JP5148855B2 - Flat circuit board and Gunn diode oscillator using the same - Google Patents

Flat circuit board and Gunn diode oscillator using the same Download PDF

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JP5148855B2
JP5148855B2 JP2006280889A JP2006280889A JP5148855B2 JP 5148855 B2 JP5148855 B2 JP 5148855B2 JP 2006280889 A JP2006280889 A JP 2006280889A JP 2006280889 A JP2006280889 A JP 2006280889A JP 5148855 B2 JP5148855 B2 JP 5148855B2
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circuit board
ground electrode
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gunn diode
transmission line
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隆啓 杉山
清 川口
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New Japan Radio Co Ltd
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本発明は、平板回路基板およびそれを用いたガンダイオード発振器に関し、特に発振周波数のばらつきを低減させることができる高周波発振器に好適な平板回路基板およびそれを用いたガンダイオード発振器に関する。   The present invention relates to a flat circuit board and a Gunn diode oscillator using the same, and more particularly to a flat circuit board suitable for a high frequency oscillator capable of reducing variation in oscillation frequency and a Gunn diode oscillator using the same.

マイクロ波帯やミリ波帯といった高周波発振器では、高電力半導体装置を実装する平板回路基板は、熱伝導性の優れたアルミナ焼結体や窒化アルミニウム焼結体等からなる平板基板上に、マイクロストリップ線路によって信号伝送線路や接地電極等が形成されている。   In a high-frequency oscillator such as a microwave band or a millimeter wave band, a flat circuit board on which a high-power semiconductor device is mounted is formed on a flat board made of an alumina sintered body, an aluminum nitride sintered body, or the like having excellent thermal conductivity. A signal transmission line, a ground electrode, and the like are formed by the line.

この種の高周波発振器の一例である、ガンダイオード発振器について説明する。図3はガンダイオード発振器の一部断面図である。ガンダイオード1表面には導電性の突起電極で構成されたカソード電極3とアノード電極4が形成されている。ガンダイオード1を搭載する平板回路基板2は、熱伝導性に優れた窒化アルミニウム等からなる平板基板5の表面に、高周波信号を伝送する信号伝送線路6と、表面接地電極7が形成され、裏面には裏面接地電極8が形成されている。図3に示すように、カソード電極3は信号伝送線路6と、アノード電極4は表面接地電極7と接続している。また、表面接地電極7と裏面接地電極8は平板基板5を貫通し、導電性物質を充填したビア電極9を介して接続している。   A Gunn diode oscillator, which is an example of this type of high-frequency oscillator, will be described. FIG. 3 is a partial cross-sectional view of the Gunn diode oscillator. On the surface of the Gunn diode 1, there are formed a cathode electrode 3 and an anode electrode 4 made of conductive protruding electrodes. A flat circuit board 2 on which the Gunn diode 1 is mounted has a signal transmission line 6 for transmitting a high-frequency signal and a surface ground electrode 7 formed on the surface of a flat board 5 made of aluminum nitride or the like having excellent thermal conductivity, and the back surface. A back ground electrode 8 is formed on the surface. As shown in FIG. 3, the cathode electrode 3 is connected to the signal transmission line 6, and the anode electrode 4 is connected to the surface ground electrode 7. Further, the front surface ground electrode 7 and the back surface ground electrode 8 penetrate the flat substrate 5 and are connected via via electrodes 9 filled with a conductive substance.

このようなガンダイオード発振器では、2つのビア電極9の間隔10が変化することで発振周波数がばらつくことが知られている。この発振周波数のばらつきを低減するためには、ビア電極9を常に所定の位置に形成する必要がある。その方法として本願出願人は、焼結後の平板基板にマイクロブラスト加工方法により凹部を形成し、導電性物質を充填した後、所望の厚さとなるまで薄層化することによりビア電極を形成する方法を提案している。   In such a Gunn diode oscillator, it is known that the oscillation frequency varies when the interval 10 between the two via electrodes 9 changes. In order to reduce the variation in the oscillation frequency, it is necessary to always form the via electrode 9 at a predetermined position. As the method, the applicant of the present invention forms a via electrode by forming a concave portion on a sintered flat substrate by a microblasting method, filling a conductive material, and then thinning the plate substrate to a desired thickness. Proposed method.

