JP4832315B2 - High frequency heating device - Google Patents

High frequency heating device Download PDF

Info

Publication number
JP4832315B2
JP4832315B2 JP2007000025A JP2007000025A JP4832315B2 JP 4832315 B2 JP4832315 B2 JP 4832315B2 JP 2007000025 A JP2007000025 A JP 2007000025A JP 2007000025 A JP2007000025 A JP 2007000025A JP 4832315 B2 JP4832315 B2 JP 4832315B2
Authority
JP
Japan
Prior art keywords
frequency
slit
supply chamber
heated
rotating antenna
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2007000025A
Other languages
Japanese (ja)
Other versions
JP2008166221A (en
Inventor
哲男 窪田
満 本間
貴紀 安部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Appliances Inc
Original Assignee
Hitachi Appliances Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Appliances Inc filed Critical Hitachi Appliances Inc
Priority to JP2007000025A priority Critical patent/JP4832315B2/en
Publication of JP2008166221A publication Critical patent/JP2008166221A/en
Application granted granted Critical
Publication of JP4832315B2 publication Critical patent/JP4832315B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Description

本発明は、回転アンテナを用いて高周波エネルギーを加熱室内に放射し、食品などを高周波加熱する高周波加熱装置に関するものである。   The present invention relates to a high-frequency heating apparatus that radiates high-frequency energy into a heating chamber using a rotating antenna to heat food or the like at high frequency.

従来のこの種の高周波加熱装置は、図6に示すように、加熱室21と、その下部に高周波エネルギーを加熱室21内に供給するための高周波供給室23とを備え、高周波供給室23内には図7に示す回転アンテナ26が設けられている。   As shown in FIG. 6, the conventional high-frequency heating apparatus of this type includes a heating chamber 21 and a high-frequency supply chamber 23 for supplying high-frequency energy into the heating chamber 21 at a lower portion thereof. 7 is provided with a rotating antenna 26 shown in FIG.

高周波供給室23には、底面に結合穴25が設けられ、この結合穴25には導波管24が接続され、導波管24の他端部には高周波エネルギーを発生するマグネトロン28が接続されていて、高周波エネルギーは導波管24を伝送し結合穴25を介して高周波供給室23内に供給される。   A coupling hole 25 is provided in the bottom surface of the high frequency supply chamber 23, a waveguide 24 is connected to the coupling hole 25, and a magnetron 28 that generates high frequency energy is connected to the other end of the waveguide 24. The high frequency energy is transmitted through the waveguide 24 and supplied into the high frequency supply chamber 23 through the coupling hole 25.

回転アンテナ26は、結合穴25を通して高周波供給室23外に設けた駆動装置29と接続され回転させられる。   The rotating antenna 26 is connected to a driving device 29 provided outside the high-frequency supply chamber 23 through the coupling hole 25 and is rotated.

被加熱物である食品は、高周波供給室23の上方に備えられた誘電体からなる被加熱物載置板22の上に載せられ、回転アンテナ26の回転により加熱室21内の各方向に散乱された高周波エネルギーにより高周波加熱させられる。   The food that is the object to be heated is placed on the object to be heated placing plate 22 made of a dielectric provided above the high frequency supply chamber 23, and scattered in each direction in the heating chamber 21 by the rotation of the rotating antenna 26. High frequency heating is performed by the generated high frequency energy.

回転アンテナ26は、図7に示すように金属製円板を円形状や、長方形状,扇形状などに切り抜いたスリット27で構成したものである(例えば、特許文献1参照)。   As shown in FIG. 7, the rotating antenna 26 includes a slit 27 formed by cutting a metal disk into a circular shape, a rectangular shape, a fan shape, or the like (see, for example, Patent Document 1).

特開2002−286229号公報JP 2002-286229 A

しかしながら、上記の従来技術において、回転アンテナ26から加熱室21内に放射される高周波エネルギーは、加熱室21の形状により被加熱物載置板22に載置された食品などの被加熱物の中心部が弱く、外周部が強かったり、逆に中心部が強く、外周部が弱いというような加熱むらが発生するという問題点があった。   However, in the above-described prior art, the high frequency energy radiated from the rotating antenna 26 into the heating chamber 21 is the center of a heated object such as food placed on the heated object mounting plate 22 due to the shape of the heating chamber 21. There is a problem that uneven heating occurs such that the portion is weak and the outer peripheral portion is strong, or conversely the central portion is strong and the outer peripheral portion is weak.

