JP4752698B2 - Optical scanning device and beam pitch adjusting method. - Google Patents

Description

  The present invention relates to an optical scanning device and a light beam pitch adjusting method.

  In an electrophotographic image forming apparatus, a plurality of light emitting elements are simultaneously emitted from a light source in which a plurality of light emitting elements are arranged two-dimensionally in the main scanning direction and the sub-scanning direction for the purpose of increasing the resolution and speed. An optical scanning device (a so-called multi-beam scanning device) that deflects on the deflection surface and simultaneously scans the photosensitive member with a plurality of light beams is widely used (see, for example, Patent Document 1).

  By the way, as a method of adjusting the light beam pitch in the multi-beam scanning device, a method of rotating and adjusting the light source around the optical axis of the optical system has been devised (for example, see Patent Document 2). According to this method, it is possible to adjust the pitch in the sub-scanning direction of a plurality of light beams constituting a light beam array extending along a direction inclined with respect to the main scanning direction.

However, as shown in FIG. 6B, when a plurality of light beam rows are arranged in the sub-scanning direction, for example, when the light source is rotated clockwise by a predetermined angle θ, The pitch pi in the sub-scanning direction of the light beam spreads to pi + dsin θ (d is the pitch in the main scanning direction of the light beam), whereas the pitch pj in the sub-scanning direction of the light beam is narrowed to pjcos θ. If the pitch in the sub-scanning direction of the light beam is adjusted to increase or decrease, the pitch in the sub-scanning direction between the light columns is not desired, regardless of whether the pitch in the sub-scanning direction is in the sub-scanning direction. Will be adjusted to the opposite side. That is, although the pitch in the sub-scanning direction of the light rays in each light row can be controlled, the pitch in the sub-scanning direction of the light rays has not been controlled. There is a problem that it is difficult to adjust both the pitch of the light beam in the sub-scanning direction to a desired pitch.
JP 2002-131661 A Japanese Patent Laid-Open No. 2005-70067

  The present invention has been made in consideration of the above facts, and in an optical scanning device in which a plurality of light beam rows are emitted from a light source in which a plurality of light emitting points are arranged two-dimensionally in the main scanning direction and the sub-scanning direction, An object of the present invention is to suppress the variation in the pitch in the sub-scanning direction of the light beams in each light beam row, and to suppress the variation in the pitch in the sub-scanning direction between the light beam rows.

The optical scanning device according to claim 1, the main light ray group light columns that will be injected is constituted by a plurality of rows arranged in the sub-scanning direction from the plurality of light emitting points arranged in a direction inclined to the scanning direction A light source that emits a plurality of groups side by side in the sub-scanning direction, a deflecting unit that deflects each light group emitted from the light source and scans a surface to be scanned, and each light group deflected by the deflecting unit are separated. And separating means for making the respective light beam groups enter different scanned surfaces, and disposed on the optical path of each light beam group traveling from the light source to the scanned surface, and having at least power in the sub-scanning direction. an optical system, the sub-scanning direction of the pitch adjusting means for enabling adjustment of the pitch in the sub-scanning direction of the light beam column in each group of light beams, provided in each of said group of light beams, the optical system for each respective light ray group Magnification adjustment means that can adjust the magnification of , Characterized by having a.

  Note that the deflection direction of the light beam by the deflecting means is called a main scanning direction, and the direction orthogonal to the deflection scanning direction is called a sub-scanning direction.

In the optical scanning device according to claim 1, a light beam group is configured by arranging a plurality of light beam rows emitted from a plurality of light emitting points arranged in a direction inclined with respect to the main scanning direction in the sub-scanning direction, A light source is configured by arranging a plurality of light beam groups in the sub-scanning direction.

The plurality of light beam groups are deflected by the deflecting unit, separated by the separating unit, and incident on different scanning surfaces. Thereby, each scanning surface is simultaneously scanned by each light beam group .

By the way, the pitch in the sub-scanning direction of the ray trains in each ray group can be adjusted by the pitch adjusting means .

An optical system having at least power in the sub-scanning direction is disposed on the optical path of the plurality of light beams traveling from the light source to the surface to be scanned .

Further, the magnification in the sub-scanning direction of the optical system can be adjusted by the magnification adjusting means for each of the plurality of light groups. That is, the magnification adjusting means is provided for each light beam group .

