JP5121476B2 - Vacuum processing equipment - Google Patents

Description

  The present invention relates to a vacuum processing apparatus that generates radicals in a vacuum chamber.

  Conventionally, a vacuum processing apparatus that converts gas into plasma inside a vacuum chamber has been used for dry etching and film formation.

  FIG. 7 is a cross-sectional view showing a conventional vacuum processing apparatus 100, and through holes 109 are formed in the ceiling of the vacuum chamber 112, and an antenna container 125 is inserted into each through hole 109. Each antenna container 125 is made of a dielectric material that transmits radio waves such as quartz, and an antenna 122 is disposed therein.

  A vacuum atmosphere is formed in the vacuum chamber 112 by the evacuation system 119, and microwaves are emitted by applying a high frequency voltage from the power source 139 to the antenna 122 while introducing a processing gas from the gas supply system 118 into the vacuum chamber 112. Then, the microwave passes through the antenna container 125 and is released into the vacuum chamber 112, the processing gas is radicalized, and the substrate 107 is surface-treated with the radicalized gas.

In order to prevent leakage of the microwave, the periphery of the portion inserted into the through hole 109 of the antenna container 125 is surrounded by a cylindrical conductive shield 133.
When the conductive shield 133 is in a floating state or has a high electric resistance with the vacuum chamber 112, the microwave reaches the inner wall surface of the through hole 109, and between the inner wall surface of the through hole 109 and the conductive shield 133. Plasma is generated in the gap. Therefore, it is necessary to reliably connect the conductive shield 133 to the ground potential.

  Conventionally, a conductive flange portion 134 in which the outer opening edge portion of the vacuum shield 112 of the conductive shield 133 swells in a ring shape is provided, and the conductive flange portion 134 is sandwiched between the O-ring 150 and the flange portion of the antenna container 125. 130 was pressed against the vacuum chamber 112.

  Since the O-ring 150 is elastically deformed, the distance between the conductive flange portion 134 and the vacuum chamber 112 is shortened, and the conductive flange portion 134 is electrically connected to the vacuum chamber 112. Since the O-ring 150 is hermetically adhered to the conductive flange portion 134 and the vacuum chamber 112 by a restoring force, the inner space of the vacuum chamber 112 can be blocked from the outside by surrounding the through hole 109 with the O-ring 150. it can.

  However, since the antenna container 125 and the flange portion 130 thereof are made of a dielectric material such as quartz, there is a risk of damage if the conductive flange portion 134 is pressed firmly to come into close contact with the vacuum chamber 112.

If the pressing force is weakened to prevent breakage, the conductive flange portion 134 is separated from the vacuum chamber 112 and floats, or even when connected to the ground potential, the electrical resistance between the vacuum chamber 112 increases. As a result, plasma is generated and the O-ring 150 is burned by the plasma.
JP 2000-31121 A

  The present invention is for solving the above-described problems, and an object thereof is to provide a vacuum processing apparatus that prevents abnormal discharge and has a long life.

In order to solve the above problems, the present invention includes a vacuum chamber, an antenna container, and an antenna, and the antenna container is provided with a flange portion at an edge portion of the opening of the container body, A flange portion is positioned outside the vacuum chamber, the container body is disposed so as to be positioned in the through hole of the vacuum chamber, and at least a portion of the side surface of the container body positioned in the through hole is electrically conductive. A shield film is disposed, and the antenna is disposed in the container body, and when a high frequency voltage is applied to the antenna, a microwave is emitted from the antenna toward the internal space of the vacuum chamber. The flange portion has a ground electrode film electrically connected to the conductive shield film on a surface directed to the vacuum chamber, and between the ground electrode film and the vacuum chamber, Without even being disposed conductive elastic member electrically conductive material are exposed on the surface, by the conductive elastic member, and the ground electrode layer, wherein the vacuum chamber is a vacuum processing apparatus which is electrically connected.
This invention is a vacuum processing apparatus, Comprising: The said electroconductive elastic member is a vacuum processing apparatus made into the ring shape surrounding the said through-hole.
The present invention is a vacuum processing apparatus, wherein an O-ring formed of an elastic material in a ring shape is disposed between the flange portion and the vacuum chamber so as to surround the through hole, and the conductive elastic The member is a vacuum processing apparatus located inside the ring of the O-ring.

