JP4689524B2 - Thermogravimetry equipment - Google Patents

Thermogravimetry equipment Download PDF

Info

Publication number
JP4689524B2
JP4689524B2 JP2006112450A JP2006112450A JP4689524B2 JP 4689524 B2 JP4689524 B2 JP 4689524B2 JP 2006112450 A JP2006112450 A JP 2006112450A JP 2006112450 A JP2006112450 A JP 2006112450A JP 4689524 B2 JP4689524 B2 JP 4689524B2
Authority
JP
Japan
Prior art keywords
chamber
gas
measuring instrument
measuring
wire
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2006112450A
Other languages
Japanese (ja)
Other versions
JP2007285821A (en
Inventor
伸 松田
泰彰 上田
和重 勢川
出 山本
典大 高崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyota Motor Corp
JTEKT Thermo Systems Corp
Original Assignee
Koyo Thermo Systems Co Ltd
Toyota Motor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koyo Thermo Systems Co Ltd, Toyota Motor Corp filed Critical Koyo Thermo Systems Co Ltd
Priority to JP2006112450A priority Critical patent/JP4689524B2/en
Publication of JP2007285821A publication Critical patent/JP2007285821A/en
Application granted granted Critical
Publication of JP4689524B2 publication Critical patent/JP4689524B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Description

この発明は、熱処理中の被処理物の重量を測定器によって測定する熱重量測定装置に関する。   The present invention relates to a thermogravimetric measuring apparatus that measures the weight of an object to be processed during heat treatment with a measuring instrument.

被処理物に対する熱処理の影響を決定するために、熱処理中の被処理物の重量が実験的に測定される。この実験には、熱重量測定装置が用いられる。被処理物に対する熱処理として、化学的に活性なガスである反応ガスを炉内に導入して被処理物を加熱する浸炭、浸炭窒化、窒化等の処理がある。   In order to determine the effect of heat treatment on the workpiece, the weight of the workpiece during the heat treatment is experimentally measured. In this experiment, a thermogravimetric apparatus is used. As the heat treatment for the object to be processed, there are processes such as carburizing, carbonitriding, and nitriding in which a reaction gas that is a chemically active gas is introduced into a furnace to heat the object to be processed.

反応ガス中での熱処理時に被処理物の重量を測定する場合、測定器が熱及び反応ガスに晒されると、故障や腐食を生じる。   When measuring the weight of an object to be processed during heat treatment in a reaction gas, if the measuring device is exposed to heat and reaction gas, failure or corrosion occurs.

そこで、従来の熱重量測定装置では、被処理物を収納するとともに反応ガスが導入される容器の重量を測定器で測定するようにしたものがある(例えば、特許文献1参照。)。この装置では、容器自体で容器と測定器とが隔絶され、測定器は熱及び反応ガスに晒されることはない。   In view of this, some conventional thermogravimetric measuring apparatuses contain a workpiece and measure the weight of a container into which a reaction gas is introduced with a measuring device (see, for example, Patent Document 1). In this apparatus, the container and the measuring instrument are isolated by the container itself, and the measuring instrument is not exposed to heat and reaction gas.

特開昭59−54944号公報JP 59-54944 A

しかしながら、特許文献1に示した従来の熱重量測定装置では、測定器の故障や腐食を防止することはできるが、測定器は被処理物、反応ガス及び容器の重量を合せて測定する。このため、熱処理中の被処理物の重量を直接測定することはできず、熱処理中の被処理物の重量変化を正確に測定することができない問題がある。   However, the conventional thermogravimetric measuring apparatus shown in Patent Document 1 can prevent failure and corrosion of the measuring device, but the measuring device measures the weight of the object to be processed, the reaction gas, and the container. For this reason, the weight of the object to be processed during the heat treatment cannot be directly measured, and there is a problem that the weight change of the object to be processed during the heat treatment cannot be accurately measured.

この発明の目的は、測定器を熱や反応ガスに晒すことなく、熱処理中の被処理物の重量を実時間で直接測定することができ、熱処理中の被処理物の重量変化を実時間で正確に測定することができる熱重量測定装置を提供することにある。   The object of the present invention is to directly measure the weight of the workpiece during the heat treatment in real time without exposing the measuring device to heat or reaction gas, and to measure the weight change of the workpiece during the heat treatment in real time. It is an object of the present invention to provide a thermogravimetric measuring device capable of accurately measuring.

この発明の熱処理炉装置は、測定器、測定器室、測定器室用ガス導入手段、装入室、処理室、処理室用ガス導入手段、加熱室、第1の遮熱板及び第2の遮熱板を備えている。測定器は、本体、測定用ワイヤ、フック、装着用ワイヤを含み、測定用ワイヤに作用する被処理物の重量を測定する。測定器室は、測定器を収納するとともに測定用ワイヤが下面を貫通する。測定器室用ガス導入手段は、測定器室に不活性ガスを導入する。装入室は、開閉扉を備え、フックを収納するとともに測定用ワイヤが上面を貫通する。処理室は、被処理物を収納するとともに上端が装入室の内部に連通する。処理室用ガス導入手段は、処理室内に反応ガスを導入する。加熱室は、処理室の中間部分に対向したヒータを周囲に断熱層を配置して収納する。第1及び第2の遮熱板は、測定器室の下面と装入室の上面との間、及び、装入室の下面からヒータの上端までの範囲における処理室の内部に配置されている。測定器室、装入室及び処理室は、測定用ワイヤ及び装着用ワイヤを中心として上から下にこの順に配置される。   The heat treatment furnace apparatus of the present invention comprises a measuring instrument, a measuring instrument chamber, a measuring instrument chamber gas introducing means, a charging chamber, a processing chamber, a processing chamber gas introducing means, a heating chamber, a first heat shield plate, and a second A heat shield is provided. The measuring instrument includes a main body, a measuring wire, a hook, and a mounting wire, and measures the weight of an object to be processed that acts on the measuring wire. The measuring instrument chamber accommodates the measuring instrument and the measuring wire penetrates the lower surface. The gas introducing means for measuring instrument chamber introduces an inert gas into the measuring instrument chamber. The charging chamber includes an opening / closing door, and stores a hook and a measurement wire passes through the upper surface. The processing chamber accommodates an object to be processed and the upper end communicates with the inside of the charging chamber. The processing chamber gas introducing means introduces a reaction gas into the processing chamber. The heating chamber accommodates a heater facing the middle portion of the processing chamber with a heat insulating layer disposed around it. The first and second heat shield plates are arranged between the lower surface of the measuring chamber and the upper surface of the charging chamber, and inside the processing chamber in the range from the lower surface of the charging chamber to the upper end of the heater. . The measuring instrument chamber, the charging chamber, and the processing chamber are arranged in this order from top to bottom with the measuring wire and the mounting wire as the center.

