JP5175043B2 - Liquid crystal device, manufacturing method thereof, and electronic apparatus - Google Patents

Description

The present technology relates to a liquid crystal device, a manufacturing method thereof, and an electronic device.

  Conventionally, in a liquid crystal device, a lateral electric field type liquid crystal device has been proposed as a structure for improving a narrow viewing angle. As a lateral electric field type liquid crystal device, a fringe field switching (FFS) mode liquid crystal device is known. In an FFS mode liquid crystal device, a first electrode and a second electrode are disposed on one of a pair of substrates sandwiching a liquid crystal layer, and an electric field (lateral electric field) generated between the first and second electrodes. ) Drives the liquid crystal layer (see, for example, Patent Documents 1 and 2).

  Such an FFS mode liquid crystal device is required to have a pixel design with a high aperture ratio and a high transmittance. Therefore, in order to reduce dark regions that do not contribute to transmission, a comb-like electrode having one end opened as the structure of the pixel electrode improves the high aperture ratio and high transmittance in this region.

Patent Document 1 discloses a liquid crystal device having a structure (one-side open pixel) in which a signal line is not formed at the boundary between adjacent pixels.
Patent Document 2 discloses a liquid crystal device in which the directions of the polarization axis and the rubbing axis are defined at a predetermined angle so as to remove rubbing unevenness and afterimages caused by the voltage applied to the panel in a low gradation and dark state. ing.
JP 2003-308951 A JP 2005-234527 A

  However, in a liquid crystal device having a comb-like electrode with one end open, there is a problem in that display unevenness and alignment failure occur due to non-uniformity of rubbing when a voltage is applied to the liquid crystal. .

The present technology has been made in view of the above-described problems, and in a liquid crystal device having a comb-like electrode that is open on one side, the occurrence of alignment failure is suppressed, and a liquid crystal device with a high aperture ratio is realized. An object of the present invention is to provide a device and a method for manufacturing a liquid crystal device.

The present technician relates to a liquid crystal device having a comb-like electrode having one end opened, and the pretilt imparted to the liquid crystal molecules becomes too large on the inclined surface formed in the alignment film, thereby constituting the liquid crystal device. It has been found that liquid crystal molecules rise due to the electric field generated from the wiring. Further, it has been found that alignment failure occurs due to this and causes light leakage. Therefore, the present engineer has come up with the present technology having the following configuration.
The liquid crystal device according to the present technology includes a first substrate and a second substrate facing each other with a liquid crystal layer interposed therebetween, a first electrode formed on the liquid crystal layer side of the first substrate, a first insulating film, and the first substrate A liquid crystal device comprising: a second electrode formed on the first electrode through a second insulating film formed on the insulating film; and an alignment film covering the second insulating film and the second electrode The second electrode extends in the substrate surface direction, and has a plurality of strip electrode portions having one end portion in the extending direction as a connection end and the other end portion as an open end, A connecting portion that connects each of the connecting ends of the belt-like electrode portion, and a wiring that is parallel to the connecting portion and adjacent to the connecting portion in plan view is a position on the first electrode and on the first insulating film together provided, the covered with the second insulating film, between the said and the connecting portion wiring in plan view, the light is be transparent Region is provided on the the said alignment layer having formed slant to follow the formed step between the upper surface of the upper surface and the second insulating film of the second electrode, the wiring from the connecting end The rubbing process is applied in the direction of the direction.
In this way, the rubbing process is performed on the inclined surface of the alignment film in the vicinity of the connection end in a direction downward from the inclined surface. In this inclined surface, the liquid crystal molecules are given a pretilt in a direction (downward direction) from the inclined surface toward the upper surface of the second insulating film. Therefore, even when an electric field is generated from the wiring, the liquid crystal molecules can be prevented from rising. Accordingly, it is possible to provide a liquid crystal device in which the occurrence of alignment failure is suppressed, light leakage is prevented, and a high aperture ratio is realized.
Further, in the liquid crystal device of the present technology, the light is transmitted between the connecting portion and the wiring. In other words, in the region between the connecting portion and the wiring when the liquid crystal device is viewed from the vertical direction. The light shielding layer is not formed at the overlapping position.
As described above, since the liquid crystal molecules are rubbed in the direction in which the liquid crystal molecules go down the inclined surface between the connecting portion and the wiring, alignment failure and light leakage due to the electric field are prevented. For this reason, it is not necessary to provide a light shielding layer, and the region between the connecting portion and the wiring can be used as a region through which light is transmitted. Therefore, the opening area is increased by the area where the light shielding layer is not formed. Therefore, a high aperture ratio can be realized.