図4は、本願出願人が提案した平板基板の製造方法の説明図である。まず、グリーンシートをN2雰囲気中で1800℃、9時間焼結し、厚さ300μm程度の平板基板11を形成する。次に平板基板11上にマスク材となる厚み100μmの感光性のドライフィルム12をラミネートする(図4a)。通常のフォトリソグラフ法に従い、ビア電極形成予定領域の平板基板11表面の一部を開口するようにドライフィルム12をパターニングする(図4b)。続いて、マイクロブラスト加工法により、微細砥粒13をノズルから高速で噴射させ、平板基板11の表面に凹部14を形成する(図4c)。その後、ドライフィルム12を除去することにより表面に凹部14が形成された平板基板11が得られる(図4d)。 FIG. 4 is an explanatory diagram of a method for manufacturing a flat substrate proposed by the applicant of the present application. First, the green sheet is sintered in an N 2 atmosphere at 1800 ° C. for 9 hours to form a flat substrate 11 having a thickness of about 300 μm. Next, a photosensitive dry film 12 having a thickness of 100 μm serving as a mask material is laminated on the flat substrate 11 (FIG. 4a). In accordance with a normal photolithography method, the dry film 12 is patterned so as to open a part of the surface of the flat substrate 11 in the via electrode formation scheduled region (FIG. 4b). Subsequently, the fine abrasive grains 13 are sprayed from the nozzles at a high speed by a microblasting method to form the recesses 14 on the surface of the flat substrate 11 (FIG. 4c). Thereafter, by removing the dry film 12, a flat substrate 11 having a recess 14 formed on the surface is obtained (FIG. 4d).

次に、平板基板の11表面に電子ビーム蒸着装置等を用いて金属薄膜15を形成し(図4e)、通常のフォトリソグラフ法により凹部14が形成された領域を開口するようにフォトレジスト16をパターニングする(図4f)。続いて、メッキ法により凹部14内に露出する金属薄膜15上に導電性金属、例えば金からなるメッキ層17を形成し、凹部14の内部をメッキ層17で充填する(図4g)。フォトレジスト16を除去した後、平板基板11の表面を研磨し、フォトレジスト16上に広がったメッキ層17と平板基板11上に形成した金属薄膜15を除去し、平板基板11の表面とほぼ同一な表面を有するメッキ層17(金属薄膜15の1部を含む)を露出させる。一方、平板基板11の裏面も研磨し、メッキ層17を露出させる。この平板基板11の表面および裏面の研磨により、ビア電極9を備えた平板基板5を形成することができる(図4h)。このような製造方法によれば、凹部14は、グリーンシートを焼結した後にビア電極形成予定領域に形成するため、焼結に伴い生じる位置ずれを少なくすることができる構成となっている(特許文献1)。   Next, a metal thin film 15 is formed on the surface of the flat substrate 11 using an electron beam vapor deposition apparatus or the like (FIG. 4e), and a photoresist 16 is formed so as to open a region where the recess 14 is formed by a normal photolithography method. Patterning is performed (FIG. 4f). Subsequently, a plating layer 17 made of a conductive metal such as gold is formed on the metal thin film 15 exposed in the recess 14 by plating, and the interior of the recess 14 is filled with the plating layer 17 (FIG. 4g). After removing the photoresist 16, the surface of the flat substrate 11 is polished, and the plating layer 17 spreading on the photoresist 16 and the metal thin film 15 formed on the flat substrate 11 are removed, so that it is almost the same as the surface of the flat substrate 11. The plating layer 17 (including a part of the metal thin film 15) having a rough surface is exposed. On the other hand, the back surface of the flat substrate 11 is also polished to expose the plating layer 17. By polishing the front surface and the back surface of the flat substrate 11, the flat substrate 5 including the via electrode 9 can be formed (FIG. 4h). According to such a manufacturing method, since the concave portion 14 is formed in the via electrode formation scheduled region after the green sheet is sintered, the positional deviation caused by the sintering can be reduced (patent). Reference 1).

その後、通常の方法に従い、平板基板5の表面に信号伝送線路、表面接地用電極等をパターン形成し、裏面に裏面接地電極を形成することにより、平板回路基板を形成することができる。また、平板回路基板上にガンダイオードを実装することにより、ガンダイオード発振器を形成することができる。
特開2005−259943号公報
Thereafter, in accordance with a normal method, a flat circuit board can be formed by patterning a signal transmission line, a surface grounding electrode and the like on the surface of the flat substrate 5 and forming a back ground electrode on the back surface. Also, a Gunn diode oscillator can be formed by mounting a Gunn diode on a flat circuit board.
JP 2005-259943 A

