JP4842895B2 - Fluid processing apparatus and fluid processing method - Google Patents

Description

  The present invention relates to a fluid processing apparatus and a fluid processing method having both electrolysis using pulsed plasma and ultrafine decomposition using high-pressure water.

  In recent years, with nanobubbles / electrolysis / plasma ozone generators, high internal pressure is applied to water, or the surface of water is activated by ultrafine ionized bubbles (hereinafter also referred to as “nanobubbles / micronanobubbles”) or electrolyzed water. A device that can generate hydroxyl radicals on the surface of water by corona discharge plasma and use the generated water for cleaning, sterilization, purification of polluted water, utilization of fatigue recovery by living organisms, and chemical reactions. Proposed.

Patent documents 1, 2, 3, 4 and the like are known as nanobubble generators.
In the IC cleaning line that requires a high degree of cleaning, the present situation is that bacteria in the atmosphere are sterilized and purified by using ozone water or by a corona plasma discharge method.

Patent Document 1 is a combination of an electrolyzer and an ultrasonic generator, and the bubbles of oxygen and ozone generated by the electrolyzer are crushed by ultrasonic vibration from the ultrasonic generator provided at the bottom. , Refinement and generation of nanobubbles.
Patent Document 2 is an apparatus that generates micro-nano bubbles by sucking and mixing / stirring air from an oxygen enricher by the discharge force of a pump, in which about 70% nitrogen is mixed with 30% oxygen. Therefore, the purification / sterilization effect is inferior.
In Patent Document 3, in place of the electrolysis apparatus of Patent Document 1, only an ultrasonic generator is placed in one place in the water tank, one place in the microbubble generator, and two places in the supply pipe, for a total of five places. Since air is mixed in the device, the ultrasonic generator cannot be used for a long period of time, and air mixing is inferior in purification and sterilization effect.
Patent document 4 improves the purification treatment efficiency of raw water by combining microbubble ionization by cavitation with a high-pressure nozzle and a hydrogen peroxide generator. However, there is little generation of hydroxyl radicals by cavitation of water, Only dissolved oxygen causes little microbubble ionization, and negative ionization is generated outside, but conversely, positive is generated inside, and magnetic charge ionization is also inferior.
Other nanobubbles / micronanobubbles are also generated by rotating the pump by taking in air, and charging is performed by attaching a permanent magnet to the rotating part or shearing rotation at high speed. There is also a problem of shortening.
Patent Document 5 is a plasma sterilization apparatus for soft drinks having a frequency of 15 Hz and an output of 10 KV using a rod-shaped stainless steel electrode with plasma formed as a cylindrical tube and a negative electrode using a rod-like stainless steel. This is a high-energy sterilization method rather than an electromagnetic wave treatment because it is high and is not a pulse plasma system.
Patent Document 6 performs charge aggregation with a low-frequency ultrasonic oscillator of 50 KHz or less, mixes negatively charged organic substances with a neodymium magnetic force and mixing of neodymium element blades, and treats a negatively charged organic substance with a high frequency electromagnetic wave of 3M to 300 MHz as a countermeasure against bad odor. It is a device that deodorizes with a sonic oscillator and generates ozone with a high pulse voltage plasma of 60 KV to perform nitrogen treatment, decolorization, and sterilization. It is a very dangerous processing method.
Therefore, an apparatus for purifying and sterilizing with a pulse plasma high frequency electromagnetic wave device is not known.

JP 2004-121962 A JP 2006-43636 A JP 2006-289183 A JP 2007-98217 A JP 2003-340454 A JP 2001-252665 A

In the conventional nano bubble / micro nano bubble device, there is a problem of cost increase of the device due to electrolysis ability and enlargement of the ultrasonic generator, complication of the entire device, and increase of power consumption.
In addition, these devices cannot be expected to have a long service life (life), and are not preferable from the viewpoint of running cost.
As a whole of the nano bubble / micro nano bubble device, the purification and sterilization treatment is promoted, but the treatment effect is effective when used in combination with other ozone, oxygen, hydrogen peroxide, microorganisms, etc., and the treatment effect is low by itself.

  In addition, plasma electrolysis can be efficiently processed even during electrolysis, but there is no apparatus that can perform a large amount of processing continuously by arranging electrodes directly in water.

Many developments of nanobubble / microbubble devices have been proposed, but the current situation is that they are not completely compatible with the improvement of high concentrations, difficult-to-decompose organic substances, and harmful substances due to environmental pollution. The situation is not progressing.
Since environmental pollution has advanced to the sea area, it has spread to international pollution caused by ballast water of ships such as cargo ships and tankers, and has reached the stage where it is necessary to perform seawater purification and sterilization of ballast water.