また、回転アンテナ26の形状、特にスリット27の形状や設置位置などにより、マグネトロン28から効率よく高周波エネルギーが発生しなかったり、高周波エネルギーが伝送する伝送路における反射電力増大などのミスマッチングにより、被加熱物が効率よく加熱されないという問題点があった。   Further, depending on the shape of the rotating antenna 26, particularly the shape of the slit 27, the installation position, etc., high frequency energy is not efficiently generated from the magnetron 28, or due to mismatching such as an increase in reflected power in the transmission path through which the high frequency energy is transmitted. There was a problem that the heated product was not heated efficiently.

本発明は上記の問題を解決するためになされたものであり、被加熱物を収容する加熱室と、この加熱室の底面に設けられた誘電体からなる被加熱物載置板と、この被加熱物載置板の下方に設けられた高周波供給室と、この高周波供給室の底面に設けられ高周波エネルギーを前記高周波供給室に供給するための結合穴と、高周波エネルギーを発生するマグネトロンと、このマグネトロンが取り付けられ、前記結合穴に接続されて高周波エネルギーを供給する導波管と、前記結合穴を貫通して前記高周波供給室内へ略垂直に臨んで設けられた内導体と、この内導体の一端に前記高周波供給室内に略水平に連結された金属製平板の回転アンテナと、前記内導体の前記導波管内で連結された誘電体軸と、この誘電体軸を回転駆動する駆動部とを備え、前記回転アンテナに中心部を始点とし外周側に向かって渦巻状のスリットを2個対称に設け、前記スリットの幅は中心部より外周側を広くし、前記渦巻状のスリットのそれぞれの始点と始点,終点と終点間の間隔をそれぞれ前記マグネトロンの発振周波数の1/2波長と、1波長にしたものである。 The present invention has been made in order to solve the above-described problems. A heating chamber for storing a heated object, a heated object mounting plate made of a dielectric provided on the bottom surface of the heated chamber, and the covered object. A high-frequency supply chamber provided below the heated object mounting plate, a coupling hole provided in the bottom surface of the high-frequency supply chamber for supplying high-frequency energy to the high-frequency supply chamber, a magnetron for generating high-frequency energy, A magnetron is attached and connected to the coupling hole to supply high-frequency energy; an inner conductor provided through the coupling hole and facing substantially vertically into the high-frequency supply chamber; and A metal flat plate rotating antenna connected to the one end of the high-frequency supply chamber substantially horizontally, a dielectric shaft connected in the waveguide of the inner conductor, and a drive unit that rotationally drives the dielectric shaft. Prepared, Serial toward the outer peripheral side starting from the central portion to the rotating antenna provided a spiral slit in two symmetrical, the width of the slit is wider radially outward of the central portion, each of the start point and the start point of the spiral slit , And the interval between the end points are set to ½ wavelength and 1 wavelength of the oscillation frequency of the magnetron, respectively .

また、前記渦巻状のスリットの幅は外周側へ行くに従い連続的に広くしたものである。   Further, the width of the spiral slit is continuously increased toward the outer peripheral side.

本発明の高周波加熱装置は、上記のように構成したことにより、回転アンテナから放射される高周波エネルギーが均一に放射されるため、被加熱物全体に高周波エネルギーが照射され、加熱むらの少ない高周波加熱装置を提供することが出来る。   Since the high-frequency heating device of the present invention is configured as described above, the high-frequency energy radiated from the rotating antenna is uniformly radiated. A device can be provided.

また、回転アンテナに対し高周波エネルギーの結合度が増大するため、反射される高周波エネルギーが減少して加熱室内に高周波エネルギーが効率よく放射されることにより、被加熱物が短時間で加熱される。   In addition, since the degree of coupling of high-frequency energy to the rotating antenna increases, the high-frequency energy that is reflected decreases and the high-frequency energy is efficiently radiated into the heating chamber, whereby the object to be heated is heated in a short time.