  Since the ground electrode film is electrically connected to the vacuum chamber via the conductive elastic member, the conductive shield can be connected to the ground potential without strongly pressing the ground electrode film against the vacuum chamber. Since it is not necessary to press the ground electrode film strongly against the vacuum chamber, the flange is not damaged. Since an O-ring is disposed outside the conductive elastic member and the O-ring is in close contact with the vacuum chamber and the flange portion, the inside of the vacuum chamber is kept airtight.

Reference numeral 1 in FIG. 1 shows an example of the vacuum processing apparatus of the present invention.
The vacuum processing apparatus 1 includes a vacuum chamber 12 and a radical generator 20 attached to the vacuum chamber 12.
The radical generator 20 includes one or a plurality of antenna containers 25 and antennas 22 arranged inside each antenna container 25. Each antenna container 25 has the same structure, and the same members will be described with the same reference numerals.

  Referring to FIG. 2, the antenna container 25 has a container body 24 that covers the antenna 22. The shape of the container body 24 is not particularly limited as long as it has a bottom, but here, the bottom surface portion of the container body 24 has a dome shape bulging outwardly in a hemispherical shape.

  The opening edge portion of the container body 24 bulges from the side surface of the container body 24 in the outer peripheral direction. Reference numeral 31 in FIG. 2 indicates a base portion 31 that is a bulging portion. The base portion 31 is made of the same material as the container body 24 and has a ring shape surrounding the opening of the container body 24.

  A conductive film such as a metal film (for example, a silver film) is formed in close contact with the outer side surface of the opening-side base portion of the container body 24 and the surface of the base portion 31 on the bottom surface side of the container body 24 by sputtering or vapor deposition. Yes.

  2 indicates a conductive shield which is a portion formed on the outer side surface of the base portion of the container body 24 of the conductive film, and reference numeral 34 in FIG. 2 indicates a portion formed on the surface of the base portion 31 of the conductive film. A certain ground electrode film is shown, and the base portion 31 and the ground electrode film 34 constitute a flange portion 30.

Since the planar shape of the flange portion 30 is substantially equal to the planar shape of the base portion 31, the flange portion 30 has a ring shape in which the opening edge portion of the container body 24 bulges from the side surface of the container body 24 in the outer peripheral direction. .
In addition, since the conductive film is formed so as to surround the base portion of the container body 24, the conductive shield 33 has a cylindrical shape.

  Reference numeral 40 in FIG. 2 denotes a metal tube (sleeve) made of Al or the like, and the inner periphery of the cut surface obtained by cutting the sleeve 40 in a direction perpendicular to the center axis of the tube has the conductive shield 33 as the center axis of the tube. It is the same as or slightly larger than the outer circumference of the cut surface cut in the vertical direction.

  One end opening of the sleeve 40 bulges all around the outer side to form a ring-shaped sleeve flange portion 42, and the antenna container 25 has a bottom surface facing the inside of the sleeve 40, and the sleeve flange portion 42 on the side where the sleeve flange portion 42 is formed. The sleeve 40 is inserted through the opening.

The outer periphery of the ring of the flange portion 30 is larger than the inner periphery of the cut surface of the sleeve 40, and the flange portion 30 contacts the sleeve flange portion 42 without being inserted into the sleeve 40.
A through hole 9 is formed in one wall surface (here, the ceiling) of the vacuum chamber 12, and the outer periphery of the through hole 9 is the same as or slightly larger than the outer periphery of the cut surface of the sleeve 40.

  The antenna container 25 is inserted into the sleeve 40, and with the antenna 22 disposed therein, the bottom surface of the container body 24 is directed toward the inside of the vacuum chamber 12, and is pushed into the through-hole 9 from the outside of the vacuum chamber 12, thereby conducting the conductive shield. 33 and the container body 24 are inserted into the through hole 9 together with the sleeve 40. At this time, since the conductive shield 33 is covered with the sleeve 40, the conductive shield 33 is not rubbed against the inner wall surface of the through hole 9 and is not damaged.

The outer periphery of the ring of the sleeve flange portion 42 is made larger than the outer periphery of the through hole 9, and the sleeve flange portion 42 and the flange portion 30 are not inserted into the through hole 9 and remain outside the vacuum chamber 12.
A first groove 51 is formed in a ring shape surrounding the through hole 9 around the through hole 9 on the outer wall surface of the vacuum chamber 12, and a second groove is formed around the first groove 51 on the outer wall surface of the vacuum chamber 12. 52 is formed in a ring shape surrounding the first groove 51.

