of acid decomposable unit) is preferably 0.04 to 1.0, and preferably 0.05 to 0.9. More preferred is 0.06 to 0.8.

(B) Alkali-soluble unit As an alkali-soluble unit, Preferably, the repeating unit represented by the following general formula (VI) is mentioned.

Where
R ₀₁ and R ₀₂ each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group.

R ₀₃ represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group, or an alkoxycarbonyl group, or is bonded to the following Ar ₁ to form a 5-membered or 6-membered ring.

Ar ₁ represents an aromatic ring group.

  n represents an integer of 1 to 4.

Specific examples of R ₀₁ , R ₀₂ , R ₀₃ and Ar _{1 in} the general formula (VI) include those similar to R ₀₁ , R ₀₂ , R ₀₃ and Ar ₁ in the general formula (IA).

Specific examples of the repeating unit represented by the general formula (VI) are shown below, but the scope of the present invention is not limited to these.

The content of alkali-soluble units in the acid-proliferating agent-supporting resin is preferably in the range of 3 to 90 mol%, more preferably in the range of 5 to 80 mol%, based on all repeating units. A range of 7 to 70 mol% is particularly preferable.
The molar ratio between the acid proliferator unit and the alkali-soluble unit (number of moles of acid proliferator unit / number of moles of alkali-soluble unit) is preferably 0.04 to 1.0, more preferably 0.05 to 0.9. 0.06-0.8 is particularly preferable.

(C) Repeating unit having an alicyclic hydrocarbon structure substituted with a polar group The acid proliferation agent-supporting resin may further contain a repeating unit having an alicyclic hydrocarbon structure substituted with a polar group. preferable. When this repeating unit is contained in the acid proliferation agent-carrying resin, the substrate adhesion and developer affinity can be further improved.

  The polar group contained in this repeating unit is preferably a hydroxyl group or a cyano group. In addition, the hydroxyl group as a polar group forms an alcoholic hydroxyl group.

Examples of the alicyclic hydrocarbon structure substituted with a polar group include structures represented by the following general formula (VIIa) or (VIIb).

In General Formula (VIIa), R ₂ c to R ₄ c each independently represents a hydrogen atom, a hydroxyl group, or a cyano group. However, at least one of R ₂ c to R ₄ c represents a hydroxyl group or a cyano group. Preferably, one or two of R ₂ c to R ₄ c are a hydroxyl group, and the remainder is a hydrogen atom. More preferably, _two of R ₂ c to R ₄ c are hydroxyl groups and the remaining one is a hydrogen atom.

  The group represented by the general formula (VIIa) is preferably a dihydroxy body or a monohydroxy body, and more preferably a dihydroxy body.

The repeating unit having a group represented by the general formula (VIIa) or (VIIb) includes at least one of R ₁₃ ′ to R ₁₆ ′ in the general formula (II-AB1) or (II-AB2). Examples thereof include those having a group represented by the above general formula (VIIa) or (VIIb) and repeating units represented by the following general formula (AIIa) or (AIIb). Examples of the former include structures in which R _{5 of} —COOR ₅ is a group represented by the general formula (VIIa) or (VIIb).

In general formulas (AIIa) and (AIIb),
R ₁ c represents a hydrogen atom, a methyl group, a trifluoromethyl group, or a hydroxymethyl group.
R ₂ c to R ₄ c have the same meanings as _{R 2} c to R ₄ c in the general formula (VIIa).

Specific examples of the repeating unit represented by the general formula (AIIa) or (AIIb) are shown below, but the present invention is not limited thereto.

The content of the repeating unit having an alicyclic hydrocarbon structure substituted with a polar group in the acid proliferator-supported resin is preferably in the range of 3 to 90 mol% based on all repeating units, More preferably, it is in the range of 5 to 80 mol%, particularly preferably in the range of 7 to 70 mol%.
The molar ratio of the acid proliferator unit to this repeating unit (number of moles of acid proliferator unit / number of moles of repeating unit having an alicyclic hydrocarbon structure substituted with a polar group) is 0.04 to 1.0. Is preferable, 0.05 to 0.9 is more preferable, and 0.06 to 0.8 is particularly preferable.

(D) Repeating unit having development assisting group The acid proliferating agent-carrying resin is composed of a development assisting group, that is, a repeating unit having a group that decomposes under the action of an alkali developer and increases the dissolution rate in the developing solution. Furthermore, it is preferable to include. As a result, the development assisting group is decomposed during alkali development, and the dissolution rate in the alkali developer is increased.

  The development auxiliary group is, for example, a group that decomposes with an alkaline developer to generate a hydrophilic functional group. Examples of the hydrophilic functional group include alkali-soluble groups such as a carboxy group and a hydroxyl group.

  The development auxiliary group includes, for example, a group having a lactone structure, a carboxylic acid ester group substituted by a polar group such as a halogen atom, a group having an acid anhydride structure, a group having a cyclic amide structure, an acid amide group, a carboxylic acid thioester Group, carbonate group, sulfate group, and sulfonate group. Preferably, a group having at least one partial structure of a lactone structure, a cyclic amide structure, and a cyclic acid anhydride structure is used. Particularly preferred is a lactone group.

  Carboxylic acid ester groups not substituted with polar groups such as halogen atoms (for example, ester groups directly connected to the main chain of the (meth) acrylate repeating unit and not substituted with polar groups such as halogen atoms) The decomposition reaction rate with an alkali developer is slow. Therefore, here, such a carboxylic acid ester group is not included in the development auxiliary group.

  The group having a lactone structure preferably includes a 5- to 7-membered ring lactone structure, and other ring structures are condensed in a form that forms a bicyclo structure or a spiro structure in the 5- to 7-membered ring lactone structure. More preferred.

Preferred examples of the repeating unit having a development auxiliary group include those having a lactone structure represented by any one of the following general formulas (LC1-1) to (LC1-17). The group having a lactone structure may be directly bonded to the main chain. Preferred lactone structures include (LC1-1), (LC1-4), (LC1-5), (LC1-6), (LC1-13), (LC1-14) and (LC1-17). . By using specific lactone structures, line edge roughness and development defects can be further reduced.

The lactone structure portion may or may not have a substituent (Rb ₂ ). Preferred substituents (Rb ₂ ) include, for example, an alkyl group having 1 to 8 carbon atoms, a cycloalkyl group having 3 to 7 carbon atoms, an alkoxy group having 1 to 8 carbon atoms, an alkoxycarbonyl group having 1 to 8 carbon atoms, Examples include a carboxy group, a halogen atom, a hydroxyl group, a cyano group, and an acid-decomposable group.

n ₂ represents an integer of 0-4. When n ₂ is an integer of 2 or more, a plurality of Rb ₂ may be the same or different from each other. In this case, a plurality of Rb ₂ may be bonded to each other to form a ring structure.

Examples of the repeating unit having a lactone structure represented by any one of the general formulas (LC1-1) to (LC1-17) include a repeating unit represented by the following general formula (AII).

In general formula (AII),
Rb ₀ represents a hydrogen atom, a halogen atom or an alkyl group having 1 to 4 carbon atoms.
Preferable substituents that the alkyl group of Rb ₀ may have include a hydroxyl group and a halogen atom. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.

Rb ₀ is preferably a hydrogen atom, a methyl group, a hydroxymethyl group or a trifluoromethyl group. Of these, a hydrogen atom and a methyl group are particularly preferred.

Ab represents an alkylene group, a divalent linking group having a monocyclic or polycyclic alicyclic hydrocarbon structure, a single bond, an ether group, an ester group, a carbonyl group, a carboxy group, or a combination thereof. Ab is preferably a single bond or a linking group represented by —Ab ₁ —CO ₂ —.

Ab ₁ is a linear or branched alkylene group or a monocyclic or polycyclic cycloalkylene group, preferably a methylene group, an ethylene group, a cyclohexylene group, an adamantylene group or a norbornylene group.

  V is a group represented by any one of the general formulas (LC1-1) to (LC1-17).

  The repeating unit having a lactone structure usually has an optical isomer, but any optical isomer may be used. One optical isomer may be used alone, or a plurality of optical isomers may be mixed and used. When one kind of optical isomer is mainly used, the optical purity thereof is preferably 90% ee or more, more preferably 95% ee or more.

Particularly preferred repeating units having a lactone group include the following repeating units. By selecting an optimal lactone group, the pattern profile and density dependency can be further improved. In the formula, Rx and R represent H, CH ₃ , CH ₂ OH or CF ₃ .

  The repeating unit provided with the development auxiliary group is a repeating unit in which the development auxiliary group is bonded to the main chain of the resin, such as a repeating unit of acrylic acid ester and methacrylic acid ester. Alternatively, this repeating unit may be introduced at the terminal of the resin by using a polymerization initiator or a chain transfer agent having a development auxiliary group at the time of polymerization.

The content of the repeating unit having a development auxiliary group in the acid-proliferating agent-supporting resin is preferably in the range of 1 to 40 mol%, and in the range of 3 to 30 mol%, based on all repeating units. More preferably, it is particularly preferably in the range of 5 to 15 mol%.
(E) Repeating unit having a cyclic hydrocarbon structure having no polar group and not exhibiting acid decomposability The acid proliferator-supported resin has a cyclic hydrocarbon structure having no polar group and does not exhibit acid decomposability A repeating unit may be provided. Examples of such a repeating unit include a repeating unit represented by the following general formula (VII).

In general formula (VII), R ₅ represents a hydrocarbon group having at least one cyclic hydrocarbon structure and having no polar group such as a hydroxyl group and a cyano group.
Ra represents a hydrogen atom, an alkyl group, or a —CH ₂ —O—Ra ₂ group. In the formula, Ra ₂ represents a hydrogen atom, an alkyl group, or an acyl group. Ra is preferably a hydrogen atom, a methyl group, a hydroxymethyl group or a trifluoromethyl group, and particularly preferably a hydrogen atom or a methyl group.

The cyclic hydrocarbon structure possessed by R ₅ includes a monocyclic hydrocarbon group and a polycyclic hydrocarbon group. Examples of the monocyclic hydrocarbon group include a cycloalkyl group having 3 to 12 carbon atoms such as a cyclopentyl group, a cyclohexyl group, a cycloheptyl group and a cyclooctyl group, and a carbon number such as a cyclohexenyl group having 3 to 12 carbon atoms. And a phenyl group. As a preferable monocyclic hydrocarbon group, a C3-C7 monocyclic hydrocarbon group is mentioned, More preferably, a cyclopentyl group or a cyclohexyl group is mentioned.

The polycyclic hydrocarbon group includes a ring assembly hydrocarbon group and a bridged cyclic hydrocarbon group. Examples of the ring assembly hydrocarbon group include a bicyclohexyl group, a perhydronaphthalenyl group, a biphenyl group, and a 4-cyclohexylphenyl group. Examples of the bridged cyclic hydrocarbon ring include two rings such as pinane, bornane, norpinane, norbornane and bicyclooctane ring (bicyclo [2.2.2] octane ring, bicyclo [3.2.1] octane ring, etc.). Hydrocarbon rings, homobredans, adamantanes, tricyclic hydrocarbon rings such as tricyclo [5.2.1.0 ^2,6 ] decane and tricyclo [4.3.1.1 ^2,5 ] undecane rings, and Tetracyclo [4.4.0.1 ^2,5 . 1 ^7,10 ] dodecane and tetracyclic hydrocarbon rings such as perhydro-1,4-methano-5,8-methanonaphthalene ring. The bridged cyclic hydrocarbon ring includes condensed cyclic hydrocarbon rings such as perhydronaphthalene (decalin), perhydroanthracene, perhydrophenanthrene, perhydroacenaphthene, perhydrofluorene, perhydroindene, and perhydroindene. A condensed ring in which a plurality of 5- to 8-membered cycloalkane rings such as a hydrophenalene ring are condensed is also included.

Preferred examples of the bridged cyclic hydrocarbon ring include a norbornyl group, an adamantyl group, a bicyclooctanyl group, and a tricyclo [5,2,1,0 ^2,6 ] decanyl group. More preferable examples of the bridged cyclic hydrocarbon ring include a norbornyl group and an adamantyl group.