以下、本発明の一実施例を図1〜図5を参照して説明する。   An embodiment of the present invention will be described below with reference to FIGS.

図1は本発明の一実施例を示す高周波加熱装置の要部縦断面図である。被加熱物を収容する加熱室1は、底面に誘電体からなる例えば結晶化ガラスで構成された被加熱物載置板2が備えられ、この被加熱物載置板2の下方には高周波供給室3が設けられ、この高周波供給室3内には回転アンテナ8が設けられている。   FIG. 1 is a longitudinal sectional view of an essential part of a high-frequency heating apparatus showing an embodiment of the present invention. A heating chamber 1 for storing an object to be heated is provided with an object mounting plate 2 made of, for example, crystallized glass made of a dielectric on the bottom, and a high frequency supply is provided below the object to be heated mounting plate 2. A chamber 3 is provided, and a rotating antenna 8 is provided in the high-frequency supply chamber 3.

高周波供給室3の底面中央部には、高周波エネルギーを高周波供給室3に供給するための結合穴6が設けられ、この結合穴6に接続された導波管5と、導波管5の他端に接続された高周波エネルギーを供給するマグネトロン4により、高周波供給室3内に高周波エネルギーが供給される。   A coupling hole 6 for supplying high-frequency energy to the high-frequency supply chamber 3 is provided at the center of the bottom surface of the high-frequency supply chamber 3, and the waveguide 5 connected to the coupling hole 6, The high frequency energy is supplied into the high frequency supply chamber 3 by the magnetron 4 that supplies the high frequency energy connected to the end.

結合穴6には、この結合穴6を貫通して高周波供給室3内に略垂直に臨んだ内導体7を有し、この内導体7の一端には高周波供給室3内の回転アンテナ8が略水平に連結されている。   The coupling hole 6 has an inner conductor 7 that penetrates the coupling hole 6 and faces the vertical direction in the high-frequency supply chamber 3. A rotating antenna 8 in the high-frequency supply chamber 3 is connected to one end of the inner conductor 7. They are connected approximately horizontally.

内導体7の導波管5内に臨む他端には、誘電体で構成された誘電体軸9の一端が連結され、誘電体軸9の他端は導波管5に開けられた穴10を通して導波管5の下部に設けられた駆動部11に連結されていて、この駆動部11により誘電体軸9と内導体7を介して回転アンテナ8は回転させられる。   One end of a dielectric shaft 9 made of a dielectric is connected to the other end of the inner conductor 7 facing the waveguide 5, and the other end of the dielectric shaft 9 is connected to a hole 10 formed in the waveguide 5. The rotating antenna 8 is rotated by the driving unit 11 through the dielectric shaft 9 and the inner conductor 7.

被加熱物である食品12は、被加熱物載置板2の上に載せられ、高周波供給室3内に供給されて回転アンテナ8の回転により加熱室1内の各方向に散乱させられた高周波エネルギーにより高周波加熱させられる。   The food 12 as the object to be heated is placed on the object to be heated placing plate 2, supplied to the high frequency supply chamber 3, and scattered in each direction in the heating chamber 1 by the rotation of the rotating antenna 8. High frequency heating is performed by energy.

図2は回転アンテナ8の平面図である。回転アンテナ8は、アルミニウム等の良導電性の金属製平板で厚さ1mm,直径190mmの円板に中心部から外周側に向かって左巻きの渦巻状のスリット8aを2個対称に設けるとともに、中心部のスリット幅をW1とし、外周側のスリット幅をW2とし、スリット8aの幅を中心部から外周側にいくに従い連続的に広くして、中心部が狭く外周側が広くなるように設けられている。なお、スリット8aの幅は中心部から外周側にいくに従い連続的に広くするのではなく、段階的に広くしても良い。   FIG. 2 is a plan view of the rotating antenna 8. The rotating antenna 8 is a flat plate made of a highly conductive metal such as aluminum, and is provided with two spiral-shaped slits 8a that are left-handed from the central portion to the outer peripheral side of a circular plate having a thickness of 1 mm and a diameter of 190 mm. The slit width of the part is W1, the slit width of the outer peripheral side is W2, and the width of the slit 8a is continuously increased from the central part to the outer peripheral side, and the central part is narrow and the outer peripheral side is widened. Yes. The width of the slit 8a may be increased stepwise instead of continuously increasing from the center to the outer peripheral side.