For this reason, when the pitch in the sub-scanning direction of the light beam in each light beam group is adjusted by the pitch adjusting unit, if the pitch in the sub-scanning direction of the light beam fluctuates, By adjusting the magnification of the optical system in the sub-scanning direction of the optical system with respect to the light train of each light group by the magnification adjusting means in accordance with the adjustment of the pitch of the light train in the sub-scanning direction, the fluctuation of the pitch of the light train in the sub-scanning direction is adjusted. Can be suppressed.

Therefore, when adjusting the pitch in the sub-scanning direction of the light ray rows in each light ray group, the variation in the pitch in the sub-scanning direction of the light ray row in each light ray group, or the change in the pitch in the sub-scanning direction between the light ray groups. Can be suppressed .

That is, as compared with the configuration in which the magnification adjusting unit is not provided for each light beam group, it is possible to suppress variations in the pitch in the sub-scanning direction of the light beam rows in each light beam group, and in the sub-scanning direction between the light beam groups. Pitch variation can be suppressed .

The optical scanning device according to claim 2 is the optical scanning device according to claim 1 , wherein the optical system includes a pre-deflection optical system disposed between the light source and the deflection unit. and has the magnification adjusting means, of each light ray group, characterized in that it is adjustable in the sub-scanning direction scaling ratio of the pre-deflection optical system relative to the group of light beams of at least one group.

In the optical scanning device according to claim 2 , the magnification in the sub-scanning direction with respect to at least one light beam group among the plurality of light beam groups of the pre-deflection optical system disposed between the light source and the deflecting unit is set. The magnification can be adjusted by the magnification adjusting means.

  Here, since the optical path before deflection is narrower in the main scanning direction than the optical path after deflection, the optical element constituting the pre-deflection optical system is compared with the optical element constituting the optical system after deflection. In general, it is short. For this reason, when adjusting the magnification in the sub-scanning direction of the optical system with respect to the light beam group, the position and orientation of the short optical element may be adjusted. Therefore, the magnification in the sub-scanning direction of the deflected optical system is adjusted. Compared to the case, the magnification adjusting means can be simplified and miniaturized.

The optical scanning device according to claim 3 is an optical scanning device according to claim 1 or claim 2, wherein the optical system, among the respective ray group, the group of light beams of at least one group passes An anamorphic optical element is provided, and the magnification adjusting unit is an optical axis direction position adjusting unit that can adjust a position of the anamorphic optical element in the optical axis direction.

In the optical scanning device according to the third aspect , at least one of the plurality of light groups passes through the anamorphic optical element having power in the sub-scanning direction. Here, the anamorphic optical element has a different magnification in the main scanning direction and sub-scanning direction in the cross section perpendicular to the optical axis. Therefore, the optical axis position adjusting means adjusts the position of the anamorphic optical element in the optical axis direction. by, group of light beams of a plurality of groups, can be adjusted in the sub-scanning direction magnification of the optical system with respect to the group of light beams of at least one group.

The optical scanning device according to claim 4 is an optical scanning apparatus according to any one of claims 1 to 3, wherein the optical system, among the respective light ray group, at least one group wherein It has an anamorphic optical element through which a light beam passes, and the pitch adjusting means is a rotation adjusting means that allows the anamorphic optical element to be rotated around an optical axis.

In the optical scanning device according to the fourth aspect , at least one of the plurality of light groups passes through the anamorphic optical element having power in the sub-scanning direction. Here, the anamorphic optical element has different magnifications in the main scanning direction and sub-scanning direction in the cross section perpendicular to the optical axis, and therefore, by rotating and adjusting the anamorphic optical element around the optical axis by the rotation adjusting means, group of light beams of a plurality of groups, can be adjusted in the sub-scanning direction pitch of the light beam of the light beam column in the group of light beams of at least one group.

An optical scanning device according to a fifth aspect includes the optical scanning device according to any one of the first to third aspects, wherein the pitch adjusting unit rotates the light source around an optical axis of the optical system. It is a light source rotation adjusting means that can be adjusted.

In the optical scanning device according to claim 5 , the light source is rotated and adjusted around the optical axis of the optical system by the light source rotation adjusting means, so that the sub-scanning direction of the light beams of the light beam in all the light groups emitted from the light source. Is adjusted.

