JP5364550B2 - Syndiotactic polystyrene resin film - Google Patents
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Description
本発明は、シンジオタクチックポリスチレン系樹脂フィルム、それを含む積層体及びこの積層体を用いたフレキシブルプリント基盤用カバーレイフィルムに関する。 The present invention relates to a syndiotactic polystyrene resin film, a laminate including the same, and a coverlay film for a flexible printed board using the laminate.
電子機器の配線盤には、板状のリジッドタイプのプリント配線盤と耐熱性フィルム上に回路を形成するフレキシブルプリント基盤の2種類がある。
フレキシブルプリント配線盤は、ポリイミドや液晶ポリマーフィルム上に銅配線を形成し、銅配線の酸化防止や保護を目的としてさらにポリイミドや液晶ポリマーフィルムからなるカバーレイフィルムを貼り合わせて構成する(特許文献1,2)。
一般的にカバーレイフィルムに用いられるポリイミドフィルム、液晶ポリマーフィルムは耐熱性が高く難燃性を有するが、誘電正接が比較的高く電気信号のロスが大きい。
There are two types of wiring boards for electronic devices: a plate-shaped rigid type printed wiring board and a flexible printed circuit board on which a circuit is formed on a heat-resistant film.
A flexible printed wiring board is formed by forming a copper wiring on a polyimide or liquid crystal polymer film, and further bonding a coverlay film made of polyimide or a liquid crystal polymer film for the purpose of preventing or protecting the copper wiring (Patent Document 1). , 2).
In general, a polyimide film or a liquid crystal polymer film used for a coverlay film has high heat resistance and flame retardancy, but has a relatively high dielectric loss tangent and a large loss of electric signal.
一方、特許文献3,4はシンジオタクチック構造を有するスチレン系樹脂組成物と熱可塑性樹脂を主成分とするカバーレイフィルムを開示している。シンジオタクチックポリスチレン系樹脂フィルムは電気特性に優れるが、表面張力が低く、他素材との接着が困難である。 On the other hand, Patent Documents 3 and 4 disclose a coverlay film mainly composed of a styrenic resin composition having a syndiotactic structure and a thermoplastic resin. Syndiotactic polystyrene resin films are excellent in electrical properties, but have low surface tension and are difficult to adhere to other materials.
本発明の目的は、接着性と電気特性に優れたシンジオタクチックポリスチレン系樹脂フィルムを提供することである。 An object of the present invention is to provide a syndiotactic polystyrene resin film excellent in adhesiveness and electrical characteristics.
本発明によれば、以下のシンジオタクチックポリスチレン系樹脂フィルム等が提供される。
1.200℃、50kgf/cm2、1分間で銅板に熱圧着したときの碁盤目剥離試験において、全マス数に対し剥離したマス数が20%以下であるシンジオタクチックポリスチレン系樹脂フィルム。
2.少なくとも片面を紫外線照射したシンジオタクチックポリスチレン系樹脂フィルム。
3.前記シンジオタクチックポリスチレン系樹脂が、スチレンのホモポリマー、スチレンとパラメチルスチレンとの共重合体、又はスチレンとエチレンとの共重合体である1又は2記載のシンジオタクチックポリスチレン系樹脂フィルム。
4.1〜3いずれか記載のシンジオタクチックポリスチレン系樹脂フィルムに少なくとも1つの層を積層した積層体。
5.前記層がポリイミドフィルム又は液晶ポリマーフィルムである4記載の積層体。
6.前記シンジオタクチックポリスチレン系樹脂フィルムと、前記ポリイミドフィルム又は液晶ポリマーフィルムが接着層を介して積層された5記載の積層体。
7.1〜3いずれか記載のシンジオタクチックポリスチレン系樹脂フィルム又は4〜6いずれか記載の積層体を用いたフレキシブルプリント基盤用カバーレイフィルム。
According to the present invention, the following syndiotactic polystyrene resin films and the like are provided.
1. A syndiotactic polystyrene-based resin film having a mass number of 20% or less with respect to the total mass number in a cross-cut peel test when thermocompression bonded to a copper plate at 200 ° C., 50 kgf / cm 2 for 1 minute.
2. Syndiotactic polystyrene resin film that is irradiated with ultraviolet rays on at least one side.
3. The syndiotactic polystyrene resin film according to 1 or 2, wherein the syndiotactic polystyrene resin is a homopolymer of styrene, a copolymer of styrene and paramethylstyrene, or a copolymer of styrene and ethylene.