In the first and second grooves 51, 52, ring-shaped first and second elastic members 55, 58 that can be deformed like rubber are fitted in advance, and the first and second elastic members 55, The planar shape of 58 is a ring shape substantially equal to the first and second grooves 51 and 52.
In the state where no pressing force is applied, the ring thickness of the first and second elastic members 55 and 58 is thicker than the depth of the first and second grooves 51 and 52, and the first and second elastic members 55 and 58. Are protruding upward from the first and second grooves 51 and 52, respectively.

The outer periphery of the ring of the flange portion 30 is larger than the outer periphery of the ring of the sleeve flange portion 42, and the entire periphery protrudes outward from the outer periphery of the ring of the sleeve flange portion 42.
Here, the outer periphery of the ring of the flange portion 30 is larger than the outer periphery of the ring of the second groove 52, the outer periphery of the ring of the sleeve flange portion 42 is smaller than the inner periphery of the ring of the second groove 52, and It is made larger than the outer periphery of the ring.

  Therefore, when the flange portion 30 faces the second elastic member 58 and the sleeve flange portion 42 faces the first elastic member 55, and the antenna container 25 is further pushed into the vacuum chamber 12, the flange portion 30 becomes the second elastic member 58. The sleeve flange portion 42 is pressed against the first elastic member 55 against the elastic member 58.

  The antenna container 25 is attached to the vacuum chamber 12 with a fixing member (not shown) while being pushed into the vacuum chamber 12 until the first and second elastic members 55 and 58 are pressed and deformed. Due to the restoring force, the first elastic member 55 is in close contact with the vacuum chamber 12 (the bottom surface of the first groove 51) and the sleeve flange portion 42, and the second elastic member 58 is the vacuum chamber 12 (the bottom surface of the second groove 52). And the flange portion 30 respectively.

  Here, the ground electrode film 34 is formed on the entire surface of the base portion 31 on the vacuum chamber 12 side, and the second elastic member 58 is in close contact with the surface of the ground electrode film 34. However, as shown in FIG. The second elastic member 58 may be adhered to the surface of the base portion 31 without forming the ground electrode film 34 on the outer peripheral portion of the base portion 31.

  Of the first and second elastic members 55 and 58, at least the first elastic member 55 is composed of a conductive elastic member having a conductive material exposed on the surface thereof. For example, the first elastic member 55 includes a ring-shaped core body 56 made of an elastic material such as rubber, and a conductive layer 57 (for example, an Al layer) formed on the surface of the core body 56. 12 and the sleeve flange portion 42 are in close contact with the conductive layer 57 and are electrically connected.

  As described above, the sleeve 40 is made of metal, and the sleeve flange portion 42 is also made of a conductive material such as metal. The ground electrode film 34 is exposed on the surface of the flange portion 30 on the vacuum chamber 12 side, and when the antenna container 25 is pushed into the vacuum chamber 12, the ground electrode film 34 is pressed against the sleeve flange portion 42 and closely contacts.

  Therefore, the ground electrode film 34 is electrically connected to the sleeve flange portion 42, and is electrically connected to the vacuum chamber 12 via the sleeve flange portion 42 and the first elastic member 55, and has the same ground potential as the vacuum chamber 12. Placed in.

  As shown in FIG. 4, the outer periphery of the ring of the sleeve flange portion 42 may be made smaller than the inner periphery of the ring of the first groove 51, and the first elastic member 55 may be directly adhered to the surface of the ground electrode film 34. .

  Since the first elastic member 55 is elastically deformed and is in close contact with the vacuum chamber 12 and the sleeve flange portion 42 (or the ground electrode film 34), the contact area is large compared to the case where the first elastic member 55 is not elastically deformed. The electrical resistance between 12 is small.

  Here, the conductive shield 33 is integrally formed of the same conductive film as the ground electrode film 34. Since the ground electrode film 34 and the conductive shield 33 are in close contact with each other and are electrically connected to each other, the conductive shield 33 is electrically connected to the vacuum chamber 12 through the ground electrode film 34 and the first elastic member 55. Connected.

  The antenna 22 is rod-shaped and is erected on the surface of the mounting plate 29. The mounting plate 29 is attached to the base portion 31 with the surface on which the antenna 22 is erected facing the internal space of the container main body 24, and the antenna 22 is disposed in the container main body 24 with the tip facing the bottom surface of the container main body 24. Has been.

