JP4858106B2 - Color filter defect inspection method - Google Patents

Color filter defect inspection method Download PDF

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JP4858106B2
JP4858106B2 JP2006311851A JP2006311851A JP4858106B2 JP 4858106 B2 JP4858106 B2 JP 4858106B2 JP 2006311851 A JP2006311851 A JP 2006311851A JP 2006311851 A JP2006311851 A JP 2006311851A JP 4858106 B2 JP4858106 B2 JP 4858106B2
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defect
common
defective
color filter
defective pixels
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良太 増田
俊介 山中
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Toppan Inc
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Description

本発明は、カラーフィルタの欠陥検査方法に係り、特に、成長型共通欠陥を容易に検出可能なカラーフィルタの検査方法に関する。   The present invention relates to a color filter defect inspection method, and more particularly to a color filter inspection method capable of easily detecting a growth type common defect.

携帯型機器や薄型テレビなどの高性能化に伴い、液晶ディスプレイの需要が急速に増加しており、コストダウンに対する要求もしだいに高くなっている。カラー液晶ディスプレイは、ガラス基板、液晶材料、偏光板、カラーフィルタなどの材料から構成されているが、なかでもカラーフィルタは、カラー液晶ディスプレイに高精細度や高品質表示が求められる場合に重要な部材として用いられており、製品価格に占める割合が高いため、より一層の低価格化が求められている。   With the high performance of portable devices and flat-screen TVs, the demand for liquid crystal displays is increasing rapidly, and the demand for cost reduction is increasing. Color liquid crystal displays are made of materials such as glass substrates, liquid crystal materials, polarizing plates, and color filters. Color filters are especially important when high-definition and high-quality displays are required for color liquid crystal displays. Since it is used as a member and accounts for a high percentage of the product price, further price reduction is required.

液晶ディスプレイ用カラーフィルタは、透明ガラス基板上に遮光パターンである隔壁(以下、カラーフィルタ基板においては、ブラックマトリクス又はBMとする。)で区切られた領域にR/G/Bの各着色層を配列させて設けることによって構成されている。   The color filter for a liquid crystal display has each colored layer of R / G / B in a region separated by a partition which is a light shielding pattern on a transparent glass substrate (hereinafter referred to as a black matrix or BM in the color filter substrate). It is configured by arranging them.

このような液晶ディスプレイ用カラーフィルタは、その製造工程において、露光マスクの破損や露光マスクに付着した異物に起因して、同一のマスクを用いて製造されたすべてのカラーフィルタに共通して生ずる同一座標欠陥(以下、共通欠陥と呼ぶ)を有することがある。このような共通欠陥を検出する検査装置として、様々なものが知られている(例えば、特許文献1参照)。   Such a color filter for a liquid crystal display is the same in all the color filters manufactured using the same mask due to breakage of the exposure mask or foreign matter adhering to the exposure mask in the manufacturing process. There may be a coordinate defect (hereinafter referred to as a common defect). Various inspection apparatuses for detecting such a common defect are known (for example, see Patent Document 1).

例えば、図6に示すフロー図におけるように、CCDラインセンサを用いた欠陥検査装置を用いて共通欠陥を検出する方法がある。この方法において、欠陥検査装置により共通欠陥が検出されると、オペレータにより欠陥の良品/不良品の判別(欠陥面積の測定)が行われ、不良品については露光機の運転を停止し、使用した露光マスクを洗浄し、又は別の露光マスクと交換し、不良要因を除いて再度露光機の運転を開始する。   For example, as shown in the flowchart of FIG. 6, there is a method for detecting a common defect using a defect inspection apparatus using a CCD line sensor. In this method, when a common defect is detected by the defect inspection apparatus, the operator determines whether the defect is a non-defective product / defective product (measures the defect area). The exposure mask is cleaned or replaced with another exposure mask, and the operation of the exposure apparatus is started again after removing the cause of failure.

