JP5164694B2 - Plating method - Google Patents

Description

  The present invention relates to a plating method, and more particularly to a plating method used for a plating line.

  In this type of plating method, a plurality of bag-like workpieces are sequentially moved to each liquid bath arranged corresponding to a plurality of processing steps necessary for plating, and are immersed in each liquid bath to advance the plating process. For example, the surface of a cap nut as a bag-like workpiece is subjected to a treatment such as electrolytic plating. For example, in Patent Document 1 below, a bolt is held by a holder so that its non-threaded portion is on the lower side, and the entire bolt is immersed in the plating solution according to the vertical position of the holder by the lifting device. A plating method is described that includes one step and a second step in which only the non-threaded portion of the bolt is immersed in the plating solution. Moreover, in this patent document 1, the height of a holder is made constant, and the whole bolt is made into plating solution by adjusting the liquid level height of the plating solution of a liquid tank with liquid level control apparatuses, such as a pump. There is also described a plating method that includes a first step immersed in the second step and a second step in which only the non-threaded portion of the bolt is immersed in the plating solution. According to such a plating method, since the plating film formed on the screw part can be thinned and the plating film formed on the non-screw part can be thickened, the minimum waterproofness is ensured in the screw part. On the other hand, smooth screwing to the female screw portion is possible, and high waterproofness and glossiness can be secured in the non-screw portion.

JP 2006-022371 A

  However, in the plating method using the lifting device as described in Patent Document 1, it is necessary to provide a lifting device for lifting the holder for each holder, so that the above-described plating method is realized. There was a problem that the configuration of the plating apparatus was complicated. In addition, the plating method using the liquid level adjustment device requires a new adjustment time for adjusting the liquid level height, so that the plating time becomes longer, and the configuration of the plating device is complicated as described above. There was a problem of becoming.

  The present invention has been made in order to solve the above problems, and provides a plating method capable of easily changing the thickness of the plating film according to the site of the bag-like workpiece while reducing the size of the plating apparatus. The purpose is to provide.

Means for Solving the Problems and Effects of the Invention

In order to solve the above-described problems, the plating method of the present invention is to sequentially move a plurality of bag-like works to each liquid tank arranged corresponding to a plurality of processing steps necessary for plating, and immerse them in each liquid tank. In the plating method in which the plating process proceeds, the liquid tank is disposed above the liquid tank so as to extend laterally with respect to the traveling direction of the bag-like workpiece, and is movable from one liquid tank to the other and extends in the horizontal direction. A holding portion that is provided so as to be rotatable around a predetermined axis and that holds the bag-shaped workpiece so that the bag-shaped workpiece is aligned in a lateral direction at a tip portion extending outward with respect to the axis. Using a work holder having, using a moving means for moving the work holder from one of the liquid tanks toward the other, and a rotating means for rotating the work holder about the axis,
A first step of rotating the work holder downward about the axis by rotating means and immersing the entire bag-like work held by the holding part of the work holder in a plating solution in a liquid bath set at the first liquid level; The work holder is rotated upward about the axis by the rotating means, and the bag-like work held by the holding part of the work holder is lifted on the first liquid level, and is lower than the first liquid level by the moving means. A part of the bag-like workpiece held by the holding portion of the workpiece holder by rotating the workpiece holder downward around the axis by the second step of moving toward the liquid tank set at the second liquid level and the rotating means. And a third step of immersing in a plating solution in a liquid bath set at the second liquid level.

  In the plating method of the present invention, a work holder having a holding part for holding the bag-like workpiece is used so that the bag-like workpiece is aligned in the horizontal direction. Further, a moving means for moving the work holder from one liquid tank to another liquid tank and a rotating means for rotating the work holder about the axis are used. In the first step, the work holder is rotated downward about the axis by the rotating means, and the entire bag-shaped work held by the holding part of the work holder is set to the first liquid level. Immerse in. In the second step, the work holder is rotated upward about the axis by the rotating means, and the bag-like work held by the holding portion of the work holder is lifted on the first liquid level, and the first liquid level is obtained by the moving means. It moves toward the liquid tank set to the 2nd liquid level low compared with. In the third step, the work holder is rotated downward about the axis by the rotating means, and a part of the bag-like work held by the holding part of the work holder is turned into the plating solution in the liquid tank set at the second liquid level. Immerse.