The laminated body which laminated | stacked at least 1 layer on the syndiotactic polystyrene-type resin film of any one of 4.1-3.
5. The laminate according to 4, wherein the layer is a polyimide film or a liquid crystal polymer film.
6). 6. The laminate according to 5, wherein the syndiotactic polystyrene resin film and the polyimide film or liquid crystal polymer film are laminated via an adhesive layer.
A cover lay film for a flexible printed board using the syndiotactic polystyrene resin film according to any one of 7.1 to 3 or the laminate according to any one of 4 to 6.
本発明によれば、接着性と電気特性に優れたシンジオタクチックポリスチレン系樹脂フィルムが提供できる。 ADVANTAGE OF THE INVENTION According to this invention, the syndiotactic polystyrene-type resin film excellent in adhesiveness and an electrical property can be provided.
本発明のシンジオタクチックポリスチレン系樹脂フィルムは、碁盤目剥離試験において、全マス数に対し剥離したマス数が20%以下である。碁盤目剥離試験は200℃、50kgf/cm2、1分間でSPSフィルムを銅板に熱圧着して行う。剥離したマス数は好ましくは15%以下であり、より好ましくは10%以下である。碁盤目剥離試験方法は実施例に記載する。 The syndiotactic polystyrene-based resin film of the present invention has a mass number of 20% or less with respect to the total mass number in a cross-cut peel test. The cross-cut peel test is performed by thermocompression bonding the SPS film to a copper plate at 200 ° C. and 50 kgf / cm 2 for 1 minute. The peeled mass number is preferably 15% or less, more preferably 10% or less. The cross-cut peel test method is described in the examples.
シンジオタクチックポリスチレン系樹脂(SPS)が有するシンジオタクチック構造とは、立体化学構造がシンジオタクチック構造、即ち炭素−炭素結合から形成される主鎖に対して側鎖であるフェニル基が交互に反対方向に位置する立体構造を有するものであり、そのタクティシティーは同位体炭素による核磁気共鳴法(13C−NMR)により定量される。13C−NMR法により測定されるタクティシティーは、連続する複数個の構成単位の存在割合、例えば2個の場合はダイアッド、3個の場合はトリアッド、5個の場合はペンタッドによって示すことができる。本発明で用いるSPSとしては、通常はラセミダイアッドで75%以上、好ましくは85%以上、又はラセミペンタッドで30%以上、好ましくは50%以上のシンジオタクティシティーを有するポリスチレン、ポリ(アルキルスチレン)、ポリ(ハロゲン化スチレン)、ポリ(ハロゲン化アルキルスチレン) 、ポリ(アルコキシスチレン)、ポリ(ビニル安息香酸エステル)、これらの水素化重合体及びこれらの混合物、又はこれらを主成分とする共重合体等が挙げられる。ポリ(アルキルスチレン)としては、ポリ(メチルスチレン)、ポリ(エチルスチレン)、ポリ(イソピルスチレン)、ポリ(ターシャリーブチルスチレン)、ポリ(フェニルスチレン)、ポリ(ビニルナフタレン)、ポリ(ビニルスチレン)等があり、ポリ(ハロゲン化スチレン)としては、ポリ(クロロスチレン)、ポリ(ブロモスチレン)、ポリ(フルオロスチレン)等がある。また、ポリ(ハロゲン化アルキルスチレン)としては、ポリ(クロロメチルスチレン)等、またポリ(アルコキシスチレン)としては、ポリ(メトキシスチレン)、ポリ(エトキシスチレン)等が挙げられる。 The syndiotactic structure of syndiotactic polystyrene resin (SPS) is a syndiotactic structure, that is, phenyl groups that are side chains with respect to the main chain formed from carbon-carbon bonds are alternately arranged. It has a three-dimensional structure located in the opposite direction, and its tacticity is quantified by nuclear magnetic resonance ( 13 C-NMR) with isotope carbon. The tacticity measured by the 13 C-NMR method can be indicated by the abundance ratio of a plurality of consecutive structural units, for example, a dyad for two, a triad for three, a pentad for five. . The SPS used in the present invention is usually 75% or more of racemic dyad, preferably 85% or more, or 30% or more, preferably 50% or more of racemic pentad. Styrene), poly (halogenated styrene), poly (halogenated alkyl styrene), poly (alkoxy styrene), poly (vinyl benzoate), hydrogenated polymers thereof, and mixtures thereof, or based on these A copolymer etc. are mentioned. Poly (alkyl styrene) includes poly (methyl styrene), poly (ethyl styrene), poly (isopropyl styrene), poly (tertiary butyl styrene), poly (phenyl styrene), poly (vinyl naphthalene), poly (vinyl) Examples of poly (halogenated styrene) include poly (chlorostyrene), poly (bromostyrene), and poly (fluorostyrene). Examples of the poly (halogenated alkyl styrene) include poly (chloromethyl styrene), and examples of the poly (alkoxy styrene) include poly (methoxy styrene) and poly (ethoxy styrene).
