JP4765248B2 - Magnetic memory - Google Patents

Description

The present invention relates to a magnetic memory , and is particularly suitable for use in a nonvolatile memory.

In information equipment such as a computer, a high-speed and high-density DRAM is widely used as a random access memory.
However, since DRAM is a volatile memory in which information disappears when the power is turned off, a nonvolatile memory in which information does not disappear is desired.

With the rapid spread of information communication devices, especially small personal devices such as portable terminals, the elements such as memory and logic that compose this device are becoming more highly integrated, faster, lower power, etc. There is a demand for higher performance.
In particular, the nonvolatile memory is considered as an indispensable component for enhancing the functionality of the device.
For example, the nonvolatile memory can protect important information of the system and individuals even when the power supply is consumed or troubled or the server and the network are disconnected due to some trouble.
In addition, recent portable devices are designed to reduce power consumption as much as possible by putting unnecessary circuit blocks in a standby state, but realize a nonvolatile memory that can serve both as a high-speed work memory and a large-capacity storage memory. If possible, power consumption and memory waste can be eliminated.
Furthermore, if a high-speed, large-capacity nonvolatile memory can be realized, an “instant-on” function that can be instantly activated when the power is turned on will be possible.

Examples of the nonvolatile memory include a flash memory using a semiconductor and an FRAM (Ferro electric Random Access Memory) using a ferroelectric.
However, the flash memory has a drawback in that it is not suitable for high-speed access because the writing speed is as low as the order of microseconds.
On the other hand, the FRAM has a limited number of rewritable times of 10 ¹² to 10 ^14, and therefore, it is pointed out that the durability is small to completely replace the SRAM and DRAM, and that fine processing of the ferroelectric capacitor is difficult. ing.

  A magnetic random access memory (MRAM) that records information by magnetization of a magnetic material attracts attention as a nonvolatile memory that does not have these drawbacks (see, for example, Non-Patent Document 1). .

The initial MRAM had a configuration based on a spin valve using an AMR (anisotropic magnetoresistive) effect, a GMR (Giant magnetoresistance) effect, or the like (see Non-Patent Document 2 and Non-Patent Document 3).
However, these configurations have a disadvantage that since the load memory cell resistance is as low as 10 to 100Ω, the power consumption per bit during reading is large and it is difficult to increase the capacity.

Therefore, an MRAM having a configuration utilizing a TMR (Tunnel Magnetoresistance) effect has been proposed.
Initially, the resistance change rate at room temperature was only 1 to 2% (see Non-Patent Document 4), but in recent years, a resistance change rate of nearly 20% has been obtained (see Non-Patent Document 5), and the TMR effect is obtained. Attention has been gathered in MRAM using the.

  The MRAM has TMR effect type storage elements arranged in a matrix, and has word write lines and bit write lines that cross the element groups vertically and horizontally in order to record information in specific elements of the element groups. The information is selectively recorded (written) only on the memory element located in the intersecting region.

As a method for recording information in the memory element, there are a method using an asteroid characteristic (for example, refer to Patent Document 1) and a method using a switching characteristic (for example, refer to Patent Document 2).
The method using the asteroid characteristic has a disadvantage that the selectivity depends on the coercive force characteristic of each memory element, and thus is vulnerable to variations in element dimensions and magnetic characteristics.
On the other hand, the method using the switching characteristics has an advantage that a large-scale memory can be easily realized even if there is some characteristic variation for each element because the magnetic field range usable for element selection is wide.

Here, FIG. 7 shows a schematic cross-sectional view of the MRAM using the switching characteristics.
In order to electrically select a memory cell in order to read information recorded in the memory cell, a diode or a MOS transistor can be used, but the configuration shown in FIG. 7 uses a MOS transistor.

First, the configuration of the magnetic memory element 101 that constitutes the memory cell of the MRAM will be described.
The two magnetic layers of the first magnetization fixed layer 112 and the second magnetization fixed layer 114 are disposed via the nonmagnetic layer 113, and thus are antiferromagnetically coupled. Furthermore, the first magnetization fixed layer 112 is disposed in contact with the antiferromagnetic layer 111, and has a strong unidirectional magnetic anisotropy due to exchange interaction acting between these layers. The four layers 111, 112, 113, and 114 constitute the fixed layer 102.
The two magnetic layers of the first storage layer 116 and the second storage layer 118 are disposed via the nonmagnetic layer 117, thereby being antiferromagnetically coupled. The first storage layer 116 and the second storage layer 118 are configured such that the directions of the magnetizations M1 and M2 rotate relatively easily. These three layers 116, 117, and 118 constitute a storage layer (free layer) 103.
A tunnel insulating layer 115 is formed between the second magnetization fixed layer 114 and the first storage layer 116, that is, between the fixed layer 102 and the storage layer (free layer) 103. The tunnel insulating layer 115 functions to cut the magnetic coupling between the upper and lower magnetic layers 116 and 114 and to flow a tunnel current. Thus, a TMR (Tunneling Magnetoresistance) element is formed by the fixed layer 102 in which the magnetization direction of the magnetic layer is fixed, the tunnel insulating layer 115, and the memory layer (free layer) 103 capable of changing the magnetization direction. Is configured.
The above-described layers 111 to 118, the base film 110, and the top coat film 119 constitute a magnetic memory element 101 made of a TMR element.

A selection MOS transistor 131 is formed in the silicon substrate 130, and an extraction electrode 109 is formed on one diffusion layer 133 of the selection MOS transistor 131 via a connection plug 108. A base film 110 of the magnetic memory element 101 is connected on the extraction electrode 109. Although not shown, the other diffusion layer 132 of the selection MOS transistor 131 is connected to a sense line via a connection plug. The gate 107 of the selection MOS transistor is connected to a selection signal line.
The top coat film 119 of the magnetic memory element 101 is connected to the bit line (BL) 106 thereon. A write word line (WL) 105 is disposed below the magnetic memory element 101 via an insulating film.

In the steady state, the magnetization M1 of the first storage layer 116 and the magnetization M2 of the second storage layer 118 are generally in an antiparallel state (a state in which the directions are opposite). Similarly, due to strong antiferromagnetic coupling through the nonmagnetic layer 113, the magnetization M11 of the first magnetization fixed layer 112 and the magnetization M12 of the second magnetization fixed layer 114 are in a substantially complete antiparallel state.
Usually, since the first magnetization fixed layer 112 and the second magnetization fixed layer 114 are configured to have the same saturation magnetization film thickness product, the leakage component of the magnetic pole magnetic field is negligibly small.