  In the first and third steps in which the bag-like workpiece is immersed in the plating solution, the rotating means rotates the workpiece holder downward about the axis. For this reason, the raising / lowering apparatus for raising / lowering the holding | maintenance part of a work holder becomes unnecessary, and it is possible to simply comprise the plating apparatus for implement | achieving the above-mentioned plating method. Further, the work holder rotates about its axis, and the rotation operation itself is the same regardless of the type of liquid bath to be immersed. For this reason, the thickness of the plating film according to the site | part of a bag-shaped workpiece | work only by setting the liquid level of the plating solution of the liquid tank used by the 1st and 3rd process to a different liquid level height beforehand. Can be easily changed.

  In carrying out the present invention, the type of the plating solution in the liquid tank set at the first liquid level and the type of the plating solution in the liquid tank set at the second liquid level may be different. According to this, according to the site | part of a bag-like workpiece | work, functions, such as waterproofness and glossiness, can be provided appropriately, for example.

  Hereinafter, an embodiment of the present invention will be described with reference to the drawings. FIG. 1 shows a cap nut 1 as a bag-like workpiece used in this embodiment. The cap nut 1 includes a main body 2 having a female screw portion 4 and a cap portion 3 that closes the opening of the main body 2 on the side opposite to the screwing side of the screw member. A bag-like space (closed space) 5 is formed by a place (a portion into which a tip portion of a male screw member such as a bolt enters). The main body 2 has a hexagonal large-diameter portion 2a with which the work tool is engaged, a cylindrical small-diameter portion 2b, and a flange portion 2c protruding to the side between the large-diameter portion 2a and the small-diameter portion 2b. An example of such a cap nut 1 is a hub nut. Such a cap nut 1 is immersed in a predetermined bath for cleaning, rust prevention, plating, etc. after forging, further threading by rolling or cutting, welding of the cap 3 and heat treatment as necessary. Is done.

  The cap nut 1 described above is supplied to, for example, an electrolytic plating line 100 as shown in FIG. In this electrolytic plating line 100, a plurality of liquid tanks 101 are arranged in an oval shape (a competition track shape) corresponding to a plurality of processing steps necessary for plating. In the plating apparatus used in the present invention, a plurality of cap nuts 1 are sequentially moved to each liquid tank 101 along an elliptical conveying path 110 in the electroplating line 100, and are immersed in each liquid tank 101 for plating treatment. (For example, nickel chrome plating or the like). As shown in FIG. 3 as a representative of the arbitrary liquid tank 101, the work holder 10 and the work holder 10 are moved from one liquid tank 101 to another liquid tank 101. And a rotating device 30 that rotates the work holder 10 about the axis L1.

  The work holder 10 is disposed above the liquid tank 101 and has a first support member 11 having an axis L1 extending in the lateral direction (left-right direction in FIG. 3) with respect to the traveling direction (surface direction in FIG. 3). And a frame-like second support member 12 connected to the inner end of the first support member 11.

  A roller 13 having a roller axis concentric with the axis L <b> 1 is provided at the outer end of the first support member 11, and the first support member 11 is movably supported by the first roller receiving frame 102 via the roller 13. Yes. The first roller receiving frame 102 is arranged at a position higher than the liquid level in the liquid tank 101 and is arranged in an oval shape between the liquid tanks 101 in a plan view. Moreover, the inner side edge part of the 1st support member 11 is formed in the cross-sectional circle shape, and the inner side edge part is penetrated by the support hole 12a of the 2nd support member 12 formed concentrically with the axis line L1. The first support member 11 is supported by the second support member 12 so as to be rotatable around the axis L1.

  A plurality of (for example, five) support blocks 14 are fixed to the first support member 11 at equal intervals in the longitudinal direction (lateral direction). 4A to 4C, a pair of work holders 40 and 40 are attached to each support block 14 so as to extend outward at right angles to the axis L1. Each work holder 40 (holding portion) includes a center pin 41 formed of a conductor such as metal, and a pair of left and right pins 42 and 42 arranged symmetrically with respect to the center pin. , 42 is attached to the cap nut 1.

  The left and right pins 42 and 42 can be elastically deformed to such an extent that the interval between them is changed, and each distal end portion is bent outward. When the cap nut 1 is mounted, a force is applied to the left and right pins 42, 42 to narrow the distance between them, and the cap nut 1 is inserted into the female thread portion 4 of the cap nut 10 to loosen the force. Thereby, the force which elastically deforms outward by the left and right pins 42, 42 is applied to the inner surface of the cap nut 1, and the tip portion is caught, so that the cap nut 1 cannot be easily detached from the left and right pins 42, 42. When the cap nut 1 is attached to the tip of the left and right pins 42, 42 in each workpiece holder 40, the cap nut 1 is aligned with the longitudinal direction of the first support member 11.