Beam pitch adjustment method according to claim 6 is the method of adjusting the sub-scanning direction pitch of the light beam column in the optical scanning apparatus according to any one of claims 1 to 5, wherein the magnification adjusting means Accordingly, among the respective light ray group, and the magnification adjustment step of adjusting the sub-scanning direction scaling ratio of the optical system with respect to the group of light beams of at least one group, after the magnification adjustment step is performed, by the pitch adjusting means, And a pitch adjusting step for adjusting the pitch in the sub-scanning direction of the light beam rows in each of the light beam groups .

Here, after performing the adjustment of the pitch in the sub-scanning direction of the light beam column in each group of light rays, when performing sub-scanning direction magnification adjustment of the optical system for each ray group, pains adjusted to a desired pitch The pitch in the sub-scanning direction of the light beam rows in each light beam group thus changed.

However, in the light pitch adjustment method according to claim 6, after performing the sub-scanning direction scaling ratio adjustment of the optical system for each group of light rays, make adjustments in the sub-scanning direction of the pitch of the light beam column in each group of light rays Therefore, finally, the pitch in the sub-scanning direction of the light beam rows in each light beam group can be adjusted to a desired pitch.

  Since the present invention is configured as described above, in the optical scanning device in which a plurality of light beam rows are emitted from a light source in which a plurality of light emitting points are arranged two-dimensionally in the main scanning direction and the sub-scanning direction, the light rays in each light beam row are emitted. The pitch variation in the sub-scanning direction can be suppressed, and the pitch variation in the sub-scanning direction between the light columns can be suppressed.

  A first embodiment of the present invention will be described below with reference to the drawings.

  As shown in FIG. 1, the two optical scanning devices 10 provided in the tandem color laser printer 1 form a latent image by irradiating the photosensitive body 12 as the two scanned surfaces with the beam B, respectively. To do. The latent image formed on each photoconductor 12 is developed with yellow (Y), magenta (M), cyan (C), and black (K) toners, respectively. Then, the toner on each photoconductor 12 is transferred to the intermediate transfer belt 3. At this time, the toners of the respective colors are superimposed to form a full-color image and transferred to the recording medium P such as plain paper.

As shown in FIG. 2, the optical scanning device 10 includes a light source 14, a pre-deflection optical system 16 as an optical system, a polygon mirror 18 as a deflection unit, and a scanning optical system 20 as an optical system. Beams B are emitted from the light source 14, and each beam B is separated by the scanning optical system 20 and image-scanned on the four photoconductors 12. The deflection scanning direction by the rotation of the polygon mirror 18 of the optical scanning device 10 is referred to as a main scanning direction, indicated by an arrow X in FIGS. 2 to 15, and a direction orthogonal to the deflection scanning direction is referred to as a sub scanning direction. Thru | or the arrow Y in FIG. 15, and an optical axis direction is shown by Z in FIG. That is, in the photoconductor 12, the direction corresponding to the axial direction is referred to as the main scanning direction, and the direction corresponding to the rotation direction is referred to as the sub-scanning direction.

  As shown in FIG. 3, the light source 14 is a surface-emitting laser beam array in which a total of 24 light emitting points P, 6 rows in the main scanning direction and 4 rows in the sub-scanning direction, are two-dimensionally arranged. Two beam groups B1 in which two beam arrays B0 composed of two beams are arranged in the sub-scanning direction are emitted side by side in the sub-scanning direction.

  In the sub-scanning direction of the light source 14, four light emitting point arrays P0 are arranged. Each light emission point row P0 is composed of six light emission points P arranged at a predetermined pitch on a straight line inclined with respect to the main scanning direction and the sub-scanning direction.

  In addition, a light emitting point group P1 composed of two light emitting point arrays P0 on the upper side (upstream in the sub scanning direction) and a light emitting point composed of two light emitting point arrays P0 on the lower side (downstream in the sub scanning direction). The beam group B1 is emitted from each of the groups P1, and the interval between the upper and lower light emitting point groups P1 is wide enough to separate the emitted beam group B1 by the scanning optical system 20.

Further, as shown in FIG. 2, FIG. 4, constituted by the pre-deflection optical system 16, a common coupling lens 22 into two groups beams B1, aperture 24, and cylindrical Dorikaru lens 26 and 27 as anamorphic optical element Has been. The coupling lens 22 is provided facing the light source 14, and the aperture 24 is provided at the rear focal position of the coupling lens 22. Further, cylindrical Dorikarurenzu 26,27, no power in the main scanning direction, has a power in the sub-scanning direction.