  In view of the above problems, the object of the present invention is to provide a high-frequency pulsed plasma that can be processed with a nanobubble / microbubble device or electrolysis, in which purification / sterilization of high concentrations, hardly decomposed organic substances, and harmful substances is still insufficient. An object of the present invention is to provide a fluid processing apparatus and a fluid processing method using an electromagnetic wave processing apparatus.

The fluid treatment apparatus according to the present invention in order to achieve the above object, a pulsed plasma high circumferential electromagnetic wave treatment apparatus, while sucking the pulsed plasma treatment water treated in the pulsed plasma high circumferential electromagnetic wave treatment apparatus, for high-pressure injection 2 A first high-pressure spraying device having a fluid mixing nozzle, wherein the pulse plasma high-frequency electromagnetic wave processing device has a plasma cathode disposed on the innermost side in a cylindrical pulse plasma processing chamber made of an insulating material; A plurality of SUS tubes having a large inner diameter are arranged concentrically in sequence, and a plasma anode tube is arranged on the outermost side. A pulse plasma that is connected so as to flow out in an inclined direction and is plasma-treated on the upper side of the plasma cathode side of the pulse plasma treatment chamber. An outlet pipe for treated water is connected, and a pulse plasma transmitter is provided for generating pulsed plasma between the plasma anode pipe and the plasma cathode. A high-pressure water inflow pipe having an orifice larger than the diameter of the high-pressure water nozzle at the tip of the high-pressure water nozzle that injects the pipe toward the upstream side of the raw water, and the pulse in the middle of the high-pressure water inflow pipe It is a two-fluid mixing nozzle connected to a fluid suction pipe for sucking plasma treated water .
Microwave to millimeter wave pulsed plasma high frequency generates impact electromagnetic wave, temperature change, vibration, pressure, and induces chemical reaction. Ultrafine and ionize organic substances in water and contained harmful substances. Hydroxyl radical generated from water by pulse plasma radio frequency oxidizes and reduces the decomposed substance, releases it as gas and water, and oxidizes and precipitates as metals.
Further, the hydroxyl radicals generated at the pulse plasma high frequency decompose the raw water, and the surplus hydroxyl radicals generated become plasma treated water containing oxygen and nanobubbles, and the two fluids of the first high-pressure injection device provided in the raw water pipe Cavitation is generated by high-pressure injection from the nozzle, and high-pressure injection of 7 times or more of plasma-treated water of high-pressure water using the suction force to generate more hydroxyl radicals and increase the decomposition power I can do it.

The fluid treatment apparatus according to the present invention includes a second high-pressure injection device for further processing the treated water obtained by the first high-pressure injection device, and the second high-pressure injection device is a treatment obtained by the first high-pressure injection device. With respect to the main pipe through which water passes, the nozzle hole opened in the shape of a truncated cone whose front side is expanded is arranged in a spiral shape around four holes or more so as to be jetted toward the upstream side of the treated water, High-pressure water is jetted from the nozzle hole .
The reason why the second high-pressure injection device is arranged after the first high-pressure injection device is for the purpose of further mixing and decomposing water decomposed by the first high-pressure injection device. The downstream suction force has a high flow rate of the raw water, and the water pressure rises due to the high-pressure water jet, so there is no effect on resistance loss.
In addition, when nozzles having four or more holes are arranged spirally along the flow at intervals of 1 cm, uniform decomposition and mixing can be performed, and decomposition and oxidation precipitation can be performed even at the final discharge destination, so that reliable processing can be performed in a short time.
As the water used for the high-pressure water, the treated discharged water is returned.
The presence of bubbles as nanobubbles has a nozzle shape set in an environment of 20 atm or higher, but it can be generated by jetting and colliding high-pressure water of 80 atm to the tube in order to increase cavitation.
The cavitation can be generated by arranging a plurality of nozzles and injectors according to the processing target and passing high-pressure water.

  Depending on the quality of the raw water, the amount of pulsed plasma treatment water can be set to a total amount or a part, or a valve (branched from the raw water after the water pump) can be set according to the appropriate amount. Appropriate setting of the number of corresponding first high-pressure injection devices and the number of second high-pressure injection nozzle locations is possible.

  The apparatus and the microbial treatment can be used in combination, but it is characterized by a purification treatment that can be carried out alone and in a short time, and does not require odor control.

The fluidic device according to the present invention contains a minute amount of nano-oxygen without using or generating harmful substances or air such as current nano-bubbles or plasma treatment even when purifying and sterilizing in aquaculture and other applications. Is possible.
In addition, the purification and sterilization of seawater is a combination of treatments. First, purification of organic substances, surfactants, etc. is carried out with this device, and chemicals are used by carrying out sterilization with the fluid device according to the present invention in the subsequent process. Safe processing is not possible.