  Returning to FIG. 3, the second support member 12 is slidably supported on the support frame 103 by an engagement piece 12 b protruding inward. In addition, the support frame 103 is arrange | positioned above the inner peripheral wall side in each liquid tank 101, and is arrange | positioned by the ellipse shape by planar view. An engaging protrusion 12 c that protrudes upward is formed at the upper end of the second support member 12. The second support member 12 is moved along the support frame 103 by the moving device 20 via the engagement protrusion 12c.

  The moving device 20 (moving means) moves the first support member 11 and the second support member 12 from one liquid tank 101 to another liquid tank 101, as schematically shown in FIG. Along the conveyance path 110, the linear moving frames 21 and 22 and the arc-shaped moving frames 23 and 24 are divided. The moving frames 21 and 22 are connected to a common air cylinder 26 (reciprocating device) via a connecting member 25. On the other hand, the moving frames 23 and 24 are connected to dedicated air cylinders 27 and 28 (reciprocating devices), respectively.

  The moving frame 21 moves forward in the right direction in FIG. 5 according to the rotation of the connecting member 25 around the rotation center O1 when the air cylinder 26 is extended. On the contrary, the moving frame 22 moves in the left direction in FIG. On the other hand, the moving frame 21 moves backward in the left direction in FIG. 5 according to the rotation of the connecting member 25 around the rotation center O1 when the air cylinder 26 is contracted. On the contrary, the moving frame 22 moves backward in the right direction in FIG.

  Further, the moving frame 23 rotates clockwise in FIG. 5 around the rotation center O2 when the air cylinder 27 is extended (forward movement). The moving frame 24 rotates clockwise in FIG. 5 around the rotation center O3 when the air cylinder 28 is extended (forward movement). On the other hand, the moving frame 23 rotates counterclockwise in FIG. 5 around the rotation center O2 when the air cylinder 27 is contracted (reverse movement). When the air cylinder 28 contracts, the moving frame 24 rotates counterclockwise in FIG. 5 around the rotation center O3 (reverse movement).

  3 and 6 are representatively shown on the bottom wall of the moving frames 21 to 24, and the moving frame 23 is representatively shown in FIG. A claw 29 is provided. Each engaging claw 29 is attached to the moving frames 21 to 24 via a pin 29a and a bracket 29b, and is rotatable up and down around the pin 29a.

  Thus, the moving frames 21 to 24 move the second support member 12 by the engagement of the engagement claws 29 and the engagement protrusions 12c of the second support member 12 when the air cylinders 26 to 28 are extended. Let On the other hand, when the air cylinders 26 to 28 are contracted, the moving frames 21 to 24 are disengaged between the engaging claws 29 and the engaging protrusions 12c of the second support member 12 (in the two-dot chain line in FIG. 6). The second support member 12 is in a stopped state. And the 2nd support member 12 moves intermittently by the expansion / contraction operation | movement of the air cylinders 26-28 being repeated at a predetermined timing.

  Returning to FIG. 3, an L-shaped lever 15 is integrally connected to the inner end of the first support member 11, and a roller 16 is provided at the tip of the lever 15. The roller axis L2 of the roller 16 is arranged (offset arrangement) in parallel with the axis L1 of the first support member 11. The lever 15 is rotationally driven around the axis L <b> 1 by the rotating device 30 via the roller 16.

  The rotating device 30 (rotating means) includes a second roller receiving frame 31 having a track portion 31a for the roller 16, and an air cylinder 32 (elevating device) for moving the second roller receiving frame 31 up and down. . In the contracted state of the air cylinder 32, the second roller receiving frame 31 is at the lower limit position indicated by a two-dot chain line in FIG. In this state, the work holder 40 extends vertically downward, and the cap nut 1 attached to the work holder 40 is immersed in the liquid in the liquid tank 101.

  During the extension operation of the air cylinder 32, the lever 15 rotates counterclockwise in FIG. 6 around the axis L <b> 1 according to the rising of the second roller receiving frame 31, and the work holder 40 is rotated along with the rotation of the lever 15. Move up. In the extended state of the air cylinder 32, the second roller receiving frame 31 is at the upper limit position indicated by a solid line in FIG. In this state, the work holder 40 extends obliquely upward in the front direction with the traveling direction of the work holder 10 as the front side, and is positioned above the partition wall of the liquid tank 101. The rotation angle of the workpiece holder 40 is set to a predetermined angle from 90 degrees to 180 degrees.