In the liquid crystal device of the present technology , it is preferable to have a first strip electrode portion group and a second strip electrode portion group arranged in line symmetry in a plan view. In addition, it is preferable that a direction in which the rubbing process is performed on the alignment film is parallel to an axis of symmetry in the first strip electrode portion group and the second strip electrode portion group.
In this way, a so-called two-domain liquid crystal device can be realized.

Method of manufacturing a liquid crystal device of the present technology, a first substrate and a second substrate facing the liquid crystal layer is sandwiched, a first electrode formed on the liquid crystal layer side of the first substrate, the first insulating film and A second electrode formed on the first electrode via a second insulating film formed on the first insulating film; and an alignment film covering the second insulating film and the second electrode. A plurality of strip-shaped electrode portions extending in the substrate surface direction and having one end portion in the extending direction as a connecting end and the other end portion as an open end; A step of forming the second electrode having a connecting portion that connects the connecting ends of the strip electrode portions, and a position on the first electrode that is parallel to the connecting portion and adjacent to the connecting portion in a plan view . and forming a wiring on the first insulating film, by coating the wire with the second insulating film Formed so as to follow the steps of providing a region through which light is transmitted, the step formed between the upper surface of the upper surface and the second insulating layer of the second electrode between said coupling section line in plan view Performing a rubbing process on the alignment film having the inclined surface in a direction from the connection end toward the wiring.
In this way, the rubbing process is performed on the inclined surface of the alignment film in the vicinity of the connection end in a direction downward from the inclined surface. In this inclined surface, the liquid crystal molecules are given a pretilt in a direction (downward direction) from the inclined surface toward the upper surface of the insulating film. Therefore, even when an electric field is generated from the wiring, the liquid crystal molecules can be prevented from rising. Accordingly, it is possible to provide a liquid crystal device in which the occurrence of alignment failure is suppressed, light leakage is prevented, and a high aperture ratio is realized.

In the method of manufacturing a liquid crystal device according to the present technology , the moving direction of the first substrate and the rotating direction of the rubbing roll are the same at the contact position between the first substrate and the rubbing roll used for the rubbing process. Preferably there is.
If it does in this way, a rubbing cloth can be surely reached to the inclined surface of an alignment film, rotating a rubbing roll, and a rubbing process can be performed suitably to the inclined surface of an alignment film.

Electronic device of the present technology, obtain Bei the liquid crystal device described above.
According to this configuration, it is possible to provide an electronic device including a display unit that achieves a high aperture ratio.

<Liquid crystal device>
Hereinafter, a liquid crystal device according to an embodiment of the present technology will be described with reference to the drawings.
The liquid crystal device of this embodiment is a horizontal electric field type liquid crystal device that displays an image by applying an electric field (lateral electric field) in the substrate surface direction to the liquid crystal and controlling the alignment. Further, among the horizontal electric field type liquid crystal devices, the present embodiment is a liquid crystal device adopting a method called an FFS (Fringe Field Switching) method. The color liquid crystal device includes a color filter on a substrate. In such a color liquid crystal device, one pixel is constituted by three sub-pixels that emit light of each color of R (red), G (green), and B (blue). Therefore, in the present embodiment, a display area that is a minimum unit that constitutes a display is referred to as a “subpixel area”, and a display area that is composed of a set of (R, G, B) subpixels is referred to as a “pixel area”. Called.

  FIG. 1 is a circuit configuration diagram of a plurality of sub-pixels formed in a matrix that constitutes the liquid crystal device of the present embodiment. FIG. 2 is a plan configuration diagram illustrating an arbitrary one subpixel of the liquid crystal device 100 and a subpixel adjacent to the subpixel. FIG. 3 is a partial cross-sectional configuration diagram taken along line AA of FIG. FIG. 4A is a perspective view of the liquid crystal device of the present embodiment seen from the vertical direction, and is an enlarged plan view for explaining the main part of the pixel electrode. FIG. 4B is a partial cross-sectional configuration diagram taken along the line BB in FIG.

  As shown in FIG. 3, the liquid crystal device 100 according to the present embodiment includes a TFT array substrate (first substrate) 10 and a counter substrate (second substrate) 20 that are arranged to face each other, and between these substrates 10 and 20. And a liquid crystal layer 50 sandwiched between the two. Further, a backlight 90 is disposed on the outer surface side of the TFT array substrate 10, thereby constituting a transmissive liquid crystal device.

  In each drawing, each layer and each member are displayed in different scales so that each layer and each member can be recognized on the drawing.