好ましいSPSは、スチレンのホモポリマー、スチレンとパラメチルスチレンとの共重合体、又はスチレンとエチレンとの共重合体である。スチレンとパラメチルスチレンとの共重合体におけるパラメチルスチレン含有量は1〜20モル%、スチレンとエチレンとの共重合体におけるエチレン含有量は1〜50モル%が好ましい。 A preferred SPS is a homopolymer of styrene, a copolymer of styrene and paramethylstyrene, or a copolymer of styrene and ethylene. The paramethylstyrene content in the copolymer of styrene and paramethylstyrene is preferably 1 to 20 mol%, and the ethylene content in the copolymer of styrene and ethylene is preferably 1 to 50 mol%.
また、本発明のSPSフィルムは少なくとも片面が紫外線照射(UV処理)されている。紫外線照射をすることにより、SPSフィルムのプリント基盤等への接着性を向上でき、上記の碁盤目剥離試験において剥離率を20%以下にできる。また、UV処理はSPSフィルムの両面に行うこともできる。
紫外線照射は、紫外線照射機等を用いて、好ましくは照射量500〜2000mJ/cm2、より好ましくは1000〜2000mJ/cm2で行う。
本発明において紫外線とは、波長が380nm以下である電磁波をいう。
また、コロナ処理、窒素プラズマ処理では熱圧着後のフィルムの剥離率を20%以下にできず、好ましくない。
In addition, at least one surface of the SPS film of the present invention is irradiated with ultraviolet rays (UV treatment). By irradiating with ultraviolet rays, the adhesiveness of the SPS film to the printed substrate can be improved, and the peel rate can be reduced to 20% or less in the cross-cut peel test. UV treatment can also be performed on both sides of the SPS film.
The ultraviolet irradiation is performed using an ultraviolet irradiator or the like, preferably at an irradiation amount of 500 to 2000 mJ / cm 2 , more preferably 1000 to 2000 mJ / cm 2 .
In the present invention, ultraviolet rays refer to electromagnetic waves having a wavelength of 380 nm or less.
Further, corona treatment and nitrogen plasma treatment are not preferable because the film peeling rate after thermocompression bonding cannot be reduced to 20% or less.
SPSフィルムはSPSを延伸して得ることができる。延伸法としては、逐次、同時ニ軸延伸等が挙げられ、テンター延伸が好適である。延伸温度は好ましくは100℃〜110℃である。SPSフィルムの厚さは限定されないが通常、1μm〜200μm程度である。 The SPS film can be obtained by stretching SPS. Examples of the stretching method include sequential and simultaneous biaxial stretching, and tenter stretching is preferred. The stretching temperature is preferably 100 ° C to 110 ° C. The thickness of the SPS film is not limited, but is usually about 1 μm to 200 μm.
本発明の積層体は、上記SPSフィルムと、1以上の他の層を積層してなる。他の層は、好ましくはポリイミドフィルム又は液晶ポリマーフィルムである。 The laminate of the present invention is formed by laminating the SPS film and one or more other layers. The other layer is preferably a polyimide film or a liquid crystal polymer film.
ポリイミドフィルムとしてはポリイミド樹脂フィルム等が挙げられる。
液晶ポリマーとしては、芳香族若しくは脂肪族ジヒドロキシ化合物、芳香族若しくは脂肪族ジカルボン酸、芳香族ヒドロキシカルボン酸、又は芳香族ジアミン、芳香族ヒドロキシアミン若しくは芳香族アミノカルボン酸等の化合物及びその誘導体から得られる液晶ポリマー等が挙げられる。
A polyimide resin film etc. are mentioned as a polyimide film.
Liquid crystal polymers are obtained from aromatic or aliphatic dihydroxy compounds, aromatic or aliphatic dicarboxylic acids, aromatic hydroxycarboxylic acids, or compounds such as aromatic diamines, aromatic hydroxyamines or aromatic aminocarboxylic acids and derivatives thereof. And liquid crystal polymer.