この構成では、最上部に位置する測定器室に収納された測定器の本体から垂下した測定用ワイヤに、フック及び装着用ワイヤを介して被処理物が吊り下げられる。被処理物は、装入室を経由して処理室内に非接触状態で配置され、加熱室のヒータによって加熱される。測定器室の下面と装入室の上面との間、及び、装入室の下面からヒータの上端までの範囲における処理室の内部には第1及び第2の遮熱板が配置されており、測定器はヒータの熱に晒されない。また、測定器室には不活性ガスが導入され、測定器は処理室に導入された反応ガス自体や反応ガスから生成される煤に晒されない。測定器は、フック及び装着用ワイヤを介して測定用ワイヤに作用する被処理物のみの重量を、熱処理の開始から終了までの間に測定できる。   In this configuration, the object to be processed is suspended from the measuring wire suspended from the main body of the measuring instrument housed in the measuring instrument chamber located at the top via the hook and the mounting wire. The object to be processed is disposed in a non-contact state in the processing chamber via the charging chamber, and is heated by the heater in the heating chamber. First and second heat shield plates are arranged between the lower surface of the measuring chamber and the upper surface of the charging chamber and inside the processing chamber in the range from the lower surface of the charging chamber to the upper end of the heater. The measuring instrument is not exposed to the heat of the heater. Further, an inert gas is introduced into the measuring instrument chamber, and the measuring instrument is not exposed to the reaction gas itself introduced into the processing chamber or the soot generated from the reaction gas. The measuring instrument can measure the weight of only the workpiece to be applied to the measuring wire via the hook and the mounting wire from the start to the end of the heat treatment.

また、装入室の内部に反応ガスを導入する装入室用ガス導入手段と、装入室の内部の気体を排出する装入室用排出手段と、処理室の内部の気体を下端から排出する処理室用排出手段と、をさらに備え、処理室用ガス導入手段は処理室の内部に下端から反応ガスを導入する手段であり、処理室用ガス導入手段と装入室用排出手段との組み合わせ、又は、処理室用排出手段と装入室用ガス導入手段との組み合わせのいずれかを選択して動作させることができる。   Also, charging chamber gas introducing means for introducing the reaction gas into the charging chamber, charging chamber discharging means for discharging the gas inside the charging chamber, and gas inside the processing chamber are discharged from the lower end. And a processing chamber gas introduction means for introducing the reaction gas into the inside of the processing chamber from the lower end, and the processing chamber gas introduction means and the charging chamber discharge means. Either a combination or a combination of the processing chamber discharge means and the charging chamber gas introduction means can be selected and operated.

この構成では、処理室用ガス導入手段と装入室用排出手段とを同時的に動作させて処理室の下端から内部に反応ガスを導入するか、処理室用排出手段と装入室用ガス導入手段とを同時的に動作させて処理室の上端から内部に反応ガスを導入するかを選択できる。   In this configuration, the processing chamber gas introducing means and the charging chamber discharging means are simultaneously operated to introduce the reaction gas into the inside from the lower end of the processing chamber, or the processing chamber discharging means and the charging chamber gas are introduced. It is possible to select whether the reaction gas is introduced into the inside from the upper end of the processing chamber by operating the introduction means simultaneously.

さらに、加熱室に不活性ガスを導入する加熱室用ガス導入手段をさらに備えにることができる。   Furthermore, a heating chamber gas introducing means for introducing an inert gas into the heating chamber can be further provided.

この構成では、処理室の損傷時に漏出した反応ガスによってヒータが受ける影響が少なくなる。また、反応ガスと空気との接触が断たれ、反応ガスが可燃性である場合にも爆発の危険性が回避される。   In this configuration, the heater is less affected by the reaction gas leaked when the processing chamber is damaged. Also, the danger of explosion is avoided when contact between the reaction gas and air is interrupted and the reaction gas is flammable.

この発明の熱重量測定装置によれば、測定器がヒータの熱や処理室に導入された反応ガスに晒されることがないようにすることができる。また、測定器が反応ガスから生成する煤の付着等によって故障することを防止できる。測定器は、フック及び装着用ワイヤを介して測定用ワイヤに作用する被処理物のみの重量を、熱処理の開始から終了までの間に正確に測定することができる。さらに、装入室が設けられていることにより、被処理物の装着が容易に行える。   According to the thermogravimetric measurement apparatus of the present invention, the measuring instrument can be prevented from being exposed to the heat of the heater or the reaction gas introduced into the processing chamber. Further, it is possible to prevent the measuring device from being broken due to adhesion of soot generated from the reaction gas. The measuring instrument can accurately measure the weight of only the object to be processed acting on the measuring wire via the hook and the mounting wire from the start to the end of the heat treatment. Furthermore, since the charging chamber is provided, the workpiece can be easily mounted.

図1は、この発明の実施形態に係る熱重量測定装置10の構成を示す概略の断面図である。熱重量測定装置10は、測定器1、測定器室2、装入室3、処理管4、加熱管5、取出室6、フレーム7を備えている。   FIG. 1 is a schematic cross-sectional view showing a configuration of a thermogravimetric measurement apparatus 10 according to an embodiment of the present invention. The thermogravimetric measurement apparatus 10 includes a measuring instrument 1, a measuring instrument chamber 2, a charging chamber 3, a processing tube 4, a heating tube 5, an extraction chamber 6, and a frame 7.

フレーム7の上面に測定器室2が支持、固定されており、フレーム7の下面に取出室6が固定されている。フレーム7の内側で測定器室2の下面に装入室3の上面が気密状態で固定されている。装入室3の下面には処理管4の上端が気密状態で固定されている。処理管4の下端は、取出室6の上面に気密状態で固定されている。加熱室5は、断熱層5Aの内周表面にヒータ8が設けられており、処理管4の周面の中間部に対向する位置でフレーム7に固定されている。
フレーム7によって、測定器室2、装入室3、処理管4、取出室6が、上下方向にこの順に配置されている。
The measuring instrument chamber 2 is supported and fixed on the upper surface of the frame 7, and the take-out chamber 6 is fixed on the lower surface of the frame 7. The upper surface of the charging chamber 3 is fixed in an airtight manner to the lower surface of the measuring instrument chamber 2 inside the frame 7. The upper end of the processing tube 4 is fixed to the lower surface of the charging chamber 3 in an airtight state. The lower end of the processing tube 4 is fixed to the upper surface of the extraction chamber 6 in an airtight state. The heating chamber 5 is provided with a heater 8 on the inner peripheral surface of the heat insulating layer 5 </ b> A, and is fixed to the frame 7 at a position facing an intermediate portion of the peripheral surface of the processing tube 4.
The measuring chamber 2, the charging chamber 3, the processing tube 4, and the take-out chamber 6 are arranged in this order in the vertical direction by the frame 7.

熱重量測定装置10は、また、測定器室用ガス導入手段である不活性ガス供給源21及びバルブ22、装入室用ガス導入手段である反応ガス供給源31及びバルブ32、装入室用排出手段である真空ポンプ34及びバルブ33、処理管用ガス導入手段である反応ガス供給源41及びバルブ42、処理管用排出手段である真空ポンプ44及びバルブ43、加熱室用ガス導入手段である不活性ガス供給源51及びバルブ52を備えている。   The thermogravimetric measurement apparatus 10 also includes an inert gas supply source 21 and a valve 22 which are gas introduction means for a measuring instrument chamber, a reaction gas supply source 31 and a valve 32 which are gas introduction means for a charging chamber, and a charging chamber. Vacuum pump 34 and valve 33 as exhaust means, reaction gas supply source 41 and valve 42 as gas introduction means for processing tube, vacuum pump 44 and valve 43 as exhaust means for processing tube, and inertness as gas introduction means for heating chamber A gas supply source 51 and a valve 52 are provided.