  These cyclic hydrocarbon groups may have a substituent. Preferred examples of the substituent include a halogen atom, an alkyl group, a hydroxyl group protected with a protecting group, and an amino group protected with a protecting group. Preferred halogen atoms include bromine, chlorine and fluorine atoms. Preferred alkyl groups include methyl, ethyl, butyl and t-butyl groups. The above alkyl group may further have a substituent. Examples of the substituent include a halogen atom, an alkyl group, a hydroxyl group protected with a protecting group, and an amino group protected with a protecting group.

  Examples of the protecting group include an alkyl group, a monovalent aliphatic hydrocarbon ring group, an aralkyl group, a substituted methyl group, a substituted ethyl group, an acyl group, an alkoxycarbonyl group, and an aralkyloxycarbonyl group. As a preferable alkyl group, a C1-C4 alkyl group is mentioned, for example. Preferred substituted methyl groups include, for example, methoxymethyl, methoxythiomethyl, benzyloxymethyl, t-butoxymethyl, and 2-methoxyethoxymethyl groups. Preferred substituted ethyl groups include 1-ethoxyethyl and 1-methyl-1-methoxyethyl, for example. Preferable acyl groups include C1-C6 aliphatic acyl groups such as formyl, acetyl, propionyl, butyryl, isobutyryl, valeryl and pivaloyl groups. As a preferable alkoxycarbonyl group, a C1-C4 alkoxycarbonyl group is mentioned, for example. A preferable aralkyloxycarbonyl group includes, for example, a benzyloxycarbonyl group.

Specific examples of the repeating unit having a cyclic hydrocarbon structure having no polar group and not exhibiting acid decomposability are listed below, but the present invention is not limited thereto. In the formula, Ra represents H, CH ₃ , CH ₂ OH, or CF ₃ .

  When the acid proliferator-supported resin has a cyclic hydrocarbon structure having no polar group and has a repeating unit that does not exhibit acid decomposability, the content is based on the total number of repeating units in the acid proliferator-supported resin. 1 to 40 mol% is preferable, and 3 to 20 mol% is more preferable.

(F) Repeating units derived from other polymerizable monomers The acid-proliferating agent-supporting resin may further include repeating units derived from other polymerizable monomers as long as the dry etching resistance is not significantly impaired.

  The content of repeating units derived from other polymerizable monomers in the resin is generally 50 mol% or less, preferably 30 mol% or less, based on all repeating units. Other polymerizable monomers that can be used include those shown below. That is, for example, a compound having one addition polymerizable unsaturated bond selected from (meth) acrylic acid esters, (meth) acrylamides, allyl compounds, vinyl ethers, vinyl esters, styrenes and crotonic acid esters Is included.

  (Meth) acrylic acid esters include, for example, methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, t-butyl (meth) acrylate, amyl (meth) acrylate, ( (Meth) acrylic acid cyclohexyl, (meth) acrylic acid ethylhexyl, (meth) acrylic acid octyl, (meth) acrylic acid-t-octyl, (meth) acrylic acid 2-chloroethyl, (meth) acrylic acid 2-hydroxyethyl, ( Examples include glycidyl (meth) acrylate, benzyl (meth) acrylate, and phenyl (meth) acrylate.

  Examples of (meth) acrylamides include (meth) acrylamide, N-alkyl (meth) acrylamide (alkyl groups include, for example, methyl group, ethyl group, propyl group, butyl group, t-butyl group, heptyl group, Octyl group, benzyl group, hydroxyethyl group, benzyl group and the like having 1 to 10 carbon atoms), N-cycloalkyl (meth) acrylamide (the cycloalkyl group includes, for example, cyclohexyl group) N-aryl (meth) acrylamide (examples of aryl groups include phenyl, tolyl, nitrophenyl, naphthyl, cyanophenyl, hydroxyphenyl and carboxyphenyl groups), N, N-dialkyl (Meth) acrylamide (Example of alkyl group Examples thereof include those having 1 to 10 carbon atoms such as a methyl group, an ethyl group, a butyl group, an isobutyl group and an ethylhexyl group), N, N-dicycloalkyl (meth) acrylamide (the cycloalkyl group includes, for example, Cyclohexyl group), N-alkyl-N-cycloalkyl (meth) acrylamide (the alkyl group includes, for example, 1 to 10 carbon atoms such as a methyl group, an ethyl group, a butyl group, an isobutyl group, and an ethylhexyl group) A cycloalkyl group includes, for example, a cyclohexyl group, N, N-diaryl (meth) acrylamide (an aryl group includes, for example, a phenyl group), N-methyl-N -Phenylacrylamide, N-hydroxyethyl-N-methylacrylamide, It includes N-2- acetamidoethyl -N- acetyl acrylamide beauty.

  Examples of allyl compounds include allyl esters (eg, allyl acetate, allyl caproate, allyl caprylate, allyl laurate, allyl palmitate, allyl stearate, allyl benzoate, allyl acetoacetate or allyl lactate), and allyl. Examples include oxyethanol.

  Examples of vinyl ethers include alkyl vinyl ethers (for example, hexyl vinyl ether, octyl vinyl ether, decyl vinyl ether, ethyl hexyl vinyl ether, methoxyethyl vinyl ether, ethoxyethyl vinyl ether, chloroethyl vinyl ether, 1-methyl-2,2-dimethylpropyl vinyl ether, 2- Ethyl butyl vinyl ether, hydroxyethyl vinyl ether, diethylene glycol vinyl ether, dimethylaminoethyl vinyl ether, diethylaminoethyl vinyl ether, butylaminoethyl vinyl ether, benzyl vinyl ether or tetrahydrofurfuryl vinyl ether), and vinyl aryl ethers (eg, vinyl phenyl ether, vinyl tolyl ether, vinyl) Lol phenyl ether, vinyl 2,4-dichlorophenyl ether, vinyl naphthyl ether and vinyl anthranyl ether) and the like.

  Examples of vinyl esters include vinyl butyrate, vinyl isobutyrate, vinyl trimethyl acetate, vinyl diethyl acetate, vinyl valate, vinyl caproate, vinyl chloroacetate, vinyl dichloroacetate, vinyl methoxyacetate, vinyl butoxyacetate, Examples include vinyl phenyl acetate, vinyl acetoacetate, vinyl lactate, vinyl-β-phenyl butyrate, vinyl cyclohexyl carboxylate, vinyl benzoate, vinyl salicylate, vinyl chlorobenzoate, vinyl tetrachlorobenzoate and vinyl naphthoate.

  Examples of styrenes include styrene and alkyl styrene (for example, methyl styrene, dimethyl styrene, trimethyl styrene, ethyl styrene, diethyl styrene, isopropyl styrene, butyl styrene, hexyl styrene, cyclohexyl styrene, decyl styrene, benzyl styrene, chloromethyl styrene). , Trifluoromethylstyrene, ethoxymethylstyrene or acetoxymethylstyrene), alkoxystyrene (for example, methoxystyrene, 4-methoxy-3-methylstyrene or dimethoxystyrene), alkylcarbonyloxystyrene (for example, 4-acetoxystyrene or 4- Cyclohexylcarbonyloxystyrene), arylcarbonyloxystyrene (for example, 4-phenylcarbonyloxystyrene) Halogen styrene (for example, chlorostyrene, dichlorostyrene, trichlorostyrene, tetrachlorostyrene, pentachlorostyrene, bromostyrene, dibromostyrene, iodostyrene, fluorostyrene, trifluorostyrene, 2-bromo-4-trifluoro) Methylstyrene or 4-fluoro-3-trifluoromethylstyrene), cyanostyrene, and carboxystyrene.

Examples of the crotonic acid esters include alkyl crotonic acid (for example, butyl crotonic acid, hexyl crotonic acid or glycerin monocrotonate).
Examples of the dialkyl itaconates include dimethyl itaconate, diethyl itaconate and dibutyl itaconate.

  Examples of the dialkyl esters of maleic acid or fumaric acid include dimethyl maleate and dibutyl fumarate. In addition, maleic anhydride, maleimide, acrylonitrile, methacrylonitrile, maleilonitrile, and the like can be given. Further, any addition-polymerizable unsaturated compound that can be copolymerized with the repeating unit described above can be used without any particular limitation.

  The form of the acid proliferation agent-supporting resin may be any of random type, block type, comb type, star type, and the like.

  The resin containing the above-described acid proliferator unit and other repeating units can be synthesized by, for example, radical, cationic or anionic polymerization of unsaturated monomers corresponding to each structure. Moreover, it is also possible to synthesize by performing a polymer reaction after polymerization using an unsaturated monomer corresponding to a precursor of each structure.

  The molecular weight of the acid proliferator-supported resin is not particularly limited, but the weight average molecular weight is preferably in the range of 1000 to 100,000, more preferably in the range of 1500 to 70000, and in the range of 2000 to 50000. Particularly preferred. Here, the weight average molecular weight of the resin indicates a molecular weight in terms of polystyrene measured by GPC (solvent: N-methyl-2-pyrrolidone (NMP)).

  The dispersity (Mw / Mn) is preferably 1.00 to 5.00, more preferably 1.03 to 3.50, and still more preferably 1.05 to 2.50.

<Photo acid generator>
The photoacid generator is a compound that generates an acid upon irradiation with actinic rays or radiation. Examples of the photoacid generator include a photoinitiator for photocationic polymerization, a photoinitiator for radical photopolymerization, a photodecolorant for dyes, a photochromic agent, an actinic ray or radiation used for a microresist, etc. Known compounds that generate an acid upon irradiation and mixtures thereof can be appropriately selected and used. Examples of these include onium salts such as sulfonium salts and iodonium salts, and diazodisulfone compounds such as bis (alkylsulfonyldiazomethane).

Preferable examples of the photoacid generator include compounds represented by the following general formulas (ZI), (ZII) and (ZIII).

In the general formula (ZI), R ₂₀₁ , R ₂₀₂ and R ₂₀₃ each independently represents an organic group. The carbon number of the organic group as R _201, R ₂₀₂ and R ₂₀₃ is, for example, 1 to 30, preferably 1 to 20.

Two of R _{201 to} R ₂₀₃ may be bonded to each other via a single bond or a linking group to form a ring structure. Examples of the linking group in this case include an ether bond, a thioether bond, an ester bond, an amide bond, a carbonyl group, a methylene group, and an ethylene group. Examples of the group formed by combining two of R _{201 to} R ₂₀₃ include alkylene groups such as a butylene group and a pentylene group.

Specific examples of R ₂₀₁ , R ₂₀₂ and R ₂₀₃ include corresponding groups in the compound (ZI-1), (ZI-2) or (ZI-3) described later.

X ⁻ represents a non-nucleophilic anion. Examples of X ⁻ include a sulfonate anion, a bis (alkylsulfonyl) amide anion, a tris (alkylsulfonyl) methide anion, BF ₄ ⁻ , PF ₆ ^—, and SbF ₆ ^— . X ⁻ is preferably an organic anion containing a carbon atom. As a preferable organic anion, the organic anion shown to following AN1-AN3 is mentioned, for example.

In the formula _AN1~AN3, Rc 1 ~Rc ₃ independently represents an organic group. Examples of the organic group include those having 1 to 30 carbon atoms, preferably an alkyl group, an aryl group, or a group in which a plurality of these groups are linked through a linking group. Examples of this linking group include a single bond, —O—, —CO ₂ —, —S—, —SO ₃ —, and —SO ₂ N (Rd ₁ ) —. Here, Rd ₁ represents a hydrogen atom or an alkyl group, and may form a ring structure with a bonded alkyl group or aryl group.

The organic group of Rc _{1 to} Rc ₃ may be an alkyl group substituted at the 1-position with a fluorine atom or a fluoroalkyl group, or a phenyl group substituted with a fluorine atom or a fluoroalkyl group. By containing a fluorine atom or a fluoroalkyl group, it becomes possible to increase the acidity of the acid generated by light irradiation. Thereby, the sensitivity of the actinic ray-sensitive or radiation-sensitive resin composition can be improved. Rc _{1 to} Rc ₃ may be bonded to other alkyl groups and aryl groups to form a ring structure.

