JP4762659B2 - Epoxy resin and epoxy resin composition - Google Patents
Epoxy resin and epoxy resin composition Download PDFInfo
- Publication number
- JP4762659B2 JP4762659B2 JP2005291580A JP2005291580A JP4762659B2 JP 4762659 B2 JP4762659 B2 JP 4762659B2 JP 2005291580 A JP2005291580 A JP 2005291580A JP 2005291580 A JP2005291580 A JP 2005291580A JP 4762659 B2 JP4762659 B2 JP 4762659B2
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- general formula
- carbon atoms
- group
- epoxy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000003822 epoxy resin Substances 0.000 title claims description 137
- 229920000647 polyepoxide Polymers 0.000 title claims description 137
- 239000000203 mixture Substances 0.000 title claims description 24
- -1 carboxylic acid compound Chemical class 0.000 claims description 51
- 125000004432 carbon atom Chemical group C* 0.000 claims description 20
- 239000004593 Epoxy Substances 0.000 claims description 19
- 150000001875 compounds Chemical class 0.000 claims description 19
- 229920005989 resin Polymers 0.000 claims description 17
- 239000011347 resin Substances 0.000 claims description 17
- 125000001931 aliphatic group Chemical group 0.000 claims description 12
- 239000003795 chemical substances by application Substances 0.000 claims description 12
- 239000002253 acid Substances 0.000 claims description 10
- 125000002947 alkylene group Chemical group 0.000 claims description 10
- 150000007973 cyanuric acids Chemical class 0.000 claims description 10
- 125000000217 alkyl group Chemical group 0.000 claims description 8
- 239000003054 catalyst Substances 0.000 claims description 8
- 125000003700 epoxy group Chemical group 0.000 claims description 8
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 7
- 230000001476 alcoholic effect Effects 0.000 claims description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 5
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Natural products P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims description 4
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 3
- 229910000073 phosphorus hydride Inorganic materials 0.000 claims description 3
- 229910052717 sulfur Inorganic materials 0.000 claims description 3
- 125000004434 sulfur atom Chemical group 0.000 claims description 3
- 125000000547 substituted alkyl group Chemical group 0.000 claims description 2
- 238000006243 chemical reaction Methods 0.000 description 28
- 238000001723 curing Methods 0.000 description 18
- 125000003118 aryl group Chemical group 0.000 description 14
- 239000000047 product Substances 0.000 description 14
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 12
- 150000008065 acid anhydrides Chemical class 0.000 description 11
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 11
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 9
- 229920001187 thermosetting polymer Polymers 0.000 description 9
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 7
- 238000002834 transmittance Methods 0.000 description 7
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 6
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000003963 antioxidant agent Substances 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 4
- URLKBWYHVLBVBO-UHFFFAOYSA-N Para-Xylene Chemical group CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 description 4
- 125000002723 alicyclic group Chemical group 0.000 description 4
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 4
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- IVSZLXZYQVIEFR-UHFFFAOYSA-N m-xylene Chemical group CC1=CC=CC(C)=C1 IVSZLXZYQVIEFR-UHFFFAOYSA-N 0.000 description 4
- 150000003003 phosphines Chemical class 0.000 description 4
- 150000004023 quaternary phosphonium compounds Chemical class 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- YIMQCDZDWXUDCA-UHFFFAOYSA-N [4-(hydroxymethyl)cyclohexyl]methanol Chemical compound OCC1CCC(CO)CC1 YIMQCDZDWXUDCA-UHFFFAOYSA-N 0.000 description 3
- 230000003078 antioxidant effect Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 230000009477 glass transition Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 150000002460 imidazoles Chemical class 0.000 description 3
- 230000001771 impaired effect Effects 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical class C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 3
- 229920003986 novolac Polymers 0.000 description 3
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 230000001590 oxidative effect Effects 0.000 description 3
- 150000002989 phenols Chemical class 0.000 description 3
- 150000003856 quaternary ammonium compounds Chemical class 0.000 description 3
- 239000011342 resin composition Substances 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- 238000004383 yellowing Methods 0.000 description 3
- KNDQHSIWLOJIGP-UMRXKNAASA-N (3ar,4s,7r,7as)-rel-3a,4,7,7a-tetrahydro-4,7-methanoisobenzofuran-1,3-dione Chemical compound O=C1OC(=O)[C@@H]2[C@H]1[C@]1([H])C=C[C@@]2([H])C1 KNDQHSIWLOJIGP-UMRXKNAASA-N 0.000 description 2
- BPXVHIRIPLPOPT-UHFFFAOYSA-N 1,3,5-tris(2-hydroxyethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound OCCN1C(=O)N(CCO)C(=O)N(CCO)C1=O BPXVHIRIPLPOPT-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 2
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 2
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 2
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 2
- XOUQAVYLRNOXDO-UHFFFAOYSA-N 2-tert-butyl-5-methylphenol Chemical compound CC1=CC=C(C(C)(C)C)C(O)=C1 XOUQAVYLRNOXDO-UHFFFAOYSA-N 0.000 description 2
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229930185605 Bisphenol Natural products 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 2
- VSXQNAQYSCTWRL-UHFFFAOYSA-N [4-[4-(hydroxymethyl)cyclohexyl]cyclohexyl]methanol Chemical compound C1CC(CO)CCC1C1CCC(CO)CC1 VSXQNAQYSCTWRL-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 150000008431 aliphatic amides Chemical class 0.000 description 2
- 229910001860 alkaline earth metal hydroxide Chemical class 0.000 description 2
- 150000001336 alkenes Chemical group 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 229940117389 dichlorobenzene Drugs 0.000 description 2
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 2
- 238000007865 diluting Methods 0.000 description 2
- 239000012776 electronic material Substances 0.000 description 2
- 238000005538 encapsulation Methods 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- IIEWJVIFRVWJOD-UHFFFAOYSA-N ethylcyclohexane Chemical compound CCC1CCCCC1 IIEWJVIFRVWJOD-UHFFFAOYSA-N 0.000 description 2
- 238000001879 gelation Methods 0.000 description 2
- 238000005984 hydrogenation reaction Methods 0.000 description 2
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 2
- 238000002329 infrared spectrum Methods 0.000 description 2
- 239000000976 ink Substances 0.000 description 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- LSEFCHWGJNHZNT-UHFFFAOYSA-M methyl(triphenyl)phosphanium;bromide Chemical compound [Br-].C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(C)C1=CC=CC=C1 LSEFCHWGJNHZNT-UHFFFAOYSA-M 0.000 description 2
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- PCILLCXFKWDRMK-UHFFFAOYSA-N naphthalene-1,4-diol Chemical compound C1=CC=C2C(O)=CC=C(O)C2=C1 PCILLCXFKWDRMK-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical compound C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 125000001453 quaternary ammonium group Chemical group 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 229940014800 succinic anhydride Drugs 0.000 description 2
- 150000005846 sugar alcohols Polymers 0.000 description 2
- 150000003512 tertiary amines Chemical class 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- AYEKOFBPNLCAJY-UHFFFAOYSA-O thiamine pyrophosphate Chemical compound CC1=C(CCOP(O)(=O)OP(O)(O)=O)SC=[N+]1CC1=CN=C(C)N=C1N AYEKOFBPNLCAJY-UHFFFAOYSA-O 0.000 description 2
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 2
- SNMWBQJABJVKSR-UHFFFAOYSA-N (2,6-dichlorophenyl)-(2-methylimidazol-1-yl)methanone Chemical compound CC1=NC=CN1C(=O)C1=C(Cl)C=CC=C1Cl SNMWBQJABJVKSR-UHFFFAOYSA-N 0.000 description 1
- QLRYDIRQUQZTKB-UHFFFAOYSA-N (2-ethylimidazol-1-yl)-(2,4,6-trimethylphenyl)methanone Chemical compound CCC1=NC=CN1C(=O)C1=C(C)C=C(C)C=C1C QLRYDIRQUQZTKB-UHFFFAOYSA-N 0.000 description 1
- VMJMWKXIBQKPPO-UHFFFAOYSA-N (2-methylimidazol-1-yl)-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=NC=CN1C(=O)C1=C(C)C=C(C)C=C1C VMJMWKXIBQKPPO-UHFFFAOYSA-N 0.000 description 1
- MGNFFUHBTQWOSG-UHFFFAOYSA-N (2-phenylimidazol-1-yl)-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)N1C(C=2C=CC=CC=2)=NC=C1 MGNFFUHBTQWOSG-UHFFFAOYSA-N 0.000 description 1
- BOKGTLAJQHTOKE-UHFFFAOYSA-N 1,5-dihydroxynaphthalene Chemical compound C1=CC=C2C(O)=CC=CC2=C1O BOKGTLAJQHTOKE-UHFFFAOYSA-N 0.000 description 1
- BSYJHYLAMMJNRC-UHFFFAOYSA-N 2,4,4-trimethylpentan-2-ol Chemical compound CC(C)(C)CC(C)(C)O BSYJHYLAMMJNRC-UHFFFAOYSA-N 0.000 description 1
- JZODKRWQWUWGCD-UHFFFAOYSA-N 2,5-di-tert-butylbenzene-1,4-diol Chemical compound CC(C)(C)C1=CC(O)=C(C(C)(C)C)C=C1O JZODKRWQWUWGCD-UHFFFAOYSA-N 0.000 description 1