熱重量測定装置10は、さらに、第1の遮熱板9A及び第2の遮熱板9Bを備えている。   The thermogravimetric measurement apparatus 10 further includes a first heat shield plate 9A and a second heat shield plate 9B.

測定器1は、本体11、測定用ワイヤ12、フック13、装着用ワイヤ14を含む。測定用ワイヤ12は、本体11から垂下している。フック13は、測定用ワイヤ12の下端に取り付けられている。装着用ワイヤ14は、上端がフック13に着脱自在に係止されて下端に被処理物20が装着される。本体11には、測定用ワイヤ12に作用する被処理物20の重量を測定する機器が収納されている。   The measuring instrument 1 includes a main body 11, a measuring wire 12, a hook 13, and a mounting wire 14. The measurement wire 12 is suspended from the main body 11. The hook 13 is attached to the lower end of the measurement wire 12. An upper end of the mounting wire 14 is detachably locked to the hook 13, and the workpiece 20 is mounted on the lower end. In the main body 11, a device for measuring the weight of the workpiece 20 acting on the measurement wire 12 is accommodated.

測定器室2は、水冷ジャケット構造とされ、測定器1の本体11を収納するとともに測定用ワイヤ12が下面を貫通する。不活性ガス供給源21は、バルブ22を介して測定器室2内に不活性ガスを導入する。   The measuring instrument chamber 2 has a water-cooled jacket structure, and houses the main body 11 of the measuring instrument 1 and the measuring wire 12 penetrates the lower surface. The inert gas supply source 21 introduces an inert gas into the measuring instrument chamber 2 via the valve 22.

装入室3は、開閉扉3Aを備え、測定用ワイヤ12が上面を貫通し、フック13を非接触状態にして収納する。この構造により、被処理物20の装着が容易に行える。反応ガス供給源31は、バルブ32を介して装入室3内に反応ガスを導入する。真空ポンプ34は、バルブ33を介して装入室3内の気体を排出する。   The charging chamber 3 includes an opening / closing door 3A, and the measuring wire 12 penetrates the upper surface thereof and stores the hook 13 in a non-contact state. With this structure, the workpiece 20 can be easily mounted. The reactive gas supply source 31 introduces a reactive gas into the charging chamber 3 via the valve 32. The vacuum pump 34 discharges the gas in the charging chamber 3 through the valve 33.

処理管4は、この発明の処理室に相当するものであり、一例として、上下端が開放した石英管又は耐熱鋼管である。処理管4の上端は、装入室3内に連通している。処理管4の下端は、取出室6内に連通している。処理管4内には、上端から装着用ワイヤ14が挿入されており、中間部に被処理物20を非接触状態にして収納する。なお、この発明の処理室は、管状に限定されるものではなく、被処理物20を非接触状態にして収納できるものであれば形状を問わない。   The processing tube 4 corresponds to the processing chamber of the present invention. As an example, the processing tube 4 is a quartz tube or a heat-resistant steel tube whose upper and lower ends are open. The upper end of the processing tube 4 communicates with the charging chamber 3. The lower end of the processing tube 4 communicates with the take-out chamber 6. A mounting wire 14 is inserted into the processing tube 4 from the upper end, and the workpiece 20 is stored in a non-contact state in the intermediate portion. The processing chamber of the present invention is not limited to a tubular shape, and any shape can be used as long as the processing object 20 can be stored in a non-contact state.

反応ガス供給源41は、バルブ42を介して処理管4の下端から処理管4内に反応ガスを導入する。真空ポンプ44は、バルブ43を介して処理管4の下端から処理管4内の気体を排出する。反応ガス供給源41によって処理管4内に導入される反応ガス、及び、真空ポンプ44によって処理管4内から排出される気体は、取出室6内を経由する。 The reactive gas supply source 41 introduces reactive gas into the processing tube 4 from the lower end of the processing tube 4 via the valve 42. The vacuum pump 44 discharges the gas in the processing tube 4 from the lower end of the processing tube 4 through the valve 43. The reaction gas introduced into the processing tube 4 by the reaction gas supply source 41 and the gas discharged from the processing tube 4 by the vacuum pump 44 pass through the inside of the extraction chamber 6.

加熱室5は、断熱層5Aによって断熱構造とされ、処理管4の周面の中間部分に対向したヒータ8を収納する。不活性ガス供給源51は、バルブ52を介して加熱室5に不活性ガスを導入する。   The heating chamber 5 has a heat insulating structure by the heat insulating layer 5 </ b> A, and houses the heater 8 facing the intermediate portion of the peripheral surface of the processing tube 4. The inert gas supply source 51 introduces an inert gas into the heating chamber 5 via the valve 52.

不活性ガス供給源21及び不活性ガス供給源51が導入する不活性ガスは、一例として、窒素ガスである。反応ガス供給源31及び反応ガス供給源41が導入する反応ガスは、一例として、被処理物20の浸炭や窒化に使用される炭化水素ガス、RXガス、アルコール蒸気、アンモニアガス等、又はこれらを任意に組み合わせたガスである。   As an example, the inert gas introduced by the inert gas supply source 21 and the inert gas supply source 51 is nitrogen gas. The reaction gas introduced by the reaction gas supply source 31 and the reaction gas supply source 41 is, for example, a hydrocarbon gas, RX gas, alcohol vapor, ammonia gas, or the like used for carburizing or nitriding the workpiece 20 or the like. Any combination of gases.

取出室6は、上面において処理管4の下端に連通しており、内部に焼入油を貯留している。取出室6の上部には、遮熱シャッタ6Aが設けられている。遮熱シャッタ6Aは、処理管4の下端部を閉鎖する位置と開放する位置(図1中に符号6a′で示す。)との間に移動自在にされている。 The extraction chamber 6 communicates with the lower end of the processing tube 4 on the upper surface, and stores quenching oil therein. A heat shield shutter 6 </ b> A is provided in the upper portion of the take-out chamber 6. The heat shield shutter 6A is movable between a position where the lower end of the processing tube 4 is closed and a position where it is opened (indicated by reference numeral 6a 'in FIG. 1).

測定器室2、装入室3、処理管4、取出室6は、測定用ワイヤ12及び装着用ワイヤ14を中心にして上下方向に配置されている。被処理物20が処理管4内の中間部分に配置された状態で、測定用ワイヤ12、フック13、装着用ワイヤ14及び被処理物20は、測定器室2、装入室3及び処理管4のいずれにも接触しない。   The measuring instrument chamber 2, the charging chamber 3, the processing tube 4 and the take-out chamber 6 are arranged in the vertical direction with the measuring wire 12 and the mounting wire 14 as the center. In a state where the object to be processed 20 is disposed in an intermediate portion in the processing tube 4, the measuring wire 12, the hook 13, the mounting wire 14 and the object to be processed 20 are the measuring instrument chamber 2, the charging chamber 3 and the processing tube. It does not touch any of 4.

