JP4879230B2 - 水処理装置 - Google Patents
水処理装置 Download PDFInfo
- Publication number
- JP4879230B2 JP4879230B2 JP2008176503A JP2008176503A JP4879230B2 JP 4879230 B2 JP4879230 B2 JP 4879230B2 JP 2008176503 A JP2008176503 A JP 2008176503A JP 2008176503 A JP2008176503 A JP 2008176503A JP 4879230 B2 JP4879230 B2 JP 4879230B2
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- JP
- Japan
- Prior art keywords
- water
- siphon
- pump
- water level
- treatment apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims description 256
- 230000001954 sterilising effect Effects 0.000 claims description 63
- 238000004659 sterilization and disinfection Methods 0.000 claims description 62
- 230000002265 prevention Effects 0.000 claims description 21
- 230000007246 mechanism Effects 0.000 claims description 20
- 230000006641 stabilisation Effects 0.000 claims description 20
- 238000011105 stabilization Methods 0.000 claims description 20
- 238000005086 pumping Methods 0.000 claims description 9
- 230000006378 damage Effects 0.000 claims description 3
- 238000011144 upstream manufacturing Methods 0.000 description 36
- 238000001914 filtration Methods 0.000 description 24
- 238000000034 method Methods 0.000 description 22
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 12
- 230000008569 process Effects 0.000 description 12
- 238000000746 purification Methods 0.000 description 11
- 238000005406 washing Methods 0.000 description 11
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 9
- 229910052753 mercury Inorganic materials 0.000 description 9
- 230000001681 protective effect Effects 0.000 description 8
- 238000010586 diagram Methods 0.000 description 5
- 238000005374 membrane filtration Methods 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 230000008859 change Effects 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000009287 sand filtration Methods 0.000 description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- 238000005192 partition Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000005856 abnormality Effects 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000007496 glass forming Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000008400 supply water Substances 0.000 description 2
- 0 BCCC(**)*F Chemical compound BCCC(**)*F 0.000 description 1
- 241000894006 Bacteria Species 0.000 description 1
- 102100035353 Cyclin-dependent kinase 2-associated protein 1 Human genes 0.000 description 1
- 241000700605 Viruses Species 0.000 description 1
- 230000015271 coagulation Effects 0.000 description 1
- 238000005345 coagulation Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000249 desinfective effect Effects 0.000 description 1
- 239000003651 drinking water Substances 0.000 description 1
- 235000020188 drinking water Nutrition 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 230000000415 inactivating effect Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Images
Landscapes
- Details Of Reciprocating Pumps (AREA)
- Physical Water Treatments (AREA)
Description
先ず第1に、ろ過池、活性炭ろ過、膜ろ過などの浄水工程では、間欠的にろ過媒体を洗浄する必要がある。多くの場合洗浄水は自身のろ過工程で生成した処理水を使用するため(水道施設設計指針(2000)(社)日本水道協会)、洗浄工程時には後段に供給される処理水は減少するか或いは一旦停止する。このため後段に供給される処理水は周期的に変動するのが通常である。洗浄周期は、砂ろ過や活性炭ろ過では6〜72時間に1回、膜ろ過では15〜120分に1回が一般的である。ろ過装置は数基〜数十基程度の設備が1つの系列で設置され、それらは同時に洗浄を行うのではなく、数分〜数時間毎に順次1基ずつ行われるため、実際には数分〜数時間に1回程度の周期で洗浄が行なわれている。そのためこの周期で処理水の変動が生じることになる。
(1)水位差が充分にない第1水路と第2水路の間においても管水路型の紫外線殺菌処理装置が設置でき、常に安定した紫外線殺菌処理が可能である。
2 下流側開水路
3 仕切壁
4 吸込み管
5 排水管
6 紫外線殺菌処理装置
7 揚水ポンプ
8 サイフォンポッド
9 自動弁
10 水位検知器
11 流量安定化兼逆流防止機構
13 水位計
16 真空破壊弁
17 紫外線ランプ
18 保護管
19 バイパス管路
20 照射槽
21 容器
22 管
25 容器
27 U字管
28 容器
30 天井壁
31 循環配管
32 循環バルブ
Claims (6)
- 第1水路と第2水路と、
前記第1水路から前記第2水路をつなぐサイフォン配管と、
前記サイフォン配管に設けた紫外線殺菌処理装置と、
前記第1水路の水を前記サイフォン配管を通して前記第2水路に揚水する揚水ポンプと、
前記サイフォン配管の前記第2水路への出口に前記第2水路の水面より高い堰で囲まれた空間を備え、該空間内の水面を前記第2水路の水面より高く、且つ一定に維持することにより、前記サイフォン配管内を通る水流量を安定化させると共に、前記第2水路の水が前記サイフォン配管内に流入するのを防止する流量安定化兼逆流防止機構と、
前記第1水路の水位を測定する水位計と、
前記水位計で検出した水位信号によって前記紫外線殺菌処理装置への水量を制御する制御装置と、を設けたことを特徴とする水処理装置。 - 請求項1に記載の水処理装置において、
前記揚水ポンプは全揚程が4m以下の低揚水型のポンプであることを特徴とする水処理装置。 - 請求項1又は2に記載の水処理装置において、
前記制御装置は、前記水位計の水位信号により、前記揚水ポンプの回転数を制御することを特徴とする水処理装置。 - 請求項1乃至3のいずれか1項に記載の水処理装置において、
前記サイフォン配管は、前記紫外線殺菌処理装置の下流側が最も高くなるサイフォン形状となっており、該サイフォン形状の頭頂部に真空破壊弁を設置したことを特徴とする水処理装置。 - 請求項1乃至4のいずれか1項に記載の水処理装置において、
前記制御装置は、前記紫外線殺菌処理装置のランプ破壊などの緊急信号によって真空破壊弁の開閉を制御し、前記サイフォン配管の真空破壊を制御することを特徴とする水処理装置。 - 請求項1乃至5のいずれか1項に記載の水処理装置において、
前記サイフォン配管の前記紫外線殺菌処理装置の下流側から、前記第1水路に水を循環させる循環配管を配置したことを特徴とする水処理装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008176503A JP4879230B2 (ja) | 2008-07-07 | 2008-07-07 | 水処理装置 |
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JP2008176503A JP4879230B2 (ja) | 2008-07-07 | 2008-07-07 | 水処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010012439A JP2010012439A (ja) | 2010-01-21 |
JP4879230B2 true JP4879230B2 (ja) | 2012-02-22 |
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JP2008176503A Active JP4879230B2 (ja) | 2008-07-07 | 2008-07-07 | 水処理装置 |
Country Status (1)
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JP (1) | JP4879230B2 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101196737B1 (ko) | 2011-12-12 | 2012-11-07 | 이경섭 | 수직 수로형 자외선 살균기 |
CN103253803A (zh) * | 2013-05-02 | 2013-08-21 | 国家电网公司 | 一种纯水处理设备 |
CN206109117U (zh) * | 2016-07-26 | 2017-04-19 | 吳達鎔 | 一种初级过滤及储存系统 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0721273Y2 (ja) * | 1992-04-30 | 1995-05-17 | 荏原インフィルコ株式会社 | 液体の殺菌装置 |
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- 2008-07-07 JP JP2008176503A patent/JP4879230B2/ja active Active
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