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- HXIQYSLFEXIOAV-UHFFFAOYSA-N 2-tert-butyl-4-(5-tert-butyl-4-hydroxy-2-methylphenyl)sulfanyl-5-methylphenol Chemical compound CC1=CC(O)=C(C(C)(C)C)C=C1SC1=CC(C(C)(C)C)=C(O)C=C1C HXIQYSLFEXIOAV-UHFFFAOYSA-N 0.000 description 1
- ZDRSNHRWLQQICP-UHFFFAOYSA-N 2-tert-butyl-4-[2-(3-tert-butyl-4-hydroxyphenyl)propan-2-yl]phenol Chemical compound C1=C(O)C(C(C)(C)C)=CC(C(C)(C)C=2C=C(C(O)=CC=2)C(C)(C)C)=C1 ZDRSNHRWLQQICP-UHFFFAOYSA-N 0.000 description 1
- IKEHOXWJQXIQAG-UHFFFAOYSA-N 2-tert-butyl-4-methylphenol Chemical compound CC1=CC=C(O)C(C(C)(C)C)=C1 IKEHOXWJQXIQAG-UHFFFAOYSA-N 0.000 description 1
- GPNYZBKIGXGYNU-UHFFFAOYSA-N 2-tert-butyl-6-[(3-tert-butyl-5-ethyl-2-hydroxyphenyl)methyl]-4-ethylphenol Chemical compound CC(C)(C)C1=CC(CC)=CC(CC=2C(=C(C=C(CC)C=2)C(C)(C)C)O)=C1O GPNYZBKIGXGYNU-UHFFFAOYSA-N 0.000 description 1
- BKZXZGWHTRCFPX-UHFFFAOYSA-N 2-tert-butyl-6-methylphenol Chemical compound CC1=CC=CC(C(C)(C)C)=C1O BKZXZGWHTRCFPX-UHFFFAOYSA-N 0.000 description 1
- HNRWAPGWAGVHCS-UHFFFAOYSA-N 3-[1-(3-hydroxy-2-methylphenyl)propyl]-2-methylphenol Chemical compound C(CC)(C=1C(=C(C=CC1)O)C)C=1C(=C(C=CC1)O)C HNRWAPGWAGVHCS-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical class C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- VWGKEVWFBOUAND-UHFFFAOYSA-N 4,4'-thiodiphenol Chemical compound C1=CC(O)=CC=C1SC1=CC=C(O)C=C1 VWGKEVWFBOUAND-UHFFFAOYSA-N 0.000 description 1
- VVRUTDYKWASFTP-UHFFFAOYSA-N 4-(2,5-dimethylphenyl)-2,6-dimethylphenol Chemical compound OC1=C(C=C(C=C1C)C1=C(C=CC(=C1)C)C)C VVRUTDYKWASFTP-UHFFFAOYSA-N 0.000 description 1
- OICHXMGVMVGWKH-UHFFFAOYSA-N 4-(2,6-dimethylphenyl)-2,6-dimethylphenol Chemical compound CC1=C(O)C(C)=CC(C=2C(=CC=CC=2C)C)=C1 OICHXMGVMVGWKH-UHFFFAOYSA-N 0.000 description 1
- IBNFPRMKLZDANU-UHFFFAOYSA-N 4-(4-hydroxy-3-methylphenyl)sulfanyl-2-methylphenol Chemical compound C1=C(O)C(C)=CC(SC=2C=C(C)C(O)=CC=2)=C1 IBNFPRMKLZDANU-UHFFFAOYSA-N 0.000 description 1
- MZXNOAWIRQFYDB-UHFFFAOYSA-N 4-(4-hydroxycyclohexyl)cyclohexan-1-ol Chemical compound C1CC(O)CCC1C1CCC(O)CC1 MZXNOAWIRQFYDB-UHFFFAOYSA-N 0.000 description 1
- NZGQHKSLKRFZFL-UHFFFAOYSA-N 4-(4-hydroxyphenoxy)phenol Chemical compound C1=CC(O)=CC=C1OC1=CC=C(O)C=C1 NZGQHKSLKRFZFL-UHFFFAOYSA-N 0.000 description 1
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- ODJUOZPKKHIEOZ-UHFFFAOYSA-N 4-[2-(4-hydroxy-3,5-dimethylphenyl)propan-2-yl]-2,6-dimethylphenol Chemical compound CC1=C(O)C(C)=CC(C(C)(C)C=2C=C(C)C(O)=C(C)C=2)=C1 ODJUOZPKKHIEOZ-UHFFFAOYSA-N 0.000 description 1
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- VSAWBBYYMBQKIK-UHFFFAOYSA-N 4-[[3,5-bis[(3,5-ditert-butyl-4-hydroxyphenyl)methyl]-2,4,6-trimethylphenyl]methyl]-2,6-ditert-butylphenol Chemical compound CC1=C(CC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)C(C)=C(CC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)C(C)=C1CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 VSAWBBYYMBQKIK-UHFFFAOYSA-N 0.000 description 1
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- ONTIGGPRJSEVGB-UHFFFAOYSA-N 6-decoxybenzo[c][2,1]benzoxaphosphinine 6-oxide Chemical compound C1=CC=C2P(OCCCCCCCCCC)(=O)OC3=CC=CC=C3C2=C1 ONTIGGPRJSEVGB-UHFFFAOYSA-N 0.000 description 1
- RBHIUNHSNSQJNG-UHFFFAOYSA-N 6-methyl-3-(2-methyloxiran-2-yl)-7-oxabicyclo[4.1.0]heptane Chemical compound C1CC2(C)OC2CC1C1(C)CO1 RBHIUNHSNSQJNG-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- VOWWYDCFAISREI-UHFFFAOYSA-N Bisphenol AP Chemical compound C=1C=C(O)C=CC=1C(C=1C=CC(O)=CC=1)(C)C1=CC=CC=C1 VOWWYDCFAISREI-UHFFFAOYSA-N 0.000 description 1
- HTVITOHKHWFJKO-UHFFFAOYSA-N Bisphenol B Chemical compound C=1C=C(O)C=CC=1C(C)(CC)C1=CC=C(O)C=C1 HTVITOHKHWFJKO-UHFFFAOYSA-N 0.000 description 1
- GIXXQTYGFOHYPT-UHFFFAOYSA-N Bisphenol P Chemical compound C=1C=C(C(C)(C)C=2C=CC(O)=CC=2)C=CC=1C(C)(C)C1=CC=C(O)C=C1 GIXXQTYGFOHYPT-UHFFFAOYSA-N 0.000 description 1
- SDDLEVPIDBLVHC-UHFFFAOYSA-N Bisphenol Z Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)CCCCC1 SDDLEVPIDBLVHC-UHFFFAOYSA-N 0.000 description 1
- 239000004255 Butylated hydroxyanisole Substances 0.000 description 1
- KVXUTPIGAUBABW-UHFFFAOYSA-N C(C)(C)(C1=CC=C(C=C1)O)C1=CC=C(C=C1)O.C1=C(C=CC2=CC=C(C=C12)O)O Chemical compound C(C)(C)(C1=CC=C(C=C1)O)C1=CC=C(C=C1)O.C1=C(C=CC2=CC=C(C=C12)O)O KVXUTPIGAUBABW-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- OKIZCWYLBDKLSU-UHFFFAOYSA-M N,N,N-Trimethylmethanaminium chloride Chemical compound [Cl-].C[N+](C)(C)C OKIZCWYLBDKLSU-UHFFFAOYSA-M 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- VYGUBTIWNBFFMQ-UHFFFAOYSA-N [N+](#[C-])N1C(=O)NC=2NC(=O)NC2C1=O Chemical group [N+](#[C-])N1C(=O)NC=2NC(=O)NC2C1=O VYGUBTIWNBFFMQ-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- IBVAQQYNSHJXBV-UHFFFAOYSA-N adipic acid dihydrazide Chemical compound NNC(=O)CCCCC(=O)NN IBVAQQYNSHJXBV-UHFFFAOYSA-N 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 229920003180 amino resin Polymers 0.000 description 1
- 229940107816 ammonium iodide Drugs 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- RQPZNWPYLFFXCP-UHFFFAOYSA-L barium dihydroxide Chemical compound [OH-].[OH-].[Ba+2] RQPZNWPYLFFXCP-UHFFFAOYSA-L 0.000 description 1
- 229910001863 barium hydroxide Inorganic materials 0.000 description 1
- CHQVQXZFZHACQQ-UHFFFAOYSA-M benzyl(triethyl)azanium;bromide Chemical compound [Br-].CC[N+](CC)(CC)CC1=CC=CC=C1 CHQVQXZFZHACQQ-UHFFFAOYSA-M 0.000 description 1
- HTZCNXWZYVXIMZ-UHFFFAOYSA-M benzyl(triethyl)azanium;chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC1=CC=CC=C1 HTZCNXWZYVXIMZ-UHFFFAOYSA-M 0.000 description 1
- FKPSBYZGRQJIMO-UHFFFAOYSA-M benzyl(triethyl)azanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC1=CC=CC=C1 FKPSBYZGRQJIMO-UHFFFAOYSA-M 0.000 description 1
- JWLJBISFJGEYMT-UHFFFAOYSA-M benzyl(triethyl)azanium;iodide Chemical compound [I-].CC[N+](CC)(CC)CC1=CC=CC=C1 JWLJBISFJGEYMT-UHFFFAOYSA-M 0.000 description 1
- UUZYBYIOAZTMGC-UHFFFAOYSA-M benzyl(trimethyl)azanium;bromide Chemical compound [Br-].C[N+](C)(C)CC1=CC=CC=C1 UUZYBYIOAZTMGC-UHFFFAOYSA-M 0.000 description 1
- KXHPPCXNWTUNSB-UHFFFAOYSA-M benzyl(trimethyl)azanium;chloride Chemical compound [Cl-].C[N+](C)(C)CC1=CC=CC=C1 KXHPPCXNWTUNSB-UHFFFAOYSA-M 0.000 description 1
- LRRJQNMXIDXNIM-UHFFFAOYSA-M benzyl(trimethyl)azanium;iodide Chemical compound [I-].C[N+](C)(C)CC1=CC=CC=C1 LRRJQNMXIDXNIM-UHFFFAOYSA-M 0.000 description 1
- NDKBVBUGCNGSJJ-UHFFFAOYSA-M benzyltrimethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)CC1=CC=CC=C1 NDKBVBUGCNGSJJ-UHFFFAOYSA-M 0.000 description 1
- VCCBEIPGXKNHFW-UHFFFAOYSA-N biphenyl-4,4'-diol Chemical compound C1=CC(O)=CC=C1C1=CC=C(O)C=C1 VCCBEIPGXKNHFW-UHFFFAOYSA-N 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- IKWKJIWDLVYZIY-UHFFFAOYSA-M butyl(triphenyl)phosphanium;bromide Chemical compound [Br-].C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(CCCC)C1=CC=CC=C1 IKWKJIWDLVYZIY-UHFFFAOYSA-M 0.000 description 1
- CZBZUDVBLSSABA-UHFFFAOYSA-N butylated hydroxyanisole Chemical compound COC1=CC=C(O)C(C(C)(C)C)=C1.COC1=CC=C(O)C=C1C(C)(C)C CZBZUDVBLSSABA-UHFFFAOYSA-N 0.000 description 1
- 229940043253 butylated hydroxyanisole Drugs 0.000 description 1
- 235000019282 butylated hydroxyanisole Nutrition 0.000 description 1
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 1
- 150000001721 carbon Chemical class 0.000 description 1
- 125000002843 carboxylic acid group Chemical group 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000010538 cationic polymerization reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 239000000805 composite resin Substances 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 239000011353 cycloaliphatic epoxy resin Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 239000008393 encapsulating agent Substances 0.000 description 1
- HZZUMXSLPJFMCB-UHFFFAOYSA-M ethyl(triphenyl)phosphanium;acetate Chemical compound CC([O-])=O.C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(CC)C1=CC=CC=C1 HZZUMXSLPJFMCB-UHFFFAOYSA-M 0.000 description 1
- JHYNXXDQQHTCHJ-UHFFFAOYSA-M ethyl(triphenyl)phosphanium;bromide Chemical compound [Br-].C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(CC)C1=CC=CC=C1 JHYNXXDQQHTCHJ-UHFFFAOYSA-M 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 229920006158 high molecular weight polymer Polymers 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 description 1
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- SRLHDBRENZFCIN-UHFFFAOYSA-N n,n-di(butan-2-yl)butan-2-amine Chemical compound CCC(C)N(C(C)CC)C(C)CC SRLHDBRENZFCIN-UHFFFAOYSA-N 0.000 description 1
- DIAIBWNEUYXDNL-UHFFFAOYSA-N n,n-dihexylhexan-1-amine Chemical compound CCCCCCN(CCCCCC)CCCCCC DIAIBWNEUYXDNL-UHFFFAOYSA-N 0.000 description 1
- ZWRDBWDXRLPESY-UHFFFAOYSA-N n-benzyl-n-ethylethanamine Chemical compound CCN(CC)CC1=CC=CC=C1 ZWRDBWDXRLPESY-UHFFFAOYSA-N 0.000 description 1
- FZZQNEVOYIYFPF-UHFFFAOYSA-N naphthalene-1,6-diol Chemical compound OC1=CC=CC2=CC(O)=CC=C21 FZZQNEVOYIYFPF-UHFFFAOYSA-N 0.000 description 1
