JP4838364B2 - Steam plasma generator and sterilizer - Google Patents

Steam plasma generator and sterilizer Download PDF

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JP4838364B2
JP4838364B2 JP2010020250A JP2010020250A JP4838364B2 JP 4838364 B2 JP4838364 B2 JP 4838364B2 JP 2010020250 A JP2010020250 A JP 2010020250A JP 2010020250 A JP2010020250 A JP 2010020250A JP 4838364 B2 JP4838364 B2 JP 4838364B2
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長吉 佐藤
俊彦 花井
久治 大木
憲吉 佐藤
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長吉 佐藤
久治 大木
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Description

本発明は、例えば食品、食料、飼料、医薬品等の被処理物に存在する微生物や害虫等を滅菌または殺菌する水蒸気プラズマを生成する水蒸気プラズマ生成装置、および、滅菌・殺菌水蒸気プラズマ生成装置を備えた滅菌・殺菌装置に関する。   The present invention includes, for example, a water vapor plasma generation apparatus that generates a water vapor plasma for sterilizing or sterilizing microorganisms, pests, and the like present in an object to be processed such as food, food, feed, and pharmaceuticals, and a sterilization / sterilization water vapor plasma generation apparatus. It relates to sterilization equipment.

食品等の滅菌・殺菌装置の一例としては、例えば、特許文献1に示すように、加熱蒸気を用いたものが知られている。具体的には、複数の球体等からなる被加熱体を充填した筒状体の一方から噴射水を導入し、筒状体の外周に巻回された励磁コイルを介して被加熱体を高周波誘導加熱することにより、筒状体の他方から加熱蒸気を噴出させる。この加熱蒸気を食品等に噴射して、滅菌・殺菌を行う装置が記載されている。   As an example of a sterilization / sterilization apparatus for food or the like, for example, as shown in Patent Document 1, one using heated steam is known. Specifically, jet water is introduced from one of the cylindrical bodies filled with the heated body composed of a plurality of spheres, and the heated body is induction-induced through an excitation coil wound around the outer circumference of the cylindrical body. By heating, heating steam is ejected from the other side of the cylindrical body. An apparatus for sterilizing and sterilizing by injecting this heated steam onto food or the like is described.

国際公開第2004/068033号パンフレットInternational Publication No. 2004/068033 Pamphlet

しかしながら、上記、加熱蒸気を用いた滅菌・殺菌装置では、加熱蒸気の温度が不安定である等の理由で、十分な滅菌、殺菌効果を得ることができない場合があった。また、無理に滅菌・殺菌効果を得ようとして、時間をかけて高温の加熱蒸気を食品等の被処理物に噴射すると、食品等の栄養成分等が変性、分解してしまうという問題が生じた。   However, in the above-described sterilization / sterilization apparatus using heated steam, sufficient sterilization and sterilization effects may not be obtained because the temperature of the heated steam is unstable. In addition, in order to forcibly obtain a sterilizing / sterilizing effect, when a high-temperature heating steam is sprayed on an object to be processed such as food over time, there is a problem that nutritional components such as food are denatured and decomposed. .

本発明は、上記実情に鑑みてなされたもので、短時間で大量の被処理物を滅菌・殺菌することができる、殺菌・滅菌能力に優れた水蒸気プラズマを生成することができる滅菌・殺菌用水蒸気プラズマ生成装置、およびこの滅菌・殺菌用水蒸気プラズマ生成装置を備えた滅菌・殺菌装置を提供することを課題とする。   The present invention has been made in view of the above circumstances, and can sterilize and sterilize a large amount of workpieces in a short time, and can generate water vapor plasma excellent in sterilization and sterilization ability. It is an object of the present invention to provide a water vapor plasma generation apparatus and a sterilization / sterilization apparatus including the sterilization / sterilization water vapor plasma generation apparatus.

本発明者らは、安定したプラズマ生成装置を得るべく研究を重ね、特定の構成を有する被加熱部材を複数備える装置により、水蒸気プラズマを安定して生成することができることを見出し、本発明を完成させた。   The present inventors have repeated research to obtain a stable plasma generation apparatus, and found that a water vapor plasma can be stably generated by an apparatus including a plurality of heated members having a specific configuration, thereby completing the present invention. I let you.

すなわち、本発明は以下に示す通りである。
流入した水蒸気を水蒸気プラズマとして流出させるとともに導電性を有する被加熱体と、前記被加熱体に巻回されるとともに、高周波が供給され前記被加熱体を電磁誘導加熱するコイルとを備えた水蒸気プラズマ生成装置であって、
前記被加熱体は、水蒸気の流入側から水蒸気プラズマの流出側へ向かって一体に連設された複数の被加熱部材により構成され、
前記複数の被加熱部材には、配置位置が水蒸気の流入側から水蒸気プラズマの流出側に向かうにつれて徐々に数が減らされた貫通孔と、それぞれが対向する面の少なくとも一方に前記貫通孔とともに水蒸気の通過域を構成する凹部とが形成され、
前記コイルは、その線体の中心に中空管を有し、前記中空管は冷却液が流される流路である、水蒸気プラズマ発生装置。
That is, the present invention is as follows.
Water vapor plasma comprising: a heated body that flows out the flowing water vapor as water vapor plasma, and has conductivity; and a coil that is wound around the heated body and that is supplied with a high frequency and electromagnetically heats the heated body. A generating device,
The heated body is composed of a plurality of heated members integrally connected from the water vapor inflow side to the water vapor plasma outflow side,
The plurality of heated members include a through-hole whose number is gradually reduced from the inflow side of the water vapor to the outflow side of the water vapor plasma, and the water vapor together with the through hole on at least one of the surfaces facing each other. And a recess that constitutes the passband of
The coil has a hollow tube at the center of its linear body, and the hollow tube is a water vapor plasma generator, which is a flow path through which a coolant flows.

また本発明は、前記被加熱部材が、円盤上であることが好ましい態様である。   Moreover, this invention is a preferable aspect that the said to-be-heated member is on a disk.

また本発明は、前記被加熱部材の凹部が、溝であることが好ましい態様である。   Moreover, this invention is a preferable aspect that the recessed part of the said to-be-heated member is a groove | channel.