許容し得る欠陥が検出されたが、良品と判定されたカラーフィルタは、その欠陥につき良品座標欠陥登録を行い、その後の他のカラーフィルタの検査において同一座標の欠陥は良品欠陥と判断し、特に不良除去処理を行うことなく、検査工程におけるカラーフィルタの流動を続行していた。   An acceptable defect was detected, but a color filter that was determined to be non-defective was registered as a non-defective coordinate for that defect, and in the subsequent inspection of other color filters, a defect with the same coordinate was determined to be a non-defective defect. The flow of the color filter in the inspection process was continued without performing defect removal processing.

しかし、このような従来の方法では、例えば、着色樹脂をコートした際に付着した異物による露光マスクの破損に起因する欠陥が良品欠陥と判断された場合、そのような破損は、何ら解消されない。そのため、露光工程を繰り返していくうちに、そのような欠陥部の異常が広がってしまう場合がある。このような欠陥は、成長型共通欠陥と呼ばれる。しかし、上述の従来の方法では、成長型共通欠陥も同一の座標にあるため良品欠陥と判断されてしまい、その結果、不良品が流出することになる。
特開2005−128026
However, in such a conventional method, for example, when a defect caused by breakage of the exposure mask due to foreign matter adhered when the colored resin is coated is determined to be a non-defective product, such breakage is not eliminated at all. For this reason, there is a case where such an abnormality of the defect portion spreads as the exposure process is repeated. Such a defect is called a growth type common defect. However, in the above-described conventional method, the growth type common defect is also located at the same coordinate, so that it is determined as a non-defective product, and as a result, a defective product flows out.
JP 2005-128026 A

本発明は、上記事情の下になされ、いわゆる成長型共通欠陥を容易に検出可能なカラーフィルタの検査方法を提供することを目的とする。   The present invention has been made under the above circumstances, and an object thereof is to provide a color filter inspection method capable of easily detecting so-called growth-type common defects.

上記課題を解決するため、本発明は、カラーフィルタ基板を欠陥検査装置に供し、共通欠陥を検出する工程、この共通欠陥が良品欠陥であるかどうかを判定し、良品欠陥である場合に良品座標登録する工程、前記良品座標登録された共通欠陥の欠陥画素数を基準共通欠陥画素数として記録する工程、設定された数のカラーフィルタ基板を順次欠陥検査装置に供し、良品欠陥である共通欠陥を検出し、共通欠陥の欠陥画素数を計数し、それらを平均して比較共通欠陥画素数を求める工程、及び前記基準共通欠陥画素数と比較共通欠陥画素数の差分が設定された差分を超えた場合に前記良品座標登録を解除する工程を具備するカラーフィルタの検査方法を提供する。   In order to solve the above-described problems, the present invention provides a color filter substrate to a defect inspection apparatus, detects a common defect, determines whether the common defect is a non-defective product, and determines whether the common defect is a good product coordinate. A step of registering, a step of recording the number of defective pixels of the common defect registered as non-defective coordinates as a reference common defect pixel number, a set number of color filter substrates are sequentially provided to the defect inspection apparatus, and a common defect that is a non-defective defect is Detecting, counting the number of defective pixels of the common defect, and averaging them to obtain the number of comparison common defect pixels, and the difference between the reference common defect pixel number and the comparison common defect pixel number exceeds a set difference In some cases, a method for inspecting a color filter is provided which includes a step of canceling the non-defective coordinate registration.

この場合、前記設定された数であるN枚のカラーフィルタ基板について、1枚目の基板〜N枚目の基板の欠陥画素数を平均して比較共通欠陥画素数を求めた後、順次、1枚のカラーフィルタ基板の検査完了ごとに、2枚目以降のN枚の基板の欠陥画素数を平均して比較共通欠陥画素数を求め、前記基準共通欠陥画素数と比較共通欠陥画素数の差分が設定された差分を超えた場合に、その時点で前記良品座標登録を解除することができる。   In this case, for the N color filter substrates having the set number, the number of defective pixels of the first substrate to the Nth substrate is averaged to obtain the number of comparison common defective pixels, Each time the inspection of one color filter substrate is completed, the number of defective pixels on the second and subsequent N substrates is averaged to obtain the number of comparative common defective pixels, and the difference between the number of reference common defective pixels and the number of comparative common defective pixels When the difference exceeds the set difference, the non-defective coordinate registration can be canceled at that time.