  As shown in FIG. 1, a plurality of sub-pixel areas formed in a matrix that form an image display area of the liquid crystal device 100 are respectively connected to a pixel electrode 9 and a pixel electrode 9. The TFT 30 for switching control is formed, and the data line 6 a extending from the data line driving circuit 101 is electrically connected to the source of the TFT 30. The data line driving circuit 101 supplies image signals S1, S2,..., Sn to each pixel via the data line 6a. The image signals S1 to Sn may be supplied line-sequentially in this order, or may be supplied for each group to a plurality of adjacent data lines 6a.

A scanning line 3 a extending from the scanning line driving circuit 102 is electrically connected to the gate of the TFT 30, and scanning signals G 1 and G 2 supplied in a pulsed manner from the scanning line driving circuit 102 to the scanning line 3 a at a predetermined timing. ,..., Gm are applied to the gate of the TFT 30 in line order in this order. The pixel electrode 9 is electrically connected to the drain of the TFT 30.
Then, the TFT 30 as a switching element is turned on for a certain period by the input of the scanning signals G1, G2,..., Gm, so that the image signals S1, S2,. The pixel electrode 9 is written with timing.

  Image signals S1, S2,..., Sn written to the liquid crystal via the pixel electrode 9 are held for a certain period between the common electrode facing the pixel electrode 9 via the liquid crystal. Further, a common wiring 3b for holding the common electrode at a constant potential is formed.

As shown in FIG. 2, a pixel electrode (second electrode) 9 and a common electrode (first electrode) 19 are provided in the sub-pixel region of the liquid crystal device 100.
The pixel electrode 9 is formed in a substantially comb shape in plan view. The common electrode 19 is disposed so as to overlap the pixel electrode 9 in a plan view, and extends in the left-right direction (X-axis direction) on the paper surface. A columnar spacer 40 for holding the TFT array substrate 10 and the counter substrate 20 at a predetermined interval is provided at the corner (or the gap between the subpixel regions) at the upper left end of the subpixel region in the figure. It is installed.
In FIG. 2, the direction in which the scanning line 3a extends is defined as the X-axis direction, and the direction in which the data line 6a extends is defined as the Y-axis direction.

The pixel electrode 9 includes a plurality of strip electrodes 9c and a connecting portion 9a that connects the strip electrodes 9c.
The plurality of strip-like electrodes 9c extend from the connecting portion 9a toward only the data line 6a side of the connecting portion 9a (only the + X direction side from the connecting portion 9a). Note that the strip electrode 9c is not formed on the side of the connecting portion 9a opposite to the data line 6a (the side in the −X direction from the connecting portion 9a).
Further, the plurality of strip electrodes 9c are arranged in line symmetry with respect to a center line (symmetry axis) CL extending in the extending direction (X-axis direction) of the scanning line 3a in FIG.
More specifically, a plurality of strip electrodes 9c (six in the figure) formed in the region of the center line CL on the scanning line 3a side (+ Y direction side from the center line CL) are predetermined with respect to the center line CL. Are arranged in the Y-axis direction at equal intervals in parallel with each other. The plurality of strip electrodes 9c formed in this region constitutes a first strip electrode portion group of the present technology .
In addition, a plurality of strip electrodes 9c (six in the drawing) formed in a region opposite to the scanning line 3a of the center line CL (on the −Y direction side from the center line CL) are predetermined with respect to the center line CL. Are arranged in the Y-axis direction at equal intervals in parallel with each other. The plurality of strip electrodes 9c formed in this region constitute the second strip electrode portion group of the present technology .
Further, since the pixel electrode 9 is formed in a comb-teeth shape, each of the plurality of strip-like electrodes 9c includes an open end 9d corresponding to the tip of the comb-teeth and a connection end 9e connected to the connection portion 9a. ,have.
The connecting portion 9a is formed in a region opposite to the region where the data line 6a is formed in the sub-pixel region, and extends in the Y-axis direction. Moreover, the connection part 9a is connected with the connection end 9e of the some strip | belt-shaped electrode 9c.
In the sub-pixel region having such a pixel electrode 9, a plurality of strip electrodes 9c formed in the region on the scanning line 3a side of the center line CL (on the + Y direction side from the center line CL) It is inclined at a predetermined acute angle and extends. Further, the plurality of strip electrodes 9c formed in the region opposite to the scanning line 3a of the center line CL (on the −Y direction side from the center line CL) are the strip electrodes 9c on the scanning line 3a side of the center line CL. Are inclined at the same acute angle, though extending in different directions. The sub-pixel region provided with such a plurality of strip electrodes 9c has a so-called two-domain structure capable of driving the liquid crystal in each region.

  Further, as shown in FIG. 2, a plurality of sub-pixels are arranged along the extending direction (X-axis direction) of the scanning line 3a. Therefore, the data lines (wirings) 6a of the adjacent subpixels and the connecting portion 9a are arranged in parallel and adjacent to each other.