また本発明は、前記流出する水蒸気プラズマの温度が、250℃以上であることが好ましい態様である。   Moreover, this invention is a preferable aspect that the temperature of the said outflowing water vapor plasma is 250 degreeC or more.

また本発明は、前記高周波の出力が、30kW以上であることが好ましい態様である。   Moreover, this invention is a preferable aspect that the output of the said high frequency is 30 kW or more.

本発明によれば、短時間かつ安定した高温で大量の被処理物を滅菌・殺菌することができる滅菌・殺菌能力に優れた水蒸気プラズマを生成することができる滅菌・殺菌用水蒸気プラズマ生成装置を提供することができ、この滅菌・殺菌用水蒸気プラズマ生成装置を備えた滅菌・殺菌装置を提供することができる。
本発明により、水蒸気プラズマを安定して生成することができるようになったことから、水蒸気プラズマを食品などの被処理物に照射することで、食品中の栄養分を壊すことなく、簡単に殺菌・滅菌処理を行うことができる。その結果、高温高湿地域における食品等の保存の状態を良好に保つことができる。
According to the present invention, there is provided a water vapor plasma generating apparatus for sterilization / sterilization capable of generating a water vapor plasma excellent in sterilization / sterilization ability, capable of sterilizing / sterilizing a large amount of objects to be processed in a short time and at a stable high temperature. The sterilization / sterilization apparatus provided with this sterilization / sterilization water vapor plasma generator can be provided.
According to the present invention, water vapor plasma can be generated stably. By irradiating water vapor plasma to an object to be processed such as food, it is possible to easily sterilize and destroy nutrients in food. Sterilization can be performed. As a result, the state of preservation of foods and the like in a high temperature and high humidity region can be kept good.

本発明の実施形態に係る滅菌・殺菌装置の全体構成を表す概略説明図である。It is a schematic explanatory drawing showing the whole structure of the sterilization and sterilization apparatus which concerns on embodiment of this invention. (A)は蒸気ボイラから水蒸気が流入する側の一番端に位置する被加熱円盤部材の一例の側面図であり、(B)は図2(A)に示した被加熱円盤部材の正面図である。(A) is a side view of an example of a heated disk member positioned at the extreme end on the side where water vapor flows from the steam boiler, and (B) is a front view of the heated disk member shown in FIG. It is. (A)は水蒸気プラズマを流出させる側の一番端に位置する被加熱円盤部材の一例の側面図であり、(B)は図3(A)に示した被加熱円盤部材の正面図である。(A) is a side view of an example of a heated disk member located at the extreme end on the side from which water vapor plasma flows out, and (B) is a front view of the heated disk member shown in FIG. 3 (A). . 液体を処理する場合の、滅菌・殺菌処理装置(滅菌・殺菌処理室)の例である。It is an example of the sterilization and sterilization processing apparatus (sterilization and sterilization processing room) in the case of processing a liquid.

本発明の水蒸気プラズマ発生装置は、被加熱体と、被加熱体を電磁誘導加熱するコイルとを備える。上記被加熱体に流入した水蒸気は、被加熱体内で加熱され、電離した状態になり、水蒸気プラズマとして流出される。   The water vapor plasma generator of the present invention includes a heated object and a coil for electromagnetically heating the heated object. The water vapor that has flowed into the heated body is heated in the heated body, becomes ionized, and flows out as water vapor plasma.

水蒸気を加熱するための上記被加熱体は、電磁誘導加熱するコイルにより巻回されている。上記被加熱体は、コイルに高周波が供給されることで電磁誘導加熱される。上記被加熱部材は、電磁誘導により加熱されるため、導電性を有する部材である必要がある。また、後述するが、本発明の水蒸気プラズマは250℃〜850℃であることが好ましい。このため上記被加熱部材は、850℃の温度であっても安定性を有する材料からなることが好ましい。具体的には鉄、ステンレス、銅等が挙げられる。流入した水蒸気は、上記被加熱体により加熱されるが、250℃以上に加熱されることが好ましい。250℃以上であることで、安定して水蒸気プラズマが発生するからである。このとき高周波の出力が30kW以上であることが好ましい。安定して水蒸気プラズマを生成することができるためである。   The heated object for heating water vapor is wound around a coil for electromagnetic induction heating. The heated object is heated by electromagnetic induction by supplying high frequency to the coil. Since the member to be heated is heated by electromagnetic induction, it needs to be a member having conductivity. Moreover, although mentioned later, it is preferable that the water vapor plasma of this invention is 250 to 850 degreeC. For this reason, the member to be heated is preferably made of a material having stability even at a temperature of 850 ° C. Specific examples include iron, stainless steel, and copper. The flowing water vapor is heated by the heated body, but is preferably heated to 250 ° C. or higher. This is because the water vapor plasma is stably generated when the temperature is 250 ° C. or higher. At this time, the high-frequency output is preferably 30 kW or more. This is because water vapor plasma can be generated stably.

上記被加熱部材は、水蒸気の流入側から水蒸気プラズマの流出側へ向かって一体に連設された複数の被加熱部材により構成されている。また、複数の被加熱部材には、配置位置が水蒸気の流入側から水蒸気プラズマの流出側に向かうにつれて徐々に数が減らされた貫通孔と、それぞれが対向する面の少なくとも一方に前記貫通孔とともに水蒸気の通過域を構成する凹部とが形成される。   The member to be heated is composed of a plurality of members to be heated integrally connected from the water vapor inflow side to the water vapor plasma outflow side. In addition, the plurality of heated members include a through-hole whose number is gradually reduced from the inflow side of the water vapor to the outflow side of the water vapor plasma, and the through hole on at least one of the surfaces facing each other. A recess that forms a water vapor passage area is formed.

このような構成を有することで、被加熱体に流入した水蒸気は、電磁誘導加熱された被加熱体により高温になるとともに、流出側に向かって徐々に数が減っていく貫通孔及び水
蒸気の通過域を構成する凹部を通過する。この際、上記被加熱部材は流出側に向かって通過域が徐々に制限されるため、水蒸気は、被加熱円盤部材にぶつかりながら徐々に膨張するとともに貫通孔を通り抜ける力が徐々に増していき、その結果、電離した状態になり、水蒸気プラズマとして流出される。
By having such a configuration, the water vapor that has flowed into the heated body is heated by the electromagnetic induction heated heated body, and the number of through holes and water vapor that gradually decreases toward the outflow side. It passes through the recesses that make up the zone. At this time, since the heated member is gradually restricted in the passage area toward the outflow side, the steam gradually expands while colliding with the heated disk member, and the force passing through the through hole gradually increases. As a result, it becomes ionized and flows out as water vapor plasma.