  Next, an outline of each process of the electrolytic plating line 100 including the plating apparatus configured as described above will be described with reference to FIG. First, the untreated cap nut 1 is mounted on the work holder 40 at the load station. Prior to the electrolytic plating process, a pre-process such as degreasing is performed. The main ones are a degreasing process in the degreasing tank 101a, an electrolysis (scale removal) process in the cathodic acid electrolysis (alkali electric field) tank 101b, an electrolytic degreasing (activation) process in the anodic electrolytic degreasing tank 101d, and a neutralization in the neutralization tank 101h. It is a process. Moreover, it wash | cleans with the water-washing tank 101c, 101e, 101g, 101i. When the pre-process is completed, a plating process is subsequently performed. The plating step is performed in a semi-gloss Ni tank 101j, a Tri Ni tank 101k, a gloss Ni tank 101m, a Joule Ni tank 101n, and a chromium tank 101q. Moreover, it wash | cleans with the water-washing tanks 101p and 101r and the hot-water-washing tank 101s, and dries with the drying tank 101t. Thereafter, the cap nut 1 after the plating process is removed from the work holder 40 at the unload station. In addition, the workpiece holder 40 is degreased by the jig degreasing layer 101u and washed in the water washing tank 101v.

  In the plating tank such as the semi-gloss Ni tank 101j, the plating solution M is stored, and the first positive electrode 104 and the second positive electrode 105 are provided (see FIG. 3). The first positive electrode 104 and the second positive electrode 105 are placed with the tip of the work holder 40 placed in the plating solution M and the cap nut 1 positioned between the first positive electrode 104 and the second positive electrode 105. By applying a positive voltage to the center pin 41 and the left and right pins 442 and 42 of the work holder 40 electrically connected to the cap nut 1, a negative voltage is applied to the outer and inner surfaces of the cap nut 1. An electroplated layer can be formed.

  Here, for example, as shown in FIG. 8, the semi-gloss Ni tank 101j is set to a plating tank 101j1 set to the first liquid level S1 and a second liquid level S2 lower than the first liquid level S1. It can be composed of two or more liquid tanks with the plating tank 101j2. The first liquid level S1 of the cap nut 1 attached to the work holder 40 when the support member 11 rotates downward about the axis L1 and the work holder 40 extends vertically downward. The liquid level is set such that the entire body, that is, the main body 2 and the cap 3 are immersed in the plating solution M. On the other hand, the second liquid level S2 is attached to the work holder 40 when the support member 11 rotates downward about the axis L1 and the work holder 40 extends vertically downward. The liquid level is set such that a part of the cap nut 1, that is, the large diameter portion 2 a, the flange portion 2 c and the cap 3 are immersed in the plating solution M.

  Next, the operation of the work holder 10 will be described. The work holder 10 sequentially moves from one liquid tank 101 to another liquid tank 101 along the conveyance path 110. When moving the work holder 10, as shown in FIG. 6, the air cylinder 32 is extended, and the second roller receiving frame 31 is positioned at the upper limit position. In a state where the workpiece holder 40 extends obliquely upward in the front side, the air cylinders 26 to 28 are extended, and the moving frames 21 to 24 are moved forward. Due to the engagement of the engaging claws 29 and the engaging protrusions 12c of the second support member 12, the work holder 10 moves over the partition wall W of the liquid tank 101 as the moving frames 21 to 24 move forward. Move (see FIG. 8).

  Here, for example, a case where the work holder 10 reaches the semi-gloss Ni tank 101j1 will be described with reference to FIG. In this case, the plating apparatus stops the extension operation of the air cylinders 26 to 28 and contracts the air cylinder 32 while the work holder 10 is stopped. As the second roller receiving frame 31 is lowered, the lever 15 and the first support member 11 rotate downward about the axis L1. When the second roller receiving frame 31 reaches the lower limit position, the workpiece holder 40 extends vertically downward, and the entire cap nut 1 attached to the workpiece holder 40 is a plating solution M in the semi-gloss Ni tank 101j1. It is immersed in (first step).