Further, as preferred X ⁻ , a sulfonate anion represented by the following general formula (SA1) or (SA2) can be mentioned.

In formula (SA1),
Ar represents an aryl group and may further have a substituent other than a-(D-B) group.
n represents an integer of 1 or more. n is preferably 1 to 4, more preferably 2 to 3, and most preferably 3.
D represents a single bond or a divalent linking group. The divalent linking group is an ether group, a thioether group, a carbonyl group, a sulfoxide group, a sulfone group, a sulfonic acid ester group, or an ester group.
B represents a hydrocarbon group.

In formula (SA2),
Xf each independently represents a fluorine atom or an alkyl group substituted with at least one fluorine atom.

R ₁ and R ₂ each independently represent a hydrogen atom, a fluorine atom, an alkyl group, or a group selected from an alkyl group substituted with at least one fluorine atom, and R ₁ and R ₂ when there are a plurality of R ₁ and R ₂ Each may be the same as or different from each other.
L represents a single bond or a divalent linking group, and when there are a plurality of L, they may be the same as or different from each other.
E represents a group having a cyclic structure.
x represents an integer of 1 to 20, y represents an integer of 0 to 10, and z represents an integer of 0 to 10.

First, the sulfonate anion represented by the formula (SA1) will be described in detail.
In formula (SA1), Ar is preferably an aromatic ring having 6 to 30 carbon atoms. Specifically, Ar represents, for example, a benzene ring, naphthalene ring, pentalene ring, indene ring, azulene ring, heptalene ring, indecene ring, perylene ring, pentacene ring, acetaphthalene ring, phenanthrene ring, anthracene ring, naphthacene ring, chrysene Ring, triphenylene ring, fluorene ring, biphenyl ring, pyrrole ring, furan ring, thiophene ring, imidazole ring, oxazole ring, thiazole ring, pyridine ring, pyrazine ring, pyrimidine ring, pyridazine ring, indolizine ring, indole ring, benzofuran ring Benzothiophene ring, isobenzofuran ring, quinolidine ring, quinoline ring, phthalazine ring, naphthyridine ring, quinoxaline ring, quinoxazoline ring, isoquinoline ring, carbazole ring, phenanthridine ring, acridine ring, phenanthroline ring, Antoren ring, a chromene ring, a xanthene ring, a phenoxathiin ring, a phenothiazine ring or a phenazine ring. Of these, a benzene ring, a naphthalene ring or an anthracene ring is preferable, and a benzene ring is more preferable, from the viewpoint of achieving both roughness improvement and high sensitivity.

  When Ar further has a substituent other than a-(D-B) group, examples of this substituent include the following. That is, as this substituent, halogen atoms such as fluorine atom, chlorine atom, bromine atom and iodine atom; alkoxy groups such as methoxy group, ethoxy group and tert-butoxy group; aryloxy groups such as phenoxy group and p-tolyloxy group Alkylthioxy groups such as methylthioxy, ethylthioxy and tert-butylthioxy groups; arylthioxy groups such as phenylthioxy and p-tolylthioxy groups; alkoxycarbonyl groups such as methoxycarbonyl, butoxycarbonyl and phenoxycarbonyl Acetoxy group; straight chain alkyl group such as methyl group, ethyl group, propyl group, butyl group, heptyl group, hexyl group, dodecyl group and 2-ethylhexyl group; branched chain alkyl group; vinyl group, propenyl group and hexenyl group An alkenyl group of Styrene group; hydroxy group; a carboxy group; an aryl group such as a phenyl group and tolyl group; an alkynyl group such as propynyl group and hexynyl group and a sulfonic acid group. Of these, straight chain alkyl groups and branched chain alkyl groups are preferred from the viewpoint of improving roughness.

  In formula (SA1), D is preferably a single bond, or an ether group or an ester group. More preferably, D is a single bond.

  In formula (SA1), B is, for example, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a cycloalkyl group. B is preferably an alkyl group or a cycloalkyl group. The alkyl group, alkenyl group, alkynyl group, aryl group or cycloalkyl group as B may have a substituent.

  The alkyl group as B is preferably a branched alkyl group. Examples of the branched chain alkyl group include isopropyl group, tert-butyl group, tert-pentyl group, neopentyl group, sec-butyl group, isobutyl group, isohexyl group, 3,3-dimethylpentyl group and 2-ethylhexyl group. Can be mentioned.

  The cycloalkyl group as B may be a monocyclic cycloalkyl group or a polycyclic cycloalkyl group. Examples of the monocyclic cycloalkyl group include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, and a cyclooctyl group. Examples of the polycyclic cycloalkyl group include adamantyl group, norbornyl group, bornyl group, camphenyl group, decahydronaphthyl group, tricyclodecanyl group, tetracyclodecanyl group, camphoroyl group, dicyclohexyl group and pinenyl group. Can be mentioned.

  When the alkyl group, alkenyl group, alkynyl group, aryl group or cycloalkyl group as B has a substituent, examples of the substituent include the following. That is, as this substituent, halogen atoms such as fluorine atom, chlorine atom, bromine atom and iodine atom; alkoxy groups such as methoxy group, ethoxy group and tert-butoxy group; aryloxy groups such as phenoxy group and p-tolyloxy group Alkylthioxy groups such as methylthioxy, ethylthioxy and tert-butylthioxy groups; arylthioxy groups such as phenylthioxy and p-tolylthioxy groups; alkoxycarbonyl groups such as methoxycarbonyl, butoxycarbonyl and phenoxycarbonyl Acetoxy group; straight chain alkyl group such as methyl group, ethyl group, propyl group, butyl group, heptyl group, hexyl group, dodecyl group and 2-ethylhexyl group; branched chain alkyl group; cycloalkyl group such as cyclohexyl group; vinyl Group, propenyl And alkenyl groups such as hexenyl groups; acetylene group; hydroxy group; a carboxy group; a sulfonic group; an aryl group such as a phenyl group and tolyl group; an alkynyl group such as propynyl group and hexynyl group and a carbonyl group. Among these, a straight chain alkyl group and a branched chain alkyl group are preferable from the viewpoint of achieving both improved roughness and high sensitivity.

Next, the sulfonate anion represented by the formula (SA2) will be described in detail.
In formula (SA2), Xf is a fluorine atom or an alkyl group substituted with at least one fluorine atom. As this alkyl group, a C1-C10 thing is preferable and a C1-C4 thing is more preferable. The alkyl group substituted with a fluorine atom is preferably a perfluoroalkyl group.

Xf is preferably a fluorine atom or a perfluoroalkyl group having 1 to 4 carbon atoms. Specifically, Xf is preferably a fluorine atom, CF ₃ , C ₂ F ₅ , C ₃ F ₇ , C ₄ F ₉ , C ₅ F ₁₁ , C ₆ F ₁₃ , C ₇ F ₁₅ , C ₈ F _{17, CH 2 CF 3, CH} 2 CH 2 CF 3, CH 2 C 2 F 5, CH 2 CH 2 C 2 F 5, CH 2 C 3 F 7, CH 2 CH 2 C 3 F 7, CH 2 C 4 F ₉ or CH ₂ CH ₂ C ₄ F ₉ . Among these, a fluorine atom or CF ₃ is preferable, and a fluorine atom is most preferable.

In formula (SA2), each of R ₁ and R ₂ is a group selected from a hydrogen atom, a fluorine atom, an alkyl group, and an alkyl group substituted with at least one fluorine atom. The alkyl group which may be substituted with a fluorine atom is preferably an alkyl group having 1 to 4 carbon atoms. Moreover, as an alkyl group substituted by the fluorine atom, a C1-C4 perfluoroalkyl group is especially preferable. Specifically, CF ₃ , C ₂ F ₅ , C ₃ F ₇ , C ₄ F ₉ , C ₅ F ₁₁ , C ₆ F ₁₃ , C ₇ F ₁₅ , C ₈ F ₁₇ , CH ₂ CF ₃ , CH _{2 CH 2 CF 3, CH 2 C} 2 F 5, CH 2 CH 2 C 2 F 5, CH 2 C 3 F 7, CH 2 CH 2 C 3 F 7, CH 2 C 4 F 9 and _CH 2 _CH 2 _{C 4} F ₉ is mentioned, and among them, CF ₃ is preferable.

In the formula (SA2), x is preferably 1 to 8, and more preferably 1 to 4. y is preferably 0 to 4, and more preferably 0. z is preferably from 0 to 8, and more preferably from 0 to 4.
In formula (SA2), L represents a single bond or a divalent linking group. Examples of the divalent linking group include —COO—, —OCO—, —CO—, —O—, —S—, —SO—, —SO ₂ —, an alkylene group, a cycloalkylene group, and an alkenylene group. It is done. Among these, —COO—, —OCO—, —CO—, —O—, —S—, —SO— or —SO ₂ — is preferable, and —COO—, —OCO— or —SO ₂ — is more preferable.

  In formula (SA2), E represents a group having a cyclic structure. Examples of E include a cyclic aliphatic group, an aryl group, and a group having a heterocyclic structure.

  The cycloaliphatic group as E may have a monocyclic structure or a polycyclic structure. As the cyclic aliphatic group having a monocyclic structure, monocyclic cycloalkyl groups such as a cyclopentyl group, a cyclohexyl group, and a cyclooctyl group are preferable. The cycloaliphatic group having a polycyclic structure is preferably a polycyclic cycloalkyl group such as a norbornyl group, a tricyclodecanyl group, a tetracyclodecanyl group, a tetracyclododecanyl group or an adamantyl group. In particular, when a cycloaliphatic group having a bulky structure of 6-membered ring or more is adopted as E, diffusibility in the film in the PEB (post-exposure heating) step is suppressed, and the resolution and EL (exposure latitude) are further improved. It becomes possible to improve.

  The aryl group as E is, for example, a benzene ring, naphthalene ring, phenanthrene ring or anthracene ring.

  The group having a heterocyclic structure as E may have aromaticity or may not have aromaticity. The heteroatom contained in this group is preferably a nitrogen atom or an oxygen atom. Specific examples of the heterocyclic structure include a furan ring, a thiophene ring, a benzofuran ring, a benzothiophene ring, a dibenzofuran ring, a dibenzothiophene ring, a pyridine ring, a piperidine ring, and a morpholine ring. Among these, a furan ring, a thiophene ring, a pyridine ring, a piperidine ring, and a morpholine ring are preferable.

  E may have a substituent. Examples of the substituent include an alkyl group (which may be linear, branched or cyclic, preferably 1 to 12 carbon atoms), an aryl group (preferably 6 to 14 carbon atoms), a hydroxy group, Examples include an alkoxy group, an ester group, an amide group, a urethane group, a ureido group, a thioether group, a sulfonamide group, and a sulfonic acid ester group.

As the photoacid generator, a compound having a plurality of structures represented by the general formula (ZI) may be used. For example, the general formula at least one of R ₂₀₁ to R ₂₀₃ of a compound represented by (ZI), at least one coupling structure of R ₂₀₁ to R ₂₀₃ of another compound represented by formula (ZI) It may be a compound.

  More preferred (ZI) components include compounds (ZI-1) to (ZI-4) described below.

In the compound (ZI-1), at least one of R _{201 to} R _{203 in} the general formula (ZI) is an aryl group. That is, the compound (ZI-1) is an arylsulfonium compound, that is, a compound having arylsulfonium as a cation.

The compound (ZI-1), all of R ₂₀₁ to R ₂₀₃ is may be an aryl group or a part of R ₂₀₁ to R ₂₀₃ is an aryl group, except they may be an alkyl group. In addition, when compound (ZI-1) has a plurality of aryl groups, these aryl groups may be the same as or different from each other.

  Examples of the compound (ZI-1) include triarylsulfonium compounds, diarylalkylsulfonium compounds, and aryldialkylsulfonium compounds.

