JP4971617B2 - Coil device - Google Patents

Coil device Download PDF

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JP4971617B2
JP4971617B2 JP2005284751A JP2005284751A JP4971617B2 JP 4971617 B2 JP4971617 B2 JP 4971617B2 JP 2005284751 A JP2005284751 A JP 2005284751A JP 2005284751 A JP2005284751 A JP 2005284751A JP 4971617 B2 JP4971617 B2 JP 4971617B2
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resin
coil device
exterior body
buffer layer
imide
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JP2007096073A (en
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充弘 山下
隆範 早川
孝 長坂
泰弘 松川
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TDK Corp
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Description

本発明は、コイル装置に関する。   The present invention relates to a coil device.

従来のコイル装置は、コアやボビン等の支持部材上に導電線を巻きつけ、全体を外装絶縁樹脂で被覆した構造をとるのが一般的である(特許文献1参照)。導電線としては、銅線をウレタンで被覆したウレタンワイヤなどを用いる。外装絶縁樹脂は、射出成形等により成形される。   A conventional coil device generally has a structure in which a conductive wire is wound around a support member such as a core or a bobbin and the whole is covered with an exterior insulating resin (see Patent Document 1). As the conductive wire, a urethane wire in which a copper wire is coated with urethane is used. The exterior insulating resin is molded by injection molding or the like.

更に、外装絶縁樹脂の成形の際に導電線の巻き状態が乱れるのを防止するため、導電線を巻き付けて構成した巻線部と、外装絶縁樹脂との間に、緩衝層となるアンダーコート材として樹脂を塗布することも知られている。
特開平6−325938号公報
Further, in order to prevent the winding state of the conductive wire from being disturbed during the molding of the exterior insulating resin, an undercoat material serving as a buffer layer between the winding portion formed by winding the conductive wire and the exterior insulating resin It is also known to apply resin.
JP-A-6-325938

近年、コイル装置は、自動車の制御装置にも利用されつつあり、この場合、PCT試験(プレッシャー・クッカー試験)など、かなり厳しい条件での信頼性が要求されてきている。従って、アンダーコート材を、PCT試験に適合させることができれば非常に有用である。   In recent years, coil devices are being used for automobile control devices, and in this case, reliability under considerably severe conditions such as PCT test (pressure cooker test) has been required. Therefore, it is very useful if the undercoat material can be adapted to the PCT test.

アンダーコート材としては、従来は、シリコンアクリレート絶縁樹脂を用いていた。しかし、本出願人が検討したところ、シリコンアクリレート絶縁樹脂は、分子構造内にアクリルエステル基を含んでいるため、PCT試験で、加水分解作用を受けてカルボン酸に分解され、導電線の絶縁皮膜に損傷を与える恐れがある。例えば、導電線の絶縁皮膜としてウレタン皮膜を用いた場合、ウレタン皮膜が侵食などの損傷を受ける可能性が極めて高い。   Conventionally, a silicon acrylate insulating resin has been used as the undercoat material. However, when the present applicant examined, since the silicon acrylate insulating resin contains an acrylic ester group in the molecular structure, it is hydrolyzed and decomposed into carboxylic acid in the PCT test. May cause damage. For example, when a urethane film is used as the insulating film of the conductive wire, the urethane film is very likely to be damaged such as erosion.

本発明は、上記問題点に鑑みてなされたものであり、信頼性のより高いコイル装置を提供することを目的とする。   The present invention has been made in view of the above problems, and an object thereof is to provide a coil device with higher reliability.

上述した課題を解決するため、本発明に係るコイル装置は、支持部材と、巻線部と、外装体と、緩衝層とを含む。   In order to solve the above-described problem, the coil device according to the present invention includes a support member, a winding portion, an exterior body, and a buffer layer.

前記巻線部は、前記支持部材に導電線を巻装して構成される。前記外装体は、樹脂成形体でなり、少なくとも前記巻線部を覆っている。   The winding portion is configured by winding a conductive wire around the support member. The exterior body is a resin molded body and covers at least the winding part.