第1の遮熱板9Aは、測定器室2の下面と装入室3の上面との間に配置されている。第2の遮熱板9Bは、装入室3の下面からヒータ5の上端までの範囲における処理管4の内部の全体に配置されている。但し、必ずしもこの範囲の全体に配置する必要はなく、少なくともこの範囲の一部に配置されていればよい。処理管4は、加熱室5内で断熱層5Aを貫通しており、少なくとも加熱室5の内部で処理管4が上部の断熱層5Aを貫通している部分には、第2の遮熱板9Bを配置してもよい。   The first heat shield plate 9 </ b> A is disposed between the lower surface of the measuring instrument chamber 2 and the upper surface of the charging chamber 3. The second heat shield 9 </ b> B is disposed throughout the interior of the processing tube 4 in the range from the lower surface of the charging chamber 3 to the upper end of the heater 5. However, it is not always necessary to arrange the entire area, and it is sufficient that the element is disposed at least part of the range. The processing tube 4 penetrates the heat insulating layer 5A in the heating chamber 5, and a second heat shield plate is provided at least in a portion of the heating chamber 5 where the processing tube 4 penetrates the upper heat insulating layer 5A. 9B may be arranged.

なお、これらの遮蔽板は、使用個所の温度条件により、ステンレス板、耐熱鋼板、インコネル板等の材料が適宜選択して用いられる。   These shielding plates are appropriately selected from materials such as a stainless steel plate, a heat-resistant steel plate, and an Inconel plate depending on the temperature conditions at the place of use.

不活性ガス供給源21は、バルブ22を介して測定器室1の内部に連通している。反応ガス供給源31は、バルブ32を介して、装入室3の内部に連通している。真空ポンプ34は、バルブ33を介して装入室3の内部に連通している。反応ガス供給源41は、バルブ42及び取出室6を介して処理管4の内部に連通している。真空ポンプ44は、バルブ43及び取出室6を介して処理管4の内部に連通している。不活性ガス供給源51は、バルブ52を介して加熱室5内のヒータ8と処理管4との間の空間に連通している。   The inert gas supply source 21 communicates with the inside of the measuring instrument chamber 1 through a valve 22. The reactive gas supply source 31 communicates with the inside of the charging chamber 3 through a valve 32. The vacuum pump 34 communicates with the inside of the charging chamber 3 through the valve 33. The reactive gas supply source 41 communicates with the inside of the processing tube 4 through the valve 42 and the extraction chamber 6. The vacuum pump 44 communicates with the inside of the processing tube 4 through the valve 43 and the extraction chamber 6. The inert gas supply source 51 communicates with a space between the heater 8 in the heating chamber 5 and the processing tube 4 through a valve 52.

図2及び図3は、熱重量測定装置10のガス浸炭処理時の使用状態の一例を示す図である。ガス浸炭処理では、キャリアガスであるRXガスに少量の炭化水素ガスをエンリッチガスとして添加したガスを反応ガスとして用いる。この処理は、略大気圧で行われるため、真空ポンプ34,44は使用しない。排気系ダクト(常時負圧を供給する。)がこれに代わる。   2 and 3 are diagrams showing an example of the usage state of the thermogravimetric measurement apparatus 10 during the gas carburizing process. In the gas carburizing treatment, a gas obtained by adding a small amount of a hydrocarbon gas as an enriched gas to the RX gas as a carrier gas is used as a reaction gas. Since this process is performed at substantially atmospheric pressure, the vacuum pumps 34 and 44 are not used. An exhaust system duct (which always supplies negative pressure) replaces this.

この処理において、不活性ガスとしての窒素ガスは、反応ガスの測定器室2への流入を防止するとともに測定器1を補助的に冷却する第1の目的、昇温時に被処理物20を保護する第2の目的、及び、反応ガスをパージ(掃出)する第3の目的を有する。 In this process, nitrogen gas as an inert gas prevents the reaction gas from flowing into the measuring instrument chamber 2 and protects the workpiece 20 at the time of temperature rise, which is the first purpose of auxiliary cooling of the measuring instrument 1. And a third purpose for purging the reaction gas.

窒素ガスは測定器室2から供給し、反応ガスは処理管4の下端から供給する。窒素ガスの第2及び第3の目的を達成するためには、窒素ガスを測定器室2から供給する必要はなく、処理管4内に他の位置から別途供給することもできる。 Nitrogen gas is supplied from the measuring instrument chamber 2, and reaction gas is supplied from the lower end of the processing tube 4. In order to achieve the second and third objects of the nitrogen gas, it is not necessary to supply the nitrogen gas from the measuring instrument chamber 2, and it can be separately supplied into the processing tube 4 from another position.

窒素ガスを処理管4内に流入させる際には、処理管4の下方から排気する。反応ガスを処理管4内に流入させる際には、処理管4の上方から排気する。 When nitrogen gas is allowed to flow into the processing tube 4, it is exhausted from below the processing tube 4. When the reaction gas flows into the processing tube 4, the reaction gas is exhausted from above the processing tube 4.

具体的には、先ず、常温で、装入室3の開閉扉3Aを開いて下端に被処理物20を装着した装着用ワイヤ14の上端をフック13に係止し、開閉扉3Aを閉じる。次いで、図2に示すように、測定器室2に不活性ガス供給源21からバルブ22を介して窒素ガスを供給するとともに、処理管4内の気体をバルブ43を介して排出する。また、加熱室5内に、不活性ガス供給源51からバルブ52を介して窒素ガスを導入する。 Specifically, first, the open / close door 3A of the charging chamber 3 is opened at normal temperature, the upper end of the mounting wire 14 with the workpiece 20 attached to the lower end is locked to the hook 13, and the open / close door 3A is closed. Next, as shown in FIG. 2, nitrogen gas is supplied from the inert gas supply source 21 to the measuring instrument chamber 2 through the valve 22, and the gas in the processing tube 4 is discharged through the valve 43. Further, nitrogen gas is introduced into the heating chamber 5 from the inert gas supply source 51 through the valve 52.

この状態で、ヒータ8をオンし、処理管4内を800℃まで昇温する。この後、図3に示すように、反応ガス供給源41からバルブ42を介して処理管4内にRXガスを供給するとともに、処理管4内の気体をバルブ33を介して排出する。 In this state, the heater 8 is turned on and the temperature inside the processing tube 4 is raised to 800 ° C. Thereafter, as shown in FIG. 3, RX gas is supplied from the reaction gas supply source 41 through the valve 42 into the processing tube 4 and the gas in the processing tube 4 is discharged through the valve 33.