本発明によると、設定された数のカラーフィルタ基板について平均値である比較共通欠陥画素数を求め、それと基準共通欠陥画素数との差分が設定された差分を超えた場合に良品座標登録を解除するようにしているため、従来、良品欠陥として見過ごされていた成長型共通欠陥を容易に検出することが可能となった。   According to the present invention, the number of comparison common defective pixels, which is an average value, is obtained for a set number of color filter substrates, and the non-defective coordinate registration is canceled when the difference between the number and the reference common defective pixel number exceeds the set difference. Therefore, it has become possible to easily detect the growth type common defect that has been conventionally overlooked as a non-defective product defect.

以下、発明を実施するための最良の形態について説明する。   The best mode for carrying out the invention will be described below.

図1は、ダイコート法によるカラーフィルタの製造方法を示す断面図である。ダイコート法によるカラーフィルタの製造方法では、通常、図1(a)に示すように、ガラス基板1上にブラックマトリクス2を形成した後、このブラックマトリクス2により区分された領域に、ダイコータを用いて赤色着色膜3を形成する。次いで、図1(b)に示すように、露光マスク4を通して露光を行った後、現像及びポストベークを行い、図1(c)に示すように、赤色画素5を形成する。   FIG. 1 is a cross-sectional view showing a method for producing a color filter by a die coating method. In a color filter manufacturing method using a die coating method, a black matrix 2 is usually formed on a glass substrate 1 as shown in FIG. 1A, and then a die coater is used in a region divided by the black matrix 2. A red colored film 3 is formed. Next, as shown in FIG. 1B, after exposure through an exposure mask 4, development and post-baking are performed to form red pixels 5 as shown in FIG. 1C.

以下、同様にして、現像により生じた空隙部に、図1(d)に示すように、緑色画素6及び青色画素7を形成した後、透明電極層(ITO層)及びフオトスペーサー(いずれも図示せず)を形成して、カラーフィルタ基板が構成される。   In the same manner, after forming the green pixel 6 and the blue pixel 7 in the gap generated by the development as shown in FIG. 1D, the transparent electrode layer (ITO layer) and the photospacer (both shown in FIG. (Not shown) to form a color filter substrate.

図2は、露光工程において着色樹脂膜に異物が付着した場合に欠陥が発生する現象を示す。即ち、図2(a)に示すように、赤色着色膜3表面に異物8が付着すると、プロキシミティ露光では赤色着色膜3と露光マスク4との間隔が50〜100μmと極めて狭いため、この異物8は露光マスク4に接触して、露光マスク4の露光部にキズ(破損)9または汚れを発生させてしまう。或いは異物8が露光マスク4に付着する場合もある。   FIG. 2 shows a phenomenon in which defects occur when foreign matter adheres to the colored resin film in the exposure process. That is, as shown in FIG. 2 (a), when the foreign matter 8 adheres to the surface of the red colored film 3, the distance between the red colored film 3 and the exposure mask 4 is as narrow as 50 to 100 μm in proximity exposure. 8 comes into contact with the exposure mask 4, and scratches (damage) 9 or stains are generated in the exposed portion of the exposure mask 4. Alternatively, the foreign matter 8 may adhere to the exposure mask 4.