  As the aryl group in the compound (ZI-1), a phenyl group, a naphthyl group, or a heteroaryl group such as an indole residue and a pyrrole residue is preferable, and a phenyl group, a naphthyl group, or an indole residue is particularly preferable.

  The alkyl group which the compound (ZI-1) has as necessary is preferably a linear, branched or cycloalkyl group having 1 to 15 carbon atoms, such as a methyl group, an ethyl group, a propyl group, n -Butyl group, sec-butyl group, t-butyl group, cyclopropyl group, cyclobutyl group and cyclohexyl group are mentioned.

  These aryl groups and alkyl groups may have a substituent. Examples of the substituent include an alkyl group (preferably 1 to 15 carbon atoms), an aryl group (preferably 6 to 14 carbon atoms), an alkoxy group (preferably 1 to 15 carbon atoms), a halogen atom, a hydroxyl group, and phenylthio. Groups.

Preferable substituents include linear, branched or cyclic alkyl groups having 1 to 12 carbon atoms, and linear, branched or cyclic alkoxy groups having 1 to 12 carbon atoms. Particularly preferred substituents include alkyl groups having 1 to 6 carbon atoms and alkoxy groups having 1 to 6 carbon atoms. The substituent may be substituted to any one of the three R ₂₀₁ to R _203, or may be substituted on all three. When R _{201 to} R ₂₀₃ are a phenyl group, the substituent is preferably substituted at the p-position of the aryl group.

In another embodiment, one or two of R ₂₀₁ , R ₂₀₂ and R ₂₀₃ is an aryl group which may have a substituent, and the remaining group is a linear, branched or cyclic alkyl group. preferable. Specific examples of this structure include the structures described in paragraphs 0141 to 0153 of JP-A-2004-210670.

At this time, as the aryl group, specifically, the same as the aryl group of R _201, R ₂₀₂ and R _203, a phenyl group or a naphthyl group is preferable. The aryl group preferably has any one of a hydroxyl group, an alkoxy group, and an alkyl group as a substituent. More preferably, it is a C1-C12 alkoxy group as a substituent, More preferably, it is a C1-C6 alkoxy group.

  The linear, branched or cyclic alkyl group as the remaining group is preferably an alkyl group having 1 to 6 carbon atoms. These groups may further have a substituent. In addition, when two of the remaining groups are present, these two may be bonded to each other to form a ring structure.

Compound (ZI-1) is, for example, a compound represented by the following general formula (ZI-1A).

In general formula (ZI-1A),
R ₁₃ represents a hydrogen atom, a fluorine atom, a hydroxyl group, an alkyl group, a cycloalkyl group, an alkoxy group, a cycloalkyloxy group or an alkoxycarbonyl group.
When a plurality of R ₁₄ are present, each independently represents an alkyl group, a cycloalkyl group, an alkoxy group, an alkylsulfonyl group or a cycloalkylsulfonyl group.

R ₁₅ each independently represents an alkyl group or a cycloalkyl group. Two R ₁₅ may be bonded to each other to form a ring structure.
l represents an integer of 0-2.
r represents an integer of 0 to 8.
X ⁻ represents a non-nucleophilic anion, and examples thereof include the same as X ⁻ in the general formula (ZI).

The alkyl group for R ₁₃ , R ₁₄ or R ₁₅ may be a linear alkyl group or a branched alkyl group. The alkyl group is preferably one having 1 to 10 carbon atoms, for example, methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, 2-methylpropyl group, 1-methylpropyl group. , T-butyl group, n-pentyl group, neopentyl group, n-hexyl group, n-heptyl group, n-octyl group, 2-ethylhexyl group, n-nonyl group and n-decyl group. Of these, a methyl group, an ethyl group, an n-butyl group, and a t-butyl group are particularly preferable.

Examples of the cycloalkyl group represented by R ₁₃ , R ₁₄ or R ₁₅ include cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, cyclododecanyl, cyclobenenyl, cyclohexenyl and cyclooctadienyl groups. Can be mentioned. Of these, cyclopropyl, cyclopentyl, cyclohexyl and cyclooctyl groups are particularly preferred.

Examples of the alkyl group moiety of the alkoxy group of R ₁₃ or R ₁₄ include those enumerated above as the alkyl group of R ₁₃ , R ₁₄ or R ₁₅ . As the alkoxy group, a methoxy group, an ethoxy group, an n-propoxy group, and an n-butoxy group are particularly preferable.

The cycloalkyl moiety of the cycloalkyl group of R _13, for example, those previously listed as the cycloalkyl group of _{R 13, R 14} or _{R 15.} As this cycloalkyloxy group, a cyclopentyloxy group and a cyclohexyloxy group are particularly preferable.

The alkoxy group moiety of the alkoxycarbonyl group R _13, for example, those previously listed as alkoxy groups R ₁₃ or R _14. As the alkoxycarbonyl group, a methoxycarbonyl group, an ethoxycarbonyl group, and an n-butoxycarbonyl group are particularly preferable.

The alkyl group moiety of the alkylsulfonyl group R _14, for example, those previously listed as alkyl group _{R 13, R 14} or _{R 15. Further,} the cycloalkyl group moiety cycloalkylsulfonyl group _{R 14,} for example, those previously listed as the cycloalkyl group of _{R 13, R 14} or _{R 15.} As these alkylsulfonyl groups or cycloalkylsulfonyl groups, a methanesulfonyl group, an ethanesulfonyl group, an n-propanesulfonyl group, an n-butanesulfonyl group, a cyclopentanesulfonyl group, and a cyclohexanesulfonyl group are particularly preferable.

  l is preferably 0 or 1, more preferably 1. r is preferably 0-2.

Each group of R ₁₃ , R ₁₄ and R ₁₅ may further have a substituent. Examples of this substituent include halogen atoms such as fluorine atoms, hydroxy groups, carboxy groups, cyano groups, nitro groups, alkoxy groups, cycloalkyloxy groups, alkoxyalkyl groups, cycloalkyloxyalkyl groups, alkoxycarbonyl groups, cyclocarbonyls, Examples include an alkyloxycarbonyl group, an alkoxycarbonyloxy group, and a cycloalkyloxycarbonyloxy group.

The alkoxy group may be linear or branched. Examples of the alkoxy group include carbon number 1 such as methoxy group, ethoxy group, n-propoxy group, i-propoxy group, n-butoxy group, 2-methylpropoxy group, 1-methylpropoxy group, and t-butoxy group. -20.
Examples of the cycloalkyloxy group include those having 3 to 20 carbon atoms such as a cyclopentyloxy group and a cyclohexyloxy group.

The alkoxyalkyl group may be linear or branched. Examples of the alkoxyalkyl group include those having 2 to 21 carbon atoms such as methoxymethyl group, ethoxymethyl group, 1-methoxyethyl group, 2-methoxyethyl group, 1-ethoxyethyl group and 2-ethoxyethyl group. Can be mentioned.
Examples of the cycloalkyloxyalkyl group include those having 4 to 21 carbon atoms such as a cyclohexyloxymethyl group, a cyclopentyloxymethyl group, and a cyclohexyloxyethyl group.

The alkoxycarbonyl group may be linear or branched. Examples of the alkoxycarbonyl group include methoxycarbonyl group, ethoxycarbonyl group, n-propoxycarbonyl group, i-propoxycarbonyl group, n-butoxycarbonyl group, 2-methylpropoxycarbonyl group, 1-methylpropoxycarbonyl group and t. -A C2-C21 thing, such as a butoxycarbonyl group, is mentioned.
Examples of the cycloalkyloxycarbonyl group include those having 4 to 21 carbon atoms such as a cyclopentyloxycarbonyl group and cyclohexyloxycarbonyl.

The alkoxycarbonyloxy group may be linear or branched. Examples of the alkoxycarbonyloxy group include carbon such as methoxycarbonyloxy group, ethoxycarbonyloxy group, n-propoxycarbonyloxy group, i-propoxycarbonyloxy group, n-butoxycarbonyloxy group and t-butoxycarbonyloxy group. The thing of number 2-21 is mentioned.
Examples of the cycloalkyloxycarbonyloxy group include those having 4 to 21 carbon atoms such as a cyclopentyloxycarbonyloxy group and a cyclohexyloxycarbonyloxy group.

The ring structure that can be formed by bonding two R ₁₅ to each other includes a 5-membered ring or a 6-membered ring, particularly preferably a 5-membered ring (that is, a tetrahydrothiophene ring) together with the S atom in the general formula (ZI-1A). ) Is preferred.
This ring structure may further have a substituent. Examples of the substituent include a hydroxy group, a carboxy group, a cyano group, a nitro group, an alkoxy group, an alkoxyalkyl group, an alkoxycarbonyl group, and an alkoxycarbonyloxy group.

As R ₁₅ , a methyl group, an ethyl group, and a divalent group in which two R ₁₅ are bonded to each other to form a tetrahydrothiophene ring structure together with a sulfur atom are particularly preferable.

Alkyl groups R _13, cycloalkyl group, alkoxy group and alkoxycarbonyl group, alkyl group of R _14, cycloalkyl group, alkoxy group, alkylsulfonyl group and cycloalkylsulfonyl group may further have a substituent . As this substituent, a hydroxy group, an alkoxy group, an alkoxycarbonyl group, and a halogen atom (particularly a fluorine atom) are preferable.

Below, the preferable specific example of the cation in the compound represented by general formula (ZI-1A) is shown.

  Next, the compound (ZI-2) will be described.

Compound (ZI-2) is a compound in the case where R _{201 to} R ₂₀₃ in formula (ZI) each independently represents an organic group containing no aromatic ring. Here, the aromatic ring includes an aromatic ring containing a hetero atom.

The organic group having no aromatic ring as R ₂₀₁ to R ₂₀₃ is a 1 to 30 carbon atoms for example, preferably 1 to 20.

R _{201 to} R ₂₀₃ are preferably each independently an alkyl group, a 2-oxoalkyl group, an alkoxycarbonylmethyl group, an allyl group, or a vinyl group. A linear, branched or cyclic 2-oxoalkyl group or an alkoxycarbonylmethyl group is more preferable, and a linear or branched 2-oxoalkyl group is particularly preferable.

The alkyl group as R ₂₀₁ to R ₂₀₃ may be linear, branched chain and may be any of circular, preferred examples are straight chain or branched chain alkyl group (e.g., methyl group having 1 to 10 carbon atoms, An ethyl group, a propyl group, a butyl group or a pentyl group) and a cycloalkyl group having 3 to 10 carbon atoms (a cyclopentyl group, a cyclohexyl group or a norbornyl group).

The 2-oxoalkyl group as R _{201 to} R ₂₀₃ may be linear, branched or cyclic, and preferably includes a group having> C═O at the 2-position of the above alkyl group. .

Preferred examples of the alkoxy group in the alkoxycarbonylmethyl group as R ₂₀₁ to R ₂₀₃ is an alkoxy group having 1 to 5 carbon atoms (a methoxy group, an ethoxy group, a propoxy group, a butoxy group, pentoxy group).

R _{201 to} R ₂₀₃ may be further substituted with, for example, a halogen atom, an alkoxy group (eg, having 1 to 5 carbon atoms), a hydroxyl group, a cyano group, and / or a nitro group.

Two of R ₂₀₁ to R ₂₀₃ is bonded to each other, they may form a ring structure. This ring structure may contain an oxygen atom, a sulfur atom, an ester bond, an amide bond and / or a carbonyl group in the ring. The two of the group formed by bonding of the R ₂₀₁ to R _203, for example, an alkylene group (e.g., butylene or pentylene group).

Next, the compound (ZI-3) will be described.
The compound (ZI-3) is a compound represented by the following general formula (ZI-3), and is a compound having a phenacylsulfonium salt structure.

In the formula, R _{1c to} R _5c each independently represent a hydrogen atom, an alkyl group, an alkoxy group, or a halogen atom. As for carbon number of an alkyl group and an alkoxy group, 1-6 are preferable.
R _6c and R _7c represent a hydrogen atom or an alkyl group. As for carbon number of an alkyl group, 1-6 are preferable.
R _x and R _y each independently represents an alkyl group, a 2-oxoalkyl group, an alkoxycarbonylmethyl group, an allyl group, or a vinyl group. As for carbon number of these atomic groups, 1-6 are preferable.