また、被加熱体を通過する流体の温度を安定させるため、かつ、コイル自体の発熱を防止するため、被加熱体に巻回されたコイルは、その線体の中心に中空管を有し、中空管には冷却液を流す必要がある。冷却液の種類は特段限定されないが、水を用いることがコスト面から好ましい。また、冷却液の温度は特段限定されないが、冷却水を用いる場合、常温に近い10〜40℃程度であればよい。   In order to stabilize the temperature of the fluid passing through the heated body and to prevent the coil itself from generating heat, the coil wound around the heated body has a hollow tube at the center of the wire. It is necessary to flow a coolant through the hollow tube. The type of the coolant is not particularly limited, but it is preferable from the viewpoint of cost to use water. The temperature of the coolant is not particularly limited, but when cooling water is used, it may be about 10 to 40 ° C. close to normal temperature.

本発明の実施の形態に係るプラズマ生成装置について、以下図面を参照して説明する。   A plasma generation apparatus according to an embodiment of the present invention will be described below with reference to the drawings.

滅菌・殺菌装置1は、食品、食料、資料、医薬品等の被処理物の表面に存在する一般生菌、大腸菌群、芽胞菌等の微生物や害虫等を、水蒸気プラズマ生成装置10により生成した水蒸気プラズマによって滅菌・殺菌する装置である。   The sterilization / sterilization apparatus 1 is a water vapor generated by the water vapor plasma generator 10 to generate microorganisms such as general living bacteria, coliform bacteria, and spore bacteria, pests, etc. present on the surface of the object to be processed such as food, food, data, and pharmaceuticals. It is a device that sterilizes and sterilizes with plasma.

滅菌・殺菌装置1は、図1に示すように、水蒸気プラズマ生成装置10と、滅菌・殺菌処理室20と、インバータ30と、蒸気ボイラ40と、冷却液タンク50とを備えている。   As shown in FIG. 1, the sterilization / sterilization apparatus 1 includes a water vapor plasma generation apparatus 10, a sterilization / sterilization treatment chamber 20, an inverter 30, a steam boiler 40, and a coolant tank 50.

水蒸気プラズマ生成装置10は、食品等の被処理物に照射する水蒸気プラズマを生成する装置である。水蒸気プラズマ生成装置10は、被加熱体11と、被加熱体11を電磁誘導加熱するためのコイル12と、被加熱体11を覆って保温する断熱材13と、被加熱体11に蒸気ボイラ40で生成した水蒸気を流入するための水蒸気流入部71と、被加熱体11から生成した水蒸気プラズマを流出するための水蒸気プラズマ流出部72と、水蒸気プラズマを滅菌・殺菌処理室20へと噴出させるための噴射ノズル73とを備えている。なお、水蒸気プラズマ生成装置10は、図示しないプラスチック製の絶縁カバーで保護されている。   The water vapor plasma generation apparatus 10 is an apparatus that generates water vapor plasma that irradiates an object to be processed such as food. The water vapor plasma generator 10 includes a heated body 11, a coil 12 for electromagnetically heating the heated body 11, a heat insulating material 13 that covers and heats the heated body 11, and a steam boiler 40 on the heated body 11. In order to inject the water vapor plasma 71 into the sterilization / sterilization treatment chamber 20, the water vapor plasma outflow portion 71 for flowing out the water vapor plasma generated from the heated object 11, and the water vapor plasma into the sterilization / sterilization treatment chamber 20. The injection nozzle 73 is provided. The water vapor plasma generator 10 is protected by a plastic insulating cover (not shown).

被加熱体11は、インバータ30からの高周波電流が供給されたコイル12により電磁誘導加熱される。被加熱体11は、導電性を有する複数の被加熱円盤部材11aにより構成されることが好ましい。被加熱体は必ずしも円盤部材である必要は無いが、被加熱体をコイルにより電磁誘導加熱する効率性を考えると、円盤状であることが好ましい。被加熱円盤部材11aには、導電性材料が用いられ、例えば鉄、ステンレス鋼、ニッケル、チタン等の金属やカーボンセラミック等の導電性セラミック材料等が用いられる。   The heated object 11 is heated by electromagnetic induction by the coil 12 to which the high frequency current from the inverter 30 is supplied. The heated body 11 is preferably composed of a plurality of heated disk members 11a having conductivity. The object to be heated is not necessarily a disk member, but a disk shape is preferable in view of the efficiency of electromagnetic induction heating of the object to be heated by a coil. For the heated disk member 11a, a conductive material is used, for example, a metal such as iron, stainless steel, nickel, titanium, or a conductive ceramic material such as carbon ceramic.

複数の被加熱円盤部材11aは、図1に示すように、蒸気ボイラ40から水蒸気が流入される側から水蒸気プラズマを流出させる側にむかって、一体に連設される。また、被加熱円盤部材11aには、図2及び図3に示すように、複数の貫通孔111aが形成され、被加熱円盤部材11aの表面、裏面にはそれぞれ複数の溝112aが形成されている。図2は蒸気ボイラ40から水蒸気が流入される側の一番端に位置する被加熱円盤部材11aを示し、図3は水蒸気プラズマを流出させる側の一番端に位置する被加熱円盤部材11aを示す。   As shown in FIG. 1, the plurality of heated disk members 11 a are integrally connected from the steam boiler 40 side to the steam plasma flow side to the steam plasma flow side. Further, as shown in FIGS. 2 and 3, the heated disk member 11a is formed with a plurality of through holes 111a, and a plurality of grooves 112a are formed on the front and back surfaces of the heated disk member 11a. . FIG. 2 shows a heated disk member 11a positioned at the extreme end on the side where water vapor flows from the steam boiler 40, and FIG. 3 shows a heated disk member 11a positioned at the extreme end on the side where water vapor plasma flows out. Show.