これにより、その後に、図2(b)に示すように、キズ9又は異物を有する同一の露光マスク4を用いて、別のガラス基板1’上のブラックマトリクス2’により区分された領域に形成された赤色着色膜3’を露光し、上述した図1(c)に示すように現像すると、赤色画素に白抜け欠陥が発生してしまう。このような白抜け欠陥は、同一の露光マスク4を用いて露光されたどの基板についても同一座標に発生してしまう。   As a result, as shown in FIG. 2 (b), thereafter, using the same exposure mask 4 having scratches 9 or foreign matters, it is formed in a region separated by a black matrix 2 ′ on another glass substrate 1 ′. When the formed red colored film 3 ′ is exposed and developed as shown in FIG. 1C described above, white defects are generated in the red pixel. Such a white defect is generated at the same coordinate on any substrate exposed using the same exposure mask 4.

図3は、カラーフィルタ基板の欠点検査を行うためのCCDラインセンサ欠陥検査装置を示す図である。図3において、カラーフィルタ基板11は、コンベア12上を搬送されつつ、光源13から照明され、ラインセンサ14により受光して欠陥が検出される。検出された欠陥信号は、ラインセンサ14に接続された画像処理装置により処理され、得られた欠陥位置や欠陥画素数等の検査結果は、画像処理装置に接続されたコンピュータに保存される。   FIG. 3 is a diagram showing a CCD line sensor defect inspection apparatus for inspecting a defect of a color filter substrate. In FIG. 3, the color filter substrate 11 is illuminated from the light source 13 while being conveyed on the conveyor 12, and is received by the line sensor 14 to detect a defect. The detected defect signal is processed by an image processing device connected to the line sensor 14, and the obtained inspection results such as the defect position and the number of defective pixels are stored in a computer connected to the image processing device.

図2(b)に示すような同一の露光マスクを用いて複数のカラーフィルタ基板について連続して同一の位置に発生した欠陥は、図3に示す検査機により共通欠陥として認識され、良品座標登録される。この際に、この欠陥に対し、「共通欠陥フラグ」、「基板内X座標」、「基板内Y座標」、「欠陥画素数」が記録される。   Defects that occur continuously at the same position on a plurality of color filter substrates using the same exposure mask as shown in FIG. 2B are recognized as common defects by the inspection machine shown in FIG. Is done. At this time, “common defect flag”, “in-substrate X coordinate”, “in-substrate Y coordinate”, and “number of defective pixels” are recorded for this defect.

なお、欠陥画素数とは、図4において、(a)に示す欠陥面積(μm)に対し、(b)に示す、CCDカメラの映像素子単位で認識された欠陥面積(画素数)のことである。 Note that the number of defective pixels in FIG. 4 refers to the defective area (number of pixels) recognized for each image element of the CCD camera shown in (b) with respect to the defective area (μm 2 ) shown in (a). It is.

オペレータは、検査装置内の顕微鏡等を利用して欠陥の良否判断をし、製品品質に影響のない欠陥であれば、その部位に対し良品座標登録を行う。このとき、登録データとして「基板内X座標」、「基板内Y座標」、「欠陥画素数」を記録する。この欠陥画素数を「基準共通画素数」と呼ぶ。   The operator determines whether or not the defect is good by using a microscope or the like in the inspection apparatus, and if the defect does not affect the product quality, registers the good product coordinates for that part. At this time, “in-substrate X coordinate”, “in-substrate Y coordinate”, and “number of defective pixels” are recorded as registration data. This defective pixel number is referred to as “reference common pixel number”.