  When the work holder 10 is moved to the next semi-gloss Ni tank 101j2, the air cylinders 26 to 28 are contracted and the air cylinder 32 is extended. The work holder 10 can be moved again by the engagement between the engagement claw 29 and the engagement protrusion 12c of the second support member 12 just behind. As the second roller receiving frame 31 is raised, the lever 15 and the first support member 11 rotate upward about the axis L1. When the second roller receiving frame 31 reaches the upper limit position, the work holder 40 extends obliquely upward in the front direction, and the cap nut 1 attached to the work holder 40 is moved to the first liquid surface of the semi-gloss Ni tank 101j1. The work holder 10 moves toward the next semi-gloss Ni tank 101j2 by moving the moving frames 21 to 24 forward in a state where it is lifted onto S1 (second step).

  When the work holder 10 reaches the semi-gloss Ni tank 101j2, the extension operation of the air cylinders 26 to 28 is stopped as in the first step, and the air cylinder 32 is contracted while the work holder 10 is stopped. The lever 15 and the first support member 11 rotate downward about the axis L1 so that the workpiece holder 40 extends vertically downward, and a part of the cap nut 1 attached to the workpiece holder 40 is semi-glossy. It is immersed in the plating solution M of the Ni tank 101j2 (third step).

  Through the first step, a plating film P is formed on the entire cap nut 1 by the plating solution M in the semi-gloss Ni tank 101j1 as schematically shown in FIG. Thereafter, through the third step, a plating film P is formed on a part of the cap nut 1 by the plating solution M in the semi-gloss Ni tank 101j2 so as to overlap the surface of the plating film P. The plating tanks 101k, 101m, 101n, and 101q other than the semi-gloss Ni tank 101j are also configured in the same manner as the semi-gloss Ni tank 101j, and the plating film formed on a part of the cap nut 1 is thickened. You can do it.

  As is apparent from the above description, in this embodiment, in the first and third steps in which the cap nut 1 is immersed in the plating solution M of the liquid tank 101 such as the semi-gloss Ni tank 101j1, 101j2, the rotating device 30 rotates the work holder 10 downward about the axis L1. Thereby, the raising / lowering device for raising / lowering the workpiece holder 40 of the workpiece holder 10 becomes unnecessary, and the plating apparatus for realizing the plating method including the first step, the second step, and the third step described above is simplified. It is possible to configure. Further, the work holder 10 rotates about the axis L1, and the rotation operation itself is the same regardless of the type of the liquid bath 101 to be immersed. As a result, the liquid level of the plating solution M in the liquid bath 101 such as the semi-gloss Ni baths 101j1 and 101j2 used in the first and third steps is set to different liquid level heights S1 and S2 in advance. Thus, the thickness of the plating film can be easily changed according to the part of the cap nut 1.

(Modified embodiment)
In the said embodiment, although the plating method in case the plating films P and P are the same plating solution M was demonstrated, in addition to this or instead, as shown, for example in FIG. After immersing in the plating solution M1 of the Ni tank 101j, only a part of the cap nut 1 is plated with different types of plating liquids M2, M3, such as the Tri Ni tank 101k, the gloss Ni tank 101m, the Joule Ni tank 101n, the chromium tank 101q, etc. You may make it soak in order. In FIG. 10, only the semi-gloss Ni tank 101j, the tri Ni tank 101k, and the gloss Ni tank 101m are shown, and the Joule Ni tank 101n and the chromium tank 101q are omitted.

  In this case, the liquid level of the plating solution M1 is set to the first liquid level S1, and the liquid level of the plating solutions M2, M3, etc. is set to the second liquid level S2. Through the first step, a plating film P1 is formed on the entire cap nut 1 with the plating solution M1 in the semi-gloss Ni tank 101j1, as schematically shown in FIG. Thereafter, through the third step, a part of the cap nut 1 is formed with a plating film P2 formed by the plating solution M2 of the Tri Ni tank 101k on the surface of the plating film P1, and further on the surface of the plating film P2. The plating film P3 by the plating solution M3 in the glossy Ni tank 101m is formed again.

  According to this modified embodiment, the waterproof and glossy functions of only a part of the cap nut 1 can be improved satisfactorily while ensuring the waterproof property of the cap nut 1 as a whole.

  In the above-described embodiment and its modified embodiments, the track portion 31a of the second roller receiving frame 31 is formed in a continuous oval shape, and all the workpieces are moved according to the raising and lowering of the roller receiving frame 31 by the air cylinder 32. The holder 10 is configured to rotate around each axis L1 all at once. However, the present invention is not limited to this. For example, as shown in FIG. 12, the raceway portion 31a of the roller receiving frame 31 is divided and formed, and the raceway portion 31a is formed so that a gap D of a predetermined interval is formed on a predetermined plating tank. The roller receiving frame 31 may be provided with a detachable bridging member 32 that allows the roller 16 to pass between the track portions 31a. According to this, by removing the bridging member 32, only the work holder 10 having the roller 16 that has reached the gap D rotates around the axis L1 and rotates downward. The first step or the third step can be applied only to the case.