被加熱円盤部材11aに形成される貫通孔111aは、蒸気ボイラ40から水蒸気が流入される側から水蒸気プラズマを流出させる側に向かうにつれて、その数が徐々に減るように形成されている。一例をあげると、蒸気ボイラ40から水蒸気が流入される側の一番端に配置された被加熱円盤部材11aに形成された貫通孔111aの数は例えば100個、水蒸気プラズマを流出させる側の一番端に配置された被加熱円盤部材11aに形成され
た貫通孔111aの数は例えば10個である。なお、一体に連設される被加熱部材の数に特段の制限はなく、高周波の出力、周波数や被処理物の種類、量などに応じて決定される。
The through-holes 111a formed in the heated disk member 11a are formed so that the number thereof gradually decreases from the steam boiler 40 flowing side toward the water vapor plasma flowing side. As an example, the number of through-holes 111a formed in the heated disk member 11a disposed at the extreme end on the side where water vapor flows from the steam boiler 40 is, for example, 100, one on the side where water vapor plasma flows out. The number of through holes 111a formed in the heated disk member 11a disposed at the end is, for example, ten. There is no particular limitation on the number of members to be heated integrally provided, and the number is determined according to the output of the high frequency, the frequency, the type and amount of the object to be processed, and the like.

被加熱円盤部材11aの溝112aは不規則に形成されているので、複数の被加熱円盤部材11a間には空間113a(図1)が形成される。被加熱体11に流入した水蒸気は、空間113aおよび貫通孔111a内のみに通過可能な範囲が制限され、また、水蒸気プラズマとして流出する側に向かうにつれて貫通孔111aの数が減っていくため通過可能な範囲は徐々に制限される。   Since the groove 112a of the heated disk member 11a is irregularly formed, a space 113a (FIG. 1) is formed between the plurality of heated disk members 11a. The range in which water vapor that has flowed into the heated body 11 can pass only into the space 113a and the through-hole 111a is limited, and the number of through-holes 111a decreases toward the side that flows out as water vapor plasma, so that it can pass through. The range is gradually limited.

被加熱体11に流入した水蒸気は、電磁誘導加熱された被加熱体11により250℃以上の温度になるとともに、流出側に向かって徐々に数が減っていく貫通孔111a、および、空間113a内のみを通過し、流出側に向かって通過域が徐々に制限される。このため水蒸気は、被加熱円盤部材11aにぶつかりながら徐々に膨張するとともに貫通孔111aを通り抜ける力が徐々に増していき、その結果、電離した状態になり、水蒸気プラズマとして流出される。なお、通過域が流出側に向かって徐々に制限されるにもかかわらず、流入した水蒸気が逆流することはない。また、被加熱体11に流入した水蒸気は電磁誘導加熱されるが、加熱された水蒸気が250℃よりも低い場合には、水蒸気プラズマが安定して生成されない傾向にある。   The water vapor flowing into the heated body 11 is heated to a temperature of 250 ° C. or higher by the heated body 11 heated by electromagnetic induction, and gradually decreases in number toward the outflow side and in the space 113a. Passing through only, the passage area is gradually limited toward the outflow side. For this reason, the water vapor gradually expands while colliding with the heated disk member 11a, and the force passing through the through hole 111a gradually increases. As a result, the water vapor becomes ionized and flows out as water vapor plasma. In addition, although the passage area is gradually restricted toward the outflow side, the inflowing water vapor does not flow backward. Moreover, although the water vapor | steam which flowed into the to-be-heated body 11 is electromagnetic induction heating, when the water vapor | steam heated is lower than 250 degreeC, it exists in the tendency for water vapor | steam plasma not to be produced | generated stably.

流出された水蒸気プラズマ中には、正と負の荷電粒子が高速で飛びまわっており、荷電粒子の間に大きなクーロン力が働くために、過熱蒸気のような電気的中性気体よりも粒子のもつ運動エネルギーがはるかに大きくなる。この高エネルギーの粒子によって結合を切られた水蒸気中の水素原子、酸素原子、OHラジカルなどの活性の高い中性の原子や分子がプラズマ中に存在していること等のため、水蒸気プラズマは高い殺菌、滅菌力を有する。   In the outflowed water vapor plasma, positive and negative charged particles fly at a high speed, and a large Coulomb force works between the charged particles, so that the particles have more than electric neutral gas such as superheated steam. Kinetic energy is much higher. The water vapor plasma is high due to the presence of highly active neutral atoms and molecules such as hydrogen atoms, oxygen atoms, and OH radicals in the water vapor that are disconnected by the high energy particles. Has sterilization and sterilization power.

被加熱体11を製造するには、まず複数の角板に貫通孔111aおよび溝112aをそれぞれ形成する。その後、それぞれの角板を溶接により接合する。そして、接合された複数の角板をそのまま被加熱体として用いることもでき、更に旋盤により円盤状に形成することで、被加熱体とすることもできる。   To manufacture the object to be heated 11, first, through holes 111a and grooves 112a are formed in a plurality of square plates. Then, each square plate is joined by welding. A plurality of joined square plates can be used as they are to be heated as they are to be heated, and can also be made to be heated by forming them into a disk shape with a lathe.

コイル12は、その線体の中心に中空管を有し、流入ホース51から中空管に冷却液を流すことにより、コイル12自体の発熱を防止するとともに、被加熱体11を通過する流体の温度を安定させることができる。コイル12に冷却液を流さないと、被加熱体11を通過する流体の温度が不安定になり、水蒸気プラズマを生成することができない。   The coil 12 has a hollow tube at the center of the wire body, and prevents the coil 12 itself from generating heat by flowing a cooling liquid from the inflow hose 51 to the hollow tube, and the fluid that passes through the heated body 11. The temperature can be stabilized. If the coolant is not supplied to the coil 12, the temperature of the fluid passing through the heated object 11 becomes unstable, and water vapor plasma cannot be generated.