その後、検査装置は、複数のカラーフィルタ基板について順次、検査を行い、良品座標登録された座標に対し欠陥が検出された場合、良品欠陥と判断し、異常検知せずにそのまま基板の処理工程を続行する。このようにして共通欠陥の発生時に欠陥を良品判断した場合、従来の対応法では、着色樹脂のコート時に表面に付着した異物やそれにより生じた露光マスクの破損等は、事実上解消されてはいない。このため、生産を続けていくうちに欠陥部の異常状態が広がって、良品欠陥のレベルを超えて不良品レベルとなる場合がある。しかし、良品座標登録をされた欠陥は、良品扱いされるため発見できず、不良品流出を促してしまう。これは、上述した成長型共通欠陥である。   After that, the inspection apparatus sequentially inspects the plurality of color filter substrates, and if a defect is detected with respect to the coordinates registered in the good product coordinates, it is determined as a good product defect, and the substrate processing process is performed as it is without detecting an abnormality. continue. In this way, when a defect is determined to be a good product when a common defect occurs, the conventional countermeasures can effectively eliminate foreign matter adhering to the surface during coloring resin coating or damage to the exposure mask caused thereby. Not in. For this reason, as the production continues, the abnormal state of the defective part spreads, and the defective product level may be exceeded beyond the non-defective product level. However, defects that have been registered as non-defective coordinates cannot be found because they are handled as non-defective products, and will lead to the outflow of defective products. This is the growth type common defect described above.

本実施形態では、図5に示すように、共通欠陥について良品座標登録を行い、「基準共通画素数」を記録した後、後続の基板について引き続き検査を行い、対象となる共通欠陥を検出すると、設定された数であるN枚の基板ごとにその欠陥画素数を計数し、N枚の基板(1枚目の基板〜N枚目の基板)についての欠陥画素数を平均して、「比較共通欠陥画素数」を算出する。また、引き続き1枚の検査完了ごとに、それ以前のN枚の基板(2枚目の基板〜N+1枚目の基板)について、更にN枚の基板(3枚目の基板〜N+2枚目の基板)について、順次、「比較共通欠陥画素数」を算出する。   In the present embodiment, as shown in FIG. 5, after performing non-defective product coordinate registration for the common defect and recording the “reference common pixel number”, the subsequent substrate is continuously inspected to detect the target common defect. The number of defective pixels is counted for each of N substrates, which is a set number, and the number of defective pixels for N substrates (the first substrate to the Nth substrate) is averaged. The number of defective pixels is calculated. Further, every time one inspection is completed, N substrates (third substrate to N + 2th substrate) are further added to the previous N substrates (second substrate to N + 1th substrate). ), The “comparative common defective pixel number” is calculated sequentially.

そして、「基準共通欠陥画素数」と「比較欠陥画素数」を差分し、設定された数値以上の差分値が認められたら、その時点で「成長型共通欠陥」と判断し、良品登録を解除し、異常検知を行う。   Then, the difference between the “reference common defective pixel count” and the “comparative defective pixel count” is found, and if a difference value greater than the set value is recognized, it is judged as a “growing common defect” and the non-defective product registration is canceled And detect anomalies.

以上のようにして、着色樹脂のコート時に表面に付着した異物による露光マスクの破損に起因する「成長型共通欠陥」が検出されると、露光マスクは洗浄して異物を除去して再使用するか、又は別の露光マスクと交換される。   As described above, when a “growth type common defect” due to the damage of the exposure mask due to the foreign matter adhering to the surface during the coating of the colored resin is detected, the exposure mask is washed to remove the foreign matter and reused. Or replaced with another exposure mask.

このようにして、本実施形態に係る欠陥検出方法によると、従来、良品欠陥として見過ごされていた「成長型共通欠陥」を容易に検出できるため、良質のカラーフィルタ基板を歩留まりよく製造することが可能である。   As described above, according to the defect detection method according to the present embodiment, a “growth type common defect” that has been conventionally overlooked as a non-defective defect can be easily detected, so that a high-quality color filter substrate can be manufactured with a high yield. Is possible.