  The common electrode 19 is formed in the lower layer of the pixel electrode 9 through an interlayer insulating film described later. In other words, it is formed between the substrate body 10 </ b> A and the pixel electrode 9. The common electrode 19 is a conductive film made of a transparent conductive material such as ITO (indium tin oxide).

  In the sub-pixel region, a data line 6a extending in the Y-axis direction, a scanning line 3a extending in the X-axis direction, and a common wiring 3b extending in parallel with the scanning line 3a so as to cross the central portion of the sub-pixel are formed. . A TFT 30 is provided in the vicinity of the intersection of the data line 6a and the scanning line 3a. The TFT 30 includes a semiconductor layer 35 made of an island-shaped amorphous silicon film partially formed in a planar region of the scanning line 3a, a source electrode 6b formed partially overlapping the semiconductor layer 35, and a drain electrode. 32. The scanning line 3 a functions as a gate electrode of the TFT 30 at a position overlapping the semiconductor layer 35 in plan view.

  The source electrode 6b of the TFT 30 has a substantially L shape in plan view extending from the data line 6a and extending to the semiconductor layer 35, and the drain electrode 32 extends from the semiconductor layer 35 to the pixel electrode 9 side (from the semiconductor layer 35 − Y side). A part of the drain electrode 32 has a substantially rectangular shape in plan view. In addition, a contact portion 9b of the pixel electrode 9 is disposed in a part of the drain electrode 32, and the drain electrode 32 and the pixel electrode 9 are interposed through a pixel contact hole 45 provided at a position where the two overlap in a plane. And are electrically connected.

3, the liquid crystal device 100 includes a TFT array substrate (first substrate) 10 and a counter substrate (second substrate) 20 that are arranged to face each other, and between the substrates 10 and 20. The liquid crystal layer 50 is sandwiched.
The liquid crystal layer 50 is sealed between the substrates 10 and 20 by a sealing material (not shown) provided along the edge of the region where the TFT array substrate 10 and the counter substrate 20 face each other. A polarizing plate 14 is provided on the outer surface side of the TFT array substrate 10 (opposite side where the liquid crystal layer 50 is disposed), and a polarizing plate 24 is provided on the outer surface side of the counter substrate 20. A backlight (illuminating device) 90 including a light source, a light guide plate 91, and a reflection plate 92 is provided on the back surface side (the lower surface side in the drawing) of the TFT array substrate 10.

The TFT array substrate 10 has a substrate body 10A made of glass, quartz, plastic or the like as a base. On the inner surface side (side on which the liquid crystal layer 50 is disposed) of the substrate body 10A, scanning lines 3a and common wirings 3b are formed. A common electrode 19 made of a transparent conductive material such as ITO is formed so as to cover the common wiring 3b. A gate insulating film (first insulating film) 11 is formed so as to cover the scanning line 3 a and the common electrode 19. An amorphous silicon semiconductor layer 35 is formed on the gate insulating film 11, and a source electrode 6 b and a drain electrode 32 are formed so as to run over part of the semiconductor layer 35. The semiconductor layer 35 is disposed so as to face the scanning line 3a with the gate insulating film 11 interposed therebetween, and the scanning line 3a constitutes the gate electrode of the TFT 30 in the facing region.

An interlayer insulating film (second insulating film) 13 is formed so as to cover the semiconductor layer 35, the source electrode 6 b, and the drain electrode 32. A pixel electrode 9 made of a transparent conductive material such as ITO is formed on the surface of the interlayer insulating film 13 on the liquid crystal layer side. A first alignment film 18 made of polyimide is formed so as to cover the pixel electrode 9 and the interlayer insulating film 13.

  Here, the first alignment film 18 is formed following the surface shape of the pixel electrode 9 and the surface shape of the interlayer insulating film 13. Specifically, the first alignment film 18 is formed following a step from the upper surface of the interlayer insulating film 13 to the upper surface of the pixel electrode 9. Therefore, an inclined surface is formed on the first alignment film 18 between the portion where the pixel electrode 9 is formed and the portion where the interlayer insulating film 13 is exposed.

  A pixel contact hole 45 that reaches the drain electrode 32 through the interlayer insulating film 13 is formed. The pixel contact hole 45 is formed at the position of the connection portion 31 of the drain electrode 32. A part of the contact portion 9b of the pixel electrode 9 is buried in the pixel contact hole 45, and the pixel electrode 9 and the drain electrode 32 are electrically connected.

On the other hand, the counter substrate 20 has a substrate body 20A made of glass, quartz, plastic, or the like as a base. A CF layer 22 and a light shielding layer BM are formed on the inner surface side (side on which the liquid crystal layer 50 is disposed) of the substrate body 20A. The CF layer 22 includes a color filter that transmits different color light for each sub-pixel.
The CF layer 22 may be formed on the TFT array substrate 10 side.