- 150000004780 naphthols Chemical class 0.000 description 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 1
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- WCVRQHFDJLLWFE-UHFFFAOYSA-N pentane-1,2-diol Chemical compound CCCC(O)CO WCVRQHFDJLLWFE-UHFFFAOYSA-N 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- TWWBIMNLBUYJKB-UHFFFAOYSA-N phosphanyl acetate Chemical group CC(=O)OP TWWBIMNLBUYJKB-UHFFFAOYSA-N 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- JIYNFFGKZCOPKN-UHFFFAOYSA-N sbb061129 Chemical class O=C1OC(=O)C2C1C1C=C(C)C2C1 JIYNFFGKZCOPKN-UHFFFAOYSA-N 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 1
- NHGXDBSUJJNIRV-UHFFFAOYSA-M tetrabutylammonium chloride Chemical compound [Cl-].CCCC[N+](CCCC)(CCCC)CCCC NHGXDBSUJJNIRV-UHFFFAOYSA-M 0.000 description 1
- VDZOOKBUILJEDG-UHFFFAOYSA-M tetrabutylammonium hydroxide Chemical compound [OH-].CCCC[N+](CCCC)(CCCC)CCCC VDZOOKBUILJEDG-UHFFFAOYSA-M 0.000 description 1
- DPKBAXPHAYBPRL-UHFFFAOYSA-M tetrabutylazanium;iodide Chemical compound [I-].CCCC[N+](CCCC)(CCCC)CCCC DPKBAXPHAYBPRL-UHFFFAOYSA-M 0.000 description 1
- BJQWBACJIAKDTJ-UHFFFAOYSA-N tetrabutylphosphanium Chemical compound CCCC[P+](CCCC)(CCCC)CCCC BJQWBACJIAKDTJ-UHFFFAOYSA-N 0.000 description 1
- RKHXQBLJXBGEKF-UHFFFAOYSA-M tetrabutylphosphanium;bromide Chemical compound [Br-].CCCC[P+](CCCC)(CCCC)CCCC RKHXQBLJXBGEKF-UHFFFAOYSA-M 0.000 description 1
- IBWGNZVCJVLSHB-UHFFFAOYSA-M tetrabutylphosphanium;chloride Chemical compound [Cl-].CCCC[P+](CCCC)(CCCC)CCCC IBWGNZVCJVLSHB-UHFFFAOYSA-M 0.000 description 1
- HWCKGOZZJDHMNC-UHFFFAOYSA-M tetraethylammonium bromide Chemical compound [Br-].CC[N+](CC)(CC)CC HWCKGOZZJDHMNC-UHFFFAOYSA-M 0.000 description 1
- YMBCJWGVCUEGHA-UHFFFAOYSA-M tetraethylammonium chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC YMBCJWGVCUEGHA-UHFFFAOYSA-M 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- UQFSVBXCNGCBBW-UHFFFAOYSA-M tetraethylammonium iodide Chemical compound [I-].CC[N+](CC)(CC)CC UQFSVBXCNGCBBW-UHFFFAOYSA-M 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- DDFYFBUWEBINLX-UHFFFAOYSA-M tetramethylammonium bromide Chemical compound [Br-].C[N+](C)(C)C DDFYFBUWEBINLX-UHFFFAOYSA-M 0.000 description 1
- RXMRGBVLCSYIBO-UHFFFAOYSA-M tetramethylazanium;iodide Chemical compound [I-].C[N+](C)(C)C RXMRGBVLCSYIBO-UHFFFAOYSA-M 0.000 description 1
- NJFUXFRJVIXVSG-UHFFFAOYSA-M tetramethylphosphanium;chloride Chemical compound [Cl-].C[P+](C)(C)C NJFUXFRJVIXVSG-UHFFFAOYSA-M 0.000 description 1
- CRUVUWATNULHFA-UHFFFAOYSA-M tetramethylphosphanium;hydroxide Chemical compound [OH-].C[P+](C)(C)C CRUVUWATNULHFA-UHFFFAOYSA-M 0.000 description 1
- WAGFXJQAIZNSEQ-UHFFFAOYSA-M tetraphenylphosphonium chloride Chemical compound [Cl-].C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 WAGFXJQAIZNSEQ-UHFFFAOYSA-M 0.000 description 1
- BGQMOFGZRJUORO-UHFFFAOYSA-M tetrapropylammonium bromide Chemical compound [Br-].CCC[N+](CCC)(CCC)CCC BGQMOFGZRJUORO-UHFFFAOYSA-M 0.000 description 1
- FBEVECUEMUUFKM-UHFFFAOYSA-M tetrapropylazanium;chloride Chemical compound [Cl-].CCC[N+](CCC)(CCC)CCC FBEVECUEMUUFKM-UHFFFAOYSA-M 0.000 description 1
- LPSKDVINWQNWFE-UHFFFAOYSA-M tetrapropylazanium;hydroxide Chemical compound [OH-].CCC[N+](CCC)(CCC)CCC LPSKDVINWQNWFE-UHFFFAOYSA-M 0.000 description 1
- GKXDJYKZFZVASJ-UHFFFAOYSA-M tetrapropylazanium;iodide Chemical compound [I-].CCC[N+](CCC)(CCC)CCC GKXDJYKZFZVASJ-UHFFFAOYSA-M 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- RXJKFRMDXUJTEX-UHFFFAOYSA-N triethylphosphine Chemical compound CCP(CC)CC RXJKFRMDXUJTEX-UHFFFAOYSA-N 0.000 description 1
- RKBCYCFRFCNLTO-UHFFFAOYSA-N triisopropylamine Chemical compound CC(C)N(C(C)C)C(C)C RKBCYCFRFCNLTO-UHFFFAOYSA-N 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- CHJMFFKHPHCQIJ-UHFFFAOYSA-L zinc;octanoate Chemical compound [Zn+2].CCCCCCCC([O-])=O.CCCCCCCC([O-])=O CHJMFFKHPHCQIJ-UHFFFAOYSA-L 0.000 description 1
Images
Landscapes
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Description
本発明は新規なエポキシ樹脂及びそれを使用した樹脂組成物に関し、特に、発光ダイオード(LED)封止に適したエポキシ樹脂及び樹脂組成物に関する。 The present invention relates to a novel epoxy resin and a resin composition using the same, and more particularly to an epoxy resin and a resin composition suitable for light-emitting diode (LED) encapsulation.
エポキシ樹脂は、電気特性、接着性、耐熱性等に優れることから主に塗料分野、土木分野、電気分野の多くの用途で使用されている。特に、ビスフェノールA型ジグリシジルエーテル、ビスフェノールF型ジグリシジルエーテル、フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂等の芳香族エポキシ樹脂は、耐水性、接着性、機械物性、耐熱性、電気絶縁性、経済性などが優れることから種々の硬化剤と組み合わせて広く使用されている。しかし、これらの樹脂は芳香環を含むことから、紫外線等により劣化しやすく、耐候性、耐光性を求められる分野では使用上の制約があった。 Epoxy resins are mainly used in many applications in the paint, civil engineering, and electrical fields because of their excellent electrical properties, adhesiveness, heat resistance, and the like. In particular, aromatic epoxy resins such as bisphenol A type diglycidyl ether, bisphenol F type diglycidyl ether, phenol novolac type epoxy resin, and cresol novolac type epoxy resin have water resistance, adhesiveness, mechanical properties, heat resistance, and electrical insulation. It is widely used in combination with various curing agents because of its excellent economic efficiency. However, since these resins contain an aromatic ring, they are easily deteriorated by ultraviolet rays or the like, and there are restrictions in use in fields where weather resistance and light resistance are required.
青色、白色LED装置の分野においては、芳香族を含むエポキシ樹脂組成物を封止材として使用すると、LED素子から放出される光により樹脂が劣化、経時黄変し、輝度が低下するといった問題が生じている。 In the field of blue and white LED devices, when an epoxy resin composition containing an aromatic is used as a sealing material, there is a problem that the resin deteriorates due to light emitted from the LED element, yellows with time, and brightness decreases. Has occurred.
特許文献1には、芳香族エポキシ樹脂を水素化して得られる水素化エポキシ樹脂及び硬化剤を含有する電気・電子材料用エポキシ樹脂組成物が開示されている。特許文献2には、芳香族エポキシを水素化して得られる水素化エポキシ樹脂、環状脂肪族エポキシ樹脂及び硬化剤を含有する硬化性エポキシ樹脂組成物が開示されている。特許文献3及び4には、環状オレフィンを酸化して得られる脂環式エポキシ樹脂を配合しエポキシ樹脂組成物が開示されている。特許文献5には、芳香族エポキシ樹脂を水素化して得られるエポキシ当量が230〜1000g/eqの水素化エポキシ樹脂又は芳香族エポキシ樹脂を水素化して得られる水素化エポキシ樹脂と多価カルボン酸を反応して得られるエポキシ当量が230〜1000g/eqのエポキシ樹脂と環状オレフィンをエポキシ化して得られる脂環式エポキシ樹脂、酸無水物硬化剤又はカチオン重合開始剤を含有するLED封止用エポキシ樹脂組成物が提案されている。
しかし、これらの樹脂組成物は、耐光性や耐熱性には一定の効果が認められるが、硬化収縮がひどく樹脂が割れるなどハンドリング面に問題があるものや、近年のLEDの高出力化による素子接合部分での発熱による経時黄変や、発光波長の短波長化による劣化には追従し切れておらず、更なる耐熱性、耐光性の改善が求められている。 However, although these resin compositions have a certain effect on light resistance and heat resistance, they have problems in handling such as severe resin shrinkage and cracking of the resin. There is a need for further improvement in heat resistance and light resistance, since yellowing with time due to heat generation at the joint portion and deterioration due to shortening of the emission wavelength are not fully followed.
本発明者らは、上記課題を解決するために剛直構造を有するイソシアヌル骨格に着目し、鋭意検討を重ねた。この結果、特定のイソシアヌル酸誘導体と酸無水物を反応させて得られる多価カルボン酸化合物を、特定の非芳香族系のエポキシ樹脂と反応させて得られるエポキシ樹脂は、硬化収縮が少なく、透明性を有し、耐光性に優れ、高温下での黄変の少ないエポキシ樹脂組成物を与えることを見出し、本発明に至った。 In order to solve the above-mentioned problems, the present inventors paid attention to an isocyanuric skeleton having a rigid structure, and made extensive studies. As a result, an epoxy resin obtained by reacting a polyvalent carboxylic acid compound obtained by reacting a specific isocyanuric acid derivative with an acid anhydride with a specific non-aromatic epoxy resin has little curing shrinkage and is transparent. The present invention has been found to provide an epoxy resin composition having excellent properties, light resistance, and low yellowing at high temperatures.
すなわち、本発明は、多価カルボン酸化合物(A)とエポキシ樹脂(B)を塩基性触媒下に、反応させて得られる新規エポキシ樹脂であって、
多価カルボン酸化合物(A)が、一般式(1)
エポキシ樹脂(B)が、3,4−エポキシシクロヘキセニルメチル−3',4'−エポキシシクロヘキセンカルボキシレートからなるエポキシ樹脂(B1)を30重量%以上含むエポキシ当量が70〜350g/eqの非芳香族エポキシ樹脂であり、
多価カルボン酸化合物(A)のカルボキシ基1モルに対し、エポキシ樹脂(B)のエポキシ基3.5モル以上、15モル未満となる割合で反応させて得られるものであることを特徴とする新規エポキシ樹脂である。
That is, the present invention is a novel epoxy resin obtained by reacting a polyvalent carboxylic acid compound (A) and an epoxy resin (B) under a basic catalyst,
The polycarboxylic acid compound (A) is represented by the general formula (1)
Non-aromatic epoxy resin (B) containing 30 wt% or more of epoxy resin (B1) comprising 3,4-epoxycyclohexenylmethyl-3 ′, 4′-epoxycyclohexenecarboxylate and having an epoxy equivalent of 70 to 350 g / eq Group epoxy resin,
It is obtained by reacting at a ratio of 3.5 mol or more and less than 15 mol of epoxy group of epoxy resin (B) to 1 mol of carboxy group of polyvalent carboxylic acid compound (A). It is a new epoxy resin.
請求項2以下の本発明は次のとおりである。
2) 多価カルボン酸化合物(A)が、一般式(3)
2) The polycarboxylic acid compound (A) is represented by the general formula (3)
3) エポキシ樹脂(B)が、30重量%以上のエポキシ樹脂(B1)及び70重量%以下の一般式(4)で表されるエポキシ当量が100〜400g/eqのエポキシ樹脂(B2)からなる前記の新規エポキシ樹脂。
4) 一般式(1)において、R1が−CH2CH2−であり、一般式(2)においてR2とR3が互いに結合して−CH2CH2CH2CH2−となって縮合環を形成している前記の新規エポキシ樹脂。
5) 一般式(4)において、Aが一般式(6)又は一般式(7)
6) エポキシ樹脂(B1)が、3,4−エポキシシクロヘキセニルメチル−3’,4’−エポキシシクロヘキセンカルボキシレートである前記の新規エポキシ樹脂。
4) In general formula (1), R 1 is —CH 2 CH 2 —, and in general formula (2), R 2 and R 3 are bonded together to form —CH 2 CH 2 CH 2 CH 2 —. The above novel epoxy resin forming a condensed ring.