FIG. 8 shows a schematic plan view of the MRAM in FIG. 7 as seen from directly above.
The magnetic memory element 101 has an elliptical planar shape, an easy magnetization axis 60 in the major axis direction of the ellipse, a hard magnetization axis 61 in the minor axis direction of the ellipse, and the easy magnetization axis 60 and the hard magnetization axis 61. And are orthogonal.
Further, the bit lines 106 and the word lines 105 are arranged in a lattice pattern, and the angle α formed between them is constant (in FIG. 8, they are almost orthogonal). The magnetic memory element 101 is arranged at the intersection of the word line 105 and the bit line 106 so that the easy axis 60 thereof has an inclination angle θ (0 <θ <90 °) with respect to the word line 105.

In the memory cell having this configuration, when information is recorded in the storage layer 103 of the magnetic storage element 101, the direction of the magnetization M1 of the first storage layer 116 and the magnetization M2 of the second storage layer 118 is reversed. The bit current Ib and the word line current Iw are supplied to the bit line 106 and the word line 105, respectively. The bit line current Ib and the word line current Iw induce a bit line current magnetic field Hb and a word line current magnetic field Hw, respectively. The combined magnetic field of the word line current magnetic field Hw and the bit line current magnetic field Hb forms a rotating magnetic field that rotates clockwise or counterclockwise, as will be described later.
Then, by applying the current magnetic fields Hb and Hw, the direction of the magnetization M1 of the first storage layer 116 and the direction of the magnetization M2 of the second storage layer 118 are changed, so that information (for example, information “1” is stored in the storage layer 103). "Or information" 0 ") can be recorded.
The recorded information can be read by detecting a change in tunnel current due to the magnetoresistive effect.

Here, FIG. 9 shows an example of a magnetization curve when an external magnetic field H is applied in the easy axis direction of the magnetic memory element 101 having the configuration shown in FIG.
The magnitude of the combined magnetization M of the magnetization M1 of the first storage layer 116 and the magnetization M2 of the second storage layer 118 varies significantly depending on the magnitude of the external magnetic field.
The first threshold value is the spin flopping magnetic field Hsf. If the external magnetic field H is less than or equal to the spin flopping magnetic field Hsf, the magnetization M1 of the first memory layer 116 and the magnetization M2 of the second memory layer 118 always maintain an antiparallel state (↑ ↓).
When the external magnetic field H exceeds Hsf, the magnetization M1 of the first storage layer 116 and the magnetization M2 of the second storage layer 118 take a cross magnetization state and antagonize the external magnetic field H. However, the angle formed by the two magnetizations M1 and M2 is 180 degrees or less. If the external magnetic field H is removed from this state, the initial antiparallel state is often restored.
The next threshold value is the saturation magnetic field Hsat. When the external magnetic field H exceeds the saturation magnetic field Hsat, the magnetization M1 of the first storage layer 116 and the magnetization M2 of the second storage layer 118 are in a parallel state (↑↑). Once the external magnetic field H equal to or higher than the saturation magnetic field Hsat is applied, the memory layer 103 forgets the memory of the first anti-parallel state, so that even if the external magnetic field is removed, it does not always return to the initial magnetized state.

Subsequently, in the magnetic memory element 101 of the MRAM of FIG. 7, when the word line current magnetic field Hw and the bit line current magnetic field Hb are applied as the external magnetic field H, the magnetization M1 and the second magnetization M1 of the first memory layer 116 of the memory layer 103 Of the magnetization M2 of the storage layer 118 will be described.
By applying the external magnetic field H, the orientation of the magnetization M1 of the first storage layer 116 and the magnetization M2 of the second storage layer 118 of the storage layer 103 changes as shown in FIG. Can be roughly divided into three types of operations, depending on the relationship between the state before applying the magnetic field and the state after removing the external magnetic field H.

First, the directions of the magnetization M1 of the first storage layer 116 and the magnetization M2 of the second storage layer 118 are reversed between a state before the application of the external magnetic field H and a state after the external magnetic field H is removed ( There is an operation in which the directions of the two magnetizations M1 and M2 are interchanged and change alternately). Hereinafter, such an operation is referred to as a “Toggle operation”.
Further, the magnetization M1 of the first storage layer 116 and the magnetization M2 of the second storage layer 118 are in the same direction in the state before the application of the external magnetic field H and the state after the external magnetic field H is removed. (The directions of the two magnetizations M1 and M2 are not interchanged). Hereinafter, such an operation is referred to as a “No switching operation”.
Furthermore, regardless of the state before the application of the external magnetic field H, in the state after the external magnetic field H is removed, the magnetization M1 of the first storage layer 116 and the magnetization M2 of the second storage layer 118 are determined. There is a movement that changes in the direction. In this operation, while the external magnetic field H is applied, the magnetizations M1 and M2 of the two layers are in the same direction (parallel), and the memory in the antiparallel state before the external magnetic field H is applied is lost. In the state after the external magnetic field H is removed, the magnetizations M1 and M2 of the two layers rotate one-way and change in a certain direction. Hereinafter, such an operation is referred to as a “Direct operation”.

  Next, in each of the three types of operations, a time change in the direction of the current pulse of the word line current Iw and the bit line current Ib and the magnetization M1 of the first storage layer 116 and the magnetization M2 of the second storage layer 118, The time change of the electrical resistance R of the TMR element of the magnetic memory element 101 accompanying the change of magnetization M1, M2 is shown.

First, FIG. 10 shows an example of a current pulse, a temporal change in the magnetization direction of each storage layer, and a temporal change in the electrical resistance of the TMR element in the Toggle operation.
In FIG. 10, in the cycle in which 1-bit recording is performed, the time origin is set as time T0, the time T1, T2, T3, T4, and the direction of the magnetizations M1, M2 until the time finally returns to the steady state. The change of the electrical resistance R of the TMR element is shown. The same applies to the drawings for other operations.

The pulse of the word line current Iw rises at time T1 when a certain time has elapsed from the time origin T0, and falls at time T3. The pulse of the bit line current Ib rises at time T2 and falls at time T4 with a delay from the pulse of the word line current Iw.
By providing a time difference in the current pulse as described above, the direction of the magnetization M1 of the first storage layer 116 and the magnetization M2 of the second storage layer 118 is rotated using the combined magnetic field of the current magnetic fields Hw and Hb as a rotating magnetic field. be able to.
The electric resistance R of the TMR element is low resistance (for example, information “0”) when the direction of the magnetization M1 of the first storage layer 116 and the magnetization M12 of the second magnetization fixed layer 114 are equal. When the direction of the magnetization M1 of the first storage layer 116 and the magnetization M12 of the second magnetization fixed layer 114 are antiparallel, the resistance becomes high (for example, information “1”).