The light shielding layer BM is disposed at a position overlapping the TFT 30 when the liquid crystal device 100 is viewed from the vertical direction.
A second alignment film 28 made of polyimide is formed so as to cover the CF layer 22 and the light shielding layer BM. The second alignment film 28 is subjected to a rubbing process in a direction opposite to the rubbing direction of the first alignment film 18 described later. That is, the first alignment film 18 is rubbed from the connecting portion 9a toward the data line 6a side of the adjacent sub-pixel (from the connecting portion 9a to the −X direction side), whereas the first alignment film 18 is subjected to the rubbing process. The bi-alignment film 28 is rubbed in the opposite direction.

  In the present embodiment, the liquid crystal constituting the liquid crystal layer 50 has a positive dielectric anisotropy. For example, a liquid crystal having a refractive index anisotropy of Δn = 0.1, a dielectric anisotropy ε // of 10, and a positive anisotropy of ε⊥ = 4 is used.

As shown in FIG. 4A, the data line 6a of the adjacent pixel is formed in a region on the left side of the connecting portion 9a of the pixel electrode 9 (on the −X direction side from the center of the connecting portion 9a). Yes.
As shown in FIG. 4B, the first alignment film 18 is formed following the upper surface 13a of the interlayer insulating film 13, the upper surface of the connecting portion 9a, and the side surface (slope) of the connecting portion 9a. Therefore, the first alignment film 18 has an inclined surface 18a formed on the side of the connecting portion 9a. The inclined surface 18a is formed in a region (a region through which light is transmitted) indicated by a symbol C in FIG.
In FIG. 4B, only the interlayer insulating film 13, the pixel electrode 9, the first light distribution film 18, and the data line 6a are shown. The other components are as shown in the cross-sectional view of FIG. 3 and are not shown in FIG.

  The first alignment film 18 is rubbed in the direction of the arrow indicated by reference numeral 60 in FIG. This rubbing direction is generally a direction from the connecting end 9e of the strip electrode 9c toward the data line 6a adjacent to the connecting portion 9a. In the present embodiment, the direction in which the strip electrode 9c extends and the rubbing direction 60 intersect at an acute angle. However, this intersection angle may be set to a predetermined angle if it is not a right angle.

As shown in FIG. 4B, by the rubbing process, the liquid crystal molecules on the first alignment film 18 are given a pretilt in an oblique direction with an angle θ with respect to the surface of the first alignment film 18. Here, since the rubbing process is performed on the entire surface where the first alignment film 18 is exposed, the same process is performed not only on the flat surface of the first alignment film 18 but also on the inclined surface 18a. Is done. When the rubbing process is performed on the inclined surface 18a, the liquid crystal molecules on the inclined surface 18a are given a pretilt toward the downward direction of the inclined surface 18a. In other words, the liquid crystal molecules on the inclined surface 18 a are given a pretilt in a direction (downward direction) from the inclined surface 18 a toward the upper surface 13 a of the interlayer insulating film 13.
The inclined surface 18a is also formed in the vicinity of the open end 9d of the strip electrode 9c.

In the liquid crystal device of the present embodiment, for example, the following configuration can be adopted as the optical axis arrangement in each optical member.
The transmission axis of the polarizing plate 14 on the TFT array substrate 10 side and the transmission axis of the polarizing plate 24 on the counter substrate 20 side are arranged to be orthogonal to each other, and the transmission axis of the polarizing plate 24 is the first alignment film 18. Parallel to the rubbing direction. The rubbing direction of the first alignment film 18 is a direction substantially intersecting with the main direction of the electric field generated between the pixel electrode 9 and the common electrode 19 (the direction orthogonal to the extending direction of the strip electrode 9c). In the initial state, the liquid crystal aligned in parallel along the rubbing direction is rotated and aligned toward the main direction side of the electric field by applying a voltage between the pixel electrode 9 and the common electrode 19. Bright and dark display is performed based on the difference between the initial alignment state and the alignment state when a voltage is applied.

Here, an electric field generated around the data line 6a of the adjacent sub-pixel will be described.
As shown in FIG. 4B, an electric field indicated by symbol E is generated around the data line 6a. Due to the generation of the electric field E, the liquid crystal molecules on the first alignment film 18 generate a force that rises at an angle larger than the pretilt angle. In particular, the liquid crystal molecules on the inclined surface 18a are greatly influenced by the electric field E (see FIG. 6). Therefore, alignment failure occurs due to the rise of the liquid crystal molecules, and the illumination light of the backlight 90 leaks. Since such light leakage occurs in the region C of FIG. 4A, it is necessary to provide a light shielding layer on the counter substrate 20 to prevent this.