Any two or more of R _{1c to} R _7c may be bonded to each other to form a ring structure. Further, R _x and R _y may be bonded to form a ring structure. These ring structures may contain an oxygen atom, a sulfur atom, an ester bond and / or an amide bond.

X in the general formula (ZI-3) ^- is, X in formula (ZI) ^- is synonymous.

  Specific examples of the compound (ZI-3) are described in the compounds exemplified in paragraphs 0046 and 0047 of JP-A-2004-233661 or paragraphs 0040-0046 of JP-A-2003-35948. Compounds.

Subsequently, the compound (ZI-4) will be described.
The compound (ZI-4) is a compound having a cation represented by the following general formula (ZI-4). This compound (ZI-4) is effective in suppressing outgassing.

In general formula (ZI-4),
R ^{1 to} R ¹³ each independently represents a hydrogen atom or a substituent. At least one of R ^{1 to} R ¹³ is preferably a substituent containing an alcoholic hydroxyl group. Here, “alcoholic hydroxyl group” means a hydroxyl group bonded to a carbon atom of an alkyl group.
Z is a single bond or a divalent linking group.

When R ^{1 to} R ¹³ are substituents containing an alcoholic hydroxyl group, R ^{1 to} R ¹³ are preferably groups represented by — (W—Y). Here, Y is an alkyl group substituted with a hydroxyl group, and W is a single bond or a divalent linking group.

Preferable examples of the alkyl group represented by Y include an ethyl group, a propyl group, and an isopropyl group. Y particularly preferably includes a structure represented by —CH ₂ CH ₂ OH.

  The divalent linking group represented by W is not particularly limited, but preferably a single bond, an alkoxy group, an acyloxy group, an acylamino group, an alkyl and arylsulfonylamino group, an alkylthio group, an alkylsulfonyl group, an acyl group, A divalent group in which an arbitrary hydrogen atom in an alkoxycarbonyl group or a carbamoyl group is replaced by a single bond, and more preferably an arbitrary hydrogen atom in a single bond, an acyloxy group, an alkylsulfonyl group, an acyl group or an alkoxycarbonyl group. It is a divalent group replaced by a single bond.

When R ^{1 to} R ¹³ are substituents containing an alcoholic hydroxyl group, the number of carbon atoms contained is preferably 2 to 10, more preferably 2 to 6, and particularly preferably 2 to 4.

The substituent containing an alcoholic hydroxyl group as R ^{1 to} R ¹³ may have two or more alcoholic hydroxyl groups. The number of the alcoholic hydroxyl group which the substituent containing the alcoholic hydroxyl group as R < ¹ > -R < ¹³ > has is 1-6, Preferably it is 1-3, More preferably, it is 1.

The number of alcoholic hydroxyl groups possessed by the compound represented by the general formula (ZI-4) is 1 to 10, preferably 1 to 6, more preferably 1 to 3 in total for R ^{1 to} R ^13. is there.

When R ^{1 to} R ¹³ do not contain an alcoholic hydroxyl group, examples of the substituent as R ^{1 to} R ¹³ include a halogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, a cycloalkenyl group, an alkynyl group, and an aryl group. , Heterocyclic group, cyano group, nitro group, carboxy group, alkoxy group, aryloxy group, silyloxy group, heterocyclic oxy group, acyloxy group, carbamoyloxy group, alkoxycarbonyloxy group, aryloxycarbonyloxy group, amino group ( Anilino group), ammonio group, acylamino group, aminocarbonylamino group, alkoxycarbonylamino group, aryloxycarbonylamino group, sulfamoylamino group, alkyl and arylsulfonylamino group, mercapto group, alkylthio group, arylthio group, Duplicate Ring thio group, sulfamoyl group, sulfo group, alkyl and arylsulfinyl group, alkyl and arylsulfonyl group, acyl group, aryloxycarbonyl group, alkoxycarbonyl group, carbamoyl group, aryl and heterocyclic azo group, imide group, phosphino group, Phosphinyl group, phosphinyloxy group, phosphinylamino group, phosphono group, silyl group, hydrazino group, ureido group, boronic acid group [—B (OH) ₂ ], phosphato group [—OPO (OH) ₂ ], Examples thereof include a sulfato group (—OSO ₃ H) and other known substituents.

When R ^{1 to} R ¹³ do not contain an alcoholic hydroxyl group, R ^{1 to} R ¹³ are preferably a hydrogen atom, a halogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, a cycloalkenyl group, an alkynyl group, an aryl group, Cyano group, carboxy group, alkoxy group, aryloxy group, acyloxy group, carbamoyloxy group, acylamino group, aminocarbonylamino group, alkoxycarbonylamino group, aryloxycarbonylamino group, sulfamoylamino group, alkyl and arylsulfonylamino Group, alkylthio group, arylthio group, sulfamoyl group, alkyl and arylsulfonyl group, aryloxycarbonyl group, alkoxycarbonyl group, carbamoyl group, imide group, silyl group or ureido group.

When R ^{1 to} R ¹³ do not contain an alcoholic hydroxyl group, R ^{1 to} R ¹³ are more preferably a hydrogen atom, a halogen atom, an alkyl group, a cycloalkyl group, a cyano group, an alkoxy group, an acyloxy group, an acylamino group, An aminocarbonylamino group, an alkoxycarbonylamino group, an alkyl and arylsulfonylamino group, an alkylthio group, a sulfamoyl group, an alkyl and arylsulfonyl group, an alkoxycarbonyl group or a carbamoyl group.

When R ^{1 to} R ¹³ do not contain an alcoholic hydroxyl group, R ^{1 to} R ¹³ are particularly preferably a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, or an alkoxy group.

Two adjacent ones of R ^{1 to} R ¹³ may be bonded to each other to form a ring structure. This ring structure includes aromatic and non-aromatic hydrocarbon rings and heterocycles. These ring structures may be further combined to form a condensed ring.

The compound (ZI-4) preferably has a structure in which at least one of R ^{1 to} R ¹³ contains an alcoholic hydroxyl group, and more preferably at least one of R ^{9 to} R ¹³ is alcoholic. It has a structure containing a hydroxyl group.

  Z represents a single bond or a divalent linking group as described above. Examples of the divalent linking group include an alkylene group, an arylene group, a carbonyl group, a sulfonyl group, a carbonyloxy group, a carbonylamino group, a sulfonylamide group, an ether group, a thioether group, an amino group, a disulfide group, an acyl group, Examples thereof include an alkylsulfonyl group, -CH = CH-, an aminocarbonylamino group, and an aminosulfonylamino group.

This divalent linking group may have a substituent. As these substituents, for example, those similar to those listed above for R ^{1 to} R ¹³ can be mentioned.

  Z is preferably a single bond, an alkylene group, an arylene group, an ether group, a thioether group, an amino group, a bond having no electron withdrawing property such as —CH═CH—, an aminocarbonylamino group, and an aminosulfonylamino group, or It is a group. Z is more preferably a single bond, an ether group or a thioether group, and particularly preferably a single bond.

  Hereinafter, general formulas (ZII) and (ZIII) will be described.

In formula (ZII) and (ZIII), R ₂₀₄ ~R ₂₀₇ each independently represents an aryl group, an alkyl group or a cycloalkyl group. These aryl group, alkyl group and cycloalkyl group may have a substituent.

Preferable examples of the aryl group as R _{204 to} R ₂₀₇ include the same groups as those enumerated above for R _{201 to} R ₂₀₃ in the compound (ZI-1).
Preferable examples of the alkyl group and cycloalkyl group as R _{204 to} R ₂₀₇ include the straight chain, branched chain, or cycloalkyl group listed above for R _{201 to} R ₂₀₃ in compound (ZI-2).

In addition, X < ^- > in general formula (ZII) and (ZIII) is synonymous with X < ^- > in general formula (ZI).

Other preferred examples of the photoacid generator include compounds represented by the following general formula (ZIV), (ZV) or (ZVI).

In general formulas (ZIV) to (ZVI),
Ar ₃ and Ar ₄ each independently represents a substituted or unsubstituted aryl group.
R ₂₀₈ represents an alkyl group, a cycloalkyl group, or an aryl group independently in the general formulas (ZV) and (ZVI). These alkyl group, cycloalkyl group and aryl group may be substituted or unsubstituted.
These groups are preferably substituted with a fluorine atom. If it carries out like this, it will become possible to raise the intensity | strength of the acid which a photo-acid generator generate | occur | produces.

R ₂₀₉ and R ₂₁₀ each independently represents an alkyl group, a cycloalkyl group, an aryl group, or an electron-withdrawing group. These alkyl group, cycloalkyl group, aryl group and electron-withdrawing group may be substituted or unsubstituted.
Preferable R ₂₀₉ includes a substituted or unsubstituted aryl group.
Preferable R ₂₁₀ includes an electron withdrawing group. Preferred examples of the electron withdrawing group include a cyano group and a fluoroalkyl group.

  A represents an alkylene group, an alkenylene group or an arylene group. These alkylene group, alkenylene group and arylene group may have a substituent.

A compound having a plurality of structures represented by the general formula (ZVI) is also preferable as the photoacid generator. Such compounds, for example, binding to _{R 209} or _{R 210} of the compound represented by the general formula (ZVI), and the _{R 209} or _{R 210} of another compound represented by the general formula (ZVI) together And a compound having the above structure.

  As the photoacid generator, compounds represented by general formulas (ZI) to (ZIII) are more preferable, compounds represented by general formula (ZI) are more preferable, and compounds (ZI-1) to (ZI-3) are more preferable. Is particularly preferred.

Specific examples of the photoacid generator are shown below, but the scope of the present invention is not limited thereto.

  In addition, a photo-acid generator may be used individually by 1 type, and may be used in combination of 2 or more type. When two or more types are used in combination, it is preferable to combine two types of compounds that generate two types of organic acids that differ in the total number of atoms excluding hydrogen atoms by two or more.

  The content of the photoacid generator is preferably 0.1 to 40% by mass, more preferably 0.5 to 30% by mass, and still more preferably 1 to 40% by mass, based on the total solid content of the composition. 20% by mass.

<Other ingredients>
The composition according to the present invention comprises a basic compound, a resin that decomposes by the action of an acid and increases the dissolution rate in an aqueous alkaline solution, an organic solvent, a surfactant, an acid-decomposable dissolution inhibiting compound, a dye, a plasticizer, and a photosensitizer. It may further contain a sensitizer, a compound that promotes dissolution in a developer, a compound having a proton acceptor functional group, and the like.

(Basic compound)
The composition according to the present invention may further contain a basic compound. When a basic compound is further contained, it is possible to further reduce the change in performance over time between exposure and heating (post-bake). This also makes it possible to control the diffusibility of the acid generated by exposure in the film.

  This basic compound is preferably a nitrogen-containing organic compound. Although the compound which can be used is not specifically limited, For example, the compound classified into the following (1)-(4) can be used.

(1) Compound represented by the following general formula (BS-1)

In general formula (BS-1),
Each R independently represents a hydrogen atom or an organic group. However, at least one of the three Rs is an organic group. This organic group is a linear or branched alkyl group, a monocyclic or polycyclic cycloalkyl group, an aryl group, or an aralkyl group.

Although carbon number of the alkyl group as R is not specifically limited, Usually, it is 1-20, Preferably it is 1-12.
Although carbon number of the cycloalkyl group as R is not specifically limited, Usually, it is 3-20, Preferably it is 5-15.

Although carbon number of the aryl group as R is not specifically limited, Usually, it is 6-20, Preferably it is 6-10. Specific examples include a phenyl group and a naphthyl group.
Although carbon number of the aralkyl group as R is not specifically limited, Usually, it is 7-20, Preferably it is 7-11. Specific examples include a benzyl group.