5) In general formula (4), A represents general formula (6) or general formula (7)
6) The novel epoxy resin as described above, wherein the epoxy resin (B1) is 3,4-epoxycyclohexenylmethyl-3 ′, 4′-epoxycyclohexenecarboxylate.
7) 前記の新規エポキシ樹脂と、硬化剤及び硬化促進剤を含むことを特徴とするエポキシ樹脂組成物。
8) 硬化剤が、酸無水物化合物であり、硬化促進剤が有機ホスフィン化合物である前記のエポキシ樹脂組成物。
7) An epoxy resin composition comprising the novel epoxy resin, a curing agent and a curing accelerator.
8) The above epoxy resin composition, wherein the curing agent is an acid anhydride compound and the curing accelerator is an organic phosphine compound.
以下、本発明の実施の形態について詳細に説明する。 Hereinafter, embodiments of the present invention will be described in detail.
本発明の新規エポキシ樹脂(以下、本発明のエポキシ樹脂という)は、上記一般式(1)で表される末端アルコール性水酸基を有するイソシアヌル酸誘導体と一般式(2)で表される酸無水物とを反応させて得られる多価カルボン酸化合物(A)と、環状オレフィン類の炭素−炭素二重結合をエポキシ化して得られるエポキシ当量が70〜250g/eqのエポキシ樹脂を30重量%以上含むエポキシ当量が70〜350g/eqのエポキシ樹脂(B)を反応させて得られる。 The novel epoxy resin of the present invention (hereinafter referred to as the epoxy resin of the present invention) includes an isocyanuric acid derivative having a terminal alcoholic hydroxyl group represented by the general formula (1) and an acid anhydride represented by the general formula (2). 30% by weight or more of an epoxy resin having an epoxy equivalent of 70 to 250 g / eq obtained by epoxidizing a carbon-carbon double bond of a cyclic olefin with a polycarboxylic acid compound (A) obtained by reacting It is obtained by reacting an epoxy resin (B) having an epoxy equivalent of 70 to 350 g / eq.
一般式(1)において、R1は炭素数1〜3のアルキレン基を示す。このようなR1を有するイソシアヌル酸誘導体は、イソシアヌル酸とホルムアルデヒド、エチレンオキサイド、プロピレンオキサイドのいずれかを付加させることにより得られることができるが、これらに限定されるものではない。また、本発明の範囲を損なわない限り必要に応じて2種類以上用いてもよい。好ましい化合物は、原料入手の容易さ及び合成時のハンドリング面、エポキシ樹脂組成物とした際の物性面から、R1が(−CH2CH2−)で表されるイソシアヌル酸誘導体である。 In the general formula (1), R 1 represents an alkylene group having 1 to 3 carbon atoms. Such an isocyanuric acid derivative having R 1 can be obtained by adding isocyanuric acid and formaldehyde, ethylene oxide, or propylene oxide, but is not limited thereto. Moreover, you may use 2 or more types as needed, unless the range of this invention is impaired. A preferred compound is an isocyanuric acid derivative in which R 1 is represented by (—CH 2 CH 2 —) from the viewpoint of easy availability of raw materials, handling during synthesis, and physical properties when used as an epoxy resin composition.
一般式(2)において、R2及びR3は水素原子又は炭素数1〜10のアルキル基を示すが、互いに結合して脂肪族環を形成してもよい。R2及びR3が互いに結合して脂肪族環を形成する場合、飽和炭素6員環となって隣接する環と縮合環を形成することが望ましい。より望ましくは、−CH2CH2CH2CH2−となって縮合環を形成することである。かかる酸無水物としては、無水コハク酸、無水ヘキサヒドロフタル酸、無水メチルヘキサヒドロフタル酸、無水水素化メチルナジック酸等が挙げられるがこれらに限定されるものではなく、本発明の範囲を損なわない限り必要に応じて2種類以上用いてもよい。好ましい酸無水物は、経済面とエポキシ樹脂組成物とした際の物性を考えると、無水ヘキサヒドロフタル酸である。 In the general formula (2), R 2 and R 3 represent a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, but may be bonded to each other to form an aliphatic ring. When R 2 and R 3 are bonded to each other to form an aliphatic ring, it is desirable to form a saturated carbon 6-membered ring to form a condensed ring with an adjacent ring. More desirably, it forms —CH 2 CH 2 CH 2 CH 2 — to form a condensed ring. Such acid anhydrides include, but are not limited to, succinic anhydride, hexahydrophthalic anhydride, methyl hexahydrophthalic anhydride, hydrogenated methyl nadic acid, and the like, and the scope of the present invention is impaired. As long as there is no, you may use 2 or more types as needed. A preferred acid anhydride is hexahydrophthalic anhydride in view of economics and physical properties of the epoxy resin composition.
上記イソシアヌル酸誘導体と酸無水物とを反応させて多価カルボン酸化合物(A)を得るには、通常のアルコールと酸無水物の反応と同様、公知の方法で合成することができる。アルコール性水酸基を有するイソシアヌル酸誘導体と酸無水物のモル比は、硬化物の耐熱性及び耐光性の観点から1:2.7〜1:3.3であり、好ましくは2.9〜3.1の範囲である。この反応は、酸無水物のモノエステル化物である多価カルボン酸化合物、すなわち一般式(3)で表される多価カルボン酸化合物が得られる条件とする。例えば、この反応はイソシアヌル酸誘導体と酸無水物を混合し、40〜200℃の温度で撹拌することにより行うことができる。40℃以下では反応速度が遅くなり、効率的ではない。この反応は、理論的にはイソシアヌル酸誘導体1モルに対し酸無水物3モルの割合で反応するので、いずれか一方が消失するまで反応させることが望ましい。一方を過剰に使用した場合等は、中間体又は未反応物が残存することがあるが少量であれば差し支えない。この反応生成物の主成分は上記一般式(3)で表される多価カルボン酸化合物であるので、これの入手が可能であれば、それを使用することも有利である。 In order to obtain the polyvalent carboxylic acid compound (A) by reacting the above isocyanuric acid derivative with an acid anhydride, it can be synthesized by a known method in the same manner as the reaction of a normal alcohol and an acid anhydride. The molar ratio of the isocyanuric acid derivative having an alcoholic hydroxyl group and the acid anhydride is 1: 2.7 to 1: 3.3, preferably 2.9 to 3.3.3, from the viewpoint of heat resistance and light resistance of the cured product. 1 range. This reaction is performed under the condition that a polyvalent carboxylic acid compound that is a monoesterified product of an acid anhydride, that is, a polyvalent carboxylic acid compound represented by the general formula (3) is obtained. For example, this reaction can be performed by mixing an isocyanuric acid derivative and an acid anhydride and stirring at a temperature of 40 to 200 ° C. Below 40 ° C., the reaction rate is slow and not efficient. This reaction theoretically reacts at a ratio of 3 moles of acid anhydride to 1 mole of isocyanuric acid derivative, so that it is desirable to react until either one disappears. When one of them is used excessively, an intermediate or unreacted product may remain, but it may be used in a small amount. Since the main component of this reaction product is the polyvalent carboxylic acid compound represented by the above general formula (3), it is advantageous to use it if it is available.
この合成反応において、本発明の効果を損なわない限り、必要に応じて公知の多価アルコールを1種以上併用し、混合物である多価カルボン酸化合物(A)としてもよい。しかし、この場合も、一般式(3)で表される多価カルボン酸が50モル%以上となるように反応することがよい。 In this synthesis reaction, as long as the effects of the present invention are not impaired, one or more known polyhydric alcohols may be used in combination as necessary to obtain a polyvalent carboxylic acid compound (A) as a mixture. However, also in this case, it is preferable to react so that the polyvalent carboxylic acid represented by the general formula (3) is 50 mol% or more.
上記公知の多価アルコールとしては、エチレングリコール、プロピレングリコール、グリセリン、ペンタエリスリトール、1,4−シクロヘキサノール、1,4−シクロヘキサンジメタノール、4,4’−ビシクロヘキサンジメタノール、水素化ビスフェノールA、水素化ビスフェノールF、4,4’−ビシクロヘキサノールなどが挙げられるが、これらに限定されるものではない。しかし、ビスフェノールAのように炭素‐炭素二重結合を有する化合物を使用することは好ましくなく、10モル%以下、好ましくは0又は1モル%以下にとどめることがよい。 Examples of the known polyhydric alcohol include ethylene glycol, propylene glycol, glycerin, pentaerythritol, 1,4-cyclohexanol, 1,4-cyclohexanedimethanol, 4,4′-bicyclohexanedimethanol, hydrogenated bisphenol A, Examples thereof include hydrogenated bisphenol F, 4,4′-bicyclohexanol, but are not limited thereto. However, it is not preferable to use a compound having a carbon-carbon double bond such as bisphenol A, and it is preferable to keep it at 10 mol% or less, preferably 0 or 1 mol% or less.
上記反応は、無溶媒で行うことができるが、必要に応じて、反応に悪影響を与えない希釈溶媒を用いてもよい。この希釈溶媒の例としては、ヘキサン、ヘプタン、シクロヘキサン、メチルシクロヘキサン、エチルシクロヘキサンなどの脂肪族炭化水素類、アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン、シクロペンタノンなどの脂肪族ケトン類、ベンゼン、トルエン、オルトキシレン、メタキシレン、パラキシレン、クロロベンゼン、ジクロロベンゼンなどの芳香族類、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド、N−メチルピロリドンなどの脂肪族アミド類、テトラヒドロフラン、ジオキサン、ジエチレングリコールジメチルエーテル、トリエチレングリコールジメチルエーテルなどのエーテル類が挙げられる。これらの有機溶媒は、2種以上を選択して混合溶媒として使用してもよい。 The above reaction can be carried out without a solvent, but if necessary, a diluting solvent that does not adversely influence the reaction may be used. Examples of the diluting solvent include aliphatic hydrocarbons such as hexane, heptane, cyclohexane, methylcyclohexane, and ethylcyclohexane, aliphatic ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, and cyclopentanone, benzene, and toluene. , Aromatics such as ortho-xylene, meta-xylene, para-xylene, chlorobenzene, dichlorobenzene, aliphatic amides such as N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone, tetrahydrofuran, dioxane, diethylene glycol Examples include ethers such as dimethyl ether and triethylene glycol dimethyl ether. Two or more of these organic solvents may be selected and used as a mixed solvent.
次に、多価カルボン酸化合物(A)と非芳香族エポキシ樹脂(B)とを反応させて、本発明の新規エポキシ樹脂得る。 Next, the polyvalent carboxylic acid compound (A) and the non-aromatic epoxy resin (B) are reacted to obtain the novel epoxy resin of the present invention.
エポキシ樹脂(B)としては、環状オレフィン類の炭素−炭素二重結合をエポキシ化して得られるエポキシ当量が70〜250g/eqの脂環式エポキシ樹脂(B1)が30重量%以上を占める非芳香族エポキシ樹脂が使用される。エポキシ樹脂(B1)の使用量が全エポキシ樹脂(B)に対し30重量%未満であると、耐熱性が悪化し、所望の効果を得られない可能性がある。このエポキシ樹脂(B1)は脂環式構造を有するエポキシ樹脂であり、少なくとも2個のエポキシ基を有する。エポキシ樹脂(B)は、エポキシ当量(混合使用する場合は、平均のエポキシ当量)が70〜350g/eqの範囲にある。 As the epoxy resin (B), a non-aromatic alicyclic epoxy resin (B1) having an epoxy equivalent of 70 to 250 g / eq obtained by epoxidizing a carbon-carbon double bond of cyclic olefins accounts for 30% by weight or more. Group epoxy resins are used. If the amount of the epoxy resin (B1) used is less than 30% by weight based on the total epoxy resin (B), the heat resistance is deteriorated and the desired effect may not be obtained. This epoxy resin (B1) is an epoxy resin having an alicyclic structure and has at least two epoxy groups. The epoxy resin (B) has an epoxy equivalent (average epoxy equivalent when mixed) of 70 to 350 g / eq.