Therefore, in the liquid crystal device of this embodiment, the rubbing process is performed in the direction from the coupling end 9e of the strip electrode 9c toward the data line 6a adjacent to the coupling portion 9a, so that the liquid crystal molecules have an inclined surface. A pretilt is given in the downward direction 18a.
Therefore, the influence of the electric field E on the data line 6a is reduced and the liquid crystal molecules are prevented from rising compared to the case where the pretilt is applied at an angle at which the liquid crystal molecules rise from the inclined surface 18a. Accordingly, alignment failure is suppressed, light leakage of illumination light from the backlight 90 can be prevented, and a high aperture ratio can be realized.
Further, even when the electric field E of the data line 6a is generated, since it is possible to suppress alignment failure and prevent light leakage, it is not necessary to provide a light shielding layer. Accordingly, the region C can be used as a region through which light is transmitted. That is, it is possible to realize a high aperture ratio corresponding to the area where the light shielding layer is unnecessary.

Further, in the horizontal electric field type liquid crystal device of the present embodiment, the electrodes 9 and 19 (the pixel electrode 9 and the common electrode 19) are formed only on one substrate, and the voltage applied to the electrodes 9 and 19 is the same. As a result, the liquid crystal is driven. The first alignment film 18 provided on the TFT array substrate 10 on which the electrodes 9 and 19 are formed needs a good alignment regulating force, while the second alignment film 28 provided on the counter substrate 20 on which no electrode is formed. With respect to, even if the alignment regulating force is slightly inferior to that of the first alignment film 18, the display quality is hardly affected. Therefore, the present technology can be suitably used for a horizontal electric field type liquid crystal device in which an electrode for driving liquid crystal is provided only on one substrate.

In the above embodiment, a method called an FFS method is adopted, but the same effect can be obtained by an IPS (In Plane Switching) method in which a liquid crystal is operated by an electric field in the direction of the substrate surface. As a structure in which the present technology is applied to the IPS system, the comb-like pixel electrode 9 and the comb-like common electrode 19 are arranged to mesh with each other in a plan view, and the pixel electrode 9 and the common electrode 19 in a cross-sectional view are arranged. A structure in which an interlayer insulating film is formed between the two is employed.

  In the above embodiment, the case where the data lines 6a of the adjacent sub-pixels and the connecting portion 9a are parallel and adjacent to each other has been described. However, the present invention is not limited to this. In addition to the data line 6a, the present invention can be applied to a case where the connecting portion 9a is parallel and adjacent to various lines such as the scanning line 3a and the common line 3b.

  In addition, the pixel electrode 9 of the above embodiment employs a structure in which the connecting portion 9a extends in the Y-axis direction and the strip electrode 9c extends to the data line 6a side of the connecting portion 9b. However, the present invention is not limited to this. The connecting portion 9a extends in the X-axis direction, and the strip electrode 9c extends on the opposite side of the connecting portion 9a from the scanning line 3a (on the −Y direction side of the connecting portion 9a extending in the X-axis direction). Existing structures may be employed. In this case, the rubbing process for the first alignment film 18 is performed from the connecting portion 9a toward the scanning line 3a (the + Y direction side of the connecting portion 9a extending in the X-axis direction).

<Method for manufacturing liquid crystal device>
Next, a method for manufacturing the liquid crystal device of this embodiment will be described with reference to FIGS.
FIG. 5 is a cross-sectional view showing a step of rubbing the first alignment film 18 in the liquid crystal device 100 and is a partial cross-sectional view taken along the line BB in FIG.
FIG. 6 is a diagram illustrating a case where the rubbing process is performed in the opposite direction to the embodiment of the present technology .

First, the process before performing the rubbing process will be described.
As shown in FIG. 5, the pixel electrode 9 is formed on the interlayer insulating film 13. The pixel electrode 9 is formed by forming a transparent conductive material such as ITO on the entire surface of the interlayer insulating film 13 by a film forming method, and then patterning the formed transparent conductive film using a known photolithography technique. Thus, the planar connecting portion 9a and the strip electrode 9c are formed on the pixel electrode 9. Further, the interlayer insulating film 13 is exposed at the portion where the transparent conductive film is removed.
In the transparent conductive material film forming step, the transparent conductive material is embedded in the pixel contact hole 45 formed in advance in the interlayer insulating film 13, and the contact portion 9 b of the pixel electrode 9 is formed.