Here, since each beam is emitted in the normal direction of the light emitting surface of the light source 14, the beam group B1 emitted from the light source 14 passes through the coupling lens 22 and is converted into a parallel light beam, and then the rear focus. Crosses at a position and passes through the opening 24A of the aperture 24 while being truncated. The beams B1, after being diffused chief rays in the sub-scanning direction by the cylindrical Dorikaru lens 26, which focuses the chief rays in the sub-scanning direction is incident on the deflecting surface 18A of the polygon mirror 18 by the cylindrical Dorikaru lens 27.

  The polygon mirror 18 has six deflecting surfaces 18A, rotates at a predetermined rotation speed, and moves the scanning lines to each photoconductor 12 at a predetermined speed.

  The scanning optical system 20 includes a concave lens 28, a convex lens 29, and a plane mirror 31 and a cylindrical mirror 33 provided for each of the two beam groups B1, respectively.

  The concave lens 28 and the convex lens 29 are configured to cooperate to have an fθ characteristic in the main scanning direction, and correct the scanning angle in the main scanning direction of the two groups of beam groups B1 deflected by the polygon mirror 18. To do.

  Further, the plane mirror 31 reflects the beam group B1 toward the cylindrical mirror 33. The cylindrical mirror 33 reflects each beam group B1 toward the photosensitive member 12. As a result, each photoconductor 12 is scanned with 12 beams B as shown in FIG. For this reason, the scanning pitch Y can be widened, and the printing speed can be increased.

  As shown in FIG. 5, the light source 14 is rotated around the normal of the light emitting surface (the optical axis O of the pre-deflection optical system 16) by a light source rotation adjustment mechanism 34 as a pitch adjustment unit and a light source rotation adjustment unit. Adjustable. The light source rotation adjusting mechanism 34 includes a bracket 36 that can rotate around the optical axis O, a positioning member 38 that rotatably supports the bracket 36, a stepping motor 40, and a flange 36A that is provided integrally with the bracket 36. A tension coil spring 42 that urges the stepping motor 40 to abut against the tip of the shaft 40A.

  In the rotation adjusting mechanism 34, when the stepping motor 40 rotates, the rotational motion is converted into a linear motion by a screw (not shown) provided inside the shaft 40A, and the tip of the shaft 40A enters and exits. As a result, the contact position of the shaft 40A of the stepping motor 40 with the bracket 36 is adjusted, and the light source 14 is rotated about the optical axis O. As a result, the beam row B0 is rotated around the optical axis O as shown in FIG.

  Further, as shown in FIG. 7, the cylindrical lenses 26 and 27 can be adjusted in position in the optical axis direction by an optical axis direction position adjusting mechanism 44 as magnification adjusting means and optical axis direction position adjusting means. The optical axis direction position adjusting mechanism 44 includes a holder 46 that holds the cylindrical lens 26 and a holder 47 that holds the cylindrical lens 27.

  The holders 46 and 47 are screwed to the bottom surface of the casing of the optical scanning device 10, but can move in the optical axis direction of the cylindrical lenses 26 and 27 when not screwed. The cylindrical lenses 26 and 27 are anamorphic optical elements having different magnifications in the sub-scanning direction in a cross section perpendicular to the optical axis.

  Therefore, before the holders 46 and 47 are screwed to the bottom surface of the casing, the positions of the cylindrical lenses 26 and 27 of the holders 46 and 47 are adjusted in the optical axis direction, so that the optical axes of the cylindrical lenses 26 and 27 are adjusted. And the magnification in the sub-scanning direction of the pre-deflection optical system 16 with respect to the two beam groups B1 can be adjusted.

  Here, since the optical path before deflection has a narrower width in the main scanning direction than the optical path after deflection, the optical elements such as the cylindrical lenses 26 and 27 constituting the pre-deflection optical system 16 are optical systems after deflection. Compared to the optical elements such as the concave lens 28 and the convex lens 29 constituting the lens, the length is shorter. For this reason, it is only necessary to adjust the positions of the cylindrical lenses 26 and 27, which are short optical elements, so that the lens movement adjustment mechanism is simplified as compared with the case of adjusting the magnification in the sub-scanning direction of the deflected optical system. Can be downsized.