このように渦巻き状のスリット8aを設けた回転アンテナ8は一般的にスパイラルアンテナと呼ばれ、このようなスパイラルアンテナの放射特性はスリット幅に変化がなく、一定の幅であればアンテナ中心部の放射が強く、これを加熱に用いた場合、アンテナの真上の被加熱物載置板2上の食品などの被加熱物は、アンテナの中心部に位置した部分が強く外周部が弱く加熱される傾向にある。   The rotating antenna 8 provided with the spiral slit 8a as described above is generally called a spiral antenna, and the radiation characteristic of such a spiral antenna has no change in the slit width. When radiation is strong and this is used for heating, the object to be heated such as food on the object-to-be-heated object mounting plate 2 just above the antenna is heated at the center part of the antenna and the outer peripheral part is weak. It tends to be.

そこで、本発明では回転アンテナ8に設けたスリット8aの幅を、中心部が狭く、外周側を広くし、さらには中心部から外周側に行くにつれて連続的に広くして回転アンテナ8からの高周波エネルギーがスリット8a全体から均一に放射されるように制御している。   Therefore, in the present invention, the width of the slit 8a provided in the rotating antenna 8 is narrow at the center, widened at the outer periphery, and continuously widened from the center toward the outer periphery. The energy is controlled to be uniformly emitted from the entire slit 8a.

すなわち、本実施例では図2に示す回転アンテナ8の中心部のスリット幅W1は12mm、外周部のスリット幅W2は24mmとしている。   That is, in this embodiment, the slit width W1 at the center of the rotating antenna 8 shown in FIG. 2 is 12 mm, and the slit width W2 at the outer periphery is 24 mm.

また、対称に2個設けた渦巻状のスリット8aのそれぞれの始点と始点,終点と終点間の間隔P1,P2は、およそマグネトロン4の発振周波数の1/2波長と、1波長に設定し、回転アンテナ8に供給される高周波エネルギーの電界最大点となる位置にスリット
8aの始点と、終点が位置するように設けたことにより高周波エネルギーの結合が増大するようにしている。本実施例では、マグネトロン4の発振周波数を2450MHzとし、図2に示す回転アンテナ8の渦巻状のスリット8aのそれぞれの始点と始点,終点と終点の間隔P1,P2はおよそ60mmと、120mmとにしている。
In addition, the spacing P1, P2 between the start point and the start point, and the end point and the end point of each of the two spiral slits 8a provided symmetrically is set to approximately one half wavelength and one wavelength of the oscillation frequency of the magnetron 4, The coupling of the high frequency energy is increased by providing the slit 8a so that the start point and the end point are positioned at the position where the electric field maximum point of the high frequency energy supplied to the rotating antenna 8 is located. In this embodiment, the oscillation frequency of the magnetron 4 is set to 2450 MHz, and the intervals P1 and P2 between the start point and the start point and the end point and the end point of the spiral slit 8a of the rotating antenna 8 shown in FIG. ing.

次に、以上の構成による作用を説明する。   Next, the effect | action by the above structure is demonstrated.

マグネトロン4から発生した高周波エネルギーは、導波管5を伝播し高周波供給室3の底面中央部に設けられた結合穴6と内導体7との同軸結合により高周波供給室3に伝播する。   The high frequency energy generated from the magnetron 4 propagates through the waveguide 5 and propagates to the high frequency supply chamber 3 by the coaxial coupling between the coupling hole 6 provided in the center of the bottom surface of the high frequency supply chamber 3 and the inner conductor 7.

高周波供給室3内で、左巻きにスリット8aが形成された回転アンテナ8を駆動部11により右回転させると、渦巻き状のスリット8aが回転につれて徐々に外周部に移動していくので、これに伴ってスリット8a部から放射される高周波エネルギーが外周部に移動して拡散し、散乱され、被加熱物12の加熱むらを改善する。   In the high-frequency supply chamber 3, when the rotating antenna 8 having the slit 8a formed in the left turn is rotated to the right by the drive unit 11, the spiral slit 8a gradually moves to the outer peripheral portion as it rotates. Then, the high frequency energy radiated from the slit 8a moves to the outer peripheral portion and diffuses and is scattered, thereby improving the uneven heating of the article 12 to be heated.