Next, the first alignment film 18 is formed so as to cover the exposed surface including the upper surface and the side surface of the pixel electrode 9 and the exposed surface of the interlayer insulating film 13 where the pixel electrode 9 is not formed. Form.
As a method of forming the first alignment film 18, a method of forming a polyimide film by dehydrating and ring-closing polyamic acid, or a method of forming a polyimide film by evaporating a solvent of a soluble polyimide solution can be used. . As a specific forming method, for example, after an alignment film forming material containing polyamic acid or soluble polyimide is applied on a substrate using a printing method or a spin coating method, a polyimide film is subjected to a temporary baking step and a main baking step. The method of forming is mentioned.

In the step of performing a rubbing process on the first alignment film 18, the rubbing roll 80 having a circular cross-sectional view is rotated in the direction indicated by reference numeral 61, and the TFT array substrate 10 on which the rubbing roll 80 and the first alignment film 18 are formed. A method of rubbing a rubbing cloth 81 provided on the surface of the rubbing roll 80 against the surface of the first alignment film 18 is adopted.
In the present embodiment, as described with reference to FIG. 4A, the rubbing process is performed in the direction from the connecting end 9e of the strip electrode 9c toward the data line 6a adjacent to the connecting portion 9a. In the rubbing process, the rotation direction 61 of the rubbing roll 80 and the relative movement direction 62 of the TFT array substrate 10 with respect to the rubbing roll 80 are the same at the position where the rubbing roll 80 and the first alignment film 18 are in contact with each other. In the direction. As a result, the bristles of the rubbing cloth 81 can reliably reach the inclined surface 18 a of the first alignment film 18 while rotating the rubbing roll 80, and the rubbing process is performed on the inclined surface 18 a of the first alignment film 18. Can be applied.

  If the TFT array substrate 10 is manufactured through the above steps, the TFT array substrate 10 manufactured using a known manufacturing method and the counter substrate 20 are bonded together with a sealing material. Thereafter, the space surrounded by the TFT array substrate 10, the counter substrate 20, and the sealing material is filled with liquid crystal and sealed. Then, the polarizing plates 14 and 24 are disposed on the outer surface side of the substrate body 10A and the outer surface side of the substrate body 20A, respectively, and the backlight 90 is disposed on the outer surface side of the TFT array substrate 10, whereby the above-described embodiment. The liquid crystal device 100 can be manufactured.

  A known manufacturing process may be applied to the process of bonding the TFT array substrate 10 and the counter substrate 20, the process of encapsulating the liquid crystal, the process of disposing the polarizing plates 14 and 24, the process of manufacturing the backlight 90, and the like. it can. In addition, when the TFT array substrate 10 and the counter substrate 20 are bonded together, liquid crystal is arranged in advance on the opposing surfaces of both substrates, and the liquid crystal is sealed using a frame-shaped sealing material that does not have a sealing port. A process may be applied.

According to the manufacturing method of the liquid crystal device of the present embodiment, the rubbing process described in FIG. 5 is performed on the first alignment film 18, so that the liquid crystal molecules in the inclined surface 18 a A pretilt is applied in the downward direction.
On the other hand, when the rubbing process is performed in the direction from the data line 6a adjacent to the connecting portion 9a toward the connecting end 9e of the strip electrode 9c, that is, as shown in FIG. When the rubbing process is performed in the rotational direction indicated by reference numeral 63, the pretilt as shown in FIG. 4B cannot be applied to the liquid crystal molecules. In the case shown in FIG. 6, the liquid crystal molecules on the inclined surface 18a of the first alignment film 18 are given a pretilt toward the upward direction of the inclined surface 18a. In other words, the liquid crystal molecules on the inclined surface 18a are given a pretilt from the inclined surface 18a to the upper surface direction (upward direction) of the first alignment film 18. In this case, it becomes easy to be affected by the electric field E of the data line 6a, and the liquid crystal molecules rise. Therefore, orientation failure occurs, light leakage of illumination light from the backlight 90 occurs, and a high aperture ratio cannot be realized. In this case, it is necessary to provide a light shielding layer in order to prevent the leakage of illumination light, but the aperture ratio is reduced by the area where the light shielding layer is provided.

  As is clear from comparison between FIG. 4B and FIG. 6, in this embodiment, the rubbing process is performed in the direction from the connection end 9e of the strip electrode 9c toward the data line 6a adjacent to the connection portion 9a. Therefore, a pretilt in the downward direction can be imparted to the liquid crystal molecules on the inclined surface 18 a of the first alignment film 18. Thereby, alignment failure and light leakage in the vicinity of the inclined surface 18a can be prevented, and a high aperture ratio can be realized. Further, since it is not necessary to provide a light shielding layer at a position overlapping the inclined surface 18a, a high aperture ratio can be realized.