Incidentally, as shown in FIG. 6A, before the light source 14 is rotated about the optical axis O, the pitch in the main scanning direction of the beam B in each beam row B0 is d, and the beam in each beam row B0. Assuming that the pitch of B in the sub-scanning direction is pi, the pitch of the beam row B0 in the sub-scanning direction is pj, and the pitch of the beam group B1 in the sub-scanning direction is pk, as shown in FIG. After rotating the light source 14 about the optical axis O, the pitch in the sub-scanning direction of the beam B in each beam row B0 increases to pi + dsinθ, and the pitch in the sub-scanning direction of the beam row B0 decreases to picosθ. The pitch of the beam group B1 in the sub-scanning direction is reduced to pjcos θ.

  That is, only by adjusting the pitch in the sub-scanning direction of the beam in each beam row B0 by adjusting the rotation of the light source 14, the pitch in the sub-scanning direction of the beam row B0 is increased or decreased regardless of whether it is desired. It is not easy to make the pitches in the sub-scanning direction of all the beams B in the beam group B1 uniform.

  Therefore, in the present embodiment, the light source rotation adjusting mechanism 34 adjusts the pitch of the beam B in each beam array B0 in the sub-scanning direction, and in the sub-scanning direction of the pre-deflection optical system 16 for the two beam groups B1. By adjusting the magnification, the pitch of the beam row B0 in the sub-scanning direction is corrected.

  Hereinafter, a method of adjusting the pitch of the beam B in the sub-scanning direction will be described with reference to the flowchart of FIG.

  First, in Step 1, the polygon mirror 18 is rotationally driven, and the process proceeds to Step 2. In step 2, one light emitting point P is selected from each light emitting point sequence P0 to emit light, and the process proceeds to step 3. At this time, the light emitting points P arranged on the same straight line in the sub-scanning direction are caused to emit light. Next, in step 3, the position in the sub-scanning direction of each beam B that scans the photoconductor 12 is detected by a beam position detection device such as an optical sensor.

Next, in step 4, the pitch in the sub-scanning direction of the beam row B0 is calculated from the position in the sub-scanning direction of each beam B detected by the beam position detector, and the process proceeds to step 6 .

In step 6 , the difference between the pitch in the sub-scanning direction of the beam array B0 calculated in step 4 and the value obtained by dividing the scanning pitch Y (see FIG. 3) by the number of arrayed beam arrays B0 (2 in this embodiment). Is less than a predetermined value, and if the determination is negative, the process proceeds to step 5 .

In step 5 , the positions of the cylindrical lenses 26 and 27 in the optical axis direction are adjusted by the optical axis direction position adjusting mechanism 44, and the process proceeds to step 3. Thereafter, Steps 3 to 6 are repeatedly performed until the difference between the pitch of the beam row B0 in the sub-scanning direction and the value obtained by dividing the scanning pitch Y by the number of arrangement of the beam row B0 is less than a predetermined value.

In step 6 , the difference between the pitch of the beam row B0 in the sub-scanning direction and the value obtained by dividing the scanning pitch Y by the number of arrays of the beam row B0 is less than a predetermined value. To do. In step 7, one light emission point sequence P0 is selected from each light emission point group P1 to emit light, and the process proceeds to step 8.

  In step 8, as in step 3, the position in the sub-scanning direction of each beam B that scans the photoreceptor 12 is detected by the beam position detection device, and the process proceeds to step 9. In step 9, the pitch in the sub-scanning direction of each beam B is calculated from the position in the sub-scanning direction of each beam detected in step 8, and the process proceeds to step 10.

  In step 10, the sub-scanning direction pitch of each beam B calculated in step 9 and the scanning pitch Y (see FIG. 3) are divided by the number of beams B in each beam row B0 (6 in this embodiment). It is determined whether or not the difference from the value is less than a predetermined value. If the determination is negative, the process proceeds to step 11.

  In step 11, the light source rotation adjustment mechanism 34 adjusts the rotation of the light source 14 about the optical axis O, and the process proceeds to step 8. Thereafter, steps 8 to 11 are repeatedly executed until the difference between the pitch of each beam B in the sub-scanning direction and the value obtained by dividing the scanning pitch Y by the number of beams B in each beam row B0 is less than a predetermined value. The

  When the difference between the pitch of each beam B in the sub-scanning direction and the value obtained by dividing the scanning pitch Y by the number of beams B in each beam row B0 is less than a predetermined value in step 10, the determination is affirmed. The process proceeds to step 12.

  In step 12, the emitted light emission point P is turned off, and the process proceeds to step 13. In step 13, the rotation of the polygon mirror 18 is stopped. Then, the adjustment of the pitch of the beam B in the sub-scanning direction is finished.