この加熱むらの改善の効果を調べるため次のような試験を行った。   In order to investigate the effect of improving the heating unevenness, the following test was conducted.

まず、図3に示すような回転アンテナ13の2個対称に設けられた渦巻状のスリット
13aのスリット幅を、図2に示す本発明の実施例の回転アンテナ8に設けられた渦巻き状のスリット幅W1とW2の中間の値である18mmとし、このスリット幅を中心部の始点から外周部の終点まで一定としたものと、図2に示す本発明の実施例の回転アンテナ8を用いて、被加熱物載置板2の上に載置された被加熱物12がどのような温度分布で加熱されるかをTLM法を用いた電磁界解析手法でコンピュータで計算して求めた。なお、スリット13aのそれぞれの始点間と、終点間の間隔は図2に示す実施例の回転アンテナ8と同じとした。
First, the slit width of the spiral slit 13a provided symmetrically with the two rotating antennas 13 as shown in FIG. 3 is set to the spiral slit provided in the rotating antenna 8 of the embodiment of the present invention shown in FIG. Using the rotating antenna 8 of the embodiment of the present invention shown in FIG. 2 with a slit width of 18 mm which is an intermediate value between the widths W1 and W2, and the slit width being constant from the start point of the central part to the end point of the outer peripheral part. The temperature distribution of the object to be heated 12 placed on the object-to-be-heated object mounting plate 2 was calculated by calculating with a computer using an electromagnetic field analysis method using the TLM method. In addition, the space | interval between each starting point of slit 13a, and the space | interval between end points were made the same with the rotating antenna 8 of the Example shown in FIG.

このときの解析条件は、被加熱物12の直径が330mmで厚みが10mmの冷凍ビザパイを想定し、解析時の物理定数は比誘電率4.4,導電率0.0722s/m,密度794kg/m3とした。 The analysis conditions at this time are assumed to be a frozen visa pie with a heated object 12 having a diameter of 330 mm and a thickness of 10 mm. The physical constant at the time of analysis is a relative permittivity of 4.4, conductivity of 0.0722 s / m, density of 794 kg / It was m 3.

また、解析方法はこの被加熱物を174,000 個のセルに分解してその各々の温度上昇値を解析により計算し、図1に示されたように被加熱物12の1/2の厚みにおけるA−A′で見たx−z面の温度分布を図4に示すように明暗で表示した。なお、明るい部分は温度上昇が高く、暗い部分は温度上昇が低いことを示している。また、各セルの温度上昇値から変動係数を求め、加熱むらの評価を行った。   Further, the analysis method is to decompose this heated object into 174,000 cells and calculate the temperature rise value of each cell by analysis, and as shown in FIG. As shown in FIG. 4, the temperature distribution on the xz plane viewed along AA 'in FIG. The bright part shows a high temperature rise, and the dark part shows a low temperature rise. In addition, the coefficient of variation was obtained from the temperature rise value of each cell, and the heating unevenness was evaluated.

その結果、図4(a)に示すスリット13aの幅が一定の回転アンテナ13の場合の被加熱物12の加熱温度分布は、被加熱物12の中央部すなわちh1部分が周辺部すなわちh2部分より明るくなっており、中央部の温度が高い温度分布となっている。それに対し図4(b)に示すスリット幅が中心部が狭く外周側が広くなるように設けられた本実施例の回転アンテナ8の場合の被加熱物12の加熱温度分布は、中央部のh3と周辺部のh4の明るさが同程度であり、さらに、被加熱物12は全体的に温度が上昇している。   As a result, the heating temperature distribution of the object to be heated 12 in the case of the rotating antenna 13 having the constant width of the slit 13a shown in FIG. It is bright and has a high temperature distribution in the center. On the other hand, the heating temperature distribution of the object to be heated 12 in the case of the rotating antenna 8 of this embodiment provided with the slit width shown in FIG. The brightness of h4 in the peripheral portion is similar, and the temperature of the object to be heated 12 is rising as a whole.