(Electronics)
FIG. 7 is a perspective view illustrating an example of an electronic apparatus according to the present technology . A mobile phone 1300 illustrated in FIG. 7 includes a liquid crystal device according to the present technology as a small-sized display unit 1301 and includes a plurality of operation buttons 1302, an earpiece 1303, and a mouthpiece 1304. Accordingly, it is possible to provide the mobile phone 1300 including the display unit that is configured by the liquid crystal device of the present technology and has excellent display quality.

  The liquid crystal device of the above embodiment is not limited to the mobile phone, but an electronic book, a personal computer, a digital still camera, a liquid crystal television, a viewfinder type or a monitor direct-view type video tape recorder, a car navigation device, a pager, an electronic notebook, It can be suitably used as an image display means for devices such as calculators, word processors, workstations, videophones, POS terminals, touch panels, etc., and any electronic device can display with high contrast and wide viewing angle. ing.

1 is an equivalent circuit diagram of a liquid crystal device according to an embodiment of the present technology . 2 is a plan configuration diagram of one sub-pixel of the liquid crystal device according to the embodiment of the present technology . FIG. The cross-sectional block diagram which follows the AA line of FIG. The principal part enlarged view of the liquid crystal device which concerns on embodiment of this technique . Sectional drawing for demonstrating the manufacturing method of the liquid crystal device which concerns on embodiment of this technique . The figure for demonstrating the conventional rubbing process. FIG. 11 is a perspective configuration diagram illustrating an example of an electronic device.

Explanation of symbols

100 liquid crystal device, 10 TFT array substrate (first substrate), 20 counter substrate (second substrate), 30 TFT (switching element), 6a data line (wiring), 9 pixel electrode (second electrode), 9a connecting portion, 9c strip electrode, 9d open end, 9e connecting end, 13 interlayer insulating film ( second insulating film), 18 first alignment film, 19 common electrode (first electrode), 22 CF layer, 50 liquid crystal layer, BM light shielding layer

Claims (6)

A first substrate and a second substrate facing each other with a liquid crystal layer interposed therebetween, a first electrode formed on the liquid crystal layer side of the first substrate, and a first insulating film and the first insulating film a second electrode formed on the first electrode via the second insulating film, and an alignment film covering the second insulating film and the second electrode, a liquid crystal device provided with,
The second electrode is
A plurality of strip electrode portions extending in the substrate surface direction and having one end portion in the extending direction as a connection end and the other end portion as an open end,
A connecting portion that connects each of the connecting ends of the plurality of strip electrode portions,
A wiring parallel to the connecting portion and adjacent in plan view is provided on the first insulating film at a position on the first electrode , and is covered with the second insulating film,
A region through which light is transmitted is provided between the connecting portion and the wiring in a plan view.
The alignment film having a slope formed so as to follow the step formed between the upper surface of the second electrode and the upper surface of the second insulating film is rubbed in a direction from the connecting end toward the wiring. A liquid crystal device that has been processed.   The liquid crystal device according to claim 1,
  The second electrode is a liquid crystal device having a first strip electrode portion group and a second strip electrode portion group arranged in line symmetry in a plan view.   The liquid crystal device according to claim 1 or 2, wherein
  The direction in which the rubbing treatment is performed on the alignment film is
  A liquid crystal device that is parallel to an axis of symmetry in the first strip electrode portion group and the second strip electrode portion group. A first substrate and a second substrate facing each other with a liquid crystal layer interposed therebetween, a first electrode formed on the liquid crystal layer side of the first substrate, and a first insulating film and the first insulating film A method for manufacturing a liquid crystal device, comprising: a second electrode formed on the first electrode through a second insulating film; and an alignment film covering the second insulating film and the second electrode,
A plurality of strip electrode portions extending in the substrate surface direction and having one end portion in the extending direction as a connection end and the other end portion as an open end, and the connection ends of the plurality of strip electrode portions respectively Forming the second electrode having a connecting portion to be connected;
A wiring is formed on the first insulating film at a position on the first electrode that is parallel and adjacent to the connecting portion in a plan view, and the wiring is covered with the second insulating film, so that a plan view is obtained. And providing a region through which light passes between the connecting portion and the wiring;
Rubbing the alignment film having a slope formed so as to follow the step formed between the upper surface of the second electrode and the upper surface of the second insulating film in a direction from the connection end toward the wiring. A process of processing,
A method of manufacturing a liquid crystal device having   A method of manufacturing a liquid crystal device according to claim 4,
  A method of manufacturing a liquid crystal device, wherein a moving direction of the first substrate and a rotating direction of the rubbing roll are the same at a contact position between the first substrate and a rubbing roll used for the rubbing treatment.   The electronic device provided with the liquid crystal device as described in any one of Claims 1-3.

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