エポキシ樹脂(B1)の原料となる環状オレフィン類は少なくとも2個の炭素−炭素二重結合を有するが、その内少なくとも1個の炭素−炭素二重結合は環にあり、他は環に置換するビニル基、アリル基等の炭素−炭素二重結合含有基であってもよい。環状オレフィン類は、オレフィン環を少なくとも1個有すればよく、上記のように二重結合を有する置換基を有してもよい。そして、オレフィン環には-COO-等の炭化水素基以外の置換基を有することができる。この環状オレフィン類の炭素−炭素二重結合を酸化してエポキシ化することによりエポキシ樹脂(B1)が得られる。 Cyclic olefins used as raw materials for the epoxy resin (B1) have at least two carbon-carbon double bonds, of which at least one carbon-carbon double bond is in a ring, and the other is substituted with a ring. It may be a carbon-carbon double bond-containing group such as a vinyl group or an allyl group. Cyclic olefins only need to have at least one olefin ring, and may have a substituent having a double bond as described above. The olefin ring may have a substituent other than a hydrocarbon group such as —COO—. An epoxy resin (B1) is obtained by oxidizing and epoxidizing the carbon-carbon double bond of the cyclic olefins.
エポキシ樹脂(B1)としては、公知のものを使用でき、好ましくは3,4−エポキシシクロヘキセニルメチル-3’,4’−エポキシシクロヘキセンカルボキシレート、1,2:8,9ジエポキシリモネン、2,2−ビス(ヒドロキシメチル)−1-ブタノールの1,2−エポキシ−4−(2−オキシラニル)シクロヘキサン付加物などが挙げられるがこれらに限定されるものではない。エポキシ樹脂(B1)は、エポキシ樹脂中に30〜100重量%含まれる。また、必要に応じて2種以上を使用してもよい。脂環式エポキシ樹脂(B1)は可及的に炭素−炭素二重結合を含まないことが望ましい。また、エポキシ樹脂(B)がエポキシ樹脂(B1)以外に他のエポキシ樹脂を含む場合であっても、他のエポキシ樹脂も炭素−炭素二重結合を含まないことが望ましく、全体として非芳香族エポキシ樹脂であることがよい。 As the epoxy resin (B1), known ones can be used, and preferably 3,4-epoxycyclohexenylmethyl-3 ′, 4′-epoxycyclohexenecarboxylate, 1,2: 8,9 diepoxy limonene, 2, Examples include, but are not limited to, 1,2-epoxy-4- (2-oxiranyl) cyclohexane adduct of 2-bis (hydroxymethyl) -1-butanol. The epoxy resin (B1) is contained in an amount of 30 to 100% by weight in the epoxy resin. Moreover, you may use 2 or more types as needed. It is desirable that the alicyclic epoxy resin (B1) contains as little carbon-carbon double bonds as possible. In addition, even when the epoxy resin (B) contains other epoxy resin in addition to the epoxy resin (B1), it is desirable that the other epoxy resin also does not contain a carbon-carbon double bond, and is non-aromatic as a whole. It is good that it is an epoxy resin.
エポキシ樹脂(B1)以外に他のエポキシ樹脂を含む場合の他のエポキシ樹脂としては、上記式(4)で表されるエポキシ樹脂(B2)が好ましい。エポキシ樹脂(B2)のエポキシ当量は100〜400g/eqの範囲であることがよい。エポキシ樹脂(B2)の使用量はエポキシ樹脂(B)の70重量%以下である。エポキシ樹脂(B1)単独又はエポキシ樹脂(B1)とエポキシ樹脂(B2)の併用が好ましい。併用する場合、エポキシ樹脂(B1)は30〜99wt%、エポキシ樹脂(B2)は1〜70wt%の配合割合とすることが好ましい。なお、エポキシ樹脂(B1)とエポキシ樹脂(B2)の他に他の非芳香族エポキシ樹脂も少量であれば使用可能である。 The epoxy resin (B2) represented by the above formula (4) is preferable as the other epoxy resin in the case of containing other epoxy resins in addition to the epoxy resin (B1). The epoxy equivalent of the epoxy resin (B2) is preferably in the range of 100 to 400 g / eq. The amount of the epoxy resin (B2) used is 70% by weight or less of the epoxy resin (B). Epoxy resin (B1) alone or a combination of epoxy resin (B1) and epoxy resin (B2) is preferred. When used in combination, it is preferable that the epoxy resin (B1) is 30 to 99 wt%, and the epoxy resin (B2) is 1 to 70 wt%. In addition to the epoxy resin (B1) and the epoxy resin (B2), other non-aromatic epoxy resins can be used in a small amount.
エポキシ樹脂(B2)としては、上記一般式(4)で表されるエポキシ樹脂であれば、公知のものを使用できる。一般式(4)において、nは0〜3の整数を表し、Aは炭素環式脂肪族環を鎖中に有していてもよい炭素数1〜20のアルキレン基、又は炭素数1〜6のアルキル基が置換されていてもよい炭素数5〜10の炭素環式脂肪族環、又は一般式(5)で表される基である。そして、脂肪族環は縮環構造を有していてもよい。一般式(5)において、i4、i5は0〜4の整数を表し、R4、R5は炭素数1〜6のアルキル基を表し、Xは鎖中に脂肪族環を含んでいてもよい炭素数1〜20のアルキレン基、酸素原子、硫黄原子又は単結合を表す。好ましいAには、上記式(6)又は(7)で表される基がある。 As the epoxy resin (B2), a known one can be used as long as it is an epoxy resin represented by the general formula (4). In General formula (4), n represents the integer of 0-3, A is a C1-C20 alkylene group which may have a carbocyclic aliphatic ring in a chain | strand, or C1-C6 Or a group represented by the general formula (5), which may be substituted with a C5-C10 carbocyclic aliphatic ring. The aliphatic ring may have a condensed ring structure. In the general formula (5), i 4 and i 5 represent an integer of 0 to 4, R 4 and R 5 represent an alkyl group having 1 to 6 carbon atoms, and X contains an aliphatic ring in the chain. Or an alkylene group having 1 to 20 carbon atoms, an oxygen atom, a sulfur atom or a single bond. Preferred A includes a group represented by the above formula (6) or (7).
上記一般式(4)で表されるエポキシ樹脂(B2)の例としては、エチレングリコール、プロピレングリコール、1,4−シクロヘキサンジメタノール、4,4’−ビシクロヘキサンジメタノール、水素化ビスフェノールAなどのアルコール性水酸基から誘導されるエポキシ樹脂、レソルシノール、ハイドロキノン、2,5−ジターシャリブチルヒドロキノンなどの単環型二価フェノール類から誘導されるエポキシ樹脂の芳香環を核水素化したもの、1,3−ナフタレンジオール、1,4−ナフタレンジオール、1,5−ナフタレンジオール、1,6−ナフタレンジオール、2,7−ナフタレンジオールなどのナフタレンジオール類から誘導されるエポキシ樹脂の芳香環を核水素化したもの、4,4’−イソプロピリデンジフェノール、4,4’−イソプロピリデンビス(2−メチルフェノール)、4,4’−イソプロピリデンビス(2,6−ジメチルフェノール)、4,4’−ジヒドロキシジフェニルメタン、4,4’−ジヒドロキシ−3,3’−ジメチルジフェニルメタン、4,4’−ジヒドロキシ−3,3’,5,5’−テトラメチルジフェニルメタン、4,4’−セカンダリーブチリデンビスフェノール、4,4’−イソプロピリデンビス(2−ターシャリーブチルフェノール)、4,4’−シクロヘキシリデンジフェノール、4,4’−ブチリデンビス(6−ターシャリーブチル−2−メチル)フェノール、4,4’−(1−α−メチルベンジリデン)ビスフェノール、4,4’−ジヒドロキシテトラフェニルメタン、α,α’−ビス(4−ヒドロキシフェニル)−1,4−ジイソプロピルベンゼン、α,α’−ビス(4−ヒドロキシ−3−メチルフェニル)−1,4−ジイソプロピルベンゼン、α,α’−ビス(4−ヒドロキシ−3,5−ジメチルフェニル)−1,3−ジメチルベンゼン、α,α’−ビス(4−ヒドロキシ−3,5−ジメチルフェニル)−1,4−ジメチルベンゼン、4,4’−ジヒドロキシジフェニルエーテル、ビス(4−ヒドロキシフェニル)スルフィド、ビス(4−ヒドロキシ−3−メチルフェニル)スルフィド、4,4’−チオビス(2−ターシャリーブチル−5−メチルフェノール)、4,4’−ビフェノール、4,4’−ジヒドロキシ−3,3’,5,5’−テトラメチルジフェニル等のビスフェノール類から誘導されるエポキシ樹脂の芳香族環を核水素化したものが挙げられるがこれらに限定されるものではない。エポキシ樹脂(B1)及びエポキシ樹脂(B2)は必要により2種以上を使用してもよい。 Examples of the epoxy resin (B2) represented by the general formula (4) include ethylene glycol, propylene glycol, 1,4-cyclohexanedimethanol, 4,4′-bicyclohexanedimethanol, hydrogenated bisphenol A, and the like. Aromatic ring hydrogenated epoxy resin derived from monocyclic dihydric phenols such as epoxy resin derived from alcoholic hydroxyl group, resorcinol, hydroquinone, 2,5-ditertiarybutylhydroquinone, 1,3 -Nuclear hydrogenation of the aromatic ring of epoxy resin derived from naphthalenediols such as naphthalenediol, 1,4-naphthalenediol, 1,5-naphthalenediol, 1,6-naphthalenediol, 2,7-naphthalenediol 4,4'-isopropylidenediphenol, 4,4'-i Propylidenebis (2-methylphenol), 4,4′-isopropylidenebis (2,6-dimethylphenol), 4,4′-dihydroxydiphenylmethane, 4,4′-dihydroxy-3,3′-dimethyldiphenylmethane, 4, 4′-dihydroxy-3,3 ′, 5,5′-tetramethyldiphenylmethane, 4,4′-secondary butylidenebisphenol, 4,4′-isopropylidenebis (2-tertiarybutylphenol), 4,4′- Cyclohexylidene diphenol, 4,4′-butylidenebis (6-tertiarybutyl-2-methyl) phenol, 4,4 ′-(1-α-methylbenzylidene) bisphenol, 4,4′-dihydroxytetraphenylmethane, α , Α′-bis (4-hydroxyphenyl) -1,4-diiso Propylbenzene, α, α′-bis (4-hydroxy-3-methylphenyl) -1,4-diisopropylbenzene, α, α′-bis (4-hydroxy-3,5-dimethylphenyl) -1,3-dimethyl Benzene, α, α′-bis (4-hydroxy-3,5-dimethylphenyl) -1,4-dimethylbenzene, 4,4′-dihydroxydiphenyl ether, bis (4-hydroxyphenyl) sulfide, bis (4-hydroxy -3-methylphenyl) sulfide, 4,4'-thiobis (2-tertiarybutyl-5-methylphenol), 4,4'-biphenol, 4,4'-dihydroxy-3,3 ', 5,5' -Examples include, but are not limited to, those obtained by nuclear hydrogenation of aromatic rings of epoxy resins derived from bisphenols such as tetramethyldiphenyl. Is not to be done. Two or more types of epoxy resins (B1) and epoxy resins (B2) may be used if necessary.