Here, by adjusting the positions of the cylindrical lenses 26 and 27 in the optical axis direction in Step 5 , as shown in FIG. 9, each beam array after rotation adjustment around the optical axis O of the light source 14 is performed. The pitch of the beam B in B0 in the sub-scanning direction, the pitch of the beam row B0 in the sub-scanning direction, and the pitch of the beam group B1 in the sub-scanning direction can be enlarged by xβ, and are reduced by adjusting the rotation of the light source 14. Can be offset. As a result, variations in the pitch of the beam B in each beam row B0 in the sub-scanning direction can be suppressed, and variations in the pitch of the beam B in the beam row B0 in the sub-scanning direction can be suppressed.

  In the case where the magnification in the sub-scanning direction of the pre-deflection optical system 16 with respect to the two beam groups B1 is adjusted after adjusting the pitch in the sub-scanning direction of the beam B in each beam row B0, The pitch in the sub-scanning direction of the beam B in each beam row B0 adjusted to a desired pitch will vary. However, in this embodiment, after adjusting the magnification in the sub-scanning direction of the pre-deflection optical system 16 for the two beam groups B1, the pitch of the beam B in each beam row B0 is adjusted in the sub-scanning direction. Therefore, the pitch in the sub-scanning direction of the beam B in each beam row B0 can be finally adjusted to a desired pitch.

  Next, a second embodiment of the present invention will be described. In addition, the same code | symbol is attached | subjected to the structure similar to 1st Embodiment, and description is abbreviate | omitted.

  As shown in FIG. 10, in the optical scanning device 100, two cylindrical lenses 27 are arranged side by side in the sub-scanning direction. The cylindrical lens 27 disposed on the upstream side in the sub-scanning direction (upper side in the figure) is disposed on the optical path of the beam group B1 on the upstream side in the sub-scanning direction (upper side in the figure) of the two groups of beam groups B1. The cylindrical lens 27 on the downstream side in the sub-scanning direction (lower side in the figure) is disposed in the optical path of the beam group B1 on the downstream side in the sub-scanning direction (lower side in the figure) of the two groups of beam groups B1. That is, a cylindrical lens 27 is provided for each beam group B1.

  Further, as shown in FIG. 11, the position of each cylindrical lens 27 can be adjusted in the optical axis direction by an optical axis direction position adjusting mechanism 44 serving as a magnification adjusting unit and an optical axis direction position adjusting unit. The optical axis direction position adjusting mechanism 44 includes a holder 48 that holds the cylindrical lens 27.

  The lower holder 47 in the figure is screwed directly to the bottom surface of the casing of the optical scanning device 100, and the upper holder 47 in the figure is screwed to a support portion 49 erected on the bottom face of the casing. However, when not screwed, the cylindrical lens 27 is movable in the optical axis direction.

  Therefore, before the holder 47 is screwed to the bottom surface of the casing or the support portion 49, the position of the cylindrical lens 27 in the optical axis direction is adjusted by adjusting the position of the cylindrical lens 27 in the holder 47 in the optical axis direction. As shown in FIG. 12, the magnification in the sub-scanning direction of the pre-deflection optical system 16 with respect to one beam group B1 is set to xβ1, and the pre-deflection optical system 16 with respect to the other beam group B1 in the sub-scanning direction is adjusted. The magnification in the sub-scanning direction of the pre-deflection optical system 16 with respect to each beam group B1 can be individually adjusted such that the magnification is xβ2. Therefore, as compared with the first embodiment, it is possible to suppress variations in pitch in the sub-scanning direction of the beam B between the beam rows B0.

  Next, a third embodiment of the present invention will be described. In addition, the same code | symbol is attached | subjected to the structure similar to 1st, 2nd embodiment, and description is abbreviate | omitted.

  As shown in FIG. 13, in the optical scanning device 200, a cylindrical lens 27 is provided for each beam group B1. As shown in FIG. 14, the cylindrical lens 27 can be adjusted in position in the optical axis direction by an optical axis direction position adjusting mechanism 52 serving as a magnification adjusting unit and an optical axis direction position adjusting unit. The rotation can be adjusted around the optical axis O by a rotation adjusting mechanism 54 as an adjusting means.