  Moreover, in the said embodiment etc., although 2 types of liquid level height was set, according to the form of a bag-shaped workpiece | work, you may make it set 3 or more types of liquid level height.

  Moreover, in the said embodiment etc., although the air cylinder was used as a component of the moving apparatus 20, it may replace with this and may use a chain, a motor, etc., for example. Moreover, although the air cylinder was used as a component of the rotating device 30, it may replace with this and may use a motor etc., for example.

  Moreover, in the said embodiment etc., in the state where the cap nut 1 with which the workpiece holder 40 was mounted | worn was immersed in the liquid of each liquid tank 101, it comprised so that the workpiece holder 10 might be stopped by the moving apparatus 30, The workpiece holder 10 may be moved up to a position where the workpiece holder 40 does not interfere with the partition wall W of the liquid tank 101 when moving upward.

  Moreover, it is good also as a structure which rotates the rotating device 30 to the position which extends the workpiece | work holder 40 back diagonally upward.

(A) is a front view of a cap nut. (B) is a longitudinal sectional view of (a). The top view of the liquid tank in the electrolytic plating line used with the plating method of this invention. AA sectional drawing of FIG. FIG. 4 is a partially enlarged front view of FIG. 3. The side view of FIG. 4A. The top view of FIG. 4A. The schematic diagram of a moving apparatus. B arrow view of FIG. FIG. 6 is a partial perspective view of FIG. 5. Explanatory drawing which shows a 1st process, a 2nd process, and a 3rd process. FIG. 9 is a schematic diagram of a cap nut that has been plated by the process of FIG. 8. Explanatory drawing which shows the 1st process, 2nd process, and 3rd process concerning deformation | transformation embodiment. The schematic diagram of the cap nut by which the plating process was performed by the process of FIG. The side view which shows the modification of a roller receiving frame.

Explanation of symbols

1 Cap nut (bag-shaped workpiece)
DESCRIPTION OF SYMBOLS 10 Work holder 11 1st support member 12 2nd support member 12c Engagement protrusion 13 Roller 14 Support block 15 Lever 16 Roller L1 Axis 20 Moving device (moving means)
21-24 Moving frame 25 Connecting member 26-28 Air cylinder 29 Engaging claw 30 Rotating device (rotating means)
31 Second roller receiving frame 31a Track portion 32 Air cylinder 40 Work holder (holding portion)
41 Center pin 42 Left and right pins 100 Electrolytic plating line 101 Liquid tank 102 First roller receiving frame 110 Conveyance path M, M1, M2, M3 Plating liquid P, P1, P2, P3 Plating film S1 First liquid surface S2 Second liquid surface

Claims (2)

In a plating method in which a plurality of bag-like workpieces are sequentially moved to each liquid tank arranged corresponding to a plurality of processing steps necessary for plating and immersed in each liquid tank to proceed with the plating process,
It is arranged above the liquid tank so as to extend laterally with respect to the traveling direction of the bag-like workpiece, is movable from one liquid tank to the other, and rotates about a predetermined axis extending in the horizontal direction. A work holder having a holding portion that is provided so as to hold the bag-shaped workpiece so that the bag-shaped workpiece is arranged in a lateral direction at a tip portion that extends outward with respect to the axis. Using a moving means for moving the work holder from one of the liquid tanks toward the other, and a rotating means for rotating the work holder around the axis,
The work holder is rotated downward about the axis by the rotating means, and the entire bag-like work held by the holding portion of the work holder is immersed in a plating solution in a liquid tank set to the first liquid level. The first step;
The work holder is rotated upward about the axis by the rotating means, and the bag-like work held by the holding portion of the work holder is lifted onto the first liquid level, and the first moving means by the moving means. A second step of moving toward a liquid tank set to a second liquid level lower than the liquid level;
The work holder is rotated downward about the axis by the rotating means, and a part of the bag-like work held by the holding part of the work holder is used as a plating solution for the liquid tank set at the second liquid level. And a third step of dipping.   The plating method according to claim 1, wherein the type of the plating solution in the liquid tank set on the first liquid level and the type of the plating solution in the liquid tank set on the second liquid level are different.

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