この状態で、ヒータ8によって処理管4内を930℃まで昇温し、第1の所定時間にわたって炭化水素ガスをRXガスに添加して反応ガス供給源41からバルブ42を介して処理管4内に供給する(浸炭工程)。第1の所定時間が経過すると、炭化水素ガスの添加を停止して第2の所定時間にわたって保持した後(拡散工程)、焼入温度である850℃まで降温して第3の所定時間にわたって保持する(均熱工程)。 In this state, the inside of the processing tube 4 is heated to 930 ° C. by the heater 8, and a hydrocarbon gas is added to the RX gas over a first predetermined time, and the inside of the processing tube 4 is passed from the reaction gas supply source 41 through the valve 42. (Carburization process). When the first predetermined time elapses, the addition of the hydrocarbon gas is stopped and held for the second predetermined time (diffusion process), and then the temperature is lowered to the quenching temperature of 850 ° C. and held for the third predetermined time. (Soaking process)

第3の所定時間が経過すると、遮熱シャッタ6Aを開いて被処理物20を取出室6内の焼入油内に落下させる(焼入工程)。ここで、RXガスの供給を停止してヒータ8をオフし、バルブ43を介して処理管4内を排気する。所定の冷却時間が経過した後、取出室6から被処理物20を取り出す。   When the third predetermined time has elapsed, the heat shield shutter 6A is opened and the workpiece 20 is dropped into the quenching oil in the extraction chamber 6 (quenching process). Here, the supply of RX gas is stopped, the heater 8 is turned off, and the inside of the processing tube 4 is exhausted through the valve 43. After a predetermined cooling time has elapsed, the workpiece 20 is taken out from the take-out chamber 6.

取出室6から供給された反応ガスが処理管4内を経由して装入室3から排気される間に、測定器室2には不活性ガスが導入されているため、反応ガスが測定器室2内に流入することはない。測定器室2内に収納された測定器1は、反応ガスに晒されて腐食することがなく、反応ガスから生成する煤によって汚損することもない。また、ヒータ8によって加熱された処理管4の熱は、遮熱板9A,9Bによって遮蔽され、上方の測定器室2に伝導及び輻射することがない。このため、測定器室2内に収納された測定器1は、高温に晒されて故障することがない。 While the reactive gas supplied from the take-out chamber 6 is exhausted from the charging chamber 3 via the inside of the processing tube 4, the inert gas is introduced into the measuring instrument chamber 2, so that the reactive gas is measured by the measuring instrument. It does not flow into the chamber 2. The measuring instrument 1 accommodated in the measuring instrument chamber 2 is not corroded by being exposed to the reaction gas, and is not fouled by soot generated from the reaction gas. Further, the heat of the processing tube 4 heated by the heater 8 is shielded by the heat shield plates 9A and 9B, and is not conducted and radiated to the upper measuring instrument chamber 2. For this reason, the measuring instrument 1 accommodated in the measuring instrument chamber 2 is not exposed to high temperatures and fails.

図4〜図7は、熱重量測定装置10の真空浸炭処理時の使用状態の一例を示す図である。真空浸炭処理時には、一般に、反応ガスとして炭化水素ガスのみを用い、キャリアガスとしてのRXガスを使用しない。この処理では、真空ポンプ34,44を使用する。第2の使用状態では、処理管4内に下端から反応ガスを導入する。   4-7 is a figure which shows an example of the use condition at the time of the vacuum carburizing process of the thermogravimetry apparatus 10. FIG. In the vacuum carburizing process, generally, only a hydrocarbon gas is used as a reaction gas, and RX gas as a carrier gas is not used. In this process, vacuum pumps 34 and 44 are used. In the second use state, the reaction gas is introduced into the processing tube 4 from the lower end.

この処理において、不活性ガスとしての窒素ガスは、反応ガスの測定器室2への流入を防止するとともに測定器1を補助的に冷却する第1の目的、被処理物20を急冷する第2の目的、及び、処理管4内の圧力を復元する第3の目的を有する。 In this process, the nitrogen gas as the inert gas prevents the reaction gas from flowing into the measuring device chamber 2 and is used for the first purpose of cooling the measuring device 1 as an auxiliary, second for rapidly cooling the workpiece 20. And a third object for restoring the pressure in the processing tube 4.

窒素ガスは測定器室2から供給し、反応ガスは処理管4の下端から供給する。窒素ガスの第2及び第3の目的を達成するためには、窒素ガスを測定器室2から供給する必要はなく、処理管4内に他の位置から別途供給することもできる。 Nitrogen gas is supplied from the measuring instrument chamber 2, and reaction gas is supplied from the lower end of the processing tube 4. In order to achieve the second and third objects of the nitrogen gas, it is not necessary to supply the nitrogen gas from the measuring instrument chamber 2, and it can be separately supplied into the processing tube 4 from another position.

反応ガスの供給中は処理管4の上方から排気し、急冷時にのみ処理管4の下方から排気する。 During the supply of the reaction gas, exhaust is performed from above the processing tube 4 and exhausted from below the processing tube 4 only during rapid cooling.

具体的には、先ず、常温で、装入室3の開閉扉3Aを開いて下端に被処理物20を装着した装着用ワイヤ14の上端をフック13に係止し、開閉扉3Aを閉じる。次いで、図4に示すように、測定器室2に不活性ガス供給源21からバルブ22を介して少量の窒素ガスを供給しつつ、バルブ43を介して真空ポンプ44によって排気し、処理管4内を所定圧力に減圧する。少量の窒素ガスの供給は省略することもできる。また、加熱室5内に、不活性ガス供給源51からバルブ52を介して窒素ガスを導入する。 Specifically, first, the open / close door 3A of the charging chamber 3 is opened at normal temperature, the upper end of the mounting wire 14 with the workpiece 20 attached to the lower end is locked to the hook 13, and the open / close door 3A is closed. Next, as shown in FIG. 4, a small amount of nitrogen gas is supplied from the inert gas supply source 21 to the measuring instrument chamber 2 through the valve 22, while being exhausted by the vacuum pump 44 through the valve 43. The inside is reduced to a predetermined pressure. The supply of a small amount of nitrogen gas can be omitted. Further, nitrogen gas is introduced into the heating chamber 5 from the inert gas supply source 51 through the valve 52.

この状態で、ヒータ8をオンし、処理管4内を1000℃まで昇温する。次に、バルブ33を介して真空ポンプによって排気し、さらにバルブ43を閉じて真空排気系の切換を行う。この後、図5に示すように、第1の所定時間にわたって処理管4内に反応ガス供給源41からバルブ42を介して炭化水素ガスを供給しつつ、バルブ33を介して真空ポンプ34によって排気し、処理管4内を第2の所定圧力にする(浸炭工程)。炭化水素ガスは、連続して又は間欠的に供給することができる。 In this state, the heater 8 is turned on and the temperature inside the processing tube 4 is raised to 1000 ° C. Next, evacuation is performed by the vacuum pump through the valve 33, and the valve 43 is closed to switch the evacuation system. Thereafter, as shown in FIG. 5, the hydrocarbon gas is supplied from the reaction gas supply source 41 through the valve 42 into the processing tube 4 over the first predetermined time, and exhausted by the vacuum pump 34 through the valve 33. Then, the inside of the processing tube 4 is set to a second predetermined pressure (carburizing step). The hydrocarbon gas can be supplied continuously or intermittently.