本願出願人が先に提案した平板基板の製造方法では、焼結後の平板基板に凹部を形成するため、焼結によるグリーンシートの収縮に伴うビア電極の間隔のばらつきは少なくなった。しかしながら、マイクロブラスト法による加工は砥粒の大きさ、砥粒噴射時の圧力のばらつき等により、凹部の大きさが±30μm程度ばらつき、さらにビア電極の断面形状が台形状になったり、すり鉢状になったりしてしまう。その結果、依然としてビア電極の間隔のばらつきが残り、ガンダイオード発振器の発振周波数のばらつきを無くすことはできないという問題点があった。   In the method for manufacturing a flat substrate previously proposed by the applicant of the present application, the concave portions are formed in the flat substrate after sintering, so that the variation in the gap between the via electrodes due to the shrinkage of the green sheet due to the sintering is reduced. However, the processing by the microblast method has a variation in the size of the recess of about ± 30 μm due to the size of the abrasive grains and the pressure variation during the grain injection, and the via electrode has a trapezoidal cross-sectional shape or a mortar shape. It will become. As a result, there is still a problem that the gap between the via electrodes still remains and the fluctuation of the oscillation frequency of the Gunn diode oscillator cannot be eliminated.

本発明は上記問題点を解消し、ガンダイオードを平板回路基板に実装した場合、発振周波数のばらつきがない平板回路基板およびそれを用いたガンダイオード発振器を提供することを目的とする。   An object of the present invention is to solve the above problems and to provide a flat circuit board having no variation in oscillation frequency when a Gunn diode is mounted on a flat circuit board, and a Gunn diode oscillator using the same.

上記目的を達成するため、本願請求項1に係る平板回路基板は、表面に第1の信号伝送線路と表面接地電極を、裏面に裏面接地電極を、側面に前記表面接地電極と前記裏面接地電極とを接続する導電性膜を備え、表面にガンダイオードを実装する第1の平板回路基板と、表面に第2の信号伝送線路を、裏面に裏面接地電極を備えた1または2以上の第2の平板回路基板と、前記第1の信号伝送線路と前記第2の信号伝送線路とを接続する接続手段とを備えたことを特徴とする。   In order to achieve the above object, a flat circuit board according to claim 1 of the present application includes a first signal transmission line and a surface ground electrode on the front surface, a back surface ground electrode on the back surface, and the surface ground electrode and the back surface ground electrode on the side surface. 1 or 2 or more 2nd which equipped the 1st flat circuit board which mounts a Gunn diode on the surface, the 2nd signal transmission line on the surface, and the back ground electrode on the back surface And a connecting means for connecting the first signal transmission line and the second signal transmission line.

本願請求項2に係る発明のガンダイオード発振器は、表面に第1の信号伝送線路と表面接地電極を、裏面に裏面接地電極を、側面に前記表面接地電極と前記裏面接地電極を接続する導電性膜を備え、前記第1の信号伝送線路にガンダイオードのカソード電極を接続しかつ前記表面接地電極に前記ガンダイオードのアノード電極を接続した、あるいは前記第1の信号伝送線路に前記ガンダイオードのアノード電極を接続しかつ前記表面接地電極に前記ガンダイオードのカソード電極を接続した第1の平板回路基板と、表面に第2の信号伝送線路を、裏面に裏面接地電極を備えた1または2以上の第2の平板回路基板と、前記第1の信号伝送線路と前記第2の信号伝送線路とを接続する接続手段とを備えたことを特徴とする。



In the Gunn diode oscillator according to the second aspect of the present invention, the first signal transmission line and the surface ground electrode are connected to the front surface, the back surface ground electrode is connected to the back surface, and the surface ground electrode and the back surface ground electrode are connected to the side surface. A cathode of a Gunn diode is connected to the first signal transmission line and an anode electrode of the Gunn diode is connected to the surface ground electrode, or an anode of the Gunn diode is connected to the first signal transmission line. 1 or 2 or more provided with the 1st flat circuit board which connected the electrode and connected the cathode electrode of the said Gunn diode to the said surface ground electrode, the 2nd signal transmission line on the surface, and the back surface ground electrode on the back surface It is characterized by comprising a second flat circuit board and connection means for connecting the first signal transmission line and the second signal transmission line.



本発明の平板回路基板は、ガンダイオードを実装する平板回路基板の表面接地電極と裏面接地電極とを、ビア電極を用いず、平板回路基板の側面に設けた導電性膜によって導通させる構造としている。平板回路基板の対向する側面間の寸法は、通常の切断方法によって精度良く所望の寸法に加工することができるため、従来のビア電極の間隔に相当する間隔のばらつきが小さくなる。   The flat circuit board of the present invention has a structure in which the front surface ground electrode and the back surface ground electrode of the flat circuit board on which the Gunn diode is mounted are made conductive by a conductive film provided on the side surface of the flat circuit board without using via electrodes. . Since the dimension between the opposing side surfaces of the flat circuit board can be accurately processed to a desired dimension by an ordinary cutting method, the variation in the distance corresponding to the distance between the conventional via electrodes is reduced.