First, at time T0, the magnetization M1 of the first storage layer 116 and the magnetization M2 of the second storage layer 114 are in an antiparallel state, and the angle formed by the two magnetizations M1 and M2 is 180 degrees. It has become.
Between time T1 and time T2, the angle formed by the magnetization M1 of the first storage layer 116 and the magnetization M2 of the second storage layer 118 is 180 degrees or less.
Between time T2 and time T3, the angle formed by the magnetization M1 of the first storage layer 116 and the magnetization M2 of the second storage layer 118 is an acute angle (90 degrees or less).
After time T3, the magnetization M1 of the first storage layer 116 and the magnetization M2 of the second storage layer 118 spin-flop, and return to the antiparallel state again after time T4. At this time, the magnetization M1 of the first storage layer 116 and the magnetization M2 of the second storage layer 118 are reversed in direction with respect to the initial state.

Next, FIG. 11 shows an example of a current pulse, a temporal change in the magnetization direction of each storage layer, and a temporal change in the electrical resistance of the TMR element in the No switching operation.
In this example, the pulse of the word line current Iw is in the opposite direction to that in FIG. The pulse of the bit line current Ib is the same as in FIG.

The pulse of the word line current Iw rises at time T1 when a certain time has elapsed from time T0 at the time origin, and falls at time T3. The pulse of the bit line current Ib rises at time T2 and falls at time T4 with a delay from the pulse of the word line current Iw.
By providing a time difference in the current pulse as described above, the direction of the magnetization M1 of the first storage layer 116 and the magnetization M2 of the second storage layer 118 is rotated using the combined magnetic field of the current magnetic fields Hw and Hb as a rotating magnetic field. be able to.

First, at time T0, the magnetization M1 of the first storage layer 116 and the magnetization M2 of the second storage layer 114 are in an antiparallel state, and the angle formed by the two magnetizations M1 and M2 is 180 degrees. It has become.
Between time T1 and time T2, the angle formed by the magnetization M1 of the first storage layer 116 and the magnetization M2 of the second storage layer 118 is 180 degrees or less.
In this case, between time T2 and time T3, the direction of the rotating magnetic field formed by the word line current magnetic field Hw and the bit line current magnetic field Hb is the direction of the easy axis of magnetization (positive or negative) of the magnetic memory element 101. Spin flopping does not occur because it does not face any direction. As a result, after time T4, the magnetization state does not change with respect to the initial state.

Next, examples of the current pulse, the time change of the magnetization direction of each storage layer, and the time change of the electric resistance of the TMR element in the direct operation are shown in FIGS. 12 and 13, respectively.
In the example shown in FIG. 12, all current pulses are in the same direction as in FIG. On the other hand, in the example shown in FIG. 13, the current pulses are all directed in the opposite direction to FIG.

12 and 13, the pulse of the word line current Iw rises at time T1 when a certain time has elapsed from time T0 of the time origin, and falls at time T3. The pulse of the bit line current Ib rises at time T2 and falls at time T4 with a delay from the pulse of the word line current Iw.
By providing a time difference in the current pulse as described above, the direction of the magnetization M1 of the first storage layer 116 and the magnetization M2 of the second storage layer 118 is rotated using the combined magnetic field of the current magnetic fields Hw and Hb as a rotating magnetic field. be able to.

First, at time T0, the magnetization M1 of the first storage layer 116 and the magnetization M2 of the second storage layer 114 are in an antiparallel state, and the angle formed by the two magnetizations M1 and M2 is 180 degrees. It has become.
From time T1 to time T2, spin flopping occurs, and the angle formed by the magnetization M1 of the first memory layer 116 and the magnetization M2 of the second memory layer 118 is 90 degrees or less.
Between time T2 and time T3, the directions of the magnetization M1 of the first storage layer 116 and the magnetization M2 of the second storage layer 118 are substantially the same, and the word line current magnetic field Hw and the bit line current are aligned. The direction of the rotating magnetic field formed by the magnetic field Hb is almost equal.
After time T3, the magnetization M1 of the first storage layer 116 and the magnetization M2 of the second storage layer 118 spin-flop and return to the antiparallel state again, but the magnetization state does not depend on the initial state.

  Next, FIG. 14 shows a magnetization rotation mode diagram showing the respective occurrence states of the three types of magnetization rotation operations when the amplitude and direction of the word line current magnetic field Hw and the bit line current magnetic field Hb are changed.

As shown in FIG. 14, if the combined magnetic field of the bit line current magnetic field Hb and the word line current magnetic field Hw is equal to or lower than the spin flopping magnetic field Hsf, the entire region is the region 81 of the No switching operation. The second quadrant and the fourth quadrant, in which the combined magnetic field of the bit line current magnetic field Hb and the word line current magnetic field Hw is other than the easy axis direction, are also generally No switching operation regions 81.
On the other hand, the area where the combined magnetic field of the bit line current magnetic field Hb and the word line current magnetic field Hw exceeds the saturation magnetic field Hsat often becomes the area 82 of the Direct operation.
The combined magnetic field of the bit line current magnetic field Hb and the word line current magnetic field Hw is not less than the spin flopping magnetic field Hsf and less than the saturation magnetic field Hsat, and the range belonging to the first quadrant and the third quadrant is the Toggle operation region 80. Can be expected.

  If there is an asymmetry in the two stable states (↑ ↓ and ↓ ↑) formed by the magnetization M1 of the first storage layer 116 and the magnetization M2 of the second storage layer 118, the Toggle operation region 80 and No switching are used. A Direct operation region may appear at the boundary of the operation region 81.

  In a memory cell group arranged in a matrix, in order to selectively reverse magnetization of only a specific memory cell arranged at the intersection of a word line and a bit line, the word line and bit line to which the selected memory cell belongs Current is passed through.

At this time, the combined magnetic field applied to the selected memory cell needs to be included in the range of the region 80 of the Toggle operation or the region 82 of the Direct operation.
On the other hand, in order to avoid the magnetization reversal of the unselected memory cells sharing the word line or the bit line, the combined magnetic field applied to the unselected memory cells is included in the range of the region 81 of the No switching operation. It is necessary to be.

Wang et al., IEEE Trans.Magn., 1997, Vol.33, p.4498 J.M.Daughton, Thin Solid Films, 1992, vol.216, p.162-168 D.D.Tang et al., IEDM Technical Digest, 1997, p.995-997 R. Meservey et al., Pysics Reports, 1994, vol.238, p.214-217 T. Miyazaki et al., J. Magnetism & Magnetic Material, 1995, vol. 139, L231 JP 10-116490 A US Patent Application Publication No. 2003/0072174

As described above, in the conventional configuration of the MRAM using the switching characteristics, bit information is recorded using two or more ferromagnetic layers as the storage layer (free layer).
These two or more ferromagnetic layers are 180 ° antiferromagnetically coupled or magnetostatically coupled between the respective layers.

  The 180 ° antiferromagnetic coupling is a coupling caused by so-called RKKY (Rudeman-Kittel-Kasuya-Yoshida) exchange interaction, and the magnetization direction is antiparallel in each ferromagnetic layer of the memory layer (↑ ↓ and ↓ ↑ ) Has the effect of minimizing the magnetic energy of the system.