前記緩衝層は、前記外装体と、前記巻線部との間に介在し、イミドシリコン樹脂からなる。   The said buffer layer is interposed between the said exterior body and the said coil | winding part, and consists of an imide silicon resin.

本発明に係るコイル装置において、巻線部は、支持部材に導電線を巻装して構成される。外装体は、樹脂成形体でなり、少なくとも巻線部を覆っている。従って、コイル装置の基本的構造が得られる。   In the coil device according to the present invention, the winding portion is configured by winding a conductive wire around a support member. The exterior body is made of a resin molded body and covers at least the winding part. Therefore, the basic structure of the coil device can be obtained.

更に、緩衝層が、外装体と巻線部との間に介在する。緩衝層は、外装体の樹脂成形の際、導電線の巻き状態が乱れるのを防止する機能を担う。   Further, a buffer layer is interposed between the exterior body and the winding part. The buffer layer has a function of preventing the winding state of the conductive wire from being disturbed during resin molding of the exterior body.

本発明の重要な特徴として、緩衝層は、イミドシリコン樹脂からなる。イミドシリコン樹脂は、分子構造内にエステル基を含まず、加水分解を起こさない。従って、導電線に損傷を与えることがない。   As an important feature of the present invention, the buffer layer is made of imidosilicon resin. The imidosilicon resin does not contain an ester group in the molecular structure and does not cause hydrolysis. Therefore, the conductive wire is not damaged.

更に、イミドシリコン樹脂は溶剤タイプであるから、巻線部にイミドシリコン樹脂を塗布した後、溶剤を揮発させ、塗布膜でなる緩衝層の層厚を小さくすることができる。従って、コイル装置のリフロー工程の際、外装体に対する内部応力を低減し、外装体のクラック発生を抑制することができる。   Furthermore, since the imide silicone resin is a solvent type, after the imide silicone resin is applied to the winding portion, the solvent is volatilized, and the thickness of the buffer layer made of the coating film can be reduced. Therefore, during the reflow process of the coil device, internal stress on the exterior body can be reduced, and cracks in the exterior body can be suppressed.

更に、イミドシリコン樹脂を採用することにより、信頼性試験におけるインダクタンスの経時変化、例えば、一定の時間にわたりインダクタンス変化率(ΔL/L)を小さく抑えることができる。   Furthermore, by employing an imide silicon resin, it is possible to suppress the change in inductance over time in the reliability test, for example, the inductance change rate (ΔL / L) over a certain period of time.

次に、好ましい実施の態様について述べる。   Next, a preferred embodiment will be described.

イミドシリコン樹脂としては、シリコンとイミドとの重量組成比が70:30〜80:20のものを用いることができる。かかる組成比によれば、シリコン100%の樹脂との対比において、低温硬化性、塗布膜の強度及び耐熱性を改善することができる。   As the imide silicon resin, one having a weight composition ratio of silicon and imide of 70:30 to 80:20 can be used. According to such a composition ratio, the low temperature curability, the strength of the coating film and the heat resistance can be improved in comparison with a resin of 100% silicon.

また、イミドシリコン樹脂の塗布の際には、溶剤を加え、固形分と、溶剤との重量組成比を50:50〜20:80とした溶剤タイプを用いることができる。   Moreover, in the case of application | coating of an imide silicone resin, a solvent type can be used which added a solvent and made weight composition ratio of solid content and a solvent 50: 50-20: 80.

導電線は、導電芯線の周りに、ウレタンからなる絶縁皮膜を有していてもよい。この場合、緩衝層の構成材料としてイミドシリコン樹脂を採用することにより、導電線のウレタン絶縁皮膜が侵食を受けない。   The conductive wire may have an insulating film made of urethane around the conductive core wire. In this case, the urethane insulating film of the conductive wire is not eroded by adopting imide silicon resin as the constituent material of the buffer layer.