インバータ30は、コイル12を介して被加熱体11に高周波誘導加熱を施す装置である。インバータ30は、高周波インバータが用いられ、高周波の出力は30〜500kW程度であることが好ましく、周波数は10〜20kHzであることが好ましい。なお、インバータ30は、導電線31によりコイル12に電気的に接続されている。
高周波の出力が30kW以上であることにより、水蒸気プラズマ生成装置10により水蒸気プラズマを安定して生成することができる。なお、インバータ30内にも冷却水タンク50からの冷却液の流入ホース51が通っており、内部に配置された半導体素子等を除熱する。
The inverter 30 is a device that applies high-frequency induction heating to the heated object 11 via the coil 12. The inverter 30 is a high-frequency inverter, and the high-frequency output is preferably about 30 to 500 kW, and the frequency is preferably 10 to 20 kHz. Note that the inverter 30 is electrically connected to the coil 12 by a conductive wire 31.
When the high frequency output is 30 kW or more, the water vapor plasma generation apparatus 10 can stably generate the water vapor plasma. An inflow hose 51 for cooling liquid from the cooling water tank 50 also passes through the inverter 30 to remove heat from the semiconductor elements and the like disposed inside.

蒸気ボイラ40は、導管60により水蒸気流入部71を介して水蒸気プラズマ生成装置10に接続されている。なお、導管60には、蒸気ボイラ40により発生させた水蒸気の開閉弁61と逆止弁62が設けられている。   The steam boiler 40 is connected to the water vapor plasma generation apparatus 10 via a water vapor inflow portion 71 by a conduit 60. The conduit 60 is provided with an on-off valve 61 and a check valve 62 for steam generated by the steam boiler 40.

冷却液タンク50は、冷却液をコイル12の線体の一端に流入させるとともにインバータ30内部を除熱するための流入ホース51と、冷却液をコイル12の線体の他端から流出させるための流出ホース52とを有する。   The coolant tank 50 allows the coolant to flow into one end of the wire body of the coil 12 and also removes the inside of the inverter 30 from the inflow hose 51 and causes the coolant to flow out from the other end of the wire body of the coil 12. And an outflow hose 52.

滅菌・殺菌処理室20は、円筒状の本体21と、本体の上方に配置された被処理物投入口22と、被処理物投入調整部23と、本体21の側壁に形成された水蒸気プラズマ照射開口部24と、本体21を支持する設置台25とを備えている。水蒸気プラズマ照射開口部24には、水蒸気プラズマ導入管74が接続されている。本体21は円筒状に形成されることにより、上方の被処理物投入口22から大気が流れ込んでくることがなくなり、本体21内は真空状態となり、照射される水蒸気プラズマの温度が安定し、被処理物の滅菌・殺菌効果が向上する。なお、真空状態とは、大気圧よりも圧力が低い状態を意味する。   The sterilization / sterilization chamber 20 includes a cylindrical main body 21, a workpiece input port 22 disposed above the main body, a workpiece input adjusting unit 23, and water vapor plasma irradiation formed on the side wall of the main body 21. An opening 24 and an installation base 25 that supports the main body 21 are provided. A water vapor plasma introduction tube 74 is connected to the water vapor plasma irradiation opening 24. Since the main body 21 is formed in a cylindrical shape, the atmosphere does not flow from the upper workpiece input port 22, the inside of the main body 21 is in a vacuum state, the temperature of the irradiated water vapor plasma is stabilized, and Improves sterilization and sterilization effect of processed products. The vacuum state means a state where the pressure is lower than the atmospheric pressure.

本体21内での水蒸気プラズマの温度は、250℃以上850℃以下で安定した温度となる。被処理物の種類に応じて水蒸気プラズマの温度を適宜設定することができる。   The temperature of the water vapor plasma in the main body 21 is a stable temperature between 250 ° C. and 850 ° C. The temperature of the water vapor plasma can be appropriately set according to the type of the object to be processed.

水蒸気プラズマ生成装置10の噴射ノズル73から噴射された水蒸気プラズマを、水蒸気プラズマ導入管74を介して、水蒸気プラズマ照射開口部24から噴射させた状態で、被処理物を被処理物投入口22から投入すると、被処理物に水蒸気プラズマが照射される。これによりプラズマ照射処理がされる。   In a state where the water vapor plasma injected from the injection nozzle 73 of the water vapor plasma generation apparatus 10 is injected from the water vapor plasma irradiation opening 24 via the water vapor plasma introduction pipe 74, the object to be processed is supplied from the object input port 22. When charged, water vapor plasma is irradiated to the workpiece. Thereby, plasma irradiation processing is performed.

滅菌・殺菌処理室20は、被処理物の種類に応じて適宜設計変更することが可能である。図1では処理室の上方から被処理物を投入し、重力により落下する途中で瞬時に水蒸気プラズマが照射される構造になっているが、処理室を水平方向に長く設計し、ベルトコンベアなどを用いることで比較的長い時間プラズマを照射することができる設計とすることも可能である。   The design of the sterilization / sterilization chamber 20 can be changed as appropriate according to the type of the object to be processed. In FIG. 1, the workpiece is introduced from above the processing chamber, and the water vapor plasma is instantaneously irradiated while dropping due to gravity. However, the processing chamber is designed to be long in the horizontal direction, By using it, it is possible to design it so that plasma can be irradiated for a relatively long time.

また、液体についての殺菌・滅菌を行う場合には、図4で示す滅菌・殺菌処理室とすることが好ましい。本体21は円筒の部材を用い、約10度から40度、好ましくは15度から30度の傾斜により液体を被処理物投入口22から出口方向に向かって流す。このとき、本体21のうち、被処理物投入口に近い部分において、水蒸気プラズマ導入管74を本体21に接続し、水蒸気プラズマを液体に噴射することで、液体を滅菌・殺菌することができる。上記円筒は、その断面が完全な円でなくてもよく、例えば楕円であったり、半円であったりしてもよい。また、本体内に注入する液体は、プラズマによる滅菌・殺菌の効果をより高くするため、本体21中の液体充填率を50%以下とすることが好ましく、30%以下とすることがより好ましく、20%以下とすることが更に好ましい。本体21の出口には、液体の受け皿を設置することで、滅菌・殺菌済みの液体を回収する。受け皿は、投入する液体の量に応じ、適当な大きさのタンクなどを用いることができる。
図4で示す滅菌・殺菌処理室で処理が可能な液体は特段限定されず、水、ジュースなどの飲料、スープなどの加工食品、および植物油、動物油などの油性物質などが例示できる。
Further, when sterilizing / sterilizing a liquid, it is preferable to use the sterilization / sterilization treatment chamber shown in FIG. The main body 21 uses a cylindrical member, and allows the liquid to flow from the workpiece input port 22 toward the outlet with an inclination of about 10 to 40 degrees, preferably 15 to 30 degrees. At this time, the liquid can be sterilized and sterilized by connecting the water vapor plasma introduction pipe 74 to the main body 21 and injecting the water vapor plasma into the liquid in a portion of the main body 21 close to the workpiece input port. The cylinder may not be a perfect circle in cross section, and may be an ellipse or a semicircle, for example. Further, the liquid injected into the main body preferably has a liquid filling rate of 50% or less, more preferably 30% or less, in order to enhance the effect of sterilization and sterilization by plasma. More preferably, it is 20% or less. By installing a liquid tray at the outlet of the main body 21, the sterilized and sterilized liquid is collected. As the tray, a tank having an appropriate size can be used according to the amount of liquid to be charged.
The liquid that can be treated in the sterilization / sterilization treatment chamber shown in FIG. 4 is not particularly limited, and examples thereof include water, beverages such as juice, processed foods such as soup, and oily substances such as vegetable oil and animal oil.