However, the saturation magnetic field Hsat can be enhanced by the ferromagnetic layers of the memory layer being 180 ° antiferromagnetically coupled, but the spin flopping magnetic field Hsf is also enhanced.
The saturation magnetic field determines the upper limit of the region 80 of the Toggle operation in the magnetization rotation mode diagram as shown in FIG. 14, and the spin flopping magnetic field also determines the lower limit of the region 80 of the Toggle operation.
Therefore, the magnetic memory using 180 ° antiferromagnetic coupling has a problem that the Toggle operation region 80, that is, the operation region is wide, but the peak value of the current pulse becomes large.

  On the other hand, magnetostatic coupling is a magnetostatic interaction that minimizes the magnetic energy of the system when the direction of magnetization is antiparallel (↑ ↓ and ↓ ↑) in each ferromagnetic layer of the memory layer. There is. This magnetostatic coupling is a special state that represents when the 180 ° antiferromagnetic coupling is zero.

However, when only magnetostatic coupling occurs between the ferromagnetic layers of the storage layer, the spin flopping magnetic field Hsf is reduced, but the saturation magnetic field Hsat is also reduced.
Therefore, the magnetic memory using magnetostatic coupling has a problem that the peak value of the current pulse is low, but the operating region is narrowed.

  In other words, the magnetic memory using 180 ° antiferromagnetic coupling is stable in operation, but consumes a large amount of power because the peak value of the current pulse is large. On the other hand, a magnetic memory using magnetostatic coupling has low power consumption due to the low peak value of the current pulse, but the operation becomes somewhat unstable.

  In order to reduce the power consumption and improve the reliability of the magnetic memory, it is desirable to reduce the peak value of the current pulse as much as possible.

In order to solve the above-described problems, the present invention provides a magnetic memory that can ensure a wide operation region and operate stably, and can reduce power consumption.

In the magnetic memory of the present invention, the storage layer that holds information according to the magnetization state of the magnetic material is composed of a plurality of magnetic layers , and the magnetization direction is fixed to the storage layer via the nonmagnetic layer. The thickness of each non- magnetic layer that separates the magnetic layers of the storage layer or the thickness of each magnetic layer of the storage layer is not the same. A magnetic memory element having 90 ° antiferromagnetic coupling between them, a first wiring and a second wiring intersecting with each other, and magnetic fields are respectively present in the vicinity of the intersection where the first wiring and the second wiring intersect. A storage element is disposed , and a current is applied to the magnetic storage element by passing a current through the first wiring and the second wiring, thereby recording information, and the storage layer and the magnetization fixed layer of the magnetic storage element The direction of easy axis of magnetization is inclined with respect to the first wiring and the second wiring. It is those wherein a direction having.

According to the above-described configuration of the magnetic memory of the present invention, the storage layer that holds information according to the magnetization state of the magnetic material is composed of a plurality of magnetic layers, and the thickness of each nonmagnetic layer that separates the magnetic layers of the storage layer , Alternatively, the thickness of each magnetic layer of the storage layer or any one of the thicknesses is not the same, and the magnetic storage element having 90 ° antiferromagnetic coupling between the magnetic layers of the storage layer and the first crossing each other A magnetic memory element is disposed near the intersection where the first wiring and the second wiring intersect, and a current is passed through the first wiring and the second wiring. Information is recorded by applying a current magnetic field to the magnetic memory element, and the magnetization easy axis directions of the memory layer and the magnetization fixed layer of the magnetic memory element are inclined with respect to the first wiring and the second wiring. by a direction having an angle, the current to the first wiring and the second wiring It is possible to apply a magnetic field (current magnetic field) to the magnetic memory element by Succoth, it is possible to record the orientation of the varied information of the magnetization of each magnetic layer of the memory layer by the magnetic field.
Then, in particular, the magnetic memory element, or the thickness of the nonmagnetic layer separating the magnetic layer of the storage layer, or whether the film thickness of the magnetic layers of the storage layer, rather than the one of the film thickness are all the same, the storage layer Since the magnetic layer has a 90 ° antiferromagnetic coupling between the magnetic layers , as described above, the operating region for reversing the direction of magnetization can be expanded vertically.

In the magnetic memory of the present invention, the storage layer that holds information according to the magnetization state of the magnetic material is composed of a plurality of magnetic layers , and the magnetization direction is fixed to the storage layer via the nonmagnetic layer. And a magnetic memory element having 90 ° antiferromagnetic coupling between the magnetic layers of the magnetic layer and at least two different directions in which the easy axis directions of the magnetic layers are different and at least two different directions. And a second wiring, magnetic storage elements are arranged in the vicinity of intersections where the first wiring and the second wiring cross each other, and a current is passed through the first wiring and the second wiring. Information is recorded by applying a current magnetic field to the memory element, and the magnetization easy axis directions of the memory layer and the magnetization fixed layer of the magnetic memory element are inclined with respect to the first wiring and the second wiring. It is a direction to have .

According to the configuration of the magnetic memory of the present invention described above, the storage layer for holding information by the magnetization state of a magnetic material is made of a magnetic layer of a plurality of layers, the easy magnetization axis directions of the magnetic layers are present at least two different directions or , A magnetic memory element having 90 ° antiferromagnetic coupling between the magnetic layers of the memory layer, a first wiring and a second wiring intersecting each other, and the first wiring and the second wiring intersect Magnetic storage elements are respectively arranged in the vicinity of the intersections where information is recorded by passing a current through the first wiring and the second wiring and applying a current magnetic field to the magnetic storage elements. The easy magnetization direction of the storage layer and the fixed magnetization layer is a direction having an inclination angle with respect to the first wiring and the second wiring, so that a current flows through the first wiring and the second wiring. By applying a magnetic field (current magnetic field) to the magnetic memory element It is possible to, it is possible to record the orientation of the varied information of the magnetization of each magnetic layer of the memory layer by the magnetic field.
In particular, the magnetic memory element has at least two different directions in which the easy axis directions of magnetization of the magnetic layers are different , and has a structure having 90 ° antiferromagnetic coupling between the magnetic layers of the memory layer . As described above, it is possible to expand each of the operation regions for reversing the magnetization direction vertically.

According to the above-described present invention, the magnetic energy in the cross magnetization state can be lowered to reduce the spin flopping magnetic field and increase the saturation magnetic field, so that the operating region that reverses the magnetization direction of each magnetic layer of the storage layer Can be expanded in the vertical direction, whereby the operation of stably reversing the direction of magnetization can be performed.
Therefore, even when the magnetic memory element is miniaturized, a high yield can be obtained, and writing (recording) and reading can be performed with high reliability by reducing write errors.
As a result, it is possible to increase the density by miniaturizing the magnetic memory element, increase the storage capacity of the magnetic memory, and reduce the size of the magnetic memory.