外装体の構成材料としては、熱硬化性樹脂や熱可塑性樹脂を挙げることができる。熱可塑性樹脂の場合、熱硬化性樹脂との対比において柔軟性に優れており、クラック発生の可能性を低減することができる。特に液晶ポリマーは、しなやかで柔らかく、外装体の構成材料として適している。   Examples of the constituent material of the exterior body include a thermosetting resin and a thermoplastic resin. In the case of a thermoplastic resin, it is excellent in flexibility in comparison with a thermosetting resin, and the possibility of occurrence of cracks can be reduced. In particular, the liquid crystal polymer is supple and soft, and is suitable as a constituent material of the outer package.

以上述べたように、本発明によれば、信頼性のより高いコイル装置を提供することができる。   As described above, according to the present invention, a highly reliable coil device can be provided.

図1は本発明に係るコイル装置の一実施形態を示す部分破断斜視図、図2は図1に示したコイル装置の正面断面図である。図示のように、本発明に係るコイル装置は、巻線部1と、支持部材2と、緩衝層3と、外装体4とを含む。支持部材2は、コア、ボビンまたはそれらの組み合わせ等であり、任意の形状及び構造をとることができる。実施例に示す支持部材2は、フェライト磁性材料等を用いて成型されたコアであり、中間部20を細くし、その両端につば部21、22を設けた棒状の形状を有する。   1 is a partially cutaway perspective view showing an embodiment of a coil device according to the present invention, and FIG. 2 is a front sectional view of the coil device shown in FIG. As illustrated, the coil device according to the present invention includes a winding portion 1, a support member 2, a buffer layer 3, and an exterior body 4. The support member 2 is a core, a bobbin, or a combination thereof, and can take any shape and structure. The support member 2 shown in the embodiment is a core molded using a ferrite magnetic material or the like, and has a rod-like shape in which the intermediate portion 20 is thinned and the flange portions 21 and 22 are provided at both ends thereof.

つば部21、22には、V字状の溝211、221が形成されている。溝211、221には、端子71、72が係合され、接着剤61、62によって固定されている。端子71、72は、ほぼU字状に湾曲した金属製板状部材である。より詳細には、非磁性で、バネ性のあるもの、例えば、燐青銅板又はSUS 304−CSP等のステンレス系金属板を用いることができる。   V-shaped grooves 211 and 221 are formed in the collar portions 21 and 22. Terminals 71 and 72 are engaged with the grooves 211 and 221, and are fixed by adhesives 61 and 62. The terminals 71 and 72 are metal plate-like members curved in a substantially U shape. More specifically, a nonmagnetic and springy material such as a phosphor bronze plate or a stainless metal plate such as SUS 304-CSP can be used.

巻線部1は、支持部材2の中間部20に導電線5を巻装して構成される。導電線5は、巻線部1からつば部21、22の表面を通って端子71、72へと導かれ、導電線5の端末51、52が端子71、72に半田付け等の手段で接合される。導電線5は、導電芯線を、絶縁皮膜によって被覆した構造のものが用いられる。導電芯線は、例えば銅線である。絶縁皮膜の構成材料としては、ポリウレタンを挙げることができる。   The winding part 1 is configured by winding a conductive wire 5 around an intermediate part 20 of the support member 2. The conductive wire 5 is led from the winding portion 1 through the surfaces of the flange portions 21 and 22 to the terminals 71 and 72, and the terminals 51 and 52 of the conductive wire 5 are joined to the terminals 71 and 72 by means such as soldering. Is done. The conductive wire 5 has a structure in which a conductive core wire is covered with an insulating film. The conductive core wire is, for example, a copper wire. An example of the constituent material of the insulating film is polyurethane.