In the alkyl group, cycloalkyl group, aryl group and aralkyl group as R, a hydrogen atom may be substituted with a substituent. Examples of the substituent include an alkyl group, a cycloalkyl group, an aryl group, an aralkyl group, a hydroxyl group, a carboxy group, an alkoxy group, an aryloxy group, an alkylcarbonyloxy group, and an alkyloxycarbonyl group.
In the compound represented by the general formula (BS-1), it is preferable that at least two of R are organic groups.

  Specific examples of the compound represented by the general formula (BS-1) include tri-n-butylamine, tri-n-pentylamine, tri-n-octylamine, tri-n-decylamine, triisodecylamine, dicyclohexyl. Methylamine, tetradecylamine, pentadecylamine, hexadecylamine, octadecylamine, didecylamine, methyloctadecylamine, dimethylundecylamine, N, N-dimethyldodecylamine, methyldioctadecylamine, N, N-dibutylaniline, N , N-dihexylaniline, 2,6-diisopropylaniline, and 2,4,6-tri (t-butyl) aniline.

  Moreover, as a preferable basic compound represented by the general formula (BS-1), a compound in which at least one R is an alkyl group substituted with a hydroxyl group can be given. Specific examples include triethanolamine and N, N-dihydroxyethylaniline.

In addition, the alkyl group as R may have an oxygen atom in the alkyl chain. That is, an oxyalkylene chain may be formed. As the oxyalkylene chain, —CH ₂ CH ₂ O— is preferable. Specifically, for example, tris (methoxyethoxyethyl) amine and compounds exemplified in the 60th and subsequent lines of column 3 of US6040112 can be mentioned.

(2) Compound having nitrogen-containing heterocyclic structure This nitrogen-containing heterocyclic ring may have aromaticity or may not have aromaticity. Moreover, you may have two or more nitrogen atoms. Furthermore, you may contain hetero atoms other than nitrogen. Specifically, for example, compounds having an imidazole structure (2-phenylbenzimidazole, 2,4,5-triphenylimidazole, etc.), compounds having a piperidine structure [N-hydroxyethylpiperidine and bis (1,2,2) , 6,6-pentamethyl-4-piperidyl) sebacate], compounds having a pyridine structure (such as 4-dimethylaminopyridine), and compounds having an antipyrine structure (such as antipyrine and hydroxyantipyrine).

  A compound having two or more ring structures is also preferably used. Specific examples include 1,5-diazabicyclo [4.3.0] non-5-ene and 1,8-diazabicyclo [5.4.0] -undec-7-ene.

(3) Amine compound having a phenoxy group An amine compound having a phenoxy group is a compound having a phenoxy group at the terminal opposite to the N atom of the alkyl group contained in the amine compound. The phenoxy group is, for example, a substituent such as an alkyl group, an alkoxy group, a halogen atom, a cyano group, a nitro group, a carboxy group, a carboxylic acid ester group, a sulfonic acid ester group, an aryl group, an aralkyl group, an acyloxy group, and an aryloxy group. You may have.

This compound more preferably has at least one oxyalkylene chain between the phenoxy group and the nitrogen atom. The number of oxyalkylene chains in one molecule is preferably 3-9, more preferably 4-6. Among the oxyalkylene chains, —CH ₂ CH ₂ O— is particularly preferable.

  Specific examples include 2- [2- {2- (2,2-dimethoxy-phenoxyethoxy) ethyl} -bis- (2-methoxyethyl)]-amine and paragraph [0066] of US2007 / 0224539A1. ] (C1-1) to (C3-3) exemplified in the above.

(4) Ammonium salt Ammonium salts can also be used as appropriate. This ammonium salt is preferably a hydroxide or a carboxylate. More specifically, tetraalkylammonium hydroxide such as tetrabutylammonium hydroxide is preferable.

  Other examples that can be used in the composition according to the present invention include compounds synthesized in Examples of JP-A No. 2002-363146, and compounds described in paragraph 0108 of JP-A No. 2007-298869. It is done.

  Moreover, you may use a photosensitive basic compound as a basic compound. As the photosensitive basic compound, for example, JP 2003-524799 A and J. Org. Photopolym. Sci & Tech. Vol. 8, P.I. 543-553 (1995) etc. can be used.

  The molecular weight of the basic compound is preferably 250 to 2000, and more preferably 400 to 1000.

These basic compounds are used alone or in combination of two or more.
The content of the basic compound is preferably 0.01 to 8.0% by mass, more preferably 0.1 to 5.0% by mass, based on the total solid content of the composition. It is particularly preferred that the content is 2 to 4.0% by mass.

(Resin that decomposes by the action of acid and increases the dissolution rate in alkaline aqueous solution)
The composition according to the present invention may further contain a resin that decomposes by the action of an acid and increases the dissolution rate in an alkaline aqueous solution.

  Resins that decompose by the action of an acid to increase the dissolution rate in an alkaline aqueous solution (hereinafter also referred to as “acid-decomposable resin”) are typically groups that decompose by the action of an acid to produce an alkali-soluble group (hereinafter referred to as “acid-decomposable resin”). , Also referred to as an acid-decomposable group). This resin may have an acid-decomposable group in one of the main chain and the side chain, or in both of them. This resin preferably has an acid-decomposable group in the side chain.

  The acid-decomposable resin is, for example, disclosed in European Patent No. 254853, JP-A-2-25850, JP-A-3-223860 and JP-A-4-251259. It can be obtained by reacting a precursor of a group capable of leaving by reaction or copolymerizing an alkali-soluble resin monomer to which a group capable of leaving by the action of an acid is bonded with various monomers.

As the acid-decomposable group, a group in which a hydrogen atom of an alkali-soluble group such as a —COOH group and a —OH group is substituted with a group capable of leaving by the action of an acid is preferable.
Specific examples and preferred examples of the acid-decomposable group include the same as those described for the acid-decomposable unit that can be contained in the acid-proliferating agent-supporting resin.

The resin having an alkali-soluble group described above is not particularly limited. For example, a resin containing a phenolic hydroxyl group and a resin containing a repeating unit having a carboxy group such as (meth) acrylic acid and norbornenecarboxylic acid can be used. Can be mentioned.
The resin containing a phenolic hydroxyl group is preferably poly (o-hydroxystyrene), poly (m-hydroxystyrene), poly (p-hydroxystyrene), a copolymer thereof, or hydrogenated poly (hydroxystyrene). And having a hydroxystyrene structural unit such as a poly (hydroxystyrene) having a substituent represented by the following structure, a styrene-hydroxystyrene copolymer, an α-methylstyrene-hydroxystyrene copolymer, and a hydrogenated novolak resin. Resin.

  The alkali dissolution rate of these resins is preferably at least 170 kg / second as measured at 23 ° C. using 2.38 mass% tetramethylammonium hydroxide (TMAH). Particularly preferably, it is 330 Å / second or more.

  Examples of monomers that can be used as raw materials for these resins include alkylcarbonyloxystyrene (for example, t-butoxycarbonyloxystyrene), alkoxystyrene (for example, 1-alkoxyethoxystyrene or t-butoxystyrene), and (meta ) Acrylic acid tertiary alkyl ester (for example, t-butyl (meth) acrylate or 2-alkyl-2-adamantyl (meth) acrylate or dialkyl (1-adamantyl) methyl (meth) acrylate).

  The content of the group capable of decomposing with an acid is determined by the formula B according to the number of groups (B) capable of decomposing with an acid in the resin and the number of alkali-soluble groups not protected by a group capable of leaving with an acid (S). / (B + S). This content is preferably 0.01 to 0.7, more preferably 0.05 to 0.50, and still more preferably 0.05 to 0.40.

  When the composition of the present invention is irradiated with KrF excimer laser light, electron beam, X-ray, or high-energy light having a wavelength of 50 nm or less (for example, EUV), the acid-decomposable resin is a repeating unit having an aromatic group. It is preferable that it contains. In particular, it is preferable that hydroxystyrene is contained as a repeating unit. Examples of such a resin include a copolymer of hydroxystyrene and a hydroxystyrene protected with a group capable of leaving by the action of an acid, or a copolymer of hydroxystyrene and a tertiary alkyl ester of (meth) acrylic acid. Coalescence is mentioned.

As the acid-decomposable resin, a resin having a repeating unit represented by the general formula (VI) and a repeating unit represented by the general formula (IA) is particularly preferable.

In the formula, R ₀₁ , R ₀₂ , R ₀₃ , Ar ₁ , n, and Y are as defined above.

  The acid-decomposable resin may have a repeating unit derived from another polymerizable monomer. Examples of these other polymerizable monomers include, for example, addition-polymerizable monomers selected from (meth) acrylic acid esters, (meth) acrylamides, allyl compounds, vinyl ethers, vinyl esters, styrenes, and crotonic acid esters. A compound having one saturated bond. The content of repeating units derived from these other polymerizable monomers is generally 50 mol% or less, preferably 30 mol% or less, based on all repeating units.

  The content of the repeating unit having an alkali-soluble group such as a hydroxyl group, a carboxy group, and a sulfonic acid group is preferably 1 to 99 mol%, more preferably 3 to 95 mol% in all repeating units constituting the acid-decomposable resin. Particularly preferred is 5 to 90 mol%.

  The content of the repeating unit having an acid-decomposable group is preferably from 3 to 95 mol%, more preferably from 5 to 90 mol%, particularly preferably from 10 to 85 mol% in all repeating units constituting the acid-decomposable resin. It is.

The weight average molecular weight of the acid-decomposable resin is preferably 50,000 or less, more preferably 1,000 to 20,000, and particularly preferably 1,000 to 10,000 as a polystyrene-converted value by the GPC method. It is.
The dispersity (Mw / Mn) of the acid-decomposable resin is preferably 1.0 to 3.0, more preferably 1.05 to 2.0, and still more preferably 1.1 to 1.7. is there.

  Two or more acid-decomposable resins may be used in combination.

Although the preferable specific example of an acid-decomposable resin is shown below, the scope of the present invention is not limited to these.

  The blending amount of the acid-decomposable resin excluding the acid-proliferating agent-supporting resin in the composition is preferably 1.0 to 70% by mass, and 3.0 to 50% by mass based on the total solid content of the composition. % Is more preferable, and 5.0 to 30% by mass is even more preferable.

(Surfactant)
The composition according to the present invention preferably further contains a surfactant. As this surfactant, fluorine-based and / or silicon-based surfactants are particularly preferable.

  Examples of the surfactant include Megafac F176 and Megafac R08 manufactured by Dainippon Ink & Chemicals, Inc., PF656 and PF6320 manufactured by OMNOVA, Troisol S-366 manufactured by Troy Chemical Co., Ltd., Sumitomo 3M ( Fluorard FC430 manufactured by Co., Ltd. and polysiloxane polymer KP-341 manufactured by Shin-Etsu Chemical Co., Ltd. may be mentioned.

  In addition, surfactants other than fluorine-based and / or silicon-based surfactants can be used. More specific examples include polyoxyethylene alkyl ethers and polyoxyethylene alkyl aryl ethers.

  In addition, known surfactants can be used as appropriate. Examples of the surfactant that can be used include surfactants described in [0273] and after in US 2008 / 0248425A1.

Surfactant may be used independently and may use 2 or more types together.
The amount of the surfactant used is preferably 0.0001 to 2% by mass, more preferably 0.001 to 1% by mass, based on the total solid content of the composition.

(solvent)
The solvent that can be used in preparing the composition is not particularly limited as long as it dissolves each component. For example, alkylene glycol monoalkyl ether carboxylate (such as propylene glycol monomethyl ether acetate), alkylene glycol monoalkyl ether (Such as propylene glycol monomethyl ether), lactic acid alkyl esters (such as ethyl lactate and methyl lactate), cyclic lactones (such as γ-butyrolactone, preferably 4 to 10 carbon atoms), chain or cyclic ketones (such as 2-heptanone and cyclohexanone) , Preferably 4 to 10 carbon atoms), alkylene carbonate (such as ethylene carbonate and propylene carbonate), alkyl carboxylate (preferably alkyl acetate such as butyl acetate), and alkoxy Alkyl acetate (preferably ethyl ethoxypropionate), and the like. Other usable solvents include, for example, the solvents described in US2008 / 0248425A1 [0244] and thereafter.