本発明の平板回路基板にガンダイオードを実装してガンダイオード発振器を形成する場合、発振周波数のばらつきの小さいガンダイオード発振器を形成することができる。   When a Gunn diode is mounted on the flat circuit board of the present invention to form a Gunn diode oscillator, it is possible to form a Gunn diode oscillator with small variations in oscillation frequency.

本発明では、平板回路基板が、ガンダイオードを実装する第1の平板回路基板とバイアス回路や共振回路等を形成する第2の平板回路基板とからなり、それぞれ別の材料で形成することができる。その結果、特性向上のために放熱性の優れた平板基板を用いることが望ましい第1の平板回路基板と、通常のセラミック基板で良い第2の平板回路基板とを組み合わせて構成することができ、比較的高価な第1の平板回路基板の使用量が少なくなり、安価に平板回路基板およびガンダイオード発振器を形成できるという利点がある。   In the present invention, the flat circuit board includes a first flat circuit board on which the Gunn diode is mounted and a second flat circuit board on which a bias circuit, a resonance circuit, and the like are formed, and can be formed of different materials. . As a result, it is possible to configure a combination of a first flat circuit board, which desirably uses a flat board with excellent heat dissipation for improving characteristics, and a second flat circuit board, which may be a normal ceramic substrate, The amount of use of the relatively expensive first flat circuit board is reduced, and there is an advantage that the flat circuit board and the Gunn diode oscillator can be formed at low cost.

本発明の平板回路基板は、ガンダイオードを実装する平板回路基板の側面に、表面接地電極と裏面接地電極を接続する導電性膜を形成することによって、側面の間隔(従来のビア電極の間隔に相当)のばらつきを小さくしている。その結果、本発明の平板回路基板にガンダイオードを実装し、ガンダイオード発振器を形成する場合、発振周波数のばらつきの小さいガンダイオード発振器を形成することができる。以下、本発明の実施例について説明する。   In the flat circuit board of the present invention, a conductive film that connects the front surface ground electrode and the back surface ground electrode is formed on the side surface of the flat circuit board on which the Gunn diode is mounted. Equivalent) is reduced. As a result, when a Gunn diode is mounted on the flat circuit board of the present invention to form a Gunn diode oscillator, it is possible to form a Gunn diode oscillator with small variations in oscillation frequency. Examples of the present invention will be described below.

図1は本発明の第1の実施例の説明図である。ガンダイオード1を実装した平板回路基板(第1の平板回路基板に相当)2aは、図1(a)に示すように、その表面に信号伝送線路(第1の信号伝送線路に相当)6aと表面接地電極7aが形成されており、その裏面には裏面接地電極8aが形成されている。従来の平板回路基板と異なり、ビア電極はなく、表面接地電極7aと裏面接地電極8aが平板基板5aの側面に形成されている金属膜等からなる導電性膜18によって導通する構造となっている。   FIG. 1 is an explanatory diagram of a first embodiment of the present invention. A flat circuit board (corresponding to a first flat circuit board) 2a mounted with a Gunn diode 1 has a signal transmission line (corresponding to a first signal transmission line) 6a on its surface, as shown in FIG. A surface ground electrode 7a is formed, and a back surface ground electrode 8a is formed on the back surface thereof. Unlike the conventional flat circuit board, there is no via electrode, and the surface ground electrode 7a and the back ground electrode 8a are electrically connected by the conductive film 18 made of a metal film or the like formed on the side surface of the flat board 5a. .

ガンダイオード1を実装した平板回路基板2aは、次のように形成する。まず、放熱特性の良いダイヤモンドや、AlN、SiCまたはBeO等のセラミックスの中から適宜選択した材料を用意し、例えばエキシマレーザー光を照射して切断することで、一辺が1mm程度の平板基板5aを形成する。ここで、レーザー光を照射して切断する加工方法は、一般的に±5μm程度の加工精度があり、平板基板5aの対向する側面の間隔のばらつきも、±5μm程度となる。従来のマイクロブラスト法による加工精度±30μm程度と比較して、大幅にばらつきを抑えられることがわかる。   The flat circuit board 2a on which the Gunn diode 1 is mounted is formed as follows. First, a material appropriately selected from diamond having good heat dissipation characteristics, ceramics such as AlN, SiC, or BeO is prepared. For example, the flat substrate 5a having a side of about 1 mm is cut by irradiation with excimer laser light. Form. Here, the processing method of irradiating and cutting with laser light generally has a processing accuracy of about ± 5 μm, and the variation in the distance between the opposing side surfaces of the flat substrate 5a is about ± 5 μm. It can be seen that the variation can be greatly suppressed as compared with the processing accuracy of about ± 30 μm by the conventional microblast method.