このように本実施の形態の水蒸気プラズマ生成装置では、被加熱体11の構造を、流入した水蒸気の通過域が流出側に向かって徐々に制限されるようにし、また、コイル12の線体に冷却液を流して被加熱体11を通過する水蒸気の温度を安定させることにより高出力のインバータ30による高周波の供給を可能にした。その結果、安定した水蒸気プラズマを生成することができるようになった。   As described above, in the water vapor plasma generation apparatus of the present embodiment, the structure of the heated object 11 is configured such that the passage region of the flowed water vapor is gradually limited toward the outflow side, and the wire body of the coil 12 is By supplying a coolant and stabilizing the temperature of the water vapor passing through the heated object 11, high-frequency inverter 30 can supply high frequency. As a result, stable water vapor plasma can be generated.

本実施形態の滅菌・殺菌装置では、水蒸気プラズマ生成装置10により生成した水蒸気プラズマを、大気の流入を防止した円筒状の滅菌・殺菌処理室20の本体21内に噴射させて、被処理物投入口22から投入され、落下する食品等の被処理物に照射させるように
したので、安定した高温の水蒸気プラズマにより、短時間(瞬時)で大量の被処理物を滅菌・殺菌することができる。
In the sterilization / sterilization apparatus according to the present embodiment, the water vapor plasma generated by the water vapor plasma generation apparatus 10 is injected into the main body 21 of the cylindrical sterilization / sterilization treatment chamber 20 in which the inflow of air is prevented, and the object to be processed is charged. Since an object to be processed such as food dropped from the mouth 22 is dropped, a large amount of object to be processed can be sterilized and sterilized in a short time (instantaneous) by a stable high-temperature steam plasma.

以上、実施の形態を挙げて本発明を説明したが、本発明は上記実施の形態に限定されるものではなく、種々変形が可能である。例えば、本実施の形態では、被加熱体11を被加熱円盤部材11aにより構成する例について示したが、流入側から流出側へと向かって、流体の通過域を徐々に狭くする構造であればよく、例えば被加熱部材は角材状、球体状、不定形塊状体等であってもよい。また、非加熱円盤部材11aの数は、高周波の出力、周波数や非処理物の種類、量等に応じて決定される。   While the present invention has been described with reference to the embodiment, the present invention is not limited to the above embodiment, and various modifications can be made. For example, in the present embodiment, an example in which the heated object 11 is configured by the heated disk member 11a has been described. However, as long as the fluid passage area is gradually narrowed from the inflow side to the outflow side, For example, the member to be heated may be in the shape of a square, a sphere, an indeterminate block, or the like. The number of non-heated disk members 11a is determined according to the output of the high frequency, the frequency, the type and amount of the non-processed object, and the like.

また、本実施の形態では、被加熱円盤部材11aに形成する貫通孔111aの数を100個から10個へと流出側に向かって徐々に減らす例について説明したが、貫通孔111aの数や大きさや減らし方は、被加熱円盤部材11a自体の数、大きさ等や高周波の出力、周波数や被処理物の種類、量等に応じて、決定される。   In the present embodiment, the example in which the number of through-holes 111a formed in the heated disk member 11a is gradually reduced from 100 to 10 toward the outflow side has been described. The method of reducing the sheath is determined according to the number and size of the heated disk member 11a itself, the output of the high frequency, the frequency, the type and amount of the object to be processed, and the like.

また、本実施の形態では、被加熱円盤部材11aに溝112aを形成して、空間113aを構成させる例について説明したが、空間113aを構成することができる凹部であればよく、例えば、へこみを形成するように被加熱円盤部材を形成することもできる。   Further, in the present embodiment, the example in which the groove 112a is formed in the heated disk member 11a to form the space 113a has been described. However, any concave portion that can form the space 113a may be used. It is also possible to form a heated disk member to form.

また、本実施の形態では、被加熱円盤部材11aの両面に溝112aを形成する例について説明したが、被加熱円盤部材11aのそれぞれが対向する面の一方だけに形成するようにしてもよい。また、被加熱円盤部材11aが配置される位置によっては、溝112aを形成しないものもある。   Further, in the present embodiment, the example in which the grooves 112a are formed on both surfaces of the heated disk member 11a has been described. However, the heated disk members 11a may be formed only on one of the opposed surfaces. Further, depending on the position where the heated disk member 11a is disposed, there is a case where the groove 112a is not formed.

また、本実施の形態では、被加熱体11に流入させる水蒸気を発生させるために蒸気ボイラ40を用いた例について説明したが、水蒸気を発生させる装置であればよく、例えばタンクに水を貯めて流出する水を電気的に加熱させて水蒸気を発生させてもよい。   Further, in the present embodiment, an example in which the steam boiler 40 is used to generate water vapor that flows into the heated object 11 has been described. However, any device that generates water vapor may be used. For example, water is stored in a tank. The water flowing out may be heated electrically to generate water vapor.