Further, according to the present invention, the lower limit of the operating area can be reduced, so that the amount of current for generating a current magnetic field necessary for recording information can be reduced, thereby reducing power consumption. Can do.
Therefore, the present invention facilitates miniaturization, high reliability, large capacity, and low power consumption of the magnetic memory.

  As an embodiment of the present invention, FIG. 1 shows a schematic configuration diagram (schematic cross-sectional view) of a magnetic memory element that constitutes an MRAM memory cell using switching characteristics.

  The two magnetic layers of the first magnetization fixed layer 12 and the second magnetization fixed layer 14 are disposed via the nonmagnetic layer 13 and thus are antiferromagnetically coupled. Furthermore, the first magnetization fixed layer 12 is disposed in contact with the antiferromagnetic layer 11 and has a strong unidirectional magnetic anisotropy due to exchange interaction acting between these layers. The fixed layer 2 is constituted by these four layers 11, 12, 13, and 14.

  The storage layer (free layer) 3 includes the first storage layer 16, the second storage layer 18, the third storage layer 20, the fourth storage layer 22, the fifth storage layer 24, and the sixth storage layer 26. The six magnetic layers are arranged with nonmagnetic layers 17, 19, 21, 23, 25 interposed therebetween, respectively.

  Magnetization M1 of the first storage layer 16, magnetization M2 of the second storage layer 18, magnetization M3 of the third storage layer 20, magnetization M4 of the fourth storage layer 22, magnetization M5 of the fifth storage layer 24, The magnetization M6 of the sixth storage layer 26 is alternately oriented left and right in the drawing.

  A tunnel insulating layer 15 is formed between the second magnetization fixed layer 14 and the first storage layer 16, that is, between the fixed layer 2 and the storage layer (free layer) 3. The tunnel insulating layer 15 functions to cut the magnetic coupling between the upper and lower magnetic layers 16 and 14 and to flow a tunnel current. Thus, a TMR (Tunneling Magnetoresistance) element is formed by the fixed layer 2 in which the magnetization direction of the magnetic layer is fixed, the tunnel insulating layer 15, and the storage layer (free layer) 3 capable of changing the magnetization direction. Is configured.

A top coat film 27 is formed on the sixth memory layer 26. The top coat film 27 has a role of preventing mutual diffusion with wiring (bit line or the like) connected to the magnetic memory element 1, reducing contact resistance, and preventing oxidation of the sixth memory layer 26.
A base film 10 is formed under the antiferromagnetic layer 11. The base film 10 has an effect of increasing the crystallinity of the layer stacked above.

The magnetic layers 12 and 14 constituting the fixed layer 2 and the magnetic layers 16, 18, 20, 22, 24 and 26 constituting the storage layer (free layer) 3 include nickel, iron, cobalt, and these Alloys can be used.
A nonmagnetic material such as ruthenium, copper, and tantalum, or a paramagnetic material can be used for each of the nonmagnetic layers 17, 19, 21, 23, and 25 constituting the storage layer (free layer) 3.

In the present embodiment, in particular, each nonmagnetic layer provided between the six magnetic layers 16, 18, 20, 22, 24, and 26 constituting the storage layer (free layer) 3, that is, a non-layer The thicknesses t17, t19, t21, t23, and t25 of the magnetic layer 17, the nonmagnetic layer 19, the nonmagnetic layer 21, the nonmagnetic layer 23, and the nonmagnetic layer 25 are each modulated according to a pseudo periodic function. Yes.
The pseudo periodic function can be obtained from, for example, a Fibonacci sequence.

When the film thicknesses t17, t19, t21, t23, t25 of the nonmagnetic layers 17, 19, 21, 23, 25 are modulated by a pseudo periodic function, the six magnetic layers 16 constituting the storage layer (free layer) 3 , 18, 20, 22, 24, and 26, the magnetizations M1, M2, M3, M4, M5, and M6 have a function of making it difficult to take a completely antiparallel state (↑ ↓ ↑ ↓ ↑ ↓ or ↓ ↑ ↓ ↑ ↓ ↑). Effect.
In particular, when the average of 180 ° antiferromagnetic coupling (bilinear coupling) is zero and the dispersion is large, the magnetizations M1, M2, M3, and M4 of the magnetic layers 16, 18, 20, 22, 24, and 26 of the storage layer 3 , M5 and M6 are energetically easy to take a cross magnetization state.
Such a coupling method is called 90 ° antiferromagnetic coupling (biquadratic coupling).

By generating 90 ° antiferromagnetic coupling between the magnetic layers of the memory layer 3, the cross magnetization state becomes stable in terms of energy, whereby the spin flopping magnetic field Hsf can be reduced and the saturation magnetic field Hsat. Can be increased.
Therefore, it is possible to expand the region of the operation of reversing the magnetization of the magnetic layer of the storage layer 3 with the spin flopping magnetic field Hsf and the saturation magnetic field Hsat as the lower and upper limits, respectively.

Then, by using the magnetic memory element 1 having the configuration shown in FIG. 1, an MRAM memory cell using switching characteristics can be configured as shown in FIG.
In FIG. 2, portions other than the magnetic memory element 1 are the same as those of the conventional MRAM memory cell using the switching characteristics shown in FIG.
That is, a selection MOS transistor 31 is formed in the silicon substrate 30, and an extraction electrode 9 is formed on one diffusion layer 33 of the selection MOS transistor 31 via the connection plug 8. On the lead electrode 9, the magnetic memory element 1 is connected. Although not shown, the other diffusion layer 32 of the selection MOS transistor 31 is connected to a sense line via a connection plug. The gate 7 of the selection MOS transistor is connected to the selection signal line.
The upper surface of the magnetic memory element 1 is connected to the bit line (BL) 6 thereon. A write word line (WL) 5 is arranged below the magnetic memory element 1 via an insulating film.

  Although not shown, also in the magnetic memory element 1 of the present embodiment, similarly to the magnetic memory element 101 in FIG. 8, the magnetic memory element 1 is formed in an elliptical pattern, and this magnetic memory element 1 is connected to a word line. 5 and the bit line 6, and the easy magnetization axis directions of the magnetic layers (magnetization fixed layers and storage layers) 12, 14, 16, 18, 20, 22, 24, and 26 of the magnetic memory element 1, A direction having an inclination angle θ with respect to the word line 5 and the bit line 6 is possible.

  In the memory cell having this configuration, when information is recorded on the storage layer (free layer) 3 of the magnetic storage element 1, the magnetizations M1, M2, M3 of the storage layers 16, 18, 20, 22, 24, 26 are recorded. In order to reverse the directions of M4, M5, and M6, a bit current and a word line current are passed through the bit line 6 and the word line 5, respectively. The bit line current and the word line current induce a bit line current magnetic field and a word line current magnetic field, respectively. The combined magnetic field of the word line current magnetic field and the bit line current magnetic field forms a rotating magnetic field that rotates clockwise or counterclockwise.