外装体4は、巻線部1、緩衝層3及び支持部材2を覆っている。外装体4は、熱可塑性絶縁樹脂または熱硬化性樹脂を用い、射出成形等により形成することができる。熱可塑性絶縁樹脂の例としては、液晶ポリマーを挙げることができる。液晶ポリマーは、溶融温度が高く、耐熱性に優れている。熱硬化性樹脂の例としては、ジアリルフタレートを挙げることができる。   The exterior body 4 covers the winding portion 1, the buffer layer 3, and the support member 2. The exterior body 4 can be formed by injection molding or the like using a thermoplastic insulating resin or a thermosetting resin. A liquid crystal polymer can be mentioned as an example of a thermoplastic insulating resin. The liquid crystal polymer has a high melting temperature and excellent heat resistance. Examples of thermosetting resins include diallyl phthalate.

緩衝層3は、イミドシリコン樹脂から構成される。緩衝層3は、外装体4と巻線部1との間に介在し、巻線部1を覆っている。図示実施形態の場合、緩衝層3は、巻線部1の導電線5の間に生じる隙間を埋めており、巻線部1が、イミドシリコン樹脂でなる緩衝層3と一体化されている。更に、緩衝層3は、巻線部1から端子71、72までの領域で導電線5を覆っている。このような緩衝層3は、外装体4の樹脂成形前に、巻線部1及び導電線5の該当部分にイミドシリコン樹脂を塗布することにより形成することができる。   The buffer layer 3 is made of an imide silicon resin. The buffer layer 3 is interposed between the exterior body 4 and the winding part 1 and covers the winding part 1. In the case of the illustrated embodiment, the buffer layer 3 fills a gap formed between the conductive wires 5 of the winding part 1, and the winding part 1 is integrated with the buffer layer 3 made of imide silicon resin. Further, the buffer layer 3 covers the conductive wire 5 in a region from the winding portion 1 to the terminals 71 and 72. Such a buffer layer 3 can be formed by applying an imide silicon resin to the corresponding portions of the winding portion 1 and the conductive wire 5 before the outer body 4 is resin-molded.

上述したコイル装置において、外装体4と巻線部1との間には、緩衝層3が介在する。緩衝層3は、外装体4の樹脂成形の際、導電線5の巻き状態が乱れるのを防止する機能を担う。   In the coil device described above, the buffer layer 3 is interposed between the exterior body 4 and the winding part 1. The buffer layer 3 has a function of preventing the winding state of the conductive wire 5 from being disturbed during the resin molding of the exterior body 4.

仮に、緩衝層3を、シリコンアクリレート絶縁樹脂から構成した場合、シリコンアクリレート絶縁樹脂は、分子構造内にエステル基を含んでいるため、PCT試験で、加水分解作用を受けてカルボン酸に分解され、導電線5の絶縁皮膜に損傷を与える恐れがある。例えば、導電線の絶縁皮膜が侵食を受け、導体芯線が腐食する恐れがある。   If the buffer layer 3 is composed of a silicon acrylate insulating resin, since the silicon acrylate insulating resin contains an ester group in the molecular structure, it is hydrolyzed and decomposed into a carboxylic acid in the PCT test. There is a risk of damaging the insulating film of the conductive wire 5. For example, the insulating film of the conductive wire may be eroded and the conductor core wire may be corroded.

これに対し、本発明では、緩衝層3は、イミドシリコン樹脂から構成される。イミドシリコン樹脂は、分子構造内にエステル基を含まず、加水分解を起こさない。従って、導電線5に損傷を与えることがない。   On the other hand, in this invention, the buffer layer 3 is comprised from an imide silicon resin. The imidosilicon resin does not contain an ester group in the molecular structure and does not cause hydrolysis. Therefore, the conductive wire 5 is not damaged.

更に、イミドシリコン樹脂は溶剤タイプであるから、巻線部1にイミドシリコン樹脂を塗布した後、溶剤を揮発させ、塗布膜でなる緩衝層3の層厚を小さくすることができる。従って、コイル装置のリフロー工程の際、外装体4に対する内部応力を低減し、クラックの発生を抑制することができる。   Furthermore, since the imide silicone resin is a solvent type, after the imide silicone resin is applied to the winding part 1, the solvent is volatilized, and the thickness of the buffer layer 3 made of the coating film can be reduced. Therefore, the internal stress with respect to the exterior body 4 can be reduced during the reflow process of the coil device, and the occurrence of cracks can be suppressed.