第1の所定時間が経過すると、炭化水素ガスの供給を停止し、第2の所定時間にわたって保持する(拡散工程)。第2の所定時間が経過すると、バルブ43を介して真空ポンプ44によって処理管4内を排気し、さらにバルブ33を閉じて真空排気系の切換を行う。次いで、ヒータ8をオフし、図6に示すように、不活性ガス供給源21からバルブ22を介して多量の窒素ガスを供給し、被処理物20を急冷する(ガス冷却工程)。 When the first predetermined time has elapsed, the supply of hydrocarbon gas is stopped and held for a second predetermined time (diffusion process). When the second predetermined time has elapsed, the inside of the processing tube 4 is evacuated by the vacuum pump 44 via the valve 43, and the valve 33 is closed to switch the evacuation system. Next, the heater 8 is turned off, and as shown in FIG. 6, a large amount of nitrogen gas is supplied from the inert gas supply source 21 through the valve 22 to rapidly cool the workpiece 20 (gas cooling step).

さらに、図7に示すように、不活性ガス供給源21からの窒素ガスの供給量を元の状態に戻し、上記と同様に真空排気系の切換を行って、バルブ33を介して真空ポンプ34によって処理管4内を排気する。この後、再度ヒータ8をオンして処理管4内を所定の焼入温度(850度)まで昇温し、第3の所定時間にわたって保持する(均熱工程)。   Further, as shown in FIG. 7, the supply amount of nitrogen gas from the inert gas supply source 21 is returned to the original state, the evacuation system is switched in the same manner as described above, and the vacuum pump 34 is connected via the valve 33. To exhaust the inside of the processing tube 4. Thereafter, the heater 8 is turned on again to raise the temperature in the processing tube 4 to a predetermined quenching temperature (850 degrees) and hold for a third predetermined time (a soaking step).

第3の所定時間が経過すると、遮熱シャッタ6Aを開き、被処理物20を取出室6内の焼入油内に落下させる(焼入工程)。ここで、ヒータ8をオフして充分に降温させた後、真空ポンプ34による真空排気を停止し、大気圧まで復圧した後に不活性ガス供給源21からの窒素ガスの供給も停止する。所定の冷却時間が経過した後、取出室6から被処理物20を取り出す。   When the third predetermined time has elapsed, the heat shield shutter 6A is opened, and the workpiece 20 is dropped into the quenching oil in the extraction chamber 6 (quenching process). Here, after the heater 8 is turned off and the temperature is sufficiently lowered, evacuation by the vacuum pump 34 is stopped, and after returning to atmospheric pressure, the supply of nitrogen gas from the inert gas supply source 21 is also stopped. After a predetermined cooling time has elapsed, the workpiece 20 is taken out from the take-out chamber 6.

取出室6から供給された反応ガスが処理管4内を経由して装入室3から排気される間に、測定器室2には不活性ガスが導入されているため、反応ガスが測定器室2内に流入することはない。測定器室2内に収納された測定器1は、反応ガスに晒されて腐食することがなく、反応ガスから生成する煤によって汚損することもない。また、ヒータ8によって加熱された処理管4の熱は、遮熱板9A,9Bによって遮蔽され、上方の測定器室2に伝導及び輻射することがない。このため、測定器室2内に収納された測定器1は、高温に晒されて故障することがない。 While the reactive gas supplied from the take-out chamber 6 is exhausted from the charging chamber 3 via the inside of the processing tube 4, the inert gas is introduced into the measuring instrument chamber 2, so that the reactive gas is measured by the measuring instrument. It does not flow into the chamber 2. The measuring instrument 1 accommodated in the measuring instrument chamber 2 is not corroded by being exposed to the reaction gas, and is not fouled by soot generated from the reaction gas. Further, the heat of the processing tube 4 heated by the heater 8 is shielded by the heat shield plates 9A and 9B, and is not conducted and radiated to the upper measuring instrument chamber 2. For this reason, the measuring instrument 1 accommodated in the measuring instrument chamber 2 is not exposed to high temperatures and fails.

上記ガス浸炭処理及び真空浸炭処理の何れにおいても、最上部に位置する測定器室2に収納された測定器1の本体11から垂下した測定用ワイヤ12に、フック13及び装着用ワイヤ14を介して吊り下げられた被処理物20に対する浸炭処理が施される。この浸炭処理中に、測定用ワイヤ12、フック13、装着用ワイヤ14及び被処理物20は、測定器室2、装入室3及び処理管4のいずれにも被触しない。測定器1は、浸炭処理の開始から終了までの間に測定用ワイヤ12に作用する被処理物20の重量の変化を正確に測定できる。   In both of the gas carburizing process and the vacuum carburizing process, a measuring wire 12 suspended from the main body 11 of the measuring instrument 1 housed in the measuring instrument chamber 2 located at the uppermost part is connected via a hook 13 and a mounting wire 14. The carburizing process is performed on the workpiece 20 that is suspended. During the carburizing process, the measuring wire 12, the hook 13, the mounting wire 14, and the workpiece 20 do not touch any of the measuring instrument chamber 2, the charging chamber 3, and the processing tube 4. The measuring device 1 can accurately measure the change in the weight of the workpiece 20 acting on the measuring wire 12 from the start to the end of the carburizing process.

処理管4の周面の中間部分に対向するヒータ8を収納する加熱室5内には不活性ガスが導入されるため、処理管4が被損した場合でもヒータ8の損傷を最小限に抑えることができる。また、処理管4内に導入される可燃性ガスと空気との接触による爆発の危険性を回避できる。   Since an inert gas is introduced into the heating chamber 5 that houses the heater 8 facing the middle portion of the peripheral surface of the processing tube 4, even if the processing tube 4 is damaged, damage to the heater 8 is minimized. be able to. Moreover, the danger of the explosion by contact with the combustible gas introduce | transduced in the processing pipe | tube 4 and air can be avoided.

なお、測定器室2と装入室3との間、装入室3と処理管4との間、処理管4と取出室6との間は、気密状態にされている。このため、処理管4内に反応ガスを導入して所要の雰囲気とすることができ、大気圧浸炭処理や真空浸炭処理等の表面硬化熱処理を行うこともできる。   In addition, the space between the measuring instrument chamber 2 and the charging chamber 3, the space between the charging chamber 3 and the processing tube 4, and the space between the processing tube 4 and the extraction chamber 6 are airtight. For this reason, reaction gas can be introduce | transduced in the process pipe | tube 4 and it can be set as a required atmosphere, and surface hardening heat processing, such as an atmospheric-pressure carburizing process and a vacuum carburizing process, can also be performed.