The most effective pulse plasma is to have a pulsed plasma processing chamber in which the inside of the pulsed plasma electrode is a pulsed plasma processing chamber, and a swirling flow is generated from the lower part of the pulsed plasma processing chamber and flows out from the upper part. The process fluid can be directly flowed into the processing chamber, allowing continuous flowing water treatment in a tube shape. The pulse plasma processing chamber may be horizontal, but as a method of separating other exclusions such as hydrogen, it is vertical and the outermost The tube is the anode, the cathode is placed in the center, the diameter is increased from 25mm to 25mm, and a minimum of 2 or more tubes with a spacing of 11.5mm, 4 fittings are provided, and each tube is placed in an insulated state. To do.
Depending on the amount of treatment and water quality, the tube diameter is increased from the diameter of the cathode and the height is set to 20 cm or more and 2 m or less, or by increasing the apparatus, it becomes possible to cope with the increase in the amount of treatment and water pollution. .
The inside of the pulsed plasma electrode is a pulsed plasma processing chamber, branched from the end of the raw water pipe, and the inflow pipe mounting position to the processing chamber is located 45 ° to 60 ° in an eccentric manner from the center of 90 ° and rises uniformly. Can be processed.
The outflow pipe is taken out from a position facing the inflow pipe by 180 °, and adjustment is performed by a valve to stop only a part of the processing or to perform the whole amount plasma processing.
The plasma processing chamber can be reduced in size by determining whether to perform the whole or a part of the plasma processing according to the quality of the processing fluid.

The inner tube material of the pulse plasma electrode is an austenitic stainless steel NSSC270 (SUS312 or higher), which is 1.5 times as much seawater and chemical product as SUS312L, and does not use other ceramics because of ultrasonic vibration.
The tube is fixed using insulating, heat-resistant PE, PVC, or hard rubber.
To protect the main body, use heat-insulating pipes such as heat-resistant PE / PVC / fluorine resin and heat-resistant insulating packing.
For the pipes, the raw water inflow pipe, the treatment outflow pipe, the high-pressure nozzle suction side pipe, the overflow pipe, the drain pipe, and the hydrogen-air mixed exhaust pipe are insulated with a heat-resistant PE pipe.
Pulse plasma power supply can control voltage from 200V single phase isolation transformer with 0-260V variable transformer and convert with DC converter, rectify with filter capacitor with variable high frequency from 100KHz to 2.5GHz, current 0 to 6A You can select the voltage, current, and pulse frequency according to the water quality with this transmitter.
High-pressure cavitation and plasma treatment Mixing two-fluid nozzle that sucks high-concentration oxygen-containing water as the first high-pressure nozzle injector at the starting point of the raw water inflow, at a predetermined angle with respect to the flow, if necessary, hydroxyl radicals by cavitation and water hammer Is further generated to compensate for decomposition, and a large amount of nanobubbles can be mixed depending on the water quality.

In the second high-pressure injection device, a plurality of high-pressure nozzle injectors may be spirally disposed in the fluid main pipe.
For example, the bubble generated in the first, decomposed gas or molecule, and undecomposed molecule can be finely mixed and decomposed by the second high pressure nozzle injector at a predetermined angle with respect to the flow center, or downstream of the flow center. It is preferable that the mixture is finely sprayed by cavitation and water hammer by high-pressure jetting from four or more places rotated 45 ° to 90 ° at intervals of 1 cm.
The first high-pressure nozzle is based on the injection force of high-pressure water, and a filter is provided on the suction side of the high-pressure water in order to return fresh water or treated water discharge water. To prevent clogging, it is recommended to automatically prevent clogging with an auto needle (cylinder).

The second high-pressure nozzle injector may be provided with a 0.1 mm microfilter immediately before the nozzle aperture tube, and with a backwash / washable structure to prevent clogging and a cleaning drain valve or tube for the aperture tube. .
A suction / pressurization type pump is arranged after the second high-pressure injection pipe to suck in raw water and pump it into a discharge tank or a pulse plasma processing chamber. Can be sorted as needed.

  In the fluid treatment method according to the present invention, the fluid is subjected to pulsed plasma high-frequency electromagnetic wave treatment, so that the organic and inorganic substances contained in the fluid are ultrafine and ionized or radicals are generated, and this pulsed plasma treated water is mixed in two fluids. It is characterized by disassembling by cavitation with suction and high pressure injection using a nozzle. High pressure water is injected by a high pressure nozzle injector to fluid processed using a two-fluid mixing nozzle, and further refined by cavitation and water hammer. And disassembling.

  High-temperature room-temperature pulse plasma electrolysis, ultrasonic cavitation, and high-pressure nozzle cavitation as described above can be performed, so it is possible to remove difficult-to-decompose organic substances and harmful substances, so the entire atmosphere, soil, rivers, lakes, and freshwater・ Purification and sterilization is possible up to seawater (the conventional nanobubble device, electrolysis device and corona discharge plasma treatment device are limited in terms of treatments, amount, application, and effects). Since a processing system according to the object, quantity, and application can be constructed, it can be used from home to all industries.