  Further, when reading information recorded in the storage layer (free layer) 3 of the magnetic storage element 1, a voltage is applied between the bit line 6 and the sense line connected to the diffusion layer 32 of the selection MOS transistor 31. Then, the gate 7 of the selection MOS transistor 31 is turned on, so that a current flows in the film thickness direction of the magnetic memory element 1. Thus, the direction of magnetization of the magnetic layer of the storage layer 3 is detected using the tunnel magnetoresistance effect in the magnetic layers (the second magnetization fixed layer 14 and the first storage layer 16) sandwiching the tunnel insulating layer 15. As a result, the information recorded in the storage layer 3 can be read out.

Then, by using the memory cell having the configuration shown in FIG. 1, the magnetic memory element 1 is arranged at each intersection with respect to a large number of word lines (WL) 5 and bit lines (BL) 6, thereby A magnetic memory (magnetic storage device) having a memory cell and a large storage capacity can be configured.
When the magnetic memory is configured as described above, in order to record information in the storage layer 3 of the magnetic storage element 1 of a certain memory cell, it is possible to use a large number of word lines 5 and bit lines 6 corresponding to the recording memory cell. One word line 5 and one bit line 6 are selected, and a current is passed through the word line 5 and the bit line 6 to cause a current magnetic field (word line current magnetic field and Apply bit line current magnetic field). As a result, a rotating magnetic field is applied to the storage layer 3 of the magnetic storage element 1 of the memory cell, and in the storage layer 3, the magnetizations M1, M2, M3 of the storage layers 16, 18, 20, 22, 24, 26 are applied. M4, M5, and M6 are inverted (Toggle operation), and information is written (recorded).
On the other hand, since at least one of the word line 5 and the bit line 6 is not selected in the memory cell that does not record information, the magnetizations M1, M2, M3 of the storage layers 16, 18, 20, 22, 24, 26 are not selected. , M4, M5, and M6 are reversed (Toggles operation), a sufficient rotating magnetic field is not applied, and information is not written (recorded), so that information already recorded in the storage layer 3 is not recorded. Retained.

Here, the change of the magnetization curve in the direction of the easy axis was examined by changing the magnitude of the 90 ° antiferromagnetic coupling.
Each nonmagnetic layer has the same film thickness, each memory layer (magnetic layer) has the same film thickness, and only magnetostatic coupling occurs between each memory layer (Jq = 0). The thickness of the 90 ° antiferromagnetic coupling Jq is adjusted to 0.01 erg / cm ² by modulating the thickness of the layer, and the size of the 90 ° antiferromagnetic coupling Jq is modulated by modulating the thickness of each nonmagnetic layer. With respect to the case where the thickness was 0.013 erg / cm ² , the change in the magnetization amount of the storage layer with respect to the change in the magnitude of the applied magnetic field was examined, and a magnetization curve was created. In either case, the planar shape of the magnetic memory element was an elliptical shape of 0.72 μm (major axis direction) × 0.48 μm (minor axis direction).
The magnetization curves in each case are superimposed and shown in FIG.

From FIG. 3, when magnetostatic coupling is used (Jq = 0), the spin flopping magnetic field (about 40 Oe) and the saturation magnetic field (about 200 Oe) are both low, whereas the 90 ° antiferromagnetic coupling Jq is As it is increased, the spin flopping magnetic field is further lowered (→ about 25 Oe → 20 Oe or less), while the saturation magnetic field (about 300 Oe) is increased.
That is, by increasing the 90 ° antiferromagnetic coupling, the spin flopping magnetic field Hsf, which is the lower limit of the region of the operation of reversing the magnetization direction of each magnetic layer of the storage layer (Toggle operation), is reduced. Further, by increasing the 90 ° antiferromagnetic coupling, the saturation magnetic field Hsat, which is the upper limit of the above-described operation (Toggle operation) region, increases.
Therefore, it can be seen that the region of the above-described operation (Toggle operation) expands vertically.

Moreover, the improvement effect of the magnetization rotation mode obtained by this Embodiment was investigated.
The planar shape of the magnetic memory element is an ellipse of 0.72 μm (major axis direction) × 0.48 μm (minor axis direction) as in FIG. The distribution of magnetization rotation modes of the element was compared between the case where the film thickness was the same and the case where the film thickness of the nonmagnetic layer between the magnetic layers of the storage layer was modulated as in the present embodiment. .
The distribution of each magnetization rotation mode is shown in FIGS. 4A and 4B. FIG. 4A shows a case where the thickness of the nonmagnetic layer between the magnetic layers of the storage layer is the same, and FIG. 4B shows a case where the thickness of the nonmagnetic layer between the magnetic layers of the storage layer is modulated. .

As shown in FIG. 4A, in the conventional configuration in which the film thickness of the nonmagnetic layer between the magnetic layers is the same, the lower limit of the Toggle operation region 80 determined by the spin flipping magnetic field is 60 Oe on the word line current magnetic field Hw side. You can see that there are more.
In order to generate a magnetic field with such a magnitude with the word line current Iw and the bit line current Ib, a large current of several tens of mA is required.
As described above, in order to reduce the power consumption and improve the reliability of the magnetic memory element, it is desirable that the current value be as low as possible. Therefore, it is not preferable that the lower limit of the region 80 of the Toggle operation is large. .

As shown in FIG. 4B, by adopting the configuration of the present embodiment and modulating the film thickness of the nonmagnetic layer between the magnetic layers to generate 90 ° antiferromagnetic coupling, the spin flopping magnetic field is reduced. It can be seen that the lower limit of the region of the Toggle operation is further reduced to 20 Oe or less.
That is, by modulating the film thickness of the nonmagnetic layer between the magnetic layers to generate 90 ° antiferromagnetic coupling, the lower limit of the region 80 of the Toggle operation is lowered to generate a current magnetic field necessary for recording. It can be seen that the amount of current can be reduced and the power consumption can be reduced.

According to the above-described embodiment, the nonmagnetic layers 17, 19, 21, 21, 23 between the storage layers (magnetic layers) 16, 18, 20, 22, 24, 26 of the storage layer (free layer) 3 are used. , 25 film thicknesses t17, t19, t21, t23, t25 are modulated by a pseudo-periodic function, so that each of the storage layers (magnetic layers) 16, 18, 20, 22, 24, 26 of the storage layer 3 Since 90 ° antiferromagnetic coupling can be induced between them, the directions of the magnetizations M1, M2, M3, M4, M5, M6 of the respective storage layers (magnetic layers) 16, 18, 20, 22, 24, 26 are The magnetic energy of the crossing magnetization state which crosses can be lowered.
Thereby, the spin flopping magnetic field Hsf can be reduced and the saturation magnetic field Hsat can be increased.
Accordingly, recording of information is performed by reversing the directions of the magnetizations M1, M2, M3, M4, M5 and M6 of the storage layers (magnetic layers) 16, 18, 20, 22, 24 and 26 of the storage layer (free layer) 3. It is possible to expand the region where the magnetic field can be performed, that is, the region of the toggle operation in the magnetization rotation mode diagram, downward and upward, respectively.