上記多価カルボン酸化合物(A)とエポキシ樹脂(B)を塩基性触媒の存在下で反応させて本発明のエポキシ樹脂を得る。この際の多価カルボン酸化合物(A)とエポキシ樹脂(B)の使用割合は、多価カルボン酸化合物(A)のカルボキシ基(-COOH)1モルに対し、エポキシ樹脂(B)のエポキシ基3.5モル以上、15モル未満、好ましくは5〜10モル、より好ましくは6〜8モルである。ここで、多価カルボン酸化合物(A)のカルボキシ基のモル数の計算は、多価カルボン酸化合物(A)1分子中にカルボキシ基3個を有する場合は、多価カルボン酸化合物(A)1モル中のカルボキシ基は3モルとする。このモル比で反応を行うことで、ゲル化を引き起こすことなく本発明のエポキシ樹脂を合成できる。エポキシ樹脂(B)のエポキシ基のモル数が3.5未満であると、反応中に樹脂粘度が増大し、樹脂がゲル化を引き起こす。また、15以上となると多価カルボン酸化合物を導入する効果が殆どないまま熱硬化時の硬化収縮が大きくなり、ハンドリングの面で困難を生じる。 The polyvalent carboxylic acid compound (A) and the epoxy resin (B) are reacted in the presence of a basic catalyst to obtain the epoxy resin of the present invention. In this case, the ratio of the polyvalent carboxylic acid compound (A) to the epoxy resin (B) used is that of the epoxy group of the epoxy resin (B) with respect to 1 mol of the carboxy group (—COOH) of the polyvalent carboxylic acid compound (A). It is 3.5 mol or more and less than 15 mol, preferably 5 to 10 mol, more preferably 6 to 8 mol. Here, the calculation of the number of moles of the carboxy group of the polyvalent carboxylic acid compound (A) is calculated when there are three carboxy groups in one molecule of the polyvalent carboxylic acid compound (A). The carboxy group in 1 mol is 3 mol. By performing the reaction at this molar ratio, the epoxy resin of the present invention can be synthesized without causing gelation. When the number of moles of epoxy groups in the epoxy resin (B) is less than 3.5, the resin viscosity increases during the reaction, and the resin causes gelation. On the other hand, when it is 15 or more, curing shrinkage at the time of heat curing becomes large with almost no effect of introducing a polyvalent carboxylic acid compound, which causes difficulty in handling.
本発明のエポキシ樹脂を合成する反応は、無溶媒にて行うことが可能であるが、必要に応じて有機溶媒にて反応系を希釈してもよく、反応に悪影響を与える化合物でなければ特に制限されない。例えば、アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン、シクロペンタノンなどの脂肪族ケトン類、ベンゼン、トルエン、オルトキシレン、メタキシレン、パラキシレン、クロロベンゼン、ジクロロベンゼンなどの芳香族類、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド、N−メチルピロリドンなどの脂肪族アミド類、テトラヒドロフラン、ジオキサン、ジエチレングリコールジメチルエーテル、トリエチレングリコールジメチルエーテルなどのエーテル類が挙げられる。これらの有機溶媒は、2種以上を選択して混合溶媒として使用してもよい。 The reaction for synthesizing the epoxy resin of the present invention can be carried out in the absence of a solvent, but the reaction system may be diluted with an organic solvent if necessary, and is not particularly a compound that does not adversely affect the reaction. Not limited. For example, aliphatic ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone and cyclopentanone, aromatics such as benzene, toluene, orthoxylene, metaxylene, paraxylene, chlorobenzene and dichlorobenzene, N, N-dimethyl Examples include aliphatic amides such as formamide, N, N-dimethylacetamide, and N-methylpyrrolidone, and ethers such as tetrahydrofuran, dioxane, diethylene glycol dimethyl ether, and triethylene glycol dimethyl ether. Two or more of these organic solvents may be selected and used as a mixed solvent.
この反応に用いる塩基性触媒として、第三アミン化合物、第四アンモニウム化合物、イミダゾール化合物、第三ホスフィン化合物、第四ホスホニウム化合物、水酸化アルカリ金属化合物及び水酸化アルカリ土類金属化合物からなる群より選ばれる少なくとも1種の化合物を使用することがよい。 The basic catalyst used in this reaction is selected from the group consisting of tertiary amine compounds, quaternary ammonium compounds, imidazole compounds, tertiary phosphine compounds, quaternary phosphonium compounds, alkali metal hydroxide compounds and alkaline earth metal hydroxide compounds. It is preferable to use at least one compound.
第三アミン化合物としては、例えば、トリエチルアミン、トリ-n-プロピルアミン、トリイソプロピルアミン、トリ-n-ブチルアミン、トリ-sec-ブチルアミン、トリ-n-ヘキシルアミン、ジメチルベンジルアミン、ジエチルベンジルアミン、トリベンジルアミン、1,8−ジアザビシクロ[5.4.0]ウンデセ-7-エンなどを挙げることができる。 Tertiary amine compounds include, for example, triethylamine, tri-n-propylamine, triisopropylamine, tri-n-butylamine, tri-sec-butylamine, tri-n-hexylamine, dimethylbenzylamine, diethylbenzylamine, And rebenzylamine, 1,8-diazabicyclo [5.4.0] undec-7-ene, and the like.
第四アンモニウム化合物としては、例えば、水酸化テトラメチルアンモニウム、水酸化テトラエチルアンモニウム、水酸化テトラ-n-プロピルアンモニウム、水酸化テトラ-n-ブチルアンモニウム、水酸化トリメチルベンジルアンモニウム、水酸化トリエチルベンジルアンモニウム等の水酸化第四アンモニウム化合物、塩化テトラメチルアンモニウム、塩化テトラエチルアンモニウム、塩化テトラ-n-プロピルアンモニウム、塩化テトラ-n-ブチルアンモニウム、塩化トリメチルベンジルアンモニウム、塩化トリエチルベンジルアンモニウム等の塩化第四アンモニウム化合物、臭化テトラメチルアンモニウム、臭化テトラエチルアンモニウム、臭化テトラ-n-プロピルアンモニウム、臭化テトラ-n-ブチルアンモニウム、臭化トリメチルベンジルアンモニウム、臭化トリエチルベンジルアンモニウム等の臭化第四アンモニウム化合物、沃化テトラメチルアンモニウム、沃化テトラエチルアンモニウム、沃化テトラ−n−プロピルアンモニウム、沃化テトラ-n-ブチルアンモニウム、沃化トリメチルベンジルアンモニウム、沃化トリエチルベンジルアンモニウム等の沃化第四アンモニウム化合物などを挙げることができる。 Examples of the quaternary ammonium compound include tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetra-n-propylammonium hydroxide, tetra-n-butylammonium hydroxide, trimethylbenzylammonium hydroxide, and triethylbenzylammonium hydroxide. Quaternary ammonium compounds such as tetramethylammonium chloride, tetraethylammonium chloride, tetra-n-propylammonium chloride, tetra-n-butylammonium chloride, trimethylbenzylammonium chloride, triethylbenzylammonium chloride, Tetramethylammonium bromide, tetraethylammonium bromide, tetra-n-propylammonium bromide, tetra-n-butylammonium bromide, trimethylbenzylammonium bromide , Quaternary ammonium bromide compounds such as triethylbenzylammonium bromide, tetramethylammonium iodide, tetraethylammonium iodide, tetra-n-propylammonium iodide, tetra-n-butylammonium iodide, trimethylbenzylammonium iodide And quaternary ammonium iodide compounds such as triethylbenzylammonium iodide.
イミダゾール化合物としては、2−メチルイミダゾール、2−エチルイミダゾール、2−フェニルイミダゾール、2−エチル−4−メチルイミダゾール、1−(2’,4’,6’−トリメチルベンゾイル)−2−エチルイミダゾール、1−(2’,6’−ジクロロベンゾイル)−2−メチルイミダゾール、1−(2’,4’,6’−トリメチルベンゾイル)−2−メチルイミダゾール、1−(2’,4’,6’−トリメチルベンゾイル)−2−フェニルイミダゾールなどを挙げることができる。 Examples of the imidazole compound include 2-methylimidazole, 2-ethylimidazole, 2-phenylimidazole, 2-ethyl-4-methylimidazole, 1- (2 ′, 4 ′, 6′-trimethylbenzoyl) -2-ethylimidazole, 1- (2 ′, 6′-dichlorobenzoyl) -2-methylimidazole, 1- (2 ′, 4 ′, 6′-trimethylbenzoyl) -2-methylimidazole, 1- (2 ′, 4 ′, 6 ′ -Trimethylbenzoyl) -2-phenylimidazole and the like.
第三ホスフィン化合物としては、例えば、トリエチルホスフィン、トリ-n-ブチルホスフィン、トリフェニルホスフィン、トリノニルフェニルホスフィンなどを挙げることができる。第四ホスホニウム化合物としては、例えば、水酸化テトラメチルホスホニウムなどの水酸化第四ホスホニウム化合物;塩化テトラメチルホスホニウム、塩化テトラ-n-ブチルホスホニウム、塩化テトラフェニルホスホニウム、臭化テトラ-n-ブチルホスホニウム、臭化メチルトリフェニルホスホニウム、臭化-n-ブチルトリフェニルホスホニウム、臭化メチルトリフェニルホスホニウム、臭化エチルトリフェニルホスホニウムなどのハロゲン化第四ホスホニウム化合物;エチルトリフェニルホスホニウムアセテートなどの酢酸第四ホスホニウム化合物などを挙げることができる。 Examples of the third phosphine compound include triethylphosphine, tri-n-butylphosphine, triphenylphosphine, trinonylphenylphosphine, and the like. Examples of the quaternary phosphonium compound include quaternary phosphonium compounds such as tetramethylphosphonium hydroxide; tetramethylphosphonium chloride, tetra-n-butylphosphonium chloride, tetraphenylphosphonium chloride, tetra-n-butylphosphonium bromide, Halogenated quaternary phosphonium compounds such as methyltriphenylphosphonium bromide, n-butyltriphenylphosphonium bromide, methyltriphenylphosphonium bromide, ethyltriphenylphosphonium bromide; quaternary phosphonium acetate such as ethyltriphenylphosphonium acetate A compound etc. can be mentioned.
水酸化アルカリ金属化合物としては、例えば、水酸化リチウム、水酸化ナトリウム、水酸化カリウムなどを挙げることができる。水酸化アルカリ土類金属としては、例えば水酸化マグネシウム、水酸化カルシウム、水酸化バリウムなどを挙げることができる。 Examples of the alkali metal hydroxide compound include lithium hydroxide, sodium hydroxide, and potassium hydroxide. Examples of the alkaline earth metal hydroxide include magnesium hydroxide, calcium hydroxide, and barium hydroxide.
塩基性触媒はそれぞれ単独で、あるいは溶解する溶媒にあらかじめ溶解させておき、しかる後反応系内に投入してもよい。塩基性触媒の使用割合は、多価カルボン酸化合物(A)のカルボンキシル基1モルに対して、通常0.001〜10モル%、好ましくは0.05〜5モル%である。 The basic catalysts may be used alone or in advance in a solvent to be dissolved, and then charged into the reaction system. The use ratio of the basic catalyst is usually 0.001 to 10 mol%, preferably 0.05 to 5 mol%, based on 1 mol of the carboxyxyl group of the polyvalent carboxylic acid compound (A).
この合成反応での温度条件については、特に制限されないが、通常20℃〜250℃、好ましくは50℃〜200℃である。20℃以下では反応が非常に遅く経済的ではない。また、250℃以上になると反応中に原料や生成物が副反応を起こし、所望のエポキシ樹脂が得られなくなる。 Although it does not restrict | limit especially about the temperature conditions in this synthesis reaction, Usually, 20 to 250 degreeC, Preferably it is 50 to 200 degreeC. Below 20 ° C, the reaction is very slow and not economical. Moreover, when it becomes 250 degreeC or more, a raw material and a product raise | generate a side reaction during reaction, and a desired epoxy resin will no longer be obtained.