本発明の一実施形態に係るダイコート法によるカラーフィルタの製造工程を示す断面図である。It is sectional drawing which shows the manufacturing process of the color filter by the die coat method which concerns on one Embodiment of this invention. ダイコート法によるカラーフィルタの製造工程における成長型共通欠陥の発生を説明する断面図である。It is sectional drawing explaining generation | occurrence | production of the growth type common defect in the manufacturing process of the color filter by the die coat method. 本発明の一実施形態に用いるCCDラインセンサ欠陥検査装置を示す図である。It is a figure which shows the CCD line sensor defect inspection apparatus used for one Embodiment of this invention. 欠陥画素数を説明する図である。It is a figure explaining the number of defective pixels. 本発明の一実施形態に係る成長型共通欠陥の検出方法を説明する図である。It is a figure explaining the detection method of the growth type common defect which concerns on one Embodiment of this invention. 従来のCCDラインセンサを用いた欠陥検査装置を用いて共通欠陥を検出する方法を示すフロー図である。It is a flowchart which shows the method of detecting a common defect using the defect inspection apparatus using the conventional CCD line sensor.

符号の説明Explanation of symbols

1,1’…ガラス基板、2,2’…ブラックマトリクス、3,3’…赤色着色膜、4…露光マスク、5…赤色画素、6…緑色画素、7…青色画素、8…異物、9…キズ、11…カラーフィルタ基板、12…コンベア、13…光源、14…ラインセンサ。   DESCRIPTION OF SYMBOLS 1,1 '... Glass substrate, 2, 2' ... Black matrix, 3, 3 '... Red coloring film, 4 ... Exposure mask, 5 ... Red pixel, 6 ... Green pixel, 7 ... Blue pixel, 8 ... Foreign material, 9 ... scratches, 11 ... color filter substrate, 12 ... conveyor, 13 ... light source, 14 ... line sensor.

Claims (2)

カラーフィルタ基板を欠陥検査装置に供し、共通欠陥を検出する工程、この共通欠陥が良品欠陥であるかどうかを判定し、良品欠陥である場合に良品座標登録する工程、前記良品座標登録された共通欠陥の欠陥画素数を基準共通欠陥画素数として記録する工程、設定された数のカラーフィルタ基板を順次欠陥検査装置に供し、良品欠陥である共通欠陥を検出し、共通欠陥の欠陥画素数を計数し、それらを平均して比較共通欠陥画素数を求める工程、及び前記基準共通欠陥画素数と比較共通欠陥画素数の差分が設定された差分を超えた場合に前記良品座標登録を解除する工程を具備することを特徴とするカラーフィルタの欠陥検査方法。   The step of supplying the color filter substrate to a defect inspection apparatus and detecting a common defect, the step of determining whether or not the common defect is a non-defective product, and the step of registering the good product coordinate when it is a good product defect, the common product coordinate registered The process of recording the number of defective pixels as a reference common defective pixel number, the set number of color filter substrates are sequentially applied to the defect inspection device, the common defect that is a non-defective product is detected, and the number of defective pixels of the common defect is counted And calculating the number of comparison common defective pixels by averaging them, and the step of canceling the non-defective coordinate registration when the difference between the reference common defective pixel number and the comparison common defective pixel number exceeds a set difference. A defect inspection method for a color filter, comprising: 前記設定された数であるN枚のカラーフィルタ基板について、1枚目の基板〜N枚目の基板の欠陥画素数を平均して比較共通欠陥画素数を求めた後、順次、1枚のカラーフィルタ基板の検査完了ごとに、2枚目以降のN枚の基板の欠陥画素数を平均して比較共通欠陥画素数を求め、前記基準共通欠陥画素数と比較共通欠陥画素数の差分が設定された差分を超えた場合に、その時点で前記良品座標登録を解除することを特徴とする請求項1に記載のカラーフィルタの欠陥検査方法。   For the N color filter substrates that are the set number, the number of defective pixels of the first substrate to the Nth substrate is averaged to obtain the number of comparative common defective pixels, and then one color is sequentially added. Each time the inspection of the filter substrate is completed, the number of defective pixels on the second and subsequent N substrates is averaged to obtain the number of comparative common defective pixels, and the difference between the number of reference common defective pixels and the number of comparative common defective pixels is set. 2. The color filter defect inspection method according to claim 1, wherein when the difference is exceeded, the non-defective coordinate registration is canceled at that time.
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