更に、イミドシリコン樹脂を採用することにより、信頼性試験におけるインダクタンスの経時変化、例えば、一定の時間にわたりインダクタンス変化率(ΔL/L)を小さく抑えることができる。   Furthermore, by employing an imide silicon resin, it is possible to suppress the change in inductance over time in the reliability test, for example, the inductance change rate (ΔL / L) over a certain period of time.

図示実施形態の場合、巻線部1がイミドシリコン樹脂でなる緩衝層3と一体化されているから、外装体4の樹脂成形の際に導電線5が動くことがない。このため、巻線部1の巻き姿態を良好に保ち、安定したインダクタンス値を確保し得る。   In the case of the illustrated embodiment, since the winding part 1 is integrated with the buffer layer 3 made of imide silicon resin, the conductive wire 5 does not move during the resin molding of the exterior body 4. For this reason, the winding state of the winding part 1 can be kept good and a stable inductance value can be secured.

更に、図示実施形態のコイル装置は、他の回路素子、例えばキャパシタや抵抗などを備えていない構成となっているが、本発明は、そのような構成に限定されることはなく、キャパシタや抵抗などを備えたコイル装置にも適用することができる。   Furthermore, the coil device of the illustrated embodiment has a configuration that does not include other circuit elements, such as a capacitor and a resistor, but the present invention is not limited to such a configuration, and the capacitor and the resistor It is applicable also to the coil apparatus provided with.

次に、実験データを挙げて説明する。   Next, experimental data will be given and explained.

<実験1>
緩衝層の各種構成材料についてPCT試験での耐久性を調べた。実際には、緩衝層構成材料と、導電線の絶縁皮膜との相互作用を考慮し、実仕様に近い状態のサンプルを作製した。詳細は次の通りである。
<Experiment 1>
The durability of the various constituent materials of the buffer layer in the PCT test was examined. Actually, considering the interaction between the buffer layer constituting material and the insulating film of the conductive wire, a sample in a state close to the actual specification was prepared. Details are as follows.

まず、スライドガラス板の表面にポリイミド両面粘着テープを貼り付けた後、粘着テープ上に5つのフェライト基板を一列に配置し、フェライト基板上に2本の導電線を載置した。このようなスライドガラス板を5つ用意し、サンプル1〜5とした。フェライト基板及び導電線は、次のものを用いた。
(1)フェライト基板
材質:Ni−Cu−Zn材
寸法:2.9×2.9×1.0mm
(2)導電線
径0.050mmのUEW
First, after sticking a polyimide double-sided adhesive tape on the surface of the slide glass plate, five ferrite substrates were arranged in a row on the adhesive tape, and two conductive wires were placed on the ferrite substrate. Five such slide glass plates were prepared and used as samples 1 to 5. The following were used for the ferrite substrate and the conductive wire.
(1) Ferrite substrate Material: Ni—Cu—Zn material Dimensions: 2.9 × 2.9 × 1.0 mm
(2) UEW with a conductive wire diameter of 0.050 mm

次に、各サンプル1〜5について、フェライト基板上に2本の導電線を載置した状態で樹脂を塗布し、所定の硬化条件に従って硬化させた。樹脂及び硬化条件は次の通りとした。
Next, for each of Samples 1 to 5, a resin was applied in a state where two conductive wires were placed on the ferrite substrate, and cured according to predetermined curing conditions. The resin and curing conditions were as follows.

なお、サンプル1について、イミドシリコン樹脂としては、シリコンとイミドとの重量組成比が80:20のものを用いた。更に、塗布にあたっては溶剤を加え、固形分と、溶剤との重量組成比を43:7とした溶剤タイプを用いた。 For sample 1, as the imide silicon resin, one having a weight composition ratio of silicon and imide of 80:20 was used. Furthermore, the when a coating solvent was added, and solid matter, the weight composition ratio of the solvent 43: using solvent type was 5 7.