本発明のエポキシ樹脂は、エポキシ基と反応性を有する(a)硬化剤と、必要に応じて(b)硬化促進剤、(c)その他の添加剤を配合して本発明のエポキシ樹脂組成物とすることができる。このエポキシ樹脂組成物は、熱処理を施すことで、透明性、耐候性、耐熱性に優れる硬化樹脂を与える。 The epoxy resin of the present invention comprises (a) a curing agent having reactivity with an epoxy group, and (b) a curing accelerator, and (c) other additives, if necessary. It can be. This epoxy resin composition gives a cured resin excellent in transparency, weather resistance, and heat resistance by heat treatment.
(a)硬化剤としては、公知の種々の化合物を使用できる。例えば、有機アミン化合物、ジシアンジアミド及びその誘導体、2−メチルイミダゾール、2−エチル−4−メチルイミダゾールなどのイミダゾール及びその誘導体、ビスフェノールA、ビスフェノールF、臭素化ビスフェノールA、ナフタレンジオール、4,4’−ビフェノールなどの2価フェノール化合物、フェノールやナフトール類とホルムアルデヒドあるいはキシリレングリコール類との縮合反応により得られるノボラック樹脂あるいはアラルキルフェノール樹脂、無水コハク酸、無水マレイン酸、無水フタル酸、無水ヘキサヒドロフタル酸、メチル化無水ヘキサヒドロフタル酸、無水ナジック酸、水素化無水ナジック酸、無水トリメリット酸、無水ピロメリット酸などの酸無水物化合物、アジピン酸ヒドラジドなどのヒドラジド化合物を使用することができ、必要に応じて2種類以上を用いてもよい。これらの中で酸無水物化合物、特に好ましくはメチル化無水ヘキサヒドロフタル酸を用いることで、硬化収縮が少なく、透明性を有し、耐候性に優れ、高温下での黄変の少ないエポキシ樹脂組成物を得ることができる。 (A) Various known compounds can be used as the curing agent. For example, organic amine compounds, dicyandiamide and derivatives thereof, imidazoles and derivatives thereof such as 2-methylimidazole and 2-ethyl-4-methylimidazole, bisphenol A, bisphenol F, brominated bisphenol A, naphthalenediol, 4,4′- Dihydric phenol compounds such as biphenol, novolak resin or aralkyl phenol resin obtained by condensation reaction of phenol or naphthols with formaldehyde or xylylene glycols, succinic anhydride, maleic anhydride, phthalic anhydride, hexahydrophthalic anhydride Hydrazide such as methylated hexahydrophthalic anhydride, nadic anhydride, hydrogenated nadic anhydride, trimellitic anhydride, pyromellitic anhydride and other acid anhydride compounds, and adipic hydrazide Can be used ones may be used two or more, if necessary. Among these, an acid anhydride compound, particularly preferably methylated hexahydrophthalic anhydride, is used to reduce curing shrinkage, have transparency, have excellent weather resistance, and have low yellowing at high temperatures. A composition can be obtained.
(b)硬化促進剤としては、公知の種々の化合物を使用できる。例えば、3級アミン及びその塩類、イミダゾール類及びその塩類、有機ホスフィン化合物(有機ホスフィン類及びその塩類等を含む意味である)、オクチル酸亜鉛、オクチル酸スズなどの有機金属塩が挙げられ、必要に応じて2種類以上を用いてもよい。好ましい硬化促進剤は、3級アミン及びその塩類、有機ホスフィン化合物であり、特に好ましい触媒は有機ホスフィン化合物である。 (B) Various known compounds can be used as the curing accelerator. Examples include tertiary amines and salts thereof, imidazoles and salts thereof, organic phosphine compounds (meaning including organic phosphines and salts thereof), organic metal salts such as zinc octylate and tin octylate, etc. Two or more types may be used depending on the case. Preferred curing accelerators are tertiary amines and salts thereof, and organic phosphine compounds, and particularly preferred catalysts are organic phosphine compounds.
(c)その他の添加剤としては、酸化防止剤、紫外線吸収剤、その他各種充填剤、造膜剤、染料、離型剤、流れ調整剤、難燃剤、ゴム改質剤、界面活性剤、反応性希釈剤、各種オリゴマー類、各種ポリマー類などを複数選んで用いることができる。 (C) Other additives include antioxidants, UV absorbers, other various fillers, film-forming agents, dyes, mold release agents, flow control agents, flame retardants, rubber modifiers, surfactants, reactions Multiple diluents, various oligomers, various polymers and the like can be used.
特に、本発明におけるエポキシ樹脂組成物をLED封止用途として使用する際には、酸化防止剤を配合し、加熱時の酸化劣化を防止し着色の少ない硬化物とすることが好ましい。 In particular, when the epoxy resin composition of the present invention is used as an LED sealing application, it is preferable to add an antioxidant to prevent oxidative deterioration during heating and to obtain a cured product with little coloring.
酸化防止剤としては種々の化合物を使用できる。例えば、2,6−tert−ブチル−p−クレゾール、ブチル化ヒドロキシアニソール、2,6-tert-ブチル-p-エチルフェノール、ステアリル−β−(3,5−ジ-tert-ブチル−4−4−ヒドロキシフェニル)プロピオネートなどのモノフェノール類、2,2−メチレンビス(4−メチル−6-tert-ブチルフェノール)、2,2−メチレンビス(4−エチル−6-tert-ブチルフェノール)、4,4’−チオビス(3−メチル−6−tert−ブチルフェノール)などのビスフェノール類、1,1,3−トリス(2−メチル−4−ヒドロキシ−5-tert-ブチルフェニル)ブタン、1,3,5−トリメチル−2,4,6−トリス(3,5−ジ-tert-ブチル−4−ヒドロキシベンジル)ベンゼン、テトラキス[メチレン−3−(3,5−ジ-tert-ブチル−4−ヒドロキシフェニル)プロピオネート]メタンなどの高分子型フェノール類、9,10−ジヒドロ−9−オキサ−10−ホスファフェナントレン−10−オキサイド、10−(3,5−ジ-tert-ブチル4−ヒドロキシベンジル)−9,10−ジヒドロ−9−オキサ−10−ホスファフェナントレン−10−オキサイド、10−デシロキシ−9,10−ジヒドロ−9−オキサ−10−ホスファフェナントレン−10−オキサイドなどのオキサホスファフェナントレンオキサイド類が挙げられる。これらの酸化防止剤は必要に応じて2種類以上を用いてもよい。 Various compounds can be used as the antioxidant. For example, 2,6-tert-butyl-p-cresol, butylated hydroxyanisole, 2,6-tert-butyl-p-ethylphenol, stearyl-β- (3,5-di-tert-butyl-4-4 Monophenols such as -hydroxyphenyl) propionate, 2,2-methylenebis (4-methyl-6-tert-butylphenol), 2,2-methylenebis (4-ethyl-6-tert-butylphenol), 4,4'- Bisphenols such as thiobis (3-methyl-6-tert-butylphenol), 1,1,3-tris (2-methyl-4-hydroxy-5-tert-butylphenyl) butane, 1,3,5-trimethyl- 2,4,6-tris (3,5-di-tert-butyl-4-hydroxybenzyl) benzene, tetrakis [methylene-3- (3,5-di-tert-butyl-4-hydro Ciphenyl) propionate] high molecular phenols such as methane, 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide, 10- (3,5-di-tert-butyl 4-hydroxybenzyl) Oxaphosphaphenanthrenes such as -9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide, 10-decyloxy-9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide And oxides. Two or more of these antioxidants may be used as necessary.
本発明のエポキシ樹脂組成物は、当業者に知られている各の用途によって、上記(a)成分を、また、必要に応じて(b)〜(c)成分の所望の量を配合し、当業者によく知られている条件から得ることができる。 The epoxy resin composition of the present invention is blended with the component (a) and, if necessary, a desired amount of the components (b) to (c) according to each use known to those skilled in the art. It can be obtained from conditions well known to those skilled in the art.
また、本発明のエポキシ樹脂は他の熱硬化性樹脂システムに配合して高分子量重合体組成物とすることもできる。熱硬化性樹脂システムとして本発明のエポキシ樹脂と共に使用される樹脂としては、不飽和ポリエステル樹脂、熱硬化性アクリル樹脂、熱硬化性アミノ樹脂、熱硬化性メラミン樹脂、熱硬化性ウレア樹脂、熱硬化性ウレタン樹脂、熱硬化性オキセタン樹脂、熱硬化性エポキシ/オキセタン複合樹脂等が挙げられるがこれらに限定されるものではない。 Moreover, the epoxy resin of this invention can also be mix | blended with another thermosetting resin system, and can also be used as a high molecular weight polymer composition. Resin used with the epoxy resin of the present invention as a thermosetting resin system includes unsaturated polyester resin, thermosetting acrylic resin, thermosetting amino resin, thermosetting melamine resin, thermosetting urea resin, thermosetting Examples include, but are not limited to, a curable urethane resin, a thermosetting oxetane resin, and a thermosetting epoxy / oxetane composite resin.
本発明のエポキシ樹脂及びそれを配合したエポキシ樹脂組成物は、透明で耐光性、耐熱性、耐硬化収縮性に優れる硬化物を与える。したがって、本発明のエポキシ樹脂及びエポキシ樹脂組成物は、塗料、コーティング剤、印刷インキ、レジストインキ、接着剤、半導体封止材等の電子材料分野、成型材料、注型材料及び電気絶縁材料分野に有用である。特に、LED分野において有用であり、LED封止用エポキシ樹脂組成物として優れる。 The epoxy resin of the present invention and the epoxy resin composition containing the epoxy resin give a cured product that is transparent and excellent in light resistance, heat resistance, and curing shrinkage resistance. Therefore, the epoxy resin and the epoxy resin composition of the present invention are used in the fields of electronic materials such as paints, coating agents, printing inks, resist inks, adhesives, semiconductor encapsulants, molding materials, casting materials, and electrical insulating materials. Useful. In particular, it is useful in the LED field and is excellent as an epoxy resin composition for LED sealing.
次に、本発明を実施例に基づいて具体的に説明するが、本発明はその要旨を越えない限り、以下の実施例に限定されるものではない。 Next, the present invention will be specifically described based on examples, but the present invention is not limited to the following examples unless it exceeds the gist.
実施例1
(1段目反応)
トリス(2−ヒドロキシエチル)イソシアヌレート(THEIC:四国化成(株)製)52.3部、無水ヘキサヒドロフタル酸(HH:新日本理化(株)製)92.5部を、温度計、冷却管、窒素導入管、攪拌翼の付いた1Lの4つ口セパラブルフラスコに投入し、攪拌しながらマントルヒーターを用いて内温を160℃まで上昇させ、2時間保持した。酸価が235mgKOH/gから下がらなくなったところで1段目反応が終了したと判断し、多価カルボン酸化合物144.8部を得た。この多価カルボン酸化合物のIRスペクトルを図1に示す。
Example 1
(First stage reaction)
Tris (2-hydroxyethyl) isocyanurate (THEIC: Shikoku Kasei Co., Ltd.) 52.3 parts, hexahydrophthalic anhydride (HH: Shin Nippon Rika Co., Ltd.) 92.5 parts, thermometer, cooling The mixture was put into a 1 L four-necked separable flask equipped with a tube, a nitrogen introduction tube, and a stirring blade, and the internal temperature was raised to 160 ° C. using a mantle heater while stirring, and was maintained for 2 hours. When the acid value was not lowered from 235 mg KOH / g, it was judged that the first stage reaction was completed, and 144.8 parts of a polyvalent carboxylic acid compound was obtained. The IR spectrum of this polyvalent carboxylic acid compound is shown in FIG.