上記水蒸気プラズマ生成装置により生成した水蒸気プラズマを食品等に照射することで、食品等の滅菌・殺菌を行うことができる。上記処理室20の構成は上述したように、被処理物の種類により適宜設計変更することが可能である。例えば、上記処理室20のような落下式を用いると、被処理物が水蒸気プラズマに照射されている時間が短いため、小麦などの粒が小さい食品の滅菌・殺菌処理に特に適している。   By irradiating the food or the like with the water vapor plasma generated by the water vapor plasma generator, the food or the like can be sterilized. As described above, the configuration of the processing chamber 20 can be appropriately changed depending on the type of the object to be processed. For example, when a drop type such as the processing chamber 20 is used, the time during which the object to be processed is irradiated with the water vapor plasma is short, and thus it is particularly suitable for sterilization / sterilization processing of foods with small grains such as wheat.

一方、大豆から検出される芽胞菌群などの耐性が高い菌が付着している食品の滅菌・殺菌処理や、コーヒー豆、ナッツ、種子を焙煎する処理に用いる場合には、例えば、ベルトコンベアタイプのような構成を有する処理室を用いることが好ましい。   On the other hand, when used for sterilization and sterilization of foods to which highly resistant bacteria such as spore bacteria detected from soybeans are attached, or for roasting coffee beans, nuts and seeds, for example, a belt conveyor It is preferable to use a processing chamber having a configuration such as a type.

本発明の水蒸気プラズマを、被処理物に照射し滅菌・殺菌を行う場合、滅菌・殺菌処理が非常に短時間で行われるので、例えば、被処理物が小麦等の食品の場合には、タンパク質、ビタミン、ミネラル等の栄養成分を変性、毀損することなく滅菌・殺菌することができる。本発明において被処理物は特段限定されるものではないが、特に、食品の場合には、大豆、小麦、小豆、コーヒー、麺類など、様々な食品に適用することができる。また、家畜用、農作物用の飼料、例えば廃棄食品などについても、同様に本発明を適用することができる。   When sterilization and sterilization are performed by irradiating the object to be processed with the water vapor plasma of the present invention, sterilization and sterilization is performed in a very short time. For example, when the object to be processed is a food such as wheat, protein It can be sterilized and sterilized without denaturing or degrading nutrients such as vitamins and minerals. In the present invention, the object to be treated is not particularly limited, but in particular, in the case of food, it can be applied to various foods such as soybeans, wheat, red beans, coffee, and noodles. Further, the present invention can be similarly applied to feed for livestock and agricultural products, such as waste food.

水蒸気プラズマの照射により、被処理物の表面に存在する一般生菌、大腸菌群、大腸菌、芽胞菌等の微生物を滅菌・殺菌することができ、特に菌が繁殖しやすい高温高湿状況下での食品の保存に非常に有用である。また、本発明の水蒸気プラズマを用いた滅菌・殺菌方法では、30秒以内の被処理物に対する照射で滅菌・殺菌効果が生じる。被処理物の種
類によっては、さらに短い時間の照射でも効果を発揮し、照射時間は被処理物の種類に応じて、適宜設定することができる。
Irradiation with water vapor plasma can sterilize and sterilize microorganisms such as general live bacteria, coliform bacteria, Escherichia coli, and spore bacteria present on the surface of the object to be treated, especially in high-temperature and high-humidity conditions where bacteria can easily propagate. Very useful for food preservation. Moreover, in the sterilization / sterilization method using the water vapor plasma of the present invention, the sterilization / sterilization effect is produced by irradiating the object to be processed within 30 seconds. Depending on the type of the object to be processed, the effect can be exhibited even by irradiation for a shorter time, and the irradiation time can be appropriately set according to the type of the object to be processed.

以下に、実施例を挙げて本発明について更に詳細に説明を加えるが、本発明がかかる実施例にのみに限定されないことは言うまでもない。   Hereinafter, the present invention will be described in more detail with reference to examples, but it goes without saying that the present invention is not limited to such examples.

図1に示す水蒸気プラズマ発生装置の滅菌・殺菌処理室そのまま落下式とし、高周波の出力を30kW、周波数を20kHzとして小麦を滅菌・殺菌処理室に投入し、水蒸気プラズマを照射した。水蒸気プラズマの照射の前後での細菌の存在を確認した。比較例として、従来用いられている加熱蒸気による滅菌・殺菌処理を行った。結果を表1に示す。   The sterilization / sterilization treatment chamber of the water vapor plasma generator shown in FIG. 1 was used as a drop type, the high frequency output was 30 kW, the frequency was 20 kHz, wheat was introduced into the sterilization / sterilization treatment chamber, and water vapor plasma was irradiated. The presence of bacteria before and after irradiation with water vapor plasma was confirmed. As a comparative example, sterilization and sterilization treatment using heating steam, which has been conventionally used, was performed. The results are shown in Table 1.

Figure 0004838364
Figure 0004838364

表1に示すように、水蒸気プラズマによる場合には、一般生菌数、大腸菌群が加熱蒸気を用いた場合と比較して、著しく減少することが理解できる。   As shown in Table 1, when using water vapor plasma, it can be understood that the number of general viable bacteria and the coliform group are significantly reduced as compared with the case where heated steam is used.

本発明の水蒸気プラズマ生成装置により生成した水蒸気プラズマは、滅菌・殺菌作用を有している。本発明の殺菌・滅菌方法により、簡易な方法で、食品の成分を壊すことなく滅菌・殺菌処理が可能となる。また、微生物の存在により長期保存が難しい食品や、酸化の進行が原因で消費の期限が短く設定してある製品については、保存可能な期限、消費の期限が著しく伸びることとなり、産業上の有用性は極めて大きい。   The water vapor plasma generated by the water vapor plasma generator of the present invention has a sterilization / sterilization action. By the sterilization / sterilization method of the present invention, sterilization / sterilization can be performed by a simple method without destroying the ingredients of the food. In addition, for foods that are difficult to store for a long time due to the presence of microorganisms and products that have a limited expiration date due to the progress of oxidation, the shelf life and the expiration date for consumption will be significantly increased, which is useful for industry. The nature is extremely large.