また、このときの図4(b)の結果による各セルの温度上昇値から求めた変動係数は
0.39であり、図4(a)の変動係数は0.51であった。変動係数は数値が小さいほど加熱むらが小さいことから、スリット幅を中心部から外周側に行くにつれて連続的に広くして、中心部が狭く外周側が広くなるように設けられた本実施例の回転アンテナ8を用いることにより、大幅な加熱むらの改善が確かめられた。
Further, the coefficient of variation obtained from the temperature rise value of each cell based on the result of FIG. 4B at this time was 0.39, and the coefficient of variation of FIG. 4A was 0.51. As the coefficient of variation is smaller, the unevenness of heating is smaller, so the slit width is continuously increased from the central part to the outer peripheral side, and the rotation of this embodiment is provided so that the central part is narrow and the outer peripheral side is widened. By using the antenna 8, a significant improvement in heating unevenness was confirmed.

このように、回転アンテナ8から放射される高周波エネルギーが均一に放射されるようになるため、被加熱物12全体に高周波エネルギーが照射され加熱むらの少ない高周波加熱装置を提供することが出来る。   Thus, since the high frequency energy radiated | emitted from the rotating antenna 8 comes to be radiated | emitted uniformly, the high frequency energy is irradiated to the to-be-heated material 12 whole, and the high frequency heating apparatus with few uneven heating can be provided.

次に、図5に示すように本発明の実施例の回転アンテナ8を用いた場合について、被加熱物載置板2の上に載置された被加熱物12がどのような電力密度分布となるかをTLM法を用いた電磁界解析手法でコンピュータにより計算して求めた。なお、明るい部分は電力密度が大きく、暗い部分は電力密度が小さいことを示している。図5では本実施例の回転アンテナ8に対応して解析で得られた電力密度分布を記載している。その結果、各々1/2波長,1波長と対称に設けた渦巻状のスリット8aそれぞれの始点,終点部の部分は明るくなっており電力密度が大きいことがわかる。このことは回転アンテナ8に供給された高周波エネルギーの電界最大点となる位置にスリット8aの始点と終点が位置することを示している。   Next, as shown in FIG. 5, in the case where the rotating antenna 8 of the embodiment of the present invention is used, what kind of power density distribution the heated object 12 placed on the heated object placing plate 2 has It was calculated by a computer using an electromagnetic field analysis method using the TLM method. The bright part indicates that the power density is high, and the dark part indicates that the power density is low. FIG. 5 shows the power density distribution obtained by analysis corresponding to the rotating antenna 8 of this embodiment. As a result, it can be seen that the start point and the end point of each of the spiral slits 8a provided symmetrically with respect to the half wavelength and the one wavelength are bright and the power density is high. This indicates that the starting point and the ending point of the slit 8a are located at the position that is the electric field maximum point of the high-frequency energy supplied to the rotating antenna 8.

したがって、対称に設けた渦巻状のスリット8aのそれぞれの始点と始点,終点と終点までの間隔を各々1/2波長,1波長に選ぶことにより、高周波エネルギーの結合が増大し、回転アンテナ8で反射される高周波エネルギーが減少して加熱室1内に高周波エネルギーが効率よく導入され、被加熱物12が短時間で加熱できる高周波加熱装置を提供することができる。   Therefore, by selecting the start point and start point, and the interval between the end point and end point of the spiral slits 8a provided symmetrically to be ½ wavelength and 1 wavelength, respectively, the coupling of high frequency energy is increased, and the rotating antenna 8 The high-frequency heating apparatus that reduces the reflected high-frequency energy and efficiently introduces the high-frequency energy into the heating chamber 1 and can heat the article to be heated 12 in a short time can be provided.

このように、回転アンテナ8から放射される高周波エネルギーが均一に放射されるようになるため、被加熱物12全体に高周波エネルギーが照射され、加熱むらの少ない高周波加熱装置を提供することが出来る。   Thus, since the high frequency energy radiated | emitted from the rotating antenna 8 comes to radiate | emit uniformly, high frequency energy is irradiated to the to-be-heated material 12 whole, and the high frequency heating apparatus with few unevenness of a heating can be provided.