  The treatment apparatus according to the present invention does not require chemicals such as ozone and hydrogen peroxide and a generation apparatus, and also requires an ineffective magnet, a high oxygen concentration separation membrane apparatus, an ultrasonic vibration element, and a simple electrolysis apparatus. Therefore, the purification process can be performed only with the apparatus.

  The treatment apparatus according to the present invention is not particularly concerned with the quality and quantity of raw water, and can treat continuously and from a small scale to a large scale.

  The best mode for carrying out the present invention will be described below with reference to the drawings.

FIG. 1 schematically shows the configuration of the apparatus (a partial detailed view is shown in FIG. 9), and FIG. 8 is a flowchart.
The high-pressure jet mixed with the plasma treated water sucked from the high-pressure water of the two-fluid nozzle 64 by the first high-pressure jet device 2 (containing a large amount of oxygen in the plasma treatment device) to the treated water pumped from the raw water tank 1 As a result, a large amount of hydrogen ions (H +) and hydroxide ions (OH−) are generated by cavitation, and molecules of raw water are refined by a crushing force by impact to perform a decomposition treatment.
Further, by injecting high-pressure water from a plurality of nozzle holes with the second high-pressure injection device 3, cavitation generation and impact force pressure solution that promote decomposition and mixing that could not be performed with the first high-pressure injection device 2 are performed, and decomposition and mixing are performed. I do.
A water supply pump 4 is provided after the second high-pressure injection device, and supplies water to the plasma high-frequency electromagnetic wave processing device 5 and the decomposition and precipitation tank 6.
The pulse plasma high-frequency electromagnetic wave treatment device 5 which is the greatest feature of the present invention is the ionization decomposition / ultrasonic decomposition of water molecules of raw water and all the molecules contained in the raw water by pulse plasma electromagnetic waves. The generated hydroxide ion (OH-) and hydrogen ion (H +) act, and the hydroxide ion (OH-) oxidizes and decomposes organic matter and treats it to carbon dioxide (CO ₂ ) and water (H ₂ O). Further, the water molecules are separated into hydroxide ions (OH−) and hydrogen ions (H +) to amplify the treatment power.
Hydrogen ions (H +) are bonded to separated hard-decomposable chlorine ion (CL-) molecules to generate hydrochloric acid (HCL), or hydrogen substitution acts.
The surplus hydroxide ions (OH-) become oxygen ions (O-), oxygen (O ₂ ), and hydrogen (H ₂ ).
Since hydrogen (H ₂ ) has a low specific gravity, most of it is released to the atmosphere in a short time, and oxygen ions (O—) and oxygen (O ₂ ) are contained in water by ultrasonic force.
Plasma treatment water containing high concentrations of nano-level oxygen ions (O-) and oxygen (O ₂ ) is jetted from the first high-pressure jetting device 2 to the raw water to treat the raw water.

The material of the pipes 52 to 54 used in the pulse plasma processing chamber 51 is NSSC 270 (austenitic stainless steel) equivalent to SUS312L, which has pitting corrosion resistance, chemical resistance, and seawater resistance. An inner diameter φ25 is arranged as the plasma negative electrode 52, an inner diameter φ50, an inner diameter φ80, and an inner diameter φ100 of 53 are arranged toward the outside, and an inner diameter φ125 is arranged as the plasma anode 54 in the outermost part.
The heights of the innermost portions 52 and 53 are 200 mm, and the outermost portion 54 is 50 mm lower from the lower surface of 52 and 50 mm longer from the upper surface to a total length of 300 mm.

Each tube is fixed with hard rubber (ebonite) 55 as shown in FIG.
The bottom is a PVC water-stopping material 57 of MSC 10 cm long screw bolt NSSC270 (austenitic stainless steel) welded to the bottom of the cathode, and the internal thread M12 has an inner diameter φ50 and a hard rubber 56 of length 50 mm. Screw in and keep distance from the outermost anode to prevent short circuit.
Although the bottom portion has an arc shape, it may be fixed in a flat shape with an insulating material such as PVC or heat-resistant PE material.
The penetrating part 57 is made of PVC water-stopping material and fixed with washers and nuts. The base part penetrating part 58 is also provided with rubber packing and protective tube bottom between the upper and lower foundations and two parts inside the foundation, rubber packing and washer. -Fix with a nut, and place and fix the cathode ring terminal 60 between the nut.
The material of the washer / nut is SUS316L.

  The base / protection tube / upper lid 59 of the pulse plasma processing chamber is made of PVC / PE / fluororesin / heat resistant HIVP tube of φ150, and the base / upper two portions are fixed with stainless steel bands.