SPSフィルムは電気特性に優れるが、耐熱性、難燃性が上記フィルムより低い。従って、SPSフィルムと上記フィルムを積層させた積層体は、電気特性、接着性だけでなく、耐熱性、難燃性にも優れる。カバーレイフィルムに使用した場合、回路接点の接合で用いられるリフローでの耐熱性にも問題がなくなる。積層体は、SPSフィルム面を回路側(内層)、ポリイミドフィルム、液晶フィルム等を外層として、回路に熱プレスで密着させる。これにより回路面側の電気ロスを低減でき、かつ基盤として耐熱性、難燃性を有するフレキシブルプリント基板(FPC)を提供することができる。 The SPS film is excellent in electrical properties, but has lower heat resistance and flame retardancy than the above film. Therefore, the laminate obtained by laminating the SPS film and the above film is excellent not only in electrical characteristics and adhesiveness but also in heat resistance and flame retardancy. When used for a coverlay film, there is no problem with the heat resistance in reflow used for joining circuit contacts. The laminate is adhered to the circuit by hot pressing with the SPS film surface as the circuit side (inner layer), polyimide film, liquid crystal film, etc. as the outer layer. Thus, an electric loss on the circuit surface side can be reduced, and a flexible printed circuit board (FPC) having heat resistance and flame retardancy as a base can be provided.
本発明の積層体は、押出成形、Tダイ製膜延伸法、ラミネート体延伸法、インフレーション等により製造できる。また、SPSフィルムと上記層は接着層を介して積層させることができる。接着層としては例えばアクリル系樹脂、エポキシ系樹脂、ポリアミド系樹脂、ポリイミド系樹脂、ポリオレフィン系樹脂、マレイミド系樹脂、フェノキシ系樹脂等の熱可塑性樹脂等を用いることができ、熱硬化性樹脂を含むこともできる。 The laminate of the present invention can be produced by extrusion molding, T-die film-forming stretching method, laminate stretching method, inflation, or the like. Further, the SPS film and the above layer can be laminated via an adhesive layer. As the adhesive layer, for example, thermoplastic resins such as acrylic resins, epoxy resins, polyamide resins, polyimide resins, polyolefin resins, maleimide resins, phenoxy resins, and the like can be used, including thermosetting resins. You can also.
図1に本発明の積層体の一実施形態を示す。この積層体1は、SPSフィルム10とポリイミドフィルム又は液晶ポリマーフィルム20が接着層30を介して積層している。限定されないが、例えば、SPSフィルム10の厚みは10〜100μm、ポリイミドフィルム又は液晶ポリマーフィルム20の厚みは10〜100μm、接着層30の厚みは5〜50μmである。
FIG. 1 shows an embodiment of the laminate of the present invention. In this laminate 1, an
本発明のSPSフィルム、酸化防止剤等の添加剤を0.05重量%以上含むことができる。
また、本発明の積層体は、SPSフィルムの他に、ポリイミドフィルム又は液晶ポリマーフィルム、接着層を含むことができる。
Additives such as the SPS film and antioxidant of the present invention can be contained in an amount of 0.05% by weight or more.
Moreover, the laminated body of this invention can contain a polyimide film or a liquid crystal polymer film, and an adhesive layer other than an SPS film.
参考例1
出光興産株式会社製シンジオタクチックポリスチレン樹脂(SPS)ザレック90ZCをテンター延伸により延伸温度110℃で延伸し、厚さ20μmのフィルムを得た。このフィルムの片面に、紫外線照射機を用いて1000mJ/cm2でUV処理を実施した。UV処理面を厚さ100μmの銅板に密着させ、200℃、50kgf/m2、1分間の条件で熱プレスを実施した。
Reference example 1
Idemitsu Kosan Co., Ltd. Syndiotactic Polystyrene Resin (SPS) Zarek 90ZC was stretched at a stretching temperature of 110 ° C. by tenter stretching to obtain a film having a thickness of 20 μm. One side of this film was subjected to UV treatment at 1000 mJ / cm 2 using an ultraviolet irradiator. The UV-treated surface was brought into close contact with a copper plate having a thickness of 100 μm, and hot pressing was performed at 200 ° C., 50 kgf / m 2 for 1 minute.
その後カッターナイフにてSPSフィルム側から100マス(1マス:5mm×5mm)の碁盤目状に切り込みを入れ、3M社製セロハンテープ「Scotch313」を碁盤目に押し付け、剥離した。100マス中剥離した数をマス総数で除し、下記式により100分率とした。結果を表1に示す。
碁盤目試験による剥離率=(剥離したマス数÷マス総数)×100(%)
Thereafter, 100 squares (1 square: 5 mm × 5 mm) of grids were cut from the SPS film side with a cutter knife, and 3M cellophane tape “Scotch 313” was pressed into the grids and peeled. The number of peels in 100 squares was divided by the total number of squares, and the percentage was calculated according to the following formula. The results are shown in Table 1.