また、回転アンテナ8に対し高周波エネルギーの結合度が増大するため、反射される高周波エネルギーが減少して加熱室1内に高周波エネルギーが効率よく放射されることにより、被加熱物12が短時間で加熱される。   In addition, since the degree of coupling of the high frequency energy with respect to the rotating antenna 8 increases, the reflected high frequency energy is reduced and the high frequency energy is efficiently radiated into the heating chamber 1, so that the object to be heated 12 can be shortened in a short time. Heated.

なお、上記実施例で説明した回転アンテナ8の直径やスリット幅W1,W2の寸法は上記の値に限定されるものではなく、同等の効果を奏する範囲内に設定すれば良い。   Note that the diameter of the rotating antenna 8 and the dimensions of the slit widths W1 and W2 described in the above embodiment are not limited to the above values, and may be set within a range in which equivalent effects can be obtained.

また、回転アンテナ8の形状も円板平板である必要はなく、また、スリット8aの巻き方も右巻きであってもかまわない。   Further, the shape of the rotary antenna 8 does not have to be a disc flat plate, and the slit 8a may be wound clockwise.

本発明の一実施例を示す高周波加熱装置の要部縦断面図である。It is a principal part longitudinal cross-sectional view of the high frequency heating apparatus which shows one Example of this invention. 同じく、回転アンテナの平面図である。Similarly, it is a top view of a rotating antenna. スリット幅一定の回転アンテナの平面図である。It is a top view of a rotating antenna with a constant slit width. (a)スリット幅一定の回転アンテナを用いた場合の被加熱物の温度分布を解析した結果を示す図である。(b)本実施例における回転アンテナを用いた場合の被加熱物の温度分布を解析した結果を示す図である。(A) It is a figure which shows the result of having analyzed the temperature distribution of the to-be-heated object at the time of using a rotating antenna with constant slit width. (B) It is a figure which shows the result of having analyzed the temperature distribution of the to-be-heated object at the time of using the rotating antenna in a present Example. 本実施例の回転アンテナ8を用いた場合について被加熱物載置板2の上に載置された被加熱物12の電力密度分布解析結果を示す図である。It is a figure which shows the power density distribution analysis result of the to-be-heated object 12 mounted on the to-be-heated object mounting board 2 about the case where the rotating antenna 8 of a present Example is used. 従来の高周波加熱装置の要部縦断面図である。It is a principal part longitudinal cross-sectional view of the conventional high frequency heating apparatus. 従来の高周波加熱装置の回転アンテナの平面図である。It is a top view of the rotation antenna of the conventional high frequency heating apparatus.

符号の説明Explanation of symbols

1 加熱室
3 高周波供給室
4 マグネトロン
5 導波管
6 結合穴
7 内導体
8 回転アンテナ
8a スリット
9 誘電体軸
11 駆動部
DESCRIPTION OF SYMBOLS 1 Heating chamber 3 High frequency supply chamber 4 Magnetron 5 Waveguide 6 Coupling hole 7 Inner conductor 8 Rotating antenna 8a Slit 9 Dielectric shaft 11 Drive part

Claims (2)