The piping around the pulse plasma processing chamber is made of PVC insulating material, and the inflow pipe 61 is arranged with the anode bottom of the outermost surface inclined 45 ° from the center, and the water flow is uniformly increased by rotating the inflow. In order to adjust the flow rate, one stainless steel ball valve is arranged outside, and all other piping materials are PVC or PE pipes.
The outflow pipe 62 is arranged with the uppermost part of the pipe 53 at the bottom of the outflow pipe, penetrates the plasma anode 54 and the protective pipe, and is partially branched to the water absorption side of the first high-pressure injection device 2 in the middle. Pipe connection to the decomposition sedimentation tank 6.
Stainless steel ball valves are placed at a total of four locations before exiting the protective tube, a partial branching position on the water absorption side of the first high-pressure injection device 2, a branching position of the piping to the decomposition and precipitation tank 6, and a flow before obtaining the flow of the decomposition and precipitation tank 6. Other piping materials are insulated PVC or PE pipes.
The drainage / overflow pipe 63 is taken out from the lowermost part of the protective pipe, and a part thereof is piped to the decomposition / precipitation tank 6 and a part is piped so that the drainage can be drained into the drainage groove.
Stainless steel ball valves are arranged at a total of three positions before the protection pipe is exited, the drainage branching position, and the flow of the decomposition and sedimentation tank 6 are obtained, and other piping materials are piped with insulated PVC or PE pipes.
The two-fluid nozzle 64 shown in FIG. 3 is arranged at the center of the innermost part, one side is connected to a pipe 65 from high-pressure pump water, and one side is connected to a pipe 66 that can take in external air from the opposite direction.
A stainless steel ball valve is arranged at the position where the pipe comes out, the pipe is made of SUS316L material up to the ball valve, and the pipe 66 is insulated by a high-pressure rubber hose.
This nozzle is arranged for the purpose of defoaming excess bubbles generated by the pulse plasma treatment.
A pipe 67 is taken out as an exhaust hole from the upper cover of the protective tube to the water supply tank, and the generated hydrogen and gas are mixed with the external air and exhausted by the intake force during defoaming.

  A ring anode terminal of SUS216L is similarly connected to the uppermost portion of the plasma anode tube 54 with a bolt and nut of SUS216L, and one external connection terminal 50 connected to the pulsed plasma transmitter 21 is provided. Insulate and protect external connection terminals.

The pulse plasma transmitters and their electrical systems are shown in FIGS.
200V-3 core and 100V-single phase are drawn by the power supply of the switchboard 12, and the control power supply of the pulse body receives power from the outlet from 100V-single phase.
The pulse plasma generation power source is connected to the isolation transformer 10 with two wires from the 200V-3 core breaker of the switchboard 12 and after insulation prevention, the two wires to the variable transformer 11 are connected to the converter 20 that converts AC to DC. Wiring at the center and wiring connection to the variable pulse plasma transmitter 21 according to the output current with two cores, in a voltage range of 0V to 260V and a frequency of 100KHz or more, 2.5GHz to match the water quality and conductivity While adjusting as follows, the wiring is connected to the anode and the cathode of the pulse plasma high-frequency electromagnetic wave processing apparatus 5, and the power is set so as to be suitable for processing.

As shown in FIG. 3, details of the first high-pressure injection device 2 are provided with a high-pressure water inflow pipe 22 from one side and a fluid suction pipe 23 from the opposite side, and 3 ° or 93 ° from a right angle upstream from the high-pressure nozzle 24 to the upstream of the raw water. Attach a high-pressure injection device to inject.
The structure of the main body of the first high-pressure injection device 2 is that a needle 26 is provided in the high-pressure water nozzle 24 to prevent clogging, and when the water pressure increases using a spring in the auto cylinder 27, the high-pressure nozzle enters the high-pressure nozzle. Is automatically pushed out to prevent or prevent clogging.
The effect of cavitation generation is determined by the relationship between the orifice 28 and the high-pressure water nozzle diameter, and is 0.3 to 0.5 mm larger than the high-pressure water nozzle diameter.
This has the effect of increasing the force of automatically sucking in the plasma treated water and other fluids in the flow guide chamber 25 automatically. However, due to the cavitation that occurs, the metal breaks faster, so it is highly cavitation. An industrial diamond with a thickness of 3 mm that can withstand the hole is processed and fixed with a cap 29.
As for the cavitation generation effect, it is optimal to set the interval between the orifice 28 and the high pressure water injection tip position to 1 mm to 2 mm, and this interval automatically causes the plasma treated water and other fluids more than 10 times the high pressure water to be automatically generated. It is possible to increase the power to suck.
High-pressure water, plasma-treated water, and other fluid inflow pipes are connected by a nipple 30, and thereafter connected by a ball valve 31, a nipple 30, and a high-pressure hose joint (female thread) integrated high-pressure hose 32.
These pipes are all made of SUS304 and have a pressure resistance of 10 MPa.