  The optical axis direction position adjusting mechanism 52 includes a holder 56 that holds the cylindrical lens 27. The lower holder 56 is screwed directly to the bottom surface of the housing of the optical scanning device 100, and the upper holder 56 is screwed to a support portion standing on the bottom surface of the housing. In a state where it is not, the cylindrical lens 27 is movable in the optical axis direction.

  Therefore, before the holder 56 is screwed to the bottom surface or the support portion of the housing, the position of each cylindrical lens 27 in the optical axis direction can be individually adjusted by adjusting the position of the cylindrical lens 27 in the optical axis direction of the holder 56. The magnification in the sub-scanning direction of the pre-deflection optical system 16 for each beam group B1 can be individually adjusted.

  The holder 56 includes a plate 57, a support piece 86 that is provided on the plate 57 and is provided with a positioning protrusion 76 </ b> A that faces the lower central portion of the front surface of the cylindrical lens 27, and is attached to the plate 57. A leaf spring 87 that contacts the lower central portion of the rear surface to press the cylindrical lens 27 against the positioning projection 86A, and a positioning projection 88A that is erected on the plate 57 and faces the upper right side of the rear surface of the cylindrical lens 27 are formed. The support piece 88 includes a support piece 89 that is provided on the plate 57 and has a positioning projection 89 </ b> A that faces the upper left side of the rear surface of the cylindrical lens 27.

  The cylindrical lens 27 is narrowly supported by a positioning projection 86A and a leaf spring 87 at the lower center. Further, the cylindrical lens 27 is urged from the back side to the front side at the lower center, and a moment from the front side to the back side acts on the upper part of the cylindrical lens 27, so that the upper right side of the back side and the upper left side of the back side of the cylindrical lens 27 are The positioning projections 88A and 89A are in contact with each other. As a result, the cylindrical lens 27 cannot be tilted in the optical axis direction.

  Further, the rotation adjusting mechanism 54 protrudes from the plate 57 and faces the positioning projection 82 facing the lower left side of the cylindrical lens 27, the adjustment screw 83 protruding from the plate 57 and facing the lower right side of the cylindrical lens 27, and the cylindrical lens 27. The cylindrical lens 27 is configured to include a positioning projection 82 and a leaf spring 84 that presses against the adjustment screw 83.

  The cylindrical lens 27 is narrowly supported by a positioning projection 82, an adjustment screw 83, and a leaf spring 84 on the upper and lower surfaces. Here, the amount of protrusion of the adjustment screw 83 from the plate 57 can be adjusted, and the cylindrical lens 27 is rotated and adjusted around the optical axis O by adjusting the amount of protrusion of the adjustment screw 83 from the plate 57. It can be done.

  Here, since the cylindrical lens 27 which is an anamorphic optical element has different magnifications in the sub-scanning direction in a cross section perpendicular to the optical axis, each rotation lens adjusting mechanism 54 causes each cylindrical lens 27 to be centered on the optical axis O by a predetermined angle θ, By rotating by θ ′, as shown in FIG. 15, the pitches pi and pi ′ of the beam B in each beam array B0 in each beam group B1 can be adjusted to pi + dsinθ and pi ′ + dsinθ ′, respectively. .

  Although the present invention has been described in detail with respect to specific embodiments, the present invention is not limited to such embodiments, and various other embodiments are possible within the scope of the present invention. It is clear to the contractor. For example, in the present embodiment, the optical scanning device of the present invention is applied to a laser beam printer, but can also be applied to a medical device or the like.

  In the first to third embodiments, the magnification in the sub-scanning direction of the optical system can be adjusted with respect to all the light groups of the plurality of light groups, but one of the plurality of light groups can be adjusted. It may be only for a group of rays, or only for one of the plurality of rays.

  Furthermore, in the first to third embodiments, a plurality of groups of light beams are emitted from the light beams, and the respective light beam groups are separated and incident on different scanning surfaces. However, a group of light beams is emitted from the light source. Alternatively, the light may be incident on one scanned surface without separation.