As described above, since the area (operation area) of the Toggle operation can be expanded, the operation can be performed stably.
Therefore, even when the magnetic memory element 1 is miniaturized, it is possible to obtain a high yield and to reduce writing errors and to write (record) and read information such as bit information with high reliability. be able to.
As a result, it is possible to increase the density by miniaturizing the magnetic memory element 1, increase the storage capacity of the magnetic memory, and reduce the size of the magnetic memory.

In addition, according to the present embodiment, the lower limit of the operation region can be reduced, so that it is possible to reduce the amount of current that generates a magnetic field having a magnitude necessary for recording information as a current magnetic field. Thereby, the power consumption at the time of recording can be reduced.
Therefore, miniaturization, high reliability, large capacity, and low power consumption of the magnetic memory are facilitated.

  In the above-described embodiment, the thickness of the nonmagnetic layer between the magnetic layers of the storage layer (free layer) 3 is modulated. However, the thickness of each magnetic layer of the storage layer (free layer). Similarly, even in a configuration in which is modulated, 90 ° antiferromagnetic coupling is generated between the magnetic layers, and the operating region can be expanded vertically.

  Further, as a method of modulating the film thickness, in addition to the method of modulating according to the above-described pseudo periodic function, any of a method of modulating according to a combination of a periodic function and a random number and a method of modulating according to a fractal function are possible. .

In addition, regarding the plurality of nonmagnetic layers or magnetic layers, not only the film thickness of the plurality of layers may be modulated, but also the film thickness may be modulated within the film plane within each layer.
Usually, when forming a uniform non-magnetic film or magnetic layer, it is necessary that the target tank reaches an ultra-vacuum level of 1 × 10 ⁻⁶ Torr or less. In order to modulate, it is effective to perform sputtering in a low vacuum of 1 mTorr or more.

Next, as another embodiment of the present invention, FIG. 5 shows an exploded view of a main part of a magnetic memory element constituting an MRAM memory cell using switching characteristics.
In the present embodiment, in particular, the two magnetic layers of the first storage layer 16 and the second storage layer 18 constituting the storage layer (free layer) 3 are set so that the directions of the easy magnetization axes 60 are different from each other. Thus, the magnetic memory element 41 is formed.
Specifically, the tilt angle of the easy axis 60 of the first storage layer 16 (the tilt angle with respect to the wiring to which the current magnetic field is applied in the same manner as the tilt angle θ in FIG. 8) θ1 is relatively small, and the second storage layer The inclination angle θ2 of the 18 easy magnetization axes 60 is relatively large, and in FIG. 5, 0 ° <θ1 <45 ° <θ2 <90 °.

In addition, the planar patterns of the first memory layer 16 and the second memory layer 18 are both the same elliptical shape, and the major axis directions of the ellipses are the same.
As described above, since the plane patterns are the same and the easy axis directions are different, the first storage layer 16 and the first memory layer 16 and the magnetic layer 16 are not set by the magnetic layer shape anisotropy. Each easy magnetization axis direction of the second memory layer 18 is set.
For example, the respective easy axis directions of magnetization may be set by mainly using magnetocrystalline anisotropy or induced magnetic anisotropy due to heat treatment in a magnetic field.

Since the storage layer (free layer) of the magnetic storage element 41 has a configuration in which the directions of easy magnetization 60 of the first storage layer 16 and the second storage layer 18 are different from each other, the magnetic energy in the cross magnetization state is reduced. Can be reduced.
Thereby, the spin flopping magnetic field Hsf can be lowered and the saturation magnetic field Hsat can be increased.

  In order to produce such a configuration, for example, after the heat treatment is performed in a magnetic field in the direction in which the first memory layer 16 is formed, the direction of the easy axis 60 of the first memory layer 16 is set. The second memory layer 18 is formed, and heat treatment is performed in a magnetic field in a direction different from that of the first memory layer 16 to set the direction of the easy axis 60 of the second memory layer 18. Each layer of the magnetic storage element 41 including the first storage layer 16 and the second storage layer 18 may be patterned.

  Note that the angle formed between the easy magnetization axis directions of the first memory layer 16 and the second memory layer 18 is not limited to the angle shown in FIG. 5, and is an arbitrary angle of, for example, 5 ° to 90 °. It is possible.

Then, by using the magnetic memory element 41 having the configuration shown in FIG. 5, an MRAM memory cell using switching characteristics can be configured as shown in FIG.
6, portions other than the magnetic memory element 41 are the same as those of the MRAM memory cell using the conventional switching characteristics shown in FIG. 7 and the memory cell of the previous embodiment shown in FIG. The description is omitted.

According to the configuration of the present embodiment described above, the easy magnetization directions of the magnetic layers of the storage layer (free layer) 3 of the magnetic storage element 41, that is, the first storage layer 16 and the second storage layer 18 are mutually aligned. By being different, 90 ° antiferromagnetic coupling can be induced between the magnetic layers 16 and 18 of the storage layer (free layer), and therefore the magnetizations M1 and M2 of the storage layers (magnetic layers) 16 and 18 can be induced. The magnetic energy of the cross magnetization state where the directions intersect can be reduced.
As a result, as in the previous embodiment, the spin flopping magnetic field Hsf can be reduced and the saturation magnetic field Hsat can be increased, so that each storage layer (magnetic layer) of the storage layer (free layer) 3 ) It is possible to expand the areas where information can be recorded by reversing the directions of the magnetizations M1 and M2 of 16 and 18 (areas for the Toggle operation) downward and upward, respectively.

Accordingly, the Toggle operation region (operation region) can be expanded and the operation can be stably performed. Therefore, even when the magnetic memory element 41 is miniaturized, a high yield can be obtained. In addition, the writing error can be reduced and information such as bit information can be written (recorded) or read with high reliability.
As a result, it is possible to increase the density by miniaturizing the magnetic memory element 41, increase the storage capacity of the magnetic memory, and reduce the size of the magnetic memory.

Further, according to the present embodiment, since the lower limit of the operation area can be reduced, the power consumption during recording can be reduced as in the previous embodiment.
Therefore, miniaturization, high reliability, large capacity, and low power consumption of the magnetic memory are facilitated.