図8は、装入室3の内部の構成を示す断面図である。挿入室3の内部には、測定器1の本体11から垂下した測定用ワイヤ12の下端部が位置している。この測定用ワイヤ12の下端部には、装入室3に取り付けられたピン15に対してフック13が揺動自在に取り付けられている。フック13の下端部には、切欠き13Aが形成されている。切欠き13Aには、装着用ワイヤ14の上端が掛止されている。   FIG. 8 is a cross-sectional view showing an internal configuration of the charging chamber 3. Inside the insertion chamber 3, the lower end portion of the measuring wire 12 hanging from the main body 11 of the measuring instrument 1 is located. A hook 13 is swingably attached to a pin 15 attached to the charging chamber 3 at the lower end of the measurement wire 12. A notch 13 </ b> A is formed at the lower end of the hook 13. The upper end of the mounting wire 14 is hooked on the notch 13A.

挿入室3には、操作部材3Bが備えられている。操作部材3Bは、一例としてエアシリンダーであり、アクチュエータ3Cがフック13の中間部分に水平方向に対向している。操作部材3Bを駆動すると、アクチュエータ3Cがフック13の中間部に水平方向に当接し、フック13が図8中二点鎖線で示すようにピン15を中心として揺動する。これによって、切欠き13Aから装着用ワイヤ14の上端が外れ、装着用ワイヤ14は被処理物20とともに下方に落下する。   The insertion chamber 3 is provided with an operation member 3B. The operation member 3B is an air cylinder as an example, and the actuator 3C faces the intermediate portion of the hook 13 in the horizontal direction. When the operation member 3B is driven, the actuator 3C comes into contact with the intermediate portion of the hook 13 in the horizontal direction, and the hook 13 swings around the pin 15 as indicated by a two-dot chain line in FIG. As a result, the upper end of the mounting wire 14 is removed from the notch 13 </ b> A, and the mounting wire 14 falls downward together with the workpiece 20.

被処理物20が収納されている処理管4の下端は取出室6に連通しており、取出室6には焼入用の液体が貯留されている。装着用ワイヤ14の上端が切欠き13Aから外れることにより、被処理物20は取出室6内の液体内に浸漬され、急冷によって焼入処理される。   The lower end of the processing tube 4 in which the workpiece 20 is stored communicates with the take-out chamber 6, and a liquid for quenching is stored in the take-out chamber 6. When the upper end of the mounting wire 14 is removed from the notch 13A, the workpiece 20 is immersed in the liquid in the take-out chamber 6 and quenched by rapid cooling.

なお、上記の構成において、反応ガス供給源31及びバルブ32、真空ポンプ34及びバルブ33、反応ガス供給源41及びバルブ42、真空ポンプ44及びバルブ43の全てが必須である訳ではない。切換弁及び接続管を備えることで、真空ポンプ34と真空ポンプ44とを共用することもできる。給排気位置も、同じ目的を達成しうる範囲で変更できる。また、加熱室5内に不活性ガスを導入する必要がない場合には、不活性ガス供給源51及びバルブ52を省略することもできる。   In the above configuration, the reaction gas supply source 31 and the valve 32, the vacuum pump 34 and the valve 33, the reaction gas supply source 41 and the valve 42, the vacuum pump 44 and the valve 43 are not necessarily essential. By providing the switching valve and the connecting pipe, the vacuum pump 34 and the vacuum pump 44 can be shared. The supply / exhaust position can also be changed within a range in which the same purpose can be achieved. In addition, when it is not necessary to introduce an inert gas into the heating chamber 5, the inert gas supply source 51 and the valve 52 can be omitted.

この発明の実施形態に係る熱重量測定装置10の構成を示す概略の断面図である。1 is a schematic cross-sectional view showing a configuration of a thermogravimetric measurement apparatus 10 according to an embodiment of the present invention. 熱重量測定装置10のガス浸炭処理時の使用状態の一例を示す図である。It is a figure which shows an example of the use condition at the time of the gas carburizing process of the thermogravimetry apparatus. 同ガス浸炭処理時の使用状態を示す図である。It is a figure which shows the use condition at the time of the gas carburizing process. 熱重量測定装置10の真空浸炭処理時の使用状態の一例を示す図である。It is a figure which shows an example of the use condition at the time of the vacuum carburizing process of the thermogravimetry apparatus. 同真空浸炭処理時の使用状態を示す図である。It is a figure which shows the use condition at the time of the vacuum carburizing process. 同真空浸炭処理時の使用状態を示す図である。It is a figure which shows the use condition at the time of the vacuum carburizing process. 同真空浸炭処理時の使用状態を示す図である。It is a figure which shows the use condition at the time of the vacuum carburizing process. 装入室3の内部の構成を示す断面図である。3 is a cross-sectional view showing an internal configuration of a charging chamber 3. FIG.

符号の説明Explanation of symbols

1 測定器
2 測定器室
3 装入室
4 処理管(処理室)
5 加熱室
10 熱重量測定装置
11 本体
12 測定用ワイヤ
13 フック
14 装着用ワイヤ
21 不活性ガス供給源(測定器室用ガス導入手段)
31 反応ガス供給源(装入室用ガス導入手段)
34 真空ポンプ(装入室用排出手段)
41 反応ガス供給源(処理管用ガス導入手段)
44 真空ポンプ(処理管用排出手段)
51 不活性ガス供給源(加熱室用ガス導入手段)
DESCRIPTION OF SYMBOLS 1 Measuring device 2 Measuring device room 3 Charging room 4 Processing pipe (processing room)
DESCRIPTION OF SYMBOLS 5 Heating chamber 10 Thermogravimetric measuring device 11 Main body 12 Measuring wire 13 Hook 14 Mounting wire 21 Inert gas supply source (gas introduction means for measuring device chamber)
31 Reaction gas supply source (gas introduction means for charging chamber)
34 Vacuum pump (charging means for charging chamber)
41 Reaction gas supply source (gas introduction means for processing tube)
44 Vacuum pump (Processing tube discharge means)
51 Inert gas supply source (gas introduction means for heating chamber)

Claims (1)