次に、各サンプル1〜5を、PCT条件(121℃、湿度98%、2気圧)に曝し、サンプルの評価を行った。評価方法としては、外観により導電線の変色を調べた。また、評価結果は次の通りである。   Next, each sample 1-5 was exposed to PCT conditions (121 degreeC, humidity 98%, 2 atmospheres), and the sample was evaluated. As an evaluation method, the discoloration of the conductive wire was examined according to the appearance. The evaluation results are as follows.

サンプル4では、導電線が茶色または黒色に変色していた。これは、導電線の絶縁皮膜が侵食され、導電芯線が腐食していることを意味する。   In sample 4, the conductive wire changed to brown or black. This means that the insulating film of the conductive wire is corroded and the conductive core wire is corroded.

また、サンプル5では、エポキシ樹脂の白濁現象が生じた。   In sample 5, the white turbidity of the epoxy resin occurred.

これに対し、サンプル1〜3では、導電線に変色はなかった。従って、絶縁皮膜の侵食や導電芯線の腐食がないものと推定される。   On the other hand, in samples 1 to 3, there was no discoloration of the conductive wires. Therefore, it is estimated that there is no erosion of the insulating film and corrosion of the conductive core wire.

次に、サンプル1〜3について塗布膜の膜厚を調べた。   Next, the film thickness of the coating film was examined for samples 1 to 3.

サンプル2、3で用いたシリコン樹脂では、その物性上、粘度を下げることが難しく、塗布膜の膜厚を小さくすることができなかった。塗布膜の膜厚が大きいと、コイル装置の外装体に対する内部応力が増大し、外装体にクラックが生じる恐れがある。   In the silicon resins used in Samples 2 and 3, it was difficult to reduce the viscosity due to their physical properties, and the thickness of the coating film could not be reduced. When the thickness of the coating film is large, the internal stress on the exterior body of the coil device increases, and there is a risk that a crack may occur in the exterior body.

これに対し、サンプル1で用いたイミドシリコン樹脂では、塗布膜の膜厚を小さくすることができた。塗布膜の膜厚が小さいと、コイル装置の外装体に対する内部応力を低減し、外装体のクラック発生を抑制することができる。   On the other hand, with the imide silicon resin used in Sample 1, the thickness of the coating film could be reduced. When the thickness of the coating film is small, the internal stress on the exterior body of the coil device can be reduced, and the occurrence of cracks in the exterior body can be suppressed.

従って、発明者らは、イミドシリコン樹脂がPCT試験に適合していると判断した。   Therefore, the inventors determined that the imidosilicon resin is compatible with the PCT test.

<実験2>
次に、図1及び図2に示した構成に従い、緩衝層をイミドシリコン樹脂で構成したコイル装置を用意し、PCT試験におけるインダクタンスの経時変化率を調べた。
<Experiment 2>
Next, in accordance with the configuration shown in FIGS. 1 and 2, a coil device having a buffer layer made of imide silicon resin was prepared, and the rate of change with time in the PCT test was examined.

図3は、PCT試験におけるインダクタンスの経時変化率を示すデータである。図3において横軸に投入時間(時間)をとり、縦軸にインダクタンスの変化率(%)をとってある。但し、測定個数nは30である。図3を参照すると、緩衝層をイミドシリコン樹脂で構成したコイル装置は、インダクタンスの変化率ΔL/Lが±0.5%の範囲に抑えられることがわかる。   FIG. 3 is data showing the rate of change with time in the PCT test. In FIG. 3, the horizontal axis represents the charging time (hour), and the vertical axis represents the inductance change rate (%). However, the number of measurements n is 30. Referring to FIG. 3, it can be seen that in the coil device in which the buffer layer is made of imide silicon resin, the inductance change rate ΔL / L can be suppressed within a range of ± 0.5%.