次に、平板基板5aの対向する1対の側面に、例えば蒸着法によって、チタン、白金、金などの導電性膜18を被着形成する。   Next, a conductive film 18 made of titanium, platinum, gold, or the like is deposited on a pair of opposite side surfaces of the flat substrate 5a by, for example, vapor deposition.

次に、平板基板5a表面に、チタン、白金、金などの導電性薄膜を形成し、通常のフォトリソグラフ法によって、導電性膜18が被着した側面側の表面に1対の表面接地電極7aを、その間に信号伝送線路6aを形成する。また平板基板5aの裏面には、裏面接地電極8aを形成する。このように形成することにより、表面接地電極7aと裏面接地電極8aが、平板基板5aの側面に被着した導電性膜18によって導通する構造の平板回路基板2aが形成される。なお、平板基板5aを切断する方法は、上述のレーザー光を照射して切断する方法に限らず、加工精度の高い方法を採用することができる。平板回路基板2aの1辺の寸法、厚さを所望の寸法に形成することで、従来のビア電極の間隔10に相当する寸法のばらつきを非常に小さくすることができる。その後、通常のフリップチップボンディング装置を用いて、ガンダイオード1を平板回路基板2a上に搭載する(図1a)。ガンダイオード1は、図4で説明した構造とし、図示しないカソード電極を信号伝送線路6aに、アノード電極を表面接地電極7aに接続する。   Next, a conductive thin film such as titanium, platinum, or gold is formed on the surface of the flat substrate 5a, and a pair of surface ground electrodes 7a are formed on the surface on the side surface on which the conductive film 18 is deposited by a normal photolithography method. The signal transmission line 6a is formed between them. A back surface ground electrode 8a is formed on the back surface of the flat substrate 5a. By forming in this way, the flat circuit substrate 2a having a structure in which the front surface ground electrode 7a and the back surface ground electrode 8a are electrically connected by the conductive film 18 attached to the side surface of the flat substrate 5a is formed. The method of cutting the flat substrate 5a is not limited to the method of cutting by irradiating the laser beam described above, and a method with high processing accuracy can be adopted. By forming the dimension and thickness of one side of the flat circuit board 2a to the desired dimensions, the variation in dimension corresponding to the distance 10 between the conventional via electrodes can be extremely reduced. Thereafter, the Gunn diode 1 is mounted on the flat circuit board 2a using a normal flip chip bonding apparatus (FIG. 1a). The Gunn diode 1 has the structure described with reference to FIG. 4, and a cathode electrode (not shown) is connected to the signal transmission line 6a and an anode electrode is connected to the surface ground electrode 7a.

一方、図1(b)に示すように、通常の平板基板に用いられるセラミックスからなる平板基板5bを用意し、平板回路基板2aが挿入される部分を、エキシマレーザーを照射して切断除去し、貫通穴19を形成する。このときの加工精度は・5μm程度である。続いて信号伝送線路6b(第2の信号伝送線路に相当)、バイアス端子20を平板基板5b上にパターン形成し、貫通穴19のある平板回路基板2bを形成する。平板回路基板2b表面にはバイアス回路、共振回路、整合回路など、発振回路として必要な回路構造を形成する。また平板回路基板2bの裏面には、裏面接地電極8が形成されている。   On the other hand, as shown in FIG. 1 (b), a flat substrate 5b made of ceramic used for a normal flat substrate is prepared, and the portion where the flat circuit substrate 2a is inserted is cut and removed by irradiating an excimer laser, A through hole 19 is formed. The processing accuracy at this time is about 5 μm. Subsequently, the signal transmission line 6b (corresponding to the second signal transmission line) and the bias terminal 20 are patterned on the flat substrate 5b, and the flat circuit substrate 2b having the through holes 19 is formed. A circuit structure necessary as an oscillation circuit such as a bias circuit, a resonance circuit, and a matching circuit is formed on the surface of the flat circuit board 2b. A back surface ground electrode 8 is formed on the back surface of the flat circuit board 2b.

また図1(c)に示すように、通常の平板基板に用いられるセラミックスからなる平板基板5cを用意し、平板基板5c表面に金属薄膜を形成し、金属薄膜の両端にバンプ21を配置した伝送線路接続素子22を形成する。   Further, as shown in FIG. 1 (c), a transmission in which a flat substrate 5c made of ceramics used for a normal flat substrate is prepared, a metal thin film is formed on the surface of the flat substrate 5c, and bumps 21 are arranged on both ends of the metal thin film. The line connection element 22 is formed.