1 滅菌・殺菌装置
10 水蒸気生成装置
11 被加熱体
11a 被加熱円盤部材
12 コイル
13 断熱材
20 滅菌・殺菌処理室
21 処理室本体
22 被処理物投入口
23 被処理物投入量調整部
24 水蒸気プラズマ照射開口部
25 設置台
30 インバータ
31 導電線
40 蒸気ボイラ
50 冷却水タンク
51 流入ホース
52 流出ホース
60 導管
61 開閉弁
62 逆止弁
71 水蒸気流入部
72 水蒸気プラズマ排出部
73 噴射ノズル
74 水蒸気プラズマ導入管
111a 貫通孔
112a 溝
113a 空間
DESCRIPTION OF SYMBOLS 1 Sterilization / sterilization apparatus 10 Water vapor generation apparatus 11 Heated object 11a Heated disk member 12 Coil 13 Heat insulating material 20 Sterilization / sterilization processing chamber 21 Processing chamber main body 22 Processed object inlet 23 Processed object input adjustment part 24 Water vapor plasma Irradiation opening 25 Installation base 30 Inverter 31 Conductor wire 40 Steam boiler 50 Cooling water tank 51 Inflow hose 52 Outflow hose 60 Conduit 61 On-off valve 62 Check valve 71 Steam inflow part 72 Steam plasma discharge part 73 Injection nozzle 74 Steam plasma introduction pipe 111a Through hole 112a Groove 113a Space

Claims (6)

流入した水蒸気を水蒸気プラズマとして流出させるとともに導電性を有する被加熱体と、前記被加熱体に巻回されるとともに、高周波が供給され前記被加熱体を電磁誘導加熱するコイルとを備えた水蒸気プラズマ生成装置であって、
前記被加熱体は、水蒸気の流入側から水蒸気プラズマの流出側へ向かって一体に連設された複数の被加熱部材により構成され、
前記複数の被加熱部材には、配置位置が水蒸気の流入側から水蒸気プラズマの流出側に向かうにつれて徐々に数が減らされた貫通孔と、それぞれが対向する面の少なくとも一方に前記貫通孔とともに水蒸気の通過域を構成する凹部とが形成され、
前記コイルはその線体の中心に中空管を有し、前記中空管は冷却液が流される流路である、水蒸気プラズマ生成装置。
Water vapor plasma comprising: a heated body that flows out the flowing water vapor as water vapor plasma, and has conductivity; and a coil that is wound around the heated body and that is supplied with a high frequency and electromagnetically heats the heated body. A generating device,
The heated body is composed of a plurality of heated members integrally connected from the water vapor inflow side to the water vapor plasma outflow side,
The plurality of heated members include a through-hole whose number is gradually reduced from the inflow side of the water vapor to the outflow side of the water vapor plasma, and the water vapor together with the through hole on at least one of the surfaces facing each other. And a recess that constitutes the passband of
The said coil has a hollow tube in the center of the linear body, The said hollow tube is a water vapor | steam plasma generation apparatus which is a flow path through which a cooling fluid flows.
前記被加熱部材は、円盤状であることを特徴とする請求項1に記載の水蒸気プラズマ生成装置。   The water vapor plasma generation apparatus according to claim 1, wherein the member to be heated has a disk shape. 前記被加熱部材の凹部は、溝であることを特徴とする請求項1または2に記載の水蒸気プラズマ生成装置。   The water vapor plasma generation apparatus according to claim 1, wherein the concave portion of the member to be heated is a groove. 前記流出する水蒸気プラズマの温度が250℃以上であることを特徴とする請求項1乃至3のいずれか1項に記載の水蒸気プラズマ生成装置。   4. The water vapor plasma generation apparatus according to claim 1, wherein a temperature of the water vapor plasma flowing out is 250 ° C. or more. 5. 前記高周波の出力が30kW以上であることを特徴とする請求項1乃至4のいずれか1項に記載の水蒸気プラズマ生成装置。   The water vapor plasma generation apparatus according to any one of claims 1 to 4, wherein the high-frequency output is 30 kW or more. 流入した水蒸気を水蒸気プラズマとして流出させるとともに導電性を有する被加熱体と、前記被加熱体に巻回されるとともに、高周波が供給され前記被加熱体を電磁誘導加熱するコイルとを備えた水蒸気プラズマ生成装置と、前記水蒸気プラズマ生成装置により生成された水蒸気プラズマを被処理物に照射させるための滅菌・殺菌処理室とを備えた滅菌・殺菌装置であって、
前記被加熱体は、水蒸気の流入側から水蒸気プラズマの流出側へ向かって一体に連設された複数の被加熱部材により構成され、
前記複数の被加熱部材には、配置位置が水蒸気の流入側から水蒸気プラズマの流出側に向かうにつれて徐々に数が減らされた貫通孔と、それぞれが対向する面の少なくとも一方に前記貫通孔とともに水蒸気の通過域を構成する凹部とが形成され、
前記コイルはその線体の中心に中空管を有し、前記中空管は冷却液が流される流路であり、
前記滅菌・殺菌処理室は、生成された水蒸気プラズマを被処理物に照射するための開口部が側壁に形成された円筒状の本体と、前記本体の上方に配置された被処理物投入口とを備えることを特徴とする滅菌・殺菌装置。
Water vapor plasma comprising: a heated body that flows out the flowing water vapor as water vapor plasma, and has conductivity; and a coil that is wound around the heated body and that is supplied with a high frequency and electromagnetically heats the heated body. A sterilization / sterilization apparatus comprising a generation apparatus and a sterilization / sterilization treatment chamber for irradiating a workpiece with water vapor plasma generated by the water vapor plasma generation apparatus,
The heated body is composed of a plurality of heated members integrally connected from the water vapor inflow side to the water vapor plasma outflow side,
The plurality of heated members include a through-hole whose number is gradually reduced from the inflow side of the water vapor to the outflow side of the water vapor plasma, and the water vapor together with the through hole on at least one of the surfaces facing each other. And a recess that constitutes the passband of
The coil has a hollow tube at the center of the wire, and the hollow tube is a flow path through which a coolant flows.
The sterilization / sterilization chamber includes a cylindrical main body having an opening formed on a side wall for irradiating the processed water vapor plasma to the processing object, and a processing object inlet disposed above the main body. A sterilization / sterilization apparatus comprising:
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JP2016185083A (en) * 2015-03-27 2016-10-27 大亜真空株式会社 Hull processing method, and hull processing device
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JPWO2014003197A1 (en) * 2012-06-29 2016-06-02 晴康 南 How to get rice oil and defatted rice cake from fresh rice cake
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