  Of the above solvents, alkylene glycol monoalkyl ether carboxylate, alkylene glycol monoalkyl ether, and ethyl lactate are particularly preferred.

  These solvents may be used alone or in combination of two or more. When using 2 or more types mixed, it is preferable to mix the solvent which has a hydroxyl group, and the solvent which does not have a hydroxyl group. The mass ratio of the solvent having a hydroxyl group and the solvent having no hydroxyl group is from 1/99 to 99/1, preferably from 10/90 to 90/10, and more preferably from 20/80 to 60/40. .

  The solvent having a hydroxyl group is preferably alkylene glycol monoalkyl ether or alkyl lactate ester, and the solvent not having a hydroxyl group is preferably alkylene glycol monoalkyl ether carboxylate.

  Although the usage-amount of a solvent is not specifically limited, It prepares so that the total solid content concentration of a composition becomes 0.5-30 weight% preferably, More preferably, it becomes 1.0-10 mass%. In particular, when electron beam or EUV lithography is performed using the composition of the present invention, it is preferably 2.0 to 6.0 mass%, more preferably 2.0 to 4.5 mass%.

(Dissolution-inhibiting compound having a molecular weight of 3000 or less, which decomposes by the action of an acid and increases its solubility in an alkaline developer)
As a dissolution-inhibiting compound having a molecular weight of 3000 or less (hereinafter also referred to as “dissolution-inhibiting compound”) that is decomposed by the action of an acid to increase the solubility in an alkaline developer, it does not lower the permeability of 220 nm or less. An alicyclic or aliphatic compound containing an acid-decomposable group is preferred, such as a cholic acid derivative containing an acid-decomposable group described in SPIE, 2724, 355 (1996). Examples of the acid-decomposable group include the same groups as those described above for the acid-decomposable unit.

  When the composition according to the present invention is exposed with a KrF excimer laser or irradiated with an electron beam, the dissolution inhibiting compound is a compound containing a structure in which the phenolic hydroxyl group of the phenol compound is substituted with an acid-decomposable group. Is preferred. As a phenol compound, what contains 1-9 phenol frame | skeleton is preferable, and what contains 2-6 pieces is still more preferable.

  The addition amount of the dissolution inhibiting compound is preferably 3 to 50 mass%, more preferably 5 to 40 mass%, based on the total solid content of the composition.

Specific examples of the dissolution inhibiting compound are shown below, but the present invention is not limited thereto.

(Other additives)
The composition according to the present invention includes a dye, a plasticizer, a photosensitizer, a light absorber, and a compound that promotes dissolution in a developer (for example, a phenol compound having a molecular weight of 1000 or less, or a carboxy group, if necessary). Can be further contained. Moreover, the compound provided with the proton acceptor functional group described in Unexamined-Japanese-Patent No. 2006-208781 and 2007-286574 grade | etc., Can also be used suitably.

<Pattern formation method>
The composition according to the present invention is typically used as follows. That is, the composition according to the present invention is typically applied on a support such as a substrate to form a film. The thickness of this film is preferably 0.02 to 0.1 μm. As a method of coating on the substrate, spin coating is preferable, and the rotation speed is preferably 1000 to 3000 rpm.

  For example, the composition can be applied to a substrate (eg, silicon / silicon dioxide coating, silicon nitride and chromium-deposited quartz substrate, etc.) used in the manufacture of precision integrated circuit elements, etc., by appropriate application such as a spinner and a coater It is applied by the method. Thereafter, this is dried to obtain an actinic ray-sensitive or radiation-sensitive film (hereinafter also referred to as a photosensitive film). In addition, a known antireflection film can be applied in advance.

  Next, the photosensitive film is irradiated with actinic rays or radiation, preferably baked (heated), and then developed. By baking, the generation of sulfonic acid from the above-described acid proliferator unit can be promoted. Therefore, this makes it possible to obtain a better pattern. The baking temperature is preferably 80 ° C. to 150 ° C., more preferably 90 ° C. to 130 ° C., from the viewpoints of sensitivity and stability.

Examples of actinic rays or radiation include infrared light, visible light, ultraviolet light, far ultraviolet light, X-rays, and electron beams. As these actinic rays or radiation, for example, those having a wavelength of 250 nm or less, particularly 220 nm or less are more preferable. Examples of such actinic rays or radiation include KrF excimer laser (248 nm), ArF excimer laser (193 nm), F ₂ excimer laser (157 nm), X-rays, and electron beams. Particularly preferred actinic rays or radiation include ArF excimer laser, F ₂ excimer laser, EUV (13 nm) and electron beam.

  Note that exposure with a liquid having a refractive index higher than air (such as pure water) between the photosensitive film and the lens, that is, immersion exposure, may be performed during irradiation with actinic rays or radiation. Thereby, the resolution can be increased. In this case, an immersion liquid hardly soluble film (also referred to as “top coat”) may be provided on the film between the film and the immersion liquid in order to avoid contact between the film and the immersion liquid. . Further, as another means for avoiding contact between the membrane and the immersion liquid, a hydrophobic resin (HR) may be added in advance to the aforementioned composition. Specific examples of the hydrophobic resin (HR) include resins described in paragraphs 0172 to 0253 of US2008 / 0305432A1.

In the development process, an alkaline developer is usually used.
Examples of the alkaline developer include inorganic alkalis such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium silicate, sodium metasilicate and aqueous ammonia, primary amines such as ethylamine and n-propylamine, diethylamine and Secondary amines such as di-n-butylamine, tertiary amines such as triethylamine and methyldiethylamine, alcohol amines such as dimethylethanolamine and triethanolamine, and fourth amines such as tetramethylammonium hydroxide and tetraethylammonium hydroxide. Examples include alkaline aqueous solutions containing a quaternary ammonium salt or cyclic amines such as pyrrole and pihelidine.

An appropriate amount of alcohol and / or surfactant may be added to the alkaline developer.
The concentration of the alkali developer is usually from 0.1 to 20% by mass. The pH of the alkali developer is usually from 10.0 to 15.0.

  For details of the process for producing an imprint mold using the composition according to the present invention, see, for example, Japanese Patent No. 4109085, Japanese Patent Application Laid-Open No. 2008-162101, and “Nanoimprint Basics and Technology Development”・ Application development-Nanoimprint substrate technology and latest technological development-Editing: Yoshihiko Hirai (Frontier Publishing)

  EXAMPLES Hereinafter, although an Example demonstrates this invention further in detail, the content of this invention is not limited by this.

<Acid propagating agent-carrying resin>
[Synthesis]
Resins P-1 to P-26 shown in Table 1 below were synthesized as acid proliferation agent-carrying resins as follows. In Table 1, the columns of “monomer (1)” to “monomer (4)” describe the structure of the monomer used as a raw material for each resin. In the column of composition ratio, the molar ratio of each repeating unit corresponding to each monomer is described. And the column of “Mw” describes the weight average molecular weight in terms of polystyrene measured using GPC (solvent: NMP). In the column “MWD”, the degree of dispersion Mw / Mn is described.

<Synthesis of Compound (A-1)>
Compound (A-1) used as monomer (3) for resin P-6 was synthesized as follows. That is, first, an alcohol represented by the following formula (3.9 g, 20.1 mmol) was mixed with 30 ml of methylene chloride and triethylamine (7.8 g, 77.5 mmol).

  Next, 4-vinylbenzenesulfonyl chloride (4.1 g, 20.1 mmol) and dimethylaminopyridine (98.1 mg, 0.8 mmol) were added to the obtained mixed solution, and the mixture was stirred at room temperature for 2 hours. Subsequently, 50 ml of water was added, the organic layer was extracted with 100 ml of ethyl acetate, and the organic layer was further washed with 50 ml of water three times. Further, the organic layer was washed with 50 ml of a saturated aqueous solution of sodium bicarbonate and 50 ml of a saturated aqueous solution of sodium chloride, dried over magnesium sulfate, and evaporated under reduced pressure. The obtained crystals were recrystallized from isopropyl alcohol to obtain 3.2 g of compound (A-1).

¹ H-NMR (400 MHz, CDCl ₃ ): δ 2.28 (t, 2H, J = 7.2Hz), 3.75-3.68 (m, 2H), 4.80-4.90 (m, 2H), 4.18 (t, 2H, J = 7.2 Hz), 5.47 (d, 1H, J = 11.2Hz), 5.91 (d, 1H, J = 17.6Hz), 6.76 (dd, 1H, J = 17.6, 11.2Hz), 7.25-7.40 (m, 3H ), 7.54 (d, 2H, J = 8.0Hz), 7.82 (d, 2H, J = 9.2Hz)
<Synthesis of other monomers>
The compound was synthesized in the same manner as described above for compound (A-1). That is, it was synthesized by reacting the corresponding alcohol and sulfonic acid halide under basic conditions.

[Synthesis Example 1: Synthesis of Resin (P-6)]
4.97 parts by weight of 4-hydroxystyrene, 4.02 parts by weight of monomer (M-4), 1.01 parts by weight of monomer (A-1), and 9.29 parts by weight of 1-methoxy-2 A mixed solution of -propanol and 1.02 parts by mass of 2,2′-azobis (2,4-dimethylvaleronitrile) [V-65; manufactured by Wako Pure Chemical Industries, Ltd.] was prepared.
9.29 parts by mass of 1-methoxy-2-propanol was heated to 65 ° C. under a nitrogen stream. Then, said mixed solution was dripped over 2 hours, stirring this liquid. After completion of dropping, the mixture was further stirred at 65 ° C. for 2 hours. Next, 1.02 parts by mass of 2,2′-azobis (2,4-dimethylvaleronitrile) [V-65, manufactured by Wako Pure Chemical Industries, Ltd.] was further added, and the mixture was further stirred at 65 ° C. for 2 hours. did.
The reaction solution was allowed to cool and then reprecipitated using a large amount of hexane / ethyl acetate. Then, this was subjected to vacuum drying to obtain 7.0 parts by mass of a resin (P-6).

[Synthesis Example 2: Synthesis of Resins (P-1) to (P-5) and (P-7) to (P-26)]
Resins (P-1) to (P-5) and (P-7) to (P-26) were synthesized in the same manner as the resin (P-6) except that the monomer used was changed.

[Comparative compound]
Comparative compounds 1 to 4 shown in Table 1 were prepared. In addition, the following compound X was prepared.

<Photo acid generator>
As the photoacid generator, at least one of (z1) to (z102) listed above was used.

<Basic compound>
Any of the following compounds C-1 to C-5 was used as the basic compound.
C-1: 2,4,5-triphenylimidazole C-2: Tetrabutylammonium hydroxide C-3: 1,5-diazabicyclo [4.3.0] non-5-ene C-4:

C-5:

<Surfactant>
As the surfactant, any of the following W-1 to W-4 was used.
W-1: MegaFuck F176 (Dainippon Ink Chemical Co., Ltd .; fluorine-based)
W-2: Megafuck R08 (Dainippon Ink Chemical Co., Ltd .; fluorine and silicon)
W-3: Polysiloxane polymer KP-341 (manufactured by Shin-Etsu Chemical Co., Ltd .; silicon-based)
W-4: Troisol S-366 (manufactured by Troy Chemical Co., Ltd .; fluorine-based)
<Solvent>
As the solvent, the following A1 to A4 and B1 and B2 were used. In addition, these solvents were used by being appropriately mixed.
A1: Propylene glycol monomethyl ether acetate A2: 2-heptanone A3: Cyclohexanone A4: γ-butyrolactone B1: Propylene glycol monomethyl ether B2: Ethyl lactate <Example A>
(Examples 1A to 12A and Comparative Examples 1A to 3A)
(Resist preparation)
The components shown in Table 2 below were dissolved in a solvent to prepare a solution having a solid concentration of 4.0% by mass. This solution was filtered using a polytetrafluoroethylene filter having a pore size of 0.1 μm to obtain a positive resist solution.