次に、平板回路基板2bの貫通穴19内に、図1(a)に示すガンダイオード1を搭載した平板回路基板2aを配置し、信号伝送線路6aと6bを伝送線路接続素子22によって接続することで、ガンダイオード発振器を形成することができる(図1d)。なお図1(d)は、接地筐体23上に、平板回路基板2aおよび2bを載置した構造を示しており、図示するようにバイアス端子20にバイアス電位を印加することによって、ガンダイオード発振器となる。   Next, the flat circuit board 2a on which the Gunn diode 1 shown in FIG. 1A is mounted is disposed in the through hole 19 of the flat circuit board 2b, and the signal transmission lines 6a and 6b are connected by the transmission line connecting element 22. Thus, a Gunn diode oscillator can be formed (FIG. 1d). FIG. 1 (d) shows a structure in which the flat circuit boards 2a and 2b are placed on the ground casing 23. By applying a bias potential to the bias terminal 20 as shown, the Gunn diode oscillator It becomes.

このような構造とすることで、間隔24は平板基板5aの対向する側面の寸法によって決まることになる。ここで側面の寸法は、平板基板5aの加工精度により決まるので、レーザー光を照射して切断加工する方法では、±5μm程度のばらつきに留まる。   With such a structure, the interval 24 is determined by the dimensions of the opposing side surfaces of the flat substrate 5a. Here, since the dimension of the side surface is determined by the processing accuracy of the flat substrate 5a, in the method of cutting by irradiating the laser beam, the variation is about ± 5 μm.

図2は本発明の第2の実施例の説明図である。本実施例では、ガンダイオード1を実装した平板回路基板(第1の平板回路基板に相当)2cは、図2(a)に示すように、その表面に信号伝送線路(第1の信号伝送線路に相当)6cと表面接地電極7cが形成されており、その裏面には裏面接地電極8cが形成されている。従来の平板回路基板と異なり、ビア電極がない構造となっている。また実施例1で説明した平板回路基板2aと異なり、表面接地電極7cと裏面接地電極8cを導通させるための導電性膜18を備えていない構造となっている。   FIG. 2 is an explanatory diagram of the second embodiment of the present invention. In this embodiment, the flat circuit board (corresponding to the first flat circuit board) 2c on which the Gunn diode 1 is mounted is provided with a signal transmission line (first signal transmission line) on its surface as shown in FIG. 6c and the front surface ground electrode 7c are formed, and the back surface ground electrode 8c is formed on the back surface thereof. Unlike a conventional flat circuit board, the structure has no via electrode. Unlike the flat circuit board 2a described in the first embodiment, the conductive film 18 for conducting the front surface ground electrode 7c and the back surface ground electrode 8c is not provided.

ガンダイオード1を実装した平板回路基板2cは、次のように形成する。まず、放熱特性の良いダイヤモンドや、AlN、SiCまたはBeO等のセラミックスの中から適宜選択した材料を用意し、例えばエキシマレーザー光を照射して切断することで、一辺が1mm程度の平板基板5aを形成する。ここで、レーザー光を照射して切断する加工方法は、一般的に±5μm程度の加工精度があり、平板基板5cの対向する側面の間隔のばらつきも、±5μm程度となる。従来のマイクロブラスト法による加工精度±30μm程度と比較して、大幅にばらつきを抑えられることがわかる。   The flat circuit board 2c on which the Gunn diode 1 is mounted is formed as follows. First, a material appropriately selected from diamond having good heat dissipation characteristics, ceramics such as AlN, SiC, or BeO is prepared. For example, the flat substrate 5a having a side of about 1 mm is cut by irradiation with excimer laser light. Form. Here, the processing method of irradiating and cutting with a laser beam generally has a processing accuracy of about ± 5 μm, and the variation in the distance between the opposing side surfaces of the flat substrate 5c is about ± 5 μm. It can be seen that the variation can be greatly suppressed as compared with the processing accuracy of about ± 30 μm by the conventional microblast method.