As shown in FIGS. 6 and 7, the second high-pressure water injection device 3 injects high-pressure water from 4 holes or more through nozzle holes 33 and finely decomposes and mixes by cavitation at 45 ° to 90 ° at 1 cm intervals. It arrange | positions spirally and makes it inclination 93 degrees so that it may go upstream with respect to a flow.
The material is the same as the orifice 28 of the first high-pressure injection, and it is made of industrial diamond with a truncated cone shape of φ3 mm to φ5 mm φ0.5 mm to φ2 mm (increase or increase the number depending on the processing scale) and cut into the main pipe. Embed holes.
As a measure to prevent clogging, the membrane 34 is 2 mm thick with a mesh of 0.1 mm or less, and a mesh 35 of 1 mm line 1 mm mesh equivalent to stainless steel SUS316 is provided below (upper part of the nozzle tube) to prevent clogging. It is also equipped to prevent backwashing, and both ends are fixed with a stainless steel band 36 so that high pressure water does not enter from there.
The structure of the second high-pressure water injection device is that both ends of the high-pressure water filling pipe 37 are screwed and fixed inside the bushing 40, and the bushing 40 and the high-pressure protection pipe 38 are connected to the union 39 on both outsides of the high-pressure water filling pipe 37. And fix.
The inflowing high-pressure water has a nipple 41 disposed on the upper side of the high-pressure protection tube 38, a nipple 41 is disposed on the ball valve 42 on the upper side thereof, and is connected and connected by a high-pressure hose joint (female thread) integrated high-pressure hose 43.
The backwash pipe 44 has a long nipple 45 penetrating a high pressure protection pipe 38, a membrane 34, and a 1mm line 1mm mesh net 35 equivalent to stainless steel SUS316, and a nipple 41 is arranged on the ball valve 42 above the high pressure hose joint. (Female thread) The connecting high-pressure hose 43 is used for connection piping.
As the drain pipe 46, a nipple 41 is disposed below the high-pressure protection pipe 38, and a nipple 41 is disposed on the ball valve 42 below the high-pressure protection pipe 38, and a high-pressure hose joint (female thread) integrated high-pressure hose 43 is connected.

  The water pump 4 is disposed downstream of the second high-pressure injection device 3, and both ends are connected by a union 4a.

The high-pressure pump 7 has a capacity of 10 megapascals, 10 liters per minute, and 2.2 KW, and is equipped with a filter 8 on the suction side to prevent clogging.
As the water to be used, fresh water from the water supply tank 13 or treated water from the decomposition and precipitation tank 6 is used.
The discharge side is adjusted by a pressure gauge 19 and a pressure / flow rate adjusting valve 19a and connected to the high-pressure water branch pipe 16 by piping.
The air exhaust and drainage of the discharge pipe are connected to the drain pipe junction pipe 18.

  The water supply tank 13 is used to use groundwater, purified water, industrial water, etc. as water for the high-pressure pump 7 when it can be used. The material is made of PVCA and is equipped with a ball tap 13a to automatically flow in / out. Stop.

A raw water branch pipe 15 is connected to the downstream of the water pump 4 by a union 4a. One of the pipes is connected to the inflow pipe of the plasma high-frequency electromagnetic wave treatment device 5, and the other is connected to the treatment decomposition and precipitation tank 6, and is made of stainless steel. Each ball valve is arranged.
The pipe material is SUS316L up to the branch pipe, and other pipe materials are piped with insulated PVC or PE pipe.

  The high-pressure water branch pipe 16 connected from the high-pressure pump 7 is connected to the first high-pressure injection device 2, the second high-pressure injection device 3, the plasma high-frequency electromagnetic wave processing device 5, and the two-fluid nozzle 64, respectively. -A joint 69 and a ball valve 70 are arranged.

  The pulse plasma-treated water branch pipe 17 branched from the outflow pipe 62 is connected to two places of the fluid suction pipe 23 of the first high-pressure injection device 2, and a branch pipe 68, a joint 69, and a ball valve 70 are arranged respectively.

  The drain pipe merge pipe 18 joins the overflow pipe and drain pipe of the water supply tank 13, the discharge pipe on the discharge side of the high pressure pump 7, and the drain pipe of the second high pressure injection device 3, and drains them to the drain groove.

The processing device machine piping chamber 14 stores the devices from (0033) to (0040), and the material is reinforced with a stainless steel angle and shaped with a stainless steel plate.
Equipped with 4 casters that can move to the bottom.