  The container body 24 and the base part 31 are mainly composed of a dielectric such as quartz. Since the antenna 22 is located inside the container main body 24, the antenna 22 is electrically insulated from the vacuum chamber 12 without contacting the conductive shield 33 or the ground electrode film 34. Therefore, a high frequency voltage can be applied to the antenna 22 while the vacuum chamber 12 is kept at the ground potential.

  As described above, the through hole 9 is inside the ring of the first elastic member 55, the first elastic member 55 and the vacuum chamber 12 are in airtight contact, and the first elastic member 55 and the sleeve flange portion 42 are airtight. Because of the close contact, it is difficult for air to enter the through hole 9 from the outside.

  Moreover, the first elastic member 55 is surrounded by the second elastic member 58. The second elastic member 58 is an O-ring in which an elastic material such as rubber is formed in a ring shape, and the second elastic member 58 is in airtight contact with the flange portion 30 and the vacuum chamber 12. Even if there is a gap between the flange portions 42, the atmosphere does not enter the through hole 9 from the outside.

  The ground electrode film 34 is formed in close contact with the surface of the base portion 31 by sputtering or vapor deposition, and there is no gap between the ground electrode film 34 and the base portion 31. Does not enter.

  The ground electrode film 34 and the conductive shield 33 are not formed in close contact with the base portion 31 and the container main body 24, but a metal sleeve 40 is inserted into the container main body 24 so that the sleeve 40 serves as a conductive shield. 42 may be a ground electrode film. In this case, since there is a possibility that the space between the sleeve flange portion 42 and the base portion 31 is not airtight, the second elastic member 58 may be brought into close contact with the base portion 31 as shown in FIG.

  Thus, in a state where the antenna container 25 is attached to the vacuum chamber 12, the conductive shield 33 is placed at the same ground potential as the vacuum chamber 12, and the atmosphere does not enter the through hole 9, so The space is blocked from the external space.

If the fixing member is removed after making the internal pressure of the vacuum chamber 12 substantially equal to the external atmosphere, the antenna container 25 can be removed from the vacuum chamber 12 and maintenance such as cleaning and replacement of parts can be performed.
Unlike the case where the antenna container 25 is attached to the vacuum chamber 12 by welding or the like, the vacuum processing apparatus 1 of the present invention can repeatedly attach and detach the radical generator 20 from the vacuum chamber 12.

  As shown in FIGS. 2 and 3, the sleeve flange portion 42 is in close contact with the first elastic member 55 and the flange portion 30 is in close contact with the second elastic member 58, so that the sleeve flange portion 42 and the flange portion 30 are directly in the vacuum chamber. If it is made not to contact 12, even if it attaches and detaches repeatedly, the flange part 30 and the sleeve flange part 42 are hard to be damaged.

Next, the process of processing a substrate with the vacuum processing apparatus 1 of the present invention will be described.
A gas supply system 18 and a vacuum exhaust system 19 are connected to the vacuum chamber 12, and a substrate electrode 17 is disposed on the bottom surface inside the vacuum chamber 12.
The inside of the vacuum chamber 12 is evacuated by the evacuation system 19 to form a vacuum atmosphere, and the substrate 7 is carried into the vacuum chamber 12 and placed on the substrate electrode 17 while maintaining the vacuum atmosphere.

After the internal pressure of the vacuum chamber 12 drops to a predetermined pressure, a processing gas is introduced from the gas supply system 18 while continuing the vacuum exhaust, and a processing atmosphere of a predetermined pressure is formed inside the vacuum chamber 12.
The length from the bottom surface of the container body 24 to the opening is longer than the length from one end to the other end of the through hole 9, and the bottom surface portion protrudes into the vacuum chamber 12.

  As described above, the conductive shield 33 and the sleeve 40 are cylindrical, and the length from one end of the cylinder to the other end is shorter than the length of the container main body 24, and the bottom surface portion of the container main body 24 is the conductive shield 33. Further, it is exposed to the processing atmosphere in the vacuum chamber 12 without being covered with the sleeve 40.

The container body 24 is made of a dielectric material such as quartz that allows radio waves to pass through. When a high-frequency voltage of about 2.45 GHz is applied from the high-frequency power source 14 to the antenna 22 to emit microwaves, the microwaves are stored in the container body 24. It passes through the bottom portion and is released into the vacuum chamber 12, and the processing gas is radicalized by the microwave, and the surface of the substrate 7 is processed with the radicalized processing gas.
For example, when the silicon layer is exposed on the surface of the substrate 7 and the processing gas is oxygen gas, the silicon layer is oxidized by radicals of oxygen gas to form a silicon oxide layer.