1 is a diagram illustrating an outline of an image forming apparatus including an optical scanning device according to a first embodiment. It is a perspective view which shows the optical scanning device of 1st Embodiment. It is a top view which shows the arrangement | sequence of the light emission point of the light source of the optical scanning device of 1st Embodiment, and the arrangement | sequence of the beam on a photoreceptor. It is a figure which shows the outline of the optical scanning device of 1st Embodiment. It is a side view which shows the light source rotation adjustment mechanism of the optical scanning device of 1st Embodiment. (A), (B) is a figure which shows the arrangement | sequence of the beam in the optical scanning device of 1st Embodiment. It is a perspective view which shows the optical axis direction position adjustment mechanism of the optical scanning device of 1st Embodiment. It is a flowchart for demonstrating the adjustment method of the pitch of the subscanning direction of the beam in the optical scanning device of 1st Embodiment. It is a figure which shows the arrangement | sequence of the beam in the optical scanning device of 1st Embodiment. It is a figure which shows the outline of the optical scanning device of 2nd Embodiment. It is a perspective view which shows the optical axis direction position adjustment mechanism of the optical scanning device of 2nd Embodiment. It is a figure which shows the arrangement | sequence of the beam in the optical scanning device of 2nd Embodiment. It is a figure which shows the outline of the optical scanning device of 3rd Embodiment. (A) which shows the rotation adjustment mechanism of the optical scanning device of 3rd Embodiment is a front view, (B) is a sectional side view, (C) is a top view. It is a figure which shows the arrangement | sequence of the beam in the optical scanning device of 3rd Embodiment.

Explanation of symbols

10 optical scanning device 12 photoconductor (scanned surface)
14 Light source 16 Pre-deflection optical system (optical system)
18 Polygon mirror (deflection means)
26 Cylindrical lens (anamorphic optical element)
27 Cylindrical lens (anamorphic optical element)
31 Flat mirror (separation means)
33 Cylindrical mirror (separation means)
34 Light source rotation adjustment mechanism (pitch adjustment means, light source rotation adjustment means)
44 Optical axis direction position adjustment mechanism (magnification adjusting means, optical axis direction position adjusting means)
52 Optical axis direction position adjustment mechanism (magnification adjusting means, optical axis direction position adjusting means)
54 Rotation adjustment mechanism (pitch adjustment means, rotation adjustment means)
100 Optical Scanning Device 200 Optical Scanning Device B Beam (Ray)
B0 Beam train (ray train)
B1 Beam group (ray group)
P luminous point

Claims (6)

A light source emitting side by side a plurality of groups of light ray group light columns that will be injected is constituted by a plurality of rows arranged in the sub-scanning direction from the plurality of light emitting points arranged in a direction inclined with respect to the main scanning direction in the sub-scanning direction ,
And deflection means for scanning the surface to be scanned deflects the respective beam groups emitted from the light source,
Separating means for separating the light beam groups deflected by the deflecting means and causing the light beam groups to enter the different scanned surfaces;
Disposed above the optical path of each light ray group travels from the light source to the surface to be scanned, an optical system having at least the sub-scanning direction of the power,
A pitch adjusting means which enables adjusting the sub-scanning direction pitch of the light beam columns in said respective group of light beams,
A magnification adjusting means that is provided for each of the light groups, and that can adjust the magnification in the sub-scanning direction of the optical system for each of the light groups ;
An optical scanning device comprising: The optical science system has to have a disposed a pre-deflection optical system between from the light source to the deflection means,
2. The magnification adjusting means is capable of adjusting a magnification in the sub-scanning direction of the pre-deflection optical system for at least one of the light groups among the light groups . Optical scanning device. The optical system has an anamorphic optical element through which at least one of the light groups among the light groups passes,
3. The optical scanning device according to claim 1 , wherein the magnification adjusting unit is an optical axis direction position adjusting unit that enables adjustment of a position of the anamorphic optical element in the optical axis direction . The optical science system, of each light ray group has an anamorphic optical element, wherein the light ray group at least one group passes,
It said pitch adjusting means includes an optical scanning apparatus according to any one of claims 1 to 3, characterized in that the rotary adjusting means allowing rotational adjustment of the anamorphic optical element around the optical axis. Said pitch adjusting means includes an optical scanning according to the light source to any one of claims 1 to 3, characterized in that the light sources rotational adjustment means for enabling rotational adjustment about the optical axis of the optical system apparatus. A method for adjusting a pitch in a sub-scanning direction of a light beam in the optical scanning device according to any one of claims 1 to 5,
A magnification adjustment step of adjusting a magnification in the sub-scanning direction of the optical system with respect to at least one of the light ray groups among the light ray groups by the magnification adjusting means,
After the magnification adjustment step is performed, the pitch adjustment unit adjusts the pitch in the sub-scanning direction of the light beam row in each light beam group by the pitch adjusting unit,
Light line pitch adjusting method characterized in that it comprises a.

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