As shown in FIG. 4, the electrical instrumentation chamber 9 is equipped with an isolation transformer 10, a variable transformer 11, and a switchboard 12, and is equipped with 100 V fans at four locations and the exhaust ports at four locations.
The material is reinforced with a stainless steel angle and shaped with a stainless steel plate and fixed to the upper part of the processing equipment machine piping chamber 14.

If high-concentration / refractory effluent treatment of raw water to be treated is possible, other nanobubble / microbubble treatment, electrolysis / plasma electrolysis treatment, ozone / hydrogen peroxide treatment, combined treatment with microorganisms The treatment effect and cost can be compared with chemical precipitation treatment, membrane separation treatment, etc.
The wastewater treatment of the flour product factory that was impossible with the above treatment was treated with this device, and the raw water and the treated water quality were analyzed.
The treated water is not subjected to any treatment such as chemical precipitation or filtration.

(Implementation conditions)
Water pump (for suction type circulation) Single-phase AC power supply 100V 80W / 60Hz
Discharge rate 30L / min Lifting height 6m
Plasma high frequency electromagnetic wave processing equipment Frequency 5.1MHz 100ns
50V 5.8A
High-pressure pump (for high-pressure water) Three-phase AC power supply 200V 2.2KW / 60Hz
Discharge rate 6L / min
Lifting height 800m (8MPa: 80atm)
Water pipe inner diameter φ20mm
1st high-pressure injection device Injection nozzle 1 hole 0.5mm Injection amount 1L / min
Tilt angle 93 °
Suction side Pulse plasma treated water 6L + plasma chamber generation
Gas 4L = 10L / min
Second high-pressure injection device Injection nozzle 4 hole 0.5mm Injection amount 4L / min
Tilt angle 93 °
Injection nozzle position 1cm interval 90 ° rotation position
Raw water inflow of high-pressure jet water
Total 1 + 6 + 4 = 11L / min
Raw water 15L / min with water supply valve throttle High pressure water 11L / min = 26L / min
Instructing the condition that the BOD is 120 mg / L or less of the discharge standard.
The pulse plasma treated water feed rate is 6 L / min and the raw water rate is 15 L / min for 5 minutes.

(Results of water quality analysis of raw water and treated water)
Analysis name Raw water Treated water Chemical oxygen demand (mg / L) 130 20
Biochemical oxygen demand (mg / L) 3400 99
Amount of suspended solids (mg / L) 140 11
Dissolved oxygen amount (mg / L) 0.5 4.2
Total nitrogen (mg / L) 56 2.0
Electrical conductivity (μS / cm) 3600 410
pH (22.3 ° C) 5.0 7.2
E. coli group number (pieces / cm ³ ) 30 or less 30 or less General bacteria (CFU / mL) 7300000 1400000
Total phosphorus (mg / L) 8.1 0.18
Chromaticity (degrees) 12 1.2

(Evaluation)
1. An increase in pH (hydrogen ion concentration) by 2.2 can be judged to have a high pulse plasma treatment effect.
2. It can be judged that the effect of the pulse plasma treatment is also high when the dissolved oxygen concentration is increased by 3.7 mg / L.
3. It can be determined that the chemical oxygen consumption is 20 mg / L and the removal rate of 85% and the pulse plasma treatment effect are high.
4. The biochemical oxygen consumption is 99 mg / L, and it can be judged that the removal rate of 97% and the pulse plasma treatment effect are high.
5, the amount of suspended solids is 11 mg / L, and it can be judged that the removal rate of 92% and the pulse plasma treatment effect are high.
6. The number of E. coli counts is less than 30 / cm ^{3 for} both raw water and treated water, neither increasing nor decreasing.
7. It can be judged that the total nitrogen is 2.0 mg / L and the removal rate of 96% and the pulse plasma treatment effect are high.
8. It can be judged that the total phosphorus is 0.18 mg / L and the removal rate of 98% and the pulse plasma treatment effect are high.
9. General bacteria had 81% sterilization effect.
10. It can be judged that the chromaticity is 1.2 degrees, a removal rate of 99%, and the pulse plasma treatment is highly effective.
11. It can be judged that the pulse plasma treatment is highly effective when the conductivity is reduced to 410 μS / cm, 89%.
In this treatment, only 30% of the pulse plasma treatment has a decomposition effect of 97%, and the effect can be further enhanced by precipitation / filtration.
If the target is wastewater of wheat flour, when hydrolyzed with gluten, it becomes a polymer of glutamic acid (C5H9NO4), which is the main ingredient of starch, and it is difficult to decompose and has a higher concentration. Therefore, 99.5% or more can be decomposed by increasing the voltage and performing reprocessing.
It has been found that if the height of the pulse plasma apparatus is changed from the current 20 cm to 60 cm, it can be decomposed in only 5 seconds by performing 100% pulse plasma treatment.
The pulse plasma treatment has a high effect of treatment decomposition, which is impossible with other treatments, and also has a high effect of oxidative coagulation precipitation without using a chemical, and it is judged that sufficient treatment is possible.
Currently, the removal effect of nitrogen and phosphorus is so high that the effect of treatment cannot be compared with other treatments.