  The length of the conductive shield 33 is the same as or slightly longer than that of the through hole 9, and the portion located in the through hole 9 of the container body 24 is covered with the conductive shield 33, and the antenna 22 extends from the inside of the through hole 9. The microwave toward the wall surface is reflected or absorbed by the conductive shield 33.

  Here, the length of the conductive shield 33 is longer than that of the through hole 9, and a part of the conductive shield 33 protrudes into the vacuum chamber 12, and the through hole extends from the portion of the antenna 22 protruding into the vacuum chamber 12. 9 The microwave which goes diagonally to the inner wall surface is also blocked.

  If the conductive shield 33 is not electrically connected to the vacuum chamber 12 (for example, in a floating state) or has a large electrical resistance with the vacuum chamber 12 even if it is connected, the microwave is transmitted through the inner wall surface of the through-hole 9. If there is a gap between the sleeve 40 and the inner wall surface of the through hole 9, plasma is generated in the gap and the first and second elastic members 55 and 58 may be burned off by the plasma.

  In the present invention, since the second elastic member 58 is elastically deformed and the contact area between the vacuum chamber 12 and the ground electrode film 34 is increased, the electrical resistance between the conductive shield 33 and the vacuum chamber 12 is reduced. Thus, even if there is a gap between the sleeve 40 and the inner wall surface of the through-hole 9, no plasma is generated, and the first and second elastic members 55 and 58 are not burned out.

Further, if the inner circumference of the cut surface of the sleeve 40 is substantially equal to the outer circumference of the cut surface of the conductive shield 33 and the sleeve 40 is brought into close contact with the conductive shield 33 to form one shield, the thickness of the shield increases. Therefore, the electrical resistance between the conductive shield 33 and the vacuum chamber 12 can be further reduced.
After the surface treatment of the substrate 7 is completed, the gas introduction into the vacuum chamber 12 and the emission of the microwave are stopped, and the substrate 7 is carried out of the vacuum chamber 12.

As described above, the microwave does not reach the inner wall surface of the through hole 9 and abnormal discharge does not occur, so the substrate 7 is not damaged and the life of the vacuum processing apparatus 1 is long.
When radicalizing the processing gas, if a high frequency voltage is applied from the power source 8 to the substrate electrode 17, the incident energy such as radicals incident on the surface of the substrate 7 can be controlled. For example, the incident energy can be reduced to reduce damage, and conversely, the incident energy can be increased to increase the processing speed.

Although the case where the antenna container 25 is attached to the vacuum chamber 12 in a state where the antenna container 25 is inserted through the sleeve 40 has been described above, the present invention is not limited to this.
For example, as shown in FIG. 5, the antenna container 25 may be inserted into the through hole 9 without being inserted into the sleeve 40 and attached to the vacuum chamber 12. In this case, the second elastic member 58 may be in close contact with either the base portion 31 or the ground electrode film 34, but the first elastic member 55 is in close contact with the ground electrode film 34.

Further, in the radical generator 20 shown in FIGS. 2 to 5, the first elastic member 55 is not limited to a ring shape. When the first elastic member 55 is not ring-shaped, one or a plurality of first elastic members 55 are arranged around the through hole 9 on the outer wall surface of the vacuum chamber 12, and the vacuum chamber 12 and the ground electrode film 34 are arranged. (Or close to the sleeve flange portion 42).
Even if the first elastic member 55 is not ring-shaped, since the through hole 9 is surrounded by the second elastic member 58, the inside of the vacuum chamber 12 is maintained airtight.

  Moreover, when the 1st elastic member 55 is ring shape, as shown in FIG. 6, the 2nd elastic member 58 does not need to be arrange | positioned. In this case, in order to more reliably block the internal space of the vacuum chamber 12 from the external space, it is desirable that the first elastic member 55 is in direct contact with the flange portion 30 (the ground electrode film 34 or the base portion 31).

  The structure of the flange part 30 is not specifically limited. For example, the base portion 31 is not provided around the opening of the container body 24, and a ring-shaped metal plate is disposed around the opening of the container body 24 so as to protrude in the outer peripheral direction of the container body 24, and the flange portion 30 is disposed on the metal plate. (Ground electrode film) may be used.