本体、前記本体から垂下した測定用ワイヤ、前記測定用ワイヤの下端に取り付けられたフック、上端が前記フックに着脱自在に係止されて下端に被処理物が装着される装着用ワイヤを含み、前記測定用ワイヤに作用する前記被処理物の重量を測定する測定器と、
前記測定器を収納するとともに、前記測定用ワイヤが下面を貫通する測定器室と、
開閉扉を備えており、前記測定用ワイヤが上面を貫通するとともに前記装着用ワイヤが下面を貫通し、内部に前記フックが非接触状態で位置する装入室と、
前記装入室の内部に連通した上端を前記装着用ワイヤが貫通するとともに、内部の中間部分に前記被処理物が非接触状態で位置する処理室と、
前記処理室の外周部の中間部分に対向するヒータを周囲に断熱層を配置して収納した加熱室と、
前記測定器室の下面と前記装入室の上面との間に配置された第1の遮熱板と、
前記装入室の下面から前記ヒータの上端までの範囲における前記処理室の内部に配置された第2の遮熱板と、を備え、
前記測定器室、前記装入室及び前記処理室を、前記測定用ワイヤ及び前記装着用ワイヤを中心として、上から下にこの順に配置し、さらに、
前記測定器室に不活性ガスを導入する測定器室用ガス導入手段と、
前記装入室の内部に反応ガスを導入する装入室用ガス導入手段と、
前記装入室の内部の気体を排出する装入室用排出手段と、
前記処理室の内部に下端から反応ガスを導入する処理室用ガス導入手段と、
前記処理室の内部の気体を下端から排出する処理室用排出手段と、
前記加熱室に不活性ガスを導入する加熱室用ガス導入手段と、
を備え、
前記処理室用ガス導入手段と前記装入室用排出手段とを同時的に動作させるか、又は、前記処理室用排出手段と前記装入室用ガス導入手段とを同時的に動作させることを特徴とする熱重量測定装置。
A main body, a measurement wire hanging from the main body, a hook attached to a lower end of the measurement wire, an attachment wire in which an upper end is detachably locked to the hook and a workpiece is attached to the lower end, A measuring instrument for measuring the weight of the object to be processed acting on the measuring wire;
While storing the measuring instrument, a measuring instrument chamber through which the measuring wire penetrates the lower surface,
An opening / closing door, and a charging chamber in which the measuring wire passes through the upper surface and the mounting wire passes through the lower surface, and the hook is located in a non-contact state inside,
A processing chamber in which the mounting wire passes through the upper end communicating with the inside of the charging chamber, and the workpiece is positioned in a non-contact state in an intermediate portion inside,
A heating chamber in which a heater facing the intermediate portion of the outer peripheral portion of the processing chamber is disposed around and accommodated with a heat insulating layer;
A first heat shield disposed between the lower surface of the measuring instrument chamber and the upper surface of the charging chamber;
A second heat shield disposed inside the processing chamber in a range from the lower surface of the charging chamber to the upper end of the heater,
The measuring instrument chamber, the charging chamber and the processing chamber are arranged in this order from top to bottom with the measuring wire and the mounting wire as the center , and
A gas introducing means for a measuring instrument chamber for introducing an inert gas into the measuring instrument chamber;
Gas introduction means for charging chamber for introducing a reaction gas into the charging chamber;
Discharging means for charging chamber for discharging the gas inside the charging chamber;
A gas introducing means for a processing chamber for introducing a reaction gas into the inside of the processing chamber from the lower end;
A processing chamber discharge means for discharging the gas inside the processing chamber from the lower end;
Heating chamber gas introduction means for introducing an inert gas into the heating chamber;
With
The processing chamber gas introducing means and the charging chamber discharging means are operated simultaneously, or the processing chamber discharging means and the charging chamber gas introducing means are operated simultaneously. A thermogravimetric measuring device.
JP2006112450A 2006-04-14 2006-04-14 Thermogravimetry equipment Expired - Fee Related JP4689524B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006112450A JP4689524B2 (en) 2006-04-14 2006-04-14 Thermogravimetry equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006112450A JP4689524B2 (en) 2006-04-14 2006-04-14 Thermogravimetry equipment

Publications (2)

Publication Number Publication Date
JP2007285821A JP2007285821A (en) 2007-11-01
JP4689524B2 true JP4689524B2 (en) 2011-05-25

Family

ID=38757739

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006112450A Expired - Fee Related JP4689524B2 (en) 2006-04-14 2006-04-14 Thermogravimetry equipment

Country Status (1)

Country Link
JP (1) JP4689524B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101116364B1 (en) * 2009-08-18 2012-03-09 한국전력공사 Thermogravimetric Analyzing Apparatus and method thereof
JP2012189425A (en) * 2011-03-10 2012-10-04 Japan Atomic Energy Agency Measuring apparatus for element adsorption/desorption amount
CN102645097B (en) * 2012-05-09 2014-04-09 长沙东星仪器有限责任公司 Vertical type heating furnace with furnace door

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5954944A (en) * 1982-09-21 1984-03-29 Kazuo Makino Thermal weight analyzing apparatus
JPS6044849A (en) * 1983-08-22 1985-03-11 Shimadzu Corp Thermogravimetric measuring apparatus
JPS6147546A (en) * 1984-08-13 1986-03-08 Agency Of Ind Science & Technol Thermogravimetric analysis measuring apparatus
JPH0926402A (en) * 1995-07-11 1997-01-28 Seiko Instr Inc Thermomechanical analyzer with thermogravimetric function
JP2003083857A (en) * 2001-09-12 2003-03-19 Kobe Kogyo Shikenjiyou:Kk Creep testing machine

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5954944A (en) * 1982-09-21 1984-03-29 Kazuo Makino Thermal weight analyzing apparatus
JPS6044849A (en) * 1983-08-22 1985-03-11 Shimadzu Corp Thermogravimetric measuring apparatus
JPS6147546A (en) * 1984-08-13 1986-03-08 Agency Of Ind Science & Technol Thermogravimetric analysis measuring apparatus
JPH0926402A (en) * 1995-07-11 1997-01-28 Seiko Instr Inc Thermomechanical analyzer with thermogravimetric function
JP2003083857A (en) * 2001-09-12 2003-03-19 Kobe Kogyo Shikenjiyou:Kk Creep testing machine

Also Published As

Publication number Publication date
JP2007285821A (en) 2007-11-01

Similar Documents

Publication Publication Date Title
JP4755525B2 (en) Thermogravimetry equipment
JP5225862B2 (en) High pressure gas annealing apparatus and method
KR101035635B1 (en) Substrate processing apparatus and semiconductor device manufacturing method
JP3468577B2 (en) Heat treatment equipment
TW200834686A (en) Semiconductor processing apparatus and method for using the same
JP4689524B2 (en) Thermogravimetry equipment
JP5394292B2 (en) Vertical heat treatment equipment and pressure sensing system / temperature sensor combination
US20110207339A1 (en) Heat treatment apparatus and method of manufacturing semiconductor device
JPWO2007111351A1 (en) Manufacturing method of semiconductor device
JP2011040636A (en) Gas port structure and processing apparatus
JP2007131936A (en) Burnout method for vacuum carburizing furnace
WO2007063838A1 (en) Substrate processing apparatus and method for manufacturing semiconductor device
JPH04306824A (en) Heat treatment device
JP2020053551A (en) Substrate processing device, and method for manufacturing semiconductor device
JP2766856B2 (en) Vertical pressure oxidation equipment
JP2005325371A (en) Vacuum carburizing furnace
JP2009129925A (en) Device and method for treating substrate
JP5770042B2 (en) Heat treatment equipment
KR100745481B1 (en) Apparatus and method for collection carbon nano tube
JP5701038B2 (en) Heat treatment furnace and operation method thereof
JPWO2018179157A1 (en) Substrate processing apparatus, heater unit, and semiconductor device manufacturing method
US8034410B2 (en) Protective inserts to line holes in parts for semiconductor process equipment
JP2010245422A (en) Semiconductor manufacturing device
JP2006186189A (en) Gas processing and manufacturing apparatus and method therefor
JP4609206B2 (en) Steam self-decomposition propagation evaluation apparatus and evaluation method

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20080717

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20100930

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20101005

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20101206

RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20101206

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20101221

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20110208

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20110216

R150 Certificate of patent or registration of utility model

Ref document number: 4689524

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140225

Year of fee payment: 3

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees