JP5251471B2 - Positive photosensitive insulating resin composition and cured product thereof - Google Patents

Description

  The present invention is used for interlayer insulating films, planarizing films, surface protective films (overcoat films, passivation films, etc.) for semiconductor elements, insulating films for high-density mounting substrates, photosensitive adhesives, pressure-sensitive adhesives, and the like. The present invention relates to a positive photosensitive insulating resin composition and an insulating cured product obtained by curing the positive photosensitive insulating resin composition. More specifically, since a specific block copolymer is contained, it is possible to suppress warping of the substrate when forming an insulating film, and as a permanent film resist, it has excellent resolution and good adhesion. The present invention relates to a positive photosensitive insulating resin composition capable of forming a cured product having thermal shock properties, electrical insulation properties, patterning properties, elongation, and the like, and a cured product obtained by curing the same.

  Conventionally, polyimide-based resins having excellent heat resistance, mechanical properties, and the like have been widely used as interlayer insulating films, surface protective films, and the like used for semiconductor elements of electronic devices. In order to improve productivity, film formation accuracy, and the like, various photosensitive polyimide resins having photosensitivity have been studied. For example, Patent Document 1 and Patent Document 2 include a negative resin in which a photocrosslinking group is introduced into a polyimide precursor by an ester bond or an ionic bond, and a positive resin composed of a polyimide precursor and an orthoquinonediazide compound, respectively. Have been described.

  Furthermore, with the high integration of semiconductor elements, various photosensitive polyimide resins have been proposed in order to further improve film formation accuracy. For example, in Patent Document 3 and Patent Document 4, a composition containing a photosensitive polyimide resin in which a photocrosslinking group is introduced into a polyimide precursor by ionic bonding, and a photocrosslinking group by an ester bond in the polyimide precursor, respectively. A composition containing the introduced photosensitive polyimide resin is described. Patent Document 5 also describes a negative photosensitive composition in which a polyfunctional acrylic compound is blended with an aromatic polyimide precursor. Furthermore, as another resin composition that is not a composition containing a polyimide resin, Patent Document 6 discloses a photosensitive insulating resin containing an alkali-soluble resin having a phenolic hydroxyl group, a crosslinking agent, and a photosensitive acid generator. A composition is described.

Japanese Patent Laid-Open No. 05-5996 JP 2000-98601 A JP 54-145794 A Japanese Patent Laid-Open No. 03-186847 Japanese Patent Application Laid-Open No. 08-50354 JP 2003-215802 A

  However, the negative type resin described in Patent Document 1 has problems in resolution and film formation, and the positive type resin described in Patent Document 2 has heat resistance, electrical insulation, and adhesion to the substrate. There is a problem with sex. In addition, many patent applications have been filed, but it cannot be said that the required characteristics due to high integration and thinning of semiconductor elements are sufficiently satisfied. Furthermore, it has problems such as film reduction after curing (volume shrinkage), multi-stage baking during curing, atmosphere control, and the like, which are difficult to use when industrially implemented. In addition, the compositions described in Patent Documents 3 and 4 require a ring-closing step for imidization, and have the disadvantage that resolution is not sufficient because of solvent development. Similar problems have been pointed out in the composition. Furthermore, in the insulating film formed using the composition described in Patent Document 6, warpage of the substrate that occurs when the insulating film is formed is a problem.

  The present invention solves the above-mentioned problems of the prior art, more specifically, a positive photosensitive insulating resin composition for forming an insulating film or the like, and a substrate for forming the insulating film And a cured product such as an insulating film obtained by curing the composition, and a positive photosensitive insulating resin composition having excellent resolution, electrical insulation and the like. To do.

［式（１）のＲ^１は水素原子又は炭素数１〜４のアルキル基を表す。また、式（２）のＲ^２及びＲ^３は炭素数１〜４のアルキル基を表す。］
２．前記構造単位（ａ１）と前記構造単位（ａ２）との合計を１００モル％とした場合に、該構造単位（ａ１）の含有割合が２０〜９０モル％である前記１．に記載のポジ型感光性絶縁樹脂組成物。
３．前記ブロック共重合体（Ａ）のゲルパーミエーションクロマトグラフィーで測定したポリスチレン換算の重量平均分子量が、３，０００〜３０，０００である前記１．又は２．に記載のポジ型感光性絶縁樹脂組成物。
４．前記架橋剤（Ｂ）が、分子中に２個以上のアルキルエーテル化されたアミノ基を有する化合物及びオキシラン環含有化合物のうちの少なくとも一方である前記１．乃至３．のうちのいずれか１項に記載のポジ型感光性絶縁樹脂組成物。
５．更に密着助剤（Ｅ）を含有する前記１．乃至４．のうちのいずれか１項に記載のポジ型感光性絶縁樹脂組成物。
６．更に架橋微粒子（Ｆ）を含有し、
前記架橋微粒子は、ヒドロキシル基及び／又はカルボキシル基を有する単量体と、不飽和重合性基を２個以上有する架橋性単量体との共重合体からなる前記１．乃至５．のうちのいずれか１項に記載のポジ型感光性絶縁樹脂組成物。
７．前記１．乃至６．のうちのいずれか１項に記載のポジ型感光性絶縁樹脂組成物が硬化されてなることを特徴とする硬化物。 The present invention is as follows.
1. (A) a block copolymer having a structural unit (a1) represented by the following formula (1) and a structural unit (a2) represented by the following formula (2);
(B) a crosslinking agent (C) a quinonediazide group-containing compound,
(D) A positive photosensitive insulating resin composition comprising a solvent.

[R ^{1 in} Formula (1) represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. Also, ^{R 2} and ^{R 3} of formula (2) represents an alkyl group having 1 to 4 carbon atoms. ]
2. 1. When the total of the structural unit (a1) and the structural unit (a2) is 100 mol%, the content of the structural unit (a1) is 20 to 90 mol%. The positive photosensitive insulating resin composition described in 1.
3. The polystyrene-converted weight average molecular weight measured by gel permeation chromatography of the block copolymer (A) is 3,000 to 30,000. Or 2. The positive photosensitive insulating resin composition described in 1.
4). 1. The crosslinking agent (B) is at least one of a compound having two or more alkyl etherified amino groups in the molecule and an oxirane ring-containing compound. To 3. The positive photosensitive insulating resin composition according to any one of the above.
5. Furthermore, the said 1. containing adhesion assistant (E). To 4. The positive photosensitive insulating resin composition according to any one of the above.
6). Furthermore, it contains crosslinked fine particles (F) ,
The crosslinked fine particles are composed of a copolymer of a monomer having a hydroxyl group and / or a carboxyl group and a crosslinking monomer having two or more unsaturated polymerizable groups . To 5. The positive photosensitive insulating resin composition according to any one of the above.
7. 1 above. To 6. A cured product obtained by curing the positive photosensitive insulating resin composition according to any one of the above.

Since the positive type photosensitive insulating resin composition of the present invention contains a specific block copolymer, the warp of the substrate when forming the insulating film is sufficiently suppressed, and excellent resolution and electrical properties are achieved. A cured product such as an insulating film having an insulating property or the like can be formed.
Further, when the total content of the structural unit (a1) and the structural unit (a2) is 100 mol%, when the content ratio of the structural unit (a1) is 20 to 90 mol%, excellent alkali developability is obtained. As a result, the stress of the obtained insulating film can be sufficiently reduced.
Furthermore, when the weight average molecular weight in terms of polystyrene measured by gel permeation chromatography of the block copolymer (A) is 3,000 to 30,000, the resolution, thermal shock resistance, and heat resistance of the insulating film And the remaining film rate can be further improved.
When the crosslinking agent (B) is at least one of a compound having two or more alkyl etherified amino groups and an oxirane ring-containing compound in the molecule, excellent alkali developability is obtained. Thus, the stress of the obtained insulating film can be sufficiently reduced.
Furthermore, when the adhesion assistant (E) is contained, the adhesion between the substrate and a cured product such as an insulating film can be further improved.
Moreover, when a crosslinked fine particle (F) is contained, durability, thermal shock property, etc. of hardened | cured material can be improved more.
The cured product of the present invention is obtained by curing the positive photosensitive insulating resin composition of the present invention, and has excellent resolution, electrical insulation and the like.

  The present invention will be described in detail below. In the present specification, “(meth) acryl” means “acryl” or “methacryl”. “(Meth) acrylate” means “acrylate” or “methacrylate”.

[1] Positive Photosensitive Insulating Resin Composition The positive photosensitive insulating resin composition of the present invention (hereinafter sometimes referred to as “resin composition”) is represented by (A) the above formula (1). A block copolymer having the structural unit (a1) and the structural unit (a2) represented by the formula (2), (B) a crosslinking agent, (C) a compound having a quinonediazide group, and (D) a solvent, Containing.

(A) Block copolymer The “block copolymer (A)” in the present invention is an alkali-soluble resin, represented by the structural unit (a1) represented by the formula (1) and the formula (2). Structural unit (a2). The structural unit (a1) is a hydroxystyrene unit or a hydroxystyrene alkyl derivative unit (provided that the alkyl group is a methyl group, an ethyl group, a propyl group, or a butyl group, and may be linear when it is a propyl group and a butyl group). And the structural unit (a2) is an alkyl vinyl ether unit (provided that the alkyl group is a methyl group, an ethyl group, a propyl group, or a butyl group, and is a propyl group or a butyl group). May be linear or branched.).

  The block copolymer (A) is AB type, that is, the other block is bonded to one end of one of the block consisting of the structural unit (a1) and the block consisting of the structural unit (a2). A block copolymer may be used, and the other block is bonded to both ends of either one of the ABA type, that is, the block composed of the structural unit (a1) and the block composed of the structural unit (a2). A block copolymer may be used. Of these, AB type block copolymers are preferred because of their higher resolution. The block copolymer (A) is usually an AB type block copolymer in which a block composed of the structural unit (a1) and a block composed of the structural unit (a2) are combined.

Examples of the monomer used for forming the structural unit (a1) include 4-hydroxystyrene and 4-hydroxy-α-methylstyrene.
In addition, R ^x ₂ Si (OR ^y ) ₂ can be used as a monomer used for forming the structural unit (a2). Here, R ^x is a methyl group, an ethyl group, a propyl group, or a butyl group, and the two R ^{x s} may be the same group or different. Moreover, when it is a propyl group and a butyl group, it may be linear and may be branched. Further, R ^x is an alkyl group that becomes R ² and R ^{3 of} the structural unit (a2) after polymerization. Furthermore, R ^{y is} also a methyl group, an ethyl group, a propyl group or a butyl group, and the two R ^{x s} may be the same group or different. Moreover, when it is a propyl group and a butyl group, it may be linear and may be branched. Examples of the monomer represented by R ^x ₂ Si (OR ^y ) ₂ include dimethyldimethoxysilane, diethyldimethoxysilane, and dipropyldimethoxysilane.

  The content ratio of the structural unit (a1) and the structural unit (a2) constituting the block copolymer (A) is not particularly limited, but the total of the structural unit (a1) and the structural unit (a2) is 100 mol%. In this case, the structural unit (a1) is preferably 20 to 90 mol%, more preferably 40 to 80 mol%. Further, the structural unit (a2) is also preferably 10 to 80 mol%, and more preferably 20 to 60 mol%.

  Furthermore, the weight average molecular weight measured by gel permeation chromatography of the block copolymer (A) is not particularly limited, but from the viewpoints of resolution, thermal shock, heat resistance, and remaining film ratio of the insulating film, 3 3,000 or more, more preferably 3,000 to 30,000.

  In addition, the content of the block copolymer (A) contained in the positive photosensitive insulating resin composition is not particularly limited, but when the total amount of other components excluding the solvent (D) is 100% by mass. 30 to 90% by mass, and more preferably 40 to 80% by mass. When the content of the block copolymer (A) is 30 to 90% by mass, the insulating film formed using the positive photosensitive insulating resin composition has sufficient developability with an alkaline aqueous solution. Therefore, it is preferable.

  Furthermore, a phenolic low molecular weight compound may be blended in the resin composition. As this phenolic low molecular weight compound, for example, 4,4′-dihydroxydiphenylmethane, 4,4′-dihydroxydiphenyl ether, tris (4-hydroxyphenyl) methane, 1,1-bis (4-hydroxyphenyl) -1- Phenylethane, tris (4-hydroxyphenyl) ethane, 1,3-bis [1- (4-hydroxyphenyl) -1-methylethyl] benzene, 1,4-bis [1- (4-hydroxyphenyl) -1 -Methylethyl] benzene, 4,6-bis [1- (4-hydroxyphenyl) -1-methylethyl] -1,3-dihydroxybenzene, 1,1-bis (4-hydroxyphenyl) -1- [4 -[1- (4-Hydroxyphenyl) -1-methylethyl] phenyl] ethane, 1,1,2,2-tetra (4-hydro Shifeniru) ethane and the like. These phenolic low molecular weight compounds may be used alone or in combination of two or more.

  The compounding amount of the phenolic low molecular compound is preferably 40 parts by mass or less, and more preferably 1 to 30 parts by mass, when the block copolymer (A) is 100 parts by mass.

  The block copolymer (A) can be produced by a radical polymerization method using a polymer radical polymerization initiator having the structure of the structural unit (a2). Examples of commercially available polymer radical polymerization initiators include trade name “VPS-1001” manufactured by Wako Pure Chemical Industries, Ltd.

Polymerization solvents include amide solvents such as dimethylformamide, dimethylacetamide and N-methylpyrrolidone, hydrocarbon solvents such as benzene, toluene, xylene, hexane and cyclohexane, ester solvents such as γ-butyrolactone and ethyl lactate, cyclohexyl Ketone solvents such as benzophenone and cyclohexanone can be used.
Moreover, the usage-amount of a radical polymerization initiator can be suitably determined with the ratio of the structural unit (a2) to introduce | transduce. The reaction temperature is determined by the energy required to cleave the end-protected living group and can be, for example, 60-200 ° C.

(B) Crosslinking agent The crosslinking agent (B) is not particularly limited as long as it acts as a crosslinking component (curing component) that reacts with the block copolymer (A). Examples of the crosslinking agent (B) include a compound having two or more alkyl etherified amino groups in the molecule (hereinafter referred to as “amino group-containing compound”), an oxirane ring-containing compound, and an oxetanyl group-containing compound. , Isocyanate group-containing compounds (including blocked ones), aldehyde group-containing phenol compounds, methylol group-containing phenol compounds, etc., especially o-hydroxybenzaldehyde, 2,6-bis (hydroxymethyl) -p- Cresol and hexamethoxymethylmelamine are preferred. These crosslinking agents (B) may be used alone or in combination of two or more.

The amino group-containing compound is not particularly limited. For example, an active methylol group in a nitrogen compound such as (poly) methylolated melamine, (poly) methylolated glycoluril, (poly) methylolated benzoguanamine, (poly) methylolated urea ( And a compound in which all or a part of (CH ₂ OH group) or at least two (CH ₂ OH groups) is alkyl etherified. Here, examples of the alkyl group constituting the alkyl ether include a methyl group, an ethyl group, and a butyl group, which may be the same as or different from each other. In addition, the methylol group that is not alkyletherified may be self-condensed within one molecule, or may be condensed between two molecules, and as a result, an oligomer component may be formed. Specifically, hexamethoxymethyl melamine, hexabutoxymethyl melamine, tetramethoxymethyl glycoluril, tetrabutoxymethyl glycoluril and the like can be used.

  The oxirane ring-containing compound is not particularly limited as long as it contains an oxirane ring in the molecule. For example, a phenol novolac epoxy resin, a cresol novolac epoxy resin, a bisphenol epoxy resin, a trisphenol epoxy resin, Tetraphenol type epoxy resin, phenol-xylylene type epoxy resin, naphthol-xylylene type epoxy resin, phenol-naphthol type epoxy resin, phenol-dicyclopentadiene type epoxy resin, alicyclic epoxy resin, aliphatic epoxy resin, etc. .

  As the crosslinking agent (B), an amino group-containing compound and an oxirane ring-containing compound are preferable, and an amino group-containing compound and an oxirane ring-containing compound can be used in combination. Moreover, when using together, when a sum total is 100 mass%, it is preferable that an oxirane ring containing compound is 50 mass% or less, and it is more preferable that it is 5-40 mass%. The combined use at such a mass ratio is preferable because a cured film excellent in chemical resistance can be formed without impairing high resolution.

  The content of the crosslinking agent (B) is preferably 1 to 100 parts by mass and more preferably 5 to 50 parts by mass when the block copolymer (A) is 100 parts by mass. When the content of the crosslinking agent (B) is 1 to 100 parts by mass, the curing reaction proceeds sufficiently, the formed insulating film has a high resolution and a good pattern shape, and has heat resistance and electrical insulation. It is preferable because of its excellent properties.

(C) Quinonediazide group-containing compound The quinonediazide group-containing compound (C) is a compound having at least one phenolic hydroxyl group and 1,2-naphthoquinonediazide-4-sulfonic acid or 1,2-naphthoquinonediazide-5-sulfone. It is an ester compound with an acid.
The compound having at least one phenolic hydroxyl group is not particularly limited, but is preferably a compound having a structure described in the following formulas (3) to (7).

式（３）において、Ｘ^１〜Ｘ^１０は、それぞれ相互に同一でもよく、異なっていてもよく、水素原子、炭素数１〜４のアルキル基、炭素数１〜４のアルコキシル基又はヒドロキシル基である。尚、Ｘ^１〜Ｘ^５のうちの少なくとも１個はヒドロキシル基である。また、Ａは単結合、Ｏ、Ｓ、ＣＨ_２、Ｃ（ＣＨ_３）_２、Ｃ（ＣＦ_３）_２、Ｃ＝Ｏ、又はＳＯ_２である。

In the formula (3), X ^{1 to} X ¹⁰ may be the same or different from each other, and are a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an alkoxyl group having 1 to 4 carbon atoms, or a hydroxyl group. is there. ^At least one of the X 1 to X ⁵ is a hydroxyl group. A is a single bond, O, S, CH ₂ , C (CH ₃ ) ₂ , C (CF ₃ ) ₂ , C═O, or SO ₂ .

式（４）において、Ｘ^１１〜Ｘ^２４は、それぞれ相互に同一でもよく、異なっていてもよく、水素原子、炭素数１〜４のアルキル基、炭素数１〜４のアルコキシル基又はヒドロキシル基である。尚、Ｘ^１１〜Ｘ^１５のうちの少なくとも１個はヒドロキシル基である。また、Ｒ^４〜Ｒ^７は、それぞれ相互に同一でもよく、異なっていてもよく、水素原子又は炭素数１〜４のアルキル基である。

In the formula (4), X ^{11 to} X ²⁴ may be the same or different from each other, and are a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an alkoxyl group having 1 to 4 carbon atoms, or a hydroxyl group. is there. Note that at least one of X ^{11 to} X ¹⁵ is a hydroxyl group. R ^{4 to} R ⁷ may be the same as or different from each other, and are a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.

式（５）において、Ｘ^２５〜Ｘ^３９は、それぞれ相互に同一でもよく、異なっていてもよく、水素原子、炭素数１〜４のアルキル基、炭素数１〜４のアルコキシル基又はヒドロキシル基である。尚、Ｘ^２５〜Ｘ^２９のうちの少なくとも１個及びＸ^３０〜Ｘ^３４のうちの少なくとも１個はヒドロキシル基である。また、Ｒ^８は、水素原子又は炭素数１〜４のアルキル基である。

In the formula (5), X ^{25 to} X ³⁹ may be the same or different from each other, and are a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an alkoxyl group having 1 to 4 carbon atoms, or a hydroxyl group. is there. ^At least one of the at least one and ^X 30 ^{to X 34} of the X 25 ^{to X 29} is a hydroxyl group. R ⁸ is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.

式（６）において、Ｘ^４０〜Ｘ^５８は、それぞれ相互に同一でもよく、異なっていてもよく、水素原子、炭素数１〜４のアルキル基、炭素数１〜４のアルコキシル基又はヒドロキシル基である。尚、Ｘ^４０〜Ｘ^４４のうちの少なくとも１個、Ｘ^４５〜Ｘ^４９のうちの少なくとも１個及びＸ^５０〜Ｘ^５４のうちの少なくとも１個はヒドロキシル基である。また、Ｒ^９〜Ｒ^１１は、それぞれ相互に同一でもよく、異なっていてもよく、水素原子又は炭素数１〜４のアルキル基である。

In the formula (6), X ^{40 to} X ⁵⁸ may be the same or different from each other, and are a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an alkoxyl group having 1 to 4 carbon atoms, or a hydroxyl group. is there. At least one of X ^{40 to} X ⁴⁴ , at least one of X ^{45 to} X ⁴⁹ and at least one of X ^{50 to} X ⁵⁴ is a hydroxyl group. R ^{9 to} R ¹¹ may be the same as or different from each other, and are a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.

式（７）において、Ｘ^５９〜Ｘ^７２は、それぞれ相互に同一でもよく、異なっていてもよく、水素原子、炭素数１〜４のアルキル基、炭素数１〜４のアルコキシル基又はヒドロキシル基である。尚、Ｘ^５９〜Ｘ^６２のうちの少なくとも１個及びＸ^６３〜Ｘ^６７のうちの少なくとも１個はヒドロキシル基である。

In the formula (7), X ^{59 to} X ⁷² may be the same or different from each other, and are a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an alkoxyl group having 1 to 4 carbon atoms, or a hydroxyl group. is there. ^At least one of the at least one and ^X 63 ^{to X 67} of the X 59 ^{to X 62} is a hydroxyl group.

  Specific examples of the quinonediazide group-containing compound (C) include, for example, 4,4′-dihydroxydiphenylmethane, 4,4′-dihydroxydiphenyl ether, 2,3,4-trihydroxybenzophenone, 2,3,4,4′- Tetrahydroxybenzophenone, 2,3,4,2 ′, 4′-pentahydroxybenzophenone, tris (4-hydroxyphenyl) methane, tris (4-hydroxyphenyl) ethane, 1,1-bis (4-hydroxyphenyl)- 1-phenylethane, 1,3-bis [1- (4-hydroxyphenyl) -1-methylethyl] benzene, 1,4-bis [1- (4-hydroxyphenyl) -1-methylethyl] benzene, 4 , 6-Bis [1- (4-hydroxyphenyl) -1-methylethyl] -1,3-dihydroxybenze 1,1-bis (4-hydroxyphenyl) -1- [4- [1- (4-hydroxyphenyl) -1-methylethyl] phenyl] ethane, and 1,2-naphthoquinonediazide-4-sulfonic acid Or an ester compound with 1, 2- naphthoquinone diazide-5-sulfonic acid etc. are mentioned. These quinonediazide group-containing compounds (C) may be used alone or in combination of two or more.

  Although content of a quinonediazide group containing compound (C) is not specifically limited, When a block copolymer (A) is 100 mass parts, it is preferable that it is 10-50 mass parts, and is 15-30 mass parts. It is more preferable. When the content of the quinonediazide group-containing compound (C) is less than 10 parts by mass, the remaining film ratio in the unexposed area may be reduced, or an image faithful to the mask pattern may not be formed. On the other hand, if the content exceeds 50 parts by mass, the pattern shape may be deteriorated or foamed during curing.

(D) Solvent By containing the solvent (D) in the positive photosensitive insulating resin composition, the handleability of the resin composition can be improved, and the viscosity and storage stability can be adjusted. The solvent (D) is not particularly limited, and examples thereof include ethylene glycol monoalkyl ether acetates such as ethylene glycol monomethyl ether acetate and ethylene glycol monoethyl ether acetate; propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl Propylene glycol monoalkyl ethers such as ether and propylene glycol monobutyl ether; Propylene glycol dialkyl ethers such as propylene glycol dimethyl ether, propylene glycol diethyl ether, propylene glycol dipropyl ether and propylene glycol dibutyl ether; Propylene glycol monomethyl ether acetate and propylene glycol Propylene glycol monoalkyl ether acetates such as rumonoethyl ether acetate, propylene glycol monopropyl ether acetate, propylene glycol monobutyl ether acetate; cellosolves such as ethyl cellosolve and butyl cellosolve; carbitols such as butyl carbitol; methyl lactate, ethyl lactate Lactic acid esters such as ethyl acetate, n-propyl lactate, isopropyl lactate; ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, n-amyl acetate, isoamyl acetate, isopropyl propionate, n-butyl propionate Aliphatic carboxylic acid esters such as isobutyl propionate; methyl 3-methoxypropionate, ethyl 3-methoxypropionate, and 3-ethoxypropionate , Other esters such as ethyl 3-ethoxypropionate, methyl pyruvate and ethyl pyruvate; aromatic hydrocarbons such as toluene and xylene; ketones such as 2-heptanone, 3-heptanone, 4-heptanone and cyclohexanone Amides such as N-dimethylformamide, N-methylacetamide, N, N-dimethylacetamide and N-methylpyrrolidone; lactones such as γ-butyrolacun. These solvents may be used alone or in combination of two or more.

(E) Adhesion aid The positive photosensitive insulating resin composition of the present invention may further contain an adhesion aid (E) in order to improve the adhesion to the substrate. Examples of the adhesion assistant (E) include a functional silane coupling agent having a reactive substituent such as a carboxyl group, a methacryloyl group, an isocyanate group, and an epoxy group. Specifically, trimethoxysilylbenzoic acid, γ-methacryloxypropyltrimethoxysilane, vinyltriacetoxysilane, vinyltrimethoxysilane, γ-isocyanatopropyltriethoxysilane, γ-glycidoxypropyltrimethoxysilane, β -(3,4-epoxycyclohexyl) ethyltrimethoxysilane, 1,3,5-N-tris (trimethoxysilylpropyl) isocyanurate and the like. These adhesion assistants may be used alone or in combination of two or more.

  The content of the adhesion aid (E) is not particularly limited, but when the block copolymer (A) is 100 parts by mass, it is preferably 0.2 to 10 parts by mass, and 0.5 to 8 parts by mass. More preferably, it is a part. If the content of the adhesion assistant (E) is 0.2 to 10 parts by mass, it is preferable because the resin composition has excellent storage stability and good adhesion.

(F) Crosslinked fine particles The positive photosensitive insulating resin composition of the present invention may further contain crosslinked fine particles (F). The crosslinked fine particles (F) are usually composed of a monomer having a hydroxyl group and / or a carboxyl group and a crosslinkable monomer having two or more unsaturated polymerizable groups (hereinafter simply referred to as “crosslinkable monomer”). And crosslinked fine particles of the copolymer. In addition, crosslinked fine particles of a copolymer obtained by copolymerizing another monomer can also be used.

  Examples of the monomer having a hydroxyl group and / or a carboxyl group include hydroxyl group-containing unsaturated compounds such as hydroxyethyl (meth) acrylate, hydroxypropyl (meth) acrylate, hydroxybutyl (meth) acrylate, and (meth) acrylic. Acid, itaconic acid, succinic acid-β- (meth) acryloxyethyl, maleic acid-β- (meth) acryloxyethyl, phthalic acid-β- (meth) acryloxyethyl, hexahydrophthalic acid-β- (meta ) Unsaturated acid compounds such as acryloxyethyl. These monomers having a hydroxyl group and / or a carboxyl group may be used alone or in combination of two or more.

  The ratio of the structural unit derived from the monomer having a hydroxyl group and / or carboxyl group in the crosslinked fine particles (F) is, when the total structural unit derived from the monomer in the crosslinked fine particles (F) is 100 mol%, It is 20 to 90 mol%, preferably 20 to 70 mol%, more preferably 20 to 50 mol%, as calculated from the acid value and hydroxyl value measured according to JIS K 0070. When the proportion of the structural unit derived from the monomer having a hydroxyl group and / or a carboxyl group is less than 20 mol%, dispersibility in an alkali developer may be insufficient, and patterning performance may be deteriorated. On the other hand, when this ratio exceeds 90 mol%, cracks may occur in the cured film or elongation may decrease.

  Examples of the crosslinkable monomer include divinylbenzene, diallyl phthalate, ethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, and pentaerythritol tri (meth) acrylate. And compounds having a plurality of polymerizable unsaturated groups such as polyethylene glycol di (meth) acrylate and polypropylene glycol di (meth) acrylate, and divinylbenzene is preferred. These crosslinking monomers may be used alone or in combination of two or more.

  The proportion of the structural unit derived from the crosslinkable monomer in the crosslinked fine particles (F) is 1 to 20 mol% when the total structural unit derived from the monomer in the crosslinked fine particles (F) is 100 mol%. It is preferably 1 to 10% by mole. If the ratio of the structural unit derived from this crosslinkable monomer is 1 to 20 mol%, it is preferable because it can be a fine particle having a stable shape.

  Furthermore, as other monomers, for example, diene compounds such as butadiene, isoprene, dimethylbutadiene, chloroprene, 1,3-pentadiene; (meth) acrylonitrile, α-chloroacrylonitrile, α-chloromethylacrylonitrile, α-methoxy Unsaturated nitrile compounds such as acrylonitrile, α-ethoxyacrylonitrile, crotonic acid nitrile, cinnamic acid nitrile, itaconic acid dinitrile, maleic acid dinitrile, and fumaric acid dinitrile; (meth) acrylamide, dimethyl (meth) acrylamide, N, N ′ -Methylenebis (meth) acrylamide, N, N'-ethylenebis (meth) acrylamide, N, N'-hexamethylenebis (meth) acrylamide, N-hydroxymethyl (meth) acrylamide, N- (2-hydroxy Unsaturated amides such as ethyl) (meth) acrylamide, N, N-bis (2-hydroxyethyl) (meth) acrylamide, crotonic acid amide, cinnamic acid amide; methyl (meth) acrylate, (meth) acrylic acid (Meth) acrylic acid such as ethyl, propyl (meth) acrylate, butyl (meth) acrylate, hexyl (meth) acrylate, lauryl (meth) acrylate, polyethylene glycol (meth) acrylate, polypropylene glycol (meth) acrylate Esters, styrene, α-methylstyrene, o-methoxystyrene, p-hydroxystyrene, p-isopropenylphenol and other aromatic vinyls, bisphenol A diglycidyl ether, glycol diglycidyl ether and the like (meth) Acrylic acid, hydroxyalkyl Epoxy (meth) acrylates produced by reaction with (meth) acrylate, etc .; Urethane (meth) acrylate, glycidyl (meth) acrylate, (meth) allyl produced by reaction of hydroxyalkyl (meth) acrylate and polyisocyanate Examples thereof include epoxy group-containing unsaturated compounds such as glycidyl ether; amino group-containing unsaturated compounds such as dimethylamino (meth) acrylate and diethylamino (meth) acrylate. Of these other monomers, diene compounds, styrene, and acrylonitrile are preferable, and butadiene is particularly preferable. These other monomers may be used alone or in combination of two or more.

The proportion of structural units derived from other monomers in the crosslinked fine particles (F) is 10 to 80 mol% when the total structural units derived from monomers in the crosslinked fine particles (F) are 100 mol%. It is preferable that it is 30-80 mol%, and it is still more preferable that it is 50-80 mol%. If the proportion of structural units derived from these other monomers is less than 10 mol%, the elongation may decrease. On the other hand, when this ratio exceeds 80 mol%, the dispersibility with respect to the alkaline developer becomes insufficient, and the patterning performance may be deteriorated.
These crosslinked fine particles (F) may be used alone or in combination of two or more.

  The glass transition temperature (Tg) of the copolymer constituting the crosslinked fine particles (F) is preferably 20 ° C. or less, more preferably 10 ° C. or less, and preferably 0 ° C. or less. Further preferred (note that the lower limit is usually -70 ° C). When the Tg of the crosslinked fine particles (F) exceeds 20 ° C., cracks may occur in the cured product such as an insulating film, and elongation may decrease.

The crosslinked fine particles (F) are copolymer fine particles, and the average particle diameter of the crosslinked fine particles (F) is not particularly limited, but is preferably 30 to 500 nm, more preferably 40 to 200 nm, and 50 More preferably, it is -120 nm. The method for controlling the particle size of the crosslinked fine particles (F) is not particularly limited. For example, when preparing the crosslinked fine particles by emulsion polymerization, the particle size can be adjusted by adjusting the number of micelles during emulsion polymerization according to the amount of the emulsifier used. Can be controlled.
The average particle diameter of the crosslinked fine particles (F) is obtained by diluting the dispersion of the crosslinked fine particles (F) according to a conventional method using a light scattering flow distribution measuring device (model “LPA-3000” manufactured by Otsuka Electronics Co., Ltd.). Measured value.

  The content of the crosslinked fine particles (F) is preferably 1 to 200 parts by mass, more preferably 1 to 150 parts by mass, when the block copolymer (A) is 100 parts by mass. More preferably, it is -100 mass parts. When the content of the crosslinked fine particles (F) is less than 1 part by mass, the formed insulating film or the like may be cracked or the elongation may be reduced. On the other hand, if the content exceeds 200 parts by mass, a residue of crosslinked fine particles (F) is generated during development, and the patterning performance may be deteriorated.

Other Additives Other additives can be added to the positive photosensitive insulating resin composition of the present invention as needed so as not to impair the characteristics of the present invention. Examples of such other additives include heat-sensitive acid generators, sensitizers, leveling agents and surfactants.

  The heat-sensitive acid generator is not particularly limited as long as it is a compound that generates an acid by heat treatment. The catalytic action of the generated acid promotes the reaction between the block copolymer (A) and a functional group such as an alkyl ether group in the crosslinking agent (B). Examples of the heat-sensitive acid generator include onium salt compounds.

  The leveling agent / surfactant is usually added to improve the coating property of the resin composition. The leveling agent / surfactant is not particularly limited. For example, polyoxyethylene alkyl ethers such as polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene cetyl ether, polyoxyethylene olein ether; Polyoxyethylene alkyl allyl ethers such as ethylene octylphenol ether and polyoxyethylene nonylphenol ether; polyoxyethylene polyoxypropylene block copolymers; sorbitan fatty acid esters such as sorbitan monolaurate, sorbitan monopalmitate, sorbitan monostearate; Polyoxyethylene sorbitan monolaurate, polyoxyethylene sorbitan monopalmitate, polyoxyethylene sorbita Monostearate, polyoxyethylene sorbitan trioleate, nonionic leveling agent, surfactants such as polyoxyethylene sorbitan fatty acid esters such as polyoxyethylene sorbitan tristearate and the like.

Further, as specific products, product names “F-top EF301”, “EF303”, “EF352” manufactured by Tochem Products, Inc., and product names “Megafac F171”, “F172” manufactured by Dainippon Ink & Chemicals, Inc. , “F173”, trade names “Florard FC430” and “FC431” manufactured by Sumitomo 3M, trade names “Asahi Guard AG710”, “Surflon S-381”, “S-382”, “SC101” manufactured by Asahi Glass Co., Ltd., “SC102”, “SC103”, “SC104”, “SC105”, “SC106”, “Surfinol E1004,“ KH-10 ”,“ KH-20 ”,“ KH-30 ”,“ KH-40 ”, Neos Fluorine leveling agents / surfactants such as “Factent 250,“ 251 ”,“ 222F ”,“ FTX-218 ”, etc. Organosiloxane polymer leveling agents and surfactants such as “KP341”, “X-70-092”, “X-70-093” manufactured by Kagaku Kogyo Co., Ltd., and “SH8400” manufactured by Toray Dow Corning Acrylic or methacrylic acid leveling agents / surfactants such as “Polyflow No. 75”, “No. 77”, “No. 90”, “No. 95” manufactured by Kyoeisha Yushi Chemical Co., Ltd. Is mentioned.
These leveling agents and surfactants may be used alone or in combination of two or more.

  The amount of the leveling agent / surfactant added is usually preferably 50 to 1000 ppm, more preferably 100 to 800 ppm in the solution containing the resin composition. When it is less than 50 ppm, the uniform coating property on the stepped substrate is lowered, and when it exceeds 1000 ppm, the adhesion during development and after curing may be lowered.

Manufacturing method The manufacturing method of the positive photosensitive insulating resin composition of this invention is not specifically limited, It can manufacture by a well-known method. Moreover, it can manufacture also by throwing each component into a sample bottle, sealing after that, and stirring on a wave rotor.

[2] Cured product The cured product of the present invention is obtained by curing a positive photosensitive insulating resin composition.
Since the positive photosensitive insulating resin composition of the present invention is excellent in various properties such as resolution, adhesion, thermal shock, electrical insulation, patterning performance, and elongation, the cured product is a circuit board. (Semiconductor elements), surface protective films for electronic components such as semiconductor packages, planarizing films, interlayer insulating films, insulating film materials for high-density mounting substrates, photosensitive adhesives, pressure-sensitive adhesives, etc. . In particular, the cured product can be a circuit board provided with an interlayer insulating film or a planarizing film.

  The cured product of the present invention is obtained by applying the positive-type photosensitive insulating resin composition of the present invention to a support (a copper wafer with resin, a copper-clad laminate, a silicon wafer provided with a metal sputtered film, an alumina substrate, or the like). , Dried, volatilized solvent, etc. to form a coating film, and then exposed through a desired mask pattern, heat-treated (hereinafter referred to as “PEB”), Accelerate the reaction between the union (A) and the compound (B), and then develop with an alkaline developer to dissolve and remove the exposed area to form a desired pattern, and then express the insulating film characteristics In order to make it heat-processed, it can form.

  As a method for applying the resin composition to the support, various coating methods such as a dipping method, a spray method, a bar coating method, a roll coating method, a spin coating method, and a curtain coating method can be employed. Further, the thickness of the coating film can be appropriately controlled by adjusting the coating means, the solid content concentration of the resin composition solution, the viscosity, and the like.

Examples of radiation used for exposure include ultraviolet rays, electron beams, laser beams, and the like irradiated from a low-pressure mercury lamp, a high-pressure mercury lamp, a metal halide lamp, a g-line stepper, an i-line stepper, and the like. Furthermore, the exposure amount can be appropriately set depending on the light source to be used, the resin film thickness, and the like. For example, in the case of ultraviolet rays irradiated from a high-pressure mercury lamp, when the coating film thickness is 5 to 50 μm, 1000 to 20 About 1,000 J / m ² .

  After the exposure, development is performed with an alkaline developer, and a desired pattern is formed by dissolving and removing the exposed portion. Examples of the developing method include shower developing method, spray developing method, immersion developing method, paddle developing method and the like. The development conditions are usually 20 to 40 ° C. and about 1 to 10 minutes. Examples of the alkaline developer include an alkaline aqueous solution in which an alkaline compound such as sodium hydroxide, potassium hydroxide, ammonia water, tetramethylammonium hydroxide, and choline is dissolved in water so as to have a concentration of 1 to 10% by mass. Can be mentioned. In addition, an appropriate amount of a water-soluble organic solvent such as methanol or ethanol, a surfactant, or the like can be added to the alkaline aqueous solution. In addition, after developing with an alkaline developer, it is washed with water and dried.

  Furthermore, after development, in order to sufficiently develop the characteristics as an insulating film, it can be sufficiently cured by heat treatment. Such curing conditions are not particularly limited, but can be cured by heating at a temperature of 100 to 250 ° C. for about 30 minutes to 10 hours depending on the use of the cured product. Moreover, in order to advance hardening fully or to prevent the deformation | transformation of a pattern shape formed, it can also heat in two steps, for example, at the temperature of 50-100 degreeC in a 1st step, 10 minutes- It can also be heated for about 2 hours and further cured at a temperature of 100 to 250 ° C. for about 20 minutes to 8 hours. Under such curing conditions, a general oven, an infrared furnace, or the like can be used as a heating facility.

  By using the positive-type photosensitive insulating resin composition of the present invention, electronic parts such as circuit boards (semiconductor elements) as shown in FIGS. 1 and 2 can be formed. That is, the metal pad 2 is formed in a pattern on the substrate 1, and then the cured insulating film 3 is formed in a pattern using the resin composition, and then the metal wiring 4 is formed in the pattern. 1 can be produced. Further, by forming a cured insulating film 5 on this substrate, a circuit substrate as shown in FIG. 2 can be produced.

Hereinafter, the present invention will be described specifically by way of examples.
[1] Production of block copolymer Production Example 1
Polymer radical polymerization having a dimethylsiloxane structure was started by dissolving 50 parts by weight of pt-butoxystyrene in 150 parts by weight of propylene glycol monomethyl ether under a nitrogen stream and maintaining the reaction temperature at 70 ° C. in a nitrogen atmosphere. Polymerization was carried out for 10 hours using 10 parts by weight of an agent (trade name “VPS-1001” manufactured by Wako Pure Chemical Industries, Ltd.). Thereafter, sulfuric acid was added to the reaction solution, and the reaction temperature was kept at 90 ° C. for reaction for 10 hours, and pt-butoxystyrene was deprotected and converted to 4-hydroxystyrene. Ethyl acetate was added to the obtained copolymer, washing with water was repeated 5 times, the ethyl acetate phase was separated, the solvent was removed, and a block copolymer [4-hydroxystyrene / dimethylsiloxane copolymer (hereinafter, "Copolymer (A-1)") was obtained.
When the composition of the copolymer (A-1) was analyzed by ¹³ C-NMR, the proportion of the structural unit (a1) derived from 4-hydroxystyrene was 80 mol%, and the structural unit (a2) derived from dimethylsiloxane. The ratio was 20 mol%. The copolymer (A-1) had a polystyrene equivalent weight average molecular weight of 5,000 and a molecular weight distribution of 1.3.

For ¹³ C-NMR analysis, a model “JNM-EX270” manufactured by JEOL Ltd. was used. For measurement of Mw and Mn, GPC of the model “HLC-8220GPC” manufactured by Tosoh Corporation was used. Specifically, two G2000HXL, one G3000HXL and one G4000HXL were used as columns, flow rate: 1.0 ml / min, elution solvent; tetrahydrofuran, column temperature; It was measured by GPC using dispersed polystyrene as a standard. The molecular weight distribution (Mw / Mn) was calculated based on the measured values of Mw and Mn.

Production Examples 2-3 and Comparative Production Example 1
Production Example 2
Except having changed the quantity ratio with pt-butoxystyrene and the polymer radical polymerization initiator which has a dimethylsiloxane structure (the product name "VPS-1001" by Wako Pure Chemical Industries, Ltd.), it carried out similarly to manufacture example 1 Then, an AB type block copolymer was produced [referred to as “copolymer (A-2)”. ]. When the copolymer (A-2) was analyzed in the same manner as in Production Example 1, the proportion of the structural unit (a1) derived from 4-hydroxystyrene was 80 mol%, and the structural unit (a2 derived from dimethylsiloxane). The copolymer (A-2) had a polystyrene equivalent weight average molecular weight of 10,000 and a molecular weight distribution of 1.4.

Production Example 3
Except having changed the quantity ratio with pt-butoxystyrene and the polymer radical polymerization initiator which has a dimethylsiloxane structure (the product name "VPS-1001" by Wako Pure Chemical Industries, Ltd.), it carried out similarly to manufacture example 1 An AB type block copolymer was produced [referred to as “copolymer (A-3)”. ]. When the copolymer (A-3) was analyzed in the same manner as in Production Example 1, the proportion of the structural unit (a1) derived from 4-hydroxystyrene was 60 mol%, and the structural unit (a2 derived from dimethylsiloxane). ) Was 40 mol%. The copolymer (A-3) had a polystyrene equivalent weight average molecular weight of 5,000 and a molecular weight distribution of 1.3.

Comparative production example 1
An AB type block copolymer was produced in the same manner as in Production Example 1 except that styrene and a radical polymerization initiator [AIBN (azobisisobutyronitrile)] were used instead of the polymer radical polymerization initiator. This is designated as “Copolymer AR-1.” ]. When the copolymer (AR-1) was analyzed in the same manner as in Production Example 1, the proportion of the structural unit (ar1) derived from 4-hydroxystyrene was 80 mol%, and the structural unit (ar2) derived from styrene. The ratio was 20 mol%. The copolymer (AR-1) had a polystyrene equivalent weight average molecular weight of 10,000 and a molecular weight distribution of 1.5.

[2] Production Example 1 of Positive Type Photosensitive Insulating Resin Composition
As shown in Table 1, 100 parts by mass of the copolymer (A-1), 10/10 parts by mass of the crosslinking agent (B-1 / B-4), and 25 parts by mass of the quinonediazide group-containing compound (C-1). , 150 parts by mass of solvent (D-1), 3 parts by mass of adhesion assistant (E-1), 0.1 parts by mass of surfactant, and each component is dissolved in a solvent, and positive photosensitive An insulating resin composition was produced.

Examples 2 to 7 and Comparative Example 1
A positive photosensitive insulating resin composition containing the copolymer, the crosslinking agent, the quinonediazide group-containing compound, the solvent, the adhesion aid and the surfactant described in Table 1 so as to have the mass ratio shown in Table 1. Manufactured.
In addition to the above components, in Example 5, 5 parts by mass of a phenolic low molecular compound [phenol compound (a-1)] was blended. Moreover, in Example 6, 5 mass parts of crosslinked fine particles (F-1) were mix | blended.

Details of the other components excluding the copolymer among the components described in Table 1 are as follows.
(A) Phenol compound a-1: 1,1-bis (4-hydroxyphenyl) -1- {4- [1- (4-hydroxyphenyl) -1-methylethyl] phenyl} ethane (B) Crosslinking agent B -1: Hexamethoxymethylated melamine (Mitsui Cytec Co., Ltd., trade name "Cymel 300")
B-2: Propylene glycol diglycidyl ether (manufactured by Kyoeisha, trade name “Epolite 70P”)
B-3: Pentaerythritol glycidyl ether (manufactured by Nagase Chemtech, trade name “Denacol EX411”)
B-4: Phenol-dicyclopentadiene type epoxy resin (manufactured by Nippon Kayaku Co., Ltd., trade name “XD-1000”)
(C) quinonediazide group-containing compound C-1: 1,1-bis (4-hydroxyphenyl) -1- [4- [1- (hydroxyenyl) -1-methylethyl] phenyl] ethane; -Quinonediazide sulfonic acid ester (2.0 molar condensate) obtained by esterifying naphthoquinonediazide-5-sulfonic acid
C-2: quinonediazide sulfonic acid ester (1.5 mol) obtained by esterifying 1,1-bis (4- (hydroxyphenyl) -1-ethane and 1,2-naphthoquinonediazide-5-sulfonic acid Condensate)
(D) Solvent D-1: Ethyl lactate (E) Adhesion aid E-1: 1,3,5-N-tris (trimethoxylylpropyl) isocyanurate (product name “Y11597” manufactured by Momentive)
E-2; γ-glycidoxypropyltrimethoxysilane (manufactured by Chisso, trade name “S-510”)
(F) Crosslinked fine particles F-1: butadiene / styrene / hydroxybutyl methacrylate / methacrylic acid / divinylbenzene = 60/20/12/6/2 (mass%), average particle diameter: 65 nm
(G) Surfactant G-1: Neos, trade name “FTX-218”

[3] Evaluation of photosensitive insulating resin composition The characteristics of the positive photosensitive insulating resin compositions of Examples 1 to 7 and Comparative Example 1 were evaluated according to the following methods. The results are shown in Table 2.
(1) Resolution A 6-inch silicon wafer was spin-coated with a positive photosensitive insulating resin composition, and then heated at 110 ° C. for 3 minutes using a hot plate to produce a uniform resin film having a thickness of 20 μm. . Next, using an aligner (model “MA-100” manufactured by Karl Suss), UV light irradiated from a high-pressure mercury lamp through a pattern mask was exposed so that the exposure amount at a wavelength of 365 nm was 500 mJ / cm ² . . Thereafter, the substrate was heated (PEB) at 110 ° C. for 3 minutes using a hot plate, and immersed and developed at 23 ° C. for 120 seconds using a 2.38 mass% aqueous tetramethylammonium hydroxide solution. The minimum dimension of the pattern thus obtained is taken as the resolution.

(2) Stress of insulating film A positive photosensitive insulating resin composition is spin-coated on an 8-inch silicon wafer, and then heated at 110 ° C. for 3 minutes using a hot plate to form a uniform resin film having a thickness of 20 μm. Was made. Next, using an aligner (manufactured by Karl Suss, model “MA-100”), ultraviolet light irradiated from a high-pressure mercury lamp was exposed so that the exposure amount at a wavelength of 365 nm was 500 mJ / cm ² . Thereafter, the substrate was heated (PEB) at 110 ° C. for 3 minutes using a hot plate, and immersed and developed at 23 ° C. for 120 seconds using a 2.38 mass% aqueous tetramethylammonium hydroxide solution. Then, it heated at 190 degreeC for 1 hour using the convection type oven, the resin coating film was hardened, and the insulating film was formed. And the stress difference of the board | substrate before and behind insulating film formation was measured with the stress measuring device (FLX-2320-s by the TOHO technology (old technology possession KLA-Tencor) company), and the stress was evaluated.

(3) Electrical Insulation As shown in FIG. 3, a positive photosensitive insulating resin composition is applied to a base material 8 for insulating evaluation having a patterned copper foil 7 on a substrate 6, and hot The substrate was heated at 110 ° C. for 3 minutes using a plate to prepare a substrate having a resin coating film having a thickness of 10 μm on the copper foil 7. Then, it heated at 190 degreeC for 1 hour using the convection-type oven, the resin coating film was hardened, and the cured film was formed. This base material 8 is put into a migration evaluation system (model “AEI, EHS-221MD” manufactured by Tabai Espec Co., Ltd.) and treated for 200 hours under conditions of a temperature of 121 ° C., a humidity of 85%, a pressure of 1.2 atmospheres, and an applied voltage of 5V. did. Next, the resistance value (Ω) of the test substrate was measured to evaluate the insulation.

  According to the result of Table 2, it turned out that Examples 1-7 have small stress of an insulating film, and are excellent in resolution and electrical insulation.

It is a schematic diagram explaining the cross section of a semiconductor element. It is a schematic diagram explaining the cross section of a semiconductor element. It is a schematic diagram explaining the base material for electrical insulation evaluation.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1; Board | substrate, 2; Metal pad, 3; Curing insulating film, 4; Metal wiring, 5; Curing insulating film, 6: Board | substrate, 7; Copper foil, 8: Base material for insulation evaluation.

Claims (7)

(A) a block copolymer having a structural unit (a1) represented by the following formula (1) and a structural unit (a2) represented by the following formula (2);
(B) a crosslinking agent,
(C) a compound having a quinonediazide group,
(D) A positive photosensitive insulating resin composition comprising a solvent.

[R ^{1 in} Formula (1) represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. Also, ^{R 2} and ^{R 3} of formula (2) represents an alkyl group having 1 to 4 carbon atoms. ]   2. The positive type according to claim 1, wherein the content ratio of the structural unit (a1) is 20 to 90 mol% when the total of the structural unit (a1) and the structural unit (a2) is 100 mol%. Photosensitive insulating resin composition.   The positive photosensitive insulating resin composition according to claim 1 or 2, wherein the block copolymer (A) has a polystyrene-equivalent weight average molecular weight measured by gel permeation chromatography of 3,000 to 30,000. .   The cross-linking agent (B) is at least one of a compound having two or more alkyl etherified amino groups in the molecule and an oxirane group-containing compound. The positive photosensitive insulating resin composition described.   The positive photosensitive insulating resin composition according to any one of claims 1 to 4, further comprising an adhesion assistant (E). Furthermore, it contains crosslinked fine particles (F) ,
The cross-linked fine particle is made of a copolymer of a monomer having a hydroxyl group and / or a carboxyl group and a cross-linkable monomer having two or more unsaturated polymerizable groups. The positive photosensitive insulating resin composition according to claim 1.   A cured product obtained by curing the positive photosensitive insulating resin composition according to any one of claims 1 to 6.

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