(2段目反応)
1段目反応で得られた多価カルボン酸化合物144.8部を取出すことなく、3,4−エポキシシクロヘキセニルメチル-3’,4’−エポキシシクロヘキセンカルボキシレート(セロキサイド2021P:ダイセル化学(株)製)を520部(多価カルボン酸のカルボン酸1モルに対しエポキシ基6.67モル)投入し、内温120℃に保持したのち、トリフェニルホスフィン(TPP:北興化学(株)製)を理論樹脂量に対し500ppm投入後、内温を160℃まで昇温し、4時間撹拌して2段目反応を終了させた。
630重量部のエポキシ樹脂Iを得た。エポキシ当量は213g/eq、25℃での粘度は
930Pa・sであった。
(Second stage reaction)
Without removing 144.8 parts of the polyvalent carboxylic acid compound obtained in the first stage reaction, 3,4-epoxycyclohexenylmethyl-3 ′, 4′-epoxycyclohexenecarboxylate (Celoxide 2021P: Daicel Chemical Co., Ltd.) 520 parts (6.67 mol of epoxy group to 1 mol of carboxylic acid of polyvalent carboxylic acid) was added and maintained at an internal temperature of 120 ° C., and then triphenylphosphine (TPP: manufactured by Hokuko Chemical Co., Ltd.) was added. After adding 500 ppm with respect to the theoretical resin amount, the internal temperature was raised to 160 ° C. and stirred for 4 hours to complete the second-stage reaction.
630 parts by weight of epoxy resin I was obtained. The epoxy equivalent was 213 g / eq, and the viscosity at 25 ° C. was 930 Pa · s.
実施例2〜5、比較例1〜5
原料の使用量を表1のとおりとした他は合成例1と同様の条件で1段目反応及び2段目反応を行い、エポキシ樹脂II〜Xを得た。
Examples 2-5, Comparative Examples 1-5
Epoxy resins II to X were obtained by performing the first-stage reaction and the second-stage reaction under the same conditions as in Synthesis Example 1 except that the amount of raw materials used was as shown in Table 1.
原料の種類、使用量、得られたエポキシ樹脂のエポキシ当量、粘度(25℃)を表1に示す。なお、TPPの使用量は500ppmに統一したので、記載を省略した。表中、数字の単位は、特に記載がない限り重量部を表す。 Table 1 shows the type and amount of raw materials used, the epoxy equivalent of the obtained epoxy resin, and the viscosity (25 ° C.). In addition, since the usage-amount of TPP was unified into 500 ppm, description was abbreviate | omitted. In the tables, numerical units represent parts by weight unless otherwise specified.
表中の略号又は項目は次を意味する。
2021P:セロキサイド2021P
ST-3000:2,2-ビス(4-ヒドロキシシクロヘキシル)プロパンジグリシジルエーテル(東都化成(株)製)、エポキシ当量200g/eq
ZX-1658:1,4-ジメチロールシクロヘキサンのジグリシジル化合物(東都化成(株)製)、エポキシ当量140g/eq
(B1)比率:2段目反応で使用したエポキシ樹脂中に占めるエポキシ樹脂(B1)の割合
モル比:カルボン酸基1モルに対するエポキシ基のモル数
Abbreviations or items in the table mean the following.
2021P: Celoxide 2021P
ST-3000: 2,2-bis (4-hydroxycyclohexyl) propanediglycidyl ether (manufactured by Toto Kasei Co., Ltd.), epoxy equivalent 200 g / eq
ZX-1658: 1,4-dimethylolcyclohexane diglycidyl compound (manufactured by Tohto Kasei Co., Ltd.), epoxy equivalent 140 g / eq
(B1) Ratio: Ratio of epoxy resin (B1) in the epoxy resin used in the second-stage reaction Molar ratio: Number of moles of epoxy groups per mole of carboxylic acid groups
比較例6
セロキサイド2021Pを260部に変更した以外は合成例1と同様の反応を行った。触媒を投入してから2時間後、反応物が撹拌翼にまとわりついた。この時の酸価は15mgKOH/gであり、反応は完結していなかった。この樹脂をテトラヒドロフラン中に浸漬し一昼夜放置したが完全溶解せず膨潤したため、ゲル化したと判断した。
Comparative Example 6
The same reaction as in Synthesis Example 1 was performed, except that Celoxide 2021P was changed to 260 parts. Two hours after the introduction of the catalyst, the reaction product was clinging to the stirring blade. The acid value at this time was 15 mgKOH / g, and the reaction was not completed. This resin was immersed in tetrahydrofuran and allowed to stand for a whole day and night, but it did not completely dissolve and swelled, so it was judged that it had gelled.
実施例6〜10、比較例7〜14
表2に示すように、エポキシ樹脂I〜X及び市販のビスフェノールA型エポキシ樹脂YD−012(東都化成製)、ST−3000、セロキサイド2021Pについて、110℃に加熱し、リカシッドMH(メチルヘキサヒドロ無水フタル酸:新日本理化(株)製)をモル比が1/1の割合になるようによく混合、真空脱気し、更に酸化防止剤(SANKO-HCA:三光(株)製)0.2重量部、硬化促進剤(PX-4ET:日本化学工業(株)製テトラ-n-ブチルホスホニウムo,o’-ジエチルホスホロジチオネート)0.5重量部を添加して金型内で、100℃で4時間、更に140℃で12時間硬化して厚さ4mmの樹脂板を作成した。得られた硬化物のガラス転移温度、初期透過度、耐熱性、耐光性の評価結果を表2に示す。
Examples 6-10, Comparative Examples 7-14
As shown in Table 2, the epoxy resins I to X and the commercially available bisphenol A type epoxy resin YD-012 (manufactured by Tohto Kasei), ST-3000, and ceroxide 2021P were heated to 110 ° C., and Ricacid MH (methyl hexahydro anhydride (Phthalic acid: Shin Nippon Rika Co., Ltd.) was mixed well so that the molar ratio was 1/1, vacuum degassed, and antioxidant (SANKO-HCA: Sanko Co., Ltd.) 0.2 100 parts by weight and a hardening accelerator (PX-4ET: tetra-n-butylphosphonium o, o'-diethyl phosphorodithionate manufactured by Nippon Chemical Industry Co., Ltd.) are added to the mold 100 A resin plate having a thickness of 4 mm was prepared by curing at 140 ° C. for 4 hours and further at 140 ° C. for 12 hours. Table 2 shows the evaluation results of the glass transition temperature, initial transmittance, heat resistance, and light resistance of the obtained cured product.
硬化物のガラス転移温度(Tg)の測定
硬化物のガラス転移温度をパーキンエルマー社製示差走査熱量測定装置DELTA SERIES DSC7を用いて測定した。昇温速度は10℃/分とした。
Measurement of glass transition temperature (Tg) of cured product The glass transition temperature of the cured product was measured using a differential scanning calorimeter DELTA SERIES DSC7 manufactured by PerkinElmer. The heating rate was 10 ° C./min.
硬化物の初期透過度
日立製作所製自記分光光度計U−3410を用いて、厚さ4mm硬化物の400nmの透過度を測定した。
Initial transmittance of cured product Using a self-recording spectrophotometer U-3410 manufactured by Hitachi, Ltd., a transmittance of 400 nm of a cured product having a thickness of 4 mm was measured.
耐熱性の測定
硬化物を空気中で150℃72時間保持したのち、初期透過度と同様にして400nmの透過度を測定した。
Measurement of heat resistance After holding the cured product at 150 ° C. for 72 hours in air, the transmittance at 400 nm was measured in the same manner as the initial transmittance.
耐光性の測定
硬化物をQパネル社製耐候性試験機QUVを用いて、600時間UV照射した後の400nmの透過度を、初期透過度と同様にして測定した。QUVのランプにはUVA340nmを用い、ブラックパネル温度は55℃とした。
Measurement of light resistance Using a weather resistance tester QUV manufactured by Q Panel Co., Ltd., the 400 nm transmittance after UV irradiation for 600 hours was measured in the same manner as the initial transmittance. A UVA of 340 nm was used for the QUV lamp, and the black panel temperature was 55 ° C.
硬化収縮による硬化物の形状変化の有無
金型を外したとき、硬化収縮による硬化物の形状変化を目視にて判定した。○:金型の形状を保っている。△:金型の形状を保っているが硬化物中にヒビ割れが生じている。×:金型の形状を保たず、樹脂が割れている。
Presence / absence of change in shape of cured product due to cure shrinkage When the mold was removed, the shape change of the cured product due to cure shrinkage was visually determined. ○: The shape of the mold is maintained. (Triangle | delta): Although the shape of a metal mold | die is maintained, the crack has arisen in hardened | cured material. X: The shape of the mold was not maintained and the resin was cracked.
Claims (7)
多価カルボン酸化合物(A)が、一般式(1)
エポキシ樹脂(B)が、3,4−エポキシシクロヘキセニルメチル−3',4'−エポキシシクロヘキセンカルボキシレートからなるエポキシ樹脂(B1)を30重量%以上含むエポキシ当量が70〜350g/eqの非芳香族エポキシ樹脂であり、
多価カルボン酸化合物(A)のカルボキシ基1モルに対し、エポキシ樹脂(B)のエポキシ基3.5〜15モル未満となる割合で反応させて得られるものであることを特徴とする新規エポキシ樹脂。 A novel epoxy resin obtained by reacting a polyvalent carboxylic acid compound (A) and an epoxy resin (B) under a basic catalyst,
The polycarboxylic acid compound (A) is represented by the general formula (1)
Non-aromatic epoxy resin (B) containing 30 wt% or more of epoxy resin (B1) comprising 3,4-epoxycyclohexenylmethyl-3 ′, 4′-epoxycyclohexenecarboxylate and having an epoxy equivalent of 70 to 350 g / eq Group epoxy resin,
A novel epoxy obtained by reacting with 1 mol of the carboxy group of the polycarboxylic acid compound (A) at a ratio of 3.5 to less than 15 mol of the epoxy group of the epoxy resin (B) resin.
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JP4762659B2 true JP4762659B2 (en) | 2011-08-31 |
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MX2011009919A (en) | 2009-04-03 | 2012-01-20 | Cook Composites & Polymers | Thermosetting compositions containing isocyanurate rings. |
JP6232714B2 (en) * | 2013-03-08 | 2017-11-22 | 日本ゼオン株式会社 | Epoxy resin composition, sealing material, and optical semiconductor device |
JP6441024B2 (en) * | 2014-10-22 | 2018-12-19 | 信越化学工業株式会社 | Epoxy resin containing silicone-modified epoxy resin and polyvalent carboxylic acid compound and cured product thereof |
WO2016125874A1 (en) * | 2015-02-05 | 2016-08-11 | 日本化薬株式会社 | Thermosetting resin composition including polyhydric alcohol compound, acid anhydride compound and thermosetting resin, polycarboxylic acid resin, thermosetting resin composition using same, and photosemiconductor device using either one of the thermosetting resin compositions as sealing material or reflective material |
JP2016141806A (en) * | 2015-02-05 | 2016-08-08 | 日本化薬株式会社 | Polycarboxylic acid resin, thermosetting resin composition using the same and optical semiconductor device using the thermosetting resin composition as encapsulation material or reflector |
JPWO2017131152A1 (en) * | 2016-01-27 | 2018-11-29 | クラスターテクノロジー株式会社 | Curable epoxy resin composition for white reflector and cured product thereof, substrate for mounting optical semiconductor element, and optical semiconductor device |
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ES2058239T3 (en) * | 1987-11-27 | 1994-11-01 | Enichem Sintesi | LIQUID COMPOSITION THERMOFRAGUANTE CONTAINING A POLYEPOXIDE. |
JP2789002B2 (en) * | 1990-01-06 | 1998-08-20 | 四国化成工業株式会社 | Epoxy resin composition |
JP3618238B2 (en) * | 1998-12-25 | 2005-02-09 | 日亜化学工業株式会社 | Light emitting diode |
JP2001059015A (en) * | 1999-08-24 | 2001-03-06 | Nitto Denko Corp | Epoxy resin composition for flow casting |
JP3442006B2 (en) * | 1999-08-24 | 2003-09-02 | 日東電工株式会社 | Epoxy resin composition for casting |
JP3876251B2 (en) * | 2003-12-12 | 2007-01-31 | スタンレー電気株式会社 | Thermosetting resin composition and light emitting diode using the composition as sealant |
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