次に平板基板5c表面に、導電性薄膜を被着させ、通常のフォトリソグラフ法によって、1対の表面接地電極7cと、その間に信号伝送線路6cを形成する。また平板基板5cの裏面には、裏面接地電極8cを形成する。この段階では、表面接地電極7cと裏面接地電極8cは電気的に分離されている。なお、平板基板5cを切断する方法は、上述のレーザー光を照射して切断する方法に限らず、加工精度の高い方法を採用することができる。平板回路基板2cの1辺の寸法、厚さを所望の寸法に形成することで、従来のビア電極の間隔10に相当する寸法のばらつきを非常に小さくすることができる。その後、通常のフリップチップボンディング装置を用いて、ガンダイオード1を平板回路基板2c上に搭載する(図2a)。ガンダイオード1は、図4で説明した構造とし、図示しないカソード電極を信号伝送線路6cに、アノード電極を表面接地電極7cに接続する。   Next, a conductive thin film is deposited on the surface of the flat substrate 5c, and a pair of surface ground electrodes 7c and a signal transmission line 6c are formed between them by an ordinary photolithographic method. Further, a back surface ground electrode 8c is formed on the back surface of the flat substrate 5c. At this stage, the front surface ground electrode 7c and the back surface ground electrode 8c are electrically separated. The method of cutting the flat substrate 5c is not limited to the method of cutting by irradiating the laser beam described above, and a method with high processing accuracy can be adopted. By forming the dimension and thickness of one side of the flat circuit board 2c to a desired dimension, the variation in dimension corresponding to the distance 10 between the conventional via electrodes can be extremely reduced. Thereafter, the Gunn diode 1 is mounted on the flat circuit board 2c using a normal flip chip bonding apparatus (FIG. 2a). The Gunn diode 1 has the structure described in FIG. 4, and a cathode electrode (not shown) is connected to the signal transmission line 6c and an anode electrode is connected to the surface ground electrode 7c.

次に、通常の平板基板に用いられるセラミックスからなる平板基板5dおよび5eを用意し、信号伝送線路6dおよび信号伝送線路6eを平板基板5dおよび5e上にパターン形成する。平板基板5dには、バイアス端子20も形成する。このように形成した平板回路基板2dおよび2e表面には、バイアス回路、共振回路、整合回路など、発振回路として必要な回路構造を形成する。また平板回路基板2dおよび2eの裏面には、それぞれ裏面接地電極8dおよび8eが形成されている。   Next, flat plate substrates 5d and 5e made of ceramics used for a normal flat plate substrate are prepared, and the signal transmission line 6d and the signal transmission line 6e are pattern-formed on the flat plate substrates 5d and 5e. A bias terminal 20 is also formed on the flat substrate 5d. A circuit structure necessary as an oscillation circuit, such as a bias circuit, a resonance circuit, and a matching circuit, is formed on the surfaces of the flat circuit boards 2d and 2e thus formed. Further, back ground electrodes 8d and 8e are formed on the back surfaces of the flat circuit boards 2d and 2e, respectively.

接地筐体23上に、平板回路基板2c、2dおよび2eを図2(b)のように載置する。その後、平板回路基板2cの側面に銀ペーストなどの導電性物質を塗布、加熱硬化することによって、表面接地電極7cと裏面接地電極8cを電気的に接続する導電性膜18aを形成する。   The flat circuit boards 2c, 2d and 2e are placed on the ground housing 23 as shown in FIG. Thereafter, a conductive material such as silver paste is applied to the side surface of the flat circuit board 2c, and is cured by heating, thereby forming a conductive film 18a that electrically connects the front surface ground electrode 7c and the back surface ground electrode 8c.

信号伝送線路6cと6d、6cと6eを金線25で接続することで、図2(b)に示すようなガンダイオード発振器を形成することができる。   By connecting the signal transmission lines 6c and 6d and 6c and 6e with the gold wire 25, a Gunn diode oscillator as shown in FIG. 2B can be formed.

このような構造とすることで、間隔24は平板基板5cの対向する側面の寸法によって決まることになる。ここで側面の寸法は、平板基板5cの加工精度により決まるので、レーザー光を照射して切断加工する方法では、±5μm程度のばらつきに留まる。   By adopting such a structure, the interval 24 is determined by the dimensions of the opposing side surfaces of the flat substrate 5c. Here, since the dimension of the side surface is determined by the processing accuracy of the flat substrate 5c, in the method of cutting by irradiating the laser beam, the variation is about ± 5 μm.

以上本発明の実施例について説明したが、本発明はこれらに実施例に限定されるものでないことは言うまでもない。例えば、平板回路基板(2a、2c)は、ガンダイオード1が実装されている状態で、別の平板回路基板(2b、2dおよび2e)と組み合わせて配置するように説明したが、平板回路基板を配置した後、ガンダイオードを実装することも可能である。また第1の実施例において、伝送線路接続素子22の代わりに金線や金リボンで接続することができるし、第2の実施においても、金線の代わりに金リボンや伝送線路接続素子で接続することができる。さらにまた第2の実施例において、第2の平板回路基板に相当する平板回路基板が2個の場合について説明したが、平板回路基板の数は、これに限定されるものではない。   As mentioned above, although the Example of this invention was described, it cannot be overemphasized that this invention is not limited to these Examples. For example, the flat circuit board (2a, 2c) has been described as being disposed in combination with another flat circuit board (2b, 2d, and 2e) in a state where the Gunn diode 1 is mounted. It is also possible to mount a Gunn diode after placement. In the first embodiment, it is possible to connect with a gold wire or a gold ribbon instead of the transmission line connecting element 22, and also in the second embodiment, a connection with a gold ribbon or a transmission line connecting element instead of the gold wire. can do. Furthermore, in the second embodiment, the case where there are two flat circuit boards corresponding to the second flat circuit board has been described, but the number of flat circuit boards is not limited to this.