  The material of the sleeve 40 is not particularly limited as long as it is conductive. However, if a soft metal such as silver is used, the sleeve 40 is rubbed and damaged by the inner wall surface of the through hole 9. It is desirable that the thickness (difference between the outer periphery and the inner periphery of the cylinder) is larger than the film thickness of the conductive shield 33 (for example, 1 mm).

  It is desirable that the conductive layer 57 of the first elastic member 55 be thin enough to prevent the entire elastic deformation. The conductive layer 57 and the core body 56 are not particularly limited. For example, the conductive layer 57 is mainly composed of a metal such as Al, and the core body 56 is mainly composed of a fluoro rubber such as Viton (registered trademark). .

The structure of the first elastic member 55 (conductive elastic member) is not limited. For example, the first elastic member 55 may be composed of conductive rubber in which a conductive material such as carbon black is added to rubber.
A metal gasket such as copper can be used as the first elastic member 55, but cannot be used when the antenna container 25 is repeatedly attached and detached.

  Although the second elastic member 58 is not particularly limited, a resin having a smaller dielectric loss tangent (tan δ) than Viton (registered trademark) is preferable, and as such a resin, there is a perfluoro resin such as Perflo (registered trademark).

  Although the antenna 22 is not particularly limited, when a magnetron is used as the antenna 22, a powerful microwave is emitted from the antenna 22, so that the processing gas is radicalized with high efficiency.

  The processing gas is not limited to oxygen gas, and may be any gas that can be radicalized to perform vacuum processing of the processing target. Nitrogen gas may be used for nitriding the processing target, or an oxidizing gas may be used. The surface treatment of the object to be treated may be performed using a reducing gas. Further, the etching process may be performed using an etching gas such as a fluorinated gas. Further, a thin film source gas is introduced from the source gas introduction system in addition to the process gas, and the radical of the process gas generated in the vacuum chamber 12 reacts with the source gas introduced into the vacuum chamber 12 to obtain The obtained reaction product can be deposited on the surface of the object to be processed, and a thin film can be grown.

In short, the present invention broadly includes vacuum processing apparatuses that perform vacuum processing such as film forming apparatuses, etching apparatuses, and surface modification apparatuses.
The number of through holes 9 may be one, but if a plurality of through holes 9 are provided and a plurality of antennas 22 are arranged in a distributed manner, radicals of the processing gas can uniformly reach the surface of the large area substrate 7 to increase the area. Uniform vacuum processing is possible even on a substrate.

Sectional drawing for demonstrating the 1st example of the vacuum processing apparatus of this invention Enlarged sectional view of the antenna container mounting part The expanded sectional view explaining the vacuum processing apparatus of the 2nd example Expanded sectional view explaining the vacuum processing apparatus of the third example Expanded sectional view for explaining the vacuum processing apparatus of the fourth example Expanded sectional view for explaining the vacuum processing apparatus of the fifth example Sectional drawing for demonstrating the vacuum processing apparatus of a prior art

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1 ... Vacuum processing apparatus 7 ... Substrate 9 ... Through-hole 12 ... Vacuum chamber 22 ... Antenna 24 ... Container body 25 ... Antenna container 30 ... Flange 33 ... Conductive shield 34 ... Ground electrode Membrane 55... Conductive elastic member (first elastic member) 58... O-ring (second elastic member)

Claims (3)

A vacuum chamber, an antenna container, and an antenna;
The antenna container is provided with a flange at the edge of the opening of the container body,
The antenna container is disposed such that the flange portion is located outside the vacuum chamber, and the container body is located in the through hole of the vacuum chamber,
A conductive shield film is disposed on at least a portion of the side surface of the container body located in the through hole,
The antenna is a vacuum processing apparatus that is arranged in the container body, and when a high frequency voltage is applied to the antenna, microwaves are emitted from the antenna toward the internal space of the vacuum chamber,
The flange portion has a ground electrode film electrically connected to the conductive shield film on a surface directed to the vacuum chamber,
Between the ground electrode film and the vacuum chamber, a conductive elastic member that exposes a conductive substance on at least a surface is disposed,
A vacuum processing apparatus in which the ground electrode film and the vacuum chamber are electrically connected by the conductive elastic member.   The vacuum processing apparatus according to claim 1, wherein the conductive elastic member has a ring shape surrounding the through hole. Between the flange portion and the vacuum chamber, an O-ring formed of an elastic material in a ring shape is disposed so as to surround the through hole,
The vacuum processing apparatus according to claim 1, wherein the conductive elastic member is located inside a ring of the O-ring.

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