1 shows an overall perspective view of an apparatus according to the present invention. 1 shows a pulse plasma high frequency electromagnetic wave processing apparatus. 1 shows a first high-pressure injection device. A pulse plasma transmitter is shown. Indicates a transmitter. The 2nd high pressure injection device is shown. AA line sectional drawing is shown. A flow diagram is shown. Detailed view of the piping part is shown.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Raw water tank 2 1st high pressure injection apparatus 3 2nd high pressure injection apparatus 4 Water supply pump 4a Union 5 Plasma high frequency electromagnetic wave processing apparatus 6 Decomposition sedimentation tank 7 High pressure pump 8 Filter 9 Electrical instrumentation chamber 10 Isolation transformer 11 Variable transformer 12 Distribution board 13 Water supply tank 13a Ball tap 14 Processing equipment machine piping chamber 15 Raw water branch pipe / valve 16 High pressure water branch pipe 17 Pulse plasma treated water branch pipe 18 Drain pipe merging pipe 19 Pressure gauge 19a Pressure / flow rate adjusting valve 20 Converter 21 Pulse plasma transmitter 22 High pressure water inlet pipe 23 Fluid suction pipe 24 High pressure nozzle 25 Fluid suction guide chamber 26 Needle 27 Auto cylinder 28 Orifice 29 Cap 30 Nipple 31 Ball valve 32 High pressure hose joint (both ends female thread SUS316L) integrated high pressure hose 33 Nozzle hole 3 Membrane 35 Stainless steel SUS316 equivalent 1 mm wire 1 mm mesh net 36 Stainless steel band 37 High pressure water filling pipe 38 High pressure protection pipe 39 Union 40 Bushing 41 Nipple 42 Ball valve 43 High pressure hose joint (female thread) integrated high pressure hose 44 Backwash pipe 45 Long Nipple 46 Drain pipe 49 Pressure gauge 50 External connection terminal 51 Pulse plasma processing chamber 52 Plasma negative electrode 53 Pipe with inner diameter φ50, inner diameter φ80, inner diameter φ100 Plasma anode 55 Hard rubber 56 Hard rubber 57 Through part 58 Base part through part 59 Pulse Plasma processing chamber foundation / protection tube / upper cover 60 Cathode ring terminal 61 Inflow tube 62 Outflow tube 63 Drain / overflow tube 64 Two-fluid nozzle 65 Piping from high pressure pump water 66 Piping from outside air 67 As exhaust hole Piping 68 Branch pipes 69 the joint 70 ball valves

Claims (2)

A pulse plasma high-frequency electromagnetic wave treatment device;
A first high-pressure jetting device having a two-fluid mixing nozzle that jets high-pressure while sucking pulsed plasma-treated water treated by the pulsed plasma high-frequency electromagnetic wave processing device,
In the pulse plasma high-frequency electromagnetic wave processing apparatus, a plasma cathode is disposed on the innermost side of a cylindrical pulse plasma processing chamber made of an insulating material, and a plurality of SUS tubes having large inner diameters are sequentially disposed concentrically outside the plasma cathode. And arrange the plasma anode tube on the outermost side,
Connected to the bottom of the pulsed plasma processing chamber on the plasma anode tube side so that the inflow pipe of the water to be treated flows out in a direction inclined outward with respect to the central direction,
Connect the outflow pipe of the plasma treated pulse plasma treated water to the upper part of the plasma cathode side of the pulse plasma treatment chamber,
Having a pulsed plasma transmitter for generating pulsed plasma between the plasma anode tube and the plasma cathode;
The first high-pressure injection device has a high-pressure water inflow pipe having an orifice larger than the diameter of the high-pressure water nozzle at the tip of the high-pressure water nozzle that injects the raw water to be treated toward the upstream side of the raw water. And a two-fluid mixing nozzle in which a fluid suction pipe for sucking the pulsed plasma treated water is connected in the middle of the high-pressure water inflow pipe . A second high pressure injection device for further processing the treated water obtained by the first high pressure injection device;
The second high-pressure injection device has a nozzle hole opened in a truncated cone shape whose diameter expands on the front side on the upstream side of the treated water with respect to the main pipe through which the treated water obtained by the first high-pressure injection device flows. The fluid processing apparatus according to claim 1, wherein the fluid processing apparatus is arranged so as to spiral around four or more holes so as to inject toward the nozzle, and to inject high-pressure water from the nozzle holes .

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