Peeling rate by cross-cut test = (number of peeled cells / total number of cells) × 100 (%)
参考例2
SPSを出光興産株式会社製ザレックF2907とした以外は参考例1と同様にフィルム作成、UV処理、フィルム評価を行った。結果を表1に示す。
Reference example 2
Film creation, UV treatment, and film evaluation were performed in the same manner as in Reference Example 1 except that SPS was changed to Zarek F2907 manufactured by Idemitsu Kosan Co., Ltd. The results are shown in Table 1.
参考例3
下記の合成法によりスチレン−エチレン共重合体(EtCopoly1、Et含量5%)を得た後、参考例1と同様にフィルム作成、UV処理、フィルム評価を行った。結果を表1に示す。
Reference example 3
After obtaining a styrene-ethylene copolymer (EtCopoly1, Et content 5%) by the following synthesis method, film preparation, UV treatment, and film evaluation were performed in the same manner as in Reference Example 1 . The results are shown in Table 1.
加熱乾燥した5リットルオートクレーブに、窒素雰囲気下、室温でトルエン2,800mL、トリイソブチルアルミニウム(TIBA)1.0mmol、スチレン412mlを加えた。攪拌しながら温度を70℃にした後、(9−エチル−1,2,3,4−テトラヒドロフルオレンニル)ビス(N,N−ジメチルアミノベンジル)スカンジウム0.07mmolとトリn−ブチルアルミニウム7.0mmolとを25℃で接触させ30分後にジメチルアニリニウムテトラキスペンタフルオロフェニルボレート0.084mmolを上記接触生成物に加え、15分後にエチレンで圧力を0.09MPaに保ちながら10分間重合した。 To a heat-dried 5 liter autoclave, 2,800 mL of toluene, 1.0 mmol of triisobutylaluminum (TIBA), and 412 mL of styrene were added at room temperature under a nitrogen atmosphere. After the temperature was raised to 70 ° C. with stirring, 0.07 mmol of (9-ethyl-1,2,3,4-tetrahydrofluorenyl) bis (N, N-dimethylaminobenzyl) scandium and tri-n-butylaluminum7. 0 mmol was contacted at 25 ° C., 30 minutes later, 0.084 mmol of dimethylanilinium tetrakispentafluorophenylborate was added to the contact product, and 15 minutes later, polymerization was performed for 10 minutes while maintaining the pressure at 0.09 MPa with ethylene.
重合反応終了後、反応生成物をメタノール−塩酸溶液中に投入し、充分攪拌した後ろ別し、さらにメタノールで充分洗浄後乾燥し、スチレン/エチレン共重合体420gを得た。触媒活性は800kg/gSc・hrであった。得られたポリマーの分子量はMw=280,000、Mn=117,000、Mw/Mn=2.39、エチレン単位含量は5mol%であった。 After completion of the polymerization reaction, the reaction product was put into a methanol-hydrochloric acid solution, sufficiently stirred, separated after further washing with methanol, and then dried to obtain 420 g of a styrene / ethylene copolymer. The catalytic activity was 800 kg / g Sc · hr. The molecular weight of the obtained polymer was Mw = 280,000, Mn = 117,000, Mw / Mn = 2.39, and the ethylene unit content was 5 mol%.
実施例1
参考例1と同様にSPSザレック90ZCを延伸し、厚さ10μmのフィルムを得た。このフィルムの両面に紫外線照射機を用いて1000mJ/cm2でUV処理を施した。
Example 1
In the same manner as in Reference Example 1 , SPS Zalec 90ZC was stretched to obtain a film having a thickness of 10 μm. Both surfaces of this film were subjected to UV treatment at 1000 mJ / cm 2 using an ultraviolet irradiator.