As in the embodiment shown in FIG. 5 and FIG. 6, instead of making the easy axis direction of each magnetic layer of the storage layer different by induced magnetic anisotropy, the easy axis direction of magnetization is changed by shape magnetic anisotropy. It is also possible to make them different.
In this case, by forming the magnetic layers so as to have different plane patterns, it is possible to vary the easy axis direction of magnetization that is mainly defined by the shape magnetic anisotropy.

In the embodiment shown in FIGS. 5 and 6, the storage layer (free layer) is composed of two magnetic layers, but the storage layer (free layer) is composed of three or more magnetic layers. In this case, the configuration of the present invention can be similarly applied.
When the storage layer (free layer) is composed of three or more magnetic layers, the magnetic layer has a 90 ° antiferromagnetic coupling between the magnetic layers by adopting a configuration in which the easy axis directions of the magnetic layers are at least two different directions. Can be generated.

  In addition, with respect to the configuration of each of the above-described embodiments, the extraction electrode under the magnetic memory element may be formed of an antiferromagnetic material and may also be used as an antiferromagnetic layer.

In each of the above-described embodiments, a magnetic storage element composed of a TMR element is configured by providing a tunnel insulating layer between the storage layer 3 and the lower fixed layer 2, but instead of the tunnel insulating layer, A magnetic memory element composed of a GMR element may be formed by providing a nonmagnetic conductive layer.
Even when the present invention is applied to a case where a magnetic memory element composed of a GMR element is configured, the effect of the present invention can be obtained.

Further, the present invention is not limited to a configuration in which a fixed layer is provided via a tunnel insulating layer or a nonmagnetic conductive layer, that is, a nonmagnetic layer (TMR element, GMR element, etc.), and the present invention does not provide a fixed layer. In addition, the present invention can be applied to a configuration in which the direction of magnetization of the magnetic layer of the storage layer is detected by other detection means and information recorded in the storage layer of the magnetic storage element is read.
As other detection means other than the structure provided with the fixed layer, for example, a structure using a Hall element or a structure in which detection is performed by optical means can be considered.

  The present invention is not limited to the above-described embodiment, and various other configurations can be taken without departing from the gist of the present invention.

It is a schematic block diagram of the magnetic memory element which comprises the memory cell of MRAM which concerns on one embodiment of this invention. FIG. 2 is a schematic cross-sectional view of an MRAM using switching characteristics including the magnetic memory element of FIG. 1. It is a figure which shows the change of the magnetization amount of a memory | storage layer with respect to the change of the magnitude | size of an applied magnetic field in each case where the magnitude | size of 90 degree antiferromagnetic coupling was changed. It is a figure which compares distribution of a magnetization rotation mode. A This is a case of a conventional configuration in which the nonmagnetic layers of the storage layer have the same film thickness. B This is the case where the thickness of the nonmagnetic layer of the storage layer is modulated (configuration shown in FIG. 1). It is an exploded view of the principal part of the magnetic memory element which comprises the memory cell of MRAM which concerns on other embodiment of this invention. FIG. 6 is a schematic cross-sectional view of an MRAM using switching characteristics including the magnetic memory element of FIG. 5. It is a typical sectional view of MRAM using a switching characteristic. It is the typical top view which looked at the MRAM of FIG. 7 from right above. 8 is an example of a magnetization curve when an external magnetic field is applied in the easy axis direction of the magnetic memory element of FIG. It is a figure which shows an example of the time change of the electric current pulse, the magnetization direction of each memory | storage layer, and the electrical resistance of a TMR element in Toggle operation | movement. It is a figure which shows an example of the time change of the electric current pulse, the magnetization direction of each memory | storage layer, and the electrical resistance of a TMR element in No switching operation. It is a figure which shows an example of the time change of the electric current pulse, the magnetization direction of each memory | storage layer, and the electrical resistance of a TMR element in a Direct operation | movement. It is a figure which shows an example of the time change of the electric current pulse, the magnetization direction of each memory | storage layer, and the electrical resistance of a TMR element in Direct operation | movement. It is a figure which shows distribution of the magnetization rotation mode of the magnetic memory element of FIG.

Explanation of symbols

1,41 Magnetic storage element, 2 fixed layer, 3 storage layer (free layer), 5 word line, 6 bit line, 11 antiferromagnetic layer, 12 first magnetization fixed layer, 13, 17, 19, 21, 23 , 25 Nonmagnetic layer, 14 Second magnetization fixed layer, 15 Tunnel insulating layer, 16 First storage layer, 18 Second storage layer, 20 Third storage layer, 22 Fourth storage layer, 24 5th Memory layer, 25 sixth memory layer, 30 silicon substrate, 31 selection MOS transistor

Claims (4)

The storage layer that holds information according to the magnetization state of the magnetic material is composed of a plurality of magnetic layers,
A magnetization pinned layer in which the direction of magnetization is pinned is arranged with respect to the storage layer via a nonmagnetic layer,
Either the thickness of each nonmagnetic layer separating the magnetic layers of the storage layer or the thickness of each magnetic layer of the storage layer is not the same, and the thickness of each of the storage layers is not the same. A magnetic memory element having 90 ° antiferromagnetic coupling to
A first wiring and a second wiring intersecting each other;
The magnetic storage elements are arranged near intersections where the first wiring and the second wiring intersect ,
Information is recorded by passing a current through the first wiring and the second wiring and applying a current magnetic field to the magnetic storage element,
A magnetic memory in which an easy axis direction of magnetization of the storage layer and the magnetization fixed layer of the magnetic storage element is a direction having an inclination angle with respect to the first wiring and the second wiring . In the magnetic memory element, the thickness of each nonmagnetic layer or the thickness of each magnetic layer of the memory layer is modulated by any one of a pseudo periodic function, a combination of a periodic function and a random number, and a fractal function . The magnetic memory according to claim 1 . In the magnetic memory element, the magnitude of 90 ° antiferromagnetic coupling in the memory layer is 0.01 to 0.013 erg / cm. ² The magnetic memory according to claim 1. The storage layer that holds information according to the magnetization state of the magnetic material is composed of a plurality of magnetic layers,
A magnetization pinned layer in which the direction of magnetization is pinned is arranged with respect to the storage layer via a nonmagnetic layer,
A magnetic memory element in which each of the magnetic layers has at least two different easy-axis directions and has a 90 ° antiferromagnetic coupling between the magnetic layers of the memory layer ;
A first wiring and a second wiring intersecting each other;
The magnetic storage elements are arranged near intersections where the first wiring and the second wiring intersect ,
Information is recorded by passing a current through the first wiring and the second wiring and applying a current magnetic field to the magnetic storage element,
A magnetic memory in which an easy axis direction of magnetization of the storage layer and the magnetization fixed layer of the magnetic storage element is a direction having an inclination angle with respect to the first wiring and the second wiring .

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