本発明の第1の実施例の説明図である。It is explanatory drawing of the 1st Example of this invention. 本発明の第2の実施例の説明図である。It is explanatory drawing of the 2nd Example of this invention. 従来のガンダイオード発振器の一部断面図である。It is a partial sectional view of a conventional Gunn diode oscillator. 従来の平板基板の製造方法の説明図である。It is explanatory drawing of the manufacturing method of the conventional flat substrate.

符号の説明Explanation of symbols

1;ガンダイオード、2;平板回路基板、3;カソード電極、4;アノード電極、5;平板基板、6;信号伝送線路、7;表面接地電極、8;裏面接地電極、9;ビア電極、10;間隔、11;平板基板、12;ドライフィルム、13;微細砥粒、14;凹部、15;金属薄膜、16;フォトレジスト、17;めっき層、18;導電性膜、19;貫通穴、20;バイアス端子、21;バンプ電極、22;伝送線路接続素子、23;接地筐体、24;間隔、25:金線 DESCRIPTION OF SYMBOLS 1; Gunn diode, 2; Flat circuit board, 3; Cathode electrode, 4; Anode electrode, 5; Flat board, 6: Signal transmission line, 7: Surface ground electrode, 8; ; Spacing, 11; flat substrate, 12; dry film, 13; fine abrasive, 14; recess, 15; metal thin film, 16; photoresist, 17; plating layer, 18; ; Bias terminal, 21; bump electrode, 22; transmission line connection element, 23; ground housing, 24; interval, 25: gold wire

Claims (2)

表面に第1の信号伝送線路と表面接地電極を、裏面に裏面接地電極を、側面に前記表面接地電極と前記裏面接地電極とを接続する導電性膜を備え、表面にガンダイオードを実装する第1の平板回路基板と、
表面に第2の信号伝送線路を、裏面に裏面接地電極を備えた1または2以上の第2の平板回路基板と、
前記第1の信号伝送線路と前記第2の信号伝送線路とを接続する接続手段とを備えたことを特徴とする平板回路基板。
A first signal transmission line and a surface ground electrode on the surface, a back surface ground electrode on the back surface, a conductive film connecting the surface ground electrode and the back surface ground electrode on the side surface, and a Gunn diode mounted on the surface. 1 flat circuit board;
One or more second flat circuit boards having a second signal transmission line on the front surface and a back ground electrode on the back surface;
A flat circuit board comprising a connection means for connecting the first signal transmission line and the second signal transmission line.
表面に第1の信号伝送線路と表面接地電極を、裏面に裏面接地電極を、側面に前記表面接地電極と前記裏面接地電極を接続する導電性膜を備え、前記第1の信号伝送線路にガンダイオードのカソード電極を接続しかつ前記表面接地電極に前記ガンダイオードのアノード電極を接続した、あるいは前記第1の信号伝送線路に前記ガンダイオードのアノード電極を接続しかつ前記表面接地電極に前記ガンダイオードのカソード電極を接続した第1の平板回路基板と、
表面に第2の信号伝送線路を、裏面に裏面接地電極を備えた1または2以上の第2の平板回路基板と、
前記第1の信号伝送線路と前記第2の信号伝送線路とを接続する接続手段とを備えたことを特徴とするガンダイオード発振器。
A first signal transmission line and a front surface ground electrode on the front surface, a back surface ground electrode on the back surface, a conductive film connecting the front surface ground electrode and the back surface ground electrode on the side surface, and a gun on the first signal transmission line A cathode electrode of a diode is connected and an anode electrode of the Gunn diode is connected to the surface ground electrode, or an anode electrode of the Gunn diode is connected to the first signal transmission line and the Gunn diode is connected to the surface ground electrode. A first flat circuit board to which a cathode electrode of
One or more second flat circuit boards having a second signal transmission line on the front surface and a back ground electrode on the back surface;
A Gunn diode oscillator comprising connection means for connecting the first signal transmission line and the second signal transmission line.
JP2006280889A 2006-10-16 2006-10-16 Flat circuit board and Gunn diode oscillator using the same Expired - Fee Related JP5148855B2 (en)

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