被加熱物を収容する加熱室と、この加熱室の底面に設けられた誘電体からなる被加熱物載置板と、この被加熱物載置板の下方に設けられた高周波供給室と、この高周波供給室の底面に設けられ高周波エネルギーを前記高周波供給室に供給するための結合穴と、高周波エネルギーを発生するマグネトロンと、このマグネトロンが取り付けられ、前記結合穴に接続されて高周波エネルギーを供給する導波管と、前記結合穴を貫通して前記高周波供給室内へ略垂直に臨んで設けられた内導体と、この内導体の一端に前記高周波供給室内に略水平に連結された金属製平板の回転アンテナと、前記内導体の前記導波管内で連結された誘電体軸と、この誘電体軸を回転駆動する駆動部とを備え、前記回転アンテナに中心部を始点とし外周側に向かって渦巻状のスリットを2個対称に設け、前記スリットの幅は中心部より外周側を広くし、
前記渦巻状のスリットのそれぞれの始点と始点,終点と終点間の間隔をそれぞれ前記マグネトロンの発振周波数の1/2波長と、1波長にしたことを特徴とする高周波加熱装置。
A heating chamber for storing the object to be heated, a heated object mounting plate made of a dielectric material provided on the bottom surface of the heating chamber, a high frequency supply chamber provided below the heated object mounting plate, A coupling hole provided on the bottom surface of the high-frequency supply chamber for supplying high-frequency energy to the high-frequency supply chamber, a magnetron for generating high-frequency energy, and the magnetron are attached and connected to the coupling hole to supply high-frequency energy. A waveguide, an inner conductor provided substantially vertically through the coupling hole and facing the high-frequency supply chamber, and a metal flat plate connected to one end of the inner conductor substantially horizontally in the high-frequency supply chamber. A rotating antenna; a dielectric shaft connected within the waveguide of the inner conductor; and a drive unit that rotationally drives the dielectric shaft. Provided slit into two symmetrical, the width of the slit is wider radially outward of the central portion,
A high-frequency heating apparatus, wherein the spiral slit has a start point and a start point, and an interval between the end point and the end point set to ½ wavelength and one wavelength of the oscillation frequency of the magnetron, respectively .
請求項1において、前記渦巻状のスリットの幅は外周側へ行くに従い連続的に広くしたことを特徴とする高周波加熱装置。   2. The high frequency heating apparatus according to claim 1, wherein the width of the spiral slit is continuously increased toward the outer peripheral side.
JP2007000025A 2007-01-04 2007-01-04 High frequency heating device Active JP4832315B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007000025A JP4832315B2 (en) 2007-01-04 2007-01-04 High frequency heating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007000025A JP4832315B2 (en) 2007-01-04 2007-01-04 High frequency heating device

Publications (2)

Publication Number Publication Date
JP2008166221A JP2008166221A (en) 2008-07-17
JP4832315B2 true JP4832315B2 (en) 2011-12-07

Family

ID=39695396

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007000025A Active JP4832315B2 (en) 2007-01-04 2007-01-04 High frequency heating device

Country Status (1)

Country Link
JP (1) JP4832315B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102960060B (en) 2010-07-20 2015-12-16 松下知识产权经营株式会社 Microwave heating equipment

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06268434A (en) * 1993-03-12 1994-09-22 Meisei Electric Co Ltd Equiangular spiral antenna
KR100368943B1 (en) * 1998-07-22 2003-04-10 삼성전자 주식회사 microwave
JP3730854B2 (en) * 2000-11-16 2006-01-05 三菱電機株式会社 High frequency heating device

Also Published As

Publication number Publication date
JP2008166221A (en) 2008-07-17

Similar Documents

Publication Publication Date Title
WO2009084169A1 (en) Cooking device
KR101765837B1 (en) Solid state defrosting system
JP4832315B2 (en) High frequency heating device
JP2008166090A (en) Microwave heating device
JP5467330B2 (en) Microwave heating device
JP2007317411A (en) High-frequency heating apparatus
TWI686104B (en) Microwave heating device
JP2018078034A (en) Heating cooker
US20140197163A1 (en) Microwave mode stirrer apparatus
JP2010251129A (en) High frequency heating device
JP2007042333A (en) High frequency heating device
TWI686103B (en) Microwave heating device
JP2017528884A (en) Direct heating via patch antenna
TWI688311B (en) Microwave heating device
JP3730854B2 (en) High frequency heating device
JP4413034B2 (en) microwave
JP4966648B2 (en) Microwave heating device
WO2011070765A1 (en) Microwave heating device and method for assisting design thereof
JP4966650B2 (en) Microwave heating device
WO2021039872A1 (en) Thawing machine and electrode apparatus for thawing machine
JP5102486B2 (en) Microwave heating device
JP2012009238A (en) High frequency heating apparatus
KR101765836B1 (en) Solid state cooking system
JP2017037817A (en) Microwave heating device
JP4888221B2 (en) Microwave heating device

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20081226

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20081226

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20101217

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20110125

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110223

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20110823

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20110920

R150 Certificate of patent or registration of utility model

Ref document number: 4832315

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140930

Year of fee payment: 3

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350