さらにこのフィルムの片面に東洋インキ製接着剤ダイナレオVA−3020をバーコーターにて3g/m2で塗布し、さらに三菱エンプラ製ポリイミドフィルム「ユーピレックス」50μmを張り合わせて積層体を作成し、70℃の温度で押さえつけた。その後50℃の温度雰囲気下で4日間エージングした。
SPSフィルム面を銅板に密着させ、参考例1と同様に熱プレスし、その後カッターナイフにてポリイミドフィルム側から100マスの碁盤目状に切り込みを入れ、3M社性セロハンテープ「Scotch313」を碁盤目に押し付け剥離した。結果を表1に示す。
Further, Toyo Ink adhesive Dynareo VA-3020 was applied to one side of this film with a bar coater at 3 g / m 2 , and a laminate was prepared by pasting 50 μm of polyimide film “UPILEX” made by Mitsubishi Engineering Plastics. Pressed with temperature. Thereafter, it was aged for 4 days in a temperature atmosphere of 50 ° C.
The SPS film surface was brought into close contact with the copper plate and heat-pressed in the same manner as in Reference Example 1, and then a 100-mm grid cut was made from the polyimide film side with a cutter knife. And peeled off. The results are shown in Table 1.
実施例2
ポリイミドフィルム「ユーピレックス」の代わりにクラレ製液晶ポリマーフィルム「ベクスター」を用いた以外は実施例1と同様に積層体を作成し、評価した。結果を表1に示す。
Example 2
A laminate was prepared and evaluated in the same manner as in Example 1 except that a Kuraray liquid crystal polymer film “BEXTER” was used instead of the polyimide film “UPILEX”. The results are shown in Table 1.
実施例3
SPSをF2907とした以外は実施例1と同様に積層体を作成し、評価した。結果を表1に示す。
Example 3
A laminate was prepared and evaluated in the same manner as in Example 1 except that SPS was changed to F2907. The results are shown in Table 1.
実施例4
SPSを参考例3で合成したスチレン−エチレン共重合体とした以外は実施例1と同様に積層体を作成し、評価した。結果を表1に示す。
Example 4
A laminate was prepared and evaluated in the same manner as in Example 1 except that SPS was a styrene-ethylene copolymer synthesized in Reference Example 3 . The results are shown in Table 1.
比較例1
SPSフィルムのUV処理を行わなかった以外は参考例1と同様にしてフィルムを作成し、評価した。結果を表1に示す。
Comparative Example 1
A film was prepared and evaluated in the same manner as in Reference Example 1 except that the SPS film was not subjected to UV treatment. The results are shown in Table 1.
比較例2
UV処理の代わりに、SPSフィルム表面に0.6kW、ラインスピード10m/分でコロナ処理を行った以外は、参考例1と同様にフィルム作成、フィルム評価を行った。結果を表1に示す。
Comparative Example 2
Instead of UV treatment, film preparation and film evaluation were performed in the same manner as in Reference Example 1 except that the SPS film surface was subjected to corona treatment at 0.6 kW and a line speed of 10 m / min. The results are shown in Table 1.
比較例3
UV処理の代わりに、SPSフィルム表面に1.0kW、ラインスピード0.5m/分で窒素プラズマ処理を行った以外は、参考例1と同様にフィルム作成、フィルム評価を行った。結果を表1に示す。
Comparative Example 3
A film was prepared and evaluated in the same manner as in Reference Example 1 except that the surface of the SPS film was subjected to nitrogen plasma treatment at 1.0 kW and a line speed of 0.5 m / min instead of UV treatment. The results are shown in Table 1.
本発明のシンジオタクチックポリスチレン系樹脂フィルム又は積層体は、電子機器等のフレキシブルプリント基盤に用いられるカバーレイフィルムとして使用できる。 The syndiotactic polystyrene resin film or laminate of the present invention can be used as a coverlay film used for flexible printed boards such as electronic devices.
1 積層体
10 SPSフィルム
20 ポリイミドフィルム又は液晶ポリマーフィルム
30 接着層
1
Claims (4)
このシンジオタクチックポリスチレン系樹脂フィルムに積層されたポリイミドフィルム又は液晶ポリマーフィルムと、
を備える積層体。 200 ° C., in cross-cut peeling test when the thermocompression bonding a copper plate at 50 kgf / cm 2, 1 minute state, and are the number of squares is 20% or less was peeled to the total number of squares, syndiotactic at least one surface with ultraviolet radiation A polystyrene resin film ;
A polyimide film or a liquid crystal polymer film laminated on the syndiotactic polystyrene resin film;
A laminate comprising:
The coverlay film for flexible printed bases using the laminated body in any one of Claims 1-3 .
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JP2898026B2 (en) * | 1989-10-09 | 1999-05-31 | 出光興産株式会社 | Molded article of styrenic polymer |
JP3779340B2 (en) * | 1994-03-25 | 2006-05-24 | 富士写真フイルム株式会社 | Photographic support |
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