本発明に係るコイル装置の一実施形態を示す部分破断斜視図である。It is a partial fracture perspective view showing one embodiment of a coil device concerning the present invention. 図1に示したコイル装置の正面断面図である。It is front sectional drawing of the coil apparatus shown in FIG. PCT試験におけるインダクタンスの経時変化率を示すデータである。It is data which shows the time-dependent change rate of the inductance in a PCT test.

符号の説明Explanation of symbols

1 巻線部
2 支持部材
3 緩衝層
4 外装体
5 導電線

DESCRIPTION OF SYMBOLS 1 Winding part 2 Support member 3 Buffer layer 4 Exterior body 5 Conductive wire

Claims (3)

支持部材と、巻線部と、外装体と、緩衝層とを含み、自動車に用いられるコイル装置であって、
前記巻線部は、前記支持部材に導電線を巻装して構成され、
前記導電線は、導電芯線の周りにウレタンからなる絶縁皮膜を有し、
前記外装体は、樹脂成形体でなり、少なくとも前記巻線部を覆っており、
前記緩衝層は、前記外装体と、前記巻線部との間に介在し、イミドシリコン樹脂からなり、
前記イミドシリコン樹脂は、シリコンとイミドとの重量組成比が70:30〜80:20の溶剤タイプで溶剤を揮発させた塗布膜であり、80℃/30分+160℃/60分で硬化する特性を有し、
121℃、湿度98%、2気圧の試験条件で行われるPCT試験(プレッシャー・クッカー試験)におけるインダクタンスの経時変化率ΔL/Lが、少なくとも380時間では±0.5%の範囲内にある、
コイル装置。
A coil device including a support member, a winding portion, an exterior body, and a buffer layer, and used in an automobile ,
The winding portion is configured by winding a conductive wire around the support member,
The conductive wire has an insulating film made of urethane around the conductive core wire,
The exterior body is a resin molded body and covers at least the winding part,
The buffer layer is interposed between the exterior body and the winding portion, and is made of imide silicon resin,
The imide silicone resin is a coating film obtained by volatilizing a solvent in a solvent type having a weight composition ratio of silicon and imide of 70:30 to 80:20, and is cured at 80 ° C./30 minutes + 160 ° C./60 minutes. Have
The rate of change with time ΔL / L of the inductance in the PCT test (pressure cooker test) performed under the test conditions of 121 ° C., humidity 98%, and 2 atm is within a range of ± 0.5% at least for 380 hours.
Coil device.
請求項1に記載されたコイル装置であって、前記外装体は、熱可塑性樹脂からなる、コイル装置。   The coil device according to claim 1, wherein the exterior body is made of a thermoplastic resin. 請求項2に記載されたコイル装置であって、前記熱可塑性樹脂は、液晶ポリマーである、コイル装置。   The coil device according to claim 2, wherein the thermoplastic resin is a liquid crystal polymer.
JP2005284751A 2005-09-29 2005-09-29 Coil device Active JP4971617B2 (en)

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JPH0210858A (en) * 1988-06-29 1990-01-16 Mitsubishi Electric Corp Resin-sealed semiconductor device
JPH0287607A (en) * 1988-09-26 1990-03-28 Sumitomo Electric Ind Ltd Resin-molded coil
JPH02224307A (en) * 1989-02-27 1990-09-06 Murata Mfg Co Ltd Inductance element
JPH0512921A (en) * 1991-06-27 1993-01-22 Hanashima Densen Kk Solderable insulated wire
JPH06325938A (en) * 1993-05-11 1994-11-25 Murata Mfg Co Ltd Winding type coil
JP3516374B2 (en) * 1996-09-11 2004-04-05 Tdk株式会社 Electronic components
JP2002056720A (en) * 2000-08-10 2002-02-22 Nippon Shokubai Co Ltd Insulating covering material for winding wire
JP2004335124A (en) * 2003-04-30 2004-11-25 Shin Etsu Chem Co Ltd Impregnant for polyimide silicone electronic component
JP2005093463A (en) * 2003-09-12 2005-04-07 Sanyo Electric Co Ltd Niobium solid electrolytic capacitor
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