(Resist evaluation)
First, an antireflection film DUV-42 manufactured by Brewer Science Co., Ltd. was uniformly applied to 60 nm on a silicon substrate subjected to hexamethyldisilazane treatment using a spin coater. Next, after drying on a hot plate at 100 ° C. for 90 seconds, heat drying was performed at 190 ° C. for 240 seconds. Thereafter, each positive resist solution was applied using a spin coater and dried at 120 ° C. for 90 seconds to form a resist film having a thickness of 0.12 μm.

  This resist film was exposed with an ArF excimer laser stepper (manufactured by ISI; NA = 0.6) through a mask, and immediately after the exposure, it was heated on a hot plate at 120 ° C. for 90 seconds. Further, development was performed at 23 ° C. for 60 seconds using an aqueous 2.38 mass% tetramethylammonium hydroxide solution, rinsed with pure water for 30 seconds, and then dried to obtain a line pattern.

[Sensitivity, Resolution (γ)]
Surface exposure was performed while changing the exposure amount by 0.5 mJ in the range of 10 to 45 mJ / cm ² , and baking was performed at 110 ° C. for 90 seconds. Then, using a 2.38 mass% tetramethylammonium hydroxide (TMAH) aqueous solution, the dissolution rate at each exposure amount was measured to obtain a dissolution rate curve.
In this dissolution rate curve, the exposure amount when the dissolution rate of the resist is saturated was taken as sensitivity, and the resolution (γ value) was calculated from the slope of the linear portion of the dissolution rate curve. The larger the γ value, the better the dissolution contrast.

[Pattern shape, line edge roughness (LER)]
The exposure amount for reproducing a mask pattern having a line width of 150 nm and a line and space (L / S = 1/1) was set as the optimum exposure amount, and the profile at the optimum exposure amount was observed with a scanning microscope (SEM). In this pattern, the distance from the reference line where there should be an edge is measured using a scanning electron microscope (S-9220, manufactured by Hitachi, Ltd.) at any 30 points included in the 50 μm length direction. did. And the standard deviation of this distance was calculated | required and 3 (sigma) was computed.

[Stability over time]
Each composition was stored at room temperature for 1 month. Then, the degree of sensitivity fluctuation before and after storage was evaluated. This evaluation was performed based on the following criteria.
(Criteria)
○ (Good): when the change in sensitivity is less than ^{1mJ / cm 2 △ (Fair)} : when the change in sensitivity was 1 mJ / cm ² or more and 3 mJ / cm ² or less × (Insufficient): Sensitivity variation of Is greater than 3 mJ / cm ² .

These measurement results are shown in Table 2 below.

  From the results shown in Table 2, it can be seen that the composition according to the present invention is excellent in sensitivity, resolution, LER, pattern shape, and stability over time in ArF exposure. That is, it can be seen that the photosensitive composition of the present invention has excellent performance as a positive resist composition in ArF excimer laser exposure.

<Example B>
A resist solution was prepared and coated in the same manner as in Example A except that 0.06 g of the following polymer was added to the composition of Example 1A to obtain a resist film. The obtained resist film was subjected to pattern exposure through an immersion liquid (pure water) using an ArF excimer laser immersion scanner (XTML1250i; NA0.85 manufactured by ASML), and a pattern was formed in the same manner as in Example A. did. The obtained pattern was confirmed to have the same evaluation result in any of sensitivity, resolution (γ), LER, pattern shape, and stability over time.

<Example C>
(Examples 1C to 24C and Comparative Examples 1C to 3C)
(Resist preparation)
The components shown in Table 3 below were dissolved in a solvent, and then filtered through a polytetrafluoroethylene filter having a pore size of 0.1 μm to prepare a positive resist solution having a solid content of 9.0%.

(Resist evaluation)
The prepared positive resist solution is uniformly applied on a silicon substrate subjected to hexamethyldisilazane treatment using a spin coater, and is heated and dried on a hot plate at 120 ° C. for 90 seconds to obtain a film thickness of 0.4 μm. The resist film was formed.
The resist film was subjected to pattern exposure through a line and space mask using a KrF excimer laser stepper (NA = 0.63), and immediately after exposure, heated on a hot plate at 110 ° C. for 90 seconds. Thereafter, development was performed at 23 ° C. for 60 seconds using an aqueous 2.38 mass% tetramethylammonium hydroxide solution, rinsed with pure water for 30 seconds, and then dried to form a line pattern.

[Sensitivity, Resolution (γ)]
Sensitivity and resolution (γ value) were determined in the same manner as described for Example A except that the above apparatus and process conditions were applied.

[Pattern shape, line edge roughness (LER)]
The exposure amount for reproducing a line and space (L / S = 1/1) mask pattern having a line width of 180 nm was set as the optimal exposure amount, and the profile at the optimal exposure amount was observed with a scanning microscope (SEM). In addition, about 30 points included in the length direction of 50 μm of the formed pattern, using a scanning electron microscope (S-9220, manufactured by Hitachi, Ltd.), the distance from the reference line where there should be an edge is determined. It was measured. And the standard deviation of this distance was calculated | required and 3 (sigma) was computed.

[Stability over time]
The stability over time was evaluated in the same manner as described for Example A.

These evaluation results are shown in Table 3 below.

  From the results shown in Table 3, it can be seen that the composition according to the present invention is excellent in sensitivity, resolution, LER, pattern shape, and stability over time in KrF exposure. That is, it can be seen that the photosensitive composition of the present invention has excellent performance as a positive resist composition in KrF excimer laser exposure.

<Example D>
(Examples 1D to 28D and Comparative Examples 1D to 3D)
(Resist preparation)
The components shown in Table 4 below were dissolved in a solvent and then filtered through a polytetrafluoroethylene filter having a pore size of 0.1 μm to prepare a positive resist solution having a solid concentration of 4.0% by mass.

(Resist evaluation)
The prepared positive resist solution was uniformly applied on a silicon substrate subjected to hexamethyldisilazane treatment using a spin coater, and then heated and dried on a hot plate at 120 ° C. for 60 seconds to obtain 0.12 μm. A resist film having a film thickness was formed.
This resist film was irradiated with an electron beam projection lithography apparatus (acceleration voltage 100 keV) manufactured by Nikon Corporation, and immediately after the irradiation, it was heated on a hot plate at 110 ° C. for 90 seconds. Thereafter, development was performed at 23 ° C. for 60 seconds using a 2.38 mass% tetramethylammonium hydroxide aqueous solution, rinsed with pure water for 30 seconds, and then dried to form a line and space pattern.

〔sensitivity〕
The obtained pattern was observed using a scanning electron microscope (S-9220 manufactured by Hitachi, Ltd.). The electron beam irradiation dose when resolving a line and space (L / S = 1/1) with a line width of 0.10 μm was defined as sensitivity (E ₀ ).

[Resolution]
The limiting resolution (minimum line width at which lines and spaces are separated and resolved) at the exposure amount showing the sensitivity (E ₀ ) was defined as the resolution (dense).

[Line edge roughness (LER)]
LER was determined in the same manner as described for Example A.

[Outgas performance: Film thickness fluctuation rate due to exposure]
Irradiate an electron beam with a dose of 2.0 times the dose that gives the above sensitivity (sensitivity determined in surface exposure), measure the film thickness after exposure and before post-heating, using the following formula: The rate of change from the unexposed film thickness was determined.
Film thickness variation rate (%) = [(film thickness at unexposed−film thickness after exposure) / film thickness at unexposed] × 100
[Stability over time]
After each composition was stored at room temperature for 1 month, the degree of change in sensitivity before and after storage was visually evaluated. This evaluation was performed based on the following criteria.
(Criteria)
○ (Good): When the variation in sensitivity was less than 1 μC / cm ² Δ (Fair): When the variation in sensitivity was 1 μC / cm ² or more and 3 μC / cm ² or less × (Insufficient): Variation in sensitivity Is greater than 3 μC / cm ² .

These evaluation results are shown in Table 4 below.

  From the results shown in Table 4, it can be seen that the composition according to the present invention is excellent in sensitivity, resolving power, LER, outgas performance, and stability over time in electron beam exposure. That is, it can be seen that the photosensitive composition of the present invention has excellent performance as a positive resist composition by electron beam irradiation.

<Example E>
(Examples 1E to 24E and Comparative Examples 1E to 3E)
(Resist preparation)
The components shown in Table 5 below were dissolved in a solvent and filtered through a polytetrafluoroethylene filter having a pore size of 0.1 μm to prepare a positive resist solution having a solid concentration of 4.0% by mass.

(Resist evaluation)
The prepared positive resist solution was uniformly applied on a silicon substrate subjected to hexamethyldisilazane treatment using a spin coater, and then heated and dried on a hot plate at 120 ° C. for 60 seconds to obtain 0.12 μm. A resist film having a film thickness was formed.

〔sensitivity〕
The obtained resist film was subjected to surface exposure using EUV light (wavelength 13 nm) while changing the exposure amount by 0.5 mJ / cm ^{2 in} the range of 0 to 15.0 mJ / cm ² , and then at 110 ° C. Bake for 90 seconds. Then, using a 2.38 mass% tetramethylammonium hydroxide (TMAH) aqueous solution, the dissolution rate at each exposure amount was measured to obtain a dissolution rate curve.
[Line edge roughness (LER)]
The exposure amount for reproducing a line and space (L / S = 1/1) mask pattern with a line width of 50 nm was set as the optimum exposure amount, and the profile at the optimum exposure amount was observed with a scanning microscope (SEM). Moreover, the distance from the reference line which should have an edge was measured about 30 arbitrary points contained in 50 micrometers of length directions of this pattern using the scanning electron microscope (Corporation | KK Hitachi Ltd. S-9220). And the standard deviation of this distance was calculated | required and 3 (sigma) was computed.

[Outgas performance: Film thickness fluctuation rate due to exposure]
In the same manner as described for Example D, the film thickness variation rate by EUV exposure was obtained.

[Stability over time]
The stability over time was evaluated in the same manner as described for Example A.

The evaluation results are shown in Table 5 below.

  From the results shown in Table 5, it can be seen that the composition according to the present invention is excellent in sensitivity, LER, outgas performance, and stability over time in EUV exposure. That is, it can be seen that the photosensitive composition of the present invention has excellent performance as a positive resist composition by EUV irradiation.

Claims (7)

  A resin comprising a repeating unit that decomposes by the action of an acid to generate a sulfonic acid, the repeating unit comprising a resin having an acetal structure and a compound that generates an acid upon irradiation with actinic rays or radiation. Actinic ray sensitive or radiation sensitive resin composition. The composition according to claim 1, wherein at least a part of the repeating unit has a structure represented by the following general formula (I).

Where
Each of R _{1 to} R ₄ represents a hydrogen atom or a substituent. Two or more of R _{1 to} R ₄ may be bonded to each other to form a ring structure.
Each of R ₅ and R ₆ represents a substituent. R ₅ and R ₆ may be bonded to each other to form a cyclic acetal structure. The composition according to claim 2, wherein at least a part of the repeating unit is represented by the following general formula (II).

Where
Ra and Rb each independently represents a hydrogen atom, an alkyl group or a cyano group.
Rc represents a hydrogen atom or a substituent.
L represents a single bond or a linking group. When Rc is the substituent and L is the linking group, Rc and L may be bonded to each other to form a ring structure.
Each of R _{1 to} R ₄ represents a hydrogen atom or a substituent. Two or more of R _{1 to} R ₄ may be bonded to each other to form a ring structure.
Each of R ₅ and R ₆ represents a substituent. R ₅ and R ₆ may be bonded to each other to form a cyclic acetal structure. The composition according to any one of claims 1 to 3, wherein the resin further comprises a repeating unit represented by the following general formula (VI).

Where
R ₀₁ and R ₀₂ each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group.
R ₀₃ represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group, or an alkoxycarbonyl group, or is bonded to the following Ar ₁ to form a ring structure.
Ar ₁ represents an aromatic ring group.
n represents an integer of 1 to 4.   The composition according to any one of claims 1 to 4, which is exposed to an electron beam, an X-ray or EUV light.   A resist film formed using the composition according to claim 1. Forming a film using the composition according to any one of claims 1 to 5,
Exposing the film;
Developing a pattern of the exposed film.